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WO2016192049A1 - Fine tantalum powder and manufacturing method thereof - Google Patents

Fine tantalum powder and manufacturing method thereof Download PDF

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Publication number
WO2016192049A1
WO2016192049A1 PCT/CN2015/080620 CN2015080620W WO2016192049A1 WO 2016192049 A1 WO2016192049 A1 WO 2016192049A1 CN 2015080620 W CN2015080620 W CN 2015080620W WO 2016192049 A1 WO2016192049 A1 WO 2016192049A1
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WO
WIPO (PCT)
Prior art keywords
powder
tantalum powder
raw material
tantalum
hydrogenated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2015/080620
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French (fr)
Chinese (zh)
Inventor
李仲香
程越伟
马跃忠
陈学清
王葶
师德军
李霞
童泽堃
张洪刚
赵忠环
魏军祥
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ningxia Orient Tantalum Industry Co Ltd
Original Assignee
Ningxia Orient Tantalum Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ningxia Orient Tantalum Industry Co Ltd filed Critical Ningxia Orient Tantalum Industry Co Ltd
Priority to CN201580077707.5A priority Critical patent/CN107427925A/en
Priority to PCT/CN2015/080620 priority patent/WO2016192049A1/en
Priority to TW104140950A priority patent/TWI596215B/en
Publication of WO2016192049A1 publication Critical patent/WO2016192049A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/02Making metallic powder or suspensions thereof using physical processes
    • B22F9/04Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy

Definitions

  • the invention relates to the field of rare metal smelting, relates to the processing technology of bismuth powder, and in particular to a method for preparing fine bismuth powder.
  • the production method of the sputtering target includes an ingot metallurgy method (I/M method) and a powder metallurgy method (P/M method).
  • I/M method ingot metallurgy method
  • P/M method powder metallurgy method
  • Commonly used targets are generally made of bismuth ingots.
  • the I/M method cannot be used, and only powder metallurgy can be used as a target.
  • a silicon germanium alloy target cannot be used because of the difference in melting point of germanium and silicon and the low toughness of the silicon compound.
  • the P/M method can not make the grain size thinner, so the raw materials used at the beginning need to have the desired grain size, and the more uniform and finer the grains in the target are obtained. The more uniform the film.
  • the performance of the target directly affects the performance of the sputtered film, and for low-density targets, various problems inevitably occur during sputtering.
  • the cluster of particles scattered from the sputtering target is attached to the substrate, which is a cause of major problems such as disconnection of the wiring loop on the substrate. If the density of the target is increased, the particles are greatly reduced during sputtering, and in order to increase the density of the target, the raw material ⁇ powder should have a fine particle size and a high bulk density.
  • refractory metals are difficult to sinter to very high densities.
  • a common method is to press the metal powder into a jacket under pressure sintering, and then carry the powder-coated jacket. Sintering, which is important for the loading conditions of the raw material powder.
  • Sintering which is important for the loading conditions of the raw material powder.
  • hot isostatic pressing increasing the packing density can increase the density of the sintered body, can reduce irregular shrinkage during sintering, generate less cracks, and improve the yield.
  • pressure sintering it is important that the raw material powder is densely packed and uniform. It is well known that for sodium-reduced coral-like tantalum powder, the smaller the particle size, the smaller the corresponding bulk density.
  • For bombardment In the case of ingot hydrogenation of crucible powder, it is difficult to achieve a small average particle size in actual production.
  • the tantalum powder disclosed in the Chinese patents CN102909365A and CN103447544A is obtained by crushing and classifying a hydrogenated tantalum ingot, and has a D50 of >10 ⁇ m. Since the bombardment of the ingot is used as the raw material, the obtained powder particles have a dense spherical shape, and it is difficult to further refine the particle size, and the production cost is greatly improved.
  • a method for making a tantalum powder into a certain size is disclosed in the patent CN1223695A, "Method for Producing Size-Controllable Base Metal Powder and Product Made by the Method", filed by Cabot Corporation.
  • the base powder of the crucible consisting of a substantial portion of the agglomerates of particles comprising a single powder is comminuted to form an intermediate product having a size of from 0.01 to 20 ⁇ m.
  • the tantalum powder manufactured by the patented technology is used for the production of anode blocks for tantalum electrolytic capacitors.
  • the anode block of the tantalum electrolytic capacitor requires a porous structure, it is desirable to have a porous structure as large as possible, and the structure has a small bulk density, generally less than 2.0 g/cm 3 .
  • impurities such as K and Na which are carried in the sodium reduction process are high.
  • an alkali metal such as K or Na has a bad influence on the interface property of a metal-oxide-semiconductor (MOS).
  • MOS metal-oxide-semiconductor
  • the powder Since the final product is used for the production of capacitor electrodes, it is required that the powder has good fluidity, and at the same time, the powder particles have large pores inside, so that the capacitor made thereof has good electrical properties, so the patent selects the intermediate product. With a higher heat treatment temperature (greater than 1200 ° C) treatment, the particle size of the final product is significantly increased, D50> 100 ⁇ m, which is not suitable for sputtering targets.
  • the cerium powder after sodium reduction is directly pulverized without being subjected to high temperature treatment.
  • the size distribution of the tantalum powder is broad and polydisperse, which results in the presence of some ultrafine powder particles ("ultrafine particles” refers to particles having a particle size of less than 100 nm) due to their activity. High, it is easy to occur in the process of powdering and burning, there is a certain safety hazard.
  • the production process of the conventional tantalum powder can no longer meet the production requirements.
  • the present invention provides a fine bismuth powder characterized by an average particle diameter D50 ⁇ 5 ⁇ m, preferably D50 ⁇ 4.5 ⁇ m, and a bulk density of 2-6 g/cm 3 , preferably 2.2-4.5 g/cm 3 .
  • the niobium powder has a K+Na content of not more than 20 ppm, preferably not more than 15 ppm, more preferably not more than 10 ppm; optionally an oxygen content of not more than 6000 ppm, preferably not more than 4000 ppm, more preferably not more than 3500ppm.
  • the present invention provides a method of producing the powder. Specifically, the method includes:
  • the high temperature sintering is carried out under high vacuum conditions, for example, 10 -2 -10 -5 Pa, preferably about 10 -3 Pa.
  • the sintering temperature of the high-temperature sintering is 1400 to 2000 ° C, and preferably, the holding time at the sintering temperature is 1-5 hours, preferably 2-3 hours.
  • the powdered raw material may be, for example, derived from waste tantalum powder recovered during the production of tantalum powder for capacitors, or may be specially produced tantalum powder, for example, sodium reduced tantalum powder. It should be understood that tantalum powder for capacitors is also generally produced by sodium reduction.
  • the sodium reduced niobium powder refers to the tantalum powder obtained by the process of reducing sodium fluoroantimonate by sodium metal, which is one of the most commonly used processes for preparing tantalum powder.
  • the waste tantalum powder produced in the production process of the tantalum powder for capacitors is used, in particular, the waste tantalum powder is produced as a raw material in the production process of the high specific volume tantalum powder for capacitors, the production cost can be remarkably reduced.
  • the high-temperature sintering is performed by heating the raw material tantalum powder to a vacuum (a vacuum degree of generally 10 -2 Pa - 10 -5 Pa, preferably about 10 -3 Pa) to 1200-2000 ° C (for example, 1400). °C, 1500 ° C, 1800 ° C) 1-5 hours (for example, 2 hours, 3 hours, 4 hours), after the end of sintering, cooling, passivation treatment to obtain a bismuth agglomerate.
  • a vacuum a vacuum degree of generally 10 -2 Pa - 10 -5 Pa, preferably about 10 -3 Pa
  • 1200-2000 ° C for example, 1400.
  • °C, 1500 ° C, 1800 ° C 1-5 hours for example, 2 hours, 3 hours, 4 hours
  • a temperature of 1200-2000 ° C is preferred because it can avoid the adhesion of tantalum powder and niobium sintering which may be caused by excessive heat treatment temperature, resulting in difficulty in peeling, increasing labor intensity, reducing niobium service life, increasing cost, and It is not necessary to avoid partial ultrafine particle agglomeration which may be caused by too low heat treatment temperature. During the crushing process, some ultra-fine powders with higher activity are re-agglomerated, which is not conducive to micro-fine grinding or loss of ignition materials.
  • the hydrocracking in the step 3) means that the agglomerate obtained in the step 2) is heated and hydrogen is absorbed to obtain a crucible having good hydrogen embrittlement, and then the powder is crushed by a mechanical method to obtain a crucible powder which can pass through a 100 mesh sieve. It is then preferably further crushed by methods such as ball milling, impact, extrusion, etc. to further reduce the particle size, for example to a D50 ⁇ 5 ⁇ m.
  • the tantalum powder is also pickled (for example with a mixed acid of HNO 3 and HF) to remove metallic impurities.
  • the hydrogen content of the hydrogenated clam block there is no restriction on the hydrogen content of the hydrogenated clam block. However, it has been unexpectedly found that it is preferred if the hydrogen content of the ruthenium block after hydrogenation is not less than 4,000 ppm. Because if the hydrogen content is too low, although the object of the present invention can also be achieved, the hydrogen embrittlement is not good enough, and it is difficult to perform fine crushing during the ball mill crushing process, and it becomes flat flat powder because of its ductility. The control of the D50 is unfavorable.
  • the crushing method in the hydrogenation crushing process is preferably performed by mechanically breaking up to pass through a 100 mesh sieve, using a wet agitating ball mill, for example, using zirconia balls as a ball milling medium, water or an organic solvent as a dispersion medium, and continuously ball milling until D50 ⁇ 5 ⁇ m. . It has been found that a ball milling time of 0.5-4 h (e.g., 1-3 h) can satisfactorily achieve a D50 < 5 m. Due to the high hardness of the hydrogenated tantalum powder, the use of ordinary stainless steel ball grinding causes severe wear on the stainless steel ball, and a large amount of metal impurities are mixed into the material, resulting in a high impurity content. In order to improve the purity of the final product, it is preferred to use a higher hardness zirconia ball instead of a stainless steel ball for grinding.
  • a smaller grinding medium ball is used for the grinding.
  • the grinding medium with a small diameter has a large filling amount in the grinding chamber, which increases the impact and friction of the grinding medium, increases the contact area of the grinding medium, and increases the grinding area, which also contributes to fine pulverization. It has been unexpectedly found that a grinding ball having a diameter of from 1 to 5 mm, preferably from 2 to 4 mm, can achieve a better grinding effect.
  • the present invention requires a product having a finer particle size (D50 ⁇ 5 ⁇ m), but it may be difficult to avoid the production of ultrafine powders having a particle size of less than 0.1 ⁇ m during ball milling, which are often susceptible to oxidation or even spontaneous combustion, which seriously affects the performance of the powder, resulting in production failure.
  • the finer particle size of the powder due to the finer particle size of the powder, the larger the surface area, the larger the surface free energy, resulting in re-agglomeration of the particles, which is not conducive to micro-fine grinding.
  • a surfactant as a grinding aid to the dispersion medium.
  • the material particles can be surface passivated while miniaturizing the ball mill, which can effectively inhibit the oxidation of the ultrafine powder during ball milling and subsequent processing, and ensure the product. quality.
  • Preferred grinding aids are butanone and/or isopropanol. More preferably, the grinding aid is added in an amount of from 0.5 to 5%, preferably from 1 to 4%, more preferably from 1.8 to 3.6% by weight of the niobium powder.
  • the dehydrogenation and oxygen reduction used in the present invention may be conventional dehydrogenation and oxygen reduction.
  • it can be carried out by generally adding a small amount of a reducing agent having an affinity for oxygen to the affinity of oxygen, such as an alkaline earth metal, a rare earth metal and a hydride thereof, in the tantalum powder, and the most common one is in the tantalum powder.
  • a reducing agent having an affinity for oxygen such as an alkaline earth metal, a rare earth metal and a hydride thereof
  • pickling and decontamination can reduce impurities such as oxygen, carbon, iron, nickel, chromium, and the like in the tantalum powder.
  • the tantalum powder can be pickled by mixing with 10% by mass of HNO 3 , the solid-liquid ratio of tantalum powder to HNO 3 is 1:1, and stirring for 10-90 minutes to dissolve the impurity metal in the tantalum powder, for example, reducing property.
  • the metal and its oxide are then filtered to remove the spent acid solution, which is then dried and sieved.
  • the bulk density in the present invention is measured in accordance with GB/T 1479 "Determination of the bulk density of metal powders", Part 1, "Funnel method”.
  • the particle size distribution and median particle size (D50) of the powders produced by the present invention were measured using a Malvern instrument Mastersizer 2000.
  • the high-temperature sintering described in the present invention brings many advantages: for example, 1). Since the raw material tantalum powder (sodium-reduced tantalum powder) is subjected to high-temperature heat treatment, fine particles are coagulated, adhered, grown, and tend to The homogenization reduces the activity of the powder and greatly reduces the risk of ignition during the subsequent mechanical crushing process. At the same time, due to the decrease in the activity of the powder, the possibility of re-agglomeration of the particles during the late crushing process is reduced, which is advantageous for fine grinding. 2).
  • the degree of densification of the tantalum powder particles is increased by high-temperature sintering, which is beneficial to the control of the final oxygen content, and the corresponding bulk density is greatly increased. 3).
  • high-temperature sintering the alkali metal such as K, Na, etc. brought in during the sodium reduction process escapes, and the purpose of purification is achieved.
  • alkali metals such as K, Na, etc. have a very bad influence on the interfacial properties of metal-oxide-semiconductor (MOS).
  • the gas impurities and moisture adsorbed on the surface of the tantalum powder can be removed, and the oxide film on the surface of the tantalum powder can be activated to increase the permeability of hydrogen gas, increase the hydrogenation effect, and avoid subsequent crushing due to incomplete hydrogenation.
  • the large particles appearing in the process are not easily broken, resulting in a dispersion of the particle size distribution and a "tail". The presence of large particles causes uneven thickness of the deposited film and decreases reliability.
  • the bulk density as referred to herein refers to the mass of the metal powder that is freely filled per unit volume under the specific conditions of no vibration or no pressure.
  • the present invention has one or more of the following advantages:
  • the waste crucible powder produced in the production process of the capacitor with the high specific volume powder can be used as the raw material, the resource utilization is reasonable, the cost is low, and the adaptability to the raw material is strong;
  • the process has a high safety factor.
  • Example 1 Raw material bismuth powder-1 as shown in Table 1 was used.
  • the tantalum powder was heated to 1400 ° C under vacuum for 10 -3 Pa for 180 minutes, cooled, passivated, and baked to obtain a sintered mass.
  • the agglomerate was heated to 800 ° C, cooled and subjected to hydrogenation treatment to obtain a crucible having good hydrogen embrittlement, and then the powder was crushed to obtain a crucible powder which was completely passed through a 100 mesh sieve.
  • the above-mentioned glutinous powder is made of anhydrous ethanol as a ball milling medium, and methyl ethyl ketone is used as a grinding aid (the amount of methyl ketone added is 0.5% of the weight of cerium powder), and the mixed acid of HNO 3 and HF is used after wet stirring ball milling for 0.5 hour.
  • the metal impurities were removed by washing, and dried through a 200 mesh sieve to obtain a hydrogenated tantalum powder.
  • Add 2% magnesium chips to the hydrogenated tantalum powder heat it to 850 ° C for 2 hours in a closed oven under argon atmosphere, then vacuum again, and then heat-cool for 3 hours, then cool down and passivate.
  • the tantalum powder with reduced oxygen concentration is dehydrogenated 10% by mass of HNO 3 mixed with tantalum powder of the solid-liquid mass ratio of 1 HNO 3, stirred for 60min, tantalum powder was dissolved in magnesium and magnesium oxide, and then filtered The spent acid solution was removed, dried in a tray, and sieved to obtain a tantalum powder sample 1-1 of the present invention.
  • the main impurity content, bulk density and size distribution are shown in Table 1.
  • Example 2 Raw material bismuth powder-1 as shown in Table 1 was still used.
  • the tantalum powder was heated to 1600 ° C for 10 minutes under vacuum of 10 -3 Pa, cooled, passivated, and baked to obtain a sintered mass.
  • the agglomerate was heated to 800 ° C, cooled and subjected to hydrogenation treatment to obtain a crucible having good hydrogen embrittlement, and then the powder was crushed to obtain a crucible powder which was completely passed through a 100 mesh sieve.
  • the above-mentioned glutinous powder is made of anhydrous ethanol as a ball milling medium, and methyl ethyl ketone and isopropanol are used as grinding aids (the amount of methyl ethyl ketone added is 0.5% by weight of cerium powder, and the amount of isopropyl alcohol ketone added is 2.0 by weight of strontium powder). %), after performing wet agitating ball milling for 1.5 h, the metal impurities were removed by acid pickling with HNO 3 and HF, and dried to a 200 mesh sieve to obtain a hydrogenated tantalum powder.
  • Comparative Example 1 Raw material bismuth powder-1 as shown in Table 1 was still used.
  • the tantalum powder was directly subjected to wet agitating ball milling without heat treatment for 1.5 hours, and then washed with a mixed acid of HNO 3 and HF to remove metal impurities, and dried through a 200 mesh sieve to obtain a hydrogenated tantalum powder.
  • Add 2% magnesium chips to the hydrogenated tantalum powder heat it to 850 ° C for 3 hours in a closed oven, then vacuum, and then heat for 3 hours, then cool down and passivate. A non-hydrogen-containing tantalum powder is obtained.
  • the dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration.
  • the acid solution was dried and sieved to obtain a comparative powder sample 1-1.
  • the main impurity content, bulk density and size distribution are shown in Table 1.
  • Example 3 Raw material tantalum powder-2 as described in Table 1 was used as a raw material.
  • the tantalum powder was heated to 1800 ° C under vacuum for 10 -3 Pa for 120 minutes, cooled, passivated, and baked to obtain a sintered mass.
  • the agglomerate was heated to 800 ° C, cooled and subjected to hydrogenation treatment to obtain a crucible having good hydrogen embrittlement, and then the powder was crushed to obtain a crucible powder which was completely passed through a 100 mesh sieve.
  • the above-mentioned glutinous rice powder is made of anhydrous ethanol as a ball milling medium, and methyl ethyl ketone and isopropyl alcohol are used as grinding aids (the amount of methyl ethyl ketone added is 1.0% by weight of cerium powder, and the amount of isopropyl alcohol ketone added is 3.0 by weight of strontium powder). %), after performing wet agitating ball milling for 1.5 h, the metal impurities were removed by acid pickling with HNO 3 and HF, and dried to a 200 mesh sieve to obtain a hydrogenated tantalum powder.
  • Comparative Example 2 Raw material tantalum powder-2 as described in Table 1 was still used as a raw material.
  • the tantalum powder is directly heated to 800 ° C without heat treatment, and then subjected to hydrogenation treatment to obtain a hydrogenated tantalum powder, which is then ball milled by wet stirring for 1.5 hours, and then washed with a mixed acid of HNO 3 and HF to remove metal impurities and dried.
  • a 200 mesh sieve gave a hydrogenated tantalum powder.
  • Add 2% magnesium chips to the hydrogenated tantalum powder heat it to 830 ° C for 2 hours in a closed oven, then vacuum, and then heat for 3 hours, then cool down and passivate. A dehydrogenated and oxygen-reducing tantalum powder is obtained.
  • the dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration.
  • the acid solution was dried and sieved to obtain a bismuth powder comparative sample 2-1 of the present invention.
  • the main impurity content, bulk density and size distribution are shown in Table 1.
  • Example 4 The raw material tantalum powder-2 as described in Table 1 was still used as a raw material.
  • the tantalum powder was heated to 1950 ° C for 120 minutes under vacuum of 10 -3 Pa, cooled, passivated, and baked to obtain a sintered cake.
  • the agglomerate was heated to 800 ° C, cooled and subjected to hydrogenation treatment to obtain a crucible having good hydrogen embrittlement, and then the powder was crushed to obtain a crucible powder which was completely passed through a 100 mesh sieve.
  • the above-mentioned glutinous powder was prepared by using anhydrous ethanol as a ball milling medium and isopropanol as a grinding aid (the amount of isopropanol ketone added was 5.0% by weight of the cerium powder), and mixing with HNO 3 and HF after wet stirring ball milling for 3 hours.
  • the acid pickling removes the metal impurities and is dried over a 200 mesh sieve to obtain a hydrogenated tantalum powder.
  • Add 2% magnesium chips to the hydrogenated tantalum powder heat it to 830 ° C for 2 hours in a closed oven, then vacuum, and then heat for 3 hours, then cool down and passivate. A dehydrogenated and oxygen-reducing tantalum powder is obtained.
  • the dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration.
  • the acid solution was dried in a tray and sieved to obtain a tantalum powder sample 2-2 of the present invention.
  • the main impurity content, bulk density and size distribution are shown in Table 1.
  • Comparative Example 3 The raw material tantalum powder-2 as described in Table 1 was still used as a raw material.
  • the tantalum powder is directly heated to 800 ° C without heat treatment, and then subjected to hydrogenation treatment to obtain a hydrogenated tantalum powder, which is then ball milled by wet stirring for 3 hours, and then washed with a mixed acid of HNO 3 and HF to remove metal impurities, and dried and discharged. There was a fire and the material was not processed. For convenience of comparison, it is still indicated by the comparison sample 2-2 in the table.
  • Example 5 Raw material tantalum powder-3 as described in Table 1 was used as a raw material.
  • the tantalum powder was heated to 1500 ° C under vacuum for 10 -3 Pa for 180 minutes, cooled, passivated, and baked to obtain a sintered mass.
  • the agglomerate was heated to 800 ° C, cooled and subjected to hydrogenation treatment to obtain a crucible having good hydrogen embrittlement, and then the powder was crushed to obtain a crucible powder which was completely passed through a 100 mesh sieve.
  • the above-mentioned glutinous powder is made of anhydrous ethanol as a ball milling medium, butanone is used as a grinding aid (the amount of methyl ethyl ketone added is 1.5% of the weight of cerium powder), and the mixed acid of HNO 3 and HF is used after wet stirring ball milling for 2.0 hours.
  • the metal impurities were removed by washing, and dried through a 200 mesh sieve to obtain a hydrogenated tantalum powder.
  • Add 2% magnesium chips to the hydrogenated tantalum powder heat it to 850 ° C for 2 hours in a closed oven, then vacuum, and then heat for 3 hours, then cool down and passivate.
  • the bismuth powder after dehydrogenation and oxygen reduction is obtained.
  • the dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration.
  • the acid solution was again dried in a tray and sieved to obtain a tantalum powder sample 3-1 of the present invention.
  • the main impurity content, bulk density and size distribution are shown in Table 1.
  • Comparative Example 4 The raw material ⁇ powder-3 in Table 1 was still used as a raw material.
  • the tantalum powder was directly subjected to wet stirring ball milling for 2.0 hours without heat treatment, and then the metal impurities were removed by acid pickling with HNO3 and HF, and dried to a 200 mesh sieve to obtain a hydrogenated tantalum powder.
  • Add 2% magnesium chips to the hydrogenated tantalum powder heat it to 850 ° C for 3 hours in a closed oven, then vacuum, and then heat for 3 hours, then cool down and passivate. A dehydrogenated and oxygen-reducing tantalum powder is obtained.
  • the dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration.
  • the acid solution was dried and sieved to obtain a comparative bismuth powder comparison sample 3-1.
  • the main impurity content, bulk density and size distribution are shown in Table 1.
  • the cerium powder treated by the method of the present invention has a concentrated particle size distribution range and a small size, D50 ⁇ 5 ⁇ m, and has a low O, K, Na impurity content and a large bulk density.

