WO2019044324A1 - Near infrared ray absorbing glass - Google Patents
Near infrared ray absorbing glass Download PDFInfo
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- WO2019044324A1 WO2019044324A1 PCT/JP2018/028479 JP2018028479W WO2019044324A1 WO 2019044324 A1 WO2019044324 A1 WO 2019044324A1 JP 2018028479 W JP2018028479 W JP 2018028479W WO 2019044324 A1 WO2019044324 A1 WO 2019044324A1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/17—Silica-free oxide glass compositions containing phosphorus containing aluminium or beryllium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/23—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron
- C03C3/247—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron containing fluorine and phosphorus
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/08—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
Definitions
- the present invention relates to a near-infrared absorbing glass capable of selectively absorbing near-infrared light.
- near-infrared absorbing glass is used for camera parts in optical devices such as digital cameras and smartphones for the purpose of correcting the visibility of solid-state imaging devices such as CCDs and CMOS.
- Patent Document 1 discloses a phosphate-based near-infrared absorbing glass containing fluorine.
- the near-infrared absorbing glass of the present invention is, in cation%, P 5 + 10 to 70%, Na + 0 to less than 7%, R 2 + 3 to less than 31% (R is at least selected from Mg, Ca, Sr and Ba one), Mg 2+ 0.1 ⁇ 20% , Sr 2+ 2 ⁇ 20%, Cu 2+ 0.1 to less than 9% and, by anionic%, F - 14.5 ⁇ 90% , O 2- 10 ⁇ It is characterized by containing 85.5% and having a thickness of 0.25 mm or less.
- the near-infrared absorbing glass of the present invention achieves high devitrification resistance by regulating R 2+ to improve devitrification resistance to 3% or more and Na + to reduce devitrification resistance to less than 7%. ing. Therefore, it can apply also to the forming method which tends to be accompanied by devitrification, such as the down draw method which can manufacture efficiently infrared absorption glass with small thickness, and a redraw method.
- the near-infrared absorbing glass of the present invention preferably further contains 0 to 10% of Zn 2+ at cation%.
- the near-infrared absorbing glass of the present invention preferably contains substantially no Pb component and As component.
- does not substantially contain means not intentionally containing as a raw material, and means that content of each component is less than 0.1% objectively.
- the present invention it is possible to provide a near-infrared absorbing glass which can reduce the thickness of an optical device and is excellent in the devitrification resistance, the weather resistance and the optical characteristics.
- the near-infrared absorbing glass of the present invention is, in cation%, P 5 + 10 to 70%, Na + 0 to less than 7%, R 2 + 3 to less than 31% (R is at least selected from Mg, Ca, Sr and Ba) one), Mg 2+ 0.1 ⁇ 20% , Sr 2+ 2 ⁇ 20%, containing Cu 2+ 0.1 to less than 9%. Below, the reason which limited the glass composition as mentioned above is demonstrated.
- P 5+ is an essential component for forming a glass skeleton.
- the content of P 5+ is 10 to 70%, preferably 15 to 63%, 18 to 51%, 25 to 50%, particularly 25 to 40%. If the content of P 5+ is too low, vitrification tends to be unstable. On the other hand, when the content of P 5+ is too large, the weather resistance tends to be lowered.
- Na + is a component that lowers the melting temperature.
- the content of Na + is 0 to less than 7%, preferably 0.1 to 6%, 0 to 2%, and particularly preferably not contained. When the content of Na + is too large, the devitrification resistance and the weather resistance tend to be lowered.
- R 2+ (R is at least one selected from Mg, Ca, Sr and Ba) is a component that improves the devitrification resistance and the weather resistance.
- the total content of R 2+ is preferably 3 to less than 31%, more preferably 8 to 28%, and particularly preferably 12 to 26%.
- the content of R 2+ is too small, the above effect is hardly obtained.
- the content of R 2+ is too large, the stability of vitrification tends to be reduced.
- Mg 2+ is a component that improves the devitrification resistance and the weather resistance.
- the content of Mg 2+ is preferably 0.1 to 20%, particularly preferably 3 to 11%. When the content of Mg 2+ is too low, the above effect is hardly obtained. On the other hand, when the content of Mg 2+ is too large, the stability of vitrification tends to be reduced.
- Ca 2+ is a component that improves the devitrification resistance and the weather resistance as well as Mg 2+ .
- the content of Ca 2+ is preferably 0 to 12%, particularly 0.1 to 10%. When the content of Ca 2+ is too large, the stability of vitrification tends to be reduced.
- Sr 2+ is also a component that improves the devitrification resistance and the weather resistance, similarly to Mg 2+ .
- the content of Sr 2+ is preferably 2 to 20%, particularly preferably 2 to 10%. When the content of Sr 2+ is too small, the above effect is hardly obtained. On the other hand, when the content of Sr 2+ is too large, the stability of vitrification tends to be reduced.
