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WO2015199784A2 - Systèmes et procédés pour des dispositifs injectables - Google Patents

Systèmes et procédés pour des dispositifs injectables Download PDF

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Publication number
WO2015199784A2
WO2015199784A2 PCT/US2015/024252 US2015024252W WO2015199784A2 WO 2015199784 A2 WO2015199784 A2 WO 2015199784A2 US 2015024252 W US2015024252 W US 2015024252W WO 2015199784 A2 WO2015199784 A2 WO 2015199784A2
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WO
WIPO (PCT)
Prior art keywords
electronics
nanoscale wires
mesh
nanoscale
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2015/024252
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English (en)
Other versions
WO2015199784A3 (fr
Inventor
Charles M. Lieber
Jia Liu
Zengguang CHENG
Guosong Hong
Tian-Ming FU
Tao Zhou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Harvard University
Original Assignee
Harvard University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Harvard University filed Critical Harvard University
Priority to US15/301,792 priority Critical patent/US20170172438A1/en
Publication of WO2015199784A2 publication Critical patent/WO2015199784A2/fr
Publication of WO2015199784A3 publication Critical patent/WO2015199784A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00—Electrotherapy; Circuits therefor
    • A61N1/02—Details
    • A61N1/04—Electrodes
    • A61N1/05—Electrodes for implantation or insertion into the body, e.g. heart electrode
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B5/00—Measuring for diagnostic purposes; Identification of persons
    • A61B5/24—Detecting, measuring or recording bioelectric or biomagnetic signals of the body or parts thereof

Definitions

  • the present invention generally relates to nanoscale wires and/or injectable devices.
  • the present invention generally relates to nanoscale wires and/or injectable devices.
  • the subject matter of the present invention involves, in some cases, interrelated products, alternative solutions to a particular problem, and/or a plurality of different uses of one or more systems and/or articles.
  • the present invention is generally directed to passing a device comprising one or more nanoscale wires through a tube. In another, the present invention is generally directed to passing a device comprising one or more nanoscale wires through an opening of a tube. In another aspect, the present invention is generally directed to passing a device comprising one or more nanoscale wires through an injection device. In yet another aspect, the present invention is generally directed to injecting a device comprising one or more nanoscale wires into a subject. In still another aspect, the present invention is generally directed to injecting a device comprising one or more nanoscale wires into soft matter. In some cases, at least one of the nanoscale wires is a silicon nanowire.
  • the present invention is generally directed to a tube comprising a device comprising one or more nanoscale wires.
  • the present invention in another aspect, is generally directed to a needle comprising a device comprising one or more nanoscale wires.
  • the present invention in yet another aspect, is generally directed to a syringe comprising a device comprising one or more nanoscale wires. In some cases, at least one of the nanoscale wires is a silicon nanowire.
  • the present invention is generally directed to a tube inserted into a subject, wherein the tube comprises a device comprising one or more nanoscale wires.
  • the present invention is generally directed to a needle inserted into a subject, wherein the needle comprises a device comprising one or more nanoscale wires.
  • the present invention is generally directed to a syringe inserted into a subject, wherein the syringe comprises a device comprising one or more nanoscale wires. In some cases, at least one of the nanoscale wires is a silicon nanowire.
  • the present invention is generally directed to a tube inserted into soft matter, wherein the tube comprises a device comprising one or more nanoscale wires.
  • the present invention is generally directed to a needle inserted into soft matter, wherein the needle comprises a device comprising one or more nanoscale wires.
  • the present invention is generally directed to a syringe inserted into soft matter, wherein the syringe comprises a device comprising one or more nanoscale wires. In some cases, at least one of the nanoscale wires is a silicon nanowire.
  • the present invention encompasses methods of making one or more of the embodiments described herein, for example, a device comprising one or more nanoscale wires.
  • the device may be injectable in some cases.
  • the present invention encompasses methods of using one or more of the embodiments described herein, for example, a device comprising one or more nanoscale wires.
  • the device may be injectable in some cases.
  • FIGs. 1A-1G illustrate certain devices in accordance with various embodiments of the invention
  • Figs. 2A-2E show injection of certain devices, according to some embodiments of the invention.
  • Figs. 3A-3C show analysis of an injection process, according to one embodiment of the invention.
  • Figs. 4A-4D show injectable electronics devices, in accordance with some embodiments of the invention.
  • Figs. 5A-5J illustrate injectable electronics devices for certain biological systems, in accordance with some embodiments of the invention
  • Figs. 6A-6E shows optical images of certain device structures, in certain embodiments of the invention.
  • Figs. 7A-7B illustrate device meshes of nanoscale wires, in some embodiments of the invention
  • Figs. 8A-8D illustrate injection of devices, in accordance with one set of embodiments of the invention
  • Figs. 9A-9D illustrate bonding in devices, in certain embodiments of the invention.
  • Figs. 10A-10F illustrate shows electronic devices within a needle, in some embodiments of the invention.
  • Figs. 11 A-l 1C shows a rolled mesh device, in one embodiment
  • Figs. 12A-12D illustrate injection of a device into soft matter, in another embodiment of the invention.
  • FIGs. 13A-13D illustrate injection of a device in vivo, in yet another embodiment of the invention
  • Figs. 14A-14D illustrate an interface between a device and tissue, in still other embodiments of the invention.
  • Fig. 15 schematically illustrates a cross-section of one embodiment of the invention
  • Figs. 16A-16J show syringe injectable electronics in accordance with certain embodiments of the invention.
  • Figs. 17A-17E show mesh electronics structures in various embodiments of the invention.
  • Figs. 18A-18G show injection of mesh electronics in some embodiments of the invention.
  • Figs. 19A-19L show syringe injectable electronics in biological systems, in accordance with certain embodiments of the invention.
  • the present invention generally relates to nanoscale wires and/or injectable devices.
  • the present invention is directed to electronic devices that can be injected or inserted into soft matter, such as biological tissue or polymeric matrixes.
  • the device may be passed through a syringe or a needle.
  • the device may comprise one or more nanoscale wires.
  • Other components, such as fluids or cells, may also be injected or inserted.
  • the device, after insertion or injection may be connected to an external electrical circuit, e.g., to a computer.
  • Other embodiments are generally directed to systems and methods of making, using, or promoting such devices, kits involving such devices, and the like.
  • One aspect of the present invention is generally directed to a device for insertion or injection into a tissue (e.g., biological tissue), or other matter, including soft matter.
  • the tissue may be in vitro or in vivo (i.e., the device may be injected into a living subject).
  • soft matter is matter that exhibits some viscoelasticity, e.g., the matter can undergo deformation, and may exhibit viscous and/or elastic characteristics while undergoing deformation. Examples of soft matter include, but are not limited to, polymers, gels, or other materials having viscoelastic properties.
  • the device can be fully or partially inserted into the tissue or other matter.
  • the device may be used to determine a property of the tissue or other matter, and/or provide an electrical signal to the tissue or other matter.
  • a device comprising nanoscale wires may be inserted into an electrically- active tissue, such as the heart or the brain, and the nanoscale wires may be used to determine electrical properties of the tissue, e.g., action potentials or other electrical activity.
  • the device is relatively porous to allow cells, etc. to grow or migrate into the device, for example, neurons may grow into the device. This may be useful, for example, for long-term applications, for example, where the device is to be inserted and used for days, weeks, months, or years within the tissue. For example, neurons or cardiac cells may be able to grow around and/or into the device while it is inserted into the brain or the heart, e.g., over extended periods of time.
  • a device may be formed from one or more polymeric constructs and/or metal leads.
  • the device is relatively small and may include components such as nanoscale wires.
  • the device may also be flexible and/or have a relatively open structure, e.g., an open porosity of at least about 30%, or other porosities as discussed herein.
  • the device may be formed from a plurality of nanoscale wires, connected by polymeric constructs and/or metal leads, forming a relatively large or open network, which can then be rolled to form a cylindrical or other 3-dimensional structure that is to be inserted into a subject.
  • the nanoscale wires may be distributed about the device, e.g., in three dimensions, thereby allowing determining properties and/or stimulation of a tissue, etc. in three-dimensions.
  • the device can also be connected to an external electrical system, e.g., to facilitate use of the device.
  • Polymeric constructs, metal leads, nanoscale wires, the structure of the device, and various properties of the devices are all discussed in additional detail below.
  • a device as discussed herein may be positioned in a tube, such as a metal tube.
  • the device may be shaped such that it is cylindrical or curved, and/or the device may be compressed to fit inside the tube, although the device may be able to expand after exiting the tube, e.g., as discussed herein.
  • the tube may be formed out of any suitable material.
  • the tube may comprise stainless steel.
  • the tube may also be other materials in other embodiments.
  • the tube may be plastic, or the tube may be glass.
  • the tube may be a needle or form part of a syringe, or the tube may be form part of an injector device, such as a microinjector.
  • the tube is cylindrical, although the tube may be noncylindrical in other cases.
  • the tube may be tapered in some embodiments.
  • the tube is hollow.
  • the tube has a circular cross-section.
  • the tube may not have a circular cross-section.
  • the tube may have a square or rectangular cross-section, or the tube may have an open cross-section, e.g., having a "U"-shaped cross section.
  • the tube may have any suitable inner diameter.
  • the tube may have an inner diameter of less than about 1 mm, less than about 800 micrometers, less than about 600 micrometers, less than about 500 micrometers, less than about 400 micrometers, less than about 300 micrometers, less than about 200 micrometers, less than about 100 micrometers, less than about 80 micrometers, less than about 60 micrometers, less than about 50 micrometers, etc.
  • the device may pass through the tube using any suitable method.
  • the device may fully pass through the tube, or the device may only partially pass through the tube such that a portion of the device remains within the tube.
  • the device may be fully or partially expelled or urged from the tube using suitable forces, pressures, mechanisms, or apparatuses.
  • the device may be expelled using a microinjection device.
  • the device may be manually expelled, e.g., by pushing the plunger of a syringe.
  • fluids liquids or gases
  • water, saline, or air may be added to the tube to cause the device to be expelled therefrom.
  • a pump or other fluid source may be used to introduce fluid into the tube to expel the device.
  • a pump may pump fluid into the tube (or through tubing or other fluidic channels) into the tube to cause the device to be expelled therefrom (e.g., partially or fully).
  • the device may be injected at a controlled rate and/or with controllable position, for example, by controlling the pressure or flow rate of fluid from the pump.
  • the tube may be inserted into a target such that the device is expelled directly into the target.
  • the tube may be inserted into a subject, e.g., into the tissue of a subject, such as those described herein.
  • the tube may be inserted into soft matter.
  • the tube may be inserted into a polymer or a gel.
  • the device may be expelled from the tube such that the device at least partially penetrates into the target.
  • the device when inserted into the tube, is constrained or compressed in some fashion such that, upon expulsion (fully or partially), the device is able to at least partially expand.
  • the device may be a network that is rolled to form a cylinder; upon expulsion, the device is able to at least partially unroll and expand, e.g., as is shown in Fig. IB.
  • the device is able to spontaneously expand, e.g., upon exiting the tube. The expansion may occur rapidly, or on longer time scales.
  • the device may unfold, or the device may uncompress, upon exiting a tube.
  • the device may expand to reach its original shape. In some cases, the device may substantially return to its original shape after about 24 hours, after about 48 hours, or after about 72 hours. In certain
  • the device may take longer for the device to substantially return to its original shape, e.g., after 1 week, after 2 weeks, after 3 weeks, after 4 weeks, after 5 weeks, after 6 weeks, etc.
  • the device may not necessarily return to its original shape, e.g., inherently, and/or due to the matter that the device was injected or inserted into.
  • the presence of tissue (or other matter) may prevent the device from fully expanding back to its original shape after insertion.
  • a gas or a liquid may be present within the tube.
  • the tube may contain a liquid to facilitate expulsion of the device, or a liquid to assist in movement of the device out of the tube, or into the target.
  • the tube may include a liquid such as saline, which can be injected into a subject, e.g., along with the device.
  • the fluid may also contain one or more cells, which may be inserted or injected into a target along with the device. If the target is a subject or biological tissue, the cells may be autologous, heterologous, or homologous to the tissue or to the subject.
  • the device may comprise one or more electrical networks comprising nanoscale wires and conductive pathways in electrical communication with the nanoscale wires.
  • the conductive pathways may also provide mechanical strength to the device, and/or there may be polymeric or metal constructs that are used to provide mechanical strength to the device.
  • the device may be planar or substantially define a plane, or the device may be non-planar or curved (i.e., a surface that can be characterized as having a finite radius of curvature).
  • the device may also be flexible in some cases, e.g., the device may be able to bend or flex.
  • a device may be bent or distorted by a volumetric displacement of at least about 5%, about 10%, or about 20% (relative to the undisturbed volume), without causing cracks and/or breakage within the device.
  • the device can be distorted such that about 5%, about 10%, or about 20% of the mass of the device has been moved outside the original surface perimeter of the device, without causing failure of the device (e.g., by breaking or cracking of the device, disconnection of portions of the electrical network, etc.).
  • the device may be bent or flexed as described above by an ordinary human being without the use of tools, machines, mechanical device, excessive force, or the like.
  • a flexible device may be more biocompatible due to its flexibility, and the device may be treated as previously discussed to facilitate its insertion into a tissue.
  • the device may be non-planar in some cases, e.g., curved as previously discussed.
  • the device may be substantially U-shaped or cylindrical, and/or have a shape and/or size that is similar to a hypodermic needle.
  • the device may be generally cylindrical with a maximum outer diameter of no more than about 5 mm, no more than about 4 mm, no more than about 3 mm, no more than about 2 mm, no more than about 1 mm, no more than about 0.9 mm, no more than about 0.8 mm, no more than about 0.7 mm, no more than about 0.6 mm, no more than about 0.5 mm, no more than about 0.4 mm, no more than about 0.3 mm, or no more than about 0.2 mm.
  • the device may be able to placed into a tube, e.g., of a needle or a syringe. As discussed herein, the device can then be inserted or injected out of the tube upon application of suitable forces and/or pressures, for instance, such that the device can be inserted or injected into other matter. For instance, the device may be injected into the tissue of a subject, or into a gel.
  • the device may comprise a periodic structure comprising nanoscale wires.
  • the device may comprise a mesh or other two-dimensional array of nanoscale wires and conductive pathways, such as is shown in Fig. 2B.
  • the mesh may include a first set of conductive pathways, generally parallel to each other, and a second set of conductive pathways, generally parallel to each other.
  • the first set and the second set may be orthogonal to each other (e.g., Fig. 2B, II), or they may cross at any suitable angle (e.g., Fig. 2B, I).
  • the sets may cross at a 30° angle, a 45 ° angle, or a 60 ° angle, or any other suitable angle.
  • Mesh structures of the device may be particularly useful in certain embodiments.
  • the period may be of any suitable length.
  • the length of a unit cell within the periodic structure may be less than about less than about 500 micrometers, less than about 400 micrometers, less than about 300 micrometers, less than about 200 micrometers, less than about 100 micrometers, less than about 80 micrometers, less than about 60 micrometers, less than about 50 micrometers, etc.
  • the device may contain one or more polymeric constructs.
  • the polymeric constructs typically comprise one or more polymers, e.g., photoresists, biocompatible polymers, biodegradable polymers, etc., and optionally may contain other materials, for example, metal leads or other conductive pathway materials.
  • the polymeric constructs may be separately formed then assembled into the device, and/or the polymeric constructs may be integrally formed as part of the device, for example, by forming or manipulating (e.g. folding, rolling, etc.) the polymeric constructs into a 3- dimensional structure that defines the device.
  • the polymeric constructs have the form of fibers or ribbons.
  • the polymeric constructs may have one dimension that is substantially longer than the other dimensions of the polymeric construct.
  • the fibers can in some cases be joined together to form a network or mesh of fibers.
  • a device may contain a plurality of fibers that are orthogonally arranged to form a regular network of polymeric constructs.
  • the polymeric constructs need not be regularly arranged.
  • the polymer constructs may have the form of fibers or other shapes. In general, any shape or dimension of polymeric construct may be used to form a device.
  • some or all of the polymeric constructs have a smallest dimension or a largest cross-sectional dimension of less than about 5
  • a polymeric construct may also have any suitable cross- sectional shape, e.g., circular, square, rectangular, polygonal, elliptical, regular, irregular, etc. Examples of methods of forming polymeric constructs, e.g., by lithographic or other techniques, are discussed below.
  • the polymeric constructs can be arranged such that the device is relatively porous, e.g., such that cells can penetrate into the device after insertion of the device.
  • the polymeric constructs may be constructed and arranged within the device such that the device has an open porosity of at least about 30%, at least about 40%, at least about 50%, at least about 60%, at least about 70%, at least about 75%, at least about 80%, at least about 85%, at least about 90%, at least about 95%, at least about 97, at least about 99%, at least about 99.5%, or at least about 99.8%.
  • the "open porosity" is generally described as the volume of empty space within the device divided by the overall volume defined by the device, and can be thought of as being equivalent to void volume.
  • the open porosity includes the volume within the device to which cells can access.
  • the device does not contain significant amounts of internal volume to which the cells are incapable of addressing, e.g., due to lack of access and/or pore access being too small.
  • a "two-dimensional open porosity" may also be defined, e.g., of a device that is subsequently formed or manipulated into a 3-dimensional structure.
  • the two-dimensional open porosities of a device can be defined as the void area within the two-dimensional configuration of the device (e.g., where no material is present) divided by the overall area of device, and can be determined before or after the device has been formed into a 3-dimensional structure.
  • a device may have a two-dimensional open porosity of at least about 30%, at least about 40%, at least about 50%, at least about 60%, at least about 70%, at least about 75%, at least about 80%, at least about 85%, at least about 90%, at least about 95%, at least about 97, at least about 99%, at least about 99.5%, or at least about 99.8%, etc.
  • Another method of generally determining the two-dimensional porosity of the device is by determining the areal mass density, i.e., the mass of the device divided by the area of one face of the device (including holes or voids present therein).
  • the device may have an areal mass density of less than about 100 micrograms/cm 2 , less than about 80 micrograms/cm 2 , less than about
  • micrograms/cm 2 less than about 30 micrograms/cm 2 , or less than about 20
  • the porosity of a device can be defined by one or more pores. Pores that are too small can hinder or restrict cell access.
  • the device may have an average pore size of at least about 100 micrometers, at least about 200 micrometers, at least about 300 micrometers, at least about 400 micrometers, at least about 500 micrometers, at least about 600 micrometers, at least about 700 micrometers, at least about 800 micrometers, at least about 900 micrometers, or at least about 1 mm.
  • pores that are too big may prevent cells from being able to satisfactorily use or even access the pore volume.
  • the device may have an average pore size of no more than about 1.5 mm, no more than about 1.4 mm, no more than about 1.3 mm, no more than about 1.2 mm, no more than about 1.1 mm, no more than about 1 mm, no more than about 900 micrometers, no more than about 800 micrometers, no more than about 700 micrometers, no more than about 600 micrometers, or no more than about 500 micrometers. Combinations of these are also possible, e.g., in one embodiment, the average pore size is at least about 100 micrometers and no more than about 1.5 mm. In addition, larger or smaller pores than these can also be used in a device in certain cases. Pore sizes may be determined using any suitable technique, e.g., through visual inspection (e.g., of microscope images), BET
  • one or more of the polymers forming a polymeric construct may be a photoresist. While not commonly used in biological device s, photoresists are typically used in lithographic techniques, which can be used as discussed herein to form the polymeric construct.
