WO2014054547A1 - Resin composition, resin cured product, transparent composite, display-element substrate, and surface-light-source substrate - Google Patents
Resin composition, resin cured product, transparent composite, display-element substrate, and surface-light-source substrate Download PDFInfo
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- WO2014054547A1 WO2014054547A1 PCT/JP2013/076393 JP2013076393W WO2014054547A1 WO 2014054547 A1 WO2014054547 A1 WO 2014054547A1 JP 2013076393 W JP2013076393 W JP 2013076393W WO 2014054547 A1 WO2014054547 A1 WO 2014054547A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/04—Reinforcing macromolecular compounds with loose or coherent fibrous material
- C08J5/0405—Reinforcing macromolecular compounds with loose or coherent fibrous material with inorganic fibres
- C08J5/043—Reinforcing macromolecular compounds with loose or coherent fibrous material with inorganic fibres with glass fibres
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/707—Surface textures, e.g. pyramid structures of the substrates or of layers on substrates, e.g. textured ITO layer on a glass substrate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2363/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
- C08J2363/02—Polyglycidyl ethers of bis-phenols
Definitions
- the present invention relates to a resin composition, a cured resin, a transparent composite, a display element substrate, and a surface light source substrate.
- This application claims priority based on Japanese Patent Application No. 2012-219174 for which it applied to Japan on October 1, 2012, and uses the content here.
- Epoxy compounds are widely used in industrial applications, electronic material applications, optical applications and the like from the viewpoints of heat resistance, moldability, transparency, and the like.
- Patent Documents 1 and 2 describe a cured resin obtained by curing an epoxy compound with an amine catalyst and imidazole.
- a polymerization initiator of an epoxy compound there is a cationic polymerization initiator.
- the polymerization reaction of a glycidyl type epoxy compound does not proceed with a cationic polymerization initiator, and a general alicyclic epoxy compound undergoes a polymerization reaction, but its reactivity is low.
- Patent Document 1 Japanese Patent Application Laid-Open No. 2012-116979
- Patent Document 2 JP 2012-158719 A
- An object of the present invention is an epoxy compound-containing resin composition and an epoxy compound-containing resin composition that can obtain a cured resin, a transparent composite, a display element substrate, and a surface light source substrate with low energy.
- the object is to provide a cured product, a transparent composite, a display element substrate, and a surface light source substrate.
- the reaction accelerator is an alicyclic epoxy compound (2) represented by the following (2):
- [4] A cured resin product produced by irradiating the resin composition according to any one of [1] to [3] with light.
- [5] A transparent composite produced by combining the resin composition according to any one of [1] to [3] above and a glass filler and irradiating with light.
- [9] A surface light source substrate using the cured resin or transparent composite according to the above [4] or [5].
- a cured product can be obtained with low energy.
- curing with a cationic polymerization initiator reduces the water absorption of the cured product because the number of hydroxyl groups decreases.
- the resin composition of this invention has the reaction accelerator which is an epoxy compound (1), a photocationic polymerization initiator, and an alicyclic epoxy compound (2).
- the reaction accelerator which is an epoxy compound (1), a photocationic polymerization initiator, and an alicyclic epoxy compound (2).
- Epoxy compound (1) Of the epoxy compound (1) used in the present invention, (1A) is an alicyclic epoxy compound having an epoxycyclohexane ring (however, the one having the structure shown in (2) is excluded).
- the reaction of the alicyclic epoxy compound represented by (1A) is initiated and proceeds by the photocationic polymerization initiator, but its reactivity is low when compared with the alicyclic epoxy compound shown in (2).
- the mixture of the alicyclic epoxy compound represented by (1A) and the alicyclic epoxy compound having the structure represented by (2) has a significantly improved reactivity compared to (1A) alone, The reaction by the photocationic polymerization initiator can proceed with energy.
- the epoxy compound (1A) is highly flexible compared to (2), the copolymer of (1A) and (2) is more flexible than (2) a single polymer. Can be granted.
- Examples of the epoxy compound represented by (1A) include, for example, an alicyclic epoxy and an alicyclic carbonyl type epoxy compound containing a carbonyl group, an alicyclic epoxy and an alicyclic ester type epoxy compound containing an ester bond, Examples include alicyclic carbonate type epoxy compounds containing cyclic epoxy and carbonate groups.
- an alicyclic epoxy compound having two or more alicyclic epoxy structures is desirable, and the alicyclic epoxy structure is particularly preferably an epoxycyclohexane ring.
- the epoxy group of the epoxycyclohexane is formed between adjacent carbons of cyclohexane.
- the bond to the epoxycyclohexane is preferably a structure that is carried out through carbon that is not adjacent to the carbon that forms the epoxy group. Specific examples include compounds having the following structure.
- (1B) is an epoxy compound which has a glycidyl type epoxy among the epoxy compounds (1) used by this invention, and is shown by the following structural formula.
- the reaction of the glycidyl type epoxy compound represented by (1B) generally does not start and proceed with the photocationic polymerization initiator.
- the mixture of the glycidyl-type epoxy compound represented by (1B) and the alicyclic epoxy compound having the structure represented by (2) has dramatically improved reactivity compared to (1B) alone, and has low energy.
- the reaction by the photocationic polymerization initiator can be advanced.
- the epoxy compound (1B) is highly flexible as compared with (2), the copolymer of (1B) and (2) is more flexible than (2) a single polymer. Can be granted.
- Examples of the epoxy compound represented by (1B) include a glycidyl ether type epoxy compound containing a glycidyl group and an ether bond, a glycidyl ester type epoxy compound containing a glycidyl group and an ester bond, and a glycidyl amine type epoxy containing a glycidyl group and an amino group.
- a glycidyl ether type epoxy compound for example, bisphenol A type, bisphenol F type, hydrogenated bisphenol A type, biphenyl type, phenol novolac type, bisphenol A novolak type, glycidyl type having a fluorene skeleton, etc. Is used.
- the epoxy compound represented by (1B) is a glycidyl type epoxy compound having two or more glycidyl type epoxy structures and having a benzene ring
- the epoxy compound represented by (1B) is a glycidyl type epoxy compound having two or more glycidyl type epoxy structures and having a benzene ring
- Due to the high refractive index property it becomes possible to produce a cured product having an adjusted refractive index as compared with (2) a cured resin product consisting of a single resin, and it is particularly suitable for optical applications such as display applications.
- Alicyclic epoxy compound (2) As the alicyclic epoxy compound (2) used in the present invention, the alicyclic epoxy compound represented by the following (2) is used.
- X in the formula (2) is —O—, —S—, —SO—, —SO 2 —, —CH 2 —, —CH (CH 3 ) —, —C (CH 3 ) 2 — or Represents a bond.
- the alicyclic epoxy compound represented by (2) is excellent in reactivity with the photocationic polymerization initiator alone, but a mixture in combination with an epoxy compound having another structure is also reactive with the photocationic polymerization initiator. Excellent. That is, the alicyclic epoxy compound having the structure (2) is considered to have an action of promoting the reaction of the epoxy compound having another structure.
- it is particularly preferable that X is —CH (CH 3 ) —, —C (CH 3 ) 2 — or a single bond.
- (1A) is 3 ′, 4′-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate (product name of Daicel Corporation: “Celoxide 2021p”) , “Celoxide 2081”, “Epolide GT401”, “Epolide PB4700” (hereinafter, Daicel product name), or (1B) a glycidyl ether type epoxy compound containing a glycidyl group and an ether bond, a glycidyl group and Examples include glycidyl ester type epoxy compounds containing an ester bond, glycidyl amine type epoxy compounds containing a glycidyl group and an amino group, and particularly glycidyl ether type epoxy compounds such as bisphenol A type, bisphenol F type, hydrogenated bisphenol.
- (2) is (3,3 ′, 4,4′-diepoxy) bi, when it is a compound of a type such as diol A type, biphenyl type, phenol novolak type, bisphenol A novolak type, glycidyl type having a fluorene skeleton.
- cyclohexyl or 2,2′-bis (3,4′-epoxycyclohexyl) propane and when (1A) is 3 ′, 4′-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate,
- (1B) is a glycidyl ether-epoxy compound having a bisphenol A type, bisphenol F type, biphenyl type, phenol novolac type, or fluorene skeleton
- (2) is (3, 3 ′, 4, 4 ′) More preferred is -diepoxy) bicyclohexyl.
- the weight ratio of (1) and (2) is within the above range, it is possible to efficiently react the epoxy compound of (1) in which the reaction by the cationic polymerization initiator is difficult to proceed. Polymerization with can be performed.
- the characteristic (1) makes it possible to improve flexibility and / or widen the adjustment range of the refractive index in the same manner as described above.
- the resin composition of the present invention contains a photocationic polymerization initiator as a polymerization initiator.
- a photocationic photopolymerization initiator reacts well with an epoxy compound having an epoxycyclohexane structure, and particularly has high reactivity with the alicyclic epoxy compound shown in (2), so that the resin composition of the present invention is concentrated. It is suitable for the process of applying light energy, and the pot life is extended.
- Examples of the cationic photopolymerization initiator include onium salts such as a diazonium salt of Lewis acid, an iodonium salt of Lewis acid, and a sulfonium salt of Lewis acid.
- Specific examples of the cationic photopolymerization initiator include boron tetrafluoride phenyldiazonium salt, phosphorus hexafluoride diphenyliodonium salt, antimony hexafluoride diphenyliodonium salt, arsenic hexafluoride tri-4-methylphenylsulfonium Salts, tri-4-methylphenylsulfonium salt of antimony tetrafluoride, and mixtures thereof.
- Adekaoptomer SP-150 Adekaoptomer SP-170 manufactured by Adeka
- Kayrad PCI-220 Kayalad PCI-620 manufactured by Nippon Kayaku
- UVI-6990 manufactured by Union Carbide
- CIT- manufactured by Nippon Soda 1370 CIT-1682, CIP-1866S, CIP-2048S, CIP-2064S
- DPI-101 manufactured by Midori Chemical DPI-102, DPI-103, DPI-105, MPI-103, MPI-105, BBI-101, BBI-102, BBI-103, BBI-105, TPS-101, TPS-102, TPS-103, TPS-105, MDS-103, MDS-105, DTS-102, DTS-103, and the like.
- the resin composition of the present invention is cured with low energy, and can be cured even if the cumulative amount of light irradiated to the resin composition is reduced.
- the integrated light quantity of necessary light for example, preferably from 50 ⁇ 5000mJ / cm 2, more preferably 100 ⁇ 4000mJ / cm 2, 150 ⁇ Even more preferably, it is 3000 mJ / cm 2 .
- the light for measuring the integrated light amount is ultraviolet light
- the integrated light amount is an integrated light amount having a wavelength of 365 nm.
- “curing” means that many functional groups that can participate in the curing reaction are reacted in the resin composition. Specifically, the epoxy ring opening rate of the resin composition is 50% or more. It means that. What hardened
- cured the resin composition is called resin cured material.
- the epoxy ring opening rate is an index corresponding to the ring opening rate of epoxy groups in the resin composition.
- FT-IR Fourier transform infrared spectroscopy
- the area of the peak derived from the epoxy group located near the wave number of 914 cm ⁇ 1 was standardized by the area of the peak derived from the methylene group located near the wave number of 2900 cm ⁇ 1.
