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WO2019003600A1 - Sealing resin composition, electronic component, and electronic component manufacturing method - Google Patents

Sealing resin composition, electronic component, and electronic component manufacturing method Download PDF

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Publication number
WO2019003600A1
WO2019003600A1 PCT/JP2018/016120 JP2018016120W WO2019003600A1 WO 2019003600 A1 WO2019003600 A1 WO 2019003600A1 JP 2018016120 W JP2018016120 W JP 2018016120W WO 2019003600 A1 WO2019003600 A1 WO 2019003600A1
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WO
WIPO (PCT)
Prior art keywords
resin composition
film capacitor
electronic component
sealing resin
epoxy resin
Prior art date
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Ceased
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PCT/JP2018/016120
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French (fr)
Japanese (ja)
Inventor
悠香里 峯岸
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Kyocera Corp
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Kyocera Corp
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Publication date
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/09Carboxylic acids; Metal salts thereof; Anhydrides thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00Use of ingredients characterised by shape
    • C08K7/22Expanded, porous or hollow particles
    • C08K7/24Expanded, porous or hollow particles inorganic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00Use of ingredients characterised by shape
    • C08K7/22Expanded, porous or hollow particles
    • C08K7/24Expanded, porous or hollow particles inorganic
    • C08K7/26Silicon- containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G2/00Details of capacitors not covered by a single one of groups H01G4/00-H01G11/00
    • H01G2/10Housing; Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/32Wound capacitors

