[go: up one dir, main page]

WO2018008359A1 - Procédé de production d'une plaque de verre renforcée - Google Patents

Procédé de production d'une plaque de verre renforcée Download PDF

Info

Publication number
WO2018008359A1
WO2018008359A1 PCT/JP2017/022203 JP2017022203W WO2018008359A1 WO 2018008359 A1 WO2018008359 A1 WO 2018008359A1 JP 2017022203 W JP2017022203 W JP 2017022203W WO 2018008359 A1 WO2018008359 A1 WO 2018008359A1
Authority
WO
WIPO (PCT)
Prior art keywords
glass plate
tempered glass
selected region
film
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2017/022203
Other languages
English (en)
Japanese (ja)
Inventor
利之 梶岡
睦 深田
清貴 木下
佐々木　博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Priority to JP2018525997A priority Critical patent/JPWO2018008359A1/ja
Publication of WO2018008359A1 publication Critical patent/WO2018008359A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface

Definitions

  • the present invention relates to a method for producing a tempered glass plate, and more specifically to a method for producing a tempered glass plate in which the glass plate is chemically strengthened by an ion exchange method.
  • a tempered glass plate that has been chemically strengthened is used as a cover glass plate for touch panel displays mounted on electronic devices such as smartphones and tablet PCs.
  • Such a tempered glass plate is generally produced by chemically treating a glass plate containing an alkali metal as a composition with a tempering solution to form a compressive stress layer on the surface. Since such a tempered glass plate has a compressive stress layer on the surface, impact resistance and the like are improved. However, even such a tempered glass plate has a lower impact resistance at the edge portion and the peripheral portion than the impact resistance on the main surface, which causes damage to the tempered glass plate. When the compressive stress layer on the surface of the tempered glass sheet is deepened to prevent such damage, the tensile stress formed inside the glass sheet becomes excessive, and the damage caused by the tensile stress (so-called self-destruction) There is a problem that tends to occur.
  • the present invention has been made in view of such circumstances, and a method for producing a tempered glass plate that can stably produce a tempered glass plate having high flatness and partially high strength. It is an issue to provide.
  • the method for producing a tempered glass plate of the present invention is a method for producing a tempered glass plate for exchanging ions on the surface of the glass plate, and by exchanging ions, the thickness of the selected region set on a part of the surface of the glass plate, A selective strengthening step of forming a compressive stress layer deeper than the non-selected region in the selected region, and removing at least a part of the selected region expanded in the selective strengthening step And a flattening step of flattening the main surface of the glass plate.
  • the method for producing a tempered glass sheet of the present invention it is possible to stably produce a tempered glass sheet having high flatness and partially high strength.
  • the dimensions and surface state of the tempered glass can be easily adjusted to a desired state.
  • planarization step it is preferable to remove at least a part of the expanded selected region by polishing or etching.
  • the flattening process can be easily performed.
  • an ion permeation preventive film that suppresses or blocks the permeation of ions in non-selected regions is formed, and ions are exchanged by bringing molten salt into contact with the glass plate on which the ion permeation preventive film is formed. It is preferable to include a selective ion exchange step to be performed and a membrane removal step to remove the ion permeation preventive membrane after the selective ion exchange step.
  • the degree of enhancement of the selected area can be easily managed and adjusted.
  • the ion permeation prevention film is preferably removed by polishing or etching.
  • the ion permeation preventive film can be easily and reliably removed.
  • planarization process and the film removal process are performed by the same polishing apparatus.
  • the planarization process and the film removal process can be efficiently performed almost simultaneously.
  • the non-selection region is the center of the front and back main surfaces of the glass plate.
  • a tempered glass plate having a particularly high strength at the edge portion it is possible to easily obtain a tempered glass plate having a particularly high strength at the edge portion. Moreover, the tensile stress of the tensile stress layer formed inside the tempered glass plate can be reduced, and self-destruction can be suppressed.
  • the glass plate is a glass plate containing, by mass%, SiO 2 45 to 75%, Al 2 O 3 1 to 30%, Na 2 O 0 to 20%, K 2 O 0 to 20% as a glass plate composition. It is preferable.
  • ions on the surface of the glass plate can be easily exchanged, and a high-strength tempered glass plate can be easily obtained.
  • the method for producing a tempered glass plate of the present invention is a method for producing a tempered glass plate for exchanging ions on the surface layer of the glass plate, and suppresses or blocks the permeation of ions in a non-selected region set in a part of the main surface.
