WO2018139447A1 - 半導体ナノ粒子の製造方法 - Google Patents
半導体ナノ粒子の製造方法 Download PDFInfo
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- WO2018139447A1 WO2018139447A1 PCT/JP2018/001978 JP2018001978W WO2018139447A1 WO 2018139447 A1 WO2018139447 A1 WO 2018139447A1 JP 2018001978 W JP2018001978 W JP 2018001978W WO 2018139447 A1 WO2018139447 A1 WO 2018139447A1
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- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/70—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing phosphorus
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
- B01J2/02—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic by dividing the liquid material into drops, e.g. by spraying, and solidifying the drops
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B25/00—Phosphorus; Compounds thereof
- C01B25/08—Other phosphides
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- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
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- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/56—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing sulfur
- C09K11/562—Chalcogenides
- C09K11/565—Chalcogenides with zinc cadmium
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- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/62—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing gallium, indium or thallium
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/88—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing selenium, tellurium or unspecified chalcogen elements
- C09K11/881—Chalcogenides
- C09K11/883—Chalcogenides with zinc or cadmium
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02543—Phosphides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02601—Nanoparticles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
Definitions
- the present invention relates to a method for producing semiconductor nanoparticles.
- Semiconductor nanoparticles such as semiconductor quantum dots have excellent fluorescence characteristics and are being applied to displays, lighting, biosensing, and the like. Research on semiconductor quantum dots is also underway as a material that improves the efficiency of solar cells.
- a semiconductor quantum dot containing a group 12 element or group 13 element and a group 15 element or group 16 element may be an excellent fluorescent material.
- Examples of such a semiconductor quantum dot include cadmium selenide. (CdSe) and indium phosphide (InP). Since the fluorescence wavelength of the semiconductor quantum dots changes depending on the particle diameter, the fluorescence wavelength can be controlled by controlling the particle diameter. In addition, the smaller the particle size distribution, the narrower the half width of the fluorescence peak, and a higher purity color can be obtained. Therefore, a manufacturing method of semiconductor quantum dots that can be controlled to an arbitrary particle size is required.
- a solvothermal method has been proposed as a method for manufacturing semiconductor quantum dots.
- a semiconductor quantum dot is synthesized by mixing a metal ion precursor and an anion precursor in a coordinating organic solvent and heating.
- indium chloride, trisdimethylaminophosphine, dodecylamine, and toluene are put in a sealed container, sealed with argon, and heated at 180 ° C. for 24 hours while being protected with a stainless steel jacket.
- Is a method for producing indium phosphide see, for example, Patent Document 1). In this method, indium phosphide having a wide particle size distribution is obtained, and the fluorescence spectrum also shows a wide shape.
- Semiconductor nanoparticles produced by the solvothermal method have a wide particle size distribution, and particle selection is required to obtain semiconductor nanoparticles having only a specific fluorescence wavelength. Sorting requires a lot of organic solvent and time, and the material yield also deteriorates. Further, the fluorescence peak wavelength of indium phosphide obtained by the solvothermal method is, for example, about 620 nm to 640 nm, and the fluorescence wavelength obtained by classification is a short wavelength (for example, 570 nm or less, preferably 550 nm or less). There is a problem that the production efficiency is very low.
- a method capable of efficiently producing indium phosphide having a fluorescence peak wavelength of a long wavelength to a short wavelength that is, a method capable of efficiently producing indium phosphide having a desired fluorescence peak wavelength is desirable.
- An object of one embodiment of the present invention is to provide a method for producing semiconductor nanoparticles capable of efficiently producing indium phosphide having a desired fluorescence peak wavelength.
- the means for solving the above problems include the following embodiments.
- a liquid (1) containing indium and a liquid (2) containing phosphorus are prepared, and one of the liquid (1) and the liquid (2) is sprayed from an atomizing section in an inert gas, The sprayed liquid droplet is brought into contact with the other liquid (1) and the other liquid (2) that is not sprayed, and the liquid (1) and the liquid (2) are mixed to at least indium.
- a method for producing semiconductor nanoparticles wherein semiconductor nanoparticles containing indium and phosphorus are produced by reacting phosphine with phosphorus.
- a liquid (3) containing indium and phosphorus is sprayed from an atomizing section in an inert gas, and the sprayed liquid droplets are brought into contact with the liquid (4), so that the liquid (3) and the liquid (4) Are mixed to react at least indium and phosphorus to produce semiconductor nanoparticles containing indium and phosphorus.
- ⁇ 4> At least a part of the flow path of the liquid to be sprayed, or arranged at a position where the first electrode attached to at least a part of the flow path contacts the liquid to be sprayed ⁇ 2>
- the potential difference between the first electrode and the second electrode is 0.3 kV to 30 kV in absolute value.
- ⁇ 6> The method for producing semiconductor nanoparticles according to any one of ⁇ 1> to ⁇ 5>, wherein a diameter of the sprayed droplet is 0.1 ⁇ m to 100 ⁇ m.
- the semiconductor nanoparticles have core particles containing at least indium and phosphorus. After forming the core particles, at least a part of the group 12 element and the group 13 element and the group 16 are formed on at least a part of the core particle surface.
- ⁇ 8> The method for producing semiconductor nanoparticles according to any one of ⁇ 1> to ⁇ 7>, wherein a spray port width in the spray part is 0.03 mm to 2.0 mm.
- a liquid feeding speed of the sprayed liquid is 0.001 mL / min to 1 mL / min for each flow path including the spray unit.
- ⁇ 10> The method for producing semiconductor nanoparticles according to any one of ⁇ 1> to ⁇ 9>, wherein a liquid containing indium and phosphorus is heated when at least indium and phosphorus are reacted.
- a method for producing semiconductor nanoparticles capable of efficiently producing indium phosphide having a desired fluorescence peak wavelength can be provided.
- 6 is a graph showing the relationship between the synthesis temperature of semiconductor nanoparticles, the fluorescence peak wavelength, and the half-value width in Examples 1 to 6.
- 6 is a graph showing the relationship between the spray voltage of semiconductor nanoparticles, the fluorescence peak wavelength, and the half-value width in Examples 7 to 11 and Examples 18 and 19.
- 10 is a graph showing the relationship between the molar ratio of indium and phosphorus of semiconductor nanoparticles in Examples 12 to 17, the fluorescence peak wavelength, and the half width.