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  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
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Abstract

Provided is a fine tantalum powder. The fine tantalum powder has a D50 < 5 µm, preferably a D50 < 4.5 µm, and an apparent density of 2.0-6.0 g/cm3, preferably 2.2-4.5 g/cm3. Also provided is a method for manufacturing the fine tantalum powder, comprising: 1) providing a sodium reduced tantalum powder as a raw material; 2) sintering the raw material with a high temperature to obtain a sintered block; 3) performing hydrogen decrepitation of the sintered block to obtain a hydrogenated tantalum powder; and 4) dehydrogenating, deoxygenating, pickling, drying and sifting the hydrogenated tantalum powder.

Description

一种微细钽粉及其制备方法Microfine powder and preparation method thereof 技术领域Technical field

本发明涉及稀有金属冶炼领域,涉及钽粉末的加工技术,特别地涉及微细钽粉末的制作方法。The invention relates to the field of rare metal smelting, relates to the processing technology of bismuth powder, and in particular to a method for preparing fine bismuth powder.

背景技术Background technique

近年来,半导体技术飞跃发展,开发出了各种各样的电子装置。半导体技术要求电子装置的小型化,使集成程度提高,在很多工序中需要采用薄膜形成工艺。钽用作溅射膜的需求量也相应地逐渐增加,特别是在集成电路中在硅和铜导体之间作为扩散阻挡层。溅射靶的生产方法包括锭冶金法(I/M法)和粉末冶金法(P/M法)。常用的靶一般选用钽锭制成。但在某些特殊情况(例如要求高的情况)下I/M法不能使用,只能用粉末冶金法做靶。例如:钽硅合金靶,这是因为钽和硅的熔点不同及硅化合物的韧性低等原因而不能使用I/M法。与I/M法相比,P/M法热加工过程不能使晶粒尺寸变细,所以在一开始所用原料就要求具有所希望的晶粒尺寸,而靶中的晶粒越均匀越细得到的膜越均匀。靶的性能直接影响到溅射膜的性能,对于低密度的靶,溅射时不可避免地发生各种问题。例如,从溅射靶飞散出的粒子群集附在基片上,是基片上的布线回路出现断路等重大问题的原因。如果靶的密度提高,在溅射时粒子就会大大减少,而要想提高钽靶的密度,采用原料钽粉末就应当粒度细,松装密度大。In recent years, semiconductor technology has developed rapidly and various electronic devices have been developed. Semiconductor technology requires miniaturization of electronic devices to increase integration, and a thin film formation process is required in many processes. The demand for ruthenium as a sputter film has also increased correspondingly, especially as a diffusion barrier between silicon and copper conductors in integrated circuits. The production method of the sputtering target includes an ingot metallurgy method (I/M method) and a powder metallurgy method (P/M method). Commonly used targets are generally made of bismuth ingots. However, in some special cases (such as high requirements), the I/M method cannot be used, and only powder metallurgy can be used as a target. For example, a silicon germanium alloy target cannot be used because of the difference in melting point of germanium and silicon and the low toughness of the silicon compound. Compared with the I/M method, the P/M method can not make the grain size thinner, so the raw materials used at the beginning need to have the desired grain size, and the more uniform and finer the grains in the target are obtained. The more uniform the film. The performance of the target directly affects the performance of the sputtered film, and for low-density targets, various problems inevitably occur during sputtering. For example, the cluster of particles scattered from the sputtering target is attached to the substrate, which is a cause of major problems such as disconnection of the wiring loop on the substrate. If the density of the target is increased, the particles are greatly reduced during sputtering, and in order to increase the density of the target, the raw material 钽 powder should have a fine particle size and a high bulk density.

一般来说,难熔金属很难烧结到很高的密度,为了增加烧结体的密度,一种常用的方法是压力烧结即把金属粉末装在包套里,然后对装有粉末的包套进行烧结,这对原材料粉末的装填条件很重要。在热等静压时,增加装填密度可以增加烧结体的密度,可以减少在烧结中的不规则收缩,产生较少裂纹,提高成品率。换句话说,在进行压力烧结时,原料粉末装填密度大而均匀很重要。众所周知,对于钠还原的珊瑚状钽粉来说,其粒径越小,相应的松装密度越小。而对于轰击 锭氢化破碎钽粉来说,要想得到很小的平均粒径,在实际生产中是很难做到的。In general, refractory metals are difficult to sinter to very high densities. In order to increase the density of sintered bodies, a common method is to press the metal powder into a jacket under pressure sintering, and then carry the powder-coated jacket. Sintering, which is important for the loading conditions of the raw material powder. In the case of hot isostatic pressing, increasing the packing density can increase the density of the sintered body, can reduce irregular shrinkage during sintering, generate less cracks, and improve the yield. In other words, when pressure sintering is performed, it is important that the raw material powder is densely packed and uniform. It is well known that for sodium-reduced coral-like tantalum powder, the smaller the particle size, the smaller the corresponding bulk density. For bombardment In the case of ingot hydrogenation of crucible powder, it is difficult to achieve a small average particle size in actual production.

