[go: up one dir, main page]

WO2018120463A1 - 彩色滤光层基板的制造方法及其应用的液晶面板的制造方法 - Google Patents

彩色滤光层基板的制造方法及其应用的液晶面板的制造方法 Download PDF

Info

Publication number
WO2018120463A1
WO2018120463A1 PCT/CN2017/078123 CN2017078123W WO2018120463A1 WO 2018120463 A1 WO2018120463 A1 WO 2018120463A1 CN 2017078123 W CN2017078123 W CN 2017078123W WO 2018120463 A1 WO2018120463 A1 WO 2018120463A1
Authority
WO
WIPO (PCT)
Prior art keywords
color filter
substrate
filter layer
photoresist
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/078123
Other languages
English (en)
French (fr)
Inventor
简重光
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HKC Co Ltd
Chongqing HKC Optoelectronics Technology Co Ltd
Original Assignee
HKC Co Ltd
Chongqing HKC Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HKC Co Ltd, Chongqing HKC Optoelectronics Technology Co Ltd filed Critical HKC Co Ltd
Priority to US15/540,998 priority Critical patent/US20180335553A1/en
Publication of WO2018120463A1 publication Critical patent/WO2018120463A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • the present application relates to a manufacturing method, and in particular to a method of manufacturing a color filter layer substrate and a method of manufacturing the same.
  • the traditional liquid crystal panel (Color Filter, CF) manufacturing will produce a yellower process than the three-color filter layer, regardless of the standard process such as color filter or color filter.
  • the Color Filter On Array (COA) process is manufactured by adding a photo spacer (Photo Spacer, PS) to the red/green/blue color photoresist.
  • the function of the photo spacer is to support the liquid crystal.
  • the box is thick. As a result, more materials are needed, management is difficult, manufacturing processes are complicated, and equipment investment is high.
  • an object of the present invention is to provide a method for manufacturing a color filter layer substrate and a method for manufacturing the same for the liquid crystal panel, which can reduce the manufacturing process problem, shorten the production time, and save equipment investment.
  • a method for manufacturing a color filter layer substrate includes: providing a first substrate; sequentially forming a plurality of photoresist layers arranged in parallel on the first substrate to complete a color filter layer Forming a plurality of spacers and one of the photoresist layers by using the same mask while forming one of the photoresist layers, the spacers being formed on the color filter layer, wherein the spacers are formed on the color filter layer
  • One of the photoresist layers is made of the same material as the photo spacers; and a transparent common electrode layer is formed on the color filter layer and the photo spacers.
  • a method for manufacturing a liquid crystal panel comprising: providing a first substrate; sequentially forming a plurality of parallel disposed photoresist layers on the first substrate to complete a color filter layer; forming the photoresist layers One of the same, using the same mask to form a plurality of spacers and one of the photoresist layers, the spacers are formed on the color filter layer, wherein one of the photoresist layers is the same material And forming a transparent common electrode layer disposed on the color filter layer and the photo spacers to complete a color filter layer substrate; providing a thin film transistor substrate, and the color The filter substrate is disposed opposite to each other, wherein the photo spacers are located between the color filter substrate and the thin film transistor substrate to define a liquid crystal space; and a liquid crystal layer is formed The liquid crystal spacer space is filled between the color filter layer substrate and the thin film transistor substrate.
  • the white photoresist and the photo spacer can use the transparent photoresist characteristic to change the mask design during the white photoresist process exposure, and expose the white photoresist position and the photo spacer position, which can be manufactured by a yellow light. At the same time, the white photoresist and the photo spacer are completed.
  • the manufacturing method further includes: forming one of the photoresist layers and the photo spacers simultaneously by the same photoresist coating, exposure, development, and mask process.
  • the reticle in the manufacturing method, is a gray scale reticle or a halftone reticle.
  • the photoresist layer may be a white photoresist layer, and the white photoresist layer is made of the same material as the photo spacers.
  • the photo spacers are designed to be movable structures on top relative positions.
  • This application not only reduces manufacturing process problems, but also simplifies materials, while reducing production time and saving equipment investment.
  • Figure 1a is a schematic cross-sectional view of an exemplary liquid crystal display panel.
  • Figure 1b is a schematic cross-sectional view of a fabrication of an exemplary liquid crystal display panel.
  • Figure 1c is a schematic illustration of an exemplary conventional color filter layer fabrication process.
  • Figure 1d is a schematic illustration of another exemplary conventional color filter layer fabrication process.
  • FIG. 2 is a schematic view showing a manufacturing process of a color filter layer applied to a liquid crystal display panel according to the method of the present application.
  • FIG. 3a is a schematic diagram of white photoresist coating in the process of manufacturing a color filter layer in a conventional liquid crystal display panel.
  • FIG. 3b is a schematic diagram of white photoresist exposure during the manufacturing process of the color filter layer in the conventional liquid crystal display panel.
  • Fig. 3c is a schematic view showing the development of white photoresist in the process of manufacturing a color filter layer in a conventional liquid crystal display panel.
  • 4a is a schematic view showing the application of white photoresist and photo spacer in the process of manufacturing a color filter layer applied to a liquid crystal display panel according to the method of the present application.
  • 4b is a schematic view showing exposure of white photoresist and photo spacer in a color filter layer manufacturing process applied to a liquid crystal display panel according to the method of the present application.
  • 4c is a schematic view showing the development of a white photoresist and a photo spacer in a color filter layer manufacturing process applied to a liquid crystal display panel according to the method of the present application.
  • the word “comprising” is to be understood to include the component, but does not exclude any other component.
  • “on” means located above or below the target component, and does not mean that it must be on the top based on the direction of gravity.
  • the liquid crystal panel of the present application may include a thin film transistor (TFT) substrate, a color filter (CF) substrate, and a liquid crystal layer formed between the two substrates.
  • TFT thin film transistor
  • CF color filter
  • the liquid crystal panel of the present application may be a curved display panel.
