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WO2019045364A3 - 착색제 화합물 및 이를 포함하는 착색 조성물 - Google Patents

착색제 화합물 및 이를 포함하는 착색 조성물 Download PDF

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Publication number
WO2019045364A3
WO2019045364A3 PCT/KR2018/009748 KR2018009748W WO2019045364A3 WO 2019045364 A3 WO2019045364 A3 WO 2019045364A3 KR 2018009748 W KR2018009748 W KR 2018009748W WO 2019045364 A3 WO2019045364 A3 WO 2019045364A3
Authority
WO
WIPO (PCT)
Prior art keywords
same
coloring composition
colorant compound
colorant
relates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2018/009748
Other languages
English (en)
French (fr)
Other versions
WO2019045364A2 (ko
Inventor
박종호
최상아
양승진
이다미
박상균
김재준
이재용
이수연
정지혜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Chem Ltd
Original Assignee
LG Chem Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020180098142A external-priority patent/KR102131993B1/ko
Application filed by LG Chem Ltd filed Critical LG Chem Ltd
Priority to JP2019548924A priority Critical patent/JP6903854B2/ja
Priority to CN201880021164.9A priority patent/CN110494502B/zh
Publication of WO2019045364A2 publication Critical patent/WO2019045364A2/ko
Publication of WO2019045364A3 publication Critical patent/WO2019045364A3/ko
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/04—Isoindoline dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)

Abstract

본 발명은 착색제 및 이를 포함하는 착색 조성물에 관한 것이다. 보다 상세하게는, 우수한 색상 특성, 내열성 및 용해도를 나타내어 컬러필터 제조용으로 사용 가능한 신규한 구조의 착색제 및 이를 포함하는 착색 조성물에 관한 것이다.
PCT/KR2018/009748 2017-09-04 2018-08-23 착색제 화합물 및 이를 포함하는 착색 조성물 Ceased WO2019045364A2 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2019548924A JP6903854B2 (ja) 2017-09-04 2018-08-23 着色剤化合物およびこれを含む着色組成物
CN201880021164.9A CN110494502B (zh) 2017-09-04 2018-08-23 着色剂化合物和包含其的着色组合物

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20170112691 2017-09-04
KR10-2017-0112691 2017-09-04
KR10-2018-0098142 2018-08-22
KR1020180098142A KR102131993B1 (ko) 2017-09-04 2018-08-22 착색제 화합물 및 이를 포함하는 착색 조성물

Publications (2)

Publication Number Publication Date
WO2019045364A2 WO2019045364A2 (ko) 2019-03-07
WO2019045364A3 true WO2019045364A3 (ko) 2019-04-18

Family

ID=65527657

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2018/009748 Ceased WO2019045364A2 (ko) 2017-09-04 2018-08-23 착색제 화합물 및 이를 포함하는 착색 조성물

Country Status (1)

Country Link
WO (1) WO2019045364A2 (ko)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6849116B2 (en) * 2000-06-29 2005-02-01 Basf Aktiengesellschaft Quinophthalone-derivative based crystallization modifiers
KR20100105190A (ko) * 2009-03-20 2010-09-29 제일모직주식회사 착색 감광성 수지 조성물 및 컬러필터
US20140114077A1 (en) * 2012-09-17 2014-04-24 Seoul National University R&Db Foundation High transmissional green dye for lcd and synthetic method thereof
KR20150115512A (ko) * 2014-04-04 2015-10-14 제일모직주식회사 신규한 화합물, 상기 화합물을 포함하는 감광성 수지 조성물, 및 컬러 필터
KR20160038463A (ko) * 2014-09-30 2016-04-07 삼성에스디아이 주식회사 감광성 수지 조성물 및 이를 이용한 컬러필터

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6849116B2 (en) * 2000-06-29 2005-02-01 Basf Aktiengesellschaft Quinophthalone-derivative based crystallization modifiers
KR20100105190A (ko) * 2009-03-20 2010-09-29 제일모직주식회사 착색 감광성 수지 조성물 및 컬러필터
US20140114077A1 (en) * 2012-09-17 2014-04-24 Seoul National University R&Db Foundation High transmissional green dye for lcd and synthetic method thereof
KR20150115512A (ko) * 2014-04-04 2015-10-14 제일모직주식회사 신규한 화합물, 상기 화합물을 포함하는 감광성 수지 조성물, 및 컬러 필터
KR20160038463A (ko) * 2014-09-30 2016-04-07 삼성에스디아이 주식회사 감광성 수지 조성물 및 이를 이용한 컬러필터

Also Published As

Publication number Publication date
WO2019045364A2 (ko) 2019-03-07

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