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WO2012036453A2 - Feuille conductrice transparente enduite de couche anti-réfléchissante et procédé de fabrication de ladite feuille conductrice transparente - Google Patents

Feuille conductrice transparente enduite de couche anti-réfléchissante et procédé de fabrication de ladite feuille conductrice transparente Download PDF

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Publication number
WO2012036453A2
WO2012036453A2 PCT/KR2011/006765 KR2011006765W WO2012036453A2 WO 2012036453 A2 WO2012036453 A2 WO 2012036453A2 KR 2011006765 W KR2011006765 W KR 2011006765W WO 2012036453 A2 WO2012036453 A2 WO 2012036453A2
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Prior art keywords
layer
electrode layer
antireflection
conductive sheet
transparent conductive
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Korean (ko)
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WO2012036453A3 (fr
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오상근
김승렬
방윤영
정다정
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Topnanosysinc
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Topnanosysinc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials

Definitions

  • the present invention relates to a transparent conductive sheet, and more particularly, to a transparent conductive sheet coated with an antireflective layer applicable to various fields such as a flat panel display panel, a touch panel, an antistatic, a transparent heating element, and a manufacturing method thereof.
  • the transparent conductive sheet is formed by forming a thin conductive film having a conductivity while being transparent to visible light on a transparent substrate such as glass or a transparent plastic film.
  • a transparent substrate such as glass or a transparent plastic film.
  • the conductive film include metal oxide thin films such as indium oxide and tin oxide.
  • a transparent conductive sheet using a plastic film as a transparent substrate is capable of bendability, light weight, impact resistance, processability, thickness reduction, large area, and the like, thereby expanding its application field.
  • Transparent conductive sheets are used for touch panels and LCD substrates.
  • the conductive film is used as an electrode layer of a touch panel or an electrode layer of an LCD substrate, and is typically made of indium tin oxide (ITO) material.
  • ITO has a refractive index of about 2.0 and a surface resistance of 1 to 5000 ⁇ / sq.
  • an antireflection film is not formed on the transparent conductive sheet on which the conductive film is used as the electrode layer of the touch panel.
  • the antireflection film generally has a structure in which a high refractive index layer having a high refractive index and a low refractive layer having a low refractive index are sequentially stacked, in which case the low refractive layer is an electrical insulator. Therefore, the application of the low refractive index layer is impossible in the structure operated by electrically conducting with each other.
  • the electrode layer of the transparent conductive sheet and the antireflection film do not directly contact each other, and the electrode layer and the antireflection film are present on the opposite side with respect to the transparent substrate.
  • the antireflection film is not formed at the portion where the electrode layer is formed, and thus the antireflection effect is limited. Accordingly, the visibility is not excellent.
  • Korean Patent No. 10-0715099 discloses a structure in which an antireflection film coats an antireflection layer having a low refractive index on top of a high refractive index conductive layer such as ITO for an antistatic function.
  • a high refractive index conductive layer such as ITO for an antistatic function.
  • the low refractive index antireflection layer which is an electrical insulator, it is difficult to apply to applications requiring low surface resistance.
  • the antireflection film applied to the transparent conductive sheet should ensure transparency.
  • the present invention has been made in view of the above problems, in the transparent conductive sheet including a transparent electrode layer, the transparent conductive sheet and the anti-reflective layer having an excellent anti-reflection function and having a conductivity and transparency comparable to the electrode layer and the It is an object to provide a method for producing a transparent conductive sheet.
  • a transparent conductive sheet coated with an antireflection layer for achieving the above object includes a transparent substrate, an electrode layer, and an antireflection layer.
  • the electrode layer is coated with a conductive material on one side of the transparent substrate.
  • An antireflection layer is formed on the electrode layer.
  • the anti-reflection layer comprises an organic-inorganic conductive fine particles and an anti-reflection resin, the refractive index is smaller than the electrode layer, characterized in that the surface resistance of 1 to 5000 ⁇ / sq.
  • the electrode layer may be made of Indium Zinc Oxide (IZO), Antimony Tin Oxide (ATO), Antimony Zinc Oxide (AZO), ZnO, TiO 2 , ITO (Indium Tin Oxide).
  • the organic-inorganic conductive fine particles may be at least one selected from the group consisting of carbon nanotubes, carbon nanofibers, graphene, metal nanoparticles, metal nanowires, and conductive polymers.
