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WO2018123579A1 - Method for producing negative electrode material - Google Patents

Method for producing negative electrode material Download PDF

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Publication number
WO2018123579A1
WO2018123579A1 PCT/JP2017/044645 JP2017044645W WO2018123579A1 WO 2018123579 A1 WO2018123579 A1 WO 2018123579A1 JP 2017044645 W JP2017044645 W JP 2017044645W WO 2018123579 A1 WO2018123579 A1 WO 2018123579A1
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Prior art keywords
negative electrode
electrode material
nickel
plating
hydrogen storage
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PCT/JP2017/044645
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French (fr)
Japanese (ja)
Inventor
潤 齊田
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Toyota Industries Corp
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Toyota Industries Corp
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/48Coating with alloys
    • C23C18/50Coating with alloys with alloys based on iron, cobalt or nickel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/36Selection of substances as active materials, active masses, active liquids
    • H01M4/38Selection of substances as active materials, active masses, active liquids of elements or alloys
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C19/00Alloys based on nickel or cobalt
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Definitions

  • the present invention relates to a method for producing a negative electrode material having a hydrogen storage alloy.
  • Patent Document 1 introduces a negative electrode material in which a metal layer is provided on the surface of hydrogen storage alloy particles.
  • paragraph [0008] of Patent Document 1 it is described that by providing the metal layer, the area of the hydrogen storage alloy exposed on the surface of the negative electrode material is reduced, and oxidation of the surface of the hydrogen storage alloy particles is suppressed. ing.
  • Patent Document 1 describes that the surface of the hydrogen storage alloy particles is stabilized by the metal layer, thereby suppressing the oxidation of the surface of the hydrogen storage alloy particles.
  • a compound serving as a material of the metal layer is dissolved in an acidic solution, and the hydrogen storage alloy particles are immersed in an acidic solution containing the metal.
  • a method of depositing metal on the surface of hydrogen storage alloy particles is disclosed.
  • a mixture of hydrogen storage alloy particles and metal powder is heated to form a metal layer in which a part of the surface of the hydrogen storage alloy particles and the metal powder are in solid solution. (See paragraph [0021]).
  • the method for producing the negative electrode material of the present invention is as follows.
  • a plating solution preparation step for obtaining a plating solution containing a nickel salt, a heteroelement-containing organic compound and an aqueous solvent;
  • a negative electrode material in which a nickel-containing plating layer is formed on the hydrogen storage alloy particles by mixing a hydrogen storage alloy particle dispersion containing an aqueous solvent and hydrogen storage alloy particles, the plating solution, and a reducing agent.
  • a negative electrode material having excellent conductivity can be produced.
  • Example 3 is a surface analysis result of the negative electrode material of Example 1-A measured by XPS. It is the surface analysis result of the negative electrode material of Example 5 and Example 1 measured by XPS. It is a surface analysis result of the negative electrode material of Example 6 measured by XPS. It is the surface analysis result of the negative electrode material of Comparative Example 1-A measured by XPS. It is a surface analysis result of the negative electrode material of Example 11 measured by XPS. It is a surface analysis result of the negative electrode material of Example 11 measured by XPS. It is a surface analysis result of the negative electrode material of Example 11 measured by XPS. It is the figure which compared the charging curve of the nickel metal hydride battery of Example 10 and Example 11. FIG. It is the figure which compared the charging curve of the nickel metal hydride battery of Example 11 and Example 12.
  • the manufacturing method of the negative electrode material of the present invention may be referred to as the manufacturing method of the present invention or simply the manufacturing method as necessary.
  • the numerical range “x to y” described in this specification includes the lower limit x and the upper limit y. And a new numerical value range can be comprised by combining these arbitrarily including those upper limit values and lower limit values and numerical values listed in the embodiments. Furthermore, numerical values arbitrarily selected from any one of the numerical ranges described above can be used as the upper and lower numerical values of the new numerical range.
  • the production method of the present invention is a method of producing a negative electrode material having a plating layer on hydrogen storage alloy particles, and the negative electrode material of the present invention has a plating layer on hydrogen storage alloy particles.
  • the manufacturing method of the present invention is a method of forming a metal layer by electroless plating using a reducing agent.
  • the manufacturing method of the present invention includes a plating solution preparation step and a plating step.
  • the plating solution preparation step is a step of obtaining a plating solution containing a nickel salt, a hetero element-containing organic compound, and an aqueous solvent.
  • the plating solution may further contain a metal salt.
  • the said metal salt means the salt of metals other than nickel.
  • the term “metal” used herein refers to a metal contained in the metal salt.
  • the plating solution contains a nickel salt, a heteroelement-containing organic compound, an aqueous solvent, and, if necessary, a metal salt.
  • the plating solution contains a nickel salt and a metal salt.
  • Nickel contained in the nickel salt and metal contained in the metal salt are main materials constituting the plating layer.
  • the aqueous solvent is a solvent that dissolves nickel salts, metal salts, and the like. That is, nickel and metal are considered to exist as ions in the plating solution.
  • the hetero element-containing organic compound is considered to function as a complexing agent that forms a complex with the nickel ions and metal ions in the plating solution. That is, according to the production method of the present invention, nickel and metal are considered to exist as stable complexes in the plating solution.
  • the plating step includes mixing a hydrogen storage alloy particle dispersion containing an aqueous solvent and hydrogen storage alloy particles, the above plating solution, and a reducing agent, and a plating layer containing nickel and metal on the hydrogen storage alloy particles. This is a step of obtaining a negative electrode material in which is formed.
  • the above plating solution, the hydrogen storage alloy particle dispersion, and the reducing agent are mixed. Then, nickel ions and metal ions in the plating solution are reduced by electrons supplied from the reducing agent to become zero-valent metal, and are deposited on the surfaces of the hydrogen storage alloy particles. And the said nickel and metal which precipitated on the surface of the hydrogen storage alloy particle comprise the plating layer on a hydrogen storage alloy particle.
  • nickel ions and metal ions are complexed in the plating solution, and the nickel ions and metal ions are considered to be dissolved in a stable state. According to the production method of the present invention, it is considered that a uniform plating layer can be obtained by stably dissolving nickel ions and metal ions in this manner until immediately before being subjected to the plating step.
  • the hetero-element-containing organic compound that is, the complexing agent
  • the nickel salt and, if necessary, the metal salt in the plating solution thereby suppressing nickel and metal hydroxylation. It is considered that the proportion of nickel hydroxide and metal hydroxide in the plating layer can be reduced.
  • a negative electrode material having excellent conductivity can be obtained.
  • a material whose surface has a mesh shape can be exemplified. The negative electrode material whose surface has a mesh shape has a larger specific surface area than the negative electrode material whose surface has a smooth shape, and it is considered that the battery reaction proceeds smoothly.
  • the plating solution preparation step in the method for producing a negative electrode material of the present invention is a step of obtaining a plating solution containing a nickel salt, a hetero element-containing organic compound, an aqueous solvent, and, if necessary, a metal salt.
  • nickel salt used for the plating solution examples include nickel sulfate, nickel nitrate, nickel chloride, nickel acetate, nickel sulfamate and the like.
  • the metal salt used in the plating solution may be a salt of various metals that can be used for electroless plating.
  • the metals include Cu, Sn, Zn, Co, Au, Ag, Pt, Pd, Rh, Ru, In, Bi, or Cd is preferable.
  • the preferred order is generally Ag, Cu, Au, Rh, Co, Zn, Ru, Pt, Pd, Cd, In, Sn, and Bi.
  • Au, Ag, Cu, Sn, Cd, In, Zn, Pt and Pd are preferable.
  • Examples of metal salts include sulfates, nitrates, chlorides and the like of these metals.
  • examples of the metal salt include cobalt sulfate, cobalt nitrate, cobalt chloride, cobalt acetate, cobalt sulfamate, copper sulfate, copper nitrate, copper chloride, silver sulfate, silver nitrate, hexachloride platinum acid, potassium gold cyanide. And gold sodium sulfite.
  • a metal salt only 1 type may be used and multiple types may be used together. As will be described later, it is considered that the negative electrode material of the present invention whose surface has a mesh shape is formed by heating the negative electrode material after electroless plating.
  • the plating layer preferably contains at least one selected from a nickel indium alloy, a nickel bismuth alloy, a nickel tin alloy, and a nickel cadmium alloy.
  • indium sulfate, indium nitrate, indium chloride, indium acetate, indium sulfamate, bismuth sulfate, bismuth nitrate, bismuth chloride, bismuth acetate, stannous sulfate, stannous chloride examples thereof include stannous acetate, cadmium sulfate, cadmium nitrate, cadmium chloride, cadmium acetate, and cadmium sulfamate.
  • nickel and metal are collectively referred to as plating metal.
  • the salt of the plating metal is called a plating metal salt.
  • Examples of the concentration of the plating metal salt in the plating solution include a range of 2 to 500 g / L.
  • the plating solution further contains a heteroelement-containing organic compound.
  • the heterometal-containing organic compound forms a complex with the plating metal ion in the plating solution.
  • the hetero element in the hetero element-containing organic compound means N, O, P or S.
  • hetero element-containing organic compounds include amino groups, amide groups, imide groups, imino groups, cyano groups, azo groups, hydroxyl groups, alkoxy groups, carboxyl groups, ester groups, ether groups, carbonyl groups, which can be coordinated to metal ions, Phosphoric acid group, phosphoric acid ester group, phosphonic acid group, phosphonic acid ester group, phosphinic acid group, phosphinic acid ester group, phosphenic acid group, phosphenic acid ester group, phosphinic acid group, phosphinic acid ester group, thiol group, Examples include organic compounds having a sulfide group, a sulfinyl group, a sulfonyl group, a sulfonic acid group, a thiocarboxyl group, a thioester group, or a thiocarbonyl group.
  • the hetero element-containing organic compound is preferably a chelate compound having a plurality of the above groups and capable of coordinating to a metal ion at a plurality of locations.
  • the hetero element-containing organic compound preferably has any of a carboxyl group, an amino group, a hydroxyl group, a ketone group, and an imide group.
  • chelate compounds include polyamine compounds such as ethylenediamine and diethylenetriamine, glycine, alanine, cysteine, glutamine, arginine, asparagine, aspartic acid, serine, ethylenediaminetetraacetic acid and other amino acids, malonic acid, succinic acid, glutaric acid, maleic acid.
  • polyamine compounds such as ethylenediamine and diethylenetriamine, glycine, alanine, cysteine, glutamine, arginine, asparagine, aspartic acid, serine, ethylenediaminetetraacetic acid and other amino acids, malonic acid, succinic acid, glutaric acid, maleic acid.
  • Acids such as phthalic acid, glycolic acid, lactic acid, tartronic acid, glyceric acid, 2-hydroxybutyric acid, 3-hydroxybutyric acid, ⁇ -hydroxybutyric acid, malic acid, tartaric acid, citramalic acid, citric acid, isocitric acid, leucine
  • hydroxycarboxylic acids such as acids, mevalonic acid, pantoic acid, quinic acid, shikimic acid, salicylic acid, gentisic acid, orthoric acid, mandelic acid, benzylic acid, and 2-hydroxy-2-phenylpropionic acid. That.
  • the concentration of the heteroelement-containing organic compound in the plating solution may be an amount that can form a complex with the plating metal in the plating solution, and can be appropriately set according to the type and amount of the plating metal.
  • the compounding amount of the heteroelement-containing organic compound in the plating solution is preferably stoichiometrically an amount capable of forming a complex with more than half of the plating metal, and forms a complex with more than 2/3 of the plating metal. It is more preferable that the amount be capable of forming a complex with the total amount of the plating metal.
  • the hetero element-containing organic compound is particularly preferably blended in an amount that is at least an amount capable of forming a complex with the total amount of the plating metal, that is, an excess amount.
  • the aqueous solvent used in the plating solution may be water as a main component, and may contain a solvent other than water as necessary.
  • the solvent other than water include methanol, ethanol, propanol, acetone, acetylacetone, methyl ethyl ketone, ethyl acetate, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, tetrahydrofuran, acetonitrile, and cyclohexanone. These solvents may be used alone or in combination with water.
  • a treatment step of forming catalyst nuclei as active points for the growth of the plating layer on the surface of the hydrogen storage alloy particles may be performed prior to the plating step. Furthermore, the surface of the hydrogen storage alloy particles may be modified by treating the hydrogen storage alloy particles with a surfactant or a basic aqueous solution before the treatment step. The treatment process may be performed according to a regular method.
  • a step of bringing hydrogen storage alloy particles into contact with a Pd-containing solution and attaching Pd to the surface of the hydrogen storage alloy particles can be mentioned.
  • the hydrogen storage alloy particles and the tin chloride hydrochloric acid aqueous solution are mixed to remove the oxide film on the surface of the hydrogen storage alloy particles and adsorb divalent tin ions on the surface of the hydrogen storage alloy particles.
  • the hydrogen storage alloy particles are separated by filtration.
  • the hydrogen storage alloy particles are mixed with a palladium chloride / hydrochloric acid aqueous solution, thereby adhering zero-valent Pd to the hydrogen storage alloy particles.
  • the phenomenon here is due to the progress of the reaction Sn (II) + Pd (II) ⁇ Pd (0) + Sn (IV) on the surface of the hydrogen storage alloy particles. It is considered that catalyst nuclei can be formed on the surface of the hydrogen storage alloy particles by the above-described method.
  • the treatment step there can be mentioned a method of bringing hydrogen storage alloy particles into contact with an aqueous solution containing Pd (II) and Sn (II) such as palladium chloride and tin chloride. Even with this method, zero-valent Pd can be adhered to the surface of the hydrogen storage alloy particles.
  • a strong acid aqueous solution such as concentrated hydrochloric acid may be used instead of the tin chloride aqueous solution.
  • tin chloride aqueous solution a commercial product such as a brand name Pink Schumer manufactured by Nippon Kanisen Co., Ltd. may be used, or an aqueous solution in which tin chloride is dissolved in hydrochloric acid may be used.
  • palladium chloride aqueous solution commercial items, such as brand name Red Schumer made by Nippon Kanisen Co., Ltd., may be used, or an aqueous solution in which palladium chloride is dissolved in water may be used.
  • the above-mentioned complexing agent and other additives such as a pH adjusting agent and a buffering agent may be added to the palladium chloride aqueous solution.
  • a washing step of washing the hydrogen storage alloy particles with water or an acid aqueous solution may be added.
  • the plating step includes mixing a hydrogen storage alloy particle dispersion containing an aqueous solvent and hydrogen storage alloy particles, the above plating solution, and a reducing agent, and a plating layer containing nickel and metal on the hydrogen storage alloy particles. This is a step of obtaining a negative electrode material in which is formed.
  • the aqueous solvent for the hydrogen storage alloy particle dispersion may be different from the aqueous solvent for the plating solution, but it is preferable to use the same one.
  • Hydrogen storage alloy particles refer to particulate hydrogen storage alloys.
  • the hydrogen storage alloy is not limited as long as it is used as a negative electrode active material of a nickel metal hydride battery.
  • the hydrogen storage alloy is basically an alloy of metal A, which easily reacts with hydrogen, but is inferior in hydrogen releasing ability, and metal B, which does not easily react with hydrogen but has excellent hydrogen releasing ability.
  • A includes a group 2 element such as Mg, a group 3 element such as Sc and a lanthanoid, a group 4 element such as Ti and Zr, a group 5 element such as V and Ta, and a misch containing a plurality of rare earth elements. Examples thereof include metal (hereinafter sometimes abbreviated as Mm), Pd, and the like.
  • Mm metal
  • Pd and the like.
  • B include Fe, Co, Ni, Cr, Pt, Cu, Ag, Mn, Zn, and Al.
  • Specific hydrogen-absorbing alloy AB 5 type showing a hexagonal CaCu 5 type crystal structure, hexagonal MgZn 2 type or AB 2 type showing a cubic MgCu 2 type crystal structure, AB type indicating the cubic CsCl-type crystal structure , A 2 B type showing hexagonal Mg 2 Ni type crystal structure, solid solution type showing body-centered cubic crystal structure, and AB 3 type and A 2 B 7 in which AB 5 type and AB 2 type crystal structures are combined Examples include molds and A 5 B 19 types.
  • the hydrogen storage alloy may have one of the above crystal structures, or may have a plurality of the above crystal structures.
  • Examples of the AB 5 type hydrogen storage alloy include LaNi 5 , CaCu 5 , and MmNi 5 .
  • Examples of the AB 2 type hydrogen storage alloy include MgZn 2 , ZrNi 2 , and ZrCr 2 .
  • Examples of the AB type hydrogen storage alloy include TiFe and TiCo.
  • Examples of the A 2 B type hydrogen storage alloy include Mg 2 Ni and Mg 2 Cu.
  • Examples of the solid solution type hydrogen storage alloy include Ti—V, V—Nb, and Ti—Cr.
  • An example of the AB 3 type hydrogen storage alloy is CeNi 3 . Ce 2 Ni 7 can be exemplified as the A 2 B 7 type hydrogen storage alloy.
  • Examples of the A 5 B 19 type hydrogen storage alloy include Ce 5 Co 19 and Pr 5 Co 19 . In each of the above crystal structures, some of the metals may be replaced with one or more other types of metals or elements.
  • the hydrogen storage alloy particles need only be particles composed of the above-mentioned hydrogen storage alloy, and the shape thereof is not particularly limited. However, in consideration of the use as a negative electrode active material, it is preferably sufficiently small.
  • the average particle size of the hydrogen storage alloy particles is preferably within the range of 1 to 100 ⁇ m, more preferably within the range of 3 to 50 ⁇ m, and even more preferably within the range of 5 to 30 ⁇ m.
  • the average particle diameter of the hydrogen storage alloy particles is preferably 27 ⁇ m or less, more preferably 20 ⁇ m or less, further preferably 15 ⁇ m or less, and particularly preferably 10 ⁇ m or less.
  • D50 in the case of measuring a sample with a general laser diffraction type particle size distribution measuring device is meant.
  • the reducing agent used in the plating process plays a role of reducing nickel ions and metal ions.
  • the reducing agent include formaldehyde, glyoxylic acid, hypophosphorous acid, sodium hypophosphite, sodium borohydride, potassium borohydride, ascorbic acid, thiourea, hydroquinone, dimethylaminoborane, and hydrazine.
  • one type of reducing agent may be used, or a plurality of types of reducing agents may be used.
  • hypophosphorous acid or sodium hypophosphite is used as the reducing agent, P is included in the metal film.
  • the concentration of the reducing agent in the mixed solution of the plating solution, the hydrogen storage alloy particle dispersion, and the reducing agent include a range of 1 to 200 g / L.
  • the mixed solution of the plating solution, the hydrogen storage alloy particle dispersion, and the reducing agent is referred to as a plating mixed solution as necessary.
  • an organic compound dispersant to the plating mixture.
  • nickel ions and metal ions in the plating mixture are reduced by the reducing agent, and nickel and metal are deposited on the surface of the hydrogen storage alloy.
  • an organic compound dispersant to the plating mixture, it is considered that nickel and metal deposited on the surface of the hydrogen storage alloy particles are covered with a coating layer using the organic compound dispersant as a raw material.
  • nickel and a metal precipitate while being covered with the said coating layer it becomes difficult for nickel and a metal to grow coarsely, Therefore It is thought that nickel and a metal exist in a plating layer as a comparatively small particle
  • the plating layer is considered to be composed of an aggregate of composite particles in which nickel and metal forming small particles are each covered with a coating layer. If nickel and metal grow coarsely, a sufficient amount of electrolyte may not be supplied to the hydrogen storage alloy.
  • a plating layer having a large specific surface area obtained by adding an organic compound-based dispersant to a plating mixture is porous and has excellent infusion performance of an electrolytic solution. Therefore, a negative electrode material having the plating layer is used. This is considered to improve the battery characteristics of the nickel metal hydride battery. Further, by adding an organic compound-based dispersant to the plating mixed solution, adhesion or adhesion between the negative electrode materials due to the plating layer can be suppressed, and there is an advantage that the negative electrode material after the plating step can be easily crushed.
  • the organic compound dispersant may be a polymer that is generally used as a dispersant or a monomer that can form the polymer, but is preferably water-soluble or hydrophilic. This is because an aqueous solvent is used for the plating solution and the hydrogen storage alloy particle dispersion contained in the plating mixture.
  • a water-soluble polymer or a water-soluble monomer is particularly preferable.
  • polymer examples include methyl cellulose, ethyl cellulose, hydroxyethyl cellulose, hydroxypropyl cellulose, carboxymethyl cellulose, diacetyl cellulose, sodium alginate, polyacrylic acid, sodium polyacrylate, polyvinyl phenol, polyvinyl methyl ether, polyvinyl alcohol, polyvinyl pyrrolidone, polyhydroxyalkyl. (Meth) acrylate, styrene-maleic acid copolymer, non-crosslinked polyacrylamide and the like. As already described, monomers capable of constituting these polymers are also preferably used.
  • the organic compound dispersant is preferably added in an amount of 0.1 to 200 parts by mass, more preferably 1 to 150 parts by mass, when the plating metal salt is 100 parts by mass. More preferably, the amount is 10 to 100 parts by mass, and particularly preferably 25 to 75 parts by mass.
  • additives may be added to the plating mixture.
  • examples of the additive include a pH adjusting agent and a buffering agent. These may be added to the plating mixed solution in the plating step, or may be added to the plating solution in the plating solution preparation step, or may be added to the hydrogen storage alloy particle dispersion.
  • the pH of the plating mixture is usually adjusted to an appropriate value within the range of 4 to 14 according to the type of metal salt and reducing agent.
  • the pH is preferably in the range of 4-9.
  • Preferable ranges of the pH of the plating mixed solution include 4 to 6, 4 to 5, 4.1 to 4.8, 4.2 to 4.5, and 4.3 to 4.4.
  • pH adjusters examples include sodium carbonate, sodium hydroxide, sodium carbonate, sodium bicarbonate, ammonia, ammonium chloride, sulfuric acid, and hydrochloric acid.
  • the buffer is used for the purpose of suppressing rapid pH fluctuation of the plating mixture.
  • the buffer include hydroxyacetic acid, lactic acid, gluconic acid, tartaric acid, malic acid, succinic acid, malonic acid, citric acid and other weak acids, and salts thereof.
  • additives that can be added to the plating mixture include bismuth nitrate, iodic acid, polyethylene glycol, and various surfactants.
  • a raw material of the plating mixed solution As a raw material of the plating mixed solution, a known material may be adopted, or a commercially available product may be purchased and used. Alternatively, hydrogen storage alloy particles or the like may be added to a commercially available electroless plating aqueous solution.
  • a commercially available aqueous solution for electroless plating trade names Blue Schumer, S-680, SE-680, SD-200, S-300, S-760, S-762, SE-660, SE-manufactured by Nippon Kanigen Co., Ltd. 666, S-500, SE-650, SFK-63, S-810, SEK-670, S-795, SEK-797, canibolone SKB-230, and SFB-26.
  • the plating step a method of dropping the plating solution to the hydrogen storage alloy particle dispersion is preferable.
  • the plating process is preferably performed under stirring conditions.
  • the plating temperature in the plating step is preferably 50 to 95 ° C, more preferably 60 to 95 ° C. The higher the temperature, the faster the plating reaction proceeds.
  • the thickness of the plating layer in the negative electrode material of the present invention varies depending on the amount, concentration, and plating reaction time of the plating solution.
  • the production method of the present invention may include a step of washing the negative electrode material obtained by the plating step and a drying step. Furthermore, it is preferable to have a heating step for heating the negative electrode material. As will be described later, the conductivity of the negative electrode material is improved through the heating step. The reason for this is not clear, but it is likely that the state or structure of the hydrogen storage alloy particles changes upon heating.
  • the temperature of the heating process is over 200 ° C and less than 500 ° C, 250 ° C or more and less than 500 ° C, 300 ° C or more and less than 500 ° C, over 300 ° C and less than 500 ° C, 320 ° C or more and 450 ° C or less, 350 ° C or more and 420 ° C or less.
  • the heating step in the above temperature range, the function of the hydrogen storage alloy as a negative electrode active material for nickel metal hydride batteries is not impaired, and the conductivity of the negative electrode material can be sufficiently improved.
  • the effect of the heating step is remarkable. Since all of these hydrogen storage alloys have a crystal structure in which AB 5 type and AB 2 type crystal structures are combined, it is considered that the same effect can be obtained by heating in the same temperature range.
  • the at least one hydrogen storage alloy selected from the A 2 B 7 type, A 5 B 19 type, and AB 3 type is preferably a rare earth-Mg—Ni-based hydrogen storage alloy.
  • the rare earth-Mg—Ni-based hydrogen storage alloy may be an alloy containing rare earth elements, Mg and Ni, and the composition ratio and other elements that can be contained are not particularly limited. Further, part or all of the rare earth element may be substituted with at least one of Ca, Sr, Sc, Y, Ti, Zr and Hf.
  • the rare earth-Mg—Ni-based hydrogen storage alloy for example, one represented by the following general formula (1) can be selected.
  • Ln 1-x Mg x Ni yz T z (where Ln is La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, At least one element selected from Yb, Lu, Ca, Sr, Sc, Y, Ti, Zr and Hf, T is Mn, Co, Ti, V, Nb, W, Ta, Cr, Mo, Fe, Al , Ga, Zn, Sn, In, Cu, Si, Li, P, S, and B, x, y, and z are 0 ⁇ x ⁇ 0.3 and 2.8, respectively. ⁇ y ⁇ 3.8 and 0 ⁇ z ⁇ 0.5 are satisfied.)
  • a negative electrode material having a mesh part can be produced by a heating process.
  • the plating layer after the plating step is considered to be composed of a plated metal having a fine particle shape.
  • the heating temperature of the negative electrode material is not less than the melting point of the metal and / or nickel metal alloy in which nickel and metal are alloyed and not more than the melting point of the hydrogen storage alloy. preferable. Furthermore, the heating temperature of the negative electrode material is more preferably higher than the melting point of the metal and nickel metal alloy and lower than the melting point of the hydrogen storage alloy.
  • the melting point of the metal and / or nickel metal alloy is preferably equal to or lower than the melting point of the hydrogen storage alloy, and the melting point of the metal and nickel metal alloy is equal to or lower than the melting point of the hydrogen storage alloy. More preferably.
  • the metal salt is selected.
  • the melting point of the hydrogen storage alloy varies depending on the composition of the hydrogen storage alloy, and the hydrogen storage alloy having a small average particle diameter is more easily melted than the hydrogen storage alloy having a large average particle diameter.
  • the melting points of the metal and nickel metal alloy are relatively low, it is considered that a plating layer having a network shape can be formed on the hydrogen storage alloy particles having various compositions and average particle diameters.
  • the melting point of the metal and the nickel metal alloy is preferably less than 450 ° C., preferably 430 ° C. or less, and particularly preferably 420 ° C. or less.
  • the average particle diameter of the hydrogen storage alloy particles is preferably 8 ⁇ m or more, more preferably 10 ⁇ m or more, and still more preferably 20 ⁇ m or more. In this case, there is no preferred upper limit for the average particle size of the hydrogen storage alloy particles, but it is preferably 100 ⁇ m or less in view of the ease of battery reaction.
  • a metal having a low melting point so that a sufficiently low melting point is obtained when it is combined with nickel having a melting point of 1455 ° C. to form a nickel metal alloy.
  • a metal having a melting point of 350 ° C. or lower is preferably selected. Specific examples include indium having a melting point of 157 ° C., bismuth having a melting point of 271 ° C., tin having a melting point of 232 ° C., and cadmium having a melting point of 321 ° C.
  • the nickel metal alloy constituting the plating layer is preferably at least one selected from a nickel indium alloy, a nickel bismuth alloy, a nickel tin alloy, and a nickel cadmium alloy. It can be said.
  • the manufacturing method of the present invention may include a low oxygen gas exposure step after the heating step.
  • the low oxygen gas exposure step is a step of exposing the negative electrode material after the heating step to low oxygen gas.
  • Low oxygen gas refers to a gas having a lower oxygen content than air.
  • the oxygen gas content of the low oxygen gas is more than 0% and not more than 10% by mass ratio.
  • the oxygen gas content of the low oxygen gas is preferably 0.01% or more and 7% or less, more preferably 0.01% or more and 5% or less in terms of mass ratio, and 0.01% or more.
  • the gas other than the oxygen gas contained in the low oxygen gas is preferably an inert gas such as argon gas.
  • the time for exposing the negative electrode material to the low oxygen gas is not particularly limited, but is preferably 3 minutes or more, more preferably 5 minutes or more, and further preferably 10 minutes or more. It is preferably 15 minutes or longer.
  • the negative electrode material may be exposed to the low oxygen gas while still standing, but the negative electrode material may be exposed to the low oxygen gas while stirring or during the low oxygen gas exposure step. It is preferable to stir the negative electrode material one or more times.
  • the plating layer preferably covers the whole of the hydrogen storage alloy particles, and preferably covers the entire surface.
  • the plating layer may have a mesh shape as described above, but may have a shape other than the mesh shape, such as a smooth shape.
  • the thickness of the plating layer is preferably 500 nm or less from the viewpoint of smoothly storing and releasing hydrogen ions.
  • the thickness range of the plating layer is preferably 2 to 500 nm, more preferably 2 to 400 nm, and even more preferably 2 to 300 nm.
  • the plated layer may be crystalline, but may contain amorphous, and all of the plated layer may be amorphous.
  • the plating layer is assumed to have a function of protecting the hydrogen storage alloy particles in addition to a function of imparting conductivity to the negative electrode material.
  • a hydrogen storage alloy that expands and contracts with charge and discharge may cause cracks and the like with long-term use, but by covering the hydrogen storage alloy particles with a plating layer, the hydrogen storage alloy particles Can be protected.
  • the plating layer can follow the expansion and contraction of the hydrogen storage alloy particles, so that it is considered to exhibit an excellent protective function. In particular, suitable spreadability can be expected in the amorphous portion of the plating layer.
  • the plating layer may contain P and / or B.
  • P and / or B originates from the manufacturing method and is contained in the plating layer. Due to the presence of P and / or B, the physical properties such as the hardness of the plating layer may suitably change.
  • the proportion of the element in the plating layer is preferably 1 to 15% by mass, and more preferably 2 to 13% by mass. Note that the plating layer may contain impurities derived from the manufacturing method or the like.
  • the plating layer in the negative electrode material of the present invention contains nickel contained in the plating solution.
  • the plating layer may contain the metal in addition to nickel.
  • the plating layer may contain nickel hydroxide, nickel oxide, metallic nickel, etc. as nickel, but preferably contains a lot of metallic nickel having excellent conductivity.
  • the negative electrode material of the present invention has very excellent conductivity. It is considered to be granted.
  • a part of the surface of the hydrogen storage alloy particles may be covered with the plating layer, but it is preferable that the entire surface of the hydrogen storage alloy particle is covered with the plating layer.
  • hydrogen storage alloys such as A 2 B 7 type, A 5 B 19 type, and AB 3 type contain rare earth metals.
  • the plating layer contains at least nickel which is a transition metal. Therefore, the existing ratio of the rare earth metal and the transition metal can take different values between the surface of the hydrogen storage alloy particles and the surface of the plating layer, that is, the surface of the negative electrode material.
  • the ratio B / A between the mass A of the rare earth metal and the mass B of the transition metal is used as the abundance ratio of the rare earth metal and the transition metal, and the ratio B / A is on the surface of the negative electrode material. If the value is larger than the surface of the hydrogen storage alloy particles, it can be considered that at least a part of the surface of the hydrogen storage alloy particles is covered with the plating layer. Further, if the ratio B / A is a large value, it can be considered that many portions of the surface of the hydrogen storage alloy particles are covered with the plating layer.
  • B / A in the negative electrode material of the present invention is preferably 5 times or more, more preferably 10 times or more, and further preferably 20 times or more of B / A on the surface of the hydrogen storage alloy particles. 30 times or more is particularly preferable.
  • the plating layer in the negative electrode material of the present invention is preferably composed of an aggregate of particles and has a large specific surface area.
  • the value obtained by dividing the BET specific surface area of the negative electrode material of the present invention by the BET specific surface area of the hydrogen storage alloy particles is preferably 3 or more, more preferably 5 or more, and 10 or more. Is more preferable, and 20 or more is particularly preferable.
  • the mesh portion on the surface of the negative electrode material (sometimes referred to as a mesh portion in the present specification) has a linear shape or a strip shape. A plurality of ridges are partially integrated with each other.
  • the mesh portion in the negative electrode material of the present invention is considered to have a relatively high strength due to such a structure.
  • the mesh part is mainly composed of a plating layer. That is, in the negative electrode material of the present invention having a mesh portion, the plating layer is considered to form a three-dimensional conductive path that is firmly connected by forming a mesh shape. Such a conductive path is considered to improve the conductivity of the negative electrode material.
  • the negative electrode material of the present invention can be used as a negative electrode material for nickel metal hydride batteries.
  • the nickel metal hydride battery includes a positive electrode, a negative electrode, an electrolytic solution, and a separator.
  • the nickel metal hydride battery will be described.
  • the positive electrode includes a current collector and a positive electrode active material layer formed on the surface of the current collector.
  • the negative electrode includes a current collector and a negative electrode active material layer formed on the surface of the current collector.
  • a current collector refers to a chemically inert electronic conductor that keeps a current flowing through an electrode during discharge or charging of a nickel metal hydride battery.
  • the material of the current collector is not particularly limited as long as it is a metal that can withstand a voltage suitable for the active material to be used.
  • the current collector material is at least one selected from silver, copper, gold, aluminum, tungsten, cobalt, zinc, nickel, iron, platinum, tin, indium, titanium, ruthenium, tantalum, chromium, molybdenum, and stainless steel Examples of such a metal material can be given.
  • the current collector may be covered with a known protective layer. What collected the surface of the electrical power collector by the well-known method may be used as an electrical power collector.
  • nickel or a metal material plated with nickel is preferable.
  • the current collector can take the form of foil, sheet, film, wire, rod, mesh, sponge or the like.
  • the thickness is preferably in the range of 1 ⁇ m to 100 ⁇ m, and the so-called punching metal-like one having a large number of holes or a cut What is called an expanded metal shape which spread
  • the positive electrode active material layer contains a positive electrode active material and, if necessary, contains a positive electrode additive, a binder and a conductive additive.
  • the positive electrode active material is not limited as long as it is used as the positive electrode active material of the nickel metal hydride battery.
  • Specific examples of the positive electrode active material include nickel hydroxide and nickel hydroxide doped with metal.
  • Examples of the metal doped into nickel hydroxide include Group 2 elements such as magnesium and calcium, Group 9 elements such as cobalt, rhodium and iridium, and Group 12 elements such as zinc and cadmium.
  • the surface of the positive electrode active material may be treated by a known method.
  • the positive electrode active material is preferably in a powder state, and the average particle size thereof is preferably in the range of 1 to 100 ⁇ m, more preferably in the range of 3 to 50 ⁇ m, and still more preferably in the range of 5 to 30 ⁇ m.
  • the positive electrode active material layer preferably contains the positive electrode active material in an amount of 75 to 99% by mass, more preferably 80 to 97% by mass, and more preferably 82 to 95% by mass with respect to the total mass of the positive electrode active material layer. More preferably, it is contained in mass%.
  • the positive electrode additive is added to the positive electrode in order to improve the battery characteristics of the nickel metal hydride battery.
  • the positive electrode additive is not limited as long as it is used as a positive electrode additive for nickel metal hydride batteries.
  • Specific positive electrode additives include niobium compounds such as Nb 2 O 5 , tungsten compounds such as WO 2 , WO 3 , Li 2 WO 4 , Na 2 WO 4 and K 2 WO 4, and ytterbium compounds such as Yb 2 O 3 .
  • titanium compounds such as TiO 2 , yttrium compounds such as Y 2 O 3 , zinc compounds such as ZnO, calcium compounds such as CaO, Ca (OH) 2 and CaF 2 , and other rare earth oxides.
  • the positive electrode additive is preferably contained in an amount of 0.1 to 10% by mass, more preferably 0.5 to 5% by mass with respect to the mass of the entire positive electrode active material layer. .
  • the binder plays a role of connecting an active material or the like to the surface of the current collector.
  • the binder is not limited as long as it is used as a binder for electrodes of nickel metal hydride batteries.
  • Specific binders include fluorine-containing resins such as polyvinylidene fluoride, polytetrafluoroethylene and fluororubber, polyolefin resins such as polypropylene and polyethylene, imide resins such as polyimide and polyamideimide, carboxymethylcellulose, methylcellulose and hydroxypropyl.
  • Cellulose derivatives such as cellulose, copolymers such as styrene butadiene rubber, and polyacrylic acid, polyacrylic acid ester, polymethacrylic acid and polymethacrylic acid ester containing (meth) acrylic acid derivatives as monomer units
  • An example is a (meth) acrylic resin.
  • the binder is preferably contained in an amount of 0.1 to 15% by mass, more preferably 1 to 10% by mass, with respect to the mass of the entire active material layer. More preferably, it is contained in mass%. This is because when the amount of the binder is too small, the moldability of the electrode is lowered, and when the amount of the binder is too large, the energy density of the electrode is lowered.
  • Conductive aid is added to increase the conductivity of the electrode. Therefore, the conductive auxiliary agent may be added arbitrarily when the electrode conductivity is insufficient, and may not be added when the electrode conductivity is sufficiently excellent.
  • the conductive auxiliary agent may be added to the active material layer in a powder state, or may be used in a state where the surfaces of the active material particles are coated.
  • the conductive auxiliary agent may be an electronic conductor that is chemically inert.
  • Specific conductive materials include metals such as cobalt, nickel, copper, metal oxides such as cobalt oxide, metal hydroxides such as cobalt hydroxide, carbon monoxide complexes such as carbonyl nickel, carbon black, and the like. Examples thereof include carbon materials such as graphite and carbon fiber.
  • the active material layer preferably contains 0.1 to 20% by mass of a conductive additive with respect to the total mass of the active material layer.
  • the conductive additive is preferably contained in an amount of 1 to 15% by mass, more preferably 3 to 12% by mass, with respect to the total mass of the positive electrode active material layer. More preferably, it is contained in mass%.
  • the negative electrode active material layer preferably contains 0.1 to 5% by mass, more preferably 0.2 to 3% by mass of the conductive auxiliary agent with respect to the total mass of the negative electrode active material layer. More preferably, the content is 0.3 to 1% by mass.
  • the negative electrode active material layer includes a negative electrode material and, if necessary, a negative electrode additive, a binder, and a conductive additive.
  • the negative electrode material is composed of hydrogen storage alloy particles, which are negative electrode active materials, and a plating layer.
  • the binder and the conductive aid are as described above.
  • the negative electrode material is preferably contained in an amount of 85 to 99% by mass, more preferably 90 to 98% by mass with respect to the mass of the entire negative electrode active material layer.
  • the negative electrode additive is added to the negative electrode in order to improve the battery characteristics of the nickel metal hydride battery.
  • the negative electrode additive is not limited as long as it is used as a negative electrode additive for nickel metal hydride batteries.
  • Specific negative electrode additives include rare earth fluorides such as CeF 3 and YF 3 , bismuth compounds such as Bi 2 O 3 and BiF 3 , indium compounds such as In 2 O 3 and InF 3 , and positive electrode additives Can be mentioned as examples.
  • the negative electrode additive is preferably contained in an amount of 0.1 to 10% by mass, more preferably 0.5 to 5% by mass with respect to the total mass of the negative electrode active material layer. .
  • a current collecting method such as a roll coating method, a die coating method, a dip coating method, a doctor blade method, a spray coating method, or a curtain coating method
  • An active material may be applied to the surface of the body.
  • an active material, a solvent, and if necessary, a binder, a conductive additive and an additive are mixed to form a slurry, and the slurry is applied to the surface of the current collector and then dried.
  • the solvent include N-methyl-2-pyrrolidone, methanol, methyl isobutyl ketone, and water.
  • the dried product may be compressed.
  • the separator separates the positive electrode and the negative electrode, and provides a storage space and a passage for the electrolyte while preventing a short circuit due to contact between the two electrodes.
  • a known separator may be employed, such as polytetrafluoroethylene, polypropylene, polyethylene, polyimide, polyamide, polyaramid (Aromatic polymer), polyester, polyacrylonitrile and other synthetic resins, cellulose, amylose and other polysaccharides, fibroin. And porous materials, nonwoven fabrics, woven fabrics, and the like using one or more electrical insulating materials such as natural polymers such as keratin, lignin, and suberin, and ceramics.
  • the separator may have a multilayer structure.
  • the separator is preferably subjected to a hydrophilic treatment on the surface.
  • hydrophilic treatment include sulfonation treatment, corona treatment, fluorine gas treatment, and plasma treatment.
  • the electrolytic solution may be a strong base aqueous solution generally used as an electrolytic solution for nickel metal hydride batteries.
  • the strong base aqueous solution include a potassium hydroxide aqueous solution, a sodium hydroxide aqueous solution, and a lithium hydroxide aqueous solution.
  • the electrolytic solution only one kind of strong base aqueous solution may be used, or plural kinds of strong base aqueous solutions may be mixed and used.
  • adopted as the electrolyte solution for nickel metal hydride batteries may be added to electrolyte solution.
  • a separator is interposed between the positive electrode and the negative electrode as necessary to form an electrode body, from the positive electrode current collector and the negative electrode current collector to the positive electrode terminal and the negative electrode terminal connected to the outside.
  • the electrolyte solution of the present invention may be added to the electrode body to form a nickel metal hydride battery.
  • the shape of the nickel metal hydride battery is not particularly limited, and various shapes such as a square shape, a cylindrical shape, a coin shape, and a laminate shape can be adopted.
