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WO2016209005A1 - Perovskite-based solar cell using graphene as conductive transparent electrode - Google Patents

Perovskite-based solar cell using graphene as conductive transparent electrode Download PDF

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Publication number
WO2016209005A1
WO2016209005A1 PCT/KR2016/006710 KR2016006710W WO2016209005A1 WO 2016209005 A1 WO2016209005 A1 WO 2016209005A1 KR 2016006710 W KR2016006710 W KR 2016006710W WO 2016209005 A1 WO2016209005 A1 WO 2016209005A1
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layer
graphene
perovskite
solar cell
electrode
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PCT/KR2016/006710
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French (fr)
Korean (ko)
Inventor
최만수
성향기
안남영
이종권
장민석
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SNU R&DB Foundation
Global Frontier Center For Multiscale Energy Systems
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Seoul National University R&DB Foundation
Global Frontier Center For Multiscale Energy Systems
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Priority claimed from KR1020160066251A external-priority patent/KR20170049359A/en
Application filed by Seoul National University R&DB Foundation, Global Frontier Center For Multiscale Energy Systems filed Critical Seoul National University R&DB Foundation
Priority to US15/745,225 priority Critical patent/US20180358571A1/en
Priority to CN201680037217.7A priority patent/CN108012568A/en
Publication of WO2016209005A1 publication Critical patent/WO2016209005A1/en
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80Constructional details
    • H10K30/81Electrodes
    • H10K30/82Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/24Lead compounds
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/30Coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/50Organic perovskites; Hybrid organic-inorganic perovskites [HOIP], e.g. CH3NH3PbI3
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to an energy device including a solar cell, and more particularly, to replace an existing ITO and FTO transparent conductive oxide electrode which is fragile with a flexible graphene electrode and to use perovskite as an absorber. It relates to a battery.
  • Organic / inorganic composite perovskite has a high absorption coefficient, balanced electron / hole transport, low temperature treatment, small exciton binding energy and longer exciton diffusion lengths than organic semiconductor materials, resulting in a photoactive layer of the solar cell. It is a promising material used.
  • High performance perovskite solar cells typically employ a nip architecture consisting of metal oxide / perovskite material / hole transport material such as TiO 2 or Al 2 O 3 .
  • the selection of the substrate is limited by the high temperature process of 450 ° C. or higher for the manufacture of the metal oxide thin film, and the manufacturing cost is increased due to this limitation.
  • pin perovskite solar cells have been studied for their advantages such as low hysteresis behavior, low processing temperature and easy manufacturing process.
  • ITO is mainly coated on polyethylene naphthalate (PEN) film and used as an electrode, and has shown an efficiency of up to 12.2% up to now. It is reported that the decrease in efficiency of the solar cell is due to the breakability of the ITO layer having high mechanical brittleness.
  • PEN polyethylene naphthalate
  • OLED organic solar cell
  • flexible conductive electrodes such as graphene, carbon nanotubes, metal lattice and conductive polymers are already being used as a substitute for brittle transparent conducting oxide (TCO) applicable to flexible solar cells. Much has been studied.
  • graphene and single layer 2D carbon materials which are optically very transparent (about 97% in the visible region), mechanically robust, flexible and stretchable, are the most promising candidates.
  • graphene is used as a conductive transparent electrode in a fuel-sensitized solar cell or an organic solar cell.
  • the solar cells using a graphene transparent electrode reported so far, 8.48% of the highest efficiency is obtained in tandem polymer solar cells.
  • This tandem type of structure is disadvantageous due to the large number of constituent layers, and is still lower than TCO-free perovskite solar cells showing PCE 11.0%.
  • graphene electrodes used in perovskite devices in recent studies, but in these studies, graphene was used as the top electrode, not as a replacement for conventional TCO electrodes.
  • the conductive transparent electrode widely used in solar cells is a conductive transparent oxide of indium tin oxide (ITO) or fluorine doped tin oxide (FTO).
  • ITO indium tin oxide
  • FTO fluorine doped tin oxide
  • the material is fragile, and as the solar cell repeatedly bends, it causes a decrease in efficiency of the solar cell.
  • Graphene is less conductive than conductive transparent oxides, but is a readily available material, and has excellent characteristics in light transmittance, mechanical strength, and flexibility.
  • the organometallic halide perovskite material has a high leap forward in the efficiency increase of 3rd generation solar cells due to its high light absorption and charge mobility (at least 20% efficiency). Suitable for use in
  • the present invention provides a perovskite-based solar cell comprising a graphene layer as a conductive transparent electrode.
  • the conductive transparent electrode made of the graphene layer may be a transparent front electrode.
  • the solar cell may be one in which a transparent anode electrode, a hole transport layer, a perovskite layer, an electron transport layer and a cathode electrode made of a graphene layer are sequentially stacked on a substrate.
  • a transparent cathode electrode, an electron transport layer, a perovskite layer, a hole transport layer, and an anode electrode made of a graphene layer may be sequentially stacked on a substrate.
  • the solar cell may further include a metal oxide layer deposited on the transparent anode electrode or the transparent cathode electrode made of the graphene layer.
  • the metal oxide layer is MoO 3 , NiO, CoO and TiO 2 It may be to include one or more selected from the group consisting of.
  • the metal oxide layer may have a thickness of about 0.5 nm to about 6 nm.
  • the perovskite may be a perovskite device using a lead halide adduct compound.
  • the lead halide adduct compound may be represented by Formula 1 below.
  • A is an organic halide compound or an inorganic halide compound
  • Y is F - is a halogen ion, -, Cl -, Br - or I
  • Q is a Lewis base compound containing a functional group having an electron-pair donor as an atom having a non-covalent electron pair, and the peak of the FT-IR of the functional group is 1 to 10 cm - from the compound of Formula 1 to the compound of Formula 2 below. Red shifted by 1 appears,
  • Y and Q are the same as defined for the formula (1).
  • A may be CH 3 NH 3 I, CH (NH 2 ) 2 I or CsI.
  • the perovskite may be made by heating and drying the adduct compound to remove the Lewis base compound included in the adduct compound.
  • the present invention has successfully implemented a perovskite-based solar cell using graphene as a conductive transparent electrode, and has the highest efficiency through proper energy band combination of graphene electrode / hole transport layer / perovskite / electron transport layer / metal electrode. 17.1% was achieved. This is the highest efficiency of graphene electrode-based solar cell efficiency reported so far, and other transparent conductive electrodes (metal thin films or conductive organic materials such as PEDOT: PSS) to replace transparent conductive oxide electrodes such as ITO and FTO in addition to graphene electrodes. It is the highest efficiency among the solar cell using.
  • transparent conductive electrodes metal thin films or conductive organic materials such as PEDOT: PSS
  • the structure of the present invention is formed on a polymer substrate of graphene-coated PET, PEN, etc.
  • high efficiency flexible solar cell is expected to be less efficient in repetitive bending as well as the existing ITO electrode. It is expected to be used for the development of flexible devices in optoelectronic devices (for example, optical sensors and light emitting diodes) and perovskite-based memory devices.
  • FIG. 1 is a graph showing conversion efficiency (PCE) of a perovskite-based solar cell using graphene as a conductive transparent electrode according to the present invention.
  • FIG. 2 is a schematic diagram of a perovskite-based solar cell using graphene as a conductive transparent electrode.
  • Figure 3 shows (a) graphene, (b) 1 nm MoO 3 deposited graphene, (c) 2 nm MoO 3 deposited graphene, (d) ITO, (e) UVO treated ITO and (f) UVO PEDOT: PSS droplets on ITO covered with 1 nm MoO 3 after treatment.
  • Figure 4 is (a) graphene (b) graphene / 1 nm MoO 3 (c) SEM image of graphene / 2 nm MoO 3 is shown (scale bar 100 nm).
  • FIG. 6 is a graph showing the relationship between MoO 3 thickness and average PCE of (a) graphene electrode and (b) ITO electrode, (c) JV curve showing the highest performance of Example 2 and (d) Comparative Example 2 device, (e) the relationship between sheet resistance and MoO 3 thickness of graphene and ITO, and (f) the transmittance of graphene and ITO with or without 2 nm thick MoO 3 layer.
  • FIG. 7 shows the measured JV curves of (a) Example 1 and (b) Example 2.
  • MoO 3 of various thickness A diagram showing the UPS spectrum and calculated work function of (a) ITO and (b) graphene, including layers, and (c) a schematic energy level of the structure.
  • FIG. 13 shows planar SEM images of MAPbI 3 perovskite films prepared on (a) Example 2 / PEDOT: PSS and (b) Comparative Example 2 / PEDOT: PSS. (c) and (d) show high magnification images of (a) and (b).
  • A is FT-IR spectrum of DMSO (solution), PbI 2 DMSO (powder) and MAI PbI 2 DMSO (powder), (b) MAI PbI 2 DMSO (powder) and FAI This is a comparison of the FT-IR spectra of PbI 2 DMSO (powder).
  • the present invention provides a perovskite-based solar cell comprising a graphene layer as a conductive transparent electrode.
  • the conductive transparent electrode made of the graphene layer may be a transparent front electrode.
  • the solar cell may be one in which a transparent anode electrode, a hole transport layer, a perovskite layer, an electron transport layer and a cathode electrode made of a graphene layer are sequentially stacked on a substrate.
  • a transparent cathode electrode, an electron transport layer, a perovskite layer, a hole transport layer, and an anode electrode made of a graphene layer may be sequentially stacked on a substrate.
  • a solar cell in which a transparent anode electrode, a hole injection layer (metal oxide layer), a hole transport layer, a perovskite layer, an electron transport layer and a cathode electrode are sequentially stacked on a substrate.
  • a transparent anode electrode a hole injection layer (metal oxide layer), a hole transport layer, a perovskite layer, an electron transport layer and a cathode electrode are sequentially stacked on a substrate.
  • graphene is a two-dimensional carbon allotrope
  • a method of manufacturing the same is a peeling method for physically separating a layer of graphene from graphite, and chemical oxidation to obtain graphene by dispersing the graphite in a dispersion and chemically reducing it.
  • / Reduction method pyrolysis method of obtaining graphene layer through high temperature pyrolysis on silicon carbide (SiC) substrate, and chemical vapor deposition method, among which chemical vapor deposition can be exemplified as a method for synthesizing high quality graphene.
  • SiC silicon carbide
  • chemical vapor deposition method among which chemical vapor deposition can be exemplified as a method for synthesizing high quality graphene.
  • graphene prepared by a chemical vapor deposition method is preferred.
  • a single layer graphene is used, but not limited thereto, and multilayer graphene may also be used.
  • the thickness of the graphene layer may be 0.01 to 35 nm, preferably 0.01 to 3.5 nm, more preferably 0.01 to 0.35 nm.
  • the graphene may exhibit a characteristic aspect ratio of 0.1 or less, graphene layer number of 100 or less, and a specific surface area of 300 m 2 / g or more.
  • the graphene refers to a single mesh plane of SP 2 bonds of carbon (C) in graphite hcp structure, and recently, graphene composite layers having a plurality of layers are also classified as graphene in a broad sense.
  • the method of transferring the graphene to the substrate is not particularly limited and will not be described in detail because it follows a general method known in the art.
  • an electron transport layer may be directly formed on the transparent cathode electrode (graphene layer), or a hole transport layer may be directly formed on the transparent anode electrode (graphene layer), but a metal oxide layer may be deposited on the graphene layer. It is possible. In this case, when the graphene layer is a transparent anode electrode, the metal oxide layer may serve as a hole injection layer, and when the graphene layer is a transparent cathode electrode, the metal oxide layer may serve as an electron injection layer.
  • the metal oxide layer may be deposited to make the graphene layer wettable.
  • the metal oxide layer is MoO 3 , NiO, CoO and TiO 2 It may include one or more selected from the group consisting of, but is not limited thereto, and any material known in the art may be used without limitation.
  • the metal oxide layer may have a thickness of about 0.5 nm to about 6 nm.
  • the hole transport layer is poly (3,4-ethylenedioxythiophene) polystyrene sulfone (PEDOT: PSS); Tetrafluoro-tetracyano-quinodimethane (CuPc: F 4 -TCNQ);
  • PEDOT: PSS includes tungsten oxide (WO x ), graphene oxide (GO), carbon nanotubes (CNT), molybdenum oxide (MoO x ), vanadium oxide (V 2 O 5 ) and nickel oxide (NiO x ) At least one selected from the group may be selected from the blended, but is not limited thereto, and any material used in the art may be used without limitation.
  • the hole transport layer may include a doping material, and the doping material may be selected from the group consisting of Li-based dopants, Co-based dopants, and combinations thereof, but is not limited thereto.
  • a mixture of spiro-MeOTAD, 4-tert-butyl pyridine (tBP), and Li-TFSI may be used as a material constituting the hole transport layer.
  • PSS used as the hole transport layer used in the preferred embodiment of the present invention is a polystyrene sulfonate (PSS) gel in which PEDOT (poly (3,4-ethylenedioxythiophene) (poly (3,4-ethylenedioxythiophene) 5-10 is polymerized is dispersed in an aqueous solution)
  • the electron transport layer is at least one selected from the group consisting of fullerenes, bathocuproine (BCP) and fullerene derivatives or selected from TiO 2 , ZnO, SrTi0 3 , WO 3 or mixtures thereof.
  • BCP bathocuproine
  • a metal oxide may be used, and any material used in the industry may be used without limitation.
  • fullerene derivatives include, but are not limited to, Phenyl-C61-butyric acid methyl ester (PCBM). According to a preferred embodiment, C60 / BCP can be used.
  • the metal electrode or the back electrode used as the cathode or anode electrode is Pt, Au, Al, Ni, Cu, Ag, In, Ru, Pd, Rh, Ir, Os and C and combinations thereof It may be selected, but is not limited to these, any material known in the art can be used without limitation.
  • the perovskite may be a lead halide adduct compound.
  • the lead halide adduct compound may be represented by Formula 1 below.
  • A is an organic halide compound or an inorganic halide compound
  • Y is F - is a halogen ion, -, Cl -, Br - or I
  • Q is a Lewis base compound containing a functional group having an electron-pair donor as an atom having an unshared electron pair, and the peak of the FT-IR of the functional group is 1 to 10 cm - from the compound of Formula 1 to the compound of Formula 2 below. Red shifted by 1 appears,
  • Y and Q are the same as defined for the formula (1).
  • A may be CH 3 NH 3 I, CH (NH 2 ) 2 I or CsI.
  • the perovskite may be made by heating and drying the adduct compound to remove the Lewis base compound included in the adduct compound.
  • Perovskite preparation using the adduct compound may be referred to the Korean Patent Application Nos. 2015-0090139 and 2015-0164744, the other patent applications of the researchers, the entire contents of which are incorporated herein by reference.
  • formula (3) or an organic cation represented by the formula (4) or Cs + cation and F -, Cl -, Br - and I - organic or inorganic consisting of a combination of a halogen ion is selected from It may be a halide compound.
  • R 1 , R 2 , R 3 and R 4 are independently selected from hydrogen and unsubstituted or substituted C1-C6 alkyl
  • R 5 , R 6 , R 7 and R 8 are hydrogen, unsubstituted or substituted C1-C20 alkyl or unsubstituted or substituted aryl.
  • the A may be selected from CH 3 NH 3 I (MAI, Methyl Ammonium Iodide, methyl ammonium iodide), CH (NH 2 ) 2 I (FAI, Formamidinium Iodide, formamidinium iodine) or CsI have.
  • Q is a Lewis base compound having a functional group in which nitrogen (N), oxygen (O) or sulfur (S) atoms are electron pair donors, and more specifically Q is nitrogen, oxygen, sulfur atoms in electron pair donors Thioamide group, thiocyanate group, thioether group, thioketone group, thiol group, thiophene group, thiourea group, thiosulfate group, thioacetamide group, carbonyl group, aldehyde group, carboxyl group, ether group, Ester group, sulfonyl group, sulfo group, sulfinyl group, thiocyanato group, pyrrolidinone group, peroxy group, amide group, amine group, amide group, imide group, imine group, azide group, pyridine group, pyrrole group, nitro It may be a Lewis base compound containing at least one functional group selected from the group consisting of a group, a nitroso group
  • DMSO dimethylsulfoxide
  • DMA N-dimethylacetamide
  • DMA N-methyl-2-pyrrolidione
  • N-Methyl-2-pyrrolidione N-Methyl-2-pyrrolidione
  • MPLD N-Methyl-2-pyridine
  • DMP 2,6-dimethyl- ⁇ -pyrone
  • acetamide Acetamide
  • Urea Thiourea (Thiourea (TU)), N, N-Dimethylthioacetamide (NTA), Thioacetamide (TAM), Ethylenediamine (Ethylenediamine (EN)), Tetramethylethylenediamine (TMEN), 2,2'-Bipyridine (BIPY), 1,10-Piperidine , At least one compound selected from the group consisting of aniline, pyrrolidine, diethylamine, N-methylpyrrolidine, and n-propylamine
  • the FT-IR peak corresponding to the functional group of the electron-pair donor atom in which the Lewis base compound represented by Q corresponds to Pb is red shifted by 10 to 30 cm ⁇ 1 from the compound represented by Formula 2 than the Q compound (red shift) may appear.
  • the Lewis base compound may be in a liquid state, preferably nonvolatile or low volatility, and a boiling point of 120 ° C. or higher, for example, a boiling point of 150 ° C. or higher may be used.
  • Preparing a precursor solution by dissolving a lead halide, an organic halide compound or an inorganic halide compound, and a Lewis base compound containing nitrogen (N), oxygen (O), or sulfur (S) atoms in an electron pair donor in a first solvent;
  • It provides a method for producing a lead halide adduct compound comprising the step of filtering the precipitate produced by adding a second solvent to the precursor solution.
  • the lead halide, a halogenated compound containing a divalent cation, and an organic material including a ligand may be mixed in a molar ratio of 1: 1: 1 to 1: 1: 1.5, and may be mixed in a molar ratio of 1: 1: 1. Most preferred.
  • the first solvent comprises an organic material including the lead halide, an organic halide compound or an inorganic halide compound and a functional group having an electron pair donor of nitrogen (N), oxygen (O) or sulfur (S) atoms.
  • organic solvents that can dissolve, propanediol-1,2-carbonate (PDC), ethylene carbonate (EC), diethylene glycol, propylene carbonate (PC), propylene carbonate (PC), hexamethyl phosphate triamide (HMPA ), Ethyl acetate, nitrobenzene, formamide, ⁇ -butyrolactone (GBL), benzyl alcohol, N-methyl-2-pyrrolidone (NMP), acetophenone, ethylene glycol, trifluorophosphate, benzonitrile ( BN), valeronitrile (VN), acetonitrile (AN), 3-methoxy propionitrile (MPN), dimethyl sulfoxide (DMSO), dimethyl sulfate, aniline
  • the first solvent may be added in excess, and preferably, may be added in a weight ratio of 1: 1 to 1: 3 (lead halide: first solvent) with respect to the weight of the lead halide.
  • the second solvent may be a non-polar or weak polar solvent that can selectively remove the first solvent, for example, acetone, C1-C3 alcohol, ethyl acetate, diethyl ether And solvents selected from the group consisting of alkylene chlorides, cyclic ethers, and mixtures thereof.
