WO2015011778A1 - Anti-corrosion coating film structure, metallic member equipped with same, anti-corrosion treatment method, and surface-treating agent - Google Patents
Anti-corrosion coating film structure, metallic member equipped with same, anti-corrosion treatment method, and surface-treating agent Download PDFInfo
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- WO2015011778A1 WO2015011778A1 PCT/JP2013/069875 JP2013069875W WO2015011778A1 WO 2015011778 A1 WO2015011778 A1 WO 2015011778A1 JP 2013069875 W JP2013069875 W JP 2013069875W WO 2015011778 A1 WO2015011778 A1 WO 2015011778A1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/122—Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
Definitions
- the present invention relates to surface treatment that prevents corrosion on the surface of a metal member.
- non-chromium surface treatment there is one using a silane coupling agent.
- Patent Document 1 discloses a silane coupling agent and at least one selected from the group consisting of vanadium, tungsten, cobalt, aluminum, manganese, cerium, niobium, tin, magnesium, yttrium, calcium, zinc, bismuth, nickel, chromium and molybdenum.
- An aqueous surface treatment agent containing a compound containing one element is described.
- the organofunctional silane has a problem that it is easily removed by rinsing or the like because the bond with the metal surface is not sufficient.
- An object of the present invention is to form a coating excellent in heat resistance, solvent resistance and slidability as well as improving corrosion resistance on the surface of a metal.
- the anticorrosive film structure of the present invention has a structure in which an intermediate layer and a silane coupling layer are laminated in this order on the surface of a metal substrate, and the intermediate layer is one type selected from the group consisting of Ce, La and Y. It is characterized in that it is formed of an oxide or hydroxide of any of the above metals.
- the surface of the metal can be made high in corrosion resistance and excellent in heat resistance, solvent resistance and sliding property.
- the present invention relates to a surface treatment method for preventing corrosion of metal surfaces.
- a rare earth oxide or hydroxide represented by cerium is deposited on a metal, and an organic coating layer with a silane coupling agent is further formed on the metal surface.
- the inorganic-organic composite laminated film is formed on the metal surface. This not only improves the corrosion resistance, but also provides a surface excellent in heat resistance, solvent resistance, slidability and smoothness.
- the metal surface targeted in the present invention exhibits very smooth and functional characteristics as represented by the surface of a magnetic disk, and is directed to thin films, but with regard to corrosion protection of a thick bulking agent. Is also valid.
- the present invention is excellent in corrosion resistance, particularly pitting resistance, by forming a rare earth hydroxide or oxide on metal and forming a stable silane coupling layer thereon, and the function of the metal surface is maintained as it is. It relates to realizing providing a surface having.
- the metal anticorrosion method targeted by the present invention is not only to improve the corrosion resistance but also to provide a surface excellent in heat resistance, solvent resistance and slidability, and is further represented by the surface of a magnetic disk. To provide a surface that remains very smooth and functional. Therefore, the properties required as a substance for coating a metal surface are as follows.
- the corrosive environment is basically the air or water system, but there are factors such as acidification or alkalization due to decomposition and dissolution of surrounding materials and air pollutants, and contamination with chloride, etc. And corrosion resistance in salt water environment is required.
- hydroxides of rare earths on metals in order to form a surface excellent not only in corrosion resistance but also in heat resistance, solvent resistance, slidability and smoothness, hydroxides of rare earths on metals or It has been found that this can be achieved by forming an intermediate layer with an oxide and further forming a silane coupling layer thereon.
- the hydroxide or oxide of the rare earth itself has high corrosion resistance, but it is possible to further improve the corrosion resistance by forming a silane coupling layer having high corrosion resistance and high water repellency thereon.
- the silane coupling agent reacts with hydroxyl groups on the surface to form a chemical bond with the surface through dehydration reaction, so the more the hydroxyl groups are on the surface, the more closely they can be arranged. This results in the formation of a film with few defects at the molecular order level.
- bistriethoxysilylpropyl tetrasulfide bistriethoxysilylpropyl tetrasulfide forms a strong coordination bond with aluminum or an aluminum alloy and is thermally treated to share bistriethoxysilylpropyl tetrasulfide molecules.
- bistriethoxysilylpropyl tetrasulfide forms a strong coordination bond with aluminum or an aluminum alloy and is thermally treated to share bistriethoxysilylpropyl tetrasulfide molecules.
- a film which is extremely dense without defects and excellent in adhesion is formed.
- silane coupling agents such as bistriethoxysilylpropyl tetrasulfide are arranged in molecular order, they form thin oxides or hydroxides of rare earths and form such a silane cup
- the ring agent By using the ring agent, it is possible to highly suppress corrosion on the surface which maintains the very smooth and high functional properties.
- the present invention is characterized in that an intermediate layer formed of a rare earth (rare earth element) oxide or hydroxide is disposed between the surface of the metal substrate and the silane coupling layer.
- the rare earth elements mean lanthanoids of Sc and Y and La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu (total 17 types) .
- FIG. 1 schematically shows a typical anticorrosive film structure of the present invention.
- an intermediate layer 2 and a silane coupling layer 3 are laminated in this order.
- the intermediate layer 2 is formed of an oxide or hydroxide of one or more metals selected from the group consisting of Ce, La and Y.
- the intermediate layer 2 preferably contains one or more elements selected from the group consisting of Mo, W and V. Further, since the intermediate layer 2 and the silane coupling layer 3 are very thin films, the gloss of the metal substrate 1 is visually observed as it is on the surface.
- the metal member having the anticorrosion coating structure shown in this figure has high corrosion resistance and is excellent in heat resistance, solvent resistance and sliding property.
- the metal substrate is preferably formed of a transition metal or a plated steel of cobalt or zinc.
- the transition metal means an element from Group 3 to Group 11 in the periodic table.
- the metal substrate may be formed of aluminum, cobalt, nickel or iron or an alloy thereof.
- a one-step treatment method (forming a rare earth layer and a silane coupling layer simultaneously; hereinafter, also referred to as a "one-step method") and a two-step treatment method (forming a rare earth layer) followed by forming a silane coupling layer
- a two-step treatment method (forming a rare earth layer) followed by forming a silane coupling layer
- a compound containing rare earth, a silane coupling agent, a hydrolyzing agent, a reaction accelerator, and a pH adjuster are added to the solvent 1 to prepare a treatment liquid.
- the metal substrate is immersed in this treatment liquid for a fixed time. This forms a rare earth oxide or hydroxide on the metal surface and simultaneously forms a silane coupling layer thereon.
- a silane coupling agent is easy to react with water and to polymerize, when storing, it is desirable to be in a state of being dissolved in an organic solvent. In addition, storage is desirable in a place with low humidity. From such a point, it is desirable to store the compound containing the rare earth in the state of an aqueous solution and store separately from the silane coupling agent.
- the aqueous solution may be mixed with hydrogen peroxide and molybdate, tungstate or vanadate.
- solvent 1 Basically, in order to improve the solubility of the silane coupling agent, a solvent such as one or more alcohols is used as a solvent.
- the alcohol further improves the stability of the treatment solution as well as the wettability of the metal substrate.
- a solvent having a high affinity to water is preferable.
- methanol, ethanol, propanol, butanol and their isomers, ketones such as acetone, methyl ethyl ketone and diethyl ketone, ethers such as dimethyl ether, ethyl methyl ether, diethyl ether and tetrahydrofuran, ethylene glycol and propylene glycol And glycols such as diethylene glycol are used.
- an organic solvent such as hexane, tetrahydrofuran or xylene may be used.
- the rare earths used to form the oxide or hydroxide as an intermediate layer include cerium, lanthanum and yttrium. They can be used in the form of nitrates, sulfates, chlorides, oxalates, acetates or phosphates. In particular, nitrate is desirable among them.
- the concentration is preferably 1 ⁇ 10 ⁇ 4 to 1 ⁇ 10 ⁇ 1 M, and more preferably 1 ⁇ 10 ⁇ 3 to 1 ⁇ 10 ⁇ 2 M.
- silane coupling agent Those used as silane coupling agents are roughly classified into the following two types.
- X 3 -n SiR'SiX 3-n One is represented by the chemical formula X 3 -n SiR'SiX 3-n .
- n is 0 or 1
- X is from a hydrolyzable group (methoxy group, ethoxy group, methoxyethoxy group, propyl group, butyl group, isobutyl group, s-butyl group, t-butyl group and acetyl group)
- R ' is also selected from the group consisting of an alkyl group, an alkenyl group, and an alkenyl group substituted with at least one amino group or an S group.
- BTSE bis triethoxysilyl ethane
- BTSPA bis-triethoxysilylpropyl amine
- BTSPS bistriethoxysilylpropyl tetrasulfide
- X 3-n R n Si-Y Another type is an organofunctional silane represented by the formula X 3-n R n Si-Y.
- n is 0 or 1
- X is a hydrolyzable group such as methoxy, ethoxy, methoxyethoxy, propyl, butyl, isobutyl, s-butyl, t-butyl and acetyl.
- X may be the same or different
- Y is represented by amino group, mercapto group, phenyl group, vinyl group, epoxy group, methacryl group, isocyanate group, ureido group, mercapto group Are selected from the group consisting of organic functional groups and aryl groups.
- silane coupling agents are at least partially, preferably completely hydrolyzed.
- concentration of these silane coupling agents is about 0.05 to 10% by weight, more preferably 0.2 to 2% by weight.
- Water needs to be added in order to hydrolyze the silane coupling agent.
- the amount of water used is suitably in the range of about 2% to 20% with respect to the entire treatment solution.
- 0.2 to 1.0% of acetic acid may be added as appropriate.
- the optimum value of the addition amount of acetic acid is 0.5%.
- reaction accelerator A reaction promoter such as hydrogen peroxide may be added to promote the formation reaction of the rare earth oxide or hydroxide as well as the silane coupling layer formation reaction. When hydrogen peroxide is used, several percent is suitable.
- PH adjuster In order to promote the hydrolysis reaction of the silane coupling agent and the formation reaction of the oxide or hydroxide, it is preferable to maintain the pH at 7 or less, preferably to 2 to 6 if possible.
- the pH adjuster hydroxides such as potassium hydroxide, ammonia, acetic acid, formic acid, sulfuric acid, hydrochloric acid, nitric acid and the like are suitable.
- the corrosion resistance can be further improved by including an element having a plurality of valences in the rare earth oxide layer or hydroxide layer.
- an element having a plurality of valences in the rare earth oxide layer or hydroxide layer In order for this multivalent number of anions to have this effect, it is effective to add the corresponding oxo acid as an additive in the form of a salt.
- the oxo acid salts include molybdate, tungstate and vanadate. Besides these, salts containing phosphate and zirconium are also effective as additives.
- the concentration of the additive is suitably about 0.2 to 1.0%.
- a heat treatment may be performed for the purpose of performing a crosslinking reaction of the silane coupling layer. This can improve the corrosion resistance.
- the heat treatment is preferably performed at a temperature of 100 to 200 ° C. for 30 minutes to 2 hours in the air, and more preferably at a temperature of 100 to 150 ° C. for 30 minutes to 1 hour.
- the silane coupling agent is added to the solvent 1 and acetic acid is further added to adjust to a predetermined pH. Furthermore, water for hydrolysis is added and stirred vigorously for several hours in that state. Thereafter, the compound of the rare earth, the reaction accelerator and the additive are dissolved to a predetermined concentration after standing for one day.
- the processing time is suitably from several tens minutes to several hours.
- the following examples and comparative examples all show the case of immersion for 2 hours (however, only comparative example 8 is the case of immersion for 100 h).
- the metal base is immersed in a solution (aqueous solution) in which the compound containing the rare earth in the solvent 2 and the reaction accelerator are added to form an oxide or hydroxide of the rare earth on the metal base.
- a solution aqueous solution
- the metal base on which the oxide or hydroxide film of rare earth is formed is dipped in a solution in which a silane coupling agent, a hydrolyzing agent, a reaction accelerator and a pH adjuster are added to solvent 3 (organic solvent).
- solvent 3 organic solvent
- the solution containing the solvent 2 (aqueous solution) and the solution containing the solvent 3 (organic solvent) be separately stored.
- the aqueous solution may be mixed with hydrogen peroxide and molybdate, tungstate or vanadate.
- (first stage) Form oxides or hydroxides of the rare earths.
- ⁇ rare earth ⁇ Rare earths used for oxide or hydroxide formation include cerium, lanthanum and yttrium. They can be used in the form of nitrates, sulfates, chlorides, oxalates, acetates or phosphates. In particular, nitrate is desirable among them.
