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WO2019065064A1 - Capteur tactile, procédé de fabrication du capteur tactile et dispositif d'affichage d'image - Google Patents

Capteur tactile, procédé de fabrication du capteur tactile et dispositif d'affichage d'image Download PDF

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Publication number
WO2019065064A1
WO2019065064A1 PCT/JP2018/032098 JP2018032098W WO2019065064A1 WO 2019065064 A1 WO2019065064 A1 WO 2019065064A1 JP 2018032098 W JP2018032098 W JP 2018032098W WO 2019065064 A1 WO2019065064 A1 WO 2019065064A1
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WO
WIPO (PCT)
Prior art keywords
layer
transparent
refractive index
transparent layer
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2018/032098
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English (en)
Japanese (ja)
Inventor
豊岡　健太郎
陽平 有年
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to CN201880057775.9A priority Critical patent/CN111095182A/zh
Priority to JP2019544457A priority patent/JP6934950B2/ja
Publication of WO2019065064A1 publication Critical patent/WO2019065064A1/fr
Priority to US16/789,512 priority patent/US11106320B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G06F3/0418—Control or interface arrangements specially adapted for digitisers for error correction or compensation, e.g. based on parallax, calibration or alignment
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0448—Details of the electrode shape, e.g. for enhancing the detection of touches, for generating specific electric field shapes, for enhancing display quality
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present disclosure relates to a touch sensor and a method of manufacturing the touch sensor, and an image display device.
  • an input device (hereinafter, also referred to as a touch panel) capable of inputting information corresponding to an instruction image by touching a finger or a touch pen or the like has been widely used.
  • the touch panel includes resistive film type and capacitance type devices.
  • the capacitive touch panel has an advantage of being able to have a simple structure in which a translucent conductive film is formed on one substrate.
  • an electrode pattern is extended in a direction crossing each other, and a touch position is detected by capturing a change in capacitance generated when a conductor such as a human finger approaches.
  • An apparatus is known (see, for example, Patent Document 1).
  • the electrode pattern present inside the panel is visually recognized It may be damaged. Therefore, as a performance with respect to a touch panel, it is required that the concealability of the electrode pattern be good.
  • a first electrical wiring electrically connecting a plurality of first patterns having a first refractive index, and a plurality of second patterns having a second refractive index It is disclosed that the refractive index of the insulator disposed between the second electric wiring electrically connecting the two is substantially equal to the first refractive index and the second refractive index ( See, for example, Patent Document 2).
  • a plurality of first sensor electrodes provided along the first direction and a plurality of second sensor electrodes provided along the second direction intersecting the first direction on the substrate Electrically connecting a first bridge connecting the first sensor electrodes adjacent to each other, a second bridge connecting the second sensor electrodes adjacent to each other, the first bridge and the second bridge
  • an antireflective layer including a layer, and a sensor panel is disclosed (see, for example, Patent Document 3).
  • the pattern of the bridge portion is visually recognized by installing the bridge wiring through the high refractive index insulating film having a refractive index substantially equal to the refractive index of the electrode. It is expected to have the effect of preventing it from being possible. However, since it is formed to have a high refractive index as a whole, the difference in refractive index with a layer near the refractive index of 1.5 installed thereon is large. As a result, the electrode pattern is easy to see, and there is a problem that the pattern can not be concealed.
  • the refractive index of the insulator disposed between the first electrical wiring and the second electrical wiring is substantially equal to the refractive index of the first pattern and the refractive index of the second pattern.
  • the concealability of the electrode pattern is not satisfactory even by the method of equalizing to.
  • the concealability of the electrode pattern is insufficient and there is still room for improvement. ing.
  • a problem to be solved by an embodiment of the present invention is to provide a touch panel which suppresses the reflection of light in the bridge wiring and is excellent in the concealability of the wiring pattern including the bridge wiring.
  • a problem to be solved by another embodiment of the present invention is to provide a method for manufacturing a touch panel which suppresses reflection of light in a bridge wiring and is excellent in the concealability of a wiring pattern including the bridge wiring.
  • the problem to be solved by another embodiment of the present invention is to provide an image display device in which the visibility of a wiring pattern including a bridge wiring is improved.
  • a first electrode pattern and a second electrode pattern respectively extending in directions crossing each other on the same surface of the transparent substrate The first electrode pattern is a first wiring portion electrically connecting a plurality of first island-shaped electrode portions arranged at intervals in the first direction on the transparent substrate and the adjacent first island-shaped electrode portions.
  • the second electrode pattern bridges a plurality of second island-shaped electrode portions disposed on the transparent substrate at intervals in the second direction crossing the first direction, and the adjacent second island-shaped electrode portions.
  • the refractive index of a ⁇ 2> 3rd transparent layer is a touch sensor as described in ⁇ 1> larger 0.01 or more than the refractive index of a 4th transparent layer.
  • the ⁇ 3> 2nd wiring part is a touch sensor as described in ⁇ 1> or ⁇ 2> which is a transparent electrode.
  • a protective layer is provided on the first electrode pattern and the second electrode pattern,
  • the protective layer is a first transparent layer having a refractive index of 1.6 or more and a thickness of 200 nm or less on the second island-shaped electrode portion of the first electrode pattern and the second electrode pattern, and a refractive index
  • the touch sensor according to any one of ⁇ 1> to ⁇ 3>, having a second transparent layer having a thickness of less than 1.6 and a thickness of 0.5 ⁇ m or more in this order.
  • the refractive index of the ⁇ 5> 1st transparent layer is a touch sensor as described in ⁇ 4> larger 0.01 or more than the refractive index of a 2nd transparent layer.
  • ⁇ 6> The touch according to ⁇ 4> or ⁇ 5>, wherein the protective layer has a through hole, and the second wiring portion electrically connects a plurality of adjacent second island-like electrode portions through the through hole. It is a sensor.
  • the first transparent layer, the second transparent layer, the third transparent layer, and the fourth transparent layer are the transfer layers, and the touch sensor according to any one of ⁇ 4> to ⁇ 6>.
  • the first transparent layer has a refractive index of 1.6 to 1.9 and a thickness of 20 nm to 200 nm
  • the second transparent layer has a refractive index of 1.4 to less than 1.6
  • the touch sensor according to any one of ⁇ 4> to ⁇ 7> which has a thickness of 0.5 ⁇ m to 20 ⁇ m.
  • a sixth transparent layer having a thickness of 200 nm or less is provided between the second wiring portion and the third transparent layer, and the refractive index of the sixth transparent layer is smaller than the refractive index of the third transparent layer, The touch sensor according to any one of ⁇ 1> to ⁇ 9>.
  • ⁇ 11> The touch sensor according to ⁇ 10>, wherein the refractive index p of the sixth transparent layer is 1.6 or less.
  • the third transparent layer has a refractive index of 1.5 to 2.4 and a thickness of 10 nm to 100 nm
  • the fourth transparent layer has a refractive index of 1.4 to 1.6 and a thickness
  • the sixth transparent layer is the touch sensor according to ⁇ 11>, wherein the sixth transparent layer has a refractive index of 1.2 to 1.6 and a thickness of 10 nm to 100 nm.
  • the sixth transparent layer is a touch sensor according to any one of ⁇ 10> to ⁇ 12>, which is a transfer layer.
  • the third transparent layer has a refractive index of 1.5 to 1.75, a thickness of 20 nm to 300 nm, and the fourth transparent layer has a refractive index of 1.4 to 1.6, and a thickness
  • the touch sensor according to any one of ⁇ 1> to ⁇ 9>, wherein the thickness is 0.5 ⁇ m to 20 ⁇ m.
  • a fifth transparent layer having a refractive index of 1.6 or more and a thickness of 200 nm or less is provided between the transparent substrate and the first electrode pattern and the second electrode pattern ⁇ 1> It is a touch sensor according to any one of ⁇ 14>.
  • ⁇ 18> After forming the first transparent layer and forming the second transparent layer, and before forming the third transparent layer, Forming a sixth transparent layer having a thickness of 200 nm or less and a refractive index smaller than that of the third transparent layer by transferring the transfer layer of the transfer material onto the second wiring portion ⁇ 16> or ⁇ It is a manufacturing method of the touch sensor as described in 17>. ⁇ 19> The method for manufacturing a touch sensor according to ⁇ 18>, wherein the refractive index p of the third transparent layer is 1.6 or less. ⁇ 20> An image display device including the touch sensor according to any one of ⁇ 1> to ⁇ 15>.
  • a touch panel which suppresses the reflection of light in the bridge wiring and is excellent in the concealability of the wiring pattern including the bridge wiring.
  • a method of manufacturing a touch panel which suppresses the reflection of light by the bridge wiring and is excellent in the concealability of the wiring pattern including the bridge wiring.
  • an image display device is provided in which the visibility of a wiring pattern including a bridge wiring is improved.
  • FIG. 3 is a cross-sectional view taken along the line AA of FIG. It is a top view which shows the modification of the touch sensor by which the concealing layer was provided on the bridge wiring and the electrode pattern was made difficult to visually recognize. It is a top view which shows the other modification of the touch sensor by which the concealing layer was provided on the bridge wiring and the electrode pattern was made difficult to visually recognize. It is a top view which shows the other modification of the touch sensor by which the concealing layer was provided on the bridge wiring and the electrode pattern was made difficult to visually recognize. It is a top view which shows the other modification of the touch sensor by which the concealing layer was provided on the bridge wiring and the electrode pattern was made difficult to visually recognize.
  • a numerical range indicated by using “to” indicates a range including numerical values described before and after “to” as the minimum value and the maximum value, respectively.
  • the upper limit value or the lower limit value described in a certain numerical value range may be replaced with the upper limit value or the lower limit value of the other stepwise description numerical value range in the numerical value range described stepwise in the present disclosure.
  • the upper limit value or the lower limit value described in a certain numerical range may be replaced with the value shown in the example.
  • the amount of each component in the composition is the total amount of the plurality of substances present in the composition unless a plurality of substances corresponding to each component are present in the composition. means.
  • step in the present specification is not limited to an independent step, and may be referred to as the term if the intended purpose of the step is achieved, even if it can not be clearly distinguished from other steps. included.
  • transparent means that the average transmittance of visible light with a wavelength of 400 nm to 700 nm is 80% or more. Therefore, for example, the “transparent layer” refers to a layer having an average transmittance of 80% or more of visible light with a wavelength of 400 nm to 700 nm. It is preferable that the average transmittance
  • the average transmittance of visible light is a value measured using a spectrophotometer, and can be measured using, for example, a spectrophotometer U-3310 manufactured by Hitachi, Ltd.
  • the content ratio of each structural unit of the polymer is a molar ratio.
  • the refractive index is a value measured by ellipsometry at a wavelength of 550 nm, unless otherwise specified.
  • the touch sensor of the present disclosure includes a first electrode pattern and a second electrode pattern extending respectively in directions crossing each other on the same surface of the transparent substrate, and is disposed on the second wiring portion of the second electrode pattern.
  • a third transparent layer having a refractive index p of 1.5 or more and a thickness of 200 nm or less, and a fourth transparent layer having a refractive index lower than the refractive index p and a thickness of 0.5 ⁇ m or more Have in order.
  • the first electrode pattern is a first wiring portion electrically connecting a plurality of first island-shaped electrode portions arranged at intervals in the first direction on the transparent substrate and the adjacent first island-shaped electrode portions.
  • the second electrode pattern bridges a plurality of second island-shaped electrode portions disposed on the transparent substrate at intervals in the second direction crossing the first direction, and the adjacent second island-shaped electrode portions. And a second wiring portion electrically connected to each other.
  • a touch sensor is conventionally known in which an electrode pattern in which a plurality of electrode parts are electrically connected is arranged in two directions crossing each other on the same surface of a substrate, and the crossing part has a bridge structure. At the intersections, the electrode patterns tend to be easily visible, and in particular, the second electrode patterns connected and arranged in the other direction so as to bridge the first electrode patterns connected and arranged in one direction are conspicuous It is easy to damage the appearance of the panel.
  • the second electrode pattern is a metal electrode, the appearance is particularly likely to be impaired, but when the second electrode pattern is a transparent electrode such as metal oxide (eg, Indium Tin Oxide (ITO) etc.), the electrode is also an electrode. Pattern visibility has been considered inadequate.
  • the bridge wiring is installed through the high refractive index insulating film having a refractive index substantially equal to the refractive index of the electrode, It is not enough in terms of the concealability of the pattern.
  • the invention described in Patent Document 2 substantially equalizes the refractive index between the insulator and the patterns between the electrode wires connected to the first pattern and the second pattern, the concealing property of the pattern is obtained.
  • the layer of low refractive index and the layer of high refractive index are overlapped from the bridge structure side, the desired pattern concealability can not be obtained.
  • the touch sensor of the present disclosure In a base material with an electrode pattern provided with a first electrode pattern and a second electrode pattern respectively extending in mutually intersecting directions, the second island-like electrode portions adjacent to each other are bridged so as to straddle the first electrode pattern.