- 10 is a graph showing the relationship between the diameter of the spray nozzle, the fluorescence peak wavelength, and the half-value width in Examples 20 to 25.
- numerical ranges indicated using “to” include numerical values described before and after “to” as the minimum value and the maximum value, respectively.
- the upper limit value or the lower limit value described in one numerical range may be replaced with the upper limit value or the lower limit value of another numerical description.
- the upper limit value or the lower limit value of the numerical range may be replaced with the values shown in the examples.
- the method for producing semiconductor nanoparticles of the present disclosure includes a liquid (1) containing indium (hereinafter also referred to as “liquid (1)”) and a liquid (2) containing phosphorus (hereinafter referred to as “liquid (2)”).
- liquid (1) or the liquid (2) is sprayed from the spraying part in an inert gas, and the sprayed droplets are taken out of the liquid (1) and the liquid (2).
- the liquid (1) and the liquid (2) are mixed and reacted with at least indium and phosphorus to produce semiconductor nanoparticles containing indium and phosphorus.
- one of the liquid (1) containing indium or the liquid (2) containing phosphorus is sprayed from an atomizing section in an inert gas, and the sprayed droplets are liquid (1 ) And the other liquid (2) which is not sprayed.
- both liquids are brought into contact and mixed, at least indium and phosphorus react to produce semiconductor nanoparticles containing indium and phosphorus.
- the sprayed droplet which is one of the liquid (1) or the liquid (2) is brought into contact with the other liquid to produce semiconductor nanoparticles containing indium and phosphorus, Control of the particle diameter of the manufactured semiconductor nanoparticles is easy, and control of the fluorescence wavelength of the manufactured semiconductor nanoparticles (for example, control of the fluorescence wavelength on the short wavelength side) becomes easy. Therefore, semiconductor nanoparticles having a fluorescence peak wavelength of a long wavelength to a short wavelength can be selectively and efficiently manufactured, and semiconductor nanoparticles having a desired fluorescence peak wavelength can be efficiently manufactured. In addition, for example, semiconductor nanoparticles having a short fluorescent wavelength (for example, 570 nm or less, preferably 550 nm or less) tend to be efficiently produced.
- a short fluorescent wavelength for example, 570 nm or less, preferably 550 nm or less
- semiconductor nanoparticles mean particles having an average particle diameter of 1 nm to 100 nm.
- the average particle diameter of the semiconductor nanoparticles is the particle diameter (D50) when the accumulation from the small diameter side becomes 50% in the volume-based particle size distribution measured by the laser diffraction method.
- the shape of the “semiconductor nanoparticle” is not particularly limited, and may be spherical, oval, flake, rectangular parallelepiped, columnar, irregular, etc., spherical, oval, flake, rectangular A part of the shape, columnar shape or the like may be an irregular shape.
- the “semiconductor nanoparticles” may include at least indium and phosphorus.
- the semiconductor nanoparticle may be a mixture of a dispersant, other organic solvent, an indium compound, an atom, a molecule, or the like contained in a phosphorus compound in the manufacturing process.
- the liquid (1) containing indium used in the method for producing semiconductor nanoparticles may be a liquid containing an indium source, for example, a liquid containing at least one of metallic indium and an indium compound.
- a solution in which an indium compound such as indium chloride is heated and dissolved in a dispersant such as oleylamine may be used.
- solid may precipitate at normal temperature (25 degreeC).
- the indium compound is not particularly limited as long as it contains indium element, indium halide such as indium chloride, indium bromide, indium iodide, indium oxide, indium nitride, indium sulfide, indium hydroxide, indium acetate, Indium isopropoxide and the like can be mentioned.
- indium chloride is preferable because of its high reactivity with phosphorus compounds (for example, trisdimethylaminophosphine) and relatively low market price.
- the liquid (1) containing indium preferably contains a dispersant from the viewpoint of suppressing aggregation of an indium compound or the like in the liquid.
- a dispersant a coordinating organic solvent is preferable.
- organic amines such as dodecylamine, tetradecylamine, hexadecylamine, oleylamine, trioctylamine, eicosylamine, lauric acid, capron Acids, myristic acid, palmitic acid, fatty acids such as oleic acid, and organic phosphine oxides such as trioctyl phosphine oxide, among others, have excellent reactivity with phosphorus compounds and promote the generation of indium phosphide.
- oleylamine is preferable because it has a high boiling point and is difficult to volatilize during high-temperature synthesis.
- the total content of metal indium and indium compound with respect to 1 mL of the dispersant is preferably 0.01 g to 0.2 g, and 0.03 g to 0.15 g. More preferably, it is 0.05 to 0.10 g.
- the liquid (1) containing indium may contain another organic solvent.
- organic solvents include aliphatic saturated hydrocarbons such as n-hexane, n-heptane, n-octane, n-nonane, n-decane, n-dodecane, n-hexadecane, n-octadecane, 1-undecene, Examples thereof include aliphatic unsaturated hydrocarbons such as 1-dodecene, 1-hexadecene and 1-octadecene, and trioctylphosphine.
- the liquid (2) containing phosphorus used in the method for producing semiconductor nanoparticles may be a liquid containing a phosphorus source, for example, a liquid containing phosphorus alone or a phosphorus compound.
- a liquid (2) containing phosphorus may be obtained by dissolving the phosphorus compound in a dispersant such as oleylamine.
- the phosphorus compound is a liquid, the phosphorus compound alone or a mixture of the phosphorus compound and a dispersant such as oleylamine may be used as the liquid (2) containing phosphorus.
- the phosphorus compound is not particularly limited as long as it contains a phosphorus element, and examples thereof include trisdimethylaminophosphine, trisdiethylaminophosphine, tristrimethylsilylphosphine, and phosphine (PH 3 ).
- Trisdimethylaminophosphine is preferable because it is rich, has a high boiling point, is suitable for high-temperature synthesis, and has low toxicity compared to silyl-based phosphorus compounds.
- the dispersant examples include those used in the liquid (1) containing indium described above.
- the liquid (2) containing phosphorus may contain the other organic solvent as described above, similarly to the liquid (1) containing indium.
- the content of the phosphorus compound with respect to 1 mL of the dispersant is preferably 0.1 g to 0.5 g, more preferably 0.15 g to 0.4 g.
