WO2018174626A2 - Acid-resistant nano-separation membrane having enhanced flow rate, and method for manufacturing same - Google Patents
Acid-resistant nano-separation membrane having enhanced flow rate, and method for manufacturing same Download PDFInfo
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- WO2018174626A2 WO2018174626A2 PCT/KR2018/003414 KR2018003414W WO2018174626A2 WO 2018174626 A2 WO2018174626 A2 WO 2018174626A2 KR 2018003414 W KR2018003414 W KR 2018003414W WO 2018174626 A2 WO2018174626 A2 WO 2018174626A2
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/56—Polyamides, e.g. polyester-amides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/027—Nanofiltration
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0002—Organic membrane manufacture
- B01D67/0006—Organic membrane manufacture by chemical reactions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/02—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
- B01D69/107—Organic support material
- B01D69/1071—Woven, non-woven or net mesh
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/125—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction
- B01D69/1251—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction by interfacial polymerisation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/58—Other polymers having nitrogen in the main chain, with or without oxygen or carbon only
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/58—Other polymers having nitrogen in the main chain, with or without oxygen or carbon only
- B01D71/60—Polyamines
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/76—Macromolecular material not specifically provided for in a single one of groups B01D71/08 - B01D71/74
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/02—Hydrophilization
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/15—Use of additives
- B01D2323/218—Additive materials
- B01D2323/2182—Organic additives
- B01D2323/21823—Alcohols or hydroxydes, e.g. ethanol, glycerol or phenol
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/22—Thermal or heat-resistance properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/30—Chemical resistance
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/36—Hydrophilic membranes
Definitions
- the present invention relates to an acid resistant nano-separation membrane with improved flow rate and a method for manufacturing the same, and more particularly, to recover rare metals and valuable metals generated in a smelting process, and can be used under strong acid and high heat conditions, and have excellent flow rate and acid resistance.
- the present invention relates to an acid resistant nano separator and a method for manufacturing the same having improved flow rates.
- Metal-containing wastewater includes mine wastewater, chemical plant wastewater, smelter wastewater, steel mill wastewater, plating plant wastewater and garbage incinerator wastewater.
- the electroplating plant wastewater generated from the steel mill has a low pH of 2-4, and contains complex metal ions such as nickel, zinc, tin, chromium, and copper in addition to iron ions (divalent) depending on the plating type.
- complex metal ions such as nickel, zinc, tin, chromium, and copper in addition to iron ions (divalent) depending on the plating type.
- These metal ions are hazardous metals and are subject to wastewater regulations and must be removed below legal limits before discharge. However, if it can be separated and recovered as a metal, it can create value as a resource.
- the plating plant wastewater may contain organic substances such as surfactants and plating additives, and may require additional COD (chemical oxygen demand) treatment.
- a typical treatment method of plating wastewater widely used in the past is a neutralized flocculation precipitation method.
- an inexpensive alkaline agent such as calcium hydroxide is administered to raise the pH of the wastewater to 9 to 10, and the metal ions contained in the wastewater are hydroxideized to precipitate and separate into a sedimentation basin.
- the pH-adjusted precipitation method generates chemical sludge containing various metal ions, and the sludge is treated by landfilling as defined by law because it is not reused and is classified as special waste.
- the membrane method transfers only the solvent through the membrane using the permeation pressure, so that clean and clean treated water can be obtained, which is widely used for desalination of seawater and reuse of plant wastewater.
- a high concentration of salts will occur at the same time. It also requires cumbersome cleaning or pretreatment of the membrane and high pressure. Due to the principle of the membrane method, selective separation and concentration of specific metal ions is not possible.
- the membrane method is sometimes applied to reuse of plating wastewater.
- not only heavy metals but also inorganic ions can be removed from raw water, so that the membrane permeated water can be reused as industrial water.
- a small amount of concentrate is produced, and it contains various heavy metal ions and inorganic ions, which makes it difficult to reuse, and the maintenance costs are high due to poor use conditions such as high temperature, high pressure and strong acid conditions.
- a sulfonyl halide was introduced into an aqueous amine solution to form a sulfone amide layer, thereby preparing a nano separator having acid resistance. It can be applied to the process of generating acid wastewater such as smelting industry that needs acid resistance, but it can be used in strong acid and high temperature condition to recover rare metals and valuable metals generated in smelting process, and it has excellent flow rate and excellent acid resistance. There was a problem that was difficult to show the effect.
- the present invention has been made to solve the above problems, the problem to be solved of the present invention can be used in strong acid and high temperature conditions to recover the rare metals and valuable metals generated in the smelting process, and the flow rate is excellent It is to provide an acid resistant nano-separation membrane and a method for producing the same having an improved flow rate showing the excellent acid resistance.
- the present invention comprises the steps of immersing a porous support in a first solution comprising a first amine compound, a second amine compound and a phenol compound comprising a compound represented by the formula (1); Treating the immersed porous support with a second solution including an acid halogen compound to form a polyamide layer on the surface of the porous support; And hydrophilizing the porous support on which the polyamide layer is formed.
- R 1 and R 2 are each independently a C 1 to C 10 alkylene group, and n is an integer of 1 to 100.
- R 1 and R 2 may be each independently C 2 ⁇ C 6 linear alkylene group or C 2 ⁇ C 6 It may be a crushed alkylene group, n May be an integer from 1 to 10.
- the phenolic compound may include one or more selected from the group consisting of pyrocatechol, resorcinol, hydroquinone, pyrogallol and phloroglucinol.
- the second amine-based compound may include one or more selected from the group consisting of metaphenylenediamine and piperazine.
- the first solution may include a first amine compound, a second amine compound and a phenol compound in a weight ratio of 1: 0.04 to 2: 0.02 to 1.
- the first solution comprises one or more selected from the group consisting of polyvinylpyrrolidone, polyethylene glycol and polyvinyl alcohol with respect to 100 parts by weight of the first amine compound
- the hydrophilic polymer may be included in an amount of 0.4 to 40 parts by weight.
- the acid halogen compound may include one or more selected from isophthaloyl chloride, trimesoyl chloride and terephthaloyl chloride.
- the hydrophilization treatment may be performed through a hydrophilization solution of 0.01 ⁇ 2% concentration.
- the hydrophilization solution may include one or more selected from the group consisting of potassium hydroxide, calcium hydroxide, magnesium hydroxide, sodium hydroxide, sulfuric acid, sodium sulfate, sodium sulfite and sodium hydrogencarbonate Can be.
- the hydrophilization treatment may be performed for 10 minutes to 90 °C for 0.1 to 5 minutes.
- the porous support may include a nonwoven fabric and a porous polymer layer, the porous polymer layer may have an average thickness of 10 ⁇ 200 ⁇ m, polysulfone, polyethersulfone, It may be formed including one or more selected from the group consisting of polyimide, polypropylene and polyvinylidene fluoride.
- the present invention to solve the above problems the porous support; And a first solution including a first amine compound, a second amine compound, and a phenolic compound including a compound represented by the following Chemical Formula 1 on the surface of the porous support, and a second solution including an acid halogen compound. And a polyamide layer formed by interfacial polymerization, wherein the polyamide layer provides an acid resistant nanoseparation membrane having an improved flow rate with hydrophilic surface modification.
- R 1 and R 2 are each independently a C 1 to C 10 alkylene group, and n is an integer of 1 to 100.
- the polyamide layer may have an average thickness of 0.05 ⁇ 1 ⁇ m
- the porous support is a non-woven fabric having an average thickness of 30 ⁇ 300 ⁇ m and a porous polymer having an average thickness of 10 ⁇ 200 ⁇ m
- the porous polymer layer may be formed including one or more selected from the group consisting of polysulfone, polyethersulfone, polyimide, polypropylene and polyvinylidene fluoride.
- the nano separator may have a flow rate of 25 gfd or more at 25 ° C. and 75 psi, and may have a salt removal rate of 90% or more.
- the nano-membrane membrane may be 30 gfd or more at 25 and 75 psi when immersed in 15 wt% sulfuric acid aqueous solution for 30 days, the salt removal rate may be 85% or more.
- the present invention provides a membrane module including the above-described nano-membrane membrane.
- the acid resistant nano-membrane having an improved flow rate of the present invention and a method of manufacturing the same can be used under strong acid and high heat conditions to recover rare metals and valuable metals generated in the smelting process, and have excellent flow rate and excellent acid resistance.
- sulfonyl halides were introduced into an aqueous amine solution to form a sulfone amide layer, thereby preparing a nano separator having acid resistance. It can be applied to the process of generating acid wastewater such as smelting industry that needs acid resistance, but it can be used in strong acid and high temperature condition to recover rare metals and valuable metals generated in smelting process, and it has excellent flow rate and excellent acid resistance. There was a problem that was difficult to show the effect.