Definitions

  • the present invention relates to a resin composition for sealing, an electronic component and a method for manufacturing the electronic component, and in particular, a resin composition for sealing suitable for manufacturing a film capacitor excellent in low moisture permeability etc., a film capacitor and a method for manufacturing the same About.
  • the film capacitor element is housed in an injection mold having a cavity recess capable of housing a film capacitor element, and the injection molding die is clamped to inject a polyphenylene sulfide resin into the cavity.
  • a method of resin-sealing a film capacitor element housed inside to form an outer cover of the film capacitor element, and impregnating a resin between wound films of the film capacitor element for example, a patent) Reference 2.
  • an epoxy resin composition in which an inorganic water-absorbing material is added to a composition having a predetermined range of a moisture diffusion coefficient of a cured product using an epoxy resin which has low moisture permeability of the cured product and is suitable as a pre-mold type hollow package material.
  • Patent Document 3 An epoxy resin composition in which an inorganic water-absorbing material is added to a composition having a predetermined range of a moisture diffusion coefficient of a cured product using an epoxy resin which has low moisture permeability of the cured product and is suitable as a pre-mold type hollow package material.
  • a hygroscopic layer is formed on part of the conductive layer in an electronic component such as a solid electrolytic capacitor (see, for example, Patent Document 4), and silica gel or the like is contained in solid epoxy resin (for example, Patent Document 5), etc. have been proposed.
  • Japanese Examined Patent Publication 5-77324 Japanese Patent Application Laid-Open No. 7-161578 Japanese Patent Laid-Open No. 7-216196 JP, 2017-59652, A Unexamined-Japanese-Patent No. 9-286845 gazette
  • Patent Document 5 the type of the electronic component that can be sealed with a high resin viscosity is only applicable to a limited type, and application to a film capacitor element or the like is difficult.
  • the present invention has been made in view of such circumstances, and is a film capacitor excellent in reliability with no occurrence of voids, a good appearance, a low moisture permeability of a cured product, and a low rate of change in capacitance. It is an object of the present invention to provide a resin composition suitable for the production of the present invention, and a film capacitor using the resin composition.
  • the sealing resin composition of the present invention comprises (A) a liquid epoxy resin, (B) a curing agent, (C) a curing accelerator, (D) a porous filler, and (E) the above (D) )
  • An inorganic filler other than a porous filler is contained as an essential component.
  • the electronic component of the present invention is characterized in that the electronic element is sealed with the cured product of the sealing resin composition of the present invention.
  • the sealing resin composition of the present invention is injected into the mold; It is characterized in that it is cured and molded while applying pressure.
  • a material suitable for sealing an electronic element can be provided because the moldability is excellent, the cured product has low moisture permeability, and the change rate of capacitance is small.
  • the electronic element since the electronic element is sealed with the sealing resin composition, it has low moisture permeability, a small change rate of capacitance, and reliability. Can provide excellent electronic components. Thereby, the capacitor characteristic of the electronic component can also be improved.
  • the sealing resin composition of the present embodiment includes (A) liquid epoxy resin, (B) curing agent, (C) curing accelerator, and (D) porous filler (E).
  • the inorganic filler other than the (D) porous filler is contained as an essential component, and each of these components will be described below.
  • the liquid epoxy resin (A) used in the present embodiment is a liquid epoxy resin having one or more epoxy groups per molecule at room temperature, and preferably two or more epoxy groups per molecule.
  • examples of such an epoxy resin include bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol AD epoxy resin, novolac epoxy resin, glycidyl ester epoxy resin, alicyclic epoxy resin, glycidyl ether and the like. Be These can be used alone or in combination of two or more.
  • any curing agent for the liquid epoxy resin (A) may be used without particular limitation as long as it is conventionally used as a curing agent for epoxy resin. be able to.
  • the (B) curing agent include an acid anhydride curing agent, an amine curing agent, a phenol resin curing agent and the like. These can be used singly or in combination of two or more.
  • the acid anhydride curing agent examples include tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyl hexahydrophthalic anhydride, etc.
  • Specific examples of the amine curing agent Examples include isophorone diamine, 1,3-bis (aminomethyl) cyclohexane, bis (4-aminocyclohexyl) methane, norbornene diamine, 1,2-diaminocyclohexane, laromine and the like.
  • HN2000, HN5500 manufactured by Hitachi Chemical
  • ancamine 1618, ancamine 2074, ancamine 2228 manufactured by Air Products Japan
  • Daitoclar F-5194 Daitoclar B-1616 (made by Daito Sangyo)
  • Fujicure FXD -821 Fujicure 4233 (manufactured by Fuji Kasei Kogyo Co., Ltd.)
  • JER cure 113 manufactured by Mitsubishi Chemical Corporation
  • Lamillon C-260 manufactured by BASF Corporation
  • the amount of the curing agent (B) is preferably in the range of 0.7 to 1.3 equivalents of the curable functional group of the cured product (B) per equivalent of the epoxy group of the liquid epoxy resin (A).
  • the range of 9 to 1.1 equivalents is more preferable. If the above range is exceeded, properties such as heat resistance, mechanical properties and moisture resistance of the cured product may be reduced.
  • the curing accelerator (C) used in the present embodiment is a known curing accelerator used in an epoxy resin curing system.
  • Examples of the curing accelerator (C) include aromatic dimethylurea, aliphatic dimethylurea, 3- (3,4-dichlorophenyl) -1,1-dimethylurea (DCMU), and 3- (3-chloro-4).
  • urea such as 2,4-bis (3,3-dimethylureido) toluene, benzyldimethylamine, 1,8-diazabicyclo (5.4.0) undecen-7
  • Tertiary amine compounds such as triethylamine, 2-ethyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 2-methylimidazole, 2-ethylimidazole, 2-isopropylimidazole, 2-phenylimidazole, 2 Imidazole compounds such as -phenyl-4-methylimidazole, triphenylphosphine salts etc. Phosphine salt compounds, and the like.
  • These curing accelerators may be used alone or in combination of two or more.
  • an imidazole-based curing accelerator can be preferably used from the viewpoint of low moisture permeability and humidity resistance.
  • the compounding amount of the (C) curing accelerator is 100 parts by mass of the total amount of the (A) liquid epoxy resin and the (B) curing agent from the viewpoint of the balance between the curing accelerating property and the physical properties of the cured resin, etc. It is usually in the range of about 0.1 to 10 parts by mass, preferably 0.4 to 5 parts by mass.
  • the (D) porous filler used in the present embodiment is a substance that can be used as a filler having a large number of fine pores, and has a specific surface area of 50 to 20000 m 2 / g and an average pore size of 0.1 nm to 1000 nm.
  • the (D) porous filler for example, silica gel, cellulose, zeolite, molecular sieve, diatomaceous earth, perlite, etc. can be used without particular limitation as long as it is a porous filler having the above characteristics, and silica gel is preferable.
  • the (D) porous filler preferably has a specific surface area of 100 to 10000 m 2 / g and an average pore diameter of 1 to 50 nm, and a specific surface area of 400 to 1000 m 2 / g and an average pore diameter of 1 to 20 nm More preferable.
  • the adsorption efficiency will be low, and if it is more than 10000 m 2 / g, the flowability at the time of injection may be reduced and unfilled parts may be generated. .
  • the average pore diameter of the (D) porous filler is less than 1 nm, the adsorption efficiency is low, and when it is more than 50 nm, good mechanical properties may not be obtained.
  • the specific surface area was calculated by the BET method by measuring the amount of adsorption by the gas adsorption method.
  • the average pore diameter was also measured using the specific surface area and total pore volume calculated from the BET method by measuring the adsorption amount by the gas adsorption method.
  • the average particle diameter of the (D) porous filler is preferably 0.5 to 100 ⁇ m, and more preferably 1 to 50 ⁇ m.
  • the average particle diameter is obtained by measuring a particle size distribution based on volume using a laser scattering particle size distribution analyzer (for example, LA-920 (trade name, manufactured by Horiba, Ltd.) etc.) Indicates the 50% integrated value (50% particle size).
  • the porous filler (D) is preferably contained in an amount of 1 to 10% by mass, preferably 2 to 5% by mass, based on the total amount of the resin composition. If the amount of the porous filler is less than 1% by mass, the moisture permeation resistance may be insufficient. On the other hand, when it is more than 10% by mass, the viscosity of the resin composition is increased, the fluidity at the time of injection is decreased, and there is a possibility that an unfilled portion may be generated.
  • the inorganic filler other than the (E) porous filler used in the present embodiment is a known inorganic filler to be blended in the resin composition, and it is other than the above (D) porous filler It is not particularly limited.
  • the (E) inorganic filler include silica, alumina, silicon nitride, boron nitride, magnesia, boehmite, calcium carbonate, aluminum hydroxide, talc and the like.
  • silica powder is preferably used, and in particular, use of spherical silica powder is preferable.
  • the (E) inorganic filler may be used alone or in combination of two or more.
  • the compounding amount of the (E) inorganic filler is preferably 50 to 85% by mass, preferably 70 to 85% by mass, based on the total amount of the resin composition. If the compounding amount of the (E) inorganic filler is less than 50% by mass, distortion or breakage of a structure such as an electronic element or an electrode due to shrinkage of a cured product may easily occur, and moisture permeation resistance may be insufficient. On the other hand, when the compounding amount is more than 85% by mass, the flowability at the time of injection is lowered, and unfilled portions are generated, which is not preferable. The thermal shock resistance of hardened
  • the average particle diameter of the (E) inorganic filler used here is preferably 0.5 to 100 ⁇ m, more preferably 10 to 30 ⁇ m.
  • the (E) inorganic filler in the present embodiment it is preferable to use two or more types of fillers having the same material but different average particle sizes, because the flowability at the time of injection becomes good.
  • a filler based on 100% by mass of the whole (E) inorganic filler, 70 to 90% by mass of spherical fused silica having an average particle size of more than 15 ⁇ m and 25 ⁇ m or less and 10 to 30 spherical fused silica having an average particle size of 1 to 5 ⁇ m It is more preferable to contain in the range of mass%.
  • spherical fused silica it is particularly preferable to constitute the (E) inorganic filler only with the above-mentioned spherical fused silica.
  • silica powder which consists of fusion crushing silica and crystalline silica for the remaining filler It is preferable from the viewpoint of low water absorption and low moisture permeability of the cured product.
  • the total amount of the component (D) and the component (E) is preferably in the range of 51 to 95% by mass, preferably in the range of 77 to 90% by mass, based on the total weight of the resin composition. If the amount is less than 51% by mass, the low water absorption and low moisture permeability of the cured product may be insufficient. If the amount is more than 95% by mass, the flowability at the time of injection may be reduced and unfilled portions may be generated.
  • a coupling agent for example, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, etc.
  • Mold release agents eg, synthetic waxes, natural waxes, linear aliphatic metal salts, acid amides, esters, etc.
  • colorants eg, carbon black, cobalt blue, etc.
  • low stressing agents eg, silicones
  • an antifoamer, etc. may be further blended.
  • roll kneading such as a three-roll kneader or the like, or It can be easily manufactured by a conventionally known method in which the kneading treatment is carried out by mixer kneading and the like and then the pressure is removed under reduced pressure.
  • the resin composition of the present embodiment preferably has a viscosity at 60 ° C. of less than 100 Pa ⁇ s.
  • a viscosity at 60 ° C. of less than 100 Pa ⁇ s.
  • the viscosity is 100 Pa ⁇ s or more, the flowability at the time of injection in the molding operation may be reduced, and there may be an unfilled portion.
  • the gel time at 100 ° C. is preferably 5 to 30 minutes.
  • the gel time is 5 minutes or less, voids are easily generated in the cured product, and when the gel time is 30 minutes or more, the shape retention of the cured product is deteriorated.
  • an electronic component such as a film capacitor which exhibits stable capacitance, low moisture permeability and good appearance, and such an electronic component is excellent in reliability. is there.
  • the electronic component of the present embodiment has an electronic element, and the electronic element is sealed with the cured product of the sealing resin composition of the present embodiment.
  • a film capacitor element As an electronic element used here, a film capacitor element, an electrolytic capacitor element, a ceramic capacitor element, etc. are mentioned. A film capacitor element is preferable as the electronic element. Moreover, as a hardened
  • the resin composition for sealing of this embodiment is inject
  • An injection molding method may be used in which the resin composition for sealing injected into the above is molded while being cured under pressure. Except the sealing resin composition to be used, it can manufacture by a conventionally well-known method.
  • FIGS. 1A and 1B are diagrams for explaining a method of manufacturing a film capacitor of the present embodiment.
  • a mold used for manufacturing a film capacitor is composed of a lower mold 1 and an upper mold 2, and in this mold, a recess is formed in each of the lower mold 1 and the upper mold 2.
  • the recess is a cavity. The resin composition melted in this cavity is used for injection molding to produce a film capacitor.
  • the film capacitor element 3 is disposed in the recess of the lower mold 1 having a recess of a predetermined shape and temperature controlled, and the injection nozzle of the liquid epoxy resin composition 4 thereon While covering the upper mold 2 having 5 and sealing the joint with the lower mold 1 in an airtight manner, the inside of the cavity formed by the lower mold 1 and the upper mold 2 is vacuum pump etc. (not shown) The pressure is reduced by vacuum to reach 10 Torr.
  • the injection nozzle 5 is connected to a sprue for introducing the resin provided in the upper mold 2 into the cavity at the tip end portion 5c, and the entire nozzle is configured to be vertically movable up and down. Further, the nozzle tip 5c can be opened and closed by raising and lowering a plunger 5b disposed concentrically in the nozzle main pipe 5a.
  • the film capacitor 11 obtained here has, for example, as shown in FIG. 2, a configuration in which the film capacitor element 3 is covered and protected with a cured product 12 of a liquid epoxy resin composition, and the electrode 3a is The end of the end projects out of the cured product 12 so that it can be connected to other devices.
  • the film capacitor element 3 is a capacitor formed by winding a film and an electrode foil, and the metal electrodes 3a are projected in parallel from the upper and lower surfaces thereof so as to extend in the reverse direction with respect to the capacitor body.
  • the illustrated film capacitor element 3 is an example, and as the film capacitor element 3 in the present embodiment, any known film capacitor element can be used without particular limitation.
  • the supply of the liquid epoxy resin composition 4 to the film capacitor 3 and the sealing molding can be continued continuously and efficiently performed.
  • a sealed molded article free of voids and having a good appearance can be obtained.
  • a thermosetting resin after setting injection temperature to low temperature, it is preferable to be filled with a high temperature metal mold and to harden it.
  • an injection temperature of 50 to 70 ° C. is preferable. If it is less than 50 ° C., the fluidity will be poor. On the other hand, if the temperature is higher than 70 ° C., it is not preferable because a curing reaction partially proceeds in the injection nozzle.
  • the filling rate is preferably 0.2 to 5.0 L / min. It is unpreferable from the viewpoint of productivity as it is less than 0.2 L / min. On the other hand, if it is 5.0 L / min, there is a possibility that a resin winding void may occur in the sealing molded body, which is not preferable.
  • the pressure is preferably 0.2 to 10 MPa. If it is less than 0.2 MPa, unfilled parts and voids occur. On the other hand, if the pressure is higher than 10 MPa, the film capacitor element is broken.
  • the injection nozzle or the like may be equipped with a heating means such as a heater capable of heating the resin to a desired temperature for maintaining the resin.
  • the heat curing of the resin composition is preferably carried out at 90 to 110 ° C. for about 5 to 25 minutes. Within this range, the curing reaction proceeds slowly, and the voids of the film capacitor element are uniformly impregnated and filled with the resin composition.
  • the temperature of the mold is preferably 90 to 120.degree. Below 90 ° C., insufficient curing occurs. On the other hand, if the temperature is higher than 120 ° C., the film capacitor element is damaged by heat.
  • the lower mold 1 and the upper mold 2 are preferably made of a metal such as stainless steel having heat resistance and corrosion resistance.
  • the capacitor device obtained in this manner is a device that is excellent in any of various characteristics such as moisture permeability, change in capacitance, and the like, and has high reliability.
  • Examples 1 to 9 Each raw material of the compounding composition (mass part) shown in Table 1 and Table 2 was stirred and mixed uniformly, and the liquid epoxy resin composition was prepared.
  • 12 film capacitor elements (60 mm ⁇ 35 mm, thickness 60 mm) are accommodated and arranged at predetermined positions of the lower mold recess, and the upper mold is put in place and the mold is closed.
  • the liquid epoxy resin composition prepared above was introduced into the main nozzle of the injection nozzle, and the inside of the cavity between the lower mold and the upper mold was allowed to reach 10 Torr by a vacuum pump.
  • the plunger is raised, and the resin composition is injected and filled into the cavity at a filling speed of 0.5 L / min and an injection temperature of 60 ° C.
  • the lower mold and the upper mold are heated under a predetermined pressure, 110 ° C.
  • the resin composition was heated and cured under the conditions of 20 minutes, and the electrode terminal of the film capacitor element was sandwiched between the upper mold and the lower mold without a gap. Thereafter, the mold was opened, the cured product was taken out of the mold, and post curing was performed under conditions of 100 ° C. for 2 hours to produce a film capacitor (200 mm ⁇ 250 mm, thickness 70 mm) (E-LIM ( Epoxy-Liquid Injection Molding) method.
  • E-LIM Epoxy-Liquid Injection Molding
  • each raw material component used is as follows.
  • Epoxy resin 1 R140P (Bisphenol A type epoxy resin manufactured by Mitsui Chemicals, Inc., trade name)
  • Epoxy resin 2 BREM-105 (Broked epoxy resin manufactured by Nippon Kayaku Co., Ltd., trade name)
  • Epoxy resin 3 EPOXAN (Shin-Etsu Chemical silicone modified epoxy resin, trade name)
  • Hardening agent 1 HN 2000 (Mityl tetrahydrophthalic anhydride manufactured by Hitachi Chemical Co., Ltd., trade name)
  • Curing agent 2 NH-7000 (phenol resin manufactured by Nippon Kayaku Co., Ltd., trade name)
  • Curing agent 3 XL225-3L (Phenolic resin manufactured by Mitsui Chemicals, Inc., trade name)
  • [(C) curing accelerator] 2E4MZ Imidazole manufactured by Shikoku Kasei Co., Ltd., trade name
  • Inorganic filler 1 HS-106 (Spherical fused silica manufactured by Micron, trade name; spherical, average particle diameter 18.2 ⁇ m)
  • Inorganic filler 2 SO-C6 (Spherical fused silica manufactured by Adma Fine, trade name; spherical, average particle size 2.2 ⁇ m)
  • Porous filler 1 Mizukasil P-73 (silica gel manufactured by Mizusawa Chemical Industry, trade name; average particle diameter 4 ⁇ m, specific surface area 330 m 2 / g, average pore diameter 14 nm)
  • Porous filler 2 Mizukasil P-50 (silica gel manufactured by Mizusawa Chemical Industry, trade name; average particle diameter 10 ⁇ m, specific surface area 330 m 2 / g, average pore diameter 13 nm)
  • Porous filler 3 Sycilia 730 (silica gel manufactured by Fuji Silysia Chemical Ltd., trade name; average particle diameter 4 ⁇ m, specific surface area 700 m 2 / g, average pore diameter 2.5 nm)
  • Porous filler 4 Sycyria 350 (silica gel manufactured by Fuji Silysia Chemical Ltd., trade name; average particle diameter 4 ⁇ m, specific surface area 300 m 2 / g, average pore diameter 21 nm)
  • Viscosity In accordance with the viscosity measurement method of JIS C 2105, rotor No. 1 was measured by a BROOK FIELD viscometer (part number: DV-II). The viscosity of the obtained resin composition was measured under the conditions of a temperature of 60 ° C. and a rotation speed of 10 rpm using 34 spindle.
  • the moisture permeability is small, the change rate of the capacitance after the moisture resistance test is small, and the appearance is further reduced by using the specific epoxy resin composition. It turned out that a favorable molded object is obtained.