- the amount is preferably 0.2 g to 0.3 g.
- one of the liquid (1) and the liquid (2) is sprayed from the spray section in an inert gas, and the sprayed droplets are converted into the liquid (1) and the liquid (2).
- the inert gas include nitrogen, argon, carbon dioxide, sulfur hexafluoride (SF 6 ), and a mixed gas thereof.
- the liquid (2) is sprayed from the spraying part in an inert gas, and the sprayed droplets are liquid (1).
- the method for producing semiconductor nanoparticles of the present disclosure it is preferable to perform one spray of the liquid (1) or the liquid (2) by electrospray.
- the particle diameter of the semiconductor nanoparticles can be suitably controlled, and semiconductor nanoparticles having a desired fluorescence peak wavelength tend to be more efficiently produced.
- electrospray refers to a device that forms an electric field by applying a voltage between electrodes and sprays the liquid by Coulomb force, or a state in which the liquid is sprayed by the device.
- At least a part of a flow path (for example, a nozzle) of a liquid to be sprayed, or a first electrode attached to at least a part of the flow path, and the droplets It is preferable to use a second electrode disposed at a position in contact with the liquid to be sprayed.
- the first electrode and the second electrode are for forming an electrostatic field between them by applying a voltage.
- Examples of the shape of the second electrode include a substantially ring shape, a substantially cylindrical shape, a substantially mesh shape, a substantially rod shape, a substantially spherical shape, and a substantially hemispherical shape.
- the potential difference (spray voltage) between the first electrode and the second electrode is preferably 0.3 kV to 30 kV in absolute value, and more preferably 1.0 kV to 10 kV.
- the spray voltage is 1.0 kV to 8. It is preferably less than 0 kV.
- the spray voltage is preferably less than 2.0 kV or 4.0 kV or more, more preferably 5.0 kV to 10.0 kV, More preferably, it is 6.0 kV to 10.0 kV.
- the diameter of the sprayed droplets is preferably 0.1 ⁇ m to 100 ⁇ m, more preferably 1 ⁇ m to 50 ⁇ m, from the viewpoint of more efficiently producing semiconductor nanoparticles having a desired fluorescence peak wavelength. More preferably, it is ⁇ 10 ⁇ m.
- the diameter of the sprayed liquid droplets can be adjusted, for example, by adjusting the size of the spraying part (spray port width, etc.) for spraying the liquid droplets, the liquid feed speed, surface tension, viscosity, ionic strength and ratio of the liquid to be sprayed. It can be appropriately adjusted by adjusting the dielectric constant, adjusting the voltage when spraying by electrospray, or adjusting the type of inert gas.
- the width of the spray port in the spray section for spraying droplets is preferably 0.03 mm to 2.0 mm, more preferably 0.03 mm to 1.5 mm, and 0.05 mm to 1.0 mm. Is more preferably 0.07 mm to 0.70 mm, even more preferably 0.08 to 0.60 mm, and even more preferably 0.25 mm to 0.40 mm.
- Spray port refers to the part that sprays droplets to the outside.
- the shape of the spray port may be a circular shape, a polygonal shape, or the like, or may be a zigzag shape, a wave shape, a brush shape, or the like when viewed from the side.
- the width of the spray port refers to a length that maximizes the distance between the surfaces when the periphery is sandwiched between two parallel surfaces. When the spray port has a circular shape, the width of the spray port refers to the diameter of the spray port.
- the liquid feeding speed of the liquid to be sprayed is preferably 0.001 mL / min to 1 mL / min per channel (for example, a nozzle) provided with a spraying section for spraying droplets, and 0.01 mL / min to 0 More preferably, it is 1 mL / min, and even more preferably 0.02 mL / min to 0.05 mL / min.
- the liquid feeding speed of the nozzle satisfies the above numerical range.
- spraying droplets from a plurality of nozzles it is preferable that the liquid feeding speeds of the plurality of nozzles all satisfy the above-described numerical range.
- a spraying port that is a tip of a spraying section that sprays one of the liquid (1) and the liquid (2), and a liquid level of the other liquid that is not sprayed out of the liquid (1) and the liquid (2)
- the distance is preferably 2 mm to 100 mm, more preferably 5 mm to 70 mm, and still more preferably 10 mm to 50 mm, from the viewpoint of suppressing fluctuation of the shape of the sprayed droplets.
- the heating temperature of the liquid containing indium and phosphorus is not particularly limited, and is preferably 80 ° C. to 350 ° C. From the viewpoint of more efficiently producing semiconductor nanoparticles having a short fluorescent wavelength, the heating temperature is 100 ° C.
- the temperature is more preferably 220 ° C, and further preferably 120 ° C to 190 ° C.
- the molar ratio of indium atoms to phosphorus atoms (indium atoms: phosphorus atoms) in a liquid containing indium and phosphorus makes it possible to more efficiently produce semiconductor nanoparticles having a short fluorescent wavelength. Therefore, it is preferably 1: 1 to 1:16, and more preferably more than 1: 2 and less than 1: 8 from the viewpoint of efficiently producing semiconductor nanoparticles having a narrow particle size distribution. It is more preferably 3 to 1: 7, and particularly preferably 1: 4 to 1: 6.
- the semiconductor nanoparticle has a core particle containing at least indium and phosphorus.
- a group 12 element and a group 13 element are formed on at least a part of the surface of the core particle.
- a layer (shell layer) containing at least one of the group 16 elements may be formed.
- the shell layer formed on at least a part of the surface of the core particle may have a single layer structure or a multilayer structure (core multishell structure).
- Examples of the Group 12 element include zinc and cadmium, examples of the Group 13 element include gallium and the like, and examples of the Group 16 element include oxygen, sulfur, selenium, and tellurium.
- the layer formed on at least a part of the core particle surface is preferably one containing zinc, and more specifically, includes CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, InGaZnO, and the like. Of these, ZnS is preferable.
- the method of forming a shell layer containing at least one of group 12 element and group 13 element and group 16 element on at least a part of the surface of the core particle is not particularly limited.
- a liquid that contains at least one of a group 12 element and a group 13 element and a group 16 element are added to the liquid containing the particles.
- a substance serving as a supply source may be added, a solvent may be further added as necessary, and then the liquid may be heated while stirring.
