[go: up one dir, main page]

WO2018062296A1 - Method for producing polyimide-based polymer varnish, method for producing polyimide-based polymer film, and transparent polyimide-based polymer film - Google Patents

Method for producing polyimide-based polymer varnish, method for producing polyimide-based polymer film, and transparent polyimide-based polymer film Download PDF

Info

Publication number
WO2018062296A1
WO2018062296A1 PCT/JP2017/035007 JP2017035007W WO2018062296A1 WO 2018062296 A1 WO2018062296 A1 WO 2018062296A1 JP 2017035007 W JP2017035007 W JP 2017035007W WO 2018062296 A1 WO2018062296 A1 WO 2018062296A1
Authority
WO
WIPO (PCT)
Prior art keywords
polyimide
solvent
reaction vessel
polyimide polymer
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2017/035007
Other languages
French (fr)
Japanese (ja)
Inventor
宗銘 李
奇明 呂
宇睿 ▲ゴン▼
莉▲ティン▼ ▲フゥァン▼
勝紀 望月
池内 淳一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Industrial Technology Research Institute ITRI
Original Assignee
Sumitomo Chemical Co Ltd
Industrial Technology Research Institute ITRI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd, Industrial Technology Research Institute ITRI filed Critical Sumitomo Chemical Co Ltd
Priority to JP2018542658A priority Critical patent/JP7186617B2/en
Priority to KR1020197012297A priority patent/KR102494637B1/en
Publication of WO2018062296A1 publication Critical patent/WO2018062296A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1039Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic

Definitions

  • the present invention relates to a method for producing a polyimide polymer varnish, a method for producing a polyimide polymer film, and a transparent polyimide polymer film.
  • a polyimide solution manufacturing method in which a polyimide raw material monomer is polymerized and imidized in a solvent in a nitrogen stream to obtain a polyimide solution.
  • a reaction system when the raw material monomer of polyimide is mixed in a solvent, the raw material monomer is polymerized to produce a polyamic acid, and further, the imidization of the polyamic acid proceeds by heating the polyimide. Is generated.
  • This invention is made
  • Another object of the present invention is to provide a method for producing a polyimide polymer varnish suitable for mass production of a highly transparent polyimide polymer.
  • the method for producing a polyimide polymer varnish according to the present invention comprises a polymerization step of polymerizing a raw material monomer of a polyimide polymer in a solvent to obtain a polyimide polymer precursor, and a tertiary amine in a reduced pressure environment.
  • the imidization process which imidizes the said polyimide-type polymer precursor and obtains the solution of a polyimide-type polymer is included.
  • the temperature of the imidization step may be 100 ° C. or more and 250 ° C. or less.
  • the tertiary amine may have a boiling point of 120 ° C. or higher and 350 ° C. or lower.
  • the polyimide polymer may contain 20% by mass or more of fluorine.
  • the pressure in the reduced pressure environment may be 350 mmHg or more and 730 mmHg or less, and the pressure in the reduced pressure environment may be 500 mmHg or more and 730 mmHg or less.
  • the oxygen concentration in the gas phase contacting the solvent in the imidization step may be 0.02% or less.
  • the tertiary amine can be added in an amount of 0.05 to 0.7 parts by mass with respect to 100 parts by mass of the raw material monomer.
  • the above method may further comprise a step of adding an ultraviolet absorber to the obtained polyimide polymer solution.
  • the method may further include a step of adding silica sol to the obtained polyimide polymer solution.
  • the method for producing a polyimide-based polymer film according to the present invention includes a step of performing the above-described method for producing a polyimide-based polymer varnish, and depositing and re-dissolving the polyimide-based polymer in the obtained polyimide-based polymer varnish. And a film forming step of casting the polyimide polymer varnish.
  • the film according to the present invention includes a polyimide polymer having a weight average molecular weight of 50,000 or more and 500,000 or less, and a third polymer having a weight average molecular weight of 0.01 mass% or more and 0.25 mass% or less based on the total mass of the film. And a secondary amine.
  • the tertiary amine may have a boiling point of 120 ° C. or higher and 350 ° C. or lower.
  • the production method of another polyimide polymer varnish according to the present invention is as follows: (1) In a reaction vessel, a step of reacting monomer raw materials in solvent A to obtain a polyimide polymer solution; (3) removing the solution from the reaction vessel; (4) washing the reaction vessel with solvent C, and removing the washed solvent C from the reaction vessel, wherein the steps (1), (3), and (4) are the same reaction vessel. Repeat in this order.
  • the polyimide polymer obtained in the step (1) is transparent and has a weight average molecular weight of 250,000 or more.
  • the washing step by having the washing step, the amount of the polymer produced in the previous step (1) remaining in the reaction vessel can be reduced in the second and subsequent steps (1). Therefore, the transparency fall of the polyimide-type polymer synthesize
  • the above method is (5)
  • the method may further comprise a step of washing the reaction vessel with a solvent D and taking out the solvent D after washing from the reaction vessel.
  • the steps (1), (3), (4) and (5) can be repeated in this order using the same reaction vessel.
  • the amount of the polymer remaining in the reaction vessel can be further reduced.
  • the said method is between the said process (1) and the said process (3), (2)
  • the method may further comprise a step of diluting the solution obtained in the step (1) by adding the solvent B in the reaction vessel,
  • the steps (1) to (4) or the steps (1) to (5) can be repeated using the same reaction vessel.
  • the concentration of the polyimide-based polymer in the reaction vessel before the solution is extracted is lowered, the remaining amount of the polymer in the reaction vessel after the extraction can be further reduced.
  • the solvent B can be the solvent C taken out from the reaction vessel in the step (4).
  • the manufacturing method of a polyimide varnish etc. which can give high folding resistance to a film even if it makes a polyimide-type polymer directly into a film without going through a refinement
  • the manufacturing method of the polyimide-type polymer varnish suitable for mass production of a highly transparent polyimide-type resin is provided.
  • a method for producing a polyimide-based polymer varnish according to an embodiment of the present invention includes a polymerization step of polymerizing a raw material monomer of a polyimide polymer in a solvent to obtain a polyimide polymer precursor, and the polyimide polymer precursor in a solvent containing a tertiary amine under a reduced pressure environment.
  • the raw material monomer includes a tetracarboxylic acid compound and a diamine.
  • tetracarboxylic acid compound examples of the tetracarboxylic acid compound are an aromatic tetracarboxylic acid compound such as an aromatic tetracarboxylic dianhydride and an aliphatic tetracarboxylic acid compound such as an aliphatic tetracarboxylic dianhydride.
  • a tetracarboxylic acid compound may be used independently and may use 2 or more types together.
  • the tetracarboxylic acid compound may be a tetracarboxylic acid compound analog such as a tetracarboxylic acid chloride compound in addition to the tetracarboxylic acid dianhydride.
  • aromatic tetracarboxylic dianhydride examples include non-condensed polycyclic aromatic tetracarboxylic dianhydride, monocyclic aromatic tetracarboxylic dianhydride, and condensed polycyclic fragrance.
  • aromatic tetracarboxylic dianhydride examples include non-condensed polycyclic aromatic tetracarboxylic dianhydride, monocyclic aromatic tetracarboxylic dianhydride, and condensed polycyclic fragrance.
  • Group tetracarboxylic dianhydride examples include non-condensed polycyclic aromatic tetracarboxylic dianhydride, monocyclic aromatic tetracarboxylic dianhydride, and condensed polycyclic fragrance.
  • Non-condensed polycyclic aromatic tetracarboxylic dianhydrides include 4,4'-oxydiphthalic dianhydride, 3,3 ', 4,4'-benzophenone tetracarboxylic dianhydride, 2,2' , 3,3′-benzophenonetetracarboxylic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride, 3,3 ′, 4,4′-diphenylsulfonetetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2,3-dicarboxy) Phenyl) propane dianhydride, 2,2-bis (3,4-dicarboxyphenoxyphenyl) propane dianhydride, 4,4 '-(hexafluoroisopropylidene)
  • Examples of the condensed polycyclic aromatic tetracarboxylic dianhydride include 2,3,6,7-naphthalene tetracarboxylic dianhydride.
  • aromatic tetracarboxylic dianhydride preferably 4,4′-oxydiphthalic dianhydride, 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 2,2 ′, 3,3 ′ -Benzophenone tetracarboxylic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, 2,2', 3,3'-biphenyltetracarboxylic dianhydride, 3,3 ', 4,4'-diphenylsulfonetetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2,3-dicarboxyphenyl) propane dianhydride 2,2-
  • Examples of the aliphatic tetracarboxylic dianhydride include cyclic or acyclic aliphatic tetracarboxylic dianhydrides.
  • the cycloaliphatic tetracarboxylic dianhydride is a tetracarboxylic dianhydride having an alicyclic hydrocarbon structure, and specific examples thereof include 1,2,4,5-cyclohexanetetracarboxylic dianhydride.
  • acyclic aliphatic tetracarboxylic dianhydride examples include 1,2,3,4-butanetetracarboxylic dianhydride, 1,2,3,4-pentanetetracarboxylic dianhydride and the like. These may be used alone or in combination of two or more.
  • the tetracarboxylic acid compound is preferably the alicyclic tetracarboxylic dianhydride or the non-condensed polycyclic aromatic tetracarboxylic dianhydride. More preferred specific examples include 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride, 2,2-bis (3 , 4-dicarboxyphenyl) propane dianhydride, 4,4 ′-(hexafluoroisopropylidene) diphthalic dianhydride (6FDA). These can be used alone or in combination of two or more.
  • the raw material monomer can further contain a tricarboxylic acid compound and / or a dicarboxylic acid compound.
  • tricarboxylic acid compounds include aromatic tricarboxylic acids, aliphatic tricarboxylic acids, and related acid chloride compounds, acid anhydrides, and the like, and two or more of them may be used in combination.
  • 1,2,4-benzenetricarboxylic acid anhydride 2,3,6-naphthalenetricarboxylic acid-2,3-anhydride
  • phthalic acid anhydride and benzoic acid are a single bond, —CH 2
  • examples thereof include compounds linked by —, —C (CH 3 ) 2 —, —C (CF 3 ) 2 —, —SO 2 —, or a phenylene group.
  • dicarboxylic acid compound examples include aromatic dicarboxylic acids, aliphatic dicarboxylic acids, and related acid chloride compounds, acid anhydrides, and the like, and two or more kinds may be used in combination.
  • Specific examples include dicarboxylic acid compounds of terephthalic acid; isophthalic acid; naphthalenedicarboxylic acid; 4,4′-biphenyldicarboxylic acid; 3,3′-biphenyldicarboxylic acid; And compounds in which two benzoic acids are linked by —CH 2 —, —C (CH 3 ) 2 —, —C (CF 3 ) 2 —, —SO 2 —, or a phenylene group.
  • the ratio of the tetracarboxylic acid compound to the total of the tetracarboxylic acid compound, tricarboxylic acid compound, and dicarboxylic acid compound is preferably 40 mol% or more, more preferably 50 mol% or more, still more preferably 70 mol%. Or more, more preferably 90 mol% or more, and particularly preferably 98 mol% or more.
  • diamines examples are aliphatic diamines, aromatic diamines or mixtures thereof.
  • the “aromatic diamine” represents a diamine in which an amino group is directly bonded to an aromatic ring, and an aliphatic group or other substituent may be included in a part of the structure.
  • the aromatic ring may be a single ring or a condensed ring, and examples thereof include, but are not limited to, a benzene ring, a naphthalene ring, an anthracene ring, and a fluorene ring. Among these, a benzene ring is preferable.
  • the “aliphatic diamine” refers to a diamine in which an amino group is directly bonded to an aliphatic group, and an aromatic ring or other substituent may be included in a part of the structure.
  • aliphatic diamine examples include acyclic aliphatic diamines such as hexamethylene diamine, 1,3-bis (aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cyclohexane, norbornane diamine, 4,4′- Examples include cycloaliphatic diamines such as diaminodicyclohexylmethane, and these can be used alone or in combination of two or more.
  • aromatic diamines examples include p-phenylenediamine, m-phenylenediamine, 2,4-toluenediamine, m-xylylenediamine, p-xylylenediamine, 1,5-diaminonaphthalene, 2,6-diaminonaphthalene, etc.
  • Aromatic diamine having one aromatic ring 4,4′-diaminodiphenylmethane, 4,4′-diaminodiphenylpropane, 4,4′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether, 3,3′- Diaminodiphenyl ether, 4,4′-diaminodiphenylsulfone, 3,4′-diaminodiphenylsulfone, 3,3′-diaminodiphenylsulfone, 1,4-bis (4-aminophenoxy) benzene, 1,3-bis (4 -Aminophenoxy) benzene, 4,4'-diaminodiphenylsulfur Bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] sulfone, 2,2-bis [4- (4-aminophenoxy)
  • the diamine can also have a fluorine-based substituent.
  • fluorine-based substituent are a perfluoroalkyl group having 1 to 5 carbon atoms such as a trifluoromethyl group, and a fluoro group.
  • the diamines from the viewpoint of high transparency and low colorability, it is preferable to use one or more selected from the group consisting of aromatic diamines having a biphenyl structure.
  • One or more selected from the group consisting of 2,2′-dimethylbenzidine, 2,2′-bis (trifluoromethyl) benzidine (TFMB) and 4,4′-bis (4-aminophenoxy) biphenyl may be used.
  • the diamine is preferably a diamine having a biphenyl structure and a fluorine-based substituent, and an example thereof is 2,2′-bis (trifluoromethyl) -4,4′-diaminodiphenyl (TFMB).
  • the molar ratio between the diamine in the raw material monomer and the carboxylic acid compound such as a tetracarboxylic acid compound can be suitably adjusted within a range of 0.9 mol to 1.1 mol of the tetracarboxylic acid with respect to 1.00 mol of the diamine.
  • the obtained polyimide polymer has a high molecular weight, so that tetracarboxylic acid is 0.98 mol or more and 1.02 mol with respect to 1.00 mol of diamine. More preferably, they are 0.99 mol% or more and 1.01 mol% or less.
  • the proportion of amino groups in the resulting polymer terminal is low, and carboxylic acids such as tetracarboxylic acid compounds with respect to 1.00 mol of diamine
  • the compound is preferably 1.00 mol or more.
  • the amount of fluorine in the resulting polyimide polymer is 1% by mass or more based on the mass of the polyimide polymer It can be 5 mass% or more, 10 mass% or more, or 20 mass% or more. Since the raw material cost tends to increase as the proportion of fluorine increases, the upper limit of the amount of fluorine is preferably 40% by mass or less.
  • a fluorine-type substituent may exist in either diamine or a carboxylic acid compound, and may exist in both. By including a fluorine-based substituent, the YI value may be particularly reduced.
  • the solvent A used for the synthesis of the polyimide polymer is a solvent capable of dissolving the polyimide polymer precursor produced by polymerization and the polyimide polymer produced by imidization. Is preferred. Examples of such solvents include lactone solvents, amide solvents, and sulfur-containing solvents. Specifically, ⁇ -butyrolactone (boiling point 204 ° C.) (sometimes referred to as GBL), N, N-dimethylformamide (boiling point 153).
  • the solvent may be a mixture.
  • the solvent A is preferably a high boiling point solvent.
  • the boiling point is preferably 160 ° C. or higher, and more preferably 180 ° C. or higher.
  • examples of such solvent A are GBL, DMAc, dimethyl sulfoxide.
  • the tertiary amine can function as an imidization catalyst for the polyimide polymer precursor in a solvent.
  • tertiary amines include tertiary amines represented by formula (a) (hereinafter also referred to as tertiary amine A) and tertiary amines represented by formula (b) (hereinafter also referred to as tertiary amine B). ), Tertiary amines represented by formula (c) (hereinafter also referred to as tertiary amine C), and tertiary amines represented by formula (d) (hereinafter also referred to as tertiary amine D).
  • R 1A , R 2A and R 3A are each a monovalent hydrocarbon group having 1 to 12 carbon atoms which may be different from each other, and the total number of carbon atoms of R 1A , R 2A and R 3A Is 10 or more and 18 or less.
  • tertiary amine A examples include tripropylamine, dibutylpropylamine, and ethyldibutylamine.
  • R 1B is a monovalent hydrocarbon group having 2 to 10 carbon atoms
  • R 2B is a divalent aliphatic hydrocarbon group having 3 to 12 carbon atoms
  • R 1B and The total carbon number of R 2B is 9-16.
  • tertiary amine B examples include N-ethylpiperidine, N-propylpiperidine, N-butylpyrrolidine, N-butylpiperidine, and N-propylhexahydroazepine.
  • R 1C is a trivalent aliphatic hydrocarbon group having 7 to 15 carbon atoms.
  • tertiary amine C examples include azabicyclo [2.2.1] heptane, azabicyclo [3.2.1] octane, azabicyclo [2.2.2] octane, and azabicyclo [3.2.2] nonane. Can be mentioned.
  • R 1D is a trivalent aliphatic hydrocarbon group having 8 to 15 carbon atoms.
  • tertiary amine D examples include 2-methylpyridine, 3-methylpyridine, 4-methylpyridine, 2-ethylpyridine, 3-ethylpyridine, 4-ethylpyridine, 2,4-dimethylpyridine, 2,4 , 6-trimethylpyridine, 3,4-cyclopentenopyridine, 5,6,7,8-tetrahydroisoquinoline, isoquinoline.
  • the tertiary amine used has a high boiling point because the amount of catalyst removed from the system tends to be suppressed when water is distilled off under reduced pressure.
  • a tertiary amine having a boiling point of 120 ° C. or higher is preferable, a tertiary amine having a boiling point of 140 ° C. or higher is more preferable, a tertiary amine having a boiling point of 170 ° C. or higher is more preferable, and a tertiary amine having a boiling point of 200 ° C. or higher is still more preferable.
  • the upper limit of the boiling point of the tertiary amine to be used is not particularly defined, it is usually 350 ° C. or lower. As the tertiary amine having a lower boiling point is used, it is necessary to increase the amount of the catalyst used in consideration of the distillate.
  • the tertiary amine is preferably a tertiary amine D, more preferably a tertiary amine D having 6 to 13 carbon atoms. More preferred is a tertiary amine D having 9 to 13 carbon atoms, and still more preferred is isoquinoline and its hydride.
  • This method includes a polymerization step of polymerizing a raw material monomer of a polyimide polymer in a solvent to obtain a polyimide polymer precursor, and the polyimide polymer precursor in a solvent containing a tertiary amine under a reduced pressure environment. An imidization step of imidizing the body to obtain a polyimide polymer solution.
  • the polyimide polymer varnish is obtained by adding a polyimide polymer solution obtained by imidation of a polyimide polymer precursor, and adding a solvent or an additive to the polyimide polymer solution. Solution.
  • the raw material monomer of the polyimide polymer is polymerized in the solvent A described above in the reaction vessel.
  • the amount of the raw material monomer in the total liquid including the raw material monomer and the solvent A can be 10 to 60% by mass.
  • the amount of the monomer is large, the polymerization rate tends to increase, and the molecular weight can be increased. Further, the polymerization time can be shortened, and the coloring of the polyimide polymer tends to be suppressed. If the amount of the monomer is too large, the viscosity of the polymer or the solution containing the polymer tends to increase, which makes it difficult to stir or the polymer adheres to the reaction vessel or stirring blade, resulting in a low yield. Sometimes.
  • each component of the raw material monomer and the solvent A is not particularly limited, and all of them may be mixed simultaneously or separately, but after mixing at least a part of the diamine and the solvent It is preferable to add a carboxylic acid compound.
  • the diamine and carboxylic acid compound may be added in portions, or may be added stepwise for each compound.
  • the reaction mass By sufficiently stirring the raw material monomer in the reaction mass, polymerization of the raw material monomer is promoted and a polyimide polymer precursor is formed. If necessary, the reaction mass may be heated to about 40 to 90 ° C.
  • the imidization process described later can also proceed in parallel with the progress of the raw material monomer polymerization process. In this case, the reaction mass may be heated to a higher temperature in accordance with the imidization conditions described later.
  • the polymerization reaction time can be, for example, 24 hours or less, can be 1 hour or less, and can be 1 to 24 hours.
  • the reaction mass may contain a tertiary amine during the polymerization step of the polyimide polymer precursor.
  • the tertiary amine may be added before mixing the diamine and the solvent, may be added after mixing, or may be added after mixing the diamine, the solvent, and the carboxylic acid compound. Further, after diluting with a part of the solvent to be used, it may be added to the reaction mass.
  • the bond of an amide group may be cut
  • a film obtained from a varnish containing such a polyimide-based polymer may have low folding resistance.
  • the pressure in the reaction solution is reduced and water in the reaction solution is quickly removed, so that the cleavage reaction of the amide group can be suppressed and the molecular weight of the resulting polyimide polymer can be increased.
  • the varnish containing the polyimide polymer can be used without going through a purification step. Even if the film is produced directly, the film tends to have high folding resistance.
  • the amount of tertiary amine added to 100 parts by mass of the raw material monomer is preferably 0.05 parts by mass or more, more preferably 0.1 parts by mass or more. More preferably, it is 0.2 parts by mass or more.
  • the addition amount of the catalyst is small.
  • the amount of tertiary amine added is preferably 2 parts by mass or less, more preferably 1 part by mass or less, still more preferably 0.7 parts by mass or less, still more preferably 0.5 parts by mass or less. Especially preferably, it is 0.3 mass part or less.
  • the temperature in the imidization step is preferably 100 ° C. or higher and 250 ° C. or lower, and more preferably 150 ° C. or higher and 210 ° C. or lower.
  • the pressure in the imidization step is preferably 730 mmHg or less, more preferably 700 mmHg or less, and further preferably 675 mmHg or less.
  • the pressure in the imidization step can be, for example, 350 mmHg or more, and may be 500 mmHg or more. Depending on the vapor pressure of the solvent at the temperature of the imidization step, it may be preferable to perform the pressure at 400 mmHg or higher in order to increase the stability of the reaction. For the same reason, it may be more preferable to carry out at 600 mmHg. If the pressure in the imidization step is set near the saturated vapor pressure of the solvent in the imidization step, YI tends to be suppressed. A pressure within 50 mmHg from the saturated vapor pressure is preferred.
  • the heating time can be, for example, 1 to 24 hours.
  • the time is preferably 1 to 12 hours, more preferably 2 to 9 hours, still more preferably 2 to 8 hours, still more preferably 2 to 6 hours, and particularly preferably 2 to 5 hours. Stirring is preferred during heating.
  • the reaction time becomes longer, the molecular weight increases, but the yellowishness of the resin tends to increase.
  • the reaction time is short, the molecular weight tends to be low, and the yellow color tends to be weak.
  • the imidization step when the oxygen concentration in the gas phase contacting the liquid phase containing the solvent A in the reaction vessel is low, coloring of the polyimide polymer tends to be suppressed, and a film obtained from a varnish containing the same The YI value tends to be low.
  • the imidization step by heating the reaction mass in a reduced pressure environment may be performed in a state where the oxygen concentration in the gas phase of the reaction vessel is low. For example, the pressure reduction is started before the heating in the reduced pressure environment.
  • the oxygen concentration may be low from the time when the raw material monomer or the like is added.
  • the oxygen concentration is preferably 0.02% or less, and more preferably 0.01% or less.
  • the oxygen concentration is high when heated to a high temperature, it causes coloring in particular.
  • the temperature of the reaction solution is 130 ° C. or higher
  • the oxygen concentration is preferably 0.02% or lower.
  • oxygen is not substantially generated.
  • the oxygen concentration in the gas phase in the conversion step can be reduced.
  • the oxygen concentration in the imidization step can be grasped, for example, by analyzing the oxygen concentration in the gas removed from the reaction vessel when the pressure inside the reaction vessel is reduced. If it is difficult to measure the oxygen concentration during decompression, the oxygen concentration may be measured by sampling the gas phase before and after decompression.
  • This polyimide polymer solution may be used as it is as a polyimide polymer varnish.
  • the polyimide polymer varnish can also be obtained by adjusting the concentration of the polyimide polymer by adding solvent B to the obtained polyimide polymer solution.
  • the solid content concentration in a suitable polyimide-based polymer varnish is 10 to 25% by mass.
  • a varnish containing 30% by mass or more of a polyimide-based polymer is used with respect to the total amount of solids in the varnish, one of the main components described later is a polyimide-based polymer.
  • a polyimide polymer film which is a polymer can be easily obtained.
  • the concentration of the polyimide polymer is preferably 10% by mass or more, more preferably 13% by mass or more based on the total mass of the varnish.
  • Dilution can be performed in the reaction vessel, and can also be performed on the solution recovered from the reaction vessel.
  • the reaction vessel when the solvent B is added to the polyimide polymer solvent after imidization and the concentration of the polyimide polymer in the reaction vessel is diluted, the polymer remaining in the reaction vessel in the next extraction step Thus, the yield of the polymer can be improved. Further, when the amount of the polymer remaining in the reaction vessel is reduced, coloring (for example, yellow) of the obtained polyimide-based polymer is improved in the subsequent polymerization and imidation repeating steps using this reaction vessel.
  • coloring for example, yellow
  • the solvent B for dilution can be the same as the solvent A described above.
  • the solvent B and the solvent A may be the same type or different types.
  • a solvent having high solubility in the polyimide resin as the solvent B for dilution, the recovery rate of the polyimide polymer from the reaction vessel is increased.
  • examples of such a solvent include N, N-dimethylacetamide, cyclopentanone (boiling point 131 ° C.) and the like.
  • the dilution in the reaction vessel can be performed a plurality of times using a plurality of different types of solvents B.
  • the polyimide polymer varnish is extracted from the reaction vessel.
  • the extracted varnish can be used in a film forming process described later.
  • the amount of polymer remaining in the reaction vessel can be reduced, and the color (for example, yellow) of the resulting polyimide polymer can be improved in the subsequent polymerization and imidation repeating steps using this reaction vessel. Is done.
  • Solvent C can be exemplified by solvent A and solvent B.
  • the solvent C may be the same type as the solvent A or different from the solvent A.
  • the solvent C may be the same type as the solvent B or may be different from the solvent B.
  • an appropriate washing solvent By employing an appropriate washing solvent, the amount of polymer remaining in the reaction vessel can be reduced. Examples of such a solvent include N, N-dimethylacetamide, cyclopentanone and the like.
  • the solvent C may be supplied to the reaction vessel and then recovered, then the solvent D may be supplied to the reaction vessel to dissolve the polymer, and then the solvent D may be recovered. You may perform the washing
  • the solvent D may be the same type as the solvent C or may be different from the solvent C.
  • the solvent B used in the above-described dilution step it is preferable to use the solvent C used for washing the reaction vessel.
  • the solvent D used for washing can also be used. It is preferable to use at least the solvent C as the solvent B for dilution.
  • the yield of the polymer can be increased.
  • the yield in the polyimide varnish actually obtained in the subsequent extraction step It is the weight of resin solids.
  • the weight of the resin solids in the polyimide varnish is the resin solids contained in the solvent C and the resin solids in the polyimide varnish synthesized in the reaction vessel. Total amount.
  • the obtained polymer tends to adhere to the reaction vessel, and the polymer remains in the reaction vessel after extraction of the solution, resulting in a high yield.
  • the polymer is reduced or the polymer remaining in the reaction vessel has an adverse effect on the synthesis of the polyimide in the next step, resulting in a high yellow color of the resulting polymer or an increase in foreign matter contained in the resulting polymer There is.
  • Such a problem can be solved by diluting the solution before extraction with the solvent B and / or washing the reaction vessel using the solvent C. Washing with the solvent D in addition to the solvent C, that is, washing with a plurality of times with two or more solvents, tends to make the reaction vessel easier to clean.
  • said "transparent” means the total light transmittance (Tt) when the polyimide-type polymer contained in a varnish produces and measures a polymer film with a film thickness of 80 micrometers according to JIS K7105: 1981. Is 85% or more.
  • the total light transmittance is preferably 90% or more.
  • the said weight average molecular weight is a standard polystyrene conversion molecular weight measured by GPC.
  • Solvent A used for the synthesis of polyimide and solvent B and / or solvent C used for dilution and washing may be the same solvent, but if they are different from each other, the transparency of the polymer obtained by improving the cleaning degree of the reaction vessel is improved. Can be improved.
  • Suitable solvents for solvents B and C include N, N-dimethylacetamide, cyclopentanone and the like as described above. These solvents are preferable because they have a boiling point lower than that of GBL but are advantageous for extraction from the reaction vessel because the viscosity of the polyimide polymer varnish is lowered.
  • the solvent A used for the synthesis of polyimide is preferably a high boiling point solvent such as GBL when the imidization reaction is performed at a high temperature as described above.
  • an additive other than a solvent can be added to the polyimide polymer solution to prepare a polyimide polymer varnish.
  • the additive include inorganic particles and ultraviolet absorbers.
  • inorganic particles Specific examples of the inorganic particles include silica fine particles.
  • the average primary particle diameter of the inorganic particles used in the present invention is usually 100 nm or less. When the average primary particle diameter of the inorganic particles is 100 nm or less, the transparency of the film tends to be improved.
  • the measurement of the primary particle diameter of the inorganic particles in the film can be a constant diameter by a transmission electron microscope (TEM).
  • TEM transmission electron microscope
  • the average primary particle diameter can be obtained, for example, by measuring 10 primary particle diameters by TEM observation and calculating the average value thereof.
  • the silica fine particles may be a silica sol in which the silica particles are dispersed in an organic solvent or the like, or a silica fine particle powder produced by a vapor phase method may be used, but handling is easy. Therefore, a silica sol is preferable.
  • the average primary particle diameter of the raw material silica particles can be determined, for example, by BET measurement.
  • the amount of inorganic particles added is set in accordance with the amount of the resin component in the polyimide-based polymer solution so that the concentration of the inorganic particles in the film after casting is, for example, from 0% by mass to 90% by mass. can do.
  • they are 10 mass% or more and 60 mass% or less, More preferably, they are 20 mass% or more and 50 mass% or less. There exists a tendency which is easy to make transparency and mechanical strength of an optical film compatible as a compounding ratio exists in said range.
  • the ultraviolet absorber can be appropriately selected from those usually used as an ultraviolet absorber in the field of resin materials.
  • the ultraviolet absorber can be determined from the compound that absorbs light having a wavelength of 400 nm or less, and the type and amount of the ultraviolet absorber can be determined according to the required characteristics of the light absorption capability according to the application.
  • Examples of the ultraviolet absorber include at least one compound selected from the group consisting of benzophenone compounds, salicylate compounds, benzotriazole compounds, and triazine compounds.
  • the ultraviolet absorber is preferably a benzotriazole compound.
  • system compound refers to a derivative of the compound to which the “system compound” is attached.
  • a “benzophenone compound” refers to a compound having benzophenone as a host skeleton and a substituent bonded to benzophenone.
  • additives may be added to the polyimide polymer solution as long as the transparency and flexibility are not impaired.
  • other components include colorants such as antioxidants, mold release agents, stabilizers, and bluing agents, flame retardants, lubricants, thickeners, and leveling agents.
  • the total amount of additive components other than inorganic particles can be appropriately set so that the concentration in the film after casting is 0% or more and 20% by mass or less, preferably more than 0% and 10% by mass or less.
  • the polyimide is a polymer containing a repeating structural unit containing an imide group
  • the polyamide is a polymer containing a repeating structural unit containing an amide group.
  • the polyimide polymer is a polyimide; a polymer containing a repeating structural unit containing both an imide group and an amide group; and a repeating structural unit containing an imide group and a repeating structural unit containing an amide group. A polymer is shown.
  • the polyimide polymer obtained by polymerization and imidation has a repeating structural unit represented by the following formula (10).
  • G is a tetravalent organic group
  • A is a divalent organic group.
  • the structure represented by two or more types of Formula (10) from which G and / or A differ may be included.
  • the polyimide polymer according to the present embodiment has a structure represented by the formula (11), the formula (12), and the formula (13) as long as various physical properties of the obtained polyimide polymer film are not impaired. Any one or more may be included.
  • the polyimide polymer according to the present embodiment can be produced using a tetracarboxylic acid compound and a diamine compound, which will be described later, as main raw materials, and the repeating structural unit represented by the formula (10) is a polyimide polymer.
  • the main structural unit is preferable from the viewpoint of the strength and transparency of the film.
  • the repeating structural unit represented by the formula (10) is preferably 40 mol% or more, more preferably 50 mol% or more, further preferably 70 mol%, based on all repeating structural units of the polyimide polymer. More preferably, it is 90 mol% or more, and still more preferably 98 mol% or more. 100 mol% may be sufficient as the repeating structural unit represented by Formula (10).
  • G and G 1 are tetravalent organic groups, preferably organic groups which may be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group, and are represented by the following formulas (20), (21), Groups represented by formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula (28) or formula (29) and the number of tetravalent carbon atoms Six or less chain hydrocarbon groups are exemplified.
  • Z is a single bond, -O -, - CH 2 - , - CH 2 -CH 2 -, - CH (CH 3) -, - C (CH 3) 2 -, —C (CF 3 ) 2 —, —Ar—, —SO 2 —, —CO—, —O—Ar—O—, —Ar—O—Ar—, —Ar—CH 2 —Ar—, —Ar— C (CH 3 ) 2 —Ar— or —Ar—SO 2 —Ar— is represented.
  • Ar represents an arylene group having 6 to 20 carbon atoms which may be substituted with a fluorine atom, and specific examples thereof include a phenylene group.
  • the groups represented by the formulas (20) to (27) are preferred because the yellowness of the resulting film can be easily suppressed.
  • G 2 is a trivalent organic group, and is preferably an organic group which may be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group.
  • the organic group of G 2 the above expression (20), equation (21), equation (22), equation (23), equation (24), equation (25), equation (26), equation (27), wherein Examples include a group in which any one of the bonds of the group represented by (28) or formula (29) is replaced with a hydrogen atom, and a trivalent chain hydrocarbon group having 6 or less carbon atoms.
  • G 3 is a divalent organic group, preferably an organic group which may be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group.
  • the organic group of G 3 the above formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula Examples of the bond of the group represented by (28) or formula (29) include a group in which two that are not adjacent to each other are replaced with hydrogen atoms, and a divalent chain hydrocarbon group having 6 or less carbon atoms.
  • A, A 1 , A 2 and A 3 are all divalent organic groups.
  • it is an organic group which may be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group.
  • Z 1, Z 2 and Z 3 are each independently a single bond, -O -, - CH 2 - , - CH 2 -CH 2 -, - CH (CH 3 )-, -C (CH 3 ) 2- , -C (CF 3 ) 2- , -SO 2 -or -CO-.
  • Z 1 and Z 3 are —O— and Z 2 is —CH 2 —, —C (CH 3 ) 2 —, —C (CF 3 ) 2 — or —SO 2 —. is there.
  • Z 1 and Z 2 , and Z 2 and Z 3 are each preferably in the meta position or the para position with respect to each ring.
  • the repeating structural units represented by formula (10) and formula (11) are usually derived from diamines and tetracarboxylic acid compounds.
  • the repeating structural unit represented by the formula (12) is usually derived from a diamine and a tricarboxylic acid compound.
  • the repeating structural unit represented by the formula (13) is usually derived from a diamine and a dicarboxylic acid compound.
  • the polyimide polymer according to the present embodiment may be a copolymer including a plurality of different types of repeating structural units.
  • the weight average molecular weight of the polyimide polymer is usually 50,000 to 500,000.
  • the weight average molecular weight of the polyimide polymer is preferably 80,000 to 500,000, more preferably 100,000 to 500,000, and further preferably 130,000 to 400,000.
  • the weight average molecular weight is a standard polystyrene equivalent molecular weight measured by GPC. If the weight average molecular weight of the polyimide polymer is large, high flexibility tends to be obtained, but if the weight average molecular weight of the polyimide polymer is too large, the viscosity of the varnish tends to increase and the workability tends to decrease. is there.
  • the polyimide polymer and the polyamide contain a fluorine-containing substituent, the elastic modulus of the obtained film is improved and the YI value of the film tends to be reduced.
  • the elastic modulus of the film is high, generation of scratches and wrinkles tends to be suppressed.
  • the polyimide polymer and the polyamide preferably have a fluorine-containing substituent.
  • the fluorine-containing substituent include a fluoro group and a trifluoromethyl group.
  • the fluorine atom content in the polyimide polymer can be 1% by mass or more, 5% by mass or more, 10% by mass or more, or 20% by mass or more based on the mass of the polyimide polymer.
  • An upper limit can be 40 mass% or less.
  • Casting can be performed on a resin substrate, a stainless steel belt, or a glass substrate by a roll-to-roll or batch method.
  • the resin substrate include PET, PEN, polyimide, polyamideimide and the like.
  • the resin base material is preferably a resin excellent in heat resistance.
  • a PET substrate is preferable from the viewpoints of adhesion to the film and cost.
  • the varnish obtained by the production method of the present invention is formed into a film without undergoing a purification step, a film having good physical properties can be obtained. For this reason, it is preferable to form a film without going through a purification step in which the polyimide polymer is once precipitated as a solid and then redissolved in a solvent. This is a cost-effective process.
  • a certain amount of organic solvent is volatilized by passing the coating film through a dryer that contacts a heated gas with the surface of the coating film, and the coating film is self-supporting. It may be obtained by peeling from the support as a film.
  • the working temperature is adjusted depending on the substrate used, and when a resin substrate is used, it is generally carried out at or below the glass transition temperature thereof. Usually, the heating may be performed at an appropriate temperature of 50 ° C. to 300 ° C., and the heating temperature may be adjusted in multiple stages or a temperature gradient may be provided. It is also suitable to carry out under an inert atmosphere or under reduced pressure as appropriate.
  • the peeled polyimide polymer film may be further heated at 80 to 300 ° C.
  • the polyimide polymer film thus obtained is formed by the solid content in the polyimide polymer varnish, and one of the main components is the polyimide polymer.
  • the polyimide polymer is preferably 30% by mass or more based on the total amount of the polyimide polymer film.
  • the polyimide polymer film may contain the silica fine particles, the ultraviolet absorber and / or the additive.
  • the concentration of the polyimide polymer is preferably 10% by mass or more, more preferably 13% by mass or more based on the total mass of the polyimide polymer film.
  • the polyimide polymer film contains a tertiary amine.
  • Preferred examples of the type of tertiary amine are as described in the above section (Tertiary amine).
  • the content of the tertiary amine in the polyimide polymer film is preferably small.
  • the content of the tertiary amine is preferably 0.25% by mass or less, more preferably 0.20% by mass or less, and still more preferably 0.15% by mass or less. By reducing the content, the coloring of the film also tends to be suppressed.
  • a tertiary amine is contained from the viewpoint that ultraviolet transmission can be suppressed.
  • the content of the tertiary amine is preferably 0.01% by mass or more, more preferably 0.02% by mass or more, and further preferably 0.05% by mass or more.
  • the thickness of the polyimide polymer film can be 10 to 200 ⁇ m.
  • the polyimide polymer film obtained according to the present embodiment can sufficiently suppress the yellowness YI based on JIS K 7373: 2006, and the yellowness YI is 2.5 or less, 2.4 or less, 2.3 or less. 2.2 or less.
  • the synthesis conditions such as the temperature during film formation, it can be made 2.1 or less, 2.0 or less, 1.9 or less, or 1.8 or less.
  • the polyimide polymer film obtained by this embodiment is transparent.
  • the polyimide polymer film can have a total light transmittance (Tt) measured in accordance with JIS K7105: 1981 of 85% or more, and preferably 90% or more. More preferably, it is 91% or more, More preferably, it is 92% or more.
  • the polyimide polymer film may have a haze of 1% or less, preferably 0.8% or less, measured according to JIS K 7105: 1981. More preferably, it is 0.5% or less, More preferably, it is 0.3% or less.
  • the polyimide-based polymer film obtained according to this embodiment may be particularly reduced in color by containing a fluorine-containing substituent.
  • the content of fluorine atoms in the polyimide polymer can be 1% by mass or more, 5% by mass or more, 10% by mass or more, and 20% by mass or more based on the mass of the polyimide polymer.
  • An upper limit can be 40 mass% or less.
  • optical film Since such an optical film has high folding resistance and good optical properties (yellowness, Tt, Haze), it can be suitably used as an optical member such as a front plate of a flexible device.
  • Examples of flexible devices include image display devices (flexible displays, electronic paper, etc.), solar cells, and the like.
  • Examples of the flexible display include, in order from the surface side, a configuration of a front plate / polarizing plate protective film / polarizing plate / polarizing plate protective film / touch sensor film / organic EL element layer / TFT substrate.
  • a hard coat layer, an adhesive layer, an adhesive layer, a retardation layer, and the like may be included.
  • Such a flexible display can be used as an image display unit of a tablet PC, a smartphone, a portable game machine, or the like.
  • a laminate in which various functional layers such as an ultraviolet absorbing layer, a hard coat layer, an adhesive layer, a hue adjusting layer, a refractive index adjusting layer, and the like are added to the surface of the optical film can be used.
  • the folding resistance of the polyimide polymer films obtained in Examples and Comparative Examples was evaluated according to the following criteria.
  • the film was cut into a 10 mm ⁇ 100 mm strip using a dumbbell cutter.
  • Set the cut film on MIT-DA MIT Folding Fatigue Testing Machine manufactured by Toyo Seiki Co., Ltd., both in the front and back direction under the conditions of test speed 175 cpm, bending angle 135 °, load 750 g, bending clamp R 1.0 mm.
  • the number of folds until bending and breaking were measured.
  • GC measurement was performed under the following conditions to determine the tertiary amine.
  • Solution preparation 100 mg film is weighed into a screw tube and 5 ml DMSO is added to dissolve.
  • Apparatus Agilent 6890 type, column: BPX-5 (0.25 mm ⁇ 30 m, film thickness: 0.25 ⁇ m), column temperature: 50 ° C. (5 min) ⁇ 20 ° C./min ⁇ 350° C.
  • Example 1 Manufacture of polyimide varnish
  • isoquinoline was charged into a reaction vessel connected to a vacuum pump equipped with a solvent trap and a filter.
  • GBL ⁇ -butyrolactone
  • TFMB 2,2′-bis (trifluoromethyl) -4,4′-diaminodiphenyl
  • 6FDA 4,4 ′-(hexafluoroisopropylidene) diphthalic dianhydride
  • the molar ratio of TFMB and 6FDA added was 1.00: 0.99 for 6FDA: TFMB, and the monomer concentration in the liquid was 40 wt%.
  • the mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.5.
  • the pressure was reduced to 650 mmHg, and then the internal temperature was raised to 180 ° C.
  • the mixture was further heated and stirred for 4 hours, then returned to atmospheric pressure and cooled to 155 ° C. to obtain a polyimide solution.
  • GBL was added at 155 ° C. to obtain a uniform solution having a polyimide solid content of 24 wt%, and then the polyimide varnish was taken out from the reaction vessel.
  • Example 2 A film having a Tt of 92.7%, a haze of 0.1% and a yellowness of 2.0 was obtained in the same manner as in Example 1 except that the heating and stirring time of the liquid after reaching 180 ° C. was 3 hours.
  • Example 3 A film having a Tt of 92.4%, a haze of 0.1%, and a yellowness of 1.8 was obtained except that the amount of isoquinoline was changed to 0.75 g.
  • the mass part of the tertiary amine is 0.3 with respect to 100 parts by mass of the raw material monomer.
  • Example 1 The same procedure as in Example 1 was conducted except that the amount of isoquinoline was 2.00 g, no pressure reduction was performed during the process, and the mixture was heated and stirred for 5 hours after the internal temperature reached 180 ° C., Tt 92.5%, Haze 0. A film with 1% yellowness of 2.4 was obtained.
  • the mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.8.
  • Example 2 The amount of isoquinoline was 2.50 g, the amount of ⁇ -butyrolactone (GBL) was 464.29 g, the amount of TFMB was 103.50 g, the amount of 6FDA was 146.50 g, and the molar ratio of TFMB to 6FDA was 6FDA:
  • Example 1 except that the TFMB was 1.00: 0.98, the monomer concentration in the liquid was 35 wt%, no pressure reduction was performed during the process, and the stirring was performed for 5 hours after the internal temperature reached 180 ° C. In the same manner, a film having a Tt of 92.5%, a haze of 0.1%, and a yellowness of 3.0 was obtained.
  • the mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 1.0.
  • Table 1 shows the conditions and results.
  • Example A1 Manufacture of polyimide varnish
  • GBL ⁇ -butyrolactone
  • TFMB 2,2′-bis (trifluoromethyl) -4,4′-diaminodiphenyl
  • 6FDA 4,4 ′-(hexafluoroisopropylidene) diphthalic dianhydride
  • the molar ratio of TFMB and 6FDA added was 1.00: 0.995 for 6FDA: TFMB, and the monomer concentration was 45 wt%.
  • the mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.5.
  • the pressure was reduced to 610 mmHg, and then the internal temperature was raised to 200 ° C.
  • the mixture was further heated and stirred for 5.5 hours, then returned to atmospheric pressure and cooled to 170 ° C. to obtain a polyimide solution.
  • the oxygen concentration in the reaction vessel was confirmed before and after decompression, it was 0.2%.
  • GBL solvent B
  • Example A2 The amount of ⁇ -butyrolactone (GBL) was changed to 375.03 g, and when the internal temperature reached 120 ° C., the pressure was reduced to 610 mmHg, then the internal temperature was increased to 180 ° C., and after reaching 180 ° C., further 8.
  • a polyimide solution was obtained in the same manner as in Example A1 except that heating and stirring were performed for 5 hours. In all the solutions in the reaction vessel, the monomer concentration was 40 wt%. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.5. When the oxygen concentration in the reaction vessel was confirmed before and after decompression, it was 0.2%.
  • N, N-dimethylacetamide (DMAc) solvent B
  • solvent B N, N-dimethylacetamide
  • a polyimide film was produced in the same manner as in Example A1, and a film having a film thickness of 80 ⁇ m, Tt 92.0%, Haze 0.1%, and a yellowness of 3.9 was obtained.
  • Example A3 The amount of isoquinoline was changed to 0.5 g and the amount of ⁇ -butyrolactone (GBL) was changed to 375.03 g.
  • the pressure was reduced to 400 mmHg and then the internal temperature was raised to 180 ° C.
  • a polyimide solution was obtained in the same manner as in Example A1, except that the mixture was further heated and stirred for 8.5 hours.
  • the monomer concentration was 40 wt%.
  • the mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.2.
  • Example A4 The amount of isoquinoline was changed to 0.5 g, and when the internal temperature reached 120 ° C., the pressure was reduced to 400 mmHg, then the internal temperature was increased to 180 ° C. After reaching 180 ° C., the mixture was further stirred for 5.5 hours.
  • a polyimide solution was obtained in the same manner as in Example A1, except that this was performed. In all the solutions in the reaction vessel, the monomer concentration was 45 wt%. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.2. When the oxygen concentration in the reaction vessel was confirmed before and after decompression, it was less than 0.01%.
  • Example A5 A polyimide varnish was produced in the same manner as in Example A4.
  • a polyimide film was prepared in the same manner as in Example A4 except that N, N-dimethylacetamide (DMAc) to which a UV absorber (trade name Sumisorb 340 manufactured by Sumitomo Chemical Co., Ltd.) was added was added to the polyimide varnish.
  • DMAc N, N-dimethylacetamide
  • a UV absorber trade name Sumisorb 340 manufactured by Sumitomo Chemical Co., Ltd.
  • the film obtained had a thickness of 80 ⁇ m, Tt 92.4%, Haze 0.2%, and yellowness 2.3.
  • the unit phr in Table 2 means a part by mass with respect to 100 parts by mass of the polyimide polymer contained in the varnish.
  • Example A6 The amount of isoquinoline was changed to 0.5 g, and when the internal temperature reached 120 ° C., the pressure was reduced to 500 mmHg, then the internal temperature was increased to 180 ° C. After reaching 180 ° C., the mixture was further stirred for 5.5 hours.
  • a polyimide solution was obtained in the same manner as in Example A1, except that this was performed. In all the solutions in the reaction vessel, the monomer concentration was 45 wt%. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.2. When the oxygen concentration in the reaction vessel was confirmed before and after decompression, it was less than 0.01%.
  • Example A7 The amount of isoquinoline was changed to 0.5 g, and when the internal temperature reached 120 ° C., the pressure was reduced to 400 mmHg, then the internal temperature was increased to 180 ° C. After reaching 180 ° C., the mixture was further stirred for 5.5 hours.
  • a polyimide solution was obtained in the same manner as in Example A1 except that the procedure was performed. In all the solutions in the reaction vessel, the monomer concentration was 45 wt%. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.2. When the oxygen concentration in the reaction vessel was confirmed before and after decompression, it was less than 0.01%.
  • solvent B is added to the polyimide solution at 170 ° C. to obtain a uniform solution having a polyimide solid content of 40 wt%, and further, cyclopentanone (solvent B) is added at 130 ° C. to solidify the polyimide. A homogeneous solution having a content of 20 wt% was taken out, and the polyimide varnish was taken out from the reaction vessel.
  • a polyimide film was produced in the same manner as in Example A1, except that 500.00 g of cyclopentanone was added instead of DMAc and further diluted with respect to 200.00 g of the obtained polyimide varnish, and the film thickness was 80 ⁇ m, Tt 92.6%, A film having a haze of 0.1% and a yellowness of 1.9 was obtained.
  • Example A8 A polyimide varnish was produced in the same manner as in Example A7.
  • a polyimide film was produced in the same manner as in Example A7, except that cyclopentanone added with an ultraviolet absorber (trade name Sumisorb 340 manufactured by Sumitomo Chemical Co., Ltd.) was added to the polyimide varnish.
  • the resulting film had a thickness of 80 ⁇ m, Tt 92.5%, Haze 0.1%, and yellowness 2.4.
  • the unit phr in Table 2 means a part by mass with respect to 100 parts by mass of the polyimide polymer contained in the varnish.
  • Table 2 shows the conditions and results.
  • the yield of polyimide is expressed by the formula “(total amount of resin solids contained in solvent C after washing + total amount of resin solids in manufactured polyimide varnish (unit: weight)) / preparation of raw material monomers.
  • the theoretical amount (unit: weight) of the polyimide-based polymer calculated from the amount ⁇ 100 ” was calculated.
  • cleaning is the washing
  • the produced polyimide varnish is a polyimide varnish obtained by the second production of the polyimide varnish in the following examples.
  • the theoretical amount of polyimide polymer calculated from the charged amount of raw material monomer is the theoretical amount of polyimide polymer calculated from the charged amount of raw material monomer in the second production of polyimide varnish in the following example. .
  • Example B1 A polyimide varnish was produced in the same manner as in Example A7, and the obtained polyimide varnish was extracted from the reaction vessel, and then cyclopentanone was injected as a solvent C into the reaction vessel, heated to 130 ° C. and heated for 3 hours. And washed. The cyclopentanone used for washing was extracted from the reaction vessel and recovered (solvent C after washing). Thereafter, GBL was poured into the reaction vessel as solvent D, heated to 200 ° C., heated for 8 hours and washed. It was synthesized again according to Example 10 in the washed reaction vessel to obtain a second polyimide varnish.
  • the polyimide varnish was obtained using the solvent C after washing as the cyclopentanone of the solvent B for dilution added to the solution before taking out from the reaction vessel.
  • the polyimide contained in the obtained second polyimide varnish had a polystyrene-equivalent weight average molecular weight of 320,000, and the yield of polyimide was 97.2%.
  • a polyimide film was produced in the same manner as in Example A7, and a film having a film thickness of 80 ⁇ m, Tt 92.5%, Haze 0.1%, and a yellowness of 2.1 was obtained. .
  • Example B2 The second time in the same manner as in Example B1, except that the washing time with cyclopentanone in solvent C after the polyimide varnish was extracted from the reaction vessel was changed to 28 hours and the washing liquid was collected (solvent C after washing).
  • the polyimide varnish was obtained.
  • the polyimide contained in the obtained second polyimide varnish had a polystyrene equivalent weight average molecular weight of 340,000, and the yield of polyimide was 96.6%.
  • a polyimide film was produced in the same manner as in Example A7, and a film having a film thickness of 80 ⁇ m, Tt 92.6%, Haze 0.1%, and a yellowness of 2.2 was obtained. .
  • Example B3 A polyimide varnish was produced in the same manner as in Example A4. After the obtained polyimide varnish was extracted from the reaction vessel, GBL was injected as a solvent C into the reaction vessel, heated to 200 ° C., heated for 8 hours and washed. did. GBL used for washing was extracted from the reaction vessel and collected. Thereafter, GBL was poured into the reaction vessel as solvent D, heated to 200 ° C., heated for 8 hours and washed. A second polyimide varnish was produced in the same manner as in Example A4 using the washed reaction vessel. At this time, the solvents C and D after the washing were not added to the second production (dilution) of the polyimide varnish.
  • the polyimide contained in the obtained second polyimide varnish had a polystyrene equivalent weight average molecular weight of 360,000, and the yield of polyimide was 92.2%.
  • a polyimide film was produced in the same manner as in Example A4, and a film having a film thickness of 80 ⁇ m, Tt 92.7%, Haze 0.1%, and a yellowness of 1.7 was obtained. .
  • Example B4 A polyimide varnish was produced in the same manner as in Example A7. After the obtained polyimide varnish was extracted from the reaction vessel, GBL was injected as a solvent C into the reaction vessel, heated to 200 ° C., heated for 8 hours and washed. did. GBL used for washing was extracted from the reaction vessel and collected. Thereafter, GBL was poured into the reaction vessel as solvent D, heated to 200 ° C., heated for 8 hours and washed. A second polyimide varnish was produced in the same manner as in Example A7 using the washed reaction vessel. At this time, the solvents C and D after the washing were not added to the second production (dilution) of the polyimide varnish.
  • the polyimide contained in the obtained second polyimide varnish had a polystyrene equivalent weight average molecular weight of 310,000, and the yield of polyimide was 91.3%.
  • a polyimide film was produced in the same manner as in Example A7, and a film having a thickness of 80 ⁇ m, Tt 92.6%, Haze 0.1%, and a yellowness of 1.9 was obtained. .
  • the polyimide contained in the obtained second polyimide varnish had a polystyrene equivalent weight average molecular weight of 220,000, and the yield of polyimide was 94.5%.
  • a polyimide film was produced in the same manner as in Example A2, and a film having a thickness of 80 ⁇ m, Tt 92.0%, Haze 0.1%, and a yellowness of 3.9 was obtained. .
  • the conditions and results are shown in Table 3.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

This method for producing a polyimide-based polymer varnish comprises: a step for obtaining a polyimide-based polymer precursor by polymerizing a starting material monomer of a polyimide-based polymer in a solvent; and a step for obtaining a solution of the polyimide-based polymer by imidizing the polyimide-based polymer precursor in a solvent containing a tertiary amine in a reduced pressure environment.

