WO2013137444A1 - Tape for continuity tests and continuity test method using said tape - Google Patents
Tape for continuity tests and continuity test method using said tape Download PDFInfo
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- WO2013137444A1 WO2013137444A1 PCT/JP2013/057433 JP2013057433W WO2013137444A1 WO 2013137444 A1 WO2013137444 A1 WO 2013137444A1 JP 2013057433 W JP2013057433 W JP 2013057433W WO 2013137444 A1 WO2013137444 A1 WO 2013137444A1
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- Prior art keywords
- tape
- base material
- continuity
- adhesive layer
- substrate
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/04—Housings; Supporting members; Arrangements of terminals
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/20—Applications use in electrical or conductive gadgets
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/18—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet characterized by perforations in the adhesive tape
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/302—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive being pressure-sensitive, i.e. tacky at temperatures inferior to 30°C
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/314—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive layer and/or the carrier being conductive
Definitions
- the present invention relates to a continuity test tape for conducting a continuity test in a state where a semiconductor wafer or a semiconductor chip is bonded.
- a semiconductor wafer made of silicon, gallium, arsenic or the like is manufactured in a large diameter state, and then a semiconductor wafer continuity inspection is performed by an inspection process. Thereafter, the semiconductor wafer is affixed to a dicing sheet and subjected to a dicing process, a cleaning process, an expanding process, a pick-up process, and a mounting process. In addition, a continuity test of the semiconductor chip may be performed after the dicing process.
- Patent Document 1 discloses a pressure-sensitive adhesive layer on a base film made of metal foil or a base film having a structure in which a conductive vapor deposition layer is provided on the base.
- a pressure-sensitive adhesive sheet in which is laminated is disclosed.
- the pressure-sensitive adhesive sheet for inspection described in Patent Document 1 has no flexibility when the metal foil is used as the base film, and when bent, the original pressure-sensitive plastic deformation causes bending. There is a problem that the shape does not return. That is, the test adhesive sheet described in Patent Document 1 has poor handling properties. Further, the metal foil may damage the guide roll and the like, which may cause the apparatus to fail. Moreover, when using the base material which provided the electroconductive vapor deposition layer as a base film, it does not have electroconductivity in the lamination direction (thickness direction) of this adhesive sheet.
- an object of the present invention is to provide a continuity test tape that is excellent in handling properties and that can easily perform a continuity test.
- the present invention includes the following gist.
- a laminate comprising a base material provided with a plurality of through holes and a metal-coated base material made of a metal film, and a conductive pressure-sensitive adhesive layer. Tape for continuity testing that has conductivity in the stacking direction.
- a continuity test excellent in continuity and handling properties in the thickness direction (stacking direction) and the surface direction. Tape can be obtained. According to the continuity test tape of the present invention, the continuity test can be easily performed.
- sectional view of the tape for continuity inspection concerning one embodiment of the present invention is shown.
- Sectional drawing of the tape for a continuity test which concerns on other embodiment of this invention is shown.
- Sectional drawing of the tape for a continuity test concerning another embodiment of the present invention is shown.
- the enlarged view of FIG. 1 is shown.
- a continuity test tape 10 includes a metal-coated substrate 6 composed of a substrate 1 and a metal film 2 provided with a plurality of through holes 4, and a conductive adhesive layer 3. And is conductive in the stacking direction.
- the metal-coated substrate in the present invention comprises a substrate and a metal film provided with a plurality of through holes, and specifically, the surface of the substrate is coated with a metal film. Below, a base material and a metal film are demonstrated.
- a plurality of through holes 4 are formed in the substrate 1.
- the shape of the through hole is not particularly limited.
- the through hole in the present invention is formed by, for example, a method of piercing a thin needle into a substrate, a method of forming using a punch, or a method of forming using a spindle or laser light. Among these, a method of forming a through hole using a laser beam is preferable.
- the laser beam that can be used in the present invention is not particularly limited, and examples thereof include a YAG laser and a carbon dioxide (CO 2 ) laser.
- the repetition frequency of such laser light is preferably 5000 to 10,000 Hz.
- the pulse width is preferably 5 to 50 ⁇ sec. According to said laser beam, a desired through-hole can be formed, suppressing that a base material deform
- the diameter of the through hole on one surface of the substrate is preferably 300 ⁇ m or less, more preferably 250 ⁇ m or less, and even more preferably 50 to 200 ⁇ m. It is.
- the diameter of the through-hole on one surface of the substrate exceeds 300 ⁇ m, when the conductive adhesive layer described later is formed on the substrate, the conductive adhesive layer may ooze out on the opposite surface, It may be difficult to form a smooth conductive pressure-sensitive adhesive layer.
- the “one surface of the substrate” means a substrate surface on the side to which a needle, a punch blade or a spindle are pressed or a substrate surface on which a laser beam is incident when forming a through hole. (Substrate surface 1a in FIGS. 1 to 3). Further, the substrate surface opposite to the one surface of the substrate is referred to as “the other surface of the substrate” (the substrate surface 1b in FIGS. 1 to 3).
- the total area of the through holes on one surface of the substrate is preferably 1 to 10%, more preferably 2 to 10%, still more preferably 3 to 10%, particularly preferably 3 to the area of the substrate. ⁇ 5%.
- the through-hole may be formed on the entire surface of the base material, or may be formed only in a range where an adherend (a chip or the like for continuity inspection) is attached.
- the difference (t1 ⁇ t2) between the thickness (t1) of the base material at the peripheral portion of the through hole and the thickness (t2) of the base material other than the peripheral portion of the through hole shown in FIG. 4 is preferably 60 ⁇ m or less. More preferably, it is 30 ⁇ m or less, and further preferably 5 to 15 ⁇ m.
- irregularities may be formed in the peripheral portion of the through hole on the other surface of the substrate.
- the conductive adhesive layer to be described later is formed on the other surface of the substrate, the unevenness generated on the other surface of the substrate can be embedded, and a smooth conductive adhesive layer can be obtained.
- the difference (t1-t2) by setting the difference (t1-t2) within the above range, the unevenness of the other surface of the substrate can be reduced, and the effect can be obtained even when a thin conductive adhesive layer is formed. be able to.
- the conductive pressure-sensitive adhesive layer is smooth, the inclination of the adherend adhered to the conductive pressure-sensitive adhesive layer is suppressed, the contact area of each adherend to the conductive pressure-sensitive adhesive layer becomes substantially constant, and the continuity test Improves accuracy.
- the manufacturing cost of the continuity test tape can be reduced by reducing the thickness of the conductive adhesive layer. By forming the through hole using laser light, the difference (t1 ⁇ t2) can be easily within the above range. In addition, as shown in FIG.
- the “thickness (t1) of the base material at the peripheral portion of the through hole” in the present invention is the thickness of the base material in the portion at the maximum height from the base material surface at the peripheral portion of the through hole. It is thickness. Further, “the thickness of the base material other than the peripheral portion of the through hole (t2)” is a substantial thickness of the base material.
- the material of the base material in which the above through holes are formed is not particularly limited, for example, PET (polyethylene terephthalate), PBT (polybutylene terephthalate), PEN (polyethylene naphthalate), PPS (polyphenylene sulfide), PI ( Polyimide), PEEK (polyetheretherketone), aramid, polylactic acid, or other resin insulating film is used.
- PET polyethylene terephthalate
- PBT polybutylene terephthalate
- PEN polyethylene naphthalate
- PPS polyphenylene sulfide
- PI Polyimide
- PEEK polyetheretherketone
- aramid polylactic acid, or other resin insulating film
- the substantial thickness of the substrate other than the peripheral portion of the through hole is not particularly limited, and is preferably 30 to 200 ⁇ m, more preferably 50 to 150 ⁇ m, and still more preferably 50 to 100 ⁇ m. If the thickness of the substrate is less than 30 ⁇ m, the substrate shrinks due to heat generated when the through hole is formed by laser light, and wrinkles may occur. On the other hand, when the thickness of the substrate exceeds 200 ⁇ m, the handling property in the manufacturing process of the continuity test tape may be deteriorated.
- the metal film is formed by vapor deposition or sputtering.
- the metal film formed by the vapor deposition method, the sputtering method, or the like covers one side of the substrate, preferably both sides of the substrate, and covers the peripheral side surface of the through hole.
- the metal constituting the metal film may be filled in the through hole.
- the continuity test tape of the present invention has conductivity in the stacking direction (thickness direction).
- Such a metal film is not particularly limited, but is formed using, for example, aluminum, gold, silver, copper, platinum, nickel, or the like.
- a metal film on one side of a base material it is preferable to form a metal film on the base material surface 1a in FIG. 2, that is, “one side of the base material”.
- a metal film on one surface of the base material By forming a metal film on one surface of the base material, a smooth tape for continuity testing can be obtained, so that the accuracy of continuity testing is improved.
- the thickness of the metal film is preferably 60 to 1000 nm, more preferably 100 to 500 nm, still more preferably 150 to 300 nm.
- the conductive adhesive layer is laminated on one side of the metal-coated substrate.
- An adherend can be favorably held by providing a conductive pressure-sensitive adhesive layer.
- the adhesive composition which comprises a conductive adhesive layer penetrate
- the surface on which the conductive pressure-sensitive adhesive layer is laminated is not particularly limited, but it is preferable to laminate the conductive pressure-sensitive adhesive layer on the substrate surface 1b side in FIG. 1, that is, on the “other surface of the substrate” side. When the conductive adhesive layer is laminated on the “other surface of the substrate” side, the conductive adhesive layer is laminated on the substrate surface 1a side in FIG.
- the type of the pressure-sensitive adhesive that constitutes the conductive pressure-sensitive adhesive layer is not particularly limited, and may be formed of various conventionally known pressure-sensitive adhesives.
- an adhesive for example, an adhesive such as rubber, acrylic, silicone, polyester, urethane, or polyvinyl ether is used.
- an energy ray curable pressure-sensitive adhesive that is cured by irradiation with energy rays and becomes removable, a heat-foaming type, or a water swelling type pressure-sensitive adhesive can also be used.
- acrylic, polyester-based, and urethane-based pressure-sensitive adhesives are preferable, and acrylic pressure-sensitive adhesives are particularly preferable from the viewpoint of versatility and handleability.
- Acrylic pressure-sensitive adhesives include, for example, (meth) acrylic acid ester homopolymers, copolymers containing two or more (meth) acrylic acid ester units, and (meth) acrylic acid esters and other functional monomers. What contains at least 1 sort (s) chosen from the copolymer with a monomer is used.
- the (meth) acrylate ester include butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, and (meth) acrylic. Acid nonyl, decyl (meth) acrylate, and the like can be mentioned.
- the functional monomer examples include hydroxyl group-containing monomers such as hydroxyethyl (meth) acrylate and hydroxypropyl (meth) acrylate, carboxylic acid group-containing monomers such as (meth) acrylic acid, (Meth) acrylamide, dimethyl (meth) acrylamide, N-vinylmorpholine, N-allylmorpholine, N- (meth) acryloylmorpholine and the like can be mentioned.