例如,中国专利CN102909365A、CN103447544A公开的钽粉,其选用经过氢化的钽锭经过破碎、分级得到,其D50>10μm。由于其选用轰击钽锭为原料,所得粉末粒子形貌为致密的球形,进一步细化粒径比较困难,且生产成本大幅度提高。For example, the tantalum powder disclosed in the Chinese patents CN102909365A and CN103447544A is obtained by crushing and classifying a hydrogenated tantalum ingot, and has a D50 of >10 μm. Since the bombardment of the ingot is used as the raw material, the obtained powder particles have a dense spherical shape, and it is difficult to further refine the particle size, and the production cost is greatly improved.

由卡伯特公司申请的专利CN1223695A《制造尺寸分布可控的钽金属粉末的方法及用该法制成的产物》中公开了一种将钽粉制成一定尺寸的方法。即将含有单个粉末的颗粒组成的基本部分团块的钽的基本粉末粉碎,其所形成的中间产物尺寸为0.01-20μm。但该专利技术所制造的钽粉用于钽电解电容器阳极块生产。因为钽电解电容器阳极块要求多孔状结构,所以钽粉也希望具有尽可能大的多孔状结构,此结构钽粉松装密度较小,一般小于2.0g/cm3。同时,由于其未经过高温处理,钠还原过程中带入的碱金属如K、Na等杂质较高。在半导体装置中,K、Na等碱金属对金属-氧化物-半导体(MOS)的界面性能有很坏的影响。由于其最终产品用于生产电容器电极,要求钽粉具有好的流动性,同时,钽粉颗粒内部具有较大的孔隙,以便用其制作的电容器具有好的电器性能,所以该专利选择对中间产物采用了较高的热处理温度(大于1200℃)处理,其最终产品的粒径明显增大,D50>100μm,不适用于溅射靶。A method for making a tantalum powder into a certain size is disclosed in the patent CN1223695A, "Method for Producing Size-Controllable Base Metal Powder and Product Made by the Method", filed by Cabot Corporation. The base powder of the crucible consisting of a substantial portion of the agglomerates of particles comprising a single powder is comminuted to form an intermediate product having a size of from 0.01 to 20 μm. However, the tantalum powder manufactured by the patented technology is used for the production of anode blocks for tantalum electrolytic capacitors. Since the anode block of the tantalum electrolytic capacitor requires a porous structure, it is desirable to have a porous structure as large as possible, and the structure has a small bulk density, generally less than 2.0 g/cm 3 . At the same time, since it has not been subjected to high temperature treatment, impurities such as K and Na which are carried in the sodium reduction process are high. In a semiconductor device, an alkali metal such as K or Na has a bad influence on the interface property of a metal-oxide-semiconductor (MOS). Since the final product is used for the production of capacitor electrodes, it is required that the powder has good fluidity, and at the same time, the powder particles have large pores inside, so that the capacitor made thereof has good electrical properties, so the patent selects the intermediate product. With a higher heat treatment temperature (greater than 1200 ° C) treatment, the particle size of the final product is significantly increased, D50> 100 μm, which is not suitable for sputtering targets.

另外,考虑到其处理方法,是对钠还原后的钽粉末未进行高温处理而直接进行了粉碎。正如专利中所述的钠还原技术得到的钽粉末尺寸分布宽且呈多分散分布,这就导致部分超细粉颗粒(“超细颗粒”是指粒度小于100nm的颗粒)存在,由于其活性较高,在处理过程中容易发生钽粉着火,存在一定得安全隐患。Further, in consideration of the treatment method, the cerium powder after sodium reduction is directly pulverized without being subjected to high temperature treatment. As the sodium reduction technique described in the patent, the size distribution of the tantalum powder is broad and polydisperse, which results in the presence of some ultrafine powder particles ("ultrafine particles" refers to particles having a particle size of less than 100 nm) due to their activity. High, it is easy to occur in the process of powdering and burning, there is a certain safety hazard.

综上所述,随着溅射薄膜对原料粉末粒度的要求向微细化、均匀化方向发展,传统钽粉的生产工艺已经不能满足生产的要求。In summary, as the sputtering film has a requirement for the particle size of the raw material powder to be refined and homogenized, the production process of the conventional tantalum powder can no longer meet the production requirements.

发明内容 Summary of the invention

本发明的目的在于克服上述缺陷中的一种或多种,提供性能更好的钽粉及其生产方法。It is an object of the present invention to overcome one or more of the above disadvantages and to provide a better performance tantalum powder and a method of producing the same.

本发明提供一种微细钽粉末,其特征是平均粒径D50<5μm,优选D50<4.5μm,同时其松装密度为2-6g/cm3,优选2.2-4.5g/cm3The present invention provides a fine bismuth powder characterized by an average particle diameter D50 < 5 μm, preferably D50 < 4.5 μm, and a bulk density of 2-6 g/cm 3 , preferably 2.2-4.5 g/cm 3 .

优选地,该钽粉的K+Na含量不高于20ppm,优选不高于15ppm,更优选不高于10ppm;任选地氧含量不高于6000ppm,优选不高于4000ppm,更优选不高于3500ppm。Preferably, the niobium powder has a K+Na content of not more than 20 ppm, preferably not more than 15 ppm, more preferably not more than 10 ppm; optionally an oxygen content of not more than 6000 ppm, preferably not more than 4000 ppm, more preferably not more than 3500ppm.

特别地,为了降低处理过程中钽粉着火的风险,本发明提供一种生产该粉末的方法。具体地,该方法依次包括:In particular, in order to reduce the risk of powder fire during processing, the present invention provides a method of producing the powder. Specifically, the method includes:

1)提供钽粉原料;1) providing powdered raw materials;

2)将所述原料进行高温烧结,得到烧结块;2) sintering the raw material at a high temperature to obtain a sintered block;

3)对烧结块进行氢化破碎以得到氢化的钽粉(即经过氢化的钽粉);3) hydrocracking the agglomerate to obtain hydrogenated tantalum powder (ie, hydrogenated tantalum powder);

4)对氢化的钽粉进行脱氢降氧、酸洗、烘干和过筛。4) Dehydrogenation, oxygenation, pickling, drying and sieving of the hydrogenated tantalum powder.

优选地,所述高温烧结是在高真空条件,例如10-2-10-5Pa,优选约10-3Pa下进行的。Preferably, the high temperature sintering is carried out under high vacuum conditions, for example, 10 -2 -10 -5 Pa, preferably about 10 -3 Pa.

优选地,所述高温烧结的烧结温度为1400-2000℃,优选地,在烧结温度下的保温时间为1-5小时,优选2-3小时。Preferably, the sintering temperature of the high-temperature sintering is 1400 to 2000 ° C, and preferably, the holding time at the sintering temperature is 1-5 hours, preferably 2-3 hours.

所述的钽粉原料可以例如来自于电容器用钽粉生产过程中回收的废钽粉,也可以是特意生产的钽粉,例如采用钠还原钽粉。应理解,电容器用钽粉一般也是用钠还原法生产的。The powdered raw material may be, for example, derived from waste tantalum powder recovered during the production of tantalum powder for capacitors, or may be specially produced tantalum powder, for example, sodium reduced tantalum powder. It should be understood that tantalum powder for capacitors is also generally produced by sodium reduction.

应理解,钠还原钽粉是指用金属钠还原氟钽酸钾工艺得到的钽粉,该工艺为目前最常用的制备钽粉的工艺之一。在本发明中,如果采用电容器用钽粉的生产过程中产生的废钽粉,特别是电容器用高比容钽粉的生产过程中产生废钽粉作为原料,可以显著降低生产成本。It should be understood that the sodium reduced niobium powder refers to the tantalum powder obtained by the process of reducing sodium fluoroantimonate by sodium metal, which is one of the most commonly used processes for preparing tantalum powder. In the present invention, if the waste tantalum powder produced in the production process of the tantalum powder for capacitors is used, in particular, the waste tantalum powder is produced as a raw material in the production process of the high specific volume tantalum powder for capacitors, the production cost can be remarkably reduced.

在本发明中,所述的高温烧结是将原料钽粉在真空(真空度一般为10-2Pa-10-5Pa,优选为约10-3Pa)下加热到1200-2000℃(例如1400℃、1500℃、1800℃)保温1-5小时(例如2小时、3小时、4 小时),烧结结束后进行降温、钝化处理得到钽烧结块。In the present invention, the high-temperature sintering is performed by heating the raw material tantalum powder to a vacuum (a vacuum degree of generally 10 -2 Pa - 10 -5 Pa, preferably about 10 -3 Pa) to 1200-2000 ° C (for example, 1400). °C, 1500 ° C, 1800 ° C) 1-5 hours (for example, 2 hours, 3 hours, 4 hours), after the end of sintering, cooling, passivation treatment to obtain a bismuth agglomerate.