  • perovskite prepared from a lead halide adduct compound may exhibit low reproducibility when using toluene and chlorobenzene, which are used as common volatile solvents, which indicates that the perovskite quality is This is because when using one volatile solvent, the amount of dripping and / or the spinning speed of the cleaning liquid and the solubility difference between the cleaning liquid and the precursor solution can be greatly influenced.
  • a second solvent according to the present invention preferably a diethyl ether solvent
  • the adduct compound includes peaks positioned in the range of 2 ⁇ values of XRD diffraction peaks of 7 to 8.5 and 9.8 to 10.5, and specifically 2 ⁇ values of XRD diffraction peaks of 6 to 7 , Peaks located in the range of 7 to 8.5 and 9.8 to 10.5, respectively, or 2 ⁇ values of XRD diffraction peaks in the range of 7 to 8.5, 9.8 to 10.5, 11 to 12.5, and 13 to 14, respectively. (See FIGS. 14 and 15). These peaks do not appear in compounds prepared by other methods, and may be characteristic peaks in adduct compounds.
  • the lead halide duct compound thin film prepared as described above may form a transparent thin film as shown in Figure 2 (a).
  • the lead halide adduct compound formed of the thin film may be subjected to a heating step at a temperature of 30 ° C. or higher, preferably, may be heated at a temperature of 40 ° C. or 50 ° C. or higher, for example, 30 ° C. or higher and 150 ° C. It can be heated in the following temperature range to form perovskite.
  • the heating process may be heated in a stepwise manner of being heated at a temperature of 30 °C to 80 °C and further heated at 90 °C to 150 °C, perovskite having a more compact structure by the additional heating process Get a decision.
  • the perovskite is formed by removing the ligand organic material represented by Q of Formula 1 from the crystal structure of the lead halide adduct compound.
  • the manufactured perovskite thin film is dark brown and Likewise, a thin film having a dark color may be formed.
  • the substrate may be a flexible substrate made of a polymer material or a non-flexible substrate such as glass.
  • the transparent anode electrode is graphene
  • the metal oxide layer is MoO 3 (molybdenum trioxide)
  • the hole transport layer is PEDOT: PSS
  • the perovskite layer is MAPbI 3 (Methyl Ammonium Lead Iodide)
  • the electron transport layer is C A 60 (fullerene) / bathocuproine (BCP)
  • cathode electrode is provided with a high efficiency TCO-free perovskite based solar cell comprising lithium fluoride (LiF) / Al (aluminum).
  • MoO 3 formed to a thickness of several nanometers A layer is formed between the graphene and the PEDOT: PSS layer, which provides hydrophilicity to the graphene surface and can raise the low work function (4.23 eV) to a high level (4.71 eV) through hole doping.
  • the wettability and device properties of PEDOT: PSS are influenced by the thickness of the MoO 3 layer. In a more preferred embodiment, a conversion efficiency of up to about 17.1% can be achieved by introducing a MoO 3 interfacial layer about 2 nm thick (see FIG. 1).
  • the structure of a solar cell device according to an embodiment of the present invention is schematically shown in FIG.
  • PEDOT: PSS and C 60 / BCP were used as the hole transport layer (HTL) and the electron transport layer (ETL), respectively.
  • the structure is capable of low temperature processing, making it suitable for next generation applications applied on flexible plastic substrates.
  • Single-layer graphene grown through chemical vapor deposition (CVD) increases the work function ( ⁇ 4.3 eV) by P-type doping and consequently improves conductivity, as well as the highest occupancy of the preferred hole transport layer. Since it induces an energy level of the highest occupied molecular orbital (HOMO) level (e.g., ⁇ 5.2 eV for PEDOT: PSS), it is preferable to use it as a transparent anode electrode.
  • the present invention is not limited thereto and may be used as a cathode by n-doped graphene as necessary.
  • MoO 3 between the graphene and PEDOT: PSS layer by vacuum thermal deposition After depositing the layer, heat treatment was performed at 150 ° C.
  • the interfacial properties of the graphene electrode such as wettability and doping level of PEDOT: PSS, were adjusted.
  • the wettability of PEDOT: PSS on graphene is a very important factor in the fabrication of high performance devices.
  • Ultra-thin MoO 3 layers having various thicknesses of 1 nm, 2 nm and 4 nm were coated on a single layer graphene coated glass substrate by vacuum thermal evaporation at a deposition rate of 0.1 ⁇ s -1 using a vacuum thermal evaporator, followed by heat treatment at 150 ° C. for 10 minutes. .
  • the deposition rate and thickness during the deposition were monitored using a quartz crystal sensor.
  • the MoO 3 layer was intended to change the hydrophobic graphene surface to hydrophilic.
  • the substrate was first soaked in deionized water, and then 50 ⁇ l of PEDOT: PSS solution (Clevios P VP Al 4083) was spin coated at 5000 rpm for 30 seconds, followed by heat treatment at 150 ° C. for 20 minutes to form a hole transport layer. It was.
  • a perovskite layer was formed on the hole transport layer as an absorber.
  • the perovskite layer is MAI
  • PbI 2 DMSO was mixed at a molar ratio of 1: 1: 1 and dissolved in a 50 wt% DMF solution without heating, followed by spin coating of 50 ⁇ l of completely dissolved MAI.PbI 2 .DMSO solution for 3500 rpm for 20 seconds, and the spin coating.
  • 0.3 ml of diethyl ether was slowly dropped to remove excess dimethylformamide to form a CH 3 NH 3 I ⁇ PbI 2 ⁇ DMSO adduct compound film.
  • the CH 3 NH 3 I.PbI 2 .DMSO adduct compound film was heat treated at 65 ° C. for 1 minute and at 100 ° C. for 4 minutes to form a dark brown perovskite film.
  • the substrate was deposited with C 60 (20 nm), BCP (10 nm), LiF (0.5 nm), and Al (150 nm) inside a vacuum thermal evaporator of less than 10 ⁇ 6 Torr. All of the above spin coatings were performed under atmospheric conditions.
  • ITO-based perovskite solar cells In the fabrication of ITO-based perovskite solar cells, the ITO devices used were fabricated on commercially available ITO-coated glass substrates (AMG, 9.5 ⁇ cm 2 , 25 ⁇ 25 mm 2 ).
  • the ITO-coated glass substrate was washed with acetone, isopropanol and deionized water for 15 minutes each using an ultrasonic bath, dried over nitrogen gas, stored in an oven at 120 ° C., and used.
  • the ultra-thin MoO 3 layer having various thicknesses of 0 nm, 1 nm, 2 nm and 4 nm on the washed and dried ITO-coated glass substrate was vacuum-heated at a deposition rate of 0.1 s s -1 using a vacuum thermal evaporator. After evaporation, heat treatment was performed at 150 ° C. for 10 minutes. The deposition rate and thickness during the deposition were monitored using a quartz crystal sensor.
  • the substrate was first soaked in deionized water, and then 50 ⁇ l of PEDOT: PSS solution was spin coated at 5000 rpm for 30 seconds, followed by heat treatment at 150 ° C. for 20 minutes to form a hole transport layer.
  • a perovskite layer was formed on the hole transport layer as an absorber.
  • the perovskite layer is MAI, PbI 2 And dissolving DMSO in a molar ratio of 1: 1: 1 without heating in a 50 wt% DMF solution, followed by spin coating a fully dissolved 50 ⁇ l MAI.PbI 2 .DMSO solution for 3500 rpm for 20 seconds, and spin coating After 8 seconds after the start, 0.3 ml of diethyl ether (DE) was slowly dropped to remove excess dimethylformamide to form a CH 3 NH 3 I ⁇ PbI 2 ⁇ DMSO adduct compound film.
  • DE diethyl ether
  • the NH 3 I.PbI 2 .DMSO adduct compound film was heat treated at 65 ° C. for 1 minute and at 100 ° C. for 4 minutes to form a dark brown perovskite film. Thereafter, the substrate was deposited with C 60 (20 nm), BCP (10 nm), LiF (0.5 nm), and Al (150 nm) inside with a vacuum thermal evaporator of less than 10 ⁇ 6 Torr. All of the above spin coatings were performed under atmospheric conditions.
  • J- V curves were recorded by Keithley 2400 source meter, the forward and reverse scan rates were set to 200 ms per 20 mV and the active area of the device was 1.77 mm 2 .
  • EQE spectra were measured with a Newport IQE200 system with a 300mW Xenon light source and a lock-in amplifier.
  • Sheet resistance was measured using 4 needle method (CMT-SERIES, Advanced Instrument Technology).
  • the transmittance was measured using UV-vis spectroscopy (Cary 5000, Agilent).
  • UPS measurements were made using a helium discharge lamp (He I 21.2 eV, AXIS-NOVA, Kratos), and AFM images were taken using a XE-100 (Park Systems) scanning probe microscope in contactless mode.
  • the wettability of PEDOT: PSS of graphene-based and ITO-based devices is very important for the fabrication of high performance devices, and the contact angle measurements are used to determine the difference in wettability with and without the MoO 3 layer.
  • FIG. 3 shows an optical microscope image of a PEDOT: PSS layer in which water droplets were dropped on the surfaces of graphene and ITO.
  • MoO 3 as shown in FIG. 3A
  • the contact angle of PEDOT: PSS on the layerless graphene surface was measured as 90.4 ⁇ 0.3 °, and as a result, successive PEDOT: PSS / MAPbI 3 layers are unlikely to be formed by the spin-coating process (FIG. 3A inset). ).
  • FIGS. 3B and 3C the contact angle is reduced to 46.6 ⁇ 1.3 ° when there is a 1 nm thick MoO 3 layer on the graphene, and the contact angle is 30.0 ⁇ 1.6 ° when there is a 2 nm thick MoO 3 layer. Shows a decrease. It can be seen in the insets of FIGS. 3b and 3c that the wettability also improved with the reduction in contact angle as described above.
  • MAPbI 3 dark brown MAPbI 3
  • the film was formed into a rectangle in the center of a pre-heat-deposited MoO 3 layer glass substrate, in particular a very clear rectangular model MAPbI 3
  • the film was formed on a 2 nm thick MoO 3 layer and the PEDOT: PSS showed better wetting on a thick MoO 3 layer.
  • Figure 4 is a SEM image, it is not sufficiently covered with a 1nm thick MoO 3 layer, and clearly shows the hydrophobic graphene surface is completely covered with a 2nm thick MoO 3 layer.
  • the contact angle of PEDOT: PSS on the surface of ITO was determined by UV / ozone treatment and MoO 3 as shown in FIGS. 3D-3F. It was measured before and after the combined treatment of the deposition. As a result, similar to graphene.
  • the ITO surface showed no wettability with respect to PEDOT: PSS, which forms a continuous film by spin coating, and the contact angle on the UVO treated ITO surface was significantly from 84.0 ⁇ 1.3 ° (FIG. 3D) to 16.9 ⁇ 1.8 ° (FIG. 3E). Reduced and slightly reduced to 9.3 ⁇ 0.6 ° (FIG. 3F) by the 1 nm thick MoO 3 layer, which means improved wettability of the ITO surface.
  • FIG. 5 shows graphene electrodes of 2 nm thick MoO 3 (FIG. 5A) and 1 nm-thick MoO 3.
  • the SEM image of the device cross section produced using the ITO electrode of is shown.
  • the left image of FIG. 5 was measured in secondary electron (SE) mode and the right image was measured in back-scattered electron (BSE) mode.
  • PEDOT similar thickness ( ⁇ 50 nm) and morphology of graphene, and is formed by spin coating on the ITO: PSS layer of hydrophilic MoO 3 It can be maintained smoothly and continuously by the interfacial layer.
  • the surface of the perovskite film was observed to be very smooth with uniform thickness ( ⁇ 510 nm) on both graphene and ITO base.
  • the smooth and dense perovskite film described above is PbI 2
  • the nip perovskite solar cell which is manufactured through Lewis base adducts and exhibits the highest conversion efficiency of 19.7%, was recently developed by the researchers.
  • the manufacturing method may refer to Korean Patent Application No. 2015-0164744.
  • MAI ⁇ PbI 2 ⁇ DMSO adduct film was formed by spin coating with diethyl ether (DE) dropwise to wash excess dimethylformamide (DMF) solvent and then converted to perovskite film by heat treatment. It became.
  • MoO 3 on device performance To determine the effect of layer thickness, MoO 3 of various thicknesses on graphene and ITO electrodes Open circuit voltage ( V oc ), short circuit current ( J sc ), charge rate (FF), conversion efficiency (PCE) for the perovskite solar cells of Examples 1 to 3 and Comparative Examples 1 to 4, in which layers are used. And the results measured for the highest conversion efficiency is shown in Table 1.
  • Example 1 (G-M1) Graphene One 0.72 ⁇ 0.36 17.6 ⁇ 6.3 0.45 ⁇ 0.09 6.7 ⁇ 4.2 12.1
  • Example 2 (G-M2) 2 1.03 ⁇ 0.02 21.9 ⁇ 0.4 0.72 ⁇ 0.02 16.1 ⁇ 0.6 17.1
  • Example 3 (G-M4) 4 1.00 ⁇ 0.01 22.9 ⁇ 0.4 0.70 ⁇ 0.02 15.9 ⁇ 0.5 16.2
  • Comparative Example 1 (ITO-M0) ITO 0 0.96 ⁇ 0.01 21.4 ⁇ 0.5 0.83 ⁇ 0.02 17.0 ⁇ 0.4 17.6
  • Comparative Example 2 (ITO-M1) One 0.97 ⁇ 0.01 22.6 ⁇ 0.4 0.83 ⁇ 0.01 18.2 ⁇ 0.5 18.8 Comparative Example 3 (ITO-M2) 2 0.95 ⁇ 0.01 22.2 ⁇ 0.4 0.76 ⁇ 0.01 16.1
  • the PEDOT: PSS solution or the perovskite solution forms the film after the spin coating because the device that does not deposit the MoO 3 layer does not wet the hydrophobic graphene surface.
  • PCE could not be evaluated (see also FIG. 3A insertion).
  • PEDOT: PSS were by irregular coating of PCE represents a large change in the 0% ⁇ 12.1%, 1nm thick
  • JV current density and voltage
  • Example 2 has a layer significantly reduced the performance variation between devices with average PCE values of 16.1% and 15.9%, respectively (FIGS. 6A and 7B).
  • the highest PCE of 17.1% was achieved in Example 2, which is the first achievement for graphene electrode perovskite-based solar cells replacing ordinary TCO electrodes, as well as the highest conversion efficiency among TCO-free solar cells. It represents.
  • PCE was significantly affected by MoO 3 thickness change. Comparing the electrode of Comparative Example 1 with the electrode of Comparative Example 2, the average PCE increased from 17.0% to 18.2%, and the average PCE of Comparative Example 3 and Comparative Example 4 having a MoO 3 layer thicker than 1 nm was 16.1% and Decreased to 14.7%.
  • FIG. 8 shows a histogram of PCE for each electrode type of Example 2 and Comparative Example 2.
  • Example 2 and Comparative Example 2 The highest performance JV curves of Example 2 and Comparative Example 2 at 100 mW cm 2 AM 1.5G one solar irradiation, measured via reverse and forward bias sweeps, are shown in FIGS. 6C and 6D, respectively. Neither Example 2 nor Comparative Example 2 showed significant hysteresis along the scan direction.
  • Example 2 showed high series resistance and low shunt resistance.
  • sheet resistance was measured by a four-point probe. 6E shows the relationship between sheet resistance and the thickness of the MoO 3 layer in graphene and ITO. As shown, the yes, the initial high sheet resistance (> 2 k ⁇ cm 2) only were significantly reduced to ⁇ 780 ⁇ cm 2 by the deposition of MoO 3 layer 0.5 nm thick, the thickness of the MoO 3 layer of the pin As it increased to 2 nm, it further decreased to ⁇ 500 ⁇ cm 2 .
  • Example 2 showed the results of the high series resistance, low shunt resistance and low filling rate (FF) for Comparative Example 2.
  • the single atomic thickness single layer graphene ( ⁇ 97% transmittance) exhibits high transparency in the visible wavelength range compared to ITO ( ⁇ 89% transmittance), and Example 2 device is compared with Comparative Example 2 device.
  • Short-circuit current ( J sc ) level is shown.
  • Example 8 shows an external quantum efficiency (EQE) spectrum of Example 2 and Comparative Example 2.
  • FIG. The integrated photocurrent was calculated above at 20.2 and 21.0 mA cm ⁇ 1 , respectively.
  • the EQE of graphene- and TIO-based devices is similar because the low carrier collection efficiency of the graphene anode is compensated for by higher light transmittance (FIGS. 6F and 9).
  • Example 2 shows a high open voltage (V oc ) level compared to Comparative Example 2, and the result contributes to the high PCE of Example 2 ( 90% or more than Comparative Example 2.
  • FIG. 10A 0.5 nm thick MoO 3
  • the deposition of the layer rapidly shifted to high kinetic energy due to the blocking of the secondary battery of ITO.
  • the work function increased from 4.29 eV to 4.65 eV.
  • MoO 3 Further deposition of the layers to 1 nm and 2 nm thickness raised the work function to 4.69 eV and 4.72 eV, respectively. Therefore, it is desirable to minimize the energy barrier between the anode and the hole transport layer (HTL) for efficient hole collection.
  • HTL hole transport layer
  • Comparative Example 2 As shown in Table 1, the high J sc and PCE of Comparative Example 2 compared to Comparative Example 1 is due to an increase in the work function of the center electrode leading to improved hole trapping efficiency. Meanwhile, MoO 3 PCE decreased as the thickness of the layer increased to 2 nm and 4 nm. Thin MoO 3 between ITO and Organic Semiconductor in Device Structure The layer behaves like an insulating layer and the holes are moO 3 due to the tunnel effect, which is a gradual reduction of films thicker than ⁇ 3 nm. Can pass through layers.
  • the hole collection efficiency of Comparative Examples 3 and 4 is likely to be improved by an increase in the work function of the electrode, but may be reduced by a decrease in the tunneling probability of the major due to a sudden decrease in FF and PCE compared to Comparative Example 2.
  • the ultra-thin MoO 3 layer deposited on graphene not only promoted hole collection from the hole transport layer to the graphene anode by reducing the energy barrier at the interface, but also hydrophobic graphene
  • Successful spin coating of PEDOT: PSS film on the surface was made possible.
  • Comparing UPS data from ITO and graphene electrodes shows the same MoO 3
  • the work function for thickness was found to be nearly identical.
  • the work function values of Comparative Example 2 and Example 2 were also not significantly different. This means that higher V oc of Example 2 than Comparative Example 2 is not accounted for in terms of energy barrier differences at the anode / HTL interface.
  • V oc can be affected by interface quality
  • MoO 3 by atomic force microscopy (AFM) measurements
  • AFM atomic force microscopy
  • Comparative Example 1 As shown in Figs. 11A to 11F, the root-mean-square roughnesses of Comparative Example 1, Comparative Example 2, and Comparative Example 2 / PEDOT: PSS were found to be 2.06, 1.95, and 1.2, respectively, and Example 2 It was confirmed that the roughness of exhibits a surface rms roughness of 0.29 nm, which is 6 times lower than that of Comparative Example 2 (1.95 nm rms roughness).
  • Comparative Example 2 / PEDOT: PSS means having a MoO 3 layer having the same thickness as Comparative Example 2 and further having a PEDOT: PSS layer.
  • Example 2 / PEDOT: PSS can also be interpreted in an equivalent sense.
  • the surface roughness of the underlying layer is smaller, so that when V oc increases, a better interface can be created between the stacks.
  • the electrode of Example 2 which contributes to the high V oc of Example 2 appears to have established a better PEDOT: PSS interface than the Comparative Example 2 / PEDOT: PSS interface.
  • Example 2 in the SEM image of the perovskite surface on Example 2 / PEDOT: PSS and Comparative Example 2 / PEDOT: PSS was shown. It was confirmed that the larger.
  • Example 2 Since the nano-scale edges of the surface can function as nucleation sites, the surface roughness of the underlying layer plays an important role in determining the particle size of PEDOT: PSS in this study.
  • the particles of the perovskite film on the smooth surface of Example 2 / PEDOT: PSS can grow to a larger size than the particles of the surface of Comparative Example 2 / PEDOT: PSS.
  • the larger particles of Example 2 reduced the voltage loss due to charge recombination at the particle boundary. Thus, it is given as a factor that gives a higher V oc in Example 2 compared to Comparative Example 2.
  • the present invention not only uses graphene as a transparent conductive anode but also provides a high efficiency TCO-free solar cell.
  • MoO 3 introduced to the anode surface of the solar cell of the present invention The layers form a better interface and allow for the alignment of the desired energy levels between the anode and the hole transport layer.
  • MoO 3 on graphene Deposition serves a better role as a conductive electrode and provides optimum MoO 3 In layer thickness, the highest PCE of 17.1% and 18.8% was achieved for graphene based devices and ITO based devices, respectively.
  • Graphene electrodes have low conductivity compared to ITO electrodes, but have similar J sc , high V oc and high transparency and low surface roughness.

