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WO2014080976A1 - Composition de résine photosensible, stratifié de résine photosensible et articles obtenus par durcissement de ceux-ci (9) - Google Patents

Composition de résine photosensible, stratifié de résine photosensible et articles obtenus par durcissement de ceux-ci (9) Download PDF

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Publication number
WO2014080976A1
WO2014080976A1 PCT/JP2013/081378 JP2013081378W WO2014080976A1 WO 2014080976 A1 WO2014080976 A1 WO 2014080976A1 JP 2013081378 W JP2013081378 W JP 2013081378W WO 2014080976 A1 WO2014080976 A1 WO 2014080976A1
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WO
WIPO (PCT)
Prior art keywords
resin composition
epoxy
photosensitive resin
mass
epoxy resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2013/081378
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English (en)
Japanese (ja)
Inventor
尚子 今泉
稲垣　真也
那央 本田
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Nippon Kayaku Co Ltd
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Nippon Kayaku Co Ltd
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Publication of WO2014080976A1 publication Critical patent/WO2014080976A1/fr
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62—Alcohols or phenols
    • C08G59/621—Phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/36—Epoxy compounds containing three or more epoxy groups together with mono-epoxy compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Definitions

  • the present invention relates to a photosensitive resin composition capable of forming an image having excellent side wall shape and resolution, low internal stress after curing, and excellent substrate adhesion after a wet heat test, and a cured product thereof.
  • the cured product of the photosensitive resin composition according to the present invention includes MEMS (microelectromechanical system) parts, ⁇ -TAS (micrototal analysis system) parts, microreactor parts, insulating layers of electronic parts such as capacitors and inductors, LIGA parts.
  • MEMS microelectromechanical system
  • ⁇ -TAS total analysis system
  • microreactor parts insulating layers of electronic parts such as capacitors and inductors
  • LIGA parts useful in the manufacture of molds and stamps for micro-injection molding and hot embossing, screens or stencils for micro-printing applications, MEMS and semiconductor packaging parts, BioMEMS and biophotonic devices, and printed wiring boards.
  • photoresists those that can be processed by photolithography are called photoresists, and are widely used for semiconductors, MEMS / micromachine applications, and the like.
  • photolithography is achieved by patterning exposure on a substrate and then developing with a developer to selectively remove exposed or non-exposed areas.
  • a positive type is one in which an exposed portion is dissolved in a developer, and a negative type is insoluble.
  • advanced technology electro-package applications and MEMS applications not only the ability to form a uniform spin coating film, but also a high aspect ratio, a vertical sidewall shape in a thick film, and a high adhesion to a substrate are required.
  • the aspect ratio is an important characteristic calculated by resist film thickness / pattern line width and showing the performance of photolithography.
  • composition mainly composed of bisphenol A type novolac epoxy resin disclosed in Patent Document 1 and Non-Patent Document 1 photosensitive image formation and photosensitive resin having a very high resolution and a high aspect ratio.
  • a cured product can be formed.
  • the obtained cured resin tends to be too brittle depending on its use, and often causes cracking (crazing) during development or when internal stress occurs. Therefore, according to this cured resin, not only the adhesiveness is lowered depending on the type of the substrate using the resin composition, but in some cases, peeling may occur between the substrate and the cured resin. All these problems are caused by the stress that occurs when the composition shrinks and accumulates in the cured resin. When the curing shrinkage is large, the substrate is often bent (warped).
  • Patent Document 2 discloses a resin composition comprising an epoxy resin, a novolac resin, a cationic photopolymerization initiator, and a filler. It is described that by using this resin composition, the adhesion of a coating film is increased and moisture permeability is reduced. However, it has been found that, depending on the disclosed composition, there is no resolution performance as a photoresist, and a high adhesive strength cannot be realized without containing a filler. Therefore, the resin composition of Patent Document 2 cannot be adapted to a MEMS package, a semiconductor package, a microreactor, or the like.
  • the present invention has been made in view of the above circumstances, and is an epoxy resin composition that is cured by cationic polymerization in the field of semiconductor and MEMS / micromachine applications, and has a vertical side wall shape and fine resolution, It is an object of the present invention to provide a photosensitive resin composition capable of forming an image having low stress and heat and humidity resistance, and / or a laminate thereof, and a cured product thereof.
  • the present inventors have found that the photosensitive resin composition of the present invention can solve the above problems.
  • a photosensitive resin composition containing (A) an epoxy resin, (B) a polyhydric phenol compound, (C) a photocationic polymerization initiator, (D) an epoxy group-containing silane compound, and (E) a reactive epoxy monomer.
  • the (A) epoxy resin is Following formula (1)
  • R 1 and R 2 each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or a trifluoromethyl group.
  • X represents a hydrogen atom or a glycidyl group, and at least one of a plurality of X is a glycidyl group.
  • a polyhydric phenol Compound is The following formulas (3) to (6) (In the formula, p is an average value and represents a real number in the range of 1 to 10. Each R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.) (In the formula, q is an average value and represents a real number in the range of 1 to 10.) (In the formula, z is an average value and represents a real number in the range of 1 to 10.) (Wherein y is an average value and represents a real number in the range of 1 to 10.
  • R 8 and R 9 each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms). Containing one or more selected from the group consisting of phenolic compounds, and
  • the (E) reactive epoxy monomer is Following formula (10) (In the formula, R 5 represents a divalent aliphatic hydrocarbon group having 1 to 11 carbon atoms.) And / or the following formula (11) (In the formula, R 6 represents a trivalent aliphatic hydrocarbon group having 1 to 11 carbon atoms.)
  • the photosensitive resin composition characterized by containing the epoxy compound represented by these. [2].
  • (D) The photosensitive resin composition as described in the above item [1], wherein the epoxy group-containing silane compound is an epoxy group-containing alkoxysilane compound. [7].
