[go: up one dir, main page]

WO2016072509A1 - Aqueous coating solution, film and manufacturing method therefor, laminate, and solar cell module - Google Patents

Aqueous coating solution, film and manufacturing method therefor, laminate, and solar cell module Download PDF

Info

Publication number
WO2016072509A1
WO2016072509A1 PCT/JP2015/081383 JP2015081383W WO2016072509A1 WO 2016072509 A1 WO2016072509 A1 WO 2016072509A1 JP 2015081383 W JP2015081383 W JP 2015081383W WO 2016072509 A1 WO2016072509 A1 WO 2016072509A1
Authority
WO
WIPO (PCT)
Prior art keywords
film
aqueous coating
silica particles
coating solution
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2015/081383
Other languages
French (fr)
Japanese (ja)
Inventor
河野 哲夫
譲 富永
英正 細田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to CN201580056689.2A priority Critical patent/CN107073520A/en
Publication of WO2016072509A1 publication Critical patent/WO2016072509A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/25Oxides by deposition from the liquid phase
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/30Coatings
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to an aqueous coating solution, a film and a manufacturing method thereof, a laminate, and a solar cell module.
  • the aqueous coating solution containing silica fine particles uses a solvent containing water, and is used for various applications because the formed film has low surface energy and excellent transparency. As its application, it is suitably used for antireflection films, optical lenses, optical filters, flat films for thin film transistors (TFT) of various displays, anti-condensation films, antifouling films, surface protective films, and the like.
  • TFT thin film transistors
  • the antireflection film is useful because it can be used for, for example, a solar cell module, a surveillance camera, a lighting device, and a protective film for a sign.
  • Various coating compositions and coating methods have been developed for anti-reflective coating applications.
  • JP 2013-527879 A discloses a coating method for imparting at least one of antireflection properties and durability to a substrate as non-spherical nanoparticles, spherical nanoparticles, optionally a surfactant, And a step of applying to the substrate a coating composition containing non-spherical nanoparticles or at least a part of the spherical nanoparticles having functional groups on the surface, and drying the coating composition to form a hydrophilic coating on the substrate
  • a method for modifying the surface of a substrate including the step of forming a substrate is disclosed.
  • Japanese Patent No. 5266549 includes a core material containing a cationic polymer and a shell material containing a metal oxide as a coating composition that can be used for optical coating such as an antireflection coating, and an average specific size of 10 nm. Compositions containing nanoparticles that are 200 nm or less are disclosed.
  • Japanese Patent Application Laid-Open No. 2009-54352 discloses a paint containing a silica fine particle having an air layer and / or a metal oxide composed of porous silica fine particles and a resin as a low reflective film forming paint. It is disclosed.
  • the surface of the base material modified by the method described in JP-T-2013-527879 has excellent antireflection properties, but does not have sufficient scratch resistance.
  • the layers obtained from the compositions or paints described in Japanese Patent No. 5266549 and Japanese Patent Application Laid-Open No. 2009-54352 are also excellent in antireflection properties but are not sufficiently scratch resistant. That is, the actual situation is that a film having excellent antireflection properties and scratch resistance has not been provided.
  • One embodiment of the present invention has been made in view of the above circumstances, and is excellent in an aqueous coating liquid in which a film excellent in antireflection and scratch resistance is formed, and in antireflection and scratch resistance.
  • Another object of the present invention is to provide a film, a manufacturing method thereof, a laminate, and a solar cell module, and to achieve this object.
  • Specific means for achieving the object includes the following aspects. ⁇ 1> On a substrate, containing water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant, and having a pH of 1.5 to 3.5
  • a method for producing a film comprising: a step of applying a certain aqueous coating solution to form a coating film; and a step of drying the coating film formed by coating.
  • ⁇ 2> The method for producing a film according to ⁇ 1>, wherein the non-porous silica particles have an average primary particle diameter of 6 nm or less.
  • ⁇ 3> The method for producing a film according to ⁇ 1> or ⁇ 2>, wherein the pH of the aqueous coating solution is 1.8 to 3.0.
  • ⁇ 4> The film according to any one of ⁇ 1> to ⁇ 3>, further including a step of baking the dried coated film at a temperature of 400 ° C. or higher and 800 ° C. or lower after the step of drying the coated film. Manufacturing method.
  • ⁇ 5> The method for producing a film according to ⁇ 4>, wherein the baking is performed at a temperature of 500 ° C. or higher and 800 ° C.
  • ⁇ 6> The method for producing a film according to ⁇ 4> or ⁇ 5>, wherein the step of baking forms a particle connected body in which a plurality of nonporous silica particles are connected by baking.
  • ⁇ 7> The method for producing a film according to any one of ⁇ 4> to ⁇ 6>, wherein the coating film after baking has a thickness of 50 nm to 350 nm.
  • At least the coating film after drying has an absolute value of the average reflectance change ⁇ R defined by the following formula (1) at 5 ° incidence with light having a wavelength of 400 nm to 1100 nm of 2.0% or more.
  • ⁇ 1> to ⁇ 7> The method for producing a film according to any one of ⁇ 7>.
  • R 1 represents the average reflectance of the substrate after film formation
  • R 2 represents the average reflectance of the substrate.
  • aqueous coating solution having a pH of 1.5 to 3.5 comprising water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant.
  • ⁇ 11> The aqueous coating solution according to ⁇ 10>, wherein the average primary particle diameter of the nonporous silica particles is 6 nm or less.
  • ⁇ 12> The aqueous coating solution according to ⁇ 10> or ⁇ 11>, wherein the pH of the aqueous coating solution is 1.8 to 3.0.
  • ⁇ 13> The aqueous coating solution according to any one of ⁇ 10> to ⁇ 12>, wherein the surfactant is a nonionic surfactant.
  • ⁇ 14> A film containing one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles and a film thickness of 50 nm to 350 nm.
  • the absolute value of the average reflectance change ⁇ R at the time of 5 ° incidence in light having a wavelength of 400 nm to 1100 nm defined by the following formula (1) is 2.0% or more. The membrane described.
  • R 1 represents the average reflectance of the substrate after film formation
  • R 2 represents the average reflectance of the substrate.
  • ⁇ 18> The membrane according to any one of ⁇ 14> to ⁇ 17>, wherein the nonporous silica particles are contained as a particle connected body in which a plurality of nonporous silica particles are connected.
  • ⁇ 19> The film according to any one of ⁇ 14> to ⁇ 17>, further containing a surfactant.
  • ⁇ 20> The film according to any one of ⁇ 14> to ⁇ 19>, wherein the surface roughness Ra is 20 nm or less.
  • ⁇ 21> On a base material, the film produced by the production method according to any one of ⁇ 1> to ⁇ 9> or the film according to any one of ⁇ 14> to ⁇ 20> Laminated body.
  • ⁇ 22> The laminate according to ⁇ 21>, wherein the substrate is a glass substrate.
  • a solar cell module including the laminate according to ⁇ 21> or ⁇ 22>.
  • an aqueous coating solution for forming a film excellent in antireflection and scratch resistance, a film excellent in antireflection and scratch resistance, a method for producing the same, a laminate, and A solar cell module is provided.
  • the method for producing a membrane comprises, on a substrate, water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant, and has a pH of 1.5 to 3 And a step of forming a coating film by applying an aqueous coating solution of .5, and a step of drying the coating film formed by coating. It is preferable that the manufacturing method of a film
  • membrane includes the process of baking the coating film after drying further at the temperature of 400 to 800 degreeC after the process of drying a coating film.
  • the film production method of one embodiment of the present invention includes one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles in an aqueous coating liquid, and controls the pH of the aqueous coating liquid.
  • the nonporous silica By making the zeta potential value on the surface of the porous silica particles zero or close to zero (the pH of the aqueous coating solution is set to a value close to pH 2.0, which is the isoelectric point of the silica particles), the nonporous silica Since the particles form a soft agglomerated state, a high void amount can be realized when the film is formed, and it is considered that a film having excellent antireflection properties can be formed without using beaded (chain) silica particles. And since the average primary particle diameter of a nonporous silica particle is 8 nm or less, it is thought that the film
  • a film excellent in antireflection and scratch resistance that cannot be achieved with an aqueous coating agent containing silica linked in a chain, porous silica, hollow silica, or the like is formed. Conceivable. Furthermore, since the average primary particle diameter of the nonporous silica particles is 8 nm or less, the surface of the formed film is smooth and the adhesion of dirt to the film is suppressed. Therefore, the film produced by the production method of one embodiment of the present invention is excellent in antifouling properties in addition to the above antireflection properties and scratch resistance.
  • the method for producing a membrane comprises, on a substrate, water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant, and has a pH of 1.5 to 3 And a step of applying a water-based coating solution of .5 to form a coating film.
  • the aqueous coating solution contains water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant, and has a pH of 1.5 to 3.5. It is particularly important in terms of antireflection that the aqueous coating solution contains only one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles. That is, by using nonporous silica particles having a specific average primary particle diameter without using these silica particles, a membrane that has conventionally used bead-like (chain-like) silica particles or porous silica particles is used.
  • the aqueous coating liquid preferably has an average primary particle diameter of nonporous silica particles of 6 nm or less and a pH of 1.8 to 3.0.
  • Nonporous silica particles means particles having no voids inside silica particles, and are distinguished from hollow silica particles, porous silica particles, and the like particles having voids inside.
  • the “nonporous silica particles” have a core such as a polymer inside the particles, and the outer shell (shell) of the core is silica or a precursor of silica (for example, a material that changes to silica by firing).
  • the core-shell structured silica particles are not included.
  • the average primary particle diameter of the nonporous silica particles is 8 nm or less. When the average primary particle diameter exceeds 8 nm, the antireflection property is poor.
  • the average primary particle diameter is preferably 6 nm or less, more preferably 2 nm to 4 nm from the above viewpoint.
  • the average primary particle diameter of the nonporous silica particles can be determined from the photograph obtained by observing the dispersed particles with a transmission electron microscope. From the image of the photograph, the projected area of the particles is obtained, and the diameter (equivalent circle diameter) of a circle having an area equal to the projected area is obtained and set as the average particle diameter (average primary particle diameter).
  • the average primary particle diameter in this specification is a value obtained by measuring the projected area of 300 or more particles, obtaining the equivalent circle diameter, and arithmetically averaging the equivalent circle diameter.
  • nonporous silica particles may be used, and examples thereof include NALCO (registered trademark) 8699, 2326, and 1115 manufactured by NALCO.
  • the content of the nonporous silica particles in the aqueous coating solution is preferably 5% by mass to 99% by mass and more preferably 10% by mass to 98% by mass with respect to the total solid content of the aqueous coating solution.
  • the content is preferably 15% by mass to 97% by mass.
  • the aqueous coating solution contains water.
  • the aqueous coating solution may further contain a hydrophilic organic solvent having excellent affinity with water.
  • the hydrophilic organic solvent is a low-boiling organic solvent, the ratio of the low-boiling organic solvent in the aqueous medium increases, and therefore there are advantages such as easy drying of the aqueous coating solution.
  • the hydrophilic organic solvent is not particularly limited, and examples thereof include methanol, ethanol, isopropanol, butanol, acetone, ethylene glycol, and ethyl cellosolve. Alcohol is preferable from the viewpoint of availability and reduction of environmental burden, and ethanol and isopropanol are more preferable.
  • the aqueous coating solution contains a hydrophilic organic solvent in addition to water as an aqueous medium
  • the content of water used in the aqueous coating solution is preferably 30% by mass or more based on the total mass of the aqueous medium. More preferably, it is at least mass%.
  • the solid content with respect to the total mass of the aqueous coating solution is preferably in the range of 0.1% by mass to 30% by mass, more preferably in the range of 0.2% by mass to 20% by mass, and 0.5% by mass. More preferably, it is in the range of 10% by mass to 10% by mass.
  • the solid content of the aqueous coating solution can be adjusted by adjusting the content of the aqueous medium, particularly water.
  • the aqueous coating solution contains at least one surfactant.
  • the coating property of the aqueous coating solution is improved, and the surface tension of the aqueous coating solution is lowered. Therefore, the uniform coating property and coating surface property of the formed film are excellent.
  • the surfactant examples include nonionic surfactants, and anionic surfactants that are ionic surfactants, cationic surfactants, and amphoteric surfactants, all of which are preferably used. Can do. If the ionic surfactant is used excessively, it is difficult to adjust the pH of the aqueous coating solution to a predetermined range. Therefore, as the surfactant, it is preferable to use a nonionic surfactant because it has a high degree of freedom in the content of the surfactant.
  • nonionic surfactant examples include polyalkylene glycol monoalkyl ether, polyalkylene glycol monoalkyl ester, polyalkylene glycol monoalkyl ester / monoalkyl ether, and the like.
  • specific examples of the nonionic surfactant include polyethylene glycol monolauryl ether, polyethylene glycol monostearyl ether, polyethylene glycol monocetyl ether, polyethylene glycol monolauryl ester, and polyethylene glycol monostearyl ester.
  • the nonionic surfactant is not particularly limited, and a commercially available one may be used, and examples thereof include TRITON BG10 manufactured by Dow Chemical Company.
  • the aqueous coating liquid contains an ionic surfactant to improve hydrophilicity. If the aqueous coating solution contains an ionic surfactant in excess, the silica particles are likely to aggregate, so that there are generally few examples in which the ionic surfactant and the silica particles are used in combination. However, when an ionic surfactant is added to the aqueous coating solution, the antifouling property of the coating film formed by the aqueous coating solution is increased by using it in a content that is less than the amount that causes aggregation of the silica particles. Can do.
  • ionic surfactants examples include anionic surfactants such as alkyl sulfates, alkyl benzene sulfonates, and alkyl phosphates, cationic surfactants such as alkyl trimethyl ammonium salts, and dialkyl dimethyl ammonium salts, And amphoteric surfactants such as alkylcarboxybetaines.
  • the content of the surfactant in the aqueous coating solution is preferably 0.01% by mass or more, more preferably 0.02% by mass or more, based on the total mass of the aqueous coating solution, from the viewpoint of antifouling properties of the coating film. 0.03 mass% or more is more preferable.
  • the upper limit of the content of the surfactant is not particularly limited, but depending on the type of surfactant, there is a concern that it may segregate on the surface after application of the aqueous coating liquid and the strength of the coating film may be reduced. is there. Therefore, the content of the surfactant is preferably 10% by mass or less, more preferably 8% by mass or less, and further preferably 5% by mass or less with respect to the total mass of the aqueous coating liquid. In addition, when an ionic surfactant is used as the surfactant, it is possible to enhance the antifouling property and suppress the aggregation of nonporous silica particles due to the influence of the surfactant.
  • the content is preferably 5.0% by mass or less, more preferably 3.0% by mass or less, and further preferably 1.0% by mass or less, based on the total mass of the aqueous coating solution.
  • the pH of the aqueous coating solution is 1.5 to 3.5.
  • the pH of the aqueous coating solution is less than 1.5, the antireflection property is poor, and when the pH exceeds 3.5, the antireflection property is inferior.
  • the reason is presumed as follows. That is, when the pH of the aqueous coating solution is in the above range, the non-porous silica particles are soft in the liquid because the average primary particle diameter is close to the isoelectric point (pH 2.0) of the non-porous silica particles having a diameter of 8 nm or less.
  • the non-porous silica particles are densely arranged to form a film having voids between the particles while being agglomerated and softly agglomerated, applied onto the substrate and dried.
  • the film is considered to have excellent antireflection properties, scratch resistance, and antifouling properties.
  • the pH of the aqueous coating solution is preferably 1.8 to 3.0 from the above viewpoint.
  • the isoelectric point of the nonporous silica particles shows a slight up and down depending on the production method, primary particle diameter, and surface state. In that case, the pH of the aqueous coating solution is adjusted according to the pH of the isoelectric point. May be.
  • the pH of the aqueous coating solution is a value measured at 25 ° C. using a pH meter (manufactured by Toa DKK Co., Ltd., HM-31P).
  • Base material There is no restriction
  • all various base materials such as glass, resin, a metal, ceramics, can be used suitably.
  • glass is used as the base material, condensation of hydroxyl groups on the silicon of nonporous silica particles occurs even with the hydroxyl groups on the glass surface, thereby forming a coating film with excellent adhesion to the base material. Is done.
  • the method for applying the aqueous coating solution to the substrate is not particularly limited, and any known coating method such as spray coating, brush coating, roller coating, bar coating, dip coating, etc. can be applied.
  • membrane includes the process of drying the coating film formed by application
  • the coating film may be dried at room temperature (25 ° C.) or using a heating device.
  • the heating device can be used without particular limitation as long as it can be heated to a target temperature, and examples thereof include an oven, an electric furnace, or a firing device uniquely produced in accordance with a production line.
  • the coating film may be dried by heating the coating film to 40 ° C. to 400 ° C. using these heating devices. When heating is performed, the heating time can be set to about 1 to 30 minutes.
  • the drying conditions in the step of drying the coating film are preferably 40 ° C. to 200 ° C. for 1 minute to 10 minutes, more preferably 100 ° C. to 180 ° C. for 1 minute to 5 minutes.
