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WO2018143583A2 - Polyimide and polyimide film, prepared therefrom, for flexible display - Google Patents

Polyimide and polyimide film, prepared therefrom, for flexible display Download PDF

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Publication number
WO2018143583A2
WO2018143583A2 PCT/KR2018/000810 KR2018000810W WO2018143583A2 WO 2018143583 A2 WO2018143583 A2 WO 2018143583A2 KR 2018000810 W KR2018000810 W KR 2018000810W WO 2018143583 A2 WO2018143583 A2 WO 2018143583A2
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WO
WIPO (PCT)
Prior art keywords
group
polyimide
formula
carbon atoms
diamine
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Ceased
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PCT/KR2018/000810
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French (fr)
Korean (ko)
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WO2018143583A3 (en
Inventor
정혜원
구기철
김경준
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LG Chem Ltd
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LG Chem Ltd
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Priority claimed from KR1020170167165A external-priority patent/KR101989028B1/en
Application filed by LG Chem Ltd filed Critical LG Chem Ltd
Priority to EP20198866.4A priority Critical patent/EP3812415B1/en
Priority to EP18748750.9A priority patent/EP3578589A4/en
Priority to CN201880003834.4A priority patent/CN109803995B/en
Priority to JP2019512727A priority patent/JP7048020B2/en
Priority to US16/461,601 priority patent/US11319409B2/en
Publication of WO2018143583A2 publication Critical patent/WO2018143583A2/en
Publication of WO2018143583A3 publication Critical patent/WO2018143583A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements

Definitions

  • the present invention relates to a polyimide having improved heat resistance and thermal stability and a polyimide film for flexible display including the same.
  • Polyimide (PI) is a polymer with relatively low crystallinity or mostly amorphous structure. It is easy to synthesize, can make thin film, and does not need a crosslinker for curing. It is a polymer material that has excellent heat resistance, chemical resistance, excellent mechanical properties, electrical properties and dimensional stability. It is widely used in electric and electronic materials such as automotive, aerospace, flexible circuit boards, liquid crystal alignment films for LCDs, adhesives and coating agents. have.
  • polyimide is a high-performance polymer material with high thermal stability, mechanical properties, chemical resistance, and electrical properties, it does not satisfy the colorless and transparent property, which is a basic requirement for the display field, and also requires a lower coefficient of thermal expansion.
  • Kapton's coefficient of thermal expansion sold by DuPont, has a low coefficient of thermal expansion of about 30 ppm / ° C, but this also does not meet the requirements of plastic substrates. Therefore, many studies have been conducted to minimize optical characteristics and thermal hysteresis while maintaining basic characteristics of polyimide.
  • An object of the present invention is to provide a polyimide with improved heat resistance and thermal stability.
  • Another object of the present invention is to provide a polyimide film containing the polyimide.
  • the present invention also provides a diamine with a novel structure comprising a spiro or cardo group in its molecular structure.
  • the present invention to solve the above technical problem
  • polyimide prepared from a polymerization component comprising tetracarboxylic dianhydride and at least one diamine selected from the following formulas (1a) to (1e).
  • R 1 and R 2 are each independently a hydrogen atom, a halogen atom, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, and a carbon number It is a substituent selected from the halogenoalkoxy of 1-4, the halogenoalkyl of 1-10, C6-C20, and the aryl group,
  • the diamine of Formula 1 may be included in an amount of 30 to 100 mol% with respect to the total content of the diamine.
  • the coefficient of thermal expansion (CTE) of the polyimide may be 50ppm / °C or less.
  • the glass transition temperature (Tg) of the polyimide may be 330 °C or more.
  • the polyimide film for flexible displays containing the said polyimide is provided.
  • the present invention also provides a diamine represented by any one of the following Formulas 1a to 1e.
  • R 1, R 2 each independently represent a hydrogen atom, -F, -Cl, -Br, and a halogen atom, is selected from -I hydroxyl group (-OH), thiol (-SH), a nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenoalkoxy having 1 to 4 carbon atoms, a halogenoalkyl having 1 to 10 carbon atoms, and an aryl group having 6 to 20 carbon atoms.
  • the polyimide according to the present invention may be prepared from diamines containing spiro or cardo groups in which two or more phenyl groups are linked and fixed, thereby improving dimensional stability against heat as well as high glass transition temperature.
  • the polyimide film made of the polyimide according to the present invention has excellent thermal stability, and is a flexible device with high temperature process, in particular OLED (organic light) using an oxide TFT (thin film transistor) and LTPS (low temperature polysilicon) process. emitting diode) device.
  • substituted means that at least one hydrogen contained in the compound or the organic group is a halogen atom, an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group, a cycloalkyl group having 3 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, and a hydroxy group And substituted with a substituent selected from the group consisting of alkoxy groups, carboxylic acid groups, aldehyde groups, epoxy groups, cyano groups, nitro groups, amino groups, sulfonic acid groups and derivatives thereof having 1 to 10 carbon atoms.
  • a single bond, a double bond, a triple bond, an alkylene group having 1 to 10 carbon atoms for example, methylene group (-CH 2- ), an ethylene group (-CH 2 CH 2 -), etc.
  • the present invention provides an ultrahigh temperature resistant polyimide made from diamines having a novel structure.
  • Another object of the present invention to provide a polyimide film containing the polyimide.
  • the present invention provides a diamine represented by one selected from the following Chemical Formulas 1a to 1e.
  • R 1 and R 2 are each independently a hydrogen atom, a halogen atom, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, and a carbon number It is a substituent chosen from the halogeno alkoxy of 1-4, the halogenoalkyl of 1-10 carbon atoms, and the aryl group of 6-20 carbon atoms.
  • the diamine of the general formula (1) may be included in the content of 30 to 100 mol% with respect to the total content of the diamine in the polymerization component, preferably it may be included in a content of 50 to 100 mol%.
  • the diamine according to the present invention has a structure including a spiro group or a cardo group in which two or more phenyl groups are connected and fixed, and a polyimide comprising a group in which a phenyl group is not fixed.
  • a polyimide having a high thermal transition and a decrease in the CTE is reduced by fixing a phenyl group, thereby obtaining a polyimide having excellent thermal stability. Can provide.
  • the glass transition temperature of the polyimide may be 330 °C or more, preferably 350 °C or more.
  • the CTE of the polyimide may be 50 ppm / ° C. or less, preferably 30 ppm / ° C. or less, for example, 10 to 30 ppm / ° C.
  • the CTE is set to be pulled with a force of 0.02N after a sample of a thickness of 10 ⁇ m, width 5mm, length 5cm to the jig so that the measurement length is 16mm, and the temperature increase rate to 5 °C / min to rise to 300 °C ( After the first temperature rise) and then cooled to 50 ° C (primary cooling), and the temperature is increased to 450 ° C (secondary temperature increase) in the step of measuring the value in the 100 ⁇ 250 °C section.
  • the molar ratio of the total content of the tetracarboxylic dianhydride and the content of the diamine may be preferably 1: 0.99 to 0.99: 1, preferably 1: 0.98 to 0.98: 1.
  • the tetracarboxylic dianhydride may be used as long as it is generally used for the production of polyimide.
  • tetracarboxylic dianhydrides usable in the production of polyimides are tetravalent organic groups of aromatic, cycloaliphatic, or aliphatic in the molecule, or combinations thereof, and aliphatic, cycloaliphatic, or aromatic tetravalent organic groups.
  • It may be tetracarboxylic dianhydride including tetravalent organic groups connected to each other via a crosslinked structure.
  • it may be a tetracarboxylic dianhydride including a tetravalent organic group structure selected from the group consisting of tetravalent organic groups of Formulas 2a to 2e and combinations thereof.
  • R 11 to R 17 each independently represent a hydrogen atom, a halogen atom (selected from -F, -Cl, -Br, and -I), a hydroxyl group (-OH), and a thiol group (-SH ), A nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenoalkoxy having 1 to 4 carbon atoms, a halogenoalkyl having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms Can,
  • A1 is an integer of 0 to 2
  • a2 is an integer of 0 to 4
  • a3 is an integer of 0 to 8
  • a4 and a5 may each independently represent an integer of 0 to 3
  • a6 and a9 may each independently represent an integer of 0 to 3
  • a7 and a8 may each independently represent an integer of 0 to 9
  • tetracarboxylic dianhydride used in the present invention may be used in the structure, but tetracarboxylic dianhydride including a tetravalent organic group selected from the group consisting of 3a to 3r, but is not limited thereto.
  • At least one hydrogen atom present in the tetravalent organic group of 3a to 3r may be selected from the group consisting of -F, -Cl, -Br and -I, a halogen atom, a hydroxyl group (-OH), a thiol group ( -SH), a nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenoalkoxy having 1 to 4 carbon atoms, a halogenoalkyl having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms It may be substituted with a substituent.
  • diamines may be used in addition to the diamine of Chemical Formula 1, and the diamine may be used as long as it is generally used for preparing polyimide, and specifically, an aliphatic, alicyclic or aromatic divalent compound.
  • an organic group or a combination group thereof an aliphatic, alicyclic or aromatic divalent organic group may be directly connected or a divalent organic group connected to each other through a crosslinking structure, for example, 2 of Formulas 4a to 4g It may be a diamine containing a divalent organic group structure selected from the group consisting of a divalent organic group and a combination thereof.
  • R 21 to R 28 each independently represent an alkyl group having 1 to 10 carbon atoms (for example, methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, tert-butyl group, pentyl group, etc.), halogen group and hydroxy group
  • a cyclohexylene group, etc. a monocyclic or polycyclic arylene group having 6 to 18 carbon atoms (e.g., a phenylene group, a naphthalene group, a fluorenylene group, etc.), and combinations thereof may be selected.
  • a cyclohexylene group, etc. a monocyclic or polycyclic arylene group having 6 to 18 carbon atoms (e.g., a phenylene group, a naphthalene group, a fluorenylene group, etc.), and combinations thereof may be selected.
  • b 1 , b 4 and b 5 are each independently an integer from 0 to 4
  • b 2 is an integer from 0 to 6
  • b 3 is an integer from 0 to 3
  • b 6 and b 9 are each independently 0 or is an integer of 1
  • b 7, and 8 b are each independently an integer of 0 to 10.
  • the diamine used in the present invention may further be a diamine including a divalent organic group selected from the group consisting of the formulas 5a to 5t in the structure, but is not limited thereto.
  • the at least one hydrogen atom present in the divalent organic group of 5a to 5t is a halogen atom selected from -F, -Cl, -Br and -I, hydroxyl group (-OH), thiol group (-SH), nitro Or a substituent selected from a group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenoalkoxy having 1 to 4 carbon atoms, a halogenoalkyl having 1 to 10 carbon atoms, and an aryl group having 6 to 20 carbon atoms.
  • a halogen atom selected from -F, -Cl, -Br and -I
  • hydroxyl group -OH
  • thiol group -SH
  • a cyano group an alkyl group having 1 to 10 carbon atoms
  • a halogenoalkoxy having
  • the polymerization component may further include a diamine of the following Chemical Formula 6 together with the diamine selected from Chemical Formulas 1a to 1e.
  • R 31 and R 32 are each independently a halogen atom selected from -F, -Cl, -Br and -I, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2 ), A substituent selected from a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenoalkoxy having 1 to 4 carbon atoms, a halogenoalkyl having 1 to 10 carbon atoms, and an aryl group having 6 to 20 carbon atoms,
  • n and m are each independently an integer of 0-4.
  • the method for reacting the tetracarboxylic dianhydride with the diamine can be carried out according to a conventional polyimide precursor polymerization production method such as solution polymerization. Specifically, after dissolving diamine in an organic solvent, tetracarboxylic dianhydride is added to the resulting mixed solution and polymerized to produce a polyamic acid as a polyimide precursor.
  • the reaction can be carried out under an inert gas or nitrogen stream and can be carried out in anhydrous conditions.
  • the polymerization temperature may be carried out at -20 to 60 °C, preferably 0 to 45 °C. If the reaction temperature is too high, the reactivity may be increased to increase the molecular weight, it may be disadvantageous in terms of the process by increasing the viscosity of the precursor composition.
  • sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide
  • formamide solvents such as N, N-dimethylformamide, N, N-diethylformamide, N, N-dimethylacetamide
  • Acetamide solvents such as N, N-diethylacetamide
  • pyrrolidone solvents such as N-methyl-2-pyrrolidone and N-vinyl-2-pyrrolidone
  • phenol, o-, m- or p Phenol solvents such as cresol, xylenol, halogenated phenol, catechol, or hexamethylphosphoramide, ⁇ -butyrolactone, and the like, and these may be used alone or as a mixture, more preferably N, N-diethylacetamide (N, N-diethylacetamide, DEAc), N, N-diethylformamide (DEF), N-ethylpyrrolidone (NE
  • the organic solvent may further use an aromatic hydrocarbon such as xylene, toluene, and also up to about 50% by weight of alkali metal salt or alkaline earth in the solvent to promote dissolution of the polymer. Further metal salts may be added.
  • aromatic hydrocarbon such as xylene, toluene
  • alkali metal salt or alkaline earth in the solvent to promote dissolution of the polymer. Further metal salts may be added.
  • the polyimide precursor solution manufactured by the above-mentioned manufacturing method contains solid content in the quantity which makes the said composition have appropriate viscosity in consideration of processability, such as applicability
  • the content of the composition may be adjusted such that the total polyimide precursor is 5 to 20% by weight, preferably 8 to 18% by weight, more preferably 8 to 12% by weight. have.
  • the polyimide precursor solution may be adjusted to have a viscosity of 2,000 cP or more, or 3,000 cP or more, and the viscosity of the polyimide precursor solution may be 10,000 cP or less, preferably 9,000 cP or less, and more preferably 8,000 cP. It is preferable to adjust so that it may have the following viscosity.
  • the viscosity of the polyimide precursor solution exceeds 10,000 cP, the efficiency of degassing during the processing of the polyimide film is lowered. As a result, not only the efficiency of the process but also the resulting film has poor surface roughness due to foaming, resulting in electrical, optical and mechanical properties. Can be degraded.
  • the polyimide according to the present invention may have a weight average molecular weight of 10,000 to 200,000 g / mol, or 20,000 to 100,000 g / mol, or 30,000 to 100,000 g / mol. It is preferable that molecular weight distribution (Mw / Mn) is 1.1-2.5. If the weight average molecular weight or molecular weight distribution of the polyimide is out of the above range, it may be difficult to form a film or the characteristics of the polyimide film such as permeability, heat resistance and mechanical properties may be deteriorated.
  • the polyimide precursor obtained as a result of the polymerization reaction is imidated, whereby a transparent polyimide film can be produced.
  • the imidization process may specifically include a chemical imidization method or a thermal imidization method.
  • a dehydrating agent and an imidization catalyst are added to the polymerized polyimide precursor solution, and then heated to a temperature of 50 to 100 ° C. to imidize by chemical reaction, or the alcohol is removed while refluxing the solution.
  • Polyimide can be obtained by the method of drawing.
  • pyridine, triethylamine, picoline, or quinoline may be used as the imidization catalyst, and in addition, N- of substituted or unsubstituted nitrogen-containing heterocyclic compounds and nitrogen-containing heterocyclic compounds
  • acid anhydrides such as acetic anhydride can be used.
  • the polyimide precursor solution may be imidized by applying a heat treatment on a substrate.
  • the polyimide precursor solution may be in the form of a solution dissolved in an organic solvent, and in the case of having such a form, for example, when a polyimide precursor is synthesized in an organic solvent, the solution may be the reaction solution itself obtained. The reaction solution may be diluted with another solvent. Moreover, when a polyimide precursor is obtained as a solid powder, it may be made to melt
  • the present invention comprises the steps of applying the polyimide precursor solution on a substrate;
  • It provides a method for producing a polyimide film comprising the step of heat-treating the applied polyimide precursor solution.
  • the polyimide precursor solution is applied to a substrate and heat-treated on an IR oven, a hot air oven or a hot plate, wherein the heat treatment temperature may be in the range of 300 to 500 ° C, preferably 320 to 480 ° C, and the temperature range It can also be carried out in a multistage heating process.
  • the heat treatment process may be carried out for 20 to 70 minutes, preferably for 20 to 60 minutes.
  • the organic solvent contained in the polyimide precursor solution of the present invention may be the same as the organic solvent used in the synthesis reaction.
  • this invention is a range which does not impair an effect, you may add an imidation promoter etc. for the purpose of advancing a silane coupling agent, a crosslinkable compound, and imidation efficiently.
  • the polyimide-based film has a haze value of 1 or less, preferably 0.9 or less, or 0.7 or less, and more preferably 0.5 or less, thereby providing a polyimide film having improved transparency.
  • the thickness of the polyimide film may be 8 to 15 ⁇ m, preferably 10 to 12 ⁇ m.
  • the transmittance of light with a wavelength of 380 to 760 nm in the film thickness range of 5 to 30 ⁇ m is 80% or more, and the yellowness (YI) is about 25 or less, preferably about 20 or less, and more preferably about 16 or less. Or a colorless transparent polyimide film having a value of 15 or less.
  • the polyimide film has an in-plane retardation value R in of about 0 to 100 nm, and an absolute value of the retardation value R th in the thickness direction is about 1500 nm or less, or 0 to 1000 nm or less, preferably 30 to 800 nm. Or less, more preferably, 50 to 700 nm or less. Visibility suitable for a display may be expressed in the phase difference range in the thickness direction, and when the thickness direction phase difference is 1500 nm or more, a phase difference occurs in the polyimide film so that light is distorted and thus visibility may be significantly reduced.
  • an article including the polyimide copolymer is provided.
  • the molded article may be a film, a fiber, a coating material, an adhesive material, but is not limited thereto.
  • the molded article may be formed by a dry wet method, a dry method, a wet method, etc. using the composite composition of the copolymer and the inorganic particles, but is not limited thereto.
  • the molded article may be an optical film, in which case, the composition comprising the polyimide copolymer is applied to the substrate by a method such as spin coating, and then easily dried and cured. Can be prepared.
  • the polyimide according to the present invention may exhibit excellent heat resistance against thermal changes that may occur in a high temperature process, such as an element substrate, a display cover substrate, an optical film, an integrated circuit (IC) package, and an adhesive film.
  • adhesive film multilayer FPC (flexible printed circuit), tape, a touch panel, a protective film for an optical disk, etc. can be used in various fields.
  • the display device may include a liquid crystal display device (LCD), an organic light emitting diode (OLED), and the like, and in particular, a low temperature polysilicon (LTPS) process requiring a high temperature process It may be suitable for an OLED device using, but is not limited thereto.
  • LCD liquid crystal display device
  • OLED organic light emitting diode
  • LTPS low temperature polysilicon
  • Diamine compound of formula 10 (Compound 10) was prepared as follows.
  • the diamine compound of formula 11 (Compound 11) was prepared as follows.
  • BPDA 3,3,4,4'-biphenyltetracarboxylic dianhydride
  • TFDB 2,2'-bis (trifluoromethyl)-[1,1 ' -biphenyl] -4,4'-diamine
  • a polyamic acid resin prepared by polymerizing 0.5mol and 0.5mol of the diamine of Formula 10 prepared in Synthesis Example 1 and 80% by weight of DMAc (dimethylacetamide) as a solvent.
  • DMAc dimethylacetamide
  • a composition comprising 20% by weight of polyamic acid-based resin prepared by polymerizing 1 mol of BPDA and 0.99 mol of the diamine of Formula 11 prepared in Synthesis Example 2 and 80% by weight of DMAc as a solvent. After drying, the coating was applied to a thickness of 10 ⁇ m, and the resulting coating film was continuously subjected to a drying step at 100 ° C. and a curing step at 300 ° C. for 60 minutes to form a polyimide film for forming a polymer layer of the flexible substrate. It was.
  • an alkali-free glass As a carrier substrate, 20% by weight of a polyamic acid-based resin prepared by polymerizing 1 mol of BPDA, 0.5 mol of TFDB, and 0.5 mol of the diamine of Formula 12 prepared in Synthesis Example 3, and 80% by weight of DMAc as a solvent
  • the composition was coated to have a thickness of 10 ⁇ m, and the resulting coating film was continuously subjected to a drying step at 100 ° C. and a curing step at 300 ° C. for 60 minutes to form a polymer for forming a polymer layer of the flexible substrate.
  • the mid film was formed.
  • a composition containing 20% by weight of a polyamic acid resin prepared by polymerizing 1 mol of BPDA and 0.99 mol of TFDB and 80% by weight of DMAc as a solvent was applied so as to have a thickness of 10 ⁇ m.
  • the resulting coating film was continuously subjected to a drying step at a temperature of 100 ° C. and a curing step at 300 ° C. for 60 minutes to form a polyimide film for forming a polymer layer of a flexible substrate including a polyimide resin. .
  • a polyimide film for forming a layer of the flexible substrate was prepared in the same manner as in Example 1, except that diamine (SBF) of the following formula was used.
  • a sample with a thickness of 10 ⁇ m, a width of 5 mm, and a length of 5 cm is set to be pulled by a jig so that the measuring length becomes 16 mm, and then pulled with a force of 0.02 N, and the temperature rising rate is 5 ° C./min.
  • the thermal expansion value in the range of 100 to 250 ° C. was measured by TMA (Q400 of TA). At this time, the inflection point seen in the temperature increase section in the first temperature increase step was set to Tg.
  • Thickness direction retardation (Rth) of the film having a thickness of 10 ⁇ m, a width of 5 cm, and a length of 5 cm was measured by Axoscan.
  • the polyimide film according to the present invention has a lower CTE value and a higher glass transition temperature than the polyimide of Comparative Examples 1 and 2. Especially in the case of Example 2, the CTE value is similar to that of Comparative Example 1, but has a much higher glass transition temperature.
  • the present invention by including two phenyl groups fixed and spiro or cardo group fixed in the molecular structure, it is possible to limit the movement of the phenyl group even if the temperature rises, thereby improving the dimensional stability against heat.

