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WO2018143628A1 - Dispersion de points quantiques, composition de résine photosensible de type à auto-émission, filtre coloré et dispositif d'affichage d'image - Google Patents

Dispersion de points quantiques, composition de résine photosensible de type à auto-émission, filtre coloré et dispositif d'affichage d'image Download PDF

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Publication number
WO2018143628A1
WO2018143628A1 PCT/KR2018/001234 KR2018001234W WO2018143628A1 WO 2018143628 A1 WO2018143628 A1 WO 2018143628A1 KR 2018001234 W KR2018001234 W KR 2018001234W WO 2018143628 A1 WO2018143628 A1 WO 2018143628A1
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WO
WIPO (PCT)
Prior art keywords
ester
acid
tetrahydro
ethyl ester
pyran
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
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PCT/KR2018/001234
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English (en)
Korean (ko)
Inventor
김형주
김주호
왕현정
정성욱
이종수
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Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
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Publication date
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Priority to JP2019540631A priority Critical patent/JP7072579B2/ja
Priority to CN201880009840.0A priority patent/CN110300791B/zh
Publication of WO2018143628A1 publication Critical patent/WO2018143628A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Definitions

  • the present invention relates to a quantum dot dispersion, a self-luminous photosensitive resin composition, a color filter, and an image display device, and more particularly, to a quantum dot dispersion liquid, a self-luminous photosensitive resin composition, and a color filter without using a solvent harmful to a human body. And an image display apparatus.
  • a color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and functions as a fine pixel unit.
  • the size of one pixel is about tens to hundreds of micrometers.
  • Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
  • Korean Patent Laid-Open Publication No. 2006-0084668 relates to a quantum dot phosphor, and discloses a light emitting diode which maintains excellent light emission efficiency by including a quantum dot and a solid carrier supporting the quantum dot.
  • the patent uses a solvent harmful to the human body such as chloroform, toluene, hexane and the like excellent in dispersibility as a dispersing solvent for dispersing the quantum dot phosphor.
  • Solvents described above are highly volatile compounds (Volatile Organic Compound) or carcinogenic, neurotoxic, and may cause reproductive dysfunction, requiring strict control of the handling environment of the operator.
  • quantum dots it is not a highly volatile compound after removing the solvent harmful to the human body through drying or dispersing solvent, it is not carcinogenic, neurotoxic, and there is no risk or low risk of reproductive dysfunction. Subsequent to the process of substituting for a solvent, a phenomenon in which quantum efficiency is lowered in this process occurs, which causes a problem in that light emission characteristics of a manufactured color filter or an image display device are deteriorated.
  • One object of the present invention is to provide a quantum dot dispersion having excellent dispersibility without using a solvent harmful to the human body.
  • Another object of the present invention is to provide a self-luminous photosensitive resin composition comprising the quantum dot dispersion.
  • Still another object of the present invention is to provide a color filter formed using the self-luminous photosensitive resin composition.
  • the present invention is a quantum dot dispersion containing a quantum dot and a solvent
  • the solvent is C 3 -C 10 cycloalkyl group, C 2 -C 10 heterocycloalkyl group, C 5 -C 10 aromatic group and C 4-
  • a quantum dot dispersion comprising a compound having an ester bond with at least one member selected from the group consisting of C 10 heteroaromatic groups.
  • the solvent may include one or more selected from a compound represented by the following formula (1) and a compound represented by the following formula (2).
  • A is a C 3 -C 10 cycloalkyl group, C 2 -C 10 heterocycloalkyl group, C 5- , which is unsubstituted or substituted with one or more substituents selected from the group consisting of C 1 -C 10 alkyl groups and halogen.
  • L is a C 1 -C 6 alkylene group or absent
  • R is an alkyl group of C 1 -C 10 or an alkenyl group of C 2 -C 10 .
  • the solvent may have a dielectric constant of less than 12.0 at 20 °C.
  • this invention provides the self-luminous photosensitive resin composition containing the said quantum dot dispersion liquid, alkali-soluble resin, a photopolymerizable compound, and a photoinitiator.
  • this invention provides the color filter formed using the said self-luminous photosensitive resin composition.
  • the present invention provides an image display device characterized in that the color filter is provided.
  • the quantum dot dispersion according to the present invention is excellent in dispersibility without using a solvent harmful to the human body, and the color filter formed using the self-luminous photosensitive resin composition including the same may exhibit excellent light emission characteristics.
