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WO2019170140A1 - 玻璃带抛光成形方法与玻璃基板生产方法及生产设备 - Google Patents

玻璃带抛光成形方法与玻璃基板生产方法及生产设备 Download PDF

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WO2019170140A1
WO2019170140A1 PCT/CN2019/077473 CN2019077473W WO2019170140A1 WO 2019170140 A1 WO2019170140 A1 WO 2019170140A1 CN 2019077473 W CN2019077473 W CN 2019077473W WO 2019170140 A1 WO2019170140 A1 WO 2019170140A1
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Prior art keywords
platinum
glass
polishing
glass ribbon
forming
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English (en)
French (fr)
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汪立新
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Individual
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
    • C03B17/06—Forming glass sheets
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
    • C03B17/06—Forming glass sheets
    • C03B17/061—Forming glass sheets by lateral drawing or extrusion
    • C03B17/062—Forming glass sheets by lateral drawing or extrusion combined with flowing onto a solid or gaseous support from which the sheet is drawn
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
    • C03B17/06—Forming glass sheets
    • C03B17/068—Means for providing the drawing force, e.g. traction or draw rollers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/225—Refining
    • C03B5/2252—Refining under reduced pressure, e.g. with vacuum refiners

Definitions

  • the present application relates to the field of glass substrate production, and in particular to a glass ribbon polishing forming method, a glass substrate production method and a production facility.
  • the more mature glass substrate production methods mainly include the float method, the slit down method and the overflow down method, but each of the above methods has various drawbacks.
  • the polishing process is to place the molten glass in a tin bath and perform polishing in a tin bath.
  • the tin bath in the method is generally large and can only be placed horizontally, has a large area, and needs to provide heat to the tin bath to ensure the fluidity of the tin liquid, the investment cost is large, and the maintenance cost is also very large.
  • the polishing forming control of the glass substrate is very difficult to operate, and the glass surface scratching often occurs during the polishing forming process, and the yield of the glass substrate is lowered.
  • the overflow down-draw method (also known as the melt down-draw method) is capable of producing glass sheets with excellent flatness and smoothness without the need for a secondary forming process (grinding and Polishing, etc., is currently the main production method of high quality glass.
  • the method is monopolized by foreign technology, and the price of the glass substrate prepared by the method is always high.
  • a first object of the present application is to provide a glass ribbon polishing forming method to alleviate the technical problems of high cost, low yield, and monopolization of production technology in the prior art glass substrate production method.
  • a second object of the present application is to provide a method for producing a glass substrate.
  • the glass substrate produced by the method has the advantages of smooth surface, no scratch, high yield, and low production cost.
  • a third object of the present application is to provide a glass substrate production apparatus which is adjustable in size and can be placed arbitrarily without being limited by a space for placement.
  • a glass ribbon polishing forming method wherein a glass liquid flows through a surface-polished platinum or platinum alloy polishing forming portion to form a glass ribbon, the first long and wide surface of the glass ribbon maintains the original surface, and the second long and wide surface of the glass ribbon and the surface are polished.
  • the platinum or platinum alloy polishing forming portion contacts the polishing forming process of the glass ribbon.
  • Polishing of the glass ribbon is accomplished by contact of the platinum or platinum alloy polishing forming portion.
  • the shape of the platinum or platinum alloy polishing forming portion includes a plate, a cylinder or a cylinder.
  • the surface of the platinum or platinum alloy polishing forming portion is a flat surface or a curved surface.
  • the platinum alloy is a platinum rhodium alloy or a platinum rhodium alloy.
  • the viscosity of the glass ribbon is: 102 Pa ⁇ s-1 ⁇ 10 7 Pa ⁇ s;
  • the glass ribbon is self-polishing to solidified into a single layer of glass.
  • a glass substrate production method comprising the step of performing a polishing process on a glass ribbon by a glass ribbon polishing method.
  • the molten glass liquid is first subjected to clarification and homogenization, and then subjected to a polishing forming treatment;
  • the glass ribbon is subjected to a buffing treatment process, followed by a thin forming process and an annealing process to obtain the glass substrate.
  • a glass substrate production apparatus comprising a glass liquid holding device and a platinum or platinum alloy polishing forming portion, the glass liquid flowing through the platinum or platinum alloy polishing forming portion after flowing out of the holding device.
  • the production apparatus further includes a clarification homogenization device, the clarification homogenization device being composed of at least two sets of flow tubes and a clarification tank having a cylindrical cavity, the flow tube being in communication with the clarification tank, The bottom of the clarification tank is higher than the bottom of the flow tube, and the clarification homogenization device is in communication with the sump device, and the glass liquid enters the sump device after being clarified and homogenized.
  • a clarification homogenization device being composed of at least two sets of flow tubes and a clarification tank having a cylindrical cavity, the flow tube being in communication with the clarification tank, The bottom of the clarification tank is higher than the bottom of the flow tube, and the clarification homogenization device is in communication with the sump device, and the glass liquid enters the sump device after being clarified and homogenized.
  • the production apparatus includes a thin-film forming device that performs a thin-film forming process on the glass ribbon obtained by the buff forming process.
  • the thin forming device includes a pulling roller disposed in pairs and a driving member that drives the pulling roller to rotate;
  • the traction roller is provided with a cooling component
  • the cooling component comprises a coolant intake pipe and N coolant exhaust pipes, and the exhaust pipe communicates with the tail end of the intake pipe to form a coolant circulation passage; wherein N ⁇ 2, and N is a natural number.
  • the glass ribbon polishing forming method provided by the present application is to melt the molten glass through a platinum or platinum alloy polishing forming portion to complete the polishing of the molten glass.
  • the glass liquid flows on the surface of the platinum or platinum alloy polishing forming portion to form a glass ribbon having a certain thickness, the first long and wide surface of the obtained glass ribbon maintains the original surface, and the second long and wide surface and the surface polished platinum Or the platinum alloy polishing forming portion is contacted for polishing.