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Abstract

Provided are: a resin composition that has a good external appearance without the occurrence of voids, that exhibits low moisture permeability as a cured product, that exhibits a low rate of change of capacitance, and that is suitable for manufacturing an electronic component that has superior reliability; and an electronic component employing said resin composition. A film capacitor 11 includes: a sealing resin composition that contains, as essential components, (A) a liquid epoxy resin, (B) a curing agent, (C) a curing accelerator, (D) a porous filler, and (E) an inorganic filler other than the porous filler (D); a film capacitor element 3; and a cured product 12 of the sealing resin composition which seals the film capacitor element 3.

Description

封止用樹脂組成物、電子部品及び電子部品の製造方法Resin composition for sealing, electronic component and method for manufacturing electronic component

 本発明は封止用樹脂組成物、電子部品及び電子部品の製造方法に係り、特に、低透湿性等に優れたフィルムコンデンサの製造に適した封止用樹脂組成物、フィルムコンデンサ及びその製造方法に関する。 The present invention relates to a resin composition for sealing, an electronic component and a method for manufacturing the electronic component, and in particular, a resin composition for sealing suitable for manufacturing a film capacitor excellent in low moisture permeability etc., a film capacitor and a method for manufacturing the same About.

 従来のフィルムコンデンサの製造方法は、箔タイプ、メタライズタイプ共に、まずフィルムを巻き取ってフィルムコンデンサ素子を形成した後、このフィルムコンデンサ素子に対して熱プレスを行いフィルム間の間隔を狭めて容量の増加を図る。さらに、真空引きにてフィルムコンデンサ素子内部の空気を、樹脂ディップしたエポキシ樹脂と置換しながらフィルム間に樹脂を含浸させる方法が一般的であった(例えば、特許文献1参照)。 In the conventional film capacitor manufacturing method, for both the foil type and the metallized type, first, the film is wound up to form a film capacitor element, and then the film capacitor element is subjected to heat pressing to narrow the distance between the films to reduce capacitance. To increase Furthermore, a method of impregnating a resin between films while replacing air inside the film capacitor element with a resin-dip epoxy resin by vacuum drawing was general (see, for example, Patent Document 1).

 また、フィルムコンデンサ素子を収納可能なキャビティ凹部を有する射出成形金型内に、フィルムコンデンサ素子を収納し、射出成形金型を型締めして該キャビティ内にポリフェニレンスルフィド樹脂を射出することで、キャビティ内に収納されたフィルムコンデンサ素子を樹脂封止してフィルムコンデンサ素子の外被を形成すると共に、フィルムコンデンサ素子の巻回されたフィルム間に樹脂を含浸する方法も提案されている(例えば、特許文献2参照)。 In addition, the film capacitor element is housed in an injection mold having a cavity recess capable of housing a film capacitor element, and the injection molding die is clamped to inject a polyphenylene sulfide resin into the cavity. There is also proposed a method of resin-sealing a film capacitor element housed inside to form an outer cover of the film capacitor element, and impregnating a resin between wound films of the film capacitor element (for example, a patent) Reference 2).

 また、硬化物の透湿性が低く、プレモールド型中空パッケージ用材料として好適なエポキシ樹脂を用い、硬化物の水分拡散係数が所定の範囲の組成物に無機系吸水材を添加したエポキシ樹脂組成物が知られている(例えば、特許文献3参照)。 In addition, an epoxy resin composition in which an inorganic water-absorbing material is added to a composition having a predetermined range of a moisture diffusion coefficient of a cured product using an epoxy resin which has low moisture permeability of the cured product and is suitable as a pre-mold type hollow package material. Are known (see, for example, Patent Document 3).

 また、吸湿対策として、固体電解コンデンサなどの電子部品において導電層の一部に吸湿層を形成すること(例えば、特許文献4参照)、固形のエポキシ樹脂中にシリカゲルなどを含有させること(例えば、特許文献5参照)、などが提案されている。 Further, as a measure against moisture absorption, a hygroscopic layer is formed on part of the conductive layer in an electronic component such as a solid electrolytic capacitor (see, for example, Patent Document 4), and silica gel or the like is contained in solid epoxy resin (for example, Patent Document 5), etc. have been proposed.

特公平5-77324号公報Japanese Examined Patent Publication 5-77324 特開平7-161578号公報Japanese Patent Application Laid-Open No. 7-161578 特開平7-216196号公報Japanese Patent Laid-Open No. 7-216196 特開2017-59652号公報JP, 2017-59652, A 特開平9-286845号公報Unexamined-Japanese-Patent No. 9-286845 gazette

 しかしながら、特許文献1の方法では、容量を増加させるために熱プレスを行っているが、この処理によりフィルムコンデンサ素子を形成するフィルムに熱ストレスや加圧ストレスが加わりフィルムが劣化して、静電容量の安定性や耐衝撃性の低下を招くという問題がある。 However, in the method of Patent Document 1, although heat pressing is performed to increase the capacity, thermal stress and pressure stress are applied to the film forming the film capacitor element by this process, and the film is degraded to cause electrostatic There is a problem that the stability of the capacity and the impact resistance decrease.

 特許文献2の方法では、PPS(ポリフェニレンスルフィド)の射出成形時の圧力が100~250kg重/cmと高圧で、かつ、300℃と高温な条件が必要であるため、フィルムコンデンサ素子の破損を防止するために、本封止の前に予備封止等の工程を必要とする。 In the method of Patent Document 2, since the pressure at the time of injection molding of PPS (polyphenylene sulfide) is a high pressure of 100 to 250 kgf / cm 2 and a high temperature condition of 300 ° C. is required, damage to the film capacitor element is required. In order to prevent this, a process such as pre-sealing is required before the main sealing.

 特許文献3では透湿性を向上させたエポキシ樹脂が提案されているが、このエポキシ樹脂はフィルムコンデンサへの適用については記載されておらず、また、成形条件が150~180℃と高温であるため、適用した場合にはフィルムコンデンサ素子が劣化してしまうため、これをそのまま転用することはできない。 Although the epoxy resin which improved moisture permeability is proposed by patent document 3, this epoxy resin is not described about the application to a film capacitor, Moreover, since molding conditions are high temperature, 150-180 degreeC, When the film capacitor element is applied, the film capacitor element is deteriorated, so that it can not be diverted as it is.

 特許文献4では外層に吸湿層が形成されているが、それだけであり、フィルムコンデンサへの適用や樹脂組成物の具体的構成について全く記載されておらず、十分な防湿硬化は得られない。 In patent document 4, although a moisture absorption layer is formed in an outer layer, it is only and it is not described at all about the application to a film capacitor and the concrete composition of a resin composition, and sufficient moisture-proof hardening is not obtained.

 特許文献5では樹脂粘度が高く封止できる電子部品の種類は限られたものに適用できるにすぎず、フィルムコンデンサ素子などへの適用は困難である。 In Patent Document 5, the type of the electronic component that can be sealed with a high resin viscosity is only applicable to a limited type, and application to a film capacitor element or the like is difficult.

 本発明は、このような事情に鑑みてなされたもので、ボイドの発生がなく外観が良好で、硬化物の透湿性が低く、静電容量の変化率の少ない、信頼性に優れたフィルムコンデンサの製造に好適な樹脂組成物、該樹脂組成物を用いたフィルムコンデンサを提供することを目的とする。 The present invention has been made in view of such circumstances, and is a film capacitor excellent in reliability with no occurrence of voids, a good appearance, a low moisture permeability of a cured product, and a low rate of change in capacitance. It is an object of the present invention to provide a resin composition suitable for the production of the present invention, and a film capacitor using the resin composition.

 本発明者らは、フィルムコンデンサについて研究を重ねた結果、特定の樹脂組成物を用いることにより、上記課題を解決できることを見出し、本発明を完成した。 As a result of repeated researches on film capacitors, the present inventors have found that the above problems can be solved by using a specific resin composition, and completed the present invention.

