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WO2016048118A1 - Uv-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby - Google Patents

Uv-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby Download PDF

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Publication number
WO2016048118A1
WO2016048118A1 PCT/KR2015/010344 KR2015010344W WO2016048118A1 WO 2016048118 A1 WO2016048118 A1 WO 2016048118A1 KR 2015010344 W KR2015010344 W KR 2015010344W WO 2016048118 A1 WO2016048118 A1 WO 2016048118A1
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WO
WIPO (PCT)
Prior art keywords
ink composition
curable ink
bezel pattern
ultraviolet curable
display substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2015/010344
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French (fr)
Korean (ko)
Inventor
박성은
구용성
백승아
김준형
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Chem Ltd
Original Assignee
LG Chem Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Chem Ltd filed Critical LG Chem Ltd
Priority to US15/501,398 priority Critical patent/US10414925B2/en
Priority to CN201580037599.9A priority patent/CN106536644B/en
Priority claimed from KR1020150138097A external-priority patent/KR101782217B1/en
Publication of WO2016048118A1 publication Critical patent/WO2016048118A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements

Definitions

  • the present invention relates to an ultraviolet curable ink composition, a method of manufacturing a bezel pattern of a display substrate using the same, and a bezel pattern manufactured thereby.
  • a method of forming a bezel pattern on a substrate is used instead of using a separate bezel structure.
  • a photolithography method or a screen printing method is used to form a bezel pattern.
  • a manufacturing cost for forming a pattern is expensive and the process is complicated.
  • the thickness of the formed pattern is increased to several tens of micrometers due to the high viscosity of the composition, which results in a step between the pattern forming portion and the pattern non-forming portion.
  • the bezel portion having a color such as white or gold in addition to the black color is used to form the bezel portion by using a method of overcoating several times to obtain an optical density of an appropriate level.
  • the level difference between the pattern forming portion and the non-forming portion increases.
  • the present invention when cured by forming a bezel pattern using a UV curable ink composition having a small taper angle, a thin film thickness and a high adhesion to the film coated with the adhesive, bubble generation and film
  • An object of the present invention is to provide a method of manufacturing a bezel pattern to minimize the release of the bezel pattern, and a display substrate including the same.
  • This invention contains surfactant containing a coloring agent, an epoxy resin, an oxetane resin, a photoinitiator, and a polar functional group,
  • the content ratio of the said epoxy resin: oxetane resin is 1: 0.5-1: 6, and glass after hardening
  • the adhesive force to the substrate is 4B or more according to ASTM D3359 standard, the contact angle to the glass substrate is less than 10 °, and provides an ultraviolet curable ink composition having an adhesive force with the substrate coated with an adhesive layer after curing is 100 ⁇ 5000gf / 25mm.
  • the present invention using the ultraviolet curable ink composition, forming a bezel pattern on a substrate; And hardening the bezel pattern; provides a method of manufacturing a bezel pattern for a display substrate comprising a.
  • this invention provides the bezel pattern for display substrates which the said ultraviolet curable ink composition hardened
  • a bezel pattern is formed by using an ultraviolet curable ink composition which exhibits a small taper angle and a thin film thickness when cured.
  • an ultraviolet curable ink composition which exhibits a small taper angle and a thin film thickness when cured.
  • the bezel pattern manufacturing method of the present invention by using a UV curable ink composition comprising a surfactant containing a polar functional group, the prepared bezel pattern is excellent in adhesion and coating property to the glass substrate, it is attached to the bezel film and the top Excellent adhesion to the substrate.
  • This invention contains surfactant containing a coloring agent, an epoxy resin, an oxetane resin, a photoinitiator, and a polar functional group,
  • the content ratio of the said epoxy resin: oxetane resin is 1: 0.5-1: 6, and glass after hardening It provides an ultraviolet curable ink composition in which the adhesion to the substrate is 4B or higher in the ASTM D3359 standard, the contact angle to the glass substrate is less than 10 °, and the adhesion between the bezel film and the substrate attached to the top is 100 to 5000 gf / 25mm.
  • the ultraviolet curable ink composition of the present invention may further include any one or more selected from the group consisting of adhesion promoters, colorants and photosensitizers.
  • a radically polymerizable resin and a cationic polymerizable resin may be mainly used in the ultraviolet curable ink composition.
  • the radically polymerizable resin is not suitable for curing the thin film because it is impaired in curing due to oxygen, and is not suitable for bezel pattern formation due to its low adhesion to the glass substrate because of its large shrinkage.
  • cationic polymerization type resin it is generally advantageous to cure the thin film because the curing shrinkage rate is low and the influence by oxygen is small.
  • the ultraviolet curable ink composition used by this invention contains an epoxy resin as a cationic curing component.
  • the epoxy resin is selected from a bisphenol type epoxy resin, a novolak type epoxy resin, a glycidyl ester type epoxy resin, a glycidyl amine type epoxy resin, a linear aliphatic epoxy resin, a biphenyl type epoxy resin, and an alicyclic epoxy compound. It may be one kind or a mixture of two kinds.
  • the alicyclic epoxy compound may mean a compound including at least one epoxidized aliphatic ring group.
  • the epoxidized aliphatic ring group means an epoxy group bonded to an alicyclic ring, for example, a 3,4-epoxycyclopentyl group, 3,4-epoxy Cyclohexyl group, 3,4-epoxycyclopentylmethyl group, 3,4-epoxycyclohexylmethyl group, 2- (3,4-epoxycyclopentyl) ethyl group, 2- (3,4-epoxycyclohexyl) ethyl group, 3- Functional groups, such as a (3, 4- epoxycyclo petyl) propyl group or 3- (3, 4- epoxy cyclohexyl) propyl group, can be illustrated.
  • the hydrogen atom constituting the alicyclic ring in the above may be optionally substituted with a substituent such as an alkyl group.
  • a substituent such as an alkyl group.
  • the content of the epoxy resin is preferably 5 to 50% by weight, more preferably 10 to 30% by weight based on the total weight of the ultraviolet curable ink composition. When it exceeds 50 weight%, coating property will fall, and when it is less than 5 weight%, a sensitivity will fall.
  • the ultraviolet curable ink composition contains an oxetane resin as another cationically polymerizable monomer.
  • the oxetane resin is a compound having a four-membered cyclic ether group in its molecular structure, and can act to lower the viscosity of the cationic cured ink composition (for example, less than 50 cPs at 25 ° C).
  • oxetane compound For example, "Alon oxetane OXT-101", “Alon oxetane OXT-121", “Alon oxetane OXT-211", “Alon oxetane OXT-221" of Toagosei Co., Ltd., or "Alonoxetane OXT-212" etc. can be used. These can be used individually or in combination of 2 or more types.
  • the content of the oxetane resin is preferably 15 to 75% by weight, and more preferably 40 to 60% by weight based on the total weight of the ultraviolet curable ink composition. If it exceeds 75% by weight, the curing degree is low, and if it is less than 15% by weight, the viscosity rises and the coating property is lowered.
  • the oxetane resin of this invention can be used including the oxetane compound which has one oxetane ring, and the oxetane compound which has two oxetane rings.
  • the viscosity and the flexibility of the membrane can be adjusted.
  • the oxetane compound having one oxetane ring The content range of the oxetane compound having two oxetane rings is in the range of 1: 1.16 to 1: 3. It is preferable to use.
  • the present invention is characterized in that the content ratio of the epoxy resin: oxetane resin is 1: 0.5 to 1: 6.
  • the coating composition of the composition may be excellent due to the low viscosity of the composition, but the curing sensitivity may be lowered.
  • the ratio is less than 1: 0.5, the viscosity of the composition may be high. Therefore, the coating property may be lowered.
  • the ink composition of the present invention includes, as a cationic photopolymerization initiator, a compound which produces a cation species or bronsted acid by irradiation of ultraviolet rays, for example, an iodonium salt or a sulfonium salt, but is not limited thereto. It doesn't happen.
  • the iodonium salt or sulfonium salt may cause a curing reaction to form a polymer by reacting monomers having unsaturated double bonds contained in the ink during UV curing, and may use a photosensitizer according to polymerization efficiency.
  • the photopolymerization initiator may have an anion represented by SbF 6- , AsF 6- , BF 6- , (C 6 F 5 ) 4 B-, PF 6 -or RfnF 6-n , but is not limited thereto. It is not.
  • the photopolymerization initiator is preferably included in 1 to 15% by weight, more preferably 2 to 10% by weight based on the total weight of the ultraviolet curable ink composition. If the content of the photopolymerization initiator is less than 1% by weight, the curing reaction may not be sufficient. If the content of the photopolymerization initiator is more than 15% by weight, all of the photopolymerization initiator may not be dissolved or the viscosity may increase, thereby decreasing the coating property.
  • the ultraviolet curable ink composition includes a surfactant containing a polar functional group to lower the surface tension of the ink composition in order to exhibit a small taper angle.
  • the surfactant including the polar functional group may include any one functional group selected from the group consisting of a carboxyl group, a hydroxyl group, a phosphate salt and a sulfonate salt.
  • the adhesive-coated film including the polarizing plate may be attached.
  • the adhesive coated film is not limited to a polarizing plate or nichiban tape, a release film.
  • surfactants containing a hydroxyl group (OH-) and a carboxyl group (COOH-) including a polar reactor are particularly preferably used in terms of adhesion since they have high affinity with the pressure-sensitive adhesive component. More preferably, hydrophilic fluorine-based surfactants or non-silicone-based surfactants or silicone-based surfactants containing hydroxyl groups are used to improve the coating property on the substrate.
  • the surfactant may be a polymer or oligomeric fluorine-based surfactant, it is possible to use a very non-polar (solubility parameter value less than 15 (MPa) 0.5 ) solvent, for example, insoluble in Hexane.
  • the surfactant may be a polymeric or oligomeric fluorine-based surfactant, and may be used in a highly polar solvent (solubility parameter value of 45 (MPa) 0.5 or more), for example, insoluble in water at least 0.1 wt%. have.
  • the surfactant may be a polymer or oligomeric fluorine-based surfactant, and can be dissolved in more than 1 wt% in an appropriate polar solvent (solubility parameter value of about 21 (MPa) 0.5 ), for example, propyelne glycol monomethyl ether. One without phase separation can be used.
  • the surfactant may be a polymer or oligomeric fluorine-based surfactant, and also can be dissolved in an appropriate polar solvent (for example, toluene of 0.1 (MPa) 0.5 or more) of 0.1 wt% or more and phase separation You can use the missing one.
  • the appropriate polarity value may be a solubility parameter value of 15 to 21 (MPa) 0.5 .
  • the surfactant is preferably a polymer or oligomeric fluorine-based surfactant, not dissolved in a solvent having a solubility parameter value of less than 15 (MPa) 0.5 , and 0.1 weight in a solvent having a solubility parameter value of 45 (MPa) 0.5 or more. It may be used that does not dissolve more than%, dissolve more than 1% by weight in a solvent having a solubility parameter value of 15 to 21 (MPa) 0.5 and no phase separation.
  • the surfactant may be a surfactant containing a reactive hydroxyl group as a silicone-based additive.
  • the surfactant may be a non-silicone surfactant that does not contain a fluorine component.
  • the fluorine-based surfactant the non-silicone-based surfactant and the silicon-based surfactant including a hydroxyl group
  • commercially available products may be used, for example, Megaface F-251, F-281, F-560, F, manufactured by DaiNippon Ink & Chemicals (DIC).
  • DIC DaiNippon Ink & Chemicals
  • the surfactant containing the polar functional group is preferably included in 0.1 to 5.0% by weight, more preferably 0.5 to 3.0% by weight relative to the total weight of the ultraviolet curable ink composition.
  • the content of the surfactant is less than 0.1% by weight, the effect of lowering the surface tension of the composition is not sufficient, so coating defects occur when the composition is coated on the substrate.
  • the content of the surfactant exceeds 5.0% by weight, the surfactant is used in an excessive amount. There is a problem that the compatibility and anti-foaming of the composition is rather reduced.
  • the ultraviolet curable ink composition includes a colorant.
  • colorant one or more pigments, dyes or mixtures thereof can be used, and any color can be expressed as long as the color can be expressed as necessary.
  • carbon black, graphite, metal oxides, organic black pigments or the like can be used as the black pigment.
  • Examples of carbon black include cysto 5HIISAF-HS, cysto KH, cysto 3HHAF-HS, cysto NH, cysto 3M, cysto 300HAF-LS, cysto 116HMMAF-HS, cysto 116MAF, cysto FMFEF-HS , Sisto SOFEF, Sisto VGPF, Sisto SVHSRF-HS and Sisto SSRF (Donghae Carbon Co., Ltd.); Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, # 2700, # 2600, # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 900, MCF88, # 52, # 50, # 47, # 45, # 45L, # 25, # CF9, # 95, # 3030, # 3050, MA7, MA77, MA8, MA11, MA
  • aniline black, lactam black, or perylene black series may be used, but is not limited thereto.
  • the ultraviolet curable ink composition is cured by irradiation of long wavelength ultraviolet light (for example, 365 or 395 nm), and is characterized by having a certain level of optical density (OD).
  • OD optical density
  • the content of the colorant is preferably 1 to 15% by weight, and more preferably 3 to 10% by weight based on the total weight of the ultraviolet curable ink composition. If the content of the colorant is less than 1% by weight, there is no level of OD applicable to the bezel, and if it is more than 15% by weight, the excess colorant is not dispersed in the ink and a precipitate may be formed.
  • the OD may be maintained in the range of 0.05 to 2.5 per 1.0 ⁇ m of the film thickness.
  • the ink composition may further include a colorant to improve coating properties by lowering the viscosity of the ink to increase fluidity.
  • the colorants include methyl ethyl ketone, methyl cellosolve, ethyl cellosolve, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol di Ethyl ether, diethylene glycol methyl ethyl ether, 2-ethoxy propanol, 2-methoxy propanol, 2-ethoxy ethanol, 3-methoxy butanol, cyclohexanone, cyclopentanone, propylene glycol methyl ether acetate, propylene glycol From the group consisting of ethyl ether acetate, 3-methoxybutyl acetate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, methyl cellosolve acetate, butyl acetate, dipropylene glycol mono
  • the content of the colorant is preferably 0 to 30% by weight, and more preferably 8 to 20% by weight based on the total weight of the ultraviolet curable ink composition. If it is more than 30 weight%, hardening sensitivity will fall.
  • the ultraviolet curable ink composition may further include a photosensitizer to compensate for the sclerosis in the long wavelength active energy ray.
  • the photosensitizers are anthracene, 9,10-dibutoxyanthracene, 9,10-dimethoxy
  • Anthracene-based compounds such as anthracene, 9,10-diethoxy anthracene and 2-ethyl-9,10-dimethoxyanthracene; Benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoylbenzoate, 3,3 Benzophenone compounds such as dimethyl-4-methoxybenzophenone and 3,3,4,4-tetra (t-butylperoxycarbonyl) benzophenone; Acetophenone; Ketone compounds such as dimethoxy acetophenone, diethoxy acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, and propanone; Perylene; Fluorenone compounds such as 9-florenone, 2-chloro-9-prorenone, and 2-methyl-9-florenone; Such as thioxan
  • the photosensitizer is preferably included in an amount of 1 to 200 parts by weight, more preferably 10 to 100 parts by weight, based on 100 parts by weight of the photopolymerization initiator. If less than 1 part by weight can not be expected to increase the curing sensitivity at the desired wavelength, if more than 200 parts by weight there is a problem in that the photosensitizer is not dissolved and the adhesion and crosslinking density of the pattern is reduced.
  • the ultraviolet curable ink composition may further include an adhesion promoter as an additive.
  • the film attached on the bezel pattern is repeatedly contracted and expanded according to the use conditions such as temperature and humidity, so that the bezel pattern is stressed so that the film and the bezel may be removed from the substrate.
  • 1 selected from the group consisting of amino silane compounds, alkoxy silane compounds, epoxy silane compounds, aminophenyl silane compounds, amino silane compounds, mercapto silane compounds and vinyl silane compounds as adhesion promoters Excellent results can be obtained when more than one silane compound is used.
  • epoxy silane compounds are more preferable as the adhesion promoter of the present invention.
  • an epoxy silane-based compound was used as the adhesion promoter to exhibit excellent adhesion between the bezel pattern and the glass substrate.
  • the adhesion to the glass substrate after curing of the ultraviolet curable ink composition of the present invention may be 4B or more in ASTM D3359 standard.
  • the adhesion promoter is preferably included in 0.1 to 15% by weight based on the total weight of the ink composition, more preferably 2 to 10% by weight. If the amount is less than 0.1 wt%, the bezel pattern may not be prevented from being peeled from the glass substrate. If the amount is more than 15 wt%, the viscosity of the ink solution may be increased and the dispersibility may be low.
  • the ultraviolet curable ink composition used in the present invention spreads within a short time immediately after inkjet printing, exhibits excellent coating film properties, and cures to exhibit excellent adhesive properties.
  • the excellent spreadability of the ultraviolet curable ink composition of the present invention may specifically indicate that the contact angle to the glass substrate is less than 10 °. Therefore, when applying the UV-curable ink composition, it is preferable to install a UV-lamp immediately behind the inkjet head so that the inkjet printing can be cured at the same time.
  • the ultraviolet curable ink composition has a curing dose of 1 to 10,000 mJ / cm 2, preferably 80 to 2,000 mJ / cm 2.
  • the ultraviolet curable ink composition is cured by absorbing radiation in the wavelength range of 250 nm to 450 nm, preferably 360 nm to 410 nm.
  • the UV curable ink composition is, for example, suitable for an inkjet process by having a viscosity of 1 cP to 50 cP at 25 ° C., more preferably 3 cps to 45 cps or less at 25 ° C.
  • the process temperature means a temperature heated so that the curable ink composition can be smoothly discharged through the inkjet head.
  • the process temperature may be 10 ° C to 100 ° C, preferably 20 ° C to 70 ° C.
  • the adhesive force with respect to the glass base material of the bezel pattern formed using the ultraviolet curable ink composition of this invention is 4B or more in ASTM D3359 standard, and is excellent in adhesive force and coating property.
  • the ultraviolet curable ink composition includes a surfactant including a polar functional group, so that the bezel pattern formed according to the present invention has excellent adhesion to a film substrate coated with an adhesive.
  • the adhesive force between the bezel and the film-coated film substrate after curing of the ultraviolet curable ink composition of the present invention is 100 to 5000 gf / 25mm based on the peel strength by a 180-degree peel test. It can have a value of.
  • the ultraviolet curable ink composition is an acrylic pressure sensitive adhesive, styrene butadiene rubber pressure sensitive adhesive, epoxy pressure sensitive adhesive, polyvinyl alcohol pressure sensitive adhesive, polyurethane type Since the adhesive for films such as pressure-sensitive adhesives and the like excellent adhesive force, when using the UV-curable ink composition can be obtained an effect of improving the adhesion between the bezel pattern and the film coated with the adhesive including the polarizing plate.
  • an upper base material is not limited to a polarizing plate or a protective film.
  • the adhesive force may be measured differently according to the type of the adhesive applied to the film, the standard for measuring the adhesive force between the bezel pattern and the upper substrate described in the present invention using Nichiban CT-24 tape used in Japanese Industrial Standard JIS Z 1522 Based on the measured peel strength value.
  • the adhesive force property having the adhesive force between the bezel pattern and the upper substrate in the range of 100 to 5000 gf / 25 mm belongs to the characteristic category of the present invention.
  • the manufacturing method of the bezel pattern of the display substrate of this invention uses the said ultraviolet curable ink composition.
  • the method of manufacturing a bezel pattern of the display substrate of the present invention a) using the ultraviolet curable ink composition, forming a bezel pattern on the substrate; And b) curing the bezel pattern.
  • the method for manufacturing a bezel pattern of the display substrate of the present invention may further include a step of cleaning and drying the substrate before the step of forming the bezel pattern. This is to selectively perform the surface treatment according to the surface energy of the substrate in order to improve the coating property of the ink and to remove stains caused by foreign substances.
  • the surface treatment may be performed by a treatment such as a wet surface treatment, UV ozone, atmospheric pressure plasma.
  • the viscosity of the ink composition of the present invention may be 1 cP to 50 cP, and preferably 3 cps to 45 cps.
  • An ink composition having a low viscosity of 1 cP to 50 cP is applied at a height of 0.1 to 20 ⁇ m, more specifically 0.5 to 5 ⁇ m, to form a bezel pattern on a specific portion of the substrate by the above method.
  • the applied composition is cured through exposure including ultraviolet rays, and as a result, a bezel pattern having a thin film thickness of 0.1 to 20 ⁇ m, more specifically 0.5 to 5 ⁇ m, can be produced.
  • the ultraviolet curable ink composition used in the present invention spreads within a short time immediately after inkjet printing, exhibits excellent coating film properties, and cures to exhibit excellent adhesive properties.
  • the excellent spreadability of the ultraviolet curable ink composition of the present invention may specifically indicate that the contact angle to the glass substrate is less than 10 °. Therefore, when applying the UV-curable ink composition, it is preferable to install a UV-lamp immediately behind the inkjet head so that the inkjet printing can be cured at the same time.
  • Light sources for curing the ultraviolet curable ink composition of the present invention include, but are not limited to, mercury vapor arcs, carbon arcs, Xe arcs, LED curing machines, etc., which emit light having a wavelength of 250 to 450 nm, for example. Do not.
  • the bezel pattern is characterized in that the taper angle measured after the curing treatment is more than 0 ° 30 °, thickness is 0.1 ⁇ m ⁇ 20 ⁇ m. In addition, the taper angle may preferably be greater than 0 ° and 10 °. In addition, the thickness may be preferably 0.5 ⁇ m ⁇ 5 ⁇ m. Since the bezel pattern of the present invention has the above characteristics, it may not exhibit deterioration of the luminous quality due to short circuit due to a large step, bubble generation, and mold release.
  • the optical density of the bezel pattern may be 0.05 to 2.5 per 1.0 ⁇ m film thickness, if necessary, 0.25 to 1.0. In this case, there is an advantage of excellent shielding characteristics by the bezel pattern.
  • the optical density exceeds 2.5, since the required content of the pigment to be added is very high, it may adversely affect the ink manufacturing and inkjet process, and may inhibit the UV curable ink composition from being cured by radiation.
  • the ultraviolet curable ink composition of the present invention includes a surfactant containing a polar functional group, so that the bezel pattern formed according to the present invention has excellent adhesion to the polarizing plate.
  • the upper adhesion after curing of the ultraviolet curable ink composition of the present invention may have a value of 100 ⁇ 5000gf / 25mm.
  • the bezel pattern formed according to the present invention is excellent in adhesion to the glass substrate after curing treatment, 4B or more in the ASTM D3359 standard.
  • the present invention provides a bezel pattern of a display substrate manufactured by the above method.
  • the bezel pattern refers to a pattern formed on the edges of various devices such as a watch and a display device.
  • the bezel pattern is characterized in that the taper angle measured after the curing treatment is more than 0 ° 30 °, thickness is 0.1 ⁇ m ⁇ 20 ⁇ m. In addition, the taper angle may preferably be greater than 0 ° and 10 °. In addition, the thickness may be preferably 0.5 ⁇ m ⁇ 5 ⁇ m. Since the bezel pattern of the present invention has the above characteristics, it may not exhibit deterioration of the luminous quality due to short circuit due to a large step, bubble generation, and mold release.
  • the optical density of the bezel pattern is 0.1 to 5 on the basis of the film thickness of 2.0 ⁇ m, if necessary, may be 0.5 to 2. In this case, there is an advantage of excellent shielding characteristics by the bezel pattern. When the optical density exceeds 5, the required content of the pigment to be added is very high, which may adversely affect the ink production and inkjet process, and may inhibit the UV curable ink composition from being cured by radiation.
  • the ultraviolet curable ink composition of the present invention includes a surfactant containing a polar functional group, so that the bezel pattern formed according to the present invention has excellent adhesion to the polarizing plate.
  • the upper adhesion after curing of the ultraviolet curable ink composition of the present invention may have a value of 100 ⁇ 5000gf / 25mm.
  • the said bezel pattern is excellent in the adhesive force with respect to the glass base material after hardening process being more than 4B by ASTM D3359 standard.
  • the present invention provides a display substrate including the bezel pattern.
  • the display includes a plasma display panel (PDP), a light emitting diode (LED), an organic light emitting diode (OLED), a liquid crystal display (LCD), a thin film transistor liquid crystal
  • PDP plasma display panel
  • LED light emitting diode
  • OLED organic light emitting diode
  • LCD liquid crystal display
  • TFT thin film transistor-liquid crystal display
  • CRT cathode ray tube
  • compositions prepared in Examples 1 to 4 and Comparative Examples 1 and 2 were coated on the cleaned LCD glass substrate by an inkjet coating method so as to have a thickness of 2 ⁇ m after curing.
  • the bezel pattern was formed by curing the coating layer by irradiating UV under the following conditions within 1 minute after coating.
  • the ultraviolet irradiator used a high-pressure mercury lamp having a wide ultraviolet emission wavelength range. After irradiating 1000mJ / cm 2 ultraviolet rays, latex gloves were worn to determine whether the bezel pattern was cured, and then pressed to observe indentation and tack.
  • a bezel pattern was formed on the upper surface of the display panel (hereinafter referred to as Panel 1) according to the method of Preparation Example 1, and an NRT polarizing film manufactured by LG Chemical using an acrylic adhesive layer was attached as an upper substrate. After attachment, the surroundings were encapsulated with a sealant to prevent the ingress of moisture and foreign matter into the gap between the polarizing film and the pattern.
  • a polarizing film having a width of 25 mm and a length of 50 to 100 mm to which an adhesive layer was applied was attached to a bezel pattern at room temperature using a roll laminator.
  • the peel strength measurement results when the film was peeled off the bezel by performing a 180 ° peel test are shown in Table 2 below.
  • the bezel pattern manufactured in Preparation Example 1 was subjected to a cross cut test in accordance with the standard of ASTM D3359, which is a cross cut test criterion.
  • the heat treatment may be performed for 1 minute at a temperature of 60 degrees to facilitate the reaction of the adhesion promoter depending on the sample.
  • the specimens were cut in 11 rows in the horizontal and vertical directions at intervals of 1 mm, respectively, to form 100 square grids each having a width of 1 mm.
  • the CT-24 adhesive tape of Nichiban Co., Ltd. was attached to the cut surface and then peeled off, the state of the faces falling together was measured and evaluated according to the following criteria.
  • the ink compositions of Examples 1 to 4 using a surfactant containing a polar functional group showed a low contact angle and had a high upper adhesion, whereas the ink compositions of Comparative Example 1 using a surfactant containing a polar functional group were not used.
  • the ink composition exhibits a high contact angle, and there is a problem that the ink composition of Comparative Example 2 has a low top adhesion.

