[go: up one dir, main page]

WO2016157321A1 - Light emitting device - Google Patents

Light emitting device Download PDF

Info

Publication number
WO2016157321A1
WO2016157321A1 PCT/JP2015/059715 JP2015059715W WO2016157321A1 WO 2016157321 A1 WO2016157321 A1 WO 2016157321A1 JP 2015059715 W JP2015059715 W JP 2015059715W WO 2016157321 A1 WO2016157321 A1 WO 2016157321A1
Authority
WO
WIPO (PCT)
Prior art keywords
light emitting
region
emitting device
substrate
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2015/059715
Other languages
French (fr)
Japanese (ja)
Inventor
吉田 綾子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Corp filed Critical Pioneer Corp
Priority to PCT/JP2015/059715 priority Critical patent/WO2016157321A1/en
Publication of WO2016157321A1 publication Critical patent/WO2016157321A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/805Electrodes
    • H10K50/82Cathodes
    • H10K50/828Transparent cathodes, e.g. comprising thin metal layers

Definitions

  • the present invention relates to a light emitting device.
  • the organic EL element has a configuration in which a first electrode that is a transparent electrode, an organic layer, and a second electrode are laminated in this order.
  • the light emitting device can be formed into a panel shape. And if a panel-shaped light-emitting device is attached to a wall or a ceiling without a gap, the entire wall or ceiling can be seen to emit light.
  • the light-emitting device has a region where a light-emitting element is not formed, that is, a non-light-emitting portion, at the edge of the substrate. In the above-described application, it is preferable that this non-light emitting portion does not appear on the surface.
  • Patent Document 1 describes that the non-light-emitting portion is made invisible by bending the edge of the substrate.
  • Patent Document 1 describes that in a display panel having a glass substrate on which an organic EL element is formed, the thickness of the glass substrate is 50 ⁇ m or less in order to bend the edge of the display panel.
  • An example of a problem to be solved by the present invention is to prevent the inorganic film from cracking when the substrate of the light-emitting device is formed of resin and an inorganic film is formed on the substrate.
  • the invention according to claim 1 is a substrate formed using a resin; A first inorganic layer formed on the first surface of the substrate; A plurality of light emitting portions formed on the first inorganic layer and having an organic layer; With The first surface has a first region which is a region where the first inorganic layer is not formed, and the first region is at least part of a region located between the plurality of light emitting units. The light emitting device is located.
  • FIG. 11 is a cross-sectional view illustrating a configuration of a light emitting device according to Modification 3. It is a figure explaining the modification of the method of using a light-emitting device.
  • FIG. 4 is a plan view illustrating a configuration of a light emitting unit of the light emitting device according to Example 1.
  • FIG. It is the figure which removed the 2nd electrode from FIG. It is the figure which removed the organic layer and the insulating layer from FIG.
  • FIG. 10 is a sectional view taken along line BB in FIG. 9.
  • 6 is a plan view of a light emitting unit included in a light emitting device according to Example 2.
  • FIG. It It is the figure which removed the partition, the 2nd electrode, the organic layer, and the insulating layer from FIG. It is CC sectional drawing of FIG. It is DD sectional drawing of FIG. It is EE sectional drawing of FIG. It is sectional drawing which shows the modification of FIG. It is sectional drawing which shows the modification of FIG. It is sectional drawing which shows the modification of FIG. It is sectional drawing which shows the modification of FIG.
  • FIG. 1 is a cross-sectional view illustrating a configuration of a light emitting device 10 according to the embodiment
  • FIG. 2 is a plan view of the light emitting device 10. 1 corresponds to the AA cross section of FIG.
  • the light emitting device 10 according to this embodiment includes a substrate 100, a first inorganic layer 200, and a plurality of light emitting units 140.
  • the substrate 100 is formed using a resin.
  • the first inorganic layer 200 is formed on the first surface 102 of the substrate 100, and the plurality of light emitting units 140 are all illumination units or display units, and are formed on the first inorganic layer 200.
  • the light emitting unit 140 has an organic layer.
  • the first surface 102 has a region where the first inorganic layer 200 is not formed (hereinafter referred to as a first region 202).
  • the first region 202 is located in at least a part of a region located between the plurality of light emitting units 140. Details will be described below.
  • the substrate 100 is a resin substrate having translucency.
  • the substrate 100 may not have translucency.
  • the substrate 100 is formed using, for example, PEN (polyethylene naphthalate), PES (polyethersulfone), PET (polyethylene terephthalate), or polyimide. Further, the substrate 100 has flexibility. For this reason, the light emitting device 10 can be used in a state where a part of the substrate 100 is curved.
  • the thickness of the substrate 100 is, for example, 10 ⁇ m or more and 1000 ⁇ m or less.
  • the substrate 100 is, for example, a polygon such as a rectangle.
  • the first inorganic layer 200 is provided on the first surface 102 of the substrate 100 in order to prevent moisture from passing through the substrate 100.
  • the first inorganic layer 200 is formed using an inorganic material.
  • This inorganic material contains, for example, at least one of silicon oxide, silicon oxynitride, carbon-added silicon oxide, silicon nitride, aluminum oxide, and titanium oxide.
  • the first inorganic layer 200 includes at least one of a silicon oxide film, a silicon oxynitride film, a carbon-added silicon oxide film, a silicon nitride film, an aluminum oxide film, and a titanium oxide film.
  • a planarization layer (for example, an organic layer) may be provided between the first inorganic layer 200 and the substrate 100.
  • the light emitting unit 140 is provided on the first surface 102 of the substrate 100.
  • the light emitting unit 140 has a configuration in which a first electrode, an organic layer, and a second electrode are stacked in this order.
  • the first electrode is a transparent electrode having optical transparency.
  • the material of the transparent electrode is a metal-containing material, for example, a metal oxide such as ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), IWZO (Indium Tungsten Zinc Oxide), or ZnO (Zinc Oxide).
  • the thickness of the first electrode is, for example, not less than 10 nm and not more than 500 nm.
  • the first electrode is formed using, for example, a sputtering method or a vapor deposition method.
  • the first electrode may be a carbon nanotube or a conductive organic material such as PEDOT / PSS.
  • the organic layer has a light emitting layer.
  • the organic layer has, for example, a configuration in which a hole injection layer, a light emitting layer, and an electron injection layer are stacked in this order.
  • a hole transport layer may be formed between the hole injection layer and the light emitting layer.
  • an electron transport layer may be formed between the light emitting layer and the electron injection layer.
  • the organic layer may be formed by a vapor deposition method.
  • at least one of the organic layers, for example, a layer in contact with the first electrode may be formed by a coating method such as an inkjet method, a printing method, or a spray method. In this case, the remaining layers of the organic layer are formed by vapor deposition. Further, all layers of the organic layer may be formed using a coating method.
  • the second electrode is made of, for example, a metal selected from the first group consisting of Al, Au, Ag, Pt, Mg, Sn, Zn, and In, or an alloy of a metal selected from the first group. Contains a metal layer. In this case, the second electrode has a light shielding property.
  • the thickness of the second electrode is, for example, not less than 10 nm and not more than 500 nm. However, the second electrode may be formed using the material exemplified as the material of the first electrode.
  • the second electrode is formed using, for example, a sputtering method or a vapor deposition method.
  • the material of the first electrode and the second electrode described above is a case where the light emitting device 10 is a bottom emission type.
  • the material of the first electrode and the material of the second electrode are reversed. That is, the above-described second electrode material is used as the first electrode material, and the above-described first electrode material is used as the second electrode material.
  • the light emitting unit 140 is sealed by a sealing member (not shown).
  • the sealing member is formed using, for example, a metal such as aluminum, or a resin, and has a polygonal shape or a circular shape similar to that of the substrate 100 and has a shape in which a concave portion is provided at the center.
  • the edge of the sealing member is fixed to the substrate 100 with an adhesive. Thereby, the space surrounded by the sealing member and the substrate 100 is sealed. And the light emission part 140 is located in this sealed space.
  • the sealing member may further include a film formed by an atomic layer deposition (ALD) method or a film formed by a chemical vapor deposition (CVD) method, or only this film. Also good.
  • the first surface 102 of the substrate 100 has a region (first region 202) where the first inorganic layer 200 is not provided.
  • the first region 202 is provided in a part of the non-light emitting region of the light emitting device 10, specifically, at least a part of the region located between the plurality of light emitting units 140. As will be described later, when the light emitting device 10 is installed on a surface such as a wall or a ceiling, the edge of the substrate 100 is bent.
  • the first region 202 is located in a region where the substrate 100 is bent.
  • the first region 202 can also be defined as an opening provided in the first inorganic layer 200.
  • the light emitting units 140 are arranged side by side in the first direction (left-right direction in FIG. 2).
  • the first region 202 is opposed to one side from one side of the substrate 100 in a second direction (for example, a direction orthogonal to the first direction) intersecting the first direction in the region between the adjacent light emitting units 140. It extends to the side.
  • the first inorganic layer 200 is divided between the adjacent light emitting units 140.
  • the first inorganic layer 200 may not be divided between the adjacent light emitting units 140.
  • the width w of the first region 202 is, for example, 50 ⁇ m or more.
  • the substrate 100 is formed, for example, by applying a resin on the support substrate.
  • the first inorganic layer 200 is formed on the first surface 102 of the substrate 100 by using a vapor deposition method such as a CVD method.
  • a resist pattern is formed on the first inorganic layer 200, and the first inorganic layer 200 is etched using the resist pattern as a mask.
  • the first region 202 is formed on the first surface 102.
  • the first region 202 may be formed by using a mask when the first inorganic layer 200 is formed.
  • a first electrode, an organic layer, and a second electrode are formed in this order on the first inorganic layer 200. Thereby, a plurality of light emitting portions 140 are formed. Thereafter, the plurality of light emitting units 140 are sealed using a sealing member.
  • FIG. 3 is a diagram for explaining a method of using the light emitting device 10.
  • the light-emitting device 10 is, for example, a wristwatch-type device, and is used in a state of being bent into a ring shape along a first direction (left-right direction in FIG. 2).
  • the non-light emitting region is bent in a direction in which the first surface 102 is convex.
  • the region where the light emitting unit 140 is located in the light emitting device 10 is slightly curved or not curved.
  • the first region 202 of the light emitting device 10 is curved to be larger than the region where the light emitting unit 140 is located.
  • the first inorganic layer 200 is not formed in the first region 202, even if the light emitting device 10 is largely curved in the first region 202, the possibility that a crack is generated in the first inorganic layer 200 is low or almost. Absent. For this reason, the possibility that moisture passes through the substrate 100 and reaches the light emitting unit 140 does not increase. Therefore, the reliability of the light emitting device 10 is unlikely to decrease.
  • FIG. 4 is a plan view of the light emitting device 10 according to the first modification, and corresponds to FIG. 2 in the embodiment.
  • the light emitting device 10 according to this modification includes the light emitting units 140 located at both ends in the first direction (left and right direction in FIG. 4) and the edge of the substrate 100 facing the light emitting unit 140 in the first direction ( Specifically, the light emitting device 10 according to the embodiment, except that the first region 202 is also formed between the substrate 100 and the second direction (side extending in the vertical direction in the drawing). It is the same composition as.
  • FIG. 5 is a diagram for explaining a method of using the light emitting device 10 according to this modification. Also in this modification, the light emitting device 10 is used in a state of being curved in a ring shape. Further, in this modification, first regions 202 are provided at both ends of the substrate 100 in the first direction. For this reason, in this modification, both ends of the substrate 100 can be curved and overlap each other.
