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WO2017057669A1 - Procédé de nettoyage, procédé d'utilisation de dispositif de nettoyage, et dispositif de nettoyage - Google Patents

Procédé de nettoyage, procédé d'utilisation de dispositif de nettoyage, et dispositif de nettoyage Download PDF

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Publication number
WO2017057669A1
WO2017057669A1 PCT/JP2016/079002 JP2016079002W WO2017057669A1 WO 2017057669 A1 WO2017057669 A1 WO 2017057669A1 JP 2016079002 W JP2016079002 W JP 2016079002W WO 2017057669 A1 WO2017057669 A1 WO 2017057669A1
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WIPO (PCT)
Prior art keywords
cleaning
tank
solvent composition
article
oil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2016/079002
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English (en)
Japanese (ja)
Inventor
允彦 中村
宏明 光岡
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AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP2017543610A priority Critical patent/JP7045854B2/ja
Publication of WO2017057669A1 publication Critical patent/WO2017057669A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons

Definitions

  • the present invention relates to a cleaning method, a method of using the cleaning device, and a cleaning device.
  • Chlorofluorocarbons such as 1,1,2-trichloro-1,2,2-trifluoroethane, 2,2-dichloro-1,1,1-trifluoroethane, 1-dichloro-1-fluoroethane, 1,1-dichloro-2,2,3,3,3-pentafluoropropane (hereinafter referred to as “HCFC-225ca”), 1,3-dichloro-1,1,2, , 2,3-pentafluoropropane (hereinafter referred to as “HCFC-225cb”) and other hydrochlorofluorocarbons (hereinafter referred to as “HCFC”), etc. It had been.
  • CFC Chlorofluorocarbons
  • CFC and HCFC are chemically extremely stable, they have a long lifetime in the troposphere after vaporization and diffuse to reach the stratosphere. Therefore, there is a problem that the CFC or HCFC that has reached the stratosphere is decomposed by ultraviolet rays, and chlorine radicals are generated to destroy the ozone layer.
  • perfluorocarbon hereinafter referred to as “PFC”
  • PFC perfluorocarbon
  • HFC hydrofluorocarbon
  • HFE hydrofluoroether
  • CFC and HCFC have a problem that the global warming potential is large.
  • Patent Document 1 discloses a cleaning agent containing 1233zd (Z). Since 1233zd (Z) is easily decomposed, it has an excellent property that its lifetime in the atmosphere is short, the ozone depletion coefficient and the global warming coefficient are small, and the influence on the global environment is small.
  • the inventors have clarified that when 1233zd (Z) is used as a solvent that does not adversely affect the global environment, dirt may not be sufficiently washed. Further, the inventors have clarified that 1233zd (Z) is inferior in stability because it is easily decomposed. However, even when a stabilizer is used, there is a possibility that the stain is not sufficiently washed.
  • the present invention provides a method for cleaning an article, a method for using a cleaning device, and a cleaning device that can sufficiently clean dirt when a solvent composition containing 1233zd (Z) as a solvent, particularly a solvent composition containing a stabilizer, is used. With the goal.
  • the present inventors diligently studied to solve the above-described problems, and as a result, the article is immersed in a solvent composition containing 1233zd (Z) and exposed to vapor generated from the solvent composition containing 1233zd (Z).
  • a cleaning apparatus having a cleaning tank and a steam generation tank, it was found that the cleaning of a solvent composition article containing 1233zd (Z) as a solvent can be sufficiently cleaned, and the present invention has been completed.
  • the present invention provides a cleaning method, a method of using the cleaning device, and a cleaning device having the following configuration.
  • the immersion step is a step of immersing an article in the solvent composition accommodated in a cleaning tank, and the vapor contact step is performed on the vapor generated from the solvent composition accommodated in the steam generation tank.
  • the method for cleaning an article according to [1] which is a step of exposing the article.
  • the processing oil is at least one selected from the group consisting of cutting oil, quenching oil, rolling oil, lubricating oil, machine oil, pressing oil, punching oil, drawing oil, assembly oil, and drawing oil. [6] The method for cleaning an article according to [6].
  • a solvent composition containing (Z) -1-chloro-3,3,3-trifluoro-1-propene is used as the first cleaning liquid and the second cleaning liquid.
  • the processing oil is at least one selected from the group consisting of cutting oil, quenching oil, rolling oil, lubricating oil, machine oil, pressing oil, punching oil, drawing oil, assembly oil, and drawing oil.
  • goods which can fully wash
  • cleaning equipment can be provided.
  • the cleaning method of the present invention includes a dipping step of immersing an article in a solvent composition containing 1233zd (Z), generating 1233zd (Z) vapor from the solvent composition, and exposing the article to the generated vapor. And a vapor contact step.
  • the dipping step and the vapor contact step are preferably performed in that order.
  • the dipping step is preferably a step of immersing an article in the solvent composition housed in the washing tank, and the vapor contact step is generated from the solvent composition housed in the steam generation tank.
  • the step of exposing the article to steam is preferred.
  • the cleaning method of the present invention is a method for cleaning deposits adhering to an article to be cleaned (hereinafter referred to as “object to be cleaned”).
  • object to be cleaned For example, a cleaning tank containing a solvent composition containing 1233zd (Z) and It can carry out using the washing
  • cleaning apparatus of the present invention in the cleaning method of the present invention will be described.
  • the article to be cleaned is immersed in a solvent composition containing 1233zd (Z) in the cleaning tank, and then moved to above the steam generation tank.
  • the article to be cleaned is exposed to the vapor generated from the solvent composition containing 1233zd (Z) contained in the vapor generation tank above the vapor generation tank.
  • the steam generation tank the article to be cleaned is not immersed in the solvent composition containing 1233zd (Z).
  • a rinse tank containing a solvent composition containing 1233zd (Z) is provided between the cleaning tank and the steam generation tank, and the article to be cleaned after being immersed in the cleaning tank is further immersed in the solvent composition.
  • An immersion treatment may be performed.
  • the article to be cleaned is immersed in the solvent composition containing 1233zd (Z) in the cleaning tank, and then passes through the vapor layer on the steam generation tank, and then the solvent containing 1233zd (Z). It is cleaned by exposure to the vapor of the composition.
  • the entire apparatus is filled with the vapor of the solvent composition containing 1233zd (Z) with the position of the cooling pipe as the upper limit.