  • One embodiment of the present invention is a quantum dot dispersion containing a quantum dot and a solvent, wherein the solvent is a C 3 -C 10 cycloalkyl group, C 2 -C 10 heterocycloalkyl group, C 5 -C 10 aromatic group and C 4 It relates to a quantum dot dispersion comprising a compound having an ester bond with at least one member selected from the group consisting of -C 10 heteroaromatic groups.
  • the quantum dots may refer to a nano-sized semiconductor material. Atoms form molecules, and molecules form clusters of small molecules called clusters that form nanoparticles, which are called quantum dots when they are semiconducting. When the quantum dots reach the excited state from the outside, the quantum dots emit energy according to their corresponding energy bandgap.
  • the color filter made of the self-luminous photosensitive resin composition including the quantum dot dispersion liquid may emit light (light luminescence) by light irradiation by including the quantum dot.
  • a typical image display apparatus including a color filter
  • white light is transmitted through the color filter to implement color.
  • a part of the light is absorbed by the color filter, thereby degrading light efficiency.
  • the color filter made of the self-luminous photosensitive resin composition according to the present invention since the color filter is self-luminous by the light of the light source, it is possible to implement more excellent light efficiency, and also emit light with color Since the color reproducibility is excellent, and the light is emitted in all directions by the photoluminescence, the viewing angle is also improved.
  • the quantum dot is not particularly limited as long as it is a quantum dot particle capable of emitting light by stimulation caused by light.
  • the II-VI semiconductor compound may be selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe And an elemental compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnS, H
  • the group III-V semiconductor compound may be selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; Three-element compounds selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb and mixtures thereof; And an elemental compound selected from the group consisting of GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, In
  • the Group IV-VI semiconductor compound may be selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; A three-element compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; And SnPbSSe, SnPbSeTe, SnPbSTe, and one or more selected from the group consisting of an elemental compound selected from the group consisting of mixtures thereof, but are not limited thereto.
  • the group IV element or a compound including the same may be selected from the group consisting of Si, Ge, and mixtures thereof; And a binary element compound selected from the group consisting of SiC, SiGe, and mixtures thereof.
  • the quantum dots are homogeneous single structures; Dual structures such as core-shell, gradient structures, and the like; Or a mixed structure thereof.
  • the material constituting each core and shell may be made of the above-mentioned different semiconductor compounds.
  • the core may include one or more materials selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto.
  • the shell may include one or more materials selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.
  • the quantum dots may be synthesized by a wet chemical process, a metal organic chemical vapor deposition (MOCVD), or a molecular beam epitaxy (MBE), but is not limited thereto. no.
  • MOCVD metal organic chemical vapor deposition
  • MBE molecular beam epitaxy
  • the wet chemical process is a method of growing a particle by adding a precursor material to an organic solvent.
  • the organic solvent naturally coordinates the surface of the quantum dot crystal and acts as a dispersant to control the growth of the crystal. Therefore, the nano solvent is easier and cheaper than the vapor deposition method such as the organometallic chemical vapor deposition process or molecular beam epitaxy. Since the growth of the particles can be controlled, it is desirable to produce the quantum dots using the wet chemical process.
  • the quantum dots may further include an organic ligand.
  • the organic ligand may be bound to the surface of the quantum dots to serve to stabilize the quantum dots.
  • the organic ligand is not limited in the present invention, for example, C5 to C20 alkyl carboxylic acid, alkenyl carboxylic acid or alkynyl carboxylic acid; Thiol, phosphoric acid, pyridine, mercapto alcohol, phosphine, phosphine oxide, and the like, and in terms of effectively protecting the surface of the quantum dot to improve stability, C5 to C20 alkyl carboxylic acid, alkenyl Carboxylic acid or alkynyl carboxylic acid; It is preferable to include one or more selected from the group consisting of thiol and phosphoric acid.
  • the organic ligand may cover 5% or more of the surface of the total area of the quantum dots.
  • the content of the organic ligand may be 0.1 to 10 moles with respect to 1 mole of the quantum dot.
  • the quantum dot may be included in an amount of 5 to 70 wt%, preferably 10 to 65 wt%, more preferably 15 to 60 wt%, based on 100 wt% of the total quantum dot dispersion.
  • the quantum dot is included in the above range, it is possible to provide a self-luminous photosensitive resin composition having excellent photosensitivity.