  • Example 1 Plating solution preparation process> A plating solution was prepared using nickel sulfate as a nickel salt, cobalt sulfate as a metal salt, malonic acid which is a dicarboxylic acid as a hetero element-containing organic compound, and water as an aqueous solvent.
  • NiSO 4 .6H 2 O, 1.5 g of CoSO 4 .7H 2 O, and 1.5 g of dicarboxylic acid were measured, and 75 g of distilled water was added. This was heated to 90 ° C. to form a solution, and NaOH was added to maintain the solution at 80 ° C. so that the pH was 4 to 5, thereby obtaining a plating solution.
  • ⁇ Plating process> 1.0 g of sodium borohydride was weighed out as a reducing agent, and distilled water was added to 100 ml to obtain a reducing agent solution.
  • As hydrogen storage alloy particles particles of A 2 B 7 type hydrogen storage alloy represented by (Nd 0.88 Zr 0.01 Mg 0.11 ) 1.0 (Ni 0.95 Al 0.05 ) 3.5 was used. The average particle diameter of the hydrogen storage alloy particles was 25 ⁇ m. 60 g of the above hydrogen storage alloy particles were added to a 1 L glass reaction tank, and distilled water was added so that the amount of the liquid in the reaction tank was 400 ml to obtain a slurry-like hydrogen storage alloy particle dispersion.
  • the hydrogen storage alloy particle dispersion in the reaction vessel was stirred using a paddle type stirring blade. A plating solution and a reducing agent solution were dropped into the reaction vessel. This plating mixture was stirred for about 1 hour. By this step, a negative electrode material having a plating layer formed on the surface of the hydrogen storage alloy was obtained.
  • the negative electrode material was immediately filtered off, and the solid content thus filtered, that is, the negative electrode material was washed with pure water.
  • the washed negative electrode material was vacuum dried, and the dried negative electrode material was crushed in the air using a mortar.
  • the vacuum-dried negative electrode material was placed in a heating furnace and heated from room temperature to 350 ° C. in an argon atmosphere.
  • the negative electrode material after the heating step was used as the negative electrode material of Example 1.
  • Example 2 A negative electrode material of Example 2 was obtained in the same manner as in Example 1 except that the heating step was not performed. In the method of Example 2, the powder after the plating process was used as the negative electrode material of Example 2.
  • Comparative Example 1 The same hydrogen storage alloy particles having an average particle diameter of 25 ⁇ m as those used in Example 1 were used as the negative electrode material of Comparative Example 1.
  • Comparative Example 2 A negative electrode material of Comparative Example 2 was obtained in the same manner as in Example 1 except that no heteroelement-containing organic compound was blended in the plating solution.
  • the plating solution in the manufacturing method of Comparative Example 2 heating NiSO 4 ⁇ 6H 2 O and 1.5g and CoSO 4 ⁇ 7H 2 O 1.5g of measured out, those of distilled water was added 75g of a 90 ° C. Then, NaOH is added so that the pH is 5 while keeping the solution at 80 ° C.
  • Comparative Example 3 A negative electrode material of Comparative Example 3 was obtained in the same manner as Comparative Example 2, except that the heating step was not performed.
  • the powder resistance of the negative electrode material of Example 1 and Example 2 is lower than the powder resistance of the negative electrode material of Comparative Example 1. This is considered to be due to the presence or absence of the plating layer, and it is considered that excellent conductivity was imparted to the negative electrode material of Example 1 and the negative electrode material of Example 2 by having the plating layer.
  • the powder resistance of the negative electrode material of Example 1 is significantly lower than that of the negative electrode material of Comparative Example 2. This is considered due to the presence or absence of complexation of the plating metal in the plating solution. From this result, it is understood that a plating layer having excellent conductivity can be obtained by forming a plating layer with a complexed plating metal.
  • the powder resistance of the negative electrode material of Example 1 is lower than that of the negative electrode material of Example 2. This is considered due to the presence or absence of the heating step. It can be seen that heating after forming the plating layer can further reduce the powder resistance of the negative electrode material and further improve the conductivity of the negative electrode material.
  • the negative electrode material of Comparative Example 2 in which the plating layer was formed without complexing and the negative electrode material of Comparative Example 3 were compared, the negative electrode material of Comparative Example 2 in which the heating process was performed was compared without performing the heating process. Compared to the negative electrode material of Example 3, the powder resistance is low. Further, the negative electrode material of Comparative Example 3 in which the plating layer was not formed and the heating step was not performed had a powder resistance comparable to that of the negative electrode material of Comparative Example 1 without the plating layer. From this result, it can be seen that it is difficult to improve conductivity simply by forming a plating layer, and that a plating layer having excellent conductivity can be obtained only by forming a plating layer through complexation of plating metal. Furthermore, it turns out that the electroconductivity of negative electrode material improves by performing a heating process for a certain reason.
  • the peak intensity of 853 eV derived from metallic nickel is larger than the peak intensity of 856 eV derived from nickel hydroxide. From this result, it can be considered that a lot of nickel hydroxide is present on the surface of the negative electrode material of Comparative Example 2 whereas a large amount of metallic nickel is present on the surface of the negative electrode material of Example 1. This result suggests that nickel hydroxide was suppressed in the production method of Example 1, and that nickel complexation was effective in suppressing nickel hydroxide.
  • the surface composition of the negative electrode material of Example 1 and the negative electrode material of Comparative Example 1 was analyzed. Specifically, the composition from the surface to a depth of 5 nm was measured by XPS in a measurement area having a predetermined area at an arbitrary position on the surface of the negative electrode material. Based on the measurement result, the mass (A) of the rare earth metal and the mass (B) of the transition metal in the predetermined volume of the region were calculated, and the B / A value obtained by dividing B by A was calculated. The B / A can be said to be an abundance ratio of the rare earth metal and the transition metal.
  • B / A in the negative electrode material of Example 1 was 127.5, and B / A in the negative electrode material of Comparative Example 1 was 3.7. That is, the B / A in the negative electrode material of Example 1 was approximately 34 times the B / A in the negative electrode material of Comparative Example 1.
  • the B / A on the surface of the negative electrode material of Example 1 was 127.5, and the B / A on the surface of the hydrogen storage alloy particles as the material was 3.7. That is, the B / A on the surface of the negative electrode material of Example 1 was approximately 34 times the B / A on the surface of the hydrogen storage alloy particles.
  • B / A on the surface of the negative electrode material of the present invention is larger than B / A on the surface of the hydrogen storage alloy particles.
  • rare earth elements are contained in the hydrogen storage alloy particles but are not substantially contained in the plating layer, it can be said that the higher the B / A, the higher the surface coverage of the hydrogen storage alloy particles by the plating layer.
  • the B / A on the surface of the negative electrode material of the present invention is preferably 5 times or more, more preferably 10 times or more, more preferably 20 times or more of the B / A on the surface of the hydrogen storage alloy particles. More preferably, it is particularly preferably 30 times or more.
  • B / A on the surface of the negative electrode material of the present invention is preferably 10 or more and 1000 or less, more preferably 50 or more and 1000 or less, still more preferably 70 or more and 1000 or less, and 100 or more. It can be said that it is especially preferable that it is 1000 or less.
  • Example 3 In the plating step, 0.03 g of polyvinyl pyrrolidone as an organic compound dispersant was added to the slurry-like hydrogen storage alloy particle dispersion, and the negative electrode material after plating, washing and drying was crushed in the atmosphere. A negative electrode material of Example 3 was obtained in the same manner as in Example 1 except that it was omitted. In addition, according to the manufacturing method of Example 1, the negative electrode material aggregated during filtration in the plating step, but the aggregation does not occur in the manufacturing method of Example 3, and the negative electrode material after washing and drying does not crush. But it was easy to understand.
  • the difference between the manufacturing method of Example 1 and Example 3 and the manufacturing method of Comparative Example 2 is the presence or absence of complexation of the plating metal in the plating solution. Therefore, it is considered that the difference in surface shape is caused by the presence or absence of complexation of the plating metal. From this result, it is confirmed that by plating the plating metal in the plating solution, the plating metal, that is, nickel and metal precipitate in a granular form, and a plating layer composed of an aggregate of particles can be obtained.
  • the average particle size of the particles present on the surface of the negative electrode material of Example 3 is 10 nm, and the particle size is the average particle size of the particles present on the surface of the negative electrode material of Example 1. It was smaller than 10 nm to 20 nm. From this result, it can be seen that, in addition to complexation of the plating metal, a plating layer composed of an aggregate of finer particles can be obtained by performing the plating step in the presence of an organic compound dispersant. Furthermore, since the negative electrode material having the plating layer hardly aggregates and does not require crushing, the negative electrode material can be easily prepared according to the manufacturing method of Example 3, that is, the manufacturing method in which the plating process is performed in the presence of the organic compound dispersant. It can be seen that it can be manufactured.
  • the negative electrode material of Example 1 has a BET specific surface area of 4.085 m 2 / g
  • the negative electrode material of Comparative Example 1 has a BET specific surface area of 0.173 m 2 / g
  • the negative electrode material of Example 1 has a BET specific surface area.
  • the negative electrode material of Example 1 has a BET specific surface area of 4.085 m 2 / g
  • the hydrogen storage alloy particles of the material has a BET specific surface area of 0.173 m 2 / g.
  • a value obtained by dividing the BET specific surface area of the material by the BET specific surface area of the hydrogen storage alloy particles as the material was 24.
  • the plating layer constituting the surface of the negative electrode material of the present invention is composed of an aggregate of particles as shown in FIG. 3, for example, the specific surface area is large. Therefore, the BET specific surface area of the negative electrode material of the present invention having such a plating layer is larger than the BET specific surface area of the hydrogen storage alloy particles as the material. That is, it can be said that the value obtained by dividing the BET specific surface area of the negative electrode material of the present invention by the BET specific surface area of the hydrogen storage alloy particles exceeds 1.
  • the value obtained by dividing the BET specific surface area of the negative electrode material of the present invention by the BET specific surface area of the hydrogen storage alloy particles is preferably 3 or more, and more preferably 5 or more. More preferably, it is more preferably 10 or more, and particularly preferably 20 or more. There is no particular upper limit to the value obtained by dividing the BET specific surface area of the negative electrode material of the present invention by the BET specific surface area of the hydrogen storage alloy particles. Further, the BET specific surface area of the negative electrode material of the present invention is preferably 1 to 10 m 2 / g, more preferably 1.5 to 8 m 2 / g, and 2 to 6 m 2 / g. More preferred is 3 to 5 m 2 / g.
  • Nickel metal hydride battery (Nickel metal hydride battery) Using the negative electrode materials of Example 1, Example 3, and Comparative Example 1, nickel metal hydride batteries were produced as follows.
  • the nickel foil coated with the slurry was dried to remove water, and then the nickel foil was pressed to obtain a bonded product.
  • the obtained joined product was dried by heating at 70 ° C. for 1 hour with a dryer to produce a positive electrode in which a positive electrode active material layer was formed on a current collector.
  • Example 1 As the negative electrode material, the negative electrode material of Example 1, Example 3, or Comparative Example 1 was used. 96.9 parts by mass of the negative electrode material, 0.4 parts by mass of carbon black as the conductive auxiliary agent, 2 parts by mass of the acrylic resin emulsion (Johncrill PDX7341, BASF) as the binder, and as the binder A slurry was produced by mixing 0.7 part by mass of carboxymethyl cellulose and an appropriate amount of ion-exchanged water. A nickel foil having a thickness of 10 ⁇ m was prepared as a negative electrode current collector. The slurry was applied in a film form on the surface of the nickel foil using a doctor blade.
  • the nickel foil coated with the slurry was dried to remove water, and then the nickel foil was pressed to obtain a bonded product.
  • the obtained joined product was dried by heating at 70 ° C. for 1 hour with a dryer to produce a negative electrode having a negative electrode active material layer formed on a current collector.
  • ⁇ Electrolyte> An aqueous solution in which the concentration of potassium hydroxide is 5.5 mol / L, the concentration of sodium hydroxide is 0.5 mol / L, and the concentration of lithium hydroxide is 0.5 mol / L is prepared. It was. ⁇ Battery> A 120 ⁇ m-thick polypropylene fiber nonwoven fabric subjected to sulfonation treatment was prepared as a separator. A separator was sandwiched between the positive electrode and the negative electrode to form an electrode plate group. Each of the nickel metal hydride batteries of Example 1, Example 3, and Comparative Example 1 was prepared by placing an electrode plate group in a resin case, injecting an electrolyte, and sealing the case. Manufactured.
  • the nickel metal hydride batteries of Example 1 and Example 3 having a plating layer obtained by complexing a plating metal are compared with the nickel metal hydride battery of Comparative Example 1 having no plating layer.
  • a large output can be obtained even at a low temperature of 0 ° C. This is considered to be due to the improved conductivity of the negative electrode by the plating layer.
  • Example 3 comparing Example 3 using an organic compound dispersant in Example 1 with no organic compound dispersant in the plating layer forming step, the nickel metal hydride battery of Example 3 is the same as that of Example 1.
  • the output value is even better. From this result, it can be seen that a negative electrode material capable of further improving the output characteristics of the nickel metal hydride battery can be obtained by using an organic compound dispersant when forming the plating layer. As shown in FIG. 3 and FIG. 4, since the surface shape of the plating layer varies depending on the presence or absence of the organic compound dispersant, the difference in the output characteristics is also related to the surface shape of the plating layer. Can be considered. That is, it is considered that the plating layer made of an aggregate of particles contributes to improvement of output characteristics.
  • the capacity utilization of the nickel metal hydride battery of Example 1 from the first cycle to the 37th cycle was almost unchanged, whereas the nickel metal hydride battery of Comparative Example 1
  • the capacity utilization rate dropped significantly after 20 cycles. From this result, the capacity utilization rate in the nickel metal hydride battery is greatly improved by the presence of the plating layer, that is, the negative electrode material of the present invention having the plating layer contributes to the improvement of the durability of the nickel metal hydride battery. I understand that.
  • Reference Example 1 A negative electrode material of Reference Example 1 was obtained in the same manner as Comparative Example 2 except that the heating temperature in the heating step was 200 ° C.
  • Reference Example 2 A negative electrode material of Reference Example 2 was obtained in the same manner as Reference Example 1 except that the heating temperature in the heating step was 350 ° C.
  • Reference Example 3 A negative electrode material of Reference Example 3 was obtained in the same manner as Reference Example 1 except that the heating temperature in the heating step was 450 ° C.
  • Reference Example 4 A negative electrode material of Reference Example 4 was obtained in the same manner as Reference Example 1 except that the heating temperature in the heating step was 600 ° C.
  • the powder resistances of the negative electrode materials of Reference Examples 2 to 4 in which the heating temperatures in the heating process are 350 ° C., 450 ° C., and 600 ° C., respectively, are 200 ° C. in the heating process. All were low compared with the powder resistance of the negative electrode material of the reference example 1. This result suggests that the conductivity of the negative electrode material can be improved by heating the negative electrode material at a temperature exceeding 200 ° C. in the heating step. Moreover, since the powder resistance of the negative electrode material of Reference Example 2 having a heating temperature of 350 ° C. is lower than the powder resistance of the negative electrode materials of Reference Example 3 and Reference Example 4, the heating temperature of the negative electrode material is around 350 ° C. It is suggested that this is preferable.
  • the nickel metal hydride battery of Reference Example 2 was also superior to the batteries of Comparative Example 1, Reference Example 3 and Reference Example 4 in terms of 10C discharge efficiency and cycle life. This suggests that excellent battery characteristics can be imparted to the nickel metal hydride battery by the negative electrode material subjected to the heating process at a suitable temperature.
  • Example 4 A negative electrode material of Example 4 was obtained in the same manner as the production method of Example 3, except that the negative electrode material was heated at 400 ° C. in the heating step. That is, in the manufacturing method of Example 4, as in the manufacturing method of Example 3, since the aggregation of the negative electrode material did not occur during the filtration after the plating process, the step of crushing the dried negative electrode material in the atmosphere was performed. I don't have it.
  • Example 1-A A negative electrode material of Example 1-A was obtained in the same manner as in Example 1. Similar to the manufacturing method of Example 1, the manufacturing method of Example 1-A includes a step of crushing the dried negative electrode material in the air using a mortar after the plating step.
  • the ratio of the peak intensity of 853 eV to the peak intensity of 856 eV is larger than the XPS spectrum of the negative electrode material of Example 1-A.
  • the peak at 856 eV is considered to be derived from nickel hydroxide
  • the peak at 853 eV is considered to be derived from metallic nickel. Therefore, this result suggests that the ratio of metallic nickel to nickel hydroxide is higher on the surface of the negative electrode material of Example 4 than on the surface of the negative electrode material of Example 1-A.
  • Example 1-A it is considered that the negative electrode material was crushed in the air after the plating and before the heating step, so that the negative electrode material was exposed to the air and the surface of the negative electrode material was oxidized.
  • the manufacturing method of Example 4 since the above-mentioned crushing in the atmosphere was not performed, it was considered that the negative electrode material was not exposed to the atmosphere and the oxidation of the negative electrode material surface could be suppressed.
  • the negative electrode material of Example 4 obtained by performing the plating step in the presence of the organic compound dispersant and without exposing to air after filtration was plated in the absence of the organic compound dispersant.
  • the powder resistance was remarkably reduced and the conductivity was excellent. This is presumably due to the presence of a large amount of metallic nickel on the surface of the negative electrode material of Example 4 as described above.
  • Example 5 Except that vacuum drying after plating and pulverization in the atmosphere were omitted, that the heating temperature in the heating step was 300 ° C., and that the drying step was performed before the heating step, the same as in Example 1.
  • the negative electrode material of Example 5 was obtained by the method. Specifically, in Example 5, the negative electrode material filtered and washed in the plating step is directly put into a heating furnace, and the negative electrode material is preheated in a heating furnace under vacuum at 60 ° C. for 5 hours to obtain moisture, etc. After performing the drying process which evaporates the volatile component of this, it heated up to 300 degreeC in argon atmosphere similarly to Example 1, and the heating process was performed. In Example 5, it can be said that substantially vacuum drying was performed in the heating furnace.
  • the ratio of the peak intensity of 853 eV derived from metallic nickel to the peak intensity of 856 eV derived from nickel hydroxide is the same as that of the negative electrode material of Example 1 in the XPS spectrum of the negative electrode material of Example 5. It was much larger than the XPS spectrum. This result suggests that the ratio of metallic nickel to nickel hydroxide is higher on the surface of the negative electrode material of Example 5 than on the surface of the negative electrode material of Example 1. In the manufacturing method of Example 5, it is considered that the oxidation of the negative electrode material surface was suppressed by omitting the disintegration of the negative electrode material in the air before the heating step after plating.
  • the negative electrode material of Example 5 that avoided atmospheric exposure as much as possible had lower powder resistance than the negative electrode material of Example 1 that was crushed while being exposed to the air after filtration. . From this result, it is possible to obtain a negative electrode material having a large amount of metallic nickel on the surface and excellent in conductivity by eliminating the disintegration of the negative electrode material in the air after the heating process after plating and avoiding exposure of the negative electrode material to the atmosphere as much as possible. It can be said.
  • Example 6 A negative electrode material of Example 6 was obtained in the same manner as in Example 1 except that the low oxygen gas exposure process was performed after the heating process. Specifically, low oxygen gas in which argon gas and oxygen gas were mixed at a mass ratio of 99: 1 was circulated for 15 minutes in a heating furnace that was naturally cooled to room temperature after the heating step. In the low oxygen gas exposure step, the negative electrode material after the heating step was exposed to low oxygen gas to oxidize the negative electrode material under mild conditions. In addition, in the manufacturing method of the negative electrode material of Example 6, similarly to Example 1, the negative electrode material before plating and before the heating step was crushed in the atmosphere.
  • the ratio of the peak intensity of 853 eV derived from metallic nickel to the peak intensity of 856 eV derived from nickel hydroxide is the same as that of the negative electrode material of Example 1 in the XPS spectrum of the negative electrode material of Example 6. It was much larger than the XPS spectrum. This result suggests that the ratio of metallic nickel to nickel hydroxide is higher on the surface of the negative electrode material of Example 6 than on the surface of the negative electrode material of Example 1.
  • the negative electrode material was crushed in the air before the post-plating heating step, but it was considered that the oxidation of the negative electrode material surface was suppressed by performing the low oxygen gas exposure step thereafter.
  • the negative electrode material of Example 6 that was subjected to the low oxygen gas exposure step after the heating step was crushed while being exposed to the air after filtration, and the low oxygen gas exposure step was not performed Compared with the negative electrode material of No. 1, the powder resistance was lowered.
  • the negative electrode material of Example 6 had a lower powder resistance than the negative electrode material of Example 5 that avoided exposure to the atmosphere as much as possible and did not perform the low oxygen gas exposure step. From this result, it can be seen that the conductivity of the negative electrode material can be further improved by performing the low oxygen gas exposure step after heating.
  • Example 7 Except for the heating temperature in the heating step, negative electrode materials of Examples 7-1 to 7-4 were obtained in the same manner as in Example 3. Specifically, the heating temperatures in Example 7-1, Example 7-2, and Example 7-3 were 300 ° C., 250 ° C., and 200 ° C., respectively. In Example 7-4, the heating step was not performed.
  • the powder resistance of the negative electrode material of Example 7-3 in which the heating temperature was 200 ° C. was comparable to the powder resistance of the negative electrode material of Example 7-4 that was not subjected to the heating step.
  • the powder resistance decreased as the heating temperature increased. From this result, when performing a heating process, it can be said that it is preferable that heating temperature is a temperature exceeding 200 degreeC, it is more preferable that it is 250 degreeC or more, and it is still more preferable that it is 300 degreeC or more.
  • Example 8 Example 3 except that in the plating step, the amounts of the hydrogen storage alloy particles and the plating solution were adjusted so that the sum of the mass of nickel and the mass of cobalt relative to 100 parts by mass of the hydrogen storage alloy particles was 1 part by mass.
  • a negative electrode material of Example 8 was obtained in the same manner as described above.
  • Example 9 Example 8 except that the sum of the mass of nickel and the mass of cobalt with respect to 100 parts by mass of the hydrogen storage alloy particles was 0.5 parts by mass, and that the heating temperature in the heating step was 300 ° C. The negative electrode material of Example 9 was obtained by the method.
  • the resistance value was calculated by dividing the voltage change amount by the current value according to Ohm's law. The amount of change in voltage of each battery during 0.1 second discharge was also measured in the same manner, and the result was DC-IR at 25 ° C., SOC 60%, 0.1 second. Then, for each DC-IR in the nickel metal hydride batteries of Example 8 and Example 9, the percentage when the DC-IR in the nickel metal hydride battery of Comparative Example 1 was taken as 100% was calculated. The results are shown in Table 8.
  • the negative electrode material of Example 8 and Example 9 having a plating layer is less in internal resistance and the output of the nickel metal hydride battery than the negative electrode material of Comparative Example 1 having no plating layer. Greatly contributes to improvement.
  • Example 8 and Example 9 are compared, by reducing the thickness of the plating layer, the internal resistance of the nickel metal hydride battery can be further reduced, and the output of the nickel metal hydride battery can be further improved. It is guessed.
  • the thickness of the plating layer is considered to be affected by the film formation rate in the reaction system of the plating process.
  • the film formation rate is determined by, for example, the concentration of the plating solution in the reaction system of the plating process, specifically, the value obtained by dividing the sum of the mass of nickel and the mass of cobalt in the reaction system by the mass of the hydrogen storage alloy particles. Can be adjusted.
  • the plating layer thickness can be reduced by setting the concentration of the plating solution in the reaction system low.
  • Example 10 In the plating solution preparation step, the negative electrode material of Example 10 was prepared in the same manner as in Example 3 except that only nickel sulfate was used as the plating metal salt and the heating temperature in the heating step was 300 ° C. Obtained. Specifically, in the negative electrode material manufacturing method of Example 10, in the plating solution preparation step, 3.0 g of NiSO 4 .6H 2 O and 1.5 g of malonic acid were measured and 75 g of distilled water was added. . This was heated to 90 ° C. to form a solution, and NaOH was added to maintain the solution at 80 ° C. so that the pH was 4 to 5, thereby obtaining a plating solution.
  • Example 11 In the plating solution preparation process, except that nickel sulfate hexahydrate and dicopper (II) carbonate dihydroxide were used as the plating metal salt so that the molar ratio of nickel to copper was 95: 5. In the same manner as in Example 10, the negative electrode material of Example 11 was obtained.
  • Example 12 In the plating solution preparation process, except that nickel sulfate hexahydrate and dicopper (II) carbonate dihydroxide were used as the plating metal salt so that the molar ratio of nickel to copper was 3: 1. In the same manner as in Example 10, the negative electrode material of Example 12 was obtained.
  • Comparative Example 1-A A negative electrode material of Comparative Example 1-A was obtained in the same manner as in Comparative Example 1.
  • FIGS. 13 shows the surface analysis results of the negative electrode material of Comparative Example 1-A
  • FIGS. 14 and 15 show the surface analysis results of the negative electrode material of Example 11.
  • the XPS spectrum shown in FIGS. 13 and 14 shows a peak mainly derived from nickel
  • the XPS spectrum shown in FIG. 15 shows a peak mainly derived from copper.
  • the peak intensity of 856 eV derived from nickel hydroxide is higher than the peak intensity of 853 eV derived from metallic nickel. It was big.
  • the peak intensity of 853 eV derived from metallic nickel was much larger than the peak intensity of 856 eV derived from nickel hydroxide.
  • the XPS spectrum of the negative electrode material of Example 12 was almost the same as the XPS spectrum of the negative electrode material of Example 11. From this result, it can be seen that the negative electrode material having a large amount of metallic nickel on the surface can also be manufactured in the negative electrode material manufacturing methods of Example 11 and Example 12 using copper as the metal for the plating solution.
  • the peak intensity of 953 eV derived from metallic copper and the peak intensity of 933 eV are compared with the peak intensity around 940 to 945 derived from copper oxide. It was remarkably big. The same was true for the XPS spectrum of the negative electrode material of Example 12. From this result, it can be estimated that the ratio of metallic copper to copper oxide is large on the surfaces of the negative electrode materials of Examples 11 and 12.
  • the powder resistance of the negative electrode material of Example 11 and the negative electrode material of Example 12 using nickel and copper as the plating metal is larger than the powder resistance of the negative electrode material of Comparative Example 1-A. It was low. From this result, it is understood that a negative electrode material having low powder resistance and excellent conductivity can be obtained even when copper is used instead of cobalt as the metal for the plating solution.
  • FIGS. 16 is a diagram comparing the charge curves of the nickel metal hydride batteries of Example 10 and Example 11, and FIG. 17 is a comparison of the charge curves of the nickel metal hydride batteries of Example 11 and Example 12.
  • FIG. 16 is a diagram comparing the charge curves of the nickel metal hydride batteries of Example 10 and Example 11
  • FIG. 17 is a comparison of the charge curves of the nickel metal hydride batteries of Example 11 and Example 12.
  • the voltage of the nickel metal hydride batteries of Examples 10 to 12 when the SOC is 100% is about 1.45 to 1.5 V, and these nickel metal hydride batteries are It can be said that the battery is fully charged at a low voltage. This result suggests that the charging resistance of the nickel metal hydride batteries of Examples 10 to 12 is low.
  • the nickel metal hydride battery of Example 11 was fully charged at a lower voltage than the nickel metal hydride battery of Example 10. For this reason, when nickel and copper are included in the plating layer, it can be said that the charging resistance is further reduced as compared with the case where only nickel is included in the plating layer. That is, it is thought that the electroconductivity of a plating layer improves more by using nickel and copper together as a plating metal.
  • the nickel metal hydride battery of Example 12 was fully charged at a lower voltage than the nickel metal hydride battery of Example 11. For this reason, when forming a plating layer containing nickel and copper as the plating metal, the molar ratio of nickel to copper in the plating solution is 3: 1 rather than 95: 5, considering the conductivity of the plating layer. It can be said that it is preferable. Furthermore, as a preferable range of the molar ratio of nickel and copper in the plating solution based on the result, 99: 1 to 30:70, 95: 5 to 50:50, 90:10 to 65:35, 80 : The range of 20 to 70:30 may be mentioned.
  • Example 13 A negative electrode material of Example 13 was obtained in the same manner as in Example 12 except that the heating temperature in the heating step was 250 ° C.
  • Example 14 A negative electrode material of Example 14 was obtained in the same manner as in Example 12 except that the heating temperature in the heating step was 350 ° C.
  • FIGS. 18 and 19 show the surface analysis results of the negative electrode material of Example 12
  • FIGS. 20 and 21 show the surface analysis results of the negative electrode material of Example 14.
  • the XPS spectra shown in FIGS. 18 and 20 show peaks mainly derived from nickel
  • the XPS spectra shown in FIGS. 19 and 21 show peaks mainly derived from copper.
  • the peak intensity around 953 eV and the peak intensity around 933 eV derived from metallic copper are copper oxide.
  • the peak intensity around 940 to 945 derived from the product was remarkably large. From this result, according to the manufacturing method of the present invention, even when the temperature condition of the heating process is changed, when copper is used as the plating metal, the negative electrode material has a high ratio of metallic copper to copper oxide on the surface of the negative electrode material. It can be seen that can be manufactured.
  • the heating temperature is set to 350 ° C., which is compared with the case where the heating temperature is set to 300 ° C. It is considered that the particles constituting the layer grow. Furthermore, it is estimated that the crystallinity of the plating layer is improved by setting the heating temperature to 350 ° C.
  • Example 23 Battery characteristics Using the negative electrode materials of Example 10 and Examples 12 to 14, nickel metal hydride batteries of Example 10 and Examples 12 to 14 were obtained in the same manner as the nickel metal hydride battery of Example 1. .
  • the nickel metal hydride batteries of Example 10 and Examples 12 to 14 were charged to 100% SOC at 25 ° C. and 0.1 C, and then discharged to 1 V at 0.2 C. The relationship between the voltage and the charging time or discharging time at this time is shown in FIG.
  • the nickel metal hydride battery of Example 14 having a heating temperature of 350 ° C. was fully charged at the lowest potential and Since the discharge was performed at the highest potential, it can be said that the negative electrode material of Example 14 shows excellent performance as a negative electrode material for nickel metal hydride batteries. From this result, it can be seen that the heating temperature in the heating step is preferably 350 ° C. in the manufacturing method of the present invention using nickel and copper as the plating metal.
  • the powder resistance is low in the order of Example 13, Example 12, and Example 14, and in the method for producing the negative electrode material of Examples 12 to 14, the heating temperature in the heating step is high. It can be seen that a negative electrode material having better conductivity can be produced.
  • the heating temperature is 350 ° C.
  • the particles constituting the plating layer grow or the crystallinity of the particles is higher than when the heating temperature is 300 ° C. As a result, it is speculated that excellent conductivity was imparted to the plating layer.
  • the discharge resistance of the nickel metal hydride battery of Example 14 was lower than that of the nickel metal hydride battery of Example 10 and the nickel metal hydride battery of Example 13. From this result, nickel metal hydride battery that not only nickel but also nickel and copper were used together as the plating metal for the negative electrode material, and that the heating temperature in the heating process was 350 ° C. higher than 250 ° C. It is presumed that this works favorably for reducing DC resistance.
  • Example 15 In the plating step, the same as Example 11 except that nickel sulfate hexahydrate and ruthenium nitrate (III) nitrate solution were used as the plating metal salt so that the molar ratio of nickel to ruthenium was 70:30.
  • the negative electrode material of Example 15 was obtained by the method described above.
  • Example 16 In the plating process, except that nickel sulfate hexahydrate and ruthenium nitrate (III) nitrate solution were used as plating metal salts so that the molar ratio of nickel to ruthenium was 97.5: 2.5. In the same manner as in Example 15, the negative electrode material of Example 16 was obtained.
  • Example 15 and Example 16 were obtained in the same manner as the nickel metal hydride battery of Example 1.
  • the nickel metal hydride battery of Example 15 and Example 16 it charged to SOC100% at 25 degreeC and 0.1 C, and discharged to 1V at 0.2 C after that.
  • the relationship between the voltage at this time and the charging time or discharging time is shown in FIG. 25 together with the result of Example 10 in Evaluation 23.
  • the nickel metal hydride battery of Example 15 and the nickel metal hydride battery of Example 16 are fully charged at a lower potential than the nickel metal hydride battery of Example 10, and Discharged at a high potential. For this reason, compared with the negative electrode material of Example 10 which contains only nickel as a plating metal, the negative electrode material of Example 15 which contains nickel and ruthenium as a plating metal and the negative electrode material of Example 16 are for nickel metal hydride batteries. It can be said that it exhibits excellent performance as a negative electrode material.
  • the negative electrode material in which the molar ratio of nickel to ruthenium is 70:30 The nickel metal hydride battery of Example 15 using was fully charged at a lower potential and discharged at a higher potential. For this reason, when ruthenium is contained in the plated metal, it can be said that the higher the content of ruthenium, the better the performance as a negative electrode material for nickel metal hydride batteries.
  • the molar ratio of nickel to ruthenium in the plating solution is preferably in the range of 99: 1 to 50:50, more preferably in the range of 98: 2 to 60:40.
  • the range of 97: 3 to 65:35 is more preferable.
  • Example 17 A negative electrode material of Example 17 was obtained in the same manner as in Example 15 except that the heating temperature in the heating step was 350 ° C.
  • Example 18 A negative electrode material of Example 18 was obtained in the same manner as in Example 17, except that the heating temperature in the heating step was 400 ° C.
  • the nickel metal hydride batteries of Example 17 and Example 18 using nickel and ruthenium as the plating metal are only the nickel metal hydride batteries of Example 10 using only nickel as the plating metal.
  • the DC resistance was reduced. For this reason, it is presumed that the combined use of nickel and ruthenium as the plating metal is advantageous for reducing the DC resistance.
  • Ruthenium like copper, is unlikely to elute into a strong alkaline electrolyte in nickel metal hydride batteries. For this reason, it is possible to improve the durability of the plating layer by using nickel and ruthenium as the plating metal in the same manner as when using nickel and copper as the plating metal.
  • FIGS. 26 and 27 show the surface analysis results of the negative electrode material of Example 17, and FIGS. 28 and 29 show the surface analysis results of the negative electrode material of Example 18.
  • the XPS spectra shown in FIGS. 26 and 28 mainly show peaks derived from nickel, and the XPS spectra shown in FIGS. 27 and 29 show peaks mainly derived from ruthenium.
  • the peak intensity of 853 eV derived from metallic nickel is derived from nickel hydroxide. It was much larger than the peak intensity of 856 eV. From this result, it is possible to produce a negative electrode material in which a large amount of nickel metal is present on the surface even in the negative electrode material production methods of Example 17 and Example 18 in which nickel and ruthenium are used in combination as the metal for the plating solution. Recognize.
  • the peak intensity of 280.1 eV derived from metal ruthenium is higher than that of ruthenium oxide. It was much larger than the peak intensity of 280.8 eV derived. From this result, it can be presumed that the ratio of the metal ruthenium to the ruthenium oxide is large on the surface of the negative electrode material of Example 17 and Example 18.
  • the powder resistance of the negative electrode material of Example 17 and the negative electrode material of Example 18 in which nickel and ruthenium are used in combination as plating metals is that of Comparative Example 1-A using only nickel as the plating metal. It was lower than the powder resistance of the negative electrode material. From this result, it is understood that a negative electrode material having low powder resistance and excellent conductivity can be obtained even when ruthenium is used instead of cobalt or copper as the metal for the plating solution.
  • the nickel metal hydride battery of Example 17 and the nickel metal hydride battery of Example 18 were fully charged at a lower potential than the nickel metal hydride battery of Example 10. For this reason, the negative electrode material of Example 17 and the negative electrode material of Example 18 containing nickel and ruthenium as the plating metal are compared with the negative electrode material of Example 10 containing only nickel as the plating metal for the nickel metal hydride battery. It can be said that it exhibits excellent performance as a negative electrode material.
  • the nickel metal hydride battery of Example 18 using a negative electrode material having a heating temperature of 400 ° C. is still lower than the nickel metal hydride battery of Example 17 using a negative electrode material having a heating temperature of 350 ° C. Fully charged with potential.
  • the preferable range of the heating temperature in the heating step is 250 ° C. to 500 ° C., 300 ° C. to 500 ° C., 350 ° C. to 500 ° C. , 350 ° C. or higher, 480 ° C. or lower, 360 ° C. or higher and 450 ° C. or lower.
  • the negative electrode material of Example 19 has A 2 B 7 type hydrogen storage alloy particles and a plating layer containing nickel and indium and formed on the hydrogen storage alloy particles.
  • the method for producing the negative electrode material of Example 19 was that indium sulfate was used as the metal salt, the average particle diameter of the hydrogen storage alloy particles was 25 ⁇ m, the heating temperature was 400 ° C., and nickel and indium Except that the nickel salt and the metal salt were blended so that the molar ratio was 0.5: 0.25, the production method of the negative electrode material of Example 1 was the same.
  • Example 20 A negative electrode material of Example 20 was obtained in the same manner as in Example 19, except that the negative electrode material was heated from room temperature to 350 ° C. and fired in the heating step.
  • Comparative Example 1-B A negative electrode material of Comparative Example 1-B was obtained in the same manner as Comparative Example 1 and Comparative Example 1-A.
  • the powder resistance of the negative electrode material of Example 19 and the negative electrode material of Example 20 is lower than the powder resistance of the negative electrode material of Comparative Example 1-B. Since the negative electrode material of Example 19 and the negative electrode material of Example 20 have a plating layer, this result is considered to be due to the presence or absence of the plating layer. In Example 19 and Example 20, since the plating solution containing nickel sulfate and indium sulfate is used, the negative electrode material of Example 19 and the negative electrode material of Example 20 are considered to contain nickel and indium. It is done.
  • the heating temperature in the heating step of the negative electrode material of Example 19 that was 400 ° C. in the heating step was 350 ° C.
  • the powder resistance was remarkably reduced. From this result, it can be said that when a plating layer containing nickel and indium is provided, heating the negative electrode material at a temperature exceeding 350 ° C. greatly contributes to improvement in conductivity.
  • the surface of the negative electrode material of Example 19 has a mesh shape
  • the surface of the negative electrode material of Example 20 has fine irregularities formed of particle aggregates. It was. From this result, it is suggested that the plating layer containing nickel and indium is actually melted at 400 ° C., does not melt at 350 ° C. or less, and the molten plating layer has a mesh shape.
  • the negative electrode material of Example 19 having a mesh shape on the surface is more conductive than the negative electrode material of Example 20 having a fine irregular surface and no mesh shape on the surface. It can be said that it is excellent.
  • the peak intensity of 853 eV derived from metallic nickel is larger than the peak intensity of 856 eV derived from nickel hydroxide. From this result, it is considered that a lot of nickel hydroxide is present on the surface of the negative electrode material of Comparative Example 1-B, whereas a lot of nickel metal is present on the surface of the negative electrode material of Example 20.
  • nickel is also present on the surface of the negative electrode material of Comparative Example 1-B having no plating layer, the nickel is considered to be included in the hydrogen storage alloy, and the nickel It turns out that many are hydroxides. This result further suggests that the metallic nickel confirmed on the surface of the negative electrode material of Example 20 was not originally contained in the hydrogen storage alloy but originated from the plating layer.
  • the peak of 870 eV is confirmed, whereas in the XPS spectrum of the negative electrode material of Comparative Example 1-B shown in FIG. 34, the peak of 870 eV is Not confirmed.
  • the peak at 870 eV is considered to be derived from metallic nickel and a nickel indium compound (specifically, InNi or InNi 3 ). Therefore, this result means that the plating layer contains Ni and In. Further, this result suggests that the plating layer contains a nickel indium alloy, and the nickel indium alloy is mainly composed of a mesh shape.