  • the coating film after drying preferably has a film thickness of 50 nm or more.
  • the film thickness is 50 nm or more, the coating film after drying is excellent in antireflection properties.
  • the film thickness is preferably from 50 nm to 350 nm, more preferably from 100 nm to 300 nm, and even more preferably from 100 nm to 250 nm.
  • membrane includes the process of baking the coating film after drying further at the temperature of 400 to 800 degreeC after the process of drying a coating film.
  • each nonporous silica particle is a single particle (aggregated state by van der Waals force, etc.)
  • the coating film after firing at least a part of the plurality of nonporous silica particles is present as a particle connected body in which the nonporous silica particles are connected to each other.
  • the average primary particle diameter of the particles connected by firing is the diameter when only one of the connected particles is assumed to be a sphere without considering the connecting portion (for example, the neck portion).
  • grains connected by baking can be calculated by the method similar to the average primary particle diameter of non-porous silica particle as stated above.
  • a plurality of non-porous silica particles are connected to form a particle connected body by baking.
  • the bonding force between the nonporous silica particles is improved, the scratch resistance of the film is further improved.
  • the same effect cannot be obtained in the case of using an aqueous coating solution using silica particles previously linked in a “beaded” manner.
  • the firing temperature is more preferably 450 ° C. or higher and 800 ° C. or lower, further preferably 500 ° C. or higher and 800 ° C. or lower, and particularly preferably 600 ° C. or higher and 800 ° C. or lower.
  • the firing time is preferably 1 minute to 10 minutes, more preferably 1 minute to 5 minutes.
  • Firing in the firing step can be performed using a heating device.
  • the heating device can be used without any particular limitation as long as it can be heated to a target temperature, and examples thereof include an electric furnace or a firing device uniquely produced in accordance with a production line.
  • the coating film after baking preferably has a film thickness of 50 nm or more.
  • the film thickness is 50 nm or more, the coating film after baking has excellent antireflection properties.
  • the film thickness is preferably from 50 nm to 350 nm, more preferably from 100 nm to 300 nm, and even more preferably from 100 nm to 250 nm.
  • the film produced by the production method of one embodiment of the present invention is excellent in antireflection properties, scratch resistance, and antifouling properties.
  • the preferred physical properties of the film of the present invention are shown below.
  • the antireflection property of at least the coating film after drying in one embodiment of the present invention is the absolute value of the average reflectance change ⁇ R at 5 ° incidence with light having a wavelength of 400 nm to 1100 nm defined by the following formula (1).
  • the performance can be expressed.
  • “at least the coating film after drying” may be a coating film that has undergone the above-described drying process, and includes a coating film that has undergone the above-described baking process after the drying process.
  • R 1 represents the average reflectance of the substrate after film formation
  • R 2 represents the average reflectance of the substrate.
  • the average reflectance change ⁇ R in the formula (1) is the average reflectance (R 2 ) of the base material on which the coating film is not formed and the average reflectance (R 1 ) of the base material having the coating film formed with the aqueous coating liquid. Can be obtained by measuring with a barium sulfate white plate as a reference.
  • the reflectance can be measured by using a spectrophotometer with an integrating sphere. Specifically, it can be measured by, for example, an ultraviolet-visible infrared spectrophotometer (manufactured by JASCO Corporation, V-670). In one embodiment of the present invention, light having a wavelength of 400 nm to 1100 nm is used, and a value obtained by arithmetically averaging reflectance values at respective wavelengths measured using V-670 is adopted as the average reflectance. The higher the absolute value of the average reflectance change ⁇ R of the film, the better the antireflection property.
  • the absolute value of the average reflectance change ⁇ R of the coating film is preferably 2.0% or more, and more preferably 2.5% or more from the viewpoint of antireflection properties.
  • the surface roughness Ra of the film of one embodiment of the present invention can be measured according to JIS B0601: 2001 using an atomic force microscope (AFM) (SPA-400 manufactured by Seiko Instruments Inc.) (measurement). Range: 3 ⁇ m square).
  • the surface roughness Ra of the film of one embodiment of the present invention is preferably 20 nm or less, and more preferably 10 nm or less.
  • the water contact angle of at least the coating film after drying is preferably 40 ° or less, more preferably 30 ° or less, further preferably 25 ° or less, and 15 °.
  • the following are particularly preferred:
  • the water contact angle can be obtained as an average value obtained by measuring the contact angle with respect to pure water five times using a Drop Master 300 manufactured by Kyowa Interface Chemical Co., Ltd.
  • the aqueous coating solution contains water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant, and has a pH of 1.5 to 3.5.
  • the aqueous coating solution is synonymous with the aqueous coating solution in the production method described above.
  • the aqueous coating solution preferably has an average primary particle diameter of nonporous silica particles of 6 nm and a pH of 1.8 to 3.0.
  • the surfactant is preferably a nonionic surfactant from the viewpoint of adjusting pH.
  • the film of one embodiment of the present invention contains one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and has a film thickness of 50 nm or more and 350 nm or less.
  • the nonporous silica particles in the membrane of one embodiment of the present invention are synonymous with the nonporous silica particles in the production method of the one embodiment of the present invention described above.
  • the film of one embodiment of the present invention is excellent in antireflection properties, scratch resistance, and antifouling properties.
  • the film of one embodiment of the present invention has poor antireflection properties when the average primary particle diameter of the nonporous silica particles exceeds 8 nm.
  • the film thickness is preferably 100 nm to 300 nm, and more preferably 100 nm to 250 nm.
  • the non-porous silica particles in the film of one embodiment of the present invention preferably have an average primary particle diameter of 6 nm or less from the viewpoint of antireflection properties.
  • the average primary particle diameter is more preferably 2 nm to 4 nm.
  • the absolute value of the average reflectance change ⁇ R at 5 ° incidence in the light having a wavelength of 400 nm to 1100 nm defined by the following formula (1) is 2.0% or more. Is more preferable, and 2.5% or more is more preferable.
  • R 1 represents the average reflectance of the substrate after film formation
  • R 2 represents the average reflectance of the substrate.
  • the film of one embodiment of the present invention may be either of the following two aspects, and the first aspect is preferable in terms of scratch resistance of the film.
  • membrane is an aspect contained as the state of the particle
  • the scratch resistance of the film is further improved while maintaining good antireflection properties.
  • the above-described film further contains a surfactant. That is, the coating film is formed using the aqueous coating liquid of the present invention containing a surfactant, the coating film is dried, and the film is manufactured without the above-described baking process.
  • a laminated body has the film
  • the laminate having the film of one embodiment of the present invention formed on a glass substrate is excellent in antireflection, scratch resistance, and antifouling properties, for example, a solar cell module, a surveillance camera, and a lighting device, It can be suitably used for applications such as a protective film for a label.
  • a solar cell module is provided with the laminated body which has the film
  • the solar cell module is represented by a laminate and a polyester film of one embodiment of the present invention, which is excellent in antireflection properties, and is provided on the side where sunlight enters a solar cell element that converts sunlight light energy into electrical energy.
  • the solar cell backsheet is disposed and configured.
  • the laminate and the polyester film can be configured by being sealed with a sealing material typified by a resin such as an ethylene-vinyl acetate copolymer.
  • a laminated body and a back sheet such as a solar battery module and a solar battery cell
  • a solar battery module and a solar battery cell for example, it describes in detail in "Solar power generation system constituent material" (Eiichi Sugimoto supervision, Kogyo Kenkyukai, 2008 issue). Has been.
  • the solar cell module of this invention it is preferable to provide the laminated body of this invention in the sunlight incident side, and any structure may be taken.
  • Examples of the substrate provided on the side on which sunlight is incident include a glass substrate, a transparent resin such as an acrylic resin, and the like.
  • a glass substrate is used.
  • a laminate having a film having excellent scratch resistance and antifouling properties in addition to antireflection properties is used on the surface.
  • the solar cell element used in the solar cell module is not particularly limited, and silicon-based materials such as single crystal silicon, polycrystalline silicon, and amorphous silicon, copper-indium-gallium-selenium, copper-indium-selenium, cadmium-tellurium Any of various known solar cell elements such as III-V and II-VI compound semiconductor systems such as gallium-arsenic can be applied.
  • the solar cell module includes a laminate having a film with good antireflection, scratch resistance, and antifouling properties on a glass substrate, even if it is used for a long period of time, scratches on the surface film occur, A decrease in light transmittance due to the adhering contaminants is suppressed, and the adhering contaminants are easily removed with water such as rain, so that good power generation efficiency is maintained over a long period of time.
  • one embodiment of the present invention will be specifically described by way of examples. However, one embodiment of the present invention is not limited to the following examples unless it exceeds the gist thereof.
  • NALCO registered trademark
  • the average primary particle size is determined by observing the particles with a transmission electron microscope, obtaining the projected area of 300 particles from the obtained photographic image, and obtaining the diameter of a circle having an area equal to the projected area (equivalent to a circle). The diameter was determined, and the value obtained by arithmetically averaging the equivalent circle diameter values was defined as the average primary particle diameter.
  • aqueous coating solution 1 To the silica dispersion 1A, add 23.5 g of deionized water, 1.06 g of ethanol, and 0.56 g of a 10 mass% aqueous solution of TRITON BG10 (manufactured by Dow Chemical Co., Ltd., nonionic surfactant), and add phosphoric acid. The pH of the solution was adjusted to 2.4 using it, and aqueous coating liquid 1 (solid content 2.76 mass%) was prepared. The pH is a value measured at 25 ° C. using a pH meter (manufactured by Toa DKK Co., Ltd., HM-31P).
  • aqueous coating solution 1 was coated on a glass substrate using a bar coater to form a coating film. This coating film was dried in an oven at 150 ° C. for 1 minute. Then, it baked on 750 degreeC and the conditions for 3 minutes with the electric furnace, and produced the film
  • the final film thickness of the coating film on the glass substrate was set to 190 nm. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 10 nm or less.
  • Example 2 Preparation of silica dispersion 1B
  • aqueous coating solution 2 was prepared in the same manner as in Example 1, except that the silica dispersion 1A used in Example 1 was changed to the silica dispersion 1B and the pH was adjusted to 2.1 with phosphoric acid.
  • a film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 2. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.
  • Example 1 [Preparation of silica dispersion 1C]
  • a silica dispersion 1C was prepared in the same manner as Example 1 except for the change.
  • aqueous coating solution 3 was prepared in the same manner as in Example 1 except that the silica dispersion 1A used in Example 1 was changed to the silica dispersion 1C and the pH was adjusted to 2.3 with phosphoric acid.
  • a film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 3.
  • Example 2 [Preparation of silica dispersion 1D and aqueous coating solution 4] Except for adjusting the silica dispersion 1A in Example 1 except that the pH was adjusted to 1.3, a silica dispersion 1D was prepared in the same manner as in Example 1, and the silica dispersion 1A was changed to the silica dispersion 1D. Prepared an aqueous coating solution 4 in the same manner as in Example 1.
  • a film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 4.
  • Example 3 [Preparation of silica dispersion 1E and aqueous coating solution 5]
  • the silica dispersion 1E was prepared in the same manner as in Example 1 except that the pH was adjusted to 3.9, and the silica dispersion 1A was changed to the silica dispersion 1E.
  • An aqueous coating solution 5 was prepared except that the procedure was the same as in Example 1.
  • a film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 5.
  • Example 3 [Production of membrane sample] A film sample was produced in the same manner as in Example 1 except that the firing conditions in Example 1 were changed to 600 ° C. for 3 minutes. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.
  • Example 4 [Production of membrane sample] A film sample was produced in the same manner as in Example 1 except that the firing conditions in Example 1 were changed to 500 ° C. for 3 minutes. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.
  • Example 5 [Production of membrane sample] A film sample was produced in the same manner as in Example 1 except that the firing conditions in Example 1 were changed to 450 ° C. for 3 minutes. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.
  • Example 6 [Production of membrane sample] A film sample was produced in the same manner as in Example 1 except that the firing conditions in Example 1 were changed to 350 ° C. for 3 minutes. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.
  • aqueous coating solution 6 was prepared in the same manner as in Example 1 except that the TRITON BG10 used in the aqueous coating solution 1 of Example 1 was not added and the pH was adjusted to 2.3.
  • a membrane sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 6.
  • the final film thickness of the film sample was 190 nm.
  • aqueous coating solution 7 To silica dispersion 2A, 12 g of deionized water, 0.26 g of ethanol, and 0.56 g of a 10 mass% aqueous solution of TRITON BG10 were added to prepare aqueous coating liquid 7 (solid content 2.82 mass%). The pH of the aqueous coating solution 7 was 2.6.
  • a film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 7.
  • the final film thickness of the film sample was set to 170 nm.
  • Aqueous coating solution 8 (solid content 2.90% by mass) was prepared by adding 12 g of deionized water and 0.56 g of a 10% by mass aqueous solution of TRITON BG10 to silica dispersion 2B. The pH of the aqueous coating solution 8 was 8.8.
  • a film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 8.
  • the final film thickness of the film sample was 180 nm.
  • aqueous coating solution 9 To silica dispersion 2C, 15.1 g of deionized water and 0.56 g of a 10 mass% aqueous solution of TRITON BG10 were added to prepare an aqueous coating liquid 9 (solid content: 2.78 mass%). The pH of the aqueous coating solution 9 was 9.3.
  • a film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 9. The final film thickness of the film sample was 195 nm.
  • silica dispersion 3A (dispersion containing one kind of silica, only beaded silica)] SNWTEX (registered trademark) -OXS (manufactured by Nissan Chemical Industries, Ltd., solid content 10 mass%, beaded (chain) silica particles) was used as the silica dispersion 3A.
  • aqueous coating solution 10 17.8 g of deionized water, 5.15 g of ethanol, 0.60 g of 1% ethanol solution of aluminum bis (ethylacetoacetate) mono (acetylacetonate), polyethylene glycol monolauryl ether (the number of repetitions of ethylene oxide part 15) 0.94 g of 0.5% by weight aqueous solution, 0.43 g of 0.2% by weight aqueous sodium di (2-ethylhexyl) sulfosuccinate, and SNOWTEX (registered trademark) -OXS (manufactured by Nissan Chemical Industries, Ltd., solid content)
  • Aqueous coating solution 10 (solid content 1.68% by mass) was prepared by adding 5.04 g of 10% by mass, beaded (chain) silica particles) and stirring.
  • a film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 10.
  • the final film thickness of the film sample was set to 200 nm.
  • the average reflectance is calculated from the reflectance of each wavelength at wavelengths of 400 to 1100 nm obtained by measurement, and the absolute value (
  • is superior in antireflection (AR) property as the numerical value is higher.
  • R 1 represents the average reflectance of the substrate after film formation
  • R 2 represents the average reflectance of the substrate.
  • a natural ocher pigment (manufactured by Holbein Co., Ltd.) was uniformly dispersed on the membrane of the membrane sample and adhered, and then the back surface of the membrane sample was struck to remove the attached natural ocher pigment. This operation was repeated 20 times. Thereafter, the adhesion state of the natural ocher pigment was visually confirmed, and the antifouling property was evaluated according to the following evaluation criteria.
  • the antifouling property is in an allowable range from A to C.
  • the film samples of the examples are excellent in antireflection properties, scratch resistance, antifouling properties, and surface properties.
  • Example 7 [Membrane sample preparation]
  • the aqueous coating solution 1 in Example 1 was coated on a glass substrate using a bar coater to form a coating film. This coating film was dried in an oven at 150 ° C. for 1 minute to obtain a film sample without firing.
  • the final film thickness of the film sample was 190 nm.
  • the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.
  • Comparative Example 9 The aqueous coating solution 10 in Comparative Example 8 was coated on a glass substrate using a bar coater to form a coating film. This coating film was dried in an oven at 150 ° C. for 1 minute to obtain a film sample without firing. The final film thickness of the film sample was 175 nm.
  • Example 7 and Comparative Example 9 as in Example 1, evaluation of antireflection property, antifouling property, and surface condition was performed. The evaluation results are shown in Table 2 below.
  • the scratch resistance was evaluated by the following scratch resistance 2 method.
  • Example 7 From Table 2, it can be seen that a film sample having good antireflection properties was obtained in Example 7, and that the film sample of Example 7 was excellent in scratch resistance in comparison with Comparative Example 9.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
  • Photovoltaic Devices (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

 Provided are a film manufacturing method and applications thereof. The film manufacturing method includes: a step in which a coating film is formed by applying, on a base material, an aqueous coating liquid having a pH of 1.5 to 3.5, said liquid containing water, one type of non-porous silica particles having an average primary particle size of not more than 8 nm, and a surfactant; and a step in which the coating film thereby formed is dried.

