[go: up one dir, main page]

WO2017164552A1 - Marqueur de motif incurvé et dispositif de suivi optique comprenant un marqueur - Google Patents

Marqueur de motif incurvé et dispositif de suivi optique comprenant un marqueur Download PDF

Info

Publication number
WO2017164552A1
WO2017164552A1 PCT/KR2017/002655 KR2017002655W WO2017164552A1 WO 2017164552 A1 WO2017164552 A1 WO 2017164552A1 KR 2017002655 W KR2017002655 W KR 2017002655W WO 2017164552 A1 WO2017164552 A1 WO 2017164552A1
Authority
WO
WIPO (PCT)
Prior art keywords
lens
curved
pattern
lens unit
incident
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2017/002655
Other languages
English (en)
Korean (ko)
Inventor
홍종규
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WOORI OPTO CO Ltd
Koh Young Technology Inc
Original Assignee
WOORI OPTO CO Ltd
Koh Young Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020160034121A external-priority patent/KR20160039588A/ko
Application filed by WOORI OPTO CO Ltd, Koh Young Technology Inc filed Critical WOORI OPTO CO Ltd
Priority to EP17770523.3A priority Critical patent/EP3434461B1/fr
Priority to JP2018549948A priority patent/JP6684361B2/ja
Priority to US16/087,253 priority patent/US10859789B2/en
Priority to CN201780019244.6A priority patent/CN109153200B/zh
Publication of WO2017164552A1 publication Critical patent/WO2017164552A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses

Definitions

  • the technical idea of the present invention relates to a marker capable of tracking the position of an object, and more particularly, to a marker having a curved pattern and an optical tracking device including the marker.
  • an optical tracking system can be used to track the position of an object.
  • optical tracking systems can be utilized to track objects in real time in equipment such as surgical robots.
  • An optical tracking system typically includes a plurality of markers attached to an object and imaging units for imaging light reflected by the markers, and mathematically calculating information obtained from the imaging units to acquire position information and the like.
  • Background art of the present invention is a marker for measuring position and attitude of Korean Patent Publication No. 10-1627813 (May 31, 2016), 'Optical tracking system' of No. 10-1487248 (January 22, 2015), No. 10- 1406220 (2014.06.03) 'Optical tracking system and tracking method using the same' is disclosed.
  • the technical idea of the present invention is to provide a marker capable of improving the precision of position detection and reducing the size, and an optical tracking device including the marker.
  • the technical idea of the present invention includes at least one lens having an incident surface, emits incident light within a target range, and light parallel to the optical axis of the incident light is applied to the incident surface.
  • a first lens unit formed to be vertically incident;
  • a second lens unit disposed between the first lens unit and the pattern unit and configured to adjust the light emitted from the first lens unit to focus on the curved pattern.
  • the curved pattern marker may emit light reflected from the pattern part in parallel with the incident light using the first lens part and the second lens part.
  • the curved pattern marker may further include an aperture disposed in front of the incident surface of the first lens unit to define a cross-sectional area in which light is incident on the incident surface of the first lens unit.
  • the incident surface of the first lens unit may be a plane parallel to the opening surface of the aperture.
  • the curved pattern marker may further include a third lens unit disposed in front of the stop to focus incident light onto the stop.
  • the area of the exit surface of the first lens unit may be larger than the area of the incident surface of the first lens unit. In one embodiment of the present invention, an area of the target range may be larger than an area of the emission surface of the first lens unit and smaller than or equal to an incident surface of the second lens unit.
  • the first lens unit includes a first lens, a second lens, and a third lens sequentially coupled in the direction of the second lens unit, and the second lens unit includes the first lens.
  • a fourth lens coupled to the curved lens may be further provided.
  • the first lens unit, the incident surface of the second lens is coupled to the exit surface of the first lens
  • the incident surface of the third lens is coupled to the exit surface of the second lens
  • the second lens unit may have a structure in which an incident surface of the curved lens is coupled to an exit surface of the fourth lens, and the fourth lens may be spaced apart from the third lens.
  • the incident surface of the fourth lens has a curvature smaller than the emission surface, the light emitted from the first lens portion is focused on the curved pattern through the fourth lens and the curved lens. Can be.
  • the exit surface of the curved lens has substantially the same curvature as the pattern portion, the pattern portion may be bonded to the exit surface of the curved lens.
  • the refractive index of each of the first to fourth lens and the curved lens, and the shape of each incident surface and exit surface may vary according to the curvature and size of the curved pattern.
  • the first lens unit may include a first lens, a second lens, and a third lens that are sequentially coupled in the direction of the second lens unit, and the curved lens is spaced apart from the third lens.
  • the light emitted from the third lens may be focused on the curved pattern through the curved lens.
  • a third lens unit disposed in a first direction opposite to the direction in which the second lens unit is disposed with respect to the first lens unit and having at least one lens; And a fourth lens unit disposed in the first direction from the third lens unit.
  • the third lens unit includes a fifth lens and a sixth lens sequentially coupled in the first direction, and the fourth lens unit is spaced apart from the fifth lens in the first direction.
  • the seventh lens may be provided.
  • the curved pattern marker further comprises a holder for accommodating the first lens portion and the second lens portion, wherein the pattern portion is bonded to the exit surface of the curved lens, or It can be glued on the inner surface of the holder opposite the exit surface of the curved lens.
  • the pattern portion may include an adhesive layer, a pattern layer on which the curved pattern is formed, and a reflective layer.
  • the technical idea of the present invention includes at least one lens having an incident surface, emits incident light within a target range, and light in parallel with an optical axis of the incident light is incident.
  • a first lens unit formed to be incident on the plane perpendicularly to the plane;
  • a pattern unit disposed to be spaced apart from the first lens unit and having a curved pattern to focus the light emitted to the first lens unit, wherein the light reflected from the pattern unit is reflected using the first lens unit.
  • a curved pattern marker is provided, which emits parallel to the incident light.
  • the curved pattern marker is disposed in front of the incident surface of the first lens unit, the aperture defining the cross-sectional area in which light is incident on the incident surface of the first lens unit, and disposed in front of the aperture
  • the light emitting device may further include a second lens unit configured to focus incident light onto the aperture.
  • the aperture limiting the cross-sectional area of the incident light; At least one lens disposed in a first direction with respect to the aperture and having an incident surface, the incident light is emitted within a target range, and light passing through the aperture parallel to an optical axis of the incident light A first lens unit formed to be incident perpendicular to the incident surface; A second lens unit disposed in the first direction from the first lens unit and having a curved lens that vertically emits a light component passing through the center of the aperture; A pattern unit disposed in the first direction from the exit surface of the curved lens and having a curved pattern formed thereon; And a holder accommodating the first lens portion, the second lens portion, and the pattern portion.
  • the pattern portion may be bonded to the exit surface of the curved lens. In one embodiment of the present invention, the pattern portion may be spaced apart from the exit surface of the curved lens. In one embodiment of the present disclosure, the curved pattern marker may further include a third lens unit disposed in front of the stop to focus incident light onto the stop.
  • the first lens unit includes a first lens, a second lens, and a third lens sequentially coupled in the direction of the second lens unit, and the second lens unit includes the first lens.
  • a fourth lens coupled to the curved lens may be further provided.
  • a third lens unit disposed in a second direction opposite to the first direction based on the aperture; And a fourth lens unit disposed in the second direction from the third lens unit.
  • the technical idea of the present invention includes at least one lens having an incidence surface, and the first lens unit is formed such that light parallel to the optical axis of the incident light is incident perpendicularly to the incidence surface.
  • a curved surface pattern marker having a curved surface pattern for focusing light emitted from the first lens portion, and reflecting the curved surface pattern to emit light in parallel light;
  • At least one imaging unit which receives parallel light with respect to the curved pattern to form an enlarged pattern image;
  • a processor configured to analyze the pattern image to calculate a position and a direction of the curved pattern marker.
  • the curved pattern marker is disposed in front of the incident surface of the first lens unit, and defines a cross-sectional area in which light is incident on the incident surface of the first lens unit, and in front of the aperture.
  • the display device may further include a second lens unit configured to focus incident light onto the aperture.
  • the curved pattern marker is disposed between the first lens portion and the pattern portion, the second to adjust the light emitted from the first lens portion to focus in the curved pattern
  • the lens unit may be further provided.
  • the curved pattern marker is disposed in front of the incident surface of the first lens unit, and defines a cross-sectional area in which light is incident on the incident surface of the first lens unit, and in front of the aperture.
  • the electronic device may further include a third lens unit arranged to collect incident light to the aperture.
  • the first lens unit includes a first lens, a second lens, and a third lens sequentially coupled in the direction of the second lens unit, and the second lens unit includes the first lens.
  • a fourth lens coupled to the curved lens may be further provided.
  • a third lens unit disposed in a first direction opposite to the direction in which the second lens unit is disposed with respect to the first lens unit and having at least one lens, and the third lens
  • the lens may further include a fourth lens unit disposed in the first direction.
  • the curved pattern marker includes a first lens portion, a second lens portion, and a pattern portion having a curved pattern, thereby allowing light to enter the curved pattern portion of the pattern portion, Through reflection of light, the curved surface pattern may be emitted in the form of parallel light.
  • the curved pattern marker since the curved pattern marker according to the technical idea of the present invention emits the curved pattern by the reflected light, a separate light source is unnecessary, and the pattern portion including the curved pattern is adhered to the curved lens disposed at the outermost part. In this case, a separate physical device for disposing a curved pattern may be unnecessary.
  • the curved pattern marker may contribute to the reduction of the size of the lenses and the reduction of the size of the marker based on the use of the curved pattern.
  • the lens unit by configuring the lens unit so that light is incident directly through the aperture Ap, the position of the incident pupil relative to the angle of view is kept the same, thereby minimizing the position detection error of the marker.