  • the photoresist may be chosen for its ability to react to light to become substantially insoluble (or substantially soluble, in some cases) to a photoresist developer.
  • photoresists that can be used within a polymeric construct include, but are not limited to, SU-8, SI 805, LOR 3A, poly(methyl methacrylate), poly(methyl glutarimide), phenol formaldehyde resin
  • diazonaphthoquinone/novolac diazonaphthoquinone
  • DNQ diazonaphthoquinone
  • Hoechst AZ 4620 Hoechst AZ 4562
  • Shipley 1400-17 Shipley 1400-27, Shipley 1400-37, or the like.
  • a polymeric construct may also contain one or more polymers that are biocompatible and/or biodegradable, in certain embodiments.
  • a polymer can be biocompatible, biodegradable, or both biocompatible and biodegradable, and in some cases, the degree of biodegradation or biocompatibility depends on the physiological environment to which the polymer is exposed to.
  • a biocompatible material is one that does not illicit an immune response, or elicits a relatively low immune response, e.g., one that does not impair the device or the cells therein from continuing to function for its intended use.
  • the biocompatible material is able to perform its desired function without eliciting any undesirable local or systemic effects in the subject.
  • the material can be incorporated into tissues within the subject, e.g., without eliciting any undesirable local or systemic effects, or such that any biological response by the subject does not substantially affect the ability of the material from continuing to function for its intended use.
  • the device may be able to determine cellular or tissue activity after insertion, e.g., without substantially eliciting undesirable effects in those cells, or undesirable local or systemic responses, or without eliciting a response that causes the device to cease functioning for its intended use.
  • techniques for determining biocompatibility include, but are not limited to, the ISO 10993 series of for evaluating the biocompatibility of medical devices.
  • a biocompatible material may be implanted in a subject for an extended period of time, e.g., at least about a month, at least about 6 months, or at least about a year, and the integrity of the material, or the immune response to the material, may be determined.
  • a suitably biocompatible material may be one in which the immune response is minimal, e.g., one that does not substantially harm the health of the subject.
  • a biocompatible material is poly (methyl methacrylate).
  • a biocompatible material may be used to cover or shield a non- biocompatible material (or a poorly biocompatible material) from the cells or tissue, for example, by covering the material.
  • a biodegradable material typically degrades over time when exposed to a biological system, e.g., through oxidation, hydrolysis, enzymatic attack, phagocytosis, or the like.
  • a biodegradable material can degrade over time when exposed to water (e.g., hydrolysis) or enzymes.
  • a biodegradable material is one that exhibits degradation (e.g., loss of mass and/or structure) when exposed to physiological conditions for at least about a month, at least about 6 months, or at least about a year.
  • the biodegradable material may exhibit a loss of mass of at least about 10%, at least about 20%, at least about 30%, at least about 40%, at least about 50%, at least about 60%, at least about 70%, at least about 80%, or at least about 90%.
  • some or all of the degradation products may be resorbed or metabolized, e.g., into cells or tissues.
  • certain biodegradable materials, during degradation release substances that can be metabolized by cells or tissues. For instance, polylactic acid releases water and lactic acid during degradation.
  • biocompatible and/or biodegradable polymers include, but are not limited to, poly(lactic-co-glycolic acid), polylactic acid, polyglycolic acid, poly(methyl methacrylate), poly(trimethylene carbonate), collagen, fibrin, and the like.
  • polysaccharide materials such as chitosan or glycosaminoglycans, hyaluronic acid, polycaprolactone, and the like.
  • the polymers and other components forming the device can also be used in some embodiments to provide a certain degree of flexibility to the device, which can be quantified as a bending stiffness per unit width of polymer construct.
  • the overall device may have a bending stiffness of less than about 5 nN m, less than about 4.5 nN m, less than about 4 nN m, less than about 3.5 nN m, less than about 3 nN m, less than about 2.5 nN m, less than about 2 nN m, less than about 1.5 nN m, less than about 1 nN m, less than about 0.5 nM m, less than about 0.3 nM m, less than about 0.1 nM m, less than about 0.05 nM m, less than about 0.03 nM m, less than about 0.01 nM m, less than about 0.005 nM m, less than about 0.003 nM m, less than about 0.001
  • the device may also contain other materials in addition to the photoresists or biocompatible and/or biodegradable polymers described above.
  • Non-limiting examples include other polymers, growth hormones, extracellular matrix protein, specific metabolites or nutrients, or the like.
  • one or more agents able to promote cell growth can be added to the device, e.g., hormones such as growth hormones, extracellular matrix protein, pharmaceutical agents, vitamins, or the like. Many such growth hormones are commercially available, and may be readily selected by those of ordinary skill in the art based on the specific type of cell or tissue used or desired.
  • extracellular matrix proteins include gelatin, laminin, fibronectin, heparan sulfate, proteoglycans, entactin, hyaluronic acid, collagen, elastin, chondroitin sulfate, keratan sulfate, MatrigelTM, or the like. Many such extracellular matrix proteins are available commercially, and also can be readily identified by those of ordinary skill in the art based on the specific type of cell or tissue used or desired.
  • additional materials can be added to the device, e.g., to control the size of pores within the device, to promote cell adhesion or cell growth within the device, to increase the structural stability of the device, to control the flexibility of the device, etc.
  • additional materials can be added to the device, e.g., to control the size of pores within the device, to promote cell adhesion or cell growth within the device, to increase the structural stability of the device, to control the flexibility of the device, etc.
  • additional fibers or other suitable polymers may be added to the device, e.g., electrospun fibers can be used as a secondary scaffold.
  • the additional materials can be formed from any of the materials described herein, e.g., photoresists or biocompatible and/or biodegradable polymers, or other polymers described herein.
  • a glue such as a silicone elastomer glue can be used to control the shape of the device.
  • the device can include a 2-dimensional structure that is formed into a final 3-dimensional structure, e.g., by folding or rolling the structure.
  • the 2-dimensional structure may also be manipulated to have a different shape that is 3-dimensional, e.g., having an overall length, width, and height where the overall length and width of the structure are not each substantially greater than the overall height of the structure.
  • the structure may be manipulated to increase the overall height of the material, relative to its overall length and/or width, for example, by folding or rolling the structure.
  • a relatively planar sheet of material (having a length and width much greater than its thickness) may be rolled up into a "tube," such that the tube has an overall length, width, and height of relatively comparable dimensions).
  • the 2-dimensional structure may comprise one or more nanoscale wires and one or more polymeric constructs formed into a 2-dimensional structure or network that is subsequently formed into a 3-dimensional structure.
  • the 2-dimesional structure may be rolled or curled up to form the 3- dimesional structure, or the 2-dimensional structure may be folded or creased one or more times to form the 3-dimesional structure.
  • Such manipulations can be regular or irregular.
  • the manipulations are caused by pre-stressing the 2-dimensional structure such that it spontaneously forms the 3- dimensional structure, although in other embodiments, such manipulations can be performed separately, e.g., after formation of the 2-dimensional structure.
  • the device may include one or more metal leads or electrodes, or other conductive pathways.
  • the metal leads or conductive pathways may provide mechanical support, and/or one or more metal leads can be used within a conductive pathway to a nanoscale wire.
  • the metal lead may directly physically contact the nanoscale wire and/or there may be other materials between the metal lead and the nanoscale wire that allow electrical communication to occur.
  • one or more metal leads or other conductive pathways may extend such that the device can be connected to external electrical circuits, computers, or the like, e.g., as discussed herein.
  • Metal leads are useful due to their high conductance, e.g., such that changes within electrical properties obtained from the conductive pathway can be related to changes in properties of the nanoscale wire, rather than changes in properties of the conductive pathway.
  • changes within electrical properties obtained from the conductive pathway can be related to changes in properties of the nanoscale wire, rather than changes in properties of the conductive pathway.
  • metal leads it is not a requirement that only metal leads be used, and in other embodiments, other types of conductive pathways may also be used, in addition or instead of metal leads.
  • metal leads can be used, in various embodiments of the invention.
  • the metals used within a metal lead may include aluminum, gold, silver, copper, molybdenum, tantalum, titanium, nickel, tungsten, chromium, palladium, as well as any combinations of these and/or other metals.
  • the metal can be chosen to be one that is readily introduced into the device, e.g., using techniques compatible with lithographic techniques.
  • lithographic techniques such as e-beam lithography, photolithography, X- ray lithography, extreme ultraviolet lithography, ion projection lithography, etc. may be used to layer or deposit one or more metals on a substrate.
  • the thickness of a metal layer may be less than about 5 micrometers, less than about 4 micrometers, less than about 3 micrometers, less than about 2 micrometers, less than about 1 micrometer, less than about 700 nm, less than about 600 nm, less than about 500 nm, less than about 300 nm, less than about 200 nm, less than about 100 nm, less than about 80 nm, less than about 50 nm, less than about 30 nm, less than about 10 nm, less than about 5 nm, less than about 2 nm, etc.
  • the thickness of the layer may also be at least about 10 nm, at least about 20 nm, at least about 40 nm, at least about 60 nm, at least about 80 nm, or at least about 100 nm.
  • the thickness of a layer may be between about 40 nm and about 100 nm, between about 50 nm and about 80 nm.
  • more than one metal can be used within a metal lead.
  • two, three, or more metals may be used within a metal lead.
  • the metals may be deposited in different regions or alloyed together, or in some cases, the metals may be layered on top of each other, e.g., layered on top of each other using various lithographic techniques.
  • a second metal may be deposited on a first metal, and in some cases, a third metal may be deposited on the second metal, etc. Additional layers of metal (e.g., fourth, fifth, sixth, etc.) may also be used in some embodiments.
  • the metals can all be different, or in some cases, some of the metals (e.g., the first and third metals) may be the same.
  • Each layer may independently be of any suitable thickness or dimension, e.g., of the dimensions described above, and the thicknesses of the various layers can independently be the same or different.
  • dissimilar metals are layered on top of each other, they may be layered in some embodiments in a "stressed" configuration (although in other embodiments they may not necessarily be stressed).
  • chromium and palladium can be layered together to cause stresses in the metal leads to occur, thereby causing warping or bending of the metal leads.
  • the amount and type of stress may also be controlled, e.g., by controlling the thicknesses of the layers. For example, relatively thinner layers can be used to increase the amount of warping that occurs.
  • layering metals having a difference in stress e.g., film stress
  • stresses within the metal which can cause bending or warping as the metals seek to relieve the stresses.
  • mismatches are undesirable because they could cause warping of the metal leads and thus, the device.
  • mismatches may be desired, e.g., so that the device can be intentionally deformed to form a 3-dimensional structure, as discussed below.
  • the deposition of mismatched metals within a lead may occur at specific locations within the device, e.g., to cause specific warpings to occur, which can be used to cause the device to be deformed into a particular shape or configuration.
  • a "line" of such mismatches can be used to cause an intentional bending or folding along the line of the device.
  • the device may include one or more nanoscale wires, which may be the same or different from each other, in accordance with various aspects of the invention.
  • nanoscale wires include, for instance, semiconductor nanowires, carbon nanotubes, or the like.
  • at least one of the nanoscale wires is a silicon nanowire.
  • the nanoscale wires may also be straight, or kinked in some cases.
  • one or more of the nanoscale wires may form at least a portion of a transistor, such as a field-effect transistor, e.g., as is discussed in more detail below.
  • the nanoscale wires may be distributed within the device in any suitable configuration, for example, in an ordered array or randomly distributed. In some cases, the nanoscale wires are distributed such that an increasing concentration of nanoscale wires can be found towards the portion of the device that is first inserted.
  • some or all of the nanoscale wires are individually electronically addressable within the device. For instance, in some cases, at least about 10%, at least about 20%, at least about 30%, at least about 40%, at least about 50%, at least about 60%, at least about 70%, at least about 80%, at least about 90%, or substantially all of the nanoscale wires may be individually electronically addressable. In some
  • an electrical property of a nanoscale wire can be individually determinable (e.g., being partially or fully resolvable without also including the electrical properties of other nanoscale wires), and/or such that the electrical property of a nanoscale wire may be individually controlled (for example, by applying a desired voltage or current to the nanoscale wire, for instance, without simultaneously applying the voltage or current to other nanoscale wires).
  • the nanoscale wires can be controlled within the same electronic circuit (e.g., by incorporating the nanoscale wires in series and/or in parallel), such that the nanoscale wires can still be electronically controlled and/or determined.
  • more than one nanoscale wire may be present within the device.
  • the nanoscale wires may each independently be the same or different.
  • the device may comprise at least 5 nanoscale wires, at least about 10 nanoscale wires, at least about 15 nanoscale wires, at least about 20 nanoscale wires, at least about 25 nanoscale wires, at least about 30 nanoscale wires, at least about 50 nanoscale wires, at least about 100 nanoscale wires, at least about 300 nanoscale wires, at least about 1000 nanoscale wires, etc.
  • the nanoscale wires may be distributed uniformly or non-uniformly on the device. In some cases, the nanoscale wires may be distributed at an average density of at least about 5 wires/mm , at least about 10 wires/mm 2 , at least about 30 wires/mm 2 , at least about 50 wires/mm 2 , at least about 75 wires/mm 2 , at least about 100 wires/mm 2 , at least about 300 wires/mm 2 , at least about 500 wires/mm 2 , at least about 750 wires/mm 2 , at least about 1000 wires/mm 2 , etc.
  • the nanoscale wires are distributed such that the average separation between a nanoscale wire and its nearest neighboring nanoscale wire is less than about 2 mm, less than about 1 mm, less than about 500 micrometers, less than about 300 micrometers, less than about 100 micrometers, less than about 50 micrometers, less than about 30 micrometers, or less than about 10 micrometers.
  • the nanoscale wires may be in electrical communication with one or more electrical connectors via one or more conductive pathways.
  • the electrical connectors may be positioned on a portion of the device that is not inserted into the tissue.
  • the electrical connectors may be made out of any suitable material that allows transmission of an electrical signal.
  • the electrical connectors may comprise gold, silver, copper, aluminum, tantalum, titanium, nickel, tungsten, chromium, palladium, etc.
  • the electrical connectors have an average cross-section of less than about 10 micrometers, less than about 8 micrometers, less than about 6 micrometers, less than about 5 micrometers, less than about 4 micrometers, less than about 3 micrometers, less than about 2 micrometers, less than about 1 micrometer, etc.
  • the electrical connectors can be used to determine a property of a nanoscale wire within the device (for example, an electrical property or a chemical property as is discussed herein), and/or to direct an electrical signal to a nanoscale wire, e.g., to electrically stimulate cells proximate the nanoscale wire.
  • the conductive pathways can form an electrical circuit that is internally contained within the device, and/or that extends externally of the device, e.g., such that the electrical circuit is in electrical communication with an external electrical system, such as a computer or a transmitter (for instance, a radio transmitter, a wireless transmitter, an Internet connection, etc.). Any suitable pathway conductive pathway may be used, for example, pathways comprising metals, semiconductors, conductive polymers, or the like.
  • more than one conductive pathway may be used in certain embodiments.
  • multiple conductive pathways can be used such that some or all of the nanoscale wires within the device may be electronically individually addressable, as previously discussed.
  • more than one nanoscale wire may be addressable by a particular conductive pathway.
  • other electronic components may also be present within the device, e.g., as part of a conductive pathway or otherwise forming part of an electrical circuit. Examples include, but are not limited to, transistors such as field-effect transistors or bipolar junction transistors, resistors, capacitors, inductors, diodes, integrated circuits, etc. In certain cases, some of these may also comprise nanoscale wires.
  • two sets of electrical connectors and conductive pathways, and a nanoscale wire may be used to define a transistor such as a field effect transistor, e.g., where the nanoscale wire defines the gate.
  • a transistor such as a field effect transistor, e.g., where the nanoscale wire defines the gate.
  • the environment in and/or around the nanoscale wire can affect the ability of the nanoscale wire to function as a gate.
  • one or more electrodes, electrical connectors, and/or conductive pathways may be positioned in electrical and/or physical communication with the nanoscale wires. These can be patterned to be in direct physical contact the nanoscale wire and/or there may be other materials that allow electrical communication to occur. Metals may be used due to their high conductance, e.g., such that changes within electrical properties obtained from the conductive pathway may be related to changes in properties of the nanoscale wire, rather than changes in properties of the conductive pathway. However, in other embodiments, other types of electrode materials are used, in addition or instead of metals.
  • metals may be used in various embodiments of the invention, for example in an electrode, electrical connector, conductive pathway, metal construct, polymer construct, etc.
  • the metals may include one or more of aluminum, gold, silver, copper, molybdenum, tantalum, titanium, nickel, tungsten, chromium, palladium, as well as any combinations of these and/or other metals.
  • the metal may be chosen to be one that is readily introduced, e.g., using techniques compatible with lithographic techniques. For example, in one set of embodiments, lithographic techniques such as e-beam lithography, photolithography, X-ray
  • lithography extreme ultraviolet lithography, ion projection lithography, etc. can be used to pattern or deposit one or more metals.
  • the thickness of one of these may be less than about 5 micrometers, less than about 4 micrometers, less than about 3 micrometers, less than about 2 micrometers, less than about 1 micrometer, less than about 700 nm, less than about 600 nm, less than about 500 nm, less than about 300 nm, less than about 200 nm, less than about 100 nm, less than about 80 nm, less than about 50 nm, less than about 30 nm, less than about 10 nm, less than about 5 nm, less than about 2 nm, etc.
  • the thickness of the electrode may also be at least about 10 nm, at least about 20 nm, at least about 40 nm, at least about 60 nm, at least about 80 nm, or at least about 100 nm.
  • the thickness of an electrode may be between about 40 nm and about 100 nm, between about 50 nm and about 80 nm.
  • more than one metal may be used.
  • the metals can be deposited in different regions or alloyed together, or in some cases, the metals may be layered on top of each other, e.g., layered on top of each other using various lithographic techniques. For example, a second metal may be deposited on a first metal, and in some cases, a third metal may be deposited on the second metal, etc. Additional layers of metal (e.g., fourth, fifth, sixth, etc.) can also be used in some embodiments. The metals may all be different, or in some cases, some of the metals (e.g., the first and third metals) may be the same. Each layer may independently be of any suitable thickness or dimension, e.g., of the dimensions described above, and the thicknesses of the various layers may independently be the same or different.
  • any nanoscale wire can be used in the device.
  • suitable nanoscale wires include carbon nanotubes, nanorods, nanowires, organic and inorganic conductive and semiconducting polymers, metal nanoscale wires, semiconductor nanoscale wires (for example, formed from silicon), and the like. If carbon nanotubes are used, they may be single-walled and/or multi- walled, and may be metallic and/or semiconducting in nature. Other conductive or semiconducting elements that may not be nanoscale wires, but are of various small nanoscopic- scale dimension, also can be used in certain embodiments.
  • a “nanoscale wire” (also known herein as a “nanoscopic- scale wire” or “nanoscopic wire”) generally is a wire or other nanoscale object, that at any point along its length, has at least one cross-sectional dimension and, in some embodiments, two orthogonal cross-sectional dimensions (e.g., a diameter) of less than 1 micrometer, less than about 500 nm, less than about 200 nm, less than about 150 nm, less than about 100 nm, less than about 70, less than about 50 nm, less than about 20 nm, less than about 10 nm, less than about 5 nm, than about 2 nm, or less than about 1 nm.