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Abstract

The present invention provides a technique which is able to improve the electrical conductivity of a negative electrode material that comprises hydrogen storage alloy particles. A method for producing a negative electrode material, which comprises: a plating solution preparation step wherein a plating solution containing a nickel salt, a hetero element-containing organic compound and an aqueous solvent is obtained; and a plating step wherein a hydrogen storage alloy particle dispersion liquid, which contains an aqueous solvent and hydrogen storage alloy particles, the plating solution and a reducing agent are mixed with each other, thereby obtaining a negative electrode material wherein a plating layer containing nickel is formed on the hydrogen storage alloy particles.

Description

負極材料の製造方法Method for producing negative electrode material

 本発明は、水素吸蔵合金を有する負極材料を製造する方法に関する。 The present invention relates to a method for producing a negative electrode material having a hydrogen storage alloy.

 ニッケル金属水素化物電池用の負極活物質として水素吸蔵合金を用いる技術が知られている。また、水素吸蔵合金粒子の導電性や耐久性の向上、水素吸蔵合金粒子表面の酸化抑制等の目的で、水素吸蔵合金粒子の表面に金属層を形成する技術が知られている。
 例えば、特許文献1には、水素吸蔵合金粒子の表面に金属層を設けた負極材料が紹介されている。特許文献1の〔0008〕段落には、当該金属層を設けることで、負極材料の表面に露出する水素吸蔵合金の面積が低減し、水素吸蔵合金粒子表面の酸化が抑制される旨が記載されている。また、特許文献1の〔0009〕段落には、当該金属層によって水素吸蔵合金粒子の表面が安定になることで、水素吸蔵合金粒子表面の酸化が抑制される旨が記載されている。
 なお、特許文献1には、当該金属層を形成する方法として、金属層の材料となる化合物を酸性溶液中に溶解させ、当該金属を含有する酸性溶液に水素吸蔵合金粒子を浸漬することで、水素吸蔵合金粒子の表面に金属を析出させる方法(〔0018〕段落参照)が開示されている。又、当該金属層を形成する他の方法として、水素吸蔵合金粒子と金属粉末との混合物を加熱することで、水素吸蔵合金粒子の表面の一部と金属粉末とが固溶した金属層を形成する方法(〔0021〕段落参照)が挙げられている。
A technique using a hydrogen storage alloy as a negative electrode active material for nickel metal hydride batteries is known. Further, a technique for forming a metal layer on the surface of the hydrogen storage alloy particles is known for the purpose of improving the conductivity and durability of the hydrogen storage alloy particles and suppressing the oxidation of the surface of the hydrogen storage alloy particles.
For example, Patent Document 1 introduces a negative electrode material in which a metal layer is provided on the surface of hydrogen storage alloy particles. In paragraph [0008] of Patent Document 1, it is described that by providing the metal layer, the area of the hydrogen storage alloy exposed on the surface of the negative electrode material is reduced, and oxidation of the surface of the hydrogen storage alloy particles is suppressed. ing. Further, paragraph [0009] of Patent Document 1 describes that the surface of the hydrogen storage alloy particles is stabilized by the metal layer, thereby suppressing the oxidation of the surface of the hydrogen storage alloy particles.
In Patent Document 1, as a method of forming the metal layer, a compound serving as a material of the metal layer is dissolved in an acidic solution, and the hydrogen storage alloy particles are immersed in an acidic solution containing the metal, A method of depositing metal on the surface of hydrogen storage alloy particles (see paragraph [0018]) is disclosed. As another method for forming the metal layer, a mixture of hydrogen storage alloy particles and metal powder is heated to form a metal layer in which a part of the surface of the hydrogen storage alloy particles and the metal powder are in solid solution. (See paragraph [0021]).

特開2000-40509号公報JP 2000-40509 A

 近年、電池特性の更なる向上が望まれており、当該電池特性の向上に寄与すべく負極材料についてもまた各種特性の更なる向上が望まれている。水素吸蔵合金粒子を有する負極材料については、特に、導電性に優れたものが望まれている。
 本発明はかかる事情に鑑みて為されたものであり、水素吸蔵合金粒子を有する負極材料の導電性を向上させ得る技術を提供することを課題とする。
In recent years, further improvement in battery characteristics has been desired, and further improvements in various characteristics have been desired for the negative electrode material in order to contribute to the improvement in battery characteristics. As the negative electrode material having hydrogen storage alloy particles, a material having excellent conductivity is particularly desired.
This invention is made | formed in view of this situation, and makes it a subject to provide the technique which can improve the electroconductivity of the negative electrode material which has a hydrogen storage alloy particle.

 本発明の負極材料の製造方法は、
 ニッケル塩、ヘテロ元素含有有機化合物及び水系溶媒を含有するメッキ溶液を得るメッキ溶液調製工程と、
 水系溶媒及び水素吸蔵合金粒子を含有する水素吸蔵合金粒子分散液と、前記メッキ溶液と、還元剤と、を混合して、前記水素吸蔵合金粒子上にニッケルを含むメッキ層が形成された負極材料を得るメッキ工程と、を有する。
The method for producing the negative electrode material of the present invention is as follows.
A plating solution preparation step for obtaining a plating solution containing a nickel salt, a heteroelement-containing organic compound and an aqueous solvent;
A negative electrode material in which a nickel-containing plating layer is formed on the hydrogen storage alloy particles by mixing a hydrogen storage alloy particle dispersion containing an aqueous solvent and hydrogen storage alloy particles, the plating solution, and a reducing agent. And a plating step to obtain

 本発明の負極材料の製造方法によると、導電性に優れる負極材料を製造できる。 According to the method for producing a negative electrode material of the present invention, a negative electrode material having excellent conductivity can be produced.

XPSにより測定された実施例1の負極材料の表面分析結果である。It is the surface analysis result of the negative electrode material of Example 1 measured by XPS. XPSにより測定された比較例2の負極材料の表面分析結果である。It is the surface analysis result of the negative electrode material of the comparative example 2 measured by XPS. 実施例1の負極材料のSEM像である。2 is a SEM image of a negative electrode material of Example 1. 実施例3の負極材料のSEM像である。4 is a SEM image of a negative electrode material of Example 3. 比較例2の負極材料のSEM像である。6 is a SEM image of a negative electrode material of Comparative Example 2. 実施例1及び比較例1のニッケル金属水素化物電池のサイクル試験の結果である。It is the result of the cycle test of the nickel metal hydride battery of Example 1 and Comparative Example 1. 実施例2の負極材料のX線回折チャートである。3 is an X-ray diffraction chart of a negative electrode material of Example 2. FIG. 比較例1の負極材料のX線回折チャートである。3 is an X-ray diffraction chart of a negative electrode material of Comparative Example 1. XPSにより測定された実施例4の負極材料の表面分析結果である。It is the surface analysis result of the negative electrode material of Example 4 measured by XPS. XPSにより測定された実施例1-Aの負極材料の表面分析結果である。3 is a surface analysis result of the negative electrode material of Example 1-A measured by XPS. XPSにより測定された実施例5及び実施例1の負極材料の表面分析結果である。It is the surface analysis result of the negative electrode material of Example 5 and Example 1 measured by XPS. XPSにより測定された実施例6の負極材料の表面分析結果である。It is a surface analysis result of the negative electrode material of Example 6 measured by XPS. XPSにより測定された比較例1-Aの負極材料の表面分析結果である。It is the surface analysis result of the negative electrode material of Comparative Example 1-A measured by XPS. XPSにより測定された実施例11の負極材料の表面分析結果である。It is a surface analysis result of the negative electrode material of Example 11 measured by XPS. XPSにより測定された実施例11の負極材料の表面分析結果である。It is a surface analysis result of the negative electrode material of Example 11 measured by XPS. 実施例10及び実施例11のニッケル金属水素化物電池の充電カーブを比較した図である。It is the figure which compared the charging curve of the nickel metal hydride battery of Example 10 and Example 11. FIG. 実施例11及び実施例12のニッケル金属水素化物電池の充電カーブを比較した図である。It is the figure which compared the charging curve of the nickel metal hydride battery of Example 11 and Example 12. XPSにより測定された実施例12の負極材料の表面分析結果である。It is a surface analysis result of the negative electrode material of Example 12 measured by XPS. XPSにより測定された実施例12の負極材料の表面分析結果である。It is a surface analysis result of the negative electrode material of Example 12 measured by XPS. XPSにより測定された実施例14の負極材料の表面分析結果である。It is the surface analysis result of the negative electrode material of Example 14 measured by XPS. XPSにより測定された実施例14の負極材料の表面分析結果である。It is the surface analysis result of the negative electrode material of Example 14 measured by XPS. 実施例12の負極材料のSEM像である。10 is a SEM image of a negative electrode material of Example 12. 実施例14の負極材料のSEM像である。16 is a SEM image of a negative electrode material of Example 14. 実施例10、実施例12~実施例14のニッケル金属水素化物電池の、電圧と充電時間又は放電時間との関係を表す充放電カーブである。6 is a charge / discharge curve representing the relationship between voltage and charge time or discharge time of nickel metal hydride batteries of Example 10 and Examples 12 to 14. FIG. 実施例10、実施例15及び実施例16のニッケル金属水素化物電池の、電圧と充電時間又は放電時間との関係を表す充放電カーブである。It is a charging / discharging curve showing the relationship between the voltage and charging time or discharging time of the nickel metal hydride batteries of Example 10, Example 15 and Example 16. XPSにより測定された実施例17の負極材料の表面分析結果である。It is a surface analysis result of the negative electrode material of Example 17 measured by XPS. XPSにより測定された実施例17の負極材料の表面分析結果である。It is a surface analysis result of the negative electrode material of Example 17 measured by XPS. XPSにより測定された実施例18の負極材料の表面分析結果である。It is a surface analysis result of the negative electrode material of Example 18 measured by XPS. XPSにより測定された実施例18の負極材料の表面分析結果である。It is a surface analysis result of the negative electrode material of Example 18 measured by XPS. 実施例10、実施例17及び実施例18のニッケル金属水素化物電池の、電圧と充電時間又は放電時間との関係を表す充放電カーブである。It is a charging / discharging curve showing the relationship between the voltage and charging time or discharging time of the nickel metal hydride batteries of Example 10, Example 17 and Example 18. 実施例19の負極材料のSEM像である。10 is a SEM image of a negative electrode material of Example 19. 実施例20の負極材料のSEM像である。10 is a SEM image of a negative electrode material of Example 20. XPSにより測定された実施例20の負極材料の表面分析結果である。It is the surface analysis result of the negative electrode material of Example 20 measured by XPS. XPSにより測定された比較例1-Bの負極材料の表面分析結果である。It is the surface analysis result of the negative electrode material of Comparative Example 1-B measured by XPS.

 以下、本発明の負極材料の製造方法について詳細に説明する。以下、必要に応じて、本発明の負極材料の製造方法を、本発明の製造方法、又は単に製造方法と呼ぶ場合がある。 Hereinafter, the method for producing the negative electrode material of the present invention will be described in detail. Hereinafter, the manufacturing method of the negative electrode material of the present invention may be referred to as the manufacturing method of the present invention or simply the manufacturing method as necessary.

 なお、特に断らない限り、本明細書に記載された数値範囲「x~y」は、下限x及び上限yをその範囲に含む。そして、これらの上限値及び下限値、並びに実施例中に列記した数値も含めてそれらを任意に組み合わせることで新たな数値範囲を構成し得る。更に、上記の何れかの数値範囲内から任意に選択した数値を新たな数値範囲の上限、下限の数値とすることができる。 Unless otherwise specified, the numerical range “x to y” described in this specification includes the lower limit x and the upper limit y. And a new numerical value range can be comprised by combining these arbitrarily including those upper limit values and lower limit values and numerical values listed in the embodiments. Furthermore, numerical values arbitrarily selected from any one of the numerical ranges described above can be used as the upper and lower numerical values of the new numerical range.

 本発明の製造方法は、既述したように、水素吸蔵合金粒子上にメッキ層を有する負極材料を製造する方法であり、本発明の負極材料は水素吸蔵合金粒子上にメッキ層を有する。本発明の製造方法は、特許文献1に紹介されている従来の製造方法とは異なり、還元剤を用いた無電解メッキにより金属層を形成する方法である。 As described above, the production method of the present invention is a method of producing a negative electrode material having a plating layer on hydrogen storage alloy particles, and the negative electrode material of the present invention has a plating layer on hydrogen storage alloy particles. Unlike the conventional manufacturing method introduced in Patent Document 1, the manufacturing method of the present invention is a method of forming a metal layer by electroless plating using a reducing agent.

 本発明の製造方法は、メッキ溶液調製工程と、メッキ工程とを有する。
 メッキ溶液調製工程は、ニッケル塩、ヘテロ元素含有有機化合物及び水系溶媒を含有するメッキ溶液を得る工程である。メッキ溶液は更に金属塩を含有しても良い。当該金属塩は、ニッケル以外の金属の塩を意味する。以下、特に説明のない場合、本明細書で単に金属と言う場合には当該金属塩に含まれる金属を指すものとする。
The manufacturing method of the present invention includes a plating solution preparation step and a plating step.
The plating solution preparation step is a step of obtaining a plating solution containing a nickel salt, a hetero element-containing organic compound, and an aqueous solvent. The plating solution may further contain a metal salt. The said metal salt means the salt of metals other than nickel. Hereinafter, unless otherwise specified, the term “metal” used herein refers to a metal contained in the metal salt.

 既述したように、メッキ溶液には、ニッケル塩、ヘテロ元素含有有機化合物、水系溶媒、及び必要に応じて金属塩が含まれる。以下、メッキ溶液がニッケル塩及び金属塩を含む場合を想定して説明する。
 ニッケル塩に含まれるニッケル及び金属塩に含まれる金属は、メッキ層を構成する主たる材料である。水系溶媒は、ニッケル塩及び金属塩等を溶解させる溶媒となる。つまりニッケル及び金属はメッキ溶液中でイオンとして存在すると考えられる。また、ヘテロ元素含有有機化合物は、メッキ溶液中にて当該ニッケルイオン及び金属イオンと錯体を形成する錯化剤として機能すると考えられる。つまり、本発明の製造方法によると、ニッケル及び金属はメッキ溶液中において安定な錯体として存在すると考えられる。
As described above, the plating solution contains a nickel salt, a heteroelement-containing organic compound, an aqueous solvent, and, if necessary, a metal salt. Hereinafter, description will be made assuming that the plating solution contains a nickel salt and a metal salt.
Nickel contained in the nickel salt and metal contained in the metal salt are main materials constituting the plating layer. The aqueous solvent is a solvent that dissolves nickel salts, metal salts, and the like. That is, nickel and metal are considered to exist as ions in the plating solution. The hetero element-containing organic compound is considered to function as a complexing agent that forms a complex with the nickel ions and metal ions in the plating solution. That is, according to the production method of the present invention, nickel and metal are considered to exist as stable complexes in the plating solution.

 メッキ工程は、水系溶媒及び水素吸蔵合金粒子を含有する水素吸蔵合金粒子分散液と、上記のメッキ溶液と、還元剤と、を混合して、水素吸蔵合金粒子上にニッケル及び金属を含むメッキ層が形成された負極材料を得る工程である。 The plating step includes mixing a hydrogen storage alloy particle dispersion containing an aqueous solvent and hydrogen storage alloy particles, the above plating solution, and a reducing agent, and a plating layer containing nickel and metal on the hydrogen storage alloy particles. This is a step of obtaining a negative electrode material in which is formed.

 メッキ工程においては、上記のメッキ溶液と、水素吸蔵合金粒子分散液と、還元剤とを混合する。すると、メッキ溶液中のニッケルイオン及び金属イオンは、還元剤から供給される電子によって還元されて0価の金属となり、水素吸蔵合金粒子の表面に析出する。そして、水素吸蔵合金粒子の表面に析出した当該ニッケル及び金属が、水素吸蔵合金粒子上のメッキ層を構成する。 In the plating step, the above plating solution, the hydrogen storage alloy particle dispersion, and the reducing agent are mixed. Then, nickel ions and metal ions in the plating solution are reduced by electrons supplied from the reducing agent to become zero-valent metal, and are deposited on the surfaces of the hydrogen storage alloy particles. And the said nickel and metal which precipitated on the surface of the hydrogen storage alloy particle comprise the plating layer on a hydrogen storage alloy particle.

 既述したように、メッキ溶液中では、ニッケルイオン及び金属イオンは錯体化されており、当該ニッケルイオン及び金属イオンは安定した状態で溶解していると考えられる。本発明の製造方法によると、メッキ工程に供される直前までニッケルイオン及び金属イオンをこのように安定に溶解することで、均一なメッキ層を得ることができると考えられる。 As described above, nickel ions and metal ions are complexed in the plating solution, and the nickel ions and metal ions are considered to be dissolved in a stable state. According to the production method of the present invention, it is considered that a uniform plating layer can be obtained by stably dissolving nickel ions and metal ions in this manner until immediately before being subjected to the plating step.

 ところで、錯化剤を用いない無電解メッキ方法において、メッキ溶液中のニッケルイオン及び金属イオンの一部は、水酸化物となって沈殿する等の不具合があると考えられる。このような状態のメッキ溶液をメッキ工程に用いる場合には、均一なメッキ層が得られない可能性がある。また、ニッケル水酸化物及び金属水酸化物を多く含むメッキ層が得られる可能性もある。これらの場合には、水素吸蔵合金粒子及びメッキ層で構成される負極材料の導電性を充分に高め難い場合がある。 By the way, in the electroless plating method that does not use a complexing agent, it is considered that a part of nickel ions and metal ions in the plating solution is precipitated as a hydroxide. When the plating solution in such a state is used in the plating process, there is a possibility that a uniform plating layer cannot be obtained. In addition, a plating layer containing a large amount of nickel hydroxide and metal hydroxide may be obtained. In these cases, it may be difficult to sufficiently increase the conductivity of the negative electrode material composed of the hydrogen storage alloy particles and the plating layer.

 本発明の製造方法によると、上記したように、ヘテロ元素含有有機化合物すなわち錯化剤を、ニッケル塩及び必要に応じて金属塩とともにメッキ溶液に配合することで、ニッケル及び金属の水酸化を抑制でき、メッキ層におけるニッケル水酸化物及び金属水酸化物の割合を低減できると考えられる。その結果、本発明の製造方法によると導電性に優れる負極材料を得ることができる。
 なお、本発明の負極材料の一態様として、表面が網目形状をなすものを挙げることができる。表面が網目形状をなす負極材料は、表面が平滑形状をなす負極材料に比べて比表面積が大きく、電池反応が円滑に進行すると考えられる。
According to the production method of the present invention, as described above, the hetero-element-containing organic compound, that is, the complexing agent, is mixed with the nickel salt and, if necessary, the metal salt in the plating solution, thereby suppressing nickel and metal hydroxylation. It is considered that the proportion of nickel hydroxide and metal hydroxide in the plating layer can be reduced. As a result, according to the production method of the present invention, a negative electrode material having excellent conductivity can be obtained.
In addition, as an aspect of the negative electrode material of the present invention, a material whose surface has a mesh shape can be exemplified. The negative electrode material whose surface has a mesh shape has a larger specific surface area than the negative electrode material whose surface has a smooth shape, and it is considered that the battery reaction proceeds smoothly.

 本発明の負極材料の製造方法におけるメッキ溶液調製工程は、ニッケル塩、ヘテロ元素含有有機化合物、水系溶媒及び必要に応じて金属塩を含有するメッキ溶液を得る工程である。 The plating solution preparation step in the method for producing a negative electrode material of the present invention is a step of obtaining a plating solution containing a nickel salt, a hetero element-containing organic compound, an aqueous solvent, and, if necessary, a metal salt.

 メッキ溶液に用いるニッケル塩としては、硫酸ニッケル、硝酸ニッケル、塩化ニッケル、酢酸ニッケル、スルファミン酸ニッケル等を例示できる。 Examples of the nickel salt used for the plating solution include nickel sulfate, nickel nitrate, nickel chloride, nickel acetate, nickel sulfamate and the like.

 メッキ溶液に用いる金属塩は、無電解メッキに使用され得る各種金属の塩であれば良く、メッキ可能性と、金属の耐酸化性を鑑みると、金属としては、Cu、Sn、Zn、Co、Au、Ag、Pt、Pd、Rh、Ru、In、Bi、又はCdが好ましい。導電性の点では、好ましい順序は、概ねAg、Cu、Au、Rh、Co、Zn、Ru、Pt、Pd、Cd、In、Sn、Biの順となる。展延性の点では、Au、Ag、Cu、Sn、Cd、In、Zn、Pt及びPdが好ましい。
 金属塩としては、これらの金属の硫酸塩、硝酸塩、塩化物等を例示できる。より具体的には、金属塩としては、硫酸コバルト、硝酸コバルト、塩化コバルト、酢酸コバルト、スルファミン酸コバルト、硫酸銅、硝酸銅、塩化銅、硫酸銀、硝酸銀、ヘキサクロリド白金酸、シアン化金カリウム、亜硫酸金ナトリウムを例示できる。金属塩としては1種類のみを用いてもよいし、複数種類を併用してもよい。
 なお、後述するように、表面が網目形状をなす本発明の負極材料は、無電解メッキ後の負極材料を加熱することで形成されると考えられる。当該加熱によって網目形状を有する負極材料を得るためには、メッキ層は、ニッケルインジウム合金、ニッケルビスマス合金、ニッケルスズ合金、ニッケルカドミウム合金から選ばれる少なくとも一種を含むのが良いと考えられる。
 そしてこの場合、メッキ溶液に用いる金属塩として、硫酸インジウム、硝酸インジウム、塩化インジウム、酢酸インジウム、スルファミン酸インジウム、硫酸ビスマス、硝酸ビスマス、塩化ビスマス、酢酸ビスマス、硫酸第一スズ、塩化第一スズ、酢酸第一スズ、硫酸カドミウム、硝酸カドミウム、塩化カドミウム、酢酸カドミウム、スルファミン酸カドミウムを例示できる。
The metal salt used in the plating solution may be a salt of various metals that can be used for electroless plating. In view of the possibility of plating and the oxidation resistance of the metal, the metals include Cu, Sn, Zn, Co, Au, Ag, Pt, Pd, Rh, Ru, In, Bi, or Cd is preferable. In terms of conductivity, the preferred order is generally Ag, Cu, Au, Rh, Co, Zn, Ru, Pt, Pd, Cd, In, Sn, and Bi. In terms of spreadability, Au, Ag, Cu, Sn, Cd, In, Zn, Pt and Pd are preferable.
Examples of metal salts include sulfates, nitrates, chlorides and the like of these metals. More specifically, examples of the metal salt include cobalt sulfate, cobalt nitrate, cobalt chloride, cobalt acetate, cobalt sulfamate, copper sulfate, copper nitrate, copper chloride, silver sulfate, silver nitrate, hexachloride platinum acid, potassium gold cyanide. And gold sodium sulfite. As a metal salt, only 1 type may be used and multiple types may be used together.
As will be described later, it is considered that the negative electrode material of the present invention whose surface has a mesh shape is formed by heating the negative electrode material after electroless plating. In order to obtain a negative electrode material having a network shape by the heating, it is considered that the plating layer preferably contains at least one selected from a nickel indium alloy, a nickel bismuth alloy, a nickel tin alloy, and a nickel cadmium alloy.
And in this case, as a metal salt used in the plating solution, indium sulfate, indium nitrate, indium chloride, indium acetate, indium sulfamate, bismuth sulfate, bismuth nitrate, bismuth chloride, bismuth acetate, stannous sulfate, stannous chloride, Examples thereof include stannous acetate, cadmium sulfate, cadmium nitrate, cadmium chloride, cadmium acetate, and cadmium sulfamate.

 メッキ溶液に配合するニッケル塩と金属塩との比は特に問わないが、質量比で、ニッケル塩:金属塩=1:99~99:1となる範囲であるのが好ましく、ニッケル塩:金属塩=20:80~80:20となる範囲であるのがより好ましく、ニッケル塩:金属塩=30:70~70:30となる範囲であるのが更に好ましい。
 以下、必要に応じて、ニッケル及び金属を総称してメッキ金属と呼ぶ。また、当該メッキ金属の塩をメッキ金属塩と呼ぶ。メッキ溶液におけるメッキ金属塩の濃度としては、例えば2~500g/Lの範囲を例示できる。
The ratio of the nickel salt to the metal salt to be mixed in the plating solution is not particularly limited, but the mass ratio is preferably in the range of nickel salt: metal salt = 1: 99 to 99: 1, and nickel salt: metal salt. = 20: 80 to 80:20 is more preferable, and nickel salt: metal salt = 30: 70 to 70:30 is more preferable.
Hereinafter, if necessary, nickel and metal are collectively referred to as plating metal. The salt of the plating metal is called a plating metal salt. Examples of the concentration of the plating metal salt in the plating solution include a range of 2 to 500 g / L.

 メッキ溶液には、更に、ヘテロ元素含有有機化合物が含まれる。ヘテロ金属含有有機化合物は、上記したように、メッキ溶液中においてメッキ金属イオンと錯体を形成する。
 ヘテロ元素含有有機化合物におけるヘテロ元素とは、N、O、P又はSを意味する。ヘテロ元素含有有機化合物としては、金属イオンに配位可能なアミノ基、アミド基、イミド基、イミノ基、シアノ基、アゾ基、水酸基、アルコキシ基、カルボキシル基、エステル基、エーテル基、カルボニル基、リン酸基、リン酸エステル基、ホスホン酸基、ホスホン酸エステル基、ホスフィン酸基、ホスフィン酸エステル基、ホスフェン酸基、ホスフェン酸エステル基、亜ホスフェン酸基、亜ホスフェン酸エステル基、チオール基、スルフィド基、スルフィニル基、スルホニル基、スルホン酸基、チオカルボキシル基、チオエステル基若しくはチオカルボニル基を具備する有機化合物を挙げることができる。
 特に、ヘテロ元素含有有機化合物としては、上記の基を複数有し、かつ、複数箇所で金属イオンに配位可能なキレート化合物が好ましい。
 或いは、ヘテロ元素含有有機化合物はカルボキシル基、アミノ基、水酸基、ケトン基、イミド基の何れかを備えるのが好ましい。
The plating solution further contains a heteroelement-containing organic compound. As described above, the heterometal-containing organic compound forms a complex with the plating metal ion in the plating solution.
The hetero element in the hetero element-containing organic compound means N, O, P or S. Examples of hetero element-containing organic compounds include amino groups, amide groups, imide groups, imino groups, cyano groups, azo groups, hydroxyl groups, alkoxy groups, carboxyl groups, ester groups, ether groups, carbonyl groups, which can be coordinated to metal ions, Phosphoric acid group, phosphoric acid ester group, phosphonic acid group, phosphonic acid ester group, phosphinic acid group, phosphinic acid ester group, phosphenic acid group, phosphenic acid ester group, phosphinic acid group, phosphinic acid ester group, thiol group, Examples include organic compounds having a sulfide group, a sulfinyl group, a sulfonyl group, a sulfonic acid group, a thiocarboxyl group, a thioester group, or a thiocarbonyl group.
In particular, the hetero element-containing organic compound is preferably a chelate compound having a plurality of the above groups and capable of coordinating to a metal ion at a plurality of locations.
Alternatively, the hetero element-containing organic compound preferably has any of a carboxyl group, an amino group, a hydroxyl group, a ketone group, and an imide group.

 キレート化合物の具体例としては、エチレンジアミン、ジエチレントリアミンなどのポリアミン化合物、グリシン、アラニン、システイン、グルタミン、アルギニン、アスパラギン、アスパラギン酸、セリン、エチレンジアミン四酢酸などのアミノ酸、マロン酸、コハク酸、グルタル酸、マレイン酸、フタル酸などのジカルボン酸、グリコール酸、乳酸、タルトロン酸、グリセリン酸、2-ヒドロキシ酪酸、3-ヒドロキシ酪酸、γ-ヒドロキシ酪酸、リンゴ酸、酒石酸、シトラマル酸、クエン酸、イソクエン酸、ロイシン酸、メバロン酸、パントイン酸、キナ酸、シキミ酸、サリチル酸、ゲンチジン酸、オルセリン酸、マンデル酸、ベンジル酸、2-ヒドロキシ-2-フェニルプロピオン酸などのヒドロキシカルボン酸を挙げることができる。 Specific examples of chelate compounds include polyamine compounds such as ethylenediamine and diethylenetriamine, glycine, alanine, cysteine, glutamine, arginine, asparagine, aspartic acid, serine, ethylenediaminetetraacetic acid and other amino acids, malonic acid, succinic acid, glutaric acid, maleic acid. Acids, dicarboxylic acids such as phthalic acid, glycolic acid, lactic acid, tartronic acid, glyceric acid, 2-hydroxybutyric acid, 3-hydroxybutyric acid, γ-hydroxybutyric acid, malic acid, tartaric acid, citramalic acid, citric acid, isocitric acid, leucine Examples include hydroxycarboxylic acids such as acids, mevalonic acid, pantoic acid, quinic acid, shikimic acid, salicylic acid, gentisic acid, orthoric acid, mandelic acid, benzylic acid, and 2-hydroxy-2-phenylpropionic acid. That.

 これらのヘテロ元素含有有機化合物は1種のみを用いても良いし、複数種を併用しても良い。
 メッキ溶液におけるヘテロ元素含有有機化合物の濃度は、メッキ溶液においてメッキ金属と錯体を形成し得る量であれば良く、メッキ金属の種類や量に応じて適宜設定し得る。メッキ溶液へのヘテロ元素含有有機化合物の配合量は、化学量論的に、メッキ金属の半量以上と錯体を形成し得る量であるのが好ましく、メッキ金属の2/3量以上と錯体を形成し得る量であるのがより好ましく、メッキ金属の全量と錯体を形成し得る量配合するのが更に好ましい。なお、ヘテロ元素含有有機化合物は、メッキ金属の全量と錯体を形成し得る量以上、つまり過剰量配合するのが特に好ましい。
These hetero element-containing organic compounds may be used alone or in combination.
The concentration of the heteroelement-containing organic compound in the plating solution may be an amount that can form a complex with the plating metal in the plating solution, and can be appropriately set according to the type and amount of the plating metal. The compounding amount of the heteroelement-containing organic compound in the plating solution is preferably stoichiometrically an amount capable of forming a complex with more than half of the plating metal, and forms a complex with more than 2/3 of the plating metal. It is more preferable that the amount be capable of forming a complex with the total amount of the plating metal. The hetero element-containing organic compound is particularly preferably blended in an amount that is at least an amount capable of forming a complex with the total amount of the plating metal, that is, an excess amount.

 メッキ溶液に用いる水系溶媒は、水を主成分とすれば良く、必要に応じて、水以外の溶媒を含んでも良い。当該水以外の溶媒としては、メタノール、エタノール、プロパノール、アセトン、アセチルアセトン、メチルエチルケトン、酢酸エチル、ジメチルホルムアミド、ジメチルアセトアミド、N-メチルピロリドン、テトラヒドロフラン、アセトニトリル、シクロヘキサノン等が例示される。これらの溶媒は、一種又は複数種を水と混合して用いれば良い。 The aqueous solvent used in the plating solution may be water as a main component, and may contain a solvent other than water as necessary. Examples of the solvent other than water include methanol, ethanol, propanol, acetone, acetylacetone, methyl ethyl ketone, ethyl acetate, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, tetrahydrofuran, acetonitrile, and cyclohexanone. These solvents may be used alone or in combination with water.