  • the optical tracking device by including the curved pattern marker, it is possible to reduce the size of the entire device, including the reduction of the size of the marker, and also to improve the precision of position and orientation detection for the target object You can.
  • FIG. 2 is a conceptual diagram of a structure of a curved surface pattern marker according to an embodiment of the present invention.
  • 3 to 5 are cross-sectional views illustrating various structures of the curved surface pattern marker of FIG. 2 in detail.
  • FIG. 6 is a conceptual diagram of a structure of a curved surface pattern marker according to an embodiment of the present invention.
  • FIG. 7A and 7B are cross-sectional views illustrating various structures of the curved pattern marker of FIG. 6 in detail.
  • FIG. 8 is a conceptual diagram of a structure of a curved surface pattern marker according to an embodiment of the present invention.
  • FIG. 9 is a conceptual diagram of a structure of a curved surface pattern marker according to an embodiment of the present invention.
  • 10A and 10B are cross-sectional views illustrating an arrangement structure of a pattern portion in curved pattern markers according to example embodiments.
  • 11A to 11C are cross-sectional views illustrating the pattern portion in more detail in the curved pattern marker according to the embodiment of the present invention.
  • 12A and 12B are a plan view and a side view showing a holder portion of a curved pattern marker according to an embodiment of the present invention.
  • FIG. 13 is a block diagram of an optical tracking device including a curved pattern marker according to an embodiment of the present invention.
  • an optical lens manufactured by the method according to the present invention has a micro pattern inside the curved surface and forms an appropriate reflective layer to obtain an optical phenomenon similar to a retroreflective mirror in which light incident from the curved surface is reflected again. Can be.
  • the reflective surface inside the curved surface is provided with a micropattern, a fine pattern obtained by further reducing and condensing the micropattern shape between the focal point and the reflective surface determined by the R value of the inner curved surface of the optical lens may be obtained.
  • FIG. 2 is a conceptual diagram of a structure of a curved surface pattern marker according to an embodiment of the present invention.
  • the curved pattern marker 100 of the present exemplary embodiment may include a first lens unit 110, a second lens unit 120, and a pattern unit 130.
  • the first lens unit 110 may include at least one lens and may emit light incident through the aperture Ap, that is, incident light Pin, to the second lens unit 120.
  • the aperture Ap is a type of hole through which light incident to the first lens unit 110 passes, and the amount of light incident to the first lens unit 110 through the aperture Ap may be adjusted.
  • an exposed area of the first lens unit 110 by the aperture Ap may be fixed.
  • the present invention is not limited thereto, and the exposure area of the first lens unit 110 may be changed by the aperture Ap by adjusting the aperture Ap.
  • the aperture Ap may be disposed in front of the incident surface of the first lens unit 110 to define a cross-sectional area in which incident light Pin is incident on the incident surface of the first lens unit 110.
  • the aperture Ap may define a cross-sectional area where the incident light Pin is incident so that the light emitted from the first lens unit 110 is emitted into the target range Tr.
  • the first lens unit 110 may function to emit light into the target range Tr by refracting the incident light Pin through the lenses.
  • the target range Tr may be included in the incident surface of the first lens included in the second lens unit 120.
  • the area of the target range may be larger than the area of the exit surface of the first lens unit 110.
  • the area of the target range may be smaller than or equal to the incident surface of the second lens unit 120.
  • all the light incident into the target range Tr may be incident on the pattern unit 130 through the second lens unit 120.
  • an incident angle of light incident through the aperture Ap may be determined according to the target range Tr.
  • an angle of view at which light is incident on an aperture and formed in a camera is defined as an angle of view, and an angle of view may be determined by characteristics of lenses included in the camera. Similar to the definition of the angle of view of the camera, the angle of view may be defined as an angle at which light may be incident into the target range Tr in the curved pattern marker 100 of the present embodiment. For example, in the curved pattern marker 100 of FIG. 2, an angle of view Aof is indicated by both arrows of a curve.
  • the first lens unit 110 may include only one lens, or may include two or more lenses.
  • the incident light Pin passing through the aperture parallel to the optical axis may be incident perpendicularly to the incident surface of the first lens unit 110.
  • the incident surface of the first lens unit 110 may be a plane.
  • the incident surface of the first lens unit 110 may be a plane parallel to the opening surface of the aperture Ap.
  • the area of the exit surface of the first lens unit 110 may be larger than the area of the incident surface of the first lens unit 110.
  • the lenses when the first lens unit 110 includes two or more lenses, the lenses may have a structure in which the lenses are sequentially coupled to each other.
  • the incident surface of the second lens is coupled to the exit surface of the first lens in the direction in which the incident light Pin travels, and The lenses can be coupled in such a way that the entrance face of the third lens is coupled to the exit face.
  • the incident light Pin passing through the aperture parallel to the optical axis may be incident perpendicularly to the incident surface of the first lens.
  • the incident surface of the first lens may be a plane.
  • the area of the exit surface of the third lens may be larger than the area of the entrance surface of the first lens.
  • the second lens unit 120 may include at least one lens and may receive light emitted from the first lens unit 110 to enter the pattern unit 130 vertically.
  • the vertical incidence means that the light component passing through the center of the aperture Ap is vertically incident on the pattern unit 130 as shown in FIG. 3.
  • the concept of vertical incidence may be substantially the same as that of light incident to the pattern unit 130 so as to focus.
  • the light component deviating from the center of the aperture Ap may be incident at an acute angle to the pattern unit 130 and may be reflected according to a reflection law.
  • the second lens unit 120 includes a curved lens adjacent to the pattern unit 130, and the light incident on the second lens unit 120 passes through the exit surface of the curved lens to the pattern unit 130. Can be incident vertically.
  • the light is incident perpendicularly to the pattern unit 130 through the second lens unit 120, so that the light is reflected back vertically from the pattern unit 130 and the second lens unit 120 and the first lens unit ( It may be emitted through parallel to the incident light (Pin).
  • the second lens unit 120 may also include two or more lenses.
  • the lenses may have a structure in which the lenses are sequentially coupled to each other.
  • the structure of the second lens unit 120 will be described in more detail in the description of FIGS. 3 to 5.
  • the pattern unit 130 may have a concave curved shape with respect to a surface perpendicular to the incident light Pin.
  • the curved surface may be, for example, spherical or paraboloid.
  • a curved pattern (see Psph in FIG. 10A) and a reflective layer (see 136 in FIG. 10A) may be formed in the pattern unit 130.
  • Light incident on the pattern unit 130 may be reflected through the reflective layer. Since the curved surface pattern exists in the pattern unit 130, the curved surface may be reflected in the reflected light.
  • the curved pattern includes a transparent portion and an opaque portion, the light reflected from the pattern portion 130 may have different light intensities corresponding to the transparent portion and the opaque portion of the curved pattern.
  • the structure of the pattern unit 130 will be described in more detail in the description of FIGS. 10A to 10C.
  • the one point may correspond to the focal point of the lens. This may again be interpreted as the light coming from the focus passing through the lens and exiting as parallel light.
  • the spherical aberration is not generated at one point.
  • coma aberration, astigmatism aberration, curvature of field aberration, and distortion aberration may also occur.
  • the curved pattern marker 100 of the present embodiment uses the upper surface curvature aberration. More specifically, although the surface curvature aberration is a disadvantage of the optical system, the curved pattern marker 100 of the present invention makes the pattern surface of the curved surface to coincide with the curved focal plane by reversely using the image curvature aberration. Therefore, the incident light is focused on the pattern plane, which is the focal plane, and the top curvature aberration can be automatically removed.
  • the curved pattern marker 100 of the present exemplary embodiment is formed in a curved shape so that the pattern portion 130 coincides with the focal plane of the lens portion, in particular, the second lens portion 120. Can be effectively removed.
  • the focal plane of the lens portion, particularly the second lens portion corresponds to the curved surface of the pattern portion 130 with respect to the pattern portion 130 having a curved surface of a predetermined form.
  • the curved pattern portion since all light is incident to focus on the curved pattern, the curved pattern portion includes the first lens unit 110 and the second lens unit 120. It may correspond to the focus of the virtual objective lens configured as. As described above, the light reflected from the focal plane of the lens may be emitted as parallel light through the lens. Therefore, the curved pattern of the curved pattern marker 100 of the present exemplary embodiment may be emitted in the form of parallel light through the first lens unit 110 and the second lens unit 120 through the light reflected from the focal plane.
  • the curved surface pattern on the pattern portion 130 may have a curved shape, but the curved surface pattern reflected by the light through the reflection may have a two-dimensional shape of the curved surface.
  • the curved surface pattern marker 100 emits the curved surface pattern of the pattern portion 130 in parallel light form through the reflection of light and forms an image.
  • the curved pattern emitted in the form of parallel light from the unit is formed as an enlarged pattern image, and the processor (see 600 in FIG. 13) analyzes the pattern image, whereby the position ( position and orientation can be calculated.