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Abstract

Described is a polyimide prepared from a diamine containing a spiro or cardo group in a molecule structure, wherein the dimensional stability of the polyimide can be improved at a high temperature, and thus the polyimide can provide a polyimide film useful for a flexible substrate.

Description

폴리이미드 및 이로부터 제조된 플렉시블 디스플레이용 폴리이미드 필름Polyimide and Polyimide Film for Flexible Display Made Therefrom

본 출원은 2017년 1월 31일 출원된 한국 특허 출원 10-2017-0013726호와 2017년 12월 7일에 출원된 10-2017-0167165호에 기초한 우선권의 이익을 주장하며, 해당 출원에 기재된 모든 내용은 본 명세서의 일부로서 포함된다. This application claims the benefit of priority based on Korean Patent Application No. 10-2017-0013726, filed January 31, 2017 and 10-2017-0167165, filed December 7, 2017, The contents are included as part of this specification.

본 발명은 내열성 및 열안정성이 향상된 폴리이미드 및 이를 포함하는 플렉시블 디스플레이용 폴리이미드 필름에 관한 것이다.The present invention relates to a polyimide having improved heat resistance and thermal stability and a polyimide film for flexible display including the same.

폴리이미드(polyimide, PI)는 비교적 결정화도가 낮거나 대부분 비결정성 구조를 갖는 고분자로서, 합성이 용이하고 박막형 필름을 만들 수 있으며 경화를 위한 가교기가 필요하지 않은 장점뿐만 아니라 투명성, 강직한 사슬구조에 의해 뛰어난 내열성과 내화학성, 우수한 기계적 물성, 전기적 특성 및 치수안정성을 갖고 있는 고분자 재료로 현재 자동차, 항공 우주분야, 유연성 회로기판, LCD용 액정 배향막, 접착 및 코팅제 등의 전기, 전자재료로 널리 사용되고 있다.Polyimide (PI) is a polymer with relatively low crystallinity or mostly amorphous structure. It is easy to synthesize, can make thin film, and does not need a crosslinker for curing. It is a polymer material that has excellent heat resistance, chemical resistance, excellent mechanical properties, electrical properties and dimensional stability. It is widely used in electric and electronic materials such as automotive, aerospace, flexible circuit boards, liquid crystal alignment films for LCDs, adhesives and coating agents. have.

하지만 폴리이미드는 높은 열 안정성, 기계적 물성, 내화학성, 그리고 전기적 특성을 가지고 있는 고성능 고분자 재료임에도 불구하고 디스플레이 분야에 사용하기 위한 기본적인 요건인 무색투명한 성질을 만족시키지 못하고 있으며, 또한 열팽창계수를 더욱 낮추어야 하는 과제가 존재한다. 예를 들어 듀폰사에서 판매되고 있는 Kapton의 열팽창계수는 약 30 ppm/℃ 정도로 낮은 열팽창계수 값을 보이고 있으나, 이 역시 플라스틱 기판의 요구조건에는 미치지 못하고 있다. 따라서 현재 폴리이미드의 기본적인 특성을 유지하면서 광학적 특성과 열 이력 변화를 최소화하기 위한 연구가 많이 진행되고 있다.However, although polyimide is a high-performance polymer material with high thermal stability, mechanical properties, chemical resistance, and electrical properties, it does not satisfy the colorless and transparent property, which is a basic requirement for the display field, and also requires a lower coefficient of thermal expansion. There is a problem. For example, Kapton's coefficient of thermal expansion, sold by DuPont, has a low coefficient of thermal expansion of about 30 ppm / ° C, but this also does not meet the requirements of plastic substrates. Therefore, many studies have been conducted to minimize optical characteristics and thermal hysteresis while maintaining basic characteristics of polyimide.

그러나 디스플레이 분야에 사용하기 위해서는 보다 낮은 열팽창 계수를 가지며, 높은 용해도, 투명도 및 열적 안전성을 갖는 플렉시블 디스플레이용 폴리머의 개발이 필요하다.However, in order to use in the display field, there is a need for the development of a polymer for a flexible display having a lower coefficient of thermal expansion, high solubility, transparency and thermal stability.

본 발명이 해결하고자 하는 과제는, 내열성 및 열안정성이 개선된 폴리이미드를 제공하는 것이다.An object of the present invention is to provide a polyimide with improved heat resistance and thermal stability.

본 발명이 해결하고자 하는 다른 과제는, 상기 폴리이미드를 포함하는 폴리이미드 필름을 제공하는 것이다.Another object of the present invention is to provide a polyimide film containing the polyimide.