- semiconductor nanoparticles having a shell layer containing at least one of group 12 element and group 13 element and group 16 element on at least a part of the surface of the core particle can be produced.
- examples of the substance that serves as a zinc supply source include zinc compounds, and more specifically, zinc halides such as zinc stearate and zinc chloride.
- examples of the sulfur source include sulfur compounds, more specifically, thiols such as dodecanethiol and tetradecanethiol, and sulfides such as dihexyl sulfide. .
- the solvent used as necessary include the above-mentioned other organic solvents. Among them, 1-octadecene is preferable.
- the substance serving as the supply source of at least one of the group 12 element and the group 13 element or the substance serving as the supply source of the group 16 element is at least one of the liquid (1) containing indium and the liquid (2) containing phosphorus. May be included.
- the particles (core particles) containing at least indium and phosphorus are described above. After the formation as described above, the same operation as described above may be performed by adding a substance serving as a supply source of the group 16 element to the liquid containing the particles.
- the substance serving as the supply source of the group 16 element is contained in at least one of the liquid (1) and the liquid (2), after forming particles (core particles) containing at least indium and phosphorus as described above
- the same operation as described above may be performed by adding a substance serving as a supply source of at least one of the group 12 element and the group 13 element to the liquid containing the particles.
- the reaction temperature is preferably 150 ° C. to 350 ° C.
- the reaction time is more preferably from 1 to 200 ° C., the reaction time is preferably from 1 to 200 hours, more preferably from 2 to 100 hours, still more preferably from 3 to 25 hours.
- a liquid (3) containing indium and phosphorus (hereinafter, also referred to as “liquid (3)”) is sprayed from a spraying part in an inert gas, and the sprayed droplets May be brought into contact with the liquid (4), and the liquid (3) and the liquid (4) may be mixed to react at least indium and phosphorus to produce semiconductor nanoparticles containing indium and phosphorus.
- liquid (3) a liquid (3) containing indium and phosphorus
- the semiconductor nanoparticle manufacturing method of the first embodiment described above one of indium and phosphorus is included in the liquid to be sprayed and the liquid in contact with the sprayed liquid, respectively, while the semiconductor nanoparticle of the second embodiment is included.
- the first embodiment is different from the second embodiment in that both indium and phosphorus are contained in the sprayed liquid.
- semiconductor nanoparticles having a fluorescence peak wavelength of a long wavelength to a short wavelength can be selectively and efficiently manufactured, and semiconductor nanoparticles having a desired fluorescence peak wavelength can be efficiently manufactured.
- the liquid (3) containing indium and phosphorus preferably contains the above-mentioned dispersant from the viewpoint of suppressing aggregation of an indium compound or the like in the liquid.
- the total content of metal indium and indium compound with respect to 1 mL of the dispersant is preferably 0.01 g to 0.2 g, and 0.03 g to 0 More preferably, it is .15 g, and even more preferably 0.05 g to 0.10 g.
- the liquid (4) is not particularly limited, and may include the above-described dispersant, other organic solvents, and the like.
- FIG. 1 is a schematic diagram illustrating a production apparatus used in the method for producing semiconductor nanoparticles of the present disclosure.
- the liquid supply source 1 includes a liquid supply source 1 to be sprayed, a spray unit 2 that also functions as a first electrode, a mesh-like counter electrode 3 that serves as a second electrode, and a voltage application unit.
- the power supply 4 and the reactor 5 which has the edge part of the spraying part 2, and the counter electrode 3 at least inside are provided.
- the supply source 1 is for supplying the sprayed liquid to the spray unit 2.
- a liquid (2) containing phosphorus is supplied from the supply source 1 to the spray unit 2.
- the counter electrode 3 is arrange
- the liquid L2 which is the liquid (1) containing an indium is stored so that the counter electrode 3 may be contacted.
- the reactor 5 is filled with an inert gas. Note that, for each inert gas supply unit that supplies the inert gas into the reactor 5, the inert gas may be circulated in the reactor 5 at a gas flow rate of an arbitrary value of more than 0 L / min and not more than 10 L / min. Good.
- the spray unit 2 is configured to electrostatically spray the liquid supplied from the supply source 1.
- the liquid (2) containing phosphorus supplied from the supply source 1 is sprayed from the spray port of the spray unit 2 in the state of the fine liquid droplets L1.
- the spray unit 2 functioning as the first electrode is disposed so as to spray the micro droplet L1 in a direction orthogonal to the plane of the counter electrode 3.
- the power source 4 is a high voltage power source electrically connected to each of the spray unit 2 and the counter electrode 3.
- the power source 4 may be configured such that the spray unit 2 has a positive potential and the counter electrode 3 has a lower potential than the spray unit 2, the spray unit 2 has a negative potential, and the counter electrode 3 has the spray unit.
- the potential may be higher than 2.
- a voltage is applied to the spray unit 2 and the counter electrode 3 by the power source 4, and the micro droplet L 1 is sprayed from the spray port of the spray unit 2 in a state where an electrostatic field is formed between the spray unit 2 and the counter electrode 3.
- the micro droplet L1 moves toward the liquid L2 along the electric field gradient in a charged state, and comes into contact with the liquid surface of the liquid L2.
- both liquids are brought into contact and mixed, at least indium and phosphorus react to produce semiconductor nanoparticles containing indium and phosphorus.
- the manufactured semiconductor nanoparticles are dispersed in the liquid L2 to obtain a semiconductor nanoparticle dispersion.
- the fine liquid droplet L1 may be sprayed while stirring the liquid L2.
- the liquid L2 stored in the reactor 5 is an oil bath, aluminum It is preferably heated by heating means (not shown) such as a bath, a mantle heater, an electric furnace, an infrared furnace.
- a semiconductor nanoparticle in which a shell layer containing at least one of group 12 element and group 13 element and group 16 element is formed on at least a part of the surface of the particle manufactured by the manufacturing apparatus 10 may be used.
- a semiconductor nanoparticle may be manufactured by circulating a liquid in the reactor and spraying droplets on the distributed liquid, and the manufactured semiconductor nanoparticle may be collected each time. Thereby, a semiconductor nanoparticle can be manufactured continuously.
- the manufacturing method of semiconductor nanoparticles of the present disclosure can be applied to manufacturing fluorescent materials for various liquid crystal displays, and can also be applied to manufacturing various electronic devices equipped with liquid crystal displays.