- Epoxy relative strength the ratio of the peak area derived from the epoxy group to the peak area derived from the methylene group is defined as the epoxy relative strength X of the sample, and the epoxy ring opening rate of the sample to be obtained is defined as Y (%).
- the epoxy relative strength of the resin composition before curing is measured in advance. Since it is presumed that the epoxy group is not ring-opened in the resin composition before curing, this can be used as a standard sample.
- the epoxy relative strength of the resin composition before curing can be regarded as a strength corresponding to an epoxy ring-opening rate of 0%.
- the epoxy ring-opening rate Y (%) of the sample is calculated as a value obtained by multiplying 100 by the value obtained by dividing the epoxy relative strength X of the sample by the epoxy relative strength of the resin composition before curing. *
- the resin cured product of the present invention is cured by mixing a resin composition containing each of the above components with various fillers as necessary and forming it into a desired shape, and applying heat energy and / or light energy. It is something to be made.
- the transparent composite of the present invention is obtained by mixing various fillers with the resin composition containing the above components and molding the resin composition into a plate shape and curing the resin composition.
- the substrate for a surface light source of the present invention is impregnated with a resin composition in which the above-mentioned components are mixed into glass fiber as a filler, and after being molded (shaped) into a plate shape in this state, the resin composition is cured. It has been made.
- the water absorption rate of the cured resin, the transparent composite, and the surface light source substrate of the present invention is not particularly limited, but is preferably 0 to 5%, and more preferably 0 to 3%.
- the water absorption here refers to the water absorption after the resin cured product, transparent composite and / or surface light source substrate is dried at 50 ° C./24 hours and then immersed in pure water at 23 ° C. for 24 hours. Say.
- the water absorption rate of the cured resin, transparent composite and surface light source substrate of the present invention is within the above range, it is possible to suppress water absorption expansion, especially for industrial use, electronic material use and optical use that require dimensional accuracy. Is suitable.
- the filler will be described.
- the cured resin, the transparent composite, and the surface light source substrate of the present invention may contain various fillers as necessary, and in this case, it is preferable to contain a glass filler.
- the glass filler is a filler (filler) composed of fibers or particles made of an inorganic glass material.
- FIG. 1 illustrates a surface light source substrate 100 when the glass fiber 2 is a glass cloth.
- the glass fiber 2 shown in FIG. 1 is composed of a longitudinal glass yarn (warp) 2a and a transverse glass yarn (weft) 2b, and the longitudinal glass yarn 2a and the transverse glass yarn 2b are substantially orthogonal to each other. .
- Examples of the woven structure of the glass fiber 2 include a plain weave shown in FIG. 1, a nanako weave, a satin weave, and a twill weave.
- a plain weave is a woven structure in which warps and wefts are alternately woven.
- Nanako weaving is a woven structure in which a plurality of warp yarns and a plurality of weft yarns are alternately crossed.
- the satin weave is a woven structure woven so that one of warp and weft is extended to the surface.
- a twill weave is a weave structure in which warp or weft weaving continues diagonally.
- Examples of the inorganic glass material include E glass, C glass, A glass, S glass, T glass, D glass, NE glass, quartz, low dielectric constant glass, and high dielectric constant glass.
- E glass, S glass, T glass, and NE glass which are easy to obtain with few ionic impurities, are preferably used.
- S glass or T glass having an average linear expansion coefficient of 5 ppm / K or less at 30 ° C. to 250 ° C. is more preferably used, and is easily available and inexpensive.
- glass E is more preferably used.
- the content of the glass filler is preferably 1 to 90% by mass, more preferably 10 to 80% by mass, and more preferably 10 to 80% by mass with respect to the cured resin, the transparent composite, and the cured resin in the surface light source substrate.
- the amount is preferably 30 to 70% by mass. If the content of the glass filler is within this range, it is easy to mold the resin cured product, the transparent composite, and the substrate for the surface light source, and the effect of reducing the linear expansion due to the composite of the resin composition and the glass filler is recognized. Moreover, if there is much glass filler amount, the uniformity of the resin amount per unit volume will improve, and the uniformity of stress will improve. When the resin amount and / or stress uniformity is improved, the undulation of the cured resin, the transparent composite, and the surface light source substrate is reduced. *
- the diameter which the fiber which comprises glass fiber and glass fiber cloth is 100 nm or less. Glass fibers and glass fiber fabrics that satisfy these conditions are less likely to scatter at the interface regardless of the difference between their refractive index and the refractive index of the epoxy compound, so that the cured resin, transparent composite, and surface light source The transparency of the substrate is relatively high.
- the average diameter of the glass fibers is more preferably about 2 to 15 ⁇ m, further preferably about 3 to 12 ⁇ m, and most preferably about 3 to 10 ⁇ m.
- the average diameter of glass fiber is calculated
- the cured resin, transparent composite and surface light source substrate of the present invention are thermoplastic or thermosetting resin oligomers and monomers, coupling agents, ultraviolet absorbers, as necessary, as long as the characteristics are not impaired. Agents, dyes, pigments, other fillers, etc. may be included.
- the cured resin, the transparent composite and the surface light source substrate of the present invention can further increase the haze value by including a filler or the like in addition to the glass filler in the resin material. It becomes possible to make a substrate for a body and a surface light source.
- the refractive index difference between the filler other than the glass filler and the cured resin is preferably 0.01 or more and 3 or less. When this difference in refractive index is less than 0.01, there is a high possibility that a problem that the effect on light diffusibility is not sufficiently exhibited. On the other hand, there are very few materials having a difference in refractive index of 3 or more and lack selectivity.
- Examples of materials used for fillers other than glass fillers include inorganic materials and mixtures thereof, such as zinc oxide, zirconium oxide, aluminum oxide, calcium oxide, titanium oxide, silica, and mixtures thereof.
- Examples of the organic material include those using acrylic, styrene, or a mixture thereof.
- Examples of the shape of the filler other than the glass filler include a spherical shape, a rod shape, a planar shape, and a fibrous shape.
- the content of the filler other than the glass filler is preferably about 1 to 90 parts by mass and more preferably about 3 to 70 parts by mass with respect to 100 parts by mass of the glass filler.
- the conversion particle size is 0.1 to 100 micrometer.
- the thickness is 0.1 ⁇ m or less and 100 ⁇ m or more, there is a problem that the diffusion function cannot be sufficiently exhibited.
- the fiber diameter is preferably 0.1 ⁇ m or more and 100 ⁇ m or less.
- the thickness is 0.1 ⁇ m or less and 100 ⁇ m or more, there is a problem that the diffusion function cannot be sufficiently exhibited.
- Examples of the method for molding the resin composition include a method of casting into a mold.
- a method in which the resin composition is dissolved in a solvent and cast by a method such as gravure coating, spin coating, bar coating, dip coating or the like can be mentioned.
- a method of impregnating a component other than the glass filler from one or both sides of the glass fiber cloth to form a resin composition molded into a plate shape is used. Can be mentioned.
- the curing of the resin composition is performed by irradiating the resin composition with light, that is, by irradiating with ultraviolet rays, electron beams, or the like in the present invention.
- the reaction can be further advanced by performing a heat treatment as a secondary treatment.
- the treatment temperature during the secondary treatment is preferably about 150 to 300 ° C., more preferably about 200 to 280 ° C.
- the treatment time is preferably about 0.1 to 5 hours, more preferably about 0.2 to 3 hours. Thereby, reaction can be advanced efficiently.
- dissolves a resin composition methyl ethyl ketone, acetone, methyl isobutyl ketone, toluene, xylene, ethyl acetate etc. are mentioned, for example.
- the cured resin product of the present invention is preferably applied to, for example, lamp covers such as lighting fixtures and automobile lamps, optical lenses such as eyeglass lenses and camera lenses, and figurines.
- the transparent composite of the present invention can be applied to various transparent substrates such as substrates for liquid crystal display devices, substrates for organic EL devices, substrates for color filters, substrates for electronic paper, substrates for solar cells, substrates for touch panels, etc. Preferably applied.
- the average thickness of the transparent composite is not particularly limited, but is preferably about 10 to 300 ⁇ m, and more preferably about 20 to 200 ⁇ m.
- the substrate for a surface light source of the present invention has a surface texture on which at least one surface of the substrate has irregularities, and the irregularities have an average roughness (Rz) of 10 points on the surface of 1 ⁇ m to 30 ⁇ m. It is.
- the method of providing irregularities on the substrate surface is not particularly limited.
- a method of fixing particles on the substrate surface a method of mixing particles in a substrate and dispersing the particles near the substrate surface, a base substrate subjected to embossing, etc.
- Examples thereof include a method for forming and transferring a substrate, and a method for mechanically forming irregularities on the surface.
- FIG. 2 is a cross-sectional view of a surface light source substrate 100 in which a filler 4 is fixed on a composite layer including a resin 1 and glass fibers 2.
- the substrate when producing the resin substrate, after mixing the particles with the resin composition before curing, the substrate can be produced and the surface can be provided with irregularities by the mixed particles.
- the particles used here include a filler.
- the method of transferring the embossed shape to the surface of the substrate with the embossed mold and the substrate on the embossed mold is a method in which after making and curing the substrate, it is removed from the mold and the unevenness of the mold is transferred.
- the embossed mold is pressed to transfer the unevenness on the mold.
- the embossed mold is made of metal, the unevenness of the substrate surface can be produced with good reproducibility, which is suitable for mass production.
- the glass fiber 2 and the resin cured material 1 are further provided with a resin cured material layer 4, and an embossed base substrate 5, which is an embossed mold, is pressed against the resin cured material layer 4. The method for producing the unevenness for transferring the film was shown.
- a method for mechanically producing irregularities on the surface a method of directly roughing the substrate surface by sand blasting, a method of rubbing with a wire brush or sand paper, and mechanically imparting irregularities to the surface can be used.
- E glass-based glass cloth (Unitika Glass Fiber Co., Ltd. (# 2319 type) refractive index 1.555) (3, 3 ′, 4, 4′-diepoxy) bicyclohexyl (Celoxide 8000, manufactured by Daicel Corporation) 40 Parts by weight and 60 parts by weight of a bisphenol type epoxy compound (jER828 manufactured by Mitsubishi Chemical Corporation), 4,4′-bis [bis (( ⁇ -hydroxyethoxy) phenyl) sulfonio] phenyl sulfide-bis-hexa as a photocationic polymerization initiator
- a resin composition consisting of 1 part by weight of fluoroantimonate) (ADEKA OPTMER SP-170 manufactured by ADEKA Corporation) was impregnated in vacuum for 2 hours and defoamed.
- the physical properties were measured by the following methods.
- A Total light transmittance, haze Based on JIS-K-7361, the total light transmittance of the composite material was measured using a haze meter NDH: 2000 (manufactured by Nippon Denshoku Industries Co., Ltd.).
- B Average linear expansion coefficient (CTE) Using a TMA / S S 120 C type thermal stress strain measuring device manufactured by Seiko Instruments Inc., the temperature is raised from 30 ° C. to 230 ° C. at a rate of 5 ° C. per minute and held for 20 minutes. Thereafter, the average linear expansion coefficient was determined by measuring the value when cooled to 230 ° C. to 30 ° C. at a rate of 5 ° C. per minute. The measurement was performed in a tensile mode with a load of 5 g.
