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WO2012111645A1 - Procédé de détection par fluorescence utilisant la spectroscopie par fluorescence accrue à champ de plasmon de surface - Google Patents

Procédé de détection par fluorescence utilisant la spectroscopie par fluorescence accrue à champ de plasmon de surface Download PDF

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Publication number
WO2012111645A1
WO2012111645A1 PCT/JP2012/053331 JP2012053331W WO2012111645A1 WO 2012111645 A1 WO2012111645 A1 WO 2012111645A1 JP 2012053331 W JP2012053331 W JP 2012053331W WO 2012111645 A1 WO2012111645 A1 WO 2012111645A1
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amount
detection method
fluorescence
fluorescence detection
measurement condition
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Japanese (ja)
Inventor
正貴 松尾
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Konica Minolta Inc
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Konica Minolta Inc
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N21/645—Specially adapted constructive features of fluorimeters
    • G01N21/648—Specially adapted constructive features of fluorimeters using evanescent coupling or surface plasmon coupling for the excitation of fluorescence

Definitions

  • the present invention relates to a fluorescence detection method based on the principle of surface plasmon excitation enhanced fluorescence spectroscopy (SPFS: Surface Plasmon-field enhanced fluorescence spectroscopy).
  • SPFS Surface Plasmon-field enhanced fluorescence spectroscopy
  • SPFS device surface plasmon excitation enhanced fluorescence measuring device
  • such an SPFS device 100 is formed, for example, on a dielectric member 102, a metal thin film 104 formed on the main surface of the dielectric member 102, and an upper surface of the metal thin film 104.
  • a sensor structure 110 having a ligand-containing layer 106 including a reaction layer G in which a ligand is immobilized at a predetermined position in the path 108 is configured to be able to be loaded.
  • the incident on the dielectric member 102 side of the sensor structure 110 is incident on the dielectric member 102 and becomes a total reflection condition toward the metal thin film 104.
  • a light source 114 for irradiating the excitation light 112 at an angle ⁇ a is provided, and a light receiving means 118 for receiving the reflected light 116 irradiated from the light source 114 and reflected by the metal thin film 104 is provided.
  • the light source 114 and the light receiving means 118 are respectively provided with movement adjusting means 130 and 132 that can move in an arc shape on the cross section of the SPFS apparatus 100 around the approximate center of the reaction layer G.
  • the irradiation angle of the excitation light 112 and the light receiving position of the reflected light 116 by the light receiving means 118 can be adjusted.
  • a light detection means 122 that receives fluorescence 120 emitted from a fluorescent substance labeled with the analyte trapped in the reaction layer G is provided.
  • a light collecting member 124 for efficiently condensing the fluorescent light 120 and light included other than the fluorescent light 120 are removed, and the necessary light is removed.
  • a wavelength selection function member 126 that selects only the fluorescence 120 is provided.
  • a sample solution having an analyte flows into the reaction layer G through the flow path 108, and thereafter, the fluorescent substance that labels the analyte is similarly passed through the flow path 108.
  • the analyte labeled with the fluorescent substance is captured in the reaction layer G.
  • the fluorescence 120 by the fluorescent material immobilized on the reaction layer G is excited, and the excited fluorescence 120 is detected by the light detection means 122 via the light collecting member 124 and the wavelength selection function member 126.
  • the light detection means 122 By detecting, an extremely small amount and / or an extremely low concentration of the analyte can be detected.
  • the excitation light 112 scattered in the reaction layer G is detected by replacing the wavelength selection function member 126 for detecting fluorescence 120 with a wavelength selection function member (not shown) for detecting scattered light.
  • the incident angle ⁇ a that maximizes the electric field intensity can also be obtained by examining the irradiation angle of the excitation light 112 that maximizes the amount of scattered light.
  • a light detection means (not shown) for detecting the amount of scattered light may be separately provided.
  • the electric field intensity and the amount of scattered light on the metal thin film 104 are, for example, the material and refractive index of the dielectric member 102 constituting the sensor structure 110, the material and film thickness of the metal thin film 104, the material and film thickness of the ligand-containing layer 106, Furthermore, it varies depending on various conditions such as the fluid flowing into the reaction layer G in the channel 108, the type of sample solution, and the amount of fluorescent substance.
  • Patent Document 1 in addition to the amount of fluorescence measured at the time of fluorescence detection, the amount of scattered light generated when the metal thin film is irradiated with excitation light under the same conditions as at the time of fluorescence detection is measured. A correction coefficient that matches the reference scattered light amount is calculated, and the amount of fluorescence measured by fluorescence detection is multiplied by this correction coefficient to numerically correct it so that the detection results between the sensor structures can be accurately compared. .
