WO2013147033A1 - 赤外線カット材 - Google Patents
赤外線カット材 Download PDFInfo
- Publication number
- WO2013147033A1 WO2013147033A1 PCT/JP2013/059280 JP2013059280W WO2013147033A1 WO 2013147033 A1 WO2013147033 A1 WO 2013147033A1 JP 2013059280 W JP2013059280 W JP 2013059280W WO 2013147033 A1 WO2013147033 A1 WO 2013147033A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- infrared cut
- cut material
- mass
- parts
- light transmittance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G30/00—Compounds of antimony
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2231—Oxides; Hydroxides of metals of tin
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K3/2279—Oxides; Hydroxides of metals of antimony
Definitions
- the present invention relates to an infrared cut material used for forming a transparent infrared cut film (a film that is transparent to visible light and absorbs and / or reflects light having a wavelength of near infrared or higher).
- a transparent infrared cut film a film that is transparent to visible light and absorbs and / or reflects light having a wavelength of near infrared or higher.
- ITO powder indium tin oxide powder
- ATO powder antimony tin oxide powder
- ITO powder indium tin oxide powder
- ATO powder antimony tin oxide powder
- the ITO powder has an advantage that it is excellent in transparency and infrared ray cutting performance, but since it is expensive, there is a problem of using a rare metal as well as increasing the cost.
- ATO powder is less expensive than ITO powder, but has a problem that it has a low visible light transmittance and cannot respond to the requirement for high transparency, and it has inferior near-infrared cut performance compared to ITO powder.
- ATO powder (trade name: T-1), which is well known as ATO powder, has an IR shielding rate (visible light transmittance (% Tv) / sunlight transmission) at 80% visible light transmittance. The rate (% Ts) is about 1.2.
- Fluorine-doped tin oxide powder (FTO powder) also has near-infrared absorption, but has a low IR shielding rate of about 1.2.
- infrared cut materials such as lanthanum boride and tungsten-based compounds have a problem that they absorb visible light and are inferior in near-infrared absorption ability.
- ATO powder containing conventional SbO 2 5 ⁇ 10 wt% doped with a large amount of SbO 2 and to solve the above problems by using a ATO powder having a specific crystalline as infrared cut material.
- ATO powder having a specific crystalline as infrared cut material it is cheap and highly transparent, and it is possible to form a transparent infrared cut film having a near infrared cut performance equivalent to a film using ITO powder and a near-infrared cut wavelength of 2000 nm or more and having a higher IR shielding ratio than conventional ATO powder.
- An object of the present invention is to provide an infrared cut material.
- the present invention relates to an infrared cut material and a transparent infrared cut film that have solved the above problems by having the following configuration.
- An infrared cut material made of antimony tin oxide powder, wherein SbO 2 is 13 parts by mass or more and 30 parts by mass or less with respect to 100 parts by mass of the infrared cut material, and the antimony oxidation in an X-ray diffraction pattern
- An infrared ray-cutting material wherein a half width (diffraction angle 2 ⁇ : 52 °) of a (211) plane of tin powder is 0.8 ° or more and 1.2 ° or less.
- a composition for transparent infrared cut film comprising the infrared cut material according to the above [1], a resin and a solvent.
- the infrared cut material is contained in an amount of 65 to 80 parts by mass with respect to a total of 100 parts by mass of the infrared cut material and the resin, the thickness is 1 to 3 ⁇ m, and the visible light transmittance (% Tv) is 80 %, The ratio of the visible light transmittance (% Tv) to the solar radiation transmittance (% Ts) ([(% Tv) / (% Ts)]) is 1.26 or more. Transparent infrared cut film.
- an infrared cut material that is highly transparent, has excellent infrared cut performance, and is inexpensive. Therefore, a transparent infrared cut film having high transparency and excellent infrared cut performance can be formed.
- a transparent infrared cut film having high transparency and excellent infrared cut performance can be easily formed.
- the transparent infrared cut film which was highly transparent and excellent in the infrared cut performance can be provided.
- the infrared cut material of the present embodiment (hereinafter referred to as the present infrared cut material) is an infrared cut material made of antimony tin oxide powder (ATO powder), and SbO 2 is 13 with respect to 100 parts by mass of the present infrared cut material.
- the full width at half maximum (diffraction angle 2 ⁇ : 52 °) of the (211) plane of the present infrared cut material in the X-ray diffraction pattern is 0.8 ° or more and 1.2 ° or less.
- the oxide of Sb is expressed as SbO 2 .
- the Sb content was measured by ICP analysis and converted to SbO 2 .
- the inventors of the present invention are important that the STO is doped with a larger amount of SbO 2 than the normal ATO powder, and the crystallinity of the ATO powder is in a specific range. I found out.
- the ATO powder having a low SbO 2 content increases the crystallinity of the ATO powder, but the IR shielding rate is low.
- the ATO powder having a high SbO 2 content It has also been found that the crystallinity is lowered and the IR shielding rate is also lowered.
- SbO 2 is 13 parts by mass or more and 30 parts by mass or less, and preferably 13 parts by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the present infrared cut material.