  • the thin film transistor (TFT) and the color filter layer (CF) of the present application may be formed on the same substrate.
  • FIG. 1a is a schematic cross-sectional view of an exemplary liquid crystal display panel and FIG. 1b is a schematic cross-sectional view of a manufacturing of an exemplary liquid crystal display panel.
  • a double-gap semi-transverse MVA liquid crystal display is taken as an example.
  • the double-gap half-transflective liquid crystal display is provided with an adjustment layer 208 in the reflection region R.
  • the adjustment layer may be disposed on the color filter layer substrate side or the thin film transistor substrate side.
  • FIG. 1a is a schematic cross-sectional view of an exemplary liquid crystal display panel
  • FIG. 1b is a schematic cross-sectional view of a manufacturing of an exemplary liquid crystal display panel.
  • the double-gap semi-transverse MVA liquid crystal display is taken as an example.
  • the double-gap half-transflective liquid crystal display is provided with an adjustment layer 208 in the reflection region R.
  • the adjustment layer may be disposed on the color filter layer substrate side or the thin film transistor substrate side.
  • the basic structure of the double-gap transflective MVA liquid crystal display comprises a first substrate 10, a color filter layer substrate 202 and a liquid crystal layer 30.
  • the first substrate 10 has a plurality of sub-pixel regions 110, and each of the sub-pixel regions 110 is provided with a reflective region R and a penetrating region T.
  • the color filter layer substrate 202 also has a plurality of sub-pixel regions 120 corresponding to the plurality of sub-pixel regions 110 of the first substrate, and each sub-pixel region 120 corresponds to the reflective region R.
  • An adjustment layer 208 is provided at each location.
  • the liquid crystal layer 30 is disposed between the first substrate 10 and the color filter layer substrate 202.
  • a thin film transistor is disposed in each sub-pixel region 110 of the first substrate 10, and a storage capacitor 308 is disposed below the reflective region R and above the first substrate 100.
  • a surface having irregularities is formed on the flat layer 104 in the reflective region R, and a metal having high reflectance (for example, aluminum, silver, etc.) is plated as the reflective electrode 113 while penetrating each sub-pixel region 110.
  • the region T is also provided with a transparent electrode 114.
  • the reflective region R of each pixel region 110 of the first substrate 10 further has a contact hole 310 for electrically connecting the reflective electrode 113 and the storage capacitor 308.
  • the color filter layer substrate 202 is further provided with an alignment protrusion 122 (Protrusion, PR) at a position relative to the reflection area R and the penetration area T of the first substrate 10. Since the alignment protrusions 122 change the distribution of the power lines, the liquid crystal molecules are tilted in the direction of the alignment protrusions 122 to produce multi-domain liquid crystal alignment (Multi-domains), thereby achieving a wide viewing angle technique and improving single-region liquid crystals. The problem of grayscale inversion when there is a single-domain. As shown in FIG.
  • the color filter layer substrate 202 is further provided with a photo spacer 300 (Photo Spacer, PS) to fix the pitch of the panel (Cell Gap). ).
  • a plurality of platforms corresponding to the spacers 300 are designed on the first substrate side 10 to enable the photo spacers 300 to maintain the panel pitch more stably.
  • a reflective wide viewing angle liquid crystal display panel is taken as an example, the scope of application of the present application is not limited thereto. It is more applicable to the case of a double-gap transflective liquid crystal display panel and a single-gap semi-transparent liquid crystal display panel.
  • FIG. 1c is a schematic illustration of an exemplary conventional color filter layer fabrication process.
  • the color filter layer manufacturing process includes: a light-shielding layer coating, exposure and development manufacturing of the substrate S100; a red photoresist coating of the substrate, exposure and development manufacturing S101; a green photoresist coating of the substrate, Exposure and development manufacturing S102; blue photoresist coating of the substrate, exposure and development manufacturing S103; indium tin oxide coating of the substrate, exposure and development manufacturing S105; photo spacer coating, exposure, and development of the substrate S106.
  • FIG. 1d is a schematic illustration of another exemplary conventional color filter layer fabrication process.
  • the color filter layer substrate manufacturing process includes: light-shielding layer coating, exposure and development of the substrate S100; red photoresist coating, exposure and development of the substrate S101; green light of the substrate S102, resistive coating, exposure and development, S102; blue photoresist coating, exposure and development of substrate S103; white photoresist coating, exposure and development of substrate S104; indium tin oxide coating, exposure and development of substrate S105; photo-distribution coating, exposure, and development of the substrate to produce S106.
  • the conventional liquid crystal panel four-color color filter layer manufacturing will be made more yellow than the three-color color filter layer (for example, white photoresist coating, exposure, and development of the substrate S104).
  • the color filter layer substrate manufacturing process includes: a light shielding layer coating, exposure, and development of a substrate S200; a red photoresist coating of the substrate, exposure, Developing and manufacturing S201; green photoresist coating, exposure and development of the substrate S202; blue photoresist coating, exposure and development of the substrate S203; white photoresist and photo spacer coating, exposure and development of the substrate S204; S205 was produced by coating, exposing, and developing indium tin oxide of the substrate.
  • the difference is in the manufacturing process of the traditional liquid crystal panel four-color color filter layer, because the white photoresist and the photo spacer can use the transparent photoresist characteristic to change the mask design during the white photoresist process exposure, and also for the white The photoresist position and the photo spacer position are exposed, and the white photoresist and the photo spacer can be simultaneously formed by a yellow light (for example, white photoresist of the substrate and photo spacer coating, exposure, and development of S204). manufacture complete.
  • a yellow light for example, white photoresist of the substrate and photo spacer coating, exposure, and development of S204.
  • FIG. 3a is a schematic diagram of white photoresist coating in the process of manufacturing a color filter layer in a conventional liquid crystal display panel
  • FIG. 3b is a schematic diagram of white photoresist exposure in a process of manufacturing a color filter layer in a conventional liquid crystal display panel