- Examples 1 to 6 Using the manufacturing method of the first embodiment described above, indium phosphide was synthesized at the temperatures shown in Table 1, and an outer shell (shell layer) of zinc sulfide was formed on the surface of the synthesized indium phosphide. was measured. Indium chloride and trisdimethylaminophosphine were used as raw materials, and oleylamine was used as a dispersant.
- This example was performed as follows. First, 0.3 g of indium chloride was weighed into a glass reaction vessel, and 5 mL of oleylamine was added and mixed. This operation was performed under a dry nitrogen atmosphere in order to prevent moisture absorption of indium chloride. Subsequently, while flowing nitrogen through the reaction vessel, the mixture was heated to 120 ° C. in an oil bath to dissolve indium chloride in oleylamine. Subsequently, the reaction vessel was heated to the temperature shown in Table 1 with an oil bath, and from a stainless steel tube (spray portion) having an inner diameter of 0.5 mm with a tip at a distance of 3.5 cm from the liquid surface, trisdimethylaminophosphine 1.
- the fluorescence spectrum of the resulting dispersion of indium phosphide semiconductor nanoparticles was measured by irradiating with 450 nm light, and the fluorescence peak wavelength and half The price range was determined.
- the half width is a peak width at half the peak height and means a full width at half maximum (FWHM). The results are shown in Table 1.
- the semiconductor nanoparticles (S02 to S07) produced in Examples 1 to 6 were compared with the semiconductor nanoparticles (S01) produced in Comparative Example 1 in the fluorescence peak wavelength. was short and the full width at half maximum was small.
- FIG. 2 when the fluorescence spectrum was measured for the semiconductor nanoparticles (S05) produced at a synthesis temperature of 180 ° C., a fluorescence peak of 525 ⁇ 20 nm was obtained.
- Examples 7 to 11, Examples 18 and 19 After synthesizing indium phosphide by electrospray with the voltage shown in Table 2 using the manufacturing method of the first embodiment described above, and forming an outer shell (shell layer) of zinc sulfide on the surface of the synthesized indium phosphide The fluorescence spectrum was measured. Indium chloride and trisdimethylaminophosphine were used as raw materials, and oleylamine was used as a dispersant.
- This example was performed as follows. First, 0.3 g of indium chloride was weighed into a glass reaction vessel, and 5 mL of oleylamine was added and mixed. This operation was performed under a dry nitrogen atmosphere in order to prevent moisture absorption of indium chloride. Subsequently, while flowing nitrogen through the reaction vessel, the mixture was heated to 120 ° C. in an oil bath to dissolve indium chloride in oleylamine. Subsequently, the reaction vessel was heated to 180 ° C.
- the fluorescence peak wavelength and the half-value width of the fluorescence obtained from the semiconductor nanoparticles (S08 to S12, S19 and S20) produced in Examples 7 to 11, 18 and 19 are as follows: It fluctuates by applying a spray voltage, and also fluctuates by changing the magnitude of the spray voltage.
- FIG. 3 when the fluorescence spectrum was measured for semiconductor nanoparticles (S08 to S10 and S20) produced with a spray voltage of 1.0 kV to 6.0 kV, fluorescence of 525 ⁇ 20 nm was obtained. .
- the spray voltage was in the range of 2.0 kV to 10.0 kV, the full width at half maximum was expanded by making the spray voltage smaller.
- the spray voltage is preferably 1.0 kV to less than 8.0 kV from the viewpoint of obtaining fluorescence of 525 ⁇ 20 nm, while the spray voltage is less than 2.0 kV or 4.0 kV from the point of reducing the half width. It is presumed that the above is preferable and 6.0 kV to 10.0 kV is more preferable.
- indium phosphide was synthesized with the molar ratio of indium to phosphorus shown in Table 3 (molar ratio of indium atoms to phosphorus atoms in the raw material, indium atoms: phosphorus atoms). Then, after forming an outer shell (shell layer) of zinc sulfide on the surface of the synthesized indium phosphide, the fluorescence spectrum was measured. Indium chloride and trisdimethylaminophosphine were used as raw materials, and oleylamine was used as a dispersant.
- This example was performed as follows. First, 0.3 g of indium chloride was weighed into a glass reaction vessel, and 5 mL of oleylamine was added and mixed. This operation was performed under a dry nitrogen atmosphere in order to prevent moisture absorption of indium chloride. Subsequently, while flowing nitrogen through the reaction vessel, the mixture was heated to 120 ° C. in an oil bath to dissolve indium chloride in oleylamine. Subsequently, the reaction vessel was heated to 180 ° C. with an oil bath, and from an stainless steel tube (spray part) having an inner diameter of 0.5 mm with a tip at a distance of 3.5 cm from the liquid level, indium and phosphorus were sprayed after 21 minutes of spraying.
- Trisdimethylaminophosphine was sprayed by electrospray at a constant feeding speed so that the molar ratio became the value shown in Table 3.
- the spray voltage was 6.0 kV. Thereafter, it was allowed to cool to room temperature to obtain a solution sample containing indium phosphide.
- the fluorescence peak wavelength and the half value width of the fluorescence obtained from the semiconductor nanoparticles (S13 to S18) produced in Examples 12 to 17 are the molar ratio of indium and phosphorus at the time of synthesis. Fluctuates depending on. In particular, as shown in FIG. 4, when the fluorescence spectrum was measured for semiconductor nanoparticles (S13 to S16) produced with a molar ratio of indium to phosphorus of phosphorus 1 to 6 with respect to indium 1, fluorescence of 525 ⁇ 20 nm was measured. was gotten. On the other hand, the full width at half maximum was increased by increasing or decreasing from phosphorus 4 with respect to indium 1.
- the fluorescence peak wavelength and the half-value width significantly decreased when the amount of phosphorus was increased from that of phosphorus 8 relative to indium 1.
- the molar ratio of indium to phosphorus is preferably smaller than phosphorus 8 with respect to indium 1, and in particular, in terms of reducing the half width, indium 1 is used.
- Examples 20 to 25 Using the manufacturing method of the first embodiment described above, indium phosphide was synthesized using a spray part having a spray port with a diameter shown in Table 4 for electrospray, and zinc sulfide was added to the surface of the synthesized indium phosphide. After forming the shell (shell layer), the fluorescence spectrum was measured. Indium chloride and trisdimethylaminophosphine were used as raw materials, and oleylamine was used as a dispersant.