본 발명은 또한, 분자 구조내 스피로 또는 카르도 그룹을 포함하는 신규 구조의 디아민을 제공하는 것이다.The present invention also provides a diamine with a novel structure comprising a spiro or cardo group in its molecular structure.

본 발명은 전술한 기술적 과제를 해결하기 위해,The present invention to solve the above technical problem,

테트라카르복실산 이무수물과 하기 화학식 1a 내지 화학식 1e 중에서 선택되는 하나 이상의 디아민을 포함하는 중합성분으로부터 제조되는 폴리이미드를 제공한다.It provides a polyimide prepared from a polymerization component comprising tetracarboxylic dianhydride and at least one diamine selected from the following formulas (1a) to (1e).

[화학식 1a][Formula 1a]

Figure PCTKR2018000810-appb-I000001
Figure PCTKR2018000810-appb-I000001

[화학식 1b][Formula 1b]

Figure PCTKR2018000810-appb-I000002
Figure PCTKR2018000810-appb-I000002

[화학식 1c][Formula 1c]

Figure PCTKR2018000810-appb-I000003
Figure PCTKR2018000810-appb-I000003

[화학식 1d][Formula 1d]

Figure PCTKR2018000810-appb-I000004
Figure PCTKR2018000810-appb-I000004

[화학식 1e][Formula 1e]

Figure PCTKR2018000810-appb-I000005
Figure PCTKR2018000810-appb-I000005

상기 화학식 1b 내지 1e에 있어서,In Chemical Formulas 1b to 1e,

상기 R1, R2 은 각각 독립적으로 수소원자, 할로겐 원자, 하이드록실기(-OH), 티올기(-SH), 니트로기(-NO2), 시아노기, 탄소수 1 내지 10의 알킬기, 탄소수 1 내지 4의 할로게노알콕시, 탄소수 1 내지 10의 할로게노알킬, 탄소수 6 내지 20의 아릴기에서 선택되는 치환체이고,R 1 and R 2 are each independently a hydrogen atom, a halogen atom, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, and a carbon number It is a substituent selected from the halogenoalkoxy of 1-4, the halogenoalkyl of 1-10, C6-C20, and the aryl group,

일 실시예에 따르면, 상기 디아민의 총 함량에 대해 상기 화학식 1의 디아민이 30 내지 100 몰%의 함량으로 포함되는 것일 수 있다.According to an embodiment, the diamine of Formula 1 may be included in an amount of 30 to 100 mol% with respect to the total content of the diamine.

일 실시예에 따르면, 상기 폴리이미드의 열팽창계수(CTE)가 50ppm/℃ 이하일 수 있다.According to one embodiment, the coefficient of thermal expansion (CTE) of the polyimide may be 50ppm / ℃ or less.

일 실시예에 따르면, 상기 폴리이미드의 유리전이온도(Tg)가 330℃ 이상일 수 있다.According to one embodiment, the glass transition temperature (Tg) of the polyimide may be 330 ℃ or more.

본 발명의 다른 과제를 해결하기 위해, 상기 폴리이미드를 포함하는 플렉시블 디스플레이용 폴리이미드 필름을 제공한다.In order to solve the another subject of this invention, the polyimide film for flexible displays containing the said polyimide is provided.

본 발명은 또한, 하기 화학식 1a 내지 1e 중 어느 하나로 표시되는 디아민을 제공한다.The present invention also provides a diamine represented by any one of the following Formulas 1a to 1e.

[화학식 1a][Formula 1a]

Figure PCTKR2018000810-appb-I000006
Figure PCTKR2018000810-appb-I000006

[화학식 1b][Formula 1b]

Figure PCTKR2018000810-appb-I000007
Figure PCTKR2018000810-appb-I000007

[화학식 1c][Formula 1c]

Figure PCTKR2018000810-appb-I000008
Figure PCTKR2018000810-appb-I000008

[화학식 1d][Formula 1d]

Figure PCTKR2018000810-appb-I000009
Figure PCTKR2018000810-appb-I000009

[화학식 1e][Formula 1e]

Figure PCTKR2018000810-appb-I000010
Figure PCTKR2018000810-appb-I000010

상기 화학식 1a 내지 1e에 있어서,In Chemical Formulas 1a to 1e,

상기 R1, R2 은 각각 독립적으로 수소 원자, -F, -Cl, -Br 및 -I으로부터 선택되는 할로겐 원자, 하이드록실기(-OH), 티올기(-SH), 니트로기(-NO2), 시아노기, 탄소수 1 내지 10의 알킬기, 탄소수 1 내지 4의 할로게노알콕시, 탄소수 1 내지 10의 할로게노알킬, 탄소수 6 내지 20의 아릴기에서 선택되는 치환체이다.Wherein R 1, R 2 each independently represent a hydrogen atom, -F, -Cl, -Br, and a halogen atom, is selected from -I hydroxyl group (-OH), thiol (-SH), a nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenoalkoxy having 1 to 4 carbon atoms, a halogenoalkyl having 1 to 10 carbon atoms, and an aryl group having 6 to 20 carbon atoms.

본 발명에 따른 폴리이미드는 2개 이상의 페닐기가 연결되어 고정된 스피로(spiro) 또는 카르도(cardo) 그룹을 포함하는 디아민으로부터 제조됨으로써, 높은 유리전이 온도 뿐만아니라 열에 대한 치수 안정성이 향상될 수 있다. 본 발명에 따른 폴리이미드로 제조된 폴리이미드 필름은 열적 안정성이 우수하여, 고온 공정을 수반하는 플렉서블 디바이스, 특히 Oxide TFT(thin film transistor)와 LTPS(low temperature polysilicon) 공정을 사용하는 OLED(organic light emitting diode) 디바이스 에 적합하다.The polyimide according to the present invention may be prepared from diamines containing spiro or cardo groups in which two or more phenyl groups are linked and fixed, thereby improving dimensional stability against heat as well as high glass transition temperature. . The polyimide film made of the polyimide according to the present invention has excellent thermal stability, and is a flexible device with high temperature process, in particular OLED (organic light) using an oxide TFT (thin film transistor) and LTPS (low temperature polysilicon) process. emitting diode) device.

본 발명은 다양한 변환을 가할 수 있고 여러 가지 실시예를 가질 수 있는 바, 특정 실시예들을 도면에 예시하고 상세한 설명에 상세하게 설명하고자 한다. 그러나, 이는 본 발명을 특정한 실시 형태에 대해 한정하려는 것이 아니며, 본 발명의 사상 및 기술 범위에 포함되는 모든 변환, 균등물 내지 대체물을 포함하는 것으로 이해되어야 한다. 본 발명을 설명함에 있어서 관련된 공지 기술에 대한 구체적인 설명이 본 발명의 요지를 흐릴 수 있다고 판단되는 경우 그 상세한 설명을 생략한다.As the invention allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the written description. However, this is not intended to limit the present invention to specific embodiments, it should be understood to include all transformations, equivalents, and substitutes included in the spirit and scope of the present invention. In the following description of the present invention, if it is determined that the detailed description of the related known technology may obscure the gist of the present invention, the detailed description thereof will be omitted.

본 명세서에서 모든 화합물 또는 유기기는 특별한 언급이 없는 한 치환되거나 비치환된 것일 수 있다. 여기서, '치환된'이란 화합물 또는 유기기에 포함된 적어도 하나의 수소가 할로겐 원자, 탄소수 1 내지 10의 알킬기, 할로겐화알킬기, 탄소수 3 내지 30의 사이클로알킬기, 탄소수 6 내지 30의 아릴기, 하이드록시기, 탄소수 1 내지 10의 알콕시기, 카르복실산기, 알데히드기, 에폭시기, 시아노기, 니트로기, 아미노기, 술폰산기 및 이들의 유도체로 이루어진 군에서 선택되는 치환기로 대체된 것을 의미한다.All compounds or organic groups herein may be substituted or unsubstituted unless otherwise specified. Herein, the term "substituted" means that at least one hydrogen contained in the compound or the organic group is a halogen atom, an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group, a cycloalkyl group having 3 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, and a hydroxy group And substituted with a substituent selected from the group consisting of alkoxy groups, carboxylic acid groups, aldehyde groups, epoxy groups, cyano groups, nitro groups, amino groups, sulfonic acid groups and derivatives thereof having 1 to 10 carbon atoms.

또한 본 명세서에서 '이들의 조합'이란 특별한 언급이 없는 한, 둘 이상의 작용기가 단일결합, 이중결합, 삼중결합, 탄소수 1 내지 10의 알킬렌기(예를 들면, 메틸렌기(-CH2-), 에틸렌기(-CH2CH2-), 등), 탄소수 1 내지 10의 플루오로알킬렌기(예를 들면, 플루오로메틸렌기(-CF2-), 퍼플루오로에틸렌기(-CF2CF2-) 등), N, O, P, S, 또는 Si와 같은 헤테로 원자 또는 이를 포함하는 작용기(예를 들면, 분자내 카르보닐기(-C(=O)-), 에테르기(-O-), 에스터기(-COO-), -S-, -NH- 또는 -N=N- 등을 포함하는 헤테로알킬렌기)와 같은 연결기에 의해 결합되어 있거나, 또는 둘 이상의 작용기가 축합, 연결되어 있는 것을 의미한다.In addition, in the present specification, 'combination thereof' unless otherwise specified, a single bond, a double bond, a triple bond, an alkylene group having 1 to 10 carbon atoms (for example, methylene group (-CH 2- ), an ethylene group (-CH 2 CH 2 -), etc.), (a methylene group in, for example, fluoro (-CF 2 -) alkylene fluoroalkyl group having 1 to 10 carbon atoms, ethylene perfluoro (-CF 2 CF 2 Etc.), a hetero atom such as N, O, P, S, or Si or a functional group containing the same (e.g., an intramolecular carbonyl group (-C (= 0)-), ether group (-O-), It is bound by a linking group such as ester group (-COO-), -S-, -NH- or -N = N-, etc.) or two or more functional groups are condensed, connected do.

고온 공정을 수반하는 플렉서블 디바이스는 고온에서의 내열성이 요구되는데, 특히 Oxide TFT(thin film transistor)와 LTPS(low temperature polysilicon) 공정을 사용하는 OLED(organic light emitting diode) 디바이스의 경우 공정온도가 350℃ 이상이며, 500℃에 근접하기도 한다. Flexible devices with high temperature processes require heat resistance at high temperatures, especially for organic light emitting diode (OLED) devices using oxide thin film transistor (TFT) and low temperature polysilicon (LTPS) processes. The above is also close to 500 degreeC.

이러한 온도에서는 내열성이 우수한 폴리이미드라 하더라도 열분해가 되기 쉬우며, 열에 의한 수축 또는 팽창이 일어날 수 있다. 따라서 플렉서블 디바이스 제조를 위해서는 우수한 기계적 특성과 함께, 고온에서 높은 투명성을 유지하면서 우수한 열안정성을 나타낼 수 있는 폴리이미드의 개발이 필요하다.At such a temperature, even polyimide having excellent heat resistance is likely to be pyrolyzed, and thermal shrinkage or expansion may occur. Therefore, in order to manufacture a flexible device, it is necessary to develop a polyimide that can exhibit excellent thermal stability while maintaining high transparency at high temperature with excellent mechanical properties.

본 발명은 신규한 구조를 갖는 디아민으로부터 제조된, 초고내열성 폴리이미드를 제공하는 것이다.The present invention provides an ultrahigh temperature resistant polyimide made from diamines having a novel structure.

본 발명의 다른 목적은 상기 폴리이미드를 포함하는 폴리이미드 필름을 제공하는 것이다.Another object of the present invention to provide a polyimide film containing the polyimide.

본 발명은, 하기 화학식 1a 내지 1e 중에서 선택되는 하나로 표시되는 디아민을 제공한다. The present invention provides a diamine represented by one selected from the following Chemical Formulas 1a to 1e.

[화학식 1a][Formula 1a]

Figure PCTKR2018000810-appb-I000011
Figure PCTKR2018000810-appb-I000011

[화학식 1b][Formula 1b]

Figure PCTKR2018000810-appb-I000012
Figure PCTKR2018000810-appb-I000012

[화학식 1c][Formula 1c]

Figure PCTKR2018000810-appb-I000013
Figure PCTKR2018000810-appb-I000013

[화학식 1d][Formula 1d]

Figure PCTKR2018000810-appb-I000014
Figure PCTKR2018000810-appb-I000014

[화학식 1e][Formula 1e]

Figure PCTKR2018000810-appb-I000015
Figure PCTKR2018000810-appb-I000015

상기 화학식 1b 내지 1e에 있어서,In Chemical Formulas 1b to 1e,

상기 R1, R2 는 각각 독립적으로 수소 원자, 할로겐 원자, 하이드록실기(-OH), 티올기(-SH), 니트로기(-NO2), 시아노기, 탄소수 1 내지 10의 알킬기, 탄소수 1 내지 4의 할로게노알콕시, 탄소수 1 내지 10의 할로게노알킬, 탄소수 6 내지 20의 아릴기에서 선택되는 치환체이다.R 1 and R 2 are each independently a hydrogen atom, a halogen atom, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, and a carbon number It is a substituent chosen from the halogeno alkoxy of 1-4, the halogenoalkyl of 1-10 carbon atoms, and the aryl group of 6-20 carbon atoms.

