[go: up one dir, main page]

WO2018146817A1 - Dispositif à vide - Google Patents

Dispositif à vide Download PDF

Info

Publication number
WO2018146817A1
WO2018146817A1 PCT/JP2017/005172 JP2017005172W WO2018146817A1 WO 2018146817 A1 WO2018146817 A1 WO 2018146817A1 JP 2017005172 W JP2017005172 W JP 2017005172W WO 2018146817 A1 WO2018146817 A1 WO 2018146817A1
Authority
WO
WIPO (PCT)
Prior art keywords
annular groove
lid
opening
wall surface
end surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2017/005172
Other languages
English (en)
Japanese (ja)
Inventor
敦史 庄司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sakai Display Products Corp
Original Assignee
Sakai Display Products Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sakai Display Products Corp filed Critical Sakai Display Products Corp
Priority to PCT/JP2017/005172 priority Critical patent/WO2018146817A1/fr
Publication of WO2018146817A1 publication Critical patent/WO2018146817A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges

Definitions

  • the present invention relates to a vacuum apparatus such as a CVD (Chemical Vapor Deposition) apparatus, a sputtering apparatus, and a dry etching apparatus.
  • a vacuum apparatus such as a CVD (Chemical Vapor Deposition) apparatus, a sputtering apparatus, and a dry etching apparatus.
  • the chamber of the sputtering apparatus includes a lid 1101 that opens and closes an opening (not shown) of the chamber body.
  • An annular groove 1103 in which the seal member 1102 is disposed is provided on an end surface of the lid body 1101 on the chamber body side (upper side in FIG. 11).
  • the radially inner wall surface 1103 a of the annular groove 1103 has a circular arc cross section and is in contact with the seal member 1102.
  • the radially outer wall surface 1103b of the annular groove 1103 is formed to have a linear cross section and is inclined with respect to the bottom surface 1103c of the annular groove 1103.
  • the end of the wall surface 1103b on the chamber main body side is located on the radially inner side of the end of the wall surface 1103b opposite to the chamber main body (the lower side in FIG. 11) and contacts the seal member 1102. is doing.
  • the end of the wall surface 1103b on the chamber main body side contacts the seal member 1102, but the end of the wall surface 1103b opposite to the chamber main body side (the lower side in FIG. 11) is the seal member 1102. Not touching.
  • a space may be formed between the end of the wall surface 1103b opposite to the chamber body and the seal member 1102, and particles may accumulate in the space.
  • the particles accumulated in the space may move inward in the radial direction when the chamber is evacuated, for example, when the chamber is evacuated, and may contaminate the chamber.
  • an object of the present invention is to provide a vacuum apparatus that can reduce the possibility that the inside of the chamber is contaminated with particles around the seal member.
  • a vacuum apparatus includes a chamber having an opening, a chamber having a lid that opens and closes the opening, an end surface of the opening on the lid, and the chamber body of the lid. And a sealing member that seals between the end surface on the side, and the sealing member is disposed on one of the end surface on the lid body side of the opening and the end surface on the chamber body side of the lid body.
  • An annular groove is provided, and the inner wall surface in the radial direction of the annular groove is formed so that the cross section has an elliptical arc shape, an arc shape, or a linear shape inclined with respect to the bottom surface of the annular groove,
  • the lid When the lid is closed, it contacts the sealing member, and the radially outer wall surface of the annular groove is the other side of the end surface of the opening on the lid side and the end surface of the lid on the chamber body side Is located between the end of the seal member It is formed so as to have a gap, and during closing the opening of the lid, is characterized in that no contact with the sealing member.
  • a vacuum apparatus includes a chamber having a chamber body having an opening, a lid that opens and closes the opening, an end surface of the opening on the lid side, and the chamber of the lid.
  • a seal member that seals between the end surface on the main body side, and the seal member is disposed on one of the end surface on the lid body side of the opening and the end surface on the chamber main body side of the lid body.
  • a first annular groove and a second annular groove located radially inward of the first annular groove, and an end surface of the opening on the lid body side and the lid body on the chamber body side are provided.
  • the other of the end faces is provided with an annular wall that is inserted into the second annular groove when the opening is covered with the lid.
  • the vacuum device of the present invention can reduce the possibility that the inside of the chamber is contaminated with particles around the seal member.
  • FIG. 1 is a schematic view of a plasma CVD apparatus according to the first embodiment of the present invention.
  • FIG. 2 is a schematic plan view of the process chamber main body of the first embodiment.
  • 3 is a schematic cross-sectional view taken along the line III-III in FIG.
  • FIG. 4 is a schematic cross-sectional view for explaining a state when the lid body of the first embodiment is closed.
  • FIG. 5 is a schematic cross-sectional view of an annular groove and its peripheral portion according to a modification of the first embodiment.
