WO2017138491A1 - Curable resin composition for reflecting light, cured product thereof, and optical semiconductor device - Google Patents
Curable resin composition for reflecting light, cured product thereof, and optical semiconductor device Download PDFInfo
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- WO2017138491A1 WO2017138491A1 PCT/JP2017/004216 JP2017004216W WO2017138491A1 WO 2017138491 A1 WO2017138491 A1 WO 2017138491A1 JP 2017004216 W JP2017004216 W JP 2017004216W WO 2017138491 A1 WO2017138491 A1 WO 2017138491A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4246—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof polymers with carboxylic terminal groups
- C08G59/4253—Rubbers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/5046—Amines heterocyclic
- C08G59/5053—Amines heterocyclic containing only nitrogen as a heteroatom
- C08G59/508—Amines heterocyclic containing only nitrogen as a heteroatom having three nitrogen atoms in the ring
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/28—Nitrogen-containing compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/30—Sulfur-, selenium- or tellurium-containing compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0041—Optical brightening agents, organic pigments
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L21/00—Compositions of unspecified rubbers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/855—Optical field-shaping means, e.g. lenses
- H10H20/856—Reflecting means
Definitions
- the present invention relates to a light-reflective curable resin composition and a cured product thereof, and an optical semiconductor device having a reflector formed of the cured product and an optical semiconductor element.
- optical semiconductor devices in various indoor or outdoor display boards, image reading light sources, traffic signals, large display units, etc., light emitting devices (optical semiconductor devices) using optical semiconductor elements (LED elements) as light sources have been increasingly adopted.
- an optical semiconductor device in general, an optical semiconductor device in which an optical semiconductor element is mounted on a substrate (substrate for mounting an optical semiconductor element) and the optical semiconductor element is sealed with a transparent sealing material is widespread. is doing.
- a member (reflector) for reflecting light is formed in order to improve the extraction efficiency of light emitted from the optical semiconductor element.
- the reflector is required to have high light reflectivity.
- a resin composition in which an inorganic filler or the like is dispersed in a polyamide resin (polyphthalamide resin) having a terephthalic acid unit as an essential constituent unit is known. (See Patent Documents 1 to 3).
- thermosetting resin for light reflection containing a specific ratio of a thermosetting resin containing an epoxy resin and an inorganic oxide having a refractive index of 1.6 to 3.0, for example.
- Resin compositions are known (see Patent Document 4).
- it contains a thermosetting resin component and one or more filler components, the difference between the refractive index of the entire thermosetting resin component and the refractive index of each filler component, and the volume of each filler component
- thermosetting resin composition for light reflection in which a parameter calculated from a ratio is controlled within a specific range (see Patent Document 5).
- Reflectors made from the materials described in Patent Documents 1 to 5 described above are yellowed over time due to light and heat emitted from a semiconductor element in an optical semiconductor device using a high-power blue light semiconductor or white light semiconductor as a light source. Etc., and the light reflectivity decreases with time. Furthermore, with the adoption of lead-free solder, the heating temperature in the reflow process (solder reflow process) during the manufacture of the light-emitting device tends to be higher, and the reflector is also deteriorated over time due to the heat applied in such a manufacturing process. There was also a problem that the light reflectivity was deteriorated due to deterioration.
- the present situation is that a material excellent in heat resistance and light resistance in which light reflectivity is less likely to deteriorate with time even for higher output, shorter wavelength light and high temperature is required.
- the reflector is generally manufactured by subjecting a material (resin composition) for forming the reflector to transfer molding or compression molding.
- a material for forming the reflector to transfer molding or compression molding.
- resin composition resin composition
- a reflector formed from the resin composition is excellent in heat resistance, but a reflector formed by compression molding has heat resistance. Many were relatively inferior.
- an object of the present invention is to form a cured product having high light reflectivity, excellent heat resistance and light resistance, and light reflectivity is less likely to deteriorate with time, and in particular, a cured product is formed by compression molding. It is in providing the curable resin composition for light reflections which the said effect is exhibited notably at the time.
- Another object of the present invention is to provide a cured product having excellent productivity, high light reflectivity, excellent heat resistance and light resistance, and the light reflectivity is less likely to deteriorate with time. .
- another object of the present invention is to provide a highly reliable optical semiconductor device in which the luminance of light is less likely to decrease over time.
- the above reflector is less susceptible to cracking when subjected to stress due to cutting or temperature change (for example, heating at a very high temperature such as a reflow process or a cooling cycle). Such a characteristic is sometimes referred to as “crack resistance”). This is because if the reflector is cracked, the light reflectivity is lowered (that is, the light extraction efficiency is lowered), and it is difficult to ensure the reliability of the light emitting device.
- the present inventors have found that the alicyclic epoxy compound (A), the rubber particles (B), the white pigment (C), the inorganic filler (D), and the curing agent (E). , A curing accelerator (F), an isocyanuric acid derivative (H) having one or more oxirane rings in the molecule, and a siloxane derivative (I) having two or more epoxy groups in the molecule, which are liquid at 25 ° C.
- a light-reflective curable resin composition containing an isocyanuric acid derivative (H) having one or more oxirane rings and a siloxane derivative (I) having two or more epoxy groups in the molecule and being liquid at 25 ° C. is high. Light reflective and heat resistant And excellent light resistance, light reflectivity can be formed a cured product hardly decreases with time, the effect was found to be remarkably exhibited particularly when forming a cured product compression molding. The present invention has been completed based on these findings.
- the present invention relates to an alicyclic epoxy compound (A), rubber particles (B), a white pigment (C), an inorganic filler (D), an isocyanuric acid derivative (H) having one or more oxirane rings in the molecule. ) And a siloxane derivative (I) having two or more epoxy groups in the molecule, and further contains a curing agent (E) and a curing accelerator (F) or a curing catalyst (G), 25
- a light-reflective curable resin composition characterized by being liquid at a temperature of 0 ° C.
- the rubber particle (B) is composed of a polymer containing (meth) acrylic acid ester as an essential monomer component, and has a hydroxy group and / or a carboxy group on the surface, and the rubber particle (B Is provided with a mean particle size of 10 to 500 nm and a maximum particle size of 50 to 1000 nm.
- the alicyclic epoxy compound (A) is represented by the following formula (I-1):
- the curable resin composition for light reflection containing the compound represented by these is provided.
- the isocyanuric acid derivative (H) is represented by the following formula (III-1): [In Formula (III-1), R 7 and R 8 are the same or different and each represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. ]
- the curable resin composition for light reflection which is a compound represented by these is provided.
- the white pigment (C) is at least one selected from the group consisting of titanium oxide, zirconium oxide, zinc oxide, and barium sulfate
- the inorganic filler (D) is silica
- a curable resin composition for light reflection which is at least one selected from the group consisting of alumina, silicon nitride, aluminum nitride, and boron nitride.
- the present invention provides the curable resin composition for light reflection, which is a resin composition for transfer molding or compression molding.
- this invention provides the said curable resin composition for light reflections which is a resin composition for reflector formation.
- the present invention also provides a cured product of the light reflecting curable resin composition.
- the present invention also provides an optical semiconductor device comprising at least an optical semiconductor element and a reflector made of the cured product.
- the present invention relates to the following.
- a curable resin composition for light reflection characterized by: [2] The light reflection according to [1], wherein the rubber particle (B) is a rubber particle having a multilayer structure including a core portion having rubber elasticity and at least one shell layer covering the core portion.
- Curable resin composition [3] The curable resin composition for light reflection according to [1] or [2], wherein the rubber particles (B) are composed of a polymer having (meth) acrylic acid ester as an essential monomer component. [4] The polymer constituting the rubber-elastic core portion of the rubber particle (B) is selected from the group consisting of aromatic vinyl, nitrile, and conjugated diene together with (meth) acrylic acid ester as a monomer component.
- the curable resin composition for light reflection according to any one of [2] or [3], which includes one or a combination of two or more.
- the polymer constituting the shell layer of the rubber particles (B) is one or two selected from the group consisting of a hydroxy group-containing monomer and a carboxy group-containing monomer together with a (meth) acrylic acid ester as a monomer component
- the siloxane derivative (I) is a cyclic siloxane having two or more epoxy groups in the molecule and / or a linear silicone having two or more epoxy groups in the molecule.
- the white pigment (C) according to any one of [1] to [12], wherein the white pigment (C) is at least one selected from the group consisting of titanium oxide, zirconium oxide, zinc oxide, and barium sulfate. Curable resin composition for light reflection.
- the inorganic filler (D) is at least one selected from the group consisting of silica, alumina, silicon nitride, aluminum nitride, and boron nitride. The curable resin composition for light reflection as described.
- the content (blending amount) of the alicyclic epoxy compound (A) is 0.1 to 60% by weight, 0.3 to 50% by weight with respect to the curable resin composition (100% by weight). Or the curable resin composition for light reflection according to any one of [1] to [15], which is 0.5 to 40% by weight.
- the content (blending amount) of the rubber particles (B) is 0.01 to 20% by weight, 0.05 to 15% by weight, or 0 with respect to the curable resin composition (100% by weight).
- the content (blending amount) of the white pigment (C) is 0.1 to 50% by weight, 1 to 40% by weight, or 5 to 35 with respect to the curable resin composition (100% by weight).
- the content (blending amount) of the inorganic filler (D) is 10 to 90% by weight, 13 to 75% by weight, 15 to 70% by weight with respect to the curable resin composition (100% by weight).
- the curable resin composition for light reflection according to any one of [1] to [18] which is 20 to 70% by weight.
- the content (blending amount) of the curing agent (E) is 1 to 40% by weight, 3 to 35% by weight, or 5 to 30% by weight with respect to the curable resin composition (100% by weight).
- the curable resin composition for light reflection according to any one of [1] to [19].
- the content (blending amount) of the curing accelerator (F) is 0.0001 to 5% by weight, or 0.001 to 1% by weight with respect to the curable resin composition (100% by weight).
- the light-reflective curable resin composition according to any one of [1] to [20].
- the content (blending amount) of the curing catalyst (G) is 0.0001 to 5% by weight or 0.001 to 1% by weight with respect to the curable resin composition (100% by weight).
- the content (blending amount) of the isocyanuric acid derivative (H) is 0.05 to 15% by weight, 0.1 to 10% by weight with respect to the curable resin composition (100% by weight), or The curable resin composition for light reflection according to any one of [1] to [22], which is 0.3 to 5% by weight.
- the content (blending amount) of the siloxane derivative (I) is 0.1 to 30% by weight, 0.5 to 20% by weight, or 1 with respect to the curable resin composition (100% by weight).
- An optical semiconductor device comprising at least an optical semiconductor element and a reflector made of a cured product of the curable resin composition for light reflection described in [27].
- the curable resin composition of the present invention has the above-described configuration, it can form a cured product having high light reflectivity, excellent heat resistance and light resistance, and light reflectivity hardly decreasing over time. Especially, when the cured product is formed by compression molding, the above-mentioned effect is remarkably exhibited. Therefore, it is possible to provide a highly reliable optical semiconductor device in which the luminance of light hardly decreases over time.
- the left figure (a) is a perspective view, and the right figure (b) is a sectional view.
- It is the schematic (sectional drawing) which shows an example of the optical semiconductor device of this invention.
- It is the schematic (sectional drawing; when it has a heat sink) which shows another example of the optical semiconductor device of this invention.
- the left figure (a) is a top view, and the right figure (b) is a cross-sectional view along AA 'in (a).
- the light-reflective curable resin composition of the present invention (sometimes simply referred to as “the curable resin composition of the present invention”) includes an alicyclic epoxy compound (A), rubber particles (B), a white pigment (C ), An inorganic filler (D), an isocyanuric acid derivative (H) having one or more oxirane rings in the molecule, and a siloxane derivative (I) having two or more epoxy groups in the molecule, and a curing agent A curable resin composition containing (E) and a curing accelerator (F) or a curing catalyst (G) and being liquid at 25 ° C.
- the isocyanuric acid derivative (H) having one or more oxirane rings in the molecule may be referred to as “isocyanuric acid derivative (H)”.
- siloxane derivative (I) having two or more epoxy groups in the molecule may be referred to as “siloxane derivative (I)”.
- the curable resin composition of the present invention comprises an alicyclic epoxy compound (A), rubber particles (B), a white pigment (C), an inorganic filler (D), a curing agent (E), and a curing accelerator.
- (F) isocyanuric acid derivative (H), and siloxane derivative (I) as essential components, a light-reflective curable resin composition that is liquid at 25 ° C.
- the curable resin composition of this invention may contain the other component as needed other than the said essential component.
- the curable resin composition of this invention can be used as a thermosetting composition (thermosetting epoxy resin composition) which can form hardening by heating.
- the “curable resin composition for light reflection” refers to a curable resin composition capable of forming a cured product having light reflectivity. Specifically, for example, it refers to a curable resin composition capable of forming a cured product having a reflectance of 50% or more (preferably 80% or more, more preferably 90% or more) with respect to light having a wavelength of 450 nm.
- liquid at 25 ° C.” means that the viscosity measured at 25 ° C. at normal pressure is 1000000 mPa ⁇ s or less (preferably 800000 mPa ⁇ s or less).
- the above viscosity is measured using, for example, a digital viscometer (model number “DVU-EII type”, manufactured by Tokimec Co., Ltd.), rotor: standard 1 ° 34 ′ ⁇ R24, temperature: 25 ° C., rotational speed: 0.00. It can be measured at 5 to 10 rpm.
- the curable resin composition of the present invention which is liquid at 25 ° C. includes, for example, components (for example, alicyclic epoxy compound (A), curing agent (E), curing accelerator (F), curing catalyst (G) and the like. ), It is easy to obtain by using a liquid component at 25 ° C.
- a solid component may be used as a said component at 25 degreeC, the content is adjusted so that the curable resin composition of this invention may become a liquid state at 25 degreeC. It can also be obtained by adjusting the content of components that are solid at 25 ° C., such as rubber particles (B), white pigment (C), and inorganic filler (D), within a range that does not impair the effects of the present invention. It becomes easy.
- the alicyclic epoxy compound (alicyclic epoxy resin) (A) which is an essential component of the curable resin composition of the present invention, has an alicyclic (aliphatic hydrocarbon ring) structure and epoxy in the molecule (in one molecule). It is a compound which has a group (oxiranyl group) at least, and a publicly known thru / or usual alicyclic epoxy compound can be used. However, those corresponding to the isocyanuric acid derivative (H) and the siloxane derivative (I) are excluded from the alicyclic epoxy compound (A).
- alicyclic epoxy compound (A) for example, (i) an epoxy group (alicyclic epoxy group) composed of two adjacent carbon atoms and oxygen atoms constituting the alicyclic ring And (ii) a compound having an epoxy group directly bonded to the alicyclic ring with a single bond.
- the alicyclic epoxy group is preferably a cyclohexene oxide group from the viewpoints of curability of the curable resin composition and heat resistance and light resistance of the cured product (reflector).
- a compound having two or more cyclohexene oxide groups in the molecule is preferable, and a compound represented by the following formula (I) is more preferable.
- X represents a single bond or a linking group (a divalent group having one or more atoms).
- the linking group include a divalent hydrocarbon group, an alkenylene group in which part or all of a carbon-carbon double bond is epoxidized (sometimes referred to as an “epoxidized alkenylene group”), a carbonyl group, Examples include an ether bond, an ester bond, a carbonate group, an amide group, and a group in which a plurality of these are linked.
- a substituent such as an alkyl group may be bonded to one or more carbon atoms constituting the cyclohexane ring (cyclohexene oxide group) in the formula (I).
- Examples of the compound in which X in the formula (I) is a single bond include 3,4,3 ′, 4′-diepoxybicyclohexane and the like.
- Examples of the divalent hydrocarbon group include a linear or branched alkylene group having 1 to 18 carbon atoms, a divalent alicyclic hydrocarbon group, and the like.
- Examples of the linear or branched alkylene group having 1 to 18 carbon atoms include a methylene group, a methylmethylene group, a dimethylmethylene group, an ethylene group, a propylene group, and a trimethylene group.
- divalent alicyclic hydrocarbon group examples include 1,2-cyclopentylene group, 1,3-cyclopentylene group, cyclopentylidene group, 1,2-cyclohexylene group, 1,3-cyclopentylene group, And cycloalkylene groups (including cycloalkylidene groups) such as cyclohexylene group, 1,4-cyclohexylene group, and cyclohexylidene group.
- alkenylene group in the alkenylene group in which part or all of the carbon-carbon double bond is epoxidized examples include, for example, vinylene group, propenylene group, 1-butenylene group, 2-butenylene group, butadienylene.
- linear or branched alkenylene groups having 2 to 8 carbon atoms such as a group, a pentenylene group, a hexenylene group, a heptenylene group, and an octenylene group.
- the epoxidized alkenylene group is preferably an alkenylene group in which all of the carbon-carbon double bonds are epoxidized, more preferably 2 to 4 carbon atoms in which all of the carbon-carbon double bonds are epoxidized. Alkenylene group.
- the linking group in X is particularly preferably a linking group containing an oxygen atom, specifically, —CO—, —O—CO—O—, —COO—, —O—, —CONH—, epoxy.
- Representative examples of the compound represented by the above formula (I) include compounds represented by the following formulas (I-1) to (I-10), 2,2-bis (3,4-epoxycyclohexane- 1-yl) propane, 1,2-bis (3,4-epoxycyclohexane-1-yl) ethane, 1,2-epoxy-1,2-bis (3,4-epoxycyclohexane-1-yl) ethane, And bis (3,4-epoxycyclohexylmethyl) ether.
- l and m each represents an integer of 1 to 30.
- R in the following formula (I-5) is an alkylene group having 1 to 8 carbon atoms, and is a methylene group, ethylene group, propylene group, isopropylene group, butylene group, isobutylene group, s-butylene group, pentylene group, hexylene.
- linear or branched alkylene groups such as a group, a heptylene group, and an octylene group.
- linear or branched alkylene groups having 1 to 3 carbon atoms such as a methylene group, an ethylene group, a propylene group, and an isopropylene group are preferable.
- N1 to n6 in the following formulas (I-9) and (I-10) each represents an integer of 1 to 30.
- Examples of the compound (ii) having an epoxy group bonded directly to the alicyclic ring with a single bond include a compound (epoxy resin) represented by the following formula (II).
- R 1 represents a p-valent organic group.
- p represents an integer of 1 to 20.
- Examples of the p-valent organic group include a p-valent organic group having a structure formed by removing p hydroxy groups from the structural formula of an organic compound having p hydroxy groups described later.
- q represents an integer of 1 to 50.
- p is an integer greater than or equal to 2
- several q may be the same and may differ.
- the sum (total) of q in the formula (II) is an integer of 3 to 100.
- R 2 is a substituent on the cyclohexane ring shown in the formula, and represents any of the groups represented by the following formulas (IIa) to (IIc).
- the bonding position of R 2 on the cyclohexane ring is not particularly limited. Usually, when the positions of the two carbon atoms of the cyclohexane ring bonded to the oxygen atom are the 1st and 2nd positions, the 4th or 5th carbon atom It is.
- the bonding positions of R 2 in each cyclohexane ring may be the same or different.
- At least one R 2 in the formula (II) is a group (epoxy group) represented by the formula (IIa).
- the compound represented by the formula (II) has two or more R 2, to a plurality of R 2 may be the same or different.
- R 3 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkylcarbonyl group, or a substituted or unsubstituted arylcarbonyl group.
- alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, butyl group, isobutyl group, s-butyl group, t-butyl group, pentyl group, hexyl group, octyl group, and 2-ethylhexyl. Examples thereof include straight-chain or branched alkyl groups having 1 to 20 carbon atoms.
- alkylcarbonyl group examples include methylcarbonyl group (acetyl group), ethylcarbonyl group, n-propylcarbonyl group, isopropylcarbonyl group, n-butylcarbonyl group, isobutylcarbonyl group, s-butylcarbonyl group, t-butyl.
- alkylcarbonyl group examples include methylcarbonyl group (acetyl group), ethylcarbonyl group, n-propylcarbonyl group, isopropylcarbonyl group, n-butylcarbonyl group, isobutylcarbonyl group, s-butylcarbonyl group, t-butyl.
- alkylcarbonyl group examples include methylcarbonyl group (acetyl group), ethylcarbonyl group, n-propylcarbonyl group, isopropylcarbonyl group, n-butylcarbonyl group, iso
- arylcarbonyl group examples include arylcarbonyl groups having 6 to 20 carbon atoms such as a phenylcarbonyl group (benzoyl group), 1-naphthylcarbonyl group, 2-naphthylcarbonyl group, and the like.
- Examples of the substituent that the above-described alkyl group, alkylcarbonyl group, and arylcarbonyl group may have include a substituent having 0 to 20 carbon atoms (more preferably 0 to 10 carbon atoms).
- Examples of the substituent include halogen atoms such as fluorine atom, chlorine atom, bromine atom and iodine atom; hydroxy group; alkoxy group such as methoxy group, ethoxy group, propoxy group, isopropyloxy group, butoxy group and isobutyloxy group (Preferably C 1-6 alkoxy group, more preferably C 1-4 alkoxy group); alkenyloxy group such as allyloxy group (preferably C 2-6 alkenyloxy group, more preferably C 2-4 alkenyloxy group)
- An acyloxy group such as an acetyloxy group, a propionyloxy group and a (meth) acryloyloxy group (preferably a C 1-12
- examples of the substituent that the above-described arylcarbonyl group may have include the above-described substituted or unsubstituted alkyl group and the above-described substituted or unsubstituted alkylcarbonyl group.
- the ratio of the group (epoxy group) represented by the formula (IIa) to the total amount (100 mol%) of R 2 in the compound represented by the formula (II) is not particularly limited, but is 40 mol% or more (for example, 40 to 100 mol%) is preferable, more preferably 60 mol% or more, and still more preferably 80 mol% or more.
- the ratio is 40 mol% or more, the heat resistance, light resistance, mechanical properties, etc. of the cured product tend to be further improved.
- the above ratio can be calculated by, for example, 1 H-NMR spectrum measurement, oxirane oxygen concentration measurement, or the like.
- the compound represented by the formula (II) is not particularly limited.
- an organic compound [R 1 (OH) p ] having p hydroxy groups in the molecule is used as an initiator (ie, the hydroxy group of the compound). (Starting with active hydrogen)), 1,2-epoxy-4-vinylcyclohexane (3-vinyl-7-oxabicyclo [4.1.0] heptane) is subjected to ring-opening polymerization (cationic polymerization), and then Manufactured by epoxidation with an oxidizing agent.
- Examples of the organic compound [R 1 (OH) p ] having p hydroxy groups in the molecule include aliphatic alcohols such as methanol, ethanol, propanol, butanol, pentanol, hexanol, octanol; ethylene glycol, diethylene glycol , Triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, 1,3-butanediol, 1,4-butanediol, pentanediol, 1,6-hexanediol, neopentyl glycol, neopentyl glycol ester, cyclohexanedi Methanol, glycerin, diglycerin, polyglycerin, trimethylolpropane, pentaerythritol, dipentaerythritol, hydrogenated bisphenol A, hydrogenated bisphenol F, water Polyhydric alcohols such as bisphenol S; polyvin
- the 1,2-epoxy-4-vinylcyclohexane can be produced by a known or commonly used method, and is not particularly limited.
- 4-vinylcyclohexene obtained by dimerization reaction of butadiene is replaced with an oxidizing agent such as peracetic acid. Obtained by partial epoxidation using.
- 1,2-epoxy-4-vinylcyclohexane a commercially available product can be used.
- the oxidant may be a known or conventional oxidant such as hydrogen peroxide or organic peracid, and is not particularly limited.
- the organic peracid include performic acid, peracetic acid, peroxygen. Examples include benzoic acid and trifluoroperacetic acid. Among them, peracetic acid is preferable because it is industrially available at low cost and has high stability.
- the standard polystyrene equivalent weight average molecular weight of the compound represented by the formula (II) is not particularly limited, but is preferably 300 to 100,000, more preferably 1,000 to 10,000.
- the weight average molecular weight is 300 or more, the mechanical strength, heat resistance, and light resistance of the cured product tend to be improved.
- the weight average molecular weight is 100,000 or less, the viscosity does not become too high and the fluidity during molding tends to be maintained low.
- the weight average molecular weight is measured by a gel permeation chromatography (GPC) method.
- the equivalent (epoxy equivalent) of the epoxy group of the compound represented by the formula (II) is not particularly limited, but is preferably 50 to 1000, more preferably 100 to 500.
- the epoxy equivalent is 50 or more, the cured product tends not to be brittle.
- the epoxy equivalent is 1000 or less, the mechanical strength of the cured product tends to be improved.
- the epoxy equivalent is measured according to JIS K7236: 2001.
- the alicyclic epoxy compound (A) can be used singly or in combination of two or more.
- the alicyclic epoxy compound (A) can also be produced by a known or conventional method.
- commercial names such as trade names “Celoxide 2021P” and “Celoxide 2081” (manufactured by Daicel Corporation) are available. Can also be used.
- the alicyclic epoxy compound (A) preferably exhibits a liquid state at normal temperature (25 ° C.) from the viewpoint of workability during preparation and casting. Moreover, even if it is an alicyclic epoxy compound (A) which is solid at normal temperature (25 degreeC), as long as it shows liquid state after mix
- the curable resin composition of this invention contains at least the compound which has (i) alicyclic epoxy group from a viewpoint which the light reflectivity of a hardened
- the content (blending amount) of the alicyclic epoxy compound (A) in the curable resin composition of the present invention is not particularly limited, but is 0.1 to 60 with respect to the curable resin composition (100% by weight). % By weight is preferable, more preferably 0.3 to 50% by weight, still more preferably 0.5 to 40% by weight.
- the content of the alicyclic epoxy compound (A) By setting the content of the alicyclic epoxy compound (A) to 0.1% by weight or more, the heat resistance and light resistance of the cured product (reflector) tend to be further improved.
- the content of the alicyclic epoxy compound (A) to 60% by weight or less, the heat resistance and light resistance of the cured product (reflector) are further improved, the linear expansion coefficient is reduced, and the optical semiconductor element is mounted. There is a tendency that the occurrence of defects such as lead frame warpage in the circuit board is suppressed.
- the alicyclic epoxy compound (A) When the epoxy compound other than the alicyclic epoxy compound (A) is contained, the alicyclic epoxy compound (A) with respect to the total amount (100% by weight) of the compound having an epoxy group contained in the curable resin composition of the present invention.
- the ratio is not particularly limited, but is preferably 1 to 90% by weight, more preferably 5 to 80% by weight, and still more preferably 10 to 70% by weight. By making it in the said range, there exists a tendency for the heat resistance and light resistance of hardened
- an alicyclic epoxy compound (A), an isocyanuric acid derivative (H), a siloxane derivative (I), etc. are mentioned, for example. .
- each component for example, alicyclic epoxy compound (A), rubber particle (B), white pigment (C), inorganic filler (D) contained in the curable resin composition of the present invention.
- Curing agent (E), curing accelerator (F), curing catalyst (G), isocyanuric acid derivative (H), siloxane derivative (I), etc. respectively, so that the total content is 100% by weight or less.
- it can select suitably from the description range.
- the rubber particles (B) that are essential components of the curable resin composition of the present invention are particles having rubber elasticity.
- the rubber particles (B) are alicyclic epoxy compound (A), white pigment (C), inorganic filler (D), isocyanuric acid derivative (H), and siloxane derivative (I). ),
- the cured product formed is excellent in light reflectivity, heat resistance, light resistance, and crack resistance, and the above effect is remarkably exhibited particularly when the cured product is formed by compression molding. Tend.
- the rubber particles (B) include rubber particles such as particulate NBR (acrylonitrile-butadiene rubber), reactive terminal carboxy group NBR (CTBN), metal-free NBR, particulate SBR (styrene-butadiene rubber). .
- the rubber particles (B) have a core part having rubber elasticity and at least one shell covering the core part from the viewpoint of good dispersibility and an effect of improving toughness (crack resistance improvement). Rubber particles having a multilayer structure (core-shell structure) composed of layers (hereinafter sometimes referred to as “core-shell type rubber particles”) are preferred.
- the rubber particles (B) are particularly composed of a polymer (polymer) having (meth) acrylic acid ester as an essential monomer component, and an alicyclic ring on the surface. Rubber particles having a hydroxy group and / or a carboxy group (either one or both of a hydroxy group and a carboxy group) as a functional group capable of reacting with a compound having an epoxy group such as the formula epoxy compound (A) are preferred. That is, the rubber particles (B) are particularly preferably core-shell type rubber particles composed of a polymer (acrylic polymer) containing (meth) acrylic acid ester as an essential monomer component. In the curable resin composition of the present invention, the rubber particles (B) can be used singly or in combination of two or more.
- the polymer constituting the core portion having rubber elasticity is not particularly limited, but methyl (meth) acrylate, ethyl (meth) acrylate, (meth) acrylic A polymer containing a (meth) acrylic acid ester such as butyl acid as an essential monomer component is preferable.
- the polymer constituting the core part having rubber elasticity includes, for example, aromatic vinyl such as styrene and ⁇ -methylstyrene; nitrile such as acrylonitrile and methacrylonitrile; conjugated diene such as butadiene and isoprene; ethylene, propylene, An ⁇ -olefin such as isobutene may be included as a monomer component.
- the polymer constituting the core portion having rubber elasticity is combined with one or more selected from the group consisting of aromatic vinyl, nitrile, and conjugated diene together with (meth) acrylic acid ester as a monomer component. It is preferable to include. That is, as the polymer constituting the core part, for example, (meth) acrylic acid ester / aromatic vinyl, (meth) acrylic acid ester / conjugated diene and other binary copolymers; (meth) acrylic acid ester / aromatic And terpolymers such as group vinyl / conjugated dienes.
- the polymer constituting the core portion may contain silicone such as polydimethylsiloxane and polyphenylmethylsiloxane, polyurethane, and the like.
- the polymer constituting the core part includes, as other monomer components, divinylbenzene, allyl (meth) acrylate, ethylene glycol di (meth) acrylate, diallyl maleate, triallyl cyanurate, diallyl phthalate, butylene glycol diacrylate, etc.
- a reactive crosslinking monomer having two or more reactive functional groups in the molecule may be contained.
- the core-shell type rubber is preferably a core portion composed of a binary or ternary copolymer containing (meth) acrylic acid ester and aromatic vinyl (particularly butyl acrylate and styrene). This is preferable in that the refractive index of the particles can be easily adjusted.
- the glass transition temperature of the polymer constituting the core portion is not particularly limited, but is preferably ⁇ 100 to 10 ° C., more preferably ⁇ 80 to ⁇ 10 ° C., and further preferably ⁇ 60 to ⁇ 20 ° C. There exists a tendency for the crack resistance of hardened
- the glass transition temperature of the polymer which comprises the said core part means the calculated value calculated by the formula of the following Fox (refer Bull. Am. Phys. Soc., 1 (3) 123 (1956)).
- Tg glass transition temperature (unit: K) of the polymer constituting the core portion indicates, W i is the weight fraction of the monomer i for the monomer total amount constituting the polymer constituting the core portion Indicates the rate. Further, Tg i is the glass transition temperature of the homopolymer of monomer i (unit: K) shows a.
- the glass transition temperature of the homopolymer values described in various documents can be adopted, for example, values described in “POLYMER HANDBOOK 3rd edition” (published by John Wiley & Sons, Inc.) can be adopted. In addition, about the thing which is not described in literature, the value of the glass transition temperature measured by DSC method of the homopolymer obtained by superposing
- the core part can be produced by a commonly used method.
- the core part can be produced by a method of polymerizing the monomer by an emulsion polymerization method.
- the whole amount of the monomer may be charged all at once and polymerized, or after polymerizing a part of the monomer, the remainder may be added continuously or intermittently for polymerization.
- a polymerization method using seed particles may be used.
- the rubber particle which does not have a core shell structure as a rubber particle (B)
- the rubber particle etc. which consist only of the said core part can be used, for example.
- the polymer constituting the shell layer of the core-shell type rubber particles is preferably a polymer different from the polymer constituting the core portion (a polymer having a different monomer composition).
- the shell layer preferably has a hydroxy group and / or a carboxy group as a functional group capable of reacting with a compound having an epoxy group such as an alicyclic epoxy compound (A).
- the polymer constituting the shell layer is preferably a polymer containing (meth) acrylic acid ester such as methyl (meth) acrylate, ethyl (meth) acrylate, and butyl (meth) acrylate as an essential monomer component.
- (meth) acrylic acid ester such as methyl (meth) acrylate, ethyl (meth) acrylate, and butyl (meth) acrylate
- (meth) acrylic acid esters other than butyl acrylate for example, ( (Meth) methyl acrylate, ethyl (meth) acrylate, butyl methacrylate, etc.
- the monomer component that may be contained in addition to the (meth) acrylic acid ester examples include aromatic vinyl such as styrene and ⁇ -methylstyrene; nitrile such as acrylonitrile and methacrylonitrile.
- the monomer component constituting the shell layer includes the (meth) acrylic acid ester alone or in combination of two or more, particularly at least aromatic vinyl. It is preferable in that the refractive index of the core-shell type rubber particles can be easily adjusted.
- the polymer constituting the shell layer forms a hydroxy group and / or a carboxy group as a functional group capable of reacting with a compound having an epoxy group such as an alicyclic epoxy compound (A) as a monomer component.
- Hydroxy group-containing monomers eg, hydroxyalkyl (meth) acrylates such as 2-hydroxyethyl (meth) acrylate
- carboxy group-containing monomers eg, ⁇ , ⁇ -unsaturated acids such as (meth) acrylic acid; ⁇ , ⁇ -unsaturated acid anhydrides such as maleic anhydride
- the polymer constituting the shell layer preferably contains, as a monomer component, one or two or more selected from the above monomers in combination with (meth) acrylic acid ester. That is, the shell layer is composed of, for example, a ternary copolymer such as (meth) acrylic acid ester / aromatic vinyl / hydroxyalkyl (meth) acrylate, (meth) acrylic acid ester / aromatic vinyl / ⁇ , ⁇ -unsaturated acid.
- a shell layer composed of a polymer or the like is preferable.
- the polymer constituting the shell layer includes, as the other monomer components, divinylbenzene, allyl (meth) acrylate, ethylene glycol di (meth) acrylate, diallyl maleate, trimethyl, as well as the above-described monomer.
- a reactive crosslinking monomer having two or more reactive functional groups may be contained in the molecule such as allyl cyanurate, diallyl phthalate, butylene glycol diacrylate.
- the glass transition temperature of the polymer constituting the shell layer is not particularly limited, but is preferably 20 to 200 ° C, more preferably 40 to 180 ° C, and still more preferably 60 to 160 ° C.
- the glass transition temperature of the polymer is not particularly limited, but is preferably 20 to 200 ° C, more preferably 40 to 180 ° C, and still more preferably 60 to 160 ° C.
- the glass transition temperature of the polymer is 20 ° C. or higher, the heat resistance and light resistance of the cured product tend to be further improved.
- the glass transition temperature of the polymer is 200 ° C. or lower, the dispersibility of the rubber particles (B) and the crack resistance of the cured product tend to be improved.
- the glass transition temperature of the polymer which comprises the said shell layer means the calculated value computed by the said Formula of Fox, For example, it can measure similarly to the glass transition temperature of the polymer which comprises the above-mentioned core.
- Core-shell type rubber particles are obtained by covering the core part with a shell layer.
- the method for coating the core part with the shell layer include a method of coating the surface of the core part having rubber elasticity obtained by the above method by applying a polymer constituting the shell layer;
- Examples thereof include a graft polymerization method in which the core portion having rubber elasticity is a trunk component and each component constituting the shell layer is a branch component.
- the average particle size of the rubber particles (B) is not particularly limited, but is preferably 10 to 500 nm, more preferably 20 to 400 nm.
- the maximum particle size of the rubber particles (B) is not particularly limited, but is preferably 50 to 1000 nm, and more preferably 100 to 800 nm.
- the average particle size is 500 nm or less (or the maximum particle size is 1000 nm or less)
- the dispersibility of the rubber particles (B) in the cured product is improved and the crack resistance tends to be improved.
- the average particle size is 10 nm or more (or the maximum particle size is 50 nm or more)
- the crack resistance of the cured product tends to be improved.
- the refractive index of the rubber particles (B) is not particularly limited, but is preferably 1.40 to 1.60, more preferably 1.42 to 1.58.
- the difference between the refractive index of the rubber particles (B) and the refractive index of the cured product obtained by curing the curable resin composition (the curable resin composition of the present invention) containing the rubber particles (B) is It is preferably within ⁇ 0.03.
- the refractive index of the rubber particles (B) is, for example, 1 g of rubber particles (B) is cast into a mold and compression molded at 210 ° C. and 4 MPa to obtain a flat plate having a thickness of 1 mm. ⁇ A 6 mm wide test piece was cut out, and a multi-wavelength Abbe refractometer (trade name “DR-M2”, Atago Co., Ltd.) was used in a state where the prism and the test piece were in close contact using monobromonaphthalene as an intermediate solution. And the refractive index at 20 ° C. and sodium D line can be measured.
- the refractive index of the cured product of the curable resin composition of the present invention is, for example, a test piece having a length of 20 mm ⁇ width of 6 mm ⁇ thickness of 1 mm from a cured product obtained by the heat curing method described in the section of cured product below.
- a multi-wavelength Abbe refractometer (trade name “DR-M2”, manufactured by Atago Co., Ltd.) in a state where the prism and the test piece are in close contact using monobromonaphthalene as an intermediate solution, 20 It can obtain
- the content (blending amount) of the rubber particles (B) in the curable resin composition of the present invention is not particularly limited, but is 0.01 to 20% by weight with respect to the curable resin composition (100% by weight). Preferably, it is 0.05 to 15% by weight, more preferably 0.1 to 10% by weight.
- the content (blending amount) of the rubber particles (B) in the curable resin composition of the present invention is not particularly limited, but with respect to 100 parts by weight of the total amount of compounds having an epoxy group contained in the curable resin composition,
- the amount is preferably 0.5 to 30 parts by weight, more preferably 1 to 20 parts by weight.
- the white pigment (C) which is an essential component of the curable resin composition of the present invention, mainly imparts high light reflectivity to the cured product (reflector), and also functions to reduce its linear expansion coefficient. Have.
- white pigment (C) known or commonly used white pigments can be used, and are not particularly limited.
- Organic white pigments plastic pigments, etc.
- resin pigments such as resin-based resins; hollow particles having a hollow structure (balloon structure), and the like.
- the white pigment (C) it is preferable to use a white pigment having a high refractive index in order to increase the reflectance of the reflector.
- a white pigment having a refractive index of 1.5 or more is preferable.
- the shell portion may be made of a material having a refractive index lower than 1.5.
- those corresponding to the inorganic filler (D) are those having a refractive index of 1.5 or more as the white pigment (C) and having a refractive index of 1.5. The smaller one is the inorganic filler (D).
- Examples of the inorganic oxide include aluminum oxide (alumina), magnesium oxide, antimony oxide, titanium oxide [eg, rutile titanium oxide, anatase titanium oxide, brookite titanium oxide, etc.], zirconium oxide, zinc oxide, and the like. Can be mentioned.
- Examples of the alkaline earth metal salt include magnesium carbonate, calcium carbonate, barium carbonate, magnesium silicate, calcium silicate, magnesium hydroxide, magnesium phosphate, magnesium hydrogen phosphate, magnesium sulfate, calcium sulfate, and sulfuric acid. Barium etc. are mentioned.
- Examples of the metal salt other than the alkaline earth metal salt include aluminum silicate, aluminum hydroxide, and zinc sulfide.
- inorganic glass For example, silicate glass, aluminum silicate glass, sodium borosilicate glass, quartz, etc.], metal oxides, such as silica and alumina, calcium carbonate, barium carbonate, Inorganic hollow particles composed of inorganic materials such as nickel carbonate, calcium silicate and other metal salts (including natural products such as shirasu balloon); styrene resins, acrylic resins, silicone resins, acrylic-styrene resins, vinyl chloride -Based resins, vinylidene chloride-based resins, amide-based resins, urethane-based resins, phenol-based resins, styrene-conjugated diene-based resins, acrylic-conjugated diene-based resins, olefin-based polymers (including cross-linked products of these polymers), etc.
- silicate glass aluminum silicate glass, sodium borosilicate glass, quartz, etc.
- metal oxides such as silica and alumina, calcium
- the said hollow particle may be comprised from the single material, and may be comprised from 2 or more types of materials.
- the hollow portion of the hollow particles (the space inside the hollow particles) may be in a vacuum state or may be filled with a medium.
- a medium for example, an inert gas such as nitrogen or argon or air
- the white pigment (C) is subjected to a known or conventional surface treatment [for example, a surface treatment with a surface treatment agent such as a metal oxide, a silane coupling agent, a titanium coupling agent, an organic acid, a polyol, or silicone]. It may be what was done. By performing such a surface treatment, there are cases where compatibility and dispersibility with other components in the curable resin composition can be improved.
- a surface treatment agent such as a metal oxide, a silane coupling agent, a titanium coupling agent, an organic acid, a polyol, or silicone.
- the white pigment (C) from the viewpoint of availability, heat resistance, light resistance, and high reflectance of the cured product (reflector) and light reflectance increase rate with respect to the addition amount, inorganic oxides, inorganic Hollow particles are preferred, more preferably aluminum oxide, magnesium oxide, antimony oxide, titanium oxide, zirconium oxide, zinc oxide, barium sulfate, inorganic hollow particles, and more preferably titanium oxide, zirconium oxide, zinc oxide, barium sulfate.
- the white pigment (C) is preferably titanium oxide because it has a higher refractive index.
- the shape of the white pigment (C) is not particularly limited, and examples thereof include a spherical shape, a crushed shape, a fibrous shape, a needle shape, and a scale shape.
- spherical titanium oxide is preferable from the viewpoint of dispersibility, and spherical titanium oxide (for example, spherical titanium oxide having an aspect ratio of 1.2 or less) is particularly preferable.
- the center particle diameter of the white pigment (C) is not particularly limited, but is preferably 0.1 to 50 ⁇ m from the viewpoint of improving the light reflectivity of the cured product (reflector).
- the center particle diameter of the titanium oxide is not particularly limited, but is preferably 0.1 to 50 ⁇ m, more preferably 0.1 to 30 ⁇ m, and still more preferably 0. .1 to 20 ⁇ m, particularly preferably 0.1 to 10 ⁇ m, most preferably 0.1 to 5 ⁇ m.
- the center particle diameter of the hollow particles is not particularly limited, but is preferably 0.1 to 50 ⁇ m, more preferably 0.1 to 30 ⁇ m.
- the said center particle size means the particle size (median diameter) in the integrated value 50% in the particle size distribution measured by the laser diffraction / scattering method.
- the white pigment (C) can be used alone or in combination of two or more.
- the white pigment (C) can also be produced by a known or conventional method.
- the white pigment (C) the product names “R-62N”, “CR-60”, “DCF-T-17007”, especially from the viewpoint of improving the light reflectivity and heat resistance of the cured product (reflector), “DCF-T-17008”, “DCF-T-17050”, and “FTR-700” are preferable.
- the content (blending amount) of the white pigment (C) in the curable resin composition of the present invention is not particularly limited, but is 0.1 to 50% by weight with respect to the curable resin composition (100% by weight). Preferably, it is 1 to 40% by weight, more preferably 5 to 35% by weight.
- cured material (reflector) to improve more by making content of a white pigment (C) 0.1 weight% or more.
- the content of the white pigment (C) is 60% by weight or less, the moldability of the cured product (reflector) is improved and tends to be more suitable for mass production.
- the content (blending amount) of the white pigment (C) in the curable resin composition of the present invention is not particularly limited, but is based on 100 parts by weight of the total amount of compounds having an epoxy group contained in the curable resin composition.
- the amount is preferably 10 to 600 parts by weight, more preferably 30 to 500 parts by weight, still more preferably 30 to 400 parts by weight.
- the content of the white pigment (C) is 600 parts by weight or less, the moldability of the cured product (reflector) is improved and tends to be more suitable for mass production.
- the ratio of titanium oxide to the total amount (100% by weight) of the white pigment (C) and the inorganic filler (D) is not particularly limited, but a cured product ( From the viewpoint of the balance between heat resistance and light reflectivity of the reflector, the content is preferably 5 to 70% by weight, more preferably 10 to 60% by weight.
- the ratio of titanium oxide 5% by weight or more the light reflectivity of the cured product (reflector) tends to be further improved.
- the proportion of titanium oxide to 70% by weight or less the moldability of the cured product (reflector) is improved and tends to be more suitable for mass production.
- the curable resin composition of the present invention contains an inorganic filler (D) as an essential component separately from the white pigment (C).
- the inorganic filler (D) mainly imparts excellent heat resistance and light resistance (particularly excellent heat resistance) to the cured product (reflector). Moreover, it has the function to reduce the linear expansion coefficient of hardened
- the inorganic filler (D) a known or conventional inorganic filler can be used, and is not particularly limited.
- Examples of the inorganic filler (D) include those obtained by subjecting the above-described inorganic filler to a known or conventional surface treatment. Among these, silica, alumina, silicon nitride, aluminum nitride, and boron nitride are preferable as the inorganic filler (D) from the viewpoint of heat resistance, light resistance, and fluidity of the cured product (reflector).