- Ba 2+ is also a component that improves the devitrification resistance and the weather resistance, similarly to Mg 2+ .
- the content of Ba 2+ is preferably 0 to 10%, particularly 0.1 to 9%. When the content of Ba 2+ is too large, the stability of vitrification tends to be reduced.
- Cu 2+ is an essential component for absorbing near infrared light.
- the content of Cu 2+ is preferably 0.1 to less than 9%, more preferably 2 to less than 9%, and particularly preferably 5 to less than 9%.
- the content of Cu 2+ is too low, the above effect is hardly obtained.
- the content of Cu 2+ is too large, the light transmittance in the ultraviolet to visible region is likely to decrease. In addition, the devitrification resistance tends to decrease.
- Al 3+ is a component that improves chemical durability.
- the content of Al 3+ is preferably 0 to 20%, 2 to 19%, 6 to 18%, 7 to 17%, particularly 8 to 16%. If the content of Al 3+ is too large, the meltability tends to decrease and the melt temperature tends to rise. Note that, when the melting temperature rises, Cu ions are reduced and it is easy to shift from Cu 2+ to Cu + , so it is difficult to obtain desired optical characteristics. Specifically, the light transmittance in the near ultraviolet to visible region is likely to be reduced, and the near infrared absorption characteristics are likely to be degraded.
- Zn 2+ is a component that improves devitrification resistance and weatherability.
- the content of Zn 2+ is preferably 0 to 10%, particularly 0.1 to 5%. When the content of Zn 2+ is too large, the stability of vitrification tends to be reduced.
- Li + is a component that lowers the melting temperature.
- the content of Li + is preferably 0 to 30%, particularly 0.1 to 25%. When the content of Li + is too large, the devitrification resistance tends to decrease.
- K + is a component that lowers the melting temperature.
- the content of K + is preferably 0 to 30%, particularly 0.1 to 20%. When the content of K + is too large, the devitrification resistance tends to decrease.
- the optical glass of the present invention as the cationic component, Bi 3+, La 3+, Y 3+, Gd 3+, Te 4+, Si 4+, Ta 5+, Nb 5+, Ti 4+, and Zr 4+ or Sb 3+, etc., You may make it contain in the range which does not impair the effect of this invention.
- the content of each of these components is preferably 0 to 3%, and more preferably 0 to 1%.
- the Pb component (Pb 2+ and the like) and the As component (As 3 + and the like) are environmentally hazardous substances, and therefore are preferably not substantially contained in the invention.
- the near-infrared absorbing glass of the present invention is usually used in the form of a plate.
- the thickness is 0.25 mm or less, preferably 0.2 mm or less, 0.15 mm or less, and particularly 0.1 mm or less. If the thickness is too large, thinning of the optical device becomes difficult.
- the lower limit of the thickness is not particularly limited, but is preferably 0.01 mm or more from the viewpoint of mechanical strength.
- the near-infrared absorbing glass of the present invention can achieve both high light transmittance in the visible region and excellent light-absorbing characteristics in the near-infrared region.
- the light transmittance at a wavelength of 500 nm is preferably 75% or more, and particularly preferably 77% or more.
- the light transmittance at a wavelength of 700 nm is preferably 28% or less, particularly preferably 26% or less, and the light transmittance at a wavelength of 1200 nm is preferably 39% or less, particularly preferably 37% or less.
- the liquidus viscosity of the near-infrared absorbing glass of the present invention is preferably 10 0.8 dPa ⁇ s or more, and more preferably 10 1.0 dPa ⁇ s or more. If the liquidus viscosity is too low, devitrification tends to occur during molding.
- the near-infrared absorbing glass of the present invention can be produced by melting and shaping a raw material powder batch prepared to have a desired composition.
- the melting temperature is preferably 700 to 900 ° C. When the melting temperature is too low, it is difficult to obtain a homogeneous glass. On the other hand, if the melting temperature is too high, Cu ions are reduced and it is easy to shift from Cu 2+ to Cu + , so it is difficult to obtain desired optical characteristics.
- the molten glass can be formed into a predetermined shape, subjected to necessary post-processing, and used for various applications.
- molding methods such as the down draw method and the redraw method. Since these forming methods are likely to be accompanied by devitrification, it is easy to enjoy the effect of the near-infrared absorbing glass of the present invention which is excellent in devitrification resistance.
- Table 1 shows Examples of the present invention (Sample Nos. 1 to 6) and Comparative Examples (Sample Nos. 7 to 9).
- the light transmission characteristics of each of the samples of the thickness described in Table 1 mirror-polished on both sides were measured with respective transmittances at wavelengths of 500 nm, 700 nm, and 1200 nm using a spectral analyzer (UV3100 manufactured by Shimadzu Corporation). If the transmittances at wavelengths of 500 nm, 700 nm, and 1200 nm are 77% or more, 26% or less, and 37% or less, respectively, it can be determined that the light transmission characteristics are good.