Description

水性塗布液、膜及びその製造方法、積層体、並びに太陽電池モジュールAqueous coating solution, film and manufacturing method thereof, laminate, and solar cell module

 本発明は、水性塗布液、膜及びその製造方法、積層体、並びに太陽電池モジュールに関する。 The present invention relates to an aqueous coating solution, a film and a manufacturing method thereof, a laminate, and a solar cell module.

 シリカ微粒子を含有する水性塗布液は、水を含む溶媒を用いており、形成された膜の表面エネルギーが低く、透明性に優れることから、種々の用途に使用されている。
 その用途としては、反射防止膜、光学レンズ、光学フィルタ、各種ディスプレイの薄層フィルムトランジスタ(TFT)用平坦化膜、結露防止膜、防汚膜、及び表面保護膜等に好適に用いられる。
The aqueous coating solution containing silica fine particles uses a solvent containing water, and is used for various applications because the formed film has low surface energy and excellent transparency.
As its application, it is suitably used for antireflection films, optical lenses, optical filters, flat films for thin film transistors (TFT) of various displays, anti-condensation films, antifouling films, surface protective films, and the like.

 中でも反射防止膜は、例えば、太陽電池モジュール、監視カメラ、照明機器、標識の保護膜に使用することができるため有用である。反射防止膜の用途において種々のコーティング組成物及びコーティング方法が開発されている。
 例えば、特表2013-527879号公報には、基材に反射防止性及び耐久性のうちの少なくとも1つの特性を付与するコーティング方法として、非球状ナノ粒子、球状ナノ粒子、任意に界面活性剤、及び水を含み、非球状ナノ粒子又は球状ナノ粒子の少なくとも一部が表面に官能基を有するコーティング組成物を基材に適用する工程、並びにコーティング組成物を乾燥させて基材上に親水性コーティングを形成する工程、を含む基材表面の改質方法が開示されている。
Among them, the antireflection film is useful because it can be used for, for example, a solar cell module, a surveillance camera, a lighting device, and a protective film for a sign. Various coating compositions and coating methods have been developed for anti-reflective coating applications.
For example, JP 2013-527879 A discloses a coating method for imparting at least one of antireflection properties and durability to a substrate as non-spherical nanoparticles, spherical nanoparticles, optionally a surfactant, And a step of applying to the substrate a coating composition containing non-spherical nanoparticles or at least a part of the spherical nanoparticles having functional groups on the surface, and drying the coating composition to form a hydrophilic coating on the substrate A method for modifying the surface of a substrate including the step of forming a substrate is disclosed.

 また、特許第5266549号公報には、反射防止コーティング等の光学コーティングに使用可能なコーティング組成物として、カチオン性ポリマーを含むコア材料と金属酸化物を含むシェル材料とを含み、平均特定サイズが10nm以上200nm以下であるナノ粒子を含む組成物が開示されている。 Japanese Patent No. 5266549 includes a core material containing a cationic polymer and a shell material containing a metal oxide as a coating composition that can be used for optical coating such as an antireflection coating, and an average specific size of 10 nm. Compositions containing nanoparticles that are 200 nm or less are disclosed.

 また、特開2009-54352号公報には、低反射膜形成用塗料として、空気層を有するシリカ微粒子および/または多孔質シリカ微粒子からなる金属酸化物と、樹脂と、を含有してなる塗料が開示されている。 Japanese Patent Application Laid-Open No. 2009-54352 discloses a paint containing a silica fine particle having an air layer and / or a metal oxide composed of porous silica fine particles and a resin as a low reflective film forming paint. It is disclosed.

 しかしながら、特表2013-527879号公報に記載の方法で改質された基材表面は、反射防止性は優れるものの、十分な耐傷性は得られていなかった。
 また、特許第5266549号公報及び特開2009-54352号公報に記載の組成物又は塗料により得られる層も、反射防止性には優れるものの、耐傷性は十分ではなかった。
 すなわち、反射防止性、及び耐傷性に優れる膜は、提供されるに至っていないのが実情である。
However, the surface of the base material modified by the method described in JP-T-2013-527879 has excellent antireflection properties, but does not have sufficient scratch resistance.
In addition, the layers obtained from the compositions or paints described in Japanese Patent No. 5266549 and Japanese Patent Application Laid-Open No. 2009-54352 are also excellent in antireflection properties but are not sufficiently scratch resistant.
That is, the actual situation is that a film having excellent antireflection properties and scratch resistance has not been provided.

 本発明の一実施形態は、上記のような事情に鑑みなされたものであり、反射防止性、及び耐傷性に優れた膜が形成される水性塗布液、並びに反射防止性、及び耐傷性に優れた膜及びその製造方法、積層体、並びに太陽電池モジュールを提供することを目的とし、この目的を達成することを課題とする。 One embodiment of the present invention has been made in view of the above circumstances, and is excellent in an aqueous coating liquid in which a film excellent in antireflection and scratch resistance is formed, and in antireflection and scratch resistance. Another object of the present invention is to provide a film, a manufacturing method thereof, a laminate, and a solar cell module, and to achieve this object.

 課題を達成するための具体的な手段には、以下の態様が含まれる。
<1> 基材上に、水と、シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子と、界面活性剤と、を含み、pHが1.5~3.5である水性塗布液を塗布して塗布膜を形成する工程と、塗布形成された塗布膜を乾燥する工程と、を含む膜の製造方法。
Specific means for achieving the object includes the following aspects.
<1> On a substrate, containing water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant, and having a pH of 1.5 to 3.5 A method for producing a film, comprising: a step of applying a certain aqueous coating solution to form a coating film; and a step of drying the coating film formed by coating.

<2> 無孔質シリカ粒子の平均一次粒子径が6nm以下である<1>に記載の膜の製造方法。
<3> 水性塗布液のpHが1.8~3.0である<1>又は<2>に記載の膜の製造方法。
<4> 塗布膜を乾燥する工程の後、さらに、乾燥後の塗布膜を400℃以上800℃以下の温度で焼成する工程を含む<1>~<3>のいずれか1つに記載の膜の製造方法。
<5> 焼成する工程は、500℃以上800℃以下の温度で焼成を行う<4>に記載の膜の製造方法。
<6> 焼成する工程は、焼成により、複数の無孔質シリカ粒子が連結された粒子連結体を形成する<4>又は<5>に記載の膜の製造方法。
<7> 焼成後の塗布膜は、膜厚が50nm以上350nm以下である<4>~<6>のいずれか1つに記載の膜の製造方法。
<8> 少なくとも乾燥後の塗布膜は、下記式(1)で定義される、波長400nm~1100nmの光における5°入射時の平均反射率変化ΔRの絶対値が、2.0%以上である<1>~<7>のいずれか1つに記載の膜の製造方法。
<2> The method for producing a film according to <1>, wherein the non-porous silica particles have an average primary particle diameter of 6 nm or less.
<3> The method for producing a film according to <1> or <2>, wherein the pH of the aqueous coating solution is 1.8 to 3.0.
<4> The film according to any one of <1> to <3>, further including a step of baking the dried coated film at a temperature of 400 ° C. or higher and 800 ° C. or lower after the step of drying the coated film. Manufacturing method.
<5> The method for producing a film according to <4>, wherein the baking is performed at a temperature of 500 ° C. or higher and 800 ° C. or lower.
<6> The method for producing a film according to <4> or <5>, wherein the step of baking forms a particle connected body in which a plurality of nonporous silica particles are connected by baking.
<7> The method for producing a film according to any one of <4> to <6>, wherein the coating film after baking has a thickness of 50 nm to 350 nm.
<8> At least the coating film after drying has an absolute value of the average reflectance change ΔR defined by the following formula (1) at 5 ° incidence with light having a wavelength of 400 nm to 1100 nm of 2.0% or more. <1> to <7> The method for producing a film according to any one of <7>.

|平均反射率変化ΔR|=|R - R| 式(1)
 式(1)中、Rは膜形成後の基材の平均反射率を表し、Rは基材の平均反射率を表す。
| Average reflectance change ΔR | = | R 1 −R 2 | Formula (1)
In formula (1), R 1 represents the average reflectance of the substrate after film formation, and R 2 represents the average reflectance of the substrate.

<9> 平均反射率変化ΔRの絶対値が、2.5%以上である<8>に記載の膜の製造方法。 <9> The method for producing a film according to <8>, wherein the absolute value of the average reflectance change ΔR is 2.5% or more.

<10> 水と、シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子と、界面活性剤と、を含み、pHが1.5~3.5である水性塗布液。
<11> 無孔質シリカ粒子の平均一次粒子径が6nm以下である<10>に記載の水性塗布液。
<12> 水性塗布液のpHが1.8~3.0である<10>又は<11>に記載の水性塗布液。
<13> 界面活性剤が、非イオン性界面活性剤である<10>~<12>のいずれか1つに記載の水性塗布液。
<10> An aqueous coating solution having a pH of 1.5 to 3.5, comprising water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant.
<11> The aqueous coating solution according to <10>, wherein the average primary particle diameter of the nonporous silica particles is 6 nm or less.
<12> The aqueous coating solution according to <10> or <11>, wherein the pH of the aqueous coating solution is 1.8 to 3.0.
<13> The aqueous coating solution according to any one of <10> to <12>, wherein the surfactant is a nonionic surfactant.

<14> シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子を含有し、膜厚が50nm以上350nm以下である膜。
<15> 無孔質シリカ粒子の平均一次粒子径が6nm以下である<14>に記載の膜。
<16> 下記式(1)で定義される、波長400nm~1100nmの光における5°入射時の平均反射率変化ΔRの絶対値が、2.0%以上である<14>又は<15>に記載の膜。
<14> A film containing one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles and a film thickness of 50 nm to 350 nm.
<15> The membrane according to <14>, wherein the non-porous silica particles have an average primary particle size of 6 nm or less.
<16> According to <14> or <15>, the absolute value of the average reflectance change ΔR at the time of 5 ° incidence in light having a wavelength of 400 nm to 1100 nm defined by the following formula (1) is 2.0% or more. The membrane described.

|平均反射率変化ΔR|=|R - R| 式(1)
 式(1)中、Rは膜形成後の基材の平均反射率を表し、Rは基材の平均反射率を表す。
| Average reflectance change ΔR | = | R 1 −R 2 | Formula (1)
In formula (1), R 1 represents the average reflectance of the substrate after film formation, and R 2 represents the average reflectance of the substrate.

<17> 平均反射率変化ΔRの絶対値が2.5%以上である<16>に記載の膜。 <17> The film according to <16>, wherein the absolute value of the average reflectance change ΔR is 2.5% or more.

<18> 無孔質シリカ粒子は、複数の無孔質シリカ粒子が連結した粒子連結体の状態として含有する<14>~<17>のいずれか1つに記載の膜。
<19> さらに、界面活性剤を含有する<14>~<17>のいずれか1つに記載の膜。
<20> 表面粗さRaが20nm以下である<14>~<19>のいずれか1つに記載の膜。
<18> The membrane according to any one of <14> to <17>, wherein the nonporous silica particles are contained as a particle connected body in which a plurality of nonporous silica particles are connected.
<19> The film according to any one of <14> to <17>, further containing a surfactant.
<20> The film according to any one of <14> to <19>, wherein the surface roughness Ra is 20 nm or less.

<21> 基材上に、<1>~<9>のいずれか1つに記載の製造方法により製造された膜、又は<14>~<20>のいずれか1つに記載の膜を有する積層体。
<22> 基材が、ガラス基材である<21>に記載の積層体。
<21> On a base material, the film produced by the production method according to any one of <1> to <9> or the film according to any one of <14> to <20> Laminated body.
<22> The laminate according to <21>, wherein the substrate is a glass substrate.

<23> <21>又は<22>に記載の積層体を備えた太陽電池モジュール。 <23> A solar cell module including the laminate according to <21> or <22>.

 本発明の一実施形態によれば、反射防止性、及び耐傷性に優れた膜が形成される水性塗布液、並びに反射防止性、及び耐傷性に優れた膜及びその製造方法、積層体、並びに太陽電池モジュールが提供される。 According to one embodiment of the present invention, an aqueous coating solution for forming a film excellent in antireflection and scratch resistance, a film excellent in antireflection and scratch resistance, a method for producing the same, a laminate, and A solar cell module is provided.

<膜の製造方法>
 膜の製造方法は、基材上に、水と、シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子と、界面活性剤と、を含み、pHが1.5~3.5である水性塗布液を塗布して塗布膜を形成する工程と、塗布形成された塗布膜を乾燥する工程と、を含む。
 膜の製造方法は、塗布膜を乾燥する工程の後、さらに、乾燥後の塗布膜を400℃以上800℃以下の温度で焼成する工程を含むことが好ましい。
<Method for producing membrane>
The method for producing a membrane comprises, on a substrate, water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant, and has a pH of 1.5 to 3 And a step of forming a coating film by applying an aqueous coating solution of .5, and a step of drying the coating film formed by coating.
It is preferable that the manufacturing method of a film | membrane includes the process of baking the coating film after drying further at the temperature of 400 to 800 degreeC after the process of drying a coating film.

 本発明の一実施形態の作用は明確ではないが、以下のように推定される。
 本発明の一実施形態の膜の製造方法は、水性塗布液中に、シリカ粒子として平均一次粒子径が8nm以下の無孔質シリカ粒子を1種類含み、水性塗布液のpHを制御し、無孔質シリカ粒子表面のゼータ電位値がゼロあるいはゼロ近傍となるようにする(水性塗布液のpHをシリカ粒子の等電点であるpH2.0に近い値とする)ことで、無孔質シリカ粒子が軟凝集状態を形成するため膜を形成した際に高い空隙量を実現でき、数珠状(鎖状)シリカ粒子を用いなくとも、反射防止性に優れる膜が形成されると考えられる。
 そして、無孔質シリカ粒子の平均一次粒子径が8nm以下であるため、形成される膜は緻密であり、膜の耐傷性に優れると考えられる。
 これらが相俟って、鎖状に連結したシリカ、多孔質シリカ又は中空シリカなどを含む水性コート剤では達成することができなかった、反射防止性、及び耐傷性に優れる膜が形成されると考えられる。
 さらに、無孔質シリカ粒子の平均一次粒子径が8nm以下であるため、形成される膜の表面は平滑であり、膜への汚れの付着が抑制される。そのため、本発明の一実施形態の製造方法で製造される膜は、上記の反射防止性、及び耐傷性に加え、防汚性にも優れる。
Although the effect | action of one Embodiment of this invention is not clear, it estimates as follows.
The film production method of one embodiment of the present invention includes one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles in an aqueous coating liquid, and controls the pH of the aqueous coating liquid. By making the zeta potential value on the surface of the porous silica particles zero or close to zero (the pH of the aqueous coating solution is set to a value close to pH 2.0, which is the isoelectric point of the silica particles), the nonporous silica Since the particles form a soft agglomerated state, a high void amount can be realized when the film is formed, and it is considered that a film having excellent antireflection properties can be formed without using beaded (chain) silica particles.
And since the average primary particle diameter of a nonporous silica particle is 8 nm or less, it is thought that the film | membrane formed is dense and it is excellent in the flaw resistance of a film | membrane.
When these are combined, a film excellent in antireflection and scratch resistance that cannot be achieved with an aqueous coating agent containing silica linked in a chain, porous silica, hollow silica, or the like is formed. Conceivable.
Furthermore, since the average primary particle diameter of the nonporous silica particles is 8 nm or less, the surface of the formed film is smooth and the adhesion of dirt to the film is suppressed. Therefore, the film produced by the production method of one embodiment of the present invention is excellent in antifouling properties in addition to the above antireflection properties and scratch resistance.

 以下、本発明の一実施形態の膜の製造方法における各工程について詳細に説明する。 Hereafter, each process in the manufacturing method of the film | membrane of one Embodiment of this invention is demonstrated in detail.

[塗布膜を形成する工程]
 膜の製造方法は、基材上に、水と、シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子と、界面活性剤と、を含み、pHが1.5~3.5である水性塗布液を塗布して塗布膜を形成する工程を含む。
[Process for forming coating film]
The method for producing a membrane comprises, on a substrate, water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant, and has a pH of 1.5 to 3 And a step of applying a water-based coating solution of .5 to form a coating film.