- hydroxyl group-containing monomers such as hydroxyethyl (meth) acrylate and hydroxypropyl (meth) acrylate
- carboxylic acid group-containing monomers such as (meth) acrylic acid, (Meth) acrylamide, dimethyl (meth) acrylamide, N-vinylmorpholine, N-allylmorpholine, N- (meth) acryloylmorpholine and the like can be mentioned.
- N-vinyl morpholine, N-allyl morpholine, which is an ethylenically unsaturated monomer having a 6-membered heterocyclic ring each having a nitrogen atom and an oxygen atom N- Use of (meth) acryloylmorpholine or the like is preferable because it exhibits performance as a crosslinking accelerator in the reaction with a crosslinking agent described later.
- N- (meth) acryloylmorpholine is preferably used from the viewpoint of good copolymerizability with other monomer components.
- the conductive test tape is applied to an adherend such as a semiconductor chip, and is particularly affixed to a conductive adherend. Therefore, from the viewpoint of suppressing oxidation (corrosion) on the surface of the conductive adherend, it is preferable to use a pressure-sensitive adhesive that does not contain an acid group.
- a pressure-sensitive adhesive that does not use a carboxylic acid group-containing monomer is preferable.
- an adhesive containing an acid group it is preferable to use an adhesive containing an acid group.
- the pressure-sensitive adhesive may be crosslinked with a crosslinking agent such as an isocyanate crosslinking agent, an epoxy crosslinking agent, an aziridine crosslinking agent, or a chelate crosslinking agent.
- a crosslinking agent such as an isocyanate crosslinking agent, an epoxy crosslinking agent, an aziridine crosslinking agent, or a chelate crosslinking agent.
- an isocyanate-based crosslinking agent tolylene diisocyanate (TDI), hexamethylene diisocyanate (HMDI), isophorone diisocyanate (IPDI), xylene diisocyanate (XDI), hydrogenated tolylene diisocyanate, diphenylmethane diisocyanate, trimethylolpropane-modified TDI, or the like is used. .
- epoxy-based crosslinking agent ethylene glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, trimethylolpropane diglycidyl ether, diglycidylaniline, diglycidylamine and the like are used.
- aziridine-based crosslinking agent examples include 2,2-bishydroxymethylbutanol-tris ⁇ ⁇ [3- (1-aziridinyl) pronate], 4,4-bis (ethyleneiminocarboxyamino) diphenylmethane, tris-2,4,6- (1 -Aziridinyl) -1,3,5-triazine, tris [1- (2-methyl) aziridinyl] phosphine oxide, hexa [1- (2-methyl) -aziridinyl] triphosphatriazine and the like are used.
- the chelate-based crosslinking agent aluminum chelate, titanium chelate or the like is used. By appropriately adjusting the amount of the crosslinking agent, it is possible to develop the necessary adhesive properties for various adherends.
- a crosslinking agent may be used not only alone but also in combination of two or more as required.
- conductive particles are preferably blended in addition to the pressure-sensitive adhesive. By adding conductive particles to the conductive pressure-sensitive adhesive layer, conductivity can be imparted to the pressure-sensitive adhesive layer.
- the conductive particles used in the present invention include carbon black and graphite such as furnace black and acetylene black, or metal such as carbon fiber, conductive whisker, conductive ceramic powder or nickel, copper, gold, silver, iron and chromium. One or more of the particles are used.
- the pressure-sensitive adhesive composition forming the conductive pressure-sensitive adhesive layer has additives generally contained in pressure-sensitive adhesives for ordinary pressure-sensitive adhesive sheets, such as tackifiers, ultraviolet absorbers, antioxidants, Or a coloring agent etc. may be contained as needed.
- the conductive test tape of the present invention configured as described above is applied to an adherend, the conductive adhesive layer comes into contact with the adherend, and the adherend and the conductive test tape are electrically connected. . Therefore, since it can conduct
- the thickness of the conductive pressure-sensitive adhesive layer is not particularly limited, and the difference (t1) between the adhesive strength and the thickness (t1) of the base material at the peripheral portion of the through hole and the thickness (t2) of the base material other than the peripheral portion of the through hole. It is preferably set according to -t2).
- the thickness of the conductive pressure-sensitive adhesive layer is preferably 10 to 80 ⁇ m, more preferably 15 to 50 ⁇ m, and still more preferably 20 to 35 ⁇ m.
- the conductive pressure-sensitive adhesive layer preferably has an appropriate removability to the adherend, and the adhesive strength to the adherend is preferably 1000 to 7000 mN / 25 mm, more preferably 2000 to 6000 mN / 25 mm, Preferably, it is 2500 to 5000 mN / 25 mm.
- the adhesive strength of the conductive pressure-sensitive adhesive layer is in the above range, the adherend can be held well and the adherend can be easily peeled after the inspection.
- the adhesive strength is an adhesion by a 180 ° peeling method at 23 ° C. and 50% relative humidity of a continuity test tape after being attached to an adherend (SUS) after 30 minutes. It is power.
- a release sheet may be laminated on the surface of the pressure-sensitive adhesive layer in order to protect the conductive pressure-sensitive adhesive layer before use. You may use a peeling sheet as it is, without peeling the peeling sheet used at the time of manufacture of the tape for a continuity test of this invention mentioned later from an adhesive layer.
- a peeling base material in a peeling sheet It can select suitably from various base materials conventionally known as a base material of a peeling sheet.
- release substrates include polyester films such as PET, PBT, and PEN, polyolefin films such as polypropylene and polymethylpentene, plastic films such as polycarbonate films and cellulose acetate films, and laminated sheets containing these. Can be mentioned.
- the thickness of the release substrate is not particularly limited, but is usually preferably 10 to 150 ⁇ m.
- a physical or chemical surface treatment such as an oxidation method can be performed.
- the oxidation method include corona discharge treatment, chromic acid treatment, flame treatment, hot air treatment, and ozone / ultraviolet irradiation treatment. These surface treatment methods are appropriately selected depending on the type of the release substrate, but in general, the corona discharge treatment method is preferably used from the viewpoints of effects and operability.
- primer treatment can also be performed.
- the release agent for forming the release agent layer in the release sheet is silicone resin, long chain alkyl resin, alkyd resin, fluororesin, polybutadiene rubber, butyl rubber, styrene-butadiene copolymer, polyisoprene rubber, ethylene polypropylene copolymer. And rubber-based elastomers.
- Coating of the release agent on the release substrate is conventionally known, for example, bar coating method, reverse roll coating method, knife coating method, roll knife coating method, gravure coating method, air doctor coating method, doctor blade coating method, etc. It can be performed by a coating method.
- the thickness of the release agent layer is not particularly limited, but is usually preferably 0.01 to 5 ⁇ m.
- a base material provided with a plurality of through holes is prepared.
- a metal film is formed on the surface of the base material using a vapor deposition method, a sputtering method, or the like to obtain a metal-coated base material.
- the metal film is preferably formed by a vapor deposition method from the viewpoint of ease of manufacture and uniformity of the metal film.
- a conductive pressure-sensitive adhesive layer is laminated on the surface of the metal-coated substrate.
- the method of laminating the pressure-sensitive adhesive layer is as follows. The pressure-sensitive adhesive is diluted with an appropriate solvent as necessary to obtain a pressure-sensitive adhesive composition, and applied onto the release sheet and dried to give a predetermined dry film thickness.
- a layer may be formed and transferred to the surface of the metal-coated substrate, or the pressure-sensitive adhesive composition may be directly applied to the surface of the metal-coated substrate and dried to form a pressure-sensitive adhesive layer. In this way, the continuity test tape according to the present invention is obtained.
- a conductive pressure-sensitive adhesive layer is laminated on the surface of a base material provided with a plurality of through holes.
- the method for laminating the pressure-sensitive adhesive layer is the same as described above.
- a metal film is formed on one surface of the substrate (the surface opposite to the surface on which the pressure-sensitive adhesive layer is laminated) using a vapor deposition method, a sputtering method, or the like to obtain a metal-coated substrate.
- the tape for continuity testing according to the present invention can be obtained.
- the tape for continuity testing according to the present invention has continuity in the laminating direction and the surface direction, and can easily inspect the continuity of a semiconductor chip or the like.
- the adherend is affixed to the conductive adhesive layer of the continuity test tape of the present invention, and then the conductive adhesive layer or metal film (conductivity) of the adherend and the continuity test tape.
- a tester probe is brought into contact with the surface opposite to the adhesive layer) to inspect the conductivity of the adherend. Since the tape for continuity testing of the present invention has conductivity in the laminating direction, it is preferable to inspect the conductivity in the laminating direction by bringing one tester into contact with the adherend and the other tester in contact with the metal film. More preferably, the tester is brought into contact with the metal film in a range where the adherend is adhered and the conductivity is inspected in the stacking direction (substantially vertical direction). According to the method for inspecting continuity in the stacking direction, it is easy to keep the distance between the testers substantially constant, and the continuity test can be performed easily while being excellent in accuracy of the continuity test.
- ⁇ Diameter of through hole> The diameter of the through hole was measured by observing the surface using a scanning electron microscope (Scanning Electron Microscope (SEM) VE-9800 manufactured by Keyence Corporation).
- ⁇ Ratio of the total area of the through holes to the substrate area> Count the number of through-holes formed in the substrate, and calculate the total area of the through-holes from the diameter of the through-holes on one side of the substrate measured as described above. The percentage was determined.
- ⁇ Difference (t1 ⁇ t2) between the thickness (t1) of the base material at the peripheral portion of the through hole and the thickness (t2) of the base material other than the peripheral portion of the through hole> The base material in which the through hole is formed is observed with a laser microscope (VHS-1000 manufactured by Keyence Corporation), and the thickness (t1) of the base material at the peripheral part of the through hole and other than the peripheral part of the through hole The thickness (t2) of the base material was measured.
- the thickness (t1) of the base material in the peripheral portion of the through hole was the thickness of the base material in the portion having the maximum height from the base material surface in the peripheral portion of the through hole.
- the thickness (t2) of the base material other than the peripheral edge portion of the through hole is substantially the same as the thickness of the base material.
- ⁇ Continuity test> The chip on which the electrode was formed was affixed to the conductive adhesive layer of the continuity test tape. After that, the probe on the tester (KIT-60, manufactured by Sanwa Denki Keiki Co., Ltd.) is brought into contact with the electrode on the chip and the metal film of the tape for continuity testing (the surface opposite to the conductive adhesive layer). Inspected. A continuity test is performed on 100 chips attached to the conductive adhesive layer, and “A” indicates that 100 chips are connected, and “B” indicates that the number of chips is 70 to 99. The case of 0 to 69 was evaluated as “C”.
- ⁇ Tilt tilt> A semiconductor chip (1 mm ⁇ 1 mm, thickness 200 ⁇ m) is attached to the conductive adhesive layer, and the angle between the chip and the adhesive layer (angle ⁇ shown in FIG. 3) using a laser microscope (VHS-1000 manufactured by Keyence Corporation). was measured.
