WO2016133256A1 - Linear evaporation deposition apparatus - Google Patents

Abstract

The present invention provides a linear evaporation deposition apparatus. The linear evaporation deposition apparatus comprises: a conductive crucible extending in a first direction and disposed within a vacuum container, wherein the conductive crucible receives a powder form of deposition material within a deposition material receiving space and heats the deposition material to generate vapor; a nozzle block that includes a plurality of penetration nozzles and is mounted on the conductive crucible and formed of a conductive material, wherein the nozzle block has a rectangular shape that has a predetermined length along the first direction, a predetermined height in a second direction perpendicular to the first direction, and a predetermined width in a third direction perpendicular to the first and second directions within the vacuum container; an induction heating coil disposed to surround the nozzle block and the conductive crucible within the vacuum container in order to heat the nozzle block and the conductive crucible; and an AC power source that supplies AC power to the induction heating coil. The plurality of penetration nozzles are in communication with the deposition material receiving space of the conductive crucible and are formed along the second direction and disposed parallel to each other in the first direction with an interval therbetween to discharge the vapor in the deposition material receiving space.

Description

Linear evaporation deposition apparatus

FIELD OF THE INVENTION The present invention relates to linear evaporation vapor deposition apparatus, and more particularly to induction heating linear evaporation deposition apparatus.

The low molecular weight organic EL thin film is heated by applying a current to a heating wire wrapped in a crucible containing a low molecular weight organic material, and the heat transferred to the crucible increases the temperature of the organic material in the crucible, and as the temperature of the organic material rises, It is primarily made by exiting the crucible and depositing it on a substrate. Most of the point evaporation sources have been used for the production of organic thin films by the thermal evaporation method.

In the point evaporation source, the organic material is deposited on the substrate, so that a thin film is formed on the portion of the substrate close to the point evaporation source, and a thin portion of the distant substrate is not formed uniformly. Therefore, a method of installing a point evaporation source far from the center of the substrate and rotating the substrate is used. However, in this case, the deposition chamber has to be large, the substrate must be rotated and the uniformity of the thin film is not obtained as desired. And since the capacity of the point evaporation source is small and is installed far from the center of the substrate, most of the organic material gas ejected from the point evaporation source is deposited in the deposition chamber, not the substrate, so that the efficiency of using the organic material is significantly reduced. There are problems such as putting a plurality of point evaporation sources in the deposition chamber and using them through complicated control. In addition, for large area substrates, these problems become more severe.

The evaporation source may be classified into a point source, a linear evaporation source, and an area evaporation source according to the number and / or arrangement of the injection holes. Recently, as the substrate becomes larger, the linear evaporation source is drawing attention rather than the point source, and the length of the linear evaporation source is gradually increasing. This is because linear evaporation sources not only have higher efficiency of deposition materials than point sources but also high deposition rates. However, the linear evaporation source generally requires scanning means for scanning the evaporation source left and right or up and down. In addition, the linear evaporation source is not only difficult to control the deposition temperature and the deposition rate, but also has difficulty in obtaining deposition uniformity. In particular, the longer the length of the linear evaporation source to accommodate a large area substrate, the more difficult it is to achieve deposition uniformity overall.

In addition, since the replacement of the evaporation source or linear evaporation source must be made in a high vacuum chamber, there is an unreasonable point that requires a considerable time until the exhaust to high vacuum again after replacement. In addition, when storing a large amount of point evaporation source or linear evaporation source deposition material, the deposition material may be modified by heat. Frequent replacement of deposition materials is economically inefficient. Therefore, there is a need for a linear evaporation apparatus having a new structure for storing a large amount of organic material and for depositing organic material.

In addition, the organic material deposition apparatus may use a shadow mask, and a new evaporation source having straightness is required for the fine pattern. However, in the case of a conventional nozzle, the nozzle is arranged to protrude from the evaporation source, and when the aspect ratio of the nozzle is increased to improve the straightness of the vapor, it is difficult to uniformly heat the nozzle by heat conduction. Thus, a new linear nozzle structure is needed to improve straightness.

In addition, resistive heating for heating the nozzles makes it difficult to maintain temperature uniformity. Therefore, new heating means are required.

One technical problem to be solved of the present invention is to provide an induction heating linear evaporation deposition apparatus capable of uniformly depositing a large area substrate with high straightness.

One technical problem to be solved by the present invention is to provide a linear evaporation source for manufacturing an organic light emitting device thin film to improve the uniformity of the deposited film and at the same time improve the efficiency of the use of organic materials.

One technical problem to be solved by the present invention is to provide a linear evaporation deposition apparatus for manufacturing an organic light emitting device thin film capable of uniformly depositing a large area substrate with high straightness and containing a large amount of deposition material without thermal denaturation. .

One technical problem to be solved by the present invention is to provide a linear evaporation apparatus for fabricating an organic light emitting device thin film to improve the spatial uniformity of the deposited thin film and at the same time improve the efficiency of the use of organic materials.

One technical problem to be solved by the present invention is to provide a linear evaporation apparatus for manufacturing an organic light emitting device thin film that is easy to induction heating and temperature control by employing an induction heating structure and a nozzle structure of the block shape.

A linear evaporation deposition apparatus according to an embodiment of the present invention extends in a first direction, is disposed inside a vacuum container, and stores a deposition material in powder form in a deposition material accommodation space and heats the deposition material to generate steam. Crucible portion; The inside of the vacuum container has a constant length along the first direction, a constant height in a second direction perpendicular to the first direction, and a constant width in a third direction perpendicular to the first direction and the second direction. A nozzle block having a rectangular parallelepiped shape, comprising a plurality of through nozzles, mounted to the conductive crucible part, and formed of a conductive material; An induction heating coil disposed to enclose the nozzle block and the conductive crucible portion in the vacuum container and to heat the nozzle block and the conductive crucible portion; And an AC power source for providing AC power to the induction heating coil. The plurality of through nozzles communicate with each other with the deposition material accommodating space of the conductive crucible part, are formed along the second direction, are spaced apart from each other in the first direction, and are disposed side by side, and discharge vapor from the deposition material accommodating space.

In one embodiment of the present invention, the through nozzle has a cylindrical shape, the aspect ratio of the through nozzle may be from 5 to 100.

In one embodiment of the present invention, the through nozzle may discharge the steam in a downward direction as opposed to the gravity direction which is a negative second direction.