  • the antireflective resin may be a fluororesin, a fluorovinyl resin, or the like, such as an acrylic resin, a urethane resin, a melamine resin, a carbonate resin, a methacryl resin, an imide resin, a nylon resin, an ethylene terephthalate resin, a fluorine vinyl resin, and a fluorine olefin compound.
  • Group hybrid resin, etc. are mentioned.
  • the anti-reflection layer may have a thickness of 10nm to 300nm.
  • a method for manufacturing a transparent conductive sheet having an antireflection layer the step of preparing a transparent conductive sheet coated with an electrode layer.
  • the anti-reflective liquid mixture having a surface resistance of 1 to 5000 ⁇ / sq is coated on the electrode layer with a thickness of 10 to 300 nm to form an anti-reflective layer.
  • the electrode layer is made of indium tin oxide (ITO)
  • the organic-inorganic conductive fine particles are carbon nanotubes
  • the anti-reflective resin may be an organic-inorganic hybrid resin.
  • the method may further include wet etching the anti-reflection layer and the electrode layer to form a pattern.
  • the method for manufacturing a transparent conductive sheet having an antireflection layer the step of preparing a transparent substrate coated with an electrode layer having a positive refractive index.
  • the mixed solution containing the organic-inorganic conductive fine particles and the dispersant is coated on the electrode layer to form a first antireflection layer.
  • the second antireflection layer is formed by coating an antireflection resin having a refractive index smaller than that of the electrode layer on the first antireflection layer. The step of curing the second anti-reflection layer.
  • the forming of the second anti-reflection layer may be performed on the surface on which the first anti-reflection layer of the transparent substrate is not formed.
  • the sum of the first antireflection layer and the second antireflection layer may be 10 to 300 nm.
  • the method may further include etching the first antireflection layer, the second antireflection layer, and the electrode layer after curing the second antireflection layer.
  • a low refractive index antireflective layer containing organic-inorganic conductive fine particles is applied on the upper layer of the high refractive index electrode such as ITO. Accordingly, it is possible to obtain a transparent conductive sheet having improved surface transmittance through the excellent antireflection effect and at the same time having the same surface resistance as the original surface resistance of the electrode layer.
  • the flexible organic thin film antireflection layer is coated on the electrode layer, which is fragile to mechanical impact, to obtain a transparent conductive sheet having improved durability, and to improve adhesion to other materials such as metal electrodes.
  • FIG. 1 is a cross-sectional view showing a transparent conductive sheet coated with an antireflective layer according to a preferred embodiment of the present invention.
  • FIG. 2 is a cross-sectional view illustrating an example of a touch panel to which the transparent conductive sheet of FIG. 1 is applied.
  • FIG. 3 is a block diagram illustrating an example of a method of manufacturing the transparent conductive sheet of FIG. 1.
  • 4A to 4E are cross-sectional views illustrating each step of FIG. 3.
  • FIG. 5 is a block diagram illustrating another example of a method of manufacturing the transparent conductive sheet of FIG. 1.
  • 6A to 6G are cross-sectional views illustrating each step of FIG. 5.
  • FIG. 1 is a cross-sectional view showing a cross section of the transparent conductive sheet 10 according to a preferred embodiment of the present invention.
  • the transparent conductive sheet 10 of the present invention includes a transparent substrate 20, an electrode layer 30, and an antireflection layer 40.
  • the transparent conductive sheet may be applied to various fields such as a flat panel display panel such as a liquid crystal display (LCD), an organic LED, and a touch panel.
  • LCD liquid crystal display
  • OLED organic LED
  • the transparent base material 20 is applicable when it is a transparent material, such as glass and a transparent polymer polymer which have a light transmittance 70% or more.
  • a transparent material such as glass and a transparent polymer polymer which have a light transmittance 70% or more.
  • Polymer One example of the polymer is cellulose ester, polyimide, polycarbonate, polyester, polyolefin, polystyrene, polyethylene terephthalate and the like.
  • the electrode layer 30 is coated with at least one side of the transparent substrate 20 with a conductive material.
  • the electrode layer 30 may be patterned to function as an electrode in a flat panel display panel and a touch panel.
  • the electrode layer 30 may have a positive refractive index (+), more preferably 1.7 to 2.2. Even more preferably, the electrode layer 30 may be a conductive material having a refractive index of 1.8 to 2.1.