  • the solvent composition containing 1233zd (Z) is also referred to as a solvent composition L.
  • the process of immersing the article to be cleaned in the solvent composition L is also referred to as immersion cleaning
  • the process of exposing the article to be cleaned to the vapor of the solvent composition L is also referred to as steam cleaning.
  • the solvent composition L In the space above the steam generation tank, since the vapor of the solvent composition L is continuously generated from the steam generation tank, the flow of the vapor of the solvent composition L toward the cleaning tank from the steam generation tank. Seems to have occurred.
  • the solvent composition L is condensed from the state of the vapor one after another on the surface of the article to be cleaned which has received the flow of the vapor and becomes liquid. It is considered that the solvent composition L in a liquid state exhibits a cleaning effect on the surface of the article to be cleaned.
  • the cleaning apparatus having the steam generation tank, and the solvent composition including 1233zd (Z)
  • the article to be cleaned that has been subjected to immersion cleaning in the cleaning tank remains uncleaned. It is considered that the contamination is reduced in the steam generation tank and cleaned to a level that is not problematic in practice.
  • the temperature of the cleaning tank when the article to be cleaned is immersed and cleaned is preferably less than 35 ° C. If it is this range, the evaporation amount of the solvent composition L from a washing tank will be suppressed.
  • the temperature of a washing tank means the temperature of the solvent composition L accommodated in the washing tank.
  • the temperature of the steam generation tank and the temperature of the rinse tank described later mean the temperatures of the solvent composition L accommodated in the steam generation tank and the rinse tank, respectively.
  • the temperature of the washing tank is preferably 20 ° C or higher and lower than 35 ° C, more preferably 25 ° C or higher and lower than 34 ° C, and particularly preferably 28 ° C or higher and lower than 33 ° C. If the temperature of the washing tank is too low, the washing efficiency may be lowered. If the temperature of the washing tank is too higher than the above range, the washing efficiency may be lowered. This is because the amount of steam generated from the cleaning tank is relatively increased, the amount of steam generated from the steam generating tank is relatively reduced, and steam is not efficiently supplied in the steam cleaning performed in the steam zone above the steam generating tank. It is thought that.
  • the temperature of the steam generation tank when the article to be cleaned is steam cleaned is 35 ° C. or higher. Within such a range, it is possible to perform cleaning with almost no dirt remaining.
  • the temperature of the steam generation tank is preferably 35 ° C. or higher and lower than 40 ° C., more preferably 36 ° C. or higher and lower than 40 ° C., particularly preferably 37 ° C. or higher and lower than 40 ° C. If the temperature of the steam generation tank is too low, the amount of steam generated from the steam generation tank decreases, and the steam is not efficiently supplied in the steam cleaning performed in the steam zone above the steam generation tank, so that the cleaning efficiency is lowered. If the temperature of the steam generation tank is too high, the amount of generated steam increases, steam loss increases, and the solvent composition L is easily decomposed by heat.
  • the solvent composition L used in the present invention has a low stability and a composition generated by decomposition, and a stabilizer added to suppress decomposition tends to remain, and the efficiency of the steam cleaning performed above the steam generation tank is finally It is important to obtain a high degree of cleaning.
  • the temperature of the cleaning tank when cleaning the article to be cleaned is preferably less than 35 ° C
  • the temperature of the steam generation tank is preferably 35 ° C or more
  • the temperature of the cleaning tank is 34 ° C.
  • the temperature of the steam generation tank is preferably 36 ° C. or higher
  • the temperature of the cleaning tank is preferably 33 ° C. or lower
  • the temperature of the steam generation tank is particularly preferably 37 ° C. or higher.
  • the temperature of the steam generation tank is preferably 5 ° C. or higher, more preferably 7 ° C. or higher, and particularly preferably 8 ° C. or higher. Within such a range, it is possible to perform cleaning with almost no dirt residue.
  • Examples of articles to be cleaned in the cleaning method of the present invention include processed parts such as metals, ceramics, glass, plastics, and elastomers in the precision machine industry, metal processing industry, optical machine industry, electronics industry, plastic industry, and the like.
  • automotive parts such as bumpers, gears, mission parts, radiator parts, printed circuit boards, IC parts, lead frames, motor parts, electronic parts such as capacitors, bearings, gears, engineering plastic gears, watch parts, cameras Parts, precision mechanical parts such as optical lenses, printing machines, printing machine blades, printing rolls, rolled products, construction machines, glass substrates, large mechanical parts such as large heavy machinery parts, daily products such as tableware, textile products, etc. It is done.
  • the deposits to be removed by washing are fluxes and processing oils adhering to the various articles to be cleaned, such as cutting oil, quenching oil, rolling oil, lubricating oil, machine oil, and press working oil. , Punching oil, drawing oil, assembly oil, wire drawing oil, mold release agent, dust and the like. Since the solvent composition L used in the present invention is superior in solubility of the processing oil as compared with conventional solvent compositions such as HFC and HFE, it is preferably used for cleaning the processing oil.
  • the cleaning method of the present invention can be applied to cleaning articles to be cleaned of various materials such as metal, plastic, elastomer, glass, ceramic and composite materials thereof.
  • solvent composition L contains a solvent containing 1233zd (Z) (hereinafter referred to as “solvent (A)”). To do.
  • 1233zd (Z) used in the solvent composition L is a kind of HCFO having a double bond between carbon atoms, has a short life in the atmosphere, and has a small ozone depletion coefficient and global warming coefficient. Moreover, 1233zd (Z) has a boiling point of about 40 ° C. (normal pressure) and is excellent in drying properties. Moreover, even if it is boiled and becomes steam, it is about 40 ° C., so it is difficult to adversely affect parts that are easily affected by heat such as resin parts. In addition, 1233zd (Z) does not have a flash point, has a low surface tension and viscosity, and has excellent performance such as easy evaporation at room temperature.
  • the solvent composition L used in the present invention contains a solvent (A).
  • the solvent (A) may be composed only of 1233zd (Z), within the range that does not impair the above characteristics of 1233zd (Z), increase the solubility of various substances that become solutes, adjust the volatilization rate, etc.
  • a solvent other than 1233zd (Z) hereinafter referred to as “solvent (a1)” may be contained.
  • Solvent (a1) is not particularly limited as long as it is a solvent soluble in 1233zd (Z).