- the half-value width (diffraction angle 2 ⁇ : 52 °) of the (211) plane of the ATO powder in the X-ray diffraction pattern of the infrared cut material is 0.8 ° or more and 1.2 ° or less, and 0.8 ° or more. It is preferably 1.1 ° or less, and more preferably 0.8 ° or more and 1.0 ° or less.
- the IR shielding rate is obtained when a transparent infrared cut film having a thickness of 1 to 3 ⁇ m is formed using the present infrared cut material by the method described later. However, it becomes smaller than 1.26 in visible light transmittance (% Tv) 80%.
- the IR shielding rate is a ratio ([(% Tv) / (% Ts)]) of the visible light transmittance (% Tv) to the solar radiation transmittance (% Ts).
- the X-ray diffraction pattern of this ATO powder is the same as the X-ray pattern of SnO 2 .
- the X-ray diffraction measurement is performed by scanning the incident angle ⁇ in a predetermined angle range while irradiating the sample with X-rays (CuK ⁇ rays), and counting the intensity of the X-rays diffracted during this time. It is obtained by plotting the diffraction angle 2 ⁇ on the horizontal axis and the diffraction intensity on the vertical axis.
- the (211) plane of SnO 2 corresponding to the diffraction angle 2 ⁇ is observed at 52 °, and is also observed at 52 ° at the diffraction angle 2 ⁇ of the ATO powder.
- the peak means a mountain-shaped portion in the X-ray diffraction pattern.
- Each peak corresponds to a crystal plane.
- the half-value width indicates the diffraction angle width of the peak curve at an X-ray diffraction intensity that is 1 ⁇ 2 of the peak intensity (X-ray diffraction intensity at the peak curve peak).
- a peak having a small half width has a steep mountain shape, and the crystallinity of the crystal plane is high.
- a peak with a large half-value width has a gentle mountain shape with a wide skirt, and it can be said that the crystallinity of the crystal plane is low.
- the infrared cut material has a half-value width (diffraction angle 2 ⁇ : 52 °) of the (211) plane of the ATO powder in the X-ray diffraction pattern of 0.8 ° or more and 1.2 ° or less, Sex is in a specific range.
- the half-value width (diffraction angle 2 ⁇ : 52 °) of the (211) plane of the ATO powder is less than 0.8 °, the crystallinity is too high and the IR shielding rate becomes low.
- the half width (diffraction angle 2 ⁇ : 52 °) of the (211) plane of the ATO powder exceeds 1.2 °, the crystallinity is too low and the IR shielding rate becomes low.
- the visible light transmittance (% Tv) is a value obtained based on JIS R3106 (established in 1998) (wavelength range of visible light: 380 to 789 nm). That is, the visible light transmittance (% Tv) is obtained by determining the ratio of the transmitted light beam to the incident light beam with respect to the daylight light beam perpendicularly incident on the infrared cut film.
- daylight means CIE daylight established by the International Commission on Illumination (CIE).
- the luminous flux is obtained by integrating the product of the radiant energy flux for each wavelength of the radiation and the value of the visibility with respect to the wavelength.
- the visible light transmittance (% Tv) was measured using a spectrophotometer.
- the solar radiation transmittance (% Ts) is a value obtained based on JIS R3106 (established in 1998) (wavelength range of solar radiation: 300 to 2500 nm). That is, the solar radiation transmittance (% Ts) is a ratio of the transmitted radiant flux to the incident radiant flux with respect to the solar radiant flux perpendicularly incident on the infrared cut film.
- solar radiation means direct solar radiation, that is, radiation in the near-ultraviolet, visible, and near-infrared wavelength regions (the above-mentioned 300 to 2500 nm) passing through the atmosphere and directly reaching the ground.
- the solar radiation transmittance (% Ts) was measured using a spectrophotometer.
- JIS R3106 (established in 1998) showing visible light transmittance (% Tv) and solar radiation transmittance (% Ts) is ISO 9050 (Glass in building- Determination of published in 1990 as the first edition). It is a standard created without changing the technical content of light transmittance, solar direct transmittance, total solar energy transmittance and ultraviolet transmittance, and related glazing factors, and ISO 9050 can also be referred to.
- the particle size of the infrared cut material is not particularly limited, but is preferably 0.005 to 0.03 ⁇ m and more preferably 0.01 to 0.02 ⁇ m from the viewpoint of visible light transmittance and solar transmittance.
- the particle diameter refers to the BET diameter converted from the specific surface area.
- the shape of the present infrared cut material is preferably granular.
- the present infrared cut material can be produced by co-precipitating antimony and tin hydroxides from an aqueous solution containing antimony and tin and then firing the antimony and tin hydroxides.
- Firing of antimony and tin hydroxide was carried out in the air at 750 to 850 ° C. for 0.5 to 3 hours, and 13 parts by weight of SbO 2 was obtained with respect to 100 parts by mass of the present infrared cut material.
- the half-value width (diffraction angle 2 ⁇ : 52 °) of the (211) plane of the ATO powder in the X-ray diffraction pattern is 0.8 ° to 1.2 °.
- the IR shielding rate at 80% of the visible light transmittance of a transparent infrared cut film described later using the present infrared cut material is 1.26 or more.
- the dispersion liquid of this embodiment contains this infrared cut material and a solvent.
- the solvent include water, toluene, xylene, acetone, ethanol and the like.