  • FIG. 3c is a conventional liquid crystal.
  • the method includes: a first substrate 305; a light shielding layer 310 formed on the first substrate 305; a red, green, and blue photoresist layer 320 formed on the first substrate 305; and a mask 111
  • the white photoresist layer 320 is exposed to light.
  • FIG. 4a is a schematic view showing the application of the white photoresist and the photo spacer in the process of manufacturing the color filter layer in the liquid crystal display panel according to the method of the present application
  • FIG. 4b is a view showing the method applied to the liquid crystal display panel according to the method of the present application.
  • FIG. 4c is a diagram showing white photoresist and photo spacer in color filter layer manufacturing process applied to liquid crystal display panel according to the method of the present application. Development schematic. Referring to FIG. 4a, FIG. 4b and FIG.
  • the color filter layer substrate 11 is coated, exposed, and developed.
  • the method includes: a first substrate 305; a color filter layer 320 disposed on the first substrate 305, and includes a plurality of photoresist layers 320, 330 arranged in parallel; a plurality of photo spacers 340 disposed at the The color filter layers 320, 330, wherein one of the photoresist layers 330 is the same material as the photo spacers 340; a light shielding layer 310 is formed on the first substrate 305; and a transparent common electrode layer (not shown), disposed on the color filter layers 320, 330 and the photo spacers 340.
  • the photoresist layer may be a white photoresist layer 330 , and the material of the white photoresist layer 330 is the same as the photo spacers 340 .
  • the reticle 112 is designed as a multi-gray reticle, and the multi-gray reticle is a gray scale reticle or a halftone reticle.
  • the multi-gray mask can be divided into two types: a gray-tone mask and a half-tone mask.
  • the gray mask is a micro slit that is below the resolution of the exposure machine, and then a part of the light source is blocked by the micro slit portion to achieve a half exposure effect.
  • a halftone mask is a half-exposure using a "semi-transmissive" film. Since both of the above methods can display three types of exposure levels: "exposed portion", "half-exposed portion” and "unexposed portion” after one exposure process, two kinds of thicknesses can be formed after development. Resistance (Using such a difference in photoresist thickness, the pattern can be transferred to the panel substrate in a smaller number of sheets, and the panel production efficiency is improved).
  • a method for manufacturing a color filter layer substrate 11 includes: providing a first substrate 305; sequentially forming a plurality of photoresists arranged in parallel a layer 320 is formed on the first substrate 305 to complete a color filter layer 320, 330; while forming one of the photoresist layers 330, a plurality of spacers 340 and the light are formed by using the same mask.
  • One of the resist layers 330, the spacers are formed on the color filter layers 320, 330, wherein one of the photoresist layers 330 is the same material as the photo spacers 340; and a transparent common electrode is formed A layer (not shown) is disposed on the color filter layers 320, 330 and the photo spacers 340.
  • the white photoresist 330 and the photo spacer 340 can use the transparent photoresist characteristic, the reticle 112 design during the process exposure of the white photoresist 330 is changed, and the position of the white photoresist 330 and the position of the photo spacer 340 are simultaneously By performing exposure, the white photoresist 330 and the photo spacer 340 can be simultaneously fabricated by a yellow light.
  • a photomask 112 is completed, which will result in A film of indium tin oxide (not shown) is disposed on the photo spacer 340.
  • the method for solving the problem is that after the gap pair is set, the opposite position of the photo spacer 340 is designed as a movable structure, and the light can be avoided.
  • the indium tin oxide film (not shown) on the spacer 340 is short-circuited with the array side electrode of the substrate 11.
  • a liquid crystal panel 410 includes: a color filter layer substrate 11, comprising: a first substrate 305; a color filter layer 320, 330 And disposed on the first substrate 305, and includes a plurality of photoresist layers 320, 330 arranged in parallel; a plurality of photo spacers 340 disposed on the color filter layers 320, 330, wherein the photoresists One of the layers 330 is the same material as the photo spacers 340; and a transparent common electrode layer (not shown) is disposed on the color filter layers 320, 330 and the photo spacers 340; a thin film transistor A substrate (not shown) is disposed opposite to the color filter layer substrate 11 , wherein the photo spacers 340 are located between the color filter layer substrate 11 and the thin film transistor substrate (not shown).
  • the liquid crystal layer is disposed between the color filter layer substrate 11 and the thin film transistor substrate (not shown) and fills the liquid crystal spacer space.
  • the photoresist layer may be a white photoresist layer 330 , and the material of the white photoresist layer 330 is the same as the photo spacers 340 .
  • the reticle 112 is designed as a multi-gray reticle, and the multi-gray reticle is a gray scale reticle or a halftone reticle.
  • a method for manufacturing a liquid crystal panel 410 includes: providing a first substrate 305; sequentially forming a plurality of photoresist layers 320 arranged in parallel; 330 on the first substrate 305 to complete a color filter layer 320, 330; while forming one of the photoresist layers 330, using the same mask to form a plurality of spacers 340 and the photoresist One of the layers 330, the spacers are formed on the color filter layers 320, 330, wherein one of the photoresist layers 330 is the same material as the photo spacers 340; forming a transparent common electrode layer ( (not shown), disposed on the color filter layers 320, 330 and the photo spacers 340 to complete a color filter layer substrate 11; providing a thin film transistor substrate (not shown), and the color The filter substrate 11 is disposed opposite to each other, wherein the photo spacers 340 are located
  • the white photoresist 330 and the photo spacer 340 can use the transparent photoresist characteristic, the reticle design during the process exposure of the white photoresist 330 is changed, and the position of the white photoresist 330 and the position of the photo spacer 340 are exposed, that is, The white photoresist 330 and the photo spacer 340 can be fabricated simultaneously by a yellow light.
  • one of the photoresist layers 330 and the photo spacers 340 are coated, exposed, developed, and masked by the same photoresist. The process is formed at the same time.
  • This application can not only reduce the manufacturing process, but also the material can be simplified, while reducing production time and saving equipment investment. Capital.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)