  • the solvent soluble in 1233zd (Z) means that when 1233zd (Z) and the solvent are mixed at an arbitrary mixing ratio, they are not phase-separated or turbid by stirring at room temperature (25 ° C.).
  • the solvent means a substance that is liquid at normal temperature (25 ° C.).
  • the stabilizer (B) in the present invention is excluded.
  • the content ratio of the solvent (A) in the solvent composition L used in the present invention is preferably 80% by mass or more, more preferably 90% by mass or more, and still more preferably 95% by mass or more with respect to the total amount of the solvent composition L. 99 mass% or more is particularly preferable.
  • the ratio of the content of 1233zd (Z) to the total amount of the solvent (A), that is, the ratio of the content of 1233zd (Z) to 100% by mass of the total amount of 1233zd (Z) and the solvent (a1) is 50% by mass or more.
  • 80% by mass or more is more preferable, 90% by mass or more is more preferable, 95% by mass or more is further more preferable, 99% by mass or more is particularly preferable, and 100% by mass is most preferable.
  • the ratio of the content of 1233zd (Z) to the total amount of the solvent (A) is equal to or higher than the lower limit, the excellent drying property of 1233zd (Z) is not inhibited.
  • the upper limit of the content ratio of 1233zd (Z) is 100% by mass.
  • the ratio of the content of the solvent (a1) to the total amount of the solvent (A) is not less than the above lower limit, the effect of the solvent (a1) can be sufficiently obtained. If the ratio of the content of the solvent (a1) to the total amount of the solvent (A) is not more than the above upper limit value, the solvent composition L is excellent in drying properties.
  • the ratio of the content of 1233zd (Z) to the total amount of the solvent composition L is preferably 80% by mass or more, more preferably 90% by mass or more, still more preferably 95% by mass or more, and particularly preferably 99% by mass or more.
  • 1233zd (Z) is, for example, a method described in paragraphs [0011] to [0012] of JP 2012-509324 A; a method described in JP 2015-505302 A; or a method described in International Publication No. 2014/175403
  • the reaction product obtained by the method can be produced by distillation purification.
  • 1,1,3,3-tetrachlorolopropene (HCO-1230za) and / or 1,1,1,3,3-pentachloropropane (HCC-240fa) are used in the presence or absence of a catalyst.
  • a reaction product containing 1233zd (Z) is obtained by, for example, a method of dehydrochlorinating a composition of less than 1%.
  • the obtained reaction product containing 1233zd (Z) can be purified by
  • the solvent (a1) is preferably at least one selected from the group consisting of hydrocarbon, alcohol, ketone, ester, chlorocarbon, HFC and HFE.
  • the hydrocarbon as the solvent (a1) is preferably a hydrocarbon having 5 or more carbon atoms. As long as it is a hydrocarbon having 5 or more carbon atoms, it may be a chain or a ring, and may be a saturated hydrocarbon or an unsaturated hydrocarbon.
  • hydrocarbon examples include n-pentane, 2-methylbutane, n-hexane, 2-methylpentane, 2,2-dimethylbutane, 2,3-dimethylbutane, n-heptane, 2-methylhexane, 3 -Methylhexane, 2,4-dimethylpentane, n-octane, 2-methylheptane, 3-methylheptane, 4-methylheptane, 2,2-dimethylhexane, 2,5-dimethylhexane, 3,3-dimethylhexane 2-methyl-3-ethylpentane, 3-methyl-3-ethylpentane, 2,3,3-trimethylpentane, 2,3,4-trimethylpentane, 2,2,3-trimethylpentane, 2-methylheptane 2,2,4-trimethylpentane, n-nonane, 2,2,5-trimethylhexane, n-decane
  • the alcohol as the solvent (a1) is preferably an alcohol having 1 to 16 carbon atoms. As long as the alcohol has 1 to 16 carbon atoms, it may be a chain or a ring, and may be a saturated alcohol or an unsaturated alcohol.
  • alcohols include methanol, ethanol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, sec-butyl alcohol, isobutyl alcohol, tert-butyl alcohol, 1-pentanol, 2-pentanol, 1- Ethyl-1-propanol, 2-methyl-1-butanol, 3-methyl-1-butanol, 3-methyl-2-butanol, neopentyl alcohol, 1-hexanol, 2-methyl-1-pentanol, 4-methyl -2-pentanol, 2-ethyl-1-butanol, 1-heptanol, 2-heptanol, 3-heptanol, 1-octanol, 2-octanol, 2-ethyl-1-hexanol, 1-nonanol, 3, 5, 5-trimethyl-1-hexanol, 1-de 1-undecanol, 1-dodecanol, allyl alcohol, proparg
  • the ketone as the solvent (a1) is preferably a ketone having 3 to 9 carbon atoms. As long as the ketone has 3 to 9 carbon atoms, it may be linear or cyclic, and may be a saturated ketone or an unsaturated ketone.
  • ketones include acetone, methyl ethyl ketone, 2-pentanone, 3-pentanone, 2-hexanone, methyl isobutyl ketone, 2-heptanone, 3-heptanone, 4-heptanone, diisobutyl ketone, mesityl oxide, holon, 2- Examples include octanone, cyclohexanone, methylcyclohexanone, isophorone, 2,4-pentanedione, 2,5-hexanedione, diacetone alcohol, acetophenone, and the like. Of these, acetone and methyl ethyl ketone are preferable.
  • the ester that is the solvent (a1) is preferably an ester having 2 to 19 carbon atoms. As long as the ester has 2 to 19 carbon atoms, it may be a chain or a ring, and may be a saturated ester or an unsaturated ester.
  • esters include methyl formate, ethyl formate, propyl formate, butyl formate, isobutyl formate, pentyl formate, methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, sec-butyl acetate, pentyl acetate , Methoxybutyl acetate, sec-hexyl acetate, 2-ethylbutyl acetate, 2-ethylhexyl acetate, cyclohexyl acetate, benzyl acetate, methyl propionate, ethyl propionate, butyl propionate, methyl butyrate, ethyl butyrate, butyl butyrate, isobutyl isobutyrate Ethyl 2-hydroxy-2-methylpropionate, methyl benzoate, ethyl benzoate,
  • the chlorocarbon as the solvent (a1) is preferably a chlorocarbon having 1 to 3 carbon atoms.
  • the chlorocarbon having 1 to 3 carbon atoms may be a chain or a ring, and may be a saturated chlorocarbon or an unsaturated chlorocarbon.
