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WO2012073995A1 - Heteroaromatic ring compound and pest control application thereof - Google Patents

Heteroaromatic ring compound and pest control application thereof Download PDF

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Publication number
WO2012073995A1
WO2012073995A1 PCT/JP2011/077640 JP2011077640W WO2012073995A1 WO 2012073995 A1 WO2012073995 A1 WO 2012073995A1 JP 2011077640 W JP2011077640 W JP 2011077640W WO 2012073995 A1 WO2012073995 A1 WO 2012073995A1
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group
formula
compound
halogen atoms
represented
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French (fr)
Japanese (ja)
Inventor
舞衣 伊藤
池上 宏
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/04Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/34Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom
    • A01N43/40Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/48Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with two nitrogen atoms as the only ring hetero atoms
    • A01N43/561,2-Diazoles; Hydrogenated 1,2-diazoles
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/64Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with three nitrogen atoms as the only ring hetero atoms
    • A01N43/647Triazoles; Hydrogenated triazoles
    • A01N43/6531,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N47/00Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid
    • A01N47/08Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid the carbon atom having one or more single bonds to nitrogen atoms
    • A01N47/10Carbamic acid derivatives, i.e. containing the group —O—CO—N<; Thio analogues thereof
    • A01N47/16Carbamic acid derivatives, i.e. containing the group —O—CO—N<; Thio analogues thereof the nitrogen atom being part of a heterocyclic ring
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P33/00Antiparasitic agents
    • A61P33/14Ectoparasiticides, e.g. scabicides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D403/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
    • C07D403/04Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/04Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/04Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond

Definitions

  • the present invention relates to a heteroaromatic ring compound and its use for pest control.
  • a compound having a pest control activity has been found and developed as an active ingredient of a pest control agent.
  • Patent Document 1 describes a compound having a thiazole ring and a pyridine ring in the molecule.
  • Patent Document 2 describes a compound having a pyrazole ring and a pyrimidine ring in the molecule.
  • An object of the present invention is to provide a novel compound having a controlling activity against pests.
  • the present inventor found that the compound represented by the following formula (1) has a control effect on pests, and further studied. As a result, the present invention has been completed.
  • Het is represented by the following formula H1, H2, H3, H4 or H5:
  • Y 1 represents —O—, —S— or —NE 2 —
  • Y 2 and Y 3 are the same or different and represent —CE 1 ⁇ or —N ⁇
  • at least one of Y 2 and Y 3 Are —CE 1 ⁇
  • Z 1 , Z 2 and Z 3 are the same or different and represent —CE 1 ⁇ or —N ⁇
  • E 1 has one or more halogen atoms
  • E 2 represents a C1-C2 alkyl group which may have one or more halogen atoms.
  • the mark represents the position where A is combined.
  • represents a 5-membered heterocycle represented by J is the following formula J1 or J2:
  • R 1 and R 2 are the same or different and each represents a C1-C3 alkyl group optionally having one or more halogen atoms
  • R 3 represents a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a halogen atom or a hydrogen atom
  • R 4 and R 5 are the same or different and each represents a methyl group or an ethyl group
  • R 6 represents a hydrogen atom or a C1-C6 chain hydrocarbon group.
  • L represents a single bond or a C1-C3 alkylene group which may have one or more halogen atoms
  • A represents a single bond, —O—, or —S (O) x — when Het is a group represented by the formula H1, H2, H3 or H5 (where x represents 0, 1 or 2).
  • G represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a hydroxyl group, a mercapto group or an amino group, or the following formulas G1, G2, G3 or G4:
  • R a represents a C1-C6 chain hydrocarbon group, a cyclopropyl group or —C (O) —T 1 which may have one or more atoms or groups selected from ⁇ Group ⁇ >;
  • R b is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from ⁇ Group ⁇ >, —C (O) —T 2 , —S (O) 2 —.
  • T 3 represents a C3-C9 trialkylsilyl group or a cyclopropyl group
  • R c represents a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from ⁇ Group ⁇ >, —C (O) —T 2 or a cyclopropyl group
  • z represents 0, 1 or 2
  • R d is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from ⁇ Group ⁇ >, —C (O) —T 2 , —S (O) 2 —.
  • R e represents a C1-C6 chain hydrocarbon group, hydrogen atom or cyclopropyl group which may have one or more atoms or groups selected from ⁇ Group ⁇ >;
  • T 1 has a C1-C6 alkyl group which may have one or more halogen atoms, a C1-C6 alkoxy group which may have one or more halogen atoms, and one or more halogen atoms.
  • An optionally substituted C1-C6 alkylamino group, an optionally substituted C2-C12 dialkylamino group, a hydroxyl group, an amino group, a hydrogen atom or a cyclopropyl group, T 2 has a C1-C6 alkyl group which may have one or more halogen atoms, a C1-C6 alkoxy group which may have one or more halogen atoms, and one or more halogen atoms.
  • T 3 represents a C1-C6 alkyl group which may have one or more halogen atoms.
  • Represents a group represented by D represents —N ⁇ or —CH ⁇ , m represents 0 or 1;
  • Het is a group represented by the formula H1, Y 1 is —S—, Y 2 and Y 3 are —CH ⁇ , A is —O—, L is a single bond, A compound in which J is a group represented by formula J1, R 1 , R 2 and R 3 are all methyl groups, G is a hydrogen atom, D is —CH ⁇ and m is 0 , (2) Het is a group represented by the formula H1, Y 1 is —O—, Y 2 and Y 3 are —CH ⁇ , A and L are single bonds, and J is represented by the formula J2.
  • a compound in which D is -N and m is 0, (5) Het is a group represented by the formula H4, Z 1 is —N ⁇ , Z 2 and Z 3 are —CH ⁇ , A and L are single bonds, and J is represented by the formula J1.
  • R 1 and R 2 are both methyl groups
  • R 3 is a hydrogen atom or a methyl group
  • G is a hydrogen atom
  • D is —CH ⁇ or —N ⁇
  • Het is a group represented by the formula H5, Z 1 is —N ⁇ , Z 2 is —C (CH 3 ) ⁇ , and Z 3 is —CH ⁇ .
  • A is —O—, L is a single bond, J is a group represented by the formula J1, R 1 and R 2 are both methyl groups, and R 3 is a hydrogen atom.
  • a heteroaromatic ring compound represented by the following (hereinafter referred to as the present compound).
  • [Item 2] The heteroaromatic ring compound according to [Item 1], wherein Het is a group represented by the formula H1.
  • [Claim 3] The heteroaromatic ring compound according to [Claim 2], wherein Y 1 is —S— or —O—.
  • a pest control agent comprising the heteroaromatic ring compound according to any one of [Item 1] to [Item 13] and an inert carrier.
  • [Item 15] Use of the heteroaromatic ring compound according to any one of [Item 1] to [Item 13] for controlling pests.
  • [Item 16] A method for controlling pests comprising a step of applying an effective amount of the heteroaromatic ring compound according to any one of [Item 1] to [Item 13] to a pest or a habitat of the pest.
  • the compound of the present invention is useful for controlling pests.
  • halogen atom means a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
  • examples of the “C1-C2 alkyl group optionally having one or more halogen atoms” represented by E 1 include a methyl group, an ethyl group, a trifluoromethyl group, and a difluoromethyl group.
  • examples of the “C1-C2 alkyl group optionally having one or more halogen atoms” represented by E 2 include a methyl group, an ethyl group, and 2,2,2-trifluoroethyl. Group, and a 2,2-difluoroethyl group.
  • examples of the “C1-C3 alkyl group optionally having one or more halogen atoms” include a methyl group, an ethyl group, a propyl group, an isopropyl group, and a trifluoromethyl group.
  • Examples of the “C1-C6 alkyl group optionally having one or more halogen atoms” in the compounds of the present invention include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, and a sec-butyl group. , Tert-butyl group, pentyl group, hexyl group and trifluoromethyl group.
  • examples of the “C1-C6 chain hydrocarbon group” include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, 2 , C1-C6 alkyl groups such as 2-dimethylpropyl group, 3-methylbutyl group, 2,3-dimethylbutyl group, 3,3-dimethylbutyl group and hexyl group; Vinyl group, 1-propenyl group, 2-propenyl group, isopropenyl group, 2-methyl-1-propenyl group, 1-butenyl group, 2-butenyl group, 3-butenyl group, 1-pentenyl group and 1-hexenyl group C2-C6 alkenyl group such as ethynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butyn
  • Examples of the “C1-C6 chain hydrocarbon group optionally having one or more halogen atoms” in the compounds of the present invention include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, sec 1 such as -butyl group, tert-butyl group, pentyl group, 2,2-dimethylpropyl group, 3-methylbutyl group, 2,3-dimethylbutyl group, 3,3-dimethylbutyl group hexyl group and trifluoromethyl group
  • a C1-C6 alkyl group optionally having one or more halogen atoms
  • examples of the “C1-C6 chain hydrocarbon group optionally having one or more atoms or groups selected from ⁇ group ⁇ >” include a methyl group, an ethyl group, a propyl group, and an isopropyl group.
  • a C1-C6 alkyl group such as butyl group, isobutyl group, sec-butyl group and tert-butyl group; C1- having one or more atoms or groups selected from ⁇ Group ⁇ > such as trifluoromethyl group, cyanomethyl group, cyclopropylmethyl group, methoxymethyl group, ethoxymethyl group, 1-methoxyethyl group and methylthiomethyl group A C6 alkyl group; One or more atoms selected from ⁇ Group ⁇ > such as vinyl group, isopropenyl group, 1-propenyl group, 2-methyl-1-propenyl group, 2,2-dichlorovinyl group and 2,2-difluorovinyl group Or a C2-C6 alkenyl group which may have a group; and ⁇ group ⁇ > such as an ethynyl group, a 1-propynyl group, a 2-chloroethynyl group, a 2-fluor
  • examples of the “C1-C6 chain hydrocarbon group optionally having one or more atoms or groups selected from ⁇ group ⁇ >” include a methyl group, an ethyl group, a propyl group, an isopropyl group.
  • a C1-C6 alkyl group such as butyl group, isobutyl group, sec-butyl group and tert-butyl group; Difluoromethyl group, trifluoromethyl group, 2-fluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,1-trifluoro-2-propyl group, cyanomethyl group 1-cyanoethyl group, cyclopropylmethyl group, 1- (cyclopropyl) ethyl group, methoxymethyl group, ethoxymethyl group, 1-methoxyethyl group, 2-methoxyethyl group, methylthiomethyl group, methylsulfinylmethyl group, methyl Sulfonylmethyl group, 2- (methylthio) ethyl group, 2- (methylsulfinyl) ethyl group, 2- (methylsulfonyl) ethyl group, 2- (
  • Examples of the “C1-C3 alkylene group optionally having one or more halogen atoms” in the compounds of the present invention include —CH 2 —, —CHCl—, —CHF—, —CF 2 —, —CH 2 CH 2 -and -CH 2 CH 2 CH 2 -are mentioned.
  • examples of the “C3-C9 trialkylsilyl group” include a trimethylsilyl group, a tert-butyldimethylsilyl group, a triethylsilyl group, an isopropyldimethylsilyl group, and a triisopropylsilyl group.
  • Examples of the “C1-C6 alkoxy group optionally having one or more halogen atoms” in the compounds of the present invention include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, an isobutoxy group, and a sec-butoxy group.
  • examples of the “C1-C6 alkylamino group optionally having one or more halogen atoms” include, for example, methylamino group, ethylamino group, propylamino group, isopropylamino group, butylamino group, isobutyl
  • An amino group, a sec-butylamino group, a tert-butylamino group and a 2,2,2-trifluoroethylamino group can be mentioned.
  • Examples of the “C2-C12 dialkylamino group optionally having one or more halogen atoms” in the compound of the present invention include N, N-dimethylamino group, N, N-diethylamino group, N, N-dipropyl group.
  • An amino group and an N-methyl-N- (2,2,2-trifluoroethyl) amino group can be mentioned.
  • Examples of the “C1-C4 alkoxy group optionally having one or more halogen atoms” in the compounds of the present invention include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, an isobutoxy group, and a sec-butoxy group. Group, tert-butoxy group and 2,2,2-trifluoroethoxy group.
  • examples of the “C1-C4 alkylthio group optionally having one or more halogen atoms” include, for example, methylthio group, ethylthio group, propylthio group, isopropylthio group, butylthio group, isobutylthio group, sec- Examples thereof include a butylthio group, a tert-butylthio group and a 2,2,2-trifluoroethylthio group.
  • Examples of the “C1-C4 alkylsulfinyl group optionally having one or more halogen atoms” in the compounds of the present invention include a methylsulfinyl group, an ethylsulfinyl group, a propylsulfinyl group, an isopropylsulfinyl group, a butylsulfinyl group, an isobutyl group. Examples thereof include a sulfinyl group, a sec-butylsulfinyl group, a tert-butylsulfinyl group, and a 2,2,2-trifluoroethylsulfinyl group.
  • examples of the “C1-C4 alkylsulfonyl group optionally having one or more halogen atoms” include, for example, methylsulfonyl group, ethylsulfonyl group, propylsulfonyl group, isopropylsulfonyl group, butylsulfonyl group, isobutyl Examples include a sulfonyl group, a sec-butylsulfonyl group, a tert-butylsulfonyl group, and a 2,2,2-trifluoroethylsulfonyl group.
  • examples of the “C1-C4 alkylamino group optionally having one or more halogen atoms” include, for example, methylamino group, ethylamino group, propylamino group, isopropylamino group, butylamino group, isobutyl
  • An amino group, a sec-butylamino group, a tert-butylamino group and a 2,2,2-trifluoroethylamino group can be mentioned.
  • Examples of the “C2-C8 dialkylamino group optionally having one or more halogen atoms” in the compounds of the present invention include N, N-dimethylamino group, N, N-diethylamino group, N, N-dipropyl group.
  • An amino group and an N-methyl-N- (2,2,2-trifluoroethyl) amino group can be mentioned.
  • the “phenyl group (the phenyl group may have one or more groups selected from the group consisting of a methyl group, a methoxy group, a chlorine atom and a nitro group)” is, for example, a phenyl group 4-methoxyphenyl group, 3,4-dimethoxyphenyl group, 4-nitrophenyl group, 2-nitrophenyl group, 4-chlorophenyl group, 2-chlorophenyl group, 2,6-dichlorophenyl group and 4-methylphenyl group.
  • each E 1 group may be the same or different.
  • examples of the compound of the present invention include the following heteroaromatic ring compounds.
  • L is a single bond or —CH 2 —
  • A is a single bond or —O—
  • J is a group represented by the formula J1 (R 1 and R 2 are both methyl groups)
  • R 3 is a hydrogen atom, a methyl group, or an ethyl group.
  • R 4 , R 5, and R 6 are all methyl groups
  • [Claim 1] The compound according to any one of [Aspect A] to [Aspect Z] and [Aspect 1] to [Aspect 23];
  • L is —CH 2 —
  • A is a single bond
  • J is a group represented by the formula J1 (R 1 and R 2 are both methyl groups
  • R 3 is a hydrogen atom, A methyl group or an ethyl group) or a group represented by formula J2 (wherein R 4 , R 5 and R 6 are all
  • G is a group represented by the formula G2, and R b is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from ⁇ Group ⁇ >, G is a group represented by the formula G3, and R c is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from ⁇ Group ⁇ >, or , G is a group represented by the formula G4, R d is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from ⁇ Group ⁇ >, and R e Is a C1-C6 chain hydrocarbon group or hydrogen atom which may have one or more atoms or groups selected from ⁇ Group ⁇ > [Claim 1] and [Aspect A] to [Aspect Z] A compound according to any of the above;
  • G is hydrogen atom, fluorine atom, chlorine atom, bromine atom, methyl group, ethyl group, propyl group, iso
  • Group or G is a group represented by the formula G4, R d is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from ⁇ Group ⁇ >, and R e Is a C1-C6 chain hydrocarbon group or hydrogen atom which may have one or more atoms or groups selected from ⁇ Group ⁇ > [Claim 1] and [Aspect A] to [Aspect Z] A compound according to any of the above;
  • G is methyl group, ethyl group, propyl group, isopropyl group, N, N-dimethylamino group, N, N-diethylamino group, N, N-dipropylamino group, N-ethyl-N.
  • G is a group represented by the formula G1, and R a may have one or more atoms or groups selected from ⁇ Group ⁇ >.
  • G is a methyl group, an ethyl group, a propyl group or an isopropyl group [Claim 1] and the compound according to any one of [Aspect A] to [Aspect Z];
  • [Claim 1] which is a group and the compound according to any one of [Aspect A] to [Aspect Z];
  • any one of [Claim 1] and [Aspect A] to [Aspect Z] wherein G is a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, or a 2,2,2-trifluoroethoxy group A compound according to claim 1;
  • G is a
  • G is a methylthio group, an ethylthio group, a propylthio group, an isopropylthio group, or a 2,2,2-trifluoroethylthio group. Any one of the compounds; In the formula (1), G is a group represented by the formula G4, and R d is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from ⁇ Group ⁇ >.
  • R e is a C1-C6 chain hydrocarbon group or hydrogen atom which may have one or more atoms or groups selected from ⁇ Group ⁇ > [Claim 1] and [Aspect A ] To [Aspect Z]
  • G is N, N-dimethylamino group, N, N-diethylamino group, N, N-dipropylamino group, N-ethyl-N-methylamino group, N-methyl-N-propyl.
  • Amino group N-isopropyl-N-methylamino group, N-methyl-N- (2,2,2-trifluoroethyl) amino group, N-methylamino group, N-ethylamino group, N-propylamino group
  • the compound of the present invention can be produced, for example, according to the following (Production Method 1) to (Production Method 9).
  • Het1 represents a group of the formula H1, H2, H3 or H4, Lg 1 is a chlorine atom, a bromine atom, It represents a leaving group such as an iodine atom or a trifluoromethanesulfonyloxy group, Lg 2 represents a B (OH) 2 group or a B (OR f ) 2 group (wherein R f may be the same or different) , A C1-C6 alkyl group, and two R f can be bonded to form a —CH 2 CH 2 — group or a —C (CH 3 ) 2 C (CH 3 ) 2 — group.
  • the compound of the present invention can produce compound (1a) by reacting compound (2) with the compound represented by formula (3) in the presence of a solvent, a catalyst and a base. .
  • solvent used in the reaction examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile, and the like.
  • ethers such as tetrahydrofuran, ethylene glycol dimethyl ether, and 1,4-dioxane
  • aromatic hydrocarbons such as toluene and xylene
  • halogenated hydrocarbons such as methylene chloride and chloroform
  • acetonitrile examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether, and 1,4-dioxane
  • aromatic hydrocarbons such as toluene and xylene
  • halogenated hydrocarbons such as methylene chloride and chloroform
  • acetonitrile aceton
  • Examples of the catalyst used in the reaction include palladium catalysts such as tetrakis (triphenylphosphine) palladium and [1,1'-bis (diphenylphosphino) ferrocene] dichloropalladium methylene chloride complex.
  • the amount of the catalyst used is in the range of 0.0001 to 0.1 times mol for 1 mol of compound (2).
  • Examples of the base used in the reaction include inorganic bases such as sodium hydroxide, potassium hydroxide, potassium carbonate, cesium carbonate, potassium tert-butoxide, potassium phosphate, and organic acid salts such as sodium acetate and potassium acetate. Is mentioned.
  • the amount of the base used is in the range of 0.5 to 10 times mol per mol of compound (2).
  • Compound (3) is usually used at a ratio of 1 mol per 1 mol of compound (2), but can be appropriately changed.
  • the reaction temperature in the reaction is usually in the range of 20 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.
  • the reaction is preferably performed in an atmosphere of an inert gas such as nitrogen gas or argon gas.
  • the compound (1a) can be isolated by carrying out ordinary post-treatment operations.
  • Lg 3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, paratoluene. It represents a leaving group such as a sulfonyloxy group or a trifluoromethanesulfonyloxy group.
  • the compound (1b) of the present invention can be produced by reacting the compound (4) and the compound (5) in the presence of a base.
  • the reaction is usually carried out in the presence of a solvent.
  • a solvent such as ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, chlorides, and the like.
  • halogenated hydrocarbons such as methylene and chloroform, nitriles such as acetonitrile, acid amides such as N, N-dimethylformamide and N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.
  • Examples of the base used in the reaction include sodium hydroxide, potassium hydroxide, sodium hydride, potassium carbonate, cesium carbonate, potassium tert-butoxide and the like.
  • the base is usually used in a proportion of 1 mol to 10 mol with respect to compound (4).
  • Compound (5) is usually used at a ratio of 1 mol per 1 mol of compound (4), but can be appropriately changed.
  • the reaction temperature in the reaction between the compound (4) and the compound (5) is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.
  • the compound (1b) of the present invention can be isolated by performing ordinary post-treatment operations.
  • Lg 4 represents a leaving group such as a fluorine atom, a chlorine atom or a bromine atom.
  • the compound (1c) of the present invention can be produced by reacting the compound (6) and the compound (7) in the presence of a base.
  • the reaction is usually carried out in the presence of a solvent.
  • a solvent such as ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, chlorides, and the like.
  • halogenated hydrocarbons such as methylene and chloroform, nitriles such as acetonitrile, acid amides such as N, N-dimethylformamide and N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.
  • Examples of the base used in the reaction include sodium hydroxide, potassium hydroxide, sodium hydride, potassium carbonate, cesium carbonate, potassium tert-butoxide and the like.
  • the base is usually used in a proportion of 1 mol to 10 mol with respect to compound (6).
  • Compound (7) is usually used in a ratio of 1 mol per 1 mol of compound (6), but can be appropriately changed.
  • the reaction temperature in the reaction of the compound (6) and the compound (7) is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.
  • the compound (1c) of the present invention can be isolated by performing ordinary post-treatment operations.
  • Het2 represents a group represented by the formula H1, H2 or H3, and L ′ represents a single bond or one or more halogens.
  • Lg 5 represents a leaving group such as a chlorine atom, a bromine atom or an iodine atom
  • R g represents a hydrogen atom, a methyl group, a methylthio group, a methoxy group, a phenyl group
  • Compound (10) can be produced by reacting compound (8) with an alkyllithium compound and then reacting the resulting reaction intermediate with an aldehyde represented by formula (9).
  • Two Lg 1 of the compound (8) may be the same or different.
  • the reaction is usually carried out in the presence of a solvent.
  • a solvent examples include ethers such as diethyl ether, tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, and aromatic hydrocarbons such as toluene and xylene. Is mentioned.
  • alkyllithium compound used in the reaction examples include n-, sec- or tert-butyllithium, preferably n-butyllithium.
  • the alkyllithium compound is usually used at a ratio of 1 mol per 1 mol of the compound (8), but can be appropriately changed.
  • the reaction temperature in the reaction between the compound (8) and the alkyl lithium compound is usually in the range of ⁇ 78 ° C. to 0 ° C., and the reaction time is usually in the range of 1 hour from the instant.
  • Compound (9) is usually used at a ratio of 1 mol per 1 mol of compound (8), but can be appropriately changed.
  • the reaction temperature in the reaction between the reaction intermediate and compound (8) is usually in the range of ⁇ 78 ° C. to 30 ° C., and the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (10) can be isolated by pouring water or an aqueous ammonium chloride solution into the reaction mixture, extracting with an organic solvent, and performing a normal post-treatment operation.
  • This reaction can be produced by the production method of compound (1a) described in production method 1 or a method analogous thereto.
  • reaction can be prepared by a Barton-McCombie dehydroxylation reaction known to those skilled in the art.
  • Compound (14) can be produced by reacting compound (6) with dihalopyrimidine compound (13) in the presence of a base.
  • Two Lg 4 groups in the compound (13) may be different from each other, but a compound in which the two Lg 4 groups are both chlorine atoms is preferable.
  • the reaction is usually performed in the presence of a solvent.
  • a solvent examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, methylene chloride, and the like.
  • Halogenated hydrocarbons such as chloroform, nitriles such as acetonitrile, acid amides such as N, N-dimethylformamide and N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.
  • Examples of the base used in the reaction include sodium hydroxide, potassium hydroxide, sodium hydride, potassium carbonate, cesium carbonate, potassium tert-butoxide and the like.
  • the base is usually used in a proportion of 1 mol to 10 mol with respect to 1 mol of the compound (6).
  • Compound (13) is usually used at a ratio of 1 mol per 1 mol of compound (6), but can be appropriately changed.
  • the reaction temperature in the reaction is usually in the range of 20 ° C. to 200 ° C. or the boiling point of the solvent.
  • the reaction time in the reaction is usually in the range of 0.1 to 24 hours.
  • the compound (14) can be isolated by performing ordinary post-treatment operations.
  • the compound (1e) of the present invention can be produced by dehalogenating the compound (14).
  • Examples of the dehalogenation method include a catalytic hydrogen reduction reaction.
  • the catalytic hydrogen reduction reaction is performed by reacting with hydrogen in the presence of a solvent and a catalyst.
  • Examples of the solvent used in the reaction include alcohols such as methanol and ethanol, esters such as ethyl acetate, carboxylic acids such as acetic acid, and water.
  • the molar ratio is usually 0.01 mol to 10 mol with respect to 1 mol of compound (14).
  • Examples of the base used in the reaction include magnesium oxide, sodium hydroxide, sodium acetate, and triethylamine.
  • Examples of the acid include sulfuric acid and hydrochloric acid.
  • Examples of the catalyst used in the reaction include palladium on carbon.
  • the hydrogen pressure is usually 1 to 5 atm.
  • the reaction time in the reaction is usually in the range of 0.1 to 24 hours.
  • the present compound (1e) can be isolated by removing the catalyst by filtration and then performing a usual post-treatment operation.
  • R b1 has one or more atoms or groups selected from ⁇ Group ⁇ >.
  • R b2 represents an OH-protecting group (for example, a methyl group, a methoxymethyl group, a benzyl group, etc.).
  • the compound (1g ′) of the present invention can be produced by reacting the compound (1f) of the present invention with R b1 OH in the presence of a base.
  • reaction is usually performed in the presence of a solvent, but R b1 OH may be used in an amount of a solvent.
  • solvent used in the reaction examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile.
  • ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane
  • aromatic hydrocarbons such as toluene and xylene
  • halogenated hydrocarbons such as methylene chloride and chloroform
  • acetonitrile examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane
  • aromatic hydrocarbons such as toluene and xylene
  • halogenated hydrocarbons such as methylene chloride and chloroform
  • acetonitrile examples include acetonitrile.
  • Examples of the base used in the reaction include sodium hydride, sodium hydroxide, potassium hydroxide, sodium hydride, potassium carbonate, cesium carbonate, potassium tert-butoxide and the like.
  • R b1 OH is usually used in a proportion of 1 to 10 mol
  • the base is usually used in a proportion of 1 to 10 mol with respect to 1 mol of the compound (1f) of the present invention.
  • the reaction temperature of the reaction is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound of the present invention (1g ′) can be isolated by performing a general post-treatment operation after the reaction.
  • the compound (1h) of the present invention can be produced by deprotecting the compound (1i) of the present invention.
  • Examples of the protecting group R b2 include a methyl group, a methoxymethyl group, and a benzyl group, which can be deprotected by methods known to those skilled in the art.
  • the compound (1g) of the present invention can be produced by reacting the compound (1h) of the present invention with R b Lg 3 in the presence of a base.
  • solvent used in the reaction examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile.
  • ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane
  • aromatic hydrocarbons such as toluene and xylene
  • halogenated hydrocarbons such as methylene chloride and chloroform
  • acetonitrile examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane
  • aromatic hydrocarbons such as toluene and xylene
  • halogenated hydrocarbons such as methylene chloride and chloroform
  • acetonitrile examples include acetonitrile.
  • Examples of the base used in the reaction include alkali metal hydrides such as sodium hydride, carbonates such as potassium carbonate, potassium carbonate, cesium carbonate and sodium hydrogen carbonate, and metal water such as sodium hydroxide and potassium hydroxide.
  • Examples thereof include oxides, organic bases such as pyridine, triethylamine, diisopropylethylamine, sodium hydroxide, potassium hydroxide, potassium carbonate, cesium carbonate, sodium hydrogen carbonate and the like.
  • the base is generally used in a proportion of 1 mol to 10 mol with respect to 1 mol of the compound (1h) of the present invention.
  • R b Lg 3 is used usually in a proportion of 1 mole, but may be appropriately changed.
  • the reaction temperature of the reaction is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is usually from 0.1 to 24 hours.
  • the compound of the present invention (1 g) can be isolated by carrying out normal post-treatment operations after completion of the reaction.
  • this invention compound (1g) includes this invention compound (1g ').
  • R c1 may have one or more atoms or groups selected from ⁇ Group ⁇ >. Represents a C6 chain hydrocarbon group.
  • the compound (1j) of the present invention can be produced by reacting the compound (1f) of the present invention with R c1 SH in the presence of a base.
  • solvent used in the reaction examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile.
  • ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane
  • aromatic hydrocarbons such as toluene and xylene
  • halogenated hydrocarbons such as methylene chloride and chloroform
  • acetonitrile examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane
  • aromatic hydrocarbons such as toluene and xylene
  • halogenated hydrocarbons such as methylene chloride and chloroform
  • acetonitrile examples include acetonitrile.
  • Examples of the base used in the reaction include sodium hydride, sodium hydroxide, potassium hydroxide, sodium hydride, potassium carbonate, cesium carbonate, potassium tert-butoxide and the like.
  • R 1 C1 SH is usually used in a proportion of 1 to 10 mol and a base is usually used in a proportion of 1 to 10 mol per 1 mol of the compound (1f) of the present invention.
  • the reaction temperature of the reaction is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is usually from 0.1 to 24 hours.
  • the compound (1j) of the present invention can be isolated by performing ordinary post-treatment operations.
  • the present compound (1j) is further subjected to an oxidation reaction known to those skilled in the art to convert -SR c1 in the present compound (1j) to -S (O) z1 R c1 (in this case) , Z1 represents 1 or 2).
  • the compound (1l) of the present invention can be produced by reacting the compound (1k) of the present invention with R d Lg 3 in the presence of a base.
  • solvent used in the reaction examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile.
  • ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane
  • aromatic hydrocarbons such as toluene and xylene
  • halogenated hydrocarbons such as methylene chloride and chloroform
  • acetonitrile examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane
  • aromatic hydrocarbons such as toluene and xylene
  • halogenated hydrocarbons such as methylene chloride and chloroform
  • acetonitrile examples include acetonitrile.
  • Examples of the base used in the reaction include alkali metal hydrides such as sodium hydride, carbonates such as potassium carbonate, potassium carbonate, cesium carbonate and sodium hydrogen carbonate, and metal water such as sodium hydroxide and potassium hydroxide.
  • Examples thereof include oxides, organic bases such as pyridine, triethylamine, diisopropylethylamine, sodium hydroxide, potassium hydroxide, potassium carbonate, cesium carbonate, sodium hydrogen carbonate and the like.
  • the base is generally used in a ratio of 1 mol to 2 mol with respect to 1 mol of the compound (1k) of the present invention.
  • R e Lg 3 is usually used in a proportion of 1 mol per 1 mol of the compound (1k) of the present invention, but can be appropriately changed.
  • the reaction temperature of the reaction is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound of the present invention (1l) can be isolated by carrying out ordinary post-treatment operations.
  • R d or R e is a primary or secondary alkyl group
  • the present compound (1k) or the present compound (1l) is reduced with an aldehyde or a ketone compound instead of the above method.
  • This invention compound (1l) or this invention compound (1m) can also be manufactured by making it react in presence of an agent.
  • Examples of the reducing agent used in the reaction include sodium triacetoxyborohydride.
  • Sodium triacetoxyborohydride is used in a ratio of 1 to 5 moles with respect to 1 mole of the compound (1k) or the compound (1l) of the present invention.
  • solvent used in the reaction examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as dichloromethane and chloroform, and the like. A mixture is mentioned. Moreover, it reacts by adding carboxylic acids, such as an acetic acid, as needed.
  • the aldehyde or ketone compound is usually used at a ratio of 1 mole per 1 mole of the compound (1k) or the compound (1l) of the present invention, but can be appropriately changed.
  • the reaction temperature of the reaction is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound of the present invention (1l) or the compound of the present invention (1m) can be isolated by performing ordinary post-treatment operations.
  • the compound (1o) of the present invention can be produced by reacting the pyridine compound represented by the formula (1n) with an oxidizing agent.
  • the reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include halogenated hydrocarbons such as methylene chloride and chloroform, acetic acid, water, and mixtures thereof.
  • oxidizing agent used in the reaction examples include peroxides of carboxylic acids such as 3-chloroperbenzoic acid, hydrogen peroxide water, and the like.
  • the oxidizing agent is usually used at a ratio of 1 to 3 moles with respect to 1 mole of the compound (1n).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 100 ° C., and the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (1o) of the present invention can be isolated by carrying out ordinary post-treatment operations.
  • the intermediate of the present invention can be produced, for example, by the following method.
  • Het is a group represented by the formula H4, and an intermediate (4a) of a compound in which Z 1 , Z 2 and Z 3 are —CE 1 ⁇ is produced, for example, according to the following scheme be able to.
  • Compound (4a) can be produced by reacting compound (15) with p-toluenesulfonyl isocyanide compound (16) in the presence of a base.
  • the reaction is usually carried out in the presence of a solvent.
  • a solvent such as ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, chlorides, and the like.
  • halogenated hydrocarbons such as methylene and chloroform, nitriles such as acetonitrile, acid amides such as N, N-dimethylformamide and N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.
  • Examples of the base used in the reaction include sodium hydride, sodium tert-butoxide, potassium tert-butoxide, 1,8-diazabicyclo [5,4,0] undec-7-ene, n-butyllithium and the like.
  • the base is usually used in a proportion of 1 mol to 10 mol with respect to compound (15).
  • the reaction can be performed in the presence of an additive (for example, a metal salt such as lithium bromide) as necessary.
  • an additive for example, a metal salt such as lithium bromide
  • the paratoluenesulfonyl isocyanide compound (16) is usually used at a ratio of 1 mole per 1 mole of the compound (15), but can be changed as appropriate.
  • the reaction temperature in the reaction of the compound (15) and the compound (16) is usually in the range of ⁇ 78 ° C. to 30 ° C., and the reaction time is in the range of 0.1 hour to 24 hours.
  • the compound (4a) can be isolated by performing a normal post-treatment operation.
  • R h represents a C1-C6 alkyl group, and R h may be the same or different.
  • Compound (19) can be produced by reacting compound (17) with compound (18).
  • Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile, and the like. Nitriles, N, N-dimethylformamide, acid amides such as N-methylpyrrolidinone, sulfoxides such as dimethylsulfoxide, and mixtures thereof. Moreover, it can also be made to react by using an acetal compound represented by Formula (18) in excess without using a solvent. The amount thereof to be used is generally in the range of 1.0 mol to 10 mol with respect to 1 mol of compound (17).
  • the reaction temperature in the reaction of the compound (17) and the compound (18) is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.
  • the compound (19) can be isolated by ordinary post-treatment operations.
  • solvent used in the reaction examples include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile, and the like. Nitriles, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.
  • Hydrazine is usually used in a ratio of 1 mol per 1 mol of compound (19), but can be changed as appropriate.
  • the reaction temperature in the reaction of the compound (19) with hydrazine is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.
  • the compound (4b) can be isolated by carrying out a normal post-treatment operation.
  • an intermediate (4c) of a compound in which Het is a group represented by the formula H4, Z 1 and Z 3 are —CE 1 ⁇ , and Z 2 is —N ⁇ is, for example, the following scheme Can be manufactured according to
  • Compound (4c) can be produced from compound (19) described in Intermediate Production Method 2 by the production method of compound (4b) or a method analogous thereto.
  • an intermediate (4e) of a compound in which Het is a group represented by the formula H4 and Z 1 , Z 2 and Z 3 are —N ⁇ can be produced, for example, according to the following scheme Can do.
  • Examples of the solvent used in the reaction include acetic acid.
  • the hydrazine compound is usually used at a ratio of 1 mole per 1 mole of the compound (22), but can be appropriately changed.
  • the reaction temperature in the reaction between the compound (22) and the hydrazine compound is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.
  • the compound (4e) can be isolated by ordinary post-treatment operations.
  • the compounds of the present invention there are also compounds capable of forming acid addition salts such as hydrochloride, nitrate, sulfate, hydrobromide, phosphate, carbonate, acetate, lactate, citrate, etc. To do.
  • acid addition salts such as hydrochloride, nitrate, sulfate, hydrobromide, phosphate, carbonate, acetate, lactate, citrate, etc.
  • the production of these acid addition salts can also follow conventional methods, and the present invention also includes these acid addition salts.
  • pests for which the compounds of the present invention are effective include harmful arthropods such as harmful insects and harmful mites, linear animals and molluscs. Specific examples of such pests include the following.
  • Hemiptera small brown planthopper (Laodelphax striatellus), brown planthopper (Nilaparvata lugens), planthoppers such as Sejirounka (Sogatella furcifera), green rice leafhopper (Nephotettix cincticeps), Taiwan green rice leafhopper (Nephotettix virescens), tea Roh green leafhopper (Empoasca onukii) such as Leafhoppers, cotton aphids (Aphis gossypi), peach aphids (Myzus persicae), radish aphids (Brevicorine brassicae), aphid spiraecola, tulip beetle aphids (Macrosiphum euphorbiae), potato beetle aphids (Aulacorthum solani), wheat beetle aphids (Rhopalosiphum pasid), citrus aphids (
  • Lepidoptera rice stem borer (Chilo suppressalis), Sankameiga (Tryporyza incertulas), leaf roller (Cnaphalocrocis medinalis), Watanomeiga (Notarcha derogata), Indian meal moth (Plodia interpunctella), the European corn borer (Ostrinia furnacalis), high Madara Roh moth (Hellula undalis), Common moths such as Shibatatsuga (Pediasia teterrellus), Lotus moth (Spodoptera litura), Spodoptera exigua, Ayuyotoga (Pseudaletia separata), Yotoga Mestra brassicae, Agrotis ipsilon, Tamanagine waiba (Prusia nigrisigna), Trichopulsia, Heliotis, Helicoberpas, etc .; (Leguminivora glycinivolora), Azusa yamashiga (Matsumuraeses
  • Thrips of the order Thrips thrips Thrips of the order Thrips thrips, Sriptotrips dorsalis, Sriptorips dorsalis
  • Diptera Culex (Culex pipiens pallens), Culex (Culex tritaeniorhynchus), Culex such as Culex quinquefasciatus (Culex quinquefasciatus), Aedes aegypti (Aedes aegypti), Aedes albopictus (Aedes albopictus) Aedes genus such as Anopheles sinensis (Anopheles sinensis), etc. Genus Anopheles, chironomid, housefly (Musca domestica), housefly (Muscina stabulans), etc.
  • Moguribae (Agromyza oryzae), rice Hime leafminer (Hydrellia griseola), tomato leafminer, (Liriomyza sativae), legume leafminer (Liriomyza trifolii), leafminer such as the pea (Chromatomyia horticola), chloropidae such as Inekimoguribae (Chlorops oryzae), melon fly (Dacus cucurbitae), fruit flies such as Ceratitis capitata, fruit flies such as Drosophila, fleas such as Megaselia spiracularis, Clogmial etc. Flies such, blackfly acids, Abu such as gadfly (Tabanus trigonus), and stable flies and the like.
  • Coleoptera pests Western Corn Rootworm (Diabrotica virgifera virgifera), corn rootworm such as southern corn rootworm (Diabrotica undecimpunctata howardi), cupreous chafer (Anomala cuprea), rufocuprea (Anomala rufocuprea), chafers such as Japanese beetle (Popillia japonica) , Maizeweville (Sitophilus zeamais), Rice weevil (Lissohoptrus oryzophilus), Azuki weevil (Callosobrchuchus Kunststoffsis), Rice weevil (Echinocnemus squatius) Weevil (Anthonomus grandis), Weevil weevil (Sphenophorus venatus) and other weevil, Tenebrio molitor, Aureum oleume olium (Olymoidum) Leaf beetles such as Phyllotreta striola, Colorado potato beetle
  • Shimushi Shibamushi (Lasiderma serricorne), etc .
  • Japanese beetles longicorn beetles such as Anophorora malasiaca, click beetles (Agriotes spp.), And long-horned beetle (Paederus fuscipes).
  • Pterodoptera Tocusama grasshopper (Locusta migratoria), Kera (Gryllotalpa africana), Oxya yezoensis, Oyana japonica, Oroja japonica, etc.
  • Insect pests cat fleas (Ctenocephalides felis), dog fleas (Ctenocephalides canis), human fleas (Pulex irritans), keops mouse fleas (Xenopsilla cheopes) and the like.
  • Lice insect pests Japanese lice (Pediculus humnus corporis), pheasants (Phythrus pubis), cattle lice (Haematopinus eurysternus), sheep lice (Dalmalinia ostois aus pis)
  • Hymenoptera Monomorium phalaosis, Black sea ants (Formica fusca japonica), Luriari (Ochtellus puns), Pstomyrex puns, Pseudorme spr. Such as ants, hornets, hornets, bees (Athalia rosae), Japanese bees (Athalia japonica), and the like.
  • Cockroach eye pests German cockroaches (Blatella germanica), Black cockroaches (Periplaneta fuliginosa), Cockroach cockroach (Periplaneta americana), Japanese cockroach (Peripraneta bruna)
  • Termite pests Yamato termites (Reticulitermes supertus), Japanese termites (Coptothermes formosanus), American white termites (Incitermes minors), Cyptotermes domesticus, Glypoptermes satsumensis, Gyptotermes nakajimai, Caterpillars (Glyptotermes fuscus), Termites (Glypoptermes kodamai), Shimotoshiroari (Glyptotermes kushimensis), giant termite (Hodotermopsis japonica), Kou Shu Ye termite (Coptotermes guangzhoensis), Amami termites (Reticulitermes miyatakei), R.
  • flavipes (Reticulitermes flaviceps amamianus), Kang Mont termites (Reticulitermes sp.), Takasago termite (Nasutitermes takasagoensis ), Termites termites (Pericapritermes nitobei), termites termites (Sinocapriters mushae), Reticulitermes fl ipes, Reticulitermes hesperus, Reticulitermes virginicus, Reticulitermes tibialis, Heterotermes aureus, Zootermopsis nevadensis or the like.
  • Mite order pests Tick spider mites (Tetranychus urticae), Tick spider mites (Tetranychus kanzawai), citrus spider mite (Pananychus citri), mite spider mite (Panthonychus ulmi), prickly mite pistols, citrus urticae Tomato rust mites (Aculops lycopersici), Chanosabi mites (Calacarus carinatus), Chanogasabi mite (Acaphylla theevagrans), Green rust mites (Eriophyses chibaensis), Apple scab mites Achulus schizus endali) Fushidani such as, dust mite such as Chanohokoridani (Polyphagotarsonemus latus), southern Hime Himehadani such as spider mites (Brevipalpus phoenicis), Kenagahadani such, longicornis (Haemaphysalis longicornis), Yama
  • Lip limb class Geji (Thereunema hilgendorfi), Tobizukade (Scorpendra subspinipes), etc.
  • Double-legged class Oxidus gracilis, Nadeyopus tambanus, etc.
  • Isopods Armadillium vulgare, etc.
  • Gastropods Limax marginatus, Limax flavus, etc.
  • Nematodes rice Shin Galle nematode (Aphelenchoides besseyi), strawberry menu nematode (Nothotylenchus acris), sweet potato root-knot nematode (Meloidogyne incognita), northern root-knot nematode (Meloidogyne hapla), Java root-knot nematode (Meloidogyne javanica), soybean cyst nematode (Heterodera glycines), Potato cyst nematode (Globodera rostochiensis), southern nematode nectar (Pratylenchus coffeae), barley nematode nematode (Pratylenchus neglectus) and the like.
  • the pest control agent of the present invention contains the compound of the present invention and an inert carrier.
  • the pest control agent of the present invention is usually a mixture of the compound of the present invention and an inert carrier such as a solid carrier, liquid carrier, gaseous carrier, etc., and if necessary, a surfactant and other formulation adjuvants are added.
  • an inert carrier such as a solid carrier, liquid carrier, gaseous carrier, etc.
  • a surfactant and other formulation adjuvants are added.
  • they are formulated into emulsions, oils, powders, granules, wettable powders, flowables, microcapsules, aerosols, smoke agents, poison baits, resin formulations and the like.
  • the pest control agent of the present invention usually contains 0.01 to 95% by weight of the compound of the present invention.
  • solid carriers used for formulation include clays (kaolin clay, diatomaceous earth, bentonite, fusami clay, acidic clay), synthetic hydrous silicon oxide, talc, ceramics, and other inorganic minerals (sericite, quartz, sulfur). , Activated carbon, calcium carbonate, hydrated silica, etc.), fine fertilizers such as chemical fertilizers (ammonium sulfate, phosphorous acid, ammonium nitrate, urea, ammonium chloride, etc.) and granular materials.
  • liquid carriers examples include water, alcohols (methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol, etc.), ketones (acetone, methyl ethyl ketone, cyclohexanone, etc.), aromatic hydrocarbons.
  • alcohols methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol, etc.
  • ketones acetone, methyl ethyl ketone, cyclohexanone, etc.
  • aromatic hydrocarbons examples include water, alcohols (methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol, etc.
  • ketones acetone, methyl ethyl ket
  • Acid amides N, N-dimethylformamide, N, N-dimethylacetamide, etc.
  • halogenated hydrocarbons diichloromethane, trichloroethane, carbon tetrachloride, etc.
  • sulfoxides dimethylsulfoxide, etc.
  • propylene carbonate and vegetable oil Soybean oil, cottonseed oil, etc.
  • gaseous carrier examples include fluorocarbon, butane gas, LPG (liquefied petroleum gas), dimethyl ether, and carbon dioxide gas.
  • surfactant examples include nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, polyethylene glycol fatty acid ester, and the like, and alkyl sulfonate, alkyl benzene sulfonate, and alkyl sulfate.
  • nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, polyethylene glycol fatty acid ester, and the like
  • alkyl sulfonate alkyl benzene sulfonate
  • alkyl sulfate alkyl sulfate.
  • An ionic surfactant is mentioned.
  • formulation adjuvants include fixing agents, dispersants, colorants and stabilizers, such as casein, gelatin, saccharides (starch, gum arabic, cellulose derivatives, alginic acid, etc.), lignin derivatives, bentonite, Synthetic water-soluble polymers (polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acids, etc.), PAP (isopropyl acid phosphate), BHT (2,6-di-tert-butyl-4-methylphenol), BHA (2-tert- And a mixture of butyl-4-methoxyphenol and 3-tert-butyl-4-methoxyphenol).
  • fixing agents such as casein, gelatin, saccharides (starch, gum arabic, cellulose derivatives, alginic acid, etc.), lignin derivatives, bentonite, Synthetic water-soluble polymers (polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acids, etc.), PAP (iso
  • the pest control method of the present invention is carried out by applying an effective amount of the compound of the present invention directly to pests and / or to habitats of pests (plants, soil, households, animal bodies, etc.). .
  • the compound of the present invention is usually used in the form of the pest control agent of the present invention.
  • the application amount is 1 to 10,000 g in the amount of the present compound per 10,000 m 2 .
  • the pest control agent of the present invention is formulated into an emulsion, a wettable powder, a flowable agent, etc., it is usually diluted with water so that the active ingredient concentration is 0.01 to 10,000 ppm. Agents, powders, etc. are usually applied as they are.
  • preparations and water dilutions of the preparations may be sprayed directly on pests or plants such as crops to be protected from pests, and in order to control pests that inhabit the soil of cultivated land. You may process to soil.
  • it can be treated by methods such as wrapping a resin preparation processed into a sheet or string around the crop, stretching it around the crop, or laying it on the stock soil.
  • the amount applied is the amount of the compound of the present invention per 1 m 2 of treatment area when treated on the surface, usually 0.01. In the case of treatment in a space, the amount of the compound of the present invention per 1 m 3 of the treatment space is usually 0.01 to 500 mg.
  • the pest control agent of the present invention is formulated into an emulsion, a wettable powder, a flowable agent, etc., it is usually diluted with water so that the active ingredient concentration is 0.1 to 1000 ppm. Apply aerosols, smoke, poisonous bait, etc. as they are.
  • the pest control agent of the present invention can be used in farmland where the following “crop” is cultivated.
  • Agricultural crops corn, rice, wheat, barley, rye, oat, sorghum, cotton, soybean, peanut, buckwheat, sugar beet, rapeseed, sunflower, sugarcane, tobacco, etc.
  • Vegetables Solanum vegetables (eggplants, tomatoes, peppers, peppers, potatoes, etc.), Cucurbitaceae vegetables (cucumbers, pumpkins, zucchini, watermelons, melons, etc.), cruciferous vegetables (radish, turnip, horseradish, kohlrabi, Chinese cabbage, cabbage) , Mustard, broccoli, cauliflower, etc.), asteraceae vegetables (burdock, shungiku, artichoke, lettuce, etc.), liliaceae vegetables (leek, onion, garlic, asparagus), celeryaceae vegetables (carrot, parsley, celery, American scallop, etc.) ), Red crustacean vegetables (spinach, chard, etc.), persimmon vegetables (perilla, mint, basil, etc.), strawberry, sweet potato, yam, taro, etc.
  • Fruit trees apples, pears, Japanese pears, quince, quince, etc., nuclear fruits (peaches, plums, nectarines, ume, sweet cherry, apricots, prunes, etc.), citrus (citrus mandarin, orange, lemon, lime, grapefruit) ), Nuts (chestnut, walnut, hazel, almond, pistachio, cashew nut, macadamia nut, etc.), berries (blueberry, cranberry, blackberry, raspberry, etc.), grape, oyster, olive, loquat, banana, coffee, Date palm, coconut palm, oil palm etc.
  • Trees other than fruit trees tea, mulberry, flowering trees (Satsuki, camellia, hydrangea, sasanqua, shikimi, sakura, yurinoki, crape myrtle, snapdragon, etc.), roadside trees (ash, birch, dogwood, eucalyptus, ginkgo, lilac, maple, oak) , Poplar, redwood, fu, sycamore, zelkova, blackfish, Japanese amberjack, eel, pine, pine, spruce, yew, elm, Japanese cypress, etc.), coral jug, dogwood, cedar, cypress, croton, masaki, kanamochi, etc.
  • Lawn Shiba (Nasis, Pleurotus, etc.), Bermudagrass (Neurodonidae, etc.), Bentgrass (Oleoptera, Hykonukagusa, Odonoptera, etc.), Bluegrass (Nagahagusa, Oosuzunokatabira, etc.), Fescue (Oonishi nokegusa, Drosophila, etc.) , Grass, etc.), ryegrass (rat, wheat, etc.), anemonefish, blue whale, etc.
  • Crop includes genetically modified crops.
  • the pest control agent of the present invention can be mixed or used in combination with other insecticides, acaricides, nematicides, fungicides, plant growth regulators, herbicides and synergists.
  • active ingredients of such insecticides, acaricides, nematicides, fungicides, plant growth regulators, herbicides and synergists are shown below.
  • Nereistoxin compounds Cartap, Bensulpap, Thiocylam, Thiosultap, Monosultap, and Bisultap.
  • Neonicotinoid compounds Imidacloprid (Imidac1oprid), Nitenpyram (Nitenpyram), Acetamiprid (Acetamiprid), Thiamethoxam (Thiamethoxam), Thiacloprid (An) and dinotefurin (in)
  • Benzoylurea compounds Bistrifluron, Chlorfluazuron, Diflubenzuron, Flucycloxuron, Flufenoxuron, Hexafluuron, Hexafluuron Lufenuron, Novaluron, Noviflumuron, Teflubenzuron, Triflumuron, and fluazuuron.
  • Phenylpyrazole compounds Acetoprole, Ethiprole, Fipronil, Vaniliprole, Pyriprole, and Pyrafluprole.
  • Bt toxin insecticide Live spores and produced crystal toxins derived from Bacillus thuringiensis, and mixtures thereof.
  • Machine oil Machine oil
  • nicotine sulfate Nicotine-sulfate
  • nicotine Nicotine
  • abamectin Abamectin
  • emamectin benzoate Emamectin-benzoate
  • milbemectin Milbemectin
  • Pyriproxyfen Phenoxycarb
  • Chlorphenapyr DNOC
  • Diafenthiuron Pymetrozine, Pymetrozine, Pymetrozine Tolfenpyrad, Flurimfen, Flufenerim, Spirotetramat, Spiromesifen, Sulfoxaflor, Chloranthrolitrol orantraniliprole, cyantraniliprole
  • R 100 represents a chlorine atom, a bromine atom or a trifluoromethyl group
  • R 200 represents a chlorine atom, a bromine atom or a methyl group
  • R 300 represents a chlorine atom, a bromine atom or a cyano group.
  • R 1000 represents a chlorine atom, a bromine atom or an iodine atom.
  • Methoxadiazone sulfuramide, arsenous acid, benclothiaz, lime nitrogen (Calcium flude) (Calcium flude) ammonium, Metam-sodium, Potassium oleate, Sulfur, and Tralopyril.
  • Active ingredients of acaricides Acequinocyl, Amitraz, Benzoximate, Bifenaate, Bromopropyl, BSPC, Chromethionate, Chromethionate ), Clofentezine, cyflumetofen, dicofol, etoxazole, fenazaquin, fenbutatin oxide, fenothiophen Pyroximate, Fluacrylpyrim, Hexythiaxox, propargite (di), di (R), pyridene (P), piridaben (Pyriben) Diclofen, Spirodiclofen, Amidoflumet, and Cyenopyrafen.
  • Active ingredients of fungicides Azaconazole, Bitertanol, Bromuconazole, Cyproconazole, Difenaconol, Dinicoconol D, Iniconazole E (Fenarimol) Fenbuconazole, Flucilazole, Fluquinconazole, Flutriafol, Hexaconazole, Imazaril (Imazalil) Imibenconazole, Ipconazole, Iconazole, Metconazole, Microbutanil, Nuarimol, Oxpoconazole, Puroazo Propiconazole, Prothioconazole, Pyrifenox, Simeconazole, Tebuconazole, Tetraconazole, Triazimone fon), triadimenol (Triadimenol), triflumizole (Triflumizole), trifolin (Trifolin), triticonazole (Triticonazole), aldimorph (Dodimorph), dodemorph (M
  • Triazine herbicidal compounds Atrazine, Ametrine, Cyanazine, Simazine, Propazine, Simetrin, Dimetamethrin, Dimethamethrin ), Triaziflam, and indaziflam.
  • Carbamate herbicidal compound Di-allate, Tri-alate, EPTC, Butyrate, Benchiocarb, Esprocarb, Molinate, Dimepiperate, Dimepiperate (Swep), Chlorprofham, Phenmedifam, Phenisopham, Pyributicalb, and Asuram.
  • Chloroacetanilide herbicidal compounds Acetochlor, Alaclor, Butachlor, Dimethenamide, Propaclor, Metazachlor, Metolachlor, Metolachlor Pretilachor), tenylchlor (Theny1ch1or), and petoxamide (Pethoxamide).
  • Cyclic imide herbicidal compounds Oxadiazone, Cinidon-ethyl, carfentrazone-ethyl, sulfentrazone, full-microlac-pentyl, flumilacrac-pentyl Oxazine (Flumioxazin), Pyraflufen-ethyl, Oxadiargyl (Oxadialy), Pentoxazone, Fluthiacet-methyl, Butafenzene (Butafenzil) azone), and saflufenacil.
  • Triketone herbicidal compounds Isoxaflutole, benzobicyclon, sulcotrione, mesotrione, tembotrione, and tefril trione.
  • Aryloxyphenoxypropionic acid herbicidal compound Clodinafop-propargyl, Cyhalofop-butyl, Diclohop-methyl, Fenoxaprop-ethyl Fluazifop-butyl, haloxyhop-methyl, quizalofop-ethyl, and metamihop.
  • Trione oxime herbicidal compounds Alloxydim-sodium, cetoxydim, Butroxidim, Crethodim, Cloproxidim, Cyclodimoxime (Tralkoxydim), and Profoxydim.
  • Sulfonamide herbicidal compounds Flumeslam, Methoslam, Diclosram, Floraslam, chloranthramx, Penoxsulox and Penoxsulox.
  • Me is a methyl group (CH 3 —)
  • Et is an ethyl group (CH 3 CH 2 —)
  • Pr is a propyl group (CH 3 CH 2 CH 2 —)
  • i-Pr is an isopropyl group ((CH 3 )).
  • 2 CH—) and t-Bu represent a tert-butyl group ((CH 3 ) 3 C—)
  • sec-Bu represents a sec-butyl group (CH 3 CH 2 CH (CH 3 ) —).
  • JLA group, (E 1 ) n , D, G and m represent the combinations described in the following [Table 2] to [Table 3].
  • Q represents the following formula.
  • the JLA group, (E 1 ) n , D, G and m represent the combinations described in the following [Table 4] to [Table 5].
  • the JL group, (E 1 ) p , D, G and m in the formula represent the combinations described in the following [Table 6] to [Table 7].
  • the JL group, (E 1 ) n , D, G and m in the formula represent the combinations described in the following [Table 8] to [Table 12].
  • the JL group, E 1 , D, G and m in the formula represent the combinations described in the following [Table 13] to [Table 14].
  • the JLA group, (E 1 ) n , D, G and m represent the combinations described in the following [Table 15] to [Table 18].
  • JLA group, E 1 , D, G and m represent the combinations described in the following [Table 19] to [Table 20].
  • a part represents a weight part.
  • Formulation Example 2 4 parts of sodium lauryl sulfate, 2 parts of calcium lignin sulfonate, 20 parts of synthetic silicon hydroxide-containing fine powder and 54 parts of diatomaceous earth were mixed, and the above-mentioned compounds 1-1 to 1-51, compounds 2-1 to 2-34, Any one of Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6-1 to 6-102, and Compounds 7-1 to 7-34 20 Add parts and mix to obtain each wettable powder.
  • Formulation Example 3 Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- Add 1 part of synthetic silicon hydrous fine powder, 2 parts of calcium lignin sulfonate, 30 parts of bentonite and 65 parts of kaolin clay to 2 parts of any one of 1 to 6-102 and compounds 7-1 to 7-34 To do. Next, an appropriate amount of water is added to the mixture, and the mixture is further stirred, granulated by a granulator, and dried by ventilation to obtain each granule.
  • Formulation Example 4 Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- One part of any one of 1 to 6-102 and compounds 7-1 to 7-34 is dissolved in an appropriate amount of acetone, and 5 parts of a synthetic silicon hydroxide-containing fine powder, 0.3 part of PAP and 93.7 of Fusami clay 93.7 are mixed. Add parts, mix well, and evaporate and remove acetone to obtain each powder.
  • Formulation Example 5 35 parts of a mixture of polyoxyethylene alkyl ether sulfate ammonium salt and white carbon (weight ratio 1: 1), the above-mentioned compounds 1-1 to 1-51, compounds 2-1 to 2-34, compounds 3-1 to 3 -38, compounds 4-1 to 4-104, compounds 5-1 to 5-38, compounds 6-1 to 6-102, and compounds 7-1 to 7-34 10 parts and water 55 parts Are mixed and finely pulverized by a wet pulverization method to obtain each preparation.
  • Formulation Example 7 Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- 10 mg of any one of 1 to 6-102 and compounds 7-1 to 7-34 is dissolved in 0.5 ml of acetone, and this solution is mixed with animal solid feed powder (bred breeding solid feed powder CE-2, Japan Treat to 5g, and mix evenly. Then, acetone is evaporated to dryness to obtain each poisonous bait.
  • animal solid feed powder termed breeding solid feed powder CE-2, Japan Treat to 5g, and mix evenly.
  • acetone is evaporated to dryness to obtain each poisonous bait.
  • Formulation Example 8 Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- 0.1 part of any one of 1 to 6-102 and compounds 7-1 to 7-34 and 49.9 parts of neothiozole (Chuo Kasei Co., Ltd.) were placed in an aerosol can and fitted with an aerosol valve.
  • the oil agent aerosol is obtained by filling the part and 25 parts of LPG, adding shaking, and mounting the actuator.
  • Formulation Example 9 Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- 0.6 part of any one of 1 to 6-102 and compounds 7-1 to 7-34, 0.01 part of BHT (2,6-di-tert-butyl-4-methylphenol), 5 parts of xylene, Deodorized kerosene 3.39 parts and emulsifier ⁇ Atmos 300 (registered trademark name of Atmos Chemical Co., Ltd.) ⁇ 1 part mixed and dissolved, and distilled water 50 parts are filled in an aerosol container, and after attaching the valve, Aqueous aerosol is obtained by pressure filling 40 parts of propellant (LPG).
  • LPG propellant
  • Test example 1 The preparation of the compound of the present invention obtained in Formulation Example 5 was diluted with water so that the active ingredient concentration was 500 ppm to prepare a test drug solution.
  • Control value (%) ⁇ 1 ⁇ (Cb ⁇ Tai) / (Cai ⁇ Tb) ⁇ ⁇ 100
  • the character in a formula represents the following meaning.
  • Test example 2 The preparation of the compound of the present invention obtained in Formulation Example 5 was diluted with water so that the active ingredient concentration was 500 ppm to prepare a test spray solution.
  • Control value (%) ⁇ 1 ⁇ (Cb ⁇ Tai) / (Cai ⁇ Tb) ⁇ ⁇ 100
  • the character in a formula represents the following meaning.
  • the compound of the present invention is useful for controlling pests.

