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WO2014122049A1 - Séparation de composés de métaux ou métalloïdes par complexation à partir de la phase gazeuse - Google Patents

Séparation de composés de métaux ou métalloïdes par complexation à partir de la phase gazeuse Download PDF

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Publication number
WO2014122049A1
WO2014122049A1 PCT/EP2014/051665 EP2014051665W WO2014122049A1 WO 2014122049 A1 WO2014122049 A1 WO 2014122049A1 EP 2014051665 W EP2014051665 W EP 2014051665W WO 2014122049 A1 WO2014122049 A1 WO 2014122049A1
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WIPO (PCT)
Prior art keywords
metal
gas
metalloid
donor
compound
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Ceased
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PCT/EP2014/051665
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German (de)
English (en)
Inventor
Michael KRAYER
Günther Huber
Jesus Enrique ZERPA UNDA
Jasmina Kessel
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BASF SE
Original Assignee
BASF SE
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Publication of WO2014122049A1 publication Critical patent/WO2014122049A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/191—Hydrogen fluoride
    • C01B7/195—Separation; Purification
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/04—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising compounds of alkali metals, alkaline earth metals or magnesium
    • B01J20/046—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising compounds of alkali metals, alkaline earth metals or magnesium containing halogens, e.g. halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/56—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by contacting with solids; Regeneration of used solids
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00—Boron; Compounds thereof
    • C01B35/06—Boron halogen compounds
    • C01B35/061—Halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/01—Chlorine; Hydrogen chloride
    • C01B7/07—Purification ; Separation
    • C01B7/0706—Purification ; Separation of hydrogen chloride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/01—Chlorine; Hydrogen chloride
    • C01B7/07—Purification ; Separation
    • C01B7/0743—Purification ; Separation of gaseous or dissolved chlorine
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
    • C22B7/001—Dry processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/26—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/60—Heavy metals or heavy metal compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
    • C01B2203/04—Integrated processes for the production of hydrogen or synthesis gas containing a purification step for the hydrogen or the synthesis gas
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
    • C01B2203/04—Integrated processes for the production of hydrogen or synthesis gas containing a purification step for the hydrogen or the synthesis gas
    • C01B2203/0465—Composition of the impurity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

