WO2017200226A1 - Device for measuring three-dimensional shape using multi-wavelength optical scanning interferometer - Google Patents
Device for measuring three-dimensional shape using multi-wavelength optical scanning interferometer Download PDFInfo
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- WO2017200226A1 WO2017200226A1 PCT/KR2017/004578 KR2017004578W WO2017200226A1 WO 2017200226 A1 WO2017200226 A1 WO 2017200226A1 KR 2017004578 W KR2017004578 W KR 2017004578W WO 2017200226 A1 WO2017200226 A1 WO 2017200226A1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/16—Measuring arrangements characterised by the use of optical techniques for measuring the deformation in a solid, e.g. optical strain gauge
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
Definitions
- the present invention relates to a three-dimensional shape measuring apparatus using a scanning interferometer, and more particularly, to a technology that can significantly reduce the measurement time by greatly reducing the scan length in the height direction of the object using a multi-wavelength light source. It is about.
- WSI white light scanning interferometry
- 1 is a general optical system configuration diagram of a white light scanning interferometer, and includes a light source 10, a light separator 20, a reference mirror 30, a measurement sample 40, and a measurement unit 50.
- the white light irradiated from the light source 10 is separated into the measurement light and the reference light by the optical separator 20, and irradiated onto the surface of the measurement sample 40, which is the measurement plane, and the surface of the reference mirror 30, which is the reference plane, respectively.
- the light reflected from each side generates an interference signal through the same optical path.
- the position difference between the measuring point and the reference plane is a short distance within the interference length.
- the interference signal appears only at the point where the measurement path occurs at the same optical path difference as that of the reference plane. Therefore, by acquiring the interference signal for all the measurement points in the measurement area and setting the optical axis direction position at the vertex of each interference signal as the height value, it is possible to realize the three-dimensional solid surface shape of the measurement plane with respect to the reference plane.
- Another method for measuring the height direction of an object may be a method of observing an interference signal at one measuring point while moving the reference mirror 30 at a small interval from side to side.
- the shape measurement method using the conventional white light scanning interferometer has to be scanned in the height direction over the entire measurement height, the scanning time becomes longer, the inspection speed is delayed, and the moving length for moving the measurement sample or the reference mirror becomes longer. A problem arises in that the cost of the service increases.
- the present invention is proposed to solve the problems of the prior art as described above, by using a light source of different wavelengths to separate the height measurement area for each light source to reduce the scan time and the moving length for the scan.
- a light source for irradiating light of at least two different wavelength bands an optical separator for separating the light emitted from the light source, disposed at the bottom of the optical separator
- a reference mirror unit disposed on the sample irradiated with the light reflected by the optical separator, the path of the light transmitted by the optical separator, and providing a reference light corresponding to the number of wavelength bands of the light; It provides a three-dimensional shape measuring apparatus using a multi-wavelength optical scanning interferometer, characterized in that for receiving the measurement light and the reference light reflected from the reference mirror, and separating the received image for each wavelength band.
- the measurement unit is preferably a color image sensor.
- the reference mirror may include a first optical filter that reflects light of a first wavelength band or more, a first reference mirror disposed at a position to which the light reflected by the first optical filter is irradiated to provide a first reference light, and the second reference mirror. It may include a second reference mirror disposed at a position where the light passing through the light filter is irradiated to provide a second reference light.
- the reference mirror is a distance between the optical splitter and the first optical filter c, the distance between the first optical filter and the first reference mirror a, the distance between the first optical filter and the second reference mirror b,
- the distance between the top of the sample is l 1 and the distance between the optical separator and the middle point of the sample height is l 2 ,
- the reference mirror unit may include a first optical filter that reflects light of a first wavelength band or more, a first reference mirror that is disposed at a position to which the light reflected by the first optical filter is irradiated to provide a first reference light, and the first reference mirror A second optical filter disposed on a path of light passing through the optical filter to reflect light above a second wavelength band lower than the first wavelength band, and disposed on a path of light passing through the second optical filter
- the second reference mirror may provide a reference light
- the third reference mirror may be disposed at a position at which the light reflected by the second light filter is irradiated to provide a third reference light.
- the reference mirror is a distance between the optical splitter and the first optical filter l a , the distance between the first optical filter and the first reference mirror l R , the distance between the first optical filter and the second optical filter l b , l B the distance between the second optical filter and the second reference mirror, l G the distance between the second light filter and the third reference mirror, l 1 , the distance between the optical splitter and the top of the sample l 1 , 2/3 of the optical separator and the sample height.
- the inspection time is shortened and thus the yield is remarkably improved.
- FIG. 1 illustrates an optical system structure of a conventional white light scanning interferometer.
- FIG. 2 shows an optical system structure of a white light scanning interferometer using multiple wavelengths according to the first embodiment of the present invention.
- 3 is a view for conceptually explaining a method of measuring the height of a sample using light sources having two different wavelengths.
- FIG. 4 shows an optical system structure of a white light scanning interferometer using multiple wavelengths according to a second embodiment of the present invention.
- FIG. 2 shows an optical system structure of a multi-wavelength optical scanning interferometer according to the present invention, including a light source 100, an optical separator 200, a reference mirror 300, a sample 400, and a measurement unit 500. It is composed.
- the PC measuring the height of the object by using the result measured by the measuring unit 500 and the driving system for moving the object or the reference mirror are omitted for simplicity.
- the light source 100 emits two different wavelengths, that is, the first light and the second light of different colors.
- the first light and the second light are red light and blue light. Red and blue LEDs are described by way of example.