  • the selected area is larger than the non-selected area.
  • a selective strengthening step of forming a deep compressive stress layer and a flattening step of flattening the main surface of the glass plate by removing at least a part of the selected region expanded in the selective strengthening step.
  • FIGS. 1A to 1E are diagrams showing an example of a method for producing a tempered glass sheet of the present invention.
  • the preparation step is a step of preparing the original glass plate G1.
  • the original glass plate G1 is a plate-like glass plate that can be strengthened using an ion exchange method.
  • the original glass plate G1 contains, as a glass plate, mass% and contains SiO 2 45 to 75%, Al 2 O 3 1 to 30%, Na 2 O 0 to 20%, K 2 O 0 to 20%. preferable. If the glass plate composition range is regulated as described above, it is easy to achieve both ion exchange performance and devitrification resistance at a high level.
  • the original glass plate G1 has a thickness of, for example, 1.5 mm or less, preferably 1.3 mm or less, 1.1 mm or less, 1.0 mm or less, 0.8 mm or less, 0.7 mm or less, 0.6 mm or less, It is 0.5 mm or less, 0.4 mm or less, 0.3 mm or less, 0.2 mm or less, especially 0.1 mm or less.
  • the thickness of the original glass plate G1 is preferably 0.01 mm or more.
  • the dimension of the main surface S of the original glass plate G1 can be arbitrarily set, and is, for example, 480 ⁇ 320 mm to 3350 ⁇ 3950 mm.
  • the main surface S means a surface facing the plate thickness direction.
  • the original glass plate G1 is formed by using, for example, an overflow down draw method. In addition, you may select arbitrarily the shaping
  • the original glass plate G1 may be formed using a float process, and the main surface S and the end surface E may be polished.
  • the selective strengthening step shown in FIGS. 1B and 1C is performed.
  • a compressive stress layer deeper than the non-selected region (central portion S1) other than the selected region is formed in the selected region (peripheral portion S2 and end surface E) set on a part of the surface of the original glass plate G1.
  • the selective strengthening process includes a film forming process, a selective ion exchange process, and a film removing process.
  • the film forming step is a step of obtaining the glass plate with film G2 by forming the ion permeation preventive film M in the non-selection region set on at least a part of the surface of the original glass plate G1.
  • the film forming step corresponds to a cross-sectional view taken along arrow AA in FIG.
  • the region other than the central portion S1, that is, the peripheral edge portion S2 and the end surface E are selected regions and are exposed.
  • the peripheral edge S2 is an area surrounding the central part S1 of the main surface S.
  • the ion permeation preventive membrane M is a membrane layer that suppresses or blocks the permeation of ions when performing ion exchange on the surface layer of the original glass plate G1 in the selective ion exchange step described later.
  • the ion permeation preventive film M As the material of the ion permeation preventive film M, any material may be used as long as permeation of ions exchanged with ions can be suppressed or blocked.
  • the exchanged ions are alkali metal ions
  • the ion permeation preventive film M is, for example, a film of metal oxide, metal nitride, metal carbide, metal oxynitride, metal oxycarbide, metal carbonitride, or the like. It is preferable. Carbon materials, metals, and alloys that are excellent in heat resistance and chemical durability can also be used as the ion permeation preventive film M.
  • examples of the material of the ion permeation preventive film M include SiO 2 , Al 2 O 3 , SiN, SiC, Al 2 O 3 , AlN, ZrO 2 , TiO 2 , Ta 2 O 5 , and Nb 2 O. 5 , HfO 2 , SnO 2 , carbon nanotube, graphene, diamond-like carbon, and a film containing one or more kinds of stainless steel.
  • the ion permeation preventive film M it is preferable to use SiO 2 as the main component of the ion permeation preventive film M because the ion permeation preventive film M can be easily formed at low cost and can function as an antireflective film.
  • the ion permeation preventive film M may be a film made of only SiO 2 .
  • an ion permeable barrier layer M good as having a composition containing SiO 2 99% by mass%.
  • the ion permeation preventive film M preferably has a composition containing 20 to 99% SiO 2 and 1 to 80% Al 2 O 3 by mass%.
  • the thickness of the ion permeation preventive film M may be any thickness as long as ion permeation can be blocked and suppressed. However, if the ion permeation preventive film M is excessively thick, the film formation time, material cost, and the like increase, and therefore it is preferable to form the ion permeation preventive film M as thin as possible so that ion permeation can be blocked and suppressed.
  • the film thickness of the ion permeation preventive film M is preferably, for example, 1 to 5000 nm, and more preferably 50 to 4000 nm.
  • the film formation method of the ion permeation preventive film M is a PVD method (physical vapor deposition method) such as a sputtering method or a vacuum vapor deposition method, a CVD method (chemical vapor deposition method) such as a thermal CVD method or a plasma CVD method, or dip coating.