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Abstract

The present invention provides a novel compound having a control activity against a pest. The present invention relates to a heteroaromatic ring compound represented by formula (1) [In the formula, Het represents a 5-membered heterocycle indicated by a formula H1, H2, H3, H4 or H5 (In the formula, Y1, Y2, Y3, Z1, Z2 and Z3 represent the meaning described in Claims of the present application, and the mark "·" on the left side of the structural formula represents a position which binds to A.); J represents a t-butyl group, a trimethylsilyl group, or the like; L represents a single bond, or a C1-C3 alkylene group; A represents a single bond, or the like; G represents a hydrogen atom, a halogen atom, or the like; D represents -N= or -CH=; and m represents 0 or 1.], a production method therefor, and a pest control agent containing the heteroaromatic ring compound.

Description

ヘテロ芳香環化合物およびその有害生物防除用途Heteroaromatic compounds and their use for pest control

 本発明はヘテロ芳香環化合物およびその有害生物防除用途に関する。 The present invention relates to a heteroaromatic ring compound and its use for pest control.

 有害生物に対して防除活性を有する化合物が有害生物防除剤の有効成分として見出され、開発されている。 A compound having a pest control activity has been found and developed as an active ingredient of a pest control agent.

 特許文献1には、分子内にチアゾール環とピリジン環とを有する化合物が記載されている。 Patent Document 1 describes a compound having a thiazole ring and a pyridine ring in the molecule.

 特許文献2には、分子内にピラゾール環とピリミジン環とを有する化合物が記載されている。 Patent Document 2 describes a compound having a pyrazole ring and a pyrimidine ring in the molecule.

国際公開WO2006/024642パンフレットInternational Publication WO2006 / 024642 Pamphlet 国際公開WO2009/016460パンフレットInternational Publication WO2009 / 016460 Pamphlet

 本発明は、有害生物に対して防除活性を有する新規な化合物を提供することを課題とする。 An object of the present invention is to provide a novel compound having a controlling activity against pests.

 本発明者は、有害生物に対して防除活性を有する化合物を見出すべく検討した結果、下記式(1)で示される化合物が有害生物に対して防除効力を有することを見出し、更に検討を重ねた結果本発明を完成するに至った。 As a result of studying to find a compound having a control activity against pests, the present inventor found that the compound represented by the following formula (1) has a control effect on pests, and further studied. As a result, the present invention has been completed.

 即ち、本発明は以下のものである。
[項1] 式(1)
That is, the present invention is as follows.
[Term 1] Formula (1)

Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005

〔式中、
 Hetは、下式H1、H2、H3、H4またはH5:
[Where,
Het is represented by the following formula H1, H2, H3, H4 or H5:

Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006

{式中、
 Yは、-O-、-S-または-NE-を表し、YおよびYは、同一または相異なり、-CE=または-N=を表し、YおよびYの少なくとも一方は-CE=であり、Z、ZおよびZは、同一または相異なり、-CE=または-N=を表し(ここでEは1個以上のハロゲン原子を有していてもよいC1-C2アルキル基、水素原子またはハロゲン原子を表し、Eは1個以上のハロゲン原子を有していてもよいC1-C2アルキル基を表す。)、構造式の左側の「・」印がAと結合する位置を表す。}で示される5員ヘテロ環を表し、
 Jは、下式J1またはJ2:
{Where,
Y 1 represents —O—, —S— or —NE 2 —, Y 2 and Y 3 are the same or different and represent —CE 1 ═ or —N═, and at least one of Y 2 and Y 3 Are —CE 1 ═, Z 1 , Z 2 and Z 3 are the same or different and represent —CE 1 ═ or —N═ (where E 1 has one or more halogen atoms) Represents a C1-C2 alkyl group, a hydrogen atom or a halogen atom, and E 2 represents a C1-C2 alkyl group which may have one or more halogen atoms.) The mark represents the position where A is combined. } Represents a 5-membered heterocycle represented by
J is the following formula J1 or J2:

Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007

(式中、
 R1およびR2は、同一または相異なり、1個以上のハロゲン原子を有していてもよいC1-C3アルキル基を表し、
 R3は、1個以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、ハロゲン原子または水素原子を表し、
 R4およびR5は、同一または相異なり、メチル基またはエチル基を表し、
 R6は、水素原子またはC1-C6鎖式炭化水素基を表す。)で示される基を表し、
 Lは、単結合または1個以上のハロゲン原子を有していてもよいC1-C3アルキレン基を表し、
 Aは、Hetが式H1、H2、H3またはH5で示される基のとき、単結合、-O-、または-S(O)x-を表し(ここで、xは、0、1または2を表す。)、Hetが式H4で示される基のとき、単結合を表し、
 Gは、水素原子、ハロゲン原子、ニトロ基、シアノ基、水酸基、メルカプト基もしくはアミノ基を表すか、または、下式G1、G2、G3もしくはG4:
(Where
R 1 and R 2 are the same or different and each represents a C1-C3 alkyl group optionally having one or more halogen atoms,
R 3 represents a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a halogen atom or a hydrogen atom,
R 4 and R 5 are the same or different and each represents a methyl group or an ethyl group;
R 6 represents a hydrogen atom or a C1-C6 chain hydrocarbon group. ) Represents a group represented by
L represents a single bond or a C1-C3 alkylene group which may have one or more halogen atoms,
A represents a single bond, —O—, or —S (O) x — when Het is a group represented by the formula H1, H2, H3 or H5 (where x represents 0, 1 or 2). And represents a single bond when Het is a group represented by formula H4,
G represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a hydroxyl group, a mercapto group or an amino group, or the following formulas G1, G2, G3 or G4:

Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008

(式中、
 Raは、<群α>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基、シクロプロピル基または-C(O)-T1を表し、
 Rbは、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基、-C(O)-T、-S(O)2-T、C3-C9トリアルキルシリル基またはシクロプロピル基を表し、
 Rcは、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基、-C(O)-Tまたはシクロプロピル基を表し、
 zは0、1または2を表し、
 Rdは、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基、-C(O)-T、-S(O)2-Tまたはシクロプロピル基を表し、
 Reは、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基、水素原子またはシクロプロピル基を表し、
 T1は、1個以上のハロゲン原子を有していてもよいC1-C6アルキル基、1個以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1個以上のハロゲン原子を有していてもよいC1-C6アルキルアミノ基、1個以上のハロゲン原子を有していてもよいC2-C12ジアルキルアミノ基、水酸基、アミノ基、水素原子またはシクロプロピル基を表し、
 Tは、1個以上のハロゲン原子を有していてもよいC1-C6アルキル基、1個以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1個以上のハロゲン原子を有していてもよいC1-C6アルキルアミノ基、1個以上のハロゲン原子を有していてもよいC2-C12ジアルキルアミノ基、アミノ基、水素原子またはシクロプロピル基を表し、
 Tは、1個以上のハロゲン原子を有していてもよいC1-C6アルキル基を表す。)で示される基を表し、
 Dは-N=または-CH=を表し、
 mは0または1を表す。
<群α>:1個以上のハロゲン原子を有していてもよいC1-C4アルコキシ基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルチオ基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルスルホニル基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルアミノ基、1個以上のハロゲン原子を有していてもよいC2-C8ジアルキルアミノ基、ハロゲン原子、シアノ基、C3-C9トリアルキルシリル基およびシクロプロピル基からなる群、
<群β>:1個以上のハロゲン原子を有していてもよいC1-C4アルコキシ基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルチオ基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルスルホニル基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルアミノ基、1個以上のハロゲン原子を有していてもよいC2-C8ジアルキルアミノ基、フェニル基(該フェニル基は、メチル基、メトキシ基、塩素原子およびニトロ基からなる群より選ばれる1個以上の基を有していてもよい。)、ハロゲン原子、シアノ基、C3-C9トリアルキルシリル基およびシクロプロピル基からなる群。
(Where
R a represents a C1-C6 chain hydrocarbon group, a cyclopropyl group or —C (O) —T 1 which may have one or more atoms or groups selected from <Group α>;
R b is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, —C (O) —T 2 , —S (O) 2 —. T 3 represents a C3-C9 trialkylsilyl group or a cyclopropyl group,
R c represents a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, —C (O) —T 2 or a cyclopropyl group;
z represents 0, 1 or 2;
R d is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, —C (O) —T 2 , —S (O) 2 —. It represents T 3 or cyclopropyl group,
R e represents a C1-C6 chain hydrocarbon group, hydrogen atom or cyclopropyl group which may have one or more atoms or groups selected from <Group β>;
T 1 has a C1-C6 alkyl group which may have one or more halogen atoms, a C1-C6 alkoxy group which may have one or more halogen atoms, and one or more halogen atoms. An optionally substituted C1-C6 alkylamino group, an optionally substituted C2-C12 dialkylamino group, a hydroxyl group, an amino group, a hydrogen atom or a cyclopropyl group,
T 2 has a C1-C6 alkyl group which may have one or more halogen atoms, a C1-C6 alkoxy group which may have one or more halogen atoms, and one or more halogen atoms. An optionally substituted C1-C6 alkylamino group, an optionally substituted C2-C12 dialkylamino group, an amino group, a hydrogen atom or a cyclopropyl group,
T 3 represents a C1-C6 alkyl group which may have one or more halogen atoms. ) Represents a group represented by
D represents —N═ or —CH═,
m represents 0 or 1;
<Group α>: C1-C4 alkoxy group which may have one or more halogen atoms, C1-C4 alkylthio group which may have one or more halogen atoms, one or more halogen atoms C1-C4 alkylsulfinyl group which may have one, C1-C4 alkylsulfonyl group which may have one or more halogen atoms, C1-C4 alkyl which may have one or more halogen atoms A group consisting of an amino group, a C2-C8 dialkylamino group optionally having one or more halogen atoms, a halogen atom, a cyano group, a C3-C9 trialkylsilyl group, and a cyclopropyl group;
<Group β>: C1-C4 alkoxy group which may have one or more halogen atoms, C1-C4 alkylthio group which may have one or more halogen atoms, one or more halogen atoms C1-C4 alkylsulfinyl group which may have one, C1-C4 alkylsulfonyl group which may have one or more halogen atoms, C1-C4 alkyl which may have one or more halogen atoms An amino group, a C2-C8 dialkylamino group optionally having one or more halogen atoms, a phenyl group (the phenyl group is one selected from the group consisting of a methyl group, a methoxy group, a chlorine atom and a nitro group) And a group consisting of a halogen atom, a cyano group, a C3-C9 trialkylsilyl group, and a cyclopropyl group.

 但し、下記(1)~(6)に該当する化合物を除く:
 (1)Hetが式H1で示される基であり、Yが-S-であり、YおよびYが-CH=であり、Aが-O-であり、Lが単結合であり、Jが式J1で示される基であり、かつ、R1、R2およびR3がいずれもメチル基であり、Gが水素原子であり、Dが-CH=であり、mが0である化合物、
 (2)Hetが式H1で示される基であり、Yが-O-であり、YおよびYが-CH=であり、AおよびLが単結合であり、Jが式J2で示される基であり、かつ、R、RおよびRがいずれもメチル基であり、Gが水素原子であり、Dが-CH=であり、mが0である化合物、
 (3)Hetが式H3で示される基であり、Yが-S-であり、Yが-N=であり、Yが-CH=であり、AおよびLが単結合であり、Jが式J1で示される基であり、かつ、R、RおよびRがいずれもメチル基であり、Gが水素原子であり、Dが-CH=であり、mが0である化合物、
 (4)Hetが式H4で示される基であり、Zが-CH=であり、Zが-N=であり、Zが-CI=であり(ここで、Iはヨウ素原子である。)、AおよびLが単結合であり、Jが式J1で示される基であり、R1およびR2がいずれもメチル基であり、かつ、R3が水素原子であり、Gが水素原子であり、Dが-N=であり、mが0である化合物、
 (5)Hetが式H4で示される基であり、Zが-N=であり、ZおよびZが-CH=であり、AおよびLが単結合であり、Jが式J1で示される基であり、R1およびR2がいずれもメチル基であり、かつ、R3が水素原子またはメチル基であり、Gが水素原子であり、Dが-CH=または-N=であり、mが0である化合物、および
 (6)Hetが式H5で示される基であり、Zが-N=であり、Zが-C(CH)=であり、Zが-CH=であり、Aが-O-であり、Lが単結合であり、Jが式J1で示される基であり、R1およびR2がいずれもメチル基であり、かつ、R3が水素原子であり、Gが水素原子であり、Dが-CH=であり、mが0である化合物。〕
で示されるヘテロ芳香環化合物(以下、本発明化合物と記す。)。
[項2] Hetが式H1で示される基である[項1]に記載のヘテロ芳香環化合物。
[項3] Yが-S-または-O-である[項2]に記載のヘテロ芳香環化合物。
[項4] Yが-S-である[項2]に記載のヘテロ芳香環化合物。
[項5] HetがH1、式H2またはH3で示される基であり、Yが-S-である[項1]に記載のヘテロ芳香環化合物。
[項6] Hetが式H4で示される基である[項1]に記載のヘテロ芳香環化合物。
[項7] Zが-N=であり、Zが-CE=であり、かつ、Zが-CE=または-N=であるか、あるいは、Zが-CE=であり、Zが-N=であり、かつ、Zが-CE=である[項6]に記載のヘテロ芳香環化合物。
[項8] Zが-N=であり、ZおよびZが同一または相異なり-CE=であるか、あるいは、Zが-N=であり、ZおよびZが同一または相異なり-CE=である[項7]に記載のヘテロ芳香環化合物。
[項9] ZおよびZが-N=であり、Zが-CE=である[項6]に記載のヘテロ芳香環化合物。
[項10] Hetが式H5で示される基である[項1]に記載のヘテロ芳香環化合物。
[項11] Zが-N=であり、Zが-CE=であり、かつ、Zが-CE=または-N=であるか、あるいは、Zが-CE=であり、Zが-N=であり、かつ、Zが-CE=である[項10]に記載のヘテロ芳香環化合物。
[項12] Zが-N=であり、ZおよびZが同一または相異なり-CE=であるか、あるいは、Zが-N=であり、ZおよびZが同一または相異なり-CE=である[項11]に記載のヘテロ芳香環化合物。
[項13] ZおよびZが-N=であり、Zが-CE=である[項10]に記載のヘテロ芳香環化合物。
[項14] [項1]~[項13]のいずれか一項に記載のヘテロ芳香環化合物と不活性担体とを含有する有害生物防除剤。
[項15] 有害生物を防除するための[項1]~[項13]のいずれか一項に記載のヘテロ芳香環化合物の使用。
[項16] [項1]~[項13]のいずれか一項に記載のヘテロ芳香環化合物の有効量を有害生物又は有害生物の生息場所に施用する工程を含む有害生物の防除方法。
However, the compounds corresponding to the following (1) to (6) are excluded:
(1) Het is a group represented by the formula H1, Y 1 is —S—, Y 2 and Y 3 are —CH═, A is —O—, L is a single bond, A compound in which J is a group represented by formula J1, R 1 , R 2 and R 3 are all methyl groups, G is a hydrogen atom, D is —CH═ and m is 0 ,
(2) Het is a group represented by the formula H1, Y 1 is —O—, Y 2 and Y 3 are —CH═, A and L are single bonds, and J is represented by the formula J2. A compound in which R 4 , R 5 and R 6 are all methyl groups, G is a hydrogen atom, D is —CH═, and m is 0,
(3) Het is a group represented by the formula H3, Y 1 is —S—, Y 2 is —N═, Y 3 is —CH═, A and L are single bonds, A compound in which J is a group represented by formula J1, R 4 , R 5 and R 6 are all methyl groups, G is a hydrogen atom, D is —CH═ and m is 0 ,
(4) Het is a group represented by the formula H4, Z 1 is —CH═, Z 2 is —N═, and Z 3 is —CI═ (where I is an iodine atom) .), A and L are single bonds, J is a group represented by the formula J1, R 1 and R 2 are both methyl groups, R 3 is a hydrogen atom, and G is a hydrogen atom. A compound in which D is -N = and m is 0,
(5) Het is a group represented by the formula H4, Z 1 is —N═, Z 2 and Z 3 are —CH═, A and L are single bonds, and J is represented by the formula J1. R 1 and R 2 are both methyl groups, R 3 is a hydrogen atom or a methyl group, G is a hydrogen atom, D is —CH═ or —N═, a compound in which m is 0, and (6) Het is a group represented by the formula H5, Z 1 is —N═, Z 2 is —C (CH 3 ) ═, and Z 3 is —CH═. A is —O—, L is a single bond, J is a group represented by the formula J1, R 1 and R 2 are both methyl groups, and R 3 is a hydrogen atom. A compound in which G is a hydrogen atom, D is —CH═, and m is 0. ]
A heteroaromatic ring compound represented by the following (hereinafter referred to as the present compound).
[Item 2] The heteroaromatic ring compound according to [Item 1], wherein Het is a group represented by the formula H1.
[Claim 3] The heteroaromatic ring compound according to [Claim 2], wherein Y 1 is —S— or —O—.
[Item 4] The heteroaromatic ring compound according to [Item 2], wherein Y 1 is —S—.
[Claim 5] The heteroaromatic ring compound according to [Claim 1], wherein Het is a group represented by H1, Formula H2 or H3, and Y 1 is -S-.
[Item 6] The heteroaromatic ring compound according to [Item 1], wherein Het is a group represented by the formula H4.
[Term 7] Z 1 is -N =, Z 2 is -CE 1 =, and Z 3 is -CE 1 = or -N =, or Z 1 is -CE 1 = The heteroaromatic ring compound according to [Item 6], wherein Z 2 is —N═, and Z 3 is —CE 1 ═.
[Item 8] Z 1 is -N = and Z 2 and Z 3 are the same or different -CE 1 =, or Z 2 is -N = and Z 1 and Z 3 are the same or The heteroaromatic ring compound according to item 7 wherein -CE 1 = is different.
[Item 9] The heteroaromatic ring compound according to [Item 6], wherein Z 1 and Z 3 are —N═, and Z 2 is —CE 1 ═.
[Item 10] The heteroaromatic ring compound according to [Item 1], wherein Het is a group represented by the formula H5.
[Term 11] Z 1 is -N =, Z 2 is -CE 1 = and Z 3 is -CE 1 = or -N =, or Z 1 is -CE 1 = The heteroaromatic ring compound according to Item 10, wherein Z 2 is —N═ and Z 3 is —CE 1 ═.
[Term 12] Z 1 is -N = and Z 2 and Z 3 are the same or different -CE 1 =, or Z 2 is -N = and Z 1 and Z 3 are the same or The heteroaromatic ring compound according to [Item 11], wherein -CE 1 = is different.
[Claim 13] The heteroaromatic ring compound according to [Claim 10], wherein Z 1 and Z 3 are —N═, and Z 2 is —CE 1 ═.
[Item 14] A pest control agent comprising the heteroaromatic ring compound according to any one of [Item 1] to [Item 13] and an inert carrier.
[Item 15] Use of the heteroaromatic ring compound according to any one of [Item 1] to [Item 13] for controlling pests.
[Item 16] A method for controlling pests comprising a step of applying an effective amount of the heteroaromatic ring compound according to any one of [Item 1] to [Item 13] to a pest or a habitat of the pest.

 本発明化合物は、有害生物の防除に有用である。 The compound of the present invention is useful for controlling pests.

 本明細書において用いられる用語について、以下に例を挙げて説明する。 The terms used in this specification will be described below with examples.

