WO2014196347A1 - Thermally conductive composite sheet and heat dissipation structure - Google Patents
Thermally conductive composite sheet and heat dissipation structure Download PDFInfo
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- WO2014196347A1 WO2014196347A1 PCT/JP2014/063271 JP2014063271W WO2014196347A1 WO 2014196347 A1 WO2014196347 A1 WO 2014196347A1 JP 2014063271 W JP2014063271 W JP 2014063271W WO 2014196347 A1 WO2014196347 A1 WO 2014196347A1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J9/00—Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/027—Thermal properties
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- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
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- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/04—Polysiloxanes
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- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
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- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
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- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3737—Organic materials with or without a thermoconductive filler
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
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- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/408—Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09J2400/00—Presence of inorganic and organic materials
- C09J2400/10—Presence of inorganic materials
- C09J2400/16—Metal
- C09J2400/163—Metal in the substrate
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- C—CHEMISTRY; METALLURGY
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- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2483/00—Presence of polysiloxane
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Definitions
- the present invention broadly can be interposed at the interface between a heat boundary surface of a heat-generating electronic component and a heat-generating member such as a heat sink or a circuit board for cooling the electronic component, for example, a heat-generating component and a heat-dissipating component in an electronic device. It is related with the heat conductive composite sheet suitable as a heat transfer material installed between these and used for heat dissipation.
- the present invention is widely affixed to the back side of the back of the terminal in order to diffuse the heat generated from the electronic member of the portable electronic terminal, and is provided with a certain air gap with the electronic member, for example, portable
- the present invention relates to a heat conductive composite sheet that is installed between an electronic member of a possible electronic terminal and a terminal back surface and is used for heat diffusion, and a heat dissipation structure using the heat conductive composite sheet.
- the portable electronic terminal is significantly different from the conventional environment in that it is in contact with the skin such as the user's hand or knee during use.
- the smartphone operates on the palm of the hand, and the terminal body directly touches the cheeks and ears during a call.
- the terminal body directly touches the cheeks and ears during a call.
- tablet PCs and ultrabooks there are scenes where users can operate on their arms or knees.
- the heat generated from the electronic member is dissipated through the heat conductive resin material in the same manner as before, a part of the rear surface of the terminal becomes high temperature, and the temperature distribution is biased.
- the electronic member and the graphite sheet can dissipate the heat of the electronic member more efficiently, but the temperature on the back of the terminal tends to rise.
- an air gap air gap
- smartphones and tablet PCs are assumed to be carried, it is expected that a drop or impact will be applied to the terminal during use. At that time, the graphite sheet is not peeled off, and the graphite sheet and the back of the terminal are in close contact with each other via an adhesive.
- the present invention is a heat conductive composite sheet that adheres well to an IC chip during mounting, can quickly transfer heat generated from the IC chip to the heat conductive layer, and can diffuse the heat by the heat conductive layer.
- the purpose is to provide.
- the present invention is affixed to the back side of the back of the terminal in order to diffuse the heat generated from the electronic member of a portable electronic terminal called a smartphone, tablet PC, or ultrabook, and has a certain air gap with the electronic member. It is another object of the present invention to provide a thermally conductive composite sheet in which a thermally conductive layer and a thermally conductive adhesive layer are laminated, and a heat dissipation structure using the thermally conductive composite sheet.
- the present inventors have found that 0.4 W / mK or more is provided on at least one surface of the heat conductive layer having a thermal conductivity in the plane direction of 20 to 2,000 W / mK.
- the heat conductive composite sheet made by laminating the heat conductive adhesive layer having the thermal conductivity of the material adheres well to the IC chip at the time of mounting, and quickly transfers the heat generated from the IC chip to the heat conductive layer. It was found that the heat can be diffused by the heat conductive layer.
- a heat conductive composite sheet having a heat conductive adhesive layer on at least one side of the above-mentioned heat conductive layer having excellent heat conductivity is mounted so that the IC chip and the heat conductive adhesive layer are in contact with each other, The heat generated from the heat is quickly transferred to the heat conductive layer through the heat conductive adhesive layer, and the heat conductive layer has high heat conductivity in the in-plane direction, so that the heat is immediately diffused and heat conductive. Since the adhesive layer is in close contact with the IC chip, it has been found that there is a low possibility that the thermally conductive composite sheet is detached from the IC chip even when impact or dropping is considered in actual use.
- the composite sheet is a combination of a heat conductive layer and an adhesive layer having no heat conductivity. Further, the thicker adhesive layer having no thermal conductivity was thought to be advantageous for preventing heat spots from being generated because it is difficult to transfer heat to the case. As a result of investigation, it has been found that by optimizing the ratio of the thickness of the heat conductive layer and the heat conductive adhesive layer of the heat conductive composite sheet, it can be used for the above applications.
- the adhesive layer is more thermally conductive, heat spots are less likely to occur, and when the total thickness of the composite sheet is the same, the heat conductive layer having a greater thickness is less likely to cause heat spots.
- the heat conductive layer of the heat conductive composite sheet a sheet having a thermal conductivity in the plane direction of 20 to 2,000 W / mK, particularly an aluminum foil with low cost and high strength is used.
- a thickness ratio of the pressure-sensitive adhesive layer it has been found that an effect equivalent to that of a composite sheet of a graphite sheet and a pressure-sensitive adhesive layer not having thermal conductivity as used so far can be provided, and It came to make.
- the present invention provides the following thermally conductive composite sheet and heat dissipation structure.
- Thermally conductive composite comprising a thermal conductive adhesive layer having a thermal conductivity of 0.4 W / mK or more laminated on at least one side of a thermal conductive layer having a thermal conductivity of 20 to 2,000 W / mK in the plane direction Sheet.
- a heat conductive composite comprising a heat conductive adhesive layer having a heat conductivity of 0.4 W / mK or more laminated on one side of a heat conductive layer having a surface direction heat conductivity of 20 to 2,000 W / mK.
- the heat conductive layer has a thickness of 0.01 to 2.0 mm, the heat conductive adhesive layer has a thickness of 0.005 to 0.3 mm, and the heat conductive layer has a thickness of 1.
- Thermally conductive adhesive layer (A) The following average composition formula (1) R a SiO (4-a) / 2 (1) (Wherein R is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and a is a positive number from 1.8 to 2.2.) An organopolysiloxane having two or more alkenyl groups bonded to a silicon atom represented by the formula: (B) Thermally conductive filler: 200 to 4,000 parts by mass, (C) Organohydrogenpolysiloxane having two or more hydrogen atoms bonded to silicon atoms in one molecule: moles of hydrogen atoms directly bonded to silicon atoms in component (c) relative to alkenyl groups in component (a) An amount such that the ratio is between 0.5 and 5.0, (D) Platinum group metal catalyst: 0.1 to 1,000 ppm of component (a) in the amount of platinum group metal element; (F) Silicone resin: The thermally conductive composite sheet according to [1]
- the silicone thermal conductive composition further comprises (h-1): an alkoxysilane compound represented by the following general formula (2): R 2 b R 3 c Si (OR 4 ) 4-bc (2) Wherein R 2 is independently an alkyl group having 6 to 15 carbon atoms, R 3 is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 8 carbon atoms, and R 4 is independently carbon atoms.
- R 2 is independently an alkyl group having 6 to 15 carbon atoms
- R 3 is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 8 carbon atoms
- R 4 is independently carbon atoms.
- the silicone thermal conductive composition further comprises (h-1): an alkoxysilane compound represented by the following general formula (2): R 2 b R 3 c Si (OR 4 ) 4-bc (2) Wherein R 2 is independently an alkyl group having 6 to 15 carbon atoms, R 3 is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 8 carbon atoms, and R 4 is independently carbon atoms.
- R 2 is independently an alkyl group having 6 to 15 carbon atoms
- R 3 is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 8 carbon atoms
- R 4 is independently carbon atoms.
- the heat conductive composite sheet in any one of. [8] The heat conductive composite sheet according to any one of [1] to [7], wherein the heat conductive layer is selected from an aluminum foil, a graphite sheet, and a copper foil.
- the heat conductive composite sheet according to any one of [1] to [10] is disposed so as to face the heat generating electronic component with an air gap (air gap), and the heat generated from the electronic component passes through the air gap.
- a heat dissipating structure wherein the heat dissipating structure diffuses by being transferred to the heat conductive composite sheet.
- the heat conductive composite sheet according to any one of [1] to [10] is attached to the inside of the back case so that the case and the heat conductive adhesive layer are in contact with each other.
- a heat conduction layer of the heat conductive composite sheet are arranged so as to face each other with an arbitrary air gap so that they do not come into contact with each other, and there is no temperature deviation on the back case .
- the heat conductive composite sheet of the present invention smoothly transfers heat generated from an IC chip or the like to the heat conductive layer by contacting the heat conductive adhesive layer, and the heat conductive layer immediately diffuses the heat in the in-plane direction. Can do.
- the heat conductive composite sheet of the present invention is applied to the back side of the back of a portable electronic terminal called a smartphone, tablet PC, or ultrabook, so that the heat generated from the electronic member is passed through the air gap. It is effective in that it does not easily cause a heat spot on the back of the terminal. In addition, since it is in close contact with the back of the terminal, it does not easily fall off or peel off even when dropped or vibrated.
- the thermal conductive composite sheet of the present invention has a thermal conductivity in the plane direction of 20 to 2,000 W / mK, and preferably 0.4 W on one side of the thermal conductive layer having a thickness of 0.01 to 2.0 mm.
- a heat conductive adhesive layer having a thermal conductivity of not less than / mK, preferably 0.005 to 0.3 mm is laminated, and the thickness of the heat conductive layer is preferably 1.
- the thickness of the heat conductive adhesive layer is 1.1 or less.
- the heat conductivity in the plane direction of the heat conductive layer is 20 to 2,000 W / mK, preferably 100 to 2,000 W / mK, more preferably 200 to 2 1,000 W / mK. If the thermal conductivity in the surface direction of the thermal conductive layer is low, thermal diffusivity cannot be obtained. The thermal conductivity in the surface direction of the heat conductive layer can be measured by measuring the thermal diffusivity with a thermowave analyzer and calculating the thermal conductivity from the thermal diffusivity.
- Examples of the heat conductive layer having such a thermal conductivity in the plane direction include a graphite sheet, an aluminum foil, and a copper foil.
- graphite sheets are used because they are very excellent in in-plane heat conduction, but they are vulnerable to bending and pulling.
- the graphite sheet has anisotropy in thermal conductivity and has an in-plane thermal conductivity of 500 W / mK or more, which is advantageous for thermal diffusivity. Weak and poor in workability.
- the graphite sheet is obtained by rolling graphite thinly, the graphite powder easily falls off, and there is a risk of short-circuiting when the graphite powder is mixed into the electronic device system during mounting. Therefore, if possible, it is desirable to avoid the heat spot on the back of the terminal as much as possible without using a graphite sheet.
- the graphite sheet is expensive.
- Copper foil is very excellent in thermal conductivity, but has a large specific gravity and is very disadvantageous in the trend of reducing the weight of electronic terminals.
- Aluminum foil has a disadvantage that its in-plane thermal conductivity is lower than that of graphite sheet or copper foil, but it has lower cost, higher strength, and lower specific gravity than copper foil. Therefore, it can be said that it is very attractive as a heat conductive layer.
- the thermal conductive composite sheet of the present invention has a thermal diffusion performance equivalent to that of a composite sheet of a graphite sheet and an adhesive layer having no thermal conductivity as used so far, even if an aluminum foil is used as the thermal conductive layer. Therefore, it can be said that it is very useful to use an aluminum foil as the heat conductive layer.
- the thickness of the heat conductive layer is preferably 0.01 to 2.0 mm, more preferably 0.03 to 2.0 mm, still more preferably 0.03 to 1.0 mm, and particularly preferably 0.03 to 0.0 mm. 5 mm. If the thickness of the heat conductive layer is too thin, the heat conductive composite sheet may have poor rigidity and may be difficult to handle. Moreover, when it is thicker than 2.0 mm, it is unsuitable when mounting is considered.
- the heat conductivity of the heat conductive adhesive layer is 0.4 W / mK or more, preferably 0.6 W / mK or more.
- the upper limit is not particularly limited, but is usually 5 W / mK or less, particularly 3 W / mK or less. If the thermal conductivity of the thermally conductive adhesive layer is low, sufficient thermal diffusivity cannot be obtained.
- the heat conductivity of a heat conductive adhesion layer can be measured using a laser flash method.
- the thickness of the heat conductive adhesive layer is 0.005 to 0.3 mm, preferably 0.02 to 0.1 mm, and more preferably 0.03 to 0.1 mm.
- the thickness of the heat conductive adhesive layer when the thickness of the heat conductive layer is 1 is preferably 1.1 or less, more preferably 1.0 to 0.00. 02, more preferably 0.8 to 0.05.
- the thickness of the heat conductive adhesive layer when the thickness of the heat conductive layer is 1, the heat diffusion performance is difficult to obtain. Further, if the total thickness of the heat conductive composite sheet is the same, a heat spot is less likely to occur when the heat conductive layer is thicker.
- the peel adhesive strength when the thickness of the heat conductive adhesive layer in the heat conductive composite sheet is 100 ⁇ m is preferably 2.0 N / cm or more, more preferably 3.0 N / cm or more, and still more preferably. Is 3.5 N / cm or more.
- the upper limit is not particularly limited, but is usually 100 N / cm or less, particularly 50 N / cm or less. If the peel adhesive strength is low, it may peel off after mounting. In particular, portable electronic terminals represented by smartphones, tablet PCs, and ultrabooks are carried by users, and it is assumed that strong vibrations are applied or users drop electronic terminals. It is.
- the peel adhesive strength is 25 mm wide at room temperature (25 ° C.), and one side of the heat conductive adhesive layer is applied to an aluminum plate, pressure-bonded with a rubber roller having a mass of 2 kg, and cured for 10 minutes after bonding.
- the opposite surface of the adhesive layer was adhered to a base material such as a PET (polyethylene terephthalate) film in the same manner, and the thermally conductive adhesive layer at one end thereof was peeled off from the aluminum plate in accordance with JIS Z 0237 and peeled off.
- a tensile tester the part is peeled off the thermally conductive adhesive layer from the aluminum plate in the 180 ° direction at a pulling speed of 300 mm / min to obtain the force required for peeling.
- the polymer matrix of the heat conductive adhesive layer is selected from rubbers such as organic rubber, polyurethane rubber, synthetic rubber and natural rubber, thermosetting resins such as epoxy resins and urethane resins, and thermoplastic elastomers.
- silicone is superior to other polymer matrices from the viewpoints of heat resistance, cold resistance, weather resistance, electrical properties, and the like.
- the heat conductive composite sheet is an important member that governs the life and accurate operation of electronic components, it is preferable to use silicone (rubber or resin).
- the polymer matrix is not limited to one type, and two or more types may be combined.
- thermally conductive adhesive layer using silicone as a polymer matrix examples include those obtained by curing a silicone thermally conductive composition.
- the curing method of the silicone thermally conductive composition may be addition curing via hydrosilylation using a platinum compound, or may be a curing method using a peroxide, but is not limited thereto.
- the alkenyl group-containing organopolysiloxane as component (a) has the following average composition formula (1) R a SiO (4-a) / 2 (1) Wherein R is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and a is a positive number of 1.8 to 2.2, preferably 1.95 to 2.05. .) Is an organopolysiloxane having 2 or more, preferably 2 to 100, alkenyl groups bonded to a silicon atom, and is a main agent (base polymer) in an addition reaction curable composition.
- the main chain portion is basically composed of repeating diorganosiloxane units.
- this may be one in which a branched structure is included in a part of the molecular structure, and a cyclic product.
- linear diorganopolysiloxane is preferable from the viewpoint of physical properties such as mechanical strength of the cured product.
- R is the same or different, unsubstituted or substituted monovalent hydrocarbon group having 1 to 10 carbon atoms.
- the functional group other than the alkenyl group bonded to the silicon atom include: Alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, heptyl, octyl, nonyl, decyl, dodecyl , Cycloalkyl groups such as cyclopentyl group, cyclohexyl group, cycloheptyl group, aryl groups such as phenyl group, tolyl group, xylyl group, naphthyl group, biphenylyl group, benzyl group, phenylethyl group, phenylpropyl group, methylbenzyl group, etc.
- hydrogen atoms having carbon atoms bonded to these groups are Groups substituted by halogen atoms such as fluorine, chlorine, bromine, cyano groups, etc., for example, chloromethyl group, 2-bromoethyl group, 3-chloropropyl group, 3,3,3-trifluoropropyl group, chlorophenyl group, Fluorophenyl group, cyanoethyl group, 3,3,4,4,5,5,6,6,6-nonafluorohexyl group and the like, and typical ones having 1 to 12 carbon atoms, particularly typical These are those having 1 to 6 carbon atoms, preferably carbon such as methyl group, ethyl group, propyl group, chloromethyl group, bromoethyl group, 3,3,3-trifluoropropyl group, cyanoethyl group, etc.
- halogen atoms such as fluorine, chlorine, bromine, cyano groups, etc.
- all the functional groups other than the alkenyl group bonded to the silicon atom may be the same or different.
- the alkenyl group include those having usually about 2 to 8 carbon atoms such as vinyl group, allyl group, propenyl group, isopropenyl group, butenyl group, hexenyl group, cyclohexenyl group, etc.
- lower alkenyl groups such as an allyl group are preferable, and a vinyl group is particularly preferable.
- the kinematic viscosity of this organopolysiloxane at 25 ° C. is usually in the range of 10 to 100,000 mm 2 / s, particularly preferably 500 to 50,000 mm 2 / s.
- the kinematic viscosity can be measured with an Ostwald viscometer.
- the (a) component organopolysiloxane may be used alone or in combination of two or more having different kinematic viscosities.
- thermally conductive filler As the thermally conductive filler as component (b), nonmagnetic metals such as copper and aluminum, metal oxides such as alumina, silica, magnesia, bengara, beryllia, titania, zirconia, zinc white, aluminum nitride, nitriding
- a material generally used as a heat conductive filler such as metal nitride such as silicon or boron nitride, metal hydroxide such as magnesium hydroxide, artificial diamond or silicon carbide can be used. You may use a heat conductive filler individually by 1 type or in combination of 2 or more types.
- the average particle diameter of the heat conductive filler is preferably 0.1 to 200 ⁇ m, more preferably 0.1 to 100 ⁇ m, and still more preferably 0.5 to 50 ⁇ m.
- the average particle diameter described here is a volume-based measurement value by a Microtrac particle size distribution measuring device MT3300EX (Nikkiso Co., Ltd.).