In one embodiment of the present invention, the through nozzle may discharge the steam in a downward direction in the gravity direction which is the second positive direction. The conductive crucible part includes a crucible body having a deposition material accommodation space extending in the first direction; A vapor guide part having a protrusion protruding from a lower surface of the deposition material accommodating space and a guide through hole aligned with the through nozzle through the protrusion; A conductive cover part covering the steam guide part; And a heat insulating cover part covering the conductive cover part. The steam guide portion may include a guide opening for communicating the protrusion and the guide through hole.

In one embodiment of the present invention, the through nozzle may discharge the steam in a downward direction in the gravity direction which is the second positive direction. The conductive crucible part includes a crucible body having a deposition material accommodation space extending in the first direction; A vapor guide part having a protrusion extending in the first direction from the lower surface of the deposition material accommodating space and protruding in a negative second direction, and a guide through hole aligned with the through nozzle through the protrusion; A guide partition wall including a partition opening penetrating in the third direction and extending side by side in the first direction on both sides of the vapor guide part; A conductive cover part covering the steam guide part; And an insulating cover part covering the conductive cover part. The steam guide portion may include a guide opening for communicating the protrusion and the guide through hole.

In one embodiment of the present invention, the through nozzle discharges the steam in a lateral manner with respect to the gravity direction which is the positive third direction, the nozzle block in a direction perpendicular to gravity at the upper side of the conductive crucible It may be arranged to extend.

In one embodiment, the plurality of through nozzles may include a first row arranged side by side in a first direction, a second row disposed on the left side of the first row, and a first row disposed on the right side of the first row. May contain three rows. The nozzles of the second row and the nozzles of the third row may be aligned with each other in a second direction, and the nozzles of the first row may be disposed between adjacent nozzles of the second row.

In one embodiment of the present invention, the nozzle block may be arranged to be inserted into the conductive crucible portion.

In one embodiment of the present invention, the sum of the cross-sectional areas of the through nozzles may be smaller than the cross-sectional area of the conductive crucible part in the plane defined by the second direction and the third direction.

In one embodiment of the present invention, the density of the through nozzle may be increased or the diameter of the through nozzle may be increased around both ends of the nozzle block.

In one embodiment of the present invention, the induction heating coil may include a nozzle induction heating coil surrounding the nozzle block and a crucible induction heating coil surrounding the conductive crucible portion. The nozzle induction heating coil and the crucible induction heating coil may be electrically connected in series.

In one embodiment of the present invention, the distance between the induction heating coil, the nozzle block and the conductive crucible portion may be changed at least once while extending along the first direction.

In one embodiment of the present invention, the through nozzle may gradually increase in diameter as it proceeds in the discharge direction of the steam.

The linear evaporation deposition apparatus according to an embodiment of the present invention has a high linearity and can uniformly deposit a large area substrate and can accommodate a large amount of deposition material without thermal denaturation.

The linear evaporation deposition apparatus according to an embodiment of the present invention may provide an organic light emitting device thin film that is easy to induction heating and temperature control by employing an induction heating structure and a block structure nozzle structure.

1A is a perspective view illustrating a linear evaporation deposition apparatus according to an embodiment of the present invention.

FIG. 1B is a cross-sectional view taken along the length direction of the linear evaporation deposition apparatus of FIG. 1A.

FIG. 1C is a cross-sectional view taken along the width direction of the linear evaporation deposition apparatus of FIG. 1A.

FIG. 1D is a plan view illustrating a distance between an induction heating coil and a nozzle block of the linear evaporation deposition apparatus of FIG. 1A.

1E is an exploded view of the nozzle block and conductive crucible portion of FIG. 1A.

1F is a plan view illustrating the arrangement of the through nozzles.

2A is a perspective view illustrating a linear evaporation deposition apparatus according to an embodiment of the present invention.

FIG. 2B is a cross-sectional view taken along the width direction of the linear evaporation deposition apparatus of FIG. 2A.

FIG. 2C is a cut perspective view taken along the width direction of the linear evaporation deposition apparatus of FIG. 2A. FIG.

3A is a cross-sectional view cut along the width direction of a linear evaporation deposition apparatus according to another embodiment of the present invention.

3B is a cut perspective view illustrating the conductive crucible of FIG. 3A.

4A is a perspective view illustrating a linear evaporation deposition apparatus according to another embodiment of the present invention.

4B is a cross-sectional view illustrating the linear evaporation deposition apparatus of FIG. 4A.

5A is a perspective view illustrating a linear evaporation deposition apparatus according to another embodiment of the present invention.

FIG. 5B is a cross-sectional view illustrating the linear evaporation deposition apparatus of FIG. 5A.

6 is a cross-sectional view of a width direction illustrating a linear evaporation deposition apparatus according to another embodiment of the present invention.

7 is a cross-sectional view showing the shape of a through nozzle according to an embodiment of the present invention.

The induction heating linear evaporation deposition apparatus according to an embodiment of the present invention directly heats the nozzle block for discharging the deposition material by induction heating. The time-varying magnetic field generates an induction electric field, which directly heats the nozzle block and the conductive crucible part. The induction heating linear evaporation deposition apparatus may include a nozzle block for discharging steam and a conductive crucible portion for providing steam to the nozzle block and accommodating the deposition material.

The nozzle block may include a plurality of through nozzles, and the through nozzles may have a high aspect ratio to improve the straightness of steam. However, in the case of a conventional nozzle, when it has a high aspect ratio, it is difficult to heat a uniform nozzle by heat conduction.

According to an embodiment of the present invention, the induction heating coil directly inductively heats the nozzle block and the conductive crucible having the high aspect ratio nozzle, thereby eliminating spatial temperature nonuniformity. In addition, even when there is a spatial temperature gradient, the spatial temperature controller may control the spatial temperature distribution by spatially adjusting the intensity of the induction electric field. Specifically, the space temperature control unit may be a yoke of a magnetic material. The magnetic body restrains the magnetic flux, thereby controlling the space between the magnetic body and the induction heating coil, so that the spatial temperature control unit may control the spatial distribution or the spatial temperature distribution of the induction electric field.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Rather, the embodiments introduced herein are provided to ensure that the disclosed subject matter is thorough and complete, and that the spirit of the invention will be fully conveyed to those skilled in the art. In the drawings, the components are exaggerated for clarity. Portions denoted by like reference numerals denote like elements throughout the specification.

1A is a perspective view illustrating a linear evaporation deposition apparatus according to an embodiment of the present invention.

FIG. 1B is a cross-sectional view taken along the length direction of the linear evaporation deposition apparatus of FIG. 1A.

