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WO2012147876A1 - Stratifié anti-réflexion - Google Patents

Stratifié anti-réflexion Download PDF

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Publication number
WO2012147876A1
WO2012147876A1 PCT/JP2012/061268 JP2012061268W WO2012147876A1 WO 2012147876 A1 WO2012147876 A1 WO 2012147876A1 JP 2012061268 W JP2012061268 W JP 2012061268W WO 2012147876 A1 WO2012147876 A1 WO 2012147876A1
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WO
WIPO (PCT)
Prior art keywords
refractive index
index layer
layer
oxide
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2012/061268
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English (en)
Japanese (ja)
Inventor
健輔 藤井
佐藤　浩二
興太 堀
保 森本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to EP12776857.0A priority Critical patent/EP2703851B1/fr
Priority to KR1020137019623A priority patent/KR101458733B1/ko
Priority to CN201280019907.1A priority patent/CN103492914B/zh
Priority to JP2013512443A priority patent/JP5527482B2/ja
Publication of WO2012147876A1 publication Critical patent/WO2012147876A1/fr
Priority to US14/064,518 priority patent/US9025248B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only

Definitions

  • the present invention relates to an antireflection laminate.
  • an antireflection laminate such as an antireflection film has been provided on the image display surface.
  • the antireflection laminate is designed to reduce reflection over the entire visible light wavelength range.
  • a high refractive index oxide layer and a low refractive index oxide layer are alternately laminated on a transparent substrate. Things are known.
  • the number of stacked layers of the high refractive index oxide layer and the low refractive index oxide layer is not necessarily limited. However, from the viewpoint of productivity, generally, the high refractive index oxide layer and the low refractive index oxide layer are combined. The total number of layers is about 4 (see, for example, Patent Document 1).
  • the antireflection laminate is required to have scratch resistance, water resistance, antifouling property, etc. in addition to low reflectance.
  • the antireflection laminate has an appropriate chromatic color and a change in the incident angle of light in order to improve the appearance of an image display device or the like equipped with the antireflection laminate. It is required that a change in reflected color, that is, so-called multicoloring is suppressed. That is, the reflection color when viewed from the front has an appropriate chromatic color that does not have excessive blueness, etc., and the reflection color when viewed from an oblique direction has white that does not have excessive redness, etc. Is required.
  • a first oxide layer, a second oxide layer, and a third oxide layer are provided on a substrate as a reflection color having an appropriate chromatic color and suppressing the multicolorization.
  • the refractive index of the first oxide is 1.74 to 1.88
  • the film thickness is 45 to 65 nm
  • the refractive index of the second oxide layer is 1.9 to 2.1
  • the film thickness is 90 to 110 nm
  • a third oxide layer having a refractive index of 1.48 or less and a film thickness of 80 to 110 nm is known (see, for example, Patent Document 2).
  • the reflective color is appropriately controlled by keeping the refractive index and film thickness of the oxide layer within a predetermined range. It is known that the chromatic color is reduced and the multi-coloring is suppressed.
  • the reflectance luminous reflectance
  • the reflectance exceeds 0.7%, and it is required to further reduce the reflectance.
  • the film thickness of the oxide layer may not necessarily be a desired film thickness due to a slight difference in manufacturing conditions.
  • the reflected color does not become an appropriate chromatic color, and the reflected color may change greatly.
  • the present invention has been made in order to solve the above-described problems, and provides an antireflection laminate in which the reflection color has an appropriate chromatic color, the multicoloration is suppressed, and the reflectance is also reduced.
  • the purpose is to do.
  • the antireflection laminate of the present invention has a substrate and an antireflection layer laminated on the substrate.
  • the antireflection layer has a four-layer structure, and has a first refractive index layer, a second refractive index layer, a third refractive index layer, and a fourth refractive index layer in order from the substrate side. .
  • the refractive index of the first refractive index layer is 1.6 to 1.9
  • the refractive index of the second refractive index layer is 2.2 to 2.5
  • the refractive index of the third refractive index layer is The refractive index is 2.0 to 2.3
  • the refractive index of the fourth refractive index layer is 1.2 to 1.5.
  • the refractive index of the second refractive index layer is larger than the refractive index of the third refractive index layer.
  • the antireflection layer has a four-layer structure, and the refractive index of each refractive index layer is within a predetermined range, so that the reflection color is moderated while reducing the reflectance.
  • the chromatic color can be reduced, and the increase in color can be suppressed.
  • the change in the reflected color can be almost suppressed.
  • FIG. 1 is a cross-sectional view showing an example of an antireflection laminate.
  • the antireflection laminate 1 has, for example, a base 2 and an antireflection layer 3 laminated on the base 2.
  • the antireflection layer 3 includes a first refractive index layer 31 having a refractive index of 1.6 to 1.9 and a second refractive index layer having a refractive index of 2.2 to 2.5 in order from the base 2 side. 32, a third refractive index layer 33 having a refractive index of 2.0 to 2.3, and a fourth refractive index layer 34 having a refractive index of 1.2 to 1.5.
  • the refractive index of the second refractive index layer is preferably larger than the refractive index of the third refractive index layer.
  • the refractive index is a refractive index in light having a wavelength of 550 nm.
  • the film thicknesses of the first refractive index layer 31 to the fourth refractive index layer 34 are relatively close.
  • the ratio of the film thickness of the layer having the maximum film thickness to the film thickness of the layer having the minimum film thickness is preferably more than 1 and 5 or less. More preferably, it is more than 1 and 3 or less.
  • the change of the reflected color with respect to the change of an incident angle can be reduced, and multi-coloring can be suppressed effectively.
  • the reflectance can be reduced while the reflection color is set to an appropriate chromatic color and the change in the reflection color with respect to the change in the incident angle is reduced.
  • the reflected color is appropriately chromatic.
  • the change in the reflected color with respect to the change in the incident angle can be reduced, and the increase in the number of colors can be effectively suppressed.
  • the substrate 2 is not particularly limited as long as it has transparency, and can be, for example, a rigid plate or a flexible polymer film.
  • Examples of the material for the plate-like body include general glass mainly composed of silicon dioxide, inorganic glass made of inorganic materials having various compositions, and organic materials such as transparent acrylic resin and polycarbonate resin.
  • polymer film examples include polyester films such as polyethylene terephthalate, polyolefin films such as polypropylene, polyvinyl chloride films, acrylic resin films, polyether sulfone films, polyarylate films, and polycarbonate films.
