[go: up one dir, main page]

WO2018174810A1 - Procédé de production d'un panneau de solaire transparent - Google Patents

Procédé de production d'un panneau de solaire transparent Download PDF

Info

Publication number
WO2018174810A1
WO2018174810A1 PCT/SE2018/050317 SE2018050317W WO2018174810A1 WO 2018174810 A1 WO2018174810 A1 WO 2018174810A1 SE 2018050317 W SE2018050317 W SE 2018050317W WO 2018174810 A1 WO2018174810 A1 WO 2018174810A1
Authority
WO
WIPO (PCT)
Prior art keywords
solar panel
mask
solar cells
transparent
abrasive blasting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/SE2018/050317
Other languages
English (en)
Inventor
Johan MATHIASSON
Peter Neretnieks
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Solibro Res AB
Solibro Research AB
Original Assignee
Solibro Res AB
Solibro Research AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solibro Res AB, Solibro Research AB filed Critical Solibro Res AB
Publication of WO2018174810A1 publication Critical patent/WO2018174810A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/30Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells
    • H10F19/31Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells having multiple laterally adjacent thin-film photovoltaic cells deposited on the same substrate
    • H10F19/33Patterning processes to connect the photovoltaic cells, e.g. laser cutting of conductive or active layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/30Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells
    • H10F19/31Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells having multiple laterally adjacent thin-film photovoltaic cells deposited on the same substrate
    • H10F19/37Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells having multiple laterally adjacent thin-film photovoltaic cells deposited on the same substrate comprising means for obtaining partial light transmission through the integrated devices, or the assemblies of multiple devices, e.g. partially transparent thin-film photovoltaic modules for windows
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Definitions

