WO2019171543A1 - Method for producing aerogel, aerogel, aerogel block, and polysiloxane compound - Google Patents
Method for producing aerogel, aerogel, aerogel block, and polysiloxane compound Download PDFInfo
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- WO2019171543A1 WO2019171543A1 PCT/JP2018/009042 JP2018009042W WO2019171543A1 WO 2019171543 A1 WO2019171543 A1 WO 2019171543A1 JP 2018009042 W JP2018009042 W JP 2018009042W WO 2019171543 A1 WO2019171543 A1 WO 2019171543A1
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- airgel
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/16—Preparation of silica xerogels
Definitions
- the present invention relates to an airgel production method, an airgel, an airgel block, and a polysiloxane compound.
- Silica airgel is known as a material having low thermal conductivity and heat insulation. Silica airgel is useful as a functional material having excellent functionality (thermal insulation, etc.), unique optical properties, and unique electrical properties. For example, an electronic substrate utilizing the ultra-low dielectric constant properties of silica airgel It is used as a material, a heat insulating material using the high heat insulating property of silica airgel, a light reflecting material using the ultra-low refractive index of silica airgel, and the like.
- a supercritical drying method for example, a patent
- a gel compound (alcogel) obtained by hydrolyzing and polymerizing alkoxysilane is dried under supercritical conditions of a dispersion medium.
- Document 1 or a method of improving the strength of the alcogel and drying at normal pressure (for example, see Patent Document 2) is known.
- an airgel obtained by a conventionally known production method has a certain degree of visible light permeability, but is extremely low in strength and brittle. On the other hand, if it is attempted to increase the strength of such an airgel based on conventional knowledge, the visible light transmittance is extremely lowered.
- the present invention includes a sol production step for producing a sol containing a silicon compound or a hydrolysis product of the silicon compound, a wet gel production step for obtaining a wet gel by gelling the sol, and drying the wet gel to obtain an airgel.
- a method for producing an airgel comprising a polysiloxane compound having a structure represented by the following general formula (S). With such a production method, an airgel capable of achieving both good visible light transmittance and strength can be obtained.
- R 1s independently represents an alkyl group or an aryl group
- R 2s independently represents an alkyl group, an aryl group or hydrogen
- ns represents an integer of 2 or more
- ms is 2 or more. Represents an integer
- ls represents an integer of 2 or more.
- the silicon compound may further contain at least one of a trifunctional silane monomer and a silane oligomer.
- the trifunctional silane monomer has a silicon atom to which three hydrolyzable functional groups or condensable functional groups are bonded
- the silane oligomer has three oxygen atoms with respect to the total number of silicon atoms. And 50% or more of silicon atoms bonded to each other.
- the present invention also provides an airgel block having a visible light transmittance of 65% or more and a bending fracture energy per unit volume of 0.30 mJ / cm 3 or more.
- Such an airgel block can be said to have both visible light transmittance and strength at a very high level.
- the airgel block of the present invention can include an airgel having a structure represented by the following general formula (S 1 ).
- the following structure may be a structure derived from the above general formula (S) used for obtaining an airgel capable of achieving both good visible light transmittance and strength.
- R 1s independently represents an alkyl group or an aryl group, and ms represents an integer of 2 or more.
- the present invention also provides an airgel that is a dried product of a wet gel that is a condensate of a sol containing a hydrolysis product of a polysiloxane compound having a structure represented by the following general formula (S).
- S a structure represented by the following general formula (S).
- R 1s independently represents an alkyl group or an aryl group
- R 2s independently represents an alkyl group, an aryl group or hydrogen
- ns represents an integer of 2 or more
- ms is 2 or more.
- ls represents an integer of 2 or more.
- the present invention further provides an airgel-forming polysiloxane compound having a structure represented by the following general formula (S).
- a polysiloxane compound having a structure represented by the following general formula (S) is particularly useful for obtaining an airgel having both good visible light transmittance and strength, and such a polysiloxane compound is used for forming an airgel.
- An example of conventional use as a material for the above has not been confirmed.
- R 1s independently represents an alkyl group or an aryl group
- R 2s independently represents an alkyl group, an aryl group or hydrogen
- ns represents an integer of 2 or more
- ms is 2 or more. Represents an integer
- ls represents an integer of 2 or more.
- the present invention it is possible to provide a method for producing an airgel capable of achieving both good visible light transmittance and strength.
- the present invention can also provide an airgel obtained by such a production method, an airgel block containing the airgel, and an airgel-forming polysiloxane compound for obtaining the airgel.
- the method for producing an airgel according to this embodiment includes a sol that generates a sol containing a silicon compound or a hydrolysis product of the silicon compound (at least one selected from the group consisting of a silicon compound and a hydrolysis product of the silicon compound).
- the airgel manufacturing method according to the present embodiment can further include a washing step of washing the wet gel as a pre-step of the drying step.
- the sol means a state before the gelation reaction occurs, and in the present embodiment, it means a state in which the silicon compound or a hydrolysis product of the silicon compound is dissolved or dispersed in the liquid medium.
- the wet gel means a gel solid in a wet state that contains a liquid medium but does not have fluidity.
- the sol generation step includes a sol containing a polysiloxane compound having a structure represented by the following general formula (S), or a sol containing a hydrolysis product of the polysiloxane compound by hydrolyzing the polysiloxane compound.
- S a structure represented by the following general formula
- an airgel having both good visible light transmittance and strength can be obtained by using a specific polysiloxane compound.
- the inventors infer the reason why such an excellent effect is obtained as follows.
- the polyfunctional silicon units at both ends in the general formula (S) are easy to obtain a microporous structure having a diameter equal to or smaller than the wavelength of visible light, which causes a decrease in the visible light transmittance. It is considered that an airgel in which Mie scattering hardly occurs is obtained.
- flexibility is ensured by the central diorganosiloxane unit in the general formula (S), and rigidity is expressed by the polyfunctional silicon units at both ends of the unit, resulting in a high-strength airgel skeleton. Is considered to have been obtained.
- a polysiloxane compound having a structure represented by formula (S) it can be introduced the structure represented by the general formula (S 1) to be described later in the backbone of the airgel.
- R 1s independently represents an alkyl group or an aryl group
- R 2s independently represents an alkyl group, an aryl group or hydrogen.
- examples of the aryl group include a phenyl group and a substituted phenyl group.
- examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group.
- two or more R 1s may be the same or different, and similarly, two R 2s may be the same or different.
- ns represents an integer of 2 or more
- ms represents an integer of 2 or more
- ls represents an integer of 2 or more.
- R 1s and R 2s are each independently an alkyl group having 1 to 6 carbon atoms, a phenyl group, or the like from the viewpoint of easily forming an airgel having both good visible light transmittance and strength.
- the alkyl group include a methyl group.
- ns can be an integer of 3 or more, can be an integer of 4 or more, and the upper limit thereof can be 20.
- ms can be an integer greater than or equal to 3, with an upper limit of 30.
- ls can be an integer of 3 or more, can be an integer of 4 or more, and the upper limit thereof can be 20.
- ns and ls may be the same.
- the polysiloxane compound has an alkoxy group.
- the alkoxy group in the molecule may be hydrolyzed, in which case all of the alkoxy groups may be hydrolyzed or partially hydrolyzed. That is, the polysiloxane compound having an alkoxy group and the hydrolysis product thereof may be mixed.
- silicon compounds other than the specific polysiloxane compound can be further used.
- examples of such other silicon compounds include other polysiloxane compounds having a hydrolyzable reactive group or a condensable functional group (provided that the proportion of T units described below is less than 50%, or the number of silicon atoms More than 100).
- the hydrolyzable reactive group include an alkoxy group.
- Specific examples of the alkoxy group include a methoxy group, an ethoxy group, and a propoxy group. From the viewpoint of the reaction rate of the hydrolysis reaction, a methoxy group and an ethoxy group. Is preferred.
- condensable functional groups include hydroxyl groups (including hydroxyl-containing groups such as hydroxyalkyl groups), silanol groups, and the like.
- hydroxyl groups including hydroxyl-containing groups such as hydroxyalkyl groups
- silanol groups and the like.
- Examples of the polysiloxane compound having a hydroxyl group (hydroxyalkyl group) include those having a structure represented by the following general formula (A). It is done.
- a polysiloxane compound having a structure represented by the following general formula (A) the structure represented by the following general formula (1) and formula (1a) can be introduced into the skeleton of the airgel. .
- R 1a represents a hydroxyalkyl group
- R 2a represents an alkylene group
- R 3a and R 4a each independently represents an alkyl group or an aryl group
- n represents an integer of 1 to 50.
- examples of the aryl group include a phenyl group and a substituted phenyl group.
- examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group.
- two R 1a s may be the same or different, and similarly, two R 2a s may be the same or different.
- two or more R 3a s may be the same or different, and similarly two or more R 4a s may be the same or different.
- examples of R 1a include a hydroxyalkyl group having 1 to 6 carbon atoms, and examples of the hydroxyalkyl group include a hydroxyethyl group and a hydroxypropyl group.
- examples of R 2a include an alkylene group having 1 to 6 carbon atoms, and examples of the alkylene group include an ethylene group and a propylene group.
- R 3a and R 4a each independently include an alkyl group having 1 to 6 carbon atoms, a phenyl group, and the like, and examples of the alkyl group include a methyl group.
- n can be 2 to 30, but may be 5 to 20.
- polysiloxane compound having the structure represented by the general formula (A) a commercially available product can be used, and compounds such as X-22-160AS, KF-6001, KF-6002, and KF-6003 (all of them) , Manufactured by Shin-Etsu Chemical Co., Ltd.), compounds such as XF42-B0970, Fluid OFOH 702-4% (all manufactured by Momentive Performance Materials Japan GK).
- Examples of the polysiloxane compound having an alkoxy group include those having a structure represented by the following general formula (B).
- a ladder structure having a bridge portion represented by the following general formula (2) or (3) can be formed in the skeleton of the airgel. Can be introduced.
- R 1b represents an alkyl group, an alkoxy group or an aryl group
- R 2b and R 3b each independently represent an alkoxy group
- R 4b and R 5b each independently represent an alkyl group or an aryl group.
- M represents an integer of 1 to 50.
- examples of the aryl group include a phenyl group and a substituted phenyl group.
- examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group.
- two R 1b s may be the same or different from each other, and two R 2b s may be the same or different from each other, and similarly two R 1b s. 3b may be the same or different.
- m is an integer of 2 or more
- two or more R 4b s may be the same or different
- similarly two or more R 5b s are each the same. May be different.
- examples of R 1b include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and the alkyl group or alkoxy group includes a methyl group, a methoxy group, and an ethoxy group.
- R 2b and R 3b each independently include an alkoxy group having 1 to 6 carbon atoms, and examples of the alkoxy group include a methoxy group and an ethoxy group.
- R 4b and R 5b each independently include an alkyl group having 1 to 6 carbon atoms, a phenyl group, and the like, and examples of the alkyl group include a methyl group and the like.
- m can be 2 to 30, but may be 5 to 20.
- the polysiloxane compound having the structure represented by the general formula (B) can be obtained by appropriately referring to the production methods reported in JP-A Nos. 2000-26609 and 2012-233110. .
- silicate oligomers such as methyl silicate oligomer and ethyl silicate oligomer can be used.
- silicate oligomers include methyl silicate 51, methyl silicate 53A, ethyl silicate 40, and ethyl silicate 48 (all manufactured by Colcoat Co., Ltd.).
- examples of the other silicon compounds include silane monomers having a hydrolyzable functional group or a condensable functional group.
- examples of the hydrolyzable functional group and the condensable functional group include the same groups as those exemplified above.
- the silane monomer can also be referred to as a silicon compound having no siloxane bond (Si—O—Si).
- Si—O—Si silicon compound having no siloxane bond
- silane monomer having a hydrolyzable functional group examples include monoalkyltrialkoxysilane, monoaryltrialkoxysilane, monoalkyldialkoxysilane, monoaryl dialkoxysilane, dialkyl dialkoxysilane, diaryl dialkoxysilane, Examples thereof include alkyl monoalkoxy silane, monoaryl monoalkoxy silane, dialkyl monoalkoxy silane, diaryl monoalkoxy silane, trialkyl monoalkoxy silane, triaryl monoalkoxy silane, and tetraalkoxy silane.
- methyltrimethoxysilane, methyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, methyldimethoxysilane, dimethyldiethoxysilane, dimethyldimethoxysilane, ethyltrimethoxysilane, hexyltrimethoxysilane, tetraethoxy Silane etc. are mentioned.
- silane monomer having a condensable functional group examples include silane tetraol, methyl silane triol, dimethyl silane diol, phenyl silane triol, phenyl methyl silane diol, diphenyl silane diol, n-propyl silane triol, hexyl silane triol, octyl.
- silane triol, decyl silane triol, and trifluoropropyl silane triol examples include silane tetraol, methyl silane triol, dimethyl silane diol, phenyl silane triol, phenyl methyl silane diol, diphenyl silane diol, n-propyl silane triol, hexyl silane triol, octyl. Examples thereof include silane triol, decyl silane triol, and trifluoropropyl silane triol.
- the silane monomer may further have a reactive group different from the hydrolyzable functional group and the condensable functional group.
- the reactive group include an epoxy group, a mercapto group, a glycidoxy group, a vinyl group, an acryloyl group, a methacryloyl group, and an amino group.
- the epoxy group may be contained in an epoxy group-containing group such as a glycidoxy group.
- silane monomers having hydrolyzable functional groups and reactive groups include vinyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethyl.
- silane monomer having a condensable functional group and a reactive group examples include vinyl silane triol, 3-glycidoxypropyl silane triol, 3-glycidoxypropyl methyl silane diol, 3-methacryloxypropyl silane triol, 3- Methacryloxypropylmethylsilanediol, 3-acryloxypropylsilanetriol, 3-mercaptopropylsilanetriol, 3-mercaptopropylmethylsilanediol, N-phenyl-3-aminopropylsilanetriol, N-2- (aminoethyl)- Examples include 3-aminopropylmethylsilanediol.
- the silane monomer may have two or more silicon atoms, and examples of such silane monomer include bistrimethoxysilylmethane, bistrimethoxysilylethane, and bistrimethoxysilylhexane.
- a trifunctional silane monomer that is, a monomer having a silicon atom bonded with three hydrolyzable functional groups or three condensable functional groups can further improve the strength. It becomes easy to suppress the volume shrinkage and the generation of cracks in the drying process.
- the trifunctional silane monomer include the above-mentioned methyltrimethoxysilane, methylsilanetriol, and bistrimethoxysilylmethane.
- examples of the other silicon compounds include silane oligomers.
- a silane oligomer is a polymer of a silane monomer, and has a structure in which a plurality of silicon atoms are linked through oxygen atoms.
- the silane oligomer indicates a polymer having 2 to 100 silicon atoms in one molecule.
- the silane oligomer may be, for example, one or more polymers of the above silane monomers.
- the strength can be further improved, and volume shrinkage and cracking in the drying process can be easily suppressed. In particular, by suppressing the volume shrinkage and the generation of cracks, an airgel block having good visible light permeability and heat insulating properties can be easily obtained.
- the silicon atom contained in the silane oligomer is a silicon atom bonded to one oxygen atom (M unit), a silicon atom bonded to two oxygen atoms (D unit), a silicon atom bonded to three oxygen atoms (A distinction can be made between T units) and silicon atoms bonded to four oxygen atoms (Q units).
- M unit silicon atom bonded to one oxygen atom
- D unit silicon atom bonded to two oxygen atoms
- Q units silicon atom bonded to three oxygen atoms
- Examples of the M unit, the D unit, the T unit, and the Q unit include the following formulas (M), (D), (T), and (Q), respectively.
- R represents an atom other than an oxygen atom bonded to silicon (such as a hydrogen atom) or an atomic group (such as an alkyl group). Information on the content of these units can be obtained by Si-NMR.
- the silane oligomer those having 50% or more of silicon atoms (T units) bonded to three oxygen atoms can be used with respect to the total number of silicon atoms.
- T units silicon atoms
- a polymer of a silane monomer containing a certain amount or more of alkyltrialkoxysilane which is a trifunctional silane monomer is preferable.
- the proportion of the T unit is preferably 60% or more, more preferably 70% or more, and may be 100%.
- the silane oligomer preferably has an alkyl group or an aryl group as R in the above formulas (M), (D), (T) and (Q).
- alkyl group examples include an alkyl group having 1 to 6 carbon atoms. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and a butyl group. Among these, a methyl group and an ethyl group are preferable, and a methyl group is more preferable.
- Examples of the aryl group include a phenyl group and a substituted phenyl group.
- the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group.
- a phenyl group is preferable.
- the silane oligomer has a hydrolyzable functional group, and may be hydrolyzed in the sol production step. It is considered that when this hydrolyzable functional group is hydrolyzed, a silanol group is generated.
- the hydrolyzable functional group include an alkoxy group.
- the weight average molecular weight of the silane oligomer may be, for example, 200 or more, preferably 400 or more, more preferably 600 or more. Moreover, the weight average molecular weight of a silane oligomer may be 10,000 or less, for example, Preferably it is 7000 or less, More preferably, it is 5000 or less. In addition, in this specification, a weight average molecular weight shows the weight average molecular weight of standard polystyrene conversion measured by gel permeation chromatography (GPC).
- silane oligomer Commercially available products may be used as the silane oligomer.
- XR31-B1410, XC96-B0446 (all manufactured by Momentive Performance Materials Japan GK), KR-500, KR-515, X-40- 9225, KC-89S (all manufactured by Shin-Etsu Chemical Co., Ltd.), SR-2402, AY42-163 (all manufactured by Toray Dow Corning Co., Ltd.) and the like.
- the content of the silicon compound contained in the sol may be 5 parts by mass or more and 10 parts by mass or more with respect to 100 parts by mass of the total amount of the sol from the viewpoint of easily obtaining good reactivity. Good.
- the content of the silicon compound contained in the sol may be 50 parts by mass or less and 40 parts by mass or less with respect to 100 parts by mass of the total amount of the sol from the viewpoint of easily obtaining good compatibility. Good.
- the content of the polysiloxane compound having the structure represented by the general formula (S) is from the viewpoint that it is easy to achieve both good visible light transmittance and strength. Based on the total amount of the compound, it can be 5% by mass or more, 8% by mass or more, or 10% by mass or more. In addition, the upper limit of the content can be 95% by mass or less from the viewpoint of enhancing the compatibility of the sol and easily obtaining an airgel having good visible light permeability, and even if it is 90% by mass or less. Good.
- the amount of the other polysiloxane compound is based on 100 parts by mass of the polysiloxane compound having the structure represented by the general formula (S). It may be 1500 parts by mass or less, may be 1300 parts by mass or less, and may be 1000 parts by mass or less.
- the amount of the other polysiloxane compound can be, for example, 1 part by mass or more with respect to 100 parts by mass of the polysiloxane compound having the structure represented by the general formula (S). It may be 10 mass parts or more.
- the amount of the silane monomer is 1500 parts by mass or less with respect to 100 parts by mass of the polysiloxane compound having the structure represented by the general formula (S). 1300 parts by mass or less, or 1000 parts by mass or less.
- the quantity of a silane monomer can be 1 mass part or more with respect to 100 mass parts of polysiloxane compounds which have a structure represented by the said general formula (S), for example, even if it is 5 mass parts or more. It may be 10 parts by mass or more.
- the amount of the silane oligomer is 1500 parts by mass or less with respect to 100 parts by mass of the polysiloxane compound having the structure represented by the general formula (S). 1300 parts by mass or less, or 1000 parts by mass or less.
- the quantity of a silane oligomer can be 1 mass part or more with respect to 100 mass parts of polysiloxane compounds which have a structure represented by the said general formula (S), for example, even if it is 5 mass parts or more. It may be 10 parts by mass or more.
- a solvent is used for mixing and optionally hydrolyzing the silicon compound.
- the solvent for example, water or an organic solvent miscible with water can be used.
- the organic solvent miscible with water include methanol, ethanol, n-propanol, 2-propanol, n-butanol, 2-butanol, t-butanol, acetone, N, N-dimethylformamide and the like.
- it is not limited to these.
- good visible light transmittance can be easily obtained by using N, N-dimethylformamide.
- silica particles individual particles constituting the airgel
- electrostatic interaction in the reaction solvent during gelation Is done. You may use these individually or in mixture of 2 or more types.
- a solvent having a low surface tension can be further added to the above mixed solvent.
- the low surface tension solvent include those having a surface tension at 20 ° C. of 30 mN / m or less.
- the surface tension may be 25 mN / m or less, or 20 mN / m or less.
- Examples of the low surface tension solvent include pentane (15.5), hexane (18.4), heptane (20.2), octane (21.7), 2-methylpentane (17.4), 3- Aliphatic hydrocarbons such as methylpentane (18.1), 2-methylhexane (19.3), cyclopentane (22.6), cyclohexane (25.2), 1-pentene (16.0); Aromatic hydrocarbons such as (28.9), toluene (28.5), m-xylene (28.7), p-xylene (28.3); dichloromethane (27.9), chloroform (27.2) ), Carbon tetrachloride (26.9), 1-chloropropane (21.8), 2-chloropropane (18.1) and other halogenated hydrocarbons; ethyl ether (17.1), propyl ether (20.5) ), Isop Ethers such as pyrether (17.7), butyl ethy
- the silicon compound may be hydrolyzed by using water and an organic solvent miscible with water as the solvent.
- the solvent may contain an acid catalyst for promoting the hydrolysis reaction.
- Acid catalysts include hydrofluoric acid, hydrochloric acid, nitric acid, sulfuric acid, sulfurous acid, phosphoric acid, phosphorous acid, hypophosphorous acid, bromic acid, chloric acid, chlorous acid, hypochlorous acid and other inorganic acids; acidic phosphoric acid Acidic phosphates such as aluminum, acidic magnesium phosphate, and acidic zinc phosphate; organic carboxylic acids such as acetic acid, formic acid, propionic acid, oxalic acid, malonic acid, succinic acid, citric acid, malic acid, adipic acid, and azelaic acid Etc. Among these, organic carboxylic acid is mentioned as an acid catalyst which improves the water resistance of the airgel obtained more. Examples of the organic carboxylic acid include acetic acid, but formic acid, propionic acid, oxalic acid, malonic acid, and the like may be used.
- the addition amount of the acid catalyst is not particularly limited, but may be, for example, 0.001 to 10 parts by mass with respect to 100 parts by mass of the total amount of the silicon compound.
- a surfactant a thermally hydrolyzable compound, or the like can be added to the solvent.
- a nonionic surfactant, an ionic surfactant, or the like can be used. You may use these individually or in mixture of 2 or more types.
- nonionic surfactant for example, a compound containing a hydrophilic part such as polyoxyethylene and a hydrophobic part mainly composed of an alkyl group, a compound containing a hydrophilic part such as polyoxypropylene, and the like can be used.
- the compound containing a hydrophilic part such as polyoxyethylene and a hydrophobic part mainly composed of an alkyl group include polyoxyethylene nonyl phenyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene alkyl ether and the like.