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Abstract

The present invention relates to a perovskite-based solar cell using graphene as a conductive transparent electrode. The perovskite-based solar cell has improved peak efficiency through an appropriate energy band combination of a graphene electrode/hole transfer layer/perovskite/electron transfer layer/metal electrode, and may represent 17% or more of the conversion efficiency value.

Description

그래핀을 전도성 투명전극으로 사용하는 페로브스카이트 기반 태양전지Perovskite based solar cell using graphene as conductive transparent electrode

본 발명은 태양전지를 포함하는 에너지소자에 관한 것으로, 더욱 상세하게는 깨짐성이 있는 기존의 ITO 및 FTO 투명전도성산화물 전극을 플렉시블한 그래핀 전극으로 대체하고 페로브스카이트를 흡수체로 사용하는 태양 전지에 관한 것이다.The present invention relates to an energy device including a solar cell, and more particularly, to replace an existing ITO and FTO transparent conductive oxide electrode which is fragile with a flexible graphene electrode and to use perovskite as an absorber. It relates to a battery.

유기/무기 복합 페로브스카이트는 높은 흡수 계수(high absorption coefficient), 균형 잡힌 전자/정공 이동, 저온 처리의 가능, 작은 엑시톤 결합 에너지 및 유기 반도체 재료보다 긴 엑시톤 확산 길이에 의해 태양전지의 광활성층에 사용되는 유망한 재료이다. 높은 성능의 페로브스카이트 태양전지는 일반적으로 TiO2 또는 Al2O3 와 같은 금속산화물/페로브스카이트 재료/정공 수송 재료로 이루어지는 n-i-p 구조(n-i-p architecture)를 채용한다. 하지만, 금속 산화물 박막의 제조를 위한 450℃ 이상의 고온공정에 의해 기판의 선택이 제한되고, 이러한 제한으로 인해 제조비용이 상승된다. 금속 산화물 층에 대한 대안으로 사용된 유기 재료는 일반적인 n-i-p 구조 뿐만 아니라 p-i-n 구조의 페로브스카이트 태양전지에도 활용되어 왔다. 통상 용액처리가 가능한 폴리(3, 4-에틸렌디옥시티오펜):폴리(스티렌술폰산)(PEDOT:PSS) 및 [6, 6]-페닐 C61-부티르산 메틸 에스테르(PCBM)은 각각 정공수송층(HTL) 및 전자수송층(ETL)에 사용되어 왔다. 최근 들어, 인듐 주석 산화물(ITO)/PEDOT:PSS/CH3NH3PbI3(MAPbI3)/PCBM/금(Au)을 포함하는 p-i-n 소자에 의해 18.1% PCE(power conversion efficiency)가 달성되었으나, 이는 전자수송층(ETL)으로 스케폴드 금속 산화물을 사용하여 근래에 20% 이상의 효율을 보이는 n-i-p소자와 비교하여 여전히 낮은 수치이다. 그럼에도 불구하고, p-i-n 페로브스카이트 태양전지는 낮은 이력거동(hysteresis behavior), 낮은 가공온도 및 용이한 제조공정 등의 장점에 의해 많이 연구되고 있다. Organic / inorganic composite perovskite has a high absorption coefficient, balanced electron / hole transport, low temperature treatment, small exciton binding energy and longer exciton diffusion lengths than organic semiconductor materials, resulting in a photoactive layer of the solar cell. It is a promising material used. High performance perovskite solar cells typically employ a nip architecture consisting of metal oxide / perovskite material / hole transport material such as TiO 2 or Al 2 O 3 . However, the selection of the substrate is limited by the high temperature process of 450 ° C. or higher for the manufacture of the metal oxide thin film, and the manufacturing cost is increased due to this limitation. Organic materials used as an alternative to metal oxide layers have been utilized in pin-type perovskite solar cells as well as common nip structures. Poly (3,4-ethylenedioxythiophene): poly (styrenesulfonic acid) (PEDOT: PSS) and [6, 6] -phenyl C61-butyric acid methyl ester (PCBM), which are usually solution-processable, are each a hole transport layer (HTL). And electron transport layers (ETLs). Recently, 18.1% power conversion efficiency (PCE) has been achieved by a pin device comprising indium tin oxide (ITO) / PEDOT: PSS / CH 3 NH 3 PbI 3 (MAPbI 3 ) / PCBM / Au. This is still low compared to the nip device which shows efficiency of 20% or more in recent years by using a scaffold metal oxide as the electron transport layer (ETL). Nevertheless, pin perovskite solar cells have been studied for their advantages such as low hysteresis behavior, low processing temperature and easy manufacturing process.

저온공정을 활용한 p-i-n 구조의 플렉시블 페로브스카이트 기판 태양전지의 경우 주로 PEN (polyethylene naphthalate) 필름에 ITO를 코팅하여 전극으로 사용하며, 현재까지 최고 12.2%의 효율을 보였으나, 반복적인 휘어짐에 의한 태양전지의 효율 감소가 기계적 취성이 큰 ITO 층의 깨짐성에서 기인한 것으로 보고된다. 한편, 유기태양전지분야(OPV)에서는 가요성 태양전지에 적용 가능한, 부서지기 쉬운 TCO(transparent conducting oxide)의 대체물로서 그래핀, 탄소나노튜브, 금속격자 및 전도성 중합체와 같은 플렉시블 전도성 전극에 대해 이미 많이 연구되어 왔다. 그 중에서, 광학적으로 매우 투명(가시 영역에서 약 97%)하고, 기계적으로 견고하며, 유연함 및 신축성을 가지는 그래핀 및 단일층 2D 탄소 재료는 가장 유망한 후보이다. 종래 기술에는 연료감응형 태양전지나 유기태양전지에 그래핀이 전도성 투명전극으로서 활용된 예가 있고, 현재까지 보고된 그래핀 투명전극을 사용한 태양전지 중에는 탠덤 폴리머 태양전지에서 최고 효율인 8.48%가 얻어졌으나 탠덤 형태의 해당 구조는 구성층의 개수가 많아 공정상 불리함이 있고, 여전히, PCE 11.0%를 보여주는 TCO-프리 페로브스카이트 태양전지 보다 낮다. 최근 연구에서 페로브스카이트 소자에 그래핀 전극이 사용된 예가 있지만, 이들 연구에서 그래핀은 종래의 TCO 전극의 대체물로 사용된 것이 아니라, 상부 전극으로 사용되었을 뿐이다.In the case of a pin structure flexible perovskite substrate solar cell using a low temperature process, ITO is mainly coated on polyethylene naphthalate (PEN) film and used as an electrode, and has shown an efficiency of up to 12.2% up to now. It is reported that the decrease in efficiency of the solar cell is due to the breakability of the ITO layer having high mechanical brittleness. On the other hand, in the field of organic solar cell (OPV), flexible conductive electrodes such as graphene, carbon nanotubes, metal lattice and conductive polymers are already being used as a substitute for brittle transparent conducting oxide (TCO) applicable to flexible solar cells. Much has been studied. Among them, graphene and single layer 2D carbon materials, which are optically very transparent (about 97% in the visible region), mechanically robust, flexible and stretchable, are the most promising candidates. In the prior art, there is an example in which graphene is used as a conductive transparent electrode in a fuel-sensitized solar cell or an organic solar cell. Among the solar cells using a graphene transparent electrode reported so far, 8.48% of the highest efficiency is obtained in tandem polymer solar cells. This tandem type of structure is disadvantageous due to the large number of constituent layers, and is still lower than TCO-free perovskite solar cells showing PCE 11.0%. There are examples of graphene electrodes used in perovskite devices in recent studies, but in these studies, graphene was used as the top electrode, not as a replacement for conventional TCO electrodes.

최근 플렉시블 기판에 형성한 태양전지가 차세대 태양전지 기술의 주요한 개발 분야로 주목받고 있다. 플렉시블 태양전지의 안정적인 작동을 위해서는 깨짐성이 적은 물질로 태양전지의 구성층을 형성해야 한다. 태양전지에 널리 사용되는 전도성 투명전극은 ITO(indium tin oxide)나 FTO(fluorine doped tin oxide)의 전도성 투명산화물이다. 그러나 해당 물질은 깨짐성이 커서 태양전지의 반복적인 휘어짐에 따라 태양전지의 효율 저하의 원인으로 작용하게 된다. Recently, a solar cell formed on a flexible substrate is attracting attention as a major development field of the next generation solar cell technology. For stable operation of the flexible solar cell, it is necessary to form a constituent layer of the solar cell with a less fragile material. The conductive transparent electrode widely used in solar cells is a conductive transparent oxide of indium tin oxide (ITO) or fluorine doped tin oxide (FTO). However, the material is fragile, and as the solar cell repeatedly bends, it causes a decrease in efficiency of the solar cell.

그래핀은 전도성 투명산화물에 비해서 전도성이 낮지만 쉽게 구할 수 있는 물질이며 빛 투과도 및 기계적 강도, 플렉시블성이 우수한 특성이 있어 플렉시블 투명전극의 대체 물질로서 기대를 받고 있다.Graphene is less conductive than conductive transparent oxides, but is a readily available material, and has excellent characteristics in light transmittance, mechanical strength, and flexibility.

유기금속 할로겐화물 페로브스카이트 물질은 빛 흡수도 및 전하 이동도가 높아서 최근 3세대 태양전지의 효율 증가에 있어서 큰 도약을 가져왔으며(20% 이상의 효율 달성), 약 500nm의 박막으로 플렉시블 태양전지에 활용되기에 적합하다.The organometallic halide perovskite material has a high leap forward in the efficiency increase of 3rd generation solar cells due to its high light absorption and charge mobility (at least 20% efficiency). Suitable for use in

본 발명에서는 상기와 같은 종래 기술의 단점을 극복하기 위하여, 깨짐성이 있는 기존의 ITO 및 FTO 투명전도성 산화물 전극을 유연성이 있는 그래핀 전극으로 대체하고 페로브스카이트를 흡수체로 사용하는 태양전지 및 그 제조 방법을 제공하는 것을 목적으로 한다.In the present invention, in order to overcome the disadvantages of the prior art as described above, the solar cell using a permeate of the perovskite and replace the conventional ITO and FTO transparent conductive oxide electrode with a flexible and flexible graphene electrode and It aims at providing the manufacturing method.

상기 목적을 달성하기 위하여, 본 발명은 그래핀층을 전도성 투명전극으로 포함하는 페로브스카이트 기반 태양전지를 제공한다.In order to achieve the above object, the present invention provides a perovskite-based solar cell comprising a graphene layer as a conductive transparent electrode.

상기 그래핀층으로 이루어진 전도성 투명 전극이 투명 전면 전극일 수 있다. The conductive transparent electrode made of the graphene layer may be a transparent front electrode.

또한, 상기 태양전지는 기판 상에 그래핀층으로 이루어진 투명 애노드 전극, 정공수송층, 페로브스카이트층, 전자수송층 및 캐소드 전극이 순차적으로 적층되어 있는 것일 수 있다. In addition, the solar cell may be one in which a transparent anode electrode, a hole transport layer, a perovskite layer, an electron transport layer and a cathode electrode made of a graphene layer are sequentially stacked on a substrate.

또한, 상기 태양전지는 기판상에 그래핀층으로 이루어진 투명 캐소드 전극, 전자수송층, 페로브스카이트층, 정공수송층 및 애노드 전극이 순차적으로 적층되어 있는 것일 수 있다.In the solar cell, a transparent cathode electrode, an electron transport layer, a perovskite layer, a hole transport layer, and an anode electrode made of a graphene layer may be sequentially stacked on a substrate.

또한, 상기 태양전지는 상기 그래핀층으로 이루어진 투명 애노드 전극 또는 투명 캐소드 전극 상에 증착된 금속산화물층을 더 포함하는 것일 수 있다.In addition, the solar cell may further include a metal oxide layer deposited on the transparent anode electrode or the transparent cathode electrode made of the graphene layer.

상기 금속 산화물층은 MoO3, NiO, CoO 및 TiO2 로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 것일 수 있다.The metal oxide layer is MoO 3 , NiO, CoO and TiO 2 It may be to include one or more selected from the group consisting of.

상기 금속산화물층의 두께는 약 0.5 nm 내지 약 6 nm 인 것일 수 있다.The metal oxide layer may have a thickness of about 0.5 nm to about 6 nm.

상기 페로브스카이트는 할로겐화 납 어덕트 화합물을 이용한 페로브스카이트 소자인 것일 수 있다.The perovskite may be a perovskite device using a lead halide adduct compound.

상기 할로겐화 납 어덕트 화합물은 하기 화학식 1로 표시되는 것일 수 있다.The lead halide adduct compound may be represented by Formula 1 below.

[화학식 1][Formula 1]

A·PbY2·QA PbY · 2 · Q

상기 식에 있어서,In the above formula,

A는 유기 할라이드 화합물 또는 무기 할라이드 화합물이며,A is an organic halide compound or an inorganic halide compound,

Y는 F-, Cl-, Br- 또는 I- 의 할로겐 이온이고,Y is F - is a halogen ion, -, Cl -, Br - or I

Q는 비공유 전자쌍을 갖는 원자를 전자쌍 주개로 하는 작용기를 포함하는 루이스 염기(Lewis base) 화합물이고, 상기 작용기의 FT-IR의 피크가 하기 화학식 2의 화합물보다 화학식 1의 화합물에서 1~10 cm-1 만큼 적색 이동(red shift)되어 나타나며,Q is a Lewis base compound containing a functional group having an electron-pair donor as an atom having a non-covalent electron pair, and the peak of the FT-IR of the functional group is 1 to 10 cm - from the compound of Formula 1 to the compound of Formula 2 below. Red shifted by 1 appears,

[화학식 2][Formula 2]

PbY2·QPbY 2 · Q

상기 Y 및 Q는 화학식 1에 대해 정의된 것과 동일하다.Y and Q are the same as defined for the formula (1).

상기 A가 CH3NH3I, CH(NH2)2I 또는 CsI일 수 있다.A may be CH 3 NH 3 I, CH (NH 2 ) 2 I or CsI.

상기 페로브스카이트는 어덕트 화합물을 가열 및 건조하여 어덕트 화합물에 포함된 루이스 염기 화합물을 제거하는 방법으로 만들어진 것일 수 있다.The perovskite may be made by heating and drying the adduct compound to remove the Lewis base compound included in the adduct compound.

본 발명은 그래핀을 전도성 투명전극으로 사용한 페로브스카이트 기반 태양전지를 성공적으로 구현하였고, 그래핀 전극/정공수송층/페로브스카이트/전자수송층/금속 전극의 적절한 에너지 밴드 조합을 통하여 최고 효율 17.1%를 달성하였다. 이는 현재까지 보고된 그래핀 전극 기반 태양전지 효율 중에 최고 효율이며, 그래핀 전극 이외에 ITO나 FTO 등의 투명전도성 산화물 전극을 대체하기 위한 다른 투명전도성 전극(금속 박막 또는 PEDOT:PSS 등의 전도성 유기물)을 활용한 태양전지 사례 중에서도 최고 효율이다. 또한 본 발명의 구조를 그래핀이 코팅된 PET, PEN 등의 폴리머 기판 위에 형성하면 고효율 플렉시블 태양전지 구현은 물론 기존 ITO 전극과 달리 반복적인 휘어짐에도 효율 감소가 적을 것으로 기대되며, 페로브스카이트 기반 광전자소자(예를 들어 광센서 및 발광다이오드) 및 페로브스카이트 기반 메모리 소자에 있어서 플렉시블 소자 개발에 이용 할 수 있을 것으로 기대된다.The present invention has successfully implemented a perovskite-based solar cell using graphene as a conductive transparent electrode, and has the highest efficiency through proper energy band combination of graphene electrode / hole transport layer / perovskite / electron transport layer / metal electrode. 17.1% was achieved. This is the highest efficiency of graphene electrode-based solar cell efficiency reported so far, and other transparent conductive electrodes (metal thin films or conductive organic materials such as PEDOT: PSS) to replace transparent conductive oxide electrodes such as ITO and FTO in addition to graphene electrodes. It is the highest efficiency among the solar cell using. In addition, if the structure of the present invention is formed on a polymer substrate of graphene-coated PET, PEN, etc., high efficiency flexible solar cell is expected to be less efficient in repetitive bending as well as the existing ITO electrode. It is expected to be used for the development of flexible devices in optoelectronic devices (for example, optical sensors and light emitting diodes) and perovskite-based memory devices.

도 1은 본 발명에 따라 그래핀을 전도성 투명전극으로 사용하는 페로브스카이트 기반 태양전지의 전환효율(PCE)를 보여주는 그래프이다. 1 is a graph showing conversion efficiency (PCE) of a perovskite-based solar cell using graphene as a conductive transparent electrode according to the present invention.

도 2는 그래핀을 전도성 투명전극으로 사용하는 페로브스카이트 기반 태양전지의 개략도이다.2 is a schematic diagram of a perovskite-based solar cell using graphene as a conductive transparent electrode.

도 3은 각각 (a) 그래핀, (b)1 nm MoO3 증착 그래핀, (c) 2 nm MoO3 로 증착 그래핀, (d) ITO, (e) UVO 처리된 ITO 및 (f) UVO 처리 후에 1nm MoO3 로 덮여진 ITO 상의 PEDOT:PSS 액적을 나타낸다.Figure 3 shows (a) graphene, (b) 1 nm MoO 3 deposited graphene, (c) 2 nm MoO 3 deposited graphene, (d) ITO, (e) UVO treated ITO and (f) UVO PEDOT: PSS droplets on ITO covered with 1 nm MoO 3 after treatment.