Definitions

  • the present invention relates to a process for the removal of gas phase metal or metalloid compounds M.
  • the present invention relates to a device suitable for carrying out this method.
  • the desired reaction products especially in the case of volatile compounds but also by-products in the gas phase, often as a mixture together with starting materials in the gas phase, also herein Called educts.
  • reaction products, by-products and reactants must then be separated from each other, inter alia, to avoid deposits of the metal or metalloid at colder sites of the reaction system or réeller- agree on the gaseous reactants.
  • metal or metalloid compounds examples include the preparation of halides, for example chlorides or bromides, of the metals or metalloids of groups 12, 13 and 14 of the Periodic Table of the Elements, such as zinc, boron, aluminum, silicon, tin or the like of the iron from the corresponding metals or metalloids and elemental halogens such as chlorine, bromine or iodine.
  • halides for example chlorides or bromides
  • the metals or metalloids of groups 12, 13 and 14 of the Periodic Table of the Elements such as zinc, boron, aluminum, silicon, tin or the like of the iron from the corresponding metals or metalloids and elemental halogens such as chlorine, bromine or iodine.
  • Metal or metalloid compounds are usually "electronically unsaturated” and thus able to bind an electron donor as a lingand. These electronically unsaturated compounds are also referred to in the art as “Lewis acids”, and the electron donors as “ Lewis bases. "The reaction products of Lewis acids and Lewis bases are also referred to as” Lewis acid / Lewis base adducts "or metal complexes or metalloid complexes. The Lewis bases are part of the ligands in such metal or metalloid complexes.
  • WO 00 / 56659A1 describes the formation of a metal complex, namely sodium tetrachloroaluminate (NaAlCU) by reaction of sodium chloride (NaCl) with aluminum trichloride (AICI 3 ) at a temperature between 156 ° C and 180 ° C.
  • NaAlCU sodium tetrachloroaluminate
  • AICI 3 aluminum trichloride
  • Metals within the meaning of the present application are all metals of the Periodic Table of the Elements, preferably those which form chemical compounds, preferably halides, for example chlorides, which are Lewis acids.
  • the metals are particularly preferably selected from groups 4, 8, 12, 13 and 14 of the Periodic Table of the Elements, for example titanium, iron, zinc, cadmium, mercury, aluminum, gallium, indium and tin.
  • Metalloids in the sense of the present application are selected from the group boron, silicon, germanium, arsenic, selenium, antimony and tellurium. These are also referred to in science as "semi-metals”.
  • the metalloids which form chemical compounds are preferably halides, for example chlorides, which are Lewis acids.
  • the metalloids are particularly preferably boron, silicon and germanium.
  • Metal or metalloid compounds M are chemical compounds, preferably binary chemical compounds, of the metals or metalloids as described herein and a chemical element or ligand group.
  • the metal or metalloid M compounds are volatile, which usually means that they have a vapor pressure of more than 30 mbar in the temperature range of 100 to 500 ° C.
  • Highly suitable metal or metalloid compounds M are the corresponding halides, preferably binary halides, preferably fluorides, chlorides, bromides, particularly preferably chlorides, all of which are generally present under the reaction conditions according to the invention virtually without water of crystallization or similar adduct-forming compounds.
  • Examples of highly suitable metal or metalloid halides are those of the formula (I) Met X n (I) where Met metals or metalloids, preferably metals of groups 4, 8, 12, 13 and 14 of the Periodic Table of the Elements, more preferably titanium, iron , Zinc, aluminum, gallium, indium, tin or the metalloids boron and preferably silicon; X is halogen, preferably fluorine, chlorine, bromine, more preferably chlorine, and n has the numerical value of the formal oxidation number of the metal or metalloid in the formula (I), for example 2, 3 or Examples of metal or metalloid halides (I) are:
  • Titanium IV chloride TiCU
  • ferric chloride FeC
  • zinc dichloride ZnC
  • aluminum trichloride AlC
  • boron trichloride BCI 3
  • boron trifluoride BF 3
  • silicon tetrachloride SiCU
  • tin dichloride SnC
  • tetrachloride SnCl
  • the gas G is usually practically inert to the metal or metalloid compound M, which means that it generally does not decompose the metal or metalloid compound M under the conditions of the process according to the invention.
  • the gas G may be formed by the reaction of a reactant gas with the metal or metalloid, for example, the gas G may be elemental hydrogen or contain the hydrogen, for example, by the reaction of hydrogen halide, such as hydrogen chloride, with a metal or metalloid selected from the groups 4, 8, 12, 13 and 14 of the Periodic Table of the Elements, for example aluminum was formed.
  • An exemplary hydrogen generating reaction is the reaction of aluminum with hydrogen chloride gas.
  • Gas G is also to be understood here as meaning a mixture of gaseous substances, including, inter alia, the reactant in the gaseous state, which serves as a reaction partner of the metal or metalloid to form the metal or metalloid compound.
  • the gas G may be selected from the group consisting of:
  • Halogen such as fluorine (F 2 ); Chlorine (Cl 2 ); Bromine (Br2); Noble gases, such as argon (Ar); Carbon halides such as carbon tetrachloride (CCU); Hydrogen halides, such as hydrogen chloride (HCl) and hydrogen fluoride (HF).