  • a high refractive index layer (third transparent layer) having a refractive index p of 1.5 or more and a thickness of 300 nm or less is disposed on the second wiring portion of the second electrode pattern, and By arranging a low refractive index layer (fourth transparent layer) having a refractive index lower than that of the high refractive index layer and having a thickness of 0.5 ⁇ m or more on top of the above, the concealability of the electrode pattern, particularly the bridge wiring is further enhanced It improves and the visibility is effectively improved.
  • FIG. 1 is a plan view showing a part of a touch sensor and showing a configuration example of a substrate with an electrode pattern of the touch sensor.
  • FIG. 2 is a top view which shows an example of the touch sensor which attached the concealing layer on the 2nd wiring part (bridge wiring), and was made into the state which the 1st wiring part and the 2nd wiring part were not visually recognized.
  • 3 is a cross-sectional view taken along the line AA of FIG.
  • the touch sensor 100 which is an embodiment of the present disclosure, first electrode patterns extending in the directions of arrows P or Q intersecting with each other on the transparent substrate 10.
  • a substrate with an electrode pattern on which the first and second electrode patterns 36 and 34 are disposed is provided.
  • a plurality of first island-shaped electrode portions 12 are arrayed in a wide range of the transparent substrate on the substrate with electrode pattern, and a plurality of first island-shaped arrayed in one direction (first direction P)
  • the electrode portions 12 are provided with first electrode patterns 34 which are connected to each other by the first wiring portion 16 and extend. As a result, a long electrode is formed in one direction on the surface of the transparent substrate.
  • a plurality of second island-shaped electrode portions in the other direction (second direction Q) orthogonal to the first direction over a wide range of the transparent substrate 14 are arranged, and adjacent second island-shaped electrode portions 14 are provided with second electrode patterns 36 which are connected to each other and extended by bridging the second wiring portions 18.
  • second direction Q second direction orthogonal to the first electrode pattern
  • the shielding layer 27 is formed in the region having the second wiring portion (bridge wiring) 18 intersecting the first wiring portion 16 and the first wiring portion 16 on the electrode pattern-attached base material. It is arranged.
  • the shielding layer 27 so as to cover the first wiring portion 16 and the second wiring portion 18, the first wiring portion 16 and the second wiring portion 18 are shielded by the shielding layer 27, and The structure is not visible from above.
  • a bridge wiring 18 is connected to the second island-shaped electrode portion 14 via the through hole 20.
  • FIG. 3 shows a cross-sectional view of the touch sensor taken along the line AA shown in FIG.
  • FIG. 3 is a schematic cross-sectional view showing a configuration example of a touch sensor.
  • the touch sensor 100 includes a transparent base 10, and the first electrode pattern 34 and the second electrode pattern 36 (hereinafter both are formed on the transparent base 10. It has a structure provided with a substrate with an electrode pattern by simply having "the electrode pattern" in some cases. As shown in FIG. 3, the first electrode pattern 34 and the second electrode pattern 36 on the electrode-patterned substrate form a bridge structure in which one of the crossing electrodes jumps over the other at the crossing portion, and they are mutually conductive. It does not have a structure.
  • the first electrode pattern 34 electrically connects a plurality of first island-shaped electrode portions 12 arranged at intervals in the first direction on the transparent substrate 10 with the adjacent first island-shaped electrode portions. And a wiring portion 16.
  • the refractive index of the first island-shaped electrode portion 12 and the first wiring portion 16 is preferably in the range of 1.75 to 2.1.
  • the material of the 1st island-like electrode part 12 There is no restriction
  • ITO indium tin oxide
  • AZO zinc oxide aluminum
  • IZO indium zinc oxide
  • the first island-like electrode portion 12 is, for example, a translucent metal oxide film such as an ITO film, an IZO film, a SiO 2 film, etc .; a metal such as Al, Zn, Cu, Fe, Ni, Cr, Mo, Ag, Au, etc.
  • the film may be an alloy film of a plurality of metals such as a copper-nickel alloy.
  • the thickness of the first island-shaped electrode portion 12 can be 10 nm to 200 nm.
  • the amorphous ITO film may be a polycrystalline ITO film by firing. In the case of forming a conductive pattern using an ITO film or the like, the description in paragraphs [0014] to [0016] and the like of Japanese Patent No. 4506785 can be referred to.
  • the shape of the first island-like electrode portion 12 is not particularly limited, and may be any of a square, a rectangle, a rhombus, a trapezoid, a pentagon or more polygon, etc.
  • the square, rhombus or hexagon has a close-packed structure Are preferred in that they are easy to form.
  • the first wiring portion 16 is not limited as long as the members can electrically connect the adjacent first island-shaped electrode portions 12 to each other.
  • the same material as that of the first island-shaped electrode portion 12 can be applied to the first wiring portion 16, and the thickness thereof is also the same.
  • the amorphous ITO film may be a polycrystalline ITO film by firing.
  • the second electrode pattern 36 includes a plurality of second island-shaped electrode portions 14 disposed on the transparent base material 10 at intervals in a second direction intersecting the first direction, and adjacent second island-shaped electrode portions. And a second wiring portion 18 electrically connected by bridging.
  • the refractive index of the second island-shaped electrode portion 14 and the first wiring portion 18 is preferably in the range of 1.75 to 2.1.
  • the second island-like electrode portion 14 is, for example, a translucent metal oxide film such as an ITO film, an IZO film, a SiO 2 film, etc .; a metal such as Al, Zn, Cu, Fe, Ni, Cr, Mo, Ag, Au, etc.
  • the film may be an alloy film of a plurality of metals such as a copper-nickel alloy.
  • the thickness of the second island-shaped electrode portion 14 can be 10 nm to 200 nm.
  • the amorphous ITO film may be a polycrystalline ITO film by firing.
  • the description in paragraphs [0014] to [0016] and the like of Japanese Patent No. 4506785 can be referred to.
  • the shape of the second island-shaped electrode portion 14 is not particularly limited, and may be any of a square, a rectangle, a rhombus, a trapezoid, a pentagon or more polygon, etc., and the square, rhombus or hexagon has a close packing structure Are preferred in that they are easy to form.
  • the second wiring portion (bridge wiring) 18 is not limited as long as the members can electrically connect the adjacent second island-shaped electrode portions 14 to each other.
  • the same material as the second island-shaped electrode portion 14 can be applied to the second wiring portion 18, and the thickness is also the same.
  • the amorphous ITO film may be a polycrystalline ITO film by firing.
  • the second wiring portion (bridge wiring) 18 is preferably a transparent electrode. By arranging as a transparent electrode, the visibility of the bridge wiring in the case of using a touch sensor is significantly reduced, and the effect of improving the appearance quality is high.
  • the first electrode pattern 34 and the second electrode pattern 36 in the touch sensor of the present disclosure preferably have a refractive index in the range of 1.75 to 2.1.
  • the transparent substrate 10 is preferably an electrically insulating substrate.
  • the electrically insulating substrate include a glass substrate, a PET (polyethylene terephthalate) film, a PC (polycarbonate) film, a COP (cycloolefin polymer) film, and a PVC (polyvinyl chloride) film.
  • a COP film is preferable in that it is excellent not only in optical isotropy but also in dimensional stability, and in turn, processing accuracy.
  • the transparent substrate is a glass substrate, the thickness may be 0.3 mm to 3 mm.
  • the transparent substrate 10 is a resin film, the thickness may be 20 ⁇ m to 3 mm.
  • the concealing layer 27 has a multilayer structure of two or more layers including the third transparent layer 22 and the fourth transparent layer 24, is provided on the second wiring portion (bridge wiring) 18, and the visibility of the second wiring portion 18 Can be improved.
  • the concealing layer 27 may be configured to have a two-layer structure, and from the viewpoint of enhancing the concealability of the second wiring portion 18, an embodiment configured to have a multilayer structure of three or more layers is preferable.
  • the concealing layer 27 is formed by overlapping three layers of the third transparent layer 22, the fourth transparent layer 24, and the sixth transparent layer 26. Details of the third transparent layer 22, the fourth transparent layer 24, and the sixth transparent layer 26 that form the concealing layer 27 will be described later.
  • the first transparent layer 28 As a protective layer on the first electrode pattern 34 and the second island-like electrode portion 14 of the second electrode pattern 36, the first transparent layer 28 having a thin thickness and a high refractive index, and a thickness lower than the first transparent layer 28
  • the second transparent layer 30 of the ratio is sequentially stacked from the electrode pattern side.
  • the first transparent layer 28 is disposed so as to cover the first electrode pattern 34 and the second electrode pattern 36, and the second transparent layer 30 is further disposed on the first transparent layer 28.
  • through holes 20 are formed in the protective layer provided by overlapping the first transparent layer 28 and the second transparent layer 30.
  • the second wiring portion (bridge wiring) 18 is connected to the second island-shaped electrode portion 14 exposed in the through hole 20 through the through hole, and adjacent to the second wiring portion 16 so as to cross the first wiring portion 16. Since the bridge wiring 18 is bridged between the electrode portions, the second island-shaped electrode portions are electrically connected.
  • the first wiring portion 16 of the first electrode pattern and the bridge wiring 18 of the second electrode pattern are separated by the protective layer as shown in FIG. .
  • the through holes can be formed by light irradiation and patterning through a mask for forming a desired through hole in the first transparent layer and the second transparent layer.
  • the hole diameter of the through hole is preferably smaller than the width of the second wiring portion.
  • the first transparent layer 28 is a layer having transparency, which has a refractive index of 1.6 or more and a thickness of 200 nm or less.
  • the refractive index of the first transparent layer is preferably 1.6 to 1.9, and more preferably 1.65 to 1.8.
  • the thickness of the first transparent layer is preferably 200 nm or less, more preferably 20 nm to 200 nm, still more preferably 40 nm to 200 nm, and particularly preferably 50 nm to 100 nm.
  • the first transparent layer preferably has a refractive index of 1.6 to 1.9, a thickness of 20 nm to 200 nm, a refractive index of 1.6 to 1.9, and The thickness is more preferably 40 nm to 200 nm.
  • the refractive index of the first transparent layer is preferably 0.01 or more larger than the refractive index of the second transparent layer described later.
  • the second transparent layer is stacked on the first transparent layer, and the refractive index of the layer decreases from the side closer to the electrode pattern to the side farther from the electrode pattern.
  • the electrode pattern is less likely to be visually recognized from the outside, and a touch sensor having an excellent appearance can be obtained.
  • the refractive index of the first transparent layer is preferably 0.10 or more larger than the refractive index of the second transparent layer described later for the same reason as described above, and 0.15 or more than the refractive index of the second transparent layer It is further preferred that the size is large.
  • the thickness of the first transparent layer is an average thickness measured using a transmission electron microscope (TEM). Specifically, a section of the touch panel is formed using an ultramicrotome, and a region of 5 mm in length of the cross section of the section is scanned by TEM to measure the thickness of the first transparent layer. Next, an arithmetic average of measured values of thickness at 20 places divided at equal intervals is determined, and this is taken as an average thickness.
  • TEM transmission electron microscope
  • the material is not particularly limited.
  • a metal oxide layer formed by sputtering may be used, or a cured layer formed by a curing reaction of a curing component in the first transparent transfer layer described later may be used.
  • the first transparent layer may be formed, for example, by transferring a first transparent transfer layer of a transfer material to be described later onto the first electrode pattern and the second electrode pattern, and may be a layer formed by a curing reaction. Details of the components forming the first transparent layer will be clarified through the description of the first transparent transfer layer in the transfer material described later.
  • the second transparent layer in the present disclosure is a layer having transparency, which has a refractive index of less than 1.6 and a thickness of 0.5 ⁇ m or more.
  • the refractive index of the second transparent layer is preferably 1.4 or more and less than 1.6, and more preferably 1.45 to 1.55.
  • the thickness of the second transparent layer is more preferably 0.5 ⁇ m to 20 ⁇ m, and still more preferably 1 ⁇ m to 10 ⁇ m.
  • the second transparent layer preferably has a thickness of 0.5 ⁇ m to 20 ⁇ m and a refractive index of 1.4 or more and less than 1.6.
  • the first transparent layer described above has a thickness of 20 nm to 200 nm, a refractive index of 1.6 to 1.9, and the second transparent layer has a thickness of 0.5 ⁇ m to 20 ⁇ m. It is more preferable that the refractive index is 1.4 or more and less than 1.6.
  • the thickness of the second transparent layer is an average thickness obtained by measuring the cross section of the laminate using a transmission electron microscope (TEM), and it is to be measured in the same manner as in the case of the above first transparent layer. Can.
  • TEM transmission electron microscope
  • the second transparent layer in the touch sensor of the present disclosure is preferably a cured layer formed by curing reaction of a curing component in a second transparent transfer layer described later.
  • the second transparent layer may be formed, for example, by transferring a second transparent transfer layer of a transfer material to be described later, and may be a layer formed by a curing reaction.
  • the second transparent layer is preferably a cured product of a composition containing an alkali-soluble resin, a polymerizable monomer, and a photopolymerization initiator.
  • the weight average molecular weight of the alkali-soluble resin is preferably 35,000 or less, more preferably 25,000 or less, and still more preferably 20,000 or less.