  • FIG. 6 is a cross-sectional view of a light emitting device 10 according to Modification Example 2, and corresponds to FIG. 1 in the embodiment.
  • the light emitting device 10 according to this modification has the same configuration as that of the light emitting device 10 according to the embodiment, except that the second surface 104 of the substrate 100 includes the second inorganic layer 210.
  • the material of the second inorganic layer 210 is the same as the material of the first inorganic layer 200 in the embodiment. However, the second inorganic layer 210 may be formed of the same material as the first inorganic layer 200, or may be formed using a material different from that of the first inorganic layer 200. The second inorganic layer 210 is also provided to prevent moisture from permeating the substrate 100.
  • the first inorganic layer can be formed even if the light emitting device 10 is curved in the first region 202 as in the embodiment. 200 does not crack. For this reason, the possibility that moisture passes through the substrate 100 and reaches the light emitting unit 140 does not increase. Therefore, the reliability of the light emitting device 10 does not decrease.
  • the second inorganic layer 210 is provided on the second surface 104 of the substrate 100, the organic layer of the light emitting unit 140 can be further suppressed from being deteriorated by moisture.
  • FIG. 7 is a cross-sectional view illustrating a configuration of a light emitting device 10 according to Modification 3, and corresponds to FIG. 1 in the embodiment.
  • the light emitting device 10 according to this modification has the same configuration as that of the light emitting device 10 according to modification 2 except that the second surface 104 has a second region 212.
  • the second region 212 is a region of the second surface 104 where the second inorganic layer 210 is not formed, and the first region 202 when viewed from a direction perpendicular to the second surface 104 (y direction in the drawing). It overlaps with. That is, the second region 212 is provided in at least a part of the second surface 104 that overlaps with a part of the non-light emitting region of the light emitting device 10, specifically, a region located between the plurality of light emitting units 140. It has been.
  • the second region 212 is located in a curved region of the substrate 100. It can also be said that the second inorganic layer 210 is divided by the second region 212. Further, in the width direction of the second region 212 (that is, the x direction in FIG. 7), the second region 212 may completely overlap the first region 202 or may partially overlap.
  • the substrate 100 is curved in a direction in which the second surface 104 side is convex as shown in FIG.
  • At least one layer may be formed between the first inorganic layer 200 and the first surface 102 of the substrate 100. Even in this case, the first inorganic layer 200 is not formed in the first region 202. However, the at least one layer described above may be left in the first region 202 or may be removed.
  • the inorganic layer 206, the organic layer 205, and the first inorganic layer 200 are formed on the substrate 100 in this order.
  • the inorganic layer 206 and the first inorganic layer 200 are both formed as barrier layers, and the organic layer 205 is provided as a planarization layer.
  • the material of the inorganic layer 206 is the same as that of the first inorganic layer 200. However, the materials of the first inorganic layer 200 and the inorganic layer 206 may be different from each other.
  • the first inorganic layer 200 is removed in the first region 202, but the organic layer 205 and the inorganic layer 206 are left.
  • the organic layer 205 and the inorganic layer 206 are also removed in the first region 202.
  • FIG. 9 is a plan view illustrating the configuration of the light emitting unit 140 of the light emitting device 10 according to the first embodiment.
  • FIG. 10 is a diagram in which the second electrode 130 is removed from FIG. 9.
  • FIG. 11 is a diagram in which the organic layer 120 and the insulating layer 150 are removed from FIG. 12 is a cross-sectional view taken along the line BB of FIG.
  • the light emitting device 10 is a lighting device, and includes a substrate 100, a light emitting unit 140, a first inorganic layer 200, and a second inorganic layer 210.
  • the light emitting unit 140 includes a first electrode 110, an organic layer 120, and a second electrode 130.
  • the configurations of the first electrode 110, the organic layer 120, and the second electrode 130 are the same as in the embodiment.
  • the light emitting device 10 has both the first inorganic layer 200 and the second inorganic layer 210.
  • a first region 202 is provided on the first surface 102 of the substrate 100, and a second region 212 is provided on the second surface 104 of the substrate 100.
  • the edge of the first electrode 110 is covered with an insulating layer 150.
  • the insulating layer 150 is made of, for example, a photosensitive resin material such as polyimide, and surrounds a portion of the first electrode 110 that becomes a light emitting region of the light emitting unit 140. By providing the insulating layer 150, it is possible to suppress a short circuit between the first electrode 110 and the second electrode 130 at the edge of the first electrode 110.
  • the insulating layer 150 is formed by applying a resin material to be the insulating layer 150 and then exposing and developing the resin material. This step is performed, for example, after forming the first electrode 110 and before forming the organic layer 120.
  • the light emitting device 10 has a first terminal 112 and a second terminal 132.
  • the first terminal 112 is connected to the first electrode 110
  • the second terminal 132 is connected to the second electrode 130.
  • the first terminal 112 and the second terminal 132 include a layer formed of the same material as that of the first electrode 110.
  • a lead wiring may be provided between the first terminal 112 and the first electrode 110.
  • a lead wiring may be provided between the second terminal 132 and the second electrode 130.
  • the substrate 100, the first inorganic layer 200, and the second inorganic layer 210 are formed. These forming methods are the same as those in the embodiment.
  • the first electrode 110, the first terminal 112, and the second terminal 132 are formed on the substrate 100. At this time, lead wires are also formed as necessary.
  • the organic layer 120 and the second electrode 130 are formed.
  • the first inorganic layer 200 does not crack. Therefore, the reliability of the light emitting device 10 does not decrease.
  • the first terminal 112 and the second terminal 132 are directed in a different direction from the first region 202.
  • the first terminal 112 and the second terminal 132 may face a region overlapping with the first region 202.
  • the first region 202 may be located closer to the light emitting unit 140 than the first terminal 112 and the second terminal 132.
  • the position of the second area 212 is the same as the position of the first area 202.
  • FIG. 13 is a plan view of the light emitting unit 140 included in the light emitting device 10 according to the second embodiment.
  • 14 is a view in which the partition 170, the second electrode 130, the organic layer 120, and the insulating layer 150 are removed from FIG. 15 is a sectional view taken along the line CC in FIG. 13
  • FIG. 16 is a sectional view taken along the line DD in FIG. 13
  • FIG. 17 is a sectional view taken along the line EE in FIG.
  • the light emitting unit 140 is a display device, and includes a substrate 100, a first electrode 110, a light emitting unit 140, an insulating layer 150, a plurality of openings 152, a plurality of openings 154, a plurality of lead wires 114, an organic layer 120, A second electrode 130, a plurality of lead wires 134, and a plurality of partition walls 170 are provided.
  • the light emitting unit 140 has a plurality of light emitting elements to be pixels.
  • the first electrode 110 extends in a line shape in the first direction (Y direction in FIG. 13). The end portion of the first electrode 110 is connected to the lead wiring 114.
  • the lead wiring 114 is a wiring that connects the first electrode 110 to the first terminal 112. In the example shown in the drawing, one end side of the lead wiring 114 is connected to the first electrode 110, and the other end side of the lead wiring 114 is the first terminal 112. In the example shown in the figure, the first electrode 110 and the lead-out wiring 114 are integrated.
  • a conductor layer 180 is formed on the lead wiring 114.
  • the conductor layer 180 is a single layer or a multilayer metal layer.
  • the conductor layer 180 has a configuration in which, for example, a Mo alloy layer, an Al alloy layer, and a Mo alloy layer are stacked in this order.
  • a part of the lead wiring 114 is covered with an insulating layer 150.
  • the insulating layer 150 is formed on the plurality of first electrodes 110 and in a region therebetween.
  • a plurality of openings 152 and a plurality of openings 154 are formed in the insulating layer 150.
  • the plurality of second electrodes 130 extend in parallel to each other in a direction intersecting the first electrode 110 (for example, a direction orthogonal to the X direction in FIG. 13).
  • a partition wall 170 which will be described in detail later, extends between the plurality of second electrodes 130.
  • the opening 152 is located at the intersection of the first electrode 110 and the second electrode 130 in plan view. Specifically, the plurality of openings 152 are arranged in the direction in which the first electrode 110 extends (Y direction in FIG. 13). The plurality of openings 152 are also arranged in the extending direction of the second electrode 130 (X direction in FIG. 13). For this reason, the plurality of openings 152 are arranged to form a matrix.
  • the opening 154 is located in a region overlapping with one end side of each of the plurality of second electrodes 130 in plan view.
  • the openings 154 are arranged along one side of the matrix formed by the openings 152. And when it sees in the direction (For example, the Y direction in FIG. 13, ie, the direction in alignment with the 1st electrode 110) along this one side, the opening 154 is arrange
  • the lead wiring 134 is connected to the second electrode 130 through the opening 154.
  • the lead wiring 134 is a wiring that connects the second electrode 130 to the second terminal 132, and has a layer made of the same material as the first electrode 110. One end side of the lead wiring 134 is located below the opening 154, and the other end side of the lead wiring 134 is led out of the insulating layer 150. In the example shown in the figure, the other end side of the lead-out wiring 134 is the second terminal 132. A conductor layer 180 is formed on the lead wiring 134. A part of the lead wiring 134 is covered with an insulating layer 150.
  • the organic layer 120 is formed.
  • the hole injection layer of the organic layer 120 is in contact with the first electrode 110, and the electron injection layer of the organic layer 120 is in contact with the second electrode 130. Therefore, the light emitting unit 140 has a light emitting element in each of the regions overlapping with the opening 152.
  • the layers constituting the organic layer 120 are shown to protrude beyond the opening 152. And as shown in FIG. 16, the organic layer 120 may be continuously formed between the adjacent openings 152 in the direction in which the partition 170 extends, or may not be formed continuously. Good. However, as shown in FIG. 17, the organic layer 120 is not formed in the opening 154.
  • the second electrode 130 extends in a second direction (X direction in FIG. 13) intersecting the first direction.
  • a partition wall 170 is formed between the adjacent second electrodes 130.
  • the partition wall 170 extends in parallel to the second electrode 130, that is, in the second direction.
  • the base of the partition 170 is, for example, the insulating layer 150.
  • the partition 170 is, for example, a photosensitive resin such as a polyimide resin, and is formed in a desired pattern by being exposed and developed.
  • the partition wall 170 may be made of a resin other than a polyimide resin, for example, an inorganic material such as an epoxy resin, an acrylic resin, or silicon dioxide.
  • the partition wall 170 has a trapezoidal cross-sectional shape (reverse trapezoid). That is, the width of the upper surface of the partition wall 170 is larger than the width of the lower surface of the partition wall 170. Therefore, if the partition wall 170 is formed before the second electrode 130, the second electrode 130 is formed on one surface side of the substrate 100 by using an evaporation method or a sputtering method. Can be formed collectively.
  • the partition wall 170 also has a function of dividing the organic layer 120.
  • the light emitting device 10 includes the first inorganic layer 200, the second inorganic layer 210, the first region 202, and the second region 212.
  • the substrate 100, the first inorganic layer 200, and the second inorganic layer 210 are formed. These forming methods are the same as those in the embodiment.
  • the first electrode 110 and the lead wires 114 and 134 are formed on the substrate 100. These forming methods are the same as those in Example 1.
  • a conductor layer 180 is formed on the lead wiring 114 and the lead wiring 134.
  • the insulating layer 150 is formed, and further the partition 170 is formed.
  • the organic layer 120 and the second electrode 130 are formed.
  • the reliability of the light emitting device 10 does not decrease.