  • chlorocarbon examples include methylene chloride, 1,1-dichloroethane, 1,2-dichloroethane, 1,1,2-trichloroethane, 1,1,1,2-tetrachloroethane, 1,1,2,2 -Tetrachloroethane, pentachloroethane, 1,1-dichloroethylene, (Z) -1,2-dichloroethylene, (E) -1,2-dichloroethylene, trichloroethylene, tetrachloroethylene and the like. Of these, methylene chloride, (E) -1,2-dichloroethylene, and trichloroethylene are preferable.
  • the HFC as the solvent (a1) is preferably a linear or cyclic HFC having 4 to 8 carbon atoms, and more preferably a solvent contained in an HFC in which the number of fluorine atoms in one molecule is not less than the number of hydrogen atoms.
  • HFC specifically, 1,1,1,3,3-pentafluorobutane, 1,1,1,2,2,3,4,5,5,5-decafluoropentane, 1,1, 2,2,3,3,4-heptafluorocyclopentane, 1,1,1,2,2,3,3,4,4-nonafluorohexane, 1,1,1,2,2,3,3 4,4,5,5,6,6-tridecafluorohexane, 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorooctane, etc. Can be mentioned.
  • 1,1,1,2,2,3,4,5,5,5-decafluoropentane, 1,1,1,2,2,3,3,4,4-nonafluorohexane, 1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorohexane is preferred.
  • HFE that is the solvent (a1)
  • examples of HFE that is the solvent (a1) include (perfluorobutoxy) methane, (perfluorobutoxy) ethane, 1,1,2,2-tetrafluoro-1- (2,2,2-trifluoroethoxy) ethane, and the like. Is mentioned. Of these, (perfluorobutoxy) methane and 1,1,2,2-tetrafluoro-1- (2,2,2-trifluoroethoxy) ethane are preferable.
  • the solvent (a1) contained in the solvent composition L used in the present invention may be one type or two or more types.
  • Solvent (a1) is preferably a solvent having no flash point.
  • the solvent (a1) having no flash point 1,1,1,2,2,3,4,5,5,5-decafluoropentane, 1,1,1,2,2,3,3, HFC such as 4,4-nonafluorohexane, 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorohexane, (perfluorobutoxy) methane, , 1,2,2-tetrafluoro-1- (2,2,2-trifluoroethoxy) ethane and the like.
  • a solvent having a flash point is used as the solvent (a1), it is preferably used by mixing with 1223zd (Z) as long as the solvent composition L used in the present invention does not have a flash point.
  • E hereinafter also referred to as “1233zd (E)”.
  • 1233zd (E) is a by-product generated together with 1233zd (Z) when the above 1233zd (Z) is produced. High purification is required to remove 1233zd (E) from the reaction product containing 1233zd (Z) and 1233zd (E).
  • the content ratio of 1233zd (E) is preferably 0.1% by mass or less based on the total amount of the solvent (A).
  • the solvent composition L used in the present invention contains, in addition to the solvent (A), at least one stabilizer (B) selected from the group consisting of phenols, ethers, epoxides, pyrroles and nitro compounds. It may be added.
  • the phenol used as the stabilizer (B) refers to an aromatic hydroxy compound having one or more hydroxy groups in the aromatic hydrocarbon nucleus.
  • the phenols compounds having high solubility in the solvent (A) are preferable.
  • a benzene nucleus is preferred as the aromatic hydrocarbon nucleus.
  • the number of hydroxy groups is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1.
  • one or more substituents may be bonded to the carbon atom other than the hydroxy group of the aromatic hydrocarbon nucleus.
  • substituents include a hydrocarbon group, an alkoxy group, an acyl group, and a carbonyl group.
  • One or more hydrogen atoms bonded to the aromatic hydrocarbon nucleus may be substituted with a halogen atom.
  • the hydrocarbon group examples include an alkyl group, an alkenyl group, an aromatic hydrocarbon group, and an aralkyl group.
  • the alkyl group, alkenyl group, alkoxy group, acyl group, and carbonyl group preferably have 1 to 6 carbon atoms, and more preferably 1 to 4 carbon atoms.
  • the aromatic hydrocarbon group preferably has 6 to 10 carbon atoms, and the aralkyl group preferably has 7 to 10 carbon atoms.
  • an alkyl group or an alkenyl group is preferable, and an alkyl group is particularly preferable.
  • the number thereof is preferably 1 to 5, more preferably 1 to 3.
  • the position of the substituent is not particularly limited. It is preferable that at least the ortho position is substituted with respect to the hydroxy group of the aromatic hydrocarbon nucleus.
  • a substituted or unsubstituted compound in which the aromatic hydrocarbon nucleus is a benzene nucleus and has 1 to 3 hydroxy groups is preferable.
  • the phenol having a substituent a compound having 1 to 3 substituents having an alkyl group having 1 to 4 carbon atoms and / or an alkoxy group at least ortho to the hydroxy group is preferable.
  • the alkyl group at the ortho position is preferably a branched alkyl group such as a tertiary butyl group. When two ortho positions are present, an alkyl group may be present in any of them.
  • phenols include phenol, 1,2-benzenediol, 1,3-benzenediol, 1,4-benzenediol, 1,3,5-benzenetriol, and 2,6-ditertiarybutyl-4- Methylphenol, 2,4,6-tritertiary butylphenol, 2-tertiary butylphenol, 3-tertiary butylphenol, 4-tertiary butylphenol, 2,4-ditertiary butylphenol, 2,6-ditertiary butylphenol, 4, 6-ditertiary butylphenol, 1-cresol, 2-cresol, 3-cresol, 2,3-dimethylphenol, 2,4-dimethylphenol, 2,5-dimethylphenol, 2,6-dimethylphenol, 2,3 6-Trimethylphenol 2,4,6-trimethylphenol, 2,5,6-trimethylphenol, 3-isopropylphenol, 2-isopropyl-5-methylphenol, 2-methoxyphenol, 3-methoxyphenol, 4-methoxyphenol, 2-ethoxy Examples
  • phenol 1,2-benzenediol, 2,6-ditertiarybutyl-4-methylphenol, 3-cresol, 2-isopropyl-5-methylphenol and 2-methoxyphenol are preferable.
  • 1 type of phenols may be used as a stabilizer (B), and 2 or more types may be used together.