FIG. 1C is a cross-sectional view taken along the width direction of the linear evaporation deposition apparatus of FIG. 1A.

FIG. 1D is a plan view illustrating a distance between an induction heating coil and a nozzle block of the linear evaporation deposition apparatus of FIG. 1A.

1E is an exploded view of the nozzle block and conductive crucible portion of FIG. 1A.

1F is a plan view illustrating the arrangement of the through nozzles.

1A to 1F, the linear evaporation deposition apparatus 100 includes a conductive crucible unit 160, a nozzle block 120, induction heating coils 132 and 134, and an AC power source 136. The conductive crucible part 160 extends in a first direction (x-axis direction), is disposed inside the vacuum container 144, accommodates the deposition material in powder form in the deposition material accommodating space 160a, and deposits the deposition material 10. ) To generate steam. The nozzle block 120 has a constant length in the vacuum container along the first direction, a constant height in a second direction (y-axis direction) perpendicular to the first direction, and the first and second directions. It is a rectangular parallelepiped shape having a constant width in a third direction (z-axis direction) perpendicular to the direction, includes a plurality of through nozzles, is mounted on the conductive crucible portion 160, and is formed of a conductive material. The induction heating coils 132 and 134 are disposed to surround the nozzle block 120 and the conductive crucible part 160 in the vacuum container 144 and heat the nozzle block and the conductive crucible part. The AC power source 138 provides AC power to the induction heating coil. The plurality of through nozzles 122 are in communication with the deposition material accommodating space 160a of the conductive crucible part and are formed along the second direction (y-axis direction) and spaced apart in the first direction, and are disposed side by side. The vapor of the vapor deposition material accommodation space is discharged.

The deposition material 10 may be an organic material used for an organic light emitting diode. Specifically, the organic material may include Tris (8-hydroxyquinolinato) aluminum (Al (C9H6NO) 3). The organic material 10 is a solid in powder form at room temperature, and the organic material may be sublimed or evaporated near 300 degrees Celsius. The conductive crucible 160 may be used to receive a large amount of deposition material.

In a conventional linear evaporation deposition apparatus, the crucible receives and heats the deposition material. Linear nozzles are in direct communication with the crucible. In this case, when the crucible has a temperature distribution according to the position, the deposition material at a specific position locally high in temperature is quickly consumed, and the pressure decreases in the consumed region. Uneven temperature distribution or pressure distribution inhibits uniform deposition. In particular, the heating means of the conventional crucible uses a resistive heating wire, the resistive heating wire may provide a spatial temperature difference according to the contact state with the crucible. The resistive heating wire is difficult to disassemble and couple to the crucible for recharging.

According to an embodiment of the present invention, an induction heating method is used, and the induction heating coil extends along the extending direction (x-axis direction) of the nozzle block 120 while the conductive crucible part 160 and / or the nozzle It is arranged to surround the block 120. Accordingly, the induction heating coils 132 and 134 may be disposed adjacent to the conductive crucible part 160 and / or the nozzle block 120 to perform efficient induction heating. As the induction heating coils 132 and 134 are disposed in the vacuum container 144, efficient heating of the conductive crucible part 160 and the nozzle block 120 is possible. In addition, the structures of the nozzle block 120 and the conductive crucible unit 160 may be variously modified.

The induction heating coils 132 and 134 may have a pipe shape or a band shape, and refrigerant may flow in the induction heating coil. In addition, the induction electric field generated by the induction heating coils 132 and 134 is directly contacted with the conductive crucible unit 160 and the outer peripheral surfaces of the nozzle block 120 in a non-contact manner. Thus, the temperature nonuniformity due to contact is eliminated, the heating stability is improved, and the mechanical configuration is simple. The induction heating coils 132 and 134 are spaced apart from the conductive crucible part 160 and the nozzle block 120. The support 133 fixes the induction heating coils 132 and 134. The support part 133 may be formed of an insulator, and the support part 133 may be made of ceramic or alumina. In addition, the nozzle block 120 and the conductive crucible unit 160 may be disposed in a non-contact manner with the induction heating coils 132 and 134, and thus may be easily disassembled and coupled.

According to an embodiment of the present invention, the nozzle block 120 may include a plurality of through nozzles 122 arranged linearly. Conventional linear nozzles include pipes for each nozzle. The pipe-shaped nozzle is difficult to be heated independently by resistive heating. Since the resistive heating is performed by heat conduction by contact, the conventional pipe-shaped nozzle is indirectly heated through heat conduction by heating of the crucible. Therefore, independent temperature control of the pipe-shaped nozzle is difficult. Accordingly, the pipe-shaped nozzle may be blocked by deposition.

According to one embodiment of the present invention, the nozzle block 120 is in the form of a rectangular parallelepiped extending in the first direction, and the plurality of through nozzles 122 are linearly arranged in the nozzle block 120. Therefore, the induction heating coil can directly and directly heat the entire nozzle block 120. The induction heating coils 132 and 134 may provide a temperature gradient between the nozzle block 120 and the conductive crucible part 160. Accordingly, the nozzle block 120 may solve the clogging phenomenon due to deposition. In addition, the temperature distribution in the longitudinal direction of the nozzle block 120 may be performed by adjusting the interval between the nozzle induction heating coil 132 and the nozzle block 120. For example, an interval between the nozzle induction heating coil 132 and the nozzle block 120 at the center portion of the nozzle block may be designed to be larger than the interval at the edge portion of the nozzle block 120. .

The space temperature control unit 140 may be a yoke of a magnetic material. The magnetic body constrains the magnetic flux and controls the space between the space temperature controller 140 and the induction heating coils 132 and 134 so that the space temperature controller 140 can control the space distribution or the spatial temperature distribution of the induction electric field. Can be controlled. The space temperature control unit 140 may include a moving means for adjusting the interval. The space temperature controller 140 may be disposed to restrain the magnetic flux by being spaced apart in a second direction with respect to the induction heating coil.

The vacuum container 144 may be formed of a conductive material. The vacuum container 144 may be a chamber of a cuboid structure. The vacuum container 144 may be evacuated in a vacuum state by a vacuum pump. The vacuum container 144 may include a substrate holder (not shown) and a substrate 146 mounted to the substrate holder. The vacuum container 144 may include a shadow mask disposed on the front surface of the substrate to perform patterning.

The substrate 146 may be a glass substrate or a plastic substrate including an organic light emitting diode. The substrate 146 may be a quadrangular substrate.

