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WO2015049406A1 - Lentille anti-réflets pour lunettes et procédé de fabrication de ladite lentille - Google Patents

Lentille anti-réflets pour lunettes et procédé de fabrication de ladite lentille Download PDF

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Publication number
WO2015049406A1
WO2015049406A1 PCT/ES2014/070753 ES2014070753W WO2015049406A1 WO 2015049406 A1 WO2015049406 A1 WO 2015049406A1 ES 2014070753 W ES2014070753 W ES 2014070753W WO 2015049406 A1 WO2015049406 A1 WO 2015049406A1
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WIPO (PCT)
Prior art keywords
lens
holes
pattern
interference
manufacturing
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Ceased
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PCT/ES2014/070753
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English (en)
Spanish (es)
Inventor
Jesús Lama Ochoa De Retana
Guillermo ROMÁN PÉREZ
Alejandro GONZÁLEZ SOLAR
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SGENIA SOLUCIONES
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SGENIA SOLUCIONES
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Filing date
Publication date
Application filed by SGENIA SOLUCIONES filed Critical SGENIA SOLUCIONES
Publication of WO2015049406A1 publication Critical patent/WO2015049406A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • G—PHYSICS
    • G02—OPTICS
    • G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
    • G02C7/00—Optical parts
    • G02C7/02—Lenses; Lens systems ; Methods of designing lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Definitions