Abstract

一种彩色滤光层基板（11）的制造方法，包括：提供一第一基底（305）；依序形成多个平行配置的光阻层（320,330）于第一基底（305）上，以完成一彩色滤光层（320,330）；在形成光阻层（330）之一的同时，利用同一光罩来形成多个间隔物（340）及光阻层（330）之一，间隔物（340）形成在彩色滤光层（320,330）上，光阻层（330）之一的材料相同于间隔物（340）；以及形成一透明公共电极层，设置在彩色滤光层（320,330）和间隔物（340）上，减少了制造生产流程，缩短了生产时间。

Description

彩色滤光层基板的制造方法及其应用的液晶面板的制造方法 技术领域
本申请涉及一种制造方式，特别是涉及一种彩色滤光层基板的制造方法及其应用的液晶面板的制造方法。
背景技术
随着科技进步，具有省电、无幅射、体积小、低耗电量、平面直角、高分辨率、画质稳定等多项优势的液晶显示器，尤其是现今各式信息产品如：手机、笔记本电脑、数字相机、PDA、液晶屏幕等产品越来越普及，亦使得液晶显示器(LCD)的需求量大大提升。因此如何提升生产制程效率与减少制程流程步骤，将是经营者须面对的经营问题。
而传统的液晶面板四色彩色滤光层(Color Filter，CF)制造将比三色彩色滤光层制造多一道黄光制程，且不论为一般标准制程如：彩色滤光层或彩色滤光层位于阵列上(Color Filter On Array，COA)制程，都需在红色/绿色/蓝色的彩色光阻制造后加上光间隔物(Photo Spacer，PS)制造，其光间隔物的功能为支撑液晶盒厚。如此一来，故需使用较多材料，管控困难，制造流程繁复，设备投资较高。
发明内容
为了解决上述技术问题，本申请的目的在于，提供一种彩色滤光层基板的制造方法及其应用的液晶面板的制造方法，不仅可以减少制造生产流程问题，同时缩短生产时间并节省设备投资。
本申请的目的及解决其技术问题是采用以下技术方案来实现的。依据本申请提出的一种彩色滤光层基板的制造方法，包括：提供一第一基底；依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层；在形成该些光阻层之一的同时，利用同一光罩来形成多个间隔物及该些光阻层之一，该些间隔物是形成在所述彩色滤光层上，其中该些光阻层之一的材料相同于该些光间隔物；以及形成一透明公共电极层，设置在所述彩色滤光层和该些光间隔物上。
一种液晶面板的制造方法，包括：提供一第一基底；依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层；在形成该些光阻层之一的同时，利用同一光罩来形成多个间隔物及该些光阻层之一，该些间隔物是形成在所述彩色滤光层上，其中该些光阻层之一的材料相同于该些光间隔物；以及形成一透明公共电极层，设置在所述彩色滤光层和该些光间隔物上，以完成一彩色滤光层基板；提供一薄膜晶体管基板，与所述彩色滤光层基板对向设置，其中该些光间隔物位于所述彩色滤光层基板以及所述薄膜晶体管基板之间，用以定义一液晶间隔空间；以及形成一液晶层 于所述彩色滤光层基板以及所述薄膜晶体管基板之间，并填满所述液晶间隔空间。且白色光阻与光间隔物都可使用透明光阻特性，改变在白色光阻制程曝光时的光罩设计，同时针对白色光阻位置及光间隔物位置进行曝光，即可经由一道黄光制造同时将白色光阻与光间隔物制作完成。
本申请解决其技术问题还可采用以下技术措施进一步实现。
在本申请的一实施例中，所述制造方法，更包括：该些光阻层之一和该些光间隔物是通过相同的光阻涂布、曝光、显影及光罩过程而同时形成。
在本申请的一实施例中，所述制造方法，所述光罩为灰阶光罩或半色调光罩。
在本申请的一实施例中，所述制造方法，所述光阻层可为白色光阻层，所述白色光阻层的材料相同于该些光间隔物。
在本申请的一实施例中，所述光间隔物对顶相对位置设计为可移动结构。
有益效果
本申请不仅可以减少制造生产流程问题，而材料亦可单一化，同时缩短生产时间并节省设备投资。
附图说明
图1a是范例性的液晶显示面板中横截面示意图。
图1b是范例性的液晶显示面板中的制造横截面示意图。
图1c是范例性的传统彩色滤光层制造过程示意图。
图1d是范例性的另一传统彩色滤光层制造过程示意图。
图2是显示依据本申请的方法，应用于液晶显示面板中的彩色滤光层制造过程示意图。
图3a是传统液晶显示面板中的彩色滤光层制造过程中白色光阻涂布示意图。
图3b是传统液晶显示面板中的彩色滤光层制造过程中白色光阻曝光示意图。
图3c是传统液晶显示面板中的彩色滤光层制造过程中白色光阻显影示意图。
图4a是显示依据本申请的方法，应用于液晶显示面板中的彩色滤光层制造过程中白色光阻及光间隔物涂布示意图。
图4b是显示依据本申请的方法，应用于液晶显示面板中的彩色滤光层制造过程中白色光阻及光间隔物曝光示意图。
图4c是显示依据本申请的方法，应用于液晶显示面板中的彩色滤光层制造过程中白色光阻及光间隔物显影示意图。
本发明的实施方式
以下各实施例的说明是参考附加的图式，用以例示本申请可用以实施的特定实施例。本申请所 提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。
附图和说明被认为在本质上是示出性的，而不是限制性的。在图中，结构相似的单元是以相同标号表示。另外，为了理解和便于描述，附图中示出的每个组件的尺寸和厚度是任意示出的，但是本申请不限于此。
在附图中，为了清晰起见，夸大了层、膜、面板、区域等的厚度。在附图中，为了理解和便于描述，夸大了一些层和区域的厚度。将理解的是，当例如层、膜、区域或基底的组件被称作“在”另一组件“上”时，所述组件可以直接在所述另一组件上，或者也可以存在中间组件。
另外，在说明书中，除非明确地描述为相反的，否则词语“包括”将被理解为意指包括所述组件，但是不排除任何其它组件。此外，在说明书中，“在......上”意指位于目标组件上方或者下方，而不意指必须位于基于重力方向的顶部上。
