WO2014189204A1 - Laminate of transparent electrode pattern and touch screen panel having same - Google Patents

Abstract

The present invention relates to a laminate of a transparent electrode pattern and a touch screen panel having the same and, more specifically, to a laminate of a transparent electrode pattern capable of significantly reducing a reflexibility difference according to the position, and a touch screen panel having the same, the laminate comprising: a transparent substrate provided with a transparent dielectric layer; a first transparent electrode layer formed of a first pattern connected onto the transparent dielectric layer and a second pattern separated from the transparent dielectric layer; an insulating layer formed on the first transparent electrode layer; and a second transparent electrode layer which is a bridge electrode for electrically connecting the second pattern through a contact hole formed on the insulating layer, wherein the first transparent electrode layer has a thickness of 20 nm to 200 nm, and wherein if the thickness of the first transparent electrode layer is in the range of 20 nm or more to less than 120 nm, (thickness of the first transparent electrode layer)/(thickness of the second transparent electrode layer) is 0.15-0.375, and if the thickness of the first transparent electrode layer is in the range of 120 nm or more to 200 nm or less, (thickness of the second transparent electrode layer)/(thickness of the first transparent electrode layer) is 0.60-1.50.

Description

Transparent electrode pattern laminate and touch screen panel having the same

The present invention relates to a transparent electrode laminate and a touch screen panel having the same, and more particularly, to a transparent electrode laminate having low visibility to a user and a touch screen panel having the same.

In general, a touch screen panel is a screen panel equipped with a special input device that receives a position when touched by hand. The touch screen panel receives input data directly from the screen so that when a person's hand or an object touches a character or a specific location displayed on the screen without using a keyboard, the touch screen panel can identify the location and perform specific processing by the stored software. It is made possible by being laminated | stacked in multiple layers.

In order to recognize the touched portion without degrading the visibility of the image displayed on the screen, the use of the transparent electrode is essential, and typically, a transparent electrode formed in a predetermined pattern is used.

Various transparent electrode structures used in the touch screen panel have been introduced. For example, glass-ITO film-ITO film (GFF), glass-ITO film (G1F), glass-only (G2) structures, etc. may be mentioned. .

GFF is the most common structure, and the transparent electrode (ITO) required to implement the X and Y axes is composed of two films. G1F is a thin film of ITO deposited on the back of the glass, and the second ITO is a film like the conventional method. Use G2 is a method of forming a thin film by depositing and patterning X-axis ITO on the back side using one sheet of tempered glass, then forming an insulating layer thereon and patterning the ITO for Y-axis again. As GFF-> G1F-> G2 increases, transmittance increases and power consumption decreases, and research on G2 structure is being actively conducted.

However, in the case of the G2 structure using the patterned transparent electrode, the pattern portion and the non-pattern portion (pattern opening) of the transparent electrode can be visually distinguished, and as the difference in reflectance between the pattern portion and the non-pattern portion increases, the difference is increased. Since it becomes clear, there exists a problem that the visibility of the external appearance as a display element falls. In particular, in the capacitive touch panel, since the patterned transparent electrode layer is formed on the entire surface of the display display portion, even when the transparent electrode layer is patterned, a good appearance is required as the display element.

In order to improve such a problem, for example, JP-A-2008-98169 of Patent Document 1 discloses a transparent conductive film in which an undercoat layer composed of two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer. Is proposed. As an example, a silicon tin oxide layer (thickness of 10 nm or more) having a refractive index of 1.7 as a high refractive index layer on a transparent substrate, a silicon oxide layer having a refractive index of 1.43 as a low refractive index layer (thickness of 30 nm), and an ITO film having a refractive index of 1.95 as a transparent conductive layer The transparent conductive film which formed (thickness 15nm) in this order is described.

However, in the transparent conductive film described in Patent Document 1, there is a problem that the difference between the pattern portion and the pattern opening is clearly revealed, which is still insufficient to improve the appearance.