  • the content of the component derived from the alkali-soluble resin in the second transparent layer is preferably 30% by mass or more based on the solid content of the second transparent layer.
  • the content of the component derived from the alkali-soluble resin is preferably 30% by mass or more in view of forming a tapered shape.
  • the content of the component derived from the alkali-soluble resin is more preferably 40% by mass to 70% by mass with respect to the solid content of the second transparent layer.
  • an eighth transparent layer having a refractive index of 1.6 or more and a thickness of 40 nm to 200 nm between the second transparent layer 30 and the second wiring portion 18.
  • the eighth transparent layer preferably has a refractive index of 1.6 to 1.9, and more preferably 1.65 to 1.8.
  • the thickness of the eighth transparent layer is preferably 200 nm or less, more preferably 40 nm to 200 nm, and still more preferably 50 nm to 100 nm.
  • the eighth transparent layer preferably has a thickness of 40 nm to 200 nm and a refractive index of 1.6 to 1.9.
  • the thickness of the eighth transparent layer is an average thickness measured using a transmission electron microscope (TEM), and can be measured in the same manner as in the above first transparent layer.
  • TEM transmission electron microscope
  • the eighth transparent layer can be formed in the same manner as the first transparent layer, and is formed, for example, by transferring the eighth transparent resin layer of the transfer material having the eighth transparent resin layer on a temporary support. be able to.
  • the first transparent layer and the second transparent layer in the present disclosure are preferably provided as a transfer layer formed by transfer using a transfer material described later. If the layer is a transfer layer, each layer is easily formed with a uniform thickness, so that a stable refractive index can be obtained, and the shielding property of the electrode pattern using light interference becomes excellent.
  • the third transparent layer 22, the fourth transparent layer 24, and the sixth transparent layer 26 that form the concealing layer 27 disposed on the second wiring portion 18 will be described.
  • the third transparent layer 22, the fourth transparent layer 24, and the sixth transparent layer will be described with reference to FIG. 3 as the structure of the shielding layer for improving the visibility of the second wiring portion.
  • a description will be made centering on the aspect in which 26 is disposed.
  • the structure of the concealing layer on the second wiring portion may be another aspect, and as another embodiment of the present invention, two layers of the third transparent layer 22 and the fourth transparent layer 24 are provided. It is also good.
  • the third transparent layer 22 is selectively disposed in a region including the first wiring portion and the second wiring portion, and the fourth transparent layer 22 has a lower refractive index than the third transparent layer described later.
  • the concealing action of the second wiring portion bridge wiring
  • the third transparent layer in the present disclosure has a refractive index p of 1.5 or more and a thickness of 300 nm or less.
  • the third transparent layer in the present disclosure has a preferable refractive index according to the layer structure on the second wiring portion, and is preferably controlled in the following range. That is, in the touch sensor shown in FIG. 3 which is an embodiment of the present invention, the sixth transparent layer 26, the third transparent layer 22, and the fourth transparent layer 24 are formed on the second wiring portion (bridge wiring) 18.
  • a concealing layer consisting of three layers is provided.
  • the aspect in which the concealing layer is configured to have a multilayer structure of three or more layers is preferable in that the concealability of the second wiring portion 18 can be enhanced and the visibility can be effectively improved.
  • the refractive index p of the third transparent layer is preferably 1.5 to 2.4, and is 1.7 to 2.35. Is more preferred.
  • the concealing layer provided on the bridge wiring may have a two-layer structure.
  • the refractive index p of the third transparent layer is 1 It is preferably from 5-1 to 1.75, more preferably from 1.65 to 1.7.
  • the 3rd transparent layer in this indication has thickness preferable according to the layer structure on a 2nd wiring part, and is controlled in the following range. That is, as described above, a mode in which the three-layered concealing layer of the sixth transparent layer 26, the third transparent layer 22, and the fourth transparent layer 24 is provided on the second wiring portion (bridge wiring) 18
  • the thickness of the third transparent layer is preferably 10 nm to 100 nm, and more preferably 10 nm to 50 nm. Further, as described above, for example, in FIG.
  • the third transparent layer is 300 nm or less, more preferably 20 nm to 300 nm, and still more preferably 50 nm to 80 nm.
  • the third transparent layer has a refractive index p of 1.5 to 2.4.
  • the thickness is preferably 10 nm to 100 nm, the refractive index p is 1.7 to 2.35, and the thickness is more preferably 10 nm to 50 nm.
  • the third transparent layer preferably has a refractive index p of 1.5 to 1.75 and a thickness of 20 nm to 300 nm, The ratio p is more preferably 1.65 to 1.7 and the thickness is 50 nm to 80 nm.
  • the thickness of the third transparent layer is an average thickness measured using a transmission electron microscope (TEM), and can be measured in the same manner as in the above first transparent layer.
  • TEM transmission electron microscope
  • the material of the third transparent layer is not particularly limited as long as it is a transparent film having a refractive index p of 1.5 or more and a thickness of 300 nm or less.
  • a metal oxide layer formed by a vacuum evaporation method or a sputtering method may be used, or a cured layer formed by curing reaction of a curing component in the third transparent transfer layer described later may be used. .
  • the third transparent layer may be formed, for example, by transferring a third transparent transfer layer of a transfer material to be described later onto at least the second wiring portion 18 of the second electrode pattern, and may be a layer formed by a curing reaction. The details of the components forming the third transparent layer will be clarified through the description of the first transparent transfer layer in the transfer material described later.
  • the refractive index of the third transparent layer is preferably 0.01 or more greater than the refractive index of the fourth transparent layer described later.
  • the fourth transparent layer is stacked on the third transparent layer, and the refractive index of the layer decreases from the side closer to the electrode pattern to the side farther from the electrode pattern.
  • the electrode pattern is less likely to be viewed from the outside, and a touch sensor having a good appearance can be obtained.
  • the refractive index of the third transparent layer is preferably 0.07 or more larger than the refractive index of the fourth transparent layer described later for the same reason as described above, and 0.15 or more than the refractive index of the second transparent layer It is further preferred that the size is large.
  • the fourth transparent layer 24 is selectively disposed in a desired region including the first wiring portion and the second wiring portion as shown in FIGS. 1 to 3, and has a third transparent having a refractive index higher than that of the fourth transparent layer 24.
  • an interference action of light is caused to hide the second wiring portion, and the visibility of the second wiring portion is dramatically improved. Thereby, the visibility from the outside of the second wiring portion which is easily visible in the electrode pattern can be dramatically improved.
  • the fourth transparent layer in the present disclosure is a transparency having a refractive index lower than the refractive index p of the third transparent layer and a thickness of 0.5 ⁇ m or more.
  • the refractive index of the fourth transparent layer is preferably 1.4 to 1.6, and more preferably 1.45 to 1.55.
  • the thickness of the fourth transparent layer is preferably 0.5 ⁇ m or more, more preferably 0.5 ⁇ m to 20 ⁇ m, and still more preferably 1 ⁇ m to 10 ⁇ m.
  • the fourth transparent layer preferably has a refractive index of 1.4 to 1.6 and a thickness of 0.5 ⁇ m to 20 ⁇ m.
  • the third transparent layer 26, the third transparent layer 22, and the third transparent layer 24 have three layers on the bridge wiring 18, and the third transparent layer has a refractive index an embodiment in which p is 1.5 to 2.4, thickness is 10 nm to 100 nm, and the fourth transparent layer has a refractive index of 1.4 to 1.6 and a thickness of 0.5 ⁇ m to 20 ⁇ m More preferable, Furthermore, it has three layers of the sixth transparent layer 26, the third transparent layer 22, and the fourth transparent layer 24 on the bridge wiring 18, and the third transparent layer has a refractive index p of 1.7 to 2. It is preferable that the fourth transparent layer has a refractive index of 1.45 to 1.55 and a thickness of 1 ⁇ m to 10 ⁇ m.
  • the thickness of the fourth transparent layer is an average thickness measured using a transmission electron microscope (TEM), and can be measured in the same manner as in the above first transparent layer.
  • TEM transmission electron microscope
  • the fourth transparent layer in the touch sensor of the present disclosure is preferably a cured layer formed by curing reaction of a curing component in a fourth transparent transfer layer described later.
  • the fourth transparent layer may be formed, for example, by transferring a second transparent transfer layer of a transfer material to be described later, and may be a layer formed by a curing reaction.
  • the details of the components forming the fourth transparent layer will be clarified through the description of the fourth transparent transfer layer in the transfer material described later, including an alkali-soluble resin, a polymerizable monomer, and a photopolymerization initiator.
  • the fourth transparent layer is preferably a cured product of a composition containing an alkali-soluble resin, a polymerizable monomer, and a photopolymerization initiator.
  • the weight average molecular weight of the alkali-soluble resin is preferably 35,000 or less, more preferably 25,000 or less, and still more preferably 20,000 or less.
  • the content of the component derived from the alkali-soluble resin in the fourth transparent layer is preferably 30% by mass or more based on the solid content of the fourth transparent layer.
  • the content of the component derived from the alkali-soluble resin is preferably 30% by mass or more in view of forming a tapered shape.
  • the content of the component derived from the alkali-soluble resin is more preferably 40% by mass to 70% by mass with respect to the solid content of the fourth transparent layer.
  • the third transparent layer and the fourth transparent layer in the present disclosure are preferably provided as a transfer layer formed by transfer using a transfer material described later. If the layer is a transfer layer, each layer is easily formed with a uniform thickness, so that a stable refractive index can be obtained, and the shielding property of the electrode pattern using light interference becomes excellent.
  • the sixth transparent layer 26 is disposed between the second wiring portion 18 and the third transparent layer having a refractive index higher than that of the fourth transparent layer as a low refractive index layer having a refractive index lower than that of the third transparent layer. There is.
  • a laminated structure of low refractive index layer / high refractive index layer / low refractive index layer is provided from the observation surface side far from the second wiring portion, and the visibility of the second wiring portion The improvement effect of is high.
  • the sixth transparent layer has a thickness of 200 nm or less.
  • the thickness of the sixth transparent layer is preferably 10 nm to 100 nm, more preferably 10 nm to 50 nm, and still more preferably 10 nm to 30 nm.
  • the refractive index of the sixth transparent layer is preferably smaller than the refractive index of the third transparent layer, and the refractive index is preferably 1.6 or less.
  • the refractive index of the sixth transparent layer is preferably 1.2 to 1.6, more preferably 1.3 to 1.5, and still more preferably 1.4 to 1.5. .
  • it is preferable that the sixth transparent layer has a refractive index of 1.3 to 1.5 and a thickness of 10 nm to 50 nm.
  • the thickness of the sixth transparent layer is an average thickness measured using a transmission electron microscope (TEM), and can be measured in the same manner as in the above first transparent layer.
  • TEM transmission electron microscope
  • the sixth transparent layer is a low refractive index layer having a refractive index lower than that of the third transparent layer (preferably, a low refractive index layer having a refractive index of 1.6 or less and a thickness of 200 nm or less).
  • the material forming the sixth transparent layer can be, for example, a metal oxide layer formed by a vacuum evaporation method or a sputtering method, and even if a cured layer formed by curing reaction of a curing component in the sixth transparent transfer layer described later is used. Good.
  • the sixth transparent layer is formed, for example, by transferring a sixth transparent transfer layer of a transfer material to be described later onto at least the second wiring portion 18 of the second electrode pattern, and the second wiring portion 18 and the third transparent layer 22 It is preferable that it is a transfer layer disposed between them, and it may be a layer formed by curing reaction. The details of the components forming the sixth transparent layer will be clarified through the description of the sixth transparent transfer layer (excluding particles) in the transfer material described later.
  • the particles contained in the sixth transparent layer are preferably particles giving a low refractive index, inorganic oxide particles having a refractive index of 1.6 or less (preferably 1.5 or less) are preferable, and SiO 2 or the like is preferable.
  • the third transparent layer, the fourth transparent layer, and the sixth transparent layer have the following relationship. That is, the third transparent layer has a refractive index of 1.5 to 2.4 and a thickness of 10 nm to 100 nm, and the fourth transparent layer has a refractive index of 1.4 to 1.6 and a thickness of The sixth transparent layer has a refractive index of 1.2 to 1.6 and a thickness of 10 nm to 100 nm. Thereby, the reflectance of the bridge wiring can be effectively suppressed, and the concealability of the wiring pattern including the bridge wiring can be further enhanced.
  • the touch sensor shown in FIG. 3 is a transparent layer on the side opposite to the side in contact with the third transparent layer 22 of the fourth transparent layer 24 for planarizing the upper surface of the substrate with electrode pattern .
  • Overcoat layer 40 is disposed. Similar to the fourth transparent layer 24, the overcoat layer 40 is preferably a layer having a refractive index of 1.4 to 1.6, and is a layer having a refractive index of 1.45 to 1.55. More preferable.
  • the thickness of the overcoat layer 40 is not particularly limited, but is preferably 0.5 ⁇ m or more in thickness on the fourth transparent layer, and more preferably 0.5 ⁇ m to 20 ⁇ m.
  • the details of the components forming the overcoat layer 40 are the same as those of the fourth transparent layer, and will be clarified through the description of the fourth transparent transfer layer in the transfer material described later.