  • the method for calculating the position and orientation of the marker using a planar pattern is described in the unpublished application KR 10-2016-0101377 (name of the invention: a marker for optical tracking, an optical tracking system and an optical tracking method) incorporated in the present invention.
  • the same position and direction calculation method may be applied to the curved pattern marker 100 of the present embodiment.
  • curved patterns of the first lens unit 110, the second lens unit 120, and the pattern unit 130 may be formed to form an infinite optical system in the optical estimating apparatus. Accordingly, the reflected light reflecting the curved pattern may be emitted in the form of parallel light through the second lens unit 120 and the first lens unit 110.
  • the curved pattern portion may correspond to the focal plane of the curved surface of the virtual objective lens including the first lens unit 110 and the second lens unit 120.
  • the imaging optical system of the optical estimation device may also be configured as an infinite optical system.
  • an image sensor may be disposed at a focal position of the imaging optical system so that parallel light incident at an infinite distance may be imaged on the image sensor.
  • the curved pattern marker 100 of the present embodiment may not configure an infinite optical system in the optical estimation device.
  • the imaging optical system is configured to be relatively large so that the curved pattern marker 100 is separated from the curved pattern marker 100.
  • the curved pattern marker 100 of the present embodiment includes the first lens unit 110, the second lens unit 120, and the pattern unit 130 having the curved pattern, thereby paralleling the curved surface pattern through reflection of light. Can be emitted in the form of light.
  • the curved pattern marker 100 of the present exemplary embodiment may acquire an image of the curved pattern using light incident and reflected so as to focus on the curved pattern of the pattern unit 130.
  • the pattern unit 130 is attached to and disposed on the outermost curved lens of the second lens unit 120, a separate physical device for disposing the curved pattern may be unnecessary.
  • the sizes of the lenses disposed in front of the curved pattern may be reduced.
  • the curved pattern marker 100 of the present embodiment can implement a marker that can improve the precision of position and direction detection while minimizing the size.
  • 3 to 5 are cross-sectional views illustrating various structures of the curved surface pattern marker of FIG. 2 in detail. Descriptions already described in the description of FIG. 2 are simply described or omitted.
  • the curved pattern marker 100a of the present exemplary embodiment may include a first lens unit 110a, a second lens unit 120a, and a pattern unit 130a.
  • the first lens unit 110a may include a first lens 112a, a second lens 114a, and a third lens 116a.
  • the first lens 112a, the second lens 114a, and the third lens 116a may be sequentially coupled to each other along a first direction (x direction) through which light is incident.
  • the first lens 112a may have an entrance face 112in and an exit face 112out to have a spherical cap or hemisphere shape as a whole. That is, the incident surface 112in of the first lens 112a may have a planar shape, and the emission surface 112out may have a hemispherical shape. Meanwhile, an aperture (Ap in FIG. 2) may be defined at an incident surface 112in of the first lens 112a. For example, light may be blocked from entering the outer portion of the first lens 112a through the aperture.
  • the center dashed-dotted line Pax corresponds to the optical axis of the lenses, and the solid black line may correspond to parallel light Lp parallel to the optical axis.
  • the aperture may limit the amount of light so that only the size of the first parallel light Lp is incident on the incident surface 112in of the first lens 112a.
  • the second lens 114a may include an incident surface 114in, a first plane 114p1, an exit surface 114out, and a first side surface 114si.
  • the second lens 114a may have a cylindrical shape as a whole, and may have a structure in which a hemisphere groove is formed in a portion corresponding to the first lens 112a.
  • the second lens 114a is a negative meniscus lens or a concave meniscus lens, wherein the curvature of the concave surface is greater than the curvature of the convex surface, and the concave surface may correspond to the groove of the hemisphere. Can be.
  • the incident surface 114in may have the same shape as the emission surface 112out of the first lens 112a. Therefore, the incident surface 114in and the exit surface 112out of the first lens 112a may have substantially the same curvature.
  • the first plane 114p1 may be parallel to the incident surface 112in of the first lens 112a.
  • the first plane 114p1 and the incident surface 112in of the first lens 112a may form the same plane, or may have a slight step as shown.
  • the exit surface 114out may have a slightly convex structure in the first direction (x direction).
  • the first side surface 114si may connect the first plane 114p1 and the exit surface 114out to form a cylindrical side surface.
  • the third lens 116a may have an incident surface 116in, an exit surface 116out, and a second side surface 116si.
  • the incident surface 116in may have the same shape as the emission surface 114out of the second lens 114a. Therefore, the incident surface 116in and the exit surface 114out of the second lens 114a may have substantially the same curvature.
  • the exit surface 116out may have a convex structure in the first direction (x direction).
  • the second side surface 116si may connect the incident surface 116in and the exit surface 116out. In some cases, the second side surface 116si may be omitted and the emission surface 116out may be directly connected to the incident surface 116in.
  • the third lens 116a is a positive meniscus lens or a convex meniscus lens, and the curvature of the concave surface may be smaller than the curvature of the convex surface. That is, the curvature of the incident surface 116in may be smaller than the curvature of the exit surface 116out.
  • the spherical aberration of the first lens 112a is formed by combining the second lens 114a and the third lens 116a and placing them on the exit surface 112out of the first lens 112a. Can be reduced.
  • the first lens unit 110a may allow the light incident on the incident surface 112in of the first lens 112a to be emitted within the target range Tr of the second lens unit 120a. Therefore, light incident at an angle smaller than the first angle ⁇ with respect to the incident surface 112in of the first lens 112a may not be input to the second lens unit 120a.
  • the light emitted from the second lens unit 120a in the opposite direction to the first direction (x direction) is emitted in the form of parallel light through the first lens unit 110a, and the incident of the first lens 112a occurs.
  • the light may be emitted at an angle greater than the first angle ⁇ with respect to the surface 112in.
  • the angle of view of the curved surface pattern marker 100a of the present embodiment may be 2 * ( ⁇ / 2- ⁇ ).
  • the second lens unit 120a may include one curved lens 124a. Therefore, in the curved pattern marker 100a of the present embodiment, the second lens unit 120a may be referred to as the curved lens 124a.
  • the curved lens 124a may have, for example, a negative meniscus lens structure. However, as shown, since the center and the outer portion are formed to have almost the same thickness, when the thickness is thin, there may be little difference in curvature.
  • the curved lens 124a may include an incident surface 124in, an exit surface 124out, and a second plane 124p2. Light emitted from the first lens unit 110a may be incident on the incident surface 124in of the curved lens 124a.
  • the target range Tr may be included in the incident surface 124in of the curved lens 124a. Light may be incident to the exit surface 124out of the curved lens 124a so as to focus. This may be because the pattern portion 130a is directly bonded to the exit surface 124out of the curved lens 124a as shown. However, if the pattern portion 130a corresponds to the complex focal plane of the first lens portion 110a and the second lens portion 120a, the pattern portion 130a may be spaced apart from the curved lens 124a. This will be described in more detail in the description of FIG. 5.
  • the second plane 124p2 may connect the incident surface 124in and the emission surface 124out.
  • the second plane 124p2 may or may not be parallel to the incident surface 112in of the first lens 112a.
  • the pattern unit 130a may include a curved pattern, and may be attached to the exit surface 124out of the curved lens 124a with the first curvature C1.
  • the first curvature C1 may mean the curvature of the circle or may mean the curvature of the ellipse. Since the pattern portion 130a is bonded to the exit surface 124out of the curved lens 124a, the curvature of the exit surface 124out of the curved lens 124a is substantially the same as the curvature of the pattern portion 130a. C1).
  • the curvature of the pattern portion 130a means the curvature of the inner surface, but since the thickness of the pattern portion 130a is very thin, the distinction between the inner surface and the outer surface may not be significant.
  • the curved pattern marker 100b of the present exemplary embodiment may be significantly different from the curved pattern marker 100a of FIG. 3 in the structure of the second lens unit 120b.
  • the second lens unit 120b may have a structure in which two lenses are combined.
  • the second lens part 120b may have a negative (or concave) in which the fourth lens 122b of the positive (or convex) meniscus lens structure disposed toward the first lens part 110b and the pattern part 130b are bonded to each other.
  • a curved lens 124b having a meniscus lens structure may be included.
  • the second lens unit 120b since the second lens unit 120b includes two lenses, light may be focused on the pattern unit 130b more precisely.
  • the second lens unit 120b of the curved pattern marker 100b of the present embodiment will be described in more detail.
  • the fourth lens 122b includes the incident surface 122in, the exit surface 122out, and the third plane 122p3. It may be provided.
  • the incident surface 122in may be a surface into which light emitted from the first lens unit 110b is input, includes a target range, and may have a slightly convex shape in a first direction (x direction) through which the light travels.
  • the exit surface 122out may have a hemispherical shape convex in the direction in which light travels, and may have a greater curvature than the entrance surface 122in.
  • the second lens unit 120b may have a positive meniscus lens structure.