  • the platinum or platinum alloy polishing forming portion is a tangible fixing member, which can be set in any shape or connection structure, and has a small footprint. It is not limited by the horizontal placement of tin bath in the tin bath, which reduces the investment cost and maintenance cost of the equipment.
  • the polishing forming method provided by the present application can design the surface of the platinum or platinum alloy polishing forming portion into a desired pattern, and the desired pattern can be obtained during polishing forming to avoid secondary processing.
  • the glass has a side on the original surface and is not subjected to the pressing and pulling force, thereby avoiding scratching of the glass and improving the yield of the glass substrate.
  • the overflow down-draw method it has opened up a new production method of glass substrates, breaking the monopoly of foreign high-quality glass substrate production technology, and is of great significance for reducing the production cost of glass.
  • FIG. 1 is a schematic structural view of a glass substrate production apparatus according to Embodiment 2 of the present application.
  • Figure 2 is a schematic view showing the structure of the holding device in the structure shown in Figure 1;
  • Figure 3 is a schematic view showing the structure of the traction roller in the structure shown in Figure 1;
  • FIG. 4 is a schematic structural view of a glass substrate production apparatus according to Embodiment 3 of the present application.
  • FIG. 5 is a schematic structural view of a glass substrate production apparatus according to Embodiment 4 of the present application.
  • FIG. 6 is a schematic structural view of a glass substrate production apparatus according to Embodiment 5 of the present application.
  • FIG. 7 is a schematic structural view of a channel-shaped platinum metal plate in a glass substrate production apparatus according to Embodiment 7 of the present application;
  • FIG. 8 is a schematic structural view of a glass substrate production apparatus according to Embodiment 8 of the present application.
  • Icon 10-furnace; 20-flow tube; 30-clarifier; 40-homogenization tank; 41-mixer; 50-filling device; 51-discharge port; 52-planar side wall; Metal plate; 61-grooved platinum metal plate; 62-platinum metal cylinder; 70-glass ribbon; 80-traction roller; 81-coolant intake pipe; 82-coolant exhaust pipe.
  • One aspect of the present application provides a glass ribbon polishing forming method for flowing a glass liquid through a surface-polished platinum or platinum alloy polishing forming portion to form a glass ribbon, the first long and wide faces of the glass ribbon maintaining the original surface, and the glass ribbon The two long and wide faces are in contact with the surface-polished platinum or platinum alloy polishing forming portion to complete the polishing process of the glass ribbon.
  • the glass ribbon polishing forming method provided by the present application is to melt the molten glass through a platinum or platinum alloy polishing forming portion to complete the polishing of the molten glass.
  • the glass liquid flows on the surface of the platinum or platinum alloy polishing forming portion to form a glass ribbon having a certain thickness, the first long and wide surface of the obtained glass ribbon maintains the original surface, and the second long and wide surface and the surface polished platinum Or the platinum alloy polishing forming portion is contacted for polishing.
  • the platinum or platinum alloy polishing forming portion is a tangible fixing member, which can be set in any shape or connection structure, and has a small footprint. It is not limited by the horizontal placement of tin bath in the tin bath, which reduces the investment cost and maintenance cost of the equipment.
  • the polishing forming method provided by the present application can design the surface of the platinum or platinum alloy polishing forming portion into a desired pattern, and the desired pattern can be obtained during polishing forming to avoid secondary processing.
  • the glass has a side on the original surface and is not subjected to the pressing and pulling force, thereby avoiding scratching of the glass and improving the yield of the glass substrate.
  • the overflow down-draw method it has opened up a new production method of glass substrates, breaking the monopoly of foreign high-quality glass substrate production technology, and is of great significance for reducing the production cost of glass.
  • the platinum or platinum alloy polishing forming portion has a polished or polished surface of a platinum or platinum alloy surface for polishing the glass ribbon. Polishing of the surface does not mean that the surface of the polished portion of the platinum or platinum alloy is flat, and may be a surface of any shape, but it must be smooth.
  • the glass liquid is cooled and thickened during the process of polishing through the platinum or platinum alloy polishing forming portion, and the glass liquid flowing through the polishing portion of the platinum or platinum alloy is lowered in temperature relative to the molten glass in the initial molten state, and the viscosity is decreased. Increased, with a certain degree of fluidity and plasticity.
  • the platinum or platinum alloy polishing forming portion in the present application is not melted by contact with the molten glass.
  • the surface topography of the platinum or platinum alloy polishing section can be designed according to the surface topography of the processed glass substrate. If the surface topography of the glass substrate to be processed is required to be flat and high transmittance is required, the surface of the platinum or platinum alloy polishing portion can be designed to be a smooth plane. If the surface morphology of the glass substrate to be processed is required to be a pattern, the surface of the platinum or platinum alloy polishing portion can be designed as a corresponding pattern.
  • the specific shape of the platinum or platinum alloy polishing forming portion is not limited in the present application, as long as the platinum or platinum alloy polishing forming portion can be in surface contact with the glass liquid to realize the polishing forming process for the molten glass. can.
  • the first long and wide side of the glass ribbon retains the original surface
  • the second long and wide sides of the glass ribbon and at least one side of the thickness direction are in contact with the surface polished platinum or platinum alloy polishing forming portion to complete the glass
  • the belt is polished and formed.
  • the thickness of the glass ribbon can be limited by the contact of the platinum or platinum alloy polishing forming portion.
  • the shape of the platinum or platinum alloy polishing forming portion includes, but is not limited to, a plate, a cylinder, or a cylinder.
  • the platinum or platinum alloy plate comprises a platinum or platinum alloy plate or trough plate.
  • the surface of the platinum or platinum alloy polishing forming portion is a flat surface or a curved surface.