  • the overcoat layer 40 may be provided as a single fourth transparent layer including the fourth transparent layer 24. This point will be described in a modification described later.
  • a fifth transparent layer 32 is disposed between the transparent substrate 10 and the first electrode pattern 34 and the second electrode pattern 36.
  • the electrode pattern is sandwiched between the fifth transparent layer 32 and the first to fourth transparent layers and the sixth transparent layer, so that For example, in the case of using a film having a relatively high refractive index, such as an ITO film, the light reflectance of the electrode pattern can be reduced. Thereby, the visibility of the bridge wiring (second wiring portion) 18 in the touch sensor is effectively improved, the bridge wiring is concealed, and the appearance becomes excellent.
  • a 5th transparent layer is a high refractive index layer whose refractive index is 1.6 or more from said reason.
  • the refractive index of the fifth transparent layer is preferably 1.6 to 1.9, more preferably 1.6 to 1.7, and further preferably 1.6 to 1.65. preferable.
  • the thickness of the fifth transparent layer is preferably 200 nm or less, more preferably 40 nm to 200 nm, and still more preferably 50 nm to 100 nm.
  • the fifth transparent layer preferably has a refractive index of 1.6 or more and a thickness of 200 nm or less, a refractive index of 1.6 to 1.7, and a thickness of 50 nm. More preferably, it is -100 nm.
  • the transparent substrate on which the fifth transparent layer is formed is used as the transparent substrate. It is also good.
  • the thickness of the fifth transparent layer is an average thickness measured using a transmission electron microscope (TEM), and can be measured in the same manner as in the above first transparent layer.
  • TEM transmission electron microscope
  • the material forming the fifth transparent layer is used.
  • the material forming the fifth transparent layer is used.
  • the fifth transparent layer may use a cured layer formed by curing reaction of a curing component in a fifth transparent transfer layer described later.
  • the fifth transparent layer is, for example, preferably a transfer layer disposed by transferring a fifth transparent transfer layer of a transfer material to be described later onto the transparent substrate 10, and may be a layer formed by a curing reaction. The details of the components forming the fifth transparent layer will be clarified through the description of the fifth transparent transfer layer in the transfer material described later.
  • the first electrode pattern and the second electrode pattern of the electrode pattern-provided base are provided on the electrode pattern-provided base instead of the fourth transparent layer 24 of FIG. It is the aspect by which the 4th transparent layer 124 which covers the whole surface of the side which is made is arrange
  • the fourth transparent layer disposed on the third transparent layer is provided to improve the visibility of the bridge wiring 18, and therefore, in consideration of conditions such as the product shape and the manufacturing process.
  • the overcoat layer 40 of FIG. 3 may not be provided, and may be disposed so as to cover at least the bridge wiring 18. However, in some cases, as shown in FIG.
  • an overcoat layer 40 is disposed as a planarization layer in order to planarize the surface of the electrode patterned substrate.
  • the overcoat layer 40 in FIG. 3 has a refractive index close to that of the fourth transparent layer 24, there is no need to provide both layers as separate layers, and as shown in FIG. It may be formed as a single layer which doubles as an overcoat layer. This can improve the production suitability.
  • the touch sensor 300 further has a refractive index of 1.5 or less and a thickness between the first transparent layer 28 and the first electrode pattern 34 and the second electrode pattern 36. It is an aspect in which the seventh transparent layer 42 which is 200 nm or less is disposed.
  • the seventh transparent layer is preferably a low refractive index layer having a refractive index of 1.5 or less. For example, when a film having a relatively high refractive index, such as an ITO film, is used, the refractive index is 1.6.
  • a low refractive index layer having a refractive index lower than that of the first transparent layer is disposed between the first transparent layer and the first electrode pattern 34 and the second electrode pattern 36 described above.
  • the laminated structure of low refractive index layer / high refractive index layer / low refractive index layer is disposed on the first electrode pattern 34 and the second electrode pattern 36, and as a result, the reflectance of the electrode pattern is further reduced.
  • the touch sensor 400 is an aspect in which the second wiring portion (bridge wiring) 18 bridging the plurality of second island-shaped electrode portions of the second electrode pattern is accommodated in the through hole.
  • the third transparent layer and the fourth transparent layer are disposed at a position covering at least the bridge wiring 18, so as shown in FIG. , And the third transparent layer 122 and the fourth transparent layer 224 may be provided.
  • the detection method in the touch sensor of the present disclosure may be any of known methods such as a resistive film method, a capacitance method, an ultrasonic method, an electromagnetic induction method, and an optical method.
  • the capacitance method is preferable.
  • a so-called in-cell type for example, those shown in FIG. 5, FIG. 6, FIG. 7, and FIG. 8 of JP-A-2012-517051
  • a so-called on-cell type for example, JP-A 2013- One described in FIG. 19 of 168125, one described in FIG. 1 and FIG.
  • JP 2012-89102 A OGS (One Glass Solution) type
  • TOL (Touch-on-Lens) type for example, JP-A-2013-54727 (FIG. 2)
  • other configurations eg, JP-A-2013-164871 described in FIG. 6
  • various out-cell types so-called GG, G1 ⁇ G2, GFF, GF2, GF1, G1F etc. can be mentioned.
  • the touch sensor of the present disclosure can be manufactured by selecting any method as long as it can be manufactured into the above-described structure, and is preferably manufactured by the method of manufacturing the touch sensor of the present disclosure described below. That is, the touch sensor of the present disclosure preferably includes a substrate with an electrode pattern provided with a first electrode pattern and a second electrode pattern respectively extending in mutually intersecting directions on the same surface of a transparent substrate.
  • a high refractive index layer (third transparent layer) having a refractive index p of 1.50 or more and a thickness of 200 nm or less is formed.
  • An electrode pattern is formed by overlapping and arranging a low refractive index layer (fourth transparent layer) having a refractive index lower than that of the high refractive index layer and having a thickness of 0.5 ⁇ m or more on the high refractive index layer.
  • the refractive index is 1.6 or more by transferring the transfer layer of the transfer material onto the electrode patterned substrate. And forming a first transparent layer having a thickness of 200 nm or less (hereinafter, also referred to as a first transparent layer forming step), and refraction by transfer of a transfer layer of a transfer material onto a substrate with an electrode pattern. Forming a second transparent layer having a ratio of less than 1.6 and a thickness of 0.5 ⁇ m or more (hereinafter, also referred to as a second transparent layer forming step).
  • a first electrode pattern having a plurality of first island-shaped electrode portions and a second electrode pattern having a plurality of second island-shaped electrode portions Since a thin high refractive index layer and a low refractive index layer having a lower refractive index and thicker than the high refractive index layer are stacked on top of each other, the concealability of the electrode pattern is further improved. . Thereby, the visibility of the electrode pattern in the whole touch sensor is dramatically improved. And since formation of each transparent layer is performed by the transfer method using a transfer material, uniform thickness is obtained and adhesiveness improves. Thereby, a layered product excellent in the concealability of the 1st electrode pattern and the 2nd electrode pattern is obtained.
  • the refractive index of the sixth transparent layer is preferably smaller than the refractive index of the third transparent layer.
  • the second wiring portion has a laminated structure of low refractive index layer / high refractive index layer / low refractive index layer from the side of the observation surface of the touch sensor. Therefore, the visibility improvement effect of the second wiring portion is high. Further, since the sixth transparent layer is formed by a transfer method using a transfer material, a uniform thickness can be obtained and the adhesion can be improved. Thereby, a laminate excellent in the concealability of the bridge wiring can be obtained.
  • the method of manufacturing a touch sensor according to the present disclosure uses the transfer material having the third transparent transfer layer and the transfer material having the fourth transparent transfer layer when transferring and forming the third transparent layer and the fourth transparent layer.
  • the embodiment may be formed by sequentially transferring the transparent layer and the fourth transparent layer.
  • the third transparent layer and the fourth transparent layer may be collectively transferred and formed using a transfer material having the third transparent transfer layer and the fourth transparent transfer layer.
  • an aspect in which the third transparent layer and the fourth transparent layer are collectively transferred using the transfer material having the third transparent transfer layer and the fourth transparent transfer layer from the viewpoint of production efficiency. Is preferred.
  • the manufacturing method of the present disclosure is (I) A temporary support, a fourth transparent transfer layer having a refractive index lower than the refractive index p of the third transparent transfer layer and a thickness of 0.5 ⁇ m or more from the temporary support side, and a refractive index p of 1.50
  • the third transparent transfer layer having a thickness of 200 nm or less and, if necessary, the refractive index smaller than the refractive index of the third transparent transfer layer (preferably, the refractive index is 1.6 or less) and the thickness
  • the fourth transparent transfer layer is a layer to be the fourth transparent layer of the touch sensor
  • the third transparent transfer layer is a layer to be the third transparent layer of the touch sensor.
  • the first transparent transfer layer is a layer to be a first transparent layer of the touch sensor
  • the second transparent transfer layer is a layer to be a second transparent layer of the touch sensor.
  • the material of the temporary support is not particularly limited as long as it has the strength and flexibility necessary for film formation. From the viewpoint of moldability and cost, a resin film is preferable.
  • the film used as a temporary support is preferably a film which is flexible and does not cause significant deformation, contraction or elongation under pressure or under pressure and heat. More specifically, examples of the temporary support include polyethylene terephthalate (PET) film, cellulose triacetate (TAC) film, polystyrene (PS) film, polycarbonate (PC) film, etc., and a biaxially stretched polyethylene terephthalate film preferable.
  • PET polyethylene terephthalate
  • TAC cellulose triacetate
  • PS polystyrene
  • PC polycarbonate
  • the appearance of the temporary support is not particularly limited, and may be a transparent film or a colored film.
  • colored films include resin films containing dyed silicon, alumina sol, chromium salts, zirconium salts and the like. Electrical conductivity can be imparted to the temporary support by the method described in JP-A-2005-221726, or the like.
  • the second transparent transfer layer, the first transparent transfer layer and the seventh transparent transfer layer, and the fourth transparent transfer layer, the third transparent transfer layer and the sixth transparent transfer layer will be described for the layer on the temporary support.
  • the layer formed by the curing reaction of the second transparent transfer layer is the second transparent layer
  • the layer formed by the curing reaction of the first transparent transfer layer is A layer which is a first transparent layer, in which the curing reaction of the fourth transparent transfer layer is a fourth transparent layer, and a layer in which a curing reaction of the third transparent transfer layer is a third transparent layer.
  • the layer formed by the curing reaction of the sixth transparent transfer layer is the sixth transparent layer
  • the layer formed by the curing reaction of the seventh transparent transfer layer is the seventh transparent layer.
  • the second transparent transfer layer is a layer to be the second transparent layer after transfer.
  • the second transparent transfer layer may be, for example, a layer containing at least a polymerizable monomer and a resin, or may be a layer which is cured by application of energy.
  • the second transparent transfer layer may further contain a polymerization initiator and a compound capable of reacting with the acid upon heating.
  • the second transparent transfer layer may be photocurable, thermosetting or thermosetting and photocurable. Among them, a thermosetting and photocurable composition is preferable from the viewpoint of further improving the reliability of the film. That is, the second transparent layer may be formed as follows.
  • the second transparent transfer layer is transferred to a transfer target by a transfer method using a transfer material having a second transparent transfer layer on a temporary support.
  • the transferred second transparent transfer layer is patterned by light irradiation.
  • the second transparent transfer layer after patterning is subjected to processing such as development.
  • the second transparent transfer layer in the present disclosure is preferably an alkali-soluble resin layer and is developable by a weakly alkaline aqueous solution.
  • the thickness of the second transparent transfer layer is preferably 1 ⁇ m to 20 ⁇ m, more preferably 2 ⁇ m to 15 ⁇ m, and more preferably 2 ⁇ m to 10 ⁇ m from the viewpoint of transparency. More preferable.
  • the second transparent transfer layer may be formed of a negative-working material containing a polymerizable monomer. In this case, the strength and reliability are excellent.
  • the second transparent transfer layer can contain at least one of resins.
  • the resin can function as a binder.
  • the resin contained in the second transparent transfer layer is preferably an alkali-soluble resin.
  • the alkali-soluble resin for example, a resin having an acid value of 60 mg KOH / g or more is preferable from the viewpoint of developability.
  • a resin having a carboxyl group is preferable from the viewpoint of easily forming a strong film by reacting with a crosslinking component to be thermally crosslinked.
  • an acrylic resin is preferable from the viewpoint of developability and transparency.
  • the acrylic resin is a resin having a structural unit derived from at least one of (meth) acrylic acid and (meth) acrylic acid ester.
  • the acid value of the alkali-soluble resin is not particularly limited, but a carboxyl group-containing acrylic resin having an acid value of 60 mg KOH / g or more is preferable.
  • the carboxyl group-containing acrylic resin having an acid value of 60 mg KOH / g or more is not particularly limited as long as it satisfies the above-mentioned acid value, and can be appropriately selected from known resins.
  • a carboxyl group-containing acrylic resin having an acid value of 60 mg KOH / g or more and the polymers described in paragraph 0033 to 0052 of JP-A-2010-237589
  • carboxyl group-containing acrylic resins having an acid value of 60 mg KOH / g or more are examples of 60 mg KOH / g or more.