또한, 본 발명은,In addition, the present invention,

테트라카르복실산 이무수물과 1종 이상의 디아민을 포함하는 중합성분으로부터 제조되는 폴리이미드에 있어서,In the polyimide manufactured from a polymerization component containing tetracarboxylic dianhydride and at least one diamine,

상기 디아민이 상기 화학식 1a 내지 1e 중 어느 하나의 디아민인 것인 폴리이미드를 제공한다.It provides a polyimide wherein the diamine is a diamine of any one of Formulas 1a to 1e.

일 실시예에 따르면, 상기 중합성분 중 디아민의 총 함량에 대해 상기 화학식 1의 디아민이 30 내지 100몰% 함량으로 포함되는 것일 수 있으며, 바람직하게는 50 내지 100몰% 함량으로 포함될 수 있다.According to one embodiment, the diamine of the general formula (1) may be included in the content of 30 to 100 mol% with respect to the total content of the diamine in the polymerization component, preferably it may be included in a content of 50 to 100 mol%.

본 발명에 따른 디아민은, 2개 이상의 페닐기가 연결되어 고정된 스피로 그룹(spiro group) 또는 카르도 그룹(cardo group)을 포함하는 구조를 가지는데, 페닐기가 고정되지 않은 그룹을 포함하는 폴리이미드의 경우에는 유리전이온도는 상승하지만 CTE(열 팽창계수)가 높아져 열안정성이 저하될 수 있으나, 본 발명은 페닐기를 고정시킴으로써, 유리전이온도가 높고 CTE의 증가가 저하되어 열안정성이 우수한 폴리이미드를 제공할 수 있다.The diamine according to the present invention has a structure including a spiro group or a cardo group in which two or more phenyl groups are connected and fixed, and a polyimide comprising a group in which a phenyl group is not fixed. In this case, although the glass transition temperature is increased, but the CTE (thermal expansion coefficient) is increased, the thermal stability may be lowered. However, in the present invention, a polyimide having a high thermal transition and a decrease in the CTE is reduced by fixing a phenyl group, thereby obtaining a polyimide having excellent thermal stability. Can provide.

일 실시예에 따르면, 상기 폴리이미드의 유리전이온도는 330℃ 이상일 수 있으며, 바람직하게는 350℃ 이상일 수 있다.According to one embodiment, the glass transition temperature of the polyimide may be 330 ℃ or more, preferably 350 ℃ or more.

일 실시예에 따르면, 상기 폴리이미드의 CTE 는 50ppm/℃ 이하 일 수 있으며, 바람직하게는 30ppm/℃ 이하일 수 있고, 예를 들면, 10 내지 30ppm/℃ 일 수 있다.According to an embodiment, the CTE of the polyimide may be 50 ppm / ° C. or less, preferably 30 ppm / ° C. or less, for example, 10 to 30 ppm / ° C.

이때, 상기 CTE는 두께 10μm, 폭 5mm, 길이 5cm의 sample을 측정 길이가 16mm가 되게 지그에 물린 후 0.02N의 힘으로 당겨지도록 설정하고, 승온 속도를 5℃/분으로 하여 300℃까지 상승(1차 승온)시킨후 이를 50℃까지 냉각(1차 냉각)시키고, 다시 450℃까지 승온(2차 승온)시키는 단계에서 100~250℃ 구간에서의 값을 측정한 것이다.At this time, the CTE is set to be pulled with a force of 0.02N after a sample of a thickness of 10μm, width 5mm, length 5cm to the jig so that the measurement length is 16mm, and the temperature increase rate to 5 ℃ / min to rise to 300 ℃ ( After the first temperature rise) and then cooled to 50 ° C (primary cooling), and the temperature is increased to 450 ° C (secondary temperature increase) in the step of measuring the value in the 100 ~ 250 ℃ section.

일 실시예에 따르면, 상기 테트라카르복실산 이무수물의 총 함량과 디아민의 함량의 몰비는 1:0.99 내지 0.99:1 바람직하게는 1:0.98 내지 0.98:1으로 반응되는 것이 바람직할 수 있다.According to one embodiment, the molar ratio of the total content of the tetracarboxylic dianhydride and the content of the diamine may be preferably 1: 0.99 to 0.99: 1, preferably 1: 0.98 to 0.98: 1.

상기 테트라카르복실산 이무수물은 일반적으로 폴리이미드 제조에 사용되는 것이면 어느 것이라도 사용될 수 있다. 예를 들면, 폴리이미드의 제조에 사용가능한 테트라카르복실산 이무수물은 분자내 방향족, 지환족, 또는 지방족의 4가 유기기나, 또는 이들의 조합기로서, 지방족, 지환족 또는 방향족의 4가 유기기가 가교구조를 통해 서로 연결된 4가 유기기를 포함하는 테트라카르복실산 이무수물일 수 있다. 예를 들면, 하기 화학식 2a 내지 2e의 4가 유기기 및 이들의 조합으로 이루어진 군에서 선택되는 4가 유기기 구조를 포함하는 테트라카르복실산 이무수물일 수 있다.The tetracarboxylic dianhydride may be used as long as it is generally used for the production of polyimide. For example, tetracarboxylic dianhydrides usable in the production of polyimides are tetravalent organic groups of aromatic, cycloaliphatic, or aliphatic in the molecule, or combinations thereof, and aliphatic, cycloaliphatic, or aromatic tetravalent organic groups. It may be tetracarboxylic dianhydride including tetravalent organic groups connected to each other via a crosslinked structure. For example, it may be a tetracarboxylic dianhydride including a tetravalent organic group structure selected from the group consisting of tetravalent organic groups of Formulas 2a to 2e and combinations thereof.

[화학식 2a][Formula 2a]

Figure PCTKR2018000810-appb-I000016
Figure PCTKR2018000810-appb-I000016

[화학식 2b][Formula 2b]

Figure PCTKR2018000810-appb-I000017
Figure PCTKR2018000810-appb-I000017

[화학식 2c][Formula 2c]

Figure PCTKR2018000810-appb-I000018
Figure PCTKR2018000810-appb-I000018

[화학식 2d][Formula 2d]

Figure PCTKR2018000810-appb-I000019
Figure PCTKR2018000810-appb-I000019

[화학식 2e][Formula 2e]

Figure PCTKR2018000810-appb-I000020
Figure PCTKR2018000810-appb-I000020

상기 화학식 2a 내지 2e에서, 상기 R11내지 R17는 각각 독립적으로 수소 원자, 할로겐 원자(-F, -Cl, -Br 및 -I에서 선택) 하이드록실기(-OH), 티올기(-SH), 니트로기(-NO2), 시아노기, 탄소수 1 내지 10의 알킬기, 탄소수 1 내지 4의 할로게노알콕시, 탄소수 1 내지 10의 할로게노알킬, 탄소수 6 내지 20의 아릴기에서 선택되는 치환기일 수 있고,In Formulas 2a to 2e, R 11 to R 17 each independently represent a hydrogen atom, a halogen atom (selected from -F, -Cl, -Br, and -I), a hydroxyl group (-OH), and a thiol group (-SH ), A nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenoalkoxy having 1 to 4 carbon atoms, a halogenoalkyl having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms Can,

상기 a1은 0 내지 2의 정수, a2는 0 내지 4의 정수, a3는 0 내지 8의 정수,A1 is an integer of 0 to 2, a2 is an integer of 0 to 4, a3 is an integer of 0 to 8,

a4 및 a5는 각각 독립적으로 0 내지 3의 정수, a6 및 a9는 각각 독립적으로 0 내지 3의 정수, 그리고 a7 및 a8은 각각 독립적으로 0 내지 9의 정수일 수 있으며, 그리고a4 and a5 may each independently represent an integer of 0 to 3, a6 and a9 may each independently represent an integer of 0 to 3, and a7 and a8 may each independently represent an integer of 0 to 9, and

상기 A11 및 A12는 각각 독립적으로 단일결합, -O-, -CR18R19-, -C(=O)-, -C(=O)NH-, -S-, -SO2-, 페닐렌기 및 이들의 조합으로 이루어진 군에서 선택되는 것일 수 있으며, 이때 상기 R18 및 R19는 각각 독립적으로 수소원자, 탄소수 1 내지 10의 알킬기 및 탄소수 1 내지 10의 플로오로알킬기로 이루어진 군으로부터 선택되는 것 일 수 있다.A 11 and A 12 are each independently a single bond, -O-, -CR 18 R 19- , -C (= 0)-, -C (= 0) NH-, -S-, -SO 2- , It may be selected from the group consisting of a phenylene group and combinations thereof, wherein R 18 and R 19 are each independently selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms and a fluoroalkyl group having 1 to 10 carbon atoms Can be.

예를 들면, 본 발명에 사용되는 테트라카르복실산 이무수물은 구조 내에 하기 3a 내지 3r로 이루어진 군에서 선택되는 4가 유기기를 포함하는 테트라카르복실산 이무수물이 사용될 수 있으나 이에 한정하는 것은 아니다.For example, tetracarboxylic dianhydride used in the present invention may be used in the structure, but tetracarboxylic dianhydride including a tetravalent organic group selected from the group consisting of 3a to 3r, but is not limited thereto.

Figure PCTKR2018000810-appb-I000021
Figure PCTKR2018000810-appb-I000021

상기 3l에서, A2는 단일결합, -O-, -C(=O)-, -C(=O)NH-, -S-, -SO2-, 페닐렌기 및 이들의 조합으로 이루어진 군에서 선택되는 것 일 수 있으며, v는 0 또는 1의 정수이고, 상기 3r에서 x는 1 내지 10의 정수이다.In 3l, A 2 is a single bond, -O-, -C (= 0)-, -C (= 0) NH-, -S-, -SO 2- , a phenylene group and a combination thereof May be selected, v is an integer of 0 or 1, and in 3r x is an integer of 1 to 10.

또한, 상기 3a 내지 3r의 4가 유기기 내에 존재하는 1 이상의 수소 원자는 -F, -Cl, -Br 및 -I으로 이루어진 군에서 선택되는 할로겐 원자, 하이드록실기(-OH), 티올기(-SH), 니트로기(-NO2), 시아노기, 탄소수 1 내지 10의 알킬기, 탄소수 1 내지 4의 할로게노알콕시, 탄소수 1 내지 10의 할로게노알킬, 탄소수 6 내지 20의 아릴기에서 선택되는 치환기로 치환될 수 있다.Further, at least one hydrogen atom present in the tetravalent organic group of 3a to 3r may be selected from the group consisting of -F, -Cl, -Br and -I, a halogen atom, a hydroxyl group (-OH), a thiol group ( -SH), a nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenoalkoxy having 1 to 4 carbon atoms, a halogenoalkyl having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms It may be substituted with a substituent.

본 발명은 상기 화학식 1의 디아민 이외에 다른 종류의 디아민이 더 사용될 수 있으며, 상기 디아민은 일반적으로 폴리이미드 제조에 사용되는 것이면 어느 것이라도 사용될 수 있으며, 구체적으로, 지방족, 지환족 또는 방향족의 2가 유기기이거나, 또는 이들의 조합기로서, 지방족, 지환족 또는 방향족의 2가 유기기가 직접 연결되거나, 또는 가교구조를 통해 서로 연결된 2가 유기기일 수 있고, 예를 들면, 하기 화학식 4a 내지 4g의 2가 유기기 및 이들의 조합으로 이루어진 군에서 선택되는 2가 유기기 구조를 포함하는 디아민일 수 있다.In the present invention, other types of diamines may be used in addition to the diamine of Chemical Formula 1, and the diamine may be used as long as it is generally used for preparing polyimide, and specifically, an aliphatic, alicyclic or aromatic divalent compound. As an organic group or a combination group thereof, an aliphatic, alicyclic or aromatic divalent organic group may be directly connected or a divalent organic group connected to each other through a crosslinking structure, for example, 2 of Formulas 4a to 4g It may be a diamine containing a divalent organic group structure selected from the group consisting of a divalent organic group and a combination thereof.