  • the nanoscale wire is generally cylindrical. In other embodiments, however, other shapes are possible; for example, the nanoscale wire can be faceted, i.e., the nanoscale wire may have a polygonal cross- section.
  • the cross-section of a nanoscale wire can be of any arbitrary shape, including, but not limited to, circular, square, rectangular, annular, polygonal, or elliptical, and may be a regular or an irregular shape.
  • the nanoscale wire can also be solid or hollow.
  • the nanoscale wire has one dimension that is substantially longer than the other dimensions of the nanoscale wire.
  • the nanoscale wire may have a longest dimension that is at least about 1 micrometer, at least about 3
  • micrometers, at least about 5 micrometers, or at least about 10 micrometers or about 20 micrometers in length, and/or the nanoscale wire may have an aspect ratio (longest dimension to shortest orthogonal dimension) of greater than about 2: 1, greater than about 3: 1, greater than about 4: 1, greater than about 5: 1, greater than about 10: 1, greater than about 25: 1, greater than about 50: 1, greater than about 75: 1, greater than about 100: 1, greater than about 150: 1, greater than about 250: 1, greater than about 500: 1, greater than about 750: 1, or greater than about 1000: 1 or more in some cases.
  • aspect ratio longest dimension to shortest orthogonal dimension
  • a nanoscale wire are substantially uniform, or have a variation in average diameter of the nanoscale wire of less than about 30%, less than about 25%, less than about 20%, less than about 15%, less than about 10%, or less than about 5%.
  • the nanoscale wires may be grown from substantially uniform nanoclusters or particles, e.g., colloid particles. See, e.g., U.S. Patent No. 7,301,199, issued November 27, 2007, entitled “Nanoscale Wires and Related Devices," by Lieber, et ah, incorporated herein by reference in its entirety.
  • the nanoscale wire may be one of a population of nanoscale wires having an average variation in diameter, of the population of nanowires, of less than about 30%, less than about 25%, less than about 20%, less than about 15%, less than about 10%, or less than about 5%.
  • a nanoscale wire has a conductivity of or of similar magnitude to any semiconductor or any metal.
  • the nanoscale wire can be formed of suitable materials, e.g., semiconductors, metals, etc., as well as any suitable
  • the nanoscale wire will have the ability to pass electrical charge, for example, being electrically conductive.
  • the nanoscale wire may have a relatively low resistivity, e.g., less than about 10 " Ohm m, less than about 10 "4 Ohm m, less than about 10 "6 Ohm m, or less than about 10 "7 Ohm m.
  • the nanoscale wire can, in some embodiments, have a conductance of at least about 1 microsiemens, at least about 3 microsiemens, at least about 10 microsiemens, at least about 30 microsiemens, or at least about 100 microsiemens.
  • the nanoscale wire can be solid or hollow, in various embodiments.
  • a "nanotube” is a nanoscale wire that is hollow, or that has a hollowed-out core, including those nanotubes known to those of ordinary skill in the art.
  • a nanotube may be created by creating a core/shell nanowire, then etching away at least a portion of the core to leave behind a hollow shell.
  • the nanoscale wire is a non-carbon nanotube.
  • a non-carbon nanotube in one set of embodiments.
  • nanowire is a nanoscale wire that is typically solid (i.e., not hollow).
  • the nanoscale wire may be a semiconductor nanowire, such as a silicon nanowire.
  • a nanoscale wire may comprise or consist essentially of a metal.
  • metals include aluminum, gold, silver, copper, molybdenum, tantalum, titanium, nickel, tungsten, chromium, or palladium.
  • a nanoscale wire comprises or consists essentially of a semiconductor.
  • a semiconductor is an element having semiconductive or semi-metallic properties (i.e., between metallic and non-metallic properties).
  • An example of a semiconductor is silicon.
  • Other non-limiting examples include elemental semiconductors, such as gallium, germanium, diamond (carbon), tin, selenium, tellurium, boron, or phosphorous.
  • more than one element may be present in the nanoscale wire as the semiconductor, for example, gallium arsenide, gallium nitride, indium phosphide, cadmium selenide, etc.
  • Still other examples include a Group II- VI material (which includes at least one member from Group II of the Periodic Table and at least one member from Group VI, for example, ZnS, ZnSe, ZnSSe, ZnCdS, CdS, or CdSe), or a Group III-V material (which includes at least one member from Group III and at least one member from Group V, for example GaAs, GaP, GaAsP, InAs, InP, AlGaAs, or InAsP).
  • at least one of the nanoscale wires is a silicon nanowire.
  • the semiconductor can be undoped or doped (e.g., p-type or w-type).
  • a nanoscale wire may be a p-type semiconductor nanoscale wire or an w-type semiconductor nanoscale wire, and can be used as a component of a transistor such as a field effect transistor ("FET").
  • FET field effect transistor
  • the nanoscale wire may act as the "gate" of a source-gate-drain arrangement of a FET, while metal leads or other conductive pathways (as discussed herein) are used as the source and drain electrodes.
  • a dopant or a semiconductor may include mixtures of Group IV elements, for example, a mixture of silicon and carbon, or a mixture of silicon and germanium.
  • the dopant or the semiconductor may include a mixture of a Group III and a Group V element, for example, BN, BP, BAs, A1N, A1P, AlAs, AlSb, GaN, GaP, GaAs, GaSb, InN, InP, InAs, or InSb. Mixtures of these may also be used, for example, a mixture of BN/BP/BAs, or BN/A1P.
  • the dopants may include alloys of Group III and Group V elements.
  • the alloys may include a mixture of AlGaN, GaPAs, InPAs, GalnN, AlGalnN, GalnAsP, or the like.
  • the dopants may also include a mixture of Group II and Group VI semiconductors.
  • the semiconductor may include ZnO, ZnS, ZnSe, ZnTe, CdS, CdSe, CdTe, HgS, HgSe, HgTe, BeS, BeSe, BeTe, MgS, MgSe, or the like. Alloys or mixtures of these dopants are also be possible, for example, (ZnCd)Se, or Zn(SSe), or the like.
  • alloys of different groups of semiconductors may also be possible, for example, a combination of a Group II-Group VI and a Group Ill-Group V semiconductor, for example, (GaAs) x (ZnS) 1 _ x .
  • Other examples of dopants may include combinations of Group IV and Group VI elemnts, such as GeS, GeSe, GeTe, SnS, SnSe, SnTe, PbO, PbS, PbSe, or PbTe.
  • Other semiconductor mixtures may include a combination of a Group I and a Group VII, such as CuF, CuCl, CuBr, Cul, AgF, AgCl, AgBr, Agl, or the like.
  • dopant compounds may include different mixtures of these elements, such as BeSiN 2 , CaCN 2 , ZnGeP 2 , CdSnAs 2 , ZnSnSb 2 , CuGeP 3 , CuSi 2 P 3 , Si 3 N 4 , Ge 3 N 4 , A1 2 0 3 , (Al, Ga, In) 2 (S, Se, Te) 3 , Al 2 CO, (Cu, Ag)(Al, Ga, In, Tl, Fe)(S, Se, Te) 2 and the like.
  • the doping of the semiconductor to produce a p-type or w-type semiconductor may be achieved via bulk-doping in certain embodiments, although in other
  • a bulk-doped article e.g. an article, or a section or region of an article
  • a bulk-doped article is an article for which a dopant is incorporated substantially throughout the crystalline lattice of the article, as opposed to an article in which a dopant is only incorporated in particular regions of the crystal lattice at the atomic scale, for example, only on the surface or exterior.
  • some articles are typically doped after the base material is grown, and thus the dopant only extends a finite distance from the surface or exterior into the interior of the crystalline lattice. It should be understood that "bulk-doped" does not define or reflect a
  • one or more regions comprise a single monolayer of atoms ("delta- doping").
  • the region may be less than a single monolayer thick (for example, if some of the atoms within the monolayer are absent).
  • the regions may be arranged in a layered structure within the nanoscale wire, and one or more of the regions can be delta-doped or partially delta-doped.
  • the nanoscale wires may include a heterojunction, e.g., of two regions with dissimilar materials or elements, and/or the same materials or elements but at different ratios or concentrations.
  • the regions of the nanoscale wire may be distinct from each other with minimal cross-contamination, or the composition of the nanoscale wire can vary gradually from one region to the next.
  • the regions may be both longitudinally arranged relative to each other, or radially arranged (e.g., as in a core/shell arrangement) on the nanoscale wire.
  • Each region may be of any size or shape within the wire.
  • the junctions may be, for example, a p/n junction, a p/p junction, an n/n junction, a p/i junction (where i refers to an intrinsic semiconductor), an n/i junction, an i/i junction, or the like.
  • the junction can also be a Schottky junction in some embodiments.
  • the junction may also be, for example, a semiconductor/semiconductor junction, a semiconductor/metal junction, a
  • the junction may also be a junction of two materials, a doped semiconductor to a doped or an undoped semiconductor, or a junction between regions having different dopant concentrations.
  • the junction can also be a defected region to a perfect single crystal, an amorphous region to a crystal, a crystal to another crystal, an amorphous region to another amorphous region, a defected region to another defected region, an amorphous region to a defected region, or the like. More than two regions may be present, and these regions may have unique compositions or may comprise the same compositions.
  • a wire can have a first region having a first composition, a second region having a second composition, and a third region having a third composition or the same composition as the first composition.
  • nanoscale wires comprising heterojunctions (including core/shell heterojunctions, longitudinal heterojunctions, etc., as well as combinations thereof) are discussed in U.S. Patent No. 7,301,199, issued November 27, 2007, entitled “Nanoscale Wires and Related Devices," by Lieber, et ah, incorporated herein by reference in its entirety.
  • the nanoscale wire is a bent or a kinked nanoscale wire.
  • a kink is typically a relatively sharp transition or turning between a first substantially straight portion of a wire and a second substantially straight portion of a wire.
  • a nanoscale wire may have 1, 2, 3, 4, or 5 or more kinks.
  • the nanoscale wire is formed from a single crystal and/or comprises or consists essentially of a single crystallographic orientation, for example, a ⁇ 110> crystallographic orientation, a ⁇ 112> crystallographic orientation, or a ⁇ 1120> crystallographic orientation. It should be noted that the kinked region need not have the same crystallographic orientation as the rest of the semiconductor nanoscale wire.
  • a kink in the semiconductor nanoscale wire may be at an angle of about 120o or a multiple thereof.
  • the kinks can be intentionally positioned along the nanoscale wire in some cases.
  • a nanoscale wire may be grown from a catalyst particle by exposing the catalyst particle to various gaseous reactants to cause the formation of one or more kinks within the nanoscale wire.
  • Non-limiting examples of kinked nanoscale wires, and suitable techniques for making such wires, are disclosed in International Patent
  • the nanoscale wire is formed from a single crystal, for example, a single crystal nanoscale wire comprising a semiconductor.
  • a single crystal item may be formed via covalent bonding, ionic bonding, or the like, and/or
  • the single crystal item may include defects in the crystal in some cases, the single crystal item is distinguished from an item that includes one or more crystals, not ionically or covalently bonded, but merely in close proximity to one another.
  • the nanoscale wires used herein are individual or freestanding nanoscale wires.
  • an "individual” or a “free-standing” nanoscale wire may, at some point in its life, not be attached to another article, for example, with another nanoscale wire, or the free-standing nanoscale wire may be in solution.
  • This is in contrast to nanoscale features etched onto the surface of a substrate, e.g., a silicon wafer, in which the nanoscale features are never removed from the surface of the substrate as a free-standing article.
  • the nanoscale wire in some embodiments, may be responsive to a property external of the nanoscale wire, e.g., a chemical property, an electrical property, a physical property, etc. Such determination may be qualitative and/or quantitative, and such determinations may also be recorded, e.g., for later use.
  • the nanoscale wire may be responsive to voltage.
  • the nanoscale wire may exhibits a voltage sensitivity of at least about 5 microsiemens/V; by determining the conductivity of a nanoscale wire, the voltage surrounding the nanoscale wire may thus be determined.
  • the voltage sensitivity can be at least about 10 microsiemens/V, at least about 30 microsiemens/V, at least about 50 microsiemens/V, or at least about 100 microsiemens/V.
  • Other examples of electrical properties that can be determined include resistance, resistivity, conductance, conductivity, impendence, or the like.
  • a nanoscale wire may be responsive to a chemical property of the environment surrounding the nanoscale wire.
  • an electrical property of the nanoscale wire can be affected by a chemical environment surrounding the nanoscale wire, and the electrical property can be thereby determined to determine the chemical environment surrounding the nanoscale wire.
  • the nanoscale wires may be sensitive to pH or hydrogen ions. Further non- limiting examples of such nanoscale wires are discussed in U.S. Patent No. 7,129,554, filed October 31, 2006, entitled “Nanosensors," by Lieber, et ah, incorporated herein by reference in its entirety.
  • the nanoscale wire may have the ability to bind to an analyte indicative of a chemical property of the environment surrounding the nanoscale wire (e.g., hydrogen ions for pH, or concentration for an analyte of interest), and/or the nanoscale wire may be partially or fully functionalized, i.e. comprising surface functional moieties, to which an analyte is able to bind, thereby causing a determinable property change to the nanoscale wire, e.g., a change to the resistivity or impedance of the nanoscale wire.
  • the binding of the analyte can be specific or non-specific.
  • Functional moieties may include simple groups, selected from the groups including, but not limited to, -OH, -CHO, -COOH, -S0 3 H, -CN, -NH 2 , -SH, -COSH, -COOR, halide; biomolecular entities including, but not limited to, amino acids, proteins, sugars, DNA, antibodies, antigens, and enzymes; grafted polymer chains with chain length less than the diameter of the nanowire core, selected from a group of polymers including, but not limited to, polyamide, polyester, polyimide, polyacrylic; a shell of material comprising, for example, metals, semiconductors, and insulators, which may be a metallic element, an oxide, an sulfide, a nitride, a selenide, a polymer and a polymer gel.
  • PSA protein specific antigen
  • a non-limiting example of a protein is PSA (prostate specific antigen), which can be determined, for example, by modifying the nanoscale wires by binding monoclonal antibodies for PSA (Abl) thereto. See, e.g., U.S. Pat. No. 8,232,584, issued July 31, 2012, entitled
  • a reaction entity may be bound to a surface of the nanoscale wire, and/or positioned in relation to the nanoscale wire such that the analyte can be determined by determining a change in a property of the nanoscale wire.
  • the “determination” may be quantitative and/or qualitative, depending on the application, and in some cases, the determination may also be analyzed, recorded for later use, transmitted, or the like.
  • the term “reaction entity” refers to any entity that can interact with an analyte in such a manner to cause a detectable change in a property (such as an electrical property) of a nanoscale wire.
  • the reaction entity may enhance the interaction between the nanowire and the analyte, or generate a new chemical species that has a higher affinity to the nanowire, or to enrich the analyte around the nanowire.
  • the reaction entity can comprise a binding partner to which the analyte binds.
  • the reaction entity when a binding partner, can comprise a specific binding partner of the analyte.
  • the reaction entity may be a nucleic acid, an antibody, a sugar, a carbohydrate or a protein.
  • the reaction entity may be a polymer, catalyst, or a quantum dot.
  • a reaction entity that is a catalyst can catalyze a reaction involving the analyte, resulting in a product that causes a detectable change in the nanowire, e.g. via binding to an auxiliary binding partner of the product electrically coupled to the nanowire.
  • Another exemplary reaction entity is a reactant that reacts with the analyte, producing a product that can cause a detectable change in the nanowire.
  • the reaction entity can comprise a shell on the nanowire, e.g. a shell of a polymer that recognizes molecules in, e.g., a gaseous sample, causing a change in conductivity of the polymer which, in turn, causes a detectable change in the nanowire.
  • binding partner refers to a molecule that can undergo binding with a particular analyte, or “binding partner” thereof, and includes specific, semi- specific, and non-specific binding partners as known to those of ordinary skill in the art.
  • the term “specifically binds,” when referring to a binding partner refers to a reaction that is determinative of the presence and/or identity of one or other member of the binding pair in a mixture of heterogeneous molecules (e.g., proteins and other biologies).
  • a binding partner e.g., protein, nucleic acid, antibody, etc.
  • an enzyme would specifically bind to its substrate, a nucleic acid would specifically bind to its complement, an antibody would specifically bind to its antigen.
  • Other examples include, nucleic acids that specifically bind
  • binding may be by one or more of a variety of mechanisms including, but not limited to ionic interactions, and/or covalent interactions, and/or hydrophobic
  • the antibody may be any protein or glycoprotein comprising or consisting essentially of one or more polypeptides substantially encoded by immunoglobulin genes or fragments of immunoglobulin genes.
  • recognized immunoglobulin genes include the kappa, lambda, alpha, gamma, delta, epsilon and mu constant region genes, as well as myriad immunoglobulin variable region genes.
  • Light chains are classified as either kappa or lambda.
  • Heavy chains are classified as gamma, mu, alpha, delta, or epsilon, which in turn define the immunoglobulin classes, IgG, IgM, IgA, IgD and IgE, respectively.
  • a typical immunoglobulin (antibody) structural unit is known to comprise a tetramer.
  • Each tetramer is composed of two identical pairs of polypeptide chains, each pair having one "light” (about 25 kD) and one "heavy” chain (about 50-70 kD).
  • the N- terminus of each chain defines a variable region of about 100 to 110 or more amino acids primarily responsible for antigen recognition.
  • the terms variable light chain (VL) and variable heavy chain (VH) refer to these light and heavy chains respectively.
  • Antibodies exist as intact immunoglobulins or as a number of well characterized fragments produced by digestion with various peptidases.
  • pepsin digests an antibody below (i.e. toward the Fc domain) the disulfide linkages in the hinge region to produce F(ab)' 2 , a dimer of Fab which itself is a light chain joined to VHCH1 by a disulfide bond.
  • the F(ab)' 2 may be reduced under mild conditions to break the disulfide linkage in the hinge region thereby converting the (Fab) 2 dimer into an Fab' monomer.
  • the Fab' monomer is essentially a Fab with part of the hinge region.
  • Non-limiting examples of antibodies include single chain antibodies, e.g., single chain Fv (scFv) antibodies in which a variable heavy and a variable light chain are joined together (directly or through a peptide linker) to form a continuous polypeptide.
  • scFv single chain Fv
  • a property such as a chemical property and/or an electrical property can be determined, e.g., at a resolution of less than about 2 mm, less than about 1 mm, less than about 500 micrometers, less than about 300 micrometers, less than about 100 micrometers, less than about 50 micrometers, less than about 30 micrometers, or less than about 10 micrometers, etc., e.g., due to the average separation between a nanoscale wire and its nearest neighboring nanoscale wire.
  • the property may be determined within the tissue in 3 dimensions in some instances, in contrast with many other techniques where only a surface of the biological tissue can be studied.
  • any suitable tissue may be studied, e.g., brain tissue, cardiac tissue, vascular tissue, muscle, cartilage, bone, liver tissue, pancreatic tissue, bladder tissue, airway tissues, bone marrow tissue, or the like.
  • such properties can be determined and/or recorded as a function of time.
  • such properties can be determined at a time resolution of less than about 1 min, less than about 30 s, less than about 15 s, less than about 10 s, less than about 5 s, less than about 3 s, less than about 1 s, less than about 500 ms, less than about 300 ms, less than about 100 ms, less than about 50 ms, less than about 30 ms, less than about 10 ms, less than about 5 ms, less than about 3 ms, less than about 1 ms, etc.