  • the preferred range of the copolymerization ratio of the monomer having a carboxyl group in the alkali-soluble resin is 5% by mass to 50% by mass, more preferably 5% by mass to 40% by mass, based on 100% by mass of the alkali-soluble resin Preferably, it is in the range of 20% by mass to 30% by mass.
  • the polymer shown below is preferable.
  • the content ratio of each structural unit shown below can be suitably changed according to the objective.
  • the acid value of the alkali-soluble resin is preferably 60 mg KOH / g to 200 mg KOH / g, more preferably 60 mg KOH / g to 150 mg KOH / g, and 60 mg KOH / g to 110 mg KOH / g. Is more preferred.
  • the acid value of the resin is a value measured by the titration method defined in JIS K 0070 (1992).
  • the second transparent transfer layer and the first transparent transfer layer described later both contain an acrylic resin, the interlayer adhesion between the second transparent transfer layer and the first transparent transfer layer can be enhanced.
  • the upper limit value of the weight average molecular weight of the alkali-soluble resin is not particularly limited, and may be 100,000.
  • the content of the resin is preferably in the range of 10% by mass to 80% by mass with respect to the total solid content of the second transparent transfer layer.
  • the range of 40% by mass to 60% by mass is more preferable.
  • the content of the resin is 80% by mass or less, the amount of monomers is not too small, and the crosslink density of the cured film is well maintained, and the hardness is excellent.
  • the content of the resin is 10% by mass or more, the film before curing does not become too soft, which is advantageous in terms of handling during the process.
  • the second transparent transfer layer in the present disclosure may contain a polymerizable monomer.
  • the polymerizable monomer preferably contains a polymerizable monomer having an ethylenically unsaturated group, and more preferably contains a photopolymerizable compound having an ethylenically unsaturated group.
  • the polymerizable monomer preferably has at least one ethylenically unsaturated group as a photopolymerizable group, and may have a cationically polymerizable group such as an epoxy group in addition to the ethylenically unsaturated group. .
  • a compound having a (meth) acryloyl group is preferable.
  • the second transparent transfer layer preferably contains, as polymerizable monomers, a compound having two ethylenically unsaturated groups and a compound having at least three ethylenically unsaturated groups, and a compound having two (meth) acryloyl groups It is more preferable to include a compound having at least three (meth) acryloyl groups.
  • the polymerizable monomer containing a carboxyl group is not particularly limited, and commercially available compounds can be used.
  • Examples of commercially available products preferably include, for example, Alonics TO-2349 (Toagosei Co., Ltd.), Alonix M-520 (Toagosei Co., Ltd.), Alonix M-510 (Toagosei Co., Ltd.) and the like.
  • the content in the case of containing a carboxyl group-containing polymerizable monomer is preferably in the range of 1% by mass to 50% by mass with respect to all the polymerizable monomers contained in the second transparent transfer layer, and 1% by mass. It is more preferable to use in the range of 30% by mass, and it is further preferable to use in the range of 5% by mass to 15% by mass.
  • the polymerizable monomer preferably contains a urethane (meth) acrylate compound. It is preferable that it is 10 mass% or more of all the polymerizable monomers contained in a 2nd transparent transfer layer, and, as for content in the case of containing a urethane (meth) acrylate compound, it is more preferable that it is 20 mass% or more.
  • the number of functional groups of the photopolymerizable group that is, the number of (meth) acryloyl groups in the urethane (meth) acrylate compound is preferably trifunctional or more, and more preferably tetrafunctional or more.
  • the polymerizable monomer having a difunctional ethylenically unsaturated group is not particularly limited as long as it is a compound having two ethylenically unsaturated groups in the molecule, and a commercially available (meth) acrylate compound can be used.
  • Examples of commercially available products include tricyclodecane dimethanol diacrylate (A-DCP Shin-Nakamura Chemical Co., Ltd.), tricyclodecane dimethanol dimethacrylate (DCP Shin-Nakamura Chemical Co., Ltd.), 1,9-nonane Preferred examples include diol diacrylate (A-NOD-N Shin-Nakamura Chemical Co., Ltd.) and 1,6-hexanediol diacrylate (A-HD-N Shin-Nakamura Chemical Co., Ltd.).
  • the polymerizable monomer having a trifunctional or more ethylenically unsaturated group is not particularly limited as long as it is a compound having three or more ethylenically unsaturated groups in the molecule, and, for example, dipentaerythritol (tri / tetra / penta / (Meth) acrylate compounds of skeletons such as hexa) acrylate, pentaerythritol (tri / tetra) acrylate, trimethylolpropane triacrylate, ditrimethylolpropane tetraacrylate, isocyanuric acid acrylate, glycerin triacrylate and the like can be used.
  • the polymerizable monomer preferably has a molecular weight of 200 to 3,000, more preferably 250 to 2,600, and particularly preferably 280 to 2,200.
  • the polymerizable monomers may be used alone or in combination of two or more. It is preferable to use two or more types of polymerizable monomers in that the film properties of the second transparent transfer layer can be controlled.
  • the polymerizable monomer contained in the second transparent transfer layer used a combination of a trifunctional or higher functional polymerizable monomer and a bifunctional polymerizable monomer to expose the second transparent transfer layer after transfer. It is preferable from the viewpoint of improving the subsequent film physical properties.
  • a bifunctional polymerizable monomer When a bifunctional polymerizable monomer is used, it is preferably used in a range of 10% by mass to 90% by mass, 20% by mass to 85% by mass, with respect to all the polymerizable monomers contained in the second transparent transfer layer. It is more preferable to use in the range, and it is further preferable to use in the range of 30% by mass to 80% by mass.
  • a trifunctional or higher polymerizable monomer it is preferably used in a range of 10% by mass to 90% by mass with respect to all the polymerizable monomers contained in the second transparent transfer layer, and is 15% by mass to 80%. It is more preferable to use in the range of mass%, and it is further preferable to use in the range of 20 mass% to 70 mass%.
  • the second transparent transfer layer may further contain various components according to the purpose, in addition to the resin and the polymerizable monomer.
  • optional components include a polymerization initiator and a compound that can react with an acid by heating.
  • the second transparent transfer layer preferably contains a polymerization initiator, and more preferably contains a photopolymerization initiator.
  • the second transparent transfer layer contains a polymerization initiator in addition to the resin and the polymerizable monomer, it becomes easy to form a pattern on the second transparent transfer layer.
  • Examples of the polymerization initiator include the photopolymerization initiators described in paragraphs 0031 to 0042 described in JP-A-2011-95716.
  • Examples of the photopolymerization initiator include 1,2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)] (trade name: IRGACURE OXE-01, BASF AG), Ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (0-acetyloxime) (trade name: IRGACURE OXE-02, BASF AG), 2 -(Dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone (trade name: IRGACURE 379EG, BASF AG), 2-methyl-1 -(4-Methylthiophenyl) -2
  • the content of the polymerization initiator relative to the solid content of the second transparent transfer layer is preferably 0.01% by mass or more, and 0.1% by mass or more. It is more preferable that Moreover, it is preferable that it is 10 mass% or less, and it is more preferable that it is 5 mass% or less. It is preferable at the point which can improve the pattern formation property in a transfer film, and adhesiveness with a to-be-transferred body more because content of a polymerization initiator is said range.
  • the second transparent transfer layer in the present disclosure can further contain at least one selected from a sensitizer and a polymerization inhibitor in order to adjust the curing sensitivity.
  • the second transparent transfer layer in the present disclosure can include a sensitizer.
  • the sensitizer has an effect of further improving the sensitivity to active radiation such as a sensitizing dye and a polymerization initiator contained in the second transparent transfer layer, or an effect of suppressing the polymerization inhibition of the polymerizable compound by oxygen.
  • sensitizers in the present disclosure include thiol and sulfide compounds, for example, thiol compounds described in JP-A-53-702, JP-B-55-500806, and JP-A-5-142772, JP-A-Hei. And the disulfide compounds described in JP-A-56-75643. More specifically, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2-mercapto-4 (3H) -quinazoline, ⁇ -mercaptonaphthalene and the like can be mentioned.
  • an amino acid compound such as N-phenylglycine, an organic metal compound described in JP-B-48-42965 (eg, tributyltin acetate etc.), JP-B-55-34414 And hydrogen compounds described in JP-A 6-308727 (eg, trithiane etc.).
  • the content of the sensitizer in the case where the second transparent transfer layer in the present disclosure contains a sensitizer is the second transparent transfer from the viewpoint that the curing rate is further improved due to the balance between the polymerization growth rate and the chain transfer.
  • the range of 0.01% by mass to 30% by mass is preferable, and the range of 0.05% by mass to 10% by mass is more preferable with respect to the total solid content of the layer.
  • the second transparent transfer layer in the present disclosure contains a sensitizer, it may contain only one type, or may contain two or more types.
  • the second transparent transfer layer in the present disclosure can include a polymerization inhibitor.
  • the polymerization inhibitor has the function of preventing undesired polymerization of the polymerizable monomer during production or storage.
  • polymerization inhibitors examples include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butyl catechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t -Butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), N-nitrosophenylhydroxyamine ceric acid salt, phenothiazine, phenoxazine and the like.
  • the addition amount of the polymerization inhibitor is preferably 0.01% by mass to 20% by mass with respect to the total solid content of the second transparent transfer layer.
  • the polymerization inhibitor may contain only one type, or may contain two or more types.
  • the second transparent transfer layer in the present disclosure may contain a compound capable of reacting with the acid upon heating.
  • the compound capable of reacting with the acid by heating is preferably a compound having a high reactivity with the acid after heating above 25 ° C., as compared with the reactivity with the acid at 25 ° C.
  • the compound capable of reacting with the acid upon heating is a compound having a group capable of reacting with the acid that has been temporarily inactivated by the blocking agent, and the group derived from the blocking agent dissociates at a predetermined dissociation temperature preferable.
  • Examples of the compound capable of reacting with the acid by heating include a carboxylic acid compound, an alcohol compound, an amine compound, a blocked isocyanate, an epoxy compound and the like, and a blocked isocyanate is preferable.
  • block isocyanate used for a transfer film commercially available block isocyanate can also be mentioned.
  • Takenate (registered trademark) B870N Mitsubishi Chemical Co., Ltd.
  • Duranate (registered trademark) MF-K60B which is a hexamethylene diisocyanate-based blocked isocyanate compound
  • TPA-B80E X3071. 04
  • the block isocyanate contained in the second transparent transfer layer preferably has a weight average molecular weight of 200 to 3,000, more preferably 250 to 2,600, and particularly preferably 280 to 2,200.
  • the content of blocked isocyanate is in the range of 1% by mass to 30% by mass with respect to the total solid content of the second transparent transfer layer from the viewpoint of handling property before the heating step after transfer and low moisture permeability after the heating step.
  • the range of 5% by mass to 20% by mass is more preferable.
  • the second transparent transfer layer preferably contains particles, and more preferably metal oxide particles from the viewpoint of refractive index and transparency.
  • the particles By including the particles, the refractive index and the light transmittance can be adjusted.
  • metal oxide particles There is no restriction
  • metal oxide particles usable in the first transparent transfer layer described later can be used in the second transparent transfer layer.
  • the metal oxide particles are more preferably zirconium oxide particles or silicon dioxide particles, and still more preferably silicon dioxide particles.
  • the second transparent transfer layer for example, surfactants described in paragraph 0017 of Japanese Patent No. 4502784, and paragraphs 0060 to 0071 of JP2009-237362A, and known fluorine
  • the surfactant includes the thermal polymerization inhibitor described in paragraph 0018 of Japanese Patent No. 4502784, and further, the other additives described in paragraphs 0058 to 0071 of JP-A-2000-310706.
  • Megafac (registered trademark) F551 (DIC Corporation) which is a known fluorine-based surfactant, may be mentioned.
  • the second transparent transfer layer is coated with a solution (referred to as a second transparent transfer layer-forming coating solution) in which a resin composition for forming a second transparent transfer layer containing at least a polymerizable monomer and a resin is dissolved in a solvent. And dried to form.
  • a solution referred to as a second transparent transfer layer-forming coating solution
  • the first transparent transfer layer is a layer to be the first transparent layer after transfer.
  • the first transparent transfer layer may be a layer containing metal oxide particles and a resin, or may be a layer which is cured by application of energy.
  • the first transparent transfer layer may be photocurable, thermosetting or thermosetting and photocurable. Among them, when the layer is a thermosetting and photocurable layer, the film can be easily formed.
  • the first transparent transfer layer When the first transparent transfer layer is formed of a negative-working material, the first transparent transfer layer may contain a polymerizable monomer and a polymerization initiator in addition to the metal oxide particles and the resin (preferably an alkali-soluble resin). Preferably, other additives may be included as required.
  • the refractive index of the first transparent transfer layer is preferably 1.60 to 2.00, more preferably 1.63 to 1.90, and still more preferably 1.65 to 1.80. .
  • the thickness of the first transparent transfer layer is preferably 20 nm to 200 nm, and more preferably 40 nm to 100 nm.