Landscapes

  • Electroluminescent Light Sources (AREA)

Abstract

A substrate (100) is formed using a resin. A first inorganic layer (200) is formed on a first surface (102) of the substrate (100), and a plurality of light emitting units (140) are lighting units or display units, and are formed on the first inorganic layer (200). Furthermore, each of the light emitting units (140) has an organic layer. The first surface (102) has a first region (202) where the first inorganic layer (200) is not formed. The first region (202) is positioned at least on a part of a region positioned among the light emitting units (140).

Description

発光装置Light emitting device

 本発明は、発光装置に関する。 The present invention relates to a light emitting device.

 近年は、有機EL素子を光源とした発光装置の開発が進んでいる。有機EL素子は、透明電極である第1電極、有機層、及び第2電極をこの順に積層させた構成を有している。有機EL素子を光源にすると、発光装置をパネル形状にすることができる。そして、壁や天井にパネル形状の発光装置を隙間なく取り付けると、壁や天井の全体が発光しているように見せることができる。一方、発光装置は、基板の縁に、発光素子が形成されていない領域すなわち非発光部を有している。上記した用途では、この非発光部が表に出ないようにすることが好ましい。 In recent years, development of light-emitting devices using organic EL elements as light sources has been progressing. The organic EL element has a configuration in which a first electrode that is a transparent electrode, an organic layer, and a second electrode are laminated in this order. When the organic EL element is used as a light source, the light emitting device can be formed into a panel shape. And if a panel-shaped light-emitting device is attached to a wall or a ceiling without a gap, the entire wall or ceiling can be seen to emit light. On the other hand, the light-emitting device has a region where a light-emitting element is not formed, that is, a non-light-emitting portion, at the edge of the substrate. In the above-described application, it is preferable that this non-light emitting portion does not appear on the surface.

 これに対して特許文献1には、基板の縁を折り曲げることにより、非発光部を見えないようにすることが記載されている。特に特許文献1には、有機EL素子が形成されるガラス基板を有する表示パネルにおいて、表示パネルの縁を折り曲げるために、ガラス基板の厚さを50μm以下にすることが記載されている。 On the other hand, Patent Document 1 describes that the non-light-emitting portion is made invisible by bending the edge of the substrate. In particular, Patent Document 1 describes that in a display panel having a glass substrate on which an organic EL element is formed, the thickness of the glass substrate is 50 μm or less in order to bend the edge of the display panel.

特開2011-47977号公報JP 2011-47977 A

 近年は、有機EL素子の基板を樹脂で形成することにより、発光装置に可撓性を持たせることが検討されている。一方、樹脂は水分を透過するため、基板を樹脂で形成した場合、水分が基板を透過しないようにするために、基板に無機膜を形成する必要がある。このような基板を折り曲げると、折り曲げた部分を起点として無機膜にクラックが生じ、このクラックが有機EL素子と重なる領域まで延びる可能性が出てくる。この場合、無機膜のクラックを介して有機EL素子に水分が到達する可能性が出てくるため、発光装置の信頼性が低下する。 In recent years, it has been studied to make a light emitting device flexible by forming a substrate of an organic EL element with a resin. On the other hand, since the resin transmits moisture, when the substrate is formed of resin, it is necessary to form an inorganic film on the substrate in order to prevent moisture from passing through the substrate. When such a substrate is bent, a crack occurs in the inorganic film starting from the bent portion, and there is a possibility that the crack extends to a region overlapping with the organic EL element. In this case, there is a possibility that moisture reaches the organic EL element through a crack in the inorganic film, so that the reliability of the light emitting device is lowered.

 本発明が解決しようとする課題としては、発光装置の基板を樹脂で形成し、かつこの基板に無機膜を形成した場合において、無機膜にクラックが生じないようにすることが一例として挙げられる。 An example of a problem to be solved by the present invention is to prevent the inorganic film from cracking when the substrate of the light-emitting device is formed of resin and an inorganic film is formed on the substrate.

 請求項1に記載の発明は、樹脂を用いて形成された基板と、
 前記基板の第1面に形成された第1無機層と、
 前記第1無機層の上に形成され、有機層を有する複数の発光部と、
を備え、
 前記第1面は、前記第1無機層が形成されていない領域である第1領域を有しており、かつ前記第1領域は前記複数の発光部の間に位置する領域の少なくとも一部に位置している発光装置である。
The invention according to claim 1 is a substrate formed using a resin;
A first inorganic layer formed on the first surface of the substrate;
A plurality of light emitting portions formed on the first inorganic layer and having an organic layer;
With
The first surface has a first region which is a region where the first inorganic layer is not formed, and the first region is at least part of a region located between the plurality of light emitting units. The light emitting device is located.

 上述した目的、およびその他の目的、特徴および利点は、以下に述べる好適な実施の形態、およびそれに付随する以下の図面によってさらに明らかになる。 The above-described object and other objects, features, and advantages will be further clarified by a preferred embodiment described below and the following drawings attached thereto.

実施形態に係る発光装置の構成を示す断面図である。It is sectional drawing which shows the structure of the light-emitting device which concerns on embodiment. 発光装置の平面図である。It is a top view of a light-emitting device. 発光装置を使用する方法を説明する図である。It is a figure explaining the method of using a light-emitting device. 変形例1に係る発光装置の平面図である。6 is a plan view of a light emitting device according to Modification Example 1. FIG. 変形例1に係る発光装置を使用する方法を説明する図である。It is a figure explaining the method of using the light-emitting device which concerns on the modification 1. FIG. 変形例2に係る発光装置の断面図である。It is sectional drawing of the light-emitting device which concerns on the modification 2. 変形例3に係る発光装置の構成を示す断面図である。FIG. 11 is a cross-sectional view illustrating a configuration of a light emitting device according to Modification 3. 発光装置の使用する方法の変形例を説明する図である。It is a figure explaining the modification of the method of using a light-emitting device. 実施例1に係る発光装置の発光部の構成を示す平面図である。4 is a plan view illustrating a configuration of a light emitting unit of the light emitting device according to Example 1. FIG. 図9から第2電極を取り除いた図である。It is the figure which removed the 2nd electrode from FIG. 図10から有機層及び絶縁層を取り除いた図である。It is the figure which removed the organic layer and the insulating layer from FIG. 図9のB-B断面図である。FIG. 10 is a sectional view taken along line BB in FIG. 9. 実施例2に係る発光装置が有する発光部の平面図である。6 is a plan view of a light emitting unit included in a light emitting device according to Example 2. FIG. 図13から隔壁、第2電極、有機層、及び絶縁層を取り除いた図である。It is the figure which removed the partition, the 2nd electrode, the organic layer, and the insulating layer from FIG. 図13のC-C断面図である。It is CC sectional drawing of FIG. 図13のD-D断面図である。It is DD sectional drawing of FIG. 図13のE-E断面図である。It is EE sectional drawing of FIG. 図7の変形例を示す断面図である。It is sectional drawing which shows the modification of FIG. 図7の変形例を示す断面図である。It is sectional drawing which shows the modification of FIG. 図12の変形例を示す断面図である。It is sectional drawing which shows the modification of FIG.