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  • Inks, Pencil-Leads, Or Crayons (AREA)

Abstract

The present invention relates to a UV-curable ink composition, a method for producing a bezel pattern of a display substrate using same, and a bezel pattern produced thereby, the UV-curable ink composition comprising a surfactant comprising a colorant, an epoxy resin, an oxetane resin, a photopolymerization initiator, and a polar functional group, wherein the content ratio of the epoxy resin to the oxetane resin is 1:0.5-1:6, an adhesion to a glass substrate after curing is 4B or higher according to the ASTM D3359 standard, a contact angle to the glass substrate is less than 10°, and an adhesion with a substrate coated with an adhesive layer after curing is 100-5,000gf/25mm.

Description

자외선 경화형 잉크 조성물, 이를 이용한 디스플레이 기판의 베젤 패턴의 제조방법 및 이에 의하여 제조된 베젤 패턴UV curable ink composition, method for manufacturing bezel pattern of display substrate using same and bezel pattern manufactured thereby

본 출원은 2014년 09월 26일자 한국 특허 출원 제10-2014-0129417호, 2014년 12월 11일자 한국 특허 출원 제10-2014-0178523호 및 2015년 09월 30일자 한국 특허 출원 제10-2015-0138097호에 기초한 우선권의 이익을 주장하며, 해당 한국 특허 출원의 문헌에 개시된 모든 내용은 본 명세서의 일부로서 포함된다. This application is filed with Korean Patent Application No. 10-2014-0129417 filed on September 26, 2014, Korean Patent Application No. 10-2014-0178523 filed on December 11, 2014, and Korean Patent Application No. 10-2015 filed on September 30, 2015. Claiming the benefit of priority based on -0138097, all contents disclosed in the literature of the relevant Korean patent application are incorporated as part of this specification.

본 발명은 자외선 경화형 잉크 조성물, 이를 이용한 디스플레이 기판의 베젤 패턴의 제조방법 및 이에 의하여 제조된 베젤 패턴에 관한 것이다.The present invention relates to an ultraviolet curable ink composition, a method of manufacturing a bezel pattern of a display substrate using the same, and a bezel pattern manufactured thereby.

디스플레이 기기에 있어서, 경량화 및 박화를 달성하기 위해서는 별도의 베젤 구조물을 사용하는 대신, 베젤 패턴을 기판 위에 형성하는 방법이 사용되고 있다.In display devices, in order to achieve weight reduction and thinning, a method of forming a bezel pattern on a substrate is used instead of using a separate bezel structure.

종래의 디스플레이 기판의 제조방법에 있어서, 베젤 패턴을 형성하기 위해서는 포토 리소그라피 방법 또는 스크린 인쇄 방법이 사용되었으나, 포토 리소그라피 방법의 경우 패턴 형성을 위한 제조비용이 고가이며, 공정이 복잡한 단점이 있다. 스크린 인쇄 방법의 경우 조성물의 높은 점도로 인해 형성된 패턴의 두께가 수십 ㎛로 증가하며, 이에 따라 패턴 형성부와 패턴 미형성부의 단차가 발생한다. 더욱이 블랙(black) 색상 외 화이트(white)나 골드(gold) 등의 색상을 갖는 베젤부는 적정 수준의 광학 밀도(optical density)를 얻기 위해 수 차례 덧칠하는 방법을 이용하여 베젤부를 형성하고 있으며, 이와 같이 베젤 패턴의 인쇄 도수가 증가함에 따라 패턴 형성부와 미형성부의 단차는 더욱 증가한다.In the conventional method of manufacturing a display substrate, a photolithography method or a screen printing method is used to form a bezel pattern. However, in the case of the photolithography method, a manufacturing cost for forming a pattern is expensive and the process is complicated. In the case of the screen printing method, the thickness of the formed pattern is increased to several tens of micrometers due to the high viscosity of the composition, which results in a step between the pattern forming portion and the pattern non-forming portion. In addition, the bezel portion having a color such as white or gold in addition to the black color is used to form the bezel portion by using a method of overcoating several times to obtain an optical density of an appropriate level. Similarly, as the printing frequency of the bezel pattern increases, the level difference between the pattern forming portion and the non-forming portion increases.

특히, 디스플레이 기기 내측면에 베젤 패턴이 위치한 터치 패널 디스플레이의 경우, 투명도전막을 코팅할 때 도전막이 단속적으로 코팅되거나 단락되는 문제가 발생한다. 또한 베젤 막 위에 점착제가 도포된 필름과 같은 상부 기재를 부착할 때, 필름과 베젤 간의 부착력이 충분하지 못하다면, 기포 발생 및 필름의 박리 문제가 발생할 수 있다. 따라서, 종래의 베젤 패턴 형성방법에 비해 필름과의 부착력이 우수한 베젤 패턴 형성 방법을 개발할 필요가 있다.In particular, in the case of a touch panel display in which a bezel pattern is disposed on an inner surface of a display device, a problem occurs in that the conductive film is intermittently coated or short-circuited when the transparent conductive film is coated. In addition, when attaching an upper substrate such as a film coated with a pressure-sensitive adhesive on the bezel film, if the adhesion between the film and the bezel is not sufficient, bubble generation and film peeling problems may occur. Therefore, it is necessary to develop a method for forming a bezel pattern which is superior in adhesion with a film as compared with the conventional method for forming a bezel pattern.