  • FIG. 6 is a schematic cross-sectional view of an annular groove and its peripheral portion according to a modification of the first embodiment.
  • FIG. 7 is a schematic cross-sectional view of an annular groove and its peripheral portion according to a modification of the first embodiment.
  • FIG. 1 is a schematic view of a plasma CVD apparatus according to the first embodiment of the present invention.
  • FIG. 2 is a schematic plan view of the process chamber main body of the first embodiment.
  • 3 is a schematic
  • FIG. 8 is a schematic perspective view of a lid of a plasma CVD apparatus according to the second embodiment of the present invention.
  • FIG. 9 is a schematic perspective view of a process chamber main body of the plasma CVD apparatus according to the second embodiment.
  • FIG. 10 is a schematic cross-sectional view for explaining a state when the lid of the second embodiment is closed.
  • FIG. 11 is a schematic cross-sectional view of a main part of a conventional sputtering apparatus.
  • FIG. 1 is a schematic diagram for illustrating a schematic configuration of a plasma CVD apparatus according to a first embodiment of the present invention.
  • the plasma CVD apparatus includes a process chamber 1 that accommodates a rectangular substrate 10 in plan view, a gas supply mechanism 2 that supplies a source gas into the process chamber 1, and an exhaust mechanism 3 that exhausts the gas in the process chamber 1. It has.
  • the substrate size of the rectangular substrate 10 in plan view is, for example, 2880 mm ⁇ 3130 mm.
  • the process chamber 1 is an example of a chamber.
  • the process chamber 1 includes a container-shaped process chamber main body 11 having an opening 11a and a container-shaped lid 12 that opens and closes the opening 11a. Further, the process chamber body 11 and the lid body 12 are each grounded and formed of a metal such as aluminum so as to exhibit a bottomed rectangular tube shape.
  • the process chamber body 11 is an example of a chamber body.
  • a lower electrode 5 and an upper electrode 6 are provided to form parallel plate electrodes.
  • the lower electrode 5 faces the upper electrode 6 and has a mounting surface on the upper side on which the substrate 10 is mounted. Similarly to the substrate 10, the lower electrode 5 is also formed in a rectangular shape in plan view. More specifically, since the entire lower surface of the substrate 10 is supported by the lower electrode 5, the planar view shape of the lower electrode 5 is larger than the planar view shape of the substrate 10.
  • the upper electrode 6 is supported by the backing plate 7 and faces the lower electrode 5.
  • the source gas from the gas supply mechanism 2 is diffused in the diffusion space between the backing plate 7 and the upper electrode 6 and then supplied into the process chamber 1 from a plurality of discharge ports (not shown) of the upper electrode 6.
  • the backing plate 7 is grounded via the matching circuit 3 and a high-frequency power source 4 connected in series to the matching circuit 3.
  • a dielectric 8 made of ceramics is filled between the backing plate 7 and the process chamber 1.
  • the exhaust mechanism 3 has a vacuum pump, a pressure adjustment valve, and the like in order to set the degree of vacuum in the process chamber 1 to a desired value.
  • the substrate 10 When performing plasma processing using such a plasma processing apparatus, first, the substrate 10 is loaded into the process chamber 1 from a loading / unloading port (not shown) and mounted on the mounting surface of the lower electrode 5. Then, the source gas is introduced into the process chamber 1 from the gas supply mechanism 2 through the upper electrode 6 while the gas in the process chamber 1 is exhausted by the exhaust mechanism 3. After controlling the pressure of the raw material gas introduced into the process chamber 1, the high frequency power supply 4 applies high frequency power to the backing plate 7 through the matching circuit 3 to generate plasma in the process chamber 1. The substrate 10 is subjected to plasma treatment with plasma.
  • FIG. 2 is a schematic view when the process chamber body 11 is viewed from above.
  • illustration of the O-ring 13 as an example of a sealing member is abbreviate
  • annular groove 14 in which the O-ring 13 is disposed is provided on the upper end surface 51 of the opening 11a of the process chamber body 11.
  • the annular groove 14 extends along the outer side surface and the inner side surface of the process chamber body 11 while maintaining a certain distance from the outer side surface and the inner side surface of the process chamber body 11.
  • the annular groove 14 is formed to have the same depth at each part of the bottom surface of the annular groove 14.
  • the O-ring 13 seals between the upper end surface 51 of the opening 11a of the process chamber body 11 and the lower end surface 52 (shown in FIG. 1) of the side portion 12a of the lid 12 when the lid 12 is closed.
  • FIG. 3 is a schematic diagram showing a cross section when viewed from line III-III in FIG.
  • the O-ring 13 is molded using an elastic material excellent in plasma resistance, heat resistance, chemical resistance, etc., for example, a fluorine-based rubber material, and can be elastically deformed.
  • the center O of the cross section of the O-ring 13 is positioned below the upper end of the annular groove 14 when the lid 12 is opened. In other words, the depth of the annular groove 14 is set so that the center O of the cross section of the O-ring 13 is located in the annular groove 14.