(水性塗布液)
 水性塗布液は、水と、シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子と、界面活性剤と、を含み、pHが1.5~3.5である。
 水性塗布液は、シリカ粒子として平均一次粒子径が8nm以下の無孔質シリカ粒子が1種類のみ含まれることが反射防止性の点で特に重要である。つまり、従来、数珠状(鎖状)のシリカ粒子又は多孔質シリカ粒子を用いていた膜を、これらのシリカ粒子を用いることなく、特定の平均一次粒子径の無孔質シリカ粒子を用いることにより形成することで、むしろ数珠状のシリカ粒子では満足し得ない耐傷性を良好に維持しつつ、反射防止性を付与できる。そして、水性塗布液のpHが1.5~3.5であることと相俟って、反射防止性の向上効果が高められる。
 また、平均一次粒子径が8nm以下という、非常に微細なシリカ粒子を用いるため、形成される塗布膜は、緻密で、表面が平滑であり、耐傷性及び防汚性に優れる。
 水性塗布液は、上記の観点から、無孔質シリカ粒子の平均一次粒子径が6nm以下であり、pHが1.8~3.0であることが好ましい。
(Aqueous coating solution)
The aqueous coating solution contains water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant, and has a pH of 1.5 to 3.5.
It is particularly important in terms of antireflection that the aqueous coating solution contains only one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles. That is, by using nonporous silica particles having a specific average primary particle diameter without using these silica particles, a membrane that has conventionally used bead-like (chain-like) silica particles or porous silica particles is used. By forming it, it is possible to impart antireflection properties while maintaining good scratch resistance, which is rather unsatisfactory with beaded silica particles. Further, coupled with the fact that the pH of the aqueous coating solution is 1.5 to 3.5, the effect of improving the antireflection property is enhanced.
Moreover, since very fine silica particles having an average primary particle size of 8 nm or less are used, the formed coating film is dense, has a smooth surface, and is excellent in scratch resistance and antifouling properties.
From the above viewpoint, the aqueous coating liquid preferably has an average primary particle diameter of nonporous silica particles of 6 nm or less and a pH of 1.8 to 3.0.

-無孔質シリカ粒子-
 水性塗布液は、シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子を含む。
 「無孔質シリカ粒子」とは、シリカ粒子の内部に空隙を有さない粒子であることを意味し、中空シリカ粒子、及び多孔質シリカ粒子等の内部に空隙を有する粒子とは区別される。また、「無孔質シリカ粒子」には、粒子の内部にポリマーなどのコアを有し、コアの外殻(シェル)がシリカ、又はシリカの前駆体(例えば、焼成によってシリカに変化する素材)で構成されるコア-シェル構造のシリカ粒子は含まれない。
-Nonporous silica particles-
The aqueous coating solution contains one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles.
“Non-porous silica particles” means particles having no voids inside silica particles, and are distinguished from hollow silica particles, porous silica particles, and the like particles having voids inside. . In addition, the “nonporous silica particles” have a core such as a polymer inside the particles, and the outer shell (shell) of the core is silica or a precursor of silica (for example, a material that changes to silica by firing). The core-shell structured silica particles are not included.

 無孔質シリカ粒子の平均一次粒子径は、8nm以下である。平均一次粒子径が8nmを超えると反射防止性に劣る。
 平均一次粒子径は、上記の観点から6nm以下が好ましく、2nm~4nmがより好ましい。
The average primary particle diameter of the nonporous silica particles is 8 nm or less. When the average primary particle diameter exceeds 8 nm, the antireflection property is poor.
The average primary particle diameter is preferably 6 nm or less, more preferably 2 nm to 4 nm from the above viewpoint.

 無孔質シリカ粒子の平均一次粒子径は、分散した粒子を透過型電子顕微鏡により観察し、得られた写真から求めることができる。写真の画像より、粒子の投影面積を求め、投影面積と等しい面積を有する円の直径(円相当径)を求め平均粒子径(平均一次粒子径)とする。本明細書における平均一次粒子径は、300個以上の粒子について投影面積を測定して、それぞれ円相当径を求め、円相当径の値を算術平均した値を用いている。 The average primary particle diameter of the nonporous silica particles can be determined from the photograph obtained by observing the dispersed particles with a transmission electron microscope. From the image of the photograph, the projected area of the particles is obtained, and the diameter (equivalent circle diameter) of a circle having an area equal to the projected area is obtained and set as the average particle diameter (average primary particle diameter). The average primary particle diameter in this specification is a value obtained by measuring the projected area of 300 or more particles, obtaining the equivalent circle diameter, and arithmetically averaging the equivalent circle diameter.

 無孔質シリカ粒子は、市販のものを使用してもよく、例えば、NALCO社製のNALCO(登録商標)8699、2326、1115が挙げられる。 Commercially available nonporous silica particles may be used, and examples thereof include NALCO (registered trademark) 8699, 2326, and 1115 manufactured by NALCO.

 無孔質シリカ粒子の水性塗布液における含有量は、水性塗布液の全固形分に対して、5質量%~99質量%であることが好ましく、10質量%~98質量%であることがより好ましく、15質量%~97質量%であることがさらに好ましい。
 無孔質シリカ粒子の含有量が上記範囲であることで、水性塗布液は、反射防止性、耐傷性、及び防汚性に優れ、さらに親水性を有する膜を形成しうるものとなる。
The content of the nonporous silica particles in the aqueous coating solution is preferably 5% by mass to 99% by mass and more preferably 10% by mass to 98% by mass with respect to the total solid content of the aqueous coating solution. The content is preferably 15% by mass to 97% by mass.
When the content of the nonporous silica particles is in the above range, the aqueous coating liquid is excellent in antireflection properties, scratch resistance, and antifouling properties, and can form a hydrophilic film.

-水-
 水性塗布液は水を含有する。
 水性塗布液の水性媒体として水を用いることで、揮発性の有機溶媒を大量に用いた塗布液に比較して、環境への負荷が大幅に軽減される。
 水性塗布液は、水との親和性に優れる親水性有機溶媒等をさらに含んでいてもよい。
 水性塗布液が親水性有機溶媒を含むことで、水性塗布液の表面張力がより低くなり、より均一な塗布が可能となる。また、親水性有機溶媒が低沸点有機溶媒である場合、水性媒体における低沸点有機溶媒の比率が高くなるため、水性塗布液の乾燥が容易になること等の利点を有することになる。
-water-
The aqueous coating solution contains water.
By using water as the aqueous medium of the aqueous coating solution, the burden on the environment is greatly reduced as compared with a coating solution using a large amount of a volatile organic solvent.
The aqueous coating solution may further contain a hydrophilic organic solvent having excellent affinity with water.
When the aqueous coating solution contains a hydrophilic organic solvent, the surface tension of the aqueous coating solution becomes lower and more uniform coating is possible. Further, when the hydrophilic organic solvent is a low-boiling organic solvent, the ratio of the low-boiling organic solvent in the aqueous medium increases, and therefore there are advantages such as easy drying of the aqueous coating solution.

 親水性有機溶媒としては、特に制限はないが、メタノール、エタノール、イソプロパノール、ブタノール、アセトン、エチレングリコール、及びエチルセロソルブ等が挙げられる。入手容易性、環境負荷の低減の観点からアルコールが好ましく、エタノール、及びイソプロパノールがより好ましい。 The hydrophilic organic solvent is not particularly limited, and examples thereof include methanol, ethanol, isopropanol, butanol, acetone, ethylene glycol, and ethyl cellosolve. Alcohol is preferable from the viewpoint of availability and reduction of environmental burden, and ethanol and isopropanol are more preferable.

 水性塗布液が水性媒体として水以外に親水性有機溶媒を含む場合、水性塗布液に用いられる水の含有量は、水性媒体の全質量に対して、30質量%以上であることが好ましく、40質量%以上であることがより好ましい。 When the aqueous coating solution contains a hydrophilic organic solvent in addition to water as an aqueous medium, the content of water used in the aqueous coating solution is preferably 30% by mass or more based on the total mass of the aqueous medium. More preferably, it is at least mass%.

 水性塗布液の全質量に対する固形分量は、0.1質量%~30質量%の範囲であることが好ましく、0.2質量%~20質量%の範囲であることがより好ましく、0.5質量%~10質量%の範囲であることがさらに好ましい。水性塗布液の固形分量は、水性媒体、特に水の含有量を調整することで調整できる。 The solid content with respect to the total mass of the aqueous coating solution is preferably in the range of 0.1% by mass to 30% by mass, more preferably in the range of 0.2% by mass to 20% by mass, and 0.5% by mass. More preferably, it is in the range of 10% by mass to 10% by mass. The solid content of the aqueous coating solution can be adjusted by adjusting the content of the aqueous medium, particularly water.

-界面活性剤-
 水性塗布液は、界面活性剤の少なくとも1種を含む。
 水性塗布液が界面活性剤を含むことにより、水性塗布液の塗布性が向上し、水性塗布液の表面張力が低くなるため、形成される膜の均一塗布性、塗布面状性に優れる。
-Surfactant-
The aqueous coating solution contains at least one surfactant.
When the aqueous coating solution contains a surfactant, the coating property of the aqueous coating solution is improved, and the surface tension of the aqueous coating solution is lowered. Therefore, the uniform coating property and coating surface property of the formed film are excellent.

 界面活性剤としては、非イオン性界面活性剤、並びにイオン性界面活性剤であるアニオン性界面活性剤、カチオン性界面活性剤、及び両性型界面活性剤等が挙げられ、いずれも好適に用いることができる。
 なお、イオン性界面活性剤を過剰に用いると、水性塗布液のpHを所定の範囲に調整し難くなる。そのため、界面活性剤としては、界面活性剤の含有量の自由度が高い点から、非イオン性界面活性剤を用いることが好ましい。
Examples of the surfactant include nonionic surfactants, and anionic surfactants that are ionic surfactants, cationic surfactants, and amphoteric surfactants, all of which are preferably used. Can do.
If the ionic surfactant is used excessively, it is difficult to adjust the pH of the aqueous coating solution to a predetermined range. Therefore, as the surfactant, it is preferable to use a nonionic surfactant because it has a high degree of freedom in the content of the surfactant.

 非イオン性界面活性剤の例としては、ポリアルキレングリコールモノアルキルエーテル、ポリアルキレングリコールモノアルキルエステル、及びポリアルキレングリコールモノアルキルエステル・モノアルキルエーテル等が挙げられる。非イオン性界面活性剤として、具体的には、ポリエチレングリコールモノラウリルエーテル、ポリエチレングリコールモノステアリルエーテル、ポリエチレングリコールモノセチルエーテル、ポリエチレングリコールモノラウリルエステル、及びポリエチレングリコールモノステアリルエステル等が挙げられる。 Examples of the nonionic surfactant include polyalkylene glycol monoalkyl ether, polyalkylene glycol monoalkyl ester, polyalkylene glycol monoalkyl ester / monoalkyl ether, and the like. Specific examples of the nonionic surfactant include polyethylene glycol monolauryl ether, polyethylene glycol monostearyl ether, polyethylene glycol monocetyl ether, polyethylene glycol monolauryl ester, and polyethylene glycol monostearyl ester.

 非イオン性界面活性剤は、特に限定されるものではなく、市販のものを使用してもよく、例えば、ダウ・ケミカル社製のTRITON BG10などが挙げられる。 The nonionic surfactant is not particularly limited, and a commercially available one may be used, and examples thereof include TRITON BG10 manufactured by Dow Chemical Company.

 一方、水性塗布液がイオン性界面活性剤を含有することで、親水性を高めることができる点で好ましい。
 水性塗布液が、イオン性界面活性剤を過剰に含有するとシリカ粒子が凝集し易くなるため、一般には、イオン性界面活性剤とシリカ粒子とを併用した例は少ない。しかし、イオン性界面活性剤を水性塗布液に添加した場合、シリカ粒子の凝集を生起させる量よりも少ない含有量で用いることで、水性塗布液により形成された塗布膜の防汚性を高めることができる。
On the other hand, it is preferable in that the aqueous coating liquid contains an ionic surfactant to improve hydrophilicity.
If the aqueous coating solution contains an ionic surfactant in excess, the silica particles are likely to aggregate, so that there are generally few examples in which the ionic surfactant and the silica particles are used in combination. However, when an ionic surfactant is added to the aqueous coating solution, the antifouling property of the coating film formed by the aqueous coating solution is increased by using it in a content that is less than the amount that causes aggregation of the silica particles. Can do.

 イオン性界面活性剤の例としては、アルキル硫酸塩、アルキルベンゼンスルホン酸塩、及びアルキルリン酸塩等のアニオン性界面活性剤、アルキルトリメチルアンモニウム塩、及びジアルキルジメチルアンモニウム塩等のカチオン性界面活性剤、並びにアルキルカルボキシベタイン等の両性型界面活性剤を挙げることができる。 Examples of ionic surfactants include anionic surfactants such as alkyl sulfates, alkyl benzene sulfonates, and alkyl phosphates, cationic surfactants such as alkyl trimethyl ammonium salts, and dialkyl dimethyl ammonium salts, And amphoteric surfactants such as alkylcarboxybetaines.

 水性塗布液における界面活性剤の含有量は、塗布膜の防汚性の観点から、水性塗布液の全質量に対して、0.01質量%以上が好ましく、0.02質量%以上がより好ましく、0.03質量%以上がさらに好ましい。
 界面活性剤の含有量を上記範囲とすることで、濡れ性を向上させることができ、水性塗布液の塗布性が良好となる。
The content of the surfactant in the aqueous coating solution is preferably 0.01% by mass or more, more preferably 0.02% by mass or more, based on the total mass of the aqueous coating solution, from the viewpoint of antifouling properties of the coating film. 0.03 mass% or more is more preferable.
By setting the content of the surfactant in the above range, the wettability can be improved, and the coating property of the aqueous coating liquid is improved.

 界面活性剤の含有量の上限には特に制限はないが、界面活性剤の種類によっては過剰に加えることで、水性塗布液を塗布した後に表面に偏析して塗布膜の強度が低下する懸念がある。そのため、界面活性剤の含有量は、水性塗布液の全質量に対して10質量%以下が好ましく、8質量%以下がより好ましく、5質量%以下がさらに好ましい。
 また、界面活性剤としてイオン性界面活性剤を用いる場合、防汚性をより高め、かつ、界面活性剤の影響による無孔質シリカ粒子の凝集を抑制するという観点から、イオン性界面活性剤の含有量は、水性塗布液の全質量に対して5.0質量%以下が好ましく、3.0質量%以下より好ましく、1.0質量%以下さらに好ましい。
The upper limit of the content of the surfactant is not particularly limited, but depending on the type of surfactant, there is a concern that it may segregate on the surface after application of the aqueous coating liquid and the strength of the coating film may be reduced. is there. Therefore, the content of the surfactant is preferably 10% by mass or less, more preferably 8% by mass or less, and further preferably 5% by mass or less with respect to the total mass of the aqueous coating liquid.
In addition, when an ionic surfactant is used as the surfactant, it is possible to enhance the antifouling property and suppress the aggregation of nonporous silica particles due to the influence of the surfactant. The content is preferably 5.0% by mass or less, more preferably 3.0% by mass or less, and further preferably 1.0% by mass or less, based on the total mass of the aqueous coating solution.

-水性塗布液のpH-
 水性塗布液のpHは、1.5~3.5である。
 水性塗布液のpHが1.5未満であると反射防止性に劣り、また、pHが3.5を超えると反射防止性に劣る。
 この理由は、次のように推察される。すなわち、水性塗布液のpHが上記範囲であると、平均一次粒子径が8nm以下の無孔質シリカ粒子の等電点(pH2.0)と近いため、無孔質シリカ粒子は液中で軟凝集し、軟凝集した状態で基材上に塗布され、乾燥されることにより、無孔質シリカ粒子は密に配置されつつ粒子間に空隙を有する膜となる。膜はこれにより、反射防止性、耐傷性、及び防汚性に優れたものとなると考えられる。
-PH of aqueous coating solution-
The pH of the aqueous coating solution is 1.5 to 3.5.
When the pH of the aqueous coating solution is less than 1.5, the antireflection property is poor, and when the pH exceeds 3.5, the antireflection property is inferior.
The reason is presumed as follows. That is, when the pH of the aqueous coating solution is in the above range, the non-porous silica particles are soft in the liquid because the average primary particle diameter is close to the isoelectric point (pH 2.0) of the non-porous silica particles having a diameter of 8 nm or less. The non-porous silica particles are densely arranged to form a film having voids between the particles while being agglomerated and softly agglomerated, applied onto the substrate and dried. Thus, the film is considered to have excellent antireflection properties, scratch resistance, and antifouling properties.

 水性塗布液のpHは、上記の観点から、1.8~3.0が好ましい。なお、無孔質シリカ粒子の等電点は、製造方法、一次粒子径、表面状態によって若干の上下を示すが、その場合は、等電点のpHに合わせて水性塗布液のpHを調整してもよい。 The pH of the aqueous coating solution is preferably 1.8 to 3.0 from the above viewpoint. The isoelectric point of the nonporous silica particles shows a slight up and down depending on the production method, primary particle diameter, and surface state. In that case, the pH of the aqueous coating solution is adjusted according to the pH of the isoelectric point. May be.