  • the electrode layer 30 may be made of indium zinc oxide (IZO), antimony tin oxide (ATO), antimony zinc oxide (AZO), ZnO, TiO 2, indium tin oxide (ITO), or the like.
  • ITO is a material having excellent transparency and conductivity, having a refractive index of about 2.0 and a surface resistance of the final product of 1 to 5000 ⁇ / sq.
  • the thickness of commercially available ITO electrode is about 20nm based on 500 ⁇ / sq sheet resistance.
  • the antireflective layer 40 includes an organic-inorganic conductive fine particle 42 and an antireflective resin 44 having a refractive index smaller than that of the electrode layer, preferably 1.1 to 1.6, more preferably 1.2 to 1.5.
  • the anti-reflection layer 40 preferably obtains improved transmittance and maintains the original surface resistance of the electrode layer 30.
  • the organic-inorganic conductive fine particles 42 may maintain transparency and refractive index of the anti-reflective layer 40, and may transfer electrical conductivity of the electrode layer 30 to the surface. Examples thereof include carbon nanotubes, carbon nanofibers, graphene, metal nanoparticles, metal nanowires, conductive polymers, and the like.
  • the antireflection resin 44 has a refractive index of 1.1 to 1.6, more preferably 1.2 to 1.5, preferably a transparent thermosetting resin or photocurable resin.
  • the antireflective resin 44 is a fluororesin such as acrylic resin, urethane resin, melamine resin, carbonate resin, methacryl resin imide resin, nylon resin, ethylene terephthalate resin, fluorine vinyl resin, fluorine olefin compound, fluorine vinyl Resins, organic-inorganic hybrid resins, and the like.
  • the anti-reflection resin 44 may be made of an organic-inorganic hybrid resin.
  • the organic-inorganic hybrid resin is capable of producing a coating film having a high light transmittance, is excellent in adhesion to the micro-cracks reinforcement, excellent heat resistance, chemical resistance properties, coating application is useful.
  • a silicone-based binder exhibits various physical properties according to functional groups substituted with silicon elements. These functional groups may be converted to other functional groups by various chemical reactions, and in addition to the methyl group, organic groups such as phenyl group, vinyl group, propyl trifluoride group, alkyl group, etc. are substituted and are widely used commercially.
  • the silicon-based binder is present in the same material in which the organic group bonded to the inorganic main chain simultaneously.
  • silicon molecules have a structure having a main chain in the form of polysiloxane [Si (RR ')-O-] n.
  • Silicone-based binders have a low surface tension and exhibit strong hydrophobicity, and because of this property, they can be easily used as a water repellent material without any modification process.
  • the silicone binder may be used as a binder through a sol-gel process using a monomer such as TEOS.
  • a monomer such as TEOS.
  • hollow silica, MgF 2 , NaF, CaF 2 , CeF 3 Equal fluoride materials can be used.
  • the refractive index of the antireflection layer 40 is smaller than the refractive index of the electrode layer 30.
  • the antireflection layer 40 has a refractive index of 1.1 to 1.6, and the refractive index of the electrode layer 30 is 1.7 to 2.2. Accordingly, the electrode layer 30 functions as a high refractive layer of the antireflection film, and the antireflection layer 40 functions as a low refractive layer of the antireflection film, so that the antireflection layer and the electrode layer function as the antireflection film as a whole. can do.
  • the antireflection layer 40 has an appropriate amount of organic-inorganic conductive fine particles 42.
  • the sheet resistance of the antireflection layer 40 is the same as or similar to the sheet resistance of the electrode layer 30, so that the surface resistance of the antireflection layer 40 can be applied to an application requiring a low surface resistance.
  • the refractive index of the organic-inorganic conductive fine particles 42 is 1.1 to 1.6, more preferably 1.2 to 1.5, so that the refractive index is similar to the antireflective resin 44.
  • the organic-inorganic conductive fine particles 42 are carbon nanotubes.
  • the carbon nanotubes are evaluated as an ideal material capable of realizing conductivity while maintaining optical properties due to the theoretical percolation concentration of only 0.04%, and when light is coated on a specific substrate in nanometer units, light transmits in the visible region. It shows transparency and maintains electrical property, which is a unique property of carbon nanotubes.