 以下、本発明の実施の形態について、図面を用いて説明する。尚、すべての図面において、同様な構成要素には同様の符号を付し、適宜説明を省略する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. In all the drawings, the same reference numerals are given to the same components, and the description will be omitted as appropriate.

 図1は、実施形態に係る発光装置10の構成を示す断面図であり、図2は発光装置10の平面図である。なお、図1は図2のA-A断面に対応している。本実施形態に係る発光装置10は、基板100、第1無機層200、及び複数の発光部140を備えている。基板100は樹脂を用いて形成されている。第1無機層200は基板100の第1面102に形成されており、複数の発光部140は、いずれも照明部または表示部であり、第1無機層200の上に形成されている。また発光部140は、有機層を有している。第1面102は、第1無機層200が形成されていない領域(以下、第1領域202と記載)を有している。第1領域202は、複数の発光部140の間に位置する領域の少なくとも一部に位置している。以下、詳細に説明する。 FIG. 1 is a cross-sectional view illustrating a configuration of a light emitting device 10 according to the embodiment, and FIG. 2 is a plan view of the light emitting device 10. 1 corresponds to the AA cross section of FIG. The light emitting device 10 according to this embodiment includes a substrate 100, a first inorganic layer 200, and a plurality of light emitting units 140. The substrate 100 is formed using a resin. The first inorganic layer 200 is formed on the first surface 102 of the substrate 100, and the plurality of light emitting units 140 are all illumination units or display units, and are formed on the first inorganic layer 200. In addition, the light emitting unit 140 has an organic layer. The first surface 102 has a region where the first inorganic layer 200 is not formed (hereinafter referred to as a first region 202). The first region 202 is located in at least a part of a region located between the plurality of light emitting units 140. Details will be described below.

 発光装置10がボトムエミッション型の発光装置である場合、基板100は、透光性を有する樹脂基板である。一方、発光装置10がトップエミッション型の発光装置である場合、基板100は透光性を有していなくてもよい。基板100は、例えばPEN(ポリエチレンナフタレート)、PES(ポリエーテルサルホン)、PET(ポリエチレンテレフタラート)、又はポリイミドを用いて形成されている。また、基板100は可撓性を有している。このため、基板100の一部を湾曲させた状態で発光装置10を使用することができる。基板100の厚さは、例えば10μm以上1000μm以下である。基板100は、例えば矩形などの多角形である。 When the light emitting device 10 is a bottom emission type light emitting device, the substrate 100 is a resin substrate having translucency. On the other hand, in the case where the light emitting device 10 is a top emission type light emitting device, the substrate 100 may not have translucency. The substrate 100 is formed using, for example, PEN (polyethylene naphthalate), PES (polyethersulfone), PET (polyethylene terephthalate), or polyimide. Further, the substrate 100 has flexibility. For this reason, the light emitting device 10 can be used in a state where a part of the substrate 100 is curved. The thickness of the substrate 100 is, for example, 10 μm or more and 1000 μm or less. The substrate 100 is, for example, a polygon such as a rectangle.

 基板100の第1面102には、水分が基板100を透過することを抑制するために、第1無機層200が設けられている。第1無機層200は、無機材料を用いて形成されている。この無機材料は、例えば酸化シリコン、酸窒化シリコン、炭素添加酸化シリコン、窒化シリコン、酸化アルミニウム、及び酸化チタンの少なくとも一つを含んでいる。例えば、第1無機層200は、酸化シリコン膜、酸窒化シリコン膜、炭素添加酸化シリコン膜、窒化シリコン膜、酸化アルミニウム膜、及び酸化チタン膜の少なくとも一つを含んでいる。なお、第1無機層200と基板100の間に、平坦化層(例えば有機層)が設けられていてもよい。 The first inorganic layer 200 is provided on the first surface 102 of the substrate 100 in order to prevent moisture from passing through the substrate 100. The first inorganic layer 200 is formed using an inorganic material. This inorganic material contains, for example, at least one of silicon oxide, silicon oxynitride, carbon-added silicon oxide, silicon nitride, aluminum oxide, and titanium oxide. For example, the first inorganic layer 200 includes at least one of a silicon oxide film, a silicon oxynitride film, a carbon-added silicon oxide film, a silicon nitride film, an aluminum oxide film, and a titanium oxide film. Note that a planarization layer (for example, an organic layer) may be provided between the first inorganic layer 200 and the substrate 100.

 上記したように、基板100の第1面102には、発光部140が設けられている。発光部140は、第1電極、有機層、及び第2電極をこの順に積層させた構成を有している。 As described above, the light emitting unit 140 is provided on the first surface 102 of the substrate 100. The light emitting unit 140 has a configuration in which a first electrode, an organic layer, and a second electrode are stacked in this order.

 第1電極は、光透過性を有する透明電極である。透明電極の材料は、金属を含む材料、例えば、ITO(Indium Tin Oxide)、IZO(Indium Zinc Oxide)、IWZO(Indium Tungsten Zinc Oxide)、ZnO(Zinc Oxide)等の金属酸化物である。第1電極の厚さは、例えば10nm以上500nm以下である。第1電極は、例えばスパッタリング法又は蒸着法を用いて形成される。なお、第1電極は、カーボンナノチューブ、又はPEDOT/PSSなどの導電性有機材料であってもよい。 The first electrode is a transparent electrode having optical transparency. The material of the transparent electrode is a metal-containing material, for example, a metal oxide such as ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), IWZO (Indium Tungsten Zinc Oxide), or ZnO (Zinc Oxide). The thickness of the first electrode is, for example, not less than 10 nm and not more than 500 nm. The first electrode is formed using, for example, a sputtering method or a vapor deposition method. The first electrode may be a carbon nanotube or a conductive organic material such as PEDOT / PSS.

 有機層は発光層を有している。有機層は、例えば、正孔注入層、発光層、及び電子注入層をこの順に積層させた構成を有している。正孔注入層と発光層との間には正孔輸送層が形成されていてもよい。また、発光層と電子注入層との間には電子輸送層が形成されていてもよい。有機層は蒸着法で形成されてもよい。また、有機層のうち少なくとも一つの層、例えば第1電極と接触する層は、インクジェット法、印刷法、又はスプレー法などの塗布法によって形成されてもよい。なお、この場合、有機層の残りの層は、蒸着法によって形成されている。また、有機層のすべての層が、塗布法を用いて形成されていてもよい。 The organic layer has a light emitting layer. The organic layer has, for example, a configuration in which a hole injection layer, a light emitting layer, and an electron injection layer are stacked in this order. A hole transport layer may be formed between the hole injection layer and the light emitting layer. In addition, an electron transport layer may be formed between the light emitting layer and the electron injection layer. The organic layer may be formed by a vapor deposition method. In addition, at least one of the organic layers, for example, a layer in contact with the first electrode may be formed by a coating method such as an inkjet method, a printing method, or a spray method. In this case, the remaining layers of the organic layer are formed by vapor deposition. Further, all layers of the organic layer may be formed using a coating method.

 第2電極は、例えば、Al、Au、Ag、Pt、Mg、Sn、Zn、及びInからなる第1群の中から選択される金属、又はこの第1群から選択される金属の合金からなる金属層を含んでいる。この場合、第2電極は遮光性を有している。第2電極の厚さは、例えば10nm以上500nm以下である。ただし、第2電極は、第1電極の材料として例示した材料を用いて形成されていてもよい。第2電極は、例えばスパッタリング法又は蒸着法を用いて形成される。 The second electrode is made of, for example, a metal selected from the first group consisting of Al, Au, Ag, Pt, Mg, Sn, Zn, and In, or an alloy of a metal selected from the first group. Contains a metal layer. In this case, the second electrode has a light shielding property. The thickness of the second electrode is, for example, not less than 10 nm and not more than 500 nm. However, the second electrode may be formed using the material exemplified as the material of the first electrode. The second electrode is formed using, for example, a sputtering method or a vapor deposition method.

 なお、上記した第1電極及び第2電極の材料は、発光装置10がボトムエミッション型の場合である。発光装置10がトップエミッション型の場合、第1電極の材料と第2電極の材料は逆になる。すなわち第1電極の材料には上記した第2電極の材料が用いられ、第2電極の材料には上記した第1電極の材料が用いられる。 In addition, the material of the first electrode and the second electrode described above is a case where the light emitting device 10 is a bottom emission type. When the light emitting device 10 is a top emission type, the material of the first electrode and the material of the second electrode are reversed. That is, the above-described second electrode material is used as the first electrode material, and the above-described first electrode material is used as the second electrode material.

 また、発光部140は、封止部材(図示せず)によって封止されている。この封止部材は、例えばアルミニウムなどの金属、又は樹脂を用いて形成されており、基板100と同様の多角形や円形であり、中央に凹部を設けた形状を有している。そして封止部材の縁は接着材で基板100に固定されている。これにより、封止部材と基板100で囲まれた空間は封止される。そして発光部140は、この封止された空間の中に位置している。なお、封止部材は、さらに、原子層成長(ALD)法で形成された膜又は化学気相成長(CVD)法で形成された膜を有していてもよいし、この膜のみであってもよい。 Further, the light emitting unit 140 is sealed by a sealing member (not shown). The sealing member is formed using, for example, a metal such as aluminum, or a resin, and has a polygonal shape or a circular shape similar to that of the substrate 100 and has a shape in which a concave portion is provided at the center. The edge of the sealing member is fixed to the substrate 100 with an adhesive. Thereby, the space surrounded by the sealing member and the substrate 100 is sealed. And the light emission part 140 is located in this sealed space. The sealing member may further include a film formed by an atomic layer deposition (ALD) method or a film formed by a chemical vapor deposition (CVD) method, or only this film. Also good.