- the silica is not particularly limited, and for example, known or commonly used silica such as fused silica, crystalline silica, high-purity synthetic silica or the like can be used.
- Silica has been subjected to a known or conventional surface treatment [for example, surface treatment with a surface treatment agent such as a metal oxide, a silane coupling agent, a titanium coupling agent, an organic acid, a polyol, or silicone]. Can also be used.
- the shape of silica is not particularly limited, and examples thereof include powder, spherical shape, crushed shape, fibrous shape, needle shape, scale shape, and the like. Among these, spherical silica is preferable from the viewpoint of dispersibility, and spherical silica (for example, spherical silica having an aspect ratio of 1.2 or less) is particularly preferable.
- the center particle diameter of silica is not particularly limited, but is preferably 0.1 to 50 ⁇ m, more preferably 0.1 to 30 ⁇ m from the viewpoint of improving the light reflectivity of the cured product (reflector).
- the said center particle size means the particle size (median diameter) in the integrated value 50% in the particle size distribution measured by the laser diffraction / scattering method.
- the inorganic filler (D) can be used alone or in combination of two or more.
- the inorganic filler (D) can also be produced by a known or conventional production method. For example, trade names “FB-910”, “FB-940”, “FB-950”, “FB-105” can be used.
- the content (blending amount) of the inorganic filler (D) in the curable resin composition of the present invention is not particularly limited, but is preferably 10 to 90% by weight with respect to the curable resin composition (100% by weight). More preferably, it is 13 to 75% by weight, more preferably 15 to 70% by weight, and still more preferably 20 to 70% by weight.
- the content of the inorganic filler (D) is 10% by weight or more, the heat resistance and light resistance (particularly excellent heat resistance) of the cured product tend to be further improved.
- the linear expansion coefficient of the cured product (reflector) tends to be low, and problems such as lead frame warpage in an optical semiconductor element mounting substrate using the reflector tend not to occur.
- the content of the inorganic filler (D) is 90% by weight or less, the moldability of the cured product (reflector) is improved and tends to be more suitable for mass production.
- the content (blending amount) of the inorganic filler (D) in the curable resin composition of the present invention is not particularly limited, but is based on 100 parts by weight of the total amount of compounds having an epoxy group contained in the curable resin composition.
- the amount is preferably 10 to 1500 parts by weight, more preferably 50 to 1200 parts by weight, and still more preferably 100 to 1000 parts by weight.
- the content of the inorganic filler (D) is 10 parts by weight or more, the heat resistance and light resistance (particularly excellent heat resistance) of the cured product tend to be further improved.
- the linear expansion coefficient of the cured product (reflector) tends to be low, and problems such as lead frame warpage in an optical semiconductor element mounting substrate using the reflector tend not to occur.
- the content of the inorganic filler (D) is 1500 parts by weight or less, the moldability of the cured product (reflector) is improved and tends to be more suitable for mass production.
- the maximum particle size of the white pigment (C) and the inorganic filler (D) in the curable resin composition of the present invention is not particularly limited, but is preferably 200 ⁇ m or less, more preferably 185 ⁇ m or less, still more preferably 175 ⁇ m or less, particularly Preferably it is 150 micrometers or less.
- the maximum particle size is 200 ⁇ m or less, the cured product has heat resistance, light resistance, and crack resistance (especially excellent heat resistance) as compared with the case of using a white pigment or an inorganic filler having a maximum particle size exceeding 200 ⁇ m. ) Tends to be even better.
- the white pigment (C) and the inorganic filler (D) having a small maximum particle size it is possible to increase their contents, and the light reflectivity, heat resistance and light resistance of the cured product are further increased. There is a tendency to improve.
- the lower limit of the maximum particle size is, for example, 0.01 ⁇ m or more.
- the maximum particle size is the total maximum particle size of the white pigment (C) and the inorganic filler (D) contained in the curable resin composition of the present invention.
- the maximum particle size means the maximum particle size in the particle size distribution measured by the laser diffraction / scattering method.
- the curing agent (E) in the curable resin composition of the present invention is a compound having a function of curing the curable resin composition by reacting with a compound having an epoxy group such as an alicyclic epoxy compound (A). is there.
- a known or conventional epoxy resin curing agent can be used, and is not particularly limited.
- acid anhydrides (acid anhydride curing agents), amines (amine curing) Agents), polyamide resins, imidazoles (imidazole-based curing agents), polymercaptans (polymercaptan-based curing agents), phenols (phenol-based curing agents), polycarboxylic acids, dicyandiamides, organic acid hydrazides and the like.
- acid anhydrides as the curing agent (E), known or conventional acid anhydride curing agents can be used, and are not particularly limited.
- methyltetrahydrophthalic anhydride (4 -Methyltetrahydrophthalic anhydride, 3-methyltetrahydrophthalic anhydride, etc.
- methylhexahydrophthalic anhydride such as 4-methylhexahydrophthalic anhydride, 3-methylhexahydrophthalic anhydride
- dodecenyl succinic anhydride methyl Endomethylenetetrahydrophthalic anhydride, phthalic anhydride, maleic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylcyclohexene dicarboxylic anhydride, pyromellitic anhydride, trimellitic anhydride, benzophenonetetracarboxylic anhydride, anhydrous Nadic acid
- the curing agent (E) in the curable resin composition of the present invention is prepared by dissolving in a liquid acid anhydride at 25 ° C. to form a liquid mixture.
- the handling property tends to be improved.
- anhydrides of saturated monocyclic hydrocarbon dicarboxylic acids including those having a substituent such as an alkyl group bonded to the ring are preferable. .
- amines (amine-based curing agent) as the curing agent (E) a known or conventional amine-based curing agent can be used, and is not particularly limited.
- ethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine Aliphatic polyamines such as dipropylenediamine, diethylaminopropylamine, polypropylenetriamine; mensendiamine, isophoronediamine, bis (4-amino-3-methyldicyclohexyl) methane, diaminodicyclohexylmethane, bis (aminomethyl) cyclohexane, N-amino Cycloaliphatic polyamines such as ethylpiperazine, 3,9-bis (3-aminopropyl) -3,4,8,10-tetraoxaspiro [5,5] undecane; m-phenylenediamine, p-phenylenediamine, Len-2
- phenols phenolic curing agents
- known or conventional phenolic curing agents can be used, and are not particularly limited.
- novolac type phenol resins novolac type cresol resins
- paraxylylene-modified phenols examples thereof include aralkyl resins such as resins, paraxylylene / metaxylylene-modified phenol resins, terpene-modified phenol resins, dicyclopentadiene-modified phenol resins, and triphenol propane.
- polyamide resin as the curing agent (E) examples include a polyamide resin having one or both of a primary amino group and a secondary amino group in the molecule.
- imidazole curing agent as the curing agent (E), a known or commonly used imidazole curing agent can be used, and is not particularly limited, and examples thereof include 2-methylimidazole and 2-ethyl-4-methylimidazole.
- Examples of the polymercaptans (polymercaptan-based curing agent) as the curing agent (E) include liquid polymercaptan and polysulfide resin.
- polycarboxylic acids examples include adipic acid, sebacic acid, terephthalic acid, trimellitic acid, carboxy group-containing polyester, and the like.
- the curing agent (E) acid anhydrides (acid anhydride curing agents) are preferable from the viewpoints of heat resistance, light resistance, and light reflectivity of the cured product.
- curing agent (E) can also be used individually by 1 type in the curable resin composition of this invention, and can also be used in combination of 2 or more type.
- the curing agent can be produced by a known or conventional method.
- trade names “Licacid MH-700”, “Licacid MH-700F”, “Licacid MH-700G”, “Licacid TH”, “Licacid CI” "HH”, “Licacid HNA-100” (manufactured by Shin Nippon Rika Co., Ltd.); trade name “HN-5500” (manufactured by Hitachi Chemical Co., Ltd.); trade names “H-TMAn-S”, "H Commercially available products such as “TMAn” (Mitsubishi Gas Chemical Co., Ltd.); trade name “YH1120” (Mitsubishi Chemical Co., Ltd.) can also be used.
- the curable resin composition of this invention contains a hardening
- curing agent (E) is although it does not specifically limit, With respect to curable resin composition (100 weight%)
- the content is preferably 1 to 40% by weight, more preferably 3 to 35% by weight, and still more preferably 5 to 30% by weight.
- the content (blending amount) of the curing agent (E) is not particularly limited, but has an epoxy group contained in the curable resin composition.
- the amount is preferably 40 to 200 parts by weight, more preferably 50 to 150 parts by weight with respect to 100 parts by weight of the total amount of the compound. More specifically, when acid anhydrides are used as the curing agent (E), 0.5 to 0.5 per equivalent of epoxy group in the compound having all epoxy groups contained in the curable resin composition of the present invention. It is preferable to use it at a ratio of 1.5 equivalents.
- the curable resin composition of the present invention may contain a curing accelerator (F).
- the curing accelerator (F) is a compound having an epoxy group contained in the curable resin composition of the present invention (for example, alicyclic epoxy compound (A), isocyanuric acid derivative (H), and siloxane derivative (I)). Is a compound having a function of accelerating the reaction rate when reacting with a curing agent such as curing agent (E).
- a known or conventional curing accelerator can be used as the curing accelerator (F).
- 1,8-diazabicyclo [5.4.0] undecene-7 DBU or a salt thereof (for example, phenol) Salt, octylate, p-toluenesulfonate, formate, tetraphenylborate, etc.); 1,5-diazabicyclo [4.3.0] nonene-5 (DBN) or a salt thereof (eg, phenol salt, Octylate, p-toluenesulfonate, formate, tetraphenylborate, etc.); benzyldimethylamine, 2,4,6-tris (dimethylaminomethyl) phenol, N, N-dimethylcyclohexylamine, etc.
- DBU 1,8-diazabicyclo [5.4.0] undecene-7
- DBN 1,5-diazabicyclo [4.3.0] nonene-5
- DBN 1,5-diazabicyclo [4.3.0] nonene-5
- imidazoles such as 2-ethyl-4-methylimidazole and 1-cyanoethyl-2-ethyl-4-methylimidazole
- Ether phosphines such as triphenyl phosphine
- phosphonium compounds such as tetraphenylphosphonium tetra (p- tolyl) borate
- organometallic salts such as zinc octylate and tin octylate
- metal chelate and the like.
- the curing accelerator (F) can be used singly or in combination of two or more.
- the curing accelerator (F) can be produced by a known or conventional method.
- trade names “U-CAT SA 506”, “U-CAT SA 102”, “U-CAT 5003”, “U-CAT 18X”, “12XD” developed product) (San Apro Co., Ltd.); trade names “TPP-K”, “TPP-MK” (Hokuko Chemical Co., Ltd.); Commercial products such as the name “PX-4ET” (manufactured by Nippon Chemical Industry Co., Ltd.) can also be used.
- the content (blending amount) of the curing accelerator (F) is not particularly limited, but the curable resin composition (100% by weight).
- the content is preferably 0.0001 to 5% by weight, more preferably 0.001 to 1% by weight.
- the curing reaction tends to proceed more efficiently.
- the content of the curing accelerator (F) is set to 5% by weight or less, the storability of the curable resin composition is further improved, or a cured product (reflector) that is more suppressed in coloring and excellent in hue. There is a tendency to obtain easily.
- the content (blending amount) of the curing accelerator (F) is not particularly limited, but is an epoxy group contained in the curable resin composition. Is preferably 0.05 to 15 parts by weight, more preferably 0.1 to 12 parts by weight, still more preferably 0.2 to 10 parts by weight, and most preferably 0.25 parts by weight with respect to 100 parts by weight of the total amount of the compounds having the above. ⁇ 8 parts by weight.
- the content of the curing accelerator By setting the content of the curing accelerator to 0.05 parts by weight or more, the curing reaction tends to proceed more efficiently.
- the content of the curing accelerator is 15 parts by weight or less, the storability of the curable resin composition is further improved, or a cured product (reflector) that is more suppressed in coloring and excellent in hue is easily obtained.
- the curing catalyst (G) in the curable resin composition of the present invention is a curable resin by initiating and / or accelerating a curing reaction (polymerization reaction) of a cationically polymerizable compound such as an alicyclic epoxy compound (A). It is a compound having a function of curing the composition.
- the curing catalyst (G) is not particularly limited.
- a cationic polymerization initiator photo cationic polymerization initiator, thermal cationic polymerization
- Lewis acid / amine complexes Bronsted acid salts, imidazoles and the like.
- Examples of the photocationic polymerization initiator as the curing catalyst (G) include hexafluoroantimonate salts, pentafluorohydroxyantimonate salts, hexafluorophosphate salts, hexafluoroarsenate salts, and more specifically.
- triarylsulfonium hexafluorophosphate eg, p-phenylthiophenyldiphenylsulfonium hexafluorophosphate
- sulfonium salts such as triarylsulfonium hexafluoroantimonate (particularly, triarylsulfonium salts)
- diaryl iodonium hexafluorophosphate Diaryl iodonium hexafluoroantimonate, bis (dodecylphenyl) iodonium tetrakis (pentafluorophenyl) borate, iodine Iodonium salts such as nium [4- (4-methylphenyl-2-methylpropyl) phenyl] hexafluorophosphate; phosphonium salts such as tetrafluorophosphonium hexafluorophosphate; pyridinium salts such as N-he
- cationic photopolymerization initiator examples include, for example, trade names “UVACURE 1590” (manufactured by Daicel Cytec Co., Ltd.); trade names “CD-1010”, “CD-1011”, “CD-1012” (above, the United States).
- Commercial products such as Sartomer); trade name “Irgacure 264” (manufactured by BASF); trade name “CIT-1682” (manufactured by Nippon Soda Co., Ltd.) can be preferably used.
- thermal cationic polymerization initiator as the curing catalyst (G) include aryldiazonium salts, aryliodonium salts, arylsulfonium salts, allene-ion complexes, etc., and trade names “PP-33”, “CP-66”.
- thermal cationic polymerization initiator a compound of a chelate compound of a metal such as aluminum or titanium and acetoacetic acid or diketone and a silanol such as triphenylsilanol, or a metal such as aluminum or titanium and acetoacetic acid or diketone
- a compound of a chelate compound with a phenol and a phenol such as bisphenol S.
- a known or commonly used Lewis acid / amine complex-based curing catalyst can be used, and is not particularly limited.
- a known or commonly used Lewis acid / amine complex-based curing catalyst can be used, and is not particularly limited.
- Bronsted acid salt as the curing catalyst (G), known or commonly used Bronsted acid salts can be used, and are not particularly limited.
- imidazole as the curing catalyst (G), known or conventional imidazoles can be used, and are not particularly limited.
- the curing catalyst (G) can be used singly or in combination of two or more.
- a commercial item can also be used as a curing catalyst (G).
- the content (blending amount) of the curing catalyst (G) is not particularly limited, but relative to the curable resin composition (100% by weight).
- the content is preferably 0.0001 to 5% by weight, more preferably 0.001 to 1% by weight.
- the content (blending amount) of the curing catalyst (G) in the curable resin composition of the present invention is not particularly limited.
- the amount is preferably 0.0001 to 15 parts by weight, more preferably 0.01 to 12 parts by weight, and still more preferably 0.05 to 10 parts by weight with respect to 100 parts by weight of the total amount of compounds having an epoxy group contained in the composition.
- Particularly preferred is 0.05 to 8 parts by weight.
- the isocyanuric acid derivative (H) that is an essential component of the curable resin composition of the present invention is a derivative of isocyanuric acid and is a compound having at least one oxirane ring in the molecule.
- the curable resin composition of the present invention contains the isocyanuric acid derivative (H)
- the light reflectivity, heat resistance, and light resistance of the cured product are improved, and the curable resin composition is simultaneously formed with the siloxane derivative (I) described later.
- the number of oxirane rings in the molecule of the isocyanuric acid derivative (H) may be one or more and is not particularly limited, but is preferably 1 to 6, more preferably 1 to 3.
- Examples of the isocyanuric acid derivative (H) include compounds represented by the following formula (III).
- R 4 to R 6 are the same or different and each represents a hydrogen atom or a monovalent organic group. However, at least one of R 4 to R 6 is a monovalent organic group containing an epoxy group.
- the monovalent organic group include a monovalent aliphatic hydrocarbon group (for example, an alkyl group and an alkenyl group); a monovalent aromatic hydrocarbon group (for example, an aryl group); A cyclic group; a monovalent group formed by combining two or more of an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, and an aromatic hydrocarbon group.
- the monovalent organic group may have a substituent (for example, a substituent such as a hydroxy group, a carboxy group, or a halogen atom).
- a substituent for example, a substituent such as a hydroxy group, a carboxy group, or a halogen atom.
- Examples of the monovalent organic group containing an epoxy group include a monovalent organic group containing an epoxy group described later such as an epoxy group, a glycidyl group, a 2-methylepoxypropyl group, and a cyclohexene oxide group.
- R 4 ⁇ R 6 in formula (III) may be the same or different, a group represented by the group or the following formula represented by the following formula (IIIa) (IIIb), the R 4 ⁇ R 6 At least one is preferably a group represented by the formula (IIIa).
- R 7 and R 8 in the above formulas (IIIa) and (IIIb) are the same or different and each represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.
- alkyl group having 1 to 8 carbon atoms include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, pentyl, hexyl, heptyl, octyl and the like. Examples thereof include a chain or branched alkyl group.
- R 7 and R 8 in formula (IIIa) and formula (IIIb) are particularly preferably hydrogen atoms.
- the isocyanuric acid derivative (H) includes a compound represented by the following formula (III-1), a compound represented by the following formula (III-2), and a compound represented by the following formula (III-3): And the like.
- R 7 and R 8 are the same or different and are the same as those in the formulas (IIIa) and (IIIb).
- Representative examples of the compound represented by the formula (III-1) include monoallyldiglycidyl isocyanurate, 1-allyl-3,5-bis (2-methylepoxypropyl) isocyanurate, 1- (2 -Methylpropenyl) -3,5-diglycidyl isocyanurate, 1- (2-methylpropenyl) -3,5-bis (2-methylepoxypropyl) isocyanurate and the like.
- Representative examples of the compound represented by the above formula (III-2) include diallyl monoglycidyl isocyanurate, 1,3-diallyl-5- (2-methylepoxypropyl) isocyanurate, 1,3-bis ( 2-methylpropenyl) -5-glycidyl isocyanurate, 1,3-bis (2-methylpropenyl) -5- (2-methylepoxypropyl) isocyanurate and the like.
- Representative examples of the compound represented by the above formula (III-3) include triglycidyl isocyanurate, tris (2-methylepoxypropyl) isocyanurate and the like.
- the above isocyanuric acid derivative (H) can be modified in advance by adding a compound that reacts with an epoxy group such as alcohol or acid anhydride.
- the isocyanuric acid derivative (H) is preferably a compound represented by the above formulas (III-1) to (III-3) from the viewpoint of light reflectivity, heat resistance, and solubility of the cured product.
- a compound represented by the above formula (III-1) is preferable.
- an isocyanuric acid derivative (H) can also be used individually by 1 type, and can also be used in combination of 2 or more type.
- isocyanuric acid derivative (H) examples include trade names “TEPIC” (manufactured by Nissan Chemical Industries, Ltd.); trade names “MA-DGIC”, “DA-MGIC” (above, Shikoku Kasei Kogyo Co., Ltd.) (Commercially available) can also be used.
- the content (blending amount) of the isocyanuric acid derivative (H) in the curable resin composition of the present invention is preferably 0.05 to 15% by weight, more preferably relative to the curable resin composition (100% by weight). Is 0.1 to 10% by weight, more preferably 0.3 to 5% by weight.
- the content (blending amount) of the isocyanuric acid derivative (H) in the curable resin composition of the present invention is not particularly limited, but is 100 parts by weight based on the total amount of compounds having an epoxy group contained in the curable resin composition.
- the amount is preferably 1 to 60 parts by weight, more preferably 1 to 50 parts by weight, and still more preferably 1 to 30 parts by weight.
- the siloxane derivative (I) which is an essential component of the curable resin composition of the present invention, has a skeleton composed of siloxane bonds (—Si—O—Si—) having two or more epoxy groups in the molecule. It is a compound (siloxane compound).
- the siloxane skeleton (Si—O—Si skeleton) in the siloxane derivative (I) is not particularly limited, and examples thereof include cyclic siloxane skeletons; linear silicones, cage-type and ladder-type polysilsesquioxanes, and the like. Examples include a polysiloxane skeleton.
- the siloxane skeleton a cyclic siloxane skeleton and a linear silicone skeleton are preferable from the viewpoint of improving the light reflectivity, heat resistance, and light resistance of the cured product and suppressing the light intensity reduction of the optical semiconductor device.
- the siloxane derivative (I) is preferably a cyclic siloxane having two or more epoxy groups in the molecule and a linear silicone having two or more epoxy groups in the molecule.
- the siloxane derivative (I) is a cyclic siloxane having two or more epoxy groups in the molecule
- the number of Si—O units forming the siloxane ring is particularly Although not limited, it is preferably 2 to 12, more preferably 4 to 8, from the viewpoint of improving the heat resistance and light resistance of the cured product.
- the weight average molecular weight of the siloxane derivative (I) is not particularly limited, but is preferably 100 to 3000, more preferably 180 to 2000, from the viewpoint of improving the heat resistance and light resistance of the cured product.
- the said weight average molecular weight of siloxane derivative (I) is computed from the molecular weight of standard polystyrene conversion measured by GPC (gel permeation chromatography) method.
- the number of epoxy groups in the molecule of the siloxane derivative (I) is not particularly limited as long as it is 2 or more. However, from the viewpoint of improving the heat resistance and light resistance of the cured product, 2 to 4 (2, 3 or 4) is preferred.
- the epoxy equivalent of the siloxane derivative (I) is not particularly limited, but is preferably 180 to 2000, more preferably 180 to 1500, and still more preferably 180 to 1000 from the viewpoint of improving the heat resistance and light resistance of the cured product. .
- the epoxy equivalent is a value measured according to JIS K7236.
- the epoxy group possessed by the siloxane derivative (I) is not particularly limited, but from the viewpoint of improving the heat resistance and light resistance of the cured product, an epoxy composed of two adjacent carbon atoms and oxygen atoms constituting the alicyclic ring.
- Group (alicyclic epoxy group) is preferable, and among them, a cyclohexene oxide group is particularly preferable.
- siloxane derivative (I) examples include a siloxane compound represented by the following formula (IV).
- R a is the same or different and represents an epoxy group-containing group or an alkyl group.
- at least two R a in formula (IV) e.g., 2 to four
- the above-mentioned group containing an epoxy group is a group containing at least one epoxy group (oxirane ring).
- a linear or branched aliphatic group having a carbon-carbon unsaturated double bond such as an alkenyl group.
- a group in which at least one double bond of a hydrocarbon group is epoxidized, or a cyclic aliphatic hydrocarbon group having a carbon-carbon unsaturated double bond for example, a cycloalkenyl group; a cyclohexenylethyl group, etc.
- a group in which at least one double bond of the alkenylalkyl group or the like is epoxidized is epoxidized.
- 1,2-epoxyethyl group epoxy group
- 1,2-epoxypropyl group 2,3-epoxypropyl group
- 2,3-epoxy-2-methylpropyl Groups methyl glycidyl group
- 3,4-epoxybutyl group 3-glycidyloxypropyl group, 3,4-epoxycyclohexylmethyl group, 2- (3,4-epoxycyclohexyl) ethyl group and the like.
- a group in which at least one double bond of a cyclic aliphatic hydrocarbon group having a carbon-carbon unsaturated double bond is epoxidized is preferable.
- alkyl group examples include straight-chain or branched chain groups having 1 to 20 carbon atoms such as methyl group, ethyl group, propyl group, isopropyl group, butyl group, hexyl group, octyl group, isooctyl group, decyl group, and dodecyl group.
- An alkyl group etc. are mentioned. Of these, a linear or branched alkyl group having 1 to 10 carbon atoms is preferable.
- n represents an integer of 2 to 12.
- n is preferably 4 to 8, more preferably 4 or 5, from the viewpoint of thermal shock resistance of the cured product, reflow resistance and thermal shock resistance of the optical semiconductor device.
- examples of the siloxane derivative (I) include 2,4-di [2- (3- ⁇ oxabicyclo [4.1.0] heptyl ⁇ ) ethyl] -2,4,6,6. , 8,8-Hexamethyl-cyclotetrasiloxane, 4,8-di [2- (3- ⁇ oxabicyclo [4.1.0] heptyl ⁇ ) ethyl] -2,2,4,6,6,8- Hexamethyl-cyclotetrasiloxane, 2,4-di [2- (3- ⁇ oxabicyclo [4.1.0] heptyl ⁇ ) ethyl] -6,8-dipropyl-2,4,6,8-tetramethyl- Cyclotetrasiloxane, 4,8-di [2- (3- ⁇ oxabicyclo [4.1.0] heptyl ⁇ ) ethyl] -2,6-dipropyl-2,4,6,8-tetramethyl-cyclotetra
- siloxane derivative (I) examples include alicyclic epoxy group-containing silicone resins described in JP-A-2008-248169 and at least two epoxy resins in one molecule described in JP-A-2008-19422.
- An organopolysilsesquioxane resin having a functional group can also be used.
- the siloxane derivative (I) can be used alone or in combination of two or more.
- Siloxane derivatives (I) are, for example, trade names “X-40-2678”, “X-40-2670”, “X-40-2720” (and above) which are cyclic siloxanes having two or more epoxy groups in the molecule. Commercial products such as Shin-Etsu Chemical Co., Ltd.) are available.
- the siloxane derivative (I) can be produced by a known or conventional method.
- the content (blending amount) of the siloxane derivative (I) in the curable resin composition of the present invention is preferably 0.1 to 30% by weight, more preferably relative to the curable resin composition (100% by weight). It is 0.5 to 20% by weight, more preferably 1.0 to 10% by weight.
- the content (blending amount) of the siloxane derivative (I) in the curable resin composition of the present invention is not particularly limited, but with respect to 100 parts by weight of the total amount of compounds having an epoxy group contained in the curable resin composition, The amount is preferably 5 to 99 parts by weight, more preferably 10 to 95 parts by weight, and still more preferably 20 to 80 parts by weight.
- the amount is preferably 5 to 99 parts by weight, more preferably 10 to 95 parts by weight, and still more preferably 20 to 80 parts by weight.
- the curable resin composition of the present invention may further contain a release agent.
- a release agent By including a release agent, continuous molding by a molding method using a mold such as transfer molding is facilitated, and a cured product (reflector) can be produced with high productivity.
- a known or commonly used release agent can be used, and is not particularly limited.
- a fluorine-based release agent fluorine atom-containing compound
- Silicone release agents silicone compounds; for example, silicone oil, silicone wax, silicone resin, polyorganosiloxane having polyoxyalkylene units
- wax release agents wax release agents
- animal waxes such as wool wax, paraffins such as paraffin wax, polyethylene wax, oxidized polyethylene wax, etc.
- higher fatty acids or salts thereof for example, metal salts
- higher fatty acid esters higher fatty acid amides, mineral oils, etc.
- one type of release agent can be used alone, or two or more types can be used in combination.
- a mold release agent can also be manufactured by a well-known thru
- the content (blending amount) of the release agent is not particularly limited, but the total amount of compounds having epoxy groups contained in the curable resin composition is 100.
- the amount is preferably 1 to 12 parts by weight, more preferably 2 to 10 parts by weight with respect to parts by weight.
- content of a mold release agent 1 weight part or more there exists a tendency which the mold release property of hardened
- the content of the release agent is 12 parts by weight or less, there is a tendency that good adhesion to the lead frame of the reflector in the substrate for mounting an optical semiconductor element can be secured.
- the curable resin composition of the present invention may contain an antioxidant.
- an antioxidant By containing an antioxidant, it becomes possible to produce a cured product (reflector) with even better heat resistance.
- known or commonly used antioxidants can be used, and are not particularly limited. For example, phenolic antioxidants (phenolic compounds), hindered amine antioxidants (hindered amine compounds), phosphorus System antioxidants (phosphorus compounds), sulfur antioxidants (sulfur compounds), and the like.
- phenolic antioxidants examples include 2,6-di-t-butyl-p-cresol, butylated hydroxyanisole, 2,6-di-t-butyl-p-ethylphenol, stearyl- ⁇ - (3 , 5-di-tert-butyl-4-hydroxyphenyl) propionate and the like; 2,2′-methylenebis (4-methyl-6-tert-butylphenol), 2,2′-methylenebis (4-ethyl- 6-t-butylphenol), 4,4'-thiobis (3-methyl-6-t-butylphenol), 4,4'-butylidenebis (3-methyl-6-t-butylphenol), 3,9-bis [1 , 1-Dimethyl-2- ⁇ - (3-tert-butyl-4-hydroxy-5-methylphenyl) propionyloxy ⁇ ethyl] 2,4,8,10-tetraoxaspir [5.5] Bisphenols such as undecane; 1,1,3-tris (2-methyl-4-hydroxy
- hindered amine antioxidants include bis (1,2,2,6,6-pentamethyl-4-piperidyl) [[3,5-bis (1,1-dimethylethyl) -4-hydroxyphenyl] methyl. ] Butyl malonate, bis (1,2,2,6,6-pentamethyl-4-piperidyl) sebacate, methyl-1,2,2,6,6-pentamethyl-4-piperidyl sebacate, 4-benzoyloxy- Examples include 2,2,6,6-tetramethylpiperidine.
- phosphorus antioxidants include triphenyl phosphite, diphenylisodecyl phosphite, phenyl diisodecyl phosphite, tris (nonylphenyl) phosphite, diisodecylpentaerythritol phosphite, tris (2,4-di-t- Butylphenyl) phosphite, cyclic neopentanetetrayl bis (octadecyl) phosphite, cyclic neopentanetetrayl bis (2,4-di-t-butylphenyl) phosphite, cyclic neopentanetetrayl bis (2 , 4-di-tert-butyl-4-methylphenyl) phosphite, bis [2-tert-butyl-6-methyl-4- ⁇ 2- (octade
- sulfur-based antioxidant examples include dodecanethiol, dilauryl-3,3′-thiodipropionate, dimyristyl-3,3′-thiodipropionate, distearyl-3,3′-thiodipropionate Is mentioned.
- the antioxidant can be used alone or in combination of two or more.
- Antioxidants can also be produced by known or conventional methods. For example, trade names “Irganox 1010” (manufactured by BASF, phenolic antioxidants), trade names “AO-60”, “AO-80”.
- the content (blending amount) of the antioxidant is not particularly limited, but the total amount of compounds having an epoxy group contained in the curable resin composition is 100.
- the amount is preferably 0.1 to 5 parts by weight, more preferably 0.5 to 3 parts by weight with respect to parts by weight.
- the curable resin composition of the present invention may contain various additives in addition to the above-described components as long as the effects of the present invention are not impaired.
- a compound having a hydroxy group especially an aliphatic polyhydric alcohol
- ethylene glycol, diethylene glycol, propylene glycol, or glycerin is contained as the additive, the reaction can be allowed to proceed slowly.
- antifoaming agents, leveling agents, silane coupling agents such as ⁇ -glycidoxypropyltrimethoxysilane and 3-mercaptopropyltrimethoxysilane, and surfactants, as long as the viscosity and light reflectivity are not impaired.
- Conventional additives such as flame retardants, colorants, ion adsorbents, ultraviolet absorbers, light stabilizers, and pigments other than the white pigment (C) can be used.
- the content of these additives is not particularly limited and can be appropriately selected.
- the curable resin composition of the present invention comprises an alicyclic epoxy compound (A), rubber particles (B), a white pigment (C), an inorganic filler (D), a curing agent (E), and a curing accelerator (F). , Isocyanuric acid derivative (H), and siloxane derivative (I), alicyclic epoxy compound (A), rubber particle (B), curing agent (E), curing accelerator (F), isocyanuric acid derivative
- the viscosity at 25 ° C. of the mixture comprising (H) and the siloxane derivative (I) is not particularly limited, but is preferably 5000 mPa ⁇ s or less.
- the curable resin composition of the present invention may contain the above-described aliphatic polyhydric alcohol such as ethylene glycol.
- the above-described mixture includes the alicyclic epoxy compound (A), rubber particles ( B), a curing agent (E), a curing accelerator (F), an isocyanuric acid derivative (H), a siloxane derivative (I), and an aliphatic polyhydric alcohol.
- the curable resin composition of the present invention comprises an alicyclic epoxy compound (A), rubber particles (B), a white pigment (C), an inorganic filler (D), a curing catalyst (G), an isocyanuric acid derivative (
- a siloxane derivative (I) it comprises an alicyclic epoxy compound (A), rubber particles (B), a curing catalyst (G), an isocyanuric acid derivative (H), and a siloxane derivative (I).
- the viscosity of the mixture at 25 ° C. is not particularly limited, but is preferably 5000 mPa ⁇ s or less. In the present specification, the viscosity at 25 ° C. of the above-mentioned two kinds of mixtures may be collectively referred to as “resin viscosity”.
- the resin viscosity is a viscosity measured at 25 ° C. at normal pressure.
- the resin viscosity is preferably 5000 mPa ⁇ s or less, more preferably 4000 mPa ⁇ s or less, further preferably 3500 mPa ⁇ s or less, and particularly preferably 3000 mPa ⁇ s or less.
- the resin viscosity is 5000 mPa ⁇ s or less, the heat resistance, light resistance, and crack resistance (particularly excellent heat resistance) of the cured product tend to be more excellent than when the resin viscosity exceeds 5000 mPa ⁇ s. is there.
- the resin viscosity is relatively low, it is possible to increase the content of other components such as white pigment (C) and inorganic filler (D), and the light reflectivity, heat resistance and light resistance of the cured product. There is a tendency for sex to be further improved.
- the lower limit of the resin viscosity is, for example, 100 mPa ⁇ s or more.
- the resin viscosity is measured using, for example, a digital viscometer (model number “DVU-EII type”, manufactured by Tokimec Co., Ltd.), rotor: standard 1 ° 34 ′ ⁇ R24, temperature: 25 ° C., rotational speed: 0 It can be measured under the condition of 5 to 10 rpm.
- the resin viscosity is, for example, the components used (for example, alicyclic epoxy compound (A), curing agent (E), curing accelerator (F), curing catalyst (G), isocyanuric acid derivative (H), and siloxane derivative. (I), etc.) can be easily obtained by using a liquid component at 25 ° C.
- a solid component may be used as said component at 25 degreeC, the content is adjusted so that the said resin viscosity may be 5000 mPa * s or less.
- the curable resin composition of the present invention is obtained by heating and reacting a part of the alicyclic epoxy compound (A) and the curing agent (E) in the curable resin composition to be a B-stage. It may be a curable resin composition (a curable resin composition in a B-stage state).
- the curable resin composition of the present invention is excellent in light reflectivity, heat resistance and light resistance after curing, it can be preferably used particularly as a resin composition for transfer molding or a resin composition for compression molding.
- the curable resin composition of the present invention is particularly excellent in the light reflectivity, heat resistance, and light resistance of a cured product (reflector) formed by compression molding, and thus is particularly a resin composition for compression molding. preferable.
- the curable resin composition of the present invention is not particularly limited, but can be prepared by stirring and mixing each of the above components in a heated state as necessary.
- the curable resin composition of the present invention can be used as a one-component composition in which each component is mixed in advance, for example, two or more stored separately. It can also be used as a multi-component (for example, two-component) composition in which the components are mixed at a predetermined ratio before use.
- the stirring / mixing method is not particularly limited, and for example, known or conventional stirring / mixing means such as various mixers such as a dissolver and a homogenizer, a kneader, a roll, a bead mill, a self-revolving stirrer and the like can be used. Further, after stirring and mixing, defoaming may be performed under vacuum.
- the rubber particles (B) are blended in a state of being preliminarily dispersed in the alicyclic epoxy compound (A) (the composition may be referred to as “rubber particle dispersed epoxy compound”). It is preferable to do. That is, the curable resin composition of the present invention includes the rubber particle-dispersed epoxy compound, the white pigment (C), the inorganic filler (D), the curing agent (E) and the curing accelerator (F), or It is preferable to prepare by mixing the curing catalyst (G) and other components as necessary. Such a preparation method can particularly improve the dispersibility of the rubber particles (B) in the curable resin composition.
- the blending method of the rubber particles (B) is not limited to the above method, and may be a method of blending alone.
- the rubber particle-dispersed epoxy compound is obtained by dispersing rubber particles (B) in an alicyclic epoxy compound (A).
- the alicyclic epoxy compound (A) in the rubber particle-dispersed epoxy compound may be the total amount or a partial amount of the alicyclic epoxy compound (A) constituting the curable resin composition. May be.
- the rubber particles (B) in the rubber particle-dispersed epoxy compound may be the total amount or a partial amount of the rubber particles (B) constituting the curable resin composition.
- the viscosity of the rubber particle-dispersed epoxy compound can be adjusted, for example, by using a reactive diluent together (that is, the rubber particle-dispersed epoxy compound may further contain a reactive diluent).
- a reactive diluent for example, an aliphatic polyglycidyl ether having a viscosity at room temperature (25 ° C.) of 200 mPa ⁇ s or less can be preferably used.
- Examples of the aliphatic polyglycidyl ether having a viscosity (25 ° C.) of 200 mPa ⁇ s or less include cyclohexanedimethanol diglycidyl ether, cyclohexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, and 1,6-hexanediol diglycidyl ether. , Trimethylolpropane triglycidyl ether, polypropylene glycol diglycidyl ether, and the like.
- the amount of the reactive diluent used can be appropriately adjusted and is not particularly limited, but is preferably 30 parts by weight or less, more preferably 25 parts by weight or less, with respect to 100 parts by weight of the total amount of the rubber particle-dispersed epoxy compound. (For example, 5 to 25 parts by weight). When the amount used is 30 parts by weight or less, desired performance such as improvement of toughness (crack resistance) tends to be easily obtained.
- the method for producing the rubber particle-dispersed epoxy compound is not particularly limited, and a well-known and commonly used method can be used. For example, after the rubber particles (B) are dehydrated and dried to form a powder, the rubber particles (B) are mixed and dispersed in the alicyclic epoxy compound (A), or the emulsion of the rubber particles (B) and the alicyclic epoxy compound (A And the like, followed by dehydration and the like.
- the viscosity of the curable resin composition of the present invention at 25 ° C. is not particularly limited, but is preferably 100 to 1000000 mPa ⁇ s, more preferably 200 to 800000 mPa ⁇ s, and still more preferably 300 to 800000 mPa ⁇ s.
- the viscosity at 25 ° C. is set to 100 mPa ⁇ s or more, workability during casting is improved, and heat resistance and light resistance of the cured product tend to be further improved.
- the viscosity at 25 ° C. is set to 1000000 mPa ⁇ s or less, workability during casting is improved, and defects due to casting defects tend not to occur in the cured product.
- cured product of the present invention By curing the curable resin composition of the present invention by heating, a cured product having excellent light reflectivity and excellent heat resistance, light resistance, and crack resistance can be obtained.
- a cured product obtained by curing the curable resin composition of the present invention that is, a cured product of the curable resin composition of the present invention may be referred to as “cured product of the present invention”.
- the heating temperature (curing temperature) during curing is not particularly limited, but is preferably 50 to 200 ° C, more preferably 80 to 180 ° C.
- the heating time (curing time) at the time of curing is not particularly limited, but is preferably 60 to 1800 seconds, and more preferably 90 to 900 seconds.
- the curing conditions depend on various conditions, for example, when the curing temperature is increased, the curing time can be shortened, and when the curing temperature is decreased, the curing time can be appropriately increased. Further, the curing process may be performed in one stage (for example, compression molding only), for example, in multiple stages (for example, further heating in an oven or the like as post-curing (secondary curing) after compression molding). Also good.
- the heating temperature at this time is preferably 50 to 200 ° C., more preferably 60 to 180 ° C., and more preferably about the same as the curing temperature.
- the post-curing time is preferably 0.5 to 10 hours, more preferably 1 to 8 hours.
- the cured product of the present invention has high light reflectivity and is excellent in heat resistance and light resistance. For this reason, the said hardened
- the reflectance (initial reflectance) of the cured product of the present invention is not particularly limited.
- the reflectance of light having a wavelength of 450 nm is preferably 93% or more, more preferably 94% or more, and still more preferably. 95% or more.
- the reflectance of light at 450 to 800 nm is preferably 93% or more, more preferably 94% or more, and still more preferably 95% or more.
- the retention ratio of the light reflectance at a wavelength of 450 nm after heating for 250 hours at 120 ° C. (sometimes referred to as “reflectance after heat aging”) to the initial reflectance ([heat aging (Reflectance after) / [Initial reflectance] ⁇ 100) is not particularly limited, but is preferably 80% or more, more preferably 85% or more, and further preferably 90% or more.
- the retention in the case of 450 to 800 nm light is preferably 80% or more, more preferably 85% or more, and further preferably 90% or more.
- the curable resin composition of the present invention the cured product formed by compression molding can have the above-mentioned retention rate of 90% or more.
- Maintaining the reflectance of the cured product of the present invention with respect to light having a wavelength of 450 nm after irradiation with ultraviolet rays having an intensity of 10 mW / cm 2 for 250 hours (sometimes referred to as “reflectance after ultraviolet ray aging”) relative to the initial reflectance.
- the rate ([reflectance after ultraviolet ray aging] / [initial reflectivity] ⁇ 100) is not particularly limited, but is preferably 80% or more, more preferably 85% or more, and further preferably 90% or more.
- the retention in the case of 450 to 800 nm light is preferably 80% or more, more preferably 85% or more, and further preferably 90% or more.
- the reflectance is measured using, for example, a spectrophotometer (trade name “spectrophotometer UV-2450”, manufactured by Shimadzu Corporation) using the cured product of the present invention (thickness: 3 mm) as a test piece. can do.
- a spectrophotometer trade name “spectrophotometer UV-2450”, manufactured by Shimadzu Corporation
- the curable resin composition of the present invention is a curable resin composition for a reflector in an optical semiconductor device
- the curable resin composition of the present invention is a substrate of an optical semiconductor element (for mounting an optical semiconductor element) in an optical semiconductor device.
- This is a molding material (material used for molding with a mold or the like) used for forming a reflector (light reflecting member) included in the substrate. Therefore, by molding (and curing) the curable resin composition of the present invention, it has high light reflectivity, excellent heat resistance and light resistance, and has a high-quality reflector having excellent crack resistance.
- a substrate for mounting an optical semiconductor element (for example, highly durable) can be manufactured.
- the reflector is a member for reflecting light emitted from the optical semiconductor element in the optical semiconductor device to increase the directivity and luminance of the light and improve the light extraction efficiency.
- a substrate used for mounting an optical semiconductor element having at least a reflector formed of the cured product of the present invention may be referred to as “optical semiconductor element mounting substrate of the present invention”.
- the substrate for mounting an optical semiconductor element of the present invention is a reflector (white reflector) formed of a cured product of the curable resin composition of the present invention (cured product obtained by curing the curable resin composition of the present invention).
- a substrate having at least FIG. 1 is a schematic view showing an example of a substrate for mounting an optical semiconductor element of the present invention, where (a) is a perspective view and (b) is a cross-sectional view.
- 100 is a white reflector
- 101 is a metal wiring (lead frame)
- 102 is an optical semiconductor element mounting region
- 103 is a package substrate.
- a metal wiring 101 and a white reflector 100 are attached to the package substrate 103.
- An optical semiconductor element 107 is placed in the center (optical semiconductor element mounting region 102) and die-bonded. And the metal wiring 101 on the package substrate 103 are connected by wire bonding.
- As the material of the package substrate 103 resin, ceramic, or the like is used, but it may be the same as the white reflector.
- the upper white reflector 100 in the optical semiconductor element mounting substrate of the present invention has a concave shape that surrounds the optical semiconductor element mounting region 102 in an annular shape and is inclined so that the diameter of the ring increases upward. Have.
- the substrate for mounting an optical semiconductor element of the present invention is only required to have the inner surface of the concave shape formed of at least a cured product of the curable resin composition of the present invention. Further, as shown in FIG.
- the portion surrounded by the metal wiring 101 may be the package substrate 103 or the white reflector 100 (that is, “100/103 in FIG. 1). "Means the white reflector 100 or the package substrate 103).
- the optical semiconductor element mounting substrate of the present invention is not limited to the embodiment shown in FIG.
- a known or conventional molding method for example, compression molding or the like
- examples include a method of subjecting the functional resin composition to various molding methods such as transfer molding, compression molding, injection molding, LIM molding (injection molding), and dam molding by dispensing.
- the curing conditions for forming the reflector can be appropriately selected from, for example, the conditions for forming the cured product described above. In the present invention, among other things, it is possible to prevent foaming due to a rapid curing reaction, relax stress strain due to curing, and improve toughness (crack resistance). It is preferable to cure it.
- the optical semiconductor device of the present invention can be obtained by using the optical semiconductor element mounting substrate of the present invention as a substrate in an optical semiconductor device and mounting the optical semiconductor element on the substrate.