- ⁇ Tack> The pressure-sensitive adhesive layer surface was touched with a finger to confirm the presence or absence of tack.
- Example 1 [Preparation of substrate] Two shot burst processing (repetition frequency: 10000 Hz, pulse width: 25 ⁇ s) using a CO 2 laser (CO 2 laser processing machine “YB-HCS03” manufactured by Panasonic Welding Systems Co., Ltd.) on a 100 ⁇ m thick PET film ) / 50 ⁇ sec (second shot)), through-holes were formed to obtain a substrate. The ratio of the total area of the through holes to the substrate area was 3%.
- Example 2 In the preparation of the pressure-sensitive adhesive composition, a continuity test tape was obtained in the same manner as in Example 1 except that the amount of conductive particles added was 15 parts by mass. The results are shown in Table 1.
- Example 3 In the production of the pressure-sensitive adhesive composition, the same electrical conductivity as in Example 1 was used except that nickel metal particles (HCA-1 manufactured by Vale Japan Co., Ltd.) were used as the conductive particles and the addition amount was 75 parts by mass. A test tape was obtained. The results are shown in Table 1.
- Example 4 In the production of the pressure-sensitive adhesive composition, the same as in Example 1 except that nickel metal particles (# 255 manufactured by Novamet Specialty Products Corporation) were used as the conductive particles and the addition amount was 60 parts by mass. I got a tape. The results are shown in Table 1.
- Example 5 In the production of the base material, a continuity test tape was obtained in the same manner as in Example 1 except that the number of through holes formed was increased and the ratio of the total area of the through holes to the base material area was 8%. . The results are shown in Table 1.
- Example 6 In the formation of the metal film, a continuity test tape was obtained in the same manner as in Example 1 except that the film thickness of aluminum was 60 nm. The results are shown in Table 1.
- Example 7 In the formation of the metal film, a continuity test tape was obtained in the same manner as in Example 1 except that the film thickness of aluminum was 900 nm. The results are shown in Table 1.
- Example 8 In the production of the base material, a continuity test tape was obtained in the same manner as in Example 1 except that a base material was obtained by forming a through hole in a 100 ⁇ m thick PET film using a needle (silk needle No. 5). It was. The results are shown in Table 1.
- Example 9 In the formation of the metal film, a continuity test tape was obtained in the same manner as in Example 1 except that the film thickness of aluminum was 500 nm. The results are shown in Table 1.
- Example 10 In the production of the base material, a continuity test tape was obtained in the same manner as in Example 1 except that the number of through holes formed was increased and the ratio of the total area of the through holes to the base material area was 5%. . The results are shown in Table 1.
- Example 11 In the production of the base material, a continuity test tape was obtained in the same manner as in Example 1 except that the number of through holes formed was increased and the ratio of the total area of the through holes to the base material area was 10%. . The results are shown in Table 1.
- Example 12 A continuity test tape was obtained in the same manner as in Example 8 except that the diameter of the through-hole formed was changed in the production of the substrate. The results are shown in Table 1.
- Example 1 A continuity test tape was obtained in the same manner as in Example 1 except that a rolled copper foil having a thickness of 35 ⁇ m without a through hole was used as the substrate. The results are shown in Table 2.
- Example 2 A continuity test tape was obtained in the same manner as in Example 1 except that a 50 ⁇ m thick aluminum foil without through holes was used as the substrate. The results are shown in Table 2.
- Comparative Example 3 In the formation of the metal film, a continuity test tape was obtained in the same manner as in Example 1 except that the film thickness of aluminum was 50 nm. The results are shown in Table 2. In Comparative Example 3, since an extremely thin metal film was formed, a metal film continuous on the peripheral side surface of the through hole could not be formed, and as a result, it was considered that the conductivity in the thickness direction could not be obtained. Whether or not a metal film was formed on the peripheral side surface of the through hole was confirmed as follows.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Adhesive Tapes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Adhesives Or Adhesive Processes (AREA)
Description
本発明は、半導体ウエハや半導体チップを貼り合わせた状態で導通検査をするための導通検査用テープに関する。 The present invention relates to a continuity test tape for conducting a continuity test in a state where a semiconductor wafer or a semiconductor chip is bonded.
従来、シリコン、ガリウム、砒素などを材料とする半導体ウエハは、大径の状態で製造された後、検査工程により半導体ウエハの導通検査が行われる。その後、半導体ウエハはダイシングシートに貼付され、ダイシング工程、洗浄工程、エキスパンド工程、ピックアップ工程、マウント工程の各工程が施される。また、ダイシング工程後に、半導体チップの導通検査が行われることもある。 Conventionally, a semiconductor wafer made of silicon, gallium, arsenic or the like is manufactured in a large diameter state, and then a semiconductor wafer continuity inspection is performed by an inspection process. Thereafter, the semiconductor wafer is affixed to a dicing sheet and subjected to a dicing process, a cleaning process, an expanding process, a pick-up process, and a mounting process. In addition, a continuity test of the semiconductor chip may be performed after the dicing process.
上記の検査工程に用いられる検査用粘着シートとして、特許文献1には、金属箔からなる基材フィルムや基材上に導電性蒸着層が設けられた構造の基材フィルムの上に粘着剤層を積層した粘着シートが開示されている。
As a pressure-sensitive adhesive sheet for inspection used in the above inspection process,
本発明者らの検討によれば、特許文献1に記載の検査用粘着シートは、基材フィルムとして金属箔を用いる場合には、該粘着シートに柔軟性がなく、折れ曲がると塑性変形により元の形状に戻らないという問題がある。つまり、特許文献1に記載の検査用粘着シートはハンドリング性が悪い。また、金属箔によりガイドロール等を傷つけるおそれがあり、装置が故障する原因になることがあった。また、基材フィルムとして導電性蒸着層を設けた基材を用いる場合には、該粘着シートの積層方向(厚み方向)に導通性を有さない。
According to the study by the present inventors, the pressure-sensitive adhesive sheet for inspection described in
本発明は上記の事情に鑑みてなされたものである。すなわち、本発明は、ハンドリング性に優れ、導通検査を簡便に行うことができる導通検査用テープを提供することを目的としている。 The present invention has been made in view of the above circumstances. That is, an object of the present invention is to provide a continuity test tape that is excellent in handling properties and that can easily perform a continuity test.
本発明は、以下の要旨を含む。
〔1〕複数の貫通孔を設けた基材及び金属膜からなる金属被覆基材と、導電性粘着剤層とを積層してなり、
積層方向に導通性を有する導通検査用テープ。
The present invention includes the following gist.
[1] A laminate comprising a base material provided with a plurality of through holes and a metal-coated base material made of a metal film, and a conductive pressure-sensitive adhesive layer.
Tape for continuity testing that has conductivity in the stacking direction.
〔2〕貫通孔の周縁部における基材の厚みt1と、貫通孔の周縁部以外における基材の厚みt2との差t1-t2が60μm以下である〔1〕に記載の導通検査用テープ。 [2] The tape for continuity testing according to [1], wherein a difference t1-t2 between the thickness t1 of the base material at the peripheral portion of the through hole and the thickness t2 of the base material other than the peripheral portion of the through hole is 60 μm or less.
〔3〕貫通孔がレーザー光により形成される〔1〕または〔2〕に記載の導通検査用テープ。 [3] The continuity testing tape according to [1] or [2], wherein the through hole is formed by laser light.
〔4〕金属膜の厚みが60~1000nmである〔1〕~〔3〕のいずれかに記載の導通検査用テープ。 [4] The continuity test tape according to any one of [1] to [3], wherein the metal film has a thickness of 60 to 1000 nm.
〔5〕基材の一方の面における貫通孔の総面積が、基材の面積に対して1~10%である〔1〕~〔4〕のいずれかに記載の導通検査用テープ。 [5] The continuity testing tape according to any one of [1] to [4], wherein the total area of the through holes on one surface of the substrate is 1 to 10% with respect to the area of the substrate.
〔6〕導電性粘着剤層が再剥離性を有する〔1〕~〔5〕のいずれかに記載の導通検査用テープ。 [6] The continuity testing tape according to any one of [1] to [5], wherein the conductive adhesive layer has removability.
〔7〕上記〔1〕~〔6〕のいずれかに記載の導通検査用テープを用いた導通検査方法。 [7] A continuity test method using the continuity test tape according to any one of [1] to [6].
本発明によれば、貫通孔を設けた基材に金属膜を設け、さらに導電性粘着剤層を設けることで、厚み方向(積層方向)及び面方向の導通性やハンドリング性に優れた導通検査用テープを得ることができる。本発明の導通検査用テープによれば、導通検査を簡便に行うことができる。 According to the present invention, by providing a metal film on a base material provided with a through-hole and further providing a conductive pressure-sensitive adhesive layer, a continuity test excellent in continuity and handling properties in the thickness direction (stacking direction) and the surface direction. Tape can be obtained. According to the continuity test tape of the present invention, the continuity test can be easily performed.
以下、本発明について、その最良の形態も含めてさらに具体的に説明する。図1~3に示すように、本発明に係る導通検査用テープ10は、複数の貫通孔4を設けた基材1及び金属膜2からなる金属被覆基材6と、導電性粘着剤層3とを積層してなり、積層方向に導通性を有する。
Hereinafter, the present invention will be described more specifically, including its best mode. As shown in FIGS. 1 to 3, a
〔金属被覆基材〕
本発明における金属被覆基材は、複数の貫通孔を設けた基材及び金属膜からなり、具体的には、基材の表面を金属膜で被覆してなる。以下において、基材と金属膜について説明する。
[Metal-coated substrate]
The metal-coated substrate in the present invention comprises a substrate and a metal film provided with a plurality of through holes, and specifically, the surface of the substrate is coated with a metal film. Below, a base material and a metal film are demonstrated.
(基材)
基材1には複数の貫通孔4が形成されている。
(Base material)
A plurality of through
貫通孔の形状は特に限定されない。本発明における貫通孔は、例えば細い針を基材に突き刺す方法や、パンチを用いて形成する方法や、スピンドルやレーザー光を用いて形成する方法により形成される。これらの中でもレーザー光を用いて貫通孔を形成する方法が好ましい。 The shape of the through hole is not particularly limited. The through hole in the present invention is formed by, for example, a method of piercing a thin needle into a substrate, a method of forming using a punch, or a method of forming using a spindle or laser light. Among these, a method of forming a through hole using a laser beam is preferable.
本発明において用いることのできるレーザー光は特に限定されないが、例えばYAGレーザーや炭酸ガス(CO2)レーザー等が挙げられる。このようなレーザー光の繰り返し周波数は、好ましくは5000~10000Hzである。またパルス幅は、好ましくは5~50μ秒である。上記のレーザー光によれば、レーザー光の照射に伴い発生する熱により基材が変形することを抑制しつつ、所望の貫通孔を形成することができる。 The laser beam that can be used in the present invention is not particularly limited, and examples thereof include a YAG laser and a carbon dioxide (CO 2 ) laser. The repetition frequency of such laser light is preferably 5000 to 10,000 Hz. The pulse width is preferably 5 to 50 μsec. According to said laser beam, a desired through-hole can be formed, suppressing that a base material deform | transforms with the heat | fever generate | occur | produced with irradiation of a laser beam.