- the weather resistance of the sample mirror-polished on both sides was determined under the conditions of a temperature of 120 ° C. and a relative humidity of 100% for 24 hours, and then judged by the presence or absence of a change in appearance. Specifically, those in which no change in appearance was observed after the test were evaluated as “ ⁇ ”, and those in which changes in appearance such as white discoloration were observed were evaluated as “x”.
- the liquid phase viscosity was determined as follows. The sample crushed to a particle size of 300 to 600 ⁇ m was placed in a platinum container and kept in a temperature gradient furnace for 24 hours. The maximum temperature at which interfacial crystals were deposited on the bottom of the platinum container was taken as the liquidus temperature. The viscosity of the sample was then measured, and the viscosity at the liquidus temperature was taken as the liquidus viscosity.
- No. 1 which is an embodiment of the present invention.
- Samples 1 to 6 had high light transmittance in the visible region and large absorption in the near infrared region. Further, no change was observed before and after the test in the weather resistance evaluation, and the liquid phase viscosity was 10 0.8 dPa ⁇ s or more, and the devitrification resistance was also excellent. In addition, since thickness is 0.24 mm or less, it is easy to make an optical device thin.
- No. 1 which is a comparative example.
- the sample No. 7 was inferior in devitrification resistance because the liquidus viscosity was 10 0.4 dPa ⁇ s.
- the sample No. 8 was inferior in weather resistance and inferior in devitrification resistance because the liquidus viscosity was 10 0.6 dPa ⁇ s. No. The nine samples were not vitrified.
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Abstract
Description
本発明は、近赤外線を選択的に吸収することが可能な近赤外線吸収ガラスに関するものである。 The present invention relates to a near-infrared absorbing glass capable of selectively absorbing near-infrared light.
一般に、デジタルカメラやスマートフォン等の光学デバイス内のカメラ部分には、CCDやCMOS等の固体撮像素子の視感度補正を目的として、近赤外線吸収ガラスが用いられている。例えば、特許文献1には、フッ素を含有するリン酸系の近赤外線吸収ガラスが開示されている。 In general, near-infrared absorbing glass is used for camera parts in optical devices such as digital cameras and smartphones for the purpose of correcting the visibility of solid-state imaging devices such as CCDs and CMOS. For example, Patent Document 1 discloses a phosphate-based near-infrared absorbing glass containing fluorine.
近年、光学デバイスの薄型化が強く望まれており近赤外線吸収ガラスを薄くする必要があるが、薄い近赤外線吸収ガラスを作製するには、高い耐失透性が要求される。しかしながら、耐失透性を向上しようとすると、耐候性や光学特性等が低下する等の不具合が発生しやすくなる。 In recent years, it has been strongly desired to reduce the thickness of optical devices, and it is necessary to reduce the thickness of near-infrared absorbing glass. However, high devitrification resistance is required to produce thin near-infrared absorbing glass. However, when trying to improve the devitrification resistance, problems such as deterioration of weatherability, optical characteristics and the like tend to occur.
以上に鑑み、本発明は、光学デバイスを薄型化でき、かつ、耐失透性、耐候性及び光学特性の各特性に優れた近赤外線吸収ガラスを提供することを目的とする。 In view of the above, it is an object of the present invention to provide a near-infrared absorbing glass which can reduce the thickness of an optical device and is excellent in the devitrification resistance, weather resistance and optical characteristics.
本発明の近赤外線吸収ガラスは、カチオン%で、P5+ 10~70%、Na+ 0~7%未満、R2+ 3~31%未満(RはMg、Ca、Sr及びBaから選択される少なくとも1種)、Mg2+ 0.1~20%、Sr2+ 2~20%、Cu2+ 0.1~9%未満、及び、アニオン%で、F- 14.5~90%、O2- 10~85.5%を含有し、厚みが0.25mm以下であることを特徴とする。 The near-infrared absorbing glass of the present invention is, in cation%, P 5 + 10 to 70%, Na + 0 to less than 7%, R 2 + 3 to less than 31% (R is at least selected from Mg, Ca, Sr and Ba one), Mg 2+ 0.1 ~ 20% , Sr 2+ 2 ~ 20%, Cu 2+ 0.1 to less than 9% and, by anionic%, F - 14.5 ~ 90% , O 2- 10 ~ It is characterized by containing 85.5% and having a thickness of 0.25 mm or less.