  • the refractive index of the carbon nanotubes is 1.2 to 1.5, it is suitable as the organic-inorganic conductive fine particles 42 of the present invention.
  • the antireflection layer 40 preferably has a thickness (D2) of 10nm to 300nm.
  • D2 of the antireflection layer 40 exceeds 300 nm, the electrical conductivity of the electrode layer 30 is not transmitted to the surface due to the thick antireflection layer 40, and thus the inherent conductivity is lost, resulting in high sheet resistance or severe In this case, the resistance is increased to an unmeasured level, and a phenomenon in which the transmittance is lowered rather than an appropriate thickness representing an antireflection effect occurs.
  • the thickness of the anti-reflection layer 40 is less than 10nm can transmit the inherent electrical conductivity without loss, but because the anti-reflection layer is so thin that the thickness can not exhibit a proper anti-reflection effect is not improved transmittance.
  • the carbon nanotubes are contained, the hardness is excellent, and thus an antireflection layer in nm units can be manufactured.
  • the carbon nanotubes improve the adhesion of the electrode layer 30 to other materials to further improve the stability of the thin film after coating.
  • a hard coating layer 50 may be formed on a surface of the transparent substrate 20 on which the anti-reflection layer 40 is not formed, and although not shown, a separate anti-reflection film may be formed on the hard coating layer 50. It may be formed.
  • An optically functional coating layer such as a hard coating layer and an anti-glare layer, may be formed between the transparent substrate 20 and the electrode layer 30.
  • FIG. 2 is a cross-sectional view showing an example of a four-wire resistive touch panel 100 to which the transparent conductive sheet of the present invention is applied.
  • the resistive touch panel 100 includes an upper electrode 110 made of the transparent conductive sheet of the present invention, a lower electrode 120 made of the transparent conductive sheet of the present invention, and a connection wiring (not shown). City).
  • the resistive touch panel may be attached on the flat display panel 130.
  • the upper electrode 110 is formed of a transparent electrode layer (hereinafter, referred to as an “ITO electrode layer”) 113 made of ITO on the PET transparent substrate 112.
  • the lower electrode 120 is formed of an ITO transparent electrode layer (hereinafter, referred to as “ITO electrode layer”) 123 on a transparent lower transparent substrate 122 such as glass, plastic, or sheet.
  • a dot spacer 150 is formed on the lower electrode 120.
  • the upper electrode 110 contacts the lower electrode 120, and the position coordinate of the point where the pen or the like touches is determined by detecting the voltage of the contacted point.
  • Anti-reflection layers 114 and 124 are formed on the ITO electrode layers 113 and 123, respectively.
  • Each of the ITO electrode layers 113 and 123 has a refractive index of about 2.0 and a surface resistance of 1 to 5000 ⁇ / sq.
  • the antireflective layers 114 and 124 include organic-inorganic conductive fine particles 42 (see FIG. 1) and an antireflective resin 44 (see FIG. 1), have a refractive index of 1.2 to 1.5, and a final transparent conductive sheet 10. ) Has a surface resistance of 1 to 5000 ⁇ / sq.
  • the touch panel operates by contact between the ITO electrode layer 113 of the upper electrode and the ITO electrode layer 123 of the lower electrode, and the ITO electrode layer 113 of the upper electrode and the ITO electrode layer 123 of the lower electrode. Even if the antireflection layers 114 and 124 are formed on each of the surfaces in contact with each other, the operation of the touch panel is smooth. This is because the antireflection layers 114 and 124 have sufficient conductivity, and thus do not reduce the conductivity of the ITO electrode layer. In addition, since the antireflection layers 114 and 124 are formed on the upper surfaces of the ITO electrode layers 113 and 123, the antireflection efficiency of the touch panel is improved as a whole and the transmittance of the panel is improved.
  • Hard coating layers 115 and 125 may be formed on surfaces where the anti-reflection layers 114 and 124 of the transparent substrates 112 and 122 are not formed. Although not shown, the hard coating layers 115 and 125 may also be formed on the hard coating layers 115 and 125. A separate antireflection film may be formed.
  • FIG. 3 is a flowchart illustrating each step of the method for manufacturing a transparent conductive sheet having an antireflective layer according to the first embodiment of the present invention shown in FIG. 1 in another aspect of the present invention.
  • the method of manufacturing a transparent conductive sheet according to the first embodiment of the present invention includes preparing a transparent substrate of a transparent material coated with an electrode layer (S10).