 本発明化合物において「ハロゲン原子」とはフッ素原子、塩素原子、臭素原子およびヨウ素原子を意味する。 In the compound of the present invention, “halogen atom” means a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

 本発明化合物において、Eで表される「1個以上のハロゲン原子を有していてもよいC1-C2アルキル基」としては、例えばメチル基、エチル基、トリフルオロメチル基、およびジフルオロメチル基等が挙げられる。 In the compound of the present invention, examples of the “C1-C2 alkyl group optionally having one or more halogen atoms” represented by E 1 include a methyl group, an ethyl group, a trifluoromethyl group, and a difluoromethyl group. Etc.

 本発明化合物において、Eで表される「1個以上のハロゲン原子を有していてもよいC1-C2アルキル基」としては、例えばメチル基、エチル基、2,2,2-トリフルオロエチル基、および2,2-ジフルオロエチル基等が挙げられる。 In the compounds of the present invention, examples of the “C1-C2 alkyl group optionally having one or more halogen atoms” represented by E 2 include a methyl group, an ethyl group, and 2,2,2-trifluoroethyl. Group, and a 2,2-difluoroethyl group.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC1-C3アルキル基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基およびトリフルオロメチル基が挙げられる。 In the compound of the present invention, examples of the “C1-C3 alkyl group optionally having one or more halogen atoms” include a methyl group, an ethyl group, a propyl group, an isopropyl group, and a trifluoromethyl group.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC1-C6アルキル基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、ペンチル基、ヘキシル基およびトリフルオロメチル基が挙げられる。 Examples of the “C1-C6 alkyl group optionally having one or more halogen atoms” in the compounds of the present invention include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, and a sec-butyl group. , Tert-butyl group, pentyl group, hexyl group and trifluoromethyl group.

 本発明化合物において「C1-C6鎖式炭化水素基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、ペンチル基、2,2-ジメチルプロピル基、3-メチルブチル基、2,3-ジメチルブチル基、3,3-ジメチルブチル基およびヘキシル基等のC1-C6アルキル基;
ビニル基、1-プロペニル基、2-プロペニル基、イソプロペニル基、2-メチル-1-プロペニル基、1-ブテニル基、2-ブテニル基、3-ブテニル基、1-ペンテニル基および1-ヘキセニル基等のC2-C6アルケニル基;並びに
エチニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、3-ブチニル基、3,3-ジメチル-1-ブチニル基、1-ペンチニル基および1-ヘキシニル基等のC2-C6アルキニル基が挙げられる。
In the compounds of the present invention, examples of the “C1-C6 chain hydrocarbon group” include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, 2 , C1-C6 alkyl groups such as 2-dimethylpropyl group, 3-methylbutyl group, 2,3-dimethylbutyl group, 3,3-dimethylbutyl group and hexyl group;
Vinyl group, 1-propenyl group, 2-propenyl group, isopropenyl group, 2-methyl-1-propenyl group, 1-butenyl group, 2-butenyl group, 3-butenyl group, 1-pentenyl group and 1-hexenyl group C2-C6 alkenyl group such as ethynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 3,3-dimethyl-1-butynyl group, 1-pentynyl group and 1-hexynyl group And C2-C6 alkynyl groups such as

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、ペンチル基、2,2-ジメチルプロピル基、3-メチルブチル基、2,3-ジメチルブチル基、3,3-ジメチルブチル基ヘキシル基およびトリフルオロメチル基等の1個以上のハロゲン原子を有していてもよいC1-C6アルキル基;
ビニル基、1-プロペニル基、2-プロペニル基、イソプロペニル基、2-メチル-1-プロペニル基、1-ブテニル基、2-ブテニル基、3-ブテニル基、1-ペンテニル基および1-ヘキセニル基等のC2-C6アルケニル基および2,2-ジフルオロビニル基等の1個以上のハロゲン原子を有していてもよいC2-C6アルケニル基;並びに
エチニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、3-ブチニル基、3,3-ジメチル-1-ブチニル基、1-ペンチニル基、1-ヘキシニル基および2-クロロエチニル基等の1個以上のハロゲン原子を有していてもよいC2-C6アルキニル基が挙げられる。
Examples of the “C1-C6 chain hydrocarbon group optionally having one or more halogen atoms” in the compounds of the present invention include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, sec 1 such as -butyl group, tert-butyl group, pentyl group, 2,2-dimethylpropyl group, 3-methylbutyl group, 2,3-dimethylbutyl group, 3,3-dimethylbutyl group hexyl group and trifluoromethyl group A C1-C6 alkyl group optionally having one or more halogen atoms;
Vinyl group, 1-propenyl group, 2-propenyl group, isopropenyl group, 2-methyl-1-propenyl group, 1-butenyl group, 2-butenyl group, 3-butenyl group, 1-pentenyl group and 1-hexenyl group A C2-C6 alkenyl group optionally having one or more halogen atoms such as a C2-C6 alkenyl group such as 2,2-difluorovinyl group, etc .; and an ethynyl group, a propargyl group, a 1-butynyl group, 2- C2 which may have one or more halogen atoms such as butynyl group, 3-butynyl group, 3,3-dimethyl-1-butynyl group, 1-pentynyl group, 1-hexynyl group and 2-chloroethynyl group -C6 alkynyl group can be mentioned.

 本発明化合物において「<群α>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基およびtert-ブチル基等のC1-C6アルキル基;
トリフルオロメチル基、シアノメチル基、シクロプロピルメチル基、メトキシメチル基、エトキシメチル基、1-メトキシエチル基およびメチルチオメチル基等の<群α>より選ばれる1個以上の原子もしくは基を有するC1-C6アルキル基;
ビニル基、イソプロペニル基、1-プロペニル基、2-メチル-1-プロペニル基、2,2-ジクロロビニル基および2,2-ジフルオロビニル基等の<群α>より選ばれる1個以上の原子もしくは基を有していてもよいC2-C6アルケニル基;並びに
エチニル基、1-プロピニル基、2-クロロエチニル基、2-フルオロエチニル基および2-(トリメチルシリル)エチニル基等の<群α>より選ばれる1個以上の原子もしくは基を有していてもよいC2-C6アルキニル基が挙げられる。
In the compound of the present invention, examples of the “C1-C6 chain hydrocarbon group optionally having one or more atoms or groups selected from <group α>” include a methyl group, an ethyl group, a propyl group, and an isopropyl group. A C1-C6 alkyl group such as butyl group, isobutyl group, sec-butyl group and tert-butyl group;
C1- having one or more atoms or groups selected from <Group α> such as trifluoromethyl group, cyanomethyl group, cyclopropylmethyl group, methoxymethyl group, ethoxymethyl group, 1-methoxyethyl group and methylthiomethyl group A C6 alkyl group;
One or more atoms selected from <Group α> such as vinyl group, isopropenyl group, 1-propenyl group, 2-methyl-1-propenyl group, 2,2-dichlorovinyl group and 2,2-difluorovinyl group Or a C2-C6 alkenyl group which may have a group; and <group α> such as an ethynyl group, a 1-propynyl group, a 2-chloroethynyl group, a 2-fluoroethynyl group and a 2- (trimethylsilyl) ethynyl group And C2-C6 alkynyl group which may have one or more selected atoms or groups.

 本発明化合物において「<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基およびtert-ブチル基等のC1-C6アルキル基;
ジフルオロメチル基、トリフルオロメチル基、2-フルオロエチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、1,1,1-トリフルオロ-2-プロピル基、シアノメチル基、1-シアノエチル基、シクロプロピルメチル基、1-(シクロプロピル)エチル基、メトキシメチル基、エトキシメチル基、1-メトキシエチル基、2-メトキシエチル基、メチルチオメチル基、メチルスルフィニルメチル基、メチルスルホニルメチル基、2-(メチルチオ)エチル基、2-(メチルスルフィニル)エチル基、2-(メチルスルホニル)エチル基、2-(メチルアミノ)エチル基、2-(ジメチルアミノ)エチル基、ベンジル基、4-メトキシベンジル基、3,4-ジメトキシベンジル基および4-ニトロベンジル基等の<群β>より選ばれる1個以上の原子もしくは基を有するC1-C6アルキル基;
2-プロペニル基、2-ブテニル基および3-メチル-2-ブテニル基等の<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC3-C6アルケニル基;並びにプロパルギル基、2-ブチニル基および3-ブチニル基等の<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC2-C6アルキニル基が挙げられる。
In the compound of the present invention, examples of the “C1-C6 chain hydrocarbon group optionally having one or more atoms or groups selected from <group β>” include a methyl group, an ethyl group, a propyl group, an isopropyl group. A C1-C6 alkyl group such as butyl group, isobutyl group, sec-butyl group and tert-butyl group;
Difluoromethyl group, trifluoromethyl group, 2-fluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,1-trifluoro-2-propyl group, cyanomethyl group 1-cyanoethyl group, cyclopropylmethyl group, 1- (cyclopropyl) ethyl group, methoxymethyl group, ethoxymethyl group, 1-methoxyethyl group, 2-methoxyethyl group, methylthiomethyl group, methylsulfinylmethyl group, methyl Sulfonylmethyl group, 2- (methylthio) ethyl group, 2- (methylsulfinyl) ethyl group, 2- (methylsulfonyl) ethyl group, 2- (methylamino) ethyl group, 2- (dimethylamino) ethyl group, benzyl group 4-methoxybenzyl group, 3,4-dimethoxybenzyl group, 4-nitrobenzyl group, etc. C1-C6 alkyl group having one or more atoms or groups selected from <group beta>;
A C3-C6 alkenyl group optionally having one or more atoms or groups selected from <Group β> such as 2-propenyl group, 2-butenyl group and 3-methyl-2-butenyl group; and a propargyl group And a C2-C6 alkynyl group optionally having one or more atoms or groups selected from <Group β> such as 2-butynyl group and 3-butynyl group.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC1-C3アルキレン基」としては、例えば-CH2-、-CHCl-、-CHF-、-CF2-、-CH2CH2-および-CH2CH2CH2-が挙げられる。 Examples of the “C1-C3 alkylene group optionally having one or more halogen atoms” in the compounds of the present invention include —CH 2 —, —CHCl—, —CHF—, —CF 2 —, —CH 2 CH 2 -and -CH 2 CH 2 CH 2 -are mentioned.

 本発明化合物において「C3-C9トリアルキルシリル基」としては、例えばトリメチルシリル基、tert-ブチルジメチルシリル基、トリエチルシリル基、イソプロピルジメチルシリル基、トリイソプロピルシリル基が挙げられる。 In the compounds of the present invention, examples of the “C3-C9 trialkylsilyl group” include a trimethylsilyl group, a tert-butyldimethylsilyl group, a triethylsilyl group, an isopropyldimethylsilyl group, and a triisopropylsilyl group.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC1-C6アルコキシ基」としては、例えばメトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、ブトキシ基、イソブトキシ基、sec-ブトキシ基、tert-ブトキシ基、2,2,2-トリクロロエトキシ基および2,2,2-トリフルオロエトキシが挙げられる。 Examples of the “C1-C6 alkoxy group optionally having one or more halogen atoms” in the compounds of the present invention include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, an isobutoxy group, and a sec-butoxy group. Group, tert-butoxy group, 2,2,2-trichloroethoxy group and 2,2,2-trifluoroethoxy group.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC1-C6アルキルアミノ基」としては、例えばメチルアミノ基、エチルアミノ基、プロピルアミノ基、イソプロピルアミノ基、ブチルアミノ基、イソブチルアミノ基、sec-ブチルアミノ基、tert-ブチルアミノ基および2,2,2-トリフルオロエチルアミノ基が挙げられる。 In the compounds of the present invention, examples of the “C1-C6 alkylamino group optionally having one or more halogen atoms” include, for example, methylamino group, ethylamino group, propylamino group, isopropylamino group, butylamino group, isobutyl An amino group, a sec-butylamino group, a tert-butylamino group and a 2,2,2-trifluoroethylamino group can be mentioned.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC2-C12ジアルキルアミノ基」としては、例えばN,N-ジメチルアミノ基、N,N-ジエチルアミノ基、N,N-ジプロピルアミノ基、N,N-ジブチルアミノ基、N-エチル-N-メチルアミノ基、N-メチル-N-プロピルアミノ基、N-イソプロピル-N-メチルアミノ基、N-tert-ブチル-N-メチルアミノ基およびN-メチル-N-(2,2,2-トリフルオロエチル)アミノ基が挙げられる。 Examples of the “C2-C12 dialkylamino group optionally having one or more halogen atoms” in the compound of the present invention include N, N-dimethylamino group, N, N-diethylamino group, N, N-dipropyl group. Amino group, N, N-dibutylamino group, N-ethyl-N-methylamino group, N-methyl-N-propylamino group, N-isopropyl-N-methylamino group, N-tert-butyl-N-methyl An amino group and an N-methyl-N- (2,2,2-trifluoroethyl) amino group can be mentioned.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC1-C4アルコキシ基」としては、例えばメトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、ブトキシ基、イソブトキシ基、sec-ブトキシ基、tert-ブトキシ基および2,2,2-トリフルオロエトキシ基が挙げられる。 Examples of the “C1-C4 alkoxy group optionally having one or more halogen atoms” in the compounds of the present invention include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, an isobutoxy group, and a sec-butoxy group. Group, tert-butoxy group and 2,2,2-trifluoroethoxy group.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC1-C4アルキルチオ基」としては、例えばメチルチオ基、エチルチオ基、プロピルチオ基、イソプロピルチオ基、ブチルチオ基、イソブチルチオ基、sec-ブチルチオ基、tert-ブチルチオ基および2,2,2-トリフルオロエチルチオ基が挙げられる。 In the compound of the present invention, examples of the “C1-C4 alkylthio group optionally having one or more halogen atoms” include, for example, methylthio group, ethylthio group, propylthio group, isopropylthio group, butylthio group, isobutylthio group, sec- Examples thereof include a butylthio group, a tert-butylthio group and a 2,2,2-trifluoroethylthio group.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC1-C4アルキルスルフィニル基」としては、例えばメチルスルフィニル基、エチルスルフィニル基、プロピルスルフィニル基、イソプロピルスルフィニル基、ブチルスルフィニル基、イソブチルスルフィニル基、sec-ブチルスルフィニル基、tert-ブチルスルフィニル基および2,2,2-トリフルオロエチルスルフィニル基が挙げられる。 Examples of the “C1-C4 alkylsulfinyl group optionally having one or more halogen atoms” in the compounds of the present invention include a methylsulfinyl group, an ethylsulfinyl group, a propylsulfinyl group, an isopropylsulfinyl group, a butylsulfinyl group, an isobutyl group. Examples thereof include a sulfinyl group, a sec-butylsulfinyl group, a tert-butylsulfinyl group, and a 2,2,2-trifluoroethylsulfinyl group.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC1-C4アルキルスルホニル基」としては、例えばメチルスルホニル基、エチルスルホニル基、プロピルスルホニル基、イソプロピルスルホニル基、ブチルスルホニル基、イソブチルスルホニル基、sec-ブチルスルホニル基、tert-ブチルスルホニル基および2,2,2-トリフルオロエチルスルホニル基が挙げられる。 In the compound of the present invention, examples of the “C1-C4 alkylsulfonyl group optionally having one or more halogen atoms” include, for example, methylsulfonyl group, ethylsulfonyl group, propylsulfonyl group, isopropylsulfonyl group, butylsulfonyl group, isobutyl Examples include a sulfonyl group, a sec-butylsulfonyl group, a tert-butylsulfonyl group, and a 2,2,2-trifluoroethylsulfonyl group.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC1-C4アルキルアミノ基」としては、例えばメチルアミノ基、エチルアミノ基、プロピルアミノ基、イソプロピルアミノ基、ブチルアミノ基、イソブチルアミノ基、sec-ブチルアミノ基、tert-ブチルアミノ基および2,2,2-トリフルオロエチルアミノ基が挙げられる。 In the compounds of the present invention, examples of the “C1-C4 alkylamino group optionally having one or more halogen atoms” include, for example, methylamino group, ethylamino group, propylamino group, isopropylamino group, butylamino group, isobutyl An amino group, a sec-butylamino group, a tert-butylamino group and a 2,2,2-trifluoroethylamino group can be mentioned.

 本発明化合物において「1個以上のハロゲン原子を有していてもよいC2-C8ジアルキルアミノ基」としては、例えばN,N-ジメチルアミノ基、N,N-ジエチルアミノ基、N,N-ジプロピルアミノ基、N,N-ジブチルアミノ基、N-エチル-N-メチルアミノ基、N-メチル-N-プロピルアミノ基、N-イソプロピル-N-メチルアミノ基、N-tert-ブチル-N-メチルアミノ基およびN-メチル-N-(2,2,2-トリフルオロエチル)アミノ基が挙げられる。 Examples of the “C2-C8 dialkylamino group optionally having one or more halogen atoms” in the compounds of the present invention include N, N-dimethylamino group, N, N-diethylamino group, N, N-dipropyl group. Amino group, N, N-dibutylamino group, N-ethyl-N-methylamino group, N-methyl-N-propylamino group, N-isopropyl-N-methylamino group, N-tert-butyl-N-methyl An amino group and an N-methyl-N- (2,2,2-trifluoroethyl) amino group can be mentioned.

 本発明化合物において「フェニル基(該フェニル基は、メチル基、メトキシ基、塩素原子およびニトロ基からなる群より選ばれる1個以上の基を有してもよい。)」としては、例えばフェニル基、4-メトキシフェニル基、3,4-ジメトキシフェニル基、4-ニトロフェニル基、2-ニトロフェニル基、4-クロロフェニル基、2-クロロフェニル基、2,6-ジクロロフェニル基および4-メチルフェニル基が挙げられる。
本発明化合物において、Hetで表される前記5員ヘテロ芳香環が-CE=を2個以上含む場合に、各E基は同一でも相異なってもよい。
In the compound of the present invention, the “phenyl group (the phenyl group may have one or more groups selected from the group consisting of a methyl group, a methoxy group, a chlorine atom and a nitro group)” is, for example, a phenyl group 4-methoxyphenyl group, 3,4-dimethoxyphenyl group, 4-nitrophenyl group, 2-nitrophenyl group, 4-chlorophenyl group, 2-chlorophenyl group, 2,6-dichlorophenyl group and 4-methylphenyl group. Can be mentioned.
In the compound of the present invention, when the 5-membered heteroaromatic ring represented by Het contains two or more —CE 1 ═, each E 1 group may be the same or different.

 本発明化合物において、式H1で表される5員へテロ芳香環の具体例を以下に示す。以下、構造式の左側の「・」印がAと結合する位置を表す。 Specific examples of the 5-membered heteroaromatic ring represented by the formula H1 in the compound of the present invention are shown below. In the following, the “•” mark on the left side of the structural formula represents the position where A is combined.

Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009

(式中、E及びEは前記と同じ意味を表す。)
本発明化合物において、式H2で表される5員へテロ芳香環の具体例を以下に示す。
(In the formula, E 1 and E 2 represent the same meaning as described above.)
Specific examples of the 5-membered heteroaromatic ring represented by the formula H2 in the compound of the present invention are shown below.

Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010

(式中、E及びEは前記と同じ意味を表す。)
本発明化合物において、式H3で表される5員へテロ芳香環の具体例を以下に示す。
(In the formula, E 1 and E 2 represent the same meaning as described above.)
Specific examples of the 5-membered heteroaromatic ring represented by the formula H3 in the compound of the present invention are shown below.

Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011

(式中、E及びEは前記と同じ意味を表す。)
 本発明化合物において、式H4で表される5員へテロ芳香環の具体例を以下に示す。
(In the formula, E 1 and E 2 represent the same meaning as described above.)
Specific examples of the 5-membered heteroaromatic ring represented by the formula H4 in the compound of the present invention are shown below.

Figure JPOXMLDOC01-appb-C000012
 
Figure JPOXMLDOC01-appb-C000012
 

(式中、Eは前記と同じ意味を表す。)
 本発明化合物において、式H5で表される5員へテロ芳香環の具体例を以下に示す。
(Wherein E 1 represents the same meaning as described above.)
Specific examples of the 5-membered heteroaromatic ring represented by the formula H5 in the compound of the present invention are shown below.

Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013

(式中、Eは前記と同じ意味を表す。)
 本発明化合物としては、例えば以下のヘテロ芳香環化合物が挙げられる。
[態様A]
 式(1)において、Hetが式H1、H2またはH3で示される基である化合物。
[態様B]
 式(1)において、Hetが式H1、H2またはH3で示される基であり、Yが-O-または-S-である化合物。
[態様C]
 式(1)において、Hetが式H1、H2またはH3で示される基であり、Yが-S-である化合物。
[態様D]
 式(1)において、Hetが式H1で示される基である化合物。
[態様E]
 式(1)において、Hetが式H1で示される基であり、Yが-O-または-S-である化合物。
[態様F]
 式(1)において、Hetが式H1で示される基であり、Yが-S-である化合物。
[態様G]
 式(1)において、Hetが式H1で示される基であり、Yが-S-であり、YおよびYが-CE=である化合物。
[態様H]
 式(1)において、Hetが式H4で示される基である化合物。
[態様I]
 式(J)において、Hetが式H4で示される基であり、Z、ZおよびZのうちの1つまたは2つが-N=であり、それ以外が-CE=である化合物。
[態様J]
 式(1)において、Hetが式H4で示される基であり、Z、ZおよびZのうちの1つが-N=であり、それ以外が-CE=である化合物。
[態様K]
 式(1)において、Hetが式H4で示される基であり、Zが-N=であり、Zが-CE=であり、かつ、Zが-CE=または-N=であるか、あるいは、Zが-CE=であり、Zが-N=であり、かつ、Zが-CE=である化合物。
[態様L]
 式(1)において、Hetが式H4で示される基であり、Zが-N=であり、Zが-CE=であり、Zが-CE=または-N=である化合物。
[態様M]
 式(1)において、Hetが式H4で示される基であり、ZおよびZのいずれか一方が-N=であり、他方が-CE=であり、Zが-CE=である化合物。
[態様N]
 式(1)において、Hetが式H4で示される基であり、Zが-N=であり、ZおよびZが同一または相異なりCE=である化合物。
[態様O]
 式(1)において、Hetが式H4で示される基であり、Zが-N=であり、ZおよびZが同一または相異なりCE=である化合物。
[態様P]
 式(1)において、Hetが式H5で示される基である化合物。
[態様Q]
 式(1)において、Hetが式H5で示される基であり、Z、ZおよびZのうちの1つまたは2つが-N=であり、それ以外が-CE=である化合物。
[態様R]
 式(1)において、Hetが式H5で示される基であり、Z、ZおよびZのうちの1つが-N=であり、それ以外が-CE=である化合物。
[態様S]
 式(1)において、Hetが式H5で示される基であり、Zが-N=であり、Zが-CE=であり、かつ、Zが-CE=または-N=であるか、あるいは、Zが-CE=であり、Zが-N=であり、かつ、Zが-CE=である化合物。
[態様T]
 式(1)において、Hetが式H5で示される基であり、Zが-N=であり、Zが-CE=であり、Zが-CE=または-N=である化合物。
[態様U]
 式(1)において、Hetが式H5で示される基であり、ZおよびZのいずれか一方が-N=であり、他方が-CE=であり、Zが-CE=である化合物。
[態様V]
 式(1)において、Hetが式H5で示される基であり、Zが-N=であり、ZおよびZが同一または相異なりCE=である化合物。
[態様W]
 式(1)において、Hetが式H5で示される基であり、Zが-N=であり、ZおよびZが同一または相異なりCE=である化合物。
[態様X]
 下式で示される[項1]記載のヘテロ芳香環化合物。
(Wherein E 1 represents the same meaning as described above.)
As this invention compound, the following hetero aromatic ring compounds are mentioned, for example.
[Aspect A]
In the formula (1), compounds wherein Het is a group represented by the formula H1, H2 or H3.
[Aspect B]
In the formula (1), compounds wherein Het is a group represented by the formula H1, H2 or H3 and Y 1 is —O— or —S—.
[Aspect C]
In the formula (1), compounds wherein Het is a group represented by the formula H1, H2 or H3 and Y 1 is —S—.
[Aspect D]
In the formula (1), compounds wherein Het is a group represented by the formula H1.
[Aspect E]
In the formula (1), compounds wherein Het is a group represented by the formula H1 and Y 1 is —O— or —S—.
[Aspect F]
In the formula (1), compounds wherein Het is a group represented by the formula H1 and Y 1 is —S—.
[Aspect G]
In the formula (1), compounds wherein Het is a group represented by formula H1, Y 1 is —S— and Y 2 and Y 3 are —CE 1 ═.
[Aspect H]
In the formula (1), compounds wherein Het is a group represented by formula H4.
[Aspect I]
In the formula (J), compounds wherein Het is a group represented by formula H4, one or two of Z 1 , Z 2 and Z 3 is —N═, and the others are —CE 1 ═.
[Aspect J]
In the formula (1), compounds wherein Het is a group represented by the formula H4, one of Z 1 , Z 2 and Z 3 is —N═ and the other is —CE 1 =.
[Aspect K]
In the formula (1), Het is a group represented by the formula H4, Z 1 is -N =, Z 2 is -CE 1 =, and Z 3 is -CE 1 = or -N = Or a compound wherein Z 1 is —CE 1 ═, Z 2 is —N═ and Z 3 is —CE 1 ═.
[Aspect L]
In the formula (1), compounds wherein Het is a group represented by the formula H4, Z 1 is -N =, Z 2 is -CE 1 = and Z 3 is -CE 1 = or -N = .
[Aspect M]
In the formula (1), Het is a group represented by the formula H4, one of Z 1 and Z 2 is —N═, the other is —CE 1 =, and Z 3 is —CE 1 = A compound.
[Aspect N]
In the formula (1), compounds wherein Het is a group represented by the formula H4, Z 1 is —N═ and Z 2 and Z 3 are the same or different and CE 1 =.
[Aspect O]
In the formula (1), compounds wherein Het is a group represented by formula H4, Z 2 is —N═ and Z 1 and Z 3 are the same or different and CE 1 =.
[Aspect P]
In the formula (1), compounds wherein Het is a group represented by the formula H5.
[Aspect Q]
In the formula (1), compounds wherein Het is a group represented by the formula H5, one or two of Z 1 , Z 2 and Z 3 are —N═, and the others are —CE 1 ═.
[Aspect R]
In the formula (1), compounds wherein Het is a group represented by the formula H5, one of Z 1 , Z 2 and Z 3 is —N═ and the other is —CE 1 =.
[Aspect S]
In the formula (1), Het is a group represented by the formula H5, Z 1 is -N =, Z 2 is -CE 1 =, and Z 3 is -CE 1 = or -N = Or a compound wherein Z 1 is —CE 1 ═, Z 2 is —N═ and Z 3 is —CE 1 ═.
[Aspect T]
In the formula (1), compounds wherein Het is a group represented by the formula H5, Z 1 is -N =, Z 2 is -CE 1 = and Z 3 is -CE 1 = or -N = .
[Aspect U]
In the formula (1), Het is a group represented by the formula H5, one of Z 1 and Z 2 is —N═, the other is —CE 1 =, and Z 3 is —CE 1 = A compound.
[Aspect V]
In the formula (1), compounds wherein Het is a group represented by the formula H5, Z 1 is —N═, Z 2 and Z 3 are the same or different and CE 1 ═.
[Aspect W]
In the formula (1), compounds wherein Het is a group represented by the formula H5, Z 2 is —N═, Z 1 and Z 3 are the same or different and CE 1 =.
[Aspect X]
The heteroaromatic ring compound according to [Item 1] represented by the following formula:

Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014

(式中、nは0、1または2を表し、pは0、1、2または3を表し、他の記号は前記と同じ意味を表す。)
[態様Y]
 下式で示される[項1]記載のヘテロ芳香環化合物。
(In the formula, n represents 0, 1 or 2, p represents 0, 1, 2 or 3, and other symbols have the same meaning as described above.)
[Aspect Y]
The heteroaromatic ring compound according to [Item 1] represented by the following formula:

Figure JPOXMLDOC01-appb-C000015
 
Figure JPOXMLDOC01-appb-C000015
 

Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016

(式中、各記号は前記と同じ意味を表す。)
 [態様Z]
 下式で示される[項1]記載のヘテロ芳香環化合物。
(In the formula, each symbol represents the same meaning as described above.)
[Aspect Z]
The heteroaromatic ring compound according to [Item 1] represented by the following formula:

Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017

(式中、各記号は前記と同じ意味を表す。)
 また、本発明化合物としては、例えば以下のヘテロ芳香環化合物も挙げられる。
[態様1]~[態様23]
 Gが〔表1〕に記載された[態様1]~[態様23]である、[項1]および[態様A]~[態様Z]のいずれかに記載のヘテロ芳香環化合物。なお、例えば、[態様1]は、「式(1)において、Gが水素原子、ハロゲン原子、式G1、G2、G3、またはG4で示される基である[項1]および[態様A]~[態様Z]のいずれかに記載のヘテロ芳香環化合物。」を表す。
(In the formula, each symbol represents the same meaning as described above.)
Moreover, as this invention compound, the following hetero aromatic ring compounds are also mentioned, for example.
[Aspect 1] to [Aspect 23]
The heteroaromatic ring compound according to any one of [Item 1] and [Aspect A] to [Aspect Z], wherein G is [Aspect 1] to [Aspect 23] described in [Table 1]. For example, [Aspect 1] is “In Formula (1), G is a hydrogen atom, a halogen atom, a group represented by Formulas G1, G2, G3, or G4 [Item 1] and [Aspect A] to The heteroaromatic ring compound according to any one of [Aspect Z].