- This example was performed as follows. First, 0.3 g of indium chloride was weighed into a glass reaction vessel, and 5 mL of oleylamine was added and mixed. This operation was performed under a dry nitrogen atmosphere in order to prevent moisture absorption of indium chloride. Subsequently, while flowing nitrogen through the reaction vessel, the mixture was heated to 120 ° C. in an oil bath to dissolve indium chloride in oleylamine. Subsequently, the reaction vessel was heated to 180 ° C. in an oil bath, and a constant liquid feeding speed was obtained from a stainless steel tube (spraying portion) having an inner diameter of 0.08 to 0.80 mm, the tip of which was 3.5 cm from the liquid surface.
- Trisdimethylaminophosphine was sprayed by electrospray for 21 minutes at (0.050 mL / min). The spray voltage was 6.0 kV. Thereafter, it was allowed to cool to room temperature to obtain a solution sample containing indium phosphide.
- the fluorescence peak wavelength and the half-value width of the fluorescence obtained from the semiconductor nanoparticles (S21 to S26) produced in Examples 20 to 25 are the diameter of the spray port used in the synthesis (spraying). It varies depending on the width of the mouth. In particular, as shown in FIG. 5, when a fluorescence spectrum was measured when the diameter of the spray port was 0.08 mm to 0.60 mm (S21 to S25), fluorescence of 525 ⁇ 20 nm was obtained. On the other hand, the full width at half maximum changed to a U-shape, and a particularly narrow half width was obtained when the diameter of the spray port was 0.25 mm to 0.40 mm.
- the diameter of the spray nozzle is preferably 0.60 mm or less, and particularly from the point of reducing the half width, it should be 0.25 mm to 0.40 mm. Is presumed to be preferable.
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Abstract
Description
<2> インジウム及びリンを含む液体(3)を不活性ガス中で噴霧部から噴霧し、噴霧された液滴を、液体(4)に接触させ、前記液体(3)と前記液体(4)とを混合して少なくともインジウムとリンとを反応させ、インジウム及びリンを含む半導体ナノ粒子を製造する半導体ナノ粒子の製造方法。
<3> 前記噴霧をエレクトロスプレーによって行う、<1>又は<2>に記載の半導体ナノ粒子の製造方法。
<4> 噴霧される液体の流路の少なくとも一部を構成する、あるいは、前記流路の少なくとも一部に取り付けられた第1電極と、前記液滴が噴霧される液体と接触する位置に配置された第2電極と、の間に電位差を設けて前記エレクトロスプレーによる前記噴霧を行う<3>に記載の半導体ナノ粒子の製造方法。
<5> 前記第1電極と前記第2電極との電位差が、絶対値で0.3kV~30kVである<4>に記載の半導体ナノ粒子の製造方法。
<6> 前記噴霧された液滴の直径は、0.1μm~100μmである<1>~<5>のいずれか1つに記載の半導体ナノ粒子の製造方法。
<7> 前記半導体ナノ粒子はインジウム及びリンを少なくとも含むコア粒子を有し、前記コア粒子を形成後に、前記コア粒子表面の少なくとも一部に、12族元素及び13族元素の少なくとも一方ならびに16族元素を含む層を形成する<1>~<6>のいずれか1つに記載の半導体ナノ粒子の製造方法。
<8> 前記噴霧部における噴霧口の幅は、0.03mm~2.0mmである<1>~<7>のいずれか1つに記載の半導体ナノ粒子の製造方法。
<9> 前記噴霧される液体の送液速度が、前記噴霧部を備える流路ひとつにつき0.001mL/min~1mL/minである<1>~<8>のいずれか1つに記載の半導体ナノ粒子の製造方法。
<10> 少なくともインジウムとリンとを反応させる際、インジウム及びリンを含む液体を加熱する<1>~<9>のいずれか1つに記載の半導体ナノ粒子の製造方法。
<11> 前記インジウム及びリンを含む液体の加熱温度は、80℃~350℃である<10>に記載の半導体ナノ粒子の製造方法。
<12> 前記液滴の噴霧後において、インジウム及びリンを含む液体におけるインジウム原子とリン原子とのモル比率(インジウム原子:リン原子)は、1:1~1:16である<1>~<11>のいずれか1つに記載の半導体ナノ粒子の製造方法。
本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
[半導体ナノ粒子の製造方法]
本開示の半導体ナノ粒子の製造方法は、インジウムを含む液体(1)(以下、「液体(1)」とも称する。)と、リンを含む液体(2)(以下、「液体(2)」とも称する。)と、を用意し、液体(1)又は液体(2)の一方を不活性ガス中で噴霧部から噴霧し、噴霧された液滴を、液体(1)及び液体(2)のうちの噴霧されていない他方の液体に接触させ、液体(1)と液体(2)とを混合して少なくともインジウムとリンとを反応させ、インジウム及びリンを含む半導体ナノ粒子を製造する。
また、例えば、蛍光波長が短波長(例えば、570nm以下、好ましくは550nm以下)である半導体ナノ粒子を効率的に製造することができる傾向にある。