- the compound having a hydrophilic portion such as polyoxypropylene include polyoxypropylene alkyl ether, a block copolymer of polyoxyethylene and polyoxypropylene, and the like.
- Examples of the ionic surfactant include a cationic surfactant, an anionic surfactant, and an amphoteric surfactant.
- Examples of the cationic surfactant include cetyltrimethylammonium bromide and cetyltrimethylammonium chloride, and examples of the anionic surfactant include sodium dodecylsulfonate.
- Examples of amphoteric surfactants include amino acid surfactants, betaine surfactants, amine oxide surfactants, and the like.
- Examples of amino acid surfactants include acyl glutamic acid.
- Examples of betaine surfactants include lauryldimethylaminoacetic acid betaine, stearyldimethylaminoacetic acid betaine, and the like.
- Examples of the amine oxide surfactant include lauryl dimethylamine oxide.
- surfactants have the effect of reducing the difference in chemical affinity between the solvent in the reaction system and the growing siloxane polymer and suppressing phase separation in the wet gel formation process described later. It is considered to be.
- an organic solvent miscible with water such as alcohol or N, N-dimethylformamide
- a wet gel can be suitably formed without adding a surfactant.
- thermohydrolyzable compound is considered to generate a base catalyst by thermal hydrolysis to make the reaction solution basic and to promote the sol-gel reaction in the wet gel generation process described later. Accordingly, the thermohydrolyzable compound is not particularly limited as long as it can make the reaction solution basic after hydrolysis.
- Urea formamide, N-methylformamide, N, N-dimethylformamide, acetamide, N -Acid amides such as methylacetamide and N, N-dimethylacetamide; cyclic nitrogen compounds such as hexamethylenetetramine and the like.
- urea is particularly easy to obtain the above-mentioned promoting effect.
- components such as carbon graphite, aluminum compound, magnesium compound, silver compound, titanium compound are added to the solvent within the range where visible light transmission and strength are not impaired for the purpose of suppressing heat ray radiation. Also good.
- nanoparticles composed of silica, alumina, etc., nanofibers composed of silica, alumina, cellulose, etc. are added to the solvent as long as visible light permeability is not impaired. You can also
- Hydrolysis in the sol production step depends on the type and amount of the silicon compound, acid catalyst and the like in the mixed solution, but may be performed, for example, in a temperature environment of 20 to 80 ° C. for 10 minutes to 24 hours.
- the reaction may be performed in a temperature environment of ⁇ 60 ° C. for 5 minutes to 8 hours.
- the temperature environment of the sol generation step may be adjusted to a temperature that suppresses hydrolysis of the thermohydrolyzable compound and suppresses gelation of the sol. .
- the temperature at this time may be any temperature as long as the hydrolysis of the thermally hydrolyzable compound can be suppressed.
- the temperature environment of the sol production step can be 0 to 40 ° C., but may be 10 to 30 ° C.
- a sol containing a silicon compound or a hydrolysis product of the silicon compound is produced.
- the hydrolysis product is a product in which a part or all of the hydrolyzable functional group of the silicon compound is hydrolyzed.
- part or all of the silicon compound may be hydrolyzed, but as described above, hydrolysis of the silicon compound is not essential.
- the silicon compound may be hydrolyzed in the wet gel formation step described later.
- the wet gel generation step is a step of obtaining a wet gel by gelling the sol obtained in the sol generation step. More specifically, it is a step of obtaining a wet gel by gelling a sol while obtaining a hydrolysis product of a silicon compound, or by gelling a sol containing a hydrolysis product of a silicon compound. This step may be a step of gelling the sol and then aging to obtain a wet gel. In this step, a base catalyst can be used to promote hydrolysis and gelation.
- Base catalysts include carbonates such as calcium carbonate, potassium carbonate, sodium carbonate, barium carbonate, magnesium carbonate, lithium carbonate, ammonium carbonate, copper (II) carbonate, iron (II) carbonate, silver (I) carbonate; hydrogen carbonate Bicarbonates such as calcium, potassium bicarbonate, sodium bicarbonate, ammonium bicarbonate; alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, cesium hydroxide; tetramethylammonium hydroxide, hydroxide Tetraalkylammonium hydroxides such as tetraethylammonium; Metal hydroxides such as magnesium hydroxide and calcium hydroxide; Ammonium compounds such as ammonium hydroxide, ammonium fluoride, ammonium chloride, and ammonium bromide; Sodium metaphosphate, pyro Sodium phosphate Basic sodium phosphate such as sodium polyphosphate; allylamine, diallylamine, triallylamine, isopropy
- the base catalyst By using the base catalyst, the hydrolysis reaction and dehydration condensation reaction or dealcoholization condensation reaction of the silicon compound in the sol can be promoted, and the sol can be gelled in a shorter time. Thereby, a wet gel with higher strength (rigidity) can be obtained.
- a strong base catalyst such as a hydroxide of an alkali metal, tetraalkylammonium or the like, visible light permeability and strength can be easily improved.
- the addition amount of the base catalyst can be 0.1 to 10 parts by mass with respect to 100 parts by mass of the total amount of the silicon compound used in the sol production step, but may be 0.5 to 5 parts by mass. By setting it as 0.1 mass part or more, it becomes easy to improve an intensity
- the gelation of the sol in the wet gel generation step may be performed in a sealed container so that the solvent and the base catalyst do not volatilize.
- the gelation temperature can be 30 to 100 ° C., but it may be 40 to 90 ° C. By setting the gelation temperature to 30 ° C. or higher, gelation can be performed in a shorter time, and a wet gel with higher strength (rigidity) can be obtained. Moreover, since it becomes easy to suppress volatilization of a solvent (especially water or alcohol) by making gelation temperature into 100 degrees C or less, it can gelatinize, suppressing volume shrinkage.
- a solvent especially water or alcohol
- the aging in the wet gel generation step may be performed in a sealed container so that the solvent and the base catalyst do not volatilize.
- the aging temperature can be 30 to 100 ° C., but it may be 40 to 90 ° C.
- the aging temperature can be 30 to 100 ° C., but it may be 40 to 90 ° C.
- a wet gel with higher strength (rigidity) can be obtained, and by setting the aging temperature to 100 ° C. or lower, volatilization of the solvent (especially water or alcohol) can be easily suppressed. Therefore, it can be gelled while suppressing volume shrinkage.
- gelation of the sol and subsequent aging may be performed in a series of operations.
- Gelling time and aging time can be appropriately set depending on the gelation temperature and aging temperature.
- the gel time can be 3 to 120 minutes, but may be 5 to 90 minutes. By setting the gelation time to 3 minutes or more, it becomes easy to obtain a homogeneous wet gel, and by setting it to 120 minutes or less, the drying process can be simplified from the washing process described later.
- the total time of the gelation time and the aging time in the entire gelation and aging process can be 4 to 480 hours, but may be 6 to 200 hours. By setting the total gelation time and aging time to 4 hours or more, a wet gel with higher strength (rigidity) can be obtained, and by setting it to 480 hours or less, the effect of aging can be more easily maintained.
- the gelation temperature and the aging temperature are increased within the above range, or the total time of the gelation time and the aging time is increased within the above range. Also good. Further, in order to increase the density of the obtained airgel or reduce the average pore diameter, the gelation temperature and the aging temperature are reduced within the above range, or the total time of the gelation time and the aging time is shortened within the above range. May be.
- the washing step is a step of washing the wet gel obtained in the wet gel production step.
- solvent substitution may be further performed in which the washing liquid in the wet gel is substituted with a solvent suitable for the drying conditions (the drying step described later).
- the wet gel obtained in the wet gel production step is washed.
- the washing can be repeatedly performed using, for example, water or an organic solvent. At this time, washing efficiency can be improved by heating.
- Organic solvents include methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, acetone, methyl ethyl ketone, 1,2-dimethoxyethane, acetonitrile, hexane, toluene, diethyl ether, chloroform, ethyl acetate, tetrahydrofuran, methylene chloride , N, N-dimethylformamide, dimethyl sulfoxide, acetic acid, formic acid, and other various organic solvents can be used. You may use said organic solvent individually or in mixture of 2 or more types.
- a low surface tension solvent can be used to suppress gel shrinkage due to drying.
- low surface tension solvents generally have very low mutual solubility with water. Therefore, when a low surface tension solvent is used in solvent replacement, the organic solvent used for washing includes a hydrophilic organic solvent having high mutual solubility in both water and a low surface tension solvent.
- cleaning can play the role of the preliminary substitution for solvent substitution.
- examples of hydrophilic organic solvents include methanol, ethanol, 2-propanol, acetone, and methyl ethyl ketone. Methanol, ethanol, methyl ethyl ketone and the like are excellent in terms of economy.
- the solvent in the wet gel can be sufficiently replaced and washed.
- the amount can be 3 to 10 times the volume of the wet gel.
- the temperature environment in washing can be a temperature below the boiling point of the solvent used for washing.
- the temperature can be raised to about 30 to 60 ° C.
- the solvent of the washed wet gel is replaced with a predetermined replacement solvent in order to suppress the shrinkage of the airgel in the drying process.
- the replacement efficiency can be improved by heating.
- Specific examples of the solvent for substitution include a low surface tension solvent described later in the drying step when drying is performed under atmospheric pressure at a temperature lower than the critical point of the solvent used for drying.
- examples of the substitution solvent include ethanol, methanol, 2-propanol, dichlorodifluoromethane, carbon dioxide, and the like, or a mixture of two or more thereof.
- Examples of the low surface tension solvent include a solvent having a surface tension at 20 ° C. of 30 mN / m or less. The surface tension may be 25 mN / m or less, or 20 mN / m or less.
- Examples of the low surface tension solvent include pentane (15.5), hexane (18.4), heptane (20.2), octane (21.7), 2-methylpentane (17.4), 3- Aliphatic hydrocarbons such as methylpentane (18.1), 2-methylhexane (19.3), cyclopentane (22.6), cyclohexane (25.2), 1-pentene (16.0); Aromatic hydrocarbons such as (28.9), toluene (28.5), m-xylene (28.7), p-xylene (28.3); dichloromethane (27.9), chloroform (27.2) ), Carbon tetrachloride (26.9), 1-chloropropane (21.8),
- aliphatic hydrocarbons hexane, heptane, etc.
- a hydrophilic organic solvent such as acetone, methyl ethyl ketone, 1,2-dimethoxyethane
- it can be used as an organic solvent at the time of washing.
- a solvent having a boiling point of 100 ° C. or less at normal pressure may be used because it is easy to dry in the drying step described later. You may use said solvent individually or in mixture of 2 or more types.
- the amount of the solvent used for solvent replacement can be an amount that can sufficiently replace the solvent in the wet gel after washing.
- the amount can be 3 to 10 times the volume of the wet gel.
- the temperature environment in the solvent replacement can be a temperature not higher than the boiling point of the solvent used for the replacement.
- the temperature can be set to about 30 to 60 ° C.
- the airgel can be obtained by drying the wet gel (after the washing step). That is, an airgel obtained by drying a wet gel generated from the sol can be obtained.
- the drying method is not particularly limited, and known atmospheric pressure drying, supercritical drying, or freeze drying can be used. Among these, lyophilization or supercritical drying can be used from the viewpoint of easy production of a low-density airgel. Further, from the viewpoint that production is possible at low cost, atmospheric pressure drying can be used.
- the normal pressure means 0.1 MPa (atmospheric pressure).
- Airgel can be obtained by drying a wet gel at a temperature below the critical point of the solvent in the wet gel under atmospheric pressure.
- the drying temperature varies depending on the type of solvent in the wet gel, it should be 20 to 180 ° C. in view of the fact that drying at a high temperature increases the evaporation rate of the solvent and may cause large cracks in the gel. Can do.
- the drying temperature may be 30 to 150 ° C.
- the drying time varies depending on the wet gel volume and the drying temperature, and can be 4 to 300 hours. It should be noted that atmospheric pressure drying also includes speeding up drying by applying a pressure less than the critical point within a range that does not impair productivity.
- Airgel can also be obtained by supercritical drying of a wet gel.
- Supercritical drying can be performed by a known method. Examples of the supercritical drying method include a method of removing the solvent at a temperature and pressure higher than the critical point of the solvent contained in the wet gel.
- all or part of the solvent contained in the wet gel is obtained by immersing the wet gel in liquefied carbon dioxide, for example, at about 20 to 25 ° C. and about 5 to 20 MPa. And carbon dioxide having a lower critical point than that of the solvent, and then removing carbon dioxide alone or a mixture of carbon dioxide and the solvent.
- the airgel obtained by such normal pressure drying or supercritical drying may be further dried at 105 to 200 ° C. for about 0.5 to 2 hours under normal pressure. This makes it easier to obtain an airgel having a low density and small pores. Additional drying may be performed at 150 to 200 ° C. under normal pressure.
- the wet gel may be formed into a desired shape and then the drying step may be performed.
- a granular airgel can be obtained by pulverizing the wet gel with a mixer or the like and then performing the drying step.
- molding the airgel obtained at the drying process may be further provided.
- a granular airgel can be obtained by pulverizing the airgel obtained in the drying step.
- the polysiloxane compound having the structure represented by the general formula (S) is particularly useful for obtaining an airgel having both good visible light transmittance and strength, and such a polysiloxane compound is used for forming an airgel.
- An example of conventional use as a material for the above has not been confirmed. Therefore, it can be said that the polysiloxane compound according to the present embodiment is an airgel-forming polysiloxane compound having a structure represented by the general formula (S).
- the airgel according to this embodiment is a dried product of a wet gel that is a condensate of a sol containing a polysiloxane compound having a structure represented by the general formula (S).
- the airgel which concerns on this embodiment may be obtained by said manufacturing method, for example. That is, the airgel according to the present embodiment includes a sol generation step for generating a sol containing a silicon compound or a hydrolysis product of the silicon compound, a wet gel generation step for gelling the sol to obtain a wet gel, and a wet gel.
- the obtained low-density dried gel is referred to as “aerogel” regardless of the drying method of the wet gel. That is, in the present embodiment, the “aerogel” is a broadly defined aerogel “Gel compressed of a microporous solid in which the dispersed phase is a gas (a gel composed of a microporous solid in which the dispersed phase is a gas). "Means.
- the inside of the airgel has a network-like fine structure, and has a cluster structure in which particulate airgel components of about 2 to 20 nm are combined. There are pores less than 100 nm between the skeletons formed by these clusters. As a result, the airgel has a three-dimensionally fine porous structure.
- the airgel which concerns on this embodiment is a silica airgel which has a silica as a main component, for example.
- the silica airgel include so-called organic-inorganic hybrid silica airgel into which an organic group (such as a methyl group) or an organic chain is introduced.
- Examples of the airgel according to the present embodiment include the following modes. By adopting these aspects, it becomes easy to obtain an airgel excellent in heat insulation, flame retardancy, heat resistance and flexibility. By employ
- the airgel according to the present embodiment can have a structure represented by the following general formula (S 1 ).
- R 1s independently represents an alkyl group or an aryl group.
- examples of the aryl group include a phenyl group and a substituted phenyl group.
- examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group.
- two or more R 1s may be the same or different.
- ms represents an integer of 2 or more.
- R 1s includes, independently, an alkyl group having 1 to 6 carbon atoms, a phenyl group, and the like. Includes a methyl group and the like. From the same viewpoint, ms can be an integer of 2 or more, and the upper limit thereof can be 30.
- the airgel according to the present embodiment can have a structure represented by the following general formula (1).
- the airgel which concerns on this embodiment can have a structure represented by the following general formula (1a) as a structure containing the structure represented by Formula (1).
- R 1 and R 2 each independently represent an alkyl group or an aryl group
- R 3 and R 4 each independently represent an alkylene group.
- examples of the aryl group include a phenyl group and a substituted phenyl group.
- the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group.
- p represents an integer of 1 to 50.
- two or more R 1 s may be the same or different, and similarly, two or more R 2 s may be the same or different.
- two R 3 s may be the same or different, and similarly, two R 4 s may be the same or different.
- R 1 and R 2 each independently include an alkyl group having 1 to 6 carbon atoms, a phenyl group, and the like. Groups and the like.
- R 3 and R 4 each independently include an alkylene group having 1 to 6 carbon atoms, and examples of the alkylene group include an ethylene group and a propylene group. It is done.
- p can be 2 to 30, and can be 5 to 20.
- the airgel which concerns on this embodiment can have a ladder type structure provided with a support
- the “ladder structure” has two struts and bridges connecting the struts (having a so-called “ladder” form). It is.
- the skeleton of the airgel may have a ladder structure, but the airgel may partially have a ladder structure.
- R 5 and R 6 each independently represents an alkyl group or an aryl group, and b represents an integer of 1 to 50.
- examples of the aryl group include a phenyl group and a substituted phenyl group.
- examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group.
- b is an integer of 2 or more
- two or more R 5 s may be the same or different, and similarly two or more R 6 s are each the same. May be different.
- the airgel skeleton As an airgel component, for example, it has a structure derived from a conventional ladder-type silsesquioxane (that is, has a structure represented by the following general formula (X)) It becomes the airgel which has the softness
- Silsesquioxane is a polysiloxane having a composition formula: (RSiO 1.5 ) n and can have various skeleton structures such as a cage type, a ladder type, and a random type.
- the structure of the bridge portion is —O—, but the airgel according to the present embodiment
- the structure of a bridge part is a structure (polysiloxane structure) represented by the said General formula (2).
- the airgel of this aspect may have a structure derived from silsesquioxane in addition to the structure represented by the general formula (2).
- R represents a hydroxy group, an alkyl group or an aryl group.
- the ladder structure has the following general formula ( It may have a ladder structure represented by 3).
- R 5 , R 6 , R 7 and R 8 each independently represents an alkyl group or an aryl group
- a and c each independently represents an integer of 1 to 3000
- b is 1 to 50 Indicates an integer.
- examples of the aryl group include a phenyl group and a substituted phenyl group.
- examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group.
- b is an integer of 2 or more
- two or more R 5 s may be the same or different
- similarly two or more R 6 s are each the same. May be different.
- when a is an integer of 2 or more
- two or more R 7 s may be the same or different.
- when c is an integer of 2 or more, 2 or more R 8 may be the same or different.
- R 5 , R 6 , R 7 and R 8 (however, R 7 and R 8 are only in formula (3)) Each independently includes an alkyl group having 1 to 6 carbon atoms, a phenyl group, and the like, and examples of the alkyl group include a methyl group.
- a and c can be independently 6 to 2000, but may be 10 to 1000.
- b can be 2 to 30, but may be 5 to 20.
- Airgel although the density may be 0.01 ⁇ 0.5g / cm 3 at 25 ° C., may be 0.05 ⁇ 0.4g / cm 3. When the density is 0.01 g / cm 3 or more, more excellent strength and flexibility can be obtained, and when it is 0.5 g / cm 3 or less, more excellent heat insulation can be obtained. it can.
- the density of the airgel can be measured by the Archimedes method according to the method described in JIS K7112, for example, using an electronic hydrometer SD-200L (product name, manufactured by Alpha Mirage Co., Ltd.).
- the thermal conductivity of the airgel at 25 ° C. under atmospheric pressure can be 0.030 W / (m ⁇ K) or less, but may be 0.028 W / (m ⁇ K) or less, or It may be 025 W / (m ⁇ K) or less.
- the thermal conductivity is 0.03 W / m ⁇ K or less, it is possible to obtain a heat insulating property higher than that of the polyurethane foam which is a high performance heat insulating material.
- the lower limit value of the thermal conductivity is not particularly limited, but can be set to 0.005 W / m ⁇ K, for example.
- the thermal conductivity can be performed using, for example, a steady-state thermal conductivity measuring device “HFM436 Lambda” (product name, manufactured by NETZSCH).
- the airgel block can include the aerogel described above. Therefore, the airgel block according to the present embodiment has both visible light transmittance and strength at a very high level.
- the visible light transmittance of the airgel block is 65% or more.
- visible light refers to electromagnetic waves defined by JIS Z8120.
- the visible light transmittance of the airgel block may be 68% or more, or 70% or more.
- the upper limit of the visible light transmittance is not particularly limited, but can be 100%.
- the visible light transmittance can be measured using, for example, a double beam spectrophotometer “U-2900” (product name, manufactured by Hitachi High-Technologies Corporation) at a measurement wavelength of 550 nm.
- the visible light transmittance is, for example, the number of central diorganosiloxane units in the general formula (S) (that is, the value of ms in the formula (S)) and the number of functional groups of the polyfunctional silicon units at both ends (that is, It can be adjusted by changing the values of ns and ls in the formula (S).
- the bending fracture energy per unit volume of the airgel block is 0.30 mJ / cm 3 or more. Bending fracture energy per unit volume of the airgel block may be 0.40mJ / cm 3 or more, it may be 0.50 mJ / cm 3 or more.
- the upper limit of the bending fracture energy per unit volume is not particularly limited, but can be 1000 mJ / cm 3 .
- the bending fracture energy per unit volume is, for example, tensilon universal material tester (tensile / compression tester) “RTC-1350A” (product name, manufactured by Orientec Co., Ltd.), with the measurement mode set to three-point bending and between fulcrums. The distance can be measured as 20 mm.
- the bending fracture energy per unit volume is, for example, in the above general formula (S), the central diorganosiloxane unit that will affect the flexibility, and the polyfunctional silicon that will affect the rigidity of both ends of the unit. It can be adjusted by changing the composition ratio with the unit.
- the block-shaped airgel which has a certain amount of volume was demonstrated above as a concrete shape of the airgel which concerns on this embodiment, the shape of an airgel is not limited to this.
- the airgel according to the present embodiment is useful even in a sheet-like airgel having a further reduced thickness.
- Example 1 12 mL of 9-functional alkoxy-modified polysiloxane compound at both ends (hereinafter referred to as “polysiloxane compound S-1”), 20 mL of silane oligomer “KC-89S” (manufactured by Shin-Etsu Chemical Co., Ltd., product name), N, N— After 140 mL of dimethylformamide was mixed and stirred for 10 minutes, 6 mL of tetraethylammonium hydroxide aqueous solution adjusted to 0.75 M was added and further stirred for 1 minute to obtain a sol. The obtained sol was gelled at 80 ° C. and aged for 120 hours to obtain a wet gel.
- the obtained wet gel was immersed in 2500 mL of methanol and washed at 60 ° C. for 3 hours. This washing operation was performed twice while exchanging with fresh methanol. Next, the washed wet gel was immersed in 2500 mL of methyl ethyl ketone, and solvent substitution was performed at 60 ° C. for 3 hours. This solvent replacement operation was performed twice while exchanging with new methyl ethyl ketone. Further, the wet gel after solvent replacement with methyl ethyl ketone was immersed in 2500 mL of n-heptane, which is a low surface tension solvent, and solvent replacement was performed again at 60 ° C. over 3 hours.
- This solvent replacement operation was performed twice while exchanging with new n-heptane.
- the washed and solvent-substituted wet gel was dried at 30 ° C. for 170 hours under normal pressure, and then further dried at 150 ° C. for 2 hours to obtain an airgel.