[Preceding technical literature]

[Patent Documents]

(Patent Document 1) Patent Document 1: Japanese Unexamined Patent Publication No. 2008-98169

An object of the present invention is to provide a transparent electrode laminate having little visibility difference in reflectance for each position of a pattern.

Moreover, an object of this invention is to provide the touch screen panel provided with the said transparent electrode laminated body.

1. a transparent substrate having a transparent dielectric layer; A first transparent electrode layer formed on the transparent dielectric layer in a first pattern connected to each other and a second pattern separated from each other; An insulating layer formed on the first transparent electrode layer; And a second transparent electrode layer which is a bridge electrode electrically connecting the second pattern through a contact hole formed in the insulating layer. When the first transparent electrode layer is 20 nm or more and less than 120 nm, the first transparent electrode layer is formed. Thickness) / (second transparent electrode layer thickness) = 0.15 to 0.375, and when the first transparent electrode layer is 120 nm or more and 200 nm or less, (second transparent electrode layer thickness) / (first transparent electrode layer thickness) = 0.60 to 1.50 transparent Electrode laminate.

2. In the above 1, wherein the first transparent electrode layer and the second transparent electrode layer has a refractive index of 1.8 to 2.2, respectively, the transparent electrode laminate.

3. In the above 1, wherein the insulating layer has a refractive index of 1.4 to 1.6 transparent electrode laminate.

4. In the above 1, wherein the transparent substrate has a thickness of 0.1 to 0.7mm transparent electrode laminate.

5. In the above 1, wherein the transparent substrate has a refractive index of 1.4 to 1.6 transparent electrode laminate.

6. In the above 1, wherein the transparent dielectric layer is a transparent electrode laminate formed of a plurality of layers.

7. In the above 1, wherein the transparent dielectric layer has a refractive index of 1.4 to 2.5 transparent electrode laminate.

8. In the above 6, wherein the refractive index of each layer of the transparent dielectric layer is 1.4 to 2.5 transparent electrode laminate.

9. In the above 1, wherein the transparent dielectric layer has a total thickness of 50 to 80nm transparent electrode laminate.

10. In the above 1, wherein the insulating layer has a thickness of 1,000 to 2,000nm transparent electrode laminate.

11. In the above 1, wherein the second transparent electrode layer is formed on the transparent dielectric layer, the insulating layer is formed on the second transparent electrode layer, the transparent electrode laminate is formed on the insulating layer the first transparent electrode layer .

12. The transparent electrode laminate according to the above 1, further comprising a passivation layer on the opposite side of the transparent substrate based on the transparent electrode laminate.

13. In the above 12, wherein the passivation layer has a thickness of less than 2,000nm transparent electrode laminate.

14. The transparent electrode laminate of 12 above, wherein the passivation layer has a refractive index of 1.4 to 1.6.

15. Touch screen panel with a transparent electrode laminate of any one of the above 1 to 14.

The transparent electrode laminate of the present invention adjusts the thickness of each layer constituting the laminate to a specific range, thereby minimizing the difference in reflectance by position caused by the patterned transparent electrode structure, thereby reducing the visibility to the user. Transparency is shown.

In this aspect, the transparent electrode laminate of the present invention can be very usefully used by showing high transmittance and low reflectance when applied to a touch screen panel having a G2 structure.

1 is a schematic plan view of one embodiment of a transparent electrode laminate of the present invention.

2 is a schematic plan view of a unit structure in one embodiment of the transparent electrode stack of the present invention.

3 is a schematic cross-sectional view showing the laminated structure of each position of the transparent electrode laminate of the present invention.

The present invention provides a transparent substrate having a transparent dielectric layer; A first transparent electrode layer formed on the transparent dielectric layer in a first pattern connected to each other and a second pattern separated from each other; An insulating layer formed on the first transparent electrode layer; And a second transparent electrode layer, which is a bridge electrode electrically connecting the second pattern through a contact hole formed in the insulating layer, wherein the first transparent electrode layer has a thickness of 20 to 200 nm and the first transparent electrode layer is (First transparent electrode layer thickness) / (second transparent electrode layer thickness) = 0.15 to 0.375 for 20 nm or more and less than 120 nm, and (second transparent electrode layer thickness) / when the first transparent electrode layer is 120 nm or more and 200 nm or less. (First transparent electrode layer thickness) = 0.60 to 1.50, the present invention relates to a transparent electrode pattern laminate that can significantly reduce the difference in reflectance at each position, and a touch screen panel having the same.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings. However, the following drawings attached to the present specification are intended to illustrate preferred embodiments of the present invention, and together with the contents of the present invention serves to further understand the technical spirit of the present invention, the present invention described in such drawings It should not be construed as limited to matters.