  • the biological tissue, and/or portions of the biological tissue may be electrically stimulated using nanoscale wires present within the tissue.
  • the electrically active nanoscale wires may be electrically stimulated, e.g., by using an external electrical system, such as a computer.
  • an external electrical system such as a computer.
  • a single nanoscale wire, a group of nanoscale wires, or substantially all of the nanoscale wires can be electrically stimulated, depending on the particular application.
  • such nanoscale wires can be stimulated in a particular pattern, e.g., to cause cardiac or muscle cells to contract or beat in a particular pattern (for example, as part of a prosthetic or a pacemaker), to cause the firing of neurons with a particular pattern, to monitor the status of an implanted tissue within a subject, or the like.
  • a device can be constructed by assembling various polymers, metals, nanoscale wires, and other components together on a substrate.
  • lithographic techniques such as e-beam lithography, photolithography, X-ray
  • lithography extreme ultraviolet lithography, ion projection lithography, etc. may be used to pattern polymers, metals, etc. on the substrate, and nanoscale wires can be prepared separately then added to the substrate.
  • the substrate e.g., a sacrificial material
  • the device can, in some cases, be formed into a 3-dimensional structure, for example, spontaneously, or by folding or rolling the structure.
  • Other materials may also be added to the device, e.g., to help stabilize the structure, to add additional agents to enhance its biocompatibility, etc.
  • the device can be used in vivo, e.g., by implanting it in a subject, and/or in vitro, e.g., by seeding cells, etc. on the device.
  • cells may initially be grown on the device before the device is implanted into a subject.
  • a schematic diagram of the layers formed on the substrate in one embodiment is shown in Fig. 15. However, it should be understood that this diagram is illustrative only and is not drawn to scale, and not all of the layers shown in Fig. 15 are necessarily required in every embodiment of the invention.
  • the substrate may be chosen to be one that can be used for lithographic techniques such as e-beam lithography or photolithography, or other lithographic techniques including those discussed herein.
  • the substrate may comprise or consist essentially of a semiconductor material such as silicon, although other substrate materials (e.g., a metal) can also be used.
  • the substrate is one that is substantially planar, e.g., so that polymers, metals, and the like can be patterned on the substrate.
  • a portion of the substrate can be oxidized, e.g., forming Si0 2 and/or S1 3 N 4 on a portion of the substrate, which may facilitate subsequent addition of materials (metals, polymers, etc.) to the substrate.
  • the oxidized portion may form a layer of material on the substrate (205 in Fig.
  • one or more polymers can also be deposited or otherwise formed prior to depositing the sacrificial material.
  • the polymers may be deposited or otherwise formed as a layer of material (210 in Fig. 15) on the substrate. Deposition may be performed using any suitable technique, e.g., using lithographic techniques such as e-beam lithography, photolithography, X-ray lithography, extreme ultraviolet lithography, ion projection lithography, etc.
  • some or all of the polymers may be biocompatible and/or biodegradable.
  • the polymers that are deposited may also comprise methyl methacrylate and/or poly(methyl methacrylate), in some embodiments.
  • One, two, or more layers of polymer can be deposited (e.g., sequentially) in various embodiments, and each layer may independently have a thickness of less than about 5 micrometers, less than about 4 micrometers, less than about 3 micrometers, less than about 2 micrometers, less than about 1 micrometer, less than about 900 nm, less than about 800 nm, less than about 700 nm, less than about 600 nm, less than about 500 nm, less than about 400 nm, less than about 300 nm, less than about 200 nm, less than about 100 nm, etc.
  • a sacrificial material may be deposited.
  • the sacrificial material can be chosen to be one that can be removed without substantially altering other materials (e.g., polymers, other metals, nanoscale wires, etc.) deposited thereon.
  • the sacrificial material may be a metal, e.g., one that is easily etchable.
  • the sacrificial material can comprise germanium or nickel, which can be etched or otherwise removed, for example, using a peroxide (e.g., H 2 0 2 ) or a nickel etchant (many of which are readily available commercially).
  • the sacrificial material may be deposited on oxidized portions or polymers previously deposited on the substrate. In some cases, the sacrificial material is deposited as a layer (e.g., 215 in Fig. 15).
  • the layer can have a thickness of less than about 5 micrometers, less than about 4 micrometers, less than about 3 micrometers, less than about 2 micrometers, less than about 1 micrometer, less than about 900 nm, less than about 800 nm, less than about 700 nm, less than about 600 nm, less than about 500 nm, less than about 400 nm, less than about 300 nm, less than about 200 nm, less than about 100 nm, etc.
  • a "bedding" polymer can be deposited, e.g., on the sacrificial material.
  • the bedding polymer may include one or more polymers, which may be deposited as one or more layers (220 in Fig. 15).
  • the bedding polymer can be used to support the nanoscale wires, and in some cases, partially or completely surround the nanoscale wires, depending on the application.
  • one or more nanoscale wires may be deposited on at least a portion of the uppermost layer of bedding polymer.
  • the bedding polymer can at least partially define a device.
  • the bedding polymer may be deposited as a layer of material, such that portions of the bedding polymer may be subsequently removed.
  • the bedding polymer can be deposited using lithographic techniques such as e-beam lithography, photolithography, X-ray lithography, extreme ultraviolet lithography, ion projection lithography, etc., or using other techniques for removing polymer that are known to those of ordinary skill in the art.
  • lithographic techniques such as e-beam lithography, photolithography, X-ray lithography, extreme ultraviolet lithography, ion projection lithography, etc., or using other techniques for removing polymer that are known to those of ordinary skill in the art.
  • more than one bedding polymer is used, e.g., deposited as more than one layer (e.g., sequentially), and each layer may independently have a thickness of less than about 5 micrometers, less than about 4 micrometers, less than about 3 micrometers, less than about 2 micrometers, less than about 1 micrometer, less than about 900 nm, less than about 800 nm, less than about 700 nm, less than about 600 nm, less than about 500 nm, less than about 400 nm, less than about 300 nm, less than about 200 nm, less than about 100 nm, etc.
  • portions of the photoresist may be exposed to light (visible, UV, etc.), electrons, ions, X-rays, etc. (e.g., projected onto the photoresist), and the exposed portions can be etched away (e.g., using suitable etchants, plasma, etc.) to produce the pattern.
  • light visible, UV, etc.
  • electrons, ions, X-rays, etc. e.g., projected onto the photoresist
  • the exposed portions can be etched away (e.g., using suitable etchants, plasma, etc.) to produce the pattern.
  • the bedding polymer may be formed into a particular pattern, e.g., in a grid, or in a pattern that suggests an endogenous probe, before or after deposition of nanoscale wires (as discussed in detail below), in certain embodiments of the invention.
  • the pattern can be regular or irregular.
  • the bedding polymer can be formed into a pattern defining pore sizes such as those discussed herein.
  • the polymer may have an average pore size of at least about 100 micrometers, at least about 200 micrometers, at least about 300 micrometers, at least about 400 micrometers, at least about 500 micrometers, at least about 600 micrometers, at least about 700 micrometers, at least about 800 micrometers, at least about 900 micrometers, or at least about 1 mm, and/or an average pore size of no more than about 1.5 mm, no more than about 1.4 mm, no more than about 1.3 mm, no more than about 1.2 mm, no more than about 1.1 mm, no more than about 1 mm, no more than about 900 micrometers, no more than about 800 micrometers, no more than about 700 micrometers, no more than about 600 micrometers, or no more than about 500 micrometers, etc.
  • any suitable polymer may be used as the bedding polymer.
  • one or more of the polymers can be chosen to be biocompatible and/or biodegradable.
  • one or more of the bedding polymers may comprise a photoresist. Photoresists can be useful due to their familiarity in use in lithographic techniques such as those discussed herein.
  • Non-limiting examples of photoresists include SU-8, S I 805, LOR 3 A, poly(methyl methacrylate), poly(methyl glutarimide), phenol formaldehyde resin (diazonaphthoquinone/novolac), diazonaphthoquinone (DNQ), Hoechst AZ 4620, Hoechst AZ 4562, Shipley 1400- 17, Shipley 1400-27, Shipley 1400-37, etc., as well as any others discussed herein.
  • one or more of the bedding polymers can be heated or baked, e.g., before or after depositing nanoscale wires thereon as discussed below, and/or before or after patterning the bedding polymer.
  • heating or baking in some cases, is important to prepare the polymer for lithographic patterning.
  • the bedding polymer may be heated to a temperature of at least about 30 °C, at least about 65 °C, at least about 95 °C, at least about 150 °C, or at least about 180 °C, etc.
  • nanoscale wires e.g., 225 in Fig. 15
  • a bedding polymer on the substrate e.g., any of the nanoscale wires described herein may be used, e.g., w-type and/or p-type nanoscale wires, substantially uniform nanoscale wires (e.g., having a variation in average diameter of less than 20%), nanoscale wires having a diameter of less than about 1 micrometer, semiconductor nanowires, silicon nanowires, bent nanoscale wires, kinked nanoscale wires, core/shell nanowires, nanoscale wires with heterojunctions, etc.
  • substantially uniform nanoscale wires e.g., having a variation in average diameter of less than 20%
  • nanoscale wires having a diameter of less than about 1 micrometer semiconductor nanowires, silicon nanowires, bent nanoscale wires, kinked nanoscale wires, core/shell nanowires, nanoscale wires with heterojunctions, etc.
  • the nanoscale wires are present in a liquid which is applied to the substrate, e.g., poured, painted, or otherwise deposited thereon.
  • the liquid is chosen to be relatively volatile, such that some or all of the liquid can be removed by allowing it to substantially evaporate, thereby depositing the nanoscale wires.
  • at least a portion of the liquid can be dried off, e.g., by applying heat to the liquid. Examples of suitable liquids include water or isopropanol.
  • the nanoscale wires may be at least partially aligned, e.g., as part of the deposition process, and/or after the nanoscale wires have been deposited on the substrate.
  • the alignment can occur before or after drying or other removal of the liquid, if a liquid is used.
  • Any suitable technique may be used for alignment of the nanoscale wires.
  • the nanoscale wires can be aligned by passing or sliding substrates containing the nanoscale wires past each other (see, e.g., International Patent Application No.
  • nanoscale Wire Methods and Devices can be aligned using Langmuir-Blodgett techniques (see, e.g., U.S. Patent
  • the nanoscale wires can be aligned by incorporating the nanoscale wires in a liquid film or "bubble" which is deposited on the substrate (see, e.g., U.S. Patent Application Serial No. 12/311,667, filed April 8, 2009, entitled "Liquid Films
  • the gas may comprise an inert gas and/or a noble gas, such as nitrogen or argon.
  • a "lead" polymer is deposited (230 in Fig. 15), e.g., on the sacrificial material and/or on at least some of the nanoscale wires.
  • the lead polymer may include one or more polymers, which may be deposited as one or more layers.
  • the lead polymer can be used to cover or protect metal leads or other conductive pathways, which may be subsequently deposited on the lead polymer.
  • the lead polymer can be deposited, e.g., as a layer of material such that portions of the lead polymer can be subsequently removed, for instance, using lithographic techniques such as e-beam lithography, photolithography, X-ray lithography, extreme ultraviolet lithography, ion projection lithography, etc., or using other techniques for removing polymer that are known to those of ordinary skill in the art, similar to the bedding polymers previously discussed.
  • the lead polymers need not be the same as the bedding polymers (although they can be), and they need not be deposited using the same techniques (although they can be).
  • more than one lead polymer may be used, e.g., deposited as more than one layer (for example, sequentially), and each layer may independently have a thickness of less than about 5 micrometers, less than about 4 micrometers, less than about 3 micrometers, less than about 2 micrometers, less than about 1 micrometer, less than about 900 nm, less than about 800 nm, less than about 700 nm, less than about 600 nm, less than about 500 nm, less than about 400 nm, less than about 300 nm, less than about 200 nm, less than about 100 nm, etc.
  • any suitable polymer can be used as the lead polymer.
  • one or more of the polymers may be chosen to be biocompatible and/or biodegradable.
  • one or more of the polymers may comprise poly(methyl methacrylate).
  • one or more of the lead polymers comprises a photoresist, such as those described herein.
  • one or more of the lead polymers may be heated or baked, e.g., before or after depositing nanoscale wires thereon as discussed below, and/or before or after patterning the lead polymer.
  • heating or baking in some cases, is important to prepare the polymer for lithographic patterning.
  • the lead polymer may be heated to a temperature of at least about 30 °C, at least about 65 °C, at least about 95 °C, at least about 150 °C, or at least about 180 °C, etc.
  • a metal or other conductive material can be deposited (235 in Fig. 15), e.g., on one or more of the lead polymer, the sacrificial material, the nanoscale wires, etc. to form a metal lead or other conductive pathway.
  • More than one metal can be used, which may be deposited as one or more layers.
  • a first metal may be deposited, e.g., on one or more of the lead polymers, and a second metal may be deposited on at least a portion of the first metal.
  • more metals can be used, e.g., a third metal may be deposited on at least a portion of the second metal, and the third metal may be the same or different from the first metal.
  • each metal may independently have a thickness of less than about 5 micrometers, less than about 4 micrometers, less than about 3 micrometers, less than about 2 micrometers, less than about 1 micrometer, less than about 900 nm, less than about 800 nm, less than about 700 nm, less than about 600 nm, less than about 500 nm, less than about 400 nm, less than about 300 nm, less than about 200 nm, less than about 100 nm, less than about 80 nm, less than about 60 nm, less than about 40 nm, less than about 30 nm, less than about 20 nm, less than about 10 nm, less than about 8 nm, less than about 6 nm, less than about 4 nm, or less than about 2 nm, etc., and the layers may be of the same or different thicknesses.
  • deposition techniques such as sputtering can be used.
  • Other examples include, but are not limited to, physical vapor deposition, vacuum deposition, chemical vapor deposition, cathodic arc deposition, evaporative deposition, e-beam PVD, pulsed laser deposition, ion-beam sputtering, reactive sputtering, ion-assisted deposition, high-target-utilization sputtering, high-power impulse magnetron sputtering, gas flow sputtering, or the like.
  • the metals can be chosen in some cases such that the deposition process yields a pre-stressed arrangement, e.g., due to atomic lattice mismatch, which causes the subsequent metal leads to warp or bend, for example, once released from the substrate.
  • such pre-stressed arrangements may be used to cause the resulting device to form a 3-dimensional structure, in some cases
  • the metals may not necessary be deposited in a pre-stressed arrangement.
  • metals that can be deposited include, but are not limited to, aluminum, gold, silver, copper, molybdenum, tantalum, titanium, nickel, tungsten, chromium, palladium, as well as any combinations of these and/or other metals.
  • a chromium/palladium/chromium deposition process in some embodiments, may form a pre-stressed arrangement that is able to spontaneously form a 3-dimensional structure after release from the substrate.
  • a "coating" polymer can be deposited (240 in Fig. 15), e.g., on at least some of the conductive pathways and/or at least some of the nanoscale wires.
  • the coating polymer may include one or more polymers, which may be deposited as one or more layers.
  • the coating polymer may be deposited on one or more portions of a substrate, e.g., as a layer of material such that portions of the coating polymer can be subsequently removed, e.g., using lithographic techniques such as e-beam lithography, photolithography, X-ray lithography, extreme ultraviolet lithography, ion projection lithography, etc., or using other techniques for removing polymer that are known to those of ordinary skill in the art, similar to the other polymers previously discussed.
  • the coating polymers can be the same or different from the lead polymers and/or the bedding polymers.
  • more than one coating polymer may be used, e.g., deposited as more than one layer (e.g., sequentially), and each layer may independently have a thickness of less than about 5 micrometers, less than about 4 micrometers, less than about 3 micrometers, less than about 2 micrometers, less than about 1 micrometer, less than about 900 nm, less than about 800 nm, less than about 700 nm, less than about 600 nm, less than about 500 nm, less than about 400 nm, less than about 300 nm, less than about 200 nm, less than about 100 nm, etc.
  • any suitable polymer may be used as the coating polymer.
  • one or more of the polymers can be chosen to be biocompatible and/or biodegradable.
  • one or more of the polymers may comprise poly(methyl methacrylate).
  • one or more of the coating polymers may comprise a photoresist, e.g., as discussed herein.
  • one or more of the coating polymers can be heated or baked, e.g., before or after depositing nanoscale wires thereon as discussed below, and/or before or after patterning the coating polymer.
  • heating or baking in some cases, is important to prepare the polymer for lithographic patterning.
  • the coating polymer may be heated to a temperature of at least about 30 °C, at least about 65 °C, at least about 95 °C, at least about 150 °C, or at least about 180 °C, etc.
  • the sacrificial material may then be removed in some cases.
  • at least a portion of the sacrificial material is exposed to an etchant able to remove the sacrificial material.
  • an etchant for example, a metal etchant such as a nickel etchant, acetone, etc.
  • the device can also be dried, e.g., in air (e.g., passively), by using a heat source, by using a critical point dryer, etc.
  • the device upon removal of the sacrificial material, pre-stressed portions of the device (e.g., metal leads containing dissimilar metals) can spontaneously cause the device to adopt a 3-dimensional structure.
  • the device may form a 3-dimensional structure as discussed herein.
  • the device may have an open porosity of at least about 30%, at least about 40%, at least about 50%, at least about 60%, at least about 70%, at least about 75%, at least about 80%, at least about 85%, at least about 90%, at least about 95%, at least about 97, at least about 99%, at least about 99.5%, or at least about 99.8%.
  • the device may also have, in some cases, an average pore size of at least about 100 micrometers, at least about 200 micrometers, at least about 300 micrometers, at least about 400 micrometers, at least about 500 micrometers, at least about 600 micrometers, at least about 700 micrometers, at least about 800 micrometers, at least about 900 micrometers, or at least about 1 mm, and/or an average pore size of no more than about 1.5 mm, no more than about 1.4 mm, no more than about 1.3 mm, no more than about 1.2 mm, no more than about 1.1 mm, no more than about 1 mm, no more than about 900 micrometers, no more than about 800 micrometers, no more than about 700 micrometers, no more than about 600 micrometers, or no more than about 500 micrometers, etc.
  • the device may need to be rolled, curled, folded, creased, etc., or otherwise manipulated to form the 3- dimensional structure.
  • Such manipulations can be done using any suitable technique, e.g., manually, or using a machine.
  • the device after insertion into matter, is able to expand, unroll, uncurl, etc., at least partially, e.g., due to the shape or structure of the device.
  • a mesh device is able to expand after leaving the syringe.
  • Other materials may be also added to the device, e.g., before or after it forms a 3- dimensional structure, for example, to help stabilize the structure, to add additional agents to enhance its biocompatibility (e.g., growth hormones, extracellular matrix protein, MatrigelTM, etc.), to cause it to form a suitable 3-dimension structure, to control pore sizes, etc.
  • additional agents to enhance its biocompatibility e.g., growth hormones, extracellular matrix protein, MatrigelTM, etc.
  • growth hormones e.g., extracellular matrix protein, MatrigelTM, etc.
  • extracellular matrix proteins include gelatin, laminin, fibronectin, heparan sulfate, proteoglycans, entactin, hyaluronic acid, collagen, elastin, chondroitin sulfate, keratan sulfate, Matrigel , or the like. Many such extracellular matrix proteins are available commercially, and also can be readily identified by those of ordinary skill in the art based on the specific type of cell or tissue used or desired.