  • the ratio of the content of phenols in the solvent composition L used in the present invention is preferably 1 mass ppm to 10 mass%, more preferably 3 mass ppm to 7 mass%, more preferably the total amount of the solvent composition L.
  • the content is 5 ppm by mass to 5% by mass.
  • the ratio of the phenol content in the solvent composition L is equal to or higher than the lower limit of the above preferable range, a sufficient effect for stabilization is exhibited. If the ratio of the content is not more than the upper limit of the above preferred range, the surface tension and viscosity are low, the permeability is good, and it is easily evaporated even at room temperature.
  • the ethers used as the stabilizer (B) are a chain ether in which two hydrocarbon groups are bonded to an oxygen atom and a cyclic ether having an oxygen atom as an atom constituting the ring (however, an epoxy ring which is a 3-membered cyclic ether) Is excluded).
  • An oxygen atom sandwiched between the carbon atoms in ethers is referred to as an etheric oxygen atom.
  • compounds having both an etheric oxygen atom and an epoxy group are classified as epoxides.
  • ethers used as the stabilizer (B) compounds having high solubility in the solvent (A) are preferable.
  • the number of etheric oxygen atoms in the chain ether and cyclic ether may be 2 or more.
  • the number of etheric oxygen atoms is preferably 1 to 3.
  • the ethers may be saturated ethers or unsaturated ethers.
  • the ether has preferably 2 to 12 carbon atoms, more preferably 2 to 8 carbon atoms.
  • the hydrocarbon group constituting the ether may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group, and a substituent such as a halogen atom or a hydroxy group may be bonded to the carbon atom. Good.
  • chain ethers include dimethyl ether, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, dipentyl ether, diisopentyl ether, diallyl ether, ethyl methyl ether, ethyl propyl ether, ethyl isopropyl ether, ethyl isobutyl.
  • Ether ethyl isopentyl ether, ethyl vinyl ether, allyl ethyl ether, ethyl phenyl ether, ethyl naphthyl ether, ethyl propargyl ether, butyl vinyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol monophenyl ether , Ethylene glycol monobenzyl ether, ethylene glycol Coal dimethyl ether, ethylene glycol diethyl ether, ethylene glycol diphenyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, dipropylene glycol methyl ether, anisole, methylanisole, anethole, phenetole, 1,1,1-trimethoxyethane, 1,1, Examples include 2-trimethoxyethane, 1,1,1-triethoxye
  • the cyclic ether is preferably a 4- to 6-membered cyclic ether, specifically 1,4-dioxane, 1,3-dioxane, 1,3,5-trioxane, furan, 2-methylfuran, tetrahydrofuran, etc. Is mentioned.
  • ethers used as the stabilizer (B) include chain ethers such as ethyl phenyl ether, ethylene glycol monoethyl ether, and cyclic ethers such as 1,4-dioxane, 1,3-dioxane, and 1,3,5-trioxane. Furan, 2-methylfuran and tetrahydrofuran are preferred.
  • One kind of ethers may be used as the stabilizer (B), or two or more kinds may be used in combination.
  • the ratio of the ether content in the solvent composition L used in the present invention is preferably 1 mass ppm to 10 mass%, more preferably 10 mass ppm to 7 mass%, more preferably the total amount of the solvent composition L.
  • the content is 0.01 to 5% by mass.
  • the ratio of the ether content in the solvent composition L is not less than the lower limit of the above preferred range, a sufficient effect for stabilization can be obtained. If the proportion of the content is not more than the upper limit of the above preferred range, the surface tension and viscosity are low, the permeability is good, and it is easily evaporated even at room temperature.
  • Epoxides The epoxide used as the stabilizer (B) in the present invention refers to a compound having one or more epoxy groups which are 3-membered cyclic ethers.
  • a compound having high solubility in the solvent (A) is preferable.
  • Epoxides may have two or more epoxy groups in one molecule. The number of epoxy groups possessed by the epoxide is preferably 1 to 3.
  • Epoxides may be aliphatic epoxides or aromatic epoxides.
  • Epoxides may have a substituent such as a halogen atom, an etheric oxygen atom, or a hydroxy group. Epoxides preferably have 12 or less carbon atoms.
  • epoxides include 1,2-propylene oxide, 1,2-butylene oxide, 1,2-epoxy-3-phenoxypropane, methyl glycidyl ether, ethyl glycidyl ether, butyl glycidyl ether, vinyl glycidyl ether, Examples include allyl glycidyl ether, diethylene glycol diglycidyl ether, epichlorohydrin, d-limonene oxide and l-limonene oxide.
  • 1,2-propylene oxide, 1,2-butylene oxide, butyl glycidyl ether, 1,2-epoxy-3-phenoxypropane and diethylene glycol diglycidyl ether are preferable.
  • 1 type of epoxides may be used as a stabilizer (B), and 2 or more types may be used together.
  • the ratio of the content of epoxides in the solvent composition L is preferably 1 mass ppm to 10 mass%, more preferably 10 mass ppm to 7 mass%, still more preferably 0.00 mass% with respect to the total amount of the solvent composition L. 01 to 5% by mass.
  • the ratio of the content of epoxides in the solvent composition L is not less than the lower limit of the above preferred range, a sufficient effect for stabilization can be obtained. If the proportion of the content is not more than the upper limit of the above preferred range, the surface tension and viscosity are low, the permeability is good, and it is easily evaporated even at room temperature.
  • the pyrrole used as the stabilizer (B) refers to a heterocyclic 5-membered compound composed of carbon and nitrogen atoms.
  • the pyrroles compounds having high solubility in the solvent (A) are preferable.
  • pyrroles may have a substituent on either a nitrogen atom or a carbon atom.
  • the number of substituents is preferably 1 to 5.
  • an alkyl group having 1 to 3 carbon atoms is preferable.
  • pyrroles include pyrrole, N-methylpyrrole, N-ethylpyrrole and the like. Of these, pyrrole and N-methylpyrrole are preferred.
  • 1 type of pyrroles may be used as a stabilizer (B), and 2 or more types may be used together.
  • the ratio of the content of pyrroles in the solvent composition L used in the present invention is preferably 1 mass ppm to 10 mass%, more preferably 3 mass ppm to 7 mass%, more preferably the total amount of the solvent composition L.
  • the content is 5 ppm by mass to 5% by mass.