[화학식 4a][Formula 4a]

Figure PCTKR2018000810-appb-I000022
Figure PCTKR2018000810-appb-I000022

[화학식 4b][Formula 4b]

Figure PCTKR2018000810-appb-I000023
Figure PCTKR2018000810-appb-I000023

[화학식 4c][Formula 4c]

Figure PCTKR2018000810-appb-I000024
Figure PCTKR2018000810-appb-I000024

[화학식 4d][Formula 4d]

Figure PCTKR2018000810-appb-I000025
Figure PCTKR2018000810-appb-I000025

[화학식 4e][Formula 4e]

Figure PCTKR2018000810-appb-I000026
Figure PCTKR2018000810-appb-I000026

상기 화학식 4a 내지 4e에서 In Chemical Formulas 4a to 4e

R21 내지 R28은 각각 독립적으로 탄소수 1 내지 10의 알킬기(예를 들면, 메틸기, 에틸기, 프로필기, 이소프로필기, n-부틸기, tert-부틸기, 펜틸기 등), 할로겐기, 히드록시기, 카르복시기, 탄소수 1 내지 10의 알콕시기(예를 들면, 메톡시기, 에톡시기, 프로폭시기, tert-부톡시기 등) 및 탄소수 1 내지 10의 플루오로알킬기(예를 들면, 트리플루오로메틸기 등)로 이루어진 군에서 선택될 수 있으며,R 21 to R 28 each independently represent an alkyl group having 1 to 10 carbon atoms (for example, methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, tert-butyl group, pentyl group, etc.), halogen group and hydroxy group Carboxyl groups, alkoxy groups having 1 to 10 carbon atoms (e.g., methoxy groups, ethoxy groups, propoxy groups, tert-butoxy groups, etc.), and fluoroalkyl groups having 1 to 10 carbon atoms (e.g., trifluoromethyl groups, etc.) ) Can be selected from the group consisting of

또, A21 및 A22는 각각 독립적으로 단일결합, -O-, -CR'R"-(이때, R' 및 R"은 각각 독립적으로 수소 원자, 탄소수 1 내지 10의 알킬기(예를 들면, 메틸기, 에틸기, 프로필기, 이소프로필기, n-부틸기, tert-부틸기, 펜틸기 등) 및 탄소수 1 내지 10의 할로알킬기(예를 들면, 트리플루오로메틸기 등)로 이루어진 군으로부터 선택되는 것임), -C(=O)-, -C(=O)O-, -C(=O)NH-, -S-, -SO-, -SO2-, -O[CH2CH2O]y-(y는1 내지 44의 정수임), -NH(C=O)NH-, -NH(C=O)O-, 탄소수 6 내지 18의 일환식 또는 다환식의 시클로알킬렌기(예를 들면, 시클로헥실렌기 등), 탄소수 6 내지 18의 일환식 또는 다환식의 아릴렌기(예를 들면, 페닐렌기, 나프탈렌기, 플루오레닐렌기 등), 및 이들의 조합으로 이루어진 군에서 선택될 수 있고,In addition, A 21 and A 22 are each independently a single bond, -O-, -CR'R "-(wherein R 'and R" are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms (e.g., Methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, tert-butyl group, pentyl group, etc.) and a C1-C10 haloalkyl group (for example, trifluoromethyl group etc.) ), -C (= O)-, -C (= O) O-, -C (= O) NH-, -S-, -SO-, -SO 2- , -O [CH 2 CH 2 O ] y- (y is an integer from 1 to 44), -NH (C = O) NH-, -NH (C = O) O-, a monocyclic or polycyclic cycloalkylene group having 6 to 18 carbon atoms (e.g. For example, a cyclohexylene group, etc.), a monocyclic or polycyclic arylene group having 6 to 18 carbon atoms (e.g., a phenylene group, a naphthalene group, a fluorenylene group, etc.), and combinations thereof may be selected. Can,

b1, b4 및 b5는 각각 독립적으로 0 내지 4의 정수이고, b2는 0 내지 6의 정수이며, b3은 0 내지 3의 정수이고, b6 및 b9는 각각 독립적으로 0 또는 1의 정수이고, b7 및 b8는 각각 독립적으로 0 내지 10의 정수이다. b 1 , b 4 and b 5 are each independently an integer from 0 to 4, b 2 is an integer from 0 to 6, b 3 is an integer from 0 to 3, b 6 and b 9 are each independently 0 or is an integer of 1, b 7, and 8 b are each independently an integer of 0 to 10.

예를 들면, 본 발명에 사용되는 디아민은 구조내에 하기 화학식 5a 내지 5t로 이루어진 군에서 선택되는 2가 유기기를 포함하는 디아민이 더 사용될 수 있으나 이에 한정하는 것은 아니다.For example, the diamine used in the present invention may further be a diamine including a divalent organic group selected from the group consisting of the formulas 5a to 5t in the structure, but is not limited thereto.

Figure PCTKR2018000810-appb-I000027
Figure PCTKR2018000810-appb-I000027

상기 5a 내지 5t의 2가 유기기 내에 존재하는 1 이상의 수소 원자는 -F, -Cl, -Br 및 -I로부터 선택되는 할로겐 원자, 하이드록실기(-OH), 티올기(-SH), 니트로기(-NO2), 시아노기, 탄소수 1 내지 10의 알킬기, 탄소수 1 내지 4의 할로게노알콕시, 탄소수 1 내지 10의 할로게노알킬, 탄소수 6 내지 20의 아릴기에서 선택되는 치환기로 치환될 수 있다.The at least one hydrogen atom present in the divalent organic group of 5a to 5t is a halogen atom selected from -F, -Cl, -Br and -I, hydroxyl group (-OH), thiol group (-SH), nitro Or a substituent selected from a group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenoalkoxy having 1 to 4 carbon atoms, a halogenoalkyl having 1 to 10 carbon atoms, and an aryl group having 6 to 20 carbon atoms. have.

일 실시예에 따르면, According to one embodiment,

상기 중합성분은 화학식 1a 내지 1e에서 선택되는 디아민과 함께 하기 화학식 6의 디아민을 더 포함할 수 있다.The polymerization component may further include a diamine of the following Chemical Formula 6 together with the diamine selected from Chemical Formulas 1a to 1e.

[화학식 6][Formula 6]

Figure PCTKR2018000810-appb-I000028
Figure PCTKR2018000810-appb-I000028

상기 화학식 6에 있어서,In Chemical Formula 6,

상기 R31 및 R32는 각각 독립적으로 -F, -Cl, -Br 및 -I로부터 선택되는 할로겐 원자, 하이드록실기(-OH), 티올기(-SH), 니트로기(-NO2), 시아노기, 탄소수 1 내지 10의 알킬기, 탄소수 1 내지 4의 할로게노알콕시, 탄소수 1 내지 10의 할로게노알킬, 탄소수 6 내지 20의 아릴기에서 선택되는 치환체이고,R 31 and R 32 are each independently a halogen atom selected from -F, -Cl, -Br and -I, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2 ), A substituent selected from a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenoalkoxy having 1 to 4 carbon atoms, a halogenoalkyl having 1 to 10 carbon atoms, and an aryl group having 6 to 20 carbon atoms,

n 및 m은 각각 독립적으로 0 내지 4의 정수이다.n and m are each independently an integer of 0-4.

Q1은 단일결합, -O-, -CR18R19-, -C(=O)-, -C(=O)O-, -C(=O)NH-, -S-, -SO2-, 페닐렌기 및 이들의 조합으로 이루어진 군에서 선택되는 것이며, 이때 상기 R18 및 R19는 각각 독립적으로 수소원자, 탄소수 1 내지 10의 알킬기 및 탄소수 1 내지 10의 플루오로알킬기로 이루어진 군으로부터 선택되는 것이다.Q 1 is a single bond, -O-, -CR 18 R 19- , -C (= O)-, -C (= O) O-, -C (= O) NH-, -S-, -SO 2 -A phenylene group and combinations thereof, wherein R 18 and R 19 are each independently selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms and a fluoroalkyl group having 1 to 10 carbon atoms Will be.

상기 테트라카르복실산이무수물을 디아민과 반응시키는 방법은 용액 중합 등 통상의 폴리이미드 전구체 중합 제조방법에 따라 실시할 수 있으며. 구체적으로는, 디아민을 유기 용매 중에 용해시킨 후, 결과로 수득된 혼합용액에 테트라카르복실산이무수물을 첨가하여 중합반응시켜 폴리이미드 전구체인 폴리아믹산이 제조될 수 있다.The method for reacting the tetracarboxylic dianhydride with the diamine can be carried out according to a conventional polyimide precursor polymerization production method such as solution polymerization. Specifically, after dissolving diamine in an organic solvent, tetracarboxylic dianhydride is added to the resulting mixed solution and polymerized to produce a polyamic acid as a polyimide precursor.

상기 반응은 비활성 기체 또는 질소 기류 하에 실시될 수 있으며, 무수 조건에서 실행될 수 있다.The reaction can be carried out under an inert gas or nitrogen stream and can be carried out in anhydrous conditions.

또한, 상기 중합반응시 온도는 -20 내지 60℃, 바람직하게는 0 내지 45℃에서 실시될 수 있다. 반응온도가 너무 높을 경우 반응성이 높아져 분자량이 커질 수 있으며, 전구체 조성물의 점도가 상승함으로써 공정상으로 불리할 수 있다.In addition, the polymerization temperature may be carried out at -20 to 60 ℃, preferably 0 to 45 ℃. If the reaction temperature is too high, the reactivity may be increased to increase the molecular weight, it may be disadvantageous in terms of the process by increasing the viscosity of the precursor composition.

상기 중합반응에 사용될 수 있는 유기용매로는 구체적으로, γ-부티로락톤, 1,3-디메틸-이미다졸리디논, 메틸에틸케톤, 시클로헥사논, 시클로펜타논, 4-하이드록시-4-메틸-2-펜타논 등의 케톤류; 톨루엔, 크실렌, 테트라메틸벤젠 등의 방향족 탄화수소류; 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노메틸 에테르, 에틸렌글리콜모노부틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노부틸에테르, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노에틸에테르, 디프로필렌글리콜디에틸에테르, 트리에틸렌글리콜모노에틸에테르 등의 글리콜에테르류(셀로솔브); 아세트산에틸, 아세트산부틸, 에틸렌글리콜모노에틸에테르아세테이트, 에틸렌글리콜모노부틸에테르아세테이트, 디에틸렌글리콜모노에틸에테르아세테이트, 디프로필렌글리콜모노메틸에테르아세테이트, 에탄올, 프로판올, 에틸렌글리콜, 프로필렌글리콜, 카르비톨, 디메틸아세트아미드(DMAc), N,N-디에틸아세트아미드, 디메틸포름아미드(DMF), 디에틸포름아미드(DEF), N-메틸피롤리돈(NMP), N-에틸피롤리돈(NEP), 1,3-디메틸-2-이미다졸리디논, N,N-디메틸메톡시아세트아미드, 디메틸술폭사이드, 피리딘, 디메틸술폰, 헥사메틸포스포르아미드, 테트라메틸우레아, N-메틸카프로락탐, 테트라히드로퓨란, m-디옥산, P-디옥산, 1,2-디메톡시에탄, 비스(2-메톡시에틸)에테르, 1,2-비스(2-메톡시에 톡시)에탄, 비스[2-(2-메톡시에톡시)]에테르 및 이들의 혼합물로 이루어진 군에서 선택되는 것이 사용될 수 있다.As the organic solvent that can be used in the polymerization reaction, specifically, γ-butyrolactone, 1,3-dimethyl-imidazolidinone, methyl ethyl ketone, cyclohexanone, cyclopentanone, 4-hydroxy-4- Ketones such as methyl-2-pentanone; Aromatic hydrocarbons such as toluene, xylene and tetramethylbenzene; Ethylene glycol monoethyl ether, ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, diethylene glycol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether Glycol ethers (cellosolve) such as dipropylene glycol diethyl ether and triethylene glycol monoethyl ether; Ethyl acetate, butyl acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, dipropylene glycol monomethyl ether acetate, ethanol, propanol, ethylene glycol, propylene glycol, carbitol, dimethyl Acetamide (DMAc), N, N-diethylacetamide, dimethylformamide (DMF), diethylformamide (DEF), N-methylpyrrolidone (NMP), N-ethylpyrrolidone (NEP), 1,3-dimethyl-2-imidazolidinone, N, N-dimethylmethoxyacetamide, dimethyl sulfoxide, pyridine, dimethyl sulfone, hexamethylphosphoramide, tetramethylurea, N-methylcaprolactam, tetrahydro Furan, m-dioxane, P-dioxane, 1,2-dimethoxyethane, bis (2-methoxyethyl) ether, 1,2-bis (2-methoxyethoxy) ethane, bis [2- ( 2-methoxyethoxy)] ether and mixtures thereof To choose books that can be used.

바람직하게는, 디메틸술폭시드, 디에틸술폭시드 등의 술폭시드계 용매, N,N-디메틸포름아미드, N,N-디에틸포름아미드 등의 포름아미드계 용매, N,N-디메틸아세트아미드, N,N-디에틸아세트아미드 등의 아세트아미드계 용매, N-메틸-2-피롤리돈, N-비닐-2-피롤리돈 등의 피롤리돈계 용매, 페놀, o-, m- 또는 p-크레졸, 크시레놀, 할로겐화 페놀, 카테콜 등의 페놀계 용매, 혹은 헥사메틸포스포르아미드, γ-부티로락톤 등을 들 수 있고, 이들을 단독 또는 혼합물로서 이용할 수 있으며, 보다 바람직하게는 N,N-디에틸아세트아마이드(N,N-diethylacetamide, DEAc), N,N-디에틸포름아마이드(N,N-diethylformamide, DEF), N-에틸피롤리돈(N-ethylpyrrolidone, NEP) 또는 이들의 혼합물 중에서 선택되는 것일 수 있다.Preferably, sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide, formamide solvents such as N, N-dimethylformamide, N, N-diethylformamide, N, N-dimethylacetamide, Acetamide solvents such as N, N-diethylacetamide, pyrrolidone solvents such as N-methyl-2-pyrrolidone and N-vinyl-2-pyrrolidone, phenol, o-, m- or p Phenol solvents such as cresol, xylenol, halogenated phenol, catechol, or hexamethylphosphoramide, γ-butyrolactone, and the like, and these may be used alone or as a mixture, more preferably N, N-diethylacetamide (N, N-diethylacetamide, DEAc), N, N-diethylformamide (DEF), N-ethylpyrrolidone (NEP) or their It may be selected from the mixture.