  • the thickness of the substrate 2 can be appropriately selected depending on the application.
  • the thickness is about 0.1 to 5 mm, more preferably 0.2 to 2 mm, and it is composed of a polymer film. In this case, about 50 to 200 ⁇ m is preferable, and 75 to 150 ⁇ m is more preferable.
  • substrate 2 is not necessarily restricted to the single
  • the antireflection layer 3 has a four-layer structure, and in order from the substrate 2 side, a first refractive index layer 31 having a refractive index of 1.6 to 1.9 and a refractive index of 2.2 to 2.
  • a second refractive index layer 32 having a refractive index of 5
  • a third refractive index layer 33 having a refractive index of 2.0 to 2.3
  • the first refractive index layer 31 has a refractive index of 1.6 to 1.9.
  • the refractive index is less than 1.6 or exceeds 1.9, the reflected color does not become an appropriate chromatic color, and the change in the reflected color becomes sensitive to the change in the incident angle, so that it is easy to increase the number of colors.
  • the refractive index of the first refractive index layer 31 is preferably 1.65 to 1.87, more preferably 1.70 to 1.85.
  • the constituent material of the first refractive index layer 31 is not particularly limited as long as the refractive index is in the range of 1.6 to 1.9.
  • silicon oxide, indium oxide, tin oxide examples thereof include metal oxides such as niobium oxide, titanium oxide, zirconium oxide, cerium oxide, tantalum oxide, aluminum oxide, and zinc oxide.
  • the first refractive index layer 31 may be composed of only one kind selected from these metal oxides, but is easily within a range of 1.6 to 1.9 which is a medium refractive index. From the above, it is preferable to comprise two or more kinds. In the case of two or more kinds, a composite oxide of the two kinds of metals may be further included.
  • the first refractive index layer 31 can be suitably formed by a dry method, for example, a chemical vapor deposition (CVD) method or a physical vapor deposition (PVD) method, particularly a vacuum vapor deposition method or a sputtering method which is a kind of physical vapor deposition method. .
  • CVD chemical vapor deposition
  • PVD physical vapor deposition
  • the thickness of the first refractive index layer 31 is preferably 40 to 100 nm.
  • the reflected color can be easily made into an appropriate chromatic color, the change in the reflected color with respect to the change in the incident angle is reduced, and the multicolor is effectively suppressed. it can.
  • the reflectance can also be effectively reduced by setting the thickness of the first refractive index layer 31 to 40 nm or more.
  • the thickness of the first refractive index layer 31 is sufficient if it is 100 nm, and if it is less than this, the productivity can be improved.
  • the first refractive index layer 31 has a larger influence on multicoloring than the second refractive index layer 32 to the fourth refractive index layer 34.
  • the thickness of the first refractive index layer 31 is preferably 40 nm or more.
  • the thickness of the first refractive index layer 31 is preferably 50 to 90 nm, more preferably 60 to 80 nm.
  • the second refractive index layer 32 has a refractive index of 2.2 to 2.5.
  • the refractive index is less than 2.2 or more than 2.5, the reflected color does not become an appropriate chromatic color, and the change in the reflected color becomes sensitive to the change in the incident angle, so that it is easy to increase the number of colors.
  • the refractive index of the second refractive index layer 32 is preferably 2.23 to 2.47, more preferably 2.25 to 2.45.
  • the constituent material of the second refractive index layer 32 is not particularly limited as long as the refractive index is in the range of 2.2 to 2.5, but a relatively high refractive index can be obtained, for example, Examples thereof include metal oxides such as niobium oxide and titanium oxide.
  • the second refractive index layer 32 may be composed of only one selected from these, or may be composed of two or more selected from the group in which silicon oxide is added to these metal oxides. It is good. In the case of two or more kinds, a composite oxide of the two kinds of metals may be further included.
  • the second refractive index layer 32 can be suitably formed by a dry method, for example, a chemical vapor deposition (CVD) method or a physical vapor deposition (PVD) method, particularly a vacuum vapor deposition method or a sputtering method which is a kind of physical vapor deposition method. .
  • CVD chemical vapor deposition
  • PVD physical vapor deposition
  • the thickness of the second refractive index layer 32 is preferably 30 to 80 nm. By setting the thickness of the second refractive index layer 32 to 30 nm or more, it is easy to make the reflected color an appropriate chromatic color, and the change in the reflected color with respect to the change in the incident angle is reduced, thereby effectively suppressing multicoloring. it can. Furthermore, the reflectance can also be effectively reduced by setting the thickness of the second refractive index layer 32 to 30 nm or more. The thickness of the second refractive index layer 32 is sufficient if it is 80 nm, and if it is less than this, the productivity can be improved. The thickness of the second refractive index layer 32 is preferably 35 to 70 nm, more preferably 40 to 60 nm.
  • the third refractive index layer 33 has a refractive index of 2.0 to 2.3.
  • the refractive index is less than 2.0 or exceeds 2.3, the reflected color does not become an appropriate chromatic color, and the change in the reflected color becomes sensitive to the change in the incident angle, so that it is easy to increase the number of colors.
  • the refractive index is less than 2.0 or exceeds 2.3, the reflectance may not be sufficiently reduced.
  • the refractive index of the third refractive index layer 33 needs to be smaller than the refractive index of the second refractive index layer 32.
  • the refractive index of the third refractive index layer 33 is larger than the refractive index of the second refractive index layer 32, the reflectance may not be sufficiently reduced.
  • the refractive index of the third refractive index layer 33 is preferably 2.05 to 2.28, more preferably 2.10 to 2.25.
  • the constituent material of the third refractive index layer 33 is not particularly limited as long as the refractive index is in the range of 2.0 to 2.3.
  • silicon oxide, indium oxide, tin oxide examples thereof include metal oxides such as niobium oxide, titanium oxide, zirconium oxide, cerium oxide, tantalum oxide, aluminum oxide, and zinc oxide.
  • the third refractive index layer 33 may be composed of only one kind selected from these metal oxides, but it should be easily in the range of 2.0 to 2.3 which is a medium refractive index. From the above, it is preferable to comprise two or more kinds. In the case of two or more kinds, a composite oxide of the two kinds of metals may be further included.
  • the third refractive index layer 33 can be suitably formed by a dry method, for example, a chemical vapor deposition (CVD) method or a physical vapor deposition (PVD) method, particularly a vacuum vapor deposition method or a sputtering method which is a kind of physical vapor deposition method. .
  • CVD chemical vapor deposition
  • PVD physical vapor deposition
  • the thickness of the third refractive index layer 33 is preferably 30 to 90 nm.
  • the thickness of the third refractive index layer 33 is preferably 40 to 80 nm, and more preferably 50 to 75 nm.