1 is a schematic plan view of one embodiment of a transparent electrode laminate of the present invention.

Referring to FIG. 1, the transparent electrode laminate of the present invention may include a first transparent electrode layer 100, a second transparent electrode layer 200, an insulating layer 300, and a contact hole 400. In addition, the transparent electrode laminate of the present invention may be formed on a transparent substrate (not shown), the passivation layer (not shown) may be further provided on the opposite side of the transparent substrate.

As shown in FIG. 1, the transparent electrode laminate is formed in a predetermined pattern. The first transparent electrode layer 100 and the second transparent electrode layer 200 provide position information of a touched point, and the insulating layer 300 is disposed between the first transparent electrode layer 100 and the second transparent electrode layer 200. The two layers are electrically separated from each other, and the contact hole 400 is formed in the insulating layer 300 so that the first transparent electrode layer 100 and the second transparent electrode layer 200 can be electrically connected to each other.

As described above, each structure of the transparent electrode laminate is formed in a predetermined pattern, and according to the pattern structure, the transparent electrode laminate has a different laminate structure depending on its position. Referring to FIG. 2, which shows the unit structure of the transparent electrode laminate, the transparent electrode laminate may have five types of stacked structures from ① to ⑤ depending on the position. 3 schematically shows the lamination structure in the above ① to ⑤ positions.

As shown in FIG. 3, the transparent electrode laminate has various layer structures. Due to the various layer structures according to the positions, differences in reflectance, luminance, color difference, etc. occur for each position, and accordingly, visibility of the pattern is increased, thereby making it transparent. There is a limit to the function as an electrode.

Therefore, the present invention solves the above problems by minimizing the difference in reflectance by having a specific thickness range of the transparent electrode layer and the insulating layer. Hereinafter, the present invention will be described in more detail.

<Transparent electrode layer>

As shown in FIGS. 1 to 3, the present invention includes a first transparent electrode layer and a second transparent electrode layer.

The first transparent electrode layer 100 may be formed of the first pattern 110 and the second pattern 120. The first pattern 110 and the second pattern 120 are disposed in the same row or column direction, respectively, to provide information about the X and Y coordinates of the touched point. Specifically, when a human hand or an object comes into contact with the transparent substrate, the first circuit 110, the second pattern 120, the second transparent electrode layer 200, and the position detection line via the position detection line toward the contact position. The change in capacitance is thus conveyed. Then, the contact position is grasped by the change of the capacitance converted into an electrical signal by the X and Y input processing circuit (not shown) or the like.

In this regard, the first pattern 110 and the second pattern 120 are formed on the same layer (first transparent electrode layer), and the respective patterns must be electrically connected to detect a touched point. However, since the first pattern 110 is connected to each other but the second pattern 120 is separated from each other in an island form, a separate connection line is required to electrically connect the second pattern 120. Do.

However, since the connection line should not be electrically connected to the first pattern 110, the connection line should be formed on a layer different from the first transparent electrode layer 100. Accordingly, the second transparent electrode layer 200 is formed on a separate layer different from the first transparent electrode layer 100 to electrically connect the second pattern 120. That is, the second transparent electrode layer 200 is formed on a layer different from the first transparent electrode layer 100, but is formed of the first transparent electrode layer 100 through the contact hole 400 formed in the insulating layer 300 to be described later. It is a bridge electrode that electrically connects the two patterns 120.