  • Patent Document 1 Although the correction method disclosed in Patent Document 1 is certainly useful if the relationship between the amount of scattered light and the electric field intensity shows the same tendency even when the sensor structure is replaced, the amount of scattered light and the electric field are actually used. As is clear from the graph shown in FIG. 12, the relationship between the strengths is that the inclination is different for each sensor structure (in FIG. 12, seven structures from sensor structures (A-1) to (C-3) are illustrated). Unlikely, there is no correlation between the sensor structures, and the same tendency is not shown.
  • the present invention has been made in view of such a current situation, and the measured fluorescence amount of the measurement target substance is numerically corrected in consideration of different electric field strengths between the sensor structures, and the measurement result between the sensor structures. It is an object of the present invention to provide a fluorescence detection method capable of accurately comparing the two.
  • the present invention was invented to solve the problems in the prior art as described above, In the fluorescence detection method of the present invention, Using a sensor structure comprising at least a dielectric member, a metal thin film formed on the upper surface of the dielectric member, and a reaction layer formed on the upper surface of the metal thin film, By irradiating excitation light from the dielectric member side at an incident angle that is a total reflection condition, the electric field on the metal thin film is enhanced, and the enhanced electric field excites the fluorescent substance that labels the analyte trapped in the reaction layer.
  • a fluorescence detection method in which the amount of fluorescence from the excited fluorescent material is measured by a light detection means, The first scattered light amount measured when the excitation light is irradiated under the first measurement condition and the second amount measured when the excitation light is irradiated under the second measurement condition different from the first measurement condition. Based on the amount of scattered light, The fluorescence amount measured by irradiating excitation light under the first measurement condition is corrected.
  • the value of the fluorescence amount measured under the first measurement condition is changed from the first scattered light amount measured when the excitation light is irradiated under the first measurement condition, and the first measurement condition is different from the first measurement light amount. If the correction is made based on the second scattered light amount measured when the excitation light is irradiated under the measurement condition 2, even if the electric field strength differs between the sensor structures, the fluorescence amount taking this into account Obtainable. Therefore, it is possible to correctly compare between the sensor structures using the fluorescence amount.
  • the first measurement condition and the second measurement condition are: The incident angle of the excitation light with respect to the metal thin film is different. Under such measurement conditions, it is possible to reliably measure the first scattered light amount and the second scattered light amount.
  • the first measurement condition is: The excitation light is irradiated at an incident angle at which the reflected light quantity of the excitation light irradiated onto the metal thin film is minimized. With such an incident angle, the first scattered light amount can be reliably measured.
  • the first measurement condition is: The excitation light is irradiated at an incident angle offset by a predetermined angle from the incident angle at which the reflected light amount of the excitation light irradiated onto the metal thin film is minimized. With such an incident angle, the first scattered light amount can be reliably measured.
  • the first measurement condition is: The excitation light is irradiated at an incident angle at which the first scattered light amount is maximum. With such an incident angle, the first scattered light amount can be reliably measured.
  • the first measurement condition is: The excitation light is irradiated at an incident angle that is offset by a predetermined angle from the incident angle at which the first scattered light amount is maximum. With such an incident angle, the first scattered light amount can be reliably measured.
  • the second measurement condition is:
  • the incident angle is such that the reflected light is not totally reflected when the metal thin film is irradiated with excitation light. With such an incident angle, the second scattered light amount can be reliably measured.
  • the second measurement condition is: The incident angle is such that the reflected light is totally reflected when the metal thin film is irradiated with excitation light. With such an incident angle, the second scattered light amount can be reliably measured.
  • the reaction layer is formed in the flow path;
  • the first measurement condition and the second measurement condition are:
  • the material filled in the flow path in which the reaction layer is formed has a different refractive index. Under such measurement conditions, it is possible to reliably measure the first scattered light amount and the second scattered light amount.
  • the substance filled in the flow path in which the reaction layer is formed in the second measurement condition is It is a substance having a lower refractive index than the substance filled in the flow path in which the reaction layer is formed under the first measurement condition. Under such measurement conditions, it is possible to reliably measure the first scattered light amount and the second scattered light amount.
  • the substance filled in the flow path in which the reaction layer is formed in the second measurement condition is It is a substance having a higher refractive index than the substance filled in the flow path in which the reaction layer is formed under the first measurement condition. Under such measurement conditions, it is possible to reliably measure the first scattered light amount and the second scattered light amount.
  • the first measurement condition and the second measurement condition are:
  • the second measurement condition differs from the first measurement condition in that a coating process is performed on a portion on the reaction layer corresponding to a region where the metal thin film is irradiated with excitation light. And thus, if a coating process is performed to the part on the reaction layer corresponding to the area
  • sucrose can be easily obtained, is effective for preserving the ligand of the reaction layer, and is easy to wash the reaction layer, so that it is suitable as a material for coating treatment.