  • a wet coating method such as a method or a slit coating method can be used.
  • a sputtering method and a dip coating method are preferable.
  • the ion permeation preventive film M can be easily and uniformly formed.
  • the deposition location of the ion permeation preventive film M may be set by an arbitrary method.
  • film formation can be performed in a state where the selected region (peripheral portion S2, end surface E) is masked.
  • the ion permeation preventive film M previously formed into a sheet shape may be bonded to the main surface of the original glass plate G1 to form a film.
  • an ion permeation preventive film M containing SiO 2 and Al 2 O 3 and having a film thickness of 100 nm or more and capable of blocking permeation of alkali metal ions is described as an example.
  • the selective ion exchange step is a step of obtaining the film-reinforced glass plate G3 by chemically strengthening the film-coated glass plate G2 by an ion exchange method. Specifically, ion exchange is performed by immersing the film-coated glass plate G2 in a molten salt T1 containing alkali metal ions.
  • the molten salt T1 in the present embodiment is, for example, a potassium nitrate molten salt.
  • the temperature of the molten salt T1 in the selective ion exchange step may be arbitrarily determined, and is, for example, 350 to 500 ° C., preferably 370 to 480 ° C., more preferably 380 to 450 ° C., and further preferably 380 to 400 ° C.
  • the time for immersing the film-coated glass plate G2 in the molten salt T1 may be arbitrarily determined. For example, it is 0.1 to 150 hours, preferably 0.3 to 100 hours, more preferably 0.5 to 50. It's time.
  • the tempered glass plate with film G3 obtained in the selective ion exchange step has the compressive stress layer C only at the end portion, and the shape in which the end portion is raised, more specifically, the central portion S1 and A shape having a step between the peripheral edge S2 is formed.
  • the film removal step is a step of removing the ion permeation preventive film M from the tempered glass plate with film G3. Specifically, the ion permeation preventive film M is removed by polishing.
  • the polishing apparatus a known polishing apparatus can be used, and a double-side polishing apparatus is preferably used.
  • the ion permeation preventive film M may be removed not only by polishing but also by other methods.
  • the ion permeation preventive film M may be removed by attaching an etching solution.
  • an ion permeable barrier layer M is a film containing SiO 2, for example, fluorine, TMAH, EDP, KOH
  • the solution can be used as an etching solution containing NAOH like, especially, a hydrofluoric acid solution as an etchant Is preferred.
  • the concentration of HF in the hydrofluoric acid solution is preferably 10% or less.
  • the flattening step is a step of flattening the main surface S of the glass plate by removing at least a part of the selected region expanded in the selective strengthening step. Specifically, the main surface S is flattened by removing the expansion part B of the peripheral edge part S2 protruding from the central part S1.
  • the expansion site B can be removed by polishing or etching. Although it is preferable to selectively remove only the expansion portion B, the central portion S1 may also be polished or etched together. In this way, higher flatness can be obtained, and the surface states of the central portion S1 and the peripheral edge portion S2 after the flattening process can be made uniform.
  • the treatment in the flattening step is preferably performed on both main surfaces of the tempered glass sheet with film G3, but may be performed on only one main surface depending on the application.
  • the film removal process and the planarization process may be performed individually, but may be performed substantially simultaneously with the same apparatus.
  • the film removal process and the planarization process can be performed using the same polishing apparatus or the same etching apparatus, and it is particularly preferable to use the same polishing apparatus. According to such a method, the film removal process and the planarization process can be easily and efficiently performed.
  • the tempered glass plate G4 having a flat main surface and having a compressive stress layer C deeper than the central portion S2 at the peripheral edge S2 and the end surface E can be obtained by the processing of the film removal step and the flattening step. That is, the tempered glass sheet G4 is a glass that has high impact resistance at the edge and can reduce internal tensile stress and is less likely to break due to the tensile stress.
  • the compressive stress layer C is not formed in the central portion S1 of the tempered glass plate G4.
  • S1 is an unstrengthened glass plate.
  • the whole strengthening step is a step of exchanging ions on the surface layer by bringing the molten salt into contact with the entire surface of the strengthened glass plate G4 as shown in FIG. 1E.
  • the tempered glass plate G4 is immersed in a molten salt T2 containing alkali metal ions and ion exchange is performed to obtain a tempered glass plate G5 having a compressive stress layer C shallower than the peripheral edge S2 and the end face E in the central part S1.