Accordingly, in FIGS. 2 and 3, the positions ①, ③, and ④ are portions in which the first transparent electrode layer 100 is formed in a predetermined pattern to detect a touched portion, and the positions ③, ④, and ⑤ are formed in an island shape. The second transparent electrode layer 200 formed to electrically connect the two patterns 120 is present.

In this case, since the second transparent electrode layer 200 must be electrically blocked from the first pattern 110 of the first transparent electrode layer 100, for this purpose, the insulating layer 300 and the contact hole 400 (3 in FIG. 2). ) Is provided, which will be described later.

In the present invention, when the first transparent electrode layer 100 has a thickness of 20 to 200 nm, and the first transparent electrode layer is 20 nm or more and less than 120 nm, (first transparent electrode layer thickness) / (second transparent electrode layer thickness) = 0.15 to 0.375, preferably 0.17 to 0.3, more preferably 0.17 to 0.23, wherein the first transparent electrode layer is 120 nm or more and 200 nm or less (second transparent electrode layer thickness) / (first transparent electrode layer thickness) = 0.60 to 1.50 , Preferably it is 0.70-1.20, More preferably, it is 0.8-1.

If the thickness is out of the above range, the difference in reflectance of each position is increased to increase the reflection visibility of the pattern. In addition, if the thickness is less than 20 nm, the resistance of the touch sensor is increased by decreasing the resistance, and if the thickness is more than 150 nm, the transmittance is lowered. There is a problem.

In addition, the first transparent electrode layer 100 and the second transparent electrode layer 200 preferably have a refractive index of 1.8 to 2.2, respectively. The reflectance reduction effect in the case of having the above-mentioned thickness range in the refractive index range can be further enhanced.

The first transparent electrode layer 100 and the second transparent electrode layer 200 according to the present invention may be applied without limitation to the transparent electrode material known in the art. For example, indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc oxide (IZTO), cadmium tin oxide (CTO), PEDOT (poly (3,4-ethylenedioxythiophene)) , Carbon nanotubes (CNT), metal wires, and the like, and these may be used alone or in combination of two or more thereof. Preferably indium tin oxide (ITO) may be used. The metal used for a metal wire is not specifically limited, For example, silver (Ag), gold, aluminum, copper, iron, nickel, titanium, telenium, chromium, etc. are mentioned. These can be used individually or in mixture of 2 or more types.

The transparent electrode layers 100 and 200 may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, it may be formed by reactive sputtering, which is an example of physical vapor deposition.

In addition, the transparent electrode layers 100 and 200 may also be formed by a printing process. In this printing process, various printing methods such as gravure off set, reverse off set, screen printing, and gravure printing may be used. In particular, when the transparent electrode layers 100 and 200 are formed by a printing process, the transparent electrode layers 100 and 200 may be formed of a printable paste material. For example, it may be formed of carbon nanotubes (CNTs), conductive polymers, and silver nano wire inks.

In the present invention, the stacking order of the first transparent electrode layer 100 and the second transparent electrode layer 200 is not limited. Therefore, in another embodiment of the present invention, the stacking order of the first transparent electrode layer 100 and the second transparent electrode layer 200 of FIG. 3 may be changed. For example, a second transparent electrode layer may be first formed on the transparent substrate instead of the first transparent electrode layer, an insulating layer may be formed thereon, and then the first transparent electrode layer may be formed on the insulating layer.

<Insulation layer and contact hole>

The insulating layer 300 is formed between the first transparent electrode layer 100 and the second transparent electrode layer 200 to prevent electrical connection between the first transparent electrode layer 100 and the second transparent electrode layer 200. 2 and 3, when the second transparent electrode layer 200 electrically connects the second pattern 120 of the adjacent first transparent electrode layer 100, the first transparent electrode layer 100 is used. Since it is to be electrically connected to the, it is necessary that a portion where the insulating layer 300 is not formed. As such, the portion of the insulating layer 300 where the insulating layer 300 is not formed is called the insulating layer 300 in the contact hole 400 (3 in FIG. 2). Therefore, the contact hole 400 makes electrical connection between the first transparent electrode layer (second pattern) and the second transparent electrode layer.