- the optical separator 200 separates the irradiated light into the reference light and the measurement light, and when the separated reference light and the measurement light are reflected and returns to each other, serves to create interference light as a function of the conventional optical separator 200. Is the same member.
- the reference mirror 300 is provided to provide the reference light, and includes an optical filter 310, a first reference mirror 320, and a second reference mirror 330.
- the optical filter 310 is positioned on the path of transmitted light transmitted by the optical separator 200 to transmit only light of a specific wavelength band.
- the light filter 310 transmits light having a wavelength shorter than that of red light and starts from the red band.
- the filter member having the characteristic of reflecting light may be used. Accordingly, the red light of the red light and the blue light emitted from the light source 100 is reflected by the optical filter 310 to be irradiated to the upper first reference mirror 320, and the blue light passes through the optical filter 310 to form a second second light source.
- the reference mirror 330 is irradiated.
- the first reference mirror 320 is installed at a position to which the light reflected by the light filter 310 is irradiated to provide a reference light for the first light.
- the first light is red light.
- the position where the first reference mirror 320 is installed is the sum of the distance c between the optical separator 200 and the optical filter 310 and the distance a between the optical filter 310 and the first reference mirror 320. It may be a point to be the distance (L 1 ) between the optical separator 200 and the top of the sample.
- the second reference mirror 330 is installed at a position to which the light passing through the optical filter 310 is irradiated to provide a reference light for the second light.
- the second light is blue light.
- the position where the second reference mirror 330 is installed is the sum of the distance c between the optical separator 200 and the optical filter 310 and the distance b between the optical filter 310 and the second reference mirror 330. It may be a point to be the distance (L 2 ) between the optical separator 200 and the intermediate point of the sample height.
- the installation positions of the first and second reference mirrors 320 and 330 for generating the reference light are summarized as follows.
- the measurement unit 500 is for receiving the measurement light reflected from the sample 400 and the first and second reference light reflected from the reference mirror 300, and a color image sensor capable of capturing both red and blue light may be provided. Used.
- the measurement unit 500 separates the captured image into an image for the first light source (red light) and an image for the second light source (blue light), and provides the image to the PC, and the PC is provided by the measurement light and the reference light for the first light source.
- the height of the object is calculated by analyzing the generated interference image and the interference image generated by the measurement light and the reference light for the second light source.
- the interference image for the first light source is used to measure the height from the middle point to the top of the sample
- the interference image for the second light source is used to measure the height from the bottom to the middle point of the sample.
- the present invention if the object is moved only as much as half of the height of the object, the upper and lower portions are separately scanned by the two light sources of the object, thereby reducing the scanning time by half.
- FIG 3 is a view for conceptually explaining the object height measuring method according to a first embodiment of the present invention.
- the half height at the top of the sample is treated as the scan area of the first light source, and the half height at the bottom thereof is the scan area of the second light source. Therefore, the height of the top half is measured by the first light source, and the bottom half height is measured by the second light source while the sample is moved upward for height measurement.
- the height (h 2 ) of the second point in the upper region is equal to the path difference between the measurement light of the first light source and the reference light when the sample is moved by ⁇ h 2, so that an interference signal appears. Will be set to the height value.
- FIG 4 shows an optical system structure of a multi-wavelength optical scanning interferometer according to a second embodiment of the present invention. Similar to the first embodiment, the light source 100, the optical splitter 200, the reference mirror 300, Comprising a sample 400 and the measuring unit 500, the PC for measuring the height of the object using the results measured by the measuring unit 500 and the drive system for moving the object or the reference mirror is simple to explain. Omitted for
- the light source 100 emits three different wavelengths, that is, first to third lights of different colors.
- the first to third lights are red light, green light, and blue light.
- the red LED, the green LED, and the blue LED that occur are described as an example.
- the reference mirror 300 is for providing reference light, and includes a first light filter 310, a first reference mirror 320, a second light filter 340, a second reference mirror 330, and a third reference light. It is configured to include a mirror (350).
- the first optical filter 310 is the same member as the first embodiment and is a filter member that reflects light in a red light abnormal band. Accordingly, the red light of the light emitted from the light source 100 is reflected by the optical filter 310 and irradiated to the first reference mirror 320, and the blue light and the green light pass through the optical filter 310 to form a second second light source.
- the optical filter 340 is irradiated.
- the first reference mirror 320 is installed at a position to which the light reflected by the light filter 310 is irradiated to provide a reference light for the first light.
- the first light is red light.
- the position where the first reference mirror 320 is installed is the distance L a between the optical separator 200 and the optical filter 310 and the distance L R between the optical filter 310 and the first reference mirror 320.
- the sum may be a point such that the distance (L 3 ) between the optical separator 200 and a point near 1/3 of the sample height.
- the second optical filter 340 is a member that is positioned on the path of transmitted light transmitted by the first optical filter 310 to transmit only light of a specific wavelength band.
- light of a wavelength band shorter than green light is transmitted.
- a filter member having a property of reflecting light above the green band may be used. Therefore, the green light is reflected by the second optical filter 340 from the light passing through the first optical filter 310 is irradiated to the upper third reference mirror 350, the blue light passes through the second optical filter 340.
- the second reference mirror 330 of the rear end is irradiated.
- the second reference mirror 330 is installed at a position where the light transmitted through the second optical filter 310 is irradiated to provide the reference light for the second light.
- the second light is blue light.
- the position where the second reference mirror 330 is installed is a distance l a between the optical splitter 200 and the first optical filter 310, and the distance between the first optical filter 310 and the second optical filter 340 ( l b) and the second optical filter 340 and the point at which the sum of the distance (l B) between the second reference mirror 330 such that the distance (l 2) between the optical splitter 200 and the top near the point of sample one Can be.