- composition for transparent infrared cut film of this embodiment contains this infrared cut material, resin, and solvent.
- the solvent is as described above.
- the resin is generally a dispersion liquid as long as it can be dissolved in the solvent used, can disperse the present infrared cut material, and can bond the present infrared cut material to form a transparent infrared cut film.
- Any resin used in paints, pastes and the like can be used.
- examples of the resin include acrylic resin, polyethylene terephthalate resin, and urethane resin.
- an acrylic paint, a polyester paint, a urethane paint, or the like in which a resin solid content and a solvent are mixed in advance is also preferably used.
- examples of commercially available products include Acrylic manufactured by Kansai Paint Co., Acrydic manufactured by DIC, and the like.
- the transparent infrared cut film of the present embodiment contains the present infrared cut material and resin.
- the present infrared cut material is a transparent infrared cut film having a thickness of 1 to 3 ⁇ m and containing 65 to 80 parts by mass with respect to a total of 100 parts by mass of the present infrared cut material and resin
- the cut film has a visible light transmittance (% Tv) of 80%, the ratio of the visible light transmittance (% Tv) to the solar light transmittance (% Ts) ([(% Tv) / (% Ts)]), that is, IR shielding
- the rate can be 1.26 or higher.
- the upper limit value of the IR shielding rate is not particularly limited, but the IR shielding rate can be improved to about 1.30.
- the IR shielding rate is less than 1.26.
- a visible light transmittance will be 75% or less, and the usage method will be limited.
- IR shielding rate represents infrared cut performance, and is a level generally shown below in a standard mode.
- the solar radiation transmittance (% Ts) is also as high as around 81%. As low as 1.0.
- a general ATO powder-containing film has a solar light transmittance (% Ts) of about 65% when the visible light transmittance (% Tv) has a transparency of about 80%.
- the shielding rate is about 1.2, and the IR shielding rate is higher than that containing tin oxide powder.
- the visible light transmittance (% Tv) is around 90%. Yes, it is excellent in transparency, and the solar radiation transmittance (% Ts) is as low as 59%. Therefore, the IR shielding rate is as high as 1.4 or more.
- the infrared cut material is doped with a larger amount of antimony than the conventional ATO powder, and SbO 2 is contained in 100 parts by mass of the infrared cut material.
- the full width at half maximum (diffraction angle 2 ⁇ : 52 °) of the (211) plane of the ATO powder in the X-ray diffraction pattern is 13 parts by mass or more and 30 parts by mass or less.
- the solar radiation transmittance (% Ts) at a visible light transmittance (% Tv) of 80% is as low as less than 64% even without using expensive indium, and the IR shielding rate.
- the infrared cut film which is 1.26 or more can be formed.
- the present infrared cut material ITO powder (referred to as “ITO” in FIG. 1), and a commercially available ATO powder (trade name: T-1, manufactured by Mitsubishi Materials Electronic Chemical Co., Ltd.) 2 is a graph showing the relationship between the IR shielding rate of “T-1” and the visible light transmittance. In the range shown in FIG. 1, the IR shielding rate and the visible light transmittance have a linear relationship. Further, it can be seen from FIG. 1 that the infrared cut material has an IR shielding rate of 1.26 or more at a visible light transmittance of 80%.
- a transparent infrared cut film The specific example of the manufacturing method of a transparent infrared cut film is shown.
- a commercially available acrylic paint manufactured by DIC, trade name: Acridic
- toluene / xylene volume ratio: 1: 1
- an infrared cut material is added thereto.
- mass of the present infrared cut material / (Mass of the present infrared cut material + resin)] is prepared to be 70% by mass, and a dispersed transparent infrared cut film forming composition is prepared.
- the produced transparent infrared cut film-forming composition is applied onto a PET film with a variable film thickness applicator and dried at 100 ° C. to produce a transparent infrared cut film having a thickness of 1 to 3 ⁇ m.
- the manufactured transparent infrared cut film has an IR shielding rate ([(% Tv) / (% Ts)]): 1.26 or more at a visible light transmittance (% Tv) of 80%.
- infrared cut material The infrared cut material of the ratio shown to Table 1, 2 was manufactured. 55% by mass tin tetrachloride solution: 92 g, 17% by mass hydrochloric acid: 14 g, a predetermined amount of antimony trichloride solution were mixed and added dropwise to 1 dm 3 of water kept at 60 ° C. together with 25% by mass sodium hydroxide solution. The pH was kept at 5-6. Residual salts were removed from the resulting antimony and tin hydroxides by decantation, filtered, dried, and calcined at 700 to 900 ° C. for 2 hours in the air.
- Tables 1 and 2 show the full width at half maximum (diffraction angle 2 ⁇ : 52 °) of the (211) plane obtained by X-ray diffraction measurement of the ATO powders of Examples 1 to 9 and Comparative Examples 1 to 26.
- the vertical axis represents the mass part of SbO 2
- the horizontal axis represents the firing temperature
- the half-value width (diffraction angle 2 ⁇ : 52 °) of the (211) plane of the ATO powder is shown.
- the inside of the thick solid line in Table 3 corresponds to Examples 1 to 9, and the outside of the thick solid line corresponds to Comparative Examples 1 to 26.