- the optical semiconductor device of the present invention is an optical semiconductor device comprising at least an optical semiconductor element as a light source and a reflector (reflecting material) made of a cured product of the curable resin composition of the present invention. More specifically, the optical semiconductor device of the present invention is an optical semiconductor device having at least the optical semiconductor element mounting substrate of the present invention and an optical semiconductor element mounted on the substrate. Since the optical semiconductor device of the present invention has a reflector formed of a cured product of the curable resin composition of the present invention as a reflector, the luminance of light is unlikely to decrease with time and the reliability is high.
- FIG. 2 is a schematic view (cross-sectional view) showing an example of the optical semiconductor device of the present invention. In FIG.
- 100 is a white reflector
- 101 is a metal wiring (lead frame)
- 103 is a package substrate
- 104 is a bonding wire
- 105 is a sealing material
- 106 is die bonding
- 107 is an optical semiconductor element (LED element).
- the light emitted from the optical semiconductor element 107 is reflected by the surface (reflecting surface) of the white reflector 100, so that the light from the optical semiconductor element 107 is extracted with high efficiency.
- the optical semiconductor element in the optical semiconductor device of the present invention is usually sealed with a transparent sealing material (105 in FIG. 2).
- FIGS. 3 and 4 are diagrams showing another example of the optical semiconductor device of the present invention.
- Reference numeral 108 in FIGS. 3 and 4 denotes a heat sink (case heat sink), and by having such a heat sink 108, the heat radiation efficiency in the optical semiconductor device is improved.
- FIG. 3 is an example in which the heat dissipation path of the heat sink is located immediately below the optical semiconductor element
- FIG. 4 is an example in which the heat dissipation path of the heat sink is positioned in the lateral direction of the optical semiconductor device [(a) is a top view, (B) shows a cross-sectional view along AA ′ in (a)].
- the heat sink 108 protruding from the side surface of the optical semiconductor device in FIG. 4 may be referred to as a heat radiating fin.
- reference numeral 109 in FIG. 4 denotes a cathode mark.
- the optical semiconductor device of the present invention is not limited to the embodiment shown in FIGS.
- the present invention will be described in more detail based on examples, but the present invention is not limited to these examples.
- the unit of the amount of each component of the curable resin composition is parts by weight.
- “-” means that the component was not blended.
- Production Example 1 Manufacture of rubber particles
- 500 g of ion-exchanged water and 0.68 g of sodium dioctylsulfosuccinate were charged, and the temperature was raised to 80 ° C. while stirring under a nitrogen stream.
- a monomer mixture composed of 9.5 g of butyl acrylate, 2.57 g of styrene, and 0.39 g of divinylbenzene corresponding to about 5% by weight of the amount required to form the core portion of the rubber particles.
- the obtained latex was frozen at ⁇ 30 ° C., dehydrated and washed with a suction filter, and then blown and dried at 60 ° C. overnight to obtain rubber particles.
- the resulting rubber particles had an average particle size of 108 nm and a maximum particle size of 289 nm.
- the average particle size and the maximum particle size of the rubber particles are determined based on a nanotrac TM particle size distribution measuring device (trade name “UPA-EX150”, manufactured by Nikkiso Co., Ltd.) using the dynamic light scattering method as a measurement principle. ) was used to measure the sample, and in the obtained particle size distribution curve, the average particle size, which is the particle size when the cumulative curve becomes 50%, is the average particle size, and the frequency (%) of the particle size distribution measurement result is 0 The maximum particle size at the time of exceeding 0.000 was defined as the maximum particle size.
- a nanotrac TM particle size distribution measuring device (trade name “UPA-EX150”, manufactured by Nikkiso Co., Ltd.) using the dynamic light scattering method as a measurement principle. ) was used to measure the sample, and in the obtained particle size distribution curve, the average particle size, which is the particle size when the cumulative curve becomes 50%, is the average particle size, and the frequency (%) of the particle size distribution measurement result is 0
- Production Example 2 Manufacture of rubber particle-dispersed epoxy compounds
- the product name “Celoxide 2021P” (3,4-epoxycyclohexylmethyl (3,4) -Epoxy) cyclohexanecarboxylate (manufactured by Daicel Corporation) and dispersed in 100 parts by weight (1000 rpm, 60 minutes) and vacuum degassed to obtain a rubber particle-dispersed epoxy compound (viscosity at 25 ° C .: 1036 mPa ⁇ s). It was. The viscosity at 25 ° C.
- Example 1 According to the blending ratio (unit: parts by weight) shown in Table 1, the rubber particle-dispersed epoxy compound obtained in Production Example 2, isocyanuric acid derivative (monoallyl diglycidyl isocyanurate; trade name “MA-DGIC”, Shikoku Kasei Kogyo Co., Ltd. ), A siloxane derivative (a siloxane derivative having two epoxy groups in the molecule; a trade name “X-40-2678”, a self-revolving stirrer (a trade name “Awatori Nerita AR-250”, The mixture was uniformly mixed and defoamed using a product manufactured by Shinky Co., Ltd., and the mixture was stirred at 80 ° C. for 1 hour in order to dissolve the MA-DGIC.
- isocyanuric acid derivative diallyl diglycidyl isocyanurate
- MA-DGIC Shikoku Kasei Kogyo Co., Ltd.
- a siloxane derivative a siloxane derivative having two epoxy groups in the
- the kneaded product obtained above and the curing agent composition obtained in Production Example 3 so as to have the blending ratio (unit: parts by weight) shown in Table 1 were mixed with a self-revolving stirrer (trade name “Awatori”
- the mixture was uniformly mixed (2000 rpm, 5 minutes) using Nertaro AR-250 "(Sinky Corp.) and defoamed to obtain a curable resin composition.
- the curable resin composition is sandwiched between release films made of polyester, placed in a mold for compression molding at 150 ° C., heated and pressurized at a pressure of 3.0 MPa for 600 seconds, and then post-cured (5 at 150 ° C. Time), a cured product was obtained.
- Examples 2 to 14 and Comparative Examples 1 to 15 A cured product was obtained in the same manner as in Example 1 except that the composition of the curable resin composition was changed as shown in Table 1 or Table 2.
- the alicyclic ring shown in Table 1 or Table 2 is used instead of or in addition to the rubber particle-dispersed epoxy compound obtained in Production Example 2.
- the formula epoxy compound was used.
- Example 15 According to the blending ratio (unit: parts by weight) shown in Table 1, the rubber particle-dispersed epoxy compound obtained in Production Example 2, isocyanuric acid derivative (monoallyl diglycidyl isocyanurate; trade name “MA-DGIC”, Shikoku Kasei Kogyo Co., Ltd. )), A siloxane derivative (a siloxane derivative having two epoxy groups in the molecule; trade name “X-40-2678”, manufactured by Shin-Etsu Chemical Co., Ltd.), a self-revolving stirrer (trade name “Awatori” Using Nertaro AR-250 "(manufactured by Shinky Co., Ltd.), the mixture was uniformly mixed and defoamed to prepare a mixture.
- isocyanuric acid derivative diallyl diglycidyl isocyanurate
- MA-DGIC Shikoku Kasei Kogyo Co., Ltd.
- a siloxane derivative a siloxane derivative having two epoxy groups in the
- the curing catalyst trade name “Sun-Aid SI-100L”, manufactured by Sanshin Chemical Industry Co., Ltd.
- a self-revolving stirrer trade name “Awatori Nertaro AR-250”, manufactured by Shinky Co., Ltd.
- uniformly mix 2000 rpm, 5 minutes
- defoam and curable resin composition Obtained.
- the curable resin composition is sandwiched between release films made of polyester, placed in a mold for compression molding at 150 ° C., heated and pressurized at a pressure of 3.0 MPa for 600 seconds, and then post-cured (5 at 150 ° C. Time), a cured product was obtained.
- Example 16 and Comparative Examples 16 to 24 A cured product was obtained in the same manner as in Example 15 except that the composition of the curable resin composition was changed as shown in Tables 1 and 3. In some examples and comparative examples, the alicyclic rings shown in Table 1 or Table 3 are used instead of or in addition to the rubber particle-dispersed epoxy compound obtained in Production Example 2 as a constituent of the curable resin composition. The formula epoxy compound was used.
- MA-DGIC Trade name “MA-DGIC” [monoallyl diglycidyl isocyanurate], Shikoku Kasei Kogyo DA- MGIC: Trade name “DA-MGIC” [diallyl monoglycidyl isocyanurate], manufactured by Shikoku Chemicals Co., Ltd.
- X-40-2678 Trade name “X-40-2678” (siloxane derivative having two epoxy groups in the molecule), Shin-Etsu Chemical Co., Ltd.
- X-40-2720 Trade name “X-40-2720” "(Siloxane derivative having three epoxy groups in the molecule), X-40-2670 manufactured by Shin-Etsu Chemical Co., Ltd .: trade name” X-40-2670 "(siloxane derivative having four epoxy groups in the molecule) , Shin-Etsu Chemical Co., Ltd. (curing agent composition) MH-700: Trade name “Licacid MH-700” (4-methylhexahydrophthalic anhydride / hexahydrophthalic anhydride), manufactured by Shin Nippon Rika Co., Ltd. 18X: Trade name “U-CAT 18X” (curing accelerator) , San Apro Co., Ltd.
- Ethylene glycol Trade name “Ethylene glycol”, Wako Pure Chemical Industries, Ltd.
- curing catalyst Sun-Aid SI-100L: Trade name “Sun-Aid SI-100L”, manufactured by Sanshin Chemical Industry Co., Ltd.
- white pigment DCF-T-17050: Trade name “DCF-T-17050” (titanium oxide, average particle size 0.3 ⁇ m, maximum particle size 1 ⁇ m or less), manufactured by Resino Color Industry Co., Ltd.
- FB-970FD Trade name “FB-970FD” (silica, no surface treatment, average particle size 16.7 ⁇ m, maximum particle size 70 ⁇ m), manufactured by Denka Corp.
- DAW-1025 Trade name “DAW-1025” (alumina, (Average particle size 7.9 ⁇ m, maximum particle size 32 ⁇ m), manufactured by Denka Co., Ltd.
- HF-05 trade name “HF-05” (alumina nitride, average particle size 5 ⁇ m, maximum particle size 5 ⁇ m), manufactured by Denka Co., Ltd.
- the curable resin composition of the present invention has the above-described configuration, it can form a cured product having high light reflectivity, excellent heat resistance and light resistance, and light reflectivity hardly decreasing over time. Especially, when the cured product is formed by compression molding, the above-mentioned effect is remarkably exhibited. Therefore, it is possible to provide a highly reliable optical semiconductor device in which the luminance of light hardly decreases over time.
- White reflector 101 Metal wiring (electrode) 102: Mounting area of optical semiconductor element 103: Package substrate 104: Bonding wire 105: Sealing material for optical semiconductor element 106: Die bonding 107: Optical semiconductor element 108: Heat sink 109: Cathode mark
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Abstract
Description
本発明は、光反射用硬化性樹脂組成物及びその硬化物、該硬化物により形成されたリフレクターと光半導体素子とを有する光半導体装置に関する。本願は、2016年2月12日に日本に出願した、特願2016-025329号の優先権を主張し、その内容をここに援用する。 The present invention relates to a light-reflective curable resin composition and a cured product thereof, and an optical semiconductor device having a reflector formed of the cured product and an optical semiconductor element. This application claims the priority of Japanese Patent Application No. 2016-025329 for which it applied to Japan on February 12, 2016, and uses the content here.
近年、各種の屋内又は屋外表示板、画像読み取り用光源、交通信号、大型ディスプレイ用ユニット等においては、光半導体素子(LED素子)を光源とする発光装置(光半導体装置)の採用が進んでいる。このような光半導体装置としては、一般に、基板(光半導体素子搭載用基板)上に光半導体素子が搭載され、さらに該光半導体素子が透明な封止材により封止された光半導体装置が普及している。このような光半導体装置における基板には、光半導体素子から発せられる光の取り出し効率を高めるため、光を反射させるための部材(リフレクター)が形成されている。 2. Description of the Related Art In recent years, in various indoor or outdoor display boards, image reading light sources, traffic signals, large display units, etc., light emitting devices (optical semiconductor devices) using optical semiconductor elements (LED elements) as light sources have been increasingly adopted. . As such an optical semiconductor device, in general, an optical semiconductor device in which an optical semiconductor element is mounted on a substrate (substrate for mounting an optical semiconductor element) and the optical semiconductor element is sealed with a transparent sealing material is widespread. is doing. On the substrate in such an optical semiconductor device, a member (reflector) for reflecting light is formed in order to improve the extraction efficiency of light emitted from the optical semiconductor element.
上記リフレクターには、高い光反射性を有することが求められている。従来、上記リフレクターの構成材としては、例えば、テレフタル酸単位を必須の構成単位とするポリアミド樹脂(ポリフタルアミド樹脂)中に、無機充填剤等を分散させた樹脂組成物等が知られている(特許文献1~3参照)。 The reflector is required to have high light reflectivity. Conventionally, as a constituent material of the reflector, for example, a resin composition in which an inorganic filler or the like is dispersed in a polyamide resin (polyphthalamide resin) having a terephthalic acid unit as an essential constituent unit is known. (See Patent Documents 1 to 3).
また、上記リフレクターの構成材としては、その他に、例えば、エポキシ樹脂を含む熱硬化性樹脂と、屈折率1.6~3.0の無機酸化物とを特定割合で含有する光反射用熱硬化性樹脂組成物が知られている(特許文献4参照)。さらに、例えば、熱硬化性樹脂成分と1以上の充填剤成分とを含有し、熱硬化性樹脂成分全体の屈折率と各充填剤成分の屈折率との差、及び、各充填剤成分の体積割合より算出されるパラメータを特定範囲に制御した光反射用熱硬化性樹脂組成物が知られている(特許文献5参照)。 In addition, as the constituent material of the reflector, for example, a thermosetting resin for light reflection containing a specific ratio of a thermosetting resin containing an epoxy resin and an inorganic oxide having a refractive index of 1.6 to 3.0, for example. Resin compositions are known (see Patent Document 4). Furthermore, for example, it contains a thermosetting resin component and one or more filler components, the difference between the refractive index of the entire thermosetting resin component and the refractive index of each filler component, and the volume of each filler component There is known a thermosetting resin composition for light reflection in which a parameter calculated from a ratio is controlled within a specific range (see Patent Document 5).
上述の特許文献1~5に記載の材料より作製したリフレクターは、高出力の青色光半導体や白色光半導体を光源とする光半導体装置において、半導体素子から発せられる光や熱によって経時で黄変する等して劣化し、光反射性が経時で低下するという問題を有していた。さらに、鉛フリーはんだの採用に伴い、発光装置の製造の際のリフロー工程(はんだリフロー工程)における加熱温度がより高くなる傾向にあり、このような製造工程において加わる熱によっても上記リフレクターが経時で劣化し、光反射性が低下するという問題も発生していた。 Reflectors made from the materials described in Patent Documents 1 to 5 described above are yellowed over time due to light and heat emitted from a semiconductor element in an optical semiconductor device using a high-power blue light semiconductor or white light semiconductor as a light source. Etc., and the light reflectivity decreases with time. Furthermore, with the adoption of lead-free solder, the heating temperature in the reflow process (solder reflow process) during the manufacture of the light-emitting device tends to be higher, and the reflector is also deteriorated over time due to the heat applied in such a manufacturing process. There was also a problem that the light reflectivity was deteriorated due to deterioration.
このため、より高出力、短波長の光や高温に対しても光反射性が経時で低下しにくい、耐熱性及び耐光性に優れる材料が求められているのが現状である。 For this reason, the present situation is that a material excellent in heat resistance and light resistance in which light reflectivity is less likely to deteriorate with time even for higher output, shorter wavelength light and high temperature is required.
また、上記リフレクターは、一般に、該リフレクターを形成するための材料(樹脂組成物)を、トランスファー成型やコンプレッション成型に付すことによって製造される。しかしながら、従来のリフレクターを形成するための樹脂組成物は、トランスファー成型に適したものが多いため、該樹脂組成物より形成したリフレクターは耐熱性に優れるが、コンプレッション成型により形成したリフレクターは耐熱性が比較的劣るものが多かった。 The reflector is generally manufactured by subjecting a material (resin composition) for forming the reflector to transfer molding or compression molding. However, since many resin compositions for forming conventional reflectors are suitable for transfer molding, a reflector formed from the resin composition is excellent in heat resistance, but a reflector formed by compression molding has heat resistance. Many were relatively inferior.
従って、本発明の目的は、高い光反射性を有し、且つ、耐熱性及び耐光性に優れ、光反射性が経時で低下しにくい硬化物を形成でき、特にコンプレッション成型により硬化物を形成した際に上記効果が顕著に発揮される光反射用硬化性樹脂組成物を提供することにある。
また、本発明の他の目的は、生産性に優れ、高い光反射性を有し、且つ、耐熱性及び耐光性に優れ、光反射性が経時で低下しにくい硬化物を提供することにある。
さらに、本発明の他の目的は、経時で光の輝度が低下しにくく、信頼性の高い光半導体装置を提供することにある。
Therefore, an object of the present invention is to form a cured product having high light reflectivity, excellent heat resistance and light resistance, and light reflectivity is less likely to deteriorate with time, and in particular, a cured product is formed by compression molding. It is in providing the curable resin composition for light reflections which the said effect is exhibited notably at the time.
Another object of the present invention is to provide a cured product having excellent productivity, high light reflectivity, excellent heat resistance and light resistance, and the light reflectivity is less likely to deteriorate with time. .
Furthermore, another object of the present invention is to provide a highly reliable optical semiconductor device in which the luminance of light is less likely to decrease over time.
さらに、上記リフレクターには、切削加工や温度変化(例えば、リフロー工程のような非常に高温での加熱や、冷温サイクルなど)等による応力が加わった場合に、クラック(ひび割れ)を生じにくい(このような特性を「耐クラック性」と称する場合がある)等、強靭であることが求められている。リフレクターにクラックが生じてしまうと、光反射性が低下して(即ち、光の取り出し効率が低下して)、発光装置の信頼性を担保することが困難となるためである。 Furthermore, the above reflector is less susceptible to cracking when subjected to stress due to cutting or temperature change (for example, heating at a very high temperature such as a reflow process or a cooling cycle). Such a characteristic is sometimes referred to as “crack resistance”). This is because if the reflector is cracked, the light reflectivity is lowered (that is, the light extraction efficiency is lowered), and it is difficult to ensure the reliability of the light emitting device.
本発明者らは、上記課題を解決するため鋭意検討した結果、脂環式エポキシ化合物(A)、ゴム粒子(B)、白色顔料(C)、無機充填剤(D)、硬化剤(E)、硬化促進剤(F)、分子内に1個以上のオキシラン環を有するイソシアヌル酸誘導体(H)、及び分子内に2以上のエポキシ基を有するシロキサン誘導体(I)を含み、25℃において液状である光反射用硬化性樹脂組成物、又は、脂環式エポキシ化合物(A)、ゴム粒子(B)、白色顔料(C)、無機充填剤(D)、硬化触媒(G)、分子内に1個以上のオキシラン環を有するイソシアヌル酸誘導体(H)、及び分子内に2以上のエポキシ基を有するシロキサン誘導体(I)を含み、25℃において液状である光反射用硬化性樹脂組成物が、高い光反射性を有し、且つ、耐熱性及び耐光性に優れ、光反射性が経時で低下しにくい硬化物を形成でき、特にコンプレッション成型により硬化物を形成した際に上記効果が顕著に発揮されることを見出した。本発明は、これらの知見に基づいて完成されたものである。 As a result of intensive studies to solve the above problems, the present inventors have found that the alicyclic epoxy compound (A), the rubber particles (B), the white pigment (C), the inorganic filler (D), and the curing agent (E). , A curing accelerator (F), an isocyanuric acid derivative (H) having one or more oxirane rings in the molecule, and a siloxane derivative (I) having two or more epoxy groups in the molecule, which are liquid at 25 ° C. A certain light-reflective curable resin composition, or alicyclic epoxy compound (A), rubber particles (B), white pigment (C), inorganic filler (D), curing catalyst (G), 1 in the molecule A light-reflective curable resin composition containing an isocyanuric acid derivative (H) having one or more oxirane rings and a siloxane derivative (I) having two or more epoxy groups in the molecule and being liquid at 25 ° C. is high. Light reflective and heat resistant And excellent light resistance, light reflectivity can be formed a cured product hardly decreases with time, the effect was found to be remarkably exhibited particularly when forming a cured product compression molding. The present invention has been completed based on these findings.
すなわち、本発明は、脂環式エポキシ化合物(A)、ゴム粒子(B)、白色顔料(C)、無機充填剤(D)、分子内に1個以上のオキシラン環を有するイソシアヌル酸誘導体(H)、及び分子内に2以上のエポキシ基を有するシロキサン誘導体(I)を含有し、さらに、硬化剤(E)、及び硬化促進剤(F)、又は、硬化触媒(G)を含有し、25℃において液状であることを特徴とする光反射用硬化性樹脂組成物を提供する。 That is, the present invention relates to an alicyclic epoxy compound (A), rubber particles (B), a white pigment (C), an inorganic filler (D), an isocyanuric acid derivative (H) having one or more oxirane rings in the molecule. ) And a siloxane derivative (I) having two or more epoxy groups in the molecule, and further contains a curing agent (E) and a curing accelerator (F) or a curing catalyst (G), 25 Provided is a light-reflective curable resin composition characterized by being liquid at a temperature of 0 ° C.
さらに、本発明は、前記ゴム粒子(B)が、(メタ)アクリル酸エステルを必須のモノマー成分とするポリマーで構成され、表面にヒドロキシ基及び/又はカルボキシ基を有し、前記ゴム粒子(B)の平均粒子径が10~500nmであり、最大粒子径が50~1000nmである光反射用硬化性樹脂組成物を提供する。 Further, in the present invention, the rubber particle (B) is composed of a polymer containing (meth) acrylic acid ester as an essential monomer component, and has a hydroxy group and / or a carboxy group on the surface, and the rubber particle (B Is provided with a mean particle size of 10 to 500 nm and a maximum particle size of 50 to 1000 nm.
さらに、本発明は、前記脂環式エポキシ化合物(A)が、下記式(I-1)
で表される化合物を含む光反射用硬化性樹脂組成物を提供する。
Further, according to the present invention, the alicyclic epoxy compound (A) is represented by the following formula (I-1):
The curable resin composition for light reflection containing the compound represented by these is provided.
さらに、本発明は、前記イソシアヌル酸誘導体(H)が、下記式(III-1)
[式(III-1)中、R7及びR8は、同一又は異なって、水素原子又は炭素数1~8のアルキル基を示す。]
で表される化合物である光反射用硬化性樹脂組成物を提供する。
Further, in the present invention, the isocyanuric acid derivative (H) is represented by the following formula (III-1):
[In Formula (III-1), R 7 and R 8 are the same or different and each represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. ]
The curable resin composition for light reflection which is a compound represented by these is provided.
さらに、本発明は、前記白色顔料(C)が、酸化チタン、酸化ジルコニウム、酸化亜鉛、及び硫酸バリウムからなる群より選択される少なくとも1種であり、前記無機充填剤(D)が、シリカ、アルミナ、窒化ケイ素、窒化アルミニウム、及び窒化ホウ素からなる群より選択される少なくとも1種である光反射用硬化性樹脂組成物を提供する。 Further, in the present invention, the white pigment (C) is at least one selected from the group consisting of titanium oxide, zirconium oxide, zinc oxide, and barium sulfate, and the inorganic filler (D) is silica, Provided is a curable resin composition for light reflection, which is at least one selected from the group consisting of alumina, silicon nitride, aluminum nitride, and boron nitride.
さらに、本発明は、トランスファー成型用又はコンプレッション成型用樹脂組成物である前記光反射用硬化性樹脂組成物を提供する。 Furthermore, the present invention provides the curable resin composition for light reflection, which is a resin composition for transfer molding or compression molding.
さらに、本発明は、リフレクター形成用樹脂組成物である前記光反射用硬化性樹脂組成物を提供する。 Furthermore, this invention provides the said curable resin composition for light reflections which is a resin composition for reflector formation.
また、本発明は、前記光反射用硬化性樹脂組成物の硬化物を提供する。 The present invention also provides a cured product of the light reflecting curable resin composition.
また、本発明は、光半導体素子と、前記硬化物からなるリフレクターとを少なくとも備えることを特徴とする光半導体装置を提供する。 The present invention also provides an optical semiconductor device comprising at least an optical semiconductor element and a reflector made of the cured product.
すなわち、本発明は以下に関する。
[1]脂環式エポキシ化合物(A)、ゴム粒子(B)、白色顔料(C)、無機充填剤(D)、分子内に1個以上のオキシラン環を有するイソシアヌル酸誘導体(H)、及び分子内に2以上のエポキシ基を有するシロキサン誘導体(I)を含有し、さらに、硬化剤(E)、及び硬化促進剤(F)、又は、硬化触媒(G)を含有し、25℃において液状であることを特徴とする光反射用硬化性樹脂組成物。
[2]前記ゴム粒子(B)が、ゴム弾性を有するコア部分と、該コア部分を被覆する少なくとも1層のシェル層とからなる多層構造を有するゴム粒子である[1]に記載の光反射用硬化性樹脂組成物。
[3]前記ゴム粒子(B)が、(メタ)アクリル酸エステルを必須のモノマー成分とするポリマーで構成される[1]又は[2]に記載の光反射用硬化性樹脂組成物。
[4]前記ゴム粒子(B)のゴム弾性を有するコア部分を構成するポリマーが、モノマー成分として、(メタ)アクリル酸エステルと共に、芳香族ビニル、ニトリル、及び共役ジエンからなる群より選択された一種又は二種以上を組み合わせて含む[2]又は[3]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[5]前記ゴム粒子(B)のシェル層を構成するポリマーが、モノマー成分として、(メタ)アクリル酸エステルと共に、ヒドロキシ基含有モノマー及びカルボキシ基含有モノマーからなる群より選択された一種又は二種以上を組み合わせて含む[2]~[4]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[6]前記ゴム粒子(B)が、表面にヒドロキシ基及び/又はカルボキシ基を有する[1]~[5]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[7]前記ゴム粒子(B)の平均粒子径が10~500nmであり、最大粒子径が50~1000nmである[1]~[6]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[8]前記脂環式エポキシ化合物(A)が、後述の式(I)で表される化合物を含む[1]~[7]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[9]前記脂環式エポキシ化合物(A)が、後述の式(I-1)で表される化合物を含む[1]~[8]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[10]前記イソシアヌル酸誘導体(H)が、後述の式(III)で表される化合物である[1]~[9]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[11]前記イソシアヌル酸誘導体(H)が、後述の式(III-1)で表される化合物である[1]~[10]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[12]前記シロキサン誘導体(I)が、分子内に2以上のエポキシ基を有する環状シロキサン及び/又は分子内に2以上のエポキシ基を有する直鎖状シリコーンである[1]~[11]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[13]前記白色顔料(C)が、酸化チタン、酸化ジルコニウム、酸化亜鉛、及び硫酸バリウムからなる群より選択される少なくとも1種である[1]~[12]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[14]前記無機充填剤(D)が、シリカ、アルミナ、窒化ケイ素、窒化アルミニウム、及び窒化ホウ素からなる群より選択される少なくとも1種である[1]~[13]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[15]前記シロキサン誘導体(I)が、後述の式(IV)で表されるシロキサン化合物である[1]~[14]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[16]前記脂環式エポキシ化合物(A)の含有量(配合量)が、硬化性樹脂組成物(100重量%)に対して、0.1~60重量%、0.3~50重量%、又は0.5~40重量%である[1]~[15]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[17]前記ゴム粒子(B)の含有量(配合量)が、硬化性樹脂組成物(100重量%)に対して、0.01~20重量%、0.05~15重量%、又は0.1~10重量%である[1]~[16]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[18]前記白色顔料(C)の含有量(配合量)が、硬化性樹脂組成物(100重量%)に対して、0.1~50重量%、1~40重量%、又は5~35重量%である[1]~[17]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[19]前記無機充填剤(D)の含有量(配合量)が、硬化性樹脂組成物(100重量%)に対して、10~90重量%、13~75重量%、15~70重量%、又は20~70重量%である[1]~[18]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[20]前記硬化剤(E)の含有量(配合量)が、硬化性樹脂組成物(100重量%)に対して、1~40重量%、3~35重量%、又は5~30重量%である[1]~[19]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[21]前記硬化促進剤(F)の含有量(配合量)が、硬化性樹脂組成物(100重量%)に対して、0.0001~5重量%、又は0.001~1重量%である[1]~[20]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[22]前記硬化触媒(G)の含有量(配合量)が、硬化性樹脂組成物(100重量%)に対して、0.0001~5重量%、又は0.001~1重量%である[1]~[21]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[23]前記イソシアヌル酸誘導体(H)の含有量(配合量)が、硬化性樹脂組成物(100重量%)に対して、0.05~15重量%、0.1~10重量%、又は0.3~5重量%である[1]~[22]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[24]前記シロキサン誘導体(I)の含有量(配合量)が、硬化性樹脂組成物(100重量%)に対して、0.1~30重量%、0.5~20重量%、又は1.0~10重量%である[1]~[23]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[25]トランスファー成型用又はコンプレッション成型用樹脂組成物である[1]~[24]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[26]リフレクター形成用樹脂組成物である[1]~[25]のいずれか1つに記載の光反射用硬化性樹脂組成物。
[27][1]~[26]のいずれか1つに記載の光反射用硬化性樹脂組成物の硬化物。
[28]光半導体素子と、[27]に記載の光反射用硬化性樹脂組成物の硬化物からなるリフレクターとを少なくとも備えることを特徴とする光半導体装置。
That is, the present invention relates to the following.
[1] Alicyclic epoxy compound (A), rubber particles (B), white pigment (C), inorganic filler (D), isocyanuric acid derivative (H) having one or more oxirane rings in the molecule, and Contains a siloxane derivative (I) having two or more epoxy groups in the molecule, and further contains a curing agent (E) and a curing accelerator (F) or a curing catalyst (G), and is liquid at 25 ° C. A curable resin composition for light reflection, characterized by:
[2] The light reflection according to [1], wherein the rubber particle (B) is a rubber particle having a multilayer structure including a core portion having rubber elasticity and at least one shell layer covering the core portion. Curable resin composition.
[3] The curable resin composition for light reflection according to [1] or [2], wherein the rubber particles (B) are composed of a polymer having (meth) acrylic acid ester as an essential monomer component.
[4] The polymer constituting the rubber-elastic core portion of the rubber particle (B) is selected from the group consisting of aromatic vinyl, nitrile, and conjugated diene together with (meth) acrylic acid ester as a monomer component. The curable resin composition for light reflection according to any one of [2] or [3], which includes one or a combination of two or more.
[5] The polymer constituting the shell layer of the rubber particles (B) is one or two selected from the group consisting of a hydroxy group-containing monomer and a carboxy group-containing monomer together with a (meth) acrylic acid ester as a monomer component The light-reflective curable resin composition according to any one of [2] to [4], including the above in combination.
[6] The light-reflective curable resin composition according to any one of [1] to [5], wherein the rubber particles (B) have a hydroxy group and / or a carboxy group on the surface.
[7] The light-reflective curable resin according to any one of [1] to [6], wherein the rubber particles (B) have an average particle size of 10 to 500 nm and a maximum particle size of 50 to 1000 nm. Composition.
[8] The light-reflective curable resin composition according to any one of [1] to [7], wherein the alicyclic epoxy compound (A) includes a compound represented by the following formula (I): .
[9] The light-reflective curable resin according to any one of [1] to [8], wherein the alicyclic epoxy compound (A) includes a compound represented by the following formula (I-1): Composition.
[10] The curable resin composition for light reflection according to any one of [1] to [9], wherein the isocyanuric acid derivative (H) is a compound represented by the following formula (III).
[11] The curable resin composition for light reflection according to any one of [1] to [10], wherein the isocyanuric acid derivative (H) is a compound represented by the following formula (III-1): .
[12] The siloxane derivative (I) is a cyclic siloxane having two or more epoxy groups in the molecule and / or a linear silicone having two or more epoxy groups in the molecule. The curable resin composition for light reflection as described in any one.
[13] The white pigment (C) according to any one of [1] to [12], wherein the white pigment (C) is at least one selected from the group consisting of titanium oxide, zirconium oxide, zinc oxide, and barium sulfate. Curable resin composition for light reflection.
[14] In any one of [1] to [13], the inorganic filler (D) is at least one selected from the group consisting of silica, alumina, silicon nitride, aluminum nitride, and boron nitride. The curable resin composition for light reflection as described.
[15] The curable resin composition for light reflection according to any one of [1] to [14], wherein the siloxane derivative (I) is a siloxane compound represented by the following formula (IV).
[16] The content (blending amount) of the alicyclic epoxy compound (A) is 0.1 to 60% by weight, 0.3 to 50% by weight with respect to the curable resin composition (100% by weight). Or the curable resin composition for light reflection according to any one of [1] to [15], which is 0.5 to 40% by weight.
[17] The content (blending amount) of the rubber particles (B) is 0.01 to 20% by weight, 0.05 to 15% by weight, or 0 with respect to the curable resin composition (100% by weight). The curable resin composition for light reflection according to any one of [1] to [16], which is 1 to 10% by weight.
[18] The content (blending amount) of the white pigment (C) is 0.1 to 50% by weight, 1 to 40% by weight, or 5 to 35 with respect to the curable resin composition (100% by weight). The light-reflective curable resin composition according to any one of [1] to [17], which is wt%.
[19] The content (blending amount) of the inorganic filler (D) is 10 to 90% by weight, 13 to 75% by weight, 15 to 70% by weight with respect to the curable resin composition (100% by weight). Or the curable resin composition for light reflection according to any one of [1] to [18], which is 20 to 70% by weight.
[20] The content (blending amount) of the curing agent (E) is 1 to 40% by weight, 3 to 35% by weight, or 5 to 30% by weight with respect to the curable resin composition (100% by weight). The curable resin composition for light reflection according to any one of [1] to [19].
[21] The content (blending amount) of the curing accelerator (F) is 0.0001 to 5% by weight, or 0.001 to 1% by weight with respect to the curable resin composition (100% by weight). The light-reflective curable resin composition according to any one of [1] to [20].
[22] The content (blending amount) of the curing catalyst (G) is 0.0001 to 5% by weight or 0.001 to 1% by weight with respect to the curable resin composition (100% by weight). The curable resin composition for light reflection according to any one of [1] to [21].
[23] The content (blending amount) of the isocyanuric acid derivative (H) is 0.05 to 15% by weight, 0.1 to 10% by weight with respect to the curable resin composition (100% by weight), or The curable resin composition for light reflection according to any one of [1] to [22], which is 0.3 to 5% by weight.
[24] The content (blending amount) of the siloxane derivative (I) is 0.1 to 30% by weight, 0.5 to 20% by weight, or 1 with respect to the curable resin composition (100% by weight). The light-reflective curable resin composition according to any one of [1] to [23], which is 0.0 to 10% by weight.
[25] The curable resin composition for light reflection according to any one of [1] to [24], which is a resin composition for transfer molding or compression molding.
[26] The curable resin composition for light reflection according to any one of [1] to [25], which is a resin composition for forming a reflector.
[27] A cured product of the light-reflective curable resin composition according to any one of [1] to [26].
[28] An optical semiconductor device comprising at least an optical semiconductor element and a reflector made of a cured product of the curable resin composition for light reflection described in [27].
本発明の硬化性樹脂組成物は上記構成を有するため、高い光反射性を有し、且つ、耐熱性及び耐光性に優れ、光反射性が経時で低下しにくい硬化物を形成することができ、特にコンプレッション成型により硬化物を形成した際に上記効果が顕著に発揮される。このため、経時で光の輝度が低下しにくく、信頼性の高い光半導体装置を提供することができる。 Since the curable resin composition of the present invention has the above-described configuration, it can form a cured product having high light reflectivity, excellent heat resistance and light resistance, and light reflectivity hardly decreasing over time. Especially, when the cured product is formed by compression molding, the above-mentioned effect is remarkably exhibited. Therefore, it is possible to provide a highly reliable optical semiconductor device in which the luminance of light hardly decreases over time.
<光反射用硬化性樹脂組成物>
本発明の光反射用硬化性樹脂組成物(単に「本発明の硬化性樹脂組成物」と称する場合がある)は、脂環式エポキシ化合物(A)、ゴム粒子(B)、白色顔料(C)、無機充填剤(D)、分子内に1個以上のオキシラン環を有するイソシアヌル酸誘導体(H)、及び分子内に2以上のエポキシ基を有するシロキサン誘導体(I)を含有し、さらに硬化剤(E)及び硬化促進剤(F)、又は硬化触媒(G)を含有し、25℃において液状であることを特徴とする硬化性樹脂組成物である。なお、前記分子内に1個以上のオキシラン環を有するイソシアヌル酸誘導体(H)を「イソシアヌル酸誘導体(H)」と称する場合がある。また、分子内に2以上のエポキシ基を有するシロキサン誘導体(I)を「シロキサン誘導体(I)」と称する場合がある。
<Curable resin composition for light reflection>
The light-reflective curable resin composition of the present invention (sometimes simply referred to as “the curable resin composition of the present invention”) includes an alicyclic epoxy compound (A), rubber particles (B), a white pigment (C ), An inorganic filler (D), an isocyanuric acid derivative (H) having one or more oxirane rings in the molecule, and a siloxane derivative (I) having two or more epoxy groups in the molecule, and a curing agent A curable resin composition containing (E) and a curing accelerator (F) or a curing catalyst (G) and being liquid at 25 ° C. The isocyanuric acid derivative (H) having one or more oxirane rings in the molecule may be referred to as “isocyanuric acid derivative (H)”. Further, the siloxane derivative (I) having two or more epoxy groups in the molecule may be referred to as “siloxane derivative (I)”.
言い換えると、本発明の硬化性樹脂組成物は、脂環式エポキシ化合物(A)、ゴム粒子(B)、白色顔料(C)、無機充填剤(D)、硬化剤(E)、硬化促進剤(F)、イソシアヌル酸誘導体(H)、及びシロキサン誘導体(I)を必須成分として含む25℃で液状である光反射用硬化性樹脂組成物、又は脂環式エポキシ化合物(A)、ゴム粒子(B)、白色顔料(C)、無機充填剤(D)、硬化触媒(G)、イソシアヌル酸誘導体(H)、及びシロキサン誘導体(I)を必須成分として含む25℃で液状である硬化性樹脂組成物である。なお、本発明の硬化性樹脂組成物は、上記必須成分以外にも、必要に応じてその他の成分を含んでいてもよい。なお、本発明の硬化性樹脂組成物は、加熱により硬化を形成することが可能な熱硬化性組成物(熱硬化性エポキシ樹脂組成物)として使用できる。 In other words, the curable resin composition of the present invention comprises an alicyclic epoxy compound (A), rubber particles (B), a white pigment (C), an inorganic filler (D), a curing agent (E), and a curing accelerator. (F), isocyanuric acid derivative (H), and siloxane derivative (I) as essential components, a light-reflective curable resin composition that is liquid at 25 ° C., or an alicyclic epoxy compound (A), rubber particles ( B), a white pigment (C), an inorganic filler (D), a curing catalyst (G), an isocyanuric acid derivative (H), and a siloxane derivative (I) as essential components, a curable resin composition that is liquid at 25 ° C. It is a thing. In addition, the curable resin composition of this invention may contain the other component as needed other than the said essential component. In addition, the curable resin composition of this invention can be used as a thermosetting composition (thermosetting epoxy resin composition) which can form hardening by heating.
なお、本明細書において「光反射用硬化性樹脂組成物」とは、光反射性を有する硬化物を形成可能な硬化性樹脂組成物をいう。具体的には、例えば、波長450nmの光に対する反射率が50%以上(好ましくは80%以上、より好ましくは90%以上)である硬化物を形成可能な硬化性樹脂組成物をいう。 In the present specification, the “curable resin composition for light reflection” refers to a curable resin composition capable of forming a cured product having light reflectivity. Specifically, for example, it refers to a curable resin composition capable of forming a cured product having a reflectance of 50% or more (preferably 80% or more, more preferably 90% or more) with respect to light having a wavelength of 450 nm.
本発明の硬化性樹脂組成物は25℃において液体であることにより、コンプレッション成型に適する傾向があり、その硬化物(リフレクター)は、光反射性に優れ、且つ、耐熱性及び耐光性に優れる傾向がある。なお、本明細書において「25℃において液状」とは、常圧において25℃で測定した粘度が1000000mPa・s以下(好ましくは、800000mPa・s以下)であることをいう。なお、上記粘度は、例えば、デジタル粘度計(型番「DVU-EII型」、(株)トキメック製)を用いて、ローター:標準1°34′×R24、温度:25℃、回転数:0.5~10rpmの条件で測定することができる。 Since the curable resin composition of the present invention is liquid at 25 ° C., it tends to be suitable for compression molding, and the cured product (reflector) tends to have excellent light reflectivity and excellent heat resistance and light resistance. There is. In the present specification, “liquid at 25 ° C.” means that the viscosity measured at 25 ° C. at normal pressure is 1000000 mPa · s or less (preferably 800000 mPa · s or less). The above viscosity is measured using, for example, a digital viscometer (model number “DVU-EII type”, manufactured by Tokimec Co., Ltd.), rotor: standard 1 ° 34 ′ × R24, temperature: 25 ° C., rotational speed: 0.00. It can be measured at 5 to 10 rpm.
25℃において液体である本発明の硬化性樹脂組成物は、例えば、成分(例えば、脂環式エポキシ化合物(A)、硬化剤(E)、硬化促進剤(F)、硬化触媒(G)等)として、25℃で液体の成分を用いることにより得やすくなる。なお、上記成分として25℃で固体の成分を用いてもよいが、その含有量は、本発明の硬化性樹脂組成物が25℃において液状となるように調整される。また、ゴム粒子(B)、白色顔料(C)、無機充填剤(D)等の25℃で固体である成分の含有量を、本発明の効果を損なわない範囲内で調整することによっても得やすくなる。 The curable resin composition of the present invention which is liquid at 25 ° C. includes, for example, components (for example, alicyclic epoxy compound (A), curing agent (E), curing accelerator (F), curing catalyst (G) and the like. ), It is easy to obtain by using a liquid component at 25 ° C. In addition, although a solid component may be used as a said component at 25 degreeC, the content is adjusted so that the curable resin composition of this invention may become a liquid state at 25 degreeC. It can also be obtained by adjusting the content of components that are solid at 25 ° C., such as rubber particles (B), white pigment (C), and inorganic filler (D), within a range that does not impair the effects of the present invention. It becomes easy.
[脂環式エポキシ化合物(A)]
本発明の硬化性樹脂組成物の必須成分である脂環式エポキシ化合物(脂環式エポキシ樹脂)(A)は、分子内(一分子中)に脂環(脂肪族炭化水素環)構造とエポキシ基(オキシラニル基)とを少なくとも有する化合物であり、公知乃至慣用の脂環式エポキシ化合物を使用することができる。ただし、脂環式エポキシ化合物(A)からはイソシアヌル酸誘導体(H)、及びシロキサン誘導体(I)に該当するものが除かれる。脂環式エポキシ化合物(A)としては、より具体的には、例えば、(i)脂環を構成する隣接する2つの炭素原子と酸素原子とで構成されるエポキシ基(脂環式エポキシ基)を有する化合物、(ii)脂環に直接単結合で結合しているエポキシ基を有する化合物が挙げられる。
[Alicyclic epoxy compound (A)]
The alicyclic epoxy compound (alicyclic epoxy resin) (A), which is an essential component of the curable resin composition of the present invention, has an alicyclic (aliphatic hydrocarbon ring) structure and epoxy in the molecule (in one molecule). It is a compound which has a group (oxiranyl group) at least, and a publicly known thru / or usual alicyclic epoxy compound can be used. However, those corresponding to the isocyanuric acid derivative (H) and the siloxane derivative (I) are excluded from the alicyclic epoxy compound (A). More specifically, as the alicyclic epoxy compound (A), for example, (i) an epoxy group (alicyclic epoxy group) composed of two adjacent carbon atoms and oxygen atoms constituting the alicyclic ring And (ii) a compound having an epoxy group directly bonded to the alicyclic ring with a single bond.
上述の(i)脂環式エポキシ基を有する化合物としては、分子内に脂環式エポキシ基を1つ以上有する公知乃至慣用の化合物を使用することができ、特に限定されない。上記脂環式エポキシ基としては、硬化性樹脂組成物の硬化性及び硬化物(リフレクター)の耐熱性及び耐光性の観点で、シクロヘキセンオキシド基が好ましい。特に、硬化物(リフレクター)の耐熱性及び耐光性の観点で、分子内に2つ以上のシクロヘキセンオキシド基を有する化合物が好ましく、より好ましくは下記式(I)で表される化合物である。
式(I)中、Xは単結合又は連結基(1以上の原子を有する二価の基)を示す。上記連結基としては、例えば、二価の炭化水素基、炭素-炭素二重結合の一部又は全部がエポキシ化されたアルケニレン基(「エポキシ化アルケニレン基」と称する場合がある)、カルボニル基、エーテル結合、エステル結合、カーボネート基、アミド基、及びこれらが複数個連結した基等が挙げられる。なお、式(I)におけるシクロヘキサン環(シクロヘキセンオキシド基)を構成する炭素原子の1以上には、アルキル基等の置換基が結合していてもよい。 In formula (I), X represents a single bond or a linking group (a divalent group having one or more atoms). Examples of the linking group include a divalent hydrocarbon group, an alkenylene group in which part or all of a carbon-carbon double bond is epoxidized (sometimes referred to as an “epoxidized alkenylene group”), a carbonyl group, Examples include an ether bond, an ester bond, a carbonate group, an amide group, and a group in which a plurality of these are linked. In addition, a substituent such as an alkyl group may be bonded to one or more carbon atoms constituting the cyclohexane ring (cyclohexene oxide group) in the formula (I).