  • the method of controlling the refractive index of the first transparent transfer layer is not particularly limited, but a method of using a transparent resin layer having a desired refractive index alone, a transparent resin layer to which particles such as metal particles and metal oxide particles are added Or a method of using a complex of a metal salt and a polymer.
  • the first transparent transfer layer preferably contains a resin.
  • the resin may have a function as a binder.
  • an alkali soluble resin is preferable.
  • the details of the alkali-soluble resin are the same as the alkali-soluble resin in the second transparent transfer layer.
  • a resin having a structural unit derived from at least one of (meth) acrylic acid and (meth) acrylic acid ester ((meth) acrylic resin) is more preferable, and a structural unit derived from (meth) acrylic acid and More preferred is a (meth) acrylic resin having a structural unit derived from allyl (meth) acrylate.
  • ammonium salts of resins having an acid group can be mentioned as an example of a preferred resin.
  • the composition for forming a first transparent transfer layer may contain, as a curing component, an ammonium salt of a monomer having an acid group.
  • a coating liquid for forming a first transparent transfer layer containing a resin in which an acid-containing resin is dissolved in an aqueous ammonia solution and at least a part of the acid groups are ammonium-chlorinated It is preferred to include the step of preparing.
  • the resin having an acid group is a resin having solubility in an aqueous solvent (preferably, a mixed solvent of water or a lower alcohol having 1 to 3 carbon atoms and water), and is not particularly limited and is appropriately selected from known resins can do.
  • Preferred examples of the resin having an acid group include resins having a monovalent acid group (such as a carboxyl group).
  • the resin contained in the first transparent transfer layer is particularly preferably a resin having a carboxyl group.
  • the resin having an acid group is preferably an alkali-soluble resin.
  • the alkali-soluble resin is a linear organic high molecular weight polymer and can be appropriately selected from polymers having at least one group that promotes alkali solubility in the molecule.
  • Examples of the group that promotes alkali solubility, that is, an acid group include, for example, a carboxyl group, a phosphoric acid group, and a sulfonic acid group, and a carboxyl group is preferable.
  • an alkali soluble resin Preferably, the copolymer which contains the structural unit chosen from (meth) acrylic acid and styrene in a principal chain is mentioned.
  • the alkali-soluble resin is more preferably a resin which is soluble in an organic solvent and developable with a weak alkaline aqueous solution.
  • the resin having an acid group is preferably a (meth) acrylic resin having an acid group, and is preferably a copolymer resin of (meth) acrylic acid / vinyl compound, (meth) acrylic acid / ( Particularly preferred is a copolymer resin of allyl (meth) acrylate.
  • the first transparent transfer layer preferably contains, as a resin, a copolymer having a structural unit derived from (meth) acrylic acid and a structural unit derived from styrene, and a structural unit derived from (meth) acrylic acid, styrene It is more preferable to include a copolymer having a structural unit derived from and a structural unit derived from a (meth) acrylate having an ethyleneoxy chain.
  • the resin used for the first transparent transfer layer contains a copolymer having a structural unit derived from (meth) acrylic acid and a structural unit derived from styrene, and further a structural unit derived from (meth) acrylic acid derived from styrene
  • the film thickness uniformity at the time of forming a 1st transparent transfer layer becomes more favorable by including the copolymer which has a structural unit and the structural unit derived from the (meth) acrylic acid ester which has an ethylene oxy chain.
  • a commercially available product may be used as the resin having an acid group.
  • the commercial item of the resin having an acid group is not particularly limited, and can be appropriately selected according to the purpose.
  • As a commercial item of resin having an acid group for example, ARUFON (Alfon: registered trademark) UC3000, UC3510, UC3080, UC3920, UF5041 (all trade names) manufactured by Toagosei Co., Ltd., JONCRYL manufactured by BASF (registered trademark) Trademarks 67, JONCRYL 611, JONCRYL 678, JON CRYL 690, JON CRYL 819 (all trade names), etc. may be mentioned.
  • the resin having an acid group is preferably contained in an amount of 10% by mass to 80% by mass, more preferably 15% by mass to 65% by mass, and more preferably 20% by mass to 50% by mass with respect to the first transparent transfer layer. Being particularly preferred.
  • the first transparent transfer layer may further contain another resin having no acid group. There is no particular limitation on other resins having no acid group.
  • the first transparent transfer layer preferably contains metal oxide particles. By including metal oxide particles, the refractive index and the light transmittance can be adjusted.
  • the first transparent transfer layer can contain metal oxide particles in an arbitrary ratio depending on the resin used, the type and content of the polymerizable monomer, the type of metal oxide particles used, and the like.
  • the first transparent transfer layer is zirconium oxide particles (ZrO 2 particles), Nb 2 O 5 particles, titanium oxide particles from the viewpoint of transparency and controlling the refractive index within the range of the refractive index of the first transparent transfer layer. It is preferable to contain at least one of (TiO 2 particles) and silicon dioxide particles (SiO 2 particles).
  • the metal oxide particles in the first transparent transfer layer are more preferably zirconium oxide particles or titanium oxide particles, and more preferably zirconium oxide particles, in that the refractive index of the transfer layer can be easily adjusted to 1.6 or more.
  • Examples of the silicon dioxide particles include colloidal silica, fumed silica and the like, and as an example of a commercially available product marketed, Snowtex ST-N (colloidal silica: non-volatile content 20% by Nissan Chemical Industries, Ltd.) And Snowtex ST-C (colloidal silica; 20% nonvolatile content).
  • Examples of zirconium oxide particles include Nanouse OZ-S30M (methanol dispersion, 30.5% by mass of nonvolatile matter) manufactured by Nissan Chemical Industries, Ltd., SZR-CW (water dispersion manufactured by Sakai Chemical Industry Co., Ltd.) Examples thereof include 30% by mass of nonvolatile matter, and SZR-M (methanol dispersion, 30% by mass of nonvolatile matter).
  • titanium oxide particles examples include TS-020 (water dispersion, non-volatile content 25.6% by mass) manufactured by Tayca Co., Ltd., Titania Sol R (methanol dispersion, non-volatile content 32.1 manufactured by Nissan Chemical Industries, Ltd.) %) And the like.
  • the content of the zirconium oxide particles is preferably 1% by mass to 95% by mass, more preferably 20% by mass to 90% by mass, and more preferably 40% by mass to 85% by mass with respect to the total solid content of the first transparent transfer layer. % By mass is more preferred.
  • the content of the titanium particles is preferably 1% by mass to 95% by mass, more preferably 20% by mass to 90% by mass, and 40% by mass to 85% by mass with respect to the total solid content mass of the first transparent transfer layer. More preferable.
  • the refractive index of the metal oxide particles is preferably higher than the refractive index of the transparent film formed of the composition obtained by removing the metal oxide particles from the coating liquid for forming the first transparent transfer layer.
  • the first transparent transfer layer of the transfer film preferably contains metal oxide particles having a refractive index of 1.5 or more, and more preferably contains particles having a refractive index of 1.55 or more It is further preferable to contain particles having a refractive index of 1.7 or more, particularly preferably 1.9 or more particles, and most preferably 2 or more particles.
  • that the refractive index is 1.5 or more means that the average refractive index of light having a wavelength of 550 nm is 1.5 or more.
  • the average refractive index is a value obtained by dividing the sum of measured values of refractive index for light of wavelength 550 nm by the number of measurement points.
  • the average primary particle diameter of the metal oxide particles is preferably 100 nm or less, more preferably 50 nm or less, and still more preferably 20 nm or less from the viewpoint of optical performance such as haze.
  • the average primary particle size of the metal oxide particles is a value obtained by measuring the diameter of 100 arbitrary particles by observation with a transmission electron microscope (TEM) and calculating the arithmetic mean of 100 diameters.
  • the first transparent transfer layer may contain one kind of metal oxide particles alone, or may contain two or more kinds of metal oxide particles.
  • the content of the metal oxide particles in the first transparent transfer layer is preferably 1% by mass to 95% by mass, based on the total solid content of the first transparent transfer layer, regardless of the type of the metal oxide particles. % By mass to 90% by mass is more preferable, and 40% by mass to 85% by mass is more preferable. When the content of the metal oxide particles is in the range described above, the hiding property of the transparent electrode pattern after transfer is further improved.
  • the first transparent transfer layer can contain other components in addition to the resin and the metal oxide particles.
  • the first transparent transfer layer preferably contains a metal oxidation inhibitor.
  • the metal oxidation inhibitor is preferably a compound having an aromatic ring containing a nitrogen atom in the molecule.
  • at least an aromatic ring containing the above nitrogen atom is selected from the group consisting of an imidazole ring, a triazole ring, a tetrazole ring, a thiadiazole ring, and a fused ring thereof with other aromatic rings.
  • the aromatic ring containing the said nitrogen atom is an imidazole ring or a fused ring of an imidazole ring and another aromatic ring.
  • the other aromatic ring may be a carbocyclic ring or a heterocyclic ring, but is preferably a carbocyclic ring, more preferably a benzene ring or a naphthalene ring, and still more preferably a benzene ring.
  • the metal oxidation inhibitor examples include imidazole, benzimidazole, tetrazole, mercaptothiadiazole and benzotriazole, and imidazole, benzimidazole and benzotriazole are more preferable.
  • a commercial item may be used as a metal oxidation inhibitor, for example, Johoku Chemical Industry Co., Ltd. which contains benzotriazole, BT120 etc. can be used preferably.
  • the content of the metal oxidation inhibitor is preferably 0.1% by mass to 20% by mass, and more preferably 0.5% by mass to 10% by mass with respect to the total mass of the first transparent transfer layer. More preferably, it is more preferably 1% by mass to 5% by mass.
  • the first transparent transfer layer contains a polymerizable monomer such as a polymerizable monomer or a thermally polymerizable monomer from the viewpoint of curing to enhance the strength and the like of the film.
  • the first transparent transfer layer may contain only the above-mentioned monomer having an acid group as a polymerizable monomer.
  • the polymerizable monomer used in the first transparent transfer layer the polymerizable compounds described in paragraphs 0023 to 0024 of Japanese Patent No. 4098550 can be used.
  • pentaerythritol tetraacrylate, pentaerythritol triacrylate, and tetraacrylate of pentaerythritol ethylene oxide adduct can be preferably used.
  • These polymerizable monomers may be used alone or in combination of two or more.
  • the proportion of pentaerythritol triacrylate is preferably 0% to 80% by mass, and more preferably 10% to 60%.
  • a water-soluble polymerizable monomer represented by the following structural formula 1 a pentaerythritol tetraacrylate mixture (NK ester A-TMMT: Shin-Nakamura Chemical Co., Ltd.), an impurity (Containing about 10% of triacrylate), mixture of pentaerythritol tetraacrylate and triacrylate (NK ester A-TMM3LM-N, Shin-Nakamura Chemical Co., Ltd., triacrylate 37%), mixture of pentaerythritol tetraacrylate and triacrylate ( NK ester A-TMM-3L Shin-Nakamura Chemical Co., Ltd., triacrylate 55%), mixture of pentaerythritol tetraacrylate and triacrylate (NK ester A-TMM3 Shin-Nakamura Chemical Co., Ltd., triacrylate) 7%), tetraacrylate pen
  • Examples of other polymerizable monomers used in the first transparent transfer layer include polymerizable monomers having a solubility in an aqueous solvent such as water or a mixed solvent of a lower alcohol having 1 to 3 carbon atoms and water, and an acid group.
  • the monomer which it has is preferable.
  • Examples of the polymerizable monomer having solubility in an aqueous solvent include monomers having a hydroxyl group, ethylene oxide or polypropylene oxide in the molecule, and monomers having a phosphate group.
  • a monomer having an acid group a polymerizable monomer having a carboxyl group is preferable, and acrylic monomers such as (meth) acrylic acid and derivatives thereof can be more preferably used, and among them, Alonics TO-2349 (Toagosei Co., Ltd. Is particularly preferred.
  • the first transparent transfer layer can include a polymerization initiator.
  • a polymerization initiator used for the first transparent transfer layer a polymerization initiator having solubility in an aqueous solvent is preferable.
  • the polymerization initiator having solubility in an aqueous solvent include IRGACURE 2959, a photopolymerization initiator of the following structural formula 2, and the like.
  • the transfer film may be a positive type material.
  • the transfer film is a positive type material, for example, the material described in JP-A-2005-221726 or the like is used for the first transparent transfer layer described above, but it is not limited to the material described above.
  • the first transparent transfer layer-forming coating solution used to form the first transparent transfer layer can contain a solvent.
  • the solvent include diacetone alcohol (3.2 mPa ⁇ s), ethylene glycol (32.5 mPa ⁇ s), propylene glycol (56 mPa ⁇ s), isobutyl alcohol (4.2 mPa ⁇ s) and the like.
  • the third transparent transfer layer is a layer to be the third transparent layer after transfer.
  • the refractive index and thickness of the third transparent transfer layer are the same as those of the third transparent layer described above.
  • the refractive index is preferably 1.5 to 2.4, and more preferably 1.7 to 2.35.