일 실시예에 따르면, 상기 유기용매는 크실렌, 톨루엔과 같은 방향족 탄화수소를 더 사용할 수도 있으며, 또한 폴리머의 용해를 촉진시키기 위해서 상기 용매에 상기 용매 총량에 대하여 약 50 중량% 이하의 알칼리 금속염 또는 알칼리 토류금속염을 더 첨가할 수도 있다.According to one embodiment, the organic solvent may further use an aromatic hydrocarbon such as xylene, toluene, and also up to about 50% by weight of alkali metal salt or alkaline earth in the solvent to promote dissolution of the polymer. Further metal salts may be added.

상기한 제조방법에 따라 제조된 폴리이미드 전구체 용액은 필름 형성 공정시의 도포성 등의 공정성을 고려하여 상기 조성물이 적절한 점도를 갖도록 하는 양으로 고형분을 포함하는 것이 바람직하다. 일 실시예에 따르면, 전체 폴리이미드 전구체의 함량이 5 내지 20 중량%가 되도록 상기 조성물의 함량을 조절할 수 있으며, 바람직하게는 8 내지 18 중량%, 보다 바람직하게는 8 내지 12 중량%로 조절할 수 있다. It is preferable that the polyimide precursor solution manufactured by the above-mentioned manufacturing method contains solid content in the quantity which makes the said composition have appropriate viscosity in consideration of processability, such as applicability | paintability in the film formation process. According to one embodiment, the content of the composition may be adjusted such that the total polyimide precursor is 5 to 20% by weight, preferably 8 to 18% by weight, more preferably 8 to 12% by weight. have.

또는, 상기 폴리이미드 전구체 용액이 2,000cP 이상, 혹은 3,000cP 이상의 점도를 갖도록 조절하는 것일 수 있으며, 상기 폴리이미드 전구체 용액의 점도는 10,000cP 이하, 바람직하게는 9,000cP 이하, 보다 바람직하게는 8,000cP 이하의 점도를 갖도록 조절하는 것이 바람직하다. 폴리이미드 전구체 용액의 점도가 10,000cP를 초과할 경우 폴리이미드 필름 가공시 탈포의 효율성이 저하됨으로써, 공정상의 효율뿐만 아니라, 제조된 필름은 기포발생으로 표면조도가 좋지 않아 전기적, 광학적, 기계적 특성이 저하될 수 있다.Alternatively, the polyimide precursor solution may be adjusted to have a viscosity of 2,000 cP or more, or 3,000 cP or more, and the viscosity of the polyimide precursor solution may be 10,000 cP or less, preferably 9,000 cP or less, and more preferably 8,000 cP. It is preferable to adjust so that it may have the following viscosity. When the viscosity of the polyimide precursor solution exceeds 10,000 cP, the efficiency of degassing during the processing of the polyimide film is lowered. As a result, not only the efficiency of the process but also the resulting film has poor surface roughness due to foaming, resulting in electrical, optical and mechanical properties. Can be degraded.

또, 본 발명에 따른 폴리이미드는 10,000 내지 200,000g/mol, 혹은 20,000 내지 100,000g/mol, 혹은 30,000 내지 100,000 g/mol의 중량평균 분자량을 갖는 것일 수 있다.또한, 본 발명에 따른 폴리이미드의 분자량 분포(Mw/Mn)는 1.1 내지 2.5 인 것이 바람직하다. 폴리이미드의 중량평균 분자량 또는 분자량 분포가 상기 범위를 벗어날 경우 필름 형성이 어려울 수 있거나 또는 투과도, 내열성 및 기계적 특성 등 폴리이미드계 필름의 특성이 저하될 우려가 있다.Further, the polyimide according to the present invention may have a weight average molecular weight of 10,000 to 200,000 g / mol, or 20,000 to 100,000 g / mol, or 30,000 to 100,000 g / mol. It is preferable that molecular weight distribution (Mw / Mn) is 1.1-2.5. If the weight average molecular weight or molecular weight distribution of the polyimide is out of the above range, it may be difficult to form a film or the characteristics of the polyimide film such as permeability, heat resistance and mechanical properties may be deteriorated.

이어서 상기 중합반응의 결과로 수득된 폴리이미드 전구체를 이미드화 시킴으로써, 투명 폴리이미드 필름을 제조할 수 있다. 이때, 상기 이미드화 공정은 구체적으로 화학 이미드화 또는 열 이미드화 방법이 있을 수 있다.Subsequently, the polyimide precursor obtained as a result of the polymerization reaction is imidated, whereby a transparent polyimide film can be produced. In this case, the imidization process may specifically include a chemical imidization method or a thermal imidization method.

예를 들면, 상기 중합된 폴리이미드 전구체 용액에 탈수제 및 이미드화 촉매를 첨가한 후 50 내지 100℃ 의 온도로 가열하여 화학적 반응에 의해 이미드화 시키거나, 또는 상기 용액을 환류시키면서 알코올을 제거하여 이미드화 시키는 방법으로 폴리이미드를 얻을 수 있다.For example, a dehydrating agent and an imidization catalyst are added to the polymerized polyimide precursor solution, and then heated to a temperature of 50 to 100 ° C. to imidize by chemical reaction, or the alcohol is removed while refluxing the solution. Polyimide can be obtained by the method of drawing.

상기 화학 이미드화 방법에서, 상기 이미드화 촉매로서, 피리딘, 트리에틸아민, 피콜린 또는 퀴놀린 등을 사용될 수 있으며, 그 외에도, 치환 또는 비치환의 질소 함유 복소환 화합물, 질소 함유 복소환 화합물의 N-옥시드 화합물, 치환 또는 비치환의 아미노산 화합물, 하이드록실기를 가지는 방향족 탄화수소 화합물 또는 방향족 복소환상 화합물이 있으며, 특히 1,2-디메틸이미다졸, N-메틸이미다졸, N-벤질-2-메틸이미다졸, 2-메틸이미다졸, 2-에틸-4-메틸이미다졸, 5-메틸벤즈이미다졸 등의 저급 알킬이미다졸, 이소퀴놀린, 3,5-디메틸피리딘, 3,4-디메틸피리딘, 2,5-디메틸피리딘, 2,4-디메틸피리딘, 4-n-프로필피리딘 등의 치환 피리딘, p-톨루엔술폰산 등이 사용될 수도 있다.In the chemical imidization method, pyridine, triethylamine, picoline, or quinoline may be used as the imidization catalyst, and in addition, N- of substituted or unsubstituted nitrogen-containing heterocyclic compounds and nitrogen-containing heterocyclic compounds Oxide compounds, substituted or unsubstituted amino acid compounds, aromatic hydrocarbon compounds having a hydroxyl group or aromatic heterocyclic compounds, and especially 1,2-dimethylimidazole, N-methylimidazole, N-benzyl-2- Lower alkylimidazoles such as methylimidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, 5-methylbenzimidazole, isoquinoline, 3,5-dimethylpyridine, 3,4 Substituted pyridines such as -dimethylpyridine, 2,5-dimethylpyridine, 2,4-dimethylpyridine, 4-n-propylpyridine, p-toluenesulfonic acid and the like may also be used.

상기 탈수제로서는 아세트산 무수물 등의 산무수물이 사용될 수 있다.As the dehydrating agent, acid anhydrides such as acetic anhydride can be used.

또는, 상기 폴리이미드 전구체 용액을 기판 상에 도포한 후 열처리하는 방법으로 이미드화 할 수 있다.Alternatively, the polyimide precursor solution may be imidized by applying a heat treatment on a substrate.

상기 폴리이미드 전구체 용액은 유기용매 중에 용해된 용액의 형태일 수 있으며, 이러한 형태를 갖는 경우, 예를 들어 폴리이미드 전구체를 유기용매 중에서 합성한 경우에는, 용액은 얻어지는 반응용액 그 자체여도 되고, 또 이 반응 용액을 다른 용매로 희석한 것이어도 된다. 또, 폴리이미드 전구체를 고형 분말로서 얻은 경우에는, 이것을 유기 용매에 용해시켜 용액으로 한 것이어도 된다.The polyimide precursor solution may be in the form of a solution dissolved in an organic solvent, and in the case of having such a form, for example, when a polyimide precursor is synthesized in an organic solvent, the solution may be the reaction solution itself obtained. The reaction solution may be diluted with another solvent. Moreover, when a polyimide precursor is obtained as a solid powder, it may be made to melt | dissolve this in the organic solvent and set it as the solution.

본 발명은 상기 폴리이미드 전구체 용액을 기판상에 도포하는 단계;The present invention comprises the steps of applying the polyimide precursor solution on a substrate;

상기 도포된 폴리이미드 전구체 용액을 열처리하는 단계를 포함하는 폴리이미드 필름의 제조방법을 제공한다.It provides a method for producing a polyimide film comprising the step of heat-treating the applied polyimide precursor solution.

상기 폴리이미드 전구체 용액을 기판에 도포하고, IR오븐, 열풍오븐이나 핫 플레이트 위에서 열처리되며, 이때, 상기 열처리 온도는 300 내지 500℃ , 바람직하게는 320 내지 480℃ 온도범위일 수 있으며, 상기 온도범위 내에서 다단계 가열처리로 진행될 수도있다. 상기 열처리 공정은 20분 내지 70분 동안 진행될 수 있으며, 바람직하게는 20분 내지 60분 정도의 시간동안 진행될 수 있다.The polyimide precursor solution is applied to a substrate and heat-treated on an IR oven, a hot air oven or a hot plate, wherein the heat treatment temperature may be in the range of 300 to 500 ° C, preferably 320 to 480 ° C, and the temperature range It can also be carried out in a multistage heating process. The heat treatment process may be carried out for 20 to 70 minutes, preferably for 20 to 60 minutes.

본 발명의 폴리이미드 전구체 용액에 함유되는 상기 유기용매는, 상기 합성 반응시 사용되는 유기용매와 동일한 것이 사용될 수 있다.The organic solvent contained in the polyimide precursor solution of the present invention may be the same as the organic solvent used in the synthesis reaction.

본 발명은, 효과에 손상되지 않는 범위이면 실란 커플링제, 가교성 화합물, 이미드화를 효율적으로 진행시킬 목적으로 이미드화 촉진제 등을 첨가해도 된다.As long as this invention is a range which does not impair an effect, you may add an imidation promoter etc. for the purpose of advancing a silane coupling agent, a crosslinkable compound, and imidation efficiently.

또, 상기 폴리이미드계 필름은 헤이즈(Haze)가 1 이하, 바람직하게는 0.9 이하, 또는 0.7이하, 보다 바람직하게는 0.5 이하의 값을 가져, 투명성이 개선된 폴리이미드 필름을 제공할 수 있다. 이때, 상기 폴리이미드 필름의 두께는 8 내지 15㎛일 수 있으며, 바람직하게는 10 내지 12㎛일 수 있다.In addition, the polyimide-based film has a haze value of 1 or less, preferably 0.9 or less, or 0.7 or less, and more preferably 0.5 or less, thereby providing a polyimide film having improved transparency. At this time, the thickness of the polyimide film may be 8 to 15㎛, preferably 10 to 12㎛.

또한, 5 내지 30㎛의 필름 두께 범위에서 380 내지 760nm 파장의 빛에 대한 투과도가 80% 이상이며, 황색도(YI)가 약 25 이하, 바람직하게는 약 20 이하, 보다 바람직하게는 약 16 이하, 혹은 15 이하의 값을 갖는 무색 투명 폴리이미드 필름일 수 있다. 상기와 같이 우수한 광 투과도 및 황색도를 가짐으로써 현저히 개선된 투명도 및 광학특성을 나타낼 수 있다. In addition, the transmittance of light with a wavelength of 380 to 760 nm in the film thickness range of 5 to 30 μm is 80% or more, and the yellowness (YI) is about 25 or less, preferably about 20 or less, and more preferably about 16 or less. Or a colorless transparent polyimide film having a value of 15 or less. By having excellent light transmittance and yellowness as described above it can exhibit a markedly improved transparency and optical properties.

또한, 상기 폴리이미드계 필름은 면내 위상차값(Rin)이 약 0 내지 100nm이고, 두께 방향의 위상차값(Rth)의 절대값이 약 1500nm 이하, 또는 0 내지 1000nm 이하 바람직하게는 30 내지 800nm 이하, 보다 바람직하게는 50 내지 700nm 이하 일 수 있다. 상기 두께 방향의 위상차 범위에서 디스플레이에 적합한 시감성을 발현할 수 있으며, 두께방향 위상차가 1500nm 이상일 경우 폴리이미드 필름에서 위상차가 발생하여 빛이 왜곡되어 보이게 됨으로써, 시감성이 현저히 저하될 수 있다.In addition, the polyimide film has an in-plane retardation value R in of about 0 to 100 nm, and an absolute value of the retardation value R th in the thickness direction is about 1500 nm or less, or 0 to 1000 nm or less, preferably 30 to 800 nm. Or less, more preferably, 50 to 700 nm or less. Visibility suitable for a display may be expressed in the phase difference range in the thickness direction, and when the thickness direction phase difference is 1500 nm or more, a phase difference occurs in the polyimide film so that light is distorted and thus visibility may be significantly reduced.