- composition for transparent infrared cut film The obtained sample was added to a solution obtained by dissolving a commercially available acrylic paint (manufactured by DIC, trade name: Acridic) in toluene / xylene (volume ratio: 1: 1), and the content of infrared cut material in the coating film ( prepare the transparent infrared cut film forming composition so that [mass of the infrared cut material / (mass of the infrared cut material + resin content in the acrylic paint)] at the time of drying is 70% by mass, and insert beads And stirred for 10 hours with a paint shaker to prepare a transparent infrared cut film composition.
- a commercially available acrylic paint manufactured by DIC, trade name: Acridic
- the produced transparent infrared cut film forming composition was applied onto a PET film with an applicator and dried at 100 ° C. to form a transparent infrared cut film having a thickness of 1 to 3 ⁇ m.
- the SbO 2 of the infrared cut material is 13 parts by mass or more and 30 parts by mass or less, and the half width of the (211) plane of the ATO powder (diffraction angle 2 ⁇ : 52 °).
- the angle is 0.8 ° or more and 1.2 ° or less
- the IR shielding rate [(% Tv) / (% Ts)] is stable and is a favorable result of 1.26 or more. It was.
- the transparency of Examples 1 to 9 was good.
- the IR shielding rate was lower than 1.26.
- the present invention is doped with a larger amount of antimony than the conventional ATO powder, SbO 2 is 13 parts by mass or more and 30 parts by mass or less with respect to 100 parts by mass of the present infrared cut material, and the ATO in the X-ray diffraction pattern.
- SbO 2 is 13 parts by mass or more and 30 parts by mass or less with respect to 100 parts by mass of the present infrared cut material, and the ATO in the X-ray diffraction pattern.
- the full width at half maximum (diffraction angle 2 ⁇ : 52 °) of the (211) plane of the powder is 0.8 ° or more and 1.2 ° or less, it is possible to form a transparent infrared cut film that is inexpensive and highly transparent. Infrared cut material can be provided.
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Paints Or Removers (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
本願は、2012年3月29日に、日本に出願された特願2012-076045号に基づき優先権を主張し、その内容をここに援用する。
〔1〕アンチモン酸化錫粉末からなる赤外線カット材であって、前記赤外線カット材100質量部に対して、SbO2が13質量部以上30質量部以下であり、かつX線回折パターンにおける前記アンチモン酸化錫粉末の(211)面の半値幅(回折角度2θ:52°)が、0.8°以上1.2°以下であることを特徴とする、赤外線カット材。
〔2〕上記〔1〕に記載の赤外線カット材と溶媒とを含有する、分散液。
〔3〕上記〔1〕に記載の赤外線カット材と樹脂と溶媒とを含有する、透明赤外線カットフィルム用組成物。
〔4〕上記〔1〕に記載の赤外線カット材と樹脂とを含有する、透明赤外線カットフィルム。
〔5〕前記赤外線カット材と樹脂との合計100質量部に対して、前記赤外線カット材を65~80質量部含有し、厚さが1~3μmであり、可視光透過率(%Tv)80%において、可視光透過率(%Tv)の日射透過率(%Ts)に対する比([(%Tv)/(%Ts)])が、1.26以上である、上記〔4〕に記載の透明赤外線カットフィルム。
本実施形態の赤外線カット材(以下、本赤外線カット材という)は、アンチモン酸化錫粉末(ATO粉末)からなる赤外線カット材であって、本赤外線カット材100質量部に対して、SbO2が13質量部以上30質量部以下であり、かつX線回折パターンにおける本赤外線カット材の(211)面の半値幅(回折角度2θ:52°)が、0.8°以上1.2°以下である。本実施形態では、Sbの酸化物は、SbO2と表記する。赤外線カット材では、Sb含有量をICP分析で測定し、SbO2に換算した。