  • the device can be interfaced in some embodiments with one or more electronics, e.g., an external electrical system such as a computer or a transmitter (for instance, a radio transmitter, a wireless transmitter, etc.).
  • electronic testing of the device may be performed, e.g., before or after implantation into a subject.
  • one or more of the metal leads may be connected to an external electrical circuit, e.g., to electronically interrogate or otherwise determine the electronic state or one or more of the nanoscale wires within the device.
  • Such determinations may be performed quantitatively and/or qualitatively, depending on the application, and can involve all, or only a subset, of the nanoscale wires contained within the device, e.g., as discussed herein.
  • the connections may include, for example, anisotropic conductive films and/or surfaces having conductive inks, e.g., carbon nanotube inks.
  • Recent advancements in electronics fabrication include the fabrication of electronics on flexible, stretchable and 3D substrates so that electronics can cover soft or non-planar surfaces.
  • New requirements have risen for implementing electronics into objects with minimal invasiveness, 3D distributing nano- and micro-scale sensor units with microscale spatio-resolution in a large volume and mechanically ultra-flexibility.
  • Some examples have shown that either using a substrate to deliver electronics into biological samples with subsequently being released from substrate or constructing a 3D network of the electronics, as discussed in U.S. Patent Application Serial No.
  • This example describes a strategy for electronics design using nanowires. This strategy involves encapsulating electronics units into a mesh polymeric network that mimics the structure of soft materials and freestanding nanomaterials.
  • silicon nanowires were used as semiconductor components and metal electrodes were used as electrical sensing units given their nano- and micro-scale structure,
  • Figs. 1A and IB show schematics of the basic idea of this example.
  • the electronics are in a mesh network encapsulated in photodefinable epoxy (SU-8), which is fabricated on a nickel sacrificial layer (see, e.g., International Patent Application No. PCT/US 14/32743, filed April 2, 2014, entitled "Three-Dimensional Networks
  • Fig. 1A and 6 Electronics were loaded into syringe and then delivered/injected through the needle (Fig. IB) with its subsequent geometrical restoration.
  • the width of ribbons in the network was typically 5 to 40 micrometers, the total thickness was less than 800 nm, and size of unit cells was several hundred micrometers (Fig. 7).
  • Fig. 1C shows a 3D reconstructed confocal fluorescence image of a representative injection.
  • 2-mm-wide syringe injectable electronics were injected through a glass needle with 95-micrometer inner diameters into aqueous phosphate buffer saline (PBS).
  • PBS phosphate buffer saline
  • This electronics had ribbons with feature sizes of 5 micrometers and thicknesses of 700 to 800 nm.
  • the surface of the electronics was modified by poly-D-lysine (0.5-1.0 mg/mL, MW 70,000 to 150,000) to make the surface of the electronics hydrophilic, allowing the electronics to be suspended in PBS solution.
  • Fig. ID The stepwise process of this injection into free solution is shown in Fig. ID.
  • the electronics were loaded into a glass tube (with a 95 micrometer tip) by first connecting the glass needle to a syringe via a plastic tube, and drawing into the end of glass needle (Fig. 8A). The glass needle was then detached from the syringe and mounted onto a commercially available patch-clamp system (Fig. 3B). A microinjector (ALA Scientific Instruments) or the manually controlled syringe was connected to the glass needle to apply sufficient pressure (1 bar, 1-10 ms) for injection.
  • the electronics could be injected out gradually from needle with the electronics being displaced from the needle by 5 to 10 micrometers per injection, with less than 100 nL solution in each injection (Fig. 3C).
  • the injected region of electronics gradually unfolded in solution to reduce the surface energy and internal strain.
  • the injection process could be controlled such that only the region of electronics containing the nanodevices was injected into the target system whereas the metal contact and I/O region were injected outside for external control.
  • Anisotropic conductive film (ACF) was used in some experiments to bond the I/O pads of electronics with external set-ups (Figs. IE and IF).
  • other systems such as carbon nanotubes, may be used for the connections, e.g., as discussed below.
  • the relationship between the yield of injection and the electrical performance of electronics to the inner diameter of needle was evaluated by injection through conventional metal gauge needle in PBS solution. The average yield of injection for nanowire electronics ranged from 98% with needle diameters larger than 600 micrometers to 83% with needle diameters of 100 micrometers.
  • Fig. 1 shows various syringe injectable electronics.
  • Fig. 1A is a schematic of the electronics design in mesh structure for injection.
  • Fig. IB is a schematic injection process. The metal contacts and input/output (I/O) pads are in black. The needle tip, highlighted from the syringe, is shown by dashed circle.
  • Fig. 1C is a 3D-reconstructed fluorescence image showing that after the electronics were injected out of the needle, the electronics subsequently unfolded by itself in the solution.
  • Fig. ID are images showing that the electronics were stepwise injected into solution by a glass needle with diameter of 95 micrometers.
  • Fig. IE is a schematic of bonding.
  • (I) shows a flexible cable
  • (II) shows anisotropic conductive film (ACF)
  • (III) shows unfolded I/O region of electronics on substrate (IV).
  • Fig. IF is an optical micrograph showing that the electronics were fully injected into chamber with solution and fully unfolded. The I/O region was dried and bonded by ACF to flexible cable for measurement.
  • Fig. 1G shows yield (upper graph) and conductance change (lower graph) of nanowire electronics injected through different gauge needles with two kinds of mesh shown in Fig. 7
  • Fig. 6 shows optical images of the device structure.
  • Fig. 6A is a schematic of the syringe injectable electronics used in these examples, including metal contact and I/O pads, supporting polymer and the device.
  • Fig. 6B is an optical micrograph of device region on the mesh corresponds to right dashed box in Fig. 6A.
  • Fig. 6C is an SEM image of the nanowire device corresponds to the middle dashed box in Fig. 6A.
  • Figs. 6D and 6E are optical images of the device.
  • Fig. 7 shows design of the meshes used in these particular examples; other meshes or configurations are also possible.
  • Fig. 7A shows the structure of mesh for injection through needle with inner diameter larger than 200 micrometers, including SU- 8 and metal.
  • (I) is a schematic of the whole mesh; the width is 5 to 15 mm.
  • (II) is a zoomed-in region indicated by black dashed box in (I), highlighting a single unit cell.
  • the length of unit cell is 333 micrometers and width of unit cell is 250 micrometers.
  • the width of ribbon is 20 micrometers.
  • Fig. 7B shows the structure of mesh for injection through a needle smaller than 100 micrometers.
  • (I) shows a schematic of the whole mesh; the width is 2 mm.
  • (II) shows a zoomed-in region indicated by black dashed box in (I), highlighting a single unit cell.
  • the length of unit cell is 333 micrometers and width of unit cell is 250 micrometers.
  • the width of transverse ribbon and longitudinal ribbon is 10 micrometers and 20 micrometers, respectively.
  • FIG. 2A A glass tube was pulled into a fluidic channel (Fig. 2A), with the same geometry and inner diameter as the metal and glass needle used for applications, which allowed the electronics to be injected through for imaging.
  • the channel inner diameter was 200 to 600 micrometers, as measured by confocal fluorescence imaging, and the length was 0.1 to 0.5 mm.
  • the ribbons along the injection direction were called longitudinal ribbons and the ribbons perpendicular to the injection direction were called transverse ribbons.
  • Figs. 2C-2E shows optical micrographs, 3D-reconstructed and cross-section images of assembled structures for each mesh in the glass channel.
  • Fig. 2 shows parameters for injection, according to some embodiments.
  • Fig. 2A is a schematic showing the structure of the pulled glass tube for testing and imaging the structure of different electronics designs in the needle. The arrow indicates the direction of injection.
  • Fig. 2B are schematics of two different designs for injection. (I) shows a mesh with a 45° tilted transverse ribbon, and (II) shows a mesh with straight transverse ribbons. The dashed black circles highlight the detailed structure, with supporting and passivation polymer, and metal lines.
  • Fig. 2C are optical images of different electronics designs injected through glass needle. (Til) show 5-mm-wide meshes as designed in (Fig.
  • FIG. 2B, I were injected through 500-micrometer and 250-micrometer ID glass needles;
  • III shows a 15-mm-wide mesh as designed in (Fig. 2B, I) was injected through a 450- micrometer ID needle;
  • IV shows a 10-mm mesh as design in (Fig. 2B, II) that was injected through a 450-micrometer ID needle.
  • Fig. 2D shows a top view of a 3D reconstructed confocal images corresponding to Fig. 2C.
  • Fig. 2E shows images at cross- sections as indicated by white dashed lines in Fig. 2C. White dashed curves in Fig. 2E highlights the cross-section of needle boundary.
  • EXAMPLE 3 Different assembly structure of these two meshes in the channel and needle may be understood as follows.
  • the bending stiffness for the mesh bent in longitudinal direction and transverse direction of injection may be defined as D L and D T , respectively.
  • the orthogonal-transverse -ribbon design (design #2) lead to a non-uniform distribution of effective bending stiffness D L .
  • the effective bending stiffness D L of different cross-sections when the cross-section goes through the transverse ribbons, the bending stiffness was high (0.0602 nN-m), while when the cross-section did not go through the transverse ribbons, the bending stiffness was lower (0.0025 nN-m).
  • this tilted-transverse-ribbon design decreases D T and increase D L so that the mesh was more readily to bend and roll-up into a tubular structure for going through the needle; the desgin was less readily buckle in the longitudinal direction.
  • Fig. 3A is a schematic showing selection of unit cells from the periodic mesh structure for an example simulation.
  • angle a (alpha) that was between transverse ribbon and longitudinal ribbon to bending stiffness was investigated.
  • the white dashed lines indicate the boundary for unit cells from mesh for simulation.
  • the effective bending stiffness of mesh was defined as the stiffness required a homogenous beam to achieve the same bending under the same moment. Therefore, every unit cell had the same bending stiffness, and a unit cell was used to calculate the effective bending stiffness of the structure from the simulations.
  • Fig. 3B shows that by increasing a (alpha) from 0 to 60 °, D T decreased from 0.0036 to 0.0013 nN-m and D L increased from 0.0051 to 0.0167 nN-m.
  • the bending stiffness ratio between bending in transverse and longitudinal direction increased by about 8.7 times (1.46 to 12.8).
  • Fig. 3 shows mechanical analysis for an injection process according to one embodiment.
  • Fig. 3A are schematics show the structures of two different mesh designs.
  • Black dashed boxes highlight the unit cell structure, including supporting and passivation polymer and metal lines.
  • Fig. 3B shows bending stiffness in the longitudinal ( L ) and transverse directions (D T ) of the mesh with the changes of ribbon angle in Fig. 3A.
  • the inset is a schematic showing that the mesh rolled up in transverse direction in needle.
  • Fig. 3C shows simulated highest strain value as functions of 1/r, with two kinds of mesh shown in Fig. 7.
  • the inset is a representative simulation shows the strain distribution of unit cell in 200-micrometer ID needles. Smaller dashed circle highlights the point with highest strain. Larger dashed circle and black arrow show the inner boundary and diameter of the needle.
  • This example uses simulations to estimate the strain distribution in the electronics during injections in needles with different sizes. Since every unit cell behaves similarly, the bending of only one unit cell to the curvature of the needle was simulated.
  • the inset of Fig. 3C shows one typical unit cell bending structure inside 200-micrometer diameter needle, and shading indicates a contour plot of the maximal principle strain. The maximal value was reached on the junction between the transverse and longitudinal ribbons. Simulation results (Fig. 3C) showed the dependence of the maximal principal strain of the unit cell on the curvature of the needles 1/r, and a linear relation fitted to the dependence.
  • the colors correspond to two different sizes of the mesh structures (Fig. 7) used for needle inner diameter larger or smaller than 200 micrometers.
  • the two mesh structures Fig. 7
  • the stress intensity factor K for a thin film under pure bending has the following scaling relation '
  • Fig. 11 shows the mechanics of the mesh during rolling.
  • Fig. 11A is a schematic showing that the mesh rolls up in a transverse direction in the needle.
  • Fig. 11B shows a 3D-reconstructed fluorescence image of mesh rolling in needle with a 600-micrometer inner diameter. Arrow indicates the bending of transverse ribbons.
  • Fig. HC is an SEM image of the mesh folding on the substrate with the extreme twisting of transverse ribbons (arrows) and junctions (dashed circle). Scale bar: 100 micrometers.
  • syringe injectable electronics could be injected with various mediums and materials into a cavity through a small injection site with subsequent geometrical restoration, allowing the electronic sensor unit to cover a much larger area within the cavity (Fig. 4A).
  • 5-mm-wide electronics containing nanowire strain sensors were mixed with pre-cured poly-dimethylsiloxane (PDMS) (Dow Corp., Midland, MI, USA), diluted in hexane, and then injected through a 20-gauge (603 micrometer) needle into a cavity constituted by two pieces of cured PDMS with the connections injected outside for bonding.
  • PDMS poly-dimethylsiloxane
  • the electronics within the cavity gradually unfolded, with the nanowire nanodevices fully separating from each other and covering a 5 mm x 7 mm area.
  • Four typical nanowire devices (dl, d2, d3, and d4) with the widest separation, as located in Fig. 4B, were used as multiple strain sensors.
  • a uniform tensile strain of 0.9% along x direction (Fig. 4B) caused a decrease of conductance up to 0.34% (Fig. 12) for nanowire devices dl-d4.
  • Fig. 12D When a compressive strain with same value in x direction was applied, the conductance change had similar value but with opposite sign (Fig. 12D), which confirms the conductance change comes from strain deformation.
  • FIG. 4B A point load in the z direction (Fig. 4B), introducing a non-uniform strain distribution in PDMS, is applied at the position elucidated in Fig. 4B, causing the conductance change in Fig. 4C.
  • the devices were under two kinds of strains (compressive: dl and d3; tensile: d2 and d4) in this case.
  • a calibrated conductance change of 0.9% strain value (Fig. 12C and 12D) was used to obtain localized strains when the hybrid structure was under point load in z direction, shown in Fig. 4D.
  • This result shows that injected electronics can be used to measure strain distribution inside PDMS to the external mechanical deformation and demonstrate the injectable electronics can be used in materials and tissue interrogation with little damage to the target system.
  • Fig. 4 shows syringe injectable electronics for soft material.
  • Fig. 4B shows an optical image of devices after being injected and cured in PDMS. The arrows indicate the direction of the force applied in pizoresistive measurements (c and d), or outlines of nanowire device #dl, d2, d3 and d4 in Fig. 4C and 4D. The downward and upward arrows denote the times when the strain was applied and released, respectively.
  • Fig. 4C shows real-time recording of conductance changes by multiplex devices located in Fig. 4B, under point load in z direction with deformation on PDMS.
  • Fig. 4D shows the calculated strain localized near nanowire device #dl, d2, d3 and d4.
  • Fig. 12 shows injection of the electronics in soft matter.
  • Fig. 11 A shows optical images of injectable electronics in PDMS.
  • (I) is a zoomed-in region of electronics in Fig. 4, where the circles outline nanowire device #1, 2, 3 and 4 measured in Fig. 4B. Scale bar: 1 mm.
  • (II) shows that the I/O regions of the device in (I) unfolded and dried on substrate, with the transition part of device from PDMS to substrate fixed by silicone elastomer. Scale bar: 0.2 cm.
  • Fig. 12B is a histogram of conductance changes of the nanowire devices in Fig. 12A, under point load in the z direction. Figs.
  • FIG. 12C and 12D are real-time recording of conductance changes by multiplex devices located in Fig. 12A, under uniform 5 mm tensile deformation (strain: 0.9%) in the x direction (Fig. 12C) and 5 mm compressive deformation (strain: 0.9%) in the x direction (Fig. 12D).
  • the downward and upward arrows denote the times when the strain was applied and released, respectively.
  • Fig. 10A The injection in continuous soft materials, especially biomaterials, was also tested (Fig. 10A). Specifically, 2-mm-wide electronics were injected into a 30% polymerized Matrigel through a 22-gauge (413 micrometer) needle, which first showed a compressed structure but unfolded 100% after incubation in 37 °C for 72 hours to allow the nanowire or metal electrode sensing unit to distribute in Matrigel (Fig. 5B).
  • the D L of this injectable electronics was estimated to be ca. 0.01 nN m, which was similar to the bending stiffness of tissue and its bending energy matches the surface membrane energy and significantly less than the stiffness of a conventional silicon probe.
  • the design of macroporous structures may also allow for the growth of tissue within the interior space.
  • hippocampus region of the mice (Fig. 5E) through a 100-micrometer inner diameter glass needle controlled by microinjector, which allowed trace amount of solution ( ⁇ 1 microliters) to be injected with electronics in each injection.
  • Fluorescence imaging of coronally sliced brain tissue showed that the electronics unfolded after 5 weeks and settled into the hippocampus region with little interruption to the layered structure of neurons (Fig. 5E). Notably, the neurons had grown together with the ribbons of electronics (Fig. 5F).
  • the horizontal slice with immuno staining for astrocytes and microglial further showed a reduced chronic tissue response with little gliosis and immunoreactivity at the injection site, and also the area to which the mesh finally settles. Specifically, microglia adjacent to the electronics ribbon were not seen by Iba-1 staining (Fig. 5G).
  • Fig. 10 shows control experiments of electronics inside a needle.
  • Fig. 10A shows an optical image showing a 5-mm-wide mesh injected through a 400-micrometer glass needle. Arrow indicates the direction of injection.
  • Fig. 10B is a top view of a 3D- reconstructed confocal images correspond to Fig. 10A.
  • Fig. IOC shows images at cross- section as indicated by white dashed line in Fig. 10B.
  • the white dashed circle in Fig. IOC highlights the distribution of mesh in the needle cross-section (highlighted by white dashed line in Fig. 10B).
  • Fig. 10D are schematics of a thin film electronics for injection showing supporting and passivation polymer and metal lines.
  • Figs. 10E-10F are images showing SU-8 film/metal with width below 1mm can be injected through a 400- micrometer needle.
  • Fig. 13 shows delivery of injectable electronics in an example in vivo system, with the process of stereotactic injection of injectable electronics.
  • the electronics are loaded into a glass needle in Fig. 13A.
  • Fig. 13B After injection of device region into tissue (Fig. 13B), the needle is withdrawn to extrude and the I/O region is injected on the outside of skull (Fig. 13C).
  • Fig. 13D shows a zoomed-in region of dashed box highlighted in Fig. 13C.
  • Fig. 5 shows syringe injectable electronics for biological system.
  • Fig. 5A is a schematic shows injecting electronics into matrigel together with cells, including the mesh structure of injectable electronics and cells.
  • Fig. 5B are images showing that the device unfolds after being injected into matrigel for 72 hours.
  • Fig. 5C are confocal fluorescence images of a 100-micrometer projection, showing the interpenetration between neurons and ribbons of injectable electronics after co-injected into Matrigel for 14 days. The image shows both the mesh and beta-tubulin staining for neurons.
  • Fig. 4D I is a schematic showing stereotactic injection of injectable electronics into an in vivo system. II is an optical image showing the stereotactic injection of injectable electronics into mice brain.
  • the schematic shows that when injectable electronics were injected into the brain, into the hippocampus (III) as well as the lateral ventricle cavity in the brain, they unfolded.
  • IV shows the mesh structure of the injectable electronics, and I/O pads for electrical connections. Dashed lines indicate direction of horizontal slicing for imaging.