도 4는 (a) 그래핀 (b) 그래핀/1 nm MoO3 (c) 그래핀/2 nm MoO3 의 SEM 이미지를 나타낸다(스케일 바 100 nm).Figure 4 is (a) graphene (b) graphene / 1 nm MoO 3 (c) SEM image of graphene / 2 nm MoO 3 is shown (scale bar 100 nm).

도 5는 (a) 그래핀/2 nm MoO3 전극 및 (b) ITO/ 1 nm MoO3 전극을 가지는 소자의 단면의 SE 모드(좌) 및 BSE 모드(우)로 측정된 SEM 이미지를 나타낸다.5 is (a) graphene / 2 nm MoO 3 Electrode and (b) ITO / 1 nm MoO 3 SEM images measured in SE mode (left) and BSE mode (right) of the cross section of the device with electrodes are shown.

도 6은 (a) 그래핀 전극 및 (b) ITO 전극의 MoO3 두께와 평균 PCE와의 관계를 나타내는 그래프, (c) 실시예 2 및 (d) 비교예 2 소자의 최고성능을 나타내는 J-V 곡선, (e) 그래핀 및 ITO의 시트 저항과 MoO3 두께와의 관계, (f) 2 nm 두께 MoO3 층을 포함하거나 포함하지 않는 그래핀 및 ITO의 투과율을 나타낸다.6 is a graph showing the relationship between MoO 3 thickness and average PCE of (a) graphene electrode and (b) ITO electrode, (c) JV curve showing the highest performance of Example 2 and (d) Comparative Example 2 device, (e) the relationship between sheet resistance and MoO 3 thickness of graphene and ITO, and (f) the transmittance of graphene and ITO with or without 2 nm thick MoO 3 layer.

도 7은 측정된 (a) 실시예 1 및 (b) 실시예 2의 J-V 커브를 나타낸다.7 shows the measured JV curves of (a) Example 1 and (b) Example 2. FIG.

도 8은 실시예 2 및 비교예 2 전극의 PCE 히스토그램을 나타낸다.8 shows PCE histograms of the Example 2 and Comparative Example 2 electrodes.

도 9는 (a) 실시예 2 및 (b) 비교예 2 전극의 최고 성능에서의 EQE 스펙트럼(검은선) 및 J cs (푸른선)를 나타낸다.9 shows EQE spectra (black lines) and J cs (blue lines) at the highest performance of (a) Example 2 and (b) Comparative Example 2 electrodes.

도 10은 2 nm 두께 MoO3층을 포함하거나 포함하지 않는 유리/그래핀 및 유리/ITO의 투과도를 나타낸다.10 shows the transmission of glass / graphene and glass / ITO with or without a 2 nm thick MoO 3 layer.

도 11은 여러 두께의 MoO3 층을 포함하는 (a) ITO 및 (b) 그래핀의 UPS 스펙트럼 및 계산된 일 함수를 나타내며, (c) 구조의 개략적인 에너지 수준을 나타내는 도면이다.11 is MoO 3 of various thickness A diagram showing the UPS spectrum and calculated work function of (a) ITO and (b) graphene, including layers, and (c) a schematic energy level of the structure.

도 12는 (a) 그래핀, (b) 실시예 2, (c) 실시예 2/PEDOT:PSS, (d) 비교예 1, (e) 비교예 2 및 (f) 비교예 2/PEDOT:PSS 의 AFM 화상이미지(3μm ×3 μm)를 나타낸다.12 shows (a) graphene, (b) Example 2, (c) Example 2 / PEDOT: PSS, (d) Comparative Example 1, (e) Comparative Example 2 and (f) Comparative Example 2 / PEDOT: An AFM image (3 μm × 3 μm) of the PSS is shown.

도 13은 (a) 실시예 2/PEDOT:PSS 및 (b) 비교예 2/PEDOT:PSS 상에 제작된 MAPbI3 페로브스카이트 필름의 평면 SEM 이미지를 나타낸다. (c) 및 (d)는 (a) 및 (b)의 높은 배율 이미지를 나타낸다.FIG. 13 shows planar SEM images of MAPbI 3 perovskite films prepared on (a) Example 2 / PEDOT: PSS and (b) Comparative Example 2 / PEDOT: PSS. (c) and (d) show high magnification images of (a) and (b).

도 14 (a)는 DMSO(용액), PbI2·DMSO(분말) 및 MAI·PbI2·DMSO(분말)의 FT-IR스펙트럼이고, (b) MAI·PbI2·DMSO(분말)과 FAI·PbI2·DMSO(분말)의 FT-IR 스펙트럼을 비교한 것 이다.(A) is FT-IR spectrum of DMSO (solution), PbI 2 DMSO (powder) and MAI PbI 2 DMSO (powder), (b) MAI PbI 2 DMSO (powder) and FAI This is a comparison of the FT-IR spectra of PbI 2 DMSO (powder).

도 15는 PbI2·TU(분말) 및 FAI·PbI2·TU(분말)의 FT-IR 스펙트럼이다.15 is an FT-IR spectrum of PbI 2 · TU (powder) and FAI · PbI 2 · TU (powder).

본 발명은 다양한 변환을 가할 수 있고 여러 가지 실시예를 가질 수 있는바, 특정 실시예들을 도면에 예시하고 상세한 설명에서 상세하게 설명하고자 한다. 그러나 이는 본 발명을 특정한 실시 형태에 대해 한정하려는 것이 아니며, 본 발명의 사상 및 기술 범위에 포함되는 모든 변환, 균등물 내지 대체물을 포함하는 것으로 이해되어야 한다. 본 발명을 설명함에 있어서 관련된 공지의 기술에 대한 구체적인 설명이 본 발명의 요지를 흐릴 수 있다고 판단되는 경우 그 상세한 설명을 생략한다.As the invention allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the written description. However, this is not intended to limit the present invention to specific embodiments, it should be understood to include all transformations, equivalents, and substitutes included in the spirit and scope of the present invention. In the following description of the present invention, if it is determined that the detailed description of the related known technology may obscure the gist of the present invention, the detailed description thereof will be omitted.

이하에서 본 발명을 구체적으로 설명한다.Hereinafter, the present invention will be described in detail.

본 발명은 그래핀층을 전도성 투명전극으로 포함하는 페로브스카이트 기반 태양전지를 제공한다.The present invention provides a perovskite-based solar cell comprising a graphene layer as a conductive transparent electrode.

바람직한 구현예에 따르면, 상기 그래핀층으로 이루어진 전도성 투명 전극이 투명 전면 전극일 수 있다. According to a preferred embodiment, the conductive transparent electrode made of the graphene layer may be a transparent front electrode.

또한, 상기 태양전지는 기판 상에 그래핀층으로 이루어진 투명 애노드 전극, 정공수송층, 페로브스카이트층, 전자수송층 및 캐소드 전극이 순차적으로 적층되어 있는 것일 수 있다. In addition, the solar cell may be one in which a transparent anode electrode, a hole transport layer, a perovskite layer, an electron transport layer and a cathode electrode made of a graphene layer are sequentially stacked on a substrate.

또한, 상기 태양전지는 기판상에 그래핀층으로 이루어진 투명 캐소드 전극, 전자수송층, 페로브스카이트층, 정공수송층 및 애노드 전극이 순차적으로 적층 되어 있는 것일 수 있다.In the solar cell, a transparent cathode electrode, an electron transport layer, a perovskite layer, a hole transport layer, and an anode electrode made of a graphene layer may be sequentially stacked on a substrate.

본 발명의 실시예에 따르면, 기판 상에 투명 애노드 전극, 정공주입층(금속산화물층), 정공수송층, 페로브스카이트층, 전자수송층 및 캐소드 전극이 순차적으로 적층되어 있는 태양전지가 제공된다. According to an embodiment of the present invention, there is provided a solar cell in which a transparent anode electrode, a hole injection layer (metal oxide layer), a hole transport layer, a perovskite layer, an electron transport layer and a cathode electrode are sequentially stacked on a substrate.

여기서, 그래핀은 2차원 탄소 동소체로서, 이를 제조하는 방법에는 흑연(graphite)에서 물리적으로 그래핀 한 층을 분리하는 박리법, 흑연을 분산액에 분산시켜서 화학적으로 환원시켜 그래핀을 획득하는 화학적 산화/환원법, 탄화규소(SiC) 기판에서 고온의 열분해를 통해서 그래핀층을 얻는 열분해법, 및 화학기상증착법이 있으며, 이 중에서 화학기상증착법이 고품질의 그래핀을 합성할 수 있는 방법으로서 예시할 수 있다. 제한되는 것은 아니지만, 화학증착 방법에 의해 제조된 그래핀이 바람직하다. 본 실시예에서는 단일층 그래핀을 사용하였으나 이에만 한정한 것은 아니며 다층 그래핀도 사용 가능하다Here, graphene is a two-dimensional carbon allotrope, and a method of manufacturing the same is a peeling method for physically separating a layer of graphene from graphite, and chemical oxidation to obtain graphene by dispersing the graphite in a dispersion and chemically reducing it. / Reduction method, pyrolysis method of obtaining graphene layer through high temperature pyrolysis on silicon carbide (SiC) substrate, and chemical vapor deposition method, among which chemical vapor deposition can be exemplified as a method for synthesizing high quality graphene. . Although not limited, graphene prepared by a chemical vapor deposition method is preferred. In this embodiment, a single layer graphene is used, but not limited thereto, and multilayer graphene may also be used.

그래핀층의 두께는 0.01 내지 35 nm 일 수 있으며, 바람직하게는 0.01 내지 3.5 nm 일 수 있으며, 더욱 바람직하게는 0.01 내지 0.35 nm일 수 있다.The thickness of the graphene layer may be 0.01 to 35 nm, preferably 0.01 to 3.5 nm, more preferably 0.01 to 0.35 nm.

일 구현예에 따르면, 상기 그래핀은 형상 종횡비가 0.1 이하, 그래핀 층수가 100 이하 및 비표면적인 300 m2/g 이상의 특성을 나타낼 수 있다. 상기 그래핀은 흑연의 hcp 구조에서 탄소(C)의 SP2 결합의 단일 망목면을 말하며, 최근에는 복수의 층수를 가지는 그래핀 복합 층도 광의의 뜻에서 그래핀으로 분류하고 있다. According to one embodiment, the graphene may exhibit a characteristic aspect ratio of 0.1 or less, graphene layer number of 100 or less, and a specific surface area of 300 m 2 / g or more. The graphene refers to a single mesh plane of SP 2 bonds of carbon (C) in graphite hcp structure, and recently, graphene composite layers having a plurality of layers are also classified as graphene in a broad sense.

그래핀을 기판에 전사하는 방법은 특별히 제한되지 않으며, 업계에 알려져 있는 일반적인 방법에 따르므로 상세하게 설명하지 않는다. The method of transferring the graphene to the substrate is not particularly limited and will not be described in detail because it follows a general method known in the art.

본 발명에 따르면, 투명 캐소드 전극(그래핀층) 상에 직접 전자수송층을 형성하거나, 투명 애노드 전극(그래핀층) 상에 직접 정공수송층을 형성할 수도 있지만, 그래핀층 상에 금속산화물층을 증착하는 것도 가능하다. 이때 그래핀층이 투명 애노드 전극인 경우에는 금속산화물층이 정공주입층으로서 작용하고, 그래핀층이 투명 캐소드 전극인 경우에는 금속산화물층이 전자주입층으로 작용할 수 있다. According to the present invention, an electron transport layer may be directly formed on the transparent cathode electrode (graphene layer), or a hole transport layer may be directly formed on the transparent anode electrode (graphene layer), but a metal oxide layer may be deposited on the graphene layer. It is possible. In this case, when the graphene layer is a transparent anode electrode, the metal oxide layer may serve as a hole injection layer, and when the graphene layer is a transparent cathode electrode, the metal oxide layer may serve as an electron injection layer.

일 실시예에 따르면, 그래핀층이 습윤성을 갖도록 하기 위하여 금속산화물층을 증착할 수 있다. 상기 금속 산화물층은 MoO3, NiO, CoO 및 TiO2 로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 것일 수 있으나 이들로 한정되는 것은 아니며 관련 기술분야에서 공지된 물질이라면 제한 없이 사용할 수 있다. 상기 금속산화물층의 두께는 약 0.5 nm 내지 약 6 nm 인 것일 수 있다.According to one embodiment, the metal oxide layer may be deposited to make the graphene layer wettable. The metal oxide layer is MoO 3 , NiO, CoO and TiO 2 It may include one or more selected from the group consisting of, but is not limited thereto, and any material known in the art may be used without limitation. The metal oxide layer may have a thickness of about 0.5 nm to about 6 nm.

바람직하게는 약 1 nm 내지 약 6nm, 더욱 바람직하게는 약 1 nm 내지 약 4 nm, 더욱 더 바람직하게는 약 2 내지 3nm 일 수 있다.Preferably from about 1 nm to about 6 nm, more preferably from about 1 nm to about 4 nm, even more preferably from about 2 to 3 nm.

한편, 정공수송층은 폴리(3,4-에틸렌디옥시티오펜)폴리스티렌술폰(PEDOT:PSS); 테트라플루오로-테트라시아노-퀴노디메탄(CuPc: F4-TCNQ); 및 PEDOT:PSS에 텅스텐 옥사이드(WOx), 그래핀 옥사이드(GO), 탄소나노튜브(CNT), 몰리브덴 옥사이드(MoOx), 바나듐 옥사이드(V2O5) 및 니켈 옥사이드(NiOx)를 포함하는 그룹에서 선택된 하나 이상이 블렌딩된 것으로부터 선택되는 것일 수 있으나 이에 한정되지 않고, 업계에서 사용되는 물질이면 한정되지 않고 사용할 수 있다. 예를 들면, 정공전달 단분자 물질 또는 정공전달 고분자 물질을 포함하는 것일 수 있다. 상기 정공전달 단분자 물질로는 spiro-MeOTAD[2,2',7,7'-tetrakis-(N,N-di-p-methoxyphenyl-amine)-9,9'-spirobifluoren]를 사용할 수 있으며, 상기 정공전달 고분자 물질로서 P3HT[poly(3-hexylthiophene)]를 사용할 수 있다. 또한, 상기 정공전달층에는 도핑 물질이 포함될 수 있으며, 상기 도핑 물질로 는 Li 계열 도펀트, Co 계열 도펀트, 및 이들의 조합들로 이루어진 군에서 선택되는 것일 수 있으나, 이에 제한하지 않는다. 예를 들면, 상기 정공전달층을 구성하는 물질로서 spiro-MeOTAD, 4-tert-butyl pyridine(tBP), 및 Li-TFSI의 혼합물을 이용할 수 있다. On the other hand, the hole transport layer is poly (3,4-ethylenedioxythiophene) polystyrene sulfone (PEDOT: PSS); Tetrafluoro-tetracyano-quinodimethane (CuPc: F 4 -TCNQ); And PEDOT: PSS includes tungsten oxide (WO x ), graphene oxide (GO), carbon nanotubes (CNT), molybdenum oxide (MoO x ), vanadium oxide (V 2 O 5 ) and nickel oxide (NiO x ) At least one selected from the group may be selected from the blended, but is not limited thereto, and any material used in the art may be used without limitation. For example, it may be one containing a hole transporting monomolecular material or a hole transporting polymer material. Spiro-MeOTAD [2,2 ', 7,7'-tetrakis- (N, N-di-p-methoxyphenyl-amine) -9,9'-spirobifluoren] may be used as the hole-transport monomolecular substance. P3HT [poly (3-hexylthiophene)] may be used as the hole transport polymer material. In addition, the hole transport layer may include a doping material, and the doping material may be selected from the group consisting of Li-based dopants, Co-based dopants, and combinations thereof, but is not limited thereto. For example, a mixture of spiro-MeOTAD, 4-tert-butyl pyridine (tBP), and Li-TFSI may be used as a material constituting the hole transport layer.

본 발명의 바람직한 실시예에서 사용된 정공수송층으로 사용된 PEDOT:PSS 는 폴리스티렌술폰산(PSS) 겔에 티오펜 5~10개가 중합된 PEDOT(poly(3,4-ethylenedioxythiophene) 가 수용액 상에 분산되어 있는 전도성 고분자이다. 또한, 상기 전자수송층은 풀러렌, 바토큐프로인(bathocuproine: BCP) 및 풀러렌 유도체로 이루어진 군으로부터 선택되는 하나 이상 또는 TiO2, ZnO, SrTi03, WO3 또는 이들의 혼합물로부터 선택되는 금속산화물을 포함하는 것일 수 있다. 업계에서 사용되는 물질이면 한정되지 않고 사용할 수 있다.PEDOT: PSS used as the hole transport layer used in the preferred embodiment of the present invention is a polystyrene sulfonate (PSS) gel in which PEDOT (poly (3,4-ethylenedioxythiophene) (poly (3,4-ethylenedioxythiophene) 5-10 is polymerized is dispersed in an aqueous solution) In addition, the electron transport layer is at least one selected from the group consisting of fullerenes, bathocuproine (BCP) and fullerene derivatives or selected from TiO 2 , ZnO, SrTi0 3 , WO 3 or mixtures thereof. A metal oxide may be used, and any material used in the industry may be used without limitation.

풀러렌 유도체의 예로는 Phenyl-C61-butyric acid methyl ester(PCBM)을 예로 들 수 있으나 이에 한정되는 것은 아니다. 바람직한 실시예에 따르면, C60/BCP를 사용할 수 있다. 또한, 상기 캐소드 또는 애노드 전극으로 사용되는 금속 전극 또는 후면 전극은 Pt, Au, Al, Ni, Cu, Ag, In, Ru, Pd, Rh, Ir, Os 및 C 및 이들의 조합들로 이루어지는 군에서 선택되는 것일 수 있으나, 이들로 한정되는 것은 아니며 관련 기술분야에서 알려진 물질이라면 제한 없이 사용할 수 있다. Examples of fullerene derivatives include, but are not limited to, Phenyl-C61-butyric acid methyl ester (PCBM). According to a preferred embodiment, C60 / BCP can be used. In addition, the metal electrode or the back electrode used as the cathode or anode electrode is Pt, Au, Al, Ni, Cu, Ag, In, Ru, Pd, Rh, Ir, Os and C and combinations thereof It may be selected, but is not limited to these, any material known in the art can be used without limitation.

본 발명의 다른 실시예에 따르면, 상기 페로브스카이트는 할로겐화 납 어덕트 화합물을 이용한 것일 수 있다.According to another embodiment of the present invention, the perovskite may be a lead halide adduct compound.

상기 할로겐화 납 어덕트 화합물은 하기 화학식 1로 표시되는 것일 수 있다.The lead halide adduct compound may be represented by Formula 1 below.