  • the molten salt T2 is, for example, a potassium nitrate molten salt.
  • the temperature of the molten salt T2 in the overall strengthening step may be arbitrarily determined, and is, for example, 350 to 500 ° C, preferably 370 to 480 ° C, more preferably 380 to 450 ° C. If the temperature of molten salt T2 is 450 degrees C or less, it will become easy to suppress the fluctuation
  • the molten salt T2 may be the same as the molten salt T1 described above. That is, the tempered glass plate G4 may be immersed again in the salt bath used in the selective strengthening step. In this case, since a process of a plurality of steps can be performed with a single salt bath, the cost of manufacturing equipment can be suppressed.
  • the molten salt T2 may be different from the molten salt T1
  • the processing temperature and processing time in the overall strengthening step may be different from the processing temperature and processing time in the selective ion exchange step.
  • the ion exchange treatment time in the overall strengthening step is preferably shorter than the treatment time in the selective ion exchange step. According to such a process, the depth of the compressive stress layer C in the central portion S2 is not excessive, and an increase in tensile stress can be suppressed.
  • strengthening process (not shown).
  • the surface of the tempered glass sheet G5 for example, at least one of the main surface S and the end surface E is polished.
  • the finishing state can be brought into a desired state by performing the processing in the finishing process.
  • the tempered glass sheets G4 and G5 having high flatness and less damage from the end face can be produced stably and efficiently.
  • ⁇ Second Embodiment> In the first embodiment, the case where ion permeation is completely blocked by the ion permeation preventive film M has been described. However, as the ion permeation preventive film M, a film that slightly allows ion permeation may be used.
  • 3A to 3D are diagrams showing an outline of a method for manufacturing a tempered glass sheet according to the second embodiment of the present invention. In the second embodiment, the process in each step may be the same as in the first embodiment except that the ion permeation preventive film M that allows a slight permeation of ions is used.
  • the obtained tempered glass plate with film G3 has a shape in which the end portion is raised and has a step between the central portion S1 and the peripheral portion S2. Therefore, in order to obtain the tempered glass sheet G4 having high flatness, a flattening process is required as shown in FIG. 3D.
  • the compressive stress layer C is formed in the central portion S1 by the process of the selective ion exchange step, when the depth and compressive stress of the compressive stress layer C in the central portion S1 are sufficient, The above-described overall strengthening step can be omitted. On the other hand, when the depth and compressive stress of the compressive stress layer C formed in the central portion S1 are not sufficient, it is preferable to further perform the overall strengthening step.
  • the peripheral edge S2 in the original glass plate G1 may be a chamfered surface (for example, FIG. 4A). Further, the chamfered surface may be, for example, a curved surface as shown in FIG. 4A or a plane inclined with respect to the main surface S. 4A to 4E are views showing an outline of a method for producing a tempered glass sheet according to the third embodiment of the present invention. In 3rd embodiment, the process of each process is the same as that of the above-mentioned 1st embodiment except the peripheral part S2 being a chamfering surface.
  • a machining process for performing any one of cutting, end face machining, and drilling may be provided.
  • the glass plate may be appropriately washed and dried.
  • the molten salts T1 and T2 are potassium nitrate molten salts. May be used.
  • the molten salts T1 and T2 may be a mixed salt of a potassium nitrate molten salt and a sodium nitrate molten salt.
  • the original glass plate G1 preferably contains 0.5 to 7.5% by mass of LiO 2 as a glass composition, for example, 3.0% or 4.5%.
  • the process of the selective strengthening step is not limited to the above-described method.
  • the deep compressive stress layer C is partially formed by immersing the selected region only in the molten salt for ion exchange or applying the molten salt. May be.
  • the stress characteristics (depth of compressive stress layer, etc.) of the tempered glass plate can be measured using, for example, FSM-6000 manufactured by Orihara Seisakusho.
  • the stress characteristics of the tempered glass plate are obtained using, for example, SLP-1000 manufactured by Orihara Seisakusho. Can be measured. If a cross-section sample can be prepared by cutting a tempered glass plate, etc., the stress depth can be confirmed by observing the internal stress distribution using, for example, a photonic lattice WPA-micro or a Tokyo Instruments Abrio. desirable.
  • the tempered glass plate and the production method thereof of the present invention are useful as a glass plate substrate used for a touch panel display and the like, and a production method thereof.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Surface Treatment Of Glass (AREA)
  • Glass Compositions (AREA)