  • the annular groove 14 includes a radially inner wall surface 14a (hereinafter referred to as “inner wall surface 14a”), a radially outer wall surface 14b (hereinafter referred to as “outer wall surface 14b”), and a bottom surface 14c.
  • inner wall surface 14a a radially inner wall surface 14a
  • outer wall surface 14b a radially outer wall surface 14b
  • bottom surface 14c a bottom surface 14c.
  • the radially inner end of the bottom surface 14c is connected to the lower end of the inner wall surface 14a.
  • the radially outer end of the bottom surface 14c is connected to the lower end of the outer wall surface 14b.
  • the inner wall surface 14 a of the annular groove 14 is a curved surface that is recessed toward the inside of the process chamber 1. More specifically, the cross-sectional shape of the inner wall surface 14a of the annular groove 14 is an elliptical arc shape.
  • the inner wall surface 14a of the annular groove 14 is not in contact with the O-ring 13 when the lid body 12 is opened, but when the lid body 12 is closed, as shown in FIG. It is formed to contact.
  • the inner wall surface 14a of the annular groove 14 and its peripheral portion, and the outer wall surface 14b of the annular groove 14 and its peripheral portion are all made of a metal such as aluminum. That is, the inner wall surface 14a of the annular groove 14 and its peripheral part are formed of the same metal material as the metal material of the outer wall surface 14b of the annular groove 14 and its peripheral part.
  • the outer wall surface 14 b of the annular groove 14 is formed so that the cross section has a linear shape. More specifically, the outer wall surface 14b of the annular groove 14 is a surface perpendicular to the bottom surface 14c, for example.
  • the outer wall surface 14b of the annular groove 14 is formed to have a gap with the O-ring 13 when the lid 12 is opened and closed. That is, there is a gap between the outer wall surface 14 b of the annular groove 14 and the O-ring 13, whether or not the opening 11 a of the process chamber body 11 is closed by the lid 12.
  • the O-ring 13 is elastically deformed.
  • the clearance between the outer wall surface 14 b of the annular groove 14 and the O-ring 13 is not limited to that of the process chamber body 11. This is smaller than when the opening 11a is not closed by the lid 12.
  • the outer wall surface 14b of the annular groove 14 may be a surface substantially perpendicular to the bottom surface 14c, or may be a surface inclined by a predetermined angle with respect to a surface perpendicular to the bottom surface 14c.
  • the bottom surface 14 c of the annular groove 14 is formed so that the cross section is a linear shape, and is a surface perpendicular to the central axis of the process chamber body 11.
  • the bottom surface 14c of the annular groove 14 may be a surface that is substantially perpendicular to the central axis of the process chamber body 11, or is inclined at a predetermined angle with respect to a surface that is perpendicular to the central axis of the process chamber body 11. It may be the surface.
  • the outer wall surface 14b of the annular groove 14 when the lid 12 is opened, the outer wall surface 14b of the annular groove 14 is not in contact with the O-ring 13 as shown in FIG. That is, the outer wall surface 14 b of the annular groove 14 has a space between the upper end and the lower end 13 with the O-ring 13. Therefore, even if particles accumulate in the space between the lower end portion of the outer wall surface 14b of the annular groove 14 and the O-ring 13, between the upper end portion of the outer wall surface 14b of the annular groove 14 and the O-ring 13 during maintenance. Therefore, the particles can be easily removed. As a result, particles between the lower end portion of the outer wall surface 14 b of the annular groove 14 and the O-ring 13 can be prevented from flowing into the process chamber 1. Therefore, the possibility that the inside of the chamber is contaminated with particles around the O-ring 13 can be reduced.
  • the lid 12 when the lid 12 is opened, there is a space between the outer wall surface 14 b of the annular groove 14 and the O-ring 13. Thereby, when the lid 12 is closed, as shown in FIG. 4, a part of the elastically deformed O-ring 13 is positioned in the space. That is, due to the presence of the space, large deformation of the O-ring 13 is allowed. Therefore, the O-ring 13 can be greatly deformed to increase the contact area between the lower end surface 52 of the side portion 12 a of the lid 12 and the O-ring 13. As a result, the sealing performance between the lower end surface 52 of the side 12 a of the lid 12 and the O-ring 13 can be enhanced.
  • the left side of the O-ring 13 in FIG. 4 becomes the vacuum side, while the right side of the O-ring 13 in FIG. Become.
  • the space between the outer wall surface 14b of the annular groove 14 and the O-ring 13 is an open space, and the atmospheric pressure is atmospheric pressure.
  • the area of the O-ring 13 that receives atmospheric pressure increases, so that the O-ring 13 can be strongly pressed against the inner wall surface 14a of the annular groove 14. That is, the O-ring 13 can be firmly adhered to the inner wall surface 14 a of the annular groove 14. Therefore, the sealing performance between the inner wall surface 14a of the annular groove 14 and the O-ring 13 can be enhanced.
  • the opening 11a of the process chamber main body 11 is opened and closed by the container-shaped lid 12, but may be opened and closed by a plate-shaped lid, for example.
  • the annular groove 14 is provided on the upper end surface 51 of the opening 11 a of the process chamber body 11.