 水性塗布液のpHは、pHメーター(東亜DKK(株)製、HM-31P)を用いて、25℃で測定された値である。 The pH of the aqueous coating solution is a value measured at 25 ° C. using a pH meter (manufactured by Toa DKK Co., Ltd., HM-31P).

(基材)
 水性塗布液を塗布する基材には特に制限はなく、基材としては、ガラス、樹脂、金属、セラミックス等の各種基材をいずれも好適に用いることができる。
 基材としてガラスを用いた場合、無孔質シリカ粒子のケイ素上のヒドロキシル基の縮合がガラス表面のヒドロキシル基との間でも発生することにより、基材との密着性に優れた塗布膜が形成される。
(Base material)
There is no restriction | limiting in particular in the base material which apply | coats an aqueous coating liquid, As a base material, all various base materials, such as glass, resin, a metal, ceramics, can be used suitably.
When glass is used as the base material, condensation of hydroxyl groups on the silicon of nonporous silica particles occurs even with the hydroxyl groups on the glass surface, thereby forming a coating film with excellent adhesion to the base material. Is done.

 水性塗布液を基材に塗布する方法としては特に限定されず、例えば、スプレー塗布、刷毛塗布、ローラー塗布、バー塗布、ディップ塗布等の公知の塗布法をいずれも適用することができる。 The method for applying the aqueous coating solution to the substrate is not particularly limited, and any known coating method such as spray coating, brush coating, roller coating, bar coating, dip coating, etc. can be applied.

[乾燥する工程]
 膜の製造方法は、塗布形成された塗布膜を乾燥する工程を含む。
 塗布膜を乾燥することにより、基材上に無孔質シリカ粒子と界面活性剤とを含む膜が形成される。
[Drying process]
The manufacturing method of a film | membrane includes the process of drying the coating film formed by application | coating.
By drying the coating film, a film containing nonporous silica particles and a surfactant is formed on the substrate.

 塗布膜の乾燥は、室温(25℃)で行なってもよく、加熱装置を用いて行ってもよい。加熱装置としては、目的の温度に加熱できるものであれば特に限定されずに用いることができ、例えば、オーブン、電気炉、又は製造ラインにあわせて独自に作製した焼成装置等が挙げられる。塗布膜の乾燥は、これらの加熱装置を用いて塗布膜を40℃~400℃に加熱して行なってもよい。また、加熱を行なう場合には、加熱時間を1分~30分程度とすることができる。
 塗布膜を乾燥する工程における乾燥条件は、40℃~200℃で1分~10分の条件が好ましく、100℃~180℃で1分~5分の条件がより好ましい。
The coating film may be dried at room temperature (25 ° C.) or using a heating device. The heating device can be used without particular limitation as long as it can be heated to a target temperature, and examples thereof include an oven, an electric furnace, or a firing device uniquely produced in accordance with a production line. The coating film may be dried by heating the coating film to 40 ° C. to 400 ° C. using these heating devices. When heating is performed, the heating time can be set to about 1 to 30 minutes.
The drying conditions in the step of drying the coating film are preferably 40 ° C. to 200 ° C. for 1 minute to 10 minutes, more preferably 100 ° C. to 180 ° C. for 1 minute to 5 minutes.

 乾燥後の塗布膜は、膜厚が50nm以上であることが好ましい。膜厚が50nm以上であると乾燥後の塗布膜は反射防止性に優れる。
 膜厚は、上記観点から、50nm以上350nm以下が好ましく、100nm以上300nm以下がより好ましく、100nm以上250nm以下がさらに好ましい。
The coating film after drying preferably has a film thickness of 50 nm or more. When the film thickness is 50 nm or more, the coating film after drying is excellent in antireflection properties.
From the above viewpoint, the film thickness is preferably from 50 nm to 350 nm, more preferably from 100 nm to 300 nm, and even more preferably from 100 nm to 250 nm.

[焼成する工程]
 膜の製造方法は、塗布膜を乾燥する工程の後、さらに、乾燥後の塗布膜を400℃以上800℃以下の温度で焼成する工程を含むことが好ましい。
[Baking process]
It is preferable that the manufacturing method of a film | membrane includes the process of baking the coating film after drying further at the temperature of 400 to 800 degreeC after the process of drying a coating film.

 無孔質シリカ粒子は、焼成する工程の前後で、存在する粒子の状態が変化する。具体的には、焼成前の塗布膜中には、それぞれの無孔質シリカ粒子が単一粒子(ファンデル・ワールス力により凝集した状態など、集合している状態は、ここでは単一粒子とする)として存在し、焼成後の塗布膜中には、複数の無孔質シリカ粒子のうち少なくとも一部は、これら無孔質シリカ粒子が互いに連結された粒子連結体として存在する。
 この場合、焼成により連結された粒子の平均一次粒子径は、連結部(例えば、ネック部分)を考慮せず、連結されたうちの1つのみを球と仮定したときの直径を採用する。なお、焼成により連結された粒子の平均一次粒子径は、既述の無孔質シリカ粒子の平均一次粒子径と同様の方法により算出することができる。
The state of the existing nonporous silica particles changes before and after the firing step. Specifically, in the coating film before firing, each nonporous silica particle is a single particle (aggregated state by van der Waals force, etc.) In the coating film after firing, at least a part of the plurality of nonporous silica particles is present as a particle connected body in which the nonporous silica particles are connected to each other.
In this case, the average primary particle diameter of the particles connected by firing is the diameter when only one of the connected particles is assumed to be a sphere without considering the connecting portion (for example, the neck portion). In addition, the average primary particle diameter of the particle | grains connected by baking can be calculated by the method similar to the average primary particle diameter of non-porous silica particle as stated above.

 焼成する工程では、焼成により、複数の無孔質シリカ粒子が連結されて粒子連結体が形成されることが好ましい。これにより、無孔質シリカ粒子同士の結合力が向上するため、膜の耐傷性がより向上する。この点、あらかじめ「数珠状」に連なったシリカ粒子を用いた水性塗布液による場合には同様の効果は得られない。 In the calcination step, it is preferable that a plurality of non-porous silica particles are connected to form a particle connected body by baking. Thereby, since the bonding force between the nonporous silica particles is improved, the scratch resistance of the film is further improved. In this regard, the same effect cannot be obtained in the case of using an aqueous coating solution using silica particles previously linked in a “beaded” manner.

 焼成する工程における焼成条件は、焼成温度が450℃以上800℃以下であることがより好ましく、500℃以上800℃以下であることがさらに好ましく、600℃以上800℃以下であることが特に好ましい。また、焼成時間は、1分~10分であることが好ましく、1分~5分であることがより好ましい。 As for the firing conditions in the firing step, the firing temperature is more preferably 450 ° C. or higher and 800 ° C. or lower, further preferably 500 ° C. or higher and 800 ° C. or lower, and particularly preferably 600 ° C. or higher and 800 ° C. or lower. The firing time is preferably 1 minute to 10 minutes, more preferably 1 minute to 5 minutes.

 焼成する工程における焼成は、加熱装置を用いて行うことができる。加熱装置としては、目的の温度に加熱できるものであれば特に限定されずに用いることができ、例えば、電気炉、又は製造ラインにあわせて独自に作製した焼成装置等が挙げられる。 Firing in the firing step can be performed using a heating device. The heating device can be used without any particular limitation as long as it can be heated to a target temperature, and examples thereof include an electric furnace or a firing device uniquely produced in accordance with a production line.

 焼成後の塗布膜は、膜厚が50nm以上であることが好ましい。膜厚が50nm以上であると焼成後の塗布膜は反射防止性に優れる。
 膜厚は、上記観点から、50nm以上350nm以下が好ましく、100nm以上300nm以下がより好ましく、100nm以上250nm以下がさらに好ましい。
The coating film after baking preferably has a film thickness of 50 nm or more. When the film thickness is 50 nm or more, the coating film after baking has excellent antireflection properties.
From the above viewpoint, the film thickness is preferably from 50 nm to 350 nm, more preferably from 100 nm to 300 nm, and even more preferably from 100 nm to 250 nm.

 本発明の一実施形態の製造方法により製造される膜は、反射防止性、耐傷性、及び防汚性に優れる。
 以下に本発明の膜の好ましい物性を示す。
The film produced by the production method of one embodiment of the present invention is excellent in antireflection properties, scratch resistance, and antifouling properties.
The preferred physical properties of the film of the present invention are shown below.

(平均反射率変化ΔRの絶対値)
 本発明の一実施形態における少なくとも乾燥後の塗布膜の反射防止性は、下記式(1)で定義される、波長400nm~1100nmの光における5°入射時の平均反射率変化ΔRの絶対値でその性能を表すことができる。
 なお、「少なくとも乾燥後の塗布膜」は、既述の乾燥する工程を経た塗布膜であればよく、乾燥する工程の後、既述の焼成する工程を経た塗布膜も含まれる。
 
|平均反射率変化ΔR|=|R - R| 式(1)
 式(1)中、Rは膜形成後の基材の平均反射率を表し、Rは基材の平均反射率を表す。
 
(Absolute value of average reflectance change ΔR)
The antireflection property of at least the coating film after drying in one embodiment of the present invention is the absolute value of the average reflectance change ΔR at 5 ° incidence with light having a wavelength of 400 nm to 1100 nm defined by the following formula (1). The performance can be expressed.
Note that “at least the coating film after drying” may be a coating film that has undergone the above-described drying process, and includes a coating film that has undergone the above-described baking process after the drying process.

| Average reflectance change ΔR | = | R 1 −R 2 | Formula (1)
In formula (1), R 1 represents the average reflectance of the substrate after film formation, and R 2 represents the average reflectance of the substrate.

 式(1)の平均反射率変化ΔRは、塗布膜を形成していない基材の平均反射率(R)と水性塗布液により形成した塗布膜を有する基材の平均反射率(R)とを、硫酸バリウム白板をリファレンスとして測定することで求めることができる。 The average reflectance change ΔR in the formula (1) is the average reflectance (R 2 ) of the base material on which the coating film is not formed and the average reflectance (R 1 ) of the base material having the coating film formed with the aqueous coating liquid. Can be obtained by measuring with a barium sulfate white plate as a reference.

 反射率は、積分球付の分光光度計を用いることで測定可能である。具体的には、例えば、紫外可視赤外分光光度計(日本分光(株)製、V-670)などにより測定することができる。本発明の一実施形態においては、波長400nm~1100nmの光を用い、V-670を用いて測定したそれぞれの波長における反射率の値を算術平均した値を平均反射率として採用する。
 膜の平均反射率変化ΔRの絶対値の数値が高いほど、反射防止性に優れている。
The reflectance can be measured by using a spectrophotometer with an integrating sphere. Specifically, it can be measured by, for example, an ultraviolet-visible infrared spectrophotometer (manufactured by JASCO Corporation, V-670). In one embodiment of the present invention, light having a wavelength of 400 nm to 1100 nm is used, and a value obtained by arithmetically averaging reflectance values at respective wavelengths measured using V-670 is adopted as the average reflectance.
The higher the absolute value of the average reflectance change ΔR of the film, the better the antireflection property.

 塗布膜の平均反射率変化ΔRの絶対値は、反射防止性の観点から2.0%以上であることが好ましく、2.5%以上であることがより好ましい。 The absolute value of the average reflectance change ΔR of the coating film is preferably 2.0% or more, and more preferably 2.5% or more from the viewpoint of antireflection properties.

(表面粗さRa)
 本発明の一実施形態の膜の表面粗さRaは、原子間力顕微鏡(AFM)(セイコーインスツルメンツ社製、SPA-400)を用いて、JIS B0601:2001に準拠し測定することができる(測定範囲:3μm角)。
 本発明の一実施形態の膜の表面粗さRaは、20nm以下が好ましく、10nm以下がより好ましい。
(Surface roughness Ra)
The surface roughness Ra of the film of one embodiment of the present invention can be measured according to JIS B0601: 2001 using an atomic force microscope (AFM) (SPA-400 manufactured by Seiko Instruments Inc.) (measurement). Range: 3 μm square).
The surface roughness Ra of the film of one embodiment of the present invention is preferably 20 nm or less, and more preferably 10 nm or less.

(水接触角)
 本発明の一実施形態における少なくとも乾燥後の塗布膜の水接触角は、40°以下であることが好ましく、30°以下であることがより好ましく、25°以下であることがさらに好ましく、15°以下が特に好ましい。
 水接触角は、協和界面化学(株)製、Drop Master 300を用いて、純水に対する接触角を5回測定し、その平均値として求めることができる。
 塗布膜の水接触角を上記範囲とすることにより、塗布膜に十分な親水性を付与することができるため、塗布膜の防汚性に優れる。
(Water contact angle)
In one embodiment of the present invention, the water contact angle of at least the coating film after drying is preferably 40 ° or less, more preferably 30 ° or less, further preferably 25 ° or less, and 15 °. The following are particularly preferred:
The water contact angle can be obtained as an average value obtained by measuring the contact angle with respect to pure water five times using a Drop Master 300 manufactured by Kyowa Interface Chemical Co., Ltd.
By making the water contact angle of a coating film into the said range, since sufficient hydrophilicity can be provided to a coating film, it is excellent in the antifouling property of a coating film.

<水性塗布液>
 水性塗布液は、水と、シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子と、界面活性剤と、を含み、pHが1.5~3.5である。
 水性塗布液は、既述の製造方法における水性塗布液と同義である。本発明の一実施形態の水性塗布液を用いることで、反射防止性、耐傷性、及び防汚性に優れた膜を製造することができる。
<Aqueous coating solution>
The aqueous coating solution contains water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant, and has a pH of 1.5 to 3.5.
The aqueous coating solution is synonymous with the aqueous coating solution in the production method described above. By using the aqueous coating liquid of one embodiment of the present invention, a film excellent in antireflection property, scratch resistance and antifouling property can be produced.

 水性塗布液は、無孔質シリカ粒子の平均一次粒子径が6nmであり、pHが1.8~3.0であることが好ましい。
 水性塗布液は、pHを調整する観点から、界面活性剤が非イオン性界面活性剤であることが好ましい。
The aqueous coating solution preferably has an average primary particle diameter of nonporous silica particles of 6 nm and a pH of 1.8 to 3.0.
In the aqueous coating solution, the surfactant is preferably a nonionic surfactant from the viewpoint of adjusting pH.

<膜>
 本発明の一実施形態の膜は、シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子を含有し、膜厚が50nm以上350nm以下である。
 本発明の一実施形態の膜における無孔質シリカ粒子は、既述の本発明一実施形態の製造方法における無孔質シリカ粒子と同義である。本発明の一実施形態の膜は、反射防止性、耐傷性、及び防汚性に優れる。
<Membrane>
The film of one embodiment of the present invention contains one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and has a film thickness of 50 nm or more and 350 nm or less.
The nonporous silica particles in the membrane of one embodiment of the present invention are synonymous with the nonporous silica particles in the production method of the one embodiment of the present invention described above. The film of one embodiment of the present invention is excellent in antireflection properties, scratch resistance, and antifouling properties.

 本発明の一実施形態の膜は、無孔質シリカ粒子の平均一次粒子径が8nmを超えると反射防止性に劣る。また、膜厚は100nm以上300nm以下が好ましく、100nm以上250nm以下がより好ましい。 The film of one embodiment of the present invention has poor antireflection properties when the average primary particle diameter of the nonporous silica particles exceeds 8 nm. The film thickness is preferably 100 nm to 300 nm, and more preferably 100 nm to 250 nm.

 本発明の一実施形態の膜における無孔質シリカ粒子は、反射防止性の観点から平均一次粒子径が6nm以下であることが好ましい。平均一次粒子径は、2nm~4nmであることがより好ましい。
 本発明の一実施形態の膜は、下記式(1)で定義される、波長400nm~1100nmの光における5°入射時の平均反射率変化ΔRの絶対値が、2.0%以上であることが好ましく、2.5%以上であることがより好ましい。
 
|平均反射率変化ΔR|=|R - R| 式(1)
 式(1)中、Rは膜形成後の基材の平均反射率を表し、Rは基材の平均反射率を表す。
 
The non-porous silica particles in the film of one embodiment of the present invention preferably have an average primary particle diameter of 6 nm or less from the viewpoint of antireflection properties. The average primary particle diameter is more preferably 2 nm to 4 nm.
In the film of one embodiment of the present invention, the absolute value of the average reflectance change ΔR at 5 ° incidence in the light having a wavelength of 400 nm to 1100 nm defined by the following formula (1) is 2.0% or more. Is more preferable, and 2.5% or more is more preferable.

| Average reflectance change ΔR | = | R 1 −R 2 | Formula (1)
In formula (1), R 1 represents the average reflectance of the substrate after film formation, and R 2 represents the average reflectance of the substrate.

