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WO2014033753A3 - "a process for the preparation of transparent conductive oxides". - Google Patents

"a process for the preparation of transparent conductive oxides". Download PDF

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Publication number
WO2014033753A3
WO2014033753A3 PCT/IN2013/000503 IN2013000503W WO2014033753A3 WO 2014033753 A3 WO2014033753 A3 WO 2014033753A3 IN 2013000503 W IN2013000503 W IN 2013000503W WO 2014033753 A3 WO2014033753 A3 WO 2014033753A3
Authority
WO
WIPO (PCT)
Prior art keywords
transparent conductive
conductive oxides
preparation
doped
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IN2013/000503
Other languages
French (fr)
Other versions
WO2014033753A2 (en
Inventor
Jashmin Pravinbhai PATEL
Sanjaykumar Hasmukhbhai PATEL
Jay Parsottambhai NIRMAL
Promise Abhaykumar DOSI
Mehulsinh Ranjitsinh CHHASATIA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SIGMA ENERGY
Original Assignee
SIGMA ENERGY
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SIGMA ENERGY filed Critical SIGMA ENERGY
Publication of WO2014033753A2 publication Critical patent/WO2014033753A2/en
Publication of WO2014033753A3 publication Critical patent/WO2014033753A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Non-Insulated Conductors (AREA)
  • Conductive Materials (AREA)

Abstract

The present invention relates to a process for the preparation of transparent conductive oxides. More particularly, the present invention relates to a process for the preparation of transparent conductive oxides using a chemical process wherein Aluminium doped Zinc oxide (AZO), Fluorine doped zinc oxide (FZO), Gallium doped Zinc Oxide (GZO), Fluorine Doped Tin Oxide (FTO), Antimony doped Tin Oxide (ATO), and Tin doped Indium Oxide (ITO) and the other similar transparent conductive oxides have been prepared by the process as disclosed herein below.
PCT/IN2013/000503 2012-08-21 2013-08-16 "a process for the preparation of transparent conductive oxides". Ceased WO2014033753A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IN2423MU2012 2012-08-21
IN2423/MUM/2012 2012-08-21

Publications (2)

Publication Number Publication Date
WO2014033753A2 WO2014033753A2 (en) 2014-03-06
WO2014033753A3 true WO2014033753A3 (en) 2014-05-22

Family

ID=50184538

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IN2013/000503 Ceased WO2014033753A2 (en) 2012-08-21 2013-08-16 "a process for the preparation of transparent conductive oxides".

Country Status (1)

Country Link
WO (1) WO2014033753A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112939058A (en) * 2021-02-19 2021-06-11 安徽景成新材料有限公司 Hydrothermal synthesis method for preparing novel zinc oxide with special crystal morphology
CN113066900B (en) * 2021-03-24 2022-03-18 河北北方学院 A kind of preparation method of low-cost ZnO transparent conductive film
CN115015305B (en) * 2022-08-09 2022-10-25 矿冶科技集团有限公司 Doped zinc oxide standard sample, preparation method thereof and method for measuring content of doping elements in unknown doped zinc oxide sample

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5238674A (en) * 1990-02-05 1993-08-24 Oce-Nederland B.V. Process for preparing a fluorine-doped tin oxide powder
US6777477B1 (en) * 1999-11-17 2004-08-17 Toyo Gosei Kogyo Co., Ltd. Coating solution for forming transparent and conductive tin oxide film and method for preparing transparent and conductive tin oxide film, and transparent and conductive tin oxide film
US20060247354A1 (en) * 2004-12-15 2006-11-02 Ping He Method of manufacturing nanoscale metal oxide particles

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5238674A (en) * 1990-02-05 1993-08-24 Oce-Nederland B.V. Process for preparing a fluorine-doped tin oxide powder
US6777477B1 (en) * 1999-11-17 2004-08-17 Toyo Gosei Kogyo Co., Ltd. Coating solution for forming transparent and conductive tin oxide film and method for preparing transparent and conductive tin oxide film, and transparent and conductive tin oxide film
US20060247354A1 (en) * 2004-12-15 2006-11-02 Ping He Method of manufacturing nanoscale metal oxide particles

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
BAI, F ET AL.: "One-step synthesis of monodispersed antimony-doped tin oxide suspension.", MATERIALS LETTERS, vol. 60., 10 March 2006 (2006-03-10), pages 3126 - 3129, Retrieved from the Internet <URL:http://www.sciencedirect.com/science/artiGe/pü/S0167577X06002369> *

Also Published As

Publication number Publication date
WO2014033753A2 (en) 2014-03-06

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