본 발명의 또 다른 일 구현예에에서는, 상기 폴리이미드 공중합체를 포함하는 성형품(article)을 제공한다.In still another embodiment of the present invention, an article including the polyimide copolymer is provided.

상기 성형품은 필름, 섬유(fiber), 코팅재, 접착재 등일 수 있으나, 이에 한정되는 것은 아니다. 상기 성형품은 상기 공중합체와 무기입자의 복합체 조성물을 사용하여 건습식법, 건식법, 습식법 등으로 형성할 수 있으나, 이에 한정되는 것은 아니다. 구체적으로, 상기에서 설명한 바와 같이, 상기 성형품은 광학 필름일 수 있고, 이 경우, 상기 폴리이미드 공중합체를 포함하는 조성물은, 기판상에 스핀 코팅 등의 방법으로 적용된 후, 이를 건조 및 경화함으로써 용이하게 제조될 수 있다.The molded article may be a film, a fiber, a coating material, an adhesive material, but is not limited thereto. The molded article may be formed by a dry wet method, a dry method, a wet method, etc. using the composite composition of the copolymer and the inorganic particles, but is not limited thereto. Specifically, as described above, the molded article may be an optical film, in which case, the composition comprising the polyimide copolymer is applied to the substrate by a method such as spin coating, and then easily dried and cured. Can be prepared.

본 발명에 따른 폴리이미드는 고열 공정시에 발생할 수 있는 열 변화에 대해 우수한 내열성을 나타낼 수 있어, 소자용 기판, 디스플레이용 커버기판, 광학 필름(optical film), IC(integrated circuit) 패키지, 점착 필름(adhesive film), 다층 FPC(flexible printed circuit), 테이프, 터치패널, 광디스크용 보호필름 등과 같은 다양한 분야에 사용될 수 있다. The polyimide according to the present invention may exhibit excellent heat resistance against thermal changes that may occur in a high temperature process, such as an element substrate, a display cover substrate, an optical film, an integrated circuit (IC) package, and an adhesive film. (adhesive film), multilayer FPC (flexible printed circuit), tape, a touch panel, a protective film for an optical disk, etc. can be used in various fields.

본 발명의 또 다른 일 구현예에 따르면 상기 성형품을 포함하는 디스플레이 장치를 제공한다. 구체적으로는 상기 디스플레이 장치는 액정 표시 장치(liquid crystal display device, LCD), 유기발광다이오드(organic light emitting diode, OLED) 등을 들 수 있으며, 특히 고온 공정을 필요로 하는 LTPS(low temperature polysilicon) 공정을 사용하는 OLED 디바이스에 적합할 수 있으나, 이에 한정되는 것은 아니다.According to another embodiment of the present invention provides a display device including the molded article. Specifically, the display device may include a liquid crystal display device (LCD), an organic light emitting diode (OLED), and the like, and in particular, a low temperature polysilicon (LTPS) process requiring a high temperature process It may be suitable for an OLED device using, but is not limited thereto.

이하, 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 용이하게 실시할 수 있도록 본 발명의 실시예에 대하여 상세히 설명한다. 그러나 본 발명은 여러 가지 상이한 형태로 구현될 수 있으며 여기에서 설명하는 실시예에 한정되지 않는다.Hereinafter, embodiments of the present invention will be described in detail so that those skilled in the art can easily practice the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.

<합성예 1>Synthesis Example 1

화학식 10의 디아민 화합물(화합물 10)을 다음과 같이 제조하였다. Diamine compound of formula 10 (Compound 10) was prepared as follows.

Figure PCTKR2018000810-appb-I000029
Figure PCTKR2018000810-appb-I000029

화합물 A(20.0g, 42.4mmol)와 화합물 B(15.7g, 84.8mmol)를 디메틸포름알데하이드(200ml)에 분산시키고 요오드화구리(1.6g, 8.5mmol)를 첨가 12시간 동안 가열 교반하였다. 반응이 종결되면 상온으로 온도를 낮추고 여과하여 얻은 고체를 클로로포름으로 추출 후 농축하여 중간체 물질을 제조하였다. 이 중간체 물질을 테트라하이드로퓨란(100ml)에 완전히 녹인 후 하이드라진 수용액(10ml)을 넣고, 1시간 동안 가열 교반하였다. 반응이 종결되면 상온으로 온도를 낮추고 여과하여 얻은 여액을 물(250mL)에 첨가하여 침전을 생성하였다. 이를 여과하여 화학식 10의 화합물(7.2g, 수율 49%)을 제조하였다. MS[M+H]+= 347Compound A (20.0g, 42.4mmol) and Compound B (15.7g, 84.8mmol) were dispersed in dimethylformaldehyde (200ml), and copper iodide (1.6g, 8.5mmol) was added and stirred for 12 hours. After the reaction was completed, the temperature was lowered to room temperature, and the solid obtained by filtration was extracted with chloroform and concentrated to prepare an intermediate material. This intermediate material was completely dissolved in tetrahydrofuran (100 ml), and then, an aqueous hydrazine solution (10 ml) was added thereto, followed by heating and stirring for 1 hour. After the reaction was completed, the mixture was cooled to room temperature and filtered, and the filtrate was added to water (250 mL) to form a precipitate. Filtration gave a compound of Chemical Formula 10 (7.2 g, 49% yield). MS [M + H] + = 347

[화학식 10] [Formula 10]

Figure PCTKR2018000810-appb-I000030
Figure PCTKR2018000810-appb-I000030

<합성예 2>Synthesis Example 2

화학식 11의 디아민 화합물(화합물 11)을 다음과 같이 제조하였다. The diamine compound of formula 11 (Compound 11) was prepared as follows.

Figure PCTKR2018000810-appb-I000031
Figure PCTKR2018000810-appb-I000031

화합물 A(30.0g, 63.6mmol)와 화합물 C(30.7g, 127.2mmol)를 테트라하이드로퓨란(300ml)에 완전히 녹인 후 1.5M 탄산칼륨수용액(150ml)을 첨가하고, 테트라키스트리페닐-포스피노팔라듐(1.24g, 1.08mmol)을 넣은 후, 4시간 동안 가열 교반하였다. 반응이 종결되면 상온으로 온도를 낮추고 여과하여 얻은 고체를 물(300mL)과 에탄올(300mL)로 세척하여 화학식 11의 화합물(20.0g, 수율 91%)을 제조하였다. MS[M+H]+= 347Compound A (30.0 g, 63.6 mmol) and Compound C (30.7 g, 127.2 mmol) were dissolved completely in tetrahydrofuran (300 ml), and then 1.5 M potassium carbonate solution (150 ml) was added thereto, and tetrakistriphenyl-phosphinopalladium was added. (1.24 g, 1.08 mmol) was added thereto, followed by heating and stirring for 4 hours. When the reaction was terminated to lower the temperature to room temperature and the solid obtained by filtration was washed with water (300mL) and ethanol (300mL) to give a compound of formula 11 (20.0g, 91% yield). MS [M + H] + = 347

[화학식 11][Formula 11]

Figure PCTKR2018000810-appb-I000032
Figure PCTKR2018000810-appb-I000032

<합성예 3>Synthesis Example 3

화학식 12의 디아민 화합물(화합물 12)을 다음과 같이 제조하였다. Diamine compound of formula 12 (Compound 12) was prepared as follows.

Figure PCTKR2018000810-appb-I000033
Figure PCTKR2018000810-appb-I000033

화합물 D(30.0g, 47.2mmol)와 화합물 E(16.3g, 94.4mmol)를 테트라하이드로퓨란(250ml)에 완전히 녹인 후 1.5M 탄산칼륨수용액(100ml)을 첨가하고, 테트라키스트리페닐-포스피노팔라듐(1.0g, 0.87mmol)을 넣은 후, 4시간 동안 가열 교반하였다. 반응이 종결되면 상온으로 온도를 낮추고 여과하여 얻은 고체를 물(200mL)과 에탄올(200mL)로 세척하여 화학식 12의 화합물(30.3g, 수율 97%)을 제조하였다. MS[M+H]+= 663Compound D (30.0 g, 47.2 mmol) and compound E (16.3 g, 94.4 mmol) were completely dissolved in tetrahydrofuran (250 ml), and then 1.5 M aqueous potassium carbonate solution (100 ml) was added, and tetrakistriphenyl-phosphinopalladium was added. (1.0 g, 0.87 mmol) was added and the mixture was heated and stirred for 4 hours. When the reaction was terminated to lower the temperature to room temperature and the solid obtained by filtration was washed with water (200mL) and ethanol (200mL) to prepare a compound of formula 12 (30.3g, 97% yield). MS [M + H] + = 663

[화학식 12][Formula 12]

Figure PCTKR2018000810-appb-I000034
Figure PCTKR2018000810-appb-I000034

<실시예 1><Example 1>

캐리어 기판으로서 무알카리 유리의 일면에, BPDA(3,3,4,4'-비페닐테트라카르복실릭 디안하이드라이드) 1mol, TFDB(2,2'-bis(trifluoromethyl)-[1,1'-biphenyl]-4,4'-diamine) 0.5mol 및 상기 합성예 1에서 제조한 화학식 10의 디아민 0.5mol을 중합시켜 제조한 폴리아믹산계 수지 20중량%와 용매로서 DMAc(디메틸아세트아미드) 80중량%를 포함하는 조성물을 건조후 두께가 10㎛이 되도록 도포하고, 결과로서 제조된 도막에 대해 100℃에서의 건조 공정 및 300℃에서 60분의 경화 공정을 연속적으로 실시하여 플렉서블 기판의 폴리머층 형성용 폴리이미드 필름을 형성하였다.On one surface of the alkali-free glass as a carrier substrate, 1 mol of BPDA (3,3,4,4'-biphenyltetracarboxylic dianhydride), TFDB (2,2'-bis (trifluoromethyl)-[1,1 ' -biphenyl] -4,4'-diamine) 20% by weight of a polyamic acid resin prepared by polymerizing 0.5mol and 0.5mol of the diamine of Formula 10 prepared in Synthesis Example 1 and 80% by weight of DMAc (dimethylacetamide) as a solvent. The composition containing% was applied to a thickness of 10 μm after drying, and the resulting coating film was successively subjected to a drying step at 100 ° C. and a curing step at 300 ° C. for 60 minutes to form a polymer layer of the flexible substrate. The polyimide film for was formed.

<실시예 2><Example 2>

캐리어 기판으로서 무알카리 유리의 일면에, BPDA 1mol 과 상기 합성예 2에서 제조한 화학식 11의 디아민 0.99mol을 중합시켜 제조한 폴리아믹산계 수지 20중량%와 용매로서 DMAc 80중량%를 포함하는 조성물을 건조후 두께가 10㎛ 이 되도록 도포하고, 결과로서 제조된 도막에 대해 100℃에서의 건조 공정 및 300℃에서 60분의 경화 공정을 연속적으로 실시하여 플렉서블 기판의 폴리머층 형성용 폴리이미드 필름을 형성하였다.On one side of the alkali-free glass as a carrier substrate, a composition comprising 20% by weight of polyamic acid-based resin prepared by polymerizing 1 mol of BPDA and 0.99 mol of the diamine of Formula 11 prepared in Synthesis Example 2 and 80% by weight of DMAc as a solvent. After drying, the coating was applied to a thickness of 10 μm, and the resulting coating film was continuously subjected to a drying step at 100 ° C. and a curing step at 300 ° C. for 60 minutes to form a polyimide film for forming a polymer layer of the flexible substrate. It was.

<실시예 3><Example 3>

캐리어 기판으로서 무알카리 유리의 일면에, BPDA 1mol 과 TFDB 0.5mol과 상기 합성예 3에서 제조한 화학식 12의 디아민 0.5mol을 중합시켜 제조한 폴리아믹산계 수지 20중량%와 용매로서 DMAc 80중량%를 포함하는 조성물을 건조 후 두께가 10㎛이 되도록 도포하고, 결과로서 제조된 도막에 대해 100℃에서의 건조 공정 및 300℃에서 60분의 경화공정을 연속적으로 실시하여 플렉서블 기판의 폴리머층 형성용 폴리이미드 필름을 형성하였다.On one surface of an alkali-free glass as a carrier substrate, 20% by weight of a polyamic acid-based resin prepared by polymerizing 1 mol of BPDA, 0.5 mol of TFDB, and 0.5 mol of the diamine of Formula 12 prepared in Synthesis Example 3, and 80% by weight of DMAc as a solvent After drying, the composition was coated to have a thickness of 10 μm, and the resulting coating film was continuously subjected to a drying step at 100 ° C. and a curing step at 300 ° C. for 60 minutes to form a polymer for forming a polymer layer of the flexible substrate. The mid film was formed.