  • the gas G is selected from the group consisting of: chlorine (C); Hydrogen (H2); Carbon halides, such as carbon tetrachloride or hydrogen halides, such as hydrogen chloride (HCl) and hydrogen fluoride (HF).
  • the gas G is chlorine (Cb) or contains chlorine (Cb) as an essential component.
  • the donor D is a chemical compound which is solid under the conditions of the process according to the invention and as a rule can act as lewis basic complex ligand with respect to the metal or metalloid compound M.
  • the donor D is usually chosen so that its reaction with the metal or metalloid M, a compound - formally a complex compound - is formed with the lowest possible melting point.
  • the donor D is selected from the groups consisting of alkali metal compounds and / or alkaline earth metal compounds, preferably alkali metal halides, for example alkali metal chlorides and / or alkaline earth metal halides, for example alkaline earth metal chlorides, wherein in said groups as alkali metals lithium (Li), sodium (Na) or potassium (K are preferred and as alkaline earth metals magnesium (Mg) or calcium (Ca) are preferred wherein the donor D is usually chosen so that by its reaction with the metal or metalloid M a compound - formally a complex compound - is formed with the lowest possible melting point and wherein the compounds from the abovementioned groups are generally present under the reaction conditions according to the invention virtually without water of crystallization or similar adduct-forming compounds.
  • alkali metal halides for example alkali metal chlorides and / or alkaline earth metal halides, for example alkaline earth metal chlorides
  • Mg alkaline earth metals magnesium
  • Ca calcium
  • donor D lithium chloride (LiCl), sodium chloride (NaCl), lithium fluoride (LiF), potassium fluoride (KF) and magnesium chloride (MgC).
  • the process according to the invention is preferably carried out in such a way that the reaction product of metal or metalloid compound M and donor D is present in molten form, ie in liquid form, and in another embodiment the donor D is additionally selected such that its reaction with the metal or metalloid compound M is a compound - formally a complex compound - is formed with the lowest possible melting point.
  • contacting gas G, preferably volatile metal or metalloid compound M, with solid donor D is conducted at a temperature at or above the melting point of the resulting reaction product but below the melting point of donor D, preferably such temperature is chosen to be at or above the sublimation temperature of the metal or metalloid compound M.
  • the metal or metalloid compound M is a halide
  • the gas G contains a halogen or contains essentially a halogen or consists for example of halogen
  • the donor D is an alkali metal halide or alkaline earth metal halide.
  • the components M, G and D all contain the same halogen or halide, preferably chlorine or chloride or fluorine or fluoride, very particularly preferably chlorine or chloride, and in a further embodiment, the donor D is additionally chosen so that by its reaction with said metal or metalloid M compounds, a compound - formally a complex compound - is formed with the lowest possible melting point.
  • halogen or halide preferably chlorine or chloride or fluorine or fluoride, very particularly preferably chlorine or chloride
  • the donor D is additionally chosen so that by its reaction with said metal or metalloid M compounds, a compound - formally a complex compound - is formed with the lowest possible melting point.
  • the metal compound M is aluminum trichloride (AlC)
  • the gas G contains chlorine (C) or contains essentially chlorine (Cl 2) or consists for example of chlorine (Cb)
  • the donor D is an alkali metal metal halide for example, alkali metal chloride and / or bromide and / or alkali metal fluoride and / or iodide, such as sodium chloride (NaCl) and / or sodium fluoride (NaF) and / or sodium bromide (NaBr) and / or sodium iodide (Nal), preferably alkali metal chloride, sodium chloride NaCl is particularly preferred, and in another embodiment the donor D is additionally selected such that its reaction with the metal compound M aluminum trichloride (AlCb) forms a compound-formally a complex compound-with the lowest possible melting point.
  • the metal compound M is iron-III chloride (FeC)
  • the gas G contains chlorine (Cb) or contains essentially chlorine (Cl 2) or consists for example of chlorine (Cb)
  • the donor D is an alkali metal halide, for example, alkali metal chloride and / or bromide and / or alkali metal fluoride and / or iodide, such as sodium chloride (NaCl) and / or sodium fluoride (NaF) and / or sodium bromide (NaBr) and / or sodium iodide (Nal ), preferably alkali metal chloride, more preferably sodium chloride NaCl
  • the donor D is additionally selected so that by its reaction with the metal compound M ferric chloride (FeC) a compound - formally a complex compound - with the lowest possible melting point is formed.
  • the metalloid compound M is boron trichloride (BCI3)
  • the gas G contains chlorine (Cb) or contains essentially chlorine (C) or consists for example of chlorine (Cb)
  • the donor D is an alkali metal metal halide, for example alkali metal chloride and / or bromide and / or alkali metal fluoride and / or iodide, such as sodium chloride (NaCl) and / or sodium fluoride (NaF) and / or sodium bromide (NaBr) and / or sodium iodide (Nal)
  • the donor D is additionally selected such that its reaction with the metalloid compound M boron trichloride (BCI3) forms a compound-formally a complex compound-with the lowest possible melting point.