  • the annular groove 14 may be provided on the lower end surface 52 of the side 12 a of the lid 12. Good.
  • the upper end surface 51 of the opening 11a of the process chamber body 11 is made flat, and the O-ring 13 is inserted into the annular groove provided in the lower end surface 52 of the side 12a of the lid 12. You may arrange.
  • a configuration in which the configuration of the upper end surface 51 of the opening 11a of the process chamber body 11 and the configuration of the lower end surface 52 of the side 12a of the lid 12 are interchanged may be used as an embodiment of the present invention.
  • the inner wall surface 14a of the annular groove 14 and the peripheral portion thereof are formed of the same metal material as the outer wall surface 14b of the annular groove 14 and the peripheral portion thereof. You may form with the material different from the metal material of the wall surface 14b and its peripheral part.
  • the inner wall surface 24a of the annular groove 24 and its peripheral portion are made of resin such as silicon resin, while the outer wall surface 24b of the annular groove 24 and its The peripheral part is made of a metal such as aluminum.
  • the inner wall surface 24a of the annular groove 24 and its peripheral portion can be formed by retrofitting parts, so that the conventional general plasma CVD apparatus can be modified to the plasma CVD apparatus of one embodiment of the present invention at low cost.
  • the bottom surface 14c of the annular groove 14 is formed to have a linear cross section, but as shown in FIG. 6, the curved surface is the same as or similar to the inner wall surface 34a of the annular groove 34. It is good. More specifically, the bottom surface 34c of the annular groove 34 is a curved surface formed in the region A2.
  • the region A2 is a region located on the radially outer side than the contact region A1 that contacts the seal member 13 when the lid 12 is closed. This area A2 is deeper than the contact area A1. Thereby, since the particles accumulate on the area A2 outside the contact area A1, the particles can be separated from the O-ring 13. As a result, particles on the bottom surface 34c of the annular groove 34 are less likely to adhere to the O-ring 13, so that particle diffusion can be suppressed. Therefore, the burden at the time of maintenance can be reduced.
  • the inner wall surface 14a of the annular groove 14 formed so that the cross-sectional shape is an elliptical arc shape is used.
  • the cross-sectional shape is relative to the bottom surface 44c of the annular groove 44 as shown in FIG.
  • an inner wall surface 44a of the annular groove 44 formed to have a linear shape that is inclined may be used. In such a case, the groove width of the annular groove 44 is wider on the opening side than on the bottom side, as in the first embodiment.
  • annular groove 44 having a circular cross section may be used.
  • FIG. 8 is a schematic diagram when the lid 212 of the plasma CVD apparatus according to the second embodiment of the present invention is viewed obliquely from below.
  • the side portion 212 a and the annular wall 216 of the lid 212 are exaggerated and thickly shown for easy understanding of the structure.
  • the lid 212 constitutes the upper part of the process chamber 201, and differs from the lid 1 of the first embodiment only in that it has a square tubular annular wall 216 on the lower end surface. Yes.
  • the annular wall 216 is formed of a metal such as aluminum, for example, in the same manner as the portion other than the annular wall 216 of the lid 212, and is more radial than the center in the width direction of the lower end surface 252 of the side portion 212 a of the lid 212.
  • a backing plate, an upper electrode, a dielectric, and the like are provided in the lid 212 as in the first embodiment.
  • FIG. 9 is a schematic diagram showing a state when the process chamber main body 211 having the opening 211a opened and closed by the lid body 212 is viewed obliquely from above.
  • the opening 211a is exaggerated and thick for easy understanding of the structure.
  • illustration of the O-ring 13 as an example of a sealing member is omitted.
  • the process chamber body 211 is an example of a chamber body.
  • the process chamber main body 211 constitutes a lower part of the process chamber 201 and has an upper end surface 251 of an opening 211a.
  • a first annular groove 214 and a second annular groove 215 located radially inward of the first annular groove 214 are provided on the upper end surface 251 of the opening 211a.
  • the second annular groove 215 is an example of an inner annular groove.
  • the first and second annular grooves 214 and 215 respectively extend along the outer side surface and the inner side surface of the process chamber body 211 while maintaining a certain distance from the outer side surface and the inner side surface of the process chamber body 211. ing.
  • the first and second annular grooves 214 and 215 are formed so that the depths of the respective portions of the bottom surfaces 214c and 215c are the same.
  • FIG. 10 is a schematic cross-sectional view for explaining a state when the lid 212 is closed.
  • the O-ring 13 is molded using an elastic material excellent in plasma resistance, heat resistance, chemical resistance, etc., for example, a fluorine-based rubber material, and can be elastically deformed.
  • the O-ring 13 seals between the upper end surface 251 of the opening 211 a of the process chamber body 211 and the lower end surface 252 of the side portion 212 a of the lid 212 when the lid 212 is closed.