- the “polysiloxane compound S-1” was synthesized as follows. Hydroxy-terminated dimethylpolysiloxane “XC96-723” (product name, manufactured by Momentive Performance Materials Japan LLC) in a 1 liter three-necked flask equipped with a stirrer, thermometer and Dimroth condenser. By mixing 293.8 parts by mass of “methyl silicate 51” (product name, manufactured by Colcoat Co., Ltd.) and 0.50 parts by mass of t-butylamine and reacting at 30 ° C. for 5 hours, 9 functional groups at both ends An alkoxy-modified polysiloxane compound (polysiloxane compound having 9 alkoxy groups at both ends) was obtained.
- Example 2 As in Example 1, except that “XR31-B1410” (product name, manufactured by Momentive Performance Materials Japan GK) was used as the silane oligomer instead of “KC-89S”, the airgel was used. Obtained.
- Example 3 20 mL of polysiloxane compound S-1, 12 mL of silane monomer (methyltrimethoxysilane) “KBM-13” (product name, manufactured by Shin-Etsu Chemical Co., Ltd.) and 140 mL of N, N-dimethylformamide were mixed and stirred for 10 minutes. Then, 6 mL of an aqueous tetraethylammonium hydroxide solution adjusted to 0.75 M was added, and the mixture was further stirred for 1 minute to obtain a sol. The obtained sol was gelled at 80 ° C. and aged for 24 hours to obtain a wet gel. Thereafter, an airgel was obtained in the same manner as in Example 1.
- silane monomer methyltrimethoxysilane
- KBM-13 product name, manufactured by Shin-Etsu Chemical Co., Ltd.
- Example 4 16 mL of polysiloxane compound S-1, 16 mL of silane oligomer “KR-500” (manufactured by Shin-Etsu Chemical Co., Ltd., product name) and 140 mL of N, N-dimethylformamide were mixed and stirred for 10 minutes, then 0.75M 6 mL of an adjusted sodium hydroxide aqueous solution was added, and the mixture was further stirred for 1 minute to obtain a sol. The obtained sol was gelled at 80 ° C. and aged for 120 hours to obtain a wet gel. Thereafter, an airgel was obtained in the same manner as in Example 1.
- Example 5 An airgel was obtained in the same manner as in Example 1 except that an 11-functional alkoxy-modified polysiloxane compound at both ends (hereinafter referred to as “polysiloxane compound S-2”) was used in place of the polysiloxane compound S-1. It was.
- polysiloxane compound S-2 an 11-functional alkoxy-modified polysiloxane compound at both ends
- polysiloxane compound S-2 was synthesized as follows. In a 1-liter three-necked flask equipped with a stirrer, thermometer and Dimroth condenser, 100 parts by mass of hydroxy-terminated dimethylpolysiloxane “XC96-723”, “methyl silicate 53A” (manufactured by Colcoat Co., Ltd., product name) ) Is mixed with 185.7 parts by mass and t-butylamine at 0.50 parts by mass, and reacted at 30 ° C. for 5 hours, whereby 11 functional alkoxy-modified polysiloxane compounds at both ends (each having 11 alkoxy groups at both ends). Polysiloxane compound).
- the wet gel was transferred into a toluene solution of 5-fold volume 0.2M-hexamethyldisilazane (manufactured by Toray Dow Corning Co., Ltd.), and the toluene solution was repeatedly exchanged for one day and night. Silazane was included. Thereafter, the mixture was heated and stirred at 110 ° C. for about 2 hours to perform a hydrophobization reaction, and then the gel was transferred into ethanol, and ethanol exchange was repeated for one day and night to perform solvent replacement.
- this gel was placed in carbon dioxide at 18 ° C. and 5.1 MPa, and the operation of replacing ethanol in the gel with carbon dioxide was performed for 2 to 3 hours. Thereafter, the inside of the system was supercritical conditions of carbon dioxide, 40 ° C. and 8.1 MPa, and supercritical drying was performed for about 24 hours to obtain an airgel.
- the density of the airgel was measured by Archimedes method according to the method described in JIS K7112.
- an electronic hydrometer SD-200L manufactured by Alpha Mirage Co., Ltd., product name
- the airgel was cut to a size of 150 mm ⁇ 150 mm ⁇ 10 mm to obtain a block-shaped airgel (aerogel block).
- shaping was performed with sandpaper of # 1500 or more as necessary.
- the shaped airgel block was dried at 100 ° C. for 30 minutes under atmospheric pressure using a constant temperature dryer “DVS402” (manufactured by Yamato Scientific Co., Ltd., product name), then transferred to a desiccator and cooled to 25 ° C. A measurement sample for thermal conductivity measurement was obtained.
- the thermal conductivity was measured using a steady-state thermal conductivity measuring device “HFM436 Lambda” (manufactured by NETZSCH, product name).
- the measurement conditions were an average temperature of 25 ° C. under atmospheric pressure.
- the measurement sample is sandwiched between the upper and lower heaters with a load of 0.3 MPa, the temperature difference ⁇ T is set to 20 ° C., and the upper surface temperature, the lower surface temperature, etc. of the measurement sample are adjusted while adjusting to a one-dimensional heat flow by the guard heater.
- thermal resistance RS of the measurement sample was calculated
- R S N ((T U ⁇ T L ) / Q) ⁇ R O
- T U represents a measurement sample top surface temperature
- T L represents the measurement sample lower surface temperature
- R O represents the thermal contact resistance of the upper and lower interfaces
- Q is shows the heat flux meter output.
- a measurement sample was produced in the same manner as the measurement of thermal conductivity. This was used as a measurement sample for three-point bending measurement.
- a Tensilon universal material testing machine tensile / compression testing machine “RTC-1350A” (product name, manufactured by Orientec Co., Ltd.) was used as a measuring apparatus. The measurement mode was 3-point bending, and the distance between fulcrums was 20 mm. A load was applied from the upper surface of the sample to the center between the fulcrums, and the measurement was completed at the point where the measurement sample was broken (break point). The moving speed of the jig when applying the load was 0.3 mm / min, and the measurement temperature was 25 ° C.
- s is the displacement (mm) at the breaking point
- h is the thickness (mm) of the measurement sample before applying a load
- L is the distance between supporting points (mm).
- the breaking bending stress ⁇ (MPa) was obtained from the following equation.
- ⁇ 3 ⁇ F ⁇ L / 2 ⁇ b ⁇ h 2
- F indicates the load (N) at the breaking point
- b indicates the width (mm) of the measurement sample before applying the load.
- the bending fracture energy per unit volume (mJ / cm 3 ) is calculated by calculating the area under the curve up to the breaking point. Asked.
- a measurement sample was prepared in the same manner as the measurement of thermal conductivity, except that the size was 20 mm ⁇ 25 mm ⁇ 10 mm. This was used as a measurement sample for transmittance measurement.
- a double beam spectrophotometer “U-2900” (trade name, manufactured by Hitachi High-Technologies Corporation) was used.
- a 20 mm ⁇ 25 mm surface was irradiated with light having a wavelength of 550 nm, and the distance of the light (optical path) was 10 mm.
- the transmittance when transmitting through (long) was measured (parallel light transmittance).
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Abstract
Description
本発明は、エアロゲルの製造方法、エアロゲル、エアロゲルブロック及びポリシロキサン化合物に関する。 The present invention relates to an airgel production method, an airgel, an airgel block, and a polysiloxane compound.
熱伝導率が小さく断熱性を有する材料としてシリカエアロゲルが知られている。シリカエアロゲルは、優れた機能性(断熱性等)、特異な光学特性、特異な電気特性などを有する機能素材として有用なものであり、例えば、シリカエアロゲルの超低誘電率特性を利用した電子基板材料、シリカエアロゲルの高断熱性を利用した断熱材料、シリカエアロゲルの超低屈折率を利用した光反射材料等に用いられている。このようなシリカエアロゲルを製造する方法として、例えばアルコキシシランを加水分解し、重合して得られたゲル状化合物(アルコゲル)を、分散媒の超臨界条件下で乾燥する超臨界乾燥法(例えば特許文献1参照)、あるいは当該アルコゲルの強度を向上させた上で常圧で乾燥させる方法(例えば特許文献2参照)が知られている。 Silica airgel is known as a material having low thermal conductivity and heat insulation. Silica airgel is useful as a functional material having excellent functionality (thermal insulation, etc.), unique optical properties, and unique electrical properties. For example, an electronic substrate utilizing the ultra-low dielectric constant properties of silica airgel It is used as a material, a heat insulating material using the high heat insulating property of silica airgel, a light reflecting material using the ultra-low refractive index of silica airgel, and the like. As a method for producing such a silica aerogel, for example, a supercritical drying method (for example, a patent) in which a gel compound (alcogel) obtained by hydrolyzing and polymerizing alkoxysilane is dried under supercritical conditions of a dispersion medium. Document 1) or a method of improving the strength of the alcogel and drying at normal pressure (for example, see Patent Document 2) is known.
ところで、従来周知の製造方法で得られるエアロゲルはある程度の可視光透過性を有しているものの、強度が極めて低く脆い。一方で、従来の知見に基づきそのようなエアロゲルの強度を高めようとすると、可視光透過性が極端に低下してしまうのが現状である。 Incidentally, an airgel obtained by a conventionally known production method has a certain degree of visible light permeability, but is extremely low in strength and brittle. On the other hand, if it is attempted to increase the strength of such an airgel based on conventional knowledge, the visible light transmittance is extremely lowered.
本発明は上記の事情に鑑みてなされたものであり、良好な可視光透過率と強度とを両立可能なエアロゲルの製造方法を提供することを目的とする。本発明はまた、そのような製造方法により得られるエアロゲル、当該エアロゲルを含むエアロゲルブロック、さらには当該エアロゲルを得るためのエアロゲル形成用ポリシロキサン化合物を提供することを目的とする。 The present invention has been made in view of the above circumstances, and an object thereof is to provide a method for producing an airgel capable of achieving both good visible light transmittance and strength. Another object of the present invention is to provide an airgel obtained by such a production method, an airgel block containing the airgel, and an airgel-forming polysiloxane compound for obtaining the airgel.
本発明者らは、上記目的を達成するために鋭意検討を重ねた結果、特定のポリシロキサン化合物を用いることが重要であることを見出し、本発明を完成するに至った。 As a result of intensive studies in order to achieve the above object, the present inventors have found that it is important to use a specific polysiloxane compound, and have completed the present invention.
本発明は、ケイ素化合物又はケイ素化合物の加水分解生成物を含有するゾルを生成するゾル生成工程と、ゾルをゲル化して、湿潤ゲルを得る湿潤ゲル生成工程と、湿潤ゲルを乾燥してエアロゲルを得る乾燥工程と、を備え、ケイ素化合物が下記一般式(S)で表される構造を有するポリシロキサン化合物を含む、エアロゲルの製造方法を提供する。このような製造方法であれば、良好な可視光透過率と強度とを両立可能なエアロゲルを得ることができる。
本発明の製造方法において、ケイ素化合物がさらに3官能シランモノマー及びシランオリゴマーの少なくとも一種を含んでいてもよい。ここで、3官能シランモノマーは、加水分解性の官能基又は縮合性の官能基が3個結合したケイ素原子を有するものであり、シランオリゴマーは、ケイ素原子の総数に対し、3個の酸素原子と結合したケイ素原子を50%以上有するものである。これにより、強度をより向上できるとともに、乾燥工程における体積収縮及びクラックの発生を抑制し易くなる。特に体積収縮及びクラックの発生が抑制されることにより、良好な可視光透過性と断熱性とを有するエアロゲルブロックが得易くなる。 In the production method of the present invention, the silicon compound may further contain at least one of a trifunctional silane monomer and a silane oligomer. Here, the trifunctional silane monomer has a silicon atom to which three hydrolyzable functional groups or condensable functional groups are bonded, and the silane oligomer has three oxygen atoms with respect to the total number of silicon atoms. And 50% or more of silicon atoms bonded to each other. Thereby, while being able to improve intensity | strength more, it becomes easy to suppress generation | occurrence | production of volume shrinkage and a crack in a drying process. In particular, by suppressing the volume shrinkage and the generation of cracks, an airgel block having good visible light permeability and heat insulating properties can be easily obtained.
本発明はまた、可視光透過率が65%以上であり、単位体積当たりの曲げ破断エネルギーが0.30mJ/cm3以上である、エアロゲルブロックを提供する。このようなエアロゲルブロックは、非常に高い水準で可視光透過率と強度とを共に有すると言える。 The present invention also provides an airgel block having a visible light transmittance of 65% or more and a bending fracture energy per unit volume of 0.30 mJ / cm 3 or more. Such an airgel block can be said to have both visible light transmittance and strength at a very high level.
本発明のエアロゲルブロックは、下記一般式(S1)で表される構造を有するエアロゲルを含むことができる。下記構造は、良好な可視光透過率と強度とを両立可能なエアロゲルを得るために用いられる上記一般式(S)に由来する構造であってもよい。
本発明はまた、下記一般式(S)で表される構造を有するポリシロキサン化合物の加水分解生成物を含有するゾルの縮合物である湿潤ゲルの乾燥物である、エアロゲルを提供する。このようなエアロゲルは、良好な可視光透過率と強度とを両立可能である。
本発明はさらに、下記一般式(S)で表される構造を有する、エアロゲル形成用ポリシロキサン化合物を提供する。下記一般式(S)で表される構造を有するポリシロキサン化合物は、良好な可視光透過率と強度とを両立するエアロゲルを得るために特に有用であり、このようなポリシロキサン化合物がエアロゲル形成用の材料として従来使用された例は確認されていない。
本発明によれば、良好な可視光透過率と強度とを両立可能なエアロゲルの製造方法を提供することができる。本発明はまた、そのような製造方法により得られるエアロゲル、当該エアロゲルを含むエアロゲルブロック、さらには当該エアロゲルを得るためのエアロゲル形成用ポリシロキサン化合物を提供することができる。 According to the present invention, it is possible to provide a method for producing an airgel capable of achieving both good visible light transmittance and strength. The present invention can also provide an airgel obtained by such a production method, an airgel block containing the airgel, and an airgel-forming polysiloxane compound for obtaining the airgel.
以下、本発明の好適な実施形態について説明する。詳細に説明する。ただし、本発明は以下の実施形態に限定されるものではない。本明細書において、「~」を用いて示された数値範囲は、「~」の前後に記載される数値をそれぞれ最小値及び最大値として含む範囲を示す。「A又はB」とは、A及びBのいずれか一方を含んでいればよく、両方を含んでいてもよい。本実施形態で例示する材料は、特に断らない限り、1種を単独で又は2種以上を組み合わせて用いることができる。 Hereinafter, preferred embodiments of the present invention will be described. This will be described in detail. However, the present invention is not limited to the following embodiments. In this specification, a numerical range indicated by using “to” indicates a range including the numerical values described before and after “to” as the minimum value and the maximum value, respectively. “A or B” only needs to include one of A and B, and may include both. The materials exemplified in this embodiment can be used singly or in combination of two or more unless otherwise specified.
<エアロゲルの製造方法>
本実施形態に係るエアロゲルの製造方法は、ケイ素化合物又はケイ素化合物の加水分解生成物(ケイ素化合物及びケイ素化合物の加水分解生成物からなる群より選択される少なくとも一種)を含有するゾルを生成するゾル生成工程と、ゾルをゲル化して、湿潤ゲルを得る湿潤ゲル生成工程と、湿潤ゲルを乾燥してエアロゲルを得る乾燥工程と、を備える。なお、より具体的には、本実施形態に係るエアロゲルの製造方法は、乾燥工程の前工程として湿潤ゲルを洗浄する洗浄工程を更に備えることができる。
<Method for producing airgel>
The method for producing an airgel according to this embodiment includes a sol that generates a sol containing a silicon compound or a hydrolysis product of the silicon compound (at least one selected from the group consisting of a silicon compound and a hydrolysis product of the silicon compound). A production step, a wet gel production step of gelling the sol to obtain a wet gel, and a drying step of drying the wet gel to obtain an airgel. More specifically, the airgel manufacturing method according to the present embodiment can further include a washing step of washing the wet gel as a pre-step of the drying step.
なお、ゾルとは、ゲル化反応が生じる前の状態であって、本実施形態においては、ケイ素化合物又はケイ素化合物の加水分解生成物が液体媒体中に溶解又は分散している状態を意味する。また、湿潤ゲルとは、液体媒体を含んでいながらも、流動性を有しない湿潤状態のゲル固形物を意味する。 The sol means a state before the gelation reaction occurs, and in the present embodiment, it means a state in which the silicon compound or a hydrolysis product of the silicon compound is dissolved or dispersed in the liquid medium. The wet gel means a gel solid in a wet state that contains a liquid medium but does not have fluidity.
(ゾル生成工程)
ゾル生成工程は、具体的には下記一般式(S)で表される構造を有するポリシロキサン化合物を含むゾル、あるいは当該ポリシロキサン化合物を加水分解してポリシロキサン化合物の加水分解生成物を含むゾル、を生成する工程である。このような製造方法では、特定のポリシロキサン化合物を用いることで良好な可視光透過率と強度とを両立するエアロゲルを得ることができる。なお、このような優れた効果が得られる理由を、発明者らは次のように推察する。すなわち、可視光透過率については、一般式(S)における両端の多官能ケイ素ユニットにより可視光の波長以下の径の微細孔構造が得られ易いことにより、可視光透過率を低下する要因となるミー散乱が生じ難いエアロゲルが得られているものと考えられる。また、強度については、一般式(S)における中央のジオルガノシロキサンユニットにより可撓性が担保され、また当該ユニットの両端の多官能ケイ素ユニットにより剛性が発現され、結果的に高強度のエアロゲル骨格が得られているものと考えられる。なお、一般式(S)で表される構造を有するポリシロキサン化合物を使用することにより、後述する一般式(S1)で表される構造をエアロゲルの骨格中に導入することができる。
Specifically, the sol generation step includes a sol containing a polysiloxane compound having a structure represented by the following general formula (S), or a sol containing a hydrolysis product of the polysiloxane compound by hydrolyzing the polysiloxane compound. , Is a step of generating. In such a production method, an airgel having both good visible light transmittance and strength can be obtained by using a specific polysiloxane compound. The inventors infer the reason why such an excellent effect is obtained as follows. That is, with respect to the visible light transmittance, the polyfunctional silicon units at both ends in the general formula (S) are easy to obtain a microporous structure having a diameter equal to or smaller than the wavelength of visible light, which causes a decrease in the visible light transmittance. It is considered that an airgel in which Mie scattering hardly occurs is obtained. As for strength, flexibility is ensured by the central diorganosiloxane unit in the general formula (S), and rigidity is expressed by the polyfunctional silicon units at both ends of the unit, resulting in a high-strength airgel skeleton. Is considered to have been obtained. Note that by using a polysiloxane compound having a structure represented by formula (S), it can be introduced the structure represented by the general formula (S 1) to be described later in the backbone of the airgel.
式(S)中、R1sはそれぞれ独立にアルキル基又はアリール基を示し、R2sはそれぞれ独立にアルキル基、アリール基又は水素を示す。ここで、アリール基としてはフェニル基、置換フェニル基等が挙げられる。また、置換フェニル基の置換基としては、アルキル基、ビニル基、メルカプト基、アミノ基、ニトロ基、シアノ基等が挙げられる。式(S)中、2個以上のR1sは各々同一であっても異なっていてもよく、同様に2個のR2sは各々同一であっても異なっていてもよい。また、式(S)中、nsは2以上の整数を示し、msは2以上の整数を示し、lsは2以上の整数を示す。 In the formula (S), R 1s independently represents an alkyl group or an aryl group, and R 2s independently represents an alkyl group, an aryl group or hydrogen. Here, examples of the aryl group include a phenyl group and a substituted phenyl group. In addition, examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group. In the formula (S), two or more R 1s may be the same or different, and similarly, two R 2s may be the same or different. In formula (S), ns represents an integer of 2 or more, ms represents an integer of 2 or more, and ls represents an integer of 2 or more.
良好な可視光透過率と強度とを両立するエアロゲルを形成し易いという観点から、R1s及びR2sとしては、それぞれ独立に炭素数が1~6のアルキル基、フェニル基等が挙げられ、当該アルキル基としては、メチル基等が挙げられる。また、同様の観点から、nsは3以上の整数とすることができ、4以上の整数であってもよく、その上限は20とすることができる。msは3以上の整数とすることができ、その上限は30とすることができる。lsは3以上の整数とすることができ、4以上の整数であってもよく、その上限は20とすることができる。nsとlsとは同一であってもよい。 R 1s and R 2s are each independently an alkyl group having 1 to 6 carbon atoms, a phenyl group, or the like from the viewpoint of easily forming an airgel having both good visible light transmittance and strength. Examples of the alkyl group include a methyl group. From the same viewpoint, ns can be an integer of 3 or more, can be an integer of 4 or more, and the upper limit thereof can be 20. ms can be an integer greater than or equal to 3, with an upper limit of 30. ls can be an integer of 3 or more, can be an integer of 4 or more, and the upper limit thereof can be 20. ns and ls may be the same.
なお、R2sがアルキル基である場合、上記ポリシロキサン化合物はアルコキシ基を有する。本工程において分子中のアルコキシ基は加水分解されていてもよく、その場合アルコキシ基の全てが加水分解されていてもよいし、部分的に加水分解されていてもよい。すなわち、アルコキシ基を有するポリシロキサン化合物とその加水分解生成物は混在していてもよい。 When R 2s is an alkyl group, the polysiloxane compound has an alkoxy group. In this step, the alkoxy group in the molecule may be hydrolyzed, in which case all of the alkoxy groups may be hydrolyzed or partially hydrolyzed. That is, the polysiloxane compound having an alkoxy group and the hydrolysis product thereof may be mixed.
ゾル生成工程では、上記特定のポリシロキサン化合物以外の他のケイ素化合物をさらに用いることができる。そのような他のケイ素化合物としては、例えば加水分解性の反応基又は縮合性の官能基を有する他のポリシロキサン化合物(但し、後述のT単位の割合が50%未満、又は、ケイ素原子の数が100個を超える)が挙げられる。加水分解性の反応基としてはアルコキシ基が挙げられ、アルコキシ基の具体例としては、メトキシ基、エトキシ基、プロポキシ基等が挙げられ、加水分解反応の反応速度の観点から、メトキシ基及びエトキシ基が好ましい。縮合性の官能基としては水酸基(ヒドロキシアルキル基等の水酸基含有基を含む)、シラノール基等が挙げられる。なお、他のポリシロキサン化合物をさらに用いることで、エアロゲルの柔軟性及び強靭性を向上させ易い。 In the sol production step, other silicon compounds other than the specific polysiloxane compound can be further used. Examples of such other silicon compounds include other polysiloxane compounds having a hydrolyzable reactive group or a condensable functional group (provided that the proportion of T units described below is less than 50%, or the number of silicon atoms More than 100). Examples of the hydrolyzable reactive group include an alkoxy group. Specific examples of the alkoxy group include a methoxy group, an ethoxy group, and a propoxy group. From the viewpoint of the reaction rate of the hydrolysis reaction, a methoxy group and an ethoxy group. Is preferred. Examples of condensable functional groups include hydroxyl groups (including hydroxyl-containing groups such as hydroxyalkyl groups), silanol groups, and the like. In addition, it is easy to improve the softness | flexibility and toughness of airgel by further using another polysiloxane compound.