  • the first scattered light amount and the fluorescence amount are: It is measured simultaneously when the excitation light is irradiated under the first measurement condition. By measuring in this way, the number of measurements can be minimized, and the time required to correct the fluorescence amount can be reduced.
  • the correction amount for correcting the fluorescence amount is: Based on the first scattered light amount and the second scattered light amount, it is obtained using a preset database. If a database is prepared in advance as described above, the amount of fluorescence can be instantaneously corrected based on this database.
  • the correction amount is It is obtained from the database using a ratio between the first scattered light amount and the second scattered light amount. Thus, if the ratio between the first scattered light amount and the second scattered light amount is used, an accurate fluorescence amount can be obtained.
  • the database is When each of the plurality of data collection sensor structures is irradiated with the excitation light under the first measurement condition and the third scattered light amount measured when the excitation light is irradiated under the second measurement condition It is produced based on the 4th amount of scattered light measured by these.
  • the third scattered light amount and the second scattered light amount that are measured when the data collection sensor structure is irradiated with the excitation light under the first measurement condition If the fourth scattered light amount measured when the excitation light is irradiated under the measurement conditions is obtained, it is suitable as a database.
  • the database is When each of the plurality of data collection sensor structures is irradiated with the excitation light under the first measurement condition and the third scattered light amount measured when the excitation light is irradiated under the second measurement condition It is created on the basis of the relationship between the fourth scattered light amount measured in the above and data on the electric field intensity. If a database is created based on such a relationship, the fluorescence amount of the sensor structure to be measured can be reliably corrected.
  • the database is It is created based on the relationship between the relationship between the third scattered light amount and the fourth scattered light amount and the data relating to the electric field intensity.
  • the present inventor has found that the relationship between the third scattered light amount and the fourth scattered light amount and the data related to the electric field intensity shows substantially the same relationship even if the sensor structure changes. Therefore, if the measured fluorescence value is numerically corrected in accordance with the desired electric field strength, a more accurate fluorescence amount that further considers the electric field strength that differs between the sensor structures can be obtained.
  • the database includes A correlation equation derived by collecting the data on the relationship between the third scattered light amount and the fourth scattered light amount and the electric field intensity with respect to the plurality of data collection sensor structures is stored. It is characterized by being. If such a correlation equation is stored in the database, the fluorescence amount of the sensor structure to be measured can be reliably corrected.
  • the correction coefficient is calculated by inputting the first scattered light amount and the second scattered light amount to the correlation equation, and the estimated fluorescence amount is calculated by correcting the fluorescence amount using the calculated correction coefficient. It is characterized by that. If the correction coefficient calculated in this way is used, the fluorescence amount of the sensor structure to be measured can be reliably corrected.
  • the data on the electric field strength is It is characterized by the ratio of the electric field strength to the reference value. With such data, the fluorescence amount of the sensor structure to be measured can be reliably corrected.
  • the data on the electric field strength is The calculated electric field strength is calculated by modeling and measuring the sensor structure for data collection. With such data, the fluorescence amount of the sensor structure to be measured can be reliably corrected.
  • the calculated electric field strength is It is calculated by optical calculation based on a multilayer film model that models the configuration of the data collection sensor structure and the measurement system for measuring the amount of fluorescence. With such a calculated electric field strength, the fluorescence amount of the sensor structure to be measured can be reliably corrected.
  • the data on the electric field strength is It is data calculated from the amount of fluorescence or the ratio of the amount of fluorescence to a reference value. With such data, the fluorescence amount of the sensor structure to be measured can be reliably corrected.
  • the data on the electric field strength is The data is based on the fluorescence amount obtained by arranging the same amount of fluorescent substance in the plurality of data collection sensor structures in the reaction layer and measuring the fluorescence amount of each. With such data, the fluorescence amount of the sensor structure to be measured can be reliably corrected.
  • the present invention it is possible to correct the fluorescence amount of the measurement target substance in consideration of different electric field strengths between the sensor structures, and to accurately compare the measurement results between the sensor structures using the corrected fluorescence amount. It is possible to provide a fluorescence detection method as described above.
  • FIG. 1 is a graph showing the “relation between the incident angle of excitation light and the reflectance” and the “relation between the incident angle of excitation light and the amount of scattered light”.
  • FIG. 2 is a graph showing “relationship between incident angle of excitation light and electric field intensity” when five types of substances having different refractive indexes are introduced into the reaction layer.