  • the solvent is an aromatic heterocyclic group the group consisting of C 3 -C 10 cycloalkyl group, C 2 -C 10 heterocycloalkyl group, C 5 -C 10 aromatic group, and a C 4 -C 10 of the It includes a compound having an ester bond with at least one member selected from.
  • the solvent may include at least one selected from a compound represented by Formula 1 and a compound represented by Formula 2.
  • A is a C 3 -C 10 cycloalkyl group, C 2 -C 10 heterocycloalkyl group, C 5- , which is unsubstituted or substituted with one or more substituents selected from the group consisting of C 1 -C 10 alkyl groups and halogen.
  • L is a C 1 -C 6 alkylene group or absent
  • R is an alkyl group of C 1 -C 10 or an alkenyl group of C 2 -C 10 .
  • an alkyl group of C 1 -C 10 refers to a straight or branched monovalent hydrocarbon having 1 to 10 carbon atoms, for example methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl And the like, but are not limited thereto.
  • a C 3 -C 10 cycloalkyl group means a simple or fused cyclic hydrocarbon composed of 3 to 10 carbon atoms, including but not limited to cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, and the like. It doesn't happen.
  • a C 2 -C 10 heterocycloalkyl group means a functional group in which one or more of the ring carbons of a simple or fused cyclic hydrocarbon composed of 3 to 10 carbon atoms is replaced with oxygen, sulfur or nitrogen, for example Tetrahydrofuranyl, tetrahydropyranyl, thiazolidinyl, oxiranyl, and the like, but is not limited thereto.
  • an aromatic group of C 5 -C 10 refers to a simple or fused cyclic aromatic hydrocarbon of 5 to 10 members, for example phenyl, naphthyl, cyclopentadienyl, tetrahydronaphthyl And the like, but are not limited thereto.
  • a C 4 -C 10 heteroaromatic group means a functional group in which one or more of the ring carbons of a 5- to 10-membered simple or fused cyclic aromatic hydrocarbon is substituted with oxygen, sulfur or nitrogen, for example Pyridinyl, furanyl, thiophenyl, indolyl, quinolinyl, imidazolinyl, oxazolyl, thiazolyl And the like, but are not limited thereto.
  • an alkylene group of C 1 -C 6 refers to a straight or branched divalent hydrocarbon having 1 to 6 carbon atoms, and includes, for example, methylene, ethylene, propylene, butylene, pentylene, and the like. However, it is not limited thereto.
  • Alkenyl group of C 2 -C 10 as used herein means a straight or branched unsaturated hydrocarbon composed of 2 to 10 carbon atoms having one or more carbon-carbon double bonds, for example ethyleneyl, propenyl, moiety. Tenyls, pentenyls, allyls, and the like.
  • A is cyclopentyl, cyclohexyl, tetrahydrofuranyl, tetrahydropyranyl, phenyl, cyclopentadienyl or furanyl, substituted or unsubstituted with halogen
  • L is C 1- It may or may not be an alkylene group of C 6
  • R may be an alkyl group of C 1 -C 10 or an alkenyl group of C 2 -C 10 .
  • Examples of the compound represented by Formula 1 include phenyl-acetic acid ethyl ester, 3-phenyl-propionic acid methyl ester, 3-phenyl-propionic acid ethyl ester, 4-phenyl-butyric acid ethyl ester, 5-phenyl-pentanoic acid ethyl ester, 6- Phenyl-hexanoic acid ethyl ester, 4-phenyl-butyric acid propyl ester, 4- (4-chloro-phenyl) -butyric acid ethyl ester, 4- (3,4-dichloro-phenyl) -butyric acid ethyl ester, 3-cyclopenta- 1,3-dienyl-propionic acid methyl ester, 4-cyclopenta-1,3-dienyl-butyric acid ethyl ester, 5-cyclopenta-1,3-dienyl-pentanoic acid ethyl
  • Examples of the compound represented by Formula 2 include acetic acid benzyl ester, propionic acid phenethyl ester, propionic acid 3-phenyl-propyl ester, propionic acid 4-phenyl-butyl ester, butyric acid phenethyl ester, propionic acid 2- (4-chloro-phenyl)- Ethyl ester, propionic acid 2- (3,4-dichloro-phenyl) -ethyl ester, acetic acid cyclopenta-1,3-dienylmethyl ester, propionic acid 2-cyclopenta-1,3-dienyl-ethyl ester, propionic acid 3 -Cyclopenta-1,3-dienyl-propyl ester, propionic acid 4-cyclopenta-1,3-dienyl-butyl ester, butyric acid 2-cyclopenta-1,3-dienyl-ethyl ester, furan-2 a
  • the said solvent can be used individually or in mixture of 2 or more types, respectively.