水酸基(ヒドロキシアルキル基)を有するポリシロキサン化合物(上記一般式(S)で表される構造を有するものを除く)としては、例えば、下記一般式(A)で表される構造を有するものが挙げられる。下記一般式(A)で表される構造を有するポリシロキサン化合物を使用することにより、後述する一般式(1)及び式(1a)で表される構造をエアロゲルの骨格中に導入することができる。 Examples of the polysiloxane compound having a hydroxyl group (hydroxyalkyl group) (excluding those having a structure represented by the above general formula (S)) include those having a structure represented by the following general formula (A). It is done. By using a polysiloxane compound having a structure represented by the following general formula (A), the structure represented by the following general formula (1) and formula (1a) can be introduced into the skeleton of the airgel. .
式(A)中、R1aはヒドロキシアルキル基を示し、R2aはアルキレン基を示し、R3a及びR4aはそれぞれ独立にアルキル基又はアリール基を示し、nは1~50の整数を示す。ここで、アリール基としてはフェニル基、置換フェニル基等が挙げられる。また、置換フェニル基の置換基としては、アルキル基、ビニル基、メルカプト基、アミノ基、ニトロ基、シアノ基等が挙げられる。なお、式(A)中、2個のR1aは各々同一であっても異なっていてもよく、同様に2個のR2aは各々同一であっても異なっていてもよい。また、式(A)中、2個以上のR3aは各々同一であっても異なっていてもよく、同様に2個以上のR4aは各々同一であっても異なっていてもよい。 In formula (A), R 1a represents a hydroxyalkyl group, R 2a represents an alkylene group, R 3a and R 4a each independently represents an alkyl group or an aryl group, and n represents an integer of 1 to 50. Here, examples of the aryl group include a phenyl group and a substituted phenyl group. In addition, examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group. In the formula (A), two R 1a s may be the same or different, and similarly, two R 2a s may be the same or different. In the formula (A), two or more R 3a s may be the same or different, and similarly two or more R 4a s may be the same or different.
式(A)中、R1aとしては炭素数が1~6のヒドロキシアルキル基等が挙げられ、当該ヒドロキシアルキル基としてはヒドロキシエチル基、ヒドロキシプロピル基等が挙げられる。また、式(A)中、R2aとしては炭素数が1~6のアルキレン基等が挙げられ、当該アルキレン基としてはエチレン基、プロピレン基等が挙げられる。また、式(A)中、R3a及びR4aとしてはそれぞれ独立に炭素数が1~6のアルキル基、フェニル基等が挙げられ、当該アルキル基としてはメチル基等が挙げられる。また、式(A)中、nは2~30とすることができるが、5~20であってもよい。 In formula (A), examples of R 1a include a hydroxyalkyl group having 1 to 6 carbon atoms, and examples of the hydroxyalkyl group include a hydroxyethyl group and a hydroxypropyl group. In the formula (A), examples of R 2a include an alkylene group having 1 to 6 carbon atoms, and examples of the alkylene group include an ethylene group and a propylene group. In the formula (A), R 3a and R 4a each independently include an alkyl group having 1 to 6 carbon atoms, a phenyl group, and the like, and examples of the alkyl group include a methyl group. In the formula (A), n can be 2 to 30, but may be 5 to 20.
上記一般式(A)で表される構造を有するポリシロキサン化合物としては、市販品を用いることができ、X-22-160AS、KF-6001、KF-6002、KF-6003等の化合物(いずれも、信越化学工業株式会社製)、XF42-B0970、Fluid OFOH 702-4%等の化合物(いずれも、モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社製)などが挙げられる。 As the polysiloxane compound having the structure represented by the general formula (A), a commercially available product can be used, and compounds such as X-22-160AS, KF-6001, KF-6002, and KF-6003 (all of them) , Manufactured by Shin-Etsu Chemical Co., Ltd.), compounds such as XF42-B0970, Fluid OFOH 702-4% (all manufactured by Momentive Performance Materials Japan GK).
アルコキシ基を有するポリシロキサン化合物(上記一般式(S)で表される構造を有するものを除く)としては、例えば、下記一般式(B)で表される構造を有するものが挙げられる。下記一般式(B)で表される構造を有するポリシロキサン化合物を使用することにより、後述する一般式(2)又は(3)で表される橋かけ部を有するラダー型構造をエアロゲルの骨格中に導入することができる。 Examples of the polysiloxane compound having an alkoxy group (excluding those having a structure represented by the above general formula (S)) include those having a structure represented by the following general formula (B). By using a polysiloxane compound having a structure represented by the following general formula (B), a ladder structure having a bridge portion represented by the following general formula (2) or (3) can be formed in the skeleton of the airgel. Can be introduced.
式(B)中、R1bはアルキル基、アルコキシ基又はアリール基を示し、R2b及びR3bはそれぞれ独立にアルコキシ基を示し、R4b及びR5bはそれぞれ独立にアルキル基又はアリール基を示し、mは1~50の整数を示す。ここで、アリール基としてはフェニル基、置換フェニル基等が挙げられる。また、置換フェニル基の置換基としては、アルキル基、ビニル基、メルカプト基、アミノ基、ニトロ基、シアノ基等が挙げられる。なお、式(B)中、2個のR1bは各々同一であっても異なっていてもよく、2個のR2bは各々同一であっても異なっていてもよく、同様に2個のR3bは各々同一であっても異なっていてもよい。また、式(B)中、mが2以上の整数の場合、2個以上のR4bは各々同一であっても異なっていてもよく、同様に2個以上のR5bも各々同一であっても異なっていてもよい。 In formula (B), R 1b represents an alkyl group, an alkoxy group or an aryl group, R 2b and R 3b each independently represent an alkoxy group, and R 4b and R 5b each independently represent an alkyl group or an aryl group. , M represents an integer of 1 to 50. Here, examples of the aryl group include a phenyl group and a substituted phenyl group. In addition, examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group. In the formula (B), two R 1b s may be the same or different from each other, and two R 2b s may be the same or different from each other, and similarly two R 1b s. 3b may be the same or different. In the formula (B), when m is an integer of 2 or more, two or more R 4b s may be the same or different, and similarly two or more R 5b s are each the same. May be different.
式(B)中、R1bとしては炭素数が1~6のアルキル基、炭素数が1~6のアルコキシ基等が挙げられ、当該アルキル基又はアルコキシ基としてはメチル基、メトキシ基、エトキシ基等が挙げられる。また、式(B)中、R2b及びR3bとしてはそれぞれ独立に炭素数が1~6のアルコキシ基等が挙げられ、当該アルコキシ基としてはメトキシ基、エトキシ基等が挙げられる。また、式(B)中、R4b及びR5bとしてはそれぞれ独立に炭素数が1~6のアルキル基、フェニル基等が挙げられ、当該アルキル基としてはメチル基等が挙げられる。また、式(B)中、mは2~30とすることができるが、5~20であってもよい。 In the formula (B), examples of R 1b include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and the alkyl group or alkoxy group includes a methyl group, a methoxy group, and an ethoxy group. Etc. In the formula (B), R 2b and R 3b each independently include an alkoxy group having 1 to 6 carbon atoms, and examples of the alkoxy group include a methoxy group and an ethoxy group. In the formula (B), R 4b and R 5b each independently include an alkyl group having 1 to 6 carbon atoms, a phenyl group, and the like, and examples of the alkyl group include a methyl group and the like. In the formula (B), m can be 2 to 30, but may be 5 to 20.
上記一般式(B)で表される構造を有するポリシロキサン化合物は、特開2000-26609号公報、特開2012-233110号公報等にて報告される製造方法を適宜参照して得ることができる。 The polysiloxane compound having the structure represented by the general formula (B) can be obtained by appropriately referring to the production methods reported in JP-A Nos. 2000-26609 and 2012-233110. .
また、アルコキシ基を有するポリシロキサン化合物としては、例えば、メチルシリケートオリゴマー、エチルシリケートオリゴマー等のシリケートオリゴマーを用いることもできる。このようなシリケートオリゴマーとしては、例えば、メチルシリケート51、メチルシリケート53A、エチルシリケート40、エチルシリケート48(いずれも、コルコート株式会社製)等が挙げられる。 Also, as the polysiloxane compound having an alkoxy group, for example, silicate oligomers such as methyl silicate oligomer and ethyl silicate oligomer can be used. Examples of such silicate oligomers include methyl silicate 51, methyl silicate 53A, ethyl silicate 40, and ethyl silicate 48 (all manufactured by Colcoat Co., Ltd.).
また、上記の他のケイ素化合物としては、例えば、加水分解性の官能基又は縮合性の官能基を有するシランモノマーが挙げられる。加水分解性の官能基及び縮合性の官能基としては上記に例示した基と同じ基が例示できる。なお、シランモノマーは、シロキサン結合(Si-O-Si)を有しないケイ素化合物ということもできる。なお、シランモノマーをさらに用いることで、エアロゲルの柔軟性及び強靭性を向上させ易い。 In addition, examples of the other silicon compounds include silane monomers having a hydrolyzable functional group or a condensable functional group. Examples of the hydrolyzable functional group and the condensable functional group include the same groups as those exemplified above. Note that the silane monomer can also be referred to as a silicon compound having no siloxane bond (Si—O—Si). In addition, it is easy to improve the softness | flexibility and toughness of an airgel by further using a silane monomer.
加水分解性の官能基を有するシランモノマーとしては、例えば、モノアルキルトリアルコキシシラン、モノアリールトリアルコキシシラン、モノアルキルジアルコキシシラン、モノアリールジアルコキシシラン、ジアルキルジアルコキシシラン、ジアリールジアルコキシシラン、モノアルキルモノアルコキシシラン、モノアリールモノアルコキシシラン、ジアルキルモノアルコキシシラン、ジアリールモノアルコキシシラン、トリアルキルモノアルコキシシラン、トリアリールモノアルコキシシラン、テトラアルコキシシラン等が挙げられる。具体的には、メチルトリメトキシシラン、メチルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトシシシラン、メチルジメトキシシラン、ジメチルジエトキシシラン、ジメチルジメトキシシラン、エチルトリメトキシシラン、ヘキシルトリメトキシシラン、テトラエトキシシラン等が挙げられる。 Examples of the silane monomer having a hydrolyzable functional group include monoalkyltrialkoxysilane, monoaryltrialkoxysilane, monoalkyldialkoxysilane, monoaryl dialkoxysilane, dialkyl dialkoxysilane, diaryl dialkoxysilane, Examples thereof include alkyl monoalkoxy silane, monoaryl monoalkoxy silane, dialkyl monoalkoxy silane, diaryl monoalkoxy silane, trialkyl monoalkoxy silane, triaryl monoalkoxy silane, and tetraalkoxy silane. Specifically, methyltrimethoxysilane, methyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, methyldimethoxysilane, dimethyldiethoxysilane, dimethyldimethoxysilane, ethyltrimethoxysilane, hexyltrimethoxysilane, tetraethoxy Silane etc. are mentioned.
縮合性の官能基を有するシランモノマーとしては、例えば、シランテトラオール、メチルシラントリオール、ジメチルシランジオール、フェニルシラントリオール、フェニルメチルシランジオール、ジフェニルシランジオール、n-プロピルシラントリオール、ヘキシルシラントリオール、オクチルシラントリオール、デシルシラントリオール、トリフルオロプロピルシラントリオール等が挙げられる。 Examples of the silane monomer having a condensable functional group include silane tetraol, methyl silane triol, dimethyl silane diol, phenyl silane triol, phenyl methyl silane diol, diphenyl silane diol, n-propyl silane triol, hexyl silane triol, octyl. Examples thereof include silane triol, decyl silane triol, and trifluoropropyl silane triol.
シランモノマーは、加水分解性の官能基及び縮合性の官能基とは異なる反応性基をさらに有していてもよい。反応性基としては、エポキシ基、メルカプト基、グリシドキシ基、ビニル基、アクリロイル基、メタクリロイル基、アミノ基等が挙げられる。エポキシ基は、グリシドキシ基等のエポキシ基含有基に含まれていてもよい。 The silane monomer may further have a reactive group different from the hydrolyzable functional group and the condensable functional group. Examples of the reactive group include an epoxy group, a mercapto group, a glycidoxy group, a vinyl group, an acryloyl group, a methacryloyl group, and an amino group. The epoxy group may be contained in an epoxy group-containing group such as a glycidoxy group.
加水分解性の官能基及び反応性基を有するシランモノマーとしては、例えば、ビニルトリメトキシシラン、3-グリシドキシプロピルトリメトキシシラン、3-グリシドキシプロピルメチルジメトキシシラン、3-メタクリロキシプロピルトリメトキシシラン、3-メタクリロキシプロピルメチルジメトキシシラン、3-アクリロキシプロピルトリメトキシシラン、3-メルカプトプロピルトリメトキシシラン、3-メルカプトプロピルメチルジメトキシシラン、N-フェニル-3-アミノプロピルトリメトキシシラン、N-2-(アミノエチル)-3-アミノプロピルメチルジメトキシシラン等が挙げられる。 Examples of silane monomers having hydrolyzable functional groups and reactive groups include vinyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethyl. Methoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropylmethyldimethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, N Examples include -2- (aminoethyl) -3-aminopropylmethyldimethoxysilane.
縮合性の官能基及び反応性基を有するシランモノマーとしては、例えば、ビニルシラントリオール、3-グリシドキシプロピルシラントリオール、3-グリシドキシプロピルメチルシランジオール、3-メタクリロキシプロピルシラントリオール、3-メタクリロキシプロピルメチルシランジオール、3-アクリロキシプロピルシラントリオール、3-メルカプトプロピルシラントリオール、3-メルカプトプロピルメチルシランジオール、N-フェニル-3-アミノプロピルシラントリオール、N-2-(アミノエチル)-3-アミノプロピルメチルシランジオール等が挙げられる。 Examples of the silane monomer having a condensable functional group and a reactive group include vinyl silane triol, 3-glycidoxypropyl silane triol, 3-glycidoxypropyl methyl silane diol, 3-methacryloxypropyl silane triol, 3- Methacryloxypropylmethylsilanediol, 3-acryloxypropylsilanetriol, 3-mercaptopropylsilanetriol, 3-mercaptopropylmethylsilanediol, N-phenyl-3-aminopropylsilanetriol, N-2- (aminoethyl)- Examples include 3-aminopropylmethylsilanediol.
また、シランモノマーは2以上のケイ素原子を有していてもよく、このようなシランモノマーとしては、ビストリメトキシシリルメタン、ビストリメトキシシリルエタン、ビストリメトキシシリルヘキサン等が挙げられる。 The silane monomer may have two or more silicon atoms, and examples of such silane monomer include bistrimethoxysilylmethane, bistrimethoxysilylethane, and bistrimethoxysilylhexane.
上記のシランモノマーの中で、特に3官能シランモノマー、すなわち、加水分解性の官能基又は縮合性の官能基が3個結合したケイ素原子を有するモノマーをさらに用いることで、強度をより向上できるとともに、乾燥工程における体積収縮及びクラックの発生を抑制し易くなる。3官能シランモノマーとしては、例えば、上記のメチルトリメトキシシラン、メチルシラントリオール、ビストリメトキシシリルメタン等が挙げられる。 Among the above silane monomers, in particular, a trifunctional silane monomer, that is, a monomer having a silicon atom bonded with three hydrolyzable functional groups or three condensable functional groups can further improve the strength. It becomes easy to suppress the volume shrinkage and the generation of cracks in the drying process. Examples of the trifunctional silane monomer include the above-mentioned methyltrimethoxysilane, methylsilanetriol, and bistrimethoxysilylmethane.
また、上記の他のケイ素化合物としてはシランオリゴマーが挙げられる。シランオリゴマーはシランモノマーの重合体であり、複数のケイ素原子が酸素原子を介して連結された構造を有する。本明細書中、シランオリゴマーは、1分子中のケイ素原子の数が2~100個の重合体を示す。シランオリゴマーは、例えば、上記のシランモノマーの一種又は二種以上の重合体であってよい。なお、シランオリゴマーをさらに用いることで、強度をより向上できるとともに、乾燥工程における体積収縮及びクラックの発生を抑制し易くなる。特に体積収縮及びクラックの発生が抑制されることにより、良好な可視光透過性と断熱性とを有するエアロゲルブロックが得易くなる。 In addition, examples of the other silicon compounds include silane oligomers. A silane oligomer is a polymer of a silane monomer, and has a structure in which a plurality of silicon atoms are linked through oxygen atoms. In the present specification, the silane oligomer indicates a polymer having 2 to 100 silicon atoms in one molecule. The silane oligomer may be, for example, one or more polymers of the above silane monomers. In addition, by further using a silane oligomer, the strength can be further improved, and volume shrinkage and cracking in the drying process can be easily suppressed. In particular, by suppressing the volume shrinkage and the generation of cracks, an airgel block having good visible light permeability and heat insulating properties can be easily obtained.
シランオリゴマーに含まれるケイ素原子は、1個の酸素原子と結合したケイ素原子(M単位)、2個の酸素原子と結合したケイ素原子(D単位)、3個の酸素原子と結合したケイ素原子(T単位)及び4個の酸素原子と結合したケイ素原子(Q単位)に区別することができる。M単位、D単位、T単位及びQ単位としては、それぞれ以下の式(M)、(D)、(T)及び(Q)が例示できる。 The silicon atom contained in the silane oligomer is a silicon atom bonded to one oxygen atom (M unit), a silicon atom bonded to two oxygen atoms (D unit), a silicon atom bonded to three oxygen atoms ( A distinction can be made between T units) and silicon atoms bonded to four oxygen atoms (Q units). Examples of the M unit, the D unit, the T unit, and the Q unit include the following formulas (M), (D), (T), and (Q), respectively.
上記式中、Rはケイ素に結合する酸素原子以外の原子(水素原子等)又は原子団(アルキル基等)を示す。これらの単位の含有量に関する情報は、Si-NMRにより得ることができる。 In the above formula, R represents an atom other than an oxygen atom bonded to silicon (such as a hydrogen atom) or an atomic group (such as an alkyl group). Information on the content of these units can be obtained by Si-NMR.
シランオリゴマーとしては、ケイ素原子の総数に対し、3個の酸素原子と結合したケイ素原子(T単位)を50%以上有するものを用いることができる。特に、3官能シランモノマーであるアルキルトリアルコキシシランを一定量以上含むシランモノマーの重合体であることが好ましい。なお、シランオリゴマーにおいて、上記T単位の割合は、好ましくは60%以上、より好ましくは70%以上であり、100%であってもよい。 As the silane oligomer, those having 50% or more of silicon atoms (T units) bonded to three oxygen atoms can be used with respect to the total number of silicon atoms. In particular, a polymer of a silane monomer containing a certain amount or more of alkyltrialkoxysilane which is a trifunctional silane monomer is preferable. In the silane oligomer, the proportion of the T unit is preferably 60% or more, more preferably 70% or more, and may be 100%.
シランオリゴマーは、上記の式(M)、(D)、(T)及び(Q)中のRとして、アルキル基又はアリール基を有していることが好ましい。 The silane oligomer preferably has an alkyl group or an aryl group as R in the above formulas (M), (D), (T) and (Q).
アルキル基としては、例えば、炭素数1~6のアルキル基が挙げられる。アルキル基の具体例としては、メチル基、エチル基、プロピル基、ブチル基等が挙げられ、これらのうちメチル基、エチル基が好ましく、メチル基がより好ましい。 Examples of the alkyl group include an alkyl group having 1 to 6 carbon atoms. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and a butyl group. Among these, a methyl group and an ethyl group are preferable, and a methyl group is more preferable.
アリール基としては、フェニル基、置換フェニル基等が挙げられる。置換フェニル基の置換基としては、アルキル基、ビニル基、メルカプト基、アミノ基、ニトロ基、シアノ基等が挙げられる。アリール基としては、フェニル基が好ましい。 Examples of the aryl group include a phenyl group and a substituted phenyl group. Examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group. As the aryl group, a phenyl group is preferable.
シランオリゴマーは加水分解性の官能基を有しており、ゾル生成工程において加水分解されていてもよい。この加水分解性の官能基が加水分解されると、シラノール基が生じると考えられる。加水分解性の官能基としては、アルコキシ基が挙げられる。 The silane oligomer has a hydrolyzable functional group, and may be hydrolyzed in the sol production step. It is considered that when this hydrolyzable functional group is hydrolyzed, a silanol group is generated. Examples of the hydrolyzable functional group include an alkoxy group.
シランオリゴマーの重量平均分子量は、例えば200以上であってよく、好ましくは400以上、より好ましくは600以上である。また、シランオリゴマーの重量平均分子量は、例えば10000以下であってよく、好ましくは7000以下、より好ましくは5000以下である。なお、本明細書中、重量平均分子量は、ゲルパーミエーションクロマトグラフィ(GPC)で測定した標準ポリスチレン換算の重量平均分子量を示す。 The weight average molecular weight of the silane oligomer may be, for example, 200 or more, preferably 400 or more, more preferably 600 or more. Moreover, the weight average molecular weight of a silane oligomer may be 10,000 or less, for example, Preferably it is 7000 or less, More preferably, it is 5000 or less. In addition, in this specification, a weight average molecular weight shows the weight average molecular weight of standard polystyrene conversion measured by gel permeation chromatography (GPC).
シランオリゴマーとしては市販品を用いてもよく、例えば、XR31-B1410、XC96-B0446(いずれも、モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社製)、KR-500、KR-515、X-40-9225、KC-89S(いずれも、信越化学工業株式会社製)、SR-2402、AY42-163(いずれも、東レ・ダウコーニング株式会社製)等が挙げられる。 Commercially available products may be used as the silane oligomer. For example, XR31-B1410, XC96-B0446 (all manufactured by Momentive Performance Materials Japan GK), KR-500, KR-515, X-40- 9225, KC-89S (all manufactured by Shin-Etsu Chemical Co., Ltd.), SR-2402, AY42-163 (all manufactured by Toray Dow Corning Co., Ltd.) and the like.
上記ゾルに含まれるケイ素化合物の含有量は、良好な反応性を得易くなる観点から、ゾルの総量100質量部に対し、5質量部以上であってもよく、10質量部以上であってもよい。上記ゾルに含まれるケイ素化合物の含有量は、良好な相溶性を得易くなる観点から、ゾルの総量100質量部に対し、50質量部以下であってもよく、40質量部以下であってもよい。 The content of the silicon compound contained in the sol may be 5 parts by mass or more and 10 parts by mass or more with respect to 100 parts by mass of the total amount of the sol from the viewpoint of easily obtaining good reactivity. Good. The content of the silicon compound contained in the sol may be 50 parts by mass or less and 40 parts by mass or less with respect to 100 parts by mass of the total amount of the sol from the viewpoint of easily obtaining good compatibility. Good.