Description

ポリイミド系高分子ワニスの製造方法、ポリイミド系高分子フィルムの製造方法、及び、透明ポリイミド系高分子フィルムMethod for producing polyimide polymer varnish, method for producing polyimide polymer film, and transparent polyimide polymer film

 本発明は、ポリイミド系高分子ワニスの製造方法、ポリイミド系高分子フィルムの製造方法、及び、透明ポリイミド系高分子フィルムに関する。 The present invention relates to a method for producing a polyimide polymer varnish, a method for producing a polyimide polymer film, and a transparent polyimide polymer film.

 従来、窒素気流下、ポリイミドの原料モノマーを溶媒中で重合及びイミド化してポリイミド溶液を得るポリイミド溶液の製造方法が知られている。このような反応系においては、ポリイミドの原料モノマーが溶媒中で混合されると、原料モノマーが重合してポリアミック酸が生成され、さらにこれを加熱することでポリアミック酸のイミド化が進行し、ポリイミドが生成される。その際に、イミド化を促進する触媒として第三級アミン化合物を添加することが知られている。 Conventionally, a polyimide solution manufacturing method is known in which a polyimide raw material monomer is polymerized and imidized in a solvent in a nitrogen stream to obtain a polyimide solution. In such a reaction system, when the raw material monomer of polyimide is mixed in a solvent, the raw material monomer is polymerized to produce a polyamic acid, and further, the imidization of the polyamic acid proceeds by heating the polyimide. Is generated. At that time, it is known to add a tertiary amine compound as a catalyst for promoting imidization.

特開2000-080272号公報JP 2000-080272 A

 しかしながら、重合及びイミド化により得られた触媒含有ポリイミド溶液をそのままフィルムに流延成形すると、耐折性が良好なフィルムを得ることは困難であった。フィルム化工程前にアルコール沈殿法などによる精製を行うことも知られているが、精製工程はコストが嵩むため、精製工程を含むプロセスはコスト面で不利な傾向がある。
 また、量産時においてポリイミド系高分子の透明性を高く維持することも求められる。
However, when the catalyst-containing polyimide solution obtained by polymerization and imidization is cast into a film as it is, it is difficult to obtain a film with good folding resistance. It is also known that purification by an alcohol precipitation method or the like is performed before the film forming step. However, since the purification step is expensive, a process including the purification step tends to be disadvantageous in terms of cost.
In addition, it is also required to maintain high transparency of the polyimide polymer during mass production.

 本発明は上記課題に鑑みてなされたもので有り、精製工程を経ずにフィルムに高い耐折性を与えることができる、ポリイミド系高分子ワニスの製造方法等を提供することを目的とする。
 また、本発明の他の課題は、透明性の高いポリイミド系高分子の量産に適したポリイミド系高分子ワニスの製造方法を提供することを目的とする。
This invention is made | formed in view of the said subject, and it aims at providing the manufacturing method etc. of a polyimide-type polymer varnish etc. which can give high folding resistance to a film, without passing through a refinement | purification process.
Another object of the present invention is to provide a method for producing a polyimide polymer varnish suitable for mass production of a highly transparent polyimide polymer.

 本発明に係るポリイミド系高分子ワニスの製造方法は、ポリイミド系高分子の原料モノマーを溶媒中において重合してポリイミド系高分子前駆体を得る重合工程、及び、減圧環境下、第三級アミンを含む溶媒中において、前記ポリイミド系高分子前駆体をイミド化してポリイミド系高分子の溶液を得るイミド化工程を含む。 The method for producing a polyimide polymer varnish according to the present invention comprises a polymerization step of polymerizing a raw material monomer of a polyimide polymer in a solvent to obtain a polyimide polymer precursor, and a tertiary amine in a reduced pressure environment. In the solvent to contain, the imidization process which imidizes the said polyimide-type polymer precursor and obtains the solution of a polyimide-type polymer is included.

 ここで、前記イミド化工程の温度が100℃以上250℃以下であることができる。 Here, the temperature of the imidization step may be 100 ° C. or more and 250 ° C. or less.

 また、前記第三級アミンが、120℃以上350℃以下の沸点を有することができる。 The tertiary amine may have a boiling point of 120 ° C. or higher and 350 ° C. or lower.

 また、前記ポリイミド系高分子がフッ素を20質量%以上含むことができる。 The polyimide polymer may contain 20% by mass or more of fluorine.

 また、前記減圧環境の圧力は350mmHg以上730mmHg以下であることができ、前記減圧環境の圧力は500mmHg以上730mmHg以下であることもできる。 The pressure in the reduced pressure environment may be 350 mmHg or more and 730 mmHg or less, and the pressure in the reduced pressure environment may be 500 mmHg or more and 730 mmHg or less.

 また、前記イミド化工程において溶媒と接触する気相の酸素濃度が0.02%以下であることができる。 In addition, the oxygen concentration in the gas phase contacting the solvent in the imidization step may be 0.02% or less.

 また、100質量部の前記原料モノマーに対して、前記第三級アミンを0.05質量部以上0.7質量部以下添加することができる。 Further, the tertiary amine can be added in an amount of 0.05 to 0.7 parts by mass with respect to 100 parts by mass of the raw material monomer.

 上記方法は、得られた前記ポリイミド系高分子の溶液に、紫外線吸収剤を添加する工程をさらに備えることができる。また、上記方法は、得られた前記ポリイミド系高分子の溶液に、シリカゾルを添加する工程をさらに備えることができる。 The above method may further comprise a step of adding an ultraviolet absorber to the obtained polyimide polymer solution. The method may further include a step of adding silica sol to the obtained polyimide polymer solution.

 本発明に係るポリイミド系高分子フィルムの製造方法は、上記のポリイミド系高分子ワニスの製造方法を実施する工程と、得られたポリイミド系高分子ワニス中のポリイミド系高分子を析出及び再溶解させることなく、前記ポリイミド系高分子ワニスを流延成形するフィルム化工程と、を備えることができる。 The method for producing a polyimide-based polymer film according to the present invention includes a step of performing the above-described method for producing a polyimide-based polymer varnish, and depositing and re-dissolving the polyimide-based polymer in the obtained polyimide-based polymer varnish. And a film forming step of casting the polyimide polymer varnish.

 本発明に係るフィルムは、重量平均分子量が50,000以上、500,000以下であるポリイミド系高分子と、フィルムの全質量に対して0.01質量%以上0.25質量%以下の第三級アミンとを含む。
 前記第三級アミンの沸点は120℃以上350℃以下であることができる。
The film according to the present invention includes a polyimide polymer having a weight average molecular weight of 50,000 or more and 500,000 or less, and a third polymer having a weight average molecular weight of 0.01 mass% or more and 0.25 mass% or less based on the total mass of the film. And a secondary amine.
The tertiary amine may have a boiling point of 120 ° C. or higher and 350 ° C. or lower.

 本発明に掛かる別のポリイミド系高分子ワニスの製造方法は、
(1) 反応容器において、溶媒A中でモノマー原料を反応させてポリイミド系高分子の溶液を得る工程、
(3) 前記反応容器から前記溶液を取り出す工程、
(4) 溶媒Cで前記反応容器を洗浄し、洗浄後の前記溶媒Cを前記反応容器から取り出す工程、を備え、前記工程(1)、(3)、及び(4)を、同一の反応容器を用いてこの順に繰り返す。そして、前記工程(1)で得られるポリイミド系高分子は、透明であり、かつ重量平均分子量が250,000以上である。
The production method of another polyimide polymer varnish according to the present invention is as follows:
(1) In a reaction vessel, a step of reacting monomer raw materials in solvent A to obtain a polyimide polymer solution;
(3) removing the solution from the reaction vessel;
(4) washing the reaction vessel with solvent C, and removing the washed solvent C from the reaction vessel, wherein the steps (1), (3), and (4) are the same reaction vessel. Repeat in this order. The polyimide polymer obtained in the step (1) is transparent and has a weight average molecular weight of 250,000 or more.

 この発明によれば、洗浄工程を有することで、2回目以降の工程(1)において、それ以前の工程(1)で生成した高分子が反応容器に残存する量を低減することができる。したがって、2回目以降の工程(1)において合成されるポリイミド系高分子の透明性の低下を抑制できる。 According to this invention, by having the washing step, the amount of the polymer produced in the previous step (1) remaining in the reaction vessel can be reduced in the second and subsequent steps (1). Therefore, the transparency fall of the polyimide-type polymer synthesize | combined in the process (1) after the 2nd time can be suppressed.

 ここで、上記方法は、
 (5) 前記工程(4)の後に、溶媒Dで前記反応容器を洗浄し、洗浄後の前記溶媒Dを前記反応容器から取り出す工程、をさらに備えることができ、
 前記工程(1)、(3)、(4)及び(5)を、同一の反応容器を用いてこの順に繰り返すことができる。
Here, the above method is
(5) After the step (4), the method may further comprise a step of washing the reaction vessel with a solvent D and taking out the solvent D after washing from the reaction vessel.
The steps (1), (3), (4) and (5) can be repeated in this order using the same reaction vessel.

 これによれば、より一層、反応容器に残存する高分子の量を低減できる。 According to this, the amount of the polymer remaining in the reaction vessel can be further reduced.

 また、上記方法は、前記工程(1)と前記工程(3)との間に、
 (2) 前記反応容器内に溶媒Bを追加して前記工程(1)で得られた前記溶液を希釈する工程をさらに備えることができ、
 前記工程(1)~(4)、又は、前記工程(1)~(5)を同一の反応容器を用いて繰り返すことができる。
Moreover, the said method is between the said process (1) and the said process (3),
(2) The method may further comprise a step of diluting the solution obtained in the step (1) by adding the solvent B in the reaction vessel,
The steps (1) to (4) or the steps (1) to (5) can be repeated using the same reaction vessel.

 これによれば、溶液の抜き出し前の反応容器内のポリイミド系高分子の濃度が低下するため、抜き出し後の反応容器における高分子の残存量をより一層少なくできる。 According to this, since the concentration of the polyimide-based polymer in the reaction vessel before the solution is extracted is lowered, the remaining amount of the polymer in the reaction vessel after the extraction can be further reduced.

 また、前記溶媒Bは、前記工程(4)で前記反応容器から取り出された溶媒Cであることができる。 Also, the solvent B can be the solvent C taken out from the reaction vessel in the step (4).

 これによれば、溶媒B中に回収された高分子が、次バッチで製造するワニス中のポリイミド系高分子の一部となるため、収率が向上する。 According to this, since the polymer recovered in the solvent B becomes a part of the polyimide polymer in the varnish to be produced in the next batch, the yield is improved.

 本発明によれば、精製工程を経ずにポリイミド系高分子を直接フィルム化してもフィルムに高い耐折性を与えることができる、ポリイミドワニスの製造方法等が提供される。
 また、本発明によれば、透明性の高いポリイミド系樹脂の量産に適したポリイミド系高分子ワニスの製造方法が提供される。
ADVANTAGE OF THE INVENTION According to this invention, the manufacturing method of a polyimide varnish etc. which can give high folding resistance to a film even if it makes a polyimide-type polymer directly into a film without going through a refinement | purification process are provided.
Moreover, according to this invention, the manufacturing method of the polyimide-type polymer varnish suitable for mass production of a highly transparent polyimide-type resin is provided.

 本発明の実施形態に係るポリイミド系高分子ワニスの製造方法について説明する。この方法は、ポリイミド系高分子の原料モノマーを溶媒中において重合してポリイミド系高分子前駆体を得る重合工程、及び、減圧環境下、第三級アミンを含む溶媒中において前記ポリイミド系高分子前駆体をイミド化して、ポリイミド系高分子溶液を得るイミド化工程を含む。 A method for producing a polyimide-based polymer varnish according to an embodiment of the present invention will be described. This method includes a polymerization step of polymerizing a raw material monomer of a polyimide polymer in a solvent to obtain a polyimide polymer precursor, and the polyimide polymer precursor in a solvent containing a tertiary amine under a reduced pressure environment. An imidization step of imidizing the body to obtain a polyimide polymer solution.

 (ポリイミド系高分子の原料モノマー)
 原料モノマーは、テトラカルボン酸化合物及びジアミンを含む。
(Raw material monomer of polyimide polymer)
The raw material monomer includes a tetracarboxylic acid compound and a diamine.

 (テトラカルボン酸化合物)
 テトラカルボン酸化合物の例は、芳香族テトラカルボン酸二無水物等の芳香族テトラカルボン酸化合物、及び脂肪族テトラカルボン酸二無水物等の脂肪族テトラカルボン酸化合物である。テトラカルボン酸化合物は、単独で用いてもよいし、2種以上を併用してもよい。テトラカルボン酸化合物は、テトラカルボン酸二無水物の他、テトラカルボン酸クロライド化合物等のテトラカルボン酸化合物類縁体であってもよい。
(Tetracarboxylic acid compound)
Examples of the tetracarboxylic acid compound are an aromatic tetracarboxylic acid compound such as an aromatic tetracarboxylic dianhydride and an aliphatic tetracarboxylic acid compound such as an aliphatic tetracarboxylic dianhydride. A tetracarboxylic acid compound may be used independently and may use 2 or more types together. The tetracarboxylic acid compound may be a tetracarboxylic acid compound analog such as a tetracarboxylic acid chloride compound in addition to the tetracarboxylic acid dianhydride.

 芳香族テトラカルボン酸二無水物の具体例としては、非縮合多環式の芳香族テトラカルボン酸二無水物、単環式の芳香族テトラカルボン酸二無水物、および、縮合多環式の芳香族テトラカルボン酸二無水物が挙げられる。
 非縮合多環式の芳香族テトラカルボン酸二無水物としては、4,4’-オキシジフタル酸二無水物、3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物、2,2’,3,3’-ベンゾフェノンテトラカルボン酸二無水物、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、2,2’,3,3’-ビフェニルテトラカルボン酸二無水物、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物、2,2-ビス(3,4-ジカルボキシフェニル)プロパン二無水物、2,2-ビス(2,3-ジカルボキシフェニル)プロパン二無水物、2,2-ビス(3,4-ジカルボキシフェノキシフェニル)プロパン二無水物、4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸二無水物(6FDAと呼ぶことがある。)、1,2-ビス(2,3-ジカルボキシフェニル)エタン二無水物、1,1-ビス(2,3-ジカルボキシフェニル)エタン二無水物、1,2-ビス(3,4-ジカルボキシフェニル)エタン二無水物、1,1-ビス(3,4-ジカルボキシフェニル)エタン二無水物、ビス(3,4-ジカルボキシフェニル)メタン二無水物、ビス(2,3-ジカルボキシフェニル)メタン二無水物、4,4’-(p-フェニレンジオキシ)ジフタル酸二無水物、4,4’-(m-フェニレンジオキシ)ジフタル酸二無水物が挙げられる。
 また、縮合多環式の芳香族テトラカルボン酸二無水物としては、2,3,6,7-ナフタレンテトラカルボン酸二無水物が挙げられる。
 芳香族テトラカルボン酸二無水物として、好ましくは4,4’-オキシジフタル酸二無水物、3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物、2,2’,3,3’-ベンゾフェノンテトラカルボン酸二無水物、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、2,2’,3,3’-ビフェニルテトラカルボン酸二無水物、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物、2,2-ビス(3,4-ジカルボキシフェニル)プロパン二無水物、2,2-ビス(2,3-ジカルボキシフェニル)プロパン二無水物、2,2-ビス(3,4-ジカルボキシフェノキシフェニル)プロパン二無水物、4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸二無水物、1,2-ビス(2,3-ジカルボキシフェニル)エタン二無水物、1,1-ビス(2,3-ジカルボキシフェニル)エタン二無水物、1,2-ビス(3,4-ジカルボキシフェニル)エタン二無水物、1,1-ビス(3,4-ジカルボキシフェニル)エタン二無水物、ビス(3,4-ジカルボキシフェニル)メタン二無水物、ビス(2,3-ジカルボキシフェニル)メタン二無水物、4,4’-(p-フェニレンジオキシ)ジフタル酸二無水物及び4,4’-(m-フェニレンジオキシ)ジフタル酸二無水物が挙げられる。これらは単独で又は2種以上を組み合わせて用いることができる。
Specific examples of the aromatic tetracarboxylic dianhydride include non-condensed polycyclic aromatic tetracarboxylic dianhydride, monocyclic aromatic tetracarboxylic dianhydride, and condensed polycyclic fragrance. Group tetracarboxylic dianhydride.
Non-condensed polycyclic aromatic tetracarboxylic dianhydrides include 4,4'-oxydiphthalic dianhydride, 3,3 ', 4,4'-benzophenone tetracarboxylic dianhydride, 2,2' , 3,3′-benzophenonetetracarboxylic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride, 3,3 ′, 4,4′-diphenylsulfonetetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2,3-dicarboxy) Phenyl) propane dianhydride, 2,2-bis (3,4-dicarboxyphenoxyphenyl) propane dianhydride, 4,4 '-(hexafluoroisopropylidene) diphthalic dianhydride (6FDA) ), 1, 2 Bis (2,3-dicarboxyphenyl) ethane dianhydride, 1,1-bis (2,3-dicarboxyphenyl) ethane dianhydride, 1,2-bis (3,4-dicarboxyphenyl) ethane Anhydride, 1,1-bis (3,4-dicarboxyphenyl) ethane dianhydride, bis (3,4-dicarboxyphenyl) methane dianhydride, bis (2,3-dicarboxyphenyl) methane dianhydride 4,4 ′-(p-phenylenedioxy) diphthalic dianhydride and 4,4 ′-(m-phenylenedioxy) diphthalic dianhydride.
Examples of the condensed polycyclic aromatic tetracarboxylic dianhydride include 2,3,6,7-naphthalene tetracarboxylic dianhydride.
As the aromatic tetracarboxylic dianhydride, preferably 4,4′-oxydiphthalic dianhydride, 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 2,2 ′, 3,3 ′ -Benzophenone tetracarboxylic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, 2,2', 3,3'-biphenyltetracarboxylic dianhydride, 3,3 ', 4,4'-diphenylsulfonetetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2,3-dicarboxyphenyl) propane dianhydride 2,2-bis (3,4-dicarboxyphenoxyphenyl) propane dianhydride, 4,4 '-(hexafluoroisopropylidene) diphthalic dianhydride, 1,2-bis (2,3-di Carboxyphenyl Ethane dianhydride, 1,1-bis (2,3-dicarboxyphenyl) ethane dianhydride, 1,2-bis (3,4-dicarboxyphenyl) ethane dianhydride, 1,1-bis (3 , 4-Dicarboxyphenyl) ethane dianhydride, bis (3,4-dicarboxyphenyl) methane dianhydride, bis (2,3-dicarboxyphenyl) methane dianhydride, 4,4 ′-(p- And phenylenedioxy) diphthalic dianhydride and 4,4 ′-(m-phenylenedioxy) diphthalic dianhydride. These can be used alone or in combination of two or more.

 脂肪族テトラカルボン酸二無水物としては、環式又は非環式の脂肪族テトラカルボン酸二無水物が挙げられる。環式脂肪族テトラカルボン酸二無水物とは、脂環式炭化水素構造を有するテトラカルボン酸二無水物であり、その具体例としては、1,2,4,5-シクロヘキサンテトラカルボン酸二無水物、1,2,3,4-シクロブタンテトラカルボン酸二無水物、1,2,3,4-シクロペンタンテトラカルボン酸二無水物等のシクロアルカンテトラカルボン酸二無水物、ビシクロ[2.2.2]オクト-7-エン-2,3,5,6-テトラカルボン酸二無水物、ジシクロヘキシル3,3’-4,4’-テトラカルボン酸二無水物及びこれらの位置異性体が挙げられる。これらは単独で又は2種以上を組み合わせて用いることができる。非環式脂肪族テトラカルボン酸二無水物の具体例としては、1,2,3,4-ブタンテトラカルボン酸二無水物、1,2,3,4-ペンタンテトラカルボン酸二無水物等が挙げられ、これらは単独で又は2種以上を組み合わせて用いることができる。 Examples of the aliphatic tetracarboxylic dianhydride include cyclic or acyclic aliphatic tetracarboxylic dianhydrides. The cycloaliphatic tetracarboxylic dianhydride is a tetracarboxylic dianhydride having an alicyclic hydrocarbon structure, and specific examples thereof include 1,2,4,5-cyclohexanetetracarboxylic dianhydride. 1, 2,3,4-cyclobutanetetracarboxylic dianhydride, cycloalkanetetracarboxylic dianhydride such as 1,2,3,4-cyclopentanetetracarboxylic dianhydride, bicyclo [2.2 .2] Oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, dicyclohexyl 3,3′-4,4′-tetracarboxylic dianhydride and their positional isomers . These can be used alone or in combination of two or more. Specific examples of the acyclic aliphatic tetracarboxylic dianhydride include 1,2,3,4-butanetetracarboxylic dianhydride, 1,2,3,4-pentanetetracarboxylic dianhydride and the like. These may be used alone or in combination of two or more.

 フィルムの透明性及び着色の抑制の観点から、テトラカルボン酸化合物は、前記脂環式テトラカルボン酸二無水物又は非縮合多環式の芳香族テトラカルボン酸二無水物が好ましい。より好ましい具体例としては、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、2,2’,3,3’-ビフェニルテトラカルボン酸二無水物、2,2-ビス(3,4-ジカルボキシフェニル)プロパン二無水物、4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸二無水物(6FDA)が挙げられる。これらは単独で又は2種以上を組み合わせて用いることができる。 From the viewpoint of transparency of the film and suppression of coloring, the tetracarboxylic acid compound is preferably the alicyclic tetracarboxylic dianhydride or the non-condensed polycyclic aromatic tetracarboxylic dianhydride. More preferred specific examples include 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride, 2,2-bis (3 , 4-dicarboxyphenyl) propane dianhydride, 4,4 ′-(hexafluoroisopropylidene) diphthalic dianhydride (6FDA). These can be used alone or in combination of two or more.

 (トリカルボン酸化合物及びジカルボン酸化合物)
 原料モノマーは、さらに、トリカルボン酸化合物及び/又はジカルボン酸化合物を含むことができる。
 トリカルボン酸化合物としては、芳香族トリカルボン酸、脂肪族トリカルボン酸及びそれらの類縁の酸クロライド化合物、酸無水物等が挙げられ、2種以上を併用してもよい。
具体例としては、1,2,4-ベンゼントリカルボン酸の無水物;2,3,6-ナフタレントリカルボン酸-2,3-無水物;フタル酸無水物と安息香酸とが単結合、-CH-、-C(CH-、-C(CF-、-SO-もしくはフェニレン基で連結された化合物が挙げられる。
(Tricarboxylic acid compound and dicarboxylic acid compound)
The raw material monomer can further contain a tricarboxylic acid compound and / or a dicarboxylic acid compound.
Examples of tricarboxylic acid compounds include aromatic tricarboxylic acids, aliphatic tricarboxylic acids, and related acid chloride compounds, acid anhydrides, and the like, and two or more of them may be used in combination.
Specific examples include 1,2,4-benzenetricarboxylic acid anhydride; 2,3,6-naphthalenetricarboxylic acid-2,3-anhydride; phthalic acid anhydride and benzoic acid are a single bond, —CH 2 Examples thereof include compounds linked by —, —C (CH 3 ) 2 —, —C (CF 3 ) 2 —, —SO 2 —, or a phenylene group.

 ジカルボン酸化合物としては、芳香族ジカルボン酸、脂肪族ジカルボン酸及びそれらの類縁の酸クロライド化合物、酸無水物等が挙げられ、2種以上を併用してもよい。具体例としては、テレフタル酸;イソフタル酸;ナフタレンジカルボン酸;4,4’-ビフェニルジカルボン酸;3,3’-ビフェニルジカルボン酸;炭素数8以下である鎖式炭化水素、のジカルボン酸化合物及び2つの安息香酸が-CH-、-C(CH-、-C(CF-、-SO-もしくはフェニレン基で連結された化合物が挙げられる。 Examples of the dicarboxylic acid compound include aromatic dicarboxylic acids, aliphatic dicarboxylic acids, and related acid chloride compounds, acid anhydrides, and the like, and two or more kinds may be used in combination. Specific examples include dicarboxylic acid compounds of terephthalic acid; isophthalic acid; naphthalenedicarboxylic acid; 4,4′-biphenyldicarboxylic acid; 3,3′-biphenyldicarboxylic acid; And compounds in which two benzoic acids are linked by —CH 2 —, —C (CH 3 ) 2 —, —C (CF 3 ) 2 —, —SO 2 —, or a phenylene group.