- the blending amount of the heat conductive filler is preferably 200 to 4,000 parts by mass, more preferably 200 to 3,000 parts by mass with respect to 100 parts by mass of component (a). If the blending amount of the heat conductive filler is too small, the thermal conductivity of the heat conductive resin layer may not be sufficiently obtained. If the blending amount is too large, the moldability deteriorates and the adhesiveness decreases. There is a case.
- the organohydrogenpolysiloxane as the component (c) is an organohydrogenpolysiloxane having 2 or more, preferably 2 to 100, hydrogen atoms (that is, SiH groups) bonded to silicon atoms in one molecule. It is a component that acts as a crosslinking agent for the component a). That is, in the presence of a platinum-based compound which is a component (d) described later, a hydrogen atom bonded to a silicon atom in the component (c) is added to an alkenyl group in the component (a) by a hydrosilylation reaction, and crosslinked. A crosslinked cured product having a three-dimensional network structure having bonds is produced.
- Examples of the organic group bonded to the silicon atom in the component (c) include an unsubstituted or substituted monovalent hydrocarbon group having no aliphatic unsaturated bond. Specific examples include unsubstituted or substituted monovalent hydrocarbon groups of the same type as those exemplified as the group bonded to the silicon atom other than the aliphatic unsaturated group described in the component (a). Of these, a methyl group is preferred from the viewpoint of ease of synthesis and economy.
- the structure of the organohydrogenpolysiloxane of component (c) in the present invention is not particularly limited and may be linear, branched or cyclic, but is preferably linear.
- the degree of polymerization (number of silicon atoms) of the organohydrogenpolysiloxane is preferably 2 to 100, particularly 2 to 50.
- Preferred examples of the component (c) organohydrogenpolysiloxane include methylhydrogenpolysiloxane having both molecular chain ends blocked with trimethylsiloxy groups, and dimethylsiloxane having both molecular chain ends blocked with trimethylsiloxy groups.
- Methyl hydrogen siloxane copolymer dimethyl siloxane with both molecular chain ends blocked with trimethylsiloxy groups
- Methyl hydrogen siloxane / methyl phenyl siloxane copolymer both molecular chain ends blocked with dimethyl hydrogen siloxy groups
- Down-methylphenylsiloxane copolymers both molecular chain terminals with
- the amount of component (c) is preferably such that the SiH group in component (c) is 0.5 to 5.0 moles per mole of alkenyl group in component (a). Is an amount of 0.8 to 4.0 mol.
- the amount of SiH groups in component (c) is less than 0.5 moles relative to 1 mole of alkenyl groups in component (a)
- the composition does not cure or the strength of the cured product is insufficient, Problems such as being unable to be handled as a molded body or a composite body may occur.
- an amount exceeding 5.0 mol is used, there is a risk that the tackiness of the surface of the cured product will be insufficient.
- the platinum group metal catalyst of component (d) promotes the addition reaction between the alkenyl group in component (a) and the hydrogen atom bonded to the silicon atom in component (c), and the composition of the present invention is three-dimensional. It is a catalyst component blended for conversion into a crosslinked cured product having a network structure.
- the component (d) can be appropriately selected from known catalysts used in ordinary hydrosilylation reactions. Specific examples thereof include platinum group metals such as platinum (including platinum black), rhodium and palladium, H 2 PtCl 4 ⁇ nH 2 O, H 2 PtCl 6 ⁇ nH 2 O, NaHPtCl 6 ⁇ nH 2 O.
- platinum group metals such as platinum (including platinum black), rhodium and palladium
- H 2 PtCl 4 ⁇ nH 2 O H 2 PtCl 6 ⁇ nH 2 O
- NaHPtCl 6 ⁇ nH 2 O NaHPtCl 6 ⁇ nH 2 O.
- n is an integer of 0 to 6, preferably 0 or 6.), etc.
- platinum compounds may be used alone
- the compounding amount of the platinum group metal catalyst of the component (d) may be an effective amount necessary for curing the composition, but is usually in terms of mass of the platinum group metal element with respect to the component (a), It is 0.1 to 1,000 ppm, preferably 0.5 to 500 ppm.
- the (e) component reaction control agent is a component that is blended as necessary, and adjusts the rate of the hydrosilylation reaction that is an addition reaction of the (a) component and the (c) component that proceeds in the presence of the (d) component. Is for.
- a reaction control agent of the component (e) can be appropriately selected from known addition reaction control agents used in ordinary addition reaction curable silicone compositions. Specific examples thereof include acetylene compounds such as 1-ethynyl-1-cyclohexanol, 3-butyn-1-ol, ethynylmethylidenecarbinol, nitrogen compounds, organophosphorus compounds, sulfur compounds, oxime compounds, and organic chloro compounds. Is mentioned. These addition reaction control agents can be used alone or in combination of two or more.
- the amount of the component (e) is different depending on the amount of the component (d) and cannot be determined in general. Any effective amount that can adjust the progress of the hydrosilylation reaction to a desired reaction rate is sufficient. Usually, the amount is preferably about 10 to 50,000 ppm relative to the mass of component (a). If the amount of the component (e) is too small, the storage stability of the composition may be insufficient, and sufficient usable time may not be ensured. On the other hand, if the amount is too large, the curability of the composition decreases. There is a case.
- the silicone resin as component (f) has an action of imparting tackiness to the surface of the cured product obtained by curing the silicone heat conductive composition.
- a component (f) include a copolymer of R 1 3 SiO 1/2 units (M units) and SiO 4/2 units (Q units), and the ratio of M units to Q units.
- M units R 1 3 SiO 1/2 units
- Q units SiO 4/2 units
- Molar ratio A silicone resin having an M / Q of 0.5 to 1.5, preferably 0.6 to 1.4, and more preferably 0.7 to 1.3. When the M / Q is within the above range, desired adhesive strength can be obtained.
- R 1 2 SiO 2/2 unit (D unit) or R 1 SiO 3/2 unit (T unit) may be included as necessary, but the blend of these D units and T units is 15 mol. % Or less, and particularly preferably 10 mol% or less.
- R 1 in the general formula representing the M unit or the like is an unsubstituted or substituted monovalent hydrocarbon group, preferably an unsubstituted or substituted monovalent hydrocarbon group not containing an aliphatic unsaturated bond.
- R 1 include, for example, methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, tert-butyl group, pentyl group, neopentyl group, hexyl group, heptyl group, octyl group, Nonyl group, decyl group, alkyl group such as dodecyl group, cyclopentyl group, cyclohexyl group, cycloalkyl group such as cycloheptyl group, phenyl group, tolyl group, xylyl group, naphthyl group, aryl group such as biphenylyl group, benzyl group, Ar
- R 1 among these, an unsubstituted or substituted group having 1 to 3 carbon atoms such as a methyl group, an ethyl group, a propyl group, a chloromethyl group, a bromoethyl group, a 3,3,3-trifluoropropyl group, a cyanoethyl group, etc.
- a substituted alkyl group and an unsubstituted or substituted phenyl group such as a phenyl group, a chlorophenyl group and a fluorophenyl group are preferred.
- R 1 may all be the same or different. Unless special characteristics such as solvent resistance are required, R 1 is preferably all methyl groups from the viewpoints of cost, availability, chemical stability, environmental burden, and the like.
- Component (f) is preferably blended in an amount of 50 to 500 parts by weight, more preferably 60 to 350 parts by weight, and still more preferably 70 to 250 parts by weight with respect to 100 parts by weight of component (a). is there. (F) When the compounding quantity of a component is less than 50 mass parts or exceeds 500 mass parts, desired adhesiveness may no longer be obtained.
- component (f) itself is a solid or viscous liquid at room temperature, it can be used in a state dissolved in a solvent. In that case, the amount added to the composition is determined by the amount excluding the solvent.
- the blending amount of the thermally conductive filler is preferably 100 to 3,000 parts by mass, more preferably 200 to 2,500 parts by mass with respect to 100 parts by mass of the component (f). If the blending amount of the heat conductive filler is too small, the thermal conductivity of the heat conductive resin layer may not be sufficiently obtained. If the blending amount is too large, the moldability deteriorates and the adhesiveness decreases. There is a case.
- silicone resin of component (f) examples include the same silicone resins as those of the above-described silicone thermal conductive composition (I).
- (G) Organic peroxide compound The curing reaction of the silicone composition with an organic peroxide is a linear organopolysiloxane having an alkenyl group such as a vinyl group at one or both of the molecular chain terminal (one terminal or both terminals) and the molecular chain side chain. Is caused by radical polymerization in the presence of an organic peroxide compound.
- the organic peroxide compound as component (g) include diacyl peroxide and dialkyl peroxide.
- Organic peroxide compounds are vulnerable to light and heat, are unstable, and it is difficult to disperse solid organic peroxide compounds in the composition. It is often used in a state dispersed in components.
- the compounding amount of the organic peroxide compound is preferably 0.1 to 2 parts by mass, more preferably 0.1 to 1.6 parts by mass in terms of organic peroxide with respect to 100 parts by mass of (f) silicone resin. . If the amount is too small, the curing reaction may not proceed sufficiently, and if it is too large, the composition may lack stability.
- the silicone heat conductive composition is prepared by hydrophobizing the component (b) heat conductive filler during preparation of the composition, and the component (a) organopolysiloxane or the composition (II) in the composition (I).
- a surface treatment agent ( Wetter) (h) can be blended.
- the component (h) the following (h-1) and (h-2) are particularly preferable.
- Examples of the alkyl group represented by R 2 in the general formula (1) include hexyl group, octyl group, nonyl group, decyl group, dodecyl group, and tetradecyl group.
- the number of carbon atoms of the alkyl group represented by R 2 is in the range of 6 to 15, the wettability of the thermally conductive filler of the component (b) is sufficiently improved and the handling workability is improved. Therefore, the low temperature characteristics of the composition are good.
- Examples of the unsubstituted or substituted monovalent hydrocarbon group represented by R 3 include alkyl groups such as a methyl group, an ethyl group, a propyl group, a hexyl group, and an octyl group; a cyclopentyl group, a cyclohexyl group, and the like.
- Cycloalkyl group alkenyl group such as vinyl group and allyl group; aryl group such as phenyl group and tolyl group; aralkyl group such as 2-phenylethyl group and 2-methyl-2-phenylethyl group; Examples thereof include halogenated hydrocarbon groups such as trifluoropropyl group, 2- (nonafluorobutyl) ethyl group, 2- (heptadecafluorooctyl) ethyl group, and p-chlorophenyl group. In the present invention, among these, a methyl group and an ethyl group are particularly preferable.
- Examples of the alkyl group represented by R 4 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, and a hexyl group. In the present invention, among these, a methyl group and an ethyl group are particularly preferable.
- Preferable specific examples of the component (h-1) include the following. C 6 H 13 Si (OCH 3 ) 3 C 10 H 21 Si (OCH 3 ) 3 C 12 H 25 Si (OCH 3 ) 3 C 12 H 25 Si (OC 2 H 5 ) 3 C 10 H 21 Si (CH 3 ) (OCH 3 ) 2 C 10 H 21 Si (C 6 H 5 ) (OCH 3 ) 2 C 10 H 21 Si (CH 3 ) (OC 2 H 5 ) 2 C 10 H 21 Si (CH ⁇ CH 2 ) (OCH 3 ) 2 C 10 H 21 Si (CH 2 CH 2 CF 3 ) (OCH 3 ) 2
- the component (h-1) may be used alone or in combination of two or more. Even if the amount of component (h-1) exceeds the amount described later, the wetter effect does not increase any more, which is uneconomical. Moreover, since this component is volatile, if it is left in an open system, the composition and the cured product after curing gradually harden, so it is preferable to keep the amount to the minimum necessary amount.
- H-2 Dimethylpolysiloxane in which one end of a molecular chain represented by the following general formula (3) is blocked with a trialkoxysilyl group (Wherein R 5 is independently an alkyl group having 1 to 6 carbon atoms, and is the same kind as the alkyl group represented by R 4 in the above formula (2). It is an integer of 100.)
- component (h-2) Preferable specific examples include the following.
- the component (h-2) may be used alone or in combination of two or more.
- the blending amount of the component (h-2) exceeds the blending amount described later, the heat resistance and moisture resistance of the resulting cured product tend to decrease.
- the surface treating agent for component (b) at least one selected from the group consisting of component (h-1) and component (h-2) can be selected and used.
- the blending amount of all the components (h) is preferably 0.01 to 50 parts by mass, particularly 0.1 to 30 parts by mass with respect to 100 parts by mass of the component (a). Part.
- the blending amount of all the components (h) is preferably 0.01 to 50 parts by mass, particularly 0.1 to 30 parts by mass with respect to 100 parts by mass of the component (f). It is preferable that
- a fluorine-modified silicone surfactant and carbon black, titanium dioxide or the like as a colorant may be added.
- fine powder silica such as precipitated silica or calcined silica, thixotropic improver, etc. can be added as appropriate for the purpose of preventing or reinforcing the heat conductive filler.
- the silicone thermal conductive composition is prepared by mixing the above components (a) to (f) or (b), (f), (g), and other components as required according to a conventional method. can do.
- the curing conditions for the silicone thermally conductive composition may be the same as those for known addition reaction curable silicone rubber compositions and organic peroxide curable silicone rubber compositions.
- the heat conductive composite sheet of the present invention can be obtained, for example, by coating the silicone heat conductive composition on the heat conductive layer so as to have the thickness described above and curing it to form a heat conductive adhesive layer.
- the coating method include a method in which a liquid composition is applied in the form of a thin film on the heat conductive layer using a bar coater, knife coater, comma coater, spin coater or the like. In the present invention, these methods are used. It is not limited.
- the heat conductive composite sheet of this invention needs to laminate
- a plastic film such as a PET film may be laminated.
- the heat conductive composite sheet of the present invention can be used as a heat dissipation structure in which the heat conductive composite sheet is disposed so as to face each other by providing an air gap (air gap) with an electronic component that generates heat. The heat generated from the electronic component is transferred to the thermally conductive composite sheet through the air gap and diffused.
- the thermal conductive composite sheet 12 is placed inside the case 11 on the back of the terminal, as shown in FIG.
- the heat conductive adhesive layer 12a are attached so that they are in contact with each other, and the battery 14 and the package 14 such as an electronic component represented by a module are in contact with the heat conductive layer 12b of the heat conductive composite sheet 12.
- the heat dissipating structure is disposed so as to face each other with an air gap 15 of 0.01 to 2 mm, particularly 0.1 to 1 mm, in particular.
- 16 is a touch panel.
- Thermal conduction layer Aluminum foil: 50 ⁇ m thick, thermal conductivity in the plane direction 237 W / mK Aluminum foil: thickness 70 ⁇ m, surface direction thermal conductivity 237 W / mK Aluminum foil: thickness 200 ⁇ m, surface direction thermal conductivity 237 W / mK Copper foil: 30 ⁇ m thick, thermal conductivity in the plane direction 398 W / mK Graphite sheet derived from graphite: thickness 50 ⁇ m, surface direction thermal conductivity 500 W / mK Graphite sheet derived from graphite: thickness 100 ⁇ m, thermal conductivity in the plane direction 600 W / mK
- compositions i to iv and v to viii were obtained with the compositions shown in Tables 1 and 2 using the materials shown below.
- a planetary mixer was used for kneading the materials.
- (B) Component (B-1) Aluminum oxide powder having an average particle size of 10 ⁇ m (b-2) Aluminum oxide powder having an average particle size of 1 ⁇ m
- (F) Component (F-1) A toluene solution (60% non-volatile content) of a silicone resin (M / Q molar ratio is 1.15) consisting essentially of Me 3 SiO 0.5 unit (M unit) and SiO 2 unit (Q unit) ; Kinematic viscosity at 25 ° C. 30 mm 2 / s) (F-2) A toluene solution of a silicone resin (M / Q molar ratio is 0.85) consisting essentially of Me 3 SiO 0.5 units (M units) and SiO 2 units (Q units) (nonvolatile content: 70% ; Kinematic viscosity at 25 ° C.
- a toluene solution of a silicone resin (M / Q molar ratio is 0.7) consisting essentially of Me 3 SiO 0.5 units (M units) and SiO 2 units (Q units) (nonvolatile content 60% ; Kinematic viscosity at 25 ° C. 8 mm 2 / s) (F-4) KR-101-10 (silicone resin adhesive, manufactured by Shin-Etsu Chemical Co., Ltd.)
- (H) Component Dimethylpolysiloxane with one end of a molecular chain represented by the following structural formula blocked with a trimethoxysilyl group
- the other side of the cured layers of the compositions i to iv and v to viii not bonded to the aluminum plate was coated with a 0.1 mm thick PET (Polethylene terephthalate) film was adhered in the same manner, and in accordance with JIS Z 0237, one end of the heat conductive adhesive layer was peeled off from the aluminum plate, and a tensile tester was used from the peeled portion at a pulling speed of 300 mm / min.
- the cured product layers of the compositions i to iv and v to viii were peeled off from the aluminum plate in the direction of 180 °, and the force (heat Peel adhesion strength of the conductive adhesive layer) were measured.
- Examples 1 to 6 A thermally conductive composite sheet was prepared using the materials shown in Table 3. An appropriate amount of toluene was added to the compositions i to iv obtained above, and this solution was coated on the heat conducting layer with a spacer, and the toluene was volatilized at 80 ° C. for 10 minutes, followed by 120 ° C. , Cured in 10 minutes. The side of the heat conductive layer on which the heat conductive adhesive layer was laminated was the front surface, and the opposite surface was the back surface. In the case of laminating on the back surface, coating molding was performed in the same manner.
- PCS-CR-10 Phase Change Material, manufactured by Shin-Etsu Chemical Co., Ltd., thermal conductivity, which does not have adhesiveness on the back surface of the aluminum foil
- thermoly conductive composite sheet was prepared using the materials shown in Table 4. Comparative Example 2 was conducted in the same manner as in Example, and Comparative Example 5 was conducted in the same manner as in Example except that PCS-CR-10 (manufactured by Shin-Etsu Chemical Co., Ltd.) was used instead of compositions i to iv. A functional composite sheet was prepared.
- Comparative Example 3 is only a heat conductive layer
- Comparative Example 4 is TC-20CG (manufactured by Shin-Etsu Chemical Co., Ltd.), which does not have a heat conductive layer and does not have adhesiveness
- TC-20CG manufactured by Shin-Etsu Chemical Co., Ltd.
- an appropriate amount of toluene was added to the composition i, applied onto a fluorinated PET film, and dried at 80 ° C. for 10 minutes.
- the thickness was 0.2 mm and the thermal conductivity was 1.7 W / mK.
- a thermally conductive sheet consisting only of a cured product layer of the composition i having a thickness of 200 ⁇ m was subsequently produced by a method of heat curing at 120 ° C. for 10 minutes.
- the obtained heat conductive composite sheet was brought into contact with the heat conductive adhesive layer by applying a load of 400 g with a heat source of 15 mm ⁇ 15 mm square controlled to be constant at 100 ° C.