  • (D) The blending ratio of the epoxy group-containing silane compound is based on the total mass of (A) epoxy resin, (B) polyhydric phenol compound, (C) photocationic polymerization initiator, and (E) reactive epoxy monomer.
  • the photosensitive resin composition according to item [1] which is 1 to 15% by mass. [8].
  • (G) The photosensitive resin composition as described in the said [1] item containing an acrylic resin. [9].
  • (G) The photosensitive resin composition as described in the above item [8], wherein the acrylic resin is a copolymer obtained using an ethylenically unsaturated monomer having a glycidyl group. [10].
  • the blending ratio of (G) acrylic resin is (A) epoxy resin, (B) polyhydric phenol compound, (C) photocationic polymerization initiator, (D) epoxy group-containing silane compound, and (E) reactive epoxy monomer.
  • the photosensitive resin composition as described in the above item [8] which is 1 to 20% by mass relative to the total mass. [11].
  • (F) The photosensitive resin composition as described in the said [1] item containing a solvent. [12].
  • the photosensitive resin composition of the present invention is capable of forming a fine and vertical sidewall shape pattern by photolithography, and the cured product has characteristics that are excellent in high resolution, low stress, and moist heat resistance. Therefore, by using the photosensitive resin composition of the present invention, a permanent resist and a cured product having characteristics required for semiconductor and MEMS / micromachine application fields, in particular, MEMS packages, semiconductor packages, and microreactor forming parts can be obtained. can get.
  • the epoxy resin (A) contained in the photosensitive resin composition of the present invention is an epoxy resin (a) obtained by a reaction between a phenol derivative represented by the above formula (1) and an epihalohydrin, and the above formula (2). Both of the represented epoxy resins (b) are included. Among these, the epoxy resin (a) contributes to the vertical sidewall shape and fine resolution of a cured product (pattern) obtained by photolithography using the photosensitive resin composition of the present invention.
  • the epoxy resin (a) can be obtained by a conventionally known epoxy resin synthesis method using a phenol derivative represented by the formula (1) and epihalohydrin.
  • an alkali such as sodium hydroxide is added to a mixed solution in which a phenol derivative represented by the formula (1) and an epihalohydrin can be dissolved.
  • a method of raising the temperature to the reaction temperature, performing an addition reaction and a ring closure reaction, repeating washing of the reaction solution with water, separation and removal of the aqueous layer, and finally evaporating the solvent from the oil layer can be mentioned.
  • the halogen of the epihalohydrin is selected from F, Cl, Br and I, but is typically Cl or Br.
  • the reaction between the phenol derivative represented by the formula (1) and epihalohydrin is usually 0.3 to 30 mol, preferably 1 to 20 mol, more preferably epihalohydrin with respect to 1 mol of phenol derivative (corresponding to 3 mol of hydroxyl group). Is carried out using 3 to 15 moles. Since the epoxy resin (a) is obtained by the above reaction, it usually exists as a mixture of plural kinds of products.
  • an epoxy resin (a) having a different main component in the epoxy resin (a) can be obtained depending on the use ratio of the phenol derivative represented by the formula (1) used in the synthesis reaction and the epihalohydrin.
  • an epoxy resin mainly composed of a trifunctional epoxy resin in which all three phenolic hydroxyl groups in formula (1) are epoxidized (A) is obtained.
  • the epoxy resin (a) mainly composed of such a multimeric epoxy resin in addition to the method of controlling by the use ratio of the phenol derivative and the epihalohydrin, a phenol derivative is further added to the epoxy resin (a). The method of making this react is also mentioned.
  • the epoxy resin (a) obtained by this method is also included in the category of the epoxy resin (a) contained in the photosensitive resin composition of the present invention.
  • the epoxy resin (a) contained in the resin composition of the present invention is an epoxy resin that is a monomer of a phenol derivative as long as it is an epoxy resin obtained by a reaction between a phenol derivative represented by the formula (1) and an epihalohydrin.
  • the epoxy resin (a) which contains any of the multimeric epoxy resins of a phenol derivative as a main component can also be used.
  • the epoxy resin (a) is excellent in solvent solubility and has a low softening point and is easy to handle, an epoxy resin of a phenol derivative monomer and an epoxy resin of a phenol derivative dimer (represented by the formula (1))
  • the epoxy resin (a) containing as a main component any one of the epoxy resins having the above component is preferable.
  • An epoxy resin (a) mainly composed of a phenol derivative monomer epoxy resin or a phenol derivative dimer epoxy resin is more preferred.
  • the “main component” as used in the present application means the most content among the plural types of epoxy resins that are monomeric epoxy resins and / or multimeric epoxy resins contained in the epoxy resin (a). It means many epoxy resin components.
  • trimer epoxy resin (a) of the phenol derivative represented by the formula (1) is shown in the following formula (9).
  • the epoxy resin (a) those having a weight average molecular weight in the range of 500 to 12,000 are preferable, and those having a weight average molecular weight in the range of 500 to 9000 are more preferable.
  • Preferred examples thereof include NC-6300H (trade name, manufactured by Nippon Kayaku Co., Ltd., epoxy equivalent of 220 to 240 g / eq., Softening point of 60 to 85 ° C.).
  • the weight average molecular weight in this application is a value calculated in terms of polystyrene based on the GPC measurement results, the epoxy equivalent is a value measured in accordance with JIS K-7236, and the softening point is in accordance with JIS K-7234. Means the measured values.
  • the epoxy resin (b) imparts resolution and flexibility to a cured product (pattern) obtained by photolithography using the photosensitive resin composition of the present invention. As a result of the improvement of these properties by the epoxy resin (b), the wet heat adhesion of the cured product is improved.