 そして、基板100の第1面102は、第1無機層200が設けられていない領域(第1領域202)を有している。第1領域202は、発光装置10の非発光領域の一部、具体的には、複数の発光部140の間に位置する領域の少なくとも一部に設けられている。後述するように、発光装置10を壁や天井などの面に設置するとき、基板100の縁は折り曲げられる。第1領域202は、基板100のうち折り曲げられる領域に位置している。なお、第1領域202は第1無機層200に設けられた開口と定義することもできる。 The first surface 102 of the substrate 100 has a region (first region 202) where the first inorganic layer 200 is not provided. The first region 202 is provided in a part of the non-light emitting region of the light emitting device 10, specifically, at least a part of the region located between the plurality of light emitting units 140. As will be described later, when the light emitting device 10 is installed on a surface such as a wall or a ceiling, the edge of the substrate 100 is bent. The first region 202 is located in a region where the substrate 100 is bent. The first region 202 can also be defined as an opening provided in the first inorganic layer 200.

 本図に示す例において、発光部140は第1の方向(図2における左右方向)に並んで配置されている。そして第1領域202は、隣り合う発光部140の間に領域において、第1の方向に交わる第2の方向(例えば第1の方向に直交する方向)に、基板100の一辺からその一辺に対向する辺まで、延在している。言い換えると、第1無機層200は、隣り合う発光部140の間で分断されている。ただし、第1無機層200は、隣り合う発光部140の間で分断されていなくてもよい。なお、第1領域202の幅wは、例えば50μm以上である。 In the example shown in the figure, the light emitting units 140 are arranged side by side in the first direction (left-right direction in FIG. 2). The first region 202 is opposed to one side from one side of the substrate 100 in a second direction (for example, a direction orthogonal to the first direction) intersecting the first direction in the region between the adjacent light emitting units 140. It extends to the side. In other words, the first inorganic layer 200 is divided between the adjacent light emitting units 140. However, the first inorganic layer 200 may not be divided between the adjacent light emitting units 140. Note that the width w of the first region 202 is, for example, 50 μm or more.

 次に、発光装置10の製造方法を説明する。まず、例えば支持基板の上に樹脂を塗布することにより、基板100を形成する。次いで、基板100の第1面102に、例えばCVD法などの気相成膜法を用いて、第1無機層200を形成する。その後、第1無機層200の上にレジストパターンを形成し、このレジストパターンをマスクとして第1無機層200をエッチングする。これにより、第1面102には第1領域202が形成される。なお、第1領域202は、第1無機層200を成膜する際にマスクを用いることで、形成されてもよい。 Next, a method for manufacturing the light emitting device 10 will be described. First, the substrate 100 is formed, for example, by applying a resin on the support substrate. Next, the first inorganic layer 200 is formed on the first surface 102 of the substrate 100 by using a vapor deposition method such as a CVD method. Thereafter, a resist pattern is formed on the first inorganic layer 200, and the first inorganic layer 200 is etched using the resist pattern as a mask. As a result, the first region 202 is formed on the first surface 102. The first region 202 may be formed by using a mask when the first inorganic layer 200 is formed.

 次いで、第1無機層200の上に、第1電極、有機層、及び第2電極をこの順に形成する。これにより、複数の発光部140が形成される。その後、封止部材を用いて複数の発光部140を封止する。 Next, a first electrode, an organic layer, and a second electrode are formed in this order on the first inorganic layer 200. Thereby, a plurality of light emitting portions 140 are formed. Thereafter, the plurality of light emitting units 140 are sealed using a sealing member.

 図3は、発光装置10を使用する方法を説明する図である。発光装置10は例えば腕時計型の装置などであり、第1の方向(図2における左右方向)に沿ってリング形状に湾曲した状態で使用される。本図に示す例において、発光装置10はトップエミッション型であるため、非発光領域は、第1面102が凸になる方向に折り曲げられている。この際、発光装置10のうち発光部140が位置している領域は、少し湾曲しているか、又は湾曲していない状態になる。一方、発光装置10の第1領域202は、発光部140が位置している領域よりも大きく湾曲している。第1領域202には第1無機層200が形成されていないため、第1領域202において発光装置10を大きく湾曲させても、第1無機層200にクラックが生じる可能性は低いか、又はほとんどない。このため、水分が基板100を透過して発光部140に到達する可能性は高まらない。従って、発光装置10の信頼性は低下しにくい。 FIG. 3 is a diagram for explaining a method of using the light emitting device 10. The light-emitting device 10 is, for example, a wristwatch-type device, and is used in a state of being bent into a ring shape along a first direction (left-right direction in FIG. 2). In the example shown in this drawing, since the light emitting device 10 is a top emission type, the non-light emitting region is bent in a direction in which the first surface 102 is convex. At this time, the region where the light emitting unit 140 is located in the light emitting device 10 is slightly curved or not curved. On the other hand, the first region 202 of the light emitting device 10 is curved to be larger than the region where the light emitting unit 140 is located. Since the first inorganic layer 200 is not formed in the first region 202, even if the light emitting device 10 is largely curved in the first region 202, the possibility that a crack is generated in the first inorganic layer 200 is low or almost. Absent. For this reason, the possibility that moisture passes through the substrate 100 and reaches the light emitting unit 140 does not increase. Therefore, the reliability of the light emitting device 10 is unlikely to decrease.

(変形例1)
 図4は、変形例1に係る発光装置10の平面図であり、実施形態における図2に対応している。本変形例に係る発光装置10は、第1の方向(図4における左右方向)において両端に位置する発光部140のそれぞれと、第1の方向においてその発光部140に対向する基板100の縁(具体的には基板100のうち第2の方向(図中上下方向)に延在する辺)との間にも第1領域202が形成されている点を除いて、実施形態に係る発光装置10と同様の構成である。
(Modification 1)
FIG. 4 is a plan view of the light emitting device 10 according to the first modification, and corresponds to FIG. 2 in the embodiment. The light emitting device 10 according to this modification includes the light emitting units 140 located at both ends in the first direction (left and right direction in FIG. 4) and the edge of the substrate 100 facing the light emitting unit 140 in the first direction ( Specifically, the light emitting device 10 according to the embodiment, except that the first region 202 is also formed between the substrate 100 and the second direction (side extending in the vertical direction in the drawing). It is the same composition as.

 図5は、本変形例に係る発光装置10を使用する方法を説明する図である。本変形例においても、発光装置10はリング形状に湾曲した状態で使用される。さらに本変形例において、基板100のうち第1の方向における両端には第1領域202が設けられている。このため、本変形例では、基板100の両端を湾曲させて互いに重ねることができる。 FIG. 5 is a diagram for explaining a method of using the light emitting device 10 according to this modification. Also in this modification, the light emitting device 10 is used in a state of being curved in a ring shape. Further, in this modification, first regions 202 are provided at both ends of the substrate 100 in the first direction. For this reason, in this modification, both ends of the substrate 100 can be curved and overlap each other.

(変形例2)
 図6は、変形例2に係る発光装置10の断面図であり、実施形態における図1に対応している。本変形例に係る発光装置10は、基板100の第2面104に第2無機層210を備えている点を除いて、実施形態に係る発光装置10と同様の構成である。
(Modification 2)
FIG. 6 is a cross-sectional view of a light emitting device 10 according to Modification Example 2, and corresponds to FIG. 1 in the embodiment. The light emitting device 10 according to this modification has the same configuration as that of the light emitting device 10 according to the embodiment, except that the second surface 104 of the substrate 100 includes the second inorganic layer 210.

 第2無機層210の材料は、実施形態における第1無機層200の材料と同様である。ただし、第2無機層210は、第1無機層200と同一の材料で形成されていてもよいし、第1無機層200とは異なる材料を用いて形成されていてもよい。第2無機層210も、水分が基板100を透過することを防止するために設けられている。 The material of the second inorganic layer 210 is the same as the material of the first inorganic layer 200 in the embodiment. However, the second inorganic layer 210 may be formed of the same material as the first inorganic layer 200, or may be formed using a material different from that of the first inorganic layer 200. The second inorganic layer 210 is also provided to prevent moisture from permeating the substrate 100.

 本変形例によっても、基板100の第1面102には第1領域202が設けられているため、実施形態と同様に、第1領域202において発光装置10を湾曲させても、第1無機層200にクラックは生じない。このため、水分が基板100を透過して発光部140に到達する可能性は高まらない。従って、発光装置10の信頼性は低下しない。また、基板100の第2面104には第2無機層210が設けられているため、発光部140の有機層が水分によって劣化することをさらに抑制できる。 Also according to this modification, since the first region 202 is provided on the first surface 102 of the substrate 100, the first inorganic layer can be formed even if the light emitting device 10 is curved in the first region 202 as in the embodiment. 200 does not crack. For this reason, the possibility that moisture passes through the substrate 100 and reaches the light emitting unit 140 does not increase. Therefore, the reliability of the light emitting device 10 does not decrease. In addition, since the second inorganic layer 210 is provided on the second surface 104 of the substrate 100, the organic layer of the light emitting unit 140 can be further suppressed from being deteriorated by moisture.