- a load of 400 g with a heat source of 15 mm ⁇ 15 mm square controlled to be constant at 100 ° C.
- the temperature of the surface of the heat conductive adhesive layer at a point 5 mm away from the end of the heat source was measured.
- a thermal conductive adhesive layer having a thermal conductivity of 0.4 W / mK or higher and having a high peel adhesive strength is laminated on the thermal conductive layer, so that an IC can be mounted at the time of mounting.
- a heat conductive composite sheet was obtained that adheres well to the chip and can quickly transfer heat generated from the IC chip to the heat conductive layer, and the heat conductive layer can diffuse the heat. If the heat conductive layer is not provided as in Comparative Example 1, the heat conductivity in the surface direction is remarkably deteriorated and sufficient heat diffusibility cannot be obtained. If the adhesive layer does not have sufficient thermal conductivity as in Comparative Example 2, heat from the heat source cannot be quickly transmitted to the thermal conductive layer, and sufficient thermal diffusivity cannot be obtained.
- the heat conductive adhesive layer is not provided as in Comparative Example 3, the contact with the heat source is deteriorated, the heat from the heat source is not smoothly transferred to the heat conductive layer, and sufficient heat diffusibility cannot be obtained. If the thermal conductive layer is not provided and the adhesiveness is not further provided as in Comparative Example 4, sufficient thermal diffusivity cannot be obtained, and the thermal source is readily peeled off. When laminated with the heat conductive layer of PCS-CR-10 (non-adhesive) manufactured by Shin-Etsu Chemical Co., Ltd. as in Comparative Example 5, the contact with the heat source is good and the thermal diffusivity is obtained, but sufficient Adhesive strength cannot be obtained.
- PCS-CR-10 non-adhesive
- Examples 7 to 12, Comparative Examples 6 and 7 A thermally conductive composite sheet was produced using the materials shown in Table 5. An appropriate amount of toluene is added to the compositions v to viii obtained above, this solution is coated on the heat conductive layer with a spacer, and the toluene is volatilized at 80 ° C. for 10 minutes, followed by 120 ° C. , Cured in 10 minutes. Moreover, the heat conductive composite sheet of the comparative examples 6 and 7 was produced like the Example using the material shown in Table 6.
- a heat source of 15 mm ⁇ 15 mm is obtained by bonding the heat conductive adhesive layer 1 a side of the obtained heat conductive composite sheet 1 to a polycarbonate plastic case (100 mm ⁇ 100 mm ⁇ 2 mmt) 2. (Fixed at 80 ° C.) 3 and placed at a distance of 0.5 mm (heat source 3 and heat conduction layer 1b face each other), and 30 minutes after installing heat source 3, heat source 3 on polycarbonate 2 The temperature at the temperature measurement point 4 portion corresponding to the center of was measured.
- 5 is a metal frame having a height of 10 mm
- 6 is a heat insulating material.
- a heat conductive adhesive layer having a thermal conductivity of 0.4 W / mK or more is laminated on one side of a heat conductive layer having a high thermal conductivity in the surface direction, and further heat conduction.
- the thickness of the layer is 1, the heat conductive composite sheet having a heat conductive adhesive layer of 1.1 or less can efficiently diffuse the heat from the heat source.
- Example 7 and Example 8 are compared, the one where the ratio of the thickness of the heat conductive adhesive layer when the total thickness of the heat conductive composite sheet is the same when the thickness of the heat conductive layer is 1 is lower, The temperature on the polycarbonate is not rising.
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Abstract
Description
本発明は、広くは、電子部品の冷却のために、発熱性電子部品の熱境界面とヒートシンク又は回路基板などの発熱部材との界面に介在し得る、例えば電子機器内の発熱部品と放熱部品の間に設置され放熱に用いられる熱伝達材料として好適な熱伝導性複合シートに関する。
特に、本発明は、広くは携帯可能な電子端末の電子部材から発生した熱を拡散させるために端末背面の裏側に貼り付けられ、電子部材とある一定のエアーギャップを設けて介在する、例えば携帯可能な電子端末の電子部材と端末背面との間に設置され、熱拡散に用いられる熱伝導性複合シート、及び該熱伝導性複合シートを用いた放熱構造体に関する。
The present invention broadly can be interposed at the interface between a heat boundary surface of a heat-generating electronic component and a heat-generating member such as a heat sink or a circuit board for cooling the electronic component, for example, a heat-generating component and a heat-dissipating component in an electronic device. It is related with the heat conductive composite sheet suitable as a heat transfer material installed between these and used for heat dissipation.
In particular, the present invention is widely affixed to the back side of the back of the terminal in order to diffuse the heat generated from the electronic member of the portable electronic terminal, and is provided with a certain air gap with the electronic member, for example, portable The present invention relates to a heat conductive composite sheet that is installed between an electronic member of a possible electronic terminal and a terminal back surface and is used for heat diffusion, and a heat dissipation structure using the heat conductive composite sheet.
パーソナルコンピュータなどの電子端末は、近年、小型化、薄型化、軽量化が進み、スマートフォンやタブレットPC、ウルトラブックと呼ばれるタッチパネルが搭載された携帯可能な電子端末に急速に移り変わっている。小型化、薄型化、軽量化に伴い、実装される電子部材であるCPUやドライバIC、バッテリーなどが駆動することで発生する熱に関して、これまでとは違う対策が必要になっている。これまでは、電子部材から発生した熱は、熱伝導性樹脂材料を介在させてヒートシンクに伝えられ、更にはファンやラジエーターにより放熱及び冷却されていたが、携帯可能な電子端末は、あくまで携帯することを目的としているため、大きさ、重量の観点からヒートシンクやファンなどの冷却部材を搭載することができない。更に携帯可能な電子端末は、使用時に使用者の手や膝など肌に接触しているという点においても、これまでとは使用環境が大きく異なっている。例えば、スマートフォンは手の平の上で操作するし、通話時には端末本体が頬や耳に直接触れることになる。タブレットPCやウルトラブックにおいても、腕や膝の上に乗せて操作する場面がある。このような場合、これまでと同様に電子部材から発生した熱を、熱伝導樹脂材料を介して放熱すると、端末背面のある一部分が高温になり温度分布に偏りが生まれる。これは所謂ヒートスポットと呼ばれるもので、直接肌に触れる機会の多い、スマートフォンやタブレットPCにおいては端末使用者の低温やけどの原因や不快感の点において問題となり、ヒートスポットはできるだけ作りたくない。ヒートスポットを無くしたい場合に、電子部材と端末背面の間にグラファイトシートに代表されるような、面内方向の熱伝導に優れたシートを介在させることで、発熱体から発生した熱を素早く拡散させる手法がとられている。具体的には、グラファイトシートの片面に粘着層を積層させて、粘着層の面を端末背面の裏側に貼り付ける。また電子部材とグラファイトシートは接触させた方がより効率的に電子部材の熱を放熱することができるが、端末背面の温度が上昇しやすくなってしまうため、一般的には端末背面に熱をできるだけ伝えたくないために、発熱部材とグラファイトシートの間にはエアーギャップ(空隙)が設けられている。更にスマートフォンやタブレットPCは携帯することが想定されているため、使用中に落下や衝撃が端末に掛かることが予想される。その際にグラファイトシートが剥がれ落ちないために、グラファイトシートと端末背面は粘着剤を介して密着している。 In recent years, electronic terminals such as personal computers have become smaller, thinner, and lighter, and are rapidly changing to portable electronic terminals equipped with smartphones, tablet PCs, and touch panels called ultrabooks. Along with miniaturization, thinning, and weight reduction, different measures are required for heat generated by driving a CPU, a driver IC, a battery, and the like which are electronic components to be mounted. Until now, the heat generated from the electronic member has been transferred to the heat sink through the heat conductive resin material, and further radiated and cooled by the fan and the radiator. Therefore, a cooling member such as a heat sink or a fan cannot be mounted from the viewpoint of size and weight. In addition, the portable electronic terminal is significantly different from the conventional environment in that it is in contact with the skin such as the user's hand or knee during use. For example, the smartphone operates on the palm of the hand, and the terminal body directly touches the cheeks and ears during a call. Even on tablet PCs and ultrabooks, there are scenes where users can operate on their arms or knees. In such a case, if the heat generated from the electronic member is dissipated through the heat conductive resin material in the same manner as before, a part of the rear surface of the terminal becomes high temperature, and the temperature distribution is biased. This is a so-called heat spot, and in smartphones and tablet PCs where there are many opportunities to directly touch the skin, it becomes a problem in terms of low-temperature burns and discomfort for terminal users, and it is not desirable to create a heat spot as much as possible. When you want to eliminate the heat spot, quickly dissipate the heat generated from the heating element by interposing a sheet with excellent heat conduction in the in-plane direction, such as a graphite sheet, between the electronic member and the back of the terminal. The technique to take is taken. Specifically, the adhesive layer is laminated on one side of the graphite sheet, and the surface of the adhesive layer is attached to the back side of the back surface of the terminal. In addition, the electronic member and the graphite sheet can dissipate the heat of the electronic member more efficiently, but the temperature on the back of the terminal tends to rise. In order not to transmit as much as possible, an air gap (air gap) is provided between the heat generating member and the graphite sheet. Furthermore, since smartphones and tablet PCs are assumed to be carried, it is expected that a drop or impact will be applied to the terminal during use. At that time, the graphite sheet is not peeled off, and the graphite sheet and the back of the terminal are in close contact with each other via an adhesive.
面内方向に高い熱伝導率を有する熱伝導層と粘着層もしくは、面内方向に高い熱伝導率を有する熱伝導層と熱伝導性樹脂層の複合シートがこれまでに多く発明されている(特開平06-291226号公報、特開2003-158393号公報、特開2007-001038号公報、特開2007-261087号公報、特開2010-219290号公報:特許文献1~5参照)が、熱伝導層と熱伝導性粘着層を積層させてなる熱伝導性複合シートに関する記載はない。
Many heat-conductive layers and adhesive layers having high thermal conductivity in the in-plane direction, or composite sheets of heat-conductive layers and heat-conductive resin layers having high thermal conductivity in the in-plane direction have been invented so far ( JP-A-06-291226, JP-A-2003-158393, JP-A-2007-001038, JP-A-2007-261087, JP-A-2010-219290: see
本発明は、実装の際にICチップによく接着し、かつICチップから発生する熱を素早く熱伝導層に伝えることができ、熱伝導層によりその熱を拡散させることができる熱伝導性複合シートを提供することを目的とする。
また、本発明は、スマートフォンやタブレットPC、ウルトラブックと呼ばれる携帯可能な電子端末の電子部材から発生した熱を拡散させるために端末背面の裏側に貼り付けられ、電子部材とある一定のエアーギャップを設けて介在する、熱伝導層と熱伝導性粘着層を積層させてなる熱伝導性複合シート、及び該熱伝導性複合シートを用いた放熱構造体を提供することを他の目的とする。
The present invention is a heat conductive composite sheet that adheres well to an IC chip during mounting, can quickly transfer heat generated from the IC chip to the heat conductive layer, and can diffuse the heat by the heat conductive layer. The purpose is to provide.
In addition, the present invention is affixed to the back side of the back of the terminal in order to diffuse the heat generated from the electronic member of a portable electronic terminal called a smartphone, tablet PC, or ultrabook, and has a certain air gap with the electronic member. It is another object of the present invention to provide a thermally conductive composite sheet in which a thermally conductive layer and a thermally conductive adhesive layer are laminated, and a heat dissipation structure using the thermally conductive composite sheet.
本発明者らは、上記目的を達成するために鋭意検討を重ねた結果、面方向の熱伝導率が20~2,000W/mKである熱伝導層の少なくとも片面に、0.4W/mK以上の熱伝導率を有する熱伝導性粘着層を積層させてなる熱伝導性複合シートが、実装の際にICチップによく接着し、かつICチップから発生する熱を素早く熱伝導層に伝えることができ、熱伝導層によりその熱を拡散させることができることを知見した。
即ち、上記面内の熱伝導性に優れた熱伝導層の少なくとも片面に熱伝導性粘着層を有する熱伝導性複合シートをICチップと熱伝導性粘着層が接するように実装すれば、ICチップから発生した熱が熱伝導性粘着層を介し、素早く熱伝導層に伝わり、該熱伝導層は面内方向に高い熱伝導性を有しているため、直ちに熱を拡散させ、また熱伝導性粘着層がICチップとよく密着するため、実使用を考えた際の衝撃や落下でも熱伝導性複合シートがICチップから脱離する可能性が低いことを見出した。
As a result of intensive studies to achieve the above object, the present inventors have found that 0.4 W / mK or more is provided on at least one surface of the heat conductive layer having a thermal conductivity in the plane direction of 20 to 2,000 W / mK. The heat conductive composite sheet made by laminating the heat conductive adhesive layer having the thermal conductivity of the material adheres well to the IC chip at the time of mounting, and quickly transfers the heat generated from the IC chip to the heat conductive layer. It was found that the heat can be diffused by the heat conductive layer.
That is, if a heat conductive composite sheet having a heat conductive adhesive layer on at least one side of the above-mentioned heat conductive layer having excellent heat conductivity is mounted so that the IC chip and the heat conductive adhesive layer are in contact with each other, The heat generated from the heat is quickly transferred to the heat conductive layer through the heat conductive adhesive layer, and the heat conductive layer has high heat conductivity in the in-plane direction, so that the heat is immediately diffused and heat conductive. Since the adhesive layer is in close contact with the IC chip, it has been found that there is a low possibility that the thermally conductive composite sheet is detached from the IC chip even when impact or dropping is considered in actual use.
また、スマートフォンやタブレットPCの端末背面のヒートスポットを生じさせないためには、粘着層の熱伝導性は低い方が端末背面に熱を伝えにくいと考えられており、現在一般的にこの用途に用いられている複合シートは、熱伝導層と熱伝導性を持たない粘着層の組み合わせである。また熱伝導性を持たない粘着層の厚みが厚い方が、ケースに熱を伝えにくいためにヒートスポットを生じさせないためには有利であると考えられていたが、本発明者らは、更なる検討を行った結果、熱伝導性複合シートの熱伝導層と熱伝導性粘着層の厚みの比率を最適化することにより、上記用途に使用し得ることを知見した。
即ち、粘着層は熱伝導性があった方が、ヒートスポットが生じにくく、また複合シートの総厚が同じ場合、熱伝導層の厚みが厚い方が、ヒートスポットを生じにくいことを見出した。これらは予想に反する結果であった。
熱伝導性粘着層を積層させた場合、熱伝導性粘着層に伝わった熱が垂直方向、更には面内方向にも拡散していくのに対して、熱伝導性のない粘着層の場合、粘着層に伝わった熱は拡散しづらく、留まってしまい、ヒートスポットを生じさせてしまうのではないかと考えられる。
また、熱伝導層と熱伝導性粘着層の面内の熱伝導性を比べたときに、圧倒的に熱伝導層の方が優れている。そのため熱伝導層の厚みが熱伝導性粘着層よりも厚い方が、熱拡散性が有利になり、ヒートスポットを生じにくいのではないかと考えられる。
Also, in order not to generate a heat spot on the back of the terminal of a smartphone or tablet PC, it is considered that the lower the thermal conductivity of the adhesive layer is, the less likely it is to transfer heat to the back of the terminal. The composite sheet is a combination of a heat conductive layer and an adhesive layer having no heat conductivity. Further, the thicker adhesive layer having no thermal conductivity was thought to be advantageous for preventing heat spots from being generated because it is difficult to transfer heat to the case. As a result of investigation, it has been found that by optimizing the ratio of the thickness of the heat conductive layer and the heat conductive adhesive layer of the heat conductive composite sheet, it can be used for the above applications.
That is, it has been found that the adhesive layer is more thermally conductive, heat spots are less likely to occur, and when the total thickness of the composite sheet is the same, the heat conductive layer having a greater thickness is less likely to cause heat spots. These were unexpected results.
When the heat conductive adhesive layer is laminated, the heat transferred to the heat conductive adhesive layer diffuses in the vertical direction and further in the in-plane direction, whereas in the case of an adhesive layer without thermal conductivity, It is considered that the heat transmitted to the adhesive layer is difficult to diffuse and stays, causing a heat spot.
Further, when the in-plane thermal conductivities of the heat conductive layer and the heat conductive adhesive layer are compared, the heat conductive layer is overwhelmingly superior. Therefore, it is considered that the heat diffusibility is advantageous when the thickness of the heat conductive layer is thicker than that of the heat conductive adhesive layer, and heat spots are less likely to occur.
更に、熱伝導性複合シートの熱伝導層として、面方向の熱伝導率が20~2,000W/mKのもの、特にコストが安く、強度が高いアルミニウム箔を用い、熱伝導層と熱伝導性粘着層の厚みの比率を最適化することで、これまで用いられてきたようなグラファイトシートと熱伝導性を持たない粘着層との複合シートと同等の効果を与えることができることを見出し、本発明をなすに至った。 Furthermore, as the heat conductive layer of the heat conductive composite sheet, a sheet having a thermal conductivity in the plane direction of 20 to 2,000 W / mK, particularly an aluminum foil with low cost and high strength is used. By optimizing the thickness ratio of the pressure-sensitive adhesive layer, it has been found that an effect equivalent to that of a composite sheet of a graphite sheet and a pressure-sensitive adhesive layer not having thermal conductivity as used so far can be provided, and It came to make.