  • the epoxy resin (b) can be obtained by further reacting epichlorohydrin with a part of the alcoholic hydroxyl group of the polycondensate of bisphenols and epichlorohydrin. Specific examples thereof include NER-7604, NER-7403, and NER-1302 (all trade names, manufactured by Nippon Kayaku Co., Ltd.).
  • the epoxy equivalent of the epoxy resin (b) is 250 to 400 g / eq.
  • the softening point is preferably 60 to 85 ° C.
  • the epoxy resin (b) is usually 2 to 4900% by mass, preferably 5 to 100% by mass, more preferably 10 to 70% by mass with respect to the mass of the epoxy resin (a).
  • the usage rate of the epoxy resin (b) with respect to the mass of the epoxy resin (a) is 4900% by mass or less, the photosensitive image pattern can be easily formed into a vertical sidewall shape, and the pattern is prevented from being rounded. It becomes possible to do. Moreover, it can prevent effectively that a crack arises in the photosensitive image pattern surface because the usage-amount of the epoxy resin (b) with respect to the mass of an epoxy resin (a) is 2 mass% or more.
  • the epoxy resin (A) contained in the photosensitive resin composition of the present invention may be used in combination with an epoxy resin other than the epoxy resin (a) and the epoxy resin (b).
  • the epoxy resin that can be used in combination is not particularly limited, and the blending ratio is not particularly limited as long as the effect of the present invention is not impaired.
  • the category of (A) epoxy resin does not include the epoxy group-containing silane compound of component (D) and does not include the epoxy compound defined as the reactive epoxy monomer of component (E).
  • the polyhydric phenol compound contained in the photosensitive resin composition of the present invention contains one or more selected from the group consisting of phenol compounds represented by the above formulas (3) to (6).
  • the polyhydric phenol compound is useful for curing the epoxy resin with a high crosslinking density by heating. For this reason, the (B) polyhydric phenol compound can give the resin cured product the functions of low moisture permeability, high adhesion, and toughness.
  • Examples of the polyhydric phenol compound represented by the formula (3) include phenol novolac resins and cresol novolac resins. These novolac resins may be used alone or in combination of two or more. In particular, a phenol novolac resin is preferable because of excellent coating properties.
  • a phenol novolac resin As the phenol novolac resin, a phenol novolac resin having a softening point of 50 ° C. or higher and 150 ° C. or lower is preferable, and a phenol novolak resin having a softening point of 70 ° C. or higher and 100 ° C. or lower is particularly preferable. Specific examples of phenol novolac resins having a softening point of 50 ° C. or higher and 150 ° C.
  • PN-152 (trade name, manufactured by Meiwa Kasei Co., Ltd., softening point 50 ° C., hydroxyl group equivalent 105 g / eq.), H-1 (commercial product) Name, manufactured by Meiwa Kasei Co., Ltd., softening point 80 ° C., hydroxyl equivalent weight 104 g / eq.), TD-2131 (trade name, manufactured by DIC, softening point 80 ° C., hydroxyl equivalent weight 105 g / eq.), KA-1160 (trade name) DIC Corporation, softening point 81 ° C., hydroxyl group equivalent 117 g / eq.).
  • the hydroxyl group equivalent of the novolak resin is 80 to 130 g / eq. From the viewpoint of compatibility with the epoxy resin (A) and low moisture permeability. In the range of 100 to 120 g / eq. It is particularly preferable that the range is
  • Examples of the polyhydric phenol compound represented by the formula (4) include bisphenol A type novolac resins, and commercially available products are available.
  • Specific examples of the bisphenol A type novolak resin include VH-4150 (trade name, manufactured by DIC, softening point 85 ° C., hydroxyl group equivalent 118 g / eq.), VH-4170 (trade name, manufactured by DIC, softening point 103 ° C. Hydroxyl group equivalent 118 g / eq.), MEP-6309E (trade name, manufactured by Meiwa Kasei Co., Ltd., softening point 81 ° C., hydroxyl group equivalent 116 g / eq.), And the like.
  • These novolac resins may be used alone or in combination of two or more.
  • Examples of the polyhydric phenol compound represented by the formula (5) include biphenylphenol novolac resins, and commercially available products are available.
  • Specific examples of the biphenylphenol novolak resin include KAYAHARD GPH-65 (trade name, manufactured by Nippon Kayaku Co., Ltd., softening point 65 ° C., hydroxyl group equivalent 200 g / eq.). These novolac resins may be used alone or in combination of two or more.
  • Examples of the polyhydric phenol compound represented by the formula (6) include phenol aralkyl resins, and commercially available products are available. Specific examples of the phenol aralkyl resin include Milex XLC-3L (trade name, manufactured by Mitsui Chemicals, softening point 77 ° C., hydroxyl group equivalent 176 g / eq.). These phenol aralkyl resins may be used alone or in combination of two or more.
  • the blending ratio of the (B) polyhydric phenol compound in the photosensitive resin composition of the present invention is usually 1 to 40% by mass, preferably 4 to 30% by mass, based on the total mass of the (A) epoxy resin. Preferably, it is 5 to 25% by mass.
  • content of a polyhydric phenol compound is 40 mass% or less, the situation where development of a photosensitive image pattern becomes difficult is suppressed.
  • content of a polyhydric phenol compound is 1 mass% or more, sufficient adhesiveness and moisture resistance are easily obtained.
  • or (6) is (A) with respect to the mass of an epoxy resin.
  • the blending ratio of the polyhydric phenol compound is not particularly limited as long as it is within the above range.
  • the (B) polyhydric phenol compound contained in the photosensitive resin composition of the present invention is used in combination with a polyhydric phenol compound other than the polyhydric phenol compounds represented by the above formulas (3) to (6). May be.
  • the polyhydric phenol compound that can be used in combination is not particularly limited. Further, the blending ratio of the polyhydric phenol compound that can be used in combination is not particularly limited as long as the effects of the present invention are not impaired.