- a resin produced from an epoxy compound-containing resin composition and an epoxy compound-containing resin composition capable of obtaining a cured resin, a transparent composite, a display element substrate, and a surface light source substrate with low energy.
- a cured product, a transparent composite, a display element substrate, and a surface light source substrate can be obtained. Therefore, the present invention can be suitably used for “a resin composition, a cured resin, a transparent composite, a display element substrate, and a surface light source substrate”, and is extremely important industrially.
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Description
本発明は、樹脂組成物、樹脂硬化物、透明複合体、表示素子用基板および面光源用基板に関するものである。
本願は、2012年10月1日に日本に出願された特願2012-219174号に基づき優先権を主張し、その内容をここに援用する。
The present invention relates to a resin composition, a cured resin, a transparent composite, a display element substrate, and a surface light source substrate.
This application claims priority based on Japanese Patent Application No. 2012-219174 for which it applied to Japan on October 1, 2012, and uses the content here.
エポキシ化合物は、耐熱性、成形性、透明性等の観点から広く工業用途、電子材料用途、光学用途等に使用されている。 Epoxy compounds are widely used in industrial applications, electronic material applications, optical applications and the like from the viewpoints of heat resistance, moldability, transparency, and the like.
例えば、特許文献1、2では、エポキシ化合物をアミン触媒、イミダゾールで硬化させてなる樹脂硬化物が記載されている。
For example,
しかし、これらはいずれも熱による硬化を伴うものである。一般的に、熱エネルギーは拡散しやすく、エネルギー損失が多い。また、熱エネルギーで反応を開始する系では常温でのポットライフが短くなる傾向にある。そのため、エネルギーを集中的に与えることが可能であり、かつ常温でのポットライフが長い光エネルギー硬化系の樹脂組成物が望まれる。 However, all of these involve curing by heat. Generally, thermal energy is easy to diffuse and there is a lot of energy loss. Further, in a system in which a reaction is initiated by thermal energy, the pot life at normal temperature tends to be shortened. Therefore, a light energy curable resin composition that can give energy intensively and has a long pot life at room temperature is desired.
一方、エポキシ化合物の重合開始剤としては、カチオン重合開始剤がある。これは、紫外線等の光エネルギーによって反応を開始させる光カチオン重合開始剤、熱によって反応を開始させる熱カチオン重合開始剤があり、特に光カチオン重合開始剤を使用して光エネルギーを与えることにより反応を開始させる系では、エネルギーを集中的に与えることが可能である。
しかし、一般的にカチオン重合開始剤では、グリシジル型エポキシ化合物の重合反応は進まず、また、一般的な脂環式エポキシ化合物は重合反応するものの、その反応性は低い。
On the other hand, as a polymerization initiator of an epoxy compound, there is a cationic polymerization initiator. This is a photocation polymerization initiator that initiates the reaction by light energy such as ultraviolet light, and a thermal cationic polymerization initiator that initiates the reaction by heat. In particular, it reacts by applying light energy using a photocation polymerization initiator. In a system that starts the process, it is possible to concentrate energy.
However, in general, the polymerization reaction of a glycidyl type epoxy compound does not proceed with a cationic polymerization initiator, and a general alicyclic epoxy compound undergoes a polymerization reaction, but its reactivity is low.
特許文献1:特開2012―116979
特許文献2:特開2012―158719
Patent Document 1: Japanese Patent Application Laid-Open No. 2012-116979
Patent Document 2: JP 2012-158719 A
本発明の目的は、低エネルギーで樹脂硬化物、透明複合体、表示素子用基板および面光源用基板を得ることができる、エポキシ化合物含有樹脂組成物およびエポキシ化合物含有樹脂組成物から作製される樹脂硬化物、透明複合体、表示素子用基板および面光源用基板を提供することにある。 An object of the present invention is an epoxy compound-containing resin composition and an epoxy compound-containing resin composition that can obtain a cured resin, a transparent composite, a display element substrate, and a surface light source substrate with low energy. The object is to provide a cured product, a transparent composite, a display element substrate, and a surface light source substrate.
このような目的は、下記[1]~[6]に記載の本発明により達成される。
[1]エポキシ化合物(1)と光カチオン重合開始剤と反応促進剤とを有する樹脂組成物であって、前記エポキシ化合物(1)が、下記(1A)及び/または下記(1B)で示されるものであり、
前記反応促進剤が、下記(2)で表わされる脂環式エポキシ化合物(2)であり、
前記(1)と(2)の割合が、(1):(2)=60:40~99:1であることを特徴とする樹脂組成物。
Such an object is achieved by the present invention described in the following [1] to [6].
[1] A resin composition having an epoxy compound (1), a cationic photopolymerization initiator, and a reaction accelerator, wherein the epoxy compound (1) is represented by the following (1A) and / or (1B) Is,
The reaction accelerator is an alicyclic epoxy compound (2) represented by the following (2):
A ratio of (1) and (2) is (1) :( 2) = 60: 40 to 99: 1.
[2]前記樹脂組成物が、積算光量50~3000mJ/cm2の光照射により硬化するものである
上記[1]に記載の樹脂組成物。
[3]前記エポキシ化合物(1)がビスフェノール型グリシジルエポキシ化合物、二以上の脂環式エポキシ構造を有する脂環式エポキシ化合物のいずれか1つ以上である上記[1]または[2]に記載の樹脂組成物。
[4]上記[1]ないし[3]いずれかに記載の樹脂組成物に光照射することで作製される、樹脂硬化物。
[5]上記[1]ないし[3]いずれかに記載の樹脂組成物と、ガラスフィラーを複合させ、光照射することで作製される、透明複合体。
[6]ガラスフィラーは、ガラスクロス、ガラス不織布のいずれかである、上記[5]に記載の透明複合体。
[7]全光線透過率が80%以上である、上記[5]または[6]に記載の透明複合体。
[8]上記[4]または[5]に記載の樹脂硬化物または透明複合体を使用した、表示素子用基板。
[9]上記[4]または[5]に記載の樹脂硬化物または透明複合体を使用した、面光源用基板。
[2] The resin composition according to the above [1], wherein the resin composition is cured by light irradiation with an integrated light amount of 50 to 3000 mJ / cm 2 .
[3] The above-mentioned [1] or [2], wherein the epoxy compound (1) is at least one of a bisphenol-type glycidyl epoxy compound and an alicyclic epoxy compound having two or more alicyclic epoxy structures. Resin composition.
[4] A cured resin product produced by irradiating the resin composition according to any one of [1] to [3] with light.
[5] A transparent composite produced by combining the resin composition according to any one of [1] to [3] above and a glass filler and irradiating with light.
[6] The transparent composite according to [5], wherein the glass filler is one of glass cloth and glass nonwoven fabric.
[7] The transparent composite according to [5] or [6], wherein the total light transmittance is 80% or more.
[8] A display element substrate using the cured resin or transparent composite according to the above [4] or [5].
[9] A surface light source substrate using the cured resin or transparent composite according to the above [4] or [5].
本発明によれば、低エネルギーで硬化物を得ることができる。また、一般的にカチオン重合開始剤による硬化は、水酸基が少なくなるため、硬化物の吸水率を低減させることが可能となる。 According to the present invention, a cured product can be obtained with low energy. In general, curing with a cationic polymerization initiator reduces the water absorption of the cured product because the number of hydroxyl groups decreases.
(樹脂組成物)
本発明の樹脂組成物はエポキシ化合物(1)、光カチオン重合開始剤および脂環式エポキシ化合物(2)である反応促進剤を有するものである。以下各成分について説明する。
(エポキシ化合物(1))
本発明で使用されるエポキシ化合物(1)のうち(1A)は、エポキシシクロヘキサン環を有する脂環式エポキシ化合物(ただし、(2)で示す構造のものは除く)である。(1A)で表される脂環式エポキシ化合物は、光カチオン重合開始剤により反応が開始および進行するが、(2)で示した脂環式エポキシ化合物と比較した場合、その反応性は低い。しかし、(1A)で表される脂環式エポキシ化合物と(2)で示す構造の脂環式エポキシ化合物との混合物は、(1A)単独と比較して反応性が飛躍的に向上し、低エネルギーで光カチオン重合開始剤による反応を進行させることができる。なお、エポキシ化合物(1A)は、(2)と比較して可とう性が高いため、(1A)と(2)の共重合体には(2)単独の重合体と比較して柔軟性を付与することが出来る。
(Resin composition)
The resin composition of this invention has the reaction accelerator which is an epoxy compound (1), a photocationic polymerization initiator, and an alicyclic epoxy compound (2). Each component will be described below.
(Epoxy compound (1))
Of the epoxy compound (1) used in the present invention, (1A) is an alicyclic epoxy compound having an epoxycyclohexane ring (however, the one having the structure shown in (2) is excluded). The reaction of the alicyclic epoxy compound represented by (1A) is initiated and proceeds by the photocationic polymerization initiator, but its reactivity is low when compared with the alicyclic epoxy compound shown in (2). However, the mixture of the alicyclic epoxy compound represented by (1A) and the alicyclic epoxy compound having the structure represented by (2) has a significantly improved reactivity compared to (1A) alone, The reaction by the photocationic polymerization initiator can proceed with energy. In addition, since the epoxy compound (1A) is highly flexible compared to (2), the copolymer of (1A) and (2) is more flexible than (2) a single polymer. Can be granted.
また、(1A)で示されるエポキシ化合物としては、例えば、脂環式エポキシおよびカルボニル基を含む脂環式カルボニル型エポキシ化合物、脂環式エポキシおよびエステル結合を含む脂環式エステル型エポキシ化合物、脂環式エポキシおよびカーボネート基を含む脂環式カーボネート型エポキシ化合物等が挙げられる。
このうち、硬化後の硬化物に耐熱性を付与するため、二以上の脂環式エポキシ構造を有する脂環式エポキシ化合物が望ましく、特にその脂環式エポキシ構造がエポキシシクロヘキサン環であることが好ましい。更に、そのエポキシシクロヘキサンのエポキシ基がシクロヘキサンの隣接する炭素間で形成されていることがより好ましい。また、エポキシシクロヘキサンへの結合は、エポキシ基を形成する炭素と隣接しない炭素を介して行われている構造が好ましい。具体的には、以下ような構造の化合物が挙げられる。
Examples of the epoxy compound represented by (1A) include, for example, an alicyclic epoxy and an alicyclic carbonyl type epoxy compound containing a carbonyl group, an alicyclic epoxy and an alicyclic ester type epoxy compound containing an ester bond, Examples include alicyclic carbonate type epoxy compounds containing cyclic epoxy and carbonate groups.
Among these, in order to impart heat resistance to the cured product after curing, an alicyclic epoxy compound having two or more alicyclic epoxy structures is desirable, and the alicyclic epoxy structure is particularly preferably an epoxycyclohexane ring. . Furthermore, it is more preferable that the epoxy group of the epoxycyclohexane is formed between adjacent carbons of cyclohexane. The bond to the epoxycyclohexane is preferably a structure that is carried out through carbon that is not adjacent to the carbon that forms the epoxy group. Specific examples include compounds having the following structure.