In the present invention, the insulating layer 300 has a thickness of 1,000 to 2,000 nm. If the thickness is out of the above range, there is a problem in that the reflectance difference of each position is increased to increase the reflection visibility of the pattern. If the thickness is less than 1,000 nm, the capacitance generated between the electrodes is lowered, so that the sensitivity of the touch sensor is lowered. If the thickness is more than 2,000 nm, the effect of increasing the thickness no longer occurs.

The insulating layer 300 preferably has a refractive index of 1.4 to 1.6. The reflectance reduction effect in the case of having the above-mentioned thickness range in the refractive index range can be further enhanced.

The insulating layer 300 according to the present invention may be applied without limitation the transparent electrode material known in the art. For example, it may be formed in a required pattern using a transparent photosensitive resin composition containing a metal oxide such as silicon oxide or an acrylic resin.

The insulating layer 300 may be formed on the first transparent electrode layer 100 by deposition or printing.

In the present invention, the contact hole 400 may be formed by forming a hole after forming the insulating layer as a whole (hole method), and the insulating layer is electrically connected to the first transparent electrode layer and the second transparent electrode layer. It may also be formed in such a way as to form a part except for the part connected to the island (island method).

<Transparent board>

The transparent substrate forms the outermost surface of the touch screen panel and is a part to which a human hand or an object directly contacts. The transparent electrode laminate of the present invention is bonded to the side of the opposite surface to which a human hand or an object directly comes into contact.

The transparent substrate is not particularly limited as long as it is durable to sufficiently protect the touch screen panel from external force, and a user can see the display well, and materials used in the art may be used without particular limitation. For example, glass, polyethersulphone (PES), polyacrylate (PAR, polyacrylate), polyetherimide (PEI), polyethylene naphthalate (PEN, polyethyelenen napthalate), polyethylene terephthalate (PET, polyethyelene terepthalate, polyphenylene sulfide (PPS), polyallylate, polyimide, polycarbonate (PC, polycarbonate), cellulose tri acetate (TAC), cellulose acetate propionate (cellulose acetate propionate (CAP) and the like may be used, preferably glass may be used, and more preferably tempered glass may be used.

The transparent substrate according to the present invention may have a suitable thickness, for example, may be 0.1 to 0.7mm. Within this range, the effect of reducing the reflectance of the transparent electrode laminate according to the present invention can be further improved.

In addition, the transparent substrate preferably has a refractive index of 1.4 to 1.6. The reflectance reduction effect in the case of having the above-mentioned thickness range in the refractive index range can be further enhanced.

<Transparent dielectric layer>

The transparent dielectric layer is formed between the transparent substrate and the first transparent electrode layer to improve the optical uniformity of the touch screen panel. In other words, it serves to reduce the difference in optical characteristics due to the structural difference of each position according to the pattern structure of the transparent electrode.

The transparent dielectric layer may be formed by mixing niobium oxide, silicon oxide, cerium oxide, indium oxide, or the like, alone or in combination of two or more thereof. The formation method may be a vacuum deposition method, a sputtering method, an ion plating method, and the like, and may be easily manufactured in the form of a thin film through the above method.

In the present invention, if necessary, the transparent dielectric layer may be formed of a plurality of layers. In this case, each layer may be formed of different materials, and may have different refractive indices and thicknesses.

The refractive index of the transparent dielectric layer is preferably 1.4 to 2.5 for reducing the reflectance of the transparent electrode laminate, and, if formed of a plurality of layers, the refractive index of each layer is preferably 1.8 to 2.2. In the same aspect, the thickness of the transparent dielectric layer is preferably 50 to 80 nm, in the case of forming a plurality of layers, the thickness of each layer may be adopted so long as the total thickness does not deviate from the thickness range.

Passivation layer

The transparent electrode laminate of the present invention, if necessary, in order to prevent the transparent electrode layers 100 and 200 from being contaminated by an external environment (moisture, air, etc.), the surface on which the transparent substrate is bonded based on the transparent electrode laminate The passivation layer may be further provided on the opposite side of the substrate.