- the present invention comprises the steps of immersing the porous support in a first solution containing a specific compound; Treating the immersed porous support with a second solution including an acid halogen compound to form a polyamide layer on the surface of the porous support; And hydrophilizing the porous support on which the polyamide layer is formed.
- the polyamide layer may be formed on the surface of the porous support by treating the second solution containing an acid halogenide compound in a subsequent step by immersing the porous support in the first solution.
- the polyamide nanoseparation membrane may form a membrane by interfacial polymerization using a material that reacts with the polyfunctional amine, and the polyfunctional amine is a polyamine having 2-3 amine functional groups per monomer and is a primary amine or secondary Amines.
- the first solution includes a first amine compound, a second amine compound, and a phenol compound.
- the first amine compound includes a first amine compound including a compound represented by the following Formula 1 to improve salt removal rate and acid resistance.
- R 1 and R 2 are each independently C 1 ⁇ C 10 Alkylene group, n is an integer of 1 to 100, preferably R 1 and R 2 are each independently C 2 ⁇ C 6 It may be a straight chain alkylene group of or C 2 ⁇ C 6 It may be a branched alkylene group, n may be an integer of 1 to 10.
- the second amine-based compound may be used without limitation as long as it is a material capable of improving salt removal rate in the art, and preferably includes one or more selected from the group consisting of metaphenylenediamine and piperazine. And more preferably using piperazine is advantageous for improving the salt removal rate.
- the phenolic compound may be used without limitation as long as it is a substance capable of improving flow rate in the art, and preferably, the group consisting of pyrocatechol, resorcinol, hydroquinone, pyrogallol and phloroglucinol. It may include at least one selected from, more preferably may comprise at least one selected from the group consisting of pyrocatechol, resorcinol and hydroquinone, more preferably using resorcinol It is advantageous to significantly improve the flow rate. By including the phenolic compound, it is possible to improve the flow rate by hydrophilic modification of the surface of the polyamide layer to be formed later.
- the first solution is a weight ratio of the first amine compound, the second amine compound and the phenol compound in a weight ratio of 1: 0.04 ⁇ 2: 0.02 ⁇ 1, preferably 1: 0.06 ⁇ 1.6: 0.04 ⁇ 0.8 It can be included as.
- the salt removal rate may be significantly lowered. If the weight ratio is greater than 1: 2, a problem may occur in that the flow rate is not good. In addition, if the weight ratio of the first amine compound and the phenolic compound is less than 1: 0.02, the effect of improving the flow rate may be insignificant, and if the weight ratio is greater than 1: 1, problems of salt removal rate and acid resistance may be significantly reduced. have.
- the first solution may include a hydrophilic polymer.
- the hydrophilic polymer may be used without limitation as long as it is a hydrophilic polymer commonly used in the art, preferably may include one or more selected from the group consisting of polyvinylpyrrolidone, polyethylene glycol and polyvinyl alcohol, More preferably, polyvinylpyrrolidone can be used.
- the first solution may include 0.4 to 40 parts by weight of hydrophilic polymer, preferably 1 to 35 parts by weight, based on 100 parts by weight of the first amine compound. If the hydrophilic polymer is included in an amount less than 0.4 part by weight based on 100 parts by weight of the first amine compound, a problem may occur that the initial flow rate and acid resistance are not good. If the content exceeds 40 parts by weight, the salt removal rate and the acid resistance are not good. May occur.
- the porous support may include a nonwoven fabric and a porous polymer layer.
- the nonwoven fabric can be used without limitation as long as it is a nonwoven fabric of the specification commonly used in the art, preferably an average thickness of 30 ⁇ 300 ⁇ m, more preferably an average thickness of 50 ⁇ 200 ⁇ m, but is not limited thereto. Do not.
- the porous polymer layer may be a porous polymer layer formed of a material that can be commonly used, preferably one selected from the group consisting of polysulfone, polyethersulfone, polyimide, polypropylene and polyvinylidene fluoride It may be formed to include the above, the average thickness may be 10 ⁇ 200 ⁇ m, preferably 30 ⁇ 190 ⁇ m average thickness, but is not limited thereto.
- the porous support is immersed in the first solution in the immersion step described above, and the polyamide layer is made by reacting a first solution remaining on the surface with a second solution containing an acid halide compound. Can be formed.
- the acid halogen compound may be used without limitation as long as it is a material capable of forming a polyamide layer.
- the acid halogen compound may be at least one selected from isophthaloyl chloride, trimesoyl chloride and terephthaloyl chloride, and more preferably.
- trimezoyl chloride can be used. When trimesoyl chloride is used as the acid halogen compound, excellent salt removal rate can be exhibited.
- the second solution may contain 0.005 to 2% by weight, preferably 0.01 to 1% by weight, of the acid halogen compound, based on the total weight of the second solution. If the acid halogen compound is less than 0.005% by weight, a problem that a polyamide layer is difficult to form may occur. If the acid halogen compound is more than 2% by weight, the acid halogen compound may be precipitated, thereby making it difficult to interface-polymerize easily.
- Forming the polyamide layer may include a step of drying.
- the drying is not limited as long as the general drying conditions, preferably may be dried for 10 minutes to 10 minutes at 10 °C to 100 °C, more preferably 1 to 10 minutes at 15 °C to 90 °C.
- the polyamide layer formed may have an average thickness of 0.05 ⁇ 1 ⁇ m, preferably 0.1 ⁇ 900 ⁇ m, but is not limited thereto.
- the surface of the polyamide layer may be hydrophilized to further improve the flow rate.
- the hydrophilization solution is not particularly limited as long as it is a material capable of hydrophilic modification of the surface of the polyamide layer, preferably can be carried out through a hydrophilization solution containing an acid or a base material, more preferably hydroxide Potassium, calcium hydroxide, magnesium hydroxide, sodium hydroxide, sulfuric acid, sodium sulfate, sodium sulfite and sodium hydrogen carbonate can be carried out through a hydrophilic solution containing at least one selected from the group consisting of sodium hydroxide most preferably Performing through a hydrophilic solution is advantageous to significantly improve the flow rate.
- the hydrophilization treatment may be performed through a hydrophilization solution having a concentration of 0.01 to 2%, preferably through a hydrophilization solution having a concentration of 0.015 to 1.8%. If the concentration of the hydrophilization solution is less than 0.01%, the effect of improving the flow rate may be insignificant, and if it exceeds 2%, a problem may occur in that the removal rate is lowered as the polyamide layer is decomposed.
- the hydrophilization treatment may be performed by immersing the porous support on which the polyamide layer is formed in a hydrophilization solution.
- the hydrophilization treatment may be performed at 10 to 90 °C for 0.1 to 5 minutes, preferably at 15 to 80 for 0.2 to 3 minutes. If the hydrophilization treatment temperature is less than 10, the effect of improving the flow rate may be insignificant, and if the temperature exceeds 90, the problem may occur that the removal rate is lowered. In addition, if the hydrophilization treatment time is less than 0.1 minutes, the effect of improving the flow rate may be insignificant, and if it exceeds 5 minutes, the removal rate may decrease as the polyamide layer is decomposed.
- the unsupported residue may be removed by immersing the porous support subjected to the hydrophilization treatment in a buffer solution. More specifically, the porous support is immersed in a buffer solution for 0.5 to 24 hours at a water temperature of 10 °C ⁇ 95 °C, preferably 1 to 5 hours at a water temperature of 15 °C ⁇ 90 °C and washed with distilled water The reaction residue can be removed.
- the buffer solution may be used without limitation as long as it is a material capable of serving as a buffer solution, and may preferably include sodium carbonate.
- the buffer solution may include 0.05 to 0.5% by weight of sodium carbonate, preferably 0.1 to 0.4% by weight based on the total weight of the buffer solution, but is not limited thereto.
- the nano-membrane prepared through the above-described manufacturing method has a flow rate of 25 gfd or more at 25 °C and 75 psi
- the salt removal rate may be 90% or more, 25 °C and 75 when immersed in 15 wt% sulfuric acid aqueous solution for 30 days
- the flow rate may be at least 30 gfd and the salt removal rate may be at least 85%.
- R 1 and R 2 are each an ethylene group, and n is 2.
- the permeate flow rate of the nano-membrane prepared according to Examples 1 to 24 and Comparative Examples 1 to 8 was measured at 25 and 75 psi in a 2000 ppm sodium chloride solution, and 2000 ppm magnesium sulfate
- the salt removal rate was measured under conditions of 25 and 75 psi in aqueous solution. After immersing in 15 wt% sulfuric acid solution for 30 days and then the permeate flux and salt removal rate were measured in the same manner.
- the rate of change of the salt removal rate was measured by the same method as in Equation 1 below. This is shown in Tables 1 to 6 below.