- the third reference mirror 350 is installed at a position to which the light reflected by the second light filter 320 is irradiated to provide a reference light for the third light.
- the third light is green light.
- the position where the third reference mirror 350 is installed is the distance L a between the optical splitter 200 and the first optical filter 310, and the distance between the first optical filter 310 and the second optical filter 340 ( so that the sum of l b ) and the distance l G between the second optical filter 340 and the third reference mirror 330 is the distance l 2 between the optical splitter 200 and a point about two thirds of the sample height. It may be a point.
- the measurement unit 500 is for receiving the measurement light reflected from the sample 400 and the first to third reference lights reflected from the reference mirror 300, and is a color image capable of capturing all of red light, green light, and blue light.
- the sensor is used.
- the measuring unit 500 separates the captured image into an image for the first light source (red light), an image for the second light source (blue light), and a third light (green light), and provides the image to the PC, and the PC is provided to the first light source.
- Height of the object by analyzing the interference image generated by the measurement light and the reference light, the interference image generated by the measurement light and the reference light for the second light source, and the interference image generated by the measurement light and the reference light for the third light source Calculate
- the interference image for the first light source is used to measure the height from the bottom point of the sample to about one third of the sample
- the interference image for the third light source is two thirds to one third of the sample.
- An interference image for the second light source is used to measure the height from the 2/3 height point of the sample to the top point of the sample.
- the scan time is 1/3 because the upper part, the middle part and the lower part of the object are separately scanned by three light sources. The effect is reduced by three times.
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Abstract
Description
본 발명은 주사 간섭계를 이용한 3차원 형상 측정장치에 관한 것으로서, 보다 상세하게는 다중 파장의 광원을 이용하여 물체의 높이 방향의 스캔 길이를 대폭 감소시켜 측정시간을 현저하게 단축시킬 수 있도록 하는 기술에 관한 것이다.The present invention relates to a three-dimensional shape measuring apparatus using a scanning interferometer, and more particularly, to a technology that can significantly reduce the measurement time by greatly reducing the scan length in the height direction of the object using a multi-wavelength light source. It is about.
평면 디스플레이, 반도체, 미세 정밀 부품 등의 결함을 검출하기 위해, 물체의 표면을 검사하고 3차원 두께 및/또는 형상을 측정할 필요가 있으며, 일반적으로 간섭계 방식이 이용되고 있다. 측정 대상이 되는 물체의 표면에 대한 간섭계 패턴을 생성하고 분석함으로써 물체의 두께 및/또는 입체 형상을 얻는 것이 가능하다. In order to detect defects such as flat panel displays, semiconductors and fine precision parts, it is necessary to inspect the surface of an object and measure three-dimensional thickness and / or shape, and interferometer methods are generally used. It is possible to obtain the thickness and / or solid shape of the object by generating and analyzing the interferometer pattern on the surface of the object to be measured.
이를 위한 방법 중에 하나로 백색광 주사 간섭 측정법(WSI: White light Scanning Interferometry)이 있다. 1990년 이후부터 활발히 연구되고 있는 백색광 주사 간섭 측정법은 위상 천이 간섭법(phase-shiftinginterferometry)의 위상 모호성을 극복하기 위하여 개발되었으며, 수 ㎛의 큰 단차를 가지는 형상에 대해서도 수 nm의 분해능으로 측정할 수 있는 장점을 가진다.One method for this is white light scanning interferometry (WSI). The white light scanning interferometry, which has been actively studied since 1990, was developed to overcome the phase ambiguity of phase-shifting interferometry and can be measured at several nm resolution even for shapes having a large step of several μm. Has the advantage.
도 1은 백색광 주사 간섭계의 일반적인 광학계 구성도로서, 광원(10), 광분리기(20), 기준거울(30), 측정 시료(40) 및 측정부(50)를 포함한다.1 is a general optical system configuration diagram of a white light scanning interferometer, and includes a
광원(10)에서 조사된 백색광은 광분리기(20)에 의해 측정광과 기준광으로 분리되고, 측정면인 측정 시료(40)의 표면과 기준면인 기준 거울(30)의 표면에 각각 조사된다. 각 면에서 반사된 광은 동일한 광경로를 거쳐 간섭 신호를 생성한다.The white light irradiated from the
도 1에서와 같이 측정 시료를 광축 방향(z축 방향)으로 미소 간격씩 이동하면서 한 측정점에서의 간섭 신호를 관찰하면, 그림에서와 같이 측정점과 기준면의 위치 차이가 가간섭 길이 내의 짧은 거리에 있는 경우, 즉 측정점이 기준면과 동일한 광경로차가 발생하는 지점에서만 간섭 신호가 나타난다. 그러므로 측정 영역 내의 모든 측정점에 대한 간섭 신호를 획득하고, 각 간섭 신호의 정점에서의 광축 방향위치를 높이값으로 설정하면, 기준면에 대한 측정면의 3차원 입체 표면 형상을 구현할 수 있다. As shown in FIG. 1, when the measurement sample is observed at an interference signal at one measuring point while moving at a small interval in the optical axis direction (z-axis direction), as shown in the figure, the position difference between the measuring point and the reference plane is a short distance within the interference length. In other words, the interference signal appears only at the point where the measurement path occurs at the same optical path difference as that of the reference plane. Therefore, by acquiring the interference signal for all the measurement points in the measurement area and setting the optical axis direction position at the vertex of each interference signal as the height value, it is possible to realize the three-dimensional solid surface shape of the measurement plane with respect to the reference plane.