Figure JPOXMLDOC01-appb-T000018
Figure JPOXMLDOC01-appb-T000018

 また、本発明化合物として、例えば、以下のヘテロ芳香環化合物も挙げられる。 In addition, examples of the compound of the present invention include the following heteroaromatic ring compounds.

 式(1)において、Dが-CH=である[項1]、[態様A]~[態様Z]、および[態様1]~[態様23]のいずれかに記載の化合物;
式(1)において、Dが-N=である[項1]、[態様A]~[態様Z]および[態様1]~[態様23]のいずれかに記載の化合物;
 式(1)において、Lが単結合または-CH2-であり、Aが単結合または-O-であり、Jが式J1またはJ2で示される基である、[項1]、[態様A]~[態様Z]および[態様1]~[態様23]のいずれかに記載の化合物;
 式(1)において、Lが単結合または-CH2-であり、Aが単結合または-O-であり、Jが式J1で示される基(R1およびR2はいずれもメチル基であり、R3は水素原子、メチル基、またはエチル基である。)または式J2で示される基(R4、R5およびR6はいずれもメチル基である。)である、[項1]、[態様A]~[態様Z]および[態様1]~[態様23]のいずれかに記載の化合物;
 式(1)において、Lが-CH2-であり、Aが単結合であり、Jが式J1で示される基(R1およびR2はいずれもメチル基であり、R3は水素原子、メチル基、またはエチル基である。)または式J2で示される基(R4、R5およびR6はいずれもメチル基である。)である、[項1]、[態様A]~[態様Z]および[態様1]~[態様23]のいずれかに記載の化合物;
 式(1)において、J-L-Aがネオペンチル基である、[項1]、[態様A]~[態様Z]および[態様1]~[態様23]のいずれかに記載の化合物;
 式(1)において、Gが水素原子またはハロゲン原子であるか、
Gが式G1で示される基であり、かつ、Raが<群α>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であるか、
Gが式G2で示される基であり、かつ、Rbが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であるか、
Gが式G3で示される基であり、かつ、Rcが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であるか、あるいは、
Gが式G4で示される基であり、Rdが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であり、かつ、Reが、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基または水素原子である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gがハロゲン原子であるか、
Gが式G1で示される基であり、かつ、Raが<群α>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であるか、
Gが式G2で示される基であり、かつ、Rbが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であるか、
Gが式G3で示される基であり、かつ、Rcが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であるか、あるいは、
Gが式G4で示される基であり、Rdが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であり、かつ、Reが、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基または水素原子である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが式G1で示される基であり、かつ、Raが<群α>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であるか、
Gが式G2で示される基であり、かつ、Rbが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であるか、
Gが式G3で示される基であり、かつ、Rcが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であるか、あるいは、
Gが式G4で示される基であり、Rdが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であり、かつ、Reが、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基または水素原子である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが、水素原子、フッ素原子、塩素原子、臭素原子、メチル基、エチル基、プロピル基、イソプロピル基、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、2,2,2-トリフルオロエトキシ基、メチルチオ基、エチルチオ基、プロピルチオ基、イソプロピルチオ基、2,2,2-トリフルオロエチルチオ基、N,N-ジメチルアミノ基、N,N-ジエチルアミノ基、N,N-ジプロピルアミノ基、N-エチル-N-メチルアミノ基、N-メチル-N-プロピルアミノ基、N-イソプロピル-N-メチルアミノ基、N-メチル-N-(2,2,2-トリフルオロエチル)アミノ基、N-メチルアミノ基、N-エチルアミノ基、N-プロピルアミノ基、N-イソプロピルアミノ基またはN-(2,2,2-トリフルオロエチル)アミノ基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが、フッ素原子、塩素原子、臭素原子、メチル基、エチル基、プロピル基、イソプロピル基、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、2,2,2-トリフルオロエトキシ基、メチルチオ基、エチルチオ基、プロピルチオ基、イソプロピルチオ基、2,2,2-トリフルオロエチルチオ基、N,N-ジメチルアミノ基、N,N-ジエチルアミノ基、N,N-ジプロピルアミノ基、N-エチル-N-メチルアミノ基、N-メチル-N-プロピルアミノ基、N-イソプロピル-N-メチルアミノ基、N-メチル-N-(2,2,2-トリフルオロエチル)アミノ基、N-メチルアミノ基、N-エチルアミノ基、N-プロピルアミノ基、N-イソプロピルアミノ基またはN-(2,2,2-トリフルオロエチル)アミノ基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが、メチル基、エチル基、プロピル基、イソプロピル基、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、2,2,2-トリフルオロエトキシ基、メチルチオ基、エチルチオ基、プロピルチオ基、イソプロピルチオ基、2,2,2-トリフルオロエチルチオ基、N,N-ジメチルアミノ基、N,N-ジエチルアミノ基、N,N-ジプロピルアミノ基、N-エチル-N-メチルアミノ基、N-メチル-N-プロピルアミノ基、N-イソプロピル-N-メチルアミノ基、N-メチル-N-(2,2,2-トリフルオロエチル)アミノ基、N-メチルアミノ基、N-エチルアミノ基、N-プロピルアミノ基、N-イソプロピルアミノ基またはN-(2,2,2-トリフルオロエチル)アミノ基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが式G2で示される基であり、かつ、Rbが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であるか、あるいは
Gが式G3で示される基であり、かつ、Rcが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基である[項1]および[態様A]~[態様Z]のいずれかに記載のヘテロ環化合物;
 式(1)において、Gが、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、2,2,2-トリフルオロエトキシ基、メチルチオ基、エチルチオ基、プロピルチオ基、イソプロピルチオ基または2,2,2-トリフルオロエチルチオ基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが式G1で示される基であり、かつ、Raが<群α>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であるか、あるいは、
Gが式G4で示される基であり、Rdが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であり、かつ、Reが、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基または水素原子である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが、メチル基、エチル基、プロピル基、イソプロピル基、N,N-ジメチルアミノ基、N,N-ジエチルアミノ基、N,N-ジプロピルアミノ基、N-エチル-N-メチルアミノ基、N-メチル-N-プロピルアミノ基、N-イソプロピル-N-メチルアミノ基、N-メチル-N-(2,2,2-トリフルオロエチル)アミノ基、N-メチルアミノ基、N-エチルアミノ基、N-プロピルアミノ基、N-イソプロピルアミノ基またはN-(2,2,2-トリフルオロエチル)アミノ基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが式G1で示される基であり、かつ、Raが<群α>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが、メチル基、エチル基、プロピル基またはイソプロピル基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが式G2で示される基であり、かつ、Rbが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基または2,2,2-トリフルオロエトキシ基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが式G3で示される基であり、かつ、Rcが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが、メチルチオ基、エチルチオ基、プロピルチオ基、イソプロピルチオ基または2,2,2-トリフルオロエチルチオ基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが式G4で示される基であり、Rdが<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基であり、かつ、Reが、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基または水素原子である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物;
 式(1)において、Gが、N,N-ジメチルアミノ基、N,N-ジエチルアミノ基、N,N-ジプロピルアミノ基、N-エチル-N-メチルアミノ基、N-メチル-N-プロピルアミノ基、N-イソプロピル-N-メチルアミノ基、N-メチル-N-(2,2,2-トリフルオロエチル)アミノ基、N-メチルアミノ基、N-エチルアミノ基、N-プロピルアミノ基、N-イソプロピルアミノ基またはN-(2,2,2-トリフルオロエチル)アミノ基である[項1]および[態様A]~[態様Z]のいずれかに記載の化合物。
The compound according to any one of [Item 1], [Aspect A] to [Aspect Z], and [Aspect 1] to [Aspect 23], wherein D is —CH═ in formula (1);
The compound according to any one of [Item 1], [Aspect A] to [Aspect Z], and [Aspect 1] to [Aspect 23], wherein D is —N═ in formula (1);
In the formula (1), L is a single bond or —CH 2 —, A is a single bond or —O—, and J is a group represented by the formula J1 or J2. ] To [Aspect Z] and [Aspect 1] to [Aspect 23];
In the formula (1), L is a single bond or —CH 2 —, A is a single bond or —O—, and J is a group represented by the formula J1 (R 1 and R 2 are both methyl groups) , R 3 is a hydrogen atom, a methyl group, or an ethyl group.) Or a group represented by formula J2 (R 4 , R 5, and R 6 are all methyl groups), [Claim 1], The compound according to any one of [Aspect A] to [Aspect Z] and [Aspect 1] to [Aspect 23];
In the formula (1), L is —CH 2 —, A is a single bond, J is a group represented by the formula J1 (R 1 and R 2 are both methyl groups, R 3 is a hydrogen atom, A methyl group or an ethyl group) or a group represented by formula J2 (wherein R 4 , R 5 and R 6 are all methyl groups), [Item 1], [Aspect A] to [Aspect Z] and the compound according to any one of [Aspect 1] to [Aspect 23];
The compound according to any one of [Item 1], [Aspect A] to [Aspect Z], and [Aspect 1] to [Aspect 23], wherein JLA is a neopentyl group in Formula (1);
In the formula (1), G is a hydrogen atom or a halogen atom,
G is a group represented by the formula G1, and R a is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group α>;
G is a group represented by the formula G2, and R b is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>,
G is a group represented by the formula G3, and R c is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, or ,
G is a group represented by the formula G4, R d is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, and R e Is a C1-C6 chain hydrocarbon group or hydrogen atom which may have one or more atoms or groups selected from <Group β> [Claim 1] and [Aspect A] to [Aspect Z] A compound according to any of the above;
In Formula (1), G is a halogen atom,
G is a group represented by the formula G1, and R a is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group α>;
G is a group represented by the formula G2, and R b is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>,
G is a group represented by the formula G3, and R c is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, or ,
G is a group represented by the formula G4, R d is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, and R e Is a C1-C6 chain hydrocarbon group or hydrogen atom which may have one or more atoms or groups selected from <Group β> [Claim 1] and [Aspect A] to [Aspect Z] A compound according to any of the above;
In the formula (1), G is a group represented by the formula G1, and R a may have one or more atoms or groups selected from <Group α>. Or
G is a group represented by the formula G2, and R b is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>,
G is a group represented by the formula G3, and R c is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, or ,
G is a group represented by the formula G4, R d is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, and R e Is a C1-C6 chain hydrocarbon group or hydrogen atom which may have one or more atoms or groups selected from <Group β> [Claim 1] and [Aspect A] to [Aspect Z] A compound according to any of the above;
In the formula (1), G is hydrogen atom, fluorine atom, chlorine atom, bromine atom, methyl group, ethyl group, propyl group, isopropyl group, methoxy group, ethoxy group, propoxy group, isopropoxy group, 2,2, 2-trifluoroethoxy group, methylthio group, ethylthio group, propylthio group, isopropylthio group, 2,2,2-trifluoroethylthio group, N, N-dimethylamino group, N, N-diethylamino group, N, N -Dipropylamino group, N-ethyl-N-methylamino group, N-methyl-N-propylamino group, N-isopropyl-N-methylamino group, N-methyl-N- (2,2,2-tri Fluoroethyl) amino group, N-methylamino group, N-ethylamino group, N-propylamino group, N-isopropylamino group or N- (2,2,2-tri Ruoroechiru) an amino group compound according to any one of [claim 1] and [Embodiment A] ~ [aspect Z];
In the formula (1), G is fluorine atom, chlorine atom, bromine atom, methyl group, ethyl group, propyl group, isopropyl group, methoxy group, ethoxy group, propoxy group, isopropoxy group, 2,2,2-tri Fluoroethoxy group, methylthio group, ethylthio group, propylthio group, isopropylthio group, 2,2,2-trifluoroethylthio group, N, N-dimethylamino group, N, N-diethylamino group, N, N-dipropyl Amino group, N-ethyl-N-methylamino group, N-methyl-N-propylamino group, N-isopropyl-N-methylamino group, N-methyl-N- (2,2,2-trifluoroethyl) Amino group, N-methylamino group, N-ethylamino group, N-propylamino group, N-isopropylamino group or N- (2,2,2-trifluoroe A compound according to any one of the Le) is an amino group [claim 1] and [Embodiment A] ~ [aspect Z];
In the formula (1), G is methyl group, ethyl group, propyl group, isopropyl group, methoxy group, ethoxy group, propoxy group, isopropoxy group, 2,2,2-trifluoroethoxy group, methylthio group, ethylthio group , Propylthio group, isopropylthio group, 2,2,2-trifluoroethylthio group, N, N-dimethylamino group, N, N-diethylamino group, N, N-dipropylamino group, N-ethyl-N- Methylamino group, N-methyl-N-propylamino group, N-isopropyl-N-methylamino group, N-methyl-N- (2,2,2-trifluoroethyl) amino group, N-methylamino group, N-ethylamino group, N-propylamino group, N-isopropylamino group or N- (2,2,2-trifluoroethyl) amino group [Claim 1] and A compound according to any one of embodiments A] ~ [aspect Z];
C1-C6 chain hydrocarbon in which G is a group represented by formula G2 and R b may have one or more atoms or groups selected from <Group β> in formula (1) A C1-C6 chain hydrocarbon which is a group, or G is a group represented by the formula G3, and R c may have one or more atoms or groups selected from <Group β> The heterocyclic compound according to any one of [Item 1] and [Aspect A] to [Aspect Z], which is a group;
In the formula (1), G is methoxy group, ethoxy group, propoxy group, isopropoxy group, 2,2,2-trifluoroethoxy group, methylthio group, ethylthio group, propylthio group, isopropylthio group, or 2,2, The compound according to any one of [Item 1] and [Aspect A] to [Aspect Z], which is a 2-trifluoroethylthio group;
In the formula (1), G is a group represented by the formula G1, and R a may have one or more atoms or groups selected from <Group α>. Group or
G is a group represented by the formula G4, R d is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, and R e Is a C1-C6 chain hydrocarbon group or hydrogen atom which may have one or more atoms or groups selected from <Group β> [Claim 1] and [Aspect A] to [Aspect Z] A compound according to any of the above;
In the formula (1), G is methyl group, ethyl group, propyl group, isopropyl group, N, N-dimethylamino group, N, N-diethylamino group, N, N-dipropylamino group, N-ethyl-N. -Methylamino group, N-methyl-N-propylamino group, N-isopropyl-N-methylamino group, N-methyl-N- (2,2,2-trifluoroethyl) amino group, N-methylamino group , N-ethylamino group, N-propylamino group, N-isopropylamino group or N- (2,2,2-trifluoroethyl) amino group [Claim 1] and [Aspect A] to [Aspect Z] A compound according to any of the above;
In the formula (1), G is a group represented by the formula G1, and R a may have one or more atoms or groups selected from <Group α>. [Claim 1] which is a group and the compound according to any one of [Aspect A] to [Aspect Z];
In the formula (1), G is a methyl group, an ethyl group, a propyl group or an isopropyl group [Claim 1] and the compound according to any one of [Aspect A] to [Aspect Z];
C1-C6 chain hydrocarbon in which G is a group represented by formula G2 and R b may have one or more atoms or groups selected from <Group β> in formula (1) [Claim 1] which is a group and the compound according to any one of [Aspect A] to [Aspect Z];
In the formula (1), any one of [Claim 1] and [Aspect A] to [Aspect Z], wherein G is a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, or a 2,2,2-trifluoroethoxy group A compound according to claim 1;
In the formula (1), G is a group represented by the formula G3, and R c may have one or more atoms or groups selected from <Group β>. The compound according to any one of [Item 1] and [Aspect A] to [Aspect Z], which is a group;
In the formula (1), G is a methylthio group, an ethylthio group, a propylthio group, an isopropylthio group, or a 2,2,2-trifluoroethylthio group. Any one of the compounds;
In the formula (1), G is a group represented by the formula G4, and R d is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>. And R e is a C1-C6 chain hydrocarbon group or hydrogen atom which may have one or more atoms or groups selected from <Group β> [Claim 1] and [Aspect A ] To [Aspect Z]
In the formula (1), G is N, N-dimethylamino group, N, N-diethylamino group, N, N-dipropylamino group, N-ethyl-N-methylamino group, N-methyl-N-propyl. Amino group, N-isopropyl-N-methylamino group, N-methyl-N- (2,2,2-trifluoroethyl) amino group, N-methylamino group, N-ethylamino group, N-propylamino group The compound according to any one of [Item 1] and [Aspect A] to [Aspect Z], which is an N-isopropylamino group or an N- (2,2,2-trifluoroethyl) amino group.

 次に本発明化合物の製造法について説明する。 Next, a method for producing the compound of the present invention will be described.

 本発明化合物は、例えば、以下の(製造法1)~(製造法9)にしたがって製造することができる。 The compound of the present invention can be produced, for example, according to the following (Production Method 1) to (Production Method 9).

(製造法1)
 本発明化合物のうち、Hetが式H1、H2、H3およびH4で示される基である化合物は、例えば、下記のスキームにしたがって製造することができる。
(Production method 1)
Among the compounds of the present invention, compounds in which Het is a group represented by the formulas H1, H2, H3 and H4 can be produced, for example, according to the following scheme.

Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019

〔式中、J、L、A、DおよびGおよびmは前記と同じ意味を表し、Het1は式H1、H2、H3またはH4で示される基を表し、Lgは、塩素原子、臭素原子、ヨウ素原子、または、トリフルオロメタンスルホニルオキシ基等の脱離基を表し、LgはB(OH)基またはB(OR基(式中、Rは同一または相異なっていてもよく、C1-C6のアルキル基を示し、2つのRが結合して-CHCH-基または-C(CHC(CH-基を形成することもできる。)を表す。〕 [Represents wherein, J, L, A, D and G and m are as defined above, Het1 represents a group of the formula H1, H2, H3 or H4, Lg 1 is a chlorine atom, a bromine atom, It represents a leaving group such as an iodine atom or a trifluoromethanesulfonyloxy group, Lg 2 represents a B (OH) 2 group or a B (OR f ) 2 group (wherein R f may be the same or different) , A C1-C6 alkyl group, and two R f can be bonded to form a —CH 2 CH 2 — group or a —C (CH 3 ) 2 C (CH 3 ) 2 — group. To express. ]

・(1a)の製造
 本発明化合物は化合物(2)と一般式(3)で表される化合物とを溶媒、触媒および塩基の存在下で反応させることにより化合物(1a)を製造することができる。
-Production of (1a) The compound of the present invention can produce compound (1a) by reacting compound (2) with the compound represented by formula (3) in the presence of a solvent, a catalyst and a base. .

 該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等芳香族炭化水素類、塩化メチレン、クロロホルム等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、N,N-ジメチルホルムアミド、N-メチルピロリジノン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類、水及びこれらの混合物が挙げられる。 Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile, and the like. Nitriles, N, N-dimethylformamide, acid amides such as N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, water, and mixtures thereof.

 該反応で用いられる触媒としては、例えば、テトラキス(トリフェニルホスフィン)パラジウム、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]ジクロロパラジウム塩化メチレン錯体等のパラジウム触媒が挙げられる。触媒の使用量は化合物(2)1モルに対して0.0001から0.1倍モルの範囲で使用される。 Examples of the catalyst used in the reaction include palladium catalysts such as tetrakis (triphenylphosphine) palladium and [1,1'-bis (diphenylphosphino) ferrocene] dichloropalladium methylene chloride complex. The amount of the catalyst used is in the range of 0.0001 to 0.1 times mol for 1 mol of compound (2).

 該反応で用いられる塩基としては、例えば、水酸化ナトリウム、水酸化カリウム、炭酸カリウム、炭酸セシウム、カリウムtert-ブトキシド、リン酸カリウム等の無機塩基類、酢酸ナトリウム、酢酸カリウム等の有機酸塩類等が挙げられる。塩基の使用量は化合物(2)1モルに対して0.5から10倍モルの範囲で使用される。 Examples of the base used in the reaction include inorganic bases such as sodium hydroxide, potassium hydroxide, potassium carbonate, cesium carbonate, potassium tert-butoxide, potassium phosphate, and organic acid salts such as sodium acetate and potassium acetate. Is mentioned. The amount of the base used is in the range of 0.5 to 10 times mol per mol of compound (2).

 化合物(2)1モルに対して化合物(3)は通常1モルの割合で用いられるが、適宜変更することができる。 Compound (3) is usually used at a ratio of 1 mol per 1 mol of compound (2), but can be appropriately changed.

 該反応における反応温度は通常20℃から溶媒の沸点の範囲であり、反応時間は0.1時間から24時間の範囲である。 The reaction temperature in the reaction is usually in the range of 20 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.

 また該反応は、例えば窒素ガスやアルゴンガスのような不活性ガスの雰囲気下で行うほうが良い。 The reaction is preferably performed in an atmosphere of an inert gas such as nitrogen gas or argon gas.

 反応終了後は、通常の後処理操作をすることにより、化合物(1a)を単離することができる。 After completion of the reaction, the compound (1a) can be isolated by carrying out ordinary post-treatment operations.

(製造法2)
 本発明化合物のうち、Hetが式H4で示される基である化合物は、例えば、下記のスキームにしたがって製造することができる。
(Production method 2)
Among the compounds of the present invention, a compound in which Het is a group represented by the formula H4 can be produced, for example, according to the following scheme.

Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020

〔式中、J、L、D、G、Z、Z、Zおよびmは前記と同じ意味を表し、Lgは、塩素原子、臭素原子、ヨウ素原子、メタンスルホニルオキシ基、パラトルエンスルホニルオキシ基、または、トリフルオロメタンスルホニルオキシ基等の脱離基を表す。〕 [Wherein, J, L, D, G, Z 1 , Z 2 , Z 3 and m represent the same meaning as described above, and Lg 3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, paratoluene. It represents a leaving group such as a sulfonyloxy group or a trifluoromethanesulfonyloxy group. ]

・(1b)の製造
 本発明化合物(1b)は化合物(4)と化合物(5)とを、塩基の存在下に反応させることにより製造することができる。
-Production of (1b) The compound (1b) of the present invention can be produced by reacting the compound (4) and the compound (5) in the presence of a base.

 該反応は、通常溶媒の存在下で行われ、該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等芳香族炭化水素類、塩化メチレン、クロロホルム等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、N,N-ジメチルホルムアミド、N-メチルピロリジノン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類及びこれらの混合物が挙げられる。 The reaction is usually carried out in the presence of a solvent. Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, chlorides, and the like. Examples thereof include halogenated hydrocarbons such as methylene and chloroform, nitriles such as acetonitrile, acid amides such as N, N-dimethylformamide and N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.

 該反応において用いられる塩基としては、水酸化ナトリウム、水酸化カリウム、水素化ナトリウム、炭酸カリウム、炭酸セシウム、カリウムtert-ブトキシド等が挙げられる。化合物(4)に対して、塩基は通常1モルから10モルの割合で用いられる。 Examples of the base used in the reaction include sodium hydroxide, potassium hydroxide, sodium hydride, potassium carbonate, cesium carbonate, potassium tert-butoxide and the like. The base is usually used in a proportion of 1 mol to 10 mol with respect to compound (4).

 化合物(4)1モルに対して化合物(5)は通常1モルの割合で用いられるが、適宜変更することができる。 Compound (5) is usually used at a ratio of 1 mol per 1 mol of compound (4), but can be appropriately changed.

 化合物(4)と化合物(5)との反応における反応温度は通常0℃から溶媒の沸点の範囲であり、反応時間は0.1時間から24時間の範囲である。 The reaction temperature in the reaction between the compound (4) and the compound (5) is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.

 反応終了後は、通常の後処理操作を行うことにより、本発明化合物(1b)を単離することができる。 After completion of the reaction, the compound (1b) of the present invention can be isolated by performing ordinary post-treatment operations.

(製造法3)
 本発明化合物のうち、Hetが式H5で示される基である化合物は、例えば、下記のスキームにしたがって製造することができる。
(Production method 3)
Among the compounds of the present invention, a compound in which Het is a group represented by the formula H5 can be produced, for example, according to the following scheme.

Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021

〔式中、J、L、A、D、G、Z、Z、Zおよびmは前記と同じ意味を表し、Lgは、フッ素原子、塩素原子、臭素原子等の脱離基を表す。〕 [Wherein, J, L, A, D, G, Z 1 , Z 2 , Z 3 and m represent the same meaning as described above, and Lg 4 represents a leaving group such as a fluorine atom, a chlorine atom or a bromine atom. To express. ]

・(1c)の製造
 本発明化合物(1c)は化合物(6)と化合物(7)とを、塩基の存在下に反応させることにより製造することができる。
-Production of (1c) The compound (1c) of the present invention can be produced by reacting the compound (6) and the compound (7) in the presence of a base.