本発明の近赤外線吸収ガラスは、耐失透性を向上させるR2+を3%以上、耐失透性を低下させるNa+を7%未満に規制することにより、高い耐失透性を達成している。そのため、厚みの小さい赤外線吸収ガラスを効率よく製造できるダウンドロー法、リドロー法等の失透を伴いやすい成形方法にも適用することができる。 The near-infrared absorbing glass of the present invention achieves high devitrification resistance by regulating R 2+ to improve devitrification resistance to 3% or more and Na + to reduce devitrification resistance to less than 7%. ing. Therefore, it can apply also to the forming method which tends to be accompanied by devitrification, such as the down draw method which can manufacture efficiently infrared absorption glass with small thickness, and a redraw method.
本発明の近赤外線吸収ガラスは、さらに、カチオン%で、Zn2+ 0~10%を含有することが好ましい。 The near-infrared absorbing glass of the present invention preferably further contains 0 to 10% of Zn 2+ at cation%.
本発明の近赤外線吸収ガラスは、Pb成分及びAs成分を実質的に含有しないことが好ましい。なお、「実質的に含有しない」とは、原料として意図的に含有させないことを意味し、客観的には各成分の含有量が0.1%未満であることをいう。 The near-infrared absorbing glass of the present invention preferably contains substantially no Pb component and As component. In addition, "does not substantially contain" means not intentionally containing as a raw material, and means that content of each component is less than 0.1% objectively.
本発明によれば、光学デバイスを薄型化でき、かつ、耐失透性、耐候性及び光学特性の各特性に優れた近赤外線吸収ガラスを提供することが可能となる。 According to the present invention, it is possible to provide a near-infrared absorbing glass which can reduce the thickness of an optical device and is excellent in the devitrification resistance, the weather resistance and the optical characteristics.
本発明の近赤外線吸収ガラスは、カチオン%で、P5+ 10~70%、Na+ 0~7%未満、R2+ 3~31%未満(RはMg、Ca、Sr及びBaから選択される少なくとも1種)、Mg2+ 0.1~20%、Sr2+ 2~20%、Cu2+ 0.1~9%未満を含有する。以下に、ガラス組成を上記の通り限定した理由を説明する。 The near-infrared absorbing glass of the present invention is, in cation%, P 5 + 10 to 70%, Na + 0 to less than 7%, R 2 + 3 to less than 31% (R is at least selected from Mg, Ca, Sr and Ba) one), Mg 2+ 0.1 ~ 20% , Sr 2+ 2 ~ 20%, containing Cu 2+ 0.1 to less than 9%. Below, the reason which limited the glass composition as mentioned above is demonstrated.
P5+はガラス骨格を形成するための必須成分である。P5+の含有量は10~70%であり、15~63%、18~51%、25~50%、特に25~40%であることが好ましい。P5+の含有量が少なすぎると、ガラス化が不安定になる傾向がある。一方、P5+の含有量が多すぎると、耐候性が低下しやすくなる。 P 5+ is an essential component for forming a glass skeleton. The content of P 5+ is 10 to 70%, preferably 15 to 63%, 18 to 51%, 25 to 50%, particularly 25 to 40%. If the content of P 5+ is too low, vitrification tends to be unstable. On the other hand, when the content of P 5+ is too large, the weather resistance tends to be lowered.
Na+は溶融温度を低下させる成分である。Na+の含有量は0~7%未満であり、0.1~6%、0~2%、特に含有しないことが好ましい。Na+の含有量が多すぎると、耐失透性、耐候性が低下する傾向がある。 Na + is a component that lowers the melting temperature. The content of Na + is 0 to less than 7%, preferably 0.1 to 6%, 0 to 2%, and particularly preferably not contained. When the content of Na + is too large, the devitrification resistance and the weather resistance tend to be lowered.
R2+(RはMg、Ca、Sr及びBaから選択される少なくとも1種)は耐失透性、耐候性を向上させる成分である。R2+の含有量は合量で3~31%未満であり、8~28%、特に12~26%であることが好ましい。R2+の含有量が少なすぎると、上記効果が得られにくい。一方、R2+の含有量が多すぎると、ガラス化の安定性が低下しやすくなる。 R 2+ (R is at least one selected from Mg, Ca, Sr and Ba) is a component that improves the devitrification resistance and the weather resistance. The total content of R 2+ is preferably 3 to less than 31%, more preferably 8 to 28%, and particularly preferably 12 to 26%. When the content of R 2+ is too small, the above effect is hardly obtained. On the other hand, when the content of R 2+ is too large, the stability of vitrification tends to be reduced.
なお、R2+の各成分の含有量は以下の通りである。 In addition, content of each component of R <2+> is as follows.
Mg2+は耐失透性、耐候性を向上させる成分である。Mg2+の含有量は0.1~20%であり、特に3~11%であることが好ましい。Mg2+の含有量が少なすぎると、上記効果が得られにくい。一方、Mg2+の含有量が多すぎると、ガラス化の安定性が低下しやすくなる。 Mg 2+ is a component that improves the devitrification resistance and the weather resistance. The content of Mg 2+ is preferably 0.1 to 20%, particularly preferably 3 to 11%. When the content of Mg 2+ is too low, the above effect is hardly obtained. On the other hand, when the content of Mg 2+ is too large, the stability of vitrification tends to be reduced.