  • the masking layer has a two-layer structure, it is preferably 1.5 to 1.75, more preferably 1.65 to 1.7.
  • the thickness of the third transparent transfer layer is 300 nm or less, preferably 20 nm to 300 nm, and more preferably 50 nm, in the case of forming a shielding layer composed of two or more layers on the second wiring portion (bridge wiring) 18. It is more preferable that the wavelength is ⁇ 80 nm.
  • the thickness of the third transparent layer is preferably 10 nm to 100 nm, and more preferably 10 nm to 50 nm.
  • the third transparent transfer layer can be formed in the same manner as the first transparent transfer layer for transferring and forming the first transparent layer described above. As components used in the third transparent transfer layer, the same components as the components usable in the first transparent transfer layer can be used.
  • the fourth transparent transfer layer is a layer to be the fourth transparent layer after transfer.
  • the refractive index and thickness of the fourth transparent transfer layer are the same as those of the fourth transparent layer described above. Specifically, it is preferable that the layer has a transparency, which has a refractive index lower than that of the third transparent transfer layer and a thickness of 0.5 ⁇ m or more.
  • the refractive index of the fourth transparent transfer layer is preferably 1.4 to 1.6, and more preferably 1.45 to 1.55.
  • the thickness of the fourth transparent layer is preferably 0.5 ⁇ m or more, and more preferably 0.5 ⁇ m to 20 ⁇ m.
  • the fourth transparent transfer layer can be formed in the same manner as the second transparent transfer layer for transferring and forming the second transparent layer described above.
  • the component used for a 4th transparent transfer layer can use the component similar to the component which can be used for a 2nd transparent transfer layer.
  • the fifth transparent transfer layer is a high refractive index layer having a refractive index value close to that of the third transparent layer, and is a layer to be the fifth transparent layer after transfer.
  • the refractive index and thickness of the fifth transparent transfer layer are the same as those of the fifth transparent layer described above. Specifically, the refractive index is more preferably 1.6 to 1.9, and more preferably 1.6 to 1.7.
  • the thickness of the fifth transparent transfer layer is preferably 200 nm or less, and more preferably 40 nm to 200 nm.
  • the fifth transparent transfer layer can be formed in the same manner as the first transparent transfer layer for transferring and forming the first transparent layer described above.
  • the sixth transparent transfer layer is a low refractive index layer having a refractive index value lower than that of the third transparent layer, and is a layer to be a sixth transparent layer after transfer.
  • the refractive index and thickness of the sixth transparent transfer layer are the same as those of the sixth transparent layer described above. Specifically, it is preferable that the refractive index is 1.6 or less and the thickness is 200 nm or less.
  • the sixth transparent transfer layer is the same as the first transparent transfer layer for transferring and forming the first transparent layer described above, except that particles having a low refractive index are preferably used from the viewpoint of adjusting to a low refractive index. It can form using an ingredient.
  • the particles having a low refractive index are preferably inorganic particles such as silicon dioxide and hollow particles, and examples thereof include colloidal silica, fumed silica and hollow silica.
  • Snowtex registered trademark
  • ST-N colloidal silica; non-volatile content 20%
  • Snowtex ST-C colloidal silica; non-volatile content 20%
  • Sururia 1110 hinder silica
  • JGC Catalysts Chemical Corporation silinax (hollow silica) manufactured by Nittetsu Mining Co., Ltd., and the like.
  • the seventh transparent transfer layer is a low refractive index layer having a refractive index value lower than that of the first transparent layer, and is a layer to be the seventh transparent layer after transfer.
  • the refractive index and thickness of the seventh transparent transfer layer are the same as those of the seventh transparent layer described above. Specifically, the refractive index is preferably 1.5 or less. Moreover, 200 nm or less is preferable and 50 nm or less is more preferable.
  • the seventh transparent transfer layer is the same as the first transparent transfer layer for transferring and forming the first transparent layer described above, except that particles having a low refractive index are preferably used from the viewpoint of adjusting to a low refractive index. It can form using an ingredient.
  • the particles having a low refractive index are the same as the particles of the sixth transparent transfer layer, and for example, inorganic particles such as silicon dioxide and hollow particles are preferable.
  • the transfer material may have, in addition to the various transparent transfer layers described above, other optional layers such as a thermoplastic resin layer, an intermediate layer, and a protective film as long as the effects are not impaired.
  • the method of manufacturing a touch sensor of the present disclosure further includes the step of forming through holes in the first transparent layer and the second transparent layer formed in the first transparent layer forming step and the second transparent layer forming step.
  • the through holes are formed by exposing and developing the photosensitive layer formed of the photosensitive material in a pattern. be able to.
  • the first transparent transfer layer and the second transparent transfer layer do not have photosensitivity, after forming the first transparent transfer layer and the second transparent transfer layer, through holes are formed by an etching method using a so-called etching resist. It can be formed.
  • the method of manufacturing a touch sensor according to the present disclosure further includes the third transparent layer and the fourth transparent layer formed in the third transparent layer forming step and the fourth transparent layer forming step. You may have the process of forming overcoat layer.
  • the light source is preferably ultraviolet light such as g-ray, h-ray, i-ray and j-ray. Examples of light source species include metal halide lamps, high pressure mercury lamps, and light emitting diodes (LEDs).
  • an alkaline developer is generally used.
  • the image display device of the present disclosure includes the touch sensor of the present disclosure described above. Therefore, the visibility of the pattern derived from the internal electrode wiring in the image display unit of the image display device is improved, and a display screen having a good appearance is obtained.
  • the image display device is a display device provided with a touch panel such as a capacitive input device, and includes, for example, an organic electroluminescence (EL) display device, a liquid crystal display device, and the like.
  • EL organic electroluminescence
  • compositional ratio in the polymer is a molar ratio unless otherwise specified.
  • refractive index is a value measured with an ellipsometer at a wavelength of 550 nm.
  • the weight average molecular weight of the resin was determined by gel permeation chromatography (GPC) under the following conditions.
  • the standard curve is the standard sample TSK standard, polystyrene from Tosoh Corp .: “F-40”, “F-20”, “F-4”, “F-1”, “A-5000”, “A It prepared from eight samples of "-2500”, “A-1000", and "n-propyl benzene".
  • GPC HLC (registered trademark) -8020 GPC (manufactured by Tosoh Corporation) Column: Three TSKgel (registered trademark), Super Multipore HZ-H (Tosoh Corp., 4.6 mm ID ⁇ 15 cm) Eluent: THF (tetrahydrofuran) Sample concentration: 0.45 mass% Flow rate: 0.35 ml / min Sample injection volume: 10 ⁇ l Measurement temperature: 40 ° C Detector: Differential Refractometer (RI)
  • materials B-1 to B-4 which are the first transparent transfer layer-forming coating liquids, were prepared according to the components and the contents to be the compositions described in Table 2 below.
  • Transfer film 1 for protecting a patterned electrode (Examples 1 to 13 and 15, Comparative Example 2)
  • the second transparent transfer layer is formed on a temporary support that is a polyethylene terephthalate (PET) film with a thickness of 16 ⁇ m, using a slit nozzle to adjust the coating amount to a coating amount that makes the film thickness after drying 3 ⁇ m.
  • PET polyethylene terephthalate
  • the material A-1, A-2 or A-4 was applied for use.
  • the solvent in the coating film was volatilized in a drying zone at 80 ° C. to form a second transparent transfer layer.
  • the material B-1 for forming the first transparent transfer layer is adjusted to an amount such that the film thickness after drying becomes the thickness described in Table 4, and the second transparent It apply
  • a transfer film 1 for protecting a patterned electrode having a laminated structure of protective film / first transparent transfer layer (first transparent layer) / second transparent transfer layer (second transparent layer) / temporary support was produced. .
  • the second transparent transfer layer is formed on a temporary support that is a polyethylene terephthalate (PET) film with a thickness of 16 ⁇ m, using a slit nozzle to adjust the coating amount to a coating amount that makes the film thickness after drying 3 ⁇ m.
  • PET polyethylene terephthalate
  • the material A-1 was applied for use. After coating, the solvent in the coating film was volatilized in a drying zone at 80 ° C. to form a second transparent transfer layer.
  • the material B-4 for forming the first transparent transfer layer is adjusted to an amount such that the film thickness after drying becomes the thickness described in Table 4, and the second transparent material is formed.
  • the coating film was dried at a drying temperature of 70 ° C. to form a first transparent transfer layer.
  • the material B-3 is applied to the first transparent transfer layer using a slit-like nozzle after adjusting the amount of application to such an amount that the film thickness after drying becomes the film thickness in Table 4;
  • the coated film was dried at a drying temperature of to form a seventh transparent transfer layer.
  • a 16 ⁇ m-thick polyethylene terephthalate film was pressure-bonded to the surface of the seventh transparent transfer layer as a protective film.
  • Transfer film 3 for protecting a patterned electrode (Example 16, Comparative Example 1)
  • the second transparent transfer layer is formed on a temporary support that is a polyethylene terephthalate (PET) film with a thickness of 16 ⁇ m, using a slit nozzle to adjust the coating amount to a coating amount that makes the film thickness after drying 3 ⁇ m.
  • PET polyethylene terephthalate
  • the material A-1 was applied for use.
  • the solvent in the coating film was volatilized in a drying zone at 80 ° C. to form a second transparent transfer layer.
  • a 16 ⁇ m-thick polyethylene terephthalate film was pressure-bonded to the surface of the second transparent transfer layer as a protective film.
  • a transfer film 3 for protecting a patterned electrode having a laminated structure of protective film / second transparent transfer layer (second transparent layer) / temporary support was produced.
  • Transfer Film 1 for Protecting Bridge Wiring (Examples 1 to 7, 15 to 16, Comparative Example 2)- A slit-like nozzle is used on a temporary support that is a polyethylene terephthalate (PET) film having a thickness of 16 ⁇ m, and the coating amount is adjusted to a coating amount such that the film thickness after drying becomes 5 ⁇ m, to form a fourth transparent transfer layer Any of the materials A-1 to A-4 was applied for use, and the solvent in the coating film was volatilized in a drying zone at 80 ° C. to form a fourth transparent transfer layer.
  • PET polyethylene terephthalate
  • the material B-2, B-3 or B-4 for the formation of the third transparent transfer layer is applied in such a quantity that the film thickness after drying becomes the film thickness in Table 4 so that the combination in Table 4 below can be obtained. It adjusted, and it apply
  • Transfer Film 2 for Protecting Bridge Wiring (Examples 8 and 10 to 14)
  • a slit-like nozzle is used on a temporary support that is a polyethylene terephthalate (PET) film having a thickness of 16 ⁇ m, and the coating amount is adjusted to a coating amount such that the film thickness after drying becomes 5 ⁇ m, to form a fourth transparent transfer layer
  • PET polyethylene terephthalate
  • Any of the materials A-1, A-2 and A-4 was applied for use, and the solvent in the coating film was volatilized in the drying zone at 80 ° C. to form a fourth transparent transfer layer.
  • the coating amount of the material B-2 or B-4 for forming the third transparent transfer layer is adjusted so that the film thickness after drying becomes the film thickness of Table 4 so that the combination of Table 4 below can be obtained.
  • the third transparent transfer layer is formed on a temporary support that is a polyethylene terephthalate (PET) film with a thickness of 16 ⁇ m, using a slit nozzle to adjust the coating amount to a coating amount that makes the film thickness after drying 5 ⁇ m.
  • PET polyethylene terephthalate
  • the material A-1 was applied for use, and the solvent in the coating film was volatilized in a drying zone at 80 ° C. to form a fourth transparent transfer layer. Then, a 16 ⁇ m-thick polyethylene terephthalate film was pressure-bonded to the surface of the fourth transparent transfer layer as a protective film.
  • a transfer film 3 for bridge wiring protection having a laminated structure of protective film / fourth transparent transfer layer (fourth transparent layer) / temporary support is obtained.
  • ⁇ Preparation of transfer film for overcoat> The material A-1 is coated on a temporary support which is a polyethylene terephthalate (PET) film having a thickness of 16 ⁇ m by using a slit nozzle so that the film thickness after drying becomes 10 ⁇ m, and then coated. The film was dried at a temperature of 80 ° C. to form an overcoat layer. A protective film (polypropylene film with a thickness of 12 ⁇ m) was pressure-bonded to the surface of the formed overcoat layer to prepare a transfer film for overcoat.
  • PET polyethylene terephthalate
  • temperature 150 ° C. of the transparent film substrate 10 of the transparent film-coated substrate 10A argon pressure: 0.13 Pa, oxygen pressure: 0.01 Pa
  • ITO on the fifth transparent layer 32 of the transparent film-coated substrate 10A A film (thickness: 40 nm, refractive index: 1.82) was formed. Thereby, the base material in which the fifth transparent layer 32 and the transparent ITO film were laminated on the transparent film substrate 10 was obtained.
  • the surface resistance of the ITO film was 80 ⁇ / ⁇ ( ⁇ per square).
  • the ITO film was etched and patterned by a known chemical etching method. From this, the base material with an electrode pattern which has an electrode pattern on the 5th transparent film on the transparent film substrate 10 was produced.