  • the fourth refractive index layer 34 has a refractive index of 1.2 to 1.5.
  • the refractive index is less than 1.2 or more than 1.5, the reflected color does not become an appropriate chromatic color, and the change in the reflected color becomes sensitive to the change in the incident angle, so that it is easy to increase the number of colors. Furthermore, when the refractive index is less than 1.2 or exceeds 1.5, the reflectance may not be sufficiently reduced.
  • the refractive index of the fourth refractive index layer 34 is preferably 1.23 to 1.45, and more preferably 1.25 to 1.40.
  • the thickness of the fourth refractive index layer 34 is preferably 60 to 120 nm. By setting the thickness of the fourth refractive index layer 34 to 60 nm or more, it is easy to make the reflected color an appropriate chromatic color, and the change in the reflected color with respect to the change in the incident angle is reduced, thereby effectively suppressing multicoloring. it can. Furthermore, the reflectance can also be effectively reduced by setting the thickness of the fourth refractive index layer 34 to 60 nm or more. The thickness of the fourth refractive index layer 34 is sufficient if it is 120 nm, and if it is less than this, the productivity can be improved. The thickness of the fourth refractive index layer 34 is preferably 70 to 110 nm, more preferably 80 to 100 nm.
  • the fourth refractive index layer 34 is not particularly limited as long as the refractive index is in the range of 1.2 to 1.5, and a low refractive material such as silicon oxide or magnesium fluoride is used as a constituent material. Further, it may be formed by a dry method, that is, a chemical vapor deposition (CVD) method or a physical vapor deposition (PVD) method. In addition, it is easy to make the refractive index within a low refractive index range of 1.2 to 1.5, and other properties such as antifouling property, water resistance, chemical resistance, etc. are easily imparted. Those formed by the above are preferred.
  • CVD chemical vapor deposition
  • PVD physical vapor deposition
  • Examples of the wet process include those containing low refractive index fine particles, specifically, those containing low refractive index fine particles in a matrix component serving as a binder.
  • the low refractive index fine particles for example, those having a refractive index of 1.10 to 1.40 are preferable.
  • the refractive index of the low refractive index fine particles is preferably 1.15 to 1.35, more preferably 1.20 to 1.30.
  • the constituent material of the low refractive index fine particles is preferably silicon oxide or magnesium fluoride having a low refractive index, and silicon oxide is preferable from the viewpoint of refractive index, dispersion stability, and cost.
  • Low refractive index fine particles composed of silicon oxide include silica particles synthesized by reacting silicon alkoxide with a basic catalyst such as ammonia by a sol-gel method, colloidal silica using sodium silicate as a raw material, and gas phase. Examples include synthesized fumed silica.
  • hollow silica particles having a hollow structure in which voids are formed inside the outer shell are particularly preferable.
  • the hollow silica particles have a small refractive index due to the voids formed therein, and can effectively reduce the refractive index of the fourth refractive index layer 34.
  • the hollow silica particles may be in a state where a part of the voids are exposed to the outside of the outer shell of the particles, that is, a state where the voids inside the hollow silica particles are connected to the outside of the hollow silica particles.
  • the shape of the hollow silica particles is not particularly limited, and examples thereof include a spherical shape, an oval shape, a spindle shape, and an amorphous shape.
  • hollow silica particles those produced by a known production method can be used.
  • core particles that can be removed by post-treatment are formed, and in the second stage, the core particles are coated.
  • a shell layer is formed, and as a third step, a layer obtained by a method of dissolving core particles can be used.
  • the average particle size of the low refractive index fine particles is preferably 20 to 100 nm, more preferably 30 to 90 nm, and particularly preferably 40 to 80 nm.
  • the average particle diameter of the low refractive index fine particles is preferably 20 to 100 nm, more preferably 30 to 90 nm, and particularly preferably 40 to 80 nm.
  • the particle size of the low refractive index fine particles is 100 nm or less, it is possible to suppress the occurrence of excessive unevenness on the surface of the fourth refractive index layer 34, to improve the appearance and the like, and to improve the particle itself. Durability can also be improved.
  • the average particle diameter of the low-refractive-index fine particles is actually primary particles (aggregated to form chain-like secondary particles in a planar field of view by, for example, 10,000 to 50,000 times transmission electron microscope.
  • the porosity is preferably 10 to 80%, more preferably 20 to 60%.
  • the refractive index of the particles themselves can be effectively reduced by the internal voids, and the refractive index of the fourth refractive index layer 34 can be reduced.
  • grains can be made favorable by making a porosity into 80% or less.
  • the matrix component inorganic compounds are preferable, and metal oxides are more preferable.
  • Suitable examples of the metal oxide include silicon oxide, aluminum oxide, titanium oxide, zirconium oxide, and tantalum oxide.
  • Such a matrix component is made from a hydrolyzable metal compound as a raw material.
  • metal alkoxides of silicon, aluminum, titanium, zirconium and tantalum are preferable from the viewpoint of film strength and chemical stability.
  • metal alkoxides silicon tetraalkoxide, aluminum trialkoxide, titanium tetraalkoxide, zirconium tetraalkoxide and the like are preferably used.
  • Preferred examples of the alkoxy group contained in the alkoxide include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group.
  • a silicon alkoxide particularly silicon tetraalkoxide or an oligomer thereof, from which a low refractive index can be obtained is preferable as a raw material for the matrix component.
  • a raw material for the matrix component a mixture of a plurality of these metal alkoxides may be used.
  • the raw material of the matrix component is not necessarily limited as long as a reaction product of M (OH) n can be obtained by hydrolysis other than metal alkoxide.
  • the metal compound which has is illustrated.
  • a compound represented by R 1 n M (OR 2 ) 4-n which is a kind of silicon alkoxide (M is a silicon atom, R 1 is an alkyl group, an amino group, an epoxy group, a phenyl group, a methacryloxy group, etc.
  • An organic functional group, R 2 is an alkyl group, and n is an integer of 1 to 3, for example.
  • the content of the low refractive index fine particles in the fourth refractive index layer 34 is preferably 40 to 95% by mass, more preferably 50 to 90% by mass, and more preferably 60 to 85% in the total amount of the matrix component and the low refractive index fine particles. Mass% is particularly preferred.
  • the fourth refractive index layer 34 may contain other components as long as it does not contradict the spirit of the present invention and, if necessary.
  • other components include an antifouling agent, and specific examples include fluorine-containing alkoxysilanes and dimethyl silicone.
  • fluorine-containing alkoxysilane include fluorotriethoxysilane, trifluoropropyltrimethoxysilane, tridecafluorooctyltrimethoxysilane, heptadecafluorodecyltrimethoxysilane and the like.