従って、本発明は、下記の熱伝導性複合シート及び放熱構造体を提供する。
〔1〕
面方向の熱伝導率が20~2,000W/mKである熱伝導層の少なくとも片面に、0.4W/mK以上の熱伝導率を有する熱伝導性粘着層を積層させてなる熱伝導性複合シート。
〔2〕
面方向の熱伝導率が20~2,000W/mKである熱伝導層の片面に、0.4W/mK以上の熱伝導率を有する熱伝導性粘着層を積層させてなる、熱伝導性複合シートであって、該熱伝導層の厚みが0.01~2.0mmであり、該熱伝導性粘着層の厚みが0.005~0.3mmであり、かつ熱伝導層の厚みを1としたときの熱伝導性粘着層の厚みが1.1以下である〔1〕記載の熱伝導性複合シート。
〔3〕
熱伝導性粘着層が、
(a)下記平均組成式(1)
RaSiO(4-a)/2 (1)
(式中、Rは独立に炭素原子数1~10の非置換又は置換の1価炭化水素基であり、aは1.8~2.2の正数である。)
で示されるケイ素原子に結合したアルケニル基を1分子中に2個以上有するオルガノポリシロキサン:100質量部、
(b)熱伝導性充填剤:200~4,000質量部、
(c)ケイ素原子に結合した水素原子を1分子中に2個以上有するオルガノハイドロジェンポリシロキサン:(a)成分中のアルケニル基に対する(c)成分中のケイ素原子に直接結合した水素原子のモル比が0.5~5.0となる量、
(d)白金族金属系触媒:白金族金属系元素量で(a)成分の0.1~1,000ppm、
(f)シリコーン樹脂:50~500質量部
を含有してなるシリコーン熱伝導性組成物の硬化物である〔1〕又は〔2〕記載の熱伝導性複合シート。
〔4〕
シリコーン熱伝導性組成物が、更に
(h-1):下記一般式(2)で表されるアルコキシシラン化合物
R2
bR3
cSi(OR4)4-b-c (2)
(式中、R2は独立に炭素原子数6~15のアルキル基、R3は独立に非置換又は置換の炭素原子数1~8の1価炭化水素基、R4は独立に炭素原子数1~6のアルキル基であり、bは1~3の整数、cは0,1又は2であり、b+cは1~3の整数である。)
及び
(h-2):下記一般式(3)で表される分子鎖片末端がトリアルコキシシリル基で封鎖されたジメチルポリシロキサン
からなる群から選択される表面処理剤の少なくとも1種を(a)成分100質量部に対して0.01~50質量部を配合した〔3〕記載の熱伝導性複合シート。
〔5〕
熱伝導性粘着層が、
(b)熱伝導性充填剤:100~3,000質量部、
(f)シリコーン樹脂:100質量部、
(g)有機過酸化物系化合物:有機過酸化物換算で0.1~2質量部
を含有してなるシリコーン熱伝導性組成物の硬化物である〔1〕又は〔2〕記載の熱伝導性複合シート。
〔6〕
シリコーン熱伝導性組成物が、更に
(h-1):下記一般式(2)で表されるアルコキシシラン化合物
R2
bR3
cSi(OR4)4-b-c (2)
(式中、R2は独立に炭素原子数6~15のアルキル基、R3は独立に非置換又は置換の炭素原子数1~8の1価炭化水素基、R4は独立に炭素原子数1~6のアルキル基であり、bは1~3の整数、cは0,1又は2であり、b+cは1~3の整数である。)
及び
(h-2):下記一般式(3)で表される分子鎖片末端がトリアルコキシシリル基で封鎖されたジメチルポリシロキサン
からなる群から選択される表面処理剤の少なくとも1種を(f)成分100質量部に対して0.01~50質量部を配合した〔5〕記載の熱伝導性複合シート。
〔7〕
シリコーン樹脂(f)が、R1
3SiO1/2単位(R1は非置換又は置換の1価炭化水素基を示す)(M単位)とSiO4/2単位(Q単位)との共重合体であって、M単位とQ単位との比(M/Q)がモル比として0.5~1.5であり、脂肪族不飽和基を含有しないものである〔3〕~〔6〕のいずれかに記載の熱伝導性複合シート。
〔8〕
熱伝導層が、アルミニウム箔、グラファイトシート及び銅箔から選ばれる〔1〕~〔7〕のいずれかに記載の熱伝導性複合シート。
〔9〕
室温下、25mm幅、厚み100μmの熱伝導性粘着層の片面をアルミニウム板に当て、質量2kgのゴムローラーで圧着して接着後10分間養生し、次いでアルミニウム板と接着されていない熱伝導性粘着層の他方の片面を基材に同様に接着させ、JIS Z 0237に準じて、熱伝導性粘着層の一端を前記アルミニウム板から引き剥がし、引き剥がした部分から引張り試験機を用い、引張り速度300mm/minにて180°方向に前記アルミニウム板から熱伝導性粘着層を引き剥がし、この引き剥がしに要した力(熱伝導性粘着層の剥離接着強度)が、2.0N/cm以上である〔1〕~〔8〕のいずれかに記載の熱伝導性複合シート。
〔10〕
携帯可能な電子端末用である〔1〕~〔9〕のいずれかに記載の熱伝導性複合シート。
〔11〕
発熱する電子部品とエアーギャップ(空隙)を設けて向かい合うように〔1〕~〔10〕のいずれかに記載の熱伝導性複合シートが配置され、電子部品から発生した熱がエアーギャップを介して熱伝導性複合シートに伝熱されて拡散することを特徴とする放熱構造体。
〔12〕
携帯可能な電子端末において、背面のケースの内側に〔1〕~〔10〕のいずれかに記載の熱伝導性複合シートをケースと熱伝導性粘着層が接触するように貼り付けられ、電子部品と該熱伝導性複合シートの熱伝導層とは接触することがないよう任意のエアーギャップを設けて向かい合うように配置され、背面のケース上に温度の偏りがないことを特徴とする放熱構造体。
Accordingly, the present invention provides the following thermally conductive composite sheet and heat dissipation structure.
[1]
Thermally conductive composite comprising a thermal conductive adhesive layer having a thermal conductivity of 0.4 W / mK or more laminated on at least one side of a thermal conductive layer having a thermal conductivity of 20 to 2,000 W / mK in the plane direction Sheet.
[2]
A heat conductive composite comprising a heat conductive adhesive layer having a heat conductivity of 0.4 W / mK or more laminated on one side of a heat conductive layer having a surface direction heat conductivity of 20 to 2,000 W / mK. The heat conductive layer has a thickness of 0.01 to 2.0 mm, the heat conductive adhesive layer has a thickness of 0.005 to 0.3 mm, and the heat conductive layer has a thickness of 1. The heat conductive composite sheet according to [1], wherein the thickness of the heat conductive adhesive layer is 1.1 or less.
[3]
Thermally conductive adhesive layer
(A) The following average composition formula (1)
R a SiO (4-a) / 2 (1)
(Wherein R is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and a is a positive number from 1.8 to 2.2.)
An organopolysiloxane having two or more alkenyl groups bonded to a silicon atom represented by the formula:
(B) Thermally conductive filler: 200 to 4,000 parts by mass,
(C) Organohydrogenpolysiloxane having two or more hydrogen atoms bonded to silicon atoms in one molecule: moles of hydrogen atoms directly bonded to silicon atoms in component (c) relative to alkenyl groups in component (a) An amount such that the ratio is between 0.5 and 5.0,
(D) Platinum group metal catalyst: 0.1 to 1,000 ppm of component (a) in the amount of platinum group metal element;
(F) Silicone resin: The thermally conductive composite sheet according to [1] or [2], which is a cured product of a silicone thermally conductive composition containing 50 to 500 parts by mass.
[4]
The silicone thermal conductive composition further comprises (h-1): an alkoxysilane compound represented by the following general formula (2): R 2 b R 3 c Si (OR 4 ) 4-bc (2)
Wherein R 2 is independently an alkyl group having 6 to 15 carbon atoms, R 3 is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 8 carbon atoms, and R 4 is independently carbon atoms. An alkyl group of 1 to 6, b is an integer of 1 to 3, c is 0, 1 or 2, and b + c is an integer of 1 to 3.)
And (h-2): dimethylpolysiloxane in which one end of a molecular chain represented by the following general formula (3) is blocked with a trialkoxysilyl group
The heat conductive composite sheet according to [3], wherein 0.01 to 50 parts by mass of at least one surface treatment agent selected from the group consisting of:
[5]
Thermally conductive adhesive layer
(B) Thermally conductive filler: 100 to 3,000 parts by mass,
(F) Silicone resin: 100 parts by mass,
(G) Organic peroxide compound: Thermal conductivity according to [1] or [2], which is a cured product of a silicone thermal conductive composition containing 0.1 to 2 parts by mass in terms of organic peroxide Composite sheet.
[6]
The silicone thermal conductive composition further comprises (h-1): an alkoxysilane compound represented by the following general formula (2): R 2 b R 3 c Si (OR 4 ) 4-bc (2)
Wherein R 2 is independently an alkyl group having 6 to 15 carbon atoms, R 3 is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 8 carbon atoms, and R 4 is independently carbon atoms. An alkyl group of 1 to 6, b is an integer of 1 to 3, c is 0, 1 or 2, and b + c is an integer of 1 to 3.)
And (h-2): dimethylpolysiloxane in which one end of a molecular chain represented by the following general formula (3) is blocked with a trialkoxysilyl group
[5] The heat conductive composite sheet according to [5], wherein 0.01 to 50 parts by mass of at least one surface treatment agent selected from the group consisting of:
[7]
Silicone resin (f) is composed of R 1 3 SiO 1/2 unit (R 1 represents an unsubstituted or substituted monovalent hydrocarbon group) (M unit) and SiO 4/2 unit (Q unit). [3] to [6] in which the ratio of M unit to Q unit (M / Q) is 0.5 to 1.5 as a molar ratio and does not contain an aliphatic unsaturated group. The heat conductive composite sheet in any one of.
[8]
The heat conductive composite sheet according to any one of [1] to [7], wherein the heat conductive layer is selected from an aluminum foil, a graphite sheet, and a copper foil.
[9]
At room temperature, one side of a 25 mm wide, 100 μm thick heat conductive adhesive layer is placed on an aluminum plate, pressed with a rubber roller with a mass of 2 kg, cured for 10 minutes, and then thermally conductive adhesive not bonded to the aluminum plate The other side of the layer was similarly adhered to the base material, and one end of the heat conductive adhesive layer was peeled off from the aluminum plate according to JIS Z 0237, and a tensile tester was used from the peeled portion using a tensile tester 300 mm The heat conductive pressure-sensitive adhesive layer is peeled off from the aluminum plate in the 180 ° direction at / min, and the force (peeling adhesive strength of the heat conductive pressure-sensitive adhesive layer) required for the peeling is 2.0 N / cm or more [ [1] The heat conductive composite sheet according to any one of [8].
[10]
The heat conductive composite sheet according to any one of [1] to [9], which is for portable electronic terminals.
[11]
The heat conductive composite sheet according to any one of [1] to [10] is disposed so as to face the heat generating electronic component with an air gap (air gap), and the heat generated from the electronic component passes through the air gap. A heat dissipating structure, wherein the heat dissipating structure diffuses by being transferred to the heat conductive composite sheet.
[12]
In a portable electronic terminal, the heat conductive composite sheet according to any one of [1] to [10] is attached to the inside of the back case so that the case and the heat conductive adhesive layer are in contact with each other. And a heat conduction layer of the heat conductive composite sheet are arranged so as to face each other with an arbitrary air gap so that they do not come into contact with each other, and there is no temperature deviation on the back case .
本発明の熱伝導性複合シートは、ICチップなどから発生する熱を熱伝導性粘着層と接触させることでスムーズに熱伝導層に伝え、熱伝導層が直ちに面内方向に熱を拡散させることができる。
また特に、本発明の熱伝導性複合シートは、スマートフォンやタブレットPC、ウルトラブックと呼ばれる携帯可能な電子端末の端末背面の裏側に貼り付けることで、電子部材から発生した熱を、エアーギャップを介して拡散し、端末背面上にヒートスポットを生じさせにくい効果がある。また端末背面とよく密着しているため、落下や振動が加わっても脱落や剥離し難い。
The heat conductive composite sheet of the present invention smoothly transfers heat generated from an IC chip or the like to the heat conductive layer by contacting the heat conductive adhesive layer, and the heat conductive layer immediately diffuses the heat in the in-plane direction. Can do.
In particular, the heat conductive composite sheet of the present invention is applied to the back side of the back of a portable electronic terminal called a smartphone, tablet PC, or ultrabook, so that the heat generated from the electronic member is passed through the air gap. It is effective in that it does not easily cause a heat spot on the back of the terminal. In addition, since it is in close contact with the back of the terminal, it does not easily fall off or peel off even when dropped or vibrated.
以下、本発明について詳細に説明する。
本発明の熱伝導性複合シートは、面方向の熱伝導率が20~2,000W/mKであり、好ましくは厚みが0.01~2.0mmである熱伝導層の片面に、0.4W/mK以上の熱伝導率を有し、好ましくは厚みが0.005~0.3mmである熱伝導性粘着層を積層させてなると共に、更に熱伝導層の厚みを好ましくは1としたときの熱伝導性粘着層の厚みが1.1以下のものである。
Hereinafter, the present invention will be described in detail.
The thermal conductive composite sheet of the present invention has a thermal conductivity in the plane direction of 20 to 2,000 W / mK, and preferably 0.4 W on one side of the thermal conductive layer having a thickness of 0.01 to 2.0 mm. When a heat conductive adhesive layer having a thermal conductivity of not less than / mK, preferably 0.005 to 0.3 mm is laminated, and the thickness of the heat conductive layer is preferably 1. The thickness of the heat conductive adhesive layer is 1.1 or less.
[熱伝導層]
本発明の熱伝導性複合シートにおいて、熱伝導層の面方向の熱伝導率は、20~2,000W/mKであり、好ましくは100~2,000W/mKであり、より好ましくは200~2,000W/mKである。熱伝導層の面方向の熱伝導率が低いと、熱拡散性が得られない。なお、熱伝導層の面方向の熱伝導率は、サーモウェーブアナライザーにより熱拡散率を測定し、熱拡散率から熱伝導率を算出することにより測定することができる。
[Thermal conduction layer]
In the heat conductive composite sheet of the present invention, the heat conductivity in the plane direction of the heat conductive layer is 20 to 2,000 W / mK, preferably 100 to 2,000 W / mK, more preferably 200 to 2 1,000 W / mK. If the thermal conductivity in the surface direction of the thermal conductive layer is low, thermal diffusivity cannot be obtained. The thermal conductivity in the surface direction of the heat conductive layer can be measured by measuring the thermal diffusivity with a thermowave analyzer and calculating the thermal conductivity from the thermal diffusivity.
このような面方向の熱伝導率を有する熱伝導層としては、例えば、グラファイトシートやアルミニウム箔、銅箔などが挙げられる。 Examples of the heat conductive layer having such a thermal conductivity in the plane direction include a graphite sheet, an aluminum foil, and a copper foil.
グラファイトシートは、面内の熱伝導に非常に優れるため、数多く使用されているが、曲げや引っ張りに弱い。また、グラファイトシートは、熱伝導性に異方性をもち、面内の方向の熱伝導率が500W/mK以上あり、熱拡散性に有利であるが、非常に強度が低いため、折れや引っ張りに弱く、加工性に乏しい。更にグラファイトシートは、グラファイトを薄く圧延したものであるため、グラファイト粉が脱落しやすく、実装中にグラファイト粉が電子機器系内に混入するとショートする危険性がある。そのためできればグラファイトシートを用いずにできるだけ端末背面のヒートスポットを生じさせないようにしたい。更に、グラファイトシートはコストが高い。
銅箔は、熱伝導性に非常に優れるが、比重が大きく、電子端末が軽量化する流れの中では非常に不利である。
アルミニウム箔は、面内の熱伝導率がグラファイトシートや銅箔に比べると低いことが不利な点として挙げられるが、グラファイトシートと比べるとコストが低く、強度が高く、銅箔よりも比重が小さいため、熱伝導層として非常に魅力的といえる。本発明の熱伝導性複合シートは、熱伝導層としてアルミニウム箔を用いても、これまで用いられてきたようなグラファイトシートと熱伝導性を持たない粘着層との複合シートと同等の熱拡散性能が得られることから、熱伝導層としてアルミニウム箔を用いることが非常に有用であるといえる。
Many graphite sheets are used because they are very excellent in in-plane heat conduction, but they are vulnerable to bending and pulling. In addition, the graphite sheet has anisotropy in thermal conductivity and has an in-plane thermal conductivity of 500 W / mK or more, which is advantageous for thermal diffusivity. Weak and poor in workability. Further, since the graphite sheet is obtained by rolling graphite thinly, the graphite powder easily falls off, and there is a risk of short-circuiting when the graphite powder is mixed into the electronic device system during mounting. Therefore, if possible, it is desirable to avoid the heat spot on the back of the terminal as much as possible without using a graphite sheet. In addition, the graphite sheet is expensive.
Copper foil is very excellent in thermal conductivity, but has a large specific gravity and is very disadvantageous in the trend of reducing the weight of electronic terminals.
Aluminum foil has a disadvantage that its in-plane thermal conductivity is lower than that of graphite sheet or copper foil, but it has lower cost, higher strength, and lower specific gravity than copper foil. Therefore, it can be said that it is very attractive as a heat conductive layer. The thermal conductive composite sheet of the present invention has a thermal diffusion performance equivalent to that of a composite sheet of a graphite sheet and an adhesive layer having no thermal conductivity as used so far, even if an aluminum foil is used as the thermal conductive layer. Therefore, it can be said that it is very useful to use an aluminum foil as the heat conductive layer.
熱伝導層の厚みは、0.01~2.0mmが好ましく、より好ましくは0.03~2.0mm、更に好ましくは0.03~1.0mmであり、特に好ましくは0.03~0.5mmである。熱伝導層の厚みが薄すぎると熱伝導性複合シートの剛性が乏しくなり、取り扱いが困難になる場合がある。また2.0mmより厚いと実装を考えた場合に不適である。 The thickness of the heat conductive layer is preferably 0.01 to 2.0 mm, more preferably 0.03 to 2.0 mm, still more preferably 0.03 to 1.0 mm, and particularly preferably 0.03 to 0.0 mm. 5 mm. If the thickness of the heat conductive layer is too thin, the heat conductive composite sheet may have poor rigidity and may be difficult to handle. Moreover, when it is thicker than 2.0 mm, it is unsuitable when mounting is considered.
[熱伝導性粘着層]
本発明の熱伝導性複合シートにおいて、熱伝導性粘着層の熱伝導率は、0.4W/mK以上であり、好ましくは0.6W/mK以上である。その上限は特に制限されないが、通常5W/mK以下、特に3W/mK以下である。熱伝導性粘着層の熱伝導率が低いと、熱拡散性が十分得られない。なお、熱伝導性粘着層の熱伝導率は、レーザーフラッシュ法を用いて測定することができる。
[Heat conductive adhesive layer]
In the heat conductive composite sheet of the present invention, the heat conductivity of the heat conductive adhesive layer is 0.4 W / mK or more, preferably 0.6 W / mK or more. The upper limit is not particularly limited, but is usually 5 W / mK or less, particularly 3 W / mK or less. If the thermal conductivity of the thermally conductive adhesive layer is low, sufficient thermal diffusivity cannot be obtained. In addition, the heat conductivity of a heat conductive adhesion layer can be measured using a laser flash method.