  • the center of the cross section of the O-ring 13 is located below the upper end of the first annular groove 214 when the lid 212 is opened. In other words, the depth of the first annular groove 214 is set so that the center of the cross section of the O-ring 13 is located in the first annular groove 214.
  • the first and second annular grooves 214 and 215 and their peripheral parts are made of the same metal material (for example, aluminum).
  • the first and second annular grooves 214 and 215 include radially inner wall surfaces 214a and 215a (hereinafter referred to as “inner wall surfaces 214a and 215a”) and radially outer wall surfaces 214b and 215b (hereinafter referred to as “ “Outer wall surfaces 214b and 215b”) and bottom surfaces 214c and 215c.
  • the inner wall surfaces 214a and 215a, the outer wall surfaces 214b and 215b, and the bottom surfaces 214c and 215c of the first and second annular grooves 214 and 215 are formed so as to have a linear cross section.
  • the inner wall surfaces 214 a and 215 a and the outer wall surfaces 214 b and 215 b of the first and second annular grooves 214 and 215 are parallel to the central axis of the process chamber body 211.
  • the bottom surface of the annular groove is a surface perpendicular to the central axis of the process chamber body 211.
  • the inner wall surfaces 214a and 215a and the outer wall surfaces 214b and 215b of the first and second annular grooves 214 and 215 may be substantially parallel to the central axis of the process chamber body 211, or the process chamber body.
  • a surface inclined by a predetermined angle with respect to a surface parallel to the central axis of 211 may be used.
  • the bottom surfaces 214c and 215c of the annular grooves 214 and 215 may be surfaces that are substantially perpendicular to the central axis of the process chamber main body 211, or may be surfaces that are perpendicular to the central axis of the process chamber main body 211.
  • the surface may be inclined at a predetermined angle.
  • the first and second annular grooves 214 and 215 are formed so that the depth of the second annular groove 215 is deeper than the depth of the first annular groove 214.
  • the depth of the second annular groove 215 is set to a depth that is twice or more the depth of the first annular groove 214.
  • the radially inner ends of the bottom surfaces 214c and 215c of the first and second annular grooves 214 and 215 are connected to the lower ends of the inner wall surfaces 214a and 215a.
  • the radially outer ends of the bottom surfaces 214c and 215c of the first and second annular grooves 214 and 215 are connected to the lower ends of the outer wall surfaces 214b and 215b.
  • the radial length of the bottom surface 214c is set to be longer than the axial lengths of the inner wall surface 214a and the outer wall surface 214b of the first annular groove 214. Further, the inner wall surface 214a and the outer wall surface 214b of the first annular groove 214 do not come into contact with the O-ring 13 when the lid 212 is opened and closed. The inner wall surface 214a and the outer wall surface 214b of the first annular groove 214 do not contact the O-ring 13 when the lid body 212 is opened, but may contact the O-ring 13 when the lid body 212 is closed. .
  • the length in the radial direction of the bottom surface 215c is set to be shorter than the length in the axial direction of the inner wall surface 215a and the outer wall surface 215b of the second annular groove 215. Further, most of the annular wall 216 is inserted into the second annular groove 215 when the lid 212 is closed. At this time, the annular wall 216 has a gap in the range of, for example, 0.1 mm to 0.3 mm between the inner wall surface 215a, the outer wall surface 215b, and the bottom surface 215c.
  • the annular wall 216 is inserted into the second annular groove 215 when the opening 211a of the process chamber body 211 is closed by the lid 212. Accordingly, even if particles around the O-ring 13 move toward the process chamber 201, the particles can be captured between the annular wall 216 and the second annular groove 215. As a result, the possibility that the inside of the process chamber 201 is contaminated with particles around the O-ring 13 can be reduced.
  • the depth of the second annular groove 215 is deeper than the depth of the first annular groove 214, there is a possibility that particles from the O-ring 13 side are trapped between the annular wall 216 and the second annular groove 215. Can be increased. That is, it becomes difficult for the particles on the O-ring 13 side to pass between the annular wall 216 and the second annular groove 215.
  • the first and second annular grooves 214 and 215 are provided on the upper end surface 251 of the opening 211 a of the process chamber body 211, but on the lower end surface 252 of the side portion 212 a of the lid 212. It may be provided. In this case, the annular wall 216 may be provided on the upper end surface 251 of the opening 211 a of the process chamber body 211.
  • the configuration of the upper end surface of the opening 211 a of the process chamber body 211 and the configuration of the lower end surface of the lid 211 may be interchanged.
  • the annular wall 216 may be formed integrally with the side portion 212a of the lid body 212, or after being molded separately from the side portion 212a of the lid body 212, the side portion of the lid body 212. It may be fixed to the lower end surface 52 of 212a.
  • the inner wall surfaces 34a, 44a of the annular grooves 34, 44 and their peripheral portions in FIGS. 6 and 7 are made of resin such as silicon resin, while the outer wall surfaces 34b, 44b of the annular grooves 34, 44 are