  • An antifouling agent may be used individually by 1 type, and may use 2 or more types together.
  • the antifouling agent is preferably 0.01 to 10% by mass in the entire constituent material of the fourth refractive index layer 34.
  • components other than the antifouling agent for example, an ultraviolet absorber, a pigment, and the like may be included as long as they do not contradict the spirit of the present invention.
  • a component is preferably 5% by mass or less in the entire constituent material of the fourth refractive index layer 34.
  • the fourth refractive index layer 34 can be formed as follows, for example. First, a low-refractive-index fine particle, a hydrolyzable metal compound serving as a matrix component, a catalyst for hydrolysis, water, and a solvent are mixed, and the hydrolyzable metal compound is hydrolyzed to prepare a coating liquid.
  • the hydrolysis can be performed, for example, by stirring for 1 to 24 hours at room temperature or by stirring for 10 to 50 minutes at a temperature higher than room temperature, for example, 40 to 80 ° C.
  • the hydrolyzable metal compound may be hydrolyzed in the state of being mixed with the low refractive index fine particles as described above, or may be previously hydrolyzed and then mixed with the low refractive index fine particles.
  • the coating solution may be diluted with an appropriate solvent depending on the coating method and the like.
  • an acid catalyst is most effective, and examples thereof include mineral acids such as hydrochloric acid and nitric acid, acetic acid, and the like.
  • the acid catalyst has a low condensation polymerization reaction rate compared to the hydrolysis reaction rate of a hydrolyzable metal compound, for example, a metal alkoxide, and generates a large amount of hydrolysis reaction product M (OH) n. preferable.
  • the basic catalyst has a higher condensation polymerization reaction rate than the hydrolysis reaction rate, and the metal alkoxide becomes a fine-particle reaction product. The effect of generating components is small.
  • the catalyst content is preferably 0.001 to 4 in terms of molar ratio to the metal compound.
  • the amount of water required for hydrolysis of the metal compound is preferably 0.1 to 100 in terms of molar ratio to the metal compound.
  • the solvent is not particularly limited as long as it can substantially dissolve the metal compound, but alcohols such as methanol, ethanol, propanol, and butanol, cellosolves such as ethyl cellosolve, butyl cellosolve, and propyl cellosolve, ethylene glycol, propylene glycol Most preferred are glycols such as hexylene glycol.
  • the ratio of the content of the low refractive index fine particles to the total amount of the low refractive index fine particles and the metal compound in the coating liquid is preferably 40 to 95% by mass, more preferably 50 to 90% by mass, and particularly preferably 60 to 85% by mass. preferable.
  • the content of the metal compound, silicon oxide is a metal oxide (SiO 2), aluminum oxide (Al 2 O 3), titanium oxide (TiO 2), zirconium oxide (ZrO 2), tantalum oxide
  • the content is converted to a product (Ta 2 O 5 ).
  • the coating liquid is applied onto the third refractive index layer 33, dried and heated, thereby performing dehydration condensation reaction of the hydrolyzate of the metal compound, vaporization / combustion of volatile components, and the fourth refractive index layer. 34 can be formed.
  • the coating liquid can be applied, for example, by a dip coating method, an air knife coating method, a curtain coating method, a roller coating method, a wire bar coating method, a gravure coating method, a die coating method, or the like.
  • a method for forming the fourth refractive index layer 34 for example, a method in which magnesium fluoride is heated in a vacuum chamber and a film is formed by physical vapor deposition is preferable.
  • the thickness of the fourth refractive index layer 34 is a layer containing magnesium fluoride, the thickness is not inconsistent with the spirit of the present invention, and if necessary, on the fourth refractive index layer 34, that is, the fourth refraction.
  • An antifouling layer (not shown) may be formed on the side of the rate layer 34 opposite to the base 2.
  • the thickness of the antifouling layer is preferably 3 to 20 nm, more preferably 5 to 15 nm. If the thickness of the antifouling layer is 3 nm or more, the antifouling performance can be sufficiently exhibited. Moreover, it is preferable that it is 3 nm or less because the antireflection performance of the antireflection laminate of the present invention is not impaired.
  • the material used for the antifouling layer examples include fluorine-containing organosilicon compounds.
  • it in order to improve the adhesion between the antifouling layer and the fourth refractive index layer, it includes a metal oxide such as silicon oxide, if necessary, with a thickness that does not contradict the gist of the present invention.
  • An adhesion layer may be formed between the fourth refractive index layer and the antifouling layer.
  • the thickness of the adhesion layer is preferably 5 to 20 nm, and more preferably 5 to 10 nm.
  • a thickness of the adhesion layer of 5 nm or more is preferable because the adhesion between the fourth refractive index layer and the antifouling layer can be made sufficient.
  • it is 20 nm or less, since the antireflection performance of the antireflection laminated body of this invention is not impaired, it is preferable.
  • the antireflection laminate 1 of the present invention is not necessarily limited to the one in which only the antireflection layer 3 is provided on the substrate 2.
  • a hard coat layer can be provided in order to impart physical strength such as a polymer film to be the substrate 2.
  • the hard coat layer include those formed by a crosslinking reaction or a polymerization reaction of an ionizing radiation curable compound.
  • the antireflection laminate 1 of the present invention can be provided with a conductive layer from the viewpoint of preventing static electricity.
  • the conductive layer examples include a method of applying a conductive coating solution containing conductive fine particles and a reactive curable resin, a method of applying a transparent conductive material made of a transparent and conductive polymer, or a metal, metal What is manufactured by a conventionally well-known method, such as the method of vapor-depositing or sputtering an oxide etc., is mentioned.
  • the antireflection laminate 1 of the present invention preferably has a luminous reflectance (reflection stimulation value Y defined in JIS Z 8701) of 0.2% or less.
  • the antireflection layer 3 has a four-layer structure of the first refractive index layer 31 to the fourth refractive index layer 34, and the refractive index of each refractive index layer is within a predetermined range.
  • the film thickness of each refractive index layer is set within a predetermined range, so that the luminous reflectance can be increased. It can be effectively 0.2% or less.
  • the antireflection laminate 1 of the present invention has a chromaticity value (chromaticity coordinates x, y defined in JIS Z 8701) of reflected color at an incident angle of 5 ° of 0.15 ⁇ x ⁇ 0. .30, 0.15 ⁇ y ⁇ 0.30, and more preferably 0.20 ⁇ x ⁇ 0.28 and 0.20 ⁇ y ⁇ 0.30.
  • the chromaticity values of the reflected colors at an incident angle of 60 ° are 0.25 ⁇ x ⁇ 0.335 and 0.25 ⁇ y ⁇ 0.335.
  • 0.28 ⁇ x ⁇ 0.330 and 0.28 ⁇ y ⁇ 0.330 are more preferable.
  • the antireflection layer 3 has a four-layer structure of the first refractive index layer 31 to the fourth refractive index layer 34, and the refractive index of each refractive index layer is set within a predetermined range.