また、本発明で使用されるエポキシ化合物(1)のうち(1B)は、グリシジル型エポキシを有するエポキシ化合物であり、下記構造式で示される。(1B)で表されるグリシジル型エポキシ化合物は、一般的には光カチオン重合開始剤により反応が開始および進行しない。しかし、(1B)で表されるグリシジル型エポキシ化合物と(2)で示す構造の脂環式エポキシ化合物との混合物は、(1B)単独と比較して反応性が飛躍的に向上し、低エネルギーで光カチオン重合開始剤による反応を進行させることができる。なお、エポキシ化合物(1B)は、(2)と比較して可とう性が高いため、(1B)と(2)の共重合体には(2)単独の重合体と比較して柔軟性を付与することが出来る。 Moreover, (1B) is an epoxy compound which has a glycidyl type epoxy among the epoxy compounds (1) used by this invention, and is shown by the following structural formula. The reaction of the glycidyl type epoxy compound represented by (1B) generally does not start and proceed with the photocationic polymerization initiator. However, the mixture of the glycidyl-type epoxy compound represented by (1B) and the alicyclic epoxy compound having the structure represented by (2) has dramatically improved reactivity compared to (1B) alone, and has low energy. The reaction by the photocationic polymerization initiator can be advanced. In addition, since the epoxy compound (1B) is highly flexible as compared with (2), the copolymer of (1B) and (2) is more flexible than (2) a single polymer. Can be granted.
(1B)で示されるエポキシ化合物としては、例えば、グリシジル基およびエーテル結合を含むグリシジルエーテル型エポキシ化合物、グリシジル基およびエステル結合を含むグリシジルエステル型エポキシ化合物、グリシジル基およびアミノ基を含むグリシジルアミン型エポキシ化合物等が挙げられる。このうち、グリシジルエーテル型エポキシ化合物としては、例えば、ビスフェノールA型、ビスフェノールF型、水添ビスフェノールA型、ビフェニル型、フェノールノボラック型、ビスフェノールAノボラック型、フルオレン骨格を有するグリシジル型等のタイプの化合物が用いられる。
このうち、硬化後の硬化物に耐熱性等を付与するため、二以上のエポキシ構造を有することが好ましく、さらに、ベンゼン環を有するグリシジル型エポキシ化合物であることがより好ましい。
(1B)で示されるエポキシ化合物が、二以上のグリシジル型エポキシ構造を有し、且つベンゼン環を有するグリシジル型エポキシ化合物である場合、硬化物の耐熱性等が得られることに加え、ベンゼン環の高屈折率性により、(2)単独からなる樹脂硬化物と比較して屈折率を調整した硬化物の作製が可能となり、特に表示体用途等の光学用途に好適に使用される。また、樹脂硬化物の高屈折率化により、屈折率が高いガラスフィラーを組み合わせて使用することが可能となる。
Examples of the epoxy compound represented by (1B) include a glycidyl ether type epoxy compound containing a glycidyl group and an ether bond, a glycidyl ester type epoxy compound containing a glycidyl group and an ester bond, and a glycidyl amine type epoxy containing a glycidyl group and an amino group. Compounds and the like. Among these, as the glycidyl ether type epoxy compound, for example, bisphenol A type, bisphenol F type, hydrogenated bisphenol A type, biphenyl type, phenol novolac type, bisphenol A novolak type, glycidyl type having a fluorene skeleton, etc. Is used.
Among these, in order to give heat resistance etc. to the hardened | cured material after hardening, it is preferable to have two or more epoxy structures, and it is more preferable that it is a glycidyl type epoxy compound which has a benzene ring.
When the epoxy compound represented by (1B) is a glycidyl type epoxy compound having two or more glycidyl type epoxy structures and having a benzene ring, in addition to obtaining heat resistance of the cured product, Due to the high refractive index property, it becomes possible to produce a cured product having an adjusted refractive index as compared with (2) a cured resin product consisting of a single resin, and it is particularly suitable for optical applications such as display applications. Moreover, it becomes possible to use a glass filler with a high refractive index in combination by increasing the refractive index of the cured resin.
(脂環式エポキシ化合物(2))
本発明に用いられる脂環式エポキシ化合物(2)としては、下記(2)で表わされる前記脂環式エポキシ化合物が用いられる。
(Alicyclic epoxy compound (2))
As the alicyclic epoxy compound (2) used in the present invention, the alicyclic epoxy compound represented by the following (2) is used.
(2)で示される脂環式エポキシ化合物は、単独でも光カチオン重合開始剤との反応性に優れるが、他の構造のエポキシ化合物と組み合わせた混合物も同様に光カチオン重合開始剤との反応性に優れる。
すなわち、(2)の構造の脂環式エポキシ化合物は、他の構造のエポキシ化合物の反応を促進する作用があると考えられる。
(2)で示す構造の脂環式エポキシ化合物については、Xが-CH(CH3)-、-C(CH3)2-または単結合であることが特に好ましい。
The alicyclic epoxy compound represented by (2) is excellent in reactivity with the photocationic polymerization initiator alone, but a mixture in combination with an epoxy compound having another structure is also reactive with the photocationic polymerization initiator. Excellent.
That is, the alicyclic epoxy compound having the structure (2) is considered to have an action of promoting the reaction of the epoxy compound having another structure.
In the alicyclic epoxy compound having the structure represented by (2), it is particularly preferable that X is —CH (CH 3 ) —, —C (CH 3 ) 2 — or a single bond.
(1)と(2)の組合せは、特に限定されないが、例えば(1A)が3’、4’-エポキシシクロヘキシルメチル-3、4-エポキシシクロヘキサンカルボキシレート(株式ダイセル製品名:「セロキサイド2021p」)、「セロキサイド2081」、「エポリードGT401」、「エポリードPB4700」(以上、株式会社ダイセル製品名)であるとき、または、(1B)がグリシジル基およびエーテル結合を含むグリシジルエーテル型エポキシ化合物、グリシジル基およびエステル結合を含むグリシジルエステル型エポキシ化合物、グリシジル基およびアミノ基を含むグリシジルアミン型エポキシ化合物等であり、特にグリシジルエーテル型エポキシ化合物としては、例えば、ビスフェノールA型、ビスフェノールF型、水添ビスフェノールA型、ビフェニル型、フェノールノボラック型、ビスフェノールAノボラック型、フルオレン骨格を有するグリシジル型等のタイプの化合物であるとき、(2)が(3、3’、4、4’-ジエポキシ)ビシクロヘキシルまたは2,2’ -ビス(3,4’-エポキシシクロヘキシル)プロパンであることが好ましく、(1A)が3’、4’-エポキシシクロヘキシルメチル-3、4-エポキシシクロヘキサンカルボキシレートであるとき、または、(1B)がビスフェノールA型、ビスフェノールF型、ビフェニル型、フェノールノボラック型、フルオレン骨格を有するグリシジル型のグリシジルエーテルエポキシ化合物であるとき、(2)が(3、3’、4、4’-ジエポキシ)ビシクロヘキシルであることがより好ましい。
これにより、前記記載の可とう性向上、高屈折率化、耐熱性および透明性等の特性の両立を図ることが容易となる。
The combination of (1) and (2) is not particularly limited. For example, (1A) is 3 ′, 4′-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate (product name of Daicel Corporation: “Celoxide 2021p”) , “Celoxide 2081”, “Epolide GT401”, “Epolide PB4700” (hereinafter, Daicel product name), or (1B) a glycidyl ether type epoxy compound containing a glycidyl group and an ether bond, a glycidyl group and Examples include glycidyl ester type epoxy compounds containing an ester bond, glycidyl amine type epoxy compounds containing a glycidyl group and an amino group, and particularly glycidyl ether type epoxy compounds such as bisphenol A type, bisphenol F type, hydrogenated bisphenol. (2) is (3,3 ′, 4,4′-diepoxy) bi, when it is a compound of a type such as diol A type, biphenyl type, phenol novolak type, bisphenol A novolak type, glycidyl type having a fluorene skeleton. Preferred is cyclohexyl or 2,2′-bis (3,4′-epoxycyclohexyl) propane, and when (1A) is 3 ′, 4′-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, Alternatively, when (1B) is a glycidyl ether-epoxy compound having a bisphenol A type, bisphenol F type, biphenyl type, phenol novolac type, or fluorene skeleton, (2) is (3, 3 ′, 4, 4 ′) More preferred is -diepoxy) bicyclohexyl.
Thereby, it becomes easy to aim at coexistence of characteristics, such as the above-mentioned flexibility improvement, high refractive index, heat resistance, and transparency.
(1)と(2)の重量比は、(1):(2)=60:40~99:1である。これにより、工業用途、電子材料用途、光学用途で要求される可とう性向上、また特に光学用途においては屈折率の調整幅を広げることが可能となる。
(1)と(2)の重量比は、(1):(2)=60:40~99:1の範囲内であれば特に限定されないが、(1):(2)=65:35~99:1であることが好ましく、(1):(2)=70:30~90:10であることがより好ましい。
(1)と(2)の重量比が前記範囲内にあることにより、カチオン重合開始剤による反応が進行しにくい(1)のエポキシ化合物を効率的に反応させることが可能となり、ひいては低積算光量による重合が可能となる。さらに、(1)の特性により、前記と同様に可とう性の向上および/又は屈折率の調整幅を広げることが可能となる。
The weight ratio of (1) and (2) is (1) :( 2) = 60: 40 to 99: 1. This makes it possible to improve the flexibility required for industrial applications, electronic material applications, and optical applications, and in particular, in optical applications, it is possible to widen the adjustment range of the refractive index.
The weight ratio of (1) to (2) is not particularly limited as long as it is within the range of (1) :( 2) = 60: 40 to 99: 1, but (1) :( 2) = 65: 35 to 99: 1 is preferable, and (1) :( 2) = 70: 30 to 90:10 is more preferable.
When the weight ratio of (1) and (2) is within the above range, it is possible to efficiently react the epoxy compound of (1) in which the reaction by the cationic polymerization initiator is difficult to proceed. Polymerization with can be performed. Furthermore, the characteristic (1) makes it possible to improve flexibility and / or widen the adjustment range of the refractive index in the same manner as described above.
(光カチオン重合開始剤)
本発明の樹脂組成物は、重合開始剤として光カチオン重合開始剤を含んでいる。かかる光カチオン重合開始剤はエポキシシクロヘキサン構造のエポキシ化合物と良好に反応し、特に(2)で示した脂環式エポキシ化合物との反応性が極めて高いため、本発明の樹脂組成物は集中的に光エネルギーを与えるプロセスに適しており、またポットライフも長くなる。
(Photocationic polymerization initiator)
The resin composition of the present invention contains a photocationic polymerization initiator as a polymerization initiator. Such a cationic photopolymerization initiator reacts well with an epoxy compound having an epoxycyclohexane structure, and particularly has high reactivity with the alicyclic epoxy compound shown in (2), so that the resin composition of the present invention is concentrated. It is suitable for the process of applying light energy, and the pot life is extended.