상기 종래 기술의 문제점을 해결하기 위하여, 본 발명은 경화되었을 때 작은 테이퍼 각과 얇은 막 두께 및 점착제를 도포한 필름에 높은 부착력을 갖는 자외선 경화형 잉크 조성물을 이용하여 베젤 패턴을 형성함으로써, 기포 발생 및 필름의 이형 등을 최소화하는 베젤 패턴의 제조방법, 이에 따라 제조한 베젤 패턴 및 이를 포함하는 디스플레이 기판을 제공하는 것을 목적으로 한다.In order to solve the problems of the prior art, the present invention, when cured by forming a bezel pattern using a UV curable ink composition having a small taper angle, a thin film thickness and a high adhesion to the film coated with the adhesive, bubble generation and film An object of the present invention is to provide a method of manufacturing a bezel pattern to minimize the release of the bezel pattern, and a display substrate including the same.

본 발명은, 착색제, 에폭시 수지, 옥세탄 수지, 광중합 개시제 및 극성 작용기를 포함하는 계면활성제를 포함하고, 상기 에폭시 수지: 옥세탄 수지의 함량비율이 1:0.5~1:6이고, 경화 후의 유리 기재에 대한 밀착력이 ASTM D3359 규격으로 4B 이상이고, 유리 기재에 대한 접촉각이 10°미만이고, 경화 후 점착층이 도포된 기재와의 부착력이 100~5000gf/25mm 인 자외선 경화형 잉크 조성물을 제공한다.This invention contains surfactant containing a coloring agent, an epoxy resin, an oxetane resin, a photoinitiator, and a polar functional group, The content ratio of the said epoxy resin: oxetane resin is 1: 0.5-1: 6, and glass after hardening The adhesive force to the substrate is 4B or more according to ASTM D3359 standard, the contact angle to the glass substrate is less than 10 °, and provides an ultraviolet curable ink composition having an adhesive force with the substrate coated with an adhesive layer after curing is 100 ~ 5000gf / 25mm.

또한 본 발명은, 상기 자외선 경화형 잉크 조성물을 사용하여, 기판 상에 베젤 패턴을 형성하는 단계; 및 상기 베젤 패턴을 경화하는 단계;를 포함하는 디스플레이 기판용 베젤 패턴의 제조방법을 제공한다.In another aspect, the present invention, using the ultraviolet curable ink composition, forming a bezel pattern on a substrate; And hardening the bezel pattern; provides a method of manufacturing a bezel pattern for a display substrate comprising a.

또한, 본 발명은, 상기 자외선 경화형 잉크 조성물이 경화되어, 기판 상에 형성된 디스플레이 기판용 베젤 패턴을 제공한다.Moreover, this invention provides the bezel pattern for display substrates which the said ultraviolet curable ink composition hardened | cured and formed on the board | substrate.

본 발명에 따르면 경화되었을 때 작은 테이퍼 각과 얇은 막 두께를 나타내는 자외선 경화형 잉크 조성물을 이용하여 베젤 패턴을 형성함으로써, 큰 단차에 의한 단락, 기포 발생 및 필름의 이형에 따른 시감 품위 저하를 나타내지 않는 베젤 패턴을 제조할 수 있다.According to the present invention, a bezel pattern is formed by using an ultraviolet curable ink composition which exhibits a small taper angle and a thin film thickness when cured. Thus, a bezel pattern that does not exhibit deterioration of visibility due to short circuits due to large steps, bubble generation, and mold release. Can be prepared.

본 발명의 베젤 패턴 제조방법은 극성 작용기를 포함하는 계면활성제를 포함하는 자외선 경화형 잉크 조성물을 사용함으로써, 제조된 베젤 패턴은 유리 기재에 대한 밀착력 및 코팅성이 우수하며, 베젤막과 상부에 부착되는 기재와의 부착력이 우수하다.The bezel pattern manufacturing method of the present invention by using a UV curable ink composition comprising a surfactant containing a polar functional group, the prepared bezel pattern is excellent in adhesion and coating property to the glass substrate, it is attached to the bezel film and the top Excellent adhesion to the substrate.

이하, 본 발명을 보다 상세히 설명한다.Hereinafter, the present invention will be described in more detail.

본 발명은, 착색제, 에폭시 수지, 옥세탄 수지, 광중합 개시제 및 극성 작용기를 포함하는 계면활성제를 포함하고, 상기 에폭시 수지: 옥세탄 수지의 함량비율이 1:0.5~1:6이고, 경화 후의 유리 기재에 대한 밀착력이 ASTM D3359 규격으로 4B 이상이고, 유리 기재에 대한 접촉각이 10°미만이고, 베젤막과 상부에 부착되는 기재와의 부착력이 100~5000gf/25mm 인 자외선 경화형 잉크 조성물을 제공한다.This invention contains surfactant containing a coloring agent, an epoxy resin, an oxetane resin, a photoinitiator, and a polar functional group, The content ratio of the said epoxy resin: oxetane resin is 1: 0.5-1: 6, and glass after hardening It provides an ultraviolet curable ink composition in which the adhesion to the substrate is 4B or higher in the ASTM D3359 standard, the contact angle to the glass substrate is less than 10 °, and the adhesion between the bezel film and the substrate attached to the top is 100 to 5000 gf / 25mm.

또한, 본 발명의 자외선 경화형 잉크 조성물은, 밀착증진제, 착색제및 광증감제로 이루어지는 군에서 선택되는 어느 하나 이상을 더 포함할 수 있다.In addition, the ultraviolet curable ink composition of the present invention may further include any one or more selected from the group consisting of adhesion promoters, colorants and photosensitizers.

자외선 경화형 잉크 조성물에는 통상적으로 라디컬 중합형 수지와 양이온 중합형 수지가 주로 사용될 수 있다. 라디컬 중합형 수지의 경우, 산소에 의한 경화 장애를 받기 때문에 박막의 경화에 적합하지 않으며, 또한 경화 수축이 크기 때문에 유리 기재와의 밀착성이 낮아 베젤 패턴 형성에 적합하지 않다. 반면에 양이온 중합형 수지의 경우, 통상적으로 경화 수축율이 낮으며 산소에 의한 영향이 작기 때문에 박막을 경화하는 데 유리하다. Typically, a radically polymerizable resin and a cationic polymerizable resin may be mainly used in the ultraviolet curable ink composition. The radically polymerizable resin is not suitable for curing the thin film because it is impaired in curing due to oxygen, and is not suitable for bezel pattern formation due to its low adhesion to the glass substrate because of its large shrinkage. On the other hand, in the case of cationic polymerization type resin, it is generally advantageous to cure the thin film because the curing shrinkage rate is low and the influence by oxygen is small.

본 발명에서 사용하는 자외선 경화형 잉크 조성물은 양이온성 경화 성분으로서 에폭시 수지를 포함한다. 상기 에폭시 수지는 구체적으로 비스페놀형 에폭시 수지, 노볼락형 에폭시 수지, 글리시딜 에스테르형 에폭시 수지, 글리시딜 아민형 에폭시 수지, 선형 지방족 에폭시 수지, 비페닐형 에폭시 수지 및 지환식 에폭시 화합물 중에서 선택되는 1종 또는 2종의 혼합물일 수 있다.The ultraviolet curable ink composition used by this invention contains an epoxy resin as a cationic curing component. Specifically, the epoxy resin is selected from a bisphenol type epoxy resin, a novolak type epoxy resin, a glycidyl ester type epoxy resin, a glycidyl amine type epoxy resin, a linear aliphatic epoxy resin, a biphenyl type epoxy resin, and an alicyclic epoxy compound. It may be one kind or a mixture of two kinds.

상기 지환식 에폭시 화합물은, 에폭시화 지방족 고리기를 하나 이상 포함하는 화합물을 의미할 수 있다.The alicyclic epoxy compound may mean a compound including at least one epoxidized aliphatic ring group.

에폭시화 지방족 고리기를 포함하는 상기 지환족 에폭시 화합물에서, 상기 에폭시화 지방족 고리기는 지환식 고리에 결합된 에폭시 기를 의미하는 것으로, 예를 들면, 3,4-에폭시시클로펜틸기, 3,4-에폭시시클로헥실기, 3,4-에폭시시클로펜틸메틸기, 3,4-에폭시시클로헥실메틸기, 2-(3,4-에폭시시클로펜틸)에틸기, 2-(3,4-에폭시시클로헥실)에틸기, 3-(3,4-에폭시시클로페틸)프로필기 또는 3-(3,4-에폭시시클로헥실)프로필기 등의 관능기가 예시될 수 있다. 상기에서 지환식 고리를 구성하는 수소 원자는, 임의적으로 알킬기 등의 치환기에 의해 치환될 수도 있다. 상기 지환식 에폭시 화합물로는, 예를 들면, 이하에서 구체적으로 예시되는 화합물을 사용할 수 있으나, 사용할 수 있는 에폭시 화합물이 하기의 종류에 제한되는 것은 아니다.In the alicyclic epoxy compound containing an epoxidized aliphatic ring group, the epoxidized aliphatic ring group means an epoxy group bonded to an alicyclic ring, for example, a 3,4-epoxycyclopentyl group, 3,4-epoxy Cyclohexyl group, 3,4-epoxycyclopentylmethyl group, 3,4-epoxycyclohexylmethyl group, 2- (3,4-epoxycyclopentyl) ethyl group, 2- (3,4-epoxycyclohexyl) ethyl group, 3- Functional groups, such as a (3, 4- epoxycyclo petyl) propyl group or 3- (3, 4- epoxy cyclohexyl) propyl group, can be illustrated. The hydrogen atom constituting the alicyclic ring in the above may be optionally substituted with a substituent such as an alkyl group. As said alicyclic epoxy compound, although the compound specifically illustrated below can be used, the epoxy compound which can be used is not limited to the following types.

예컨대 디시클로펜타디엔디옥사이드, 시클로헥센옥사이드, 4-비닐-1,2-에폭시-4-비닐시클로헥센, 비닐시클로헥센디옥사이드, 리모넨모노옥사이드, 리모넨디옥사이드, (3,4-에폭시시클로헥실)메틸-3,4-에폭시시클로헥산카르복실레이트, 3-비닐시클로헥센옥사이드, 비스(2,3-에폭시시클로펜틸)에테르, 비스(3,4-에폭시시클로헥실메틸)아디페이트, 비스(3,4-에폭시-6-메틸시클로헥실메틸)아디페이트, (3,4-에폭시시클로헥실)메틸알코올, (3,4-에폭시-6-메틸시클로헥실)메틸-3,4-에폭시-6-메틸시클로헥산카르복실레이트, 에틸렌글리콜비스(3,4-에폭시시클로헥실)에테르, 3,4-에폭시시클로헥센카르본산 에틸렌글리콜디에스테르, (3,4-에폭시시클로헥실)에틸트리메톡시실란, 다이셀㈜ 사의 셀록사이드 8000 등을 사용할 수 있다.For example, dicyclopentadiene dioxide, cyclohexene oxide, 4-vinyl-1,2-epoxy-4-vinylcyclohexene, vinylcyclohexene dioxide, limonene monooxide, limonene dioxide, (3,4-epoxycyclohexyl) methyl- 3,4-epoxycyclohexanecarboxylate, 3-vinylcyclohexene oxide, bis (2,3-epoxycyclopentyl) ether, bis (3,4-epoxycyclohexylmethyl) adipate, bis (3,4- Epoxy-6-methylcyclohexylmethyl) adipate, (3,4-epoxycyclohexyl) methyl alcohol, (3,4-epoxy-6-methylcyclohexyl) methyl-3,4-epoxy-6-methylcyclohexane Carboxylate, ethylene glycol bis (3,4-epoxycyclohexyl) ether, 3,4-epoxycyclohexene carboxylic acid ethylene glycol diester, (3,4-epoxycyclohexyl) ethyltrimethoxysilane, Daicel Co., Ltd. Celoxide 8000 etc. can be used.

상기 에폭시 수지의 함량은 상기 자외선 경화형 잉크 조성물의 총 중량에 대하여 5~50 중량%인 것이 바람직하며, 보다 바람직하게는 10~30 중량%일 수 있다. 50 중량%를 초과하면 코팅성이 저하되고, 5 중량% 미만이면 감도가 저하된다.The content of the epoxy resin is preferably 5 to 50% by weight, more preferably 10 to 30% by weight based on the total weight of the ultraviolet curable ink composition. When it exceeds 50 weight%, coating property will fall, and when it is less than 5 weight%, a sensitivity will fall.

상기 자외선 경화형 잉크 조성물은 다른 양이온 중합성 단량체로서 옥세탄 수지를 포함한다.The ultraviolet curable ink composition contains an oxetane resin as another cationically polymerizable monomer.

옥세탄 수지는, 분자 구조 내에 4원 고리형 에테르기를 가지는 화합물로서, 양이온성 경화된 잉크 조성물의 점도를 낮추는(일례로, 25℃에서 50cPs 미만) 작용을 할 수 있다. The oxetane resin is a compound having a four-membered cyclic ether group in its molecular structure, and can act to lower the viscosity of the cationic cured ink composition (for example, less than 50 cPs at 25 ° C).

구체적으로는, 3-에틸-3-히드록시메틸 옥세탄, 1,4-비스[(3-에틸-3-옥세타닐)메톡시메틸]벤젠, 3-에틸-3-(페녹시메틸)옥세탄, 디[(3-에틸-3-옥세타닐)메틸]에테르, 3-에틸-3-(2-에틸헥실옥시메틸)옥세탄, 3-에틸-3-시클로헥실옥시메틸 옥세탄 또는 페놀노볼락 옥세탄 등이 예시될 수 있다. 옥세탄 화합물로는, 예를 들면, 토아고세이㈜사의 「알론옥세탄 OXT-101」, 「알론옥세탄 OXT-121」, 「알론옥세탄 OXT-211」, 「알론옥세탄 OXT-221」 또는 「알론옥세탄 OXT-212」 등을 사용할 수 있다. 이들은 단독으로, 혹은 2종 이상을 조합으로 이용할 수 있다.Specifically, 3-ethyl-3-hydroxymethyl oxetane, 1,4-bis [(3-ethyl-3-oxetanyl) methoxymethyl] benzene, 3-ethyl-3- (phenoxymethyl) Oxetane, di [(3-ethyl-3-oxetanyl) methyl] ether, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3-cyclohexyloxymethyl oxetane or Phenol novolac oxetane and the like can be exemplified. As an oxetane compound, For example, "Alon oxetane OXT-101", "Alon oxetane OXT-121", "Alon oxetane OXT-211", "Alon oxetane OXT-221" of Toagosei Co., Ltd., or "Alonoxetane OXT-212" etc. can be used. These can be used individually or in combination of 2 or more types.

상기 옥세탄 수지의 함량은 상기 자외선 경화형 잉크 조성물의 총 중량에 대하여 15~75 중량%인 것이 바람직하며, 보다 바람직하게는 40~60 중량%일 수 있다. 75 중량%를 초과하면 경화도가 낮고, 15 중량% 미만이면 점도가 상승하여 코팅성이 저하된다. The content of the oxetane resin is preferably 15 to 75% by weight, and more preferably 40 to 60% by weight based on the total weight of the ultraviolet curable ink composition. If it exceeds 75% by weight, the curing degree is low, and if it is less than 15% by weight, the viscosity rises and the coating property is lowered.

또한, 본 발명의 옥세탄 수지는 1개의 옥세탄 고리를 갖는 옥세탄 화합물 및 2개의 옥세탄 고리를 갖는 옥세탄 화합물을 포함하여 사용할 수 있다. 상기 1개의 옥세탄 고리를 갖는 옥세탄 화합물 및 2개의 옥세탄 고리를 갖는 옥세탄 화합물을 함께 사용하는 경우에는 점도 및 막의 유연성을 조절할 수 있다는 장점이 있다. 상기와 같이 2종의 옥세탄 화합물을 함께 사용하는 경우, 1개의 옥세탄 고리를 갖는 옥세탄 화합물: 2개의 옥세탄 고리를 갖는 옥세탄 화합물의 함량범위는 1:1.16 내지 1:3의 범위로 사용하는 것이 바람직하다.In addition, the oxetane resin of this invention can be used including the oxetane compound which has one oxetane ring, and the oxetane compound which has two oxetane rings. When the oxetane compound having one oxetane ring and the oxetane compound having two oxetane rings are used together, the viscosity and the flexibility of the membrane can be adjusted. When two kinds of oxetane compounds are used together as described above, the oxetane compound having one oxetane ring: The content range of the oxetane compound having two oxetane rings is in the range of 1: 1.16 to 1: 3. It is preferable to use.