The passivation layer may be formed by adopting a material usable in the insulating layer 300.

The passivation layer according to the present invention may have a suitable thickness, for example, may be 2,000 nm or less. Thus, for example, it may be 0 to 2,000 nm. Within this range, the effect of reducing the reflectance of the transparent electrode laminate according to the present invention can be further improved.

In addition, the passivation layer preferably has a refractive index of 1.4 to 1.6. The reflectance reduction effect in the case of having the above-mentioned thickness range in the refractive index range can be further enhanced.

<Adhesive layer>

An adhesive layer bonds the transparent electrode laminated body of this invention with a display panel part. The adhesive layer may be formed by coating and curing the transparent curable resin composition (OCR), or may be formed by compressing an already cured film (OCA).

The adhesive layer may also affect the reflectance of the transparent electrode laminate, and therefore, it is desirable to have a suitable thickness and refractive index for reducing the reflectance of the transparent electrode laminate. For example, the thickness may be 0 to 250 μm and the refractive index may be 1 to 1.6. When the thickness is 0 μm, when the adhesive layer is formed only at the edge portion of the transparent electrode laminate, this means that the adhesive layer is not formed at the inner portion where the actual image is displayed. Only the air layer is present between the display panel units.

As described above, in the transparent electrode laminate of the present invention, the transparent electrode layer and the insulating layer may have a specific thickness range, thereby minimizing the difference in reflectance according to the position, and thus, the transparency may be significantly improved. Therefore, the transparent electrode laminate of the present invention may be manufactured as a touch screen panel having excellent transparency when bonded to the display panel unit.

Hereinafter, preferred examples are provided to aid the understanding of the present invention, but these examples are merely illustrative of the present invention and are not intended to limit the scope of the appended claims, which are within the scope and spirit of the present invention. It is apparent to those skilled in the art that various changes and modifications can be made to the present invention, and such modifications and changes belong to the appended claims.

Example 1-9 and Comparative Example 1-13

The transparent electrode laminate was produced with the thickness shown in Table 1 below, and the difference between the average reflectance at each position and the maximum and minimum values of the average reflectance was described. The average reflectance means the average of the reflectance at 400nm ~ 700nm.

As a transparent substrate, glass (refractive index: 1.51, extinction coefficient: 0),

As the transparent dielectric layer, a _double layer of Nb ₂ O ₅ layer (refractive index: 2.32, extinction coefficient: 0) and SiO ₂ layer (refractive index: 1.46, extinction coefficient: 0)

As the first transparent electrode layer, ITO (refractive index: 1.8, extinction coefficient: 0.014),

As the second transparent electrode layer, ITO (refractive index: 1.8, extinction coefficient: 0.014),

An acrylic insulating material (refractive index: 1.51, extinction coefficient: 0) was used as the insulating layer and the passivation layer, and the refractive index and the extinction coefficient were described based on light having a wavelength of 550 nm.

When the adhesive layer is described as air, it means that only the bezel part is bonded so that the image display area is not formed of the adhesive layer.

Table 1

Examples 10-22 and Comparative Examples 14-20

The transparent electrode laminate was manufactured with the thickness shown in Table 2 below, and the difference between the average reflectance at each position and the maximum and minimum values of the average reflectance was described. The average reflectance means the average of the reflectance at 400nm ~ 700nm.

As a transparent substrate, glass (refractive index: 1.51, extinction coefficient: 0),

As the transparent dielectric layer, a _double layer of Nb ₂ O ₅ layer (refractive index: 2.32, extinction coefficient: 0) and SiO ₂ layer (refractive index: 1.46, extinction coefficient: 0)

As the first transparent electrode layer, ITO (refractive index: 1.975, extinction coefficient: 0.014),

As the second transparent electrode layer, ITO (refractive index: 1.8, extinction coefficient: 0.014),

As the insulating layer and the passivation layer, an acrylic insulating material (refractive index: 1.51, extinction coefficient: 0) was used, and the refractive index and the extinction coefficient were described based on light having a wavelength of 550 nm.