- the nano-membrane prepared according to Examples 1 to 24 and Comparative Examples 1 to 8 were measured using a contact angle measuring device (DSA 100, KRUSS). Distilled water was used for the contact angle measurement. Thereafter, the contact angle was measured in the same manner after immersion in 15 wt% sulfuric acid solution for 30 days. In addition, the rate of change of the contact angle was measured by the same method as in Equation 2 below. This is shown in Tables 1 to 6 below.
- Example 14 Example 15
- Example 16 Example 17
- the nanomembrane according to the present invention has excellent acid resistance, and even if it is immersed in 15% by weight of sulfuric acid for 30 days or longer, it does not lose its function as a separator, and the rate of change of the salt removal rate is within 10%. It could be confirmed that it is maintained.
- the nano-membrane according to the present invention compared to the nano-membrane that does not satisfy the conditions and contents according to the present invention, it was confirmed that the initial flow rate, initial salt removal rate, the flow rate and salt removal rate after 30 days of sulfuric acid immersion are all excellent. .
- nano-separation membrane according to the present invention was confirmed that the lower the initial contact angle, the more the hydrophilization treatment proceeds, the flow rate is improved, the lower the contact angle change rate is inhibited acid hydrolysis is confirmed that the acid resistance is improved. there was.
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Abstract
Description
본 발명은 유량이 향상된 내산성 나노분리막 및 이의 제조방법에 관한 것으로서, 보다 상세하게는 제련 공정에서 발생하는 희소금속 및 유가 금속 등을 회수하기 위하여 강산 및 고열조건에서도 사용가능하고, 유량이 우수한 동시에 내산성능이 우수한 효과를 나타내는 유량이 향상된 내산성 나노분리막 및 이의 제조방법에 관한 것이다.The present invention relates to an acid resistant nano-separation membrane with improved flow rate and a method for manufacturing the same, and more particularly, to recover rare metals and valuable metals generated in a smelting process, and can be used under strong acid and high heat conditions, and have excellent flow rate and acid resistance. The present invention relates to an acid resistant nano separator and a method for manufacturing the same having improved flow rates.
금속을 함유한 폐수에는,광산 폐수,화학 공장 폐수,제련소 폐수,제철소 폐수,도금 공장 폐수,쓰레기 소각장 폐수 등이 있다. 이 중에서 제철소로부터 발생하는 전기도금공장 폐수는 pH가 2~4로 낮고, 도금의 종류에 따라 철 이온(2가) 외에 니켈, 아연, 주석, 크롬, 동 등의 금속 이온들을 복합적으로 함유하고 있는 경우가 많다. 이러한 금속 이온들은 유해 금속으로서 폐수 규제의 적용을 받기 때문에 방류 전에 법적 규제치 이하로 제거해 주어야 한다. 그러나 금속으로서 분리 회수할 수 있다면 자원으로서의 가치 창출이 가능하다. 또한, 도금공장 폐수 등에는 계면 활성제나 도금용 첨가제 등의 유기물이 함유되어 있는 경우가 있어 추가적인 COD(화학적 산소 요구량) 처리를 필요로 하는 경우도 있다.Metal-containing wastewater includes mine wastewater, chemical plant wastewater, smelter wastewater, steel mill wastewater, plating plant wastewater and garbage incinerator wastewater. Among these, the electroplating plant wastewater generated from the steel mill has a low pH of 2-4, and contains complex metal ions such as nickel, zinc, tin, chromium, and copper in addition to iron ions (divalent) depending on the plating type. There are many cases. These metal ions are hazardous metals and are subject to wastewater regulations and must be removed below legal limits before discharge. However, if it can be separated and recovered as a metal, it can create value as a resource. In addition, the plating plant wastewater may contain organic substances such as surfactants and plating additives, and may require additional COD (chemical oxygen demand) treatment.
이하,종래의 도금 폐수의 처리 방법에 관하여 설명한다.Hereinafter, the treatment method of the conventional plating wastewater is demonstrated.
종래에 폭 넓게 사용되고 있는 도금 폐수의 대표적인 처리법은 중화 응집 침전법이다. 이 방법은 수산화칼슘과 같이 값이 싼 알칼리제를 투여하여 폐수의 pH를 9 ~ 10까지 상승시켜 폐수 중에 함유된 금속 이온을 수산화물화 하여 침전지 등으로 침전 분리 하는 것이다. pH가 9 ~ 10인 조건에서 철 이온, 니켈 이온, 아연 이온 등은 용해도가 감소하여 수산화물화 된다. 그러나 이러한 pH 조정 침전법은 다양한 금속이온이 함유된 화학슬러지가 발생하게 되고, 이렇게 발생한 슬러지는 재이용이 불가능하며 특수폐기물로 구분되기 때문에 법에서 규정한 매립 등의 방법으로 처리하고 있다.A typical treatment method of plating wastewater widely used in the past is a neutralized flocculation precipitation method. In this method, an inexpensive alkaline agent such as calcium hydroxide is administered to raise the pH of the wastewater to 9 to 10, and the metal ions contained in the wastewater are hydroxideized to precipitate and separate into a sedimentation basin. At pH 9-9, iron ions, nickel ions, zinc ions, etc., are hydrated with reduced solubility. However, the pH-adjusted precipitation method generates chemical sludge containing various metal ions, and the sludge is treated by landfilling as defined by law because it is not reused and is classified as special waste.
이 밖에 전기 도금 폐수의 처리 방법으로는 황화물 침전법, 이온교환수지법, 킬레이트수지법 막 분리법, 용매 추출법, 생물 농축법, 활성탄 흡착법 등이 있다.In addition, sulfide precipitation, ion exchange resin, chelate resin membrane separation, solvent extraction, bioconcentration, activated carbon adsorption, and the like are treated as electroplating wastewater.
그 중에서 막법은 침투압을 이용하여 용매만을 막을 통해 이동시키기 때문에 맑고 깨끗한 처리수를 얻을 수 있어 해수의 담수화나 공장 폐수의 재이용 등에 폭 넓게 사용되고 있다. 그러나 염류가 고농도로 농축된 액이 동시에 발생하게 된다. 또한 막의 번잡한 세척이나 사전 처리 및 고압력이 필요하다. 막법의 원리상 특정 금속이온의 선택적인 분리·농축은 불가능하다.Among them, the membrane method transfers only the solvent through the membrane using the permeation pressure, so that clean and clean treated water can be obtained, which is widely used for desalination of seawater and reuse of plant wastewater. However, a high concentration of salts will occur at the same time. It also requires cumbersome cleaning or pretreatment of the membrane and high pressure. Due to the principle of the membrane method, selective separation and concentration of specific metal ions is not possible.
또한, 막법은 도금 폐수의 재이용에 적용된 경우도 있고, 이 경우 중금속뿐만 아니라 무기물 이온 등도 원수로부터 제거할 수 있기 때문에 막 투과수를 공업용수로서 재이용할 수 있다. 그러나 동시에 소량의 농축액이 발생하는데, 각종 중금속 이온과 무기물 이온을 함유하고 있어 재이용이 곤란하고, 고온 고압 및 강산 조건 등 사용 조건이 열악하여 유지비가 높다.In addition, the membrane method is sometimes applied to reuse of plating wastewater. In this case, not only heavy metals but also inorganic ions can be removed from raw water, so that the membrane permeated water can be reused as industrial water. At the same time, however, a small amount of concentrate is produced, and it contains various heavy metal ions and inorganic ions, which makes it difficult to reuse, and the maintenance costs are high due to poor use conditions such as high temperature, high pressure and strong acid conditions.
따라서, 상기와 같은 폐수로부터 희소금속 및 유가 금속을 회수하기 위해 강산 및 고열 조건에서 사용할 수 있는 내산성 분리막에 대한 개발이 필요한 실정이다.Therefore, there is a need to develop an acid resistant separator that can be used under strong acid and high temperature conditions to recover rare metals and valuable metals from the wastewater.
한편, 종래에는 아민 수용액에 설포닐 할라이드를 도입하여 술폰 아미드층을 형성시켜 내산성을 갖는 나노분리막을 제조할 수 있었다. 이는 내산성이 필요한 제련 산업 등 산폐수가 발생하는 공정에 적용될 수 있으나, 제련 공정에서 발생하는 희소금속 및 유가 금속 등을 회수하기 위하여 강산 및 고열조건에서도 사용가능하고, 유량이 우수한 동시에 내산성능이 우수한 효과를 나타내기 어려운 문제점이 있었다.Meanwhile, in the related art, a sulfonyl halide was introduced into an aqueous amine solution to form a sulfone amide layer, thereby preparing a nano separator having acid resistance. It can be applied to the process of generating acid wastewater such as smelting industry that needs acid resistance, but it can be used in strong acid and high temperature condition to recover rare metals and valuable metals generated in smelting process, and it has excellent flow rate and excellent acid resistance. There was a problem that was difficult to show the effect.