  • Fig. 4E shows bright-field and epi-fluorescence image of the coronal slice in Fig. 4D, III, showing that the electronics were injected into the hippocampus. DAPI staining used.
  • Fig. 4F shows a projection of 30-micrometer- thick volume from the zoomed-in region by white dashed box in Fig. 4E, with neurons interfacing with the electronics.
  • Fig. 4G is a confocal image of a 30-micrometer horizontal slice shows staining for astrocytes, active microglia, and nuclei respect to the device at the position indicated by the dashed line in Fig. 4D, III. Fig.
  • FIG. 4H is a projection of a 100-micrometer- thick volume for a device injected into cavity inside brain (lateral ventricle) at the position indicated by blue dashed line in Fig. 4D, IV.
  • Fig. 41 is a projection of a 30-micrometer-thick volume for the zoomed-in region highlighted by white dashed box in Fig. 4H, showing the interface between the electronics and subventricular zone.
  • Fig. 4J is a 3D
  • Fig. 14 shows the interface between electronics and tissue in an example in vivo system.
  • Fig 14A is a projection of 30-micrometer-thick volume slices, showing the interface between electronics in in vivo with a subventricular zone (I), and 3D
  • FIG. 14B is a projection of a 30-micrometer-thick volume of slice shows the interface between electronics in in vivo with staria (I) and a 3D reconstruction of the dashed box
  • Fig. 14C is a control sample shows subventricular zone without a device.
  • Fig. 14D is a projection of an 80-micrometer-thick volume for the region highlighted by the white box in Fig. 5H. Scale bar is 160 micrometers.
  • some embodiments bay be directed to using use injectable electronics to directly mobilize and monitor the adult stem neurons from lateral ventricle region to brain injury for therapy.
  • This example provides various materials and methods used in the above examples.
  • Freestanding injectable electronics were fabricated on nickel relief layer. See, e.g., International Patent Application No. PCT/US 14/32743, filed April 2, 2014, entitled “Three-Dimensional Networks Comprising Nanoelectronics," by Lieber, et ah, incorporated herein by reference.
  • the electronics were modified by poly-D-lysine (MW 70,000 to 150,000, Sigma-Aldrich Corp.) and then loaded into syringe with metal gauge needle by glass pipette or loaded into glass needle pulled by a commercial available pipette puller (Model P-97, Sutter Instrument).
  • a microinjector (NPIPDES, ALA Scientific instruments Inc.) or manually controlled syringes (Pressure Control Glass Syringes, Cadence, Inc.) were used to inject electronics.
  • ACF AC-4351Y, Hitachi Chemical Co.
  • bonding was conducted by home-made or commercial bonding systems (Fineplacer Lambda Manual Sub-Micron Flip-Chip Bonder, Finetech, Inc.) with a flexible cable (FFC/FPC Jumper Cables PREMO-FLEX, Molex). Recording was amplified with a multi-channel preamplifier, filtered with a 3 kHz low pass filter (CyberAmp 380), and digitized at a 50 kHz sampling rate (Axon Digil440A).
  • Nanowire Synthesis Single-crystalline nanowires were synthesized using the Au nanocluster-catalyzed vapor-liquid- solid growth mechanism in a home-built chemical vapor deposition (CVD) system.
  • Au nanoclusters Ted Pella Inc. Redding, CA
  • Au nanoclusters with 30 nm diameters were dispersed on the oxide surface of silicon/Si0 2 substrates (600 nm oxides, n-type 0.005 V.cm, Nova Electronic Materials, Flower Mound, TX) and placed in the central region of a quartz tube CVD reactor system.
  • Uniform 30-nm p-type silicon nanowires were synthesized. In a typical synthesis, the total pressure was 40 torr, and the flow rates of SiH 4 , diborane (B 2 H6, 100 ppm in H 2 ), and hydrogen (H 2 ,
  • the silicon-boron feed-in ratio was 4,000: 1, and the total nanowire growth time was 30 - 60 min.
  • Freestanding syringe injectable electronics fabrication Key steps used in the fabrication of the syringe injectable electronics included the following: (1) Thermal deposition were used to deposit a 100-nm nickel metal layer over the whole silicon wafer (600-nm Si0 2 or 100-nm SiO 2 /200-nm Si 3 N 4 , n-type 0.005V.cm, Nova Electronic Materials, Flower Mound, TX), where the nickel served as the final relief layer for freestanding electronics. (2) A 300- to 400-nm layer of SU-8 photoresist (2000.5;
  • MicroChem Corp., Newton, MA was spin cast (3000 rpm) over the entire chip followed by prebaking at 65 °C and 95 °C for 2 and 4 min, respectively.
  • Photolithography was used to pattern the bottom SU-8 layer for passivating and supporting the whole device structure.
  • SU-8 developer (MicroChem Corp., Newton, MA) was used to develop the SU-8 pattern.
  • SU-8 developer (MicroChem Corp., Newton, MA) was used to develop the SU-8 pattern. Those nanowires on the non-exposed area were removed by further washing away in isopropanol solution 30 s for twice leaving those selected nanowires patterned on the regular patterns of SU-8 structure. The SU-8 patterns were cured at 180 °C for 20 min.
  • Photolithography and thermal deposition were used to define and deposit the metal contact to address each nanowire device and form interconnections to the input/output pads for the array.
  • symmetrical Cr/Au/Cr 1.5/50-80/1.5 nm
  • metal liftoff in acetone.
  • symmetrical Cr/Pd/Cr 1.5/50-80/1.5 nm
  • nonsymmetrical Cr/Pd/Cr (1.5/50-80/50-80 nm) metal was sequentially deposited followed by metal liftoff in acetone.
  • a 300- to 400-nm layer of SU-8 photoresist was spin cast (3000 rpm) over the entire chip, followed by prebaking at 65 °C and 95 °C for 2 and 4 min, respectively. Then lithography was used to pattern the top SU-8 layer for passivating the whole device structure.
  • the structure was post- baked, developed, and cured by the same procedure as described above.
  • a 300- and 500-nm thick layers of LOR 3A and S 1805 (MicroChem Corp., Newton, MA) photoresist can be deposited by spin-coating and defined by photolithography to further protect the device region if necessary.
  • the 2D syringe injectable electronics were released from the substrate by etching of the nickel layer (Nickel Etchant TFB, Transene Company Inc.) for 3 to 4 hours at 25 °C.
  • the electronics were transferred into deionized (DI) water for rinsing and then dried on substrate, exposed in ultraviolet light (430 nm, 120 s) to sensitize the photoresist protection with subsequently immersed in developer solution (MF-CD-26, MicroChem Corp., Newton, MA) to dissolve the protection on device region.
  • DI deionized
  • MF-CD-26 MicroChem Corp., Newton, MA
  • Ultra55/Supra55VP field-emission SEMs was used to characterize the structure of electronics.
  • Bright- field and dark- field optical micrographs of samples were acquired on an Olympus FV1000 system using FSX-BSW software (ver. 02.02).
  • Fluorescence images were obtained by doping the SU-8 resist solution with Rhodamine 6G (Sigma- Aldrich Corp., St. Louis, MO) at a concentration less than 1 micrograms/mL before deposition and patterning by Olympus FSX100 confocal microscopy system.
  • Image J (ver. 1.45i, Wayne Rasband, National Institutes of Health, USA) was used for 3D reconstruction and analysis of the confocal and epi-fluorescence images.
  • the freestanding electronics was transferred into DI water by glass pipette to remove nickel etchant or developer solution. Then the electronics was transferred and soaked into poly-D-lysine (PDL, 0.5-1.0 mg/ml, MW 70,000 to 150,000, Sigma-Aldrich Corp., St. Louis, MO) aqueous solution for 2 to 12 hours at 25 °C for surface modification. After surface modification, the electronics was transferred into PBS (HyCloneTM Phosphate Buffered Saline, Thermo Fisher Scientific Inc., Pittsburgh, PA) buffer solution for future use.
  • PBS HyCloneTM Phosphate Buffered Saline, Thermo Fisher Scientific Inc., Pittsburgh, PA
  • A. General tilted mesh electronics The structure is illustrated in Fig. 7.
  • the ribbon along the injection direction is called the longitudinal ribbon and the ribbon perpendicular to the injection direction is called the transverse ribbon.
  • the transverse ribbons are tilted 45° counterclockwise to transverse direction on the mesh plane forming 45° angle to longitudinal ribbons.
  • Metal contacts were mainly encapsulated in longitudinal ribbons. Some transverse ribbons also contained metal contacts to form the source-drain of field-effect transistor. For passive metal electrode electronics, only longitudinal ribbons contained metal contact. Silicon nanowire devices and passive metal electrodes were patterned either on the longitudinal ribbons in the center of unit cells or patterned separately in a beam in the longitudinal direction on the transverse ribbons in the center of unit cells to reduce strains for device during injection.
  • the 100-nm thick metal lines were encapsulated in the middle of two 350-nm thick SU-8 layers.
  • the total SU-8 thickness was about 700 nm.
  • Transverse ribbons and longitudinal ribbons together formed mesh with periodic unit cells.
  • Design #1 was used for injection by needle with inner diameter larger than 200 micrometers (Fig. 7A).
  • the width of the mesh was 5 to 15 mm.
  • the length of unit cell was 333 micrometers and the width of unit cell was 250 micrometers. All the SU-8 layers in these experiments were 20 micrometers in width and all of the metal layers were 10 micrometers in width.
  • Design #2 was used for injection by needle with inner diameter smaller than 200 micrometers (Fig. 7B).
  • the width of mesh was 2 to 5 mm.
  • the length of unit cell was 333 micrometers and the width of unit cell was 250 micrometers.
  • SU-8 layers in longitudinal ribbons were 20 micrometers in width and the SU-8 layers in transverse ribbons were 5 to 10 micrometers in width.
  • Metal layers in longitudinal ribbons were 10 micrometers in width and metal layers in transverse ribbons are 2 to 5 micrometers in width.
  • Control orthogonal mesh electronics sample The transverse ribbons were perpendicular to the longitudinal ribbons to form an orthogonal mesh with the same periodic unit cell structure. All metal line patterns, thickness and width of ribbons are the same as design #1 of tilted trasverse ribbons electronics. The width of electronics was 5 to 15 mm for testing.
  • Control thin film electronics sample The thickness of SU-8 was 700 nm.
  • the metal line patterns were the same as design #1 of tilted mesh electronics.
  • the width of electronics was 0.1 to 5 mm.
  • Glass needle and fluidic channel preparation were by using a conventional pipette puller (Model P-97, Sutter Instrument, CA) and glass tube (30- 0057, Harvard Apparatus) following the parameters: Heat: Ramp + 25, Pull: 0, Velocity: 140, Time: 100 and Pressure: 200.
  • a conventional pipette puller Model P-97, Sutter Instrument, CA
  • glass tube (30- 0057, Harvard Apparatus) following the parameters: Heat: Ramp + 25, Pull: 0, Velocity: 140, Time: 100 and Pressure: 200.
  • Ceramic tiles #CTS, Sutter Instrument, CA
  • the pulling was halted and suspended in the middle to not completely break the glass tube (VWR International, LLC, Radnor, PA).
  • the channel size was characterized by confocal fluorescence imaging.
  • Rodamine-6G Sigma-Aldrich Corp., St. Louis, MO
  • epoxy glue was used to increase stability of channel preventing channel broken during imaging.
  • the surface-to-volume-ratio of a ribbon or a film was calculated as:
  • Cranston, RI Cranston, RI
  • metal gauge needle Veterinary Needles, Cadence, Inc., Cranston, RI
  • glass pipette Disposable Pasteur Pipets, Lime Glass, VWR International, LLC, Radnor, PA .
  • the orientation and unfolded structure of the electronics in the syringe should be performed to prevent any buckles. Press the syringe and allow the tip part of the electronics be loaded into the needle.
  • Fig. 8 shows the controllable injection process.
  • Fig. 8A is a schematic showing how the mesh electronics was stepwise loaded into glass needle.
  • the tip of the glass needle was connected to a syringe by a plastic tube.
  • the injectable electronics device was drawn into the needle from the end of glass needle.
  • (II) shows the electronics device loaded into the glass needle.
  • (Ill) shows the glass needle was mounted to a patch- clamp setup for injection.
  • Fig. 8B shows a setup of controllable injection system.
  • FIG. 8C shows optical images of a typical electronics transfer during injection process.
  • I- VI shows that the electronics was gradually injected into free solution by a micro-injector with 1 bar pressure, 10 ms pulse (before dashed line in Fig. 8D) and 50 ms pulse (after the dashed line in Fig. 8D) injection times for each step.
  • Fig. 8D shows the injected length of electronics vs. number of injection.
  • the electronics were transferred through glass pipette to PDL aqueous solution for surface modification as described above.
  • the electronics were loaded by glass pipette into syringe with gauge metal needle and injected through needle with different inner diameters (from 100 to 600 micrometers) into a chamber with the 170 part unfolded near the chamber on a substrate (Fig. IF).
  • Ethanol was used to rinse and dry the I/O part.
  • Conductance (G / ) for each device was measured again with the same probe station under same condition, and the total number of survived devices with G / above 100 nS was TV / . Yield and conductance changes in Fig. 1G were calculated as (Ni/No) and (G / -Go)/Go, respectively.
  • ACF bonding process After fabrication, the electronics were injected through a syringe into solution, soft matters, biomaterials or tissues, with I/O part injected outside the target materials. DI water and other solvents (PBS, culture medium, hexane, etc.) were introduced to facilitate unfolding the I/O region, after which the I/O region was rinsed and dried with ethanol (ethanol, 190 proof (95%), VWR International, LLC, Radnor, PA) (Fig. 9A and 9B). For the connection to measurement setup, the unfolded and dried I/O region of injectable electronics was bonded to the flexible cable (FFC /
  • ACF anisotropic conductive film
  • the ACF was 1.2 mm wide with conductive particles ⁇ 3 micrometers in diameter.
  • an ACF with protective layer was positioned on the I/O region, and presealed after being heated to 90 ° and a pressure of 1 MPa for 1 min with a homemade hot bar or commercial bonding system (Fineplacer Lambda Manual Sub-Micron Flip- Chip Bonder, Finetech, Inc., Manchester, NH) to tack it on the I/O part with protective layer removed.
  • the flexible cable was placed on the ACF and aligned.
  • the endsealing was made with a temperature of 190 to 210 °C in ACF and a pressure of 4 MPa on the top for 5 min applied by homemade hot bar or a commercial bonding system.
  • the structure was peeled from the substrate and examined by optical microscopy (Fig. 9B, IV).
  • connection resistance of ACF was measured to investigate the influence of bonding on electrical properties of devices (Fig. 9C-9D).
  • the conductance of each device was measured by the probe station as Ro and Rj before and after ACF bonding, respectively.
  • the connection resistance for each I/O pad (100 micrometers diameter) was calculated as (Rj-Ro)/2, illustrated in Fig. 9C.
  • the calculated connection resistance after ACF bonding with commercial bonder and homemade bonding is ca. 21.2 ohms and ca. 33.7 ohms respectively (Fig. 9D), below 0.05% of typical nanowire resistance.
  • the insulation resistance between I/O pads without circuits was over 10 10 ohms.
  • Fig. 9 shows the bonding process used here.
  • Fig. 9A is a schematic showing the steps of bonding process.
  • (I) shows that the I/O region of the electronics device was unfolded on the substrate
  • (II) shows the ACF film was attached to I/O region
  • (III) shows a flexible cable aligned with the I/O pads
  • (IV) shows that a hot bar was applied to the bonding region to make the connection.
  • Fig. 9B shows optical images correspond to the steps in Fig. 9A.
  • Scale bar 0.5 cm (I), 1 cm (II, III).
  • (IV) shows the I/O pads of electronics were bonded with flexible cable after heating and pressure applied by the hot bar. Scale bar: 200 micrometers.
  • Fig. 9C shows the connection resistance of the ACF film bonded by flipchip bonder (upper trace) and a homemade bonding system (lower trace).
  • Fig. 9D shows the statistic results of connection resistance data in Fig. 9C, showing
  • Imaging of electronics in glass channel Electronics with different widths and mesh structures were injected into the glass channels following the same injection process described above. However, the electronics were only partially injected through the needle. Confocal fluorescence microscope was used to image the 3D structure of the electronics in the glass needle. ImageJ was used to re-slice the 3D reconstructed images of device in the longitudinal direction by the step of 1 micrometers.
  • the longitudinal ribbons were partitioned into a one-layer part and a three-layer part (Fig. 7C).
  • a homogeneous section with 700-micrometer thick SU-8 is assigned to the transverse ribbons, while a composite section with three layers of 300-nm thick SU8, 100-nm thick gold and another 300-nm thick SU-8 was assigned to the three-layer part of the longitudinal ribbons.
  • Both SU-8 and gold were modeled as linear elastic material, with Young's moduluses of 2 GPa and 79 GPa, respectively.
  • a fixed boundary condition was set at one of the ends parallel with the bending direction, and a small vertical displacement d is added at the other end.
  • the external work w to bend the device is calculated.
  • the effective bending stiffness of the device was defined as the stiffness required of a homogenous beam to achieve the same external work w under the displacement d. Therefore, the effective bending stiffness per width of the device can be estimated as:
  • the bending energy scales as ⁇ Dw/L, with w the width of the device.
  • the surface membrane energy due to the insertion of the electronics scaled as ⁇ ywt . Therefore, the ratio of the bending energy and the surface energy gives the dimensionless number D I ytL , which describes the flexibility of the device compared to the membrane tension of cells.
  • the electronics used here have the properties of D-0.01 nN m, t ⁇ 1 micrometer, and L ⁇ 1 cm, and typical cells have ⁇ ⁇ lmN/m . D l ytL ⁇ ⁇ . Therefore, the electronics used in this example had the proper flexibility for it to function well and integrate with cells.
  • PDMS pre-polymer components were prepared in a 10: 1 (base:cure agent; Sylgard 184, Dow Corning Corporation, Midland, MI) weight ratio at first, and diluted by hexane (n-hexane 95% optima, Fisher Scientific Inc., Pittsburgh, PA) in a 1 :3 (PDMS:hexane) volume ratio.
  • the cavity for injection was formed by two pieces of cured PDMS (cured at 65 °C for 2 hours; Sylgard 184, Dow Corning Corporation, Midland, MI).
  • the electronics were transferred from water to ethanol after etching, dissolved in PDMS/hexane solution and then loaded into glass syringe with 18 gauge metal needle.
  • the device region was injected into the cavity (Fig. 12A, I), with the I/O region injected outside the cavity on a silicon wafer or a glass side (Vista Vision Microscope Slides, Plain and Frosted, VWR International, LLC, Radnor, PA). Hexane was used to wash away PDMS residues on the I/O region, after which the I/O region were unfolded with alcohol (Fig. 12A, II).
  • the transition part of electronics from PDMS to substrate was fixed by Kwik-Sil (World Precision Instruments, Inc., Sarasota, FL) silicone elastomer to avoid damage to the device during the drying process. Finally, the hybrid structure of PDMS and electronics was cured at room temperature for 48 hours.
  • the I/O pads were bonded to flexible cable through ACF as the process described above.
  • the strain field caused by point load in z direction was determined in experiments where the hybrid structure with calibrated nanowire strain sensors was subject to non-uniform deformations.