  • the photocationic polymerization initiator (C) contained in the photosensitive resin composition of the present invention generates cations upon irradiation with ultraviolet rays, far ultraviolet rays, excimer lasers such as KrF and ArF, X-rays and electron beams.
  • the cation can be a polymerization initiator.
  • Examples of the photocationic polymerization initiator include aromatic iodonium complex salts and aromatic sulfonium complex salts.
  • specific examples of the aromatic iodonium complex salt include diphenyliodonium tetrakis (pentafluorophenyl) borate, diphenyliodonium hexafluorophosphate, diphenyliodonium hexafluoroantimonate, di (4-nonylphenyl) iodonium hexafluorophosphate, and triluku.
  • aromatic sulfonium complex salt examples include 4-thiophenyldiphenylsulfonium hexafluoroantimonate (manufactured by Sun Apro, trade name CPI-101A), thiophenyldiphenylsulfonium tris (pentafluoroethyl) trifluoro Phosphate (trade name CPI-210S, manufactured by San Apro), 4- ⁇ 4- (2-chlorobenzoyl) phenylthio ⁇ phenylbis (4-fluorophenyl) sulfonium hexafluoroantimonate (trade name SP-172, manufactured by ADEKA)
  • a mixture of aromatic sulfonium hexafluoroantimonate containing 4-thiophenyldiphenylsulfonium hexafluoroantimonate ACETO Corporate USA, trade name CPI-6976
  • Phenylsulfonium tris trifluoromethane
  • Particularly preferred is a mixture of nates, tris [4- (4-acetylphenyl) sulfonylphenyl] sulfonium tetrakis (2,3,4,5,6-pentafluorophenyl) borate.
  • the cationic photopolymerization initiator component has an action of absorbing light. Therefore, in the case of a thick film (for example, 50 ⁇ m or more), the component (C) in an amount that is not excessively large (for example, an amount of 15% by mass or less) in order to sufficiently transmit the light during curing to the deep part. Is preferably used. On the other hand, in order to obtain a sufficient curing rate in the case of a thick film, it is preferable to use a certain amount (for example, 3% by mass or more) of the component (C).
  • the component (C) exhibits sufficient polymerization initiation performance when added in a small amount (for example, 1% by mass or more).
  • a small amount of the component (C) even if a large amount of the component (C) is used, the light transmittance to the deep part is not greatly reduced, but it is economical (preventing unnecessary use of an expensive initiator). Therefore, it is preferable to use an amount of the component (C) which is not excessively large.
  • the compounding ratio of (C) photocationic polymerization initiator in the photosensitive resin composition of this invention is (A) an epoxy resin and (B) a polyhydric phenol compound.
  • the (D) epoxy group-containing silane compound contained in the photosensitive resin composition of the present invention is improved in adhesion to the substrate and multilayered by the composition of the present invention in the step of using the composition of the present invention. It provides improved interlayer adhesion when the structure is formed. And (D) epoxy group containing silane compound does not inhibit the storage stability of the photosensitive resin composition of this invention.
  • Epoxy group-containing silane compound is an epoxy group-containing alkoxysilane compound.
  • Epoxy group-containing alkoxysilane compounds include 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyltriethoxysilane, and 2- (3,4-epoxycyclohexyl) ethyl. Examples include trimethoxysilane. These can be used alone or in combination of two or more.
  • the blending ratio of the (D) epoxy group-containing silane compound in the photosensitive resin composition of the present invention is as follows: (A) epoxy resin, (B) polyhydric phenol compound, (C) photocationic polymerization initiator, and (E) reaction.
  • the amount is usually 1 to 15% by mass, preferably 3 to 10% by mass, based on the total mass of the epoxy monomer.
  • the (E) reactive epoxy monomer contained in the photosensitive resin composition of the present invention contributes to improving the flexibility and flexibility of the uncured film and the cured film by the photosensitive resin composition of the present invention, and Contributes to improved adhesion of cured film.
  • a reactive epoxy monomer contains the epoxy compound represented by the said Formula (10) and / or the said Formula (11).
  • the divalent aliphatic hydrocarbon group represented by R 5 means the remaining atomic group (residue) obtained by removing two hydrogen atoms from a linear or branched hydrocarbon.
  • the number of carbon atoms is 1 to 11, preferably 1 to 8.
  • Examples of the divalent aliphatic hydrocarbon group represented by R 5 include linear aliphatic hydrocarbon groups such as a methylene group, an ethylene group, a propylene group, a butylene group, and a pentylene group, and the above linear aliphatic hydrocarbon groups.
  • a branched aliphatic hydrocarbon group having an alkyl group as a side chain may be mentioned.
  • the epoxy compound represented by the formula (10) is generally a diglycidyl ether of a divalent aliphatic alcohol. Specific examples thereof include neopentyl glycol diglycidyl ether, propylene glycol diglycidyl ether, butylethylpropane diglycidyl ether, methylpropane diglycidyl ether, trimethylpentane diglycidyl ether, ethylene glycol diglycidyl ether, 1,4-butanediol. Examples include diglycidyl ether and 1,6-hexanediol diglycidyl ether. Among these, neopentyl glycol diglycidyl ether, ethylene glycol diglycidyl ether, and 1,6-hexanediol diglycidyl ether are preferable.
  • the trivalent aliphatic hydrocarbon residue represented by R 6 means the remaining atomic group (residue) obtained by removing three hydrogen atoms from a linear or branched hydrocarbon, The number of carbon atoms is 1 to 11, preferably 1 to 8.
  • the trivalent aliphatic hydrocarbon residue represented by R 6 includes those having an alkyl group bonded as a side chain.
  • the epoxy compound represented by the formula (11) is generally a triglycidyl ether of a trivalent aliphatic alcohol. Specific examples thereof include trimethylolpropane triglycidyl ether and glycerin triglycidyl ether. Among these, trimethylolpropane triglycidyl ether is preferable.