Ca2+はMg2+と同様に耐失透性、耐候性を向上させる成分である。Ca2+の含有量は0~12%、特に0.1~10%であることが好ましい。Ca2+の含有量が多すぎると、ガラス化の安定性が低下しやすくなる。 Ca 2+ is a component that improves the devitrification resistance and the weather resistance as well as Mg 2+ . The content of Ca 2+ is preferably 0 to 12%, particularly 0.1 to 10%. When the content of Ca 2+ is too large, the stability of vitrification tends to be reduced.
Sr2+もMg2+と同様に耐失透性、耐候性を向上させる成分である。Sr2+の含有量は2~20%であり、特に2~10%であることが好ましい。Sr2+の含有量が少なすぎると、上記効果が得られにくい。一方、Sr2+の含有量が多すぎると、ガラス化の安定性が低下しやすくなる。 Sr 2+ is also a component that improves the devitrification resistance and the weather resistance, similarly to Mg 2+ . The content of Sr 2+ is preferably 2 to 20%, particularly preferably 2 to 10%. When the content of Sr 2+ is too small, the above effect is hardly obtained. On the other hand, when the content of Sr 2+ is too large, the stability of vitrification tends to be reduced.
Ba2+もMg2+と同様に耐失透性、耐候性を向上させる成分である。Ba2+の含有量は0~10%、特に0.1~9%であることが好ましい。Ba2+の含有量が多すぎるとガラス化の安定性が低下しやすくなる。 Ba 2+ is also a component that improves the devitrification resistance and the weather resistance, similarly to Mg 2+ . The content of Ba 2+ is preferably 0 to 10%, particularly 0.1 to 9%. When the content of Ba 2+ is too large, the stability of vitrification tends to be reduced.
Cu2+は近赤外線を吸収するための必須成分である。Cu2+の含有量は0.1~9%未満であり、2~9%未満、特に5~9%未満であることが好ましい。Cu2+の含有量が少なすぎると、上記効果が得られにくい。一方、Cu2+の含有量が多すぎると、紫外~可視域の光透過率が低下しやすくなる。また耐失透性が低下する傾向がある。 Cu 2+ is an essential component for absorbing near infrared light. The content of Cu 2+ is preferably 0.1 to less than 9%, more preferably 2 to less than 9%, and particularly preferably 5 to less than 9%. When the content of Cu 2+ is too low, the above effect is hardly obtained. On the other hand, when the content of Cu 2+ is too large, the light transmittance in the ultraviolet to visible region is likely to decrease. In addition, the devitrification resistance tends to decrease.
上記成分以外にも、以下に示す種々の成分を含有させることができる。 In addition to the above components, various components shown below can be contained.
Al3+は化学耐久性を向上させる成分である。Al3+の含有量は0~20%、2~19%、6~18%、7~17%、特に8~16%であることが好ましい。Al3+の含有量が多すぎると、溶融性が低下して溶融温度が上昇する傾向がある。なお、溶融温度が上昇すると、Cuイオンが還元されてCu2+からCu+にシフトしやすくなるため、所望の光学特性が得られにくくなる。具体的には、近紫外~可視域における光透過率が低下したり、近赤外線吸収特性が低下しやすくなる。 Al 3+ is a component that improves chemical durability. The content of Al 3+ is preferably 0 to 20%, 2 to 19%, 6 to 18%, 7 to 17%, particularly 8 to 16%. If the content of Al 3+ is too large, the meltability tends to decrease and the melt temperature tends to rise. Note that, when the melting temperature rises, Cu ions are reduced and it is easy to shift from Cu 2+ to Cu + , so it is difficult to obtain desired optical characteristics. Specifically, the light transmittance in the near ultraviolet to visible region is likely to be reduced, and the near infrared absorption characteristics are likely to be degraded.
Zn2+は耐失透性、耐候性を向上させる成分である。Zn2+の含有量は0~10%、特に0.1~5%であることが好ましい。Zn2+の含有量が多すぎるとガラス化の安定性が低下しやすくなる。 Zn 2+ is a component that improves devitrification resistance and weatherability. The content of Zn 2+ is preferably 0 to 10%, particularly 0.1 to 5%. When the content of Zn 2+ is too large, the stability of vitrification tends to be reduced.
Li+は溶融温度を低下させる成分である。Li+の含有量は0~30%、特に0.1~25%であることが好ましい。Li+の含有量が多すぎると、耐失透性が低下する傾向がある。 Li + is a component that lowers the melting temperature. The content of Li + is preferably 0 to 30%, particularly 0.1 to 25%. When the content of Li + is too large, the devitrification resistance tends to decrease.