  • the ratio of the content of pyrroles in the solvent composition L is not less than the lower limit of the above preferred range, a sufficient effect for stabilization will be exhibited. If the proportion of the content is not more than the upper limit of the above preferred range, the surface tension and viscosity are low, the permeability is good, and it is easily evaporated even at room temperature.
  • the nitro compound used as the stabilizer (B) refers to an organic compound in which a nitro group —NO 2 is bonded to a carbon atom of the organic compound.
  • the nitro compound is preferably soluble in the solvent (A) and has volatility by itself, so that it is volatilized with the solvent (A) and hardly remains on the surface of the article during washing or the like. From this viewpoint, as the nitro compound, an aliphatic nitro compound is preferable, and a compound having a boiling point of 100 ° C. to 150 ° C. is preferable.
  • nitro compounds include nitromethane, nitroethane, 1-nitropropane, 2-nitropropane, nitroethylene, etc. From the above viewpoint, nitromethane, nitroethane, 1-nitropropane, 2-nitropropane Is more preferable.
  • 1 type of a nitro compound may be used as a stabilizer (B), and 2 or more types may be used together.
  • the ratio of the content of the nitro compound in the solvent composition L used in the present invention is preferably 1 ppm by mass to 10% by mass, more preferably 0.01 to 7% by mass with respect to the total amount of the solvent composition L. More preferably, the content is 0.05% by mass to 5% by mass.
  • the ratio of the content of the nitro compound in the solvent composition L is not less than the lower limit of the above preferred range, a sufficient effect for preventing metal corrosion will be exhibited. If the proportion of the content is not more than the upper limit of the above preferred range, the surface tension and viscosity are low, the permeability is good, and it is easily evaporated even at room temperature.
  • the solvent composition L used in the present invention can be prepared by weighing and mixing the components of the stabilizer (B) optionally added to the solvent (A).
  • the cleaning apparatus of the present invention has a cleaning tank containing a solvent composition containing 1233zd (Z) for immersing an article, and a steam generating tank for generating steam for exposing the article to steam, and a steam generating tank Is characterized by containing the solvent composition L and generating steam from the solvent composition L.
  • the cleaning apparatus of the present invention is suitable as the apparatus for cleaning of the present invention.
  • the cleaning apparatus of the present invention is obtained, for example, by storing the solvent composition L in each of the cleaning tank and the steam generation tank of a known multi-tank one-component cleaning apparatus having at least a cleaning tank and a steam generation tank.
  • the multi-tank one-liquid cleaning device is a three-tank one-liquid cleaning device having three tanks, a cleaning tank, a rinsing tank, and a steam generation tank, and a two-tank one-liquid cleaning apparatus having two tanks, a cleaning tank and a steam generation tank.
  • the apparatus can mainly clean electronic and electrical parts, precision machine parts, optical equipment parts and the like.
  • the cleaning apparatus of the present invention will be described by taking a two-tank one-liquid cleaning apparatus as an example. However, as described later, a three-tank one-liquid cleaning apparatus having a rinsing tank may be used in the present invention.
  • FIG. 1 is a diagram schematically showing the structure of a two-tank one-liquid cleaning device 10 which is an example of the cleaning device of the present invention.
  • a two-tank one-component cleaning apparatus 10 shown in FIG. 1 includes a cleaning tank 1 and a steam generation tank 3 containing a solvent composition L as main structures, a vapor zone 4 filled with the vapor of the solvent composition L, and an evaporated solvent composition.
  • a cooling pipe 9 for cooling the object L, and a water separation tank 5 for stationary separation of the liquid of the solvent composition L condensed by the cooling pipe 9 and the water adhering to the cooling pipe are provided.
  • the article D to be cleaned is placed in a dedicated jig or basket, and the cleaning is completed while moving in the cleaning apparatus 10 in the order of the cleaning tank 1 and the steam zone 4 above the steam generation tank 3.
  • a heater 7 and an ultrasonic vibrator 8 are provided in the lower part of the washing tank 1.
  • the solvent composition L is heated and heated by the heater 7, and a physical force is applied to the article D to be cleaned by cavitation generated by the ultrasonic vibrator 8 while being controlled at a constant temperature.
  • the dirt adhering to the cleaning article D is cleaned and removed.
  • any method that has been employed in conventional washing machines such as rocking or jetting of the solvent composition L in liquid may be used.
  • ultrasonic vibration is not essential, and cleaning may be performed without ultrasonic vibration as necessary.
  • the cleaning device 10 is designed such that the overflow of the solvent composition L accommodated in the cleaning tank 1 flows into the steam generation tank 3.
  • a heater 6 for heating the solvent composition L in the steam generation tank 3 is provided at the lower part of the steam generation tank 3.
  • the solvent composition L containing the overflow from the washing tank 1 accommodated in the steam generation tank 3 is heated and boiled by the heater 6, and a part or all of the composition becomes steam to the direction indicated by the arrow 13, that is, Ascending upward of the steam generation tank 3, a vapor zone 4 filled with the vapor of the solvent composition L is formed above the steam generation tank 3.
  • the article D to be cleaned after the immersion cleaning in the cleaning tank 1 is transferred to the steam zone 4 above the steam generation tank 3 and exposed to the vapor of the solvent composition L to be steam cleaned.
  • the cleaning target article D is cleaned by the components of the vaporized solvent composition L aggregated and liquefied on the surface of the target cleaning article D. Since the vapor
  • the space above each tank is commonly used as the vapor zone 4.
  • the steam generated from the cleaning tank 1 and the steam generation tank 3 is cooled and condensed by the cooling pipe 9 provided at the upper part of the wall surface of the two-tank one-liquid cleaning apparatus 10, so that the solvent composition L is obtained from the steam zone 4. Collected.
  • the agglomerated solvent composition L is then accommodated in the water separation tank 5 via a pipe 14 connecting the cooling pipe 9 and the water separation tank 5.
  • water separation tank 5 water mixed in the solvent composition L is separated.
  • the solvent composition L from which water has been separated is returned to the washing tank 1 through a pipe 12 that connects the water separation tank 5 and the washing tank 1.
  • the solvent composition L is circulated in the two-tank one-liquid cleaning device 10 while changing its state to liquid or gas, so that the dirt components brought into the cleaning tank 1 are continuously supplied to the steam generation tank 3. Accumulating and steam cleaning in the steam zone 4 becomes possible.