1200-2000℃的温度是优选的,因为这既可避免因过高的热处理温度而可能造成的钽粉与坩埚烧结粘连,导致难以剥离,增加劳动强度,降低坩埚使用寿命,增加成本,又可避免因过低的热处理温度可能导致的部分超细颗粒团化不彻底,在破碎过程中出现一些活性较高的超细粉末重新凝聚而不利于粉末微细化粉碎或发生着火物料损失。A temperature of 1200-2000 ° C is preferred because it can avoid the adhesion of tantalum powder and niobium sintering which may be caused by excessive heat treatment temperature, resulting in difficulty in peeling, increasing labor intensity, reducing niobium service life, increasing cost, and It is not necessary to avoid partial ultrafine particle agglomeration which may be caused by too low heat treatment temperature. During the crushing process, some ultra-fine powders with higher activity are re-agglomerated, which is not conducive to micro-fine grinding or loss of ignition materials.

步骤3)中的氢化破碎是指将步骤2)得到的烧结块加热、吸氢,得到具有良好氢脆性的钽块,然后采用机械方法破碎制粉,得到完全能通过100目筛的钽粉,然后优选进一步采用如球磨、冲击、挤压等方法进行破碎,使其进一步降低粒度,例如达到D50<5μm。任选地,还对钽粉进行酸洗(例如采用HNO3和HF的混合酸)以去除金属杂质。The hydrocracking in the step 3) means that the agglomerate obtained in the step 2) is heated and hydrogen is absorbed to obtain a crucible having good hydrogen embrittlement, and then the powder is crushed by a mechanical method to obtain a crucible powder which can pass through a 100 mesh sieve. It is then preferably further crushed by methods such as ball milling, impact, extrusion, etc. to further reduce the particle size, for example to a D50 < 5 μm. Optionally, the tantalum powder is also pickled (for example with a mixed acid of HNO 3 and HF) to remove metallic impurities.

对氢化后的钽块的氢含量不加限制。然而,意外发现,如果氢化后的钽块氢含量不低于4000ppm,则是优选的。因为如果氢含量过低,虽然也能实现本发明的目的,但氢脆性不够好,球磨破碎过程中不易进行微细破碎,由于其存在一定得延展性而使其变成扁平状钽粉,这对D50的控制是不利的。There is no restriction on the hydrogen content of the hydrogenated clam block. However, it has been unexpectedly found that it is preferred if the hydrogen content of the ruthenium block after hydrogenation is not less than 4,000 ppm. Because if the hydrogen content is too low, although the object of the present invention can also be achieved, the hydrogen embrittlement is not good enough, and it is difficult to perform fine crushing during the ball mill crushing process, and it becomes flat flat powder because of its ductility. The control of the D50 is unfavorable.

氢化破碎过程中的破碎方式优选是在采用机械方法破碎到能通过100目筛后使用湿式搅拌球磨,例如以氧化锆球为球磨介质,以水或有机溶剂为分散介质,连续球磨直到D50<5μm。已发现,0.5-4h(例如1-3h)的球磨时间已经可以满意地实现D50<5μm。由于氢化的钽粉硬度较高,采用一般的不锈钢球研磨会造成对不锈钢球的严重磨损,使大量的金属杂质混入物料中,导致杂质含量偏高。为了提高最终产品的纯度,优选采用硬度较高的氧化锆球而非不锈钢球进行研磨。The crushing method in the hydrogenation crushing process is preferably performed by mechanically breaking up to pass through a 100 mesh sieve, using a wet agitating ball mill, for example, using zirconia balls as a ball milling medium, water or an organic solvent as a dispersion medium, and continuously ball milling until D50 < 5 μm. . It has been found that a ball milling time of 0.5-4 h (e.g., 1-3 h) can satisfactorily achieve a D50 &lt; 5 m. Due to the high hardness of the hydrogenated tantalum powder, the use of ordinary stainless steel ball grinding causes severe wear on the stainless steel ball, and a large amount of metal impurities are mixed into the material, resulting in a high impurity content. In order to improve the purity of the final product, it is preferred to use a higher hardness zirconia ball instead of a stainless steel ball for grinding.

为了得到更细更均匀的粒度分布,选用较小的磨介球进行研磨。其原因是直径小的研磨介质在研磨腔中的充填量大,增加了研磨介质的冲击作用和摩擦作用,同时增大了研磨介质的接触面积,研磨面积增大,也有助于微细化粉碎。意外地发现,直径为1-5mm,优选2-4mm的磨介球能实现较好的研磨效果。 In order to obtain a finer and more uniform particle size distribution, a smaller grinding medium ball is used for the grinding. The reason is that the grinding medium with a small diameter has a large filling amount in the grinding chamber, which increases the impact and friction of the grinding medium, increases the contact area of the grinding medium, and increases the grinding area, which also contributes to fine pulverization. It has been unexpectedly found that a grinding ball having a diameter of from 1 to 5 mm, preferably from 2 to 4 mm, can achieve a better grinding effect.

本发明要求得到粒度较细(D50<5μm)的产品,但球磨过程中可能难以避免产生粒度小于0.1μm超细粉末,它们常常容易氧化甚至自燃,严重影响粉末的性能,导致生产无法正常进行。同时,由于粉末粒度越细,其表面积越大,表面自由能亦越大,导致颗粒重新团聚,不利于微细化粉碎。出于方便粉碎的目的,优选地在分散介质中添加表面活性剂作为助磨剂。因为表面活性剂可以附着于钽粉颗粒表面,形成一层保护层,使物料颗粒在微细化球磨的同时实现表面钝化,可以有效抑制超细粉末在球磨及后续处理过程中的氧化,保证产品质量。优选的助磨剂是丁酮和/或异丙醇。更优选地,助磨剂的添加量是钽粉重量的0.5-5%,优选1-4%,更优选1.8-3.6%。The present invention requires a product having a finer particle size (D50 < 5 μm), but it may be difficult to avoid the production of ultrafine powders having a particle size of less than 0.1 μm during ball milling, which are often susceptible to oxidation or even spontaneous combustion, which seriously affects the performance of the powder, resulting in production failure. At the same time, due to the finer particle size of the powder, the larger the surface area, the larger the surface free energy, resulting in re-agglomeration of the particles, which is not conducive to micro-fine grinding. For the purpose of facilitating pulverization, it is preferred to add a surfactant as a grinding aid to the dispersion medium. Because the surfactant can adhere to the surface of the tantalum powder particles to form a protective layer, the material particles can be surface passivated while miniaturizing the ball mill, which can effectively inhibit the oxidation of the ultrafine powder during ball milling and subsequent processing, and ensure the product. quality. Preferred grinding aids are butanone and/or isopropanol. More preferably, the grinding aid is added in an amount of from 0.5 to 5%, preferably from 1 to 4%, more preferably from 1.8 to 3.6% by weight of the niobium powder.

本发明中所用脱氢降氧可以是常规的脱氢降氧。例如,可以通过如下方式进行:一般地,在钽粉中混入少量与氧的亲和力大于钽与氧的亲和力的还原剂,如碱土金属、稀土金属及其氢化物,最常用的是在钽粉中混入占钽粉重量0.2-6.0%的金属镁粉,然后在真空下或惰性气体保护(优选惰性气体)下进行加热,在800-900℃下保温1-3小时,然后再抽真空,然后在真空条件下再保温2-6小时。然后降温、钝化,得到不含氢的钽粉。The dehydrogenation and oxygen reduction used in the present invention may be conventional dehydrogenation and oxygen reduction. For example, it can be carried out by generally adding a small amount of a reducing agent having an affinity for oxygen to the affinity of oxygen, such as an alkaline earth metal, a rare earth metal and a hydride thereof, in the tantalum powder, and the most common one is in the tantalum powder. Mixing metal magnesium powder with 0.2-6.0% by weight of niobium powder, heating under vacuum or inert gas protection (preferably inert gas), holding at 800-900 ° C for 1-3 hours, then vacuuming, then Heat for 2-6 hours under vacuum. Then, the temperature is lowered and passivated to obtain a powder containing no hydrogen.

应理解,酸洗除杂可以降低钽粉中的杂质例如氧、碳、铁、镍、铬等。例如,可通过如下方式酸洗钽粉:用质量百分比10%的HNO3混合,钽粉与HNO3的固液比为1∶1,搅拌10-90min,溶解钽粉中的杂质金属例如还原性金属及其氧化物,然后过滤除去废酸液,再分盘烘干,过筛。It should be understood that pickling and decontamination can reduce impurities such as oxygen, carbon, iron, nickel, chromium, and the like in the tantalum powder. For example, the tantalum powder can be pickled by mixing with 10% by mass of HNO 3 , the solid-liquid ratio of tantalum powder to HNO 3 is 1:1, and stirring for 10-90 minutes to dissolve the impurity metal in the tantalum powder, for example, reducing property. The metal and its oxide are then filtered to remove the spent acid solution, which is then dried and sieved.

本发明中松装密度按照GB/T 1479《金属粉末松装密度的测定》第1部分“漏斗法”进行测量。The bulk density in the present invention is measured in accordance with GB/T 1479 "Determination of the bulk density of metal powders", Part 1, "Funnel method".

气体及金属杂质含量按照GB/T 15076《钽铌化学分析方法》进行测量。Gas and metal impurity content is measured in accordance with GB/T 15076 "Chemical Analysis Methods".

本发明制得的粉末的粒度分布及中值粒径(D50)是采用马尔文仪器的Mastersizer 2000测得的。 The particle size distribution and median particle size (D50) of the powders produced by the present invention were measured using a Malvern instrument Mastersizer 2000.