  • the solvent may have a dielectric constant of less than 12.0, preferably less than 10 and even more preferably less than 6 at 20 ° C.
  • the solvent may have a dielectric constant of 2.0 to 5.5 at 20 ° C.
  • the dielectric constant of the solvent is less than 12.0, quantum dot aggregation does not occur during quantum dot dispersion and uniform dispersion is possible, and the light emission efficiency of the quantum dot dispersion may be excellent.
  • the content of the solvent may be 5 to 95% by weight, preferably 20 to 90% by weight, and more preferably 30 to 80% by weight based on 100% by weight of the total quantum dot dispersion.
  • the solvent is included in less than 5% by weight may cause a problem that the dispersibility is deteriorated, when it exceeds 95% by weight may be a problem that it is difficult to control the solid content of the resin composition.
  • the quantum dot dispersion may further comprise a dispersant.
  • the dispersant may be used to suppress the deagglomeration effect of the quantum dots and precipitation phenomenon due to the polarity difference when used in the self-luminous photosensitive resin composition, and to impart a protective layer role of the quantum dots in the color filter manufacturing process.
  • a phosphate ester dispersant, a urethane dispersant, an acrylic dispersant, or the like may be used as the resin type dispersant.
  • commercially available products of the dispersant include the brand names of BIC Chem Corporation: DISPER BYK-103, DISPER BYK-110, DISPER BYK-111, DISPER BYK-2000, DISPER BYK-2001, DISPER BYK-2070, DISPER BYK-2150, DISPER BYK-160, DISPER BYK-161, DISPER BYK-162, DISPER BYK-163, DISPER BYK-164, DISPER BYK-166 can be used.
  • the dispersant may be included in an amount of 1 to 300 parts by weight, preferably 3 to 250 parts by weight, and more preferably 5 to 200 parts by weight, based on 100 parts by weight of the total solids of the quantum dot dispersion.
  • the dispersant is included in the above range, the deagglomeration effect of the quantum dot is excellent, the precipitation phenomenon due to the polarity difference in the quantum dot dispersion liquid and the self-luminous photosensitive resin composition including the same according to the present invention is possible, the color filter manufacturing process It is preferable because it can act as a protective layer of the quantum dots.
  • the dispersant When the dispersant is included in the range below the deagglomeration effect of the quantum dot may be slightly reduced, and when included in the above range, the development characteristics of the self-luminous photosensitive resin composition including the quantum dot dispersion may be slightly lowered, It is preferable to be included in the said range.
  • One Embodiment of this invention relates to the self-luminous photosensitive resin composition containing a quantum dot dispersion liquid (A), alkali-soluble resin (B), a photopolymerizable compound (C), and a photoinitiator (D).
  • A quantum dot dispersion liquid
  • B alkali-soluble resin
  • C photopolymerizable compound
  • D photoinitiator
  • the quantum dot dispersion (A) uses the quantum dot dispersion described above.
  • the content of the quantum dot dispersion may be 3 to 80% by weight, preferably 5 to 70% by weight, and more preferably 10 to 60% by weight based on 100% by weight of the total self-luminous photosensitive resin composition.
  • the quantum dot dispersion is included in the above range, it is possible to manufacture a color filter having excellent light emission characteristics.
  • the quantum dot dispersion is included in less than the above range, the light emission characteristics may be slightly lowered.
  • the quantum dot dispersion is included in the above range, the formation of a pattern may be somewhat difficult as the content of other components is reduced. Since reliability may be degraded, it is preferable to be included in the above range.
  • Alkali-soluble resin (B) may play a role of making the non-exposed part of the color filter made of the self-luminous photosensitive resin composition alkali-soluble to be removed and leaving the exposure area.
  • the quantum dots may be evenly dispersed in the composition, and may serve to maintain the brightness by protecting the quantum dots during the process.
  • the alkali-soluble resin may be selected and used having an acid value of 10 to 200 (KOHmg / g).