 すなわち、本発明の封止用樹脂組成物は、(A)液状エポキシ樹脂と、(B)硬化剤と、(C)硬化促進剤と、(D)多孔質フィラーと、(E)前記(D)多孔質フィラー以外の無機フィラーと、を必須成分として含有することを特徴とするものである。 That is, the sealing resin composition of the present invention comprises (A) a liquid epoxy resin, (B) a curing agent, (C) a curing accelerator, (D) a porous filler, and (E) the above (D) ) An inorganic filler other than a porous filler is contained as an essential component.

 また、本発明の電子部品は、電子素子が、本発明の上記封止用樹脂組成物の硬化物で封止されていることを特徴とする。 The electronic component of the present invention is characterized in that the electronic element is sealed with the cured product of the sealing resin composition of the present invention.

 また、本発明の電子部品の製造方法は、金型内に電子素子を設置し、前記金型を閉じた後、前記金型内に、上記本発明の封止用樹脂組成物を注入し、圧力をかけながら硬化させて成形する、ことを特徴とする。 Further, in the method of manufacturing an electronic component of the present invention, after the electronic element is placed in a mold and the mold is closed, the sealing resin composition of the present invention is injected into the mold; It is characterized in that it is cured and molded while applying pressure.

 本発明の封止用樹脂組成物によれば、成形性に優れ、その硬化物が低透湿性で、静電容量の変化率が少ないため、電子素子の封止に好適な材料を提供できる。 According to the sealing resin composition of the present invention, a material suitable for sealing an electronic element can be provided because the moldability is excellent, the cured product has low moisture permeability, and the change rate of capacitance is small.

 本発明の電子部品及び電子部品の製造方法によれば、電子素子が上記封止用樹脂組成物で封止されているため、低透湿性で、静電容量の変化率が少ない、信頼性に優れた電子部品を提供できる。これにより、電子部品のコンデンサ特性を向上させることもできる。 According to the electronic component and the method of manufacturing the electronic component of the present invention, since the electronic element is sealed with the sealing resin composition, it has low moisture permeability, a small change rate of capacitance, and reliability. Can provide excellent electronic components. Thereby, the capacitor characteristic of the electronic component can also be improved.

本実施形態のフィルムコンデンサの製造方法を説明する図である。It is a figure explaining the manufacturing method of the film capacitor of this embodiment. 本実施形態のフィルムコンデンサの製造方法を説明する図である。It is a figure explaining the manufacturing method of the film capacitor of this embodiment. 本実施形態のフィルムコンデンサの断面図である。It is a sectional view of a film capacitor of this embodiment.

 以下、本発明の実施形態について、図面を参照しながら詳細に説明する。なお、本発明はこれら実施形態により何ら限定されるものではない。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The present invention is not limited at all by these embodiments.

[封止用樹脂組成物]
 まず、本実施形態の封止用樹脂組成物について説明する。本実施形態の封止用樹脂組成物は、上記のように、(A)液状エポキシ樹脂と、(B)硬化剤と、(C)硬化促進剤と、(D)多孔質フィラーと、(E)前記(D)多孔質フィラー以外の無機フィラーと、を必須成分として含有しており、これら各成分について以下説明する。
[Resin composition for sealing]
First, the sealing resin composition of the present embodiment will be described. As described above, the sealing resin composition of the present embodiment includes (A) liquid epoxy resin, (B) curing agent, (C) curing accelerator, and (D) porous filler (E). The inorganic filler other than the (D) porous filler is contained as an essential component, and each of these components will be described below.

 本実施形態で用いる(A)液状エポキシ樹脂は、1分子あたり1つより多くのエポキシ基を有する常温で液状のものであり、1分子あたり2個以上のエポキシ基を有するものであることが好ましい。このようなエポキシ樹脂としては、例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールAD型エポキシ樹脂、ノボラック型エポキシ樹脂、グリシジルエステル型エポキシ樹脂、脂環式エポキシ樹脂、グリシジルエーテル等が挙げられる。これらは単独で又は2種以上を混合して用いることができる。 The liquid epoxy resin (A) used in the present embodiment is a liquid epoxy resin having one or more epoxy groups per molecule at room temperature, and preferably two or more epoxy groups per molecule. . Examples of such an epoxy resin include bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol AD epoxy resin, novolac epoxy resin, glycidyl ester epoxy resin, alicyclic epoxy resin, glycidyl ether and the like. Be These can be used alone or in combination of two or more.

 本実施形態で用いる(B)硬化剤としては、上記(A)液状エポキシ樹脂の硬化剤であり、従来エポキシ樹脂の硬化剤として使用されているものであれば、特に制限されることなく使用することができる。この(B)硬化剤としては、例えば、酸無水物硬化剤、アミン硬化剤、フェノール樹脂硬化剤等が挙げられる。これらは1種を単独で、または2種以上を混合して使用することができる。 As the curing agent (B) used in the present embodiment, any curing agent for the liquid epoxy resin (A) may be used without particular limitation as long as it is conventionally used as a curing agent for epoxy resin. be able to. Examples of the (B) curing agent include an acid anhydride curing agent, an amine curing agent, a phenol resin curing agent and the like. These can be used singly or in combination of two or more.

 このうち、酸無水物硬化剤の具体例としては、テトラヒドロフタル酸無水物、メチルテトラヒドロ無水フタル酸、ヘキサヒドロフタル酸無水物、メチルヘキサヒドロフタル酸無水物等が挙げられ、アミン硬化剤の具体例としては、イソホロンジアミン、1,3-ビス(アミノメチル)シクロヘキサン、ビス(4-アミノシクロヘキシル)メタン、ノルボルネンジアミン、1,2-ジアミノシクロヘキサン、ラロミン等がある。市販品としては、HN2000、HN5500(日立化成製)、アンカミン1618、アンカミン2074、アンカミン2228(エアープロダクツジャパン社製)、ダイトクラールF-5194、ダイトクラールB-1616(大都産業社製)、フジキュアFXD-821、フジキュア4233(富士化成工業社製)、JERキュア113(三菱化学社製)、ラミロンC-260(BASF社製)などが挙げられる。これらは1種を単独で、または2種以上を混合して使用することができる。 Among them, specific examples of the acid anhydride curing agent include tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyl hexahydrophthalic anhydride, etc. Specific examples of the amine curing agent Examples include isophorone diamine, 1,3-bis (aminomethyl) cyclohexane, bis (4-aminocyclohexyl) methane, norbornene diamine, 1,2-diaminocyclohexane, laromine and the like. Commercially available products include HN2000, HN5500 (manufactured by Hitachi Chemical), ancamine 1618, ancamine 2074, ancamine 2228 (manufactured by Air Products Japan), Daitoclar F-5194, Daitoclar B-1616 (made by Daito Sangyo), Fujicure FXD -821, Fujicure 4233 (manufactured by Fuji Kasei Kogyo Co., Ltd.), JER cure 113 (manufactured by Mitsubishi Chemical Corporation), Lamillon C-260 (manufactured by BASF Corporation), and the like. These can be used singly or in combination of two or more.

 (B)硬化剤の配合量は、上記(A)液状エポキシ樹脂のエポキシ基1当量当たり、(B)硬化物の硬化性官能基が0.7~1.3当量となる範囲が好ましく、0.9~1.1当量となる範囲がより好ましい。上記範囲を外れると、硬化物の耐熱性、機械的特性、耐湿性などの特性が低下するおそれがある。 The amount of the curing agent (B) is preferably in the range of 0.7 to 1.3 equivalents of the curable functional group of the cured product (B) per equivalent of the epoxy group of the liquid epoxy resin (A). The range of 9 to 1.1 equivalents is more preferable. If the above range is exceeded, properties such as heat resistance, mechanical properties and moisture resistance of the cured product may be reduced.

 本実施形態で用いる(C)硬化促進剤は、エポキシ樹脂硬化系で用いられる公知の硬化促進剤である。この(C)硬化促進剤としては、例えば、芳香族ジメチルウレア、脂肪族ジメチルウレア、3-(3,4-ジクロロフェニル)-1,1-ジメチルウレア(DCMU)、3-(3-クロロ-4-メチルフェニル)-1,1-ジメチルウレア、2,4-ビス(3,3-ジメチルウレイド)トルエン等のウレア類、ベンジルジメチルアミン、1,8-ジアザビシクロ(5.4.0)ウンデセン-7、トリエチルアミン等の第3級アミン系化合物、2-エチル-4-メチルイミダゾール、1-ベンジル-2-メチルイミダゾール、2-メチルイミダゾール、2-エチルイミダゾール、2-イソプロピルイミダゾール、2-フェニルイミダゾール、2-フェニル-4-メチルイミダゾールなどのイミダゾール化合物、トリフェニルホスフィン塩等の有機ホスフィン塩化合物、が挙げられる。これらの硬化促進剤は、単独で用いてもよく、2種以上を組み合わせて用いてもよい。このうち、低透湿性、耐湿信頼性の点からイミダゾール系硬化促進剤を好ましく使用できる。 The curing accelerator (C) used in the present embodiment is a known curing accelerator used in an epoxy resin curing system. Examples of the curing accelerator (C) include aromatic dimethylurea, aliphatic dimethylurea, 3- (3,4-dichlorophenyl) -1,1-dimethylurea (DCMU), and 3- (3-chloro-4). -Methylphenyl) -1,1-dimethylurea, urea such as 2,4-bis (3,3-dimethylureido) toluene, benzyldimethylamine, 1,8-diazabicyclo (5.4.0) undecen-7 , Tertiary amine compounds such as triethylamine, 2-ethyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 2-methylimidazole, 2-ethylimidazole, 2-isopropylimidazole, 2-phenylimidazole, 2 Imidazole compounds such as -phenyl-4-methylimidazole, triphenylphosphine salts etc. Phosphine salt compounds, and the like. These curing accelerators may be used alone or in combination of two or more. Among these, an imidazole-based curing accelerator can be preferably used from the viewpoint of low moisture permeability and humidity resistance.