물체의 높이 방향 측정을 위한 다른 방법으로는 기준 거울(30)을 좌우로 미소 간격씩 이동하면서 한 측정점에서의 간섭 신호를 관찰하는 방식도 가능하다.Another method for measuring the height direction of an object may be a method of observing an interference signal at one measuring point while moving the
상기 종래 일반적인 백색광 주사 간섭계를 이용한 형상 측정방식은 측정 높이 전체에 걸쳐 높이방향으로 스캐닝을 하여야 하므로 스캐닝 시간이 길어져 검사속도가 지연되고, 측정 시료 또는 기준 거울을 이동시키기 위한 이동길이가 길어지면서 구동계에 대한 비용이 증가되는 문제점이 발생한다. Since the shape measurement method using the conventional white light scanning interferometer has to be scanned in the height direction over the entire measurement height, the scanning time becomes longer, the inspection speed is delayed, and the moving length for moving the measurement sample or the reference mirror becomes longer. A problem arises in that the cost of the service increases.
본 발명은 상기와 같은 종래 기술의 문제점을 해결하기 위해 제안된 것으로서, 서로 다른 파장의 광원을 이용하여 광원별로 높이 측정 영역을 분리함으로써 스캔 시간과 스캔을 위한 이동 길이를 감소시킬 수 있도록 하는 것이다.The present invention is proposed to solve the problems of the prior art as described above, by using a light source of different wavelengths to separate the height measurement area for each light source to reduce the scan time and the moving length for the scan.
상기와 같은 목적을 달성하기 위한 본 발명의 일 측면에 따르면,적어도 2개 이상의 서로 다른 파장대역의 빛을 조사하는 광원, 상기 광원에서 조사된 빛을 분리하는 광 분리기, 상기 광 분리기의 하단에 배치되어 상기 광 분리기에서 반사된 빛이 조사되는 시료, 상기 광분리기에서 투과된 빛의 경로 상에 배치되고, 상기 광의 파장대역 개수에 상응하는 개수의 기준광을 제공하는 기준 거울부, 상기 시료에서 반사된 측정광과 상기 기준 거울부에서 반사된 기준광들을 수신하고, 수신된 이미지를 파장대역별로 분리하는 측정부를 포함하는 것을 특징으로 하는 다파장 광 주사 간섭계를 이용한 3차원 형상 측정장치를 제공한다.According to an aspect of the present invention for achieving the above object, a light source for irradiating light of at least two different wavelength bands, an optical separator for separating the light emitted from the light source, disposed at the bottom of the optical separator A reference mirror unit disposed on the sample irradiated with the light reflected by the optical separator, the path of the light transmitted by the optical separator, and providing a reference light corresponding to the number of wavelength bands of the light; It provides a three-dimensional shape measuring apparatus using a multi-wavelength optical scanning interferometer, characterized in that for receiving the measurement light and the reference light reflected from the reference mirror, and separating the received image for each wavelength band.
그리고, 상기 측정부는 컬러 이미지 센서인 것이 바람직하다.The measurement unit is preferably a color image sensor.
또한, 상기 기준 거울부는 제 1 파장대역 이상의 빛을 반사시키는 제 1 광 필터, 상기 제 1 광 필터에서 반사된 빛이 조사되는 위치에 배치되어 제 1 기준광을 제공하는 제 1 기준 거울, 상기 제 2 광 필터를 통과한 빛이 조사되는 위치에 배치되어 제 2 기준광을 제공하는 제 2 기준 거울을 포함할 수 있다.The reference mirror may include a first optical filter that reflects light of a first wavelength band or more, a first reference mirror disposed at a position to which the light reflected by the first optical filter is irradiated to provide a first reference light, and the second reference mirror. It may include a second reference mirror disposed at a position where the light passing through the light filter is irradiated to provide a second reference light.
아울러, 상기 기준 거울부는 상기 광분리기와 제 1 광 필터 간의 거리를 c, 제 1 광 필터와 제 1 기준 거울 간의 거리를 a, 제 1 광 필터와 제 2 기준 거울 간의 거리를 b, 광분리기와 시료 최상단 간의 거리를 ℓ1, 광분리기와 시료 높이의 중간 지점 간의 거리를 ℓ2라고 할 때, In addition, the reference mirror is a distance between the optical splitter and the first optical filter c, the distance between the first optical filter and the first reference mirror a, the distance between the first optical filter and the second reference mirror b, When the distance between the top of the sample is ℓ 1 and the distance between the optical separator and the middle point of the sample height is ℓ 2 ,
ℓ1 = c + aℓ 1 = c + a
ℓ2 = c + bℓ 2 = c + b
의 관계를 만족하는 위치에 설치되는 것이 바람직하다.It is preferable to be installed in a position that satisfies the relationship.
그리고, 상기 기준 거울부는 제 1 파장대역 이상의 빛을 반사시키는 제 1 광 필터, 상기 제 1 광 필터에서 반사된 빛이 조사되는 위치에 배치되어 제 1 기준광을 제공하는 제 1 기준 거울, 상기 제 1 광 필터를 통과한 빛의 경로 상에 배치되어 상기 제 1 파장대역보다 낮은 제 2 파장대역 이상의 빛을 반사시키는 제 2 광 필터, 상기 제 2 광 필터를 통과한 빛의 경로 상에 배치되어 제 2 기준광을 제공하는 제 2 기준 거울, 상기 제 2 광 필터에서 반사된 빛이 조사되는 위치에 배치되어 제 3 기준광을 제공하는 제 3 기준 거울을 포함할 수 있다.The reference mirror unit may include a first optical filter that reflects light of a first wavelength band or more, a first reference mirror that is disposed at a position to which the light reflected by the first optical filter is irradiated to provide a first reference light, and the first reference mirror A second optical filter disposed on a path of light passing through the optical filter to reflect light above a second wavelength band lower than the first wavelength band, and disposed on a path of light passing through the second optical filter The second reference mirror may provide a reference light, and the third reference mirror may be disposed at a position at which the light reflected by the second light filter is irradiated to provide a third reference light.