 該反応は、通常溶媒の存在下で行われ、該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等芳香族炭化水素類、塩化メチレン、クロロホルム等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、N,N-ジメチルホルムアミド、N-メチルピロリジノン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類及びこれらの混合物が挙げられる。 The reaction is usually carried out in the presence of a solvent. Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, chlorides, and the like. Examples thereof include halogenated hydrocarbons such as methylene and chloroform, nitriles such as acetonitrile, acid amides such as N, N-dimethylformamide and N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.

 該反応において用いられる塩基としては、水酸化ナトリウム、水酸化カリウム、水素化ナトリウム、炭酸カリウム、炭酸セシウム、カリウムtert-ブトキシド等が挙げられる。化合物(6)に対して、塩基は通常1モルから10モルの割合で用いられる。 Examples of the base used in the reaction include sodium hydroxide, potassium hydroxide, sodium hydride, potassium carbonate, cesium carbonate, potassium tert-butoxide and the like. The base is usually used in a proportion of 1 mol to 10 mol with respect to compound (6).

 化合物(6)1モルに対して化合物(7)は通常1モルの割合で用いられるが、適宜変更することができる。 Compound (7) is usually used in a ratio of 1 mol per 1 mol of compound (6), but can be appropriately changed.

 化合物(6)と化合物(7)との反応における反応温度は通常0℃から溶媒の沸点の範囲であり、反応時間は0.1時間から24時間の範囲である。 The reaction temperature in the reaction of the compound (6) and the compound (7) is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.

 反応終了後は、通常の後処理操作を行うことにより、本発明化合物(1c)を単離することができる。 After completion of the reaction, the compound (1c) of the present invention can be isolated by performing ordinary post-treatment operations.

(製造法4)
 本発明化合物のうち、Hetが式H1、H2およびH3で示される基である化合物は、例えば、下記のスキームにしたがって製造することができる。
(Production Method 4)
Among the compounds of the present invention, compounds in which Het is a group represented by the formulas H1, H2, and H3 can be produced, for example, according to the following scheme.

Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022

〔式中、J、L、D、G、Lgおよびmは前記と同じ意味を表し、Het2は式H1、H2またはH3で示される基を表し、L’は単結合または1個以上のハロゲン原子を有してもよいC1-C2アルキル基を表し、Lgは塩素原子、臭素原子、ヨウ素原子等の脱離基を表し、Rは水素原子、メチル基、メチルチオ基、メトキシ基、フェニル基、フェノキシ基またはイミダゾリル基を表す。〕 [Wherein, J, L, D, G, Lg 2 and m represent the same meaning as described above, Het2 represents a group represented by the formula H1, H2 or H3, and L ′ represents a single bond or one or more halogens. Represents a C1-C2 alkyl group which may have an atom; Lg 5 represents a leaving group such as a chlorine atom, a bromine atom or an iodine atom; R g represents a hydrogen atom, a methyl group, a methylthio group, a methoxy group, a phenyl group; Represents a group, a phenoxy group or an imidazolyl group. ]

・(8)→(10)
 化合物(8)をアルキルリチウム化合物と反応させた後に、生成する反応中間体と式(9)で示されるアルデヒドと反応させることにより、化合物(10)を製造することができる。
・ (8) → (10)
Compound (10) can be produced by reacting compound (8) with an alkyllithium compound and then reacting the resulting reaction intermediate with an aldehyde represented by formula (9).

 化合物(8)の2つのLgは同一でも相異なっていてもよい。 Two Lg 1 of the compound (8) may be the same or different.

 該反応は、通常溶媒の存在下行われ、該反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等の芳香族炭化水素類が挙げられる。 The reaction is usually carried out in the presence of a solvent. Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, and aromatic hydrocarbons such as toluene and xylene. Is mentioned.

 該反応に用いられるアルキルリチウム化合物としては、例えば、n-、sec-またはtert-ブチルリチウムが挙げられ、好ましくはn-ブチルリチウムである。化合物(8)1モルに対して、アルキルリチウム化合物は通常1モルの割合で用いられるが、適宜変更することができる。 Examples of the alkyllithium compound used in the reaction include n-, sec- or tert-butyllithium, preferably n-butyllithium. The alkyllithium compound is usually used at a ratio of 1 mol per 1 mol of the compound (8), but can be appropriately changed.

 化合物(8)とアルキルリチウム化合物との反応における反応温度は、通常-78℃から0℃の範囲であり、反応時間は、通常瞬時から1時間の範囲である。 The reaction temperature in the reaction between the compound (8) and the alkyl lithium compound is usually in the range of −78 ° C. to 0 ° C., and the reaction time is usually in the range of 1 hour from the instant.

 化合物(8)1モルに対して化合物(9)は通常1モルの割合で用いられるが、適宜変更することができる。 Compound (9) is usually used at a ratio of 1 mol per 1 mol of compound (8), but can be appropriately changed.

 該反応中間体と化合物(8)との反応における反応温度は、通常-78℃から30℃の範囲であり、反応時間は、通常0.1時間から24時間の範囲である。 The reaction temperature in the reaction between the reaction intermediate and compound (8) is usually in the range of −78 ° C. to 30 ° C., and the reaction time is usually in the range of 0.1 to 24 hours.

 反応終了後は、反応混合物に水または塩化アンモニウム水溶液等を注加した後、有機溶媒で抽出し、通常の後処理操作を行うことにより、化合物(10)を単離することができる。 After completion of the reaction, the compound (10) can be isolated by pouring water or an aqueous ammonium chloride solution into the reaction mixture, extracting with an organic solvent, and performing a normal post-treatment operation.

・(10)→(11)
 該反応は製造方法1に記載した化合物(1a)の製造方法あるいはそれに準じた方法で製造できる。
・ (10) → (11)
This reaction can be produced by the production method of compound (1a) described in production method 1 or a method analogous thereto.

・(11)→(12)→(1d)
 該反応は当業者に知られるBarton-McCombie脱ヒドロキシル化反応によって製造できる。
・ (11) → (12) → (1d)
The reaction can be prepared by a Barton-McCombie dehydroxylation reaction known to those skilled in the art.

(製造法5)
 本発明化合物のうち、Hetが式H5で示される基であり、Dが-N=である化合物は、例えば、下記のスキームにしたがって製造することができる。
(Production method 5)
Among the compounds of the present invention, a compound in which Het is a group represented by the formula H5 and D is —N═ can be produced, for example, according to the following scheme.

Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023

〔式中、J、L、A、G、Lg、Z、Z、Zおよびmは前記と同じ意味を表す。〕 [Wherein, J, L, A, G, Lg 4 , Z 1 , Z 2 , Z 3 and m represent the same meaning as described above. ]

・(14)の製造
 化合物(14)は、化合物(6)とジハロピリミジン化合物(13)とを、塩基の存在下に反応させることにより製造することができる。
-Production of (14) Compound (14) can be produced by reacting compound (6) with dihalopyrimidine compound (13) in the presence of a base.

 化合物(13)の2つのLgは相異なっていてもよいが、2つのLgがともに塩素原子である化合物が好ましい。 Two Lg 4 groups in the compound (13) may be different from each other, but a compound in which the two Lg 4 groups are both chlorine atoms is preferable.

 該反応は、通常溶媒の存在下行われ、該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等の芳香族炭化水素類、塩化メチレン、クロロホルム等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、N,N-ジメチルホルムアミド、N-メチルピロリジノン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類及びこれらの混合物が挙げられる。 The reaction is usually performed in the presence of a solvent. Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, methylene chloride, and the like. Halogenated hydrocarbons such as chloroform, nitriles such as acetonitrile, acid amides such as N, N-dimethylformamide and N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.

 該反応において用いられる塩基としては、水酸化ナトリウム、水酸化カリウム、水素化ナトリウム、炭酸カリウム、炭酸セシウム、カリウムtert-ブトキシド等が挙げられる。化合物(6)1モルに対して、塩基は通常1モル~10モルの割合で用いられる。 Examples of the base used in the reaction include sodium hydroxide, potassium hydroxide, sodium hydride, potassium carbonate, cesium carbonate, potassium tert-butoxide and the like. The base is usually used in a proportion of 1 mol to 10 mol with respect to 1 mol of the compound (6).

 化合物(6)1モルに対して化合物(13)は通常1モルの割合で用いられるが、適宜変更することができる。 Compound (13) is usually used at a ratio of 1 mol per 1 mol of compound (6), but can be appropriately changed.

 該反応における反応温度は、通常20℃から200℃あるいは溶媒の沸点の範囲である。 The reaction temperature in the reaction is usually in the range of 20 ° C. to 200 ° C. or the boiling point of the solvent.

 該反応における反応時間は、通常0.1時間から24時間の範囲である。 The reaction time in the reaction is usually in the range of 0.1 to 24 hours.

 反応終了後は、通常の後処理操作を行うことにより、化合物(14)を単離することができる。 After completion of the reaction, the compound (14) can be isolated by performing ordinary post-treatment operations.

・(14)→(1e)
 本発明化合物(1e)は、化合物(14)を脱ハロゲン化することにより製造することができる。脱ハロゲン化の方法としては、例えば、接触水素還元反応などが挙げられる。接触水素還元反応は、溶媒および触媒の存在下、水素と反応させて行う。
・ (14) → (1e)
The compound (1e) of the present invention can be produced by dehalogenating the compound (14). Examples of the dehalogenation method include a catalytic hydrogen reduction reaction. The catalytic hydrogen reduction reaction is performed by reacting with hydrogen in the presence of a solvent and a catalyst.

 該反応に用いられる溶媒としては、例えば、メタノール、エタノール等のアルコール類、酢酸エチル等のエステル類、酢酸等のカルボン酸類および水が挙げられる。 Examples of the solvent used in the reaction include alcohols such as methanol and ethanol, esters such as ethyl acetate, carboxylic acids such as acetic acid, and water.

 また必要に応じて塩基または酸を加えることができる。その場合のモル比は化合物(14)1モルに対して、通常0.01モル~10モルである。 Also, a base or acid can be added as necessary. In this case, the molar ratio is usually 0.01 mol to 10 mol with respect to 1 mol of compound (14).

 該反応に用いられる塩基としては、例えば、酸化マグネシウム、水酸化ナトリウム、酢酸ナトリウム、トリエチルアミンが挙げられる。酸としては、例えば、硫酸、塩酸が挙げられる。 Examples of the base used in the reaction include magnesium oxide, sodium hydroxide, sodium acetate, and triethylamine. Examples of the acid include sulfuric acid and hydrochloric acid.

 該反応に用いられる触媒としては、例えば、パラジウム炭素が挙げられる。 Examples of the catalyst used in the reaction include palladium on carbon.

 該反応における、水素圧は通常1気圧から5気圧である。 In this reaction, the hydrogen pressure is usually 1 to 5 atm.

 該反応における反応時間は、通常0.1時間から24時間の範囲である。 The reaction time in the reaction is usually in the range of 0.1 to 24 hours.

 反応終了後は、ろ過によって触媒を除去した後、通常の後処理操作を行うことにより、本発明化合物(1e)を単離することができる。 After completion of the reaction, the present compound (1e) can be isolated by removing the catalyst by filtration and then performing a usual post-treatment operation.

(製造法6)
 本発明化合物のうち、Gが式G2で示される基である化合物は、例えば、下記のスキームにしたがって製造することができる。
(Production method 6)
Among the compounds of the present invention, a compound in which G is a group represented by the formula G2 can be produced, for example, according to the following scheme.

Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024

〔式中、J、L、A、Het、D、R、Lgおよびmは前記と同じ意味を表し、Rb1は、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基を表し、Rb2は、OH基の保護基(例えば、メチル基、メトキシメチル基、ベンジル基等)を表す。〕 [Wherein, J, L, A, Het, D, R b , Lg 3 and m represent the same meaning as described above, and R b1 has one or more atoms or groups selected from <Group β>. Represents an optionally substituted C1-C6 chain hydrocarbon group, and R b2 represents an OH-protecting group (for example, a methyl group, a methoxymethyl group, a benzyl group, etc.). ]

・(1f)→(1g’)
 本発明化合物(1g’)は、本発明化合物(1f)とRb1OHとを、塩基の存在下に反応させることにより製造することができる。
・ (1f) → (1g ′)
The compound (1g ′) of the present invention can be produced by reacting the compound (1f) of the present invention with R b1 OH in the presence of a base.

 該反応は、通常溶媒の存在下で行われるが、Rb1OHを溶媒量用いてもよい。 The reaction is usually performed in the presence of a solvent, but R b1 OH may be used in an amount of a solvent.

 該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等の芳香族炭化水素類、塩化メチレン、クロロホルム等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、N,N-ジメチルホルムアミド、N-メチルピロリジノン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類及びこれらの混合物が挙げられる。 Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile. Nitriles such as N, N-dimethylformamide, acid amides such as N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.

 該反応において用いられる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水素化ナトリウム、炭酸カリウム、炭酸セシウム、カリウムtert-ブトキシド等が挙げられる。 Examples of the base used in the reaction include sodium hydride, sodium hydroxide, potassium hydroxide, sodium hydride, potassium carbonate, cesium carbonate, potassium tert-butoxide and the like.

 本発明化合物(1f)1モルに対して、Rb1OHが通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。 R b1 OH is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol with respect to 1 mol of the compound (1f) of the present invention.

 該反応の反応温度は、通常0℃~溶媒の沸点の範囲であり、反応時間は通常0.1時間から24時間の範囲である。 The reaction temperature of the reaction is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is usually in the range of 0.1 to 24 hours.

 反応終了後は、反応終了後は、通常の後処理操作を行うことにより、本発明化合物(1g’)を単離することができる。 After completion of the reaction, the compound of the present invention (1g ′) can be isolated by performing a general post-treatment operation after the reaction.

・(1i)→(1h)
 本発明化合物(1h)は、本発明化合物(1i)を脱保護することにより製造することができる。
・ (1i) → (1h)
The compound (1h) of the present invention can be produced by deprotecting the compound (1i) of the present invention.

 保護基であるRb2としては、例えば、メチル基、メトキシメチル基およびベンジル基が挙げられ、当業者に公知の方法で脱保護することができる。 Examples of the protecting group R b2 include a methyl group, a methoxymethyl group, and a benzyl group, which can be deprotected by methods known to those skilled in the art.

・(1h)→(1g)
 本発明化合物(1g)は、本発明化合物(1h)とRbLgとを、塩基の存在下に反応させることにより製造することができる。
・ (1h) → (1g)
The compound (1g) of the present invention can be produced by reacting the compound (1h) of the present invention with R b Lg 3 in the presence of a base.

 該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等の芳香族炭化水素類、塩化メチレン、クロロホルム等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、N,N-ジメチルホルムアミド、N-メチルピロリジノン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類及びこれらの混合物が挙げられる。 Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile. Nitriles such as N, N-dimethylformamide, acid amides such as N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.

 該反応に用いられる塩基としては、例えば水素化ナトリウム等のアルカリ金属水素化物類、炭酸カリウム、炭酸カリウム、炭酸セシウム、炭酸水素ナトリウム等の炭酸塩類等、水酸化ナトリウム、水酸化カリウム等の金属水酸化物、ピリジン、トリエチルアミン、ジイソプロピルエチルアミン等の有機塩基類、水酸化ナトリウム、水酸化カリウム、炭酸カリウム、炭酸セシウム、炭酸水素ナトリウム等が挙げられる。本発明化合物(1h)1モルに対して、塩基は通常1モル~10モルの割合で用いられる。 Examples of the base used in the reaction include alkali metal hydrides such as sodium hydride, carbonates such as potassium carbonate, potassium carbonate, cesium carbonate and sodium hydrogen carbonate, and metal water such as sodium hydroxide and potassium hydroxide. Examples thereof include oxides, organic bases such as pyridine, triethylamine, diisopropylethylamine, sodium hydroxide, potassium hydroxide, potassium carbonate, cesium carbonate, sodium hydrogen carbonate and the like. The base is generally used in a proportion of 1 mol to 10 mol with respect to 1 mol of the compound (1h) of the present invention.

 本発明化合物(1h)1モルに対して、RbLgは通常1モルの割合で用いられるが、適宜変更することができる。 Present compound (1h) with respect to 1 mole, R b Lg 3 is used usually in a proportion of 1 mole, but may be appropriately changed.

 該反応の反応温度は、通常0℃~溶媒の沸点の範囲であり、反応時間は通常0.1時間から24時間である。 The reaction temperature of the reaction is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is usually from 0.1 to 24 hours.

 反応終了後は、反応終了後は、通常の後処理操作を行うことにより、本発明化合物(1g)を単離することができる。 After completion of the reaction, the compound of the present invention (1 g) can be isolated by carrying out normal post-treatment operations after completion of the reaction.

 なお、本発明化合物(1g)は本発明化合物(1g’)を包含する。 In addition, this invention compound (1g) includes this invention compound (1g ').

(製造法7)
 本発明化合物のうち、Gが式G3で示される基である化合物は、下記のスキームにしたがって製造することができる。
(Production method 7)
Among the compounds of the present invention, a compound in which G is a group represented by the formula G3 can be produced according to the following scheme.

Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025

〔式中、J、L、A、Het、Dおよびmは前記と同じ意味を表し、Rc1は、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基を表す。〕
 本発明化合物(1j)は、本発明化合物(1f)とRc1SHとを、塩基の存在下に反応させることにより製造することができる。
[Wherein, J, L, A, Het, D and m represent the same meaning as described above, and R c1 may have one or more atoms or groups selected from <Group β>. Represents a C6 chain hydrocarbon group. ]
The compound (1j) of the present invention can be produced by reacting the compound (1f) of the present invention with R c1 SH in the presence of a base.

 該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等の芳香族炭化水素類、塩化メチレン、クロロホルム等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、N,N-ジメチルホルムアミド、N-メチルピロリジノン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類及びこれらの混合物が挙げられる。 Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile. Nitriles such as N, N-dimethylformamide, acid amides such as N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.

 該反応において用いられる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水素化ナトリウム、炭酸カリウム、炭酸セシウム、カリウムtert-ブトキシド等が挙げられる。 Examples of the base used in the reaction include sodium hydride, sodium hydroxide, potassium hydroxide, sodium hydride, potassium carbonate, cesium carbonate, potassium tert-butoxide and the like.

 本発明化合物(1f)1モルに対して、Rc1SHが通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。 R 1 C1 SH is usually used in a proportion of 1 to 10 mol and a base is usually used in a proportion of 1 to 10 mol per 1 mol of the compound (1f) of the present invention.

 該反応の反応温度は通常0℃~溶媒の沸点の範囲であり、反応時間は通常0.1時間から24時間である。 The reaction temperature of the reaction is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is usually from 0.1 to 24 hours.

 反応終了後は、通常の後処理操作を行うことにより、本発明化合物(1j)を単離することができる。 After completion of the reaction, the compound (1j) of the present invention can be isolated by performing ordinary post-treatment operations.

 この反応終了後、本発明化合物(1j)に対して、更に当業者に公知の酸化反応を行うことにより、本発明化合物(1j)における-SRc1を-S(O)z1c1(この場合、z1は1または2を表す)に変換することもできる。 After completion of this reaction, the present compound (1j) is further subjected to an oxidation reaction known to those skilled in the art to convert -SR c1 in the present compound (1j) to -S (O) z1 R c1 (in this case) , Z1 represents 1 or 2).

(製造法8)
 本発明化合物のうち、Gが式G4で示される基である化合物は、下記のスキームにしたがって製造することができる。
(Production method 8)
Among the compounds of the present invention, a compound in which G is a group represented by the formula G4 can be produced according to the following scheme.

Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026

〔式中、J、L、A、Het、D、Lg、R、Rおよびmは前記と同じ意味を表す。〕 [Wherein, J, L, A, Het, D, Lg 3 , R d , R e and m represent the same meaning as described above. ]

・(1k)→(1l)
 本発明化合物(1l)は、本発明化合物(1k)とRLgとを、塩基の存在下に反応させることにより製造することができる。
・ (1k) → (1l)
The compound (1l) of the present invention can be produced by reacting the compound (1k) of the present invention with R d Lg 3 in the presence of a base.

 該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等の芳香族炭化水素類、塩化メチレン、クロロホルム等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、N,N-ジメチルホルムアミド、N-メチルピロリジノン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類及びこれらの混合物が挙げられる。 Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile. Nitriles such as N, N-dimethylformamide, acid amides such as N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.

 該反応に用いられる塩基としては、例えば水素化ナトリウム等のアルカリ金属水素化物類、炭酸カリウム、炭酸カリウム、炭酸セシウム、炭酸水素ナトリウム等の炭酸塩類等、水酸化ナトリウム、水酸化カリウム等の金属水酸化物、ピリジン、トリエチルアミン、ジイソプロピルエチルアミン等の有機塩基類、水酸化ナトリウム、水酸化カリウム、炭酸カリウム、炭酸セシウム、炭酸水素ナトリウム等が挙げられる。本発明化合物(1k)1モルに対して、塩基は通常1モル~2モルの割合で用いられる。 Examples of the base used in the reaction include alkali metal hydrides such as sodium hydride, carbonates such as potassium carbonate, potassium carbonate, cesium carbonate and sodium hydrogen carbonate, and metal water such as sodium hydroxide and potassium hydroxide. Examples thereof include oxides, organic bases such as pyridine, triethylamine, diisopropylethylamine, sodium hydroxide, potassium hydroxide, potassium carbonate, cesium carbonate, sodium hydrogen carbonate and the like. The base is generally used in a ratio of 1 mol to 2 mol with respect to 1 mol of the compound (1k) of the present invention.

 本発明化合物(1k)1モルに対して、RLgが通常1モルの割合で用いられるが適宜変更することができる。 R e Lg 3 is usually used in a proportion of 1 mol per 1 mol of the compound (1k) of the present invention, but can be appropriately changed.

 該反応の反応温度は通常0℃~溶媒の沸点の範囲であり、反応時間は通常0.1時間から24時間の範囲である。 The reaction temperature of the reaction is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is usually in the range of 0.1 to 24 hours.

 反応終了後は、通常の後処理操作を行うことにより、本発明化合物(1l)を単離することができる。 After completion of the reaction, the compound of the present invention (1l) can be isolated by carrying out ordinary post-treatment operations.

・(1l)→(1m)
 さらに、本発明化合物(1l)に対して、上記に準じる方法でRLgを反応させることにより、本発明化合物(1m)を製造することができる。
・ (1l) → (1m)
Further, with respect to the present invention the compound (1l), by reacting R e Lg 2 is prepared by an analogous procedure to the above, it can be produced the present invention compound (1 m).

 また、RまたはRが1級または2級アルキル基である場合には、上記の方法に代えて、本発明化合物(1k)または本発明化合物(1l)と、アルデヒドまたはケトン化合物とを還元剤の存在下反応させることにより、本発明化合物(1l)または本発明化合物(1m)を製造することもできる。 When R d or R e is a primary or secondary alkyl group, the present compound (1k) or the present compound (1l) is reduced with an aldehyde or a ketone compound instead of the above method. This invention compound (1l) or this invention compound (1m) can also be manufactured by making it react in presence of an agent.

 該反応に用いられる還元剤としては、例えば、トリアセトキシ水素化ホウ素ナトリウムが挙げられる。本発明化合物(1k)または本発明化合物(1l)1モルに対して、トリアセトキシ水素化ホウ素ナトリウムは1~5モルの割合で用いられる。 Examples of the reducing agent used in the reaction include sodium triacetoxyborohydride. Sodium triacetoxyborohydride is used in a ratio of 1 to 5 moles with respect to 1 mole of the compound (1k) or the compound (1l) of the present invention.

 該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等の芳香族炭化水素類、ジクロロメタン、クロロホルム等のハロゲン化炭化水素類及びこれらの混合物が挙げられる。また、必要に応じて酢酸等のカルボン酸類を加えて反応を行う。 Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as dichloromethane and chloroform, and the like. A mixture is mentioned. Moreover, it reacts by adding carboxylic acids, such as an acetic acid, as needed.

 本発明化合物(1k)または本発明化合物(1l)1モルに対して、アルデヒドまたはケトン化合物は通常1モルの割合で用いられるが適宜変更することができる。 The aldehyde or ketone compound is usually used at a ratio of 1 mole per 1 mole of the compound (1k) or the compound (1l) of the present invention, but can be appropriately changed.

 該反応の反応温度は通常0℃~溶媒の沸点の範囲であり、反応時間は通常0.1時間から24時間の範囲である。 The reaction temperature of the reaction is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is usually in the range of 0.1 to 24 hours.

 反応終了後は、通常の後処理操作を行うことにより、本発明化合物(1l)または本発明化合物(1m)を単離することができる。 After completion of the reaction, the compound of the present invention (1l) or the compound of the present invention (1m) can be isolated by performing ordinary post-treatment operations.

(製造法9)
 本発明化合物のうち、mが1である化合物は、下記のスキームにしたがって製造することができる。
(Production method 9)
Among the compounds of the present invention, a compound in which m is 1 can be produced according to the following scheme.

Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027

〔式中、J、L、A、Het、DおよびGは前記と同じ意味を表す。〕
 本発明化合物(1o)は、式(1n)で示されるピリジン化合物を酸化剤と反応させることにより製造することができる。
[Wherein, J, L, A, Het, D and G represent the same meaning as described above. ]
The compound (1o) of the present invention can be produced by reacting the pyridine compound represented by the formula (1n) with an oxidizing agent.

 該反応は、通常溶媒の存在下で行われる。 The reaction is usually performed in the presence of a solvent.

 該反応に用いられる溶媒としては、例えば塩化メチレン、クロロホルム等のハロゲン化炭化水素類、酢酸、水及びこれらの混合物が挙げられる。 Examples of the solvent used in the reaction include halogenated hydrocarbons such as methylene chloride and chloroform, acetic acid, water, and mixtures thereof.

 該反応に用いられる酸化剤としては、例えば3-クロロ過安息香酸等のカルボン酸の過酸化物、過酸化水素水等が挙げられる。 Examples of the oxidizing agent used in the reaction include peroxides of carboxylic acids such as 3-chloroperbenzoic acid, hydrogen peroxide water, and the like.

 化合物(1n)1モルに対して、酸化剤が通常1~3モルの割合で用いられる。 The oxidizing agent is usually used at a ratio of 1 to 3 moles with respect to 1 mole of the compound (1n).

 該反応の反応温度は、通常-20~100℃の範囲であり、反応時間は通常0.1時間から24時間の範囲である。 The reaction temperature of the reaction is usually in the range of −20 to 100 ° C., and the reaction time is usually in the range of 0.1 to 24 hours.

 反応終了後は、通常の後処理操作を行うことにより、本発明化合物(1o)を単離することができる。 After completion of the reaction, the compound (1o) of the present invention can be isolated by carrying out ordinary post-treatment operations.

 本活性化合物の製造に用いる中間体の一部は、市販されているか、公知の文献等に開示のある化合物である。本発明の中間体は例えば下記の方法により製造することができる。 Some of the intermediates used in the production of the active compound are commercially available or disclosed in known literature. The intermediate of the present invention can be produced, for example, by the following method.