  • the metalloid compound M is boron trifluoride (BF3)
  • the gas G contains fluorine (F2) or essentially contains fluorine (F2) or consists for example of fluorine (F2)
  • the donor D is a Alkali metal halide, for example, alkali metal chloride and / or bromide and / or alkali metal fluoride and / or iodide, such as lithium chloride (LiCl) and / or lithium fluoride (LiF) and / or lithium bromide (LiBr) and / or lithium iodide (Lil), and in another embodiment, the donor D is additionally selected such that its reaction with the metalloid compound M boron trifluoride (BF 3) forms a compound-formally a complex compound-with the lowest possible melting point.
  • the gas G containing the preferably volatile, metal or metalloid compound M can originate from various sources, for example a chemical process for the preparation of the metal or metalloid compound M, for example a chemical process for the preparation of halide compounds of the groups 4, 8, 12, 13 or 14, preferably groups 8, 13 or 14 of the Periodic Table of the Elements, for example from the corresponding elemental metal or metalloid and the corresponding halogen, such as: aluminum trichloride (AlCl 3) of aluminum metal and elemental chlorine (C); Ferric chloride (FeC) of iron metal, for example scrap iron, and elemental chlorine (C); Boron trichloride (BC) from elemental boron and elemental chlorine (C), wherein the gas G, as it comes from said production processes for the metal or metalloid compound M without prepurification in the context of the invention can be treated but also with pre-cleaning in the sense of Invention can be further treated in such a way that it has already been freed from parts of said metal or metalloid compound M, for example by desublim
  • An example of an electrochemical process for producing alkali metals is the electrolysis of a mixture, preferably in the form of a melt, containing one or more alkali metal halides, for example, sodium chloride and a Group 13 metal halide of the Periodic Table of Elements, for example, aluminum chloride (AlC) as described in US Pat
  • AlC aluminum chloride
  • BC Boron trichloride
  • FeC Ferric chloride
  • the gas G contains a halogen or contains substantially a halogen or consists for example of halogen, for example elemental fluorine (F2) or in particular elemental chlorine (C).
  • the donor D is selected from the groups consisting of alkali metal compounds and / or alkaline earth metal compounds, preferably alkali metal halides, for example, alkali metal chlorides, such as sodium chloride (NaCl) and / or alkaline earth metal halides, for example, alkaline earth metal chlorides, such as magnesium chloride (MgC), in those groups As alkali metals lithium (Li), sodium (Na) or potassium (K) are preferred and as alkaline earth metals magnesium (Mg) or calcium (Ca) are preferred and wherein the compounds of these groups usually under the reaction conditions of the invention practically without water of crystallization or similar adduct-forming compounds.
  • Particularly preferred as donor D in this embodiment are lithium chloride (LiCl), sodium chloride (NaCl
  • Examples of the preferred embodiment described here include the following combinations of substances: a) metal compound M aluminum chloride (AlC) and gas G chlorine (C) and / or hydrogen chloride (HCl) and / or hydrogen (H2) and donor D sodium chloride (NaCl) ; b) metalloid compound M boron trichloride (BCI3) and gas G chlorine (Cb) and donor D sodium chloride (NaCl); c) metalloid compound M boron trifluoride (BF3) and gas G fluorine (F2) and / or hydrogen fluoride (HF) and / or hydrogen (H2) and donor D lithium fluoride (LiF); d) metal compound M ferric chloride (FeCl 3 ) and gas G chlorine (Cl 2 ) and / or hydrogen chloride (HCl) and / or hydrogen (H 2) and donor D sodium chloride (NaCl).
  • the solid donor D preferably the donor D formed as a fixed bed
  • the tubular housing is in this case preferably aligned at an arbitrary angle of 0 ° to 90 ° to the horizontal, particularly preferably substantially perpendicular.
  • the influx of the gas G containing the metal or metalloid compound M and the outflow of the, preferably liquid, reaction product of metal or metalloid compound M and donor D takes place at different locations of the tubular housing.
  • the gas G containing the metal or metalloid compounds M is fed at a position deviating from 0 ° to the horizontal, preferably at a substantially vertical orientation, of the tubular housing at the lower end thereof, so that the gas G and move the reaction product in countercurrent to each other.
  • the present invention furthermore relates to an apparatus for carrying out the method according to the invention, comprising a tubular housing with a fixed bed accommodated therein, the tubular housing having an inlet for the G containing the metal or metalloid compound M, a drain for the treated gas and a drain for the, preferably liquid, reaction product of metal or metalloid compound M and donor D.
  • the fixed bed of the donor D is segmented, for example, by trays which are generally gas and / or liquid permeable.
  • the outlet for the liquid reaction product is designed as a siphon.
  • FIG. 1 shows by way of example a device according to the invention.
  • Donor D The device according to the invention is usually made of a material which is chemically resistant to the components M, G and D and which usually has a temperature range of 200 to 500 ° C. and a pressure range of 30 mbar (abs.). up to 10 bar (abs.) is pressure and dimensionally stable, such as nickel, Hastelloy, inconel, steel (enamelled), steel lined with PTFE, glass, titanium, tantalum.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