또한, 상기 기준 거울부는 상기 광분리기와 제 1 광 필터 간의 거리를 ℓa, 제 1 광 필터와 제 1 기준 거울 간의 거리를 ℓR, 제 1 광 필터와 제 2 광 필터 간의 거리를 ℓb, 제 2 광 필터와 제 2 기준 거울 간의 거리를 ℓB, 제 2 광 필터와 제 3 기준 거울 간의 거리를 ℓG, 광분리기와 시료 최상단 간의 거리를 ℓ1, 광분리기와 시료 높이의 2/3 지점 간의 거리를 ℓ2, 광분리기와 시료 높이의 1/3 지점 간의 거리를 ℓ3라고 할 때, In addition, the reference mirror is a distance between the optical splitter and the first optical filter l a , the distance between the first optical filter and the first reference mirror l R , the distance between the first optical filter and the second optical filter l b , ℓ B the distance between the second optical filter and the second reference mirror, ℓ G the distance between the second light filter and the third reference mirror, ℓ 1 , the distance between the optical splitter and the top of the sample ℓ 1 , 2/3 of the optical separator and the sample height. When the distance between the points ℓ 2 and the distance between the optical splitter and the third point of the sample height ℓ 3 ,
ℓ1 = ℓa + ℓb + ℓB ℓ 1 = ℓ a + ℓ b + ℓ B
ℓ2 = ℓa + ℓb + ℓG ℓ 2 = ℓ a + ℓ b + ℓ G
ℓ3 = ℓa + ℓR ℓ 3 = ℓ a + ℓ R
의 관계를 만족하는 위치에 설치되는 것이 바람직하다.It is preferable to be installed in a position that satisfies the relationship.
본 발명에 따르면, 스캔 시간이 현저하게 감소됨에 따라 검사시간이 단축되고 그에 따라 수율이 현저하게 향상되는 효과가 있다.According to the present invention, as the scan time is significantly reduced, the inspection time is shortened and thus the yield is remarkably improved.
또한 스캔을 위한 시료 또는 기준 거울의 이동거리가 감소됨에 따라 구동계 제작 비용이 감소되어 제조원가를 낮출 수 있는 효과도 있다.In addition, as the moving distance of the sample or the reference mirror for scanning is reduced, the manufacturing cost of the drive system is reduced, thereby reducing the manufacturing cost.
도 1은 종래 일반적인 백색광 주사 간섭계의 광학계 구조를 나타낸 것이다.1 illustrates an optical system structure of a conventional white light scanning interferometer.
도 2는 본 발명의 제 1 실시예에 따른 다중 파장을 이용한 백색광 주사 간섭계의 광학계구조를 나타낸 것이다.2 shows an optical system structure of a white light scanning interferometer using multiple wavelengths according to the first embodiment of the present invention.
도 3은 2개의 다른 파장을 갖는 광원을 이용하여 시료의 높이를 측정하는 방법을 개념적으로 설명하기 위한 도면이다.3 is a view for conceptually explaining a method of measuring the height of a sample using light sources having two different wavelengths.
도 4는 본 발명의 제 2 실시예에 따른 다중 파장을 이용한 백색광 주사 간섭계의 광학계구조를 나타낸 것이다.4 shows an optical system structure of a white light scanning interferometer using multiple wavelengths according to a second embodiment of the present invention.
이하에서는 도면을 참조하여 본 발명의 바람직한 일 실시예를 상세하게 설명하기로 한다.Hereinafter, with reference to the drawings will be described in detail a preferred embodiment of the present invention.
도 2는 본 발명에 따른 다파장 광 주사 간섭계의 광학계구조를 나타낸 것으로서, 광원(100), 광분리기(200), 기준 거울부(300), 시료(400) 및 측정부(500)를 포함하여 구성된다. 도 2에서 측정부(500)에서 측정된 결과를 이용하여 물체를 높이를 측정하는 PC와 물체 또는 기준 거울을 이동하기 위한 구동계는 설명을 간단을 위하여 생략되었다.2 shows an optical system structure of a multi-wavelength optical scanning interferometer according to the present invention, including a
광원(100)은 2개의 서로 다른 파장 즉, 서로 다른 색상의 제 1 광과 제 2 광을 조사하는 것으로서, 도 2에는 제 1 광과 제 2 광이 적색광과 청색광으로서, 2개의 광을 발생하는 적색 LED와 청색 LED를 예시적으로 설명하고 있다. The
광분리기(200)는 조사된 광을 기준광과 측정광으로 분리하고, 분리되었던 기준광 및 측정광이 반사되어 되돌아오면 이를 간섭시켜 간섭광을 만드는 역할을 수행하는 것으로서 종래의 광분리기(200)의 기능과 동일한 부재이다.The
기준 거울부(300)는 기준광을 제공하기 위한 것으로서, 광 필터(310)와, 제 1 기준 거울(320) 및 제 2 기준 거울(330)을 포함하여 구성된다.The
광 필터(310)는 광분리기(200)에서 투과한 투과광의 경로상에 위치하여 특정 파장대역의 광만을 투과시키는 부재로서 도 2의 실시예에서는 적색광보다 짧은 파장대역의 빛은 투과시키고 적색광대역부터의 빛은 반사시키는 특성을 갖는 필터 부재가 사용될 수 있다. 따라서, 광원(100)에서 조사된 적색광과 청색광 중 적색광은 광 필터(310)에서 반사되어 상부의 제1 기준 거울(320)로 조사되고, 청색광은 광 필터(310)를 통과하여 후단의 제 2 기준거울(330)에 조사된다.The