  • the present invention relates to the field of design and manufacture of refractive optical elements and, more specifically, to a lens for glasses with anti-reflective properties.
  • Every refractive optical element has limitations in the light that it is capable of transmitting due to losses due to reflection on its surfaces. These losses are dependent on the angle of incidence and the wavelength of the light radiation, being able to compromise or limit the functionality of the element.
  • this problem is present in all types of glasses for glasses, be they prescription glasses with corrective lenses, safety or security glasses, sunglasses, etc.
  • the reflections generated cause glare and glare, even to the lens user.
  • various alternatives for the manufacture of anti-reflective (AR) crystals have been developed in the state of the art.
  • the layer deposition process is carried out in a vacuum chamber in which the different materials are deposited sequentially, thus generating the coatings.
  • the largest possible number of components are introduced into the chamber.
  • materials, thicknesses and number of layers to be used are solved. It is also necessary to include other layers that favor adhesion and avoid the reactivity of elements.
  • phase adjusting element which causes a phase delay along the longitudinal axis. It is composed of several separate patterns, optically transparent sections with different refractive index and / or thicknesses, and therefore affects the phase of the beam passing through the device.
  • the phase adjusting element contains at least one region in which nanostructures are placed, which inhibit the movement of microfluids in the adjusting element (in ophthalmological applications, the presence of liquid tear in the eye can create great uncertainties regarding the refractive index around an adjusting element).
  • the lens is mainly formed by two regions with different relative depths, comprising triangular nanostructures, cylindrical, rectangular configurations or random shapes.
  • the methodology to form the nanostructures requires the use of a mask to perform the pattern on the surface of the lens and then make an etching, as in traditional lithographic processes.
  • Another methodology used is a direct deposition or growth of nanostructures on the surface. These methodologies are based on the gradual deposition of material that is in a fluid so that columnar or dendritic growth occurs normal to the surface.
  • US-2012/0176681 -A1 presents a method to create anti-reflective layers from nanostructures in the form of pyramids, using the precipitation of nanoparticles by means of a chemical bath deposition (CBD) and a technique of plasma etching (from English, "plasma etching").
  • CBD chemical bath deposition
  • plasma etching from English, "plasma etching”
  • the device comprises an anti-reflective film formed by several layers of different materials and nanoparticles, including reactive solutions and a hard coating (in English "hard coating”) in some cases.
  • a process of deposition of various reactive solutions is contemplated to achieve an anti-reflective device, requiring the application of thermal, chemical, plasma, electrochemical, a combination of these or other equivalent type.
  • CBD technique has significant drawbacks, such as particle formation and unwanted depositions, which consequently generate waste and cause defects in the system.
  • the high number of steps involved in the described methodologies including alternative application of various solutions and drying processes, gives rise to expensive manufacturing processes, difficult to control, and prolonged over time.
  • Electron beam lithography involves providing different materials in the manufacturing process: a pattern (a glass lens), a layer of resin that will be irradiated, chemicals for the development process and a UV-curable photoresist. Manufacturing requires the deposition of a resin, exposure to a laser to form the latent pattern, the development of the latent pattern, the engraving of the pattern and the deposition of a UV-curable photoresist.
  • the technique has the clear advantage of not requiring the use of a mask, there are different problems that arise from it.
  • the technique presents low efficiency due to the high operating and exposure time required, as well as the need to use a high current intensity to achieve a good resolution.
  • another clear disadvantage is the long duration of the manufacturing process of the device, having to achieve the previous vacuum in the chamber before starting the deposition. The entire process described implies an unfailing increase in manufacturing cost and is associated with the acquisition and handling of complex machinery with high maintenance requirements.
  • US-8192639-B2 proposes the creation of a porous anti-reflective surface by plasma polymerization.
  • organic precursor compounds are activated by plasma in a vacuum chamber, causing the dissociation of ionized molecules and molecular fragments in the form of chains.
  • the condensation of these dissociated fragments on the surface is achieved by decreasing the temperature of the chamber or by bombardment of electrons and ions, polymerization and therefore the formation of a coating.
  • the desired anti-reflective behavior is obtained.
  • plasma etching plasma etching
  • the requirements of this technique are numerous.
  • One of the most significant disadvantages is the need for a vacuum system to perform plasma polymerization.
  • Another disadvantage of performing the nanostructures through this technique is the complexity involved in a process that uses plasma. The influence of the process parameters on the chemical composition of the resulting polymers makes it impossible to know the geometry of these a priori, unless they are conventional polymers easily determined to be based on a monomer.
  • Nanostructures created by plasma etching can be performed on plastic materials, such as Polymethylmethacrylate (PMMA) compounds, but it is a technique that does not It can be used directly in harder materials, such as glass or quartz, which means a reduction in the range of materials that can be used to make the lenses with anti-reflective properties for glasses.