式(I)中のXが単結合である化合物としては、3,4,3',4'-ジエポキシビシクロヘキサン等が挙げられる。 Examples of the compound in which X in the formula (I) is a single bond include 3,4,3 ′, 4′-diepoxybicyclohexane and the like.
上記二価の炭化水素基としては、炭素数が1~18の直鎖又は分岐鎖状のアルキレン基、二価の脂環式炭化水素基等が挙げられる。炭素数が1~18の直鎖又は分岐鎖状のアルキレン基としては、例えば、メチレン基、メチルメチレン基、ジメチルメチレン基、エチレン基、プロピレン基、トリメチレン基等が挙げられる。上記二価の脂環式炭化水素基としては、例えば、1,2-シクロペンチレン基、1,3-シクロペンチレン基、シクロペンチリデン基、1,2-シクロヘキシレン基、1,3-シクロヘキシレン基、1,4-シクロヘキシレン基、シクロヘキシリデン基等のシクロアルキレン基(シクロアルキリデン基を含む)等が挙げられる。 Examples of the divalent hydrocarbon group include a linear or branched alkylene group having 1 to 18 carbon atoms, a divalent alicyclic hydrocarbon group, and the like. Examples of the linear or branched alkylene group having 1 to 18 carbon atoms include a methylene group, a methylmethylene group, a dimethylmethylene group, an ethylene group, a propylene group, and a trimethylene group. Examples of the divalent alicyclic hydrocarbon group include 1,2-cyclopentylene group, 1,3-cyclopentylene group, cyclopentylidene group, 1,2-cyclohexylene group, 1,3-cyclopentylene group, And cycloalkylene groups (including cycloalkylidene groups) such as cyclohexylene group, 1,4-cyclohexylene group, and cyclohexylidene group.
上記炭素-炭素二重結合の一部又は全部がエポキシ化されたアルケニレン基(エポキシ化アルケニレン基)におけるアルケニレン基としては、例えば、ビニレン基、プロペニレン基、1-ブテニレン基、2-ブテニレン基、ブタジエニレン基、ペンテニレン基、ヘキセニレン基、ヘプテニレン基、オクテニレン基等の炭素数2~8の直鎖又は分岐鎖状のアルケニレン基等が挙げられる。特に、上記エポキシ化アルケニレン基としては、炭素-炭素二重結合の全部がエポキシ化されたアルケニレン基が好ましく、より好ましくは炭素-炭素二重結合の全部がエポキシ化された炭素数2~4のアルケニレン基である。 Examples of the alkenylene group in the alkenylene group in which part or all of the carbon-carbon double bond is epoxidized (epoxidized alkenylene group) include, for example, vinylene group, propenylene group, 1-butenylene group, 2-butenylene group, butadienylene. And linear or branched alkenylene groups having 2 to 8 carbon atoms such as a group, a pentenylene group, a hexenylene group, a heptenylene group, and an octenylene group. In particular, the epoxidized alkenylene group is preferably an alkenylene group in which all of the carbon-carbon double bonds are epoxidized, more preferably 2 to 4 carbon atoms in which all of the carbon-carbon double bonds are epoxidized. Alkenylene group.
上記Xにおける連結基としては、特に、酸素原子を含有する連結基が好ましく、具体的には、-CO-、-O-CO-O-、-COO-、-O-、-CONH-、エポキシ化アルケニレン基;これらの基が複数個連結した基;これらの基の1又は2以上と二価の炭化水素基の1又は2以上とが連結した基等が挙げられる。二価の炭化水素基としては上記で例示したものが挙げられる。 The linking group in X is particularly preferably a linking group containing an oxygen atom, specifically, —CO—, —O—CO—O—, —COO—, —O—, —CONH—, epoxy. An alkenylene group; a group in which a plurality of these groups are linked; a group in which one or more of these groups are linked to one or more of divalent hydrocarbon groups, and the like. Examples of the divalent hydrocarbon group include those exemplified above.
上記式(I)で表される化合物の代表的な例としては、下記式(I-1)~(I-10)で表される化合物、2,2-ビス(3,4-エポキシシクロヘキサン-1-イル)プロパン、1,2-ビス(3,4-エポキシシクロヘキサン-1-イル)エタン、1,2-エポキシ-1,2-ビス(3,4-エポキシシクロヘキサン-1-イル)エタン、ビス(3,4-エポキシシクロヘキシルメチル)エーテル等が挙げられる。なお、下記式(I-5)、(I-7)中のl、mは、それぞれ1~30の整数を表す。下記式(I-5)中のRは炭素数1~8のアルキレン基であり、メチレン基、エチレン基、プロピレン基、イソプロピレン基、ブチレン基、イソブチレン基、s-ブチレン基、ペンチレン基、ヘキシレン基、ヘプチレン基、オクチレン基等の直鎖又は分岐鎖状のアルキレン基が挙げられる。これらの中でも、メチレン基、エチレン基、プロピレン基、イソプロピレン基等の炭素数1~3の直鎖又は分岐鎖状のアルキレン基が好ましい。下記式(I-9)、(I-10)中のn1~n6は、それぞれ1~30の整数を示す。
上述の(ii)脂環に直接単結合で結合しているエポキシ基を有する化合物としては、例えば、下記式(II)で表される化合物(エポキシ樹脂)が挙げられる。
上記式(II)中、R1はp価の有機基を示す。pは、1~20の整数を示す。p価の有機基としては、例えば、後述のp個のヒドロキシ基を有する有機化合物の構造式からp個のヒドロキシ基を除いて形成された構造を有するp価の有機基等が挙げられる。 In the above formula (II), R 1 represents a p-valent organic group. p represents an integer of 1 to 20. Examples of the p-valent organic group include a p-valent organic group having a structure formed by removing p hydroxy groups from the structural formula of an organic compound having p hydroxy groups described later.
式(II)中、qは、1~50の整数を示す。なお、pが2以上の整数の場合、複数のqは同一であってもよいし、異なっていてもよい。式(II)におけるqの和(総和)は、3~100の整数である。 In the formula (II), q represents an integer of 1 to 50. In addition, when p is an integer greater than or equal to 2, several q may be the same and may differ. The sum (total) of q in the formula (II) is an integer of 3 to 100.
式(II)中、R2は、式中に示されるシクロヘキサン環上の置換基であり、下記式(IIa)~(IIc)で表される基のいずれかを示す。上記シクロヘキサン環上のR2の結合位置は特に限定されないが、通常、酸素原子と結合するシクロヘキサン環の2つの炭素原子の位置を1位、2位とした場合、4位又は5位の炭素原子である。また、式(II)で表される化合物が複数のシクロヘキサン環を有する場合、それぞれのシクロヘキサン環におけるR2の結合位置は同一であってもよいし、異なっていてもよい。式(II)におけるR2の少なくとも1つは、式(IIa)で表される基(エポキシ基)である。なお、式(II)で表される化合物が2以上のR2を有する場合、複数のR2は同一であってもよいし、異なっていてもよい。
式(IIc)中、R3は、水素原子、置換若しくは無置換のアルキル基、置換若しくは無置換のアルキルカルボニル基、又は置換若しくは無置換のアリールカルボニル基を示す。上記アルキル基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、ブチル基、イソブチル基、s-ブチル基、t-ブチル基、ペンチル基、ヘキシル基、オクチル基、2-エチルヘキシル基等の炭素数1~20の直鎖又は分岐鎖状のアルキル基等が挙げられる。上記アルキルカルボニル基としては、例えば、メチルカルボニル基(アセチル基)、エチルカルボニル基、n-プロピルカルボニル基、イソプロピルカルボニル基、n-ブチルカルボニル基、イソブチルカルボニル基、s-ブチルカルボニル基、t-ブチルカルボニル基等の炭素数1~20の直鎖又は分岐鎖状のアルキル-カルボニル基等が挙げられる。上記アリールカルボニル基としては、例えば、フェニルカルボニル基(ベンゾイル基)、1-ナフチルカルボニル基、2-ナフチルカルボニル基等の炭素数6~20のアリール-カルボニル基等が挙げられる。 In formula (IIc), R 3 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkylcarbonyl group, or a substituted or unsubstituted arylcarbonyl group. Examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, butyl group, isobutyl group, s-butyl group, t-butyl group, pentyl group, hexyl group, octyl group, and 2-ethylhexyl. Examples thereof include straight-chain or branched alkyl groups having 1 to 20 carbon atoms. Examples of the alkylcarbonyl group include methylcarbonyl group (acetyl group), ethylcarbonyl group, n-propylcarbonyl group, isopropylcarbonyl group, n-butylcarbonyl group, isobutylcarbonyl group, s-butylcarbonyl group, t-butyl. Examples thereof include a linear or branched alkyl-carbonyl group having 1 to 20 carbon atoms such as a carbonyl group. Examples of the arylcarbonyl group include arylcarbonyl groups having 6 to 20 carbon atoms such as a phenylcarbonyl group (benzoyl group), 1-naphthylcarbonyl group, 2-naphthylcarbonyl group, and the like.
上述のアルキル基、アルキルカルボニル基、アリールカルボニル基が有していてもよい置換基としては、例えば、炭素数0~20(より好ましくは炭素数0~10)の置換基等が挙げられる。上記置換基としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子;ヒドロキシ基;メトキシ基、エトキシ基、プロポキシ基、イソプロピルオキシ基、ブトキシ基、イソブチルオキシ基等のアルコキシ基(好ましくはC1-6アルコキシ基、より好ましくはC1-4アルコキシ基);アリルオキシ基等のアルケニルオキシ基(好ましくはC2-6アルケニルオキシ基、より好ましくはC2-4アルケニルオキシ基);アセチルオキシ基、プロピオニルオキシ基、(メタ)アクリロイルオキシ基等のアシルオキシ基(好ましくはC1-12アシルオキシ基);メルカプト基;メチルチオ基、エチルチオ基等のアルキルチオ基(好ましくはC1-6アルキルチオ基、より好ましくはC1-4アルキルチオ基);アリルチオ基等のアルケニルチオ基(好ましくはC2-6アルケニルチオ基、より好ましくはC2-4アルケニルチオ基);カルボキシ基;メトキシカルボニル基、エトキシカルボニル基、プロポキシカルボニル基、ブトキシカルボニル基等のアルコキシカルボニル基(好ましくはC1-6アルコキシ-カルボニル基);アミノ基;メチルアミノ基、エチルアミノ基、ジメチルアミノ基、ジエチルアミノ基等のモノ又はジアルキルアミノ基(好ましくはモノ又はジ-C1-6アルキルアミノ基);アセチルアミノ基、プロピオニルアミノ基等のアシルアミノ基(好ましくはC1-11アシルアミノ基);エチルオキセタニルオキシ基等のオキセタニル基含有基;アセチル基、プロピオニル基等のアシル基;オキソ基;これらの2以上が必要に応じてC1-6アルキレン基を介して結合した基等が挙げられる。また、上述のアリールカルボニル基が有していてもよい置換基としては、さらに、上記置換若しくは無置換のアルキル基、上記置換若しくは無置換のアルキルカルボニル基も挙げられる。 Examples of the substituent that the above-described alkyl group, alkylcarbonyl group, and arylcarbonyl group may have include a substituent having 0 to 20 carbon atoms (more preferably 0 to 10 carbon atoms). Examples of the substituent include halogen atoms such as fluorine atom, chlorine atom, bromine atom and iodine atom; hydroxy group; alkoxy group such as methoxy group, ethoxy group, propoxy group, isopropyloxy group, butoxy group and isobutyloxy group (Preferably C 1-6 alkoxy group, more preferably C 1-4 alkoxy group); alkenyloxy group such as allyloxy group (preferably C 2-6 alkenyloxy group, more preferably C 2-4 alkenyloxy group) An acyloxy group such as an acetyloxy group, a propionyloxy group and a (meth) acryloyloxy group (preferably a C 1-12 acyloxy group); a mercapto group; an alkylthio group such as a methylthio group and an ethylthio group (preferably a C 1-6 alkylthio group) group, more preferably a C 1-4 alkylthio group); allyl alkenylthio such groups (Preferably C 2-6 alkenylthio group, more preferably C 2-4 alkenylthio group); carboxy; methoxycarbonyl group, ethoxycarbonyl group, propoxycarbonyl group, an alkoxycarbonyl group (preferably C such as butoxycarbonyl group 1-6 alkoxy-carbonyl group); amino group; mono- or dialkylamino group such as methylamino group, ethylamino group, dimethylamino group, diethylamino group (preferably mono- or di-C 1-6 alkylamino group); acetyl An acylamino group such as an amino group or a propionylamino group (preferably a C 1-11 acylamino group); an oxetanyl group-containing group such as an ethyl oxetanyloxy group; an acyl group such as an acetyl group or a propionyl group; an oxo group; It includes groups attached via a C 1-6 alkylene group optionally It is. In addition, examples of the substituent that the above-described arylcarbonyl group may have include the above-described substituted or unsubstituted alkyl group and the above-described substituted or unsubstituted alkylcarbonyl group.
式(II)で表される化合物におけるR2の全量(100モル%)に対する、式(IIa)で表される基(エポキシ基)の割合は、特に限定されないが、40モル%以上(例えば、40~100モル%)が好ましく、より好ましくは60モル%以上、さらに好ましくは80モル%以上である。上記割合が40モル%以上であると、硬化物の耐熱性や耐光性、機械特性等がより向上する傾向がある。なお、上記割合は、例えば、1H-NMRスペクトル測定や、オキシラン酸素濃度測定等により算出することができる。 The ratio of the group (epoxy group) represented by the formula (IIa) to the total amount (100 mol%) of R 2 in the compound represented by the formula (II) is not particularly limited, but is 40 mol% or more (for example, 40 to 100 mol%) is preferable, more preferably 60 mol% or more, and still more preferably 80 mol% or more. When the ratio is 40 mol% or more, the heat resistance, light resistance, mechanical properties, etc. of the cured product tend to be further improved. The above ratio can be calculated by, for example, 1 H-NMR spectrum measurement, oxirane oxygen concentration measurement, or the like.
式(II)で表される化合物は、特に限定されないが、例えば、分子内にp個のヒドロキシ基を有する有機化合物[R1(OH)p]を開始剤として(即ち、当該化合物のヒドロキシ基(活性水素)を出発点として)、1,2-エポキシ-4-ビニルシクロヘキサン(3-ビニル-7-オキサビシクロ[4.1.0]ヘプタン)を開環重合(カチオン重合)させ、その後、酸化剤によりエポキシ化することによって製造される。 The compound represented by the formula (II) is not particularly limited. For example, an organic compound [R 1 (OH) p ] having p hydroxy groups in the molecule is used as an initiator (ie, the hydroxy group of the compound). (Starting with active hydrogen)), 1,2-epoxy-4-vinylcyclohexane (3-vinyl-7-oxabicyclo [4.1.0] heptane) is subjected to ring-opening polymerization (cationic polymerization), and then Manufactured by epoxidation with an oxidizing agent.
上記分子内にp個のヒドロキシ基を有する有機化合物[R1(OH)p]としては、例えば、メタノール、エタノール、プロパノール、ブタノール、ペンタノール、ヘキサノール、オクタノール等の脂肪族アルコール;エチレングリコール、ジエチレングリコール、トリエチレングリコール、ポリエチレングリコール、プロピレングリコール、ジプロピレングリコール、1,3-ブタンジオール、1,4-ブタンジオール、ペンタンジオール、1,6-ヘキサンジオール、ネオペンチルグリコール、ネオペンチルグリコールエステル、シクロヘキサンジメタノール、グリセリン、ジグリセリン、ポリグリセリン、トリメチロールプロパン、ペンタエリスリトール、ジペンタエリスリトール、水添ビスフェノールA、水添ビスフェノールF、水添ビスフェノールS等の多価アルコール;ポリビニルアルコール、ポリ酢酸ビニル部分加水分解物、デンプン、アクリルポリオール樹脂、スチレン-アリルアルコール共重合樹脂、ポリエステルポリオール、ポリカプロラクトンポリオール、ポリプロピレンポリオール、ポリテトラメチレングリコール、ポリカーボネートポリオール類、ヒドロキシ基を有するポリブタジエン、セルロース、セルロースアセテート、セルロースアセテートブチレート、ヒドロキシエチルセルロース等のセルロース系ポリマー等のヒドロキシ基を有するオリゴマー又はポリマー等が挙げられる。 Examples of the organic compound [R 1 (OH) p ] having p hydroxy groups in the molecule include aliphatic alcohols such as methanol, ethanol, propanol, butanol, pentanol, hexanol, octanol; ethylene glycol, diethylene glycol , Triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, 1,3-butanediol, 1,4-butanediol, pentanediol, 1,6-hexanediol, neopentyl glycol, neopentyl glycol ester, cyclohexanedi Methanol, glycerin, diglycerin, polyglycerin, trimethylolpropane, pentaerythritol, dipentaerythritol, hydrogenated bisphenol A, hydrogenated bisphenol F, water Polyhydric alcohols such as bisphenol S; polyvinyl alcohol, polyvinyl acetate partial hydrolyzate, starch, acrylic polyol resin, styrene-allyl alcohol copolymer resin, polyester polyol, polycaprolactone polyol, polypropylene polyol, polytetramethylene glycol, polycarbonate polyol Examples thereof include oligomers or polymers having a hydroxy group such as polybutadiene having a hydroxy group, cellulose, cellulose acetate, cellulose acetate butyrate, and cellulose-based polymers such as hydroxyethyl cellulose.
上記1,2-エポキシ-4-ビニルシクロヘキサンは、公知乃至慣用の方法により製造でき、特に限定されないが、例えば、ブタジエンの二量化反応によって得られる4-ビニルシクロヘキセンを、過酢酸等の酸化剤を使用して部分エポキシ化することによって得られる。また、1,2-エポキシ-4-ビニルシクロヘキサンとしては、市販品を使用することもできる。 The 1,2-epoxy-4-vinylcyclohexane can be produced by a known or commonly used method, and is not particularly limited. For example, 4-vinylcyclohexene obtained by dimerization reaction of butadiene is replaced with an oxidizing agent such as peracetic acid. Obtained by partial epoxidation using. Moreover, as 1,2-epoxy-4-vinylcyclohexane, a commercially available product can be used.
また、上記酸化剤としては、過酸化水素や有機過酸等の公知乃至慣用の酸化剤を使用することができ、特に限定されないが、例えば、有機過酸としては、過ギ酸、過酢酸、過安息香酸、トリフルオロ過酢酸等が挙げられる。中でも、過酢酸は工業的に安価に入手可能であり、かつ安定度も高いため、好ましい。 The oxidant may be a known or conventional oxidant such as hydrogen peroxide or organic peracid, and is not particularly limited. Examples of the organic peracid include performic acid, peracetic acid, peroxygen. Examples include benzoic acid and trifluoroperacetic acid. Among them, peracetic acid is preferable because it is industrially available at low cost and has high stability.
なお、上述の開環重合及びエポキシ化は、より具体的には、例えば、特開昭60-161973号公報等に記載の周知慣用の方法に従って実施することができる。 The above ring-opening polymerization and epoxidation can be carried out more specifically according to well-known and conventional methods described in, for example, JP-A-60-161973.
式(II)で表される化合物の標準ポリスチレン換算の重量平均分子量は、特に限定されないが、300~100000が好ましく、より好ましくは1000~10000である。重量平均分子量が300以上であると、硬化物の機械強度や耐熱性、耐光性が向上する傾向がある。一方、重量平均分子量が100000以下であると、粘度が高くなり過ぎず成型時の流動性を低く維持しやすい傾向がある。なお、重量平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)法により測定される。 The standard polystyrene equivalent weight average molecular weight of the compound represented by the formula (II) is not particularly limited, but is preferably 300 to 100,000, more preferably 1,000 to 10,000. When the weight average molecular weight is 300 or more, the mechanical strength, heat resistance, and light resistance of the cured product tend to be improved. On the other hand, when the weight average molecular weight is 100,000 or less, the viscosity does not become too high and the fluidity during molding tends to be maintained low. The weight average molecular weight is measured by a gel permeation chromatography (GPC) method.
式(II)で表される化合物のエポキシ基の当量(エポキシ当量)は、特に限定されないが、50~1000が好ましく、より好ましくは100~500である。エポキシ当量が50以上であると、硬化物が脆くなりにくい傾向がある。一方、エポキシ当量が1000以下であると、硬化物の機械強度が向上する傾向がある。なお、エポキシ当量は、JIS K7236:2001に準じて測定される。 The equivalent (epoxy equivalent) of the epoxy group of the compound represented by the formula (II) is not particularly limited, but is preferably 50 to 1000, more preferably 100 to 500. When the epoxy equivalent is 50 or more, the cured product tends not to be brittle. On the other hand, when the epoxy equivalent is 1000 or less, the mechanical strength of the cured product tends to be improved. The epoxy equivalent is measured according to JIS K7236: 2001.
本発明の硬化性樹脂組成物において脂環式エポキシ化合物(A)は、一種を単独で使用することもできるし、二種以上を組み合わせて使用することもできる。また、脂環式エポキシ化合物(A)は、公知乃至慣用の方法により製造することもできるし、例えば、商品名「セロキサイド2021P」、「セロキサイド2081」(以上、(株)ダイセル製)等の市販品を使用することもできる。 In the curable resin composition of the present invention, the alicyclic epoxy compound (A) can be used singly or in combination of two or more. The alicyclic epoxy compound (A) can also be produced by a known or conventional method. For example, commercial names such as trade names “Celoxide 2021P” and “Celoxide 2081” (manufactured by Daicel Corporation) are available. Can also be used.
脂環式エポキシ化合物(A)は、調合時、及び注型時などの作業性の点から、常温(25℃)で液状を呈するものが好ましい。また、常温(25℃)で固体である脂環式エポキシ化合物(A)であっても、配合した後に液状を呈するものであれば、含有していてもよい。 The alicyclic epoxy compound (A) preferably exhibits a liquid state at normal temperature (25 ° C.) from the viewpoint of workability during preparation and casting. Moreover, even if it is an alicyclic epoxy compound (A) which is solid at normal temperature (25 degreeC), as long as it shows liquid state after mix | blending, you may contain.
中でも、本発明の硬化性樹脂組成物は、硬化物(リフレクター)の光反射性、耐熱性及び耐光性がより向上する観点から、(i)脂環式エポキシ基を有する化合物を少なくとも含むことが好ましく、さらに(ii)脂環に直接単結合で結合しているエポキシ基を有する化合物を含むことがより好ましい。 Especially, the curable resin composition of this invention contains at least the compound which has (i) alicyclic epoxy group from a viewpoint which the light reflectivity of a hardened | cured material (reflector), heat resistance, and light resistance improve more. More preferably, it further includes (ii) a compound having an epoxy group directly bonded to the alicyclic ring with a single bond.
本発明の硬化性樹脂組成物における脂環式エポキシ化合物(A)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物(100重量%)に対して、0.1~60重量%が好ましく、より好ましくは0.3~50重量%、さらに好ましくは0.5~40重量%である。脂環式エポキシ化合物(A)の含有量を0.1重量%以上とすることにより、硬化物(リフレクター)の耐熱性及び耐光性がより向上する傾向がある。一方、脂環式エポキシ化合物(A)の含有量を60重量%以下とすることにより、硬化物(リフレクター)の耐熱性及び耐光性がより向上し、線膨張係数が低減され、光半導体素子搭載用基板におけるリードフレームの反り等の不具合の発生が抑制される傾向がある。 The content (blending amount) of the alicyclic epoxy compound (A) in the curable resin composition of the present invention is not particularly limited, but is 0.1 to 60 with respect to the curable resin composition (100% by weight). % By weight is preferable, more preferably 0.3 to 50% by weight, still more preferably 0.5 to 40% by weight. By setting the content of the alicyclic epoxy compound (A) to 0.1% by weight or more, the heat resistance and light resistance of the cured product (reflector) tend to be further improved. On the other hand, by setting the content of the alicyclic epoxy compound (A) to 60% by weight or less, the heat resistance and light resistance of the cured product (reflector) are further improved, the linear expansion coefficient is reduced, and the optical semiconductor element is mounted. There is a tendency that the occurrence of defects such as lead frame warpage in the circuit board is suppressed.
脂環式エポキシ化合物(A)以外のエポキシ化合物を含有する場合、本発明の硬化性樹脂組成物に含まれるエポキシ基を有する化合物の全量(100重量%)に対する脂環式エポキシ化合物(A)の割合は、特に限定されないが、例えば、1~90重量%が好ましく、より好ましくは5~80重量%、さらに好ましくは10~70重量%である。上記範囲内とすることで、硬化物(リフレクター)の耐熱性及び耐光性がより向上する傾向がある。なお、本発明の硬化性エポキシ樹脂組成物に含まれるエポキシ基を有する化合物としては、例えば、脂環式エポキシ化合物(A)、イソシアヌル酸誘導体(H)、及びシロキサン誘導体(I)等が挙げられる。 When the epoxy compound other than the alicyclic epoxy compound (A) is contained, the alicyclic epoxy compound (A) with respect to the total amount (100% by weight) of the compound having an epoxy group contained in the curable resin composition of the present invention. The ratio is not particularly limited, but is preferably 1 to 90% by weight, more preferably 5 to 80% by weight, and still more preferably 10 to 70% by weight. By making it in the said range, there exists a tendency for the heat resistance and light resistance of hardened | cured material (reflector) to improve more. In addition, as a compound which has an epoxy group contained in the curable epoxy resin composition of this invention, an alicyclic epoxy compound (A), an isocyanuric acid derivative (H), a siloxane derivative (I), etc. are mentioned, for example. .
なお、本明細書において、本発明の硬化性樹脂組成物に含まれる各成分(例えば、脂環式エポキシ化合物(A)、ゴム粒子(B)、白色顔料(C)、無機充填剤(D)、硬化剤(E)、硬化促進剤(F)、硬化触媒(G)、イソシアヌル酸誘導体(H)、シロキサン誘導体(I)等)の含有量は、それぞれ、合計が100重量%以下となるように、記載の範囲内から適宜選択することができる。 In addition, in this specification, each component (for example, alicyclic epoxy compound (A), rubber particle (B), white pigment (C), inorganic filler (D) contained in the curable resin composition of the present invention. , Curing agent (E), curing accelerator (F), curing catalyst (G), isocyanuric acid derivative (H), siloxane derivative (I), etc.), respectively, so that the total content is 100% by weight or less. In addition, it can select suitably from the description range.
[ゴム粒子(B)]
本発明の硬化性樹脂組成物の必須成分であるゴム粒子(B)は、ゴム弾性を有する粒子である。本発明の硬化性樹脂組成物は、ゴム粒子(B)を脂環式エポキシ化合物(A)、白色顔料(C)、無機充填剤(D)、イソシアヌル酸誘導体(H)、及びシロキサン誘導体(I)と組み合わせて用いることにより、形成される硬化物の光反射性、耐熱性、耐光性、及び耐クラック性に優れ、特にコンプレッション成型により硬化物を形成した際に上記効果が顕著に発揮される傾向がある。
[Rubber particles (B)]
The rubber particles (B) that are essential components of the curable resin composition of the present invention are particles having rubber elasticity. In the curable resin composition of the present invention, the rubber particles (B) are alicyclic epoxy compound (A), white pigment (C), inorganic filler (D), isocyanuric acid derivative (H), and siloxane derivative (I). ), The cured product formed is excellent in light reflectivity, heat resistance, light resistance, and crack resistance, and the above effect is remarkably exhibited particularly when the cured product is formed by compression molding. Tend.
ゴム粒子(B)としては、例えば、粒子状NBR(アクリロニトリル-ブタジエンゴム)、反応性末端カルボキシ基NBR(CTBN)、メタルフリーNBR、粒子状SBR(スチレン-ブタジエンゴム)等のゴム粒子が挙げられる。ゴム粒子(B)としては、分散性が良好であり靭性向上(耐クラック性向上)の効果を得られやすい観点から、ゴム弾性を有するコア部分と、該コア部分を被覆する少なくとも1層のシェル層とからなる多層構造(コアシェル構造)を有するゴム粒子(以下、「コアシェル型ゴム粒子」と称する場合がある)が好ましい。ゴム粒子(B)は、硬化物の耐熱性及び耐光性がより向上する観点から、特に、(メタ)アクリル酸エステルを必須のモノマー成分とするポリマー(重合体)で構成され、表面に脂環式エポキシ化合物(A)等のエポキシ基を有する化合物と反応し得る官能基としてヒドロキシ基及び/又はカルボキシ基(ヒドロキシ基及びカルボキシ基のいずれか一方又は両方)を有するゴム粒子が好ましい。即ち、ゴム粒子(B)は、(メタ)アクリル酸エステルを必須のモノマー成分とするポリマー(アクリル系ポリマー)で構成された、コアシェル型ゴム粒子であることが特に好ましい。なお、本発明の硬化性樹脂組成物においてゴム粒子(B)は、一種を単独で使用することもできるし、二種以上を組み合わせて使用することもできる。 Examples of the rubber particles (B) include rubber particles such as particulate NBR (acrylonitrile-butadiene rubber), reactive terminal carboxy group NBR (CTBN), metal-free NBR, particulate SBR (styrene-butadiene rubber). . The rubber particles (B) have a core part having rubber elasticity and at least one shell covering the core part from the viewpoint of good dispersibility and an effect of improving toughness (crack resistance improvement). Rubber particles having a multilayer structure (core-shell structure) composed of layers (hereinafter sometimes referred to as “core-shell type rubber particles”) are preferred. From the viewpoint of further improving the heat resistance and light resistance of the cured product, the rubber particles (B) are particularly composed of a polymer (polymer) having (meth) acrylic acid ester as an essential monomer component, and an alicyclic ring on the surface. Rubber particles having a hydroxy group and / or a carboxy group (either one or both of a hydroxy group and a carboxy group) as a functional group capable of reacting with a compound having an epoxy group such as the formula epoxy compound (A) are preferred. That is, the rubber particles (B) are particularly preferably core-shell type rubber particles composed of a polymer (acrylic polymer) containing (meth) acrylic acid ester as an essential monomer component. In the curable resin composition of the present invention, the rubber particles (B) can be used singly or in combination of two or more.
ゴム粒子(B)がコアシェル型ゴム粒子である場合、上記ゴム弾性を有するコア部分を構成するポリマーは、特に限定されないが、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチル等の(メタ)アクリル酸エステルを必須のモノマー成分として含むポリマーであることが好ましい。上記ゴム弾性を有するコア部分を構成するポリマーは、その他、例えば、スチレン、α-メチルスチレン等の芳香族ビニル;アクリロニトリル、メタクリロニトリル等のニトリル;ブタジエン、イソプレン等の共役ジエン;エチレン、プロピレン、イソブテン等のα-オレフィン等をモノマー成分として含んでいてもよい。 When the rubber particles (B) are core-shell type rubber particles, the polymer constituting the core portion having rubber elasticity is not particularly limited, but methyl (meth) acrylate, ethyl (meth) acrylate, (meth) acrylic A polymer containing a (meth) acrylic acid ester such as butyl acid as an essential monomer component is preferable. The polymer constituting the core part having rubber elasticity includes, for example, aromatic vinyl such as styrene and α-methylstyrene; nitrile such as acrylonitrile and methacrylonitrile; conjugated diene such as butadiene and isoprene; ethylene, propylene, An α-olefin such as isobutene may be included as a monomer component.
中でも、上記ゴム弾性を有するコア部分を構成するポリマーは、モノマー成分として、(メタ)アクリル酸エステルと共に、芳香族ビニル、ニトリル、及び共役ジエンからなる群より選択された一種又は二種以上を組み合わせて含むことが好ましい。即ち、上記コア部分を構成するポリマーとしては、例えば、(メタ)アクリル酸エステル/芳香族ビニル、(メタ)アクリル酸エステル/共役ジエン等の二元共重合体;(メタ)アクリル酸エステル/芳香族ビニル/共役ジエン等の三元共重合体等が挙げられる。なお、上記コア部分を構成するポリマーには、ポリジメチルシロキサンやポリフェニルメチルシロキサン等のシリコーンやポリウレタン等が含まれていてもよい。 Among them, the polymer constituting the core portion having rubber elasticity is combined with one or more selected from the group consisting of aromatic vinyl, nitrile, and conjugated diene together with (meth) acrylic acid ester as a monomer component. It is preferable to include. That is, as the polymer constituting the core part, for example, (meth) acrylic acid ester / aromatic vinyl, (meth) acrylic acid ester / conjugated diene and other binary copolymers; (meth) acrylic acid ester / aromatic And terpolymers such as group vinyl / conjugated dienes. The polymer constituting the core portion may contain silicone such as polydimethylsiloxane and polyphenylmethylsiloxane, polyurethane, and the like.
上記コア部分を構成するポリマーは、その他のモノマー成分として、ジビニルベンゼン、アリル(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、ジアリルマレエート、トリアリルシアヌレート、ジアリルフタレート、ブチレングリコールジアクリレート等の分子内に2個以上の反応性官能基を有する反応性架橋モノマーを含有していてもよい。 The polymer constituting the core part includes, as other monomer components, divinylbenzene, allyl (meth) acrylate, ethylene glycol di (meth) acrylate, diallyl maleate, triallyl cyanurate, diallyl phthalate, butylene glycol diacrylate, etc. A reactive crosslinking monomer having two or more reactive functional groups in the molecule may be contained.
上記コア部分は、中でも、(メタ)アクリル酸エステル及び芳香族ビニル(特に、アクリル酸ブチル及びスチレン)を含む二元又は三元共重合体より構成されたコア部分であることが、コアシェル型ゴム粒子の屈折率を容易に調整できる点で好ましい。 The core-shell type rubber is preferably a core portion composed of a binary or ternary copolymer containing (meth) acrylic acid ester and aromatic vinyl (particularly butyl acrylate and styrene). This is preferable in that the refractive index of the particles can be easily adjusted.
上記コア部分を構成するポリマーのガラス転移温度は、特に限定されないが、-100~10℃が好ましく、より好ましくは-80~-10℃、さらに好ましくは-60~-20℃である。上記ポリマーのガラス転移温度を上記範囲内とすることにより硬化物の耐クラック性が向上する傾向がある。なお、上記コア部分を構成するポリマーのガラス転移温度は、下記Foxの式により算出される計算値を意味する(Bull.Am.Phys.Soc.,1(3)123(1956)参照)。下記Foxの式中、Tgはコア部分を構成するポリマーのガラス転移温度(単位:K)を示し、Wiはコア部分を構成するポリマーを構成する単量体全量に対する単量体iの重量分率を示す。また、Tgiは単量体iの単独重合体のガラス転移温度(単位:K)を示す。下記Foxの式は、コアを構成するポリマーが単量体1、単量体2、・・・・、及び単量体nの共重合体である場合の式を示す。
1/Tg=W1/Tg1+W2/Tg2+・・・・+Wn/Tgn
上記単独重合体のガラス転移温度は、各種文献に記載の値を採用することができ、例えば、「POLYMER HANDBOOK 第3版」(John Wiley & Sons,Inc.発行)に記載の値を採用できる。なお、文献に記載のないものについては、単量体を常法により重合して得られる単独重合体の、DSC法により測定されるガラス転移温度の値を採用することができる。
The glass transition temperature of the polymer constituting the core portion is not particularly limited, but is preferably −100 to 10 ° C., more preferably −80 to −10 ° C., and further preferably −60 to −20 ° C. There exists a tendency for the crack resistance of hardened | cured material to improve by making the glass transition temperature of the said polymer into the said range. In addition, the glass transition temperature of the polymer which comprises the said core part means the calculated value calculated by the formula of the following Fox (refer Bull. Am. Phys. Soc., 1 (3) 123 (1956)). Wherein the following Fox, Tg glass transition temperature (unit: K) of the polymer constituting the core portion indicates, W i is the weight fraction of the monomer i for the monomer total amount constituting the polymer constituting the core portion Indicates the rate. Further, Tg i is the glass transition temperature of the homopolymer of monomer i (unit: K) shows a. The following Fox formula shows the formula when the polymer constituting the core is a copolymer of monomer 1, monomer 2,..., And monomer n.
1 / Tg = W 1 / Tg 1 + W 2 / Tg 2 +... + W n / Tg n
As the glass transition temperature of the homopolymer, values described in various documents can be adopted, for example, values described in “POLYMER HANDBOOK 3rd edition” (published by John Wiley & Sons, Inc.) can be adopted. In addition, about the thing which is not described in literature, the value of the glass transition temperature measured by DSC method of the homopolymer obtained by superposing | polymerizing a monomer by a conventional method is employable.
上記コア部分は、通常用いられる方法で製造することができ、例えば、上記モノマーを乳化重合法により重合する方法等により製造することができる。乳化重合法においては、上記モノマーの全量を一括して仕込んで重合してもよいし、上記モノマーの一部を重合した後、残りを連続的に又は断続的に添加して重合してもよいし、さらに、シード粒子を使用する重合方法を使用してもよい。 The core part can be produced by a commonly used method. For example, the core part can be produced by a method of polymerizing the monomer by an emulsion polymerization method. In the emulsion polymerization method, the whole amount of the monomer may be charged all at once and polymerized, or after polymerizing a part of the monomer, the remainder may be added continuously or intermittently for polymerization. Further, a polymerization method using seed particles may be used.
なお、ゴム粒子(B)として、コアシェル構造を有しないゴム粒子を用いる場合には、例えば、上記コア部分のみからなるゴム粒子等を使用することができる。 In addition, when using the rubber particle which does not have a core shell structure as a rubber particle (B), the rubber particle etc. which consist only of the said core part can be used, for example.
コアシェル型ゴム粒子のシェル層を構成するポリマーは、上記コア部分を構成するポリマーとは異種のポリマー(異なるモノマー組成を有するポリマー)であることが好ましい。また、上述のように、上記シェル層は、脂環式エポキシ化合物(A)等のエポキシ基を有する化合物と反応し得る官能基としてヒドロキシ基及び/又はカルボキシ基を有することが好ましい。これにより、特に、脂環式エポキシ化合物(A)との界面で接着性を向上させることができ、該シェル層を有するコアシェル型ゴム粒子を含む硬化性樹脂組成物を硬化させた硬化物に対して、優れた耐クラック性を発揮させることができる。また、硬化物のガラス転移温度の低下を防止することもできる。 The polymer constituting the shell layer of the core-shell type rubber particles is preferably a polymer different from the polymer constituting the core portion (a polymer having a different monomer composition). Further, as described above, the shell layer preferably has a hydroxy group and / or a carboxy group as a functional group capable of reacting with a compound having an epoxy group such as an alicyclic epoxy compound (A). Thereby, especially with respect to the hardened | cured material which can improve adhesiveness in an interface with an alicyclic epoxy compound (A), and hardened the curable resin composition containing the core-shell type rubber particle which has this shell layer Excellent crack resistance can be exhibited. Moreover, the fall of the glass transition temperature of hardened | cured material can also be prevented.
上記シェル層を構成するポリマーは、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチル等の(メタ)アクリル酸エステルを必須のモノマー成分として含むポリマーであることが好ましい。例えば、上記コア部分における(メタ)アクリル酸エステルとしてアクリル酸ブチルを用いた場合、シェル層を構成するポリマーのモノマー成分としては、例えば、アクリル酸ブチル以外の(メタ)アクリル酸エステル(例えば、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、メタクリル酸ブチル等)を使用することが好ましい。(メタ)アクリル酸エステル以外に含んでいてもよいモノマー成分としては、例えば、スチレン、α-メチルスチレン等の芳香族ビニル;アクリロニトリル、メタクリロニトリル等のニトリル等が挙げられる。コアシェル型ゴム粒子においては、シェル層を構成するモノマー成分として、(メタ)アクリル酸エステルと共に、上記モノマーを単独で、又は二種以上を組み合わせて含むことが好ましく、特に、少なくとも芳香族ビニルを含むことが、コアシェル型ゴム粒子の屈折率を容易に調整できる点で好ましい。 The polymer constituting the shell layer is preferably a polymer containing (meth) acrylic acid ester such as methyl (meth) acrylate, ethyl (meth) acrylate, and butyl (meth) acrylate as an essential monomer component. . For example, when butyl acrylate is used as the (meth) acrylic acid ester in the core portion, as a monomer component of the polymer constituting the shell layer, for example, (meth) acrylic acid esters other than butyl acrylate (for example, ( (Meth) methyl acrylate, ethyl (meth) acrylate, butyl methacrylate, etc.) are preferably used. Examples of the monomer component that may be contained in addition to the (meth) acrylic acid ester include aromatic vinyl such as styrene and α-methylstyrene; nitrile such as acrylonitrile and methacrylonitrile. In the core-shell type rubber particle, it is preferable that the monomer component constituting the shell layer includes the (meth) acrylic acid ester alone or in combination of two or more, particularly at least aromatic vinyl. It is preferable in that the refractive index of the core-shell type rubber particles can be easily adjusted.
さらに、上記シェル層を構成するポリマーは、モノマー成分として、脂環式エポキシ化合物(A)等のエポキシ基を有する化合物と反応し得る官能基としてのヒドロキシ基及び/又はカルボキシ基を形成するために、ヒドロキシ基含有モノマー(例えば、2-ヒドロキシエチル(メタ)アクリレート等のヒドロキシアルキル(メタ)アクリレート等)や、カルボキシ基含有モノマー(例えば、(メタ)アクリル酸等のα,β-不飽和酸;マレイン酸無水物等のα,β-不飽和酸無水物等)を含有することが好ましい。 Further, the polymer constituting the shell layer forms a hydroxy group and / or a carboxy group as a functional group capable of reacting with a compound having an epoxy group such as an alicyclic epoxy compound (A) as a monomer component. Hydroxy group-containing monomers (eg, hydroxyalkyl (meth) acrylates such as 2-hydroxyethyl (meth) acrylate) and carboxy group-containing monomers (eg, α, β-unsaturated acids such as (meth) acrylic acid; Α, β-unsaturated acid anhydrides such as maleic anhydride) are preferably contained.
上記シェル層を構成するポリマーは、モノマー成分として、(メタ)アクリル酸エステルと共に、上記モノマーから選択された一種又は二種以上を組み合わせて含むことが好ましい。即ち、上記シェル層は、例えば、(メタ)アクリル酸エステル/芳香族ビニル/ヒドロキシアルキル(メタ)アクリレート、(メタ)アクリル酸エステル/芳香族ビニル/α,β-不飽和酸等の三元共重合体等から構成されたシェル層であることが好ましい。 The polymer constituting the shell layer preferably contains, as a monomer component, one or two or more selected from the above monomers in combination with (meth) acrylic acid ester. That is, the shell layer is composed of, for example, a ternary copolymer such as (meth) acrylic acid ester / aromatic vinyl / hydroxyalkyl (meth) acrylate, (meth) acrylic acid ester / aromatic vinyl / α, β-unsaturated acid. A shell layer composed of a polymer or the like is preferable.
また、上記シェル層を構成するポリマーは、その他のモノマー成分として、コア部分と同様に、上記モノマーの他にジビニルベンゼン、アリル(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、ジアリルマレエート、トリアリルシアヌレート、ジアリルフタレート、ブチレングリコールジアクリレート等の分子内に2個以上の反応性官能基を有する反応性架橋モノマーを含有していてもよい。 Further, the polymer constituting the shell layer includes, as the other monomer components, divinylbenzene, allyl (meth) acrylate, ethylene glycol di (meth) acrylate, diallyl maleate, trimethyl, as well as the above-described monomer. A reactive crosslinking monomer having two or more reactive functional groups may be contained in the molecule such as allyl cyanurate, diallyl phthalate, butylene glycol diacrylate.
上記シェル層を構成するポリマーのガラス転移温度は、特に限定されないが、20~200℃が好ましく、より好ましくは40~180℃、さらに好ましくは60~160℃である。上記ポリマーのガラス転移温度を20℃以上とすることにより、硬化物の耐熱性及び耐光性がより向上する傾向がある。一方、上記ポリマーのガラス転移温度を200℃以下とすることにより、ゴム粒子(B)の分散性及び硬化物の耐クラック性が向上する傾向がある。なお、上記シェル層を構成するポリマーのガラス転移温度は、上記Foxの式により算出される計算値を意味し、例えば、上述のコアを構成するポリマーのガラス転移温度と同様にして測定できる。 The glass transition temperature of the polymer constituting the shell layer is not particularly limited, but is preferably 20 to 200 ° C, more preferably 40 to 180 ° C, and still more preferably 60 to 160 ° C. By setting the glass transition temperature of the polymer to 20 ° C. or higher, the heat resistance and light resistance of the cured product tend to be further improved. On the other hand, when the glass transition temperature of the polymer is 200 ° C. or lower, the dispersibility of the rubber particles (B) and the crack resistance of the cured product tend to be improved. In addition, the glass transition temperature of the polymer which comprises the said shell layer means the calculated value computed by the said Formula of Fox, For example, it can measure similarly to the glass transition temperature of the polymer which comprises the above-mentioned core.