제 1 기준 거울(320)은 광 필터(310)에서 반사된 빛이 조사되는 위치에 설치되어 제 1 광에 대한 기준광을 제공한다. 여기서, 본 실시예에서 제 1 광은 적색광이다. 제 1 기준 거울(320)이 설치되는 위치는 광분리기(200)와 광 필터(310) 간의 거리(c)와 광 필터(310)와 제 1 기준 거울(320) 간의 거리(a)의 합이 광분리기(200)와 시료 최상단 간의 거리(ℓ1)가 되도록 하는 지점일 수 있다. The
제 2 기준 거울(330)은 광 필터(310)를 투과한 빛이 조사되는 위치에 설치되어 제 2 광에 대한 기준광을 제공한다. 도 2의 실시예에서, 제 2 광은 청색광이다. 제 2 기준 거울(330)이 설치되는 위치는 광분리기(200)와 광 필터(310) 간의 거리(c)와 광 필터(310)와 제 2 기준 거울(330) 간의 거리(b)의 합이 광분리기(200)와 시료 높이의 중간 지점 간의 거리(ℓ2)가 되도록 하는 지점일 수 있다. The
상기에서 도면을 참조하여 기준광 생성을 위한 제 1 및 제 2 기준거울(320, 330)의 설치위치를 정리하면 다음과 같다.Referring to the drawings, the installation positions of the first and
ℓ1 = c + aℓ 1 = c + a
ℓ2 = c + bℓ 2 = c + b
측정부(500)는 시료(400)에서 반사된 측정광과 기준 거울부(300)에서 반사된 제 1 및 제 2 기준광을 수신하기 위한 것으로서, 적색광과 청색광을 모두 촬상할 수 있는 컬러 이미지 센서가 사용된다.The
측정부(500)는 촬상한 이미지를 제 1 광원(적색광)에 대한 이미지와 제 2 광원(청색광)에 대한 이미지로 분리하여 PC로 제공하고, PC는 제 1 광원에 대한 측정광과 기준광에 의해 생성된 간섭 이미지와, 제 2 광원에 대한 측정광과 기준광에 의해 생성된 간섭 이미지를 분석하여 물체의 높이를 계산한다.The
이때, 제 1 광원에 대한 간섭 이미지는 시료의 중간 지점에서 최상단까지의 높이를 측정하기 위해 사용되고, 제 2 광원에 대한 간섭 이미지는 시료의 하단에서 중간 지점까지의 높이를 측정하기 위해 사용된다. At this time, the interference image for the first light source is used to measure the height from the middle point to the top of the sample, and the interference image for the second light source is used to measure the height from the bottom to the middle point of the sample.
따라서, 본 발명에 따르면 물체 높이의 절반에 해당하는 만큼만 물체를 이동시키면 물체의 2개의 광원에 의해 상단부와 하단부가 개별적으로 스캔이 이루어지므로 스캔 시간이 절반으로 단축되는 효과가 발생하게 되는 것이다. Therefore, according to the present invention, if the object is moved only as much as half of the height of the object, the upper and lower portions are separately scanned by the two light sources of the object, thereby reducing the scanning time by half.
도 3은 본 발명의 제 1 실시예에 따른 물체 높이 측정방법을 개념적으로 설명하기 위한 도면이다. 3 is a view for conceptually explaining the object height measuring method according to a first embodiment of the present invention.
도 3과 같이, 시료의 높이 또는 스캔 높이에 대하여 상단의 절반 높이는 제 1 광원의 스캔 영역, 하단의 절반 높이는 제 2 광원의 스캔 영역으로 취급된다. 따라서, 높이 측정을 위해 시료를 상방으로 이동시키는 동안 상단의 절반 높이는 제 1 광원에 의해, 하단의 절반 높이는 제 2 광원에 의해 높이가 측정된다.As shown in FIG. 3, the half height at the top of the sample is treated as the scan area of the first light source, and the half height at the bottom thereof is the scan area of the second light source. Therefore, the height of the top half is measured by the first light source, and the bottom half height is measured by the second light source while the sample is moved upward for height measurement.
예를 들어, 하단 영역에 있는 제 1 지점의 높이(h1)는 시료를 Δh1만큼 이동시키는 경우 제 2 광원의 측정광과 기준광의 경로차가 동일하게 되어 간섭 신호가 나타나게 되므로 해당 지점의 광축 방향위치를 높이값으로 설정하게 된다.For example, if the height h 1 of the first point in the lower region moves the sample by Δh 1, the path difference between the measurement light of the second light source and the reference light is the same, so that an interference signal appears. Set the position to the height value.
또한, 상단 영역에 있는 제 2 지점의 높이((h2)는 시료를 Δh2만큼 이동시키는 경우 제 1 광원의 측정광과 기준광의 경로차가 동일하게 되어 간섭 신호가 나타나게 되므로 해당 지점의 광축 방향위치를 높이값으로 설정하게 된다.In addition, the height (h 2 ) of the second point in the upper region is equal to the path difference between the measurement light of the first light source and the reference light when the sample is moved by Δh 2, so that an interference signal appears. Will be set to the height value.