(変形例3)
 図7は、変形例3に係る発光装置10の構成を示す断面図であり、実施形態における図1に対応している。本変形例に係る発光装置10は、第2面104が第2領域212を有している点を除いて、変形例2に係る発光装置10と同様の構成である。
(Modification 3)
FIG. 7 is a cross-sectional view illustrating a configuration of a light emitting device 10 according to Modification 3, and corresponds to FIG. 1 in the embodiment. The light emitting device 10 according to this modification has the same configuration as that of the light emitting device 10 according to modification 2 except that the second surface 104 has a second region 212.

 第2領域212は、第2面104のうち第2無機層210が形成されていない領域であり、第2面104に垂直な方向(図中y方向)から見た場合に、第1領域202と重なっている。すなわち第2領域212は、第2面104のうち、発光装置10の非発光領域の一部と重なる領域、具体的には、複数の発光部140の間に位置する領域の少なくとも一部に設けられている。そして第2領域212は、基板100のうち湾曲する領域に位置している。なお、第2無機層210は、第2領域212によって分断されている、ということもできる。また、第2領域212の幅方向(すなわち図7におけるx方向)において、第2領域212は第1領域202と完全に重なっていてもよいし、一部のみ重なっていてもよい。 The second region 212 is a region of the second surface 104 where the second inorganic layer 210 is not formed, and the first region 202 when viewed from a direction perpendicular to the second surface 104 (y direction in the drawing). It overlaps with. That is, the second region 212 is provided in at least a part of the second surface 104 that overlaps with a part of the non-light emitting region of the light emitting device 10, specifically, a region located between the plurality of light emitting units 140. It has been. The second region 212 is located in a curved region of the substrate 100. It can also be said that the second inorganic layer 210 is divided by the second region 212. Further, in the width direction of the second region 212 (that is, the x direction in FIG. 7), the second region 212 may completely overlap the first region 202 or may partially overlap.

 本変形例によれば、変形例2と同様に、第1領域202において基板100を湾曲させても、第1無機層200にクラックは生じない。このため、水分が基板100を透過して発光部140に到達する可能性は高まらない。また、基板100の第2面104には第2無機層210が設けられているため、発光部140の有機層が水分によって劣化することをさらに抑制できる。さらに本変形例によれば、第2無機層210は第2領域212を有しているため、第1領域202(すなわち第2領域212)において基板100を湾曲させても、第2無機層210にクラックは生じない。 According to this modification, as in Modification 2, even if the substrate 100 is curved in the first region 202, no cracks are generated in the first inorganic layer 200. For this reason, the possibility that moisture passes through the substrate 100 and reaches the light emitting unit 140 does not increase. In addition, since the second inorganic layer 210 is provided on the second surface 104 of the substrate 100, the organic layer of the light emitting unit 140 can be further suppressed from being deteriorated by moisture. Furthermore, according to this modification, since the second inorganic layer 210 has the second region 212, even if the substrate 100 is curved in the first region 202 (that is, the second region 212), the second inorganic layer 210. Cracks do not occur.

 なお、上記した実施形態及び各変形例において、発光装置10がボトムエミッション型の発光装置である場合、図8に示すように、第2面104側が凸になる方向に基板100を湾曲させる。 In the above-described embodiments and modifications, when the light emitting device 10 is a bottom emission type light emitting device, the substrate 100 is curved in a direction in which the second surface 104 side is convex as shown in FIG.

 また、第1無機層200と基板100の第1面102の間に、少なくとも1つの層が形成されていることもある。この場合においても、第1領域202において第1無機層200は形成されていない。ただし、上記した少なくとも1つの層は、第1領域202において残されていてもよいし、除去されていてもよい。 Also, at least one layer may be formed between the first inorganic layer 200 and the first surface 102 of the substrate 100. Even in this case, the first inorganic layer 200 is not formed in the first region 202. However, the at least one layer described above may be left in the first region 202 or may be removed.

 例えば図18及び図19に示す例では、基板100の上には、無機層206、有機層205、及び第1無機層200がこの順に形成されている。無機層206及び第1無機層200は、いずれもバリア層として形成されており、有機層205は平坦化層として設けられている。無機層206の材料は、第1無機層200と同様である。ただし、第1無機層200と無機層206の材料は互いに異なっていてもよい。 For example, in the example shown in FIGS. 18 and 19, the inorganic layer 206, the organic layer 205, and the first inorganic layer 200 are formed on the substrate 100 in this order. The inorganic layer 206 and the first inorganic layer 200 are both formed as barrier layers, and the organic layer 205 is provided as a planarization layer. The material of the inorganic layer 206 is the same as that of the first inorganic layer 200. However, the materials of the first inorganic layer 200 and the inorganic layer 206 may be different from each other.

 そして、図18に示す例において、第1領域202において第1無機層200は除去されているが、有機層205及び無機層206は残されている。一方、図19に示す例において、第1領域202において、有機層205及び無機層206も除去されている。 In the example shown in FIG. 18, the first inorganic layer 200 is removed in the first region 202, but the organic layer 205 and the inorganic layer 206 are left. On the other hand, in the example shown in FIG. 19, the organic layer 205 and the inorganic layer 206 are also removed in the first region 202.

(実施例1)
 図9は、実施例1に係る発光装置10の発光部140の構成を示す平面図である。図10は、図9から第2電極130を取り除いた図である。図11は図10から有機層120及び絶縁層150を取り除いた図である。図12は図9のB-B断面図である。
(Example 1)
FIG. 9 is a plan view illustrating the configuration of the light emitting unit 140 of the light emitting device 10 according to the first embodiment. FIG. 10 is a diagram in which the second electrode 130 is removed from FIG. 9. FIG. 11 is a diagram in which the organic layer 120 and the insulating layer 150 are removed from FIG. 12 is a cross-sectional view taken along the line BB of FIG.

 本実施例において、発光装置10は照明装置であり、基板100、発光部140、第1無機層200、及び第2無機層210を備えている。発光部140は、第1電極110、有機層120、及び第2電極130を有している。第1電極110、有機層120、及び第2電極130の構成は、実施形態の通りである。 In this embodiment, the light emitting device 10 is a lighting device, and includes a substrate 100, a light emitting unit 140, a first inorganic layer 200, and a second inorganic layer 210. The light emitting unit 140 includes a first electrode 110, an organic layer 120, and a second electrode 130. The configurations of the first electrode 110, the organic layer 120, and the second electrode 130 are the same as in the embodiment.

 本実施例において、発光装置10は、第1無機層200及び第2無機層210の双方を有している。そして、基板100の第1面102には第1領域202が設けられており、基板100の第2面104には第2領域212が設けられている。 In this example, the light emitting device 10 has both the first inorganic layer 200 and the second inorganic layer 210. A first region 202 is provided on the first surface 102 of the substrate 100, and a second region 212 is provided on the second surface 104 of the substrate 100.

 第1電極110の縁は、絶縁層150によって覆われている。絶縁層150は例えばポリイミドなどの感光性の樹脂材料によって形成されており、第1電極110のうち発光部140の発光領域となる部分を囲んでいる。絶縁層150を設けることにより、第1電極110の縁において第1電極110と第2電極130が短絡することを抑制できる。絶縁層150は、絶縁層150となる樹脂材料を塗布した後、この樹脂材料を露光及び現像することにより、形成される。この工程は、例えば第1電極110を形成した後、有機層120を形成する前に行われる。 The edge of the first electrode 110 is covered with an insulating layer 150. The insulating layer 150 is made of, for example, a photosensitive resin material such as polyimide, and surrounds a portion of the first electrode 110 that becomes a light emitting region of the light emitting unit 140. By providing the insulating layer 150, it is possible to suppress a short circuit between the first electrode 110 and the second electrode 130 at the edge of the first electrode 110. The insulating layer 150 is formed by applying a resin material to be the insulating layer 150 and then exposing and developing the resin material. This step is performed, for example, after forming the first electrode 110 and before forming the organic layer 120.

 また、発光装置10は、第1端子112及び第2端子132を有している。第1端子112は第1電極110に接続しており、第2端子132は第2電極130に接続している。第1端子112及び第2端子132は、例えば、第1電極110と同一の材料で形成された層を有している。なお、第1端子112と第1電極110の間には引出配線が設けられていてもよい。また、第2端子132と第2電極130の間にも引出配線が設けられていてもよい。 Further, the light emitting device 10 has a first terminal 112 and a second terminal 132. The first terminal 112 is connected to the first electrode 110, and the second terminal 132 is connected to the second electrode 130. For example, the first terminal 112 and the second terminal 132 include a layer formed of the same material as that of the first electrode 110. A lead wiring may be provided between the first terminal 112 and the first electrode 110. In addition, a lead wiring may be provided between the second terminal 132 and the second electrode 130.

 次に、本実施例における発光装置10の製造方法を説明する。まず、基板100、第1無機層200、及び第2無機層210を形成する。これらの形成方法は実施形態と同様である。次いで、基板100上に第1電極110、第1端子112、及び第2端子132を形成する。この際、必要に応じて引出配線も形成される。次いで実施形態と同様に、有機層120及び第2電極130を形成する。 Next, a method for manufacturing the light emitting device 10 in this embodiment will be described. First, the substrate 100, the first inorganic layer 200, and the second inorganic layer 210 are formed. These forming methods are the same as those in the embodiment. Next, the first electrode 110, the first terminal 112, and the second terminal 132 are formed on the substrate 100. At this time, lead wires are also formed as necessary. Next, as in the embodiment, the organic layer 120 and the second electrode 130 are formed.

 本実施例によっても、実施形態及び変形例と同様に、第1領域202を起点に基板100を湾曲させても、第1無機層200にクラックは生じない。従って、発光装置10の信頼性は低下しない。 Also in the present example, as in the embodiment and the modification, even if the substrate 100 is curved with the first region 202 as a starting point, the first inorganic layer 200 does not crack. Therefore, the reliability of the light emitting device 10 does not decrease.