[화학식 1][Formula 1]

A·PbY2·QA PbY · 2 · Q

상기 식에 있어서,In the above formula,

A는 유기 할라이드 화합물 또는 무기 할라이드 화합물이며,A is an organic halide compound or an inorganic halide compound,

Y는 F-, Cl-, Br- 또는 I- 의 할로겐 이온이고,Y is F - is a halogen ion, -, Cl -, Br - or I

Q는 비공유 전자쌍을 갖는 원자를 전자쌍 주개로 하는 작용기를 포함하는 루이스 베이스(Lewis base) 화합물이고, 상기 작용기의 FT-IR의 피크가 하기 화학식 2의 화합물보다 화학식 1의 화합물에서 1~10 cm-1 만큼 적색 이동(red shift)되어 나타나며,Q is a Lewis base compound containing a functional group having an electron-pair donor as an atom having an unshared electron pair, and the peak of the FT-IR of the functional group is 1 to 10 cm - from the compound of Formula 1 to the compound of Formula 2 below. Red shifted by 1 appears,

[화학식 2][Formula 2]

PbY2·QPbY 2 · Q

상기 Y 및 Q는 화학식 1에 대해 정의된 것과 동일하다.Y and Q are the same as defined for the formula (1).

상기 A가 CH3NH3I, CH(NH2)2I 또는 CsI일 수 있다.A may be CH 3 NH 3 I, CH (NH 2 ) 2 I or CsI.

상기 페로브스카이트는 어덕트 화합물을 가열 및 건조하여 어덕트 화합물에 포함된 루이스 염기 화합물을 제거하는 방법으로 만들어진 것일 수 있다.The perovskite may be made by heating and drying the adduct compound to remove the Lewis base compound included in the adduct compound.

상기 어덕트 화합물을 이용한 페로브스카이트 제조는 본 연구진들의 다른 특허출원인 대한민국특허출원 2015-0090139호 및 2015-0164744호를 참조할 수 있으며, 인용에 의해 전체 내용이 본 명세서에 통합된다. Perovskite preparation using the adduct compound may be referred to the Korean Patent Application Nos. 2015-0090139 and 2015-0164744, the other patent applications of the researchers, the entire contents of which are incorporated herein by reference.

일 실시예에 따르면 상기 화학식 1의 A는 하기 화학식 3 또는 화학식 4로 표시되는 유기양이온 또는 Cs+ 양이온과 F-, Cl-, Br- 및 I-에서 선택되는 할로겐 이온의 결합으로 이루어진 유기 또는 무기 할라이드 화합물 일 수 있다.According to one embodiment to the A in the formula (1) formula (3) or an organic cation represented by the formula (4) or Cs + cation and F -, Cl -, Br - and I - organic or inorganic consisting of a combination of a halogen ion is selected from It may be a halide compound.

[화학식 3] [Formula 3]

(R1R2N=CH-NR3R4)+ (R 1 R 2 N = CH-NR 3 R 4 ) +

상기 식에 있어서,In the above formula,

R1, R2, R3 및 R4는 독립적으로 수소 및 비치환 또는 치환된 C1-C6 알킬로부터 선택되는 것이고,R 1 , R 2 , R 3 and R 4 are independently selected from hydrogen and unsubstituted or substituted C1-C6 alkyl,

[화학식 4][Formula 4]

(R5R6R7R8N)+ (R 5 R 6 R 7 R 8 N) +

상기 식에 있어서,In the above formula,

R5, R6, R7 및 R8은 수소, 비치환 또는 치환된 C1-C20 알킬 또는 비치환 또는 치환된 아릴이다.R 5 , R 6 , R 7 and R 8 are hydrogen, unsubstituted or substituted C1-C20 alkyl or unsubstituted or substituted aryl.

보다 구체적으로 상기 A는 CH3NH3I (MAI, Methyl Ammonium Iodide, 메틸암모늄요오드), CH(NH2)2I (FAI, Formamidinium Iodide, 포름아미디늄 요오드) 또는 CsI에서 선택되는 것 일 수 있다.More specifically, the A may be selected from CH 3 NH 3 I (MAI, Methyl Ammonium Iodide, methyl ammonium iodide), CH (NH 2 ) 2 I (FAI, Formamidinium Iodide, formamidinium iodine) or CsI have.

상기 Q는 질소(N), 산소(O) 또는 황(S) 원자를 전자쌍 주개로 하는 작용기를 갖는 루이스 염기(Lewis base) 화합물이고, 보다 구체적으로 Q는 질소, 산소, 황 원자를 전자쌍 주개로 하는 티오아미드기, 티오시아네이트기, 티오에테르기, 티오케톤기, 티올기, 싸이오펜기, 티오우레아기, 티오설페이트기, 티오아세트아미드기, 카보닐기, 알데하이드기, 카복실기, 에테르기, 에스테르기, 설포닐기, 설포기, 설파이닐기, 티오시아네이토기, 피롤리디논기, 페록시기, 아마이드기, 아민기, 아미드기, 이미드기, 이민기, 아지드기, 피리딘기, 피롤기, 니트로기, 니트로소기, 시아노기, 니트록시기 및 이소시아노기로 이루어진 군 선택되는 하나 이상의 작용기를 포함하는 루이스 염기(Lewis base) 화합물일 수 있으며, S원자를 전자쌍 주개로 하는 티오아미드기, 티오시아네이트기, 티오에테르기, 티오케톤기, 티올기, 싸이오펜기, 티오우레아기, 티오아세트아미드기 및 티오설페이트기로 이루어진 군에서 선택되는 하나 이상을 작용기로서 포함하는 화합물이 납 할라이드와 보다 강한 결합을 이룰 수 있어 본 발명에 보다 바람직할 수 있다.Q is a Lewis base compound having a functional group in which nitrogen (N), oxygen (O) or sulfur (S) atoms are electron pair donors, and more specifically Q is nitrogen, oxygen, sulfur atoms in electron pair donors Thioamide group, thiocyanate group, thioether group, thioketone group, thiol group, thiophene group, thiourea group, thiosulfate group, thioacetamide group, carbonyl group, aldehyde group, carboxyl group, ether group, Ester group, sulfonyl group, sulfo group, sulfinyl group, thiocyanato group, pyrrolidinone group, peroxy group, amide group, amine group, amide group, imide group, imine group, azide group, pyridine group, pyrrole group, nitro It may be a Lewis base compound containing at least one functional group selected from the group consisting of a group, a nitroso group, a cyano group, a nitrooxy group, and an isocyano group, and a thioamide group having a S atom as an electron pair donor, Ney Compounds containing at least one selected from the group consisting of a group, a thioether group, a thioketone group, a thiol group, a thiophene group, a thiourea group, a thioacetamide group and a thiosulfate group as a functional group have stronger bonds with lead halides. It may be more preferable to the present invention.

예를 들면, 디메틸설폭사이드(Dimethylsulfoxide(DMSO)), N,N-디메틸아세트아미드(N,N-Dimethylacetamide(DMA)), N-메틸-2-피롤리디온(N-Methyl-2-pyrrolidione(MPLD)), N-메틸-2-피리딘(N-Methyl-2-pyridine(MPD)), 2,6-디메틸- γ-피론(2,6-Dimethyl-γ-pyrone(DMP)), 아세트아미드(Acetamide), 우레아(Urea), 티오우레아(Thiourea(TU)), N,N-디메틸티오아세트아미드(N,N-Dimethylthioacetamide(DMTA)), 티오아세트아미드(Thioacetamide(TAM)), 에틸렌이아민(Ethylenediamine(EN)), 테트라에틸렌디아민(Tetramethylethylenediamine(TMEN)), 2,2'-바이피리딘(2,2'-Bipyridine(BIPY)), 1,10-피페리딘(1,10-Piperidine), 아닐린(Aniline), 피롤리딘(Pyrrolidine), 디에틸아민(Diethylamine), N-메틸피롤리딘(N-Methylpyrrolidine), n-프로필아민(n-Propylamine)으로 이루어진 군에서 선택되는 하나 이상의 화합물일 수 있으며, 바람직하게는, S 전자쌍 주개를 포함하는 티오우레아(Thiourea(TU)), N,N-디메틸티오아세트아미드(N,N-Dimethylthioacetamide(DMTA)), 티오아세트아미드(Thioacetamide(TAM))에서 선택되는 것 일 수 있다.For example, dimethylsulfoxide (DMSO), N, N-dimethylacetamide (DMA), N-methyl-2-pyrrolidione (N-Methyl-2-pyrrolidione (N-Methyl-2-pyrrolidione) MPLD)), N-Methyl-2-pyridine (MPD), 2,6-dimethyl-γ-pyrone (2,6-Dimethyl-γ-pyrone (DMP)), acetamide (Acetamide), Urea, Thiourea (Thiourea (TU)), N, N-Dimethylthioacetamide (NTA), Thioacetamide (TAM), Ethylenediamine (Ethylenediamine (EN)), Tetramethylethylenediamine (TMEN), 2,2'-Bipyridine (BIPY), 1,10-Piperidine , At least one compound selected from the group consisting of aniline, pyrrolidine, diethylamine, N-methylpyrrolidine, and n-propylamine Thiourea (TU), preferably containing an S electron pair donor, N, It may be selected from N-dimethylthioacetamide (N, N-Dimethylthioacetamide (DMTA)), thioacetamide (Thioacetamide (TAM)).

상기 Q로 표시되는 루이스 베이스(Lewis base) 화합물이 Pb와 결합하는 전자쌍 주개 원자의 작용기에 해당하는 FT-IR 피크가 Q화합물보다 상기 화학식 2로 표시되는 화합물에서 10 내지 30 cm-1 만큼 적색 이동(red shift)되어 나타날 수 있다.The FT-IR peak corresponding to the functional group of the electron-pair donor atom in which the Lewis base compound represented by Q corresponds to Pb is red shifted by 10 to 30 cm −1 from the compound represented by Formula 2 than the Q compound (red shift) may appear.

상기 루이스 염기 화합물은 액상일 수 있으며, 비휘발성 또는 저휘발성인 것이 바람직하고, 비점이 120℃ 이상, 예를 들어 비점이 150℃ 이상인 것을 사용할 수 있다. The Lewis base compound may be in a liquid state, preferably nonvolatile or low volatility, and a boiling point of 120 ° C. or higher, for example, a boiling point of 150 ° C. or higher may be used.

상기 화학식 1로 표현되는 할로겐화 납 어덕트 화합물의 제조방법에 있어서, In the method for producing a lead halide adduct compound represented by Formula 1,

할로겐화 납, 유기할라이드 화합물 또는 무기할라이드 화합물 및 질소(N), 산소(O) 또는 황(S) 원자를 전자쌍 주개로 포함하는 루이스 염기 화합물을 제1용매에 용해하여 전구체 용액을 제조하는 단계; Preparing a precursor solution by dissolving a lead halide, an organic halide compound or an inorganic halide compound, and a Lewis base compound containing nitrogen (N), oxygen (O), or sulfur (S) atoms in an electron pair donor in a first solvent;

상기 전구체 용액에 제2 용매를 투입하여 생성된 침전물을 여과하는 단계를 포함하는 할로겐화 납 어덕트 화합물의 제조방법을 제공한다.It provides a method for producing a lead halide adduct compound comprising the step of filtering the precipitate produced by adding a second solvent to the precursor solution.

상기 할로겐화 납, 2가의 양이온을 포함하는 할로겐화 화합물 및 리간드를 포함하는 유기물질은 1:1:1 내지 1:1:1.5의 몰비로 혼합될 수 있으며, 1:1:1의 몰비로 혼합되는 것이 가장 바람직하다.The lead halide, a halogenated compound containing a divalent cation, and an organic material including a ligand may be mixed in a molar ratio of 1: 1: 1 to 1: 1: 1.5, and may be mixed in a molar ratio of 1: 1: 1. Most preferred.

일 실시예에 따르면, 상기 제1용매는 상기 할로겐화 납, 유기할라이드 화합물 또는 무기할라이드 화합물 및 질소(N), 산소(O) 또는 황(S) 원자를 전자쌍 주개로 하는 작용기를 포함하는 유기물질을 모두 용해할 수 있는 유기용매 이며, 프로판디올-1,2-카보네이트(PDC), 에틸렌 카보네이트(EC), 디에틸렌 글리콜, 프로필렌 카보네이트 (PC), 프로필렌 카보네이트 (PC), 헥사메틸인산 트리아미드 (HMPA), 에틸 아세테이트, 니트로벤젠, 포름아미드, γ-부티로락톤 (GBL), 벤질 알코올, N-메틸-2-피롤리돈 (NMP), 아세토페논, 에틸렌 글리콜, 트리플루오로포스페이트, 벤조니트릴 (BN), 발레로니트릴(VN), 아세토니트릴(AN), 3-메톡시 프로피오니트릴(MPN), 디메틸술폭사이드 (DMSO), 디메틸 설페이트, 아닐린, N-메틸포름아미드(NMF), 페놀, 1,2-디클로로벤젠, 트리-n-부틸 포스페이트, o-디클로로벤젠, 셀레늄 옥시클로라이드, 에틸렌 설페이트, 벤젠티올, 디메틸 아세트아미드, 디에틸 아세트아미드, N,N-디메틸에탄아미드(DMEA), 3-메톡시프로피온니트릴(MPN), 디글라임(diglyme), 시클로헥산올, 브로모벤젠, 시클로헥사논, 아니솔(Anisole), 디에틸포름아미드(DEF), 디메틸포름아미드(DMF), 1-헥산티올, 과산화수소, 브로모포름(Bromoform), 에틸 클로로아세테이트, 1-도데칸티올, 디-n-부틸에테르, 디부틸 에테르, 아세틱 무수화물(acetic anhydride), m-자일렌, p-자일렌, 클로로벤젠, 모폴린(morpholine), 디이소프로필 에텔아민, 디에틸 카보네이트(DEC), 1-펜탄디올, n-부틸 아세테이트1-헥사데칸티올 등이 있으며, 상기 유기 용매는 1종 단독 또는 2종 이상 혼합하여 사용하는 것이 가능하다.According to one embodiment, the first solvent comprises an organic material including the lead halide, an organic halide compound or an inorganic halide compound and a functional group having an electron pair donor of nitrogen (N), oxygen (O) or sulfur (S) atoms. All are organic solvents that can dissolve, propanediol-1,2-carbonate (PDC), ethylene carbonate (EC), diethylene glycol, propylene carbonate (PC), propylene carbonate (PC), hexamethyl phosphate triamide (HMPA ), Ethyl acetate, nitrobenzene, formamide, γ-butyrolactone (GBL), benzyl alcohol, N-methyl-2-pyrrolidone (NMP), acetophenone, ethylene glycol, trifluorophosphate, benzonitrile ( BN), valeronitrile (VN), acetonitrile (AN), 3-methoxy propionitrile (MPN), dimethyl sulfoxide (DMSO), dimethyl sulfate, aniline, N-methylformamide (NMF), phenol, 1,2-dichlorobenzene, tri-n-butyl phosphate, o-di Chlorobenzene, selenium oxychloride, ethylene sulfate, benzenethiol, dimethyl acetamide, diethyl acetamide, N, N-dimethylethaneamide (DMEA), 3-methoxypropionnitrile (MPN), diglyme, cyclo Hexanol, bromobenzene, cyclohexanone, anisole, diethylformamide (DEF), dimethylformamide (DMF), 1-hexanethiol, hydrogen peroxide, bromoform, ethyl chloroacetate, 1-dodecanethiol, di-n-butylether, dibutyl ether, acetic anhydride, m-xylene, p-xylene, chlorobenzene, morpholine, diisopropyl ethamine , Diethyl carbonate (DEC), 1-pentanediol, n-butyl acetate 1-hexadecanethiol, and the like, and the organic solvent may be used alone or in combination of two or more thereof.

상기 제1용매는 과량으로 첨가될 수 있으며, 바람직하게는 상기 할로겐화 납의 중량에 대해 1:1 내지 1:3 (할로겐화 납: 제1용매)의 중량비로 첨가되는 것일 수 있다.The first solvent may be added in excess, and preferably, may be added in a weight ratio of 1: 1 to 1: 3 (lead halide: first solvent) with respect to the weight of the lead halide.

일 실시예에 따르면, 상기 제2용매는 제1용매를 선택적으로 제거할 수 있는 비극성 또는 약한 극성용매일 수 있으며, 예를 들면, 아세톤계, C1-C3 알콜계, 에틸 아세테이트계, 디에틸에테르계, 알킬렌 클로라이드계, 환형 에테르계 및 이들의 혼합물로 구성되는 그룹에서 선택되는 용매일 수 있다. According to one embodiment, the second solvent may be a non-polar or weak polar solvent that can selectively remove the first solvent, for example, acetone, C1-C3 alcohol, ethyl acetate, diethyl ether And solvents selected from the group consisting of alkylene chlorides, cyclic ethers, and mixtures thereof.

일 실시예에 따르면, 할로겐화 납 어덕트 화합물로부터 제조된 페로브스카이트가 일반적인 휘발성 용매로 사용되는 톨루엔 및 클로로벤젠을 사용하는 경우에는 낮은 재현성을 나타낼 수 있으며, 이는 페로브스카이트의 품질이 상기한 휘발성용매를 사용하는 경우에는 드립핑되는 양 및/또는 세정액의 스피닝 속도 및 세정액과 전구물질 용액간의 용해도 차이에 의해 크게 좌우될 수 있기 때문이다. 그러나 본 발명에 따른 제2용매, 바람직하게는 디에틸에테르계 용매를 사용하는 경우에는 스핀코팅 조건에 상관없이 완전히 용해시킨 제1용매에 충분한 양의 제2용매를 사용함으로써 높은 재현성을 갖는 페로브스카이트 막을 얻을 수 있다.According to one embodiment, perovskite prepared from a lead halide adduct compound may exhibit low reproducibility when using toluene and chlorobenzene, which are used as common volatile solvents, which indicates that the perovskite quality is This is because when using one volatile solvent, the amount of dripping and / or the spinning speed of the cleaning liquid and the solubility difference between the cleaning liquid and the precursor solution can be greatly influenced. However, when using a second solvent according to the present invention, preferably a diethyl ether solvent, a perovskite having high reproducibility by using a sufficient amount of the second solvent in the first solvent completely dissolved regardless of the spin coating conditions. You can get the sky curtain.

본 발명의 바람직한 실시예에 따르면, 어덕트 화합물이 XRD 회절 피크의 2θ값이 7~8.5 및 9.8~10.5인 범위에 각각 위치하는 피크를 포함하며, 구체적으로 XRD 회절 피크의 2θ값이 6~7, 7~8.5 및 9.8~10.5인 범위에 각각 위치하는 피크를 포함하거나, XRD 회절 피크의 2θ값이 7~8.5, 9.8~10.5, 11~12.5 및 13~14인 범위에 각각 위치하는 피크를 포함하는 것일 수 있다(도 14 및 도 15 참조). 이러한 피크는 다른 방법으로 제조된 화합물에서는 나타나지 않는 것이며, 어덕트 화합물에서 나타나는 특징적인 피크 일 수 있다. According to a preferred embodiment of the present invention, the adduct compound includes peaks positioned in the range of 2θ values of XRD diffraction peaks of 7 to 8.5 and 9.8 to 10.5, and specifically 2θ values of XRD diffraction peaks of 6 to 7 , Peaks located in the range of 7 to 8.5 and 9.8 to 10.5, respectively, or 2θ values of XRD diffraction peaks in the range of 7 to 8.5, 9.8 to 10.5, 11 to 12.5, and 13 to 14, respectively. (See FIGS. 14 and 15). These peaks do not appear in compounds prepared by other methods, and may be characteristic peaks in adduct compounds.