Abstract

La présente invention concerne un procédé de fabrication d'une plaque de verre renforcée permettant l'échange d'ions sur une couche de surface de la plaque de verre. Le procédé de fabrication d'une plaque de verre renforcée est caractérisé en ce qu'il comprend : une étape de renforcement sélectif consistant à rendre l'épaisseur d'une zone sélectionnée fixée sur une partie de la surface de la plaque de verre supérieure à l'épaisseur d'une zone non sélectionnée autre que la zone sélectionnée, et à former une couche de contrainte de compression plus profonde dans la zone sélectionnée que dans la zone non sélectionnée par l'échange d'ions ; et une étape d'aplanissement consistant à aplanir la surface principale de la plaque de verre par élimination d'au moins une partie de la zone sélectionnée qui s'est dilatée lors de l'étape de renforcement sélectif.
PCT/JP2017/022203 2016-07-08 2017-06-15 Procédé de production d'une plaque de verre renforcée Ceased WO2018008359A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2018525997A JPWO2018008359A1 (ja) 2016-07-08 2017-06-15 強化ガラス板の製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-135681 2016-07-08
JP2016135681 2016-07-08

Publications (1)

Publication Number Publication Date
WO2018008359A1 true WO2018008359A1 (fr) 2018-01-11

Family

ID=60901360

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2017/022203 Ceased WO2018008359A1 (fr) 2016-07-08 2017-06-15 Procédé de production d'une plaque de verre renforcée

Country Status (3)

Country Link
JP (1) JPWO2018008359A1 (fr)
TW (1) TW201811691A (fr)
WO (1) WO2018008359A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3524581A3 (fr) * 2018-02-12 2019-11-20 Samsung Display Co., Ltd Article de verre et son procédé de production
CN114538793A (zh) * 2020-11-24 2022-05-27 日本电气硝子株式会社 强化玻璃的制造方法
US11655178B2 (en) 2019-06-28 2023-05-23 Corning Incorporated Methods and apparatus for manufacturing a glass-based article
US12426184B2 (en) 2019-08-29 2025-09-23 Corning Incorporated Foldable apparatus, ribbons, and methods of making
US12481316B2 (en) 2019-08-29 2025-11-25 Corning Incorporated Foldable apparatus, foldable substrate, and methods of making

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011088765A (ja) * 2009-10-20 2011-05-06 Fukuvi Chemical Industry Co Ltd 反射防止強化ガラスの製造方法
US20120064306A1 (en) * 2010-09-15 2012-03-15 Hen-Ta Kang Method for cutting tempered glass, preparatory structure used in cutting tempered glass, and glass block cut from tempered glass substrate
WO2014156577A1 (fr) * 2013-03-25 2014-10-02 日本電気硝子株式会社 Substrat de verre renforcé et son procédé de production

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011088765A (ja) * 2009-10-20 2011-05-06 Fukuvi Chemical Industry Co Ltd 反射防止強化ガラスの製造方法
US20120064306A1 (en) * 2010-09-15 2012-03-15 Hen-Ta Kang Method for cutting tempered glass, preparatory structure used in cutting tempered glass, and glass block cut from tempered glass substrate
WO2014156577A1 (fr) * 2013-03-25 2014-10-02 日本電気硝子株式会社 Substrat de verre renforcé et son procédé de production

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3524581A3 (fr) * 2018-02-12 2019-11-20 Samsung Display Co., Ltd Article de verre et son procédé de production
US11708301B2 (en) 2018-02-12 2023-07-25 Samsung Display Co., Ltd. Glass article and method for producing the same
US12351508B2 (en) 2018-02-12 2025-07-08 Samsung Display Co., Ltd. Glass article and method for producing the same
US11655178B2 (en) 2019-06-28 2023-05-23 Corning Incorporated Methods and apparatus for manufacturing a glass-based article
US12426184B2 (en) 2019-08-29 2025-09-23 Corning Incorporated Foldable apparatus, ribbons, and methods of making
US12481316B2 (en) 2019-08-29 2025-11-25 Corning Incorporated Foldable apparatus, foldable substrate, and methods of making
CN114538793A (zh) * 2020-11-24 2022-05-27 日本电气硝子株式会社 强化玻璃的制造方法
CN114538793B (zh) * 2020-11-24 2025-08-12 日本电气硝子株式会社 强化玻璃的制造方法

Also Published As

Publication number Publication date
JPWO2018008359A1 (ja) 2019-04-25
TW201811691A (zh) 2018-04-01

Similar Documents

Publication Publication Date Title
WO2018008359A1 (fr) Procédé de production d'une plaque de verre renforcée
WO2018066314A1 (fr) Procédé de fabrication de plaque de verre renforcée, plaque de verre revêtue d'un film et plaque de verre renforcée
TWI639569B (zh) 強化玻璃板之製造方法、及強化用玻璃板之製造方法
JP2020510595A (ja) 低たわみおよび高損傷抵抗性ガラス物品のための非対称応力プロファイル
JP6025156B2 (ja) 電子機器用カバーガラスのガラス基板及び電子機器用カバーガラス、並びに電子機器用カバーガラスのガラス基板の製造方法
CN108463443B (zh) 强化玻璃的制造方法及强化玻璃制造装置
JP6886127B2 (ja) 強化ガラス板および強化ガラス板の製造方法
JPWO2017026190A1 (ja) 強化ガラス基板の製造方法及び強化ガラス基板
JP2018002552A (ja) 強化ガラスの製造方法および強化ガラス製造装置
JP6111240B2 (ja) 電子機器用カバーガラスのガラス基板の製造方法
JP2019001691A (ja) 強化ガラス板の製造方法、強化用ガラス板、および強化ガラス板
JPWO2018056329A1 (ja) 強化ガラス板の製造方法、強化用ガラス板、および強化ガラス板
WO2017221805A1 (fr) Procédé de production de verre renforcé et appareil de production de verre renforcé
JP2018052803A (ja) 強化ガラス板およびその製造方法
WO2018097096A1 (fr) Plaque de verre renforcée et procédé de production de plaque de verre renforcée
KR20240116936A (ko) 표면 품질이 개선된 유리 물품
JP2016216294A (ja) 化学強化ガラス、化学強化用のガラス物品、並びに化学強化ガラスの製造方法及び割断方法

Legal Events

Date Code Title Description
ENP Entry into the national phase

Ref document number: 2018525997

Country of ref document: JP

Kind code of ref document: A

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17823966

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17823966

Country of ref document: EP

Kind code of ref document: A1