또한, 본 발명은 상기 에폭시 수지: 옥세탄 수지의 함량비율이 1:0.5~1:6인 것을 특징으로 한다. 에폭시 화합물과 옥세탄 화합물의 비율이 1:6을 초과하는 경우에는 조성물의 점도가 낮음에 따라 조성물의 코팅성은 우수하나 경화 감도가 저하될 수 있으며, 1:0.5 미만인 경우에는 조성물의 점도가 높음에 따라 코팅성이 저하될 수 있다.In addition, the present invention is characterized in that the content ratio of the epoxy resin: oxetane resin is 1: 0.5 to 1: 6. When the ratio of the epoxy compound and the oxetane compound exceeds 1: 6, the coating composition of the composition may be excellent due to the low viscosity of the composition, but the curing sensitivity may be lowered. When the ratio is less than 1: 0.5, the viscosity of the composition may be high. Therefore, the coating property may be lowered.

본 발명의 잉크 조성물은 양이온성 광중합 개시제로서 자외선의 조사에 의해 양이온(cation) 종이나 브론스테드산을 만들어내는 화합물, 예를 들면 요오드늄 염 또는 설포늄 염 등을 포함하고 있으나, 반드시 이에 한정되는 것은 아니다.The ink composition of the present invention includes, as a cationic photopolymerization initiator, a compound which produces a cation species or bronsted acid by irradiation of ultraviolet rays, for example, an iodonium salt or a sulfonium salt, but is not limited thereto. It doesn't happen.

상기 요오드늄 염 또는 설포늄 염은 자외선 경화 과정에서 잉크에 함유된 불포화 이중결합을 갖는 모노머가 반응하여 고분자를 형성하는 경화 반응이 일어나도록 하며, 중합 효율에 따라 광증감제를 사용할 수도 있다.The iodonium salt or sulfonium salt may cause a curing reaction to form a polymer by reacting monomers having unsaturated double bonds contained in the ink during UV curing, and may use a photosensitizer according to polymerization efficiency.

일 예로, 상기 광중합 개시제는 SbF6-, AsF6-, BF6-, (C6F5)4B-, PF6- 혹은 RfnF6-n으로 표시되는 음이온을 갖는 것일 수 있으나, 반드시 이에 한정되는 것은 아니다. For example, the photopolymerization initiator may have an anion represented by SbF 6- , AsF 6- , BF 6- , (C 6 F 5 ) 4 B-, PF 6 -or RfnF 6-n , but is not limited thereto. It is not.

상기 광중합 개시제는 자외선 경화형 잉크 조성물의 총 중량에 대하여 1~15 중량%로 포함되는 것이 바람직하며, 보다 바람직하게는 2~10 중량%로 포함될 수 있다. 광중합 개시제의 함량이 1 중량% 미만이면 경화 반응이 충분하지 않고, 15 중량% 초과이면 모두 용해되지 않거나 점도가 증가하여 코팅성이 저하될 수 있다.The photopolymerization initiator is preferably included in 1 to 15% by weight, more preferably 2 to 10% by weight based on the total weight of the ultraviolet curable ink composition. If the content of the photopolymerization initiator is less than 1% by weight, the curing reaction may not be sufficient. If the content of the photopolymerization initiator is more than 15% by weight, all of the photopolymerization initiator may not be dissolved or the viscosity may increase, thereby decreasing the coating property.

상기 자외선 경화형 잉크 조성물은 작은 테이퍼 각을 나타내기 위해잉크 조성물의 표면장력을 낮춰주기 위하여, 극성 작용기를 포함하는 계면활성제를 포함한다. 상기 극성 작용기를 포함하는 계면활성제는 카르복실기, 히드록시기, 인산염 및 술폰산염으로 이루어지는 군에서 선택되는 어느 하나의 작용기를 포함할 수 있다. The ultraviolet curable ink composition includes a surfactant containing a polar functional group to lower the surface tension of the ink composition in order to exhibit a small taper angle. The surfactant including the polar functional group may include any one functional group selected from the group consisting of a carboxyl group, a hydroxyl group, a phosphate salt and a sulfonate salt.

종래의 대부분의 실리콘계 계면활성제는 기재에 대한 코팅성이 우수하고 테이퍼 각이 작은 장점이 있으나, 기재상에 잉크 조성물을 적용하여 베젤부 패턴을 형성한 후 편광판을 포함한 점착제가 도포된 필름을 부착하였을 때 기재와 필름 간의 부착력이 저하되어 불량이 발생할 수 있었다. 반면, 비실리콘계 및 불소계 계면활성제는 기재 상에 형성된 베젤부와 점착제가 코팅된 필름 간의 부착력이 우수한 장점이 있으며, 상기 점착제가 코팅된 필름은 편광판이나 nichiban tape, 이형 필름에 한정짓지 않는다. 특히, 극성 반응기를 포함하는 수산기(OH-), 카르복실기(COOH-)를 포함하는 계면활성제의 경우 점착제 성분과의 친화성이 높기 때문에 부착력 측면에서 특히 바람직하게 사용된다. 기재에 대한 코팅성을 향상시키기 위해 친수성(hydrophilic) 불소계 계면활성제 또는 비실리콘계 계면활성제 또는 수산기를 포함하는 실리콘계 계면활성제를 사용하는 것이 더욱 바람직하다. Most conventional silicone surfactants have excellent coating property on the substrate and have a small taper angle. However, after applying the ink composition on the substrate to form a bezel part pattern, the adhesive-coated film including the polarizing plate may be attached. When the adhesion between the substrate and the film is lowered, a defect may occur. On the other hand, non-silicone and fluorine-based surfactants have the advantage of excellent adhesion between the bezel portion formed on the substrate and the adhesive coated film, the adhesive coated film is not limited to a polarizing plate or nichiban tape, a release film. In particular, surfactants containing a hydroxyl group (OH-) and a carboxyl group (COOH-) including a polar reactor are particularly preferably used in terms of adhesion since they have high affinity with the pressure-sensitive adhesive component. More preferably, hydrophilic fluorine-based surfactants or non-silicone-based surfactants or silicone-based surfactants containing hydroxyl groups are used to improve the coating property on the substrate.

구체적으로, 상기 계면활성제는 고분자형 또는 올리고머형 불소계 계면활성제일 수 있으며, 매우 비극성인 (solubility parameter 값이 15 (MPa)0.5 미만) 용매, 예를 들어 Hexane에는 용해되지 않는 것을 사용할 수 있다. 또한, 상기 계면활성제는 고분자형 또는 올리고머형 불소계 계면활성제일 수 있으며, 매우 극성인 (solubility parameter 값이 45 (MPa)0.5 이상인) 용매, 예를 들어 물에는 0.1 wt% 이상 용해되지 않는 것을 사용할 수 있다. 또한, 상기 계면활성제는 고분자형 또는 올리고머형 불소계 계면활성제일 수 있으며, 적절한 극성(solubility parameter 값이 21 (MPa)0.5 정도인) 용매, 예를 들어 propyelne glycol monomethyl ether에 1 wt % 이상 용해 가능하며 상분리가 없는 것을 사용할 수 있다. 또한, 상기 계면활성제는 고분자형 또는 올리고머형 불소계 계면활성제일 수 있으며, 역시 적절한 극성(solubility parameter 값이 18 (MPa)0.5 정도인) 용매, 예를 들어 톨루엔에 0.1 wt% 이상 용해 가능하며 상분리가 없는 것을 사용할 수 있다. 상기 적절한 극성 값은, solubility parameter 값이 15~21 (MPa) 0.5일 수 있다.Specifically, the surfactant may be a polymer or oligomeric fluorine-based surfactant, it is possible to use a very non-polar (solubility parameter value less than 15 (MPa) 0.5 ) solvent, for example, insoluble in Hexane. In addition, the surfactant may be a polymeric or oligomeric fluorine-based surfactant, and may be used in a highly polar solvent (solubility parameter value of 45 (MPa) 0.5 or more), for example, insoluble in water at least 0.1 wt%. have. In addition, the surfactant may be a polymer or oligomeric fluorine-based surfactant, and can be dissolved in more than 1 wt% in an appropriate polar solvent (solubility parameter value of about 21 (MPa) 0.5 ), for example, propyelne glycol monomethyl ether. One without phase separation can be used. In addition, the surfactant may be a polymer or oligomeric fluorine-based surfactant, and also can be dissolved in an appropriate polar solvent (for example, toluene of 0.1 (MPa) 0.5 or more) of 0.1 wt% or more and phase separation You can use the missing one. The appropriate polarity value may be a solubility parameter value of 15 to 21 (MPa) 0.5 .

또한, 상기 계면활성제로, 바람직하게는 고분자형 또는 올리고머형 불소계 계면활성제이고, solubility parameter 값이 15 (MPa)0.5 미만인 용매에 용해되지 않고, solubility parameter 값이 45 (MPa)0.5 이상인 용매에 0.1중량% 이상 용해되지 않고, solubility parameter 값이 15 내지 21 (MPa)0.5인 용매에 1중량% 이상 용해되며 상분리가 없는 것을 사용할 수 있다.The surfactant is preferably a polymer or oligomeric fluorine-based surfactant, not dissolved in a solvent having a solubility parameter value of less than 15 (MPa) 0.5 , and 0.1 weight in a solvent having a solubility parameter value of 45 (MPa) 0.5 or more. It may be used that does not dissolve more than%, dissolve more than 1% by weight in a solvent having a solubility parameter value of 15 to 21 (MPa) 0.5 and no phase separation.

또한 상기 계면활성제는 실리콘계 첨가제로 반응성 히드록시기를 포함하는 계면활성제를 사용할 수 있다. 또한, 상기 계면활성제는 불소 성분을 포함하지 않는 비실리콘계 계면활성제를 사용할 수 있다.In addition, the surfactant may be a surfactant containing a reactive hydroxyl group as a silicone-based additive. In addition, the surfactant may be a non-silicone surfactant that does not contain a fluorine component.

상기 불소계 계면활성제와, 비실리콘계 계면활성제 및 수산기를 포함하는 실리콘계 계면활성제는 시판품을 사용할 수 있으며, 예를 들면DIC(DaiNippon Ink & Chemicals) 사의 Megaface F-251, F-281, F-560, F-561, F-562, F-563, F-565, F-568, F-570 및 F-571 또는 아사히 가라스 사의 Surflon S-111, S-112, S-113, S-121, S-131, S-132, S-141 및 S-145 또는 스미토모 스리엠 사의 Fluorad FC-93, FC-95, FC-98, FC-129, FC-135, FC-170C, FC-430 및 FC-4430 또는 듀퐁 사의 Zonyl FS-300, FSN, FSN-100 및 FSO 및 BYK사의 BYK-350, BYK-354, BYK-355, BYK-356, BYK-358N, BYK-359, BYK-361N, BYK-381, BYK-388, BYK-392, BYK-394, BYK-399, BYK-3440, BYK-3441, BYKETOL-AQ, BYK-DYNWET 800 등으로 이루어진 군에서 선택되는 것을 사용할 수 있다.As the fluorine-based surfactant, the non-silicone-based surfactant and the silicon-based surfactant including a hydroxyl group, commercially available products may be used, for example, Megaface F-251, F-281, F-560, F, manufactured by DaiNippon Ink & Chemicals (DIC). -561, F-562, F-563, F-565, F-568, F-570 and F-571 or Surflon S-111, S-112, S-113, S-121, S- from Asahi Glass. 131, S-132, S-141 and S-145 or Fluorad FC-93, FC-95, FC-98, FC-129, FC-135, FC-170C, FC-430 and FC-4430 from Sumitomo SriM Or Zonyl FS-300, FSN, FSN-100 and DuPont's BYK-350, BYK-354, BYK-355, BYK-356, BYK-358N, BYK-359, BYK-361N, BYK-381, BYK-388, BYK-392, BYK-394, BYK-399, BYK-3440, BYK-3441, BYKETOL-AQ, BYK-DYNWET 800, etc. can be used.

상기 극성 작용기를 포함하는 계면활성제는 자외선 경화형 잉크 조성물 총 중량에 대해 0.1 내지 5.0 중량%, 보다 바람직하게는 0.5 내지 3.0 중량%로 포함되는 것이 바람직하다. 상기 계면활성제의 함량이 0.1 중량% 미만일 경우에는 조성물의 표면장력을 낮추는 효과가 충분치 않아 기재에 조성물을 코팅 시 코팅불량이 발생하게 되고, 5.0 중량%를 초과할 경우에는 계면활성제가 과량으로 사용되어 조성물의 상용성 및 소포성이 오히려 감소하게 되는 문제점이 있다.The surfactant containing the polar functional group is preferably included in 0.1 to 5.0% by weight, more preferably 0.5 to 3.0% by weight relative to the total weight of the ultraviolet curable ink composition. When the content of the surfactant is less than 0.1% by weight, the effect of lowering the surface tension of the composition is not sufficient, so coating defects occur when the composition is coated on the substrate. When the content of the surfactant exceeds 5.0% by weight, the surfactant is used in an excessive amount. There is a problem that the compatibility and anti-foaming of the composition is rather reduced.

상기 자외선 경화형 잉크 조성물은 착색제를 포함한다.The ultraviolet curable ink composition includes a colorant.

상기 착색제로는 1종 이상의 안료, 염료 또는 이들의 혼합물을 사용할 수 있으며, 필요에 따른 색을 발현할 수 있다면 특별히 한정하지 않는다.As the colorant, one or more pigments, dyes or mixtures thereof can be used, and any color can be expressed as long as the color can be expressed as necessary.

본 발명의 일 구체예로서는, 흑색 안료로서 카본 블랙, 흑연, 금속 산화물, 유기블랙 안료 등을 사용할 수 있다.As one specific example of the present invention, carbon black, graphite, metal oxides, organic black pigments or the like can be used as the black pigment.

카본 블랙의 예로는 시스토 5HIISAF-HS, 시스토 KH, 시스토 3HHAF-HS, 시스토 NH, 시스토 3M, 시스토 300HAF-LS, 시스토 116HMMAF-HS, 시스토 116MAF, 시스토 FMFEF-HS, 시스토 SOFEF, 시스토VGPF, 시스토 SVHSRF-HS 및 시스토 SSRF(동해카본 ㈜); 다이어그램 블랙 II, 다이어그램 블랙 N339, 다이어그램 블랙 SH, 다이어그램 블랙 H, 다이어그램 LH, 다이어그램 HA, 다이어그램 SF, 다이어그램 N550M, 다이어그램 M, 다이어그램 E, 다이어그램 G, 다이어그램 R, 다이어그램 N760M, 다이어그램 LR, #2700, #2600, #2400, #2350, #2300, #2200, #1000, #980, #900, MCF88, #52, #50, #47, #45, #45L, #25, #CF9, #95, #3030, #3050, MA7, MA77, MA8, MA11, MA100, MA40, OIL7B, OIL9B, OIL11B, OIL30B 및 OIL31B(미쯔비시화학㈜) ; PRINTEX-U, PRINTEX-V, PRINTEX-140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX-35, PRINTEX-25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, 및 LAMP BLACK-101(데구사㈜); RAVEN-1100ULTRA, RAVEN-1080ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN-850, RAVEN-820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN-450, RAVEN-430ULTRA, RAVEN-420, RAVEN-410, RAVEN-2500ULTRA, RAVEN-2000, RAVEN-1500, RAVEN-1255, RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, 및 RAVEN-1170(콜롬비아 카본㈜) 또는 이들의 혼합물 등을 들 수 있다.Examples of carbon black include cysto 5HIISAF-HS, cysto KH, cysto 3HHAF-HS, cysto NH, cysto 3M, cysto 300HAF-LS, cysto 116HMMAF-HS, cysto 116MAF, cysto FMFEF-HS , Sisto SOFEF, Sisto VGPF, Sisto SVHSRF-HS and Sisto SSRF (Donghae Carbon Co., Ltd.); Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, # 2700, # 2600, # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 900, MCF88, # 52, # 50, # 47, # 45, # 45L, # 25, # CF9, # 95, # 3030, # 3050, MA7, MA77, MA8, MA11, MA100, MA40, OIL7B, OIL9B, OIL11B, OIL30B and OIL31B (Mitsubishi Chemical Corporation); PRINTEX-U, PRINTEX-V, PRINTEX-140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX-35, PRINTEX-25, PRINTEX- 200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101 (Degussa Co., Ltd.); RAVEN-1100ULTRA, RAVEN-1080ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN-850, RAVEN- 820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN-450, RAVEN-430ULTRA, RAVEN-420, RAVEN-410, RAVEN-2500ULTRA, RAVEN-2000, RAVEN-1500, RAVEN-1255, RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, RAVEN-1170 (Colombia Carbon, Inc.), or mixtures thereof.