上記の方法により形成される貫通孔において、基材の一方の面(図1~3の面1a)における貫通孔の直径は、好ましくは300μm以下、より好ましくは250μm以下、さらに好ましくは50~200μmである。
基材の一方の面における貫通孔の直径が300μmを超えると、後述する導電性粘着剤層を基材上に形成した場合に、導電性粘着剤層が反対側の面に染み出すおそれや、平滑な導電性粘着剤層を形成することが困難になるおそれがある。
本発明において「基材の一方の面」とは、貫通孔を形成する際に針、パンチの刃やスピンドルが押し当てられる側の基材面あるいはレーザー光が入射する側の基材面をいう(図1~3における基材面1a)。また、基材の一方の面と反対側の基材面を「基材の他方の面」という(図1~3における基材面1b)。
In the through hole formed by the above method, the diameter of the through hole on one surface of the substrate (surface 1a in FIGS. 1 to 3) is preferably 300 μm or less, more preferably 250 μm or less, and even more preferably 50 to 200 μm. It is.
When the diameter of the through-hole on one surface of the substrate exceeds 300 μm, when the conductive adhesive layer described later is formed on the substrate, the conductive adhesive layer may ooze out on the opposite surface, It may be difficult to form a smooth conductive pressure-sensitive adhesive layer.
In the present invention, the “one surface of the substrate” means a substrate surface on the side to which a needle, a punch blade or a spindle are pressed or a substrate surface on which a laser beam is incident when forming a through hole. (Substrate surface 1a in FIGS. 1 to 3). Further, the substrate surface opposite to the one surface of the substrate is referred to as “the other surface of the substrate” (the
また、基材の一方の面における貫通孔の総面積は、基材の面積に対して好ましくは1~10%、より好ましくは2~10%、さらに好ましくは3~10%、特に好ましくは3~5%である。基材の面積に対する貫通孔の総面積を上記範囲とすることで、導通検査用テープの厚み方向(積層方向)における導通性を確保することが容易になると共に、平滑性も保たれ導通検査の精度を維持できる。 Further, the total area of the through holes on one surface of the substrate is preferably 1 to 10%, more preferably 2 to 10%, still more preferably 3 to 10%, particularly preferably 3 to the area of the substrate. ~ 5%. By making the total area of the through holes with respect to the area of the base material within the above range, it is easy to ensure conductivity in the thickness direction (stacking direction) of the tape for continuity testing, and smoothness is also maintained and continuity testing is performed. Accuracy can be maintained.
貫通孔は基材の全面に形成されていてもよく、また、被着体(導通検査するためのチップ等)が貼付される範囲にのみ形成されていてもよい。 The through-hole may be formed on the entire surface of the base material, or may be formed only in a range where an adherend (a chip or the like for continuity inspection) is attached.
また、図4に示す、貫通孔の周縁部における基材の厚み(t1)と、貫通孔の周縁部以外における基材の厚み(t2)との差(t1-t2)は、好ましくは60μm以下、より好ましくは30μm以下、さらに好ましくは5~15μmである。上記の方法により貫通孔を形成すると、基材の他方の面における貫通孔の周縁部に凹凸が形成されることがある。基材の他方の面に後述する導電性粘着剤層を形成した場合には、基材の他方の面に生じた凹凸を埋め込むことができ、平滑な導電性粘着剤層を得ることができるという効果があり、その際、差(t1-t2)を上記範囲とすることで、基材の他方の面の凹凸を小さくし、厚みの薄い導電性粘着剤層を形成しても該効果を得ることができる。導電性粘着剤層が平滑であると、導電性粘着剤層に貼付される被着体の傾きが抑制され、導電性粘着剤層に対する各被着体の接触面積が略一定になり、導通検査の精度が向上する。また導電性粘着剤層の厚みを薄くすることで導通検査用テープの製造コストを低減できる。
レーザー光を用いて貫通孔を形成することにより、差(t1-t2)を上記範囲にすることが容易である。なお、本発明における「貫通孔の周縁部における基材の厚み(t1)」とは、図4に示すように、貫通孔の周縁部において基材面から最大高さになる部分における基材の厚みである。また、「貫通孔の周縁部以外における基材の厚み(t2)」とは、実質的な基材の厚みである。
Also, the difference (t1−t2) between the thickness (t1) of the base material at the peripheral portion of the through hole and the thickness (t2) of the base material other than the peripheral portion of the through hole shown in FIG. 4 is preferably 60 μm or less. More preferably, it is 30 μm or less, and further preferably 5 to 15 μm. When the through hole is formed by the above method, irregularities may be formed in the peripheral portion of the through hole on the other surface of the substrate. When the conductive adhesive layer to be described later is formed on the other surface of the substrate, the unevenness generated on the other surface of the substrate can be embedded, and a smooth conductive adhesive layer can be obtained. In this case, by setting the difference (t1-t2) within the above range, the unevenness of the other surface of the substrate can be reduced, and the effect can be obtained even when a thin conductive adhesive layer is formed. be able to. When the conductive pressure-sensitive adhesive layer is smooth, the inclination of the adherend adhered to the conductive pressure-sensitive adhesive layer is suppressed, the contact area of each adherend to the conductive pressure-sensitive adhesive layer becomes substantially constant, and the continuity test Improves accuracy. Moreover, the manufacturing cost of the continuity test tape can be reduced by reducing the thickness of the conductive adhesive layer.
By forming the through hole using laser light, the difference (t1−t2) can be easily within the above range. In addition, as shown in FIG. 4, the “thickness (t1) of the base material at the peripheral portion of the through hole” in the present invention is the thickness of the base material in the portion at the maximum height from the base material surface at the peripheral portion of the through hole. It is thickness. Further, “the thickness of the base material other than the peripheral portion of the through hole (t2)” is a substantial thickness of the base material.
上記のような貫通孔が形成された基材の材質は特に限定されないが、例えば、PET(ポリエチレンテレフタレート)、PBT(ポリブチレンテレフタレート)、PEN(ポリエチレンナフタレート)、PPS(ポリフェニレンサルファイド)、PI(ポリイミド)、PEEK(ポリエーテルエーテルケトン)、アラミド、ポリ乳酸等の樹脂製の絶縁性フィルムが用いられる。これらの中でも、耐熱性、追従性、コスト等の観点からPET、PBT、PEN、PIを用いることが好ましい。 Although the material of the base material in which the above through holes are formed is not particularly limited, for example, PET (polyethylene terephthalate), PBT (polybutylene terephthalate), PEN (polyethylene naphthalate), PPS (polyphenylene sulfide), PI ( Polyimide), PEEK (polyetheretherketone), aramid, polylactic acid, or other resin insulating film is used. Among these, it is preferable to use PET, PBT, PEN, and PI from the viewpoints of heat resistance, followability, cost, and the like.
貫通孔の周縁部以外の実質的な基材の厚みは特に限定されず、好ましくは30~200μm、より好ましくは50~150μm、さらに好ましくは50~100μmである。基材の厚みが30μm未満であると、貫通孔をレーザー光で形成する場合に発生する熱により、基材が収縮し、皺が発生するおそれがある。また、基材の厚みが200μmを超えると、導通検査用テープの製造工程におけるハンドリング性が低下することがある。 The substantial thickness of the substrate other than the peripheral portion of the through hole is not particularly limited, and is preferably 30 to 200 μm, more preferably 50 to 150 μm, and still more preferably 50 to 100 μm. If the thickness of the substrate is less than 30 μm, the substrate shrinks due to heat generated when the through hole is formed by laser light, and wrinkles may occur. On the other hand, when the thickness of the substrate exceeds 200 μm, the handling property in the manufacturing process of the continuity test tape may be deteriorated.
(金属膜)
金属膜は、蒸着法やスパッタリング法等により形成される。蒸着法やスパッタリング法等により形成された金属膜は、基材の片面、好ましくは基材の両面を覆うと共に、貫通孔の周側面を被覆する。また、蒸着法やスパッタリング法等により金属膜を形成すると、金属膜を構成する金属が貫通孔に充填されることもある。その結果、本発明の導通検査用テープは積層方向(厚み方向)に導通性を有する。このような金属膜は特に限定されないが、例えばアルミニウム、金、銀、銅、プラチナ、ニッケル等を用いて形成される。なお、金属膜を基材の片面に形成する場合には、図2における基材面1a、つまり「基材の一方の面」に金属膜を形成することが好ましい。基材の一方の面に金属膜を形成することで、平滑な導通検査用テープを得ることができるため、導通検査の精度が向上する。
(Metal film)
The metal film is formed by vapor deposition or sputtering. The metal film formed by the vapor deposition method, the sputtering method, or the like covers one side of the substrate, preferably both sides of the substrate, and covers the peripheral side surface of the through hole. In addition, when a metal film is formed by a vapor deposition method, a sputtering method, or the like, the metal constituting the metal film may be filled in the through hole. As a result, the continuity test tape of the present invention has conductivity in the stacking direction (thickness direction). Such a metal film is not particularly limited, but is formed using, for example, aluminum, gold, silver, copper, platinum, nickel, or the like. In addition, when forming a metal film on one side of a base material, it is preferable to form a metal film on the base material surface 1a in FIG. 2, that is, “one side of the base material”. By forming a metal film on one surface of the base material, a smooth tape for continuity testing can be obtained, so that the accuracy of continuity testing is improved.
金属膜の厚みは、好ましくは60~1000nm、より好ましくは100~500nm、さらに好ましくは150~300nmである。金属膜の厚みを上記範囲とすることで、導通検査用テープにおける厚み方向の導通性に優れると共に、導通検査用テープを取り扱う際に金属膜のクラックを抑制できる。また、導通検査用テープの製造コストを低減できる。 The thickness of the metal film is preferably 60 to 1000 nm, more preferably 100 to 500 nm, still more preferably 150 to 300 nm. By setting the thickness of the metal film in the above range, the conductivity in the thickness direction of the continuity test tape is excellent, and cracks in the metal film can be suppressed when the continuity test tape is handled. Moreover, the manufacturing cost of the continuity test tape can be reduced.