  • FIG. 3 is a graph visualizing the basic procedure in the fluorescence detection method of the present invention, and “third scattered light amount under first measurement conditions” and “second measurement” in three data collection sensor structures. The ratio to the “fourth scattered light amount under conditions” and the relationship to “electric field strength” are plotted in the graph.
  • FIG. 1 is a graph showing the “relation between the incident angle of excitation light and the reflectance” and the “relation between the incident angle of excitation light and the amount of scattered light”.
  • FIG. 2 is a graph showing “relationship between incident angle of excitation light and electric field intensity” when five types of substances having different refractive indexe
  • FIG. 4 is a graph visualizing the basic procedure in the fluorescence detection method of the present invention, in which straight lines correlated with the three points plotted in FIG. 3 are created.
  • FIG. 5 is a graph that visualizes the basic procedure in the fluorescence detection method of the present invention. The straight line created in FIG. 4 and the “first measurement condition under the first measurement condition” in the sensor structure that actually measures the amount of fluorescence. The point of intersection between the ratio of “the amount of scattered light” and the “second amount of scattered light under the second measurement condition” is plotted.
  • FIG. 6 is a graph visualizing the basic procedure in the fluorescence detection method of the present invention, in which the electric field strength is calculated from the intersection of the straight line plotted in FIG. 5 and the scattered light amount ratio.
  • FIG. 7 shows a plurality of data collection sensor structures, “as the first measurement condition, the amount of scattered light when a substance (sample) to be detected is introduced into the reaction layer” and “as the second measurement condition, It is the graph which showed the ratio with "the amount of scattered light at the time of introducing air into a reaction layer", and the relationship with "calculated electric field strength”.
  • FIG. 8 shows that in a plurality of data collection sensor structures, “the amount of scattered light at an incident angle at which the amount of scattered light is maximized as a first measurement condition” and “the amount of reflected light is maximized as a second measurement condition. It is the graph which showed the ratio with "the amount of scattered light in a critical angle", and the relationship with "calculated electric field strength".
  • FIG. 8 shows that in a plurality of data collection sensor structures, “the amount of scattered light at an incident angle at which the amount of scattered light is maximized as a first measurement condition” and “the amount of reflected light is maximized as a second measurement condition.
  • FIG. 10 shows that in a plurality of data collection sensor structures, “the amount of scattered light at the incident angle at which the amount of scattered light is maximized as the first measurement condition” and “the amount of scattered light is at the maximum as the second measurement condition.
  • FIG. 6 is a graph showing a ratio with “amount of scattered light at an incident angle offset by ⁇ 2 degrees from the incident angle” and a relationship with “calculated electric field intensity”.
  • FIG. 11 is a schematic diagram of a surface plasmon excitation enhanced fluorescence measuring apparatus.
  • FIG. 12 is a graph showing the relationship between “scattered light amount” and “electric field intensity” in seven different types of sensor structures.
  • the sensor structure and the surface plasmon excitation enhanced fluorescence measurement device (SPFS device) used in the fluorescence detection method of the present invention are basically the same as the configuration and operation method described in the background art section, and therefore the description thereof. Is omitted.
  • the configuration of the sensor structure and the surface plasmon excitation enhanced fluorescence measurement device (SPFS device) described in the background art section is merely an example and is not limited to this.
  • the sample solution to the reaction layer in addition to the flow path method, the supply may be a direct dropping method, a weir-provided storage method, or the like, and naturally includes changes that can be known by those skilled in the art.
  • the following terms in this specification are defined as follows. It should be noted that terms other than those described below are understood as general terms that can be known by those skilled in the art.
  • the “sensor structure” is one in which the amount of fluorescence is actually measured, and the configuration thereof is as described in the background art section.
  • the “data collection sensor structure” has the same configuration as the sensor structure in which the fluorescence amount is actually measured, and is used to create a database for correcting the fluorescence amount actually measured in the “sensor structure”. , Used for data collection.
  • reaction layer is a reaction region formed at a predetermined position of the sensor structure, for example, a region where a ligand is immobilized.
  • substrate filled in the flow path is a substance that fills the flow path in which the reaction layer is formed, and specifically flows into the flow path of the sensor structure.
  • Amount of scattered light is the amount of scattered light of excitation light generated from the other of the metal thin film when the metal thin film of the sensor structure is irradiated with excitation light from one side.
  • the “predetermined angle” is a predetermined arbitrary angle. In addition, about each angle, it describes in the specification each time.
  • the “correlation equation” is derived by collecting data relating to the relationship between the third scattered light amount and the fourth scattered light amount and the electric field intensity for a plurality of data collection sensor structures.
  • the “reference value of electric field strength” is the electric field strength of the data collection sensor structure determined as the reference in the database.