  • PMMA Polymethylmethacrylate
  • This technique also implies the use of several materials, needing to apply a thin layer of photoresin prior to etching, a feature that weakens it both due to the expense of material involved, as well as the increase in steps necessary to obtain the desired multilayer structure.
  • the present invention solves the problems described above by means of an anti-reflective lens for glasses whose outer and / or inner surface comprises a plurality of holes of nanometric size (also referred to herein as 'nano-holes') generated by the use of nanofabrication-based techniques in laser interference. These holes are arranged together with a nanometric separation, and are distributed on the surface of the lens following at least one periodic pattern. These nano-sized holes prevent diffraction on the surface by canceling transverse components and generate a smoother refractive index transition that reduces reflection losses.
  • nanometric size also referred to herein as 'nano-holes'
  • the lens with anti-reflective properties of the invention avoids the need for additional layers of other materials, or processes of deposition or growth of hard-to-control nanostructures that give rise to surface imperfections, thus simplifying the lens manufacturing process .
  • the nanostructures that make up these patterns imply a recess to the surface of the lens. That is, the nanostructures may comprise holes, crevices, gaps, depressions, as well as any equivalent element that involves a reduction of the substrate material, or any combination of the above elements.
  • the lens preferably made of a single material - such as a mineral material, a polycarbonate, an organic polymer or a combination of organic polymers - implements the possible refractive and diffractive properties of the lens, such as for example the eye lens correction in prescription glasses , or selective filtering of wavelengths in protective glasses. And on one of its surfaces, or on both, a plurality of holes of nanometric size are engraved, following one or more periodic patterns.
  • the holes of nanometric size that make up said one or more periodic patterns imply a recess of the lens surface; that is, these nano-holes may comprise grooves, gaps, depressions, as well as any equivalent element that involves a reduction of the substrate material, or a combination of the above elements.
  • the nanometric holes are etched by exposure to an interference pattern formed by at least two coherent laser beams.
  • the nanometric holes can be engraved on the surface or surfaces - external and / or internal - of the lens by photolithography or by laser ablation.
  • the separation between the nano-holes is between 0.1 times and 1.5 times the wavelength of the incident radiation for which the anti-reflective behavior is designed.
  • the maximum depth and / or aperture of the nano-holes, or both are comprised between 0.1 times and 1.5 times the wavelength of the incident radiation for which the anti-reflective behavior is designed.
  • the wavelengths in the visible light spectrum must be taken into account.
  • the nanostructures are at least periodic in one dimension - well its width, its length, or both - in a nanometric range.
  • the nano holes are a set of holes distributed in a matrix way.
  • the two-dimensional periodicity can be presented in a triangular, quadrangular, rhomboidal mesh or other geometric configurations. It is possible to combine two or more patterns on the same anti-reflective surface.
  • the lens substrate is formed by a single homogeneous material selected from: a mineral material, a polycarbonate, an organic polymer and a combination of organic polymers.
  • a second aspect of the present invention relates to a method of manufacturing an anti-reflective lens for glasses, comprising:
  • the resulting lens has anti-reflective properties due to the distribution according to a periodic pattern of nanometric holes, separated by a distance of nanometric size (according to the pattern), and is a lens formed of a single material.
  • the periodic pattern is preferably an interferential pattern of peaks and valleys of energy formed by at least two coherent laser beams, which is applied on the surface of the lens to record the plurality of nano-holes.
  • the manufacturing process preferably comprises the following steps:
  • the substrate is not directly exposed to the interference pattern, but the photoresist acts as a photoreactive element, while the nano-holes are chemically implemented.
  • the in-depth profile of the nanostructures is mostly rectangular.
  • the substrate itself is directly exposed to the interference pattern, so that variations in intensity along its surface cause the surface to recess following the desired pattern.
  • the nano-holes have a mostly sinusoidal profile, following the distribution of light intensity.
  • the laser light used for recording the nano holes is preferably ultraviolet radiation. More preferably, and in order to reduce the size of the holes, the ultraviolet radiation is extreme ultraviolet radiation (EUV), with a wavelength between 10 and 100 nm.
  • EUV extreme ultraviolet radiation
  • the lens and the manufacturing process described therefore provide anti-reflective properties to the lens itself, without requiring the deposition of additional layers that can reduce the resistance of the optical element against scratches and scaling. Also, since they are nano-holes resulting from the extraction of surface material, instead of nanostructures deposited by chemical processes, the resulting structures are much more precise and have less impurities. In addition, the pattern is ordered so that there are no irregularities in its properties, it is homogeneous and repeatable. The procedure is relatively simple, with fewer manufacturing steps than those mentioned above and applicable to an industrial environment.
  • Figures 1 A, 1 B, 1 C and 1 D show the steps of the recording process by photolithography of an anti-reflective lens, in accordance with a particular implementation of the invention.
  • Figure 2 shows the process of recording by laser ablation of an anti-reflective lens, according to a particular implementation of the invention.
