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WO2012134226A3 - Composition de solution de nettoyage pour photolithographie - Google Patents

Composition de solution de nettoyage pour photolithographie Download PDF

Info

Publication number
WO2012134226A3
WO2012134226A3 PCT/KR2012/002392 KR2012002392W WO2012134226A3 WO 2012134226 A3 WO2012134226 A3 WO 2012134226A3 KR 2012002392 W KR2012002392 W KR 2012002392W WO 2012134226 A3 WO2012134226 A3 WO 2012134226A3
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning
solution composition
photolithography
chemical formula
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2012/002392
Other languages
English (en)
Korean (ko)
Other versions
WO2012134226A2 (fr
Inventor
오승근
이재우
김재현
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongjin Semichem Co Ltd
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020110030053A external-priority patent/KR101861311B1/ko
Priority claimed from KR1020110030055A external-priority patent/KR101861310B1/ko
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of WO2012134226A2 publication Critical patent/WO2012134226A2/fr
Publication of WO2012134226A3 publication Critical patent/WO2012134226A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/37—Polymers
    • C11D3/3746—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C11D3/3757—(Co)polymerised carboxylic acids, -anhydrides, -esters in solid and liquid compositions
    • C11D3/3765—(Co)polymerised carboxylic acids, -anhydrides, -esters in solid and liquid compositions in liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/37—Polymers
    • C11D3/3746—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C11D3/3769—(Co)polymerised monomers containing nitrogen, e.g. carbonamides, nitriles or amines
    • C11D3/3773—(Co)polymerised monomers containing nitrogen, e.g. carbonamides, nitriles or amines in liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/37—Polymers
    • C11D3/3746—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C11D3/3769—(Co)polymerised monomers containing nitrogen, e.g. carbonamides, nitriles or amines
    • C11D3/3776—Heterocyclic compounds, e.g. lactam
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3245—Aminoacids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)

Abstract

L'invention concerne une composition de solution de nettoyage pour photolithographie, qui empêche l'affaissement des motifs et l'augmentation de la valeur numérique de la rugosité de largeur de trait (LWR) pouvant se produire pendant la formation d'un motif de résine photosensible, et durcit la surface du motif pour améliorer la résistance à la gravure. La composition de solution de nettoyage comprend : un polymère hydrosoluble renfermant un composé d'acide monomoléculaire exprimé dans la formule chimique 1 ou une unité de répétition exprimée dans la formule chimique 3 ; et un solvant.
PCT/KR2012/002392 2011-04-01 2012-03-30 Composition de solution de nettoyage pour photolithographie Ceased WO2012134226A2 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020110030053A KR101861311B1 (ko) 2011-04-01 2011-04-01 포토리소그래피용 세정액 조성물
KR10-2011-0030053 2011-04-01
KR10-2011-0030055 2011-04-01
KR1020110030055A KR101861310B1 (ko) 2011-04-01 2011-04-01 포토리소그래피용 세정액 조성물

Publications (2)

Publication Number Publication Date
WO2012134226A2 WO2012134226A2 (fr) 2012-10-04
WO2012134226A3 true WO2012134226A3 (fr) 2013-01-10

Family

ID=46932168

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/002392 Ceased WO2012134226A2 (fr) 2011-04-01 2012-03-30 Composition de solution de nettoyage pour photolithographie

Country Status (1)

Country Link
WO (1) WO2012134226A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102397091B1 (ko) * 2015-06-22 2022-05-12 동우 화인켐 주식회사 레지스트 박리액 조성물 및 이를 이용한 레지스트의 박리방법
WO2017009068A1 (fr) 2015-07-16 2017-01-19 Basf Se Solution de rinçage de réduction des défauts contenant des sels d'ammonium de sulfoesters

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999015609A1 (fr) * 1997-09-23 1999-04-01 Arch Specialty Chemicals, Inc. Composition aqueuse de rinçage
JP2009086344A (ja) * 2007-09-28 2009-04-23 Fujifilm Corp 平版印刷版原版の処理方法
JP2009258580A (ja) * 2008-03-25 2009-11-05 Fujifilm Corp 平版印刷版作成用処理液および平版印刷版原版の処理方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999015609A1 (fr) * 1997-09-23 1999-04-01 Arch Specialty Chemicals, Inc. Composition aqueuse de rinçage
JP2009086344A (ja) * 2007-09-28 2009-04-23 Fujifilm Corp 平版印刷版原版の処理方法
JP2009258580A (ja) * 2008-03-25 2009-11-05 Fujifilm Corp 平版印刷版作成用処理液および平版印刷版原版の処理方法

Also Published As

Publication number Publication date
WO2012134226A2 (fr) 2012-10-04

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