为更进一步阐述本申请为达成预定发明目的所采取的技术手段及功效，以下结合附图及较佳实施例，对依据本申请提出的一种彩色滤光层基板的制造方法及其应用的液晶面板的制造方法，其具体实施方式、结构、特征及其功效，详细说明如后。
本申请的液晶面板可包括薄膜晶体管(Thin Film Transistor，TFT)基板、彩色滤光层(Color Filter，CF)基板与形成于两基板之间的液晶层。
在一实施例中，本申请的液晶面板可为曲面型显示面板。
在一实施例中，本申请的薄膜晶体管(TFT)及彩色滤光层(CF)可形成于同一基板上。
图1a为范例性的液晶显示面板中横截面示意图及图1b为范例性的液晶显示面板中的制造横截面示意图。请参照图1a及图1b，在目前的液晶显示器的技术发展上，以双间隙(Dual Gap)的半穿半反MVA液晶显示器为例。通常双间隙的半穿半反液晶显示器会在反射区R设置一个调整层208，如图1a所示，此调整层可以设置在彩色滤光层基板侧或薄膜晶体管基板侧。如图1a所示，双间隙半穿半反MVA液晶显示器的基本结构包括一第一基板10、一彩色滤光层基板202及一液晶层30。其中，第一基板10具有多个次画素区110，每一个次画素区110均设有一反射区R以及一穿透区T。彩色滤光层基板202亦具有多个次画素区120，该些次画素区120分别与第一基板的多个次画素区110相对应，且每一个次画素区120在与反射区R相对应的位置处均设有一调整层208。液晶层30则设于第一基板10与彩色滤光层基板202之间。
请继续参考图1a及图1b，第一基板10的各个次画素区110内都设有一薄膜晶体管，以及一储存电容308于反射区R的下方及第一基底100的上方。接着形成一平坦层104于第一基板10的 上表面。然后在平坦层104上制作出凹凸的表面于反射区R，再镀上具有高反射率的金属(例如：铝、银…等)当作反射电极113，同时每一个次画素区110的穿透区T亦均设有一透明电极114。值得一提的是，第一基板10各次画素区110的反射区R内更具有一接触孔310，用以电性连接反射电极113与储存电容308。另外，彩色滤光层基板202相对于第一基板10的反射区R与穿透区T的位置上更设有一配向凸起物122(Protrusion，PR)。由于配向凸起物122会改变电力线的分布，使得液晶分子往配向凸起物122的方向倾斜以产生多区域液晶配向(Multi-domains)的效果，而达到广视角的技术，并改善单一区域液晶配向(Single-domain)时所存在的灰阶反转的问题。如图1b所示，通常在组立第一基板10与彩色滤光层基板202时，彩色滤光层基板202更设有一光间隔物300(Photo Spacer，PS)来固定面板的间距(Cell Gap)。并在第一基板侧10设计多个与间隔物300相对应的平台，使光间隔物300能够更稳定的维持面板间距。以上所述，虽以反射式广视角液晶显示面板为例来作一说明，但本申请的应用范围并不仅限于此。其更可应用于双间隙半穿半反液晶显示面板以及单间隙(Single Gap)半穿半反液晶显示面板的情况。
图1c为范例性的传统彩色滤光层制造过程示意图。请参照图1c，所述彩色滤光层制造过程包括：基板的遮光层涂布、曝光、显影制造S100；基板的红色光阻涂布、曝光、显影制造S101；基板的绿色光阻涂布、曝光、显影制造S102；基板的蓝色光阻涂布、曝光、显影制造S103；基板的氧化铟锡涂布、曝光、显影制造S105；基板的光间隔物涂布、曝光、显影制造S106。
图1d为范例性的另一传统彩色滤光层制造过程示意图。请参照图1c及图1d，所述彩色滤光层基板制造过程包括：基板的遮光层涂布、曝光、显影制造S100；基板的红色光阻涂布、曝光、显影制造S101；基板的绿色光阻涂布、曝光、显影制造S102；基板的蓝色光阻涂布、曝光、显影制造S103；基板的白色光阻涂布、曝光、显影制造S104；基板的氧化铟锡涂布、曝光、显影制造S105；基板的光间隔物涂布、曝光、显影制造S106。其差异在传统的液晶面板四色彩色滤光层制造将比三色彩色滤光层制造将多一道黄光制造(如：基板的白色光阻涂布、曝光、显影制造S104)。
图2为显示依据本申请的方法，应用于液晶显示面板中的彩色滤光层制造过程示意图。请参照图1d及图2，在本申请一实施例中，所述彩色滤光层基板制造过程包括：基板的遮光层涂布、曝光、显影制造S200；基板的红色光阻涂布、曝光、显影制造S201；基板的绿色光阻涂布、曝光、显影制造S202；基板的蓝色光阻涂布、曝光、显影制造S203；基板的白色光阻及光间隔物涂布、曝光、显影制造S204；基板的氧化铟锡涂布、曝光、显影制造S205。其差异在跟传统的液晶面板四色彩色滤光层制造过程中，因白色光阻与光间隔物都可使用透明光阻特性，改变在白色光阻制程曝光时的光罩设计，同时针对白色光阻位置及光间隔物位置进行曝光，即可经由一道黄光制造(如：基板的白色光阻及光间隔物涂布、曝光、显影制造S204)即可同时将白色光阻与光间隔物制作完成。
图3a为传统液晶显示面板中的彩色滤光层制造过程中白色光阻涂布示意图、图3b为传统液晶显示面板中的彩色滤光层制造过程中白色光阻曝光示意图及图3c为传统液晶显示面板中的彩色滤光层制造过程中白色光阻显影示意图。请参照图3a、图3b及图3c，在一实施例中，在传统液晶显示面板400中，基板11的白色光阻330涂布、曝光、显影制造S104中，一种彩色滤光层基板11，包括：一第一基底305；一遮光层310形成于所述第一基底305上；一红色、绿色、蓝色光阻层320形成于所述第一基底305上；以及一光罩111用以使白色光阻层320曝光制造。