 本発明の一実施形態の膜は、以下の2つの態様のいずれであってもよく、第1の態様が、膜の耐傷性の点で好ましい。
 第1の態様としては、既述の膜における無孔質シリカ粒子は、複数の無孔質シリカ粒子が連結した粒子連結体の状態として含有する態様である。
 膜に含有される無孔質シリカ粒子が複数の無孔質シリカ粒子の粒子連結体であることで、反射防止性を良好に保ちながら膜の耐傷性がより向上する。
The film of one embodiment of the present invention may be either of the following two aspects, and the first aspect is preferable in terms of scratch resistance of the film.
As a 1st aspect, the nonporous silica particle in the above-mentioned film | membrane is an aspect contained as the state of the particle | grain coupling body which the some nonporous silica particle connected.
When the nonporous silica particles contained in the film are a particle-linked body of a plurality of nonporous silica particles, the scratch resistance of the film is further improved while maintaining good antireflection properties.

 第2の態様としては、既述の膜が、さらに、界面活性剤を含有する態様である。すなわち、界面活性剤を含有する本発明の水性塗布液を用いて塗布膜を形成し、塗布膜が乾燥され、既述の焼成する工程を経ずに製造された膜である。 As a second aspect, the above-described film further contains a surfactant. That is, the coating film is formed using the aqueous coating liquid of the present invention containing a surfactant, the coating film is dried, and the film is manufactured without the above-described baking process.

<積層体>
 積層体は、基材上に、既述の本発明の一実施形態の製造方法により製造された膜、又は既述の本発明の一実施形態の膜を有する。
 そのため、積層体は、反射防止性、耐傷性、及び防汚性に優れる。
 積層体における基材は、密着性の観点からガラス基材であることが好ましい。
<Laminated body>
A laminated body has the film | membrane manufactured by the manufacturing method of one embodiment of this invention as stated above, or the film | membrane of one embodiment of this invention mentioned above on a base material.
Therefore, the laminate is excellent in antireflection properties, scratch resistance, and antifouling properties.
It is preferable that the base material in a laminated body is a glass base material from an adhesive viewpoint.

 ガラス基材上に形成された本発明の一実施形態の膜を有する積層体は、反射防止性、耐傷性、及び防汚性に優れるため、例えば、太陽電池モジュール、監視カメラ、及び照明機器、標識の保護膜などの用途に好適に使用することができる。 Since the laminate having the film of one embodiment of the present invention formed on a glass substrate is excellent in antireflection, scratch resistance, and antifouling properties, for example, a solar cell module, a surveillance camera, and a lighting device, It can be suitably used for applications such as a protective film for a label.

<太陽電池モジュール>
 太陽電池モジュールは、既述の本発明の一実施形態の製造方法により製造された膜、又は既述の本発明の一実施形態の膜を有する積層体を備える。
 太陽電池モジュールは、太陽光の光エネルギーを電気エネルギーに変換する太陽電池素子を、太陽光が入射する側に設けられる反射防止性に優れた本発明の一実施形態の積層体とポリエステルフィルムに代表される太陽電池用バックシートとの間に配置して構成される。積層体とポリエステルフィルムとの間は、例えばエチレン-酢酸ビニル共重合体等の樹脂に代表される封止材により封止されて構成することができる。
<Solar cell module>
A solar cell module is provided with the laminated body which has the film | membrane manufactured by the manufacturing method of one embodiment of this invention mentioned above, or the film | membrane of one embodiment of this invention mentioned above.
The solar cell module is represented by a laminate and a polyester film of one embodiment of the present invention, which is excellent in antireflection properties, and is provided on the side where sunlight enters a solar cell element that converts sunlight light energy into electrical energy. The solar cell backsheet is disposed and configured. The laminate and the polyester film can be configured by being sealed with a sealing material typified by a resin such as an ethylene-vinyl acetate copolymer.

 太陽電池モジュール、太陽電池セル等、積層体及びバックシート以外の部材については、例えば、「太陽光発電システム構成材料」(杉本栄一監修、(株)工業調査会、2008年発行)に詳細に記載されている。本発明の太陽電池モジュールでは、太陽光が入射する側に本発明の積層体を備えることが好ましく、いずれの構成を採るものであってもよい。 About members other than a laminated body and a back sheet, such as a solar battery module and a solar battery cell, for example, it describes in detail in "Solar power generation system constituent material" (Eiichi Sugimoto supervision, Kogyo Kenkyukai, 2008 issue). Has been. In the solar cell module of this invention, it is preferable to provide the laminated body of this invention in the sunlight incident side, and any structure may be taken.

 太陽光が入射する側に設けられる基材としては、例えば、ガラス基材、アクリル樹脂等の透明樹脂等を挙げることができるが、本発明の一実施形態の太陽電池モジュールにおいては、ガラス基材表面に、反射防止性に加え、耐傷性、防汚性にも優れる膜を有する積層体が用いられる。 Examples of the substrate provided on the side on which sunlight is incident include a glass substrate, a transparent resin such as an acrylic resin, and the like. In the solar cell module of one embodiment of the present invention, a glass substrate is used. A laminate having a film having excellent scratch resistance and antifouling properties in addition to antireflection properties is used on the surface.

 太陽電池モジュールに使用される太陽電池素子としては、特に制限はなく、単結晶シリコン、多結晶シリコン、アモルファスシリコン等のシリコン系、銅-インジウム-ガリウム-セレン、銅-インジウム-セレン、カドミウム-テルル、ガリウム-砒素等のIII-V族やII-VI族化合物半導体系等、各種公知の太陽電池素子をいずれも適用することができる。
 太陽電池モジュールは、反射防止性、耐傷性、及び防汚性が良好な膜をガラス基材上に有する積層体を備えるため、長期間使用しても、表面の膜に傷が発生したり、汚染物質が付着したりすることによる光透過性の低下が抑制され、付着した汚染物質は雨等の水で容易に除去されるために、長期間に亘り良好な発電効率が維持される。
The solar cell element used in the solar cell module is not particularly limited, and silicon-based materials such as single crystal silicon, polycrystalline silicon, and amorphous silicon, copper-indium-gallium-selenium, copper-indium-selenium, cadmium-tellurium Any of various known solar cell elements such as III-V and II-VI compound semiconductor systems such as gallium-arsenic can be applied.
Since the solar cell module includes a laminate having a film with good antireflection, scratch resistance, and antifouling properties on a glass substrate, even if it is used for a long period of time, scratches on the surface film occur, A decrease in light transmittance due to the adhering contaminants is suppressed, and the adhering contaminants are easily removed with water such as rain, so that good power generation efficiency is maintained over a long period of time.

 以下、本発明の一実施形態を実施例により具体的に説明するが、本発明の一実施形態はその主旨を越えない限り、以下の実施例に限定されるものではない。 Hereinafter, one embodiment of the present invention will be specifically described by way of examples. However, one embodiment of the present invention is not limited to the following examples unless it exceeds the gist thereof.

(実施例1)
〔シリカ分散液1Aの調製〕
 脱イオン水6.00gに、シリカ粒子の水分散物NALCO(登録商標)8699(NALCO社製、固形分15質量%、無孔質シリカ粒子、平均一次粒子径=3nm)7.02gを添加し撹拌して得られた溶液にリン酸を滴下し、pHを1.5~2.0に調整してシリカ分散液1Aを調製した。
 なお、平均一次粒子径は、粒子を透過型電子顕微鏡により観察し、得られた写真の画像より、300個の粒子の投影面積をそれぞれ求め、投影面積と等しい面積を有する円の直径(円相当径)をそれぞれ求め、円相当径の値を算術平均した値を平均一次粒子径とした。
(Example 1)
[Preparation of Silica Dispersion 1A]
To 6.00 g of deionized water, 7.02 g of an aqueous dispersion of silica particles NALCO (registered trademark) 8699 (manufactured by NALCO, solid content 15 mass%, nonporous silica particles, average primary particle size = 3 nm) is added. Phosphoric acid was added dropwise to the solution obtained by stirring to adjust the pH to 1.5 to 2.0 to prepare a silica dispersion 1A.
The average primary particle size is determined by observing the particles with a transmission electron microscope, obtaining the projected area of 300 particles from the obtained photographic image, and obtaining the diameter of a circle having an area equal to the projected area (equivalent to a circle). The diameter was determined, and the value obtained by arithmetically averaging the equivalent circle diameter values was defined as the average primary particle diameter.

〔水性塗布液1の調製〕
 シリカ分散液1Aに、脱イオン水23.5g、エタノール1.06g、及びTRITON BG10(ダウ・ケミカル社製、非イオン性界面活性剤)の10質量%水溶液0.56gを添加し、リン酸を用いて溶液のpHを2.4に調整し、水性塗布液1(固形分2.76質量%)を調製した。
 なお、pHは、pHメーター(東亜DKK(株)製、HM-31P)を用いて、25℃で測定された値である。
[Preparation of aqueous coating solution 1]
To the silica dispersion 1A, add 23.5 g of deionized water, 1.06 g of ethanol, and 0.56 g of a 10 mass% aqueous solution of TRITON BG10 (manufactured by Dow Chemical Co., Ltd., nonionic surfactant), and add phosphoric acid. The pH of the solution was adjusted to 2.4 using it, and aqueous coating liquid 1 (solid content 2.76 mass%) was prepared.
The pH is a value measured at 25 ° C. using a pH meter (manufactured by Toa DKK Co., Ltd., HM-31P).

〔膜サンプルの作製〕
 得られた水性塗布液1を、ガラス基材上にバーコーターを用いて塗布し塗布膜を形成した。この塗布膜をオーブンにより150℃、1分間の条件で乾燥させた。その後、電気炉により750℃、3分間の条件で焼成し、膜サンプルを作製した。ガラス基材上の塗布膜の最終的な膜厚は、190nmになるようにした。また、膜サンプルの表面粗さRaを既述の方法により測定したところ、表面粗さRaは10nm以下であった。
[Production of membrane sample]
The obtained aqueous coating solution 1 was coated on a glass substrate using a bar coater to form a coating film. This coating film was dried in an oven at 150 ° C. for 1 minute. Then, it baked on 750 degreeC and the conditions for 3 minutes with the electric furnace, and produced the film | membrane sample. The final film thickness of the coating film on the glass substrate was set to 190 nm. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 10 nm or less.

(実施例2)
〔シリカ分散液1Bの調製〕
 実施例1で用いたシリカの水分散物NALCO(登録商標)8699を、NALCO (登録商標)2326(NALCO社製、固形分15質量%、無孔質シリカ粒子、平均一次粒子径=5nm)に変更した以外は、実施例1と同様にして、シリカ分散液1Bを調製した。
(Example 2)
[Preparation of silica dispersion 1B]
The silica aqueous dispersion NALCO (registered trademark) 8699 used in Example 1 was changed to NALCO (registered trademark) 2326 (manufactured by NALCO, solid content 15% by mass, nonporous silica particles, average primary particle size = 5 nm). Except for the change, a silica dispersion 1B was prepared in the same manner as in Example 1.

〔水性塗布液2の調製〕
 実施例1で用いたシリカ分散液1Aをシリカ分散液1Bに変更し、リン酸によりpHを2.1に調整した以外は、実施例1と同様にして水性塗布液2を調製した。
[Preparation of aqueous coating solution 2]
An aqueous coating solution 2 was prepared in the same manner as in Example 1, except that the silica dispersion 1A used in Example 1 was changed to the silica dispersion 1B and the pH was adjusted to 2.1 with phosphoric acid.

〔膜サンプルの作製〕
 実施例1で用いた水性塗布液1を水性塗布液2に変更した以外は実施例1と同様にして膜サンプルを作製した。また、膜サンプルの表面粗さRaを既述の方法により測定したところ、表面粗さRaは20nm以下であった。
[Production of membrane sample]
A film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 2. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.

(比較例1)
〔シリカ分散液1Cの調製〕
 実施例1で用いたシリカの水分散物NALCO(登録商標)8699を、NALCO(登録商標)1030(NALCO社製、固形分15質量%、無孔質シリカ粒子、平均一次粒子径=13nm)に変更した以外は実施例1と同様にして、シリカ分散液1Cを調製した。
(Comparative Example 1)
[Preparation of silica dispersion 1C]
The silica aqueous dispersion NALCO (registered trademark) 8699 used in Example 1 was changed to NALCO (registered trademark) 1030 (manufactured by NALCO, solid content 15% by mass, nonporous silica particles, average primary particle size = 13 nm). A silica dispersion 1C was prepared in the same manner as Example 1 except for the change.

〔水性塗布液3の調製〕
 実施例1で用いたシリカ分散液1Aを、シリカ分散液1Cに変更し、リン酸によりpHを2.3に調整した以外は実施例1と同様にして水性塗布液3を調製した。
[Preparation of aqueous coating solution 3]
An aqueous coating solution 3 was prepared in the same manner as in Example 1 except that the silica dispersion 1A used in Example 1 was changed to the silica dispersion 1C and the pH was adjusted to 2.3 with phosphoric acid.

〔膜サンプルの作製〕
 実施例1で用いた水性塗布液1を水性塗布液3に変更した以外は実施例1と同様にして膜サンプルを作製した。
[Production of membrane sample]
A film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 3.

(比較例2)
〔シリカ分散液1Dおよび水性塗布液4の調製〕
 実施例1におけるシリカ分散液1Aの調整においてpHを1.3に調整した以外は、実施例1と同様にしてシリカ分散液1Dを調製し、シリカ分散液1Aをシリカ分散液1Dに変更した以外は、実施例1と同様に水性塗布液4を調製した。
(Comparative Example 2)
[Preparation of silica dispersion 1D and aqueous coating solution 4]
Except for adjusting the silica dispersion 1A in Example 1 except that the pH was adjusted to 1.3, a silica dispersion 1D was prepared in the same manner as in Example 1, and the silica dispersion 1A was changed to the silica dispersion 1D. Prepared an aqueous coating solution 4 in the same manner as in Example 1.

〔膜サンプルの作製〕
 実施例1で用いた水性塗布液1を水性塗布液4に変更した以外は実施例1と同様にして膜サンプルを作製した。
[Production of membrane sample]
A film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 4.

(比較例3)
〔シリカ分散液1Eおよび水性塗布液5の調製〕
 実施例1におけるシリカ分散液1Aの調製において、pHを3.9に調整した以外は、実施例1と同様にしてシリカ分散液1Eを調製し、シリカ分散液1Aをシリカ分散液1Eに変更した以外は、実施例1と同様にした以外は水性塗布液5を調製した。
(Comparative Example 3)
[Preparation of silica dispersion 1E and aqueous coating solution 5]
In the preparation of the silica dispersion 1A in Example 1, the silica dispersion 1E was prepared in the same manner as in Example 1 except that the pH was adjusted to 3.9, and the silica dispersion 1A was changed to the silica dispersion 1E. An aqueous coating solution 5 was prepared except that the procedure was the same as in Example 1.

〔膜サンプルの作製〕
 実施例1で用いた水性塗布液1を水性塗布液5に変更した以外は実施例1と同様にして膜サンプルを作製した。
[Production of membrane sample]
A film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 5.

(実施例3)
〔膜サンプルの作製〕
 実施例1における焼成条件を、600℃、3分の条件に変更した以外は実施例1と同様にして、膜サンプルを作製した。また、膜サンプルの表面粗さRaを既述の方法により測定したところ、表面粗さRaは20nm以下であった。
(Example 3)
[Production of membrane sample]
A film sample was produced in the same manner as in Example 1 except that the firing conditions in Example 1 were changed to 600 ° C. for 3 minutes. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.

(実施例4)
〔膜サンプルの作製〕
 実施例1における焼成条件を、500℃、3分の条件に変更した以外は実施例1と同様にして、膜サンプルを作製した。また、膜サンプルの表面粗さRaを既述の方法により測定したところ、表面粗さRaは20nm以下であった。
Example 4
[Production of membrane sample]
A film sample was produced in the same manner as in Example 1 except that the firing conditions in Example 1 were changed to 500 ° C. for 3 minutes. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.

(実施例5)
〔膜サンプルの作製〕
 実施例1における焼成条件を、450℃、3分の条件に変更した以外は実施例1と同様にして、膜サンプルを作製した。また、膜サンプルの表面粗さRaを既述の方法により測定したところ、表面粗さRaは20nm以下であった。
(Example 5)
[Production of membrane sample]
A film sample was produced in the same manner as in Example 1 except that the firing conditions in Example 1 were changed to 450 ° C. for 3 minutes. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.