熱伝導性粘着層の厚みは、0.005~0.3mmであり、好ましくは0.02~0.1mmであり、より好ましくは0.03~0.1mmである。熱伝導性粘着層が薄い方が熱伝導層を厚く設定することができ、熱拡散の観点からは有利であるが、厚みが薄くなりすぎると粘着力が低下してしまい、実装した際の落下や衝撃によって脱落や剥離の危険性が出てくる。
また、本発明の熱伝導性複合シートにおいて、熱伝導層の厚みを1としたときの熱伝導性粘着層の厚みは1.1以下であることが好ましく、より好ましくは1.0~0.02であり、更に好ましくは0.8~0.05である。熱伝導層の厚みを1としたときの熱伝導性粘着層の厚みが1.1を超えると熱拡散性能を得にくい。また熱伝導性複合シートの総厚みが同じであれば、熱伝導層の厚みが厚い方が、ヒートスポットが生じにくい。
The thickness of the heat conductive adhesive layer is 0.005 to 0.3 mm, preferably 0.02 to 0.1 mm, and more preferably 0.03 to 0.1 mm. The thinner the heat conductive adhesive layer, the thicker the heat conductive layer can be set, which is advantageous from the viewpoint of thermal diffusion, but if the thickness is too thin, the adhesive force will decrease and drop when mounted There is a risk of dropping or peeling due to impact.
In the heat conductive composite sheet of the present invention, the thickness of the heat conductive adhesive layer when the thickness of the heat conductive layer is 1 is preferably 1.1 or less, more preferably 1.0 to 0.00. 02, more preferably 0.8 to 0.05. If the thickness of the heat conductive adhesive layer when the thickness of the heat conductive layer is 1, the heat diffusion performance is difficult to obtain. Further, if the total thickness of the heat conductive composite sheet is the same, a heat spot is less likely to occur when the heat conductive layer is thicker.
該熱伝導性複合シートにおける熱伝導性粘着層の厚みが100μmの時の剥離接着強度は、2.0N/cm以上であることが好ましく、より好ましくは3.0N/cm以上であり、更に好ましくは3.5N/cm以上である。その上限は特に制限されないが、通常100N/cm以下、特に50N/cm以下である。剥離接着強度が低いと、実装後に剥がれる可能性がある。特に、スマートフォンやタブレットPC、ウルトラブックに代表される携帯可能な電子端末は、使用者によって持ち運びされるもので、強い振動が加わったり、使用者が電子端末を落としたりすることが想定されるためである。
ここで、剥離接着強度は、室温(25℃)下、25mm幅で熱伝導性粘着層の片面をアルミニウム板に当て、質量2kgのゴムローラーで圧着して接着後10分間養生し、熱伝導性粘着層の反対側の面をPET(ポリエチレンテレフタレート)フィルムなどの基材に同様にして接着させ、JIS Z 0237に準じて、その一端の熱伝導性粘着層をアルミニウム板から引き剥がし、引き剥がした部分を引張り試験機を用い、引張り速度300mm/minにて180°方向に前記アルミニウム板から熱伝導性粘着層を引き剥がし、引き剥がしに要した力とする。
The peel adhesive strength when the thickness of the heat conductive adhesive layer in the heat conductive composite sheet is 100 μm is preferably 2.0 N / cm or more, more preferably 3.0 N / cm or more, and still more preferably. Is 3.5 N / cm or more. The upper limit is not particularly limited, but is usually 100 N / cm or less, particularly 50 N / cm or less. If the peel adhesive strength is low, it may peel off after mounting. In particular, portable electronic terminals represented by smartphones, tablet PCs, and ultrabooks are carried by users, and it is assumed that strong vibrations are applied or users drop electronic terminals. It is.
Here, the peel adhesive strength is 25 mm wide at room temperature (25 ° C.), and one side of the heat conductive adhesive layer is applied to an aluminum plate, pressure-bonded with a rubber roller having a mass of 2 kg, and cured for 10 minutes after bonding. The opposite surface of the adhesive layer was adhered to a base material such as a PET (polyethylene terephthalate) film in the same manner, and the thermally conductive adhesive layer at one end thereof was peeled off from the aluminum plate in accordance with JIS Z 0237 and peeled off. Using a tensile tester, the part is peeled off the thermally conductive adhesive layer from the aluminum plate in the 180 ° direction at a pulling speed of 300 mm / min to obtain the force required for peeling.
[熱伝導性粘着層のポリマーマトリックス]
熱伝導性粘着層のポリマーマトリックスとしては、有機ゴム、ポリウレタンゴム、合成ゴム、天然ゴムなどのゴムや、エポキシ樹脂、ウレタン樹脂などの熱硬化性樹脂、熱可塑性エラストマーから選ばれる。特にシリコーンは、耐熱性、耐寒性、耐候性、電気特性などの観点から、他のポリマーマトリックスよりも優れている。該熱伝導性複合シートが、電子部品の寿命や正確な作動を司る重要な部材であることを考えれば、シリコーン(ゴム又は樹脂)を用いることが好ましい。
ポリマーマトリックスは、1種類に限らず2種類以上を組み合わせてもよい。
[Polymer matrix of heat conductive adhesive layer]
The polymer matrix of the heat conductive adhesive layer is selected from rubbers such as organic rubber, polyurethane rubber, synthetic rubber and natural rubber, thermosetting resins such as epoxy resins and urethane resins, and thermoplastic elastomers. In particular, silicone is superior to other polymer matrices from the viewpoints of heat resistance, cold resistance, weather resistance, electrical properties, and the like. In consideration of the fact that the heat conductive composite sheet is an important member that governs the life and accurate operation of electronic components, it is preferable to use silicone (rubber or resin).
The polymer matrix is not limited to one type, and two or more types may be combined.
ポリマーマトリックスとしてシリコーンを用いた熱伝導性粘着層としては、シリコーン熱伝導性組成物を硬化させたものを例示することができる。ここで、シリコーン熱伝導性組成物の硬化方法は、白金化合物を用いるヒドロシリル化を経由した付加硬化でもよいし、過酸化物を用いた硬化方法でもよいし、これらに限らない。 Examples of the thermally conductive adhesive layer using silicone as a polymer matrix include those obtained by curing a silicone thermally conductive composition. Here, the curing method of the silicone thermally conductive composition may be addition curing via hydrosilylation using a platinum compound, or may be a curing method using a peroxide, but is not limited thereto.
このようなシリコーン熱伝導性組成物として、具体的には、
(a)下記平均組成式(1)
RaSiO(4-a)/2 (1)
(式中、Rは独立に炭素原子数1~10の非置換又は置換の1価炭化水素基であり、aは1.8~2.2の正数である。)
で示されるケイ素原子に結合したアルケニル基を1分子中に2個以上有するオルガノポリシロキサン:100質量部、
(b)熱伝導性充填剤:200~4,000質量部、
(c)ケイ素原子に結合した水素原子を1分子中に2個以上有するオルガノハイドロジェンポリシロキサン:(a)成分中のアルケニル基に対する(c)成分中のケイ素原子に直接結合した水素原子のモル比が0.5~5.0となる量、
(d)白金族金属系触媒:白金族金属系元素量で(a)成分の0.1~1,000ppm、
(f)シリコーン樹脂:50~500質量部
を含有してなるシリコーン熱伝導性組成物(I)や、
(b)熱伝導性充填剤:100~3,000質量部、
(f)シリコーン樹脂:100質量部、
(g)有機過酸化物系化合物:有機過酸化物換算で0.1~2質量部
を含有してなるシリコーン熱伝導性組成物(II)を挙げることができる。
As such a silicone thermal conductive composition, specifically,
(A) The following average composition formula (1)
R a SiO (4-a) / 2 (1)
(Wherein R is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and a is a positive number from 1.8 to 2.2.)
An organopolysiloxane having two or more alkenyl groups bonded to a silicon atom represented by the formula:
(B) Thermally conductive filler: 200 to 4,000 parts by mass,
(C) Organohydrogenpolysiloxane having two or more hydrogen atoms bonded to silicon atoms in one molecule: moles of hydrogen atoms directly bonded to silicon atoms in component (c) relative to alkenyl groups in component (a) An amount such that the ratio is between 0.5 and 5.0,
(D) Platinum group metal catalyst: 0.1 to 1,000 ppm of component (a) in the amount of platinum group metal element;
(F) Silicone resin: a silicone thermal conductive composition (I) containing 50 to 500 parts by mass,
(B) Thermally conductive filler: 100 to 3,000 parts by mass,
(F) Silicone resin: 100 parts by mass,
(G) Organic peroxide compound: A silicone thermal conductive composition (II) containing 0.1 to 2 parts by mass in terms of organic peroxide can be mentioned.
以下に、上記シリコーン熱伝導性組成物(I)の各成分について説明する。
[(a)オルガノポリシロキサン]
(a)成分であるアルケニル基含有オルガノポリシロキサンは、下記平均組成式(1)
RaSiO(4-a)/2 (1)
(式中、Rは独立に炭素原子数1~10の非置換又は置換の1価炭化水素基であり、aは1.8~2.2、好ましくは1.95~2.05の正数である。)
で示されるケイ素原子に結合したアルケニル基を1分子中に2個以上、好ましくは2~100個有するオルガノポリシロキサンであり、付加反応硬化型組成物における主剤(ベースポリマー)である。通常は主鎖部分が基本的にジオルガノシロキサン単位の繰り返しからなるのが一般的であるが、これは分子構造の一部に分岐状の構造を含んだものであってもよく、また環状体であってもよいが、硬化物の機械的強度等、物性の点から直鎖状のジオルガノポリシロキサンが好ましい。
Below, each component of the said silicone heat conductive composition (I) is demonstrated.
[(A) Organopolysiloxane]
The alkenyl group-containing organopolysiloxane as component (a) has the following average composition formula (1)
R a SiO (4-a) / 2 (1)
Wherein R is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and a is a positive number of 1.8 to 2.2, preferably 1.95 to 2.05. .)
Is an organopolysiloxane having 2 or more, preferably 2 to 100, alkenyl groups bonded to a silicon atom, and is a main agent (base polymer) in an addition reaction curable composition. Usually, the main chain portion is basically composed of repeating diorganosiloxane units. However, this may be one in which a branched structure is included in a part of the molecular structure, and a cyclic product. However, linear diorganopolysiloxane is preferable from the viewpoint of physical properties such as mechanical strength of the cured product.
上記式(1)中、Rは互いに同一又は異種の炭素原子数1~10の非置換又は置換の1価炭化水素基であり、ケイ素原子に結合するアルケニル基以外の官能基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基などのアルキル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基等のシクロアルキル基、フェニル基、トリル基、キシリル基、ナフチル基、ビフェニリル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基、メチルベンジル基等のアラルキル基、並びにこれらの基に炭素原子が結合している水素原子の一部又は全部が、フッ素、塩素、臭素等のハロゲン原子、シアノ基などで置換された基、例えば、クロロメチル基、2-ブロモエチル基、3-クロロプロピル基、3,3,3-トリフルオロプロピル基、クロロフェニル基、フルオロフェニル基、シアノエチル基、3,3,4,4,5,5,6,6,6-ノナフルオロヘキシル基等が挙げられ、代表的なものは炭素原子数が1~12、特に代表的なものは炭素原子数が1~6のものであり、好ましくは、メチル基、エチル基、プロピル基、クロロメチル基、ブロモエチル基、3,3,3-トリフルオロプロピル基、シアノエチル基等の炭素原子数1~3の非置換又は置換のアルキル基及びフェニル基、クロロフェニル基、フルオロフェニル基等の非置換又は置換のフェニル基である。また、ケイ素原子に結合したアルケニル基以外の官能基は全てが同一であっても異なっていてもよい。
また、アルケニル基としては、例えば、ビニル基、アリル基、プロペニル基、イソプロペニル基、ブテニル基、ヘキセニル基、シクロヘキセニル基等の通常、炭素原子数2~8程度のものが挙げられ、中でもビニル基、アリル基等の低級アルケニル基が好ましく、特にビニル基が好ましい。
In the above formula (1), R is the same or different, unsubstituted or substituted monovalent hydrocarbon group having 1 to 10 carbon atoms. Examples of the functional group other than the alkenyl group bonded to the silicon atom include: Alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, heptyl, octyl, nonyl, decyl, dodecyl , Cycloalkyl groups such as cyclopentyl group, cyclohexyl group, cycloheptyl group, aryl groups such as phenyl group, tolyl group, xylyl group, naphthyl group, biphenylyl group, benzyl group, phenylethyl group, phenylpropyl group, methylbenzyl group, etc. And some or all of the hydrogen atoms having carbon atoms bonded to these groups are Groups substituted by halogen atoms such as fluorine, chlorine, bromine, cyano groups, etc., for example, chloromethyl group, 2-bromoethyl group, 3-chloropropyl group, 3,3,3-trifluoropropyl group, chlorophenyl group, Fluorophenyl group, cyanoethyl group, 3,3,4,4,5,5,6,6,6-nonafluorohexyl group and the like, and typical ones having 1 to 12 carbon atoms, particularly typical These are those having 1 to 6 carbon atoms, preferably carbon such as methyl group, ethyl group, propyl group, chloromethyl group, bromoethyl group, 3,3,3-trifluoropropyl group, cyanoethyl group, etc. An unsubstituted or substituted alkyl group having 1 to 3 atoms and an unsubstituted or substituted phenyl group such as a phenyl group, a chlorophenyl group, and a fluorophenyl group. Moreover, all the functional groups other than the alkenyl group bonded to the silicon atom may be the same or different.
Examples of the alkenyl group include those having usually about 2 to 8 carbon atoms such as vinyl group, allyl group, propenyl group, isopropenyl group, butenyl group, hexenyl group, cyclohexenyl group, etc. And lower alkenyl groups such as an allyl group are preferable, and a vinyl group is particularly preferable.
このオルガノポリシロキサンの25℃における動粘度は、通常、10~100,000mm2/s、特に好ましくは500~50,000mm2/sの範囲である。前記動粘度が低すぎると、得られる組成物の保存安定性が悪くなる場合があり、また高すぎると得られる組成物の伸展性が悪くなる場合がある。なお、本発明において、動粘度はオストワルド粘度計により測定できる。 The kinematic viscosity of this organopolysiloxane at 25 ° C. is usually in the range of 10 to 100,000 mm 2 / s, particularly preferably 500 to 50,000 mm 2 / s. When the kinematic viscosity is too low, the storage stability of the resulting composition may be deteriorated, and when it is too high, the extensibility of the obtained composition may be deteriorated. In the present invention, the kinematic viscosity can be measured with an Ostwald viscometer.
この(a)成分のオルガノポリシロキサンは、1種単独でも、動粘度が異なる2種以上を組み合わせて用いてもよい。 The (a) component organopolysiloxane may be used alone or in combination of two or more having different kinematic viscosities.
[(b)熱伝導性充填剤]
(b)成分である熱伝導性充填剤としては、非磁性の銅やアルミニウム等の金属、アルミナ、シリカ、マグネシア、ベンガラ、ベリリア、チタニア、ジルコニア、亜鉛華等の金属酸化物、窒化アルミニウム、窒化ケイ素、窒化硼素等の金属窒化物、水酸化マグネシウム等の金属水酸化物、人工ダイヤモンドあるいは炭化ケイ素等一般に熱伝導性充填剤とされる物質を用いることができる。熱伝導性充填剤は、1種を単独で又は2種以上を組み合わせて用いてもよい。
[(B) Thermally conductive filler]
As the thermally conductive filler as component (b), nonmagnetic metals such as copper and aluminum, metal oxides such as alumina, silica, magnesia, bengara, beryllia, titania, zirconia, zinc white, aluminum nitride, nitriding A material generally used as a heat conductive filler such as metal nitride such as silicon or boron nitride, metal hydroxide such as magnesium hydroxide, artificial diamond or silicon carbide can be used. You may use a heat conductive filler individually by 1 type or in combination of 2 or more types.
熱伝導性充填剤の平均粒径は、0.1~200μmであることが好ましく、0.1~100μmであることがより好ましく、更に好ましくは0.5~50μmである。ここで述べる平均粒径は、マイクロトラック粒度分布測定装置MT3300EX(日機装株式会社)による体積基準の測定値である。 The average particle diameter of the heat conductive filler is preferably 0.1 to 200 μm, more preferably 0.1 to 100 μm, and still more preferably 0.5 to 50 μm. The average particle diameter described here is a volume-based measurement value by a Microtrac particle size distribution measuring device MT3300EX (Nikkiso Co., Ltd.).
熱伝導性充填剤の配合量としては、(a)成分100質量部に対して200~4,000質量部であることが好ましく、より好ましくは200~3,000質量部である。熱伝導性充填剤の配合量が少なすぎると、熱伝導性樹脂層の熱伝導率が十分得られない場合があり、配合量が多すぎると成形性が悪化し、粘着性が低下してしまう場合がある。 The blending amount of the heat conductive filler is preferably 200 to 4,000 parts by mass, more preferably 200 to 3,000 parts by mass with respect to 100 parts by mass of component (a). If the blending amount of the heat conductive filler is too small, the thermal conductivity of the heat conductive resin layer may not be sufficiently obtained. If the blending amount is too large, the moldability deteriorates and the adhesiveness decreases. There is a case.
[(c)オルガノハイドロジェンポリシロキサン]
(c)成分のオルガノハイドロジェンポリシロキサンは、ケイ素原子に結合した水素原子(即ち、SiH基)を1分子中に2個以上、好ましくは2~100個有するオルガノハイドロジェンポリシロキサンであり、(a)成分に対する架橋剤として作用する成分である。即ち、後述する(d)成分である白金系化合物の存在下で、(c)成分中のケイ素原子に結合した水素原子が、ヒドロシリル化反応により(a)成分中のアルケニル基に付加し、架橋結合を有する三次元網状構造を有する架橋硬化物を生成する。
[(C) Organohydrogenpolysiloxane]
The organohydrogenpolysiloxane as the component (c) is an organohydrogenpolysiloxane having 2 or more, preferably 2 to 100, hydrogen atoms (that is, SiH groups) bonded to silicon atoms in one molecule. It is a component that acts as a crosslinking agent for the component a). That is, in the presence of a platinum-based compound which is a component (d) described later, a hydrogen atom bonded to a silicon atom in the component (c) is added to an alkenyl group in the component (a) by a hydrosilylation reaction, and crosslinked. A crosslinked cured product having a three-dimensional network structure having bonds is produced.
(c)成分中のケイ素原子に結合した有機基としては、例えば、脂肪族不飽和結合を有しない非置換又は置換の1価炭化水素基等が挙げられる。具体的には、(a)成分で説明した脂肪族不飽和基以外のケイ素原子に結合する基として例示したものと同種の、非置換又は置換の1価炭化水素基が挙げられるが、それらの中でも、合成容易性及び経済性の観点から、メチル基が好ましい。 Examples of the organic group bonded to the silicon atom in the component (c) include an unsubstituted or substituted monovalent hydrocarbon group having no aliphatic unsaturated bond. Specific examples include unsubstituted or substituted monovalent hydrocarbon groups of the same type as those exemplified as the group bonded to the silicon atom other than the aliphatic unsaturated group described in the component (a). Of these, a methyl group is preferred from the viewpoint of ease of synthesis and economy.