  • the aliphatic hydrocarbon group represented by R 5 and R 6 has 11 or less carbon atoms, so that compatibility with other components and, consequently, the coating quality of the resin composition is adequate. Since it is maintained and good developability is obtained, it is convenient for forming a high-definition photosensitive image.
  • the blending ratio of the (E) reactive epoxy monomer in the photosensitive resin composition of the present invention is usually 2 to 12% by mass, preferably with respect to the total mass of (A) the epoxy resin and (B) the polyhydric phenol compound. 3 to 10% by mass.
  • the reactive epoxy monomer (E) contained in the photosensitive resin composition of the present invention is used in combination with a reactive epoxy monomer other than the epoxy compound represented by the formula (10) and / or the formula (11). Also good.
  • the reactive epoxy monomer that can be used in combination is not particularly limited, and the proportion of the reactive epoxy monomer that can be used in combination is not particularly limited as long as the effects of the present invention are not impaired.
  • the photosensitive resin composition of the present invention may further contain (G) an acrylic resin.
  • the (G) acrylic resin here includes a resin formed from a compound having an acrylic group and / or a compound having a methacrylic group.
  • the acrylic resin is not particularly limited, but is preferably a copolymer obtained using an ethylenically unsaturated monomer having a glycidyl group, and among them, a glycidyl methacrylate copolymer is particularly preferable. preferable.
  • the glycidyl methacrylate copolymer is a polymer obtained by copolymerizing glycidyl methacrylate and another ethylenically unsaturated monomer, and has an epoxy group in a branched form with respect to the polymer main chain. Therefore, the glycidyl methacrylate copolymer has high compatibility with the epoxy resin, and phase separation hardly occurs, so that it can be easily mixed with the epoxy resin. Furthermore, since the glycidyl methacrylate copolymer is a soft component, flexibility can be imparted to the cured film and adhesion can be improved.
  • a glycidyl methacrylate copolymer which is excellent in water resistance is preferred.
  • the epoxy equivalent of the glycidyl methacrylate copolymer is preferably 1000 or less.
  • the epoxy group in the molecular chain of the glycidyl methacrylate copolymer reacts with the epoxy resin at the time of curing to form a network structure.
  • thermal expansion under high temperature and high humidity conditions can be suppressed, and long-term Contributes to improved adhesion reliability.
  • the epoxy equivalent of the glycidyl methacrylate copolymer is 1000 or less, a sufficient number of reaction points with the epoxy resin are ensured, a network structure is effectively formed, and deterioration of the heat and moisture resistance is prevented.
  • ethylenically unsaturated monomers constituting the glycidyl methacrylate copolymer include acrylic acid derivatives such as acrylic acid, methyl acrylate and acrylic acid esters, fumaric acid derivatives such as dimethyl fumarate and diethyl fumarate, and Examples thereof include styrene derivatives such as styrene and ⁇ -methylstyrene. It is preferable to use an acrylic acid derivative as another ethylenically unsaturated monomer because the compatibility between the glycidyl methacrylate copolymer, the (A) epoxy resin, and the (E) reactive epoxy monomer can be increased.
  • the molecular weight of the glycidyl methacrylate copolymer is not particularly limited, but considering the compatibility with the epoxy resin, the weight average molecular weight is preferably 250,000 or less, more preferably 100,000 or less, and still more preferably 30,000 or less. It is.
  • copolymers having a glycidyl group include Marproof G-0150M (trade name, manufactured by NOF Corporation, a copolymer of glycidyl methacrylate and methyl methacrylate, epoxy equivalent of 310 g / eq.
  • the acrylic resin can be used alone or in admixture of two or more with the photosensitive resin composition of the present invention.
  • the blending ratio of (G) acrylic resin in the photosensitive resin composition of the present invention is as follows: (A) epoxy resin, (B) polyhydric phenol compound, (C) photocationic polymerization initiator, (D) epoxy group-containing silane compound And (E) 1 to 20% by mass, preferably 3 to 15% by mass, based on the total mass of the reactive epoxy monomer.
  • a solvent can be used for the photosensitive resin composition of this invention, in order to reduce the viscosity of a resin composition and to improve applicability
  • the solvent is an organic solvent that is usually used for ink, paint, etc., and can dissolve each constituent component of the photosensitive resin composition and does not cause a chemical reaction with the constituent component. Can be used without limitation.
  • Specific examples of the solvent include ketones such as acetone, ethyl methyl ketone, methyl isobutyl ketone, and cyclopentanone, aromatic hydrocarbons such as toluene, xylene, and methoxybenzene, dipropylene glycol dimethyl ether, and dipropylene glycol.
  • Glycol ethers such as diethyl ether and propylene glycol monomethyl ether, esters such as ethyl lactate, ethyl acetate, butyl acetate, methyl-3-methoxypropionate, carbitol acetate, propylene glycol monomethyl ether acetate and ⁇ -butyrolactone, methanol And alcohols such as ethanol, aliphatic hydrocarbons such as octane and decane, petroleum ethers such as petroleum ether, petroleum naphtha, hydrogenated petroleum naphtha and solvent naphtha.
  • a solvent is added for the purpose of adjusting the film thickness and application property when applied to a substrate.
  • the amount of the (F) solvent used to properly maintain the solubility of the main component of the resin composition, the volatility of each component, the liquid viscosity of the composition, etc. is usually in the photosensitive resin composition containing the solvent. It may be 95% by mass or less. The amount used is preferably 5 to 95% by mass, more preferably 10 to 90% by mass.
  • a sensitizer is further used to absorb ultraviolet light and donate the absorbed light energy to the photocationic polymerization initiator, in particular, an aromatic iodonium complex salt. Also good.