  • the organic-inorganic conductive fine particles and the anti-reflective resin, the refractive index of the anti-reflective liquid mixture is smaller than the electrode layer by coating on the electrode layer with a thickness of 10nm to 300nm to form an antireflection layer (S20).
  • the step of etching the anti-reflection layer and the electrode layer (S30) may be further roughened.
  • a transparent substrate 20 of a transparent material coated with an electrode layer 30 is prepared.
  • the transparent base material 20 is a transparent material such as glass or transparent polymer polymer having a light transmittance of 70% or more.
  • the electrode layer may have a refractive index of 1.7 to 2.2, more preferably 1.8 to 2.1.
  • the material of the electrode layer 30 may be ITO.
  • the ITO is used as an electrode in a display device, and its refractive index is about 2.0.
  • the anti-reflective liquid mixture containing the organic-inorganic conductive fine particles 42 and the antireflective resin 44 and having a refractive index smaller than the electrode layer after coating is 10 to 300 nm thick in the electrode layer. Coating over 30 is carried out.
  • the refractive index of the anti-reflective liquid mixture when the refractive index of the electrode layer 30 is 1.7 to 2.2, the refractive index of the anti-reflective liquid mixture may be 1.1 to 1.6. More specifically, if the refractive index of the electrode layer 30 is 1.8 to 2.1, the refractive index of the anti-reflective liquid mixture may be 1.2 to 1.5.
  • an antireflective resin 44 is mixed with the carbon nanotube dispersion to prepare a coating liquid 41 (FIG. 4B), and the coating liquid 41 ) May be coated on the electrode layer 30.
  • a coating liquid 41 (FIG. 4B)
  • the concentration of the carbon nanotube dispersion is high, the permeability of the transparent conductive sheet 10 is sharply reduced, and when the concentration is thin, the conductivity of the coating film is reduced after coating.
  • the coating method may be a general coating method such as spray coating, gravure coating, spin coating, roll coating.
  • the thickness of the antireflection layer is 10 to 300 nm. If the thickness of the antireflection layer is 300 nm or more, the light transmittance is lowered. In this case, since the antireflection layer has a thickness of 10 to 300 nm and includes organic-inorganic conductive fine particles, the completed transparent conductive sheet surface resistance may be 1 to 5000 ⁇ / sq.
  • the antireflective layer 40 is cured, as shown in FIG. 4D.
  • the heat treatment is dried before curing at a temperature of 40 ⁇ 100 °C, after which it can be cured for 60 minutes at 100 °C ⁇ 200 °C, more preferably 125 °C ⁇ 135 °C temperature for complete curing.
  • other curing methods such as ultraviolet (UV) curing methods can be applied.
  • the step of etching the anti-reflection layer 40 and the electrode layer 30 may be further roughened.
  • the organic-inorganic conductive fine particles of the antireflective layer are not easy to wet etch.
  • the antireflection layer comprises an organic-inorganic hybrid resin
  • the organic-inorganic conductive fine particles are etched together with the organic-inorganic hybrid resin during the wet etching using the etching solution 5.
  • the antireflection layer can be patterned together with the electrode layer 30 easily and quickly.
  • patterning is also possible by other etching methods such as dry etching.
  • FIG. 5 is a block diagram showing each step of the method for manufacturing a transparent conductive sheet having an antireflection layer according to a second embodiment of the present invention.
  • the transparent conductive sheet manufacturing method according to a second embodiment of the present invention, the step of preparing a transparent substrate coated with an electrode layer (S100).
  • the mixed solution containing the organic-inorganic conductive fine particles and the dispersant is coated on the electrode layer to form a first anti-reflection layer (S200).
  • the antireflection layer is arranged in order of the first antireflection layer and the second antireflection layer. It is formed as it is.
  • FIGS. 6A to 6E the steps of forming the anti-reflection layer different from the manufacturing method of the first embodiment of the present invention will be described.
  • the first anti-reflection layer 142 is formed.
  • the first antireflective layer 142 may include organic-inorganic conductive fine particles 42.
  • the organic-inorganic conductive fine particles 42 may be carbon nanotubes.
  • the carbon nanotube dispersion may be prepared by mixing the dispersant and the carbon nanotube particles in a solution and then mixing well.