  • the third plane 122p3 may connect the incident surface 122in and the exit surface 122out, and may be parallel to the incident surface of the first lens 122b. Meanwhile, a side surface may exist between the exit surface 122out and the third plane 122p3, so that the entrance surface 122in and the exit surface 122out may be connected to the third plane 122p3 through the side surface.
  • the curved lens 124b may include an incident surface 124in, an exit surface 124out, a fourth plane 124p4, and a third side surface 124si.
  • the incident surface 124in may have a substantially same shape, and may be coupled to the exit surface 122out of the fourth lens 122b. Accordingly, the incident surface 124in may have a curvature substantially the same as the emission surface 122out of the fourth lens 122b.
  • the light may be incident to the emission surface 124out through the incident surface 124in and may be incident to focus on the pattern portion 130b bonded to the emission surface 124out.
  • the fourth plane 124p4 may extend from the incident surface 124in and be parallel to the third plane 122b of the fourth lens 122b.
  • the fourth plane 124p4 may be coplanar with the third plane 122b of the fourth lens 122b or may have a slightly stepped level as shown.
  • the side surface 124si may connect the fourth plane 124p4 and the emission surface 124out.
  • the pattern unit 130b may include a curved pattern, and may be attached to the exit surface 124out of the curved lens 124b with the second curvature C2.
  • the second curvature C2 may also mean the curvature of the circle or the curvature of the ellipse. Since the pattern portion 130b is bonded to the exit surface 124out of the curved lens 124b, the curvature of the exit surface 124out of the curved lens 124b is also substantially the same as the curvature of the pattern portion 130b. C2).
  • the structure of the first lens unit 110b may have a structure similar to that of the first lens unit 110a of the curved pattern marker 100a of FIG. 3.
  • the first lens unit 110b includes a first lens 112b, a second lens 114b, and a third lens 116b, and includes the first lens 112b, the second lens 114b, and the third lens.
  • Each of the lenses 116b may have a structure similar to that of the first lens 112a, the second lens 114a, and the third lens 116a of the curved pattern marker 100a of FIG. 3.
  • the structure of each of the first lens 112b, the second lens 114b, and the third lens 116b is shown in FIG.
  • the first lens 112a, the second lens 114a, and the third lens 116a of the curved pattern marker 100a may be slightly different.
  • the emission surface of the second lens 114b and the incident surface of the third lens 116b may be combined with a greater curvature than that of the curved pattern marker 100a of FIG. 3.
  • the curvature or size of the pattern portion can be adjusted. Accordingly, a curved pattern marker having pattern portions of various curvatures and sizes may be implemented by changing the structure of the lenses in the lens portion.
  • the lenses in the lens unit may contribute to the adjustment of the curvature or size of the pattern unit not only through the structure change but also through the adjustment of the refractive index.
  • a plurality of lenses form a group in the curved pattern markers of various embodiments, including the curved pattern marker 100b of the present embodiment.
  • the advantages and roles thereof are as follows.
  • the design of the optical system may be simplified.
  • the lenses have respective aberrations, which can be determined by summing the aberrations of the lenses.
  • the aberration of the first lens unit 110b may be determined by the sum of the aberrations of the first lens 112b, the second lens 114b, and the third lens 116b.
  • 110b may determine a focal plane or make an entire optical path, and the second lens unit 120b may serve to compensate for distortion or chromatic aberration of the first lens unit 110b.
  • the second lens such that the sum of the chromatic aberration of the first lens unit 110b and the chromatic aberration of the second lens unit 120b is close to zero.
  • the chromatic aberration of the part 120b may be designed to have a negative value.
  • the spherical pattern marker 100b of the present embodiment bonds the lenses to form the first lens unit 110b and the second lens unit 120b.
  • Each configuration allows positioning of the lenses close to the design value.
  • the optical system is formed using the bonded lenses, not only the yield may be improved, but also the overall design variation of the curved pattern marker including the first and second lens units 110b and 120b may be minimized.
  • the spherical pattern marker 100c of the present exemplary embodiment may be different from the embodiment of FIG. 3 in that the pattern portion 130c is disposed to be spaced apart from the second lens portion 120c.
  • the basic configuration of the first lens unit 110c and the second lens unit 120c may be substantially the same as the first lens unit 110a and the second lens unit 120a of FIG. 3, respectively.
  • the focal position of the second lens portion 120c is the pattern portion 130c, not the exit surface 124out of the curved lens 124c. Accordingly, the structure and refractive index of the second lens unit 120c, that is, the curved lens 124c may be different from those of the embodiment of FIG. 3.
  • the pattern portion 130c may be attached to the inner surface of the support member 135 as shown.
  • the support member 135 may be disposed inside the housing designed to be spaced apart from the second lens unit 120c at a predetermined interval.
  • the pattern portion 130c may be disposed without a separate support member.
  • the pattern portion 130c may be adhesively disposed on the inner surface of the holder without a separate supporting member.
  • the structure in which the pattern portion is spaced apart from the second lens portion may be equally applicable to the embodiment of FIG. 4 or the following other embodiments.
  • the structure of the lens unit and the second lens unit is not limited thereto.
  • the first lens unit may be configured as one, or may have a structure in which two lenses are combined.
  • the first lens unit may have a structure in which four or more lenses are combined.
  • the second lens unit may also have a structure in which three or more lenses are combined.
  • the structure of each of the lenses constituting the first lens unit and the structure of each of the lenses constituting the second lens unit may be variously changed according to the curvature and size of the pattern unit.
  • the refractive index of each of the lenses of the first lens unit and the refractive index of each of the lenses of the second lens unit may also be variously changed.
  • FIG. 6 is a conceptual diagram of a structure of a curved surface pattern marker according to an embodiment of the present invention. Descriptions already described in the description of FIGS. 2 to 5 are simply described or omitted.
  • the curved pattern marker 200 of the present exemplary embodiment may further be different from the curved pattern marker 100 of FIG. 2 in that the curved pattern marker 200 further includes a third lens unit 240. That is, the curved pattern marker 200 of the present exemplary embodiment may include a first lens unit 210, a second lens unit 220, a pattern unit 230, and a third lens unit 240.
  • the third lens unit 240 may be disposed in front of the aperture Ap and include at least one lens.
  • the third lens unit 240 may function to collect external light and input the same to the aperture Ap. For example, when light is directly incident on the aperture Ap, the angle of view may be small and sufficient light may not be incident. Also, the range of parallel light of the curved pattern emitted through the reflection can be limited, and accordingly, the spatial arrangement range of the imaging unit for detecting parallel light of the curved pattern can also be limited. However, by collecting light using a wide-angle lens or the like and making it enter the diaphragm Ap, the amount of light can be increased and the spatial arrangement range of the imaging unit can be expanded.
  • the curved pattern marker 200 of the present embodiment includes a third lens unit 240 disposed in front of the aperture Ap, thereby increasing the amount of light incident on the aperture Ap, and further increasing the amount of light entering the imaging unit of the optical tracking device.
  • the spatial arrangement can also be extended.
  • FIGS. 7A and 7B are cross-sectional views illustrating various structures of the curved pattern marker of FIG. 6 in detail. Descriptions already described in the description of FIGS. 2 to 6 are simply described or omitted.
  • the curved pattern marker 200a of the present exemplary embodiment may include a first lens unit 210a, a second lens unit 220a, a pattern unit 230a, and a third lens unit 240a.
  • the first lens unit 210a, the second lens unit 220a, and the pattern unit 230a may include the first lens unit 110a, the second lens unit 120a, and the curved pattern marker 100a of FIG. 3. Similar to the pattern portion 130a, but in a specific structure may be slightly different.
  • the first lens unit 210a may include two lenses, that is, the first lens 212a and the second lens 214a.
  • the first lens 212a may have a hemispherical shape.
  • An aperture may be defined adjacent to the incident surface of the first lens 212a.
  • the second lens 214a has a cylindrical side surface, but the exit surface is convex in the first direction (x direction) through which light travels, and the incident surface corresponds to the exit surface of the first lens 212a. It may have a form.
  • the second lens 214a may have a negative meniscus lens structure.
  • the first lens unit 210a may be configured by combining the incident surface of the second lens 214a with the emission surface of the first lens 212a.
  • the first lens unit 110a includes three lenses, but in the curved pattern marker 200a of the present embodiment, the first lens unit 210a includes only two lenses. can do.
  • the structure of the first lens unit 210a is not limited thereto.
  • the first lens unit 210a may have a structure in which three lenses are combined.
  • the second lens unit 220a may be composed of one curved lens 224a.
  • the light from the first lens unit 210a may be incident to the incident surface of the curved lens 224a and may be incident to focus on the pattern unit 230a through the exit surface.
  • the pattern unit 230a may include a curved pattern and may have a fourth curvature C4.
  • the fourth curvature C4 may also mean the curvature of the circle or the curvature of the ellipse.
  • the pattern part 230a may be attached to the exit surface of the curved lens 224a.
  • the pattern portion 230a may be different in curvature and size of the pattern portion 130a of the curved pattern marker 100a of FIG. 3.
  • the curvature of the pattern portion 230a may be greater than the curvature of the pattern portion 130a of the curved pattern marker 100a of FIG. 3.
  • the size of the pattern portion 230a may be smaller than the size of the pattern portion 130a of the curved pattern marker 100a of FIG. 3.
  • the curvature and the size of the pattern portion 230a are not limited to the above description.
