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WO2019066566A1 - Cadre d'électrode pour polissage électrolytique, cadre d'électrode variable pour polissage électrolytique et appareil de polissage électrolytique le comprenant - Google Patents

Cadre d'électrode pour polissage électrolytique, cadre d'électrode variable pour polissage électrolytique et appareil de polissage électrolytique le comprenant Download PDF

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Publication number
WO2019066566A1
WO2019066566A1 PCT/KR2018/011550 KR2018011550W WO2019066566A1 WO 2019066566 A1 WO2019066566 A1 WO 2019066566A1 KR 2018011550 W KR2018011550 W KR 2018011550W WO 2019066566 A1 WO2019066566 A1 WO 2019066566A1
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WO
WIPO (PCT)
Prior art keywords
support
cathode
electrolytic polishing
cathode plate
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2018/011550
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English (en)
Korean (ko)
Inventor
황재상
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Awesome Lead Inc
Original Assignee
Awesome Lead Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020170125738A external-priority patent/KR101848257B1/ko
Priority claimed from KR1020170125740A external-priority patent/KR101848266B1/ko
Application filed by Awesome Lead Inc filed Critical Awesome Lead Inc
Priority to CN201880063208.4A priority Critical patent/CN111465722B/zh
Publication of WO2019066566A1 publication Critical patent/WO2019066566A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

Definitions

  • An embodiment relates to an electrode frame for electrolytic polishing, a variable electrode frame for electrolytic polishing, and an electrolytic polishing apparatus including the same, and relates to an electrolytic polishing apparatus for improving polishing quality of an electrolytic polishing object.
  • electro polishing is performed by using a metal product dissolved in an electrolytic solution as an anode, using a metal insoluble in an electrolytic solution as a cathode, and applying a voltage between the anode and the cathode , Electrolysis is caused on the surface of a metal product which is an electrolytic polishing object, and the surface of the metal product is polished.
  • an electrolytic solution is filled in an electrolytic bath, a metal to be polished is set as an anode, a metal not dissolving in the electrolytic solution is installed as a cathode, and a direct current is applied to the anode and the cathode.
  • a high-viscosity liquid layer (viscous layer) containing a large amount of dissolved metal ions from the positive electrode surrounds the positive electrode.
  • the metal is no longer dissolved and forms a high positive potential, so that it is actively bonded with oxygen to form an oxide film.
  • the dissolved metal ions accumulate mainly in the concave portion of the metal surface, and the metal does not dissolve because the metal ions do not migrate and diffuse in the concave portion and electricity does not flow well.
  • the metal ion layer is formed thinly at the convex portion of the metal surface, the current is concentrated and the metal surface is easily dissolved, so that the surface of the metal as a whole is smooth.
  • Electrolytic polishing is performed through an electrolytic polishing apparatus.
  • the negative electrode plate of the electrolytic polishing apparatus according to the prior art is formed in a plate shape, and each of the negative electrode plates is assembled in a predetermined form so as to be spaced apart from the polishing surface of the electrolytic polishing object.
  • the negative electrode plate assembled as described above should be installed in the electrolytic bath so as not to come into contact with the electrolytic polishing object. However, since the anode plate should be arranged at a certain distance close to the electrolytic polishing object, uniform polishing can be performed, thereby improving electrolytic polishing quality.
  • the negative electrode plate can not be firmly arranged so as to maintain a certain distance close to the electrolytic polishing object.
  • the inventor of the present application has proposed and disclosed a patent that the negative electrode plate is uniformly fixed to one side of an electrolytic polishing object by using a negative electrode holder in a tapped hole formed in an electrolytic polishing object (Korean Patent No. 10- 1183218).
  • the distance between the negative electrode plate and the electrolytic polishing object is very narrow because the distance between the negative electrode plate and the electrolytic polishing object must be set to be considerably small.
  • the corner portion of the electrolytic polishing object has a narrower space.
  • the cathode plate may be in a state where its surface is deteriorated in electrical conductivity due to oxidation or the like in the electrolytic polishing process, There is a problem that the electric conductivity is lowered and, as a result, the efficiency and quality of electrolytic polishing are lowered.
  • the pre-assembled anode plate is discarded after being used once, or completely separated and reassembled. As a result, there arises a problem that the time and cost for re-assembly of the negative electrode plate are increased.
  • the shape of the electrolytic polishing object is complicated, for example, when the upper and lower widths of the electrolytic polishing object are wide and the width of the intermediate region is relatively narrow, it is difficult to assemble or move the negative electrode plate. .
  • the conventional negative electrode plate is supported by a clamp, which is a separate supporting member.
  • a clamp which is a separate supporting member.
  • the distance between the negative electrode plate and the electrolytic polishing object is very close to each other, it is easy to install the clamp in a narrow space between the negative electrode plate and the electrolytic polishing object not. That is, since the clamp is formed of a conductive material, when the clamp is brought into contact with the electrolytic polishing object of the positive electrode, an electrical short circuit occurs with the negative electrode plate having the negative electrode.
  • An object of the present invention is to provide an electrolytic polishing apparatus for firmly fixing a plurality of negative electrode plates disposed at corner portions of an electrolytic polishing object.
  • the embodiment is intended to have excellent electric conductivity and excellent electrolytic polishing efficiency and polishing quality.
  • Another object of the present invention is to provide a variable electrode frame, an electrode frame fixing member for electrolytic polishing, and an electrolytic polishing apparatus including the same, which can effectively perform electrolytic polishing even when the shape of the electrolytic polishing object is complicated.
  • an electrode frame is an electrode frame used for an electrolytic bath in which an electrolytic polishing object and an electrolytic solution are contained, the electrolytic bath comprising: A cathode plate including a first cathode plate of a first direction, a second cathode plate in a second direction, and a third cathode plate in a third direction different from the first direction and the second direction; And an electrode coupling member disposed at a corner of the electrolytic polishing object and connecting the first to third cathode plates.
  • the electrode coupling member may include a first support coupled to the first cathode plate, a second support coupled to the second cathode plate, and a third support coupled to the third cathode plate.
  • one side of the cathode frame may include a spacing member for separating the cathode frame from the side surface or the bottom surface of the electrolytic polishing object.
  • the electrode frame according to the embodiment of the present invention may include a first cathode plate arranged in a first direction and composed of a plurality of supports; And a second cathode plate arranged in a second direction at an angle with the first direction and made of a plurality of supports.
  • the first cathode plate includes a first support and a second support, wherein the first support is moved in a direction away from or closer to the second support in a state where the first support is partially overlapped with the second support,
  • the overlapping area of the support and the second support may be variable or elongated.
  • a predetermined abrasive object includes a first region and a second region having different widths and the variable first cathode plate is variable so as to pass through the second region of the object to be polished,
  • the first negative electrode plate may have a variable shape that varies to correspond to an area of the first region of the object to be polished.
  • the electrolytic polishing apparatus may include the electrode frame.
  • the embodiment has the effect of shortening the assembling time of a plurality of cathode plates by providing the electrode bonding member at the corner portion of the electrolytic polishing object.
  • the electrode coupling member of the embodiment has the effect of more firmly fixing the negative electrode plates without a plurality of fixing members.
  • the embodiment has an effect that it is possible to easily attach the electrode joining member to the corner of the cramped electrolytic polishing object, thereby preventing the electrode joining member from being short-circuited with the electrolytic polishing object.
  • the electrode coupling member of the embodiment can be easily installed on the corner of the electrolytic polishing object having 90 degrees or more, and thus the corner portion of the electrolytic polishing object can be effectively electrolytically polished.
  • the electrode bonding member of the embodiment can effectively be installed even if the corner portion of the electrolytic polishing object does not have a vertex, thereby effectively carrying out electrolytic polishing of the corner portion of the electrolytic polishing object.
  • the embodiment has a technical effect that the anode plate is fixed firmly in advance in a state of excellent electric conductivity, and the cathode plate support is prepared, thereby providing excellent electric conductivity and excellent electrolytic polishing efficiency and polishing quality.
  • the embodiment has an effect that the clamp can be easily installed in a narrow space between the cathode frame and the electrolytic polishing object by further forming the insulating portion.
  • variable electrode frame of the embodiment is assembled to a size corresponding to the polishing surface of the electrolytic polishing object and disposed on the polishing surface of the electrolytic polishing object, thereby reducing the time and cost required for newly assembling or reassembling the negative electrode plate .