  • the first anti-reflection layer 142 is formed by coating a dispersion solution in which the organic-inorganic conductive fine particles 42 are dispersed on the electrode layer 30.
  • the coating method one of various coating methods such as spray coating, gravure coating, slot die coating, dip coating, bar coating, inkjet printing, screen printing and the like can be selected.
  • the first anti-reflection layer 142 may be hardened.
  • the curing process may be performed by drying in an oven at 80 °C to 120 °C.
  • the antireflective resin 44 having the refractive index of 1.2 to 1.5 is formed.
  • the first antireflection layer 142 is coated to form a second antireflection layer 144.
  • the antireflection resin 44 may be a low refractive resin generally applied to the low refractive layer in the antireflection film.
  • the anti-reflection resin 44 may be more preferably made of a silicon-based organic-inorganic hybrid resin material. In this case, the thickness of the second anti-reflection layer 144 may be coated so that the thickness is 10nm to 300nm.
  • the second anti-reflective layer 144 gradually penetrates into the first anti-reflective layer 142, resulting in the first anti-reflective layer 142 and the second anti-reflective layer 144. Combined into one, it can be an antireflection layer 40.
  • the antireflection layer is cured.
  • the curing process may be performed by drying in an oven at 120 ° C. to 150 ° C. for 20 minutes to 40 minutes.
  • the step of etching the antireflection layer 40 and the electrode layer 30 may be further roughened.
  • organic-inorganic conductive fine particles, such as carbon nanotubes, of the antireflection layer are not easily wet patterned.
  • the antireflection layer comprises an organic-inorganic hybrid resin
  • the organic-inorganic conductive fine particles are etched together with the organic-inorganic hybrid resin during the wet etching using the etching solution 5.
  • the antireflection layer may be patterned by dry etching.
  • the antireflection layer can be patterned together with the electrode layer 30 easily and quickly.
  • Example 1 a transparent electrode layer (hereinafter, referred to as an “ITO electrode layer”) 30 made of ITO is formed on one surface of the transparent substrate 20 made of PET film.
  • the opposite surface on which the ITO electrode layer of the transparent substrate is not formed is hard coated.
  • the surface of the ITO electrode layer 30 was cleaned using an ultraviolet cleaner.
  • the antireflection layer 40 coating composition including carbon nanotubes and organic-inorganic hybrid resins was coated on the surface of the ITO electrode layer 30 through dip coating.
  • the coating composition was adjusted to a coating speed of 8 mm / s so that the thickness of the coating film was 130 nm. After coating, the mixture was cured in an oven at 130 ° C. for 30 minutes.
  • an ITO electrode layer is formed on one surface of a transparent substrate made of a PET film. An antireflection layer was not formed on the ITO electrode layer.
  • an ITO electrode layer is formed on one surface of a transparent substrate made of a PET film.
  • the hard coating is coated, and the hard coating is coated with an antireflection resin for low refractive index.
  • Example 1 The transmittance, sheet resistance, antireflection degree, and durability of Example 1 and Comparative Example were compared.
  • the transmittance measurement was made through the standard JIS K-7361 (Haze meter NDH 2000), the sheet resistance value was measured through the American standard ASTM F1711 (Loresta-EP MCP T-360), the anti-radiation degree before coating
  • the durability test was performed by continuously drawing a 250g loading polyacetal stylus pen with a line length of 5cm.
  • Example 1 compared with Comparative Example 1, Example 1 had almost no difference in sheet resistance value, and the transmittance was improved, so that the antireflection effect was remarkably excellent.
  • Example 1 the antireflection effect is excellent when compared with Comparative Example 1, and the sheet resistance value of the original ITO electrode layer is maintained when compared with Comparative Example 2, and applied to the electrode of the touch panel unlike Comparative Example 2. It can be seen that.
  • Example 1 As a result of the durability test between Example 1 and Comparative Example 1, as shown in Table 2, in the case of Example 1, the initial resistance value (R 0 ) value is 645 ⁇ , and if the cumulative 130,000 times scratched resistance value ( It is understood that R 2 ) is 665 ⁇ and that R 2 / R 0 is 1.03 times and there is no difference in resistance value. On the other hand, in the comparative example, the initial resistance (R 0 ) value is 580 ⁇ , and when the cumulative 130,000 times scraping resistance value (R 2 ) is 7650 ⁇ , it can be seen that R 2 / R 0 is 13.22 times.