 なお、図9~図12に示す例において、第1端子112及び第2端子132は第1領域202とは異なる方向を向いている。ただし、第1端子112及び第2端子132は、第1領域202と重なる領域を向いていてもよい。この場合、図20に示すように、第1領域202は、第1端子112及び第2端子132よりも発光部140の近くに位置していてもよい。第2領域212の位置も第1領域202の位置と同様である。 In the example shown in FIGS. 9 to 12, the first terminal 112 and the second terminal 132 are directed in a different direction from the first region 202. However, the first terminal 112 and the second terminal 132 may face a region overlapping with the first region 202. In this case, as shown in FIG. 20, the first region 202 may be located closer to the light emitting unit 140 than the first terminal 112 and the second terminal 132. The position of the second area 212 is the same as the position of the first area 202.

(実施例2) (Example 2)

 図13は、実施例2に係る発光装置10が有する発光部140の平面図である。図14は、図13から隔壁170、第2電極130、有機層120、及び絶縁層150を取り除いた図である。図15は図13のC-C断面図であり、図16は図13のD-D断面図であり、図17は図13のE-E断面図である。 FIG. 13 is a plan view of the light emitting unit 140 included in the light emitting device 10 according to the second embodiment. 14 is a view in which the partition 170, the second electrode 130, the organic layer 120, and the insulating layer 150 are removed from FIG. 15 is a sectional view taken along the line CC in FIG. 13, FIG. 16 is a sectional view taken along the line DD in FIG. 13, and FIG. 17 is a sectional view taken along the line EE in FIG.

 本実施形態に係る発光部140は表示装置であり、基板100、第1電極110、発光部140、絶縁層150、複数の開口152、複数の開口154、複数の引出配線114、有機層120、第2電極130、複数の引出配線134、及び複数の隔壁170を有している。そして発光部140は、画素となる発光素子を複数有している。 The light emitting unit 140 according to the present embodiment is a display device, and includes a substrate 100, a first electrode 110, a light emitting unit 140, an insulating layer 150, a plurality of openings 152, a plurality of openings 154, a plurality of lead wires 114, an organic layer 120, A second electrode 130, a plurality of lead wires 134, and a plurality of partition walls 170 are provided. The light emitting unit 140 has a plurality of light emitting elements to be pixels.

 第1電極110は、第1方向(図13におけるY方向)にライン状に延在している。そして第1電極110の端部は、引出配線114に接続している。 The first electrode 110 extends in a line shape in the first direction (Y direction in FIG. 13). The end portion of the first electrode 110 is connected to the lead wiring 114.

 引出配線114は、第1電極110を第1端子112に接続する配線である。本図に示す例では、引出配線114の一端側は第1電極110に接続しており、引出配線114の他端側は第1端子112となっている。本図に示す例において、第1電極110及び引出配線114は一体になっている。そして引出配線114の上には、導体層180が形成されている。導体層180は、単層または多層の金属層である。導体層180は、例えばMo合金層、Al合金層、及びMo合金層をこの順に積層した構成を有している。なお、引出配線114の一部は絶縁層150によって覆われている。 The lead wiring 114 is a wiring that connects the first electrode 110 to the first terminal 112. In the example shown in the drawing, one end side of the lead wiring 114 is connected to the first electrode 110, and the other end side of the lead wiring 114 is the first terminal 112. In the example shown in the figure, the first electrode 110 and the lead-out wiring 114 are integrated. A conductor layer 180 is formed on the lead wiring 114. The conductor layer 180 is a single layer or a multilayer metal layer. The conductor layer 180 has a configuration in which, for example, a Mo alloy layer, an Al alloy layer, and a Mo alloy layer are stacked in this order. A part of the lead wiring 114 is covered with an insulating layer 150.

 絶縁層150は、図13、及び図15~図17に示すように、複数の第1電極110上及びその間の領域に形成されている。絶縁層150には、複数の開口152及び複数の開口154が形成されている。複数の第2電極130は、第1電極110と交差する方向(例えば直交する方向:図13におけるX方向)に互いに平行に延在している。そして、複数の第2電極130の間には、詳細を後述する隔壁170が延在している。開口152は、平面視で第1電極110と第2電極130の交点に位置している。具体的には、複数の開口152は、第1電極110が延在する方向(図13におけるY方向)に並んでいる。また、複数の開口152は、第2電極130の延在方向(図13におけるX方向)にも並んでいる。このため、複数の開口152はマトリクスを構成するように配置されていることになる。 As shown in FIGS. 13 and 15 to 17, the insulating layer 150 is formed on the plurality of first electrodes 110 and in a region therebetween. A plurality of openings 152 and a plurality of openings 154 are formed in the insulating layer 150. The plurality of second electrodes 130 extend in parallel to each other in a direction intersecting the first electrode 110 (for example, a direction orthogonal to the X direction in FIG. 13). A partition wall 170, which will be described in detail later, extends between the plurality of second electrodes 130. The opening 152 is located at the intersection of the first electrode 110 and the second electrode 130 in plan view. Specifically, the plurality of openings 152 are arranged in the direction in which the first electrode 110 extends (Y direction in FIG. 13). The plurality of openings 152 are also arranged in the extending direction of the second electrode 130 (X direction in FIG. 13). For this reason, the plurality of openings 152 are arranged to form a matrix.

 開口154は、平面視で複数の第2電極130のそれぞれの一端側と重なる領域に位置している。また開口154は、開口152が構成するマトリクスの一辺に沿って配置されている。そしてこの一辺に沿う方向(例えば図13におけるY方向、すなわち第1電極110に沿う方向)で見た場合、開口154は、所定の間隔で配置されている。開口154からは、引出配線134の一部分が露出している。そして、引出配線134は、開口154を介して第2電極130に接続している。 The opening 154 is located in a region overlapping with one end side of each of the plurality of second electrodes 130 in plan view. The openings 154 are arranged along one side of the matrix formed by the openings 152. And when it sees in the direction (For example, the Y direction in FIG. 13, ie, the direction in alignment with the 1st electrode 110) along this one side, the opening 154 is arrange | positioned by the predetermined space | interval. A part of the lead wiring 134 is exposed from the opening 154. The lead wiring 134 is connected to the second electrode 130 through the opening 154.

 引出配線134は、第2電極130を第2端子132に接続する配線であり、第1電極110と同一の材料からなる層を有している。引出配線134の一端側は開口154の下に位置しており、引出配線134の他端側は、絶縁層150の外部に引き出されている。そして本図に示す例では、引出配線134の他端側が第2端子132となっている。そして引出配線134の上には、導体層180が形成されている。なお、引出配線134の一部は絶縁層150によって覆われている。 The lead wiring 134 is a wiring that connects the second electrode 130 to the second terminal 132, and has a layer made of the same material as the first electrode 110. One end side of the lead wiring 134 is located below the opening 154, and the other end side of the lead wiring 134 is led out of the insulating layer 150. In the example shown in the figure, the other end side of the lead-out wiring 134 is the second terminal 132. A conductor layer 180 is formed on the lead wiring 134. A part of the lead wiring 134 is covered with an insulating layer 150.

 開口152と重なる領域には、有機層120が形成されている。有機層120の正孔注入層は第1電極110に接しており、有機層120の電子注入層は第2電極130に接している。このため、発光部140は、開口152と重なる領域それぞれに発光素子を有していることになる。 In the region overlapping with the opening 152, the organic layer 120 is formed. The hole injection layer of the organic layer 120 is in contact with the first electrode 110, and the electron injection layer of the organic layer 120 is in contact with the second electrode 130. Therefore, the light emitting unit 140 has a light emitting element in each of the regions overlapping with the opening 152.

 なお、図15及び図16に示す例では、有機層120を構成する各層は、いずれも開口152の外側まではみ出している場合を示している。そして図16に示すように、有機層120は、隔壁170が延在する方向において、隣り合う開口152の間にも連続して形成されていてもよいし、連続して形成していなくてもよい。ただし、図17に示すように、有機層120は、開口154には形成されていない。 In the example shown in FIGS. 15 and 16, the layers constituting the organic layer 120 are shown to protrude beyond the opening 152. And as shown in FIG. 16, the organic layer 120 may be continuously formed between the adjacent openings 152 in the direction in which the partition 170 extends, or may not be formed continuously. Good. However, as shown in FIG. 17, the organic layer 120 is not formed in the opening 154.

 第2電極130は、図13、図15~図17に示すように、第1方向と交わる第2方向(図13におけるX方向)に延在している。そして隣り合う第2電極130の間には、隔壁170が形成されている。隔壁170は、第2電極130と平行すなわち第2方向に延在している。隔壁170の下地は、例えば絶縁層150である。隔壁170は、例えばポリイミド系樹脂などの感光性の樹脂であり、露光及び現像されることによって、所望のパターンに形成されている。なお、隔壁170はポリイミド系樹脂以外の樹脂、例えばエポキシ系樹脂やアクリル系樹脂、二酸化珪素等の無機材料で構成されていても良い。 As shown in FIGS. 13 and 15 to 17, the second electrode 130 extends in a second direction (X direction in FIG. 13) intersecting the first direction. A partition wall 170 is formed between the adjacent second electrodes 130. The partition wall 170 extends in parallel to the second electrode 130, that is, in the second direction. The base of the partition 170 is, for example, the insulating layer 150. The partition 170 is, for example, a photosensitive resin such as a polyimide resin, and is formed in a desired pattern by being exposed and developed. The partition wall 170 may be made of a resin other than a polyimide resin, for example, an inorganic material such as an epoxy resin, an acrylic resin, or silicon dioxide.