(実施例6)
〔膜サンプルの作製〕
 実施例1における焼成条件を、350℃、3分の条件に変更した以外は実施例1と同様にして、膜サンプルを作製した。また、膜サンプルの表面粗さRaを既述の方法により測定したところ、表面粗さRaは20nm以下であった。
(Example 6)
[Production of membrane sample]
A film sample was produced in the same manner as in Example 1 except that the firing conditions in Example 1 were changed to 350 ° C. for 3 minutes. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.

(比較例4)
〔水性塗布液6の調製〕
 実施例1の水性塗布液1で用いたTRITON BG10を添加しなかったこと及びpHを2.3に調整したこと以外は実施例1と同様にして水性塗布液6を調製した。
(Comparative Example 4)
[Preparation of aqueous coating solution 6]
An aqueous coating solution 6 was prepared in the same manner as in Example 1 except that the TRITON BG10 used in the aqueous coating solution 1 of Example 1 was not added and the pH was adjusted to 2.3.

〔膜サンプルの作製〕
 実施例1で用いた水性塗布液1を水性塗布液6に変更した以外は実施例1と同様にして膜サンプルを作製した。膜サンプルの最終的な膜厚は、190nmになるようにした。
[Production of membrane sample]
A membrane sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 6. The final film thickness of the film sample was 190 nm.

(比較例5)
〔シリカ分散液2Aの調製(2種類のシリカを含有する分散液)〕
 脱イオン水8.90gに、シリカの水分散物NALCO(登録商標)8699((NALCO社製、固形分15質量%、無孔質シリカ粒子、平均一次粒子径=3nm)2.91gを添加し撹拌して得られた溶液にリン酸を滴下し、pHを1.5~2.0に調整して第1の分散液を調製した。
 次に、脱イオン水9.5gに、SNOWTEX(登録商標)-UP(日産化学工業(株)製、固形分20質量%、数珠状(鎖状)シリカ粒子)3.2gを添加し攪拌して得られた混合物に0.1×10mol/Lの水酸化ナトリウムを滴下し、pHを約12に調整した。その後、エタノール0.8g中のアミノエチルアミノプロピルトリメトキシシラン(東レ・ダウコーニング(株)製、Z-6020)0.01gを滴下し、これをpH約12に調整した混合物と混ぜ、14時間撹拌し、第2の分散液を調製した。
 第1の分散液と第2の分散液とを混合し、シリカ分散液2Aを得た。
(Comparative Example 5)
[Preparation of silica dispersion 2A (dispersion containing two types of silica)]
To 8.90 g of deionized water, 2.91 g of an aqueous dispersion NALCO (registered trademark) 8699 of silica (manufactured by NALCO, solid content 15% by mass, nonporous silica particles, average primary particle size = 3 nm) was added. Phosphoric acid was added dropwise to the solution obtained by stirring to adjust the pH to 1.5 to 2.0 to prepare a first dispersion.
Next, 3.2 g of SNOWEX (registered trademark) -UP (manufactured by Nissan Chemical Industries, Ltd., solid content 20 mass%, beaded (chain) silica particles) is added to 9.5 g of deionized water and stirred. 0.1 × 10 3 mol / L sodium hydroxide was added dropwise to the resulting mixture to adjust the pH to about 12. Thereafter, 0.01 g of aminoethylaminopropyltrimethoxysilane (Z-6020, manufactured by Toray Dow Corning Co., Ltd.) in 0.8 g of ethanol was added dropwise, and this was mixed with a mixture adjusted to a pH of about 12 for 14 hours. Stir to prepare a second dispersion.
The first dispersion and the second dispersion were mixed to obtain a silica dispersion 2A.

〔水性塗布液7の調製〕
 シリカ分散液2Aに、脱イオン水12g、エタノール0.26g、及びTRITON BG10の10質量%水溶液0.56gを添加し、水性塗布液7(固形分2.82質量%)を調製した。なお、水性塗布液7のpHは、2.6であった。
[Preparation of aqueous coating solution 7]
To silica dispersion 2A, 12 g of deionized water, 0.26 g of ethanol, and 0.56 g of a 10 mass% aqueous solution of TRITON BG10 were added to prepare aqueous coating liquid 7 (solid content 2.82 mass%). The pH of the aqueous coating solution 7 was 2.6.

〔膜サンプルの作製〕
 実施例1で用いた水性塗布液1を水性塗布液7に変更した以外は実施例1と同様にして膜サンプルを作製した。膜サンプルの最終的な膜厚は、170nmになるようにした。
[Production of membrane sample]
A film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 7. The final film thickness of the film sample was set to 170 nm.

(比較例6)
〔シリカ分散液2Bの調製(2種類のシリカを含有する分散液)〕
 脱イオン水3.5gに、シリカの水分散物NALCO(登録商標)8699(NALCO社製、固形分15質量%、無孔質シリカ粒子、平均一次粒子径=3nm)0.71gを添加し撹拌して得られた溶液にリン酸を滴下し、pHを1.5~2.0に調整して第1の分散液を調製した。
 次に、脱イオン水15.1gに、SNOWTEX(登録商標)-UP(日産化学工業(株)製、固形分20質量%、数珠状(鎖状)シリカ粒子)5.0gを添加し攪拌して得られた混合物に0.1×10mol/Lの水酸化ナトリウムを滴下し、pHを約12に調整した。その後、エタノール1.3g中のアミノエチルアミノプロピルトリメトキシシラン(東レ・ダウコーニング(株)製、Z-6020)0.0015gを滴下し、これをpH約12に調整した混合物と混ぜ、14時間撹拌し、第2の分散液を調製した。
 第1の分散液と第2の分散液とを混合し、シリカ分散液2Bを得た。
(Comparative Example 6)
[Preparation of silica dispersion 2B (dispersion containing two types of silica)]
To 3.5 g of deionized water, 0.71 g of silica dispersion NALCO (registered trademark) 8699 (manufactured by NALCO, solid content 15% by mass, nonporous silica particles, average primary particle size = 3 nm) was added and stirred. Then, phosphoric acid was added dropwise to the resulting solution to adjust the pH to 1.5 to 2.0 to prepare a first dispersion.
Next, 5.0 g of SNOWEX (registered trademark) -UP (manufactured by Nissan Chemical Industries, Ltd., solid content 20 mass%, beaded (chain) silica particles) is added to 15.1 g of deionized water and stirred. 0.1 × 10 3 mol / L sodium hydroxide was added dropwise to the resulting mixture to adjust the pH to about 12. Thereafter, 0.0015 g of aminoethylaminopropyltrimethoxysilane (manufactured by Toray Dow Corning Co., Ltd., Z-6020) in 1.3 g of ethanol was added dropwise, and this was mixed with a mixture adjusted to a pH of about 12 for 14 hours. Stir to prepare a second dispersion.
The first dispersion and the second dispersion were mixed to obtain silica dispersion 2B.

〔水性塗布液8の調製〕
 シリカ分散液2Bに、脱イオン水12g、及びTRITON BG10の10質量%水溶液0.56gを添加することで、水性塗布液8(固形分2.90質量%)を調製した。水性塗布液8のpHは8.8であった。
[Preparation of aqueous coating solution 8]
Aqueous coating solution 8 (solid content 2.90% by mass) was prepared by adding 12 g of deionized water and 0.56 g of a 10% by mass aqueous solution of TRITON BG10 to silica dispersion 2B. The pH of the aqueous coating solution 8 was 8.8.

〔膜サンプルの作製〕
 実施例1で用いた水性塗布液1を水性塗布液8に変更した以外は実施例1と同様にして膜サンプルを作製した。膜サンプルの最終的な膜厚は、180nmになるようにした。
[Production of membrane sample]
A film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 8. The final film thickness of the film sample was 180 nm.

(比較例7)
〔シリカ分散液2Cの調製(1種類のシリカを含有した分散液、数珠状シリカのみ)〕
 脱イオン水15.9gに、SNOWTEX(登録商標)-UP(日産化学工業(株)製、固形分20質量%、数珠状(鎖状)シリカ粒子)5.3gを添加し攪拌して得られた混合物に0.1×10mol/Lの水酸化ナトリウムを滴下し、pHを約12に調整した。その後、エタノール1.3g中のアミノエチルアミノプロピルトリメトキシシラン(東レ・ダウコーニング(株)製、Z-6020)0.0016gを滴下し、これをpH約12に調整した混合物と混ぜ、14時間撹拌し、シリカ分散液2Cを調製した。
(Comparative Example 7)
[Preparation of Silica Dispersion 2C (Dispersion containing one kind of silica, beaded silica only)]
It is obtained by adding 5.3 g of SNOWEX (registered trademark) -UP (Nissan Chemical Industry Co., Ltd., solid content 20 mass%, beaded (chain) silica particles) to 15.9 g of deionized water and stirring. 0.1 × 10 3 mol / L sodium hydroxide was added dropwise to the mixture to adjust the pH to about 12. Thereafter, 0.0016 g of aminoethylaminopropyltrimethoxysilane (manufactured by Toray Dow Corning Co., Ltd., Z-6020) in 1.3 g of ethanol was added dropwise, and this was mixed with a mixture adjusted to a pH of about 12 for 14 hours. Stir to prepare silica dispersion 2C.

〔水性塗布液9の調製〕
 シリカ分散液2Cに、脱イオン水15.1g、及びTRITON BG10の10質量%水溶液0.56gを添加し、水性塗布液9(固形分2.78質量%)を調製した。水性塗布液9のpHは9.3であった。
[Preparation of aqueous coating solution 9]
To silica dispersion 2C, 15.1 g of deionized water and 0.56 g of a 10 mass% aqueous solution of TRITON BG10 were added to prepare an aqueous coating liquid 9 (solid content: 2.78 mass%). The pH of the aqueous coating solution 9 was 9.3.

〔膜サンプルの作製〕
 実施例1で用いた水性塗布液1を水性塗布液9に変更した以外は実施例1と同様にして膜サンプルを作製した。膜サンプルの最終的な膜厚は、195nmになるようにした。
[Production of membrane sample]
A film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 9. The final film thickness of the film sample was 195 nm.

(比較例8)
〔シリカ分散液3Aの準備(1種類のシリカを含有した分散液、数珠状シリカのみ)〕
 SNOWTEX(登録商標)-OXS(日産化学工業(株)製、固形分10質量%、数珠状(鎖状)シリカ粒子)をシリカ分散液3Aとして用いた。
(Comparative Example 8)
[Preparation of silica dispersion 3A (dispersion containing one kind of silica, only beaded silica)]
SNWTEX (registered trademark) -OXS (manufactured by Nissan Chemical Industries, Ltd., solid content 10 mass%, beaded (chain) silica particles) was used as the silica dispersion 3A.

〔水性塗布液10の調製〕
 脱イオン水17.8gに、エタノール5.15g、アルミニウムビス(エチルアセトアセテート)モノ(アセチルアセトネート)の1質量%エタノール溶液0.60g、ポリエチレングリコールモノラウリルエーテル(エチレンオキサイド部の繰り返し数15)の0.5質量%水溶液0.94g、ジ(2-エチルヘキシル)スルホコハク酸ナトリウムの0.2質量%水溶液0.43g、及びSNOWTEX(登録商標)-OXS(日産化学工業(株)製、固形分10質量%、数珠状(鎖状)シリカ粒子)5.04gを添加し攪拌することで、水性塗布液10(固形分1.68質量%)を調製した。
[Preparation of aqueous coating solution 10]
17.8 g of deionized water, 5.15 g of ethanol, 0.60 g of 1% ethanol solution of aluminum bis (ethylacetoacetate) mono (acetylacetonate), polyethylene glycol monolauryl ether (the number of repetitions of ethylene oxide part 15) 0.94 g of 0.5% by weight aqueous solution, 0.43 g of 0.2% by weight aqueous sodium di (2-ethylhexyl) sulfosuccinate, and SNOWTEX (registered trademark) -OXS (manufactured by Nissan Chemical Industries, Ltd., solid content) Aqueous coating solution 10 (solid content 1.68% by mass) was prepared by adding 5.04 g of 10% by mass, beaded (chain) silica particles) and stirring.

〔膜サンプルの作製〕
 実施例1で用いた水性塗布液1を水性塗布液10に変更した以外は実施例1と同様にして膜サンプルを作製した。膜サンプルの最終的な膜厚は、200nmになるようにした。
[Production of membrane sample]
A film sample was prepared in the same manner as in Example 1 except that the aqueous coating solution 1 used in Example 1 was changed to the aqueous coating solution 10. The final film thickness of the film sample was set to 200 nm.

-膜サンプルの評価-
 上記で得られた各膜サンプルについて、反射防止(AR:Anti Reflection)性、耐傷性、防汚性、及び面状を評価した。評価結果は、下記表1に示す。
-Evaluation of membrane samples-
Each film sample obtained above was evaluated for antireflection (AR), scratch resistance, antifouling property, and surface shape. The evaluation results are shown in Table 1 below.

[反射防止(AR)性]
 紫外可視赤外分光光度計(日本分光(株)製、V-670)により、各膜サンプルの波長400nm~1100nmの光における反射率を、積分球を用いて測定した。
 反射率測定の際、膜サンプルを有するガラス基材の裏面(ガラス基材の膜が形成されていない側の面)の反射を抑えるため、裏面のガラス基材表面に黒色のテープを貼り付けた。測定により得られた波長400~1100nmにおけるそれぞれの波長の反射率から平均反射率を算出し、膜が形成されていないガラス基材に対する平均反射率の変化の絶対値(|ΔR|)を下記式(1)に従い算出した。なお、|ΔR|は数値が高いほど反射防止(AR)性に優れる。
 
|平均反射率変化ΔR|=|R - R| 式(1)
 式(1)中、Rは膜形成後の基材の平均反射率を表し、Rは基材の平均反射率を表す。
 
[Antireflection (AR) properties]
The reflectance of each film sample with light having a wavelength of 400 nm to 1100 nm was measured using an integrating sphere with an ultraviolet-visible infrared spectrophotometer (manufactured by JASCO Corporation, V-670).
At the time of reflectance measurement, a black tape was attached to the glass substrate surface on the back surface in order to suppress reflection on the back surface of the glass substrate having the film sample (the surface on which the glass substrate film was not formed). . The average reflectance is calculated from the reflectance of each wavelength at wavelengths of 400 to 1100 nm obtained by measurement, and the absolute value (| ΔR |) of the change in average reflectance with respect to the glass substrate on which no film is formed is expressed by the following formula: Calculated according to (1). In addition, | ΔR | is superior in antireflection (AR) property as the numerical value is higher.

| Average reflectance change ΔR | = | R 1 −R 2 | Formula (1)
In formula (1), R 1 represents the average reflectance of the substrate after film formation, and R 2 represents the average reflectance of the substrate.

[耐傷性1]
 温度25℃、相対湿度55%の環境条件においてラビングテスタを用い、膜サンプルの膜面をスチールウール(♯0000、日本スチールウール(株)製)に50gの荷重をかけて、速度1000mm/minで10回往復摩擦した後の膜表面を目視で観察し、以下の評価基準にしたがって耐傷性を評価した。なお、耐傷性1はA~Cが許容範囲である。
[Scratch resistance 1]
Using a rubbing tester under environmental conditions of a temperature of 25 ° C. and a relative humidity of 55%, the membrane surface of the membrane sample was subjected to a load of 50 g on steel wool (# 0000, manufactured by Nippon Steel Wool Co., Ltd.) at a speed of 1000 mm / min. The film surface after 10 reciprocating frictions was visually observed, and scratch resistance was evaluated according to the following evaluation criteria. The scratch resistance 1 is within an allowable range from A to C.

-評価基準-
A : 膜表面に傷が全く見えない。
B : 膜表面に傷は確認されないが、わずかに跡が確認された。
C : 膜表面に傷が確認され、傷の数が1本~20本である。
D : 膜表面に傷が確認され、傷の数が21本以上である。
-Evaluation criteria-
A: No scratches are visible on the film surface.
B: Scratches were not confirmed on the film surface, but a slight trace was confirmed.
C: Scratches are confirmed on the film surface, and the number of scratches is 1 to 20.
D: Scratches are confirmed on the film surface, and the number of scratches is 21 or more.

[防汚性]
 天然黄土顔料(ホルベイン社製)を、膜サンプルの膜上に一様に散布して付着させた後、膜サンプルの裏面を叩き、付着した天然黄土顔料を落とした。この作業を20回繰り返した。その後、天然黄土顔料の付着状態を目視で確認し、下記の評価基準にしたがって防汚性を評価した。なお、防汚性はA~Cが許容範囲である。
[Anti-fouling]
A natural ocher pigment (manufactured by Holbein Co., Ltd.) was uniformly dispersed on the membrane of the membrane sample and adhered, and then the back surface of the membrane sample was struck to remove the attached natural ocher pigment. This operation was repeated 20 times. Thereafter, the adhesion state of the natural ocher pigment was visually confirmed, and the antifouling property was evaluated according to the following evaluation criteria. The antifouling property is in an allowable range from A to C.