ゾル生成工程で用いられるケイ素化合物のうち、上記一般式(S)で表される構造を有するポリシロキサン化合物の含有量は、良好な可視光透過率と強度とを両立し易いという観点から、ケイ素化合物の全量を基準として、5質量%以上とすることができ、8質量%以上であってもよく、10質量%以上であってもよい。なお、当該含有量の上限は、ゾルの相溶性を高め、良好な可視光透過性を有するエアロゲルを得易いという観点から、95質量%以下とすることができ、90質量%以下であってもよい。 Among the silicon compounds used in the sol generation step, the content of the polysiloxane compound having the structure represented by the general formula (S) is from the viewpoint that it is easy to achieve both good visible light transmittance and strength. Based on the total amount of the compound, it can be 5% by mass or more, 8% by mass or more, or 10% by mass or more. In addition, the upper limit of the content can be 95% by mass or less from the viewpoint of enhancing the compatibility of the sol and easily obtaining an airgel having good visible light permeability, and even if it is 90% by mass or less. Good.
ゾル生成工程において、ケイ素化合物として他のポリシロキサン化合物を更に用いる場合、当該他のポリシロキサン化合物の量は、上記一般式(S)で表される構造を有するポリシロキサン化合物100質量部に対して、1500質量部以下とすることができ、1300質量部以下であってもよく、1000質量部以下であってもよい。また、他のポリシロキサン化合物の量は、上記一般式(S)で表される構造を有するポリシロキサン化合物100質量部に対して、例えば1質量部以上とすることができ、5質量部以上であってもよく、10質量部以上であってもよい。 In the sol production step, when another polysiloxane compound is further used as the silicon compound, the amount of the other polysiloxane compound is based on 100 parts by mass of the polysiloxane compound having the structure represented by the general formula (S). It may be 1500 parts by mass or less, may be 1300 parts by mass or less, and may be 1000 parts by mass or less. The amount of the other polysiloxane compound can be, for example, 1 part by mass or more with respect to 100 parts by mass of the polysiloxane compound having the structure represented by the general formula (S). It may be 10 mass parts or more.
ゾル生成工程において、ケイ素化合物としてシランモノマーを更に用いる場合、当該シランモノマーの量は、上記一般式(S)で表される構造を有するポリシロキサン化合物100質量部に対して、1500質量部以下とすることができ、1300質量部以下であってもよく、1000質量部以下であってもよい。また、シランモノマーの量は、上記一般式(S)で表される構造を有するポリシロキサン化合物100質量部に対して、例えば1質量部以上とすることができ、5質量部以上であってもよく、10質量部以上であってもよい。 In the sol production step, when a silane monomer is further used as the silicon compound, the amount of the silane monomer is 1500 parts by mass or less with respect to 100 parts by mass of the polysiloxane compound having the structure represented by the general formula (S). 1300 parts by mass or less, or 1000 parts by mass or less. Moreover, the quantity of a silane monomer can be 1 mass part or more with respect to 100 mass parts of polysiloxane compounds which have a structure represented by the said general formula (S), for example, even if it is 5 mass parts or more. It may be 10 parts by mass or more.
ゾル生成工程において、ケイ素化合物としてシランオリゴマーを更に用いる場合、当該シランオリゴマーの量は、上記一般式(S)で表される構造を有するポリシロキサン化合物100質量部に対して、1500質量部以下とすることができ、1300質量部以下であってもよく、1000質量部以下であってもよい。また、シランオリゴマーの量は、上記一般式(S)で表される構造を有するポリシロキサン化合物100質量部に対して、例えば1質量部以上とすることができ、5質量部以上であってもよく、10質量部以上であってもよい。 In the sol production step, when a silane oligomer is further used as the silicon compound, the amount of the silane oligomer is 1500 parts by mass or less with respect to 100 parts by mass of the polysiloxane compound having the structure represented by the general formula (S). 1300 parts by mass or less, or 1000 parts by mass or less. Moreover, the quantity of a silane oligomer can be 1 mass part or more with respect to 100 mass parts of polysiloxane compounds which have a structure represented by the said general formula (S), for example, even if it is 5 mass parts or more. It may be 10 parts by mass or more.
ゾル生成工程では、例えば、ケイ素化合物の混合及び場合により加水分解のために溶媒が用いられる。溶媒としては、例えば、水、又は、水との混和性のある有機溶媒を用いることができる。水との混和性のある有機溶媒としては、例えば、メタノール、エタノール、n-プロパノール、2-プロパノール、n-ブタノール、2-ブタノール、t-ブタノール、アセトン、N,N-ジメチルホルムアミド等が挙げられるが、これらに限定されるわけではない。これらの中でも、N,N-ジメチルホルムアミドを用いることで良好な可視光透過率が得られ易い。この理由は定かではないが、ゲル化途中の反応溶媒中で、シリカ粒子(エアロゲルを構成することになる個々の粒子)の凝集が静電的な相互作用により抑制されているためであると推察される。これらは単独で、又は2種類以上を混合して用いてもよい。 In the sol production step, for example, a solvent is used for mixing and optionally hydrolyzing the silicon compound. As the solvent, for example, water or an organic solvent miscible with water can be used. Examples of the organic solvent miscible with water include methanol, ethanol, n-propanol, 2-propanol, n-butanol, 2-butanol, t-butanol, acetone, N, N-dimethylformamide and the like. However, it is not limited to these. Among these, good visible light transmittance can be easily obtained by using N, N-dimethylformamide. The reason for this is not clear, but it is presumed that the aggregation of silica particles (individual particles constituting the airgel) is suppressed by electrostatic interaction in the reaction solvent during gelation. Is done. You may use these individually or in mixture of 2 or more types.
また、上記の混合溶媒には低表面張力の溶媒を更に添加することもできる。低表面張力の溶媒としては、20℃における表面張力が30mN/m以下のものが挙げられる。なお、当該表面張力は25mN/m以下であっても、又は20mN/m以下であってもよい。低表面張力の溶媒としては、例えば、ペンタン(15.5)、ヘキサン(18.4)、ヘプタン(20.2)、オクタン(21.7)、2-メチルペンタン(17.4)、3-メチルペンタン(18.1)、2-メチルヘキサン(19.3)、シクロペンタン(22.6)、シクロヘキサン(25.2)、1-ペンテン(16.0)等の脂肪族炭化水素類;ベンゼン(28.9)、トルエン(28.5)、m-キシレン(28.7)、p-キシレン(28.3)等の芳香族炭化水素類;ジクロロメタン(27.9)、クロロホルム(27.2)、四塩化炭素(26.9)、1-クロロプロパン(21.8)、2-クロロプロパン(18.1)等のハロゲン化炭化水素類;エチルエーテル(17.1)、プロピルエーテル(20.5)、イソプロピルエーテル(17.7)、ブチルエチルエーテル(20.8)、1,2-ジメトキシエタン(24.6)等のエーテル類;アセトン(23.3)、メチルエチルケトン(24.6)、メチルプロピルケトン(25.1)、ジエチルケトン(25.3)等のケトン類;酢酸メチル(24.8)、酢酸エチル(23.8)、酢酸プロピル(24.3)、酢酸イソプロピル(21.2)、酢酸イソブチル(23.7)、エチルブチレート(24.6)等のエステル類などが挙げられる(かっこ内は20℃での表面張力を示し、単位は[mN/m]である)。上記の溶媒は単独で、又は2種類以上を混合して用いてもよい。 In addition, a solvent having a low surface tension can be further added to the above mixed solvent. Examples of the low surface tension solvent include those having a surface tension at 20 ° C. of 30 mN / m or less. The surface tension may be 25 mN / m or less, or 20 mN / m or less. Examples of the low surface tension solvent include pentane (15.5), hexane (18.4), heptane (20.2), octane (21.7), 2-methylpentane (17.4), 3- Aliphatic hydrocarbons such as methylpentane (18.1), 2-methylhexane (19.3), cyclopentane (22.6), cyclohexane (25.2), 1-pentene (16.0); Aromatic hydrocarbons such as (28.9), toluene (28.5), m-xylene (28.7), p-xylene (28.3); dichloromethane (27.9), chloroform (27.2) ), Carbon tetrachloride (26.9), 1-chloropropane (21.8), 2-chloropropane (18.1) and other halogenated hydrocarbons; ethyl ether (17.1), propyl ether (20.5) ), Isop Ethers such as pyrether (17.7), butyl ethyl ether (20.8), 1,2-dimethoxyethane (24.6); acetone (23.3), methyl ethyl ketone (24.6), methyl propyl ketone (25.1), ketones such as diethyl ketone (25.3); methyl acetate (24.8), ethyl acetate (23.8), propyl acetate (24.3), isopropyl acetate (21.2), Examples include esters such as isobutyl acetate (23.7), ethyl butyrate (24.6), etc. (in parentheses indicate surface tension at 20 ° C., and the unit is [mN / m]). You may use said solvent individually or in mixture of 2 or more types.
ゾル生成工程では、溶媒として水及び水との混和性のある有機溶媒を併用することで、ケイ素化合物を加水分解させてもよい。また溶媒には、加水分解反応を促進させるための酸触媒が含まれていてもよい。 In the sol production step, the silicon compound may be hydrolyzed by using water and an organic solvent miscible with water as the solvent. The solvent may contain an acid catalyst for promoting the hydrolysis reaction.
酸触媒としては、フッ酸、塩酸、硝酸、硫酸、亜硫酸、リン酸、亜リン酸、次亜リン酸、臭素酸、塩素酸、亜塩素酸、次亜塩素酸等の無機酸;酸性リン酸アルミニウム、酸性リン酸マグネシウム、酸性リン酸亜鉛等の酸性リン酸塩;酢酸、ギ酸、プロピオン酸、シュウ酸、マロン酸、コハク酸、クエン酸、リンゴ酸、アジピン酸、アゼライン酸等の有機カルボン酸などが挙げられる。これらの中でも、得られるエアロゲルの耐水性がより向上する酸触媒としては有機カルボン酸が挙げられる。当該有機カルボン酸としては酢酸が挙げられるが、ギ酸、プロピオン酸、シュウ酸、マロン酸等であってもよい。 Acid catalysts include hydrofluoric acid, hydrochloric acid, nitric acid, sulfuric acid, sulfurous acid, phosphoric acid, phosphorous acid, hypophosphorous acid, bromic acid, chloric acid, chlorous acid, hypochlorous acid and other inorganic acids; acidic phosphoric acid Acidic phosphates such as aluminum, acidic magnesium phosphate, and acidic zinc phosphate; organic carboxylic acids such as acetic acid, formic acid, propionic acid, oxalic acid, malonic acid, succinic acid, citric acid, malic acid, adipic acid, and azelaic acid Etc. Among these, organic carboxylic acid is mentioned as an acid catalyst which improves the water resistance of the airgel obtained more. Examples of the organic carboxylic acid include acetic acid, but formic acid, propionic acid, oxalic acid, malonic acid, and the like may be used.
酸触媒の添加量は特に限定されないが、例えば、ケイ素化合物の総量100質量部に対し、0.001~10質量部とすることができる。 The addition amount of the acid catalyst is not particularly limited, but may be, for example, 0.001 to 10 parts by mass with respect to 100 parts by mass of the total amount of the silicon compound.
ゾル生成工程では、特許第5250900号公報に示されるように、溶媒中に界面活性剤、熱加水分解性化合物等を添加することもできる。界面活性剤としては、非イオン性界面活性剤、イオン性界面活性剤等を用いることができる。これらは単独で、又は2種類以上を混合して用いてもよい。 In the sol production step, as shown in Japanese Patent No. 5250900, a surfactant, a thermally hydrolyzable compound, or the like can be added to the solvent. As the surfactant, a nonionic surfactant, an ionic surfactant, or the like can be used. You may use these individually or in mixture of 2 or more types.
非イオン性界面活性剤としては、例えば、ポリオキシエチレン等の親水部と主にアルキル基からなる疎水部とを含む化合物、ポリオキシプロピレン等の親水部を含む化合物などを使用できる。ポリオキシエチレン等の親水部と主にアルキル基からなる疎水部とを含む化合物としては、ポリオキシエチレンノニルフェニルエーテル、ポリオキシエチレンオクチルフェニルエーテル、ポリオキシエチレンアルキルエーテル等が挙げられる。ポリオキシプロピレン等の親水部を含む化合物としては、ポリオキシプロピレンアルキルエーテル、ポリオキシエチレンとポリオキシプロピレンのブロック共重合体等が挙げられる。 As the nonionic surfactant, for example, a compound containing a hydrophilic part such as polyoxyethylene and a hydrophobic part mainly composed of an alkyl group, a compound containing a hydrophilic part such as polyoxypropylene, and the like can be used. Examples of the compound containing a hydrophilic part such as polyoxyethylene and a hydrophobic part mainly composed of an alkyl group include polyoxyethylene nonyl phenyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene alkyl ether and the like. Examples of the compound having a hydrophilic portion such as polyoxypropylene include polyoxypropylene alkyl ether, a block copolymer of polyoxyethylene and polyoxypropylene, and the like.
イオン性界面活性剤としては、カチオン性界面活性剤、アニオン性界面活性剤、両イオン性界面活性剤等が挙げられる。カチオン性界面活性剤としては、臭化セチルトリメチルアンモニウム、塩化セチルトリメチルアンモニウム等が挙げられ、アニオン性界面活性剤としては、ドデシルスルホン酸ナトリウム等が挙げられる。また、両イオン性界面活性剤としては、アミノ酸系界面活性剤、ベタイン系界面活性剤、アミンオキシド系界面活性剤等が挙げられる。アミノ酸系界面活性剤としては、例えば、アシルグルタミン酸等が挙げられる。ベタイン系界面活性剤としては、例えば、ラウリルジメチルアミノ酢酸ベタイン、ステアリルジメチルアミノ酢酸ベタイン等が挙げられる。アミンオキシド系界面活性剤としては、例えばラウリルジメチルアミンオキシドが挙げられる。 Examples of the ionic surfactant include a cationic surfactant, an anionic surfactant, and an amphoteric surfactant. Examples of the cationic surfactant include cetyltrimethylammonium bromide and cetyltrimethylammonium chloride, and examples of the anionic surfactant include sodium dodecylsulfonate. Examples of amphoteric surfactants include amino acid surfactants, betaine surfactants, amine oxide surfactants, and the like. Examples of amino acid surfactants include acyl glutamic acid. Examples of betaine surfactants include lauryldimethylaminoacetic acid betaine, stearyldimethylaminoacetic acid betaine, and the like. Examples of the amine oxide surfactant include lauryl dimethylamine oxide.
これらの界面活性剤は、後述する湿潤ゲル生成工程において、反応系中の溶媒と、成長していくシロキサン重合体との間の化学的親和性の差異を小さくし、相分離を抑制する作用をすると考えられている。なお、溶媒としてアルコール、N,N-ジメチルホルムアミド等の、水との混和性のある有機溶媒を用いた場合、これらの有機溶媒が界面活性剤による上記効果と同様の効果を奏すると考えられ、界面活性剤を添加しなくても湿潤ゲルを好適に生成することができる。 These surfactants have the effect of reducing the difference in chemical affinity between the solvent in the reaction system and the growing siloxane polymer and suppressing phase separation in the wet gel formation process described later. It is considered to be. When an organic solvent miscible with water, such as alcohol or N, N-dimethylformamide, is used as the solvent, it is considered that these organic solvents have the same effect as the above-mentioned effect by the surfactant. A wet gel can be suitably formed without adding a surfactant.
熱加水分解性化合物は、熱加水分解により塩基触媒を発生して、反応溶液を塩基性とし、後述する湿潤ゲル生成工程でのゾルゲル反応を促進すると考えられている。よって、この熱加水分解性化合物としては、加水分解後に反応溶液を塩基性にできる化合物であれば、特に限定されず、尿素;ホルムアミド、N-メチルホルムアミド、N,N-ジメチルホルムアミド、アセトアミド、N-メチルアセトアミド、N,N-ジメチルアセトアミド等の酸アミド;ヘキサメチレンテトラミン等の環状窒素化合物などを挙げることができる。これらの中でも、特に尿素は上記促進効果を得られ易い。 The thermohydrolyzable compound is considered to generate a base catalyst by thermal hydrolysis to make the reaction solution basic and to promote the sol-gel reaction in the wet gel generation process described later. Accordingly, the thermohydrolyzable compound is not particularly limited as long as it can make the reaction solution basic after hydrolysis. Urea; formamide, N-methylformamide, N, N-dimethylformamide, acetamide, N -Acid amides such as methylacetamide and N, N-dimethylacetamide; cyclic nitrogen compounds such as hexamethylenetetramine and the like. Among these, urea is particularly easy to obtain the above-mentioned promoting effect.
ゾル生成工程では、熱線輻射抑制等を目的として、可視光透過性及び強度が損なわれない範囲で、溶媒中にカーボングラファイト、アルミニウム化合物、マグネシウム化合物、銀化合物、チタン化合物等の成分を添加してもよい。また、強度をさらに向上する目的で、可視光透過性が損なわれない範囲で、溶媒中にシリカ、アルミナ等から構成されるナノ粒子、シリカ、アルミナ、セルロース等から構成されるナノファイバーなどを添加することもできる。 In the sol production process, components such as carbon graphite, aluminum compound, magnesium compound, silver compound, titanium compound are added to the solvent within the range where visible light transmission and strength are not impaired for the purpose of suppressing heat ray radiation. Also good. In addition, for the purpose of further improving the strength, nanoparticles composed of silica, alumina, etc., nanofibers composed of silica, alumina, cellulose, etc. are added to the solvent as long as visible light permeability is not impaired. You can also
ゾル生成工程の加水分解は、混合液中のケイ素化合物、酸触媒等の種類及び量にも左右されるが、例えば20~80℃の温度環境下で10分~24時間行ってもよく、50~60℃の温度環境下で5分~8時間行ってもよい。これにより、ケイ素化合物中の加水分解性官能基が十分に加水分解され、ケイ素化合物の加水分解生成物をより確実に得ることができる。 Hydrolysis in the sol production step depends on the type and amount of the silicon compound, acid catalyst and the like in the mixed solution, but may be performed, for example, in a temperature environment of 20 to 80 ° C. for 10 minutes to 24 hours. The reaction may be performed in a temperature environment of ˜60 ° C. for 5 minutes to 8 hours. Thereby, the hydrolyzable functional group in a silicon compound is fully hydrolyzed, and the hydrolysis product of a silicon compound can be obtained more reliably.
ただし、溶媒中に熱加水分解性化合物を添加する場合は、ゾル生成工程の温度環境を、熱加水分解性化合物の加水分解を抑制してゾルのゲル化を抑制する温度に調節してもよい。この時の温度は、熱加水分解性化合物の加水分解を抑制できる温度であれば、いずれの温度であってもよい。例えば、熱加水分解性化合物として尿素を用いた場合は、ゾル生成工程の温度環境は0~40℃とすることができるが、10~30℃であってもよい。 However, when a thermohydrolyzable compound is added to the solvent, the temperature environment of the sol generation step may be adjusted to a temperature that suppresses hydrolysis of the thermohydrolyzable compound and suppresses gelation of the sol. . The temperature at this time may be any temperature as long as the hydrolysis of the thermally hydrolyzable compound can be suppressed. For example, when urea is used as the thermally hydrolyzable compound, the temperature environment of the sol production step can be 0 to 40 ° C., but may be 10 to 30 ° C.
ゾル生成工程では、ケイ素化合物又はケイ素化合物の加水分解生成物を含むゾルが生成する。加水分解生成物は、ケイ素化合物が有する加水分解性の官能基の一部又は全部が加水分解されたものということもできる。ゾル生成工程ではケイ素化合物の一部又は全部が加水分解されてもよいが、上記のとおりケイ素化合物の加水分解は必須ではない。ケイ素化合物は後記の湿潤ゲル生成工程で加水分解されてもよい。 In the sol production step, a sol containing a silicon compound or a hydrolysis product of the silicon compound is produced. It can also be said that the hydrolysis product is a product in which a part or all of the hydrolyzable functional group of the silicon compound is hydrolyzed. In the sol production step, part or all of the silicon compound may be hydrolyzed, but as described above, hydrolysis of the silicon compound is not essential. The silicon compound may be hydrolyzed in the wet gel formation step described later.
(湿潤ゲル生成工程)
湿潤ゲル生成工程は、ゾル生成工程で得られたゾルをゲル化して、湿潤ゲルを得る工程である。より詳しくは、ケイ素化合物の加水分解生成物を得つつゾルをゲル化する、あるいはケイ素化合物の加水分解生成物を含むゾルをゲル化することで、湿潤ゲルを得る工程である。本工程は、ゾルをゲル化し、その後熟成して湿潤ゲルを得る工程であってもよい。本工程では、加水分解反応及びゲル化を促進させるため塩基触媒を用いることができる。
(Wet gel production process)
The wet gel generation step is a step of obtaining a wet gel by gelling the sol obtained in the sol generation step. More specifically, it is a step of obtaining a wet gel by gelling a sol while obtaining a hydrolysis product of a silicon compound, or by gelling a sol containing a hydrolysis product of a silicon compound. This step may be a step of gelling the sol and then aging to obtain a wet gel. In this step, a base catalyst can be used to promote hydrolysis and gelation.