  • the sensitizer for example, thioxanthones and anthracene compounds having an alkoxy group at the 9th and 10th positions (9,10-dialkoxyanthracene derivatives) are preferable.
  • the alkoxy group include C1-C4 alkoxy groups such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group.
  • the 9,10-dialkoxyanthracene derivative may further have a substituent.
  • substituents include halogen atoms such as fluorine atom, chlorine atom, bromine atom and iodine atom, C1-C4 alkyl group, sulfonic acid alkyl ester group, carboxylic acid alkyl ester group and the like.
  • alkyl in the sulfonic acid alkyl ester group and the carboxylic acid alkyl ester group include C1-C4 alkyl.
  • the substitution position of these substituents is preferably the 2-position.
  • thioxanthones include 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, 2,4-diisopropylthioxanthone, and the like.
  • 2,4-diethylthioxanthone (trade name Kayacure DETX-S, manufactured by Nippon Kayaku Co., Ltd.) and 2-isopropylthioxanthone are preferable.
  • Examples of the 9,10-dialkoxyanthracene derivative include 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene, 9,10-dibutoxyanthracene, and 9,10-dimethoxy-2.
  • sensitizers can be used singly or in combination of two or more, but the use of 2,4-diethylthioxanthone and 9,10-dimethoxy-2-ethylanthracene is most preferable. Since the sensitizer exhibits an effect in a small amount, its use ratio is usually 30% by mass or less, preferably 20% by mass or less, based on the mass of the (C) photocationic polymerization initiator component.
  • an ion catcher may be added as necessary in order to reduce the adverse effect caused by the ions derived from the (C) photocationic polymerization initiator.
  • the ion catcher include trismethoxyaluminum, trisethoxyaluminum, trisisopropoxyaluminum, isopropoxydiethoxyaluminum, trisbutoxyaluminum and other alkoxyaluminum, trisphenoxyaluminum and trisparamethylphenoxyaluminum Acetoxyaluminum, trisstearatoaluminum, trisbutyratoaluminum, trispropionatoaluminum, trisacetylacetonatoaluminum, tristrifluoroacetylacetonatoaluminum, trisethylacetoacetoaluminum, diacetylacetonatodipivaloylmethanatoaluminum and di Isoprop
  • the compounding quantity is the sum total of (A) epoxy resin, (B) polyhydric phenol compound, (C) photocationic polymerization initiator, (D) epoxy group containing silane compound, and (E) reactive epoxy monomer. It may be 10% by mass or less based on the mass.
  • thermoplastic resin examples include polyethersulfone, polystyrene, and polycarbonate.
  • colorant examples include phthalocyanine blue, phthalocyanine green, iodine green, crystal violet, titanium oxide, carbon black, naphthalene black, anthraquinone red, quinacridone red, diketopyrrolopyrrole red, and the like.
  • the usage-amount of these additives in the photosensitive resin composition of this invention except a solvent, for example, 0 mass% or more and 30 mass% or less are respectively a temporary standard.
  • the amount of these used can be appropriately increased or decreased depending on the purpose of use and the required function of the cured film.
  • Examples of the thickener include olben, benton and montmorillonite.
  • Examples of the antifoaming agent include silicone-based, fluoroalkyl-based, and polymer-based antifoaming agents.
  • a solvent for example, 0 mass% or more and 10 mass% or less are respectively a temporary standard. However, the amount used can be appropriately increased or decreased depending on the purpose of use and coating quality.
  • the photosensitive resin composition of the present invention includes, for example, barium sulfate, barium titanate, silicon oxide, amorphous silica, talc, clay, magnesium carbonate, calcium carbonate, aluminum oxide, aluminum hydroxide, montmorillonite, mica powder, etc.
  • Any inorganic filler can be used.
  • the usage-amount of an inorganic filler may be 0 mass% or more and 60 mass% or less with respect to the mass of the photosensitive resin composition of this invention except a solvent normally. However, the amount used can be appropriately increased or decreased depending on the purpose of use and the required function of the cured film.
  • organic fillers such as polymethyl methacrylate, rubber, fluoropolymer, and polyurethane powder can be incorporated into the photosensitive resin composition of the present invention.
  • the photosensitive resin composition of the present invention comprises (A) an epoxy resin, (B) a polyhydric phenol compound, (C) a photocationic polymerization initiator, (D) an epoxy group-containing silane compound, and (E) a reactive epoxy monomer.
  • the photosensitive resin composition of the present invention may be preferably used in a liquid form to which a solvent is added for application to a substrate.
  • Application can be performed by a spin coating method comprising: Spin coating can be performed at various rotational speeds to control film thickness.
  • the photosensitive resin composition is applied to the substrate using other coating methods such as roller coating, doctor knife coating, slot coating, dip coating, gravure coating, spray coating, etc. it can.
  • dry baking can be performed to evaporate the solvent.
  • Dry bake conditions can be selected to form a semi-cured dry coating of the photoresist. Typical conditions include the use of a hot plate with a smooth surface, with the coating in contact with or close to the surface, coating thickness, solvent volatility, and substrate thermal conductivity. Depending on the thickness of the substrate, drying can be performed at 65 ° C. for 1 to 15 minutes, followed by 90 to 125 ° C. for 5 to 120 minutes. Alternatively, the dry bake can be performed in a convection oven.
  • a photosensitive image can be formed by irradiating an energy beam with X-ray radiation from the laser beam or irradiating an electron beam radiation directly or through patterned exposure. Contact, proximity, or projection prints can be used.
  • post-exposure baking may be performed to accelerate the polymerization reaction by acid catalysis of the exposed areas of the coating. Typical conditions are 65 ° C. for 1-5 minutes, then 95 ° C. for 1-60 minutes, depending on the thickness of the coating on the hot plate as well as the thermal conductivity and thickness of the substrate.