  • the "acid value” is a value measured as the amount of potassium hydroxide (mg) required to neutralize 1 g of the polymer and is involved in solubility.
  • the acid value of the alkali-soluble resin is less than the above range, it may be difficult to secure a sufficient developing speed, when the acid value of the alkali-soluble resin is exceeded, the adhesion to the substrate is reduced, the short circuit of the pattern is likely to occur, the storage stability of the entire composition is lowered viscosity The problem may arise.
  • the alkali-soluble resin may consider the limitation of the molecular weight and the molecular weight distribution (Mw / Mn) in order to improve the surface hardness for use as a color filter.
  • Mw / Mn molecular weight distribution
  • the weight average molecular weight is 3,000 to 30,000, preferably 5,000 to 20,000
  • the molecular weight distribution can be directly polymerized or purchased to have a range of 1.5 to 6.0, preferably 1.8 to 4.0.
  • Alkali-soluble resins having a molecular weight and a molecular weight distribution in the above range can be improved in hardness, and excellent solubility of the non-exposed portion in the developer as well as high residual film ratio can improve resolution.
  • the alkali-soluble resin may be a polymer of a carboxyl group-containing unsaturated monomer, or a copolymer with a monomer having an unsaturated bond copolymerizable therewith, or a combination thereof.
  • the carboxyl group-containing unsaturated monomer may be unsaturated monocarboxylic acid, unsaturated dicarboxylic acid, unsaturated tricarboxylic acid, and the like.
  • unsaturated monocarboxylic acid acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example.
  • unsaturated dicarboxylic acid maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example.
  • the unsaturated dicarboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride.
  • the unsaturated dicarboxylic acid may be mono (2- (meth) acryloyloxyalkyl) ester thereof, for example, succinic mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxy Ethyl), mono (2-acryloyloxyethyl) phthalate, mono (2-methacryloyloxyethyl) phthalate, and the like.
  • the unsaturated dicarboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate.
  • carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively.
  • the monomer copolymerizable with the carboxyl group-containing unsaturated monomer may include an aromatic vinyl compound, an unsaturated carboxylic acid ester compound, an unsaturated carboxylic acid aminoalkyl ester compound, an unsaturated carboxylic acid glycidyl ester compound, a carboxylic acid vinyl ester compound, an unsaturated ether compound, a vinyl cyanide compound, and an unsaturated monomer.
  • It can be selected from the group consisting of an amide compound, an unsaturated imide compound, an aliphatic conjugated diene compound, a macromonomer having a monoacryloyl group or a monomethacryloyl group at the terminal of the molecular chain, a bulky monomer, and a combination thereof.
  • the copolymerizable monomer may be styrene, ⁇ -methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p- Methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl Aromatic vinyl compounds such as ether and indene; Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl g
  • Macromonomers having; Bulky monomers, such as a monomer having a norbornyl skeleton, a monomer having an adamantane skeleton, and a monomer having a rosin skeleton, which can lower the dielectric constant, can be used.
  • the alkali-soluble resin may be included in 5 to 80% by weight, specifically 10 to 70% by weight, more specifically 15 to 60% by weight based on 100% by weight of the total solids of the self-luminous photosensitive resin composition.
  • the solubility in the developing solution is sufficient, so that pattern formation is easy, and the film reduction of the pixel portion of the exposed portion is prevented at the time of development, so that the dropping of the non-pixel portion is good, which is preferable.
  • the alkali-soluble resin is included in less than the above range, the non-pixel portion may be somewhat missing, and when the alkali-soluble resin is included in more than the above range, the solubility in the developing solution is slightly lowered may be somewhat difficult to form a pattern.
  • the photopolymerizable compound (C) is a compound that can be polymerized by the action of light and a photopolymerization initiator to be described later. Examples thereof include a monofunctional monomer, a bifunctional monomer, and other polyfunctional monomers. .
  • the kind of the monofunctional monomer is not particularly limited, and for example, nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethyl acryl
  • the rate, N-vinylpyrrolidone, etc. are mentioned.
  • the kind of the said bifunctional monomer is not specifically limited, For example, 1, 6- hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and triethylene Glycol di (meth) acrylate, bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, and the like.
  • the kind of the polyfunctional monomer is not particularly limited, and examples thereof include trimethylolpropane tri (meth) acrylate, ethoxylated trimethylol propane tri (meth) acrylate, and propoxylated trimethylolpropane tree (meth).