 メッキ工程の前に、水素吸蔵合金粒子の表面にメッキ層成長の活性点となる触媒核を形成する処理工程を行っても良い。更に、処理工程の前に、界面活性剤や塩基性水溶液などで水素吸蔵合金粒子を処理して、水素吸蔵合金粒子の表面を改質しても良い。処理工程は定法に則って行えば良い。 Prior to the plating step, a treatment step of forming catalyst nuclei as active points for the growth of the plating layer on the surface of the hydrogen storage alloy particles may be performed. Furthermore, the surface of the hydrogen storage alloy particles may be modified by treating the hydrogen storage alloy particles with a surfactant or a basic aqueous solution before the treatment step. The treatment process may be performed according to a regular method.

 具体的な処理工程としては、例えば、水素吸蔵合金粒子をPd含有溶液と接触させて、水素吸蔵合金粒子の表面にPdを付着させる工程を挙げることができる。 As a specific treatment step, for example, a step of bringing hydrogen storage alloy particles into contact with a Pd-containing solution and attaching Pd to the surface of the hydrogen storage alloy particles can be mentioned.

 より具体的な処理工程の一例について説明する。まず、水素吸蔵合金粒子と塩化スズ塩酸水溶液とを混合して、水素吸蔵合金粒子の表面の酸化被膜を除去するとともに、水素吸蔵合金粒子の表面に2価のスズイオンを吸着させた上で、当該水素吸蔵合金粒子を濾過にて分離する。次いで、当該水素吸蔵合金粒子を塩化パラジウム塩酸水溶液と混合することにより、0価のPdを水素吸蔵合金粒子に付着させる。ここでの現象は、水素吸蔵合金粒子の表面で、Sn(II)+Pd(II)→Pd(0)+Sn(IV)の反応が進行したことに因る。上述の方法で、水素吸蔵合金粒子の表面に触媒核を形成することができると考えられる。 An example of a more specific processing process will be described. First, the hydrogen storage alloy particles and the tin chloride hydrochloric acid aqueous solution are mixed to remove the oxide film on the surface of the hydrogen storage alloy particles and adsorb divalent tin ions on the surface of the hydrogen storage alloy particles. The hydrogen storage alloy particles are separated by filtration. Next, the hydrogen storage alloy particles are mixed with a palladium chloride / hydrochloric acid aqueous solution, thereby adhering zero-valent Pd to the hydrogen storage alloy particles. The phenomenon here is due to the progress of the reaction Sn (II) + Pd (II) → Pd (0) + Sn (IV) on the surface of the hydrogen storage alloy particles. It is considered that catalyst nuclei can be formed on the surface of the hydrogen storage alloy particles by the above-described method.

 また、処理工程の他の一例として、塩化パラジウム及び塩化スズなどのPd(II)及びSn(II)を含有する水溶液に、水素吸蔵合金粒子を接触させる方法を挙げることができる。この方法でも、0価のPdを水素吸蔵合金粒子の表面に付着させることができる。処理工程では、塩化スズ水溶液に換えて、濃塩酸などの強酸水溶液を用いてもよい。 Further, as another example of the treatment step, there can be mentioned a method of bringing hydrogen storage alloy particles into contact with an aqueous solution containing Pd (II) and Sn (II) such as palladium chloride and tin chloride. Even with this method, zero-valent Pd can be adhered to the surface of the hydrogen storage alloy particles. In the treatment step, a strong acid aqueous solution such as concentrated hydrochloric acid may be used instead of the tin chloride aqueous solution.

 塩化スズ水溶液としては、日本カニゼン株式会社製の商品名ピンクシューマーなどの市販品を用いてもよいし、塩化スズを塩酸に溶解した水溶液を用いてもよい。また、塩化パラジウム水溶液としては、日本カニゼン株式会社製の商品名レッドシューマーなどの市販品を用いてもよいし、塩化パラジウムを水に溶解した水溶液を用いてもよい。塩化パラジウム水溶液には、上記した錯化剤やその他の添加剤、例えばpH調整剤、緩衝剤などを添加してもよい。
 処理工程の後に、水や酸水溶液などで水素吸蔵合金粒子を洗浄する洗浄工程を加えても良い。
As the tin chloride aqueous solution, a commercial product such as a brand name Pink Schumer manufactured by Nippon Kanisen Co., Ltd. may be used, or an aqueous solution in which tin chloride is dissolved in hydrochloric acid may be used. Moreover, as palladium chloride aqueous solution, commercial items, such as brand name Red Schumer made by Nippon Kanisen Co., Ltd., may be used, or an aqueous solution in which palladium chloride is dissolved in water may be used. The above-mentioned complexing agent and other additives such as a pH adjusting agent and a buffering agent may be added to the palladium chloride aqueous solution.
After the treatment step, a washing step of washing the hydrogen storage alloy particles with water or an acid aqueous solution may be added.

 メッキ工程は、水系溶媒及び水素吸蔵合金粒子を含有する水素吸蔵合金粒子分散液と、上記のメッキ溶液と、還元剤と、を混合して、水素吸蔵合金粒子上にニッケル及び金属を含むメッキ層が形成された負極材料を得る工程である。 The plating step includes mixing a hydrogen storage alloy particle dispersion containing an aqueous solvent and hydrogen storage alloy particles, the above plating solution, and a reducing agent, and a plating layer containing nickel and metal on the hydrogen storage alloy particles. This is a step of obtaining a negative electrode material in which is formed.

 水素吸蔵合金粒子分散液の水系溶媒としては、上記したメッキ溶液の欄で説明したものを使用すれば良い。水素吸蔵合金粒子分散液の水系溶媒としては、メッキ溶液の水系溶媒と異なるものを用いても良いが、同じものを用いるのが好ましい。 What is necessary is just to use what was demonstrated in the column of the above-mentioned plating solution as an aqueous solvent of a hydrogen storage alloy particle dispersion. The aqueous solvent for the hydrogen storage alloy particle dispersion may be different from the aqueous solvent for the plating solution, but it is preferable to use the same one.

 水素吸蔵合金粒子とは、粒子状の水素吸蔵合金を指す。水素吸蔵合金としては、ニッケル金属水素化物電池の負極活物質として用いられるものであれば限定されない。水素吸蔵合金とは、基本的に、容易に水素と反応するものの、水素の放出能力に劣る金属Aと、水素と反応しにくいものの、水素の放出能力に優れる金属Bとの合金である。Aとしては、Mgなどの第2族元素、Sc、ランタノイドなどの第3族元素、Ti、Zrなどの第4族元素、V、Taなどの第5族元素、複数の希土類元素を含有するミッシュメタル(以下、Mmと略すことがある。)、Pdなどを例示できる。また、Bとしては、Fe、Co、Ni、Cr、Pt、Cu、Ag、Mn、Zn、Alなどを例示できる。 Hydrogen storage alloy particles refer to particulate hydrogen storage alloys. The hydrogen storage alloy is not limited as long as it is used as a negative electrode active material of a nickel metal hydride battery. The hydrogen storage alloy is basically an alloy of metal A, which easily reacts with hydrogen, but is inferior in hydrogen releasing ability, and metal B, which does not easily react with hydrogen but has excellent hydrogen releasing ability. A includes a group 2 element such as Mg, a group 3 element such as Sc and a lanthanoid, a group 4 element such as Ti and Zr, a group 5 element such as V and Ta, and a misch containing a plurality of rare earth elements. Examples thereof include metal (hereinafter sometimes abbreviated as Mm), Pd, and the like. Examples of B include Fe, Co, Ni, Cr, Pt, Cu, Ag, Mn, Zn, and Al.

 具体的な水素吸蔵合金として、六方晶CaCu型結晶構造を示すAB型、六方晶MgZn型若しくは立方晶MgCu型結晶構造を示すAB型、立方晶CsCl型結晶構造を示すAB型、六方晶MgNi型結晶構造を示すAB型、体心立方晶構造を示す固溶体型、並びに、AB型及びAB型の結晶構造が組み合わされたAB型、A型及びA19型のものを例示できる。水素吸蔵合金は、以上の結晶構造のうち、1種類を有するものでもよいし、また、以上の結晶構造の複数を有するものでもよい。 Specific hydrogen-absorbing alloy, AB 5 type showing a hexagonal CaCu 5 type crystal structure, hexagonal MgZn 2 type or AB 2 type showing a cubic MgCu 2 type crystal structure, AB type indicating the cubic CsCl-type crystal structure , A 2 B type showing hexagonal Mg 2 Ni type crystal structure, solid solution type showing body-centered cubic crystal structure, and AB 3 type and A 2 B 7 in which AB 5 type and AB 2 type crystal structures are combined Examples include molds and A 5 B 19 types. The hydrogen storage alloy may have one of the above crystal structures, or may have a plurality of the above crystal structures.

 AB型水素吸蔵合金として、LaNi、CaCu、MmNiを例示できる。AB型水素吸蔵合金として、MgZn、ZrNi、ZrCrを例示できる。AB型水素吸蔵合金として、TiFe、TiCoを例示できる。AB型水素吸蔵合金として、MgNi、MgCuを例示できる。固溶体型水素吸蔵合金として、Ti-V、V-Nb、Ti-Crを例示できる。AB型水素吸蔵合金として、CeNiを例示できる。A型水素吸蔵合金として、CeNiを例示できる。A19型水素吸蔵合金として、CeCo19、PrCo19を例示できる。上記の各結晶構造において、一部の金属を、他の1種類若しくは複数種類の金属又は元素で置換してもよい。 Examples of the AB 5 type hydrogen storage alloy include LaNi 5 , CaCu 5 , and MmNi 5 . Examples of the AB 2 type hydrogen storage alloy include MgZn 2 , ZrNi 2 , and ZrCr 2 . Examples of the AB type hydrogen storage alloy include TiFe and TiCo. Examples of the A 2 B type hydrogen storage alloy include Mg 2 Ni and Mg 2 Cu. Examples of the solid solution type hydrogen storage alloy include Ti—V, V—Nb, and Ti—Cr. An example of the AB 3 type hydrogen storage alloy is CeNi 3 . Ce 2 Ni 7 can be exemplified as the A 2 B 7 type hydrogen storage alloy. Examples of the A 5 B 19 type hydrogen storage alloy include Ce 5 Co 19 and Pr 5 Co 19 . In each of the above crystal structures, some of the metals may be replaced with one or more other types of metals or elements.

 水素吸蔵合金粒子は、上記の水素吸蔵合金で構成された粒子であれば良く、その形状は特に問わないが、負極活物質として使用することを考慮すると、充分に小さいものであるのが好ましい。具体的には、水素吸蔵合金粒子の平均粒子径は、1~100μmの範囲内が好ましく、3~50μmの範囲内がより好ましく、5~30μmの範囲内がさらに好ましい。更には、水素吸蔵合金粒子の平均粒子径は27μm以下であるのが好ましく、20μm以下であるのがより好ましく、15μm以下であるのが更に好ましく、10μm以下であるのが特に好ましい。
 なお、本明細書で単に平均粒子径と言う場合には、一般的なレーザー回折式粒度分布測定装置で試料を測定した場合におけるD50を意味する。
The hydrogen storage alloy particles need only be particles composed of the above-mentioned hydrogen storage alloy, and the shape thereof is not particularly limited. However, in consideration of the use as a negative electrode active material, it is preferably sufficiently small. Specifically, the average particle size of the hydrogen storage alloy particles is preferably within the range of 1 to 100 μm, more preferably within the range of 3 to 50 μm, and even more preferably within the range of 5 to 30 μm. Furthermore, the average particle diameter of the hydrogen storage alloy particles is preferably 27 μm or less, more preferably 20 μm or less, further preferably 15 μm or less, and particularly preferably 10 μm or less.
In addition, when only saying an average particle diameter in this specification, D50 in the case of measuring a sample with a general laser diffraction type particle size distribution measuring device is meant.

 メッキ工程で用いる還元剤は、ニッケルイオン及び金属イオンを還元する役割を担う。還元剤としては、ホルムアルデヒド、グリオキシル酸、次亜リン酸、次亜リン酸ナトリウム、水素化ホウ素ナトリウム、水素化ホウ素カリウム、アスコルビン酸、チオ尿素、ヒドロキノン、ジメチルアミノボラン、ヒドラジンを例示できる。メッキ工程には、1種類の還元剤を用いてもよいし、複数種類の還元剤を用いてもよい。なお、還元剤として次亜リン酸や次亜リン酸ナトリウムを用いた場合には、Pが金属膜に含まれる。また、還元剤として水素化ホウ素ナトリウム、水素化ホウ素カリウム又はジメチルアミノボランを用いた場合には、Bが金属膜に含まれる。
 メッキ溶液、水素吸蔵合金粒子分散液及び還元剤の混合液における還元剤の濃度としては、例えば1~200g/Lの範囲を例示できる。以下、必要に応じて、メッキ溶液、水素吸蔵合金粒子分散液及び還元剤の混合液をメッキ混合液と呼ぶ。
The reducing agent used in the plating process plays a role of reducing nickel ions and metal ions. Examples of the reducing agent include formaldehyde, glyoxylic acid, hypophosphorous acid, sodium hypophosphite, sodium borohydride, potassium borohydride, ascorbic acid, thiourea, hydroquinone, dimethylaminoborane, and hydrazine. In the plating step, one type of reducing agent may be used, or a plurality of types of reducing agents may be used. When hypophosphorous acid or sodium hypophosphite is used as the reducing agent, P is included in the metal film. When sodium borohydride, potassium borohydride, or dimethylaminoborane is used as the reducing agent, B is included in the metal film.
Examples of the concentration of the reducing agent in the mixed solution of the plating solution, the hydrogen storage alloy particle dispersion, and the reducing agent include a range of 1 to 200 g / L. Hereinafter, the mixed solution of the plating solution, the hydrogen storage alloy particle dispersion, and the reducing agent is referred to as a plating mixed solution as necessary.

 メッキ混合液には、更に、有機化合物系分散剤を加えるのが好ましい。上記したように、還元剤によりメッキ混合液中のニッケルイオン及び金属イオンが還元され、水素吸蔵合金の表面にニッケル及び金属が各々析出する。メッキ混合液に有機化合物系分散剤を加えることで、水素吸蔵合金粒子の表面に析出したニッケル及び金属は、有機化合物系分散剤を原料とするコート層によって覆われると考えられる。そして、当該コート層によって覆われつつニッケル及び金属が析出することで、ニッケル及び金属が粗大に粒成長し難くなるため、ニッケル及び金属は比較的小さな粒子としてメッキ層に存在すると考えられる。つまりこの場合には、メッキ層は、小形の粒子状をなすニッケル及び金属が各々コート層で覆われた、複合粒子の集合体で構成されると考えられる。
 ニッケル及び金属が粗大に粒成長すると、充分な量の電解液が水素吸蔵合金に供給され難い場合がある。しかし、上記したようにメッキ混合液に有機化合物系分散剤を加えて得られた比表面積の大きなメッキ層は、ポーラスであり電解液の輸液性能に優れるため、当該メッキ層を有する負極材料を用いることで、ニッケル金属水素化物電池の電池特性が向上すると考えられる。
 また、メッキ混合液に有機化合物系分散剤を加えることで、メッキ層による負極材料同士の凝着又は固着を抑制でき、メッキ工程後の負極材料を簡単に解砕できる利点もある。
It is preferable to further add an organic compound dispersant to the plating mixture. As described above, nickel ions and metal ions in the plating mixture are reduced by the reducing agent, and nickel and metal are deposited on the surface of the hydrogen storage alloy. By adding an organic compound dispersant to the plating mixture, it is considered that nickel and metal deposited on the surface of the hydrogen storage alloy particles are covered with a coating layer using the organic compound dispersant as a raw material. And since nickel and a metal precipitate while being covered with the said coating layer, it becomes difficult for nickel and a metal to grow coarsely, Therefore It is thought that nickel and a metal exist in a plating layer as a comparatively small particle | grain. That is, in this case, the plating layer is considered to be composed of an aggregate of composite particles in which nickel and metal forming small particles are each covered with a coating layer.
If nickel and metal grow coarsely, a sufficient amount of electrolyte may not be supplied to the hydrogen storage alloy. However, as described above, a plating layer having a large specific surface area obtained by adding an organic compound-based dispersant to a plating mixture is porous and has excellent infusion performance of an electrolytic solution. Therefore, a negative electrode material having the plating layer is used. This is considered to improve the battery characteristics of the nickel metal hydride battery.
Further, by adding an organic compound-based dispersant to the plating mixed solution, adhesion or adhesion between the negative electrode materials due to the plating layer can be suppressed, and there is an advantage that the negative electrode material after the plating step can be easily crushed.

 有機化合物系分散剤は、一般的に分散剤として用いられるポリマー又は当該ポリマーを形成し得るモノマーであれば良いが、水溶性又は親水性であるのが好ましい。メッキ混合液に含まれるメッキ溶液及び水素吸蔵合金粒子分散液には、水系溶媒が用いられているためである。有機化合物系分散剤としては、特に水溶性ポリマー又は水溶性モノマーが好ましい。
 当該ポリマーとしては、メチルセルロース、エチルセルロース、ヒドロキシエチルセルロース、ヒドロキシプロピルセルロース、カルボキシメチルセルロース、ジアセチルセルロース、アルギン酸ナトリウム、ポリアクリル酸、ポリアクリル酸ナトリウム、ポリビニルフェノール、ポリビニルメチルエーテル、ポリビニルアルコール、ポリビニルピロリドン、ポリヒドロキシアルキル(メタ)アクリレート、スチレン-マレイン酸共重合体、非架橋ポリアクリルアミド等が挙げられる。既述したように、これらポリマーを構成し得るモノマーもまた好ましく用いられる。
The organic compound dispersant may be a polymer that is generally used as a dispersant or a monomer that can form the polymer, but is preferably water-soluble or hydrophilic. This is because an aqueous solvent is used for the plating solution and the hydrogen storage alloy particle dispersion contained in the plating mixture. As the organic compound dispersant, a water-soluble polymer or a water-soluble monomer is particularly preferable.
Examples of the polymer include methyl cellulose, ethyl cellulose, hydroxyethyl cellulose, hydroxypropyl cellulose, carboxymethyl cellulose, diacetyl cellulose, sodium alginate, polyacrylic acid, sodium polyacrylate, polyvinyl phenol, polyvinyl methyl ether, polyvinyl alcohol, polyvinyl pyrrolidone, polyhydroxyalkyl. (Meth) acrylate, styrene-maleic acid copolymer, non-crosslinked polyacrylamide and the like. As already described, monomers capable of constituting these polymers are also preferably used.

 有機化合物系分散剤は、メッキ金属塩を100質量部としたときに、0.1~200質量部となる量添加するのが好ましく、1~150質量部となる量添加するのがより好ましく、10~100質量部となる量添加するのが更に好ましく、25~75質量部となる量添加するのが特に好ましい。 The organic compound dispersant is preferably added in an amount of 0.1 to 200 parts by mass, more preferably 1 to 150 parts by mass, when the plating metal salt is 100 parts by mass. More preferably, the amount is 10 to 100 parts by mass, and particularly preferably 25 to 75 parts by mass.

 メッキ混合液には、その他の添加剤を配合しても良い。添加剤としては、例えば、pH調整剤、緩衝剤などが挙げられる。これらはメッキ工程においてメッキ混合液に添加しても良いし、或いは、メッキ溶液調製工程においてメッキ溶液に添加しても良いし、水素吸蔵合金粒子分散液に添加しても良い。 Other additives may be added to the plating mixture. Examples of the additive include a pH adjusting agent and a buffering agent. These may be added to the plating mixed solution in the plating step, or may be added to the plating solution in the plating solution preparation step, or may be added to the hydrogen storage alloy particle dispersion.

 メッキ混合液のpHは、通常、4~14の範囲内のうち、金属塩及び還元剤の種類に応じて適切な値に調整される。例えば、ニッケル塩及び次亜リン酸ナトリウムを用いるメッキ混合液においては、pHが4~9の範囲が好ましい。メッキ混合液のpHの好ましい範囲として、4~6、4~5、4.1~4.8、4.2~4.5、4.3~4.4の各範囲を挙げることができる。 The pH of the plating mixture is usually adjusted to an appropriate value within the range of 4 to 14 according to the type of metal salt and reducing agent. For example, in a plating mixed solution using nickel salt and sodium hypophosphite, the pH is preferably in the range of 4-9. Preferable ranges of the pH of the plating mixed solution include 4 to 6, 4 to 5, 4.1 to 4.8, 4.2 to 4.5, and 4.3 to 4.4.

 pH調整剤としては、炭酸ナトリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸水素ナトリウム、アンモニア、塩化アンモニウム、硫酸、塩酸を例示できる。 Examples of pH adjusters include sodium carbonate, sodium hydroxide, sodium carbonate, sodium bicarbonate, ammonia, ammonium chloride, sulfuric acid, and hydrochloric acid.

 メッキ混合液のpH変動は、無い又は穏やかであるのが好ましい。緩衝剤は、メッキ混合液の急激なpH変動を抑制する目的で用いられる。緩衝剤としては、ヒドロキシ酢酸、乳酸、グルコン酸、酒石酸、リンゴ酸、コハク酸、マロン酸、クエン酸などの弱酸、及び、これらの塩を例示できる。 It is preferable that there is no or moderate pH fluctuation of the plating mixture. The buffer is used for the purpose of suppressing rapid pH fluctuation of the plating mixture. Examples of the buffer include hydroxyacetic acid, lactic acid, gluconic acid, tartaric acid, malic acid, succinic acid, malonic acid, citric acid and other weak acids, and salts thereof.

 メッキ混合液に添加され得るその他の添加剤として、硝酸ビスマス、ヨウ素酸、ポリエチレングリコール、各種の界面活性剤を挙げることができる。 Other additives that can be added to the plating mixture include bismuth nitrate, iodic acid, polyethylene glycol, and various surfactants.

 メッキ混合液の原料としては、公知のものを採用しても良いし、市販品を購入して用いても良い。或いは、市販の無電解メッキ用水溶液に水素吸蔵合金粒子等を添加して使用しても良い。市販の無電解メッキ用水溶液として、日本カニゼン株式会社製の商品名ブルーシューマー、S-680、SE-680、SD-200、S-300、S-760、S-762、SE-660、SE-666、S-500、SE-650、SFK-63、S-810、SEK-670、S-795、SEK-797、カニボロンSKB-230、SFB-26を例示できる。 As a raw material of the plating mixed solution, a known material may be adopted, or a commercially available product may be purchased and used. Alternatively, hydrogen storage alloy particles or the like may be added to a commercially available electroless plating aqueous solution. As a commercially available aqueous solution for electroless plating, trade names Blue Schumer, S-680, SE-680, SD-200, S-300, S-760, S-762, SE-660, SE-manufactured by Nippon Kanigen Co., Ltd. 666, S-500, SE-650, SFK-63, S-810, SEK-670, S-795, SEK-797, canibolone SKB-230, and SFB-26.

 メッキ工程においては、水素吸蔵合金粒子分散液に対してメッキ溶液を滴下する方法が好ましい。メッキ反応を均一に進行させるために、メッキ工程は撹拌条件下で行われるのが好ましい。 In the plating step, a method of dropping the plating solution to the hydrogen storage alloy particle dispersion is preferable. In order to allow the plating reaction to proceed uniformly, the plating process is preferably performed under stirring conditions.

 メッキ工程におけるメッキ温度としては、50~95℃が好ましく、60~95℃がより好ましい。温度が高いほど、メッキ反応が速やかに進行する。本発明の負極材料におけるメッキ層の厚みは、メッキ溶液の量、濃度、メッキ反応時間に応じて変化する。 The plating temperature in the plating step is preferably 50 to 95 ° C, more preferably 60 to 95 ° C. The higher the temperature, the faster the plating reaction proceeds. The thickness of the plating layer in the negative electrode material of the present invention varies depending on the amount, concentration, and plating reaction time of the plating solution.

 本発明の製造方法は、メッキ工程によって得られた負極材料を洗浄する工程や、乾燥工程を有しても良い。更に、当該負極材料を加熱する加熱工程を有するのが好ましい。後述するように、当該加熱工程を経ることで負極材料の導電性が向上するためである。その理由は明らかではないが、恐らく、加熱することによって水素吸蔵合金粒子の状態又は構造が変化するものと考えられる。 The production method of the present invention may include a step of washing the negative electrode material obtained by the plating step and a drying step. Furthermore, it is preferable to have a heating step for heating the negative electrode material. As will be described later, the conductivity of the negative electrode material is improved through the heating step. The reason for this is not clear, but it is likely that the state or structure of the hydrogen storage alloy particles changes upon heating.

 加熱工程の温度としては、200℃を超え500℃未満、250℃以上500℃未満、300℃以上500℃未満、300℃を超え500℃未満、320℃以上450℃以下、350℃以上420℃以下の範囲を挙げ得る。
 上記の温度範囲で加熱工程を行うことで、水素吸蔵合金のニッケル金属水素化物電池用の負極活物質としての機能を損なわず、かつ、負極材料の導電性を充分に向上させることができる。特に、水素吸蔵合金としてA型、A19型、AB型から選ばれる少なくとも一種を選択する場合には、当該加熱工程の効果が顕著である。これらの水素吸蔵合金は何れもAB型及びAB型の結晶構造が組み合わされた結晶構造を有するため、同じ温度域での加熱により、同様の効果が得られるものと考えられる。
The temperature of the heating process is over 200 ° C and less than 500 ° C, 250 ° C or more and less than 500 ° C, 300 ° C or more and less than 500 ° C, over 300 ° C and less than 500 ° C, 320 ° C or more and 450 ° C or less, 350 ° C or more and 420 ° C or less. Can be mentioned.
By performing the heating step in the above temperature range, the function of the hydrogen storage alloy as a negative electrode active material for nickel metal hydride batteries is not impaired, and the conductivity of the negative electrode material can be sufficiently improved. In particular, when at least one selected from A 2 B 7 type, A 5 B 19 type, and AB 3 type is selected as the hydrogen storage alloy, the effect of the heating step is remarkable. Since all of these hydrogen storage alloys have a crystal structure in which AB 5 type and AB 2 type crystal structures are combined, it is considered that the same effect can be obtained by heating in the same temperature range.

 より具体的には、A型、A19型、AB型から選ばれる少なくとも一種の水素吸蔵合金としては、希土類-Mg-Ni系の水素吸蔵合金が好ましい。希土類-Mg-Ni系の水素吸蔵合金は、希土類元素、Mg及びNiを含有する合金であれば良く、その組成比や含有し得るその他の元素は特に問わない。また、希土類元素の一部又は全部がCa、Sr、Sc、Y、Ti、Zr及びHfの少なくとも一種で置換されていても良い。希土類-Mg-Ni系の水素吸蔵合金としては、例えば、以下の一般式(1)で表されるものを選択することができる。 More specifically, the at least one hydrogen storage alloy selected from the A 2 B 7 type, A 5 B 19 type, and AB 3 type is preferably a rare earth-Mg—Ni-based hydrogen storage alloy. The rare earth-Mg—Ni-based hydrogen storage alloy may be an alloy containing rare earth elements, Mg and Ni, and the composition ratio and other elements that can be contained are not particularly limited. Further, part or all of the rare earth element may be substituted with at least one of Ca, Sr, Sc, Y, Ti, Zr and Hf. As the rare earth-Mg—Ni-based hydrogen storage alloy, for example, one represented by the following general formula (1) can be selected.

 一般式(1):Ln1-xMgNiy-z(但し、Lnは、La、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Ca、Sr、Sc、Y、Ti、Zr及びHfから選ばれる少なくとも1種の元素、Tは、Mn、Co、Ti、V、Nb、W、Ta、Cr、Mo、Fe、Al、Ga、Zn、Sn、In、Cu、Si、Li、P、S、及びBから選ばれる少なくとも1種の元素、x、y、zは、それぞれ、0<x<0.3、2.8≦y≦3.8、0≦z≦0.5を満たす。) General formula (1): Ln 1-x Mg x Ni yz T z (where Ln is La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, At least one element selected from Yb, Lu, Ca, Sr, Sc, Y, Ti, Zr and Hf, T is Mn, Co, Ti, V, Nb, W, Ta, Cr, Mo, Fe, Al , Ga, Zn, Sn, In, Cu, Si, Li, P, S, and B, x, y, and z are 0 <x <0.3 and 2.8, respectively. ≦ y ≦ 3.8 and 0 ≦ z ≦ 0.5 are satisfied.)

 また、加熱工程によって、網目部を有する負極材料を製造できると考えられる。つまり、金属塩の種類によっては、メッキ工程後のメッキ層は、微細な粒子状をなすメッキ金属で構成されていると考えられる。負極材料を加熱することにより、このような粒子が溶融し、隣接する粒子同士が接合一体化して網目形状に粒成長し、ひいては網目部となると考えられる。 Moreover, it is considered that a negative electrode material having a mesh part can be produced by a heating process. In other words, depending on the type of metal salt, the plating layer after the plating step is considered to be composed of a plated metal having a fine particle shape. By heating the negative electrode material, such particles are melted, adjacent particles are joined and integrated to grow into a mesh shape, and eventually become a mesh portion.

 この時の水素吸蔵合金の溶融を抑制するために、負極材料の加熱温度は金属及び/又は、ニッケルと金属とが合金化したニッケル金属合金の融点以上かつ水素吸蔵合金の融点以下であるのが好ましい。更には、負極材料の加熱温度は金属及びニッケル金属合金の融点以上かつ水素吸蔵合金の融点以下であるのがより好ましい。 In order to suppress melting of the hydrogen storage alloy at this time, the heating temperature of the negative electrode material is not less than the melting point of the metal and / or nickel metal alloy in which nickel and metal are alloyed and not more than the melting point of the hydrogen storage alloy. preferable. Furthermore, the heating temperature of the negative electrode material is more preferably higher than the melting point of the metal and nickel metal alloy and lower than the melting point of the hydrogen storage alloy.

 網目部を有する負極材料を製造するためには、金属及び/又はニッケル金属合金の融点が水素吸蔵合金の融点以下であるのが好ましく、金属及びニッケル金属合金の融点が水素吸蔵合金の融点以下であるのがより好ましい。更に換言すると、網目部を有する負極材料を製造する観点からは、メッキ溶液の金属塩として、金属の融点、及び、ニッケルと合金化した時のニッケル金属合金の融点が水素吸蔵合金の融点以下となる金属塩を選択するのがより好ましい。 In order to produce a negative electrode material having a mesh portion, the melting point of the metal and / or nickel metal alloy is preferably equal to or lower than the melting point of the hydrogen storage alloy, and the melting point of the metal and nickel metal alloy is equal to or lower than the melting point of the hydrogen storage alloy. More preferably. In other words, from the viewpoint of producing a negative electrode material having a mesh portion, as a metal salt of the plating solution, the melting point of the metal, and the melting point of the nickel metal alloy when alloyed with nickel is less than the melting point of the hydrogen storage alloy. More preferably, the metal salt is selected.

 水素吸蔵合金の融点は水素吸蔵合金の組成によって異なり、また、平均粒子径の小さな水素吸蔵合金は平均粒子径の大きな水素吸蔵合金に比べて溶融し易い。しかし乍ら、金属及びニッケル金属合金の融点が比較的低い場合には、様々な組成及び平均粒子径の水素吸蔵合金粒子上に、網目形状をなすメッキ層が形成され得ると考えられる。
 具体的には、金属及びニッケル金属合金の融点は450℃未満であるのが好ましく、430℃以下であるのが好ましく、420℃以下であるのが特に好ましい。この場合の金属及びニッケル金属合金の融点に好ましい下限値はないが、強いて言うとすれば、取り扱い性を考慮して100℃以上であるのが好ましく、200℃以上であるのがより好ましく、300℃以上であるのが更に好ましい。また、水素吸蔵合金の溶融を抑制することを考慮すると、水素吸蔵合金粒子の平均粒子径は8μm以上であるのが好ましく、10μm以上であるのがより好ましく、20μm以上であるのがなお好ましい。この場合の水素吸蔵合金粒子の平均粒子径に好ましい上限値はないが、電池反応のし易さを考慮すると、100μm以下であるのが好ましい。
The melting point of the hydrogen storage alloy varies depending on the composition of the hydrogen storage alloy, and the hydrogen storage alloy having a small average particle diameter is more easily melted than the hydrogen storage alloy having a large average particle diameter. However, when the melting points of the metal and nickel metal alloy are relatively low, it is considered that a plating layer having a network shape can be formed on the hydrogen storage alloy particles having various compositions and average particle diameters.
Specifically, the melting point of the metal and the nickel metal alloy is preferably less than 450 ° C., preferably 430 ° C. or less, and particularly preferably 420 ° C. or less. There is no preferred lower limit for the melting point of the metal and nickel metal alloy in this case, but if it is to be strong, it is preferably 100 ° C. or higher, more preferably 200 ° C. or higher in view of handleability. More preferably, the temperature is higher than or equal to ° C. In consideration of suppressing the melting of the hydrogen storage alloy, the average particle diameter of the hydrogen storage alloy particles is preferably 8 μm or more, more preferably 10 μm or more, and still more preferably 20 μm or more. In this case, there is no preferred upper limit for the average particle size of the hydrogen storage alloy particles, but it is preferably 100 μm or less in view of the ease of battery reaction.

 網目部を有する負極材料を製造する観点から、金属としては、融点1455℃のニッケルと組み合わせてニッケル金属合金としたときに充分に低い融点となるように、融点の低いものを選択するのが良い。当該金属としては、例えば、融点350℃以下のものを選択するのが好ましい。具体的には、融点157℃のインジウム、融点271℃のビスマス、融点232℃のスズ、融点321℃のカドミウムが挙げられる。つまり、本発明の負極材料が網目部を有するものである場合、メッキ層を構成するニッケル金属合金としては、ニッケルインジウム合金、ニッケルビスマス合金、ニッケルスズ合金、ニッケルカドミウム合金から選ばれる少なくとも一種が好ましいと言える。 From the viewpoint of producing a negative electrode material having a mesh portion, it is preferable to select a metal having a low melting point so that a sufficiently low melting point is obtained when it is combined with nickel having a melting point of 1455 ° C. to form a nickel metal alloy. . As the metal, for example, a metal having a melting point of 350 ° C. or lower is preferably selected. Specific examples include indium having a melting point of 157 ° C., bismuth having a melting point of 271 ° C., tin having a melting point of 232 ° C., and cadmium having a melting point of 321 ° C. That is, when the negative electrode material of the present invention has a mesh part, the nickel metal alloy constituting the plating layer is preferably at least one selected from a nickel indium alloy, a nickel bismuth alloy, a nickel tin alloy, and a nickel cadmium alloy. It can be said.

 本発明の製造方法は、加熱工程後に低酸素ガス曝露工程を備えても良い。
 低酸素ガス曝露工程は、加熱工程後の負極材料を低酸素ガスに曝露する工程である。低酸素ガス曝露工程を行うことにより、負極材料表面の酸化を抑制し得る。
 低酸素ガスとは、空気よりも酸素含有量の少ないガスを指す。好ましくは、低酸素ガスの酸素ガス含有量は質量比で0%を超え10%以下であるのが良い。更に、低酸素ガスの酸素ガス含有量は、質量比で、0.01%以上7%以下であるのが好ましく、0.01%以上5%以下であるのがより好ましく、0.01%以上3%以下であるのが更に好ましく、0.01%以上2%以下であるのがなお好ましく、0.01%以上1%以下であるのが特に好ましい。低酸素ガスに含まれる酸素ガス以外のガスは、アルゴンガス等の不活性ガスであるのが好ましい。
The manufacturing method of the present invention may include a low oxygen gas exposure step after the heating step.
The low oxygen gas exposure step is a step of exposing the negative electrode material after the heating step to low oxygen gas. By performing the low oxygen gas exposure step, oxidation of the negative electrode material surface can be suppressed.
Low oxygen gas refers to a gas having a lower oxygen content than air. Preferably, the oxygen gas content of the low oxygen gas is more than 0% and not more than 10% by mass ratio. Furthermore, the oxygen gas content of the low oxygen gas is preferably 0.01% or more and 7% or less, more preferably 0.01% or more and 5% or less in terms of mass ratio, and 0.01% or more. It is more preferably 3% or less, still more preferably 0.01% or more and 2% or less, and particularly preferably 0.01% or more and 1% or less. The gas other than the oxygen gas contained in the low oxygen gas is preferably an inert gas such as argon gas.

 低酸素ガス曝露工程において、負極材料を低酸素ガスに曝露する時間は特に問わないが、3分間以上であるのが好ましく、5分間以上であるのがより好ましく、10分間以上であるのが更に好ましく、15分間以上であるのが特に好ましい。なお、低酸素ガス曝露工程においては、負極材料を静置した状態のままで低酸素ガスに曝しても良いが、負極材料を攪拌しつつ低酸素ガスに曝すか、低酸素ガス曝露工程中に1回以上負極材料を攪拌するのが好ましい。 In the low oxygen gas exposure step, the time for exposing the negative electrode material to the low oxygen gas is not particularly limited, but is preferably 3 minutes or more, more preferably 5 minutes or more, and further preferably 10 minutes or more. It is preferably 15 minutes or longer. In the low oxygen gas exposure step, the negative electrode material may be exposed to the low oxygen gas while still standing, but the negative electrode material may be exposed to the low oxygen gas while stirring or during the low oxygen gas exposure step. It is preferable to stir the negative electrode material one or more times.

 本発明の負極材料において、メッキ層は、水素吸蔵合金粒子の全体を被覆しているのが好ましく、また、均一に被覆しているのが好ましい。メッキ層は、上記したように網目形状であっても良いが、網目形状以外の形状、例えば平滑形状等であっても良い。 In the negative electrode material of the present invention, the plating layer preferably covers the whole of the hydrogen storage alloy particles, and preferably covers the entire surface. The plating layer may have a mesh shape as described above, but may have a shape other than the mesh shape, such as a smooth shape.