- reaction accelerator A reaction promoter such as hydrogen peroxide may be added to promote the formation reaction of rare earth oxides or hydroxides.
- the corrosion resistance can be further improved by including an element having a plurality of valences in the rare earth oxide layer or hydroxide layer.
- an element having a plurality of valences in the rare earth oxide layer or hydroxide layer In order for this multivalent number of anions to have this effect, it is effective to add the corresponding oxo acid as an additive in the form of a salt.
- the oxo acid salts include molybdate, tungstate and vanadate. Besides them, salts containing phosphate or zirconium as an additive are also effective.
- solvent 3 Since the solubility of some silane coupling agents in water is limited, basically, in order to improve the solubility of the silane coupling agent, one or more alcohols, etc. (organic ) Is used. The alcohol further improves the stability of the treatment solution as well as the wettability of the metal substrate.
- the silane coupling agent is preferably a solvent having a high affinity for water since it basically needs to be hydrolyzed.
- methanol, ethanol, propanol, butanol and their isomers ketones such as acetone, methyl ethyl ketone and diethyl ketone, ethers such as dimethyl ether, ethyl methyl ether, diethyl ether and tetrahydrofuran, ethylene glycol and propylene glycol And glycols such as diethylene glycol are used.
- the organic solvent other than alcohol may be, for example, hexane, tetrahydrofuran, xylene or the like.
- silane coupling agent Those used as silane coupling agents are roughly classified into the following two types. One of them is represented by the structure of X 3-n SiR'SiX 3-n , n is 0 or 1, and X is a hydrolyzable group such as methoxy, ethoxy, methoxyethoxy, propyl, butyl It is selected from the group consisting of a group, isobutyl group, s-butyl group, t-butyl group and acetyl group, and X's may be the same or different. R 'is also selected from the group consisting of an alkyl group, an alkenyl group, an alkenyl group substituted with at least one amino group or an S group.
- BTSE bis triethoxysilyl ethane
- BTSPA bis-triethoxysilylpropyl amine
- BTSPS bistriethoxysilylpropyl tetrasulfide
- organofunctional silane represented by the structure X 3 -n R n Si-Y, n is 0 or 1
- X is a hydrolyzable methoxy group, ethoxy group, methoxyethoxy Group selected from the group consisting of a propyl group, a butyl group, an isobutyl group, an s-butyl group, a t-butyl group and an acetyl group, and X may be the same or different
- Y is an amino group, a mercapto group It is selected from the group consisting of an organic functional group represented by a group, a vinyl group, an epoxy group, a methacryl group, an isocyanate group, a ureido group, a mercapto group and an alkyl group.
- silane coupling agents are at least partially, preferably completely hydrolyzed.
- concentration of these silane coupling agents is about 0.05 to 10% by weight, more preferably 0.2 to 1% by weight.
- Water needs to be added because it is necessary to hydrolyze the silane coupling agent.
- the amount of water to be used is suitably in the range of about 2 to 20% with respect to the entire treatment solution.
- 0.2 to 1.0% of acetic acid may be added as appropriate.
- the addition amount of acetic acid is optimally 0.5%.
- the pH is preferably maintained at 7 or less, and more preferably 2 to 6 .
- the pH adjuster hydroxides such as potassium hydroxide, ammonia, acetic acid, formic acid, sulfuric acid, hydrochloric acid, nitric acid and the like are suitable.
- After the immersion treatment it is dried by blowing air or spin-out with a spinner. It may be dried by maintaining the temperature range from room temperature to 50 ° C.
- corrosion resistance can be improved by heat-processing for the purpose of performing the crosslinking reaction of a silane coupling layer after a process.
- the temperature is preferably 100 to 200 ° C.
- the time is preferably 30 minutes to 2 hours, and more preferably 100 to 150 ° C. for 30 minutes to 1 hour.
- the immersion treatment After the immersion treatment, it is dried by blowing air or spin-out with a spinner. It may be dried by maintaining the temperature range from room temperature to 50 ° C. Furthermore, corrosion resistance can be improved by heat-processing for the purpose of performing the crosslinking reaction of a silane coupling layer after a process.
- the heat treatment it is preferable to set the temperature to 100 to 200 ° C. and the time to 30 minutes to 2 hours in an air atmosphere, and more preferably 100 to 150 ° C. for 30 minutes to 1 hour.
- the solution can be prepared, for example, by the following method.
- the rare earth compound, the reaction accelerator and the additive are dissolved in the solvent 2.
- the processing time of the first stage is suitably from several tens minutes to several hours. The following examples all show the case of immersion for 2 hours.
- a silane coupling agent, a hydrolyzing agent, and a pH adjuster are added to the solvent 3, and the solution is vigorously stirred for 1 hour.
- the processing time for the second stage is suitably several minutes to several hours. The following examples all show the case where each treatment was immersed for 30 minutes.
- Samples of cobalt and aluminum and alloys thereof were prepared by sputtering titanium oxide as an adhesion layer on a silicon wafer, and then sputtering and depositing the target aluminum or aluminum alloy thereon.
- a bulking agent galvanized steel sheet, carbon steel, and nickel were also used.
- Various materials were heat-treated, that is, heat-treated at 100 ° C. in air for 1 h in air after forming a film by the above-described one-step method or two-step method.
- Electrochemical test 1 cm 2 of the sample subjected to rare earth-silane coupling treatment and heat treatment was left, and the other part was sealed. It was immersed in a 3.5 wt% NaCl aqueous solution. After immersion for 10 minutes, when the potential was stabilized, the potential was scanned at a scanning speed of 30 mV / min in the anode direction based on a potential as low as ⁇ 100 mV from the immersion potential, and the current was measured. After measurement, the corrosion current density was determined using the Tafel equation. Further, the potential at which the current rises sharply was taken as a pitting potential, and when the potential was 500 mV or more, the pitting resistance was considered to be good. The more noble this potential, the better the pitting resistance.
- Table 1 shows an example and a comparative example (electrochemical evaluation) in the case of one-step treatment.
- the comparative example 1 is a numerical value which becomes a standard in considering improvement of the corrosion resistance of Al. Compared to this, the lower the corrosion current density, the better the shift of the pitting potential to the noble side (the larger the value to +), the better the corrosion resistance.
- the Al was treated with an aqueous ethanol solution containing 0.02 M cerium nitrate, 1 wt% BTSE and 10% H 2 O.
- the corrosion current density of the treated material in a 3.5 wt% NaCl solution is less than 0.001 ⁇ A / cm 2 (below the detection limit), and the pitting potential is -180 mV.
- the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
- the sample is heat-treated at 100 ° C. for 1 h.
- cerium hydroxide and oxide are formed on Al, and a BTSE layer is formed thereon. (The structure is as shown in FIG. 1).
- Comparative Example 5 is a case where only cerium nitrate is treated, but although the corrosion current density is slightly lower than Comparative Example 1 and the pitting potential is also slightly shifted to the noble side, the extent thereof is small, this example There is no significant improvement in corrosion resistance. In this case, it was confirmed that cerium hydroxide and oxide were formed on Al.
- Comparative Example 7 is the case of treatment with BTSE, but although the corrosion current density is slightly lower than Comparative Example 1, the pitting potential is hardly changed, and the corrosion resistance improvement as in this Example is not seen. In this case, it was confirmed that a BTSE layer was formed on Al.
- Comparative Example 6 is the case of treatment with BTSE, but although the corrosion current density is slightly lower than Comparative Example 1, the pitting potential hardly changes, and the corrosion resistance improvement as seen in this example is not seen. In this case, it was confirmed that the BTSE layer was formed on the aluminum oxide layer thicker than the natural oxide film on Al.
- Comparative Example 8 has the same composition as Comparative Example 7, but the immersion time is as long as 100 h (the immersion time is not written in Table 1. In other cases, the immersion time is 2.0 h as described above) Is).
- the configuration of the cerium oxide layer or the cerium hydroxide layer + the BTSE layer is essential.
- the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
- the pitting potential is shifted to the noble side by 700 mV or more, and it can be seen that the pitting resistance is significantly improved.
- Film analysis confirmed that Mo was incorporated in the cerium oxide (or hydroxide). It can be estimated that the presence of Mo causes the pitting potential to be significantly shifted to the noble side.
- the Al was treated with an aqueous ethanol solution containing 0.1 M cerium nitrate, 1 wt% BTSE and 10% H 2 O.
- the sample is heat-treated at 100 ° C. for 1 h.
- the corrosion current density of the treated material in a 3.5 wt% NaCl solution is less than 0.001 ⁇ A / cm 2 (below the detection limit), and the pitting potential is ⁇ 26 mV.
- the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
- the pitting potential is further shifted to the noble side as compared with Example 1 in which the concentration is low.
- lanthanum nitrate was used in place of cerium nitrate used in Example 1.
- the sample is heat-treated at 100 ° C. for 1 h.
- the corrosion current density in the 3.5 wt% NaCl solution of the treated material is less than 0.001 ⁇ A / cm 2 (below the detection limit), and the pitting potential is ⁇ 250 mV.
- the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
- This example is the case where yttrium nitrate is used instead of the cerium nitrate used in Example 1.
- the sample is heat-treated at 100 ° C. for 1 h.
- the corrosion current density in the 3.5 wt% NaCl solution of the treated material is less than 0.001 ⁇ A / cm 2 (below the detection limit), and the pitting potential is ⁇ 220 mV.
- the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
- the corrosion resistance is improved by using a rare earth.
- This example is the case where BTESPT was used instead of BTSE which is a coupling agent used in Example 1.
- the sample is heat-treated at 100 ° C. for 1 h.
- the corrosion current density of the treated material in a 3.5 wt% NaCl solution is less than 0.001 ⁇ A / cm 2 (below the detection limit), and the pitting potential is ⁇ 26 mV.
- the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
- ⁇ -APS was used instead of BTSE which is a coupling agent used in Example 1.
- the sample is heat-treated at 100 ° C. for 1 h.
- the corrosion current density of the treated material in a 3.5 wt% NaCl solution is less than 0.001 ⁇ A / cm 2 (below the detection limit), and the pitting potential is ⁇ 420 mV.
- the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
- acetic acid was used in place of H 2 O which is a hydrolyzing agent used in Example 6.
- the sample is heat-treated at 100 ° C. for 1 h.
- the corrosion current density of the treated material in a 3.5 wt% NaCl solution is less than 0.001 ⁇ A / cm 2 (below the detection limit), and the pitting potential is -155 mV.
- the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
- hydrogen peroxide is added as a reaction promoter in place of sodium molybdate, which is an additive used in Example 2.
- the sample is heat-treated at 100 ° C. for 1 h.
- the corrosion current density in the 3.5 wt% NaCl solution of the treated material is less than 0.001 ⁇ A / cm 2 (below the detection limit), and the pitting potential is ⁇ 15 mV.
- the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
- 0.02M cerium nitrate were treated galvanized steel sheet in an aqueous ethanol solution containing 1wt% BTESPT and 10% H 2 O.
- the sample is heat-treated at 100 ° C. for 1 h.
- the corrosion current density in the 3.5 wt% NaCl solution of the treated material is 0.35 ⁇ A / cm 2 . No pitting potential is detected. Since the corrosion current density is lower than that of Comparative Example 2, it can be said that the corrosion resistance is remarkably improved by this treatment.
- 0.02M cerium nitrate were treated Co ethanol aqueous solution containing 1wt% BTESPT and 10% H 2 O.
- the sample is heat-treated at 100 ° C. for 1 h.
- the corrosion current density in the 3.5 wt% NaCl solution of the treated material is 0.18 ⁇ A / cm 2 . No pitting potential is detected.
- the corrosion current density is lowered, so it can be said that the corrosion resistance is remarkably improved by this treatment.
- 0.02M cerium nitrate were treated Ni ethanol aqueous solution containing 1wt% BTESPT and 10% H 2 O.
- the sample is heat-treated at 100 ° C. for 1 h.
- the corrosion current density in the 3.5 wt% NaCl solution of the treated material is 0.21 ⁇ A / cm 2 . No pitting potential is detected.
- Comparative Example 4 since the corrosion current density is reduced, it can be said that the corrosion resistance is remarkably improved by this treatment.
- Table 2 shows an example and a comparative example (electrochemical evaluation) in the case of the two-stage treatment.
- This example is the case where cerium chloride is used instead of the cerium nitrate used in Example 14.