  • Platinum or platinum alloy polishing forming parts can be designed into plates, cylinders or cylinders according to production conditions or process requirements, and the surface topography can be flat or curved.
  • one long and wide surface refers to the surface composed of the length and width of the glass substrate
  • a long and wide face is in a free state, maintaining the original state of the glass.
  • a grooved platinum or platinum alloy polishing plate When a grooved platinum or platinum alloy polishing plate is used for polishing, a long and wide side of the glass substrate and two long and high sides (the side of the long and high sides are the sides of the glass substrate) are polished and formed by platinum or platinum alloy. The part is in contact and the remaining surface is in a free state.
  • the platinum alloy is a platinum rhodium alloy or a platinum rhodium alloy.
  • Platinum or platinum alloy has good high temperature resistance, and the surface of platinum or platinum alloy facilitates the flow of molten glass, which is more conducive to the polishing and forming of molten glass.
  • the content of platinum in the metal is 60%-100% by weight.
  • the platinum or platinum alloy polishing forming portion includes a substrate and a platinum or platinum alloy coating, and the substrate is a high temperature resistant inorganic material matrix.
  • the base material may be a corundum or zirconia refractory material, or a high temperature resistant metal such as tungsten or molybdenum.
  • a smooth coating of platinum or platinum alloy can be prepared on the surface of the high temperature resistant inorganic material substrate or the high temperature resistant metal substrate by flame spraying or vapor deposition.
  • the viscosity of the glass liquid is: 102 Pa ⁇ s-1 ⁇ 10 7 Pa ⁇ s.
  • the quality of the polishing can be improved. Further, the thickness of the glass substrate is controlled by controlling the viscosity to adjust the flow rate of the glass liquid.
  • the glass ribbon is self-polishing to solidified into a single layer of glass.
  • a second aspect of the present application provides a glass substrate production method comprising the step of performing a buffing process on a glass ribbon by the above-described glass ribbon polishing forming method.
  • the glass substrate production method provided by the present application has all the advantages of the above-described glass ribbon polishing forming method, and details are not described herein again.
  • the molten glass liquid is first subjected to clarification and homogenization before being subjected to a polishing forming treatment; optionally, the glass ribbon is subjected to a buff forming process and then subjected to a thin forming process and an annealing process to obtain the glass substrate.
  • the melting of the glass raw material, the clarification and homogenization of the molten glass, and the subsequent thinning, annealing and cutting of the glass ribbon can be carried out by the existing method without special modification. Therefore, the glass substrate production method provided by the present application can be combined with the existing process equipment to have a high degree of use and a wide range of use.
  • a third aspect of the present application provides a glass substrate production apparatus comprising a glass liquid holding device and a platinum or platinum alloy polishing forming portion capable of flowing through the platinum or after flowing out of the holding device Platinum alloy polishing forming section.
  • the glass substrate production apparatus includes a feeding device of molten glass liquid and a platinum or platinum alloy polishing forming portion, wherein the holding device and the platinum or platinum alloy polishing forming portion may or may not be in contact with each other.
  • the platinum or platinum alloy polishing forming portion may be directly connected to the edge of the holding device, and the molten glass flows out from the holding device and directly flows through the platinum or platinum alloy polishing forming portion to complete the polishing process and then perform subsequent processing.
  • the platinum or platinum alloy polishing forming portion may not be in contact with the holding device, and the platinum or platinum alloy polishing portion may be placed under the discharge device.
  • the side wall of the discharge port side of the receiving device can be designed as a planar structure, and when the molten glass flows out of the holding device, it will continue to flow downward along the side wall of the planar structure. The temperature of the glass liquid flows downward during the downward flow, and then is laid on the surface of the platinum or platinum alloy polishing forming portion, and flows through the platinum or platinum alloy polishing forming portion to complete the polishing forming process.
  • the platinum or platinum alloy polishing forming part is a platinum or platinum alloy polishing plate, that is, the platinum or platinum alloy polishing forming plate is a flat plate or a grooved plate
  • the platinum or platinum alloy polishing plate can be placed vertically or horizontally. It can be placed obliquely as long as the molten glass can flow on the platinum or platinum alloy plate.
  • the platinum or platinum alloy polishing forming portion is a platinum or platinum alloy cylinder or a cylinder
  • the relative movement of the cylinder or the cylinder and the molten glass can be performed to complete the polishing forming process.
  • the holding device in the present application may be provided in a different shape structure, for example, may be square or circular.
  • the shape and size of the spout are designed according to the size of the glass substrate to be processed.
  • the production apparatus further includes a clarification homogenization device, the clarification homogenization device being composed of at least two sets of flow tubes and a clarification tank having a cylindrical cavity, the flow tube and The clarification tank is connected, the bottom of the clarification tank is higher than the bottom of the flow tube, the clarification homogenization device is in communication with the sump device, and the glass liquid enters the sump device after being clarified and homogenized.
  • a clarification homogenization device being composed of at least two sets of flow tubes and a clarification tank having a cylindrical cavity, the flow tube and The clarification tank is connected, the bottom of the clarification tank is higher than the bottom of the flow tube, the clarification homogenization device is in communication with the sump device, and the glass liquid enters the sump device after being clarified and homogenized.
  • the molten glass liquid is clarified and homogenized before entering the holding device.
  • the clarifier is connected to a vacuum device to depressurize the clarifier, leaving the clarifier at a negative pressure to remove air bubbles from the molten glass.
  • the molten glass flowing into the agitation tank is stirred to obtain a more uniform glass liquid.
  • the bottom of the clarification tank is higher than the bottom of the flow tube, which is equivalent to providing a convex portion at the bottom of the clarification tank.
  • the production apparatus includes a thin-film forming device, and the glass ribbon obtained after the polishing forming process is subjected to a thin-film forming process by the thin-film forming device;
  • the forming device includes a pulling roller disposed in pairs and a driving member that drives the pulling roller to rotate.