K+は溶融温度を低下させる成分である。K+の含有量は0~30%、特に0.1~20%であることが好ましい。K+の含有量が多すぎると、耐失透性が低下する傾向がある。 K + is a component that lowers the melting temperature. The content of K + is preferably 0 to 30%, particularly 0.1 to 20%. When the content of K + is too large, the devitrification resistance tends to decrease.
その他に、本発明の光学ガラスには、カチオン成分として、Bi3+、La3+、Y3+、Gd3+、Te4+、Si4+、Ta5+、Nb5+、Ti4+、Zr4+またはSb3+等を、本発明の効果を損なわない範囲で含有させても構わない。具体的には、これらの成分の含有量は、それぞれ0~3%が好ましく、0~1%がより好ましい。 In addition, the optical glass of the present invention, as the cationic component, Bi 3+, La 3+, Y 3+, Gd 3+, Te 4+, Si 4+, Ta 5+, Nb 5+, Ti 4+, and Zr 4+ or Sb 3+, etc., You may make it contain in the range which does not impair the effect of this invention. Specifically, the content of each of these components is preferably 0 to 3%, and more preferably 0 to 1%.
Pb成分(Pb2+等)及びAs成分(As3+等)は環境負荷物質であるため、本発明では実質的に含有しないことが好ましい。 The Pb component (Pb 2+ and the like) and the As component (As 3 + and the like) are environmentally hazardous substances, and therefore are preferably not substantially contained in the invention.
アニオン成分の組成としては、F- 14.5~90%、及び、O2- 10~85.5%を含有し、特にF- 20~70%、及び、O2- 30~80%を含有することが好ましい。F-の含有量が少なすぎる(O2-の含有量が多すぎる)と、耐失透性、耐候性が低下する傾向がある。一方、F-の含有量が多すぎる(O2-の含有量が少なすぎる)と、ガラス化の安定性が低下しやすくなる。 The composition of the anionic component, F - 14.5 ~ 90%, and contains a O 2- 10 ~ 85.5%, in particular F - 20 ~ 70%, and, containing O 2- 30 ~ 80% It is preferable to do. If the content of F − is too small (the content of O 2 − is too large), the devitrification resistance and the weather resistance tend to be lowered. On the other hand, F - the content is too high (O content of 2 is too small), the stability of vitrification tends to decrease.
本発明の近赤外線吸収ガラスは、通常、板状で用いられる。厚みは0.25mm以下であり、0.2mm以下、0.15mm以下、特に0.1mm以下であることが好ましい。厚みが大きすぎると、光学デバイスの薄型化が困難になる。なお、厚みの下限は特に限定されないが、機械的強度の観点から0.01mm以上であることが好ましい。 The near-infrared absorbing glass of the present invention is usually used in the form of a plate. The thickness is 0.25 mm or less, preferably 0.2 mm or less, 0.15 mm or less, and particularly 0.1 mm or less. If the thickness is too large, thinning of the optical device becomes difficult. The lower limit of the thickness is not particularly limited, but is preferably 0.01 mm or more from the viewpoint of mechanical strength.
本発明の近赤外線吸収ガラスは上記組成を有することにより、可視域における高い光透過率及び近赤外域における優れた光吸収特性の両者を達成することが可能となる。具体的には、波長500nmにおける光透過率は75%以上、特に77%以上であることが好ましい。一方、波長700nmにおける光透過率は28%以下、特に26%以下であることが好ましく、波長1200nmにおける光透過率は39%以下、特に37%以下であることが好ましい。 By having the above-described composition, the near-infrared absorbing glass of the present invention can achieve both high light transmittance in the visible region and excellent light-absorbing characteristics in the near-infrared region. Specifically, the light transmittance at a wavelength of 500 nm is preferably 75% or more, and particularly preferably 77% or more. On the other hand, the light transmittance at a wavelength of 700 nm is preferably 28% or less, particularly preferably 26% or less, and the light transmittance at a wavelength of 1200 nm is preferably 39% or less, particularly preferably 37% or less.
本発明の近赤外線吸収ガラスの液相粘度は100.8dPa・s以上、特に101.0dPa・s以上であることが好ましい。液相粘度が低すぎると、成形時に失透しやすくなる。 The liquidus viscosity of the near-infrared absorbing glass of the present invention is preferably 10 0.8 dPa · s or more, and more preferably 10 1.0 dPa · s or more. If the liquidus viscosity is too low, devitrification tends to occur during molding.
本発明の近赤外線吸収ガラスは、所望の組成となるように調製した原料粉末バッチを溶融、成形することにより製造することができる。溶融温度は700~900℃であることが好ましい。溶融温度が低すぎると、均質なガラスが得られにくくなる。一方、溶融温度が高すぎると、Cuイオンが還元されてCu2+からCu+にシフトしやすくなるため、所望の光学特性が得られにくくなる。 The near-infrared absorbing glass of the present invention can be produced by melting and shaping a raw material powder batch prepared to have a desired composition. The melting temperature is preferably 700 to 900 ° C. When the melting temperature is too low, it is difficult to obtain a homogeneous glass. On the other hand, if the melting temperature is too high, Cu ions are reduced and it is easy to shift from Cu 2+ to Cu + , so it is difficult to obtain desired optical characteristics.