  • the photopolymerizable compound may be included in an amount of 5 to 70 wt%, specifically 10 to 60 wt%, and more specifically 15 to 50 wt%, based on 100 wt% of the total solids of the self-luminous photosensitive resin composition.
  • the photopolymerizable compound is included in the above range, there is a preferable advantage in terms of intensity or smoothness of the pixel portion.
  • the intensity of the pixel portion may be lowered slightly, and when the photopolymerizable compound is included in the above range, smoothness may be slightly lowered, so it is preferably included within the range. .
  • the photopolymerization initiator (D) can be used without particular limitation as long as it can polymerize the photopolymerizable compound.
  • the photopolymerization initiator may be an acetophenone compound, a benzophenone compound, a triazine compound, a biimidazole compound, an oxime compound, or a thioxic acid from the viewpoint of polymerization characteristics, start efficiency, absorption wavelength, availability, and price. It is preferable to use at least one compound selected from the group consisting of ton compounds.
  • acetophenone-based compound examples include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2-hydroxy Hydroxyethoxy) phenyl] -2-methylpropan-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propane-1 -One, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butan-1-one, and the like.
  • benzophenone type compound for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'- tetra ( tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, and the like.
  • triazine-based compound examples include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine and 2,4-bis (trichloromethyl) -6 -(4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (Trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2- Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine , 2,4-bis (trichloromethyl) -6- [2- (furan
  • biimidazole compound examples include 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3- Dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) biimi Dazole, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetra (trialkoxyphenyl) biimidazole, 2,2-bis (2,6-dichlorophenyl) -4 And a biimidazole compound in which a phenyl group at a 4,4 ', 5,5' position is substituted by a carboalkoxy group, or the like.
  • oxime-based compound examples include o-ethoxycarbonyl- ⁇ -oxyimino-1-phenylpropan-1-one, and the like, and commercially available products include BASF's Irgacure OXE 01 and OXE 02.
  • thioxanthone type compound 2-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-4- propoxy thioxanthone, etc. are mentioned, for example. There is this.
  • the photopolymerization initiator may be included in an amount of 0.1 to 20% by weight, preferably 0.5 to 15% by weight, and more preferably 1 to 10% by weight, based on 100% by weight of the total solid of the self-luminous photosensitive resin composition.
  • the self-luminous photosensitive resin composition is highly sensitive, so that the exposure time is shortened, so that productivity is improved and high resolution can be maintained.
  • the photopolymerization initiator may further include a photopolymerization initiation aid in order to improve the sensitivity of the self-luminous photosensitive resin composition of the present invention.
  • a photopolymerization initiation aid in order to improve the sensitivity of the self-luminous photosensitive resin composition of the present invention.
  • the photopolymerization initiation assistant may be preferably used, for example, at least one compound selected from the group consisting of an amine compound, a carboxylic acid compound, and an organic sulfur compound having a thiol group, but is not limited thereto.
  • amine compound examples include aliphatic amine compounds such as triethanolamine, methyl diethanolamine and triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, and 4-dimethyl.
  • the carboxylic acid compound is preferably an aromatic heteroacetic acid, specifically, phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, Chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, etc. are mentioned.
  • organic sulfur compound having the thiol group examples include 2-mercaptobenzothiazole, 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyloxyethyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, trimethylolpropane tris (3-mercaptopropionate), pentaerythritol tetrakis (3-mercapto Butyrate), pentaerythritol tetrakis (3-mercaptopropionate), dipentaerythritol hexakis (3-mercaptopropionate), tetraethylene glycol bis (3-mercaptopropionate) and the like Can be.
  • the photopolymerization start adjuvant may be appropriately added and used within a range that does not impair the effects of the present invention.
  • the self-luminous photosensitive resin composition according to one embodiment of the present invention may further include an additional solvent.
  • the additional solvent is not particularly limited, and may include an organic solvent commonly used in the art, which may be the same as or different from the solvent contained in the quantum dot dispersion of the present invention.
  • the additional solvent include alkylene glycol alkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, and propylene glycol methylethyl ether; Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; Alkylene glycol alkyl ether acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, and propylene glycol monopropyl ether acetate; Alkoxyalkyl acetates such as methoxybutyl acetate and methoxypentyl
  • the above additional solvent may preferably be an organic solvent having a boiling point of 100 ° C. to 200 ° C. in terms of coatability and dryness, and more preferably alkylene glycol alkyl ether acetates, ketones, and ethyl 3-ethoxypropionate.