  • the glass ribbon is subjected to a thinning forming process by the action of the thin forming apparatus.
  • the glass ribbon can be thinned and formed by a pulling roller.
  • the traction rollers are arranged in pairs, and in order to make the force more uniform, they can be symmetrically arranged in pairs.
  • a cooling member is disposed in the traction roller, and the cooling member includes a coolant intake pipe and N coolant exhaust pipes, and a tail end of the intake pipe communicates with the exhaust pipe to form a coolant circulation. Channel; where N ⁇ 2 and N is a natural number.
  • the coolant may be a liquid coolant or a gas coolant.
  • the liquid coolant can be selected from water, and the gas coolant can be selected from nitrogen.
  • This embodiment is a method for producing a glass substrate, comprising the following steps:
  • the viscosity of the glass liquid is controlled at 102 Pa ⁇ s -1 ⁇ 10 7 Pa ⁇ s, and then flows through the platinum metal plate. Spreading on a platinum metal plate to obtain a glass ribbon after polishing and forming;
  • the embodiment is a glass substrate production apparatus, including a melting furnace 10 , a flow tube 20 , a clarification tank 30 , a homogenization tank 40 , a feeding device 50 , a platinum metal plate 60 , and a thin forming device .
  • the structure of the feeding device is shown in Figure 2.
  • the production equipment in this embodiment also includes a dust seal system and a glass liquid cooling system, which are not shown in the drawings.
  • the melting furnace 10 communicates with the clarification tank 30 through the flow tube 20, the vacuum pump is connected to the inside of the clarification tank 30, and the clarification tank 30 is subjected to a pressure reduction treatment by a vacuum pump to bring the clarification tank 30 into a negative pressure state.
  • the clarifier 30 is connected to the homogenization tank 40 through the flow tube 20, and the agitator 41 is disposed in the homogenization tank 40, and the clarified glass liquid is introduced into the homogenization tank 40 for homogenization treatment. After the glass liquid is homogenized, it enters the holding device 50, and the side wall of the discharging port 51 of the holding device 50 is a flat side wall 52. The molten glass overflows from the discharging port 51 and flows through the plane side wall 52.
  • the platinum metal plate 60 below the planar sidewall 52 the molten glass continues to flow on the platinum metal plate 60 and is laid on the surface of the platinum metal plate 60 to form a glass ribbon 70, wherein the platinum metal plate 60 is vertically placed on the planar sidewall 52.
  • the glass ribbon is subjected to a thinning forming process by a thin drawing forming apparatus, followed by annealing and slitting, and finally a glass substrate is obtained.
  • the draw forming apparatus of the present embodiment includes a pair of pulling rolls 80 disposed symmetrically disposed on both sides of the glass ribbon 70.
  • the pulling roller 80 includes a coolant intake pipe 81 and two coolant exhaust pipes 82, and the coolant enters from the coolant intake pipe 81 and then flows out from the coolant exhaust pipe 82 to realize the traction roller. 80 cooling.
  • the present embodiment is a glass substrate production apparatus, which is different from the production apparatus in Embodiment 2 in that the platinum metal plate in this embodiment is directly connected to the outlet of the holding device, and the glass liquid is supplied from the material. After the device overflows, it flows directly through the platinum metal plate.
  • the specific connection structure is as shown in FIG. 4, and the structural components and the connection structure in this embodiment are the same as those in the second embodiment.
  • the embodiment is a glass substrate production device, which is different from the production device in the second embodiment in that the platinum metal plate in the embodiment is horizontally placed below the plane sidewall, and the specific connection structure is as shown in FIG. 5. Shown.
  • the present embodiment is a glass substrate production apparatus, which is different from the production apparatus in Embodiment 2 in that the platinum metal plate in this embodiment is placed obliquely below the planar side wall, and the platinum metal plate and the horizontal surface are The angle is 30°, and the specific connection structure is shown in Fig. 6.
  • the present embodiment is a glass substrate production apparatus, which is different from the production apparatus in Embodiment 5 in that the platinum metal plate in this embodiment is placed obliquely below the planar side wall, and the platinum metal plate and the horizontal surface are The angle is 45°.
  • the present embodiment is a glass substrate production apparatus, which is different from the production apparatus in Embodiment 2 in that the platinum or platinum alloy polishing forming portion in this embodiment is a groove-shaped platinum metal plate 61, and the grooved platinum plate is formed.
  • the metal plate 61 is placed obliquely below the plane side wall, and the angle between the grooved platinum metal plate 61 and the horizontal plane is 30°.
  • the structure of the channel-shaped platinum metal plate 61 is as shown in FIG.
  • the present embodiment is a glass substrate production apparatus, which is different from the production apparatus in Embodiment 2 in that the platinum or platinum alloy polishing forming portion in this embodiment is a platinum metal cylinder 62, a platinum metal cylinder. 62 is placed below the plane sidewall, the specific connection structure is shown in Figure 8.