その後、溶融ガラスを所定の形状に成形し、必要な後加工を施して、各種の用途に供することができる。なお、厚みの小さい近赤外線吸収ガラスを効率良く製造するためには、ダウンドロー法、リドロー法等の成形方法を適用することが好ましい。これらの成形方法は失透を伴いやすいため、耐失透性に優れる本発明の近赤外線吸収ガラスの効果を享受しやすい。 Thereafter, the molten glass can be formed into a predetermined shape, subjected to necessary post-processing, and used for various applications. In addition, in order to manufacture the near-infrared absorption glass with small thickness efficiently, it is preferable to apply molding methods, such as the down draw method and the redraw method. Since these forming methods are likely to be accompanied by devitrification, it is easy to enjoy the effect of the near-infrared absorbing glass of the present invention which is excellent in devitrification resistance.
以下、本発明の近赤外線吸収ガラスを実施例に基づいて詳細に説明するが、本発明はこれらの実施例に限定されるものではない。 Hereinafter, although the near-infrared absorption glass of this invention is demonstrated in detail based on an Example, this invention is not limited to these Examples.
表1は本発明の実施例(試料No.1~6)及び比較例(試料No.7~9)を示す。 Table 1 shows Examples of the present invention (Sample Nos. 1 to 6) and Comparative Examples (Sample Nos. 7 to 9).
(1)各試料の作製
まず、表1の組成となるように調合したガラス原料を白金ルツボに投入し、700~850℃の温度で溶融した。次に、溶融ガラスをカーボン板上に流し出し、冷却固化した。その後、アニールを行って試料を得た。
(1) Preparation of Each Sample First, a glass raw material prepared to have the composition shown in Table 1 was put into a platinum crucible and melted at a temperature of 700 to 850.degree. Next, the molten glass was poured onto a carbon plate and cooled and solidified. Thereafter, annealing was performed to obtain a sample.
(2)各試料の評価
得られた各試料について、光透過特性、耐候性及び液相粘度を以下の方法によって測定または評価した。結果を表1に示す。
(2) Evaluation of each sample About each obtained sample, the light transmission characteristic, the weather resistance, and the liquid phase viscosity were measured or evaluated by the following methods. The results are shown in Table 1.
光透過特性は、両面を鏡面研磨した表1に記載の厚みの試料について、分光分析装置(島津製作所製 UV3100)を用いて、波長500nm、700nm、1200nmにおけるそれぞれの透過率を測定した。なお、波長500nm、700nm、1200nmにおける透過率が、それぞれ77%以上、26%以下、37%以下であれば、光透過特性が良好であると判断できる。 The light transmission characteristics of each of the samples of the thickness described in Table 1 mirror-polished on both sides were measured with respective transmittances at wavelengths of 500 nm, 700 nm, and 1200 nm using a spectral analyzer (UV3100 manufactured by Shimadzu Corporation). If the transmittances at wavelengths of 500 nm, 700 nm, and 1200 nm are 77% or more, 26% or less, and 37% or less, respectively, it can be determined that the light transmission characteristics are good.
耐候性は、両面を鏡面研磨した試料について、温度120℃、相対湿度100%の条件下に24時間保持した後、外観上の変化の有無により判定した。具体的には、試験後に外観上の変化が見られなかったものを「○」、白ヤケ等の外観上の変化が見られたものを「×」として評価した。 The weather resistance of the sample mirror-polished on both sides was determined under the conditions of a temperature of 120 ° C. and a relative humidity of 100% for 24 hours, and then judged by the presence or absence of a change in appearance. Specifically, those in which no change in appearance was observed after the test were evaluated as “○”, and those in which changes in appearance such as white discoloration were observed were evaluated as “x”.
液相粘度は次のようにして求めた。粒度300~600μmとなるように粗砕した試料を白金容器に入れ、温度傾斜炉中で24時間保持した。白金容器の底面において界面結晶が析出している最高温度を液相温度とした。そして試料の粘度を測定し、液相温度における粘度を液相粘度とした。 The liquid phase viscosity was determined as follows. The sample crushed to a particle size of 300 to 600 μm was placed in a platinum container and kept in a temperature gradient furnace for 24 hours. The maximum temperature at which interfacial crystals were deposited on the bottom of the platinum container was taken as the liquidus temperature. The viscosity of the sample was then measured, and the viscosity at the liquidus temperature was taken as the liquidus viscosity.
表1から明らかなように、本発明の実施例であるNo.1~6の試料は可視域での光透過率が高く、近赤外域での吸収が大きかった。また、耐候性評価において試験前後で変化が見られず、液相粘度も100.8dPa・s以上であり耐失透性にも優れていた。なお、厚みが0.24mm以下であるため、光学デバイスを薄型化しやすい。 As apparent from Table 1, No. 1 which is an embodiment of the present invention. Samples 1 to 6 had high light transmittance in the visible region and large absorption in the near infrared region. Further, no change was observed before and after the test in the weather resistance evaluation, and the liquid phase viscosity was 10 0.8 dPa · s or more, and the devitrification resistance was also excellent. In addition, since thickness is 0.24 mm or less, it is easy to make an optical device thin.
一方、比較例であるNo.7の試料は、液相粘度が100.4dPa・sであるため耐失透性に劣っていた。No.8の試料は、耐候性に劣っており、液相粘度が100.6dPa・sであるため耐失透性に劣っていた。No.9の試料はガラス化しなかった。
On the other hand, No. 1 which is a comparative example. The sample No. 7 was inferior in devitrification resistance because the liquidus viscosity was 10 0.4 dPa · s. No. The sample No. 8 was inferior in weather resistance and inferior in devitrification resistance because the liquidus viscosity was 10 0.6 dPa · s. No. The nine samples were not vitrified.
Claims (3)
The near-infrared absorbing glass according to claim 1 or 2, which is substantially free of Pb component and As component.
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| CN114538772B (en) * | 2022-03-24 | 2022-12-02 | 成都光明光电股份有限公司 | Glass, glass element and optical filter |
| CN116282915B (en) * | 2023-03-03 | 2025-01-28 | 齐鲁工业大学(山东省科学院) | High temperature resistant glass and preparation method thereof, glass preform and optical element |
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| JP2006342024A (en) * | 2005-06-09 | 2006-12-21 | Asahi Techno Glass Corp | Near-infrared cut filter glass |
| JP2011132077A (en) * | 2009-12-25 | 2011-07-07 | Hoya Corp | Near-infrared light absorbing glass, near-infrared light absorbing filter, and imaging device |
| JP2011162409A (en) * | 2010-02-12 | 2011-08-25 | Asahi Glass Co Ltd | Near infrared cut filter glass and method for producing near infrared cut filter glass |
| WO2011118724A1 (en) * | 2010-03-26 | 2011-09-29 | 旭硝子株式会社 | Process for production of near infrared ray cut filter glass |
| WO2016152561A1 (en) * | 2015-03-24 | 2016-09-29 | 旭硝子株式会社 | Near infrared cut filter glass |
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| JP2515268B2 (en) * | 1990-02-06 | 1996-07-10 | 東芝硝子株式会社 | Near infrared cut filter glass |
| JPH0692259B2 (en) * | 1991-06-18 | 1994-11-16 | 東芝硝子株式会社 | Near infrared cut filter glass |
| JP3157696B2 (en) * | 1995-03-14 | 2001-04-16 | 旭テクノグラス株式会社 | Near infrared cut filter glass |
| JP3396387B2 (en) * | 1997-01-09 | 2003-04-14 | 旭テクノグラス株式会社 | Near infrared cut filter glass |
| JP2006182585A (en) * | 2004-12-27 | 2006-07-13 | Asahi Techno Glass Corp | Filter glass for cutting near-infrared ray |
| JP2007099604A (en) * | 2005-09-06 | 2007-04-19 | Hoya Corp | Near infrared ray absorbing glass, near infrared ray absorbing element provided with the same and imaging device |
| JP4652941B2 (en) * | 2005-09-30 | 2011-03-16 | Hoya株式会社 | Lens and manufacturing method thereof |
| JP2007091537A (en) * | 2005-09-29 | 2007-04-12 | Hoya Corp | Near-infrared light absorbing glass material lot and method for manufacturing optical element by using the same |
| JP5051817B2 (en) * | 2006-06-21 | 2012-10-17 | Agcテクノグラス株式会社 | Visibility correction filter glass and visibility correction filter |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006342024A (en) * | 2005-06-09 | 2006-12-21 | Asahi Techno Glass Corp | Near-infrared cut filter glass |
| JP2011132077A (en) * | 2009-12-25 | 2011-07-07 | Hoya Corp | Near-infrared light absorbing glass, near-infrared light absorbing filter, and imaging device |
| JP2011162409A (en) * | 2010-02-12 | 2011-08-25 | Asahi Glass Co Ltd | Near infrared cut filter glass and method for producing near infrared cut filter glass |
| WO2011118724A1 (en) * | 2010-03-26 | 2011-09-29 | 旭硝子株式会社 | Process for production of near infrared ray cut filter glass |
| WO2016152561A1 (en) * | 2015-03-24 | 2016-09-29 | 旭硝子株式会社 | Near infrared cut filter glass |
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