  • Figure 3A shows the appearance of a combination of two patterns generated by laser interference in a particular implementation of the invention.
  • Figure 3B shows the implementation in a polymeric material of another embodiment that combines two patterns.
  • Figures 4A and 4B show the result of the examples of the preferred embodiment of this invention by ablation by direct interference in a polymeric material, obtained through an atomic force microscope profilometry.
  • Figure 5 presents an example of a nanostructured anti-reflective lens based on a matrix distribution of nano-holes according to a particular implementation of the invention.
  • the scope of the invention is not limited to prescription eyewear, but can be used on any type of glasses, such as sunglasses, protection, etc. Also, the invention is not limited to the range of visible wavelengths, but can be applied to designs optimized for any particular range of optical frequencies, both inside and outside the visible one. Both manufacturing processes considered in the invention are based on the generation of a pattern of light intensity with peaks and valleys thanks to the interference of two or more coherent beams. The radiation intensity distribution when two beams that have a phase coherence interfere is distributed as follows:
  • j i being l T (r) the radiation intensity at a point E ⁇ and E the maximum value of the electric field of each beam at the interference, k ⁇ and k the beam direction vector, the position vector of the point at which interferes, and 12 the differential polarization vector between both interfered beams and N the number of beams involved in the interference.
  • the same initial beam is usually used, which is separated and subsequently assembled.
  • the pattern can be modified to obtain complex structures by various techniques that include, for example, the variation of the angles of incidence and azimuth of each of the beams, the polarization; and the modification of the number of interference beams for the design of the type of structure obtained.
  • a striped pattern is obtained when two beams are used, hexagonal geometries using three beams, 3D modulations by using non-periodic beams or patterns including a diffuser for higher multiplicities.
  • uras 1A, 1 B, 1 C and 1 D present a particular implementation of the process of manufacturing by photolithography of the invention, which in turn results in a particular implementation of the anti-reflective lens for glasses of the invention.
  • Laser interferometry lithography is a methodology for constructing periodic structures combining photolithography with laser interference.
  • light from a source is divided and subsequently recombined forming a periodic intensity interference pattern that can be recorded by exposure to a photosensitive substrate. This process does not require the use of masks, and is based on the activation of a photoresist through an interference pattern generated by two or more spatially coherent beams of light.
  • the manufacturing process begins with the cleaning of the substrate 1 and the deposition of the photoresist 2, in the configuration shown in Figure 1 A.
  • the substrate 1 of a single homogeneous material, performs the optical functions of a lens 10 of glasses, and does not comprise additional anti-reflective layers of other materials.
  • the substrate 1 is made of mineral materials, polycarbonates, one or more organic polymers, or homogeneous combinations of multiple polymers.
  • a low porosity of the material is desirable, to allow the recording of smaller nanostructures, although said size is usually limited by the geometry and properties of the engraving technique.
  • Photoresin 2 in turn, is a radiation-sensitive polymer, so that its physical-chemical conditions can be altered by being exposed to a particular radiation.
  • the photoresin 2 can be both an organic and inorganic resin.
  • the deposition can be performed, for example, by centrifugation techniques ("spin coating").
  • spin coating Typically, after the deposition of photoresin 2 an evaporation process is applied to remove excess solvents and form a thin layer of polymer. This stage plays an important role in the process, since an excessively soft cooking will prevent the light from reaching the sensitive regions because it will remain excessively solvent, causing a low resistance to engraving.
  • Figure 1 B the exposure of the photoresist 2 to an interference pattern 3 generated by interference of two or more coherent laser beams is shown.
  • the figure depicts an interference pattern 3 of sinusoidal profile corresponding to the interference of two monochromatic flat wave fronts. It is possible to rotate or displace the substrate 1 and radiate it intermittently to expose the largest possible area. As a result, a latent pattern is formed on the sample that follows the path of the laser beam.
  • This interference pattern defines a periodic modulation in the topography of the substrate used, in this case, the surface of a lens 10.
  • This procedure consists in the application of natural solvents that do not damage the lens material at a temperature slightly higher than the melting temperature on the previously irradiated photoresin 2.
  • the irradiated areas will tend to increase their solubility by applying the developer solution, while if they are negative photoresists, the exposed areas will decrease their solubility when revealed.
  • the development can be carried out either by immersion, either by a spray technique or by other similar techniques. Regardless of the method used, it should always be accompanied by a thorough rinse and drying to ensure that the development action does not continue once the developer is removed from the surface.
  • the irradiated photoresin 2 areas are resistant to chemical etching, while the non-irradiated areas are sensitive to attack.
  • This chemical etching is done with agents such as NaOH that attacks the lens material mainly in the direction of the holes. That is, while in the irradiated areas the substrate 1 is protected by the resin 2, in the non-irradiated areas, both the photoresist 2 and the substrate are etched, giving rise to periodic patterns of nanostructures or nano-holes 4.