일 실시예에 따르면, 상기와 같이 제조된 할로겐화 납 어덕트 화합물 박막은 도 2(a)에 나타낸 바와 같이 투명한 박막을 형성할 수 있다.According to one embodiment, the lead halide duct compound thin film prepared as described above may form a transparent thin film as shown in Figure 2 (a).

상기 박막으로 형성된 할로겐화 납 어덕트 화합물은 30℃ 이상의 온도에서 가열공정을 거칠 수 있으며, 바람직하게는, 40℃ 또는 50℃ 이상의 온도 이상의 온도에서 가열될 수 있고, 예를 들면, 30℃ 이상 150℃ 이하의 온도 범위에서 가열되어 페로브스카이트를 형성할 수 있다. 또한, 상기 가열공정은 30℃ 내지 80℃ 온도에서 가열된 후 90℃ 내지 150℃에서 추가로 가열되는 식의 단계적인 방법으로 가열될 수 있으며, 추가 가열공정에 의해 보다 치밀한 구조를 갖는 페로브스카이트 결정을 얻을 수 있다. 상기 어닐링 공정에서 상기 화학식 1의 Q로 나타나는 리간드 유기물질이 할로겐화 납 어덕트 화합물의 결정구조에서 제거됨으로써 페로브스카이트가 형성되며, 일 실시예에 따르면, 제조된 페로브스카이트 박막은 암갈색과 같이 어두운 색을 띠는 박막을 형성할 수 있다.The lead halide adduct compound formed of the thin film may be subjected to a heating step at a temperature of 30 ° C. or higher, preferably, may be heated at a temperature of 40 ° C. or 50 ° C. or higher, for example, 30 ° C. or higher and 150 ° C. It can be heated in the following temperature range to form perovskite. In addition, the heating process may be heated in a stepwise manner of being heated at a temperature of 30 ℃ to 80 ℃ and further heated at 90 ℃ to 150 ℃, perovskite having a more compact structure by the additional heating process Get a decision. In the annealing process, the perovskite is formed by removing the ligand organic material represented by Q of Formula 1 from the crystal structure of the lead halide adduct compound. According to one embodiment, the manufactured perovskite thin film is dark brown and Likewise, a thin film having a dark color may be formed.

상기 기판은 폴리머 재질의 유연성 기판 또는 유리와 같은 비유연성 기판일 수 있다. The substrate may be a flexible substrate made of a polymer material or a non-flexible substrate such as glass.

바람직한 실시예에 따르며, 상기 투명 애노드 전극은 그래핀, 금속 산화물 층은 MoO3 (molybdenum trioxide), 정공수송층은 PEDOT:PSS, 페로브스카이트층은 MAPbI3(Methyl Ammonium Lead Iodide), 전자수송층은 C60 (fullerene)/BCP(bathocuproine), 캐소드 전극은 LiF(lithium fluoride)/Al(aluminum)을 포함하는 높은 효율의 TCO-프리 페로브스카이트 기반 태양전지가 제공된다. 이하에서는 본 발명의 바람직한 실시예를 들어 보다 구체적으로 설명하나, 본 발명의 범위가 이에 한정되는 것은 아니며 다양한 변형이 가능함은 물론이다. According to a preferred embodiment, the transparent anode electrode is graphene, the metal oxide layer is MoO 3 (molybdenum trioxide), the hole transport layer is PEDOT: PSS, the perovskite layer is MAPbI 3 (Methyl Ammonium Lead Iodide), the electron transport layer is C A 60 (fullerene) / bathocuproine (BCP), cathode electrode is provided with a high efficiency TCO-free perovskite based solar cell comprising lithium fluoride (LiF) / Al (aluminum). Hereinafter, one preferred embodiment of the present invention will be described in more detail, but the scope of the present invention is not limited thereto, and various modifications are possible.

수 나노 미터의 두께로 형성되는 MoO3  층은 그래핀 및 PEDOT:PSS 층 사이에 형성되며, 상기 그래핀 표면에 친수성을 제공하고, 정공도핑을 통하여 낮은 일 함수(4.23eV)를 높은 수준(4.71eV)으로 상승시킬 수 있다. PEDOT:PSS의 습윤성 및 소자 물성은 MoO3층의 두께에 의해 영향을 받는다. 더욱 바람직한 실시예에 따르면 약 2 nm 두께의 MoO3 계면층을 도입함으로써 약 17.1%에 달하는 전환효율을 달성할 수 있다(도 1 참조). MoO 3 formed to a thickness of several nanometers   A layer is formed between the graphene and the PEDOT: PSS layer, which provides hydrophilicity to the graphene surface and can raise the low work function (4.23 eV) to a high level (4.71 eV) through hole doping. The wettability and device properties of PEDOT: PSS are influenced by the thickness of the MoO 3 layer. In a more preferred embodiment, a conversion efficiency of up to about 17.1% can be achieved by introducing a MoO 3 interfacial layer about 2 nm thick (see FIG. 1).

본 발명의 일 실시예에 따른 태양전지 소자의 구조는 도 2에 개략적으로 도시되어 있다. 그래핀을 전도성 투명전극으로 사용하는 MAPbI3 페로브스카이트 기반 태양전지 구조에서는 PEDOT:PSS와 C60 /BCP를 각각 정공수송층(HTL) 및 전자수송층(ETL)으로 사용하였다. 상기 구조는 저온 공정이 가능하여, 플렉시블한 플라스틱 기판상에 적용되는 차세대 용도에 적합하다. The structure of a solar cell device according to an embodiment of the present invention is schematically shown in FIG. In the MAPbI 3 perovskite-based solar cell structure using graphene as a conductive transparent electrode, PEDOT: PSS and C 60 / BCP were used as the hole transport layer (HTL) and the electron transport layer (ETL), respectively. The structure is capable of low temperature processing, making it suitable for next generation applications applied on flexible plastic substrates.

화학기상증착(CVD, chemical vapor deposition)을 통해 성장된 단일 층 그래핀은 P형 도핑에 의해서 일 함수(~4.3eV)를 증가시키고 그 결과 전도성을 향상시킬 뿐만 아니라, 바람직한 정공수송층의 최고점유분자궤도(HOMO, highest occupied molecular orbital) 수준(예를 들어, PEDOT:PSS에 대한 ~5.2 eV)의 에너지 준위를 유도하므로, 투명 애노드 전극으로 활용하는 것이 바람직하다. 하지만 이에 국한되지 않으며 필요에 따라서 그래핀을 n형 도핑 하여 캐소드로도 활용할 수 있다. 본 발명에서는 진공열증착으로 그래핀과 PEDOT:PSS층 사이에 MoO3  층을 증착시킨 후, 스핀코팅 과정 중에 일어나는 유실을 방지하기 위하여, 핫 플레이트 상에서 150℃로 열처리 하였다. 또한, 본 발명에서는 MoO3  층의 두께를 0~4 nm로 변화시킴으로써, PEDOT:PSS의 습윤성 및 도핑수준과 같은 그래핀 전극의 계면특성을 조절하였다. 그래핀 상에서 PEDOT:PSS의 습윤성은 고성능 소자의 제조에 매우 중요한 인자이다.Single-layer graphene grown through chemical vapor deposition (CVD) increases the work function (~ 4.3 eV) by P-type doping and consequently improves conductivity, as well as the highest occupancy of the preferred hole transport layer. Since it induces an energy level of the highest occupied molecular orbital (HOMO) level (e.g., ~ 5.2 eV for PEDOT: PSS), it is preferable to use it as a transparent anode electrode. However, the present invention is not limited thereto and may be used as a cathode by n-doped graphene as necessary. In the present invention, MoO 3 between the graphene and PEDOT: PSS layer by vacuum thermal deposition   After depositing the layer, heat treatment was performed at 150 ° C. on a hot plate to prevent loss during spin coating. In the present invention, MoO 3   By changing the thickness of the layer to 0-4 nm, the interfacial properties of the graphene electrode, such as wettability and doping level of PEDOT: PSS, were adjusted. The wettability of PEDOT: PSS on graphene is a very important factor in the fabrication of high performance devices.

이하에서는 실시예 및 실험예로부터 본 발명에 따른 그래핀을 전도성 투명전극으로 사용하는 페로브스카이트 기반 태양전지를 보다 구체적으로 설명한다. 단, 하기의 실시예는 본 발명의 예시일 뿐 본 발명의 보호범위를 제한하는 것으로 해석 되어서는 안 된다.Hereinafter, the perovskite-based solar cell using the graphene according to the present invention as a conductive transparent electrode from the Examples and Experimental Examples in more detail. However, the following examples are only examples of the present invention and should not be construed as limiting the protection scope of the present invention.

<실시예 1 내지 3> 그래핀 기반의 페로브스카이트 태양 전지의 제작<Examples 1 to 3> Fabrication of graphene-based perovskite solar cell

구리호일 위에서 CVD-성장된 그래핀을 세정된 유리기판(AMG, 25 x 25 mm2) 상에 전사시킨 단층 그래핀 코팅 유리기판(Graphene Square Inc. >1kΩ cm2, 15 x 15 mm2  )을 사용하여 그래핀 기반의 페로브스카이트 태양전지를 제작하였다.Single layer graphene coated glass substrate (Graphene Square Inc.> 1 kΩ cm 2 , 15 x 15 mm 2 transferred CVD-grown graphene onto a cleaned glass substrate (AMG, 25 x 25 mm 2 ) on copper foil   ) To produce a graphene-based perovskite solar cell.

단층 그래핀 코팅 유리기판 상에 1nm, 2nm 및 4nm의 다양한 두께를 가지는 초박형 MoO3 층을 진공 열 증발기를 사용하여 0.1 Ås-1의 증착속도로 진공열증착 시킨 후, 150℃에서 10분간 열처리하였다. 상기 증착시에 증착속도 및 두께는 수정 진동자 센서(quartz crystal sensor)를 이용하여 모니터하였다. 상기 MoO3 층은 소수성의 그래핀 표면을 친수성으로 바꾸는 것을 목적으로 하였다.Ultra-thin MoO 3 layers having various thicknesses of 1 nm, 2 nm and 4 nm were coated on a single layer graphene coated glass substrate by vacuum thermal evaporation at a deposition rate of 0.1 Ås -1 using a vacuum thermal evaporator, followed by heat treatment at 150 ° C. for 10 minutes. . The deposition rate and thickness during the deposition were monitored using a quartz crystal sensor. The MoO 3 layer was intended to change the hydrophobic graphene surface to hydrophilic.

그 후, 상기의 기판을 탈이온수에 먼저 적셔 놓았다가 50 ㎕의 PEDOT:PSS 솔루션(Clevios P VP Al 4083)을 5000 rpm, 30초간 스핀 코팅한 후, 150 ℃에서 20분간 열처리하여 정공 수송층을 형성하였다. Subsequently, the substrate was first soaked in deionized water, and then 50 μl of PEDOT: PSS solution (Clevios P VP Al 4083) was spin coated at 5000 rpm for 30 seconds, followed by heat treatment at 150 ° C. for 20 minutes to form a hole transport layer. It was.

상기 정공수송층 위에 흡수체로서 페로브스카이트 층을 형성하였다. 상기 페로브스카이트 층은 MAI, PbI2 및 DMSO 을 1:1:1의 몰비로 혼합하여 50 wt% DMF 용액에 가열 없이 용해시킨 후, 완전히 용해된 50 ㎕의 MAI·PbI2·DMSO 솔루션을 3500rpm, 20초간 스핀 코팅하고, 상기 스핀 코팅이 시작된 후 8초 후에 0.3 ml의 디에틸에테르(DE, Diethyl ether)를 천천히 떨어뜨려 잉여의 디메틸포름아미드를 제거하여 CH3NH3I·PbI2·DMSO 어덕트 화합물 필름을 형성한 다음, 상기 CH3NH3I·PbI2·DMSO 어덕트 화합물 필름을 65℃에서 1분 및 100℃에서 4분간 열처리하여 어두운 갈색의 페로브스카이트 필름을 형성하였다. A perovskite layer was formed on the hole transport layer as an absorber. The perovskite layer is MAI, PbI 2 DMSO was mixed at a molar ratio of 1: 1: 1 and dissolved in a 50 wt% DMF solution without heating, followed by spin coating of 50 μl of completely dissolved MAI.PbI 2 .DMSO solution for 3500 rpm for 20 seconds, and the spin coating. After 8 seconds after the start, 0.3 ml of diethyl ether was slowly dropped to remove excess dimethylformamide to form a CH 3 NH 3 I · PbI 2 · DMSO adduct compound film. The CH 3 NH 3 I.PbI 2 .DMSO adduct compound film was heat treated at 65 ° C. for 1 minute and at 100 ° C. for 4 minutes to form a dark brown perovskite film.

그 후, 상기 기판을 10-6 Torr 미만의 진공열증착기 내부에서 C60 (20nm), BCP (10nm), LiF (0.5 nm), 및 Al (150 nm)를 증착시켰다. 상기의 모든 스핀코팅은 대기조건에서 이루어졌다.Thereafter, the substrate was deposited with C 60 (20 nm), BCP (10 nm), LiF (0.5 nm), and Al (150 nm) inside a vacuum thermal evaporator of less than 10 −6 Torr. All of the above spin coatings were performed under atmospheric conditions.

<비교예 1 내지 4> ITO 기반의 페로브스카이트 태양 전지의 제작 Comparative Examples 1 to 4 Fabrication of Perovskite Solar Cells Based on ITO

ITO 기반의 페로브스카이트 태양전지의 제작에 있어서, 사용된 ITO 소자는 시판의 ITO-코팅 유리 기판(AMG, 9.5 Ω cm2, 25 x 25 mm2)에서 제작되었다.In the fabrication of ITO-based perovskite solar cells, the ITO devices used were fabricated on commercially available ITO-coated glass substrates (AMG, 9.5 Ω cm 2 , 25 × 25 mm 2 ).

ITO-코팅 유리 기판은 아세톤, 이소프로판올 및 탈이온수에서 각각 15분씩 초음파 욕조를 사용하여 세정한 후에 질소가스로 건조하고, 120℃ 오븐에 보관하였다가 사용하였다.The ITO-coated glass substrate was washed with acetone, isopropanol and deionized water for 15 minutes each using an ultrasonic bath, dried over nitrogen gas, stored in an oven at 120 ° C., and used.

상기의 세척 및 건조한 ITO-코팅 유리기판 상에 0 nm, 1 nm, 2 nm 및 4 nm의 다양한 두께를 가지는 초박형 MoO3 층을 진공 열 증발기를 사용하여 0.1 Å s-1의 증착속도로 진공열증착 시킨 후, 150℃에서 10분간 열처리하였다. 상기 증착시에 증착속도 및 두께는 수정 진동자 센서(quartz crystal sensor)를 이용하여 모니터 하였다. The ultra-thin MoO 3 layer having various thicknesses of 0 nm, 1 nm, 2 nm and 4 nm on the washed and dried ITO-coated glass substrate was vacuum-heated at a deposition rate of 0.1 s s -1 using a vacuum thermal evaporator. After evaporation, heat treatment was performed at 150 ° C. for 10 minutes. The deposition rate and thickness during the deposition were monitored using a quartz crystal sensor.

그 후, 상기의 기판을 탈이온수에 먼저 적셔 놓았다가 50㎕의 PEDOT:PSS 솔루션을 5000 rpm, 30초간 스핀 코팅한 후, 150 ℃에서 20분간 열처리하여 정공수송층을 형성하였다. Thereafter, the substrate was first soaked in deionized water, and then 50 µl of PEDOT: PSS solution was spin coated at 5000 rpm for 30 seconds, followed by heat treatment at 150 ° C. for 20 minutes to form a hole transport layer.

상기 정공수송층 위에 흡수체로서 페로브스카이트 층을 형성하였다. 상기 페로브스카이트 층은 MAI, PbI2 및 DMSO 을 1:1:1의 몰비로 혼합하여 50 wt% DMF용액에 가열없이 용해시킨 후, 완전히 용해된 50㎕의 MAI·PbI2·DMSO 솔루션을 3500rpm, 20초간 스핀 코팅하고, 상기 스핀 코팅이 시작된 후 8초 후에 0.3 ml의 디에틸에테르(DE, Diethyl ether)를 천천히 떨어뜨려 잉여의 디메틸포름아미드를 제거하여 CH3NH3I·PbI2·DMSO 어덕트 화합물 필름을 형성한 후, 상기 CH3  NH3I·PbI2·DMSO 어덕트 화합물 필름을 65℃에서 1분 및 100℃에서 4분간 열처리하여 어두운 갈색의 페로브스카이트 필름을 형성하였다. 그 후, 상기 기판을 10-6 Torr 미만의 진공열증착기로 내부에서 C60 (20nm), BCP (10nm), LiF (0.5 nm), 및 Al (150 nm)를 증착시켰다. 상기의 모든 스핀코팅은 대기조건에서 이루어졌다.A perovskite layer was formed on the hole transport layer as an absorber. The perovskite layer is MAI, PbI 2 And dissolving DMSO in a molar ratio of 1: 1: 1 without heating in a 50 wt% DMF solution, followed by spin coating a fully dissolved 50 µl MAI.PbI 2 .DMSO solution for 3500 rpm for 20 seconds, and spin coating After 8 seconds after the start, 0.3 ml of diethyl ether (DE) was slowly dropped to remove excess dimethylformamide to form a CH 3 NH 3 I · PbI 2 · DMSO adduct compound film. CH 3   The NH 3 I.PbI 2 .DMSO adduct compound film was heat treated at 65 ° C. for 1 minute and at 100 ° C. for 4 minutes to form a dark brown perovskite film. Thereafter, the substrate was deposited with C 60 (20 nm), BCP (10 nm), LiF (0.5 nm), and Al (150 nm) inside with a vacuum thermal evaporator of less than 10 −6 Torr. All of the above spin coatings were performed under atmospheric conditions.

<실험예 1> 태양전지의 특성 분석Experimental Example 1 Characterization of Solar Cell

하기와 같은 방법으로 상기 실시예 1 내지 3 및 비교예 1 내지 4의 페로브스카이트 기반 태양전지에 대한 SEM 이미지, J- V커브, 외부양자효율(EQE, external quantum efficiency) 스펙트럼, 시트저항, 투과율, UPS 및 AFM 이미지에 대하여 분석하였다.SEM images of the perovskite-based solar cells of Examples 1 to 3 and Comparative Examples 1 to 4, J- V curve, external quantum efficiency (EQE) spectrum, sheet resistance, Transmittance, UPS and AFM images were analyzed.

SEM 이미지는 필드 방사 주사 전자현미경(AURIGA, Zeiss)을 이용하여 분석하였으며, 표준 Si 태양광전지(RC-1000-TC-KG5-N, VLSI Standards)를 이용하여 100mWcm-2로 교정된 Oriel Sol3A 태양 시뮬레이터에 의해 만들어진 AM 1.5G 일광으로 태양광 시뮬레이션을 실시하였다.SEM images were analyzed using a field emission scanning electron microscope (AURIGA, Zeiss) and Oriel Sol3A solar simulator calibrated to 100 mWcm -2 using standard Si solar cells (RC-1000-TC-KG5-N, VLSI Standards). Solar simulations were carried out with AM 1.5G daylight produced by.