본 발명은 상기와 같은 문제점을 해결하기 위하여 안출된 것으로, 본 발명의 해결하려는 과제는 제련 공정에서 발생하는 희소금속 및 유가 금속 등을 회수하기 위하여 강산 및 고열조건에서도 사용가능하고, 유량이 우수한 동시에 내산성능이 우수한 효과를 나타내는 유량이 향상된 내산성 나노분리막 및 이의 제조방법을 제공하는 데 있다.The present invention has been made to solve the above problems, the problem to be solved of the present invention can be used in strong acid and high temperature conditions to recover the rare metals and valuable metals generated in the smelting process, and the flow rate is excellent It is to provide an acid resistant nano-separation membrane and a method for producing the same having an improved flow rate showing the excellent acid resistance.
상술한 과제를 해결하기 위해 본 발명은 다공성 지지체를 하기 화학식 1로 표시되는 화합물을 포함하는 제1아민계 화합물, 제2아민계 화합물 및 페놀계 화합물을 포함하는 제1용액에 침지시키는 단계; 침지시킨 다공성 지지체에 산할로겐 화합물을 포함하는 제2용액을 처리하여 다공성 지지체의 표면에 폴리아미드층을 형성하는 단계; 및 폴리아미드층이 형성된 다공성 지지체를 친수화처리하는 단계;를 포함하는 유량이 향상된 내산성 나노분리막의 제조방법을 제공한다.In order to solve the above problems, the present invention comprises the steps of immersing a porous support in a first solution comprising a first amine compound, a second amine compound and a phenol compound comprising a compound represented by the formula (1); Treating the immersed porous support with a second solution including an acid halogen compound to form a polyamide layer on the surface of the porous support; And hydrophilizing the porous support on which the polyamide layer is formed.
[화학식 1][Formula 1]
상기 화학식 1에서 R1 및 R2는 각각 독립적으로 C1 ~ C10의 알킬렌기이고, 상기 n은 1 ~ 100의 정수이다.In Formula 1, R 1 and R 2 are each independently a C 1 to C 10 alkylene group, and n is an integer of 1 to 100.
본 발명의 바람직한 일실시예에 따르면, 상기 화학식 1에서 R1 및 R2는 각각 독립적으로 C2 ~ C6의 직쇄형 알킬렌기 또는 C2 ~ C6의 분쇄형 알킬렌기일 수 있고, 상기 n은 1 ~ 10의 정수일 수 있다.According to a preferred embodiment of the present invention, in Formula 1 R 1 and R 2 may be each independently C 2 ~ C 6 linear alkylene group or C 2 ~ C 6 It may be a crushed alkylene group, n May be an integer from 1 to 10.
본 발명의 바람직한 다른 일실시예에 따르면, 상기 페놀계 화합물은 피로카테콜, 레조르시놀, 하이드로퀴논, 피로갈롤 및 플로로글루시놀로 이루어진 군에서 선택된 1종 이상을 포함할 수 있다.According to another preferred embodiment of the present invention, the phenolic compound may include one or more selected from the group consisting of pyrocatechol, resorcinol, hydroquinone, pyrogallol and phloroglucinol.
본 발명의 바람직한 또 다른 일실시예에 따르면, 상기 제2아민계 화합물은 메타페닐렌디아민 및 피페라진으로 이루어진 군에서 선택된 1종 이상을 포함할 수 있다.According to another preferred embodiment of the present invention, the second amine-based compound may include one or more selected from the group consisting of metaphenylenediamine and piperazine.
본 발명의 바람직한 또 다른 일실시예에 따르면, 상기 제1용액은 제1아민계 화합물, 제2아민계 화합물 및 페놀계 화합물을 1 : 0.04 ~ 2 : 0.02 ~ 1의 중량비로 포함할 수 있다.According to another preferred embodiment of the present invention, the first solution may include a first amine compound, a second amine compound and a phenol compound in a weight ratio of 1: 0.04 to 2: 0.02 to 1.
본 발명의 바람직한 또 다른 일실시예에 따르면, 상기 제1용액은 제1아민계 화합물 100 중량부에 대하여 폴리비닐피롤리돈, 폴리에틸렌글리콜 및 폴리비닐 알코올로 이루어진 군에서 선택된 1종 이상을 포함하는 친수성 고분자를 0.4 ~ 40 중량부로 포함할 수 있다.According to another preferred embodiment of the present invention, the first solution comprises one or more selected from the group consisting of polyvinylpyrrolidone, polyethylene glycol and polyvinyl alcohol with respect to 100 parts by weight of the first amine compound The hydrophilic polymer may be included in an amount of 0.4 to 40 parts by weight.
본 발명의 바람직한 또 다른 일실시예에 따르면, 상기 산할로겐 화합물은 이소프탈로일클로라이드, 트리메조일클로라이드 및 테레프탈로일클로라이드 중에서 선택된 1종 이상을 포함할 수 있다.According to another preferred embodiment of the present invention, the acid halogen compound may include one or more selected from isophthaloyl chloride, trimesoyl chloride and terephthaloyl chloride.
본 발명의 바람직한 또 다른 일실시예에 따르면, 상기 친수화처리는 농도 0.01 ~ 2 %의 친수화 용액을 통해 수행할 수 있다.According to another preferred embodiment of the present invention, the hydrophilization treatment may be performed through a hydrophilization solution of 0.01 ~ 2% concentration.
본 발명의 바람직한 또 다른 일실시예에 따르면, 상기 친수화 용액은 수산화칼륨, 수산화 칼슘, 수산화마그네슘, 수산화나트륨, 황산, 황산나트륨, 아황산나트륨 및 탄산수소나트륨으로 이루어진 군에서 선택된 1종 이상을 포함할 수 있다.According to another preferred embodiment of the present invention, the hydrophilization solution may include one or more selected from the group consisting of potassium hydroxide, calcium hydroxide, magnesium hydroxide, sodium hydroxide, sulfuric acid, sodium sulfate, sodium sulfite and sodium hydrogencarbonate Can be.
본 발명의 바람직한 또 다른 일실시예에 따르면, 상기 친수화처리는 10℃ ~ 90℃에서 0.1 ~ 5분 동안 수행할 수 있다.According to another preferred embodiment of the present invention, the hydrophilization treatment may be performed for 10 minutes to 90 ℃ for 0.1 to 5 minutes.
본 발명의 바람직한 또 다른 일실시예에 따르면, 상기 다공성지지체는 부직포 및 다공성 고분자층을 포함할 수 있고, 상기 다공성 고분자층은 평균두께가 10 ~ 200㎛일 수 있고, 폴리설폰, 폴리에테르설폰, 폴리이미드, 폴리프로필렌 및 폴리비닐리덴플로라이드로 이루어진 군에서 선택된 1종 이상을 포함하여 형성될 수 있다.According to another preferred embodiment of the present invention, the porous support may include a nonwoven fabric and a porous polymer layer, the porous polymer layer may have an average thickness of 10 ~ 200㎛, polysulfone, polyethersulfone, It may be formed including one or more selected from the group consisting of polyimide, polypropylene and polyvinylidene fluoride.
한편 상술한 과제를 해결하기 위해 본 발명은 다공성지지체; 및 상기 다공성 지지체의 표면에 하기 화학식 1로 표시되는 화합물을 포함하는 제1아민계 화합물, 제2아민계 화합물 및 페놀계 화합물을 포함하는 제1용액과, 산할로겐 화합물을 포함하는 제2용액이 계면중합하여 형성된 폴리아미드층;을 포함하고, 상기 폴리아미드층은 표면이 친수화 개질된 유량이 향상된 내산성 나노분리막을 제공한다.On the other hand the present invention to solve the above problems the porous support; And a first solution including a first amine compound, a second amine compound, and a phenolic compound including a compound represented by the following Chemical Formula 1 on the surface of the porous support, and a second solution including an acid halogen compound. And a polyamide layer formed by interfacial polymerization, wherein the polyamide layer provides an acid resistant nanoseparation membrane having an improved flow rate with hydrophilic surface modification.
[화학식 1][Formula 1]
상기 화학식 1에서 R1 및 R2는 각각 독립적으로 C1 ~ C10의 알킬렌기이고, 상기 n은 1 ~ 100의 정수이다.In Formula 1, R 1 and R 2 are each independently a C 1 to C 10 alkylene group, and n is an integer of 1 to 100.