- the sample is subjected to heat treatment at 100 ° C. for 1 h.
- the corrosion current density in a 3.5 wt% NaCl solution is less than 0.001 ⁇ A / cm 2 (below the detection limit), and the pitting potential is ⁇ 22 mV.
- the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
- chloride the same corrosion control effect as in the case of nitrate is obtained.
- Comparative example 9 This comparative example is a case where it was changed to hydrogen peroxide solution immersion instead of the cerium nitrate immersion of the one-step process of Example 13. This is because hydrogen peroxide forms an oxide having a thickness greater than that of the natural oxide film on the Al surface.
- the sample is subjected to heat treatment at 100 ° C. for 1 h.
- the corrosion current density is slightly lower than Comparative Example 1, the pitting potential is hardly changed, and the corrosion resistance improvement as in this Example is not observed. This indicates that the formation of the rare earth oxide has higher corrosion resistance than the formation of the Al oxide.
- Comparative example 10 This comparative example is a case where Al is held at a constant temperature and humidity and an oxide and a hydroxide are formed on the surface in the one-step process as in Comparative Example 9. After the second stage treatment, the sample is subjected to heat treatment at 100 ° C. for 1 h. Although the corrosion current density is slightly lower than Comparative Example 1, the pitting potential is hardly changed, and the corrosion resistance improvement as in this Example is not observed. This indicates that the formation of the rare earth oxide has higher corrosion resistance than the formation of the Al oxide.
- Table 3 shows the immersion test results when each treatment was applied.
- the comparative examples 11 to 14 are respectively No.
- the immersion test result of the sample which performed the process of 1, 5, 6 and 7 (No. of Table 1) is shown. In any case, pitting occurs after 7 days.
- rare earth compound and one silane coupling agent are used, but similar results can be obtained by mixing a plurality of compounds.
- cerium nitrate but also a mixture of cerium nitrate and yttrium nitrate, a mixture of cerium nitrate and cerium chloride.
- BTSE a mixture of BTSE and BTESPT is also effective.
- corrosion resistance in particular, the resistance to holes
- an intermediate layer of an oxide or hydroxide composed of a rare earth element between a metal and a silane coupling layer, with respect to the metal is provided. It can be realized to provide a surface that is excellent in corrosion resistance and still has the function of the metal surface.
- an inorganic-organic organic compound is formed by forming an oxide or hydroxide of a rare earth on the metal surface of the transition metal and their alloys and further treating the upper layer with a silane coupling agent.
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Abstract
Description
本発明は、金属部材の表面における腐食を防止する表面処理に関する。 The present invention relates to surface treatment that prevents corrosion on the surface of a metal member.
従来実施されている耐腐食性の表面処理としては、クロム酸や重クロム酸などの6価のクロムを使用したクロメート処理がある。しかしながら、近年の環境問題の観点から、6価のクロムを含む表面処理は規制されており、ノンクロムの表面処理の開発が精力的に進められている。 As a surface treatment of corrosion resistance which has been conventionally carried out, there is a chromate treatment using hexavalent chromium such as chromic acid and dichromic acid. However, from the viewpoint of environmental problems in recent years, surface treatment containing hexavalent chromium is regulated, and development of non-chromium surface treatment is vigorously promoted.
ノンクロムの表面処理の例としては、シランカップリング剤を用いるものがある。 As an example of the non-chromium surface treatment, there is one using a silane coupling agent.
特許文献1には、シランカップリング剤と、バナジウム、タングステン、コバルト、アルミニウム、マンガン、セリウム、ニオブ、スズ、マグネシウム、イットリウム、カルシウム、亜鉛、ビスマス、ニッケル、クロムおよびモリブデンからなる群から選ばれる少なくとも1種の元素を含む化合物とを含有する水系表面処理剤が記載されている。 Patent Document 1 discloses a silane coupling agent and at least one selected from the group consisting of vanadium, tungsten, cobalt, aluminum, manganese, cerium, niobium, tin, magnesium, yttrium, calcium, zinc, bismuth, nickel, chromium and molybdenum. An aqueous surface treatment agent containing a compound containing one element is described.
三価クロムキレート錯体やバナジウム化合物等を使用する場合、数マイクロメートル程度の厚い皮膜が生成する等の問題がある。 In the case of using a trivalent chromium chelate complex, a vanadium compound or the like, there is a problem that a thick film of about several micrometers is formed.
また、シランカップリング剤を使用した防食法においては、十分な耐食性を満足するものが得られていない。また、有機官能性シランは、金属表面との結合が十分でないため、すすぎ等により容易に除去されるという問題がある。 Moreover, in the anticorrosion method using a silane coupling agent, the thing which satisfies sufficient corrosion resistance is not obtained. In addition, the organofunctional silane has a problem that it is easily removed by rinsing or the like because the bond with the metal surface is not sufficient.
さらに、シランカップリング剤を使用して防食性能を高めるためには、複数のシランカップリング剤を用いて段階的に処理することが多く、より多くの工程を経ることが多い。このため、エネルギー的に非効率であり、時間を有する。したがって、実用化に関しては多くの問題点を有している。 Furthermore, in order to use a silane coupling agent to enhance anticorrosion performance, treatment is often performed stepwise with a plurality of silane coupling agents, and more steps are required. Because of this, it is energy inefficient and has time. Therefore, there are many problems in practical use.
本発明の目的は、金属の表面に、耐食性を向上させるのみならず、耐熱性、耐溶剤性及び摺動性に優れた皮膜を形成することにある。 An object of the present invention is to form a coating excellent in heat resistance, solvent resistance and slidability as well as improving corrosion resistance on the surface of a metal.
本発明の防食皮膜構造は、金属基材の表面に中間層及びシランカップリング層がこの順に積層された構造を有し、中間層は、Ce、La及びYからなる群から選択された一種類以上の金属の酸化物又は水酸化物で形成されていることを特徴とする。 The anticorrosive film structure of the present invention has a structure in which an intermediate layer and a silane coupling layer are laminated in this order on the surface of a metal substrate, and the intermediate layer is one type selected from the group consisting of Ce, La and Y. It is characterized in that it is formed of an oxide or hydroxide of any of the above metals.
本発明によれば、金属の表面を耐食性が高く、かつ、耐熱性、耐溶剤性及び摺動性に優れたものとすることができる。 According to the present invention, the surface of the metal can be made high in corrosion resistance and excellent in heat resistance, solvent resistance and sliding property.
本発明は、金属表面の腐食を防止する表面処理方法に関する。この方法は、セリウムに代表される希土類の酸化物または水酸化物を金属上に析出させ、さらにその上にシランカップリング剤による有機コーティング層を金属表面に形成するものである。言い換えると、金属表面に無機-有機複合積層膜を形成するものである。これにより、耐食性を向上させるのみならず、耐熱性、耐溶剤性、摺動性及び平滑性に優れた表面を提供する。 The present invention relates to a surface treatment method for preventing corrosion of metal surfaces. In this method, a rare earth oxide or hydroxide represented by cerium is deposited on a metal, and an organic coating layer with a silane coupling agent is further formed on the metal surface. In other words, the inorganic-organic composite laminated film is formed on the metal surface. This not only improves the corrosion resistance, but also provides a surface excellent in heat resistance, solvent resistance, slidability and smoothness.
本発明で対象とする金属表面は、磁気ディスク表面で代表されるように非常に平滑でかつ機能性を有する特性を示すものであり、また、薄膜を対象としているが、厚いバルク剤の防食に関しても有効である。 The metal surface targeted in the present invention exhibits very smooth and functional characteristics as represented by the surface of a magnetic disk, and is directed to thin films, but with regard to corrosion protection of a thick bulking agent. Is also valid.
本発明は、金属上に希土類の水酸化物または酸化物を形成し、その上に安定なシランカップリング層を形成させることにより耐食性、特に耐孔食性に優れた、しかも金属表面の機能をそのまま有する表面を与えることを実現することに関する。 The present invention is excellent in corrosion resistance, particularly pitting resistance, by forming a rare earth hydroxide or oxide on metal and forming a stable silane coupling layer thereon, and the function of the metal surface is maintained as it is. It relates to realizing providing a surface having.
本発明で対象とする金属防食法は、耐食性を向上させるのみならず、耐熱性、耐溶剤性及び摺動性に優れた表面を提供することであり、さらに、磁気ディスク表面で代表されるように非常に平滑でかつ機能性を有する特性をそのまま維持する表面を与えるものである。したがって、金属表面をコーティングする物質として必要な特性は、次のようなものである。 The metal anticorrosion method targeted by the present invention is not only to improve the corrosion resistance but also to provide a surface excellent in heat resistance, solvent resistance and slidability, and is further represented by the surface of a magnetic disk. To provide a surface that remains very smooth and functional. Therefore, the properties required as a substance for coating a metal surface are as follows.
(1)対象とする金属またはそれら合金の腐食抑制作用(全面腐食の抑制)を示すこと。また、全面腐食だけでなく塩化物環境中における耐孔食性が高いことも信頼性確保のためには要求される。 (1) To show the corrosion inhibiting action (inhibition of general corrosion) of the target metal or their alloys. Not only overall corrosion but also high pitting resistance in a chloride environment is also required to ensure reliability.
(2)欠陥ができるだけ少なく、平滑で緻密な膜が構成されること。 (2) To form a smooth and dense film with as few defects as possible.
(3)金属表面の機能をそのまま有すること。例えば、ハードディスクの場合、磁気ヘッドと磁気記録媒体との磁気的距離の増加による磁気記録特性の劣化を引き起こさない構造を有すること。センサーの場合、センシング機能をそのまま有することが挙げられる。 (3) Having the function of the metal surface as it is. For example, in the case of a hard disk, it should have a structure that does not cause deterioration of the magnetic recording characteristics due to the increase of the magnetic distance between the magnetic head and the magnetic recording medium. In the case of a sensor, it may be mentioned that it has a sensing function as it is.
腐食環境としては、基本的には大気系または水系であるが、周辺物質や大気汚染物質等の分解・溶解による酸性化またはアルカリ化、塩化物の混入等の要素があることから、幅広いpH環境や塩水環境での耐食性が要求される。 The corrosive environment is basically the air or water system, but there are factors such as acidification or alkalization due to decomposition and dissolution of surrounding materials and air pollutants, and contamination with chloride, etc. And corrosion resistance in salt water environment is required.
上記(1)に関しては、種々検討した結果、耐食性のみならず、耐熱性、耐溶剤性、摺動性及び平滑性に優れた表面を形成するためには、金属上に希土類の水酸化物または酸化物で中間層を形成し、その上に、更にシランカップリング層を形成することにより達成できることを見出した。希土類の水酸化物または酸化物自体も耐食性が高いが、さらに、その上に耐食性および撥水性の高いシランカップリング層を形成することにより、更に耐食性を向上することが可能となる。 With regard to the above (1), as a result of various investigations, in order to form a surface excellent not only in corrosion resistance but also in heat resistance, solvent resistance, slidability and smoothness, hydroxides of rare earths on metals or It has been found that this can be achieved by forming an intermediate layer with an oxide and further forming a silane coupling layer thereon. The hydroxide or oxide of the rare earth itself has high corrosion resistance, but it is possible to further improve the corrosion resistance by forming a silane coupling layer having high corrosion resistance and high water repellency thereon.
上記(2)に関しては、シランカップリング層を並列にかつ強固に形成することが重要である。シランカップリング剤は、表面の水酸基と反応して脱水反応により表面と化学結合するために、表面に水酸基が多いほど緻密に配列することができる。これにより分子オーダのレベルでの欠陥が少ない膜が形成される。例えば、ビストリエトキシシリルプロピルテトラスルフィドを使用した場合、ビストリエトキシシリルプロピルテトラスルフィドは、アルミニウムまたはアルミニウム合金と強い配位結合を形成すると共に、熱処理を施すことによりビストリエトキシシリルプロピルテトラスルフィド分子同士も共有結合を形成して、金属表面に強固なビストリエトキシシリルプロピルテトラスルフィド分子膜を形成するために、極めて緻密な欠陥のなく、かつ、密着性に優れた皮膜が形成される。 With regard to the above (2), it is important to form the silane coupling layers in parallel and firmly. The silane coupling agent reacts with hydroxyl groups on the surface to form a chemical bond with the surface through dehydration reaction, so the more the hydroxyl groups are on the surface, the more closely they can be arranged. This results in the formation of a film with few defects at the molecular order level. For example, when bistriethoxysilylpropyl tetrasulfide is used, bistriethoxysilylpropyl tetrasulfide forms a strong coordination bond with aluminum or an aluminum alloy and is thermally treated to share bistriethoxysilylpropyl tetrasulfide molecules. In order to form a bond and form a strong bistriethoxysilylpropyl tetrasulfide molecular film on the metal surface, a film which is extremely dense without defects and excellent in adhesion is formed.