コアシェル型ゴム粒子は、上記コア部分をシェル層により被覆することで得られる。上記コア部分をシェル層で被覆する方法としては、例えば、上記方法により得られたゴム弾性を有するコア部分の表面に、シェル層を構成するポリマーを塗布することにより被覆する方法;上記方法により得られたゴム弾性を有するコア部分を幹成分とし、シェル層を構成する各成分を枝成分としてグラフト重合する方法等が挙げられる。 Core-shell type rubber particles are obtained by covering the core part with a shell layer. Examples of the method for coating the core part with the shell layer include a method of coating the surface of the core part having rubber elasticity obtained by the above method by applying a polymer constituting the shell layer; Examples thereof include a graft polymerization method in which the core portion having rubber elasticity is a trunk component and each component constituting the shell layer is a branch component.
ゴム粒子(B)の平均粒子径は、特に限定されないが、10~500nmが好ましく、より好ましくは20~400nmである。また、ゴム粒子(B)の最大粒子径は、特に限定されないが、50~1000nmが好ましく、より好ましくは100~800nmである。平均粒子径を500nm以下(又は、最大粒子径を1000nm以下)とすることにより、硬化物におけるゴム粒子(B)の分散性が向上し、耐クラック性が向上する傾向がある。一方、平均粒子径を10nm以上(又は、最大粒子径を50nm以上)とすることにより、硬化物の耐クラック性が向上する傾向がある。 The average particle size of the rubber particles (B) is not particularly limited, but is preferably 10 to 500 nm, more preferably 20 to 400 nm. The maximum particle size of the rubber particles (B) is not particularly limited, but is preferably 50 to 1000 nm, and more preferably 100 to 800 nm. When the average particle size is 500 nm or less (or the maximum particle size is 1000 nm or less), the dispersibility of the rubber particles (B) in the cured product is improved and the crack resistance tends to be improved. On the other hand, when the average particle size is 10 nm or more (or the maximum particle size is 50 nm or more), the crack resistance of the cured product tends to be improved.
ゴム粒子(B)の屈折率は、特に限定されないが、1.40~1.60が好ましく、より好ましくは1.42~1.58である。また、ゴム粒子(B)の屈折率と、該ゴム粒子(B)を含む硬化性樹脂組成物(本発明の硬化性樹脂組成物)を硬化させて得られる硬化物の屈折率との差は±0.03以内であることが好ましい。 The refractive index of the rubber particles (B) is not particularly limited, but is preferably 1.40 to 1.60, more preferably 1.42 to 1.58. The difference between the refractive index of the rubber particles (B) and the refractive index of the cured product obtained by curing the curable resin composition (the curable resin composition of the present invention) containing the rubber particles (B) is It is preferably within ± 0.03.
ゴム粒子(B)の屈折率は、例えば、ゴム粒子(B)1gを型に注型して210℃、4MPaで圧縮成型し、厚さ1mmの平板を得、得られた平板から、縦20mm×横6mmの試験片を切り出し、中間液としてモノブロモナフタレンを使用してプリズムと該試験片とを密着させた状態で、多波長アッベ屈折計(商品名「DR-M2」、(株)アタゴ製)を使用し、20℃、ナトリウムD線での屈折率を測定することにより求めることができる。 The refractive index of the rubber particles (B) is, for example, 1 g of rubber particles (B) is cast into a mold and compression molded at 210 ° C. and 4 MPa to obtain a flat plate having a thickness of 1 mm. × A 6 mm wide test piece was cut out, and a multi-wavelength Abbe refractometer (trade name “DR-M2”, Atago Co., Ltd.) was used in a state where the prism and the test piece were in close contact using monobromonaphthalene as an intermediate solution. And the refractive index at 20 ° C. and sodium D line can be measured.
本発明の硬化性樹脂組成物の硬化物の屈折率は、例えば、下記硬化物の項に記載の加熱硬化方法により得られた硬化物から、縦20mm×横6mm×厚さ1mmの試験片を切り出し、中間液としてモノブロモナフタレンを使用してプリズムと該試験片とを密着させた状態で、多波長アッベ屈折計(商品名「DR-M2」、(株)アタゴ製)を使用し、20℃、ナトリウムD線での屈折率を測定することにより求めることができる。 The refractive index of the cured product of the curable resin composition of the present invention is, for example, a test piece having a length of 20 mm × width of 6 mm × thickness of 1 mm from a cured product obtained by the heat curing method described in the section of cured product below. Using a multi-wavelength Abbe refractometer (trade name “DR-M2”, manufactured by Atago Co., Ltd.) in a state where the prism and the test piece are in close contact using monobromonaphthalene as an intermediate solution, 20 It can obtain | require by measuring the refractive index in C, sodium D line | wire.
本発明の硬化性樹脂組成物におけるゴム粒子(B)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物(100重量%)に対して、0.01~20重量%が好ましく、より好ましくは0.05~15重量%、さらに好ましくは0.1~10重量%である。ゴム粒子(B)の含有量を上記範囲内とすることにより、硬化物の耐クラック性が向上し、耐熱性及び耐光性がより優れる傾向がある。 The content (blending amount) of the rubber particles (B) in the curable resin composition of the present invention is not particularly limited, but is 0.01 to 20% by weight with respect to the curable resin composition (100% by weight). Preferably, it is 0.05 to 15% by weight, more preferably 0.1 to 10% by weight. By making content of a rubber particle (B) into the said range, there exists a tendency which the crack resistance of hardened | cured material improves and heat resistance and light resistance are more excellent.
本発明の硬化性樹脂組成物におけるゴム粒子(B)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物に含まれるエポキシ基を有する化合物の全量100重量部に対して、0.5~30重量部が好ましく、より好ましくは1~20重量部である。ゴム粒子(B)の含有量を上記範囲内とすることにより、硬化物の耐クラック性が向上し、耐熱性及び耐光性がより優れる傾向がある。 The content (blending amount) of the rubber particles (B) in the curable resin composition of the present invention is not particularly limited, but with respect to 100 parts by weight of the total amount of compounds having an epoxy group contained in the curable resin composition, The amount is preferably 0.5 to 30 parts by weight, more preferably 1 to 20 parts by weight. By making content of a rubber particle (B) into the said range, there exists a tendency which the crack resistance of hardened | cured material improves and heat resistance and light resistance are more excellent.
[白色顔料(C)]
本発明の硬化性樹脂組成物の必須成分である白色顔料(C)は、主に、硬化物(リフレクター)に対して高い光反射性を付与し、また、その線膨張率を低減させる働きを有する。白色顔料(C)としては、公知乃至慣用の白色顔料を使用することができ、特に限定されないが、例えば、ガラス、クレー、雲母、タルク、カオリナイト(カオリン)、ハロイサイト、ゼオライト、酸性白土、活性白土、ベーマイト、擬ベーマイト、無機酸化物、金属塩[例えば、アルカリ土類金属塩等]等の無機白色顔料;スチレン系樹脂、ベンゾグアナミン系樹脂、尿素-ホルマリン系樹脂、メラミン-ホルマリン系樹脂、アミド系樹脂等の樹脂顔料等の有機白色顔料(プラスチックピグメント等);中空構造(バルーン構造)を有する中空粒子等が挙げられる。
[White pigment (C)]
The white pigment (C), which is an essential component of the curable resin composition of the present invention, mainly imparts high light reflectivity to the cured product (reflector), and also functions to reduce its linear expansion coefficient. Have. As the white pigment (C), known or commonly used white pigments can be used, and are not particularly limited. For example, glass, clay, mica, talc, kaolinite (kaolin), halloysite, zeolite, acidic clay, active Inorganic white pigments such as clay, boehmite, pseudoboehmite, inorganic oxides, metal salts [for example, alkaline earth metal salts]; styrene resins, benzoguanamine resins, urea-formalin resins, melamine-formalin resins, amides Organic white pigments (plastic pigments, etc.) such as resin pigments such as resin-based resins; hollow particles having a hollow structure (balloon structure), and the like.
白色顔料(C)としては、リフレクターの反射率を高くするため屈折率が高い白色顔料を使用することが好ましく、例えば、屈折率が1.5以上の白色顔料が好ましい。但し、中空粒子構造を有する白色顔料は内部(コア)に低屈折率の気体を含み表面反射率が非常に大きいので、シェル部分は屈折率が1.5より低い材料で構成されていてもよい。なお、白色顔料(C)として例示するもののうち、無機充填剤(D)にも該当するものについては、屈折率が1.5以上のものは白色顔料(C)とし、屈折率が1.5より小さいものは無機充填剤(D)とする。 As the white pigment (C), it is preferable to use a white pigment having a high refractive index in order to increase the reflectance of the reflector. For example, a white pigment having a refractive index of 1.5 or more is preferable. However, since the white pigment having a hollow particle structure contains a gas having a low refractive index inside (core) and has a very high surface reflectance, the shell portion may be made of a material having a refractive index lower than 1.5. . Of those exemplified as the white pigment (C), those corresponding to the inorganic filler (D) are those having a refractive index of 1.5 or more as the white pigment (C) and having a refractive index of 1.5. The smaller one is the inorganic filler (D).
上記無機酸化物としては、例えば、酸化アルミニウム(アルミナ)、酸化マグネシウム、酸化アンチモン、酸化チタン[例えば、ルチル型酸化チタン、アナターゼ型酸化チタン、ブルッカイト型酸化チタン等]、酸化ジルコニウム、酸化亜鉛等が挙げられる。また、上記アルカリ土類金属塩としては、例えば、炭酸マグネシウム、炭酸カルシウム、炭酸バリウム、ケイ酸マグネシウム、ケイ酸カルシウム、水酸化マグネシウム、リン酸マグネシウム、リン酸水素マグネシウム、硫酸マグネシウム、硫酸カルシウム、硫酸バリウム等が挙げられる。また、アルカリ土類金属塩以外の金属塩としては、例えば、ケイ酸アルミニウム、水酸化アルミニウム、硫化亜鉛等が挙げられる。 Examples of the inorganic oxide include aluminum oxide (alumina), magnesium oxide, antimony oxide, titanium oxide [eg, rutile titanium oxide, anatase titanium oxide, brookite titanium oxide, etc.], zirconium oxide, zinc oxide, and the like. Can be mentioned. Examples of the alkaline earth metal salt include magnesium carbonate, calcium carbonate, barium carbonate, magnesium silicate, calcium silicate, magnesium hydroxide, magnesium phosphate, magnesium hydrogen phosphate, magnesium sulfate, calcium sulfate, and sulfuric acid. Barium etc. are mentioned. Examples of the metal salt other than the alkaline earth metal salt include aluminum silicate, aluminum hydroxide, and zinc sulfide.
上記中空粒子としては、特に限定されないが、例えば、無機ガラス[例えば、珪酸ソーダガラス、アルミ珪酸ガラス、硼珪酸ソーダガラス、石英等]、シリカ、アルミナ等の金属酸化物、炭酸カルシウム、炭酸バリウム、炭酸ニッケル、珪酸カルシウム等の金属塩等の無機物により構成された無機中空粒子(シラスバルーン等の天然物も含む);スチレン系樹脂、アクリル系樹脂、シリコーン系樹脂、アクリル-スチレン系樹脂、塩化ビニル系樹脂、塩化ビニリデン系樹脂、アミド系樹脂、ウレタン系樹脂、フェノール系樹脂、スチレン-共役ジエン系樹脂、アクリル-共役ジエン系樹脂、オレフィン系樹脂等のポリマー(これらポリマーの架橋体も含む)等の有機物により構成された有機中空粒子;無機物と有機物のハイブリッド材料により構成された無機-有機中空粒子等が挙げられる。なお、上記中空粒子は、単一の材料より構成されたものであってもよいし、二種以上の材料より構成されたものであってもよい。また、上記中空粒子の中空部(中空粒子の内部の空間)は、真空状態であってもよいし、媒質で満たされていてもよいが、特に、反射率向上の観点では、屈折率が低い媒質(例えば、窒素、アルゴン等の不活性ガスや空気等)で満たされた中空粒子が好ましい。 Although it does not specifically limit as said hollow particle, For example, inorganic glass [For example, silicate glass, aluminum silicate glass, sodium borosilicate glass, quartz, etc.], metal oxides, such as silica and alumina, calcium carbonate, barium carbonate, Inorganic hollow particles composed of inorganic materials such as nickel carbonate, calcium silicate and other metal salts (including natural products such as shirasu balloon); styrene resins, acrylic resins, silicone resins, acrylic-styrene resins, vinyl chloride -Based resins, vinylidene chloride-based resins, amide-based resins, urethane-based resins, phenol-based resins, styrene-conjugated diene-based resins, acrylic-conjugated diene-based resins, olefin-based polymers (including cross-linked products of these polymers), etc. Organic hollow particles composed of organic materials; hybrid materials of inorganic and organic materials Configured inorganic Ri - organic hollow particles, and the like. In addition, the said hollow particle may be comprised from the single material, and may be comprised from 2 or more types of materials. In addition, the hollow portion of the hollow particles (the space inside the hollow particles) may be in a vacuum state or may be filled with a medium. However, particularly from the viewpoint of improving the reflectance, the refractive index is low. Hollow particles filled with a medium (for example, an inert gas such as nitrogen or argon or air) are preferred.
なお、白色顔料(C)は、公知乃至慣用の表面処理[例えば、金属酸化物、シランカップリング剤、チタンカップリング剤、有機酸、ポリオール、シリコーン等の表面処理剤による表面処理等]が施されたものであってもよい。このような表面処理を施すことにより、硬化性樹脂組成物における他の成分との相溶性や分散性を向上させることができる場合がある。 The white pigment (C) is subjected to a known or conventional surface treatment [for example, a surface treatment with a surface treatment agent such as a metal oxide, a silane coupling agent, a titanium coupling agent, an organic acid, a polyol, or silicone]. It may be what was done. By performing such a surface treatment, there are cases where compatibility and dispersibility with other components in the curable resin composition can be improved.
中でも、白色顔料(C)としては、入手性、耐熱性、耐光性の観点、及び硬化物(リフレクター)の高反射率及び添加量に対する光反射性の上昇率の観点で、無機酸化物、無機中空粒子が好ましく、より好ましくは酸化アルミニウム、酸化マグネシウム、酸化アンチモン、酸化チタン、酸化ジルコニウム、酸化亜鉛、硫酸バリウム、無機中空粒子、さらに好ましくは酸化チタン、酸化ジルコニウム、酸化亜鉛、硫酸バリウムである。特に、白色顔料(C)としては、より高い屈折率を有する点で、酸化チタンが好ましい。 Among these, as the white pigment (C), from the viewpoint of availability, heat resistance, light resistance, and high reflectance of the cured product (reflector) and light reflectance increase rate with respect to the addition amount, inorganic oxides, inorganic Hollow particles are preferred, more preferably aluminum oxide, magnesium oxide, antimony oxide, titanium oxide, zirconium oxide, zinc oxide, barium sulfate, inorganic hollow particles, and more preferably titanium oxide, zirconium oxide, zinc oxide, barium sulfate. In particular, the white pigment (C) is preferably titanium oxide because it has a higher refractive index.
白色顔料(C)の形状は、特に限定されず、例えば、球状、破砕状、繊維状、針状、鱗片状等が挙げられる。中でも、分散性の観点で、球状の酸化チタンが好ましく、特に真球状の酸化チタン(例えば、アスペクト比が1.2以下の球状の酸化チタン)が好ましい。 The shape of the white pigment (C) is not particularly limited, and examples thereof include a spherical shape, a crushed shape, a fibrous shape, a needle shape, and a scale shape. Among them, spherical titanium oxide is preferable from the viewpoint of dispersibility, and spherical titanium oxide (for example, spherical titanium oxide having an aspect ratio of 1.2 or less) is particularly preferable.
白色顔料(C)の中心粒径は、特に限定されないが、硬化物(リフレクター)の光反射性向上の観点で、0.1~50μmが好ましい。特に、白色顔料(C)として酸化チタンを使用する場合、該酸化チタンの中心粒径は、特に限定されないが、0.1~50μmが好ましく、より好ましくは0.1~30μm、さらに好ましくは0.1~20μm、特に好ましくは0.1~10μm、最も好ましくは0.1~5μmである。一方、白色顔料(C)として中空粒子(特に、無機中空粒子)を用いる場合、該中空粒子の中心粒径は、特に限定されないが、0.1~50μmが好ましく、より好ましくは0.1~30μmである。なお、上記中心粒径は、レーザー回折・散乱法で測定した粒度分布における積算値50%での粒径(メディアン径)を意味する。 The center particle diameter of the white pigment (C) is not particularly limited, but is preferably 0.1 to 50 μm from the viewpoint of improving the light reflectivity of the cured product (reflector). In particular, when titanium oxide is used as the white pigment (C), the center particle diameter of the titanium oxide is not particularly limited, but is preferably 0.1 to 50 μm, more preferably 0.1 to 30 μm, and still more preferably 0. .1 to 20 μm, particularly preferably 0.1 to 10 μm, most preferably 0.1 to 5 μm. On the other hand, when hollow particles (particularly inorganic hollow particles) are used as the white pigment (C), the center particle diameter of the hollow particles is not particularly limited, but is preferably 0.1 to 50 μm, more preferably 0.1 to 30 μm. In addition, the said center particle size means the particle size (median diameter) in the integrated value 50% in the particle size distribution measured by the laser diffraction / scattering method.
本発明の硬化性樹脂組成物において白色顔料(C)は、一種を単独で使用することもできるし、二種以上を組み合わせて使用することもできる。また、白色顔料(C)は、公知乃至慣用の方法により製造することもできるし、例えば、商品名「SR-1」、「R-42」、「R-45M」、「R-650」、「R-32」、「R-5N」、「GTR-100」、「R-62N」、「R-7E」、「R-44」、「R-3L」、「R-11P」、「R-21」、「R-25」、「TCR-52」、「R-310」、「D-918」、「FTR-700」(以上、堺化学工業(株)製)、商品名「タイペークCR-50」、「CR-50-2」、「CR-60」、「CR-60-2」、「CR-63」、「CR-80」、「CR-90」、「CR-90-2」、「CR-93」、「CR-95」、「CR-97」(以上、石原産業(株)製)、商品名「JR-301」、「JR-403」、「JR-405」、「JR-600A」、「JR-605」、「JR-600E」、「JR-603」、「JR-805」、「JR-806」、「JR-701」、「JRNC」、「JR-800」、「JR」(以上、テイカ(株)製)、商品名「TR-600」、「TR-700」、「TR-750」、「TR-840」、「TR-900」(以上、富士チタン工業(株)製)、商品名「KR-310」、「KR-380」、「KR-380N」、「ST-410WB」、「ST-455」、「ST-455WB」、「ST-457SA」、「ST-457EC」、「ST-485SA15」、「ST-486SA」、「ST-495M」(以上、チタン工業(株)製)等のルチル型酸化チタン;商品名「A-110」、「TCA-123E」、「A-190」、「A-197」、「SA-1」、「SA-1L」、「SSPシリーズ」、「CSBシリーズ」(以上、堺化学工業(株)製)、商品名「JA-1」、「JA-C」、「JA-3」(以上、テイカ(株)製)、商品名「KA-10」、「KA-15」、「KA-20」、「STT-65C-S」、「STT-30EHJ」(以上、チタン工業(株)製)、商品名「DCF-T-17007」、「DCF-T-17008」、「DCF-T-17050」(以上、レジノカラー工業(株)製)等のアナターゼ型酸化チタン等の市販品を使用することもできる。 In the curable resin composition of the present invention, the white pigment (C) can be used alone or in combination of two or more. The white pigment (C) can also be produced by a known or conventional method. For example, trade names “SR-1”, “R-42”, “R-45M”, “R-650”, “R-32”, “R-5N”, “GTR-100”, “R-62N”, “R-7E”, “R-44”, “R-3L”, “R-11P”, “R -21 "," R-25 "," TCR-52 "," R-310 "," D-918 "," FTR-700 "(manufactured by Sakai Chemical Industry Co., Ltd.) -50 "," CR-50-2 "," CR-60 "," CR-60-2 "," CR-63 "," CR-80 "," CR-90 "," CR-90-2 " "," CR-93 "," CR-95 "," CR-97 "(manufactured by Ishihara Sangyo Co., Ltd.), trade names" JR-301 "," JR-403 " JR-405, JR-600A, JR-605, JR-600E, JR-603, JR-805, JR-806, JR-701, JRNC , "JR-800", "JR" (manufactured by Teika Co., Ltd.), trade names "TR-600", "TR-700", "TR-750", "TR-840", "TR-900 (Fuji Titanium Industry Co., Ltd.), trade names “KR-310”, “KR-380”, “KR-380N”, “ST-410WB”, “ST-455”, “ST-455WB” , “ST-457SA”, “ST-457EC”, “ST-485SA15”, “ST-486SA”, “ST-495M” (above, manufactured by Titanium Industry Co., Ltd.), etc .; A-110 "," TCA-123 " "," A-190 "," A-197 "," SA-1 "," SA-1L "," SSP series "," CSB series "(above, manufactured by Sakai Chemical Industry Co., Ltd.) "JA-1", "JA-C", "JA-3" (manufactured by Teika Co., Ltd.), trade names "KA-10", "KA-15", "KA-20", "STT-65C" -S "," STT-30EHJ "(above, manufactured by Titanium Industry Co., Ltd.), trade names" DCF-T-17007 "," DCF-T-17008 "," DCF-T-17050 "(above, Resino Color Industries) Commercial products such as anatase-type titanium oxide such as (manufactured by Co., Ltd.) can also be used.
中でも、白色顔料(C)としては、特に硬化物(リフレクター)の光反射性及び耐熱性向上の観点で、商品名「R-62N」、「CR-60」、「DCF-T-17007」、「DCF-T-17008」、「DCF-T-17050」、「FTR-700」が好ましい。 Among them, as the white pigment (C), the product names “R-62N”, “CR-60”, “DCF-T-17007”, especially from the viewpoint of improving the light reflectivity and heat resistance of the cured product (reflector), “DCF-T-17008”, “DCF-T-17050”, and “FTR-700” are preferable.
本発明の硬化性樹脂組成物における白色顔料(C)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物(100重量%)に対して、0.1~50重量%が好ましく、より好ましくは1~40重量%、さらに好ましくは5~35重量%である。白色顔料(C)の含有量を0.1重量%以上とすることにより、硬化物(リフレクター)の光反射性がより向上する傾向がある。また、耐熱性及び耐光性がより向上する傾向がある。一方、白色顔料(C)の含有量を60重量%以下とすることにより、硬化物(リフレクター)の成型性が向上し、量産により適する傾向がある。 The content (blending amount) of the white pigment (C) in the curable resin composition of the present invention is not particularly limited, but is 0.1 to 50% by weight with respect to the curable resin composition (100% by weight). Preferably, it is 1 to 40% by weight, more preferably 5 to 35% by weight. There exists a tendency for the light reflectivity of hardened | cured material (reflector) to improve more by making content of a white pigment (C) 0.1 weight% or more. Moreover, there exists a tendency for heat resistance and light resistance to improve more. On the other hand, when the content of the white pigment (C) is 60% by weight or less, the moldability of the cured product (reflector) is improved and tends to be more suitable for mass production.
本発明の硬化性樹脂組成物における白色顔料(C)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物に含まれるエポキシ基を有する化合物の全量100重量部に対して、10~600重量部が好ましく、より好ましくは30~500重量部、さらに好ましくは30~400重量部である。白色顔料(C)の含有量が10重量部以上であることにより、硬化物(リフレクター)の光反射性がより向上する傾向がある。また、耐熱性及び耐光性がより向上する傾向がある。一方、白色顔料(C)の含有量が600重量部以下であることにより、硬化物(リフレクター)の成型性が向上し、量産により適する傾向がある。 The content (blending amount) of the white pigment (C) in the curable resin composition of the present invention is not particularly limited, but is based on 100 parts by weight of the total amount of compounds having an epoxy group contained in the curable resin composition. The amount is preferably 10 to 600 parts by weight, more preferably 30 to 500 parts by weight, still more preferably 30 to 400 parts by weight. There exists a tendency for the light reflectivity of hardened | cured material (reflector) to improve more because content of a white pigment (C) is 10 weight part or more. Moreover, there exists a tendency for heat resistance and light resistance to improve more. On the other hand, when the content of the white pigment (C) is 600 parts by weight or less, the moldability of the cured product (reflector) is improved and tends to be more suitable for mass production.
本発明の硬化性樹脂組成物に酸化チタンが含まれる場合、白色顔料(C)と無機充填剤(D)の総量(100重量%)に対する酸化チタンの割合は、特に限定されないが、硬化物(リフレクター)の耐熱性と光反射性のバランスの観点で、5~70重量%が好ましく、より好ましくは10~60重量%である。酸化チタンの割合を5重量%以上とすることにより、硬化物(リフレクター)の光反射性がより向上する傾向がある。また、耐熱性及び耐光性がより向上する傾向がある。一方、酸化チタンの割合を70重量%以下とすることにより、硬化物(リフレクター)の成型性が向上し、量産により適する傾向がある。 When titanium oxide is contained in the curable resin composition of the present invention, the ratio of titanium oxide to the total amount (100% by weight) of the white pigment (C) and the inorganic filler (D) is not particularly limited, but a cured product ( From the viewpoint of the balance between heat resistance and light reflectivity of the reflector, the content is preferably 5 to 70% by weight, more preferably 10 to 60% by weight. By making the ratio of titanium oxide 5% by weight or more, the light reflectivity of the cured product (reflector) tends to be further improved. Moreover, there exists a tendency for heat resistance and light resistance to improve more. On the other hand, by setting the proportion of titanium oxide to 70% by weight or less, the moldability of the cured product (reflector) is improved and tends to be more suitable for mass production.
[無機充填剤(D)]
本発明の硬化性樹脂組成物は、白色顔料(C)とは別に、無機充填剤(D)を必須成分として含む。無機充填剤(D)は、主に、硬化物(リフレクター)に優れた耐熱性及び耐光性(特に、優れた耐熱性)を付与する。また、硬化物(リフレクター)の線膨張率を低減させる働きを有する。また、無機充填剤(D)の種類によっては、硬化物(リフレクター)に対して優れた光反射性を付与できる場合もある。
[Inorganic filler (D)]
The curable resin composition of the present invention contains an inorganic filler (D) as an essential component separately from the white pigment (C). The inorganic filler (D) mainly imparts excellent heat resistance and light resistance (particularly excellent heat resistance) to the cured product (reflector). Moreover, it has the function to reduce the linear expansion coefficient of hardened | cured material (reflector). Moreover, depending on the kind of inorganic filler (D), the light reflectivity excellent with respect to hardened | cured material (reflector) may be provided.
無機充填剤(D)としては、公知乃至慣用の無機充填剤を使用することができ、特に限定されないが、例えば、シリカ、アルミナ、ジルコン、珪酸カルシウム、リン酸カルシウム、炭酸カルシウム、炭酸マグネシウム、炭化ケイ素、窒化ケイ素、窒化アルミニウム、窒化ホウ素、水酸化アルミニウム、酸化鉄、酸化亜鉛、酸化ジルコニウム、酸化マグネシウム、酸化チタン、酸化アルミニウム、硫酸カルシウム、硫酸バリウム、フォステライト、ステアタイト、スピネル、クレー、カオリン、ドロマイト、ヒドロキシアパタイト、ネフェリンサイナイト、クリストバライト、ウォラストナイト、珪藻土、タルク等の粉体、又はこれらの成型体(例えば、球形化したビーズ等)等が挙げられる。また、無機充填剤(D)としては、上述の無機充填剤に公知乃至慣用の表面処理が施されたもの等も挙げられる。中でも、無機充填剤(D)としては、硬化物(リフレクター)の耐熱性、耐光性、及び流動性の観点で、シリカ、アルミナ、窒化ケイ素、窒化アルミニウム、窒化ホウ素が好ましい。 As the inorganic filler (D), a known or conventional inorganic filler can be used, and is not particularly limited. For example, silica, alumina, zircon, calcium silicate, calcium phosphate, calcium carbonate, magnesium carbonate, silicon carbide, Silicon nitride, aluminum nitride, boron nitride, aluminum hydroxide, iron oxide, zinc oxide, zirconium oxide, magnesium oxide, titanium oxide, aluminum oxide, calcium sulfate, barium sulfate, fosterite, steatite, spinel, clay, kaolin, dolomite , Hydroxyapatite, nepheline sinite, cristobalite, wollastonite, diatomaceous earth, talc and the like, or moldings thereof (for example, spherical beads). Examples of the inorganic filler (D) include those obtained by subjecting the above-described inorganic filler to a known or conventional surface treatment. Among these, silica, alumina, silicon nitride, aluminum nitride, and boron nitride are preferable as the inorganic filler (D) from the viewpoint of heat resistance, light resistance, and fluidity of the cured product (reflector).
シリカとしては、特に限定されず、例えば、溶融シリカ、結晶シリカ、高純度合成シリカ等の公知乃至慣用のシリカを使用できる。なお、シリカとしては、公知乃至慣用の表面処理[例えば、金属酸化物、シランカップリング剤、チタンカップリング剤、有機酸、ポリオール、シリコーン等の表面処理剤による表面処理等]が施されたものを使用することもできる。 The silica is not particularly limited, and for example, known or commonly used silica such as fused silica, crystalline silica, high-purity synthetic silica or the like can be used. Silica has been subjected to a known or conventional surface treatment [for example, surface treatment with a surface treatment agent such as a metal oxide, a silane coupling agent, a titanium coupling agent, an organic acid, a polyol, or silicone]. Can also be used.
シリカの形状は、特に限定されないが、例えば、粉体、球状、破砕状、繊維状、針状、鱗片状等が挙げられる。中でも、分散性の観点で、球状のシリカが好ましく、特に真球状のシリカ(例えば、アスペクト比が1.2以下の球状のシリカ)が好ましい。 The shape of silica is not particularly limited, and examples thereof include powder, spherical shape, crushed shape, fibrous shape, needle shape, scale shape, and the like. Among these, spherical silica is preferable from the viewpoint of dispersibility, and spherical silica (for example, spherical silica having an aspect ratio of 1.2 or less) is particularly preferable.
シリカの中心粒径は、特に限定されないが、硬化物(リフレクター)の光反射性向上の観点で、0.1~50μmが好ましく、より好ましくは0.1~30μmである。なお、上記中心粒径は、レーザー回折・散乱法で測定した粒度分布における積算値50%での粒径(メディアン径)を意味する。 The center particle diameter of silica is not particularly limited, but is preferably 0.1 to 50 μm, more preferably 0.1 to 30 μm from the viewpoint of improving the light reflectivity of the cured product (reflector). In addition, the said center particle size means the particle size (median diameter) in the integrated value 50% in the particle size distribution measured by the laser diffraction / scattering method.
なお、本発明の硬化性樹脂組成物において無機充填剤(D)は、一種を単独で使用することもできるし、二種以上を組み合わせて使用することもできる。また、無機充填剤(D)は、公知乃至慣用の製造方法により製造することもできるし、例えば、商品名「FB-910」、「FB-940」、「FB-950」、「FB-105」、「FB-105FD」、「FB-5D」、「FB-8S」、「FB-7SDC」、「FB-5SDC」、「FB-3SDC」、「FB-9FDC」、「FB-7FDC」、「FB-5FDC」、「FB-970FD」、「FB-975FD」、「FB-950FD」、「FB-40RFD」等のFBシリーズ、商品名「DAW-03DC」、「DAW-0525」、「DAW-1025」等のDAWシリーズ、商品名「SGP」(以上、デンカ(株)製)、商品名「HF-05」((株)トクヤマ製)、商品名「10μmSE-CC5」((株)アドマテックス製)、商品名「MSR-2212」、「MSR-25」(以上、(株)龍森製)、商品名「HS-105」、「HS-106」、「HS-107」(以上、マイクロン社製)等の市販品を使用することもできる。 In the curable resin composition of the present invention, the inorganic filler (D) can be used alone or in combination of two or more. The inorganic filler (D) can also be produced by a known or conventional production method. For example, trade names “FB-910”, “FB-940”, “FB-950”, “FB-105” can be used. "," FB-105FD "," FB-5D "," FB-8S "," FB-7SDC "," FB-5SDC "," FB-3SDC "," FB-9FDC "," FB-7FDC ", FB series such as “FB-5FDC”, “FB-970FD”, “FB-975FD”, “FB-950FD”, “FB-40RFD”, product names “DAW-03DC”, “DAW-0525”, “DAW DAW series such as “-1025”, trade name “SGP” (manufactured by Denka), trade name “HF-05” (manufactured by Tokuyama), trade name “10 μm SE-CC5” (Admatech) Product names “MSR-2212”, “MSR-25” (above, manufactured by Tatsumori Co., Ltd.), product names “HS-105”, “HS-106”, “HS-107” (above, Micron) Commercially available products such as those manufactured by the company may also be used.
本発明の硬化性樹脂組成物における無機充填剤(D)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物(100重量%)に対して、10~90重量%が好ましく、より好ましくは13~75重量%、さらに好ましくは15~70重量%、さらに好ましくは20~70重量%である。無機充填剤(D)の含有量を10重量%以上とすることにより、硬化物の耐熱性及び耐光性(特に、優れた耐熱性)がより向上する傾向がある。また、硬化物(リフレクター)の線膨張係数が低くなって、該リフレクターを用いた光半導体素子搭載用基板におけるリードフレームの反り等の不具合が生じにくくなる傾向がある。一方、無機充填剤(D)の含有量を90重量%以下とすることにより、硬化物(リフレクター)の成型性が向上し、量産により適する傾向がある。 The content (blending amount) of the inorganic filler (D) in the curable resin composition of the present invention is not particularly limited, but is preferably 10 to 90% by weight with respect to the curable resin composition (100% by weight). More preferably, it is 13 to 75% by weight, more preferably 15 to 70% by weight, and still more preferably 20 to 70% by weight. By setting the content of the inorganic filler (D) to 10% by weight or more, the heat resistance and light resistance (particularly excellent heat resistance) of the cured product tend to be further improved. In addition, the linear expansion coefficient of the cured product (reflector) tends to be low, and problems such as lead frame warpage in an optical semiconductor element mounting substrate using the reflector tend not to occur. On the other hand, when the content of the inorganic filler (D) is 90% by weight or less, the moldability of the cured product (reflector) is improved and tends to be more suitable for mass production.
本発明の硬化性樹脂組成物における無機充填剤(D)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物に含まれるエポキシ基を有する化合物の全量100重量部に対して、10~1500重量部が好ましく、より好ましくは50~1200重量部、さらに好ましくは100~1000重量部である。無機充填剤(D)の含有量が10重量部以上であることにより、硬化物の耐熱性及び耐光性(特に、優れた耐熱性)がより向上する傾向がある。また、硬化物(リフレクター)の線膨張係数が低くなって、該リフレクターを用いた光半導体素子搭載用基板におけるリードフレームの反り等の不具合が生じにくくなる傾向がある。一方、無機充填剤(D)の含有量が1500重量部以下であることにより、硬化物(リフレクター)の成型性が向上し、量産により適する傾向がある。 The content (blending amount) of the inorganic filler (D) in the curable resin composition of the present invention is not particularly limited, but is based on 100 parts by weight of the total amount of compounds having an epoxy group contained in the curable resin composition. The amount is preferably 10 to 1500 parts by weight, more preferably 50 to 1200 parts by weight, and still more preferably 100 to 1000 parts by weight. When the content of the inorganic filler (D) is 10 parts by weight or more, the heat resistance and light resistance (particularly excellent heat resistance) of the cured product tend to be further improved. In addition, the linear expansion coefficient of the cured product (reflector) tends to be low, and problems such as lead frame warpage in an optical semiconductor element mounting substrate using the reflector tend not to occur. On the other hand, when the content of the inorganic filler (D) is 1500 parts by weight or less, the moldability of the cured product (reflector) is improved and tends to be more suitable for mass production.
本発明の硬化性樹脂組成物における白色顔料(C)及び無機充填剤(D)の最大粒子径は、特に限定されないが、200μm以下が好ましく、より好ましくは185μm以下、さらに好ましくは175μm以下、特に好ましくは150μm以下である。上記最大粒子径が200μm以下であると、最大粒子径が200μmを超える白色顔料又は無機充填剤を用いる場合よりも、硬化物の耐熱性、耐光性、及び耐クラック性(特に、優れた耐熱性)がさらに優れる傾向がある。また、最大粒子径が小さい白色顔料(C)及び無機充填剤(D)を用いることにより、これらの含有量を増やすことが可能となり、硬化物の光反射性、耐熱性及び耐光性がよりいっそう向上する傾向がある。上記最大粒子径の下限は、例えば0.01μm以上である。なお、上記最大粒子径は、本発明の硬化性樹脂組成物に含まれる白色顔料(C)及び無機充填剤(D)のトータルの最大粒子径である。上記最大粒子径は、レーザー回折・散乱法で測定した粒度分布における最大の粒径を意味する。 The maximum particle size of the white pigment (C) and the inorganic filler (D) in the curable resin composition of the present invention is not particularly limited, but is preferably 200 μm or less, more preferably 185 μm or less, still more preferably 175 μm or less, particularly Preferably it is 150 micrometers or less. When the maximum particle size is 200 μm or less, the cured product has heat resistance, light resistance, and crack resistance (especially excellent heat resistance) as compared with the case of using a white pigment or an inorganic filler having a maximum particle size exceeding 200 μm. ) Tends to be even better. Further, by using the white pigment (C) and the inorganic filler (D) having a small maximum particle size, it is possible to increase their contents, and the light reflectivity, heat resistance and light resistance of the cured product are further increased. There is a tendency to improve. The lower limit of the maximum particle size is, for example, 0.01 μm or more. The maximum particle size is the total maximum particle size of the white pigment (C) and the inorganic filler (D) contained in the curable resin composition of the present invention. The maximum particle size means the maximum particle size in the particle size distribution measured by the laser diffraction / scattering method.
[硬化剤(E)]
本発明の硬化性樹脂組成物における硬化剤(E)は、脂環式エポキシ化合物(A)等のエポキシ基を有する化合物と反応することにより、硬化性樹脂組成物を硬化させる働きを有する化合物である。硬化剤(E)としては、公知乃至慣用のエポキシ樹脂用硬化剤を使用することができ、特に限定されないが、例えば、酸無水物類(酸無水物系硬化剤)、アミン類(アミン系硬化剤)、ポリアミド樹脂、イミダゾール類(イミダゾール系硬化剤)、ポリメルカプタン類(ポリメルカプタン系硬化剤)、フェノール類(フェノール系硬化剤)、ポリカルボン酸類、ジシアンジアミド類、有機酸ヒドラジド等が挙げられる。
[Curing agent (E)]
The curing agent (E) in the curable resin composition of the present invention is a compound having a function of curing the curable resin composition by reacting with a compound having an epoxy group such as an alicyclic epoxy compound (A). is there. As the curing agent (E), a known or conventional epoxy resin curing agent can be used, and is not particularly limited. For example, acid anhydrides (acid anhydride curing agents), amines (amine curing) Agents), polyamide resins, imidazoles (imidazole-based curing agents), polymercaptans (polymercaptan-based curing agents), phenols (phenol-based curing agents), polycarboxylic acids, dicyandiamides, organic acid hydrazides and the like.
硬化剤(E)としての酸無水物類(酸無水物系硬化剤)としては、公知乃至慣用の酸無水物系硬化剤を使用でき、特に限定されないが、例えば、メチルテトラヒドロ無水フタル酸(4-メチルテトラヒドロ無水フタル酸、3-メチルテトラヒドロ無水フタル酸等)、メチルヘキサヒドロ無水フタル酸(4-メチルヘキサヒドロ無水フタル酸、3-メチルヘキサヒドロ無水フタル酸等)、ドデセニル無水コハク酸、メチルエンドメチレンテトラヒドロ無水フタル酸、無水フタル酸、無水マレイン酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、メチルシクロヘキセンジカルボン酸無水物、無水ピロメリット酸、無水トリメリット酸、ベンゾフェノンテトラカルボン酸無水物、無水ナジック酸、無水メチルナジック酸、水素化メチルナジック酸無水物、4-(4-メチル-3-ペンテニル)テトラヒドロ無水フタル酸、無水コハク酸、無水アジピン酸、無水セバシン酸、無水ドデカン二酸、メチルシクロヘキセンテトラカルボン酸無水物、ビニルエーテル-無水マレイン酸共重合体、アルキルスチレン-無水マレイン酸共重合体等が挙げられる。中でも、均一な硬化性樹脂組成物を効率的に調製することができる観点、脂環式エポキシ化合物(A)と混合して25℃で液状の混合物(硬化剤組成物)としやすい観点で、25℃で液状の酸無水物[例えば、メチルテトラヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、ドデセニル無水コハク酸、メチルエンドメチレンテトラヒドロ無水フタル酸等]が好ましい。一方、25℃で固体状の酸無水物については、例えば、25℃で液状の酸無水物に溶解させて液状の混合物とすることで、本発明の硬化性樹脂組成物における硬化剤(E)としての取り扱い性が向上する傾向がある。酸無水物系硬化剤としては、硬化物の耐熱性、光反射性の観点で、飽和単環炭化水素ジカルボン酸の無水物(環にアルキル基等の置換基が結合したものも含む)が好ましい。 As the acid anhydrides (acid anhydride curing agents) as the curing agent (E), known or conventional acid anhydride curing agents can be used, and are not particularly limited. For example, methyltetrahydrophthalic anhydride (4 -Methyltetrahydrophthalic anhydride, 3-methyltetrahydrophthalic anhydride, etc.), methylhexahydrophthalic anhydride (such as 4-methylhexahydrophthalic anhydride, 3-methylhexahydrophthalic anhydride), dodecenyl succinic anhydride, methyl Endomethylenetetrahydrophthalic anhydride, phthalic anhydride, maleic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylcyclohexene dicarboxylic anhydride, pyromellitic anhydride, trimellitic anhydride, benzophenonetetracarboxylic anhydride, anhydrous Nadic acid, methyl nadic acid anhydride, hydrogenated methyl Nadic acid anhydride, 4- (4-methyl-3-pentenyl) tetrahydrophthalic anhydride, succinic anhydride, adipic anhydride, sebacic anhydride, dodecanedioic anhydride, methylcyclohexene tetracarboxylic anhydride, vinyl ether-maleic anhydride Examples include acid copolymers and alkylstyrene-maleic anhydride copolymers. Above all, from the viewpoint of efficiently preparing a uniform curable resin composition, from the viewpoint of easily mixing with the alicyclic epoxy compound (A) to form a liquid mixture (curing agent composition) at 25 ° C., 25 Preference is given to acid anhydrides [for example, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, dodecenyl succinic anhydride, methylendomethylenetetrahydrophthalic anhydride, etc.] that are liquid at ° C. On the other hand, for the acid anhydride that is solid at 25 ° C., for example, the curing agent (E) in the curable resin composition of the present invention is prepared by dissolving in a liquid acid anhydride at 25 ° C. to form a liquid mixture. As a result, the handling property tends to be improved. As the acid anhydride curing agent, from the viewpoint of heat resistance and light reflectivity of the cured product, anhydrides of saturated monocyclic hydrocarbon dicarboxylic acids (including those having a substituent such as an alkyl group bonded to the ring) are preferable. .
硬化剤(E)としてのアミン類(アミン系硬化剤)としては、公知乃至慣用のアミン系硬化剤を使用でき、特に限定されないが、例えば、エチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン、テトラエチレンペンタミン、ジプロピレンジアミン、ジエチルアミノプロピルアミン、ポリプロピレントリアミン等の脂肪族ポリアミン;メンセンジアミン、イソホロンジアミン、ビス(4-アミノ-3-メチルジシクロヘキシル)メタン、ジアミノジシクロヘキシルメタン、ビス(アミノメチル)シクロヘキサン、N-アミノエチルピペラジン、3,9-ビス(3-アミノプロピル)-3,4,8,10-テトラオキサスピロ[5,5]ウンデカン等の脂環式ポリアミン;m-フェニレンジアミン、p-フェニレンジアミン、トリレン-2,4-ジアミン、トリレン-2,6-ジアミン、メシチレン-2,4-ジアミン、3,5-ジエチルトリレン-2,4-ジアミン、3,5-ジエチルトリレン-2,6-ジアミン等の単核ポリアミン、ビフェニレンジアミン、4,4-ジアミノジフェニルメタン、2,5-ナフチレンジアミン、2,6-ナフチレンジアミン等の芳香族ポリアミン等が挙げられる。 As the amines (amine-based curing agent) as the curing agent (E), a known or conventional amine-based curing agent can be used, and is not particularly limited. For example, ethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, Aliphatic polyamines such as dipropylenediamine, diethylaminopropylamine, polypropylenetriamine; mensendiamine, isophoronediamine, bis (4-amino-3-methyldicyclohexyl) methane, diaminodicyclohexylmethane, bis (aminomethyl) cyclohexane, N-amino Cycloaliphatic polyamines such as ethylpiperazine, 3,9-bis (3-aminopropyl) -3,4,8,10-tetraoxaspiro [5,5] undecane; m-phenylenediamine, p-phenylenediamine, Len-2,4-diamine, tolylene-2,6-diamine, mesitylene-2,4-diamine, 3,5-diethyltolylene-2,4-diamine, 3,5-diethyltolylene-2,6- Examples thereof include mononuclear polyamines such as diamine, aromatic polyamines such as biphenylenediamine, 4,4-diaminodiphenylmethane, 2,5-naphthylenediamine, and 2,6-naphthylenediamine.