图4a为显示依据本申请的方法，应用于液晶显示面板中的彩色滤光层制造过程中白色光阻及光间隔物涂布示意图、图4b为显示依据本申请的方法，应用于液晶显示面板中的彩色滤光层制造过程中白色光阻及光间隔物曝光示意图及图4c为显示依据本申请的方法，应用于液晶显示面板中的彩色滤光层制造过程中白色光阻及光间隔物显影示意图。请参照图4a、图4b及图4c，在本申请一实施例中，在基板11的白色光阻330及光间隔物340涂布、曝光、显影制造S204中，一种彩色滤光层基板11，包括：一第一基底305；一彩色滤光层320，设置在所述第一基底305上，并包括多个平行配置的光阻层320、330；多个光间隔物340，设置在所述彩色滤光层320、330上，其中该些光阻层之一330的材料相同于该些光间隔物340；一遮光层310形成于所述第一基底305上；以及一透明公共电极层(图未示)，设置在所述彩色滤光层320、330和该些光间隔物340上。所述光阻层可为白色光阻层330，所述白色光阻层330的材料相同于该些光间隔物340。所述光罩112设计为多灰阶光罩，所述多灰阶光罩为灰阶光罩或半色调光罩。
多灰阶光罩，可分为灰色光罩(Gray-tone Mask)和半色调光罩(Half Tone Mask)2种。灰色光罩是制作出曝光机分辨率以下的微缝，再通过此微缝部位遮住一部份的光源，以达成半曝光的效果。另一方面，半色调光罩是利用「半透过」的膜，来进行半曝光。因为以上两种方式都是在1次的曝光过程后即可呈现出「曝光部分」「半曝光部分」及「未曝光部分」3种的曝光层次，故在显影后能够形成2种厚度的光阻(利用这样的光阻厚度差异、便可以较一般少的片数下将图形转写至面板基板上，并达成面板生产效率的提升)。
请参照图4a、图4b及图4c，在本申请一实施例中，一种彩色滤光层基板11的制造方法，包括：提供一第一基底305；依序形成多个平行配置的光阻层320于所述第一基底305上，以完成一彩色滤光层320、330；在形成该些光阻层之一330的同时，利用同一光罩来形成多个间隔物340及该些光阻层之一330，该些间隔物是形成在所述彩色滤光层320、330上，其中该些光阻层之一330的材料相同于该些光间隔物340；以及形成一透明公共电极层(图未示)，设置在所述彩色滤光层320、330和该些光间隔物340上。并因白色光阻330与光间隔物340都可使用透明光阻特性，改变在白色光阻330制程曝光时的光罩112设计，同时针对白色光阻330位置及光间隔物340位置 进行曝光，即可经由一道黄光制造即可同时将白色光阻330与光间隔物340制作完成。
请参照图4a、图4b及图4c，在本申请一实施例中，在基板11的白色光阻330及光间隔物340涂布、曝光、显影制造中，以一道光罩112完成，将造成光间隔物340上会有一层氧化铟锡薄膜(图未示)，解决此问题方法可于间隙对组后，所述光间隔物340对顶相对位置设计为可移动结构，可避免所述光间隔物340上的氧化铟锡薄膜(图未示)与基板11阵列侧电极短路问题。
请参照图4a、图及图4c，在本申请一实施例中，一种液晶面板410，包括：一彩色滤光层基板11，包括：一第一基底305；一彩色滤光层320、330，设置在所述第一基底305上，并包括多个平行配置的光阻层320、330；多个光间隔物340，设置在所述彩色滤光层320、330上，其中该些光阻层之一330的材料相同于该些光间隔物340；以及一透明公共电极层(图未示)，设置在所述彩色滤光层320、330和该些光间隔物340上；一薄膜晶体管基板(图未示)，与所述彩色滤光层基板11对向设置，其中该些光间隔物340位于所述彩色滤光层基板11以及所述薄膜晶体管基板(图未示)之间，用以定义一液晶间隔空间；以及一液晶层位于所述彩色滤光层基板11以及所述薄膜晶体管基板(图未示)之间，并填满所述液晶间隔空间。所述光阻层可为白色光阻层330，所述白色光阻层330的材料相同于该些光间隔物340。所述光罩112设计为多灰阶光罩，所述多灰阶光罩为灰阶光罩或半色调光罩。
请参照图4a、图4b及图4c，在本申请一实施例中，一种液晶面板410的制造方法，包括：提供一第一基底305；依序形成多个平行配置的光阻层320、330于所述第一基底305上，以完成一彩色滤光层320、330；在形成该些光阻层之一330的同时，利用同一光罩来形成多个间隔物340及该些光阻层之一330，该些间隔物是形成在所述彩色滤光层320、330上，其中该些光阻层之一330的材料相同于该些光间隔物340；形成一透明公共电极层(图未示)，设置在所述彩色滤光层320、330和该些光间隔物340上，以完成一彩色滤光层基板11；提供一薄膜晶体管基板(图未示)，与所述彩色滤光层基板11对向设置，其中该些光间隔物340位于所述彩色滤光层基板11以及所述薄膜晶体管基板(图未示)之间，用以定义一液晶间隔空间；以及形成一液晶层于所述彩色滤光层基板11以及所述薄膜晶体管基板(图未示)之间，并填满所述液晶间隔空间。且因白色光阻330与光间隔物340都可使用透明光阻特性，改变在白色光阻330制程曝光时的光罩设计，同时针对白色光阻330位置及光间隔物340位置进行曝光，即可经由一道黄光制造即可同时将白色光阻330与光间隔物340制作完成。
请参照图4a、图4b及图4c，在本申请的一实施例中，该些光阻层之一330和该些光间隔物340是通过相同的光阻涂布、曝光、显影及光罩过程而同时形成。
本申请不仅可以减少制造生产流程问题，而材料亦可单一化，同时缩短生产时间并节省设备投 资。
“在一些实施例中”及“在各种实施例中”等用语被重复地使用。此用语通常不是指相同的实施例；但它亦可以是指相同的实施例。“包含”、“具有”及“包括”等用词是同义词，除非其前后文意显示出其它意思。
以上所述，仅是本申请的较佳实施例而已，并非对本申请作任何形式上的限制，虽然本申请已以较佳实施例揭露如上，然而并非用以限定本申请，任何熟悉本专业的技术人员，在不脱离本申请技术方案范围内，当可利用上述揭示的技术内容作出些许更动或修饰为等同变化的等效实施例，但凡是未脱离本申请技术方案的内容，依据本申请的技术实质对以上实施例所作的任何简单修改、等同变化与修饰，均仍属于本申请技术方案的范围内。