上記(3)に関しては、例えば、ビストリエトキシシリルプロピルテトラスルフィドなどのシランカップリング剤は、分子オーダで配列することから、希土類の酸化物または水酸化物を薄く形成するとともに、このようなシランカップリング剤を用いることにより、非常に平滑でかつ機能性が高いという特性をそのまま維持する表面において腐食を高度に抑制することが可能となる。 With regard to the above (3), for example, since silane coupling agents such as bistriethoxysilylpropyl tetrasulfide are arranged in molecular order, they form thin oxides or hydroxides of rare earths and form such a silane cup By using the ring agent, it is possible to highly suppress corrosion on the surface which maintains the very smooth and high functional properties.
本発明は、金属基材の表面とシランカップリング層との間に、希土類(希土類元素)の酸化物又は水酸化物で形成された中間層を配置したことを特徴とする。ここで、希土類元素とは、Sc及びY並びにLa、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及びLuのランタノイドをいう(計17種類)。 The present invention is characterized in that an intermediate layer formed of a rare earth (rare earth element) oxide or hydroxide is disposed between the surface of the metal substrate and the silane coupling layer. Here, the rare earth elements mean lanthanoids of Sc and Y and La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu (total 17 types) .
図1は、本発明の典型的な防食皮膜構造を模式的に示したものである。 FIG. 1 schematically shows a typical anticorrosive film structure of the present invention.
本図において、金属基材1の表面には、中間層2及びシランカップリング層3がこの順に積層されている。中間層2は、Ce、La及びYからなる群から選択された一種類以上の金属の酸化物又は水酸化物で形成されている。中間層2は、Mo、W及びVからなる群から選択された一種類以上の元素を含むことが望ましい。また、中間層2及びシランカップリング層3は、非常に薄い膜であるため、視覚的には、表面は金属基材1の光沢がそのまま観察される。
In the figure, on the surface of the metal base 1, an
本図に示す防食皮膜構造を有する金属部材は、耐食性が高く、かつ、耐熱性、耐溶剤性及び摺動性に優れている。 The metal member having the anticorrosion coating structure shown in this figure has high corrosion resistance and is excellent in heat resistance, solvent resistance and sliding property.
金属基材は、遷移金属又はコバルト若しくは亜鉛のめっき鋼で形成されていることが望ましい。ここで、遷移金属とは、周期表で第3族から第11族までの元素をいう。
The metal substrate is preferably formed of a transition metal or a plated steel of cobalt or zinc. Here, the transition metal means an element from
また、金属基材は、アルミニウム、コバルト、ニッケル若しくは鉄又はこれらの合金で形成されていてもよい。 Also, the metal substrate may be formed of aluminum, cobalt, nickel or iron or an alloy thereof.
本発明の詳細を以下に記述する。 The details of the invention are described below.
作製方法としては、一段処理法(希土類層とシランカップリング層を同時に形成する。以下、「一段法」ともいう。)と二段処理法(希土類層を形成し、次いでシランカップリング層を形成する。以下、「二段法」ともいう。)の二つがある。それぞれの場合に関して記述する。 As a manufacturing method, a one-step treatment method (forming a rare earth layer and a silane coupling layer simultaneously; hereinafter, also referred to as a "one-step method") and a two-step treatment method (forming a rare earth layer) followed by forming a silane coupling layer There are two types of “two-step method” below. Describe each case.
<一段法>
溶媒1に、希土類を含む化合物、シランカップリング剤、加水分解剤、反応促進剤及びpH調整剤を添加し、処理液を作製する。この処理液に金属基材を一定時間浸漬する。これにより、金属表面に希土類の酸化物または水酸化物を形成し、同時にその上にシランカップリング層を形成する。
<One-step method>
A compound containing rare earth, a silane coupling agent, a hydrolyzing agent, a reaction accelerator, and a pH adjuster are added to the solvent 1 to prepare a treatment liquid. The metal substrate is immersed in this treatment liquid for a fixed time. This forms a rare earth oxide or hydroxide on the metal surface and simultaneously forms a silane coupling layer thereon.
なお、シランカップリング剤は、水と反応して重合しやすいため、保管する際は、有機溶媒に溶解した状態とすることが望ましい。また、保管は、湿気の少ない場所が望ましい。このような点から、希土類を含む化合物は、水溶液の状態で保管し、シランカップリング剤とは分けて別々に保管することが望ましい。この水溶液には、過酸化水素と、モリブデン酸塩、タングステン酸塩又はバナジン酸塩とを混合しておいてもよい。 In addition, since a silane coupling agent is easy to react with water and to polymerize, when storing, it is desirable to be in a state of being dissolved in an organic solvent. In addition, storage is desirable in a place with low humidity. From such a point, it is desirable to store the compound containing the rare earth in the state of an aqueous solution and store separately from the silane coupling agent. The aqueous solution may be mixed with hydrogen peroxide and molybdate, tungstate or vanadate.
〔溶媒1〕
基本的にはシランカップリング剤の溶解性を向上させるため、溶媒として1種類又は2種類以上のアルコール等の溶媒が使用される。アルコールは、更に処理溶液の安定性並びに金属基材の湿潤性をも向上させる。
[Solvent 1]
Basically, in order to improve the solubility of the silane coupling agent, a solvent such as one or more alcohols is used as a solvent. The alcohol further improves the stability of the treatment solution as well as the wettability of the metal substrate.
シランカップリング剤は、基本的には加水分解させる必要があるため、水との親和性が高い溶剤が好ましい。具体的には、メタノール、エタノール、プロパノール、ブタノールおよびそれらの異性体、アセトン、メチルエチルケトン、ジエチルケトン等のケトン類、ジメチルエーテル、エチルメチルエーテル、ジエチルエーテル、テトラヒドロフラン等のエーテル類、エチレングリコール、プリピレングリコール、ジエチレングリコール等のグリコール類等が使用される。アルコール以外のものとしては、たとえばヘキサン、テトラヒドロフラン、キシレン等の有機溶媒でも良い。 Since the silane coupling agent basically needs to be hydrolyzed, a solvent having a high affinity to water is preferable. Specifically, methanol, ethanol, propanol, butanol and their isomers, ketones such as acetone, methyl ethyl ketone and diethyl ketone, ethers such as dimethyl ether, ethyl methyl ether, diethyl ether and tetrahydrofuran, ethylene glycol and propylene glycol And glycols such as diethylene glycol are used. Besides the alcohol, for example, an organic solvent such as hexane, tetrahydrofuran or xylene may be used.
〔希土類〕
中間層としての酸化物または水酸化物の形成に使用する希土類としては、セリウム、ランタン及びイットリウムが挙げられる。これらは、硝酸塩、硫酸塩、塩化物、しゅう酸塩、酢酸塩またはリン酸塩の形で使用することができる。特に、その中で硝酸塩が望ましい。濃度は1×10-4~1×10-1Mが好ましく、さらには1×10-3~1×10-2Mがより好ましい。
〔rare earth〕
The rare earths used to form the oxide or hydroxide as an intermediate layer include cerium, lanthanum and yttrium. They can be used in the form of nitrates, sulfates, chlorides, oxalates, acetates or phosphates. In particular, nitrate is desirable among them. The concentration is preferably 1 × 10 −4 to 1 × 10 −1 M, and more preferably 1 × 10 −3 to 1 × 10 −2 M.
〔シランカップリング剤〕
シランカップリング剤として使用されるものとしては、大きく下記の2つのタイプに分類される。
〔Silane coupling agent〕
Those used as silane coupling agents are roughly classified into the following two types.
一つは、化学式X3-nSiR′SiX3-nで表される。ここで、nは0または1であり、Xは加水分解基(メトキシ基、エトキシ基、メトキシエトキシ基、プロピル基、ブチル基、イソブチル基、s-ブチル基、t-ブチル基およびアセチル基)から成る群から選択され、Xどうしが同じでも異なっていてもよい。また、R′は、アルキル基、アルケニル基、及び少なくとも1個のアミノ基またはS基で置換されたアルケニル基から成る群から選択される。例えば、ビストリエトキシシリルエタン(BTSE)(H5C2O)3Si-CH2CH2-Si(OC2H5)3、ビストリエトキシシリルプロピルアミン(BTSPA)(H5C2O)3Si-(CH2)3-NH-(CH2)3-(OC2H5)3、ビストリエトキシシリルプロピルテトラスルフィド(BTSPS)(H2C2O)3Si-(CH2)3-S4-(CH2)3-Si(OC2H5)3などが挙げられる。
One is represented by the chemical formula X 3 -n SiR'SiX 3-n . Here, n is 0 or 1, and X is from a hydrolyzable group (methoxy group, ethoxy group, methoxyethoxy group, propyl group, butyl group, isobutyl group, s-butyl group, t-butyl group and acetyl group) And X may be the same or different. R 'is also selected from the group consisting of an alkyl group, an alkenyl group, and an alkenyl group substituted with at least one amino group or an S group. For example, bis triethoxysilyl ethane (BTSE) (H 5 C 2 O) 3 Si-
もう一つのタイプは、化学式X3-nRnSi-Yで表される有機官能性シランである。ここで、nは0または1であり、Xは、加水分解基であるメトキシ基、エトキシ基、メトキシエトキシ基、プロピル基、ブチル基、イソブチル基、s-ブチル基、t-ブチル基およびアセチル基から成る群から選択され、X同士が同じでも異なっていてもよく、Yは、アミノ基、メルカプト基、フェニル基、ビニル基、エポキシ基、メタクリル基、イソシアネート基、ウレイド基、メルカプト基で代表される有機官能基やアリキル基から成る群から選択される。 Another type is an organofunctional silane represented by the formula X 3-n R n Si-Y. Here, n is 0 or 1, and X is a hydrolyzable group such as methoxy, ethoxy, methoxyethoxy, propyl, butyl, isobutyl, s-butyl, t-butyl and acetyl. And X may be the same or different, and Y is represented by amino group, mercapto group, phenyl group, vinyl group, epoxy group, methacryl group, isocyanate group, ureido group, mercapto group Are selected from the group consisting of organic functional groups and aryl groups.
例えば、ビニルシランCH2=CHSi(OCH2CH3)3、3-グリシドキシプロピルトリメトキシシランCH2-(O)-CHCH2OCH2CH2CH2Si(OCH3)3、3-メルカプトプロピルトリエトキシシランHSCH2CH2CH2Si(OCH2CH3)3、3-アミノプロピルトリエトキシシランH2NCH2CH2CH2Si(OCH2CH3)3、フェニルトリエトキシシラン(C2H5O)3Si-C6H5、3-メタクリロキシプロピルトリエトキシシランCH2=C(CH3)COOCH2CH2CH2Si(OCH2CH3)3、3-イソシアネートプロピルトリメトキシシランO=C=NCH2CH2CH2Si(OCH2CH3)3、デシルトリメトキシシランCH3(CH2)9Si(OCH3)3、3-ウレイドプロピルトリエトキシシラン(C2H5)3SiC3H6NHC(O)NH2などが挙げられる。
For example, vinylsilane CH 2 CHCHSi (OCH 2 CH 3 ) 3 , 3-glycidoxypropyltrimethoxysilane CH 2- (O) -CHCH 2 OCH 2 CH 2 CH 2 Si (OCH 3 ) 3 , 3-mercaptopropyl Triethoxysilane HSCH 2 CH 2 CH 2 Si (OCH 2 CH 3 ) 3 , 3-aminopropyltriethoxysilane H 2 NCH 2 CH 2 CH 2 Si (OCH 2 CH 3 ) 3 , phenyltriethoxysilane (C 2 H) 5 O) 3 Si-C 6 H 5 , 3-methacryloxypropyl triethoxysilane CH 2 CC (CH 3 ) COOCH 2 CH 2 CH 2 Si (OCH 2 CH 3 ) 3 , 3-
それ以外にも、オクタデシルトリエトキシシラン、ビストリエトキシシリルエタン、ビストリエトキシシリルヘキサン、ビストリエトキシシリルエチレン、ビストリメトキシシリルエチルベンゼンなども有効である。上述のシランカップリング剤は、少なくとも部分的に、好ましくは完全に加水分解される。これらのシランカップリング剤の濃度は、約0.05~10重量%、より好ましくは0.2~2重量%である。 Besides, octadecyltriethoxysilane, bistriethoxysilylethane, bistriethoxysilylhexane, bistriethoxysilylethylene, bistrimethoxysilylethylbenzene and the like are also effective. The aforementioned silane coupling agents are at least partially, preferably completely hydrolyzed. The concentration of these silane coupling agents is about 0.05 to 10% by weight, more preferably 0.2 to 2% by weight.