상기 유기블랙 안료로 아닐린 블랙, 락탐 블랙 또는 페릴렌 블랙계열 등을 사용할 수 있으나, 이로 한정하는 것은 아니다.As the organic black pigment, aniline black, lactam black, or perylene black series may be used, but is not limited thereto.

본 발명에서 자외선 경화형 잉크 조성물은 장파장의 자외선(일예로 365 또는 395 nm)의 조사에 의해 경화되어 일정 수준의 OD(Optical Density)를 갖는 것을 특징으로 한다. 이를 위해, 상기 착색제의 함량은 자외선 경화형 잉크 조성물의 전체 중량에 대하여 1 내지 15 중량%인 것이 바람직하며, 보다 바람직하게는 3 내지 10 중량%일 수 있다. 착색제의 함량이 1중량% 미만일 경우, 베젤에 적용할 만한 수준의 OD가 나타나지 않으며, 15중량% 초과일 경우, 과량의 착색제가 잉크에 분산되지 않고 침전물이 형성될 수 있다.In the present invention, the ultraviolet curable ink composition is cured by irradiation of long wavelength ultraviolet light (for example, 365 or 395 nm), and is characterized by having a certain level of optical density (OD). To this end, the content of the colorant is preferably 1 to 15% by weight, and more preferably 3 to 10% by weight based on the total weight of the ultraviolet curable ink composition. If the content of the colorant is less than 1% by weight, there is no level of OD applicable to the bezel, and if it is more than 15% by weight, the excess colorant is not dispersed in the ink and a precipitate may be formed.

상기 착색제의 함량이 상기 범위 내인 경우 OD는 막 두께 1.0㎛ 당 0.05~2.5인 범위로 유지할 수 있다.When the content of the colorant is within the above range, the OD may be maintained in the range of 0.05 to 2.5 per 1.0 μm of the film thickness.

상기 잉크 조성물은 잉크의 점도를 저하시켜 유동성을 증가시킴으로써 코팅성을 개선하기 위해 착색제를 더 포함할 수 있다. The ink composition may further include a colorant to improve coating properties by lowering the viscosity of the ink to increase fluidity.

상기 착색제로는 메틸 에틸 케톤, 메틸셀로솔브, 에틸셀로솔브, 에틸렌글리콜 디메틸 에테르, 에틸렌글리콜 디에틸 에테르, 프로필렌글리콜 디메틸 에테르, 프로필렌글리콜 디에틸 에테르, 디에틸렌글리콜 디메틸에테르, 디에틸렌글리콜 디에틸에테르, 디에틸렌글리콜 메틸 에틸 에테르, 2-에톡시 프로판올, 2-메톡시 프로판올, 2-에톡시 에탄올, 3-메톡시 부탄올, 시클로헥사논, 시클로펜타논, 프로필렌글리콜 메틸 에테르 아세테이트, 프로필렌글리콜 에틸 에테르 아세테이트, 3-메톡시부틸 아세테이트, 에틸 3-에톡시프로피오네이트, 에틸 셀로솔브아세테이트, 메틸 셀로솔브아세테이트, 부틸 아세테이트, 디프로필렌글리콜 모노메틸 에테르, 시클로헥센 옥사이드 및 프로필렌 카보네이트로 이루어진 군으로부터 선택된 1종 이상을 사용할 수 있으나, 반드시 이에 제한되지는 않는다.The colorants include methyl ethyl ketone, methyl cellosolve, ethyl cellosolve, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol di Ethyl ether, diethylene glycol methyl ethyl ether, 2-ethoxy propanol, 2-methoxy propanol, 2-ethoxy ethanol, 3-methoxy butanol, cyclohexanone, cyclopentanone, propylene glycol methyl ether acetate, propylene glycol From the group consisting of ethyl ether acetate, 3-methoxybutyl acetate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, methyl cellosolve acetate, butyl acetate, dipropylene glycol monomethyl ether, cyclohexene oxide and propylene carbonate You can use one or more selected It is not limited to this.

상기 착색제의 함량은 자외선 경화형 잉크 조성물의 총 중량에 대하여 0~30 중량%인 것이 바람직하며, 보다 바람직하게는 8~20 중량%일 수 있다. 30 중량% 초과이면 경화 감도가 저하된다. The content of the colorant is preferably 0 to 30% by weight, and more preferably 8 to 20% by weight based on the total weight of the ultraviolet curable ink composition. If it is more than 30 weight%, hardening sensitivity will fall.

상기 자외선 경화형 잉크 조성물은 장파장 활성 에너지 선에서의 경화성을 보완하기 위해 광 증감제를 더 포함할 수 있다.The ultraviolet curable ink composition may further include a photosensitizer to compensate for the sclerosis in the long wavelength active energy ray.

상기 광 증감제는 안트라센, 9,10-디부톡시안트라센, 9,10-디메톡시The photosensitizers are anthracene, 9,10-dibutoxyanthracene, 9,10-dimethoxy

안트라센, 9,10-디에톡시안트라센, 2-에틸-9,10-디메톡시안트라센 등의 안트라센계 화합물; 벤조페논, 4,4-비스(디메틸아미노)벤조페논, 4,4-비스(디에틸아미노)벤조페논, 2,4,6-트리메틸아미노벤조페논, 메틸-o-벤조일벤조에이트, 3,3-디메틸-4-메톡시벤조페논, 3,3,4,4-테트라(t-부틸퍼옥시카보닐)벤조페논 등의 벤조페논계 화합물; 아세토페논; 디메톡시아세토페논, 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 프로판온 등의 케톤계 화합물; 페릴렌; 9-플로레논, 2-크로로-9-프로레논, 2-메틸-9-플로레논 등의 플로레논계 화합물; 티옥산톤, 2,4-디에틸 티옥산톤, 2-클로로 티옥산톤, 1-클로로-4-프로필옥시 티옥산톤, 이소프로필티옥산톤(ITX), 디이소프로필티옥산톤 등의 티옥산톤계 화합물; 크산톤, 2-메틸크산톤 등의 크산톤계 화합물; 안트라퀴논, 2-메틸 안트라퀴논, 2-에틸 안트라퀴논, t-부틸 안트라퀴논, 2,6-디클로로-9,10- 안트라퀴논 등의 안트라퀴논계 화합물; 9-페닐아크리딘, 1,7-비스(9-아크리디닐)헵탄, 1,5-비스(9-아크리디닐펜탄), 1,3-비스(9-아크리디닐)프로판 등의 아크리딘계 화합물; 벤질, 1,7,7-트리메틸-비시클로[2,2,1]헵탄-2,3-디온, 9,10-펜안트렌퀴논 등의 디카보닐 화합물; 2,4,6-트리메틸벤조일 디페닐포스핀 옥사이드, 비스(2,6-디메톡시벤조일)-2,4,4-트리메틸펜틸 포스핀 옥사이드 등의 포스핀 옥사이드계 화합물; 메틸-4-(디메틸아미노)벤조에이트, 에틸-4-(디메틸아미노)벤조에이트, 2-n-부톡시에틸-4-(디메틸아미노)벤조에이트 등의 벤조에이트계 화합물; 2,5-비스(4-디에틸아미노벤잘)시클로펜타논, 2,6-비스(4-디에틸아미노벤잘)시클로헥사논, 2,6-비스(4-디에틸아미노벤잘)-4-메틸-시클로펜타논 등의 아미노 시너지스트; 3,3-카본닐비닐-7-(디에틸아미노)쿠마린, 3-(2-벤조티아졸일)-7-(디에틸아미노)쿠마린, 3-벤조일-7-(디에틸아미노)쿠마린, 3-벤조일-7-메톡시-쿠마린, 10,10-카르보닐비스[1,1,7,7-테트라메틸-2,3,6,7-테트라히드로-1H,5H,11H-C1]-벤조피라노[6,7,8-ij]-퀴놀리진-11-온 등의 쿠마린계 화합물; 4-디에틸아미노 칼콘, 4-아지드벤잘아세토페논 등의 칼콘 화합물; 2-벤조일메틸렌; 및 3-메틸-b-나프토티아졸린으로 이루어진 군으로부터 선택되는 1종 이상일 수 있다.Anthracene-based compounds such as anthracene, 9,10-diethoxy anthracene and 2-ethyl-9,10-dimethoxyanthracene; Benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoylbenzoate, 3,3 Benzophenone compounds such as dimethyl-4-methoxybenzophenone and 3,3,4,4-tetra (t-butylperoxycarbonyl) benzophenone; Acetophenone; Ketone compounds such as dimethoxy acetophenone, diethoxy acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, and propanone; Perylene; Fluorenone compounds such as 9-florenone, 2-chloro-9-prorenone, and 2-methyl-9-florenone; Such as thioxanthone, 2,4-diethyl thioxanthone, 2-chloro thioxanthone, 1-chloro-4-propyloxy thioxanthone, isopropyl thioxanthone (ITX) and diisopropyl thioxanthone Thioxanthone type compounds; Xanthone compounds such as xanthone and 2-methylxanthone; Anthraquinone compounds such as anthraquinone, 2-methyl anthraquinone, 2-ethyl anthraquinone, t-butyl anthraquinone and 2,6-dichloro-9,10-anthraquinone; 9-phenylacridine, 1,7-bis (9-acridinyl) heptane, 1,5-bis (9-acridinylpentane), 1,3-bis (9-acridinyl) propane Acridine-based compounds; Dicarbonyl compounds such as benzyl, 1,7,7-trimethyl-bicyclo [2,2,1] heptane-2,3-dione, 9,10-phenanthrenequinone; Phosphine oxide compounds such as 2,4,6-trimethylbenzoyl diphenylphosphine oxide and bis (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentyl phosphine oxide; Benzoate compounds such as methyl-4- (dimethylamino) benzoate, ethyl-4- (dimethylamino) benzoate and 2-n-butoxyethyl-4- (dimethylamino) benzoate; 2,5-bis (4-diethylaminobenzal) cyclopentanone, 2,6-bis (4-diethylaminobenzal) cyclohexanone, 2,6-bis (4-diethylaminobenzal) -4- Amino synergists such as methyl-cyclopentanone; 3,3-carbonylvinyl-7- (diethylamino) coumarin, 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 3-benzoyl-7- (diethylamino) coumarin, 3 -Benzoyl-7-methoxy-coumarin, 10,10-carbonylbis [1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H, 5H, 11H-C1] -benzo Coumarin-based compounds such as pyrano [6,7,8-ij] -quinolizine-11-one; Chalcone compounds such as 4-diethylamino chalcone and 4-azidebenzalacetophenone; 2-benzoylmethylene; And 3-methyl-b-naphthothiazoline may be one or more selected from the group consisting of.

상기 광 증감제는 광중합 개시제 100 중량부에 대해, 1 내지 200 중량부로 포함되는 것이 바람직하고, 더욱 바람직하게는 10 내지 100 중량부로 포함된다. 1 중량부 미만일 경우에는 원하는 파장에서의 경화감도 상승 작용을 기대할 수 없으며, 200 중량부 초과일 경우 광 증감제가 용해되지 못하고 패턴의 접착력 및 가교 밀도를 저하시키는 문제점이 있다.The photosensitizer is preferably included in an amount of 1 to 200 parts by weight, more preferably 10 to 100 parts by weight, based on 100 parts by weight of the photopolymerization initiator. If less than 1 part by weight can not be expected to increase the curing sensitivity at the desired wavelength, if more than 200 parts by weight there is a problem in that the photosensitizer is not dissolved and the adhesion and crosslinking density of the pattern is reduced.

상기 자외선 경화형 잉크 조성물은 첨가제로서 밀착증진제를 더 포함할 수 있다.The ultraviolet curable ink composition may further include an adhesion promoter as an additive.

베젤 패턴 위에 부착된 필름은 온도와 습도 등 사용 조건에 따라 수축과 팽창을 반복함으로써, 베젤 패턴에 응력이 가해지게 되어 필름과 베젤이 기재에서 탈락될 수 있다. 이를 방지하기 위해 밀착증진제로서 아미노 실란계 화합물, 알콕시 실란계 화합물, 에폭시 실란계 화합물, 아미노페닐 실란계 화합물, 아미노 실란계 화합물, 메르캅토 실란계 화합물 및 비닐 실란계 화합물로 이루어진 군으로부터 선택되는 1종 이상의 실란계 화합물을 사용할 경우 우수한 결과 나타낼 수 있다.The film attached on the bezel pattern is repeatedly contracted and expanded according to the use conditions such as temperature and humidity, so that the bezel pattern is stressed so that the film and the bezel may be removed from the substrate. In order to prevent this, 1 selected from the group consisting of amino silane compounds, alkoxy silane compounds, epoxy silane compounds, aminophenyl silane compounds, amino silane compounds, mercapto silane compounds and vinyl silane compounds as adhesion promoters Excellent results can be obtained when more than one silane compound is used.

이 중에서도 에폭시 실란계 화합물이 본 발명의 밀착증진제로 더욱 바람직하다.Among these, epoxy silane compounds are more preferable as the adhesion promoter of the present invention.

본 발명의 일 실시예에서는, 밀착증진제로서 에폭시 실란계 화합물을 사용하여 베젤 패턴과 유리 기재 간에 우수한 밀착력을 나타내었다. 구체적으로, 본 발명의 자외선 경화형 잉크 조성물의 경화 후의 유리 기재에 대한 접착력이 ASTM D3359 규격으로 4B 이상일 수 있다.In one embodiment of the present invention, an epoxy silane-based compound was used as the adhesion promoter to exhibit excellent adhesion between the bezel pattern and the glass substrate. Specifically, the adhesion to the glass substrate after curing of the ultraviolet curable ink composition of the present invention may be 4B or more in ASTM D3359 standard.

상기 밀착증진제는 잉크 조성물 총 중량에 대해 0.1 내지 15 중량%로 포함되는 것이 바람직하며, 보다 바람직하게는 2 내지 10 중량%로 포함된다. 0.1 중량% 미만일 경우에는 베젤 패턴이 유리 기재로부터 박리하는 것을 방지하여 주지 못하며, 15 중량% 초과인 경우에는 잉크 용액의 점도가 상승하고 분산성이 낮은 문제점이 있다.The adhesion promoter is preferably included in 0.1 to 15% by weight based on the total weight of the ink composition, more preferably 2 to 10% by weight. If the amount is less than 0.1 wt%, the bezel pattern may not be prevented from being peeled from the glass substrate. If the amount is more than 15 wt%, the viscosity of the ink solution may be increased and the dispersibility may be low.

본 발명에서 사용하는 자외선 경화형 잉크 조성물은 잉크젯 프린팅 직후 짧은 시간 내에 퍼짐이 일어나서, 우수한 도막 특성을 나타내며, 경화되어 우수한 접착 특성을 나타낸다. 본 발명의 자외선 경화형 잉크 조성물의 우수한 퍼짐성은 구체적으로 유리 기재에 대한 접촉각이 10°미만으로 나타낼 수 있다. 따라서, 상기 자외선 경화형 잉크 조성물을 적용시에는 잉크젯 프린팅과 동시에 경화가 가능하도록 잉크젯 헤드 바로 뒤에 UV-lamp를 설치하는 것이 바람직하다. The ultraviolet curable ink composition used in the present invention spreads within a short time immediately after inkjet printing, exhibits excellent coating film properties, and cures to exhibit excellent adhesive properties. The excellent spreadability of the ultraviolet curable ink composition of the present invention may specifically indicate that the contact angle to the glass substrate is less than 10 °. Therefore, when applying the UV-curable ink composition, it is preferable to install a UV-lamp immediately behind the inkjet head so that the inkjet printing can be cured at the same time.

상기 자외선 경화형 잉크 조성물은 경화 도즈량이 1~10,000 mJ/㎠, 바람직하게는 80~2,000 mJ/㎠이다.The ultraviolet curable ink composition has a curing dose of 1 to 10,000 mJ / cm 2, preferably 80 to 2,000 mJ / cm 2.