  • the “calculated electric field strength” is an electric field strength calculated by optical calculation using a multilayer film model that models the configuration of the data collection sensor structure and the measurement system for measuring the fluorescence amount.
  • Measurement system is a general term for light detection means, wavelength selection function members, light collection members, and the like.
  • the “multilayer film model” is an imaginary model in which the materials and dimensions of each component of the sensor structure including a dielectric member, a metal thin film, and a reaction layer are modeled and combined.
  • the “reference value of the fluorescence amount” was determined as a reference in the database, which is detected when a predetermined amount of fluorescent substance is placed in the reaction layer of the data collection sensor structure and the fluorescence amount is measured under a predetermined excitation condition. The amount of fluorescence.
  • the first scattered light amount measured when the excitation light is irradiated under the first measurement condition and the excitation light is irradiated under the second measurement condition different from the first measurement condition is corrected based on the relationship with the second amount of scattered light measured at the time.
  • a sensor structure that is a target for detecting the actual fluorescence amount is prepared, and excitation light is applied to the sensor structure under the first measurement condition (condition for detecting the fluorescence amount).
  • the amount of excited fluorescence is measured, and the amount of scattered light (hereinafter referred to as the first amount of scattered light) under this first measurement condition is measured.
  • this sensor structure is irradiated with excitation light under the second measurement condition (a condition different from the condition for detecting the fluorescence amount), and the amount of scattered light (hereinafter referred to as the second amount of scattered light) at this time is irradiated. taking measurement.
  • the order of measurement of the fluorescence amount and the scattered light amount under the first measurement condition and the measurement of the scattered light amount under the second measurement condition may be reversed.
  • examples of the “first measurement condition” and the “second measurement condition” include the following conditions (1) to (3).
  • the incident angle of the excitation light with respect to the metal thin film differs between the first measurement condition and the second measurement condition.
  • the first measurement condition is preferably any of the following conditions (1-1) to (1-4).
  • the incident angle at which the amount of reflected light is minimum is about 58 degrees, and it can be said that the range from 58 degrees to about plus or minus 3 degrees is the range where fluorescence can be detected.
  • the angle range may be set as appropriate depending on the configuration of the data collection sensor structure. Specifically, with the angle of incidence at which the amount of reflected light is minimized, the range within which fluorescence can be detected is preferably set to plus or minus 10 degrees, more preferably plus or minus 5 degrees.
  • Excitation light is irradiated at an incident angle offset by a predetermined angle from the incident angle at which the amount of scattered light is maximum.
  • the graph showing the relationship between the incident angle of the excitation light and the amount of scattered light shown in FIG. 1 is a mountain-shaped curve, where the rising and falling slopes of the curve are abrupt and peaks.
  • the area where the fluorescence is detected is a range where fluorescence can be detected.
  • the incident angle at which the amount of scattered light is maximum is about 57.5 degrees, and it can be said that the range from 57.5 degrees to about plus or minus 3 degrees can be detected by fluorescence. Note that this angle range may be set as appropriate depending on the configuration of the sensor structure. Specifically, with the incident angle at which the amount of scattered light is maximized as a reference, the range within which fluorescence can be detected is preferably plus or minus 10 degrees, more preferably plus or minus 5 degrees.
  • the second measurement condition is preferably any one of the following conditions (1-5) to (1-6).
  • (1-5) When the excitation light is irradiated onto the metal thin film, the excitation light is irradiated at an incident angle at which the reflected light is not totally reflected. In other words, it is preferably a valley-shaped curve showing the relationship between the incident angle and the reflectance in FIG. Although the angle below this critical angle has a certain range, the incident angle different from the incident angle of the excitation light at the time of fluorescence detection here is one angle within the range below the critical angle.
  • (1-6) Excitation light is irradiated at an incident angle at which the reflected light is totally reflected when the metal thin film is irradiated with excitation light. In other words, it is preferably a valley-shaped curve showing the relationship between the incident angle and the reflectance in FIG. 1, and the range of the incident angle before falling into the valley and after rising from the valley.
  • the first measurement condition and the second measurement condition differ in the refractive index of the substance filled in the flow path in which the reaction layer is formed.
  • the first measurement condition and the second measurement condition are preferably any of the following conditions (2-1) to (2-2).
  • the substance filled in the flow path in which the reaction layer is formed under the second measurement condition has a refractive index higher than that of the substance filled in the flow path in which the reaction layer is formed in the first measurement condition.
  • the substance filled in the flow path in which the reaction layer is formed under the second measurement condition has a refractive index higher than that of the substance filled in the flow path in which the reaction layer is formed in the first measurement condition. High substance.
  • the first measurement condition and the second measurement As a method of creating the conditions, a method of changing the substance filled in the flow path in which the reaction layer is formed is preferable.