本赤外線カット材100質量部に対して、SbO2は13質量部以上30質量部以下であり、13質量部以上20質量部以下であると好ましい。更に、本赤外線カット材のX線回折パターンにおけるATO粉末の(211)面の半値幅(回折角度2θ:52°)が、0.8°以上1.2°以下であり、0.8°以上1.1°以下であることが好ましく、0.8°以上1.0°以下であることがより好ましい。SbO2含有量及びATO粉末の結晶性がこれらの範囲外では、後述する方法で、本赤外線カット材を用いて、厚さ:1~3μmの透明赤外線カットフィルムを形成したときに、IR遮蔽率が、可視光透過率(%Tv)80%において、1.26より小さくなる。ここで、IR遮蔽率は、可視光透過率(%Tv)の日射透過率(%Ts)に対する比([(%Tv)/(%Ts)])である。上記の範囲以外では、透明赤外線カットフィルムの膜厚を厚くしても、可視光透過率(%Tv)と日射透過率(%Ts)とが、ともに並行して低下するため、IR遮蔽率が1.26を超えることはない。なお、IR遮蔽率が1.26より小さいと、実用上使用できない場合が多くなる。
すなわち、可視光透過率(%Tv)とは、赤外線カットフィルムに垂直に入射する昼光の光束について、透過光束の入射光束に対する比を求めたものである。ここで昼光とは、国際照明委員会(CIE: International Commission on Illumination)が定めたCIE昼光を意味する。また、光束(luminous flux)とは、放射の波長ごとの放射束(radiant energy flux)と視感度の値の積の数値を波長について積分したものである。本実施形態では、可視光透過率(%Tv)を分光光度計を用いて計測した。
すなわち、日射透過率(%Ts)とは、赤外線カットフィルムに垂直に入射する日射の放射束について、透過放射束の入射放射束に対する比を求めたものである。ここで、日射とは、直達日射、すなわち大気圏を通過して地上に直接到達する近紫外、可視、及び近赤外の波長領域(上述の300~2500nm)の放射をいう。本実施形態では、日射透過率(%Ts)を分光光度計を用いて計測した。
なお、可視光透過率(%Tv)及び日射透過率(%Ts)を示しているJIS R3106(1998年制定)は、1990年に第1版として発行されたISO 9050(Glass in building - Determination of light transmittance, solar direct transmittance, total solar energy transmittance and ultraviolet transmittance, and related glazing factors)の技術的内容を変更することなく作成された規格であり、ISO 9050を参照することもできる。
SbO2が、本赤外線カット材100質量部に対して、13質量部以上30質量部以下で、焼成温度が750℃より低いと、ATO粉末の(211)面の半値幅(回折角度2θ:52°)が1.2°より大きくなり、ATO粉末の結晶性が低くなるため、ATO粉末のIR遮蔽率も1.26より小さくなる。一方、SbO2が、赤外線カット材100質量部に対して、13質量部以上30質量部以下で、焼成温度が850℃より高いと、赤外線カット材の(211)面の半値幅(回折角度2θ:52°)が0.8°より小さくなり、ATO粉末の結晶性が高くなるが、赤外線カット材のIR遮蔽率が1.26より小さくなる。
本実施形態の分散液は、本赤外線カット材と溶媒とを含有する。溶媒としては、水、トルエン、キシレン、アセトン、エタノール等が挙げられる。
本実施形態の透明赤外線カットフィルム用組成物は、本赤外線カット材と樹脂と溶媒とを含有する。溶媒は上述のとおりである。ここで、樹脂は、使用する溶媒に溶解でき、本赤外線カット材を分散することができ、本赤外線カット材を結合して透明赤外線カットフィルムを形成し得るものであれば、一般的に分散液、塗料、ペースト等で用いられている任意の樹脂を用いることができる。ここで、樹脂としては、アクリル樹脂、ポリエチレンテレフタレート樹脂、ウレタン樹脂等が挙げられる。また、樹脂固形分と溶媒が予め混合されたアクリル塗料、ポリエステル塗料、ウレタン塗料等も好適に用いられる。市販製品としては、関西ペイント社製アクリリック、DIC製アクリディック等が挙げられる。
本実施形態の透明赤外線カットフィルム(以下、本透明赤外線カットフィルムという)は、本赤外線カット材と樹脂とを含有する。また、本赤外線カット材を、本赤外線カット材と樹脂との合計100質量部に対して、65~80質量部含有する、厚さ:1~3μmの透明赤外線カットフィルムであるとき、この透明赤外線カットフィルムの可視光透過率(%Tv)80%において、可視光透過率(%Tv)の日射透過率(%Ts)に対する比([(%Tv)/(%Ts)])、すなわちIR遮蔽率を、1.26以上にすることができる。本実施形態において、IR遮蔽率の上限値は特に限定されないが、IR遮蔽率を1.30程度まで向上できる。
表1、2に示す割合の赤外線カット材を製造した。55質量%四塩化錫溶液:92g、17質量%塩酸:14g、所定量の三塩化アンチモン溶液を混合し、25質量%水酸化ナトリウム溶液と共に60℃に保った水:1dm3中に滴下した。pHは5~6に保った。得られたアンチモンおよび錫の水酸化物より、デカンテーションにより残存塩を除き、濾過し、乾燥した後、大気中、700~900℃で2時間焼成した。
得られた試料をICP分析によりSn、Sb量を測定し、赤外線カット材100質量部に対する、SbO2の質量部を算出した。表1、表2に、実施例1~9、比較例1~26での分析結果を示す。
また、得られた試料のX線回折測定を、理学電機社製X線回折装置(型番:MiniFlex)で行った。X線回折測定条件は、以下にした。
X線源:CuKα
管電圧、管電流:30kV、15mA
ゴニオメーター:ミニフレックスゴニオメーター
散乱スリット:4.2°
受光スリット:0.3mm
スキャンスピード:1°/min
得られた試料を、市販アクリル塗料(DIC社製、商標名:アクリディック)をトルエン・キシレン(体積比:1:1)に溶解した溶液中に加え、赤外線カット材を塗膜中含有量(透明赤外線カットフィルム形成用組成物乾燥時の〔該赤外線カット材の質量/(該赤外線カット材+アクリル塗料中の樹脂分の質量)〕)が70質量%になるように調製し、ビーズを入れた容器に入れ、ペイントシェーカーで10時間撹拌し、透明赤外線カットフィルム用組成物を作製した。
作製した透明赤外線カットフィルム形成用組成物を、アプリケーターでPETフィルム上に塗布し、100℃で乾燥し、厚さ1~3μmの透明赤外線カットフィルムを形成した。
形成した透明赤外線カットフィルムについて、日立社製分光光度計(型番:U-4000)を用い、大気の[%Tv]、[%Ts]をベースラインとして、可視光透過率(%Tv)、日射透過率(%Ts)を測定し、IR遮蔽率を算出した。ここで、IR遮蔽率は、可視光透過率によって変化する。一方、可視光透過率は、透明赤外線カットフィルムの厚さにより変化する。しかし、図1に示すように、可視光透過率が75~85%においては、可視光透過率とIR遮蔽率は、直線関係にあり、かつ実施例1~9および比較例1~26の可視光透過率の実測値が75~85%なので、この範囲の中央値である可視光透過率80%におけるIR遮蔽率を評価した。表1、2に、実施例1~9、比較例1~26での可視光透過率80%におけるIR遮蔽率の結果を示す。また、表4に、縦軸にSbO2の質量部、横軸に焼成温度を示し、可視光透過率80%におけるIR遮蔽率を記載した結果を示す。表4の太い実線の内部は実施例1~9が該当し、太い実線の外部は比較例1~26が該当する。