〔加水分解剤〕
シランカップリング剤を加水分解させる必要があるためには、水を添加する必要がある。使用する水の量は、処理液全体に対して2%~20%程度の範囲が適している。加水分解、および溶液の安定性を高めるため、適宜0.2~1.0%の酢酸を添加しても良い。酢酸の添加量の最適値は0.5%である。
[Hydrolyzing agent]
Water needs to be added in order to hydrolyze the silane coupling agent. The amount of water used is suitably in the range of about 2% to 20% with respect to the entire treatment solution. In order to enhance hydrolysis and solution stability, 0.2 to 1.0% of acetic acid may be added as appropriate. The optimum value of the addition amount of acetic acid is 0.5%.
〔反応促進剤〕
希土類の酸化物または水酸化物の形成反応ならびにシランカップリング層形成反応を促進するために、過酸化水素などの反応促進剤を添加しても良い。過酸化水素を使用した場合、数%程度が適している。
[Reaction accelerator]
A reaction promoter such as hydrogen peroxide may be added to promote the formation reaction of the rare earth oxide or hydroxide as well as the silane coupling layer formation reaction. When hydrogen peroxide is used, several percent is suitable.
〔pH調整剤〕
シランカップリング剤の加水分解反応および酸化物または水酸化物の形成反応を促進させるためには、pHを7以下に維持するのが好ましく、できればpHを2~6の間に維持するのが好ましい。pH調整剤としては、水酸化カリウム等の水酸化物、アンモニア、酢酸、ギ酸、硫酸、塩酸、硝酸等が適している。
[PH adjuster]
In order to promote the hydrolysis reaction of the silane coupling agent and the formation reaction of the oxide or hydroxide, it is preferable to maintain the pH at 7 or less, preferably to 2 to 6 if possible. . As the pH adjuster, hydroxides such as potassium hydroxide, ammonia, acetic acid, formic acid, sulfuric acid, hydrochloric acid, nitric acid and the like are suitable.
〔添加剤〕
希土類の酸化物層または水酸化物層の中に、複数の価数を持つ元素を含ませることにより、更に耐食性を上げることが可能である。この多価数の特にアニオンがこの作用を持つために、これに該当するオキソ酸を塩の形で添加剤として加えることが有効である。このオキソ酸塩としては、モリブデン酸塩、タングステン酸塩、バナジン酸塩が挙げられる。それ以外にも添加材としては、リン酸塩、ジルコニウムを含む塩も有効である。添加剤の濃度は、0.2~1.0%程度が適している。
〔Additive〕
The corrosion resistance can be further improved by including an element having a plurality of valences in the rare earth oxide layer or hydroxide layer. In order for this multivalent number of anions to have this effect, it is effective to add the corresponding oxo acid as an additive in the form of a salt. The oxo acid salts include molybdate, tungstate and vanadate. Besides these, salts containing phosphate and zirconium are also effective as additives. The concentration of the additive is suitably about 0.2 to 1.0%.
〔後処理〕
浸漬処理後は、エアーを吹付けることやスピナーによるスピンアウトにより乾燥させる。室温~50℃の温度範囲に維持することにより乾燥させてもよい。
[Post-processing]
After the immersion treatment, it is dried by blowing air or spin-out with a spinner. It may be dried by maintaining the temperature range from room temperature to 50 ° C.
さらに、処理後に、シランカップリング層の架橋反応を行う目的で熱処理を施してもよい。これにより耐食性を向上させることができる。熱処理としては、大気雰囲気で、温度100~200℃、時間30分~2時間が好ましく、温度100~150℃、時間30分~1時間がより好ましい。 Furthermore, after the treatment, a heat treatment may be performed for the purpose of performing a crosslinking reaction of the silane coupling layer. This can improve the corrosion resistance. The heat treatment is preferably performed at a temperature of 100 to 200 ° C. for 30 minutes to 2 hours in the air, and more preferably at a temperature of 100 to 150 ° C. for 30 minutes to 1 hour.
溶液の調整方法としては、例えば、以下の方法で調整することができる。 As a method of adjusting the solution, for example, it can be adjusted by the following method.
溶媒1中にシランカップリング剤を添加し、更に酢酸を添加して所定のpHに調整する。さらに、加水分解用の水を添加し、その状態で数時間強く撹拌する。その後、1日放置した後に所定の濃度になるように希土類の化合物、反応促進剤および添加剤を溶解する。処理時間は、数十分~数時間が適している。以下の実施例および比較例は全て2時間浸漬させた場合を示している(ただし、比較例8だけは100h浸漬した場合である。)。 The silane coupling agent is added to the solvent 1 and acetic acid is further added to adjust to a predetermined pH. Furthermore, water for hydrolysis is added and stirred vigorously for several hours in that state. Thereafter, the compound of the rare earth, the reaction accelerator and the additive are dissolved to a predetermined concentration after standing for one day. The processing time is suitably from several tens minutes to several hours. The following examples and comparative examples all show the case of immersion for 2 hours (however, only comparative example 8 is the case of immersion for 100 h).
<二段法>
溶媒2に希土類を含む化合物および反応促進剤を添加した溶液(水溶液)に金属基材を浸漬し、金属基材上に希土類の酸化物または水酸化物を形成する。次いで、溶媒3(有機溶媒)にシランカップリング剤、加水分解剤、反応促進剤及びpH調整剤を添加した溶液に、希土類の酸化物または水酸化物の皮膜を形成した金属基材を浸漬し、シランカップリング層を形成する。
Two-stage method
The metal base is immersed in a solution (aqueous solution) in which the compound containing the rare earth in the solvent 2 and the reaction accelerator are added to form an oxide or hydroxide of the rare earth on the metal base. Next, the metal base on which the oxide or hydroxide film of rare earth is formed is dipped in a solution in which a silane coupling agent, a hydrolyzing agent, a reaction accelerator and a pH adjuster are added to solvent 3 (organic solvent). , Form a silane coupling layer.
なお、溶媒2を含む溶液(水溶液)と、溶媒3(有機溶媒)を含む溶液とは分けて別々に保管することが望ましい。この水溶液には、過酸化水素と、モリブデン酸塩、タングステン酸塩又はバナジン酸塩とを混合しておいてもよい。 It is preferable that the solution containing the solvent 2 (aqueous solution) and the solution containing the solvent 3 (organic solvent) be separately stored. The aqueous solution may be mixed with hydrogen peroxide and molybdate, tungstate or vanadate.
(一段目)
希土類の酸化物または水酸化物を形成する。
(first stage)
Form oxides or hydroxides of the rare earths.
〔溶媒2〕
基本的に水を使用する。
[Solvent 2]
Basically use water.
〔希土類〕
酸化物または水酸化物形成に使用する希土類としては、セリウム、ランタン及びイットリウムが挙げられる。これらは、硝酸塩、硫酸塩、塩化物、しゅう酸塩、酢酸塩またはリン酸塩の形で使用することができる。特に、その中で硝酸塩が望ましい。
〔rare earth〕
Rare earths used for oxide or hydroxide formation include cerium, lanthanum and yttrium. They can be used in the form of nitrates, sulfates, chlorides, oxalates, acetates or phosphates. In particular, nitrate is desirable among them.
〔反応促進剤〕
希土類の酸化物または水酸化物の形成反応を促進するために、過酸化水素などの反応促進剤を添加しても良い。
[Reaction accelerator]
A reaction promoter such as hydrogen peroxide may be added to promote the formation reaction of rare earth oxides or hydroxides.
〔添加剤〕
希土類の酸化物層または水酸化物層の中に、複数の価数を持つ元素を含ませることにより、更に耐食性を上げることが可能である。この多価数の特にアニオンがこの作用を持つために、これに該当するオキソ酸を塩の形で添加剤として加えることが有効である。このオキソ酸塩としては、モリブデン酸塩、タングステン酸塩及びバナジン酸塩が挙げられる。それ以外にも、添加剤としてリン酸塩、又はジルコニウムを含む塩も有効である。
〔Additive〕
The corrosion resistance can be further improved by including an element having a plurality of valences in the rare earth oxide layer or hydroxide layer. In order for this multivalent number of anions to have this effect, it is effective to add the corresponding oxo acid as an additive in the form of a salt. The oxo acid salts include molybdate, tungstate and vanadate. Besides them, salts containing phosphate or zirconium as an additive are also effective.
〔後処理〕
浸漬処理後は、エアーを吹付けることやスピナーによるスピンアウトにより乾燥する。または、室温~50℃の温度範囲に維持することにより乾燥してもよい。
[Post-processing]
After the immersion treatment, it is dried by blowing air or spin-out with a spinner. Alternatively, it may be dried by maintaining the temperature range from room temperature to 50 ° C.
(二段目)
シランカップリング層を形成する。
(Second stage)
Form a silane coupling layer.
〔溶媒3〕
いくつかのシランカップリング剤の水への溶解性は制限されるため、基本的にはシランカップリング剤の溶解性を向上させるためには、溶媒として1又は2種類以上のアルコール等(有機溶媒)が使用される。アルコールはさらに処理溶液の安定性並びに金属基材の湿潤性をも向上させる。シランカップリング剤は、基本的には加水分解させる必要があるために水との親和性が高い溶剤が好ましい。具体的には、メタノール、エタノール、プロパノール、ブタノールおよびそれらの異性体、アセトン、メチルエチルケトン、ジエチルケトン等のケトン類、ジメチルエーテル、エチルメチルエーテル、ジエチルエーテル、テトラヒドロフラン等のエーテル類、エチレングリコール、プリピレングリコール、ジエチレングリコール等のグリコール類等が使用される。アルコール以外の有機溶媒としては、たとえばヘキサン、テトラヒドロフラン、キシレン等であってもよい。
[Solvent 3]
Since the solubility of some silane coupling agents in water is limited, basically, in order to improve the solubility of the silane coupling agent, one or more alcohols, etc. (organic ) Is used. The alcohol further improves the stability of the treatment solution as well as the wettability of the metal substrate. The silane coupling agent is preferably a solvent having a high affinity for water since it basically needs to be hydrolyzed. Specifically, methanol, ethanol, propanol, butanol and their isomers, ketones such as acetone, methyl ethyl ketone and diethyl ketone, ethers such as dimethyl ether, ethyl methyl ether, diethyl ether and tetrahydrofuran, ethylene glycol and propylene glycol And glycols such as diethylene glycol are used. The organic solvent other than alcohol may be, for example, hexane, tetrahydrofuran, xylene or the like.