-評価基準-
A : 膜サンプル表面には天然黄土顔料が付着せず、無色透明である。
B : 膜サンプル表面に僅かに天然黄土顔料が付着したが、ほぼ無色透明である。
C : 膜サンプル表面の全面に天然黄土顔料が付着し、目視で透明性の低下が確認できる。
D : 膜サンプル表面の全面に天然黄土顔料が付着し、ほぼ不透明である。
-Evaluation criteria-
A: The natural ocher pigment does not adhere to the surface of the membrane sample and is colorless and transparent.
B: Natural ocher pigment slightly adhered to the surface of the membrane sample, but is almost colorless and transparent.
C: Natural ocher pigment adheres to the entire surface of the membrane sample, and a decrease in transparency can be confirmed visually.
D: Natural ocher pigment adheres to the entire surface of the membrane sample and is almost opaque.

[面状]
 膜サンプルの表面を目視により観察し、下記の評価基準にしたがって面状を評価した。
-評価基準-
良好:干渉ムラがわずかに見られ、ハジキが10個/100cm未満である。
不良:干渉ムラがはっきり確認され、ハジキが10個/100cm以上である。
[Surface]
The surface of the film sample was visually observed, and the surface condition was evaluated according to the following evaluation criteria.
-Evaluation criteria-
Good: Interference unevenness is slightly seen and repellency is less than 10 pieces / 100 cm 2 .
Defect: Interference unevenness is clearly confirmed, and repellency is 10/100 cm 2 or more.

Figure JPOXMLDOC01-appb-T000001

 
Figure JPOXMLDOC01-appb-T000001

 

 表1より、実施例の膜サンプルにおいて、反射防止性、耐傷性、防汚性、及び面状のいずれも優れることがわかる。 From Table 1, it can be seen that the film samples of the examples are excellent in antireflection properties, scratch resistance, antifouling properties, and surface properties.

(実施例7)
[膜サンプルの作製]
 実施例1における水性塗布液1を、ガラス基材上にバーコーターを用いて塗布し塗布膜を形成した。この塗布膜をオーブンにより150℃、1分間の条件で乾燥させ、焼成を行わずに膜サンプルとした。膜サンプルの最終的な膜厚は、190nmになるようにした。また、膜サンプルの表面粗さRaを既述の方法により測定したところ、表面粗さRaは20nm以下であった。
(Example 7)
[Membrane sample preparation]
The aqueous coating solution 1 in Example 1 was coated on a glass substrate using a bar coater to form a coating film. This coating film was dried in an oven at 150 ° C. for 1 minute to obtain a film sample without firing. The final film thickness of the film sample was 190 nm. Moreover, when the surface roughness Ra of the film sample was measured by the method described above, the surface roughness Ra was 20 nm or less.

(比較例9)
 比較例8における水性塗布液10を、ガラス基材上にバーコーターを用いて塗布し塗布膜を形成した。この塗布膜をオーブンにより150℃、1分間の条件で乾燥させ、焼成を行わずに膜サンプルとした。膜サンプルの最終的な膜厚は、175nmになるようにした。
(Comparative Example 9)
The aqueous coating solution 10 in Comparative Example 8 was coated on a glass substrate using a bar coater to form a coating film. This coating film was dried in an oven at 150 ° C. for 1 minute to obtain a film sample without firing. The final film thickness of the film sample was 175 nm.

 実施例7及び比較例9について、実施例1と同様に、反射防止性、防汚性、及び面状の評価を行った。評価結果は、下記表2に示す。
 また、耐傷性は、以下の耐傷性2の方法で評価した。
About Example 7 and Comparative Example 9, as in Example 1, evaluation of antireflection property, antifouling property, and surface condition was performed. The evaluation results are shown in Table 2 below.
The scratch resistance was evaluated by the following scratch resistance 2 method.

[耐傷性2]
 温度25℃、相対湿度55%の環境条件においてラビングテスタを用い、膜サンプルの膜面をスチールウール(♯0000、日本スチールウール(株)製)に20gの荷重をかけて、速度1000mm/minで10回往復摩擦した後の膜表面を目視で観察し、以下の評価基準にしたがって耐傷性を評価した。なお、耐傷性2はA~Cが許容範囲である。
[Scratch resistance 2]
Using a rubbing tester under environmental conditions of a temperature of 25 ° C. and a relative humidity of 55%, the membrane surface of the membrane sample was subjected to a load of 20 g on steel wool (# 0000, manufactured by Nippon Steel Wool Co., Ltd.) at a speed of 1000 mm / min. The film surface after 10 reciprocating frictions was visually observed, and scratch resistance was evaluated according to the following evaluation criteria. The scratch resistance 2 is within an allowable range from A to C.

-評価基準-
A : 膜表面に傷が全く見えない。
B : 膜表面に傷は確認されないが、わずかに跡が確認された。
C : 膜表面に傷が確認され、傷の数が1本~20本である。
D : 膜表面に傷が確認され、傷の数が21本以上である。
-Evaluation criteria-
A: No scratches are visible on the film surface.
B: Scratches were not confirmed on the film surface, but a slight trace was confirmed.
C: Scratches are confirmed on the film surface, and the number of scratches is 1 to 20.
D: Scratches are confirmed on the film surface, and the number of scratches is 21 or more.

Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002

 表2より、実施例7では反射防止性が良好な膜サンプルが得られており、さらに比較例9との比較において、実施例7の膜サンプルは耐傷性に優れることがわかる。 From Table 2, it can be seen that a film sample having good antireflection properties was obtained in Example 7, and that the film sample of Example 7 was excellent in scratch resistance in comparison with Comparative Example 9.

 2014年11月6日に出願された日本国特許出願2014-226401号の開示はその全体が参照により本明細書に取り込まれる。
 本明細書に記載された全ての文献、特許出願、及び技術規格は、個々の文献、特許出願、及び技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書に参照により取り込まれる。
The disclosure of Japanese Patent Application No. 2014-226401 filed on November 6, 2014 is incorporated herein by reference in its entirety.
All documents, patent applications, and technical standards mentioned in this specification are to the same extent as if each individual document, patent application, and technical standard were specifically and individually stated to be incorporated by reference, Incorporated herein by reference.

Claims (15)

 基材上に、水と、シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子と、界面活性剤と、を含み、pHが1.5~3.5である水性塗布液を塗布して塗布膜を形成する工程と、
 塗布形成された塗布膜を乾燥する工程と、
を含む膜の製造方法。
An aqueous coating having a pH of 1.5 to 3.5, comprising water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as a silica particle, and a surfactant. Applying a liquid to form a coating film;
A step of drying the coating film formed by coating;
The manufacturing method of the film | membrane containing this.
 前記pHが1.8~3.0である請求項1に記載の膜の製造方法。 The method for producing a film according to claim 1, wherein the pH is 1.8 to 3.0.  前記塗布膜を乾燥する工程の後、さらに、乾燥後の塗布膜を400℃以上800℃以下の温度で焼成する工程を含む請求項1又は請求項2に記載の膜の製造方法。 The method for producing a film according to claim 1 or 2, further comprising a step of baking the dried coated film at a temperature of 400 ° C or higher and 800 ° C or lower after the step of drying the coated film.  前記焼成する工程は、焼成により、複数の無孔質シリカ粒子が連結された粒子連結体を形成する請求項3に記載の膜の製造方法。 The method for producing a film according to claim 3, wherein in the firing step, a particle connected body in which a plurality of nonporous silica particles are connected is formed by firing.  焼成後の前記塗布膜は、膜厚が50nm以上350nm以下である請求項3又は請求項4に記載の膜の製造方法。 The method for producing a film according to claim 3 or 4, wherein the coating film after baking has a film thickness of 50 nm or more and 350 nm or less.  少なくとも乾燥後の前記塗布膜は、下記式(1)で定義される、波長400nm~1100nmの光における5°入射時の平均反射率変化ΔRの絶対値が、2.0%以上である請求項1~請求項5のいずれか1項に記載の膜の製造方法。
 
|平均反射率変化ΔR|=|R - R| 式(1)
 式(1)中、Rは膜形成後の基材の平均反射率を表し、Rは基材の平均反射率を表す。
At least the coating film after drying has an absolute value of an average reflectance change ΔR at 2.0 ° incident on light having a wavelength of 400 nm to 1100 nm defined by the following formula (1): 2.0% or more. The method for producing a film according to any one of claims 1 to 5.

| Average reflectance change ΔR | = | R 1 −R 2 | Formula (1)
In formula (1), R 1 represents the average reflectance of the substrate after film formation, and R 2 represents the average reflectance of the substrate.
 水と、シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子と、界面活性剤と、を含み、pHが1.5~3.5である水性塗布液。 An aqueous coating solution containing water, one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles, and a surfactant, and having a pH of 1.5 to 3.5.  前記平均一次粒子径が6nm以下である請求項7に記載の水性塗布液。 The aqueous coating solution according to claim 7, wherein the average primary particle size is 6 nm or less.  前記pHが1.8~3.0である請求項7又は請求項8に記載の水性塗布液。 The aqueous coating solution according to claim 7 or 8, wherein the pH is 1.8 to 3.0.  シリカ粒子として平均一次粒子径が8nm以下の1種類の無孔質シリカ粒子を含有し、膜厚が50nm以上350nm以下である膜。 A film containing one kind of nonporous silica particles having an average primary particle diameter of 8 nm or less as silica particles and a film thickness of 50 nm or more and 350 nm or less.  下記式(1)で定義される、波長400nm~1100nmの光における5°入射時の平均反射率変化ΔRの絶対値が、2.0%以上である請求項10に記載の膜。
 
|平均反射率変化ΔR|=|R - R| 式(1)
 式(1)中、Rは膜形成後の基材の平均反射率を表し、Rは基材の平均反射率を表す。
The film according to claim 10, wherein the absolute value of the average reflectance change ΔR at 5 ° incidence with light having a wavelength of 400 nm to 1100 nm defined by the following formula (1) is 2.0% or more.

| Average reflectance change ΔR | = | R 1 −R 2 | Formula (1)
In formula (1), R 1 represents the average reflectance of the substrate after film formation, and R 2 represents the average reflectance of the substrate.
 前記無孔質シリカ粒子は、複数の無孔質シリカ粒子が連結した粒子連結体の状態として含有する請求項10又は請求項11に記載の膜。 The membrane according to claim 10 or 11, wherein the nonporous silica particles are contained as a state of a particle connected body in which a plurality of nonporous silica particles are connected.  さらに、界面活性剤を含有する請求項10又は請求項11に記載の膜。 Furthermore, the film | membrane of Claim 10 or Claim 11 containing surfactant.  基材上に、請求項1~請求項6のいずれか1項に記載の製造方法により製造された膜、又は請求項10~請求項13のいずれか1項に記載の膜を有する積層体。 A laminate having the film produced by the production method according to any one of claims 1 to 6 or the film according to any one of claims 10 to 13 on a substrate.  請求項14に記載の積層体を備えた太陽電池モジュール。 A solar cell module comprising the laminate according to claim 14.
PCT/JP2015/081383 2014-11-06 2015-11-06 Aqueous coating solution, film and manufacturing method therefor, laminate, and solar cell module Ceased WO2016072509A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201580056689.2A CN107073520A (en) 2014-11-06 2015-11-06 Aqueous coating fluid, film and its manufacture method, layered product and solar module

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014226401A JP2016087561A (en) 2014-11-06 2014-11-06 Aqueous coating liquid, film, production method of the same, laminate and solar cell module
JP2014-226401 2014-11-06

Publications (1)

Publication Number Publication Date
WO2016072509A1 true WO2016072509A1 (en) 2016-05-12

Family

ID=55909232

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2015/081383 Ceased WO2016072509A1 (en) 2014-11-06 2015-11-06 Aqueous coating solution, film and manufacturing method therefor, laminate, and solar cell module

Country Status (3)

Country Link
JP (1) JP2016087561A (en)
CN (1) CN107073520A (en)
WO (1) WO2016072509A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018185865A1 (en) * 2017-04-04 2018-10-11 パンサーフェス株式会社 Hydrophilicity-imparting agent, hydrophilic coating film forming method, hydrophilic coating film, and solar panel
KR102119717B1 (en) 2020-03-17 2020-06-08 주식회사 나온씨에스 Coating Method and Apparatus for Outdoor Environment to Prevent Contamination of Photovoltaic Modules

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011521776A (en) * 2008-05-16 2011-07-28 スリーエム イノベイティブ プロパティズ カンパニー Silica coating to increase hydrophilicity / permeability
JP2013527879A (en) * 2010-05-11 2013-07-04 スリーエム イノベイティブ プロパティズ カンパニー Article, coating composition, and method
WO2013127054A1 (en) * 2012-02-27 2013-09-06 3M Innovative Properties Company Basic compositions including inorganic oxide nanoparticles and an organic base, coated substrates, articles, and methods
JP2013544670A (en) * 2010-10-06 2013-12-19 スリーエム イノベイティブ プロパティズ カンパニー Antireflective article having nanosilica-based coating

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080032053A1 (en) * 2006-08-04 2008-02-07 Kostantinos Kourtakis Low refractive index composition
JP5165114B2 (en) * 2009-07-08 2013-03-21 三菱電機株式会社 SOLAR CELL MODULE COATING AGENT, SOLAR CELL MODULE AND ITS MANUFACTURING METHOD

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011521776A (en) * 2008-05-16 2011-07-28 スリーエム イノベイティブ プロパティズ カンパニー Silica coating to increase hydrophilicity / permeability
JP2013527879A (en) * 2010-05-11 2013-07-04 スリーエム イノベイティブ プロパティズ カンパニー Article, coating composition, and method
JP2013544670A (en) * 2010-10-06 2013-12-19 スリーエム イノベイティブ プロパティズ カンパニー Antireflective article having nanosilica-based coating
WO2013127054A1 (en) * 2012-02-27 2013-09-06 3M Innovative Properties Company Basic compositions including inorganic oxide nanoparticles and an organic base, coated substrates, articles, and methods

Also Published As

Publication number Publication date
JP2016087561A (en) 2016-05-23
CN107073520A (en) 2017-08-18

Similar Documents

Publication Publication Date Title
CN105765015B (en) Aqueous coating agent, film, the manufacturing method of film, laminated body and solar cell module
US10208223B2 (en) Fluoropolymer coatings comprising aziridine compounds
CN102241899B (en) Coating composition, method for modifying matrix surface, and product
JP6813553B2 (en) A coating composition and a coating layer comprising the coating composition that enhances light transmittance.
CN103154152B (en) Coating composition and its preparation and application
CN110225949B (en) Coating composition, antireflection film, method for producing the same, laminate, and solar cell module
US12162794B2 (en) Glass sheet with porous coating film and method of producing same
CN108698918A (en) The manufacturing method of laminated body, the glass with antireflection film and solar cell module
CN109401367B (en) A highly durable superhydrophilic coating
JP6348276B2 (en) Coating liquid for forming antireflection film, substrate with antireflection film, production method thereof, and use thereof
JP2018058914A (en) Composition for porous film formation, method for producing composition for porous film formation, method for producing porous film, laminate, and solar cell module
WO2016072509A1 (en) Aqueous coating solution, film and manufacturing method therefor, laminate, and solar cell module
WO2016056489A1 (en) Antifouling layer-equipped laminate, protective material for surveillance camera, and surveillance camera
WO2017150393A1 (en) Aqueous coating composition, anti-reflection film, laminate, method for producing laminate, and solar cell module
WO2018163929A1 (en) Low-refractive-index film-forming liquid composition and method of forming low-refractive-index film using same
JP2012148952A (en) Coating solution for formation of low-reflective film, method for preparation thereof, and low-reflective member produced by using the same
CN110669362A (en) A kind of anti-reflection coating and its preparation method and use
US20240302571A1 (en) Method of producing single layer omnidirectional broadband antireflective and super hydrophilic (antifogging) coatings for solar and other applications
JPWO2019065772A1 (en) Coating composition, laminate, solar cell module, and method for producing laminate
CN110386761A (en) A kind of super-hydrophobic anti-reflection with high transparency penetrates the preparation method of coating
WO2016103827A1 (en) Aqueous coating liquid, film and method for producing same, laminate, and solar cell module
WO2017022433A1 (en) Aqueous coating liquid, film and method for producing same, laminate, and solar cell module
KR100777607B1 (en) Coating composition
JP2012150425A (en) Coating liquid for forming low reflective film, preparation method for the same and low reflective member using the same
JPWO2019167414A1 (en) Water-based coating material, film and its manufacturing method, laminate and its manufacturing method, and water-based coating material kit

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 15857234

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 15857234

Country of ref document: EP

Kind code of ref document: A1