光カチオン重合開始剤としては、例えば、ルイス酸のジアゾニウム塩、ルイス酸のヨードニウム塩、ルイス酸のスルホニウム塩等のオニウム塩が挙げられる。光カチオン重合開始剤の具体例としては、四フッ化ホウ素のフェニルジアゾニウム塩、六フッ化リンのジフェニルヨードニウム塩、六フッ化アンチモンのジフェニルヨードニウム塩、六フッ化ヒ素のトリ-4-メチルフェニルスルホニウム塩、四フッ化アンチモンのトリ-4-メチルフェニルスルホニウム塩、およびこれらの混合物等が挙げられる。具体的にはアデカ製のアデカオプトマーSP-150、アデカオプトマーSP-170、日本化薬製のカヤラッドPCI-220、カヤラッドPCI-620、ユニオンカーバイド製のUVI-6990、日本曹達製のCIT-1370、CIT-1682、CIP-1866S、CIP-2048S、CIP-2064S、みどり化学製のDPI-101、 DPI-102、DPI-103、DPI-105、MPI-103、MPI-105、BBI-101、BBI-102、BBI-103、BBI-105、 TPS-101、TPS-102、TPS-103、TPS-105、MDS-103、MDS-105、DTS-102、DTS-103等が挙げられる。 Examples of the cationic photopolymerization initiator include onium salts such as a diazonium salt of Lewis acid, an iodonium salt of Lewis acid, and a sulfonium salt of Lewis acid. Specific examples of the cationic photopolymerization initiator include boron tetrafluoride phenyldiazonium salt, phosphorus hexafluoride diphenyliodonium salt, antimony hexafluoride diphenyliodonium salt, arsenic hexafluoride tri-4-methylphenylsulfonium Salts, tri-4-methylphenylsulfonium salt of antimony tetrafluoride, and mixtures thereof. Specifically, Adekaoptomer SP-150, Adekaoptomer SP-170 manufactured by Adeka, Kayrad PCI-220, Kayalad PCI-620 manufactured by Nippon Kayaku, UVI-6990 manufactured by Union Carbide, CIT- manufactured by Nippon Soda 1370, CIT-1682, CIP-1866S, CIP-2048S, CIP-2064S, DPI-101 manufactured by Midori Chemical, DPI-102, DPI-103, DPI-105, MPI-103, MPI-105, BBI-101, BBI-102, BBI-103, BBI-105, TPS-101, TPS-102, TPS-103, TPS-105, MDS-103, MDS-105, DTS-102, DTS-103, and the like.
本発明の樹脂組成物は、低エネルギーで硬化するものであり、樹脂組成物に照射する光の積算光量を少なくしても硬化させることができる。
本発明の樹脂組成物を硬化させるために、必要な光の積算光量としては、例えば、50~5000mJ/cm2であることが好ましく、100~4000mJ/cm2であることがより好ましく、150~3000mJ/cm2であることがより一層好ましい。
ここで、積算光量を計測するための光とは、紫外線であり、積算光量は、365nmの波長の積算光量をいう。
また、「硬化する」とは、樹脂組成物において、硬化反応に関与し得る官能基の多くが反応していることをいい、具体的には、樹脂組成物のエポキシ開環率が50%以上であることをいう。樹脂組成物が硬化したものを樹脂硬化物という。
The resin composition of the present invention is cured with low energy, and can be cured even if the cumulative amount of light irradiated to the resin composition is reduced.
In order to cure the resin composition of the present invention, the integrated light quantity of necessary light, for example, preferably from 50 ~ 5000mJ / cm 2, more preferably 100 ~ 4000mJ / cm 2, 150 ~ Even more preferably, it is 3000 mJ / cm 2 .
Here, the light for measuring the integrated light amount is ultraviolet light, and the integrated light amount is an integrated light amount having a wavelength of 365 nm.
Further, “curing” means that many functional groups that can participate in the curing reaction are reacted in the resin composition. Specifically, the epoxy ring opening rate of the resin composition is 50% or more. It means that. What hardened | cured the resin composition is called resin cured material.
エポキシ開環率とは、樹脂組成物におけるエポキシ基の開環割合に相当する指標である。
エポキシ開環率の測定方法としては、まず、フーリエ変換赤外分光分析(FT-IR)により、硬化反応後の樹脂組成物の試料の吸光度スペクトルを取得する。
次いで、得られた吸光度スペクトルについて、波数914cm-1付近に位置するエポキシ基由来のピークの面積を、波数2900cm-1付近に位置するメチレン基由来のピークの面積で標準化し、これを試料の「エポキシ相対強度」とする。ここでは、メチレン基由来のピーク面積に対するエポキシ基由来のピーク面積の割合を試料のエポキシ相対強度Xとし、求めるべき試料のエポキシ開環率をY(%)とする。
The epoxy ring opening rate is an index corresponding to the ring opening rate of epoxy groups in the resin composition.
As a method for measuring the epoxy ring-opening rate, first, an absorbance spectrum of a sample of the resin composition after the curing reaction is obtained by Fourier transform infrared spectroscopy (FT-IR).
Next, with respect to the obtained absorbance spectrum, the area of the peak derived from the epoxy group located near the wave number of 914 cm −1 was standardized by the area of the peak derived from the methylene group located near the wave number of 2900 cm −1. "Epoxy relative strength". Here, the ratio of the peak area derived from the epoxy group to the peak area derived from the methylene group is defined as the epoxy relative strength X of the sample, and the epoxy ring opening rate of the sample to be obtained is defined as Y (%).
試料のエポキシ開環率を算出するには、あらかじめ硬化前の樹脂組成物のエポキシ相対強度を測定しておく。硬化前の樹脂組成物ではエポキシ基が開環していないと推定されるので、これを標準試料とすることができる。硬化前の樹脂組成物のエポキシ相対強度は、エポキシ開環率0%に対応する強度であるとみなすことができる。試料のエポキシ開環率Y(%)は、試料のエポキシ相対強度Xを硬化前の樹脂組成物のエポキシ相対強度で割った値に100を掛けた値として算出される。 In order to calculate the epoxy ring opening rate of the sample, the epoxy relative strength of the resin composition before curing is measured in advance. Since it is presumed that the epoxy group is not ring-opened in the resin composition before curing, this can be used as a standard sample. The epoxy relative strength of the resin composition before curing can be regarded as a strength corresponding to an epoxy ring-opening rate of 0%. The epoxy ring-opening rate Y (%) of the sample is calculated as a value obtained by multiplying 100 by the value obtained by dividing the epoxy relative strength X of the sample by the epoxy relative strength of the resin composition before curing. *
(樹脂硬化物、透明複合体および面光源用基板)
本発明の樹脂硬化物は、以上のような各成分を含む樹脂組成物を必要に応じて各種フィラーと混合するとともに所望の形状に成形し、熱エネルギーおよび/または光エネルギーを付与することで硬化させてなるものである。また、本発明の透明複合体は、以上のような各成分を含む樹脂組成物に各種フィラーを混合するとともに板状に成形し、樹脂組成物を硬化させたものである。本発明の面光源用基板は、フィラーであるガラス繊維に以上のような各成分を混合した樹脂組成物を含浸させ、この状態で板状に成形(整形)された後、樹脂組成物を硬化させたものである。
(Hardened resin, transparent composite and substrate for surface light source)
The resin cured product of the present invention is cured by mixing a resin composition containing each of the above components with various fillers as necessary and forming it into a desired shape, and applying heat energy and / or light energy. It is something to be made. In addition, the transparent composite of the present invention is obtained by mixing various fillers with the resin composition containing the above components and molding the resin composition into a plate shape and curing the resin composition. The substrate for a surface light source of the present invention is impregnated with a resin composition in which the above-mentioned components are mixed into glass fiber as a filler, and after being molded (shaped) into a plate shape in this state, the resin composition is cured. It has been made.
本発明の樹脂硬化物、透明複合体および面光源用基板は、前述の通りカチオン重合開始剤による硬化により水酸基が少なくなるため、吸水率を比較的低く抑えることができる。
本発明の樹脂硬化物、透明複合体および面光源用基板の吸水率は特に限定されないが、例えば、0~5%であることが好ましく、0~3%であることがより好ましい。なお、ここでいう吸水率は、JISK6911に則り、樹脂硬化物、透明複合体および/または面光源用基板を50℃/24時間乾燥後、23℃の純水に24時間浸漬した後の吸水率をいう。
本発明の樹脂硬化物、透明複合体および面光源用基板の吸水率が前記範囲内であることにより、吸水膨張を抑制でき、特に寸法精度を要求される工業用途、電子材料用途、光学用途に適している。
以下、フィラーについて説明する。
Since the cured resin, the transparent composite, and the surface light source substrate of the present invention have a reduced number of hydroxyl groups by curing with a cationic polymerization initiator as described above, the water absorption rate can be kept relatively low.
The water absorption rate of the cured resin, the transparent composite, and the surface light source substrate of the present invention is not particularly limited, but is preferably 0 to 5%, and more preferably 0 to 3%. In addition, the water absorption here refers to the water absorption after the resin cured product, transparent composite and / or surface light source substrate is dried at 50 ° C./24 hours and then immersed in pure water at 23 ° C. for 24 hours. Say.
When the water absorption rate of the cured resin, transparent composite and surface light source substrate of the present invention is within the above range, it is possible to suppress water absorption expansion, especially for industrial use, electronic material use and optical use that require dimensional accuracy. Is suitable.
Hereinafter, the filler will be described.
(フィラー)
本発明の樹脂硬化物、透明複合体および面光源用基板は、必要に応じて各種フィラーを含んでいてもよく、この場合、ガラスフィラーを含んでいるのが好ましい。ガラスフィラーは、無機系ガラス材料からなる繊維または粒子等で構成されたフィラー(充填材)である。
(Filler)
The cured resin, the transparent composite, and the surface light source substrate of the present invention may contain various fillers as necessary, and in this case, it is preferable to contain a glass filler. The glass filler is a filler (filler) composed of fibers or particles made of an inorganic glass material.
ガラスフィラーとしては、例えば、ガラスクロスやガラス不織布等のガラス繊維布を含むガラス繊維、ガラスチョップドストランド、ガラスビーズ、ガラスフレーク、ガラスパウダー、ミルドガラス等が挙げられる。透明複合体および面光源用基板では線膨張係数の低減効果が高いことから、ガラス繊維が好ましく用いられ、ガラス繊維布がより好ましく用いられる。図1はガラス繊維2がガラスクロスである場合の面光源用基板100を図示している。図1に示すガラス繊維2は、縦方向ガラスヤーン(経糸)2aおよび横方向ガラスヤーン(緯糸)2bで構成されており、縦方向ガラスヤーン2aと横方向ガラスヤーン2bとはほぼ直交している。ガラス繊維2の織組織としては、図1に示す平織りの他、ななこ織り、朱子織り、綾織り等が挙げられる。平織りとは、経糸と緯糸とを交互に交差させて織った織組織である。ななこ織りとは、複数本ずつ揃えた経糸と複数本ずつ揃えた緯糸とを交互に交差させて織った織組織である。朱子織りとは、経糸又は緯糸のうち一方を長く表面に出すように織った織組織である。綾織りとは、経糸または緯糸のうきが斜めに続く織組織である。
Examples of the glass filler include glass fiber including glass fiber cloth such as glass cloth and glass nonwoven fabric, glass chopped strands, glass beads, glass flakes, glass powder, and milled glass. In the transparent composite and the surface light source substrate, since the effect of reducing the linear expansion coefficient is high, glass fiber is preferably used, and glass fiber cloth is more preferably used. FIG. 1 illustrates a surface
無機系ガラス材料としては、例えば、Eガラス、Cガラス、Aガラス、Sガラス、Tガラス、Dガラス、NEガラス、クオーツ、低誘電率ガラス、高誘電率ガラス等が挙げられ、中でもアルカリ金属などのイオン性不純物が少なく入手の容易なEガラス、Sガラス、Tガラス、NEガラスが好ましく用いられる。特に線膨張の低い基板が得られる点からは30℃から250℃における平均線膨張係数が5ppm/K以下であるSガラスまたはTガラスがより好ましく用いられ、また、入手容易および低価格である点からはEガラスがより好ましく用いられる。 Examples of the inorganic glass material include E glass, C glass, A glass, S glass, T glass, D glass, NE glass, quartz, low dielectric constant glass, and high dielectric constant glass. E glass, S glass, T glass, and NE glass, which are easy to obtain with few ionic impurities, are preferably used. In particular, from the viewpoint of obtaining a substrate having a low linear expansion, S glass or T glass having an average linear expansion coefficient of 5 ppm / K or less at 30 ° C. to 250 ° C. is more preferably used, and is easily available and inexpensive. From E, glass E is more preferably used.