 水素吸蔵合金粒子をニッケル金属水素化物電池用の負極活物質として用いることを考慮すると、水素イオンを円滑に吸蔵及び放出するとの観点からは、メッキ層の膜厚は、500nm以下が好ましい。メッキ層の膜厚の範囲としては、2~500nmが好ましく、2~400nmがより好ましく、2~300nmがさらに好ましい。 In consideration of using the hydrogen storage alloy particles as a negative electrode active material for a nickel metal hydride battery, the thickness of the plating layer is preferably 500 nm or less from the viewpoint of smoothly storing and releasing hydrogen ions. The thickness range of the plating layer is preferably 2 to 500 nm, more preferably 2 to 400 nm, and even more preferably 2 to 300 nm.

 メッキ層は結晶性であってもよいが、非晶質を含んでいてもよく、メッキ層のすべてが非晶質であってもよい。メッキ層には、負極材料に導電性を付与する機能に加えて、水素吸蔵合金粒子を保護する機能が想定される。つまり、充放電に伴い膨張及び収縮する水素吸蔵合金には、長期にわたる使用にともなってクラック等が生じる可能性があるが、当該水素吸蔵合金粒子をメッキ層により被覆することで、水素吸蔵合金粒子を保護できると考えられる。メッキ金属として展延性を有するものを用いれば、メッキ層は、水素吸蔵合金粒子の膨張及び収縮に追従し得るために、優れた保護機能を発揮すると考えられる。特に、メッキ層の非晶質部分では、好適な展延性が期待できる。 The plated layer may be crystalline, but may contain amorphous, and all of the plated layer may be amorphous. The plating layer is assumed to have a function of protecting the hydrogen storage alloy particles in addition to a function of imparting conductivity to the negative electrode material. In other words, a hydrogen storage alloy that expands and contracts with charge and discharge may cause cracks and the like with long-term use, but by covering the hydrogen storage alloy particles with a plating layer, the hydrogen storage alloy particles Can be protected. If a metal having spreading properties is used as the plating metal, the plating layer can follow the expansion and contraction of the hydrogen storage alloy particles, so that it is considered to exhibit an excellent protective function. In particular, suitable spreadability can be expected in the amorphous portion of the plating layer.

 また、メッキ層はP及び/又はBを含んでいてもよい。P及び/又はBは、製造方法に由来して、メッキ層に含有されることになる。P及び/又はBの存在に因り、メッキ層の硬さなどの物性が好適に変化する場合がある。メッキ層における上記元素の割合としては、1~15質量%が好ましく、2~13質量%がより好ましい。なお、メッキ層には、製造方法などに由来する不純物が含まれる場合がある。 Also, the plating layer may contain P and / or B. P and / or B originates from the manufacturing method and is contained in the plating layer. Due to the presence of P and / or B, the physical properties such as the hardness of the plating layer may suitably change. The proportion of the element in the plating layer is preferably 1 to 15% by mass, and more preferably 2 to 13% by mass. Note that the plating layer may contain impurities derived from the manufacturing method or the like.

 本発明の負極材料におけるメッキ層は、メッキ溶液に含まれるニッケルを含有する。また、メッキ溶液がニッケル以外の金属を含む場合には、メッキ層はニッケルに加えて当該金属を含み得る。メッキ層はニッケルとしてニッケル水酸化物、ニッケル酸化物、金属ニッケル等を含み得るところ、導電性に優れる金属ニッケルを多く含むのが好ましい。
 具体的には、負極材料の表面のXPSスペクトルにおいて、金属ニッケルに由来するピーク強度がニッケル水酸化物に由来するピーク強度よりも大きい場合、本発明の負極材料には非常に優れた導電性が付与されると考えられる。
The plating layer in the negative electrode material of the present invention contains nickel contained in the plating solution. When the plating solution contains a metal other than nickel, the plating layer may contain the metal in addition to nickel. The plating layer may contain nickel hydroxide, nickel oxide, metallic nickel, etc. as nickel, but preferably contains a lot of metallic nickel having excellent conductivity.
Specifically, in the XPS spectrum of the surface of the negative electrode material, when the peak intensity derived from metallic nickel is larger than the peak intensity derived from nickel hydroxide, the negative electrode material of the present invention has very excellent conductivity. It is considered to be granted.

 本発明の負極材料においては、既述したように水素吸蔵合金粒子の表面の一部がメッキ層で覆われれば良いが、水素吸蔵合金粒子の表面の全体がメッキ層で覆われるのが好ましい。ここで、既述したように、A型、A19型、AB型等の水素吸蔵合金は希土類金属を含有する。メッキ層は、少なくとも遷移金属であるニッケルを含有する。したがって、希土類金属と遷移金属との存在割合は、水素吸蔵合金粒子の表面と、メッキ層の表面すなわち負極材料の表面とで、異なる値をとり得る。
 より具体的には、上記した希土類金属と遷移金属との存在割合として、希土類金属の質量Aと遷移金属の質量Bとの割合B/Aを用い、当該割合B/Aが負極材料の表面において、水素吸蔵合金粒子の表面よりも大きい値であれば、水素吸蔵合金粒子の表面の少なくとも一部がメッキ層で覆われているとみなし得る。また、当該割合B/Aが大きな値であれば、水素吸蔵合金粒子の表面の多くの部分がメッキ層で覆われているとみなし得る。
 本発明の負極材料におけるB/Aは、水素吸蔵合金粒子の表面におけるB/Aの5倍以上であるのが好ましく、10倍以上であるのがより好ましく、20倍以上であるのが更に好ましく、30倍以上であるのが特に好ましい。
In the negative electrode material of the present invention, as described above, a part of the surface of the hydrogen storage alloy particles may be covered with the plating layer, but it is preferable that the entire surface of the hydrogen storage alloy particle is covered with the plating layer. Here, as described above, hydrogen storage alloys such as A 2 B 7 type, A 5 B 19 type, and AB 3 type contain rare earth metals. The plating layer contains at least nickel which is a transition metal. Therefore, the existing ratio of the rare earth metal and the transition metal can take different values between the surface of the hydrogen storage alloy particles and the surface of the plating layer, that is, the surface of the negative electrode material.
More specifically, the ratio B / A between the mass A of the rare earth metal and the mass B of the transition metal is used as the abundance ratio of the rare earth metal and the transition metal, and the ratio B / A is on the surface of the negative electrode material. If the value is larger than the surface of the hydrogen storage alloy particles, it can be considered that at least a part of the surface of the hydrogen storage alloy particles is covered with the plating layer. Further, if the ratio B / A is a large value, it can be considered that many portions of the surface of the hydrogen storage alloy particles are covered with the plating layer.
B / A in the negative electrode material of the present invention is preferably 5 times or more, more preferably 10 times or more, and further preferably 20 times or more of B / A on the surface of the hydrogen storage alloy particles. 30 times or more is particularly preferable.

 本発明の負極材料におけるメッキ層は、後述するように、粒子の集合体で構成され、比表面積の大きなものであるのが好ましい。具体的には、本発明の負極材料のBET比表面積を水素吸蔵合金粒子のBET比表面積で除した値は、3以上であるのが好ましく、5以上であるのがより好ましく、10以上であるのが更に好ましく、20以上であるのが特に好ましい。 As described later, the plating layer in the negative electrode material of the present invention is preferably composed of an aggregate of particles and has a large specific surface area. Specifically, the value obtained by dividing the BET specific surface area of the negative electrode material of the present invention by the BET specific surface area of the hydrogen storage alloy particles is preferably 3 or more, more preferably 5 or more, and 10 or more. Is more preferable, and 20 or more is particularly preferable.

 本発明の負極材料が、表面が網目形状をなす負極材料である場合には、負極材料の表面における網目形状の部分(本明細書において網目部という場合がある)は、線状又は帯状をなす複数の隆起が互いに部分的に一体化した構造をとる。本発明の負極材料における網目部は、このような構造に由来して比較的強度が高いと考えられる。
 更に、当該網目部は主としてメッキ層で構成されるものと考えられる。つまり、網目部を有する本発明の負極材料において、メッキ層は、網目形状をなすことで強固に接続された三次元的な導電パスを形成すると考えられる。このような導電パスによっても負極材料の導電性が向上すると考えられる。
When the negative electrode material of the present invention is a negative electrode material having a mesh shape on the surface, the mesh portion on the surface of the negative electrode material (sometimes referred to as a mesh portion in the present specification) has a linear shape or a strip shape. A plurality of ridges are partially integrated with each other. The mesh portion in the negative electrode material of the present invention is considered to have a relatively high strength due to such a structure.
Further, it is considered that the mesh part is mainly composed of a plating layer. That is, in the negative electrode material of the present invention having a mesh portion, the plating layer is considered to form a three-dimensional conductive path that is firmly connected by forming a mesh shape. Such a conductive path is considered to improve the conductivity of the negative electrode material.

 本発明の負極材料は、ニッケル金属水素化物電池用の負極材料として使用できる。ニッケル金属水素化物電池は、正極、負極、電解液及びセパレータを具備する。以下、ニッケル金属水素化物電池について説明する。 The negative electrode material of the present invention can be used as a negative electrode material for nickel metal hydride batteries. The nickel metal hydride battery includes a positive electrode, a negative electrode, an electrolytic solution, and a separator. Hereinafter, the nickel metal hydride battery will be described.

 正極は、集電体と集電体の表面に形成された正極活物質層とを含む。負極は、集電体と集電体の表面に形成された負極活物質層とを含む。以下、正極の構成から説明するが、負極の構成と重複するものについては、正極との限定を付さずに説明する。 The positive electrode includes a current collector and a positive electrode active material layer formed on the surface of the current collector. The negative electrode includes a current collector and a negative electrode active material layer formed on the surface of the current collector. Hereinafter, although it demonstrates from the structure of a positive electrode, about the thing which overlaps with the structure of a negative electrode, it demonstrates without attaching | limiting with a positive electrode.

 集電体は、ニッケル金属水素化物電池の放電又は充電の間、電極に電流を流し続けるための化学的に不活性な電子伝導体をいう。集電体の材料は、使用する活物質に適した電圧に耐え得る金属であれば特に制限はない。集電体の材料としては、銀、銅、金、アルミニウム、タングステン、コバルト、亜鉛、ニッケル、鉄、白金、錫、インジウム、チタン、ルテニウム、タンタル、クロム、モリブデンから選ばれる少なくとも一種、並びにステンレス鋼などの金属材料を例示することができる。集電体は公知の保護層で被覆されていても良い。集電体の表面を公知の方法で処理したものを集電体として用いても良い。集電体の材料としては、ニッケル、又は、ニッケルめっきを施した金属材料が好ましい。 A current collector refers to a chemically inert electronic conductor that keeps a current flowing through an electrode during discharge or charging of a nickel metal hydride battery. The material of the current collector is not particularly limited as long as it is a metal that can withstand a voltage suitable for the active material to be used. The current collector material is at least one selected from silver, copper, gold, aluminum, tungsten, cobalt, zinc, nickel, iron, platinum, tin, indium, titanium, ruthenium, tantalum, chromium, molybdenum, and stainless steel Examples of such a metal material can be given. The current collector may be covered with a known protective layer. What collected the surface of the electrical power collector by the well-known method may be used as an electrical power collector. As a material for the current collector, nickel or a metal material plated with nickel is preferable.

 集電体は箔、シート、フィルム、線状、棒状、メッシュ、スポンジ状などの形態をとることができる。集電体が箔、シート、フィルム形態の場合は、その厚みが1μm~100μmの範囲内であることが好ましく、また、多数の孔を具備する、いわゆるパンチングメタル状のものや、切れ目の入った金属板を押し広げて網目状にした、いわゆるエキスパンドメタル状のものが好ましい。 The current collector can take the form of foil, sheet, film, wire, rod, mesh, sponge or the like. When the current collector is in the form of foil, sheet, or film, the thickness is preferably in the range of 1 μm to 100 μm, and the so-called punching metal-like one having a large number of holes or a cut What is called an expanded metal shape which spread | stretched the metal plate and made it mesh shape is preferable.

 正極活物質層は、正極活物質を含み、必要に応じて正極添加剤、結着剤及び導電助剤を含む。 The positive electrode active material layer contains a positive electrode active material and, if necessary, contains a positive electrode additive, a binder and a conductive additive.

 正極活物質としては、ニッケル金属水素化物電池の正極活物質として用いられるものであれば限定されない。具体的な正極活物質として、水酸化ニッケル、金属をドープした水酸化ニッケルを例示できる。水酸化ニッケルにドープする金属として、マグネシウム、カルシウムなどの第2族元素、コバルト、ロジウム、イリジウムなどの第9族元素、亜鉛、カドミウムなどの第12族元素を例示できる。 The positive electrode active material is not limited as long as it is used as the positive electrode active material of the nickel metal hydride battery. Specific examples of the positive electrode active material include nickel hydroxide and nickel hydroxide doped with metal. Examples of the metal doped into nickel hydroxide include Group 2 elements such as magnesium and calcium, Group 9 elements such as cobalt, rhodium and iridium, and Group 12 elements such as zinc and cadmium.

 正極活物質の表面は公知の方法で処理されてもよい。正極活物質は粉末状態が好ましく、また、その平均粒子径としては1~100μmの範囲内が好ましく、3~50μmの範囲内がより好ましく、5~30μmの範囲内がさらに好ましい。 The surface of the positive electrode active material may be treated by a known method. The positive electrode active material is preferably in a powder state, and the average particle size thereof is preferably in the range of 1 to 100 μm, more preferably in the range of 3 to 50 μm, and still more preferably in the range of 5 to 30 μm.

 正極活物質層には、正極活物質が正極活物質層全体の質量に対して、75~99質量%で含まれるのが好ましく、80~97質量%で含まれるのがより好ましく、82~95質量%で含まれるのがさらに好ましい。 The positive electrode active material layer preferably contains the positive electrode active material in an amount of 75 to 99% by mass, more preferably 80 to 97% by mass, and more preferably 82 to 95% by mass with respect to the total mass of the positive electrode active material layer. More preferably, it is contained in mass%.

 正極添加剤は、ニッケル金属水素化物電池の電池特性を向上させるために正極に添加されるものである。正極添加剤としては、ニッケル金属水素化物電池の正極添加剤として用いられるものであれば限定されない。具体的な正極添加剤として、Nbなどのニオブ化合物、WO、WO、LiWO、NaWO及びKWOなどのタングステン化合物、Ybなどのイッテルビウム化合物、TiOなどのチタン化合物、Yなどのイットリウム化合物、ZnOなどの亜鉛化合物、CaO、Ca(OH)及びCaFなどのカルシウム化合物、並びに、その他の希土類酸化物を例示できる。 The positive electrode additive is added to the positive electrode in order to improve the battery characteristics of the nickel metal hydride battery. The positive electrode additive is not limited as long as it is used as a positive electrode additive for nickel metal hydride batteries. Specific positive electrode additives include niobium compounds such as Nb 2 O 5 , tungsten compounds such as WO 2 , WO 3 , Li 2 WO 4 , Na 2 WO 4 and K 2 WO 4, and ytterbium compounds such as Yb 2 O 3 . And titanium compounds such as TiO 2 , yttrium compounds such as Y 2 O 3 , zinc compounds such as ZnO, calcium compounds such as CaO, Ca (OH) 2 and CaF 2 , and other rare earth oxides.

 正極活物質層には、正極添加剤が正極活物質層全体の質量に対して、0.1~10質量%で含まれるのが好ましく、0.5~5質量%で含まれるのがより好ましい。 In the positive electrode active material layer, the positive electrode additive is preferably contained in an amount of 0.1 to 10% by mass, more preferably 0.5 to 5% by mass with respect to the mass of the entire positive electrode active material layer. .

 結着剤は活物質などを集電体の表面に繋ぎ止める役割を果たすものである。結着剤としては、ニッケル金属水素化物電池の電極用結着剤として用いられるものであれば限定されない。具体的な結着剤として、ポリフッ化ビニリデン、ポリテトラフルオロエチレン及びフッ素ゴムなどの含フッ素樹脂、ポリプロピレン及びポリエチレンなどのポリオレフィン樹脂、ポリイミド及びポリアミドイミドなどのイミド系樹脂、カルボキシメチルセルロース、メチルセルロース及びヒドロキシプロピルセルロースなどのセルロース誘導体、スチレンブタジエンゴムなどの共重合体、並びに、(メタ)アクリル酸誘導体をモノマー単位として含有する、ポリアクリル酸、ポリアクリル酸エステル、ポリメタクリル酸及びポリメタクリル酸エステルなどの(メタ)アクリル系樹脂を例示できる。 The binder plays a role of connecting an active material or the like to the surface of the current collector. The binder is not limited as long as it is used as a binder for electrodes of nickel metal hydride batteries. Specific binders include fluorine-containing resins such as polyvinylidene fluoride, polytetrafluoroethylene and fluororubber, polyolefin resins such as polypropylene and polyethylene, imide resins such as polyimide and polyamideimide, carboxymethylcellulose, methylcellulose and hydroxypropyl. Cellulose derivatives such as cellulose, copolymers such as styrene butadiene rubber, and polyacrylic acid, polyacrylic acid ester, polymethacrylic acid and polymethacrylic acid ester containing (meth) acrylic acid derivatives as monomer units ( An example is a (meth) acrylic resin.

 活物質層には、結着剤が活物質層全体の質量に対して、0.1~15質量%で含まれるのが好ましく、1~10質量%で含まれるのがより好ましく、2~7質量%で含まれるのがさらに好ましい。結着剤が少なすぎると電極の成形性が低下し、また、結着剤が多すぎると電極のエネルギー密度が低くなるためである。 In the active material layer, the binder is preferably contained in an amount of 0.1 to 15% by mass, more preferably 1 to 10% by mass, with respect to the mass of the entire active material layer. More preferably, it is contained in mass%. This is because when the amount of the binder is too small, the moldability of the electrode is lowered, and when the amount of the binder is too large, the energy density of the electrode is lowered.

 導電助剤は、電極の導電性を高めるために添加される。そのため、導電助剤は、電極の導電性が不足する場合に任意に加えればよく、電極の導電性が十分に優れている場合には加えなくても良い。導電助剤は、粉末状態で活物質層に添加されてもよいし、活物質粒子の表面を被覆した状態で用いられてもよい。導電助剤としては化学的に不活性な電子伝導体であれば良い。具体的な導電材としては、コバルト、ニッケル、銅などの金属、コバルト酸化物などの金属酸化物、コバルト水酸化物などの金属水酸化物、カルボニルニッケルなどの金属の一酸化炭素錯体、カーボンブラック、黒鉛、炭素繊維などの炭素材料が例示される。 Conductive aid is added to increase the conductivity of the electrode. Therefore, the conductive auxiliary agent may be added arbitrarily when the electrode conductivity is insufficient, and may not be added when the electrode conductivity is sufficiently excellent. The conductive auxiliary agent may be added to the active material layer in a powder state, or may be used in a state where the surfaces of the active material particles are coated. The conductive auxiliary agent may be an electronic conductor that is chemically inert. Specific conductive materials include metals such as cobalt, nickel, copper, metal oxides such as cobalt oxide, metal hydroxides such as cobalt hydroxide, carbon monoxide complexes such as carbonyl nickel, carbon black, and the like. Examples thereof include carbon materials such as graphite and carbon fiber.

 活物質層には、導電助剤が活物質層全体の質量に対して、0.1~20質量%で含まれるのが好ましい。正極活物質層には、導電助剤が正極活物質層全体の質量に対して、1~15質量%で含まれるのが好ましく、3~12質量%で含まれるのがより好ましく、5~10質量%で含まれるのがさらに好ましい。負極活物質層には、導電助剤が負極活物質層全体の質量に対して、0.1~5質量%で含まれるのが好ましく、0.2~3質量%で含まれるのがより好ましく、0.3~1質量%で含まれるのがさらに好ましい。導電助剤が少なすぎると効率のよい導電パスを形成できず、また、導電助剤が多すぎると活物質層の成形性が悪くなるとともに電極のエネルギー密度が低くなるためである。 The active material layer preferably contains 0.1 to 20% by mass of a conductive additive with respect to the total mass of the active material layer. In the positive electrode active material layer, the conductive additive is preferably contained in an amount of 1 to 15% by mass, more preferably 3 to 12% by mass, with respect to the total mass of the positive electrode active material layer. More preferably, it is contained in mass%. The negative electrode active material layer preferably contains 0.1 to 5% by mass, more preferably 0.2 to 3% by mass of the conductive auxiliary agent with respect to the total mass of the negative electrode active material layer. More preferably, the content is 0.3 to 1% by mass. This is because if the amount of the conductive auxiliary is too small, an efficient conductive path cannot be formed, and if the amount of the conductive auxiliary is too large, the moldability of the active material layer is deteriorated and the energy density of the electrode is lowered.

 負極活物質層は、負極材料を含み必要に応じて負極添加剤、結着剤及び導電助剤を含む。既述したように、負極材料は負極活物質たる水素吸蔵合金粒子とメッキ層とで構成される。結着剤及び導電助剤については上述したとおりである。 The negative electrode active material layer includes a negative electrode material and, if necessary, a negative electrode additive, a binder, and a conductive additive. As described above, the negative electrode material is composed of hydrogen storage alloy particles, which are negative electrode active materials, and a plating layer. The binder and the conductive aid are as described above.

 負極活物質層には、負極材料が負極活物質層全体の質量に対して、85~99質量%で含まれるのが好ましく、90~98質量%で含まれるのがより好ましい。 In the negative electrode active material layer, the negative electrode material is preferably contained in an amount of 85 to 99% by mass, more preferably 90 to 98% by mass with respect to the mass of the entire negative electrode active material layer.

 負極添加剤は、ニッケル金属水素化物電池の電池特性を向上させるために負極に添加されるものである。負極添加剤としては、ニッケル金属水素化物電池の負極添加剤として用いられるものであれば限定されない。具体的な負極添加剤として、CeF及びYFなどの希土類元素のフッ化物、Bi及びBiFなどのビスマス化合物、In及びInFなどのインジウム化合物、並びに、正極添加剤として例示した化合物を挙げることができる。 The negative electrode additive is added to the negative electrode in order to improve the battery characteristics of the nickel metal hydride battery. The negative electrode additive is not limited as long as it is used as a negative electrode additive for nickel metal hydride batteries. Specific negative electrode additives include rare earth fluorides such as CeF 3 and YF 3 , bismuth compounds such as Bi 2 O 3 and BiF 3 , indium compounds such as In 2 O 3 and InF 3 , and positive electrode additives Can be mentioned as examples.

 負極活物質層には、負極添加剤が負極活物質層全体の質量に対して、0.1~10質量%で含まれるのが好ましく、0.5~5質量%で含まれるのがより好ましい。 In the negative electrode active material layer, the negative electrode additive is preferably contained in an amount of 0.1 to 10% by mass, more preferably 0.5 to 5% by mass with respect to the total mass of the negative electrode active material layer. .

 集電体の表面に活物質層を形成させるには、ロールコート法、ダイコート法、ディップコート法、ドクターブレード法、スプレーコート法、カーテンコート法などの従来から公知の方法を用いて、集電体の表面に活物質を塗布すればよい。具体的には、活物質、溶剤、並びに必要に応じて結着剤、導電助剤及び添加剤を混合してスラリーにしてから、当該スラリーを集電体の表面に塗布後、乾燥する。溶剤としては、N-メチル-2-ピロリドン、メタノール、メチルイソブチルケトン、水を例示できる。電極密度を高めるべく、乾燥後のものを圧縮しても良い。 In order to form an active material layer on the surface of the current collector, a current collecting method such as a roll coating method, a die coating method, a dip coating method, a doctor blade method, a spray coating method, or a curtain coating method can be used. An active material may be applied to the surface of the body. Specifically, an active material, a solvent, and if necessary, a binder, a conductive additive and an additive are mixed to form a slurry, and the slurry is applied to the surface of the current collector and then dried. Examples of the solvent include N-methyl-2-pyrrolidone, methanol, methyl isobutyl ketone, and water. In order to increase the electrode density, the dried product may be compressed.

 セパレータは、正極と負極とを隔離して、両極の接触による短絡を防止しつつ、電解液の貯留空間及び通路を提供するものである。セパレータとしては、公知のものを採用すればよく、ポリテトラフルオロエチレン、ポリプロピレン、ポリエチレン、ポリイミド、ポリアミド、ポリアラミド(Aromatic polyamide)、ポリエステル、ポリアクリロニトリル等の合成樹脂、セルロース、アミロース等の多糖類、フィブロイン、ケラチン、リグニン、スベリン等の天然高分子、セラミックスなどの電気絶縁性材料を1種若しくは複数用いた多孔体、不織布、織布などを挙げることができる。また、セパレータは多層構造としてもよい。 The separator separates the positive electrode and the negative electrode, and provides a storage space and a passage for the electrolyte while preventing a short circuit due to contact between the two electrodes. As the separator, a known separator may be employed, such as polytetrafluoroethylene, polypropylene, polyethylene, polyimide, polyamide, polyaramid (Aromatic polymer), polyester, polyacrylonitrile and other synthetic resins, cellulose, amylose and other polysaccharides, fibroin. And porous materials, nonwoven fabrics, woven fabrics, and the like using one or more electrical insulating materials such as natural polymers such as keratin, lignin, and suberin, and ceramics. The separator may have a multilayer structure.

 セパレータは、表面に親水化処理が施されていることが好ましい。親水化処理としては、スルホン化処理、コロナ処理、フッ素ガス処理、プラズマ処理を例示できる。 The separator is preferably subjected to a hydrophilic treatment on the surface. Examples of the hydrophilic treatment include sulfonation treatment, corona treatment, fluorine gas treatment, and plasma treatment.

 電解液は、ニッケル金属水素化物電池用の電解液として一般に用いられる強塩基水溶液を用いれば良い。強塩基水溶液として、具体的には、水酸化カリウム水溶液、水酸化ナトリウム水溶液、水酸化リチウム水溶液が挙げられる。電解液としては、一種のみの強塩基水溶液を用いても良いし、複数種の強塩基水溶液を混合して用いても良い。
 また、電解液には、ニッケル金属水素化物電池用電解液に採用される公知の添加剤が添加されていてもよい。
The electrolytic solution may be a strong base aqueous solution generally used as an electrolytic solution for nickel metal hydride batteries. Specific examples of the strong base aqueous solution include a potassium hydroxide aqueous solution, a sodium hydroxide aqueous solution, and a lithium hydroxide aqueous solution. As the electrolytic solution, only one kind of strong base aqueous solution may be used, or plural kinds of strong base aqueous solutions may be mixed and used.
Moreover, the well-known additive employ | adopted as the electrolyte solution for nickel metal hydride batteries may be added to electrolyte solution.

 ニッケル金属水素化物電池の製造方法としては、正極及び負極に必要に応じてセパレータを挟装させ電極体とし、正極の集電体及び負極の集電体から外部に通ずる正極端子及び負極端子までを集電用リード等を用いて接続した後に、電極体に本発明の電解液を加えてニッケル金属水素化物電池とするとよい。
 ニッケル金属水素化物電池の形状は特に限定されるものでなく、角型、円筒型、コイン型、ラミネート型等、種々の形状を採用することができる。
As a manufacturing method of the nickel metal hydride battery, a separator is interposed between the positive electrode and the negative electrode as necessary to form an electrode body, from the positive electrode current collector and the negative electrode current collector to the positive electrode terminal and the negative electrode terminal connected to the outside. After the connection using a current collecting lead or the like, the electrolyte solution of the present invention may be added to the electrode body to form a nickel metal hydride battery.
The shape of the nickel metal hydride battery is not particularly limited, and various shapes such as a square shape, a cylindrical shape, a coin shape, and a laminate shape can be adopted.

 以上、本発明の製造方法及び本発明の負極材料を説明したが、本発明は、上記実施形態に限定されるものではない。本発明の要旨を逸脱しない範囲において、当業者が行い得る変更、改良等を施した種々の形態にて実施することができる。 As mentioned above, although the manufacturing method of this invention and the negative electrode material of this invention were demonstrated, this invention is not limited to the said embodiment. The present invention can be implemented in various forms without departing from the gist of the present invention, with modifications and improvements that can be made by those skilled in the art.

 (実施例1)
<メッキ溶液調製工程>
 ニッケル塩として硫酸ニッケルを、金属塩として硫酸コバルトを、ヘテロ元素含有有機化合物としてジカルボン酸であるマロン酸を、水系溶媒として水を用いてメッキ溶液を調製した。
 先ず、NiSO・6HOを1.5g、CoSO・7HOを1.5g、ジカルボン酸を1.5gずつ計り取り、75gの蒸留水を加えた。これを90℃に加熱して溶液とし、更にこの溶液を80℃に保ちつつpH4~5となるようにNaOHを添加して、メッキ溶液を得た。
Example 1
<Plating solution preparation process>
A plating solution was prepared using nickel sulfate as a nickel salt, cobalt sulfate as a metal salt, malonic acid which is a dicarboxylic acid as a hetero element-containing organic compound, and water as an aqueous solvent.
First, 1.5 g of NiSO 4 .6H 2 O, 1.5 g of CoSO 4 .7H 2 O, and 1.5 g of dicarboxylic acid were measured, and 75 g of distilled water was added. This was heated to 90 ° C. to form a solution, and NaOH was added to maintain the solution at 80 ° C. so that the pH was 4 to 5, thereby obtaining a plating solution.

<メッキ工程>
 還元剤として水素化ホウ素ナトリウムを1.0g計り取り、100mlになるまで蒸留水を加えて、還元剤溶液を得た。
 水素吸蔵合金粒子として、(Nd0.88Zr0.01Mg0.111.0(Ni0.95Al0.053.5で表されるA型水素吸蔵合金の粒子を用いた。当該水素吸蔵合金粒子の平均粒子径は25μmであった。
 容積1Lのガラス製反応槽に、上記の水素吸蔵合金粒子を60g添加し、反応槽内の液量が400mlになるように蒸留水を加えて、スラリー状の水素吸蔵合金粒子分散液とした。
<Plating process>
1.0 g of sodium borohydride was weighed out as a reducing agent, and distilled water was added to 100 ml to obtain a reducing agent solution.
As hydrogen storage alloy particles, particles of A 2 B 7 type hydrogen storage alloy represented by (Nd 0.88 Zr 0.01 Mg 0.11 ) 1.0 (Ni 0.95 Al 0.05 ) 3.5 Was used. The average particle diameter of the hydrogen storage alloy particles was 25 μm.
60 g of the above hydrogen storage alloy particles were added to a 1 L glass reaction tank, and distilled water was added so that the amount of the liquid in the reaction tank was 400 ml to obtain a slurry-like hydrogen storage alloy particle dispersion.

 パドル型撹拌羽根を用いて反応槽内の水素吸蔵合金粒子分散液を撹拌した。この反応槽にメッキ溶液と還元剤溶液とを滴下した。このメッキ混合液を一時間程度攪拌した。この工程により、水素吸蔵合金の表面にメッキ層が形成された負極材料を得た。 The hydrogen storage alloy particle dispersion in the reaction vessel was stirred using a paddle type stirring blade. A plating solution and a reducing agent solution were dropped into the reaction vessel. This plating mixture was stirred for about 1 hour. By this step, a negative electrode material having a plating layer formed on the surface of the hydrogen storage alloy was obtained.

 その後速やかに、負極材料を濾別し、濾別した固形分、つまり負極材料を純水で洗浄した。洗浄後の負極材料を真空乾燥し、乾燥後の負極材料を、乳鉢を用いて大気中で解砕した。 Thereafter, the negative electrode material was immediately filtered off, and the solid content thus filtered, that is, the negative electrode material was washed with pure water. The washed negative electrode material was vacuum dried, and the dried negative electrode material was crushed in the air using a mortar.

<加熱工程>
 上記したメッキ工程後、真空乾燥を経た負極材料を加熱炉に入れ、アルゴン雰囲気下にて室温から350℃に昇温して加熱した。当該加熱工程後の負極材料を実施例1の負極材料とした。
<Heating process>
After the above-described plating step, the vacuum-dried negative electrode material was placed in a heating furnace and heated from room temperature to 350 ° C. in an argon atmosphere. The negative electrode material after the heating step was used as the negative electrode material of Example 1.

 (実施例2)
 加熱工程を行わないこと以外、実施例1と同じ方法で実施例2の負極材料を得た。なお、実施例2の方法においては、メッキ工程後の粉末を実施例2の負極材料とした。
(Example 2)
A negative electrode material of Example 2 was obtained in the same manner as in Example 1 except that the heating step was not performed. In the method of Example 2, the powder after the plating process was used as the negative electrode material of Example 2.

 (比較例1)
 実施例1で用いたものと同じ平均粒子径25μmの水素吸蔵合金粒子を、比較例1の負極材料とした。
(Comparative Example 1)
The same hydrogen storage alloy particles having an average particle diameter of 25 μm as those used in Example 1 were used as the negative electrode material of Comparative Example 1.

 (比較例2)
 メッキ溶液にヘテロ元素含有有機化合物を配合しないこと以外、実施例1と同じ方法で、比較例2の負極材料を得た。
 なお、比較例2の製造方法におけるメッキ溶液は、NiSO・6HOを1.5g及びCoSO・7HOを1.5g計り取り、75gの蒸留水を加えたものを90℃に加熱して溶液とし、更にこの溶液を80℃に保ちつつpHが5になるようにNaOHを添加したものである。
(Comparative Example 2)
A negative electrode material of Comparative Example 2 was obtained in the same manner as in Example 1 except that no heteroelement-containing organic compound was blended in the plating solution.
Incidentally, the plating solution in the manufacturing method of Comparative Example 2, heating NiSO 4 · 6H 2 O and 1.5g and CoSO 4 · 7H 2 O 1.5g of measured out, those of distilled water was added 75g of a 90 ° C. Then, NaOH is added so that the pH is 5 while keeping the solution at 80 ° C.

 (比較例3)
 加熱工程を行わないこと以外、比較例2と同じ方法で、比較例3の負極材料を得た。
(Comparative Example 3)
A negative electrode material of Comparative Example 3 was obtained in the same manner as Comparative Example 2, except that the heating step was not performed.

 (評価1 導電性)
 実施例1、実施例2の負極材料及び比較例1~比較例3の負極材料につき、各々粉体抵抗を測定した。測定装置としては、株式会社 三菱化学アナリテック製の粉体抵抗測定器を用いた。導電性評価の結果を表1に示す。
(Evaluation 1 conductivity)
The powder resistance of each of the negative electrode materials of Example 1 and Example 2 and the negative electrode materials of Comparative Examples 1 to 3 was measured. As a measuring device, a powder resistance measuring device manufactured by Mitsubishi Chemical Analytech Co., Ltd. was used. Table 1 shows the results of the conductivity evaluation.

Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001

 表1に示すように、実施例1及び実施例2の負極材料の粉体抵抗は、比較例1の負極材料の粉体抵抗に比べて低い。これは、メッキ層の有無に起因すると考えられ、メッキ層を有することにより実施例1の負極材料及び実施例2の負極材料には優れた導電性が付与されたと考えられる。 As shown in Table 1, the powder resistance of the negative electrode material of Example 1 and Example 2 is lower than the powder resistance of the negative electrode material of Comparative Example 1. This is considered to be due to the presence or absence of the plating layer, and it is considered that excellent conductivity was imparted to the negative electrode material of Example 1 and the negative electrode material of Example 2 by having the plating layer.

 また、実施例1の負極材料の粉体抵抗は、比較例2の負極材料の粉体抵抗に比べて著しく低い。これは、メッキ溶液中のメッキ金属の錯体化の有無に起因すると考えられる。この結果から、錯体化されたメッキ金属によりメッキ層を形成することで、導電性に優れるメッキ層が得られることがわかる。 The powder resistance of the negative electrode material of Example 1 is significantly lower than that of the negative electrode material of Comparative Example 2. This is considered due to the presence or absence of complexation of the plating metal in the plating solution. From this result, it is understood that a plating layer having excellent conductivity can be obtained by forming a plating layer with a complexed plating metal.

 また、実施例1の負極材料の粉体抵抗は実施例2の負極材料の粉体抵抗に比べても低い。これは、加熱工程の有無に起因すると考えられる。メッキ層を形成した後に加熱することで、負極材料の粉体抵抗をさらに低減し、負極材料の導電性を更に向上させ得ることがわかる。 Also, the powder resistance of the negative electrode material of Example 1 is lower than that of the negative electrode material of Example 2. This is considered due to the presence or absence of the heating step. It can be seen that heating after forming the plating layer can further reduce the powder resistance of the negative electrode material and further improve the conductivity of the negative electrode material.

 更に、錯体化を行わずにメッキ層を形成した比較例2の負極材料と比較例3の負極材料を比較すると、加熱工程を行った比較例2の負極材料の方が加熱工程を行わない比較例3の負極材料に比べて粉体抵抗が低い。また、錯体化を行わずメッキ層を形成しかつ加熱工程を行わなかった比較例3の負極材料は、メッキ層のない比較例1の負極材料と同程度の粉体抵抗であった。この結果から、単にメッキ層を形成するだけでは導電性が向上し難いこと、メッキ金属の錯体化を経てメッキ層を形成することではじめて導電性に優れるメッキ層が得られることがわかる。更に、何らかの理由により、加熱工程を行うことで負極材料の導電性が向上することもわかる。 Further, when the negative electrode material of Comparative Example 2 in which the plating layer was formed without complexing and the negative electrode material of Comparative Example 3 were compared, the negative electrode material of Comparative Example 2 in which the heating process was performed was compared without performing the heating process. Compared to the negative electrode material of Example 3, the powder resistance is low. Further, the negative electrode material of Comparative Example 3 in which the plating layer was not formed and the heating step was not performed had a powder resistance comparable to that of the negative electrode material of Comparative Example 1 without the plating layer. From this result, it can be seen that it is difficult to improve conductivity simply by forming a plating layer, and that a plating layer having excellent conductivity can be obtained only by forming a plating layer through complexation of plating metal. Furthermore, it turns out that the electroconductivity of negative electrode material improves by performing a heating process for a certain reason.