  • Esters such as methyl 3-methoxypropionate can be used, and more preferably propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, and the like.
  • These additional solvents can be used individually or in mixture of 2 or more types, respectively.
  • the total solvent (solvent in quantum dot dispersion and additional solvent) contained in the self-luminous photosensitive resin composition of the present invention is 20 to 90% by weight, preferably 25 to 85% by weight, based on 100% by weight of the total of the self-luminous photosensitive resin composition, More preferably, it may be included in 30 to 80% by weight. If the total solvent content is within the above range, the applicability may be improved when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as die coater), inkjet, or the like. It is preferable.
  • the self-luminous photosensitive resin composition according to the present invention may further include an additive such as an adhesion promoter and a surfactant to enhance the coating property or adhesion.
  • the adhesion promoter may include a silane coupling agent having a reactive substituent selected from the group consisting of carboxyl groups, methacryloyl groups, isocyanate groups, epoxy groups, and combinations thereof, which may be added to increase adhesion to the substrate. It is not limited to this.
  • the silane coupling agent may be trimethoxysilylbenzoic acid, ⁇ -methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, ⁇ -isocyanatepropyl triethoxysilane, ⁇ -glycidoxy Propyl trimethoxysilane, (beta)-(3, 4- epoxycyclohexyl) ethyltrimethoxysilane, etc. are mentioned, These can be used individually or in combination of 2 or more types.
  • the self-luminous photosensitive resin composition according to the present invention includes the surfactant
  • the surfactant is BM-1000, BM-1100 (BM Chemie Co., Ltd.), Proride FC-135 / FC-170C / FC-430 (Sumitomo 3M Co., Ltd.), SH-28PA / -190 / SZ-6032 (Dore Siri).
  • Fluorine-based surfactants such as Corn Co., Ltd. may be used, but is not limited thereto.
  • the self-luminous photosensitive resin composition according to the present invention may further include additives such as antioxidants, ultraviolet absorbers and anti-agglomerating agents in a range that does not impair the effects of the present invention, the additives also inhibit the effects of the present invention It can be used by those skilled in the art as long as it does not.
  • the additive may be used in an amount of 0.05 to 10% by weight, specifically 0.1 to 10% by weight, and more specifically 0.1 to 5% by weight, based on 100% by weight of the total self-luminous photosensitive resin composition.
  • One embodiment of the present invention relates to a color filter formed by using the above self-luminous photosensitive resin composition.
  • the color filter according to the present invention includes the cured product of the self-luminous photosensitive resin composition including the quantum dot dispersion liquid of the present invention, the quantum dot particles are uniformly dispersed, thereby providing excellent light emission characteristics.
  • the color filter includes a substrate and a pattern layer formed on the substrate.
  • the substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited.
  • the substrate may be glass, silicon (Si), silicon oxide (SiO x ), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
  • the pattern layer is a layer including the self-luminous photosensitive resin composition of the present invention, and may be a layer formed by applying the self-luminous photosensitive resin composition and exposing, developing and thermosetting in a predetermined pattern.
  • the pattern layer may be formed by performing a method commonly known in the art.
  • the color filter including the substrate and the pattern layer may further include a partition wall or a black matrix formed between the patterns, but is not limited thereto.
  • a protective film formed on the pattern layer of the color filter may be further included.
  • the color filter may include at least one selected from the group consisting of a red pattern layer, a green pattern layer, and a blue pattern layer.
  • the color filter may include one or more selected from the group consisting of a red pattern layer including a red quantum dot, a green pattern layer including a green quantum dot, and a blue pattern layer including a blue quantum dot according to the present invention.
  • the red pattern layer, the green pattern layer, and the blue pattern layer may respectively emit red light, green light, and blue light when irradiated with light.
  • the emission light of the light source is not particularly limited, but blue light may be generated in terms of better color reproducibility.
  • a light source that emits can be used.
  • the color filter may include only a pattern layer of two colors among the red pattern layer, the green pattern layer, and the blue pattern layer, but is not limited thereto. However, when the color filter includes only the pattern layer of two colors, the pattern layer may further include a transparent pattern layer containing no quantum dot particles.
  • a light source emitting light having a wavelength representing a color other than the two colors may be used.
  • a light source emitting blue light may be used.