不活性ガスとしては、窒素、アルゴン、二酸化炭素、六フッ化硫黄(SF6)、これらの混合ガス等が挙げられる。
蛍光波長が短波長である半導体ナノ粒子をより効率的に製造する、特に蛍光波長が500nm~550nmである半導体ナノ粒子をより効率的に製造する点から、スプレー電圧は、1.0kV~8.0kV未満であることが好ましい。
粒子径分布の狭い半導体ナノ粒子を効率的に製造する点から、スプレー電圧は、2.0kV未満又は4.0kV以上であることが好ましく、5.0kV~10.0kVであることがより好ましく、6.0kV~10.0kVであることが更に好ましい。
噴霧された液滴の直径は、例えば、液滴を噴霧する噴霧部のサイズ(噴霧口の幅等)を調整したり、噴霧される液体の送液速度、表面張力、粘度、イオン強度及び比誘電率を調整したり、エレクトロスプレーにより噴霧を行う場合に電圧を調整したり、不活性ガスの種類を調整したりすることで適宜調整することができる。
例えば、1本のノズルから液滴を噴霧する場合、ノズルにおける液体の送液速度は、前述の数値範囲を満たすことが好ましい。また、複数のノズルから液滴を噴霧する場合、複数のノズルにおける液体の送液速度は、いずれも前述の数値範囲を満たすことが好ましい。
16族元素が硫黄である場合、硫黄の供給源となる物質としては、硫黄化合物が挙げられ、より具体的にはドデカンチオール、テトラデカンチオール等のチオール類、ジヘキシルスルフィド等のスルフィド類などが挙げられる。なお、トリオクチルホスフィンに硫黄を溶解させたものを、硫黄の供給源としてもよい。
必要に応じて用いられる溶媒としては、前述のその他の有機溶媒が挙げられ、中でも、1-オクタデセンが好ましい。
[半導体ナノ粒子の製造方法]
本開示の半導体ナノ粒子の製造方法は、インジウム及びリンを含む液体(3)(以下、「液体(3)」とも称する。)を不活性ガス中で噴霧部から噴霧し、噴霧された液滴を、液体(4)に接触させ、前記液体(3)と前記液体(4)とを混合して少なくともインジウムとリンとを反応させ、インジウム及びリンを含む半導体ナノ粒子を製造してもよい。前述の第1実施形態の半導体ナノ粒子の製造方法では、噴霧される液体及び噴霧された液体と接触する液体に、インジウム又はリンの一方がそれぞれ含まれている一方、第2実施形態の半導体ナノ粒子の製造方法では、噴霧される液体にインジウム及びリンの両方が含まれている点で、第1実施形態と第2実施形態は相違する。本実施形態においても、蛍光ピーク波長が長波長~短波長の半導体ナノ粒子を選択的に効率よく製造でき、所望の蛍光ピーク波長の半導体ナノ粒子を効率よく製造できる。
以下では、前述の第1実施形態と相違する事項を中心に説明し、第1実施形態と同様の事項についてはその説明を省略する。
なお、不活性ガスを反応器5内に供給する不活性ガス供給部ひとつにつき、0L/min超10L/min以下の任意の値のガス流量で不活性ガスを反応器5内に流通させてもよい。
なお、液体L2を撹拌しながら微小液滴L1を噴霧してもよい。
前述の第1実施形態の製造方法を用いて、表1に示す温度でリン化インジウムを合成し、合成したリン化インジウムの表面に硫化亜鉛の外殻(シェル層)を形成した後、蛍光スペクトルを測定した。原料には塩化インジウム及びトリスジメチルアミノホスフィンを用い、分散剤にはオレイルアミンを用いた。
前述の硫化亜鉛の外殻が形成されたリン化インジウムを含む溶液試料にヘキサン3mLを加えて、リン化インジウムの半導体ナノ粒子の分散液を得た。
なお、半値幅とは、ピーク高さの1/2の高さにおけるピーク幅であって半値全幅(Full Width at Half Maximum、FWHM)を意味する。
結果を表1に示す。
ソルボサーマル法によりリン化インジウムを合成し、合成したリン化インジウムの表面に硫化亜鉛の外殻(シェル層)を形成した後、蛍光スペクトルを測定した。
まず、塩化インジウム、トリスジメチルアミノホスフィン、ドデシルアミン及びトルエンをポリテトラフルオロエチレン製の密閉容器に入れ、窒素を吹き込んだ上で封入し、ステンレス製のジャケットで保護して180℃で24時間加熱してリン化インジウムを製造した。その後、前述の実施例1~6と同様にして、リン化インジウム表面に硫化亜鉛の外殻(シェル層)を形成し、蛍光ピーク波長及び半値幅の測定を行った。
結果を表1に示す。
特に図2に示すように、合成温度が180℃にて製造された半導体ナノ粒子(S05)について蛍光スペクトルを測定した際、525±20nmの蛍光ピークが得られた。
前述の第1実施形態の製造方法を用いて、表2に示す電圧によるエレクトロスプレーでリン化インジウムを合成し、合成したリン化インジウムの表面に硫化亜鉛の外殻(シェル層)を形成した後、蛍光スペクトルを測定した。原料には塩化インジウム及びトリスジメチルアミノホスフィンを用い、分散剤にはオレイルアミンを用いた。
結果を表2に示す。
特に図3に示すように、スプレー電圧を1.0kV~6.0kVとして製造された半導体ナノ粒子(S08~S10、及びS20)について蛍光スペクトルを測定した際、525±20nmの蛍光が得られた。
一方、スプレー電圧が2.0kV~10.0kVの範囲にて、半値幅についてはスプレー電圧をより小さくすることで拡大した。
以上により、525±20nmの蛍光を得る点から、スプレー電圧は1.0kV~8.0kV未満とすることが好ましく、一方半値幅を縮小させる点から、スプレー電圧は2.0kV未満又は4.0kV以上とすることが好ましく、6.0kV~10.0kVとすることがより好ましいと推測される。
前述の第1実施形態の製造方法を用いて、表3に示すインジウムとリンとのモル比率(原料中におけるインジウム原子とリン原子とのモル比率、インジウム原子:リン原子)でリン化インジウムを合成し、合成したリン化インジウムの表面に硫化亜鉛の外殻(シェル層)を形成した後、蛍光スペクトルを測定した。原料には塩化インジウム及びトリスジメチルアミノホスフィンを用い、分散剤にはオレイルアミンを用いた。
結果を表3に示す。
特に図4に示すように、インジウムとリンとのモル比率をインジウム1に対してリン1~6として製造された半導体ナノ粒子(S13~S16)について蛍光スペクトルを測定した際、525±20nmの蛍光が得られた。
一方、半値幅についてはインジウム1に対してリン4より増減することで拡大した。
また、蛍光ピーク波長及び半値幅は、インジウム1に対してリン8よりリンを多くすると比率の影響が著しく減少した。このことから、本実施形態の半導体ナノ粒子の製造方法において、インジウムとリンとのモル比率はインジウム1に対してリン8より小さくすることが好ましく、特に半値幅を縮小させる点から、インジウム1に対してリン2超6未満とすることが好ましいと推測される。
前述の第1実施形態の製造方法を用いて、表4に示す直径の噴霧口を有する噴霧部をエレクトロスプレーに用いてリン化インジウムを合成し、合成したリン化インジウムの表面に硫化亜鉛の外殻(シェル層)を形成した後、蛍光スペクトルを測定した。原料には塩化インジウム及びトリスジメチルアミノホスフィンを用い、分散剤にはオレイルアミンを用いた。
結果を表4に示す。
特に図5に示すように、噴霧口の直径が0.08mm~0.60mmを用いた場合(S21~S25)について蛍光スペクトルを測定した際、525±20nmの蛍光が得られた。
一方、半値幅についてはU字状に数値が変化し、噴霧口の直径を0.25mm~0.40mmとしたときに特に狭い半値幅が得られた。