  • the degree value can be within a predetermined range.
  • the chromaticity value of the reflected color is effectively set within the predetermined range by setting the film thickness of each refractive index layer within the predetermined range. be able to.
  • the water contact angle on the surface of the fourth refractive index layer 34 is preferably 90 degrees or more, and more preferably 100 degrees or more.
  • the water contact angle is determined by a three-point method by dropping 1 ⁇ L of pure water onto the surface of the fourth refractive index layer 34. By setting it as such a water contact angle, the antifouling property, water resistance, chemical resistance, etc. of the antireflection laminated body 1 can be made favorable.
  • the adjustment of the water contact angle can be performed, for example, by adding an antifouling agent composed of the above-described fluorine-containing alkoxysilane, dimethyl silicone, or the like to the fourth refractive index layer 34.
  • the fourth refractive index layer 34 is obtained by a wet method from the viewpoint of improving the antifouling property by adding an antifouling agent or the like to the fourth refractive index layer 34.
  • the matrix component contains fine particles having a low refractive index such as hollow silica particles.
  • the fourth refractive index layer 34 is obtained by a dry method, for example, when the fourth refractive index layer 34 is a layer containing magnesium fluoride, an antifouling layer is formed on the fourth refractive index layer. It is preferable to provide it.
  • the antireflection laminate 1 of the present invention includes an image display device such as a liquid crystal display device (LCD), a plasma display panel (PDP), an electroluminescence display (ELD), a cathode ray tube display device (CRT), and a surface electric field display (SED). Can be applied to.
  • the antireflection laminate 1 of the present invention is used, for example, by bonding the base 2 side to an image display surface of an image display device.
  • Example 1 A glass substrate (AS glass (soda lime glass) thickness 2 mm) is put into a vacuum chamber, evacuated until the pressure becomes 1 ⁇ 10 ⁇ 4 Pa, and the first refractive index layer to the third refractive index are formed by magnetron sputtering. The rate layer was deposited in order.
  • the refractive index of each refractive index layer shown below was calculated
  • a 0 to A 2 were obtained so that the residual sum of squares of the value and the calculated value was minimized.
  • a 0 , A 1 and A 2 are fitting parameters, respectively.
  • the second refractive index layer made of niobium oxide and having a thickness of 48 nm was formed by performing pulse sputtering with an inversion pulse width of 5 ⁇ sec / cm 2 .
  • the refractive index of the second refractive index layer was 2.38.
  • a mixed gas in which 10% by volume of oxygen gas was mixed with argon gas was introduced, and a frequency of 20 kHz and power at a pressure of 0.1 Pa.
  • Pulse sputtering with a density of 3.8 W / cm 2 and an inversion pulse width of 5 ⁇ sec was performed to form a third refractive index layer made of indium and cerium oxide and having a thickness of 62 nm.
  • the refractive index of the third refractive index layer was 2.20.
  • a fourth refractive index layer was formed on this third refractive index layer by a spin coating method to obtain an antireflection laminate.
  • IPA isopropyl alcohol
  • PGM polyethylene glycol monomethyl ether
  • Coating solution manufactured by JGC Catalysts & Chemicals, trade name: ELCOM AG-1027SIC was mixed at a mass ratio of 1: 1.2 to obtain a diluted solution.
  • 1 cc of the above diluent is gently dropped and rotated using a spin coater for 30 seconds at 500 rpm, 30 seconds at 1000 rpm, and 0.5 seconds at 5000 rpm. A coating film was formed. Then, it baked at 150 degreeC for 30 minute (s) in the high temperature chamber, and formed the 90-nm-thick 4th refractive index layer containing a hollow silica.
  • the refractive index of the fourth refractive index layer was 1.33.
  • Example 2 A glass substrate (AS glass (soda lime glass) thickness 2 mm) is put into a vacuum chamber, evacuated until the pressure becomes 1 ⁇ 10 ⁇ 4 Pa, and the first refractive index layer to the third refractive index are formed by magnetron sputtering. The rate layer was deposited in order.
  • niobium oxide target manufactured by AGC Ceramics, trade name: NBO
  • silicon target on a glass substrate
  • a mixed gas in which 30% by volume of oxygen gas is mixed with argon gas a 0. Cosputtering was performed at a pressure of 1 Pa.
  • Niobium oxide target, frequency 20 kHz, power density 4.6 W / cm 2 subjected to pulse sputtering inversion pulse width 5 .mu.sec
  • silicon target frequency 20 kHz, power density 3.8W / cm 2
  • the first refractive index layer made of niobium and silicon oxide and having a thickness of 72 nm was formed.
  • the refractive index of the first refractive index layer was 1.77.
  • niobium oxide target (trade name: NBO, manufactured by AGC Ceramics) and a silicon target
  • co-sputtering is performed at a pressure of 0.1 Pa while introducing a mixed gas in which 30% by volume of oxygen gas is mixed with argon gas. It was.
  • the niobium oxide target performs pulse sputtering with a frequency of 20 kHz, a power density of 6.3 W / cm 2 , and an inversion pulse width of 5 ⁇ sec.
  • the silicon target performs pulse sputtering with a frequency of 20 kHz, a power density of 1.5 W / cm 2 , and an inversion pulse width of 5 ⁇ sec.
  • a third refractive index layer having a thickness of 60 nm made of niobium and silicon oxide was formed. The refractive index of the third refractive index layer was 2.15.
  • a fourth refractive index layer having a thickness of 90 nm and a refractive index of 1.33 containing hollow silica is formed in the same manner as in Example 1, and the antireflection laminate is formed.
  • Example 3 A glass substrate (AS glass (soda lime glass) thickness 2 mm) is put into a vacuum chamber, evacuated until the pressure becomes 1 ⁇ 10 ⁇ 4 Pa, and the first refractive index layer to the third refractive index are formed by magnetron sputtering. The rate layer was deposited in order.
  • AS glass soda lime glass
  • the refractive index of the third refractive index layer was 2.15.
  • a fourth refractive index layer having a thickness of 90 nm and a refractive index of 1.33 containing hollow silica is formed in the same manner as in Example 1, and the antireflection laminate is formed.
  • Example 4 As the fourth refractive index layer, an antireflection laminate was produced in the same manner as in Example 3 except that a magnesium fluoride layer was formed by the following method. Hearth filled with magnesium fluoride granules (manufactured by Merck) was prepared in a vacuum chamber in which a glass substrate on which the first to third refractive index layers were formed was placed. After evacuating the vacuum chamber to a pressure of 1 ⁇ 10 ⁇ 4 Pa, the glass substrate is heated to 300 ° C., and is made of magnesium fluoride having a refractive index of 1.38 by electron beam vapor deposition (physical vapor deposition). A fourth refractive index layer having a thickness of 85 nm was formed to obtain an antireflection laminate.
  • a magnesium fluoride layer was formed by the following method. Hearth filled with magnesium fluoride granules (manufactured by Merck) was prepared in a vacuum chamber in which a glass substrate on which the first to third refractive index layers were formed was