本発明における(c)成分のオルガノハイドロジェンポリシロキサンの構造は特に限定されず、直鎖状、分岐状及び環状のいずれであってもよいが、好ましくは直鎖状である。
また、オルガノハイドロジェンポリシロキサンの重合度(ケイ素原子の数)は、2~100、特に2~50であることが好ましい。
The structure of the organohydrogenpolysiloxane of component (c) in the present invention is not particularly limited and may be linear, branched or cyclic, but is preferably linear.
The degree of polymerization (number of silicon atoms) of the organohydrogenpolysiloxane is preferably 2 to 100, particularly 2 to 50.
(c)成分のオルガノハイドロジェンポリシロキサンの好適な具体例としては、分子鎖両末端がトリメチルシロキシ基で封鎖されたメチルハイドロジェンポリシロキサン、分子鎖両末端がトリメチルシロキシ基で封鎖されたジメチルシロキサン・メチルハイドロジェンシロキサン共重合体、分子鎖両末端がトリメチルシロキシ基で封鎖されたジメチルシロキサン・メチルハイドロジェンシロキサン・メチルフェニルシロキサン共重合体、分子鎖両末端がジメチルハイドロジェンシロキシ基で封鎖されたジメチルポリシロキサン、分子鎖両末端がジメチルハイドロジェンシロキシ基で封鎖されたジメチルシロキサン・メチルハイドロジェンシロキサン共重合体、分子鎖両末端がジメチルハイドロジェンシロキシ基で封鎖されたジメチルシロキサン・メチルフェニルシロキサン共重合体、分子鎖両末端がジメチルハイドロジェンシロキシ基で封鎖されたメチルフェニルポリシロキサン等が挙げられる。なお、(c)成分のオルガノハイドロジェンポリシロキサンは、1種単独で使用しても2種以上を組み合わせて使用してもよい。 Preferred examples of the component (c) organohydrogenpolysiloxane include methylhydrogenpolysiloxane having both molecular chain ends blocked with trimethylsiloxy groups, and dimethylsiloxane having both molecular chain ends blocked with trimethylsiloxy groups.・ Methyl hydrogen siloxane copolymer, dimethyl siloxane with both molecular chain ends blocked with trimethylsiloxy groups ・ Methyl hydrogen siloxane / methyl phenyl siloxane copolymer, both molecular chain ends blocked with dimethyl hydrogen siloxy groups Dimethylpolysiloxane, dimethylsiloxane / methylhydrogensiloxane copolymer blocked at both ends of the molecular chain with dimethylhydrogensiloxy groups, dimethylsiloxane blocked at both ends of the molecular chain with dimethylhydrogensiloxy groups Down-methylphenylsiloxane copolymers, both molecular chain terminals with dimethylhydrogensiloxy methylphenyl polysiloxane blocked with group. The (c) component organohydrogenpolysiloxane may be used alone or in combination of two or more.
(c)成分の配合量は、(c)成分中のSiH基が(a)成分中のアルケニル基1モルに対して0.5~5.0モルとなる量であることが好ましく、より好ましくは0.8~4.0モルとなる量である。(c)成分中のSiH基の量が(a)成分中のアルケニル基1モルに対して0.5モル未満では、組成物が硬化しなかったり、硬化物の強度が不十分であって、成形体、複合体として取り扱うことができない等の問題が発生する場合がある。一方、5.0モルを超える量を使用した場合には、硬化物表面の粘着性が不十分となるおそれがある。 The amount of component (c) is preferably such that the SiH group in component (c) is 0.5 to 5.0 moles per mole of alkenyl group in component (a). Is an amount of 0.8 to 4.0 mol. When the amount of SiH groups in component (c) is less than 0.5 moles relative to 1 mole of alkenyl groups in component (a), the composition does not cure or the strength of the cured product is insufficient, Problems such as being unable to be handled as a molded body or a composite body may occur. On the other hand, when an amount exceeding 5.0 mol is used, there is a risk that the tackiness of the surface of the cured product will be insufficient.
[(d)白金族金属系触媒]
(d)成分の白金族金属系触媒は、(a)成分中のアルケニル基と(c)成分中のケイ素原子に結合した水素原子との付加反応を促進させ、本発明の組成物を三次元網状構造の架橋硬化物に変換するために配合される触媒成分である。
[(D) Platinum group metal catalyst]
The platinum group metal catalyst of component (d) promotes the addition reaction between the alkenyl group in component (a) and the hydrogen atom bonded to the silicon atom in component (c), and the composition of the present invention is three-dimensional. It is a catalyst component blended for conversion into a crosslinked cured product having a network structure.
上記(d)成分は、通常のヒドロシリル化反応に用いられる公知の触媒の中から適宜選択して使用することができる。その具体例としては、例えば、白金(白金黒を含む)、ロジウム、パラジウム等の白金族金属単体、H2PtCl4・nH2O、H2PtCl6・nH2O、NaHPtCl6・nH2O、KHPtCl6・nH2O、Na2PtCl6・nH2O、K2PtCl4・nH2O、PtCl4・nH2O、PtCl2、Na2HPtCl4・nH2O(但し、式中のnは0~6の整数であり、好ましくは0又は6である。)等の塩化白金、塩化白金酸及び塩化白金酸塩、アルコール変性塩化白金酸、塩化白金酸とオレフィンとのコンプレックス、白金黒、パラジウム等の白金族金属を、アルミナ、シリカ、カーボン等の担体に担持させたもの、ロジウム-オレフィンコンプレックス、クロロトリス(トリフェニルフォスフィン)ロジウム(ウィルキンソン触媒)、塩化白金、塩化白金酸又は塩化白金酸塩とビニル基含有シロキサンとのコンプレックス等が挙げられる。これらの白金系化合物は、1種単独で使用しても2種以上を組み合わせて使用してもよい。 The component (d) can be appropriately selected from known catalysts used in ordinary hydrosilylation reactions. Specific examples thereof include platinum group metals such as platinum (including platinum black), rhodium and palladium, H 2 PtCl 4 · nH 2 O, H 2 PtCl 6 · nH 2 O, NaHPtCl 6 · nH 2 O. , KHPtCl 6 · nH 2 O, Na 2 PtCl 6 · nH 2 O, K 2 PtCl 4 · nH 2 O, PtCl 4 · nH 2 O, PtCl 2 , Na 2 HPtCl 4 · nH 2 O (wherein n is an integer of 0 to 6, preferably 0 or 6.), etc.), etc.) Platinum chloride, chloroplatinic acid and chloroplatinate, alcohol-modified chloroplatinic acid, chloroplatinic acid and olefin complex, platinum black , Platinum group metals such as palladium supported on alumina, silica, carbon, etc., rhodium-olefin complex, chlorotris (triphenylphosphine) rhodium (Wilkin) Son catalyst), platinum chloride, chloroplatinic acid, or a complex of chloroplatinate and a vinyl group-containing siloxane. These platinum compounds may be used alone or in combination of two or more.
上記(d)成分の白金族金属系触媒の配合量は、組成物を硬化させるために必要な有効量であればよいが、通常は、(a)成分に対する白金族金属元素の質量換算で、0.1~1,000ppm、好ましくは0.5~500ppmである。 The compounding amount of the platinum group metal catalyst of the component (d) may be an effective amount necessary for curing the composition, but is usually in terms of mass of the platinum group metal element with respect to the component (a), It is 0.1 to 1,000 ppm, preferably 0.5 to 500 ppm.
[(e)反応制御剤]
(e)成分の反応制御剤は、必要により配合される成分で、(d)成分の存在下で進行する(a)成分と(c)成分の付加反応であるヒドロシリル化反応の速度を調整するためのものである。このような(e)成分の反応制御剤は、通常の付加反応硬化型シリコーン組成物に用いられる公知の付加反応制御剤の中から適宜選択することができる。その具体例としては、1-エチニル-1-シクロヘキサノール、3-ブチン-1-オール、エチニルメチリデンカルビノール等のアセチレン化合物、窒素化合物、有機りん化合物、硫黄化合物、オキシム化合物、有機クロロ化合物等が挙げられる。これらの付加反応制御剤は、1種単独で使用することも2種以上を組み合わせて使用することもできる。
[(E) Reaction control agent]
The (e) component reaction control agent is a component that is blended as necessary, and adjusts the rate of the hydrosilylation reaction that is an addition reaction of the (a) component and the (c) component that proceeds in the presence of the (d) component. Is for. Such a reaction control agent of the component (e) can be appropriately selected from known addition reaction control agents used in ordinary addition reaction curable silicone compositions. Specific examples thereof include acetylene compounds such as 1-ethynyl-1-cyclohexanol, 3-butyn-1-ol, ethynylmethylidenecarbinol, nitrogen compounds, organophosphorus compounds, sulfur compounds, oxime compounds, and organic chloro compounds. Is mentioned. These addition reaction control agents can be used alone or in combination of two or more.
上記(e)成分の配合量は、(d)成分の使用量によっても異なるので一概に決定することはできない。ヒドロシリル化反応の進行を所望の反応速度に調整できる有効量であれば足りる。通常、(a)成分の質量に対して、10~50,000ppm程度とするのがよい。(e)成分の配合量が少なすぎると組成物の保存安定性が不十分となり、十分な使用可能時間を確保することができない場合があり、逆に多すぎると組成物の硬化性が低下する場合がある。 The amount of the component (e) is different depending on the amount of the component (d) and cannot be determined in general. Any effective amount that can adjust the progress of the hydrosilylation reaction to a desired reaction rate is sufficient. Usually, the amount is preferably about 10 to 50,000 ppm relative to the mass of component (a). If the amount of the component (e) is too small, the storage stability of the composition may be insufficient, and sufficient usable time may not be ensured. On the other hand, if the amount is too large, the curability of the composition decreases. There is a case.
[(f)シリコーン樹脂]
(f)成分のシリコーン樹脂は、シリコーン熱伝導性組成物を硬化させた硬化物表面に粘着性を付与する作用を有する。このような(f)成分の例としては、R1
3SiO1/2単位(M単位)とSiO4/2単位(Q単位)との共重合体であって、M単位とQ単位の比(モル比)M/Qが0.5~1.5、好ましくは0.6~1.4、更に好ましくは0.7~1.3であるシリコーン樹脂が挙げられる。上記M/Qが上記範囲であると所望の粘着力が得られる。この場合、必要に応じ、R1
2SiO2/2単位(D単位)やR1SiO3/2単位(T単位)を含んでいてもよいが、これらD単位及びT単位の配合は15モル%以下、特に10モル%以下が好ましい。
[(F) Silicone resin]
The silicone resin as component (f) has an action of imparting tackiness to the surface of the cured product obtained by curing the silicone heat conductive composition. Examples of such a component (f) include a copolymer of R 1 3 SiO 1/2 units (M units) and SiO 4/2 units (Q units), and the ratio of M units to Q units. (Molar ratio) A silicone resin having an M / Q of 0.5 to 1.5, preferably 0.6 to 1.4, and more preferably 0.7 to 1.3. When the M / Q is within the above range, desired adhesive strength can be obtained. In this case, R 1 2 SiO 2/2 unit (D unit) or R 1 SiO 3/2 unit (T unit) may be included as necessary, but the blend of these D units and T units is 15 mol. % Or less, and particularly preferably 10 mol% or less.
上記M単位等を表す一般式中のR1は、非置換又は置換の1価の炭化水素基、好ましくは脂肪族不飽和結合を含有しない非置換又は置換の1価炭化水素基である。このようなR1の例としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基等のアルキル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基等のシクロアルキル基、フェニル基、トリル基、キシリル基、ナフチル基、ビフェニリル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基、メチルベンジル基等のアラルキル基、並びにこれらの基の炭素原子に結合している水素原子の一部又は全部が、フッ素、塩素、臭素等のハロゲン原子、シアノ基等で置換された基、例えば、クロロメチル基、2-ブロモエチル基、3-クロロプロピル基、3,3,3-トリフルオロプロピル基、クロロフェニル基、フルオロフェニル基、シアノエチル基、3,3,4,4,5,5,6,6,6-ノナフルオロヘキシル基等の、炭素原子数が1~12、好ましくは炭素原子数が1~6のものが挙げられる。 R 1 in the general formula representing the M unit or the like is an unsubstituted or substituted monovalent hydrocarbon group, preferably an unsubstituted or substituted monovalent hydrocarbon group not containing an aliphatic unsaturated bond. Examples of such R 1 include, for example, methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, tert-butyl group, pentyl group, neopentyl group, hexyl group, heptyl group, octyl group, Nonyl group, decyl group, alkyl group such as dodecyl group, cyclopentyl group, cyclohexyl group, cycloalkyl group such as cycloheptyl group, phenyl group, tolyl group, xylyl group, naphthyl group, aryl group such as biphenylyl group, benzyl group, Aralkyl groups such as phenylethyl group, phenylpropyl group and methylbenzyl group, and part or all of hydrogen atoms bonded to carbon atoms of these groups are halogen atoms such as fluorine, chlorine and bromine, cyano groups, etc. A group substituted with, for example, a chloromethyl group, a 2-bromoethyl group, a 3-chloropropyl group, 1,3,3-trifluoropropyl group, chlorophenyl group, fluorophenyl group, cyanoethyl group, 3,3,4,4,5,5,6,6,6-nonafluorohexyl group, etc. And those having 1 to 6 carbon atoms, preferably 1 to 6 carbon atoms.
R1としては、これらの中でも、メチル基、エチル基、プロピル基、クロロメチル基、ブロモエチル基、3,3,3-トリフルオロプロピル基、シアノエチル基等の炭素原子数1~3の非置換又は置換のアルキル基、及びフェニル基、クロロフェニル基、フルオロフェニル基等の非置換又は置換のフェニル基が好ましい。また、R1は全てが同一であっても異なっていてもよい。R1は、耐溶剤性等の特殊な特性を要求されない限り、コスト、その入手のしやすさ、化学的安定性、環境負荷等の観点から、全てメチル基であることが好ましい。 As R 1 , among these, an unsubstituted or substituted group having 1 to 3 carbon atoms such as a methyl group, an ethyl group, a propyl group, a chloromethyl group, a bromoethyl group, a 3,3,3-trifluoropropyl group, a cyanoethyl group, etc. A substituted alkyl group and an unsubstituted or substituted phenyl group such as a phenyl group, a chlorophenyl group and a fluorophenyl group are preferred. R 1 may all be the same or different. Unless special characteristics such as solvent resistance are required, R 1 is preferably all methyl groups from the viewpoints of cost, availability, chemical stability, environmental burden, and the like.
(f)成分の配合量は、(a)成分100質量部に対して50~500質量部であることが好ましく、より好ましくは60~350質量部であり、更に好ましくは70~250質量部である。(f)成分の配合量が、50質量部未満であるか500質量部を超える場合には、所望の粘着性が得られなくなる場合がある。 Component (f) is preferably blended in an amount of 50 to 500 parts by weight, more preferably 60 to 350 parts by weight, and still more preferably 70 to 250 parts by weight with respect to 100 parts by weight of component (a). is there. (F) When the compounding quantity of a component is less than 50 mass parts or exceeds 500 mass parts, desired adhesiveness may no longer be obtained.
なお、(f)成分そのものは室温で固体又は粘稠な液体であるが、溶剤に溶解した状態で使用することも可能である。その場合、組成物への添加量は、溶剤分を除いた量で決定される。 In addition, although the component (f) itself is a solid or viscous liquid at room temperature, it can be used in a state dissolved in a solvent. In that case, the amount added to the composition is determined by the amount excluding the solvent.
次に、上記シリコーン熱伝導性組成物(II)の各成分について説明する。
[(b)熱伝導性充填剤]
(b)成分の熱伝導性充填剤としては、上述したシリコーン熱伝導性組成物(I)の熱伝導性充填剤と同様のものが例示できる。
Next, each component of the silicone thermal conductive composition (II) will be described.
[(B) Thermally conductive filler]
Examples of the heat conductive filler of component (b) include the same heat conductive fillers as those of the silicone heat conductive composition (I) described above.
熱伝導性充填剤の配合量としては、(f)成分100質量部に対して100~3,000質量部であることが好ましく、より好ましくは200~2,500質量部である。熱伝導性充填剤の配合量が少なすぎると、熱伝導性樹脂層の熱伝導率が十分得られない場合があり、配合量が多すぎると成形性が悪化し、粘着性が低下してしまう場合がある。 The blending amount of the thermally conductive filler is preferably 100 to 3,000 parts by mass, more preferably 200 to 2,500 parts by mass with respect to 100 parts by mass of the component (f). If the blending amount of the heat conductive filler is too small, the thermal conductivity of the heat conductive resin layer may not be sufficiently obtained. If the blending amount is too large, the moldability deteriorates and the adhesiveness decreases. There is a case.
[(f)シリコーン樹脂]
(f)成分のシリコーン樹脂としては、上述したシリコーン熱伝導性組成物(I)のシリコーン樹脂と同様のものを例示することができる。
[(F) Silicone resin]
Examples of the silicone resin of component (f) include the same silicone resins as those of the above-described silicone thermal conductive composition (I).
[(g)有機過酸化物系化合物]
有機過酸化物によるシリコーン組成物の硬化反応は、分子鎖末端(片末端又は両末端)及び分子鎖側鎖のどちらか一方又はその両方にビニル基等のアルケニル基を有する直鎖状オルガノポリシロキサンを有機過酸化物系化合物存在下でラジカル重合させることにより起こる。(g)成分である有機過酸化物系化合物としては、ジアシルパーオキサイド、ジアルキルパーオキサイド等が挙げられる。有機過酸化物系化合物は、光や熱に弱く、不安定であること、固体の有機過酸化物系化合物を組成物に分散させるのが困難であることから、有機溶媒に希釈させたり、シリコーン成分に分散させた状態で用いられる場合が多い。
[(G) Organic peroxide compound]
The curing reaction of the silicone composition with an organic peroxide is a linear organopolysiloxane having an alkenyl group such as a vinyl group at one or both of the molecular chain terminal (one terminal or both terminals) and the molecular chain side chain. Is caused by radical polymerization in the presence of an organic peroxide compound. Examples of the organic peroxide compound as component (g) include diacyl peroxide and dialkyl peroxide. Organic peroxide compounds are vulnerable to light and heat, are unstable, and it is difficult to disperse solid organic peroxide compounds in the composition. It is often used in a state dispersed in components.
有機過酸化物系化合物の配合量は、(f)シリコーン樹脂100質量部に対して有機過酸化物換算で0.1~2質量部が好ましく、0.1~1.6質量部がより好ましい。配合量が少なすぎると硬化反応が十分進行しない場合があり、多すぎると組成物の安定性に欠ける場合がある。 The compounding amount of the organic peroxide compound is preferably 0.1 to 2 parts by mass, more preferably 0.1 to 1.6 parts by mass in terms of organic peroxide with respect to 100 parts by mass of (f) silicone resin. . If the amount is too small, the curing reaction may not proceed sufficiently, and if it is too large, the composition may lack stability.
