[go: up one dir, main page]

WO2018168939A8 - 蛍光ｘ線分析方法、蛍光ｘ線分析プログラムおよび蛍光ｘ線分析装置 - Google Patents

蛍光ｘ線分析方法、蛍光ｘ線分析プログラムおよび蛍光ｘ線分析装置 Download PDF

Info

Publication number
WO2018168939A8
WO2018168939A8 PCT/JP2018/010004 JP2018010004W WO2018168939A8 WO 2018168939 A8 WO2018168939 A8 WO 2018168939A8 JP 2018010004 W JP2018010004 W JP 2018010004W WO 2018168939 A8 WO2018168939 A8 WO 2018168939A8
Authority
WO
WIPO (PCT)
Prior art keywords
ray fluorescence
fluorescence analysis
analysis method
theoretical intensity
spectrometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2018/010004
Other languages
English (en)
French (fr)
Other versions
WO2018168939A1 (ja
Inventor
片岡　由行
航介 川久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rigaku Denki Co Ltd
Rigaku Corp
Original Assignee
Rigaku Denki Co Ltd
Rigaku Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rigaku Denki Co Ltd, Rigaku Corp filed Critical Rigaku Denki Co Ltd
Priority to JP2019506226A priority Critical patent/JP6614740B2/ja
Priority to EP18767402.3A priority patent/EP3598116B1/en
Priority to CN201880012059.9A priority patent/CN110312928B/zh
Publication of WO2018168939A1 publication Critical patent/WO2018168939A1/ja
Publication of WO2018168939A8 publication Critical patent/WO2018168939A8/ja
Priority to US16/559,063 priority patent/US10921267B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

ＦＰ法による蛍光Ｘ線分析方法において、感度定数を求めるための標準試料理論強度計算ステップおよび繰り返し計算の中の未知試料理論強度計算ステップで用いる所定の理論強度式において、Ｘ線の吸収に関する吸収項についてのみ、各成分の濃度比を全成分の濃度比の合計が１になるように規格化する。
PCT/JP2018/010004 2017-03-15 2018-03-14 蛍光ｘ線分析方法、蛍光ｘ線分析プログラムおよび蛍光ｘ線分析装置 Ceased WO2018168939A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019506226A JP6614740B2 (ja) 2017-03-15 2018-03-14 蛍光ｘ線分析方法、蛍光ｘ線分析プログラムおよび蛍光ｘ線分析装置
EP18767402.3A EP3598116B1 (en) 2017-03-15 2018-03-14 X-ray fluorescence analysis method, x-ray fluorescence analysis program, and x-ray fluorescence spectrometer
CN201880012059.9A CN110312928B (zh) 2017-03-15 2018-03-14 荧光x射线分析方法以及荧光x射线分析装置
US16/559,063 US10921267B2 (en) 2017-03-15 2019-09-03 X-ray fluorescence analysis method, X-ray fluorescence analysis program, and X-ray fluorescence spectrometer

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-049447 2017-03-15
JP2017049447 2017-03-15

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US16/559,063 Continuation US10921267B2 (en) 2017-03-15 2019-09-03 X-ray fluorescence analysis method, X-ray fluorescence analysis program, and X-ray fluorescence spectrometer

Publications (2)

Publication Number Publication Date
WO2018168939A1 WO2018168939A1 (ja) 2018-09-20
WO2018168939A8 true WO2018168939A8 (ja) 2019-08-15

Family

ID=63523109

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2018/010004 Ceased WO2018168939A1 (ja) 2017-03-15 2018-03-14 蛍光ｘ線分析方法、蛍光ｘ線分析プログラムおよび蛍光ｘ線分析装置

Country Status (5)