  • Example 5 An antireflection laminate was prepared in the same manner as in Example 4 except that the thickness of the fourth refractive index layer was 75 nm and that the antifouling layer was formed on the fourth refractive index layer by the following method.
  • 75 g of OPTOOL DSX registered trademark, manufactured by Daikin Industries
  • the inside of the crucible was deaerated with a vacuum pump for 10 hours or more to remove the solvent from the solution.
  • the crucible was then heated to 270 ° C. after the solvent was removed.
  • the fluorine-containing organosilicon compound evaporated from the crucible is introduced into a vacuum chamber in which a glass substrate on which the first to fourth refractive index layers are formed is prepared, and deposited on the fourth refractive index layer by a vapor deposition method.
  • An antifouling layer having a thickness of 10 nm was formed to obtain an antireflection laminate.
  • Example 6 Except that an adhesion layer was formed between the fourth refractive index layer and the antifouling layer by the following method, and an antifouling layer having a thickness of 15 nm was formed on the adhesion layer, the same as in Example 5. Then, an antireflection laminate was produced.
  • a glass substrate (AS glass (soda lime glass) thickness 2 mm) is put into a vacuum chamber, evacuated until the pressure becomes 1 ⁇ 10 ⁇ 4 Pa, and the first to fourth layers are sequentially formed by magnetron sputtering. Film formation was performed to obtain an antireflection laminate.
  • niobium oxide target manufactured by AGC Ceramics, trade name: NBO
  • the frequency was set at a pressure of 0.1 Pa.
  • Pulse sputtering with 20 kHz, power density of 3.8 W / cm 2 and inversion pulse width of 5 ⁇ sec was performed to form a first layer made of niobium oxide and having a thickness of 12 nm.
  • the refractive index of the first layer was 2.38.
  • niobium oxide target (trade name: NBO manufactured by AGC Ceramics Inc.) and introducing a mixed gas obtained by mixing 10% by volume of oxygen gas into argon gas, the pressure is 0.1 Pa, the frequency is 20 kHz, and the power density is 3.8 W.
  • a third layer having a thickness of 110 nm and made of niobium oxide was formed by performing pulse sputtering with an inversion pulse width of 5 ⁇ sec / cm 2 .
  • the refractive index of the third layer was 2.38.
  • a polycrystalline silicon target to which boron is added while introducing a mixed gas obtained by mixing 40% by volume of oxygen gas into argon gas, a frequency of 20 kHz, a power density of 3.8 W / cm 2 , inversion at a pressure of 0.1 Pa Pulse sputtering with a pulse width of 5 ⁇ sec was performed to form a fourth layer made of silicon oxide and having a thickness of 88 nm.
  • the refractive index of the fourth layer was 1.47.
  • Comparative Example 2 A glass substrate (AS glass (soda lime glass) thickness 2 mm) is put into a vacuum chamber, evacuated until the pressure becomes 1 ⁇ 10 ⁇ 4 Pa, and the first to third layers are sequentially formed by magnetron sputtering. Film formation was performed to obtain an antireflection laminate.
  • This comparative example substantially has the configuration shown in Example 1 of Japanese Patent Laid-Open No. 2006-289901.
  • a pulse with a frequency of 100 kHz, a power density of 3.2 W / cm 2 and an inversion pulse width of 2.5 ⁇ sec at a pressure of 0.62 Pa Sputtering was performed to form a second layer made of tin oxide and having a thickness of 96 nm.
  • the refractive index of the second layer was 2.0.
  • Luminous reflectance Spectral reflectance was measured with a spectrophotometer (manufactured by Shimadzu Corporation, trade name: SolidSpec-3700), and luminous reflectance (reflection stimulation value Y defined in JIS Z 8701) was obtained by calculation. In addition, it measured in the state which applied the back surface side (glass substrate side) of the reflection preventing laminated body black with the lacquer, and eliminated back surface reflection.
  • the spectral reflectance is measured with a spectrophotometer (manufactured by Shimadzu Corporation, trade name: SolidSpec-3700), and the chromaticity value of the reflected color (the chromaticity coordinates x and y defined in JIS Z 8701) is obtained by calculation. It was.
  • the incident angle was 5 °, 30 °, and 60 °. Standard light C was used as the light source.
  • it measured in the state which applied the back side (glass substrate side) of the reflection preventing laminated body black with the lacquer, and eliminated back surface reflection.
  • Water contact angle Measurement was performed using “DM-051” (trade name) manufactured by Kyowa Interface Science Co., Ltd. In the measurement, 1 ⁇ L of pure water was dropped on the surface of the antireflection laminate (the surface of the fourth refractive index layer or the surface of the antifouling layer), and the contact angle was determined by a three-point method.
  • the reflectance cannot always be sufficiently reduced, and the reflected color greatly depends on the incident angle.
  • the reflectance can be sufficiently reduced, and the dependence of the reflected color on the incident angle can also be reduced.
  • the antireflection laminates of Examples 1 to 3, 5, and 6 can increase the water contact angle and improve the antifouling property and the like.
  • the incident angle dependence of the reflected colors shown in FIGS. 2, 4, 6, 8, and 10 is as follows when the incident angle is changed in increments of 10 ° from 0 ° to 70 ° for each antireflection laminate. The calculation results are shown.
  • the film thickness / incident angle dependence of the reflection color shown in FIGS. 3, 5, 7, 9, and 11 is 1% from + 3% to ⁇ 3% for each antireflection laminate.
  • the calculation result of the incident angle dependence (incidence angle from 0 ° to 60 ° in 10 ° increments) of the reflected color when changing in increments is shown. That is, FIGS.
  • the antireflection laminate of the reference example includes a first layer (thickness 12 nm, refractive index 2.38), a second layer (thickness 32 nm, refractive index 1.47), and a third layer (thickness). 110 nm, refractive index 2.38), and fourth layer (thickness 93 nm, refractive index 1.47).
  • the antireflection laminate having the same configuration as that of Comparative Example 1 has a small chromaticity value of the reflected color at an incident angle of 0 ° and a strong bluish color. As the value increases, the chromaticity value changes greatly and finally becomes reddish (FIG. 8). Further, when the film thickness changes, the chromaticity value varies greatly (FIG. 9).
  • the antireflection laminate having the same structure as that of Example 1 has a light bluish color without the chromaticity value of the reflected color at an incident angle of 0 ° being excessively small. As the incident angle increases, the chromaticity value increases, but almost white can be maintained (FIG. 2). Further, variation in chromaticity values when the film thickness changes can also be suppressed (FIG. 3). As is apparent from FIGS. 4 to 7, the antireflection laminate having the same structure as in Examples 2 and 3 has the same tendency.
  • the antireflection laminate of the present invention has an appropriate chromatic color while reducing the reflection color, and can improve visibility by suppressing the increase in the number of colors.
  • a liquid crystal display (LCD), a plasma display It is useful as an image display device such as a panel (PDP), an electroluminescence display (ELD), a cathode ray tube display (CRT), and a surface electric field display (SED).
  • PDP panel
  • ELD electroluminescence display
  • CRT cathode ray tube display
  • SED surface electric field display
  • SYMBOLS 1 Antireflection laminated body, 2 ... Base