J- V커브는 키슬리 2400 소스 매터(Keithley 2400 source meter)에 의해 기록되었으며, 순방향 및 역방향 스캔속도는 20 mV당 200ms로 설정하였으며, 장치의 활성 영역은 1.77 mm 2 였다. J- V curves were recorded by Keithley 2400 source meter, the forward and reverse scan rates were set to 200 ms per 20 mV and the active area of the device was 1.77 mm 2 .

EQE 스펙트럼은 300mW 크세논 광원(Xenon light source) 및 로크인 앰프(lock-in amplifier)를 갖춘 뉴포트 IQE200 시스템(Newport IQE200 system)으로 측정하였다.EQE spectra were measured with a Newport IQE200 system with a 300mW Xenon light source and a lock-in amplifier.

시트 저항은 4침법(CMT-SERIES, Advanced Instrument Technology)을 이용하여 측정하였다.Sheet resistance was measured using 4 needle method (CMT-SERIES, Advanced Instrument Technology).

투과율은 UV-vis 스펙트로스코피(Cary 5000, Agilent)를 이용하여 측정하였다.The transmittance was measured using UV-vis spectroscopy (Cary 5000, Agilent).

UPS 측정은 헬륨 디스차지 램프(He I 21.2 eV, AXIS-NOVA, Kratos)를 이용하여 이루어졌으며, AFM 이미지는 비접촉 모드의 XE-100(Park Systems) 주사 탐침 현미경을 이용하였다. UPS measurements were made using a helium discharge lamp (He I 21.2 eV, AXIS-NOVA, Kratos), and AFM images were taken using a XE-100 (Park Systems) scanning probe microscope in contactless mode.

MoOMoO 33 층의 증착에 따른  Due to the deposition of the layer PEDOT:PSS의PEDOT: PSS 습윤성 및  Wettability and 그래핀Graphene 전극의 친수성 개선 Improved hydrophilicity of the electrode

그래핀 기반 및 ITO 기반 소자의 PEDOT:PSS의 습윤성은 고성능 장치의 제조에 있어서 매우 중요하며, 접촉각 측정을 통하여 MoO3 층이 있을 때 및 없을 때의 습윤성 차이를 측정하였다.The wettability of PEDOT: PSS of graphene-based and ITO-based devices is very important for the fabrication of high performance devices, and the contact angle measurements are used to determine the difference in wettability with and without the MoO 3 layer.

도 3은 그래핀 및 ITO의 표면에 물방울을 적하한 PEDOT:PSS 층의 광학현미경 이미지를 보여준다. 도 3a에서 보여주는 것과 같이 MoO3 층이 없는 그래핀 표면에서의 PEDOT:PSS의 접촉각은 90.4±0.3°로 측정되었으며, 이 결과, 연속된 PEDOT:PSS/MAPbI3 층은 스핀-코팅 공정으로 형성되기 어려울 것으로 보인다(도 3a 삽입도). 그러나, 도 3b 및 도 3c에 나타낸 것과 같이, 그래핀 위에 1 nm 두께 MoO3 층이 있는 경우 접촉각이 46.6±1.3°로 감소하고, 2 nm 두께 MoO3 층이 있는 경우 접촉각이 30.0±1.6°로 감소하는 것을 보여준다. 상기와 같은 접촉 각의 감소와 함께 습윤성 또한 개선되었음을 도 3b 및 도 3c의 삽입도에서 확인할 수 있다.3 shows an optical microscope image of a PEDOT: PSS layer in which water droplets were dropped on the surfaces of graphene and ITO. MoO 3 as shown in FIG. 3A The contact angle of PEDOT: PSS on the layerless graphene surface was measured as 90.4 ± 0.3 °, and as a result, successive PEDOT: PSS / MAPbI 3 layers are unlikely to be formed by the spin-coating process (FIG. 3A inset). ). However, as shown in FIGS. 3B and 3C, the contact angle is reduced to 46.6 ± 1.3 ° when there is a 1 nm thick MoO 3 layer on the graphene, and the contact angle is 30.0 ± 1.6 ° when there is a 2 nm thick MoO 3 layer. Shows a decrease. It can be seen in the insets of FIGS. 3b and 3c that the wettability also improved with the reduction in contact angle as described above.

도 3c에 나타낸 바와 같이, 어두운 갈색의 MAPbI3 필름은 사전에 열 증착된 MoO3 층의 유리기판의 중앙부에서 사각형으로 형성되었으며, 특히, 아주 명확한 사각형 모형의 MAPbI3 필름은 2nm 두께의 MoO3 층 위에 형성되었고, 상기 PEDOT:PSS는 두꺼운 MoO3 층 위에서 더 나은 습윤성을 나타내었다.As shown in FIG. 3C, dark brown MAPbI 3 The film was formed into a rectangle in the center of a pre-heat-deposited MoO 3 layer glass substrate, in particular a very clear rectangular model MAPbI 3 The film was formed on a 2 nm thick MoO 3 layer and the PEDOT: PSS showed better wetting on a thick MoO 3 layer.

도 4의 SEM 이미지는, 1nm 두께 MoO3 층으로는 충분히 커버되지 않으며, 2nm 두께 MoO3 층으로 완전히 커버되는 소수성 그래핀 표면을 분명히 보여준다.Figure 4 is a SEM image, it is not sufficiently covered with a 1nm thick MoO 3 layer, and clearly shows the hydrophobic graphene surface is completely covered with a 2nm thick MoO 3 layer.

비교를 위해서, ITO 표면에서의 PEDOT:PSS의 접촉각은 도 3d ~ 도 3f에 나타낸 바와 같이 자외선/오존(UVO)처리 및 MoO3 증착의 조합 처리 전후에 측정되었다. 그 결과, 그래핀과 유사하게. ITO 표면은 스핀 코팅에 의해 연속 막을 형성하는 PEDOT:PSS에 대하여 습윤성을 나타내지 않았고, UVO 처리를 한 ITO 표면에서의 접촉각은 84.0±1.3°(도 3d)에서 16.9±1.8°(도 3e)로 상당히 감소되고, 1nm 두께 MoO3 층에 의해 9.3±0.6°(도 3f)로 조금 더 감소되었으며, 이것은 ITO 표면의 습윤성이 향상된 것을 의미한다.For comparison, the contact angle of PEDOT: PSS on the surface of ITO was determined by UV / ozone treatment and MoO 3 as shown in FIGS. 3D-3F. It was measured before and after the combined treatment of the deposition. As a result, similar to graphene. The ITO surface showed no wettability with respect to PEDOT: PSS, which forms a continuous film by spin coating, and the contact angle on the UVO treated ITO surface was significantly from 84.0 ± 1.3 ° (FIG. 3D) to 16.9 ± 1.8 ° (FIG. 3E). Reduced and slightly reduced to 9.3 ± 0.6 ° (FIG. 3F) by the 1 nm thick MoO 3 layer, which means improved wettability of the ITO surface.

도 5는 2 nm 두께 MoO 3 의 그래핀 전극(도 5a) 및 1 nm-두께 MoO3  의 ITO 전극을 이용하여 제작된 장치 단면의 SEM 이미지를 나타낸다. 도 5의 좌측 이미지는 SE(secondary electron) 모드로 측정되었고, 우측 이미지는 BSE(back-scattered electron) 모드로 측정되었다. 유사한 두께(~50 nm) 및 모폴로지의 그래핀 및 ITO 위에 스핀코팅으로 형성된 PEDOT:PSS 층의 친수성은 MoO3  계면 층에 의해 원활하고 지속적으로 유지될 수 있다. 또한, 도 5에 나타난 것과 같이, 그래핀 및 ITO 기반 모두에서 페로브스카이트 필름의 표면이 균일 두께(~510 nm)로 매우 매끄러운 것으로 관찰되었다. 5 shows graphene electrodes of 2 nm thick MoO 3 (FIG. 5A) and 1 nm-thick MoO 3.   The SEM image of the device cross section produced using the ITO electrode of is shown. The left image of FIG. 5 was measured in secondary electron (SE) mode and the right image was measured in back-scattered electron (BSE) mode. PEDOT similar thickness (~ 50 nm) and morphology of graphene, and is formed by spin coating on the ITO: PSS layer of hydrophilic MoO 3   It can be maintained smoothly and continuously by the interfacial layer. In addition, as shown in FIG. 5, the surface of the perovskite film was observed to be very smooth with uniform thickness (˜510 nm) on both graphene and ITO base.

상기의 매끄럽고 조밀한 페로브스카이트 필름은 PbI2  의 루이스 기반 어덕트(Lewis base adduct)를 통해 제조되었으며, 상기 방법에 의해 19.7%의 최고 변환효율을 나타내는 높은 재현성의 n-i-p 페로브스카이트 태양전지가 본 연구진에 의해 최근에 개발되었다. 제조방법은 대한민국특허출원 제2015-0164744호 참조할 수 있다.  MAI·PbI2·DMSO 어덕트 필름은 잉여의 디메틸포름아미드(DMF) 용매를 세척하기 위한 디에틸에테르(DE)를 적하하면서 스핀코팅하여 형성되었으며, 그 후 열처리에 의해 페로브스카이트 필름으로 전환되었다.The smooth and dense perovskite film described above is PbI 2   The nip perovskite solar cell, which is manufactured through Lewis base adducts and exhibits the highest conversion efficiency of 19.7%, was recently developed by the researchers. The manufacturing method may refer to Korean Patent Application No. 2015-0164744. MAI · PbI 2 · DMSO adduct film was formed by spin coating with diethyl ether (DE) dropwise to wash excess dimethylformamide (DMF) solvent and then converted to perovskite film by heat treatment. It became.

소자의 Device 성능에 있어서In performance MoOMoO 33 층 두께의 영향Influence of layer thickness

소자의 성능에 MoO3 층 두께가 미치는 영향을 알아보기 위하여, 그래핀 전극 및 ITO 전극에 다양한 두께의 MoO3 층이 사용된 실시예 1 내지 3 및 비교예 1 내지 4의 페로브스카이트 태양전지에 대한 개방회로전압(V oc), 단락 전류(J sc), 충전률(FF), 변환효율(PCE) 및 최고 변환효율에 대하여 측정한 결과를 표 1에 나타내었다. MoO 3 on device performance To determine the effect of layer thickness, MoO 3 of various thicknesses on graphene and ITO electrodes Open circuit voltage ( V oc ), short circuit current ( J sc ), charge rate (FF), conversion efficiency (PCE) for the perovskite solar cells of Examples 1 to 3 and Comparative Examples 1 to 4, in which layers are used. And the results measured for the highest conversion efficiency is shown in Table 1.

전극electrode MoO3 두께[nm]MoO 3 thickness [nm] V oc[V] V oc [V] J sc[mA cm2] J sc [mA cm 2 ] FFFF PCE[%]PCE [%] 최고 PCE[%]Top PCE [%] 실시예 1(G-M1)Example 1 (G-M1) 그래핀Graphene 1One 0.72 ± 0.360.72 ± 0.36 17.6 ± 6.317.6 ± 6.3 0.45 ± 0.090.45 ± 0.09 6.7 ± 4.26.7 ± 4.2 12.112.1 실시예 2(G-M2)Example 2 (G-M2) 22 1.03 ± 0.021.03 ± 0.02 21.9 ± 0.421.9 ± 0.4 0.72 ± 0.020.72 ± 0.02 16.1 ± 0.616.1 ± 0.6 17.117.1 실시예 3(G-M4)Example 3 (G-M4) 44 1.00 ± 0.011.00 ± 0.01 22.9 ± 0.422.9 ± 0.4 0.70 ± 0.020.70 ± 0.02 15.9 ± 0.515.9 ± 0.5 16.216.2 비교예 1(ITO-M0)Comparative Example 1 (ITO-M0) ITOITO 00 0.96 ± 0.010.96 ± 0.01 21.4 ± 0.521.4 ± 0.5 0.83 ± 0.020.83 ± 0.02 17.0 ± 0.417.0 ± 0.4 17.617.6 비교예 2(ITO-M1)Comparative Example 2 (ITO-M1) 1One 0.97 ± 0.010.97 ± 0.01 22.6 ± 0.422.6 ± 0.4 0.83 ± 0.010.83 ± 0.01 18.2 ± 0.518.2 ± 0.5 18.818.8 비교예 3(ITO-M2)Comparative Example 3 (ITO-M2) 22 0.95 ± 0.010.95 ± 0.01 22.2 ± 0.422.2 ± 0.4 0.76 ± 0.010.76 ± 0.01 16.1 ± 0.416.1 ± 0.4 16.916.9 비교예 4(ITO-M4)Comparative Example 4 (ITO-M4) 44 0.94 ± 0.010.94 ± 0.01 21.0 ± 0.421.0 ± 0.4 0.74 ± 0.010.74 ± 0.01 14.7 ± 0.614.7 ± 0.6 15.715.7

평균 PCE 및 MoO3 층 두께 사이의 관계는 도 6a 및 도 6b 에 나타내었다.Average PCE and MoO3 The relationship between the layer thicknesses is shown in FIGS. 6A and 6B.

도 6에 나타낸 것과 같이, 그래핀 기반의 소자의 경우, MoO3층을 증착하지 않은 소자는 소수성 그래핀 표면이 습윤화 되지 않으므로 PEDOT:PSS 용액이나 페로브스카이트 용액이 스핀코팅 후에 필름을 형성하지 못하여 PCE는 평가 할 수 없었다(도 3a 삽입도 참조). 뿐만 아니라, 1nm 두께의 MoO3층을 증착한 실시예 1의 경우 불규칙한 PEDOT:PSS의 불규칙한 코팅에 의해 PCE 는 0% ~ 12.1% 의 큰 변화를 나타내었으며, 이러한 결과로부터 1nm 두께 MoO3  층은 소수성 그래핀 표면을 완전히 커버하지 못하는 것을 알 수 있다. 결과적으로, 소자간의 전류 밀도 및 전압(J-V) 특성은 일정하지 않았다(도 7a). As shown in FIG. 6, in the case of the graphene-based device, the PEDOT: PSS solution or the perovskite solution forms the film after the spin coating because the device that does not deposit the MoO 3 layer does not wet the hydrophobic graphene surface. PCE could not be evaluated (see also FIG. 3A insertion). As well as the case of Example 1 by depositing the MoO 3 layer of thickness 1nm irregular PEDOT: PSS were by irregular coating of PCE represents a large change in the 0% ~ 12.1%, 1nm thick These results MoO 3   It can be seen that the layer does not completely cover the hydrophobic graphene surface. As a result, the current density and voltage (JV) characteristics between the elements were not constant (FIG. 7A).

그러나, 1nm 보다 두꺼운 MoO3  층을 가지는 실시예 2 및 실시예 3의 소자는 평균 PCE 값이 각각 16.1% 및 15.9%로 소자간의 성능 편차가 대폭 경감되었다(도 6a 및 도 7b). 특히 실시예 2에서 최고 PCE 17.1% 가 달성되었으며, 이것은 보통의 TCO 전극을 대체한 그래핀 전극 페로브스카이트 기반 태양전지에 대한 최초의 성과일 뿐만 아니라, TCO-프리 태양전지 중에서 가장 높은 변환 효율을 나타내는 것이다. However, MoO 3 thicker than 1 nm   The device of Example 2 and Example 3 having a layer significantly reduced the performance variation between devices with average PCE values of 16.1% and 15.9%, respectively (FIGS. 6A and 7B). In particular, the highest PCE of 17.1% was achieved in Example 2, which is the first achievement for graphene electrode perovskite-based solar cells replacing ordinary TCO electrodes, as well as the highest conversion efficiency among TCO-free solar cells. It represents.

도 6b에 나타낸 바와 같이, ITO-기반 소자인 비교예들에 있어서, PCE는 MoO3 두께 변화에 의해 현저하게 영향을 받았다.  비교예 1의 전극과 비교예 2의 전극을 비교하면 평균 PCE가 17.0% 에서 18.2%로 증가하였으며, 1nm 보다 두꺼운 MoO3 층을 가지는, 비교예 3 및 비교예 4의 평균 PCE는 각각 16.1% 및 14.7%로 감소하였다.  As shown in FIG. 6B, in the comparative examples of ITO-based devices, PCE was significantly affected by MoO 3 thickness change. Comparing the electrode of Comparative Example 1 with the electrode of Comparative Example 2, the average PCE increased from 17.0% to 18.2%, and the average PCE of Comparative Example 3 and Comparative Example 4 having a MoO 3 layer thicker than 1 nm was 16.1% and Decreased to 14.7%.

도 8은 실시예 2 및 비교예 2의 각 전극 타입에 대한 PCE의 히스토그램을 나타낸다. 8 shows a histogram of PCE for each electrode type of Example 2 and Comparative Example 2. FIG.

역방향 및 순방향 바이어스 스위프(bias sweep)를 통해 측정된, AM 1.5G 일 태양조사 100 mW cm2 에서 실시예 2 및 비교예 2의 최고성능 J-V 곡선은 각각 도 6c 및 도 6d에 나타내었다. 실시예 2 및 비교예 2 모두 스캔방향에 따른 의미있는 히스테리시스를 나타내지는 않았다. The highest performance JV curves of Example 2 and Comparative Example 2 at 100 mW cm 2 AM 1.5G one solar irradiation, measured via reverse and forward bias sweeps, are shown in FIGS. 6C and 6D, respectively. Neither Example 2 nor Comparative Example 2 showed significant hysteresis along the scan direction.

또한, 비교예 2와 비교하여 실시예 2는 높은 직렬저항 및 낮은 분로저항이 나타났다.  MoO3-개질 그래핀 및 ITO 전극의 전기적 특성을 이해하기 위하여, 시트저항은 4침법(four-point probe)을 통해 측정되었다. 도 6e는 그래핀 및 ITO에서의 시트저항과 MoO3 층의 두께 사이의 관계를 나타낸다. 도시된 바와 같이, 그래핀의 초기의 높은 시트 저항(> 2 k Ω cm2)은 단지 0.5 nm 두께 MoO3 층의 증착에 의해서 ~780 Ω cm2 으로 현저하게 감소하였으며, MoO3 층의 두께가 2 nm로 증가함에 따라 ~500 Ω cm2 까지 추가로 감소하였다. ITO의 초기 시트저항은 9.5 Ω cm2 로 측정되었으며, 1 및 2 nm의 MoO3 층의 증착에 의해 9.2 Ω cm2 로 약간 감소하였다. 4배 이상의 MoO3 도핑으로 초기 단층 그래핀의 시트저항은 상당히 감소되었지만, 이것은 여전히 ITO 보다 훨씬 높았다. 이와 같이 실시예 2는 비교예 2에 대해 높은 직렬저항, 낮은 분로 저항 및 낮은 충진률(FF)의 결과를 나타내었다. In addition, compared with Comparative Example 2, Example 2 showed high series resistance and low shunt resistance. To understand the electrical properties of MoO 3 -modified graphene and ITO electrodes, sheet resistance was measured by a four-point probe. 6E shows the relationship between sheet resistance and the thickness of the MoO 3 layer in graphene and ITO. As shown, the yes, the initial high sheet resistance (> 2 k Ω cm 2) only were significantly reduced to ~ 780 Ω cm 2 by the deposition of MoO 3 layer 0.5 nm thick, the thickness of the MoO 3 layer of the pin As it increased to 2 nm, it further decreased to ˜500 Ω cm 2 . The initial sheet resistance of the ITO is 9.5 Ω was measured in cm 2, it was slightly reduced to 9.2 Ω cm 2 by evaporation of the first and 2 nm of the MoO 3 layer. More than four times the MoO 3 doping significantly reduced the sheet resistance of the initial monolayer graphene, but it was still much higher than ITO. Thus, Example 2 showed the results of the high series resistance, low shunt resistance and low filling rate (FF) for Comparative Example 2.