Claims (5)
- アンチモン酸化錫粉末からなる赤外線カット材であって、
前記赤外線カット材100質量部に対して、SbO2が13質量部以上30質量部以下であり、
X線回折パターンにおける前記アンチモン酸化錫粉末の(211)面の半値幅(回折角度2θ:52°)が、0.8°以上1.2°以下であることを特徴とする、赤外線カット材。 - 請求項1に記載の赤外線カット材と溶媒とを含有する、分散液。
- 請求項1に記載の赤外線カット材と樹脂と溶媒とを含有する、透明赤外線カットフィルム用組成物。
- 請求項1に記載の赤外線カット材と樹脂とを含有する、透明赤外線カットフィルム。
- 前記赤外線カット材と樹脂との合計100質量部に対して、前記赤外線カット材を65~80質量部含有し、
厚さが1~3μmであり、
可視光透過率(%Tv)80%において、可視光透過率(%Tv)の日射透過率(%Ts)に対する比([(%Tv)/(%Ts)])が、1.26以上である、請求項4に記載の透明赤外線カットフィルム。
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13769693.6A EP2832699A4 (en) | 2012-03-29 | 2013-03-28 | IR-CUT MATERIAL |
| JP2014508034A JP5740046B2 (ja) | 2012-03-29 | 2013-03-28 | 赤外線カット材 |
| KR1020147026971A KR101568630B1 (ko) | 2012-03-29 | 2013-03-28 | 적외선 차단재 |
| CN201380016435.9A CN104220376B (zh) | 2012-03-29 | 2013-03-28 | 红外截止材料 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-076045 | 2012-03-29 | ||
| JP2012076045 | 2012-03-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2013147033A1 true WO2013147033A1 (ja) | 2013-10-03 |
Family
ID=49260278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2013/059280 Ceased WO2013147033A1 (ja) | 2012-03-29 | 2013-03-28 | 赤外線カット材 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP2832699A4 (ja) |
| JP (1) | JP5740046B2 (ja) |
| KR (1) | KR101568630B1 (ja) |
| CN (1) | CN104220376B (ja) |
| WO (1) | WO2013147033A1 (ja) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015068283A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性オフセット印刷インキ |
| WO2015068292A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 印刷物 |
| WO2015068291A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 印刷物 |
| WO2015068280A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性グラビア印刷インキ |
| WO2015068289A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性活版印刷インキ |
| WO2015068276A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性フレキソ印刷インキ |
| WO2015068282A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性インクジェット印刷インク |
| WO2015068290A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性凹版印刷インキ |
| WO2015068281A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性スクリーン印刷インキ |
| WO2017057110A1 (ja) * | 2015-09-30 | 2017-04-06 | 住友金属鉱山株式会社 | 赤外線吸収微粒子、およびそれを用いた分散液、分散体、合わせ透明基材、フィルム、ガラスと、その製造方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101732244B1 (ko) * | 2015-01-16 | 2017-05-04 | 김정엽 | 적외선 차단 금속산화물 분말의 제조방법 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5891777A (ja) * | 1981-11-25 | 1983-05-31 | Mitsubishi Metal Corp | 導電性透明塗料 |
| JPH0769632A (ja) | 1993-06-30 | 1995-03-14 | Mitsubishi Materials Corp | 赤外線カットオフ粉末 |
| JPH10251018A (ja) * | 1997-03-13 | 1998-09-22 | Nissan Chem Ind Ltd | 導電性酸化スズ微粉末及び導電性酸化スズゾルの製造方法 |
| JP2003176132A (ja) * | 2001-09-28 | 2003-06-24 | Sumitomo Metal Mining Co Ltd | 日射遮蔽用アンチモン錫酸化物粒子および日射遮蔽膜形成用塗布液ならびに日射遮蔽膜 |
| JP2004083397A (ja) * | 2002-07-01 | 2004-03-18 | Sumitomo Metal Mining Co Ltd | 日射遮蔽用アンチモン錫酸化物微粒子とこれを用いた日射遮蔽体形成用分散液および日射遮蔽体並びに日射遮蔽用透明基材 |
| JP2004149329A (ja) * | 2002-10-29 | 2004-05-27 | Nissan Chem Ind Ltd | 導電性酸化スズの製造方法 |