〔シランカップリング剤〕
シランカップリング剤として使用されるものとしては、大きく下記の2つのタイプに分類される。一つは、X3-nSiR′SiX3-nの構造で示され、nは0または1であり、Xは、加水分解基であるメトキシ基、エトキシ基、メトキシエトキシ基、プロピル基、ブチル基、イソブチル基、s-ブチル基、t-ブチル基およびアセチル基から成る群から選択され、Xどうしが同じでも異なっていてもよい。また、R′は、アルキル基、アルケニル基、少なくとも1個のアミノ基またはS基で置換されたアルケニル基から成る群から選択される。たとえば、ビストリエトキシシリルエタン(BTSE)(H5C2O)3Si-CH2CH2-Si(OC2H5)3、ビストリエトキシシリルプロピルアミン(BTSPA)(H5C2O)3Si-(CH2)3-NH-(CH2)3-(OC2H5)3、ビストリエトキシシリルプロピルテトラスルフィド(BTSPS)(H2C2O)3Si-(CH2)3-S4-(CH2)3-Si(OC2H5)3などが挙げられる。もう一つのタイプは、有機官能性シランとして、X3-nRnSi-Yの構造で示され、nは0または1であり、Xは加水分解基であるメトキシ基、エトキシ基、メトキシエトキシ基、プロピル基、ブチル基、イソブチル基、s-ブチル基、t-ブチル基およびアセチル基から成る群から選択され、Xどうしが同じでも異なっていてもよく、Yはアミノ基、メルカプト基、フェニル基、ビニル基、エポキシ基、メタクリル基、イソシアネート基、ウレイド基、メルカプト基で代表される有機官能基やアリキル基から成る群から選択される。たとえば、ビニルシランCH2=CHSi(OCH2CH3)3、3-グリシドキシプロピルトリメトキシシランCH2-(O)-CHCH2OCH2CH2CH2Si(OCH3)3、3-メルカプトプロピルトリエトキシシランHSCH2CH2CH2Si(OCH2CH3)3、3-アミノプロピルトリエトキシシランH2NCH2CH2CH2Si(OCH2CH3)3、フェニルトリエトキシシラン(C2H5O)3Si-C6H5、3-メタクリロキシプロピルトリエトキシシランCH2=C(CH3)COOCH2CH2CH2Si(OCH2CH3)3、3-イソシアネートプロピルトリメトキシシランO=C=NCH2CH2CH2Si(OCH2CH3)3、デシルトリメトキシシランCH3(CH2)9Si(OCH3)3、3-ウレイドプロピルトリエトキシシラン(C2H5)3SiC3H6NHC(O)NH2などが挙げられる。
〔Silane coupling agent〕
Those used as silane coupling agents are roughly classified into the following two types. One of them is represented by the structure of X 3-n SiR'SiX 3-n , n is 0 or 1, and X is a hydrolyzable group such as methoxy, ethoxy, methoxyethoxy, propyl, butyl It is selected from the group consisting of a group, isobutyl group, s-butyl group, t-butyl group and acetyl group, and X's may be the same or different. R 'is also selected from the group consisting of an alkyl group, an alkenyl group, an alkenyl group substituted with at least one amino group or an S group. For example, bis triethoxysilyl ethane (BTSE) (H 5 C 2 O) 3 Si-
それ以外にも、オクタデシルトリエトキシシラン、ビストリエトキシシリルエタン、ビストリエトキシシリルヘキサン、ビストリエトキシシリルエチレン、ビストリメトキシシリルエチルベンゼンなども有効である。上述のシランカップリング剤は、少なくとも部分的に、好ましくは完全に加水分解される。これらシランカップリング剤の濃度は、約0.05~10重量%、より好ましくは0.2~1重量%である。 Besides, octadecyltriethoxysilane, bistriethoxysilylethane, bistriethoxysilylhexane, bistriethoxysilylethylene, bistrimethoxysilylethylbenzene and the like are also effective. The aforementioned silane coupling agents are at least partially, preferably completely hydrolyzed. The concentration of these silane coupling agents is about 0.05 to 10% by weight, more preferably 0.2 to 1% by weight.
〔加水分解剤〕
シランカップリング剤を加水分解させる必要があるために水を添加する必要がある。使用する水の量は、処理液全体に対して2~20%程度の範囲が適している。加水分解、および溶液の安定性を高めるため、適宜0.2~1.0%の酢酸を添加しても良い。酢酸の添加量は0.5%が最適である。
[Hydrolyzing agent]
Water needs to be added because it is necessary to hydrolyze the silane coupling agent. The amount of water to be used is suitably in the range of about 2 to 20% with respect to the entire treatment solution. In order to enhance hydrolysis and solution stability, 0.2 to 1.0% of acetic acid may be added as appropriate. The addition amount of acetic acid is optimally 0.5%.
〔pH調整剤〕
シランカップリング剤の加水分解反応および酸化物または水酸化物の形成反応を促進させるためには、pHを7以下に維持するのが好ましく、pHは2~6の間に維持するのが更に好ましい。pH調整剤としては、水酸化カリウム等の水酸化物、アンモニア、酢酸、ギ酸、硫酸、塩酸、硝酸等が適している。浸漬処理後は、エアーを吹付けることやスピナーによるスピンアウトにより乾燥する。室温~50℃の温度範囲に維持することにより乾燥してもよい。さらに、処理後に、シランカップリング層の架橋反応を行う目的で熱処理を施すことにより、耐食性を向上させることができる。熱処理としては、温度を100~200℃とし、時間を30分~2時間とすることが好ましく、100~150℃、30分~1時間が更に好ましい。
[PH adjuster]
In order to accelerate the hydrolysis reaction of the silane coupling agent and the formation reaction of the oxide or hydroxide, the pH is preferably maintained at 7 or less, and more preferably 2 to 6 . As the pH adjuster, hydroxides such as potassium hydroxide, ammonia, acetic acid, formic acid, sulfuric acid, hydrochloric acid, nitric acid and the like are suitable. After the immersion treatment, it is dried by blowing air or spin-out with a spinner. It may be dried by maintaining the temperature range from room temperature to 50 ° C. Furthermore, corrosion resistance can be improved by heat-processing for the purpose of performing the crosslinking reaction of a silane coupling layer after a process. As the heat treatment, the temperature is preferably 100 to 200 ° C., and the time is preferably 30 minutes to 2 hours, and more preferably 100 to 150 ° C. for 30 minutes to 1 hour.
〔後処理〕
浸漬処理後は、エアーを吹付けることやスピナーによるスピンアウトにより乾燥する。室温~50℃の温度範囲に維持することにより乾燥させてもよい。さらに、処理後に、シランカップリング層の架橋反応を行う目的で熱処理を施すことにより、耐食性を向上させることができる。熱処理としては、大気雰囲気で、温度を100~200℃とし、時間を30分~2時間とすることが好ましく、100~150℃、30分~1時間が更に好ましい。
[Post-processing]
After the immersion treatment, it is dried by blowing air or spin-out with a spinner. It may be dried by maintaining the temperature range from room temperature to 50 ° C. Furthermore, corrosion resistance can be improved by heat-processing for the purpose of performing the crosslinking reaction of a silane coupling layer after a process. As the heat treatment, it is preferable to set the temperature to 100 to 200 ° C. and the time to 30 minutes to 2 hours in an air atmosphere, and more preferably 100 to 150 ° C. for 30 minutes to 1 hour.
溶液の調整方法としては、たとえば以下の方法で調整することができる。 The solution can be prepared, for example, by the following method.
一段目溶液の作製は、溶媒2に、希土類の化合物、反応促進剤および添加剤を溶解させる。一段目の処理時間は、数十分~数時間が適している。以下の実施例は全て、2時間浸漬した場合を示している。 In the preparation of the first-stage solution, the rare earth compound, the reaction accelerator and the additive are dissolved in the solvent 2. The processing time of the first stage is suitably from several tens minutes to several hours. The following examples all show the case of immersion for 2 hours.
二段目溶液の作製は、溶媒3にシランカップリング剤、加水分解剤、pH調整剤を添加し、1時間強く撹拌する。二段目の処理時間は、数分~数時間が適している。以下の実施例は全て、各処理とも30分間浸漬した場合を示している。 In the preparation of the second-stage solution, a silane coupling agent, a hydrolyzing agent, and a pH adjuster are added to the solvent 3, and the solution is vigorously stirred for 1 hour. The processing time for the second stage is suitably several minutes to several hours. The following examples all show the case where each treatment was immersed for 30 minutes.
腐食評価として以下のことを実施した。 The following was carried out as a corrosion evaluation.
試料であるコバルト及びアルミニウム並びにこれらの合金に関しては、シリコンウエハ上に密着層として酸化チタンをスパッタした後に、その上に対象とするアルミニウムまたはアルミニウム合金をスパッタし、成膜することにより作製した。また、バルク剤として亜鉛めっき鋼板、炭素鋼、ニッケルも使用した。各種材料に、上記一段法または二段法で皮膜を形成させた後に、熱処理、すなわち空気中にて100℃、1hで熱処理を施した。 Samples of cobalt and aluminum and alloys thereof were prepared by sputtering titanium oxide as an adhesion layer on a silicon wafer, and then sputtering and depositing the target aluminum or aluminum alloy thereon. In addition, as a bulking agent, galvanized steel sheet, carbon steel, and nickel were also used. Various materials were heat-treated, that is, heat-treated at 100 ° C. in air for 1 h in air after forming a film by the above-described one-step method or two-step method.
耐食性の評価は、以下の2つの方法を評価した。 The following two methods were evaluated for corrosion resistance evaluation.
(1)電気化学試験:希土類-シランカップリング処理および熱処理を施したサンプルを1cm2残し、他の部分をシールした。それを3.5wt%のNaCl水溶液に浸漬した。10分間浸漬し、電位が安定した時点で、浸漬電位から-100mVの低い電位を基準とし、アノード方向に30mV/minのスキャン速度で電位を走査させ、電流を測定した。測定後、ターフェルの関係式を使用して腐食電流密度を求めた。また、電流が急激に立ち上がる電位を孔食電位とし、その電位が500mV以上の場合を耐孔食性良好とした。この電位が貴になればなるほど耐孔食性は向上する。 (1) Electrochemical test: 1 cm 2 of the sample subjected to rare earth-silane coupling treatment and heat treatment was left, and the other part was sealed. It was immersed in a 3.5 wt% NaCl aqueous solution. After immersion for 10 minutes, when the potential was stabilized, the potential was scanned at a scanning speed of 30 mV / min in the anode direction based on a potential as low as −100 mV from the immersion potential, and the current was measured. After measurement, the corrosion current density was determined using the Tafel equation. Further, the potential at which the current rises sharply was taken as a pitting potential, and when the potential was 500 mV or more, the pitting resistance was considered to be good. The more noble this potential, the better the pitting resistance.
(2)浸漬試験:希土類-シランカップリング処理および熱処理を施したサンプルを、3.5%NaCl溶液中に浸漬した。光学顕微鏡により孔食の発生の有無を観察した。変化ないものを○、孔食の発生は無いものの変色域があるものを△、孔食発生が確認されたものを×で表現した。 (2) Immersion test: The sample subjected to the rare earth-silane coupling treatment and the heat treatment was immersed in a 3.5% NaCl solution. The occurrence of pitting was observed by an optical microscope. Those with no change were represented by ○, those with no occurrence of pitting but with a discoloration area were represented by Δ, and those with occurrence of pitting were indicated by x.
以下、本発明を適用した具体的な実施例について、表を参照して説明する。特に記述しないが、試験温度は全て25℃である。 Hereinafter, specific embodiments to which the present invention is applied will be described with reference to a table. Although not described in particular, all test temperatures are 25 ° C.
表1は、一段処理の場合の実施例および比較例(電気化学評価)を示したものである。 Table 1 shows an example and a comparative example (electrochemical evaluation) in the case of one-step treatment.
(比較例1)
未処理のAlの腐食電流密度は0.052μA/cm2、孔食電位は-650mVである。
(Comparative example 1)
The corrosion current density of untreated Al is 0.052 μA / cm 2 and the pitting potential is -650 mV.
比較例1が、Alの耐食性の向上を検討する上での基準となる数値である。これと比較して、腐食電流密度が小さくなるほど、孔食電位が貴側にシフト(+に大きくなる)ほど耐食性が良くなる。 The comparative example 1 is a numerical value which becomes a standard in considering improvement of the corrosion resistance of Al. Compared to this, the lower the corrosion current density, the better the shift of the pitting potential to the noble side (the larger the value to +), the better the corrosion resistance.
(比較例5)
0.02M硝酸セリウム水溶液で処理したAlの3.5wt%NaCl溶液中における腐食電流密度は0.033μA/cm2、孔食電位は-520mVである。
(Comparative example 5)
The corrosion current density in a 3.5 wt% NaCl solution of Al treated with a 0.02 M aqueous solution of cerium nitrate is 0.033 μA / cm 2 , and the pitting potential is −520 mV.
(比較例6)
1wt%BTSE、10% H2Oおよび1wt%過酸化水素を含むエタノール水溶液でAlの3.5wt%NaCl溶液中における腐食電流密度は0.038μA/cm2、孔食電位は-615mVである。試料には、100℃、1hの熱処理を実施している。
(Comparative example 6)
The corrosion current density in a 3.5 wt% NaCl solution of Al in an aqueous ethanol solution containing 1 wt% BTSE, 10% H 2 O and 1 wt% hydrogen peroxide is 0.038 μA / cm 2 and the pitting potential is -615 mV. The sample is heat-treated at 100 ° C. for 1 h.