[その他の成分]
熱伝導性粘着層を構成するシリコーン熱伝導性組成物には、必要に応じて、本発明の目的を損なわない範囲で、上記成分以外の成分を添加することができる。
[Other ingredients]
Components other than the above components can be added to the silicone heat conductive composition constituting the heat conductive pressure-sensitive adhesive layer, if necessary, as long as the object of the present invention is not impaired.
シリコーン熱伝導性組成物には、組成物の調製時に(b)成分の熱伝導性充填剤を疎水化処理して組成物(I)における(a)成分のオルガノポリシロキサンあるいは組成物(II)における(f)成分のシリコーン樹脂との濡れ性を向上させ、該熱伝導性充填剤を(a)成分あるいは(f)成分からなるマトリックス中に均一に分散させることを目的として、表面処理剤(ウェッター)(h)を配合することができる。この(h)成分としては、特に下記の(h-1)及び(h-2)が好ましい。 The silicone heat conductive composition is prepared by hydrophobizing the component (b) heat conductive filler during preparation of the composition, and the component (a) organopolysiloxane or the composition (II) in the composition (I). In order to improve the wettability of the component (f) with the silicone resin and to uniformly disperse the thermally conductive filler in the matrix comprising the component (a) or the component (f), a surface treatment agent ( Wetter) (h) can be blended. As the component (h), the following (h-1) and (h-2) are particularly preferable.
(h-1):下記一般式(2)で表されるアルコキシシラン化合物
R2
bR3
cSi(OR4)4-b-c (2)
(式中、R2は独立に炭素原子数6~15のアルキル基、R3は独立に非置換又は置換の炭素原子数1~8の1価炭化水素基、R4は独立に炭素原子数1~6のアルキル基であり、bは1~3の整数、cは0,1又は2であり、b+cは1~3の整数である。)
(H-1): alkoxysilane compound represented by the following general formula (2) R 2 b R 3 c Si (OR 4 ) 4-bc (2)
Wherein R 2 is independently an alkyl group having 6 to 15 carbon atoms, R 3 is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 8 carbon atoms, and R 4 is independently carbon atoms. An alkyl group of 1 to 6, b is an integer of 1 to 3, c is 0, 1 or 2, and b + c is an integer of 1 to 3.)
上記一般式(1)におけるR2で表されるアルキル基としては、例えば、ヘキシル基、オクチル基、ノニル基、デシル基、ドデシル基、テトラデシル基等が挙げられる。このように、R2で表されるアルキル基の炭素原子数が6~15の範囲であると、(b)成分の熱伝導性充填剤の濡れ性が十分に向上し、取り扱い作業性がよくなるので、組成物の低温特性が良好なものとなる。 Examples of the alkyl group represented by R 2 in the general formula (1) include hexyl group, octyl group, nonyl group, decyl group, dodecyl group, and tetradecyl group. Thus, when the number of carbon atoms of the alkyl group represented by R 2 is in the range of 6 to 15, the wettability of the thermally conductive filler of the component (b) is sufficiently improved and the handling workability is improved. Therefore, the low temperature characteristics of the composition are good.
また、上記R3で表される非置換又は置換の1価炭化水素基としては、例えば、メチル基、エチル基、プロピル基、ヘキシル基、オクチル基等のアルキル基;シクロペンチル基、シクロヘキシル基等のシクロアルキル基;ビニル基、アリル基等のアルケニル基;フェニル基、トリル基等のアリール基;2-フェニルエチル基、2-メチル-2-フェニルエチル基等のアラルキル基;3,3,3-トリフルオロプロピル基、2-(ノナフルオロブチル)エチル基、2-(へプタデカフルオロオクチル)エチル基、p-クロロフェニル基等のハロゲン化炭化水素基等が挙げられる。本発明においては、これらの中でも、特にメチル基及びエチル基が好ましい。 Examples of the unsubstituted or substituted monovalent hydrocarbon group represented by R 3 include alkyl groups such as a methyl group, an ethyl group, a propyl group, a hexyl group, and an octyl group; a cyclopentyl group, a cyclohexyl group, and the like. Cycloalkyl group; alkenyl group such as vinyl group and allyl group; aryl group such as phenyl group and tolyl group; aralkyl group such as 2-phenylethyl group and 2-methyl-2-phenylethyl group; Examples thereof include halogenated hydrocarbon groups such as trifluoropropyl group, 2- (nonafluorobutyl) ethyl group, 2- (heptadecafluorooctyl) ethyl group, and p-chlorophenyl group. In the present invention, among these, a methyl group and an ethyl group are particularly preferable.
上記R4で表されるアルキル基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基等が挙げられる。本発明においては、これらの中でも、特にメチル基及びエチル基が好ましい。 Examples of the alkyl group represented by R 4 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, and a hexyl group. In the present invention, among these, a methyl group and an ethyl group are particularly preferable.
上記(h-1)成分の好適な具体例としては、下記のものを挙げることができる。
C6H13Si(OCH3)3
C10H21Si(OCH3)3
C12H25Si(OCH3)3
C12H25Si(OC2H5)3
C10H21Si(CH3)(OCH3)2
C10H21Si(C6H5)(OCH3)2
C10H21Si(CH3)(OC2H5)2
C10H21Si(CH=CH2)(OCH3)2
C10H21Si(CH2CH2CF3)(OCH3)2
Preferable specific examples of the component (h-1) include the following.
C 6 H 13 Si (OCH 3 ) 3
C 10 H 21 Si (OCH 3 ) 3
C 12 H 25 Si (OCH 3 ) 3
C 12 H 25 Si (OC 2 H 5 ) 3
C 10 H 21 Si (CH 3 ) (OCH 3 ) 2
C 10 H 21 Si (C 6 H 5 ) (OCH 3 ) 2
C 10 H 21 Si (CH 3 ) (OC 2 H 5 ) 2
C 10 H 21 Si (CH═CH 2 ) (OCH 3 ) 2
C 10 H 21 Si (CH 2 CH 2 CF 3 ) (OCH 3 ) 2
上記(h-1)成分は、1種単独で使用しても2種以上を組み合わせて使用してもよい。(h-1)成分の配合量は、後述する配合量を超えてもそれ以上ウェッター効果が増大することがないので不経済である。またこの成分は揮発性があるので、開放系で放置すると組成物及び硬化後の硬化物が徐々に硬くなるので、必要最低限の量に止めることが好ましい。 The component (h-1) may be used alone or in combination of two or more. Even if the amount of component (h-1) exceeds the amount described later, the wetter effect does not increase any more, which is uneconomical. Moreover, since this component is volatile, if it is left in an open system, the composition and the cured product after curing gradually harden, so it is preferable to keep the amount to the minimum necessary amount.
(h-2):下記一般式(3)で表される分子鎖片末端がトリアルコキシシリル基で封鎖されたジメチルポリシロキサン
上記(h-2)成分の好適な具体例としては、下記のものを挙げることができる。
なお、(h-2)成分は1種単独で使用しても、2種以上を組み合わせて使用してもよい。この(h-2)成分の配合量が後述する配合量を超えると、得られる硬化物の耐熱性や耐湿性が低下する傾向がある。 In addition, the component (h-2) may be used alone or in combination of two or more. When the blending amount of the component (h-2) exceeds the blending amount described later, the heat resistance and moisture resistance of the resulting cured product tend to decrease.
本発明においては、(b)成分の表面処理剤として、前記(h-1)成分と(h-2)成分からなる群の中から選択した少なくとも1種を選択して使用することができる。この場合、組成物(I)において、全(h)成分の配合量は、(a)成分100質量部に対して0.01~50質量部であることが好ましく、特に0.1~30質量部であることが好ましい。また、組成物(II)において、全(h)成分の配合量は、(f)成分100質量部に対して0.01~50質量部であることが好ましく、特に0.1~30質量部であることが好ましい。 In the present invention, as the surface treating agent for component (b), at least one selected from the group consisting of component (h-1) and component (h-2) can be selected and used. In this case, in the composition (I), the blending amount of all the components (h) is preferably 0.01 to 50 parts by mass, particularly 0.1 to 30 parts by mass with respect to 100 parts by mass of the component (a). Part. In the composition (II), the blending amount of all the components (h) is preferably 0.01 to 50 parts by mass, particularly 0.1 to 30 parts by mass with respect to 100 parts by mass of the component (f). It is preferable that
本発明においては、その他の任意成分として、例えば、フッ素変性シリコーン界面活性剤、着色剤としてカーボンブラック、二酸化チタン等を添加してもよい。更に、熱伝導性充填剤の沈降防止や補強を目的として、沈降性シリカ又は焼成シリカ等の微粉末シリカ、チクソ性向上剤等を適宜添加することもできる。 In the present invention, as other optional components, for example, a fluorine-modified silicone surfactant and carbon black, titanium dioxide or the like as a colorant may be added. Furthermore, fine powder silica such as precipitated silica or calcined silica, thixotropic improver, etc. can be added as appropriate for the purpose of preventing or reinforcing the heat conductive filler.
シリコーン熱伝導性組成物は、上記(a)~(f)成分又は(b)、(f)、(g)成分、及び必要に応じてその他の成分を常法に準じて混合することにより調製することができる。
なお、シリコーン熱伝導性組成物の硬化条件としては、公知の付加反応硬化型シリコーンゴム組成物や有機過酸化物硬化型シリコーンゴム組成物と同様でよい。
The silicone thermal conductive composition is prepared by mixing the above components (a) to (f) or (b), (f), (g), and other components as required according to a conventional method. can do.
The curing conditions for the silicone thermally conductive composition may be the same as those for known addition reaction curable silicone rubber compositions and organic peroxide curable silicone rubber compositions.
[熱伝導性複合シートの製造方法]
本発明の熱伝導性複合シートは、例えば上記シリコーン熱伝導性組成物を、熱伝導層上に上記厚さとなるようにコーティングし、硬化させて熱伝導性粘着層とすることにより得られる。コーティング方法としては、バーコーター、ナイフコーター、コンマコーター、スピンコーター等を用いて、熱伝導層上に液状の組成物を薄膜状に塗布する方法が挙げられるが、本発明においてはこれらの方法に限定されるものではない。
[Method for producing thermally conductive composite sheet]
The heat conductive composite sheet of the present invention can be obtained, for example, by coating the silicone heat conductive composition on the heat conductive layer so as to have the thickness described above and curing it to form a heat conductive adhesive layer. Examples of the coating method include a method in which a liquid composition is applied in the form of a thin film on the heat conductive layer using a bar coater, knife coater, comma coater, spin coater or the like. In the present invention, these methods are used. It is not limited.
なお、本発明の熱伝導性複合シートは、熱伝導層の片面に熱伝導性粘着層を積層させることが必要であるが、熱伝導層のもう一方の片面には断熱、絶縁性を目的としてPETフィルムなどのプラスチックフィルムを積層させてもよい。 In addition, although the heat conductive composite sheet of this invention needs to laminate | stack a heat conductive adhesion layer on the single side | surface of a heat conductive layer, it aims at heat insulation and insulation on the other side of a heat conductive layer. A plastic film such as a PET film may be laminated.
本発明の上記熱伝導性複合シートは、発熱する電子部品とエアーギャップ(空隙)を設けて向かい合うように上記熱伝導性複合シートを配置した放熱構造体として用いることができ、この構造体は、電子部品から発生した熱を、エアーギャップを介して熱伝導性複合シートに伝熱して拡散させるものである。 The heat conductive composite sheet of the present invention can be used as a heat dissipation structure in which the heat conductive composite sheet is disposed so as to face each other by providing an air gap (air gap) with an electronic component that generates heat. The heat generated from the electronic component is transferred to the thermally conductive composite sheet through the air gap and diffused.
具体的には、スマートフォンやタブレットPC、ウルトラブックと呼ばれる携帯可能な電子端末において、図2に示すように、端末背面のケース11の内側に、上記熱伝導性複合シート12を端末背面のケース11と熱伝導性粘着層12aとが接触するように貼り付け、バッテリー13やモジュールに代表されるような電子部品等のパッケージ14などと熱伝導性複合シート12の熱伝導層12bとが接触することのないよう、任意の、具体的には0.01~2mm、特に0.1~1mmのエアーギャップ15を設けて向かい合うように配置した放熱構造体とすることが好ましく、この構造体とすることにより、端末背面のケース11上の温度の偏りをなくすことができる。なお、図2中、16はタッチパネルである。
Specifically, in a portable electronic terminal called a smartphone, a tablet PC, or an ultrabook, as shown in FIG. 2, the thermal conductive
以下に、実施例及び比較例を示し、本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。 Hereinafter, the present invention will be specifically described with reference to examples and comparative examples. However, the present invention is not limited to the following examples.
実施例及び比較例を行うに当り、熱伝導性複合シートの成型方法を以下に記載する。
(熱伝導層)
アルミニウム箔:厚み50μm、面方向の熱伝導率237W/mK
アルミニウム箔:厚み70μm、面方向の熱伝導率237W/mK
アルミニウム箔:厚み200μm、面方向の熱伝導率237W/mK
銅箔:厚み30μm、面方向の熱伝導率398W/mK
黒鉛由来のグラファイトシート:厚み50μm、面方向の熱伝導率500W/mK
黒鉛由来のグラファイトシート:厚み100μm、面方向の熱伝導率600W/mK
In carrying out Examples and Comparative Examples, a method for molding a heat conductive composite sheet will be described below.
(Thermal conduction layer)
Aluminum foil: 50 μm thick, thermal conductivity in the plane direction 237 W / mK
Aluminum foil: thickness 70 μm, surface direction thermal conductivity 237 W / mK
Aluminum foil: thickness 200 μm, surface direction thermal conductivity 237 W / mK
Copper foil: 30 μm thick, thermal conductivity in the plane direction 398 W / mK
Graphite sheet derived from graphite: thickness 50 μm, surface direction thermal conductivity 500 W / mK
Graphite sheet derived from graphite: thickness 100 μm, thermal conductivity in the plane direction 600 W / mK
(熱伝導性粘着層)
下記に示す材料を用い、表1,2に示す組成で組成物i~iv及びv~viiiを得た。なお、材料の混練にはプラネタリーミキサーを用いた。
(Thermal conductive adhesive layer)
Compositions i to iv and v to viii were obtained with the compositions shown in Tables 1 and 2 using the materials shown below. A planetary mixer was used for kneading the materials.
(a)成分:
(a-1)25℃における動粘度が600mm2/sであり、分子鎖両末端がジメチルビニルシロキシ基で封鎖されたジメチルポリシロキサン
(a-2)25℃における動粘度が30,000mm2/sであり、分子鎖両末端がジメチルビニルシロキシ基で封鎖されたジメチルポリシロキサン
(A) Component:
(A-1) Kinematic viscosity at 25 ° C. is 600 mm 2 / s, and dimethylpolysiloxane having both molecular chain ends blocked with dimethylvinylsiloxy groups (a-2) Kinematic viscosity at 25 ° C. is 30,000 mm 2 / s dimethylpolysiloxane having both ends of the molecular chain blocked with dimethylvinylsiloxy groups
(b)成分:
(b-1)平均粒径10μmの酸化アルミニウム粉末
(b-2)平均粒径1μmの酸化アルミニウム粉末
(B) Component:
(B-1) Aluminum oxide powder having an average particle size of 10 μm (b-2) Aluminum oxide powder having an average particle size of 1 μm
(c)成分:
下記構造式で表されるメチルハイドロジェンポリシロキサン
Methyl hydrogen polysiloxane represented by the following structural formula
(d)成分:
5質量%塩化白金酸2-エチルヘキサノール溶液
(D) Component:
5 mass% chloroplatinic acid 2-ethylhexanol solution
(e)成分:
付加反応制御剤として、エチニルメチリデンカルビノール
(E) Component:
Ethinylmethylidenecarbinol as an addition reaction control agent
(f)成分:
(f-1)実質的に、Me3SiO0.5単位(M単位)とSiO2単位(Q単位)のみからなるシリコーン樹脂(M/Qモル比は1.15)のトルエン溶液(不揮発分60%;25℃における動粘度30mm2/s)
(f-2)実質的に、Me3SiO0.5単位(M単位)とSiO2単位(Q単位)のみからなるシリコーン樹脂(M/Qモル比は0.85)のトルエン溶液(不揮発分70%;25℃における動粘度30mm2/s)
(f-3)実質的に、Me3SiO0.5単位(M単位)とSiO2単位(Q単位)のみからなるシリコーン樹脂(M/Qモル比は0.7)のトルオール溶液(不揮発分60%;25℃における動粘度8mm2/s)
(f-4)KR-101-10(シリコーン樹脂粘着剤、信越化学工業(株)製)
(F) Component:
(F-1) A toluene solution (60% non-volatile content) of a silicone resin (M / Q molar ratio is 1.15) consisting essentially of Me 3 SiO 0.5 unit (M unit) and SiO 2 unit (Q unit) ; Kinematic viscosity at 25 ° C. 30 mm 2 / s)
(F-2) A toluene solution of a silicone resin (M / Q molar ratio is 0.85) consisting essentially of Me 3 SiO 0.5 units (M units) and SiO 2 units (Q units) (nonvolatile content: 70% ; Kinematic viscosity at 25 ° C. 30 mm 2 / s)
(F-3) A toluene solution of a silicone resin (M / Q molar ratio is 0.7) consisting essentially of Me 3 SiO 0.5 units (M units) and SiO 2 units (Q units) (nonvolatile content 60% ; Kinematic viscosity at 25 ° C. 8 mm 2 / s)
(F-4) KR-101-10 (silicone resin adhesive, manufactured by Shin-Etsu Chemical Co., Ltd.)
(g)成分:
ナイパーBMT-K40(ジベンゾイルパーオキサイドの40質量%キシレン溶液、日本油脂株式会社製)
(G) Component:
NIPER BMT-K40 (40% by weight xylene solution of dibenzoyl peroxide, manufactured by NOF Corporation)
(h)成分:
下記構造式で表される分子鎖片末端がトリメトキシシリル基で封鎖されたジメチルポリシロキサン
Dimethylpolysiloxane with one end of a molecular chain represented by the following structural formula blocked with a trimethoxysilyl group
得られた組成物i~iv及びv~viiiについて、下記に示す方法により熱伝導率及び剥離接着強度を測定した。結果を表1,2に併記する。 For the obtained compositions i to iv and v to viii, the thermal conductivity and peel adhesive strength were measured by the following methods. The results are shown in Tables 1 and 2.
〔熱伝導率〕
レーザーフラッシュ法を用いて測定した。
〔Thermal conductivity〕
Measurement was performed using a laser flash method.