  • the unexposed portion in order to dissolve and remove the unexposed portion, it can be immersed in an organic solvent developer typically for 2 to 30 minutes depending on the thickness of the coating film and the solvent titer of the developer solvent. Further, the developed image can be rinsed by applying a rinsing solvent to remove the developer attached to the cured film.
  • the attached developer contains a dissolved photoresist component, and when dried, it becomes a residue on the photosensitive image and easily causes contamination. Therefore, it is desirable to remove the attached developer. In the case of the dipping method, it is possible to prevent adhesion of residues by preparing a clean developer tank and performing development in multiple stages.
  • the developer solvent can be applied by spraying using either an explosion-proof atomizing spray nozzle or an explosion-proof micro shower head spray nozzle.
  • a method of applying a developer using a paddle method can be mentioned.
  • the paddle method a substrate to be developed is placed on a rotating tool head, and then a sufficient amount of developer solution to form a stagnant layer or paddle on the entire substrate area is rotated at a low speed. Distribute the sample to the top, stop the rotation of the substrate, let the formed developer paddle stand on the substrate for a certain period of time, then accelerate the rotation of the substrate to remove the used developer by spin removal. Including slowing down until it stops. It is usual to use a method of repeating the sequence several times as necessary until a clear photosensitive image is obtained.
  • Suitable developers include, but are not limited to, propylene glycol monomethyl ether acetate, ⁇ -butyrolactone, acetone, cyclopentanone, diacetone alcohol, tetrahydrofurfuryl alcohol, N-methylpyrrolidone, anisole, and ethyl lactate. Not. Particularly preferred is propylene glycol monomethyl ether acetate which dissolves unexposed portions well and is relatively low in cost.
  • Suitable rinses include any of the above developer solvents, and methanol, ethanol, isopropanol and n-butyl acetate. Of these, acetone, ethanol and isopropanol are particularly preferred because they can be washed quickly and can be dried quickly.
  • heat treatment can be performed at a temperature of 130 to 200 ° C. according to the heat resistance of the substrate.
  • Substrate materials that can be used are silicon, silicon dioxide, tantalum, lithium tantalate, silicon nitride, alumina, glass, glass-ceramics, gallium arsenide, indium phosphide, copper, aluminum, nickel, iron, steel, copper -Including but not limited to silicon alloys, indium-tin oxide coated glass, organic films such as polyimide and polyester, any substrate containing patterned regions of metal, semiconductor, and insulating material.
  • the photosensitive resin composition of the present invention can also be used as a resist laminate by being sandwiched between two substrates. For example, after coating a photosensitive resin composition diluted with a solvent on a base film (base material) using a roll coater, die coater, knife coater, bar coater, gravure coater, etc., set to 45 to 100 ° C.
  • the resist laminate can be obtained by removing the solvent with a drying oven and laminating a cover film (base material) and the like. At this time, the thickness of the resist on the base film may be adjusted to 2 to 100 ⁇ m.
  • films such as polyester, a polypropylene, polyethylene, TAC, a polyimide, may be used, for example.
  • a film that has been subjected to a release treatment with a silicone-type release treatment agent, a non-silicone-type release treatment agent, or the like may be used as necessary.
  • the cover film is peeled off and transferred to a substrate at a temperature of 40 to 100 ° C. and a pressure of 0.05 to 2 MPa by a hand roll, a laminator, etc., and the liquid photosensitive resin is used. Similar to the composition, exposure, post-exposure baking, development, and heat treatment may be performed.
  • the photosensitive resin composition is used in the form of a dry film resist according to the resist laminate of the present invention, the steps of coating on a support or a substrate and drying can be omitted. This makes it possible to more easily form a fine pattern using the photosensitive resin composition of the present invention.
  • the photosensitive resin composition of the present invention is applied to a substrate and dried to form a first layer photosensitive resin coating film.
  • post-exposure baking It is possible to form a complicated multilayer structure pattern by repeating this process and finally performing development and hard baking at the end.
  • the first layer is developed, hard baked, the second layer is applied and dried, alignment exposure is performed through a photomask, and development and hard baking are repeated to form a multilayer structure pattern.
  • Each photosensitive resin layer may be formed by laminating a dry film resist.
  • the “package” is a sealing method or a sealed one used to block the ingress of gas or liquid in the outside air in order to maintain the stability of the substrate, wiring, elements, and the like.
  • the package described in this specification is a hollow package for packaging a vibrator such as a MEMS or a SAW device, or a semiconductor substrate, a printed wiring board, a wiring, or the like. This refers to surface protection to be performed or resin sealing for sealing the microreactor forming component with a top plate.
  • “Wafer level package” means that a protective film is formed in the wafer state, terminals and wiring are processed up to the package, and then cut into chips and separated into individual pieces, and fine micro or nano channels and orifice plates are formed on the wafer. This represents a method of three-dimensional processing in a batch.
  • the photosensitive resin composition of the present invention By using the photosensitive resin composition of the present invention, it is possible to form a fine and vertical sidewall shape pattern by photolithography.
  • the cured product has characteristics that are excellent in low stress and moisture and heat resistance.
  • permanent resists and cured products that satisfy the characteristics required for semiconductor and MEMS / micromachine application fields, in particular, MEMS packages, semiconductor packages, and microreactor forming parts can be obtained. It is.
  • Examples 9 to 16 and Comparative Examples 6 to 10 (Preparation of photosensitive resin composition solution (liquid resist))
  • the agent, (D) epoxy group-containing silane compound, (E) reactive epoxy monomer and (G) acrylic resin are diluted with cyclopentanone to a concentration of 65% by mass, and the mixture is stirred at 60 ° C. in a flask equipped with a stirrer. The mixture was dissolved by stirring for a period of time, allowed to cool, and then filtered through a membrane filter having a pore size of 1.0 ⁇ m to obtain a photosensitive resin composition solution (liquid resist) for comparison with the present invention.