(中間体製造法1)
 本発明化合物のうち、Hetが式H4で示される基であり、Z、ZおよびZが-CE=である化合物の中間体(4a)は、例えば、下記のスキームにしたがって製造することができる。
(Intermediate production method 1)
Among the compounds of the present invention, Het is a group represented by the formula H4, and an intermediate (4a) of a compound in which Z 1 , Z 2 and Z 3 are —CE 1 ═ is produced, for example, according to the following scheme be able to.

Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028

〔式中、D、G、Eおよびmは前記と同じ意味を表す。〕
 化合物(4a)は化合物(15)とパラトルエンスルホニルイソシアニド化合物(16)とを、塩基の存在下に反応させることにより製造することができる。
[Wherein, D, G, E 1 and m represent the same meaning as described above. ]
Compound (4a) can be produced by reacting compound (15) with p-toluenesulfonyl isocyanide compound (16) in the presence of a base.

 該反応は、通常溶媒の存在下で行われ、該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等芳香族炭化水素類、塩化メチレン、クロロホルム等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、N,N-ジメチルホルムアミド、N-メチルピロリジノン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類及びこれらの混合物が挙げられる。 The reaction is usually carried out in the presence of a solvent. Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, chlorides, and the like. Examples thereof include halogenated hydrocarbons such as methylene and chloroform, nitriles such as acetonitrile, acid amides such as N, N-dimethylformamide and N-methylpyrrolidinone, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.

 該反応において用いられる塩基としては、水素化ナトリウム、ナトリウムtert-ブトキシド、カリウムtert-ブトキシド、1,8-ジアザビシクロ[5,4,0]ウンデカ-7-エン、n-ブチルリチウム等が挙げられる。化合物(15)に対して、塩基は通常1モルから10モルの割合で用いられる。 Examples of the base used in the reaction include sodium hydride, sodium tert-butoxide, potassium tert-butoxide, 1,8-diazabicyclo [5,4,0] undec-7-ene, n-butyllithium and the like. The base is usually used in a proportion of 1 mol to 10 mol with respect to compound (15).

 該反応は必要に応じて添加剤(例えばリチウムブロミド等の金属塩)の存在下に行うことができる。 The reaction can be performed in the presence of an additive (for example, a metal salt such as lithium bromide) as necessary.

 化合物(15)1モルに対してパラトルエンスルホニルイソシアニド化合物(16)は通常1モルの割合で用いられるが、適宜変更することができる。 The paratoluenesulfonyl isocyanide compound (16) is usually used at a ratio of 1 mole per 1 mole of the compound (15), but can be changed as appropriate.

 化合物(15)と化合物(16)との反応における反応温度は通常-78℃から30℃の範囲であり、反応時間は0.1時間から24時間の範囲である。 The reaction temperature in the reaction of the compound (15) and the compound (16) is usually in the range of −78 ° C. to 30 ° C., and the reaction time is in the range of 0.1 hour to 24 hours.

 反応終了後は、通常の後処理操作を行うことにより、化合物(4a)を単離することができる。 After completion of the reaction, the compound (4a) can be isolated by performing a normal post-treatment operation.

(中間体製造法2)
 本発明化合物のうち、Hetが式H4で示される基であり、Zが-N=であり、ZおよびZが-CE=である化合物の中間体(4b)は、例えば、下記のスキームにしたがって製造することができる。
(Intermediate production method 2)
Among the compounds of the present invention, Het is a group represented by the formula H4, Z 1 is -N =, Z 2 and Z 3 are -CE 1 =, and the intermediate (4b) of the compound is, for example, It can be produced according to the scheme of

Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029

〔式中、D、G、Eおよびmは前記と同じ意味を表し、Rは、C1-C6のアルキル基を表し、Rは同一でも相異なっていてもよい。〕 [Wherein, D, G, E 1 and m represent the same meaning as described above, R h represents a C1-C6 alkyl group, and R h may be the same or different. ]

・(17)→(19)
 化合物(19)は化合物(17)と化合物(18)を反応させることにより製造することができる。
・ (17) → (19)
Compound (19) can be produced by reacting compound (17) with compound (18).

 該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等芳香族炭化水素類、塩化メチレン、クロロホルム等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、N,N-ジメチルホルムアミド、N-メチルピロリジノン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類及びこれらの混合物が挙げられる。また溶媒を使用せずに、式(18)で表されるアセタール化合物を過剰量用いて反応させることもできる。その使用量は、化合物(17)1モルに対して通常1.0モルから10モルの範囲で使用される。 Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile, and the like. Nitriles, N, N-dimethylformamide, acid amides such as N-methylpyrrolidinone, sulfoxides such as dimethylsulfoxide, and mixtures thereof. Moreover, it can also be made to react by using an acetal compound represented by Formula (18) in excess without using a solvent. The amount thereof to be used is generally in the range of 1.0 mol to 10 mol with respect to 1 mol of compound (17).

 化合物(17)と化合物(18)との反応における反応温度は通常0℃から溶媒の沸点の範囲であり、反応時間は0.1時間から24時間の範囲である。 The reaction temperature in the reaction of the compound (17) and the compound (18) is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.

 反応終了後は、通常の後処理操作をすることにより、化合物(19)を単離することができる。 After completion of the reaction, the compound (19) can be isolated by ordinary post-treatment operations.

・(19)→(4b)
 化合物(4b)は化合物(19)とヒドラジンを反応させることにより製造することができる。
・ (19) → (4b)
Compound (4b) can be produced by reacting compound (19) with hydrazine.

 該反応に用いられる溶媒としては、例えばテトラヒドロフラン、エチレングリコールジメチルエーテル、1,4-ジオキサンなどのエーテル類、トルエン、キシレン等芳香族炭化水素類、塩化メチレン、クロロホルム等のハロゲン化炭化水素類、アセトニトリル等のニトリル類、ジメチルスルホキシド等のスルホキシド類及びこれらの混合物が挙げられる。 Examples of the solvent used in the reaction include ethers such as tetrahydrofuran, ethylene glycol dimethyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, acetonitrile, and the like. Nitriles, sulfoxides such as dimethyl sulfoxide, and mixtures thereof.

 化合物(19)1モルに対してヒドラジンは通常1モルの割合で用いられるが、適宜変更することができる。 Hydrazine is usually used in a ratio of 1 mol per 1 mol of compound (19), but can be changed as appropriate.

 化合物(19)とヒドラジンとの反応における反応温度は通常0℃から溶媒の沸点の範囲であり、反応時間は0.1時間から24時間の範囲である。 The reaction temperature in the reaction of the compound (19) with hydrazine is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.

 反応終了後は、通常の後処理操作をすることにより、化合物(4b)を単離することができる。 After completion of the reaction, the compound (4b) can be isolated by carrying out a normal post-treatment operation.

(中間体製造法3)
 本発明化合物のうち、Hetが式H4で示される基であり、ZおよびZが-CE=、Zが-N=である化合物の中間体(4c)は、例えば、下記のスキームにしたがって製造することができる。
(Intermediate production method 3)
Among the compounds of the present invention, an intermediate (4c) of a compound in which Het is a group represented by the formula H4, Z 1 and Z 3 are —CE 1 ═, and Z 2 is —N═ is, for example, the following scheme Can be manufactured according to

Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030

〔式中、D、G、Eおよびmは前記と同じ意味を表す。〕 [Wherein, D, G, E 1 and m represent the same meaning as described above. ]

・(4c)の製造
 化合物(4c)は中間体製造法2に記載した化合物(19)から化合物(4b)の製造方法あるいはそれに準じた方法で製造できる。
-Production of (4c) Compound (4c) can be produced from compound (19) described in Intermediate Production Method 2 by the production method of compound (4b) or a method analogous thereto.

(中間体製造法4)
 本発明化合物のうち、Hetが式H4で示される基であり、Z、ZおよびZが-N=である化合物の中間体(4e)は、例えば、下記のスキームにしたがって製造することができる。
(Intermediate production method 4)
Among the compounds of the present invention, an intermediate (4e) of a compound in which Het is a group represented by the formula H4 and Z 1 , Z 2 and Z 3 are —N═ can be produced, for example, according to the following scheme Can do.

Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031

〔式中、D、G、E、Rおよびmは前記と同じ意味を表す。〕 [Wherein, D, G, E 1 , R j and m represent the same meaning as described above. ]

・(21)→(18)
 該反応は中間体製造法2に記載した化合物(17)から化合物(18)の製造方法あるいはそれに準じた方法で製造できる。
・ (21) → (18)
This reaction can be produced by the production method of compound (18) from compound (17) described in Intermediate production method 2 or a method analogous thereto.

・(22)→(4e)
 化合物(4e)は化合物(22)とヒドラジンを反応させることにより製造することができる。
・ (22) → (4e)
Compound (4e) can be produced by reacting compound (22) with hydrazine.

 該反応に用いられる溶媒としては、例えば酢酸が挙げられる。 Examples of the solvent used in the reaction include acetic acid.

 化合物(22)1モルに対してヒドラジン化合物は通常1モルの割合で用いられるが、適宜変更することができる。 The hydrazine compound is usually used at a ratio of 1 mole per 1 mole of the compound (22), but can be appropriately changed.

 化合物(22)とヒドラジン化合物との反応における反応温度は通常0℃から溶媒の沸点の範囲であり、反応時間は0.1時間から24時間の範囲である。 The reaction temperature in the reaction between the compound (22) and the hydrazine compound is usually in the range of 0 ° C. to the boiling point of the solvent, and the reaction time is in the range of 0.1 to 24 hours.

 反応終了後は、通常の後処理操作をすることにより、化合物(4e)を単離することができる。 After completion of the reaction, the compound (4e) can be isolated by ordinary post-treatment operations.

 本発明化合物中には、例えば塩酸塩、硝酸塩、硫酸塩、臭化水素酸塩、リン酸塩、炭酸塩、酢酸塩、乳酸塩、クエン酸塩などの酸付加塩を形成させ得る化合物も存在する。それらの酸付加塩の製造も常法に従うことができ、本発明はこれらの酸付加塩をも包含する。 Among the compounds of the present invention, there are also compounds capable of forming acid addition salts such as hydrochloride, nitrate, sulfate, hydrobromide, phosphate, carbonate, acetate, lactate, citrate, etc. To do. The production of these acid addition salts can also follow conventional methods, and the present invention also includes these acid addition salts.

 本発明化合物が効力を有する有害生物としては、例えば、有害昆虫類や有害ダニ類等の有害節足動物、線形動物及び軟体動物が挙げられる。かかる有害生物としては、具体的には、例えば、以下のものが挙げられる。 Examples of pests for which the compounds of the present invention are effective include harmful arthropods such as harmful insects and harmful mites, linear animals and molluscs. Specific examples of such pests include the following.

 半翅目害虫:ヒメトビウンカ(Laodelphax striatellus)、トビイロウンカ(Nilaparvata lugens)、セジロウンカ(Sogatella furcifera)等のウンカ類、ツマグロヨコバイ(Nephotettix cincticeps)、タイワンツマグロヨコバイ(Nephotettix virescens)、チャノミドリヒメヨコバイ(Empoasca onukii)等のヨコバイ類、ワタアブラムシ(Aphis gossypii)、モモアカアブラムシ(Myzus persicae)、ダイコンアブラムシ(Brevicoryne brassicae)、ユキヤナギアブラムシ(Aphis spiraecola)、チューリップヒゲナガアブラムシ(Macrosiphum euphorbiae)、ジャガイモヒゲナガアブラムシ(Aulacorthum solani)、ムギクビレアブラムシ(Rhopalosiphum  padi)、ミカンクロアブラムシ(Toxoptera citricidus)、モモコフキアブラムシ(Hyalopterus pruni)等のアブラムシ類、アオクサカメムシ(Nezara antennata)、ホソヘリカメムシ(Riptortus clavetus)、クモヘリカメムシ(Leptocorisa  chinensis)、トゲシラホシカメムシ(Eysarcoris parvus)、クサギカメムシ(Halyomorpha mista)等のカメムシ類、オンシツコナジラミ(Trialeurodes vaporariorum)、タバココナジラミ(Bemisia tabaci)、ミカンコナジラミ(Dialeurodes citri)、ミカントゲコナジラミ(Aleurocanthus spiniferus)等のコナジラミ類、アカマルカイガラムシ(Aonidiella aurantii)、サンホーゼカイガラムシ(Comstockaspis perniciosa)、シトラススノースケール(Unaspis citri)、ルビーロウムシ(Ceroplastes rubens)、イセリヤカイガラムシ(Icerya purchasi)、フジコナカイガラムシ(Planococcus kraunhiae)、クワコナカイガラムシ(Pseudococcus longispinis)、クワシロカイガラムシ(Pseudaulacaspis pentagona)等のカイガラムシ類、グンバイムシ類、トコジラミ(Cimex lectularius)等のトコジラミ類、及びキジラミ類等。 Hemiptera: small brown planthopper (Laodelphax striatellus), brown planthopper (Nilaparvata lugens), planthoppers such as Sejirounka (Sogatella furcifera), green rice leafhopper (Nephotettix cincticeps), Taiwan green rice leafhopper (Nephotettix virescens), tea Roh green leafhopper (Empoasca onukii) such as Leafhoppers, cotton aphids (Aphis gossypi), peach aphids (Myzus persicae), radish aphids (Brevicorine brassicae), aphid spiraecola, tulip beetle aphids (Macrosiphum euphorbiae), potato beetle aphids (Aulacorthum solani), wheat beetle aphids (Rhopalosiphum pasid), citrus aphids (Topoptera citricidus), peach beetles Helmet beetle (Riptortus clavetus), spider helicopter (Leptocorisa chinensis), spider beetle (Eysarcoris parvus), winged beetle (Halyomorpha misista), and the like rodes vaporariorum), sweetpotato whitefly (Bemisia tabaci), mandarin orange whitefly (Dialeurodes citri), whiteflies such as mandarin orange spiny whitefly (Aleurocanthus spiniferus), Acamar scale insects (Aonidiella aurantii), Sanho zero scale insects (Comstockaspis perniciosa), citrus snow scale (Unaspis citri), Ruby Roe beetle (Ceroplastes rubens), Iceria scale insect (Icerya purchasi), Fujino scale insect (Pranococcus kraunhiae), Swan scale scale (Pseudococcus long) ispinis), scale insects such as Pseudouracapis pentagona, bedbugs, bed bugs such as Chime lectularius, and whales.

 鱗翅目害虫:ニカメイガ(Chilo suppressalis)、サンカメイガ(Tryporyza incertulas)、コブノメイガ(Cnaphalocrocis medinalis)、ワタノメイガ(Notarcha derogata)、ノシメマダラメイガ(Plodia interpunctella)、アワノメイガ(Ostrinia furnacalis)、ハイマダラノメイガ(Hellula undalis)、シバツトガ(Pediasia teterrellus)等のメイガ類、ハスモンヨトウ(Spodoptera litura)、シロイチモジヨトウ(Spodoptera exigua)、アワヨトウ(Pseudaletia separata)、ヨトウガ(Mamestra  brassicae)、タマナヤガ(Agrotis ipsilon),タマナギンウワバ(Plusia  nigrisigna),トリコプルシア属、ヘリオティス属、ヘリコベルパ属等のヤガ類、モンシロチョウ(Pieris rapae)等のシロチョウ類、アドキソフィエス属、ナシヒメシンクイ(Grapholita molesta)、マメシンクイガ(Leguminivora glycinivorella),アズキサヤムシガ(Matsumuraeses azukivora)、リンゴコカクモンハマキ(Adoxophyes orana fasciata)、チャノコカクモンハマキ(Adoxophyes honmai.)、チャハマキ(Homona magnanima)、ミダレカクモンハマキ(Archips fuscocupreanus)、コドリンガ(Cydia pomonella)等のハマキガ類、チャノホソガ(Caloptilia theivora)、キンモンホソガ(Phyllonorycter ringoneella)のホソガ類、モモシンクイガ(Carposina niponensis)等のシンクイガ類、リオネティア属等のハモグリガ類、リマントリア属、ユープロクティス属等のドクガ類、コナガ(Plutella xylostella)等のスガ類、ワタアカミムシ(Pectinophora gossypiella)ジャガイモガ(Phthorimaea operculella)等のキバガ類、アメリカシロヒトリ(Hyphantria cunea)等のヒトリガ類、及びイガ(Tinea translucens)、コイガ(Tineola bisselliella)等のヒロズコガ類等。 Lepidoptera: rice stem borer (Chilo suppressalis), Sankameiga (Tryporyza incertulas), leaf roller (Cnaphalocrocis medinalis), Watanomeiga (Notarcha derogata), Indian meal moth (Plodia interpunctella), the European corn borer (Ostrinia furnacalis), high Madara Roh moth (Hellula undalis), Common moths such as Shibatatsuga (Pediasia teterrellus), Lotus moth (Spodoptera litura), Spodoptera exigua, Ayuyotoga (Pseudaletia separata), Yotoga Mestra brassicae, Agrotis ipsilon, Tamanagine waiba (Prusia nigrisigna), Trichopulsia, Heliotis, Helicoberpas, etc .; (Leguminivora glycinivolora), Azusa yamashiga (Matsumuraeses azukivorora), apple wolfberry (Adoxophyes orana fasciata), chanokokumon hamakihaki (Adohomocha maki). a), Japanese horseshoe moths (Archips fuscocuppreanus), codling moths (Cydia pomonella), etc .; Anopheles, Limantria, Euproctinis, etc., Suga, such as Plutella xylostella, Peptinophora gossypiella, Phthorimaea, Olycelli, H. Hitrigues such as ria cunea, and Hirokosukoga such as iga (Tinea translucens) and koiga (Tineola bisselliella).

 アザミウマ目害虫:ミカンキイロアザミウマ(Frankliniella occidentalis)、ミナミキイロアザミウマ(Thrips parmi)、チャノキイロアザミウマ(Scirtothrips dorsalis)、ネギアザミウマ(Thrips tabaci)、ヒラズハナアザミウマ(Frankliniella intonsa)などのアザミウマ類等。 Thrips of the order Thrips thrips, Sriptotrips dorsalis, Sriptorips dorsalis

 双翅目害虫:アカイエカ(Culex pipiens pallens)、コガタアカイエカ(Culex tritaeniorhynchus)、ネッタイイエカ(Culex quinquefasciatus)等のイエカ類、ネッタイシマカ(Aedes aegypti)、ヒトスジシマカ(Aedes albopictus)等のエーデス属、シナハマダラカ(Anopheles sinensis)等のアノフェレス属、ユスリカ類、イエバエ(Musca domestica)、オオイエバエ(Muscina stabulans)等のイエバエ類、クロバエ類、ニクバエ類、ヒメイエバエ類、タネバエ(Delia platura)、タマネギバエ(Delia antiqua)等のハナバエ類、イネハモグリバエ(Agromyza oryzae)、イネヒメハモグリバエ(Hydrellia griseola)、トマトハモグリバエ、(Liriomyza sativae)、マメハモグリバエ(Liriomyza trifolii)、ナモグリバエ(Chromatomyia horticola)等のハモグリバエ類、イネキモグリバエ(Chlorops oryzae)等のキモグリバエ類、ウリミバエ(Dacus cucurbitae)、チチュウカイミバエ(Ceratitis capitata)等のミバエ類、ショウジョウバエ類、オオキモンノミバエ(Megaselia spiracularis)等のノミバエ類、オオチョウバエ(Clogmia albipunctata)等のチョウバエ類、ブユ類、ウシアブ(Tabanus trigonus)等のアブ類、及びサシバエ類等。 Diptera: Culex (Culex pipiens pallens), Culex (Culex tritaeniorhynchus), Culex such as Culex quinquefasciatus (Culex quinquefasciatus), Aedes aegypti (Aedes aegypti), Aedes albopictus (Aedes albopictus) Aedes genus such as Anopheles sinensis (Anopheles sinensis), etc. Genus Anopheles, chironomid, housefly (Musca domestica), housefly (Muscina stabulans), etc. Moguribae (Agromyza oryzae), rice Hime leafminer (Hydrellia griseola), tomato leafminer, (Liriomyza sativae), legume leafminer (Liriomyza trifolii), leafminer such as the pea (Chromatomyia horticola), chloropidae such as Inekimoguribae (Chlorops oryzae), melon fly (Dacus cucurbitae), fruit flies such as Ceratitis capitata, fruit flies such as Drosophila, fleas such as Megaselia spiracularis, Clogmial etc. Flies such, blackfly acids, Abu such as gadfly (Tabanus trigonus), and stable flies and the like.

 鞘翅目害虫:ウエスタンコーンルートワーム(Diabrotica virgifera virgifera)、サザンコーンルートワーム(Diabrotica undecimpunctata howardi)等のコーンルートワーム類、ドウガネブイブイ(Anomala cuprea)、ヒメコガネ(Anomala rufocuprea)、マメコガネ(Popillia japonica)等のコガネムシ類、メイズウィービル(Sitophilus zeamais)、イネミズゾウムシ(Lissorhoptrus oryzophilus)、アズキゾウムシ(Callosobruchuys chienensis)、イネゾウムシ(Echinocnemus squameus)、ワタミゾウムシ(Anthonomus grandis)、シバオサゾウムシ(Sphenophorus venatus)等のゾウムシ類、チャイロコメノゴミムシダマシ(Tenebrio molitor)、コクヌストモドキ(Tribolium castaneum)等のゴミムシダマシ類、イネドロオイムシ(Oulema oryzae)、ウリハムシ(Aulacophora femoralis)、キスジノミハムシ(Phyllotreta striolata)、コロラドハムシ(Leptinotarsa decemlineata)等のハムシ類、ヒメマルカツオブシムシ(Anthrenus verbasci)、ハラジロカツオブシムシ(Dermestes maculates)等のカツオブシムシ類、タバコシバンムシ(Lasioderma serricorne)等のシバンムシ類、ニジュウヤホシテントウ(Epilachna vigintioctopunctata)等のエピラクナ類、ヒラタキクイムシ(Lyctus brunneus)、マツノキクイムシ(Tomicus piniperda)等のキクイムシ類、ナガシンクイムシ類、ヒョウホンムシ類、ゴマダラカミキリ(Anoplophora malasiaca)等のカミキリムシ類、コメツキムシ類(Agriotes spp.)、及びアオバアリガタハネカクシ(Paederus fuscipes)等。 Coleoptera pests: Western Corn Rootworm (Diabrotica virgifera virgifera), corn rootworm such as southern corn rootworm (Diabrotica undecimpunctata howardi), cupreous chafer (Anomala cuprea), rufocuprea (Anomala rufocuprea), chafers such as Japanese beetle (Popillia japonica) , Maizeweville (Sitophilus zeamais), Rice weevil (Lissohoptrus oryzophilus), Azuki weevil (Callosobrchuchus chiensis), Rice weevil (Echinocnemus squatius) Weevil (Anthonomus grandis), Weevil weevil (Sphenophorus venatus) and other weevil, Tenebrio molitor, Aureum oleume olium (Olymoidum) Leaf beetles such as Phyllotreta striola, Colorado potato beetle (Leptinotarsa decemlineata), Japanese beetle ant beetle (Anthrenus versaci), Dermatodes sulculates, etc. Shimushi, Shibamushi (Lasiderma serricorne), etc .; Japanese beetles, longicorn beetles such as Anophorora malasiaca, click beetles (Agriotes spp.), And long-horned beetle (Paederus fuscipes).

 直翅目害虫:トノサマバッタ(Locusta migratoria)、ケラ(Gryllotalpa africana)、コバネイナゴ(Oxya yezoensis)、ハネナガイナゴ(Oxya japonica)、及びコオロギ類等。 Pterodoptera: Tocusama grasshopper (Locusta migratoria), Kera (Gryllotalpa africana), Oxya yezoensis, Oyana japonica, Oroja japonica, etc.

 隠翅目害虫:ネコノミ(Ctenocephalides felis)、イヌノミ(Ctenocephalides canis)、ヒトノミ(Pulex irritans)、ケオプスネズミノミ(Xenopsylla cheopis)等。 Insect pests: cat fleas (Ctenocephalides felis), dog fleas (Ctenocephalides canis), human fleas (Pulex irritans), keops mouse fleas (Xenopsilla cheopes) and the like.

 シラミ目害虫:コロモジラミ(Pediculus humanus corporis)、ケジラミ (Phthirus pubis)、ウシジラミ(Haematopinus eurysternus)、ヒツジジラミ(Dalmalinia ovis)、ブタジラミ(Haematopinus suis)等。 Lice insect pests: Japanese lice (Pediculus humnus corporis), pheasants (Phythrus pubis), cattle lice (Haematopinus eurysternus), sheep lice (Dalmalinia ostois aus pis)

 膜翅目害虫: イエヒメアリ(Monomorium pharaosis)、クロヤマアリ(Formica fusca japonica)、ルリアリ(Ochetellus glaber)、アミメアリ(Pristomyrmex pungens)、オオズアリ(Pheidole noda)、ハキリアリ(Acromyrmex spp.)、ファイヤーアント(Solenopsis spp.)等のアリ類、スズメバチ類、アリガタバチ類、カブラハバチ(Athalia rosae)、ニホンカブラバチ(Athalia japonica)等のハバチ類等。 Hymenoptera: Monomorium phalaosis, Black sea ants (Formica fusca japonica), Luriari (Ochtellus puns), Pstomyrex puns, Pseudorme spr. Such as ants, hornets, hornets, bees (Athalia rosae), Japanese bees (Athalia japonica), and the like.

 ゴキブリ目害虫:チャバネゴキブリ(Blattella germanica)、クロゴキブリ(Periplaneta fuliginosa)、ワモンゴキブリ(Periplaneta americana)、トビイロゴキブリ(Periplaneta brunnea)、トウヨウゴキブリ(Blatta orientalis)等。 Cockroach eye pests: German cockroaches (Blatella germanica), Black cockroaches (Periplaneta fuliginosa), Cockroach cockroach (Periplaneta americana), Japanese cockroach (Peripraneta bruna)

 シロアリ目害虫:ヤマトシロアリ(Reticulitermes speratus)、イエシロアリ(Coptotermes formosanus)、アメリカカンザイシロアリ(Incisitermes minor)、ダイコクシロアリ(Cryptotermes domesticus)、タイワンシロアリ(Odontotermes formosanus)、コウシュンシロアリ(Neotermes koshunensis)、サツマシロアリ(Glyptotermes satsumensis)、ナカジマシロアリ(Glyptotermes nakajimai)、カタンシロアリ(Glyptotermes fuscus)、コダマシロアリ(Glyptotermes kodamai)、クシモトシロアリ(Glyptotermes kushimensis)、オオシロアリ(Hodotermopsis japonica)、コウシュウイエシロアリ(Coptotermes guangzhoensis)、アマミシロアリ(Reticulitermes miyatakei)、キアシシロアリ(Reticulitermes flaviceps amamianus)、カンモンシロアリ(Reticulitermes sp.)、タカサゴシロアリ(Nasutitermes takasagoensis)、ニトベシロアリ(Pericapritermes nitobei)、ムシャシロアリ(Sinocapritermes mushae)、Reticuliterumes flavipes、Reticulitermes hesperus、Reticulitermes virginicus、Reticulitermes tibialis、Heterotermes aureus、Zootermopsis nevadensis等。 Termite pests: Yamato termites (Reticulitermes supertus), Japanese termites (Coptothermes formosanus), American white termites (Incitermes minors), Cyptotermes domesticus, Glypoptermes satsumensis, Gyptotermes nakajimai, Caterpillars (Glyptotermes fuscus), Termites (Glypoptermes kodamai), Shimotoshiroari (Glyptotermes kushimensis), giant termite (Hodotermopsis japonica), Kou Shu Ye termite (Coptotermes guangzhoensis), Amami termites (Reticulitermes miyatakei), R. flavipes (Reticulitermes flaviceps amamianus), Kang Mont termites (Reticulitermes sp.), Takasago termite (Nasutitermes takasagoensis ), Termites termites (Pericapritermes nitobei), termites termites (Sinocapriters mushae), Reticulitermes fl ipes, Reticulitermes hesperus, Reticulitermes virginicus, Reticulitermes tibialis, Heterotermes aureus, Zootermopsis nevadensis or the like.