  • Figure 1 D shows the final result after removing the excess photoresin 2.
  • the photoresin is removed by take-off techniques (known as “lift off”) or cleaning known in the state of the art.
  • the following illustrates a first example of generating a triangular mesh with a period of 720 nm in both directions, using laser lithography by interference in a mineral material.
  • a GaN semiconductor source with a wavelength of 404 nm was used. He The process followed the following phases: deposition of a layer between 150-200 nanometers of positive resin and evaporation. Laser exposure between 15 and 45 seconds with 7mW emission power. Relative rotation of 120 s of the sample and new exposure of the same duration and irradiated power. Revealed for 70 s in NaOH. Waste cleaning Configuration of two beams perpendicular to the sample with an incidence of 14-18 e . Holes 100 nm deep were achieved with diameters between 300 and 500 nm.
  • Figure 2 shows a particular implementation of the laser ablation manufacturing process of the invention, which in turn gives rise to a particular implementation of the anti-reflective lens for glasses of the invention.
  • the texturing of the surface of the substrate 1 is performed by direct ablation of pulsed lasers of high pulse energy by the interference of two or more beams 5.
  • the peaks exceed the threshold of ablation of the material which causes a removal of surface material by evaporation and ionization. Therefore, the process is initiated by the interaction between the radiation of the laser beam and the lens surface, producing energy absorption, the location of heat at a point on the surface and the consequent evaporation of material.
  • the energy converted into heat that is not used in the ablation remains residual in the material, producing melting-ablation processes, which in the case of polymers can cause small elevations or displacements of material.
  • This formula can be used assimilating that in the interference infinite foci or peaks of light are generated throughout the pattern.
  • an engraving rate (pulse engraving depth) d (F) is achieved.
  • These ablation parameters are: the effective absorption coefficient, at eff , the creep threshold, F th , and the ablation creep, F.
  • the rate at which the engraving is performed (10 "9 m / pulse), comes defined by:
  • the ablation threshold will be lower.
  • high coherence or reduced bandwidth laser sources are used.
  • Laser ablation implies a series of benefits compared to photolithography techniques. As it is a direct exposure technique, it avoids the use of the mask and the development process. It means a reduction in costs since the texturing is done in a single step, without adding other materials. Another substantial advantage is the high speed of texturing, which allows high productivity and the creation of a productive process for mass manufacturing. In addition, this technique avoids the generation of waste, with the productive and safety advantages that this implies. This technology makes the surface behavior more regular with the light and independent of the crystallographic orientation of the grains, compared to the chemical texturing.
  • FIG. 3A A first embodiment of the invention is shown in Figure 3A in which two patterns generated by laser interference are combined.
  • a first periodic pattern 31 of slits 41 (scratched surface in Figure 3A) is generated by laser interference in one dimension, and on this first pattern 31 a second pattern 32 of two-dimensional periodic nano-holes 42 is made arranged in a square mesh
  • the nano-holes 42 are etched following the second square mesh pattern 32 both on the surface of the substrate 1 (shown in white in Figure 3 a ) and on the bottom of the slits 41.
  • FIG. 4A A second example of generating a periodic triangular mesh pattern 33 (Fig. 4A) with a period of 800 nm in both directions is briefly explained below, using direct ablation by interference in a polymeric material. Nano-holes 43 of 300-400 nm in diameter with 200-300 nm depth were achieved.
  • Nd YAG ultraviolet laser source
  • 4 e harmonic wavelength 266 nm
  • pulse duration between 6-4 nanoseconds.
  • the process parameters were: Irradiation of 1 .8 W / cm 2 with 3 equalized beams at an angle of incidence between 12-16 e and maximum contrast.
  • Figure 4A shows the result of implementing this second example of triangular mesh pattern 33 generated by three beams on the surface of a polymeric substrate 1.
  • a periodic pattern 34 of slits 44 is generated periodically in a single dimension by means of two beams that interfere in a plane perpendicular to the surface of the substrate.
  • Pattern 34 has a periodic structure in a direction with a period of 1.2 nm and is etched on the surface of the substrate 1 of polymeric material using direct interference ablation (Fig. 4B). Depths of 200 nm were achieved.
  • an Nd: YAG ultraviolet laser source was used, working on its 4 e harmonic (wavelength 266 nm) and pulse duration between 6-4 nanoseconds.
  • the process parameters were: Irradiance of 0.9 W / cm 2 with 2 equalized beams at an angle of incidence between 16-20 e and relative polarizations transversible to the surface.
  • Figure 4B shows the result of implementing this pattern of grooves 34 in a single dimension on the surface of the substrate 1 of polymeric material.
  • Figure 5 shows an example in which a matrix pattern of circular nano-holes is implemented, which therefore presents a two-dimensional periodicity. Note, however, that the pattern pitch can be varied within a wide range, and allows a pattern projection in dimensions smaller than those attainable by conventional lithography techniques of exposure to the same wavelength.
  • the person skilled in the art may understand that the invention has been described according to some preferred embodiments thereof, but that multiple variations can be introduced in said preferred embodiments, without departing from the object of the invention such and as claimed.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • General Health & Medical Sciences (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