 この(C)硬化促進剤の配合量は、硬化促進性及び硬化樹脂物性のバランスなどの点から、(A)液状エポキシ樹脂と(B)硬化剤の合量を100質量部としたときに、通常0.1~10質量部程度、好ましくは0.4~5質量部の範囲である。 The compounding amount of the (C) curing accelerator is 100 parts by mass of the total amount of the (A) liquid epoxy resin and the (B) curing agent from the viewpoint of the balance between the curing accelerating property and the physical properties of the cured resin, etc. It is usually in the range of about 0.1 to 10 parts by mass, preferably 0.4 to 5 parts by mass.

 本実施形態で用いる(D)多孔質フィラーは、微細な空孔を多数有する充填材として用いることのできる物質であり、比表面積が50~20000m/g、平均細孔径が0.1nm~1000nmの特性を有する。この(D)多孔質フィラーとしては、例えば、シリカゲル、セルロース、ゼオライト、モレキュラーシーブ、珪藻土、パーライトなど、上記特性を有する多孔質フィラーであれば、特に制限なく使用でき、シリカゲルが好ましい。 The (D) porous filler used in the present embodiment is a substance that can be used as a filler having a large number of fine pores, and has a specific surface area of 50 to 20000 m 2 / g and an average pore size of 0.1 nm to 1000 nm. Have the following characteristics: As the (D) porous filler, for example, silica gel, cellulose, zeolite, molecular sieve, diatomaceous earth, perlite, etc. can be used without particular limitation as long as it is a porous filler having the above characteristics, and silica gel is preferable.

 (D)多孔質フィラーは、比表面積が100~10000m/g、平均細孔径が1~50nmのものが好ましく、比表面積が400~1000m/g、平均細孔径が1~20nmのものがより好ましい。 The (D) porous filler preferably has a specific surface area of 100 to 10000 m 2 / g and an average pore diameter of 1 to 50 nm, and a specific surface area of 400 to 1000 m 2 / g and an average pore diameter of 1 to 20 nm More preferable.

 (D)多孔質フィラーの比表面積が100m/g未満の場合、吸着効率が低くなり、10000m/g超の場合、射出時の流動性が低下し、未充填部分が発生するおそれがある。また、(D)多孔質フィラーの平均細孔径が1nm未満の場合、吸着効率が低くなり、50nm超の場合、良好な機械特性が得られないおそれがある。 (D) If the specific surface area of the porous filler is less than 100 m 2 / g, the adsorption efficiency will be low, and if it is more than 10000 m 2 / g, the flowability at the time of injection may be reduced and unfilled parts may be generated. . In addition, when the average pore diameter of the (D) porous filler is less than 1 nm, the adsorption efficiency is low, and when it is more than 50 nm, good mechanical properties may not be obtained.

 なお、比表面積は、ガス吸着法にて吸着量を測定し、BET法にて算出した。 The specific surface area was calculated by the BET method by measuring the amount of adsorption by the gas adsorption method.

 また、平均細孔径も、ガス吸着法にて吸着量を測定し、BET法から算出した比表面積及び全細孔容積を用いて算出した In addition, the average pore diameter was also measured using the specific surface area and total pore volume calculated from the BET method by measuring the adsorption amount by the gas adsorption method.

 (D)多孔質フィラーの平均粒径は0.5~100μmが好ましく、1~50μmがより好ましい。本明細書で平均粒径は、レーザ散乱方式粒度分布計(例えば、LA-920(堀場製作所製、商品名)等)を用いて体積基準の粒度分布を測定し、得られた粒度分布曲線における50%積算値(50%粒子径)を指す。 The average particle diameter of the (D) porous filler is preferably 0.5 to 100 μm, and more preferably 1 to 50 μm. In the present specification, the average particle diameter is obtained by measuring a particle size distribution based on volume using a laser scattering particle size distribution analyzer (for example, LA-920 (trade name, manufactured by Horiba, Ltd.) etc.) Indicates the 50% integrated value (50% particle size).

 (D)多孔質フィラーは、樹脂組成物全量に対して1~10質量%、好ましくは2~5質量%の範囲で含有することが好ましい。多孔質フィラー量が、1質量%未満であると耐透湿性が不十分になるおそれがある。一方、10質量%超であると樹脂組成物粘度が上昇して射出時の流動性が低下し、未充填箇所が発生するおそれがある。 The porous filler (D) is preferably contained in an amount of 1 to 10% by mass, preferably 2 to 5% by mass, based on the total amount of the resin composition. If the amount of the porous filler is less than 1% by mass, the moisture permeation resistance may be insufficient. On the other hand, when it is more than 10% by mass, the viscosity of the resin composition is increased, the fluidity at the time of injection is decreased, and there is a possibility that an unfilled portion may be generated.

 本実施形態に用いる(E)上記(D)多孔質フィラー以外の無機フィラーは、樹脂組成物中に配合される公知の無機フィラーであって、上記(D)多孔質フィラー以外のものであれば特に限定されるものではない。この(E)無機フィラーとしては、例えば、シリカ、アルミナ、窒化珪素、窒化硼素、マグネシア、ベーマイト、炭酸カルシウム、水酸化アルミニウム、タルク等が挙げられる。この(E)無機フィラーは、シリカ粉末が好ましく使用され、特に、球状シリカ粉末の使用が好ましい。この(E)無機フィラーは、1種を単独で使用してもよく、2種以上を混合して使用してもよい。 The inorganic filler other than the (E) porous filler used in the present embodiment is a known inorganic filler to be blended in the resin composition, and it is other than the above (D) porous filler It is not particularly limited. Examples of the (E) inorganic filler include silica, alumina, silicon nitride, boron nitride, magnesia, boehmite, calcium carbonate, aluminum hydroxide, talc and the like. As the (E) inorganic filler, silica powder is preferably used, and in particular, use of spherical silica powder is preferable. The (E) inorganic filler may be used alone or in combination of two or more.

 この(E)無機フィラーの配合量は、樹脂組成物全量に対して50~85質量%、好ましくは70~85質量%の範囲で含有することが好ましい。この(E)無機フィラーの配合量が50質量%未満であると硬化物収縮による電子素子や電極などの構造体の歪み、破損が発生しやすくなり耐透湿性が不十分になるおそれがある。一方、この配合量が85質量%超であると射出時の流動性が低下し、未充填箇所が発生したりするため好ましくない。上記範囲内であると硬化物の耐熱衝撃性、機械的強度、難燃性が良好となる。 The compounding amount of the (E) inorganic filler is preferably 50 to 85% by mass, preferably 70 to 85% by mass, based on the total amount of the resin composition. If the compounding amount of the (E) inorganic filler is less than 50% by mass, distortion or breakage of a structure such as an electronic element or an electrode due to shrinkage of a cured product may easily occur, and moisture permeation resistance may be insufficient. On the other hand, when the compounding amount is more than 85% by mass, the flowability at the time of injection is lowered, and unfilled portions are generated, which is not preferable. The thermal shock resistance of hardened | cured material, mechanical strength, and a flame retardance become favorable for it to be in the said range.

 ここで用いる(E)無機フィラーの平均粒径は0.5~100μmが好ましく、10~30μmがより好ましい。 The average particle diameter of the (E) inorganic filler used here is preferably 0.5 to 100 μm, more preferably 10 to 30 μm.

 また、本実施形態における(E)無機フィラーとしては、材質が同一のフィラーであって、その平均粒径が異なるものを2種以上併用すると、射出時の流動性が良好となり好ましい。例えば、(E)無機フィラー全体を100質量%としたとき、平均粒径が15μm超25μm以下の球状溶融シリカを70~90質量%、平均粒径1μm以上5μm以下の球状溶融シリカを10~30質量%の範囲で含有することがより好ましい。球状溶融シリカを用いた場合、上記した球状溶融シリカのみで(E)無機フィラーを構成することが特に好ましい。 Moreover, as the (E) inorganic filler in the present embodiment, it is preferable to use two or more types of fillers having the same material but different average particle sizes, because the flowability at the time of injection becomes good. For example, based on 100% by mass of the whole (E) inorganic filler, 70 to 90% by mass of spherical fused silica having an average particle size of more than 15 μm and 25 μm or less and 10 to 30 spherical fused silica having an average particle size of 1 to 5 μm It is more preferable to contain in the range of mass%. When spherical fused silica is used, it is particularly preferable to constitute the (E) inorganic filler only with the above-mentioned spherical fused silica.

 なお、上記した平均粒径の異なる球状溶融シリカを併用する際に、それ以外に他の無機フィラーを含有することもできるが、その場合、残りのフィラーを溶融破砕シリカ、結晶シリカからなるシリカ粉末とすることが、硬化物の低吸水率性、低透湿性の点から好ましい。この範囲外で配合した場合、射出時の流動性が低下し、未充填箇所が発生したりするため好ましくない。 In addition, when using together the spherical fused silica from which the above-mentioned average particle diameter differs, although it can also contain other inorganic fillers besides that, in that case, silica powder which consists of fusion crushing silica and crystalline silica for the remaining filler It is preferable from the viewpoint of low water absorption and low moisture permeability of the cured product. When it mix | blends out of this range, since the fluidity | liquidity at the time of injection | emission will fall and an unfilled part may generate | occur | produce, it is unpreferable.