このことから、本実施形態の半導体ナノ粒子の製造方法において、噴霧口の直径は0.60mm以下とすることが好ましく、特に半値幅を縮小させる点から、0.25mm~0.40mmとすることが好ましいと推測される。
本明細書に記載された全ての文献、特許出願、及び技術規格は、個々の文献、特許出願、及び技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書中に参照により取り込まれる。
2 噴霧部
3 対向電極
4 電源
5 反応器
10 製造装置
Claims (12)
- インジウムを含む液体(1)と、リンを含む液体(2)と、を用意し、
前記液体(1)又は前記液体(2)の一方を不活性ガス中で噴霧部から噴霧し、噴霧された液滴を、前記液体(1)及び前記液体(2)のうちの噴霧されていない他方の液体に接触させ、前記液体(1)と前記液体(2)とを混合して少なくともインジウムとリンとを反応させ、インジウム及びリンを含む半導体ナノ粒子を製造する半導体ナノ粒子の製造方法。 - インジウム及びリンを含む液体(3)を不活性ガス中で噴霧部から噴霧し、噴霧された液滴を、液体(4)に接触させ、前記液体(3)と前記液体(4)とを混合して少なくともインジウムとリンとを反応させ、インジウム及びリンを含む半導体ナノ粒子を製造する半導体ナノ粒子の製造方法。
- 前記噴霧をエレクトロスプレーによって行う、請求項1又は請求項2に記載の半導体ナノ粒子の製造方法。
- 噴霧される液体の流路の少なくとも一部を構成する、あるいは、前記流路の少なくとも一部に取り付けられた第1電極と、前記液滴が噴霧される液体と接触する位置に配置された第2電極と、の間に電位差を設けて前記エレクトロスプレーによる前記噴霧を行う請求項3に記載の半導体ナノ粒子の製造方法。
- 前記第1電極と前記第2電極との電位差が、絶対値で0.3kV~30kVである請求項4に記載の半導体ナノ粒子の製造方法。
- 前記噴霧された液滴の直径は、0.1μm~100μmである請求項1~請求項5のいずれか1項に記載の半導体ナノ粒子の製造方法。
- 前記半導体ナノ粒子はインジウム及びリンを少なくとも含むコア粒子を有し、
前記コア粒子を形成後に、前記コア粒子表面の少なくとも一部に、12族元素及び13族元素の少なくとも一方ならびに16族元素を含む層を形成する請求項1~請求項6のいずれか1項に記載の半導体ナノ粒子の製造方法。 - 前記噴霧部における噴霧口の幅は、0.03mm~2.0mmである請求項1~請求項7のいずれか1項に記載の半導体ナノ粒子の製造方法。
- 前記噴霧される液体の送液速度が、前記噴霧部を備える流路ひとつにつき0.001mL/min~1mL/minである請求項1~請求項8のいずれか1項に記載の半導体ナノ粒子の製造方法。
- 少なくともインジウムとリンとを反応させる際、インジウム及びリンを含む液体を加熱する請求項1~請求項9のいずれか1項に記載の半導体ナノ粒子の製造方法。
- 前記インジウム及びリンを含む液体の加熱温度は、80℃~350℃である請求項10に記載の半導体ナノ粒子の製造方法。
- 前記液滴の噴霧後において、インジウム及びリンを含む液体におけるインジウム原子とリン原子とのモル比率(インジウム原子:リン原子)は、1:1~1:16である請求項1~請求項11のいずれか1項に記載の半導体ナノ粒子の製造方法。
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| JP2018564580A JPWO2018139447A1 (ja) | 2017-01-25 | 2018-01-23 | 半導体ナノ粒子の製造方法 |
| CN201880008366.XA CN110268035A (zh) | 2017-01-25 | 2018-01-23 | 半导体纳米粒子的制造方法 |
| US16/480,468 US20190362968A1 (en) | 2017-01-25 | 2018-01-23 | Method of producing semiconductor nanoparticle |
| KR1020197024139A KR20190112007A (ko) | 2017-01-25 | 2018-01-23 | 반도체 나노 입자의 제조 방법 |
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| KR (1) | KR20190112007A (ja) |
| CN (1) | CN110268035A (ja) |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2019225675A1 (ja) * | 2018-05-25 | 2019-11-28 | 三菱ケミカルエンジニアリング株式会社 | 反応生成物製造装置、反応生成物製造方法 |
| WO2021256109A1 (ja) * | 2020-06-15 | 2021-12-23 | 信越化学工業株式会社 | 量子ドットの製造方法 |
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| JP7352504B2 (ja) * | 2020-03-30 | 2023-09-28 | 信越化学工業株式会社 | 量子ドットの製造方法 |
| CN111424310B (zh) * | 2020-06-02 | 2022-02-15 | 中国电子科技集团公司第十三研究所 | 一种液态磷注入法合成磷化铟的方法 |
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- 2018-01-23 KR KR1020197024139A patent/KR20190112007A/ko not_active Withdrawn
- 2018-01-23 CN CN201880008366.XA patent/CN110268035A/zh active Pending
- 2018-01-23 US US16/480,468 patent/US20190362968A1/en not_active Abandoned
- 2018-01-23 WO PCT/JP2018/001978 patent/WO2018139447A1/ja not_active Ceased
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| WO2021256109A1 (ja) * | 2020-06-15 | 2021-12-23 | 信越化学工業株式会社 | 量子ドットの製造方法 |
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| CN110268035A (zh) | 2019-09-20 |
| KR20190112007A (ko) | 2019-10-02 |
| TW201834964A (zh) | 2018-10-01 |
| JPWO2018139447A1 (ja) | 2020-01-23 |
| US20190362968A1 (en) | 2019-11-28 |
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