  • the temperature of the cleaning tank 1 when cleaning the article to be cleaned is less than 35 ° C. If it is this range, the evaporation amount of the solvent composition L from the washing tank 1 will be suppressed.
  • the temperature of the washing tank 1 is preferably 20 ° C. or higher and lower than 35 ° C., more preferably 25 ° C. or higher and lower than 34 ° C., and particularly preferably 28 ° C. or higher and lower than 33 ° C. If the temperature of the cleaning tank 1 is too low, the cleaning efficiency may decrease. Even if the temperature of the cleaning tank 1 is too high, the cleaning efficiency may be reduced. As the amount of steam generated from the cleaning tank 1 increases, the amount of steam generated from the steam generating tank 3 relatively decreases, and steam is efficiently supplied in the steam cleaning performed in the steam zone 4 above the steam generating tank 3. It is thought that it is due to not being done.
  • the temperature of the steam generation tank 3 is preferably 35 ° C. or higher.
  • the temperature of the steam generation tank 3 is preferably 35 ° C. or higher and lower than 40 ° C., more preferably 36 ° C. or higher and lower than 40 ° C., and particularly preferably 37 ° C. or higher and lower than 40 ° C. If the temperature of the steam generation tank 3 is too low, the amount of steam generated from the steam generation tank 3 is reduced, so that the steam is not supplied efficiently in the steam cleaning performed in the steam zone 4 above the steam generation tank 3. Efficiency drops. If the temperature of the steam generation tank 3 is too high, the amount of steam generated increases and steam loss increases, and the solvent composition L is easily decomposed by heat.
  • the solvent composition L used in the present invention has a low stability and a composition generated by decomposition and a stabilizer added to suppress decomposition tend to remain, and the efficiency of the steam cleaning performed above the steam generation tank 3 is final. It is important to obtain a high degree of cleaning.
  • the temperature of the cleaning tank 1 when cleaning the article D to be cleaned is preferably less than 35 ° C.
  • the temperature of the steam generation tank 3 is preferably 35 ° C. or more
  • the temperature of the cleaning tank 1 is 34 ° C.
  • the temperature of the steam generation tank 3 is preferably 36 ° C. or higher
  • the temperature of the cleaning tank 1 is preferably lower than 33 ° C.
  • the temperature of the steam generation tank 3 is particularly preferably 37 ° C. or higher. In such a range, cleaning with almost no dirt remaining is possible.
  • the temperature difference between the washing tank 1 and the steam generation tank 3 is preferably 5 ° C or higher, more preferably 7 ° C or higher, and particularly preferably 8 ° C or higher. In such a range, cleaning with almost no dirt remaining is possible.
  • the cleaning apparatus of the present invention can be realized by a two-tank one-component cleaning apparatus that does not have the rinsing tank 2. From the viewpoint of enhancing the cleaning effect by the article D to be cleaned, for example, a rinsing tank as shown in FIG. A three-tank one-liquid cleaning device 20 having 2 is preferable.
  • FIG. 2 is a view schematically showing a three-tank one-liquid cleaning device 20 which is another example of the cleaning device of the present invention.
  • the three-tank one-liquid cleaning apparatus 20 is different from the two-tank one-liquid cleaning apparatus 10 in that the two-tank one-liquid cleaning apparatus 10 shown in FIG. 1 further includes a rinsing tank 2 that contains the solvent composition L. Yes. Accordingly, the three-tank one-liquid cleaning device 20 is designed such that the overflow of the solvent composition L accommodated in the rinsing tank 2 flows into the cleaning tank 1.
  • the cleaning tank 1 is provided with a pipe 11 for feeding the solvent composition L to the steam generation tank 3 for the purpose of preventing the liquid level from exceeding a predetermined height.
  • the pipe 12 connects the water separation tank 5 and the cleaning tank 1, whereas in the three-tank one-liquid cleaning apparatus 20, the pipe 12 includes the water separation tank 5 and the rinsing tank. 2, the solvent composition L separated from the water in the water separation tank 5 is returned to the rinse tank 2 through the pipe 12.
  • cleaning apparatus 20 is the same as that of the 2 tank type 1 liquid washing
  • FIG. 1 In the three-tank one-liquid cleaning apparatus 20, the same reference numerals are given to the components that perform the same functions as those in the two-tank one-liquid cleaning apparatus 10, and redundant description is omitted.
  • the article to be cleaned D is cleaned while moving in the order of the cleaning tank 1, the rinse tank 2, and the steam zone 4 above the steam generation tank 3.
  • the dirt component dissolved in the solvent composition L adhering to the article to be cleaned D when the article to be cleaned D is immersed in the solvent composition L is pulled up from the cleaning tank 1 is removed.
  • the rinsing tank 2 may have means for applying a physical force to the article D to be cleaned, like the cleaning tank 1.
  • a cooling device is installed in the rinsing tank 2 using the three-tank one-component cleaning apparatus 20, thereby keeping the temperature of the solvent composition L in the rinsing tank 2 at a low temperature and immersing
  • reducing the temperature of the article D to be cleaned it is effective to widen the temperature difference from the steam temperature and increase the condensation amount of the solvent composition L in the article D to be cleaned.
  • the temperature of the rinsing tank 2 is preferably less than 30 ° C, more preferably less than 20 ° C, and particularly preferably less than 10 ° C. If the temperature of the rinsing tank 2 is high, the temperature of the article D to be cleaned is not sufficiently cooled, and the temperature difference between the steam temperature and the article D to be cleaned becomes small in the steam cleaning performed in the steam zone 4 above the steam generation tank 3. In addition, the cleaning efficiency tends to decrease due to a decrease in the amount of condensation of the solvent composition L in the article D to be cleaned.
  • the solvent composition containing 1233zd (Z) used in the cleaning apparatus of the present invention is as described above. Further, the article to be cleaned, the material thereof, and the deposit to be cleaned and removed by the cleaning apparatus of the present invention are the same as the article to be cleaned, the material and the deposit to be cleaned and removed in the cleaning method of the present invention.
  • the method of using the cleaning apparatus of the present invention includes a cleaning tank that stores the first cleaning liquid, and a steam generation tank that stores the second cleaning liquid and generates steam from the second cleaning liquid.
  • the solvent composition containing (solvent composition L) is used.
  • the method of using the cleaning apparatus of the present invention is applied to, for example, the cleaning apparatus of the present invention.