  • the first measurement condition and the second measurement condition are a part on the reaction layer corresponding to a region where the second thin film is irradiated with excitation light with respect to the first measurement condition. It differs depending on the coating treatment.
  • the coating treatment may be performed using any material, but for example, sucrose is easily available, is effective for storing the ligand in the assay region, and is easy to wash. Therefore, it is suitable as a material for coating treatment.
  • the region corresponding to the position where the metal thin film is irradiated with the excitation light may have a refractive index different between the first measurement condition and the second measurement condition.
  • the first measurement condition and A coating process may be performed with materials having different refractive indexes under the second measurement conditions. In order to realize a simple coating process, it is preferable to perform a coating process so as to cover at least the entire reaction layer.
  • the amount of fluorescence is preferably measured.
  • This fluorescence amount is a numerical value to be corrected finally. If the fluorescence amount is measured together with the first scattered light amount, the number of times of measurement can be minimized, and the time required to correct the fluorescence amount can be reduced. Can be reduced.
  • correction amount is necessary.
  • This correction amount (correction coefficient) is based on the first scattered light amount and the second scattered light amount. It is obtained using a preset database.
  • the data constituting the database is, for example, as described in (A) to (E) below.
  • A) Data of the third amount of scattered light measured when each of the sensor structures for data collection is irradiated with excitation light under the first measurement condition.
  • B) Data of the fourth scattered light amount measured when the excitation light is irradiated under the second measurement condition.
  • C) Data on electric field strength.
  • D) Data of the ratio between the third scattered light amount and the fourth scattered light amount.
  • E Correlation formula data derived by collecting data relating to the ratio between the third scattered light amount and the fourth scattered light amount and the electric field strength to a plurality of data collection sensor structures.
  • the “data on electric field strength” includes the following (a) to (d).
  • (A) Data of the ratio of the electric field strength to the reference value.
  • (B) Data of the calculated electric field intensity calculated by modeling and measuring the sensor structure for data collection. (Here, the calculated electric field intensity is calculated by optical calculation using a multilayer film model that models the configuration of the data collection sensor structure and the measurement system for measuring the fluorescence amount.)
  • (C) Data calculated from the amount of fluorescence or the ratio of the amount of fluorescence to the reference.
  • (D) Data based on the fluorescence amount obtained by arranging the same amount of fluorescent substance in the reaction layer in a plurality of data collection sensor structures and measuring the respective fluorescence amounts.
  • the number of sensor structures for data collection prepared here is not particularly limited, but it is better as the number distribution is clarified in view of the distribution of measured values.
  • it is preferably 20 or more. .
  • a graph is prepared in which the ratio of the third scattered light amount and the fourth scattered light amount of the data collection sensor structure is taken on the X axis and the electric field strength is taken on the Y axis.
  • Each point of each data collection sensor structure (here, three from (1) to (3)) based on the values of the third scattered light quantity, the fourth scattered light quantity, and the electric field intensity is plotted in the graph.
  • a “line” is obtained from the set of previously plotted points (here, 3 points).
  • the “line” is, for example, a straight line or a curve, and a correlation expression (for example, a linear function, a quadratic function, or the like) representing the “line” is obtained.
  • the correction amount (correction coefficient) is calculated by inputting the first scattered light amount and the second scattered light amount in the sensor structure to the correlation equation thus obtained.
  • a correction coefficient is calculated from the ratio between the electric field strength determined in advance as a reference and the estimated electric field strength of the actual fluorescence amount detecting sensor structure.
  • the electric field strength y1 of the sensor structure for data collection (1) and the estimated electric field strength y2 of the sensor structure for actual fluorescence detection are a correction coefficient.
  • the estimated fluorescence amount is calculated from the actually measured fluorescence amount. Through this process, it is possible to calculate the estimated fluorescence amount (estimated fluorescence amount) from the actually measured fluorescence amount, and by using this estimated fluorescence amount, the measurement results between the sensor structures are accurately compared. be able to.
  • Example 1 Five types of data collection sensor structures having a metal thin film (gold film in this embodiment) having a thickness of 41 nm, 44 nm, 46 nm, 48 nm, and 51 nm are prepared, and a refractive index n is used as a substance to be introduced into the reaction layer. A plurality of substances whose values are varied up and down around 1.3325 are prepared.
  • a plurality of substances are sequentially introduced into the reaction layers of the five types of data collection sensor structures, and the excitation light is incident at an incident angle at which the amount of scattered light is maximized as a first measurement condition in each of the data collection sensor structures. And the amount of scattered light (third amount of scattered light) at this time was measured.