도 4는 본 발명의 제 2 실시예에 따른 다파장 광 주사 간섭계의 광학계구조를 나타낸 것으로서, 제 1 실시예와 동일하게, 광원(100), 광분리기(200), 기준 거울부(300), 시료(400) 및 측정부(500)를 포함하여 구성되고, 측정부(500)에서 측정된 결과를 이용하여 물체를 높이를 측정하는 PC와 물체 또는 기준 거울을 이동하기 위한 구동계는 설명을 간단을 위하여 생략되었다.4 shows an optical system structure of a multi-wavelength optical scanning interferometer according to a second embodiment of the present invention. Similar to the first embodiment, the
광원(100)은 3개의 서로 다른 파장 즉, 서로 다른 색상의 제 1 광 내지 제 3 광을 조사하는 것으로서, 도 4에는 제 1 광 내지 제 3 광이 적색광, 녹색광 및 청색광으로서, 3개의 광을 발생하는 적색 LED, 녹색 LED, 청색 LED를 예시적으로 설명하고 있다. The
기준 거울부(300)는 기준광을 제공하기 위한 것으로서, 제 1 광 필터(310)와, 제 1 기준 거울(320), 제 2 광 필터(340), 제 2 기준 거울(330) 및 제 3 기준거울(350)을 포함하여 구성된다.The
제 1 광 필터(310)는 제 1 실시예와 동일한 부재로서 적색광 이상 대역의 빛을 반사시키는 필터 부재이다. 따라서, 광원(100)에서 조사된 빛 중 적색광은 광 필터(310)에서 반사되어 상부의 제1 기준 거울(320)로 조사되고, 청색광과 녹색광은 광 필터(310)를 통과하여 후단의 제 2 광 필터(340)에 조사된다.The first
제 1 기준 거울(320)은 광 필터(310)에서 반사된 빛이 조사되는 위치에 설치되어 제 1 광에 대한 기준광을 제공한다. 여기서, 본 실시예에서 제 1 광은 적색광이다. 제 1 기준 거울(320)이 설치되는 위치는 광분리기(200)와 광 필터(310) 간의 거리(ℓa)와 광 필터(310)와 제 1 기준 거울(320) 간의 거리(ℓR)의 합이 광분리기(200)와 시료 높이의 1/3 부근 지점 간의 거리(ℓ3)가 되도록 하는 지점일 수 있다. The
제 2 광 필터(340)는 제 1 광 필터(310)에서 투과한 투과광의 경로상에 위치하여 특정 파장대역의 광만을 투과시키는 부재로서 제 2 실시예에서는 녹색광보다 짧은 파장대역의 빛은 투과시키고 녹색광대역 이상의 빛은 반사시키는 특성을 갖는 필터 부재가 사용될 수 있다. 따라서, 제 1 광 필터(310)를 통과한 빛 중에서 녹색광은 제 2 광 필터(340)에서 반사되어 상부의 제3 기준 거울(350)로 조사되고, 청색광은 제 2 광 필터(340)를 통과하여 후단의 제 2 기준거울(330)에 조사된다.The second
제 2 기준 거울(330)은 제 2 광 필터(310)를 투과한 빛이 조사되는 위치에 설치되어 제 2 광에 대한 기준광을 제공한다. 제 2 실시예에서, 제 2 광은 청색광이다. 제 2 기준 거울(330)이 설치되는 위치는 광분리기(200)와 제 1 광 필터(310) 간의 거리(ℓa), 제 1 광 필터(310)와 제 2 광 필터(340) 간의 거리(ℓb)와 제 2 광 필터(340)와 제 2 기준 거울(330) 간의 거리(ℓB)의 합이 광분리기(200)와 시료의 최상단 부근 지점간의 거리(ℓ2)가 되도록 하는 지점일 수 있다. The
제 3 기준 거울(350)은 제 2 광 필터(320)에서 반사된 빛이 조사되는 위치에 설치되어 제 3 광에 대한 기준광을 제공한다. 제 2 실시예에서, 제 3 광은 녹색광이다. 제 3 기준 거울(350)이 설치되는 위치는 광분리기(200)와 제 1 광 필터(310) 간의 거리(ℓa), 제 1 광 필터(310)와 제 2 광 필터(340) 간의 거리(ℓb)와 제 2 광 필터(340)와 제 3 기준 거울(330) 간의 거리(ℓG)의 합이 광분리기(200)와 시료 높이의 2/3 부근 지점 간의 거리(ℓ2)가 되도록 하는 지점일 수 있다. The
상기에서 도면을 참조하여 기준광 생성을 위한 제 1 내지 제 3 기준거울(320, 330, 350)의 설치위치를 정리하면 다음과 같다.Referring to the drawings, the installation positions of the first to third reference mirrors 320, 330, and 350 for generating the reference light are summarized as follows.
ℓ1 = ℓa + ℓb + ℓB ℓ 1 = ℓ a + ℓ b + ℓ B
ℓ2 = ℓa + ℓb + ℓG ℓ 2 = ℓ a + ℓ b + ℓ G
ℓ3 = ℓa + ℓR ℓ 3 = ℓ a + ℓ R
측정부(500)는 시료(400)에서 반사된 측정광과 기준 거울부(300)에서 반사된 제 1 내지 제 3 기준광을 수신하기 위한 것으로서, 적색광, 녹색광 및 청색광을 모두 촬상할 수 있는 컬러 이미지 센서가 사용된다.The
측정부(500)는 촬상한 이미지를 제 1 광원(적색광)에 대한 이미지와 제 2 광원(청색광) 및 제 3 광(녹색광)에 대한 이미지로 분리하여 PC로 제공하고, PC는 제 1 광원에 대한 측정광과 기준광에 의해 생성된 간섭 이미지와, 제 2 광원에 대한 측정광과 기준광에 의해 생성된 간섭 이미지 및 제 3 광원에 대한 측정광과 기준광에 의해 생성된 간섭 이미지를 분석하여 물체의 높이를 계산한다.The measuring
이때, 제 1 광원에 대한 간섭 이미지는 시료의 바닥 지점에서 시료의 1/3 지점 부근까지의 높이를 측정하기 위해 사용되고, 제 3 광원에 대한 간섭 이미지는 시료의 1/3 지점에서 2/3 지점까지의 높이를 측정하기 위해 사용되고, 제 2 광원에 대한 간섭 이미지는 시료의 2/3 높이 지점부터 시료의 최상단 지점까지의 높이를 측정하기 위해 사용된다. At this time, the interference image for the first light source is used to measure the height from the bottom point of the sample to about one third of the sample, and the interference image for the third light source is two thirds to one third of the sample. An interference image for the second light source is used to measure the height from the 2/3 height point of the sample to the top point of the sample.