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)

Abstract

L'invention porte sur un stratifié anti-réflexion, dont les couleurs réfléchies présentent des couleurs chromatiques adéquates, tout en étant empêchées d'être multicolores. Un stratifié anti-réflexion (1) comprend une base (2) et une couche anti-réflexion (3) qui est stratifiée sur la base. La couche anti-réflexion (3) présente une structure à quatre couches, et comprend, en séquence à partir du côté de base, une couche à premier indice de réfraction (31), une couche à second indice de réfraction (32), une couche à troisième indice de réfraction (33) et une couche à quatrième indice de réfraction (34). La couche à premier indice de réfraction (31) présente un indice de réfraction de 1,6 à 1,9 ; la couche à second indice de réfraction (32) présente un indice de réfraction de 2,2 à 2,5 ; la couche à troisième indice de réfraction (33) présente un indice de réfraction 2,0 à 2,3 ; la couche à quatrième indice de réfraction (34) présente un indice de réfraction de 1,2 à 1,5 ; et l'indice de réfraction de la couche à second indice de réfraction (32) est supérieur à l'indice de réfraction de la couche à troisième indice de réfraction (33).
PCT/JP2012/061268 2011-04-28 2012-04-26 Stratifié anti-réflexion Ceased WO2012147876A1 (fr)

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EP12776857.0A EP2703851B1 (fr) 2011-04-28 2012-04-26 Empilement anti-reflexion
KR1020137019623A KR101458733B1 (ko) 2011-04-28 2012-04-26 반사 방지 적층체
CN201280019907.1A CN103492914B (zh) 2011-04-28 2012-04-26 防反射层叠体
JP2013512443A JP5527482B2 (ja) 2011-04-28 2012-04-26 反射防止積層体
US14/064,518 US9025248B2 (en) 2011-04-28 2013-10-28 Antireflection stack