意外地发现,本发明所述的高温烧结带来了很多优势:例如1).由于对原料钽粉(钠还原钽粉)采用高温热处理,因此细小的颗粒发生凝结、粘连、长大,并趋于均匀化,从而降低钽粉活性,大大减小了后续机械破碎过程中着火的危险。同时,由于钽粉活性的降低,降低了在后期破碎过程中颗粒重新团聚的可能,有利于微细研磨。2).通过高温烧结使钽粉颗粒致密化程度增加,有利于最终氧含量的控制,相应的其松装密度大大增加。3).通过高温烧结,使钠还原过程中带入的碱金属如K、Na等逸出,达到提纯的目的。如本领域技术人员所知,在半导体装置中,K、Na等碱金属对金属-氧化物-半导体(MOS)的界面性能有很坏的影响。4)通过高温烧结,可以除去钽粉表面吸附的气体杂质、水份,同时使钽粉表面的氧化膜活化,可以增大氢气的渗透性,增加氢化效果,避免了由于氢化不彻底导致后续破碎过程中出现的大颗粒不易被破碎,造成粒度分布分散,出现“尾巴”的情况。大颗粒的存在会造成沉积膜厚度的不均匀,可靠性下降。Surprisingly, it has been found that the high-temperature sintering described in the present invention brings many advantages: for example, 1). Since the raw material tantalum powder (sodium-reduced tantalum powder) is subjected to high-temperature heat treatment, fine particles are coagulated, adhered, grown, and tend to The homogenization reduces the activity of the powder and greatly reduces the risk of ignition during the subsequent mechanical crushing process. At the same time, due to the decrease in the activity of the powder, the possibility of re-agglomeration of the particles during the late crushing process is reduced, which is advantageous for fine grinding. 2). The degree of densification of the tantalum powder particles is increased by high-temperature sintering, which is beneficial to the control of the final oxygen content, and the corresponding bulk density is greatly increased. 3). By high-temperature sintering, the alkali metal such as K, Na, etc. brought in during the sodium reduction process escapes, and the purpose of purification is achieved. As is known to those skilled in the art, in semiconductor devices, alkali metals such as K, Na, etc. have a very bad influence on the interfacial properties of metal-oxide-semiconductor (MOS). 4) By high-temperature sintering, the gas impurities and moisture adsorbed on the surface of the tantalum powder can be removed, and the oxide film on the surface of the tantalum powder can be activated to increase the permeability of hydrogen gas, increase the hydrogenation effect, and avoid subsequent crushing due to incomplete hydrogenation. The large particles appearing in the process are not easily broken, resulting in a dispersion of the particle size distribution and a "tail". The presence of large particles causes uneven thickness of the deposited film and decreases reliability.

本文所述的松装密度是指在不振动、不加压的特定条件下,金属粉末自由填充单位容积的质量。The bulk density as referred to herein refers to the mass of the metal powder that is freely filled per unit volume under the specific conditions of no vibration or no pressure.

概言之,本发明具有以下优点中的一项或多项:In summary, the present invention has one or more of the following advantages:

可以采用电容器用高比容钽粉的生产过程中产生的废钽粉为原料,资源利用合理、成本低,对原料的适应能力强;The waste crucible powder produced in the production process of the capacitor with the high specific volume powder can be used as the raw material, the resource utilization is reasonable, the cost is low, and the adaptability to the raw material is strong;

设备投资小;Equipment investment is small;

工作效率高;high working efficiency;

工艺路线短;和Short process route; and

处理过程安全系数高。The process has a high safety factor.

具体实施方式:detailed description:

出于说明而非限定的目的,提供如下实施例。为了突出本发明的有益效果,对原料中的杂质含量及松装密度进行了测量,然而应理解,一般的钠还原钽粉即可充当本发明的原料。 The following examples are provided for purposes of illustration and not limitation. In order to highlight the advantageous effects of the present invention, the impurity content and bulk density in the raw material are measured, however, it is understood that a general sodium reduced niobium powder can serve as a raw material of the present invention.

实施例1:采用如表1所示的原料钽粉-1.。将该钽粉在10-3Pa真空下加热到1400℃保温180分钟、冷却、钝化、出炉得到烧结块。将上述烧结块加热到800℃后冷却进行氢化处理,得到具有良好氢脆性的钽块,然后破碎制粉,得到完全能通过100目筛的钽粉。将上述钽粉以无水乙醇为球磨介质,以丁酮作为助磨剂(丁酮的添加量为钽粉重量的0.5%),进行湿式搅拌球磨0.5h后用HNO3和HF的混合酸酸洗去除金属杂质,烘干过200目筛得到氢化的钽粉。在氢化的钽粉中加入2%的镁屑,在密闭的炉中在氩气气氛下加热到850℃保温2小时,然后再抽真空,在抽真空条件下再保温3小时后降温、钝化,得到脱氢降氧的钽粉。将脱氢降氧后的钽粉用浓度为10质量%的HNO3混合,钽粉与HNO3的固液质量比为1∶1,搅拌60min,溶解钽粉中的镁及氧化镁,然后过滤除去废酸液,再分盘烘干,过筛,得到本发明的钽粉样品1-1。其主要杂质含量、松装密度及尺寸分布见表1。Example 1: Raw material bismuth powder-1 as shown in Table 1 was used. The tantalum powder was heated to 1400 ° C under vacuum for 10 -3 Pa for 180 minutes, cooled, passivated, and baked to obtain a sintered mass. The agglomerate was heated to 800 ° C, cooled and subjected to hydrogenation treatment to obtain a crucible having good hydrogen embrittlement, and then the powder was crushed to obtain a crucible powder which was completely passed through a 100 mesh sieve. The above-mentioned glutinous powder is made of anhydrous ethanol as a ball milling medium, and methyl ethyl ketone is used as a grinding aid (the amount of methyl ketone added is 0.5% of the weight of cerium powder), and the mixed acid of HNO 3 and HF is used after wet stirring ball milling for 0.5 hour. The metal impurities were removed by washing, and dried through a 200 mesh sieve to obtain a hydrogenated tantalum powder. Add 2% magnesium chips to the hydrogenated tantalum powder, heat it to 850 ° C for 2 hours in a closed oven under argon atmosphere, then vacuum again, and then heat-cool for 3 hours, then cool down and passivate. , dehydrogenation and oxygen reduction of bismuth powder. The tantalum powder with reduced oxygen concentration is dehydrogenated 10% by mass of HNO 3 mixed with tantalum powder of the solid-liquid mass ratio of 1 HNO 3, stirred for 60min, tantalum powder was dissolved in magnesium and magnesium oxide, and then filtered The spent acid solution was removed, dried in a tray, and sieved to obtain a tantalum powder sample 1-1 of the present invention. The main impurity content, bulk density and size distribution are shown in Table 1.

实施例2:仍采用如表1所示的原料钽粉-1。将该钽粉在10-3Pa真空下加热到1600℃保温120分钟、冷却、钝化、出炉得到烧结块。将上述烧结块加热到800℃后冷却进行氢化处理,得到具有良好氢脆性的钽块,然后破碎制粉,得到完全能通过100目筛的钽粉。将上述钽粉以无水乙醇为球磨介质,以丁酮和异丙醇作为助磨剂(丁酮的添加量为钽粉重量的0.5%,异丙醇酮的添加量为钽粉重量的2.0%),进行湿式搅拌球磨1.5h后用HNO3和HF的混合酸酸洗去除金属杂质,烘干过200目筛得到氢化的钽粉。在氢化的钽粉中加入2%的镁屑,在密闭的炉里氩气气氛里加热到850℃保温2小时,然后再抽真空,然后在真空条件下再保温3小时后降温、钝化,得到脱氢降氧的的钽粉。将脱氢降氧后的钽粉用质量百分比10%的HNO3混合,钽粉与HNO3的固液比为1∶1,搅拌60min,溶解钽粉中的镁及氧化镁,然后过滤除去废酸液,再 分盘烘干,过筛,得到本发明的钽粉样品1-2。其主要杂质含量、松装密度及尺寸分布见表1。Example 2: Raw material bismuth powder-1 as shown in Table 1 was still used. The tantalum powder was heated to 1600 ° C for 10 minutes under vacuum of 10 -3 Pa, cooled, passivated, and baked to obtain a sintered mass. The agglomerate was heated to 800 ° C, cooled and subjected to hydrogenation treatment to obtain a crucible having good hydrogen embrittlement, and then the powder was crushed to obtain a crucible powder which was completely passed through a 100 mesh sieve. The above-mentioned glutinous powder is made of anhydrous ethanol as a ball milling medium, and methyl ethyl ketone and isopropanol are used as grinding aids (the amount of methyl ethyl ketone added is 0.5% by weight of cerium powder, and the amount of isopropyl alcohol ketone added is 2.0 by weight of strontium powder). %), after performing wet agitating ball milling for 1.5 h, the metal impurities were removed by acid pickling with HNO 3 and HF, and dried to a 200 mesh sieve to obtain a hydrogenated tantalum powder. Add 2% magnesium chips to the hydrogenated tantalum powder, heat it to 850 ° C for 2 hours in a closed oven, then vacuum, then heat for 3 hours and then cool down and passivate. A dehydrogenated and dehydrated niobium powder is obtained. The dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration. The acid solution was dried and sieved to obtain a powder sample 1-2 of the present invention. The main impurity content, bulk density and size distribution are shown in Table 1.