(比較例7)
1wt%BTSEおよび10% H2Oを含むエタノール水溶液でAlの3.5wt%NaCl溶液中における腐食電流密度は0.048μA/cm2、孔食電位は-648mVである。試料には、100℃、1hの熱処理を実施している。
(Comparative example 7)
The corrosion current density in a 3.5 wt% NaCl solution of Al in an aqueous ethanol solution containing 1 wt% BTSE and 10% H 2 O is 0.048 μA / cm 2 , and the pitting potential is -648 mV. The sample is heat-treated at 100 ° C. for 1 h.
(比較例8)
1wt%BTSEおよび10% H2Oを含むエタノール水溶液でAlの3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は-320mVである。本実施例のみ浸漬時間は100hである。試料には、100℃、1hの熱処理を実施している。
(Comparative example 8)
The corrosion current density in a 3.5 wt% NaCl solution of Al in an aqueous ethanol solution containing 1 wt% BTSE and 10% H 2 O is less than 0.001 μA / cm 2 (below detection limit), and the pitting potential is −320 mV. The immersion time is 100 h only in this example. The sample is heat-treated at 100 ° C. for 1 h.
0.02M硝酸セリウム、1wt%BTSEおよび10%H2Oを含むエタノール水溶液でAlを処理した。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は-180mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。試料には、100℃、1hの熱処理を実施している。光電子分光分析(XPS)、二次イオン質量分析法(SIMS)、オージエ電子分光分析(AES)により、Al上にはセリウムの水酸化物および酸化物が形成され、その上にBTSE層が形成されているのが確認された(構造は、図1に示したものである。)。 The Al was treated with an aqueous ethanol solution containing 0.02 M cerium nitrate, 1 wt% BTSE and 10% H 2 O. The corrosion current density of the treated material in a 3.5 wt% NaCl solution is less than 0.001 μA / cm 2 (below the detection limit), and the pitting potential is -180 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment. The sample is heat-treated at 100 ° C. for 1 h. By means of photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS), and Auger electron spectroscopy (AES), cerium hydroxide and oxide are formed on Al, and a BTSE layer is formed thereon. (The structure is as shown in FIG. 1).
比較例5は硝酸セリウムのみで処理した場合であるが、腐食電流密度が比較例1よりわずかに低下し、孔食電位もわずかに貴側にシフトしているもののその程度は小さく、本実施例ほどの耐食性向上は見られない。この場合は、Al上にはセリウムの水酸化物および酸化物が形成されているのが確認された。 Comparative Example 5 is a case where only cerium nitrate is treated, but although the corrosion current density is slightly lower than Comparative Example 1 and the pitting potential is also slightly shifted to the noble side, the extent thereof is small, this example There is no significant improvement in corrosion resistance. In this case, it was confirmed that cerium hydroxide and oxide were formed on Al.
比較例7は、BTSEで処理した場合であるが、腐食電流密度が比較例1よりわずかに低下するものの孔食電位はほとんど変化していなく、本実施例ほどの耐食性向上は見られない。この場合は、Al上にはBTSE層が形成されているのが確認された。 Comparative Example 7 is the case of treatment with BTSE, but although the corrosion current density is slightly lower than Comparative Example 1, the pitting potential is hardly changed, and the corrosion resistance improvement as in this Example is not seen. In this case, it was confirmed that a BTSE layer was formed on Al.
比較例6は、BTSEで処理した場合であるが、腐食電流密度が比較例1よりわずかに低下するものの孔食電位はほとんど変化していなく、本実施例ほどの耐食性向上は見られない。この場合は、Al上には、自然酸化膜より厚いアルミニウムの酸化物層上にBTSE層が形成されているのが確認された。 Comparative Example 6 is the case of treatment with BTSE, but although the corrosion current density is slightly lower than Comparative Example 1, the pitting potential hardly changes, and the corrosion resistance improvement as seen in this example is not seen. In this case, it was confirmed that the BTSE layer was formed on the aluminum oxide layer thicker than the natural oxide film on Al.
本実施例と、比較例5~7とを対比させると、耐食性を著しく向上させるには、酸化セリウム若しくは水酸化セリウム、BTSE層又は下地金属酸化物若しくは下地金属水酸化物層+BTSE層では不十分であり、セリウム酸化物層若しくはセリウム水酸化物層+BTSE層の構成が必須であるといえる。比較例8は比較例7と同じ組成であるが、浸漬時間が100hと長い場合である(表1には浸漬時間は記入していない。他の場合は前述したように浸漬時間は2.0hである。)。長時間浸漬すると、本実施例の場合と同等の耐食性を得ることができるが、短時間で高耐食性を得るにはセリウム酸化物層若しくはセリウム水酸化物層+BTSE層の構成が必須である。 When the present example and comparative examples 5 to 7 are compared, it is insufficient with cerium oxide or cerium hydroxide, BTSE layer or base metal oxide or base metal hydroxide layer + BTSE layer to significantly improve the corrosion resistance. It can be said that the structure of the cerium oxide layer or the cerium hydroxide layer + the BTSE layer is essential. Comparative Example 8 has the same composition as Comparative Example 7, but the immersion time is as long as 100 h (the immersion time is not written in Table 1. In other cases, the immersion time is 2.0 h as described above) Is). If it is immersed for a long time, the same corrosion resistance as in the case of this example can be obtained, but in order to obtain high corrosion resistance in a short time, the configuration of the cerium oxide layer or the cerium hydroxide layer + the BTSE layer is essential.
0.02M硝酸セリウム、1wt%BTSE、10%H2Oおよび添加剤として0.2wt%のモリブデン酸ナトリウムを含むエタノール水溶液でAlを処理した。試料には、100℃、1hの熱処理を実施している。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は+100mVである。 It was treated with Al in 0.02M cerium nitrate, an aqueous ethanol solution containing 0.2 wt% of sodium molybdate as a 1wt% BTSE, 10% H 2 O , and additives. The sample is heat-treated at 100 ° C. for 1 h. The corrosion current density of the treated material in a 3.5 wt% NaCl solution is less than 0.001 μA / cm 2 (below the detection limit), and the pitting potential is +100 mV.
比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。特に孔食電位は、700mV以上も貴側にシフトしており、耐孔食性が著しく向上しているのが分かる。皮膜分析では、セリウム酸化物(または水酸化物)中にMoが取り込まれているのが確認された。このMoの存在が、孔食電位を著しく貴側にシフトさせている要因と推定できる。 Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment. In particular, the pitting potential is shifted to the noble side by 700 mV or more, and it can be seen that the pitting resistance is significantly improved. Film analysis confirmed that Mo was incorporated in the cerium oxide (or hydroxide). It can be estimated that the presence of Mo causes the pitting potential to be significantly shifted to the noble side.
0.1M硝酸セリウム、1wt%BTSEおよび10%H2Oを含むエタノール水溶液でAlを処理した。試料には、100℃、1hの熱処理を実施している。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は-26mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。濃度が薄い実施例1の場合と比較すると、孔食電位が更に貴側にシフトしている。 The Al was treated with an aqueous ethanol solution containing 0.1 M cerium nitrate, 1 wt% BTSE and 10% H 2 O. The sample is heat-treated at 100 ° C. for 1 h. The corrosion current density of the treated material in a 3.5 wt% NaCl solution is less than 0.001 μA / cm 2 (below the detection limit), and the pitting potential is −26 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment. The pitting potential is further shifted to the noble side as compared with Example 1 in which the concentration is low.
本実施例は、実施例1で使用した硝酸セリウムの代わりに硝酸ランタンを使用した場合である。試料には、100℃、1hの熱処理を実施している。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は-250mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。 In this example, lanthanum nitrate was used in place of cerium nitrate used in Example 1. The sample is heat-treated at 100 ° C. for 1 h. The corrosion current density in the 3.5 wt% NaCl solution of the treated material is less than 0.001 μA / cm 2 (below the detection limit), and the pitting potential is −250 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
本実施例は、実施例1で使用した硝酸セリウムの代わりに硝酸イットリウムを使用した場合である。試料には、100℃、1hの熱処理を実施している。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は-220mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。実施例4の場合と併せて考えると、希土類を使用することで耐食性を向上させていることが分かる。 This example is the case where yttrium nitrate is used instead of the cerium nitrate used in Example 1. The sample is heat-treated at 100 ° C. for 1 h. The corrosion current density in the 3.5 wt% NaCl solution of the treated material is less than 0.001 μA / cm 2 (below the detection limit), and the pitting potential is −220 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment. When considered together with the case of Example 4, it can be seen that the corrosion resistance is improved by using a rare earth.
本実施例は、実施例1で使用したカップリング剤であるBTSEの代わりにBTESPTを使用した場合である。試料には、100℃、1hの熱処理を実施している。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は-26mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。 This example is the case where BTESPT was used instead of BTSE which is a coupling agent used in Example 1. The sample is heat-treated at 100 ° C. for 1 h. The corrosion current density of the treated material in a 3.5 wt% NaCl solution is less than 0.001 μA / cm 2 (below the detection limit), and the pitting potential is −26 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
本実施例は、実施例1で使用したカプリング剤であるBTSEの代わりにγ-APSを使用した場合である。試料には、100℃、1hの熱処理を実施している。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は-420mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。 In this example, γ-APS was used instead of BTSE which is a coupling agent used in Example 1. The sample is heat-treated at 100 ° C. for 1 h. The corrosion current density of the treated material in a 3.5 wt% NaCl solution is less than 0.001 μA / cm 2 (below the detection limit), and the pitting potential is −420 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
本実施例は、実施例6で使用した加水分解剤であるH2Oの代わりに酢酸を使用した場合である。試料には、100℃、1hの熱処理を実施している。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は-155mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。 In this example, acetic acid was used in place of H 2 O which is a hydrolyzing agent used in Example 6. The sample is heat-treated at 100 ° C. for 1 h. The corrosion current density of the treated material in a 3.5 wt% NaCl solution is less than 0.001 μA / cm 2 (below the detection limit), and the pitting potential is -155 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
本実施例は、実施例2で使用した添加剤であるモリブデン酸ナトリウムの代わりに反応促進剤として過酸化水素を添加した場合である。試料には、100℃、1hの熱処理を実施している。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は-15mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。 In this example, hydrogen peroxide is added as a reaction promoter in place of sodium molybdate, which is an additive used in Example 2. The sample is heat-treated at 100 ° C. for 1 h. The corrosion current density in the 3.5 wt% NaCl solution of the treated material is less than 0.001 μA / cm 2 (below the detection limit), and the pitting potential is −15 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
〔一段処理の亜鉛めっき鋼板に関して〕
(比較例2)
未処理の亜鉛めっき鋼板の腐食電流密度は10.21μA/cm2、孔食電位は検出されない。
[Regarding the galvanized steel sheet in one-step process]
(Comparative example 2)
The corrosion current density of the untreated galvanized steel sheet is 10.21 μA / cm 2 , and no pitting potential is detected.
0.02M硝酸セリウム、1wt%BTESPTおよび10%H2Oを含むエタノール水溶液で亜鉛めっき鋼板を処理した。試料には、100℃、1hの熱処理を実施している。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.35μA/cm2である。孔食電位は検出されない。比較例2と比較すると、腐食電流密度が低下していることから、本処理により耐食性が著しく向上しているといえる。 0.02M cerium nitrate were treated galvanized steel sheet in an aqueous ethanol solution containing 1wt% BTESPT and 10% H 2 O. The sample is heat-treated at 100 ° C. for 1 h. The corrosion current density in the 3.5 wt% NaCl solution of the treated material is 0.35 μA / cm 2 . No pitting potential is detected. Since the corrosion current density is lower than that of Comparative Example 2, it can be said that the corrosion resistance is remarkably improved by this treatment.
〔一段処理のCoに関して〕
(比較例3)
未処理のCoの腐食電流密度は7.05μA/cm2、孔食電位は検出されない。
[Regarding Co in one-step processing]
(Comparative example 3)
The corrosion current density of untreated Co is 7.05 μA / cm 2 and no pitting potential is detected.
0.02M硝酸セリウム、1wt%BTESPTおよび10%H2Oを含むエタノール水溶液でCoを処理した。試料には、100℃、1hの熱処理を実施している。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.18μA/cm2である。孔食電位は検出されない。比較例3と比較すると、腐食電流密度が低下していることから、本処理により耐食性が著しく向上しているといえる。 0.02M cerium nitrate were treated Co ethanol aqueous solution containing 1wt% BTESPT and 10% H 2 O. The sample is heat-treated at 100 ° C. for 1 h. The corrosion current density in the 3.5 wt% NaCl solution of the treated material is 0.18 μA / cm 2 . No pitting potential is detected. As compared to Comparative Example 3, the corrosion current density is lowered, so it can be said that the corrosion resistance is remarkably improved by this treatment.