  • red quantum dots emit red light and green quantum dots emit green light
  • the transparent pattern layer may As the blue light transmitted by the light source is transmitted as it is, blue can be obtained.
  • One embodiment of the present invention relates to an image display apparatus equipped with the above-described color filter.
  • the color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
  • the image display device includes the color filter made of the cured product of the self-luminous photosensitive resin composition containing the quantum dot dispersion liquid of the present invention, thereby exhibiting excellent light emission characteristics.
  • each component was mixed to prepare a self-luminous photosensitive resin composition (unit: wt%).
  • Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Example 9 Example 10 Example 11 Comparative Example 1 Comparative Example 2 Comparative Example 3 Quantum Dot Dispersion (A) Preparation Example 1 40 Preparation Example 2 40 Preparation Example 3 40 Preparation Example 4 40 Preparation Example 5 40 Preparation Example 6 40 Preparation Example 7 40 Preparation Example 8 40 Preparation Example 9 40 Preparation Example 10 40 Preparation Example 11 40 Preparation Example 12 40 Preparation Example 13 40 Preparation Example 14 40 Alkali-Soluble Resin (B) 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20
  • Dispersion particle size of the quantum dot dispersion prepared in the above Preparation Example and the self-luminous photosensitive resin composition prepared in the Examples and Comparative Examples was measured using ELSZ-2000ZS (manufactured by Otsuka Co., Ltd.), and the results are shown in Table 3 below. .
  • ELSZ-2000ZS manufactured by Otsuka Co., Ltd.
  • Each self-luminous photosensitive resin composition was applied on a glass substrate by spin coating, then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film. Subsequently, a test photomask having a square transmissive pattern having a width ⁇ length of 20 mm ⁇ 20 mm and a line / space pattern of 1 ⁇ m to 100 ⁇ m was placed on the thin film and irradiated with ultraviolet rays at a distance of 100 ⁇ m from the test photomask. .
  • the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 under an air atmosphere using an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
  • the thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5.
  • the thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern.
  • the film thickness of the self-luminous color filter pattern prepared above was 3.0 ⁇ m.
  • the emission intensity in the 550 nm region of the color filter on which the self-luminous pixel was formed was measured using a spectrum meter (manufactured by Ocean Optics). It may be judged that the higher the measured light emission intensity is, the better the light emission characteristic is.
  • the quantum dot dispersion particle size in the quantum dot dispersion liquid of Preparation Examples 1 to 11 containing the specific solvent according to the present invention and the self-luminous photosensitive resin composition of Examples 1 to 11 including the same are prepared in Preparation Examples 12 to It was confirmed that it was smaller than the quantum dot dispersion particle size in the quantum dot dispersion liquid of 14 and the self-luminous photosensitive resin composition of Comparative Examples 1 to 3 including the same.
  • the color filter formed using the self-luminous photosensitive resin compositions of Examples 1 to 11 according to the present invention has superior emission intensity as compared to the color filter formed using the self-luminous photosensitive resin compositions of Comparative Examples 1 to 3. there was.

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Abstract

La présente invention concerne : une dispersion de points quantiques comprenant des points quantiques et un solvant, le solvant comprenant un composé ayant une liaison ester avec au moins un élément choisi dans le groupe constitué d'un groupe cycloalkyle en C3-C10, un groupe hétérocycloalkyle en C2-C10, un groupe aromatique en C5-C10, et un groupe hétéroaromatique en C4-C10 ; une composition de résine photosensible de type à auto-émission comprenant la dispersion de points quantiques ; un filtre coloré formé au moyen de la composition de résine photosensible de type à auto-émission ; et un dispositif d'affichage d'image. La dispersion de points quantiques selon la présente invention présente une excellente dispersibilité, même sans utiliser un solvant nocif pour le corps humain et, par conséquent, le filtre coloré formé au moyen de la composition de résine photosensible de type à auto-émission comprenant la dispersion de points quantiques peut présenter d'excellentes caractéristiques d'émission.
PCT/KR2018/001234 2017-02-03 2018-01-29 Dispersion de points quantiques, composition de résine photosensible de type à auto-émission, filtre coloré et dispositif d'affichage d'image Ceased WO2018143628A1 (fr)

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CN201880009840.0A CN110300791B (zh) 2017-02-03 2018-01-29 量子点分散液、自发光感光性树脂组合物、滤色器及图像显示装置

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