| WO2008127409A2 (en) * | 2006-11-07 | 2008-10-23 | Ppg Industries Ohio, Inc. | Infrared absorber |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4200424B2 (ja) | 2001-09-27 | 2008-12-24 | 住友金属鉱山株式会社 | 日射遮蔽材料の製造方法、日射遮蔽膜形成用塗布液および日射遮蔽膜並びに日射遮蔽用透明基材 |
| JP4347814B2 (ja) * | 2003-03-17 | 2009-10-21 | ヘ−ウク・リー | 熱線遮断組成物、これを利用した熱線遮断被膜およびこれらの製造方法 |
| JP5308635B2 (ja) * | 2007-05-30 | 2013-10-09 | 三菱マテリアル株式会社 | 近赤外線吸収組成物の吸収性制御方法 |
| CN101708958B (zh) * | 2009-11-25 | 2012-04-25 | 深圳清华大学研究院 | 可释放负离子的建筑玻璃隔热涂料及制备方法 |
| CN101864230B (zh) * | 2010-06-12 | 2013-07-31 | 重庆龙者低碳环保科技有限公司 | 一种红外屏蔽型玻璃隔热涂料及其制备方法 |
-
2013
- 2013-03-28 KR KR1020147026971A patent/KR101568630B1/ko active Active
- 2013-03-28 JP JP2014508034A patent/JP5740046B2/ja active Active
- 2013-03-28 WO PCT/JP2013/059280 patent/WO2013147033A1/ja not_active Ceased
- 2013-03-28 CN CN201380016435.9A patent/CN104220376B/zh not_active Expired - Fee Related
- 2013-03-28 EP EP13769693.6A patent/EP2832699A4/en not_active Withdrawn
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5891777A (ja) * | 1981-11-25 | 1983-05-31 | Mitsubishi Metal Corp | 導電性透明塗料 |
| JPH0769632A (ja) | 1993-06-30 | 1995-03-14 | Mitsubishi Materials Corp | 赤外線カットオフ粉末 |
| JPH10251018A (ja) * | 1997-03-13 | 1998-09-22 | Nissan Chem Ind Ltd | 導電性酸化スズ微粉末及び導電性酸化スズゾルの製造方法 |
| JP2003176132A (ja) * | 2001-09-28 | 2003-06-24 | Sumitomo Metal Mining Co Ltd | 日射遮蔽用アンチモン錫酸化物粒子および日射遮蔽膜形成用塗布液ならびに日射遮蔽膜 |
| JP2004083397A (ja) * | 2002-07-01 | 2004-03-18 | Sumitomo Metal Mining Co Ltd | 日射遮蔽用アンチモン錫酸化物微粒子とこれを用いた日射遮蔽体形成用分散液および日射遮蔽体並びに日射遮蔽用透明基材 |
| JP2004149329A (ja) * | 2002-10-29 | 2004-05-27 | Nissan Chem Ind Ltd | 導電性酸化スズの製造方法 |
| WO2008127409A2 (en) * | 2006-11-07 | 2008-10-23 | Ppg Industries Ohio, Inc. | Infrared absorber |
Non-Patent Citations (3)
| Title |
|---|
| I.S. MULLA ET AL.: "Electron spectroscopic studies on films of Sn02 and Sn02:Sb", SURFACE AND COATINGS TECHNOLOGY, vol. 31, 1987, pages 77 - 88, XP024461067 * |
| See also references of EP2832699A4 * |
| SEUNG-YUP LEE ET AL.: "Structural, electrical and optical characteristics of Sn02:Sb thin films by ultrasonic spray pyrolysis", THIN SOLID FILMS, vol. 510, 3 February 2006 (2006-02-03), pages 154 - 158, XP025006926 * |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015068283A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性オフセット印刷インキ |
| WO2015068292A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 印刷物 |
| WO2015068291A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 印刷物 |
| WO2015068280A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性グラビア印刷インキ |
| WO2015068289A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性活版印刷インキ |
| WO2015068276A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性フレキソ印刷インキ |
| WO2015068282A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性インクジェット印刷インク |
| WO2015068290A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性凹版印刷インキ |
| WO2015068281A1 (ja) * | 2013-11-08 | 2015-05-14 | 共同印刷株式会社 | 赤外線吸収性スクリーン印刷インキ |
| WO2017057110A1 (ja) * | 2015-09-30 | 2017-04-06 | 住友金属鉱山株式会社 | 赤外線吸収微粒子、およびそれを用いた分散液、分散体、合わせ透明基材、フィルム、ガラスと、その製造方法 |
| KR20180064431A (ko) * | 2015-09-30 | 2018-06-14 | 스미토모 긴조쿠 고잔 가부시키가이샤 | 적외선 흡수 미립자 및 이를 사용한 분산액, 분산체, 적층된 투명 기재, 필름, 유리, 및 이의 제조 방법 |