ガラスフィラーの含有量は、樹脂硬化物、透明複合体および面光源用基板中の樹脂硬化物に対し1~90質量%となる量であるのが好ましく、より好ましくは10~80質量%、さらに好ましくは30~70質量%となる量とされる。ガラスフィラーの含有量がこの範囲であれば、樹脂硬化物、透明複合体および面光源用基板の成形が容易で、樹脂組成物とガラスフィラーとの複合化による線膨張の低下効果が認められる。またガラスフィラー量が多ければ、単位体積あたりの樹脂量の均一性が向上し、応力の均一性が向上する。樹脂量および/又は応力の均一性が向上すると、樹脂硬化物、透明複合体および面光源用基板のうねりが小さくなる。 The content of the glass filler is preferably 1 to 90% by mass, more preferably 10 to 80% by mass, and more preferably 10 to 80% by mass with respect to the cured resin, the transparent composite, and the cured resin in the surface light source substrate. The amount is preferably 30 to 70% by mass. If the content of the glass filler is within this range, it is easy to mold the resin cured product, the transparent composite, and the substrate for the surface light source, and the effect of reducing the linear expansion due to the composite of the resin composition and the glass filler is recognized. Moreover, if there is much glass filler amount, the uniformity of the resin amount per unit volume will improve, and the uniformity of stress will improve. When the resin amount and / or stress uniformity is improved, the undulation of the cured resin, the transparent composite, and the surface light source substrate is reduced. *
また、ガラス繊維およびガラス繊維布を構成する繊維は、その直径が100nm以下であるのが好ましい。このような条件を満たすガラス繊維およびガラス繊維布は、これらの屈折率とエポキシ化合物の屈折率との差によらず、界面での散乱が生じ難いので、樹脂硬化物、透明複合体および面光源用基板の透明性が比較的高くなる。
また、面光源用基板においてはガラス繊維の平均径は2~15μm程度であるのがより好ましく、3~12μm程度であるのがさらに好ましく、3~10μm程度であるのが最も好ましい。これにより、機械的特性や光学的特性と表面の平滑性とを高度に両立し得る面光源用基板が得られる。なお、ガラス繊維の平均径は、面光源用基板の横断面を各種顕微鏡等で観察し、観察像から測定される100本分のガラス繊維の直径の平均値として求められる。
Moreover, it is preferable that the diameter which the fiber which comprises glass fiber and glass fiber cloth is 100 nm or less. Glass fibers and glass fiber fabrics that satisfy these conditions are less likely to scatter at the interface regardless of the difference between their refractive index and the refractive index of the epoxy compound, so that the cured resin, transparent composite, and surface light source The transparency of the substrate is relatively high.
In the surface light source substrate, the average diameter of the glass fibers is more preferably about 2 to 15 μm, further preferably about 3 to 12 μm, and most preferably about 3 to 10 μm. As a result, a surface light source substrate capable of achieving both high mechanical and optical characteristics and surface smoothness can be obtained. In addition, the average diameter of glass fiber is calculated | required as an average value of the diameter of 100 glass fibers measured from the observation image, observing the cross section of the board | substrate for surface light sources with various microscopes.
また、本発明の樹脂硬化物、透明複合体および面光源用基板は、その特性を損なわない範囲で必要に応じて、熱可塑性樹脂または熱硬化性樹脂のオリゴマーやモノマー、カップリング剤、紫外線吸収剤、染料、顔料、その他のフィラー等を含んでいてもよい。 In addition, the cured resin, transparent composite and surface light source substrate of the present invention are thermoplastic or thermosetting resin oligomers and monomers, coupling agents, ultraviolet absorbers, as necessary, as long as the characteristics are not impaired. Agents, dyes, pigments, other fillers, etc. may be included.
本発明の樹脂硬化物、透明複合体および面光源用基板は、樹脂材料中においてガラスフィラー以外にフィラー等を含むことにより、ヘイズ値をさらに高めることができ、さらに良好な樹脂硬化物、透明複合体および面光源用基板とすることが可能となる。
ガラスフィラー以外のフィラーを用いる場合、ガラスフィラー以外のフィラーと樹脂硬化物との屈折率差は、0.01以上3以下であることが好ましい。この屈折率差が0.01未満の場合は、光拡散性に対する効果が十分に発揮されないという問題が生じる可能性が高くなる。一方、屈折率差が3以上である材料は極めて少なく、選択性に欠ける。
The cured resin, the transparent composite and the surface light source substrate of the present invention can further increase the haze value by including a filler or the like in addition to the glass filler in the resin material. It becomes possible to make a substrate for a body and a surface light source.
When using a filler other than a glass filler, the refractive index difference between the filler other than the glass filler and the cured resin is preferably 0.01 or more and 3 or less. When this difference in refractive index is less than 0.01, there is a high possibility that a problem that the effect on light diffusibility is not sufficiently exhibited. On the other hand, there are very few materials having a difference in refractive index of 3 or more and lack selectivity.
ガラスフィラー以外のフィラーに使用する材質としては、例えば無機材料、それらの混合物が挙げられ、酸化亜鉛、酸化ジルコニウム、酸化アルミニウム、酸化カルシウム、酸化チタン、シリカ、またはこれらの混合物等が挙げられる。また、有機材料としては、アクリル、スチレン、またはこれらの混合物を使用したもの等が挙げられる。ガラスフィラー以外のフィラーの形状としては、球状、棒状、平面状、繊維状のものが挙げられる。 Examples of materials used for fillers other than glass fillers include inorganic materials and mixtures thereof, such as zinc oxide, zirconium oxide, aluminum oxide, calcium oxide, titanium oxide, silica, and mixtures thereof. Examples of the organic material include those using acrylic, styrene, or a mixture thereof. Examples of the shape of the filler other than the glass filler include a spherical shape, a rod shape, a planar shape, and a fibrous shape.
ガラスフィラー以外のフィラーの含有量は、ガラスフィラー100質量部に対して1~90質量部程度であるのが好ましく、3~70質量部程度であるのがより好ましい。
なお、ガラスフィラー以外のフィラーが粒子の場合、その換算粒径は0.1μm以上100μm以下であるのが好ましい。0.1μm以下及び100μm以上では拡散機能を十分に発揮できないという問題がある。また、フィラーが繊維状の場合、その繊維径は0.1μm以上100μm以下であるのが好ましい。0.1μm以下及び100μm以上では拡散機能を十分に発揮できないという問題がある。
The content of the filler other than the glass filler is preferably about 1 to 90 parts by mass and more preferably about 3 to 70 parts by mass with respect to 100 parts by mass of the glass filler.
In addition, when fillers other than a glass filler are particle | grains, it is preferable that the conversion particle size is 0.1 to 100 micrometer. When the thickness is 0.1 μm or less and 100 μm or more, there is a problem that the diffusion function cannot be sufficiently exhibited. When the filler is fibrous, the fiber diameter is preferably 0.1 μm or more and 100 μm or less. When the thickness is 0.1 μm or less and 100 μm or more, there is a problem that the diffusion function cannot be sufficiently exhibited.
(樹脂硬化物)
樹脂組成物の成形方法としては、例えば成形型に注型する方法が挙げられる。特に板状(シート状)に成形する場合には、樹脂組成物を溶剤に溶解し、グラビアコート、スピンコート、バーコート、ディップコート等の方法によりキャストする方法が挙げられる。また、ガラスフィラーとしてガラス繊維布を用いる場合には、樹脂組成物のうち、ガラスフィラー以外の成分をガラス繊維布の片面または両面から含浸させ、板状に成形された樹脂組成物とする方法が挙げられる。
(Cured resin)
Examples of the method for molding the resin composition include a method of casting into a mold. In particular, when forming into a plate shape (sheet shape), a method in which the resin composition is dissolved in a solvent and cast by a method such as gravure coating, spin coating, bar coating, dip coating or the like can be mentioned. Further, when a glass fiber cloth is used as the glass filler, a method of impregnating a component other than the glass filler from one or both sides of the glass fiber cloth to form a resin composition molded into a plate shape is used. Can be mentioned.
樹脂組成物の硬化は、樹脂組成物に光照射、つまり本発明では、紫外線、電子線等を照射することにより行う。 The curing of the resin composition is performed by irradiating the resin composition with light, that is, by irradiating with ultraviolet rays, electron beams, or the like in the present invention.
また、上記光照射による硬化後、2次処理として熱による処理を行うことにより、より反応を進行させることができる。 Further, after curing by the light irradiation, the reaction can be further advanced by performing a heat treatment as a secondary treatment.
2次処理時の処理温度は、150~300℃程度であるのが好ましく、200~280℃程度であるのがより好ましい。また、処理時間は、好ましくは0.1~5時間程度とされ、より好ましくは0.2~3時間程度とされる。これにより、効率的に反応を進行させることが出来る。 The treatment temperature during the secondary treatment is preferably about 150 to 300 ° C., more preferably about 200 to 280 ° C. The treatment time is preferably about 0.1 to 5 hours, more preferably about 0.2 to 3 hours. Thereby, reaction can be advanced efficiently.
なお、樹脂組成物を溶解する溶剤としては、例えば、メチルエチルケトン、アセトン、メチルイソブチルケトン、トルエン、キシレン、酢酸エチル等が挙げられる。 In addition, as a solvent which melt | dissolves a resin composition, methyl ethyl ketone, acetone, methyl isobutyl ketone, toluene, xylene, ethyl acetate etc. are mentioned, for example.
本発明の樹脂硬化物は、例えば、照明器具や自動車用ランプのようなランプカバー、メガネレンズ、カメラレンズのような光学レンズ、置物等に好ましく適用される。 The cured resin product of the present invention is preferably applied to, for example, lamp covers such as lighting fixtures and automobile lamps, optical lenses such as eyeglass lenses and camera lenses, and figurines.
(透明複合体)
また、本発明の透明複合体は、例えば、液晶表示素子用基板、有機EL素子用基板、カラーフィルター用基板、電子ペーパー用基板、太陽電池用基板、タッチパネル用基板のような各種透明基板等に好ましく適用される。
(Transparent composite)
Further, the transparent composite of the present invention can be applied to various transparent substrates such as substrates for liquid crystal display devices, substrates for organic EL devices, substrates for color filters, substrates for electronic paper, substrates for solar cells, substrates for touch panels, etc. Preferably applied.