 テトラカルボン酸化合物、トリカルボン酸化合物、及び、ジカルボン酸化合物の合計に対する、テトラカルボン酸化合物の割合は好ましくは40モル%以上であり、より好ましくは50モル%以上であり、更に好ましくは70モル%以上であり、より更に好ましくは90モル%以上であり、とりわけ好ましくは98モル%以上である。 The ratio of the tetracarboxylic acid compound to the total of the tetracarboxylic acid compound, tricarboxylic acid compound, and dicarboxylic acid compound is preferably 40 mol% or more, more preferably 50 mol% or more, still more preferably 70 mol%. Or more, more preferably 90 mol% or more, and particularly preferably 98 mol% or more.

 (ジアミン)
 ジアミンの例は、脂肪族ジアミン、芳香族ジアミン又はそれらの混合物である。なお、本実施形態において「芳香族ジアミン」とは、アミノ基が芳香環に直接結合しているジアミンを表し、その構造の一部に脂肪族基又はその他の置換基を含んでいてもよい。芳香環は単環でも縮合環でもよく、ベンゼン環、ナフタレン環、アントラセン環及びフルオレン環等が例示されるが、これらに限定されるわけではない。これらの中でも、好ましくはベンゼン環である。また「脂肪族ジアミン」とは、アミノ基が脂肪族基に直接結合しているジアミンを表し、その構造の一部に芳香環やその他の置換基を含んでいてもよい。
(Diamine)
Examples of diamines are aliphatic diamines, aromatic diamines or mixtures thereof. In the present embodiment, the “aromatic diamine” represents a diamine in which an amino group is directly bonded to an aromatic ring, and an aliphatic group or other substituent may be included in a part of the structure. The aromatic ring may be a single ring or a condensed ring, and examples thereof include, but are not limited to, a benzene ring, a naphthalene ring, an anthracene ring, and a fluorene ring. Among these, a benzene ring is preferable. The “aliphatic diamine” refers to a diamine in which an amino group is directly bonded to an aliphatic group, and an aromatic ring or other substituent may be included in a part of the structure.

 脂肪族ジアミンとしては、例えば、ヘキサメチレンジアミン等の非環式脂肪族ジアミン及び1,3-ビス(アミノメチル)シクロヘキサン、1,4-ビス(アミノメチル)シクロヘキサン、ノルボルナンジアミン、4,4’-ジアミノジシクロヘキシルメタン等の環式脂肪族ジアミン等が挙げられ、これらは単独で又は2種以上を組み合わせて用いることができる。 Examples of the aliphatic diamine include acyclic aliphatic diamines such as hexamethylene diamine, 1,3-bis (aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cyclohexane, norbornane diamine, 4,4′- Examples include cycloaliphatic diamines such as diaminodicyclohexylmethane, and these can be used alone or in combination of two or more.

 芳香族ジアミンの例は、p-フェニレンジアミン、m-フェニレンジアミン、2,4-トルエンジアミン、m-キシリレンジアミン、p-キシリレンジアミン、1,5-ジアミノナフタレン、2,6-ジアミノナフタレン等の、芳香環を1つ有する芳香族ジアミン、4,4’-ジアミノジフェニルメタン、4,4’-ジアミノジフェニルプロパン、4,4’-ジアミノジフェニルエーテル、3,4’-ジアミノジフェニルエーテル、3,3’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルスルホン、3,4’-ジアミノジフェニルスルホン、3,3’-ジアミノジフェニルスルホン、1,4-ビス(4-アミノフェノキシ)ベンゼン、1,3-ビス(4-アミノフェノキシ)ベンゼン、4,4’-ジアミノジフェニルスルホン、ビス〔4-(4-アミノフェノキシ)フェニル〕スルホン、ビス〔4-(3-アミノフェノキシ)フェニル〕スルホン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン、2,2-ビス[4-(3-アミノフェノキシ)フェニル]プロパン、2,2’-ジメチルベンジジン、2,2’-ビス(トリフルオロメチル)-4,4’-ジアミノジフェニル(TFMBと呼ぶことがある)、4,4’-ビス(4-アミノフェノキシ)ビフェニル、4,4’-ジアミノジフェニルエーテル、3,4’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルメタン、9,9-ビス(4-アミノフェニル)フルオレン、9,9-ビス(4-アミノ-3-メチルフェニル)フルオレン、9,9-ビス(4-アミノ-3-クロロフェニル)フルオレン、9,9-ビス(4-アミノ-3-フルオロフェニル)フルオレン等の、芳香環を2つ以上有する芳香族ジアミンである。これらは単独で又は2種以上を組み合わせて用いることができる。 Examples of aromatic diamines are p-phenylenediamine, m-phenylenediamine, 2,4-toluenediamine, m-xylylenediamine, p-xylylenediamine, 1,5-diaminonaphthalene, 2,6-diaminonaphthalene, etc. Aromatic diamine having one aromatic ring, 4,4′-diaminodiphenylmethane, 4,4′-diaminodiphenylpropane, 4,4′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether, 3,3′- Diaminodiphenyl ether, 4,4′-diaminodiphenylsulfone, 3,4′-diaminodiphenylsulfone, 3,3′-diaminodiphenylsulfone, 1,4-bis (4-aminophenoxy) benzene, 1,3-bis (4 -Aminophenoxy) benzene, 4,4'-diaminodiphenylsulfur Bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] sulfone, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2, 2-bis [4- (3-aminophenoxy) phenyl] propane, 2,2′-dimethylbenzidine, 2,2′-bis (trifluoromethyl) -4,4′-diaminodiphenyl (TFMB) ), 4,4′-bis (4-aminophenoxy) biphenyl, 4,4′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether, 4,4′-diaminodiphenylmethane, 9,9-bis (4-aminophenyl) ) Fluorene, 9,9-bis (4-amino-3-methylphenyl) fluorene, 9,9-bis (4-amino-3-chloro) Eniru) fluorene, 9,9-bis (4-amino-3-fluorophenyl) fluorene, etc., an aromatic diamine having two or more aromatic rings. These can be used alone or in combination of two or more.

 ジアミンは、フッ素系置換基を有することもできる。フッ素系置換基の例は、トリフルオロメチル基などの炭素数1~5のパーフルオロアルキル基、及び、フルオロ基である。 The diamine can also have a fluorine-based substituent. Examples of the fluorine-based substituent are a perfluoroalkyl group having 1 to 5 carbon atoms such as a trifluoromethyl group, and a fluoro group.

 上記ジアミンの中でも、高透明性及び低着色性の観点からは、ビフェニル構造を有する芳香族ジアミンからなる群から選ばれる1種以上を用いることが好ましい。2,2’-ジメチルベンジジン、2,2’-ビス(トリフルオロメチル)ベンジジン(TFMB)及び4,4’-ビス(4-アミノフェノキシ)ビフェニルからなる群から選ばれる1種以上を用いることがさらに好ましい。
 ジアミンは、ビフェニル構造及びフッ素系置換基を有するジアミンであることが好適で有り、その例は、2,2’-ビス(トリフルオロメチル)-4,4’-ジアミノジフェニル(TFMB)である。
Among the diamines, from the viewpoint of high transparency and low colorability, it is preferable to use one or more selected from the group consisting of aromatic diamines having a biphenyl structure. One or more selected from the group consisting of 2,2′-dimethylbenzidine, 2,2′-bis (trifluoromethyl) benzidine (TFMB) and 4,4′-bis (4-aminophenoxy) biphenyl may be used. Further preferred.
The diamine is preferably a diamine having a biphenyl structure and a fluorine-based substituent, and an example thereof is 2,2′-bis (trifluoromethyl) -4,4′-diaminodiphenyl (TFMB).

 原料モノマー中のジアミンと、テトラカルボン酸化合物等のカルボン酸化合物とのモル比は、ジアミン1.00molに対して、好ましくはテトラカルボン酸0.9mol以上1.1mol以下の範囲で適宜調節できる。高い耐折性を発現するためには得られるポリイミド系高分子が高分子量であることが好ましいことから、ジアミン1.00molに対してテトラカルボン酸0.98mol以上1.02molであることがより好ましく、0.99mol%以上1.01mol%以下であることが更に好ましい。
 また、得られるポリイミド系高分子フィルムの黄色度を抑制する観点から、得られる高分子末端に占めるアミノ基の割合が低いことが好ましく、ジアミン1.00molに対してテトラカルボン酸化合物等のカルボン酸化合物は1.00mol以上であることが好ましい。
The molar ratio between the diamine in the raw material monomer and the carboxylic acid compound such as a tetracarboxylic acid compound can be suitably adjusted within a range of 0.9 mol to 1.1 mol of the tetracarboxylic acid with respect to 1.00 mol of the diamine. In order to develop high folding resistance, it is preferable that the obtained polyimide polymer has a high molecular weight, so that tetracarboxylic acid is 0.98 mol or more and 1.02 mol with respect to 1.00 mol of diamine. More preferably, they are 0.99 mol% or more and 1.01 mol% or less.
Further, from the viewpoint of suppressing the yellowness of the obtained polyimide-based polymer film, it is preferable that the proportion of amino groups in the resulting polymer terminal is low, and carboxylic acids such as tetracarboxylic acid compounds with respect to 1.00 mol of diamine The compound is preferably 1.00 mol or more.

 ジアミン及びカルボン酸化合物(たとえば、テトラカルボン酸化合物)の分子中のフッ素数を調整して、得られるポリイミド系高分子中のフッ素量を、ポリイミド系高分子の質量を基準として、1質量%以上、5質量%以上、10質量%以上、20質量%以上とすることができる。フッ素の割合が高いほど原料費が高くなる傾向があることから、フッ素量の上限は40質量%以下であることが好ましい。フッ素系置換基は、ジアミン又はカルボン酸化合物のいずれに存在してもよく、両方に存在してもよい。フッ素系置換基を含むことにより特にYI値が低減される場合がある。 Adjusting the number of fluorine in the molecule of diamine and carboxylic acid compound (for example, tetracarboxylic acid compound), the amount of fluorine in the resulting polyimide polymer is 1% by mass or more based on the mass of the polyimide polymer It can be 5 mass% or more, 10 mass% or more, or 20 mass% or more. Since the raw material cost tends to increase as the proportion of fluorine increases, the upper limit of the amount of fluorine is preferably 40% by mass or less. A fluorine-type substituent may exist in either diamine or a carboxylic acid compound, and may exist in both. By including a fluorine-based substituent, the YI value may be particularly reduced.

 (溶媒A)
 ポリイミド系高分子の合成(原料モノマーの重合及びイミド化)に用いられる溶媒Aは、重合により生成したポリイミド系高分子前駆体及びイミド化により生成するポリイミド系高分子を溶解可能な溶媒であることが好適である。このような溶媒としてはラクトン系溶媒、アミド系溶媒、含硫黄溶媒が挙げられ、具体的にはγブチロラクトン(沸点204℃)(GBLと呼ぶことがある)、N,N-ジメチルホルムアミド(沸点153℃)、N,N-ジメチルアセトアミド(沸点165℃)(DMAcと呼ぶことがある)、ジメチルスルホキシド(沸点189℃)等が例示される。溶媒は、混合物であってもよい。
(Solvent A)
The solvent A used for the synthesis of the polyimide polymer (polymerization and imidization of raw material monomers) is a solvent capable of dissolving the polyimide polymer precursor produced by polymerization and the polyimide polymer produced by imidization. Is preferred. Examples of such solvents include lactone solvents, amide solvents, and sulfur-containing solvents. Specifically, γ-butyrolactone (boiling point 204 ° C.) (sometimes referred to as GBL), N, N-dimethylformamide (boiling point 153). C), N, N-dimethylacetamide (boiling point 165 ° C.) (sometimes referred to as DMAc), dimethyl sulfoxide (boiling point 189 ° C.) and the like. The solvent may be a mixture.

 ポリイミドの合成において、後述するイミド化反応を高温で行う場合、溶媒Aは高沸点の溶媒であることが好ましい。沸点は160℃以上が好ましく、180℃以上であるとさらに好ましい。このような溶媒Aの例は、GBL,DMAc、ジメチルスルホキシドである。 In the synthesis of polyimide, when the imidization reaction described later is performed at a high temperature, the solvent A is preferably a high boiling point solvent. The boiling point is preferably 160 ° C. or higher, and more preferably 180 ° C. or higher. Examples of such solvent A are GBL, DMAc, dimethyl sulfoxide.

 (第三級アミン)
 第三級アミンは、溶媒中でポリイミド系高分子前駆体のイミド化触媒として機能し得る。
 三級アミンの例としては、式(a)で表される三級アミン(以下、三級アミンAともいう)、式(b)で表される三級アミン(以下、三級アミンBともいう)、式(c)で表される三級アミン(以下、三級アミンCともいう)、式(d)で表される三級アミン(以下、三級アミンDともいう)が挙げられる。
(Tertiary amine)
The tertiary amine can function as an imidization catalyst for the polyimide polymer precursor in a solvent.
Examples of tertiary amines include tertiary amines represented by formula (a) (hereinafter also referred to as tertiary amine A) and tertiary amines represented by formula (b) (hereinafter also referred to as tertiary amine B). ), Tertiary amines represented by formula (c) (hereinafter also referred to as tertiary amine C), and tertiary amines represented by formula (d) (hereinafter also referred to as tertiary amine D).

Figure JPOXMLDOC01-appb-C000001
 式(a)において、R1A、R2A、R3Aは、それぞれ異なっていてもよい炭素数1~12の一価の炭化水素基であり、R1A、R2A及びR3Aの炭素数の合計は10以上18以下である。
Figure JPOXMLDOC01-appb-C000001
In the formula (a), R 1A , R 2A and R 3A are each a monovalent hydrocarbon group having 1 to 12 carbon atoms which may be different from each other, and the total number of carbon atoms of R 1A , R 2A and R 3A Is 10 or more and 18 or less.

 三級アミンAの具体例としては、トリプロピルアミン、ジブチルプロピルアミン、エチルジブチルアミンが挙げられる。 Specific examples of tertiary amine A include tripropylamine, dibutylpropylamine, and ethyldibutylamine.

Figure JPOXMLDOC01-appb-C000002
 式(b)において、R1Bは、炭素数2~10の一価の炭化水素基であって、R2Bは炭素数3~12の二価の脂肪族炭化水素基であって、R1B及びR2Bの炭素数の合計は9~16である。
Figure JPOXMLDOC01-appb-C000002
In the formula (b), R 1B is a monovalent hydrocarbon group having 2 to 10 carbon atoms, R 2B is a divalent aliphatic hydrocarbon group having 3 to 12 carbon atoms, and R 1B and The total carbon number of R 2B is 9-16.

 三級アミンBの具体例としては、N-エチルピペリジン、N-プロピルピペリジン、N-ブチルピロリジン、N-ブチルピペリジン、N-プロピルヘキサヒドロアゼピンが挙げられる。 Specific examples of the tertiary amine B include N-ethylpiperidine, N-propylpiperidine, N-butylpyrrolidine, N-butylpiperidine, and N-propylhexahydroazepine.

Figure JPOXMLDOC01-appb-C000003
 式(c)において、R1Cは炭素数7~15の三価の脂肪族炭化水素基である。
Figure JPOXMLDOC01-appb-C000003
In the formula (c), R 1C is a trivalent aliphatic hydrocarbon group having 7 to 15 carbon atoms.

 三級アミンCの具体例としては、アザビシクロ[2.2.1]ヘプタン、アザビシクロ[3.2.1]オクタン、アザビシクロ[2.2.2]オクタン、アザビシクロ[3.2.2]ノナンが挙げられる。 Specific examples of the tertiary amine C include azabicyclo [2.2.1] heptane, azabicyclo [3.2.1] octane, azabicyclo [2.2.2] octane, and azabicyclo [3.2.2] nonane. Can be mentioned.

Figure JPOXMLDOC01-appb-C000004
 式(d)において、R1Dは炭素数8~15の三価の脂肪族炭化水素基である。
Figure JPOXMLDOC01-appb-C000004
In the formula (d), R 1D is a trivalent aliphatic hydrocarbon group having 8 to 15 carbon atoms.

 三級アミンDの具体例としては、2-メチルピリジン、3-メチルピリジン、4-メチルピリジン、2-エチルピリジン、3-エチルピリジン、4-エチルピリジン、2,4-ジメチルピリジン、2,4,6-トリメチルピリジン、3,4-シクロペンテノピリジン、5,6,7,8-テトラヒドロイソキノリン、イソキノリンが挙げられる。 Specific examples of the tertiary amine D include 2-methylpyridine, 3-methylpyridine, 4-methylpyridine, 2-ethylpyridine, 3-ethylpyridine, 4-ethylpyridine, 2,4-dimethylpyridine, 2,4 , 6-trimethylpyridine, 3,4-cyclopentenopyridine, 5,6,7,8-tetrahydroisoquinoline, isoquinoline.

 用いる三級アミンの沸点が高いと、減圧中の水分の留去に際して、系外に除かれる触媒量が抑制される傾向があるために好ましい。沸点が120℃以上の三級アミンが好ましく、沸点が140℃以上の三級アミンがより好ましく、沸点が170℃以上の三級アミンが更に好ましく、沸点が200℃以上の三級アミンがより更に好ましい。用いる三級アミンの沸点の上限は特に規定されないが、通常350℃以下である。低沸点の三級アミンを用いる場合ほど、留去分を考慮して触媒の使用量を増やす必要がある。 It is preferable that the tertiary amine used has a high boiling point because the amount of catalyst removed from the system tends to be suppressed when water is distilled off under reduced pressure. A tertiary amine having a boiling point of 120 ° C. or higher is preferable, a tertiary amine having a boiling point of 140 ° C. or higher is more preferable, a tertiary amine having a boiling point of 170 ° C. or higher is more preferable, and a tertiary amine having a boiling point of 200 ° C. or higher is still more preferable. preferable. Although the upper limit of the boiling point of the tertiary amine to be used is not particularly defined, it is usually 350 ° C. or lower. As the tertiary amine having a lower boiling point is used, it is necessary to increase the amount of the catalyst used in consideration of the distillate.

 前記三級アミンは、好ましくは三級アミンDであり、より好ましくは炭素数6以上13以下の三級アミンDである。更に好ましくは炭素数9以上13以下の三級アミンDであり、より更に好ましくはイソキノリン及びその水素化物である。 The tertiary amine is preferably a tertiary amine D, more preferably a tertiary amine D having 6 to 13 carbon atoms. More preferred is a tertiary amine D having 9 to 13 carbon atoms, and still more preferred is isoquinoline and its hydride.

 (ポリイミド系高分子ワニスの製造方法)
 この方法は、ポリイミド系高分子の原料モノマーを溶媒中において重合してポリイミド系高分子前駆体を得る重合工程、及び、減圧環境下、第三級アミンを含む溶媒中において前記ポリイミド系高分子前駆体をイミド化してポリイミド系高分子溶液を得るイミド化工程を含む。
(Production method of polyimide polymer varnish)
This method includes a polymerization step of polymerizing a raw material monomer of a polyimide polymer in a solvent to obtain a polyimide polymer precursor, and the polyimide polymer precursor in a solvent containing a tertiary amine under a reduced pressure environment. An imidization step of imidizing the body to obtain a polyimide polymer solution.

 なお、本実施形態においてポリイミド系高分子ワニスとは、ポリイミド系高分子前駆体のイミド化によって得られるポリイミド系高分子溶液、および、該ポリイミド系高分子溶液に溶媒や添加剤を加えることによって得られる溶液のことである。 In the present embodiment, the polyimide polymer varnish is obtained by adding a polyimide polymer solution obtained by imidation of a polyimide polymer precursor, and adding a solvent or an additive to the polyimide polymer solution. Solution.

 (原料モノマーの重合によるポリイミド系高分子前駆体の生成)
 反応容器内でポリイミド系高分子の原料モノマーを上述する溶媒A中で重合させる。原料モノマー及び溶媒Aを含む全液体に占める原料モノマーの量は、10~60質量%とすることができる。モノマーの量が多いと重合速度が上がる傾向があり、分子量を高くすることができる。また、重合時間を短縮することができ、ポリイミド系高分子の着色が抑えられる傾向にある。モノマーの量が多すぎると、重合物又は重合物を含む溶液の粘度が高くなる傾向にあるため、攪拌しにくくなったり、反応容器や攪拌翼などに重合物が付着して収率が低くなったりすることがある。
(Generation of polyimide polymer precursor by polymerization of raw material monomer)
The raw material monomer of the polyimide polymer is polymerized in the solvent A described above in the reaction vessel. The amount of the raw material monomer in the total liquid including the raw material monomer and the solvent A can be 10 to 60% by mass. When the amount of the monomer is large, the polymerization rate tends to increase, and the molecular weight can be increased. Further, the polymerization time can be shortened, and the coloring of the polyimide polymer tends to be suppressed. If the amount of the monomer is too large, the viscosity of the polymer or the solution containing the polymer tends to increase, which makes it difficult to stir or the polymer adheres to the reaction vessel or stirring blade, resulting in a low yield. Sometimes.

 原料モノマーの各成分、及び、溶媒Aの混合の順序は特に限定されず、全てを同時に混合しても良いし別々に混合してもよいが、ジアミンの少なくとも一部と溶媒とを混合した後にカルボン酸化合物を加えることが好ましい。ジアミン及びカルボン酸化合物は分割して加えても、化合物ごとに段階的に加えてもよい。 The order of mixing each component of the raw material monomer and the solvent A is not particularly limited, and all of them may be mixed simultaneously or separately, but after mixing at least a part of the diamine and the solvent It is preferable to add a carboxylic acid compound. The diamine and carboxylic acid compound may be added in portions, or may be added stepwise for each compound.

 反応マス中の原料モノマーをよく撹拌することで原料モノマーの重合が促進されポリイミド系高分子前駆体が形成される。必要に応じて、反応マスを40~90℃程度に加熱してもよい。原料モノマーの重合工程の進行と同時並行で、後述するイミド化工程を進行させることもできる。この場合、後述するイミド化の条件に合わせて反応マスをさらに高温に加熱してもよい。
 重合の反応時間は、たとえば、24時間以下とすることができ、1時間以下であってもよいし、1~24時間とすることができる。
By sufficiently stirring the raw material monomer in the reaction mass, polymerization of the raw material monomer is promoted and a polyimide polymer precursor is formed. If necessary, the reaction mass may be heated to about 40 to 90 ° C. The imidization process described later can also proceed in parallel with the progress of the raw material monomer polymerization process. In this case, the reaction mass may be heated to a higher temperature in accordance with the imidization conditions described later.
The polymerization reaction time can be, for example, 24 hours or less, can be 1 hour or less, and can be 1 to 24 hours.

 反応マスはポリイミド系高分子前駆体の重合工程中に第三級アミンを含んでいてもよい。この場合、第三級アミンはジアミンと溶媒とを混合する前に加えても、混合した後に加えてもよく、ジアミンと溶媒とカルボン酸化合物とを混合した後に加えてもよい。また、用いる溶媒の一部で希釈しておいてから反応マスに加えてもよい。 The reaction mass may contain a tertiary amine during the polymerization step of the polyimide polymer precursor. In this case, the tertiary amine may be added before mixing the diamine and the solvent, may be added after mixing, or may be added after mixing the diamine, the solvent, and the carboxylic acid compound. Further, after diluting with a part of the solvent to be used, it may be added to the reaction mass.

 (ポリイミド系高分子前駆体のイミド化)
 続いて、減圧環境下で、第三級アミンを含む反応マスを加熱することによってポリイミド系高分子前駆体のイミド化を促進し、ポリイミドを生成しつつ副生する水等を留去する。上記の重合を行った反応容器内で、溶媒A中のポリイミド系高分子前駆体をイミド化することが好適である。第三級アミンは、上述のように原料モノマーを重合してポリイミド系高分子前駆体を生成する重合工程中又は重合工程前に加えてもよいが、ポリイミド系高分子前駆体を生成する工程の後に加えてもよい。
 ポリイミド系高分子前駆体の生成反応とイミド化反応とを、同時に進行させてもよい。その場合、イミド化反応で生成する水によりアミド基の結合が切断され、得られるポリイミド系高分子の分子量が低くなることがある。このようなポリイミド系高分子を含むワニスから得られるフィルムは、耐折性が低下することがある。イミド化工程の際に、減圧して反応溶液中の水を速やかに除去することで、アミド基の切断反応を抑制し、得られるポリイミド系高分子の分子量を高くすることができる。したがって、特にポリイミド系高分子前駆体の生成反応とイミド化反応とを同時に進行させる場合に、イミド化工程を減圧環境下で行うことにより、精製工程を経ずにポリイミド系高分子を含むワニスから直接フィルムを製造してもフィルムに高い耐折性を与えられる傾向がある。
(Imidization of polyimide polymer precursor)
Subsequently, imidation of the polyimide polymer precursor is promoted by heating a reaction mass containing a tertiary amine in a reduced pressure environment, and water produced as a by-product is distilled off while forming a polyimide. It is preferable to imidize the polyimide polymer precursor in the solvent A in the reaction vessel in which the above polymerization is performed. The tertiary amine may be added during or before the polymerization step of polymerizing the raw material monomer to produce the polyimide polymer precursor as described above, but in the step of producing the polyimide polymer precursor. It may be added later.
The formation reaction of the polyimide polymer precursor and the imidization reaction may proceed simultaneously. In that case, the bond of an amide group may be cut | disconnected by the water produced | generated by imidation reaction, and the molecular weight of the polyimide-type polymer obtained may become low. A film obtained from a varnish containing such a polyimide-based polymer may have low folding resistance. In the imidization step, the pressure in the reaction solution is reduced and water in the reaction solution is quickly removed, so that the cleavage reaction of the amide group can be suppressed and the molecular weight of the resulting polyimide polymer can be increased. Therefore, in particular, when the formation reaction of the polyimide polymer precursor and the imidization reaction proceed simultaneously, by performing the imidization step under a reduced pressure environment, the varnish containing the polyimide polymer can be used without going through a purification step. Even if the film is produced directly, the film tends to have high folding resistance.

 反応マスにおいて、耐折性向上の観点から、100質量部の原料モノマーに対する第三級アミンの添加量は、好ましくは0.05質量部以上であり、より好ましくは0.1質量部以上であり、更に好ましくは0.2質量部以上である。一方、フィルムの着色を抑制する目的からは触媒の添加量は少ないことが好ましい。第三級アミンの添加量は好ましくは2質量部以下であり、より好ましくは1質量部以下であり、更に好ましくは0.7質量部以下であり、より更に好ましくは0.5質量部以下、とりわけ好ましくは0.3質量部以下である。 In the reaction mass, from the viewpoint of improving folding resistance, the amount of tertiary amine added to 100 parts by mass of the raw material monomer is preferably 0.05 parts by mass or more, more preferably 0.1 parts by mass or more. More preferably, it is 0.2 parts by mass or more. On the other hand, for the purpose of suppressing coloration of the film, it is preferable that the addition amount of the catalyst is small. The amount of tertiary amine added is preferably 2 parts by mass or less, more preferably 1 part by mass or less, still more preferably 0.7 parts by mass or less, still more preferably 0.5 parts by mass or less. Especially preferably, it is 0.3 mass part or less.