塩基触媒としては、炭酸カルシウム、炭酸カリウム、炭酸ナトリウム、炭酸バリウム、炭酸マグネシウム、炭酸リチウム、炭酸アンモニウム、炭酸銅(II)、炭酸鉄(II)、炭酸銀(I)等の炭酸塩類;炭酸水素カルシウム、炭酸水素カリウム、炭酸水素ナトリウム、炭酸水素アンモニウム等の炭酸水素塩類;水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化セシウム等のアルカリ金属水酸化物;水酸化テトラメチルアンモニウム、水酸化テトラエチルアンモニウム等のテトラアルキルアンモニウムの水酸化物;水酸化マグネシウム、水酸化カルシウム等の金属水酸化物;水酸化アンモニウム、フッ化アンモニウム、塩化アンモニウム、臭化アンモニウム等のアンモニウム化合物;メタ燐酸ナトリウム、ピロ燐酸ナトリウム、ポリ燐酸ナトリウム等の塩基性燐酸ナトリウム塩;アリルアミン、ジアリルアミン、トリアリルアミン、イソプロピルアミン、ジイソプロピルアミン、エチルアミン、ジエチルアミン、トリエチルアミン、2-エチルヘキシルアミン、3-エトキシプロピルアミン、ジイソブチルアミン、3-(ジエチルアミノ)プロピルアミン、ジ-2-エチルヘキシルアミン、3-(ジブチルアミノ)プロピルアミン、テトラメチルエチレンジアミン、t-ブチルアミン、sec-ブチルアミン、プロピルアミン、3-(メチルアミノ)プロピルアミン、3-(ジメチルアミノ)プロピルアミン、3-メトキシアミン、ジメチルエタノールアミン、メチルジエタノールアミン、ジエタノールアミン、トリエタノールアミン等の脂肪族アミン類;モルホリン、N-メチルモルホリン、2-メチルモルホリン、ピペラジン及びその誘導体、ピペリジン及びその誘導体、イミダゾール及びその誘導体等の含窒素複素環状化合物類などが挙げられる。上記の塩基触媒は単独で、又は2種類以上を混合して用いてもよい。 Base catalysts include carbonates such as calcium carbonate, potassium carbonate, sodium carbonate, barium carbonate, magnesium carbonate, lithium carbonate, ammonium carbonate, copper (II) carbonate, iron (II) carbonate, silver (I) carbonate; hydrogen carbonate Bicarbonates such as calcium, potassium bicarbonate, sodium bicarbonate, ammonium bicarbonate; alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, cesium hydroxide; tetramethylammonium hydroxide, hydroxide Tetraalkylammonium hydroxides such as tetraethylammonium; Metal hydroxides such as magnesium hydroxide and calcium hydroxide; Ammonium compounds such as ammonium hydroxide, ammonium fluoride, ammonium chloride, and ammonium bromide; Sodium metaphosphate, pyro Sodium phosphate Basic sodium phosphate such as sodium polyphosphate; allylamine, diallylamine, triallylamine, isopropylamine, diisopropylamine, ethylamine, diethylamine, triethylamine, 2-ethylhexylamine, 3-ethoxypropylamine, diisobutylamine, 3- (diethylamino) Propylamine, di-2-ethylhexylamine, 3- (dibutylamino) propylamine, tetramethylethylenediamine, t-butylamine, sec-butylamine, propylamine, 3- (methylamino) propylamine, 3- (dimethylamino) propyl Aliphatic amines such as amine, 3-methoxyamine, dimethylethanolamine, methyldiethanolamine, diethanolamine, triethanolamine; Emissions, N- methylmorpholine, 2-methylmorpholine, piperazine and its derivatives, piperidine and its derivatives, and the like imidazoles and nitrogen-containing heterocyclic compounds such as derivatives. You may use said base catalyst individually or in mixture of 2 or more types.
塩基触媒を用いることで、ゾル中のケイ素化合物の加水分解反応及び脱水縮合反応又は脱アルコール縮合反応を促進することができ、ゾルのゲル化をより短時間で行うことができる。また、これにより、強度(剛性)のより高い湿潤ゲルを得ることができる。特に、アルカリ金属、テトラアルキルアンモニウム等の水酸化物のような強塩基の触媒を用いることで、可視光透過性と強度とをより向上させ易い。 By using the base catalyst, the hydrolysis reaction and dehydration condensation reaction or dealcoholization condensation reaction of the silicon compound in the sol can be promoted, and the sol can be gelled in a shorter time. Thereby, a wet gel with higher strength (rigidity) can be obtained. In particular, by using a strong base catalyst such as a hydroxide of an alkali metal, tetraalkylammonium or the like, visible light permeability and strength can be easily improved.
塩基触媒の添加量は、ゾル生成工程で用いたケイ素化合物の総量100質量部に対し、0.1~10質量部とすることができるが、0.5~5質量部であってもよい。0.1質量部以上とすることにより、強度を向上し易くなり、10質量部以下とすることにより、可視光透過性の低下を抑制し易くなる。 The addition amount of the base catalyst can be 0.1 to 10 parts by mass with respect to 100 parts by mass of the total amount of the silicon compound used in the sol production step, but may be 0.5 to 5 parts by mass. By setting it as 0.1 mass part or more, it becomes easy to improve an intensity | strength, and when it is set as 10 mass parts or less, it becomes easy to suppress a fall of visible light permeability.
湿潤ゲル生成工程におけるゾルのゲル化は、溶媒及び塩基触媒が揮発しないように密閉容器内で行ってもよい。ゲル化温度は、30~100℃とすることができるが、40~90℃であってもよい。ゲル化温度を30℃以上とすることにより、ゲル化をより短時間に行うことができ、強度(剛性)のより高い湿潤ゲルを得ることができる。また、ゲル化温度を100℃以下にすることにより、溶媒(特に水又はアルコール)の揮発を抑制し易くなるため、体積収縮を抑えながらゲル化することができる。 The gelation of the sol in the wet gel generation step may be performed in a sealed container so that the solvent and the base catalyst do not volatilize. The gelation temperature can be 30 to 100 ° C., but it may be 40 to 90 ° C. By setting the gelation temperature to 30 ° C. or higher, gelation can be performed in a shorter time, and a wet gel with higher strength (rigidity) can be obtained. Moreover, since it becomes easy to suppress volatilization of a solvent (especially water or alcohol) by making gelation temperature into 100 degrees C or less, it can gelatinize, suppressing volume shrinkage.
湿潤ゲル生成工程における熟成は、溶媒及び塩基触媒が揮発しないように密閉容器内で行ってもよい。熟成により、湿潤ゲルを構成する成分の結合が強くなり、その結果、乾燥時の収縮を抑制するのに十分な強度(剛性)の高い湿潤ゲルを得ることができる。熟成温度は、30~100℃とすることができるが、40~90℃であってもよい。熟成温度を30℃以上とすることにより、強度(剛性)のより高い湿潤ゲルを得ることができ、熟成温度を100℃以下にすることにより、溶媒(特に水又はアルコール)の揮発を抑制し易くなるため、体積収縮を抑えながらゲル化することができる。 The aging in the wet gel generation step may be performed in a sealed container so that the solvent and the base catalyst do not volatilize. By aging, the components of the wet gel are strongly bonded, and as a result, a wet gel having a high strength (rigidity) sufficient to suppress shrinkage during drying can be obtained. The aging temperature can be 30 to 100 ° C., but it may be 40 to 90 ° C. By setting the aging temperature to 30 ° C. or higher, a wet gel with higher strength (rigidity) can be obtained, and by setting the aging temperature to 100 ° C. or lower, volatilization of the solvent (especially water or alcohol) can be easily suppressed. Therefore, it can be gelled while suppressing volume shrinkage.
なお、ゾルのゲル化終了時点を判別することは困難な場合が多いため、ゾルのゲル化とその後の熟成とは、連続して一連の操作で行ってもよい。 In addition, since it is often difficult to determine the end point of gelation of the sol, gelation of the sol and subsequent aging may be performed in a series of operations.
ゲル化時間と熟成時間は、ゲル化温度及び熟成温度により適宜設定することができる。ゲル化時間は3~120分間とすることができるが、5~90分間であってもよい。ゲル化時間を3分間以上とすることにより均質な湿潤ゲルを得易くなり、120分間以下とすることにより後述する洗浄工程から乾燥工程の簡略化が可能となる。なお、ゲル化及び熟成の工程全体として、ゲル化時間と熟成時間との合計時間は、4~480時間とすることができるが、6~200時間であってもよい。ゲル化時間と熟成時間の合計を4時間以上とすることにより、強度(剛性)のより高い湿潤ゲルを得ることができ、480時間以下にすることにより熟成の効果をより維持し易くなる。 Gelling time and aging time can be appropriately set depending on the gelation temperature and aging temperature. The gel time can be 3 to 120 minutes, but may be 5 to 90 minutes. By setting the gelation time to 3 minutes or more, it becomes easy to obtain a homogeneous wet gel, and by setting it to 120 minutes or less, the drying process can be simplified from the washing process described later. Note that the total time of the gelation time and the aging time in the entire gelation and aging process can be 4 to 480 hours, but may be 6 to 200 hours. By setting the total gelation time and aging time to 4 hours or more, a wet gel with higher strength (rigidity) can be obtained, and by setting it to 480 hours or less, the effect of aging can be more easily maintained.
得られるエアロゲル粒子の密度を下げたり、平均細孔径を大きくするために、ゲル化温度及び熟成温度を上記範囲内で高めたり、ゲル化時間と熟成時間の合計時間を上記範囲内で長くしてもよい。また、得られるエアロゲルの密度を上げたり、平均細孔径を小さくするために、ゲル化温度及び熟成温度を上記範囲内で低くしたり、ゲル化時間と熟成時間の合計時間を上記範囲内で短くしてもよい。 In order to reduce the density of the obtained airgel particles or increase the average pore diameter, the gelation temperature and the aging temperature are increased within the above range, or the total time of the gelation time and the aging time is increased within the above range. Also good. Further, in order to increase the density of the obtained airgel or reduce the average pore diameter, the gelation temperature and the aging temperature are reduced within the above range, or the total time of the gelation time and the aging time is shortened within the above range. May be.
(洗浄工程)
洗浄工程は、湿潤ゲル生成工程で得られた湿潤ゲルを洗浄する工程である。洗浄工程では、湿潤ゲル中の洗浄液を乾燥条件(後述の乾燥工程)に適した溶媒に置換する溶媒置換を更に行ってもよい。
(Washing process)
The washing step is a step of washing the wet gel obtained in the wet gel production step. In the washing step, solvent substitution may be further performed in which the washing liquid in the wet gel is substituted with a solvent suitable for the drying conditions (the drying step described later).
洗浄工程では、湿潤ゲル生成工程により得られた湿潤ゲルを洗浄する。当該洗浄は、例えば水又は有機溶媒を用いて繰り返し行うことができる。この際、加温することにより洗浄効率を向上させることができる。 In the washing step, the wet gel obtained in the wet gel production step is washed. The washing can be repeatedly performed using, for example, water or an organic solvent. At this time, washing efficiency can be improved by heating.
有機溶媒としては、メタノール、エタノール、1-プロパノール、2-プロパノール、1-ブタノール、アセトン、メチルエチルケトン、1,2-ジメトキシエタン、アセトニトリル、ヘキサン、トルエン、ジエチルエーテル、クロロホルム、酢酸エチル、テトラヒドロフラン、塩化メチレン、N,N-ジメチルホルムアミド、ジメチルスルホキシド、酢酸、ギ酸等の各種の有機溶媒を使用することができる。上記の有機溶媒は単独で、又は2種類以上を混合して用いてもよい。 Organic solvents include methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, acetone, methyl ethyl ketone, 1,2-dimethoxyethane, acetonitrile, hexane, toluene, diethyl ether, chloroform, ethyl acetate, tetrahydrofuran, methylene chloride , N, N-dimethylformamide, dimethyl sulfoxide, acetic acid, formic acid, and other various organic solvents can be used. You may use said organic solvent individually or in mixture of 2 or more types.
溶媒置換では、乾燥によるゲルの収縮を抑制するため、低表面張力の溶媒を用いることができる。しかし、低表面張力の溶媒は、一般的に水との相互溶解度が極めて低い。そのため、溶媒置換において低表面張力の溶媒を用いる場合、洗浄に用いる有機溶媒としては、水及び低表面張力の溶媒の双方に対して高い相互溶解性を有する親水性有機溶媒が挙げられる。なお、洗浄において用いられる親水性有機溶媒は、溶媒置換のための予備置換の役割を果たすことができる。上記の有機溶媒の中で、親水性有機溶媒としては、メタノール、エタノール、2-プロパノール、アセトン、メチルエチルケトン等が挙げられる。なお、メタノール、エタノール、メチルエチルケトン等は経済性の点で優れている。 In solvent replacement, a low surface tension solvent can be used to suppress gel shrinkage due to drying. However, low surface tension solvents generally have very low mutual solubility with water. Therefore, when a low surface tension solvent is used in solvent replacement, the organic solvent used for washing includes a hydrophilic organic solvent having high mutual solubility in both water and a low surface tension solvent. In addition, the hydrophilic organic solvent used in washing | cleaning can play the role of the preliminary substitution for solvent substitution. Among the above organic solvents, examples of hydrophilic organic solvents include methanol, ethanol, 2-propanol, acetone, and methyl ethyl ketone. Methanol, ethanol, methyl ethyl ketone and the like are excellent in terms of economy.
洗浄に使用される水又は有機溶媒の量としては、湿潤ゲル中の溶媒を十分に置換し、洗浄できる量とすることができる。当該量は、湿潤ゲルの容量に対して3~10倍の量とすることができる。 As the amount of water or organic solvent used for washing, the solvent in the wet gel can be sufficiently replaced and washed. The amount can be 3 to 10 times the volume of the wet gel.
洗浄における温度環境は、洗浄に用いる溶媒の沸点以下の温度とすることができ、例えば、メタノールを用いる場合は、30~60℃程度の加温とすることができる。 The temperature environment in washing can be a temperature below the boiling point of the solvent used for washing. For example, when methanol is used, the temperature can be raised to about 30 to 60 ° C.
溶媒置換では、乾燥工程におけるエアロゲルの収縮を抑制するため、洗浄した湿潤ゲルの溶媒を所定の置換用溶媒に置き換える。この際、加温することにより置換効率を向上させることができる。置換用溶媒としては、具体的には、乾燥工程において、乾燥に用いられる溶媒の臨界点未満の温度にて、大気圧下で乾燥する場合は、後述の低表面張力の溶媒が挙げられる。一方、超臨界乾燥をする場合は、置換用溶媒としては、例えば、エタノール、メタノール、2-プロパノール、ジクロロジフルオロメタン、二酸化炭素等、又はこれらを2種以上混合した溶媒が挙げられる。 In solvent replacement, the solvent of the washed wet gel is replaced with a predetermined replacement solvent in order to suppress the shrinkage of the airgel in the drying process. At this time, the replacement efficiency can be improved by heating. Specific examples of the solvent for substitution include a low surface tension solvent described later in the drying step when drying is performed under atmospheric pressure at a temperature lower than the critical point of the solvent used for drying. On the other hand, when performing supercritical drying, examples of the substitution solvent include ethanol, methanol, 2-propanol, dichlorodifluoromethane, carbon dioxide, and the like, or a mixture of two or more thereof.
低表面張力の溶媒としては、20℃における表面張力が30mN/m以下の溶媒が挙げられる。なお、当該表面張力は25mN/m以下であっても、又は20mN/m以下であってもよい。低表面張力の溶媒としては、例えば、ペンタン(15.5)、ヘキサン(18.4)、ヘプタン(20.2)、オクタン(21.7)、2-メチルペンタン(17.4)、3-メチルペンタン(18.1)、2-メチルヘキサン(19.3)、シクロペンタン(22.6)、シクロヘキサン(25.2)、1-ペンテン(16.0)等の脂肪族炭化水素類;ベンゼン(28.9)、トルエン(28.5)、m-キシレン(28.7)、p-キシレン(28.3)等の芳香族炭化水素類;ジクロロメタン(27.9)、クロロホルム(27.2)、四塩化炭素(26.9)、1-クロロプロパン(21.8)、2-クロロプロパン(18.1)等のハロゲン化炭化水素類;エチルエーテル(17.1)、プロピルエーテル(20.5)、イソプロピルエーテル(17.7)、ブチルエチルエーテル(20.8)、1,2-ジメトキシエタン(24.6)等のエーテル類;アセトン(23.3)、メチルエチルケトン(24.6)、メチルプロピルケトン(25.1)、ジエチルケトン(25.3)等のケトン類;酢酸メチル(24.8)、酢酸エチル(23.8)、酢酸プロピル(24.3)、酢酸イソプロピル(21.2)、酢酸イソブチル(23.7)、エチルブチレート(24.6)等のエステル類などが挙げられる(かっこ内は20℃での表面張力を示し、単位は[mN/m]である)。これらの中で、脂肪族炭化水素類(ヘキサン、ヘプタン等)は低表面張力でありかつ作業環境性に優れている。また、これらの中でも、アセトン、メチルエチルケトン、1,2-ジメトキシエタン等の親水性有機溶媒を用いることで、洗浄時の有機溶媒と兼用することができる。なお、これらの中でも、さらに後述する乾燥工程における乾燥が容易な点で、常圧での沸点が100℃以下の溶媒を用いてもよい。上記の溶媒は単独で、又は2種類以上を混合して用いてもよい。 Examples of the low surface tension solvent include a solvent having a surface tension at 20 ° C. of 30 mN / m or less. The surface tension may be 25 mN / m or less, or 20 mN / m or less. Examples of the low surface tension solvent include pentane (15.5), hexane (18.4), heptane (20.2), octane (21.7), 2-methylpentane (17.4), 3- Aliphatic hydrocarbons such as methylpentane (18.1), 2-methylhexane (19.3), cyclopentane (22.6), cyclohexane (25.2), 1-pentene (16.0); Aromatic hydrocarbons such as (28.9), toluene (28.5), m-xylene (28.7), p-xylene (28.3); dichloromethane (27.9), chloroform (27.2) ), Carbon tetrachloride (26.9), 1-chloropropane (21.8), 2-chloropropane (18.1) and other halogenated hydrocarbons; ethyl ether (17.1), propyl ether (20.5) ), Isop Ethers such as pyrether (17.7), butyl ethyl ether (20.8), 1,2-dimethoxyethane (24.6); acetone (23.3), methyl ethyl ketone (24.6), methyl propyl ketone (25.1), ketones such as diethyl ketone (25.3); methyl acetate (24.8), ethyl acetate (23.8), propyl acetate (24.3), isopropyl acetate (21.2), Examples include esters such as isobutyl acetate (23.7), ethyl butyrate (24.6), etc. (in parentheses indicate surface tension at 20 ° C., and the unit is [mN / m]). Among these, aliphatic hydrocarbons (hexane, heptane, etc.) have a low surface tension and an excellent working environment. Among these, by using a hydrophilic organic solvent such as acetone, methyl ethyl ketone, 1,2-dimethoxyethane, it can be used as an organic solvent at the time of washing. Among these, a solvent having a boiling point of 100 ° C. or less at normal pressure may be used because it is easy to dry in the drying step described later. You may use said solvent individually or in mixture of 2 or more types.
溶媒置換に使用される溶媒の量としては、洗浄後の湿潤ゲル中の溶媒を十分に置換できる量とすることができる。当該量は、湿潤ゲルの容量に対して3~10倍の量とすることができる。 The amount of the solvent used for solvent replacement can be an amount that can sufficiently replace the solvent in the wet gel after washing. The amount can be 3 to 10 times the volume of the wet gel.
溶媒置換における温度環境は、置換に用いる溶媒の沸点以下の温度とすることができ、例えば、ヘプタンを用いる場合は、30~60℃程度の加温とすることができる。 The temperature environment in the solvent replacement can be a temperature not higher than the boiling point of the solvent used for the replacement. For example, when heptane is used, the temperature can be set to about 30 to 60 ° C.
(乾燥工程)
乾燥工程では、(洗浄工程を経た)湿潤ゲルを乾燥させることにより、エアロゲルを得ることができる。すなわち、上記ゾルから生成された湿潤ゲルを乾燥してなるエアロゲルを得ることができる。
(Drying process)
In the drying step, the airgel can be obtained by drying the wet gel (after the washing step). That is, an airgel obtained by drying a wet gel generated from the sol can be obtained.
乾燥の手法としては特に制限されず、公知の常圧乾燥、超臨界乾燥又は凍結乾燥を用いることができる。これらの中で、低密度のエアロゲルを製造し易いという観点からは、凍結乾燥又は超臨界乾燥を用いることができる。また、低コストで生産可能という観点からは、常圧乾燥を用いることができる。なお、本実施形態において、常圧とは0.1MPa(大気圧)を意味する。 The drying method is not particularly limited, and known atmospheric pressure drying, supercritical drying, or freeze drying can be used. Among these, lyophilization or supercritical drying can be used from the viewpoint of easy production of a low-density airgel. Further, from the viewpoint that production is possible at low cost, atmospheric pressure drying can be used. In the present embodiment, the normal pressure means 0.1 MPa (atmospheric pressure).
エアロゲルは、湿潤ゲルを、湿潤ゲル中の溶媒の臨界点未満の温度にて、大気圧下で乾燥することにより得ることができる。乾燥温度は、湿潤ゲル中の溶媒の種類により異なるが、特に高温での乾燥が溶媒の蒸発速度を速め、ゲルに大きな亀裂を生じさせる場合があるという点に鑑み、20~180℃とすることができる。なお、当該乾燥温度は30~150℃であってもよい。また、乾燥時間は、湿潤ゲルの容量及び乾燥温度により異なるが、4~300時間とすることができる。なお、生産性を阻害しない範囲内において臨界点未満の圧力をかけて乾燥を早めることも、常圧乾燥に包含されるものとする。 Airgel can be obtained by drying a wet gel at a temperature below the critical point of the solvent in the wet gel under atmospheric pressure. Although the drying temperature varies depending on the type of solvent in the wet gel, it should be 20 to 180 ° C. in view of the fact that drying at a high temperature increases the evaporation rate of the solvent and may cause large cracks in the gel. Can do. The drying temperature may be 30 to 150 ° C. The drying time varies depending on the wet gel volume and the drying temperature, and can be 4 to 300 hours. It should be noted that atmospheric pressure drying also includes speeding up drying by applying a pressure less than the critical point within a range that does not impair productivity.
エアロゲルは、また、湿潤ゲルを超臨界乾燥することによっても得ることができる。超臨界乾燥は、公知の手法にて行うことができる。超臨界乾燥する方法としては、例えば、湿潤ゲルに含まれる溶媒の臨界点以上の温度及び圧力にて溶媒を除去する方法が挙げられる。あるいは、超臨界乾燥する方法としては、湿潤ゲルを、液化二酸化炭素中に、例えば、20~25℃、5~20MPa程度の条件で浸漬することで、湿潤ゲルに含まれる溶媒の全部又は一部を当該溶媒より臨界点の低い二酸化炭素に置換した後、二酸化炭素を単独で、又は二酸化炭素及び溶媒の混合物を除去する方法が挙げられる。 Airgel can also be obtained by supercritical drying of a wet gel. Supercritical drying can be performed by a known method. Examples of the supercritical drying method include a method of removing the solvent at a temperature and pressure higher than the critical point of the solvent contained in the wet gel. Alternatively, as a method for supercritical drying, all or part of the solvent contained in the wet gel is obtained by immersing the wet gel in liquefied carbon dioxide, for example, at about 20 to 25 ° C. and about 5 to 20 MPa. And carbon dioxide having a lower critical point than that of the solvent, and then removing carbon dioxide alone or a mixture of carbon dioxide and the solvent.
このような常圧乾燥又は超臨界乾燥により得られたエアロゲルは、さらに常圧下にて、105~200℃で0.5~2時間程度追加乾燥してもよい。これにより、密度が低く、小さな細孔を有するエアロゲルをさらに得易くなる。追加乾燥は、常圧下にて、150~200℃で行ってもよい。 The airgel obtained by such normal pressure drying or supercritical drying may be further dried at 105 to 200 ° C. for about 0.5 to 2 hours under normal pressure. This makes it easier to obtain an airgel having a low density and small pores. Additional drying may be performed at 150 to 200 ° C. under normal pressure.