 隔壁170は、断面が台形の上下を逆にした形状(逆台形)になっている。すなわち隔壁170の上面の幅は、隔壁170の下面の幅よりも大きい。このため、隔壁170を第2電極130より前に形成しておくと、蒸着法やスパッタリング法を用いて、第2電極130を基板100の一面側に形成することで、複数の第2電極130を一括で形成することができる。また、隔壁170は、有機層120を分断する機能も有している。 The partition wall 170 has a trapezoidal cross-sectional shape (reverse trapezoid). That is, the width of the upper surface of the partition wall 170 is larger than the width of the lower surface of the partition wall 170. Therefore, if the partition wall 170 is formed before the second electrode 130, the second electrode 130 is formed on one surface side of the substrate 100 by using an evaporation method or a sputtering method. Can be formed collectively. The partition wall 170 also has a function of dividing the organic layer 120.

 そして本実施例においても、発光装置10は第1無機層200、第2無機層210、第1領域202、及び第2領域212を有している。 Also in this embodiment, the light emitting device 10 includes the first inorganic layer 200, the second inorganic layer 210, the first region 202, and the second region 212.

 次に、本実施例における発光装置10の製造方法を説明する。まず、基板100、第1無機層200、及び第2無機層210を形成する。これらの形成方法は実施形態と同様である。次いで、基板100上に第1電極110及び引出配線114,134を形成する。これらの形成方法は、実施例1と同様である。 Next, a method for manufacturing the light emitting device 10 in this embodiment will be described. First, the substrate 100, the first inorganic layer 200, and the second inorganic layer 210 are formed. These forming methods are the same as those in the embodiment. Next, the first electrode 110 and the lead wires 114 and 134 are formed on the substrate 100. These forming methods are the same as those in Example 1.

 次いで、引出配線114上及び引出配線134上に、導体層180を形成する。次いで、絶縁層150を形成し、さらに隔壁170を形成する。次いで実施形態と同様に、有機層120及び第2電極130を形成する。 Next, a conductor layer 180 is formed on the lead wiring 114 and the lead wiring 134. Next, the insulating layer 150 is formed, and further the partition 170 is formed. Next, as in the embodiment, the organic layer 120 and the second electrode 130 are formed.

 本実施例によっても、実施形態及び変形例と同様に、第1領域202で基板100を湾曲させても、第1無機層200にクラックは生じない。従って、発光装置10の信頼性は低下しない。 Also in the present example, as in the embodiment and the modification, even if the substrate 100 is curved in the first region 202, the first inorganic layer 200 is not cracked. Therefore, the reliability of the light emitting device 10 does not decrease.

 以上、図面を参照して実施形態及び実施例について述べたが、これらは本発明の例示であり、上記以外の様々な構成を採用することもできる。 As mentioned above, although embodiment and the Example were described with reference to drawings, these are the illustrations of this invention, Various structures other than the above are also employable.

Claims (5)

 樹脂を用いて形成された基板と、
 前記基板の第1面に形成された第1無機層と、
 前記第1無機層の上に形成され、有機層を有する複数の発光部と、
を備え、
 前記第1面は、前記第1無機層が形成されていない領域である第1領域を有しており、かつ前記第1領域は前記複数の発光部の間に位置する領域の少なくとも一部に位置している発光装置。
A substrate formed using a resin;
A first inorganic layer formed on the first surface of the substrate;
A plurality of light emitting portions formed on the first inorganic layer and having an organic layer;
With
The first surface has a first region which is a region where the first inorganic layer is not formed, and the first region is at least part of a region located between the plurality of light emitting units. Light emitting device located.
 請求項1に記載の発光装置において、
 前記複数の発光部は第1の方向に並んで配置されており、
 前記第1無機層は、前記第1領域によって、前記複数の発光部の間において分断されている発光装置。
The light-emitting device according to claim 1.
The plurality of light emitting units are arranged side by side in a first direction,
The light emitting device, wherein the first inorganic layer is divided between the plurality of light emitting units by the first region.
 請求項1又は2に記載の発光装置において、
 前記基板は、折れ曲がっている屈曲部を前記発光部が形成されていない領域に有しており、
 前記屈曲部は、前記第1領域に位置している発光装置。
The light-emitting device according to claim 1 or 2,
The substrate has a bent portion that is bent in a region where the light emitting portion is not formed,
The bent portion is a light emitting device located in the first region.
 請求項1~3のいずれか一項に記載の発光装置において、
 前記基板の第2面に形成された第2無機層を備え、
 前記第2面は、前記第1領域と重なる領域に、前記第2無機層が形成されていない領域である第2領域を有している発光装置。
The light emitting device according to any one of claims 1 to 3,
A second inorganic layer formed on the second surface of the substrate;
The light emitting device, wherein the second surface has a second region that is a region where the second inorganic layer is not formed in a region overlapping the first region.
 請求項1~4のいずれか一項に記載の発光装置において、
 前記第1無機層は、酸化シリコン、酸窒化シリコン、炭素添加酸化シリコン、窒化シリコン、酸化アルミニウム、及び酸化チタンの少なくとも一つを含む発光装置。
The light emitting device according to any one of claims 1 to 4,
The first inorganic layer is a light emitting device including at least one of silicon oxide, silicon oxynitride, carbon-added silicon oxide, silicon nitride, aluminum oxide, and titanium oxide.
PCT/JP2015/059715 2015-03-27 2015-03-27 Light emitting device Ceased WO2016157321A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2015/059715 WO2016157321A1 (en) 2015-03-27 2015-03-27 Light emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2015/059715 WO2016157321A1 (en) 2015-03-27 2015-03-27 Light emitting device

Publications (1)

Publication Number Publication Date
WO2016157321A1 true WO2016157321A1 (en) 2016-10-06

Family

ID=57004834

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2015/059715 Ceased WO2016157321A1 (en) 2015-03-27 2015-03-27 Light emitting device

Country Status (1)

Country Link
WO (1) WO2016157321A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018173614A1 (en) * 2017-03-22 2018-09-27 住友化学株式会社 Organic el element and manufacturing method therefor
WO2019064414A1 (en) * 2017-09-28 2019-04-04 シャープ株式会社 Display device and production method for same

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1092574A (en) * 1996-09-11 1998-04-10 Sanyo Electric Co Ltd Organic electroluminescent panel
JP2005123622A (en) * 2003-10-14 2005-05-12 Samsung Electronics Co Ltd Flexible printed circuit board and liquid crystal display device having the same
JP2005251671A (en) * 2004-03-08 2005-09-15 Fuji Photo Film Co Ltd Display device
WO2013046545A1 (en) * 2011-09-26 2013-04-04 パナソニック株式会社 Method for manufacturing light emitting device, and light emitting device
JP2014193605A (en) * 2013-03-01 2014-10-09 Panasonic Corp Multilayer film, electronic device and method for producing them
JP2014232300A (en) * 2013-05-28 2014-12-11 エルジー ディスプレイ カンパニー リミテッド Flexible display device and manufacturing method therefor

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1092574A (en) * 1996-09-11 1998-04-10 Sanyo Electric Co Ltd Organic electroluminescent panel
JP2005123622A (en) * 2003-10-14 2005-05-12 Samsung Electronics Co Ltd Flexible printed circuit board and liquid crystal display device having the same
JP2005251671A (en) * 2004-03-08 2005-09-15 Fuji Photo Film Co Ltd Display device
WO2013046545A1 (en) * 2011-09-26 2013-04-04 パナソニック株式会社 Method for manufacturing light emitting device, and light emitting device
JP2014193605A (en) * 2013-03-01 2014-10-09 Panasonic Corp Multilayer film, electronic device and method for producing them
JP2014232300A (en) * 2013-05-28 2014-12-11 エルジー ディスプレイ カンパニー リミテッド Flexible display device and manufacturing method therefor

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018173614A1 (en) * 2017-03-22 2018-09-27 住友化学株式会社 Organic el element and manufacturing method therefor
JP2018160329A (en) * 2017-03-22 2018-10-11 住友化学株式会社 Organic el element, and method for manufacturing the same
CN110447310A (en) * 2017-03-22 2019-11-12 住友化学株式会社 Organic EL element and method for producing organic EL element
EP3606292A4 (en) * 2017-03-22 2020-11-18 Sumitomo Chemical Company, Limited ORGANIC ELECTROLUMINESCENT ELEMENT AND MANUFACTURING METHOD FOR IT
WO2019064414A1 (en) * 2017-09-28 2019-04-04 シャープ株式会社 Display device and production method for same
CN111149146A (en) * 2017-09-28 2020-05-12 夏普株式会社 Display device and method of manufacturing the same
US10971566B2 (en) 2017-09-28 2021-04-06 Sharp Kabushiki Kaisha Display device including frame wiring in bending section
CN111149146B (en) * 2017-09-28 2021-12-07 夏普株式会社 Display device and method for manufacturing the same

Similar Documents

Publication Publication Date Title
WO2017154482A1 (en) Sealing structure and light emitting device
JP2016119201A (en) Light-emitting device
WO2016157321A1 (en) Light emitting device
JP6661373B2 (en) Light emitting device
JP2016095990A (en) Light emitting device
JP2016091948A (en) Light-emitting device
JP2016186911A (en) Light emission device
US20220338317A1 (en) Light emitting device
JP6700309B2 (en) Light emitting device
JP2016149223A (en) Light-emitting device
WO2017163331A1 (en) Light emitting device, electronic device, and manufacturing method for light emitting device
JP2017123239A (en) Light-emitting device
JP2016095991A (en) Light emission device
JP2018133274A (en) Light emitting device
JP6580336B2 (en) Light emitting device
JP2016186906A (en) Light emission device
JP6981843B2 (en) Connection structure and light emitting device
JP2016091949A (en) Light-emitting device
JP6450124B2 (en) Light emitting device
JP6499876B2 (en) Light emitting device
JP6700013B2 (en) Light emitting device
JP6496138B2 (en) Light emitting device
JP2017216203A (en) Light-emitting device
WO2016129114A1 (en) Light-emitting device and method for producing light-emitting device
JP2016143529A (en) Light emission device

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 15887474

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 15887474

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: JP