 イミド化工程の温度は、100℃以上250℃以下とすることが好ましく、150℃以上210℃以下とすることがより好ましい。イミド化工程の圧力は、好ましくは730mmHg以下であり、より好ましくは700mmHg以下であり、更に好ましくは675mmHg以下である。 The temperature in the imidization step is preferably 100 ° C. or higher and 250 ° C. or lower, and more preferably 150 ° C. or higher and 210 ° C. or lower. The pressure in the imidization step is preferably 730 mmHg or less, more preferably 700 mmHg or less, and further preferably 675 mmHg or less.

 イミド化工程の圧力は、例えば350mmHg以上とすることができ、500mmHg以上であってもよい。イミド化工程の温度における溶媒の蒸気圧によっては、反応の安定性を高めるために圧力は400mmHg以上で行うことが好ましいこともある。同じ理由で、600mmHgで行うことがより好ましいこともある。
 イミド化工程の圧力をイミド化工程の溶媒の飽和蒸気圧の近くに設定するとYIが抑制されやすい傾向がある。飽和蒸気圧から50mmHg以内の圧力が好ましい。
The pressure in the imidization step can be, for example, 350 mmHg or more, and may be 500 mmHg or more. Depending on the vapor pressure of the solvent at the temperature of the imidization step, it may be preferable to perform the pressure at 400 mmHg or higher in order to increase the stability of the reaction. For the same reason, it may be more preferable to carry out at 600 mmHg.
If the pressure in the imidization step is set near the saturated vapor pressure of the solvent in the imidization step, YI tends to be suppressed. A pressure within 50 mmHg from the saturated vapor pressure is preferred.

 加熱時間は、たとえば、1~24時間とすることができる。好ましくは1~12時間であり、より好ましくは2~9時間であり、更に好ましくは2~8時間であり、より更に好ましくは2~6時間であり、とりわけ好ましくは2~5時間である。加熱中には攪拌を行うことが好適である。
 反応時間が長くなると、分子量が高くなるが、樹脂の黄色味が強くなりやすい傾向がある。一方、反応時間が短いと分子量が低くなりやすく、黄色味は弱くなる傾向がある。
The heating time can be, for example, 1 to 24 hours. The time is preferably 1 to 12 hours, more preferably 2 to 9 hours, still more preferably 2 to 8 hours, still more preferably 2 to 6 hours, and particularly preferably 2 to 5 hours. Stirring is preferred during heating.
As the reaction time becomes longer, the molecular weight increases, but the yellowishness of the resin tends to increase. On the other hand, when the reaction time is short, the molecular weight tends to be low, and the yellow color tends to be weak.

 イミド化工程において、反応容器内の溶媒Aを含む液相と接触する気相中の酸素濃度が低いと、ポリイミド系高分子の着色が抑制される傾向があり、これを含むワニスから得られるフィルムのYIの数値が低くなる傾向がある。製造方法において、反応容器の気相中の酸素濃度が低い状態で、減圧環境下での反応マスの加熱によるイミド化工程が行われればよく、減圧環境下での加熱より前、例えば減圧を開始する時又は原料モノマー等の投入する時から当該酸素濃度が低くてもよい。酸素濃度は、0.02%以下にすることが好ましく、0.01%以下にすることがさらに好ましい。高温に加熱したときに酸素濃度が高いと、特に着色の原因となるので、例えば、反応溶液の温度が130℃以上のときに、酸素濃度を0.02%以下にすることが好ましい。前駆体の合成及び前駆体のイミド化において、実質的に酸素は発生しないことから、例えば原料投入前に反応容器内を窒素ガスで置換するなどして気相の酸素濃度を下げることにより、イミド化工程における気相の酸素濃度を低減することができる。イミド化工程の酸素濃度は、例えば反応容器内部を減圧する際に反応容器から除去するガス中の酸素濃度の分析をすることにより把握できる。減圧中の酸素濃度の測定が困難な場合、減圧前後の気相をサンプリングして酸素濃度を測定してもよい。 In the imidization step, when the oxygen concentration in the gas phase contacting the liquid phase containing the solvent A in the reaction vessel is low, coloring of the polyimide polymer tends to be suppressed, and a film obtained from a varnish containing the same The YI value tends to be low. In the production method, the imidization step by heating the reaction mass in a reduced pressure environment may be performed in a state where the oxygen concentration in the gas phase of the reaction vessel is low. For example, the pressure reduction is started before the heating in the reduced pressure environment. The oxygen concentration may be low from the time when the raw material monomer or the like is added. The oxygen concentration is preferably 0.02% or less, and more preferably 0.01% or less. If the oxygen concentration is high when heated to a high temperature, it causes coloring in particular. For example, when the temperature of the reaction solution is 130 ° C. or higher, the oxygen concentration is preferably 0.02% or lower. In the synthesis of the precursor and the imidization of the precursor, oxygen is not substantially generated. For example, by reducing the oxygen concentration in the gas phase by replacing the inside of the reaction vessel with nitrogen gas before starting the raw material, The oxygen concentration in the gas phase in the conversion step can be reduced. The oxygen concentration in the imidization step can be grasped, for example, by analyzing the oxygen concentration in the gas removed from the reaction vessel when the pressure inside the reaction vessel is reduced. If it is difficult to measure the oxygen concentration during decompression, the oxygen concentration may be measured by sampling the gas phase before and after decompression.

 加熱後に、大気圧に戻し、冷却することにより、ポリイミド系高分子溶液が得られる。
このポリイミド系高分子溶液をそのままポリイミド系高分子ワニスとしてもよい。
After heating, it is returned to atmospheric pressure and cooled to obtain a polyimide polymer solution.
This polyimide polymer solution may be used as it is as a polyimide polymer varnish.

 (希釈工程)
 また、得られたポリイミド系高分子溶液に対し、さらに、溶媒Bを加えてポリイミド系高分子の濃度を調整してポリイミド系高分子ワニスを得ることもできる。好適なポリイミド系高分子ワニス中の固形分濃度は、10~25質量%である。
 なお、ポリイミド系高分子ワニスからフィルムを作製する場合、ワニス中の固形分の全量に対して、ポリイミド系高分子を30質量%以上含むワニスを使用すれば、後述する主成分の1つがポリイミド系高分子であるポリイミド系高分子フィルムを容易に得ることができる。ポリイミド系高分子の濃度は、ワニスの全質量を基準に10質量%以上が好ましく、13質量%以上がより好ましい。
(Dilution process)
Moreover, the polyimide polymer varnish can also be obtained by adjusting the concentration of the polyimide polymer by adding solvent B to the obtained polyimide polymer solution. The solid content concentration in a suitable polyimide-based polymer varnish is 10 to 25% by mass.
In addition, when producing a film from a polyimide-based polymer varnish, if a varnish containing 30% by mass or more of a polyimide-based polymer is used with respect to the total amount of solids in the varnish, one of the main components described later is a polyimide-based polymer. A polyimide polymer film which is a polymer can be easily obtained. The concentration of the polyimide polymer is preferably 10% by mass or more, more preferably 13% by mass or more based on the total mass of the varnish.

 希釈は反応容器内において行うことができ、反応容器から回収した後の溶液に対して行うこともできる。 Dilution can be performed in the reaction vessel, and can also be performed on the solution recovered from the reaction vessel.

 反応容器内において、イミド化後のポリイミド系高分子溶媒に対して溶媒Bを追加して、反応容器内におけるポリイミド系高分子の濃度を希釈させると、次の抜き出し工程で反応容器に残る高分子の量を低減できて、高分子の収率の向上が図れる。また、反応容器に残る高分子の量が減ると、この反応容器を用いた次の重合及びイミド化の繰り返し工程において、得られるポリイミド系高分子の着色(例えば黄色)が改善される。 In the reaction vessel, when the solvent B is added to the polyimide polymer solvent after imidization and the concentration of the polyimide polymer in the reaction vessel is diluted, the polymer remaining in the reaction vessel in the next extraction step Thus, the yield of the polymer can be improved. Further, when the amount of the polymer remaining in the reaction vessel is reduced, coloring (for example, yellow) of the obtained polyimide-based polymer is improved in the subsequent polymerization and imidation repeating steps using this reaction vessel.

 希釈用の溶媒Bは、上述した溶媒Aで挙げたものとすることができる。溶媒Bと溶媒Aは、同一種でも良いし、互いに異種でも良い。希釈用の溶媒Bとして、ポリイミド系樹脂に対する溶解性の高い溶媒を適切に選定することで、反応容器からのポリイミド系高分子の回収率が高くなる。このような溶媒として、N,N-ジメチルアセトアミド、シクロペンタノン(沸点131℃)等が挙げられる。 The solvent B for dilution can be the same as the solvent A described above. The solvent B and the solvent A may be the same type or different types. By appropriately selecting a solvent having high solubility in the polyimide resin as the solvent B for dilution, the recovery rate of the polyimide polymer from the reaction vessel is increased. Examples of such a solvent include N, N-dimethylacetamide, cyclopentanone (boiling point 131 ° C.) and the like.

 反応容器内での希釈を、異なる種類の複数の溶媒Bを用いて複数回行うこともできる。 The dilution in the reaction vessel can be performed a plurality of times using a plurality of different types of solvents B.

 (溶液の抜き出し工程)
 続いて、反応容器から、ポリイミド系高分子ワニスを抜き出す。抜き出したワニスは、後述するフィルム形成工程に利用できる。
(Solution extraction process)
Subsequently, the polyimide polymer varnish is extracted from the reaction vessel. The extracted varnish can be used in a film forming process described later.

 (溶媒Cによる反応容器の洗浄)
 続いて、抜き出し後の反応容器内に溶媒Cを供給して反応容器内に残存する高分子を溶媒Cに溶解させ、その後、高分子を溶解した溶媒Cを反応容器から回収し、反応容器内に残る高分子をさらに除去することができる。
(Cleaning of reaction vessel with solvent C)
Subsequently, the solvent C is supplied into the reaction container after the extraction, the polymer remaining in the reaction container is dissolved in the solvent C, and then the solvent C in which the polymer is dissolved is recovered from the reaction container. The remaining polymer can be further removed.

 反応容器の洗浄により、反応容器に残る高分子の量を低減できて、この反応容器を用いた次の重合及びイミド化の繰り返し工程において、得られるポリイミド系高分子の着色(例えば黄色)が改善される。 By washing the reaction vessel, the amount of polymer remaining in the reaction vessel can be reduced, and the color (for example, yellow) of the resulting polyimide polymer can be improved in the subsequent polymerization and imidation repeating steps using this reaction vessel. Is done.

 溶媒Cは、溶媒A及び溶媒Bで例示したものであることができる。溶媒Cは、溶媒Aと同一種でも良いし、溶媒Aと異種でも良い。また、溶媒Cは、溶媒Bと同一種でも良いし、溶媒Bと異種でも良い。適切な洗浄用の溶媒を採用することで、反応容器に残存する高分子の量を低減できる。このような溶媒としては、N,N-ジメチルアセトアミド、シクロペンタノン等が挙げられる。 Solvent C can be exemplified by solvent A and solvent B. The solvent C may be the same type as the solvent A or different from the solvent A. The solvent C may be the same type as the solvent B or may be different from the solvent B. By employing an appropriate washing solvent, the amount of polymer remaining in the reaction vessel can be reduced. Examples of such a solvent include N, N-dimethylacetamide, cyclopentanone and the like.

 反応容器に溶媒Cを供給し、その後回収した後に、溶媒Dを反応容器に供給して高分子を溶解させ、その後、溶媒Dを回収しても良い。溶媒Dによる洗浄を複数回行っても良い。溶媒Dは、溶媒Cと同種でも良く、溶媒Cと異なっていても良い。 The solvent C may be supplied to the reaction vessel and then recovered, then the solvent D may be supplied to the reaction vessel to dissolve the polymer, and then the solvent D may be recovered. You may perform the washing | cleaning by the solvent D in multiple times. The solvent D may be the same type as the solvent C or may be different from the solvent C.

 (繰り返し)
 洗浄後、洗浄した反応容器を再び用いて、重合、イミド化、希釈、抜き出し、洗浄の各工程を繰り返すことにより、一つの反応容器を用いて効率よく、ポリイミド系高分子ワニスを製造することができる。
(repetition)
After washing, using the washed reaction vessel again, the steps of polymerization, imidization, dilution, extraction, and washing can be repeated to efficiently produce a polyimide polymer varnish using one reaction vessel. it can.

 (溶媒C及び溶媒Dの再利用)
 上述の希釈工程に用いる溶媒Bとして、反応容器の洗浄に用いた溶媒Cを用いることが好適である。溶媒Bとして、洗浄に用いた溶媒Dを用いることもできる。希釈用の溶媒Bとして、少なくとも溶媒Cを使用することが好適である。希釈用の溶媒Bとして、高分子を含む溶媒C等を利用とすることで、高分子の収率を高くすることができる。
(Reuse of solvent C and solvent D)
As the solvent B used in the above-described dilution step, it is preferable to use the solvent C used for washing the reaction vessel. As the solvent B, the solvent D used for washing can also be used. It is preferable to use at least the solvent C as the solvent B for dilution. By using a solvent C containing a polymer as the solvent B for dilution, the yield of the polymer can be increased.

 ここで、収率とは、一度の重合工程での原料モノマーの仕込み量から算出されるポリイミド系高分子の理論量(重量)に対し、その後の抜出し工程で実際に得られたポリイミドワニス中の樹脂固形分の重量のことである。ポリイミドワニスが反応容器の洗浄後の溶媒Cを含む場合、ポリイミドワニス中の樹脂固形分の重量は、溶媒Cに含まれる樹脂固形分と、反応容器内で合成したポリイミドワニス中の樹脂固形分の合計量である。 Here, with respect to the theoretical amount (weight) of the polyimide-based polymer calculated from the charged amount of raw material monomer in one polymerization step, the yield in the polyimide varnish actually obtained in the subsequent extraction step It is the weight of resin solids. When the polyimide varnish contains the solvent C after washing the reaction vessel, the weight of the resin solids in the polyimide varnish is the resin solids contained in the solvent C and the resin solids in the polyimide varnish synthesized in the reaction vessel. Total amount.

 特に重量平均分子量が250,000以上の透明なポリイミド系高分子ワニスの製造においては、得られた高分子が反応容器に付着しやすく、溶液の抜き出し後に高分子が反応容器に残って収率が低下したり、反応容器に残存した高分子が次工程のポリイミドの合成において悪影響を及ぼして、得られる高分子の黄色味が高くなったり、得られる高分子に含まれる異物が増加したりする場合がある。 In particular, in the production of a transparent polyimide polymer varnish having a weight average molecular weight of 250,000 or more, the obtained polymer tends to adhere to the reaction vessel, and the polymer remains in the reaction vessel after extraction of the solution, resulting in a high yield. When the polymer is reduced or the polymer remaining in the reaction vessel has an adverse effect on the synthesis of the polyimide in the next step, resulting in a high yellow color of the resulting polymer or an increase in foreign matter contained in the resulting polymer There is.

 このような課題は、抜き出し前の溶液の溶媒Bによる希釈、及び/又は、溶媒Cを用いた反応容器の洗浄により解決することができる。溶媒Cに加えて溶媒Dを用いた洗浄を行う、すなわち、2種類以上の溶媒で複数回の洗浄することで反応容器の洗浄がより容易になる傾向もある。 Such a problem can be solved by diluting the solution before extraction with the solvent B and / or washing the reaction vessel using the solvent C. Washing with the solvent D in addition to the solvent C, that is, washing with a plurality of times with two or more solvents, tends to make the reaction vessel easier to clean.

 例えば、反応容器の洗浄をしない、又は洗浄が不十分である状況で、重合を繰り返し行うと、反応容器の壁面に高分子に由来する付着物が残存し、ポリイミド系高分子のYI値が高くなることがある。そのような場合には、複数の溶媒(溶媒C及び溶媒D)で洗浄することで、より反応容器の洗浄が強化され、YI値の上昇が抑制される。 For example, if the polymerization is repeated in a situation where the reaction vessel is not washed or insufficiently washed, deposits derived from the polymer remain on the wall surface of the reaction vessel, and the YI value of the polyimide polymer is high. May be. In such a case, by washing with a plurality of solvents (solvent C and solvent D), washing of the reaction vessel is further strengthened, and an increase in the YI value is suppressed.

 なお、上記の「透明」とは、ワニスに含まれるポリイミド系高分子が、JIS K7105:1981に準拠して膜厚80μmの高分子フィルムを作成して測定した際の全光線透過率(Tt)が85%以上であることを意味する。この全光線透過率は、90%以上であることが好ましい。 In addition, said "transparent" means the total light transmittance (Tt) when the polyimide-type polymer contained in a varnish produces and measures a polymer film with a film thickness of 80 micrometers according to JIS K7105: 1981. Is 85% or more. The total light transmittance is preferably 90% or more.

 なお、上記重量平均分子量は、GPCで測定した標準ポリスチレン換算分子量である。 In addition, the said weight average molecular weight is a standard polystyrene conversion molecular weight measured by GPC.

 ポリイミドの合成に用いる溶媒Aと、希釈及び洗浄に用いる溶媒B及び/又は溶媒Cとは、同じ溶媒でもよいが、互いに異なると、反応容器の洗浄度が改善して得られる高分子の透明性を改善できる。溶媒B及びCとして好適な溶媒には、上述のように、N,N-ジメチルアセトアミド、シクロペンタノンなどが挙げられる。これらの溶媒は、GBLよりも沸点が低いが、ポリイミド系高分子ワニスの粘度が低下するので、反応容器からの抜出しに有利になるので好ましい。一方、ポリイミドの合成に用いる溶媒Aは、上述のように、イミド化反応を高温で行う場合には、GBLのように高沸点の溶媒であることが好ましい。 Solvent A used for the synthesis of polyimide and solvent B and / or solvent C used for dilution and washing may be the same solvent, but if they are different from each other, the transparency of the polymer obtained by improving the cleaning degree of the reaction vessel is improved. Can be improved. Suitable solvents for solvents B and C include N, N-dimethylacetamide, cyclopentanone and the like as described above. These solvents are preferable because they have a boiling point lower than that of GBL but are advantageous for extraction from the reaction vessel because the viscosity of the polyimide polymer varnish is lowered. On the other hand, the solvent A used for the synthesis of polyimide is preferably a high boiling point solvent such as GBL when the imidization reaction is performed at a high temperature as described above.

 さらに、前記ポリイミド系高分子溶液に溶媒以外の添加剤を加えて、ポリイミド系高分子ワニスを調製することもできる。添加剤の例としては、無機粒子や紫外線吸収剤が挙げられる。 Furthermore, an additive other than a solvent can be added to the polyimide polymer solution to prepare a polyimide polymer varnish. Examples of the additive include inorganic particles and ultraviolet absorbers.

 (無機粒子)
 無機粒子の具体例としては、シリカ微粒子が挙げられる。
(Inorganic particles)
Specific examples of the inorganic particles include silica fine particles.

 本発明において用いられる無機粒子の平均一次粒子径は、通常100nm以下である。
無機粒子の平均一次粒子径が100nm以下であるとフィルムの透明性が向上する傾向にある。フィルム中の無機粒子の一次粒子径の測定は、透過型電子顕微鏡(TEM)による定方向径とすることができる。平均一次粒子径は、例えば、TEM観察により一次粒子径を10点測定し、それらの平均値として求めることができる。
The average primary particle diameter of the inorganic particles used in the present invention is usually 100 nm or less.
When the average primary particle diameter of the inorganic particles is 100 nm or less, the transparency of the film tends to be improved. The measurement of the primary particle diameter of the inorganic particles in the film can be a constant diameter by a transmission electron microscope (TEM). The average primary particle diameter can be obtained, for example, by measuring 10 primary particle diameters by TEM observation and calculating the average value thereof.

 無機粒子がシリカ微粒子である場合、シリカ微粒子は、有機溶剤等にシリカ粒子を分散させたシリカゾルであっても、気相法で製造したシリカ微粒子粉末を用いてもよいが、ハンドリングが容易であることからシリカゾルであることが好ましい。原料シリカ粒子の平均一次粒子径は、例えば、BET測定により求めることができる。 When the inorganic particles are silica fine particles, the silica fine particles may be a silica sol in which the silica particles are dispersed in an organic solvent or the like, or a silica fine particle powder produced by a vapor phase method may be used, but handling is easy. Therefore, a silica sol is preferable. The average primary particle diameter of the raw material silica particles can be determined, for example, by BET measurement.

 無機粒子の添加量は、たとえば、流延成形後のフィルム中の無機粒子の濃度が0質量%以上90質量%以下となるように、ポリイミド系高分子溶液中の樹脂成分の量に合わせて設定することができる。好ましくは10質量%以上60質量%以下であり、さらに好ましくは20質量%以上50質量%以下である。配合比が上記の範囲内であると、光学フィルムの透明性及び機械的強度を両立させやすい傾向がある。 The amount of inorganic particles added is set in accordance with the amount of the resin component in the polyimide-based polymer solution so that the concentration of the inorganic particles in the film after casting is, for example, from 0% by mass to 90% by mass. can do. Preferably they are 10 mass% or more and 60 mass% or less, More preferably, they are 20 mass% or more and 50 mass% or less. There exists a tendency which is easy to make transparency and mechanical strength of an optical film compatible as a compounding ratio exists in said range.

 (紫外線吸収剤)
 紫外線吸収剤は、樹脂材料の分野で紫外線吸収剤として通常用いられているものから、適宜選択することができる。紫外線吸収剤は、400nm以下の波長の光を吸収する化合物から、用途に応じた光吸収能の要求特性に応じて、紫外線吸収剤の種類および添加量を決めることができる。紫外線吸収剤としては、例えば、ベンゾフェノン系化合物、サリシレート系化合物、ベンゾトリアゾール系化合物、及びトリアジン系化合物からなる群より選ばれる少なくとも1種の化合物が挙げられる。紫外線吸収剤は、ベンゾトリアゾール系化合物であることが好ましい。
(UV absorber)
The ultraviolet absorber can be appropriately selected from those usually used as an ultraviolet absorber in the field of resin materials. The ultraviolet absorber can be determined from the compound that absorbs light having a wavelength of 400 nm or less, and the type and amount of the ultraviolet absorber can be determined according to the required characteristics of the light absorption capability according to the application. Examples of the ultraviolet absorber include at least one compound selected from the group consisting of benzophenone compounds, salicylate compounds, benzotriazole compounds, and triazine compounds. The ultraviolet absorber is preferably a benzotriazole compound.

 なお、本実施形態において、「系化合物」とは、当該「系化合物」が付される化合物の誘導体を指す。例えば、「ベンゾフェノン系化合物」とは、母体骨格としてのベンゾフェノンと、ベンゾフェノンに結合している置換基とを有する化合物を指す。 In this embodiment, the “system compound” refers to a derivative of the compound to which the “system compound” is attached. For example, a “benzophenone compound” refers to a compound having benzophenone as a host skeleton and a substituent bonded to benzophenone.

 (他の添加剤)
 ポリイミド系高分子溶液に、透明性及び屈曲性を損なわない範囲で、更に他の添加剤を添加してもよい。他の成分としては、例えば、酸化防止剤、離型剤、安定剤、ブルーイング剤などの着色剤、難燃剤、滑剤、増粘剤及びレベリング剤等が挙げられる。
(Other additives)
Other additives may be added to the polyimide polymer solution as long as the transparency and flexibility are not impaired. Examples of other components include colorants such as antioxidants, mold release agents, stabilizers, and bluing agents, flame retardants, lubricants, thickeners, and leveling agents.

 無機粒子以外の添加成分の総量は、流延成形後のフィルム中の濃度が0%以上20質量%以下となるように、好ましくは0%超10質量%以下となるように、適宜設定できる。 The total amount of additive components other than inorganic particles can be appropriately set so that the concentration in the film after casting is 0% or more and 20% by mass or less, preferably more than 0% and 10% by mass or less.

 (重合及びイミド化により得られるポリイミド系高分子)
 本実施形態において、ポリイミドとは、イミド基を含む繰返し構造単位を含有する重合体であり、ポリアミドとは、アミド基を含む繰返し構造単位を含有する重合体である。ポリイミド系高分子とは、ポリイミド;イミド基及びアミド基の両方を含む繰返し構造単位を含有する重合体;および、イミド基を含む繰り返し構造単位とアミド基を含む繰り返し構造単位との両方を含有する重合体を示す。
(Polyimide polymer obtained by polymerization and imidization)
In the present embodiment, the polyimide is a polymer containing a repeating structural unit containing an imide group, and the polyamide is a polymer containing a repeating structural unit containing an amide group. The polyimide polymer is a polyimide; a polymer containing a repeating structural unit containing both an imide group and an amide group; and a repeating structural unit containing an imide group and a repeating structural unit containing an amide group. A polymer is shown.

 重合及びイミド化により得られるポリイミド系高分子は、下記の式(10)で表される繰り返し構造単位を有する。ここで、Gは4価の有機基であり、Aは2価の有機基である。G及び/又はAが異なる、2種類以上の式(10)で表される構造を含んでいてもよい。また、本実施形態に係るポリイミド系高分子は、得られるポリイミド系高分子フィルムの各種物性を損なわない範囲で、式(11)、式(12)、及び式(13)で表される構造のいずれか1つ以上を含んでいてもよい。 The polyimide polymer obtained by polymerization and imidation has a repeating structural unit represented by the following formula (10). Here, G is a tetravalent organic group, and A is a divalent organic group. The structure represented by two or more types of Formula (10) from which G and / or A differ may be included. In addition, the polyimide polymer according to the present embodiment has a structure represented by the formula (11), the formula (12), and the formula (13) as long as various physical properties of the obtained polyimide polymer film are not impaired. Any one or more may be included.