  • Measurement of the third scattered light amount and the fourth scattered light amount was performed on the prepared sensor structure for data collection, and a database was created from the obtained results. Based on the database, calculate the ratio between the third scattered light amount and the fourth scattered light amount, and calculate by optical calculation based on the multilayer film model that models the structure of the sensor structure for data collection and the measurement system The calculated electric field strength was calculated.
  • FIG. 7 shows the relationship between the “ratio between the third scattered light amount and the fourth scattered light amount” and “calculated electric field strength” for the prepared data collection sensor structure, and these are represented by lines.
  • a correlation line y ⁇ 0.0076x + 17.004 was obtained.
  • the correlation coefficient indicating the correlation of data of the prepared data collection sensor structure was 0.8653, and it was confirmed that the correlation was very high.
  • Example 2 Five types of data collection sensor structures having a metal thin film (gold film in this embodiment) having a thickness of 41 nm, 44 nm, 46 nm, 48 nm, and 51 nm are prepared, and a refractive index n is used as a substance to be introduced into the reaction layer. A plurality of substances whose values are varied up and down around 1.3325 are prepared.
  • a plurality of substances are sequentially introduced into the reaction layers of the five types of data collection sensor structures, and the excitation light is incident at an incident angle at which the amount of scattered light is maximized as a first measurement condition in each of the data collection sensor structures. And the amount of scattered light (third amount of scattered light) at this time was measured.
  • the amount of scattered light (fourth amount of scattered light) when the excitation light is irradiated onto the metal thin film at a critical angle that maximizes the amount of reflected light is measured.
  • the measurement of the third scattered light amount and the fourth scattered light amount was performed on the prepared sensor structure for data collection, and a database was created from the obtained results.
  • the ratio between the third scattered light amount and the fourth scattered light amount is obtained based on the database, and is further calculated by optical calculation based on the multilayer film model that models the configuration of the sensor structure for data collection and the measurement system.
  • the calculated electric field strength was calculated.
  • the correlation coefficient indicating the correlation degree of the data of the prepared data collection sensor structure is 0.6076, and it was confirmed that the correlation of these data can be obtained to some extent.
  • Example 3 Five types of data collection sensor structures having a metal thin film (gold film in this embodiment) having a thickness of 41 nm, 44 nm, 46 nm, 48 nm, and 51 nm are prepared, and a refractive index n is used as a substance to be introduced into the reaction layer. A plurality of substances whose values are varied up and down around 1.3325 are prepared.
  • a plurality of substances are sequentially introduced into the reaction layers of the five types of data collection sensor structures, and the excitation light is incident at an incident angle at which the amount of scattered light is maximized as a first measurement condition in each of the data collection sensor structures. And the amount of scattered light (third amount of scattered light) at this time was measured.
  • the amount of scattered light (fourth amount of scattered light) when the excitation light is irradiated onto the metal thin film at an incident angle offset by ⁇ 10 degrees from the angle of incidence at which the amount of scattered light is maximized is measured.
  • the measurement of the third scattered light amount and the fourth scattered light amount was performed on the prepared sensor structure for data collection, and a database was created from the obtained results.
  • the ratio between the third scattered light amount and the fourth scattered light amount is obtained based on the database, and is further calculated by optical calculation based on the multilayer film model that models the configuration of the sensor structure for data collection and the measurement system.
  • the calculated electric field strength was calculated.
  • Example 4 Five types of data collection sensor structures having a metal thin film (gold film in this embodiment) having a thickness of 41 nm, 44 nm, 46 nm, 48 nm, and 51 nm are prepared, and a refractive index n is used as a substance to be introduced into the reaction layer. A plurality of substances whose values are varied up and down around 1.3325 are prepared.
  • a plurality of substances are sequentially introduced into the reaction layers of the five types of data collection sensor structures, and the excitation light is incident at an incident angle at which the amount of scattered light is maximized as a first measurement condition in each of the data collection sensor structures. And the amount of scattered light (third amount of scattered light) at this time was measured.
  • the amount of scattered light (fourth amount of scattered light) when the excitation light is irradiated onto the metal thin film at an incident angle offset by -2 degrees from the angle of incidence at which the amount of scattered light is maximized is measured.
  • the measurement of the third scattered light amount and the fourth scattered light amount was performed on the prepared sensor structure for data collection, and a database was created from the obtained results.
  • the ratio between the third scattered light amount and the fourth scattered light amount is obtained based on the database, and is further calculated by optical calculation based on the multilayer film model that models the configuration of the sensor structure for data collection and the measurement system.
  • the calculated electric field strength was calculated.
  • the correlation coefficient indicating the degree of correlation of the data of the prepared data collection sensor structure is 0.1344, and it was confirmed that the correlation between these data was obtained to some extent. Comparing the above Examples 1 to 4, the value of the correlation coefficient decreases as going from Example 1 to Example 4, and the order of the preferred examples is the order of Example 1 to Example 4.