  • the present invention relates to a method for producing a transparent solar panel.
  • BACKGROUND The use of building integrated solar panels is increasing, giving the advantage of using available exterior wall space for the production of renewable energy. This is especially beneficial in larger cities with tall buildings having large surface areas that are well suited for holding solar panels.
  • buildings must produce a certain amount of energy and in order to meet these demands it could be necessary to use not only walls but also other space for placing solar panels. If the solar panels could be made at least partly transparent, it would be possible to use windows for energy production and still let sufficient light through to create a desirable indoor environment.
  • a number of methods are known for creating transparent solar panels, for instance through US6858461 and US20110100432. Often, a part of the surface is treated by laser scribing or etching in order to remove the solar cells and expose the glass substrate beneath, rendering that part of the surface transparent. The capacity of the solar panel is lowered considerably, since the exposed area and often also regions bordering on the exposed area no longer produce energy. Since the solar cells are generally sensitive to the scribing or etching, there is also a risk of damaging the remaining cells by this process. Furthermore, the methods are expensive and time consuming, making the resulting partly transparent solar panels less attractive to the end customer.
  • the object of the present invention is to eliminate or at least to minimize the problems mentioned above. This is achieved through a method according to the appended claim 1. Thanks to the invention, a cost effective and efficient method for removal of thin film solar cells from the solar panel can be used with high precision, namely abrasive blasting. By using a transparent adhesive for laminating the front glass, the roughness created on the surface of the glass substrate can be smoothed out, resulting in a solar panel with good transparency properties while at the same time leaving the remaining solar cells intact for energy production. This method is both time and cost efficient and results in high quality solar panels with transparent properties.
  • a mask is applied by screen printing, thereby giving the advantages of a mask that lies directly on the solar panel without gaps where particles from the blasting could penetrate and damage the solar cells.
  • Another significant advantage is that the screen printing enables masking the solar panel with high precision even in cases where warping of the substrate has occurred during manufacture of the solar panel.
  • the application and removal of a screen printed mask on thin-film solar cells, particularly CIGS cells would damage the solar cells.
  • the present inventors have found, however, that despite this it is indeed possible to perform the steps of the inventive method without damaging the solar cells and without the abrasive blasting penetrating through the mask or through a gap between the mask and underlying solar cells. This gives the combined advantage of a safe, reliable and cost effective manufacturing process for a transparent solar panel.
  • the abrasive blasting is performed at a pressure of less than 10 bar, preferably less than 7 bar and more preferably less than 5 bar.
  • the solar cells can be removed in an efficient and reliable manner, while at the same time minimizing damage to solar cells protected by the mask. It is especially beneficial to use a negative pressure where the abrasive is sucked towards the solar cell.
  • the abrasive blasting is performed using AI203, preferably having a grain size of 10-100 ⁇ , more preferably 44-74 ⁇ . This is a material allowing for high precision and excellent performance, and also without risking damage to surrounding solar cells.
  • the abrasive blasting is performed with the nozzle moving at a speed of 10-100 mm/s.
  • the mask will be able to protect the remaining solar cells and is not penetrated by the grains of the abrasive blasting.
  • the treatment time By keeping the treatment time short, enough abrasion can be provided to remove solar cells according to the pattern in the mask, but the abrasion to the substrate surface can be kept low.
  • the mask is removed by using NaOH at a concentration of less than 3 percent, more preferably less than 1,5 percent by weight.
  • the mask can be removed without risking damage to the back contact of the solar cells.
  • the removal of the mask may be performed using other solutions as well, and for this purpose it is beneficial to use a solution having a pH of 7 or more.
  • Fig. 1 discloses a first step of a method for producing a transparent solar panel according to a preferred embodiment of the invention
  • Fig. 2 discloses a second step of the method
  • Fig. 3 discloses a third step of the method
  • Fig. 4 discloses a fourth step of the method
  • Fig. 5 discloses a fifth step of the method.
  • Fig. 6 discloses a planar view of a resulting transparent solar panel produced through the method of Figs. 1-5
  • a solar panel 1 is provided.
  • the solar panel 1 comprises a plurality of thin film solar cells 11, preferably CIGS solar cells, mounted on a substrate 10 that is transparent, preferably glass.
  • the solar cells 11 In order to make the solar panel as a whole transparent, the solar cells 11 must be removed from at least part of the substrate 10 to allow light to penetrate the substrate 10.
  • a mask 12 is applied to a solar panel surface 15, the mask 12 comprising a pattern 21 designating areas where the solar cells 11 are to be removed.
  • the mask 12 comprises a resist and is applied through screen printing.
  • the mask 12 is printed directly onto the solar panel surface 15 and adheres to the surface without gaps or the like so that the intrusion of particles from the abrasive blasting can efficiently be prevented, both through the mask 12 itself and along its edges. Damage to the solar cells bordering on areas where the solar cells 11 are to be removed can thereby be prevented.
  • Screen printing is also easy, convenient and cheap, and the mask 12 can be applied to the solar panel surface 15 by application of a material that closely follows shape and form of the solar panel surface 15. This is a significant advantage over lithographic masks which require multiple step application and are generally more expensive both in the required materials and in the time required. Another advantage is that pattern broadening can be avoided.
  • the solar panel surface 15 is treated by abrasive blasting to remove solar cells 11 according to the pattern 21.
  • Abrasive blasting has previously not been considered suitable for use on thin film solar cells, due to the perception that it damages the substrate by turning it coarse and non-transparent, so that the resulting solar panel is not transparent even after solar cells have been removed.
  • the present inventors have realised, however, that abrasive blasting is in fact very suitable for removing solar cells from the solar panel surface, since damage to the solar cells covered by the mask 12 can be kept to a minimum and since the surface of the substrate 10 can in fact be made transparent after blasting.
  • suitable pressure, grain sizes and treatment times for the abrasive blasting the benefits can be maximized while keeping possible side effects to a minimum.
  • the abrasive blasting is performed using aluminium oxide, but it is also possible to use other materials such as fine sand.
  • the grain size is preferably 10-100 ⁇ .
  • the abrasive blasting is preferably may be performed at a pressure of less than 10 bar, preferably less than 7 bar and more preferably less than 5 bar, in order to achieve an efficient blasting while at the same time preventing undesired damage to the CIGS film.
  • the abrasive blasting is performed at a negative pressure, i.e. where the abrasive is sucked towards the solar cell. Such negative pressure blasting is preferably performed at -0,5 to -7 bar.
  • the nozzle is preferably moved in relation to the surface to be blasted at a speed of 10-100 mm/s, in order to achieve an efficient blasting and still avoid undesired damage to the CIGS film or underlying substances.
  • aluminium oxide is used in the form of ALOX 220 with grain sizes of 44-74 ⁇ and at a pressure of 2-5 bar.
  • the mask 12 is removed by subjecting the solar panel 1 to a suitable substance. It is advantageous to use a substance that allows for a removal of the mask without damaging the solar cells 11, either by affecting the CIGS film itself or the back contact, generally made from ZnO. In this preferred embodiment, a solution of NaOH at 1,5 percent by weight is used for 2-4 min. It is advantageous to use a solution having a pH of 7 or more.
  • the solar panel 1 comprises the substrate 10 and the solar cells 11 distributed according to the pattern 21 of the mask 12. The mask 12 has protected the solar cells 11 so that they are essentially unaffected by the abrasive blasting, even at edges of the pattern 21.
  • abrasive blasting is preferably performed at an angle of incidence of 0-45 degrees in relation to a normal of the surface that is to be blasted, i.e. at an angle of incidence of 45-90 degrees in relation to the surface itself. However, in some embodiments other angles of incidence may also be used.
  • the substrate 10 on the other hand, has a surface that has been affected by the abrasive blasting in areas not covered by the mask 12 and is now non-transparent with a coarse surface, as opposed to the smooth surface previously exhibited before the blasting.
  • a front glass 14 is added to the solar panel surface 15 and serves to protect the solar cells.
  • the front glass 14 is generally mounted by laminating with an adhesive 13 that is applied to the solar panel surface 15 and covers the solar cells 11 as well as parts of the substrate 10 that have been exposed through the abrasive blasting.
  • the adhesive is in itself transparent, and when applied to the coarse surface of the substrate 10 serves to smooth its unevenness and render the substrate surface transparent once again.
  • the combination of the abrasive blasting as a very suitable method for removing solar cells 11 according to the mask 12 with the adhesive 13 for filling out the coarse surface of the substrate 10 serves to create a transparent solar panel 1 manufactured with high precision and at a low cost.
  • the adhesive 13 is preferably EVA (ethylene-vinyl acetate), but other adhesives may also be used such as PVB (polyvinyl butyral) and Polyolefin.
  • the solar panel 1 has the
  • the amount of solar cells 11 removed generally corresponds to a lowered performance of the solar panel 1, but thanks to the use of abrasive blasting rather than other methods losses due to damages to the remaining solar cells can largely be avoided. Thereby, it becomes possible to use thin stripes as the pattern 21, to trick a human observer into viewing the solar panel 21 as a striped window rather than a wall with transparent sections.
  • Suitable proportions of the width of a stripe of exposed substrate 10 to the width of a stripe of solar cells 11 is where the former is in the range of 0,5-5 mm and the latter in the range of 1-20 mm, giving a preferred transparency of the solar panel of 20-50 percent.
  • a removal of 25% of the available solar cells 11 will also result in a performance reduction for the solar panel as a whole of 25-30 %, where additional losses that might arise through the removal of solar cells and the treatments of the solar panel can largely be avoided.
  • the dimensions of the solar panel 1 may of course be varied.
  • a substrate 10 having a thickness of about 3 mm is used, with a CIGS film of about 1-5 ⁇ .
  • the mask 12 is in the form of a resist and has a thickness of about 3 mm, with the patterned stripes being 1 mm wide. This is intended to serve solely as a working example of the invention, and is not to be seen as limiting to the scope of the claims. It is also to be noted that features of the embodiments described above may freely be combined with other embodiments, unless such a combination would be unsuitable, as will be readily understood by the person skilled in the art.