| JPWO2017057110A1 (ja) * | 2015-09-30 | 2018-07-19 | 住友金属鉱山株式会社 | 赤外線吸収微粒子、およびそれを用いた分散液、分散体、合わせ透明基材、フィルム、ガラスと、その製造方法 |
| US10486982B2 (en) | 2015-09-30 | 2019-11-26 | Sumitomo Metal Mining Co., Ltd. | Infrared absorbing fine particles, dispersion liquid using the same, dispersion body, laminated transparent base material, film, glass, and method for producing the same |
| KR102553348B1 (ko) | 2015-09-30 | 2023-07-07 | 스미토모 긴조쿠 고잔 가부시키가이샤 | 적외선 흡수 미립자 및 이를 사용한 분산액, 분산체, 적층된 투명 기재, 필름, 유리, 및 이의 제조 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104220376A (zh) | 2014-12-17 |
| CN104220376B (zh) | 2016-02-10 |
| JPWO2013147033A1 (ja) | 2015-12-14 |
| EP2832699A1 (en) | 2015-02-04 |
| EP2832699A4 (en) | 2015-11-25 |
| JP5740046B2 (ja) | 2015-06-24 |
| KR101568630B1 (ko) | 2015-11-11 |
| KR20140129297A (ko) | 2014-11-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5740046B2 (ja) | 赤外線カット材 | |
| JP5454111B2 (ja) | 近赤外線カットフィルタおよび撮像装置・表示装置 | |
| TWI715747B (zh) | 近紅外線遮蔽材料微粒子及其製造方法暨近紅外線遮蔽材料微粒子分散液 | |
| Huang et al. | Solvothermal synthesis of Sb: SnO2 nanoparticles and IR shielding coating for smart window | |
| JPWO2005037932A1 (ja) | 赤外線遮蔽材料微粒子分散体、赤外線遮蔽体、及び赤外線遮蔽材料微粒子の製造方法、並びに赤外線遮蔽材料微粒子 | |
| US20150118458A1 (en) | Antimony-doped tin oxide, infrared-ray-absorbable pigment, infrared-ray-absorbable ink, printed matter, and method for producing antimony-doped tin oxide | |
| US11453755B2 (en) | Environment-friendly heat shielding film using non-radioactive stable isotope and manufacturing method thereof | |
| JP2009215487A (ja) | 赤外線遮蔽材料微粒子分散液、赤外線遮蔽膜と赤外線遮蔽光学部材およびプラズマディスプレイパネル用近赤外線吸収フィルター | |
| JP2005226008A (ja) | 日射遮蔽体形成用分散液及び日射遮蔽体並びにその製造方法 | |
| JP5387925B2 (ja) | 赤外線遮蔽材料微粒子分散体、赤外線遮蔽体、及び赤外線遮蔽材料微粒子の製造方法、並びに赤外線遮蔽材料微粒子 | |
| JP2011157504A (ja) | 近赤外線遮蔽材料微粒子分散体、近赤外線遮蔽体、および近赤外線遮蔽材料微粒子の製造方法、並びに近赤外線遮蔽材料微粒子 | |
| JP5809795B2 (ja) | 二酸化チタン含有複合粒子 | |
| JP4182825B2 (ja) | 日射遮蔽用アンチモン錫酸化物微粒子とこれを用いた日射遮蔽体形成用分散液および日射遮蔽体並びに日射遮蔽用透明基材 | |
| JP6171733B2 (ja) | 熱線遮蔽分散体形成用塗布液および熱線遮蔽体 | |
| EP4043400A1 (en) | Bismuth sulfide particles, method for producing same, and use of same | |
| JP2011063493A (ja) | 近赤外線遮蔽材料微粒子分散体および近赤外線遮蔽体および近赤外線遮蔽材料分散体の製造方法 | |
| JP5326058B2 (ja) | 赤外線カット材、赤外線カット材の分散液、赤外線カット膜形成用組成物、および赤外線カット膜 | |
| JP4200424B2 (ja) | 日射遮蔽材料の製造方法、日射遮蔽膜形成用塗布液および日射遮蔽膜並びに日射遮蔽用透明基材 | |
| JP4904714B2 (ja) | 赤外線遮蔽材料微粒子分散体、赤外線遮蔽体、及び赤外線遮蔽材料微粒子の製造方法、並びに赤外線遮蔽材料微粒子 | |
| JP7315354B2 (ja) | 被覆酸化亜鉛粒子及びその製造方法 | |
| JP6164132B2 (ja) | 熱線遮蔽用チタン酸リチウム粒子 | |
| JP6201841B2 (ja) | 熱線遮蔽材の製造方法 | |
| JP6623944B2 (ja) | 熱線遮蔽微粒子および熱線遮蔽微粒子分散液 | |
| JP6164133B2 (ja) | 熱線遮蔽用塗料及び熱線遮蔽膜の製造方法 | |
| JP6838396B2 (ja) | 赤外線遮蔽透明基材、赤外線遮蔽光学部材 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 13769693 Country of ref document: EP Kind code of ref document: A1 |
|
| ENP | Entry into the national phase |
Ref document number: 2014508034 Country of ref document: JP Kind code of ref document: A |
|
| ENP | Entry into the national phase |
Ref document number: 20147026971 Country of ref document: KR Kind code of ref document: A |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2013769693 Country of ref document: EP |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |