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WO2018234224A3 - X-ray source with temperature controller - Google Patents

X-ray source with temperature controller Download PDF

Info

Publication number
WO2018234224A3
WO2018234224A3 PCT/EP2018/066080 EP2018066080W WO2018234224A3 WO 2018234224 A3 WO2018234224 A3 WO 2018234224A3 EP 2018066080 W EP2018066080 W EP 2018066080W WO 2018234224 A3 WO2018234224 A3 WO 2018234224A3
Authority
WO
WIPO (PCT)
Prior art keywords
ray source
liquid target
temperature controller
source
interaction region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2018/066080
Other languages
French (fr)
Other versions
WO2018234224A2 (en
Inventor
Björn HANSSON
Per TAKMAN
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Excillum AB
Original Assignee
Excillum AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Excillum AB filed Critical Excillum AB
Publication of WO2018234224A2 publication Critical patent/WO2018234224A2/en
Publication of WO2018234224A3 publication Critical patent/WO2018234224A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/12—Cooling non-rotary anodes
    • H01J35/13—Active cooling, e.g. fluid flow, heat pipes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/0035—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state the material containing metals as principal radiation-generating components
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0092—Housing of the apparatus for producing X-rays; Environment inside the housing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0094—Reduction, prevention or protection from contamination; Cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H01J2235/082—Fluids, e.g. liquids, gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Fluid Mechanics (AREA)
  • X-Ray Techniques (AREA)

Abstract

An X-ray source (100) is disclosed, comprising a liquid target source (110) configured to provide a liquid target (J) passing through an interaction region (I). The X-ray source further comprises an electron source (120) configured to provide an electron beam (E) directed towards the interaction region such that the electron beam interacts with the liquid target to generate X-ray radiation, a housing (130) separating the interaction region from an ambient region, and a temperature controller (140) adapted to control a surface temperature of at least a portion of an inner wall (132) of the housing. The surface temperature is controlled such that it is sufficient to liquefy material that stems from the liquid target and has been deposited on the portion of the inner wall.
PCT/EP2018/066080 2017-06-18 2018-06-18 X-RAY SOURCE WITH TEMPERATURE REGULATOR Ceased WO2018234224A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP17176517.5A EP3416180A1 (en) 2017-06-18 2017-06-18 X-ray source with temperature controller
EP17176517.5 2017-06-18

Publications (2)

Publication Number Publication Date
WO2018234224A2 WO2018234224A2 (en) 2018-12-27
WO2018234224A3 true WO2018234224A3 (en) 2019-03-21

Family

ID=59077921

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2018/066080 Ceased WO2018234224A2 (en) 2017-06-18 2018-06-18 X-RAY SOURCE WITH TEMPERATURE REGULATOR

Country Status (2)

Country Link
EP (1) EP3416180A1 (en)
WO (1) WO2018234224A2 (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7068367B2 (en) * 2002-10-08 2006-06-27 Xtreme Technologies Gmbh Arrangement for the optical detection of a moving target flow for a pulsed energy beam pumped radiation
US20060243927A1 (en) * 2005-04-29 2006-11-02 Tran Duc C Method and arrangement for the suppression of debris in the generation of short-wavelength radiation based on a plasma
US20090154642A1 (en) * 2007-12-14 2009-06-18 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US20100243922A1 (en) * 2009-02-12 2010-09-30 Takeshi Asayama Extreme ultraviolet light source apparatus
US20130319466A1 (en) * 2012-05-31 2013-12-05 Gigaphoton Inc Cleaning method for euv light generation apparatus
US20130327955A1 (en) * 2008-09-04 2013-12-12 Asml Netherlands B.V. Radiation source, lithographic apparatus and device manufacturing method
US20140348302A1 (en) * 2009-04-03 2014-11-27 Excillum Ab Supply of a liquid-metal target in x-ray generation
US20150090907A1 (en) * 2013-09-27 2015-04-02 Ushio Denki Kabushiki Kaisha Radiation Source for Generating Short-Wavelength Radiation from Plasma

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4953191A (en) * 1989-07-24 1990-08-28 The United States Of America As Represented By The United States Department Of Energy High intensity x-ray source using liquid gallium target
WO2010083854A1 (en) * 2009-01-26 2010-07-29 Excillum Ab X-ray window

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7068367B2 (en) * 2002-10-08 2006-06-27 Xtreme Technologies Gmbh Arrangement for the optical detection of a moving target flow for a pulsed energy beam pumped radiation
US20060243927A1 (en) * 2005-04-29 2006-11-02 Tran Duc C Method and arrangement for the suppression of debris in the generation of short-wavelength radiation based on a plasma
US20090154642A1 (en) * 2007-12-14 2009-06-18 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US20130327955A1 (en) * 2008-09-04 2013-12-12 Asml Netherlands B.V. Radiation source, lithographic apparatus and device manufacturing method
US20100243922A1 (en) * 2009-02-12 2010-09-30 Takeshi Asayama Extreme ultraviolet light source apparatus
US20140348302A1 (en) * 2009-04-03 2014-11-27 Excillum Ab Supply of a liquid-metal target in x-ray generation
US20130319466A1 (en) * 2012-05-31 2013-12-05 Gigaphoton Inc Cleaning method for euv light generation apparatus
US20150090907A1 (en) * 2013-09-27 2015-04-02 Ushio Denki Kabushiki Kaisha Radiation Source for Generating Short-Wavelength Radiation from Plasma

Also Published As

Publication number Publication date
WO2018234224A2 (en) 2018-12-27
EP3416180A1 (en) 2018-12-19

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