〔導電性粘着剤層〕
導電性粘着剤層は、金属被覆基材の片面に積層される。導電性粘着剤層を設けることにより被着体を良好に保持できる。また、導電性粘着剤層を構成する粘着剤組成物が貫通孔に侵入し、金属膜と接触することで、厚み方向の導通性が向上する。なお、導電性粘着剤層を積層する面は特に限定されないが、図1における基材面1b側、つまり「基材の他方の面」側に導電性粘着剤層を積層することが好ましい。「基材の他方の面」側に導電性粘着剤層を積層した方が、図1における基材面1a側、つまり「基材の一方の面」側に導電性粘着剤層を積層する場合に比べて、貫通孔を形成する際に「基材の他方の面」に生じた凹凸が導通検査用テープのハンドリング性に及ぼす影響を小さくできる。また基材の他方の面側に、導電性粘着剤層を積層することで該凹凸を埋め込み、平滑な導通検査用テープを得ることができ、導通検査の精度を向上させることができると共に、導通検査用テープのハンドリング性を向上させることができる。また、導電性粘着剤層の厚みを薄くすることで、導通検査用テープの製造コストを低減できる。
[Conductive adhesive layer]
The conductive adhesive layer is laminated on one side of the metal-coated substrate. An adherend can be favorably held by providing a conductive pressure-sensitive adhesive layer. Moreover, the adhesive composition which comprises a conductive adhesive layer penetrate | invades into a through-hole, and the electroconductivity of a thickness direction improves because it contacts a metal film. The surface on which the conductive pressure-sensitive adhesive layer is laminated is not particularly limited, but it is preferable to laminate the conductive pressure-sensitive adhesive layer on the
導電性粘着剤層を構成する粘着剤の種類は特に限定されず、従来より公知の種々の粘着剤により形成され得る。このような粘着剤としては、例えばゴム系、アクリル系、シリコーン系、ポリエステル系、ウレタン系、ポリビニルエーテル等の粘着剤が用いられる。また、エネルギー線の照射により硬化して再剥離性となるエネルギー線硬化型粘着剤や、加熱発泡型、水膨潤型の粘着剤も用いることができる。 The type of the pressure-sensitive adhesive that constitutes the conductive pressure-sensitive adhesive layer is not particularly limited, and may be formed of various conventionally known pressure-sensitive adhesives. As such an adhesive, for example, an adhesive such as rubber, acrylic, silicone, polyester, urethane, or polyvinyl ether is used. In addition, an energy ray curable pressure-sensitive adhesive that is cured by irradiation with energy rays and becomes removable, a heat-foaming type, or a water swelling type pressure-sensitive adhesive can also be used.
上記の粘着剤の中でも、その汎用性と取扱性の観点から、アクリル系、ポリエステル系、ウレタン系の粘着剤が好ましく、アクリル系粘着剤が特に好ましい。 Among the above-mentioned pressure-sensitive adhesives, acrylic, polyester-based, and urethane-based pressure-sensitive adhesives are preferable, and acrylic pressure-sensitive adhesives are particularly preferable from the viewpoint of versatility and handleability.
アクリル系粘着剤としては、主成分として、例えば(メタ)アクリル酸エステル単独重合体、(メタ)アクリル酸エステル単位を2種以上含む共重合体及び(メタ)アクリル酸エステルと他の官能性単量体との共重合体の中から選ばれた少なくとも1種を含有するものが用いられる。該(メタ)アクリル酸エステルとしては、例えば(メタ)アクリル酸ブチル、(メタ)アクリル酸ペンチル、(メタ)アクリル酸ヘキシル、(メタ)アクリル酸ヘプチル、(メタ)アクリル酸オクチル、(メタ)アクリル酸ノニル、(メタ)アクリル酸デシルなどが挙げられる。また、官能性単量体としては、例えば(メタ)アクリル酸ヒドロキシエチル、 (メタ)アクリル酸ヒドロキシプロピルなどのヒドロキシル基含有単量体、 (メタ)アクリル酸などのカルボン酸基含有単量体、(メタ)アクリルアミド、ジメチル(メタ)アクリルアミド、N-ビニルモルフォリン、N-アリルモルフォリン、N-(メタ)アクリロイルモルフォリンなどが挙げられる。 Acrylic pressure-sensitive adhesives include, for example, (meth) acrylic acid ester homopolymers, copolymers containing two or more (meth) acrylic acid ester units, and (meth) acrylic acid esters and other functional monomers. What contains at least 1 sort (s) chosen from the copolymer with a monomer is used. Examples of the (meth) acrylate ester include butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, and (meth) acrylic. Acid nonyl, decyl (meth) acrylate, and the like can be mentioned. Examples of the functional monomer include hydroxyl group-containing monomers such as hydroxyethyl (meth) acrylate and hydroxypropyl (meth) acrylate, carboxylic acid group-containing monomers such as (meth) acrylic acid, (Meth) acrylamide, dimethyl (meth) acrylamide, N-vinylmorpholine, N-allylmorpholine, N- (meth) acryloylmorpholine and the like can be mentioned.
官能性単量体成分の一つとして、窒素原子と酸素原子をそれぞれ有する6員環の複素環を有するエチレン性不飽和単量体であるN-ビニルモルフォリン、N-アリルモルフォリン、N-(メタ)アクリロイルモルフォリン等を用いると、これが後で述べる架橋剤との反応において架橋促進剤としての性能を発揮するので好ましい。これらの中でも、特に他のモノマー成分との共重合性が良好であるという観点から、N-(メタ)アクリロイルモルフォリンが好ましく用いられる。 As one of the functional monomer components, N-vinyl morpholine, N-allyl morpholine, which is an ethylenically unsaturated monomer having a 6-membered heterocyclic ring each having a nitrogen atom and an oxygen atom, N- Use of (meth) acryloylmorpholine or the like is preferable because it exhibits performance as a crosslinking accelerator in the reaction with a crosslinking agent described later. Among these, N- (meth) acryloylmorpholine is preferably used from the viewpoint of good copolymerizability with other monomer components.
導電検査用テープは、半導体チップ等の被着体に適用され、特に導電性の被着体に貼付される。したがって、導電性被着体表面の酸化(腐食)を抑制する観点からは、酸基を含まない粘着剤を用いることが好ましく、たとえばカルボン酸基含有単量体を用いない粘着剤が好ましい。一方、後述する導電性粒子の分散性の観点からは、酸基を含む粘着剤を用いることが好ましい。 The conductive test tape is applied to an adherend such as a semiconductor chip, and is particularly affixed to a conductive adherend. Therefore, from the viewpoint of suppressing oxidation (corrosion) on the surface of the conductive adherend, it is preferable to use a pressure-sensitive adhesive that does not contain an acid group. For example, a pressure-sensitive adhesive that does not use a carboxylic acid group-containing monomer is preferable. On the other hand, from the viewpoint of the dispersibility of the conductive particles described later, it is preferable to use an adhesive containing an acid group.
また、上記粘着剤は、イソシアネート系架橋剤、エポキシ系架橋剤、アジリジン系架橋剤、キレート系架橋剤などの架橋剤により架橋されていてもよい。イソシアネート系架橋剤としてはトリレンジイソシアネート(TDI)、ヘキサメチレンジイソシアネート(HMDI)、イソホロンジイソシアネート(IPDI)、キシレンジイソシアネート(XDI)、水素化トリレンジイソシアネート、ジフェニルメタンジイソシアネート、トリメチロールプロパン変性TDI等が用いられる。エポキシ系架橋剤としてはエチレングリコールジグリシジルエーテル、1,6-ヘキサンジオールジグリシジルエーテル、トリメチロールプロパンジグリシジルエーテル、ジグリシジルアニリン、ジグリシジルアミン等が用いられる。アジリジン系架橋剤としては2,2-ビスヒドロキシメチルブタノール-トリス [3-(1-アジリジニル)プロネート]、4,4-ビス(エチレンイミノカルボキシアミノ)ジフェニルメタン、トリス-2,4,6-(1-アジリジニル)-1,3,5-トリアジン、トリス〔1-(2-メチル)アジリジニル〕フォスフィンオキシド、ヘキサ〔1-(2-メチル)-アジリジニル〕トリフォスファトリアジン等が用いられる。キレート系架橋剤としてはアルミニウムキレート、チタンキレート等が用いられる。架橋剤量を適宜調整することで、種々の被着体に対し必要な粘着物性を発現させることができる。架橋剤は単独の使用だけでなく、必要に応じて2種類以上併用してもよい。 The pressure-sensitive adhesive may be crosslinked with a crosslinking agent such as an isocyanate crosslinking agent, an epoxy crosslinking agent, an aziridine crosslinking agent, or a chelate crosslinking agent. As the isocyanate-based crosslinking agent, tolylene diisocyanate (TDI), hexamethylene diisocyanate (HMDI), isophorone diisocyanate (IPDI), xylene diisocyanate (XDI), hydrogenated tolylene diisocyanate, diphenylmethane diisocyanate, trimethylolpropane-modified TDI, or the like is used. . As the epoxy-based crosslinking agent, ethylene glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, trimethylolpropane diglycidyl ether, diglycidylaniline, diglycidylamine and the like are used. Examples of the aziridine-based crosslinking agent include 2,2-bishydroxymethylbutanol-tris ト リ [3- (1-aziridinyl) pronate], 4,4-bis (ethyleneiminocarboxyamino) diphenylmethane, tris-2,4,6- (1 -Aziridinyl) -1,3,5-triazine, tris [1- (2-methyl) aziridinyl] phosphine oxide, hexa [1- (2-methyl) -aziridinyl] triphosphatriazine and the like are used. As the chelate-based crosslinking agent, aluminum chelate, titanium chelate or the like is used. By appropriately adjusting the amount of the crosslinking agent, it is possible to develop the necessary adhesive properties for various adherends. A crosslinking agent may be used not only alone but also in combination of two or more as required.
導電性粘着剤層を構成する粘着剤組成物には、上記粘着剤の他に、導電性粒子が配合されることが好ましい。導電性粘着剤層に導電性粒子を配合することで、粘着剤層に導電性を付与できる。 In the pressure-sensitive adhesive composition constituting the conductive pressure-sensitive adhesive layer, conductive particles are preferably blended in addition to the pressure-sensitive adhesive. By adding conductive particles to the conductive pressure-sensitive adhesive layer, conductivity can be imparted to the pressure-sensitive adhesive layer.
本発明で使用する導電性粒子としては、ファーネスブラックやアセチレンブラック等のカーボンブラックやグラファイト、あるいは炭素繊維、導電性ウィスカー、導電性セラミック粉もしくはニッケル、銅、金、銀、鉄、クロム等の金属粒子のうちの1種以上のものが用いられる。 The conductive particles used in the present invention include carbon black and graphite such as furnace black and acetylene black, or metal such as carbon fiber, conductive whisker, conductive ceramic powder or nickel, copper, gold, silver, iron and chromium. One or more of the particles are used.
また、導電性粘着剤層を形成する粘着剤組成物には、通常の粘着シート用の粘着剤に一般的に含まれている添加剤、例えば、粘着付与剤、紫外線吸収剤、酸化防止剤、又は着色剤等が必要に応じ含まれていてもよい。 Further, the pressure-sensitive adhesive composition forming the conductive pressure-sensitive adhesive layer has additives generally contained in pressure-sensitive adhesives for ordinary pressure-sensitive adhesive sheets, such as tackifiers, ultraviolet absorbers, antioxidants, Or a coloring agent etc. may be contained as needed.