Landscapes

  • Photovoltaic Devices (AREA)

Abstract

La présente invention concerne un procédé de production d'un panneau solaire transparent, comprenant les étapes consistant à : - utiliser un panneau solaire comprenant une pluralité de cellules solaires à couches minces, - appliquer un masque sur une surface de panneau solaire, ledit masque comprenant un motif qui expose au moins une partie de la surface de panneau solaire, - retirer les cellules solaires à couches minces du panneau solaire dans la ou les parties de la surface de panneau solaire exposées par le motif, - retirer le masque, - appliquer un adhésif sur la surface du panneau solaire ; et - monter un verre avant sur la surface du panneau solaire, le retrait des cellules solaires à couches minces étant effectué par projection abrasive, l'adhésif étant transparent, et le masque étant en outre appliqué par sérigraphie.
PCT/SE2018/050317 2017-03-24 2018-03-26 Procédé de production d'un panneau de solaire transparent Ceased WO2018174810A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE1750350A SE542393C2 (en) 2017-03-24 2017-03-24 Method for producing a transparent solar panel
SE1750350-9 2017-03-24

Publications (1)

Publication Number Publication Date
WO2018174810A1 true WO2018174810A1 (fr) 2018-09-27

Family

ID=61972194

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/SE2018/050317 Ceased WO2018174810A1 (fr) 2017-03-24 2018-03-26 Procédé de production d'un panneau de solaire transparent

Country Status (2)

Country Link
SE (1) SE542393C2 (fr)
WO (1) WO2018174810A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019226950A1 (fr) 2018-05-23 2019-11-28 Brigham Young University Compositions de bactériophages et kits et procédés associés