상기 자외선 경화형 잉크 조성물은 250 nm 내지 450 nm, 바람직하게는 360 nm 내지 410 nm의 파장 범위에서 방사선을 흡수하여 경화된다.The ultraviolet curable ink composition is cured by absorbing radiation in the wavelength range of 250 nm to 450 nm, preferably 360 nm to 410 nm.

상기 자외선 경화형 잉크 조성물은 일 예로 25℃에서 1cP 내지 50cP, 더욱 바람직하게는 25℃에서 3cp 내지 45cp 이하의 점도를 가짐으로써 잉크젯 공정에 적합하다. 상기 공정 온도는 경화형 잉크 조성물이 잉크젯 헤드를 통해 원활히 토출될 수 있도록 가열한 온도를 의미한다. 공정 온도는 10℃ 내지 100℃일 수 있으며, 바람직하게는 20℃ 내지 70℃일 수 있다.The UV curable ink composition is, for example, suitable for an inkjet process by having a viscosity of 1 cP to 50 cP at 25 ° C., more preferably 3 cps to 45 cps or less at 25 ° C. The process temperature means a temperature heated so that the curable ink composition can be smoothly discharged through the inkjet head. The process temperature may be 10 ° C to 100 ° C, preferably 20 ° C to 70 ° C.

본 발명의 자외선 경화형 잉크 조성물을 사용하여 형성한 베젤 패턴의 유리 기재에 대한 밀착력은, ASTM D3359 규격으로 4B 이상으로, 밀착력 및 코팅성이 우수하다.The adhesive force with respect to the glass base material of the bezel pattern formed using the ultraviolet curable ink composition of this invention is 4B or more in ASTM D3359 standard, and is excellent in adhesive force and coating property.

또한, 상기 자외선 경화형 잉크 조성물은 극성 작용기를 포함하는 계면활성제를 포함함으로써 본 발명에 따라 형성한 베젤 패턴은 점착제가 도포된 필름 기재에 대한 부착력이 우수하다. 구체적으로, 본 발명의 자외선 경화형 잉크 조성물의 경화 후 베젤과 점착제가 도포된 필름 기재와의 부착력은 180도 필 테스트(peel-test)에 의한 필 강도(peel-strength) 기준으로 100~5000gf/25mm 의 값을 가질 수 있다.In addition, the ultraviolet curable ink composition includes a surfactant including a polar functional group, so that the bezel pattern formed according to the present invention has excellent adhesion to a film substrate coated with an adhesive. Specifically, the adhesive force between the bezel and the film-coated film substrate after curing of the ultraviolet curable ink composition of the present invention is 100 to 5000 gf / 25mm based on the peel strength by a 180-degree peel test. It can have a value of.

상기 자외선 경화형 잉크 조성물로 형성한 베젤 패턴의 상단부는 편광판용 점착제층을 개재하여 편광판과 부착되는데, 상기 자외선 경화형 잉크 조성물은 아크릴계 점착제, 스티렌 부타디엔 고무계 점착제, 에폭시 점착제, 폴리비닐알코올계 점착제, 폴리우레탄계 점착제 등의 필름용 점착제와 우수한 부착력을 나타내므로, 상기 자외선 경화형 잉크 조성물을 사용할 경우 베젤 패턴과 편광판을 포함하는 점착제가 도포된 필름 간의 부착력이 개선되는 효과를 얻을 수 있다. 본 발명에서는 상부 기재를 편광판이나 보호 필름으로 한정하지 않는다. The upper end of the bezel pattern formed of the ultraviolet curable ink composition is attached to the polarizing plate through the pressure-sensitive adhesive layer for the polarizing plate, the ultraviolet curable ink composition is an acrylic pressure sensitive adhesive, styrene butadiene rubber pressure sensitive adhesive, epoxy pressure sensitive adhesive, polyvinyl alcohol pressure sensitive adhesive, polyurethane type Since the adhesive for films such as pressure-sensitive adhesives and the like excellent adhesive force, when using the UV-curable ink composition can be obtained an effect of improving the adhesion between the bezel pattern and the film coated with the adhesive including the polarizing plate. In this invention, an upper base material is not limited to a polarizing plate or a protective film.

필름에 도포된 점착제의 종류에 따라 부착력이 다르게 측정될 수 있으므로, 본 발명에 기재된 베젤 패턴과 상부 기재 간의 부착력을 측정하는 기준은 일본 공업규격 JIS Z 1522에서 사용하는 Nichiban CT-24 테이프를 사용하여 측정한 필 강도 값을 기준으로 한다. 이 때, 베젤 패턴과 상부 기재간의 부착력이 100~5000gf/25mm 범위 내를 갖는 부착력 특성은 본 발명의 특징 범주에 속한다. Since the adhesive force may be measured differently according to the type of the adhesive applied to the film, the standard for measuring the adhesive force between the bezel pattern and the upper substrate described in the present invention using Nichiban CT-24 tape used in Japanese Industrial Standard JIS Z 1522 Based on the measured peel strength value. At this time, the adhesive force property having the adhesive force between the bezel pattern and the upper substrate in the range of 100 to 5000 gf / 25 mm belongs to the characteristic category of the present invention.

본 발명의 디스플레이 기판의 베젤 패턴의 제조방법은 상기 자외선 경화형 잉크 조성물을 이용한다.The manufacturing method of the bezel pattern of the display substrate of this invention uses the said ultraviolet curable ink composition.

구체적으로, 본 발명의 디스플레이 기판의 베젤 패턴의 제조방법은, a) 상기 자외선 경화형 잉크 조성물을 사용하여, 기판 상에 베젤 패턴을 형성하는 단계; 및 b) 상기 베젤 패턴을 경화하는 단계;를 포함한다.Specifically, the method of manufacturing a bezel pattern of the display substrate of the present invention, a) using the ultraviolet curable ink composition, forming a bezel pattern on the substrate; And b) curing the bezel pattern.

또한 본 발명의 디스플레이 기판의 베젤 패턴의 제조방법은, 상기 a) 베젤 패턴을 형성하는 단계 이전에, 기판의 세정 및 건조 단계를 더 포함할 수 있다. 이는 잉크의 코팅성 향상 및 이물질로 인한 얼룩의 제거를 위해 기판의 표면에너지에 따라 표면 처리를 선택적으로 실시하기 위함이다.In addition, the method for manufacturing a bezel pattern of the display substrate of the present invention may further include a step of cleaning and drying the substrate before the step of forming the bezel pattern. This is to selectively perform the surface treatment according to the surface energy of the substrate in order to improve the coating property of the ink and to remove stains caused by foreign substances.

구체적으로 상기 표면 처리는 습식 표면처리, UV 오존, 상압 플라즈마 등의 처리에 의하여 실시 될 수 있다.Specifically, the surface treatment may be performed by a treatment such as a wet surface treatment, UV ozone, atmospheric pressure plasma.

상기 기판상에 베젤패턴을 형성하는 방법으로는 포토리소그라피 및 스크린 인쇄 대신 자외선 경화 수지를 이용한 잉크젯(Inkjet) 인쇄, 그라비아(Gravure) 코팅 및 리버스 오프셋(Reverse offset) 코팅 중에서 선택된 방법을 사용할 수 있다. 상기 방법을 적용하기 위해 본 발명의 잉크 조성물의 점도는 1 cP 내지 50 cP일 수 있으며, 3cp 내지 45cp 인 것이 바람직하다. As a method of forming a bezel pattern on the substrate, a method selected from inkjet printing, gravure coating, and reverse offset coating using an ultraviolet curable resin may be used instead of photolithography and screen printing. In order to apply the method, the viscosity of the ink composition of the present invention may be 1 cP to 50 cP, and preferably 3 cps to 45 cps.

상기의 방법으로 기판의 특정 부분에 베젤 패턴을 형성하기 위해 1 cP 내지 50 cP의 낮은 점도를 지니는 잉크 조성물을 0.1 내지 20 ㎛, 보다 구체적으로는 0.5 내지 5 ㎛의 높이로 도포한다. 도포된 상기 조성물은 자외선을 포함하는 노광을 통해 경화되며, 그 결과 0.1 내지 20 ㎛, 보다 구체적으로는 0.5 내지 5 ㎛의 얇은 막 두께를 지니는 베젤 패턴이 제조될 수 있다.An ink composition having a low viscosity of 1 cP to 50 cP is applied at a height of 0.1 to 20 μm, more specifically 0.5 to 5 μm, to form a bezel pattern on a specific portion of the substrate by the above method. The applied composition is cured through exposure including ultraviolet rays, and as a result, a bezel pattern having a thin film thickness of 0.1 to 20 μm, more specifically 0.5 to 5 μm, can be produced.

본 발명에서 사용하는 자외선 경화형 잉크 조성물은 잉크젯 프린팅 직후 짧은 시간 내에 퍼짐이 일어나서, 우수한 도막 특성을 나타내며, 경화되어 우수한 접착 특성을 나타낸다. 본 발명의 자외선 경화형 잉크 조성물의 우수한 퍼짐성은 구체적으로 유리 기재에 대한 접촉각이 10°미만으로 나타낼 수 있다. 따라서, 상기 자외선 경화형 잉크 조성물을 적용시에는 잉크젯 프린팅과 동시에 경화가 가능하도록 잉크젯 헤드 바로 뒤에 UV-lamp를 설치하는 것이 바람직하다. The ultraviolet curable ink composition used in the present invention spreads within a short time immediately after inkjet printing, exhibits excellent coating film properties, and cures to exhibit excellent adhesive properties. The excellent spreadability of the ultraviolet curable ink composition of the present invention may specifically indicate that the contact angle to the glass substrate is less than 10 °. Therefore, when applying the UV-curable ink composition, it is preferable to install a UV-lamp immediately behind the inkjet head so that the inkjet printing can be cured at the same time.

본 발명에 자외선 경화성 잉크 조성물을 경화시키기 위한 광원으로는, 예컨대 파장이 250 내지 450㎚의 광을 발산하는 수은 증기 아크(arc), 탄소 아크, Xe 아크, LED 경화기 등이 있으나 반드시 이에 국한되지는 않는다.Light sources for curing the ultraviolet curable ink composition of the present invention include, but are not limited to, mercury vapor arcs, carbon arcs, Xe arcs, LED curing machines, etc., which emit light having a wavelength of 250 to 450 nm, for example. Do not.

상기 베젤 패턴은 경화 처리한 후에 측정되는 테이퍼 각이 0° 초과 30°이고, 두께가 0.1㎛~20㎛ 인 것을 특징으로 한다. 또한, 상기 테이퍼 각은 바람직하게는 0° 초과 10°일 수 있다. 또한, 상기 두께는 바람직하게는 0.5㎛~5㎛ 일 수 있다. 본 발명의 베젤 패턴은 상기와 같은 특징을 가짐으로써 큰 단차에 의한 단락, 기포 발생 및 필름의 이형에 따른 시감 품위 저하를 나타내지 않을 수 있다.The bezel pattern is characterized in that the taper angle measured after the curing treatment is more than 0 ° 30 °, thickness is 0.1㎛ ~ 20㎛. In addition, the taper angle may preferably be greater than 0 ° and 10 °. In addition, the thickness may be preferably 0.5㎛ ~ 5㎛. Since the bezel pattern of the present invention has the above characteristics, it may not exhibit deterioration of the luminous quality due to short circuit due to a large step, bubble generation, and mold release.

상기 베젤패턴의 광학밀도는 막 두께 1.0㎛ 당 0.05~2.5, 필요에 따라, 0.25 내지 1.0 일 수 있다. 이 경우 베젤패턴에 의한 차폐특성이 우수한 장점이 있다. 광학밀도가 2.5를 초과할 경우에는 투입해야 할 안료의 요구 함량이 매우 높아지기 때문에 잉크의 제조 및 잉크젯 공정에 악영향을 미칠 수 있으며, 자외선 경화성 잉크 조성물이 방사선에 의한 경화되는 것을 저해 할 수 있다.The optical density of the bezel pattern may be 0.05 to 2.5 per 1.0 μm film thickness, if necessary, 0.25 to 1.0. In this case, there is an advantage of excellent shielding characteristics by the bezel pattern. When the optical density exceeds 2.5, since the required content of the pigment to be added is very high, it may adversely affect the ink manufacturing and inkjet process, and may inhibit the UV curable ink composition from being cured by radiation.

또한, 본 발명의 자외선 경화형 잉크 조성물은 극성 작용기를 포함하는 계면활성제를 포함함으로써 본 발명에 따라 형성한 베젤 패턴은 편광판에 대한 부착력이 우수하다. 구체적으로, 본 발명의 자외선 경화형 잉크 조성물의 경화 후의 상부 부착력은 100~5000gf/25mm 의 값을 가질 수 있다.In addition, the ultraviolet curable ink composition of the present invention includes a surfactant containing a polar functional group, so that the bezel pattern formed according to the present invention has excellent adhesion to the polarizing plate. Specifically, the upper adhesion after curing of the ultraviolet curable ink composition of the present invention may have a value of 100 ~ 5000gf / 25mm.

본 발명에 따라 형성한 상기 베젤 패턴은 경화 처리한 후의 유리 기재에 대한 밀착력이 ASTM D3359 규격으로 4B 이상으로, 우수하다.The bezel pattern formed according to the present invention is excellent in adhesion to the glass substrate after curing treatment, 4B or more in the ASTM D3359 standard.

본 발명은 상기 방법에 의해 제조된 디스플레이 기판의 베젤 패턴을 제공한다. 본 발명에서 베젤패턴은 시계, 디스플레이 장치 등 각종 장치의 테두리부분에 형성되는 패턴을 말한다.The present invention provides a bezel pattern of a display substrate manufactured by the above method. In the present invention, the bezel pattern refers to a pattern formed on the edges of various devices such as a watch and a display device.

상기 베젤 패턴은 경화 처리한 후에 측정되는 테이퍼 각이 0° 초과 30°이고, 두께가 0.1㎛~20㎛인 것을 특징으로 한다. 또한, 상기 테이퍼 각은 바람직하게는 0° 초과 10°일 수 있다. 또한, 상기 두께는 바람직하게는 0.5㎛~5㎛일 수 있다. 본 발명의 베젤 패턴은 상기와 같은 특징을 가짐으로써 큰 단차에 의한 단락, 기포 발생 및 필름의 이형에 따른 시감 품위 저하를 나타내지 않을 수 있다.The bezel pattern is characterized in that the taper angle measured after the curing treatment is more than 0 ° 30 °, thickness is 0.1㎛ ~ 20㎛. In addition, the taper angle may preferably be greater than 0 ° and 10 °. In addition, the thickness may be preferably 0.5㎛ ~ 5㎛. Since the bezel pattern of the present invention has the above characteristics, it may not exhibit deterioration of the luminous quality due to short circuit due to a large step, bubble generation, and mold release.

상기 베젤패턴의 광학밀도는 막 두께 2.0㎛ 기준으로 0.1 내지 5이며, 필요에 따라, 0.5 내지 2일 수 있다. 이 경우 베젤패턴에 의한 차폐특성이 우수한 장점이 있다. 광학밀도가 5를 초과할 경우에는 투입해야 할 안료의 요구 함량이 매우 높아지기 때문에 잉크의 제조 및 잉크젯 공정에 악영향을 미칠 수 있으며, 자외선 경화성 잉크 조성물이 방사선에 의한 경화되는 것을 저해 할 수 있다.The optical density of the bezel pattern is 0.1 to 5 on the basis of the film thickness of 2.0㎛, if necessary, may be 0.5 to 2. In this case, there is an advantage of excellent shielding characteristics by the bezel pattern. When the optical density exceeds 5, the required content of the pigment to be added is very high, which may adversely affect the ink production and inkjet process, and may inhibit the UV curable ink composition from being cured by radiation.

또한, 본 발명의 자외선 경화형 잉크 조성물은 극성 작용기를 포함하는 계면활성제를 포함함으로써 본 발명에 따라 형성한 베젤 패턴은 편광판에 대한 부착력이 우수하다. 구체적으로, 본 발명의 자외선 경화형 잉크 조성물의 경화 후의 상부 부착력은 100~5000gf/25mm 의 값을 가질 수 있다.In addition, the ultraviolet curable ink composition of the present invention includes a surfactant containing a polar functional group, so that the bezel pattern formed according to the present invention has excellent adhesion to the polarizing plate. Specifically, the upper adhesion after curing of the ultraviolet curable ink composition of the present invention may have a value of 100 ~ 5000gf / 25mm.