L'invention concerne un procédé d'élimination de composés de métaux ou métalloïdes M en phase gazeuse à partir d'un gaz G les contenant. Pour cela, on met le gaz G contenant le composé de métal ou métalloïde M volatil en contact avec un donneur D solide et on sépare le produit réactionnel résultant.
PCT/EP2014/051665 2013-02-08 2014-01-29 Séparation de composés de métaux ou métalloïdes par complexation à partir de la phase gazeuse Ceased WO2014122049A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP13154578.2 2013-02-08
EP13154578 2013-02-08

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WO2014122049A1 true WO2014122049A1 (fr) 2014-08-14

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117486226A (zh) * 2023-11-01 2024-02-02 滁州昶旭电子材料有限公司 一种高纯三氯化硼的提纯工艺及提纯系统

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2462739A (en) * 1946-11-13 1949-02-22 Du Pont Recovery of hydrogen fluorideboron trifluoride catalysts
US3331663A (en) * 1961-10-16 1967-07-18 Universal Oil Prod Co Process for the recovery of boron halides from gaseous mixtures
US3944647A (en) * 1974-04-08 1976-03-16 Scm Corporation Recovering chlorine from the chlorination of titaniferous material
US4203819A (en) 1978-01-26 1980-05-20 E. I. Du Pont De Nemours And Company Electrolytic cell with flow detection means
US4913778A (en) * 1989-01-02 1990-04-03 Westinghouse Electric Corp. Molten salt scrubbing of zirconium or hafnium tetrachloride
WO2000056659A1 (fr) 1999-03-24 2000-09-28 Merck Patent Gmbh Dispositif et procede destines a la production de sels fondus et leur utilisation
EP1044990A1 (fr) * 1998-10-29 2000-10-18 Nippon Petrochemicals Company, Limited Methode d'extraction et de recuperation de trifluorure de bore a l'aide de fluorure de metal et procede de production de polyolefines utilisant cette methode

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2462739A (en) * 1946-11-13 1949-02-22 Du Pont Recovery of hydrogen fluorideboron trifluoride catalysts
US3331663A (en) * 1961-10-16 1967-07-18 Universal Oil Prod Co Process for the recovery of boron halides from gaseous mixtures
US3944647A (en) * 1974-04-08 1976-03-16 Scm Corporation Recovering chlorine from the chlorination of titaniferous material
US4203819A (en) 1978-01-26 1980-05-20 E. I. Du Pont De Nemours And Company Electrolytic cell with flow detection means
US4913778A (en) * 1989-01-02 1990-04-03 Westinghouse Electric Corp. Molten salt scrubbing of zirconium or hafnium tetrachloride
EP1044990A1 (fr) * 1998-10-29 2000-10-18 Nippon Petrochemicals Company, Limited Methode d'extraction et de recuperation de trifluorure de bore a l'aide de fluorure de metal et procede de production de polyolefines utilisant cette methode
WO2000056659A1 (fr) 1999-03-24 2000-09-28 Merck Patent Gmbh Dispositif et procede destines a la production de sels fondus et leur utilisation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117486226A (zh) * 2023-11-01 2024-02-02 滁州昶旭电子材料有限公司 一种高纯三氯化硼的提纯工艺及提纯系统
CN117486226B (zh) * 2023-11-01 2024-04-19 滁州昶旭电子材料有限公司 一种高纯三氯化硼的提纯工艺及提纯系统

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