硬化剤(E)としてのフェノール類(フェノール系硬化剤)としては、公知乃至慣用のフェノール系硬化剤を使用でき、特に限定されないが、例えば、ノボラック型フェノール樹脂、ノボラック型クレゾール樹脂、パラキシリレン変性フェノール樹脂、パラキシリレン・メタキシリレン変性フェノール樹脂等のアラルキル樹脂、テルペン変性フェノール樹脂、ジシクロペンタジエン変性フェノール樹脂、トリフェノールプロパン等が挙げられる。 As the phenols (phenolic curing agents) as the curing agent (E), known or conventional phenolic curing agents can be used, and are not particularly limited. For example, novolac type phenol resins, novolac type cresol resins, paraxylylene-modified phenols. Examples thereof include aralkyl resins such as resins, paraxylylene / metaxylylene-modified phenol resins, terpene-modified phenol resins, dicyclopentadiene-modified phenol resins, and triphenol propane.
硬化剤(E)としてのポリアミド樹脂としては、例えば、分子内に第1級アミノ基及び第2級アミノ基のいずれか一方又は両方を有するポリアミド樹脂等が挙げられる。 Examples of the polyamide resin as the curing agent (E) include a polyamide resin having one or both of a primary amino group and a secondary amino group in the molecule.
硬化剤(E)としてのイミダゾール類(イミダゾール系硬化剤)としては、公知乃至慣用のイミダゾール系硬化剤を使用でき、特に限定されないが、例えば、2-メチルイミダゾール、2-エチル-4-メチルイミダゾール、2-ウンデシルイミダゾール、2-ヘプタデシルイミダゾール、2-フェニルイミダゾール、1-ベンジル-2-メチルイミダゾール、1-シアノエチル-2-メチルイミダゾール、1-シアノエチル-2-エチル-4-メチルイミダゾール、1-シアノエチル-2-ウンデシルイミダゾール、1-シアノエチル-2-ウンデシルイミダゾリウムトリメリテート、1-シアノエチル-2-フェニルイミダゾリウムトリメリテート、2-メチルイミダゾリウムイソシアヌレート、2-フェニルイミダゾリウムイソシアヌレート、2,4-ジアミノ-6-[2-メチルイミダゾリル-(1)]-エチル-s-トリアジン、2,4-ジアミノ-6-[2-エチル-4-メチルイミダゾリル-(1)]-エチル-s-トリアジン等が挙げられる。 As the imidazole (imidazole curing agent) as the curing agent (E), a known or commonly used imidazole curing agent can be used, and is not particularly limited, and examples thereof include 2-methylimidazole and 2-ethyl-4-methylimidazole. 2-undecylimidazole, 2-heptadecylimidazole, 2-phenylimidazole, 1-benzyl-2-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1 -Cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2-methylimidazolium isocyanurate, 2-phenylimidazolium isocyanate 2,4-diamino-6- [2-methylimidazolyl- (1)]-ethyl-s-triazine, 2,4-diamino-6- [2-ethyl-4-methylimidazolyl- (1)]- And ethyl-s-triazine.
硬化剤(E)としてのポリメルカプタン類(ポリメルカプタン系硬化剤)としては、例えば、液状のポリメルカプタン、ポリスルフィド樹脂等が挙げられる。 Examples of the polymercaptans (polymercaptan-based curing agent) as the curing agent (E) include liquid polymercaptan and polysulfide resin.
硬化剤(E)としてのポリカルボン酸類としては、例えば、アジピン酸、セバシン酸、テレフタル酸、トリメリット酸、カルボキシ基含有ポリエステル等が挙げられる。 Examples of the polycarboxylic acids as the curing agent (E) include adipic acid, sebacic acid, terephthalic acid, trimellitic acid, carboxy group-containing polyester, and the like.
中でも、硬化剤(E)としては、硬化物の耐熱性、耐光性、光反射性の観点で、酸無水物類(酸無水物系硬化剤)が好ましい。なお、本発明の硬化性樹脂組成物において硬化剤(E)は、一種を単独で使用することもできるし、二種以上を組み合わせて使用することもできる。なお、硬化剤は公知乃至慣用の方法により製造することもできるし、例えば、商品名「リカシッドMH-700」、「リカシッドMH-700F」、「リカシッドMH-700G」、「リカシッドTH」、「リカシッドHH」、「リカシッドHNA-100」(以上、新日本理化(株)製);商品名「HN-5500」(日立化成工業(株)製);商品名「H-TMAn-S」、「H-TMAn」(以上、三菱ガス化学(株)製);商品名「YH1120」(三菱化学(株)製)等の市販品を使用することもできる。 Among these, as the curing agent (E), acid anhydrides (acid anhydride curing agents) are preferable from the viewpoints of heat resistance, light resistance, and light reflectivity of the cured product. In addition, the hardening | curing agent (E) can also be used individually by 1 type in the curable resin composition of this invention, and can also be used in combination of 2 or more type. The curing agent can be produced by a known or conventional method. For example, trade names “Licacid MH-700”, “Licacid MH-700F”, “Licacid MH-700G”, “Licacid TH”, “Licacid CI” "HH", "Licacid HNA-100" (manufactured by Shin Nippon Rika Co., Ltd.); trade name "HN-5500" (manufactured by Hitachi Chemical Co., Ltd.); trade names "H-TMAn-S", "H Commercially available products such as “TMAn” (Mitsubishi Gas Chemical Co., Ltd.); trade name “YH1120” (Mitsubishi Chemical Co., Ltd.) can also be used.
本発明の硬化性樹脂組成物が硬化剤(E)を含有する場合、硬化剤(E)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物(100重量%)に対して、1~40重量%が好ましく、より好ましくは3~35重量%、さらに好ましくは5~30重量%である。硬化剤(E)の含有量を1重量%以上とすることにより、硬化がより十分となり、硬化物の耐クラック性が向上する傾向がある。一方、硬化剤(E)の含有量を40重量%以下とすることにより、着色がより抑制され色相に優れた硬化物(リフレクター)が得られやすい傾向がある。 When the curable resin composition of this invention contains a hardening | curing agent (E), content (blending amount) of a hardening | curing agent (E) is although it does not specifically limit, With respect to curable resin composition (100 weight%) The content is preferably 1 to 40% by weight, more preferably 3 to 35% by weight, and still more preferably 5 to 30% by weight. By setting the content of the curing agent (E) to 1% by weight or more, the curing becomes more sufficient, and the crack resistance of the cured product tends to be improved. On the other hand, by setting the content of the curing agent (E) to 40% by weight or less, there is a tendency that a cured product (reflector) that is more suppressed in coloring and excellent in hue is easily obtained.
本発明の硬化性樹脂組成物が硬化剤(E)を含有する場合、硬化剤(E)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物に含まれるエポキシ基を有する化合物の全量100重量部に対して、40~200重量部が好ましく、より好ましくは50~150重量部である。より具体的には、硬化剤(E)として酸無水物類を使用する場合、本発明の硬化性樹脂組成物に含まれる全てのエポキシ基を有する化合物におけるエポキシ基1当量当たり、0.5~1.5当量となる割合で使用することが好ましい。硬化剤(E)の含有量を40重量部以上とすることにより、硬化がより十分となり、硬化物の耐クラック性が向上する傾向がある。一方、硬化剤(E)の含有量を200重量部以下とすることにより、着色がより抑制され色相に優れた硬化物(リフレクター)が得られやすい傾向がある。 When the curable resin composition of the present invention contains a curing agent (E), the content (blending amount) of the curing agent (E) is not particularly limited, but has an epoxy group contained in the curable resin composition. The amount is preferably 40 to 200 parts by weight, more preferably 50 to 150 parts by weight with respect to 100 parts by weight of the total amount of the compound. More specifically, when acid anhydrides are used as the curing agent (E), 0.5 to 0.5 per equivalent of epoxy group in the compound having all epoxy groups contained in the curable resin composition of the present invention. It is preferable to use it at a ratio of 1.5 equivalents. By setting the content of the curing agent (E) to 40 parts by weight or more, the curing becomes more sufficient and the crack resistance of the cured product tends to be improved. On the other hand, by setting the content of the curing agent (E) to 200 parts by weight or less, there is a tendency that a cured product (reflector) that is more suppressed in coloring and excellent in hue is easily obtained.
[硬化促進剤(F)]
本発明の硬化性樹脂組成物は、硬化促進剤(F)を含んでいてもよい。硬化促進剤(F)は、本発明の硬化性樹脂組成物に含まれるエポキシ基を有する化合物(例えば、脂環式エポキシ化合物(A)、イソシアヌル酸誘導体(H)、及びシロキサン誘導体(I))が硬化剤(E)等の硬化剤と反応する際、その反応速度を促進する機能を有する化合物である。硬化促進剤(F)としては、公知乃至慣用の硬化促進剤を使用することができ、例えば、1,8-ジアザビシクロ[5.4.0]ウンデセン-7(DBU)又はその塩(例えば、フェノール塩、オクチル酸塩、p-トルエンスルホン酸塩、ギ酸塩、テトラフェニルボレート塩等);1,5-ジアザビシクロ[4.3.0]ノネン-5(DBN)又はその塩(例えば、フェノール塩、オクチル酸塩、p-トルエンスルホン酸塩、ギ酸塩、テトラフェニルボレート塩等);ベンジルジメチルアミン、2,4,6-トリス(ジメチルアミノメチル)フェノール、N,N-ジメチルシクロヘキシルアミン等の第3級アミン;2-エチル-4-メチルイミダゾール、1-シアノエチル-2-エチル-4-メチルイミダゾール等のイミダゾール;リン酸エステル、トリフェニルホスフィン等のホスフィン類;テトラフェニルホスホニウムテトラ(p-トリル)ボレート等のホスホニウム化合物;オクチル酸亜鉛やオクチル酸スズ等の有機金属塩;金属キレート等が挙げられる。
[Curing accelerator (F)]
The curable resin composition of the present invention may contain a curing accelerator (F). The curing accelerator (F) is a compound having an epoxy group contained in the curable resin composition of the present invention (for example, alicyclic epoxy compound (A), isocyanuric acid derivative (H), and siloxane derivative (I)). Is a compound having a function of accelerating the reaction rate when reacting with a curing agent such as curing agent (E). As the curing accelerator (F), a known or conventional curing accelerator can be used. For example, 1,8-diazabicyclo [5.4.0] undecene-7 (DBU) or a salt thereof (for example, phenol) Salt, octylate, p-toluenesulfonate, formate, tetraphenylborate, etc.); 1,5-diazabicyclo [4.3.0] nonene-5 (DBN) or a salt thereof (eg, phenol salt, Octylate, p-toluenesulfonate, formate, tetraphenylborate, etc.); benzyldimethylamine, 2,4,6-tris (dimethylaminomethyl) phenol, N, N-dimethylcyclohexylamine, etc. Secondary amines; imidazoles such as 2-ethyl-4-methylimidazole and 1-cyanoethyl-2-ethyl-4-methylimidazole; Ether, phosphines such as triphenyl phosphine; phosphonium compounds such as tetraphenylphosphonium tetra (p- tolyl) borate, organometallic salts such as zinc octylate and tin octylate; metal chelate and the like.
本発明の硬化性樹脂組成物において硬化促進剤(F)は、一種を単独で使用することもできるし、二種以上を組み合わせて使用することもできる。 In the curable resin composition of the present invention, the curing accelerator (F) can be used singly or in combination of two or more.
また、硬化促進剤(F)は、公知乃至慣用の方法により製造することもできるし、例えば、商品名「U-CAT SA 506」、「U-CAT SA 102」、「U-CAT 5003」、「U-CAT 18X」、「12XD」(開発品)(以上、サンアプロ(株)製);商品名「TPP-K」、「TPP-MK」(以上、北興化学工業(株)製);商品名「PX-4ET」(日本化学工業(株)製)等の市販品を使用することもできる。
Further, the curing accelerator (F) can be produced by a known or conventional method. For example, trade names “U-CAT SA 506”, “
本発明の硬化性樹脂組成物が硬化促進剤(F)を含有する場合、硬化促進剤(F)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物(100重量%)に対して、0.0001~5重量%が好ましく、より好ましくは0.001~1重量%である。硬化促進剤(F)の含有量を0.0001重量%以上とすることにより、より効率的に硬化反応を進行させることができる傾向がある。一方、硬化促進剤(F)の含有量を5重量%以下とすることにより、硬化性樹脂組成物の保存性がより向上したり、着色がより抑制され色相に優れた硬化物(リフレクター)が得られやすい傾向がある。 When the curable resin composition of the present invention contains a curing accelerator (F), the content (blending amount) of the curing accelerator (F) is not particularly limited, but the curable resin composition (100% by weight). The content is preferably 0.0001 to 5% by weight, more preferably 0.001 to 1% by weight. By setting the content of the curing accelerator (F) to 0.0001% by weight or more, the curing reaction tends to proceed more efficiently. On the other hand, by setting the content of the curing accelerator (F) to 5% by weight or less, the storability of the curable resin composition is further improved, or a cured product (reflector) that is more suppressed in coloring and excellent in hue. There is a tendency to obtain easily.
本発明の硬化性樹脂組成物が硬化促進剤(F)を含有する場合、硬化促進剤(F)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物に含まれるエポキシ基を有する化合物の全量100重量部に対して、0.05~15重量部が好ましく、より好ましくは0.1~12重量部、さらに好ましくは0.2~10重量部、特に好ましくは0.25~8重量部である。硬化促進剤の含有量を0.05重量部以上とすることにより、より効率的に硬化反応を進行させることができる傾向がある。一方、硬化促進剤の含有量を15重量部以下とすることにより、硬化性樹脂組成物の保存性がより向上したり、着色がより抑制され色相に優れた硬化物(リフレクター)が得られやすい傾向がある。 When the curable resin composition of the present invention contains a curing accelerator (F), the content (blending amount) of the curing accelerator (F) is not particularly limited, but is an epoxy group contained in the curable resin composition. Is preferably 0.05 to 15 parts by weight, more preferably 0.1 to 12 parts by weight, still more preferably 0.2 to 10 parts by weight, and most preferably 0.25 parts by weight with respect to 100 parts by weight of the total amount of the compounds having the above. ~ 8 parts by weight. By setting the content of the curing accelerator to 0.05 parts by weight or more, the curing reaction tends to proceed more efficiently. On the other hand, by setting the content of the curing accelerator to 15 parts by weight or less, the storability of the curable resin composition is further improved, or a cured product (reflector) that is more suppressed in coloring and excellent in hue is easily obtained. Tend.
[硬化触媒(G)]
本発明の硬化性樹脂組成物における硬化触媒(G)は、脂環式エポキシ化合物(A)等のカチオン重合性化合物の硬化反応(重合反応)を開始及び/又は促進させることにより、硬化性樹脂組成物を硬化させる働きを有する化合物である。硬化触媒(G)としては、特に限定されないが、例えば、光照射や加熱処理等を施すことによりカチオン種を発生して、重合を開始させるカチオン重合開始剤(光カチオン重合開始剤、熱カチオン重合開始剤等)や、ルイス酸・アミン錯体、ブレンステッド酸塩類、イミダゾール類等が挙げられる。
[Curing catalyst (G)]
The curing catalyst (G) in the curable resin composition of the present invention is a curable resin by initiating and / or accelerating a curing reaction (polymerization reaction) of a cationically polymerizable compound such as an alicyclic epoxy compound (A). It is a compound having a function of curing the composition. The curing catalyst (G) is not particularly limited. For example, a cationic polymerization initiator (photo cationic polymerization initiator, thermal cationic polymerization) that initiates polymerization by generating cationic species by performing light irradiation, heat treatment, or the like. Initiators, etc.), Lewis acid / amine complexes, Bronsted acid salts, imidazoles and the like.
硬化触媒(G)としての光カチオン重合開始剤としては、例えば、ヘキサフルオロアンチモネート塩、ペンタフルオロヒドロキシアンチモネート塩、ヘキサフルオロホスフェート塩、ヘキサフルオロアルセネート塩等が挙げられ、より具体的には、例えば、トリアリールスルホニウムヘキサフルオロホスフェート(例えば、p-フェニルチオフェニルジフェニルスルホニウムヘキサフルオロホスフェート等)、トリアリールスルホニウムヘキサフルオロアンチモネート等のスルホニウム塩(特に、トリアリールスルホニウム塩);ジアリールヨードニウムヘキサフルオロホスフェート、ジアリールヨードニウムヘキサフルオロアンチモネート、ビス(ドデシルフェニル)ヨードニウムテトラキス(ペンタフルオロフェニル)ボレート、ヨードニウム[4-(4-メチルフェニル-2-メチルプロピル)フェニル]ヘキサフルオロホスフェート等のヨードニウム塩;テトラフルオロホスホニウムヘキサフルオロホスフェート等のホスホニウム塩;N-ヘキシルピリジニウムテトラフルオロボレート等のピリジニウム塩等が挙げられる。また、光カチオン重合開始剤としては、例えば、商品名「UVACURE1590」(ダイセル・サイテック(株)製);商品名「CD-1010」、「CD-1011」、「CD-1012」(以上、米国サートマー製);商品名「イルガキュア264」(BASF社製);商品名「CIT-1682」(日本曹達(株)製)等の市販品を好ましく使用することもできる。 Examples of the photocationic polymerization initiator as the curing catalyst (G) include hexafluoroantimonate salts, pentafluorohydroxyantimonate salts, hexafluorophosphate salts, hexafluoroarsenate salts, and more specifically. For example, triarylsulfonium hexafluorophosphate (eg, p-phenylthiophenyldiphenylsulfonium hexafluorophosphate), sulfonium salts such as triarylsulfonium hexafluoroantimonate (particularly, triarylsulfonium salts); diaryl iodonium hexafluorophosphate Diaryl iodonium hexafluoroantimonate, bis (dodecylphenyl) iodonium tetrakis (pentafluorophenyl) borate, iodine Iodonium salts such as nium [4- (4-methylphenyl-2-methylpropyl) phenyl] hexafluorophosphate; phosphonium salts such as tetrafluorophosphonium hexafluorophosphate; pyridinium salts such as N-hexylpyridinium tetrafluoroborate It is done. Examples of the cationic photopolymerization initiator include, for example, trade names “UVACURE 1590” (manufactured by Daicel Cytec Co., Ltd.); trade names “CD-1010”, “CD-1011”, “CD-1012” (above, the United States). Commercial products such as Sartomer); trade name “Irgacure 264” (manufactured by BASF); trade name “CIT-1682” (manufactured by Nippon Soda Co., Ltd.) can be preferably used.
硬化触媒(G)としての熱カチオン重合開始剤としては、例えば、アリールジアゾニウム塩、アリールヨードニウム塩、アリールスルホニウム塩、アレン-イオン錯体等が挙げられ、商品名「PP-33」、「CP-66」、「CP-77」(以上(株)ADEKA製);商品名「FC-509」(スリーエム製);商品名「UVE1014」(G.E.製);商品名「サンエイドSI-60L」、「サンエイドSI-80L」、「サンエイドSI-100L」、「サンエイドSI-110L」、「サンエイドSI-150L」(以上、三新化学工業(株)製);商品名「CG-24-61」(BASF社製)等の市販品を好ましく使用することができる。さらに、熱カチオン重合開始剤としては、アルミニウムやチタン等の金属とアセト酢酸若しくはジケトン類とのキレート化合物とトリフェニルシラノール等のシラノールとの化合物、又は、アルミニウムやチタン等の金属とアセト酢酸若しくはジケトン類とのキレート化合物とビスフェノールS等のフェノール類との化合物等も挙げられる。 Examples of the thermal cationic polymerization initiator as the curing catalyst (G) include aryldiazonium salts, aryliodonium salts, arylsulfonium salts, allene-ion complexes, etc., and trade names “PP-33”, “CP-66”. "CP-77" (manufactured by ADEKA); trade name "FC-509" (manufactured by 3M); trade name "UVE1014" (manufactured by GE); trade name "Sun-Aid SI-60L" “Sun-Aid SI-80L”, “Sun-Aid SI-100L”, “Sun-Aid SI-110L”, “Sun-Aid SI-150L” (manufactured by Sanshin Chemical Industry Co., Ltd.); trade name “CG-24-61” ( Commercially available products such as BASF) can be preferably used. Further, as the thermal cationic polymerization initiator, a compound of a chelate compound of a metal such as aluminum or titanium and acetoacetic acid or diketone and a silanol such as triphenylsilanol, or a metal such as aluminum or titanium and acetoacetic acid or diketone Examples thereof include a compound of a chelate compound with a phenol and a phenol such as bisphenol S.
硬化触媒(G)としてのルイス酸・アミン錯体としては、公知乃至慣用のルイス酸・アミン錯体系硬化触媒を使用することができ、特に限定されないが、例えば、BF3・n-ヘキシルアミン、BF3・モノエチルアミン、BF3・ベンジルアミン、BF3・ジエチルアミン、BF3・ピペリジン、BF3・トリエチルアミン、BF3・アニリン、BF4・n-ヘキシルアミン、BF4・モノエチルアミン、BF4・ベンジルアミン、BF4・ジエチルアミン、BF4・ピペリジン、BF4・トリエチルアミン、BF4・アニリン、PF5・エチルアミン、PF5・イソプロピルアミン、PF5・ブチルアミン、PF5・ラウリルアミン、PF5・ベンジルアミン、AsF5・ラウリルアミン等が挙げられる。 As the Lewis acid / amine complex as the curing catalyst (G), a known or commonly used Lewis acid / amine complex-based curing catalyst can be used, and is not particularly limited. For example, BF 3 .n-hexylamine, BF 3 · monoethylamine, BF 3 · benzylamine, BF 3 · diethylamine, BF 3 · piperidine, BF 3 · triethylamine, BF 3 · aniline, BF 4 - n-hexylamine, BF 4 - monoethylamine, BF 4 - benzylamine , BF 4 · diethylamine, BF 4 · piperidine, BF 4 · triethylamine, BF 4 · aniline, PF 5 · ethylamine, PF 5 · isopropylamine, PF 5 · butylamine, PF 5 · laurylamine, PF 5 · benzylamine, AsF 5. Laurylamine etc. are mentioned.
硬化触媒(G)としてのブレンステッド酸塩類としては、公知乃至慣用のブレンステッド酸塩類を使用することができ、特に限定されないが、例えば、脂肪族スルホニウム塩、芳香族スルホニウム塩、ヨードニウム塩、ホスホニウム塩等が挙げられる。 As the Bronsted acid salt as the curing catalyst (G), known or commonly used Bronsted acid salts can be used, and are not particularly limited. For example, aliphatic sulfonium salts, aromatic sulfonium salts, iodonium salts, phosphoniums. Examples include salts.
硬化触媒(G)としてのイミダゾール類としては、公知乃至慣用のイミダゾール類を使用することができ、特に限定されないが、例えば、2-メチルイミダゾール、2-エチル-4-メチルイミダゾール、2-ウンデシルイミダゾール、2-ヘプタデシルイミダゾール、2-フェニルイミダゾール、1-ベンジル-2-メチルイミダゾール、1-シアノエチル-2-メチルイミダゾール、1-シアノエチル-2-エチル-4-メチルイミダゾール、1-シアノエチル-2-ウンデシルイミダゾール、1-シアノエチル-2-ウンデシルイミダゾリウムトリメリテート、1-シアノエチル-2-フェニルイミダゾリウムトリメリテート、2-メチルイミダゾリウムイソシアヌレート、2-フェニルイミダゾリウムイソシアヌレート、2,4-ジアミノ-6-[2-メチルイミダゾリル-(1)]-エチル-s-トリアジン、2,4-ジアミノ-6-[2-エチル-4-メチルイミダゾリル-(1)]-エチル-s-トリアジン等が挙げられる。 As the imidazole as the curing catalyst (G), known or conventional imidazoles can be used, and are not particularly limited. For example, 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-undecyl Imidazole, 2-heptadecylimidazole, 2-phenylimidazole, 1-benzyl-2-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2- Undecylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2-methylimidazolium isocyanurate, 2-phenylimidazolium isocyanurate, 2,4 - Amino-6- [2-methylimidazolyl- (1)]-ethyl-s-triazine, 2,4-diamino-6- [2-ethyl-4-methylimidazolyl- (1)]-ethyl-s-triazine, etc. Is mentioned.
本発明の硬化性樹脂組成物において硬化触媒(G)は、一種を単独で使用することもできるし、二種以上を組み合わせて使用することもできる。なお、上述のように、硬化触媒(G)としては市販品を使用することもできる。 In the curable resin composition of the present invention, the curing catalyst (G) can be used singly or in combination of two or more. In addition, as above-mentioned, a commercial item can also be used as a curing catalyst (G).
本発明の硬化性樹脂組成物が硬化触媒(G)を含有する場合、硬化触媒(G)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物(100重量%)に対して、0.0001~5重量%が好ましく、より好ましくは0.001~1重量%である。硬化触媒(G)を上記範囲内で使用することにより、耐熱性、耐光性に優れた硬化物を得ることができる。 When the curable resin composition of the present invention contains a curing catalyst (G), the content (blending amount) of the curing catalyst (G) is not particularly limited, but relative to the curable resin composition (100% by weight). The content is preferably 0.0001 to 5% by weight, more preferably 0.001 to 1% by weight. By using the curing catalyst (G) within the above range, a cured product having excellent heat resistance and light resistance can be obtained.
本発明の硬化性樹脂組成物が硬化触媒(G)を含有する場合、本発明の硬化性樹脂組成物における硬化触媒(G)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物に含まれるエポキシ基を有する化合物の全量100重量部に対して、0.0001~15重量部が好ましく、より好ましくは0.01~12重量部、さらに好ましくは0.05~10重量部、特に好ましくは0.05~8重量部である。硬化触媒(G)を上記範囲内で使用することにより、耐熱性、耐光性に優れた硬化物を得ることができる。 When the curable resin composition of the present invention contains a curing catalyst (G), the content (blending amount) of the curing catalyst (G) in the curable resin composition of the present invention is not particularly limited. The amount is preferably 0.0001 to 15 parts by weight, more preferably 0.01 to 12 parts by weight, and still more preferably 0.05 to 10 parts by weight with respect to 100 parts by weight of the total amount of compounds having an epoxy group contained in the composition. Particularly preferred is 0.05 to 8 parts by weight. By using the curing catalyst (G) within the above range, a cured product having excellent heat resistance and light resistance can be obtained.
[分子内に1個以上のオキシラン環を有するイソシアヌル酸誘導体(H)]
本発明の硬化性樹脂組成物の必須成分であるイソシアヌル酸誘導体(H)は、イソシアヌル酸の誘導体であって、分子内に1個以上のオキシラン環を少なくとも有する化合物である。本発明の硬化性樹脂組成物がイソシアヌル酸誘導体(H)を含むことにより、硬化物の光反射性、耐熱性、耐光性が向上し、後述のシロキサン誘導体(I)と同時に硬化性樹脂組成物に含まれることで、硬化物の光反射性、耐熱性、耐光性がさらに向上する。イソシアヌル酸誘導体(H)が分子内に有するオキシラン環の数は、1個以上であればよく、特に限定されないが、1~6個が好ましく、より好ましくは1~3個である。
[Isocyanuric acid derivative (H) having one or more oxirane rings in the molecule]
The isocyanuric acid derivative (H) that is an essential component of the curable resin composition of the present invention is a derivative of isocyanuric acid and is a compound having at least one oxirane ring in the molecule. When the curable resin composition of the present invention contains the isocyanuric acid derivative (H), the light reflectivity, heat resistance, and light resistance of the cured product are improved, and the curable resin composition is simultaneously formed with the siloxane derivative (I) described later. By being contained in, the light reflectivity, heat resistance, and light resistance of the cured product are further improved. The number of oxirane rings in the molecule of the isocyanuric acid derivative (H) may be one or more and is not particularly limited, but is preferably 1 to 6, more preferably 1 to 3.
イソシアヌル酸誘導体(H)としては、例えば、下記式(III)で表される化合物が挙げられる。
式(III)中、R4~R6は、同一又は異なって、水素原子又は一価の有機基を示す。但し、R4~R6の少なくとも1つは、エポキシ基を含有する一価の有機基である。上記一価の有機基としては、例えば、一価の脂肪族炭化水素基(例えば、アルキル基、アルケニル基等);一価の芳香族炭化水素基(例えば、アリール基等);一価の複素環式基;脂肪族炭化水素基、脂環式炭化水素基、及び芳香族炭化水素基の2以上が結合して形成された一価の基等が挙げられる。なお、一価の有機基は置換基(例えば、ヒドロキシ基、カルボキシ基、ハロゲン原子等の置換基)を有していてもよい。エポキシ基を含有する一価の有機基としては、例えば、エポキシ基、グリシジル基、2-メチルエポキシプロピル基、シクロヘキセンオキシド基等の後述のエポキシ基を含有する一価の有機基等が挙げられる。 In formula (III), R 4 to R 6 are the same or different and each represents a hydrogen atom or a monovalent organic group. However, at least one of R 4 to R 6 is a monovalent organic group containing an epoxy group. Examples of the monovalent organic group include a monovalent aliphatic hydrocarbon group (for example, an alkyl group and an alkenyl group); a monovalent aromatic hydrocarbon group (for example, an aryl group); A cyclic group; a monovalent group formed by combining two or more of an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, and an aromatic hydrocarbon group. The monovalent organic group may have a substituent (for example, a substituent such as a hydroxy group, a carboxy group, or a halogen atom). Examples of the monovalent organic group containing an epoxy group include a monovalent organic group containing an epoxy group described later such as an epoxy group, a glycidyl group, a 2-methylepoxypropyl group, and a cyclohexene oxide group.
特に、式(III)におけるR4~R6は、同一又は異なって、下記式(IIIa)で表される基又は下記式(IIIb)で表される基であって、R4~R6の少なくとも1つが式(IIIa)で表される基であることが好ましい。
上記式(IIIa)及び式(IIIb)中のR7及びR8は、同一又は異なって、水素原子又は炭素数1~8のアルキル基を示す。炭素数1~8のアルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、s-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基等の直鎖又は分岐鎖状のアルキル基が挙げられる。中でも、メチル基、エチル基、プロピル基、イソプロピル基等の炭素数1~3の直鎖又は分岐鎖状のアルキル基が好ましい。式(IIIa)及び式(IIIb)中のR7及びR8は、水素原子であることが特に好ましい。 R 7 and R 8 in the above formulas (IIIa) and (IIIb) are the same or different and each represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. Examples of the alkyl group having 1 to 8 carbon atoms include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, pentyl, hexyl, heptyl, octyl and the like. Examples thereof include a chain or branched alkyl group. Of these, a linear or branched alkyl group having 1 to 3 carbon atoms such as a methyl group, an ethyl group, a propyl group, and an isopropyl group is preferable. R 7 and R 8 in formula (IIIa) and formula (IIIb) are particularly preferably hydrogen atoms.
より具体的には、上記イソシアヌル酸誘導体(H)としては、下記式(III-1)で表される化合物、下記式(III-2)で表される化合物、下記式(III-3)で表される化合物等が挙げられる。
上記式(III-1)~(III-3)中、R7及びR8は、同一又は異なって、式(IIIa)及び式(IIIb)におけるものと同じものを示す。 In the above formulas (III-1) to (III-3), R 7 and R 8 are the same or different and are the same as those in the formulas (IIIa) and (IIIb).
上記式(III-1)で表される化合物の代表的な例としては、モノアリルジグリシジルイソシアヌレート、1-アリル-3,5-ビス(2-メチルエポキシプロピル)イソシアヌレート、1-(2-メチルプロペニル)-3,5-ジグリシジルイソシアヌレート、1-(2-メチルプロペニル)-3,5-ビス(2-メチルエポキシプロピル)イソシアヌレート等が挙げられる。 Representative examples of the compound represented by the formula (III-1) include monoallyldiglycidyl isocyanurate, 1-allyl-3,5-bis (2-methylepoxypropyl) isocyanurate, 1- (2 -Methylpropenyl) -3,5-diglycidyl isocyanurate, 1- (2-methylpropenyl) -3,5-bis (2-methylepoxypropyl) isocyanurate and the like.
上記式(III-2)で表される化合物の代表的な例としては、ジアリルモノグリシジルイソシアヌレート、1,3-ジアリル-5-(2-メチルエポキシプロピル)イソシアヌレート、1,3-ビス(2-メチルプロペニル)-5-グリシジルイソシアヌレート、1,3-ビス(2-メチルプロペニル)-5-(2-メチルエポキシプロピル)イソシアヌレート等が挙げられる。 Representative examples of the compound represented by the above formula (III-2) include diallyl monoglycidyl isocyanurate, 1,3-diallyl-5- (2-methylepoxypropyl) isocyanurate, 1,3-bis ( 2-methylpropenyl) -5-glycidyl isocyanurate, 1,3-bis (2-methylpropenyl) -5- (2-methylepoxypropyl) isocyanurate and the like.
上記式(III-3)で表される化合物の代表的な例としては、トリグリシジルイソシアヌレート、トリス(2-メチルエポキシプロピル)イソシアヌレート等が挙げられる。 Representative examples of the compound represented by the above formula (III-3) include triglycidyl isocyanurate, tris (2-methylepoxypropyl) isocyanurate and the like.
なお、上記イソシアヌル酸誘導体(H)は、アルコールや酸無水物等のエポキシ基と反応する化合物を加えてあらかじめ変性して用いることもできる。 The above isocyanuric acid derivative (H) can be modified in advance by adding a compound that reacts with an epoxy group such as alcohol or acid anhydride.
中でも、イソシアヌル酸誘導体(H)としては、硬化物の光反射性、耐熱性、及び溶解性の観点から、上記式(III-1)~(III-3)で表される化合物が好ましく、より好ましくは上記式(III-1)で表される化合物である。なお、本発明の硬化性樹脂組成物においてイソシアヌル酸誘導体(H)は、一種を単独で使用することもできるし、二種以上を組み合わせて使用することもできる。なお、イソシアヌル酸誘導体(H)としては、例えば、商品名「TEPIC」(日産化学工業(株)製);商品名「MA-DGIC」、「DA-MGIC」(以上、四国化成工業(株)製)等の市販品を使用することもできる。 Among these, the isocyanuric acid derivative (H) is preferably a compound represented by the above formulas (III-1) to (III-3) from the viewpoint of light reflectivity, heat resistance, and solubility of the cured product. A compound represented by the above formula (III-1) is preferable. In addition, in the curable resin composition of this invention, an isocyanuric acid derivative (H) can also be used individually by 1 type, and can also be used in combination of 2 or more type. Examples of the isocyanuric acid derivative (H) include trade names “TEPIC” (manufactured by Nissan Chemical Industries, Ltd.); trade names “MA-DGIC”, “DA-MGIC” (above, Shikoku Kasei Kogyo Co., Ltd.) (Commercially available) can also be used.
本発明の硬化性樹脂組成物におけるイソシアヌル酸誘導体(H)の含有量(配合量)は、硬化性樹脂組成物(100重量%)に対して、0.05~15重量%が好ましく、より好ましくは0.1~10重量%、さらに好ましくは0.3~5重量%である。イソシアヌル酸誘導体(H)の含有量を上記範囲内とすることにより、耐熱性及び耐光性に優れた硬化物を得ることができる。 The content (blending amount) of the isocyanuric acid derivative (H) in the curable resin composition of the present invention is preferably 0.05 to 15% by weight, more preferably relative to the curable resin composition (100% by weight). Is 0.1 to 10% by weight, more preferably 0.3 to 5% by weight. By setting the content of the isocyanuric acid derivative (H) within the above range, a cured product having excellent heat resistance and light resistance can be obtained.
本発明の硬化性樹脂組成物におけるイソシアヌル酸誘導体(H)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物に含まれるエポキシ基を有する化合物の全量100重量部に対して、1~60重量部が好ましく、より好ましくは1~50重量部、さらに好ましくは1~30重量部である。イソシアヌル酸誘導体(H)の含有量を上記範囲内とすることにより、耐熱性及び耐光性に優れた硬化物を得ることができる。 The content (blending amount) of the isocyanuric acid derivative (H) in the curable resin composition of the present invention is not particularly limited, but is 100 parts by weight based on the total amount of compounds having an epoxy group contained in the curable resin composition. The amount is preferably 1 to 60 parts by weight, more preferably 1 to 50 parts by weight, and still more preferably 1 to 30 parts by weight. By setting the content of the isocyanuric acid derivative (H) within the above range, a cured product having excellent heat resistance and light resistance can be obtained.
[分子内に2以上のエポキシ基を有するシロキサン誘導体(I)]
本発明の硬化性樹脂組成物の必須成分であるシロキサン誘導体(I)は、分子内に2以上のエポキシ基を有し、シロキサン結合(-Si-O-Si-)により構成された骨格を有する化合物(シロキサン化合物)である。シロキサン誘導体(I)におけるシロキサン骨格(Si-O-Si骨格)としては、特に限定されないが、例えば、環状シロキサン骨格;直鎖状のシリコーンや、かご型やラダー型のポリシルセスキオキサン等のポリシロキサン骨格等が挙げられる。中でも、上記シロキサン骨格としては、硬化物の光反射性、耐熱性、耐光性を向上させて光半導体装置の光度低下を抑制する観点で、環状シロキサン骨格、直鎖状シリコーン骨格が好ましい。即ち、シロキサン誘導体(I)としては、分子内に2以上のエポキシ基を有する環状シロキサン、分子内に2以上のエポキシ基を有する直鎖状シリコーンが好ましい。
[Siloxane derivative (I) having two or more epoxy groups in the molecule]
The siloxane derivative (I), which is an essential component of the curable resin composition of the present invention, has a skeleton composed of siloxane bonds (—Si—O—Si—) having two or more epoxy groups in the molecule. It is a compound (siloxane compound). The siloxane skeleton (Si—O—Si skeleton) in the siloxane derivative (I) is not particularly limited, and examples thereof include cyclic siloxane skeletons; linear silicones, cage-type and ladder-type polysilsesquioxanes, and the like. Examples include a polysiloxane skeleton. Among these, as the siloxane skeleton, a cyclic siloxane skeleton and a linear silicone skeleton are preferable from the viewpoint of improving the light reflectivity, heat resistance, and light resistance of the cured product and suppressing the light intensity reduction of the optical semiconductor device. That is, the siloxane derivative (I) is preferably a cyclic siloxane having two or more epoxy groups in the molecule and a linear silicone having two or more epoxy groups in the molecule.
シロキサン誘導体(I)が分子内に2以上のエポキシ基を有する環状シロキサンである場合、当該シロキサン環を形成するSi-O単位の数(シロキサン環を形成するケイ素原子の数に等しい)は、特に限定されないが、硬化物の耐熱性、耐光性を向上させる観点で、2~12が好ましく、より好ましくは4~8である。 When the siloxane derivative (I) is a cyclic siloxane having two or more epoxy groups in the molecule, the number of Si—O units forming the siloxane ring (equal to the number of silicon atoms forming the siloxane ring) is particularly Although not limited, it is preferably 2 to 12, more preferably 4 to 8, from the viewpoint of improving the heat resistance and light resistance of the cured product.
シロキサン誘導体(I)の重量平均分子量は、特に限定されないが、硬化物の耐熱性、耐光性を向上させる観点で、100~3000が好ましく、より好ましくは180~2000である。なお、シロキサン誘導体(I)の上記重量平均分子量は、GPC(ゲルパーミエーションクロマトグラフィー)法により測定される標準ポリスチレン換算の分子量から算出される。 The weight average molecular weight of the siloxane derivative (I) is not particularly limited, but is preferably 100 to 3000, more preferably 180 to 2000, from the viewpoint of improving the heat resistance and light resistance of the cured product. In addition, the said weight average molecular weight of siloxane derivative (I) is computed from the molecular weight of standard polystyrene conversion measured by GPC (gel permeation chromatography) method.
シロキサン誘導体(I)が分子内に有するエポキシ基の数は、2以上であればよく、特に限定されないが、硬化物の耐熱性、耐光性を向上させる観点で、2~4つ(2つ、3つ、又は4つ)が好ましい。 The number of epoxy groups in the molecule of the siloxane derivative (I) is not particularly limited as long as it is 2 or more. However, from the viewpoint of improving the heat resistance and light resistance of the cured product, 2 to 4 (2, 3 or 4) is preferred.
シロキサン誘導体(I)のエポキシ当量は、特に限定されないが、硬化物の耐熱性、耐光性を向上させる観点で、180~2000が好ましく、より好ましくは180~1500、さらに好ましくは180~1000である。なお、上記エポキシ当量は、JIS K7236に準じて測定される値である。 The epoxy equivalent of the siloxane derivative (I) is not particularly limited, but is preferably 180 to 2000, more preferably 180 to 1500, and still more preferably 180 to 1000 from the viewpoint of improving the heat resistance and light resistance of the cured product. . The epoxy equivalent is a value measured according to JIS K7236.
シロキサン誘導体(I)が有するエポキシ基は、特に限定されないが、硬化物の耐熱性、耐光性を向上させる観点で、脂環を構成する隣接する2つの炭素原子と酸素原子とで構成されるエポキシ基(脂環式エポキシ基)であることが好ましく、中でも、シクロヘキセンオキシド基であることが特に好ましい。 The epoxy group possessed by the siloxane derivative (I) is not particularly limited, but from the viewpoint of improving the heat resistance and light resistance of the cured product, an epoxy composed of two adjacent carbon atoms and oxygen atoms constituting the alicyclic ring. Group (alicyclic epoxy group) is preferable, and among them, a cyclohexene oxide group is particularly preferable.
シロキサン誘導体(I)としては、例えば、下記式(IV)で表されるシロキサン化合物等が挙げられる。
式(IV)中、Raは、同一又は異なって、エポキシ基を含有する基、又はアルキル基を示す。但し、式(IV)におけるRaの少なくとも2つ(例えば2~4つ)はエポキシ基を含有する基である。上述のエポキシ基を含有する基は、エポキシ基(オキシラン環)を少なくとも1つ含む基であり、例えば、アルケニル基等の炭素-炭素不飽和二重結合を有する直鎖又は分岐鎖状の脂肪族炭化水素基が有する少なくとも1つの二重結合がエポキシ化された基や、炭素-炭素不飽和二重結合を有する環状の脂肪族炭化水素基(例えば、シクロアルケニル基;シクロヘキセニルエチル基等のシクロアルケニルアルキル基等)が有する少なくとも1つの二重結合がエポキシ化された基等が挙げられる。より具体的には、例えば、1,2-エポキシエチル基(エポキシ基)、1,2-エポキシプロピル基、2,3-エポキシプロピル基(グリシジル基)、2,3-エポキシ-2-メチルプロピル基(メチルグリシジル基)、3,4-エポキシブチル基、3-グリシジルオキシプロピル基、3,4-エポキシシクロヘキシルメチル基、2-(3,4-エポキシシクロヘキシル)エチル基等が挙げられる。中でも、炭素-炭素不飽和二重結合を有する環状の脂肪族炭化水素基が有する少なくとも1つの二重結合がエポキシ化された基が好ましい。上記アルキル基としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、ヘキシル基、オクチル基、イソオクチル基、デシル基、ドデシル基等の炭素数1~20の直鎖又は分岐鎖状のアルキル基等が挙げられる。中でも、炭素数1~10の直鎖又は分岐鎖状のアルキル基が好ましい。 In formula (IV), R a is the same or different and represents an epoxy group-containing group or an alkyl group. Provided that at least two R a in formula (IV) (e.g., 2 to four) is a group containing an epoxy group. The above-mentioned group containing an epoxy group is a group containing at least one epoxy group (oxirane ring). For example, a linear or branched aliphatic group having a carbon-carbon unsaturated double bond such as an alkenyl group. A group in which at least one double bond of a hydrocarbon group is epoxidized, or a cyclic aliphatic hydrocarbon group having a carbon-carbon unsaturated double bond (for example, a cycloalkenyl group; a cyclohexenylethyl group, etc. A group in which at least one double bond of the alkenylalkyl group or the like is epoxidized. More specifically, for example, 1,2-epoxyethyl group (epoxy group), 1,2-epoxypropyl group, 2,3-epoxypropyl group (glycidyl group), 2,3-epoxy-2-methylpropyl Groups (methyl glycidyl group), 3,4-epoxybutyl group, 3-glycidyloxypropyl group, 3,4-epoxycyclohexylmethyl group, 2- (3,4-epoxycyclohexyl) ethyl group and the like. Among them, a group in which at least one double bond of a cyclic aliphatic hydrocarbon group having a carbon-carbon unsaturated double bond is epoxidized is preferable. Examples of the alkyl group include straight-chain or branched chain groups having 1 to 20 carbon atoms such as methyl group, ethyl group, propyl group, isopropyl group, butyl group, hexyl group, octyl group, isooctyl group, decyl group, and dodecyl group. An alkyl group etc. are mentioned. Of these, a linear or branched alkyl group having 1 to 10 carbon atoms is preferable.