 本実施形態に係るポリイミド系高分子は、後述するテトラカルボン酸化合物とジアミン化合物とを主な原料として製造することができ、式(10)で表される繰り返し構造単位が、ポリイミド系高分子の主な構造単位であると、フィルムの強度及び透明性の観点で好ましい。式(10)で表される繰り返し構造単位は、ポリイミド系高分子の全繰り返し構造単位に対し、好ましくは40モル%以上であり、より好ましくは50モル%以上であり、さらに好ましくは70モル%以上であり、殊更好ましくは90モル%以上であり、殊更さらに好ましくは98モル%以上である。式(10)で表される繰り返し構造単位は、100モル%であってもよい。 The polyimide polymer according to the present embodiment can be produced using a tetracarboxylic acid compound and a diamine compound, which will be described later, as main raw materials, and the repeating structural unit represented by the formula (10) is a polyimide polymer. The main structural unit is preferable from the viewpoint of the strength and transparency of the film. The repeating structural unit represented by the formula (10) is preferably 40 mol% or more, more preferably 50 mol% or more, further preferably 70 mol%, based on all repeating structural units of the polyimide polymer. More preferably, it is 90 mol% or more, and still more preferably 98 mol% or more. 100 mol% may be sufficient as the repeating structural unit represented by Formula (10).

Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008

 G及びGは4価の有機基であり、好ましくは炭化水素基又はフッ素置換された炭化水素基で置換されていてもよい有機基であり、以下の式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)又は式(29)で表される基並びに4価の炭素数6以下の鎖式炭化水素基が例示される。式中の*は結合手を表し、Zは、単結合、-O-、-CH-、-CH-CH-、-CH(CH)-、-C(CH-、-C(CF-、-Ar-、-SO-、-CO-、-O-Ar-O-、-Ar-O-Ar-、-Ar-CH-Ar-、-Ar-C(CH-Ar-又は-Ar-SO-Ar-を表す。Arはフッ素原子で置換されていてもよい炭素数6~20のアリーレン基を表し、具体例としてはフェニレン基が挙げられる。得られるフィルムの黄色度を抑制しやすいことから、式(20)~式(27)で表される基が好ましい。 G and G 1 are tetravalent organic groups, preferably organic groups which may be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group, and are represented by the following formulas (20), (21), Groups represented by formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula (28) or formula (29) and the number of tetravalent carbon atoms Six or less chain hydrocarbon groups are exemplified. In the formula * represents a bond, Z is a single bond, -O -, - CH 2 - , - CH 2 -CH 2 -, - CH (CH 3) -, - C (CH 3) 2 -, —C (CF 3 ) 2 —, —Ar—, —SO 2 —, —CO—, —O—Ar—O—, —Ar—O—Ar—, —Ar—CH 2 —Ar—, —Ar— C (CH 3 ) 2 —Ar— or —Ar—SO 2 —Ar— is represented. Ar represents an arylene group having 6 to 20 carbon atoms which may be substituted with a fluorine atom, and specific examples thereof include a phenylene group. The groups represented by the formulas (20) to (27) are preferred because the yellowness of the resulting film can be easily suppressed.

Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009

 Gは3価の有機基であり、好ましくは炭化水素基又はフッ素置換された炭化水素基で置換されていてもよい有機基である。Gの有機基として、上記の式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)又は式(29)で表される基の結合手のいずれか1つが水素原子に置き換わった基並びに3価の炭素数6以下の鎖式炭化水素基が例示される。 G 2 is a trivalent organic group, and is preferably an organic group which may be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group. The organic group of G 2, the above expression (20), equation (21), equation (22), equation (23), equation (24), equation (25), equation (26), equation (27), wherein Examples include a group in which any one of the bonds of the group represented by (28) or formula (29) is replaced with a hydrogen atom, and a trivalent chain hydrocarbon group having 6 or less carbon atoms.

 Gは2価の有機基であり、好ましくは炭化水素基又はフッ素置換された炭化水素基で置換されていてもよい有機基である。Gの有機基として、上記の式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)又は式(29)で表される基の結合手のうち、隣接しない2つが水素原子に置き換わった基及び炭素数6以下の2価の鎖式炭化水素基が例示される。 G 3 is a divalent organic group, preferably an organic group which may be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group. As the organic group of G 3 , the above formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula Examples of the bond of the group represented by (28) or formula (29) include a group in which two that are not adjacent to each other are replaced with hydrogen atoms, and a divalent chain hydrocarbon group having 6 or less carbon atoms.

 A、A、A及びAはいずれも2価の有機基である。好ましくは炭化水素基又はフッ素置換された炭化水素基で置換されていてもよい有機基であり、以下の式(30)、式(31)、式(32)、式(33)、式(34)、式(35)、式(36)、式(37)もしくは式(38)で表される基;それらがメチル基、フルオロ基、クロロ基又はトリフルオロメチル基で置換された基;及び炭素数6以下の鎖式炭化水素基が例示される。
 式中の*は結合手を表し、Z、Z及びZは、それぞれ独立して、単結合、-O-、-CH-、-CH-CH-、-CH(CH)-、-C(CH-、-C(CF-、-SO-又は-CO-を表す。1つの例は、Z及びZが-O-であり、かつ、Zが-CH-、-C(CH-、-C(CF-又は-SO-である。ZとZ、及び、ZとZは、それぞれ、各環に対してメタ位又はパラ位であることが好ましい。
A, A 1 , A 2 and A 3 are all divalent organic groups. Preferably, it is an organic group which may be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group. The following formula (30), formula (31), formula (32), formula (33), formula (34) ), A group represented by formula (35), formula (36), formula (37) or formula (38); a group in which they are substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; and carbon A chain hydrocarbon group having a number of 6 or less is exemplified.
In the formula * represents a bond, Z 1, Z 2 and Z 3 are each independently a single bond, -O -, - CH 2 - , - CH 2 -CH 2 -, - CH (CH 3 )-, -C (CH 3 ) 2- , -C (CF 3 ) 2- , -SO 2 -or -CO-. One example is when Z 1 and Z 3 are —O— and Z 2 is —CH 2 —, —C (CH 3 ) 2 —, —C (CF 3 ) 2 — or —SO 2 —. is there. Z 1 and Z 2 , and Z 2 and Z 3 are each preferably in the meta position or the para position with respect to each ring.

Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010

 式(10)及び式(11)で表される繰り返し構造単位は、通常、ジアミン類及びテトラカルボン酸化合物から誘導される。式(12)で表される繰り返し構造単位は、通常、ジアミン及びトリカルボン酸化合物から誘導される。式(13)で表される繰り返し構造単位は、通常、ジアミン及びジカルボン酸化合物から誘導される。 The repeating structural units represented by formula (10) and formula (11) are usually derived from diamines and tetracarboxylic acid compounds. The repeating structural unit represented by the formula (12) is usually derived from a diamine and a tricarboxylic acid compound. The repeating structural unit represented by the formula (13) is usually derived from a diamine and a dicarboxylic acid compound.

 本実施形態に係るポリイミド系高分子は、異なる種類の複数の上記の繰り返し構造単位を含む共重合体でもよい。ポリイミド系高分子の重量平均分子量は、通常50,000~500,000である。ポリイミド系高分子の重量平均分子量は、好ましくは80,000~500,000であり、より好ましくは100,000~500,000であり、さらに好ましくは130,000~400,000である。重量平均分子量は、GPCで測定した標準ポリスチレン換算分子量である。ポリイミド系高分子の重量平均分子量が大きいと高い屈曲性を得られやすい傾向があるが、ポリイミド系高分子の重量平均分子量が大きすぎると、ワニスの粘度が高くなり、加工性が低下する傾向がある。 The polyimide polymer according to the present embodiment may be a copolymer including a plurality of different types of repeating structural units. The weight average molecular weight of the polyimide polymer is usually 50,000 to 500,000. The weight average molecular weight of the polyimide polymer is preferably 80,000 to 500,000, more preferably 100,000 to 500,000, and further preferably 130,000 to 400,000. The weight average molecular weight is a standard polystyrene equivalent molecular weight measured by GPC. If the weight average molecular weight of the polyimide polymer is large, high flexibility tends to be obtained, but if the weight average molecular weight of the polyimide polymer is too large, the viscosity of the varnish tends to increase and the workability tends to decrease. is there.

 ポリイミド系高分子及びポリアミドが含フッ素置換基を含むことにより、得られるフィルムの弾性率が向上するとともに、フィルムのYI値が低減される傾向がある。フィルムの弾性率が高いと、キズ及びシワ等の発生が抑制される傾向がある。フィルムの透明性の観点から、ポリイミド系高分子及びポリアミドは、含フッ素置換基を有することが好ましい。含フッ素置換基の具体例としては、フルオロ基及びトリフルオロメチル基が挙げられる。 When the polyimide polymer and the polyamide contain a fluorine-containing substituent, the elastic modulus of the obtained film is improved and the YI value of the film tends to be reduced. When the elastic modulus of the film is high, generation of scratches and wrinkles tends to be suppressed. From the viewpoint of transparency of the film, the polyimide polymer and the polyamide preferably have a fluorine-containing substituent. Specific examples of the fluorine-containing substituent include a fluoro group and a trifluoromethyl group.

 ポリイミド系高分子におけるフッ素原子の含有量は、ポリイミド系高分子の質量を基準として、1質量%以上、5質量%以上、10質量%以上、20質量%以上であることができる。上限は40質量%以下であることができる。 The fluorine atom content in the polyimide polymer can be 1% by mass or more, 5% by mass or more, 10% by mass or more, or 20% by mass or more based on the mass of the polyimide polymer. An upper limit can be 40 mass% or less.

 (フィルム形成方法)
 得られたポリイミドワニスを用いたポリイミド系高分子フィルムの製造方法の一例を説明する。基材上にポリイミド系高分子ワニスを流延して塗膜を形成し、塗膜から溶剤を除去し、乾燥した塗膜を基材から剥離する。これにより、ポリイミド系高分子フィルムが得られる。
(Film forming method)
An example of the manufacturing method of the polyimide-type polymer film using the obtained polyimide varnish is demonstrated. A polyimide polymer varnish is cast on the substrate to form a coating film, the solvent is removed from the coating film, and the dried coating film is peeled off from the substrate. Thereby, a polyimide polymer film is obtained.

 流延は、ロール・ツー・ロールやバッチ方式により、樹脂基材、ステンレス鋼ベルト、又はガラス基材上に行うことができる。樹脂基材の例としては、PET、PEN、ポリイミド、ポリアミドイミドなどが挙げられる。樹脂基材は耐熱性に優れた樹脂が好ましい。
ポリイミド系高分子フィルムの場合、PET基材がフィルムとの密着性及びコストの観点で好ましい。
Casting can be performed on a resin substrate, a stainless steel belt, or a glass substrate by a roll-to-roll or batch method. Examples of the resin substrate include PET, PEN, polyimide, polyamideimide and the like. The resin base material is preferably a resin excellent in heat resistance.
In the case of a polyimide polymer film, a PET substrate is preferable from the viewpoints of adhesion to the film and cost.

 上記の本発明の製造方法で得られるワニスは、精製工程を経ずにフィルム化しても良好な物性のフィルムが得られる。このため、ポリイミド系高分子を一旦固体として析出させその後溶剤に再溶解する精製工程を経ずにフィルム化することが好ましい。これにより、コスト面で有利なプロセスとなる。 Even if the varnish obtained by the production method of the present invention is formed into a film without undergoing a purification step, a film having good physical properties can be obtained. For this reason, it is preferable to form a film without going through a purification step in which the polyimide polymer is once precipitated as a solid and then redissolved in a solvent. This is a cost-effective process.

 本発明のポリイミド系フィルムの製造方法では、加温した気体を塗膜の表面に接触させる乾燥機に塗膜を通過させるなどして、一定量の有機溶媒を揮発させ、塗膜を自己支持性フィルムとして支持体から剥離して得てもよい。実施温度は用いる基材により調節され、樹脂基材を用いる場合はそれらのガラス転移温度以下で行われるのが一般的である。通常、50℃~300℃の適切な温度に加熱すればよく、加熱温度は多段階で調節したり、温度勾配をつけたりしてもよい。適宜、不活性雰囲気あるいは減圧の条件下でおこなうことも好適である。 In the method for producing a polyimide-based film of the present invention, a certain amount of organic solvent is volatilized by passing the coating film through a dryer that contacts a heated gas with the surface of the coating film, and the coating film is self-supporting. It may be obtained by peeling from the support as a film. The working temperature is adjusted depending on the substrate used, and when a resin substrate is used, it is generally carried out at or below the glass transition temperature thereof. Usually, the heating may be performed at an appropriate temperature of 50 ° C. to 300 ° C., and the heating temperature may be adjusted in multiple stages or a temperature gradient may be provided. It is also suitable to carry out under an inert atmosphere or under reduced pressure as appropriate.

 また、必要に応じて、剥離されたポリイミド系高分子フィルムをさらに80~300℃で加熱してもよい。 If necessary, the peeled polyimide polymer film may be further heated at 80 to 300 ° C.

 (ポリイミド系高分子フィルム)
 このようにして得られるポリイミド系高分子フィルムは上記ポリイミド系高分子ワニス中の固形分により形成され、主成分の1つがポリイミド系高分子である。ポリイミド系高分子は、ポリイミド系高分子フィルムの全量に対して、30質量%以上であることが好ましい。ポリイミド系高分子フィルムには、前記シリカ微粒子、前記紫外線吸収剤及び/又は前記添加剤が含まれていてもよい。ポリイミド系高分子の濃度は、ポリイミド系高分子フィルムの全質量を基準に10質量%以上が好ましく、13質量%以上がより好ましい。
(Polyimide polymer film)
The polyimide polymer film thus obtained is formed by the solid content in the polyimide polymer varnish, and one of the main components is the polyimide polymer. The polyimide polymer is preferably 30% by mass or more based on the total amount of the polyimide polymer film. The polyimide polymer film may contain the silica fine particles, the ultraviolet absorber and / or the additive. The concentration of the polyimide polymer is preferably 10% by mass or more, more preferably 13% by mass or more based on the total mass of the polyimide polymer film.

 ポリイミド系高分子フィルムは、第三級アミンを含む。第三級アミンの種類の好ましい例は、前記の(第三級アミン)の項に記載の通りである。得られるポリイミド系高分子フィルムの耐折性が向上する観点からは、ポリイミド系高分子フィルム中の第三級アミンの含有量は少ないことが好ましい。前記第三級アミンの含有量は好ましくは0.25質量%以下であり、より好ましくは0.20質量%以下であり、更に好ましくは0.15質量%以下である。含有量を少なくすることにより、フィルムの着色も抑制される傾向がある。 The polyimide polymer film contains a tertiary amine. Preferred examples of the type of tertiary amine are as described in the above section (Tertiary amine). From the viewpoint of improving the folding resistance of the obtained polyimide polymer film, the content of the tertiary amine in the polyimide polymer film is preferably small. The content of the tertiary amine is preferably 0.25% by mass or less, more preferably 0.20% by mass or less, and still more preferably 0.15% by mass or less. By reducing the content, the coloring of the film also tends to be suppressed.

 一方、ポリイミド系フィルムの積層体を作成して各種用途に応用する際、紫外線透過を抑制できるという観点からは第三級アミンが含まれていることが好ましい。前記第三級アミンの含有量は好ましくは0.01質量%以上であり、より好ましくは0.02質量%以上であり、更に好ましくは0.05質量%以上である。 On the other hand, when a polyimide film laminate is prepared and applied to various applications, it is preferable that a tertiary amine is contained from the viewpoint that ultraviolet transmission can be suppressed. The content of the tertiary amine is preferably 0.01% by mass or more, more preferably 0.02% by mass or more, and further preferably 0.05% by mass or more.

 ポリイミド系高分子フィルムの厚みは、10~200μmとすることができる。 The thickness of the polyimide polymer film can be 10 to 200 μm.

 本実施形態により得られるポリイミド系高分子フィルムは、R=1mmの耐折性試験において5000回以上の折り曲げ回数を示すことが可能である。ポリイミド系高分子ワニスの製造条件を最適化することで、6000回以上、8000回以上、10000回以上、20000回以上の折り曲げ回数を示すフィルムを得ることも可能である。R=1mmの耐折性試験とは、10mm×100mmの短冊状にカットしたフィルムの中央を、曲率半径1.0mmで、折り曲げ角度135°、荷重750g、試験速度175cpmで、裏表両方向へ交互に折り曲げた際に、破断した際の折り曲げ回数である。 The polyimide-based polymer film obtained according to the present embodiment can show a folding number of 5000 times or more in a folding resistance test with R = 1 mm. By optimizing the production conditions of the polyimide-based polymer varnish, it is also possible to obtain a film showing the number of folding times of 6000 times or more, 8000 times or more, 10,000 times or more, 20000 times or more. The R = 1mm folding resistance test means that the center of a film cut into a strip of 10 mm × 100 mm is alternately turned in both the front and back directions at a curvature radius of 1.0 mm, a bending angle of 135 °, a load of 750 g, and a test speed of 175 cpm. It is the number of times of folding when the sheet is broken when folded.

 本実施形態により得られるポリイミド系高分子フィルムは、JIS K 7373:2006に準拠した黄色度YIを十分抑制することができ、黄色度YIを2.5以下、2.4以下、2.3以下、2.2以下とすることができる。フィルム化時の温度などの合成条件を最適化することで、2.1以下、2.0以下、1.9以下、1.8以下とすることができる。 The polyimide polymer film obtained according to the present embodiment can sufficiently suppress the yellowness YI based on JIS K 7373: 2006, and the yellowness YI is 2.5 or less, 2.4 or less, 2.3 or less. 2.2 or less. By optimizing the synthesis conditions such as the temperature during film formation, it can be made 2.1 or less, 2.0 or less, 1.9 or less, or 1.8 or less.

 本実施形態により得られるポリイミド系高分子フィルムは透明である。具体的には、このポリイミド系高分子フィルムは、JIS K7105:1981に準拠して測定した全光線透過率(Tt)が85%以上であることができ、90%以上であることが好ましい。
より好ましくは91%以上であり、更に好ましくは92%以上である。また、ポリイミド系高分子フィルムは、JIS K 7105:1981に準拠して測定したHazeが1%以下であることができ、好ましくは0.8%以下である。より好ましくは0.5%以下であり、更に好ましくは0.3%以下である。
The polyimide polymer film obtained by this embodiment is transparent. Specifically, the polyimide polymer film can have a total light transmittance (Tt) measured in accordance with JIS K7105: 1981 of 85% or more, and preferably 90% or more.
More preferably, it is 91% or more, More preferably, it is 92% or more. The polyimide polymer film may have a haze of 1% or less, preferably 0.8% or less, measured according to JIS K 7105: 1981. More preferably, it is 0.5% or less, More preferably, it is 0.3% or less.

 本実施形態により得られるポリイミド系高分子フィルムは、含フッ素置換基を含むことにより特に着色が低減される場合がある。ポリイミド系高分子におけるフッ素原子の含有量は、ポリイミド系高分子の質量を基準として、1質量%以上、5質量%以上、10質量%以上、20質量%以上であることができる。上限は40質量%以下であることができる。 The polyimide-based polymer film obtained according to this embodiment may be particularly reduced in color by containing a fluorine-containing substituent. The content of fluorine atoms in the polyimide polymer can be 1% by mass or more, 5% by mass or more, 10% by mass or more, and 20% by mass or more based on the mass of the polyimide polymer. An upper limit can be 40 mass% or less.

 (用途)
 このような光学フィルムは、高い耐折性を有する上に光学特性(黄色度、Tt、Haze)が良好であるので、フレキシブルデバイスの前面板などの光学部材として好適に使用することができる。
(Use)
Since such an optical film has high folding resistance and good optical properties (yellowness, Tt, Haze), it can be suitably used as an optical member such as a front plate of a flexible device.

 フレキシブルデバイスの例としては、画像表示装置(フレキシブルディスプレイ、電子ペーパーなど)、太陽電池などが挙げられる。フレキシブルディスプレイは、たとえば、表面側から順に、前面板/偏光板保護フィルム/偏光板/偏光板保護フィルム/タッチセンサーフィルム/有機EL素子層/TFT基板という構成が挙げられ、構成の表面及び各層間に、ハードコート層、粘着層、接着層、位相差層などを含んでもよい。かかるフレキシブルディスプレイは、タブレットPC、スマートフォン、携帯ゲーム機などの画像表示部として用いることができる。 Examples of flexible devices include image display devices (flexible displays, electronic paper, etc.), solar cells, and the like. Examples of the flexible display include, in order from the surface side, a configuration of a front plate / polarizing plate protective film / polarizing plate / polarizing plate protective film / touch sensor film / organic EL element layer / TFT substrate. In addition, a hard coat layer, an adhesive layer, an adhesive layer, a retardation layer, and the like may be included. Such a flexible display can be used as an image display unit of a tablet PC, a smartphone, a portable game machine, or the like.

 また、この光学フィルムの表面に、紫外線吸収層、ハードコート層、粘着層、色相調整層、屈折率調整層などの種々の機能層を付加した積層体とすることもできる。 In addition, a laminate in which various functional layers such as an ultraviolet absorbing layer, a hard coat layer, an adhesive layer, a hue adjusting layer, a refractive index adjusting layer, and the like are added to the surface of the optical film can be used.

 (耐折性の評価)
 実施例及び比較例で得られたポリイミド系高分子フィルムの耐折性は、以下の基準で評価した。フィルムを、ダンベルカッターを用いて10mm×100mmの短冊状にカットした。カットしたフィルムを東洋精機社製のMIT-DA MIT耐折疲労試験機にセットして、試験速度175cpm、折り曲げ角度135°、荷重750g、折り曲げクランプのR=1.0mmの条件で、裏表両方向への折り曲げ、破断するまでの折り曲げ回数を測定した。
(Evaluation of folding resistance)
The folding resistance of the polyimide polymer films obtained in Examples and Comparative Examples was evaluated according to the following criteria. The film was cut into a 10 mm × 100 mm strip using a dumbbell cutter. Set the cut film on MIT-DA MIT Folding Fatigue Testing Machine manufactured by Toyo Seiki Co., Ltd., both in the front and back direction under the conditions of test speed 175 cpm, bending angle 135 °, load 750 g, bending clamp R = 1.0 mm. The number of folds until bending and breaking were measured.

 (全光線透過率Ttの測定)
 実施例及び比較例で得られたポリイミド系高分子フィルムのそれぞれの全光線透過率を、JIS K7105:1981に準拠して、スガ試験機社製の全自動直読ヘーズコンピューターHGM-2DPにより測定した。
(Measurement of total light transmittance Tt)
The total light transmittance of each of the polyimide polymer films obtained in Examples and Comparative Examples was measured by a fully automatic direct reading haze computer HGM-2DP manufactured by Suga Test Instruments Co., Ltd. according to JIS K7105: 1981.

 (Hazeの測定)
 実施例及び比較例で得られたポリイミド系高分子フィルムのそれぞれの全光線透過率を、JIS K7105:1981に準拠して、スガ試験機社製の全自動直読ヘーズコンピューターHGM-2DPにより測定した。
(Measurement of Haze)
The total light transmittance of each of the polyimide polymer films obtained in Examples and Comparative Examples was measured by a fully automatic direct reading haze computer HGM-2DP manufactured by Suga Test Instruments Co., Ltd. according to JIS K7105: 1981.

 (黄色度(YI値)の測定)
 実施例及び比較例で得られたポリイミド系高分子フィルムのそれぞれの黄色度(Yellow Index:YI値)を、日本分光社製の紫外可視近赤外分光光度計V-670によって測定した。サンプルがない状態でバックグランド測定を行った後、ポリイミド系フィルムをサンプルホルダーにセットして、300~800nmの光に対する透過率測定を行い、3刺激値(X、Y、Z)を求めた。YI値を、下記の式に基づいて算出した。
 YI=100×(1.2769X-1.0592Z)/Y
(Measurement of yellowness (YI value))
The yellowness (Yellow Index: YI value) of each of the polyimide-based polymer films obtained in Examples and Comparative Examples was measured with an ultraviolet-visible near-infrared spectrophotometer V-670 manufactured by JASCO Corporation. After performing background measurement in the absence of a sample, a polyimide film was set on a sample holder, transmittance was measured for light of 300 to 800 nm, and tristimulus values (X, Y, Z) were obtained. The YI value was calculated based on the following formula.
YI = 100 × (1.2769X−1.0592Z) / Y

 (重量平均分子量の評価)
 ゲル浸透クロマトグラフィー(GPC)測定
(1)前処理方法
 試料をγ-ブチロラクトン(GBL)に溶かして20%溶液とした後、DMF溶離液にて100倍に希釈し、0.45μmメンブランフィルターろ過したものを測定溶液とした。
(2)測定条件
カラム:TSKgel SuperAWM-H×2+SuperAW2500×1(6.0mm I.D.×150mm×3本)
溶離液:DMF(10mMの臭化リチウム添加)
流量:0.6mL/min.
検出器:RI検出器
カラム温度:40℃
注入量:20μL
分子量標準:標準ポリスチレン
(Evaluation of weight average molecular weight)
Gel permeation chromatography (GPC) measurement (1) Pretreatment method A sample was dissolved in γ-butyrolactone (GBL) to make a 20% solution, diluted 100 times with DMF eluent, and filtered through a 0.45 μm membrane filter. This was used as a measurement solution.
(2) Measurement condition column: TSKgel SuperAWM-H × 2 + SuperAW2500 × 1 (6.0 mm ID × 150 mm × 3)
Eluent: DMF (10 mM lithium bromide added)
Flow rate: 0.6 mL / min.
Detector: RI detector Column temperature: 40 ° C
Injection volume: 20 μL
Molecular weight standard: Standard polystyrene

 (フィルムの残存触媒の濃度の評価)
 以下の条件でGC測定を行い、第三級アミンの定量を行った。
 溶液調製:100mgのフィルムをスクリュー管に秤量し、5mlのDMSOを加えて溶解する。
 装置:Agilent社製6890型、カラム:BPX-5(0.25mm×30m,膜厚:0.25μm)、カラム温度:50℃(5min)→20℃/min→350℃(5min)、注入口温度:280℃、流量:Heを1.0mL/分、検出器:FID、検出器温:350℃、試料注入量:1.0μL、スプリット比:50:1、シリンジ洗浄溶媒:DMSO、シリンジ洗浄溶媒:A:3回、B:3回
(Evaluation of residual catalyst concentration in film)
GC measurement was performed under the following conditions to determine the tertiary amine.
Solution preparation: 100 mg film is weighed into a screw tube and 5 ml DMSO is added to dissolve.
Apparatus: Agilent 6890 type, column: BPX-5 (0.25 mm × 30 m, film thickness: 0.25 μm), column temperature: 50 ° C. (5 min) → 20 ° C./min→350° C. (5 min), inlet Temperature: 280 ° C., flow rate: He 1.0 mL / min, detector: FID, detector temperature: 350 ° C., sample injection volume: 1.0 μL, split ratio: 50: 1, syringe cleaning solvent: DMSO, syringe cleaning Solvent: A: 3 times, B: 3 times

(実施例1)
(ポリイミドワニスの製造)
 窒素雰囲気下、溶媒トラップおよびフィルターを取り付けた真空ポンプが接続された反応容器に、1.25gのイソキノリンを投入した。次に、反応容器にγ-ブチロラクトン(GBL)375.00g、2,2’-ビス(トリフルオロメチル)-4,4’-ジアミノジフェニル(TFMB)104.12gを投入し、撹拌して完溶させた。さらに4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸二無水物(6FDA)を145.88g加えた後、撹拌しつつオイルバスで昇温を開始した。加えたTFMBと6FDAとのモル比は、6FDA:TFMBが1.00:0.99であり、液中のモノマー濃度が40wt%であった。原料モノマー100質量部に対する3級アミンの質量部は0.5になる。内温が80℃に到達したところで650mmHgまで減圧し、続けて内温180℃まで昇温した。180℃到達後、さらに4時間加熱撹拌を行った後に大気圧まで復圧し、155℃まで冷却しポリイミド溶液を得た。155℃にてGBLを加えてポリイミドの固形分が24wt%である均一溶液とし、その後、反応容器からポリイミドワニスを取り出した。
Example 1
(Manufacture of polyimide varnish)
Under a nitrogen atmosphere, 1.25 g of isoquinoline was charged into a reaction vessel connected to a vacuum pump equipped with a solvent trap and a filter. Next, 375.00 g of γ-butyrolactone (GBL) and 104.12 g of 2,2′-bis (trifluoromethyl) -4,4′-diaminodiphenyl (TFMB) were added to the reaction vessel and stirred to completely dissolve. I let you. Further, 145.88 g of 4,4 ′-(hexafluoroisopropylidene) diphthalic dianhydride (6FDA) was added, and the temperature was raised in an oil bath while stirring. The molar ratio of TFMB and 6FDA added was 1.00: 0.99 for 6FDA: TFMB, and the monomer concentration in the liquid was 40 wt%. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.5. When the internal temperature reached 80 ° C., the pressure was reduced to 650 mmHg, and then the internal temperature was raised to 180 ° C. After reaching 180 ° C., the mixture was further heated and stirred for 4 hours, then returned to atmospheric pressure and cooled to 155 ° C. to obtain a polyimide solution. GBL was added at 155 ° C. to obtain a uniform solution having a polyimide solid content of 24 wt%, and then the polyimide varnish was taken out from the reaction vessel.