The nozzle block 120 of the linear evaporation deposition apparatus 100 may discharge the steam in a bottom-up manner against gravity. Specifically, the gravity direction g may be a second negative direction (negative y-axis direction). The through nozzle 122 may discharge steam to the substrate 146 disposed above the inner side of the vacuum container 144 against gravity.

In the case of the bottom-up evaporation deposition apparatus, the through nozzle 122 discharges steam toward the upper surface of the vacuum vessel, and in the case of the top-down evaporation deposition apparatus, the through nozzle 122 discharges the steam toward the lower surface of the vacuum vessel, In the case of the lateral evaporation deposition apparatus, the through nozzle 122 may discharge steam toward the side of the vacuum container.

The conductive crucible unit 160 may be formed of a metal material having high electrical conductivity. For example, the conductive crucible unit 160 may be stainless steel, copper, tantalum, titanium, tungsten, or nickel. The conductive crucible part 160 may extend in the first direction (x-axis direction). The second direction (y-axis direction) may be opposite to the gravity direction (g direction). The conductive crucible part 160 may have a rectangular parallelepiped shape extending in a first direction.

The conductive crucible part 160 may have an alignment groove 113 extending in a first direction on an upper surface thereof. The through slit 114 extending in the first direction may be disposed in the alignment groove 113. The nozzle block 120 may be inserted into the alignment groove 113 to be fixed by means of welding or the like. Accordingly, the vapor of the deposition material accommodating space 160a of the conductive crucible part 160 may be discharged in the second direction through the through slit 114 and the through nozzles 122.

Outlets of the through nozzles 122 of the nozzle block may be disposed toward the second direction. The nozzle block 120 may have a rectangular parallelepiped shape extending in a first direction. The length of the nozzle block 120 may be several tens of cm and several meters. The nozzle block 120 may have a width of several millimeters to several centimeters. The height of the nozzle block 120 may be several millimeters to several tens of millimeters. The width of the nozzle block 120 may be smaller than the height of the nozzle block.

The nozzle block 120 may be disposed on an upper surface of the conductive crucible part 160, and the conductive crucible part 160 and the nozzle block 120 may be integrally formed. The width of the nozzle block 120 in the third direction (z-axis direction) may be smaller than the width of the conductive crucible unit 160.

The plurality of through nozzles 122 may discharge the vapor upwards in a direction opposite to the gravity direction to deposit organic materials on the substrate 146 disposed above the vacuum container.

Preferably, the through nozzle 122 may have a cylindrical shape penetrating the nozzle block 120. An aspect ratio of the through nozzle may be 5 to 100. The through nozzle 122 may have a diameter of several hundred micrometers to several millimeters. The spacing between neighboring through nozzles 122 may be 1.2 to 5 times the diameter of the through nozzle. It may be preferable that the diameter of the through nozzle 122 is smaller than the average free path of steam. When the nozzle block 120 is in the form of a rectangular parallelepiped extending in the first direction, the nozzle block 120 may be heated as a whole, and the through nozzles may maintain a uniform temperature as a whole.

The sum of the cross-sectional areas of the through nozzles 122 may be smaller than the cross-sectional area cut in the width direction of the conductive crucible part 160. Accordingly, the steam may maintain a spatially constant pressure inside the conductive crucible portion.

The plurality of through nozzles 122 communicate with the deposition material accommodating space 160a of the conductive crucible part and are formed along the second direction (y-axis direction) and spaced apart in the first direction (x-axis direction). They are disposed side by side and discharge vapor from the deposition material accommodating space 160a.

The through nozzles 122 may be arranged in a first direction. The through nozzle may be arranged in one row, two rows, or three rows. In the case of three lines, the first line and the third line may be arranged to be offset in the second line and the first direction.

The through nozzles 122 may have a density greater than a central portion of the nozzle block at both ends of the nozzle block 120 in the first direction. Accordingly, depending on the position, a uniform thin film can be deposited.

According to a modified embodiment of the present invention, the diameter of the through nozzle 122 may be larger than the central portion of the nozzle block at both ends of the first direction of the nozzle block.

The nozzle block 120 may be formed of the same material as the conductive crucible part 160. The nozzle block 120 may be integrally manufactured by the conductive crucible unit 160 and welding techniques. Temperature measuring means for measuring temperature may be disposed in the nozzle block and the conductive crucible part, respectively. The temperature measuring means may be a thermocouple. The nozzle block 120 and the conductive crucible unit 160 may be controlled to maintain a set temperature, respectively.

The conductive crucible unit 160 and the nozzle block 120 may be inductively heated. For induction heating, induction heating coils 132 and 134 and alternating current power source 136 can be used. The frequency of the AC power source 136 may be several tens of kHz to several MHz. Induction heating coils 132 and 134 may receive electric power from the AC power source 136 to inductively heat the conductive crucible unit 160 and the nozzle block 120.

The induction heating coils 132 and 134 may be insulated from the conductive crucible part 160 and the nozzle block 120. For insulation, the induction heating coils 132 and 134 may be spaced apart from the conductive crucible part and the nozzle block. The support part 133 may support and fix the induction heating coils 132 and 134. The support part 133 may be formed of an insulator such as ceramic or alumina. The induction heating coil may be in the form of a pipe having a rectangular cross section, in the form of a pipe having a circular cross section, or in the form of a strip. The spacing between the induction heating coil, the conductive crucible portion and the nozzle block may be designed differently depending on the position for temperature control. The induction heating coils 132 and 134 may include a crucible induction heating coil 134 disposed to surround the conductive crucible part 160 and a nozzle block induction heating coil 132 disposed to surround the nozzle block 120. Can be. The crucible induction heating coil 134 and the nozzle block induction heating coil 132 may be connected in series.

The vertical distance between the induction heating coils 132 and 134 and the conductive crucible part or the vertical distance between the induction heating coils 132 and 134 and the nozzle block 120 may change as the first direction progresses.

The heat reflection part 150 may be disposed to surround the nozzle block 120 and the conductive crucible part. The heat reflection unit 150 may reflect the radiant energy of the heated nozzle block to not be emitted to the outside. The heat reflection unit 150 may be manufactured by bending a metal plate having high reflection efficiency. Cooling pipes 152 through which refrigerant flows may be installed outside the heat reflection unit 150.

