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WO2018105249A9 - 弾性波装置、高周波フロントエンド回路及び通信装置 - Google Patents

弾性波装置、高周波フロントエンド回路及び通信装置 Download PDF

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Publication number
WO2018105249A9
WO2018105249A9 PCT/JP2017/037941 JP2017037941W WO2018105249A9 WO 2018105249 A9 WO2018105249 A9 WO 2018105249A9 JP 2017037941 W JP2017037941 W JP 2017037941W WO 2018105249 A9 WO2018105249 A9 WO 2018105249A9
Authority
WO
WIPO (PCT)
Prior art keywords
piezoelectric substrate
electrode layer
acoustic wave
silicon oxide
wave device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2017/037941
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English (en)
French (fr)
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WO2018105249A1 (ja
Inventor
高橋 秀明
広和 阪口
康晴 中井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP2018554853A priority Critical patent/JP6922931B2/ja
Priority to KR1020197014047A priority patent/KR102311837B1/ko
Priority to CN201780073197.3A priority patent/CN110024287B/zh
Publication of WO2018105249A1 publication Critical patent/WO2018105249A1/ja
Priority to US16/429,098 priority patent/US11595024B2/en
Anticipated expiration legal-status Critical
Publication of WO2018105249A9 publication Critical patent/WO2018105249A9/ja
Ceased legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02543Characteristics of substrate, e.g. cutting angles
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02543Characteristics of substrate, e.g. cutting angles
    • H03H9/02559Characteristics of substrate, e.g. cutting angles of lithium niobate or lithium-tantalate substrates
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02614Treatment of substrates, e.g. curved, spherical, cylindrical substrates ensuring closed round-about circuits for the acoustical waves
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02818Means for compensation or elimination of undesirable effects
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02818Means for compensation or elimination of undesirable effects
    • H03H9/02834Means for compensation or elimination of undesirable effects of temperature influence
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02818Means for compensation or elimination of undesirable effects
    • H03H9/02944Means for compensation or elimination of undesirable effects of ohmic loss
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/125Driving means, e.g. electrodes, coils
    • H03H9/145Driving means, e.g. electrodes, coils for networks using surface acoustic waves
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/125Driving means, e.g. electrodes, coils
    • H03H9/145Driving means, e.g. electrodes, coils for networks using surface acoustic waves
    • H03H9/14538Formation
    • H03H9/14541Multilayer finger or busbar electrode
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/25Constructional features of resonators using surface acoustic waves
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46Filters
    • H03H9/64Filters using surface acoustic waves
    • H03H9/6423Means for obtaining a particular transfer characteristic
    • H03H9/6433Coupled resonator filters
    • H03H9/6483Ladder SAW filters
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/70Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
    • H03H9/72Networks using surface acoustic waves
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/70Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
    • H03H9/72Networks using surface acoustic waves
    • H03H9/725Duplexers
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46Filters
    • H03H9/64Filters using surface acoustic waves
    • H03H9/6489Compensation of undesirable effects

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

低損失であり、周波数温度特性に優れており、高次モードによるスプリアスが生じ難く、かつIMDの劣化を抑制することができる、弾性波装置を提供する。 圧電基板2と、圧電基板2上に設けられたIDT電極3と、圧電基板2上において、IDT電極3を覆うように設けられている、酸化ケイ素膜6と、を備え、IDT電極3が、第1の電極層と、第1の電極層上に積層された第2の電極層とを有し、第1の電極層が、第2の電極層を構成している金属及び酸化ケイ素膜6を構成している酸化ケイ素よりも密度の高い金属若しくは合金により構成されており、圧電基板2が、LiNbO3により構成されており、圧電基板2のオイラー角(0°±5°,θ,0°±10°)において、θが8°以上、32°以下の範囲内にあり、酸化ケイ素膜6が、水素原子、水酸基またはシラノール基を含有している、弾性波装置1。
PCT/JP2017/037941 2016-12-05 2017-10-20 弾性波装置、高周波フロントエンド回路及び通信装置 Ceased WO2018105249A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2018554853A JP6922931B2 (ja) 2016-12-05 2017-10-20 弾性表面波装置、高周波フロントエンド回路及び通信装置
KR1020197014047A KR102311837B1 (ko) 2016-12-05 2017-10-20 탄성파 장치, 고주파 프론트 엔드 회로 및 통신 장치
CN201780073197.3A CN110024287B (zh) 2016-12-05 2017-10-20 弹性波装置、高频前端电路以及通信装置
US16/429,098 US11595024B2 (en) 2016-12-05 2019-06-03 Elastic wave device, high-frequency front end circuit, and communication apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-235936 2016-12-05
JP2016235936 2016-12-05

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US16/429,098 Continuation US11595024B2 (en) 2016-12-05 2019-06-03 Elastic wave device, high-frequency front end circuit, and communication apparatus

Publications (2)

Publication Number Publication Date
WO2018105249A1 WO2018105249A1 (ja) 2018-06-14
WO2018105249A9 true WO2018105249A9 (ja) 2019-11-28

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US (1) US11595024B2 (ja)
JP (1) JP6922931B2 (ja)
KR (1) KR102311837B1 (ja)
CN (1) CN110024287B (ja)
WO (1) WO2018105249A1 (ja)

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* Cited by examiner, † Cited by third party
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US11489513B2 (en) * 2018-11-16 2022-11-01 Skyworks Solutions, Inc. Multi-mode surface acoustic wave filter
JP6977703B2 (ja) 2018-12-10 2021-12-08 株式会社村田製作所 弾性波装置、高周波フロントエンド回路及び通信装置
JP2020096220A (ja) 2018-12-10 2020-06-18 株式会社村田製作所 弾性波装置、高周波フロントエンド回路及び通信装置
JP7468627B2 (ja) * 2020-03-31 2024-04-16 株式会社村田製作所 マルチプレクサ
CN113346867B (zh) * 2021-05-27 2024-04-12 北京超材信息科技有限公司 声表面波装置
US20240258994A1 (en) * 2023-01-31 2024-08-01 Skyworks Solutions, Inc. Acoustic wave device with interdigital transducer electrode having seed layer
CN120528396A (zh) * 2024-02-22 2025-08-22 华为技术有限公司 弹性波器件,电路和电子设备

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DE112004001841B4 (de) 2003-10-03 2009-03-12 Murata Mfg. Co., Ltd., Nagaokakyo-shi Oberflächenwellenbauelement
WO2006123585A1 (ja) * 2005-05-20 2006-11-23 Murata Manufacturing Co., Ltd. 弾性境界波装置
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JP2010283807A (ja) * 2009-05-08 2010-12-16 Murata Mfg Co Ltd 弾性表面波装置
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WO2011158445A1 (ja) * 2010-06-17 2011-12-22 パナソニック株式会社 弾性波素子
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JP5672050B2 (ja) * 2011-02-21 2015-02-18 株式会社村田製作所 弾性表面波フィルタ装置
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Also Published As

Publication number Publication date
WO2018105249A1 (ja) 2018-06-14
JP6922931B2 (ja) 2021-08-18
KR102311837B1 (ko) 2021-10-13
KR20190066053A (ko) 2019-06-12
JPWO2018105249A1 (ja) 2019-07-11
CN110024287B (zh) 2023-09-26
US20190288668A1 (en) 2019-09-19
US11595024B2 (en) 2023-02-28
CN110024287A (zh) 2019-07-16

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