  • the peripheral portion may be made of a metal such as aluminum.
  • the second annular groove 215 of the second embodiment may be provided on the radially inner side of the annular grooves 14, 24, 34, 44 of the first embodiment and its modifications.
  • the annular wall 216 of the second embodiment inserted into the second annular groove 215 may be provided on the upper end surface 51 of the opening 11 a of the process chamber body 11.
  • the depth of the second annular groove 215 may be deeper than the depth of the annular grooves 14, 24, 34, 44.
  • first annular groove 214 of the second embodiment may be modified as the annular grooves 14, 24, 34, 44 of the first embodiment and its modifications.
  • first annular groove 214 is deformed in this way, the high sealing performance described in the first embodiment can be obtained also in the first annular groove 214 after deformation.
  • a vacuum apparatus is A chamber having a chamber body having an opening, and a lid for opening and closing the opening; A seal member that seals between the end surface of the opening on the lid body side and the end surface of the lid on the chamber body side;
  • An annular groove in which the seal member is disposed is provided in one of the end surface on the lid body side of the opening and the end surface on the chamber body side of the lid body,
  • the wall surface on the radially inner side of the annular groove is formed so that the cross section has an elliptical arc shape, an arc shape, or a linear shape inclined with respect to the bottom surface of the annular groove, and contacts the seal member
  • the wall surface on the radially outer side of the annular groove is formed such that an end portion located on the other side of the end surface on the lid body side of the opening and the end surface on the chamber body side of the lid body is between the seal member and the seal member. It is characterized by not having contact with the sealing member.
  • the radially outer wall surface of the annular groove is formed such that the other end has a gap between the seal member and does not contact the seal member.
  • the space between the radially outer wall surface of the annular groove and the seal member is an open space. Therefore, when particles accumulate in the space between the radially outer wall surface of the annular groove and the seal member, the particles can be easily cleaned and removed during maintenance. As a result, the possibility that the inside of the chamber is contaminated with particles around the seal member can be reduced.
  • the radially outer wall surface of the annular groove is formed as described above, the amount of deformation of the seal member increases when the opening of the chamber body is closed with a lid.
  • the contact area of the other of the end surface by the side of the cover body of the opening part and the end surface by the side of the chamber body of a cover body can be increased. . Therefore, the sealing performance between the other and the sealing member can be enhanced.
  • the radially inner wall surface of the annular groove is located on the vacuum side.
  • the radially outer wall surface of the annular groove is located on the atmosphere side.
  • the wall surface on the radially inner side of the annular groove and its peripheral part are formed of a material different from the wall surface on the radially outer side of the annular groove and its peripheral part.
  • the material of the radially inner wall surface and its peripheral portion of the annular groove and the material of the radially outer wall surface and its peripheral portion of the annular groove are different from each other.
  • the wall on the inner side in the direction and its peripheral part can be used as retrofitting parts.
  • the annular groove has a region deeper than the contact region on a radially outer side than a contact region that contacts the seal member.
  • the particles can be separated from the seal member by collecting particles on a region deeper than the contact region outside the contact region in the radial direction. As a result, the particles are less likely to adhere to the seal member, so that particle diffusion can be suppressed. Therefore, the burden at the time of maintenance can be reduced.
  • the one of the end surface on the lid body side of the opening and the end surface on the chamber body side of the lid body is provided with an inner annular groove positioned radially inward of the annular groove,
  • an annular wall inserted into the inner annular groove when the opening is covered with the lid. Is provided.
  • the annular wall is inserted into the inner annular groove located radially inward of the annular groove.
  • the inner annular groove is deeper than the annular groove.
  • the depth of the inner annular groove is deeper than the depth of the annular groove located on the radially outer side of the inner annular groove, the particles pass between the annular wall and the inner annular groove. It becomes difficult to advance into the chamber.
  • a vacuum apparatus is A chamber having a chamber body having an opening, and a lid for opening and closing the opening; A seal member that seals between the end surface of the opening on the lid body side and the end surface of the lid on the chamber body side; A first annular groove in which the seal member is disposed on one of the end surface on the lid side of the opening and the end surface on the chamber body side of the lid, and a radial direction relative to the first annular groove A second annular groove located on the inner side, An annular wall that is inserted into the second annular groove when the opening is covered with the other of the end face on the lid side of the opening and the end face on the chamber body side of the lid. It is characterized by being provided.