The linear evaporation deposition apparatus 100 may include the nozzle block 120 and a linear movement unit 170 that provides a linear motion to the nozzle block. The linear movement unit 170 may provide a linear movement (linear movement in the z-axis direction) to the nozzle block and the conductive crucible unit 160. Accordingly, the linearly moving nozzle block 120 may deposit a uniform thin film on all surfaces of the substrate while the substrate 146 is fixed.

2A is a perspective view illustrating a linear evaporation deposition apparatus according to an embodiment of the present invention.

FIG. 2B is a cross-sectional view taken along the width direction of the linear evaporation deposition apparatus of FIG. 2A.

FIG. 2C is a cut perspective view taken along the width direction of the linear evaporation deposition apparatus of FIG. 2A. FIG.

2A to 2C, the linear evaporation deposition apparatus 200 includes a conductive crucible part 260, a nozzle block 120, induction heating coils 132 and 134, and an AC power source 136. The conductive crucible part 260 extends in a first direction (x-axis direction), is disposed in the vacuum container 144, accommodates the deposition material in powder form in the deposition material accommodating space 260a, and deposits the deposition material 10. ) To generate steam. The nozzle block 120 has a constant length in the vacuum container along the first direction, a constant height in a second direction (y-axis direction) perpendicular to the first direction, and the first and second directions. It is a rectangular parallelepiped shape having a constant width in a third direction (z-axis direction) perpendicular to the direction, includes a plurality of through nozzles, is mounted on the conductive crucible part 260, and is formed of a conductive material. The induction heating coils 132 and 134 are disposed to surround the nozzle block 120 and the conductive crucible part 260 in the vacuum container 144 and heat the nozzle block and the conductive crucible part. The AC power source 138 provides AC power to the induction heating coils 132 and 134. The plurality of through nozzles 122 are in communication with the deposition material accommodating space 260a of the conductive crucible part and are formed along the second direction (y-axis direction) and spaced apart in the first direction, and are arranged side by side. The vapor of the vapor deposition material accommodation space is discharged.

The nozzle block 120 of the linear evaporation deposition apparatus 200 may discharge the steam downward in the direction of gravity. Specifically, the gravity direction g may be a second direction (positive y-axis direction). The through nozzle 122 may discharge steam to the substrate 146 disposed below the inner side of the vacuum container 144 in the direction of gravity. The through nozzle may discharge the steam in a downward direction in the gravity direction, which is the second positive direction.

The conductive crucible part 260 may include a crucible body 264, a steam guide part 261, a conductive cover part 262, and a heat insulating cover part 265. The crucible body 264 may include a deposition material accommodating space 260a extending in the first direction. The vapor guide part 261 passes through the protrusion 261a protruding from the lower surface of the deposition material accommodating space 260a and the guide through hole 261b respectively aligned with the through nozzle 122 through the protrusion 261a. ) May be provided. The conductive cover part 262 may cover the vapor guide part 261. The insulation cover part 265 may cover the conductive cover part 262. The steam guide part 261 may include a guide opening 261c communicating the protrusion part 261a and the guide through hole 261b. The guide through hole 261b may be aligned with the through nozzle 122.

The vapor may be provided to the guide through hole 261b through the guide opening 261c. The vapor may be discharged through the guide through hole 261b and the through nozzle 122. The diameter of the guide through hole 261b may be larger than the diameter of the through nozzle 122.

The crucible body 264 may have a rectangular parallelepiped shape extending in the first direction and include a deposition material accommodating space 260a therein. The deposition material 10 may be stored in the deposition material accommodation space 260a. The deposition material 10 may be an organic material used for an organic light emitting diode. The deposition material accommodating space 260a may extend in the first direction in a rectangular cylinder structure.

The vapor guide part 261 may protrude in a second direction from the lower surface of the deposition material accommodating space 260a and extend in the first direction. The steam guide part 261 may be integrally formed with the crucible body 264. The steam guide part 261 may include a guide through hole 261b penetrating the protrusion 261a in a second direction and spaced apart at regular intervals in the first direction. The protrusion 261a may function as a jaw to prevent the deposition material 10 from overflowing. The steam guide part 261 may be formed of a metal having the same material as the crucible body. The upper surface of the steam guide portion 261 may have a guide opening 261c extending in the third direction. The side surface of the vapor guide portion 261 may be filled with a deposition material. As the vapor guide portion 261 and the sidewalls of the crucible body 264 are inductively heated, vaporized or sublimed deposition material may be injected along the guide through hole 261b and the through nozzle 122.

The conductive cover part 262 may be formed of a conductive material having high electrical conductivity. The conductive cover portion may be in the form of a plate extending in the first direction and bent. The conductive cover part 262 may cover the vapor guide part 261 and be formed of a conductor. The conductive cover part 262 may be heated by induction electric field or thermal contact with the vapor guide part 261. Accordingly, the deposition material may not be deposited on the conductive cover portion 262. When storing a large amount of deposition material, the conductive cover 262 may be locked by the deposition material.

The conductive cover portion 262 and the steam guide portion 261 may be coupled to each other to provide a passage for moving the steam. Accordingly, the deposition material may be injected through the guide through hole 261b of the vapor guide part 261. The steam guide part 261 and the conductive cover part 262 may be heated to about 300 degrees Celsius.

On the other hand, the heat insulating cover 265 may be disposed on the conductive cover 262 so that the conductive cover 262 does not heat the deposition material on the conductive cover 262. The heat insulation cover part 265 may have a plate shape extending in the first direction. The heat insulation cover part 265 may be an insulator. Specifically, the heat insulating cover portion 265, which has good heat insulating properties, may be a heat insulating material made of quarts, a porous insulator, or a glass fiber material.

The insulation plate 267 may be disposed along sidewalls of the deposition material accommodating space 260a. The lower side surface of the deposition material accommodating space may have a groove to insert the heat insulating plate. The heat insulating plate 267 may be a quarts, a porous insulator, or a heat insulating material made of glass fiber.

Grooves 264a may be formed between the insulating plate 267 and the inner wall of the crucible body 264. The groove 264a may minimize heat transfer between the heat insulation plate 267 and the sidewall of the crucible body 264.

The sealing plate 268 and the upper plate 269 for pressing the sealing plate 268 may be disposed on an upper surface of the crucible body 264. The upper plate 269 may be coupled to the crucible body to press the sealing plate 268. Accordingly, the deposition material accommodating space 260a may be sealed by the sealing plate. The sealing plate and the upper plate may have a plate shape extending in the first direction.

3A is a cross-sectional view cut along the width direction of a linear evaporation deposition apparatus according to another embodiment of the present invention.