상기 베젤 패턴은 경화 처리한 후의 유리 기재에 대한 밀착력이 ASTM D3359 규격으로 4B 이상으로, 우수하다.The said bezel pattern is excellent in the adhesive force with respect to the glass base material after hardening process being more than 4B by ASTM D3359 standard.

또한, 본 발명은 상기 베젤 패턴을 포함하는 디스플레이 기판을 제공한다.In addition, the present invention provides a display substrate including the bezel pattern.

상기 디스플레이는 플라즈마 디스플레이 패널(Plasma Display Panel, PDP), 발광 다이오드(Light Emitting Diode, LED), 유기 발광 소자(Organic Light Emitting Diode, OLED), 액정 표시 장치(Liquid Crystal Display, LCD), 박막 트랜지스터 액정 표시 장치(Thin Film Transistor- Liquid Crystal Display, LCD-TFT) 및 음극선관(Cathode Ray Tube, CRT) 중 어느 하나에 사용되는 것일 수 있다.The display includes a plasma display panel (PDP), a light emitting diode (LED), an organic light emitting diode (OLED), a liquid crystal display (LCD), a thin film transistor liquid crystal The display device may be used in any one of a thin film transistor-liquid crystal display (LCD-TFT) and a cathode ray tube (CRT).

이하, 본 발명을 실시예를 들어 상세하게 설명한다. 하기 실시예는 본 발명을 설명하기 위한 것으로, 본 발명의 범위는 하기의 특허청구범위에 기재된 범위 및 그 치환 및 변경을 포함하며, 실시예의 범위로 한정되지 않는다.Hereinafter, an Example is given and this invention is demonstrated in detail. The following examples are provided to illustrate the present invention, and the scope of the present invention includes the ranges described in the following claims, their substitutions and changes, and is not limited to the examples.

<실시예><Example>

하기 표 1에서와 같은 조성으로 혼합하고, 3시간 동안 교반하여, 실시예 1 내지 4 및 비교예 1 내지 2의 베젤 패턴 형성용 조성물을 제조하였다.To be mixed in the same composition as in Table 1, and stirred for 3 hours to prepare a composition for forming bezel patterns of Examples 1 to 4 and Comparative Examples 1 and 2.

표 1 착색제 에폭시 옥세탄 중합개시제 계면활성제 밀착증진제 실시예 A B C D E F 1 A1: 3 B1: 15 C1: 77 D1: 3 E1: 1 F1: 1 2 A1: 3 B1: 15 C1: 77.5 D1: 3 E2: 0.5 F1: 1 3 A1: 5 B1: 25 C1: 64.5 D1: 3 E3: 1.5 F2: 1 4 A1: 3 B1: 15 C1: 77 D1: 3 E4: 1 F3: 1 비교예 1 A1: 3 B1: 15 C1: 78 D1: 3 - F3: 1 2 A1: 3 B1: 15 C1: 73 D1: 3 E5: 5 F3: 1 Table 1 coloring agent Epoxy Oxetane Polymerization initiator Surfactants Adhesion promoter Example A B C D E F One A1: 3 B1: 15 C1: 77 D1: 3 E1: 1 F1: 1 2 A1: 3 B1: 15 C1: 77.5 D1: 3 E2: 0.5 F1: 1 3 A1: 5 B1: 25 C1: 64.5 D1: 3 E3: 1.5 F2: 1 4 A1: 3 B1: 15 C1: 77 D1: 3 E4: 1 F3: 1 Comparative example One A1: 3 B1: 15 C1: 78 D1: 3 - F3: 1 2 A1: 3 B1: 15 C1: 73 D1: 3 E5: 5 F3: 1

A1: 카본 블랙A1: carbon black

B1: 셀록사이드 2021P(다이셀코포레이션)B1: CELLOXIDE 2021P (DICEL CORPORATION)

C1: 아론옥세탄 221 (토아고세이)C1: Aaron Oxetane 221 (Toagosei)

D1: SP-150 (Asahi Denka)D1: SP-150 (Asahi Denka)

E1: RS-75 (DIC)E1: RS-75 (DIC)

E2: BYK-388 (BYK chemie)E2: BYK-388 (BYK chemie)

E3: F-484 (DIC)E3: F-484 (DIC)

E4: BYK-3441 (BYK chemie)E4: BYK-3441 (BYK chemie)

E5: BYK-330 (BYK chemie)E5: BYK-330 (BYK chemie)

F1: 2-(3,4-에폭시씨클로헥실) 에틸트리메톡시실란F1: 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane

F2: 3-메타크릴록시프로필 트리에톡시실란F2: 3-methacryloxypropyl triethoxysilane

F3: 8-메타크릴록시옥틸트리메톡시실란F3: 8-methacryloxyoctyltrimethoxysilane

<제조예 1> 베젤 패턴의 제조Production Example 1 Preparation of Bezel Pattern

상기 실시예 1 내지 4 및 비교예 1 내지 2에서 제조한 조성물을 세정된 LCD 글라스 기재 상에 경화 후에 두께가 2㎛가 되도록 잉크젯 코팅 방법으로 코팅하였다. 이물질 부착을 방지하기 위해 코팅 후 1분 이내에 코팅층을 하기 조건으로 자외선을 조사하여 경화함으로써 베젤 패턴을 형성하였다. 자외선 조사기는 자외선 방출 파장 영역이 넓은 고압 수은등을 사용하였다. 1000mJ/cm2의 자외선을 조사 후 베젤 패턴의 경화 여부를 판별하기 위해 라텍스 장갑을 착용한 후, 눌러보아 압흔 및 tack감을 관찰하였다.The compositions prepared in Examples 1 to 4 and Comparative Examples 1 and 2 were coated on the cleaned LCD glass substrate by an inkjet coating method so as to have a thickness of 2 μm after curing. In order to prevent adhesion of foreign substances, the bezel pattern was formed by curing the coating layer by irradiating UV under the following conditions within 1 minute after coating. The ultraviolet irradiator used a high-pressure mercury lamp having a wide ultraviolet emission wavelength range. After irradiating 1000mJ / cm 2 ultraviolet rays, latex gloves were worn to determine whether the bezel pattern was cured, and then pressed to observe indentation and tack.

<제조예 2> 베젤 패턴을 이용한 디스플레이 소자의 제조Production Example 2 Fabrication of Display Device Using Bezel Pattern

디스플레이 패널(이하 패널) 상부면에 상기 제조예 1의 방법을 따라 베젤 패턴을 형성하고, 상부 기재로서 아크릴계 점착층을 사용하는 LG화학 제조 NRT 편광필름을 부착하였다. 부착 후에는 편광 필름과 패턴의 틈으로 수분 및 이물질이 혼입되는 것을 방지하기 위해, 씰런트로 주위를 인캡하였다.A bezel pattern was formed on the upper surface of the display panel (hereinafter referred to as Panel 1) according to the method of Preparation Example 1, and an NRT polarizing film manufactured by LG Chemical using an acrylic adhesive layer was attached as an upper substrate. After attachment, the surroundings were encapsulated with a sealant to prevent the ingress of moisture and foreign matter into the gap between the polarizing film and the pattern.

<실험예 1>: 점도Experimental Example 1 Viscosity

상기 실시예 1 내지 4 및 비교예 1 내지 2에서 제조한 조성물에 대해 점도를 측정하였다. 점도 측정 장비로 Brookfield사의 DV-Ⅲ+를 사용하였다.The viscosity of the compositions prepared in Examples 1 to 4 and Comparative Examples 1 to 2 was measured. Brookfield's DV-III + was used as a viscosity measuring instrument.

<실험예 2>: 경화 감도의 측정 Experimental Example 2 Measurement of Curing Sensitivity

상기 제조예 1에 따라 제조한 베젤 패턴의 경화 감도를 측정하기 위해 자외선 조사 후 5분 경과한 시점에서 라텍스 장갑을 착용한 후 눌러보아 표면의 상태를 확인하였다. In order to measure the curing sensitivity of the bezel pattern manufactured according to Preparation Example 1, the state of the surface was confirmed by pressing latex gloves after 5 minutes after ultraviolet irradiation.

○: 베젤 패턴이 끈적이지 않으며, 완전히 경화됨○: The bezel pattern is not sticky and is fully cured

△: 베젤 패턴이 경화되었으나, 끈적임이 있음(Triangle | delta): The bezel pattern was hardened, but there was stickiness

×: 베젤 패턴의 경화가 불충분하여 미반응 잔여물이 묻어남×: hardening of the bezel pattern was insufficient, resulting in unreacted residue

<실험예 3>: 퍼짐성 평가<Experiment 3>: spreadability evaluation

상기 실시예 1 내지 4 및 비교예 1 내지 2에서 제조한 조성물을 세정된 LCD 글라스 기재 상에 도포한 후, 접촉각을 측정하였다.After applying the composition prepared in Examples 1 to 4 and Comparative Examples 1 and 2 on the washed LCD glass substrate, the contact angle was measured.

<실험예 4>: 필름/베젤 패턴 간 부착력평가Experimental Example 4 Evaluation of Adhesion between Film / Bezel Patterns

점착층이 도포된 폭 25mm, 길이 50 내지 100mm의 크기의 편광 필름을 롤 라미네이터(roll laminator)를 이용하여 상온에서 베젤 패턴에 부착시켰다. 180° 필 테스트를 실시하여 필름이 베젤에서 박리될 때의 필 강도 측정 결과를 하기 표 2에 나타냈다. A polarizing film having a width of 25 mm and a length of 50 to 100 mm to which an adhesive layer was applied was attached to a bezel pattern at room temperature using a roll laminator. The peel strength measurement results when the film was peeled off the bezel by performing a 180 ° peel test are shown in Table 2 below.

<실험예 5>: 크로스-해치 밀착력Experimental Example 5 Cross-hatch Adhesion

제조예 1에서 제조된 베젤 패턴을 크로스 컷 시험 기준인 ASTM D3359의 규격에 준거하여, 크로스 컷 테스트를 수행하였다. 크로스 컷 테스트를 수행하기 전에 샘플에 따라 밀착증진제의 반응을 촉진시키기 위해 60도의 온도에서 1분 간 열처리를 수행할 수 있다. 구체적으로, 시편을 1 mm의 간격으로 가로 및 세로 방향으로 각각 11줄씩 칼로 그어서 가로와 세로가 각각 1 mm인 100개의 정사각형 격자를 형성하였다. 그 후, Nichiban사의 CT-24 접착 테이프를 상기 재단면에 부착한 후 떼어낼 때에, 함께 떨어지는 면의 상태를 측정하여 하기 기준으로 평가하였다.The bezel pattern manufactured in Preparation Example 1 was subjected to a cross cut test in accordance with the standard of ASTM D3359, which is a cross cut test criterion. Before performing the cross cut test, the heat treatment may be performed for 1 minute at a temperature of 60 degrees to facilitate the reaction of the adhesion promoter depending on the sample. Specifically, the specimens were cut in 11 rows in the horizontal and vertical directions at intervals of 1 mm, respectively, to form 100 square grids each having a width of 1 mm. Then, when the CT-24 adhesive tape of Nichiban Co., Ltd. was attached to the cut surface and then peeled off, the state of the faces falling together was measured and evaluated according to the following criteria.

<크로스-해치 접착력 평가 기준><Cross-Hatch Adhesive Evaluation Criteria>

5B: 떨어진 면이 없는 경우5B: If no faces fall

4B: 떨어진 면이 총 면적 대비 5% 이내인 경우4B: If the faces fall within 5% of the total area

3B: 떨어진 면이 총 면적 대비 5 내지 15%인 경우3B: 5-15% of total surface area

2B: 떨어진 면이 총 면적 대비 15 내지 35%인 경우2B: 15 to 35% of total area apart

1B: 떨어진 면이 총 면적 대비 35 내지 65%인 경우1B: 35 to 65% of total surface area

0B: 거의 대부분이 떨어지는 경우0B: almost everything falls

표 2 실시예 점도 경화 유무 퍼짐성 상부부착력 밀착력(at 5분) 조건 (cP) UV 조사 5분 후,O: tack-free△: tack감 X: 미반응 접촉각O: <10°△: 10°~30°X: >30° peel test (Nichiban tape) Cross cut test 1 16 O O 500~1500 4B 2 16 O O 1500~2500 4B 3 24 O O 500~1000 4B 4 16 O O 1000~1500 4B 비교예 1 16 O X 100~200 4B 2 15 O O 10~50 4B TABLE 2 Example Viscosity Hardening Spreadability Upper adhesion Adhesion (at 5 minutes) Condition (cP) 5 minutes after UV irradiation, O: tack-freeΔ: tack feeling X: unreacted Contact angle O: <10 ° △: 10 ° to 30 ° X:> 30 ° peel test (Nichiban tape) Cross cut test One 16 O O 500-1500 4B 2 16 O O 1500-2500 4B 3 24 O O 500-1000 4B 4 16 O O 1000-1500 4B Comparative example One 16 O X 100-200 4B 2 15 O O 10-50 4B

실험 결과, 극성 작용기를 포함하는 계면 활성제를 사용하는 실시예 1 내지 4의 잉크 조성물은 낮은 접촉각을 나타내고, 높은 상부 부착력을 가지는데 비해, 극성 작용기를 포함하지 않는 계면 활성제를 사용하는 비교예 1의 잉크 조성물은 높은 접촉각을 나타내고, 비교예 2의 잉크 조성물은 낮은 상부 부착력을 가진다는 문제점이 있었다.As a result of the experiment, the ink compositions of Examples 1 to 4 using a surfactant containing a polar functional group showed a low contact angle and had a high upper adhesion, whereas the ink compositions of Comparative Example 1 using a surfactant containing a polar functional group were not used. The ink composition exhibits a high contact angle, and there is a problem that the ink composition of Comparative Example 2 has a low top adhesion.

Claims (48)