式(IV)中、nは、2~12の整数を示す。特に、硬化物の耐熱衝撃性、光半導体装置の耐リフロー性及び耐熱衝撃性の観点で、nとしては、4~8が好ましく、より好ましくは4又は5である。 In the formula (IV), n represents an integer of 2 to 12. In particular, n is preferably 4 to 8, more preferably 4 or 5, from the viewpoint of thermal shock resistance of the cured product, reflow resistance and thermal shock resistance of the optical semiconductor device.
シロキサン誘導体(I)としては、より具体的には、例えば、2,4-ジ[2-(3-{オキサビシクロ[4.1.0]ヘプチル})エチル]-2,4,6,6,8,8-ヘキサメチル-シクロテトラシロキサン、4,8-ジ[2-(3-{オキサビシクロ[4.1.0]ヘプチル})エチル]-2,2,4,6,6,8-ヘキサメチル-シクロテトラシロキサン、2,4-ジ[2-(3-{オキサビシクロ[4.1.0]ヘプチル})エチル]-6,8-ジプロピル-2,4,6,8-テトラメチル-シクロテトラシロキサン、4,8-ジ[2-(3-{オキサビシクロ[4.1.0]ヘプチル})エチル]-2,6-ジプロピル-2,4,6,8-テトラメチル-シクロテトラシロキサン、2,4,8-トリ[2-(3-{オキサビシクロ[4.1.0]ヘプチル})エチル]-2,4,6,6,8-ペンタメチル-シクロテトラシロキサン、2,4,8-トリ[2-(3-{オキサビシクロ[4.1.0]ヘプチル})エチル]-6-プロピル-2,4,6,8-テトラメチル-シクロテトラシロキサン、2,4,6,8-テトラ[2-(3-{オキサビシクロ[4.1.0]ヘプチル})エチル]-2,4,6,8-テトラメチル-シクロテトラシロキサン、分子内に2以上のエポキシ基を有するシルセスキオキサン等が挙げられる。さらに具体的には、例えば、下記式で表される分子内に2以上のエポキシ基を有する環状シロキサン等が挙げられる。
また、シロキサン誘導体(I)としては、例えば、特開2008-248169号公報に記載の脂環式エポキシ基含有シリコーン樹脂や、特開2008-19422号公報に記載の1分子中に少なくとも2つのエポキシ官能性基を有するオルガノポリシルセスキオキサン樹脂等を用いることもできる。 Examples of the siloxane derivative (I) include alicyclic epoxy group-containing silicone resins described in JP-A-2008-248169 and at least two epoxy resins in one molecule described in JP-A-2008-19422. An organopolysilsesquioxane resin having a functional group can also be used.
なお、本発明の硬化性樹脂組成物においてシロキサン誘導体(I)は、一種を単独で使用することもできるし、二種以上を組み合わせて使用することもできる。 In the curable resin composition of the present invention, the siloxane derivative (I) can be used alone or in combination of two or more.
シロキサン誘導体(I)は、例えば、分子内に2以上のエポキシ基を有する環状シロキサンである商品名「X-40-2678」、「X-40-2670」、「X-40-2720」(以上、信越化学工業(株)製)等の市販品を入手可能である。また、シロキサン誘導体(I)は、公知乃至慣用の方法により製造することができる。 Siloxane derivatives (I) are, for example, trade names “X-40-2678”, “X-40-2670”, “X-40-2720” (and above) which are cyclic siloxanes having two or more epoxy groups in the molecule. Commercial products such as Shin-Etsu Chemical Co., Ltd.) are available. The siloxane derivative (I) can be produced by a known or conventional method.
本発明の硬化性樹脂組成物におけるシロキサン誘導体(I)の含有量(配合量)は、硬化性樹脂組成物(100重量%)に対して、0.1~30重量%が好ましく、より好ましくは0.5~20重量%、さらに好ましくは1.0~10重量%である。シロキサン誘導体(I)の含有量を上記範囲に制御することにより、硬化性樹脂組成物のチクソ性が高くなり、硬化物の耐熱性、耐光性、及び光反射性がより向上する傾向がある。 The content (blending amount) of the siloxane derivative (I) in the curable resin composition of the present invention is preferably 0.1 to 30% by weight, more preferably relative to the curable resin composition (100% by weight). It is 0.5 to 20% by weight, more preferably 1.0 to 10% by weight. By controlling the content of the siloxane derivative (I) within the above range, the thixotropy of the curable resin composition is increased, and the heat resistance, light resistance, and light reflectivity of the cured product tend to be further improved.
本発明の硬化性樹脂組成物におけるシロキサン誘導体(I)の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物に含まれるエポキシ基を有する化合物の全量100重量部に対して、5~99重量部が好ましく、より好ましくは10~95重量部、さらに好ましくは20~80重量部である。シロキサン誘導体(I)の含有量を5重量部以上とすることにより、硬化性樹脂組成物のチクソ性が高くなり、硬化物の耐熱性、耐光性、及び光反射性がより向上する傾向がある。一方、シロキサン誘導体(I)の含有量を150重量部以下とすることにより、硬化物の耐熱衝撃性、及び接着性がより向上する傾向がある。 The content (blending amount) of the siloxane derivative (I) in the curable resin composition of the present invention is not particularly limited, but with respect to 100 parts by weight of the total amount of compounds having an epoxy group contained in the curable resin composition, The amount is preferably 5 to 99 parts by weight, more preferably 10 to 95 parts by weight, and still more preferably 20 to 80 parts by weight. By setting the content of the siloxane derivative (I) to 5 parts by weight or more, the thixotropy of the curable resin composition increases, and the heat resistance, light resistance, and light reflectivity of the cured product tend to be further improved. . On the other hand, when the content of the siloxane derivative (I) is 150 parts by weight or less, the thermal shock resistance and adhesiveness of the cured product tend to be further improved.
[離型剤]
本発明の硬化性樹脂組成物は、さらに、離型剤を含んでいてもよい。離型剤を含むことにより、トランスファー成型等の金型を使用した成型法による連続成型が容易となり、高い生産性で硬化物(リフレクター)を製造することが可能となる。離型剤としては、公知乃至慣用の離型剤を使用することができ、特に限定されないが、例えば、フッ素系離型剤(フッ素原子含有化合物;例えば、フッ素オイル、ポリテトラフルオロエチレン等)、シリコーン系離型剤(シリコーン化合物;例えば、シリコーンオイル、シリコーンワックス、シリコーン樹脂、ポリオキシアルキレン単位を有するポリオルガノシロキサン等)、ワックス系離型剤(ワックス類;例えば、カルナウバワックス等の植物ロウ、羊毛ワックス等の動物ロウ、パラフィンワックス等のパラフィン類、ポリエチレンワックス、酸化ポリエチレンワックス等)、高級脂肪酸又はその塩(例えば、金属塩等)、高級脂肪酸エステル、高級脂肪酸アミド、鉱油等が挙げられる。
[Release agent]
The curable resin composition of the present invention may further contain a release agent. By including a release agent, continuous molding by a molding method using a mold such as transfer molding is facilitated, and a cured product (reflector) can be produced with high productivity. As the release agent, a known or commonly used release agent can be used, and is not particularly limited. For example, a fluorine-based release agent (fluorine atom-containing compound; Silicone release agents (silicone compounds; for example, silicone oil, silicone wax, silicone resin, polyorganosiloxane having polyoxyalkylene units), wax release agents (waxes; for example, plant waxes such as carnauba wax) Animal waxes such as wool wax, paraffins such as paraffin wax, polyethylene wax, oxidized polyethylene wax, etc.), higher fatty acids or salts thereof (for example, metal salts), higher fatty acid esters, higher fatty acid amides, mineral oils, etc. .
なお、本発明の硬化性樹脂組成物において離型剤は、一種を単独で使用することもできるし、二種以上を組み合わせて使用することもできる。また、離型剤は、公知乃至慣用の方法によって製造することもできるし、市販品を使用することもできる。 In the curable resin composition of the present invention, one type of release agent can be used alone, or two or more types can be used in combination. Moreover, a mold release agent can also be manufactured by a well-known thru | or usual method, and a commercial item can also be used for it.
本発明の硬化性樹脂組成物が離型剤を含有する場合、離型剤の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物に含まれるエポキシ基を有する化合物の全量100重量部に対して、1~12重量部が好ましく、より好ましくは2~10重量部である。離型剤の含有量を1重量部以上とすることにより、硬化物(リフレクター)の離型性がより向上し、リフレクターの生産性がより向上する傾向がある。一方、離型剤の含有量を12重量部以下とすることにより、光半導体素子搭載用基板におけるリフレクターのリードフレームに対する良好な密着性を確保できる傾向がある。 When the curable resin composition of the present invention contains a release agent, the content (blending amount) of the release agent is not particularly limited, but the total amount of compounds having epoxy groups contained in the curable resin composition is 100. The amount is preferably 1 to 12 parts by weight, more preferably 2 to 10 parts by weight with respect to parts by weight. By making content of a mold release agent 1 weight part or more, there exists a tendency which the mold release property of hardened | cured material (reflector) improves more and the productivity of a reflector improves more. On the other hand, when the content of the release agent is 12 parts by weight or less, there is a tendency that good adhesion to the lead frame of the reflector in the substrate for mounting an optical semiconductor element can be secured.
[酸化防止剤]
本発明の硬化性樹脂組成物は、酸化防止剤を含んでいてもよい。酸化防止剤を含むことにより、いっそう耐熱性に優れた硬化物(リフレクター)を製造することが可能となる。酸化防止剤としては、公知乃至慣用の酸化防止剤を使用することができ、特に限定されないが、例えば、フェノール系酸化防止剤(フェノール系化合物)、ヒンダードアミン系酸化防止剤(ヒンダードアミン系化合物)、リン系酸化防止剤(リン系化合物)、イオウ系酸化防止剤(イオウ系化合物)等が挙げられる。
[Antioxidant]
The curable resin composition of the present invention may contain an antioxidant. By containing an antioxidant, it becomes possible to produce a cured product (reflector) with even better heat resistance. As the antioxidant, known or commonly used antioxidants can be used, and are not particularly limited. For example, phenolic antioxidants (phenolic compounds), hindered amine antioxidants (hindered amine compounds), phosphorus System antioxidants (phosphorus compounds), sulfur antioxidants (sulfur compounds), and the like.
フェノール系酸化防止剤としては、例えば、2,6-ジ-t-ブチル-p-クレゾール、ブチル化ヒドロキシアニソール、2,6-ジ-t-ブチル-p-エチルフェノール、ステアリル-β-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート等のモノフェノール類;2,2'-メチレンビス(4-メチル-6-t-ブチルフェノール)、2,2'-メチレンビス(4-エチル-6-t-ブチルフェノール)、4,4'-チオビス(3-メチル-6-t-ブチルフェノール)、4,4'-ブチリデンビス(3-メチル-6-t-ブチルフェノール)、3,9-ビス[1,1-ジメチル-2-{β-(3-t-ブチル-4-ヒドロキシ-5-メチルフェニル)プロピオニルオキシ}エチル]2,4,8,10-テトラオキサスピロ[5.5]ウンデカン等のビスフェノール類;1,1,3-トリス(2-メチル-4-ヒドロキシ-5-t-ブチルフェニル)ブタン、1,3,5-トリメチル-2,4,6-トリス(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)ベンゼン、テトラキス-[メチレン-3-(3',5'-ジ-t-ブチル-4'-ヒドロキシフェニル)プロピオネート]メタン、ビス[3,3'-ビス-(4'-ヒドロキシ-3'-t-ブチルフェニル)ブチリックアシッド]グリコールエステル、1,3,5-トリス(3',5'-ジ-t-ブチル-4'-ヒドロキシベンジル)-s-トリアジン-2,4,6-(1H,3H,5H)トリオン、トコフェノール等の高分子型フェノール類等が挙げられる。 Examples of phenolic antioxidants include 2,6-di-t-butyl-p-cresol, butylated hydroxyanisole, 2,6-di-t-butyl-p-ethylphenol, stearyl-β- (3 , 5-di-tert-butyl-4-hydroxyphenyl) propionate and the like; 2,2′-methylenebis (4-methyl-6-tert-butylphenol), 2,2′-methylenebis (4-ethyl- 6-t-butylphenol), 4,4'-thiobis (3-methyl-6-t-butylphenol), 4,4'-butylidenebis (3-methyl-6-t-butylphenol), 3,9-bis [1 , 1-Dimethyl-2- {β- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionyloxy} ethyl] 2,4,8,10-tetraoxaspir [5.5] Bisphenols such as undecane; 1,1,3-tris (2-methyl-4-hydroxy-5-tert-butylphenyl) butane, 1,3,5-trimethyl-2,4,6- Tris (3,5-di-t-butyl-4-hydroxybenzyl) benzene, tetrakis- [methylene-3- (3 ′, 5′-di-t-butyl-4′-hydroxyphenyl) propionate] methane, bis [3,3′-bis- (4′-hydroxy-3′-t-butylphenyl) butyric acid] glycol ester, 1,3,5-tris (3 ′, 5′-di-t-butyl-4 '-Hydroxybenzyl) -s-triazine-2,4,6- (1H, 3H, 5H) trione, polymeric phenols such as tocophenol, and the like.
ヒンダードアミン系酸化防止剤としては、例えば、ビス(1,2,2,6,6-ペンタメチル-4-ピペリジル)[[3,5-ビス(1,1-ジメチルエチル)-4-ヒドロキシフェニル]メチル]ブチルマロネート、ビス(1,2,2,6,6-ペンタメチル-4-ピペリジル)セバケート、メチル-1,2,2,6,6-ペンタメチル-4-ピペリジルセバケート、4-ベンゾイルオキシ-2,2,6,6-テトラメチルピペリジン等が挙げられる。 Examples of hindered amine antioxidants include bis (1,2,2,6,6-pentamethyl-4-piperidyl) [[3,5-bis (1,1-dimethylethyl) -4-hydroxyphenyl] methyl. ] Butyl malonate, bis (1,2,2,6,6-pentamethyl-4-piperidyl) sebacate, methyl-1,2,2,6,6-pentamethyl-4-piperidyl sebacate, 4-benzoyloxy- Examples include 2,2,6,6-tetramethylpiperidine.
リン系酸化防止剤としては、例えば、トリフェニルホスファイト、ジフェニルイソデシルホスファイト、フェニルジイソデシルホスファイト、トリス(ノニルフェニル)ホスファイト、ジイソデシルペンタエリスリトールホスファイト、トリス(2、4-ジ-t-ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビス(オクタデシル)ホスファイト、サイクリックネオペンタンテトライルビス(2,4-ジ-t-ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビス(2,4-ジ-t-ブチル-4-メチルフェニル)ホスファイト、ビス[2-t-ブチル-6-メチル-4-{2-(オクタデシルオキシカルボニル)エチル}フェニル]ヒドロゲンホスファイト等のホスファイト類;9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキサイド、10-(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)-9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキサイド等のオキサホスファフェナントレンオキサイド類等が挙げられる。 Examples of phosphorus antioxidants include triphenyl phosphite, diphenylisodecyl phosphite, phenyl diisodecyl phosphite, tris (nonylphenyl) phosphite, diisodecylpentaerythritol phosphite, tris (2,4-di-t- Butylphenyl) phosphite, cyclic neopentanetetrayl bis (octadecyl) phosphite, cyclic neopentanetetrayl bis (2,4-di-t-butylphenyl) phosphite, cyclic neopentanetetrayl bis (2 , 4-di-tert-butyl-4-methylphenyl) phosphite, bis [2-tert-butyl-6-methyl-4- {2- (octadecyloxycarbonyl) ethyl} phenyl] hydrogen phosphite, etc. Fights; 9,10- Hydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10- (3,5-di-t-butyl-4-hydroxybenzyl) -9,10-dihydro-9-oxa-10-phosphaphenanthrene And oxaphosphaphenanthrene oxides such as -10-oxide.
イオウ系酸化防止剤としては、例えば、ドデカンチオール、ジラウリル-3,3'-チオジプロピオネート、ジミリスチル-3,3'-チオジプロピオネート、ジステアリル-3,3'-チオジプロピオネート等が挙げられる。 Examples of the sulfur-based antioxidant include dodecanethiol, dilauryl-3,3′-thiodipropionate, dimyristyl-3,3′-thiodipropionate, distearyl-3,3′-thiodipropionate Is mentioned.
本発明の硬化性樹脂組成物において酸化防止剤は、一種を単独で使用することもできるし、二種以上を組み合わせて使用することもできる。また、酸化防止剤は、公知乃至慣用の方法により製造することもできるし、例えば、商品名「Irganox1010」(BASF製、フェノール系酸化防止剤)、商品名「AO-60」、「AO-80」((株)ADEKA製、フェノール系酸化防止剤)、商品名「Irgafos168」(BASF製、リン系酸化防止剤)、商品名「アデカスタブHP-10」、「アデカスタブPEP-36」((株)ADEKA製、リン系酸化防止剤)、商品名「HCA」(三光(株)製、リン系酸化防止剤)等の市販品を使用することもできる。 In the curable resin composition of the present invention, the antioxidant can be used alone or in combination of two or more. Antioxidants can also be produced by known or conventional methods. For example, trade names “Irganox 1010” (manufactured by BASF, phenolic antioxidants), trade names “AO-60”, “AO-80”. ”(Manufactured by ADEKA Corporation, phenolic antioxidant), trade name“ Irgafos168 ”(manufactured by BASF, phosphorous antioxidant), trade names“ ADK STAB HP-10 ”,“ ADEKA STAB PEP-36 ”(Corporation) Commercial products such as ADEKA (phosphorus antioxidant) and trade name “HCA” (manufactured by Sanko Co., Ltd., phosphorus antioxidant) can also be used.
本発明の硬化性樹脂組成物が酸化防止剤を含有する場合、酸化防止剤の含有量(配合量)は、特に限定されないが、硬化性樹脂組成物に含まれるエポキシ基を有する化合物の全量100重量部に対して、0.1~5重量部が好ましく、より好ましくは0.5~3重量部である。酸化防止剤の含有量を0.1重量部以上とすることにより、硬化物(リフレクター)の酸化が効率的に防止され、耐熱性、耐光性がより向上する傾向がある。一方、酸化防止剤の含有量を5重量部以下とすることにより、着色が抑制され、色相がより良好なリフレクターが得られやすい傾向がある。 When the curable resin composition of the present invention contains an antioxidant, the content (blending amount) of the antioxidant is not particularly limited, but the total amount of compounds having an epoxy group contained in the curable resin composition is 100. The amount is preferably 0.1 to 5 parts by weight, more preferably 0.5 to 3 parts by weight with respect to parts by weight. By setting the content of the antioxidant to 0.1 parts by weight or more, oxidation of the cured product (reflector) is efficiently prevented, and heat resistance and light resistance tend to be further improved. On the other hand, when the content of the antioxidant is 5 parts by weight or less, coloring tends to be suppressed and a reflector having a better hue tends to be obtained.
[添加剤]
本発明の硬化性樹脂組成物は、上述の成分以外にも、本発明の効果を損なわない範囲で各種添加剤を含有していてもよい。上記添加剤として、例えば、エチレングリコール、ジエチレングリコール、プロピレングリコール、グリセリン等のヒドロキシ基を有する化合物(特に、脂肪族多価アルコール)を含有させると、反応を緩やかに進行させることができる。その他にも、粘度や光反射性を損なわない範囲内で、消泡剤、レベリング剤、γ-グリシドキシプロピルトリメトキシシランや3-メルカプトプロピルトリメトキシシラン等のシランカップリング剤、界面活性剤、難燃剤、着色剤、イオン吸着体、紫外線吸収剤、光安定剤、白色顔料(C)以外の顔料等の慣用の添加剤を使用することができる。これら添加剤の含有量は特に限定されず、適宜選択可能である。
[Additive]
The curable resin composition of the present invention may contain various additives in addition to the above-described components as long as the effects of the present invention are not impaired. For example, when a compound having a hydroxy group (especially an aliphatic polyhydric alcohol) such as ethylene glycol, diethylene glycol, propylene glycol, or glycerin is contained as the additive, the reaction can be allowed to proceed slowly. In addition, antifoaming agents, leveling agents, silane coupling agents such as γ-glycidoxypropyltrimethoxysilane and 3-mercaptopropyltrimethoxysilane, and surfactants, as long as the viscosity and light reflectivity are not impaired. Conventional additives such as flame retardants, colorants, ion adsorbents, ultraviolet absorbers, light stabilizers, and pigments other than the white pigment (C) can be used. The content of these additives is not particularly limited and can be appropriately selected.
本発明の硬化性樹脂組成物が、脂環式エポキシ化合物(A)、ゴム粒子(B)、白色顔料(C)、無機充填剤(D)、硬化剤(E)、硬化促進剤(F)、イソシアヌル酸誘導体(H)、及びシロキサン誘導体(I)を含有する場合、脂環式エポキシ化合物(A)、ゴム粒子(B)、硬化剤(E)、硬化促進剤(F)、イソシアヌル酸誘導体(H)、及びシロキサン誘導体(I)からなる混合物の25℃における粘度は、特に限定されないが、5000mPa・s以下であることが好ましい。なお、本発明の硬化性樹脂組成物は、エチレングリコール等の上述の脂肪族多価アルコールを含んでいてもよく、この場合、上述の混合物は、脂環式エポキシ化合物(A)、ゴム粒子(B)、硬化剤(E)、硬化促進剤(F)、イソシアヌル酸誘導体(H)、シロキサン誘導体(I)、及び脂肪族多価アルコールからなる混合物である。 The curable resin composition of the present invention comprises an alicyclic epoxy compound (A), rubber particles (B), a white pigment (C), an inorganic filler (D), a curing agent (E), and a curing accelerator (F). , Isocyanuric acid derivative (H), and siloxane derivative (I), alicyclic epoxy compound (A), rubber particle (B), curing agent (E), curing accelerator (F), isocyanuric acid derivative The viscosity at 25 ° C. of the mixture comprising (H) and the siloxane derivative (I) is not particularly limited, but is preferably 5000 mPa · s or less. In addition, the curable resin composition of the present invention may contain the above-described aliphatic polyhydric alcohol such as ethylene glycol. In this case, the above-described mixture includes the alicyclic epoxy compound (A), rubber particles ( B), a curing agent (E), a curing accelerator (F), an isocyanuric acid derivative (H), a siloxane derivative (I), and an aliphatic polyhydric alcohol.
一方、本発明の硬化性樹脂組成物が、脂環式エポキシ化合物(A)、ゴム粒子(B)、白色顔料(C)、無機充填剤(D)、硬化触媒(G)、イソシアヌル酸誘導体(H)、及びシロキサン誘導体(I)を含有する場合、脂環式エポキシ化合物(A)、ゴム粒子(B)、硬化触媒(G)、イソシアヌル酸誘導体(H)、及びシロキサン誘導体(I)からなる混合物の25℃における粘度は、特に限定されないが、5000mPa・s以下であることが好ましい。なお、本明細書において、上記の二種の混合物の25℃における粘度を、総称して、「樹脂粘度」と称する場合がある。 On the other hand, the curable resin composition of the present invention comprises an alicyclic epoxy compound (A), rubber particles (B), a white pigment (C), an inorganic filler (D), a curing catalyst (G), an isocyanuric acid derivative ( In the case of containing H) and a siloxane derivative (I), it comprises an alicyclic epoxy compound (A), rubber particles (B), a curing catalyst (G), an isocyanuric acid derivative (H), and a siloxane derivative (I). The viscosity of the mixture at 25 ° C. is not particularly limited, but is preferably 5000 mPa · s or less. In the present specification, the viscosity at 25 ° C. of the above-mentioned two kinds of mixtures may be collectively referred to as “resin viscosity”.
上記樹脂粘度は、常圧において25℃で測定した粘度である。上記樹脂粘度は、5000mPa・s以下であることが好ましく、より好ましくは4000mPa・s以下、さらに好ましくは3500mPa・s以下、特に好ましくは3000mPa・s以下である。上記樹脂粘度が5000mPa・s以下であると、樹脂粘度が5000mPa・sを超える場合よりも、硬化物の耐熱性、耐光性、及び耐クラック性(特に、優れた耐熱性)がさらに優れる傾向がある。また、上記樹脂粘度が比較的低いことにより、白色顔料(C)や無機充填剤(D)等の他の成分の含有量を増やすことが可能となり、硬化物の光反射性、耐熱性及び耐光性がよりいっそう向上する傾向がある。上記樹脂粘度の下限は、例えば100mPa・s以上である。なお、上記樹脂粘度は、例えば、デジタル粘度計(型番「DVU-EII型」、(株)トキメック製)を用いて、ローター:標準1°34′×R24、温度:25℃、回転数:0.5~10rpmの条件で測定することができる。 The resin viscosity is a viscosity measured at 25 ° C. at normal pressure. The resin viscosity is preferably 5000 mPa · s or less, more preferably 4000 mPa · s or less, further preferably 3500 mPa · s or less, and particularly preferably 3000 mPa · s or less. When the resin viscosity is 5000 mPa · s or less, the heat resistance, light resistance, and crack resistance (particularly excellent heat resistance) of the cured product tend to be more excellent than when the resin viscosity exceeds 5000 mPa · s. is there. Further, since the resin viscosity is relatively low, it is possible to increase the content of other components such as white pigment (C) and inorganic filler (D), and the light reflectivity, heat resistance and light resistance of the cured product. There is a tendency for sex to be further improved. The lower limit of the resin viscosity is, for example, 100 mPa · s or more. The resin viscosity is measured using, for example, a digital viscometer (model number “DVU-EII type”, manufactured by Tokimec Co., Ltd.), rotor: standard 1 ° 34 ′ × R24, temperature: 25 ° C., rotational speed: 0 It can be measured under the condition of 5 to 10 rpm.
上記樹脂粘度は、例えば、用いる成分(例えば、脂環式エポキシ化合物(A)、硬化剤(E)、硬化促進剤(F)、硬化触媒(G)、イソシアヌル酸誘導体(H)、及びシロキサン誘導体(I)等)として、25℃で液体の成分を用いることにより得やすくなる。なお、上記成分として25℃で固体の成分を用いてもよいが、その含有量は、上記樹脂粘度が5000mPa・s以下となるように調整される。また、ゴム粒子(B)の含有量を、本発明の効果を損なわない範囲内で調整することによっても得やすくなる。 The resin viscosity is, for example, the components used (for example, alicyclic epoxy compound (A), curing agent (E), curing accelerator (F), curing catalyst (G), isocyanuric acid derivative (H), and siloxane derivative. (I), etc.) can be easily obtained by using a liquid component at 25 ° C. In addition, although a solid component may be used as said component at 25 degreeC, the content is adjusted so that the said resin viscosity may be 5000 mPa * s or less. Moreover, it becomes easy to obtain by adjusting content of a rubber particle (B) within the range which does not impair the effect of this invention.
なお、本発明の硬化性樹脂組成物は、加熱して該硬化性樹脂組成物における脂環式エポキシ化合物(A)及び硬化剤(E)の一部を反応させることによって得られる、Bステージ化させた硬化性樹脂組成物(Bステージ状態の硬化性樹脂組成物)であってもよい。 The curable resin composition of the present invention is obtained by heating and reacting a part of the alicyclic epoxy compound (A) and the curing agent (E) in the curable resin composition to be a B-stage. It may be a curable resin composition (a curable resin composition in a B-stage state).
上述のように、本発明の硬化性樹脂組成物は硬化後の光反射性、耐熱性及び耐光性に優れるため、特に、トランスファー成型用樹脂組成物やコンプレッション成型用樹脂組成物として好ましく使用できる。中でも、本発明の硬化性樹脂組成物は、コンプレッション成型によって形成された硬化物(リフレクター)の光反射性、耐熱性及び耐光性に特に優れるため、コンプレッション成型用の樹脂組成物であることが特に好ましい。 As described above, since the curable resin composition of the present invention is excellent in light reflectivity, heat resistance and light resistance after curing, it can be preferably used particularly as a resin composition for transfer molding or a resin composition for compression molding. Among them, the curable resin composition of the present invention is particularly excellent in the light reflectivity, heat resistance, and light resistance of a cured product (reflector) formed by compression molding, and thus is particularly a resin composition for compression molding. preferable.
本発明の硬化性樹脂組成物は、特に限定されないが、上記の各成分を、必要に応じて加熱した状態で撹拌・混合することにより調製することができる。なお、本発明の硬化性樹脂組成物は、各成分があらかじめ混合されたものをそのまま使用する1液系の組成物として使用することもできるし、例えば、別々に保管しておいた2以上の成分を使用前に所定の割合で混合して使用する多液系(例えば、2液系)の組成物として使用することもできる。上記撹拌・混合の方法は、特に限定されず、例えば、ディゾルバー、ホモジナイザー等の各種ミキサー、ニーダー、ロール、ビーズミル、自公転式撹拌装置等の公知乃至慣用の撹拌・混合手段を使用できる。また、撹拌・混合後、真空下にて脱泡してもよい。 The curable resin composition of the present invention is not particularly limited, but can be prepared by stirring and mixing each of the above components in a heated state as necessary. In addition, the curable resin composition of the present invention can be used as a one-component composition in which each component is mixed in advance, for example, two or more stored separately. It can also be used as a multi-component (for example, two-component) composition in which the components are mixed at a predetermined ratio before use. The stirring / mixing method is not particularly limited, and for example, known or conventional stirring / mixing means such as various mixers such as a dissolver and a homogenizer, a kneader, a roll, a bead mill, a self-revolving stirrer and the like can be used. Further, after stirring and mixing, defoaming may be performed under vacuum.
特に限定されないが、ゴム粒子(B)は、あらかじめ脂環式エポキシ化合物(A)中に分散させた組成物(当該組成物を「ゴム粒子分散エポキシ化合物」と称する場合がある)の状態で配合することが好ましい。即ち、本発明の硬化性樹脂組成物は、上記ゴム粒子分散エポキシ化合物と、白色顔料(C)と、無機充填剤(D)と、硬化剤(E)及び硬化促進剤(F)、又は、硬化触媒(G)と、必要に応じてその他の成分とを混合することにより調製することが好ましい。このような調製方法により、特に、硬化性樹脂組成物におけるゴム粒子(B)の分散性を向上させることができる。ただし、ゴム粒子(B)の配合方法は、上記方法に限定されず、それ単独で配合する方法であってもよい。 Although not particularly limited, the rubber particles (B) are blended in a state of being preliminarily dispersed in the alicyclic epoxy compound (A) (the composition may be referred to as “rubber particle dispersed epoxy compound”). It is preferable to do. That is, the curable resin composition of the present invention includes the rubber particle-dispersed epoxy compound, the white pigment (C), the inorganic filler (D), the curing agent (E) and the curing accelerator (F), or It is preferable to prepare by mixing the curing catalyst (G) and other components as necessary. Such a preparation method can particularly improve the dispersibility of the rubber particles (B) in the curable resin composition. However, the blending method of the rubber particles (B) is not limited to the above method, and may be a method of blending alone.
(ゴム粒子分散エポキシ化合物)
上記ゴム粒子分散エポキシ化合物は、ゴム粒子(B)を脂環式エポキシ化合物(A)に分散させることによって得られる。なお、上記ゴム粒子分散エポキシ化合物における脂環式エポキシ化合物(A)は、硬化性樹脂組成物を構成する脂環式エポキシ化合物(A)の全量であってもよいし、一部の量であってもよい。同様に、上記ゴム粒子分散エポキシ化合物におけるゴム粒子(B)は、硬化性樹脂組成物を構成するゴム粒子(B)の全量であってもよいし、一部の量であってもよい。
(Rubber particle dispersed epoxy compound)
The rubber particle-dispersed epoxy compound is obtained by dispersing rubber particles (B) in an alicyclic epoxy compound (A). The alicyclic epoxy compound (A) in the rubber particle-dispersed epoxy compound may be the total amount or a partial amount of the alicyclic epoxy compound (A) constituting the curable resin composition. May be. Similarly, the rubber particles (B) in the rubber particle-dispersed epoxy compound may be the total amount or a partial amount of the rubber particles (B) constituting the curable resin composition.
上記ゴム粒子分散エポキシ化合物の粘度は、例えば、反応性希釈剤を併用することにより調整することができる(即ち、ゴム粒子分散エポキシ化合物は、さらに反応性希釈剤を含んでいてもよい)。上記反応性希釈剤としては、例えば、常温(25℃)における粘度が200mPa・s以下の脂肪族ポリグリシジルエーテルを好ましく使用できる。粘度(25℃)が200mPa・s以下の脂肪族ポリグリシジルエーテルとしては、例えば、シクロヘキサンジメタノールジグリシジルエーテル、シクロヘキサンジオールジグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、1,6-ヘキサンジオールジグリシジルエーテル、トリメチロールプロパントリグリシジルエーテル、ポリプロピレングリコールジグリシジルエーテル等が挙げられる。 The viscosity of the rubber particle-dispersed epoxy compound can be adjusted, for example, by using a reactive diluent together (that is, the rubber particle-dispersed epoxy compound may further contain a reactive diluent). As the reactive diluent, for example, an aliphatic polyglycidyl ether having a viscosity at room temperature (25 ° C.) of 200 mPa · s or less can be preferably used. Examples of the aliphatic polyglycidyl ether having a viscosity (25 ° C.) of 200 mPa · s or less include cyclohexanedimethanol diglycidyl ether, cyclohexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, and 1,6-hexanediol diglycidyl ether. , Trimethylolpropane triglycidyl ether, polypropylene glycol diglycidyl ether, and the like.
上記反応性希釈剤の使用量は、適宜調整することができ、特に限定されないが、上記ゴム粒子分散エポキシ化合物全量100重量部に対して、30重量部以下が好ましく、より好ましくは25重量部以下(例えば、5~25重量部)である。使用量が30重量部以下であると、強靭性(耐クラック性)の向上等の所望の性能を得やすくなる傾向がある。 The amount of the reactive diluent used can be appropriately adjusted and is not particularly limited, but is preferably 30 parts by weight or less, more preferably 25 parts by weight or less, with respect to 100 parts by weight of the total amount of the rubber particle-dispersed epoxy compound. (For example, 5 to 25 parts by weight). When the amount used is 30 parts by weight or less, desired performance such as improvement of toughness (crack resistance) tends to be easily obtained.
上記ゴム粒子分散エポキシ化合物の製造方法は、特に限定されず、周知慣用の方法を使用することができる。例えば、ゴム粒子(B)を脱水乾燥して粉体とした後に、脂環式エポキシ化合物(A)に混合し、分散させる方法や、ゴム粒子(B)のエマルジョンと脂環式エポキシ化合物(A)とを直接混合し、続いて脱水する方法等が挙げられる。 The method for producing the rubber particle-dispersed epoxy compound is not particularly limited, and a well-known and commonly used method can be used. For example, after the rubber particles (B) are dehydrated and dried to form a powder, the rubber particles (B) are mixed and dispersed in the alicyclic epoxy compound (A), or the emulsion of the rubber particles (B) and the alicyclic epoxy compound (A And the like, followed by dehydration and the like.
本発明の硬化性樹脂組成物の25℃における粘度は、特に限定されないが、100~1000000mPa・sが好ましく、より好ましくは200~800000mPa・s、さらに好ましくは300~800000mPa・sである。25℃における粘度を100mPa・s以上とすることにより、注型時の作業性が向上したり、硬化物の耐熱性及び耐光性がより向上する傾向がある。一方、25℃における粘度を1000000mPa・s以下とすることにより、注型時の作業性が向上したり、硬化物に注型不良に由来する不具合が生じにくくなる傾向がある。 The viscosity of the curable resin composition of the present invention at 25 ° C. is not particularly limited, but is preferably 100 to 1000000 mPa · s, more preferably 200 to 800000 mPa · s, and still more preferably 300 to 800000 mPa · s. By setting the viscosity at 25 ° C. to 100 mPa · s or more, workability during casting is improved, and heat resistance and light resistance of the cured product tend to be further improved. On the other hand, when the viscosity at 25 ° C. is set to 1000000 mPa · s or less, workability during casting is improved, and defects due to casting defects tend not to occur in the cured product.
<硬化物>
本発明の硬化性樹脂組成物を加熱によって硬化させることにより、光反射性に優れ、耐熱性、耐光性、及び耐クラック性に優れた硬化物を得ることができる。なお、本発明の硬化性樹脂組成物を硬化させた硬化物、即ち本発明の硬化性樹脂組成物の硬化物を「本発明の硬化物」と称する場合がある。硬化の際の加熱温度(硬化温度)は、特に限定されないが、50~200℃が好ましく、より好ましくは80~180℃である。また、硬化の際に加熱する時間(硬化時間)は、特に限定されないが、60~1800秒が好ましく、より好ましくは90~900秒である。硬化温度と硬化時間が上記範囲の下限値より低い場合は硬化が不十分となり、逆に上記範囲の上限値より高い場合は熱分解による黄変が発生するので好ましくない。硬化条件は種々の条件に依存するが、例えば、硬化温度を高くした場合は硬化時間を短く、硬化温度を低くした場合は硬化時間を長くする等により、適宜調整することができる。また、硬化処理は一段階(例えば、コンプレッション成型のみ)で行ってもよいし、例えば、多段階(例えば、コンプレッション成型後にポストキュアー(二次硬化)としてオーブン等でさらに加熱する等)で行ってもよい。また、ポストキュアーを行う場合、この際の加熱温度は、50~200℃が好ましく、より好ましくは60~180℃、より好ましくは硬化温度と同程度の温度である。また、ポストキュアーを行う時間は、0.5~10時間が好ましく、より好ましくは1~8時間である。
<Hardened product>
By curing the curable resin composition of the present invention by heating, a cured product having excellent light reflectivity and excellent heat resistance, light resistance, and crack resistance can be obtained. A cured product obtained by curing the curable resin composition of the present invention, that is, a cured product of the curable resin composition of the present invention may be referred to as “cured product of the present invention”. The heating temperature (curing temperature) during curing is not particularly limited, but is preferably 50 to 200 ° C, more preferably 80 to 180 ° C. Further, the heating time (curing time) at the time of curing is not particularly limited, but is preferably 60 to 1800 seconds, and more preferably 90 to 900 seconds. When the curing temperature and the curing time are lower than the lower limit of the above range, curing is insufficient, and when the curing temperature and the curing time are higher than the upper limit of the above range, yellowing due to thermal decomposition occurs. Although the curing conditions depend on various conditions, for example, when the curing temperature is increased, the curing time can be shortened, and when the curing temperature is decreased, the curing time can be appropriately increased. Further, the curing process may be performed in one stage (for example, compression molding only), for example, in multiple stages (for example, further heating in an oven or the like as post-curing (secondary curing) after compression molding). Also good. When post-curing is performed, the heating temperature at this time is preferably 50 to 200 ° C., more preferably 60 to 180 ° C., and more preferably about the same as the curing temperature. The post-curing time is preferably 0.5 to 10 hours, more preferably 1 to 8 hours.
本発明の硬化物は、高い光反射性を有し、耐熱性及び耐光性に優れる。このため、上記硬化物は劣化しにくく、経時で反射率が低下しにくい。従って、本発明の硬化性樹脂組成物は、LEDパッケージ用途(LEDパッケージの構成材、例えば、光半導体装置におけるリフレクター材、ハウジング材等)、電子部品の接着用途、液晶ディスプレイ用途(例えば、反射板など)、白色基板用インク、シーラー等として好ましく使用することができる。中でも、LEDパッケージ用の硬化性樹脂組成物(特に、光半導体装置におけるリフレクター用の硬化性樹脂組成物(即ち、リフレクター形成用の硬化性樹脂組成物))として特に好ましく使用することができる。 The cured product of the present invention has high light reflectivity and is excellent in heat resistance and light resistance. For this reason, the said hardened | cured material does not deteriorate easily and a reflectance does not fall easily with time. Therefore, the curable resin composition of the present invention is used for LED packages (component materials for LED packages, such as reflector materials and housing materials for optical semiconductor devices), adhesive applications for electronic components, and liquid crystal display applications (for example, reflectors). Etc.), and can be preferably used as white substrate ink, sealer and the like. Especially, it can use especially preferably as curable resin composition for LED packages (especially curable resin composition for reflectors in an optical semiconductor device (that is, curable resin composition for forming reflectors)).
本発明の硬化物の反射率(初期反射率)は、特に限定されないが、例えば、波長450nmの光の反射率が、93%以上であることが好ましく、より好ましくは94%以上、さらに好ましくは95%以上である。特に、450~800nmの光の反射率が93%以上であることが好ましく、より好ましくは94%以上、さらに好ましくは95%以上である。 The reflectance (initial reflectance) of the cured product of the present invention is not particularly limited. For example, the reflectance of light having a wavelength of 450 nm is preferably 93% or more, more preferably 94% or more, and still more preferably. 95% or more. In particular, the reflectance of light at 450 to 800 nm is preferably 93% or more, more preferably 94% or more, and still more preferably 95% or more.
本発明の硬化物の、120℃で250時間加熱した後の波長450nmの光の反射率(「加熱エージング後の反射率」と称する場合がある)の、初期反射率に対する保持率([加熱エージング後の反射率]/[初期反射率]×100)は、特に限定されないが、80%以上であることが好ましく、より好ましくは85%以上、さらに好ましくは90%以上である。特に、450~800nmの光の場合の保持率が80%以上であることが好ましく、より好ましくは85%以上、さらに好ましくは90%以上である。本発明の硬化性樹脂組成物によれば、コンプレッション成型により形成された硬化物は上記保持率を90%以上とすることが可能である。 The retention ratio of the light reflectance at a wavelength of 450 nm after heating for 250 hours at 120 ° C. (sometimes referred to as “reflectance after heat aging”) to the initial reflectance ([heat aging (Reflectance after) / [Initial reflectance] × 100) is not particularly limited, but is preferably 80% or more, more preferably 85% or more, and further preferably 90% or more. In particular, the retention in the case of 450 to 800 nm light is preferably 80% or more, more preferably 85% or more, and further preferably 90% or more. According to the curable resin composition of the present invention, the cured product formed by compression molding can have the above-mentioned retention rate of 90% or more.
本発明の硬化物の、強度10mW/cm2の紫外線を250時間照射した後の波長450nmの光に対する反射率(「紫外線エージング後の反射率」と称する場合がある)の、初期反射率に対する保持率([紫外線エージング後の反射率]/[初期反射率]×100)は、特に限定されないが、80%以上であることが好ましく、より好ましくは85%以上、さらに好ましくは90%以上である。特に、450~800nmの光の場合の保持率が80%以上であることが好ましく、より好ましくは85%以上、さらに好ましくは90%以上である。 Maintaining the reflectance of the cured product of the present invention with respect to light having a wavelength of 450 nm after irradiation with ultraviolet rays having an intensity of 10 mW / cm 2 for 250 hours (sometimes referred to as “reflectance after ultraviolet ray aging”) relative to the initial reflectance. The rate ([reflectance after ultraviolet ray aging] / [initial reflectivity] × 100) is not particularly limited, but is preferably 80% or more, more preferably 85% or more, and further preferably 90% or more. . In particular, the retention in the case of 450 to 800 nm light is preferably 80% or more, more preferably 85% or more, and further preferably 90% or more.
なお、上記反射率は、例えば、本発明の硬化物(厚み:3mm)を試験片とし、分光光度計(商品名「分光光度計 UV-2450」、(株)島津製作所製)を用いて測定することができる。 The reflectance is measured using, for example, a spectrophotometer (trade name “spectrophotometer UV-2450”, manufactured by Shimadzu Corporation) using the cured product of the present invention (thickness: 3 mm) as a test piece. can do.
本発明の硬化性樹脂組成物が光半導体装置におけるリフレクター用の硬化性樹脂組成物である場合、本発明の硬化性樹脂組成物は、光半導体装置における光半導体素子の基板(光半導体素子搭載用基板)が有するリフレクター(光反射部材)を形成する用途に用いられる成型材料(金型等で成型するのに使用する材料)である。従って、本発明の硬化性樹脂組成物を成型する(かつ硬化させる)ことによって、高い光反射性を有し、耐熱性及び耐光性に優れ、さらに耐クラック性に優れたリフレクターを有する高品質な(例えば、高耐久性の)光半導体素子搭載用基板を製造することができる。なお、リフレクターとは、光半導体装置において光半導体素子から発せられた光を反射させて、光の指向性及び輝度を高め、光の取り出し効率を向上させるための部材である。本発明の硬化物により形成されたリフレクターを少なくとも有する、光半導体素子搭載用に用いられる基板を、「本発明の光半導体素子搭載用基板」と称する場合がある。 When the curable resin composition of the present invention is a curable resin composition for a reflector in an optical semiconductor device, the curable resin composition of the present invention is a substrate of an optical semiconductor element (for mounting an optical semiconductor element) in an optical semiconductor device. This is a molding material (material used for molding with a mold or the like) used for forming a reflector (light reflecting member) included in the substrate. Therefore, by molding (and curing) the curable resin composition of the present invention, it has high light reflectivity, excellent heat resistance and light resistance, and has a high-quality reflector having excellent crack resistance. A substrate for mounting an optical semiconductor element (for example, highly durable) can be manufactured. The reflector is a member for reflecting light emitted from the optical semiconductor element in the optical semiconductor device to increase the directivity and luminance of the light and improve the light extraction efficiency. A substrate used for mounting an optical semiconductor element having at least a reflector formed of the cured product of the present invention may be referred to as “optical semiconductor element mounting substrate of the present invention”.