3B is a cut perspective view illustrating the conductive crucible of FIG. 3A.

3A and 3B, the linear evaporation deposition apparatus 300 includes a conductive crucible part 360, a nozzle block 120, induction heating coils 132 and 134, and an AC power source 136. The conductive crucible part 360 extends in a first direction (x-axis direction), is disposed in the vacuum container 144, accommodates the deposition material in powder form in the deposition material accommodating space 360a, and deposits the deposition material 10. ) To generate steam. The nozzle block 120 has a constant length in the vacuum container along the first direction, a constant height in a second direction (y-axis direction) perpendicular to the first direction, and the first and second directions. It is a rectangular parallelepiped shape having a constant width in a third direction (z-axis direction) perpendicular to the direction, includes a plurality of through nozzles, is mounted on the conductive crucible portion 360, and is formed of a conductive material. The induction heating coils 132 and 134 are disposed to surround the nozzle block 120 and the conductive crucible part 360 in the vacuum container 144 and heat the nozzle block and the conductive crucible part. The AC power source 138 provides AC power to the induction heating coil. The plurality of through nozzles 122 are in communication with the deposition material accommodating space 360a of the conductive crucible part and are formed along the second direction (y-axis direction) and spaced apart in the first direction, and are arranged side by side. The vapor of the vapor deposition material accommodation space is discharged.

The nozzle block 120 of the linear evaporation deposition apparatus 300 may discharge the steam downward in the direction of gravity. Specifically, the gravity direction g may be a second direction (positive y-axis direction). The through nozzle 122 may discharge steam to the substrate 146 disposed below the inner side of the vacuum container 144 in the direction of gravity. The through nozzle may discharge the steam in a downward direction in the gravity direction, which is the second positive direction.

The conductive crucible part 360 may include a crucible body 364, a steam guide part 361, a guide partition 366, a conductive cover part 362, and an insulating cover part 366.

The crucible body 364 may include a deposition material accommodating space 360a extending in the first direction. The vapor guide portion 364 penetrates through the protrusion 361a and the protrusion 361a extending in the first direction and protruding in the negative second direction from the lower surface of the deposition material accommodating space 360a. Guide through holes 361b aligned with the nozzles 122 may be provided. The guide partition 366 may include a partition opening 366a penetrating in the third direction, and may extend side by side in the first direction from both sides of the steam guide part 361. The conductive cover part 362 may cover the vapor guide part 361. The heat insulation cover part 365 may cover the conductive cover part 362. The steam guide part 361 may include a guide opening 361c for communicating the protrusion 361a and the guide through hole 361b.

The steam may be provided to the guide through hole 361b through the guide opening 361c. The steam may be discharged through the guide through hole 361b and the through nozzle 122. The diameter of the guide through hole 361b may be larger than the diameter of the through nozzle 122.

The crucible body 364 may have a rectangular parallelepiped shape extending in the first direction and include a deposition material accommodating space 360a therein. The deposition material 10 may be stored in the deposition material accommodation space 360a. The deposition material 10 may be an organic material used for an organic light emitting diode. The deposition material accommodation space 360a may extend in the first direction in a rectangular cylinder structure.

The vapor guide part 361 may protrude in a second direction from the lower surface of the deposition material accommodating space 360a and extend in the first direction. The steam guide part 361 may be integrally formed with the crucible body 364. The steam guide part 361 may include a guide through hole 361b penetrating the protrusion 361a in a second direction and spaced apart at regular intervals in the first direction. The steam guide part 361 may include a guide opening 361c having the protrusion 361a formed in a third direction, and the guide opening 361c may communicate with the guide through hole 361b.

The protrusion 361a may function as a jaw to prevent the deposition material 10 from overflowing. The steam guide part 361 may be formed of a metal having the same material as the crucible body. The upper surface of the protrusion 361a may have a guide opening 361c extending in the third direction. Side surfaces of the vapor guide part 361 may be filled with a deposition material. As the sidewalls of the vapor guide part 361 and the crucible body 364 are induction heated, the evaporated or sublimed deposition material may be sprayed along the guide through hole 361b and the through nozzle 122.

The guide partition 366 may extend in the first direction from a lower surface of the deposition material accommodating space. The guide partition wall may be disposed at both sides of the protrusion 361a. The guide partition 366 may provide the steam to the guide opening 361c through a guide partition opening 366a.

The conductive cover part 362 may be formed of a conductive material having high electrical conductivity. The conductive cover part 362 may have a plate shape extending in the first direction. The conductive cover part 362 may cover the vapor guide part 361 and be formed of a conductor. The conductive cover part 362 may be heated by an induction electric field or thermal contact with the steam guide part 361. Accordingly, the deposition material may not be deposited on the conductive cover 362. When storing a large amount of deposition material, the conductive cover 362 may be locked by the deposition material. The conductive cover part 362 may include a cover plate 362a extending in the first direction and a cover partition 362b disposed to extend in the first direction from a lower surface of the cover plate 362a. . The cover partition wall may include a cover partition opening 362c opened in a third direction.

The conductive cover part 362 and the steam guide part 361 may be coupled to each other to provide a passage for moving the steam. Accordingly, the deposition material may be injected through the guide through hole 361b of the vapor guide part 361. The steam guide part 361 and the conductive cover part 362 may be heated to about 300 degrees Celsius.

On the other hand, the thermal insulation cover 365 may be disposed above the conductive cover 362 so that the conductive cover 362 does not heat the deposition material on the conductive cover 362. The heat insulation cover part 365 may have a plate shape extending in the first direction. The thermal insulation cover 365 may be an insulator. Specifically, the heat insulating cover portion 365 having good heat insulating properties may be a heat insulating material made of quarts, a porous insulator, or a glass fiber material.

The insulating plate 367 may be disposed along the sidewall of the deposition material accommodating space 360a. The lower side surface of the deposition material accommodating space may have a groove to insert the heat insulating plate. The heat insulating plate 367 may be a quarts, a porous insulator, or a heat insulating material made of glass fiber.

Grooves 364a may be formed between the insulating plate 367 and the inner wall of the crucible body 364. The groove 364a may minimize heat transfer between the heat insulation plate 367 and the sidewall of the crucible body 364.

On the upper surface of the crucible body 364, a sealing plate 368 and an upper plate 369 for pressing the sealing plate 368 may be disposed. The upper plate 369 may be combined with the crucible body to press the sealing plate 368. Accordingly, the deposition material accommodating space 360a may be sealed by the sealing plate. The sealing plate and the upper plate may have a plate shape extending in the first direction.