착색제, 에폭시 수지, 옥세탄 수지, 광중합 개시제 및 극성 작용기를 포함하는 계면활성제를 포함하고, A surfactant comprising a colorant, an epoxy resin, an oxetane resin, a photopolymerization initiator, and a polar functional group, 상기 에폭시 수지: 옥세탄 수지의 함량비율이 1:0.5~1:6이고,The content ratio of the epoxy resin: oxetane resin is 1: 0.5 to 1: 6, 경화 후의 유리 기재에 대한 접착력이 ASTM D3359 규격으로 4B 이상이고, 유리 기재에 대한 접촉각이 10°미만이고,The adhesion to the glass substrate after curing is 4B or more in ASTM D3359 standard, the contact angle to the glass substrate is less than 10 °, 경화 후의 상부 부착력이 100~5000gf/25mm 인 자외선 경화형 잉크 조성물UV curable ink composition with top adhesion after curing of 100 to 5000 gf / 25mm 청구항 1에 있어서, The method according to claim 1, 밀착증진제, 착색제 및 광증감제로 이루어지는 군에서 선택되는 어느 하나 이상을 더 포함하는 것을 특징으로 하는 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition further comprising any one or more selected from the group consisting of adhesion promoters, colorants and photosensitizers. 청구항 1에 있어서,The method according to claim 1, 상기 극성 작용기를 포함하는 계면활성제는 카르복실기, 히드록시기, 인산기 및 설폰산기로 이루어지는 군에서 선택되는 어느 하나의 작용기를 포함하는 것을 특징으로 하는 자외선 경화형 잉크 조성물. The surfactant including the polar functional group includes any one functional group selected from the group consisting of a carboxyl group, a hydroxyl group, a phosphoric acid group and a sulfonic acid group. 청구항 3에 있어서,The method according to claim 3, 상기 계면활성제는 고분자형 또는 올리고머형 불소계 계면활성제이고, solubility parameter 값이 15 (MPa)0.5 미만인 용매에 용해되지 않고, solubility parameter 값이 45 (MPa)0.5 이상인 용매에 0.1중량% 이상 용해되지 않고, solubility parameter 값이 15 내지 21 (MPa)0.5인 용매에 1중량% 이상 용해되며 상분리가 없는 것을 특징으로 하는 자외선 경화형 잉크 조성물.The surfactant is a polymer or oligomeric fluorine-based surfactant, does not dissolve in a solvent having a solubility parameter value of less than 15 (MPa) 0.5 , does not dissolve at least 0.1% by weight in a solvent having a solubility parameter value of 45 (MPa) 0.5 or more, UV curable ink composition characterized in that the solubility parameter value is dissolved in a solvent having a value of 15 to 21 (MPa) 0.5 or more% by weight and no phase separation. 청구항 4에 있어서,The method according to claim 4, 상기 solubility parameter 값이 15 (MPa)0.5 미만인 용매는 헥산이고, 상기 solubility parameter 값이 45 (MPa)0.5 이상인 용매는 물이고, 상기 solubility parameter 값이 15 내지 21 (MPa)0.5인 용매는 PGME(propyelne glycol monomethyl ether) 또는 톨루엔인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The solvent having a solubility parameter value of less than 15 (MPa) 0.5 is hexane, the solvent having a solubility parameter value of 45 (MPa) 0.5 or more is water, and the solvent having a solubility parameter value of 15 to 21 (MPa) 0.5 is PGME (propyelne). glycol monomethyl ether) or toluene, UV curable ink composition. 청구항 3에 있어서,The method according to claim 3, 상기 계면활성제는 실리콘계 첨가제로 반응성 히드록시기를 포함하는 계면활성제 인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The surfactant is a UV curable ink composition, characterized in that the surfactant containing a reactive hydroxyl group as a silicone-based additive. 청구항 3에 있어서,The method according to claim 3, 상기 계면활성제는 불소 성분을 포함하지 않는 비실리콘계 계면활성제 인 것을 특징으로 하는 자외선 경화형 잉크 조성물.Said surfactant is a non-silicone type surfactant which does not contain a fluorine component, The ultraviolet curable ink composition characterized by the above-mentioned. 청구항 3에 있어서,The method according to claim 3, 상기 극성 작용기를 포함하는 계면활성제는 상기 자외선 경화형 잉크 조성물 총 중량에 대해 0.1 내지 5.0 중량%로 포함되는 것을 특징으로 하는 자외선 경화형 잉크 조성물.The surfactant including the polar functional group is UV curable ink composition, characterized in that contained in 0.1 to 5.0% by weight relative to the total weight of the ultraviolet curable ink composition. 청구항 1에 있어서,The method according to claim 1, 상기 옥세탄 수지는 1개의 옥세탄 고리를 갖는 옥세탄 화합물 및 2개의 옥세탄 고리를 갖는 옥세탄 화합물을 포함하는 것을 특징으로 하는 자외선 경화형 잉크 조성물.The oxetane resin is an ultraviolet curable ink composition comprising an oxetane compound having one oxetane ring and an oxetane compound having two oxetane rings. 청구항 9에 있어서, The method according to claim 9, 상기 1개의 옥세탄 고리를 갖는 옥세탄 화합물: 2개의 옥세탄 고리를 갖는 옥세탄 화합물의 함량비율이 1:16 내지 1:3인 것을 특징으로 하는 자외선 경화형 잉크 조성물.Oxetane compound having one oxetane ring: The ultraviolet curable ink composition, characterized in that the content ratio of the oxetane compound having two oxetane rings is 1:16 to 1: 3. 청구항 1에 있어서, The method according to claim 1, 상기 에폭시 수지의 함량은 상기 자외선 경화형 잉크 조성물의 총 중량에 대하여 5~50 중량%인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The content of the epoxy resin is UV curable ink composition, characterized in that 5 to 50% by weight relative to the total weight of the ultraviolet curable ink composition. 청구항 1에 있어서, The method according to claim 1, 상기 옥세탄 수지의 함량은 상기 자외선 경화형 잉크 조성물의 총 중량에 대하여 15~75 중량%인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The content of the oxetane resin is an ultraviolet curable ink composition, characterized in that 15 to 75% by weight relative to the total weight of the ultraviolet curable ink composition. 청구항 1에 있어서, The method according to claim 1, 상기 광중합 개시제는 요오드늄 염 또는 설포늄 염인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The photopolymerization initiator is an ultraviolet curable ink composition, characterized in that the iodonium salt or sulfonium salt. 청구항 1에 있어서, The method according to claim 1, 상기 광중합 개시제의 함량은 상기 자외선 경화형 잉크 조성물의 총 중량에 대하여 1~15 중량%인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The content of the photopolymerization initiator is UV curable ink composition, characterized in that 1 to 15% by weight based on the total weight of the ultraviolet curable ink composition. 청구항 1에 있어서,The method according to claim 1, 상기 착색제의 함량은 상기 자외선 경화형 잉크 조성물의 총 중량에 대하여 1~15 중량%인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The content of the colorant is UV curable ink composition, characterized in that 1 to 15% by weight based on the total weight of the ultraviolet curable ink composition. 청구항 2에 있어서, The method according to claim 2, 상기 착색제의 함량은 상기 자외선 경화형 잉크 조성물의 총 중량에 대하여 0~30 중량%인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The content of the colorant is UV curable ink composition, characterized in that 0 to 30% by weight based on the total weight of the ultraviolet curable ink composition. 청구항 2에 있어서,The method according to claim 2, 상기 광 증감제는 상기 광중합 개시제 100 중량부에 대해 1 내지 200 중량부로 포함되는 것을 특징으로 하는 자외선 경화형 잉크 조성물.The photosensitizer is UV curable ink composition, characterized in that included in 1 to 200 parts by weight based on 100 parts by weight of the photopolymerization initiator. 청구항 2에 있어서,The method according to claim 2, 상기 밀착증진제는 아미노 실란계 화합물, 알콕시 실란계 화합물, 에폭시 실란계 화합물, 아미노페닐 실란계 화합물, 아미노 실란계 화합물, 메르캅토 실란계 화합물 및 비닐 실란계 화합물로 이루어진 군으로부터 선택되는 1종 이상의 실란계 화합물인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The adhesion promoter is at least one silane selected from the group consisting of amino silane compounds, alkoxy silane compounds, epoxy silane compounds, aminophenyl silane compounds, amino silane compounds, mercapto silane compounds and vinyl silane compounds. UV-curable ink composition, characterized in that the compound. 청구항 2에 있어서,The method according to claim 2, 상기 밀착증진제는 상기 자외선 경화형 잉크 조성물 총 중량에 대해 0.1 내지 15 중량%로 포함되는 것을 특징으로 하는 자외선 경화형 잉크 조성물.The adhesion promoter is an ultraviolet curable ink composition, characterized in that contained in 0.1 to 15% by weight relative to the total weight of the ultraviolet curable ink composition. 청구항 1에 있어서,The method according to claim 1, 상기 자외선 경화형 잉크 조성물의 경화 도즈량이 1~10,000 mJ/㎠인 것을 특징으로 하는 자외선 경화형 잉크 조성물. The cured dose of the said ultraviolet curable ink composition is 1-10,000 mJ / cm <2>, The ultraviolet curable ink composition characterized by the above-mentioned. 청구항 1에 있어서,The method according to claim 1, 상기 자외선 경화형 잉크 조성물의 점도는 25℃에서 1cp 내지 50cp인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The viscosity of the ultraviolet curable ink composition is UV curable ink composition, characterized in that 1cp to 50cp at 25 ℃. 청구항 21에 있어서,The method according to claim 21, 상기 자외선 경화형 잉크 조성물의 점도는 25℃에서 3cp 내지 45cp인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The viscosity of the ultraviolet curable ink composition is UV curable ink composition, characterized in that 3cp to 45cp at 25 ℃. 청구항 1에 있어서, The method according to claim 1, 상기 자외선 경화형 잉크 조성물의 경화 후 테이퍼 각이 0°~ 30° 인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The taper angle after hardening of the said ultraviolet curable ink composition is 0 degrees-30 degrees, The ultraviolet curable ink composition characterized by the above-mentioned. 청구항 19에 있어서, The method according to claim 19, 상기 테이퍼 각이 0°~ 10° 인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The taper angle is 0 ° ~ 10 ° UV curable ink composition, characterized in that. 청구항 1에 있어서, The method according to claim 1, 상기 자외선 경화형 잉크 조성물은 베젤 패턴 형성용인 것을 특징으로 하는 자외선 경화형 잉크 조성물.The ultraviolet curable ink composition is a UV curable ink composition, characterized in that for forming a bezel pattern. a) 청구항 1의 자외선 경화형 잉크 조성물을 사용하여, 기판 상에 베젤 패턴을 형성하는 단계; 및a) forming a bezel pattern on a substrate using the ultraviolet curable ink composition of claim 1; And b) 상기 베젤 패턴을 경화하는 단계;를 포함하는 디스플레이 기판용 베젤 패턴의 제조방법.b) hardening the bezel pattern. 청구항 26에 있어서,The method of claim 26, 상기 a) 베젤 패턴을 형성하는 단계 이전에, 기판의 세정 및 건조 단계를 더 포함하는 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법. The method of manufacturing a bezel pattern for a display substrate further comprising the step of cleaning and drying the substrate before forming the bezel pattern. 청구항 27에 있어서,The method of claim 27, 상기 기판의 세정 및 건조 단계는 습식 표면처리, UV 오존 처리, 상압 플라즈마 처리로 이루어지는 군에서 선택되는 어느 하나 이상의 처리에 의하여 실시되는 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법. The cleaning and drying step of the substrate is a method of manufacturing a bezel pattern for a display substrate, characterized in that carried out by at least one treatment selected from the group consisting of wet surface treatment, UV ozone treatment, atmospheric pressure plasma treatment. 청구항 26에 있어서, The method of claim 26, 상기 a)단계에서 기판 상에 베젤 패턴을 형성하는 방법은 잉크젯(Inkjet) 인쇄, 그라비아(Gravure) 코팅 및 리버스 오프셋(Reverse offset) 코팅 중에서 선택된 방법인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.The method of forming the bezel pattern on the substrate in step a) is a method of manufacturing a bezel pattern for a display substrate, characterized in that the method selected from inkjet printing, gravure coating and reverse offset coating . 청구항 26에 있어서, The method of claim 26, 상기 a)단계는 10℃ 내지 100℃의 공정 온도에서 실시하는 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.The step a) is a method of manufacturing a bezel pattern for a display substrate, characterized in that carried out at a process temperature of 10 ℃ to 100 ℃. 청구항 30에 있어서, The method of claim 30, 상기 a)단계는 20℃ 내지 70℃의 공정 온도에서 실시하는 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.The step a) is a method of manufacturing a bezel pattern for a display substrate, characterized in that carried out at a process temperature of 20 ℃ to 70 ℃. 청구항 26에 있어서, The method of claim 26, 상기 b) 단계의 베젤 패턴의 상부 부착력이 100 내지 5000gf/25mm 인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.Method of manufacturing a bezel pattern for a display substrate, characterized in that the upper adhesion of the bezel pattern of step b) is 100 to 5000gf / 25mm. 청구항 26에 있어서, The method of claim 26, 상기 a) 단계의 자외선 경화형 잉크 조성물의 유리 기재에 대한 접촉각이 10°미만인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.Method for producing a bezel pattern for a display substrate, characterized in that the contact angle of the ultraviolet curable ink composition of step a) to the glass substrate is less than 10 °. 청구항 26에 있어서, The method of claim 26, 상기 b) 단계의 베젤 패턴의 유리 기재에 대한 접착력이 ASTM D3359 규격으로 4B 이상인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.Method for producing a bezel pattern for a display substrate, characterized in that the adhesive force of the bezel pattern of the glass substrate of step b) is 4B or more in ASTM D3359 standard. 청구항 26에 있어서,The method of claim 26, 상기 베젤 패턴의 두께가 0.1㎛~20㎛ 인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.The bezel pattern manufacturing method of the bezel pattern for a display substrate, characterized in that the thickness of 0.1㎛ ~ 20㎛. 청구항 35에 있어서,The method of claim 35, wherein 상기 베젤 패턴의 두께가 0.5㎛~5㎛ 인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.The thickness of the bezel pattern is 0.5㎛ ~ 5㎛ manufacturing method of the bezel pattern for a display substrate. 청구항 26에 있어서,The method of claim 26, 상기 베젤 패턴의 테이퍼 각이 0°~ 30° 인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.The taper angle of the bezel pattern is a manufacturing method of the bezel pattern for a display substrate, characterized in that 0 ° ~ 30 °. 청구항 37에 있어서,The method of claim 37, 상기 베젤 패턴의 테이퍼 각이 0°~ 10° 인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.The taper angle of the bezel pattern is a manufacturing method of the bezel pattern for a display substrate, characterized in that 0 ° ~ 10 °. 청구항 26에 있어서,The method of claim 26, 상기 베젤 패턴의 OD 값이 막 두께 1.0㎛ 당 0.05~2.5인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.The method of manufacturing a bezel pattern for a display substrate, characterized in that the OD value of the bezel pattern is 0.05 ~ 2.5 per 1.0 ㎛ thickness. 청구항 1의 자외선 경화형 잉크 조성물이 경화되어, 기판 상에 형성된 디스플레이 기판용 베젤 패턴.The bezel pattern for display substrates which hardened | cured the ultraviolet curable ink composition of Claim 1 and formed on the board | substrate. 청구항 40에 있어서,The method of claim 40, 상기 베젤 패턴의 두께가 0.1㎛~20㎛ 인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴.A bezel pattern for a display substrate, wherein the bezel pattern has a thickness of 0.1 μm to 20 μm. 청구항 41에 있어서,The method of claim 41, 상기 베젤 패턴의 두께가 0.5㎛~5㎛ 인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴.A bezel pattern for a display substrate, wherein the bezel pattern has a thickness of 0.5 μm to 5 μm. 청구항 40에 있어서,The method of claim 40, 상기 베젤 패턴의 테이퍼 각이 0°~ 30° 인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴.A bezel pattern for a display substrate, wherein the taper angle of the bezel pattern is 0 ° to 30 °. 청구항 43에 있어서,The method of claim 43, 상기 베젤 패턴의 테이퍼 각이 0°~ 10° 인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴.A bezel pattern for a display substrate, wherein the taper angle of the bezel pattern is 0 ° to 10 °. 청구항 40에 있어서,The method of claim 40, 상기 베젤 패턴의 OD 값이 막 두께 1.0㎛ 당 0.05~2.5인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴.The bezel pattern for a display substrate, characterized in that the OD value of the bezel pattern is 0.05 ~ 2.5 per 1.0 ㎛ thickness. 청구항 40에 있어서, The method of claim 40, 상기 베젤 패턴의 상부 부착력이 100 내지 5000gf/25mm 인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴.The bezel pattern for the display substrate, characterized in that the upper adhesion of the bezel pattern is 100 to 5000gf / 25mm. 청구항 40에 있어서, The method of claim 40, 유리 기재에 대한 접촉각이 10°미만인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴.A bezel pattern for a display substrate, wherein the contact angle with respect to the glass substrate is less than 10 degrees. 청구항 40에 있어서, The method of claim 40, 유리 기재에 대한 접착력이 ASTM D3359 규격으로 4B 이상인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴.A bezel pattern for a display substrate, characterized in that the adhesion to the glass substrate is more than 4B in ASTM D3359 standard.
PCT/KR2015/010344 2014-09-26 2015-09-30 Uv-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby Ceased WO2016048118A1 (en)

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JP2010013596A (en) * 2008-07-07 2010-01-21 Konica Minolta Ij Technologies Inc Active ray-curable inkjet ink composition
KR20130132322A (en) * 2012-05-25 2013-12-04 주식회사 엘지화학 Photosensitive resin composition, pattern formed by using the same and display panel comprising the same
WO2014010884A1 (en) * 2012-07-11 2014-01-16 주식회사 엘지화학 Method for forming bezel pattern on display substrate
KR20140086584A (en) * 2012-12-28 2014-07-08 삼성전기주식회사 Photo-sensitive resin composition for bezel of touch screen module and bezel for touch screen module using the same
KR20140099560A (en) * 2011-11-10 2014-08-12 캐논 가부시끼가이샤 Photo-curable composition and patterning method using the same

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JP2010013596A (en) * 2008-07-07 2010-01-21 Konica Minolta Ij Technologies Inc Active ray-curable inkjet ink composition
KR20140099560A (en) * 2011-11-10 2014-08-12 캐논 가부시끼가이샤 Photo-curable composition and patterning method using the same
KR20130132322A (en) * 2012-05-25 2013-12-04 주식회사 엘지화학 Photosensitive resin composition, pattern formed by using the same and display panel comprising the same
WO2014010884A1 (en) * 2012-07-11 2014-01-16 주식회사 엘지화학 Method for forming bezel pattern on display substrate
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