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Abstract

一种玻璃带抛光成形方法及生产设备，涉及玻璃基板技术领域，该玻璃带抛光成形方法包括使玻璃液流经表面抛光的铂或铂合金抛光成形部形成玻璃带，玻璃带的第一长宽面保持原始表面，玻璃带的第二长宽面与表面抛光的铂或铂合金抛光成形部接触完成对玻璃带的抛光成形处理。

Description

玻璃带抛光成形方法与玻璃基板生产方法及生产设备
相关申请的交叉引用
本申请要求于2018年03月09日提交中国专利局的申请号为201810198609.2、名称为“玻璃带抛光成形方法与玻璃基板生产方法及生产设备”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及玻璃基板生产领域，尤其是涉及一种玻璃带抛光成形方法与玻璃基板生产方法及生产设备。
背景技术
随着手机、平板电脑和智能电视的普及应用，电子工业对无碱玻璃需求量迅速增长，国内外各大玻璃厂商之间的竞争也越来越激烈。
目前较为成熟的玻璃基板生产方法主要有浮法工艺方法、狭缝下拉法和溢流下拉法，但上述每种方法都有各种弊端。就浮法工艺方法而言，其抛光成形工艺是将熔融玻璃液置于锡槽中，在锡槽中进行抛光成形。该方法中的锡槽一般较大且只能水平放置，占地面积大，且需要对锡槽提供热量以保证锡液的流动性，投资成本大，使用维护成本也十分庞大。
就狭缝下拉法而言，玻璃基板的抛光成形控制操作起来十分不易，且在抛光成形过程中经常会出现玻璃面划伤的情况，降低了玻璃基板的成品率。
与浮法工艺方法和狭缝下拉法相比，溢流下拉法(也称为熔融下拉法)能够生产出具有优异平整度和光滑度表面的玻璃板，且不需使用二次成形工艺(研磨和抛光)等，是目前优质玻璃的主要生产方法。但是该方法由于受国外技术垄断，造成利用该方法制备的玻璃基板的价格始终居高不下。
有鉴于此，特提出本申请。
发明内容
本申请的第一目的在于提供一种玻璃带抛光成形方法，以缓解现有技术玻璃基板生产方法成本高、成品率低以及生产技术遭到垄断的技术问题。
本申请的第二目的在于提供一种玻璃基板生产方法，利用该方法生产的玻璃基板具有表面光滑平整无划痕，成品率高且生产成本低的优点。
本申请的第三目的在于提供一种玻璃基板生产设备，该生产设备尺寸可调且可任意放置，不受放置空间的限定。
为了实现本申请的上述目的，特采用以下技术方案：
一种玻璃带抛光成形方法，使玻璃液流经表面抛光的铂或铂合金抛光成形部形成玻璃 带，玻璃带的第一长宽面保持原始表面，玻璃带的第二长宽面与表面抛光的铂或铂合金抛光成形部接触完成对玻璃带的抛光成形处理。
铂或铂合金抛光成形部接触完成对玻璃带的抛光成形。
进一步地，铂或铂合金抛光成形部的形状包括板、圆筒或圆柱。
进一步地，所述铂或铂合金抛光成形部的表面为平面或曲面。
进一步地，铂合金为铂铱合金或铂铑合金。
进一步地，所述玻璃带的粘度为：102Pa·s-1x10 7Pa·s；
优选地，玻璃带自抛光至固化成形为单层玻璃。
一种玻璃基板生产方法，包括利用玻璃带抛光成形方法对玻璃带进行抛光成形处理的步骤。
进一步地，先对熔融的玻璃液进行澄清均化后再进行抛光成形处理；
优选地，玻璃带经抛光成形处理后再依次经过拉薄成形处理和退火处理得到所述玻璃基板。
一种玻璃基板生产设备，包括玻璃液的盛料装置与铂或铂合金抛光成形部，所述玻璃液从盛料装置中流出后能够流经所述铂或铂合金抛光成形部。
进一步地，所述生产设备还包括澄清均化装置，所述澄清均化装置由至少两组流料管与内腔为圆柱形的澄清池构成，所述流料管与所述澄清池连通，所述澄清池的底部高于流料管底部，所述澄清均化装置与所述盛料装置连通，所述玻璃液经澄清均化处理后进入所述盛料装置。
进一步地，所述生产设备包括拉薄成形装置，利用所述拉薄成形装置对经过抛光成形处理后得到的玻璃带进行拉薄成形处理。
进一步地，所述拉薄成形装置包括成对设置的牵引辊和驱动所述牵引辊转动的驱动部件；
优选地，所述牵引辊内设有冷却部件，所述冷却部件包括一个冷却剂进气管和N个冷却剂排气管，排气管与进气管的尾端连通形成冷却剂流通通道；其中N≥2，且N为自然数。
与已有技术相比，本申请具有如下有益效果：
本申请提供的玻璃带抛光成形方法，是使熔融的玻璃液流经铂或铂合金抛光成形部以完成对玻璃液的抛光成形。该抛光成形过程中，玻璃液在铂或铂合金抛光成形部表面流动铺展形成具有一定厚度的玻璃带，所得玻璃带的第一长宽面保持原始表面，第二长宽面与表面抛光的铂或铂合金抛光成形部接触进行抛光。
与浮法工艺方法中的锡槽抛光成形相比，本申请提供的抛光成形方法中，铂或铂合金抛光成形部为有形的固定部件，可以以任意形状或连接结构方式设置，占地面积小，且不 受锡槽锡液必须水平放置的限制，降低了设备的投资成本和后期维护成本。另外，利用浮法工艺方法制备花纹形状的玻璃基板时，在锡槽中完成抛光成形后还需要在锡槽外进行二次加工以得到所需图案。而本申请提供的抛光成形方法可以将铂或铂合金抛光成形部的表面设计成所需花纹，在抛光成形时就可以得到所需图案，避免二次加工。
与狭缝下拉法相比，本申请的抛光成形方法中玻璃带有一面处于原始表面，不受挤压拉拔的作用力，从而避免玻璃划伤，提高了玻璃基板的成品率。与溢流下拉法相比，开拓了一种全新的玻璃基板的生产方法，打破了国外对于高质量玻璃基板生产技术的垄断，对于降低玻璃的生产成本具有重要的意义。