  • Inject electronics in Matrigel with and without neurons Poly-D-lysine modified electronics was transferred into PBS solution and then into NeurobasalTM medium (Invitrogen, Grand Island, NY). The electronics were loaded into metal syringe needle as described above.
  • MatrigelTM (BD Bioscience, Bedford, MA) was diluted into 30% (v/v) with neuron culture medium and polymerized at 37 °C. The electronics was injected into polymerized Matrigel. The hybrid structure was incubated in 37 °C to investigate the unfolding of electronics in MatrigelTM.
  • Hippocampal neurons (Gelantis, San Diego, CA) were prepared using a standard protocol.
  • 5 mg of NeuroPapain Enzyme (Gelantis, San Diego, CA) was added to 1.5 ml of NeuroPrep Medium (Gelantis, San Diego, CA).
  • the solution was kept at 37 °C for 15 min, and sterilized with a 0.2 micrometer syringe filter (Pall Corporation, MI).
  • Day 18 embryonic Sprague/Dawley rat hippocampal tissue with shipping medium (El 8 Primary Rat Hippocampal Cells, Gelantis, San Diego, CA) was spun down at 200 g for 1 min. The shipping medium was exchanged for NeuroPapain Enzyme medium.
  • a tube containing tissue and the digestion medium was kept at 30 °C for 30 min and manually swirled every 2 min, the cells were spun down at 200 g for 1 min, the NeuroPapain medium was removed, and 1 ml of shipping medium was added. After trituration, cells were isolated by centrifugation at 200 g for 1 min, then resuspended in 5-10 mg/ml MatrigelTM at 4 °C. MatrigelTM with neurons were mixed with electronics at 4 °C and then loaded into syringe with a metal gauge needle. The electronics and neurons were co-injected into 30% (v/v) polymerized MatrigelTM in a culture plate and then placed in an incubator to allow the MatrigelTM to gel at 37 °C for 20 min.
  • NeuroPure plating medium 1.5 ml of NeuroPure plating medium was added. After 1 day, the plating medium was changed to NeurobasalTM medium (Invitrogen, Grand Island, NY) supplemented with B27 (B27 Serum- Free Supplement, Invitrogen, Grand Island, NY), GlutamaxTM (Invitrogen, Grand Island, NY) and 0.1% Gentamicin reagent solution (Invitrogen, Grand Island, NY).
  • NeurobasalTM medium Invitrogen, Grand Island, NY
  • B27 B27 Serum- Free Supplement, Invitrogen, Grand Island, NY
  • GlutamaxTM Invitrogen, Grand Island, NY
  • Gentamicin reagent solution Invitrogen, Grand Island, NY
  • the cells were incubated with the secondary antibodies AlexaFluor-546 goat anti-mouse IgG (1: 1000, Invitrogen, Grand Island, NY).
  • the cells were incubated with 0.1-1 microgram/mL Hoechst 34580 (Molecular Probes, Invitrogen, Grand Island, NY) for 1 min.
  • Sterile saline was swabbed on the brain surface to keep it moist throughout the throughout the surgery.
  • a sterotaxic arm was used to clamp the needle containing the injectable electronics.
  • the electronics were loaded into the needle by first connecting the glass needle to a syringe via a plastic tube and drawn into the end of the glass needle. The glass needle was then detached from the syringe and then mounted to a patch-clamp setup for injection. The glass needle had a diameter of 100 to 200 micrometers. The needle was lowered into the exposed brain surface and the syringe or microinjector was used to inject the electronics into the brain.
  • the needle was lowered approximately 1 mm into the skull (Interaural: 6.16 mm, Bregma: -3.84 mm), to test the effects of deep brain and superficial layer injections. After injection, the needle is drawn out of the brain tissue and the I/O region was injected on the surface of the skull.
  • mice underwent transcardial perfusion (40 mL PBS) and were fixed with 4% formaldehyde (Sigma, 40 mL) four weeks after the surgery.
  • Mice were decapitated and brains were removed from the skull and set in 4% formaldehyde for 24 hours as post fixation and then PBS for 24 hours to remove extra formaldehyde. Electronics was kept inside the brain throughout fixing process.
  • the brains were blocked, separated into the two hemispheres and mounted on the stage of vibratome (Vibrating Blade Microtome Leica VT1000 S, Leica Microsystems Inc. Buffalo Grove, IL).
  • micrometer vibratome tissue slices were prepared for samples with staining for microglia, astrocytes and nuclei.
  • 30-50 micrometer vibratome tissue slices were prepared for samples with staining for neurons.
  • the brains were blocked and then fixed in 1% (w/v) agarose type I-B (Sigma- Aldrich Corp., St. Louis, MO) to fix the position of the electronics in the lateral ventricle cavity and then mounted on the stage of vibratome.
  • 100 micrometer vibratome tissue horizontal slices were prepared. Coronal slices allowed for cuts in a direction along the long axis of the injected electronics and horizontal slices allowed for cuts in a direction perpendicular to the long axis of the injected device.
  • Chronic Immunohistochemistry Neuron.
  • the slices were cleared with 5 mg/mL sodium borohydride in HBHS for 30 minutes, with 3 following washes with HBHS in 5- 10 minute intervals. Then, the slices were incubated with 0.5% (v/v) Triton X-100 in HBHS for 30 min at room temperature. Next, sections were blocked with 5% (w/v) serum and incubated overnight at room temperature. Next, slices were washed four times in 30-minute intervals with HBHS to clear any remaining serum in the tissue. The slices were then incubated with primary antibody (NeuN, 1:200, AbCam #ab77315) in 0.3% Triton-XlOO and 3% serum in PBS overnight at room temperature.
  • syringe injection allows delivery of flexible electronics through a rigid shell, delivery of large volume flexible electronics that can fill internal cavities and co-injection of electronics with other materials into host structures, capabilities that are distinct from and open up unique applications for flexible electronics.
  • syringe injectable electronics is shown schematically in Figs. 16A-16C and involves (i) loading the mesh electronics into a syringe and needle, (ii) insertion of the needle into the material or internal cavity and initiation of mesh injection (Fig. 16A), (iii) simultaneous mesh injection and needle withdrawal to place the electronics through the targeted region (Fig. 16B), and (iv) delivery of the input/output (I/O) region of the mesh outside of the material (Fig. 16C) for subsequent bonding and measurements.
  • the basic mesh structure (Fig. 16D) includes longitudinal
  • a simulation of D T and D L as a function of alpha shows that D T (D L ) decreases (increases) as expected for increasing alpha. For example, D T decreases 30% as alpha increases from 0° to 45° (Fig.
  • the mesh electronics were fabricated (details, see, below) and fully-released from substrates, and were then loaded into glass needles by drawing the device end of the mesh electronics from the larger end to the needle opening with suction.
  • the needle with oriented mesh electronics was reversed, mounted on a three-axis manipulator and connected to a microinjector. Images of the injection of a 2 mm wide mesh electronics sample through a 95 micrometer ID glass needle show the compressed mesh ca. 250 micrometer from the needle opening (Fig. 16F), and then injected ca. 0.5 cm into lx PBS solution (Fig. 16G), where the latter 3D reconstructed confocal fluorescence image highlights the unfolding of the mesh structure from the point of the needle constriction (dashed box).
  • anisotropic conductive film was used to connect the I/O pads of the mesh electronics post-injection to flexible cables that were interfaced to measurement electronics.
  • ACF anisotropic conductive film
  • Fig. 16 shows syringe injectable electronics.
  • Figs. 16A to 16C are schematics of injectable electronics. The lines highlight the overall mesh structure and indicate the regions of supporting and passivating polymer mesh layers and metal interconnects between I/O pads (filled circles) and recording devices (filled circles).
  • Fig. 16D Schematic of the mesh electronics design (upper image), where the horizontal and diagonal lines represent polymer encapsulated metal interconnects and supporting polymer elements, respectively, and W is the total width of the mesh.
  • the dashed black box (lower image) highlights the structure of one unit cell (white dashed lines), where alpha is the angle deviation from rectangular.
  • 3D reconstructed confocal fluorescence image Fig. 16G recorded following injection of ca. 0.5 cm mesh electronics into lx PBS solution.
  • Fig. 16H is an optical image of an injectable mesh electronics structure unfolded on a glass substrate. W is the total width of the mesh electronics.
  • Fig. 161 and 16J show yields and change in properties post-injection for single-terminal electrochemical and two-terminal field-effect transistor (FET) devices.
  • Fig. 161 yield (upper) and impedance change (lower) of the metal electrodes from the mesh electronics injected through 32, 26 and 22 gauge metal needles.
  • Inset bright field image of a representative metal electrode on mesh electronics, where the sensing electrode is highlighted by an arrow.
  • Scale Bar 20 micrometers.
  • Fig. 16J yield (upper) and conductance change (lower) of silicon nanowire FETs following injection through 32, 26, 24, 22 and 20 gauge needles.
  • SEM scanning electron microscopy
  • FIG. 17A-17B This example characterized the structures of different mesh electronics within glass needlelike constrictions to understand design parameters for successful injection.
  • a schematic (Figs. 17A-17B) highlights this approach in which a pulled glass tube with controlled ID central constriction was positioned under a microscope objective for bright-field and confocal fluorescence imaging, and the mesh electronics are injected partially through the constriction.
  • Representative bright field microscopy images of mesh electronics with different structural parameters recorded from the central region of different ID glass channels (Fig. 17C) show some important features.
  • Mesh electronics with alpha 45° and total widths substantially larger than the constriction ID colud be smoothly injected. Relatively straight longitudinal elements are seen in Fig.
  • mesh electronics injection as a function of the fluid flow rate for a constant 400 micrometer I.D. needle were also investigated. It was found that smooth mesh electronics injection for flows from 20 to 150 mL/hr as long as the needle retraction speed matched the speed of the injected fluid. The lower limit for smooth injection, 20 mL/hr, is believed to be restricted by the smallest fluid drag force relative to the friction force between the rolled-up mesh electronics and the inner needle surfaces. The maximum flow, 150 mL/hr, was limited by the needle retraction speed of this set-up.
  • Fig. 17 shows imaging mesh electronics structure in needle constrictions.
  • Fig. 17 A is a schematic illustrating the structure of a pulled glass tube (outer shape) with mesh electronics passing from larger (left) to smallest (center) ID of tube, where the arrow indicates the direction of injection and x-y-z axes indicate coordinates relative to the microscope objective for images in Figs. 17C to Fig. 17E.
  • Fig. 17B is a schematic image of the mesh structure from the region of the constriction indicated by the dashed box in Fig. 17A.
  • Fig. 17C are bright-field microscopy images of different design mesh electronics injected through glass channels.
  • FIG. 17C and 17D indicate several of the longitudinal elements containing metal interconnects in the mesh electronics.
  • Fig. 17E cross- sectional images plotted as half cylinders from positions indicated by the vertical white dashed lines in Fig. 17D.
  • the white dashed curves indicate the approximate IDs of the glass constrictions.
  • This example illustrates injection of electronics into man-made cavities and synthetic materials.
  • This example investigated several model applications of the syringe injectable electronics, including delivery of electronics to internal regions of man-made structures and live animals.
  • syringe injection and unfolding of mesh electronics into poly-dimethylsiloxane (PDMS) cavities was investigated as a technique for electrically- monitoring the internal properties of structures (Fig. 18A).
  • the PDMS cavity was designed with a step-like internal corrugation (4 steps, 0.1 cm drop/step, and projected cavity area of 2 x 4.8 cm ).
  • the mesh electronics which incorporated addressable silicon nanowire piezoresistive strain sensors, was co-injected with diluted PDMS polymer precursors through a small injection site, with the I/O pads ejected or positioned outside the structure.
  • Visual inspection during injection showed that the mesh electronics relaxed to ca. 80% of its 2D structure during injection and was fully-relaxed in ⁇ lh.
  • a micro-computed tomography image and photograph demonstrated the unfolded mesh electronics smoothly followed the step-like internal cavity structure, and moreover, the image showed the continuity of metal interconnects in the longitudinal elements of the mesh.
  • This example also investigated 3D gel structures without cavities as
  • FIG. 18D to 18F Images recorded as a function of time following injection mesh electronics into 75% MatrigelTM, a tissue scaffold typically used in neural tissue engineering (Figs. 18D to 18F) shows that the mesh unfolds ca. 80% in the radial direction over a 3-week period at 37 °C.
  • the degree of unfolding of the mesh electronics within the MatrigelTM depended on the gel concentration for fixed mesh mechanical properties (Fig. 18G); that is, a ca. 90% and 30% mesh unfolding for 25% and 100% MatrigelTM was observed, respectively, over a similar 3-week period at 37 °C.
  • Fig. 18 shows syringe injection of mesh electronics into 3D synthetic structures.
  • Fig. 18A shows a schematic of a mesh electronics injected with uncured PDMS precursor into a PDMS cavity with I/O pads unfolded outside the cavity. The injected PDMS precursors were cured after injection. The lines highlight the overall mesh structure and indicate the regions of supporting and passivating polymers and the lighter lines indicate the metal interconnects between I/O pads (filled circle) and devices (darker filled circle).
  • Fig. 18B is a micro-computed tomography image showing the zoomed-in structure highlighted by the black dashed box in Fig. 18A.
  • Fig. 18C 4 nanowire devices response to pressure applied on the PDMS.
  • Figs. 18D to 18F (upper images) 3D reconstructed micro-computed tomography images of a mesh electronics injected into 75% MatrigelTM after incubating for 0 h (Fig. 18D), 24 h (Fig. 18E), and 3 weeks (Fig. 18F) at 37 °C.
  • the x-y-z axes are shown in Fig. 18D and the same for Fig. 18E and Fig. 18F, where the injection direction is ca. along the z-axis.
  • This example illustrates injection of mesh electronics into brains of live animals.
  • this example investigated the behavior of mesh electronics injected into the brains of live rodents, where the mesh electronics were treated as biochemical reagents delivered to specific brain regions by stereotaxic injection, as shown schematically in Fig. 19A.
  • a 100-200 micrometer ID glass needle loaded with mesh electronics, mounted in the stereotaxic apparatus and connected to a microinjector was positioned to a specific coordinate in the brain of an anesthetized mouse (Fig. 19B), and then the mesh was injected concomitantly with retraction of the needle so that the electronics is extended in the longitudinal (injection) direction.
  • Fig. 19D Bright-field images of coronal tissues slices, prepared 5 weeks post-injection (Fig. 19H) demonstrated that the mesh electronics was fully extended in the longitudinal direction. The mesh only relaxed a small amount with respect to the initial injection diameter (dashed lines in Fig. 19H), given that the force to bend the mesh was comparable to the force to deform the tissue.
  • Fig. 191 an overlay of bright- field and DAPI epifluorescence images (Fig. 191) showed that injection of the mesh electronics did not disrupt substantially the CA1 and dentate gyrus (DG) layers of this region.
  • confocal microscopy images (Fig. 19J) highlight several characteristics.
  • the bending stiffness of injected mesh electronics (0.087 nN-m) is 4-6 orders of magnitude smaller than that of previous implantable electronics such as silicon probe (4.6 x 10 5 nN-m), carbon fibers (3.9 x 10 4 nN-m) or thin-film electronics (0.16-1.3 x 10 4 nN-m).
  • the flexibility of the injected electronics was closer to the flexibility of tissue, which may minimize mechanical trauma caused by motion between the probe and the surrounding tissue.
  • the feature sizes of the injected mesh electronics 5-20 micrometers, are generally the same as single cells.
  • Fig. 19K Representative multichannel recording using mesh electronics with 20 micrometer diameter evaporated Pt- metal electrodes (Fig. 19K) yielded well-defined signals in all 16 channels, which also demonstrated the integrity of electronics after injection into brain tissue.
  • the modulation amplitude, 200-400 microvolts, and dominant modulation frequency, 1-4 Hz, recorded are characteristic of microwave local field potentials (LFPs) in the anesthetized mouse.
  • spatiotemporal mapping of the LFP recordings revealed a characteristic hippocampal field activity for the rodent brain.
  • sharp downward spikes were observed, and standard analysis of this data using a 300- 6000 Hz bandpass filter and spike-sorting algorithm (Fig. 191) demonstrated that these spikes displayed a uniform potential waveform with an average duration of ca.
  • SU- 8 is generally biocompatible and stable long-term, and it has been shown that metal oxide passivated silicon nanowire sensors also exhibit the long-term stability in physiological environment, thus suggesting the excellent potential of this example syringe injectable electronics for chronic implantation and recording. Significantly, it is believed these results together with the 'neurophilic' chronic response demonstrated in histology offer substantial promises for future investigations of long-term brain activity mapping.
  • Fig. 19 shows syringe injectable electronics into in vivo biological system.
  • Fig. 19A is a schematic showing in vivo stereotaxic injection of mesh electronics into a mouse brain.
  • Fig. 19B is an optical image of the stereotaxic injection of mesh electronics into an anesthetized 3 months old mouse brain.
  • Figs. 19C and 19D are schematic showing in vivo stereotaxic injection of mesh electronics into a mouse brain.
  • Fig. 19C and 19D is an optical image of the stereotaxic injection of mesh electronics into an anesthetized 3 months old mouse brain.
  • FIG. 19C Schematics of coronal slices illustrating the two distinct areas of the brain that mesh electronics were injected: Fig. 19C, through the cerebral cortex (CTX) into the lateral ventricle (LV) cavity adjacent to the caudoputamen (CPu) and lateral septal nucleus
  • Fig. 19D through the CTX into the hippocampus (HIP).
  • Lines highlight and indicate the overall structure of mesh and dark filled circles indicate recording devices.
  • the dashed line in Fig. 19C indicates the direction of horizontal slicing for imaging.
  • Fig. 19E Projection of 3D reconstructed confocal image from 100 micrometers thick, 3.17 mm long and 3.17 mm wide volume horizontal slice 5 weeks post-injection at the position indicated by dashed line in Fig. 19C.
  • Dashed line highlights the boundary of mesh inside LV, and the solid circle indicates the size of the needle used for injection.
  • Shading in this correspond to GFAP, NeuN/SU-8 and DAPI, respectively, and are denoted at the top of the image panel in this and subsequent images.
  • Fig. 19F 3D reconstructed confocal image at the interface between mesh electronics and
  • FIG. 19G 3D reconstructed confocal image at the ca. middle (of x-y plane) of the LV in the slice.
  • Fig. 19H bright-field microscopy image of a coronal slice of the HIP region 5 weeks post- injection of the mesh electronics at the position indicated in Fig. 19D. Dashed lines indicate the boundary of the glass needle. The white arrows indicate longitudinal elements that were broken during tissue slicing. Black dashed lines indicate the boundary of each individual image.
  • Fig. 191 overlaid bright field and epi-fluorescence images from the region indicated by white dashed box in Fig. 19H.
  • Shading corresponds to DAPI staining of cell nuclei
  • white arrows indicate CA1 and dentate gyrus (DG) of the HIP.
  • Fig. 19J projection of 3D reconstructed confocal image from 30 micrometer thick, 317 micrometer long and 317 micrometer wide volume from the zoomed-in region highlighted by the black dashed box in i.
  • Fig. 19K Acute in vivo 16-channel recording using mesh electronics injected into a mouse brain.
  • the devices were Pt-metal electrodes (impedance -950 kiloohms at 1 kHz) with their relative positions marked by spots in the schematic (left panel), and the signal was filtered with 60 Hz notch during acquisition.