 (ポリイミドフィルムの製造)
 得られたポリイミドワニス200.00gにGBL38.31gおよびN,N-ジメチルアセトアミド(DMAc)11.82gを加えてさらに希釈した。それをPET(ポリエチレンテレフタラート)フィルム上で流涎成形して塗膜とした後、50℃で30分、140℃で10分加熱してポリイミドフィルムを得た。PETから剥離してさらに200℃40分加熱することで、膜厚80μm、Tt92.6%、Haze 0.1%、黄色度2.2のフィルムを得た。
(Manufacture of polyimide film)
To 200.00 g of the obtained polyimide varnish, 38.31 g of GBL and 11.82 g of N, N-dimethylacetamide (DMAc) were added for further dilution. After casting it on a PET (polyethylene terephthalate) film to form a coating film, it was heated at 50 ° C. for 30 minutes and 140 ° C. for 10 minutes to obtain a polyimide film. The film having a film thickness of 80 μm, a Tt of 92.6%, a Haze of 0.1% and a yellowness of 2.2 was obtained by peeling from the PET and further heating at 200 ° C. for 40 minutes.

(実施例2)
 180℃到達後の液体の加熱撹拌時間を3時間とする以外は、実施例1と同様にし、Tt92.7%、Haze 0.1%、黄色度2.0のフィルムを得た。
(Example 2)
A film having a Tt of 92.7%, a haze of 0.1% and a yellowness of 2.0 was obtained in the same manner as in Example 1 except that the heating and stirring time of the liquid after reaching 180 ° C. was 3 hours.

(実施例3)
 イソキノリンの量を0.75gとする以外は実施例2と同様とし、Tt92.4%、Haze 0.1%、黄色度1.8のフィルムを得た。原料モノマー100質量部に対する3級アミンの質量部は0.3になる。
(Example 3)
A film having a Tt of 92.4%, a haze of 0.1%, and a yellowness of 1.8 was obtained except that the amount of isoquinoline was changed to 0.75 g. The mass part of the tertiary amine is 0.3 with respect to 100 parts by mass of the raw material monomer.

(比較例1)
 イソキノリンの量を2.00gとし、工程中減圧を一切行わず、内温が180℃になってから5時間加熱撹拌を行った以外は実施例1と同様とし、Tt92.5%、Haze 0.1%、黄色度2.4のフィルムを得た。原料モノマー100質量部に対する3級アミンの質量部は0.8になる。
(Comparative Example 1)
The same procedure as in Example 1 was conducted except that the amount of isoquinoline was 2.00 g, no pressure reduction was performed during the process, and the mixture was heated and stirred for 5 hours after the internal temperature reached 180 ° C., Tt 92.5%, Haze 0. A film with 1% yellowness of 2.4 was obtained. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.8.

(比較例2)
 イソキノリンの量を2.50gとし、γ-ブチロラクトン(GBL)の量を464.29g、TFMBの量を103.50g、6FDAの量を146.50gとして、TFMBと6FDAとのモル比を、6FDA:TFMBが1.00:0.98、液中のモノマー濃度を35wt%とし、工程中減圧を一切行わず、内温が180℃になってから5時間加熱撹拌を行った以外は実施例1と同様とし、Tt92.5%、Haze 0.1%、黄色度3.0のフィルムを得た。原料モノマー100質量部に対する3級アミンの質量部は1.0になる。
(Comparative Example 2)
The amount of isoquinoline was 2.50 g, the amount of γ-butyrolactone (GBL) was 464.29 g, the amount of TFMB was 103.50 g, the amount of 6FDA was 146.50 g, and the molar ratio of TFMB to 6FDA was 6FDA: Example 1 except that the TFMB was 1.00: 0.98, the monomer concentration in the liquid was 35 wt%, no pressure reduction was performed during the process, and the stirring was performed for 5 hours after the internal temperature reached 180 ° C. In the same manner, a film having a Tt of 92.5%, a haze of 0.1%, and a yellowness of 3.0 was obtained. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 1.0.

(比較例3)
 イソキノリンに代えてトリエチルアミンを3.00g添加し、TFMBの量を104.73gとし、6FDAを145.27gとし、TFMBと6FDAとのモル比を1.00:1.00とし、液中のモノマー濃度は40wt%のままとし、工程中減圧を一切行わず、内温が180℃になってから5時間加熱撹拌を行った以外は実施例1と同様とし、黄色度2.1のフィルムを得た。原料モノマー100質量部に対する3級アミンの質量部は1.2になる。
(Comparative Example 3)
In place of isoquinoline, 3.00 g of triethylamine was added, the amount of TFMB was 104.73 g, 6FDA was 145.27 g, the molar ratio of TFMB to 6FDA was 1.00: 1.00, and the monomer concentration in the liquid Was kept at 40 wt%, and was not subjected to any pressure reduction during the process, and was the same as Example 1 except that the stirring was carried out for 5 hours after the internal temperature reached 180 ° C. to obtain a film having a yellowness of 2.1. . The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 1.2.

 条件及び結果を表1に示す。 Table 1 shows the conditions and results.

Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000011

 第三級アミンを添加しつつ加熱中に減圧した実施例1~3では、高い耐折性を達成できた。これに対して、加熱中に減圧しなかった比較例1~3では、実施例より触媒量を高くしてもなお耐折性を高くすることができなかった。比較例における触媒量を実施例と同程度にすると、耐折性はさらに悪化することが予想される。 In Examples 1 to 3 in which the pressure was reduced during heating while adding a tertiary amine, high folding resistance could be achieved. On the other hand, in Comparative Examples 1 to 3 in which the pressure was not reduced during the heating, folding resistance could not be improved even when the amount of the catalyst was increased as compared with the Examples. If the catalyst amount in the comparative example is set to the same level as in the examples, the folding resistance is expected to be further deteriorated.

(実施例A1)
(ポリイミドワニスの製造)
 窒素雰囲気下、溶媒トラップおよびフィルターを取り付けた真空ポンプが接続された反応容器に、1.25gのイソキノリンを投入した。次に、反応容器にγ-ブチロラクトン(GBL)305.58g、2,2’-ビス(トリフルオロメチル)-4,4’-ジアミノジフェニル(TFMB)104.43gを投入し、撹拌して完溶させた。さらに4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸二無水物(6FDA)を145.59g加えた後、撹拌しつつオイルバスで昇温を開始した。加えたTFMBと6FDAとのモル比は、6FDA:TFMBが1.00:0.995であり、モノマー濃度が45wt%であった。原料モノマー100質量部に対する3級アミンの質量部は0.5になる。内温が120℃に到達したところで610mmHgまで減圧し、続けて内温200℃まで昇温した。200℃到達後、さらに5.5時間加熱撹拌を行った後に大気圧まで復圧し、170℃まで冷却しポリイミド溶液を得た。減圧前後に反応容器中の酸素濃度を確認したところ、0.2%であった。170℃にてGBL(溶媒B)を加えてポリイミドの固形分が40wt%である均一溶液とし、さらに、155℃にてN,N-ジメチルアセトアミド(溶媒B)を加えてポリイミドの固形分が20wt%である均一溶液とし、反応容器からポリイミドワニスを取り出した。
(Example A1)
(Manufacture of polyimide varnish)
Under a nitrogen atmosphere, 1.25 g of isoquinoline was charged into a reaction vessel connected to a vacuum pump equipped with a solvent trap and a filter. Next, 305.58 g of γ-butyrolactone (GBL) and 104.43 g of 2,2′-bis (trifluoromethyl) -4,4′-diaminodiphenyl (TFMB) were added to the reaction vessel and stirred to completely dissolve. I let you. Further, 145.59 g of 4,4 ′-(hexafluoroisopropylidene) diphthalic dianhydride (6FDA) was added, and the temperature was raised in an oil bath while stirring. The molar ratio of TFMB and 6FDA added was 1.00: 0.995 for 6FDA: TFMB, and the monomer concentration was 45 wt%. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.5. When the internal temperature reached 120 ° C., the pressure was reduced to 610 mmHg, and then the internal temperature was raised to 200 ° C. After reaching 200 ° C., the mixture was further heated and stirred for 5.5 hours, then returned to atmospheric pressure and cooled to 170 ° C. to obtain a polyimide solution. When the oxygen concentration in the reaction vessel was confirmed before and after decompression, it was 0.2%. GBL (solvent B) is added at 170 ° C. to obtain a homogeneous solution having a polyimide solid content of 40 wt%, and N, N-dimethylacetamide (solvent B) is added at 155 ° C. to obtain a polyimide solid content of 20 wt%. %, And the polyimide varnish was taken out from the reaction vessel.

 (ポリイミドフィルムの製造)
 得られたポリイミドワニス200.00gにN,N-ジメチルアセトアミド(DMAc)50gを加えてさらに希釈した。それをPET(ポリエチレンテレフタラート)フィルム上で流涎成形して塗膜とした後、50℃で30分、140℃で10分加熱してポリイミドフィルムを得た。PETから剥離してさらに200℃40分加熱することで、膜厚80μm、Tt92.0%、Haze 0.1%、黄色度3.9のフィルムを得た。
(Manufacture of polyimide film)
To 200.00 g of the obtained polyimide varnish, 50 g of N, N-dimethylacetamide (DMAc) was added for further dilution. After casting it on a PET (polyethylene terephthalate) film to form a coating film, it was heated at 50 ° C. for 30 minutes and 140 ° C. for 10 minutes to obtain a polyimide film. The film having a film thickness of 80 μm, a Tt of 92.0%, a Haze of 0.1%, and a yellowness of 3.9 was obtained by peeling from the PET and further heating at 200 ° C. for 40 minutes.

(実施例A2)
 γ-ブチロラクトン(GBL)の量を375.03gに変更し、また内温が120℃に到達したところで610mmHgまで減圧し、続けて内温180℃まで昇温し、180℃到達後、さらに8.5時間加熱撹拌を行った以外は実施例A1と同様とし、ポリイミド溶液を得た。反応容器内の全溶液において、モノマー濃度は40wt%であった。原料モノマー100質量部に対する3級アミンの質量部は0.5になる。減圧前後に反応容器中の酸素濃度を確認したところ、0.2%であった。155℃にてN,N-ジメチルアセトアミド(DMAc)(溶媒B)を加えてポリイミドの固形分が20wt%である均一溶液とし、反応容器からポリイミドワニスを取り出した。
 得られたポリイミドワニスを用いて、実施例A1と同様にしてポリイミドフィルムを製造し、膜厚80μm、Tt92.0%、Haze 0.1%、黄色度3.9のフィルムを得た。
(Example A2)
The amount of γ-butyrolactone (GBL) was changed to 375.03 g, and when the internal temperature reached 120 ° C., the pressure was reduced to 610 mmHg, then the internal temperature was increased to 180 ° C., and after reaching 180 ° C., further 8. A polyimide solution was obtained in the same manner as in Example A1 except that heating and stirring were performed for 5 hours. In all the solutions in the reaction vessel, the monomer concentration was 40 wt%. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.5. When the oxygen concentration in the reaction vessel was confirmed before and after decompression, it was 0.2%. N, N-dimethylacetamide (DMAc) (solvent B) was added at 155 ° C. to obtain a homogeneous solution having a polyimide solid content of 20 wt%, and the polyimide varnish was taken out from the reaction vessel.
Using the obtained polyimide varnish, a polyimide film was produced in the same manner as in Example A1, and a film having a film thickness of 80 μm, Tt 92.0%, Haze 0.1%, and a yellowness of 3.9 was obtained.

(実施例A3)
 イソキノリンの量を0.5gに、γ-ブチロラクトン(GBL)の量を375.03gにそれぞれ変更し、また内温が120℃に到達したところで400mmHgまで減圧し、続けて内温180℃まで昇温し、180℃到達後、さらに8.5時間加熱撹拌を行った以外は実施例A1と同様とし、ポリイミド溶液を得た。反応容器内の全溶液において、モノマー濃度は40wt%であった。原料モノマー100質量部に対する3級アミンの質量部は0.2になる。減圧前後に反応容器中の酸素濃度を確認したところ、0.01%未満であった。155℃にてN,N-ジメチルアセトアミド(DMAc)(溶媒B)を加えてポリイミドの固形分が20wt%である均一溶液とし、反応容器からポリイミドワニスを取り出した。
 得られたポリイミドワニスを用いて、実施例A1と同様にしてポリイミドフィルムを製造し、膜厚80μm、Tt92.6%、Haze 0.1%、黄色度2.0のフィルムを得た。
(Example A3)
The amount of isoquinoline was changed to 0.5 g and the amount of γ-butyrolactone (GBL) was changed to 375.03 g. When the internal temperature reached 120 ° C., the pressure was reduced to 400 mmHg and then the internal temperature was raised to 180 ° C. Then, after reaching 180 ° C., a polyimide solution was obtained in the same manner as in Example A1, except that the mixture was further heated and stirred for 8.5 hours. In all the solutions in the reaction vessel, the monomer concentration was 40 wt%. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.2. When the oxygen concentration in the reaction vessel was confirmed before and after decompression, it was less than 0.01%. N, N-dimethylacetamide (DMAc) (solvent B) was added at 155 ° C. to obtain a homogeneous solution having a polyimide solid content of 20 wt%, and the polyimide varnish was taken out from the reaction vessel.
Using the obtained polyimide varnish, a polyimide film was produced in the same manner as in Example A1, and a film having a thickness of 80 μm, Tt 92.6%, Haze 0.1%, and a yellowness of 2.0 was obtained.

(実施例A4)
 イソキノリンの量を0.5gに変更し、また内温が120℃に到達したところで400mmHgまで減圧し、続けて内温180℃まで昇温し、180℃到達後、さらに5.5時間加熱撹拌を行った以外は実施例A1と同様とし、ポリイミド溶液を得た。反応容器内の全溶液において、モノマー濃度は45wt%であった。原料モノマー100質量部に対する3級アミンの質量部は0.2になる。減圧前後に反応容器中の酸素濃度を確認したところ、0.01%未満であった。ポリイミド溶液に対して、実施例A1と同様にしてGBL(溶媒B)及びN,N-ジメチルアセトアミド(溶媒B)をそれぞれ加え、ポリイミドの固形分が20wt%である均一溶液とし、反応容器からポリイミドワニスを取り出した。
 得られたポリイミドワニスを用いて、実施例A1と同様にしてポリイミドフィルムを製造し、膜厚80μm、Tt92.7%、Haze 0.1%、黄色度1.7のフィルムを得た。
(Example A4)
The amount of isoquinoline was changed to 0.5 g, and when the internal temperature reached 120 ° C., the pressure was reduced to 400 mmHg, then the internal temperature was increased to 180 ° C. After reaching 180 ° C., the mixture was further stirred for 5.5 hours. A polyimide solution was obtained in the same manner as in Example A1, except that this was performed. In all the solutions in the reaction vessel, the monomer concentration was 45 wt%. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.2. When the oxygen concentration in the reaction vessel was confirmed before and after decompression, it was less than 0.01%. GBL (solvent B) and N, N-dimethylacetamide (solvent B) were respectively added to the polyimide solution in the same manner as in Example A1 to obtain a uniform solution having a polyimide solid content of 20 wt%. The varnish was removed.
Using the obtained polyimide varnish, a polyimide film was produced in the same manner as in Example A1, and a film having a thickness of 80 μm, Tt 92.7%, Haze 0.1%, and a yellowness of 1.7 was obtained.

(実施例A5)
 実施例A4と同様にして、ポリイミドワニスを製造した。フィルム製造時において、紫外線吸収剤(住友化学(株)製の商品名Sumisorb340)を添加したN,N-ジメチルアセトアミド(DMAc)をポリイミドワニスに添加した以外は、実施例A4と同様にしてポリイミドフィルムを製造した。得られたフィルムは、膜厚80μm、Tt92.4%、Haze 0.2%、黄色度2.3だった。なお、表2における単位phrとは、ワニスに含まれるポリイミド系高分子100質量部に対する質量部を意味する。
(Example A5)
A polyimide varnish was produced in the same manner as in Example A4. A polyimide film was prepared in the same manner as in Example A4 except that N, N-dimethylacetamide (DMAc) to which a UV absorber (trade name Sumisorb 340 manufactured by Sumitomo Chemical Co., Ltd.) was added was added to the polyimide varnish. Manufactured. The film obtained had a thickness of 80 μm, Tt 92.4%, Haze 0.2%, and yellowness 2.3. In addition, the unit phr in Table 2 means a part by mass with respect to 100 parts by mass of the polyimide polymer contained in the varnish.

(実施例A6)
 イソキノリンの量を0.5gに変更し、また内温が120℃に到達したところで500mmHgまで減圧し、続けて内温180℃まで昇温し、180℃到達後、さらに5.5時間加熱撹拌を行った以外は実施例A1と同様とし、ポリイミド溶液を得た。反応容器内の全溶液において、モノマー濃度は45wt%であった。原料モノマー100質量部に対する3級アミンの質量部は0.2になる。減圧前後に反応容器中の酸素濃度を確認したところ、0.01%未満であった。ポリイミド溶液に対して、実施例A1と同様にしてGBL(溶媒B)及びN,N-ジメチルアセトアミド(溶媒B)をそれぞれ加え、ポリイミドの固形分が20wt%である均一溶液とし、反応容器からポリイミドワニスを取り出した。
 得られたポリイミドワニスを用いて、実施例A1と同様にしてポリイミドフィルムを製造し、膜厚80μm、Tt92.6%、Haze 0.2%、黄色度2.0のフィルムを得た。
(Example A6)
The amount of isoquinoline was changed to 0.5 g, and when the internal temperature reached 120 ° C., the pressure was reduced to 500 mmHg, then the internal temperature was increased to 180 ° C. After reaching 180 ° C., the mixture was further stirred for 5.5 hours. A polyimide solution was obtained in the same manner as in Example A1, except that this was performed. In all the solutions in the reaction vessel, the monomer concentration was 45 wt%. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.2. When the oxygen concentration in the reaction vessel was confirmed before and after decompression, it was less than 0.01%. GBL (solvent B) and N, N-dimethylacetamide (solvent B) were respectively added to the polyimide solution in the same manner as in Example A1 to obtain a uniform solution having a polyimide solid content of 20 wt%. The varnish was removed.
Using the obtained polyimide varnish, a polyimide film was produced in the same manner as in Example A1, and a film having a film thickness of 80 μm, Tt 92.6%, Haze 0.2%, and a yellowness of 2.0 was obtained.

(実施例A7)
 イソキノリンの量を0.5gに変更し、また内温が120℃に到達したところで400mmHgまで減圧し、続けて内温180℃まで昇温し、180℃到達後、さらに5.5時間加熱撹拌を行った以外は実施例A1と同様とし、ポリイミド溶液を得た。反応容器内の全溶液において、モノマー濃度は45wt%であった。原料モノマー100質量部に対する3級アミンの質量部は0.2になる。減圧前後に反応容器中の酸素濃度を確認したところ、0.01%未満であった。ポリイミド溶液に対して、170℃にてGBL(溶媒B)を加えてポリイミドの固形分が40wt%である均一溶液とし、さらに、130℃にてシクロペンタノン(溶媒B)を加えてポリイミドの固形分が20wt%である均一溶液とし、反応容器からポリイミドワニスを取り出した。
 得られたポリイミドワニス200.00gに対してDMAcに代えてシクロペンタノン50gを加えてさらに希釈した以外は、実施例A1と同様にしてポリイミドフィルムを製造し、膜厚80μm、Tt92.6%、Haze 0.1%、黄色度1.9のフィルムを得た。
(Example A7)
The amount of isoquinoline was changed to 0.5 g, and when the internal temperature reached 120 ° C., the pressure was reduced to 400 mmHg, then the internal temperature was increased to 180 ° C. After reaching 180 ° C., the mixture was further stirred for 5.5 hours. A polyimide solution was obtained in the same manner as in Example A1 except that the procedure was performed. In all the solutions in the reaction vessel, the monomer concentration was 45 wt%. The mass part of the tertiary amine with respect to 100 parts by mass of the raw material monomer is 0.2. When the oxygen concentration in the reaction vessel was confirmed before and after decompression, it was less than 0.01%. GBL (solvent B) is added to the polyimide solution at 170 ° C. to obtain a uniform solution having a polyimide solid content of 40 wt%, and further, cyclopentanone (solvent B) is added at 130 ° C. to solidify the polyimide. A homogeneous solution having a content of 20 wt% was taken out, and the polyimide varnish was taken out from the reaction vessel.
A polyimide film was produced in the same manner as in Example A1, except that 500.00 g of cyclopentanone was added instead of DMAc and further diluted with respect to 200.00 g of the obtained polyimide varnish, and the film thickness was 80 μm, Tt 92.6%, A film having a haze of 0.1% and a yellowness of 1.9 was obtained.

(実施例A8)
 実施例A7と同様にして、ポリイミドワニスを製造した。フィルム製造時において、紫外線吸収剤(住友化学(株)製の商品名Sumisorb340)を添加したシクロペンタノンをポリイミドワニスに添加した以外は、実施例A7と同様にしてポリイミドフィルムを製造した。得られたフィルムは、膜厚80μm、Tt92.5%、Haze 0.1%、黄色度2.4だった。なお、表2における単位phrとは、ワニスに含まれるポリイミド系高分子100質量部に対する質量部を意味する。
(Example A8)
A polyimide varnish was produced in the same manner as in Example A7. A polyimide film was produced in the same manner as in Example A7, except that cyclopentanone added with an ultraviolet absorber (trade name Sumisorb 340 manufactured by Sumitomo Chemical Co., Ltd.) was added to the polyimide varnish. The resulting film had a thickness of 80 μm, Tt 92.5%, Haze 0.1%, and yellowness 2.4. In addition, the unit phr in Table 2 means a part by mass with respect to 100 parts by mass of the polyimide polymer contained in the varnish.

 条件及び結果を表2に示す。 Table 2 shows the conditions and results.

Figure JPOXMLDOC01-appb-T000012
Figure JPOXMLDOC01-appb-T000012

 以下の実施例において、ポリイミドの収率は、式「(洗浄後の溶媒Cに含まれる樹脂固形分+製造したポリイミドワニス中の樹脂固形分の合計量(単位:重量))/原料モノマーの仕込み量から算出されるポリイミド系高分子の理論量(単位:重量)×100」により算出した。洗浄後の溶媒Cとは、以下の例において、1回目のポリイミドワニスの製造後に行った洗浄液である。製造したポリイミドワニスとは、以下の例において、2回目のポリイミドワニスの製造で得られたポリイミドワニスである。原料モノマーの仕込み量から算出されるポリイミド系高分子の理論量とは、以下の例において、2回目のポリイミドワニスの製造における原料モノマーの仕込み量から算出されるポリイミド系高分子の理論量である。 In the following examples, the yield of polyimide is expressed by the formula “(total amount of resin solids contained in solvent C after washing + total amount of resin solids in manufactured polyimide varnish (unit: weight)) / preparation of raw material monomers. The theoretical amount (unit: weight) of the polyimide-based polymer calculated from the amount × 100 ”was calculated. The solvent C after washing | cleaning is the washing | cleaning liquid performed after manufacture of the 1st polyimide varnish in the following examples. The produced polyimide varnish is a polyimide varnish obtained by the second production of the polyimide varnish in the following examples. The theoretical amount of polyimide polymer calculated from the charged amount of raw material monomer is the theoretical amount of polyimide polymer calculated from the charged amount of raw material monomer in the second production of polyimide varnish in the following example. .