4A is a perspective view illustrating a linear evaporation deposition apparatus according to another embodiment of the present invention.

4B is a cross-sectional view illustrating the linear evaporation deposition apparatus of FIG. 4A.

4A and 4B, the linear evaporation deposition apparatus 400 includes a conductive crucible part 460, a nozzle block 120, induction heating coils 132 and 134, and an AC power source 136. The conductive crucible part 460 extends in a first direction (x-axis direction), is disposed in the vacuum container 144, accommodates the deposition material in powder form in the deposition material accommodating space 460a, and deposits the deposition material 10. ) To generate steam. The nozzle block 120 has a constant length in the vacuum container along the first direction, a constant height in a second direction (y-axis direction) perpendicular to the first direction, and the first and second directions. It has a rectangular parallelepiped shape having a constant width in a third direction (z-axis direction) perpendicular to the direction, includes a plurality of through nozzles, is mounted on the conductive crucible part 460, and is formed of a conductive material. The induction heating coils 132 and 134 are disposed to surround the nozzle block 120 and the conductive crucible part 460 in the vacuum container 144 and heat the nozzle block and the conductive crucible part. The AC power source 138 provides AC power to the induction heating coil. The plurality of through nozzles 122 are in communication with the deposition material accommodating space 460a of the conductive crucible part and are formed along the second direction (y-axis direction) and spaced apart in the first direction, and are arranged side by side. The vapor of the deposition material accommodating space 460a is discharged.

The through nozzle 122 may discharge the steam in a lateral manner with respect to the gravity direction g, which is the positive third direction. The gravity direction is the third direction, and the nozzle block 120 may be disposed to extend in a direction perpendicular to gravity at the upper side of the conductive crucible 460.

5A is a perspective view illustrating a linear evaporation deposition apparatus according to another embodiment of the present invention.

FIG. 5B is a cross-sectional view illustrating the linear evaporation deposition apparatus of FIG. 5A.

5A and 5B, the linear evaporation deposition apparatus 500 includes a conductive crucible portion 560, a nozzle block 120, an induction heating coil 134, and an AC power source 136. The conductive crucible part 560 extends in a first direction (x-axis direction), is disposed inside the vacuum container 144, accommodates the deposition material in powder form in the deposition material accommodating space 560a, and deposits the deposition material 10. ) To generate steam. The nozzle block 120 has a constant length in the vacuum container along the first direction, a constant height in a second direction (y-axis direction) perpendicular to the first direction, and the first and second directions. It is a rectangular parallelepiped shape having a constant width in a third direction (z-axis direction) perpendicular to the direction, includes a plurality of through nozzles, is mounted on the conductive crucible portion 560, and is formed of a conductive material. The induction heating coil 134 is disposed to surround the nozzle block 120 and the conductive crucible part 560 in the vacuum container 144 and heats the nozzle block and the conductive crucible part. The AC power source 138 provides AC power to the induction heating coil. The plurality of through nozzles 122 are in communication with the deposition material accommodating space 560a of the conductive crucible part and are formed along the second direction (y-axis direction), and are spaced apart from each other in the first direction, and are arranged side by side. The vapor of the vapor deposition material accommodation space is discharged.

The nozzle block 120 may be disposed to be inserted into the conductive crucible part 560. An upper surface of the nozzle block may coincide with an upper surface of the conductive crucible portion 560. In this case, the induction heating coil 132 may be disposed to surround the conductive crucible part 560.

The nozzle block 120 of the linear evaporation deposition apparatus 500 may discharge the steam in a bottom-up manner against gravity. Specifically, the gravity direction g may be a second negative direction (negative y-axis direction). The through nozzle 122 may discharge steam to the substrate 146 disposed above the inner side of the vacuum container 144 against gravity.

6 is a cross-sectional view of a width direction illustrating a linear evaporation deposition apparatus according to another embodiment of the present invention.

Referring to FIG. 6, the linear evaporation deposition apparatus 600 includes a conductive crucible part 660, a nozzle block 120, induction heating coils 132 and 134, and an AC power source 136. The conductive crucible part 660 extends in a first direction (x-axis direction), is disposed inside the vacuum container 144, accommodates the deposition material in powder form in the deposition material accommodating space 660a, and deposits the deposition material 10. ) To generate steam. The nozzle block 120 has a constant length in the vacuum container along the first direction, a constant height in a second direction (y-axis direction) perpendicular to the first direction, and the first and second directions. It has a rectangular parallelepiped shape having a constant width in a third direction (z-axis direction) perpendicular to the direction, includes a plurality of through nozzles, is mounted on the conductive crucible part 660, and is formed of a conductive material. The induction heating coils 132 and 134 are disposed to surround the nozzle block 120 and the conductive crucible part 660 in the vacuum container 144 and heat the nozzle block and the conductive crucible part. The AC power source 138 provides AC power to the induction heating coil. The plurality of through nozzles 122 are in communication with the deposition material accommodating space 660a of the conductive crucible part and are formed along the second direction (y-axis direction) and spaced apart in the first direction, and are arranged side by side. The vapor of the vapor deposition material accommodation space is discharged.

The buffer block 660 may have a cylindrical shape extending in a first direction. The induction heating coils 132 and 134 may extend along the extending direction of the nozzle block at regular intervals from the nozzle block 120 and the buffer block 660.

The nozzle block 120 of the linear evaporation deposition apparatus 600 may discharge the steam in a bottom-up manner against gravity. Specifically, the gravity direction g may be a second negative direction (negative y-axis direction). The through nozzle 122 may discharge steam to the substrate 146 disposed above the inner side of the vacuum container 144 against gravity.

7 is a cross-sectional view showing the shape of a through nozzle according to an embodiment of the present invention.

1 and 7, the linear evaporation deposition apparatus 100 includes a conductive crucible unit 160, a nozzle block 120, induction heating coils 132 and 134, and an AC power source 136. The conductive crucible part 160 extends in a first direction (x-axis direction), is disposed inside the vacuum container 144, accommodates the deposition material in powder form in the deposition material accommodating space 160a, and deposits the deposition material 10. ) To generate steam. The nozzle block 120 has a constant length in the vacuum container along the first direction, a constant height in a second direction (y-axis direction) perpendicular to the first direction, and the first and second directions. It is a rectangular parallelepiped shape having a constant width in a third direction (z-axis direction) perpendicular to the direction, includes a plurality of through nozzles, is mounted on the conductive crucible portion 160, and is formed of a conductive material. The induction heating coils 132 and 134 are disposed to surround the nozzle block 120 and the conductive crucible part 160 in the vacuum container 144 and heat the nozzle block and the conductive crucible part. The AC power source 138 provides AC power to the induction heating coil. The plurality of through nozzles 122 are in communication with the deposition material accommodating space 160a of the conductive crucible part and are formed along the second direction (y-axis direction) and spaced apart in the first direction, and are disposed side by side. The vapor of the vapor deposition material accommodation space is discharged.