附图说明
为了更清楚地说明本申请具体实施方式或现有技术中的技术方案，下面将对具体实施方式或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图是本申请的一些实施方式，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请实施例2提供的玻璃基板生产设备的结构示意图；
图2为图1所示结构中盛料装置的结构示意图；
图3为图1所示结构中牵引辊的结构示意图；
图4为本申请实施例3提供的玻璃基板生产设备的结构示意图；
图5为本申请实施例4提供的玻璃基板生产设备的结构示意图；
图6为本申请实施例5提供的玻璃基板生产设备的结构示意图；
图7为本申请实施例7提供的玻璃基板生产设备中槽形铂金属板结构示意图；
图8为本申请实施例8提供的玻璃基板生产设备的结构示意图。
图标：10-熔窑；20-流料管；30-澄清池；40-均化池；41-搅拌器；50-盛料装置；51-出料口；52-平面侧壁；60-铂金属平板；61-槽形铂金属板；62-铂金属圆筒；70-玻璃带；80-牵引辊；81-冷却剂进气管；82-冷却剂排气管。
具体实施方式
下面将结合附图对本申请的技术方案进行清楚且完整地描述，显然，所描述的实施例是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
在本申请的描述中，需要说明的是，术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”和“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位或者以特定的方位构造和操作，因此不能理解为对本申请的限制。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”和“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本申请中的具体含义。
本申请的一个方面提供了一种玻璃带抛光成形方法，使玻璃液流经表面抛光的铂或铂合金抛光成形部形成玻璃带，玻璃带的第一长宽面保持原始表面，玻璃带的第二长宽面与表面抛光的铂或铂合金抛光成形部接触完成对玻璃带的抛光成形处理。
本申请提供的玻璃带抛光成形方法，是使熔融的玻璃液流经铂或铂合金抛光成形部以完成对玻璃液的抛光成形。该抛光成形过程中，玻璃液在铂或铂合金抛光成形部表面流动铺展形成具有一定厚度的玻璃带，所得玻璃带的第一长宽面保持原始表面，第二长宽面与表面抛光的铂或铂合金抛光成形部接触进行抛光。
与浮法工艺方法中的锡槽抛光成形相比，本申请提供的抛光成形方法中，铂或铂合金抛光成形部为有形的固定部件，可以以任意形状或连接结构方式设置，占地面积小，且不受锡槽锡液必须水平放置的限制，降低了设备的投资成本和后期维护成本。另外，利用浮法工艺方法制备花纹形状的玻璃基板时，在锡槽中完成抛光成形后还需要在锡槽外进行二次加工以得到所需图案。而本申请提供的抛光成形方法可以将铂或铂合金抛光成形部的表面设计成所需花纹，在抛光成形时就可以得到所需图案，避免二次加工。
与狭缝下拉法相比，本申请的抛光成形方法中玻璃带有一面处于原始表面，不受挤压拉拔的作用力，从而避免玻璃划伤，提高了玻璃基板的成品率。与溢流下拉法相比，开拓了一种全新的玻璃基板的生产方法，打破了国外对于高质量玻璃基板生产技术的垄断，对于降低玻璃的生产成本具有重要的意义。
本申请中，铂或铂合金抛光成形部具有表面经抛光处理的表面光滑的铂或铂合金表面，用于玻璃带的抛光成形。表面经抛光处理并非指铂或铂合金抛光成形部的表面为平面，可以是任意形状的表面，但是必须要保证光滑。玻璃液在流经铂或铂合金抛光成形部的过程中会降温增稠，流经铂或铂合金抛光成形部的玻璃液，其温度相对于初始熔融状态的玻璃液而言有所降低，粘度有所增加，具有一定的流动性和可塑性。
另外，本申请中的铂或铂合金抛光成形部与玻璃液接触不被熔融。铂或铂合金抛光成形部的表面形貌可以根据加工的玻璃基板的表面形貌进行设计。若待加工的玻璃基板的表面形貌要求为平面，且要求有较高的透光率，可以将铂或铂合金抛光成形部的表面设计为光滑的平面。若待加工的玻璃基板的表面形貌要求为花纹形，可以将铂或铂合金抛光成形部的表面设计为相应的花纹形貌。
可以理解的是，本申请中并未对铂或铂合金抛光成形部的具体形状做出限定，只要铂或铂合金抛光成形部能够与玻璃液进行面接触以实现对玻璃液的抛光成形处理即可。
在本申请的一些实施方式中，玻璃带的第一长宽面保持原始表面，玻璃带的第二长宽面和厚度方向的至少一面与表面抛光的铂或铂合金抛光成形部接触完成对玻璃带的抛光成形。
铂或铂合金抛光成形部接触，可以对玻璃带的厚度进行限定。
在本申请的一些实施方式中，铂或铂合金抛光成形部的形状包括但不限于板、圆筒或圆柱。可选地，所述铂或铂合金板包括铂或铂合金平板或槽形板。可选地，铂或铂合金抛光成形部的表面为平面或曲面。
铂或铂合金抛光成形部可以按生产条件或工艺要求设计加工成板、圆筒或圆柱，其表面形貌可以为平面，也可以为曲面。
当选用板形铂或铂合金抛光成形部进行抛光成形时，玻璃基板的一个长宽面(长宽面是指由玻璃基板的长宽组成的表面)与铂或铂合金抛光成形部接触，另一个长宽面处于处于自由态，保持玻璃的原始状态。