본 발명의 바람직한 일실시예에 따르면, 상기 폴리아미드층은 평균 두께가 0.05 ~ 1 ㎛일 수 있고, 상기 다공성 지지체는 평균두께가 30 ~ 300 ㎛인 부직포 및 평균두께가 10 ~ 200㎛인 다공성 고분자층을 포함할 수 있으며, 상기 다공성 고분자층은 폴리설폰, 폴리에테르설폰, 폴리이미드, 폴리프로필렌 및 폴리비닐리덴플로라이드로 이루어진 군에서 선택된 1종 이상을 포함하여 형성될 수 있다.According to a preferred embodiment of the present invention, the polyamide layer may have an average thickness of 0.05 ~ 1 ㎛, the porous support is a non-woven fabric having an average thickness of 30 ~ 300 ㎛ and a porous polymer having an average thickness of 10 ~ 200 ㎛ It may include a layer, the porous polymer layer may be formed including one or more selected from the group consisting of polysulfone, polyethersulfone, polyimide, polypropylene and polyvinylidene fluoride.
본 발명의 바람직한 다른 일실시예에 따르면, 상기 나노분리막은 25℃ 및 75 psi에서 유량이 25 gfd 이상일 수 있고, 염제거율이 90% 이상일 수 있다.According to another preferred embodiment of the present invention, the nano separator may have a flow rate of 25 gfd or more at 25 ° C. and 75 psi, and may have a salt removal rate of 90% or more.
본 발명의 바람직한 또 다른 일실시예에 따르면, 상기 나노분리막은 15 중량%의 황산 수용액에 30 일간 침지 시 25 및 75 psi에서 유량이 30 gfd 이상일 수 있고, 염제거율이 85% 이상일 수 있다.According to another preferred embodiment of the present invention, the nano-membrane membrane may be 30 gfd or more at 25 and 75 psi when immersed in 15 wt% sulfuric acid aqueous solution for 30 days, the salt removal rate may be 85% or more.
한편, 상술한 과제를 해결하기 위해 본 발명은 상술한 나노분리막을 포함하는 분리막 모듈을 제공한다.On the other hand, in order to solve the above problems, the present invention provides a membrane module including the above-described nano-membrane membrane.
본 발명의 유량이 향상된 내산성 나노분리막 및 이의 제조방법은 제련 공정에서 발생하는 희소금속 및 유가 금속 등을 회수하기 위하여 강산 및 고열조건에서도 사용가능하고, 유량이 우수한 동시에 내산성능이 우수한 효과가 있다.The acid resistant nano-membrane having an improved flow rate of the present invention and a method of manufacturing the same can be used under strong acid and high heat conditions to recover rare metals and valuable metals generated in the smelting process, and have excellent flow rate and excellent acid resistance.
이하, 본 발명을 보다 상세히 설명한다.Hereinafter, the present invention will be described in more detail.
상술한 바와 같이 종래에는 아민 수용액에 설포닐 할라이드를 도입하여 술폰 아미드층을 형성시켜 내산성을 갖는 나노분리막을 제조할 수 있었다. 이는 내산성이 필요한 제련 산업 등 산폐수가 발생하는 공정에 적용될 수 있으나, 제련 공정에서 발생하는 희소금속 및 유가 금속 등을 회수하기 위하여 강산 및 고열조건에서도 사용가능하고, 유량이 우수한 동시에 내산성능이 우수한 효과를 나타내기 어려운 문제점이 있었다.As described above, in the past, sulfonyl halides were introduced into an aqueous amine solution to form a sulfone amide layer, thereby preparing a nano separator having acid resistance. It can be applied to the process of generating acid wastewater such as smelting industry that needs acid resistance, but it can be used in strong acid and high temperature condition to recover rare metals and valuable metals generated in smelting process, and it has excellent flow rate and excellent acid resistance. There was a problem that was difficult to show the effect.
이에 본 발명은 다공성 지지체를 특정 화합물을 포함하는 제1용액에 침지시키는 단계; 침지시킨 다공성 지지체에 산할로겐 화합물을 포함하는 제2용액을 처리하여 다공성 지지체의 표면에 폴리아미드층을 형성하는 단계; 및 폴리아미드층이 형성된 다공성 지지체를 친수화처리하는 단계;를 포함하는 유량이 향상된 내산성 나노분리막의 제조방법을 제공하여 상술한 문제의 해결을 모색하였다.Accordingly, the present invention comprises the steps of immersing the porous support in a first solution containing a specific compound; Treating the immersed porous support with a second solution including an acid halogen compound to form a polyamide layer on the surface of the porous support; And hydrophilizing the porous support on which the polyamide layer is formed. The above-described problem was sought by providing a method for producing an acid resistant nanomembrane having an improved flow rate.
이를 통해 제련 공정에서 발생하는 희소금속 및 유가 금속 등을 회수하기 위하여 강산 및 고열조건에서도 사용가능하고, 유량이 우수한 동시에 내산성능이 우수한 효과를 달성할 수 있다.Through this, it can be used under strong acid and high heat conditions to recover the rare metals and valuable metals generated in the smelting process, and can achieve the effect of excellent flow rate and excellent acid resistance.
먼저, 다공성 지지체를 특정 화합물을 포함하는 제1용액에 침지하는 단계를 설명한다.First, the step of immersing the porous support in the first solution containing a specific compound will be described.
상기 제1용액에 침지하는 단계는, 상기 다공성 지지체를 제1용액에 침지함으로써 이후의 단계에서 산할로겐 화합물을 포함하는 제2용액을 처리하여 다공성 지지체의 표면에 폴리아미드층을 형성할 수 있다.In the step of immersing the first solution, the polyamide layer may be formed on the surface of the porous support by treating the second solution containing an acid halogenide compound in a subsequent step by immersing the porous support in the first solution.
일반적으로 폴리아미드 나노분리막은 다관능성 아민과 반응하는 물질을 사용하여 계면중합에 의해 막을 형성할 수 있으며, 상기 다관능성 아민은 단량체당 2 ∼ 3개 아민 관능기를 갖는 폴리아민으로서 1급 아민 또는 2급 아민류이다.In general, the polyamide nanoseparation membrane may form a membrane by interfacial polymerization using a material that reacts with the polyfunctional amine, and the polyfunctional amine is a polyamine having 2-3 amine functional groups per monomer and is a primary amine or secondary Amines.
상기 제1용액은 제1아민계 화합물, 제2아민계 화합물 및 페놀계 화합물을 포함한다.The first solution includes a first amine compound, a second amine compound, and a phenol compound.
상기 제1아민계 화합물은 염제거율 및 내산성을 향상시키기 위해 하기 화학식 1로 표시되는 화합물을 포함하는 제1아민계 화합물을 포함한다.The first amine compound includes a first amine compound including a compound represented by the following Formula 1 to improve salt removal rate and acid resistance.
[화학식 1][Formula 1]
상기 화학식 1에서 R1 및 R2는 각각 독립적으로 C1 ~ C10의 알킬렌기이고, 상기 n은 1 ~ 100의 정수이며, 바람직하게는 R1 및 R2는 각각 독립적으로 C2 ~ C6의 직쇄형 알킬렌기 또는 C2 ~ C6의 분쇄형 알킬렌기일 수 있고, 상기 n은 1 ~ 10의 정수일 수 있다.In Formula 1, R 1 and R 2 are each independently C 1 ~ C 10 Alkylene group, n is an integer of 1 to 100, preferably R 1 and R 2 are each independently C 2 ~ C 6 It may be a straight chain alkylene group of or C 2 ~ C 6 It may be a branched alkylene group, n may be an integer of 1 to 10.
또한, 상기 제2아민계 화합물은 당업계에서 통상적으로 염제거율을 향상시킬 수 있는 물질이라면 제한 없이 사용할 수 있으며, 바람직하게는 메타페닐렌디아민 및 피페라진으로 이루어진 군에서 선택된 1종 이상을 포함할 수 있고, 더욱 바람직하게는 피페라진을 사용하는 것이 염제거율을 향상시키는데 유리하다.In addition, the second amine-based compound may be used without limitation as long as it is a material capable of improving salt removal rate in the art, and preferably includes one or more selected from the group consisting of metaphenylenediamine and piperazine. And more preferably using piperazine is advantageous for improving the salt removal rate.
그리고, 상기 페놀계 화합물은 당업계에서 통상적으로 유량을 향상시킬 수 있는 물질이라면 제한 없이 사용할 수 있으며, 바람직하게는 피로카테콜, 레조르시놀, 하이드로퀴논, 피로갈롤 및 플로로글루시놀로 이루어진 군에서 선택된 1종 이상을 포함할 수 있고, 보다 바람직하게는 피로카테콜, 레조르시놀 및 하이드로퀴논으로 이루어진 군에서 선택된 1종 이상을 포함할 수 있으며, 더욱 바람직하게는 레조르시놀을 사용하는 것이 유량을 현저히 향상시키는데 유리하다. 상기 페놀계 화합물을 포함함에 따라, 추후 형성되는 폴리아미드층의 표면을 친수화 개질시켜서 유량을 향상시킬 수 있다.In addition, the phenolic compound may be used without limitation as long as it is a substance capable of improving flow rate in the art, and preferably, the group consisting of pyrocatechol, resorcinol, hydroquinone, pyrogallol and phloroglucinol. It may include at least one selected from, more preferably may comprise at least one selected from the group consisting of pyrocatechol, resorcinol and hydroquinone, more preferably using resorcinol It is advantageous to significantly improve the flow rate. By including the phenolic compound, it is possible to improve the flow rate by hydrophilic modification of the surface of the polyamide layer to be formed later.