 また、(D)成分と(E)成分の合量が樹脂組成物全体の51~95質量%の範囲、好ましくは77~90質量%の範囲、であることが好ましい。51質量%未満の場合、硬化物の低吸水率性、低透湿性が不十分となり、95質量%超の場合、射出時の流動性が低下し、未充填箇所が発生する恐れがある。 Further, the total amount of the component (D) and the component (E) is preferably in the range of 51 to 95% by mass, preferably in the range of 77 to 90% by mass, based on the total weight of the resin composition. If the amount is less than 51% by mass, the low water absorption and low moisture permeability of the cured product may be insufficient. If the amount is more than 95% by mass, the flowability at the time of injection may be reduced and unfilled portions may be generated.

 なお、本実施形態の樹脂組成物には、本発明の効果を阻害しない範囲で、カップリング剤(例えば、3-グリシドキシプロピルトリメトキシシラン、3-グリシドキシプロピルメチルジエトキシシラン等)、離型剤(例えば、合成ワックス、天然ワックス、直鎖脂肪族の金属塩、酸アミド、エステル類等)、着色剤(例えば、カーボンブラック、コバルトブルー等)、低応力付与剤(例えば、シリコーンオイル、シリコーンゴム等)、消泡剤等がさらに配合されていてもよい。 In the resin composition of the present embodiment, a coupling agent (for example, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, etc.) to the extent that the effects of the present invention are not inhibited. , Mold release agents (eg, synthetic waxes, natural waxes, linear aliphatic metal salts, acid amides, esters, etc.), colorants (eg, carbon black, cobalt blue, etc.), low stressing agents (eg, silicones) Oil, silicone rubber, etc.), an antifoamer, etc. may be further blended.

 本実施形態の封止用樹脂組成物は、上記した(A)~(E)成分と必要に応じて配合する各成分を、十分混合した後、さらに、3本ロール混練機などのロール混練やミキサー混錬などにより混練処理を行い、その後減圧脱泡する従来公知の方法により容易に製造することができる。 In the resin composition for sealing of the present embodiment, after thoroughly mixing the components (A) to (E) described above and the components to be blended according to need, roll kneading such as a three-roll kneader or the like, or It can be easily manufactured by a conventionally known method in which the kneading treatment is carried out by mixer kneading and the like and then the pressure is removed under reduced pressure.

 このとき、本実施形態の樹脂組成物は、60℃での粘度が100Pa・s未満となるようにすることが好ましい。このような粘度とすることで、特に、液状エポキシ樹脂を用いた射出成型法における封止、成型を良好に行うことができる。一方、粘度が100Pa・s以上であると成形操作における射出時の流動性が低下し、未充填箇所が発生する恐れがある。 At this time, the resin composition of the present embodiment preferably has a viscosity at 60 ° C. of less than 100 Pa · s. By setting it as such a viscosity, especially in the injection molding method using a liquid epoxy resin, sealing and molding can be performed favorably. On the other hand, if the viscosity is 100 Pa · s or more, the flowability at the time of injection in the molding operation may be reduced, and there may be an unfilled portion.

 また、本実施形態の樹脂組成物は、100℃でのゲルタイムが5~30分であることが好ましい。このゲルタイムが、5分以下であると硬化物にボイドが発生しやすくなり、30分以上であると硬化物の形状の保持性が悪くなる。 Further, in the resin composition of the present embodiment, the gel time at 100 ° C. is preferably 5 to 30 minutes. When the gel time is 5 minutes or less, voids are easily generated in the cured product, and when the gel time is 30 minutes or more, the shape retention of the cured product is deteriorated.

 本実施形態により、安定した静電容量を示し、透湿性が低く、かつ、外観が良好なフィルムコンデンサなどの電子部品を提供することができ、このような電子部品は信頼性に優れたものである。 According to this embodiment, it is possible to provide an electronic component such as a film capacitor which exhibits stable capacitance, low moisture permeability and good appearance, and such an electronic component is excellent in reliability. is there.

[電子部品]
 本実施形態の電子部品は、電子素子を有し、該電子素子が上記本実施形態の封止用樹脂組成物の硬化物で封止されて構成される。
[Electronic parts]
The electronic component of the present embodiment has an electronic element, and the electronic element is sealed with the cured product of the sealing resin composition of the present embodiment.

 ここで用いる電子素子としては、フィルムコンデンサ素子、電解コンデンサ素子、セラミックコンデンサ素子等が挙げられる。電子素子としては、フィルムコンデンサ素子が好ましい。また、ここで用いる硬化物としては、上記説明した封止用樹脂組成物を硬化処理して、上記電子素子を封止したものである。 As an electronic element used here, a film capacitor element, an electrolytic capacitor element, a ceramic capacitor element, etc. are mentioned. A film capacitor element is preferable as the electronic element. Moreover, as a hardened | cured material used here, the hardening process of the resin composition for sealing demonstrated above is carried out, and the said electronic device is sealed.

 また、この電子部品を製造するにあたっては、金型内に電子素子を設置し、金型を閉じた後、金型内に、本実施形態の封止用樹脂組成物を注入し、金型内に注入された封止用樹脂組成物を、圧力をかけながら硬化させて成形する射出成型法を用いればよい。用いる封止用樹脂組成物以外は、従来公知の方法により製造することができる。 Moreover, in manufacturing this electronic component, after installing an electronic element in a metal mold | die and closing a metal mold | die, the resin composition for sealing of this embodiment is inject | poured in a metal mold | die, An injection molding method may be used in which the resin composition for sealing injected into the above is molded while being cured under pressure. Except the sealing resin composition to be used, it can manufacture by a conventionally well-known method.

 以下、電子素子としてフィルムコンデンサ素子を用いる場合を例に、フィルムコンデンサを製造する場合を説明する。 Hereinafter, the case of manufacturing a film capacitor will be described with an example of using a film capacitor element as an electronic element.

 図1A及び図1Bは、本実施形態のフィルムコンデンサの製造方法を説明する図である。ここで、フィルムコンデンサの製造に用いる金型は下金型1と上金型2とから構成され、この金型には下金型1及び上金型2にそれぞれ凹部が形成されており、この凹部がキャビティとなっている。このキャビティに溶融した樹脂組成物を用いて射出成型を行い、フィルムコンデンサを製造する。 1A and 1B are diagrams for explaining a method of manufacturing a film capacitor of the present embodiment. Here, a mold used for manufacturing a film capacitor is composed of a lower mold 1 and an upper mold 2, and in this mold, a recess is formed in each of the lower mold 1 and the upper mold 2. The recess is a cavity. The resin composition melted in this cavity is used for injection molding to produce a film capacitor.

 まず、図1Aに示したように、所定形状の凹部を有し温度制御がなされた下金型1の凹部内にフィルムコンデンサ素子3を配置し、その上に液状エポキシ樹脂組成物4の射出ノズル5を有する上金型2を被せ、下金型1との接合部を気密にシールするとともに、下金型1と上金型2とで形成されるキャビティ内を真空ポンプ等(図示を省略)により減圧吸引し、10Torrまで達せしめる。ここで、射出ノズル5は、先端部5cが上金型2に設けられた樹脂をキャビティへ導入するためのスプルーに接続されており、ノズル全体が上下に昇降可能に構成されている。また、ノズル本管5a内に同心的に配設されたプランジャ5bを上昇および下降させることで、ノズル先端部5cを開放および閉塞することができるようになっている。 First, as shown in FIG. 1A, the film capacitor element 3 is disposed in the recess of the lower mold 1 having a recess of a predetermined shape and temperature controlled, and the injection nozzle of the liquid epoxy resin composition 4 thereon While covering the upper mold 2 having 5 and sealing the joint with the lower mold 1 in an airtight manner, the inside of the cavity formed by the lower mold 1 and the upper mold 2 is vacuum pump etc. (not shown) The pressure is reduced by vacuum to reach 10 Torr. Here, the injection nozzle 5 is connected to a sprue for introducing the resin provided in the upper mold 2 into the cavity at the tip end portion 5c, and the entire nozzle is configured to be vertically movable up and down. Further, the nozzle tip 5c can be opened and closed by raising and lowering a plunger 5b disposed concentrically in the nozzle main pipe 5a.

 そして、図1Bに示したように、キャビティ内が一定の減圧度に保たれたら、射出ノズル5の先端部5cを開き、液状のエポキシ樹脂組成物4を、下金型1と上金型2との間のキャビティ内に射出する。射出によりキャビティ内を液状のエポキシ樹脂組成物4で充填した後、下金型1及び上金型2を適当な温度に加熱して硬化させると共にフィルムコンデンサ素子3の電極端子3aは、上金型2と下金型1との間で隙間なく扶持される。 Then, as shown in FIG. 1B, when the inside of the cavity is maintained at a certain degree of pressure reduction, the tip 5c of the injection nozzle 5 is opened, and the liquid epoxy resin composition 4 is used as the lower mold 1 and the upper mold 2 Eject into the cavity between After filling the cavity with liquid epoxy resin composition 4 by injection, lower mold 1 and upper mold 2 are heated to a suitable temperature to be cured and electrode terminal 3a of film capacitor element 3 is the upper mold. Between the lower mold 1 and the lower mold 1 is held without gap.

 硬化が完了したら、下金型1と上金型2を型開きして、成形品であるフィルムコンデンサを取出す。ここで得られるフィルムコンデンサ11は、例えば、図2に示したように、フィルムコンデンサ素子3が液状のエポキシ樹脂組成物の硬化物12で覆われて保護された構成となっており、電極3aは、その端部が硬化物12の外に突出して、他の機器等と接続できるようになっている。 When the curing is completed, the lower mold 1 and the upper mold 2 are opened to take out a film capacitor which is a molded product. The film capacitor 11 obtained here has, for example, as shown in FIG. 2, a configuration in which the film capacitor element 3 is covered and protected with a cured product 12 of a liquid epoxy resin composition, and the electrode 3a is The end of the end projects out of the cured product 12 so that it can be connected to other devices.