  • Fig. 19L superimposed single-unit neural recordings from one channel after 300-6000 Hz band-pass filtering. The line represents the mean waveform for the single-unit spikes.
  • these examples show a new strategy for delivery of electronics to the internal regions of 3D man-made and biological structures that involves syringe injection of submicron thickness, large-area macroporous mesh electronics inside.
  • Mesh electronics with 2D widths at least 30-times the needle ID can be injected and a high yield of active electronic devices can be maintained.
  • In- situ imaging and modeling showed that the optimized transverse/longitudinal stiffness enables the mesh to 'roll-up' passing through needle constrictions.
  • this syringe injection approach allows delivery of large (with respect to injection opening) flexible electronics into cavities and existing synthetic materials through a small injection site and a relatively rigid shell. Moreover, with subsequent self -unfolding of the rolled-up structure, injected electronics can fill the internal space of the cavities and materials that exhibit viscoelastic behavior.
  • Fluoview FV1000 and Zeiss LSM 780 confocal microscope were used to image the structure of the mesh electronics in glass channels and immunostained mouse brain slices.
  • ACF (AC-4351Y, Hitachi Chemical Co.) bonding to the mesh electronics I O was carried out using a home-made or commercial bonding system (Fineplacer Lambda Manual Sub-Micron Flip-Chip Bonder, Finetech, Inc.) with a flexible cable (FFC/FPC Jumper Cables PREMO-FLEX, Molex).
  • the strain response of silicon nanowire piezoresistive strain sensors was measured by a multi-channel current/voltage preamplifier (Model 1211, DL Instruments, Brooktondale, NY), filtered with a 3 kHz low pass filter (CyberAmp 380, Molecular Devices), and digitized at a 1 kHz sampling rate (AxonDigil440A, Molecular Devices), with a 100 mV DC source bias voltage.
  • the flexible cable was connected to a 32- channel Intan RHD 2132 amplifier evaluation system (Intan Technologies LLC, Los Angeles, CA) with an Ag/AgCl electrode acting as the reference. A 20 kHz sampling rate and 60 Hz notch were used during acute recording.
  • the overall structure and relevant parameters of the macroporous mesh electronics include the following.
  • W the total mesh width; w 1; width of longitudinal ribbons along injection/long axis of mesh, w 2 , width of transverse ribbons, that cross and connect to the longitudinal ribbons with an angle, alpha, relative to the longitudinal ribbons; L 1; the mesh unit cell length in the longitudinal direction; L 2 , the mesh unit cell length in the transverse direction; and w m , the width of metal lines, which run along the longitudinal ribbons.
  • the longitudinal and transverse ribbon widths ranged from 5-40 micrometers, and alpha was 45° or 0°.
  • the embedded metal (SU- 8/metal/SU-8) interconnects run along longitudinal ribbons; the metal contacts to nanowire transistor and bend-up passive metal sensors also have a metal line component embedded in the transverse ribbons.
  • Thin film electronics Control samples with the same thickness as the mesh electronics but comprising a standard flexible thin-film structure were also designed and fabricated.
  • the metal line patterns, thickness and widths are the same as design the tilted mesh electronics.
  • the overall widths, W, of thin film electronics were 0.1-5 mm.
  • Steps include: (1) 100 nm nickel metal, which serves as a final relief layer, was deposited on the silicon fabrication substrate (600 nm Si0 2 , n-type 0.005 ohm cm, Nova Electronic Materials, Flower Mound, TX) by thermal evaporation; (2) A 300 to 400 nm layer of SU-8 photoresist (2000.5; MicroChem Corp., Newton, MA) was spin-coated on the fabrication substrate, prebaked (65 °C/2 min; 95 °C/2 min), and then (3) patterned by photolithography to define the bottom SU-8 layer of the injectable mesh electronics structure.
  • Nanowire transistor elements were fabricated.
  • a 300 to 400 nm layer of SU-8 photoresist was deposited on the fabrication substrate, prebaked (65 °C/2 min; 95 °C/4 min), and then (5b) silicon nanowires were aligned on the SU-8 layer by contact printing.
  • the new SU-8 pattern was cured at 180 oO C/20 min.
  • Nanowire device element contacts were then fabricated.
  • the substrate was coated with 300 nm LOR 3A and 500 nm SI 805 (MicroChem Corp., Newton, MA) double layer resist and patterned by photolithography. Sequential Cr/Pd/Cr (1.5/50-80/1.5 nm) metal layers were deposited by thermal evaporation followed by metal lift-off in Remover PG (MicroChem Corp., Newton, MA) to define the minimally-stressed nanowire contacts.
  • a 300 to 400 nm layer of SU-8 photoresist was deposited on the fabrication substrate, pre -baked (65 °C/2 min; 95 °C/2 min), and then patterned by photolithography to match the lower SU-8 mesh structure and serve as top encapsulating/passivating layer of the metal contacts/interconnects (except for active device regions). The structure was post-baked, developed, and cured as described above.
  • (9) In the case of nanowire transistor devices, 300 and 500 nm thick layers of LOR 3A and SI 805 photoresist were deposited and defined by photolithography to protect the device region during release of the mesh from the fabrication substrate.
  • DI deionized
  • Glass needles for injection and imaging were prepared by using a commercial pipette puller (Model P-97, Sutter Instrument, CA). To prepare channels for imaging, the pulling was halted and suspended in the middle without breaking the glass tube. The channel sizes were characterized by confocal fluorescence microscopy, where rodamine-6G (Sigma-Aldrich Corp., St. Louis, MO) solution was filled into the channel for imaging. For a channel inner diameter (ID) smaller than 300 micrometers, epoxy glue was used to increase stability during imaging. Clean-cut needles were prepared by scoring (#CTS, Sutter Instrument, CA) and mechanical breakage followed by optical microscopy examination.
  • #CTS Sutter Instrument, CA
  • the tip end of a glass needle was connected to a syringe, and then the large end of the glass needle was used to suck the mesh electronics in towards the sharp needle tip.
  • the correct orientation of the mesh electronics i.e., recording devices at the needle tip
  • the glass needle was removed from the plastic tube/syringe and the large end connected to a conventional micropipette holder (Q series holder, Harvard Apparatus, Holliston, MA).
  • a microinjector was connected to this holder by plastic tubing.
  • the injection process was controlled using a microinjector (NPIPDES, ALA Scientific instruments Inc., Farmingdale, NY); for example, the injection length per microinjector pulse can yield well-defined ejection of the mesh electronics from the needles.
  • the syringe was assembled and the plunger carefully pressed to drive the region containing devices into the needle, and then to inject the mesh into aqueous solutions.
  • I/O Input/output bonding with anisotropic conductive film (ACF).
  • ACF anisotropic conductive film
  • the I/O connection pads at the end of the mesh electronics structure were bonded to a flexible cable post-injection for measurements.
  • the I/O region was allowed to unfold in solution layer outside of the injected materials, and then rinsed with ethanol and dried.
  • a piece of ACF (ACF, CP- 13341- 18AA, Dexerials America Corporation, San Jose, CA), 1.5 mm wide and 15 mm long was over the I/O pads and partially bonded for 10 sec at 75 °C and 1 MPa using a homemade or commercial bonder (Fineplacer Lambda Manual Sub-Micron Flip- Chip Bonder, Finetech, Inc., Manchester, NH).
  • a flexible cable (FFC/FPC Jumper Cables PREMO-FLEX, Molex, Lisle, IL) was placed on the ACF, aligned with I/O pads and bonded for 1-2 min at 165-200 °C and 4 MPa.
  • Steps for the co-injection include the following: (1) mesh electronics were transferred from DI water to ethanol after etching. (2) PDMS pre-polymer components were prepared in a 10: 1 (base:cure agent; Sylgard 184, Dow Corning Corporation, Midland, MI), diluted by hexane 1:3 PDMS:hexane volume ratio, and then (3) the mesh electronics was transferred to the PDMS/hexane solution and the resulting homogeneous suspension loaded into a glass syringe.
  • the device region of mesh was injected through a 16 or 18 gauge metal needle into the cavity, and the I/O region was positioned outside the cavity on a silicon wafer or glass slide.
  • the I/O region was washed with hexane to remove PDMS residue and bonded to a flexible cable interface as described above.
  • the PDMS cavity with the mesh electronics was left at room temperature for 2-4 hours to allow for evaporation of hexane, and then undiluted PDMS precursors were injected into the cavity to fill the entire volume and cured at room temperature for 48 h.
  • Hippocampal Cells, Gelantis, San Diego, CA was spun down at 200 g for 1 min.
  • the shipping medium was exchanged for NeuroPapain Enzyme medium.
  • a tube containing tissue and the digestion medium was kept at 30 °C for 30 min and manually swirled every 2 min, the cells were spun down at 200 g for 1 min, the NeuroPapain medium was removed, and 1 ml of shipping medium was added. After trituration, cells were isolated by centrifugation at 200 g for 1 min, and then resuspended in 5-10 mg/ml MatrigelTM at 4 °C. MatrigelTM with neurons were mixed with electronics at 4 °C and then loaded into syringe with metal gauge needle.
  • the electronics and neurons were co-injected into 30% (v/v) polymerized MatrigelTM in culture plate and then placed in incubator to allow MatrigelTM to gel at 37 °C for 20 min. Then 1.5 ml of NeuroPure plating medium was added. After 1 day, the plating medium was changed to NeurobasalTM medium
  • the mesh is injected concomitantly with retraction of the needle so that the electronics is extended in the longitudinal (injection) direction.
  • the needle was withdrawn from the brain tissue and the I/O region was ejected on the surface of the skull and recording scaffold.
  • mice underwent transcardial perfusion (40 mL lx PBS) and were fixed with 4% formaldehyde (Sigma- Aldrich Corp., St. Louis, MO, 40 mL).
  • mice were decapitated and brains were removed from the skull and set in 4% formaldehyde for 24 hours as post fixation and then lx PBS for 24 hours to remove excess formaldehyde.
  • the mesh electronics remained inside the brain throughout fixing process.
  • GFAP glial fibrillary acidic protein
  • Ultra55/Supra55VP field-emission SEMs was used to characterize the mesh electronics structures. Confocal, bright-field and epi-fluorescence imaging was carried out using an Olympus Fluoview FV1000 confocal laser scanning microscope or Zeiss LSM 780 confocal microscope (Carl Zeiss Microscopy, Thornwood, NY). Confocal images were acquired using 405, 473 and 559 nm wavelength lasers to excite components labeled with Hoechst 33342, Alexa Flour® 488, Alexa Flour® 546, GFP, and Rodamine-6G fluorescent dyes. A 635 nm wavelength laser was used for imaging Alexa Flour® 647, and imaging metal interconnects in reflective mode.
  • Epi-fluorescence images were acquired using a mercury lamp together with standard DAPI (EX:377/50,EM:447/60), GFP (EX:473/31,EM520/35) and TRITC (EX:525/40,EM:585/40) filters.
  • ImageJ ver. 1.45i, Wayne Rasband, National Institutes of Health, USA
  • Micro-computed tomography Structures of injected mesh electronics cured in PDMS and MatrigelTM were imaged using a HMXST Micro-CT X-ray scanning system with a standard horizontal imaging axis cabinet (model: HMXST225, Nikon Metrology, Inc., Brighton, MI). Typical imaging parameters for electronics in PDMS were 75 kV acceleration voltage and 120 microamp electron beam current; for electronics in
  • MatrigelTM 80 kV acceleration voltage and 130 microamp electron beam current were used. In both cases, shading correction and bad pixel correction were applied before scanning to adjust the X-ray detector; no filter was applied.
  • CT Pro (ver. 2.0, Nikon- Metris, UK) was used to calibrate centers of Micro-CT images.
  • VGStudio MAX (ver. 2.0, Volume Graphics GMbh, Germany) was used for 3D reconstruction and analysis of the calibrated Micro-CT images.
  • the yield of working devices after injection was determined by measuring the impedance of passive metal electrodes and conductance of nanowire devices before and after injection as follows: (1) As-made 2D mesh electronics were partially immersed in etchant solution as described above to release only the I/O region of mesh electronics and then mesh electronics was transferred to DI water and then dried in ethanol, while the released I/O region was unfolded on the substrate. (2) Next, the remaining nickel layer was etched and the sample transferred to DI water and dried in ethanol such that the device region was unfolded on the substrate. This two-step etching process allows the mesh electronics to fully unfold on the substrate in a manner that it can be subsequently re-suspended for injection. (3) Mesh electronics were modified by PDL as described above.
  • connection resistance of ACF was measured to investigate the influence of bonding on electrical properties of devices.
  • the conductance of each device (connected metal wires) was measured by probe station as R 0 and Ri before and after ACF bonding, respectively.
  • the connection resistance for each I/O pad (100 micrometer diameter) was calculated as (Rl-Ro)/2.
  • the insulation resistance between I/O pads without circuits was over 10 gigaohm.
  • Piezoresistance measurements The piezoresistance response of strained nanowire devices was measured as conductance change of device subject to the deformation of PDMS structure.
  • the I/O pads were bonded to a flexible cable as described above, and connected to a multi-channel current/voltage preamplifier (Model 1211, DL Instruments, Brooktondale, NY), filtered with a 3 kHz low pass filter
  • SU-8 passivation characterization The effectiveness of SU-8 passivation was characterized following immersion in NeurobasalTM medium at 37 °C for 6 weeks using impedance-frequency (Z-f) measurement.
  • Z-f impedance-frequency
  • a PDMS chamber 2 mm in longitudinal direction and 5 mm in transverse direction was positioned over the interconnect lines (without exposing the sensor electrodes), filled with lx PBS solution, and then Z-f data were recorded using an Agilent B1500A semiconductor device parameter analyzer with B1520A-FG multi-frequency capacitance measurement unit.
  • impedance measurements from 1 to 10 kHz for 16 different SU-8 passivated metal interconnect lines showed average values above 10 gigaohm.
  • the large impedance demonstrates that there is no obvious leakage through the thin SU-8 polymer passivation.
  • the impedance at 1 kHz of the SU-8 passivated region, -30 G gigaohm is 10 4 -10 5 larger than the typical values for the Pt-metal sensors.
  • Nroi Number of rolls of mesh electronics inside glass needles.
  • the mesh electronics rolls up in a scroll-like structure when injected through a glass needle.
  • 17C to 17E were 3.4 +/- 0.2, 6.0 +/- 0.4 and 9.5 +/- 1.0 for (I), (II) and (III), respectively.
  • the uncertainty arises from the identification of longitudinal elements from 8 random cross-sections for each case; small deviations from geometric analysis above may be arise in part from a failure to count some longitudinal elements due to low fluorescence intensity.
  • the effective bending stiffness of the device is defined as the stiffness required of a homogenous beam to achieve the same external work W under the displacement d. Therefore, the effective bending stiffness per width of the device can be estimated as:
  • Effective bending stiffnesses of implantable probes The effective bending stiffness per width of the three-layer longitudinal ribbon, D 1 ; (longitudinal ribbon) in the mesh can be estimated as:
  • E s Young' s modulus of SU-8
  • E m Young's modulus of gold
  • h the total thickness of ribbon
  • h m the thickness of metal
  • w the total width of ribbon
  • w m the width of metal.
  • the effective bending stiffness per width of standard silicon probes, D 2 can be estimated as:
  • E S iii Con is the Young' s modulus of silicon
  • h S iiicon is the thickness of the probe.
  • Egiiicon 165 GPa
  • h si i icon 15 micrometers
  • D 2 4.6 x 10 5 nN m .
  • the effective bending stiffness per width of ultra-small carbon electrodes, D 3 can be estimated as:
  • E carbon is the Young's modulus of carbon fiber
  • d is the diameter of carbon fiber probe.
  • the effective bending stiffness per width of planar shape probe, D 4 can be estimated as:
  • E s is the Young's modulus of polyimide
  • h s is the thickness of probe.
  • E s 2-2.73 GPa
  • h s 10-20 micrometer
  • D 4 0.16-1.3 x 10 4 nN m.
  • FIGs. 16 and 17 show that mesh electronics can be injected in a rolled-up geometry through needles to 95 mm ID without breaking.
  • the importance of the rolled up geometry during injection was quantified by using simulations to estimate the strain distribution versus needle ID the rolled-up geometry.
  • the simulation treats a unit cell of the mesh bent with a radius of curvature, R, where a fixed boundary condition sets the strain of one longitudinal ribbon at zero and the maximal principal strain, epsilon-m, value then occurs at the junction between the transverse and second longitudinal element of the unit cell.
  • This strain value represents an upper limit given that other edge of the unit cell was set to zero for the simulation.
  • the plot of this upper limit strain value versus 1/R shows that strain increases linearly.
  • the stress intensity factor, K for a thin film under pure bending exhibits a square root dependence on thickness, ⁇ l ; where E is the Young's modulus of the material, epsilon is the strain and h is the thickness of ribbon. The epsilon reaches the fracture strain of ribbon, epsilon-c, when K reaches the toughness of the material K c . Since the thickness of SU-8 in the mesh structures is 700 nm (vs.
  • the fracture strain of ribbon can be expected to be larger than 5%. While several embodiments of the present invention have been described and illustrated herein, those of ordinary skill in the art will readily envision a variety of other means and/or structures for performing the functions and/or obtaining the results and/or one or more of the advantages described herein, and each of such variations and/or modifications is deemed to be within the scope of the present invention. More generally, those skilled in the art will readily appreciate that all parameters, dimensions, materials, and configurations described herein are meant to be exemplary and that the actual parameters, dimensions, materials, and/or configurations will depend upon the specific application or applications for which the teachings of the present invention is/are used.
  • the phrase "at least one,” in reference to a list of one or more elements, should be understood to mean at least one element selected from any one or more of the elements in the list of elements, but not necessarily including at least one of each and every element specifically listed within the list of elements and not excluding any combinations of elements in the list of elements.
  • This definition also allows that elements may optionally be present other than the elements specifically identified within the list of elements to which the phrase "at least one" refers, whether related or unrelated to those elements specifically identified.
  • “at least one of A and B" can refer, in one embodiment, to at least one, optionally including more than one, A, with no B present (and optionally including elements other than B); in another embodiment, to at least one, optionally including more than one, B, with no A present (and optionally including elements other than A); in yet another embodiment, to at least one, optionally including more than one, A, and at least one, optionally including more than one, B (and optionally including other elements); etc.
  • the order of the steps or acts of the method is not necessarily limited to the order in which the steps or acts of the method are recited.

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Abstract

La présente invention se rapporte, de façon générale, à des fils nanométriques et/ou à des dispositifs injectables. Selon certains modes de réalisation, la présente invention a pour objet des dispositifs électroniques qui peuvent être injectés ou insérés dans une matière souple, telle qu'un tissu biologique ou des matrices polymères. Par exemple, le dispositif peut être passé à travers une seringue ou une aiguille. Dans certains cas, le dispositif peut comprendre un ou plusieurs fils nanométriques. D'autres composants, tels que des fluides ou des cellules, peuvent également être injectés ou insérés. De plus, dans certains cas, le dispositif, après insertion ou injection, peut être relié à un circuit électrique externe, par exemple à un ordinateur. D'autres modes de réalisation ont, de façon générale, pour objet des systèmes et des procédés de fabrication, d'utilisation ou de promotion de tels dispositifs, de kits impliquant de tels dispositifs, et similaires.
PCT/US2015/024252 2014-04-04 2015-04-03 Systèmes et procédés pour des dispositifs injectables Ceased WO2015199784A2 (fr)

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