<비교예 1>Comparative Example 1

캐리어 기판으로서 무알카리 유리의 일면에, BPDA 1mol과 TFDB 0.99mol을 중합시켜 제조한 폴리아믹산계 수지 20중량%와 용매로서 DMAc 80중량%를 포함하는 조성물을 건조후 두께가 10㎛가 되도록 도포하고, 결과로서 제조된 도막에 대해 100℃의 온도에서의 건조 공정 및 300℃에서 60분의 경화 공정을 연속적으로 실시하여 폴리이미드계 수지를 포함하는 플렉서블 기판의 폴리머층 형성용 폴리이미드 필름을 형성하였다.On one surface of the alkali-free glass as a carrier substrate, a composition containing 20% by weight of a polyamic acid resin prepared by polymerizing 1 mol of BPDA and 0.99 mol of TFDB and 80% by weight of DMAc as a solvent was applied so as to have a thickness of 10 μm. The resulting coating film was continuously subjected to a drying step at a temperature of 100 ° C. and a curing step at 300 ° C. for 60 minutes to form a polyimide film for forming a polymer layer of a flexible substrate including a polyimide resin. .

<비교예 2>Comparative Example 2

하기 화학식의 디아민(SBF)을 사용한 것을 제외하고는 실시예 1과 동일한 방법으로 플렉서블 기판의 폴리어층 형성용 폴리이미드 필름을 제조하였다. A polyimide film for forming a layer of the flexible substrate was prepared in the same manner as in Example 1, except that diamine (SBF) of the following formula was used.

Figure PCTKR2018000810-appb-I000035
Figure PCTKR2018000810-appb-I000035

실시예 1 내지 3 과 비교예 1 및 2에서 제조된 필름에 대하여, 열팽창계수(CTE), 유리전이온도(Tg) 및 두께방향 위상차(Rth)를 하기 방법으로 평가하고, 그 결과를 표 1에 나타내었다. For the films prepared in Examples 1 to 3 and Comparative Examples 1 and 2, the coefficient of thermal expansion (CTE), glass transition temperature (Tg) and thickness direction phase difference (Rth) were evaluated by the following methods, and the results are shown in Table 1 below. Indicated.

1) 열팽창계수(CTE) 및 유리전이온도(Tg)1) coefficient of thermal expansion (CTE) and glass transition temperature (Tg)

두께 10㎛, 폭 5mm, 길이 5cm의 sample을 측정 길이가 16mm가 되게 지그에 물린 후 0.02N의 힘으로 당겨지도록 설정하고, 승온 속도를 5℃/분으로 하여 300℃까지 상승(1차 승온)시킨 후 이를 50℃까지 냉각(1차 냉각)시키고, 다시 450℃까지 승온(2차 승온)시키는 단계에서 100~250℃ 구간에서의 열팽창값을 TMA(TA사의 Q400)로 측정하였다. 이때, 1차 승온공정에서 승온 구간에서 보여지는 변곡점을 Tg로 하였다. A sample with a thickness of 10 µm, a width of 5 mm, and a length of 5 cm is set to be pulled by a jig so that the measuring length becomes 16 mm, and then pulled with a force of 0.02 N, and the temperature rising rate is 5 ° C./min. After it was cooled down to 50 ° C. (primary cooling), and the temperature was further increased to 450 ° C. (secondary temperature increase), the thermal expansion value in the range of 100 to 250 ° C. was measured by TMA (Q400 of TA). At this time, the inflection point seen in the temperature increase section in the first temperature increase step was set to Tg.

2) 위상차(Rth)2) Phase difference (Rth)

두께 10㎛, 폭 5cm, 길이 5cm 필름의 두께방향 위상차(Rth)를 Axoscan으로 측정하였다.Thickness direction retardation (Rth) of the film having a thickness of 10 μm, a width of 5 cm, and a length of 5 cm was measured by Axoscan.

CTE(ppm/℃,100~250℃ @ 2nd heat)CTE (ppm / ℃, 100 ~ 250 ℃ @ 2 nd heat) Tg(℃)Tg (℃) Rth(@ 550nm)Rth (@ 550nm) 실시예 1Example 1 36.336.3 363363 -299-299 실시예 2Example 2 5050 363363 -200-200 실시예 3Example 3 26.826.8 >450> 450 -657-657 비교예 1Comparative Example 1 5151 318318 -915-915 비교예 2Comparative Example 2 5555 350350 -180-180

상기 표 1의 결과로부터, 본원발명에 따른 폴리이미드 필름은 비교예 1 및 2의 폴리이미드에 비해 CTE 값이 낮으며, 유리전이온도가 높게 나타나는 것을 알 수 있다. 특히 실시예 2의 경우에는 비교예 1과 CTE 값은 유사하지만 훨씬 높은 유리전이온도를 갖는다. 본 발명에 따르면, 분자 구조 내에 두 개의 페닐기가 연결되어 고정된 스피로 또는 카르도 그룹을 포함함으로써, 온도가 올라가더라도 페닐기의 움직임을 제한할 수 있어 열에 대한 치수안정성이 보다 향상될 수 있다.From the results of Table 1, it can be seen that the polyimide film according to the present invention has a lower CTE value and a higher glass transition temperature than the polyimide of Comparative Examples 1 and 2. Especially in the case of Example 2, the CTE value is similar to that of Comparative Example 1, but has a much higher glass transition temperature. According to the present invention, by including two phenyl groups fixed and spiro or cardo group fixed in the molecular structure, it is possible to limit the movement of the phenyl group even if the temperature rises, thereby improving the dimensional stability against heat.

또한 비교예 2와 대조하면, 본 발명에 따른 구조는 선형(linear) 구조를 갖기 때문에 기존의 카르도 모노머에 비해 CTE 증가를 최소화하면서 Tg 상승을 도모할 수 있음을 알 수 있다.In contrast with Comparative Example 2, since the structure according to the present invention has a linear (linear) structure, it can be seen that it is possible to increase the Tg while minimizing the increase in CTE compared to the conventional cardo monomer.

이상으로 본 발명 내용의 특정한 부분을 상세히 기술하였는바, 당업계의 통상의 지식을 가진 자에게 있어서, 이러한 구체적 기술은 단지 바람직한 실시 양태일 뿐이며, 이에 의해 본 발명의 범위가 제한되는 것이 아닌 점은 명백할 것이다. 따라서 본 발명의 실질적인 범위는 첨부된 청구항들과 그것들의 등가물에 의하여 정의된다고 할 것이다.The specific parts of the present invention have been described in detail above, and it is apparent to those skilled in the art that such specific descriptions are merely preferred embodiments, and thus the scope of the present invention is not limited thereto. something to do. Thus, the substantial scope of the present invention will be defined by the appended claims and their equivalents.

Claims (8)

테트라카르복실산 이무수물과 하기 화학식 1a 내지 화학식 1e 중에서 선택되는 디아민을 포함하는 중합성분으로부터 제조되는 폴리이미드:A polyimide prepared from a polymerization component comprising tetracarboxylic dianhydride and a diamine selected from the following general formulas (1a) to (1e): [화학식 1a][Formula 1a]
Figure PCTKR2018000810-appb-I000036
Figure PCTKR2018000810-appb-I000036
[화학식 1b][Formula 1b]
Figure PCTKR2018000810-appb-I000037
Figure PCTKR2018000810-appb-I000037
[화학식 1c][Formula 1c]
Figure PCTKR2018000810-appb-I000038
Figure PCTKR2018000810-appb-I000038
[화학식 1d][Formula 1d]
Figure PCTKR2018000810-appb-I000039
Figure PCTKR2018000810-appb-I000039
[화학식 1e][Formula 1e]
Figure PCTKR2018000810-appb-I000040
Figure PCTKR2018000810-appb-I000040
상기 화학식 1b 내지 1e에 있어서,In Chemical Formulas 1b to 1e, 상기 R1, R2 은 각각 독립적으로 수소 원자이거나, 할로겐 원자, 하이드록실기(-OH), 티올기(-SH), 니트로기(-NO2), 시아노기, 탄소수 1 내지 10의 알킬기, 탄소수 1 내지 4의 할로게노알콕시, 탄소수 1 내지 10의 할로게노알킬, 탄소수 6 내지 20의 아릴기에서 선택되는 치환체이다.R 1 and R 2 are each independently a hydrogen atom, a halogen atom, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, It is a substituent chosen from the halogeno alkoxy of C1-C4, the halogenoalkyl of C1-C10, and the aryl group of C6-C20.
제1항에 있어서,The method of claim 1, 상기 중합성분은 디아민의 총 함량에 대해 상기 화학식 1a 내지 1e에서 선택되는 디아민을 30 내지 100 몰%의 함량으로 포함하는 것인 폴리이미드.Wherein the polymerization component is a polyimide containing a diamine selected from the formula 1a to 1e with respect to the total content of the diamine in an amount of 30 to 100 mol%. 제1항에 있어서,The method of claim 1, 상기 폴리이미드의 열팽창계수(CTE)가 50ppm/℃ 이하인 폴리이미드.The polyimide whose thermal expansion coefficient (CTE) of the said polyimide is 50 ppm / degrees C or less. 제1항에 있어서,The method of claim 1, 상기 폴리이미드의 유리전이온도(Tg)가 330℃ 이상인 폴리이미드.The polyimide whose glass transition temperature (Tg) of the said polyimide is 330 degreeC or more. 제1항에 있어서,The method of claim 1, 상기 중합성분이 하기 화학식 6의 디아민을 더 포함하는 것인 폴리이미드:Polyimide wherein the polymerization component further comprises a diamine of the formula (6): [화학식 6][Formula 6]
Figure PCTKR2018000810-appb-I000041
Figure PCTKR2018000810-appb-I000041
상기 화학식 6에 있어서,In Chemical Formula 6, 상기 R31 및 R32는 각각 독립적으로 수소 원자, 할로겐 원자, 하이드록실기(-OH), 티올기(-SH), 니트로기(-NO2), 시아노기, 탄소수 1 내지 10의 알킬기, 탄소수 1 내지 4의 할로게노알콕시, 탄소수 1 내지 10의 할로게노알킬, 탄소수 6 내지 20의 아릴기에서 선택되고,R 31 and R 32 are each independently a hydrogen atom, a halogen atom, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2 ), a cyano group, an alkyl group having 1 to 10 carbon atoms, and a carbon number Selected from 1 to 4 halogenoalkoxy, halogenated alkyl of 1 to 10 carbon atoms, aryl group of 6 to 20 carbon atoms, n 및 m은 각각 독립적으로 0 내지 4의 정수이다.n and m are each independently an integer of 0-4. Q1은 단일결합, -O-, -CR18R19-, -C(=O)-, -C(=O)O-, -C(=O)NH-, -S-, -SO2-, 페닐렌기 및 이들의 조합으로 이루어진 군에서 선택되는 것이며, 이때 상기 R18 및 R19는 각각 독립적으로 수소 원자, 탄소수 1 내지 10의 알킬기 및 탄소수 1 내지 10의 플루오로알킬기로 이루어진 군으로부터 선택되는 것이다.Q 1 is a single bond, -O-, -CR 18 R 19- , -C (= O)-, -C (= O) O-, -C (= O) NH-, -S-, -SO 2 -A phenylene group and combinations thereof, wherein R 18 and R 19 are each independently selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms and a fluoroalkyl group having 1 to 10 carbon atoms Will be.
제1항 내지 제5항 중 어느 한 항에 따른 폴리이미드를 포함하는 플렉서블 소자용 폴리이미드 필름.The polyimide film for flexible elements containing the polyimide in any one of Claims 1-5. 제1항 내지 제5항 중 어느 한 항의 폴리이미드를 포함하는 Oxide TFT용 또는 LTPS용 폴리이미드 기판.The polyimide substrate for oxide TFT or LTPS containing the polyimide of any one of Claims 1-5. 하기 화학식 1a 내지 1e 중에서 선택되는 어느 하나로 표시되는 디아민:Diamine represented by any one selected from formulas 1a to 1e: [화학식 1a][Formula 1a]
Figure PCTKR2018000810-appb-I000042
Figure PCTKR2018000810-appb-I000042
[화학식 1b][Formula 1b]
Figure PCTKR2018000810-appb-I000043
Figure PCTKR2018000810-appb-I000043
[화학식 1c][Formula 1c]
Figure PCTKR2018000810-appb-I000044
Figure PCTKR2018000810-appb-I000044
[화학식 1d][Formula 1d]
Figure PCTKR2018000810-appb-I000045
Figure PCTKR2018000810-appb-I000045
[화학식 1e][Formula 1e]
Figure PCTKR2018000810-appb-I000046
Figure PCTKR2018000810-appb-I000046
상기 화학식 1b 내지 1e에 있어서,In Chemical Formulas 1b to 1e, 상기 R1, R2 는 각각 독립적으로 수소 원자 또는 할로겐 원자, 하이드록실기(-OH), 티올기(-SH), 니트로기(-NO2), 시아노기, 탄소수 1 내지 10의 알킬기, 탄소수 1 내지 4의 할로게노알콕시, 탄소수 1 내지 10의 할로게노알킬, 탄소수 6 내지 20의 아릴기에서 선택되는 치환체이다.Wherein R 1, R 2 each independently represent a hydrogen atom or a halogen atom, a hydroxyl group (-OH), thiol (-SH), a nitro group (-NO 2), a cyano group, an alkyl group having 1 to 10 carbon atoms, It is a substituent chosen from the halogeno alkoxy of 1-4, the halogenoalkyl of 1-10 carbon atoms, and the aryl group of 6-20 carbon atoms.
PCT/KR2018/000810 2017-01-31 2018-01-17 Polyimide and polyimide film, prepared therefrom, for flexible display Ceased WO2018143583A2 (en)

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