 ここで、フィルムコンデンサ素子3は、フィルムと電極箔を巻回して形成されたコンデンサであり、金属製の電極3aをその上下面から平行に、コンデンサ本体に対して逆方向に伸びるように突出している。図示したフィルムコンデンサ素子3は、一例であり、本実施形態におけるフィルムコンデンサ素子3としては、公知のフィルムコンデンサ素子であれば、特に限定せずに用いることができる。 Here, the film capacitor element 3 is a capacitor formed by winding a film and an electrode foil, and the metal electrodes 3a are projected in parallel from the upper and lower surfaces thereof so as to extend in the reverse direction with respect to the capacitor body. There is. The illustrated film capacitor element 3 is an example, and as the film capacitor element 3 in the present embodiment, any known film capacitor element can be used without particular limitation.

 このように射出成型を用いた本実施形態の製造方法においては、フィルムコンデンサ3への液状エポキシ樹脂組成物4の供給と封止成形とを続けて効率的に行うことができ、未充填部やボイドがなく、かつ、外観が良好な封止成形体を得ることができる。このように熱硬化性樹脂を用いる場合、射出温度を低温に設定した後、高温の金型へ充填して硬化させることが好ましい。 As described above, in the manufacturing method of the present embodiment using injection molding, the supply of the liquid epoxy resin composition 4 to the film capacitor 3 and the sealing molding can be continued continuously and efficiently performed. A sealed molded article free of voids and having a good appearance can be obtained. Thus, when using a thermosetting resin, after setting injection temperature to low temperature, it is preferable to be filled with a high temperature metal mold and to harden it.

 射出充填の条件としては、射出温度は50~70℃が好ましい。50℃未満であると流動性が悪くなる。一方、70℃より大きいと、射出ノズル内で一部硬化反応が進行する点で好ましくない。充填速度は0.2~5.0L/minであることが好ましい。0.2L/min未満であると生産性の観点から好ましくない。一方、5.0L/minであると封止成形体に樹脂巻き込みボイドが発生する可能性があり好ましくない。 As a condition for injection filling, an injection temperature of 50 to 70 ° C. is preferable. If it is less than 50 ° C., the fluidity will be poor. On the other hand, if the temperature is higher than 70 ° C., it is not preferable because a curing reaction partially proceeds in the injection nozzle. The filling rate is preferably 0.2 to 5.0 L / min. It is unpreferable from the viewpoint of productivity as it is less than 0.2 L / min. On the other hand, if it is 5.0 L / min, there is a possibility that a resin winding void may occur in the sealing molded body, which is not preferable.

 加圧条件としては、その圧力(保圧)が0.2~10MPaであることが好ましい。0.2MPa未満であると、未充填部分やボイドが生じる。一方、10MPaより大きいと、フィルムコンデンサ素子の破損が生じる。 As the pressurizing condition, the pressure (holding pressure) is preferably 0.2 to 10 MPa. If it is less than 0.2 MPa, unfilled parts and voids occur. On the other hand, if the pressure is higher than 10 MPa, the film capacitor element is broken.

 なお、射出ノズル等は樹脂を維持する所望の温度まで樹脂を加温できるヒータ等の加温手段を装着していてもよい。 The injection nozzle or the like may be equipped with a heating means such as a heater capable of heating the resin to a desired temperature for maintaining the resin.

 樹脂組成物の加熱硬化は90~110℃で5~25分程度行うのが好ましい。この範囲内であると硬化反応が緩慢に進行し、フィルムコンデンサ素子の空隙に樹脂組成物が均一に含浸充填される。 The heat curing of the resin composition is preferably carried out at 90 to 110 ° C. for about 5 to 25 minutes. Within this range, the curing reaction proceeds slowly, and the voids of the film capacitor element are uniformly impregnated and filled with the resin composition.

 金型の温度としては90~120℃が好ましい。90℃未満では硬化不足が生じる。一方、120℃より大きいとフィルムコンデンサ素子が熱により破損してしまう。下金型1と上金型2は、ステンレス鋼等の耐熱性及び耐食性を有する金属からなるものが好ましい。 The temperature of the mold is preferably 90 to 120.degree. Below 90 ° C., insufficient curing occurs. On the other hand, if the temperature is higher than 120 ° C., the film capacitor element is damaged by heat. The lower mold 1 and the upper mold 2 are preferably made of a metal such as stainless steel having heat resistance and corrosion resistance.

 さらに成形型から取り出して必要に応じて後硬化させることが好ましく、この後硬化は、例えば、100℃、2時間の条件下で行われる。 Furthermore, it is preferable to take out from a shaping | molding die and to post-cure as needed, and this post-curing is performed on the conditions of 100 degreeC and 2 hours, for example.

 このようにして、未充填部やボイドがない外観が良好なコンデンサ装置を得ることができる。さらに、このようにして得られたコンデンサ装置は、透湿性、静電容量の変化等のいずれの諸特性においても優れ、信頼性の高い装置である。 In this way, it is possible to obtain a capacitor device having a good appearance without any unfilled portion or void. Furthermore, the capacitor device obtained in this manner is a device that is excellent in any of various characteristics such as moisture permeability, change in capacitance, and the like, and has high reliability.

 以下、実施例により本発明をより詳細に説明するが、本発明はこれらの実施例に限定されるものではない。 Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to these examples.

(実施例1~9)
 表1及び表2に示す配合組成(質量部)の各原料を均一に撹拌混合して液状のエポキシ樹脂組成物を調製した。
(Examples 1 to 9)
Each raw material of the compounding composition (mass part) shown in Table 1 and Table 2 was stirred and mixed uniformly, and the liquid epoxy resin composition was prepared.

 次いで、下金型の凹部の所定の位置に12個のフィルムコンデンサ素子(60mm×35mm、厚さ60mm)を収容、配置し、上金型を合わせ金型を閉じる。上記調製した液状のエポキシ樹脂組成物を射出ノズルのノズル本管内に導入し、下金型と上金型との間のキャビティ内を真空ポンプにて10Torrまで達せしめた。次いで、プランジャを上昇させ、キャビティ内に充填速度0.5L/min、射出温度60℃で樹脂組成物を射出充填した後、所定の圧力下、下金型及び上金型を加熱し、110℃で20分の条件により樹脂組成物を加熱硬化させると共にフィルムコンデンサ素子の電極端子は、上金型と下型部との間で隙間なく挟持した。その後、金型を開放して、金型から硬化物を取り出し、100℃、2時間の条件下で後硬化を行い、フィルムコンデンサ(200mm×250mm、厚さ70mm)を製造した(E-LIM(Epoxy-Liquid Injection Molding)法)。各例における諸特性の評価結果を表1及び表2に併せて示した。 Next, 12 film capacitor elements (60 mm × 35 mm, thickness 60 mm) are accommodated and arranged at predetermined positions of the lower mold recess, and the upper mold is put in place and the mold is closed. The liquid epoxy resin composition prepared above was introduced into the main nozzle of the injection nozzle, and the inside of the cavity between the lower mold and the upper mold was allowed to reach 10 Torr by a vacuum pump. Next, the plunger is raised, and the resin composition is injected and filled into the cavity at a filling speed of 0.5 L / min and an injection temperature of 60 ° C. Then, the lower mold and the upper mold are heated under a predetermined pressure, 110 ° C. The resin composition was heated and cured under the conditions of 20 minutes, and the electrode terminal of the film capacitor element was sandwiched between the upper mold and the lower mold without a gap. Thereafter, the mold was opened, the cured product was taken out of the mold, and post curing was performed under conditions of 100 ° C. for 2 hours to produce a film capacitor (200 mm × 250 mm, thickness 70 mm) (E-LIM ( Epoxy-Liquid Injection Molding) method. The evaluation results of the various characteristics in each example are shown together in Table 1 and Table 2.

(比較例1~3)
 表2に示す配合組成(質量部)の各原料を均一に撹拌混合して液状のエポキシ樹脂組成物を調製した。また、比較例1では実施例と同じE-LIM法、比較例2ではポッティング、比較例3ではトランスファ成形により、上記実施例と同等の構成、大きさのフィルムコンデンサを製造した。
(Comparative Examples 1 to 3)
Each raw material of the composition (mass part) shown in Table 2 was uniformly stirred and mixed to prepare a liquid epoxy resin composition. Further, a film capacitor having the same configuration and size as those of the above-described example was manufactured by the same E-LIM method as in the example, potting in the comparative example 2, and transfer molding in the comparative example 3.

 なお、使用した各原料成分は以下の通りである。
[(A)エポキシ樹脂]
 エポキシ樹脂1:R140P(三井化学社製のビスフェノールA型エポキシ樹脂、商品名)
 エポキシ樹脂2:BREM-105(日本化薬社製の臭素化エポキシ樹脂、商品名)
 エポキシ樹脂3:EPOXAN(信越化学社製のシリコーン変性エポキシ樹脂、商品名)
[(B)硬化剤]
 硬化剤1:HN2000(日立化成社製のメチルテトラヒドロ無水フタル酸、商品名)
 硬化剤2:NH-7000(日本化薬社製のフェノール樹脂、商品名)
 硬化剤3:XL225-3L(三井化学社製のフェノール樹脂、商品名)
[(C)硬化促進剤]
 2E4MZ(四国化成社製のイミダゾール、商品名)
In addition, each raw material component used is as follows.
[(A) Epoxy resin]
Epoxy resin 1: R140P (Bisphenol A type epoxy resin manufactured by Mitsui Chemicals, Inc., trade name)
Epoxy resin 2: BREM-105 (Broked epoxy resin manufactured by Nippon Kayaku Co., Ltd., trade name)
Epoxy resin 3: EPOXAN (Shin-Etsu Chemical silicone modified epoxy resin, trade name)
[(B) curing agent]
Hardening agent 1: HN 2000 (Mityl tetrahydrophthalic anhydride manufactured by Hitachi Chemical Co., Ltd., trade name)
Curing agent 2: NH-7000 (phenol resin manufactured by Nippon Kayaku Co., Ltd., trade name)
Curing agent 3: XL225-3L (Phenolic resin manufactured by Mitsui Chemicals, Inc., trade name)
[(C) curing accelerator]
2E4MZ (Imidazole manufactured by Shikoku Kasei Co., Ltd., trade name)