  • the electrode pattern includes a first electrode pattern and a second electrode pattern extending in directions intersecting with each other.
  • the first electrode pattern has a plurality of first island-shaped electrode portions 12 formed at intervals in the first direction P on the transparent film substrate 10, and adjacent first islands. And a first wiring portion 16 electrically connecting the second electrode portion 12.
  • the second electrode pattern has a plurality of second island-shaped electrode portions 14 which are formed on the transparent film substrate 10 at intervals in the second direction Q intersecting with the first direction P.
  • touch sensors were prepared using transfer films 1 to 3 for protecting a patterned electrode, transfer films 1 to 3 for protecting a bridge wiring, and a transfer film for overcoating. .
  • the distance between the surface of the exposure mask (mask for forming through holes) and the surface of the temporary support of the transparent laminate is set to 125 ⁇ m, and a proximity type exposure machine having an ultra-high pressure mercury lamp (Hitachi High-Tech Electronics Engineering The i-line was pattern-wise exposed with an exposure amount of 100 mJ / cm 2 to the transparent laminate through a temporary support using Co., Ltd.). Thereafter, the temporary support was peeled from the transparent laminate, and the peeling surface (the surface of the second transparent transfer layer) was washed for 60 seconds using a 2% by mass aqueous solution of sodium carbonate at a temperature of 32 ° C.
  • the fifth transparent layer 32, the first electrode pattern and the second electrode pattern, the first transparent layer 28, and the second transparent layer 30 are transparent film substrates.
  • stacked in order from 10 side was produced.
  • the first transparent layer is a cured layer of the first transparent transfer layer of the transfer film 1 for pattern electrode protection
  • the second transparent layer is a cured layer of the second transparent transfer layer of the transfer film 1 for pattern electrode protection. It is.
  • Example 9 before transfer of the fourth transparent transfer layer using the protective film 3 of the transfer film for bridge wiring protection, the thickness of 20 nm is formed on the bridge wiring formation surface of the film with electrode pattern by vacuum evaporation.
  • a SiO 2 layer (low refractive index layer with a refractive index of 1.46) was deposited. Then, the SiO 2 layer was formed on the bridge wiring by etching and patterning the SiO 2 layer by a known chemical etching method.
  • a 10 nm thick Nb 2 O 5 layer (a high refractive index layer with a refractive index of 2.33) was deposited on the SiO 2 layer formation surface by vacuum deposition. Thereafter, the Nb 2 O 5 layer was etched and patterned by a known chemical etching method.
  • the SiO 2 layer and the Nb 2 O 5 layer were formed on the bridge wiring.
  • the protective film of the transfer film 3 for bridge wiring protection was peeled off, and the release surface of the transfer film 3 for bridge wiring protection was brought into contact with the Nb 2 O 5 layer of the film with electrode pattern.
  • the transfer film 3 for protecting a bridge wiring was laminated on the film with electrode pattern as described above to prepare a laminate.
  • the distance between the surface of the exposure mask (quartz exposure mask for the overcoat of the wiring pattern) and the surface of the temporary support of the laminate is set to 125 ⁇ m, and a proximity type exposure machine (Hitachi High-Tech)
  • a laminate specifically, a transfer layer for bridge wiring protection comprising a third transparent layer and a fourth transparent layer, or a sixth transparent layer, a third transparent layer, using a temporary support, using Electronic Engineering Corporation
  • the i-line was pattern-wise exposed at an exposure dose of 100 mJ / cm 2 to the transfer layer for protecting a bridge wiring, which is composed of the layer and the fourth transparent layer.
  • the temporary support was peeled from the laminate, and the transfer layer for bridge wiring protection was transferred onto the film with an electrode pattern.
  • the concealing layer 27 which is a transfer layer for protecting the bridge wiring is formed.
  • the surface of the fourth transparent layer which is the peeled surface after peeling, was washed with a 2% by weight aqueous solution of sodium carbonate at a temperature of 32 ° C. for 60 seconds.
  • the residue was removed by injecting ultrapure water from the ultrahigh pressure cleaning nozzle onto the surface of the fourth transparent layer after the cleaning process.
  • air was blown to the surface of the fourth transparent layer to remove moisture on the fourth transparent layer, and post-baking treatment was performed at a temperature of 145 ° C. for 30 minutes.
  • Example 15 Example 15 and Example 16 Example 1 was repeated except that the fifth transparent film using the material -C was not provided on the cycloolefin resin film in the above-mentioned ⁇ Production of base with transparent film>. The same operation was performed.
  • the overcoat transfer film was prepared by peeling off the protective film, and the overcoat transfer film was laminated on the surface of the fourth transparent layer of the laminate under the following conditions. Then, the overcoat layer was transferred onto the entire fourth transparent layer 24 by peeling off the temporary support. A transparent laminate with an overcoat layer was obtained in which the overcoat layer was transferred to the surface of the fourth transparent layer of the laminate.
  • Temperature of transparent film substrate 10 40 ° C. Rubber roller temperature: 110 ° C Line pressure: 3 N / cm Conveyance speed: 2 m / min
  • the distance between the surface of the exposure mask (quartz exposure mask for the overcoat of the wiring pattern) and the surface of the temporary support is set to 125 ⁇ m, and a proximity type exposure machine having an ultrahigh pressure mercury lamp (Hitachi High-Tech Electronics Engineering Co., Ltd.)
  • the i-line was exposed patternwise at an exposure dose of 100 mJ / cm 2 to the transparent laminate with overcoat layer through a temporary support using a company).
  • the temporary support was peeled off from the transparent laminate with overcoat layer, and the peeling surface (surface of overcoat layer) was washed for 60 seconds with a 2% by mass aqueous solution of sodium carbonate at a temperature of 32 ° C.
  • the residue was removed by injecting ultrapure water from the ultrahigh pressure cleaning nozzle onto the surface of the overcoat layer after the cleaning treatment.
  • the surface of the overcoat layer was blown with air to remove moisture on the overcoat layer, and then post-baked at a temperature of 145 ° C. for 30 minutes.
  • a touch sensor having a laminated structure shown in FIG. 3 was produced.
  • the appearance of the observed electrode pattern was evaluated according to the following evaluation criteria.
  • A, B and C are practically acceptable, A and B are preferable, and A is more preferable.
  • A is more preferable.
  • C When viewing from a position 10 cm away from the touch sensor, the bridge wiring is slightly recognized, and when viewed from a position 30 cm away from the touch sensor, the bridge wiring is also slightly recognized.
  • D The bridge wiring can be clearly seen when staring from a position 10 cm away from the touch sensor, and slightly visible when looking from a position 30 cm away from the touch sensor.
  • E The bridge wiring is clearly visible when staring from a position 10 cm away from the touch sensor, and the bridge wiring is clearly visible when viewed from a position 30 cm away from the touch sensor.
  • each touch sensor is manufactured using a spectrophotometer V-570 (manufactured by JASCO Corporation) The reflectance for D65 light source was measured.
  • Example 1 in which the concealing layer disposed on the bridge wiring comprises two layers of the third transparent layer and the fourth transparent layer, the concealing layer disposed on the bridge wiring is In Examples 8 to 14 consisting of three layers of six transparent layers, a third transparent layer and a fourth transparent layer, the concealing property to the bridge wiring is high, and the visibility of the electrode pattern including the bridge wiring is further improved.
  • Example 1 in which the thickness of the third transparent layer is 60 nm, it is understood that the visibility of the bridge wiring is further improved as compared with Example 2 in which the third transparent layer is thickened.
  • the reflectance is suppressed low in both Example 1 using ZrO 2 and Example 4 using TiO 2 and having a refractive index of 1.7, and a bridge wiring
  • the visibility of was also excellent. From the results of Examples 5 to 7 where the refractive index was changed relative to Example 1 by adding particles to the fourth transparent layer, the refractive index of the fourth transparent layer is set to 1.6 or less. As a result, it turned out that the visibility of bridge wiring can be improved.
  • Example 8 in which the sixth transparent layer having a refractive index lower than that of the third transparent layer is provided on the bridge wiring as described above and the three-layered concealing layer is provided on the bridge wiring, .
  • the visibility of the bridge wiring is further improved.
  • Example 9 although the refractive index of the third transparent layer is increased to 2.33, the preferable range (1.5 to 2.4) of the refractive index in the case where the shielding layer has a three-layer structure is a two-layer structure
  • the visibility of the bridge wiring is further improved as compared with the fourth embodiment.
  • Example 14 In contrast to Example 8, in Examples 12 to 13 in which the refractive index is changed by including particles in the second transparent layer, the refractive index is within the range of the preferable refractive index of the second transparent layer (1.4 to 1.6 And the reflectance and hiding power were the same as in Example 8.
  • the particles of the first transparent layer of Example 8 are replaced with TiO 2 particles, and the seventh transparent layer is further provided, whereby the refractive index of the first transparent layer is enhanced within the preferable range.
  • a layer having a refractive index lower than that of the first transparent layer is superimposed on the first transparent layer. As a result, the reflectance is further reduced, which is advantageous for improving the visibility of the bridge wiring.
  • Example 1 From the comparison between Example 1 and Example 15, the structure in which the first electrode pattern and the second electrode pattern are sandwiched between the protective layer (the first transparent layer and the second transparent layer) and the fifth transparent layer is obtained. The reflectivity was kept lower. Further, from the comparison between Example 15 and Example 16, the reflectance is suppressed to be low by the structure having the first transparent layer in addition to the second transparent layer, and the improvement effect of the visibility of the bridge wiring is also obtained. It turned out that it can be obtained.
  • Comparative Example 1 in which only the fourth transparent layer was disposed without providing the third transparent layer, not only the reflectance was high but also the concealability of the bridge wiring was significantly inferior.
  • Comparative Example 2 in which the refractive index of the third transparent layer is lower than the refractive index of the fourth transparent layer, the reflectance is higher than in the respective examples of good ones as compared with Comparative Example 1, and the concealability of the bridge wiring is also each It was significantly inferior to the examples.
  • the touch sensor having the structure shown in FIG. 3 manufactured in each of the above Examples and Comparative Examples is bonded to the liquid crystal display device manufactured by the method described in paragraphs 0097 to 0119 of JP2009-47936A, and further, A front glass plate was laminated, and an image display apparatus provided with a touch sensor which is a capacitance type input device was manufactured by a known method.
  • Transparent film substrate 10A Substrate with transparent film 12 first island-shaped electrode portion 14 second island-shaped electrode portion 16 first wiring portion 18 second wiring portion (bridge wiring) 20 through hole 22, 122 third transparent layer 24, 124, 224 fourth transparent layer 26, 126 sixth transparent layer 27 concealing layer 28 first transparent layer 30 second transparent layer 32 fifth transparent layer 34 first electrode pattern 36 Second electrode pattern 40 overcoat layer 42 seventh transparent layer 100, 200, 300, 400 touch sensor P first direction (arrangement direction of a plurality of first island-shaped electrode portions) Q Second direction (arrangement direction of multiple second island electrodes)

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  • Theoretical Computer Science (AREA)
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Abstract

La présente invention a notamment pour objet de fournir un panneau tactile, un procédé de fabrication de celui-ci, et un dispositif d'affichage d'image qui suppriment les réflexions de câblage en pont et présentent des caractéristiques supérieures en termes de dissimulation d'un motif de circuit comprenant le circuit en pont. L'invention concerne un capteur tactile, son procédé de fabrication, et un dispositif d'affichage d'image, comprenant un premier motif d'électrode et un second motif d'électrode s'étendant dans des directions se croisant mutuellement sur la même surface d'un substrat transparent; le premier motif d'électrode comprend une pluralité de premières parties d'électrode en forme d'îlot situées sur le substrat transparent le long d'une première direction avec des espaces entre elles, et une première partie de câblage pour connecter électriquement les premières parties d'électrode en forme d'îlot adjacentes; le second motif d'électrode comprend une pluralité de secondes parties d'électrode en forme d'îlot situées sur le substrat transparent le long d'une seconde direction croisant la première direction avec des espaces entre elles, et une seconde partie de câblage pour ponter et connecter électriquement les secondes parties d'électrode en forme d'îlot adjacentes; et une troisième couche transparente ayant un indice de réfraction p supérieur ou égal à 1,5 et une épaisseur inférieure ou égale à 300 nm et une quatrième couche transparente ayant un indice de réfraction inférieur à celui dudit indice de réfraction p et une épaisseur supérieure ou égale à 0,5 µm sont disposées dans cet ordre sur la seconde partie de câblage.
PCT/JP2018/032098 2017-09-29 2018-08-30 Capteur tactile, procédé de fabrication du capteur tactile et dispositif d'affichage d'image Ceased WO2019065064A1 (fr)

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CN201880057775.9A CN111095182A (zh) 2017-09-29 2018-08-30 触摸传感器及触摸传感器的制造方法以及图像显示装置
JP2019544457A JP6934950B2 (ja) 2017-09-29 2018-08-30 タッチセンサー及びタッチセンサーの製造方法、並びに画像表示装置
US16/789,512 US11106320B2 (en) 2017-09-29 2020-02-13 Touch sensor, method for manufacturing touch sensor, and image display device

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