透明複合体の平均厚さは、特に限定されないが、10~300μm程度であるのが好ましく、20~200μm程度であるのがより好ましい。 The average thickness of the transparent composite is not particularly limited, but is preferably about 10 to 300 μm, and more preferably about 20 to 200 μm.
(面光源用基板)
本発明の面光源用基板は、基板の少なくとも1方の表面に凹凸を有しており、当該凹凸が表面十点の平均粗さ(Rz)が1μm以上30μm以下で示される表面性状を有する基板である。
(Substrate for surface light source)
The substrate for a surface light source of the present invention has a surface texture on which at least one surface of the substrate has irregularities, and the irregularities have an average roughness (Rz) of 10 points on the surface of 1 μm to 30 μm. It is.
基板表面に凹凸を設ける方法は特に限定しないが、例えば、基板表面に粒子を固定化する方法、基板に粒子を混ぜ当該粒子を基板表面に近いところで分散させる方法、エンボス加工等を施したベース基板上で基板を成形し転写する方法、機械的に表面に凹凸を作製する方法等があげられる。 The method of providing irregularities on the substrate surface is not particularly limited. For example, a method of fixing particles on the substrate surface, a method of mixing particles in a substrate and dispersing the particles near the substrate surface, a base substrate subjected to embossing, etc. Examples thereof include a method for forming and transferring a substrate, and a method for mechanically forming irregularities on the surface.
本発明における基板表面に凹凸を設ける方法について以下に説明する。
まず、基板表面に粒子を固定化する方法について説明する。
基板表面に凹凸を設ける方法で最も簡便で単純な方法は、基板表面に粒子を固定化することである。例えば、フィラーを溶媒に分散させて、基板表面に塗布、乾燥させて基板表面にフィラーを固定する方法、基板表面にフィラーを塗布した後、プレスして固定する方法、基板表面に接着層を設けてフィラーを固定する方法などが挙げられる。図2は樹脂1とガラス繊維2とを含む複合層上にフィラー4を固定した面光源用基板100の断面図である。
A method for providing irregularities on the substrate surface in the present invention will be described below.
First, a method for immobilizing particles on the substrate surface will be described.
The simplest and simplest method for providing irregularities on the substrate surface is to immobilize particles on the substrate surface. For example, a method in which a filler is dispersed in a solvent, applied to the substrate surface and dried to fix the filler on the substrate surface, a method in which the filler is applied to the substrate surface and then pressed and fixed, and an adhesive layer is provided on the substrate surface And a method of fixing the filler. FIG. 2 is a cross-sectional view of a surface
次に、基板に粒子を混ぜ当該粒子を基板表面近傍で分散させる方法について説明する。
樹脂基板を作製する際に、硬化させる前の樹脂組成物に粒子を混合した後、基板を作製し混合した粒子で表面に凹凸を設けることができる。
ここで用いる粒子としては、例えば、フィラーを挙げることができる。
Next, a method of mixing particles in the substrate and dispersing the particles near the substrate surface will be described.
When producing the resin substrate, after mixing the particles with the resin composition before curing, the substrate can be produced and the surface can be provided with irregularities by the mixed particles.
Examples of the particles used here include a filler.
さらに、エンボス加工等を施した型上で基板を成形し転写する方法については、エンボス加工等を施した型で基板の表面にエンボス形状を転写する方法およびエンボス加工を施した型上で基板を作製し、基板を硬化させた後、型から外し、型の凹凸を転写する方法がある。 Furthermore, for the method of forming and transferring the substrate on the embossed mold, the method of transferring the embossed shape to the surface of the substrate with the embossed mold and the substrate on the embossed mold. There is a method in which after making and curing the substrate, it is removed from the mold and the unevenness of the mold is transferred.
また、基板を作製した後、エンボス加工を施した型をプレスし、型上の凹凸を転写する方法もある。この方法の場合、エンボス加工を施した型を、金属で作製しておくと基板表面の凹凸を再現性良く作製することが可能であり、量産に適している。図3には、ガラス繊維2、樹脂硬化物1の表面にさらに樹脂硬化物層4を有し、エンボス加工を施した型であるエンボス加工ベース基板5を押し当て、樹脂硬化物層4に凹凸を転写する凹凸の作製方法を示した。
There is also a method in which after the substrate is manufactured, the embossed mold is pressed to transfer the unevenness on the mold. In the case of this method, if the embossed mold is made of metal, the unevenness of the substrate surface can be produced with good reproducibility, which is suitable for mass production. In FIG. 3, the glass fiber 2 and the resin cured
さらに、機械的に表面に凹凸を作製する方法としては、基板表面を直接サンドブラストで荒らす方法や、ワイヤーブラシやサンドペーパーでこすり、表面に凹凸を機械的に付ける方法等が使用できる。 Further, as a method for mechanically producing irregularities on the surface, a method of directly roughing the substrate surface by sand blasting, a method of rubbing with a wire brush or sand paper, and mechanically imparting irregularities to the surface can be used.
本発明を実施例により更に詳細に説明するが、これは単なる例示であり、本発明はこれにより限定されるものではない。 The present invention will be described in more detail by way of examples, but this is merely an example, and the present invention is not limited thereby.
下記(A)の化学式を有する(3、3’、4、4’-ジエポキシ)ビシクロヘキシル(株式会社ダイセル製セロキサイド8000)40重量部と下記(B)の化学式を有するビスフェノール型エポキシ化合物(三菱化学株式会社製jER828)60重量部、光カチオン重合開始剤として4,4’-ビス[ビス((β-ヒドロキシエトキシ)フェニル)スルホニオ]フェニルスルフィド-ビス-ヘキサフルオロアンチモネート)(株式会社ADEKA製アデカオプトマーSP-170)1重量部とからなる樹脂組成物を1mmのスペーサとともに、PETフィルム100μm(東洋紡績株式会社製A4100)で挟み込んで、片面から約300mJ/cm2のメタルハライドUV光を照射した。PETフィルムを剥離して厚さ1mmの樹脂板を得た。樹脂組成物は十分硬化しており、タックは確認されなかった。
40 parts by weight of (3,3 ′, 4,4′-diepoxy) bicyclohexyl (Celoxide 8000 manufactured by Daicel Corporation) having the following chemical formula (A) and a bisphenol type epoxy compound (Mitsubishi Chemical) having the following chemical formula (B) 60 parts by weight of jER828), 4,4′-bis [bis ((β-hydroxyethoxy) phenyl) sulfonio] phenyl sulfide-bis-hexafluoroantimonate) (ADEKA manufactured by ADEKA Corporation) (Optomer SP-170) A resin composition consisting of 1 part by weight was sandwiched between a
(3、3’、4、4’-ジエポキシ)ビシクロヘキシル(株式会社ダイセル製セロキサイド8000)10重量部とビスフェノール型エポキシ化合物(三菱化学株式会社製jER828)90重量部、光カチオン重合開始剤として4,4’-ビス[ビス((β-ヒドロキシエトキシ)フェニル)スルホニオ]フェニルスルフィド-ビス-ヘキサフルオロアンチモネート)(株式会社ADEKA製アデカオプトマーSP-170)1重量部とからなる樹脂組成物を1mmのスペーサとともにPETフィルム100μm(東洋紡績株式会社製A4100)で挟み込んで、片面から約950mJ/cm2のメタルハライドUV光を照射した。PETフィルムを剥離して厚さ1mmの樹脂板を得た。樹脂組成物は十分硬化しており、タックは確認されなかった。
10 parts by weight of (3,3 ′, 4,4′-diepoxy) bicyclohexyl (Celoxide 8000 manufactured by Daicel Corporation) and 90 parts by weight of a bisphenol type epoxy compound (jER828 manufactured by Mitsubishi Chemical Corporation), 4 as a photocationic polymerization initiator , 4′-bis [bis ((β-hydroxyethoxy) phenyl) sulfonio] phenyl sulfide-bis-hexafluoroantimonate) (ADEKA OPTMER SP-170 manufactured by ADEKA Corporation) It was sandwiched with a
(3、3’、4、4’-ジエポキシ)ビシクロヘキシル(株式会社ダイセル製セロキサイド8000)30重量部とフェノールノボラック型エポキシ化合物(三菱化学株式会社製jER152)70重量部、光カチオン重合開始剤として4,4’-ビス[ビス((β-ヒドロキシエトキシ)フェニル)スルホニオ]フェニルスルフィド-ビス-ヘキサフルオロアンチモネート)(株式会社ADEKA製アデカオプトマーSP-170)1重量部とからなる樹脂組成物を1mmのスペーサとともにPETフィルム100μm(東洋紡績株式会社製A4100)で挟み込んで、片面から約300mJ/cm2のメタルハライドUV光を照射した。PETフィルムを剥離して厚さ1mmの樹脂板を得た。樹脂組成物は十分硬化しており、タックは確認されなかった。
30 parts by weight of (3,3 ′, 4,4′-diepoxy) bicyclohexyl (Celoxide 8000 manufactured by Daicel Corporation) and 70 parts by weight of a phenol novolac type epoxy compound (jER152 manufactured by Mitsubishi Chemical Corporation), as a
(3、3’、4、4’-ジエポキシ)ビシクロヘキシル(株式会社ダイセル製セロキサイド8000)10重量部と下記(D)の化学式を有する3’、4’-エポキシシクロヘキシルメチル-3、4-エポキシシクロヘキサンカルボキシレート(株式会社ダイセル製セロキサイド2021P)90重量部、光カチオン重合開始剤として4,4’-ビス[ビス((β-ヒドロキシエトキシ)フェニル)スルホニオ]フェニルスルフィド-ビス-ヘキサフルオロアンチモネート)(株式会社ADEKA製アデカオプトマーSP-170)1重量部とからなる樹脂組成物を1mmのスペーサとともにPETフィルム100μm(東洋紡製A4100)で挟み込んで、片面から約1000mJ/cm2のメタルハライドUV光を照射した。PETフィルムを剥離して厚さ1mmの樹脂板を得た。樹脂組成物は十分硬化しており、タックは確認されなかった。 10 parts by weight of (3,3 ′, 4,4′-diepoxy) bicyclohexyl (Celoxide 8000 manufactured by Daicel Corporation) and 3 ′, 4′-epoxycyclohexylmethyl-3,4-epoxy having the following chemical formula (D) 90 parts by weight of cyclohexanecarboxylate (Celoxide 2021P manufactured by Daicel Corporation), 4,4′-bis [bis ((β-hydroxyethoxy) phenyl) sulfonio] phenyl sulfide-bis-hexafluoroantimonate) as a photocationic polymerization initiator (Adeka Co., Ltd., ADEKA Corporation SP-170) 1 part by weight of a resin composition is sandwiched with a 1 mm spacer between 100 μm PET films (A4100 manufactured by Toyobo), and a metal halide UV light of about 1000 mJ / cm 2 is applied from one side. Irradiated. The PET film was peeled off to obtain a resin plate having a thickness of 1 mm. The resin composition was sufficiently cured and no tack was confirmed.