[添加剤]
 消泡剤:TSA720(モメンテイブ・パフォーマンス・マテリアルズ・ジャパン社製、商品名)
 シランカップリング剤:A-187(日本ユニカー社製の3-グリシドキシプロピルトリメトキシシラン、商品名)
 カーボンブラック:MA600(三菱ケミカル社製、商品名)
[Additive]
Antifoaming agent: TSA720 (manufactured by Momentive Performance Materials Japan, product name)
Silane coupling agent: A-187 (3-glycidoxypropyltrimethoxysilane manufactured by Nippon Unicar, trade name)
Carbon black: MA600 (Mitsubishi Chemical Corporation, trade name)

[(E)無機フィラー]
 無機フィラー1:HS-106(マイクロン社製の球状溶融シリカ、商品名;球状、平均粒径18.2μm)
 無機フィラー2:SO-C6(アドマファイン社製の球状溶融シリカ、商品名;球状、平均粒径 2.2μm)
[(E) Inorganic filler]
Inorganic filler 1: HS-106 (Spherical fused silica manufactured by Micron, trade name; spherical, average particle diameter 18.2 μm)
Inorganic filler 2: SO-C6 (Spherical fused silica manufactured by Adma Fine, trade name; spherical, average particle size 2.2 μm)

[(D)多孔質フィラー]
 多孔質フィラー1:ミズカシルP-73(水澤化学工業社製のシリカゲル、商品名;平均粒径 4μm、比表面積 330m/g、平均細孔径 14nm)
 多孔質フィラー2:ミズカシルP-50(水澤化学工業社製のシリカゲル、商品名;平均粒径 10μm、比表面積 330m/g、平均細孔径 13nm)
 多孔質フィラー3:サイシリア730(富士シリシア化学社製のシリカゲル、商品名;平均粒径 4μm、比表面積 700m/g、平均細孔径 2.5nm)
 多孔質フィラー4:サイシリア350(富士シリシア化学社製のシリカゲル、商品名;平均粒径 4μm、比表面積 300m/g、平均細孔径 21nm)
[(D) porous filler]
Porous filler 1: Mizukasil P-73 (silica gel manufactured by Mizusawa Chemical Industry, trade name; average particle diameter 4 μm, specific surface area 330 m 2 / g, average pore diameter 14 nm)
Porous filler 2: Mizukasil P-50 (silica gel manufactured by Mizusawa Chemical Industry, trade name; average particle diameter 10 μm, specific surface area 330 m 2 / g, average pore diameter 13 nm)
Porous filler 3: Sycilia 730 (silica gel manufactured by Fuji Silysia Chemical Ltd., trade name; average particle diameter 4 μm, specific surface area 700 m 2 / g, average pore diameter 2.5 nm)
Porous filler 4: Sycyria 350 (silica gel manufactured by Fuji Silysia Chemical Ltd., trade name; average particle diameter 4 μm, specific surface area 300 m 2 / g, average pore diameter 21 nm)

[特性試験]
(1)粘度
 JIS C 2105の粘度測定法に準拠して、BROOKFIELD粘度計(品番:DV-II)により、ローターNo.34spindleを用い、得られた樹脂組成物の粘度を、温度60℃、回転数10rpmの条件で測定した。
[Characteristics test]
(1) Viscosity In accordance with the viscosity measurement method of JIS C 2105, rotor No. 1 was measured by a BROOK FIELD viscometer (part number: DV-II). The viscosity of the obtained resin composition was measured under the conditions of a temperature of 60 ° C. and a rotation speed of 10 rpm using 34 spindle.

(2)透湿性
 得られた樹脂組成物を100℃、5時間の条件で硬化させて作製した円板形状の試料(直径60mm×厚さ2mm)について、カップ法(JIS L 1099)にて85℃/85%RHで300時間の環境下における質量変化量を算出し、その値に基づき、24時間の1m当たりの質量増加分を、硬化物の透湿性の評価特性として算出した。値が小さいほど、水分の透過を抑制することができ、1.5mg/cm・24hr以下であることで封止用として好適なものと評価できる。
(2) Moisture Permeability The disk-shaped sample (diameter 60 mm × thickness 2 mm) prepared by curing the obtained resin composition at 100 ° C. for 5 hours was subjected to the cup method (JIS L 1099) 85 ° C. / in 85% RH to calculate the mass change amount in the environment of 300 hours, based on the value, the weight increase of 1 m 2 per 24 hours was calculated as the evaluation properties of moisture permeability of the cured product. As the value is smaller, the permeation of water can be suppressed, and it can be evaluated that it is suitable for sealing because it is 1.5 mg / cm 2 · 24 hr or less.

(3)成形外観
 成型後のフィルムコンデンサを任意に切断し、切断面におけるボイドの有無を目視で確認した。
(3) Molded Appearance The molded film capacitor was arbitrarily cut, and the presence or absence of voids on the cut surface was visually confirmed.

(4)静電容量
 成型後のフィルムコンデンサにおいて、85℃/85%RH環境下で1000時間処理後のパッケージ(PKG)電極間の、処理前後の静電容量を測定した。さらに処理前後の静電容量から変化率を算出した。この変化率は、以下の基準で評価できる。
 良:変化率5%未満
 可:変化率5%以上10%未満
 不可:変化率10%以上
(4) Capacitance With the film capacitor after molding, the capacitance between the package (PKG) electrode after the treatment in an environment of 85 ° C./85% RH for 1000 hours was measured before and after the treatment. Furthermore, the rate of change was calculated from the capacitance before and after the treatment. The rate of change can be evaluated on the basis of the following criteria.
Good: Change rate less than 5% Allowed: Change rate 5% or more and less than 10% Not possible: Change rate 10% or more

Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001

Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002

 表1~2から明らかなように、本実施形態によれば、特定のエポキシ樹脂組成物を用いることで、透湿量が少なく、耐湿試験後の静電容量の変化率が小さく、さらに外観の良好な成形体が得られることがわかった。 As apparent from Tables 1 and 2, according to the present embodiment, the moisture permeability is small, the change rate of the capacitance after the moisture resistance test is small, and the appearance is further reduced by using the specific epoxy resin composition. It turned out that a favorable molded object is obtained.

1…下金型、2…上金型、3…フィルムコンデンサ素子、4…液状のエポキシ樹脂組成物、5…射出ノズル、11…フィルムコンデンサ、12…硬化物。 DESCRIPTION OF SYMBOLS 1 ... Lower mold, 2 ... Upper mold, 3 ... Film capacitor element, 4 ... Liquid epoxy resin composition, 5 ... Injection | pouring nozzle, 11 ... Film capacitor, 12 ... Cured | curing material.

Claims (8)

 (A)液状エポキシ樹脂と、
 (B)硬化剤と、
 (C)硬化促進剤と、
 (D)多孔質フィラーと、
 (E)前記(D)多孔質フィラー以外の無機フィラーと、
を必須成分として含有することを特徴とする封止用樹脂組成物。
(A) liquid epoxy resin,
(B) a curing agent,
(C) a curing accelerator,
(D) porous filler,
(E) an inorganic filler other than the (D) porous filler;
A sealing resin composition comprising as an essential component.
 前記(B)硬化剤が酸無水物、前記(D)多孔質フィラーがシリカゲルであって、
 前記(D)多孔質フィラーの含有量が、樹脂組成物全量に対して1~10質量%であることを特徴とする請求項1記載の封止用樹脂組成物。
The (B) curing agent is an acid anhydride, and the (D) porous filler is a silica gel,
The sealing resin composition according to claim 1, wherein the content of the (D) porous filler is 1 to 10% by mass with respect to the total amount of the resin composition.
 前記(D)多孔質フィラーの比表面積が100~1000m/g、平均細孔径が1~50nmであることを特徴とする請求項1又は2に記載の封止用樹脂組成物。 The sealing resin composition according to claim 1 or 2, wherein the specific surface area of the (D) porous filler is 100 to 1000 m 2 / g and the average pore diameter is 1 to 50 nm.  電子素子が、請求項1~3のいずれか1項に記載の封止用樹脂組成物の硬化物で封止されていることを特徴とする電子部品。 An electronic component characterized in that the electronic element is sealed with the cured product of the sealing resin composition according to any one of claims 1 to 3.  前記電子素子がフィルムコンデンサ素子であることを特徴とする請求項4に記載の電子部品。 The electronic device according to claim 4, wherein the electronic device is a film capacitor device.  金型内に電子素子を設置し、金型を閉じた後、
 前記金型内に、請求項1~3のいずれか1項に記載の封止用樹脂組成物を注入し、圧力をかけながら硬化させて成形する、
 ことを特徴とする電子部品の製造方法。
After installing the electronic element in the mold and closing the mold,
The sealing resin composition according to any one of claims 1 to 3 is injected into the mold, and is cured while being applied with pressure.
A method of manufacturing an electronic component characterized by
 前記電子素子がフィルムコンデンサ素子であることを特徴とする請求項6に記載の電子部品の製造方法。 The method of manufacturing an electronic component according to claim 6, wherein the electronic device is a film capacitor device.  前記圧力(保圧)が、0.2MPa以上10MPa以下であることを特徴とする請求項6又は7に記載の電子部品の製造方法。 The method according to claim 6 or 7, wherein the pressure (holding pressure) is 0.2 MPa or more and 10 MPa or less.
PCT/JP2018/016120 2017-06-28 2018-04-19 Sealing resin composition, electronic component, and electronic component manufacturing method Ceased WO2019003600A1 (en)

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