한편, 상기 제1용액은 제1아민계 화합물, 제2아민계 화합물 및 페놀계 화합물을 1 : 0.04 ~ 2 : 0.02 ~ 1의 중량비로, 바람직하게는 1 : 0.06 ~ 1.6 : 0.04 ~ 0.8의 중량비로 포함할 수 있다.On the other hand, the first solution is a weight ratio of the first amine compound, the second amine compound and the phenol compound in a weight ratio of 1: 0.04 ~ 2: 0.02 ~ 1, preferably 1: 0.06 ~ 1.6: 0.04 ~ 0.8 It can be included as.
만일 상기 제1아민계 화합물 및 제2아민계 화합물의 중량비가 1 : 0.04 미만이면 염제거율이 현격히 저하될 수 있고, 중량비가 1 : 2를 초과하면 유량이 좋지 않은 문제가 발생할 수 있다. 또한, 만일 상기 제1아민계 화합물 및 페놀계 화합물의 중량비가 1 : 0.02 미만이면 유량 향상 효과가 미미할 수 있고, 중량비가 1 : 1을 초과할 경우 염제거율 및 내산성이 현격히 조하되는 문제가 발생할 수 있다.If the weight ratio of the first amine-based compound and the second amine-based compound is less than 1: 0.04, the salt removal rate may be significantly lowered. If the weight ratio is greater than 1: 2, a problem may occur in that the flow rate is not good. In addition, if the weight ratio of the first amine compound and the phenolic compound is less than 1: 0.02, the effect of improving the flow rate may be insignificant, and if the weight ratio is greater than 1: 1, problems of salt removal rate and acid resistance may be significantly reduced. have.
한편, 상기 제1용액은 친수성 고분자를 포함할 수 있다.On the other hand, the first solution may include a hydrophilic polymer.
상기 친수성 고분자는 당업계에서 통상적으로 사용할 수 있는 친수성 고분자라면 제한 없이 사용할 수 있으며, 바람직하게는 폴리비닐피롤리돈, 폴리에틸렌글리콜 및 폴리비닐 알코올로 이루어진 군에서 선택된 1종 이상을 포함할 수 있고, 더욱 바람직하게는 폴리비닐피롤리돈을 사용할 수 있다.The hydrophilic polymer may be used without limitation as long as it is a hydrophilic polymer commonly used in the art, preferably may include one or more selected from the group consisting of polyvinylpyrrolidone, polyethylene glycol and polyvinyl alcohol, More preferably, polyvinylpyrrolidone can be used.
상기 제1용액은 제1아민계 화합물 100 중량부에 대하여 친수성 고분자를 0.4 ~ 40 중량부로, 바람직하게는 1 ~ 35 중량부로 포함할 수 있다. 만일 상기 제1아민계 화합물 100 중량부에 대하여 친수성 고분자를 0.4 중량부 미만으로 포함하면 초기 유량 및 내산성이 좋지 않은 문제가 발생할 수 있고, 40 중량부를 초과하여 포함하면 염제거율 및 내산성이 좋지 않은 문제가 발생할 수 있다.The first solution may include 0.4 to 40 parts by weight of hydrophilic polymer, preferably 1 to 35 parts by weight, based on 100 parts by weight of the first amine compound. If the hydrophilic polymer is included in an amount less than 0.4 part by weight based on 100 parts by weight of the first amine compound, a problem may occur that the initial flow rate and acid resistance are not good. If the content exceeds 40 parts by weight, the salt removal rate and the acid resistance are not good. May occur.
한편, 상기 다공성 지지체는 부직포 및 다공성 고분자층을 포함할 수 있다.Meanwhile, the porous support may include a nonwoven fabric and a porous polymer layer.
상기 부직포는 당업계에서 통상적으로 사용할 수 있는 제원의 부직포라면 제한 없이 사용할 수 있으며, 바람직하게는 평균두께가 30 ~ 300㎛, 더욱 바람직하게는 평균두께가 50 ~ 200㎛일 수 있으나, 이에 제한되지 않는다.The nonwoven fabric can be used without limitation as long as it is a nonwoven fabric of the specification commonly used in the art, preferably an average thickness of 30 ~ 300㎛, more preferably an average thickness of 50 ~ 200㎛, but is not limited thereto. Do not.
또한, 상기 다공성 고분자층은 통상적으로 사용할 수 있는 물질에 의해 형성된 다공성 고분자층일 수 있으며, 바람직하게는 폴리설폰, 폴리에테르설폰, 폴리이미드, 폴리프로필렌 및 폴리비닐리덴플로라이드로 이루어진 군에서 선택된 1종 이상을 포함하여 형성될 수 있고, 평균두께가 10 ~ 200㎛, 바람직하게는 평균두께가 30 ~ 190㎛일 수 있으나, 이에 제한되지 않는다.In addition, the porous polymer layer may be a porous polymer layer formed of a material that can be commonly used, preferably one selected from the group consisting of polysulfone, polyethersulfone, polyimide, polypropylene and polyvinylidene fluoride It may be formed to include the above, the average thickness may be 10 ~ 200㎛, preferably 30 ~ 190㎛ average thickness, but is not limited thereto.
다음으로, 침지시킨 다공성 지지체에 산할로겐 화합물을 포함하는 제2용액을 처리하여 다공성 지지체의 표면에 폴리아미드층을 형성하는 단계를 설명한다.Next, the step of forming a polyamide layer on the surface of the porous support by treating the immersed porous support with a second solution containing an acid halide compound.
상기 폴리아미드층을 형성하는 단계에서 상기 다공성 지지체는 상술한 침지하는 단계에서 제1용액에 침지한 것으로서, 표면에 잔존하는 제1용액과 산할로겐 화합물을 포함하는 제2용액을 반응시켜 폴리아미드층을 형성시킬 수 있다.In the step of forming the polyamide layer, the porous support is immersed in the first solution in the immersion step described above, and the polyamide layer is made by reacting a first solution remaining on the surface with a second solution containing an acid halide compound. Can be formed.
상기 산할로겐 화합물은 통상적으로 폴리아미드층을 형성할 수 있는 물질이라면 제한 없이 사용할 수 있으며, 바람직하게는 이소프탈로일클로라이드, 트리메조일클로라이드 및 테레프탈로일클로라이드 중에서 선택된 1종 이상일 수 있으며, 더욱 바람직하게는 트리메조일클로라이드를 사용할 수 있다. 산할로겐 화합물로 트리메조일클로라이드를 사용하는 경우, 우수한 염제거율을 나타낼 수 있다.The acid halogen compound may be used without limitation as long as it is a material capable of forming a polyamide layer. Preferably, the acid halogen compound may be at least one selected from isophthaloyl chloride, trimesoyl chloride and terephthaloyl chloride, and more preferably. Preferably trimezoyl chloride can be used. When trimesoyl chloride is used as the acid halogen compound, excellent salt removal rate can be exhibited.
그리고, 상기 제2용액은 제2용액 전체 중량에 대하여 산할로겐 화합물을 0.005 ~ 2 중량%, 바람직하게는 0.01 ~ 1 중량% 포함할 수 있다. 만일 상기 산할로겐 화합물이 0.005 중량% 미만이면 폴리아미드층이 형성되기 어려운 문제가 발생할 수 있고, 2 중량%를 초과하면 산할로겐 화합물이 석출되어 계면중합이 용이하지 않은 문제가 발생할 수 있다.In addition, the second solution may contain 0.005 to 2% by weight, preferably 0.01 to 1% by weight, of the acid halogen compound, based on the total weight of the second solution. If the acid halogen compound is less than 0.005% by weight, a problem that a polyamide layer is difficult to form may occur. If the acid halogen compound is more than 2% by weight, the acid halogen compound may be precipitated, thereby making it difficult to interface-polymerize easily.
상기 폴리아미드층을 형성하는 단계는 건조하는 단계를 포함할 수 있다. 상기 건조는 통상적인 건조 조건이라면 제한되지 않으며, 바람직하게는 10℃ ~ 100℃ 에서 0.5 ~ 20분 동안, 더욱 바람직하게는 15℃ ~ 90℃에서 1 ~ 10 분 동안 건조할 수 있다.Forming the polyamide layer may include a step of drying. The drying is not limited as long as the general drying conditions, preferably may be dried for 10 minutes to 10 minutes at 10 ℃ to 100 ℃, more preferably 1 to 10 minutes at 15 ℃ to 90 ℃.