When the adhesive layer is described as air, it means that only the bezel part is bonded so that the image display area is not formed of the adhesive layer.

TABLE 2

Referring to Tables 1 to 2, in the embodiments, the difference between the maximum value and the minimum value of the average reflectance is less than or equal to 2%, and the visibility of the reflectance for each location is not large, so the visibility is very low.

However, in the comparative examples, the difference between the maximum value and the minimum value of the average reflectance exceeded 2%, and thus the variation in reflectance for each position was confirmed, and thus the visibility was much higher than that of the embodiment.

In Comparative Examples 7 and 20, the thickness ratio of the first transparent electrode layer and the second transparent electrode layer is outside the scope of the present invention, but the difference in average reflectance is 2% or less, but the comparative examples may include the first transparent electrode layer and / or This is the case where the thickness of the second transparent electrode layer is 10 nm or less. When the thickness of the transparent electrode layer was 10 nm or less, the electrical conductivity was lowered, and the basic function as the electrode was not satisfied.

In this regard, after depositing ITO at various temperatures on 120 * 50 * 0.7mm glass substrate at various thicknesses, the electrical resistance was measured at the central point, the results are shown in Table 3 below.

TABLE 3

Referring to Table 3, it can be seen that when the electrode thickness is less than 10nm, the electrical resistance is significantly increased, so that basic performance as a touch electrode is not exhibited.

[Description of the code]

100: first transparent electrode layer, 110: first pattern, 120: second pattern

200: second transparent electrode layer, 300: insulating layer, 400: contact hole

Claims (15)

A transparent substrate having a transparent dielectric layer; A first transparent electrode layer formed on the transparent dielectric layer in a first pattern connected to each other and a second pattern separated from each other; An insulating layer formed on the first transparent electrode layer; And And a second transparent electrode layer which is a bridge electrode electrically connecting the second pattern through a contact hole formed in the insulating layer. The first transparent electrode layer has a thickness of 20 to 200nm, When the first transparent electrode layer is greater than or equal to 20 nm and less than 120 nm, the thickness of the first transparent electrode layer / the thickness of the second transparent electrode layer is 0.15 to 0.375, When the first transparent electrode layer is 120nm or more and 200nm or less, the (second transparent electrode layer thickness) / (first transparent electrode layer thickness) = 0.60 to 1.50. The transparent electrode laminate of claim 1, wherein the first transparent electrode layer and the second transparent electrode layer each have a refractive index of 1.8 to 2.2. The transparent electrode laminate of claim 1, wherein the insulation layer has a refractive index of 1.4 to 1.6. The transparent electrode laminate of claim 1, wherein the transparent substrate has a thickness of 0.1 to 0.7 mm. The transparent electrode laminate of claim 1, wherein the transparent substrate has a refractive index of 1.4 to 1.6. The transparent electrode stack of claim 1, wherein the transparent dielectric layer is formed of a plurality of layers. The transparent electrode laminate of claim 1, wherein the transparent dielectric layer has a refractive index of 1.4 to 2.5. The transparent electrode laminate according to claim 6, wherein the refractive index of each layer of the transparent dielectric layer is 1.4 to 2.5. The transparent electrode laminate of claim 1, wherein the transparent dielectric layer has a total thickness of 50 to 80 nm. The transparent electrode laminate according to claim 1, wherein the insulating layer has a thickness of 1,000 to 2,000 nm. The transparent electrode laminate of claim 1, wherein the second transparent electrode layer is formed on the transparent dielectric layer, an insulating layer is formed on the second transparent electrode layer, and the first transparent electrode layer is formed on the insulating layer. The transparent electrode laminate according to claim 1, further comprising a passivation layer on an opposite side of the transparent substrate with respect to the transparent electrode laminate. The transparent electrode laminate according to claim 12, wherein the passivation layer has a thickness of 2,000 nm or less. The transparent electrode laminate of claim 12, wherein the passivation layer has a refractive index of 1.4 to 1.6. The touch screen panel provided with the transparent electrode laminated body of any one of Claims 1-14.

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