本実施形態に係る製造方法では、湿潤ゲルを所望の形状に成形してから、乾燥工程を実施してもよい。例えば、湿潤ゲルをミキサー等で粉砕してから乾燥工程を実施することで、粒状のエアロゲルを得ることができる。本実施形態に係る製造方法では、乾燥工程で得られたエアロゲルを成形する工程を更に備えていてもよい。例えば、乾燥工程で得られたエアロゲルを粉砕することで、粒状のエアロゲルを得ることができる。 In the manufacturing method according to this embodiment, the wet gel may be formed into a desired shape and then the drying step may be performed. For example, a granular airgel can be obtained by pulverizing the wet gel with a mixer or the like and then performing the drying step. In the manufacturing method which concerns on this embodiment, the process of shape | molding the airgel obtained at the drying process may be further provided. For example, a granular airgel can be obtained by pulverizing the airgel obtained in the drying step.
<ポリシロキサン化合物>
上記一般式(S)で表される構造を有するポリシロキサン化合物は、良好な可視光透過率と強度とを両立するエアロゲルを得るために特に有用であり、このようなポリシロキサン化合物がエアロゲル形成用の材料として従来使用された例は確認されていない。したがって、本実施形態に係るポリシロキサン化合物は、上記一般式(S)で表される構造を有する、エアロゲル形成用ポリシロキサン化合物ということができる。
<Polysiloxane compound>
The polysiloxane compound having the structure represented by the general formula (S) is particularly useful for obtaining an airgel having both good visible light transmittance and strength, and such a polysiloxane compound is used for forming an airgel. An example of conventional use as a material for the above has not been confirmed. Therefore, it can be said that the polysiloxane compound according to the present embodiment is an airgel-forming polysiloxane compound having a structure represented by the general formula (S).
<エアロゲル>
本実施形態に係るエアロゲルは、上記一般式(S)で表される構造を有するポリシロキサン化合物を含有するゾルの縮合物である湿潤ゲルの乾燥物である。本実施形態に係るエアロゲルは、例えば、上記の製造方法によって得られたものであってよい。すなわち、本実施形態に係るエアロゲルは、ケイ素化合物又はケイ素化合物の加水分解生成物を含有するゾルを生成するゾル生成工程と、ゾルをゲル化して、湿潤ゲルを得る湿潤ゲル生成工程と、湿潤ゲルを乾燥してエアロゲルを得る乾燥工程と、を備え、ケイ素化合物が上記一般式(S)で表される構造を有するポリシロキサン化合物を含む、製造方法により得られるエアロゲルであってもよい。
<Aerogel>
The airgel according to this embodiment is a dried product of a wet gel that is a condensate of a sol containing a polysiloxane compound having a structure represented by the general formula (S). The airgel which concerns on this embodiment may be obtained by said manufacturing method, for example. That is, the airgel according to the present embodiment includes a sol generation step for generating a sol containing a silicon compound or a hydrolysis product of the silicon compound, a wet gel generation step for gelling the sol to obtain a wet gel, and a wet gel. An airgel obtained by a production method comprising a polysiloxane compound having a structure represented by the above general formula (S).
狭義には、湿潤ゲルに対して超臨界乾燥法を用いて得られた乾燥ゲルをエアロゲル、大気圧下での乾燥により得られた乾燥ゲルをキセロゲル、凍結乾燥により得られた乾燥ゲルをクライオゲルと称するが、本実施形態においては、湿潤ゲルのこれらの乾燥手法によらず、得られた低密度の乾燥ゲルを「エアロゲル」と称する。すなわち、本実施形態において、「エアロゲル」とは、広義のエアロゲルである「Gel comprised of a microporous solid in which the dispersed phase is a gas(分散相が気体である微多孔性固体から構成されるゲル)」を意味する。一般的に、エアロゲルの内部は、網目状の微細構造を有しており、2~20nm程度の粒子状のエアロゲル成分が結合したクラスター構造を有している。このクラスターにより形成される骨格間には、100nmに満たない細孔がある。これにより、エアロゲルは、三次元的に微細な多孔性の構造が形成されている。なお、本実施形態に係るエアロゲルは、例えば、シリカを主成分とするシリカエアロゲルである。シリカエアロゲルとしては、例えば、有機基(メチル基等)又は有機鎖を導入した、いわゆる有機-無機ハイブリッド化されたシリカエアロゲルが挙げられる。 In a narrow sense, dry gel obtained by using supercritical drying method for wet gel is aerogel, dry gel obtained by drying under atmospheric pressure is xerogel, dry gel obtained by freeze-drying is cryogel and However, in the present embodiment, the obtained low-density dried gel is referred to as “aerogel” regardless of the drying method of the wet gel. That is, in the present embodiment, the “aerogel” is a broadly defined aerogel “Gel compressed of a microporous solid in which the dispersed phase is a gas (a gel composed of a microporous solid in which the dispersed phase is a gas). "Means. In general, the inside of the airgel has a network-like fine structure, and has a cluster structure in which particulate airgel components of about 2 to 20 nm are combined. There are pores less than 100 nm between the skeletons formed by these clusters. As a result, the airgel has a three-dimensionally fine porous structure. In addition, the airgel which concerns on this embodiment is a silica airgel which has a silica as a main component, for example. Examples of the silica airgel include so-called organic-inorganic hybrid silica airgel into which an organic group (such as a methyl group) or an organic chain is introduced.
本実施形態に係るエアロゲルとしては、以下の態様が挙げられる。これらの態様を採用することにより、断熱性、難燃性、耐熱性及び柔軟性に優れるエアロゲルを得ることが容易となる。各々の態様を採用することで、各々の態様に応じた断熱性、難燃性、耐熱性及び柔軟性を有するエアロゲルを得ることができる。 Examples of the airgel according to the present embodiment include the following modes. By adopting these aspects, it becomes easy to obtain an airgel excellent in heat insulation, flame retardancy, heat resistance and flexibility. By employ | adopting each aspect, the airgel which has the heat insulation according to each aspect, a flame retardance, heat resistance, and a softness | flexibility can be obtained.
本実施形態に係るエアロゲルは、下記一般式(S1)で表される構造を有することができる。
式(S1)中、R1sはそれぞれ独立にアルキル基又はアリール基を示す。ここで、アリール基としてはフェニル基、置換フェニル基等が挙げられる。また、置換フェニル基の置換基としては、アルキル基、ビニル基、メルカプト基、アミノ基、ニトロ基、シアノ基等が挙げられる。式(S1)中、2個以上のR1sは各々同一であっても異なっていてもよい。また、式(S1)中、msは2以上の整数を示す。 In the formula (S 1 ), R 1s independently represents an alkyl group or an aryl group. Here, examples of the aryl group include a phenyl group and a substituted phenyl group. In addition, examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group. In the formula (S 1 ), two or more R 1s may be the same or different. In the formula (S 1 ), ms represents an integer of 2 or more.
良好な可視光透過率と強度とを両立するエアロゲルを形成し易いという観点から、R1sとしては、それぞれ独立に炭素数が1~6のアルキル基、フェニル基等が挙げられ、当該アルキル基としては、メチル基等が挙げられる。また、同様の観点から、msは2以上の整数とすることができ、その上限は30とすることができる。 From the viewpoint of easily forming an airgel having both good visible light transmittance and strength, R 1s includes, independently, an alkyl group having 1 to 6 carbon atoms, a phenyl group, and the like. Includes a methyl group and the like. From the same viewpoint, ms can be an integer of 2 or more, and the upper limit thereof can be 30.
本実施形態に係るエアロゲルは、下記一般式(1)で表される構造を有することができる。本実施形態に係るエアロゲルは、式(1)で表される構造を含む構造として、下記一般式(1a)で表される構造を有することができる。
式(1)及び式(1a)中、R1及びR2はそれぞれ独立にアルキル基又はアリール基を示し、R3及びR4はそれぞれ独立にアルキレン基を示す。ここで、アリール基としてはフェニル基、置換フェニル基等が挙げられる。なお、置換フェニル基の置換基としては、アルキル基、ビニル基、メルカプト基、アミノ基、ニトロ基、シアノ基等が挙げられる。pは1~50の整数を示す。式(1a)中、2個以上のR1は各々同一であっても異なっていてもよく、同様に、2個以上のR2は各々同一であっても異なっていてもよい。式(1a)中、2個のR3は各々同一であっても異なっていてもよく、同様に、2個のR4は各々同一であっても異なっていてもよい。 In formula (1) and formula (1a), R 1 and R 2 each independently represent an alkyl group or an aryl group, and R 3 and R 4 each independently represent an alkylene group. Here, examples of the aryl group include a phenyl group and a substituted phenyl group. Examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group. p represents an integer of 1 to 50. In formula (1a), two or more R 1 s may be the same or different, and similarly, two or more R 2 s may be the same or different. In formula (1a), two R 3 s may be the same or different, and similarly, two R 4 s may be the same or different.
上記式(1)又は式(1a)で表される構造をエアロゲル成分としてエアロゲルの骨格中に導入することにより、低熱伝導率かつ柔軟なエアロゲルとなる。このような観点から、式(1)及び式(1a)中、R1及びR2としてはそれぞれ独立に炭素数が1~6のアルキル基、フェニル基等が挙げられ、当該アルキル基としてはメチル基等が挙げられる。また、式(1)及び式(1a)中、R3及びR4としてはそれぞれ独立に炭素数が1~6のアルキレン基等が挙げられ、当該アルキレン基としてはエチレン基、プロピレン基等が挙げられる。式(1a)中、pは2~30とすることができ、5~20であってもよい。 By introducing the structure represented by the above formula (1) or formula (1a) into the skeleton of the airgel as an airgel component, a flexible airgel with low thermal conductivity is obtained. From such a viewpoint, in the formula (1) and the formula (1a), R 1 and R 2 each independently include an alkyl group having 1 to 6 carbon atoms, a phenyl group, and the like. Groups and the like. In the formulas (1) and (1a), R 3 and R 4 each independently include an alkylene group having 1 to 6 carbon atoms, and examples of the alkylene group include an ethylene group and a propylene group. It is done. In the formula (1a), p can be 2 to 30, and can be 5 to 20.
本実施形態に係るエアロゲルは、支柱部及び橋かけ部を備えるラダー型構造を有し、かつ橋かけ部が下記一般式(2)で表される構造を有することができる。このようなラダー型構造をエアロゲル成分としてエアロゲルの骨格中に導入することにより、耐熱性と機械的強度を向上させることができる。なお、本実施形態において「ラダー型構造」とは、2本の支柱部(struts)と支柱部同士を連結する橋かけ部(bridges)とを有するもの(いわゆる「梯子」の形態を有するもの)である。本態様において、エアロゲルの骨格がラダー型構造からなっていてもよいが、エアロゲルが部分的にラダー型構造を有していてもよい。
式(2)中、R5及びR6はそれぞれ独立にアルキル基又はアリール基を示し、bは1~50の整数を示す。ここで、アリール基としてはフェニル基、置換フェニル基等が挙げられる。また、置換フェニル基の置換基としては、アルキル基、ビニル基、メルカプト基、アミノ基、ニトロ基、シアノ基等が挙げられる。なお、式(2)中、bが2以上の整数の場合、2個以上のR5は各々同一であっても異なっていてもよく、同様に2個以上のR6も各々同一であっても異なっていてもよい。 In formula (2), R 5 and R 6 each independently represents an alkyl group or an aryl group, and b represents an integer of 1 to 50. Here, examples of the aryl group include a phenyl group and a substituted phenyl group. In addition, examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group. In formula (2), when b is an integer of 2 or more, two or more R 5 s may be the same or different, and similarly two or more R 6 s are each the same. May be different.
上記の構造をエアロゲル成分としてエアロゲルの骨格中に導入することにより、例えば、従来のラダー型シルセスキオキサンに由来する構造を有する(すなわち、下記一般式(X)で表される構造を有する)エアロゲルよりも優れた柔軟性を有するエアロゲルとなる。シルセスキオキサンは、組成式:(RSiO1.5)nを有するポリシロキサンであり、カゴ型、ラダー型、ランダム型等の種々の骨格構造を有することができる。なお、下記一般式(X)にて示すように、従来のラダー型シルセスキオキサンに由来する構造を有するエアロゲルでは、橋かけ部の構造が-O-であるが、本実施形態に係るエアロゲルでは、橋かけ部の構造が上記一般式(2)で表される構造(ポリシロキサン構造)である。ただし、本態様のエアロゲルは、一般式(2)で表される構造に加え、さらにシルセスキオキサンに由来する構造を有していてもよい。
式(X)中、Rはヒドロキシ基、アルキル基又はアリール基を示す。 In the formula (X), R represents a hydroxy group, an alkyl group or an aryl group.
支柱部となる構造及びその鎖長、並びに橋かけ部となる構造の間隔は特に限定されないが、耐熱性と機械的強度とをより向上させるという観点から、ラダー型構造としては、下記一般式(3)で表されるラダー型構造を有していてもよい。
式(3)中、R5、R6、R7及びR8はそれぞれ独立にアルキル基又はアリール基を示し、a及びcはそれぞれ独立に1~3000の整数を示し、bは1~50の整数を示す。ここで、アリール基としてはフェニル基、置換フェニル基等が挙げられる。また、置換フェニル基の置換基としては、アルキル基、ビニル基、メルカプト基、アミノ基、ニトロ基、シアノ基等が挙げられる。なお、式(3)中、bが2以上の整数の場合、2個以上のR5は各々同一であっても異なっていてもよく、同様に2個以上のR6も各々同一であっても異なっていてもよい。また、式(3)中、aが2以上の整数の場合、2個以上のR7は各々同一であっても異なっていてもよく、同様にcが2以上の整数の場合、2個以上のR8は各々同一であっても異なっていてもよい。 In the formula (3), R 5 , R 6 , R 7 and R 8 each independently represents an alkyl group or an aryl group, a and c each independently represents an integer of 1 to 3000, and b is 1 to 50 Indicates an integer. Here, examples of the aryl group include a phenyl group and a substituted phenyl group. In addition, examples of the substituent of the substituted phenyl group include an alkyl group, a vinyl group, a mercapto group, an amino group, a nitro group, and a cyano group. In formula (3), when b is an integer of 2 or more, two or more R 5 s may be the same or different, and similarly two or more R 6 s are each the same. May be different. In Formula (3), when a is an integer of 2 or more, two or more R 7 s may be the same or different. Similarly, when c is an integer of 2 or more, 2 or more R 8 may be the same or different.
なお、より優れた柔軟性を得る観点から、式(2)及び(3)中、R5、R6、R7及びR8(ただし、R7及びR8は式(3)中のみ)としてはそれぞれ独立に炭素数が1~6のアルキル基、フェニル基等が挙げられ、当該アルキル基としてはメチル基等が挙げられる。また、式(3)中、a及びcは、それぞれ独立に6~2000とすることができるが、10~1000であってもよい。また、式(2)及び(3)中、bは、2~30とすることができるが、5~20であってもよい。 From the viewpoint of obtaining more excellent flexibility, in formulas (2) and (3), R 5 , R 6 , R 7 and R 8 (however, R 7 and R 8 are only in formula (3)) Each independently includes an alkyl group having 1 to 6 carbon atoms, a phenyl group, and the like, and examples of the alkyl group include a methyl group. In the formula (3), a and c can be independently 6 to 2000, but may be 10 to 1000. In the formulas (2) and (3), b can be 2 to 30, but may be 5 to 20.
エアロゲルの、25℃における密度は0.01~0.5g/cm3とすることができるが、0.05~0.4g/cm3であってもよい。密度が0.01g/cm3以上であることにより、より優れた強度及び柔軟性を得ることができ、また、0.5g/cm3以下であることにより、より優れた断熱性を得ることができる。エアロゲルの密度は、例えば電子比重計SD-200L(アルファーミラージュ株式会社製、製品名)を用い、JIS K7112に記載の方法に準じてアルキメデス法により測定することができる。 Airgel, although the density may be 0.01 ~ 0.5g / cm 3 at 25 ° C., may be 0.05 ~ 0.4g / cm 3. When the density is 0.01 g / cm 3 or more, more excellent strength and flexibility can be obtained, and when it is 0.5 g / cm 3 or less, more excellent heat insulation can be obtained. it can. The density of the airgel can be measured by the Archimedes method according to the method described in JIS K7112, for example, using an electronic hydrometer SD-200L (product name, manufactured by Alpha Mirage Co., Ltd.).
エアロゲルの、大気圧下、25℃における熱伝導率は0.030W/(m・K)以下とすることができるが、0.028W/(m・K)以下であってもよく、又は0.025W/(m・K)以下であってもよい。熱伝導率が0.03W/m・K以下であることにより、高性能断熱材であるポリウレタンフォーム以上の断熱性を得ることができる。なお、熱伝導率の下限値は特に限定されないが、例えば0.005W/m・Kとすることができる。熱伝導率は、例えば定常法熱伝導率測定装置「HFM436Lambda」(NETZSCH社製、製品名)を用いて行うことができる。 The thermal conductivity of the airgel at 25 ° C. under atmospheric pressure can be 0.030 W / (m · K) or less, but may be 0.028 W / (m · K) or less, or It may be 025 W / (m · K) or less. When the thermal conductivity is 0.03 W / m · K or less, it is possible to obtain a heat insulating property higher than that of the polyurethane foam which is a high performance heat insulating material. The lower limit value of the thermal conductivity is not particularly limited, but can be set to 0.005 W / m · K, for example. The thermal conductivity can be performed using, for example, a steady-state thermal conductivity measuring device “HFM436 Lambda” (product name, manufactured by NETZSCH).
<エアロゲルブロック>
エアロゲルブロックは、上記のエアロゲルを含むことができる。そのため、本実施形態に係るエアロゲルブロックは、非常に高い水準で可視光透過率と強度とを共に有する。
<Airgel block>
The airgel block can include the aerogel described above. Therefore, the airgel block according to the present embodiment has both visible light transmittance and strength at a very high level.
エアロゲルブロックの可視光透過率は65%以上である。ここで可視光とは、JIS Z8120の定義による電磁波をいう。エアロゲルブロックの可視光透過率は、68%以上であってもよく、70%以上であってもよい。可視光透過率が65%以上であることにより、自動車に採用されるガラス程度の可視光透過性を得ることができる。なお、可視光透過率の上限は特に限定されないが、100%とすることができる。可視光透過率は、例えばダブルビーム分光光度計「U-2900」(株式会社日立ハイテクノロジーズ製、製品名)を用い、測定波長を550nmとして測定することができる。 The visible light transmittance of the airgel block is 65% or more. Here, visible light refers to electromagnetic waves defined by JIS Z8120. The visible light transmittance of the airgel block may be 68% or more, or 70% or more. When the visible light transmittance is 65% or more, it is possible to obtain visible light transmittance comparable to that of glass used in automobiles. The upper limit of the visible light transmittance is not particularly limited, but can be 100%. The visible light transmittance can be measured using, for example, a double beam spectrophotometer “U-2900” (product name, manufactured by Hitachi High-Technologies Corporation) at a measurement wavelength of 550 nm.
可視光透過率は、例えば上記一般式(S)における、中央のジオルガノシロキサンユニットの数(すなわち、式(S)中のmsの値)と、両端の多官能ケイ素ユニットの官能基数(すなわち、式(S)中のns及びlsの値)を変動させることにより調整できる。 The visible light transmittance is, for example, the number of central diorganosiloxane units in the general formula (S) (that is, the value of ms in the formula (S)) and the number of functional groups of the polyfunctional silicon units at both ends (that is, It can be adjusted by changing the values of ns and ls in the formula (S).
エアロゲルブロックの単位体積当たりの曲げ破断エネルギーは0.30mJ/cm3以上である。エアロゲルブロックの単位体積当たりの曲げ破断エネルギーは0.40mJ/cm3以上であってもよく、0.50mJ/cm3以上であってもよい。なお、単位体積当たりの曲げ破断エネルギーの上限は特に限定されないが、1000mJ/cm3とすることができる。単位体積当たりの曲げ破断エネルギーは、例えばテンシロン万能材料試験機(引張・圧縮試験機)「RTC―1350A」(株式会社オリエンテック製、製品名)を用い、測定モードを3点曲げとし、支点間距離を20mmとして測定することができる。 The bending fracture energy per unit volume of the airgel block is 0.30 mJ / cm 3 or more. Bending fracture energy per unit volume of the airgel block may be 0.40mJ / cm 3 or more, it may be 0.50 mJ / cm 3 or more. The upper limit of the bending fracture energy per unit volume is not particularly limited, but can be 1000 mJ / cm 3 . The bending fracture energy per unit volume is, for example, tensilon universal material tester (tensile / compression tester) “RTC-1350A” (product name, manufactured by Orientec Co., Ltd.), with the measurement mode set to three-point bending and between fulcrums. The distance can be measured as 20 mm.
単位体積当たりの曲げ破断エネルギーは、例えば上記一般式(S)における、可撓性に影響するであろう中央のジオルガノシロキサンユニットと、当該ユニットの両端の剛性に影響するであろう多官能ケイ素ユニットとの構成比率を変動させることにより調整できる。 The bending fracture energy per unit volume is, for example, in the above general formula (S), the central diorganosiloxane unit that will affect the flexibility, and the polyfunctional silicon that will affect the rigidity of both ends of the unit. It can be adjusted by changing the composition ratio with the unit.
なお、本実施形態に係るエアロゲルの具体的形状として、上記ではある程度のボリュームを有するブロック状のエアロゲルについて説明したが、エアロゲルの形状はこれに限定されない。例えば、厚さをさらに低減したシート状のエアロゲルにおいても、本実施形態に係るエアロゲルは有用である。 In addition, although the block-shaped airgel which has a certain amount of volume was demonstrated above as a concrete shape of the airgel which concerns on this embodiment, the shape of an airgel is not limited to this. For example, the airgel according to the present embodiment is useful even in a sheet-like airgel having a further reduced thickness.
以上、本発明の好適な実施形態について説明したが、本発明は上記実施形態に限定されるものではない。 The preferred embodiment of the present invention has been described above, but the present invention is not limited to the above embodiment.
以下、実施例により本発明をより具体的に説明するが、本発明は実施例に限定されるものではない。 Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to the examples.
(実施例1)
両末端9官能アルコキシ変性ポリシロキサン化合物(以下、「ポリシロキサン化合物S-1」という)を12mL、シランオリゴマー「KC-89S」(信越化学工業株式会社製、製品名)を20mL、N,N-ジメチルホルムアミドを140mL混合し、10分間撹拌した後、0.75Mに調整した水酸化テトラエチルアンモニウム水溶液6mLを加え、さらに1分間攪拌してゾルを得た。得られたゾルを80℃でゲル化し、120時間熟成して湿潤ゲルを得た。
Example 1
12 mL of 9-functional alkoxy-modified polysiloxane compound at both ends (hereinafter referred to as “polysiloxane compound S-1”), 20 mL of silane oligomer “KC-89S” (manufactured by Shin-Etsu Chemical Co., Ltd., product name), N, N— After 140 mL of dimethylformamide was mixed and stirred for 10 minutes, 6 mL of tetraethylammonium hydroxide aqueous solution adjusted to 0.75 M was added and further stirred for 1 minute to obtain a sol. The obtained sol was gelled at 80 ° C. and aged for 120 hours to obtain a wet gel.