한편, 상기 형성된 폴리아미드층은 평균두께가 0.05 ~ 1㎛일 수 있고, 바람직하게는 0.1 ~ 900㎛일 수 있으나, 이에 제한되지 않는다.On the other hand, the polyamide layer formed may have an average thickness of 0.05 ~ 1㎛, preferably 0.1 ~ 900㎛, but is not limited thereto.
다음으로, 폴리아미드층이 형성된 다공성 지지체를 친수화처리하는 단계를 설명한다. 상기 친수화처리를 수행함에 따라 폴리아미드층의 표면을 친수화 개질시켜서 유량을 더욱 향상시킬 수 있다.Next, a step of hydrophilizing the porous support on which the polyamide layer is formed will be described. By performing the hydrophilization treatment, the surface of the polyamide layer may be hydrophilized to further improve the flow rate.
상기 친수화 용액은 통상적으로 폴리아미드층의 표면을 친수화 개질시킬 수 있는 물질이라면 제한되지 않으며, 바람직하게는 산 또는 염기물질을 포함하는 친수화 용액을 통해 수행할 수 있고, 더욱 바람직하게는 수산화칼륨, 수산화 칼슘, 수산화마그네슘, 수산화나트륨, 황산, 황산나트륨, 아황산나트륨 및 탄산수소나트륨으로 이루어진 군에서 선택된 1종 이상을 포함하는 친수화 용액을 통해 수행할 수 있으며, 가장 바람직하게는 수산화나트륨을 포함하는 친수화 용액을 통해 수행하는 것이 유량을 현저히 향상시키는데 유리하다.The hydrophilization solution is not particularly limited as long as it is a material capable of hydrophilic modification of the surface of the polyamide layer, preferably can be carried out through a hydrophilization solution containing an acid or a base material, more preferably hydroxide Potassium, calcium hydroxide, magnesium hydroxide, sodium hydroxide, sulfuric acid, sodium sulfate, sodium sulfite and sodium hydrogen carbonate can be carried out through a hydrophilic solution containing at least one selected from the group consisting of sodium hydroxide most preferably Performing through a hydrophilic solution is advantageous to significantly improve the flow rate.
또한, 상기 친수화처리는 농도 0.01 ~ 2%의 친수화 용액을 통해 수행할 수 있고, 바람직하게는 농도 0.015 ~ 1.8%의 친수화 용액을 통해 수행할 수 있다. 만일 상기 친수화 용액의 농도가 0.01% 미만이면 유량 향상 효과가 미미할 수 있고, 2%를 초과하면 폴리아미드층이 분해됨에 따라 제거율이 저하되는 문제가 발생할 수 있다.In addition, the hydrophilization treatment may be performed through a hydrophilization solution having a concentration of 0.01 to 2%, preferably through a hydrophilization solution having a concentration of 0.015 to 1.8%. If the concentration of the hydrophilization solution is less than 0.01%, the effect of improving the flow rate may be insignificant, and if it exceeds 2%, a problem may occur in that the removal rate is lowered as the polyamide layer is decomposed.
상기 친수화처리는 폴리아미드층이 형성된 다공성 지지체를 친수화 용액에 침지하여 수행할 수 있다. 상기 친수화 처리는 10 ~ 90℃에서 0.1 ~ 5분 동안 수행할 수 있으며, 바람직하게는 15 ~ 80에서 0.2 ~ 3분 동안 수행할 수 있다. 만일 친수화 처리 온도가 10미만이면 유량 향상효과가 미미할 수 있고, 온도가 90를 초과하면 제거율이 저하되는 문제가 발생할 수 있다. 또한, 만일 상기 친수화 처리 시간이 0.1분 미만이면 유량 향상 효과가 미미할 수 있고, 5분을 초과하면 폴리아미드층이 분해됨에 따라 제거율이 저하되는 문제가 발생할 수 있다.The hydrophilization treatment may be performed by immersing the porous support on which the polyamide layer is formed in a hydrophilization solution. The hydrophilization treatment may be performed at 10 to 90 ℃ for 0.1 to 5 minutes, preferably at 15 to 80 for 0.2 to 3 minutes. If the hydrophilization treatment temperature is less than 10, the effect of improving the flow rate may be insignificant, and if the temperature exceeds 90, the problem may occur that the removal rate is lowered. In addition, if the hydrophilization treatment time is less than 0.1 minutes, the effect of improving the flow rate may be insignificant, and if it exceeds 5 minutes, the removal rate may decrease as the polyamide layer is decomposed.
한편, 상기 상술한 친수화처리를 수행한 이후, 친수화처리를 수행한 다공성 지지체를 완충용액에 침지하여 미반응 잔여물을 제거할 수 있다. 보다 상세하게는, 상기 다공성 지지체를 완충용액에 10℃ ~ 95℃의 수온에서 0.5 ~ 24 시간 동안, 바람직하게는 15℃ ~ 90℃의 수온에서 1 ~ 5 시간 동안 침지시킨 후 증류수로 수세하여 미반응 잔여물을 제거할 수 있다.On the other hand, after performing the above-described hydrophilization treatment, the unsupported residue may be removed by immersing the porous support subjected to the hydrophilization treatment in a buffer solution. More specifically, the porous support is immersed in a buffer solution for 0.5 to 24 hours at a water temperature of 10 ℃ ~ 95 ℃, preferably 1 to 5 hours at a water temperature of 15 ℃ ~ 90 ℃ and washed with distilled water The reaction residue can be removed.
상기 완충용액은 통상적으로 완충용액의 역할을 할 수 있는 물질이라면 제한 없이 사용할 수 있으며, 바람직하게는 소듐카보네이트를 포함할 수 있다. 또한, 상기 완충용액은 완충용액 전체 중량에 대하여 소듐카보네이트를 0.05 ~ 0.5 중량%, 바람직하게는 0.1 ~ 0.4 중량% 포함할 수 있으나, 이에 제한되지 않는다.The buffer solution may be used without limitation as long as it is a material capable of serving as a buffer solution, and may preferably include sodium carbonate. In addition, the buffer solution may include 0.05 to 0.5% by weight of sodium carbonate, preferably 0.1 to 0.4% by weight based on the total weight of the buffer solution, but is not limited thereto.
한편, 상술한 제조방법을 통해 제조된 나노분리막은 25℃ 및 75 psi에서 유량이 25 gfd 이상이고, 염제거율이 90% 이상일 수 있고, 15 중량%의 황산 수용액에 30 일간 침지 시 25℃ 및 75 psi에서 유량이 30 gfd 이상이고, 염제거율이 85% 이상일 수 있다.On the other hand, the nano-membrane prepared through the above-described manufacturing method has a flow rate of 25 gfd or more at 25 ℃ and 75 psi, the salt removal rate may be 90% or more, 25 ℃ and 75 when immersed in 15 wt% sulfuric acid aqueous solution for 30 days At psi, the flow rate may be at least 30 gfd and the salt removal rate may be at least 85%.
이하, 본 발명을 하기 실시예들을 통해 설명한다. 이때, 하기 실시예들은 발명을 예시하기 위하여 제시된 것일 뿐, 본 발명의 권리범위가 하기 실시예들에 의해 한정되는 것은 아니다.Hereinafter, the present invention will be described through the following examples. At this time, the following examples are only presented to illustrate the invention, the scope of the present invention is not limited by the following examples.
[[ 실시예Example ]]
실시예Example 1 : 나노분리막의 제조 1: Preparation of nano separator
평균두께가 100㎛ 인 부직포 위에 캐스팅된 140 ㎛ 두께의 다공성 폴리설폰 지지체를 제1용액으로 하기 화학식 1로 표시되는 화합물 1 중량%, 페놀계 화합물로 레조르시놀 0.35 중량%, 제2아민계 화합물로 피페라진 0.5 중량% 및 친수성 고분자로 폴리비닐피롤리돈 0.05 중량%를 포함하는 수용액에 40 초 동안 침지한 후, 제1용액이 표면에 도포된 지지체를 제2용액으로 산할로겐 화합물로 트리메조일클로라이드를 0.02 중량% 포함하는 유기용액에 1분 간 침지하여 계면 중합하였다. 그 후, 25℃에서 1.5 분 동안 건조하여 표면에 폴리아미드층을 형성하고, 친수화 용액으로 수산화 나트륨을 0.15% 농도로 포함하는 수용액에 1분 동안 침지하여 친수화처리를 수행한 후, 소듐카보네이트를 0.2 중량% 포함하는 완충용액에 2 시간 동안 침지하여 산 또는 미반응 잔여물들을 제거하여 내산성 나노분리막을 제조하였다.1 wt% of a compound represented by the following formula (1) using a porous polysulfone support having a thickness of 140 μm cast on a nonwoven fabric having an average thickness of 100 μm as a first solution, 0.35 wt% of resorcinol as a phenolic compound, and a second amine compound After immersing in an aqueous solution containing 0.5% by weight of low piperazine and 0.05% by weight of polyvinylpyrrolidone with a hydrophilic polymer for 40 seconds, the support on which the first solution was applied to the surface was treated with an acid halide compound as a second solution. It was immersed in an organic solution containing 0.02% by weight of monochloride for 1 minute to perform interfacial polymerization. Thereafter, the mixture was dried at 25 ° C. for 1.5 minutes to form a polyamide layer on the surface, and then immersed in an aqueous solution containing sodium hydroxide at a concentration of 0.15% for 1 minute with a hydrophilic solution, followed by hydrophilization. Was immersed in a buffer solution containing 0.2% by weight for 2 hours to remove the acid or unreacted residues to prepare an acid resistant nano separator.