  • the pattern portion 230a may be formed to have substantially the same curvature and size as the pattern portion 130a of the curved pattern marker 100a of FIG. 3.
  • the structure of the second lens unit 220a may be slightly different from that of the second lens unit 120a of the curved pattern marker 100a of FIG. 3.
  • the curvature of the exit surface of the curved lens 224a may be greater than the curvature of the curved lens 124a of the curved pattern marker 100a of FIG. 3 based on the curvature difference between the pattern portions 130a and 230a.
  • the curved lens 124a of the curved pattern marker 100a of FIG. 3 has a uniform thickness as a whole
  • the curved lens 224a of the curved pattern marker 200a of the present embodiment is gradually moved toward the outer portion. It may have a thinning structure.
  • the curved lens 224a may have a positive meniscus lens structure.
  • the structure of the second lens unit 220a is not limited to the above description.
  • the second lens unit 220a may have a structure substantially the same as that of the second lens unit 120a of the curved pattern marker 100a of FIG. 3.
  • the second lens unit 220a may have a structure in which not only one curved lens but also two or more lenses are combined, such as the curved pattern markers 100b and 100c of FIG. 4 or 5.
  • the third lens unit 240a is disposed to be spaced apart from the first lens unit 210a in a second direction (-x direction) opposite to the first direction (x direction), and two lenses, that is, the fifth lens ( 242a and a sixth lens 244a.
  • the present invention is not limited thereto, and the third lens unit 240a may be implemented as one lens.
  • the third lens unit 240a may be designed to condense light passing through the third lens unit 240a at an aperture Ap opposite to the exit surface of the sixth lens 244a.
  • the fifth lens 242a may have a hemispherical shape as a whole.
  • the incident surface of the fifth lens 242a may have a convex hemispherical shape in the second direction ( ⁇ x direction), and the emission surface of the fifth lens 242a may have a planar shape.
  • the sixth lens 244a may have a cylindrical structure.
  • the incident surface of the sixth lens 244a may have a planar shape, and the emission surface may have a shape that is slightly convex in the first direction (x direction) but is nearly planar.
  • the sixth lens 244a may have a positive meniscus lens structure.
  • the third lens unit 240a is a lens in which an incident surface of the sixth lens 244a is coupled to an exit surface of the fifth lens 242a.
  • a cylindrical plano-convex Or a cylindrical double convex lens.
  • the third lens unit 240a may collect light and incident the light into the aperture Ap.
  • the aperture Ap is defined between the third lens unit 240a and the first lens unit 210a or on the incident surface of the first lens 212a of the first lens unit 210a, and the light is Through the third lens unit 240a, the apertures may be gathered into the aperture Ap to be incident to the first lens unit 210a.
  • the curved pattern marker 200b of the present exemplary embodiment may further be different from the curved pattern marker 200a of FIG. 7A in that the curved pattern marker 200b further includes a fourth lens unit 250.
  • the curved pattern marker 200b of the present exemplary embodiment may further include a fourth lens unit 250 disposed in front of the third lens unit 240a in the second direction (-x direction).
  • the fourth lens unit 250 may include one seventh lens 250a, and may include an entrance surface 250in, an emission surface 250out, a fifth plane 250p5, and a fourth side surface 250si.
  • the incident surface 250in of the seventh lens 250a has a slightly convex shape in the second direction (-x direction), and the exit surface 250out has a curvature substantially the same as the incident surface of the fifth lens 242a. It may have a hemispherical groove shape.
  • the seventh lens 250a may have a negative meniscus lens structure.
  • the fifth plane 250p5 may extend from the exit plane 250out and be parallel to the entrance plane of the sixth lens 244a.
  • the fourth side surface 250si may connect the incident surface 250in and the fifth plane 250p5.
  • an angle of view of the curved pattern marker 200b may be maximized like a fisheye lens, and thus, a wider range of light may be collected and incident on the aperture Ap.
  • the spatial arrangement range of the imaging unit for detecting parallel light of the curved surface pattern can be further expanded.
  • the structure in which the third lens unit 240a or the third lens unit 240a and the fourth lens unit 250 are disposed in front of the aperture is illustrated.
  • the structure of the curved surface pattern marker of the present embodiment is not limited thereto.
  • the structure of all the lens units disposed at the front end of the iris to collect light and enter the iris part can be applied to the curved pattern marker of the present embodiment.
  • FIGS. 8 is a conceptual diagram of a structure of a curved surface pattern marker according to an embodiment of the present invention. Descriptions already described in the description of FIGS. 2 to 7B will be briefly described or omitted.
  • the curved pattern marker 300 of the present exemplary embodiment may include a first lens unit 310 and a pattern unit 330.
  • the curved pattern marker 300 of the present exemplary embodiment may correspond to a structure in which the second lens unit 120 is omitted from the curved pattern marker 100 of FIG. 2. Accordingly, the light incident through the first lens unit 310 may be focused on the curved pattern of the pattern unit 330.
  • the structure of the first lens unit 310 may include at least one lens as described above in other embodiments. However, unlike the other embodiments, since the light emitted from the first lens unit 310 is not incident to the second lens unit, the light is incident to focus on the curved pattern of the pattern unit 330.
  • the structure, refractive index, etc. of the lenses constituting 310 may be adjusted differently from those of the first lens unit of other embodiments.
  • each lens includes at least one lens unit having a different number of lenses and a coupling structure of the lenses, and by using the at least one lens unit, incident light passing in parallel with the optical axis and passing through the aperture is incident on the incident surface of the one lens unit.
  • the structure of all curved pattern markers that can be incident vertically, transmit such incident light to focus on the curved pattern of the pattern portion, and can emit incident light in the form of parallel light in the curved pattern belongs to the technical idea of the present invention. something to do.
  • FIG. 9 is a conceptual diagram of a structure of a curved surface pattern marker according to an embodiment of the present invention. Descriptions already described in the description of FIGS. 2 to 7B will be briefly described or omitted.
  • the curved pattern marker 400 of the present exemplary embodiment may include a first lens unit 410, a second lens unit 420, and a pattern unit 430.
  • the curved surface pattern marker 400 of the present exemplary embodiment may correspond to the curved surface pattern marker 100 of FIG. 2 in a configuration surface and the curved surface pattern marker 200 of FIG. 6 in a functional surface.
  • the curved pattern marker 400 of the present exemplary embodiment may include two lens parts 410 and 420 similar to the curved pattern marker 100 of FIG. 2.
  • the aperture Ap may be disposed in front of the incident surface of the first lens unit 410 to limit a cross-sectional area where light is incident on the incident surface of the first lens unit 410.
  • the first lens unit 410 may enter the light incident through the aperture Ap to focus on the pattern unit 430.
  • the light incident through the aperture Ap may be incident within the target range of the first lens unit 410.
  • the light incident through the aperture Ap may be incident on all incident surfaces of the first lens of the first lens unit 410.
  • the lens unit for emitting the light incident to the aperture part within the target range may be omitted.
  • the first lens unit 410 may be formed in a structure in which all of the light incident to the aperture Ap may be emitted within the target range.
  • the second lens unit 420 may be disposed at a front end of the aperture Ap, and thus may function to concentrate light incident at a wide angle of view on the aperture Ap.
  • 10A and 10B are cross-sectional views illustrating an arrangement structure of a pattern portion in curved pattern markers according to example embodiments.
  • the pattern unit 130 may include a curved pattern Psph on an inner surface thereof.
  • the pattern unit 130 may be bonded to the exit surface 124out of the curved lens 124 disposed at the outermost portion. Accordingly, light incident on the curved lens 124 may be incident to focus on the curved pattern Psph of the pattern unit 130 directly through the emission surface 124out.
  • the pattern portion 130 including the curved pattern Psph is bonded to the exit surface of the curved lens 124 disposed at the outermost portion, whereby the curved pattern marker of the present embodiment is a separate physical material for disposing the curved pattern.
  • the device may be unnecessary.
  • the curved pattern of the pattern unit 130 is emitted as parallel light through the reflection, the curved pattern marker of the present exemplary embodiment may not require a separate light source for emitting the curved pattern to the outside. Therefore, the curved pattern marker of the present embodiment can contribute to simplifying and minimizing the marker structure.
  • the outermost curved lens 124 may be accommodated in the holder 150 and fixed.
  • the lenses of the lens unit of the curved pattern marker may be accommodated in the holder 150 to be supported and fixed by the holder 150.
  • the inside of the holder 150 may be formed in a structure that accommodates and supports the lenses of the lens unit but does not interfere with the progress of light.
  • the inner surface 150in of the inner surfaces of the holder 150 that faces the exit surface 124out of the curved lens 124 has a curved shape, but is emitted from the curved lens 124.
  • the light may be placed at a focal plane location that causes focus to occur.
  • the pattern portion 130 ′ may be attached to the inner surface 150 in of the holder 150 having the above-described structure.
  • the pattern part 130 ′ may be spaced apart from the exit surface 124out of the curved lens 124 with a first distance D.
  • the first interval D can be very fine, up to several mm. Of course, the first interval is not limited to the above numerical value.
  • the pattern portion 130 is attached to the exit surface 124out of the curved lens 124, and the pattern portion 130 covers the inner surface 150in of the holder 150 in close contact.
  • the first interval D may be substantially close to zero.