上述のように構成された本発明の導電検査用テープを被着体に貼付すると、導電性粘着剤層が被着体と接触し、被着体と導電検査用テープとが電気的に接続する。したがって、積層方向(厚み方向)および面方向に導通することができるため、導通検査を簡便に行える。 When the conductive test tape of the present invention configured as described above is applied to an adherend, the conductive adhesive layer comes into contact with the adherend, and the adherend and the conductive test tape are electrically connected. . Therefore, since it can conduct | electrically_connect in a lamination direction (thickness direction) and a surface direction, a conduction inspection can be performed simply.
導電性粘着剤層の厚みは特に限定されず、粘着力や貫通孔の周縁部における基材の厚み(t1)と、貫通孔の周縁部以外における基材の厚み(t2)との差(t1-t2)に応じて設定されることが好ましい。導電性粘着剤層の厚みは、好ましくは10~80μm、より好ましくは15~50μm、さらに好ましくは20~35μmである。導電性粘着剤層の厚みを上記範囲とすることで、差(t1-t2)を導電性粘着剤層により埋め込むことができるため、金属被覆基材上に厚みの薄い粘着剤層を形成しても平滑な粘着剤層を得ることができる。 The thickness of the conductive pressure-sensitive adhesive layer is not particularly limited, and the difference (t1) between the adhesive strength and the thickness (t1) of the base material at the peripheral portion of the through hole and the thickness (t2) of the base material other than the peripheral portion of the through hole. It is preferably set according to -t2). The thickness of the conductive pressure-sensitive adhesive layer is preferably 10 to 80 μm, more preferably 15 to 50 μm, and still more preferably 20 to 35 μm. By setting the thickness of the conductive pressure-sensitive adhesive layer within the above range, the difference (t1-t2) can be embedded by the conductive pressure-sensitive adhesive layer. Therefore, a thin pressure-sensitive adhesive layer is formed on the metal-coated substrate. Can also obtain a smooth pressure-sensitive adhesive layer.
また、導電性粘着剤層は、被着体に対する適度な再剥離性を有することが好ましく、被着体に対する粘着力は、好ましくは1000~7000mN/25mm、より好ましくは2000~6000mN/25mm、さらに好ましくは2500~5000mN/25mmである。導電性粘着剤層の粘着力が上記範囲であると、被着体の保持を良好に行えると共に、検査後における被着体の剥離が容易である。粘着力は、JIS Z 0237;2009に準拠して、被着体(SUS)に貼付して30分経過後における導通検査用テープの23℃、相対湿度50%での180°引き剥がし法による粘着力である。 The conductive pressure-sensitive adhesive layer preferably has an appropriate removability to the adherend, and the adhesive strength to the adherend is preferably 1000 to 7000 mN / 25 mm, more preferably 2000 to 6000 mN / 25 mm, Preferably, it is 2500 to 5000 mN / 25 mm. When the adhesive strength of the conductive pressure-sensitive adhesive layer is in the above range, the adherend can be held well and the adherend can be easily peeled after the inspection. In accordance with JIS Z 0237; 2009, the adhesive strength is an adhesion by a 180 ° peeling method at 23 ° C. and 50% relative humidity of a continuity test tape after being attached to an adherend (SUS) after 30 minutes. It is power.
また、本発明の導通検査用テープにおいては、その使用前に導電性粘着剤層を保護するために、粘着剤層の表面に剥離シートが積層されていてもよい。剥離シートは、後述する本発明の導通検査用テープの製造時に用いられる剥離シートを粘着剤層から剥離することなく、そのまま使用してもよい。 In the continuity test tape of the present invention, a release sheet may be laminated on the surface of the pressure-sensitive adhesive layer in order to protect the conductive pressure-sensitive adhesive layer before use. You may use a peeling sheet as it is, without peeling the peeling sheet used at the time of manufacture of the tape for a continuity test of this invention mentioned later from an adhesive layer.
剥離シートにおける剥離基材としては、特に制限はなく、従来剥離シートの基材として知られている各種の基材の中から、適宜選択して用いることができる。 そのような剥離基材としては、例えばPET、PBT、PENなどのポリエステルフィルム、ポリプロピレンやポリメチルペンテンなどのポリオレフィンフィルム、ポリカーボネートフィルム、酢酸セルロース系フィルムなどのプラスチックフィルムや、これらを含む積層シートなどが挙げられる。この剥離基材の厚さとしては特に制限はないが、通常10~150μmが好ましい。 There is no restriction | limiting in particular as a peeling base material in a peeling sheet, It can select suitably from various base materials conventionally known as a base material of a peeling sheet. Examples of such release substrates include polyester films such as PET, PBT, and PEN, polyolefin films such as polypropylene and polymethylpentene, plastic films such as polycarbonate films and cellulose acetate films, and laminated sheets containing these. Can be mentioned. The thickness of the release substrate is not particularly limited, but is usually preferably 10 to 150 μm.
剥離シートの剥離基材としてプラスチックフィルムを用いる場合には、プラスチックフィルムと剥離剤層との密着性を向上させるなどの目的で、所望により、 該プラスチックフィルムの剥離剤層が設けられる側の面に、酸化法などの物理的又は化学的表面処理を施すことができる。上記酸化法としては、例えばコロナ放電処理、クロム酸処理、火炎処理、熱風処理、オゾン・紫外線照射処理などが挙げられる。これらの表面処理法は、剥離基材の種類に応じて適宜選ばれるが、一般にはコロナ放電処理法が、効果及び操作性などの面から、好ましく用いられる。また、プライマー処理を施すこともできる。 When using a plastic film as the release substrate of the release sheet, if desired, for the purpose of improving the adhesion between the plastic film and the release agent layer, on the side of the plastic film on which the release agent layer is provided, if desired. Further, a physical or chemical surface treatment such as an oxidation method can be performed. Examples of the oxidation method include corona discharge treatment, chromic acid treatment, flame treatment, hot air treatment, and ozone / ultraviolet irradiation treatment. These surface treatment methods are appropriately selected depending on the type of the release substrate, but in general, the corona discharge treatment method is preferably used from the viewpoints of effects and operability. Moreover, primer treatment can also be performed.
剥離シートにおける剥離剤層を形成するための剥離剤としてはシリコーン樹脂、長鎖アルキル樹脂、アルキド樹脂、フッ素樹脂、ポリブタジエンゴム、ブチルゴム、スチレン-ブタジエン共重合体、ポリイソプレンゴム、エチレンポリプロピレン共重合体などのゴム系エラストマーなどが挙げられる。 The release agent for forming the release agent layer in the release sheet is silicone resin, long chain alkyl resin, alkyd resin, fluororesin, polybutadiene rubber, butyl rubber, styrene-butadiene copolymer, polyisoprene rubber, ethylene polypropylene copolymer. And rubber-based elastomers.
剥離剤の剥離基材上への塗工は、例えばバーコート法、リバースロールコート法、ナイフコート法、ロールナイフコート法、グラビアコート法、エアドクターコート法、ドクターブレードコート法など、従来公知の塗工方法により行なうことができる。剥離剤層の厚さは特に制限はないが、通常0.01~5μmが好ましい。 Coating of the release agent on the release substrate is conventionally known, for example, bar coating method, reverse roll coating method, knife coating method, roll knife coating method, gravure coating method, air doctor coating method, doctor blade coating method, etc. It can be performed by a coating method. The thickness of the release agent layer is not particularly limited, but is usually preferably 0.01 to 5 μm.
次に、本発明に係る導通検査用テープの製造方法について説明する。 Next, a method for manufacturing a continuity test tape according to the present invention will be described.
本発明に係る第1の製造方法では、まず、複数の貫通孔が設けられた基材を用意する。次に、基材の表面に、蒸着法やスパッタリング法等を用いて金属膜を形成し、金属被覆基材を得る。金属膜は、製造の容易性及び金属膜の均一性の観点から、蒸着法により形成されることが好ましい。その後、導電性粘着剤層を金属被覆基材の表面に積層する。粘着剤層を積層する方法は、上記粘着剤を、必要に応じ適当な溶剤で希釈して粘着剤組成物とし、剥離シート上に所定の乾燥膜厚になるように塗布、乾燥して粘着剤層を形成し、上記金属被覆基材の表面に転写しても構わないし、上記金属被覆基材の表面に粘着剤組成物を直接塗布、乾燥して粘着剤層を形成しても構わない。このようにして本発明に係る導通検査用テープが得られる。 In the first manufacturing method according to the present invention, first, a base material provided with a plurality of through holes is prepared. Next, a metal film is formed on the surface of the base material using a vapor deposition method, a sputtering method, or the like to obtain a metal-coated base material. The metal film is preferably formed by a vapor deposition method from the viewpoint of ease of manufacture and uniformity of the metal film. Thereafter, a conductive pressure-sensitive adhesive layer is laminated on the surface of the metal-coated substrate. The method of laminating the pressure-sensitive adhesive layer is as follows. The pressure-sensitive adhesive is diluted with an appropriate solvent as necessary to obtain a pressure-sensitive adhesive composition, and applied onto the release sheet and dried to give a predetermined dry film thickness. A layer may be formed and transferred to the surface of the metal-coated substrate, or the pressure-sensitive adhesive composition may be directly applied to the surface of the metal-coated substrate and dried to form a pressure-sensitive adhesive layer. In this way, the continuity test tape according to the present invention is obtained.
また、本発明に係る第2の製造方法では、まず、複数の貫通孔が設けられた基材の表面に導電性粘着剤層を積層する。粘着剤層の積層方法は上記と同様である。その後、基材の片面(粘着剤層が積層された面と反対の面)に、蒸着法やスパッタリング法等を用いて金属膜を形成し、金属被覆基材を得る。このようにして本発明に係る導通検査用テープを得ることもできる。 Moreover, in the second manufacturing method according to the present invention, first, a conductive pressure-sensitive adhesive layer is laminated on the surface of a base material provided with a plurality of through holes. The method for laminating the pressure-sensitive adhesive layer is the same as described above. Thereafter, a metal film is formed on one surface of the substrate (the surface opposite to the surface on which the pressure-sensitive adhesive layer is laminated) using a vapor deposition method, a sputtering method, or the like to obtain a metal-coated substrate. Thus, the tape for continuity testing according to the present invention can be obtained.
本発明に係る導通検査用テープは、積層方向及び面方向に導通性を有し、半導体チップ等の導通性を簡便に検査することができる。 The tape for continuity testing according to the present invention has continuity in the laminating direction and the surface direction, and can easily inspect the continuity of a semiconductor chip or the like.
次に、本発明に係る導通検査用テープを用いた導通検査方法について説明する。 Next, a continuity test method using the continuity test tape according to the present invention will be described.