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JP2011-102038 2011-04-28

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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014194530A (ja) * 2013-02-28 2014-10-09 Asahi Glass Co Ltd 光学素子
CN104465696A (zh) * 2013-09-24 2015-03-25 三星显示有限公司 显示基板
WO2015141718A1 (fr) * 2014-03-18 2015-09-24 三菱マテリアル株式会社 Film à faible indice de réfraction et son procédé de fabrication
WO2015159839A1 (fr) * 2014-04-15 2015-10-22 旭硝子株式会社 Stratifié anti-reflet et son procédé de production
WO2016152691A1 (fr) * 2015-03-20 2016-09-29 大日本印刷株式会社 Film antireflet, dispositif d'affichage dans lequel ledit film antireflet est utilisé, et procédé de sélection d'un film antireflet
JP2016177183A (ja) * 2015-03-20 2016-10-06 大日本印刷株式会社 反射防止フィルム、該反射防止フィルムを用いた表示装置、及び反射防止フィルムの選択方法
JP2016177185A (ja) * 2015-03-20 2016-10-06 大日本印刷株式会社 反射防止フィルム、該反射防止フィルムを用いた表示装置、及び反射防止フィルムの選択方法
CN106024109A (zh) * 2015-03-30 2016-10-12 琳得科株式会社 透明导电性膜
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US20200408954A1 (en) * 2018-03-02 2020-12-31 Corning Incorporated Anti-reflective coatings and articles and methods of forming the same
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Publication number Priority date Publication date Assignee Title
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US10877181B2 (en) * 2016-11-11 2020-12-29 AGC Inc. Substrate with low-reflection property and manufacturing method thereof
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11183705A (ja) * 1997-12-19 1999-07-09 Nikon Corp 反射防止膜を有する光学部材
JP2002156507A (ja) * 2000-11-16 2002-05-31 Canon Inc 反射防止膜および光学素子
JP2005099757A (ja) * 2003-08-25 2005-04-14 Asahi Glass Co Ltd 反射防止膜
JP2005531814A (ja) * 2002-07-03 2005-10-20 サン−ゴバン グラス フランス 反射防止コーティングを備えてなる透明な基材
JP2006289901A (ja) 2005-04-14 2006-10-26 Asahi Glass Co Ltd 反射防止フィルムおよびディスプレイ装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3463574A (en) * 1967-06-26 1969-08-26 Perkin Elmer Corp Multilayer antireflection coating for low index materials
US3781090A (en) * 1972-11-06 1973-12-25 Minolta Camera Kk Four layer anti-reflection coating
JP3124391B2 (ja) * 1992-09-29 2001-01-15 ホーヤ株式会社 反射防止膜を有する光学部材
JPH0760855A (ja) * 1993-08-30 1995-03-07 Toray Ind Inc 反射防止物品
FR2730990B1 (fr) * 1995-02-23 1997-04-04 Saint Gobain Vitrage Substrat transparent a revetement anti-reflets
JP2001281415A (ja) * 2000-03-31 2001-10-10 Sony Corp 反射防止フィルタ及びその製造方法
JP2003215309A (ja) * 2001-04-17 2003-07-30 Sony Corp 反射防止フィルム及び反射防止層付きプラスチック基板
JP2004138662A (ja) 2002-10-15 2004-05-13 Fuji Photo Film Co Ltd 反射防止膜、反射防止フィルムおよび画像表示装置
JPWO2004113966A1 (ja) * 2003-06-18 2006-08-03 旭化成株式会社 反射防止膜
TWI388876B (zh) * 2003-12-26 2013-03-11 Fujifilm Corp 抗反射膜、偏光板，其製造方法，液晶顯示元件，液晶顯示裝置，及影像顯示裝置
US20080285133A1 (en) * 2005-03-14 2008-11-20 Fujifilm Corporation Antireflection Film, Production Method Thereof, Polarizing Plate Using the Antireflection Film and Image Display Device Using the Antireflection Film or Polarizing Plate
US20070065638A1 (en) * 2005-09-20 2007-03-22 Eastman Kodak Company Nano-structured thin film with reduced light reflection
FR2898295B1 (fr) * 2006-03-10 2013-08-09 Saint Gobain Substrat transparent antireflet presentant une couleur neutre en reflexion
JP2008116611A (ja) 2006-11-02 2008-05-22 Toppan Printing Co Ltd 反射防止フィルム
JP4155337B1 (ja) * 2007-02-21 2008-09-24 ソニー株式会社 防眩性フィルムおよびその製造方法、ならびに表示装置
WO2009001723A1 (fr) * 2007-06-28 2008-12-31 Konica Minolta Opto, Inc. Film antireflet, polarisateur, affichage, et procédé pour produire un film antireflet
JP2009122416A (ja) * 2007-11-15 2009-06-04 Toppan Printing Co Ltd 光学薄膜フィルム
US8481148B2 (en) * 2008-04-30 2013-07-09 Hoya Corporation Optical device and antireflection film
JP5724171B2 (ja) * 2009-01-09 2015-05-27 ソニー株式会社 光学素子およびその製造方法、原盤およびその製造方法、ならびに表示装置
JP2013152425A (ja) * 2011-12-28 2013-08-08 Tamron Co Ltd 反射防止膜及び光学素子

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11183705A (ja) * 1997-12-19 1999-07-09 Nikon Corp 反射防止膜を有する光学部材
JP2002156507A (ja) * 2000-11-16 2002-05-31 Canon Inc 反射防止膜および光学素子
JP2005531814A (ja) * 2002-07-03 2005-10-20 サン−ゴバン グラス フランス 反射防止コーティングを備えてなる透明な基材
JP2005099757A (ja) * 2003-08-25 2005-04-14 Asahi Glass Co Ltd 反射防止膜
JP2006289901A (ja) 2005-04-14 2006-10-26 Asahi Glass Co Ltd 反射防止フィルムおよびディスプレイ装置

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
LEE MASANAKA: "Optical thin films and film-forming techniques", AGNE GIJUTSU CENTER INC.
See also references of EP2703851A4 *

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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JP2015194740A (ja) * 2014-03-18 2015-11-05 三菱マテリアル株式会社 高耐久性低屈折率膜
WO2015159839A1 (fr) * 2014-04-15 2015-10-22 旭硝子株式会社 Stratifié anti-reflet et son procédé de production
US10670776B2 (en) 2015-03-20 2020-06-02 Dai Nippon Printing Co., Ltd. Antireflection film, display device in which said antireflection film is used, and method for selecting antireflection film
WO2016152691A1 (fr) * 2015-03-20 2016-09-29 大日本印刷株式会社 Film antireflet, dispositif d'affichage dans lequel ledit film antireflet est utilisé, et procédé de sélection d'un film antireflet
JP2016177183A (ja) * 2015-03-20 2016-10-06 大日本印刷株式会社 反射防止フィルム、該反射防止フィルムを用いた表示装置、及び反射防止フィルムの選択方法
JP2016177185A (ja) * 2015-03-20 2016-10-06 大日本印刷株式会社 反射防止フィルム、該反射防止フィルムを用いた表示装置、及び反射防止フィルムの選択方法
CN106024109A (zh) * 2015-03-30 2016-10-12 琳得科株式会社 透明导电性膜
CN106024109B (zh) * 2015-03-30 2019-10-11 琳得科株式会社 透明导电性膜
US20200408954A1 (en) * 2018-03-02 2020-12-31 Corning Incorporated Anti-reflective coatings and articles and methods of forming the same
US12140732B2 (en) * 2018-03-02 2024-11-12 Corning Incorporated Anti-reflective coatings and articles and methods of forming the same
JP2020109460A (ja) * 2019-01-02 2020-07-16 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． ウィンドウ及びそのウィンドウを含む表示装置
JP7350251B2 (ja) 2019-01-02 2023-09-26 三星ディスプレイ株式會社 ウィンドウ及びそのウィンドウを含む表示装置
WO2023140105A1 (fr) * 2022-01-18 2023-07-27 ダイキン工業株式会社 Article antisalissure
JP2023104892A (ja) * 2022-01-18 2023-07-28 ダイキン工業株式会社 防汚性物品
JP7473851B2 (ja) 2022-01-18 2024-04-24 ダイキン工業株式会社 防汚性物品

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TW201303346A (zh) 2013-01-16
CN103492914A (zh) 2014-01-01
TWI497107B (zh) 2015-08-21
JP2014123145A (ja) 2014-07-03
US9025248B2 (en) 2015-05-05
JP5527482B2 (ja) 2014-06-18
KR101458733B1 (ko) 2014-11-05
KR20140003505A (ko) 2014-01-09
EP2703851B1 (fr) 2016-05-25
JPWO2012147876A1 (ja) 2014-07-28
EP2703851A4 (fr) 2014-11-05
US20140049827A1 (en) 2014-02-20
EP2703851A1 (fr) 2014-03-05

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