L'invention concerne une lentille (10) aux propriétés anti-reflets pour lunettes caractérisée en ce qu'au moins une surface de ladite lentille comprend une pluralité de trous (4, 41, 42, 43) de taille nanométrique, lesdits trous (4, 41, 42, 43) étant disposés les uns par rapport aux autres avec une séparation nanométrique et répartis selon au moins un modèle périodique (3, 31, 32, 33, 34), et en ce que les trous (4, 41, 42, 43) sont gravés par interférence laser. L'invention concerne aussi un procédé de fabrication d'une lentille (10) aux propriétés anti-reflets pour lunettes.
PCT/ES2014/070753 2013-10-02 2014-10-02 Lentille anti-réflets pour lunettes et procédé de fabrication de ladite lentille Ceased WO2015049406A1 (fr)

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ESP201331450 2013-10-02
ES201331450 2013-10-02

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WO2015049406A1 true WO2015049406A1 (fr) 2015-04-09

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105549342A (zh) * 2016-03-08 2016-05-04 佛山市国星半导体技术有限公司 一种紫外激光光刻方法
CN105549343A (zh) * 2016-03-08 2016-05-04 佛山市国星半导体技术有限公司 一种光刻装置
CN111913337A (zh) * 2019-05-09 2020-11-10 中强光电股份有限公司 波长转换元件及其制作方法

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Publication number Priority date Publication date Assignee Title
US4013465A (en) * 1973-05-10 1977-03-22 Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Reducing the reflectance of surfaces to radiation
FR2772302A1 (fr) * 1997-12-11 1999-06-18 Essilor Int Procede d'obtention d'une lentille ophtalmique comportant une microstructure utilitaire en surface et lentilles ophtalmiques ainsi obtenues
US20050094277A1 (en) * 2003-10-30 2005-05-05 Niyaz Khusnatdinov Microtextured antireflective surfaces with reduced diffraction intensity
US20110102900A1 (en) * 2008-07-16 2011-05-05 Sony Corporation Optical element
US8192639B2 (en) * 2008-04-15 2012-06-05 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E. V. Reflection-reducing interference layer system and method for producing it
US20120259411A1 (en) * 2011-04-07 2012-10-11 Novartis Ag Optical structures with nanostructre features and methods of use and manufacture

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4013465A (en) * 1973-05-10 1977-03-22 Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Reducing the reflectance of surfaces to radiation
FR2772302A1 (fr) * 1997-12-11 1999-06-18 Essilor Int Procede d'obtention d'une lentille ophtalmique comportant une microstructure utilitaire en surface et lentilles ophtalmiques ainsi obtenues
US20050094277A1 (en) * 2003-10-30 2005-05-05 Niyaz Khusnatdinov Microtextured antireflective surfaces with reduced diffraction intensity
US8192639B2 (en) * 2008-04-15 2012-06-05 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E. V. Reflection-reducing interference layer system and method for producing it
US20110102900A1 (en) * 2008-07-16 2011-05-05 Sony Corporation Optical element
US20120259411A1 (en) * 2011-04-07 2012-10-11 Novartis Ag Optical structures with nanostructre features and methods of use and manufacture

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105549342A (zh) * 2016-03-08 2016-05-04 佛山市国星半导体技术有限公司 一种紫外激光光刻方法
CN105549343A (zh) * 2016-03-08 2016-05-04 佛山市国星半导体技术有限公司 一种光刻装置
CN105549342B (zh) * 2016-03-08 2019-01-08 佛山市国星半导体技术有限公司 一种紫外激光光刻方法
CN111913337A (zh) * 2019-05-09 2020-11-10 中强光电股份有限公司 波长转换元件及其制作方法
US11199762B2 (en) 2019-05-09 2021-12-14 Coretronic Corporation Wavelength conversion element having anti-reflective layer with pores and manufacturing method thereof

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