当选用槽形铂或铂合金抛光板进行抛光成形时，玻璃基板的一个长宽面和两个长高侧面(长高侧面是指玻璃基板的长高组成的侧面)与铂或铂合金抛光成形部接触，其余表面处于自由态。
在本申请的一些实施方式中，所述铂合金为铂铱合金或铂铑合金。
铂或铂合金的耐高温性能好，且铂或铂合金的表面便于玻璃液的流动，更有利于玻璃液的抛光成形。其中，以重量百分比计，金属中铂的含量为60％-100％。
在本申请的一些实施方式中，铂或铂合金抛光成形部包括基体和铂或铂合金涂层，基体为耐高温无机材料基体。例如，基体材料可以选用刚玉或氧化锆耐火材料，或者使用钨钼等耐高温金属。其中，可以采用火焰喷涂或气相沉积的方法在耐高温无机材料基体或耐高温金属基体表面制备一层铂或铂合金的光滑涂层。
在本申请的一些实施方式中，所述玻璃液的粘度为：102Pa·s-1x10 7Pa·s。
通过限定玻璃液的粘度，可以提高抛光成形质量。另外，通过控制粘度以调整玻璃液的流速，从而控制玻璃基板的厚度。
可以理解的是，玻璃带自抛光至固化成形为单层玻璃。
本申请的第二个方面提供了一种玻璃基板生产方法，包括利用上述玻璃带抛光成形方法对玻璃带进行抛光成形处理的步骤。
本申请提供的玻璃基板生产方法具有上述玻璃带抛光成形方法的全部优点，在此不再赘述。
在本申请的一些实施方式中，先对熔融的玻璃液进行澄清均化后再进行抛光成形处理；可选地，玻璃带经抛光成形处理后再依次经过拉薄成形处理和退火处理得到所述玻璃基板。
可以理解的是，玻璃原料的熔融、玻璃液的澄清均化以及后续玻璃带的拉薄成形、退火处理及裁切均可以采用现有的方法进行，无需做特殊改进。因此，本申请提供的玻璃基板生产方法与现有工艺设备可结合程度高，使用范围广。
本申请的第三个方面提供了一种玻璃基板生产设备，包括玻璃液的盛料装置和铂或铂合金抛光成形部，所述玻璃液从盛料装置中流出后能够流经所述铂或铂合金抛光成形部。
本申请提供的玻璃基板生产设备中，包括熔融玻璃液的盛料装置和铂或铂合金抛光成形部，其中盛料装置与铂或铂合金抛光成形部可以直接接触，也可以不接触。
例如，铂或铂合金抛光成形部可以直接连接于盛料装置的边缘，玻璃液从盛料装置中流出后，直接流经铂或铂合金抛光成形部，完成抛光成形后再进行后续的加工处理。
又如，铂或铂合金抛光成形部也可以不与盛料装置接触，可以将铂或铂合金抛光成形部放置于出料装置的下方。此时，可以将盛料装置的出料口一侧的侧壁设计成平面结构，当玻璃液从盛料装置中流出后，会沿着该平面结构的侧壁继续向下流动。玻璃液向下流动的过程中温度下降，之后铺设于铂或铂合金抛光成形部表面，流过铂或铂合金抛光成形部后完成抛光成形处理过程。
当铂或铂合金抛光成形部为铂或铂合金抛光板时，即铂或铂合金抛光成形板为平板或槽形板时，铂或铂合金抛光板可以竖直放置，也可以水平放置，还可以倾斜放置，只要使玻璃液能够在该铂或铂合金板上流动即可。
铂或铂合金抛光成形部为铂或铂合金圆筒或圆柱时，可以通过转动圆筒或圆柱与玻璃液产生相对运动，完成抛光成形的处理过程。
本申请中的盛料装置可以设置成不同的形状结构，例如可以是方形或圆形。根据待加工的玻璃基板的尺寸设计出料口的形状尺寸。
在本申请的一些实施方式中，所述生产设备还包括澄清均化装置，所述澄清均化装置由至少两组流料管与内腔为圆柱形的澄清池构成，所述流料管与所述澄清池连通，所述澄清池的底部高于流料管底部，所述澄清均化装置与所述盛料装置连通，所述玻璃液经澄清均化处理后进入所述盛料装置。
熔融的玻璃液经澄清均化后再进入盛料装置。澄清池与真空装置连接以对澄清池进行减压处理，使澄清池处于负压状态，以排除熔融玻璃液中的气泡。流进搅拌池的熔融玻璃液经搅拌后得到成分更为均匀的玻璃液。
澄清池的底部高于流料管底部，相当于在澄清池底部设置了凸起部，当熔融玻璃液流经至此处后，与该凸起部有一定的撞击，可以有利于玻璃液中的气泡排出，同时，有利于 玻璃液的均化。
在本申请的一些实施方式中，所述生产设备包括拉薄成形装置，利用所述拉薄成形装置对经过抛光成形处理后得到的玻璃带进行拉薄成形处理；可选地，所述拉薄成形装置包括成对设置的牵引辊和驱动所述牵引辊转动的驱动部件。
为了防止玻璃带产生收缩变形，玻璃带在拉薄成形装置的作用下进行拉薄成形处理。该处理过程中，可以用牵引辊对玻璃带进行拉薄成形处理。其中，牵引辊为成对设置，为了使受力更为均匀，可以成对对称设置。
在本申请的一些实施方式中，牵引辊内设有冷却部件，所述冷却部件包括一个冷却剂进气管和N个冷却剂排气管，进气管的尾端与排气管连通构成冷却剂流通通道；其中N≥2，且N为自然数。冷却剂可以为液体冷却剂也可以为气体冷却剂。液体冷却剂可以选择水，气体冷却剂可以选择氮气。
下面将结合实施例对本申请做进一步详细的说明。
实施例1
本实施例是一种玻璃基板生产方法，包括以下步骤：
步骤a)：在熔窑内将玻璃原料熔化成玻璃液，熔融温度为1500-1630℃；
步骤b)：熔融后所得玻璃液经澄清均化后进入盛料装置，自盛料装置顶部流出，玻璃液的粘度控制在102Pa·s-1x10 7Pa·s，之后流经铂金属平板，在铂金属平板上铺展进行抛光成形后得到玻璃带；
步骤c)：玻璃带依次经拉薄成形、退火和分切后得到玻璃基板。
实施例2
如图1所示，本实施例是一种玻璃基板生产设备，包括熔窑10、流料管20、澄清池30、均化池40、盛料装置50、铂金属平板60以及拉薄成形装置。盛料装置的结构如图2所示。本实施例中的生产设备还包括防尘封闭系统和玻璃液冷却系统，在图中并未标示出。