得られた湿潤ゲルをメタノール2500mL中に浸漬し、60℃で3時間かけて洗浄を行った。この洗浄操作を、新しいメタノールに交換しながら2回行った。次に、洗浄した湿潤ゲルを、メチルエチルケトン2500mL中に浸漬し、60℃で3時間かけて溶媒置換を行った。この溶媒置換操作を、新しいメチルエチルケトンに交換しながら2回行った。さらに、メチルエチルケトンでの溶媒置換後の湿潤ゲルを、低表面張力溶媒であるn-ヘプタン2500mL中に浸漬し、60℃で3時間かけて再度溶媒置換を行った。この溶媒置換操作を、新しいn-ヘプタンに交換しながら2回行った。洗浄及び溶媒置換された湿潤ゲルを、常圧下にて、30℃で170時間乾燥し、その後さらに150℃で2時間乾燥することで、エアロゲルを得た。 The obtained wet gel was immersed in 2500 mL of methanol and washed at 60 ° C. for 3 hours. This washing operation was performed twice while exchanging with fresh methanol. Next, the washed wet gel was immersed in 2500 mL of methyl ethyl ketone, and solvent substitution was performed at 60 ° C. for 3 hours. This solvent replacement operation was performed twice while exchanging with new methyl ethyl ketone. Further, the wet gel after solvent replacement with methyl ethyl ketone was immersed in 2500 mL of n-heptane, which is a low surface tension solvent, and solvent replacement was performed again at 60 ° C. over 3 hours. This solvent replacement operation was performed twice while exchanging with new n-heptane. The washed and solvent-substituted wet gel was dried at 30 ° C. for 170 hours under normal pressure, and then further dried at 150 ° C. for 2 hours to obtain an airgel.
なお、上記「ポリシロキサン化合物S-1」は次のようにして合成した。撹拌機、温度計及びジムロート冷却管を備えた1リットルの3つ口フラスコにて、ヒドロキシ末端ジメチルポリシロキサン「XC96-723」(モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社製、製品名)を100質量部、「メチルシリケート51」(コルコート株式会社製、製品名)を293.8質量部及びt-ブチルアミンを0.50質量部混合し、30℃で5時間反応させることで、両末端9官能アルコキシ変性ポリシロキサン化合物(両末端にそれぞれ9個のアルコキシ基を有するポリシロキサン化合物)を得た。 The “polysiloxane compound S-1” was synthesized as follows. Hydroxy-terminated dimethylpolysiloxane “XC96-723” (product name, manufactured by Momentive Performance Materials Japan LLC) in a 1 liter three-necked flask equipped with a stirrer, thermometer and Dimroth condenser. By mixing 293.8 parts by mass of “methyl silicate 51” (product name, manufactured by Colcoat Co., Ltd.) and 0.50 parts by mass of t-butylamine and reacting at 30 ° C. for 5 hours, 9 functional groups at both ends An alkoxy-modified polysiloxane compound (polysiloxane compound having 9 alkoxy groups at both ends) was obtained.
(実施例2)
シランオリゴマーとして、「KC-89S」に代えて「XR31-B1410」(モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社製、製品名)を用いたこと以外は、実施例1と同様にして、エアロゲルを得た。
(Example 2)
As in Example 1, except that “XR31-B1410” (product name, manufactured by Momentive Performance Materials Japan GK) was used as the silane oligomer instead of “KC-89S”, the airgel was used. Obtained.
(実施例3)
ポリシロキサン化合物S-1を20mL、シランモノマー(メチルトリメトキシシラン)「KBM-13」(信越化学工業株式会社製、製品名)を12mL、N,N-ジメチルホルムアミドを140mL混合し、10分間撹拌した後、0.75Mに調整した水酸化テトラエチルアンモニウム水溶液6mLを加え、さらに1分間攪拌してゾルを得た。得られたゾルを80℃でゲル化し、24時間熟成して湿潤ゲルを得た。その後は実施例1と同様にして、エアロゲルを得た。
(Example 3)
20 mL of polysiloxane compound S-1, 12 mL of silane monomer (methyltrimethoxysilane) “KBM-13” (product name, manufactured by Shin-Etsu Chemical Co., Ltd.) and 140 mL of N, N-dimethylformamide were mixed and stirred for 10 minutes. Then, 6 mL of an aqueous tetraethylammonium hydroxide solution adjusted to 0.75 M was added, and the mixture was further stirred for 1 minute to obtain a sol. The obtained sol was gelled at 80 ° C. and aged for 24 hours to obtain a wet gel. Thereafter, an airgel was obtained in the same manner as in Example 1.
(実施例4)
ポリシロキサン化合物S-1を16mL、シランオリゴマー「KR-500」(信越化学工業株式会社製、製品名)を16mL、N,N-ジメチルホルムアミドを140mL混合し、10分間撹拌した後、0.75Mに調整した水酸化ナトリウム水溶液6mLを加え、さらに1分間攪拌してゾルを得た。得られたゾルを80℃でゲル化し、120時間熟成して湿潤ゲルを得た。その後は実施例1と同様にして、エアロゲルを得た。
Example 4
16 mL of polysiloxane compound S-1, 16 mL of silane oligomer “KR-500” (manufactured by Shin-Etsu Chemical Co., Ltd., product name) and 140 mL of N, N-dimethylformamide were mixed and stirred for 10 minutes, then 0.75M 6 mL of an adjusted sodium hydroxide aqueous solution was added, and the mixture was further stirred for 1 minute to obtain a sol. The obtained sol was gelled at 80 ° C. and aged for 120 hours to obtain a wet gel. Thereafter, an airgel was obtained in the same manner as in Example 1.
(実施例5)
ポリシロキサン化合物S-1に代えて、両末端11官能アルコキシ変性ポリシロキサン化合物(以下、「ポリシロキサン化合物S-2」という)を用いたこと以外は、実施例1と同様にして、エアロゲルを得た。
(Example 5)
An airgel was obtained in the same manner as in Example 1 except that an 11-functional alkoxy-modified polysiloxane compound at both ends (hereinafter referred to as “polysiloxane compound S-2”) was used in place of the polysiloxane compound S-1. It was.
なお、上記「ポリシロキサン化合物S-2」は次のようにして合成した。撹拌機、温度計及びジムロート冷却管を備えた1リットルの3つ口フラスコにて、ヒドロキシ末端ジメチルポリシロキサン「XC96-723」を100質量部、「メチルシリケート53A」(コルコート株式会社製、製品名)を185.7質量部及びt-ブチルアミンを0.50質量部混合し、30℃で5時間反応させることで、両末端11官能アルコキシ変性ポリシロキサン化合物(両末端にそれぞれ11個のアルコキシ基を有するポリシロキサン化合物)を得た。 The above “polysiloxane compound S-2” was synthesized as follows. In a 1-liter three-necked flask equipped with a stirrer, thermometer and Dimroth condenser, 100 parts by mass of hydroxy-terminated dimethylpolysiloxane “XC96-723”, “methyl silicate 53A” (manufactured by Colcoat Co., Ltd., product name) ) Is mixed with 185.7 parts by mass and t-butylamine at 0.50 parts by mass, and reacted at 30 ° C. for 5 hours, whereby 11 functional alkoxy-modified polysiloxane compounds at both ends (each having 11 alkoxy groups at both ends). Polysiloxane compound).
(比較例1)
「メチルシリケート51」、エタノール、水、及び15Nアンモニア水を、混合比が「メチルシリケート51」:エタノール:水:アンモニア水=49.56:67.06:52.97:0.25(質量比)となるように混合した。20秒程度攪拌後静置し、ゲル化させた。その後、エタノールを加え、50℃で72時間熟成し、湿潤ゲルを得た。
(Comparative Example 1)
The mixing ratio of “methyl silicate 51”, ethanol, water, and 15N ammonia water is “methyl silicate 51”: ethanol: water: ammonia water = 49.56: 67.06: 52.97: 0.25 (mass ratio) ) Were mixed. After stirring for about 20 seconds, the mixture was allowed to stand and gelled. Thereafter, ethanol was added and aged at 50 ° C. for 72 hours to obtain a wet gel.
次に、湿潤ゲルを5倍の容積の0.2M-ヘキサメチルジシラザン(東レ・ダウコーニング株式会社製)のトルエン溶液中に移し、1昼夜トルエン溶液の交換を繰り返し、ゲル内にヘキサメチルジシラザンを含有させた。その後、110℃で2時間程度加熱攪拌し、疎水化処理反応を行った後、ゲルをエタノール中に移して、1昼夜エタノールの交換を繰り返し、溶媒置換を行った。 Next, the wet gel was transferred into a toluene solution of 5-fold volume 0.2M-hexamethyldisilazane (manufactured by Toray Dow Corning Co., Ltd.), and the toluene solution was repeatedly exchanged for one day and night. Silazane was included. Thereafter, the mixture was heated and stirred at 110 ° C. for about 2 hours to perform a hydrophobization reaction, and then the gel was transferred into ethanol, and ethanol exchange was repeated for one day and night to perform solvent replacement.
次に、このゲルを18℃、5.1MPaの二酸化炭素中に入れ、ゲル内のエタノールを二酸化炭素に置換する操作を2~3時間行った。その後、系内を二酸化炭素の超臨界条件である、40℃、8.1MPaにし、超臨界乾燥を約24時間行ってエアロゲルを得た。 Next, this gel was placed in carbon dioxide at 18 ° C. and 5.1 MPa, and the operation of replacing ethanol in the gel with carbon dioxide was performed for 2 to 3 hours. Thereafter, the inside of the system was supercritical conditions of carbon dioxide, 40 ° C. and 8.1 MPa, and supercritical drying was performed for about 24 hours to obtain an airgel.
(比較例2)
「メチルシリケート51」に代えて「エチルシリケート40」(コルコート株式会社製、製品名)を用いた上で、混合比を「エチルシリケート40」:エタノール:水:アンモニア水=120.18:67.06:52.97:0.25(質量比)としたこと以外は、比較例1と同様にして、エアロゲルを得た。
(Comparative Example 2)
In place of “methyl silicate 51”, “ethyl silicate 40” (product name, manufactured by Colcoat Co., Ltd.) was used, and the mixing ratio was “ethyl silicate 40”: ethanol: water: ammonia water = 120.18: 67. An airgel was obtained in the same manner as in Comparative Example 1 except that the ratio was 06: 52.97: 0.25 (mass ratio).
(比較例3)
「XR31-B1410」を32mL、N,N-ジメチルホルムアミドを140mL混合し、10分間攪拌した後、0.75Mに調整した水酸化テトラエチルアンモニウム水溶液を6mL加え、さらに1分間攪拌してゾルを得た。得られたゾルを80℃でゲル化し、120時間熟成して湿潤ゲルを得た。その後は実施例1と同様にして、エアロゲルを得た。
(Comparative Example 3)
32 mL of “XR31-B1410” and 140 mL of N, N-dimethylformamide were mixed and stirred for 10 minutes, and then 6 mL of tetraethylammonium hydroxide aqueous solution adjusted to 0.75 M was added and further stirred for 1 minute to obtain a sol. . The obtained sol was gelled at 80 ° C. and aged for 120 hours to obtain a wet gel. Thereafter, an airgel was obtained in the same manner as in Example 1.
[各種評価]
各実施例及び各比較例で得られたエアロゲルについて、以下の条件に従って評価をした。結果を表1に示す。
[Various evaluations]
The airgel obtained in each Example and each Comparative Example was evaluated according to the following conditions. The results are shown in Table 1.
(1)密度の測定
エアロゲルの密度を、JIS K7112に記載の方法に準じてアルキメデス法により測定した。測定装置としては、電子比重計SD-200L(アルファーミラージュ株式会社製、製品名)を用いた。
(1) Measurement of density The density of the airgel was measured by Archimedes method according to the method described in JIS K7112. As a measuring device, an electronic hydrometer SD-200L (manufactured by Alpha Mirage Co., Ltd., product name) was used.
(2)熱伝導率の測定
エアロゲルを150mm×150mm×10mmのサイズとなるようにカットしてブロック状のエアロゲル(エアロゲルブロック)とした。面の平行を確保するために、必要に応じて#1500以上の紙やすりで整形した。整形したエアロゲルブロックを、定温乾燥機「DVS402」(ヤマト科学株式会社製、製品名)を用いて、大気圧下、100℃で30分間乾燥した後、デシケータ中に移し、25℃まで冷却して、熱伝導率測定用の測定サンプルを得た。
熱伝導率の測定は、定常法熱伝導率測定装置「HFM436Lambda」(NETZSCH社製、製品名)を用いて行った。測定条件は、大気圧下、平均温度25℃とした。測定サンプルを0.3MPaの荷重にて上部及び下部ヒーター間に挟み、温度差ΔTを20℃とし、ガードヒーターによって一次元の熱流になるように調整しながら、測定サンプルの上面温度、下面温度等を測定した。そして、測定サンプルの熱抵抗RSを次式より求めた。
RS=N((TU-TL)/Q)-RO
式中、TUは測定サンプル上面温度を示し、TLは測定サンプル下面温度を示し、ROは上下界面の接触熱抵抗を示し、Qは熱流束計出力を示す。なお、Nは比例係数であり、較正試料を用いて予め求めておいた。
得られた熱抵抗RS及び測定サンプルの厚さdより、測定サンプルの熱伝導率λを次式より求めた。
λ=d/RS
(2) Measurement of thermal conductivity The airgel was cut to a size of 150 mm × 150 mm × 10 mm to obtain a block-shaped airgel (aerogel block). In order to ensure parallelism of the surfaces, shaping was performed with sandpaper of # 1500 or more as necessary. The shaped airgel block was dried at 100 ° C. for 30 minutes under atmospheric pressure using a constant temperature dryer “DVS402” (manufactured by Yamato Scientific Co., Ltd., product name), then transferred to a desiccator and cooled to 25 ° C. A measurement sample for thermal conductivity measurement was obtained.
The thermal conductivity was measured using a steady-state thermal conductivity measuring device “HFM436 Lambda” (manufactured by NETZSCH, product name). The measurement conditions were an average temperature of 25 ° C. under atmospheric pressure. The measurement sample is sandwiched between the upper and lower heaters with a load of 0.3 MPa, the temperature difference ΔT is set to 20 ° C., and the upper surface temperature, the lower surface temperature, etc. of the measurement sample are adjusted while adjusting to a one-dimensional heat flow by the guard heater. Was measured. And thermal resistance RS of the measurement sample was calculated | required from following Formula.
R S = N ((T U −T L ) / Q) −R O
Wherein, T U represents a measurement sample top surface temperature, T L represents the measurement sample lower surface temperature, R O represents the thermal contact resistance of the upper and lower interfaces, Q is shows the heat flux meter output. Note that N is a proportionality coefficient, and is obtained in advance using a calibration sample.
From the obtained thermal resistance RS and the thickness d of the measurement sample, the thermal conductivity λ of the measurement sample was obtained from the following equation.
λ = d / R S
(3)単位体積当たりの曲げ破断エネルギーの測定
熱伝導率の測定と同様にして測定サンプルを作製した。これを3点曲げ測定用の測定サンプルとした。
測定装置としては、テンシロン万能材料試験機(引張・圧縮試験機)「RTC―1350A」(株式会社オリエンテック製、製品名)を用いた。測定モードは3点曲げとし、支点間距離を20mmとした。支点間の中央に、サンプル上面から荷重を加え、測定サンプルが破壊した点(破断点)で終了した。荷重を加える時の治具の移動速度は、0.3mm/minとし、測定温度は25℃とした。ここで、ひずみεは次式より求めた。
ε=6×s×h/L2
式中、sは破断点での変位(mm)、hは負荷をかける前の測定サンプルの厚み(mm)、Lは支点間距離(mm)を示す。
また、破断曲げ応力σ(MPa)は、次式より求めた。
σ=3×F×L/2×b×h2
式中、Fは破断点での荷重(N)を示し、bは負荷をかける前の測定サンプルの幅(mm)を示す。
そして、縦軸を応力、横軸をひずみで表した応力-ひずみ曲線において、破断点までの曲線の下側の面積を算出することにより、単位体積当りの曲げ破断エネルギー(mJ/cm3)を求めた。
(3) Measurement of bending fracture energy per unit volume A measurement sample was produced in the same manner as the measurement of thermal conductivity. This was used as a measurement sample for three-point bending measurement.
A Tensilon universal material testing machine (tensile / compression testing machine) “RTC-1350A” (product name, manufactured by Orientec Co., Ltd.) was used as a measuring apparatus. The measurement mode was 3-point bending, and the distance between fulcrums was 20 mm. A load was applied from the upper surface of the sample to the center between the fulcrums, and the measurement was completed at the point where the measurement sample was broken (break point). The moving speed of the jig when applying the load was 0.3 mm / min, and the measurement temperature was 25 ° C. Here, the strain ε was obtained from the following equation.
ε = 6 × s × h / L 2
In the formula, s is the displacement (mm) at the breaking point, h is the thickness (mm) of the measurement sample before applying a load, and L is the distance between supporting points (mm).
The breaking bending stress σ (MPa) was obtained from the following equation.
σ = 3 × F × L / 2 × b × h 2
In the formula, F indicates the load (N) at the breaking point, and b indicates the width (mm) of the measurement sample before applying the load.
Then, in the stress-strain curve in which the vertical axis represents stress and the horizontal axis represents strain, the bending fracture energy per unit volume (mJ / cm 3 ) is calculated by calculating the area under the curve up to the breaking point. Asked.
(4)可視光透過率の測定
サイズを20mm×25mm×10mmとしたこと以外は、熱伝導率の測定と同様にして測定サンプルを作製した。これを透過率測定用の測定サンプルとした。測定装置としては、ダブルビーム分光光度計「U-2900」(株式会社日立ハイテクノロジーズ製、商品名)を用い、20mm×25mmの面に波長550nmの光を当てて、光が10mmの距離(光路長)を透過するときの透過率(平行光線透過率)を測定した。
(4) Measurement of visible light transmittance A measurement sample was prepared in the same manner as the measurement of thermal conductivity, except that the size was 20 mm × 25 mm × 10 mm. This was used as a measurement sample for transmittance measurement. As a measuring device, a double beam spectrophotometer “U-2900” (trade name, manufactured by Hitachi High-Technologies Corporation) was used. A 20 mm × 25 mm surface was irradiated with light having a wavelength of 550 nm, and the distance of the light (optical path) was 10 mm. The transmittance when transmitting through (long) was measured (parallel light transmittance).
Claims (6)
前記ゾルをゲル化して、湿潤ゲルを得る湿潤ゲル生成工程と、
前記湿潤ゲルを乾燥してエアロゲルを得る乾燥工程と、
を備え、
前記ケイ素化合物が下記一般式(S)で表される構造を有するポリシロキサン化合物を含む、エアロゲルの製造方法。
Forming a wet gel by gelling the sol to obtain a wet gel;
A drying step of drying the wet gel to obtain an airgel;
With
The manufacturing method of an airgel in which the said silicon compound contains the polysiloxane compound which has a structure represented with the following general formula (S).
前記3官能シランモノマーは、加水分解性の官能基又は縮合性の官能基が3個結合したケイ素原子を有し、
前記シランオリゴマーは、ケイ素原子の総数に対し、3個の酸素原子と結合したケイ素原子を50%以上有する、請求項1に記載の製造方法。 The silicon compound further comprises at least one of a trifunctional silane monomer and a silane oligomer;
The trifunctional silane monomer has a silicon atom to which three hydrolyzable functional groups or condensable functional groups are bonded,
The said silane oligomer is a manufacturing method of Claim 1 which has 50% or more of silicon atoms couple | bonded with three oxygen atoms with respect to the total number of silicon atoms.
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| JP2020504596A JP7078104B2 (en) | 2018-03-08 | 2018-03-08 | Airgel manufacturing method, airgel, airgel block and polysiloxane compound |
| PCT/JP2018/009042 WO2019171543A1 (en) | 2018-03-08 | 2018-03-08 | Method for producing aerogel, aerogel, aerogel block, and polysiloxane compound |
| JP2022078712A JP2022105584A (en) | 2018-03-08 | 2022-05-12 | Airgel block |
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| PCT/JP2018/009042 WO2019171543A1 (en) | 2018-03-08 | 2018-03-08 | Method for producing aerogel, aerogel, aerogel block, and polysiloxane compound |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2022199223A1 (en) * | 2022-01-05 | 2022-09-29 | 航天材料及工艺研究所 | Porous silicon resin and lightweight flexible flame-retardant composite material |
| JP2023535075A (en) * | 2020-07-24 | 2023-08-15 | エルジー・ケム・リミテッド | Method for producing silica airgel |
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| FR1400268A (en) * | 1964-07-07 | 1965-05-21 | Dow Corning | Dimethylsiloxanes blocked at the end of the chains by trimethylsiloxy groups |
| JP2000026609A (en) * | 1998-07-13 | 2000-01-25 | Ge Toshiba Silicones Co Ltd | Method for producing alkoxy-terminated polydiorganosiloxane |
| WO2017038769A1 (en) * | 2015-09-02 | 2017-03-09 | 日立化成株式会社 | Aerogel laminate and heat-insulating material |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP6288384B2 (en) * | 2015-09-01 | 2018-03-07 | 日立化成株式会社 | Airgel |
| EP3409695A4 (en) * | 2016-01-26 | 2019-10-16 | Kyoto University | LOW DENSITY GEL ARTICLE AND METHOD FOR PRODUCING LOW DENSITY GEL ARTICLE |
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2018
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- 2018-03-08 WO PCT/JP2018/009042 patent/WO2019171543A1/en not_active Ceased
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|---|---|---|---|---|
| FR1400268A (en) * | 1964-07-07 | 1965-05-21 | Dow Corning | Dimethylsiloxanes blocked at the end of the chains by trimethylsiloxy groups |
| JP2000026609A (en) * | 1998-07-13 | 2000-01-25 | Ge Toshiba Silicones Co Ltd | Method for producing alkoxy-terminated polydiorganosiloxane |
| WO2017038769A1 (en) * | 2015-09-02 | 2017-03-09 | 日立化成株式会社 | Aerogel laminate and heat-insulating material |
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| NOGAMI, MASAYUKI ET AL.: "Synthesis and characterization of transparent silica-based aerogels using methyltrimethoxysilane precursor", J SOL-GEL SCI TECHNOL, vol. 56, 17 July 2010 (2010-07-17), pages 107 - 113, XP019824962 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023535075A (en) * | 2020-07-24 | 2023-08-15 | エルジー・ケム・リミテッド | Method for producing silica airgel |
| JP7499400B2 (en) | 2020-07-24 | 2024-06-13 | エルジー・ケム・リミテッド | How silica aerogel is produced |
| WO2022199223A1 (en) * | 2022-01-05 | 2022-09-29 | 航天材料及工艺研究所 | Porous silicon resin and lightweight flexible flame-retardant composite material |
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| JP7078104B2 (en) | 2022-05-31 |
| JP2022105584A (en) | 2022-07-14 |
| JPWO2019171543A1 (en) | 2021-02-25 |
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