따라서, 본 발명의 제 2 실시예에 따르면 물체 높이의 1/3에 해당하는 만큼만 물체를 이동시키면 3개의 광원에 의해 물체의 상단부, 중간부 및 하단부가 개별적으로 스캔이 이루어지므로 스캔 시간이 1/3배로 단축되는 효과가 발생하게 되는 것이다. Therefore, according to the second embodiment of the present invention, if the object is moved by only one third of the object height, the scan time is 1/3 because the upper part, the middle part and the lower part of the object are separately scanned by three light sources. The effect is reduced by three times.
비록 본 발명이 상기 바람직한 실시예들과 관련하여 설명되어졌지만, 발명의 요지와 범위로부터 벗어남이 없이 다양한 수정이나 변형을 하는 것이 가능하다. 따라서, 첨부된 특허 청구범위는 본 발명의 요지에 속하는 이러한 수정이나 변형을 포함할 것이다.Although the present invention has been described in connection with the above preferred embodiments, it is possible to make various modifications or variations without departing from the spirit and scope of the invention. Accordingly, the appended claims will cover such modifications and variations as fall within the spirit of the invention.
Claims (6)
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| Application Number | Priority Date | Filing Date | Title |
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| KR1020160062277A KR101804527B1 (en) | 2016-05-20 | 2016-05-20 | 3-Dimensional Shape Measuring Apparatus Using Multi Wavelength Lights Scanning Interferometry |
| KR10-2016-0062277 | 2016-05-20 |
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| WO2017200226A1 true WO2017200226A1 (en) | 2017-11-23 |
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| KR102100229B1 (en) * | 2018-12-06 | 2020-04-13 | 제주대학교 산학협력단 | Device for photographing sequential images of ultra-fast moving object |
| WO2021137344A1 (en) * | 2020-01-03 | 2021-07-08 | 제주대학교 산학협력단 | Ultra-high-speed image sequence photographing device |
| CN113587844B (en) * | 2021-07-27 | 2022-05-27 | 中国科学院长春光学精密机械与物理研究所 | Phase-shifting interferometric measurement system and measurement method |
| KR102786319B1 (en) | 2022-09-30 | 2025-03-27 | 인천대학교 산학협력단 | Device and method for measuring the internal structure of a sample using an infrared vertical scanning interferometer |
| KR102741580B1 (en) | 2022-11-09 | 2024-12-12 | 부산대학교 산학협력단 | Optical interferometer measuring device that improves the measuring distance by using a multiple-generation optical delay reference stage |
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| KR20080071905A (en) * | 2007-01-31 | 2008-08-05 | 고쿠리츠다이가쿠호진 토쿄고교 다이가꾸 | Method of measuring surface shape by multiple wavelengths and device using same |
| KR20080090225A (en) * | 2007-04-04 | 2008-10-08 | 주식회사 스펙시스 | Apparatus and method for measuring surface shape using polarization split interferometer. |
| KR20120014355A (en) * | 2010-08-09 | 2012-02-17 | (주)펨트론 | 3D measurement device using dual wavelength digital holography |
| KR20120036727A (en) * | 2010-10-08 | 2012-04-18 | 한국전자통신연구원 | Optical coherence tomography apparatus for enhanced axial contrast and reference mirror having multiple plane for the same |
| KR20130039005A (en) * | 2011-10-11 | 2013-04-19 | (주)미래컴퍼니 | Three dimensional depth and shape measuring device |
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2016
- 2016-05-20 KR KR1020160062277A patent/KR101804527B1/en active Active
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- 2017-04-28 WO PCT/KR2017/004578 patent/WO2017200226A1/en not_active Ceased
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| Publication number | Priority date | Publication date | Assignee | Title |
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| KR20080071905A (en) * | 2007-01-31 | 2008-08-05 | 고쿠리츠다이가쿠호진 토쿄고교 다이가꾸 | Method of measuring surface shape by multiple wavelengths and device using same |
| KR20080090225A (en) * | 2007-04-04 | 2008-10-08 | 주식회사 스펙시스 | Apparatus and method for measuring surface shape using polarization split interferometer. |
| KR20120014355A (en) * | 2010-08-09 | 2012-02-17 | (주)펨트론 | 3D measurement device using dual wavelength digital holography |
| KR20120036727A (en) * | 2010-10-08 | 2012-04-18 | 한국전자통신연구원 | Optical coherence tomography apparatus for enhanced axial contrast and reference mirror having multiple plane for the same |
| KR20130039005A (en) * | 2011-10-11 | 2013-04-19 | (주)미래컴퍼니 | Three dimensional depth and shape measuring device |
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| KR101804527B1 (en) | 2017-12-05 |
| TWI639808B (en) | 2018-11-01 |
| KR20170131084A (en) | 2017-11-29 |
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