80μmのEガラス系ガラスクロス(ユニチカグラスファイバー株式会社製(#2319タイプ)屈折率1.555)に(3、3’、4、4’-ジエポキシ)ビシクロヘキシル(株式会社ダイセル製セロキサイド8000)40重量部とビスフェノール型エポキシ化合物(三菱化学株式会社製jER828)60重量部、光カチオン重合開始剤として4,4’-ビス[ビス((β-ヒドロキシエトキシ)フェニル)スルホニオ]フェニルスルフィド-ビス-ヘキサフルオロアンチモネート)(株式会社ADEKA製アデカオプトマーSP-170)1重量部とからなる樹脂組成物を真空中で2時間含浸し、脱泡した。この樹脂組成物を含浸したクロスをPETフィルム100μm(東洋紡製A4100)で挟み込んで、片面から約300mJ/cm2のメタルハライドUV光を照射し硬化させた。さらにPETフィルムを剥離し、硬化物を真空オーブン中250℃で1h加熱し、80μmの透明シートを得た。
この複合透明シートの諸物性は下記に示す。
全光線透過率・・・90%
ヘイズ・・・3.8%
平均線膨張係数(CTE)・・・12ppm/K(30-230℃)@MD
14ppm/K(30-230℃)@TD
80 μm E glass-based glass cloth (Unitika Glass Fiber Co., Ltd. (# 2319 type) refractive index 1.555) (3, 3 ′, 4, 4′-diepoxy) bicyclohexyl (Celoxide 8000, manufactured by Daicel Corporation) 40 Parts by weight and 60 parts by weight of a bisphenol type epoxy compound (jER828 manufactured by Mitsubishi Chemical Corporation), 4,4′-bis [bis ((β-hydroxyethoxy) phenyl) sulfonio] phenyl sulfide-bis-hexa as a photocationic polymerization initiator A resin composition consisting of 1 part by weight of fluoroantimonate) (ADEKA OPTMER SP-170 manufactured by ADEKA Corporation) was impregnated in vacuum for 2 hours and defoamed. The cloth impregnated with this resin composition was sandwiched between 100 μm PET films (A4100 manufactured by Toyobo Co., Ltd.), and cured by irradiation with metal halide UV light of about 300 mJ / cm 2 from one side. Further, the PET film was peeled off, and the cured product was heated in a vacuum oven at 250 ° C. for 1 h to obtain an 80 μm transparent sheet.
Various physical properties of this composite transparent sheet are shown below.
Total light transmittance 90%
Haze: 3.8%
Average linear expansion coefficient (CTE): 12ppm / K (30-230 ° C) @MD
14ppm / K (30-230 ℃) @TD
前記諸物性は下記の方法で測定した。
(a)全光線透過率、ヘイズ
JIS-K-7361に準拠し、ヘイズメーターNDH:2000(日本電色工業製)を用いて複合材料の全光線透過率を測定した。
(b)平均線膨張係数(CTE)
セイコーインスツルメンツ( 株) 製T M A / S S 1 2 0 C 型熱応力歪測定装置を用いて、窒素雰囲気下、1分間に5 ℃ の割合で30℃~230℃まで上昇させて20分間保持、その後1分間に5℃の割合で230℃~30℃まで冷却させた時の値を測定して平均線膨張係数を求めた。測定は荷重を5 g 、引っ張りモードで実施した。
The physical properties were measured by the following methods.
(A) Total light transmittance, haze Based on JIS-K-7361, the total light transmittance of the composite material was measured using a haze meter NDH: 2000 (manufactured by Nippon Denshoku Industries Co., Ltd.).
(B) Average linear expansion coefficient (CTE)
Using a TMA / S S 120 C type thermal stress strain measuring device manufactured by Seiko Instruments Inc., the temperature is raised from 30 ° C. to 230 ° C. at a rate of 5 ° C. per minute and held for 20 minutes. Thereafter, the average linear expansion coefficient was determined by measuring the value when cooled to 230 ° C. to 30 ° C. at a rate of 5 ° C. per minute. The measurement was performed in a tensile mode with a load of 5 g.
[比較例1]
ビスフェノール型エポキシ化合物(三菱化学株式会社製jER828)100重量部、光重合開始剤として4,4’-ビス[ビス((β-ヒドロキシエトキシ)フェニル)スルホニオ]フェニルスルフィド-ビス-ヘキサフルオロアンチモネート)(株式会社ADEKA製アデカオプトマーSP-170)1重量部とからなる樹脂組成物をPETフィルム100μm(東洋紡績株式会社製A4100)で挟み込んで、片面から約5000mJ/cm2のメタルハライドUV光を照射した。PETフィルムを剥離すると樹脂組成物は流動性が残っており、十分硬化しておらず樹脂板を得ることはできなかった。
[Comparative Example 1]
100 parts by weight of a bisphenol type epoxy compound (Mitsubishi Chemical Corporation jER828), 4,4′-bis [bis ((β-hydroxyethoxy) phenyl) sulfonio] phenyl sulfide-bis-hexafluoroantimonate) as a photopolymerization initiator (Adeka Optomer SP-170 manufactured by ADEKA Co., Ltd.) A resin composition consisting of 1 part by weight is sandwiched between 100 μm PET films (A4100 manufactured by Toyobo Co., Ltd.) and irradiated with metal halide UV light of about 5000 mJ / cm 2 from one side. did. When the PET film was peeled off, the resin composition remained fluid and was not sufficiently cured and a resin plate could not be obtained.
[比較例2]
3’、4’-エポキシシクロヘキシルメチル-3、4-エポキシシクロヘキサンカルボキシレート(株式会社ダイセル製セロキサイド2021P)100重量部、光カチオン重合開始剤として4,4’-ビス[ビス((β-ヒドロキシエトキシ)フェニル)スルホニオ]フェニルスルフィド-ビス-ヘキサフルオロアンチモネート)(株式会社ADEKA製アデカオプトマーSP-170)1重量部とからなる樹脂組成物をPETフィルム100μm(東洋紡績株式会社製A4100)で挟み込んで、片面から約5000mJ/cm2のメタルハライドUV光を照射した。PETフィルムを剥離すると樹脂組成物は流動性が残っており、十分硬化しておらず樹脂板を得ることはできなかった。
[Comparative Example 2]
100 parts by weight of 3 ′, 4′-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate (Celoxide 2021P manufactured by Daicel Corporation), 4,4′-bis [bis ((β-hydroxyethoxy) as a photocationic polymerization initiator ) Phenyl) sulfonio] phenyl sulfide-bis-hexafluoroantimonate) (adekatopomer SP-170 manufactured by ADEKA Corporation) and 1 part by weight of the resin composition are sandwiched between 100 μm PET films (A4100 manufactured by Toyobo Co., Ltd.) Then, a metal halide UV light of about 5000 mJ / cm 2 was irradiated from one side. When the PET film was peeled off, the resin composition remained fluid and was not sufficiently cured and a resin plate could not be obtained.
本発明によれば、低エネルギーで樹脂硬化物、透明複合体、表示素子用基板および面光源用基板を得ることができる、エポキシ化合物含有樹脂組成物およびエポキシ化合物含有樹脂組成物から作製される樹脂硬化物、透明複合体、表示素子用基板および面光源用基板を得ることができる。したがって、本発明は「樹脂組成物、樹脂硬化物、透明複合体、表示素子用基板および面光源用基板」に好適に利用でき、産業上極めて重要である。 According to the present invention, a resin produced from an epoxy compound-containing resin composition and an epoxy compound-containing resin composition capable of obtaining a cured resin, a transparent composite, a display element substrate, and a surface light source substrate with low energy. A cured product, a transparent composite, a display element substrate, and a surface light source substrate can be obtained. Therefore, the present invention can be suitably used for “a resin composition, a cured resin, a transparent composite, a display element substrate, and a surface light source substrate”, and is extremely important industrially.
1 樹脂硬化物
2a ガラス繊維、縦方向ガラスヤーン(経糸)
2b ガラス繊維、横方向ガラスヤーン(緯糸)
3 フィラー
4 樹脂硬化物層
5 エンボス加工ベース基板
100 面光源用基板
1 Resin cured
2b Glass fiber, transverse glass yarn (weft)
3
Claims (9)
前記反応促進剤が、下記(2)で表わされる脂環式エポキシ化合物(2)であり、
前記(1)と(2)の割合が、(1):(2)=60:40~99:1であることを特徴とする樹脂組成物。
The reaction accelerator is an alicyclic epoxy compound (2) represented by the following (2):
A ratio of (1) and (2) is (1) :( 2) = 60: 40 to 99: 1.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017033056A1 (en) * | 2015-08-27 | 2017-03-02 | Toray Industries, Inc. | Epoxy resin compositions and fiber-reinforced composite materials prepared therefrom |
| WO2017078006A1 (en) * | 2015-11-06 | 2017-05-11 | 積水化学工業株式会社 | Sealant for organic electroluminescent display element |
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|---|---|---|---|---|
| JP2005146038A (en) * | 2003-11-12 | 2005-06-09 | Daicel Chem Ind Ltd | UV curable adhesive and its adhesive |
| JP2011144214A (en) * | 2010-01-12 | 2011-07-28 | Sumitomo Bakelite Co Ltd | Resin composition and transparent composite substrate |
| JP2012025833A (en) * | 2010-07-22 | 2012-02-09 | Daicel Corp | Fiber strengthening transparent resin composition, method of manufacturing the same, and transparent sheet |
| JP2012140607A (en) * | 2010-12-14 | 2012-07-26 | Daicel Corp | Curable composition and curable resin |
-
2013
- 2013-09-26 TW TW102134767A patent/TW201428019A/en unknown
- 2013-09-27 WO PCT/JP2013/076393 patent/WO2014054547A1/en not_active Ceased
- 2013-09-27 JP JP2014539713A patent/JPWO2014054547A1/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005146038A (en) * | 2003-11-12 | 2005-06-09 | Daicel Chem Ind Ltd | UV curable adhesive and its adhesive |
| JP2011144214A (en) * | 2010-01-12 | 2011-07-28 | Sumitomo Bakelite Co Ltd | Resin composition and transparent composite substrate |
| JP2012025833A (en) * | 2010-07-22 | 2012-02-09 | Daicel Corp | Fiber strengthening transparent resin composition, method of manufacturing the same, and transparent sheet |
| JP2012140607A (en) * | 2010-12-14 | 2012-07-26 | Daicel Corp | Curable composition and curable resin |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017033056A1 (en) * | 2015-08-27 | 2017-03-02 | Toray Industries, Inc. | Epoxy resin compositions and fiber-reinforced composite materials prepared therefrom |
| WO2017078006A1 (en) * | 2015-11-06 | 2017-05-11 | 積水化学工業株式会社 | Sealant for organic electroluminescent display element |
| KR20180075435A (en) * | 2015-11-06 | 2018-07-04 | 세키스이가가쿠 고교가부시키가이샤 | Sealant for organic electroluminescent display element |
| JPWO2017078006A1 (en) * | 2015-11-06 | 2018-08-23 | 積水化学工業株式会社 | Sealant for organic electroluminescence display element |
| KR102697023B1 (en) | 2015-11-06 | 2024-08-20 | 세키스이가가쿠 고교가부시키가이샤 | Sealant for organic electroluminescent display element |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2014054547A1 (en) | 2016-08-25 |
| TW201428019A (en) | 2014-07-16 |
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