[화학식 1][Formula 1]
상기 화학식 1에서 R1 및 R2는 각각 에틸렌기이고, 상기 n은 2이다.In Formula 1, R 1 and R 2 are each an ethylene group, and n is 2.
실시예Example 2 ~ 24 및 2 to 24 and 비교예Comparative example 1 ~ 8 1 to 8
상기 실시예 1과 동일하게 실시하되, 하기 표 1 내지 표 6과 같이 제1아민계 화합물, 제2아민계 화합물 및 페놀계 화합물의 함량, 화학식 1로 표시되는 화합물의 종류, 친수화 용액을 농도 및 친수화처리 유무 등을 변경하여 나노분리막을 제조하였다.In the same manner as in Example 1, the content of the first amine-based compound, the second amine-based compound and the phenolic compound, the type of the compound represented by the formula (1), hydrophilic solution as shown in Table 1 to Table 6 And nano hydromembrane was prepared by changing the presence or absence of hydrophilization treatment.
실험예Experimental Example 1 : 유량, 1: flow rate, 염제거율Salt removal rate 및 And 염제거율의Desalination 변화율 평가 Rate of change
나노분리막의 성능을 평가하기 위하여, 상기 실시예 1 ~ 24 및 비교예 1 ~ 8에 따라 제조한 나노분리막을 2000 ppm 염화나트륨 수용액에서 25 및 75 psi의 조건으로 투과유량을 측정하였고, 2000 ppm 황산 마그네슘 수용액에서 25 및 75 psi의 조건으로 염제거율을 측정하였다. 이후 황산 15 중량% 용액에 30일 간 침지한 후 동일한 방법으로 투과유량 및 염제거율을 측정하였다. 또한, 상기 염제거율의 변화율을 하기 식 1과 같은 방법으로 측정하였다. 이를 하기 표 1 내지 6에 나타내었다.In order to evaluate the performance of the nano-membrane membrane, the permeate flow rate of the nano-membrane prepared according to Examples 1 to 24 and Comparative Examples 1 to 8 was measured at 25 and 75 psi in a 2000 ppm sodium chloride solution, and 2000 ppm magnesium sulfate The salt removal rate was measured under conditions of 25 and 75 psi in aqueous solution. After immersing in 15 wt% sulfuric acid solution for 30 days and then the permeate flux and salt removal rate were measured in the same manner. In addition, the rate of change of the salt removal rate was measured by the same method as in Equation 1 below. This is shown in Tables 1 to 6 below.
[식 1][Equation 1]
염 제거율 변화율(%) = 30 일 침지 후 염제거율(%) - 초기 염제거율(%)% Change in salt removal rate =% salt removal after 30 days immersion-initial salt removal rate (%)
실험예Experimental Example 2 : 2 : 접촉각Contact angle 및 And 접촉각Contact angle 변화 평가 Change assessment
나노분리막의 성능을 평가하기 위하여, 상기 실시예 1 ~ 24 및 비교예 1 ~ 8에 따라 제조한 나노분리막을 접촉각 측정기(DSA 100, KRUSS)을 이용하여 측정하였다. 접촉각 측정에는 증류수를 사용하여 측정하였다. 이후 황산 15 중량% 용액에 30일 간 침지한 후 동일한 방법으로 접촉각을 측정하였다. 또한, 접촉각의 변화율을 하기 식 2과 같은 방법으로 측정하였다. 이를 하기 표 1 내지 6에 나타내었다.In order to evaluate the performance of the nano-membrane, the nano-membrane prepared according to Examples 1 to 24 and Comparative Examples 1 to 8 were measured using a contact angle measuring device (DSA 100, KRUSS). Distilled water was used for the contact angle measurement. Thereafter, the contact angle was measured in the same manner after immersion in 15 wt% sulfuric acid solution for 30 days. In addition, the rate of change of the contact angle was measured by the same method as in Equation 2 below. This is shown in Tables 1 to 6 below.
[식 2] [Equation 2]
접촉각 변화(°) = 30 일 침지 후 접촉각(°) - 초기 접촉각(°)Change in contact angle (°) = contact angle (°) after 30 days immersion-initial contact angle (°)
상기 표 1 내지 표 6에서 알 수 있듯이 본 발명에 따른 나노분리막은 우수한 내산성을 가져, 15 중량%의 황산에 30일 이상 장기간 침지되어도 분리막으로서의 기능을 상실하지 않고, 염제거율의 변화율이 10 % 이내로 유지되는 것을 확인할 수 있었다.As can be seen from Table 1 to Table 6, the nanomembrane according to the present invention has excellent acid resistance, and even if it is immersed in 15% by weight of sulfuric acid for 30 days or longer, it does not lose its function as a separator, and the rate of change of the salt removal rate is within 10%. It could be confirmed that it is maintained.
또한, 본 발명에 따른 나노분리막은, 본 발명에 따른 조건 및 함량 등을 만족하지 못하는 나노분리막에 비하여 초기유량, 초기 염제거율, 황산 침지 30일 후 유량 및 염제거율이 모두 월등히 우수한 것을 확인할 수 있었다.In addition, the nano-membrane according to the present invention, compared to the nano-membrane that does not satisfy the conditions and contents according to the present invention, it was confirmed that the initial flow rate, initial salt removal rate, the flow rate and salt removal rate after 30 days of sulfuric acid immersion are all excellent. .
또한, 본 발명에 따른 나노분리막은 초기 접촉각이 낮을수록 친수화 처리가 더 많이 진행되어 유량이 향상되는 효과를 확인할 수 있었으며, 접촉각 변화율이 낮을수록 산가수분해가 억제되어 내산성능이 향상되었음을 확인할 수 있었다.In addition, the nano-separation membrane according to the present invention was confirmed that the lower the initial contact angle, the more the hydrophilization treatment proceeds, the flow rate is improved, the lower the contact angle change rate is inhibited acid hydrolysis is confirmed that the acid resistance is improved. there was.
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| JP2015180495A (en) * | 2014-03-07 | 2015-10-15 | 東レ株式会社 | Composite separation membrane, and composite separation membrane element |
| CN103894073A (en) | 2014-04-21 | 2014-07-02 | 哈尔滨工业大学 | Method for hydrophilic modification of porous filter membrane by using diluted solution interfacial polymerization behavior |
| CN104258743A (en) | 2014-09-01 | 2015-01-07 | 中国海洋大学 | High-performance composite nanofiltration membrane with resistance to oxidation of organic solvent and chlorine, as well as preparation method and application of membrane |
| CN105085929B (en) | 2015-08-20 | 2017-07-21 | 江苏奥斯佳材料科技有限公司 | A kind of polyurethane surface treating agent and the application in synthesis of polyurethane material |
-
2017
- 2017-03-24 KR KR1020170037649A patent/KR102220117B1/en active Active
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2018
- 2018-03-23 WO PCT/KR2018/003414 patent/WO2018174626A2/en not_active Ceased
- 2018-03-23 US US16/497,173 patent/US11097228B2/en active Active
- 2018-03-23 JP JP2019552471A patent/JP6923668B2/en active Active
- 2018-03-23 CN CN201880027083.XA patent/CN110573241B/en active Active
- 2018-03-23 EP EP18771521.4A patent/EP3603783B1/en active Active
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|---|---|
| EP3603783C0 (en) | 2023-11-01 |
| CN110573241B (en) | 2022-04-26 |
| KR102220117B1 (en) | 2021-02-24 |
| EP3603783A4 (en) | 2020-12-16 |
| JP2020514046A (en) | 2020-05-21 |
| WO2018174626A3 (en) | 2019-04-04 |
| JP6923668B2 (en) | 2021-08-25 |
| EP3603783A2 (en) | 2020-02-05 |
| US11097228B2 (en) | 2021-08-24 |
| CN110573241A (en) | 2019-12-13 |
| EP3603783B1 (en) | 2023-11-01 |
| US20200094196A1 (en) | 2020-03-26 |
| KR20180108199A (en) | 2018-10-04 |
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