本発明の導通検査方法は、本発明の導通検査用テープの導電性粘着剤層に被着体を貼付し、その後、被着体と導通検査用テープの導電性粘着剤層もしくは金属膜(導電性粘着剤層と反対の面)とにテスターのプローブを接触させて被着体の導通性を検査する。本発明の導通検査用テープは積層方向に導通性を有するため、一方のテスターを被着体に、他方のテスターを金属膜に接触させて積層方向に導通性を検査することが好ましく、他方のテスターを被着体が貼付された範囲の金属膜に接触させて積層方向(ほぼ垂直方向)に導通性を検査することがより好ましい。積層方向に導通性を検査する方法によれば、テスター間の距離をほぼ一定に保つことが容易であり、導通検査の精度に優れると共に、簡便に導通検査を行うことができる。 In the continuity test method of the present invention, the adherend is affixed to the conductive adhesive layer of the continuity test tape of the present invention, and then the conductive adhesive layer or metal film (conductivity) of the adherend and the continuity test tape. A tester probe is brought into contact with the surface opposite to the adhesive layer) to inspect the conductivity of the adherend. Since the tape for continuity testing of the present invention has conductivity in the laminating direction, it is preferable to inspect the conductivity in the laminating direction by bringing one tester into contact with the adherend and the other tester in contact with the metal film. More preferably, the tester is brought into contact with the metal film in a range where the adherend is adhered and the conductivity is inspected in the stacking direction (substantially vertical direction). According to the method for inspecting continuity in the stacking direction, it is easy to keep the distance between the testers substantially constant, and the continuity test can be performed easily while being excellent in accuracy of the continuity test.
以下、本発明を実施例により説明するが、本発明はこれらの実施例に限定されるものではない。以下の実施例および比較例における「貫通孔の直径」、「基材面積に対する貫通孔の総面積の割合」、「貫通孔の周縁部における基材の厚み(t1)と、貫通孔の周縁部以外における基材の厚み(t2)との差(t1-t2)」、「ハンドリング性」、「導通検査」、「チップの傾き」、「粘着力」及び「タック」は下記のように評価した。 Hereinafter, the present invention will be described by way of examples, but the present invention is not limited to these examples. “Diameter of through-hole”, “ratio of total area of through-hole to base-material area”, “thickness (t1) of base material in peripheral portion of through-hole, and peripheral portion of through-hole in examples and comparative examples below The difference (t1−t2) from the base material thickness (t2) ”,“ handling property ”,“ continuity test ”,“ chip tilt ”,“ adhesive strength ”and“ tack ”in the cases other than the above were evaluated as follows. .
<貫通孔の直径>
貫通孔の直径は、走査型電子顕微鏡(株式会社キーエンス製 走査型電子顕微鏡(SEM) VE-9800)を使用して表面を観察することにより測定した。
<Diameter of through hole>
The diameter of the through hole was measured by observing the surface using a scanning electron microscope (Scanning Electron Microscope (SEM) VE-9800 manufactured by Keyence Corporation).
<基材面積に対する貫通孔の総面積の割合>
基材に形成された貫通孔の数を数え、上記により測定された基材の一方の面における貫通孔の直径から、貫通孔の総面積を算出し、基材面積に対する貫通孔の総面積の割合を求めた。
<Ratio of the total area of the through holes to the substrate area>
Count the number of through-holes formed in the substrate, and calculate the total area of the through-holes from the diameter of the through-holes on one side of the substrate measured as described above. The percentage was determined.
<貫通孔の周縁部における基材の厚み(t1)と、貫通孔の周縁部以外における基材の厚み(t2)との差(t1-t2)>
貫通孔の形成された基材について、レーザー顕微鏡(株式会社キーエンス製 VHS-1000)を用いて断面観察を行い、貫通孔の周縁部における基材の厚み(t1)と、貫通孔の周縁部以外における基材の厚み(t2)とを測定した。なお、図4に示すように、貫通孔の周縁部における基材の厚み(t1)は、貫通孔の周縁部において基材面から最大高さになる部分における基材の厚みとした。また、貫通孔の周縁部以外における基材の厚み(t2)は、実質的な基材の厚みと同一である。
<Difference (t1−t2) between the thickness (t1) of the base material at the peripheral portion of the through hole and the thickness (t2) of the base material other than the peripheral portion of the through hole>
The base material in which the through hole is formed is observed with a laser microscope (VHS-1000 manufactured by Keyence Corporation), and the thickness (t1) of the base material at the peripheral part of the through hole and other than the peripheral part of the through hole The thickness (t2) of the base material was measured. In addition, as shown in FIG. 4, the thickness (t1) of the base material in the peripheral portion of the through hole was the thickness of the base material in the portion having the maximum height from the base material surface in the peripheral portion of the through hole. Moreover, the thickness (t2) of the base material other than the peripheral edge portion of the through hole is substantially the same as the thickness of the base material.
<ハンドリング性>
15cm四方の導通検査用テープを直径5cmのポリエチレン製の棒に巻きつけたあと折り目及びカールの有無を確認した。導通検査用テープに折り目及びカールが発生しない場合を「良好」、折り目又はカールが発生した場合を「不良」と評価した。
<Handling>
A 15 cm square continuity test tape was wrapped around a 5 cm diameter polyethylene rod and then checked for creases and curls. The case where no crease or curl occurred in the continuity test tape was evaluated as “good”, and the case where a crease or curl occurred was evaluated as “bad”.
<導通検査>
電極の形成されたチップを導通検査用テープの導電性粘着剤層に貼付した。その後、チップ上の電極と、導通検査用テープの金属膜(導電性粘着剤層と反対の面)とに、テスター(三和電気計器株式会社製 KIT-60)のプローブを接触させることで導通検査を行った。導電性粘着剤層に貼付されたチップ100個に対して導通検査を行い、導通が取れたチップの数が100個であった場合を「A」、70~99個であった場合を「B」、0~69個であった場合を「C」と評価した。
<Continuity test>
The chip on which the electrode was formed was affixed to the conductive adhesive layer of the continuity test tape. After that, the probe on the tester (KIT-60, manufactured by Sanwa Denki Keiki Co., Ltd.) is brought into contact with the electrode on the chip and the metal film of the tape for continuity testing (the surface opposite to the conductive adhesive layer). Inspected. A continuity test is performed on 100 chips attached to the conductive adhesive layer, and “A” indicates that 100 chips are connected, and “B” indicates that the number of chips is 70 to 99. The case of 0 to 69 was evaluated as “C”.
<チップの傾き>
半導体チップ(1mm×1mm、厚み200μm)を導電性粘着剤層に貼付し、レーザー顕微鏡(株式会社キーエンス製 VHS-1000)を用いてチップと粘着剤層との角度(図3に示す角度α)を測定した。
<Tilt tilt>
A semiconductor chip (1 mm × 1 mm, thickness 200 μm) is attached to the conductive adhesive layer, and the angle between the chip and the adhesive layer (angle α shown in FIG. 3) using a laser microscope (VHS-1000 manufactured by Keyence Corporation). Was measured.
<粘着力>
JIS Z 0237;2009に準拠して、被着体(SUS)に貼付して30分経過後における導通検査用テープの23℃、相対湿度50%での180°引き剥がし法による粘着力を測定した。
<Adhesive strength>
In accordance with JIS Z 0237; 2009, the adhesive strength was measured by a 180 ° peeling method at 23 ° C. and 50% relative humidity of a continuity test tape after 30 minutes after being attached to an adherend (SUS). .
<タック>
指で粘着剤層面を触り、タックの有無を確認した。
<Tack>
The pressure-sensitive adhesive layer surface was touched with a finger to confirm the presence or absence of tack.
(実施例1)
〔基材の作製〕
厚み100μmのPETフィルムに、CO2レーザー(パナソニック溶接システム株式会社製CO2レーザー加工機「YB-HCS03」 )を用いて2ショットバースト加工(繰り返し周波数:10000Hz、パルス幅:25μ秒(1ショット目)/50μ秒(2ショット目))で貫通孔を形成し、基材を得た。なお、基材面積に対する貫通孔の総面積の割合は3%であった。
(Example 1)
[Preparation of substrate]
Two shot burst processing (repetition frequency: 10000 Hz, pulse width: 25 μs) using a CO 2 laser (CO 2 laser processing machine “YB-HCS03” manufactured by Panasonic Welding Systems Co., Ltd.) on a 100 μm thick PET film ) / 50 μsec (second shot)), through-holes were formed to obtain a substrate. The ratio of the total area of the through holes to the substrate area was 3%.
〔金属膜の形成〕
上記で得られた基材の両面に、蒸着法(蒸着速度:2Å/秒、成膜厚み:200nm、抵抗加熱条件:40A、2.0V)を用いて、アルミニウムを膜厚200nmになるように形成し、金属被覆基材を得た。
[Formation of metal film]
By using a vapor deposition method (deposition rate: 2 Å / sec, film thickness: 200 nm, resistance heating conditions: 40 A, 2.0 V) on both surfaces of the base material obtained above, aluminum is formed to a film thickness of 200 nm. And a metal coated substrate was obtained.
〔粘着剤組成物の作製〕
アクリル系粘着剤(ブチルアクリレート/アクリル酸=95/5(質量比)、重量平均分子量=60万)100質量部に対し、導電性粒子(ライオン製 カーボンブラック)12質量部及びイソシアネート系架橋剤(東洋インキ株式会社製 BHS-8515)0.1質量部を溶媒中で混合し、粘着剤組成物を得た。なお、重量平均分子量は、市販の分子量測定機(本体製品名「HLC-8220GPC」、東ソー株式会社製;カラム製品名「TSKGel SuperHZM-M」、東ソー株式会社製;展開溶媒 テトラヒドロフラン)を用いて得た値である(以下、同様。)。また、質量部数は溶媒希釈された荷姿のものであっても、すべて固形分換算の値である(以下、同様。)。
[Preparation of pressure-sensitive adhesive composition]
For 100 parts by mass of acrylic adhesive (butyl acrylate / acrylic acid = 95/5 (mass ratio), weight average molecular weight = 600,000), 12 parts by mass of conductive particles (Lion's carbon black) and isocyanate crosslinking agent ( 0.1 part by mass of Toyo Ink Co., Ltd. BHS-8515) was mixed in a solvent to obtain an adhesive composition. The weight average molecular weight is obtained using a commercially available molecular weight measuring instrument (main product name “HLC-8220GPC”, manufactured by Tosoh Corporation; column product name “TSKGel SuperHZM-M”, manufactured by Tosoh Corporation; developing solvent tetrahydrofuran). (The same applies hereinafter). Moreover, even if a mass part is a thing of the packing form diluted with a solvent, all are values of solid content conversion (hereinafter, the same).
〔導通検査用テープの作製〕
剥離シート(リンテック社製 SP-PET381031LK)に、上記粘着剤組成物を、乾燥後の厚みが35μmとなるように塗布・乾燥(乾燥条件:100℃、1分間)して、剥離シート上に形成された導電性粘着剤層を得た。次いで、導電性粘着剤層と上記の金属被覆基材とを貼り合わせて、導通検査用テープを得た。剥離シートを除去して各評価を行った。結果を表1に示す。なお、導電性粘着剤層は、レーザー光が入射する側の基材面と反対側(基材の他方の面側)に積層した。
[Preparation of tape for continuity test]
The above pressure-sensitive adhesive composition is applied to a release sheet (SP-PET 381031LK manufactured by Lintec Corporation) so that the thickness after drying is 35 μm (drying conditions: 100 ° C., 1 minute), and formed on the release sheet. Thus obtained conductive adhesive layer was obtained. Next, the conductive pressure-sensitive adhesive layer and the metal-coated substrate were bonded together to obtain a continuity test tape. Each evaluation was performed by removing the release sheet. The results are shown in Table 1. In addition, the conductive adhesive layer was laminated | stacked on the opposite side (the other surface side of a base material) of the base material surface by which the laser beam enters.