For example, the through nozzle (a) comprises a steam inlet, a steam connection, and a steam outlet, the steam inlet gradually decreases in diameter as it proceeds in the discharge direction, and the steam connection has a constant diameter, and the steam outlet The diameter may gradually increase as the discharge direction progresses.

For example, the through nozzle (b) includes a steam inlet and a steam outlet, the steam inlet gradually decreases in diameter as it proceeds in the discharge direction, and the steam outlet may have a constant diameter as it progresses in the discharge direction. have.

For example, the through nozzle c may have a diameter gradually decreasing along the discharge direction.

For example, the through nozzle (d) may include a steam inlet having a constant diameter as it proceeds in the discharge direction and a steam outlet that gradually increases in diameter as it proceeds in the discharge direction.

For example, the through nozzle e may have a diameter gradually increasing in the discharge direction.

For example, as the through nozzle f proceeds in the discharge direction, the diameter gradually increases.

It may include at least one or more areas that increase in diameter and suddenly decrease in diameter.

For example, the through nozzle g may be disposed such that a hole having a constant diameter is inclined in the arrangement plane of the nozzle block.

For example, the through nozzle h may include a nozzle inlet having a constant diameter and a nozzle outlet having a constant diameter having a diameter larger than the diameter of the nozzle inlet. A washer-shaped intermediate nozzle having a diameter smaller than the diameter of the nozzle inlet may be disposed at the boundary between the nozzle inlet and the nozzle outlet.

For example, the through nozzle i may include a nozzle inlet having a constant diameter and a nozzle outlet gradually decreasing in diameter as it proceeds in the discharge direction.

According to a modified embodiment of the present invention, the shape of the through nozzle may be variously modified.

While the invention has been shown and described with respect to certain preferred embodiments thereof, the invention is not limited to these embodiments, and has been claimed by those of ordinary skill in the art to which the invention pertains. It includes all the various forms of embodiments that can be implemented without departing from the spirit.

Claims (13)

A conductive crucible part extending in a first direction and disposed in the vacuum container and accommodating the deposition material in powder form in the deposition material accommodation space and heating the deposition material to generate steam; The inside of the vacuum container has a constant length along the first direction, a constant height in a second direction perpendicular to the first direction, and a constant width in a third direction perpendicular to the first direction and the second direction. A nozzle block having a rectangular parallelepiped shape, comprising a plurality of through nozzles, mounted to the conductive crucible part, and formed of a conductive material; An induction heating coil disposed to enclose the nozzle block and the conductive crucible portion in the vacuum container and to heat the nozzle block and the conductive crucible portion; And An AC power source providing AC power to the induction heating coil, The plurality of through nozzles may be in communication with the deposition material receiving space of the conductive crucible part, respectively formed along the second direction, spaced apart from the first direction, and disposed in parallel with each other, and to discharge vapor from the deposition material containing space. Linear evaporation deposition apparatus characterized by. According to claim 1, The through nozzle has a cylindrical shape, the aspect ratio of the through nozzle (spectral ratio) is a linear evaporation deposition apparatus, characterized in that 5 to 100. According to claim 1, And the through nozzle discharges the steam in a downward direction as opposed to the gravity direction, which is a negative second direction. According to claim 1, The through nozzle discharges the steam in a downward direction in the gravity direction, which is the positive second direction, The conductive crucible part is: A crucible body having a deposition material accommodation space extending in the first direction; A vapor guide part having a protrusion protruding from a lower surface of the deposition material accommodating space and a guide through hole aligned with the through nozzle through the protrusion; A conductive cover part covering the vapor guide part; and Including a heat insulation cover part covering the said conductive cover part, The vapor guide portion comprises a linear evaporation deposition apparatus comprising a guide opening for communicating the protrusion and the guide through-hole. According to claim 1, The through nozzle discharges the steam in a downward direction in the gravity direction, which is the positive second direction, The conductive crucible part is: A crucible body having a deposition material accommodation space extending in the first direction; A vapor guide part having a protrusion extending in the first direction from the lower surface of the deposition material accommodating space and protruding in a negative second direction, and a guide through hole aligned with the through nozzle through the protrusion; A guide partition wall including a partition opening penetrating in the third direction and extending side by side in the first direction on both sides of the vapor guide part; A conductive cover part covering the vapor guide part; and Including a heat insulation cover part covering the said conductive cover part, The vapor guide portion comprises a linear evaporation deposition apparatus comprising a guide opening for communicating the protrusion and the guide through-hole. According to claim 1, The through nozzle discharges the steam in a lateral manner with respect to the gravity direction which is the positive third direction, And the nozzle block is arranged to extend in a direction perpendicular to gravity at an upper side of the conductive crucible. According to claim 1, The plurality of through nozzles include a first row arranged side by side in a first direction, a second row disposed on the left side of the first row, and a third row disposed on the right side of the first row, The nozzles of the second row and the nozzles of the third row are aligned with each other in a second direction, And the nozzles in the first row are disposed between neighboring nozzles in the second row. According to claim 1, And the nozzle block is disposed to be inserted into the conductive crucible part. According to claim 1, And the sum of the cross-sectional areas of the through nozzles is smaller than the cross-sectional area of the conductive crucible part in the plane defined by the second direction and the third direction. According to claim 1, And a diameter of the through nozzle increases or a diameter of the through nozzle increases around both ends of the nozzle block. According to claim 1, The induction heating coil includes a nozzle induction heating coil surrounding the nozzle block and a crucible induction heating coil surrounding the conductive crucible part, And the nozzle induction heating coil and the crucible induction heating coil are electrically connected in series. According to claim 1, And an interval between the induction heating coil, the nozzle block and the conductive crucible portion is changed at least once while extending along the first direction. According to claim 1, The through nozzle is a linear evaporation deposition apparatus, characterized in that the diameter gradually increases as it proceeds in the discharge direction of the steam.

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