  • the annular wall is inserted into the second annular groove located radially inward of the first annular groove. Therefore, even if the particles around the seal member move toward the chamber, the particles can be captured between the annular wall and the second annular groove. Therefore, it is possible to reduce the possibility that the inside of the chamber is contaminated with particles around the seal member.
  • the depth of the second annular groove is deeper than the depth of the first annular groove.
  • the depth of the second annular groove is deeper than the depth of the first annular groove, it is difficult for particles to pass between the annular wall and the second annular groove and enter the chamber.
  • the radially inner wall surface of the first annular groove is formed to have an elliptical arc shape, an arc shape, or a linear shape inclined with respect to the bottom surface of the annular groove, and when the lid is closed, Contacting the sealing member,
  • the wall surface on the radially outer side of the first annular groove has an end located on the other side of the end surface on the lid body side of the opening and the end surface on the chamber body side of the lid body, and the seal member. Is formed so as to have a gap therebetween, and does not contact the sealing member when the lid is opened and closed.
  • the radially outer wall surface of the first annular groove is formed such that the other end has a gap between the seal member and does not contact the seal member.
  • the space between the radially outer wall surface of the first annular groove and the seal member is an open space. Therefore, when particles accumulate in the space between the radially outer wall surface of the first annular groove and the seal member, the particles can be easily cleaned and removed during maintenance. As a result, the possibility that the inside of the chamber is contaminated with particles around the seal member can be further reduced.
  • the radially outer wall surface of the first annular groove is formed as described above, when the opening of the chamber body is closed with the lid, the deformation amount of the seal member increases. Thereby, when the opening part of the said chamber main body is closed with a cover body, the contact area of the other of the end surface by the side of the cover body of the opening part and the end surface by the side of the chamber body of a cover body can be increased. . Therefore, the sealing performance between the other and the sealing member can be enhanced.
  • the radially inner wall surface of the first annular groove is located on the vacuum side.
  • the radially outer wall surface of the first annular groove is located on the atmosphere side.
  • the radially inner wall surface and its peripheral portion of the first annular groove are formed of a material different from the radially outer wall surface and its peripheral portion of the first annular groove.
  • the radially inner wall surface of the first annular groove and the peripheral material thereof are different from the radially outer wall surface of the first annular groove and the peripheral material thereof.
  • the wall surface on the radially inner side of the first annular groove and its peripheral portion can be used as a retrofit component.
  • the first annular groove has a region deeper than the contact region on a radially outer side than a contact region that contacts the seal member.
  • the particles can be separated from the seal member by collecting particles on a region deeper than the contact region outside the contact region in the radial direction. As a result, the particles are less likely to adhere to the seal member, so that particle diffusion can be suppressed. Therefore, the burden at the time of maintenance can be reduced.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Dans la présente invention, un corps de chambre comporte une ouverture (11a). Un corps de couvercle ouvre et ferme l'ouverture (11a). Une rainure annulaire (14), dans laquelle est disposé un élément d'étanchéité (13), est disposée une face d'extrémité côté corps de couvercle de l'ouverture (11a) ou une face d'extrémité côté corps de chambre du corps de couvercle. Une surface de paroi (14a) sur le côté interne dans la direction radiale de la rainure annulaire (14) est formée de telle sorte qu'une section transversale de cette dernière présente une forme d'arc elliptique, une forme d'arc circulaire, ou une forme linéaire inclinée par rapport à une surface inférieure de la rainure annulaire (14), et elle est en contact avec l'élément d'étanchéité (13). Une surface de paroi (14b) sur le côté externe dans la direction radiale de la rainure annulaire (14) est formée de manière à comporter un espace entre l'élément d'étanchéité (13) et une partie d'extrémité située sur l'autre côté de la face d'extrémité côté corps de couvercle de l'ouverture (11a) et la face d'extrémité côté corps de chambre du corps de couvercle, et elle n'est pas en contact avec l'élément d'étanchéité (13).
PCT/JP2017/005172 2017-02-13 2017-02-13 Dispositif à vide Ceased WO2018146817A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2017/005172 WO2018146817A1 (fr) 2017-02-13 2017-02-13 Dispositif à vide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2017/005172 WO2018146817A1 (fr) 2017-02-13 2017-02-13 Dispositif à vide