  • the pattern unit 130 may be attached to the inner surface 150in of the holder 150, and the holder 150 may cover the curved lens 124 in close contact.
  • the exit surface 124out of the curved lens 124 and the inner surface 150in of the holder 150 may share the same center of curvature, and
  • the pattern portion 130 ′ may also share the same center of curvature as the emission surface 124out of the curved lens 124. Therefore, the light incident from the exit surface 124out of the curved lens 124 may be focused on the pattern portion 130 ′.
  • the holder 150 may be integrally formed or separately.
  • a pattern replaceable curved pattern marker may be implemented. Similar to the arrangement structure of the pattern portion 130 in the curved pattern marker of FIG. 10A, in the curved pattern marker of the present embodiment, the arrangement structure of the pattern portion 130 ′ also does not require a separate physical device for the arrangement of the curved pattern. Can be. Accordingly, the curved pattern marker of the present embodiment may also contribute to simplifying and minimizing the marker structure.
  • the illustrated curved lens 124 may correspond to, for example, the curved lens 124a of the curved pattern marker 100a of FIG. 3. have.
  • the structure of the curved lens 124 is not limited to the structure of the curved lens 124a of the curved pattern marker 100a of FIG. 3.
  • the curved lens 124 of the curved pattern markers 100b, 100c, 200a, and 200b of FIGS. 4, 5, 7a, and 7b may be formed of the outermost curved lenses 124b, 124c, and 224a. It may have a structure.
  • 11A to 11C are cross-sectional views illustrating the pattern portion in more detail in the curved pattern marker according to the embodiment of the present invention.
  • the pattern unit 130 may include an adhesive layer 132, a pattern layer 134, and a reflective layer 136.
  • the adhesive layer 132 has a very thin thickness, and the pattern layer 134 may be adhered to the exit surface of the outermost curved lens (see 124a, etc. of FIG. 3).
  • the adhesive layer 132 may be formed of a transparent material through which light can pass.
  • the pattern layer 134 may include a curved pattern Psph.
  • the curved pattern Psph may be formed of an opaque material.
  • the material constituting the pattern layer 134 other than the curved pattern Psph may be formed of a transparent material through which light can pass.
  • the curved pattern may be a concept including both an opaque portion and a transparent portion.
  • the opaque parts will be described with a curved surface pattern (Psph).
  • the same concept may be applied to the pattern portions 130 ′ and 130 ′′ of FIGS. 11B and 11C.
  • the reflective layer 136 may be thinly formed on the outer surface of the pattern layer 134.
  • the reflective layer 136 may be formed of a material having high reflectance capable of reflecting light.
  • the reflective layer 136 may be formed of a metal such as aluminum, gold, or silver.
  • the material of the reflective layer 136 is not limited to metal.
  • the pattern layer 134 may be formed of a reflective material, and the reflective layer 136 may be omitted.
  • the light used in the optical tracking device may be infrared.
  • the transparent and opaque standards for the adhesive layer 132, the pattern layer 134, the curved pattern Psph, and the reflective layer 136 may be infrared rays.
  • the transparent and opaque standards for the adhesive layer 132, the pattern layer 134, the curved pattern Psph, and the reflective layer 136 are not limited to infrared rays.
  • visible light or ultraviolet light may also be transparent and opaque standards.
  • Light incident on the transparent portion of the pattern layer 134 may pass through the pattern layer 134 and be reflected by the reflective layer 136. However, since the light incident on the opaque portion of the pattern layer 134, that is, the curved pattern Psph, is blocked, it is not reflected by the reflective layer 136. Therefore, the curved pattern Psph may be reflected in the reflected light reflected from the pattern unit 130. For example, the light intensity of the portion of the reflected light corresponding to the transparent portion of the pattern layer 134 may be high, and the light intensity of the portion of the reflected light corresponding to the opaque portion, that is, the curved pattern Psph may be low.
  • the pattern part 130 is illustrated in a curved shape, and the pattern part 130 may correspond to a shape bonded to the exit surface of the curved lens or the inner surface of the holder. Therefore, the pattern portion 130 before being adhered to the exit surface of the curved lens or the inner surface of the holder may have a planar shape.
  • the same concept may be applied to the shapes of the pattern portions 130 ′ and 130 ′′ of FIGS. 11B and 11C.
  • the pattern portion 130 ′ also includes the adhesive layer 132a, the pattern layer 134, and the reflective layer 136 similarly to the pattern portion 130 of FIG. 11A. It may include. However, in the curved pattern marker of the present embodiment, unlike the structure of the pattern portion 130 of FIG. 11A, the pattern portion 130 ′ may have a structure in which the adhesive layer 132a is formed as an outer surface of the reflective layer 136. The pattern portion 130 ′, as shown in FIG. 10B, may be included in the curved pattern marker in a structure bonded to the inner surface 150in of the holder 150. On the other hand, since the adhesive layer 132a is formed on the outer surface of the reflective layer 136, the material of the adhesive layer 132a may not be limited to a transparent material.
  • the pattern portion 130 ′′ may further include a protective layer 138, unlike the pattern portion 130 of FIG. 11A.
  • the pattern portion 130 ′′ may further include a protective layer 138 covering an outer surface of the reflective layer 136.
  • the protective layer 138 may protect the reflective layer 136 and the pattern layer 134 disposed therein from external physical and chemical damage. Accordingly, the protective layer 138 may be formed of a material that is chemically resistant and relatively high in hardness.
  • 12A and 12B are a plan view and a side view showing a holder portion of a curved pattern marker according to an embodiment of the present invention.
  • the holder 150 may include a body portion 152 and an inlet portion 154.
  • the outer shape of the body portion 152 may have a substantially cylindrical shape.
  • the cross-sectional area of the body portion 152 decreases toward the rear surface S2, so that the area of the rear surface S2 may be smaller than that of the front surface S1.
  • the structure of the holder 150 is not limited thereto.
  • the holder 150 may be formed to have the same area of the front surface S1 and the rear surface S2 as in a general cylindrical shape.
  • the inlet 154 may be disposed at the front surface S1 of the body 152 and may have a cylindrical shape. As shown in FIG. 12A, an opening region corresponding to the aperture Ap is formed in the inlet 154, and the lens of the first lens unit 110 may be exposed through the opening region.
  • a space having a structure for accommodating and supporting the lenses of the lens unit of the curved pattern marker may be provided inside the holder 150.
  • the first lens unit 110b and the second lens unit 120b of the curved pattern marker 100b of FIG. 4 may be accommodated and supported in the holder 150.
  • the first lens unit 110b may be disposed on the inlet portion 154 and the second lens unit 120b may be disposed on the rear surface S2 of the body portion 152.
  • the pattern portion is bonded to the exit surface of the curved lens 124b of the second lens portion 120b, or adhered to the inner surface of the holder 150 facing the exit surface of the curved lens 124b. Can be arranged.
  • the curved surface pattern marker 100b of FIG. 4 may also include a holder 150.
  • the internal structure of the holder is not limited to the structure for receiving the lens portions of FIG. 4.
  • the internal structure of the holder may have a structure capable of receiving and supporting the lens units of FIGS. 3, 5, 7A, and 7B.
  • the internal structure of the holder is not limited to the lens parts of FIGS. 3, 5, 7A, and 7B, and may have a structure capable of accommodating lens parts of other structures that may be included in the curved pattern marker.
  • the outer shape of the holder is not limited to the structure of Figures 12a and 12b can be formed in various forms.
  • FIG. 13 is a block diagram of an optical tracking device including a curved pattern marker according to an embodiment of the present invention. Descriptions already described in the description of FIGS. 2 to 12B will be briefly described or omitted.
  • the optical tracking device 1000 of the present exemplary embodiment may include a curved pattern marker 100, an imaging unit 500, and a processor 600.
  • the curved pattern marker 100 may emit the curved pattern of the pattern unit 130 in the form of parallel light by reflecting light using the first lens unit 110 and the second lens unit 120.
  • the curved pattern marker 100 may be the curved pattern marker 100b of FIG. 4.
  • the structure of the curved surface pattern marker 100 is not limited to the structure of the curved surface pattern marker 100b of FIG. 4.
  • the curved pattern markers 100a, 100c, 200a, and 200c of FIGS. 3, 5, 7a, and 7c may be applied to the optical tracking device 1000 of the present embodiment.
  • the structure of all the curved pattern markers having at least two lens units to focus incident light on the curved pattern of the pattern part may be applied to the optical tracking device 1000 of the present embodiment.
  • the imaging unit 500 may receive the parallel light with respect to the curved pattern emitted from the curved pattern marker 100 to form the curved pattern as an enlarged pattern image.
  • the imaging unit 500 may include a lens unit 510 and a sensor unit 520.
  • the lens unit 510 may receive and enlarge parallel light of a curved pattern.
  • the sensor unit 520 may form a curved image enlarged through the lens unit 510 as a pattern image.
  • the imaging unit 500 may be a camera.
  • the processor 600 may calculate a spatial position and a direction of the curved pattern marker 100 using the pattern image of the curved pattern formed in the imaging unit 500.
  • the details are exemplarily described in the unpublished application invention KR 10-2016-0101377 which is incorporated in the present invention.
  • the curved pattern marker 100 and the imaging unit 500 are provided one by one, but the number of the curved pattern marker 100 and the imaging unit 500 is limited to one. It doesn't happen.
  • the curved pattern marker 100 and the imaging unit 500 may be provided in plurality. Accordingly, the calculation of the spatial position and the direction of the target object can be calculated more precisely. For example, when increasing the number of the curved surface pattern marker 100 and the imaging unit 500, the spatial position and the direction of the target object can be more precisely calculated through a complex calculation.