对比例1.:仍采用如表1所示的原料钽粉-1。将该钽粉不经过热处理直接进行湿式搅拌球磨1.5h,后用HNO3和HF的混合酸酸洗去除金属杂质,烘干过200目筛得到氢化的钽粉。在氢化的钽粉中加入2%的镁屑,在密闭的炉里氩气气氛里加热到850℃保温3小时,然后再抽真空,在抽真空条件下再保温3小时后降温、钝化,得到不含氢的钽粉。将脱氢降氧后的钽粉用质量百分比10%的HNO3混合,钽粉与HNO3的固液比为1∶1,搅拌60min,溶解钽粉中的镁及氧化镁,然后过滤除去废酸液,再分盘烘干,过筛,得到对比的钽粉对比样1-1。其主要杂质含量、松装密度及尺寸分布见表1。Comparative Example 1. Raw material bismuth powder-1 as shown in Table 1 was still used. The tantalum powder was directly subjected to wet agitating ball milling without heat treatment for 1.5 hours, and then washed with a mixed acid of HNO 3 and HF to remove metal impurities, and dried through a 200 mesh sieve to obtain a hydrogenated tantalum powder. Add 2% magnesium chips to the hydrogenated tantalum powder, heat it to 850 ° C for 3 hours in a closed oven, then vacuum, and then heat for 3 hours, then cool down and passivate. A non-hydrogen-containing tantalum powder is obtained. The dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration. The acid solution was dried and sieved to obtain a comparative powder sample 1-1. The main impurity content, bulk density and size distribution are shown in Table 1.

实施例3:采用如表1所述的原料钽粉-2作为原料。将该钽粉在10-3Pa真空下加热到1800℃保温120分钟、冷却、钝化、出炉得到烧结块。将上述烧结块加热到800℃后冷却进行氢化处理,得到具有良好氢脆性的钽块,然后破碎制粉,得到完全能通过100目筛的钽粉。将上述钽粉以无水乙醇为球磨介质,以丁酮和异丙醇作为助磨剂(丁酮的添加量为钽粉重量的1.0%,异丙醇酮的添加量为钽粉重量的3.0%),进行湿式搅拌球磨1.5h后用HNO3和HF的混合酸酸洗去除金属杂质,烘干过200目筛得到氢化的钽粉。在氢化的钽粉中加入2%的镁屑,在密闭的炉里氩气气氛里加热到830℃保温2小时,然后再抽真空,在抽真空条件下再保温3小时后降温、钝化,得到脱氢降氧后的钽粉。将脱氢降氧后的钽粉用质量百分比10%的HNO3混合,钽粉与HNO3的固液比为1∶1,搅拌60min,溶解钽粉中的镁及氧化镁,然后过滤除去废酸液,再分盘烘干,过筛,得到本发明的钽粉样品2-1。其主要杂质含量、松装密度及尺寸分布见表1。 Example 3: Raw material tantalum powder-2 as described in Table 1 was used as a raw material. The tantalum powder was heated to 1800 ° C under vacuum for 10 -3 Pa for 120 minutes, cooled, passivated, and baked to obtain a sintered mass. The agglomerate was heated to 800 ° C, cooled and subjected to hydrogenation treatment to obtain a crucible having good hydrogen embrittlement, and then the powder was crushed to obtain a crucible powder which was completely passed through a 100 mesh sieve. The above-mentioned glutinous rice powder is made of anhydrous ethanol as a ball milling medium, and methyl ethyl ketone and isopropyl alcohol are used as grinding aids (the amount of methyl ethyl ketone added is 1.0% by weight of cerium powder, and the amount of isopropyl alcohol ketone added is 3.0 by weight of strontium powder). %), after performing wet agitating ball milling for 1.5 h, the metal impurities were removed by acid pickling with HNO 3 and HF, and dried to a 200 mesh sieve to obtain a hydrogenated tantalum powder. Add 2% magnesium chips to the hydrogenated tantalum powder, heat it to 830 ° C for 2 hours in a closed oven, then vacuum, and then heat for 3 hours, then cool down and passivate. The bismuth powder after dehydrogenation and oxygen reduction is obtained. The dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration. The acid solution was again dried in a tray and sieved to obtain a tantalum powder sample 2-1 of the present invention. The main impurity content, bulk density and size distribution are shown in Table 1.

对比例2:仍采用如表1所述的原料钽粉-2作为原料。将该钽粉不经过热处理直接加热到800℃后冷却进行氢化处理,得到氢化的钽粉末,然后采用湿式搅拌球磨1.5h,然后用HNO3和HF的混合酸酸洗去除金属杂质,烘干过200目筛得到氢化的钽粉。在氢化的钽粉中加入2%的镁屑,在密闭的炉里氩气气氛里加热到830℃保温2小时,然后再抽真空,在抽真空条件下再保温3小时后降温、钝化,得到脱氢降氧的钽粉。将脱氢降氧后的钽粉用质量百分比10%的HNO3混合,钽粉与HNO3的固液比为1∶1,搅拌60min,溶解钽粉中的镁及氧化镁,然后过滤除去废酸液,再分盘烘干,过筛,得到本发明的钽粉对比样2-1。其主要杂质含量、松装密度及尺寸分布见表1。Comparative Example 2: Raw material tantalum powder-2 as described in Table 1 was still used as a raw material. The tantalum powder is directly heated to 800 ° C without heat treatment, and then subjected to hydrogenation treatment to obtain a hydrogenated tantalum powder, which is then ball milled by wet stirring for 1.5 hours, and then washed with a mixed acid of HNO 3 and HF to remove metal impurities and dried. A 200 mesh sieve gave a hydrogenated tantalum powder. Add 2% magnesium chips to the hydrogenated tantalum powder, heat it to 830 ° C for 2 hours in a closed oven, then vacuum, and then heat for 3 hours, then cool down and passivate. A dehydrogenated and oxygen-reducing tantalum powder is obtained. The dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration. The acid solution was dried and sieved to obtain a bismuth powder comparative sample 2-1 of the present invention. The main impurity content, bulk density and size distribution are shown in Table 1.

实施例4:仍采用如表1所述的原料钽粉-2作为原料。将该钽粉在10-3Pa真空下加热到1950℃保温120分钟、冷却、钝化、出炉得到烧结块。将上述烧结块加热到800℃后冷却进行氢化处理,得到具有良好氢脆性的钽块,然后破碎制粉,得到完全能通过100目筛的钽粉。将上述钽粉以无水乙醇为球磨介质,以异丙醇作为助磨剂(异丙醇酮的添加量为钽粉重量的5.0%),进行湿式搅拌球磨3h后用HNO3和HF的混合酸酸洗去除金属杂质,烘干过200目筛得到氢化的钽粉。在氢化的钽粉中加入2%的镁屑,在密闭的炉里氩气气氛里加热到830℃保温2小时,然后再抽真空,在抽真空条件下再保温3小时后降温、钝化,得到脱氢降氧的钽粉。将脱氢降氧后的钽粉用质量百分比10%的HNO3混合,钽粉与HNO3的固液比为1∶1,搅拌60min,溶解钽粉中的镁及氧化镁,然后过滤除去废酸液,再分盘烘干,过筛,得到本发明的钽粉样品2-2。其主要杂质含量、松装密度及尺寸分布见表1。Example 4: The raw material tantalum powder-2 as described in Table 1 was still used as a raw material. The tantalum powder was heated to 1950 ° C for 120 minutes under vacuum of 10 -3 Pa, cooled, passivated, and baked to obtain a sintered cake. The agglomerate was heated to 800 ° C, cooled and subjected to hydrogenation treatment to obtain a crucible having good hydrogen embrittlement, and then the powder was crushed to obtain a crucible powder which was completely passed through a 100 mesh sieve. The above-mentioned glutinous powder was prepared by using anhydrous ethanol as a ball milling medium and isopropanol as a grinding aid (the amount of isopropanol ketone added was 5.0% by weight of the cerium powder), and mixing with HNO 3 and HF after wet stirring ball milling for 3 hours. The acid pickling removes the metal impurities and is dried over a 200 mesh sieve to obtain a hydrogenated tantalum powder. Add 2% magnesium chips to the hydrogenated tantalum powder, heat it to 830 ° C for 2 hours in a closed oven, then vacuum, and then heat for 3 hours, then cool down and passivate. A dehydrogenated and oxygen-reducing tantalum powder is obtained. The dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration. The acid solution was dried in a tray and sieved to obtain a tantalum powder sample 2-2 of the present invention. The main impurity content, bulk density and size distribution are shown in Table 1.

对比例3:仍采用如表1所述的原料钽粉-2为原料。将该钽粉不经过热处理直接加热到800℃后冷却进行氢化处理,得到氢化的钽粉末,然后采用湿式搅拌球磨3h,后用HNO3和HF的混合酸酸 洗去除金属杂质,烘干出料时发生着火,物料未进行后续处理。为了方便对比,在表中仍以对比样2-2表示。Comparative Example 3: The raw material tantalum powder-2 as described in Table 1 was still used as a raw material. The tantalum powder is directly heated to 800 ° C without heat treatment, and then subjected to hydrogenation treatment to obtain a hydrogenated tantalum powder, which is then ball milled by wet stirring for 3 hours, and then washed with a mixed acid of HNO 3 and HF to remove metal impurities, and dried and discharged. There was a fire and the material was not processed. For convenience of comparison, it is still indicated by the comparison sample 2-2 in the table.