  • the method of using the cleaning apparatus of the present invention uses the above-described cleaning apparatus of the present invention having a cleaning tank containing a solvent composition L and a steam generation tank, and the inside of the cleaning tank, the steam generation tank It is a usage method of the washing
  • the article to be cleaned is immersed in the solvent composition L in the cleaning tank, and then moved to above the steam generation tank.
  • the article to be cleaned is exposed to the vapor generated from the solvent composition L contained in the vapor generation tank above the vapor generation tank.
  • the object to be cleaned is not immersed in the solvent composition L.
  • the temperature of the cleaning tank when the article to be cleaned is immersed and cleaned is less than 35 ° C. If it is this range, the evaporation amount of the solvent composition L from a washing tank will be suppressed.
  • the temperature of the washing tank is preferably 20 ° C. or higher and lower than 35 ° C., more preferably 25 ° C. or higher and lower than 34 ° C., and particularly preferably 28 ° C. or higher and lower than 33 ° C. If the temperature of the washing tank is too low, the washing efficiency may be lowered. If the temperature of the washing tank is too higher than the above range, the washing efficiency may be lowered. This is because the amount of steam generated from the cleaning tank is relatively increased, the amount of steam generated from the steam generating tank is relatively reduced, and steam is not efficiently supplied in the steam cleaning performed in the steam zone above the steam generating tank. It is thought that.
  • the temperature of the steam generation tank when cleaning the article to be cleaned is 35 ° C. or higher. Within such a range, it is possible to perform cleaning with almost no dirt remaining.
  • the temperature of the steam generation tank is preferably 35 ° C. or higher and lower than 40 ° C., more preferably 36 ° C. or higher and lower than 40 ° C., particularly preferably 37 ° C. or higher and lower than 40 ° C. If the temperature of the steam generation tank is too low, the amount of steam generated from the steam generation tank will decrease, and the steam will not be supplied efficiently in the steam cleaning performed in the steam zone above the steam generation tank. There is. If the temperature of the steam generation tank is too high, the amount of generated steam increases, steam loss increases, and the solvent composition L is easily decomposed by heat.
  • the solvent composition L used in the present invention has a low stability and a composition generated by decomposition, and a stabilizer added to suppress decomposition tends to remain, and the efficiency of the steam cleaning performed above the steam generation tank is finally It is important to obtain a high degree of cleaning.
  • the temperature of the cleaning tank when cleaning the article to be cleaned is preferably less than 35 ° C
  • the temperature of the steam generation tank is preferably 35 ° C or more
  • the temperature of the cleaning tank is 34 ° C.
  • the temperature of the steam generation tank is preferably 36 ° C. or higher
  • the temperature of the cleaning tank is preferably 33 ° C. or lower
  • the temperature of the steam generation tank is particularly preferably 37 ° C. or higher. In such a range, cleaning with almost no dirt remaining is possible.
  • the temperature of the steam generation tank is preferably 5 ° C. or higher, more preferably 7 ° C. or higher, and particularly preferably 8 ° C. or higher. In such a range, cleaning with almost no dirt remaining is possible.
  • the solvent composition containing 1233zd (Z) in the method of using the cleaning apparatus of the present invention is as described above. Further, the article to be cleaned, the material thereof, and the deposits to be cleaned and removed by the method of using the cleaning apparatus of the present invention are the same as the article to be cleaned, the material thereof and the deposits to be cleaned and removed in the cleaning method of the present invention. It is.
  • 0.1 mass% component other than 1233zd (Z) is (E) -1-chloro-3,3,3-trifluoro-1-propene (1233zd (E)) It is.
  • Stabilizer (B) is added to 1233zd (Z) (1) so that the mass ratio shown in Table 1 when the solvent composition is obtained, and 50 kg of solvent compositions 1 to 4 are prepared. Moreover, 50 kg of the solvent composition 5 which contains 1233zd (Z) (1) but does not contain a stabilizer (B) shown in Table 1 is prepared. In addition, the mass ratio of the stabilizer (B) shown in Table 1 is a mass ratio with respect to the content of 1233zd (Z) in the solvent composition.
  • S Dirt such as cutting oil is hardly seen.
  • A Dirt such as cutting oil hardly remains.
  • B A level of no problem in practical use although a trace amount of dirt such as cutting oil remains.
  • X Dirt such as cutting oil remains considerably.
  • each solvent composition is shown in Table 1, and the temperature conditions of the cleaning tank 1 and the steam generation tank 3 in each cleaning test and the test results are shown in Table 2.
  • the temperature of the washing tank 1 and the steam generation tank 3 is the same as the temperature of the solvent composition which each tank accommodates, respectively.
  • a method for cleaning an article that efficiently obtains a high degree of cleaning using a solvent composition containing 1233zd (Z) that does not adversely affect the global environment, a cleaning tank using the solvent composition, It is possible to provide a method of efficiently obtaining a high degree of cleaning by a cleaning device having a steam generation tank and a method of using the cleaning device using the solvent composition.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Detergent Compositions (AREA)

Abstract

L'invention concerne un procédé de nettoyage d'un article, un procédé d'utilisation d'un dispositif de nettoyage, et un dispositif de nettoyage, avec lesquels une salissure peut être totalement nettoyée, à l'aide d'un solvant de nettoyage qui ne présente aucun effet négatif sur l'environnement global. Ledit procédé de nettoyage d'un article est caractérisé en ce qu'il comprend : une étape d'immersion servant à immerger l'article dans une composition de solvant contenant du (Z)-1-chloro-3,3,3-trifluoro-1-propène (HCFO-1233zd(Z)) ; et une étape de mise en contact avec de la vapeur servant à engendrer la production d'une vapeur de HCFO-1233zd(Z) à partir de la composition de solvant et à exposer l'article à la vapeur produite. Ledit dispositif de nettoyage est caractérisé en ce qu'il comprend : un réservoir de nettoyage permettant de recevoir une composition de solvant contenant du HCFO-1233zd(Z) servant à l'immersion d'un article ; et un réservoir de production de vapeur servant à produire une vapeur à laquelle l'article doit être exposé, ledit réservoir de production de vapeur recevant ladite composition de solvant et engendrant la production de vapeur à partir de la composition de solvant.
PCT/JP2016/079002 2015-09-30 2016-09-30 Procédé de nettoyage, procédé d'utilisation de dispositif de nettoyage, et dispositif de nettoyage Ceased WO2017057669A1 (fr)

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