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001156319A (ja) * 1999-11-29 2001-06-08 Canon Inc 光起電力素子及びその製造方法
US6858461B2 (en) 2000-07-06 2005-02-22 Bp Corporation North America Inc. Partially transparent photovoltaic modules
CN101794846A (zh) * 2010-02-05 2010-08-04 保定天威集团有限公司 一种薄膜太阳能透光组件的制造方法
US20110100432A1 (en) 2009-11-02 2011-05-05 Du Pont Apollo Ltd. Thin film solar cell and manufacturing method thereof
CN105355711A (zh) * 2015-10-28 2016-02-24 华东理工大学 一种n型晶体硅双面太阳能电池的制备方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001156319A (ja) * 1999-11-29 2001-06-08 Canon Inc 光起電力素子及びその製造方法
US6858461B2 (en) 2000-07-06 2005-02-22 Bp Corporation North America Inc. Partially transparent photovoltaic modules
US20110100432A1 (en) 2009-11-02 2011-05-05 Du Pont Apollo Ltd. Thin film solar cell and manufacturing method thereof
CN101794846A (zh) * 2010-02-05 2010-08-04 保定天威集团有限公司 一种薄膜太阳能透光组件的制造方法
CN105355711A (zh) * 2015-10-28 2016-02-24 华东理工大学 一种n型晶体硅双面太阳能电池的制备方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019226950A1 (fr) 2018-05-23 2019-11-28 Brigham Young University Compositions de bactériophages et kits et procédés associés

Also Published As

Publication number Publication date
SE542393C2 (en) 2020-04-21
SE1750350A1 (sv) 2018-09-25

Similar Documents

Publication Publication Date Title
EP2380234B2 (fr) Antenne plane transparente, procédé de fabrication de cette antenne, et utilisation de cette antenne
DE112010001334B4 (de) Glasrolle und Verfahren zur Herstellung einer Glasrolle
US9518344B1 (en) Mask, method of manufacturing a mask and method of manufacturing an OLED panel
CA2455973A1 (fr) Pare-brise de vehicule a antenne(s) fractale(s)
CN104159699B (zh) 用于制造带有传感器窗的复合玻璃板的方法
EP3385237A1 (fr) Verre feuilleté
CN106458692A (zh) 制造具有防腐蚀的功能涂层的复合玻璃板的方法
DE102018107697B4 (de) Entschichtungseinrichtungen und -verfahren zum Entschichten von Glastafeln, vorzugsweise Verbundglastafeln
US5078815A (en) Method of making a decorative transparent laminate of stone and glass
DE202013006875U1 (de) Elektrisch leitfähiger Träger für eine Verglasung mit flüssigkristallinduzierter variabler Streuung und derartige Verglasung
WO2004067792A3 (fr) Article revetu presentant un bord stratifie etanche pour empecher la corrosion d'un revetement au niveau du bord et son procede de fabrication
WO2017068076A1 (fr) Procédé de fabrication d'une vitre composite dotée d'un revêtement réfléchissant les infrarouges sur une feuille de support
EP3720825B1 (fr) Procédé de fabrication d'une vitre revêtue et imprimée
WO2015105164A1 (fr) Procédé de fabrication d'un substrat en verre équipé d'une couche de protection de face frontale et substrat en verre équipé d'une couche de protection de face frontale
CN104252816A (zh) 一种电子产品玻璃面板的制造工艺
WO2018174810A1 (fr) Procédé de production d'un panneau de solaire transparent
WO2018104109A1 (fr) Procédé pour réparer des éléments optiques réfléchissants pour la lithographie aux ultraviolets extrêmes (euv)
DE60128511T2 (de) Verfahren zur Herstellung einer Verbundglasscheibe mit einer transparenten korrosionsgeschützten Oberflächebeschichtung, sowie eine Verbundglasscheibe
JP7191320B2 (ja) カバーガラス
CN105242445A (zh) 液晶显示面板的制作方法和液晶显示面板
EP3717430A1 (fr) Procédé de fabrication d'une vitre revêtue imprimée
JP3727877B2 (ja) 太陽電池パネルの製造方法
TWI745600B (zh) 製造塗覆物件之方法
CA2433415A1 (fr) Procede d'application de motifs sur un substrat
CN103232173A (zh) 一种具有高反射率镜面图案、文字的玻璃及其加工方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 18717748

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 18717748

Country of ref document: EP

Kind code of ref document: A1

122 Ep: pct application non-entry in european phase

Ref document number: 18717748

Country of ref document: EP

Kind code of ref document: A1