Publications (1)

Publication Number Publication Date
WO2018146817A1 true WO2018146817A1 (fr) 2018-08-16

Family

ID=63107296

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2017/005172 Ceased WO2018146817A1 (fr) 2017-02-13 2017-02-13 Dispositif à vide

Country Status (1)

Country Link
WO (1) WO2018146817A1 (fr)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60118063U (ja) * 1984-01-19 1985-08-09 三菱電機株式会社 真空フランジ
WO2004038781A1 (fr) * 2002-10-25 2004-05-06 Nok Corporation Joint d'etancheite resistant au plasma
JP2005298893A (ja) * 2004-04-12 2005-10-27 Sony Corp Ｏリング取り外し用窪み構造を有する容器部材
WO2007088593A1 (fr) * 2006-01-31 2007-08-09 Shi Mechanical & Equipment Inc. Structure d'étanchéité de récipient sous pression
WO2009113417A1 (fr) * 2008-03-13 2009-09-17 日本バルカー工業株式会社 Joint
JP2010060107A (ja) * 2008-09-05 2010-03-18 Nippon Valqua Ind Ltd 複合シール部材

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60118063U (ja) * 1984-01-19 1985-08-09 三菱電機株式会社 真空フランジ
WO2004038781A1 (fr) * 2002-10-25 2004-05-06 Nok Corporation Joint d'etancheite resistant au plasma
JP2005298893A (ja) * 2004-04-12 2005-10-27 Sony Corp Ｏリング取り外し用窪み構造を有する容器部材
WO2007088593A1 (fr) * 2006-01-31 2007-08-09 Shi Mechanical & Equipment Inc. Structure d'étanchéité de récipient sous pression
WO2009113417A1 (fr) * 2008-03-13 2009-09-17 日本バルカー工業株式会社 Joint
JP2010060107A (ja) * 2008-09-05 2010-03-18 Nippon Valqua Ind Ltd 複合シール部材

Similar Documents

Publication Publication Date Title
US11430640B2 (en) Substrate processing apparatus
US11443926B2 (en) Substrate processing apparatus
CN110998783B (zh) 具有双嵌入式电极的基板支撑件
KR100793553B1 (ko) 밀봉 부품 및 기판 처리 장치
JP5308679B2 (ja) シール機構、シール溝、シール部材及び基板処理装置
JP5227197B2 (ja) フォーカスリング及びプラズマ処理装置
US9550194B2 (en) Gas shower structure and substrate processing apparatus
JP2009290087A (ja) フォーカスリング及びプラズマ処理装置
US10801521B2 (en) Heating device and turbo molecular pump
KR101061657B1 (ko) 플라즈마 처리 장치 및 방법과 플라즈마 처리 장치의 배플판
KR101541817B1 (ko) 공정설비에서 발생되는 배기가스 처리 플라즈마 반응기
KR20100031679A (ko) 진공 처리 장치
KR102400862B1 (ko) 배기 파이프 디바이스
CN114107951B (zh) 排气管装置
WO2020116246A1 (fr) Plaque de douche, appareil de traitement par plasma et procédé de traitement par plasma
US9741540B2 (en) Method for surface treatment of upper electrode, plasma processing apparatus and upper electrode
WO2018146817A1 (fr) Dispositif à vide
US20230160063A1 (en) Exhaust pipe apparatus
US20180019104A1 (en) Substrate processing chamber component assembly with plasma resistant seal
JP6566686B2 (ja) 容器に成膜する装置
JP2023530081A (ja) 高周波接地システム及び方法
US8092750B2 (en) Plasma system
JP2008192802A (ja) 半導体製造装置およびその製造方法
US20120145724A1 (en) Vacuum container
JPH05315261A (ja) 半導体製造装置

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17895822

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17895822

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: JP