Country Link
US (1) US10921267B2 (ja)
EP (1) EP3598116B1 (ja)
JP (1) JP6614740B2 (ja)
CN (1) CN110312928B (ja)
WO (1) WO2018168939A1 (ja)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
JP7117452B2 (ja) 2018-07-26 2022-08-12 シグレイ、インコーポレイテッド 高輝度反射型ｘ線源
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
CN112638261B (zh) 2018-09-04 2025-06-27 斯格瑞公司 利用滤波的x射线荧光的系统和方法
DE112019004478T5 (de) 2018-09-07 2021-07-08 Sigray, Inc. System und verfahren zur röntgenanalyse mit wählbarer tiefe
CN114729907B (zh) 2019-09-03 2023-05-23 斯格瑞公司 用于计算机层析x射线荧光成像的系统和方法
JP6838754B1 (ja) * 2019-09-26 2021-03-03 株式会社リガク 蛍光ｘ線分析装置
US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
CN115667896B (zh) 2020-05-18 2024-06-21 斯格瑞公司 使用晶体分析器和多个检测元件的x射线吸收光谱的系统和方法
JP7190749B2 (ja) * 2020-05-18 2022-12-16 株式会社リガク 蛍光ｘ線分析装置
US11549895B2 (en) 2020-09-17 2023-01-10 Sigray, Inc. System and method using x-rays for depth-resolving metrology and analysis
CN112432916A (zh) * 2020-11-10 2021-03-02 青岛海关技术中心 一种碳酸钙粉体的化验鉴定方法及商品归类应用
WO2022126071A1 (en) 2020-12-07 2022-06-16 Sigray, Inc. High throughput 3d x-ray imaging system using a transmission x-ray source
US12480892B2 (en) 2020-12-07 2025-11-25 Sigray, Inc. High throughput 3D x-ray imaging system using a transmission x-ray source
JP7233756B2 (ja) * 2021-06-08 2023-03-07 株式会社リガク 蛍光ｘ線分析装置
JP7613328B2 (ja) 2021-09-24 2025-01-15 住友金属鉱山株式会社 鉱石の選定方法、検量線の作成方法、検量線の更新方法、及び鉱石の分析方法
US12360067B2 (en) 2022-03-02 2025-07-15 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
US11992350B2 (en) 2022-03-15 2024-05-28 Sigray, Inc. System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector
CN119173759A (zh) 2022-05-02 2024-12-20 斯格瑞公司 X射线顺序阵列波长色散光谱仪
CN121013975A (zh) 2023-02-16 2025-11-25 斯格瑞公司 具有至少两个堆叠的平面布拉格衍射器的x射线探测器系统
JP7653719B2 (ja) 2023-02-24 2025-03-31 株式会社リガク 蛍光ｘ線分析装置
JP7653718B2 (ja) 2023-02-24 2025-03-31 株式会社リガク 蛍光ｘ線分析装置
CN116935982B (zh) * 2023-07-24 2025-06-20 西南科技大学 一种泥石流样品中矿物含量的半定量分析方法
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources
WO2025101530A1 (en) 2023-11-07 2025-05-15 Sigray, Inc. System and method for x-ray absorption spectroscopy using spectral information from two orthogonal planes
WO2025151383A1 (en) 2024-01-08 2025-07-17 Sigray, Inc. X-ray analysis system with focused x-ray beam and non-x-ray microscope
WO2025174966A1 (en) 2024-02-15 2025-08-21 Sigray, Inc. System and method for generating a focused x‑ray beam