Claims (15)

  1. 一种彩色滤光层基板的制造方法，包括：
    提供一第一基底；
    依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层；
    在形成该些光阻层之一的同时，利用同一光罩来形成多个间隔物及该些光阻层之一，该些间隔物是形成在所述彩色滤光层上，其中该些光阻层之一的材料相同于该些光间隔物；以及
    形成一透明公共电极层，设置在所述彩色滤光层和该些光间隔物上。
  2. 如权利要求1所述的彩色滤光层基板的制造方法，其中所述光阻层包括白色光阻层。
  3. 如权利要求2所述的彩色滤光层基板的制造方法，其中所述白色光阻层的材料相同于该些光间隔物。
  4. 如权利要求2所述的彩色滤光层基板的制造方法，其中所述光阻层依序形成于所述第一基底上，所述白色光阻层及所述光间隔物，通过所述同一光罩形成。
  5. 如权利要求1所述的彩色滤光层基板的制造方法，其中该些光阻层之一和该些光间隔物是通过相同的光阻涂布、曝光、显影及光罩过程而同时形成。
  6. 如权利要求1所述彩色滤光层基板的制造方法，其中所述光罩为灰阶光罩。
  7. 如权利要求1所述彩色滤光层基板的制造方法，其中所述光罩为半色调光罩。
  8. 一种液晶面板的制造方法，包括：
    提供一第一基底；
    依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层；
    在形成该些光阻层之一的同时，利用同一光罩来形成多个间隔物及该些光阻层之一，该些间隔物是形成在所述彩色滤光层上，其中该些光阻层之一的材料相同于该些光间隔物；以及
    形成一透明公共电极层，设置在所述彩色滤光层和该些光间隔物上，以完成一彩色滤光层基板；
    提供一薄膜晶体管基板，与所述彩色滤光层基板对向设置，其中该些光间隔物位于所述彩色滤光层基板以及所述薄膜晶体管基板之间，用以定义一液晶间隔空间；以及
    形成一液晶层于所述彩色滤光层基板以及所述薄膜晶体管基板之间，并填满所述液晶间隔空间。
  9. 如权利要求8所述的液晶面板的制造方法，其中所述光阻层包括白色光阻层。
  10. 如权利要求9所述的液晶面板的制造方法，其中所述白色光阻层的材料相同于该些光间隔物。
  11. 如权利要求9所述的液晶面板的制造方法，其中所述光阻层依序形成于所述第一基底上，所述白色光阻层及所述光间隔物，通过所述同一光罩形成。
  12. 如权利要求8所述的液晶面板的制造方法，其中该些光阻层之一和该些光间隔物是通过相同的光阻涂布、曝光、显影及光罩过程而同时形成。
  13. 如权利要求8所述液晶面板的制造方法，其中所述光罩为灰阶光罩。
  14. 如权利要求8所述液晶面板的制造方法，其中所述光罩为半色调光罩。
  15. 一种彩色滤光层基板的制造方法，包括：
    提供一第一基底；
    依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层；
    在形成该些光阻层之一的同时，利用同一光罩来形成多个间隔物及该些光阻层之一，该些间隔物是形成在所述彩色滤光层上，其中该些光阻层之一的材料相同于该些光间隔物；以及
    形成一透明公共电极层，设置在所述彩色滤光层和该些光间隔物上；
    所述光阻层为白色光阻层，所述白色光阻层的材料相同于该些光间隔物；
    该些光阻层之一和该些光间隔物是通过相同的光阻涂布、曝光、显影及光罩过程而同时形成；
    所述光罩为半色调光罩；
    其中，所述光间隔物对顶相对位置为可移动结构。
PCT/CN2017/078123 2016-12-29 2017-03-24 彩色滤光层基板的制造方法及其应用的液晶面板的制造方法 Ceased WO2018120463A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/540,998 US20180335553A1 (en) 2016-12-29 2017-03-24 Method for manufacturing color filter substrate and method for manufacturing liquid crystal panel

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201611249667.0 2016-12-29
CN201611249667.0A CN106526953A (zh) 2016-12-29 2016-12-29 彩色滤光层基板的制造方法

Publications (1)

Publication Number Publication Date
WO2018120463A1 true WO2018120463A1 (zh) 2018-07-05

Family

ID=58338559

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/078123 Ceased WO2018120463A1 (zh) 2016-12-29 2017-03-24 彩色滤光层基板的制造方法及其应用的液晶面板的制造方法

Country Status (3)