实施例5:采用如表1所述的原料钽粉-3作为原料。将该钽粉在10-3Pa真空下加热到1500℃保温180分钟、冷却、钝化、出炉得到烧结块。将上述烧结块加热到800℃后冷却进行氢化处理,得到具有良好氢脆性的钽块,然后破碎制粉,得到完全能通过100目筛的钽粉。将上述钽粉以无水乙醇为球磨介质,以丁酮作为助磨剂(丁酮的添加量为钽粉重量的1.5%),进行湿式搅拌球磨2.0h后用HNO3和HF的混合酸酸洗去除金属杂质,烘干过200目筛得到氢化的钽粉。在氢化的钽粉中加入2%的镁屑,在密闭的炉里氩气气氛里加热到850℃保温2小时,然后再抽真空,在抽真空条件下再保温3小时后降温、钝化,得到脱氢降氧后的钽粉。将脱氢降氧后的钽粉用质量百分比10%的HNO3混合,钽粉与HNO3的固液比为1∶1,搅拌60min,溶解钽粉中的镁及氧化镁,然后过滤除去废酸液,再分盘烘干,过筛,得到本发明的钽粉样品3-1。其主要杂质含量、松装密度及尺寸分布见表1。Example 5: Raw material tantalum powder-3 as described in Table 1 was used as a raw material. The tantalum powder was heated to 1500 ° C under vacuum for 10 -3 Pa for 180 minutes, cooled, passivated, and baked to obtain a sintered mass. The agglomerate was heated to 800 ° C, cooled and subjected to hydrogenation treatment to obtain a crucible having good hydrogen embrittlement, and then the powder was crushed to obtain a crucible powder which was completely passed through a 100 mesh sieve. The above-mentioned glutinous powder is made of anhydrous ethanol as a ball milling medium, butanone is used as a grinding aid (the amount of methyl ethyl ketone added is 1.5% of the weight of cerium powder), and the mixed acid of HNO 3 and HF is used after wet stirring ball milling for 2.0 hours. The metal impurities were removed by washing, and dried through a 200 mesh sieve to obtain a hydrogenated tantalum powder. Add 2% magnesium chips to the hydrogenated tantalum powder, heat it to 850 ° C for 2 hours in a closed oven, then vacuum, and then heat for 3 hours, then cool down and passivate. The bismuth powder after dehydrogenation and oxygen reduction is obtained. The dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration. The acid solution was again dried in a tray and sieved to obtain a tantalum powder sample 3-1 of the present invention. The main impurity content, bulk density and size distribution are shown in Table 1.

对比例4:仍采用表1中的原料钽粉-3作为原料。将该钽粉不经过热处理直接进行湿式搅拌球磨2.0h,后用HNO3和HF的混合酸酸洗去除金属杂质,烘干过200目筛得到氢化的钽粉。在氢化的钽粉中加入2%的镁屑,在密闭的炉里氩气气氛里加热到850℃保温3小时,然后再抽真空,在抽真空条件下再保温3小时后降温、钝化,得到脱氢降氧的钽粉。将脱氢降氧后的钽粉用质量百分比10%的HNO3混合,钽粉与HNO3的固液比为1∶1,搅拌60min,溶解钽粉中的镁及氧化镁,然后过滤除去废酸液,再分盘烘干,过筛,得到对比的钽粉对比样3-1。其主要杂质含量、松装密度及尺寸分布见表1。 Comparative Example 4: The raw material 钽 powder-3 in Table 1 was still used as a raw material. The tantalum powder was directly subjected to wet stirring ball milling for 2.0 hours without heat treatment, and then the metal impurities were removed by acid pickling with HNO3 and HF, and dried to a 200 mesh sieve to obtain a hydrogenated tantalum powder. Add 2% magnesium chips to the hydrogenated tantalum powder, heat it to 850 ° C for 3 hours in a closed oven, then vacuum, and then heat for 3 hours, then cool down and passivate. A dehydrogenated and oxygen-reducing tantalum powder is obtained. The dehydrogenated and dehydrated niobium powder was mixed with 10% by mass of HNO 3 , the solid-liquid ratio of niobium powder to HNO 3 was 1:1, stirred for 60 min, the magnesium and magnesium oxide in the niobium powder were dissolved, and then the waste was removed by filtration. The acid solution was dried and sieved to obtain a comparative bismuth powder comparison sample 3-1. The main impurity content, bulk density and size distribution are shown in Table 1.

Figure PCTCN2015080620-appb-000001
Figure PCTCN2015080620-appb-000001

注意,对比样2-1的D50虽为4.967μm,但其松装密度为1.22,故不在本发明范围内。Note that the D50 of Comparative Example 2-1 was 4.967 μm, but its bulk density was 1.22, and thus was not within the scope of the present invention.

由上述数据可以看出,采用本发明的方法所处理钽粉末的粒度分布范围集中、且尺寸小,D50<5μm,同时具有低的O、K、Na杂质含量和大的松装密度。It can be seen from the above data that the cerium powder treated by the method of the present invention has a concentrated particle size distribution range and a small size, D50 < 5 μm, and has a low O, K, Na impurity content and a large bulk density.

本申请中所涉及的各个参数的分析设备及型号如下表所示The analysis equipment and model of each parameter involved in this application are shown in the following table.

分析项目Analysis Project 分析设备名称Analyze device name 规格型号Specification model 平均粒径(μm)Average particle size (μm) 马尔文激光粒度仪Malvern laser particle size analyzer Mastersizer 2000Mastersizer 2000 OO 氧氮分析仪Oxygen and nitrogen analyzer LECO CS-436LECO CS-436 K、NaK, Na 原子吸收光谱仪Atomic absorption spectrometer Varian 220FS/220ZVarian 220FS/220Z Fe、Ni、CrFe, Ni, Cr 直读光谱仪Direct Reading Spectrometer GV-5GV-5 松装密度Bulk Density 斯科特杯Scott Cup ————

Claims (10)

一种微细钽粉末,其D50<5μm,优选D50<4.5μm,其特征是松装密度为2.0-6.0g/cm3,优选2.2-4.5g/cm3A fine tantalum powder having a D50 < 5 μm, preferably D50 < 4.5 μm, characterized by a bulk density of 2.0-6.0 g/cm 3 , preferably 2.2-4.5 g/cm 3 . 如权利1所述微细钽粉,其中该钽粉的K+Na含量不高于20ppm,优选不高于15ppm;任选地氧含量不高于6000ppm,优选不高于4000ppm。The fine tantalum powder according to claim 1, wherein the niobium powder has a K+Na content of not more than 20 ppm, preferably not more than 15 ppm; and optionally an oxygen content of not more than 6000 ppm, preferably not more than 4000 ppm. 一种制备如权利要求1或2所述的微细钽粉的方法,该方法依次包括:A method of preparing the fine tantalum powder according to claim 1 or 2, the method comprising: 1)提供钽粉原料;1) providing powdered raw materials; 2)将所述原料进行高温烧结,得到烧结块;2) sintering the raw material at a high temperature to obtain a sintered block; 3)对烧结块进行氢化破碎,以得到氢化的钽粉,和3) hydrocracking the agglomerate to obtain hydrogenated tantalum powder, and 4)对氢化的钽粉进行脱氢降氧、酸洗、烘干并过筛。4) Dehydrogenation, dehydration, pickling, drying and sieving of the hydrogenated tantalum powder. 权利要求3的方法,其中在氢化破碎过程中将氢化后的粉末用机械方法破碎到能通过100目筛,然后采用湿式搅拌球磨进行研磨直到其D50<5μm,然后进行酸洗除杂。The method of claim 3 wherein the hydrogenated powder is mechanically broken up in a hydrocracking process to pass through a 100 mesh screen and then ground using a wet agitating ball mill until its D50 &lt; 5 μm, followed by pickling. 权利要求4的方法,其中在球磨过程中所使用的研磨介质中添加表面活性剂例如丁酮和/或异丙醇,优选其加入量是钽粉重量的0.5-5%。The method of claim 4 wherein a surfactant such as methyl ethyl ketone and/or isopropanol is added to the milling media used in the ball milling process, preferably in an amount of from 0.5 to 5% by weight based on the weight of the tantalum powder. 权利要求3-5中任一项的方法,其中高温烧结是在高真空条件,例如1-2-10-5Pa,优选约10-3pa下进行的。The method of any one of claims 3 to 5, wherein the high temperature sintering is carried out under high vacuum conditions, for example, from 1 -2 to 10 -5 Pa, preferably from about 10 -3 pa. 权利要求3-5中任一项的方法,其中钽粉原料是钠还原钽粉,例如用钽粉的生产过程中产生的废钽粉,特别是电容器用高比容钽粉的生产过程中产生的废钽粉作为原料。 The method according to any one of claims 3 to 5, wherein the powdered raw material is sodium reduced niobium powder, for example, waste tantalum powder produced in the production process of tantalum powder, particularly in the production process of high specific volume tantalum powder for capacitors. The waste powder is used as a raw material. 前述权利要求3-7中任一项的方法,其中高温烧结的烧结温度为1400-2000℃,在烧结温度下的保温时间为1-5小时,优选2-3小时。The method according to any one of claims 3 to 7, wherein the sintering temperature for the high-temperature sintering is 1400 to 2000 ° C, and the holding time at the sintering temperature is 1-5 hours, preferably 2-3 hours. 前述权利要求4或5的方法,其中以氧化锆球(例如直径为1-5mm,优选2-4mm的氧化锆球)为球磨介质,优选以水或有机溶剂优选酒精为分散介质,连续球磨0.5-4h,优选1-3h使其D50<5μm。The method according to claim 4 or 5, wherein the zirconia balls (for example, zirconia balls having a diameter of from 1 to 5 mm, preferably from 2 to 4 mm) are used as a ball milling medium, preferably water or an organic solvent, preferably alcohol, as a dispersion medium, and continuously ball milled at 0.5. -4h, preferably 1-3h, such that D50 < 5 μm. 权利要求1-2所述的钽粉,在半导体和/或表面喷涂中的用途。 Use of the tantalum powder of claims 1-2 for semiconductor and/or surface coating.
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