〔一段処理のNiに関して〕
(比較例4)
未処理のNiの腐食電流密度は3.42μA/cm2、孔食電位は検出されない。
[Regarding Ni in One-Step Process]
(Comparative example 4)
The corrosion current density of untreated Ni is 3.42 μA / cm 2 and no pitting potential is detected.
0.02M硝酸セリウム、1wt%BTESPTおよび10%H2Oを含むエタノール水溶液でNiを処理した。試料には、100℃、1hの熱処理を実施している。処理材の3.5wt%NaCl溶液中における腐食電流密度は0.21μA/cm2である。孔食電位は検出されない。比較例4と比較すると、腐食電流密度が低下していることから、本処理により耐食性が著しく向上しているといえる。 0.02M cerium nitrate were treated Ni ethanol aqueous solution containing 1wt% BTESPT and 10% H 2 O. The sample is heat-treated at 100 ° C. for 1 h. The corrosion current density in the 3.5 wt% NaCl solution of the treated material is 0.21 μA / cm 2 . No pitting potential is detected. As compared to Comparative Example 4, since the corrosion current density is reduced, it can be said that the corrosion resistance is remarkably improved by this treatment.
表2は、二段処理の場合の実施例および比較例(電気化学評価)を示したものである。 Table 2 shows an example and a comparative example (electrochemical evaluation) in the case of the two-stage treatment.
本実施例では、一段目処理として0.02M硝酸セリウム溶液に浸漬後、二段目処理に1wt%BTSE(水を加水分解剤)のエタノール溶液にAlを浸漬した。二段目処理後に試料には、100℃、1hの熱処理を実施している。3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は-235mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。 In this example, after being immersed in a 0.02 M cerium nitrate solution as the first treatment, Al was immersed in an ethanol solution of 1 wt% BTSE (water as a hydrolyzing agent) in the second treatment. After the second stage treatment, the sample is subjected to heat treatment at 100 ° C. for 1 h. The corrosion current density in a 3.5 wt% NaCl solution is less than 0.001 μA / cm 2 (below detection limit), and the pitting potential is −235 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment.
本実施例では、一段目処理として0.02M硝酸セリウム溶液に反応促進剤として1wt%過酸化水素を添加した水溶液に浸漬後、二段目処理に1wt%BTSE(水を加水分解剤)のエタノール溶液にAlを浸漬させた。二段目処理後に試料には、100℃、1hの熱処理を実施している。3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2以下(検出限界以下)、孔食電位は-18mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。過酸化水素を添加したことにより、生成するセリウム酸化物の表面に多くの水酸基が導入されるため、BTSEがより多く、しかも整然と配列するため、孔食電位が大きく貴側にシフトしたと考えられる。 In this example, after immersing in an aqueous solution in which 1 wt% hydrogen peroxide is added as a reaction accelerator in 0.02 M cerium nitrate solution as the first stage treatment, ethanol of 1 wt% BTSE (water as a hydrolyzing agent) in the second stage treatment The solution was immersed in Al. After the second stage treatment, the sample is subjected to heat treatment at 100 ° C. for 1 h. The corrosion current density in a 3.5 wt% NaCl solution is 0.001 μA / cm 2 or less (below the detection limit), and the pitting potential is -18 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment. The addition of hydrogen peroxide causes many hydroxyl groups to be introduced on the surface of the cerium oxide to be formed, and the BTSE is arranged more and more orderly, so the pitting potential is considered to be largely shifted to the noble side. .
本実施例は、実施例14で使用した硝酸セリウムの代わりに塩化セリウムを使用した場合である。二段目処理後に試料には、100℃、1hの熱処理を実施している。3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は-22mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。塩化物でも、硝酸塩の場合と同様の腐食抑制効果が得られている。 This example is the case where cerium chloride is used instead of the cerium nitrate used in Example 14. After the second stage treatment, the sample is subjected to heat treatment at 100 ° C. for 1 h. The corrosion current density in a 3.5 wt% NaCl solution is less than 0.001 μA / cm 2 (below the detection limit), and the pitting potential is −22 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment. In the case of chloride, the same corrosion control effect as in the case of nitrate is obtained.
本実施例では、一段目処理として0.02M硫酸ランタン溶液に添加剤として0.4wt%タングステン酸ナトリウムを添加した水溶液に浸漬後、二段目処理に1wt%BTESPT(水を加水分解剤)のエタノール溶液にAlを浸漬した。二段目処理後に試料には、100℃、1hの熱処理を実施している。3.5wt%NaCl溶液中における腐食電流密度は0.001μA/cm2未満(検出限界以下)、孔食電位は35mVである。比較例1と比較すると、腐食電流密度が低下し、孔食電位は数百mV以上貴側にシフトしていることから、本処理により耐食性が著しく向上しているといえる。Al上にタングステンを含むランタン酸化物が生成しているのが確認できている。 In this example, after immersing in an aqueous solution obtained by adding 0.4 wt% sodium tungstate as an additive to 0.02 M lanthanum sulfate solution as the first stage treatment, 1 wt% BTESPT (water as a hydrolyzing agent) for the second stage treatment Al was immersed in an ethanol solution. After the second stage treatment, the sample is subjected to heat treatment at 100 ° C. for 1 h. The corrosion current density in a 3.5 wt% NaCl solution is less than 0.001 μA / cm 2 (below detection limit), and the pitting potential is 35 mV. Compared to Comparative Example 1, the corrosion current density is lowered and the pitting potential is shifted to the noble side by several hundred mV or more, so it can be said that the corrosion resistance is remarkably improved by this treatment. It has been confirmed that lanthanum oxide containing tungsten is formed on Al.
(比較例9)
本比較例は、実施例13の一段処理の硝酸セリウム浸漬の代わりに過酸化水素溶液浸漬に変えた場合である。これは、過酸化水素によりAl表面上に自然酸化膜以上の厚さの酸化物を形成させている。二段目処理後に試料には、100℃、1hの熱処理を実施している。腐食電流密度が比較例1よりわずかに低下するものの孔食電位はほとんど変化していなく、本実施例ほどの耐食性向上は見られない。これは、Al酸化物を形成させるより、希土類の酸化物を形成させた方が耐食性が高くなることを示している。
(Comparative example 9)
This comparative example is a case where it was changed to hydrogen peroxide solution immersion instead of the cerium nitrate immersion of the one-step process of Example 13. This is because hydrogen peroxide forms an oxide having a thickness greater than that of the natural oxide film on the Al surface. After the second stage treatment, the sample is subjected to heat treatment at 100 ° C. for 1 h. Although the corrosion current density is slightly lower than Comparative Example 1, the pitting potential is hardly changed, and the corrosion resistance improvement as in this Example is not observed. This indicates that the formation of the rare earth oxide has higher corrosion resistance than the formation of the Al oxide.
(比較例10)
本比較例は、比較例9と同様に一段処理に、恒温恒湿度にAlを保持して表面に酸化物および水酸化物を形成させた場合である。二段目処理後に試料には、100℃、1hの熱処理を実施している。腐食電流密度が比較例1よりわずかに低下するものの孔食電位はほとんど変化していなく、本実施例ほどの耐食性向上は見られない。これは、Al酸化物を形成させるより、希土類の酸化物を形成させた方が耐食性が高くなることを示している。
(Comparative example 10)
This comparative example is a case where Al is held at a constant temperature and humidity and an oxide and a hydroxide are formed on the surface in the one-step process as in Comparative Example 9. After the second stage treatment, the sample is subjected to heat treatment at 100 ° C. for 1 h. Although the corrosion current density is slightly lower than Comparative Example 1, the pitting potential is hardly changed, and the corrosion resistance improvement as in this Example is not observed. This indicates that the formation of the rare earth oxide has higher corrosion resistance than the formation of the Al oxide.
表3は、各処理を施した場合の浸漬試験結果を示したものである。 Table 3 shows the immersion test results when each treatment was applied.
実施例19~30は、それぞれNo.2~9(表1のNo.)およびNo.21~24(表2のNo.)の処理を施した試料の浸漬試験結果を示す。いずれの場合も、孔食は観察されず良い耐食性を示す。 In Examples 19 to 30, each of the Nos. 2 to 9 (No. in Table 1) and No. 2 The immersion test results of the samples subjected to the treatments of 21 to 24 (No. in Table 2) are shown. In any case, pitting corrosion is not observed and exhibits good corrosion resistance.
いずれの実施例も、希土類化合物やシランカップリング剤は一つのみを使用しているが、それぞれ複数の化合物を混合させても、同様の結果を得ることができる。たとえば硝酸セリウムだけでなく、硝酸セリウムと硝酸イットリウムの混合、硝酸セリウムと塩化セリウムの混合。また、BTSEだけでなく、BTSEとBTESPTとの混合等も有効である。 In any of the examples, only one rare earth compound and one silane coupling agent are used, but similar results can be obtained by mixing a plurality of compounds. For example, not only cerium nitrate, but also a mixture of cerium nitrate and yttrium nitrate, a mixture of cerium nitrate and cerium chloride. In addition to BTSE, a mixture of BTSE and BTESPT is also effective.
以下、本発明の効果について説明する。 The effects of the present invention will be described below.
本発明によれば、金属に対して、金属とシランカップリング層との間に、希土類で構成される酸化物または水酸化物の中間層を挟んだ構成にすることにより、耐食性、特に耐孔食性に優れた、しかも金属表面の機能をそのまま有する表面を与えることを実現できる。 According to the present invention, corrosion resistance, in particular, the resistance to holes, is achieved by providing an intermediate layer of an oxide or hydroxide composed of a rare earth element between a metal and a silane coupling layer, with respect to the metal. It can be realized to provide a surface that is excellent in corrosion resistance and still has the function of the metal surface.
また、本発明によれば、遷移金属およびそれらの合金に対して、金属表面に希土類の酸化物または水酸化物を形成させ、更にその上層にシランカップリング剤で処理することにより、無機-有機複合積層皮膜を形成することにより、耐食性、特に耐孔食性に優れた、しかも金属表面の機能をそのまま有する表面を与えることを実現できる。これは、薄膜を意識して開発した技術であるが、当然肉厚のバルク材料の耐食性向上にも使用することが可能である。 Further, according to the present invention, an inorganic-organic organic compound is formed by forming an oxide or hydroxide of a rare earth on the metal surface of the transition metal and their alloys and further treating the upper layer with a silane coupling agent. By forming the composite laminated film, it is possible to provide a surface which is excellent in corrosion resistance, particularly pitting resistance, and which has the function of the metal surface as it is. Although this is a technology developed with a thin film in mind, it can of course also be used to improve the corrosion resistance of thick bulk materials.
1:金属基材、2:中間層、3:シランカップリング層。 1: Metal substrate, 2: Intermediate layer, 3: Silane coupling layer.
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| JPWO2022039043A1 (en) * | 2020-08-20 | 2022-02-24 |
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| JPS63183178A (en) * | 1987-01-23 | 1988-07-28 | Nippon Denkai Kk | Copper foil for printed circuit and production thereof |
| JP2005344147A (en) * | 2004-06-01 | 2005-12-15 | Jfe Steel Kk | Organic resin-coated steel material and method for producing the same |
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| JPS63130796A (en) * | 1986-11-21 | 1988-06-02 | Kawasaki Steel Corp | Composite chemical conversion coating steel sheet having excellent corrosion resistance and paint adhesion and production thereof |
| JPS63183178A (en) * | 1987-01-23 | 1988-07-28 | Nippon Denkai Kk | Copper foil for printed circuit and production thereof |
| JP2005344147A (en) * | 2004-06-01 | 2005-12-15 | Jfe Steel Kk | Organic resin-coated steel material and method for producing the same |
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| JP2020143360A (en) * | 2019-02-28 | 2020-09-10 | 奥野製薬工業株式会社 | Zinc-based composite plating liquid, method for forming zinc-based composite plating film, and method for forming composite oxide film |
| JP7417888B2 (en) | 2019-02-28 | 2024-01-19 | 奥野製薬工業株式会社 | Zinc-based composite plating solution, method for forming zinc-based composite plating film, and method for forming composite oxide film |
| JPWO2022039043A1 (en) * | 2020-08-20 | 2022-02-24 | ||
| JP7728266B2 (en) | 2020-08-20 | 2025-08-22 | 株式会社ダイセル | silane coupling agent |
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