Country Link
US (1) US20180335553A1 (zh)
CN (1) CN106526953A (zh)
WO (1) WO2018120463A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106526953A (zh) * 2016-12-29 2017-03-22 惠科股份有限公司 彩色滤光层基板的制造方法
CN107145035A (zh) * 2017-03-30 2017-09-08 惠科股份有限公司 光罩及其主动开关阵列基板的制造方法
CN106950736A (zh) * 2017-04-05 2017-07-14 惠科股份有限公司 触碰面板及其制造方法
CN107085321A (zh) * 2017-05-02 2017-08-22 惠科股份有限公司 光罩及其应用于主动开关阵列基板的制造方法
CN109003542A (zh) * 2018-07-19 2018-12-14 武汉华星光电半导体显示技术有限公司 显示面板及显示装置
CN109272870B (zh) * 2018-10-08 2021-08-31 惠科股份有限公司 一种显示面板和制作方法
CN109254446A (zh) * 2018-10-24 2019-01-22 惠科股份有限公司 基板及显示面板的制造方法
US11300838B1 (en) * 2020-11-18 2022-04-12 Innolux Corporation Transparent display
CN113189812B (zh) * 2021-04-29 2022-11-29 滁州惠科光电科技有限公司 彩色滤光层制作方法、相关基板及其制作方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1621917A (zh) * 2003-11-27 2005-06-01 Lg.菲利浦Lcd株式会社 滤色器阵列基板及其制造方法
CN1797117A (zh) * 2004-12-29 2006-07-05 Lg.菲利浦Lcd株式会社 液晶显示装置及其制造方法
US8184243B2 (en) * 2008-10-06 2012-05-22 Samsung Electronics Co., Ltd. Liquid crystal display and manufacturing method thereof
CN104503150A (zh) * 2014-12-04 2015-04-08 深圳市华星光电技术有限公司 液晶面板及其制作方法
CN104749814A (zh) * 2013-12-31 2015-07-01 乐金显示有限公司 Cot型液晶显示装置
CN104965333A (zh) * 2015-07-15 2015-10-07 深圳市华星光电技术有限公司 Coa型液晶显示面板及其制作方法
CN105319760A (zh) * 2014-07-30 2016-02-10 三星显示有限公司 液晶显示面板
CN106526953A (zh) * 2016-12-29 2017-03-22 惠科股份有限公司 彩色滤光层基板的制造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6281690B1 (en) * 1996-07-19 2001-08-28 Lockheed Martin Corporation Coaxial radio frequency test probe
JPH11311786A (ja) * 1998-02-27 1999-11-09 Sharp Corp 液晶表示装置およびその製造方法
KR100482469B1 (ko) * 2000-11-25 2005-04-14 비오이 하이디스 테크놀로지 주식회사 크로스 토크 방지용 액정표시장치 제조방법
KR101033461B1 (ko) * 2003-12-23 2011-05-11 엘지디스플레이 주식회사 액정표시장치 및 그 제조방법
KR20060101084A (ko) * 2005-03-19 2006-09-22 엘지.필립스 엘시디 주식회사 컬러필터 기판과 그 제조방법
KR20070037114A (ko) * 2005-09-30 2007-04-04 엘지.필립스 엘시디 주식회사 액정 표시 장치 및 그의 제조 방법
CN100405167C (zh) * 2006-04-24 2008-07-23 友达光电股份有限公司 彩色滤光基板及其制造方法
KR20080058538A (ko) * 2006-12-22 2008-06-26 엘지디스플레이 주식회사 평판 표시 장치 및 이의 제조 방법, 이를 이용한 액정 표시장치의 제조 방법
US9030767B2 (en) * 2012-05-11 2015-05-12 Shenzhen China Star Optoelectronics Technology Co Ltd. Color filter and manufacturing method thereof
US9116297B2 (en) * 2013-01-09 2015-08-25 Shenzhen China Star Optoelectronics Technology Co., Ltd. Color filter substrate, manufacturing method thereof and liquid crystal panel
CN104317098A (zh) * 2014-11-05 2015-01-28 京东方科技集团股份有限公司 显示基板及其制备方法
CN104678639A (zh) * 2014-12-30 2015-06-03 深圳市华星光电技术有限公司 一种彩色滤光片基板的制作方法
CN105259692A (zh) * 2015-10-28 2016-01-20 信利（惠州）智能显示有限公司 一种彩色滤光片制作方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1621917A (zh) * 2003-11-27 2005-06-01 Lg.菲利浦Lcd株式会社 滤色器阵列基板及其制造方法
CN1797117A (zh) * 2004-12-29 2006-07-05 Lg.菲利浦Lcd株式会社 液晶显示装置及其制造方法
US8184243B2 (en) * 2008-10-06 2012-05-22 Samsung Electronics Co., Ltd. Liquid crystal display and manufacturing method thereof
CN104749814A (zh) * 2013-12-31 2015-07-01 乐金显示有限公司 Cot型液晶显示装置
CN105319760A (zh) * 2014-07-30 2016-02-10 三星显示有限公司 液晶显示面板
CN104503150A (zh) * 2014-12-04 2015-04-08 深圳市华星光电技术有限公司 液晶面板及其制作方法
CN104965333A (zh) * 2015-07-15 2015-10-07 深圳市华星光电技术有限公司 Coa型液晶显示面板及其制作方法
CN106526953A (zh) * 2016-12-29 2017-03-22 惠科股份有限公司 彩色滤光层基板的制造方法

Also Published As

Publication number Publication date
US20180335553A1 (en) 2018-11-22
CN106526953A (zh) 2017-03-22

Similar Documents

Publication Publication Date Title
WO2018120463A1 (zh) 彩色滤光层基板的制造方法及其应用的液晶面板的制造方法
JP4712060B2 (ja) カラーフィルタ基板およびその製造方法ならびにそれを備えた表示装置
US7212262B2 (en) Liquid crystal display device and method of fabricating the same
CN103268037B (zh) 一种彩膜基板、制备方法以及显示装置
WO2017008369A1 (zh) Coa型液晶显示面板及其制作方法
CN100498487C (zh) 液晶面板及其制造方法
US7102717B2 (en) Method of forming a color filter having various thicknesses and a transflective LCD with the color filter
US12366776B2 (en) Display substrate and manufacturing method therefor, and display device
CN107450224B (zh) Coa型阵列基板的制备方法
CN108535909A (zh) Bps型阵列基板的制作方法及bps型阵列基板
WO2018196052A1 (zh) 液晶面板及其制造方法
WO2018176603A1 (zh) 光罩及其主动开关阵列基板的制造方法
JP4134106B2 (ja) カラーフィルタ基板およびその製造方法ならびにそれを備えた表示装置
US9513413B2 (en) Display device, color filter substrate and manufacturing method thereof
US20180188597A1 (en) Color filter substrate, method for manufacturing the same and display device
WO2019085224A1 (zh) 阵列基板及显示面板
TWI375839B (en) Liquid crystal panel and method of making the same
WO2019085292A1 (zh) 主动开关阵列基板及其制造方法和液晶面板
CN102135678A (zh) 彩色滤光片及其制造方法、液晶显示装置
WO2018201545A1 (zh) 光罩及其应用于主动开关阵列基板的制造方法
CN106855673A (zh) 主动开关阵列基板及其制造方法与其应用的显示设备
TWI408470B (zh) 液晶面板及其製造方法
TW202111397A (zh) 畫素陣列基板
US20070247572A1 (en) Transflective liquid crystal displays and methods for fabricating the same
WO2020037741A1 (zh) Tft阵列基板及其制作方法

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 15540998

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17888865

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17888865

Country of ref document: EP

Kind code of ref document: A1