<光半導体素子搭載用基板>
本発明の光半導体素子搭載用基板は、本発明の硬化性樹脂組成物の硬化物(本発明の硬化性樹脂組成物を硬化させることにより得られる硬化物)により形成されたリフレクター(白色リフレクター)を少なくとも有する基板である。図1は、本発明の光半導体素子搭載用基板の一例を示す概略図であり、(a)は斜視図、(b)は断面図を示す。図1における100は白色リフレクター、101は金属配線(リードフレーム)、102は光半導体素子の搭載領域、103はパッケージ基板を示す。なお、パッケージ基板103には、金属配線101、さらに白色リフレクター100が取り付けられており、その中央(光半導体素子の搭載領域102)に光半導体素子107が置かれてダイボンディングされ、光半導体素子107とパッケージ基板103上の金属配線101の間はワイヤボンディングで接続される。パッケージ基板103の材質としては、樹脂、セラミックなどが使用されるが、白色リフレクターと同じものであってもよい。本発明の光半導体素子搭載用基板における上側の白色リフレクター100は、光半導体素子の搭載領域102の周囲を環状に取り囲み、上方に向かってその環の径が拡大するように傾斜した凹状の形状を有している。本発明の光半導体素子搭載用基板は、上記凹状の形状の内側の表面が少なくとも本発明の硬化性樹脂組成物の硬化物により形成されていればよい。また、図1に示すように、金属配線101に囲まれた部分(102の下部)は、パッケージ基板103の場合もあるし、白色リフレクター100の場合もある(即ち、図1における「100/103」は、白色リフレクター100であってもよいし、パッケージ基板103であってもよいことを意味する)。但し、本発明の光半導体素子搭載用基板は、図1に示す態様には限定されない。
<Optical semiconductor device mounting substrate>
The substrate for mounting an optical semiconductor element of the present invention is a reflector (white reflector) formed of a cured product of the curable resin composition of the present invention (cured product obtained by curing the curable resin composition of the present invention). Is a substrate having at least FIG. 1 is a schematic view showing an example of a substrate for mounting an optical semiconductor element of the present invention, where (a) is a perspective view and (b) is a cross-sectional view. In FIG. 1, 100 is a white reflector, 101 is a metal wiring (lead frame), 102 is an optical semiconductor element mounting region, and 103 is a package substrate. A
本発明の光半導体素子搭載用基板における白色リフレクターを形成する方法としては、公知乃至慣用の成型方法(例えば、コンプレッション成型等)を使用することができ、特に限定されないが、例えば、本発明の硬化性樹脂組成物を、トランスファー成型、コンプレッション成型、インジェクション成型、LIM成型(インジェクション成型)、ディスペンスによるダム成型等の各種成型方法に付す方法等が挙げられる。リフレクターを形成する際の硬化の条件としては、例えば、上述の硬化物を形成する際の条件等から適宜選択することができる。本発明においては、中でも、急激な硬化反応による発泡を防ぎ、硬化による応力ひずみを緩和して靭性(耐クラック性)を向上させることができる点で、多段階に分けて加熱処理を施し、段階的に硬化させることが好ましい。 As a method for forming a white reflector in the substrate for mounting an optical semiconductor element of the present invention, a known or conventional molding method (for example, compression molding or the like) can be used, and is not particularly limited. Examples include a method of subjecting the functional resin composition to various molding methods such as transfer molding, compression molding, injection molding, LIM molding (injection molding), and dam molding by dispensing. The curing conditions for forming the reflector can be appropriately selected from, for example, the conditions for forming the cured product described above. In the present invention, among other things, it is possible to prevent foaming due to a rapid curing reaction, relax stress strain due to curing, and improve toughness (crack resistance). It is preferable to cure it.
本発明の光半導体素子搭載用基板を光半導体装置における基板として使用し、該基板に対して光半導体素子を搭載することによって、本発明の光半導体装置が得られる。 The optical semiconductor device of the present invention can be obtained by using the optical semiconductor element mounting substrate of the present invention as a substrate in an optical semiconductor device and mounting the optical semiconductor element on the substrate.
<光半導体装置>
本発明の光半導体装置は、光源としての光半導体素子と、本発明の硬化性樹脂組成物の硬化物からなるリフレクター(反射材)とを少なくとも備える光半導体装置である。より具体的には、本発明の光半導体装置は、本発明の光半導体素子搭載用基板と、該基板に搭載された光半導体素子とを少なくとも有する光半導体装置である。本発明の光半導体装置は、リフレクターとして本発明の硬化性樹脂組成物の硬化物により形成されたリフレクターを有するため、経時で光の輝度が低下しにくく、信頼性が高い。図2は、本発明の光半導体装置の一例を示す概略図(断面図)である。図2における100は白色リフレクター、101は金属配線(リードフレーム)、103はパッケージ基板、104はボンディングワイヤ、105は封止材、106はダイボンディング、107は光半導体素子(LED素子)を示す。図2に示す光半導体装置においては、光半導体素子107から発せられた光が白色リフレクター100の表面(反射面)で反射するため、高い効率で光半導体素子107からの光が取り出される。なお、図2に示すように、本発明の光半導体装置における光半導体素子は、通常、透明な封止材(図2における105)によって封止されている。
<Optical semiconductor device>
The optical semiconductor device of the present invention is an optical semiconductor device comprising at least an optical semiconductor element as a light source and a reflector (reflecting material) made of a cured product of the curable resin composition of the present invention. More specifically, the optical semiconductor device of the present invention is an optical semiconductor device having at least the optical semiconductor element mounting substrate of the present invention and an optical semiconductor element mounted on the substrate. Since the optical semiconductor device of the present invention has a reflector formed of a cured product of the curable resin composition of the present invention as a reflector, the luminance of light is unlikely to decrease with time and the reliability is high. FIG. 2 is a schematic view (cross-sectional view) showing an example of the optical semiconductor device of the present invention. In FIG. 2, 100 is a white reflector, 101 is a metal wiring (lead frame), 103 is a package substrate, 104 is a bonding wire, 105 is a sealing material, 106 is die bonding, and 107 is an optical semiconductor element (LED element). In the optical semiconductor device shown in FIG. 2, the light emitted from the
図3、4は、本発明の光半導体装置の他の一例を示す図である。図3、4における108は、ヒートシンク(ケースヒートシンク)を示し、このようなヒートシンク108を有することにより、光半導体装置における放熱効率が向上する。図3は、ヒートシンクの放熱経路が光半導体素子の直下に位置する例であり、図4は、ヒートシンクの放熱経路が光半導体装置の横方向に位置する例である[(a)は上面図、(b)は(a)におけるA-A'断面図を示す]。図4における光半導体装置の側面に突出したヒートシンク108は、放熱フィンと称される場合がある。また、図4における109は、カソードマークを示す。但し、本発明の光半導体装置は、図2~4に示される態様に限定されない。
3 and 4 are diagrams showing another example of the optical semiconductor device of the present invention.
以下に、実施例に基づいて本発明をより詳細に説明するが、本発明はこれらの実施例により限定されるものではない。なお、表1~3における硬化性樹脂組成物の各成分の配合量の単位は重量部である。また、表1~3における「-」は、当該成分の配合を行わなかったことを意味する。 Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples. In Tables 1 to 3, the unit of the amount of each component of the curable resin composition is parts by weight. In Tables 1 to 3, “-” means that the component was not blended.
製造例1
(ゴム粒子の製造)
還流冷却器付きの1L重合容器に、イオン交換水500g、及びジオクチルスルホコハク酸ナトリウム0.68gを仕込み、窒素気流下に撹拌しながら、80℃に昇温した。ここに、ゴム粒子のコア部分を形成するために必要とする量の約5重量%分に該当するアクリル酸ブチル9.5g、スチレン2.57g、及びジビニルベンゼン0.39gからなる単量体混合物を一括添加し、20分間撹拌して乳化させた後、ペルオキソ二硫酸カリウム9.5mgを添加し、1時間撹拌して最初のシード重合を行った。続いて、ペルオキソ二硫酸カリウム180.5mgを添加し、5分間撹拌した。ここに、コア部分を形成するために必要とする量の残り(約95重量%分)のアクリル酸ブチル180.5g、スチレン48.89g、及びジビニルベンゼン7.33gにジオクチルスルホコハク酸ナトリウム0.95gを溶解させてなる単量体混合物を2時間かけて連続的に添加し、2度目のシード重合を行い、その後、1時間熟成してコア部分を得た。
次いで、ペルオキソ二硫酸カリウム60mgを添加して5分間撹拌し、ここに、メタクリル酸メチル60g、アクリル酸1.5g、及びアリルメタクリレート0.3gにジオクチルスルホコハク酸ナトリウム0.3gを溶解させてなる単量体混合物を30分かけて連続的に添加し、シード重合を行った。その後、1時間熟成し、コア部分を被覆するシェル層を形成した。
次いで、室温(25℃)まで冷却し、目開き120μmのプラスチック製網で濾過することにより、コアシェル構造を有するゴム粒子を含むラテックスを得た。得られたラテックスをマイナス30℃で凍結し、吸引濾過器で脱水洗浄した後、60℃で一昼夜送風乾燥してゴム粒子を得た。得られたゴム粒子の平均粒子径は108nm、最大粒子径は289nmであった。
Production Example 1
(Manufacture of rubber particles)
In a 1 L polymerization vessel equipped with a reflux condenser, 500 g of ion-exchanged water and 0.68 g of sodium dioctylsulfosuccinate were charged, and the temperature was raised to 80 ° C. while stirring under a nitrogen stream. Here, a monomer mixture composed of 9.5 g of butyl acrylate, 2.57 g of styrene, and 0.39 g of divinylbenzene corresponding to about 5% by weight of the amount required to form the core portion of the rubber particles. Were added together and emulsified by stirring for 20 minutes, and then 9.5 mg of potassium peroxodisulfate was added and stirred for 1 hour to perform the first seed polymerization. Subsequently, 180.5 mg of potassium peroxodisulfate was added and stirred for 5 minutes. Here, the remaining amount (about 95% by weight) of butyl acrylate 180.5 g, styrene 48.89 g, divinylbenzene 7.33 g and 0.95 g sodium dioctyl sulfosuccinate required to form the core portion. A monomer mixture obtained by dissolving sucrose was continuously added over 2 hours to perform seed polymerization for the second time, and then aged for 1 hour to obtain a core part.
Next, 60 mg of potassium peroxodisulfate was added and stirred for 5 minutes. Here, 0.3 g of sodium dioctylsulfosuccinate was dissolved in 60 g of methyl methacrylate, 1.5 g of acrylic acid and 0.3 g of allyl methacrylate. The monomer mixture was continuously added over 30 minutes to perform seed polymerization. Then, it aged for 1 hour and formed the shell layer which coat | covers a core part.
Next, the mixture was cooled to room temperature (25 ° C.) and filtered through a plastic mesh having an opening of 120 μm to obtain a latex containing rubber particles having a core-shell structure. The obtained latex was frozen at −30 ° C., dehydrated and washed with a suction filter, and then blown and dried at 60 ° C. overnight to obtain rubber particles. The resulting rubber particles had an average particle size of 108 nm and a maximum particle size of 289 nm.
なお、ゴム粒子の平均粒子径、最大粒子径は、動的光散乱法を測定原理とした「NanotracTM」形式のナノトラック粒度分布測定装置(商品名「UPA-EX150」、日機装(株)製)を使用して試料を測定し、得られた粒度分布曲線において、累積カーブが50%となる時点の粒子径である累積平均径を平均粒子径、粒度分布測定結果の頻度(%)が0.00%を超えた時点の最大の粒子径を最大粒子径とした。なお、上記試料としては、下記製造例2で得られたゴム粒子分散エポキシ化合物1重量部をテトラヒドロフラン20重量部に分散させたものを用いた。 The average particle size and the maximum particle size of the rubber particles are determined based on a nanotrac ™ particle size distribution measuring device (trade name “UPA-EX150”, manufactured by Nikkiso Co., Ltd.) using the dynamic light scattering method as a measurement principle. ) Was used to measure the sample, and in the obtained particle size distribution curve, the average particle size, which is the particle size when the cumulative curve becomes 50%, is the average particle size, and the frequency (%) of the particle size distribution measurement result is 0 The maximum particle size at the time of exceeding 0.000 was defined as the maximum particle size. In addition, as said sample, what disperse | distributed 1 weight part of rubber particle dispersion | distribution epoxy compounds obtained by the following manufacture example 2 to 20 weight part of tetrahydrofuran was used.
製造例2
(ゴム粒子分散エポキシ化合物の製造)
製造例1で得られたゴム粒子5重量部を、窒素気流下、60℃に加温した状態でディゾルバーを使用して、商品名「セロキサイド2021P」(3,4-エポキシシクロヘキシルメチル(3,4-エポキシ)シクロヘキサンカルボキシレート、(株)ダイセル製)100重量部に分散させ(1000rpm、60分間)、真空脱泡して、ゴム粒子分散エポキシ化合物(25℃での粘度:1036mPa・s)を得た。
なお、製造例2で得られたゴム粒子分散エポキシ化合物(5重量部のゴム粒子を100重量部のセロキサイド2021Pに分散させたもの)の25℃での粘度は、デジタル粘度計(商品名「DVU-EII型」、(株)トキメック製)を使用して測定した。
Production Example 2
(Manufacture of rubber particle-dispersed epoxy compounds)
Using a dissolver with 5 parts by weight of the rubber particles obtained in Production Example 1 heated to 60 ° C. in a nitrogen stream, the product name “Celoxide 2021P” (3,4-epoxycyclohexylmethyl (3,4) -Epoxy) cyclohexanecarboxylate (manufactured by Daicel Corporation) and dispersed in 100 parts by weight (1000 rpm, 60 minutes) and vacuum degassed to obtain a rubber particle-dispersed epoxy compound (viscosity at 25 ° C .: 1036 mPa · s). It was.
The viscosity at 25 ° C. of the rubber particle-dispersed epoxy compound obtained in Production Example 2 (5 parts by weight of rubber particles dispersed in 100 parts by weight of ceroxide 2021P) is a digital viscometer (trade name “DVU”). -EII ", manufactured by Tokimec Co., Ltd.).
製造例3
表1及び表2に示す配合割合(単位:重量部)で、商品名「リカシッドMH-700」(新日本理化(株)製)、商品名「U-CAT 18X」(サンアプロ(株)製)、及びエチレングリコール(和光純薬工業(株)製)を、自公転式撹拌装置(商品名「あわとり練太郎 AR-250」、(株)シンキー製)を使用して均一に混合し、脱泡して硬化剤組成物を得た。
Production Example 3
In the blending ratios (unit: parts by weight) shown in Table 1 and Table 2, the product name “Licacid MH-700” (manufactured by Shin Nippon Rika Co., Ltd.) and the product name “U-CAT 18X” (manufactured by San Apro Co., Ltd.) And ethylene glycol (manufactured by Wako Pure Chemical Industries, Ltd.) are uniformly mixed using a self-revolving stirrer (trade name “Awatori Nertaro AR-250”, manufactured by Shinky Co., Ltd.) It foamed and the hardening | curing agent composition was obtained.
実施例1
表1に示す配合割合(単位:重量部)に従って、製造例2で得たゴム粒子分散エポキシ化合物、イソシアヌル酸誘導体(モノアリルジグリシジルイソシアヌレート;商品名「MA-DGIC」、四国化成工業(株)製)、シロキサン誘導体(分子内に2つのエポキシ基を有するシロキサン誘導体;商品名「X-40-2678」を、自公転式撹拌装置(商品名「あわとり練太郎AR-250」、(株)シンキー製)を使用して均一に混合し、脱泡して、混合物を作製した。なお、上記混合は、MA-DGICを溶解させるために、80℃で1時間攪拌して実施した。
次に、表1に示す配合割合(単位:重量部)に従って、上記で得た混合物と、白色顔料(酸化チタン;商品名「DCF-T-17050」、レジノカラー工業(株)製)、無機充填剤(シリカ;商品名「FB-970FD」、デンカ(株)製)を、ディゾルバーを使用して均一に混合し、ロールミルによって所定条件下(ロールピッチ:0.2mm、回転数:25ヘルツ、3パス)で溶融混練して混練物を得た。
次に、表1に示す配合割合(単位:重量部)となるように上記で得た混練物と、製造例3で得た硬化剤組成物とを自公転式撹拌装置(商品名「あわとり練太郎AR-250」、(株)シンキー製)を使用して均一に混合し(2000rpm、5分間)、脱泡して、硬化性樹脂組成物を得た。
上記硬化性樹脂組成物をポリエステルからなる離型フィルムで挟み込み、150℃のコンプレッション成型用金型内に置き、3.0MPaの圧力で600秒間加熱及び加圧し、その後、ポストキュアー(150℃で5時間)を行うことによって、硬化物を得た。
Example 1
According to the blending ratio (unit: parts by weight) shown in Table 1, the rubber particle-dispersed epoxy compound obtained in Production Example 2, isocyanuric acid derivative (monoallyl diglycidyl isocyanurate; trade name “MA-DGIC”, Shikoku Kasei Kogyo Co., Ltd. ), A siloxane derivative (a siloxane derivative having two epoxy groups in the molecule; a trade name “X-40-2678”, a self-revolving stirrer (a trade name “Awatori Nerita AR-250”, The mixture was uniformly mixed and defoamed using a product manufactured by Shinky Co., Ltd., and the mixture was stirred at 80 ° C. for 1 hour in order to dissolve the MA-DGIC.
Next, according to the blending ratio (unit: parts by weight) shown in Table 1, the mixture obtained above, white pigment (titanium oxide; trade name “DCF-T-17050”, manufactured by Resino Color Industry Co., Ltd.), inorganic filling The agent (silica; trade name “FB-970FD”, manufactured by Denka Co., Ltd.) is uniformly mixed using a dissolver, and is subjected to predetermined conditions (roll pitch: 0.2 mm, rotation speed: 25 Hz, 3) by a roll mill. The kneaded product was obtained by melt kneading in a pass.
Next, the kneaded product obtained above and the curing agent composition obtained in Production Example 3 so as to have the blending ratio (unit: parts by weight) shown in Table 1 were mixed with a self-revolving stirrer (trade name “Awatori” The mixture was uniformly mixed (2000 rpm, 5 minutes) using Nertaro AR-250 "(Sinky Corp.) and defoamed to obtain a curable resin composition.
The curable resin composition is sandwiched between release films made of polyester, placed in a mold for compression molding at 150 ° C., heated and pressurized at a pressure of 3.0 MPa for 600 seconds, and then post-cured (5 at 150 ° C. Time), a cured product was obtained.
実施例2~14、比較例1~15
硬化性樹脂組成物の配合組成を表1又は表2に示すように変更したこと以外は、実施例1と同様にして硬化物を得た。なお、一部の実施例及び比較例においては、硬化性樹脂組成物の構成成分として、製造例2で得たゴム粒子分散エポキシ化合物に代えて又は合わせて、表1又は表2に示す脂環式エポキシ化合物を使用した。
Examples 2 to 14 and Comparative Examples 1 to 15
A cured product was obtained in the same manner as in Example 1 except that the composition of the curable resin composition was changed as shown in Table 1 or Table 2. In some examples and comparative examples, as a constituent component of the curable resin composition, the alicyclic ring shown in Table 1 or Table 2 is used instead of or in addition to the rubber particle-dispersed epoxy compound obtained in Production Example 2. The formula epoxy compound was used.
実施例15
表1に示す配合割合(単位:重量部)に従って、製造例2で得たゴム粒子分散エポキシ化合物、イソシアヌル酸誘導体(モノアリルジグリシジルイソシアヌレート;商品名「MA-DGIC」、四国化成工業(株)製)、シロキサン誘導体(分子内に2つのエポキシ基を有するシロキサン誘導体;商品名「X-40-2678」、信越化学工業(株)製)を、自公転式撹拌装置(商品名「あわとり練太郎AR-250」、(株)シンキー製)を使用して均一に混合し、脱泡して、混合物を作製した。なお、上記混合は、MA-DGICを溶解させるために、80℃で1時間攪拌して実施した。
次に、表1に示す配合割合(単位:重量部)に従って、上記で得た混合物と、白色顔料(酸化チタン;商品名「DCF-T-17050」、レジノカラー工業(株)製)、無機充填剤(シリカ;商品名「FB-970FD」、デンカ(株)製)を、ディゾルバーを使用して均一に混合し、ロールミルによって所定条件下(ロールピッチ:0.2mm、回転数:25ヘルツ、3パス)で溶融混練して混練物を得た。
次に、表1に示す配合割合(単位:重量部)となるように上記で得た混練物と、硬化触媒(商品名「サンエイド SI-100L」、三新化学工業(株)製)とを自公転式撹拌装置(商品名「あわとり練太郎AR-250」、(株)シンキー製)を使用して均一に混合し(2000rpm、5分間)、脱泡して、硬化性樹脂組成物を得た。
上記硬化性樹脂組成物をポリエステルからなる離型フィルムで挟み込み、150℃のコンプレッション成型用金型内に置き、3.0MPaの圧力で600秒間加熱及び加圧し、その後、ポストキュアー(150℃で5時間)を行うことによって、硬化物を得た。
Example 15
According to the blending ratio (unit: parts by weight) shown in Table 1, the rubber particle-dispersed epoxy compound obtained in Production Example 2, isocyanuric acid derivative (monoallyl diglycidyl isocyanurate; trade name “MA-DGIC”, Shikoku Kasei Kogyo Co., Ltd. )), A siloxane derivative (a siloxane derivative having two epoxy groups in the molecule; trade name “X-40-2678”, manufactured by Shin-Etsu Chemical Co., Ltd.), a self-revolving stirrer (trade name “Awatori” Using Nertaro AR-250 "(manufactured by Shinky Co., Ltd.), the mixture was uniformly mixed and defoamed to prepare a mixture. The above mixing was carried out with stirring at 80 ° C. for 1 hour in order to dissolve MA-DGIC.
Next, according to the blending ratio (unit: parts by weight) shown in Table 1, the mixture obtained above, white pigment (titanium oxide; trade name “DCF-T-17050”, manufactured by Resino Color Industry Co., Ltd.), inorganic filling The agent (silica; trade name “FB-970FD”, manufactured by Denka Co., Ltd.) is uniformly mixed using a dissolver, and is subjected to predetermined conditions (roll pitch: 0.2 mm, rotation speed: 25 Hz, 3) by a roll mill. The kneaded product was obtained by melt kneading in a pass.
Next, the kneaded product obtained above so as to have the blending ratio (unit: parts by weight) shown in Table 1 and the curing catalyst (trade name “Sun-Aid SI-100L”, manufactured by Sanshin Chemical Industry Co., Ltd.) Using a self-revolving stirrer (trade name “Awatori Nertaro AR-250”, manufactured by Shinky Co., Ltd.), uniformly mix (2000 rpm, 5 minutes), defoam, and curable resin composition Obtained.
The curable resin composition is sandwiched between release films made of polyester, placed in a mold for compression molding at 150 ° C., heated and pressurized at a pressure of 3.0 MPa for 600 seconds, and then post-cured (5 at 150 ° C. Time), a cured product was obtained.
実施例16、比較例16~24
硬化性樹脂組成物の配合組成を表1、表3に示すように変更したこと以外は、実施例15と同様にして硬化物を得た。なお、一部の実施例及び比較例においては、硬化性樹脂組成物の構成成分として、製造例2で得たゴム粒子分散エポキシ化合物に代えて又は合わせて、表1又は表3に示す脂環式エポキシ化合物を使用した。
Example 16 and Comparative Examples 16 to 24
A cured product was obtained in the same manner as in Example 15 except that the composition of the curable resin composition was changed as shown in Tables 1 and 3. In some examples and comparative examples, the alicyclic rings shown in Table 1 or Table 3 are used instead of or in addition to the rubber particle-dispersed epoxy compound obtained in Production Example 2 as a constituent of the curable resin composition. The formula epoxy compound was used.
なお、実施例1~16、比較例1~24における硬化性樹脂組成物の、25℃における性状(液状又は個体)を表1~3の「硬化性樹脂組成物の性状」に示す。 The properties (liquid or solid) at 25 ° C. of the curable resin compositions in Examples 1 to 16 and Comparative Examples 1 to 24 are shown in “Properties of Curable Resin Composition” in Tables 1 to 3.
<評価>
実施例及び比較例で得られた硬化物について、下記の評価を実施した。
<Evaluation>
The following evaluation was implemented about the hardened | cured material obtained by the Example and the comparative example.
[初期反射率]
実施例及び比較例で得られた硬化物を切削加工して、長さ30mm×幅30mm×厚み3mmの試験片を作製した。次いで、分光光度計(商品名「分光光度計 UV-2450」、(株)島津製作所製)を用いて、波長450nmの光に対する各試験片の反射率(「初期反射率」とする)を測定した。結果を表1~3に示す。
なお、初期反射率が95%以上であれば、光反射用材料として特に優れていると言える。
[Initial reflectance]
The cured products obtained in the examples and comparative examples were cut to prepare test pieces having a length of 30 mm × width of 30 mm × thickness of 3 mm. Next, using a spectrophotometer (trade name “Spectrophotometer UV-2450”, manufactured by Shimadzu Corporation), the reflectance (referred to as “initial reflectance”) of each test piece with respect to light having a wavelength of 450 nm is measured. did. The results are shown in Tables 1 to 3.
If the initial reflectance is 95% or more, it can be said that the material is particularly excellent as a light reflecting material.
[加熱エージング前後の反射率保持率]
初期反射率の評価を行った試験片(硬化物;長さ30mm×幅30mm×3mm厚)を用いて、当該試験片を120℃の乾燥機に入れて250時間放置する試験(耐熱試験)を行った後、波長450nmの光の反射率を初期反射率と同様に測定した。そして、下記式により、反射率保持率(加熱エージング前後)を算出した。結果を表1~3に示す。
[反射率保持率(加熱エージング前後)]=([加熱エージング後の反射率]/[初期反射率])×100
この反射率保持率が高いほど、硬化物が耐熱性に優れることが示唆される。なお、120℃、250時間加熱後の反射率保持率が90%以上であれば、光反射用材料として耐熱性に特に優れていると言える。
[Reflectance retention before and after heat aging]
Using a test piece (cured product; length 30 mm × width 30 mm × 3 mm thickness) on which the initial reflectance was evaluated, the test piece was placed in a dryer at 120 ° C. and allowed to stand for 250 hours (heat resistance test). After the measurement, the reflectance of light having a wavelength of 450 nm was measured in the same manner as the initial reflectance. And the reflectance maintenance factor (before and after heating aging) was computed by the following formula. The results are shown in Tables 1 to 3.
[Reflectance retention ratio (before and after heating aging)] = ([Reflectance after heating aging] / [Initial reflectance]) × 100
It is suggested that the higher the reflectance retention, the better the cured product is in heat resistance. In addition, if the reflectance retention after heating at 120 ° C. for 250 hours is 90% or more, it can be said that the material is particularly excellent in heat resistance as a light reflecting material.
[紫外線エージング前後の反射率保持率]
初期反射率の評価を行った試験片(硬化物;長さ30mm×幅30mm×3mm厚)を用いて、当該試験片に対し、強度10mW/cm2の紫外線を250時間照射する試験(耐光試験)を行った後、波長450nmの光の反射率を初期反射率と同様に測定した。そして、下記式により、反射率保持率(紫外線エージング前後)を算出した。結果を表1~3に示す。
[反射率保持率(紫外線エージング前後)]=([紫外線エージング後の反射率]/[初期反射率])×100
この反射率保持率が高いほど、硬化物が耐光性に優れることが示唆される。なお、強度10mW/cm2、250時間照射後の反射率保持率が90%以上であれば、光反射用材料として耐光性に特に優れていると言える。
[Reflectance retention before and after UV aging]
Using a test piece (cured product: length 30 mm × width 30 mm × 3 mm thickness) on which the initial reflectance was evaluated, the test piece was irradiated with ultraviolet light having an intensity of 10 mW / cm 2 for 250 hours (light resistance test) ), The reflectance of light having a wavelength of 450 nm was measured in the same manner as the initial reflectance. And the reflectance retention (before and after ultraviolet ray aging) was computed by the following formula. The results are shown in Tables 1 to 3.
[Reflectance retention (before and after ultraviolet aging)] = ([Reflectance after ultraviolet aging] / [Initial reflectance]) × 100
It is suggested that the higher the reflectance retention, the more excellent the light resistance of the cured product. In addition, when the intensity retention is 10 mW / cm 2 and the reflectance retention after irradiation for 250 hours is 90% or more, it can be said that it is particularly excellent in light resistance as a light reflecting material.
[切削加工時のクラック有無評価(強靭性評価)]
実施例及び比較例で得られた硬化物を切削加工して、幅5mm×長さ5mm×厚さ3mmの試験片を作製した。上記硬化物の切削加工には、マイクロ・カッティング・マシン(商品名「BS-300CL」、メイワフォーシス(株)製)を使用し、切削加工の際に硬化物にクラックが生じたか否かを、デジタルマイクロスコープ(商品名「VHX-900」、(株)キーエンス製)を用いて観察し、確認した。表1~3には、1サンプルにつき10個の試験片を作製し、そのうちクラックの発生が確認された試験片の個数[個/10個]を評価結果として示す。
[Evaluation of presence or absence of cracks during cutting (toughness evaluation)]
The cured products obtained in the examples and comparative examples were cut to prepare test pieces having a width of 5 mm, a length of 5 mm, and a thickness of 3 mm. For cutting of the cured product, a micro cutting machine (trade name “BS-300CL”, manufactured by Meiwa Forsys Co., Ltd.) was used, and whether or not cracks occurred in the cured product during the cutting process. This was observed and confirmed using a digital microscope (trade name “VHX-900”, manufactured by Keyence Corporation). In Tables 1 to 3, ten test pieces are prepared for each sample, and the number of test pieces in which cracks are confirmed [pieces / 10 pieces] is shown as an evaluation result.
[リフロー時のクラック有無評価(強靭性評価)]
上記切削加工により得られた試験片(幅5mm×長さ5mm×厚さ3mm)に対し、リフロー炉(商品名「UNI-5016F」、日本アントム(株)製)を用いて、260℃を最高温度として5秒間、全リフロー時間を90秒としてリフロー処理を施した。その後、当該リフロー処理により試験片にクラックが生じたか否かを、デジタルマイクロスコープ(商品名「VHX-900」、(株)キーエンス製)を用いて観察し、確認した。表1~3には、1サンプルにつき10個の試験片のリフロー処理を行い、そのうちクラックの発生が確認された試験片の個数[個/10個]を評価結果として示す。
[Evaluation of crack presence during reflow (toughness evaluation)]
Using a reflow furnace (trade name “UNI-5016F”, manufactured by Nippon Antom Co., Ltd.), the maximum temperature of 260 ° C. is applied to the test piece (width 5 mm × length 5 mm × thickness 3 mm) obtained by the above cutting process. The reflow treatment was performed at a temperature of 5 seconds and a total reflow time of 90 seconds. Thereafter, whether or not the test piece was cracked by the reflow treatment was observed and confirmed using a digital microscope (trade name “VHX-900”, manufactured by Keyence Corporation). Tables 1 to 3 show the number of test pieces [pieces / 10 pieces] in which the occurrence of cracks was confirmed among 10 test pieces per sample as evaluation results.
[総合判定]
各試験の結果、下記(1)~(5)をいずれも満たすものを○(良好)と判定した。一方、下記(1)~(5)のいずれかを満たさない場合には×(不良)と判定した。
(1)初期反射率:光反射率が95%以上
(2)加熱エージング前後の反射率保持率:反射率保持率が90%以上
(3)紫外線エージング前後の反射率保持率:反射率保持率が90%以上
(4)切削加工時のクラック有無評価:クラックが発生した個数が0個
(5)リフロー時のクラック有無評価:クラックが発生した個数が0個
結果を表1~3の「総合判定」の欄に示す。
[Comprehensive judgment]
As a result of each test, a sample satisfying all of the following (1) to (5) was judged as ◯ (good). On the other hand, when any of the following (1) to (5) was not satisfied, it was determined as x (defective).
(1) Initial reflectance: light reflectance is 95% or more (2) Reflectivity retention ratio before and after heating aging: Reflectivity retention ratio is 90% or more (3) Reflectivity retention ratio before and after ultraviolet aging: Reflectance retention ratio 90% or more (4) Evaluation of presence or absence of cracks during cutting: 0 number of cracks generated (5) Evaluation of presence or absence of cracks during reflow: 0 number of cracks generated It is shown in the “determination” column.
なお、表1~3に示す成分について、以下に説明する。
(ゴム粒子分散エポキシ化合物)
製造例2で得られたゴム粒子分散エポキシ化合物
(エポキシ化合物)
セロキサイド2021P:商品名「セロキサイド2021P」(3,4-エポキシシクロヘキシルメチル(3,4-エポキシ)シクロヘキサンカルボキシレート)、(株)ダイセル製
EHPE3150:商品名「EHPE3150」(2,2-ビス(ヒドロキシメチル)-1-ブタノールの1,2-エポキシ-4-(2-オキシラニル)シクロヘキサン付加物)、(株)ダイセル製
(イソシアヌル酸誘導体)
TEPIC:商品名「TEPIC」[トリグリシジルイソシアヌレート]、日産化学工業(株)製
MA-DGIC:商品名「MA-DGIC」[モノアリルジグリシジルイソシアヌレート]、四国化成工業(株)製
DA-MGIC:商品名「DA-MGIC」[ジアリルモノグリシジルイソシアヌレート]、四国化成工業(株)製
(シロキサン誘導体)
X-40-2678:商品名「X-40-2678」(分子内に2つのエポキシ基を有するシロキサン誘導体)、信越化学工業(株)製
X-40-2720:商品名「X-40-2720」(分子内に3つのエポキシ基を有するシロキサン誘導体)、信越化学工業(株)製
X-40-2670:商品名「X-40-2670」(分子内に4つのエポキシ基を有するシロキサン誘導体)、信越化学工業(株)製
(硬化剤組成物)
MH-700:商品名「リカシッドMH-700」(4-メチルヘキサヒドロ無水フタル酸/ヘキサヒドロ無水フタル酸)、新日本理化(株)製
18X:商品名「U-CAT 18X」(硬化促進剤)、サンアプロ(株)製
(添加剤)
エチレングリコール:商品名「エチレングリコール」、和光純薬工業(株)製
(硬化触媒)
サンエイド SI-100L:商品名「サンエイド SI-100L」、三新化学工業(株)製
(白色顔料)
DCF-T-17050:商品名「DCF-T-17050」(酸化チタン、平均粒子径0.3μm、最大粒子径1μm以下)、レジノカラー工業(株)製
(無機充填剤)
FB-970FD:商品名「FB-970FD」(シリカ、表面処理なし、平均粒子径16.7μm、最大粒子径70μm)、デンカ(株)製
DAW-1025:商品名「DAW-1025」(アルミナ、平均粒子径7.9μm、最大粒子径32μm)、デンカ(株)製
HF-05:商品名「HF-05」(窒化アルミナ、平均粒子径5μm、最大粒子径5μm)、デンカ(株)製
The components shown in Tables 1 to 3 will be described below.
(Rubber particle dispersed epoxy compound)
Rubber particle-dispersed epoxy compound (epoxy compound) obtained in Production Example 2
Celoxide 2021P: Trade name “Celoxide 2021P” (3,4-epoxycyclohexylmethyl (3,4-epoxy) cyclohexanecarboxylate), manufactured by Daicel Corporation EHPE3150: Trade name “EHPE3150” (2,2-bis (hydroxymethyl) ) -1-Butanol 1,2-epoxy-4- (2-oxiranyl) cyclohexane adduct), manufactured by Daicel Corporation (isocyanuric acid derivative)
TEPIC: Trade name “TEPIC” [triglycidyl isocyanurate], manufactured by Nissan Chemical Industries, Ltd. MA-DGIC: Trade name “MA-DGIC” [monoallyl diglycidyl isocyanurate], Shikoku Kasei Kogyo DA- MGIC: Trade name “DA-MGIC” [diallyl monoglycidyl isocyanurate], manufactured by Shikoku Chemicals Co., Ltd. (siloxane derivative)
X-40-2678: Trade name “X-40-2678” (siloxane derivative having two epoxy groups in the molecule), Shin-Etsu Chemical Co., Ltd. X-40-2720: Trade name “X-40-2720” "(Siloxane derivative having three epoxy groups in the molecule), X-40-2670 manufactured by Shin-Etsu Chemical Co., Ltd .: trade name" X-40-2670 "(siloxane derivative having four epoxy groups in the molecule) , Shin-Etsu Chemical Co., Ltd. (curing agent composition)
MH-700: Trade name “Licacid MH-700” (4-methylhexahydrophthalic anhydride / hexahydrophthalic anhydride), manufactured by Shin Nippon Rika Co., Ltd. 18X: Trade name “U-CAT 18X” (curing accelerator) , San Apro Co., Ltd. (additive)
Ethylene glycol: Trade name “Ethylene glycol”, Wako Pure Chemical Industries, Ltd. (curing catalyst)
Sun-Aid SI-100L: Trade name “Sun-Aid SI-100L”, manufactured by Sanshin Chemical Industry Co., Ltd. (white pigment)
DCF-T-17050: Trade name “DCF-T-17050” (titanium oxide, average particle size 0.3 μm, maximum particle size 1 μm or less), manufactured by Resino Color Industry Co., Ltd. (inorganic filler)
FB-970FD: Trade name “FB-970FD” (silica, no surface treatment, average particle size 16.7 μm, maximum particle size 70 μm), manufactured by Denka Corp. DAW-1025: Trade name “DAW-1025” (alumina, (Average particle size 7.9 μm, maximum particle size 32 μm), manufactured by Denka Co., Ltd. HF-05: trade name “HF-05” (alumina nitride, average particle size 5 μm, maximum particle size 5 μm), manufactured by Denka Co., Ltd.
本発明の硬化性樹脂組成物は上記構成を有するため、高い光反射性を有し、且つ、耐熱性及び耐光性に優れ、光反射性が経時で低下しにくい硬化物を形成することができ、特にコンプレッション成型により硬化物を形成した際に上記効果が顕著に発揮される。このため、経時で光の輝度が低下しにくく、信頼性の高い光半導体装置を提供することができる。 Since the curable resin composition of the present invention has the above-described configuration, it can form a cured product having high light reflectivity, excellent heat resistance and light resistance, and light reflectivity hardly decreasing over time. Especially, when the cured product is formed by compression molding, the above-mentioned effect is remarkably exhibited. Therefore, it is possible to provide a highly reliable optical semiconductor device in which the luminance of light hardly decreases over time.
100:白色リフレクター
101:金属配線(電極)
102:光半導体素子の搭載領域
103:パッケージ基板
104:ボンディングワイヤ
105:光半導体素子の封止材
106:ダイボンディング
107:光半導体素子
108:ヒートシンク
109:カソードマーク
100: White reflector 101: Metal wiring (electrode)
102: Mounting area of optical semiconductor element 103: Package substrate 104: Bonding wire 105: Sealing material for optical semiconductor element 106: Die bonding 107: Optical semiconductor element 108: Heat sink 109: Cathode mark
Claims (9)
で表される化合物を含む請求項1又は2に記載の光反射用硬化性樹脂組成物。 The alicyclic epoxy compound (A) is represented by the following formula (I-1)
The curable resin composition for light reflection of Claim 1 or 2 containing the compound represented by these.
[式(III-1)中、R7及びR8は、同一又は異なって、水素原子又は炭素数1~8のアルキル基を示す。]
で表される化合物である請求項1~3のいずれか1項に記載の光反射用硬化性樹脂組成物。 The isocyanuric acid derivative (H) is represented by the following formula (III-1)
[In Formula (III-1), R 7 and R 8 are the same or different and each represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. ]
The curable resin composition for light reflection according to any one of claims 1 to 3, which is a compound represented by the formula:
前記無機充填剤(D)が、シリカ、アルミナ、窒化ケイ素、窒化アルミニウム、及び窒化ホウ素からなる群より選択される少なくとも1種である請求項1~4のいずれか1項に記載の光反射用硬化性樹脂組成物。 The white pigment (C) is at least one selected from the group consisting of titanium oxide, zirconium oxide, zinc oxide, and barium sulfate;
The light reflecting material according to any one of claims 1 to 4, wherein the inorganic filler (D) is at least one selected from the group consisting of silica, alumina, silicon nitride, aluminum nitride, and boron nitride. Curable resin composition.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201780010306.7A CN108603010A (en) | 2016-02-12 | 2017-02-06 | Light reflection hardening resin composition and its solidfied material and optical semiconductor device |
| KR1020187025517A KR20180107227A (en) | 2016-02-12 | 2017-02-06 | A light-curable resin composition, a cured product thereof, and a optical semiconductor device |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016-025329 | 2016-02-12 | ||
| JP2016025329A JP2017141415A (en) | 2016-02-12 | 2016-02-12 | Curable resin composition for light reflection and cured product thereof, and optical semiconductor device |
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| Publication Number | Publication Date |
|---|---|
| WO2017138491A1 true WO2017138491A1 (en) | 2017-08-17 |
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| Application Number | Title | Priority Date | Filing Date |
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| PCT/JP2017/004216 Ceased WO2017138491A1 (en) | 2016-02-12 | 2017-02-06 | Curable resin composition for reflecting light, cured product thereof, and optical semiconductor device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP2017141415A (en) |
| KR (1) | KR20180107227A (en) |
| CN (1) | CN108603010A (en) |
| TW (1) | TW201739817A (en) |
| WO (1) | WO2017138491A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018135557A1 (en) * | 2017-01-23 | 2018-07-26 | 株式会社ダイセル | Curable epoxy resin composition |
| WO2019124476A1 (en) * | 2017-12-21 | 2019-06-27 | 株式会社ダイセル | Curable epoxy resin composition, cured product thereof, and optical semiconductor device |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111040702B (en) * | 2019-12-31 | 2022-10-11 | 无锡创达新材料股份有限公司 | Silicone epoxy resin composition for LED reflector cup and cured product thereof |
| KR20230122627A (en) * | 2020-12-22 | 2023-08-22 | 훈츠만 어드밴스트 머티리얼스 라이센싱 (스위처랜드) 게엠베하 | Curable two-part resin system |
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|---|---|---|---|---|
| WO2013002052A1 (en) * | 2011-06-27 | 2013-01-03 | 株式会社ダイセル | Curable resin composition for reflection of light, and optical semiconductor device |
| WO2013008680A1 (en) * | 2011-07-13 | 2013-01-17 | 株式会社ダイセル | Curable epoxy resin composition |
| JP2013100410A (en) * | 2011-11-09 | 2013-05-23 | Daicel Corp | Curable epoxy resin composition |
| JP2013129798A (en) * | 2011-12-22 | 2013-07-04 | Nippon Zeon Co Ltd | Resin composition for light reflecting member, light reflecting member, and light-emitting element |
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| JP2011060819A (en) * | 2009-09-07 | 2011-03-24 | Nitto Denko Corp | Resin composition for optical semiconductor element housing package, and optical semiconductor light emitting device obtained using the same |
| JP2015152643A (en) * | 2014-02-10 | 2015-08-24 | パナソニックIpマネジメント株式会社 | Thermosetting resin composition for light reflector, light reflector, and light emitting device |
-
2016
- 2016-02-12 JP JP2016025329A patent/JP2017141415A/en active Pending
-
2017
- 2017-02-06 CN CN201780010306.7A patent/CN108603010A/en active Pending
- 2017-02-06 WO PCT/JP2017/004216 patent/WO2017138491A1/en not_active Ceased
- 2017-02-06 KR KR1020187025517A patent/KR20180107227A/en not_active Withdrawn
- 2017-02-10 TW TW106104345A patent/TW201739817A/en unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013002052A1 (en) * | 2011-06-27 | 2013-01-03 | 株式会社ダイセル | Curable resin composition for reflection of light, and optical semiconductor device |
| WO2013008680A1 (en) * | 2011-07-13 | 2013-01-17 | 株式会社ダイセル | Curable epoxy resin composition |
| JP2013100410A (en) * | 2011-11-09 | 2013-05-23 | Daicel Corp | Curable epoxy resin composition |
| JP2013129798A (en) * | 2011-12-22 | 2013-07-04 | Nippon Zeon Co Ltd | Resin composition for light reflecting member, light reflecting member, and light-emitting element |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2018135557A1 (en) * | 2017-01-23 | 2018-07-26 | 株式会社ダイセル | Curable epoxy resin composition |
| JPWO2018135557A1 (en) * | 2017-01-23 | 2019-11-14 | 株式会社ダイセル | Curable epoxy resin composition |
| JP7146643B2 (en) | 2017-01-23 | 2022-10-04 | 株式会社ダイセル | Curable epoxy resin composition |
| WO2019124476A1 (en) * | 2017-12-21 | 2019-06-27 | 株式会社ダイセル | Curable epoxy resin composition, cured product thereof, and optical semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2017141415A (en) | 2017-08-17 |
| TW201739817A (en) | 2017-11-16 |
| CN108603010A (en) | 2018-09-28 |
| KR20180107227A (en) | 2018-10-01 |
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