  • the correlation coefficient is very high at 0.8653, which is suitable as the fluorescence detection method of the present invention.
  • SPFS device Surface plasmon excitation enhanced fluorescence measuring device
  • Dielectric member 104
  • Metal thin film 106
  • Ligand containing layer 108
  • Channel 110
  • Sensor structure 112
  • Excitation light 114
  • Light source 116
  • Reflected light 118:
  • Light receiving means 120 ... Fluorescence 122 .
  • Light detecting means 124
  • Condensing member 126
  • Wavelength selection function member 130 ... Movement adjusting means 132 ... Movement adjusting means G ... ⁇ Reaction layer ⁇ a ⁇ ⁇ Angle of incidence

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  • Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

[Problème] Le but de l'invention est de fournir un procédé de détection par fluorescence qui permette de comparer avec précision les résultats de mesure entre des structures de capteurs en corrigeant la quantité de fluorescence d'une substance à mesurer en tenant compte de l'intensité du champ électrique qui diffère entre les structures de capteurs.[Solution] L'invention concerne ainsi un procédé de détection par fluorescence qui utilise une structure de capteurs comprenant au moins un élément diélectrique, un film fin métallique formé sur la surface supérieure de l'élément diélectrique, et une couche de réaction formée sur la surface supérieure du film fin métallique. Une lumière d'excitation est appliquée à un angle d'incidence qui devient une condition de réflexion totale depuis le côté de l'élément diélectrique afin d'amplifier un champ électrique sur le film fin métallique. Une substance fluorescente, avec laquelle un analyte capturé par la couche de réaction est marqué, est excitée par le champ électrique amplifié, et la quantité de fluorescence émanant de la substance fluorescente excitée est mesurée par le moyen de détection de lumière. En fonction d'une première quantité de lumière diffusée mesurée lorsque la lumière d'excitation est appliquée selon une première condition de mesure, et d'une seconde quantité de lumière diffusée mesurée lorsque la lumière d'excitation est appliquée selon une seconde condition de mesure différente de la première condition de mesure, la quantité de fluorescence mesurée en appliquant la lumière d'excitation selon la première condition de mesure est corrigée.
PCT/JP2012/053331 2011-02-18 2012-02-14 Procédé de détection par fluorescence utilisant la spectroscopie par fluorescence accrue à champ de plasmon de surface Ceased WO2012111645A1 (fr)

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EP3644046A4 (fr) * 2017-06-23 2020-07-08 Konica Minolta, Inc. Dispositif de détection d'échantillon et procédé de détection d'échantillon

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US20060127278A1 (en) * 2002-04-26 2006-06-15 Gast Alice P System and method of measuring molecular interactions
WO2008102417A1 (fr) * 2007-02-19 2008-08-28 Japan Science And Technology Agency Lecteur de fluorescence et procédé de lecture de fluorescence
JP2009216532A (ja) * 2008-03-11 2009-09-24 Fujifilm Corp 蛍光検出方法および蛍光検出装置
JP2010008263A (ja) * 2008-06-27 2010-01-14 Fujifilm Corp 検出方法、検出用試料セルおよび検出用キット
WO2010010751A1 (fr) * 2008-07-25 2010-01-28 株式会社 日立ハイテクノロジーズ Dispositif d'observation par fluorescence à réflexion totale

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JP4993308B2 (ja) * 2008-03-31 2012-08-08 富士フイルム株式会社 蛍光検出方法および蛍光検出装置

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Publication number Priority date Publication date Assignee Title
US20060127278A1 (en) * 2002-04-26 2006-06-15 Gast Alice P System and method of measuring molecular interactions
WO2008102417A1 (fr) * 2007-02-19 2008-08-28 Japan Science And Technology Agency Lecteur de fluorescence et procédé de lecture de fluorescence
JP2009216532A (ja) * 2008-03-11 2009-09-24 Fujifilm Corp 蛍光検出方法および蛍光検出装置
JP2010008263A (ja) * 2008-06-27 2010-01-14 Fujifilm Corp 検出方法、検出用試料セルおよび検出用キット
WO2010010751A1 (fr) * 2008-07-25 2010-01-28 株式会社 日立ハイテクノロジーズ Dispositif d'observation par fluorescence à réflexion totale

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3644046A4 (fr) * 2017-06-23 2020-07-08 Konica Minolta, Inc. Dispositif de détection d'échantillon et procédé de détection d'échantillon
US11353401B2 (en) 2017-06-23 2022-06-07 Otsuka Pharmaceutical Co., Ltd Specimen detection device and specimen detection method

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