  • the embodiment can provide the variable electrode frame and the electrolytic polishing apparatus including the variable electrode frame, which can effectively perform electrolytic polishing even when the shape of the electrolytic polishing object is complicated.
  • variable electrode frame of the embodiment the first support member is slidably coupled to the second support member, thereby effectively controlling the size of the variable electrode frame.
  • the embodiment has the effect of effectively electrolytically polishing the polished surface of the electrolytic polishing object having different areas by disposing a plurality of electrically-connected variable electrode frames and auxiliary cathode plates on the polished surface having different areas and having different areas .
  • FIG. 1 is a perspective view showing an electrolytic polishing apparatus according to a first embodiment.
  • FIG. 2 is a perspective view showing an electrode coupling member of the electrolytic polishing apparatus according to the first embodiment.
  • FIG 3 is an exploded perspective view showing an electrode coupling member of the electrolytic polishing apparatus according to the first embodiment.
  • FIGS. 4A and 4B are perspective views showing a clamp of the electrolytic polishing apparatus according to the first embodiment.
  • FIG 5 is a perspective view showing a modified example of a cathode frame of the electrolytic polishing apparatus according to the first embodiment.
  • FIG. 6 is a schematic perspective view showing the electrolytic polishing apparatus according to the second embodiment.
  • FIG. 7 is a perspective view showing an electrode coupling member of the electrolytic polishing apparatus according to the second embodiment.
  • FIG. 8 is a schematic perspective view showing an electrolytic polishing apparatus according to the third embodiment.
  • FIG. 9 is a perspective view showing an electrolytic polishing apparatus having a variable electrode frame according to a fourth embodiment.
  • FIG. 10 is a partial perspective view showing a supporting structure of the variable cathode frame of FIG.
  • FIG. 11 is a schematic perspective view showing the variable cathode frame of FIG. 9 as a center.
  • FIG. 12 is a schematic perspective view showing a modified example of the variable cathode frame according to the fourth embodiment.
  • 13 and 14 are sectional views showing the operation of the variable cathode frame.
  • FIG. 15 is a perspective view showing an electrolytic polishing apparatus having a variable electrode frame according to a fifth embodiment.
  • FIG. 1 is a perspective view showing an electrolytic polishing apparatus according to the first embodiment
  • FIG. 2 is a perspective view showing an electrode bonding member of the electrolytic polishing apparatus according to the first embodiment
  • FIG. 3 is a cross- 4A and 4B are perspective views showing a clamp of the electrolytic polishing apparatus according to the first embodiment
  • Fig. 5 is a modification example of the cathode frame of the electrolytic polishing apparatus according to the first embodiment Fig.
  • an electrode frame is an electrode frame used for an electrolytic bath 100 in which an electrolytic polishing object 200 and an accommodation space for containing an electrolytic solution are provided, A first cathode plate 510 in a first direction, a second cathode plate 520 in a second direction, and a third cathode plate 520 in a third direction different from the first direction and the second direction, A negative electrode frame 500 including a first electrode plate 530 and an electrode coupling member 400 disposed at a corner of the electrolytic polishing object and connecting the first negative plate to the third plate.
  • the electrolytic polishing apparatus includes an electrolytic bath 100 in which an electrolytic polishing object 200 and an electrolytic solution are accommodated, a cathode frame 500 spaced apart from the electrolytic polishing object 200, And an electrode coupling member 400 disposed at a corner of the object 200 to connect the cathode frame 500 with each other.
  • the electrode frame may comprise a cathode frame.
  • the electrolytic bath 100 may be formed in a box shape having a receiving space therein.
  • the electrolytic bath 100 may include a cylindrical shape, a polygonal box, or a ring shape, but its shape is not limited.
  • the electrolytic solution may be filled in the electrolytic bath 100.
  • the electrolytic solution can be replaced after electrolytic polishing of the electrolytic polishing object 200 in a state of being filled in the electrolytic bath 100.
  • the electrolytic solution may flow in and out of the electrolytic bath 100 by a separate pump.
  • An electrolyte inlet pipe and an electrolyte outlet pipe may be formed between the electrolytic bath 100 and the pump, and the electrolytic solution flow rate regulator and the filter may be further included.
  • the filter can filter the workpiece sludge and foreign matter contained in the electrolytic solution.
  • Electrolytic polishing object 200 can be accommodated in electrolytic bath 100.
  • the size of the electrolytic bath 100 may be larger than that of the electrolytic polishing object 200.
  • the electrolytic polishing object 200 may be a polygonal chamber or a cylindrical tank.
  • Electrolytic abrasive article 200 may be a chamber for OLED manufacturing.
  • the electropolishing object 200 is an OLED chamber or an MOCVD chamber for an LED, its weight may vary from several hundred kilograms to several thousand kilograms (several tons).
  • the electrolytic polishing object 200 may be a component part of the OLED chamber.
  • the electrolytic polishing object 200 may be in the form of a box or a ring formed by passing through the top and bottom. All of the products of the metal material, not limited to the electrolytic polishing object 200, can be designated as the electrolytic polishing object.
  • the electrolytic polishing object 200 is immersed in the electrolytic solution.
  • the object 200 can be accommodated in the accommodating space of the electrolytic bath 100 while lifted using a crane or the like.
  • the electrolytic polishing object 200 may be disposed inside the electrolytic bath 100 by a separate supporting member so as to be spaced apart from the polishing surface of the electrolytic polishing object 200.
  • the polishing surface of the electrolytic polishing object 200 may include an outer side, an inner side, a bottom surface, and the like of the electrolytic polishing object.
  • a rectifier may further be disposed outside the electrolytic bath 200.
  • the rectifier can apply a voltage of positive (+) to the subject of electrolytic polishing and can apply a voltage of negative (-) to the cathode frame 500.
  • the rectifier may be electrically connected to the electrolytic polishing object 200 by electric wires or the like.
  • the cathode frame 500 may be disposed inside and outside the electrolytic polishing object 200.
  • the cathode frame 500 may be disposed at a certain distance from the polishing surface of the electrolytic polishing object 200. For example, since the cathode frame 500 is uniformly spaced from the electrolytic polishing object 200 by a distance of 50 mm ⁇ 20 mm, the electrolytic polishing efficiency is improved and the electrolytic polishing quality is excellent.
  • the cathode frame 500 may selectively or entirely polish the inside, outside, or bottom surface which is the polishing surface of the electrolytic polishing object 200.
  • the cathode frame 500 may selectively or entirely polish the inside, outside, or bottom surface which is the polishing surface of the electrolytic polishing object 200.
  • a structure in which the cathode frame 500 is disposed inside the electrolytic polishing object 200 will be described.
  • the cathode frame 500 may include a lattice structure.
  • the cathode frame 500 may be a stainless steel material having excellent electrical conductivity, but is not limited thereto.
  • the cathode frame 500 may be a bar shape, an L shape, an angular shape, a rod shape, a wire mesh, an expanded metal, or a round plate, but is not limited thereto.
  • the cathode frame 500 includes a first cathode plate 510 disposed in a first direction and a second cathode plate 520 disposed in a direction different from the first direction, And a third cathode plate 530, which is perpendicular to the first cathode plate 530, for example.
  • Each of the first cathode plate 510, the second cathode plate 520 and the third cathode plate 530 may have a bar shape, an L shape, an angular shape, a rod shape, a wire mesh, But it is not limited thereto.
  • the first cathode plate 510 may be composed of a plurality of plates and may be vertically disposed.
  • the second cathode plate 520 may include a plurality of plates and may be vertically disposed.
  • the first cathode plate 510 and the second cathode plate 520 can polish the inner side surface of the object 200 to be polished.
  • a plurality of cathode plates may be further disposed between the first cathode plate 510 and the second cathode plate 520 disposed at the lowermost position and arranged in a lattice structure.
  • the plurality of supports may be coupled to each other through assembly means such as rivets, bolts or welding.
  • the cathode frame 500 assembled as described above can effectively electrolytically polish the inner bottom surface of the electrolytic polishing object 200.
  • the plurality of cathode plates between the first cathode plate 510 and the second cathode plate 520 disposed at the lowermost position may be removed if the bottom surface of the electrolytic polishing object 200 is not present.
  • the third cathode plate 530 may be formed in a region where the first cathode plate 510 and the second cathode plate 520 meet.
  • the plurality of third cathode plates 530 may be disposed to intersect with the plurality of first cathode plates 510.
  • a plurality of third cathode plates 530 may be disposed to intersect with the plurality of second cathode plates 520.
  • the third cathode plate 530 may be disposed in the longitudinal direction of the electrolytic polishing object 200.
  • the first cathode plate 510 and the second cathode plate 520 may be vertically disposed, but are not limited thereto.
  • the third cathode plate 530 and the first cathode plate 510 may be vertically disposed, but are not limited thereto.
  • the cathode frame 500 having the above structure should be disposed apart from the polishing surface so as not to be in contact with the electrolytic polishing object 200 of the anode.
  • a spacer 700 may be provided on one side of the cathode frame 500.
  • the spacing member 700 may be spaced apart from the side wall or bottom of the cathode frame 500 and the electrolytic polishing object 200.
  • a structure in which the spacing member 700 is spaced apart from the bottom of the electrolytic polishing object 200 will be described.
  • a plurality of spacing members 700 may be formed on the first cathode plate 510.
  • a plurality of spacing members 700 may be formed on the second cathode plate 520.
  • the spacing member 700 may be formed of an insulating material.
  • the spacing member 700 can withstand the weight of the cathode frame 500 and can be formed of a material having high acid resistance.
  • the spacing member 700 may include any one of PVC, rubber, urethane rubber, and a backlight.
  • the spacing member 700 can be engaged with the first cathode plate 510 by the C-type clamp 600.
  • the spacer member 700 may be formed of a plate having a corner portion at one side. The shape thereof is not limited.
  • the spacer 700 is formed on the first cathode plate 510 and the second cathode plate 520, but the present invention is not limited to this, and the spacer may be provided on one side of the third cathode plate 530.
  • cathode frame having a variable structure capable of varying the size of the cathode frame as the electropolished object becomes larger can be used.
  • the cathode frame will be described mainly on the first cathode plate and the second cathode plate structure.
  • the first cathode plate 510 of the cathode frame 500 may include a plurality of supports, and the length thereof may be increased or decreased.
  • the structure of the second cathode plate 520 may be the same as that of the first cathode plate 510.
  • the structure of the first cathode plate 510 will be described.
  • the first cathode plate 510 may be configured to connect a plurality of supports.
  • the first cathode plate 510 may be arranged so that the first cathode plate 510 is partially overlapped with the first cathode plate 510, and may be moved away from or close to each other.
  • the first cathode plate 510 is composed of a plurality of supports and the first cathode plate 510 includes a first support 512 and a second support 514 connected to the first support 512 Structure.
  • the first support 512 may be referred to as a first cathode support
  • the second support 514 may be referred to as a second cathode support.
  • a portion of the first support 512 may be overlapped with a portion of the second support 514.
  • the overlapped area of the first support 512 and the second support 514 may be supported by the C-clamp 600.
  • the C-type clamp 600 supporting the first support 512 and the second support 514 may be referred to as a fourth clamp.
  • the first support base 512 and the second support base 514 can move in a direction in which the first support base 512 and the second support base 514 are moved away from each other.
  • the C-type clamp 600 can support the first support 512 and the second support 514 with a force such that the first support 512 and the second support 514 can move with respect to each other.
  • the C-type clamp 600 may support the first support 512 and the second support 514 by moving the first support 512 and the second support 514 and adding a fixing force.
  • the second cathode plate 520 may include a first support 522 and a second support 524 so as to be identical to the first cathode plate 510.
  • the first support 522 of the second cathode plate 520 can be moved in a direction away from or close to the second support 524.
  • the first support 532 and the second support 524 of the second cathode plate 520 may be arranged to partially overlap each other.
  • the overlapped area of the first support 522 and the second support 524 of the second cathode plate 520 can be supported by the C-type clamp 600.
  • the length of the second cathode plate 530 can be varied.
  • the third cathode plate 530 is not limited to this structure. As shown in FIG.
  • the electrode coupling member 400 may be provided to couple the plurality of cathode frames 500 to the corners of the electrolytic polishing object 200.
  • the electrode coupling member 400 may be disposed in a region where the first cathode plate 510, the second cathode plate 520, and the third cathode plate 530 meet.
  • the electrode coupling member 400 may electrically connect the first cathode plate 510, the second cathode plate 520, and the third cathode plate 530.
  • the electrode coupling member 400 may fix the first cathode plate 510, the second cathode plate 520, and the third cathode plate 530.
  • the electrode coupling member 400 includes a first support 410 coupled to the first cathode plate 510, a second support 420 coupled to the second cathode plate 520, a third cathode plate 530, And a third support 430 coupled to the second support 430.
  • the first support plate 410 may be formed in a shape corresponding to the first cathode plate 510.
  • the first to third supports 410, 420, and 430 may include an L shape, a bar shape, an angular shape, a bar shape, and a round shape, but are not limited thereto.
  • the first cathode plate 510 can be fixed in a state of being overlapped with the first support 410 by the C-type clamp 600.
  • the second support plate 420 may be coupled to the second cathode plate 520 by the C-type clamp 600 and the third support plate 430 may be coupled to the third cathode plate 530 and the C- Lt; / RTI >
  • the C-type clamp 600 for fixing the first cathode plate 510 may be referred to as a first clamp and the C-type clamp 600 for fixing the second cathode plate 520 may be referred to as a second clamp
  • the C-shaped clamp 600 fixing the third cathode plate 530 may be referred to as a third clamp.
  • the C-type clamp 600 is formed of a conductive material, the C-type clamp 600 installed in the narrow space between the cathode frame 500 and the electrolytic polishing object 200 is in contact with the electrolytic polishing object 200 Electric short circuit between the cathode frame 500 and the electrolytic polishing object 200 can be generated.
  • an insulating portion 620 may be further formed on one side of the fixing portion 610 for fixing the cathode frame 500 and the electrode coupling member 400.
  • the fixing portion 610 may be disposed on one side of the first body 640 and the second body 650, respectively.
  • the second body 650 may have a C-shape and may be coupled to the first body 640.
  • the first body 640 is coupled to the second body 650 and can be moved up and down.
  • the first and second bodies 640 and 650 may be moved toward or away from each other.
  • the insulating portion 620 may be formed on one side of the fixing portion 610 and may be in contact with the cathode frame 500 and the electrode coupling member 400. Thus, even if the C-type clamp 600 is in contact with one side of the electrolytic polishing object 200, it is possible to prevent electrical short circuit between the electrolytic polishing object 200 and the cathode frame 500.
  • the insulating portion 620 may include a material having elasticity.
  • the insulating portion 620 may include, but is not limited to, PVC, rubber, urethane rubber, and backlight.
  • the second body 650 may further include an insulating layer 650b.
  • the interior of the second body 650 may be formed of a conductive material 650a to maintain rigidity and the insulating body 650b may be coated on the outer surface of the second body 650.
  • the C-shaped clamp 600 may further include a projection 630 to maximize the clamping force of the frame coupled to each other.
  • the protrusion 630 has an effect of preventing the C-type clamp 600 from slipping from the negative electrode frame 500 and preventing the C-type clamp 600 from being detached from the electrode binding member 400.
  • the fixing portion 620 is formed on one side of the fixing portion 610 of the C-type clamp 600 in the above description, the fixing portion 620 may be formed of an insulating material and the insulating portion 620 may be removed.
  • the angle? Formed by the first support 410 and the second support 420 may be 90 degrees, but is not limited thereto.
  • the third support 430 May be disposed at an angle of 90 degrees with respect to the first support 410 and the second support 420, but the present invention is not limited thereto.
  • the first support 410 may include a first side 412 and a second side 414.
  • the second surface 414 of the first support 410 may be bent at an angle from the first surface 412 of the first support 410.
  • the angle? Formed by the first surface 412 of the first support 410 and the second surface 414 of the first support 410 may include 90 degrees.
  • the second support 420 may include a first side 422 and a second side 424.
  • the second surface 424 of the second support 420 may be bent at an angle from the second surface 424 of the second support 420.
  • the angle? Formed by the first surface 422 of the second support table 420 and the second surface 424 of the second support table 420 may include 90 degrees.
  • the third support 430 may include a first side 432 and a second side 434.
  • the second surface 434 of the third support 430 may be bent at an angle from the first surface 432 of the third support 434.
  • the angle formed by the first surface 432 of the third support member 430 and the second surface 434 of the third support member 430 may include? 90 degrees.
  • the first side 412 of the first support 410 may be coupled to the rear side of the second side 434 of the third support 430 through assembly means including rivets, bolts, welding, or the like.
  • assembly means including rivets, bolts, welding, or the like.
  • holes H of the same size may be formed on the first surface 412 of the first support 410 and the second surface 434 of the third support 430.
  • the second surface 414 of the first support 410 may be coupled to the second surface 424 of the second support 420 through assembly means including rivets, bolts, welding, or the like.
  • assembly means including rivets, bolts, welding, or the like.
  • a hole H of the same size may be formed on the second surface 414 of the first support 410 and the second surface 424 of the second support 420.
  • the first side 422 of the second support platform 420 may be coupled to the front side of the first side 432 of the third support platform 430 through an assembly means including rivets, bolts, welding, or the like.
  • a hole H of the same size may be formed on the first surface 422 of the second support table 420 and the first surface 432 of the third support table 430.
  • the electrode coupling member 400 can be assembled more firmly by coupling the first support 410 at the back of the third support 430 and coupling the second support 420 at the front of the third support 430 have. Further, the electrode coupling member 400 has an effect of improving the electric conductivity by being coupled by the coupling member.
  • the electrode coupling member of the first embodiment has the effect of shortening the assembly time of a plurality of cathode plates.
  • the electrode coupling member of the first embodiment has the effect of more firmly fixing the negative electrode plate.
  • the electrode joining member of the first embodiment has an effect of being easily provided at the corner of the cramped electrolytic polishing object and preventing the electrode joining member from being short-circuited with the electrolytic polishing object.
  • the cathode plate may be in a state where its surface is deteriorated in electrical conductivity due to oxidation or the like in the electrolytic polishing process, There is a problem that the electric conductivity is lowered and, as a result, the efficiency and quality of electrolytic polishing are lowered.
  • a composite technical effect which is excellent in electric conductivity and excellent in electrolytic polishing efficiency and polishing quality by preparing a negative electrode frame support by firmly fixing the negative electrode plate in a state of excellent electric conductivity.
  • the first embodiment can be limited to the case where the electrolytic polishing object is a square box.
  • the corner portion of the electrolytic polishing object may be formed to have a width of 90 degrees.
  • the embodiment is not limited to this, and even if the electropolished object is not a square box, the electropolishing object can be applied when the corner portion is 90 degrees.
  • FIG. 6 is a schematic perspective view showing the electrolytic polishing apparatus according to the second embodiment
  • FIG. 7 is a perspective view showing the electrode bonding member of the electrolytic polishing apparatus according to the second embodiment.
  • the electrolytic polishing object may be a polygonal box or a polygonal ring-shaped chamber.
  • the electrolytic polishing apparatus includes an electrolytic bath 100 in which an electrolytic polishing object 200 and a housing space for containing an electrolytic solution are provided, and an electrolytic bath 100 which is separated from the electrolytic polishing object 200
  • the electrolytic bath 100 may be formed in a box shape having a receiving space therein.
  • the electrolytic bath 100 may include a cylindrical or polygonal box shape, but its shape is not limited.
  • the electrolytic solution may be filled in the electrolytic bath 100.
  • a rectifier may further be arranged outside the electrolytic bath 100. The rectifier can apply a voltage of positive (+) to the object of electrolytic polishing and can apply a voltage of negative (-) to the cathode frame.
  • the cathode frame 500 includes a first cathode plate 510 disposed in a first direction, a second cathode plate 520 disposed perpendicularly to the first direction, and a second cathode plate 520 perpendicular to the first and second directions.
  • 3 cathode plate 530 as shown in FIG.
  • Each of the first cathode plate 510, the second cathode plate 520 and the third cathode plate 530 may have a bar shape, an L shape, an angular shape, a rod shape, a wire mesh, But it is not limited thereto.
  • the first cathode plate 510 may be composed of a plurality of plates and may be vertically disposed.
  • the second cathode plate may be configured to include a plurality of plates and be disposed up and down.
  • the first cathode plate 510 and the second cathode plate 520 can polish the inner surface of the object 200 to be polished.
  • a plurality of cathode plates may be further disposed between the first cathode plate 510 and the second cathode plate 520 disposed at the lowermost position, but this may be omitted.
  • the third cathode plate 530 may be formed in a region where the first cathode plate 510 and the second cathode plate 520 meet.
  • the third cathode plate 520 may be disposed in the longitudinal direction of the electrolytic polishing object 200.
  • the first cathode plate 510 and the second cathode plate 520 may be vertically disposed, but are not limited thereto.
  • the third cathode plate 530 and the first cathode plate 510 may be vertically disposed, but are not limited thereto.
  • an electrode coupling member 400 may be provided to couple the plurality of cathode frames 500 disposed at the corners of the electrolytic polishing object 200.
  • the electrolytic polishing object 200 may be formed in a polygonal box or a polygonal ring shape.
  • the electrode coupling member 400 may be disposed in a region where the first cathode plate 510, the second cathode plate 520, and the third cathode plate 530 meet.
  • the electrode coupling member 400 may include a first support 410, a second support 420, and a third support 430.
  • the first support plate 410 may be coupled to the first cathode plate 510.
  • the second support plate 420 may be coupled to the second cathode plate 520.
  • the third support plate 430 may be coupled to the third cathode plate 530.
  • the first support plate 410 may be formed in a shape corresponding to the first cathode plate 510.
  • the first cathode plate 510 can be fixed in a state of being overlapped with the first support 410 by the C-type clamp 600.
  • the second support plate 420 may be coupled to the second cathode plate 520 by the C-type clamp 600 and the third support plate 430 may be coupled to the third cathode plate 530 and the C- Lt; / RTI >
  • the angle ⁇ between the first support 410 and the second support 420 may be greater than 90 degrees as shown in Figure 7.
  • the first support 410 and the second support 420 The angle? Between the first support 410 and the second support 420 may correspond to the angle formed by the corners of the electrolytic polishing object 200.
  • the third support 430 is disposed so as to have an angle of 90 degrees with respect to the first support 410 and the second support 420 .
  • the first support 410 may include a first side 412 and a second side 414.
  • the second surface 424 of the first support 410 may be bent at an angle from the first surface 422 of the first support 410.
  • the angle? Formed by the first surface 412 of the first support 410 and the second surface 424 of the first support 410 may include 90 degrees.
  • the second support 420 may include a first side 422 and a second side 424.
  • the second surface 424 of the second support 420 may be bent at an angle from the second surface 424 of the second support 420.
  • the angle? Formed by the first surface 422 of the second support table 420 and the second surface 424 of the second support table 420 may include 90 degrees.
  • the third support 430 may include a first side 432 and a second side 434.
  • the second surface 434 of the third support 430 may be bent at an angle from the second surface 434 of the third support 430.
  • the angle? Between the first surface 432 of the third support member 430 and the second surface 434 of the third support member 430 may be 90 degrees or more.
  • 410 is coupled to the second surface 434 of the third support 430 and the second support 420 is coupled to the first surface 432 of the third support 430, 23 between the first support surface 430 and the second support surface 420 may correspond to an angle ⁇ formed between the first surface 432 and the second surface 434 of the third support 430.
  • the first side 412 of the first support 410 may be coupled to the rear side of the second side 434 of the third support 430 through assembly means including rivets, bolts, welding, or the like.
  • the second surface 414 of the first support 410 may be coupled to the second surface 424 of the second support 420 through assembly means including rivets, bolts, welding, or the like.
  • the first side 422 of the second support platform 420 may be coupled to the front side of the first side 432 of the third support platform 430 through an assembly means including rivets, bolts, welding, or the like.
  • the electrode joining member 400 according to the second embodiment can be easily installed at the corner of the electrolytic polishing object 200 having an angle of 90 degrees or more so that the electrolytic polishing can be effectively performed at the corner portion of the electrolytic polishing object have.
  • FIG 8 is a schematic perspective view showing an electrolytic polishing apparatus according to the third embodiment.
  • the structure in the case where there is no vertex at the corner portion of the electrolytic polishing object will be described.
  • the electrolytic polishing object may be a rectangular or other polygonal chamber.
  • the electrolytic polishing apparatus includes an electrolytic bath 100 in which an electrolytic polishing object 200 and a housing space for containing an electrolytic solution are provided, and an electrolytic bath 100 which is separated from the electrolytic polishing object 200 A second cathode plate 520 in a second direction and a third cathode plate 530 in a third direction perpendicular to the first and second directions, And an electrode coupling member 400 disposed at a corner of the electrolytic polishing object 200 to connect the first to third plates 510, 320, and 330 to each other.
  • the cathode frame 500 includes a first cathode plate 510 disposed in a first direction, a second cathode plate 520 disposed perpendicularly to the first direction, and a second cathode plate 520 perpendicular to the first and second directions.
  • 3 cathode plate 530 as shown in FIG.
  • Each of the first cathode plate 510, the second cathode plate 520 and the third cathode plate 530 may have a bar shape, an L shape, an angular shape, a rod shape, a wire mesh, But it is not limited thereto.
  • the first cathode plate 510 may be composed of a plurality of plates and may be vertically disposed.
  • the second cathode plate 520 may include a plurality of plates and may be vertically disposed.
  • the first cathode plate 510 and the second cathode plate 520 can polish the inner surface of the object 200 to be polished.
  • a plurality of cathode plates may be further disposed between the first cathode plate 510 and the second cathode plate 520 disposed at the lowermost position, but this may be omitted.
  • the third cathode plate 530 may be formed in a region where the first cathode plate 510 and the second cathode plate 520 meet.
  • the third cathode plate 530 may be disposed in the longitudinal direction of the electrolytic polishing object 200.
  • the third cathode plate 530 may include a third cathode plate 530a on the right side and a third cathode plate 530b on the left side.
  • the electrode coupling member 400 may be disposed in a region where the first cathode plate 510 and the second cathode plate 520 meet with the left and right third cathode plates 530a and 530b.
  • the electrode coupling member 400 may include a first support 410 and a second support 420 and a third support 430a on the left and a third support 430b on the right.
  • the first support plate 410 may be coupled to the first cathode plate 510.
  • the second support plate 420 may be coupled to the second cathode plate 520.
  • the third support plate 430a on the left side can be engaged with the third cathode plate 530a on the left side.
  • a connecting member 440 may further be disposed between the third supporting base 430a on the left side and the third supporting base 430b on the right side.
  • the connecting member 440 may be formed of a stainless steel material of a metal material. Although the connecting member 440 is formed into a rod shape, its shape is not limited.
  • the first support plate 410 may be formed in a shape corresponding to the first cathode plate 510.
  • the first cathode plate 510 may be fixed in a state of being overlapped with the first support 410 by a C-type clamp.
  • the second support plate 420 may be coupled to the second cathode plate 520 by a C-type clamp.
  • the left third support plate 430a can be coupled to the left third cathode plate 530a by a C-type clamp.
  • the third support plate 430b on the right side can be coupled to the third cathode plate 530b on the right side by a C-type clamp.
  • the angle between the first support 410 and the second support 420 may be 90 degrees. Alternatively, the angle between the first support 410 and the second support 420 may be greater than 90 degrees.
  • the angle formed between the first support 410 and the second support 420 may be 90 degrees, The angle between the first support 410 and the second support 420 may exceed 90 degrees.
  • the electrode joining member according to the third embodiment can effectively be installed even if the corner portion of the electrolytic polishing object does not have a vertex, so that the electrolytic polishing can be effectively performed at the corner portion of the electrolytic polishing object.
  • the embodiment has the effect of shortening the assembling time of a plurality of cathode plates by providing the electrode bonding member at the corner portion of the electrolytic polishing object.
  • the electrode coupling member of the embodiment has the effect of more firmly fixing the negative electrode frame without a plurality of fixing members.
  • the embodiment has an effect that it is possible to easily attach the electrode joining member to the corner of the cramped electrolytic polishing object, thereby preventing the electrode joining member from being short-circuited with the electrolytic polishing object.
  • the electrode coupling member of the embodiment can be easily installed on the corner of the electrolytic polishing object having 90 degrees or more, and thus the corner portion of the electrolytic polishing object can be effectively electrolytically polished.
  • the electrode bonding member of the embodiment can effectively be installed even if the corner portion of the electrolytic polishing object does not have a vertex, thereby effectively carrying out electrolytic polishing of the corner portion of the electrolytic polishing object.
  • the embodiment has a technical effect that the anode plate is fixed firmly in advance in a state of excellent electric conductivity, and the anode plate support is prepared, so that the electric conductivity is excellent and the efficiency of electrolytic polishing and the polishing quality are excellent.
  • FIG. 9 is a perspective view showing an electrolytic polishing apparatus having a variable electrode frame according to a fourth embodiment
  • FIG. 10 is a partial perspective view showing a supporting structure of the variable electrode frame of FIG. 9
  • Fig. 7 is a schematic perspective view showing the electrode frame as a center.
  • variable electrode frame may include a variable cathode frame, but is not limited thereto.
  • the electrolytic polishing apparatus includes an electrolytic bath 100 in which an electrolytic polishing object 200 and a housing space in which an electrolytic solution is contained are provided, And a variable cathode frame 300 disposed on one side.
  • the electrolytic bath 100 may be formed in a box shape having a receiving space therein.
  • the electrolytic bath 100 may include a cylindrical shape, a polygonal box, or a ring shape, but its shape is not limited.
  • the electrolytic solution may be filled in the electrolytic bath 100.
  • the electrolytic solution can be replaced after electrolytic polishing of the electrolytic polishing object 200 in a state of being filled in the electrolytic bath 100.
  • the electrolytic solution may flow in and out of the electrolytic bath 100 by a separate pump.
  • An electrolyte inlet pipe and an electrolyte outlet pipe may be formed between the electrolytic bath 100 and the pump, and the electrolytic solution flow rate regulator and the filter may be further included.
  • the filter can filter the workpiece sludge and foreign matter contained in the electrolytic solution.
  • Electrolytic polishing object 200 can be accommodated in electrolytic bath 100.
  • the size of the electrolytic bath 100 may be larger than that of the electrolytic polishing object 200.
  • the electrolytic polishing object may be a polygonal or cylindrical chamber or tank.
  • Electrolytic abrasive article 200 may be a chamber for OLED manufacturing.
  • the electropolished object () is a chamber for an OLED or an MOCVD chamber for an LED
  • its weight may be as large as several hundred kg to several thousand tons (several tons).
  • the electrolytic polishing object 200 may be a component part of the OLED chamber.
  • the electrolytic polishing object 200 in this embodiment may have a structure in which the width of the central region is small.
  • the electrolytic polishing object 200 includes a first region 210 having a first area and a second region 230 having an area smaller than that of the first region 210 on the first region 210, And a third region 250 having an area larger than that of the second region 230 on the second region 230.
  • the areas of the first area 210 and the third area 230 may be the same or different.
  • the shape of the electrolytic polishing object 200 is not limited to this, but may be a plate, a box shape, or a ring shape formed by passing through the top and bottom.
  • the electrolytic polishing object 200 can designate all products made of a metal as an electrolytic polishing object.
  • the electrolytic polishing object 200 can be immersed in the electrolytic solution. Since the electrolytic polishing object 200 has a large weight, the object 200 can be accommodated in the accommodating space of the electrolytic bath 100 while lifted using a crane or the like.
  • the polishing surface of the electrolytic polishing object 200 may include an outer side, an inner side, a bottom surface, and the like of the electrolytic polishing object 200.
  • a rectifier may further be disposed on one side of the electrolytic bath 200.
  • the rectifier can apply a voltage of positive (+) to the subject of electrolytic polishing and can apply a voltage of negative (-) to the variable cathode frame 300.
  • the rectifier may be electrically connected to the electrolytic polishing object 200 by electric wires or the like.
  • the variable cathode frame 300 may be disposed inside and outside the electrolytic polishing object 200.
  • the variable cathode frame 300 may be spaced apart from the polishing surface of the electrolytic polishing object 200 by a predetermined distance.
  • the variable cathode frame 300 may be spaced apart from the electrolytic polishing object 200 by a distance of 50 mm +/- 20 mm.
  • the variable cathode frame 300 can polish all surfaces either selectively or simultaneously at the inside, outside, or bottom surface, which is the polishing surface of the electrolytic polishing object 200.
  • a structure in which the variable anode frame 300 is disposed inside the electrolytic polishing object 200 will be described.
  • variable cathode frame 300 is disposed in the first region 210 of the electrolytic polishing object 200 and disposed on the polishing surface of the first region 210. If the second region 230 of the electrolytic polishing object 200 is not separated from the first region 210, the variable cathode frame 300 passes through the second region 230 of the electrolytic polishing object 200, (210).
  • the area of the conventional negative electrode plate is already determined, it is not easy to pass through the second region 230 of the electrolytic polishing object 200. If the conventional negative electrode plate is formed so as to pass through the second region 230 of the electrolytic polishing object 200, the first region 210 of the electrolytic polishing object 200 can not be effectively electrolytically polished .
  • variable cathode frame 300 may be provided to dispose the anode plate in the first region 210 of the electrolytic polishing object 200.
  • variable-type negative electrode frame 300 disposed in the first region 210 of the electrolytic-polishing object 200 will be mainly described.
  • the negative electrode plate disposed in the second region 230 and the third region 250 of the electrolytic polishing object 200 may be a fixed negative electrode plate or alternatively may be a variable electrode frame.
  • the variable cathode frame 300 may include a grid-like plate shape.
  • the variable cathode frame 300 may be made of copper, aluminum, or stainless steel, which is excellent in electrical conductivity and acid resistance, but is not limited thereto.
  • the variable cathode frame 300 may be a bar shape, an L shape, an angular shape, a bar shape, a round shape, a wire mesh shape, or an expanded shape plate.
  • the variable cathode frame 300 may include a first cathode plate 310 and a second cathode plate 320.
  • the first cathode plate 310 and the second cathode plate 320 may be arranged in a lattice structure.
  • the first cathode plate 310 may be formed in a long rod shape.
  • the first cathode plate 310 may be configured to include a plurality of plates and be spaced apart from each other.
  • the second cathode plate 320 may be formed in a long rod shape.
  • the second cathode plate 320 may be composed of a plurality of plates and spaced apart from each other.
  • the first cathode plate 310 and the second cathode plate 320 may be disposed at an angle of 90 degrees, but the present invention is not limited thereto.
  • the first cathode plate 310 may be composed of a plurality of supports so that the length thereof may be increased or decreased.
  • the structure of the second cathode plate 320 may be the same as that of the first cathode plate 310.
  • the structure of the first cathode plate 310 will be described.
  • the first cathode plate 310 may be configured to connect a plurality of supports.
  • the first cathode plate 310 may be arranged so that the first cathode plate 310 is partially overlapped with the first cathode plate 310, and may be moved away from or close to each other.
  • the first cathode plate 310 is composed of a plurality of supports, but for convenience of explanation, the first cathode plate 310 includes a first support 312 and a second support 314 connected to the first support 312 Structure.
  • the first support 312 may be L-shaped, but is not limited thereto. A portion of the first support 312 may be overlapped with a portion of the second support 314. The overlapped area of the first support 312 and the second support 314 may be supported by the C-clamp 600.
  • the first support 312 may include a first surface 312a and a second surface 312b.
  • the second surface 312b may include a shape bent at an angle from the first surface 312a.
  • the second support 314 may be formed in the same shape as the first support 312.
  • the first surface 312a of the first support 312 may be disposed in a superposition with the first surface 314a of the second support 314. [ The first surface 312a of the first support 312 may be disposed on the first surface 314a of the second support 314 but is not limited thereto. The second surface 312b of the first support 312 may overlap the second surface 314b of the second support 314. The second surface 312b of the first support 312 may be disposed on the second surface 314b of the second support 314 but is not limited thereto.
  • the overlapping area of the first surface 312a of the first support 312 and the first surface 314a of the second support 314 can be fixed by the fixing member of the electrode frame for electrolytic polishing.
  • the fixing member of the electrode frame for electrolytic polishing may be a clamp.
  • the overlapping area of the first surface 312a of the first support 312 and the first surface 314a of the second support 314 may be supported by the C-clamp 600, It is not.
  • the C-type clamp 600 can be constructed as shown in FIGS. 4A and 4B, and the details described above will be adopted.
  • the C-type clamp 600 includes a first body 640, a second body 650, and a fixed portion (not shown) disposed on one side of the first body 640 and the second body 650 610).
  • the fixing portion 610 may be disposed on one side of the first body 640 and the second body 650, respectively.
  • the second body 650 may have a C-shape and may be coupled to the first body 640.
  • the first body 640 is coupled to the second body 650 and can be moved up and down. Accordingly, the first and second bodies 640 and 610, which are opposed to the second body 650, can be moved toward or away from each other.
  • the fixing portion 610 is disposed on one side of the first surface 312a of the first supporting table 312 and on the other side of the first surface 314a of the second supporting table 314,
  • the second support base 312b can be stably supported.
  • the C-type clamp 600 may be formed of a stainless steel material having excellent acid resistance.
  • the fixing member of the electrode frame for electrolytic polishing has been described mainly on the function of fixing the cathode plate, but the function of the fixing member of the electrode frame is not limited thereto.
  • the fixing member of the electrode frame for electrolytic polishing can fix the holder of the predetermined electrode frame and the object to be polished.
  • the predetermined projecting portion of the object to be polished and the base of the electrode frame can be fixed by using the fixing member of the electrode frame for electrolytic polishing of the embodiment.
  • the fixing member of the electrode frame for electrolytic polishing of the embodiment can firmly fix the holder between the electrode frame and the holder of the predetermined electrode frame.
  • the invention of a cradle of a predetermined electrode frame mentioned in the embodiment is a separate inherent inventive concept of the inventor of the present application.
  • the first surface 312a of the first support table 312 and the first surface 314a of the second support table 314 can be moved in a direction in which the first surface 312a and the first surface 314a of the second support table 314 are moved away from each other.
  • the C-type clamp 600 clamps the first support 312 and the second support 312 in such a way that the first surface 312a of the first support 312 and the first surface 314a of the second support 314 can move.
  • the first surface 312a and the first surface 314a of the second support 314 can be supported.
  • the C type clamp 600 moves the first surface 312a of the first support table 312 and the first surface 314a of the second support table 314 and then applies a fixing force to the first surface 312a of the first support table 312, And the second support base 314 can be supported.
  • the second cathode plate 320 may include a first support and a second support to be identical to the first cathode plate 310.
  • the second cathode plate 320 may be formed of a rod-shaped plate, but is not limited thereto.
  • the first support 322 of the second cathode plate 320 can be moved in a direction away from or close to the second support 324.
  • the first support 322 and the second support 324 of the second cathode plate 320 may be arranged to partially overlap each other.
  • the overlapping area of the first support 322 and the second support 324 of the second cathode plate 320 can be supported by the C-type clamp 600. As a result, the length of the second cathode plate 320 can be varied.
  • variable cathode frame 300 when the overlapping area of the plurality of supports is minimized, the variable cathode frame 300 can have a maximum area.
  • the lengths of the plurality of supports are the same.
  • the total length L11 of the first cathode plate 310 may correspond to the total length L1 of each support member constituting the first cathode plate 310.
  • the total length L21 of the second cathode plate 320 may be equal to or slightly smaller than the total length L2 of each support member constituting the second cathode plate 320.
  • the area of the variable cathode frame 300 is equal to the total length L11 of the first cathode plate 310 and the total length L21 of the second cathode plate 320 ). ≪ / RTI >
  • variable cathode frame 300 may have a minimum area.
  • the total length L11 of the first cathode plate 310 may be twice the length L1 of one support plate constituting the first cathode plate 310.
  • the lengths of the plurality of supports are the same, and the number of the supports may include three.
  • the total length L11 of the first cathode plate 310 may be varied depending on the number of the plurality of supports.
  • the length of the second cathode plate 320 can be controlled in the same manner as that of the first cathode plate 310.
  • the flexible cathode frame 300 when the flexible cathode frame 300 passes through the second region 230 of the electrolytic polishing object 200, the flexible cathode frame 300 may have an area that can pass through the second region 230 have.
  • the variable cathode frame 300 passing through the second region 230 can be varied to correspond to the area of the polishing surface of the first region 210 of the electrolytic polishing object 200.
  • the first cathode plate 310 and the second cathode plate 320 are controlled in length at the same time. However, depending on the length and width of the polishing surface, As shown in FIG. For example, when the flexible negative electrode frame 300 is assembled according to the size of the polishing surface of the electrolytic polishing object 200 and the deformed negative electrode frame 300 is disposed on the polishing surface of the electrolytic polishing object 200, It is possible to prevent the negative electrode plate from being discarded or reassembled.
  • variable anode frame 300 having the above structure should be disposed apart from the polishing surface so as not to be in contact with the electrolytic polishing object 200 of the anode.
  • a spacing member 700 may be provided on one side of the variable-type variable anode frame 300.
  • the spacing member 700 may be disposed so as to be spaced apart from the side wall or bottom of the flexible cathode frame 300 and the electrolytic polishing object 200.
  • a structure in which the spacing member 700 is spaced apart from the bottom portion of the electroconductive polishing object 200 will be described.
  • a plurality of the spacing members 700 may be formed on the first cathode plate 310.
  • a plurality of the spacing members 700 may be formed on the second cathode plate 320.
  • the spacing member 700 may be formed of an insulating material.
  • the spacing member 700 can withstand the weight of the variable cathode frame 300 and can be formed of a material having high acid resistance.
  • the spacing member 700 may include any one of PVC, rubber, urethane rubber, and a backlight.
  • the spacing member 700 can be coupled to the first cathode plate 310 by the C-type clamp 600.
  • the spacer member 700 may be formed of a plate having a corner portion at one side. The shape thereof is not limited.
  • variable anode frame 300 is assembled to a size corresponding to the polishing surface of the electrolytic polishing object 200 and disposed on the polishing surface of the electrolytic polishing object so that the cathode plate already used is discarded or reassembled to thereby measure the time and / It is possible to prevent an increase in cost.
  • FIG. 12 is a schematic perspective view showing a modified example of the variable electrode frame according to the fourth embodiment
  • FIGS. 13 and 14 are sectional views showing the operation of the variable electrode frame.
  • variable cathode frame 300 may include a first cathode plate 310 and a second cathode plate 320.
  • the first cathode plate 310 and the second cathode plate 320 may be arranged in a lattice structure.
  • the first cathode plate 310 may be configured to include a plurality of plates and be spaced apart from each other.
  • the second cathode plate 320 may be composed of a plurality of plates and spaced apart from each other.
  • the first cathode plate 310 and the second cathode plate 320 may be disposed at an angle of 90 degrees, but the present invention is not limited thereto.
  • the first cathode plate 310 and the second cathode plate 320 may be formed of a plurality of supports, respectively, so that the length thereof may be increased or decreased. Since the first cathode plate 310 and the second cathode plate 320 have the same operation structure, the first cathode plate 310 will be mainly described.
  • the first cathode plate 310 may be configured to connect a plurality of supports.
  • the first anode plate 310 includes a first support 312, a second support 314 coupled to one side of the first support 312 and a third support 314 coupled to one side of the second support 314, And may include a support 316.
  • the number of support rods is not limited to three, and for convenience of explanation, the case where there are three rods is described.
  • the first support 312 may be formed in a structure having a bottom portion and a side wall portion.
  • the first support 312 may have a structure in which the top is opened and its cross section is U-shaped.
  • the second support base 314 may be formed of a bottom portion, a side wall portion, and a ceiling portion.
  • the second support base 314 may include a multi-ring shape having one side and the other side penetratingly formed.
  • the third support 316 may be formed in the same shape as the first support 312.
  • the first support 312 can be inserted and slid into the second support 314.
  • the first support 312 may be disposed to partially or entirely overlap with the second support 314.
  • the third support 316 may be arranged to overlap part or all of the second support 314.
  • the length of the first cathode plate 310 can be maximized when the overlapping area of the first support 312, the second support 314, and the third support 316 is minimized.
  • the length of the first cathode plate 310 can be minimized when the overlapping area of the first support 312, the second support 314, and the third support 316 is maximized.
  • the second support 314 and the third support 316 are fixed to the first support 312, the second support 314 and the third support 316 so that the first support 312, the second support 314 and the third support 316 can be maintained in a fixed state. May be provided.
  • a protrusion 312a may be formed on one side of the first support 312.
  • the protrusion 312a may have a circular ball shape.
  • the protruding portion 312a may have a circular shape with less frictional force on the surface.
  • the protrusion 312a can be received inside the first support base 312 by a force applied to the protrusion 312a.
  • a groove can be formed in the first support base 312 to receive the protrusion 312a.
  • an elastic member such as a spring may be further connected to the protrusion 312a.
  • the elastic member keeps the protrusion 312a in a protruded state and can guide the protrusion 312a to the inside of the first support base 312 when a force is applied to the protrusion 312a.
  • the structure of the third support 316 may be the same as that of the first support.
  • a receiving groove 314a may be formed on one side of the second support base 314 to correspond to the protrusion 312a of the first support base 312 and the protrusion 316a of the third support base 316.
  • the receiving groove 314a may be formed in a shape corresponding to the shape of the protrusion 316a of the third support 316.
  • a plurality of receiving grooves 314a may be disposed on one side of the second support table 314. The receiving grooves 314a may be formed to have the same spacing.
  • the protrusion 312a of the first support 312 may be coupled to the receiving groove 314a disposed at the outermost portion of the second support 314 when a force is applied to the first support 312 in the first direction .
  • the protrusion 316a of the third support 316 is positioned at the outermost position of the second support 314, (Not shown).
  • the area where the first support 312 and the second support 314 overlap can be minimized.
  • the area where the third support 316 and the second support 314 overlap can be minimized. Accordingly, the length of the first cathode plate 310 can be maximized.
  • the protrusion 312a of the first support base 312 moves to the inside of the second support base 314 and is disposed inside the second support base 314 when the first support base 312 is again urged in the first direction And can be coupled to the receiving groove 314a.
  • the first protrusion 312a of the first protrusion 312 is formed in a ball shape so that when the first protrusion 312 is pressed against the first protrusion 312 in the first direction, The first support base 312 is slid in the inner direction of the second support base 314.
  • the protrusion 312a of the first support 312 is protruded and engaged with the other receiving groove 314a of the second support 314 and the first support 312 is stably fixed to the second support 314 .
  • the protrusion 316a of the third support 316 is received in the third support 316, 2 support base 314. In this way, The projection 316a of the third support 316 is then projected and engaged with the other receiving groove 314a of the second support 314 and the third support 316 is stably fixed to the second support 314 .
  • the length of the first anode plate 310 is minimum .
  • the second cathode plate 320 can control the length of the second cathode plate 320 in the same manner as the coupling structure of the first cathode plate 310 described above. Accordingly, the area of the variable cathode frame 300 can be effectively varied.
  • the protrusion 312a of the first support 312 is configured to move into the first support 312 in the above description, If the protrusion 312a is made of an elastic material, it can be coupled with the second support 314 without the receiving groove.
  • the protrusion 312a of the first support 312 is formed on the lower part of the first support 312 but the present invention is not limited thereto and may be formed on the side wall of the first support 312. [ The receiving groove 314a of the second support base 314 may be formed on the side wall of the second support base 314 to correspond to the second support base 314.
  • variable negative electrode plate 300 is configured to slidably couple the first support to the second support, thereby effectively controlling the size of the variable electrode frame.
  • FIG. 15 is a perspective view showing an electrolytic polishing apparatus having a variable electrode frame according to a fifth embodiment.
  • the electrolytic polishing apparatus includes an electrolytic bath 100 in which an electrolytic polishing object 200 and an accommodation space for containing an electrolytic solution are provided, And a variable cathode frame 300 disposed on one side.
  • the electrolytic bath 100 may be formed in a box shape having a receiving space therein.
  • the electrolytic bath 100 may include a cylindrical shape, a polygonal box, or a ring shape, but its shape is not limited.
  • the electrolytic solution may be filled in the electrolytic bath 100.
  • Electrolytic polishing object 200 can be accommodated in electrolytic bath 100.
  • the size of the electrolytic bath 100 may be larger than that of the electrolytic polishing object 200.
  • the electrolytic polishing object may be a polygonal or cylindrical chamber or tank.
  • Electrolytic abrasive article 200 may be a chamber for OLED manufacturing. Further, the electrolytic polishing object 200 may be a component part of the OLED chamber.
  • a rectifier may further be disposed on one side of the electrolytic bath 200.
  • the rectifier can apply a voltage of positive (+) to the subject of electrolytic polishing and can apply a negative (-) voltage to the negative plate 300.
  • the rectifier may be electrically connected to the electrolytic polishing object 200 by electric wires or the like.
  • the variable cathode frame 300 may include a grid-like plate shape.
  • the variable cathode frame 300 may be made of copper, aluminum, or stainless steel, which is excellent in electrical conductivity and acid resistance, but is not limited thereto.
  • the variable cathode frame 300 may be a bar shape, an L shape, an angular shape, a bar shape, a round shape, a wire mesh shape, or an expanded shape plate.
  • the variable cathode frame 300 may include a first cathode plate 310 and a second cathode plate 320.
  • the first cathode plate 310 and the second cathode plate 320 may be arranged in a lattice structure.
  • the first cathode plate 310 and the second cathode plate 320 may be disposed at an angle of 90 degrees, but the present invention is not limited thereto.
  • the first cathode plate 310 and the second cathode plate 320 may be formed of a plurality of supports, respectively, so that the length thereof may be increased or decreased.
  • the structure of the variable cathode frame 300 may be a structure according to the fourth embodiment or the modification described above.
  • the electrolytic polishing object 200 in the fifth embodiment may include a plurality of regions having different areas.
  • the electrolytic polishing object 200 includes a first region 210 having a first area, a second region 230 having an area smaller than that of the first region 210 and a second region 230 having a smaller area than the second region 230
  • the third region 250 may include a fourth region 270 having an area smaller than that of the third region 250.
  • the first variable electrode frame 300a may be provided in the first region 210 of the electrolytic polishing object 200.
  • the first variable electrode frame 300a may be disposed in the first region 210 by adjusting the lengths of the first and second cathode plates.
  • the first variable electrode frame 300a may be disposed so as to be spaced apart from the polishing surface of the electrolytic polishing object 200.
  • the first variable electrode frame 300a may be supported by a tapped hole formed in the electrolytic polishing object 200 or a separate support so as to be spaced apart from the polishing surface of the electrolytic polishing object 200.
  • the second variable electrode frame 300b may be provided in the second region 230 of the electrolytic polishing object 200.
  • the second variable electrode frame 300b may be disposed in the second region 230 of the electrolytic polishing object 200 by adjusting the lengths of the first negative electrode plate and the second negative electrode plate.
  • the third variable electrode frame 300c may be provided in the third region 250 of the electrolytic polishing object 200. [ The third variable electrode frame 300c may be disposed in the third region 250 of the electrolytic polishing object 200 by adjusting the lengths of the first negative electrode plate and the second negative electrode plate.
  • a conductive connection plate 500 may be disposed between the first variable electrode frame 300a and the second variable electrode frame 300b.
  • the connection plate 500 can transmit the potential of the negative electrode applied to the first variable electrode frame 300a to the second variable electrode frame 300b.
  • the material of the connection plate 500 may be the same as that of the variable cathode frame 300.
  • the shape of the connection plate 500 may be any one of a bar shape, an L shape, an angular shape, a bar shape, a round shape, a wire mesh shape, and an expanded shape.
  • connection plate 500 can be disposed between the second variable electrode frame 300b and the third variable electrode frame 300c. Further, a connection plate 500 may be further formed between the first variable electrode frame 300a and the third variable electrode frame 300c. A plurality of connecting plates 500 may be disposed between the variable cathode frames 300.
  • the sub-cathode plate 600 may further be disposed in the fourth region 270 of the electrolytic polishing object 200.
  • the fourth region 270 of the electrolytic polishing object 200 may be a region protruding from the second region 230 of the electrolytic polishing object 200.
  • the fourth region 270 of the electrolytic polishing object 200 may include a narrow region formed in the electrolytic polishing object 200 or a hole formed therethrough.
  • the fourth region 270 of the electrolytic polishing object 200 may be formed to have a small size such that the variable cathode frame 300 can not be disposed.
  • the sub cathode plate 600 is not formed in a rectangular plate shape but can be formed of a rod-shaped plate.
  • the sub cathode plate 600 may be disposed so as to be spaced apart from the polishing surface of the fourth region 270 of the electrolytic polishing object 200.
  • the sub cathode plate 600 may be formed so that a part thereof has a curved line, but is not limited thereto.
  • the negative electrode plate 600 is effective in that the negative potential is transferred to effectively perform electrolytic polishing of the fourth region 270 of the electrolytic polishing object 200.
  • sub cathode plate 600 is disposed in the fourth region 270 of the electrolytic polishing object 200 in the above description, two or more sub cathode plates 600 may be disposed.
  • the electrolytic polishing apparatus has a plurality of electrically-connected variable electrode frames and auxiliary cathode plates arranged with different areas, thereby effectively electrolytically polishing the polished surface of the electropolished object having different areas .
  • the embodiment has the effect of shortening the assembling time of a plurality of cathode plates by providing the electrode bonding member at the corner portion of the electrolytic polishing object.
  • the electrode coupling member of the embodiment has the effect of more firmly fixing the negative electrode plates without a plurality of fixing members.
  • the embodiment has an effect that it is possible to easily attach the electrode joining member to the corner of the cramped electrolytic polishing object, thereby preventing the electrode joining member from being short-circuited with the electrolytic polishing object.
  • the electrode coupling member of the embodiment can be easily installed on the corner of the electrolytic polishing object having 90 degrees or more, and thus the corner portion of the electrolytic polishing object can be effectively electrolytically polished.
  • the electrode bonding member of the embodiment can effectively be installed even if the corner portion of the electrolytic polishing object does not have a vertex, thereby effectively carrying out electrolytic polishing of the corner portion of the electrolytic polishing object.
  • the embodiment has a technical effect that the anode plate is fixed firmly in advance in a state of excellent electric conductivity, and the cathode plate support is prepared, thereby providing excellent electric conductivity and excellent electrolytic polishing efficiency and polishing quality.
  • the embodiment has an effect that the clamp can be easily installed in a narrow space between the cathode frame and the electrolytic polishing object by further forming the insulating portion.
  • variable electrode frame of the embodiment is assembled to a size corresponding to the polishing surface of the electrolytic polishing object and disposed on the polishing surface of the electrolytic polishing object, thereby reducing the time and cost required for newly assembling or reassembling the negative electrode plate.
  • the embodiment can provide the variable electrode frame and the electrolytic polishing apparatus including the variable electrode frame, which can effectively perform electrolytic polishing even when the shape of the electrolytic polishing object is complicated.
  • variable electrode frame of the embodiment the first support member is slidably coupled to the second support member, thereby effectively controlling the size of the variable electrode frame.
  • the embodiment has the effect of effectively electrolytically polishing the polished surface of the electrolytic polishing object having different areas by disposing a plurality of electrically-connected variable electrode frames and auxiliary cathode plates on the polished surface having different areas and having different areas .

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

Un mode de réalisation concerne un cadre d'électrode pour polissage électrolytique, un cadre d'électrode variable et un appareil de polissage électrolytique le comprenant. Pour ce faire, le cadre d'électrode, selon le mode de réalisation, est un cadre d'électrode utilisé pour une cellule électrolytique dans lequel est disposé un espace de réception destiné à recevoir un objet faisant l'objet d'un polissage électrolytique et un électrolyte, le cadre d'électrode pouvant comprendre : un cadre de cathode espacé de l'objet faisant l'objet d'un polissage électrolytique et comprenant une première plaque de cathode dans une première direction, une deuxième plaque de cathode dans une deuxième direction, et une troisième plaque de cathode dans une troisième direction, la troisième direction étant différente de la première direction et de la deuxième direction ; et un élément de couplage d'électrode disposé au niveau d'une partie d'angle de l'objet faisant l'objet d'un polissage électrolytique et connectant les première à troisième plaques de cathode. L'élément de couplage d'électrode peut comprendre : un premier couplage de support à la première plaque de cathode ; un second couplage de support à la seconde plaque de cathode; et un troisième couplage de support à la troisième plaque de cathode.
PCT/KR2018/011550 2017-09-28 2018-09-28 Cadre d'électrode pour polissage électrolytique, cadre d'électrode variable pour polissage électrolytique et appareil de polissage électrolytique le comprenant Ceased WO2019066566A1 (fr)

Priority Applications (1)

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CN201880063208.4A CN111465722B (zh) 2017-09-28 2018-09-28 电解研磨用电极框架、电解研磨用可变型电极框架及包括其的电解研磨装置

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KR10-2017-0125738 2017-09-28
KR1020170125738A KR101848257B1 (ko) 2017-09-28 2017-09-28 전극 결합부재를 구비하는 전해연마용 전극 프레임 및 이를 포함하는 전해연마 장치
KR1020170125740A KR101848266B1 (ko) 2017-09-28 2017-09-28 전해연마용 가변형 전극 프레임 및 이를 포함하는 전해연마 장치
KR10-2017-0125740 2017-09-28

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CN111465722B (zh) 2022-07-12
TWI687557B (zh) 2020-03-11

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