 (評価2 表面分析)
 実施例1の負極材料及び比較例2の負極材料についてX線光電子分光分析(X-ray Photoelectron Spectroscopy, XPS)を用いて表面分析を行った。装置としては、アルバックファイ社 PH15000 VersaProbeIIを用いた。X線源は単色AlKα線(15kV、10mA)を用いた。XPSにより測定された実施例1の負極材料および比較例2の負極材料の表面分析結果を図1及び図2に示す。
(Evaluation 2 Surface analysis)
The negative electrode material of Example 1 and the negative electrode material of Comparative Example 2 were subjected to surface analysis using X-ray Photoelectron Spectroscopy (XPS). ULVAC-PHI PH15000 VersaProbeII was used as the apparatus. A monochromatic AlKα ray (15 kV, 10 mA) was used as the X-ray source. The surface analysis results of the negative electrode material of Example 1 and the negative electrode material of Comparative Example 2 measured by XPS are shown in FIGS.

 図1及び図2に示すように、実施例1の負極材料のXPSスペクトル及び比較例2の負極材料のXPSスペクトルでは、870eV、856eV、及び853eVの結合エネルギー領域においてピークが観察された。このうち870eV及び853eVの結合エネルギーをもつ結合基は金属ニッケルに由来すると考えられる。一方、856eVの結合エネルギーをもつ結合基はニッケル水酸化物に由来すると考えられる。比較例2の負極材料のXPSスペクトルでは、ニッケル水酸化物に由来する856eVのピーク強度は、金属ニッケルに由来する870eV及び853eVのピーク強度に比べて大きい。これに対して、実施例1の負極材料のXPSスペクトルでは、ニッケル水酸化物に由来する856eVのピーク強度に比べて、金属ニッケルに由来する853eVのピーク強度が大きい。この結果から、比較例2の負極材料の表面においては多くのニッケル水酸化物が存在するのに対して、実施例1の負極材料の表面においては多くの金属ニッケルが存在すると考えられる。この結果は、実施例1の製造方法においてはニッケルの水酸化が抑制されたこと、ニッケルを錯体化しておくことがニッケルの水酸化を抑制するのに有効であることを示唆する。 As shown in FIGS. 1 and 2, in the XPS spectrum of the negative electrode material of Example 1 and the XPS spectrum of the negative electrode material of Comparative Example 2, peaks were observed in the binding energy regions of 870 eV, 856 eV, and 853 eV. Among these, it is considered that the bonding groups having the bonding energy of 870 eV and 853 eV are derived from metallic nickel. On the other hand, the bonding group having a binding energy of 856 eV is considered to be derived from nickel hydroxide. In the XPS spectrum of the negative electrode material of Comparative Example 2, the peak intensity of 856 eV derived from nickel hydroxide is larger than the peak intensity of 870 eV and 853 eV derived from metallic nickel. On the other hand, in the XPS spectrum of the negative electrode material of Example 1, the peak intensity of 853 eV derived from metallic nickel is larger than the peak intensity of 856 eV derived from nickel hydroxide. From this result, it can be considered that a lot of nickel hydroxide is present on the surface of the negative electrode material of Comparative Example 2 whereas a large amount of metallic nickel is present on the surface of the negative electrode material of Example 1. This result suggests that nickel hydroxide was suppressed in the production method of Example 1, and that nickel complexation was effective in suppressing nickel hydroxide.

 上記したように、実施例1の負極材料のXPSスペクトル及び比較例2の負極材料のXPSスペクトルでは、870eVの結合エネルギー領域においてピークが観察された。当該ピークはCoNiのピークであると考えられ、実施例1の負極材料のXPSスペクトルでは非常に強く表れている。このため、実施例1の負極材料においてはニッケルとコバルトとが合金化したニッケルコバルト合金が形成されているといえる。 As described above, in the XPS spectrum of the negative electrode material of Example 1 and the XPS spectrum of the negative electrode material of Comparative Example 2, a peak was observed in the binding energy region of 870 eV. The peak is considered to be a peak of CoNi, and is very strong in the XPS spectrum of the negative electrode material of Example 1. For this reason, in the negative electrode material of Example 1, it can be said that the nickel cobalt alloy which nickel and cobalt alloyed is formed.

 (評価2-A 表面分析)
 実施例1の負極材料及び比較例1の負極材料につき、表面組成を分析した。具体的には、負極材料表面の任意の位置における、所定面積の測定領域において、表面から5nm深さまでの組成をXPSにて測定した。測定結果を基に、所定体積の当該領域における希土類金属の質量(A)と遷移金属の質量(B)とを算出し、更に、当該BをAで除したB/A値を算出した。当該B/Aは、希土類金属と遷移金属との存在割合といえる。
(Evaluation 2-A Surface analysis)
The surface composition of the negative electrode material of Example 1 and the negative electrode material of Comparative Example 1 was analyzed. Specifically, the composition from the surface to a depth of 5 nm was measured by XPS in a measurement area having a predetermined area at an arbitrary position on the surface of the negative electrode material. Based on the measurement result, the mass (A) of the rare earth metal and the mass (B) of the transition metal in the predetermined volume of the region were calculated, and the B / A value obtained by dividing B by A was calculated. The B / A can be said to be an abundance ratio of the rare earth metal and the transition metal.

 実施例1の負極材料におけるB/Aは127.5であり、比較例1の負極材料におけるB/Aは3.7であった。つまり、実施例1の負極材料におけるB/Aは、比較例1の負極材料におけるB/Aのおよそ34倍であった。
 換言すると、実施例1の負極材料の表面におけるB/Aは127.5であり、その材料である水素吸蔵合金粒子の表面におけるB/Aは3.7であった。つまり、実施例1の負極材料の表面におけるB/Aは、水素吸蔵合金粒子の表面におけるB/Aのおよそ34倍であった。
 この結果から、本発明の負極材料の表面におけるB/Aは、水素吸蔵合金粒子の表面におけるB/Aよりも大きいといえる。希土類元素は水素吸蔵合金粒子には含まれるもののメッキ層にはほぼ含まれないため、B/Aが大きい程、メッキ層による水素吸蔵合金粒子の表面の被覆率が高いといえる。本発明の負極材料の表面におけるB/Aは、水素吸蔵合金粒子の表面におけるB/Aの5倍以上であるのが好ましく、10倍以上であるのがより好ましく、20倍以上であるのが更に好ましく、30倍以上であるのが特に好ましいといえる。
B / A in the negative electrode material of Example 1 was 127.5, and B / A in the negative electrode material of Comparative Example 1 was 3.7. That is, the B / A in the negative electrode material of Example 1 was approximately 34 times the B / A in the negative electrode material of Comparative Example 1.
In other words, the B / A on the surface of the negative electrode material of Example 1 was 127.5, and the B / A on the surface of the hydrogen storage alloy particles as the material was 3.7. That is, the B / A on the surface of the negative electrode material of Example 1 was approximately 34 times the B / A on the surface of the hydrogen storage alloy particles.
From this result, it can be said that B / A on the surface of the negative electrode material of the present invention is larger than B / A on the surface of the hydrogen storage alloy particles. Although rare earth elements are contained in the hydrogen storage alloy particles but are not substantially contained in the plating layer, it can be said that the higher the B / A, the higher the surface coverage of the hydrogen storage alloy particles by the plating layer. The B / A on the surface of the negative electrode material of the present invention is preferably 5 times or more, more preferably 10 times or more, more preferably 20 times or more of the B / A on the surface of the hydrogen storage alloy particles. More preferably, it is particularly preferably 30 times or more.

 更には、本発明の負極材料の表面におけるB/Aは、10以上1000以下であるのが好ましく、50以上1000以下であるのがより好ましく、70以上1000以下であるのが更に好ましく、100以上1000以下であるのが特に好ましいといえる。 Furthermore, B / A on the surface of the negative electrode material of the present invention is preferably 10 or more and 1000 or less, more preferably 50 or more and 1000 or less, still more preferably 70 or more and 1000 or less, and 100 or more. It can be said that it is especially preferable that it is 1000 or less.

 (実施例3)
 メッキ工程において、スラリー状の水素吸蔵合金粒子分散液に有機化合物系分散剤として0.03gのポリビニルピロリドンを添加したこと、及び、メッキ、洗浄及び乾燥後の負極材料の大気中での解砕を省いたこと以外は、実施例1と同じ方法で実施例3の負極材料を得た。
 なお、実施例1の製造方法によると、メッキ工程における濾過の際に負極材料が凝集したが、実施例3の製造方法では当該凝集は生じず、洗浄及び乾燥後の負極材料は解砕しなくても容易に解れた。
(Example 3)
In the plating step, 0.03 g of polyvinyl pyrrolidone as an organic compound dispersant was added to the slurry-like hydrogen storage alloy particle dispersion, and the negative electrode material after plating, washing and drying was crushed in the atmosphere. A negative electrode material of Example 3 was obtained in the same manner as in Example 1 except that it was omitted.
In addition, according to the manufacturing method of Example 1, the negative electrode material aggregated during filtration in the plating step, but the aggregation does not occur in the manufacturing method of Example 3, and the negative electrode material after washing and drying does not crush. But it was easy to understand.

 (評価3 SEM観察)
 走査電子顕微鏡(SEM:Scanning Electron Microscope)を用いて、実施例1の負極材料、実施例3の負極材料及び比較例2の負極材料の表面を観察した。実施例1の負極材料のSEM像を図3に示し、実施例3の負極材料のSEM像を図4に示し、比較例2の負極材料のSEM像を図5に示す。
(Evaluation 3 SEM observation)
The surfaces of the negative electrode material of Example 1, the negative electrode material of Example 3, and the negative electrode material of Comparative Example 2 were observed using a scanning electron microscope (SEM). The SEM image of the negative electrode material of Example 1 is shown in FIG. 3, the SEM image of the negative electrode material of Example 3 is shown in FIG. 4, and the SEM image of the negative electrode material of Comparative Example 2 is shown in FIG.

 図3及び図4に示すように、実施例1の負極材料の表面及び実施例3の負極材料の表面には、何れも粒子の集合体が観察された。これに対して図5に示すように、比較例2の負極材料の表面には粒子とは言い難い微細な凹凸が観察された。実施例1、実施例3及び比較例2の負極材料の表面はメッキ層で構成されているため、当該粒子及び凹凸はメッキ層で構成されていると考えられる。つまり、実施例1及び実施例3の負極材料は粒子の集合体で構成されているメッキ層を有するのに対し、比較例2の負極材料は微細な凹凸を有するメッキ層を有すると言える。
 実施例1及び実施例3の製造方法と、比較例2の製造方法との違いは、メッキ溶液中のメッキ金属の錯体化の有無である。したがって、上記の表面形状の違いはメッキ金属の錯体化の有無に起因すると考えられる。この結果から、メッキ溶液中のメッキ金属を錯体化することで、メッキ金属つまりニッケル及び金属が粒状に析出し、粒子の集合体で構成されるメッキ層が得られることが裏付けられる。
As shown in FIGS. 3 and 4, aggregates of particles were observed on both the surface of the negative electrode material of Example 1 and the surface of the negative electrode material of Example 3. On the other hand, as shown in FIG. 5, fine irregularities that were difficult to say as particles were observed on the surface of the negative electrode material of Comparative Example 2. Since the surface of the negative electrode material of Example 1, Example 3, and Comparative Example 2 is composed of a plating layer, it is considered that the particles and irregularities are composed of a plating layer. That is, it can be said that the negative electrode material of Example 1 and Example 3 has a plating layer composed of an aggregate of particles, whereas the negative electrode material of Comparative Example 2 has a plating layer having fine irregularities.
The difference between the manufacturing method of Example 1 and Example 3 and the manufacturing method of Comparative Example 2 is the presence or absence of complexation of the plating metal in the plating solution. Therefore, it is considered that the difference in surface shape is caused by the presence or absence of complexation of the plating metal. From this result, it is confirmed that by plating the plating metal in the plating solution, the plating metal, that is, nickel and metal precipitate in a granular form, and a plating layer composed of an aggregate of particles can be obtained.

 また、実施例3の負極材料の表面に存在する粒子の平均的な粒子サイズは10nmであり、当該粒子サイズは、実施例1の負極材料の表面に存在する粒子の平均的な粒子サイズである10nm~20nmに比べて、より小さかった。この結果から、メッキ金属の錯体化に加えて、更に、有機化合物系分散剤の存在下でメッキ工程を行うことで、より微細な粒子の集合体からなるメッキ層が得られることがわかる。更に当該メッキ層を有する負極材料は凝集し難く解砕等を要さないため、実施例3の製造方法つまり有機化合物系分散剤の存在下でメッキ工程を行う製造方法によると、負極材料を容易に製造できることがわかる。 The average particle size of the particles present on the surface of the negative electrode material of Example 3 is 10 nm, and the particle size is the average particle size of the particles present on the surface of the negative electrode material of Example 1. It was smaller than 10 nm to 20 nm. From this result, it can be seen that, in addition to complexation of the plating metal, a plating layer composed of an aggregate of finer particles can be obtained by performing the plating step in the presence of an organic compound dispersant. Furthermore, since the negative electrode material having the plating layer hardly aggregates and does not require crushing, the negative electrode material can be easily prepared according to the manufacturing method of Example 3, that is, the manufacturing method in which the plating process is performed in the presence of the organic compound dispersant. It can be seen that it can be manufactured.

 (評価3-A BET比表面積)
 実施例1の負極材料及び比較例1の負極材料につき、BET法にて比表面積の測定を行った。
(Evaluation 3-A BET specific surface area)
The specific surface area of the negative electrode material of Example 1 and the negative electrode material of Comparative Example 1 was measured by the BET method.

 実施例1の負極材料のBET比表面積は4.085m/gであり、比較例1の負極材料のBET比表面積は0.173m/gであり、実施例1の負極材料のBET比表面積を比較例1の負極材料のBET比表面積で除した値は24であった。
 換言すると、実施例1の負極材料のBET比表面積は4.085m/gであり、その材料である水素吸蔵合金粒子のBET比表面積は0.173m/gであり、実施例1の負極材料のBET比表面積を、その材料である水素吸蔵合金粒子のBET比表面積で除した値は24であった。
The negative electrode material of Example 1 has a BET specific surface area of 4.085 m 2 / g, the negative electrode material of Comparative Example 1 has a BET specific surface area of 0.173 m 2 / g, and the negative electrode material of Example 1 has a BET specific surface area. Was 24 divided by the BET specific surface area of the negative electrode material of Comparative Example 1.
In other words, the negative electrode material of Example 1 has a BET specific surface area of 4.085 m 2 / g, and the hydrogen storage alloy particles of the material has a BET specific surface area of 0.173 m 2 / g. A value obtained by dividing the BET specific surface area of the material by the BET specific surface area of the hydrogen storage alloy particles as the material was 24.

 ところで、本発明の負極材料の表面を構成するメッキ層は、例えば図3に示されるように、粒子の集合体で構成されているため、比表面積が大きい。したがって、このようなメッキ層を有する本発明の負極材料のBET比表面積は、その材料である水素吸蔵合金粒子のBET比表面積よりも大きくなる。すなわち、本発明の負極材料のBET比表面積を、水素吸蔵合金粒子のBET比表面積で除した値は1を超えるといえる。 Incidentally, since the plating layer constituting the surface of the negative electrode material of the present invention is composed of an aggregate of particles as shown in FIG. 3, for example, the specific surface area is large. Therefore, the BET specific surface area of the negative electrode material of the present invention having such a plating layer is larger than the BET specific surface area of the hydrogen storage alloy particles as the material. That is, it can be said that the value obtained by dividing the BET specific surface area of the negative electrode material of the present invention by the BET specific surface area of the hydrogen storage alloy particles exceeds 1.

 更に、上記の評価3-Aの結果を勘案すると、本発明の負極材料のBET比表面積を水素吸蔵合金粒子のBET比表面積で除した値は、3以上であるのが好ましく、5以上であるのがより好ましく、10以上であるのが更に好ましく、20以上であるのが特に好ましいといえる。本発明の負極材料のBET比表面積を水素吸蔵合金粒子のBET比表面積で除した値に上限は特にないが、強いて挙げるとすると、当該上限として100以下が挙げられる。
 更に、本発明の負極材料のBET比表面積は、1~10m/gであるのが好ましく、1.5~8m/gであるのがより好ましく、2~6m/gであるのが更に好ましく、3~5m/gであるのが特に好ましいといえる。
Further, considering the result of the above evaluation 3-A, the value obtained by dividing the BET specific surface area of the negative electrode material of the present invention by the BET specific surface area of the hydrogen storage alloy particles is preferably 3 or more, and more preferably 5 or more. More preferably, it is more preferably 10 or more, and particularly preferably 20 or more. There is no particular upper limit to the value obtained by dividing the BET specific surface area of the negative electrode material of the present invention by the BET specific surface area of the hydrogen storage alloy particles.
Further, the BET specific surface area of the negative electrode material of the present invention is preferably 1 to 10 m 2 / g, more preferably 1.5 to 8 m 2 / g, and 2 to 6 m 2 / g. More preferred is 3 to 5 m 2 / g.

 (ニッケル金属水素化物電池)
 実施例1、実施例3及び比較例1の負極材料を用いて、以下のとおりニッケル金属水素化物電池を作製した。
(Nickel metal hydride battery)
Using the negative electrode materials of Example 1, Example 3, and Comparative Example 1, nickel metal hydride batteries were produced as follows.

 <正極>
 正極活物質として水酸化ニッケル粉末を83.3質量部、導電助剤としてコバルト粉末を5質量部、結着剤としてアクリル系樹脂エマルション(ジョンクリルPDX7341、BASF社)を固形分として5質量部、結着剤としてカルボキシメチルセルロースを0.7質量部、正極添加剤としてYを1質量部、及び、適量のイオン交換水を混合して、スラリーを製造した。正極用集電体として厚み10μmのニッケル箔を準備した。このニッケル箔の表面に、ドクターブレードを用いて、上記スラリーを膜状に塗布した。スラリーが塗布されたニッケル箔を乾燥して水を除去し、その後、ニッケル箔をプレスし、接合物を得た。得られた接合物を乾燥機で70℃、1時間加熱乾燥して、集電体上に正極活物質層が形成された正極を製造した。
<Positive electrode>
83.3 parts by mass of nickel hydroxide powder as a positive electrode active material, 5 parts by mass of cobalt powder as a conductive additive, 5 parts by mass of an acrylic resin emulsion (Johncrill PDX7341, BASF) as a binder, A slurry was prepared by mixing 0.7 parts by mass of carboxymethyl cellulose as a binder, 1 part by mass of Y 2 O 3 as a positive electrode additive, and an appropriate amount of ion-exchanged water. A nickel foil having a thickness of 10 μm was prepared as a positive electrode current collector. The slurry was applied in a film form on the surface of the nickel foil using a doctor blade. The nickel foil coated with the slurry was dried to remove water, and then the nickel foil was pressed to obtain a bonded product. The obtained joined product was dried by heating at 70 ° C. for 1 hour with a dryer to produce a positive electrode in which a positive electrode active material layer was formed on a current collector.

 <負極>
 負極材料として、実施例1、実施例3又は比較例1の負極材料を用いた。負極材料を96.9質量部、導電助剤としてカーボンブラックを0.4質量部、結着剤としてアクリル系樹脂エマルション(ジョンクリルPDX7341、BASF社)を固形分として2質量部、結着剤としてカルボキシメチルセルロースを0.7質量部、及び、適量のイオン交換水を混合して、スラリーを製造した。負極用集電体として厚み10μmのニッケル箔を準備した。このニッケル箔の表面に、ドクターブレードを用いて、上記スラリーを膜状に塗布した。スラリーが塗布されたニッケル箔を乾燥して水を除去し、その後、ニッケル箔をプレスし、接合物を得た。得られた接合物を乾燥機で70℃、1時間加熱乾燥して、集電体上に負極活物質層が形成された負極を製造した。
<Negative electrode>
As the negative electrode material, the negative electrode material of Example 1, Example 3, or Comparative Example 1 was used. 96.9 parts by mass of the negative electrode material, 0.4 parts by mass of carbon black as the conductive auxiliary agent, 2 parts by mass of the acrylic resin emulsion (Johncrill PDX7341, BASF) as the binder, and as the binder A slurry was produced by mixing 0.7 part by mass of carboxymethyl cellulose and an appropriate amount of ion-exchanged water. A nickel foil having a thickness of 10 μm was prepared as a negative electrode current collector. The slurry was applied in a film form on the surface of the nickel foil using a doctor blade. The nickel foil coated with the slurry was dried to remove water, and then the nickel foil was pressed to obtain a bonded product. The obtained joined product was dried by heating at 70 ° C. for 1 hour with a dryer to produce a negative electrode having a negative electrode active material layer formed on a current collector.

 <電解液>
 水酸化カリウムの濃度が5.5mol/Lであり、水酸化ナトリウムの濃度が0.5mol/Lであり、かつ、水酸化リチウムの濃度が0.5mol/Lである水溶液を調製し、電解液とした。
 <電池>
 セパレータとして、スルホン化処理が施された厚さ120μmのポリプロピレン繊維製不織布を準備した。正極と負極とでセパレータを挟持し、極板群とした。樹脂製の筐体に、極板群を配置して、更に電解液を注入し、筐体を密閉することで、実施例1、実施例3、及び比較例1の各ニッケル金属水素化物電池を製造した。
<Electrolyte>
An aqueous solution in which the concentration of potassium hydroxide is 5.5 mol / L, the concentration of sodium hydroxide is 0.5 mol / L, and the concentration of lithium hydroxide is 0.5 mol / L is prepared. It was.
<Battery>
A 120 μm-thick polypropylene fiber nonwoven fabric subjected to sulfonation treatment was prepared as a separator. A separator was sandwiched between the positive electrode and the negative electrode to form an electrode plate group. Each of the nickel metal hydride batteries of Example 1, Example 3, and Comparative Example 1 was prepared by placing an electrode plate group in a resin case, injecting an electrolyte, and sealing the case. Manufactured.

 (評価4 電池特性)
 実施例1、実施例3及び比較例1の各ニッケル金属水素化物電池について、電圧1.39VとなるSOC60%の状態に調整し、25℃で電圧0.8Vまで一定出力にて放電させ、このときの放電時間を測定した。当該測定は0℃でも行った。得られた結果から、各ニッケル金属水素化物電池につき、1.39Vから0.8Vまでの放電時間が10秒間となる一定出力(W)を算出した。更に、各温度における比較例1のニッケル金属水素化物電池における当該一定出力値をそれぞれ100%とし、該当温度における実施例1及び実施例3の当該一定出力値の百分率を算出した。以上の結果を表2に示す。
 なお、SOCとはState of Chargeの略称であり、SOC60%とは正極活物質の理論容量をSOC100%とした場合の60%に相当する充電容量である。
(Evaluation 4 Battery characteristics)
About each nickel metal hydride battery of Example 1, Example 3, and Comparative Example 1, it adjusted to the state of SOC60% used as voltage 1.39V, it was made to discharge by constant output to voltage 0.8V at 25 degreeC, and this The discharge time was measured. The measurement was also performed at 0 ° C. From the obtained results, a constant output (W) at which the discharge time from 1.39 V to 0.8 V was 10 seconds was calculated for each nickel metal hydride battery. Furthermore, the said fixed output value in the nickel metal hydride battery of the comparative example 1 in each temperature was made into 100%, respectively, and the percentage of the said fixed output value of Example 1 and Example 3 in the applicable temperature was computed. The results are shown in Table 2.
Note that SOC is an abbreviation for State of Charge, and SOC 60% is a charge capacity corresponding to 60% when the theoretical capacity of the positive electrode active material is SOC 100%.

Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002

 表2に示すように、メッキ金属を錯体化して得られたメッキ層を有する実施例1及び実施例3のニッケル金属水素化物電池は、メッキ層のない比較例1のニッケル金属水素化物電池に比べて25℃及び0℃の出力値に優れる。特に実施例1及び実施例3のニッケル金属水素化物電池によると、0℃という低温下においても大きな出力が得られる。これは、メッキ層により負極の導電性が向上したことに起因すると考えられる。
 また、メッキ層形成工程において有機化合物系分散剤を用いた実施例3と有機化合物系分散剤を用いなかった実施例1とを比較すると、実施例3のニッケル金属水素化物電池は実施例1のニッケル金属水素化物電池に比べて更に出力値に優れる。この結果から、メッキ層を形成する際に有機化合物系分散剤を用いることで、ニッケル金属水素化物電池の出力特性を更に向上させ得る負極材料が得られることがわかる。なお、図3及び図4に示されるように有機化合物系分散剤の有無によりメッキ層の表面形状に違いが生じているため、上記の出力特性の違いもまたメッキ層の表面形状に関係していると考えることができる。つまり、粒子の集合体からなるメッキ層は、出力特性の向上に寄与すると考えられる。
As shown in Table 2, the nickel metal hydride batteries of Example 1 and Example 3 having a plating layer obtained by complexing a plating metal are compared with the nickel metal hydride battery of Comparative Example 1 having no plating layer. Excellent output value at 25 ° C and 0 ° C. In particular, according to the nickel metal hydride batteries of Example 1 and Example 3, a large output can be obtained even at a low temperature of 0 ° C. This is considered to be due to the improved conductivity of the negative electrode by the plating layer.
Further, comparing Example 3 using an organic compound dispersant in Example 1 with no organic compound dispersant in the plating layer forming step, the nickel metal hydride battery of Example 3 is the same as that of Example 1. Compared to nickel metal hydride batteries, the output value is even better. From this result, it can be seen that a negative electrode material capable of further improving the output characteristics of the nickel metal hydride battery can be obtained by using an organic compound dispersant when forming the plating layer. As shown in FIG. 3 and FIG. 4, since the surface shape of the plating layer varies depending on the presence or absence of the organic compound dispersant, the difference in the output characteristics is also related to the surface shape of the plating layer. Can be considered. That is, it is considered that the plating layer made of an aggregate of particles contributes to improvement of output characteristics.

 (評価4-A 電池特性)
 実施例1及び比較例1の各ニッケル金属水素化物電池について、40℃、2C、SOC 0%~SOC 150%の充放電を37サイクル行った。
 各サイクルにおいて、(SOC 0%のときの放電容量)/(SOC 150%のときの充電容量)×100を算出し、容量利用率(%)とした。評価4-Aの結果を図6に示す。
(Evaluation 4-A Battery characteristics)
Each nickel metal hydride battery of Example 1 and Comparative Example 1 was charged and discharged at 40 ° C., 2 C, SOC 0% to SOC 150% for 37 cycles.
In each cycle, (discharge capacity when SOC was 0%) / (charge capacity when SOC was 150%) × 100 was calculated and used as capacity utilization rate (%). The result of Evaluation 4-A is shown in FIG.

 図6に示すように、1サイクル目から37サイクル目までの実施例1のニッケル金属水素化物電池の容量利用率にはほぼ変化がなかったのに対し、比較例1のニッケル金属水素化物電池の容量利用率は20サイクル経過後から著しく低下した。この結果から、メッキ層の存在により、ニッケル金属水素化物電池における容量利用率が大きく向上すること、つまり、メッキ層を有する本発明の負極材料は、ニッケル金属水素化物電池の耐久性向上に寄与することがわかる。 As shown in FIG. 6, the capacity utilization of the nickel metal hydride battery of Example 1 from the first cycle to the 37th cycle was almost unchanged, whereas the nickel metal hydride battery of Comparative Example 1 The capacity utilization rate dropped significantly after 20 cycles. From this result, the capacity utilization rate in the nickel metal hydride battery is greatly improved by the presence of the plating layer, that is, the negative electrode material of the present invention having the plating layer contributes to the improvement of the durability of the nickel metal hydride battery. I understand that.

 (参考例1)
 加熱工程における加熱温度が200℃であること以外は比較例2と同様にして参考例1の負極材料を得た。
(Reference Example 1)
A negative electrode material of Reference Example 1 was obtained in the same manner as Comparative Example 2 except that the heating temperature in the heating step was 200 ° C.

 (参考例2)
 加熱工程における加熱温度が350℃であること以外は参考例1と同様にして参考例2の負極材料を得た。
(Reference Example 2)
A negative electrode material of Reference Example 2 was obtained in the same manner as Reference Example 1 except that the heating temperature in the heating step was 350 ° C.

 (参考例3)
 加熱工程における加熱温度が450℃であること以外は参考例1と同様にして参考例3の負極材料を得た。
(Reference Example 3)
A negative electrode material of Reference Example 3 was obtained in the same manner as Reference Example 1 except that the heating temperature in the heating step was 450 ° C.

 (参考例4)
 加熱工程における加熱温度が600℃であること以外は参考例1と同様にして参考例4の負極材料を得た。
(Reference Example 4)
A negative electrode material of Reference Example 4 was obtained in the same manner as Reference Example 1 except that the heating temperature in the heating step was 600 ° C.

 (評価5 導電性)
 評価1と同様に、参考例1~参考例4の負極材料の粉体抵抗を測定した。結果を表3に示す。
(Evaluation 5 conductivity)
Similar to Evaluation 1, the powder resistance of the negative electrode materials of Reference Examples 1 to 4 was measured. The results are shown in Table 3.

 (評価6 電池特性)
 参考例1~参考例4の負極材料を用い、実施例1のニッケル金属水素化物電池と同様に、参考例1~参考例4のニッケル金属水素化物電池を得た。この参考例1~参考例4のニッケル金属水素化物電池と、比較例1のニッケル金属水素化物電池とを用い、各ニッケル金属水素化物電池の電池特性を評価した。
 参考例1~参考例4及び比較例1の各ニッケル金属水素化物電池について、25℃、0.5Cで電圧1.5Vまで充電し、その後10Cで0.8Vまで放電した。このときの放電容量を10C放電容量とした。各ニッケル金属水素化物電池の理論容量と、各ニッケル金属水素化物電池の10C放電容量とを基に、以下の式を用いて、各ニッケル金属水素化物電池の10C放電効率(%)を算出した。
 10C放電効率(%)=100×(10C放電容量)/(理論容量)
(Evaluation 6: Battery characteristics)
Using the negative electrode materials of Reference Examples 1 to 4, nickel metal hydride batteries of Reference Examples 1 to 4 were obtained in the same manner as the nickel metal hydride battery of Example 1. Using the nickel metal hydride batteries of Reference Examples 1 to 4 and the nickel metal hydride battery of Comparative Example 1, the battery characteristics of each nickel metal hydride battery were evaluated.
The nickel metal hydride batteries of Reference Examples 1 to 4 and Comparative Example 1 were charged to a voltage of 1.5 V at 25 ° C. and 0.5 C, and then discharged to 0.8 V at 10 C. The discharge capacity at this time was 10 C discharge capacity. Based on the theoretical capacity of each nickel metal hydride battery and the 10C discharge capacity of each nickel metal hydride battery, the 10C discharge efficiency (%) of each nickel metal hydride battery was calculated using the following formula.
10C discharge efficiency (%) = 100 × (10C discharge capacity) / (theoretical capacity)

 また、参考例1~参考例4及び比較例1の各ニッケル金属水素化物電池について、上記の試験後に、25℃、1Cで電圧1.5V-0.8Vの充放電サイクルを繰り返し、サイクル寿命を測定した。各々のニッケル金属水素化物電池につき、放電容量が0となった時点で充放電サイクルを終了した。充放電サイクル終了時におけるサイクル数を各ニッケル金属水素化物電池のサイクル寿命とした。
 各結果を表3に示す。
For each of the nickel metal hydride batteries of Reference Examples 1 to 4 and Comparative Example 1, after the above test, a charge / discharge cycle of voltage 1.5V-0.8V at 25 ° C. and 1C was repeated to increase the cycle life. It was measured. For each nickel metal hydride battery, the charge / discharge cycle was terminated when the discharge capacity reached zero. The number of cycles at the end of the charge / discharge cycle was defined as the cycle life of each nickel metal hydride battery.
Table 3 shows the results.

Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003

 表3に示すように、加熱工程における加熱温度がそれぞれ350℃、450℃、600℃である参考例2~参考例4の負極材料の粉体抵抗は、加熱工程における加熱温度が200℃である参考例1の負極材料の粉体抵抗に比べて、何れも低かった。この結果から、加熱工程において200℃を超える温度で負極材料を加熱することで、負極材料の導電性を向上させ得ることが示唆される。また、加熱温度350℃である参考例2の負極材料の粉体抵抗は参考例3及び参考例4の負極材料の粉体抵抗よりも低いことから、負極材料の加熱温度は350℃付近であるのが好ましいことが示唆される。
 また参考例2のニッケル金属水素化物電池は、10C放電効率及びサイクル寿命についても比較例1、参考例3及び参考例4の電池よりも優れていた。このことから、好適な温度で加熱工程を行った負極材料により、ニッケル金属水素化物電池に優れた電池特性を付与できることが示唆される。
As shown in Table 3, the powder resistances of the negative electrode materials of Reference Examples 2 to 4 in which the heating temperatures in the heating process are 350 ° C., 450 ° C., and 600 ° C., respectively, are 200 ° C. in the heating process. All were low compared with the powder resistance of the negative electrode material of the reference example 1. This result suggests that the conductivity of the negative electrode material can be improved by heating the negative electrode material at a temperature exceeding 200 ° C. in the heating step. Moreover, since the powder resistance of the negative electrode material of Reference Example 2 having a heating temperature of 350 ° C. is lower than the powder resistance of the negative electrode materials of Reference Example 3 and Reference Example 4, the heating temperature of the negative electrode material is around 350 ° C. It is suggested that this is preferable.
The nickel metal hydride battery of Reference Example 2 was also superior to the batteries of Comparative Example 1, Reference Example 3 and Reference Example 4 in terms of 10C discharge efficiency and cycle life. This suggests that excellent battery characteristics can be imparted to the nickel metal hydride battery by the negative electrode material subjected to the heating process at a suitable temperature.

 (評価7 X線回折)
 CuKα線を用いる粉末X線回折装置にて、実施例2の負極材料及び比較例1の負極材料のX線回折を測定した。実施例2の負極材料のX線回折チャートを図7に示し、比較例1の負極材料のX線回折チャートを図8に示す。
 図7に示す実施例2の負極材料のX線回折チャートでは、図8に示す比較例1の負極材料のX線回折チャートに比べて、44.6°付近のピーク及び51.879°付近のピークが強くなっている。44.6°付近のピークはNiの(111)結晶面に由来し、51.879°付近のピークはNiの(200)結晶面に由来すると考えられる。実施例2の負極材料のX線回折チャートにこれらの強いピークが観察されることから、実施例2の負極材料の表面には結晶性のNi金属が存在することが裏付けられる。
(Evaluation 7 X-ray diffraction)
The X-ray diffraction of the negative electrode material of Example 2 and the negative electrode material of Comparative Example 1 was measured with a powder X-ray diffractometer using CuKα rays. An X-ray diffraction chart of the negative electrode material of Example 2 is shown in FIG. 7, and an X-ray diffraction chart of the negative electrode material of Comparative Example 1 is shown in FIG.
The X-ray diffraction chart of the negative electrode material of Example 2 shown in FIG. 7 has a peak around 44.6 ° and a peak around 51.879 ° compared to the X-ray diffraction chart of the negative electrode material of Comparative Example 1 shown in FIG. The peak is getting stronger. It is considered that the peak near 44.6 ° is derived from the (111) crystal plane of Ni, and the peak near 51.879 ° is derived from the (200) crystal plane of Ni. Since these strong peaks are observed in the X-ray diffraction chart of the negative electrode material of Example 2, it is confirmed that crystalline Ni metal exists on the surface of the negative electrode material of Example 2.

 (実施例4)
 加熱工程において400℃で負極材料を加熱したこと以外は、実施例3の製造方法と同じ方法で、実施例4の負極材料を得た。つまり実施例4の製造方法は、実施例3の製造方法と同様に、メッキ工程後における濾過の際に負極材料の凝集が生じなかったため、乾燥後の負極材料を大気中で解砕する工程を有さない。
Example 4
A negative electrode material of Example 4 was obtained in the same manner as the production method of Example 3, except that the negative electrode material was heated at 400 ° C. in the heating step. That is, in the manufacturing method of Example 4, as in the manufacturing method of Example 3, since the aggregation of the negative electrode material did not occur during the filtration after the plating process, the step of crushing the dried negative electrode material in the atmosphere was performed. I don't have it.

 (実施例1-A)
 実施例1と同様の方法で実施例1-Aの負極材料を得た。実施例1-Aの製造方法は、実施例1の製造方法と同様に、メッキ工程後、乾燥後の負極材料を、乳鉢を用いて大気中で解砕する工程を有する。
Example 1-A
A negative electrode material of Example 1-A was obtained in the same manner as in Example 1. Similar to the manufacturing method of Example 1, the manufacturing method of Example 1-A includes a step of crushing the dried negative electrode material in the air using a mortar after the plating step.

 (評価8 表面分析)
 実施例4の負極材料及び実施例1-Aの負極材料につき、評価2 表面分析と同様に、XPSを用いて表面分析を行った。XPSにより測定された実施例4の負極材料および実施例1-Aの負極材料の表面分析結果を図9及び図10に示す。
(Evaluation 8 Surface analysis)
The negative electrode material of Example 4 and the negative electrode material of Example 1-A were subjected to surface analysis using XPS in the same manner as in Evaluation 2 Surface Analysis. 9 and 10 show the surface analysis results of the negative electrode material of Example 4 and the negative electrode material of Example 1-A measured by XPS.