  • PEB post-exposure baking
  • the amount (soft contact, i-line, exposure amount in Table 2) was irradiated, and PEB was performed for 5 minutes on a 95 ° C. hot plate. Immerse and develop at 23 ° C for 3 minutes with SU-8 Developer (trade name, manufactured by Microchem Corp., main component of propylene glycol monomethyl ether acetate), rinse with isopropanol, dry, and hard-bake in an oven at 200 ° C for 60 minutes. A resin pattern cured on the silicon wafer was obtained.
  • SU-8 Developer trade name, manufactured by Microchem Corp., main component of propylene glycol monomethyl ether acetate
  • the wafer with the resin pattern was cut, and in a PTFE inner cylindrical sealed container, an aqueous solution containing a water-soluble organic solvent-A (composition: 2-imidazolidinone 10 mass%, 2,2′-sulfonyldiethanol 7.5 mass) %, Glyceritol 5% by mass, pentylene glycol 5% by mass, ethylene oxide-modified acetylenol 0.4% by mass), -B (composition: gamma-butyrolactam 30% by mass, 2,2′-oxydiethanol 10% by mass, Hexamethylene glycol 5% by mass, ethylene oxide-modified acetylenol 0.2% by mass), -C (composition: glyceritol 15% by mass, polyethylene glycol # 400 5% by mass, polyoxyethylene lauryl ether 3% by mass) Each piece was individually immersed and subjected to a wet heat test at 80 ° C.
  • a water-soluble organic solvent-A
  • (A-1) to (G-2) are as follows.
  • the characteristics of the compositions obtained from the examples are such that the resolution dimension of the photosensitive pattern is higher than that of the comparative example, and cracks are generated in the developed film. Further, it was found that no cracks were generated in the hole pattern and the adhesion after wet heat was maintained.
  • Examples 35 to 36 resist laminate comprising the photosensitive resin composition of the present invention
  • ethylene glycol dimethyl ether was further added to the blending composition ratios of Example 9 and Example 15 in Table 2, and mixed and dissolved by stirring at 60 ° C. for 1 hour in a flask with a stirrer.
  • the solution viscosity at 25 ° C. was 3 Pa. Diluted to s, allowed to cool, and then subjected to membrane filtration with a pore size of 1.0 ⁇ m to obtain a lacquer for the photosensitive resin composition dry film of the present invention.
  • lacquers are uniformly applied on a base film (made of polypropylene, Mitsubishi Plastics, 38 ⁇ m thick), dried with a hot air convection dryer at 65 ° C. for 5 minutes and at 80 ° C. for 15 minutes, and then exposed surface.
  • a cover film made of polypropylene, manufactured by Mitsubishi Plastics Co., Ltd., film thickness: 38 ⁇ m was laminated thereon to obtain resist laminates (photosensitive resin composition laminates) sandwiching a dry film resist with a film thickness of 25 ⁇ m.
  • PEB was performed for 5 minutes on a hot plate at 95 ° C, developed by immersion with SU-8 Developer (trade name, manufactured by Microchem, propylene glycol monomethyl ether acetate) at 23 ° C for 3 minutes, and rinsed with isopropanol. Each of the resin patterns was dried and cured on the substrate.
  • SU-8 Developer trade name, manufactured by Microchem, propylene glycol monomethyl ether acetate
  • the photosensitive resin composition of the present invention can form a fine and vertical sidewall shape pattern by a photolithography technique.
  • the cured product has characteristics that are excellent in low stress and moisture and heat resistance. Permanent resists and cured products having characteristics required for semiconductor and MEMS / micromachine application fields, in particular, MEMS packages, semiconductor packages, and microreactor forming parts can be obtained.

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Abstract

L'objet de la présente invention est de fournir les éléments suivants : une composition de résine époxy photosensible qui, par photolithographie, peut former une image haute résolution et à faible contrainte qui présente des parois latérales verticales et résiste à l'humidité et à la chaleur, et/ou un stratifié de résine photosensible obtenu au moyen de ladite composition de résine époxy photosensible ; et un ou plusieurs articles obtenus par durcissement de ladite composition de résine époxy photosensible et/ou dudit stratifié de résine photosensible. La présente invention concerne ainsi une composition de résine photosensible contenant les constituants suivants : une résine époxy (A), un composé de phénol polyhydrique (B) présentant une structure spécifique, un photo-initiateur de polymérisation cathionique (C), un composé silane (D) contenant un groupe époxy, et un monomère époxy réactif (E) présentant une structure spécifique. La résine époxy (A) contient le dérivé phénolé représenté par la formule (1), une résine époxy (a) obtenue par le biais d'une réaction avec l'épihalohydrine, et une résine époxy (b) pouvant répondre à la formule (2). Le monomère époxy réactif (E) consiste en un éther polyglycidylique aliphatique divalent ou trivalent.
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US10012901B2 (en) 2012-11-22 2018-07-03 Nippon Kayaku Kabushiki Kaisha Photosensitive resin composition, resist laminate, and articles obtained by curing same (5)
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EP3156845A4 (fr) * 2014-06-13 2017-11-22 Nippon Kayaku Kabushiki Kaisha Composition de résine photosensible, stratifié de résine photosensible, produit durci de composition de résine photosensible, et produit durci de stratifié de résine photosensible (11)
US9857685B2 (en) 2014-06-13 2018-01-02 Nippon Kayaku Kabushiki Kaisha Photosensitive resin composition, resist laminate, cured product of photosensitive resin composition, and cured product of resist laminate (11)
KR102357446B1 (ko) 2014-06-13 2022-01-28 닛뽄 가야쿠 가부시키가이샤 감광성 수지 조성물, 레지스트 적층체 및 이들의 경화물 （１１）

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