熔窑10通过流料管20与澄清池30连通，澄清池30内连通真空泵，利用真空泵对澄清池30进行减压处理使澄清池30内处于负压状态。澄清池30通过流料管20与均化池40连通，均化池40内设有搅拌器41，经澄清处理后的玻璃液进入均化池40进行均化处理。玻璃液经均化处理后进入盛料装置50，盛料装置50的出料口51所在侧壁为一平面侧壁52，玻璃液从出料口51溢出后经平面侧壁52后流经位于该平面侧壁52下方的铂金属平板60，玻璃液继续在铂金属平板60上流动并铺设于铂金属平板60表面形成玻璃带70，其中，铂金属平板60竖直放置于平面侧壁52的下方。玻璃带经拉薄成形装置进行拉薄成形处理后再进行退火和分切处理，最后得到玻璃基板。
继续参照图1，本实施例的拉薄成形装置包括成对设置的牵引辊80，牵引辊80对称设 置于玻璃带70的两侧。
如图3所示，牵引辊80包括一个冷却剂进气管81和两个冷却剂排气管82，冷却剂从冷却剂进气管81进入后再从冷却剂排气管82流出以实现对牵引辊80的冷却。
实施例3
本实施例是一种玻璃基板生产设备，与实施例2中的生产设备相比，不同之处在于，本实施例中的铂金属平板直接连接于盛料装置的出口处，玻璃液从盛料装置溢出后直接流经铂金属平板，具体连接结构如图4所示，除此之外，本实施例中的结构部件与连接结构均与实施例2相同。
实施例4
本实施例是一种玻璃基板生产设备，与实施例2中的生产设备相比，不同之处在于，本实施例中的铂金属平板水平放置于平面侧壁的下方，具体连接结构如图5所示。
实施例5
本实施例是一种玻璃基板生产设备，与实施例2中的生产设备相比，不同之处在于，本实施例中的铂金属平板倾斜放置于平面侧壁的下方，铂金属平板与水平面的夹角为30°，具体连接结构如图6所示。
实施例6
本实施例是一种玻璃基板生产设备，与实施例5中的生产设备相比，不同之处在于，本实施例中的铂金属平板倾斜放置于平面侧壁的下方，铂金属平板与水平面的夹角为45°。
实施例7
本实施例是一种玻璃基板生产设备，与实施例2中的生产设备相比，不同之处在于，本实施例中的铂或铂合金抛光成形部为槽形铂金属板61，槽形铂金属板61倾斜放置于平面侧壁的下方，槽形铂金属板61与水平面的夹角为30°。其中，槽形铂金属板61的结构如图7所示。
实施例8
本实施例是一种玻璃基板生产设备，与实施例2中的生产设备相比，不同之处在于，本实施例中的铂或铂合金抛光成形部为铂金属圆筒62，铂金属圆筒62放置于平面侧壁的下方，具体连接结构如图8所示。
最后应说明的是：以上各实施例仅用以说明本申请的技术方案，而非对其限制；尽管参照前述各实施例对本申请进行了详细的说明，本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分或者全部技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例技术方案的范围。

Claims (10)

  1. 一种玻璃带抛光成形方法，其特征在于，使玻璃液流经表面抛光的铂或铂合金抛光成形部形成玻璃带，所述玻璃带的第一长宽面保持原始表面，所述玻璃带的第二长宽面与所述表面抛光的铂或铂合金抛光成形部接触完成对所述玻璃带的抛光成形处理。
  2. 根据权利要求1所述的玻璃带抛光成形方法，其特征在于，所述玻璃带的第一长宽面保持原始表面，所述玻璃带的第二长宽面和厚度方向的至少一面与所述表面抛光的铂或铂合金抛光成形部接触完成对所述玻璃带的抛光成形。
  3. 根据权利要求1或2所述的玻璃带抛光成形方法，其特征在于，所述铂或铂合金抛光成形部的形状包括板、圆筒或圆柱；
    优选地，所述铂或铂合金抛光成形部的表面为平面或曲面。
  4. 根据权利要求1或2所述的玻璃带抛光成形方法，其特征在于，所述铂合金为铂铱合金或铂铑合金。
  5. 根据权利要求1或2所述的玻璃带抛光成形方法，其特征在于，所述玻璃带的粘度为：102Pa·s-1x10 7Pa·s；
    优选地，所述玻璃带自抛光至固化成形为单层玻璃。
  6. 一种玻璃基板生产方法，其特征在于，包括利用权利要求1-5任一项所述的玻璃带抛光成形方法对玻璃带进行抛光成形处理的步骤。
  7. 根据权利要求6所述的玻璃基板生产方法，其特征在于，先对熔融的玻璃液进行澄清均化后再进行抛光成形处理；
    优选地，所述玻璃带经抛光成形处理后再依次经过拉薄成形处理和退火处理得到所述玻璃基板。
  8. 一种玻璃基板生产设备，其特征在于，包括玻璃液的盛料装置与铂或铂合金抛光成形部，所述玻璃液从所述盛料装置中流出后能够流经所述铂或铂合金抛光成形部。
  9. 根据权利要求8所述的玻璃基板生产设备，其特征在于，所述生产设备包括拉薄成形装置，利用所述拉薄成形装置对经过抛光成形处理后得到的玻璃带进行拉薄成形处理。
  10. 根据权利要求8或9所述的玻璃基板生产设备，其特征在于，所述拉薄成形装置包括成对设置的牵引辊和驱动所述牵引辊转动的驱动部件；
    优选地，所述牵引辊内设有冷却部件，所述冷却部件包括一个冷却剂进气管和N个冷却剂排气管，所述排气管与所述进气管的尾端连通形成冷却剂流通通道；其中N ≥2，且N为自然数。
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