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Lenses (AREA)

Abstract

L'invention concerne, selon un concept technique, un marqueur de motif incurvé apte à améliorer la précision de détection de position et de réduire la taille; et un dispositif de suivi optique comprenant le marqueur. Le marqueur comprend : une première unité de lentille, qui présente au moins une lentille ayant une surface incidente, émettant des lumières incidentes dans une plage cible, et étant formée de sorte qu'une lumière parallèle à un axe optique parmi les lumières incidentes soit incidente verticalement sur la surface incidente; une unité de motif ayant un motif incurvé formé dans cette dernière; et une seconde unité de lentille agencée entre la première unité de lentille et l'unité de motif, et régulant la lumière émise par la première unité de lentille de sorte que la lumière soit focalisée sur le motif incurvé.
PCT/KR2017/002655 2016-03-22 2017-03-13 Marqueur de motif incurvé et dispositif de suivi optique comprenant un marqueur Ceased WO2017164552A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP17770523.3A EP3434461B1 (fr) 2016-03-22 2017-03-13 Marqueur de motif incurvé et dispositif de suivi optique comprenant un marqueur
JP2018549948A JP6684361B2 (ja) 2016-03-22 2017-03-13 曲面パターンマーカー、及びそのマーカーを含む光学追跡装置
US16/087,253 US10859789B2 (en) 2016-03-22 2017-03-13 Curved pattern marker and optical tracking device including marker
CN201780019244.6A CN109153200B (zh) 2016-03-22 2017-03-13 曲面图案标记及包括该标记的光学跟踪装置

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2016-0034121 2016-03-22
KR1020160034121A KR20160039588A (ko) 2016-03-22 2016-03-22 일정 곡률을 가지는 광학 렌즈상에 마이크로 패턴을 형성하는 방법
KR1020170017645A KR101906453B1 (ko) 2016-03-22 2017-02-08 곡면 패턴 마커, 및 그 마커를 포함한 광학 추적 장치
KR10-2017-0017645 2017-02-08

Publications (1)

Publication Number Publication Date
WO2017164552A1 true WO2017164552A1 (fr) 2017-09-28

Family

ID=59899559

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2017/002655 Ceased WO2017164552A1 (fr) 2016-03-22 2017-03-13 Marqueur de motif incurvé et dispositif de suivi optique comprenant un marqueur

Country Status (1)

Country Link
WO (1) WO2017164552A1 (fr)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070183041A1 (en) * 2006-02-09 2007-08-09 Northern Digital Inc. Retroreflective marker-tracking systems
JP2008026731A (ja) * 2006-07-24 2008-02-07 Olympus Corp マーカー装置
KR100843453B1 (ko) * 2006-12-29 2008-07-03 삼성전기주식회사 움직임 센싱용 광학계
KR20100029577A (ko) * 2008-09-08 2010-03-17 연세대학교 산학협력단 기능성 나노패턴을 갖는 렌즈와 그 제조방법
KR101487248B1 (ko) * 2013-05-28 2015-01-29 주식회사 고영테크놀러지 옵티컬 트랙킹 시스템

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070183041A1 (en) * 2006-02-09 2007-08-09 Northern Digital Inc. Retroreflective marker-tracking systems
JP2008026731A (ja) * 2006-07-24 2008-02-07 Olympus Corp マーカー装置
KR100843453B1 (ko) * 2006-12-29 2008-07-03 삼성전기주식회사 움직임 센싱용 광학계
KR20100029577A (ko) * 2008-09-08 2010-03-17 연세대학교 산학협력단 기능성 나노패턴을 갖는 렌즈와 그 제조방법
KR101487248B1 (ko) * 2013-05-28 2015-01-29 주식회사 고영테크놀러지 옵티컬 트랙킹 시스템

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP3434461A4 *

Similar Documents

Publication Publication Date Title
JP2022539553A (ja) 低視差パノラマカメラシステムのためのレンズ設計
KR20190013888A (ko) 이미지 픽셀, 이미지 획득 장치, 지문 획득 장치 및 디스플레이 장치
US8692995B2 (en) Optical system for projecting an IR or UV test signal with optical alignment of the projection axis in the visible spectral region
JPH11271618A5 (ja) 結像光学系及びそれを用いた撮影装置、カメラ装置、観察装置、内視鏡装置
US6537208B1 (en) Optical imaging system with movable solid-state imaging device for focus control
WO2016105074A1 (fr) Système optique de lentilles
JPS6185921A (ja) 眼底観察撮影装置
WO2019107959A1 (fr) Procédé de fabrication d'un dispositif optique
JP2893768B2 (ja) 焦点検出装置
JP2024504839A (ja) アフォーカル光学系の変調伝達関数を測定するための測定装置及び方法
JP2001100100A5 (fr)
WO2017164552A1 (fr) Marqueur de motif incurvé et dispositif de suivi optique comprenant un marqueur
WO2021002728A1 (fr) Module appareil photo utilisant un petit réflecteur, et dispositif optique pour réalité augmentée l'utilisant
WO2018093102A1 (fr) Dispositif de photographie binoculaire utilisant une seule caméra
US4098549A (en) Eye bottom camera
JP6684361B2 (ja) 曲面パターンマーカー、及びそのマーカーを含む光学追跡装置
WO2020166785A1 (fr) Dispositif optique de réalité augmentée pouvant fournir une image de réalité augmentée à courte portée
EP1770435A4 (fr) Appareil d'imagerie
WO2023054793A1 (fr) Dispositif de réalité augmentée utilisant une lentille d'hologramme et appareil de fabrication
WO2021066335A1 (fr) Visiocasque
RU2318438C1 (ru) Устройство для получения изображения радужной оболочки глаза
CN111711803B (zh) 多目标全景搜索跟踪识别系统
WO2018190565A1 (fr) Adaptateur et dispositif de suivi optique comprenant ledit adaptateur
WO2023146085A1 (fr) Appareil d'inspection optique
JPH0378715A (ja) 測距用の光学系

Legal Events

Date Code Title Description
ENP Entry into the national phase

Ref document number: 2018549948

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2017770523

Country of ref document: EP

ENP Entry into the national phase

Ref document number: 2017770523

Country of ref document: EP

Effective date: 20181022

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17770523

Country of ref document: EP

Kind code of ref document: A1