〔剥離接着強度〕
室温(25℃)下、120℃で10分間の条件で硬化させた25mm幅、厚み100μmの組成物i~iv及びv~viiiの硬化物層の片面を厚さ1mmのアルミニウム板に当て、質量2kgのゴムローラーで圧着して接着後10分間養生し、次いで上記アルミニウム板と接着されていない組成物i~iv及びv~viiiの硬化物層の他方の片面を厚さ0.1mmのPET(ポリエチレンテレフタレート)フィルムに同様に接着させ、JIS Z 0237に準じて、熱伝導性粘着層の一端を上記アルミニウム板から引き剥がし、引き剥がした部分から引張り試験機を用い、引張り速度300mm/minにて180°方向に前記アルミニウム板から組成物i~iv及びv~viiiの硬化物層を引き剥がし、この引き剥がしに要した力(熱伝導性粘着層の剥離接着強度)をそれぞれ測定した。
[Peeling adhesive strength]
One side of a cured product layer having a width of 25 mm and a thickness of 100 μm cured at room temperature (25 ° C.) at 120 ° C. for 10 minutes was applied to an aluminum plate having a thickness of 1 mm. After pressure bonding with a 2 kg rubber roller and curing for 10 minutes, the other side of the cured layers of the compositions i to iv and v to viii not bonded to the aluminum plate was coated with a 0.1 mm thick PET ( Polyethylene terephthalate) film was adhered in the same manner, and in accordance with JIS Z 0237, one end of the heat conductive adhesive layer was peeled off from the aluminum plate, and a tensile tester was used from the peeled portion at a pulling speed of 300 mm / min. The cured product layers of the compositions i to iv and v to viii were peeled off from the aluminum plate in the direction of 180 °, and the force (heat Peel adhesion strength of the conductive adhesive layer) were measured.
[実施例1~6]
表3に示す材料を用いて熱伝導性複合シートを作製した。上記で得られた組成物i~ivに対して、トルエンを適量添加し、この溶液を熱伝導層上にスペーサーを用いてコーティングし、80℃,10分でトルエンを揮発させ、続いて120℃,10分で硬化させた。
熱伝導層の熱伝導性粘着層を積層させた側を表面とし、その反対の面を裏面とした。裏面に積層させる場合も同様に、コーティング成形を行った。実施例5の場合、組成物iをアルミニウム箔に塗工した後に、アルミニウム箔の裏面に粘着性を有さないPCS-CR-10(フェイズチェンジマテリアル、信越化学工業(株)製、熱伝導率2.0W/mK)をラミネートして得た。
[Examples 1 to 6]
A thermally conductive composite sheet was prepared using the materials shown in Table 3. An appropriate amount of toluene was added to the compositions i to iv obtained above, and this solution was coated on the heat conducting layer with a spacer, and the toluene was volatilized at 80 ° C. for 10 minutes, followed by 120 ° C. , Cured in 10 minutes.
The side of the heat conductive layer on which the heat conductive adhesive layer was laminated was the front surface, and the opposite surface was the back surface. In the case of laminating on the back surface, coating molding was performed in the same manner. In the case of Example 5, after coating composition i on an aluminum foil, PCS-CR-10 (Phase Change Material, manufactured by Shin-Etsu Chemical Co., Ltd., thermal conductivity, which does not have adhesiveness on the back surface of the aluminum foil) 2.0 W / mK).
[比較例1~5]
表4に示す材料を用いて熱伝導性複合シートを作製した。比較例2は実施例と同様にして、比較例5は組成物i~ivに代えてPCS-CR-10(信越化学工業(株)製)を用いた以外は実施例と同様にして熱伝導性複合シートを作製した。
また、比較例3は熱伝導層のみであり、比較例4はTC-20CG(信越化学工業(株)製、熱伝導層を有さず、粘着性を持たない一般的な熱伝導性シート、厚さ0.2mm、熱伝導率1.7W/mK)を用い、比較例1は、組成物iにトルエンを適量添加し、フッ素処理PETフィルム上に塗工し、80℃で10分間乾燥した後に120℃で10分間加熱硬化させる方法により、厚み200μmの組成物iの硬化物層のみからなる熱伝導性シートを作製した。
[Comparative Examples 1 to 5]
A thermally conductive composite sheet was prepared using the materials shown in Table 4. Comparative Example 2 was conducted in the same manner as in Example, and Comparative Example 5 was conducted in the same manner as in Example except that PCS-CR-10 (manufactured by Shin-Etsu Chemical Co., Ltd.) was used instead of compositions i to iv. A functional composite sheet was prepared.
Comparative Example 3 is only a heat conductive layer, and Comparative Example 4 is TC-20CG (manufactured by Shin-Etsu Chemical Co., Ltd.), which does not have a heat conductive layer and does not have adhesiveness, In Comparative Example 1, an appropriate amount of toluene was added to the composition i, applied onto a fluorinated PET film, and dried at 80 ° C. for 10 minutes. The thickness was 0.2 mm and the thermal conductivity was 1.7 W / mK. A thermally conductive sheet consisting only of a cured product layer of the composition i having a thickness of 200 μm was subsequently produced by a method of heat curing at 120 ° C. for 10 minutes.
このようにして得られた実施例及び比較例の熱伝導性(複合)シートについて、下記に示す方法により、熱源から5mm離れた点の温度を測定した。これらの結果を表3,4に併記する。
For the heat conductive (composite) sheets of Examples and Comparative Examples thus obtained, the temperature at a
〔熱源から5mm離れた点の温度〕
得られた熱伝導性複合シートに対して、100℃一定になるように制御された15mm×15mm角の熱源を400g荷重を掛けて、熱伝導性粘着層に接触させた。接触させてから1分後の、熱源の端部から5mm離れた点の熱伝導性粘着層表面の温度を測定した。
[Temperature at a point 5mm away from the heat source]
The obtained heat conductive composite sheet was brought into contact with the heat conductive adhesive layer by applying a load of 400 g with a heat source of 15 mm × 15 mm square controlled to be constant at 100 ° C. One minute after contact, the temperature of the surface of the heat conductive adhesive layer at a
実施例1~6のように、0.4W/mK以上の熱伝導率を有し、かつ高い剥離接着強度を持つ熱伝導性粘着層を熱伝導層に積層させることで、実装の際にICチップによく接着し、かつICチップから発生する熱を素早く熱伝導層に伝えることができ、熱伝導層がその熱を拡散させることができる、熱伝導性複合シートを得た。
比較例1のように熱伝導層を持たないと、面方向の熱伝導性が著しく悪くなり、十分な熱拡散性が得られない。比較例2のように粘着層に十分な熱伝導性がないと、熱源からの熱を素早く熱伝導層に伝えることができず、十分な熱拡散性が得られない。比較例3のように、熱伝導性粘着層を持たないと熱源との接触が悪くなり、熱源からの熱が熱伝導層にスムーズに伝わらず、十分な熱拡散性が得られない。比較例4のように、熱伝導層を持たず、更に粘着性を有していないと、十分な熱拡散性が得られないし、すぐに熱源から剥がれてしまう。比較例5のように信越化学工業(株)製のPCS-CR-10(粘着性なし)の熱伝導層と積層させると、熱源との接触がよく、熱拡散性は得られるが、十分な接着強度が得られない。
As in Examples 1 to 6, a thermal conductive adhesive layer having a thermal conductivity of 0.4 W / mK or higher and having a high peel adhesive strength is laminated on the thermal conductive layer, so that an IC can be mounted at the time of mounting. A heat conductive composite sheet was obtained that adheres well to the chip and can quickly transfer heat generated from the IC chip to the heat conductive layer, and the heat conductive layer can diffuse the heat.
If the heat conductive layer is not provided as in Comparative Example 1, the heat conductivity in the surface direction is remarkably deteriorated and sufficient heat diffusibility cannot be obtained. If the adhesive layer does not have sufficient thermal conductivity as in Comparative Example 2, heat from the heat source cannot be quickly transmitted to the thermal conductive layer, and sufficient thermal diffusivity cannot be obtained. If the heat conductive adhesive layer is not provided as in Comparative Example 3, the contact with the heat source is deteriorated, the heat from the heat source is not smoothly transferred to the heat conductive layer, and sufficient heat diffusibility cannot be obtained. If the thermal conductive layer is not provided and the adhesiveness is not further provided as in Comparative Example 4, sufficient thermal diffusivity cannot be obtained, and the thermal source is readily peeled off. When laminated with the heat conductive layer of PCS-CR-10 (non-adhesive) manufactured by Shin-Etsu Chemical Co., Ltd. as in Comparative Example 5, the contact with the heat source is good and the thermal diffusivity is obtained, but sufficient Adhesive strength cannot be obtained.
[実施例7~12、比較例6,7]
表5に示す材料を用いて熱伝導性複合シートを作製した。上記で得られた組成物v~viiiに対して、トルエンを適量添加し、この溶液を熱伝導層上にスペーサーを用いてコーティングし、80℃,10分でトルエンを揮発させ、続いて120℃,10分で硬化させた。また、表6に示す材料を用い、実施例と同様にして比較例6,7の熱伝導性複合シートを作製した。
[Examples 7 to 12, Comparative Examples 6 and 7]
A thermally conductive composite sheet was produced using the materials shown in Table 5. An appropriate amount of toluene is added to the compositions v to viii obtained above, this solution is coated on the heat conductive layer with a spacer, and the toluene is volatilized at 80 ° C. for 10 minutes, followed by 120 ° C. , Cured in 10 minutes. Moreover, the heat conductive composite sheet of the comparative examples 6 and 7 was produced like the Example using the material shown in Table 6.
このようにして得られた実施例及び比較例の熱伝導性複合シートについて、下記に示す方法により、ポリカーボネート上の温度を測定した。なお、比較例6は熱伝導性複合シートを用いないものである。これらの結果を表5,6に併記する。 For the heat conductive composite sheets of Examples and Comparative Examples thus obtained, the temperature on the polycarbonate was measured by the method described below. Note that Comparative Example 6 does not use a heat conductive composite sheet. These results are also shown in Tables 5 and 6.
[評価方法]
図1に示すように、得られた熱伝導性複合シート1の熱伝導性粘着層1a側をポリカーボネート製のプラスチックケース(100mm×100mm×2mmt)2に貼り合せたものを、15mm×15mmの熱源(80℃一定)3と0.5mmの距離を取るように設置し(熱源3と熱伝導層1bが向かい合わせになる)、熱源3を設置してから30分後に、ポリカーボネート2上の熱源3の中心に当たる温度測定点4部分の温度を測定した。なお、図1中、5は高さ10mmの金属枠、6は断熱素材である。
[Evaluation methods]
As shown in FIG. 1, a heat source of 15 mm × 15 mm is obtained by bonding the heat conductive
実施例7~12のように、面方向の高い熱伝導率を有する熱伝導層の片面に0.4W/mK以上の熱伝導率を有する熱伝導性粘着層を積層させてなり、更に熱伝導層の厚みを1としたときに熱伝導性粘着層が1.1以下である熱伝導性複合シートは、熱源からの熱を効率的に拡散することができる。また、実施例7と実施例8を比べた場合、熱伝導性複合シートの総厚が同じでも熱伝導層の厚みを1としたときの熱伝導性粘着層の厚みの比率が低い方が、ポリカーボネート上の温度が上がっていない。 As in Examples 7 to 12, a heat conductive adhesive layer having a thermal conductivity of 0.4 W / mK or more is laminated on one side of a heat conductive layer having a high thermal conductivity in the surface direction, and further heat conduction. When the thickness of the layer is 1, the heat conductive composite sheet having a heat conductive adhesive layer of 1.1 or less can efficiently diffuse the heat from the heat source. Moreover, when Example 7 and Example 8 are compared, the one where the ratio of the thickness of the heat conductive adhesive layer when the total thickness of the heat conductive composite sheet is the same when the thickness of the heat conductive layer is 1 is lower, The temperature on the polycarbonate is not rising.
比較例6では、熱伝導性複合シートを用いなかった。この場合、ポリカーボネート上の温度が60℃以上に達した。電子端末に実装したときを考えると、使用者の使用感が損なわれ、最悪の場合、低温やけどのおそれがある。比較例7は、実施例7と比べて熱伝導性粘着層の熱伝導率が0.1W/mKと低いために、熱伝導層を1とした時に熱伝導性粘着層の厚みが1.1以下であるにもかかわらずポリカーボネート上の温度が高くなっている。 In Comparative Example 6, no heat conductive composite sheet was used. In this case, the temperature on the polycarbonate reached 60 ° C. or higher. When mounted on an electronic terminal, the user's feeling of use is impaired, and in the worst case, there is a risk of low temperature burns. In Comparative Example 7, the thermal conductivity of the heat conductive adhesive layer is as low as 0.1 W / mK as compared with Example 7, so that when the heat conductive layer is 1, the thickness of the heat conductive adhesive layer is 1.1. Despite the following, the temperature on the polycarbonate is high.
1 熱伝導性複合シート
1a 熱伝導性粘着層
1b 熱伝導層
2 ポリカーボネート
3 熱源
4 温度測定点
5 金属枠
6 断熱素材
11 端末背面ケース
12 熱伝導性複合シート
12a 熱伝導性粘着層
12b 熱伝導層
13 バッテリー
14 パッケージ
15 エアーギャップ
16 タッチパネル
DESCRIPTION OF
Claims (12)
(a)下記平均組成式(1)
RaSiO(4-a)/2 (1)
(式中、Rは独立に炭素原子数1~10の非置換又は置換の1価炭化水素基であり、aは1.8~2.2の正数である。)
で示されるケイ素原子に結合したアルケニル基を1分子中に2個以上有するオルガノポリシロキサン:100質量部、
(b)熱伝導性充填剤:200~4,000質量部、
(c)ケイ素原子に結合した水素原子を1分子中に2個以上有するオルガノハイドロジェンポリシロキサン:(a)成分中のアルケニル基に対する(c)成分中のケイ素原子に直接結合した水素原子のモル比が0.5~5.0となる量、
(d)白金族金属系触媒:白金族金属系元素量で(a)成分の0.1~1,000ppm、
(f)シリコーン樹脂:50~500質量部
を含有してなるシリコーン熱伝導性組成物の硬化物である請求項1又は2記載の熱伝導性複合シート。 Thermally conductive adhesive layer
(A) The following average composition formula (1)
R a SiO (4-a) / 2 (1)
(Wherein R is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and a is a positive number from 1.8 to 2.2.)
An organopolysiloxane having two or more alkenyl groups bonded to a silicon atom represented by the formula:
(B) Thermally conductive filler: 200 to 4,000 parts by mass,
(C) Organohydrogenpolysiloxane having two or more hydrogen atoms bonded to silicon atoms in one molecule: moles of hydrogen atoms directly bonded to silicon atoms in component (c) relative to alkenyl groups in component (a) An amount such that the ratio is between 0.5 and 5.0,
(D) Platinum group metal catalyst: 0.1 to 1,000 ppm of component (a) in the amount of platinum group metal element;
(F) Silicone resin: The thermally conductive composite sheet according to claim 1 or 2, which is a cured product of a silicone thermally conductive composition containing 50 to 500 parts by mass.
(h-1):下記一般式(2)で表されるアルコキシシラン化合物
R2 bR3 cSi(OR4)4-b-c (2)
(式中、R2は独立に炭素原子数6~15のアルキル基、R3は独立に非置換又は置換の炭素原子数1~8の1価炭化水素基、R4は独立に炭素原子数1~6のアルキル基であり、bは1~3の整数、cは0,1又は2であり、b+cは1~3の整数である。)
及び
(h-2):下記一般式(3)で表される分子鎖片末端がトリアルコキシシリル基で封鎖されたジメチルポリシロキサン
からなる群から選択される表面処理剤の少なくとも1種を(a)成分100質量部に対して0.01~50質量部を配合した請求項3記載の熱伝導性複合シート。 The silicone thermal conductive composition further comprises (h-1): an alkoxysilane compound represented by the following general formula (2): R 2 b R 3 c Si (OR 4 ) 4-bc (2)
Wherein R 2 is independently an alkyl group having 6 to 15 carbon atoms, R 3 is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 8 carbon atoms, and R 4 is independently carbon atoms. An alkyl group of 1 to 6, b is an integer of 1 to 3, c is 0, 1 or 2, and b + c is an integer of 1 to 3.)
And (h-2): dimethylpolysiloxane in which one end of a molecular chain represented by the following general formula (3) is blocked with a trialkoxysilyl group
The heat conductive composite sheet according to claim 3, wherein 0.01 to 50 parts by mass of at least one surface treatment agent selected from the group consisting of:
(b)熱伝導性充填剤:100~3,000質量部、
(f)シリコーン樹脂:100質量部、
(g)有機過酸化物系化合物:有機過酸化物換算で0.1~2質量部
を含有してなるシリコーン熱伝導性組成物の硬化物である請求項1又は2記載の熱伝導性複合シート。 Thermally conductive adhesive layer
(B) Thermally conductive filler: 100 to 3,000 parts by mass,
(F) Silicone resin: 100 parts by mass,
(G) Organic peroxide compound: The thermally conductive composite according to claim 1 or 2, which is a cured product of a silicone thermally conductive composition containing 0.1 to 2 parts by mass in terms of organic peroxide. Sheet.
(h-1):下記一般式(2)で表されるアルコキシシラン化合物
R2 bR3 cSi(OR4)4-b-c (2)
(式中、R2は独立に炭素原子数6~15のアルキル基、R3は独立に非置換又は置換の炭素原子数1~8の1価炭化水素基、R4は独立に炭素原子数1~6のアルキル基であり、bは1~3の整数、cは0,1又は2であり、b+cは1~3の整数である。)
及び
(h-2):下記一般式(3)で表される分子鎖片末端がトリアルコキシシリル基で封鎖されたジメチルポリシロキサン
からなる群から選択される表面処理剤の少なくとも1種を(f)成分100質量部に対して0.01~50質量部を配合した請求項5記載の熱伝導性複合シート。 The silicone thermal conductive composition further comprises (h-1): an alkoxysilane compound represented by the following general formula (2): R 2 b R 3 c Si (OR 4 ) 4-bc (2)
Wherein R 2 is independently an alkyl group having 6 to 15 carbon atoms, R 3 is independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 8 carbon atoms, and R 4 is independently carbon atoms. An alkyl group of 1 to 6, b is an integer of 1 to 3, c is 0, 1 or 2, and b + c is an integer of 1 to 3.)
And (h-2): dimethylpolysiloxane in which one end of a molecular chain represented by the following general formula (3) is blocked with a trialkoxysilyl group
The heat conductive composite sheet according to claim 5, wherein 0.01 to 50 parts by mass of at least one surface treatment agent selected from the group consisting of:
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Also Published As
| Publication number | Publication date |
|---|---|
| JP6032359B2 (en) | 2016-11-24 |
| JPWO2014196347A1 (en) | 2017-02-23 |
| TW201505852A (en) | 2015-02-16 |
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