 図9及び図10に示すように、実施例4の負極材料のXPSスペクトルにおいては実施例1-Aの負極材料のXPSスペクトルに比べて、856eVのピーク強度に対する853eVのピーク強度の比が大きい。既述したように856eVのピークはニッケル水酸化物に由来し、853eVのピークは金属ニッケルに由来すると考えられる。したがってこの結果から、実施例4の負極材料の表面においては、実施例1-Aの負極材料の表面に比べて、ニッケル水酸化物に対する金属ニッケルの割合が多いことが示唆される。実施例1-Aの製造方法ではメッキ後加熱工程前の負極材料を大気中で解砕したことで、負極材料が大気曝露されて負極材料表面の酸化が生じたと考えられる。これに対して、実施例4の製造方法では上記した大気中での解砕を行わなかったために、負極材料の大気曝露はなく、負極材料表面の酸化を抑制できたと考えられる。 As shown in FIGS. 9 and 10, in the XPS spectrum of the negative electrode material of Example 4, the ratio of the peak intensity of 853 eV to the peak intensity of 856 eV is larger than the XPS spectrum of the negative electrode material of Example 1-A. As described above, the peak at 856 eV is considered to be derived from nickel hydroxide, and the peak at 853 eV is considered to be derived from metallic nickel. Therefore, this result suggests that the ratio of metallic nickel to nickel hydroxide is higher on the surface of the negative electrode material of Example 4 than on the surface of the negative electrode material of Example 1-A. In the manufacturing method of Example 1-A, it is considered that the negative electrode material was crushed in the air after the plating and before the heating step, so that the negative electrode material was exposed to the air and the surface of the negative electrode material was oxidized. On the other hand, in the manufacturing method of Example 4, since the above-mentioned crushing in the atmosphere was not performed, it was considered that the negative electrode material was not exposed to the atmosphere and the oxidation of the negative electrode material surface could be suppressed.

 (評価9 導電性)
 評価1及び評価5と同様に、実施例4及び実施例1-Aの負極材料の粉体抵抗を測定した。結果を表4に示す。
(Evaluation 9 conductivity)
Similar to Evaluation 1 and Evaluation 5, the powder resistance of the negative electrode materials of Example 4 and Example 1-A was measured. The results are shown in Table 4.

Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004

 表4に示すように、有機化合物系分散剤の存在下でメッキ工程を行い濾過後の大気曝露を行わずに得られた実施例4の負極材料は、有機化合物系分散剤のない状態でメッキ工程を行い濾過後に大気曝露して得られた実施例1-Aの負極材料に比べて粉体抵抗が著しく低下し導電性に優れていた。これは、既述したように実施例4の負極材料の表面に金属ニッケルが多く存在することによるものと考えられる。 As shown in Table 4, the negative electrode material of Example 4 obtained by performing the plating step in the presence of the organic compound dispersant and without exposing to air after filtration was plated in the absence of the organic compound dispersant. Compared with the negative electrode material of Example 1-A obtained by performing the process and exposing to air after filtration, the powder resistance was remarkably reduced and the conductivity was excellent. This is presumably due to the presence of a large amount of metallic nickel on the surface of the negative electrode material of Example 4 as described above.

 (実施例5)
 メッキ後の真空乾燥及び大気中での解砕を省いたこと、加熱工程における加熱温度が300℃であったこと、及び加熱工程前に乾燥工程を行ったこと以外は、実施例1と同様の方法で、実施例5の負極材料を得た。
 具体的には、実施例5においては、メッキ工程において濾別及び洗浄した負極材料をそのまま加熱炉に入れ、加熱炉中にて負極材料を真空下、60℃で5時間予備加熱して水分等の揮発成分を蒸発させる乾燥工程を行った後に、実施例1と同様にアルゴン雰囲気下にて300℃に昇温して加熱工程を行った。
 実施例5では、実質的に、加熱炉中で真空乾燥を行ったともいえる。
(Example 5)
Except that vacuum drying after plating and pulverization in the atmosphere were omitted, that the heating temperature in the heating step was 300 ° C., and that the drying step was performed before the heating step, the same as in Example 1. The negative electrode material of Example 5 was obtained by the method.
Specifically, in Example 5, the negative electrode material filtered and washed in the plating step is directly put into a heating furnace, and the negative electrode material is preheated in a heating furnace under vacuum at 60 ° C. for 5 hours to obtain moisture, etc. After performing the drying process which evaporates the volatile component of this, it heated up to 300 degreeC in argon atmosphere similarly to Example 1, and the heating process was performed.
In Example 5, it can be said that substantially vacuum drying was performed in the heating furnace.

 (評価10 表面分析)
 実施例5の負極材料について上記の評価2と同様に、XPSを用いた表面分析を行った。評価10の結果を、評価2における実施例1の結果と並べて、図11に示す。
(Evaluation 10 Surface analysis)
The negative electrode material of Example 5 was subjected to surface analysis using XPS in the same manner as in Evaluation 2 above. The result of Evaluation 10 is shown in FIG. 11 along with the result of Example 1 in Evaluation 2.

 (評価11 導電性)
 実施例5の負極材料につき、上記の評価1と同様に、粉体抵抗を測定した。結果を表5に示す。
(Evaluation 11 Conductivity)
For the negative electrode material of Example 5, the powder resistance was measured in the same manner as in Evaluation 1 above. The results are shown in Table 5.

Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005

 図11に示すように、ニッケル水酸化物に由来する856eVのピーク強度に対する金属ニッケルに由来する853eVのピーク強度の比は、実施例5の負極材料のXPSスペクトルにおいて、実施例1の負極材料のXPSスペクトルよりも遙かに大きかった。この結果から、実施例5の負極材料の表面においては、実施例1の負極材料の表面に比べて、ニッケル水酸化物に対する金属ニッケルの割合が更に高いことが示唆される。実施例5の製造方法ではメッキ後加熱工程前の負極材料の大気中での解砕を省いたことで、負極材料表面の酸化が抑制されたと考えられる。
 また、表5に示すように、大気曝露を極力避けた実施例5の負極材料は、濾過後に大気曝露しつつ解砕を行った実施例1の負極材料に比べて、粉体抵抗が低下した。この結果から、メッキ後加熱工程前の負極材料の大気中での解砕を省き、負極材料の大気曝露を極力避けることで、表面に金属ニッケルが多く存在し導電性に優れる負極材料が得られるといえる。
As shown in FIG. 11, the ratio of the peak intensity of 853 eV derived from metallic nickel to the peak intensity of 856 eV derived from nickel hydroxide is the same as that of the negative electrode material of Example 1 in the XPS spectrum of the negative electrode material of Example 5. It was much larger than the XPS spectrum. This result suggests that the ratio of metallic nickel to nickel hydroxide is higher on the surface of the negative electrode material of Example 5 than on the surface of the negative electrode material of Example 1. In the manufacturing method of Example 5, it is considered that the oxidation of the negative electrode material surface was suppressed by omitting the disintegration of the negative electrode material in the air before the heating step after plating.
In addition, as shown in Table 5, the negative electrode material of Example 5 that avoided atmospheric exposure as much as possible had lower powder resistance than the negative electrode material of Example 1 that was crushed while being exposed to the air after filtration. . From this result, it is possible to obtain a negative electrode material having a large amount of metallic nickel on the surface and excellent in conductivity by eliminating the disintegration of the negative electrode material in the air after the heating process after plating and avoiding exposure of the negative electrode material to the atmosphere as much as possible. It can be said.

 (実施例6)
 加熱工程後に低酸素ガス曝露工程を行ったこと以外は、実施例1と同様の方法で、実施例6の負極材料を得た。
 具体的には、加熱工程後室温にまで自然冷却した加熱炉中に、アルゴンガスと酸素ガスとを99:1の質量比で混合した低酸素ガスを15分間流通させた。当該低酸素ガス曝露工程においては、加熱工程後の負極材料を低酸素ガスに曝露することで、負極材料を穏やかな条件で酸化した。なお、実施例6の負極材料の製造方法においては、実施例1と同様に、メッキ後加熱工程前の負極材料を、大気中で解砕した。
(Example 6)
A negative electrode material of Example 6 was obtained in the same manner as in Example 1 except that the low oxygen gas exposure process was performed after the heating process.
Specifically, low oxygen gas in which argon gas and oxygen gas were mixed at a mass ratio of 99: 1 was circulated for 15 minutes in a heating furnace that was naturally cooled to room temperature after the heating step. In the low oxygen gas exposure step, the negative electrode material after the heating step was exposed to low oxygen gas to oxidize the negative electrode material under mild conditions. In addition, in the manufacturing method of the negative electrode material of Example 6, similarly to Example 1, the negative electrode material before plating and before the heating step was crushed in the atmosphere.

 (評価12 表面分析)
 実施例6の負極材料について上記の評価2と同様に、XPSを用いた表面分析を行った。評価12の結果を図12に示す。
(Evaluation 12 Surface analysis)
The negative electrode material of Example 6 was subjected to surface analysis using XPS in the same manner as in Evaluation 2 above. The result of evaluation 12 is shown in FIG.

 (評価13 導電性)
 実施例6の負極材料につき、上記の評価1と同様に、粉体抵抗を測定した。結果を表6に示す。
(Evaluation 13 Conductivity)
For the negative electrode material of Example 6, the powder resistance was measured in the same manner as in Evaluation 1 above. The results are shown in Table 6.

Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006

 図12に示すように、ニッケル水酸化物に由来する856eVのピーク強度に対する金属ニッケルに由来する853eVのピーク強度の比は、実施例6の負極材料のXPSスペクトルにおいて、実施例1の負極材料のXPSスペクトルよりも遙かに大きかった。この結果から、実施例6の負極材料の表面においては、実施例1の負極材料の表面に比べて、ニッケル水酸化物に対する金属ニッケルの割合が更に多いことが示唆される。実施例6の製造方法ではメッキ後加熱工程前に負極材料を大気中で解砕したが、その後、低酸素ガス曝露工程を行ったことで、負極材料表面の酸化が抑制されたと考えられる。
 また、表6に示すように、加熱工程後に低酸素ガス曝露工程を行った実施例6の負極材料は、濾過後に大気曝露しつつ解砕を行いかつ低酸素ガス曝露工程を行わなかった実施例1の負極材料に比べて粉体抵抗が低下した。それだけでなく、実施例6の負極材料は、大気曝露を極力避けかつ低酸素ガス曝露工程を行わなかった実施例5の負極材料に比べても、粉体抵抗が低下した。
 この結果から、加熱後に低酸素ガス曝露工程を行うことによって、負極材料の導電性をより向上させ得ることがわかる。
As shown in FIG. 12, the ratio of the peak intensity of 853 eV derived from metallic nickel to the peak intensity of 856 eV derived from nickel hydroxide is the same as that of the negative electrode material of Example 1 in the XPS spectrum of the negative electrode material of Example 6. It was much larger than the XPS spectrum. This result suggests that the ratio of metallic nickel to nickel hydroxide is higher on the surface of the negative electrode material of Example 6 than on the surface of the negative electrode material of Example 1. In the manufacturing method of Example 6, the negative electrode material was crushed in the air before the post-plating heating step, but it was considered that the oxidation of the negative electrode material surface was suppressed by performing the low oxygen gas exposure step thereafter.
In addition, as shown in Table 6, the negative electrode material of Example 6 that was subjected to the low oxygen gas exposure step after the heating step was crushed while being exposed to the air after filtration, and the low oxygen gas exposure step was not performed Compared with the negative electrode material of No. 1, the powder resistance was lowered. In addition, the negative electrode material of Example 6 had a lower powder resistance than the negative electrode material of Example 5 that avoided exposure to the atmosphere as much as possible and did not perform the low oxygen gas exposure step.
From this result, it can be seen that the conductivity of the negative electrode material can be further improved by performing the low oxygen gas exposure step after heating.

 (実施例7)
 加熱工程における加熱温度以外は実施例3と同様の方法で、実施例7-1~実施例7-4の負極材料を得た。
 詳しくは、実施例7-1、実施例7-2、実施例7-3における当該加熱温度は、各々、300℃、250℃、200℃であった。なお実施例7-4においては加熱工程を行わなかった。
(Example 7)
Except for the heating temperature in the heating step, negative electrode materials of Examples 7-1 to 7-4 were obtained in the same manner as in Example 3.
Specifically, the heating temperatures in Example 7-1, Example 7-2, and Example 7-3 were 300 ° C., 250 ° C., and 200 ° C., respectively. In Example 7-4, the heating step was not performed.

 (評価14 導電性)
 実施例7-1~実施例7-4、及び実施例3の負極材料につき、上記の評価1と同様に、粉体抵抗を測定した。結果を表7に示す。
(Evaluation 14 Conductivity)
For the negative electrode materials of Examples 7-1 to 7-4 and Example 3, the powder resistance was measured in the same manner as in Evaluation 1 above. The results are shown in Table 7.

Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000007

 表7に示すように、加熱温度が200℃であった実施例7-3の負極材料の粉体抵抗は、加熱工程を行わなかった実施例7-4の負極材料の粉体抵抗と同程度であり、加熱温度250℃~350℃の範囲では、加熱温度が高くなるのに伴って粉体抵抗が低下した。この結果から、加熱工程を行う場合、加熱温度は200℃を超える温度であるのが好ましく、250℃以上であるのがより好ましく、300℃以上であるのが更に好ましい、といえる。 As shown in Table 7, the powder resistance of the negative electrode material of Example 7-3 in which the heating temperature was 200 ° C. was comparable to the powder resistance of the negative electrode material of Example 7-4 that was not subjected to the heating step. In the heating temperature range of 250 ° C. to 350 ° C., the powder resistance decreased as the heating temperature increased. From this result, when performing a heating process, it can be said that it is preferable that heating temperature is a temperature exceeding 200 degreeC, it is more preferable that it is 250 degreeC or more, and it is still more preferable that it is 300 degreeC or more.

 (実施例8)
 メッキ工程において、水素吸蔵合金粒子100質量部に対するニッケルの質量とコバルトの質量との和が1質量部になるように、水素吸蔵合金粒子及びメッキ溶液の量を調整したこと以外は、実施例3と同様の方法で、実施例8の負極材料を得た。
 (実施例9)
 水素吸蔵合金粒子100質量部に対するニッケルの質量とコバルトの質量との和を0.5質量部としたこと、及び、加熱工程における加熱温度を300℃としたこと以外は、実施例8と同様の方法で、実施例9の負極材料を得た。
(Example 8)
Example 3 except that in the plating step, the amounts of the hydrogen storage alloy particles and the plating solution were adjusted so that the sum of the mass of nickel and the mass of cobalt relative to 100 parts by mass of the hydrogen storage alloy particles was 1 part by mass. A negative electrode material of Example 8 was obtained in the same manner as described above.
Example 9
Example 8 except that the sum of the mass of nickel and the mass of cobalt with respect to 100 parts by mass of the hydrogen storage alloy particles was 0.5 parts by mass, and that the heating temperature in the heating step was 300 ° C. The negative electrode material of Example 9 was obtained by the method.

 (評価15 SEM観察)
 SEMを用いて実施例8及び実施例9の負極材料の断面を観察した。SEM像を基に、実施例8及び実施例9の負極材料におけるメッキの厚さを測定した。結果を表8に示す。
 (評価16 電池特性)
 実施例8及び実施例9の負極材料を用い、実施例1のニッケル金属水素化物電池と同様に、実施例8、実施例9のニッケル金属水素化物電池を得た。当該実施例8、実施例9のニッケル金属水素化物電池及び比較例1のニッケル金属水素化物電池について、上記の評価4と同様に、電池特性を評価した。結果を表8に示す。
(Evaluation 15 SEM observation)
The cross section of the negative electrode material of Example 8 and Example 9 was observed using SEM. Based on the SEM images, the plating thicknesses of the negative electrode materials of Examples 8 and 9 were measured. The results are shown in Table 8.
(Evaluation 16 Battery characteristics)
Using the negative electrode material of Example 8 and Example 9, nickel metal hydride batteries of Examples 8 and 9 were obtained in the same manner as the nickel metal hydride battery of Example 1. About the nickel metal hydride battery of the said Example 8 and Example 9, and the nickel metal hydride battery of the comparative example 1, battery characteristics were evaluated similarly to said evaluation 4. The results are shown in Table 8.

 (評価17 DC-IR)
 比較例1、実施例8及び実施例9のニッケル金属水素化物電池を用いて、以下の方法で内部直流抵抗(DC-IR)を測定した。
 比較例1、実施例8及び実施例9のニッケル金属水素化物電池について、25℃で、0.33Cレートで1Vまで放電した後、0.33CレートでSOC61%まで充電し、更に、0.1CでSOC60%まで放電した。その後、更に1Cレートで10秒間放電し、この1Cレートによる10秒間の放電の際の電圧の変化量を測定した。
(Evaluation 17 DC-IR)
Using the nickel metal hydride batteries of Comparative Example 1, Example 8 and Example 9, the internal direct current resistance (DC-IR) was measured by the following method.
The nickel metal hydride batteries of Comparative Example 1, Example 8 and Example 9 were discharged at 25 ° C. to 1 V at a 0.33 C rate, then charged to SOC 61% at a 0.33 C rate, and further 0.1 C Was discharged to SOC 60%. Thereafter, the battery was further discharged at a 1C rate for 10 seconds, and the amount of change in voltage during discharge for 10 seconds at the 1C rate was measured.

 オームの法則により、電圧変化量を電流値で除して、抵抗値(DC-IR)を算出した。同様の方法で0.1秒間の放電の際の各電池の電圧の変化量も測定し、25℃、SOC60%、0.1秒間でのDC-IRとした。そして、実施例8及び実施例9のニッケル金属水素化物電池における各DC-IRにつき、比較例1のニッケル金属水素化物電池における当該DC-IRを100%としたときの百分率を算出した。
 結果を表8に示す。
The resistance value (DC-IR) was calculated by dividing the voltage change amount by the current value according to Ohm's law. The amount of change in voltage of each battery during 0.1 second discharge was also measured in the same manner, and the result was DC-IR at 25 ° C., SOC 60%, 0.1 second. Then, for each DC-IR in the nickel metal hydride batteries of Example 8 and Example 9, the percentage when the DC-IR in the nickel metal hydride battery of Comparative Example 1 was taken as 100% was calculated.
The results are shown in Table 8.

Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000008

 表8に示すように、メッキ層を有する実施例8及び実施例9の負極材料は、メッキ層を有さない比較例1の負極材料に比べて、ニッケル金属水素化物電池の内部抵抗低減及び出力向上に大きく寄与する。
 また、実施例8及び実施例9を比較すると、メッキ層の厚さを薄くすることで、ニッケル金属水素化物電池の内部抵抗をより低減でき、かつ、ニッケル金属水素化物電池の出力をより向上できると推測される。
As shown in Table 8, the negative electrode material of Example 8 and Example 9 having a plating layer is less in internal resistance and the output of the nickel metal hydride battery than the negative electrode material of Comparative Example 1 having no plating layer. Greatly contributes to improvement.
In addition, when Example 8 and Example 9 are compared, by reducing the thickness of the plating layer, the internal resistance of the nickel metal hydride battery can be further reduced, and the output of the nickel metal hydride battery can be further improved. It is guessed.

 メッキ層の厚さは、メッキ工程の反応系における成膜レートの影響を受けると考えられる。当該成膜レートは、例えば、メッキ工程の反応系におけるメッキ溶液の濃度、具体的には、当該反応系におけるニッケルの質量とコバルトの質量との和を水素吸蔵合金粒子の質量で除した値によって、調整し得ると考えられる。実施例9のように、反応系におけるメッキ溶液の濃度を低く設定することで、メッキ層の厚さを薄くできる。 The thickness of the plating layer is considered to be affected by the film formation rate in the reaction system of the plating process. The film formation rate is determined by, for example, the concentration of the plating solution in the reaction system of the plating process, specifically, the value obtained by dividing the sum of the mass of nickel and the mass of cobalt in the reaction system by the mass of the hydrogen storage alloy particles. Can be adjusted. As in Example 9, the plating layer thickness can be reduced by setting the concentration of the plating solution in the reaction system low.

 (実施例10)
 メッキ溶液調製工程において、メッキ金属塩として硫酸ニッケルのみを用いたこと、及び加熱工程における加熱温度が300℃であったこと以外は、実施例3と同様の方法で、実施例10の負極材料を得た。
 具体的には、実施例10の負極材料の製造方法では、メッキ溶液調製工程において、NiSO・6HOを3.0g、マロン酸を1.5gずつ計り取り、75gの蒸留水を加えた。これを90℃に加熱して溶液とし、更にこの溶液を80℃に保ちつつpH4~5となるようにNaOHを添加して、メッキ溶液を得た。
(Example 10)
In the plating solution preparation step, the negative electrode material of Example 10 was prepared in the same manner as in Example 3 except that only nickel sulfate was used as the plating metal salt and the heating temperature in the heating step was 300 ° C. Obtained.
Specifically, in the negative electrode material manufacturing method of Example 10, in the plating solution preparation step, 3.0 g of NiSO 4 .6H 2 O and 1.5 g of malonic acid were measured and 75 g of distilled water was added. . This was heated to 90 ° C. to form a solution, and NaOH was added to maintain the solution at 80 ° C. so that the pH was 4 to 5, thereby obtaining a plating solution.

 (実施例11)
 メッキ溶液調製工程において、メッキ金属塩として硫酸ニッケル6水和物と炭酸二水酸化二銅(II)とを、ニッケルと銅のモル比が95:5となるように用いたこと以外は、実施例10と同様の方法で、実施例11の負極材料を得た。
(Example 11)
In the plating solution preparation process, except that nickel sulfate hexahydrate and dicopper (II) carbonate dihydroxide were used as the plating metal salt so that the molar ratio of nickel to copper was 95: 5. In the same manner as in Example 10, the negative electrode material of Example 11 was obtained.

 (実施例12)
 メッキ溶液調製工程において、メッキ金属塩として硫酸ニッケル6水和物と炭酸二水酸化二銅(II)とを、ニッケルと銅のモル比が3:1となるように用いたこと以外は、実施例10と同様の方法で、実施例12の負極材料を得た。
(Example 12)
In the plating solution preparation process, except that nickel sulfate hexahydrate and dicopper (II) carbonate dihydroxide were used as the plating metal salt so that the molar ratio of nickel to copper was 3: 1. In the same manner as in Example 10, the negative electrode material of Example 12 was obtained.

 (比較例1-A)
 比較例1と同様の方法で比較例1-Aの負極材料を得た。
(Comparative Example 1-A)
A negative electrode material of Comparative Example 1-A was obtained in the same manner as in Comparative Example 1.

 (評価18 表面分析)
 実施例11、実施例12及び比較例1-Aの負極材料について、上記の評価2と同様に、XPSを用いた表面分析を行った。評価18の結果を図13~図15に示す。なお、図13は比較例1-Aの負極材料の表面分析結果であり、図14及び図15は実施例11の負極材料の表面分析結果である。図13及び図14に示されるXPSスペクトルは、主としてニッケルに由来するピークを示し、図15に示されるXPSスペクトルは、主として銅に由来するピークを示す。
(Evaluation 18 Surface analysis)
The negative electrode materials of Example 11, Example 12, and Comparative Example 1-A were subjected to surface analysis using XPS in the same manner as in Evaluation 2 above. The results of Evaluation 18 are shown in FIGS. 13 shows the surface analysis results of the negative electrode material of Comparative Example 1-A, and FIGS. 14 and 15 show the surface analysis results of the negative electrode material of Example 11. The XPS spectrum shown in FIGS. 13 and 14 shows a peak mainly derived from nickel, and the XPS spectrum shown in FIG. 15 shows a peak mainly derived from copper.

 図13に示すように、比較例1-Aの負極材料つまりメッキ前の負極材料のXPSスペクトルにおいては、ニッケル水酸化物に由来する856eVのピーク強度が金属ニッケルに由来する853eVのピーク強度よりも大きかった。図14に示すように、実施例11の負極材料のXPSスペクトルにおいては、金属ニッケルに由来する853eVのピーク強度は、ニッケル水酸化物に由来する856eVのピーク強度よりも遙かに大きかった。詳細は後述するが、実施例12の負極材料のXPSスペクトルは、実施例11の負極材料のXPSスペクトルとほぼ同一であった。
 この結果から、メッキ溶液用の金属として銅を用いた実施例11及び実施例12の負極材料の製造方法においても、表面に多くの金属ニッケルが存在する負極材料を製造し得ることがわかる。
As shown in FIG. 13, in the XPS spectrum of the negative electrode material of Comparative Example 1-A, that is, the negative electrode material before plating, the peak intensity of 856 eV derived from nickel hydroxide is higher than the peak intensity of 853 eV derived from metallic nickel. It was big. As shown in FIG. 14, in the XPS spectrum of the negative electrode material of Example 11, the peak intensity of 853 eV derived from metallic nickel was much larger than the peak intensity of 856 eV derived from nickel hydroxide. Although details will be described later, the XPS spectrum of the negative electrode material of Example 12 was almost the same as the XPS spectrum of the negative electrode material of Example 11.
From this result, it can be seen that the negative electrode material having a large amount of metallic nickel on the surface can also be manufactured in the negative electrode material manufacturing methods of Example 11 and Example 12 using copper as the metal for the plating solution.

 また、図15に示すように、実施例11の負極材料の表面において、金属銅に由来する953eVのピーク強度及び933eVのピーク強度は、銅酸化物に由来する940~945付近のピーク強度に比べて著しく大きかった。実施例12の負極材料のXPSスペクトルについても同様であった。
 この結果から、実施例11及び実施例12の負極材料の表面において、銅酸化物に対する金属銅の割合が多いと推定できる。
Further, as shown in FIG. 15, on the surface of the negative electrode material of Example 11, the peak intensity of 953 eV derived from metallic copper and the peak intensity of 933 eV are compared with the peak intensity around 940 to 945 derived from copper oxide. It was remarkably big. The same was true for the XPS spectrum of the negative electrode material of Example 12.
From this result, it can be estimated that the ratio of metallic copper to copper oxide is large on the surfaces of the negative electrode materials of Examples 11 and 12.

 (評価19 導電性)
 実施例11、実施例12及び比較例1-Aの負極材料について、上記の評価1と同様に、粉体抵抗を測定した。結果を表9に示す。
(Evaluation 19 Conductivity)
For the negative electrode materials of Example 11, Example 12, and Comparative Example 1-A, the powder resistance was measured in the same manner as in Evaluation 1 above. The results are shown in Table 9.

Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000009

 表9に示すように、メッキ金属としてニッケルと銅とを用いた実施例11の負極材料及び実施例12の負極材料の粉体抵抗は、比較例1-Aの負極材料の粉体抵抗よりも低かった。この結果から、メッキ溶液用の金属としてコバルトに代えて銅を用いる場合にも、粉体抵抗が低く導電性に優れる負極材料が得られることがわかる。 As shown in Table 9, the powder resistance of the negative electrode material of Example 11 and the negative electrode material of Example 12 using nickel and copper as the plating metal is larger than the powder resistance of the negative electrode material of Comparative Example 1-A. It was low. From this result, it is understood that a negative electrode material having low powder resistance and excellent conductivity can be obtained even when copper is used instead of cobalt as the metal for the plating solution.

 (評価20 電池特性)
 実施例10~実施例12の負極材料を用い、実施例1のニッケル金属水素化物電池と同様に、実施例10~実施例12のニッケル金属水素化物電池を得た。
 この実施例10~実施例12のニッケル金属水素化物電池について、25℃、0.1CでSOC100%まで充電を行った。このときの電圧と充電時間との関係を図16及び図17に示す。なお、図16は実施例10及び実施例11のニッケル金属水素化物電池の充電カーブを比較した図であり、図17は実施例11及び実施例12のニッケル金属水素化物電池の充電カーブを比較した図である。
(Evaluation 20 Battery characteristics)
Using the negative electrode materials of Examples 10 to 12, nickel metal hydride batteries of Examples 10 to 12 were obtained in the same manner as the nickel metal hydride batteries of Example 1.
The nickel metal hydride batteries of Examples 10 to 12 were charged to SOC 100% at 25 ° C. and 0.1 C. The relationship between the voltage and the charging time at this time is shown in FIGS. 16 is a diagram comparing the charge curves of the nickel metal hydride batteries of Example 10 and Example 11, and FIG. 17 is a comparison of the charge curves of the nickel metal hydride batteries of Example 11 and Example 12. FIG.

 図16及び図17に示すように、実施例10~実施例12のニッケル金属水素化物電池のSOC100%のときの電圧は1.45~1.5V程度であり、これらのニッケル金属水素化物電池は低い電圧で満充電されたといえる。この結果は、実施例10~実施例12のニッケル金属水素化物電池の充電抵抗が低いことを示唆する。 As shown in FIGS. 16 and 17, the voltage of the nickel metal hydride batteries of Examples 10 to 12 when the SOC is 100% is about 1.45 to 1.5 V, and these nickel metal hydride batteries are It can be said that the battery is fully charged at a low voltage. This result suggests that the charging resistance of the nickel metal hydride batteries of Examples 10 to 12 is low.

 また、図16に示すように、実施例11のニッケル金属水素化物電池は、実施例10のニッケル金属水素化物電池に比べて、より低電圧で満充電された。このため、メッキ層にニッケル及び銅を含む場合には、メッキ層にニッケルのみを含む場合に比べてより充電抵抗が低下するといえる。つまり、メッキ金属としてニッケルと銅とを併用することで、メッキ層の導電性がより向上すると考えられる。 Also, as shown in FIG. 16, the nickel metal hydride battery of Example 11 was fully charged at a lower voltage than the nickel metal hydride battery of Example 10. For this reason, when nickel and copper are included in the plating layer, it can be said that the charging resistance is further reduced as compared with the case where only nickel is included in the plating layer. That is, it is thought that the electroconductivity of a plating layer improves more by using nickel and copper together as a plating metal.

 更に、図17に示すように、実施例12のニッケル金属水素化物電池は、実施例11のニッケル金属水素化物電池に比べて、より低電圧で満充電された。このため、メッキ金属としてニッケル及び銅を含むメッキ層を形成する場合、メッキ層の導電性を考慮すると、メッキ溶液におけるニッケルと銅とのモル比は95:5よりも3:1であるのが好ましいといえる。更には、当該結果を基にした、メッキ溶液におけるニッケルと銅とのモル比の好ましい範囲として、99:1~30:70、95:5~50:50、90:10~65:35、80:20~70:30の範囲を挙げ得る。 Furthermore, as shown in FIG. 17, the nickel metal hydride battery of Example 12 was fully charged at a lower voltage than the nickel metal hydride battery of Example 11. For this reason, when forming a plating layer containing nickel and copper as the plating metal, the molar ratio of nickel to copper in the plating solution is 3: 1 rather than 95: 5, considering the conductivity of the plating layer. It can be said that it is preferable. Furthermore, as a preferable range of the molar ratio of nickel and copper in the plating solution based on the result, 99: 1 to 30:70, 95: 5 to 50:50, 90:10 to 65:35, 80 : The range of 20 to 70:30 may be mentioned.

 なお銅は、ニッケル金属水素化物電池において強アルカリ性の電解液に溶出し難い。このため、メッキ金属としてニッケルと銅とを併用することで、メッキ層の耐久性を向上させ得る利点もある。 Note that copper hardly dissolves in a strong alkaline electrolyte in a nickel metal hydride battery. For this reason, there is also an advantage that durability of the plating layer can be improved by using nickel and copper together as the plating metal.

 (実施例13)
 加熱工程における加熱温度を250℃としたこと以外は、実施例12と同様の方法で、実施例13の負極材料を得た。
 (実施例14)
 加熱工程における加熱温度を350℃としたこと以外は、実施例12と同様の方法で、実施例14の負極材料を得た。
(Example 13)
A negative electrode material of Example 13 was obtained in the same manner as in Example 12 except that the heating temperature in the heating step was 250 ° C.
(Example 14)
A negative electrode material of Example 14 was obtained in the same manner as in Example 12 except that the heating temperature in the heating step was 350 ° C.

 (評価21 表面分析)
 実施例12及び実施例14の負極材料について、上記の評価2と同様に、XPSを用いた表面分析を行った。評価21の結果を図18~図21に示す。なお、図18及び図19は実施例12の負極材料の表面分析結果であり、図20及び図21は実施例14の負極材料の表面分析結果である。図18及び図20に示されるXPSスペクトルは、主としてニッケルに由来するピークを示し、図19及び図21に示されるXPSスペクトルは、主として銅に由来するピークを示す。
(Evaluation 21 Surface analysis)
About the negative electrode material of Example 12 and Example 14, the surface analysis using XPS was performed similarly to said evaluation 2. The results of evaluation 21 are shown in FIGS. 18 and 19 show the surface analysis results of the negative electrode material of Example 12, and FIGS. 20 and 21 show the surface analysis results of the negative electrode material of Example 14. The XPS spectra shown in FIGS. 18 and 20 show peaks mainly derived from nickel, and the XPS spectra shown in FIGS. 19 and 21 show peaks mainly derived from copper.

 図18及び図20に示すように、加熱工程における加熱温度が300℃であった実施例12の負極材料についても、当該加熱温度が350℃であった実施例14の負極材料についても、金属ニッケルに由来する853eV付近のピーク強度は、ニッケル水酸化物に由来する856eV付近のピーク強度よりも遙かに大きかった。この結果から、本発明の製造方法においてメッキ金属としてコバルトに代えて銅を用いる場合にも、種々の温度で表面に多くの金属ニッケルが存在する負極材料を製造し得ることがわかる。 As shown in FIG.18 and FIG.20, also about the negative electrode material of Example 12 whose heating temperature in the heating process was 300 degreeC, also about the negative electrode material of Example 14 whose said heating temperature was 350 degreeC, metallic nickel The peak intensity in the vicinity of 853 eV derived from No. 1 was much larger than the peak intensity in the vicinity of 856 eV derived from the nickel hydroxide. From these results, it can be seen that even when copper is used as the plating metal in the production method of the present invention, negative electrode materials having a large amount of metallic nickel on the surface can be produced at various temperatures.

 なお、図19及び図21に示すように、実施例12の負極材料及び実施例14の負極材料の表面においても、金属銅に由来する953eV付近のピーク強度及び933eV付近のピーク強度は、銅酸化物に由来する940~945付近のピーク強度に比べて著しく大きかった。この結果から、本発明の製造方法によると、加熱工程の温度条件を変更しても、メッキ金属として銅を用いる場合には、負極材料の表面における銅酸化物に対する金属銅の割合が多い負極材料を製造し得ることがわかる。 As shown in FIGS. 19 and 21, also on the surface of the negative electrode material of Example 12 and the negative electrode material of Example 14, the peak intensity around 953 eV and the peak intensity around 933 eV derived from metallic copper are copper oxide. The peak intensity around 940 to 945 derived from the product was remarkably large. From this result, according to the manufacturing method of the present invention, even when the temperature condition of the heating process is changed, when copper is used as the plating metal, the negative electrode material has a high ratio of metallic copper to copper oxide on the surface of the negative electrode material. It can be seen that can be manufactured.

 (評価22 表面観察)
 実施例12及び実施例14の負極材料について、表面をSEMで観察した。実施例12の負極材料の表面のSEM像を図22に示し、実施例14の負極材料の表面のSEM像を図23に示す。
 図22及び図23に示すように、実施例12及び実施例14の負極材料の表面には、図3及び図4で観察されたものと同様の粒子の集合体が観察された。この結果から、本発明の製造方法においてメッキ金属として銅を用いる場合にも、メッキ金属としてコバルトを用いる場合と同様に、負極材料の表面には粒子の集合体で構成されているメッキ層が形成されることがわかる。
 また、図23に示される実施例14の負極材料の表面には、図22に示される実施例12の負極材料の表面に比べて、粒径の大きな粒子がみられた。実施例12の製造方法と実施例14の製造方法との違いは加熱工程における加熱温度であるため、当該加熱温度を350℃とすることで、当該加熱温度を300℃とする場合に比べてメッキ層を構成する粒子が粒成長すると考えられる。更に、加熱温度を350℃とすることでメッキ層の結晶性が向上すると推測される。
(Evaluation 22 Surface observation)
About the negative electrode material of Example 12 and Example 14, the surface was observed by SEM. The SEM image of the surface of the negative electrode material of Example 12 is shown in FIG. 22, and the SEM image of the surface of the negative electrode material of Example 14 is shown in FIG.
As shown in FIGS. 22 and 23, aggregates of particles similar to those observed in FIGS. 3 and 4 were observed on the surfaces of the negative electrode materials of Examples 12 and 14. From this result, even when copper is used as the plating metal in the manufacturing method of the present invention, a plating layer composed of an aggregate of particles is formed on the surface of the negative electrode material, as in the case of using cobalt as the plating metal. You can see that
In addition, particles having a larger particle diameter were observed on the surface of the negative electrode material of Example 14 shown in FIG. 23 than on the surface of the negative electrode material of Example 12 shown in FIG. Since the difference between the manufacturing method of Example 12 and the manufacturing method of Example 14 is the heating temperature in the heating step, the heating temperature is set to 350 ° C., which is compared with the case where the heating temperature is set to 300 ° C. It is considered that the particles constituting the layer grow. Furthermore, it is estimated that the crystallinity of the plating layer is improved by setting the heating temperature to 350 ° C.

 (評価23 電池特性)
 実施例10、実施例12~実施例14の負極材料を用い、実施例1のニッケル金属水素化物電池と同様に、実施例10、実施例12~実施例14のニッケル金属水素化物電池を得た。
 この実施例10、実施例12~実施例14のニッケル金属水素化物電池について、25℃、0.1CでSOC100%まで充電を行い、その後、0.2Cで1Vまで放電した。このときの電圧と充電時間又は放電時間との関係を図24に示す。
(Evaluation 23 Battery characteristics)
Using the negative electrode materials of Example 10 and Examples 12 to 14, nickel metal hydride batteries of Example 10 and Examples 12 to 14 were obtained in the same manner as the nickel metal hydride battery of Example 1. .
The nickel metal hydride batteries of Example 10 and Examples 12 to 14 were charged to 100% SOC at 25 ° C. and 0.1 C, and then discharged to 1 V at 0.2 C. The relationship between the voltage and the charging time or discharging time at this time is shown in FIG.