(実施例2)
粘着剤組成物の作製において、導電性粒子の添加量を15質量部としたこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表1に示す。
(Example 2)
In the preparation of the pressure-sensitive adhesive composition, a continuity test tape was obtained in the same manner as in Example 1 except that the amount of conductive particles added was 15 parts by mass. The results are shown in Table 1.
(実施例3)
粘着剤組成物の作製において、導電性粒子としてニッケル金属粒子(ヴァーレ・ジャパン株式会社製 HCA-1)を用い、その添加量を75質量部としたこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表1に示す。
(Example 3)
In the production of the pressure-sensitive adhesive composition, the same electrical conductivity as in Example 1 was used except that nickel metal particles (HCA-1 manufactured by Vale Japan Co., Ltd.) were used as the conductive particles and the addition amount was 75 parts by mass. A test tape was obtained. The results are shown in Table 1.
(実施例4)
粘着剤組成物の作製において、導電性粒子としてニッケル金属粒子(Novamet Specialty Products Corporation製 #255)を用い、その添加量を60質量部としたこと以外は、実施例1と同様にして導電検査用テープを得た。結果を表1に示す。
(Example 4)
In the production of the pressure-sensitive adhesive composition, the same as in Example 1 except that nickel metal particles (# 255 manufactured by Novamet Specialty Products Corporation) were used as the conductive particles and the addition amount was 60 parts by mass. I got a tape. The results are shown in Table 1.
(実施例5)
基材の作製において、形成される貫通孔の数を増やし、基材面積に対する貫通孔の総面積の割合を8%としたこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表1に示す。
(Example 5)
In the production of the base material, a continuity test tape was obtained in the same manner as in Example 1 except that the number of through holes formed was increased and the ratio of the total area of the through holes to the base material area was 8%. . The results are shown in Table 1.
(実施例6)
金属膜の形成において、アルミニウムの膜厚を60nmとしたこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表1に示す。
(Example 6)
In the formation of the metal film, a continuity test tape was obtained in the same manner as in Example 1 except that the film thickness of aluminum was 60 nm. The results are shown in Table 1.
(実施例7)
金属膜の形成において、アルミニウムの膜厚を900nmとしたこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表1に示す。
(Example 7)
In the formation of the metal film, a continuity test tape was obtained in the same manner as in Example 1 except that the film thickness of aluminum was 900 nm. The results are shown in Table 1.
(実施例8)
基材の作製において、厚み100μmのPETフィルムに、ニードル(絹針5号)を用いて貫通孔を形成し基材を得たこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表1に示す。
(Example 8)
In the production of the base material, a continuity test tape was obtained in the same manner as in Example 1 except that a base material was obtained by forming a through hole in a 100 μm thick PET film using a needle (silk needle No. 5). It was. The results are shown in Table 1.
(実施例9)
金属膜の形成において、アルミニウムの膜厚を500nmとしたこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表1に示す。
Example 9
In the formation of the metal film, a continuity test tape was obtained in the same manner as in Example 1 except that the film thickness of aluminum was 500 nm. The results are shown in Table 1.
(実施例10)
基材の作製において、形成される貫通孔の数を増やし、基材面積に対する貫通孔の総面積の割合を5%としたこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表1に示す。
(Example 10)
In the production of the base material, a continuity test tape was obtained in the same manner as in Example 1 except that the number of through holes formed was increased and the ratio of the total area of the through holes to the base material area was 5%. . The results are shown in Table 1.
(実施例11)
基材の作製において、形成される貫通孔の数を増やし、基材面積に対する貫通孔の総面積の割合を10%としたこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表1に示す。
(Example 11)
In the production of the base material, a continuity test tape was obtained in the same manner as in Example 1 except that the number of through holes formed was increased and the ratio of the total area of the through holes to the base material area was 10%. . The results are shown in Table 1.
(実施例12)
基材の作製において、形成される貫通孔の直径を変化させたこと以外は、実施例8と同様にして導通検査用テープを得た。結果を表1に示す。
Example 12
A continuity test tape was obtained in the same manner as in Example 8 except that the diameter of the through-hole formed was changed in the production of the substrate. The results are shown in Table 1.
(比較例1)
基材として、貫通孔を設けていない厚み35μmの圧延銅箔を用いたこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表2に示す。
(Comparative Example 1)
A continuity test tape was obtained in the same manner as in Example 1 except that a rolled copper foil having a thickness of 35 μm without a through hole was used as the substrate. The results are shown in Table 2.
(比較例2)
基材として、貫通孔を設けていない厚み50μmのアルミニウム箔を用いたこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表2に示す。
(Comparative Example 2)
A continuity test tape was obtained in the same manner as in Example 1 except that a 50 μm thick aluminum foil without through holes was used as the substrate. The results are shown in Table 2.
(比較例3)
金属膜の形成において、アルミニウムの膜厚を50nmとしたこと以外は、実施例1と同様にして導通検査用テープを得た。結果を表2に示す。比較例3においては、極薄の金属膜を形成したために、貫通孔の周側面に連続する金属膜を形成できず、その結果、厚み方向の導通性が得られなかったと考えられる。
貫通孔の周側面に金属膜が形成されているかの確認は、以下のようにして行った。
導通検査用テープを切断し、走査型電子顕微鏡(株式会社キーエンス製 走査型電子顕微鏡(SEM)VE-9800)を使用して断面を観察しながら、アメテック株式会社製 エネルギー分散形X線分光器(EDX)を用いて断面のX線分析を行った。元素マッピング測定を行い、貫通孔の周側面にAl元素が存在するか否か、及び導通検査用テープの他の断面にはAl元素が存在しないことを確認した。
比較例3の導通検査用テープにおいては、貫通孔の周側面にはAl元素が存在せず、他の断面にもAl元素が存在しないことが確認された。
なお、実施例1~12の導通検査用テープにおいては、貫通孔の周側面にAl元素が存在し、他の断面にはAl元素が存在しないことが確認された。
(Comparative Example 3)
In the formation of the metal film, a continuity test tape was obtained in the same manner as in Example 1 except that the film thickness of aluminum was 50 nm. The results are shown in Table 2. In Comparative Example 3, since an extremely thin metal film was formed, a metal film continuous on the peripheral side surface of the through hole could not be formed, and as a result, it was considered that the conductivity in the thickness direction could not be obtained.
Whether or not a metal film was formed on the peripheral side surface of the through hole was confirmed as follows.
Cutting the continuity test tape and observing the cross section using a scanning electron microscope (Scanning Electron Microscope (SEM) VE-9800 manufactured by Keyence Corporation), an energy dispersive X-ray spectrometer manufactured by Ametech Corporation ( X-ray analysis of the cross section was performed using EDX). Element mapping measurement was performed, and it was confirmed whether or not Al element was present on the peripheral side surface of the through hole and that Al element was not present in the other cross section of the tape for continuity testing.
In the continuity test tape of Comparative Example 3, it was confirmed that no Al element was present on the peripheral side surface of the through hole, and no Al element was present on the other cross sections.
In the continuity test tapes of Examples 1 to 12, it was confirmed that Al element was present on the peripheral side surface of the through hole and Al element was not present on the other cross sections.
10:導通検査用テープ
1 :基材
2 :金属膜
3 :導電性粘着剤層
4 :貫通孔
5 :半導体チップ
6 :金属被覆基材
10: Tape for continuity test 1: Base material 2: Metal film 3: Conductive adhesive layer 4: Through hole 5: Semiconductor chip 6: Metal-coated base material
Claims (7)
積層方向に導通性を有する導通検査用テープ。 A laminate comprising a base material provided with a plurality of through holes and a metal-coated base material made of a metal film, and a conductive pressure-sensitive adhesive layer,
Tape for continuity testing that has conductivity in the stacking direction.
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| JP2013556083A JP5607844B2 (en) | 2012-03-16 | 2013-03-15 | Continuity test tape and continuity test method using the tape |
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| JP2012-061108 | 2012-03-16 | ||
| JP2012061108 | 2012-03-16 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016089021A (en) * | 2014-11-04 | 2016-05-23 | リンテック株式会社 | Conductive adhesive composition and conductive adhesive sheet |
| WO2025192413A1 (en) * | 2024-03-12 | 2025-09-18 | 三井化学Ictマテリア株式会社 | Method for manufacturing semiconductor component |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110591585A (en) * | 2019-10-28 | 2019-12-20 | 深圳市国显科技有限公司 | Substrate double faced adhesive tape with conducting function |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05206143A (en) * | 1991-11-28 | 1993-08-13 | Nitto Denko Corp | Composite film, and formation of transfer bump by use thereof |
| JPH0737942A (en) * | 1993-07-22 | 1995-02-07 | Nec Corp | Connector for inspection and its manufacture |
| WO2005121268A1 (en) * | 2004-06-14 | 2005-12-22 | Lintec Corporation | Adhesive sheet |
| JP2009114394A (en) * | 2007-11-08 | 2009-05-28 | Nitto Denko Corp | Inspection adhesive sheet |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005277145A (en) * | 2004-03-25 | 2005-10-06 | Dainippon Ink & Chem Inc | Electromagnetic wave shielding adhesive sheet |
-
2013
- 2013-03-15 JP JP2013556083A patent/JP5607844B2/en active Active
- 2013-03-15 WO PCT/JP2013/057433 patent/WO2013137444A1/en not_active Ceased
- 2013-03-15 TW TW102109180A patent/TWI565783B/en active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05206143A (en) * | 1991-11-28 | 1993-08-13 | Nitto Denko Corp | Composite film, and formation of transfer bump by use thereof |
| JPH0737942A (en) * | 1993-07-22 | 1995-02-07 | Nec Corp | Connector for inspection and its manufacture |
| WO2005121268A1 (en) * | 2004-06-14 | 2005-12-22 | Lintec Corporation | Adhesive sheet |
| JP2009114394A (en) * | 2007-11-08 | 2009-05-28 | Nitto Denko Corp | Inspection adhesive sheet |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016089021A (en) * | 2014-11-04 | 2016-05-23 | リンテック株式会社 | Conductive adhesive composition and conductive adhesive sheet |
| WO2025192413A1 (en) * | 2024-03-12 | 2025-09-18 | 三井化学Ictマテリア株式会社 | Method for manufacturing semiconductor component |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI565783B (en) | 2017-01-11 |
| JP5607844B2 (en) | 2014-10-15 |
| TW201400579A (en) | 2014-01-01 |
| JPWO2013137444A1 (en) | 2015-08-03 |
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