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2853261B2 (ja) * 1989-05-16 1999-02-03 三菱マテリアル株式会社 金属分析方法および分析装置
JP3921872B2 (ja) * 1999-05-20 2007-05-30 株式会社島津製作所 蛍光ｘ線分析用データ処理装置
FI20011362L (fi) * 2001-06-26 2002-12-27 Bs Instr Technology Oy Röntgenfluoresenssianalysaattori ja menetelmä röntgenfluoresenssianalysaattorin käyttämiseksi
DE10159828B4 (de) * 2001-12-06 2007-09-20 Rigaku Industrial Corporation, Takatsuki Röntgenfluoreszenzspektrometer
US6845147B2 (en) * 2002-06-17 2005-01-18 Edax Inc. Scatter spectra method for x-ray fluorescent analysis with optical components
JP3965191B2 (ja) * 2005-04-06 2007-08-29 理学電機工業株式会社 蛍光ｘ線分析装置およびそれに用いるプログラム
US8155268B2 (en) * 2009-04-23 2012-04-10 Thermo Niton Analyzers Llc Rapid screening for lead concentration compliance by X-ray fluorescence (XRF) analysis
JP2011099749A (ja) * 2009-11-05 2011-05-19 Horiba Ltd 濃度計測方法及び蛍光ｘ線分析装置
JP5481752B2 (ja) * 2010-09-15 2014-04-23 株式会社リガク 蛍光ｘ線分析装置
JP6266914B2 (ja) * 2013-08-01 2018-01-24 田中貴金属工業株式会社 蛍光ｘ線分析装置を用いた貴金属製品の分析方法、及び、貴金属製品分析用のコンピュータプログラム
WO2015056305A1 (ja) * 2013-10-15 2015-04-23 株式会社島津製作所 蛍光ｘ線分析方法及び蛍光ｘ線分析装置
CN105637352B (zh) * 2013-10-15 2018-09-04 株式会社岛津制作所 荧光x射线分析方法及荧光x射线分析装置
CN104111263B (zh) * 2014-07-07 2016-08-24 大连理工大学 一种虚拟合成标样的x射线荧光光谱基本参数法
US9784699B2 (en) * 2015-03-03 2017-10-10 Panalytical B.V. Quantitative X-ray analysis—matrix thickness correction
WO2017038702A1 (ja) * 2015-08-28 2017-03-09 株式会社リガク 蛍光ｘ線分析装置
US20180348150A1 (en) * 2017-05-30 2018-12-06 Malvern Panalytical B.V. Pressed Powder Sample Measurements Using X-ray Fluorescence

Also Published As

Publication number Publication date
CN110312928B (zh) 2021-03-26
EP3598116A1 (en) 2020-01-22
EP3598116A4 (en) 2020-04-29
CN110312928A (zh) 2019-10-08
US20200003712A1 (en) 2020-01-02
JP6614740B2 (ja) 2019-12-04
JPWO2018168939A1 (ja) 2019-11-14
US10921267B2 (en) 2021-02-16
WO2018168939A1 (ja) 2018-09-20
EP3598116B1 (en) 2021-07-21

Similar Documents

Publication Publication Date Title
WO2018168939A8 (ja) 蛍光ｘ線分析方法、蛍光ｘ線分析プログラムおよび蛍光ｘ線分析装置
Aaboud et al. Precision measurement and interpretation of inclusive W+, W-and Z/γ∗ production cross sections with the ATLAS detector
NZ703875A (en) Spectroscopic analysis
EP2797104A3 (en) Imaging mass analysis data processing method and imaging mass spectrometer
EA201790169A1 (ru) Анализаторы для проведения нейтронно-активационного анализа с мгновенным гамма-излучением
Zahn et al. Evaluation of peak-fitting software for gamma spectrum analysis
BR112015016228A8 (pt) método e aparelho para estimar parâmetro de interesse a partir de espectro de raios gama de amostras de referência
US20170191929A1 (en) Spectral modeling for complex absorption spectrum interpretation
WO2019178044A3 (en) Aldehyde detection and analysis using surface-enhanced raman spectroscopy
CN113324973A (zh) 一种结合光谱内标的多因素校正拉曼光谱定量分析方法
WO2018217466A3 (en) MEASURING RADICAL CONCENTRATIONS IN SEMICONDUCTOR PROCESSING
JP2017156332A5 (ja)
CN104458701A (zh) 拉曼光谱爆炸物识别仪自动校准方法
WO2017038701A8 (ja) 蛍光ｘ線分析装置
GB2554282A (en) Lock mass library for internal correction
EP2515097A3 (en) Spectrometric device
RU2017112093A (ru) Нормализация ответа флуориметра с использованием спектральной чувствительности
EP3770589A3 (en) Analyzer
Li et al. Chemometric approaches to low-content quantification (LCQ) in solid-state mixtures using Raman mapping spectroscopy
JP2014224812A (ja) 成分濃度計測装置と方法
CN108254400A (zh) X射线荧光光谱的预处理方法及装置
Mahani et al. A novel inductively coupled plasma atomic emission spectrometry method for uranium isotope ratio measurements using chemometric techniques
JP2018091744A5 (ja)
US8074487B2 (en) Method of calibrating an apparatus for measuring radon and/or its progeny in an air sample
KR20140059593A (ko) 플라스틱 두께 보정 방법

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 18767402

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2019506226

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 2018767402

Country of ref document: EP

Effective date: 20191015