 図24に示すように、何れのニッケル金属水素化物電池も良好に充放電したが、特に、加熱温度が350℃であった実施例14のニッケル金属水素化物電池は最も低い電位で満充電されかつ最も高い電位で放電したため、実施例14の負極材料はニッケル金属水素化物電池用の負極材料として優れた性能を示すといえる。そしてこの結果から、メッキ金属としてニッケル及び銅を用いる本発明の製造方法において、加熱工程における加熱温度を350℃とするのが好ましいことがわかる。 As shown in FIG. 24, all of the nickel metal hydride batteries were charged and discharged well. In particular, the nickel metal hydride battery of Example 14 having a heating temperature of 350 ° C. was fully charged at the lowest potential and Since the discharge was performed at the highest potential, it can be said that the negative electrode material of Example 14 shows excellent performance as a negative electrode material for nickel metal hydride batteries. From this result, it can be seen that the heating temperature in the heating step is preferably 350 ° C. in the manufacturing method of the present invention using nickel and copper as the plating metal.

 (評価24 導電性)
 実施例13及び実施例14の負極材料について、上記の評価1と同様に、粉体抵抗を測定した。結果を表10に示す。なお、表10には、評価19による実施例12の負極材料の粉体抵抗を併記した。
(Evaluation 24 Conductivity)
About the negative electrode material of Example 13 and Example 14, powder resistance was measured similarly to said evaluation 1. The results are shown in Table 10. In Table 10, the powder resistance of the negative electrode material of Example 12 according to Evaluation 19 is also shown.

Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000010

 表10に示すように、粉体抵抗は、実施例13、実施例12、実施例14の順に低く、実施例12~実施例14の負極材料の製造方法においては、加熱工程における加熱温度が高い方が導電性に優れる負極材料を製造し得ることがわかる。
 評価22の結果も考慮すると、加熱温度が350℃である場合には、加熱温度が300℃である場合に比べて、メッキ層を構成する粒子が粒成長して、又は、当該粒子の結晶性が高まって、その結果メッキ層に優れた導電性が付与されたと推測される。
As shown in Table 10, the powder resistance is low in the order of Example 13, Example 12, and Example 14, and in the method for producing the negative electrode material of Examples 12 to 14, the heating temperature in the heating step is high. It can be seen that a negative electrode material having better conductivity can be produced.
Considering the result of evaluation 22, when the heating temperature is 350 ° C., the particles constituting the plating layer grow or the crystallinity of the particles is higher than when the heating temperature is 300 ° C. As a result, it is speculated that excellent conductivity was imparted to the plating layer.

 (評価25 DC-IR)
 実施例10、実施例14及び実施例13のニッケル金属水素化物電池につき、25℃及び0℃の二通りの条件で、評価17と同様に、SOC60%、10秒間のDC-IRを測定した。結果を表11に示す。
(Evaluation 25 DC-IR)
For the nickel metal hydride batteries of Example 10, Example 14, and Example 13, the DC-IR was measured for 60% SOC and 10 seconds under the same conditions as in Evaluation 17 under two conditions of 25 ° C. and 0 ° C. The results are shown in Table 11.

Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000011

 表11に示すように、実施例14のニッケル金属水素化物電池は、実施例10のニッケル金属水素化物電池及び実施例13のニッケル金属水素化物電池に比べて、放電抵抗が低下した。この結果から、負極材料用のメッキ金属としてニッケルのみでなくニッケルと銅とを併用したこと、及び、加熱工程における加熱温度が250℃よりも高い350℃であったことが、ニッケル金属水素化物電池の直流抵抗低減に有利に働くと推測される。 As shown in Table 11, the discharge resistance of the nickel metal hydride battery of Example 14 was lower than that of the nickel metal hydride battery of Example 10 and the nickel metal hydride battery of Example 13. From this result, nickel metal hydride battery that not only nickel but also nickel and copper were used together as the plating metal for the negative electrode material, and that the heating temperature in the heating process was 350 ° C. higher than 250 ° C. It is presumed that this works favorably for reducing DC resistance.

 (実施例15)
 メッキ工程において、メッキ金属塩として硫酸ニッケル6水和物と硝酸ルテニウム(III)硝酸溶液とを、ニッケルとルテニウムのモル比が70:30となるように用いたこと以外は、実施例11と同様の方法で、実施例15の負極材料を得た。
(Example 15)
In the plating step, the same as Example 11 except that nickel sulfate hexahydrate and ruthenium nitrate (III) nitrate solution were used as the plating metal salt so that the molar ratio of nickel to ruthenium was 70:30. The negative electrode material of Example 15 was obtained by the method described above.

 (実施例16)
 メッキ工程において、メッキ金属塩として硫酸ニッケル6水和物と硝酸ルテニウム(III)硝酸溶液とを、ニッケルとルテニウムのモル比が97.5:2.5となるように用いたこと以外は、実施例15と同様の方法で、実施例16の負極材料を得た。
(Example 16)
In the plating process, except that nickel sulfate hexahydrate and ruthenium nitrate (III) nitrate solution were used as plating metal salts so that the molar ratio of nickel to ruthenium was 97.5: 2.5. In the same manner as in Example 15, the negative electrode material of Example 16 was obtained.

 (評価26 電池特性)
 実施例15及び実施例16の負極材料を用い、実施例1のニッケル金属水素化物電池と同様に、実施例15及び実施例16のニッケル金属水素化物電池を得た。
 実施例15及び実施例16のニッケル金属水素化物電池について、25℃、0.1CでSOC100%まで充電を行い、その後、0.2Cで1Vまで放電した。このときの電圧と充電時間又は放電時間との関係を、評価23における実施例10の結果と併せて、図25に示す。
(Evaluation 26 Battery Characteristics)
Using the negative electrode material of Example 15 and Example 16, the nickel metal hydride battery of Example 15 and Example 16 was obtained in the same manner as the nickel metal hydride battery of Example 1.
About the nickel metal hydride battery of Example 15 and Example 16, it charged to SOC100% at 25 degreeC and 0.1 C, and discharged to 1V at 0.2 C after that. The relationship between the voltage at this time and the charging time or discharging time is shown in FIG. 25 together with the result of Example 10 in Evaluation 23.

 図25に示すように、実施例15のニッケル金属水素化物電池及び実施例16のニッケル金属水素化物電池は、実施例10のニッケル金属水素化物電池に比べて、低い電位で満充電され、かつ、高い電位で放電した。このため、メッキ金属としてニッケルのみを含む実施例10の負極材料に比べて、メッキ金属としてニッケル及びルテニウムを含む実施例15の負極材料及び実施例16の負極材料は、ニッケル金属水素化物電池用の負極材料として優れた性能を示すといえる。 As shown in FIG. 25, the nickel metal hydride battery of Example 15 and the nickel metal hydride battery of Example 16 are fully charged at a lower potential than the nickel metal hydride battery of Example 10, and Discharged at a high potential. For this reason, compared with the negative electrode material of Example 10 which contains only nickel as a plating metal, the negative electrode material of Example 15 which contains nickel and ruthenium as a plating metal and the negative electrode material of Example 16 are for nickel metal hydride batteries. It can be said that it exhibits excellent performance as a negative electrode material.

 また、ニッケルとルテニウムのモル比が97.5:2.5である負極材料を用いた実施例16のニッケル金属水素化物電池に比べて、ニッケルとルテニウムのモル比が70:30である負極材料を用いた実施例15のニッケル金属水素化物電池は、より低い電位で満充電され、かつ、より高い電位で放電した。このため、メッキ金属にルテニウムを含む場合、ルテニウムの含有割合が高い方が、ニッケル金属水素化物電池用の負極材料として優れた性能を示すといえる。評価26の結果を考慮すると、メッキ溶液におけるニッケルとルテニウムのモル比は、99:1~50:50の範囲であるのが好ましく、98:2~60:40の範囲であるのがより好ましく、97:3~65:35の範囲であるのがより好ましいといえる。 Also, compared with the nickel metal hydride battery of Example 16 using a negative electrode material in which the molar ratio of nickel to ruthenium is 97.5: 2.5, the negative electrode material in which the molar ratio of nickel to ruthenium is 70:30 The nickel metal hydride battery of Example 15 using was fully charged at a lower potential and discharged at a higher potential. For this reason, when ruthenium is contained in the plated metal, it can be said that the higher the content of ruthenium, the better the performance as a negative electrode material for nickel metal hydride batteries. Considering the result of evaluation 26, the molar ratio of nickel to ruthenium in the plating solution is preferably in the range of 99: 1 to 50:50, more preferably in the range of 98: 2 to 60:40. The range of 97: 3 to 65:35 is more preferable.

 (実施例17)
 加熱工程における加熱温度が350℃であったこと以外は、実施例15と同様の方法で、実施例17の負極材料を得た。
(Example 17)
A negative electrode material of Example 17 was obtained in the same manner as in Example 15 except that the heating temperature in the heating step was 350 ° C.

 (実施例18)
 加熱工程における加熱温度が400℃であったこと以外は、実施例17と同様の方法で、実施例18の負極材料を得た。
(Example 18)
A negative electrode material of Example 18 was obtained in the same manner as in Example 17, except that the heating temperature in the heating step was 400 ° C.

 (評価27 DC-IR)
 実施例17、実施例18及び実施例14の負極材料を用い、実施例1のニッケル金属水素化物電池と同様に、実施例17、実施例18及び実施例14のニッケル金属水素化物電池を得た。
 この実施例17、実施例18及び実施例14のニッケル金属水素化物電池、並びに実施例10のニッケル金属水素化物電池につき、評価17と同様に、0.1秒間、1秒間、5秒間、及び10秒間の四通りの条件で、25℃、SOC60%のDC-IRを測定した。結果を表12に示す。
(Evaluation 27 DC-IR)
Using the negative electrode material of Example 17, Example 18 and Example 14, the nickel metal hydride battery of Example 17, Example 18 and Example 14 was obtained in the same manner as the nickel metal hydride battery of Example 1. .
For the nickel metal hydride batteries of Example 17, Example 18 and Example 14, and the nickel metal hydride battery of Example 10, as in Evaluation 17, 0.1 second, 1 second, 5 seconds, and 10 DC-IR at 25 ° C. and SOC 60% was measured under four conditions for 2 seconds. The results are shown in Table 12.

Figure JPOXMLDOC01-appb-T000012
Figure JPOXMLDOC01-appb-T000012

 表12に示すように、メッキ金属としてニッケル及びルテニウムを用いた実施例17及び実施例18のニッケル金属水素化物電池は、メッキ金属としてニッケルだけを用いた実施例10のニッケル金属水素化物電池のみならず、メッキ金属としてニッケル及び銅を用いた実施例14のニッケル金属水素化物電池と比べても、直流抵抗が低減した。このため、メッキ金属としてニッケルとルテニウムとを併用することが、直流抵抗の低減に有利に働くと推測される。 As shown in Table 12, the nickel metal hydride batteries of Example 17 and Example 18 using nickel and ruthenium as the plating metal are only the nickel metal hydride batteries of Example 10 using only nickel as the plating metal. In comparison with the nickel metal hydride battery of Example 14 using nickel and copper as the plating metal, the DC resistance was reduced. For this reason, it is presumed that the combined use of nickel and ruthenium as the plating metal is advantageous for reducing the DC resistance.

 なおルテニウムは、銅と同様に、ニッケル金属水素化物電池において強アルカリ性の電解液に溶出し難い。このため、メッキ金属としてニッケルと銅とを併用する場合と同様に、メッキ金属としてニッケルとルテニウムとを併用することで、メッキ層の耐久性を向上させることが可能である。 Ruthenium, like copper, is unlikely to elute into a strong alkaline electrolyte in nickel metal hydride batteries. For this reason, it is possible to improve the durability of the plating layer by using nickel and ruthenium as the plating metal in the same manner as when using nickel and copper as the plating metal.

 (評価28 表面分析)
 実施例17及び実施例18の負極材料について、上記の評価2と同様に、XPSを用いた表面分析を行った。評価28の結果を図26~図29に示す。なお、図26及び図27は実施例17の負極材料の表面分析結果であり、図28及び図29は実施例18の負極材料の表面分析結果である。図26及び図28に示されるXPSスペクトルは、主としてニッケルに由来するピークを示し、図27及び図29に示されるXPSスペクトルは、主としてルテニウムに由来するピークを示す。
(Evaluation 28 Surface analysis)
About the negative electrode material of Example 17 and Example 18, the surface analysis using XPS was performed similarly to said evaluation 2. The results of Evaluation 28 are shown in FIGS. 26 and 27 show the surface analysis results of the negative electrode material of Example 17, and FIGS. 28 and 29 show the surface analysis results of the negative electrode material of Example 18. The XPS spectra shown in FIGS. 26 and 28 mainly show peaks derived from nickel, and the XPS spectra shown in FIGS. 27 and 29 show peaks mainly derived from ruthenium.

 図26及び図28に示すように、実施例17の負極材料のXPSスペクトル及び実施例18の負極材料のXPSスペクトルにおいては、金属ニッケルに由来する853eVのピーク強度は、ニッケル水酸化物に由来する856eVのピーク強度よりも遙かに大きかった。
 この結果から、メッキ溶液用の金属としてニッケルとルテニウムとを併用した実施例17及び実施例18の負極材料の製造方法においても、表面に多くの金属ニッケルが存在する負極材料を製造し得ることがわかる。
As shown in FIGS. 26 and 28, in the XPS spectrum of the negative electrode material of Example 17 and the XPS spectrum of the negative electrode material of Example 18, the peak intensity of 853 eV derived from metallic nickel is derived from nickel hydroxide. It was much larger than the peak intensity of 856 eV.
From this result, it is possible to produce a negative electrode material in which a large amount of nickel metal is present on the surface even in the negative electrode material production methods of Example 17 and Example 18 in which nickel and ruthenium are used in combination as the metal for the plating solution. Recognize.

 また、図27及び図29に示すように、実施例17の負極材料のXPSスペクトル及び実施例18の負極材料のXPSスペクトルにおいて、金属ルテニウムに由来する280.1eVのピーク強度は、ルテニウム酸化物に由来する280.8eVのピーク強度よりも遙かに大きかった。
 この結果から、実施例17及び実施例18の負極材料の表面において、ルテニウム酸化物に対する金属ルテニウムの割合が多いと推定できる。
Further, as shown in FIGS. 27 and 29, in the XPS spectrum of the negative electrode material of Example 17 and the XPS spectrum of the negative electrode material of Example 18, the peak intensity of 280.1 eV derived from metal ruthenium is higher than that of ruthenium oxide. It was much larger than the peak intensity of 280.8 eV derived.
From this result, it can be presumed that the ratio of the metal ruthenium to the ruthenium oxide is large on the surface of the negative electrode material of Example 17 and Example 18.

 (評価29 導電性)
 実施例17及び実施例18の負極材料について、上記の評価1と同様に、粉体抵抗を測定した。結果を比較例1-Aの負極材料の粉体抵抗と併せて表13に示す。
(Evaluation 29 conductivity)
About the negative electrode material of Example 17 and Example 18, powder resistance was measured similarly to said evaluation 1. The results are shown in Table 13 together with the powder resistance of the negative electrode material of Comparative Example 1-A.

Figure JPOXMLDOC01-appb-T000013
Figure JPOXMLDOC01-appb-T000013

 表13に示すように、メッキ金属としてニッケルとルテニウムとを併用した実施例17の負極材料及び実施例18の負極材料の粉体抵抗は、メッキ金属としてニッケルのみを用いた比較例1-Aの負極材料の粉体抵抗よりも低かった。この結果から、メッキ溶液用の金属としてコバルトや銅に代えてルテニウムを用いる場合にも、粉体抵抗が低く導電性に優れる負極材料が得られることがわかる。 As shown in Table 13, the powder resistance of the negative electrode material of Example 17 and the negative electrode material of Example 18 in which nickel and ruthenium are used in combination as plating metals is that of Comparative Example 1-A using only nickel as the plating metal. It was lower than the powder resistance of the negative electrode material. From this result, it is understood that a negative electrode material having low powder resistance and excellent conductivity can be obtained even when ruthenium is used instead of cobalt or copper as the metal for the plating solution.

 (評価30 電池特性)
 実施例17及び実施例18のニッケル金属水素化物電池について、25℃、0.1CでSOC100%まで充電を行った。このときの電圧と充電時間又は放電時間との関係を、評価23における実施例10の結果と併せて、図30に示す。
(Evaluation 30 Battery characteristics)
About the nickel metal hydride battery of Example 17 and Example 18, it charged to SOC100% at 25 degreeC and 0.1C. The relationship between the voltage and the charging time or discharging time at this time is shown in FIG. 30 together with the result of Example 10 in Evaluation 23.

 図30に示すように、実施例17のニッケル金属水素化物電池及び実施例18のニッケル金属水素化物電池は、実施例10のニッケル金属水素化物電池に比べて、低い電位で満充電された。このため、メッキ金属としてニッケルのみを含む実施例10の負極材料に比べて、メッキ金属としてニッケル及びルテニウムを含む実施例17の負極材料及び実施例18の負極材料は、ニッケル金属水素化物電池用の負極材料として優れた性能を示すといえる。 As shown in FIG. 30, the nickel metal hydride battery of Example 17 and the nickel metal hydride battery of Example 18 were fully charged at a lower potential than the nickel metal hydride battery of Example 10. For this reason, the negative electrode material of Example 17 and the negative electrode material of Example 18 containing nickel and ruthenium as the plating metal are compared with the negative electrode material of Example 10 containing only nickel as the plating metal for the nickel metal hydride battery. It can be said that it exhibits excellent performance as a negative electrode material.

 また、加熱温度400℃の負極材料を用いた実施例18のニッケル金属水素化物電池は、また、加熱温度350℃の負極材料を用いた実施例17のニッケル金属水素化物電池に比べて、更に低い電位で満充電された。このため、本発明の負極材料の製造方法においてメッキ金属としてニッケルとルテニウムとを併用する場合、より低い電位での充電を実現するためには、加熱温度は高い方が好ましいと考えられる。評価30の結果を考慮すると、メッキ金属としてニッケルとルテニウムとを併用する場合、加熱工程における加熱温度の好ましい範囲として、250℃以上500℃以下、300℃以上500℃以下、350℃以上500℃以下、350℃を超え480℃以下、360℃以上450℃以下の範囲を挙げることができる。 In addition, the nickel metal hydride battery of Example 18 using a negative electrode material having a heating temperature of 400 ° C. is still lower than the nickel metal hydride battery of Example 17 using a negative electrode material having a heating temperature of 350 ° C. Fully charged with potential. For this reason, when nickel and ruthenium are used together as plating metals in the method for producing a negative electrode material of the present invention, it is considered that a higher heating temperature is preferable in order to realize charging at a lower potential. Considering the result of evaluation 30, when nickel and ruthenium are used in combination as the plating metal, the preferable range of the heating temperature in the heating step is 250 ° C. to 500 ° C., 300 ° C. to 500 ° C., 350 ° C. to 500 ° C. , 350 ° C. or higher, 480 ° C. or lower, 360 ° C. or higher and 450 ° C. or lower.

 (実施例19)
 実施例19の負極材料は、A型水素吸蔵合金粒子と、ニッケル及びインジウムを含み当該水素吸蔵合金粒子上に形成されたメッキ層と、を有する。
 実施例19の負極材料の製造方法は、金属塩として硫酸インジウムを用いたこと、水素吸蔵合金粒子の平均粒子径が25μmであること、加熱温度が400℃であること、及び、ニッケルとインジウムとのモル比が0.5:0.25となるようにニッケル塩と金属塩とを配合したこと以外は、実施例1の負極材料の製造方法と同様である。
(Example 19)
The negative electrode material of Example 19 has A 2 B 7 type hydrogen storage alloy particles and a plating layer containing nickel and indium and formed on the hydrogen storage alloy particles.
The method for producing the negative electrode material of Example 19 was that indium sulfate was used as the metal salt, the average particle diameter of the hydrogen storage alloy particles was 25 μm, the heating temperature was 400 ° C., and nickel and indium Except that the nickel salt and the metal salt were blended so that the molar ratio was 0.5: 0.25, the production method of the negative electrode material of Example 1 was the same.

 実施例19の負極材料の製造方法のメッキ溶液調製工程においては、NiSO・6HOを1.5g、In(SO・9HOを1.5g、ジカルボン酸を1.5gずつ計り取り、75gの蒸留水を加えた。これを90℃に加熱して溶液とし、更にこの溶液を80℃に保ちつつpH4~5となるようにNaOHを添加して、メッキ溶液を得た。
 また、実施例19の負極材料の製造方法の加熱工程においては、メッキ工程後、真空乾燥を経た負極材料をアルゴン雰囲気下にて室温から400℃に昇温して焼成した。そして、焼成後の負極材料を実施例19の負極材料とした。
In the plating solution preparation step of the negative electrode material manufacturing method of Example 19, 1.5 g of NiSO 4 .6H 2 O, 1.5 g of In 2 (SO 4 ) 3 .9H 2 O, and 1.5 g of dicarboxylic acid Weighed and added 75 g of distilled water. This was heated to 90 ° C. to form a solution, and NaOH was added to maintain the solution at 80 ° C. so that the pH was 4 to 5, thereby obtaining a plating solution.
Moreover, in the heating process of the negative electrode material manufacturing method of Example 19, after the plating process, the vacuum dried negative electrode material was heated from room temperature to 400 ° C. in an argon atmosphere and baked. The fired negative electrode material was used as the negative electrode material of Example 19.

 (実施例20)
 加熱工程において負極材料を室温から350℃に昇温して焼成したこと以外、実施例19と同じ方法で実施例20の負極材料を得た。
 (比較例1-B)
 比較例1及び比較例1-Aと同様の方法で比較例1-Bの負極材料を得た。
(Example 20)
A negative electrode material of Example 20 was obtained in the same manner as in Example 19, except that the negative electrode material was heated from room temperature to 350 ° C. and fired in the heating step.
(Comparative Example 1-B)
A negative electrode material of Comparative Example 1-B was obtained in the same manner as Comparative Example 1 and Comparative Example 1-A.

 (評価31 導電性)
 実施例19、実施例20、及び比較例1-Bの負極材料につき、評価1 導電性と同様に粉体抵抗を測定した。導電性評価の結果を表14に示す。
(Evaluation 31 Conductivity)
For the negative electrode materials of Example 19, Example 20, and Comparative Example 1-B, the powder resistance was measured in the same manner as in Evaluation 1. Table 14 shows the results of the electrical conductivity evaluation.

Figure JPOXMLDOC01-appb-T000014
Figure JPOXMLDOC01-appb-T000014

 表14に示すように、実施例19の負極材料及び実施例20の負極材料の粉体抵抗は、比較例1-Bの負極材料の粉体抵抗に比べて低い。実施例19の負極材料及び実施例20の負極材料はメッキ層を有するものであるため、この結果はメッキ層の有無に起因すると考えられる。また、実施例19及び実施例20においては硫酸ニッケル及び硫酸インジウムを含むメッキ溶液を用いているため、実施例19の負極材料及び実施例20の負極材料のメッキ層はニッケル及びインジウムを含むと考えられる。したがって、表14に示す導電性評価の結果から、ニッケル及びコバルトを含むメッキ層にかえてニッケル及びインジウムを含むメッキ層を設ける場合にも、負極材料に優れた導電性を付与できる、と言うことができる。 As shown in Table 14, the powder resistance of the negative electrode material of Example 19 and the negative electrode material of Example 20 is lower than the powder resistance of the negative electrode material of Comparative Example 1-B. Since the negative electrode material of Example 19 and the negative electrode material of Example 20 have a plating layer, this result is considered to be due to the presence or absence of the plating layer. In Example 19 and Example 20, since the plating solution containing nickel sulfate and indium sulfate is used, the negative electrode material of Example 19 and the negative electrode material of Example 20 are considered to contain nickel and indium. It is done. Therefore, from the results of the conductivity evaluation shown in Table 14, it can be said that excellent conductivity can be imparted to the negative electrode material even when a plating layer containing nickel and indium is provided instead of the plating layer containing nickel and cobalt. Can do.

 また、実施例19の負極材料及び実施例20の負極材料の粉体抵抗を比較すると、加熱工程における加熱温度が400℃であった実施例19の負極材料は、加熱工程における加熱温度が350℃であった実施例20の負極材料に比べて粉体抵抗が著しく低減している。
 この結果から、ニッケル及びインジウムを含むメッキ層を設ける場合には、350℃を超える温度で負極材料を加熱することが導電性向上に大きく寄与すると言える。
Further, comparing the powder resistance of the negative electrode material of Example 19 and the negative electrode material of Example 20, the heating temperature in the heating step of the negative electrode material of Example 19 that was 400 ° C. in the heating step was 350 ° C. Compared with the negative electrode material of Example 20 that was, the powder resistance was remarkably reduced.
From this result, it can be said that when a plating layer containing nickel and indium is provided, heating the negative electrode material at a temperature exceeding 350 ° C. greatly contributes to improvement in conductivity.

 (評価32 SEM観察)
 実施例19の負極材料及び実施例20の負極材料につき、評価3 SEM観察と同様に表面を観察した。実施例19の負極材料のSEM像を図31に示し、実施例20の負極材料のSEM像を図32に示す。
(Evaluation 32 SEM observation)
About the negative electrode material of Example 19, and the negative electrode material of Example 20, the surface was observed similarly to evaluation 3 SEM observation. An SEM image of the negative electrode material of Example 19 is shown in FIG. 31, and an SEM image of the negative electrode material of Example 20 is shown in FIG.

 図31に示すように実施例19の負極材料の表面は網目形状をなし、図32に示すように実施例20の負極材料の表面は粒子の集合体で構成された微細な凹凸状をなしていた。この結果から、ニッケル及びインジウムを含むメッキ層は実際に400℃で溶融すること、350℃以下では溶融しないこと、溶融したメッキ層は網目形状をなすことが示唆される。 As shown in FIG. 31, the surface of the negative electrode material of Example 19 has a mesh shape, and as shown in FIG. 32, the surface of the negative electrode material of Example 20 has fine irregularities formed of particle aggregates. It was. From this result, it is suggested that the plating layer containing nickel and indium is actually melted at 400 ° C., does not melt at 350 ° C. or less, and the molten plating layer has a mesh shape.

 また、上記した評価31 導電性の結果を鑑みると、表面が網目形状である実施例19の負極材料は、表面が微細な凹凸形状をなし網目形状でない実施例20の負極材料に比べて、導電性に優れると言える。 Further, in view of the above-described evaluation 31 conductivity results, the negative electrode material of Example 19 having a mesh shape on the surface is more conductive than the negative electrode material of Example 20 having a fine irregular surface and no mesh shape on the surface. It can be said that it is excellent.

 (評価33 表面分析)
 実施例20の負極材料及び比較例1-Bの負極材料につき、評価2 表面分析と同様に、表面分析を行った。XPSにより測定された実施例20の負極材料及び比較例1-Bの負極材料の表面分析結果を図33及び図34に示す。
(Evaluation 33 Surface analysis)
The negative electrode material of Example 20 and the negative electrode material of Comparative Example 1-B were subjected to surface analysis in the same manner as in Evaluation 2, Surface Analysis. The surface analysis results of the negative electrode material of Example 20 and the negative electrode material of Comparative Example 1-B measured by XPS are shown in FIG. 33 and FIG.

 図33及び図34に示すように、実施例20の負極材料のXPSスペクトル及び比較例1-Bの負極材料のXPSスペクトルでは、ニッケル水酸化物に由来する856eVの結合エネルギー領域、及び金属ニッケルに由来する853eVの結合エネルギー領域の双方にピークが観察された。また、図34に示す比較例1-Bの負極材料のXPSスペクトルでは、金属ニッケルに由来する853eVのピーク強度に比べてニッケル水酸化物に由来する856eVのピーク強度が遙かに大きい。これに対して、図33に示す実施例20の負極材料のXPSスペクトルでは、ニッケル水酸化物に由来する856eVのピーク強度に比べて金属ニッケルに由来する853eVのピーク強度が大きい。この結果から、比較例1-Bの負極材料の表面には多くのニッケル水酸化物が存在するのに対して、実施例20の負極材料の表面には多くの金属ニッケルが存在すると考えられる。 As shown in FIGS. 33 and 34, in the XPS spectrum of the negative electrode material of Example 20 and the XPS spectrum of the negative electrode material of Comparative Example 1-B, the binding energy region of 856 eV derived from nickel hydroxide, and the metallic nickel Peaks were observed in both of the derived 853 eV binding energy region. In the XPS spectrum of the negative electrode material of Comparative Example 1-B shown in FIG. 34, the peak intensity of 856 eV derived from nickel hydroxide is much higher than the peak intensity of 853 eV derived from metallic nickel. In contrast, in the XPS spectrum of the negative electrode material of Example 20 shown in FIG. 33, the peak intensity of 853 eV derived from metallic nickel is larger than the peak intensity of 856 eV derived from nickel hydroxide. From this result, it is considered that a lot of nickel hydroxide is present on the surface of the negative electrode material of Comparative Example 1-B, whereas a lot of nickel metal is present on the surface of the negative electrode material of Example 20.

 また、図34の結果から、メッキ層を持たない比較例1-Bの負極材料の表面にもニッケルが存在すること、当該ニッケルは水素吸蔵合金に含まれるものと考えられること、及び当該ニッケルの多くは水酸化物となっていることがわかる。そして、この結果は更に、実施例20の負極材料の表面に確認される金属ニッケルは、水素吸蔵合金にもともと含まれていたものではなく、メッキ層に由来することを示唆する。 Further, from the results of FIG. 34, nickel is also present on the surface of the negative electrode material of Comparative Example 1-B having no plating layer, the nickel is considered to be included in the hydrogen storage alloy, and the nickel It turns out that many are hydroxides. This result further suggests that the metallic nickel confirmed on the surface of the negative electrode material of Example 20 was not originally contained in the hydrogen storage alloy but originated from the plating layer.

 また、図33に示す実施例20の負極材料のXPSスペクトルでは、870eVのピークが確認されるのに対し、図34に示す比較例1-Bの負極材料のXPSスペクトルでは、当該870eVのピークは確認されない。870eVのピークは、金属ニッケル及びニッケルインジウム化合物(具体的にはInNi又はInNi)に由来すると考えられる。したがってこの結果は、メッキ層がNi及びInを含むことを意味する。更にこの結果から、メッキ層はニッケルインジウム合金を含み、当該ニッケルインジウム合金が網目形状の主体となっていることが示唆される。 Further, in the XPS spectrum of the negative electrode material of Example 20 shown in FIG. 33, a peak of 870 eV is confirmed, whereas in the XPS spectrum of the negative electrode material of Comparative Example 1-B shown in FIG. 34, the peak of 870 eV is Not confirmed. The peak at 870 eV is considered to be derived from metallic nickel and a nickel indium compound (specifically, InNi or InNi 3 ). Therefore, this result means that the plating layer contains Ni and In. Further, this result suggests that the plating layer contains a nickel indium alloy, and the nickel indium alloy is mainly composed of a mesh shape.

Claims (15)

 ニッケル塩、ヘテロ元素含有有機化合物及び水系溶媒を含有するメッキ溶液を得るメッキ溶液調製工程と、
 水系溶媒及び水素吸蔵合金粒子を含有する水素吸蔵合金粒子分散液と、前記メッキ溶液と、還元剤と、を混合して、前記水素吸蔵合金粒子上にニッケルを含むメッキ層が形成された負極材料を得るメッキ工程と、を有する、負極材料の製造方法。
A plating solution preparation step for obtaining a plating solution containing a nickel salt, a heteroelement-containing organic compound and an aqueous solvent;
A negative electrode material in which a nickel-containing plating layer is formed on the hydrogen storage alloy particles by mixing a hydrogen storage alloy particle dispersion containing an aqueous solvent and hydrogen storage alloy particles, the plating solution, and a reducing agent. And a plating step for obtaining a negative electrode material.
 前記メッキ溶液調製工程における前記メッキ溶液は、更に、金属塩を含有し、
 前記メッキ層は、ニッケル及び金属を含む、請求項1に記載の負極材料の製造方法。
The plating solution in the plating solution preparation step further contains a metal salt,
The method for manufacturing a negative electrode material according to claim 1, wherein the plating layer includes nickel and a metal.
 前記メッキ工程で得られた負極材料を250℃以上450℃以下の温度で加熱する加熱工程を有する、請求項1又は2に記載の負極材料の製造方法。 The manufacturing method of the negative electrode material of Claim 1 or 2 which has a heating process which heats the negative electrode material obtained at the said plating process at the temperature of 250 degreeC or more and 450 degrees C or less.  前記加熱工程後に、前記負極材料を低酸素ガスに曝す低酸素ガス曝露工程を有する、請求項3に記載の負極材料の製造方法。 The method for producing a negative electrode material according to claim 3, further comprising a low oxygen gas exposure step of exposing the negative electrode material to a low oxygen gas after the heating step.  前記メッキ工程において、更に有機化合物系分散剤を加える、請求項1~請求項4の何れか一項に記載の負極材料の製造方法。 The method for producing a negative electrode material according to any one of claims 1 to 4, wherein an organic compound dispersant is further added in the plating step.  前記有機化合物系分散剤は、水溶性ポリマー又は水溶性モノマーである、請求項5に記載の負極材料の製造方法。 The method for producing a negative electrode material according to claim 5, wherein the organic compound dispersant is a water-soluble polymer or a water-soluble monomer.  前記水素吸蔵合金粒子は、A型、A19型、AB型から選ばれる水素吸蔵合金を含む、請求項1~請求項6の何れか一項に記載の負極材料の製造方法。 The production of a negative electrode material according to any one of claims 1 to 6, wherein the hydrogen storage alloy particles include a hydrogen storage alloy selected from A 2 B 7 type, A 5 B 19 type, and AB 3 type. Method.  水素吸蔵合金粒子と、前記水素吸蔵合金粒子上に形成されたメッキ層と、を有し、
 前記メッキ層はニッケルを含み、
 表面のXPSスペクトルにおいて、金属ニッケルに由来するピーク強度がニッケル水酸化物に由来するピーク強度よりも大きい、ニッケル金属水素化物電池用負極材料。
Hydrogen storage alloy particles, and a plating layer formed on the hydrogen storage alloy particles,
The plating layer includes nickel;
A negative electrode material for a nickel metal hydride battery, wherein the peak intensity derived from metallic nickel is larger than the peak intensity derived from nickel hydroxide in the surface XPS spectrum.
 前記水素吸蔵合金粒子と前記メッキ層とを有する前記ニッケル金属水素化物電池用負極材料のBET比表面積を、前記水素吸蔵合金粒子のBET比表面積で除した値は、3以上である、請求項8に記載のニッケル金属水素化物電池用負極材料。 The value obtained by dividing the BET specific surface area of the negative electrode material for nickel metal hydride batteries having the hydrogen storage alloy particles and the plating layer by the BET specific surface area of the hydrogen storage alloy particles is 3 or more. The negative electrode material for nickel metal hydride batteries described in 1.  前記水素吸蔵合金粒子と前記メッキ層とを有する前記ニッケル金属水素化物電池用負極材料の表面における、希土類金属の質量Aと遷移金属の質量Bとの割合B/Aは、
 前記水素吸蔵合金粒子の表面における、前記割合B/Aの20倍以上である、請求項8又は請求項9に記載のニッケル金属水素化物電池用負極材料。
The ratio B / A between the mass A of the rare earth metal and the mass B of the transition metal on the surface of the negative electrode material for nickel metal hydride batteries having the hydrogen storage alloy particles and the plating layer is:
The negative electrode material for nickel metal hydride batteries according to claim 8 or 9, which is 20 times or more of the ratio B / A on the surface of the hydrogen storage alloy particles.
 前記メッキ層は、ニッケルインジウム合金、ニッケルビスマス合金、ニッケルスズ合金、ニッケルカドミウム合金から選ばれる少なくとも一種を含む、請求項8~請求項10に記載のニッケル金属水素化物電池用負極材料。 11. The negative electrode material for a nickel metal hydride battery according to claim 8, wherein the plating layer contains at least one selected from a nickel indium alloy, a nickel bismuth alloy, a nickel tin alloy, and a nickel cadmium alloy.  表面が網目形状をなす、請求項8~請求項11に記載のニッケル金属水素化物電池用負極材料。 12. The negative electrode material for a nickel metal hydride battery according to claim 8, wherein the surface has a mesh shape.  前記水素吸蔵合金粒子は、A型、A19型、AB型から選ばれる水素吸蔵合金を含む、請求項8~請求項12に記載のニッケル金属水素化物電池用負極材料。 13. The negative electrode material for a nickel metal hydride battery according to claim 8, wherein the hydrogen storage alloy particles include a hydrogen storage alloy selected from A 2 B 7 type, A 5 B 19 type, and AB 3 type.  請求項8~請求項13の何れか一項に記載のニッケル金属水素化物電池用負極材料を有するニッケル金属水素化物電池用負極。 A nickel metal hydride battery negative electrode comprising the nickel metal hydride battery negative electrode material according to any one of claims 8 to 13.  請求項14に記載のニッケル金属水素化物電池用負極を有するニッケル金属水素化物電池。 15. A nickel metal hydride battery having the negative electrode for nickel metal hydride battery according to claim 14.
PCT/JP2017/044645 2016-12-27 2017-12-13 Method for producing negative electrode material Ceased WO2018123579A1 (en)

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