  • Example 1 Accordingly, in the case of Example 1, it can be seen that the durability is much superior to Comparative Example 1.
  • the ITO electrode layer 30 was formed in the cross section, and the opposite side prepared a hard coat PET film. Thereafter, the surface of the ITO electrode layer was cleaned using a UV cleaner. An organic-inorganic conductive fine particle dispersion including carbon nanotubes was coated on the surface of the ITO conductive layer through spray coating. After drying for 10 minutes in an oven at 100 ° C., the antireflective resin coating composition made of an organic-inorganic hybrid resin was coated on the surface of the organic-inorganic conductive particulate coating through dip coating. The thickness of the coating film of the final coating composition was adjusted to 130 nm. After coating, the mixture was cured in an oven at 130 ° C. for 30 minutes.
  • Example 2 the transmittance, the sheet resistance value, and the antireflection degree were compared with Example 1 described above.
  • the transmittance measurement was made through the standard JIS K-7361 (Haze meter NDH 2000), the sheet resistance value was measured through the American standard ASTM F1711 (Loresta-EP MCP T-360), the anti-radiation degree before coating The subsequent permeability difference was made through comparison.
  • Example 2 As a result, as shown in Table 3, in Example 2, the sheet resistance is increased by about 10% compared to Example 1, but it can be seen that the antireflection effect is improved in view of the transmittance improvement range.
  • Example 1 Transmittance % 91.5 92.0 Sheet resistance ⁇ / ⁇ 400 450 Antireflection degree % 4.0 4.5
  • the present invention can be used in a field in which a transparent conductive sheet coated with an antireflection layer is applied, such as various fields such as a flat panel display panel, a touch panel, antistatic, and a transparent heating element.

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Abstract

La présente invention concerne une feuille conductrice transparente enduite d'une couche anti-réfléchissante et un procédé de fabrication de ladite feuille conductrice transparente, la feuille conductrice transparente enduite de la couche anti-réfléchissante selon un mode de réalisation souhaitable de la présente invention comprenant : un matériau de base transparent ; une couche électrode transparent enduite d'un matériau conducteur sur un côté du matériau de base transparent ; et une couche anti-réfléchissante formée sur la couche électrode, la couche anti-réfléchissante comprenant une microparticule conductrice organique/inorganique et une résine anti-réfléchissante, dont un indice de réfraction est inférieur à celui de la couche électrode, et une résistance superficielle de la feuille conductrice transparente est 1 à 5000 Ω/sq. Grâce à la présente invention, un facteur de transmission optimisé et une feuille conductrice transparente qui possède une résistance superficielle égale à la résistance superficielle d'origine de la couche électrode peuvent être obtenus en même temps.
PCT/KR2011/006765 2010-09-17 2011-09-14 Feuille conductrice transparente enduite de couche anti-réfléchissante et procédé de fabrication de ladite feuille conductrice transparente Ceased WO2012036453A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20100091368A KR101187810B1 (ko) 2010-09-17 2010-09-17 반사방지층이 코팅된 투명도전성 시트 및 이의 제조 방법
KR10-2010-0091368 2010-09-17

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WO2012036453A2 true WO2012036453A2 (fr) 2012-03-22
WO2012036453A3 WO2012036453A3 (fr) 2012-05-31

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JP2017530074A (ja) * 2014-07-30 2017-10-12 エルジー・ハウシス・リミテッドＬｇ Ｈａｕｓｙｓ，Ｌｔｄ． 低放射コーティング、及び低放射コーティングを含む窓戸用機能性建築資材

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MY171697A (en) * 2012-09-28 2019-10-23 Ppg Ind Ohio Inc Electrically conductive coatings containing graphenic carbon particles
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KR101947604B1 (ko) * 2015-03-25 2019-02-14 주식회사 엘지화학 전도성 구조체 및 이의 제조방법
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WO2017010816A1 (fr) * 2015-07-14 2017-01-19 주식회사 엘지화학 Structure conductrice, procédé de fabrication associé et panneau tactile et dispositif d'affichage la comprenant
US10528167B2 (en) 2015-07-14 2020-01-07 Lg Chem, Ltd. Conductive structure, method for manufacturing same, touch panel comprising same and display device comprising same

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WO2012036453A3 (fr) 2012-05-31
KR101187810B1 (ko) 2012-10-05

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