(実施例B1) 
 実施例A7と同様にしてポリイミドワニスを製造し、得られたポリイミドワニスを反応容器から抜出した後、反応容器に溶媒Cとしてシクロペンタノンを注入し、130℃に昇温して3時間加熱して洗浄した。洗浄に用いたシクロペンタノンを反応容器から抜出して回収した(洗浄後の溶媒C)。その後、反応容器に溶媒DとしてGBLを注入して200℃に昇温し、8時間加熱して洗浄した。洗浄した反応容器で実施例10に準じて再び合成し、2回目のポリイミドワニスを得た。反応容器から取り出す前に溶液に添加する希釈用の溶媒Bのシクロペンタノンとして上記洗浄後の溶媒Cを用い、ポリイミドワニスを得た。得られた2回目のポリイミドワニスに含まれるポリイミドは、ポリスチレン換算重量平均分子量が32万であり、ポリイミドの収率は97.2%であった。
 次いで、この2回目のポリイミドワニスを用いて実施例A7と同様にしてポリイミドフィルムを製造し、膜厚80μm、Tt92.5%、Haze 0.1%、黄色度が2.1のフィルムを得た。
(Example B1)
A polyimide varnish was produced in the same manner as in Example A7, and the obtained polyimide varnish was extracted from the reaction vessel, and then cyclopentanone was injected as a solvent C into the reaction vessel, heated to 130 ° C. and heated for 3 hours. And washed. The cyclopentanone used for washing was extracted from the reaction vessel and recovered (solvent C after washing). Thereafter, GBL was poured into the reaction vessel as solvent D, heated to 200 ° C., heated for 8 hours and washed. It was synthesized again according to Example 10 in the washed reaction vessel to obtain a second polyimide varnish. The polyimide varnish was obtained using the solvent C after washing as the cyclopentanone of the solvent B for dilution added to the solution before taking out from the reaction vessel. The polyimide contained in the obtained second polyimide varnish had a polystyrene-equivalent weight average molecular weight of 320,000, and the yield of polyimide was 97.2%.
Next, using this second polyimide varnish, a polyimide film was produced in the same manner as in Example A7, and a film having a film thickness of 80 μm, Tt 92.5%, Haze 0.1%, and a yellowness of 2.1 was obtained. .

(実施例B2) 
 ポリイミドワニスを反応容器から抜出した後に行う溶媒Cでのシクロペンタノンでの洗浄時間を28時間に変更して洗浄液を回収(洗浄後の溶媒C)する以外は実施例B1と同様にして2回目のポリイミドワニスを得た。得られた2回目のポリイミドワニスに含まれるポリイミドは、ポリスチレン換算重量平均分子量が34万であり、ポリイミドの収率は96.6%であった。
 次いで、この2回目のポリイミドワニスを用いて実施例A7と同様にしてポリイミドフィルムを製造し、膜厚80μm、Tt92.6%、Haze 0.1%、黄色度が2.2のフィルムを得た。
(Example B2)
The second time in the same manner as in Example B1, except that the washing time with cyclopentanone in solvent C after the polyimide varnish was extracted from the reaction vessel was changed to 28 hours and the washing liquid was collected (solvent C after washing). The polyimide varnish was obtained. The polyimide contained in the obtained second polyimide varnish had a polystyrene equivalent weight average molecular weight of 340,000, and the yield of polyimide was 96.6%.
Next, using this second polyimide varnish, a polyimide film was produced in the same manner as in Example A7, and a film having a film thickness of 80 μm, Tt 92.6%, Haze 0.1%, and a yellowness of 2.2 was obtained. .

(実施例B3) 
 実施例A4と同様にしてポリイミドワニスを製造し、得られたポリイミドワニスを反応容器から抜出した後、反応容器に溶媒CとしてGBLを注入し、200℃に昇温して8時間加熱して洗浄した。洗浄に用いたGBLを反応容器から抜出して回収した。その後、反応容器に溶媒DとしてGBLを注入して200℃に昇温し、8時間加熱して洗浄した。洗浄した反応容器で実施例A4と同様にして2回目のポリイミドワニスを製造した。このとき、上記洗浄後の溶媒C及びDは、2回目のポリイミドワニスの製造(希釈)に加えなかった。得られた2回目のポリイミドワニスに含まれるポリイミドは、ポリスチレン換算重量平均分子量が36万であり、ポリイミドの収率は92.2%であった。
 次いで、2回目のこのポリイミドワニスを用いて実施例A4と同様にしてポリイミドフィルムを製造し、膜厚80μm、Tt92.7%、Haze 0.1%、黄色度が1.7のフィルムを得た。
(Example B3)
A polyimide varnish was produced in the same manner as in Example A4. After the obtained polyimide varnish was extracted from the reaction vessel, GBL was injected as a solvent C into the reaction vessel, heated to 200 ° C., heated for 8 hours and washed. did. GBL used for washing was extracted from the reaction vessel and collected. Thereafter, GBL was poured into the reaction vessel as solvent D, heated to 200 ° C., heated for 8 hours and washed. A second polyimide varnish was produced in the same manner as in Example A4 using the washed reaction vessel. At this time, the solvents C and D after the washing were not added to the second production (dilution) of the polyimide varnish. The polyimide contained in the obtained second polyimide varnish had a polystyrene equivalent weight average molecular weight of 360,000, and the yield of polyimide was 92.2%.
Next, using this polyimide varnish for the second time, a polyimide film was produced in the same manner as in Example A4, and a film having a film thickness of 80 μm, Tt 92.7%, Haze 0.1%, and a yellowness of 1.7 was obtained. .

(実施例B4) 
 実施例A7と同様にしてポリイミドワニスを製造し、得られたポリイミドワニスを反応容器から抜出した後、反応容器に溶媒CとしてGBLを注入し、200℃に昇温して8時間加熱して洗浄した。洗浄に用いたGBLを反応容器から抜出して回収した。その後、反応容器に溶媒DとしてGBLを注入して200℃に昇温し、8時間加熱して洗浄した。洗浄した反応容器で実施例A7と同様にして2回目のポリイミドワニスを製造した。このとき、上記洗浄後の溶媒C及びDは、2回目のポリイミドワニスの製造(希釈)に加えなかった。得られた2回目のポリイミドワニスに含まれるポリイミドは、ポリスチレン換算重量平均分子量が31万であり、ポリイミドの収率は91.3%であった。
 次いで、この2回目のポリイミドワニスを用いて実施例A7と同様にしてポリイミドフィルムを製造し、膜厚80μm、Tt92.6%、Haze 0.1%、黄色度が1.9のフィルムを得た。
(Example B4)
A polyimide varnish was produced in the same manner as in Example A7. After the obtained polyimide varnish was extracted from the reaction vessel, GBL was injected as a solvent C into the reaction vessel, heated to 200 ° C., heated for 8 hours and washed. did. GBL used for washing was extracted from the reaction vessel and collected. Thereafter, GBL was poured into the reaction vessel as solvent D, heated to 200 ° C., heated for 8 hours and washed. A second polyimide varnish was produced in the same manner as in Example A7 using the washed reaction vessel. At this time, the solvents C and D after the washing were not added to the second production (dilution) of the polyimide varnish. The polyimide contained in the obtained second polyimide varnish had a polystyrene equivalent weight average molecular weight of 310,000, and the yield of polyimide was 91.3%.
Next, using this second polyimide varnish, a polyimide film was produced in the same manner as in Example A7, and a film having a thickness of 80 μm, Tt 92.6%, Haze 0.1%, and a yellowness of 1.9 was obtained. .

(参考例B1) 
 実施例A2と同様にしてポリイミドワニスを製造し、得られたポリイミドワニスを反応容器から抜出した後、反応容器に溶媒CとしてGBLを注入し、200℃に昇温して8時間加熱して洗浄した。洗浄に用いたGBLを反応容器から抜出して回収した。その後、反応容器に溶媒DとしてGBLを注入して200℃に昇温し、8時間加熱して洗浄した。洗浄した反応容器で実施例A2と同様にして2回目のポリイミドワニスを製造した。このとき、上記洗浄後の溶媒C及びDは、2回目のポリイミドワニスの製造(希釈)に加えなかった。得られた2回目のポリイミドワニスに含まれるポリイミドは、ポリスチレン換算重量平均分子量が22万であり、ポリイミドの収率は94.5%であった。
 次いで、この2回目のポリイミドワニスを用いて実施例A2と同様にしてポリイミドフィルムを製造し、膜厚80μm、Tt92.0%、Haze 0.1%、黄色度が3.9のフィルムを得た。
 条件及び結果を表3に示す。
(Reference Example B1)
A polyimide varnish was produced in the same manner as in Example A2, and the obtained polyimide varnish was extracted from the reaction vessel. Then, GBL was injected as a solvent C into the reaction vessel, heated to 200 ° C., heated for 8 hours and washed. did. GBL used for washing was extracted from the reaction vessel and collected. Thereafter, GBL was poured into the reaction vessel as solvent D, heated to 200 ° C., heated for 8 hours and washed. A second polyimide varnish was produced in the same manner as in Example A2 using the washed reaction vessel. At this time, the solvents C and D after the washing were not added to the second production (dilution) of the polyimide varnish. The polyimide contained in the obtained second polyimide varnish had a polystyrene equivalent weight average molecular weight of 220,000, and the yield of polyimide was 94.5%.
Next, using the second polyimide varnish, a polyimide film was produced in the same manner as in Example A2, and a film having a thickness of 80 μm, Tt 92.0%, Haze 0.1%, and a yellowness of 3.9 was obtained. .
The conditions and results are shown in Table 3.

Figure JPOXMLDOC01-appb-T000013
Figure JPOXMLDOC01-appb-T000013

Claims (17)

 ポリイミド系高分子の原料モノマーを溶媒中において重合してポリイミド系高分子前駆体を得る重合工程、及び、減圧環境下、第三級アミンを含む溶媒中において前記ポリイミド系高分子前駆体をイミド化してポリイミド系高分子の溶液を得るイミド化工程を含む、ポリイミド系高分子ワニスの製造方法。 A polymerization step of polymerizing a raw material monomer of a polyimide polymer in a solvent to obtain a polyimide polymer precursor, and imidation of the polyimide polymer precursor in a solvent containing a tertiary amine under a reduced pressure environment A method for producing a polyimide polymer varnish, comprising an imidization step of obtaining a polyimide polymer solution.  前記イミド化工程の温度が100℃以上250℃以下である請求項1記載の製造方法。 The manufacturing method according to claim 1, wherein the temperature in the imidization step is 100 ° C or higher and 250 ° C or lower.  前記第三級アミンが、120℃以上350℃以下の沸点を有する、請求項1又は2に記載の製造方法。 The production method according to claim 1 or 2, wherein the tertiary amine has a boiling point of 120 ° C or higher and 350 ° C or lower.  前記ポリイミド系高分子がフッ素を20質量%以上含む、請求項1~3のいずれか1項に記載の製造方法。 The production method according to any one of claims 1 to 3, wherein the polyimide polymer contains 20 mass% or more of fluorine.  前記減圧環境の圧力は350mmHg以上730mmHg以下である、請求項1~4のいずれか1項に記載の製造方法。 The manufacturing method according to any one of claims 1 to 4, wherein the pressure in the reduced pressure environment is 350 mmHg or more and 730 mmHg or less.  前記減圧環境の圧力は500mmHg以上730mmHg以下である、請求項5に記載の製造方法。 The manufacturing method according to claim 5, wherein the pressure in the reduced pressure environment is 500 mmHg or more and 730 mmHg or less.  前記イミド化工程において前記溶媒を含む液相と接触する気相の酸素濃度が0.02%以下である請求項1~6のいずれか1項に記載の製造方法。 The production method according to any one of claims 1 to 6, wherein an oxygen concentration in a gas phase contacting with a liquid phase containing the solvent in the imidization step is 0.02% or less.  100質量部の前記原料モノマーに対して、前記第三級アミンを0.05質量部以上0.7質量部以下添加する、請求項1~7のいずれか1項に記載の製造方法。 The production method according to any one of claims 1 to 7, wherein 0.05 parts by weight or more and 0.7 parts by weight or less of the tertiary amine is added to 100 parts by weight of the raw material monomer.  得られた前記ポリイミド系高分子の溶液に、紫外線吸収剤を添加する工程をさらに備える、請求項1~8のいずれか1項に記載の製造方法。 The production method according to any one of claims 1 to 8, further comprising a step of adding an ultraviolet absorber to the obtained polyimide polymer solution.  得られた前記ポリイミド系高分子の溶液に、シリカゾルを添加する工程をさらに備える、請求項1~9のいずれか1項に記載の製造方法。 10. The production method according to claim 1, further comprising a step of adding silica sol to the obtained polyimide polymer solution.  請求項1~10のいずれか1項のポリイミド系高分子ワニスの製造方法を実施する工程と、
 得られたポリイミド系高分子ワニス中のポリイミド系高分子を析出及び再溶解させることなく、前記ポリイミド系高分子ワニスを流延成形するフィルム化工程と、を備える、ポリイミド系高分子フィルムの製造方法。
Carrying out the method for producing a polyimide-based polymer varnish according to any one of claims 1 to 10,
A film forming step of casting the polyimide polymer varnish without depositing and re-dissolving the polyimide polymer in the obtained polyimide polymer varnish, and a method for producing a polyimide polymer film .
 重量平均分子量が50,000以上、500,000以下であるポリイミド系高分子と、フィルムの全質量に対して0.01質量%以上0.25質量%以下の第三級アミンとを含むフィルム。 A film containing a polyimide polymer having a weight average molecular weight of 50,000 or more and 500,000 or less and a tertiary amine of 0.01% by mass or more and 0.25% by mass or less with respect to the total mass of the film.  前記第三級アミンの沸点が120℃以上350℃以下である、請求項12記載のフィルム。 The film according to claim 12, wherein the boiling point of the tertiary amine is 120 ° C or higher and 350 ° C or lower. (1) 反応容器において、溶媒A中でモノマー原料を反応させてポリイミド系高分子の溶液を得る工程、
(3) 前記反応容器から前記溶液を取り出す工程、
(4) 溶媒Cで前記反応容器を洗浄し、洗浄後の前記溶媒Cを前記反応容器から取り出す工程、を備え、前記工程(1)、(3)、及び(4)を、同一の反応容器を用いてこの順に繰り返し、
 前記工程(1)で得られるポリイミド系高分子は、透明であり、かつ重量平均分子量が250,000以上である、ポリイミド系高分子ワニスの製造方法。
(1) In a reaction vessel, a step of reacting monomer raw materials in solvent A to obtain a polyimide polymer solution;
(3) removing the solution from the reaction vessel;
(4) washing the reaction vessel with solvent C, and removing the washed solvent C from the reaction vessel, wherein the steps (1), (3), and (4) are the same reaction vessel. Repeat in this order using
The method for producing a polyimide polymer varnish, wherein the polyimide polymer obtained in the step (1) is transparent and has a weight average molecular weight of 250,000 or more.
 (5) 前記工程(4)の後に、溶媒Dで前記反応容器を洗浄し、洗浄後の前記溶媒Dを前記反応容器から取り出す工程、をさらに備え、
 前記工程(1)、(3)、(4)及び(5)を、同一の反応容器を用いてこの順に繰り返す、請求項14に記載のポリイミド系高分子ワニスの製造方法。
(5) After the step (4), further comprising a step of washing the reaction vessel with a solvent D and taking out the solvent D after washing from the reaction vessel,
The manufacturing method of the polyimide-type polymer varnish of Claim 14 which repeats the said process (1), (3), (4) and (5) in this order using the same reaction container.
 前記工程(1)と前記工程(3)との間に、
 (2) 前記反応容器内に溶媒Bを追加して前記工程(1)で得られた前記溶液を希釈する工程をさらに備え、
 前記工程(1)~(4)、又は、前記工程(1)~(5)を同一の反応容器を用いて繰り返す、請求項14又は15に記載の方法。
Between the step (1) and the step (3),
(2) The method further comprises the step of diluting the solution obtained in the step (1) by adding the solvent B in the reaction vessel,
The method according to claim 14 or 15, wherein the steps (1) to (4) or the steps (1) to (5) are repeated using the same reaction vessel.
 前記溶媒Bは、前記工程(4)で前記反応容器から取り出された溶媒Cである、請求項16に記載の方法。 The method according to claim 16, wherein the solvent B is the solvent C removed from the reaction vessel in the step (4).
PCT/JP2017/035007 2016-09-30 2017-09-27 Method for producing polyimide-based polymer varnish, method for producing polyimide-based polymer film, and transparent polyimide-based polymer film Ceased WO2018062296A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2018542658A JP7186617B2 (en) 2016-09-30 2017-09-27 Method for producing polyimide polymer varnish, method for producing polyimide polymer film, and transparent polyimide polymer film
KR1020197012297A KR102494637B1 (en) 2016-09-30 2017-09-27 Manufacturing method of polyimide-based polymer varnish, manufacturing method of polyimide-based polymer film, and transparent polyimide-based polymer film

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-194170 2016-09-30
JP2016194170 2016-09-30

Publications (1)

Publication Number Publication Date
WO2018062296A1 true WO2018062296A1 (en) 2018-04-05

Family

ID=61762660

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2017/035007 Ceased WO2018062296A1 (en) 2016-09-30 2017-09-27 Method for producing polyimide-based polymer varnish, method for producing polyimide-based polymer film, and transparent polyimide-based polymer film

Country Status (4)

Country Link
JP (1) JP7186617B2 (en)
KR (1) KR102494637B1 (en)
TW (1) TWI821162B (en)
WO (1) WO2018062296A1 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018225598A1 (en) * 2017-06-05 2018-12-13 住友化学株式会社 Film, method for evaluating optical homogeneity of film, and film production method
JP2019214657A (en) * 2018-06-12 2019-12-19 旭化成株式会社 Transparent polyimide varnish and film
WO2020067558A1 (en) * 2018-09-29 2020-04-02 日鉄ケミカル&マテリアル株式会社 Polyimide precursor, polyimide produced from same, and flexible device
JP2020097710A (en) * 2018-12-19 2020-06-25 住友化学株式会社 Optical film, flexible display device, and resin composition
JP2020111713A (en) * 2019-01-16 2020-07-27 旭化成株式会社 Polyimide varnish, polyimide film, and methods for producing the same
JP2020158743A (en) * 2019-03-28 2020-10-01 日鉄ケミカル&マテリアル株式会社 Method of manufacturing polyimide film and method of manufacturing metal-clad laminate
CN111936581A (en) * 2018-03-28 2020-11-13 住友化学株式会社 Varnish containing transparent polyimide polymer and solvent
WO2023276093A1 (en) * 2021-06-30 2023-01-05 昭和電工マテリアルズ株式会社 Resin composition and method for producing semiconductor device

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762097A (en) * 1993-08-23 1995-03-07 Kanegafuchi Chem Ind Co Ltd New copolymer and production thereof
JPH09197615A (en) * 1996-01-22 1997-07-31 Toray Ind Inc Memory element
JPH09286858A (en) * 1996-04-24 1997-11-04 Kanegafuchi Chem Ind Co Ltd Polyimide resin composition and its production
JPH09302091A (en) * 1996-05-10 1997-11-25 Kanegafuchi Chem Ind Co Ltd Novel high-elasticity polyimide resin composition
JP2002241498A (en) * 2001-02-16 2002-08-28 Sumitomo Bakelite Co Ltd Process for preparation of polyimide resin
JP2002265600A (en) * 2001-03-14 2002-09-18 Sumitomo Bakelite Co Ltd Method of manufacturing polyimide resin
JP2005325332A (en) * 2004-01-09 2005-11-24 E I Du Pont De Nemours & Co Polyimide composition having water sorption resistance, and method related to the same
JP2009270023A (en) * 2008-05-08 2009-11-19 Kaneka Corp Method of manufacturing polyimide precursor and polyimide obtained by using the method for manufacturing
WO2012081644A1 (en) * 2010-12-15 2012-06-21 宇部興産株式会社 Polyimide seamless belt and process for production thereof, and polyimide precursor solution composition
JP2014114429A (en) * 2012-01-12 2014-06-26 New Japan Chem Co Ltd Solvent-soluble polyimide resin

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000080272A (en) 1998-09-03 2000-03-21 Toray Ind Inc Polymer composition having low dielectric constant
JP2002088242A (en) 2000-09-13 2002-03-27 Kanegafuchi Chem Ind Co Ltd Polyimide resin composition and polyimide film-like molded body
JP2003246870A (en) 2001-12-17 2003-09-05 Toray Ind Inc Biaxially oriented polyester film
JP2006232911A (en) 2005-02-23 2006-09-07 Toray Ind Inc Thermoplastic polyimide precursor composition and method for producing laminated polyimide film by using the same
JP5928447B2 (en) * 2011-08-18 2016-06-01 東レ株式会社 Flexible substrate, display device and light receiving device
KR20180136582A (en) * 2012-12-17 2018-12-24 미쯔비시 케미컬 주식회사 Thermoplastic polyimide
JP6313749B2 (en) * 2013-04-04 2018-04-18 三井化学株式会社 Polyamic acid, varnish containing the same, and polyimide film
JP6228399B2 (en) 2013-07-12 2017-11-08 株式会社日本触媒 Fluorine-containing polyimide resin composition for coating, film obtained therefrom and coating film
KR101980506B1 (en) * 2014-02-14 2019-05-20 아사히 가세이 가부시키가이샤 Polyimide precursor and resin composition containing same
JP6441732B2 (en) * 2014-04-24 2018-12-19 Jfeケミカル株式会社 Polyamic acid composition and polyimide composition
JP6681664B2 (en) 2014-09-05 2020-04-15 株式会社日本触媒 Oxygen gas permeable cell culture substrate containing fluorinated polyimide, cell culture container provided with the substrate, and cell culture method using the substrate

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762097A (en) * 1993-08-23 1995-03-07 Kanegafuchi Chem Ind Co Ltd New copolymer and production thereof
JPH09197615A (en) * 1996-01-22 1997-07-31 Toray Ind Inc Memory element
JPH09286858A (en) * 1996-04-24 1997-11-04 Kanegafuchi Chem Ind Co Ltd Polyimide resin composition and its production
JPH09302091A (en) * 1996-05-10 1997-11-25 Kanegafuchi Chem Ind Co Ltd Novel high-elasticity polyimide resin composition
JP2002241498A (en) * 2001-02-16 2002-08-28 Sumitomo Bakelite Co Ltd Process for preparation of polyimide resin
JP2002265600A (en) * 2001-03-14 2002-09-18 Sumitomo Bakelite Co Ltd Method of manufacturing polyimide resin
JP2005325332A (en) * 2004-01-09 2005-11-24 E I Du Pont De Nemours & Co Polyimide composition having water sorption resistance, and method related to the same
JP2009270023A (en) * 2008-05-08 2009-11-19 Kaneka Corp Method of manufacturing polyimide precursor and polyimide obtained by using the method for manufacturing
WO2012081644A1 (en) * 2010-12-15 2012-06-21 宇部興産株式会社 Polyimide seamless belt and process for production thereof, and polyimide precursor solution composition
JP2014114429A (en) * 2012-01-12 2014-06-26 New Japan Chem Co Ltd Solvent-soluble polyimide resin

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018225598A1 (en) * 2017-06-05 2018-12-13 住友化学株式会社 Film, method for evaluating optical homogeneity of film, and film production method
CN111936581A (en) * 2018-03-28 2020-11-13 住友化学株式会社 Varnish containing transparent polyimide polymer and solvent
JPWO2019189483A1 (en) * 2018-03-28 2021-05-13 住友化学株式会社 Varnish containing transparent polyimide polymer and solvent
JP2019214657A (en) * 2018-06-12 2019-12-19 旭化成株式会社 Transparent polyimide varnish and film
WO2020067558A1 (en) * 2018-09-29 2020-04-02 日鉄ケミカル&マテリアル株式会社 Polyimide precursor, polyimide produced from same, and flexible device
JP2024015064A (en) * 2018-09-29 2024-02-01 日鉄ケミカル&マテリアル株式会社 Polyimide and flexible devices
CN112752787A (en) * 2018-09-29 2021-05-04 日铁化学材料株式会社 Polyimide precursor, polyimide obtained therefrom, and flexible device
JP2020097710A (en) * 2018-12-19 2020-06-25 住友化学株式会社 Optical film, flexible display device, and resin composition
CN111333885B (en) * 2018-12-19 2023-08-25 住友化学株式会社 Optical film, flexible display device, and resin composition
CN111333885A (en) * 2018-12-19 2020-06-26 住友化学株式会社 Optical film, flexible display device and resin composition
JP2020111713A (en) * 2019-01-16 2020-07-27 旭化成株式会社 Polyimide varnish, polyimide film, and methods for producing the same
JP2020158743A (en) * 2019-03-28 2020-10-01 日鉄ケミカル&マテリアル株式会社 Method of manufacturing polyimide film and method of manufacturing metal-clad laminate
JP7277208B2 (en) 2019-03-28 2023-05-18 日鉄ケミカル&マテリアル株式会社 Method for producing polyimide film and method for producing metal-clad laminate
WO2023276093A1 (en) * 2021-06-30 2023-01-05 昭和電工マテリアルズ株式会社 Resin composition and method for producing semiconductor device

Also Published As

Publication number Publication date
KR20190060811A (en) 2019-06-03
JP7186617B2 (en) 2022-12-09
TW201817834A (en) 2018-05-16
JPWO2018062296A1 (en) 2019-07-18
KR102494637B1 (en) 2023-02-02
TWI821162B (en) 2023-11-11

Similar Documents

Publication Publication Date Title
JP7186617B2 (en) Method for producing polyimide polymer varnish, method for producing polyimide polymer film, and transparent polyimide polymer film
JP6675509B2 (en) Film, resin composition and method for producing polyamideimide resin
JP6921758B2 (en) Polyamic acid, polyimide, polyamic acid solution, polyimide laminate, flexible device substrate, and their manufacturing method
CN110199210A (en) Optical film and method for producing optical film
JP6538259B1 (en) Laminate
JP7257901B2 (en) optical film
JP6400875B1 (en) Laminate
KR20200118027A (en) Polyimide resin composition and polyimide film
KR20190098713A (en) Film roll
KR20210093183A (en) Method for producing polyamide-based resin powder
CN114867767A (en) Polyimide resin, polyimide varnish, and polyimide film
JP7083272B2 (en) Optical film
WO2020158784A1 (en) Method for producing polyimide-based resin powder
CN113366051A (en) Colorless transparent polyimide film
WO2020196103A1 (en) Production method for colorless transparent resin film
CN111051384A (en) Polyimide, polyimide varnish and polyimide film
JP2023083242A (en) Polyimide resin powder and method for producing polyimide resin powder
TW202012508A (en) Method for producing polyamide-based resin powder and polyamide-based resin composition capable of facilitating efficient production of a polyamide-based resin powder
JP2019038916A (en) SOLUBLE TRANSPARENT POLYIMIDE POLYMERIZED IN γ-BUTYROLACTONE SOLVENT
TW202000734A (en) Method for producing polyamide-imide precursor capable of producing a polyamide-imide precursor having a high molecular weight
JP2021075363A (en) Manufacturing method for dried film roll

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17856245

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2018542658

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20197012297

Country of ref document: KR

Kind code of ref document: A

122 Ep: pct application non-entry in european phase

Ref document number: 17856245

Country of ref document: EP

Kind code of ref document: A1