소자의 투명도Transparency of the device

도 6f에 나타낸 바와 같이, 가시파장 범위에서 ITO(~89% 투과율)와 비교하여 단일 원자 두께 단층 그래핀(~ 97% 투과율)이 높은 투명도를 보이며, 실시예 2 소자는 비교예 2 소자와 비교되는 단락 전류(J sc ) 수준을 나타내었다.As shown in FIG. 6F, the single atomic thickness single layer graphene (˜97% transmittance) exhibits high transparency in the visible wavelength range compared to ITO (˜89% transmittance), and Example 2 device is compared with Comparative Example 2 device. Short-circuit current ( J sc ) level is shown.

도 8은 실시예 2및 비교예 2의 외부양자효율(EQE: external quantum efficiency) 스펙트럼을 나타낸다. 상기에서 통합 광전류는 각각 20.2 및 21.0 mA cm-1 에서 계산되었다. ITO 애노드와 비교하여, 그래핀 애노드의 낮은 캐리어 포집 효율이 더 높은 광 투과율에 의해 보상되기 때문에, 그래핀- 및 TIO- 기반 장치의 EQE는 유사하다(도 6f 및 도 9). 또한, ITO 보다 훨씬 낮은 그래핀의 전도성에도 불구하고, 실시예 2는 비교예 2와 비교하여, 높은 개방전압(Voc) 수준을 보여주며, 상기 결과는 실시예 2의 높은 PCE 에 기여 한다(비교예 2보다 90% 이상). 8 shows an external quantum efficiency (EQE) spectrum of Example 2 and Comparative Example 2. FIG. The integrated photocurrent was calculated above at 20.2 and 21.0 mA cm −1 , respectively. Compared to the ITO anode, the EQE of graphene- and TIO-based devices is similar because the low carrier collection efficiency of the graphene anode is compensated for by higher light transmittance (FIGS. 6F and 9). In addition, despite the conductivity of graphene, which is much lower than ITO, Example 2 shows a high open voltage (V oc ) level compared to Comparative Example 2, and the result contributes to the high PCE of Example 2 ( 90% or more than Comparative Example 2.

소자의 일 함수 차이Work function difference of the device

동일한 소자 구조를 부여하지만, 전극에 따른 V oc  의 차이는 전극의 일함수 차이와 연관된다. ITO 및 그래핀 전극의 일 함수에서 초박형 MoO3  층의 효과를 조사하기 위하여, 자외선 광전자 분광법(UPS) 측정을 하였다.Gives the same device structure, but V oc along the electrode   The difference of is related to the work function difference of the electrodes. Ultra-thin MoO 3 at work function of ITO and graphene electrodes   In order to investigate the effect of the layer, ultraviolet photoelectron spectroscopy (UPS) measurements were made.

도 10은 MoO3  층의 두께 변화에 따른 ITO 및 그래핀 전극의 UPS 스펙트럼을 나타낸다. 도 10a에 나타낸 바와 같이, 0.5 nm 두께 MoO3  층의 증착은 ITO의 이차전지 차단에 의한 높은 운동에너지로 급속 이동되었다. 그 증거로, 일 함수가 4.29 eV 에서 4.65 eV로 증가하였다. MoO3  층의 1 nm 및 2 nm 두께로의 추가 증착이 일함수를 각각 4.69 eV 및 4.72 eV로 상승시켰다. 따라서, 효율적인 정공수집(hole-collection)을 위하여 애노드와 정공수송층(HTL) 사이의 에너지 장벽을 최소화 하는 것이 바람직하다. 표 1에 나타낸 바와 같이, 비교예 1과 비교하여 비교예 2의 높은 J sc 및 PCE는 개선된 정공 포집 효율을 유도하는 중심 전극의 일함수 증가에 기인한다. 한편, MoO3  층의 두께가 2 nm 및 4 nm로 증가함에 따라 PCE는 감소하였다. 소자 구조에서 ITO 및 유기반도체 사이에서 얇은 MoO3  층은 절연층처럼 동작하며, 정공은 ~3 nm 보다 두꺼운 필름의 점진적 감소인 터널 효과에 의해 MoO3  층을 통과할 수 있다. 비교예 3 및 비교예 4의 정공 수집 효율은 전극의 일함 수의 증가로 향상될 가능성이 있지만, 비교예 2와 비교하여 FF 및 PCE의 갑작스런 감소에 의한 전공의 터널링 확률 감소로 감소될 수도 있다. 10 is MoO 3   UPS spectra of ITO and graphene electrodes are shown as the thickness of the layer changes. As shown in FIG. 10A, 0.5 nm thick MoO 3   The deposition of the layer rapidly shifted to high kinetic energy due to the blocking of the secondary battery of ITO. As a proof, the work function increased from 4.29 eV to 4.65 eV. MoO 3   Further deposition of the layers to 1 nm and 2 nm thickness raised the work function to 4.69 eV and 4.72 eV, respectively. Therefore, it is desirable to minimize the energy barrier between the anode and the hole transport layer (HTL) for efficient hole collection. As shown in Table 1, the high J sc and PCE of Comparative Example 2 compared to Comparative Example 1 is due to an increase in the work function of the center electrode leading to improved hole trapping efficiency. Meanwhile, MoO 3   PCE decreased as the thickness of the layer increased to 2 nm and 4 nm. Thin MoO 3 between ITO and Organic Semiconductor in Device Structure   The layer behaves like an insulating layer and the holes are moO 3 due to the tunnel effect, which is a gradual reduction of films thicker than ~ 3 nm.   Can pass through layers. The hole collection efficiency of Comparative Examples 3 and 4 is likely to be improved by an increase in the work function of the electrode, but may be reduced by a decrease in the tunneling probability of the major due to a sudden decrease in FF and PCE compared to Comparative Example 2.

그래핀 기반 장치의 UPS 스펙트럼 또한, MoO3  층을 증작한 ITO 장치와 유사한 거동을 나타내었다. 도 10 b에서 나타내는 바와 같이, 그래핀 상에 증착된 0.5nm 두께 MoO3  층에서 광전자 개시의 급속한 변화는 4.23 eV에서 4.61로 일 함수의 증가를 나타내는 것을 확인할 수 있었으며, MoO3  층의 1 nm 및 2 nm 두께로의 추가 증착이 일함수를 각각 4.67 eV 및 4.71 eV로 상승시키는 것을 확인할 수 있었다. 도 10 c 에서 나타내는 바와 같이, 그래핀 상에 증착된 초박형 MoO3 층은, 계면에서의 에너지 장벽의 감소에 의해 결과적으로 정공수송층에서 그래핀 애노드로의 정공 수집을 촉진시켰을 뿐만 아니라, 소수성 그래핀 표면에 PEDOT:PSS 필름의 성공적인 스핀코팅이 가능하게 하였다. UPS spectrum of graphene-based devices, also MoO 3   It exhibited similar behavior as the ITO device with increased layer. As shown in FIG. 10B, 0.5 nm thick MoO 3 deposited on graphene   The rapid change in photoelectron initiation in the layer showed an increase in work function from 4.23 eV to 4.61, MoO 3   Further deposition of the layers to 1 nm and 2 nm thickness was found to raise the work function to 4.67 eV and 4.71 eV, respectively. As shown in FIG. 10 c, the ultra-thin MoO 3 layer deposited on graphene not only promoted hole collection from the hole transport layer to the graphene anode by reducing the energy barrier at the interface, but also hydrophobic graphene Successful spin coating of PEDOT: PSS film on the surface was made possible.

ITO 및 그래핀 전극의 UPS 데이터를 비교해보면 같은 MoO3  두께에 대한 일 함수가 거의 동일한 것으로 나타났다. 비교예 2 와 실시예 2의 일 함수 값 또한 크게 다르지 않았다. 이것은 비교예 2 보다 실시예 2의 높은 V oc 는 애노드/HTL 인터페이스에서 에너지 장벽 차이의 관점에서는 설명되지 않음을 의미한다.Comparing UPS data from ITO and graphene electrodes shows the same MoO 3   The work function for thickness was found to be nearly identical. The work function values of Comparative Example 2 and Example 2 were also not significantly different. This means that higher V oc of Example 2 than Comparative Example 2 is not accounted for in terms of energy barrier differences at the anode / HTL interface.

또한, V oc 가 인터페이스 품질에 의해 영향을 받을 수 있으므로, 원자력 현미경(atomic force microscopy; AFM) 측정에 의해 MoO3  및 PEDOT:PSS 필름의 형성 이후의 전극의 모폴리지에 대하여 관찰하였다. Also, Since V oc can be affected by interface quality, MoO 3 by atomic force microscopy (AFM) measurements   And the morphology of the electrode after formation of the PEDOT: PSS film.

도 11a ~ 11f에 나타내는 바와 같이, 비교예 1, 비교예 2 및 비교예 2/PEDOT:PSS의 rms(root-mean-square) 거칠기는 각각 2.06, 1.95 및 1.2인 것으로 나타났으며, 실시예 2의 거칠기가 비교예 2(1.95 nm rms 거칠기)에 비해 6배 낮은 표면 rms 거칠기인 0.29nm를 나타내는 것을 확인할 수 있었다. 여기서, 비교예 2/PEDOT:PSS는 비교예 2와 동일한 두께의 MoO3층을 가지면서 추가로 PEDOT:PSS 층을 갖는 것을 의미한다. 실시예2/PEDOT:PSS 도 동등한 의미로 해석할 수 있다. As shown in Figs. 11A to 11F, the root-mean-square roughnesses of Comparative Example 1, Comparative Example 2, and Comparative Example 2 / PEDOT: PSS were found to be 2.06, 1.95, and 1.2, respectively, and Example 2 It was confirmed that the roughness of exhibits a surface rms roughness of 0.29 nm, which is 6 times lower than that of Comparative Example 2 (1.95 nm rms roughness). Herein, Comparative Example 2 / PEDOT: PSS means having a MoO 3 layer having the same thickness as Comparative Example 2 and further having a PEDOT: PSS layer. Example 2 / PEDOT: PSS can also be interpreted in an equivalent sense.

일반적으로, 아래층의 표면거칠기가 더 작고, 따라서 V oc 가 증가할 때, 더 나은 인터페이스는 적층 사이에 생성될 수 있다는 것이 알려져 있다. 이와 관련하여, 실시예 2의 높은 V oc 에 기여하는, 실시예 2의 전극은 비교예 2/PEDOT:PSS 인터페이스보다 더 나은 PEDOT:PSS의 인터페이스를 확립한 것으로 보인다.In general, it is known that the surface roughness of the underlying layer is smaller, so that when V oc increases, a better interface can be created between the stacks. In this regard, the electrode of Example 2, which contributes to the high V oc of Example 2, appears to have established a better PEDOT: PSS interface than the Comparative Example 2 / PEDOT: PSS interface.

더 나아가, 도 12 및 13에서 나타내는 바와 같이, 실시예 2/PEDOT:PSS 및 비교예 2/PEDOT:PSS 상의 페로브스카이트 표면의 SEM 이미지에서 실시예 2의 입자크기가 비교예 2의 입자크기보다 큰 것을 확인할 수 있었다. Further, as shown in FIGS. 12 and 13, the particle size of Example 2 in the SEM image of the perovskite surface on Example 2 / PEDOT: PSS and Comparative Example 2 / PEDOT: PSS was shown. It was confirmed that the larger.

표면의 나노-스케일 가장자리는 핵생성 사이트(nucleation sites)로서 기능 할 수 있으므로, 본 연구에서 아래층의 표면거칠기는 PEDOT:PSS의 입자크기를 결정하는 중요한 역할을 한다. 따라서, 실시예 2/PEDOT:PSS 의 매끄러운 표면 위의 페로브스카이트 필름의 입자는 비교예 2/PEDOT:PSS 표면의 입자보다 더 큰 크기로 성장할 수 있다. 실시예 2의 더 큰 입자는 입자 경계에서의 전하 재결합에 의한 전압 손실을 줄였다. 따라서, 비교예 2와 비교하여 실시예 2에서 더 높은 V oc 를 제공하는 인자로서 주어진다. Since the nano-scale edges of the surface can function as nucleation sites, the surface roughness of the underlying layer plays an important role in determining the particle size of PEDOT: PSS in this study. Thus, the particles of the perovskite film on the smooth surface of Example 2 / PEDOT: PSS can grow to a larger size than the particles of the surface of Comparative Example 2 / PEDOT: PSS. The larger particles of Example 2 reduced the voltage loss due to charge recombination at the particle boundary. Thus, it is given as a factor that gives a higher V oc in Example 2 compared to Comparative Example 2.

본 발명은 투명 전도성 애노드로서 그래핀을 사용하였을 뿐만 아니라 높은 효율의 TCO-프리 태양전지를 제공한다. 본 발명의 태양전지의 애노드 표면에 도입한 MoO3  층에 의해 더 나은 인터페이스를 형성하고, 애노드와 정공수송층 사이에 바람직한 에너지 수준의 정렬을 가능하게 한다. 특히, 그래핀에 MoO3 증착은 전도성 전극으로서 더 나은 역할을 하게 하며, 최적의 MoO3  층 두께에서, 그래핀 기반 소자 및 ITO 기반 소자에서 각각 17.1% 및 18.8 %의 최고 PCE를 달성하였다. ITO 전극에 비해 그래핀 전극은 낮은 전도성을 가지지만, 유사한 J sc, 높은 V oc 및 높은 투명도 및 낮은 표면 거칠기를 가진다.The present invention not only uses graphene as a transparent conductive anode but also provides a high efficiency TCO-free solar cell. MoO 3 introduced to the anode surface of the solar cell of the present invention   The layers form a better interface and allow for the alignment of the desired energy levels between the anode and the hole transport layer. In particular, MoO 3 on graphene Deposition serves a better role as a conductive electrode and provides optimum MoO 3   In layer thickness, the highest PCE of 17.1% and 18.8% was achieved for graphene based devices and ITO based devices, respectively. Graphene electrodes have low conductivity compared to ITO electrodes, but have similar J sc , high V oc and high transparency and low surface roughness.

Claims (11)

그래핀층을 전도성 투명 전극으로 포함하는 페로브스카이트 기반 태양전지.Perovskite-based solar cell comprising a graphene layer as a conductive transparent electrode. 제1항에 있어서, The method of claim 1, 상기 전도성 투명 전극이 투명 전면 전극인 것인 태양전지. The conductive transparent electrode is a solar cell that is a transparent front electrode. 제1항에 있어서, The method of claim 1, 기판 상에 그래핀층으로 이루어진 투명 애노드 전극, 정공수송층, 페로브스카이트층, 전자수송층 및 캐소드 전극이 순차적으로 적층되어 있는 것인 태양전지.The solar cell of which a transparent anode electrode, a hole transport layer, a perovskite layer, an electron transport layer and a cathode electrode made of a graphene layer are sequentially stacked on a substrate. 제1항에 있어서,The method of claim 1, 기판 상에 그래핀층으로 이루어진 투명 캐소드 전극, 전자수송층, 페로브스카이트층, 정공수송층 및 애노드 전극이 순차적으로 적층되어 있는 것인 태양전지.A transparent cathode electrode, an electron transport layer, a perovskite layer, a hole transport layer and an anode electrode made of a graphene layer are sequentially stacked on a substrate. 제3항 또는 제4항에 있어서, The method according to claim 3 or 4, 상기 그래핀층으로 이루어진 투명 애노드 전극 또는 투명 캐소드 전극 상에 증착된 금속 산화물층을 더 포함하는 것인 태양전지.The solar cell further comprises a metal oxide layer deposited on the transparent anode electrode or transparent cathode electrode consisting of the graphene layer. 제5항에 있어서,The method of claim 5, 상기 금속 산화물층은 MoO3, NiO, CoO 및 TiO2 로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 것인 태양전지.The metal oxide layer is MoO 3 , NiO, CoO and TiO 2 Solar cell comprising one or more selected from the group consisting of. 제5항에 있어서,The method of claim 5, 상기 금속산화물층의 두께는 약 0.5 nm 내지 약 6 nm 인 것인 태양전지.The metal oxide layer has a thickness of about 0.5 nm to about 6 nm. 제1항에 있어서,The method of claim 1, 상기 페로브스카이트는 할로겐화 납 어덕트 화합물을 이용하여 제조된 것인 태양전지.The perovskite is a solar cell prepared using a lead halide adduct compound. 제8항에 있어서,The method of claim 8, 상기 할로겐화 납 어덕트 화합물은 하기 화학식 1로 표시되는 것인 태양 전지:The lead halide adduct compound is a solar cell represented by the following formula (1): [화학식 1][Formula 1] A·PbY2·QA PbY · 2 · Q 상기 식에 있어서,In the above formula, A는 유기 할라이드 화합물 또는 무기 할라이드 화합물이며,A is an organic halide compound or an inorganic halide compound, Y는 F-, Cl-, Br- 또는 I- 의 할로겐 이온이고,Y is F - is a halogen ion, -, Cl -, Br - or I Q는 비공유 전자쌍을 갖는 원자를 전자쌍 주개로 하는 작용기를 포함하는 루이스 염기(Lewis base) 화합물이고, 상기 작용기의 FT-IR의 피크가 하기 화학식 2의 화합물보다 화학식 1의 화합물에서 1~10 cm-1 만큼 적색 이동(red shift)되어 나타나며,Q is a Lewis base compound containing a functional group having an electron-pair donor as an atom having a non-covalent electron pair, and the peak of the FT-IR of the functional group is 1 to 10 cm - from the compound of Formula 1 to the compound of Formula 2 below. Red shifted by 1 appears, [화학식 2][Formula 2] PbY2·QPbY 2 · Q 상기 Y 및 Q는 화학식 1에 대해 정의된 것과 동일하다.Y and Q are the same as defined for the formula (1). 제9항에 있어서,The method of claim 9, 상기 A가 CH3NH3I, CH(NH2)2I 또는 CsI 인 태양전지.Wherein A is CH 3 NH 3 I, CH (NH 2 ) 2 I or CsI. 제9항에 있어서, The method of claim 9, 상기 페로브스카이트는 어덕트 화합물을 가열 및 건조하여 어덕트 화합물에 포함된 루이스 염기 화합물을 제거하는 방법으로 만들어진 것인 태양전지.The perovskite is made by heating and drying the adduct compound to remove the Lewis base compound contained in the adduct compound.
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CN106910828A (en) * 2017-01-12 2017-06-30 华南师范大学 A kind of solar cell with Double Perovskite membrane structure and preparation method thereof
WO2018131957A1 (en) * 2017-01-16 2018-07-19 재단법인 멀티스케일 에너지시스템 연구단 Perovskite solar cells with improved stability
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