 ダニ目害虫:ナミハダニ(Tetranychus urticae)、カンザワハダニ(Tetranychus kanzawai)、ミカンハダニ(Panonychus citri)リンゴハダニ(Panonychus ulmi)、オリゴニカス属等のハダニ類、ミカンサビダニ(Aculops pelekassi)、リュウキュウミカンサビダニ(Phyllocoptruta citri)、トマトサビダニ(Aculops lycopersici)、チャノサビダニ(Calacarus carinatus)、チャノナガサビダニ(Acaphylla theavagrans)、ニセナシサビダニ(Eriophyes chibaensis)、リンゴサビダニ(Aculus schlechtendali)等のフシダニ類、チャノホコリダニ(Polyphagotarsonemus latus)等のホコリダニ類、ミナミヒメハダニ(Brevipalpus phoenicis)等のヒメハダニ類、ケナガハダニ類、フタトゲチマダニ(Haemaphysalis longicornis)、ヤマトチマダニ(Haemaphysalis flava)、タイワンカクマダニ(Dermacentor taiwanicus)、ヤマトマダニ(Ixodes ovatus)、シュルツマダニ(Ixodes persulcatus)、ブラックレッグドチック(Ixodes scapularis)、オウシマダニ(Boophilus microplus)、クリイロコイタマダニ(Rhipicephalus sanguineus)等のマダニ類、ケナガコナダニ(Tyrophagus putrescentiae)、ホウレンソウケナガコナダニ(Tyrophagus similis)等のコナダニ類、コナヒョウヒダニ(Dermatophagoides farinae)、ヤケヒョウヒダニ(Dermatophagoides ptrenyssnus)等のヒョウヒダニ類、ホソツメダニ(Cheyletus eruditus)、クワガタツメダニ(Cheyletus malaccensis)、ミナミツメダニ(Cheyletus moorei)等のツメダニ類、イエダニ(Ornithonyssus bacoti)、トリサシダニ(Ornithonyssus sylvairum)、ワクモ(Dermanyssus gallinae)等のワクモ類、アオツツガムシ(Leptotrombidium akamushi)等のツツガムシ類、及びカバキコマチグモ(Chiracanthium japonicum)、セアカゴケグモ(Latrodectus hasseltii)等のクモ類等。 Mite order pests: Tick spider mites (Tetranychus urticae), Tick spider mites (Tetranychus kanzawai), citrus spider mite (Pananychus citri), mite spider mite (Panthonychus ulmi), prickly mite pistols, citrus urticae Tomato rust mites (Aculops lycopersici), Chanosabi mites (Calacarus carinatus), Chanogasabi mite (Acaphylla theevagrans), Green rust mites (Eriophyses chibaensis), Apple scab mites Achulus schizus endali) Fushidani such as, dust mite such as Chanohokoridani (Polyphagotarsonemus latus), southern Hime Himehadani such as spider mites (Brevipalpus phoenicis), Kenagahadani such, longicornis (Haemaphysalis longicornis), Yamatochimadani (Haemaphysalis flava), Taiwan Kaku ticks (Dermacentor taiwanicus ), Tick ticks (Ixodes ovatus), Tick ticks (Ixodes persulcatus), Black legged ticks (Ixodes scapularis), Boophilus microplus, Rhipic mite (Rhipic) phalus sanguineus) ticks such as, Tyrophagus (Tyrophagus putrescentiae), grain mites such as Tyrophagus (Tyrophagus similis), farinae (Dermatophagoides farinae), house dust mite such as pteronyssinus (Dermatophagoides ptrenyssnus), Hosotsumedani (Cheyletus eruditus), Stag Tsumedani ( Tilet mites, such as Cheyletus malaccensis, and Mite thorny (Cheyletus moorei), house dust mite (Ornithonysus bacoti), bird mite (Ornithonysus sylvairum) , Cucumbers such as Dermanysusus gallinae, tsutsugamushi such as Leptotropidum akamushi, and Chiracantium japonicum etc.

 唇脚綱類:ゲジ(Thereuonema hilgendorfi)、トビズムカデ(Scolopendra subspinipes)等。 Lip limb class: Geji (Thereunema hilgendorfi), Tobizukade (Scorpendra subspinipes), etc.

 倍脚綱類:ヤケヤスデ(Oxidus gracilis)、アカヤスデ(Nedyopus tambanus)等。 Double-legged class: Oxidus gracilis, Nadeyopus tambanus, etc.

 等脚目類:オカダンゴムシ(Armadillidium vulgare)等。 Isopods: Armadillium vulgare, etc.

 腹足綱類:チャコウラナメクジ(Limax marginatus)、キイロコウラナメクジ(Limax flavus)等。 Gastropods: Limax marginatus, Limax flavus, etc.

 線虫類:イネシンガレセンチュウ(Aphelenchoides besseyi)、イチゴメセンチュウ(Nothotylenchus acris)、サツマイモネコブセンチュウ(Meloidogyne incognita)、キタネコブセンチュウ(Meloidogyne hapla)、ジャワネコブセンチュウ(Meloidogyne javanica)、ダイズシストセンチュウ(Heterodera glycines)、ジャガイモシストセンチュウ(Globodera rostochiensis)、ミナミネグサレセンチュウ(Pratylenchus coffeae)、ムギネグサレセンチュウ(Pratylenchus neglectus)等。 Nematodes: rice Shin Galle nematode (Aphelenchoides besseyi), strawberry menu nematode (Nothotylenchus acris), sweet potato root-knot nematode (Meloidogyne incognita), northern root-knot nematode (Meloidogyne hapla), Java root-knot nematode (Meloidogyne javanica), soybean cyst nematode (Heterodera glycines), Potato cyst nematode (Globodera rostochiensis), southern nematode nectar (Pratylenchus coffeae), barley nematode nematode (Pratylenchus neglectus) and the like.

 本発明の有害生物防除剤は、本発明化合物と不活性担体とを含有する。本発明の有害生物防除剤は、通常、本発明化合物と固体担体、液体担体、ガス状担体等の不活性担体とを混合し、必要に応じて界面活性剤、その他の製剤用補助剤を添加して、乳剤、油剤、粉剤、粒剤、水和剤、フロアブル剤、マイクロカプセル剤、エアゾール剤、燻煙剤、毒餌剤、樹脂製剤等に製剤化されている。 The pest control agent of the present invention contains the compound of the present invention and an inert carrier. The pest control agent of the present invention is usually a mixture of the compound of the present invention and an inert carrier such as a solid carrier, liquid carrier, gaseous carrier, etc., and if necessary, a surfactant and other formulation adjuvants are added. Thus, they are formulated into emulsions, oils, powders, granules, wettable powders, flowables, microcapsules, aerosols, smoke agents, poison baits, resin formulations and the like.

 本発明の有害生物防除剤は、本発明化合物を通常0.01~95重量%含有する。 The pest control agent of the present invention usually contains 0.01 to 95% by weight of the compound of the present invention.

 製剤化の際に用いられる固体担体としては、例えば粘土類(カオリンクレー、珪藻土、ベントナイト、フバサミクレー、酸性白土等)、合成含水酸化珪素、タルク、セラミック、その他の無機鉱物(セリサイト、石英、硫黄、活性炭、炭酸カルシウム、水和シリカ等)、化学肥料(硫安、燐安、硝安、尿素、塩安等)等の微粉末及び粒状物等があげられる。 Examples of solid carriers used for formulation include clays (kaolin clay, diatomaceous earth, bentonite, fusami clay, acidic clay), synthetic hydrous silicon oxide, talc, ceramics, and other inorganic minerals (sericite, quartz, sulfur). , Activated carbon, calcium carbonate, hydrated silica, etc.), fine fertilizers such as chemical fertilizers (ammonium sulfate, phosphorous acid, ammonium nitrate, urea, ammonium chloride, etc.) and granular materials.

 液体担体としては、例えば水、アルコール類(メタノール、エタノール、イソプロピルアルコール、ブタノール、ヘキサノール、ベンジルアルコール、エチレングリコール、プロピレングリコール、フェノキシエタノール等)、ケトン類(アセトン、メチルエチルケトン、シクロヘキサノン等)、芳香族炭化水素類(トルエン、キシレン、エチルベンゼン、ドデシルベンゼン、フェニルキシリルエタン、メチルナフタレン等)、脂肪族炭化水素類(ヘキサン、シクロヘキサン、灯油、軽油等)、エステル類(酢酸エチル、酢酸ブチル、ミリスチン酸イソプロピル、オレイン酸エチル、アジピン酸ジイソプロピル、アジピン酸ジイソブチル、プロピレングリコールモノメチルエーテルアセテート等)、ニトリル類(アセトニトリル、イソブチロニトリル等)、エーテル類(ジイソプロピルエーテル、1,4-ジオキサン、エチレングリコールジメチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、3-メトキシ-3-メチル-1-ブタノール等)、酸アミド類(N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等)、ハロゲン化炭化水素類(ジクロロメタン、トリクロロエタン、四塩化炭素等)、スルホキシド類(ジメチルスルホキシド等)、炭酸プロピレン及び植物油(大豆油、綿実油等)が挙げられる。 Examples of liquid carriers include water, alcohols (methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol, etc.), ketones (acetone, methyl ethyl ketone, cyclohexanone, etc.), aromatic hydrocarbons. (Toluene, xylene, ethylbenzene, dodecylbenzene, phenylxylylethane, methylnaphthalene, etc.), aliphatic hydrocarbons (hexane, cyclohexane, kerosene, light oil, etc.), esters (ethyl acetate, butyl acetate, isopropyl myristate, Ethyl oleate, diisopropyl adipate, diisobutyl adipate, propylene glycol monomethyl ether acetate, etc.), nitriles (acetonitrile, isobutyrate) Nitriles), ethers (diisopropyl ether, 1,4-dioxane, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, 3-methoxy-3-methyl-1-butanol, etc. ), Acid amides (N, N-dimethylformamide, N, N-dimethylacetamide, etc.), halogenated hydrocarbons (dichloromethane, trichloroethane, carbon tetrachloride, etc.), sulfoxides (dimethylsulfoxide, etc.), propylene carbonate and vegetable oil (Soybean oil, cottonseed oil, etc.).

 ガス状担体としては、例えばフルオロカーボン、ブタンガス、LPG(液化石油ガス)、ジメチルエーテル及び炭酸ガスがあげられる。 Examples of the gaseous carrier include fluorocarbon, butane gas, LPG (liquefied petroleum gas), dimethyl ether, and carbon dioxide gas.

 界面活性剤としては、例えばポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルアリールエーテル、ポリエチレングリコール脂肪酸エステル、等の非イオン界面活性剤、及びアルキルスルホン酸塩、アルキルベンゼンスルホン酸塩、アルキル硫酸塩当の陰イオン界面活性剤が挙げられる。 Examples of the surfactant include nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, polyethylene glycol fatty acid ester, and the like, and alkyl sulfonate, alkyl benzene sulfonate, and alkyl sulfate. An ionic surfactant is mentioned.

 その他の製剤用補助剤としては、固着剤、分散剤、着色剤及び安定剤等、具体的には例えばカゼイン、ゼラチン、糖類(でんぷん、アラビアガム、セルロース誘導体、アルギン酸等)、リグニン誘導体、ベントナイト、合成水溶性高分子(ポリビニルアルコール、ポリビニルピロリドン、ポリアクリル酸類等)、PAP(酸性りん酸イソプロピル)、BHT(2,6-ジ-tert-ブチル-4-メチルフェノール)、BHA(2-tert-ブチル-4-メトキシフェノールと3-tert-ブチル-4-メトキシフェノールとの混合物)が挙げられる。 Examples of other formulation adjuvants include fixing agents, dispersants, colorants and stabilizers, such as casein, gelatin, saccharides (starch, gum arabic, cellulose derivatives, alginic acid, etc.), lignin derivatives, bentonite, Synthetic water-soluble polymers (polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acids, etc.), PAP (isopropyl acid phosphate), BHT (2,6-di-tert-butyl-4-methylphenol), BHA (2-tert- And a mixture of butyl-4-methoxyphenol and 3-tert-butyl-4-methoxyphenol).

 本発明の有害生物防除方法は、本発明化合物の有効量を有害生物に直接、及び/又は、有害生物の生息場所(植物体、土壌、家屋内、動物体等)に施用することにより行われる。本発明の有害生物防除方法には、本発明化合物が通常本発明の有害生物防除剤の形態で用いられる。 The pest control method of the present invention is carried out by applying an effective amount of the compound of the present invention directly to pests and / or to habitats of pests (plants, soil, households, animal bodies, etc.). . In the pest control method of the present invention, the compound of the present invention is usually used in the form of the pest control agent of the present invention.

 本発明の有害生物防除剤を農業分野の有害生物防除に用いる場合、その施用量は10000m2あたりの本発明化合物量で1~10000gである。本発明の有害生物防除剤が乳剤、水和剤、フロアブル剤等に製剤化されている場合は、通常、有効成分濃度が0.01~10000ppmとなるように水で希釈して施用し、粒剤、粉剤等は、通常、そのまま施用する。 When the pest control agent of the present invention is used for pest control in the agricultural field, the application amount is 1 to 10,000 g in the amount of the present compound per 10,000 m 2 . When the pest control agent of the present invention is formulated into an emulsion, a wettable powder, a flowable agent, etc., it is usually diluted with water so that the active ingredient concentration is 0.01 to 10,000 ppm. Agents, powders, etc. are usually applied as they are.

 これらの製剤や製剤の水希釈液は、有害生物または有害生物から保護すべき作物等の植物に直接散布処理してもよく、また耕作地の土壌に生息する有害生物を防除するために、該土壌に処理してもよい。 These preparations and water dilutions of the preparations may be sprayed directly on pests or plants such as crops to be protected from pests, and in order to control pests that inhabit the soil of cultivated land. You may process to soil.

 また、シート状やひも状に加工した樹脂製剤を作物に巻き付ける、作物近傍に張り渡す、株元土壌に敷く等の方法により処理することもできる。 Also, it can be treated by methods such as wrapping a resin preparation processed into a sheet or string around the crop, stretching it around the crop, or laying it on the stock soil.

 本発明の有害生物防除剤を家屋内に生息する有害生物の防除に用いる場合、その施用量は、面上に処理する場合は処理面積1m2あたりの本発明化合物量で、通常、0.01~1000mgであり、空間に処理する場合は処理空間1m3あたりの本発明化合物量で、通常、0.01~500mgである。本発明の有害生物防除剤が乳剤、水和剤、フロアブル剤等に製剤化されている場合は、通常有効成分濃度が0.1~1000ppmとなるように水で希釈して施用し、油剤、エアゾール剤、燻煙剤、毒餌剤等はそのまま施用する。 When the pest control agent of the present invention is used for controlling pests living in a house, the amount applied is the amount of the compound of the present invention per 1 m 2 of treatment area when treated on the surface, usually 0.01. In the case of treatment in a space, the amount of the compound of the present invention per 1 m 3 of the treatment space is usually 0.01 to 500 mg. When the pest control agent of the present invention is formulated into an emulsion, a wettable powder, a flowable agent, etc., it is usually diluted with water so that the active ingredient concentration is 0.1 to 1000 ppm. Apply aerosols, smoke, poisonous bait, etc. as they are.

 本発明の有害生物防除剤は、下記「作物」が栽培されている農地で使用することができる。 The pest control agent of the present invention can be used in farmland where the following “crop” is cultivated.

 農作物:トウモロコシ、イネ、コムギ、オオムギ、ライムギ、エンバク、ソルガム、ワタ、ダイズ、ピーナッツ、ソバ、テンサイ、ナタネ、ヒマワリ、サトウキビ、タバコ等。 Agricultural crops: corn, rice, wheat, barley, rye, oat, sorghum, cotton, soybean, peanut, buckwheat, sugar beet, rapeseed, sunflower, sugarcane, tobacco, etc.

 野菜;ナス科野菜(ナス、トマト、ピーマン、トウガラシ、ジャガイモ等)、ウリ科野菜(キュウリ、カボチャ、ズッキーニ、スイカ、メロン等)、アブラナ科野菜(ダイコン、カブ、セイヨウワサビ、コールラビ、ハクサイ、キャベツ、カラシナ、ブロッコリー、カリフラワー等)、キク科野菜(ゴボウ、シュンギク、アーティチョーク、レタス等)、ユリ科野菜(ネギ、タマネギ、ニンニク、アスパラガス)、セリ科野菜(ニンジン、パセリ、セロリ、アメリカボウフウ等)、アカザ科野菜(ホウレンソウ、フダンソウ等)、シソ科野菜(シソ、ミント、バジル等)、イチゴ、サツマイモ、ヤマノイモ、サトイモ等。 Vegetables: Solanum vegetables (eggplants, tomatoes, peppers, peppers, potatoes, etc.), Cucurbitaceae vegetables (cucumbers, pumpkins, zucchini, watermelons, melons, etc.), cruciferous vegetables (radish, turnip, horseradish, kohlrabi, Chinese cabbage, cabbage) , Mustard, broccoli, cauliflower, etc.), asteraceae vegetables (burdock, shungiku, artichoke, lettuce, etc.), liliaceae vegetables (leek, onion, garlic, asparagus), celeryaceae vegetables (carrot, parsley, celery, American scallop, etc.) ), Red crustacean vegetables (spinach, chard, etc.), persimmon vegetables (perilla, mint, basil, etc.), strawberry, sweet potato, yam, taro, etc.

 果樹:仁果類(リンゴ、セイヨウナシ、ニホンナシ、カリン、マルメロ等)、核果類(モモ、スモモ、ネクタリン、ウメ、オウトウ、アンズ、プルーン等)、カンキツ類(ウンシュウミカン、オレンジ、レモン、ライム、グレープフルーツ等)、堅果類(クリ、クルミ、ハシバミ、アーモンド、ピスタチオ、カシューナッツ、マカダミアナッツ等)、液果類(ブルーベリー、クランベリー、ブラックベリー、ラズベリー等)、ブドウ、カキ、オリーブ、ビワ、バナナ、コーヒー、ナツメヤシ、ココヤシ、アブラヤシ等。 Fruit trees: apples, pears, Japanese pears, quince, quince, etc., nuclear fruits (peaches, plums, nectarines, ume, sweet cherry, apricots, prunes, etc.), citrus (citrus mandarin, orange, lemon, lime, grapefruit) ), Nuts (chestnut, walnut, hazel, almond, pistachio, cashew nut, macadamia nut, etc.), berries (blueberry, cranberry, blackberry, raspberry, etc.), grape, oyster, olive, loquat, banana, coffee, Date palm, coconut palm, oil palm etc.

 果樹以外の樹木:チャ、クワ、花木類(サツキ、ツバキ、アジサイ、サザンカ、シキミ、サクラ、ユリノキ、サルスベリ、キンモクセイ等)、街路樹(トネリコ、カバノキ、ハナミズキ、ユーカリ、イチョウ、ライラック、カエデ、カシ、ポプラ、ハナズオウ、フウ、プラタナス、ケヤキ、クロベ、モミノキ、ツガ、ネズ、マツ、トウヒ、イチイ、ニレ、トチノキ等)、サンゴジュ、イヌマキ、スギ、ヒノキ、クロトン、マサキ、カナメモチ、等。 Trees other than fruit trees: tea, mulberry, flowering trees (Satsuki, camellia, hydrangea, sasanqua, shikimi, sakura, yurinoki, crape myrtle, snapdragon, etc.), roadside trees (ash, birch, dogwood, eucalyptus, ginkgo, lilac, maple, oak) , Poplar, redwood, fu, sycamore, zelkova, blackfish, Japanese amberjack, eel, pine, pine, spruce, yew, elm, Japanese cypress, etc.), coral jug, dogwood, cedar, cypress, croton, masaki, kanamochi, etc.

 芝生:シバ類(ノシバ、コウライシバ等)、バミューダグラス類(ギョウギシバ等)、ベントグラス類(コヌカグサ、ハイコヌカグサ、イトコヌカグサ等)、ブルーグラス類(ナガハグサ、オオスズメノカタビラ等)、フェスク類(オニウシノケグサ、イトウシノケグサ、ハイウシノケグサ等)、ライグラス類(ネズミムギ、 ホソムギ等)、カモガヤ、オオアワガエリ等。 Lawn: Shiba (Nasis, Pleurotus, etc.), Bermudagrass (Neurodonidae, etc.), Bentgrass (Oleoptera, Hykonukagusa, Odonoptera, etc.), Bluegrass (Nagahagusa, Oosuzunokatabira, etc.), Fescue (Oonishi nokegusa, Drosophila, etc.) , Grass, etc.), ryegrass (rat, wheat, etc.), anemonefish, blue whale, etc.

 その他:花卉類(バラ、カーネーション、キク、トルコギキョウ、カスミソウ、ガーベラ、マリーゴールド、サルビア、ペチュニア、バーベナ、チューリップ、アスター、リンドウ、ユリ、パンジー、シクラメン、ラン、スズラン、ラベンダー、ストック、ハボタン、プリムラ、ポインセチア、グラジオラス、カトレア、デージー、シンビジューム、ベゴニア等)、バイオ燃料植物(ヤトロファ、クルカス、ベニバナ、アマナズナ類、スイッチグラス、ミスカンサス、クサヨシ、ダンチク、ケナフ、キャッサバ、ヤナギ、藻類等)、観葉植物等。 Other: Flowers (Rose, Carnation, Chrysanthemum, Eustoma, Gypsophila, Gerbera, Marigold, Salvia, Petunia, Verbena, Tulip, Aster, Gentian, Lily, Pansy, Cyclamen, Orchid, Lily of the valley, Lavender, Stock, Habutton, Primula, Poinsettia, gladiolus, cattleya, daisy, cymbidium, begonia, etc.), biofuel plants (Jatropha, Curcas, safflower, Amanasuna, switchgrass, Miscanthus, Kusanoshi, Danchiku, Kenaf, cassava, willow, algae, etc.), ornamental plants, etc. .

 「作物」には、遺伝子組換え作物も含まれる。 “Crop” includes genetically modified crops.

 本発明の有害生物防除剤は、他の殺虫剤、殺ダニ剤、殺線虫剤、殺菌剤、植物成長調節剤、除草剤及び共力剤と混用又は併用することができる。かかる殺虫剤、殺ダニ剤、殺線虫剤、殺菌剤、植物成長調節剤、除草剤及び共力剤の有効成分の例を以下に示す。 The pest control agent of the present invention can be mixed or used in combination with other insecticides, acaricides, nematicides, fungicides, plant growth regulators, herbicides and synergists. Examples of active ingredients of such insecticides, acaricides, nematicides, fungicides, plant growth regulators, herbicides and synergists are shown below.

 殺虫剤の有効成分
(1)カーバメート系化合物
アラニカルブ(Alanycarb)、アルジカルブ(Aldicarb)、ベンダイオカルブ(Bendiocarb)、ベンフラカルブ(Benfuracarb)、ブトカルボキシム(Butocarboxim)、ブトキシカルボキシム(Butoxycarboxim)、カルバリル(Carbaryl=NAC)、カルボフラン(Carbofuran)、カルボスルファン(Carbosulfan)、クロエトカルブ(Cloethocarb)、エチオフェンカルブ(Ethiofencarb)、フェノブカルブ(Fenobucarb=BPMC)、フェノチオカルブ(Fenothiocarb)、フォルメタネート(Formetanate)、フラチオカルブ(Furathiocarb)、イソプロカルブ(Isoprocarb=MIPC)、メチオカルブ(Methiocarb)、メソミル(Methomyl)、メトルカルブ(Metolcarb)、オキサミル(Oxamyl)、ピリミカーブ(Pirimicarb)、プロポキスル(Propoxur:PHC)、チオジカルブ(Thiodicarb)、チオファノクス(Thiofanox)、トリアザメート(Triazamate)、トリメサカルブ(Trimethacarb)、XMC、及びキシリルカルブ(Xylylcarb)。
Active Ingredients of Insecticide (1) Carbamate Compounds Alaniccarb, Aldicarb, Bendiocarb, Benfurcarb, Butocaboxim, Butoxycarbyl, Butoxycarboxyl = NAC), Carbofuran, Carbosulfan, Cloethocarb, Ethiofencarb, Fenobucarb (BPMC), Fenothiocarb (Fenothiocarb, Fenothiocarb) ratiocarb, isoprocarb (Isoprocarb = MIPC), methiocarb (Methiocarb), methomyl (Methomyl), metorcarb (Metocarb), oxamyl (Oxamyl), pirimicarb (Pro), propoxyl (Pro) ), Triazamate, Trimesacarb, XMC, and Xylylcarb.

(2)有機リン系化合物
アセフェート(Acephate)、アザメチホス(Azamethiphos)、アジンホスエチル(Azinphos-ethyl)、アジンホスメチル(Azinphos-methyl)、カズサホス(Cadusafos)、クロルエトキシホス(Chlorethoxyfos)、クロルフェンビンホス(Ch1orfenvinphos)、クロルメフォス(Chlormephos)、クロルピリホス(Chlorpyrifos)、クロルピリホスメチル(Chlorpyrifos-methyl)、クマフォス(Coumaphos)、シアノホス(Cyanophos=CYAP)、デメトン-S-メチル(Demeton-S-methyl)、ダイアジノン(Diazinon)、ジクロルボス(Dichlorvos=DDVP)、ジクロトホス(Dicrotophos)、ジメトエート(Dimethoate)、ジメチルビンホス(Dimethylvinphos)、ジスルホトン(Disulfoton)、EPN、エチオン(Ethion)、エトプロホス(Ethoprophos)、エトリムホス(Etrimfos)、ファムファー(Famphur)、フェナミホス(Fenamiphos)、フエニトロチオン(Fenitrothion=MEP)、フェンチオン(Fenthion=MPP)、ホスチアゼート(Fosthiazate)、ヘプテノホス(Heptenophos)、イミサイホス(Imicyfos)、イソフェンホス(Isofenphos)、Isopropyl O-(methoxyaminothio-phosphoryl)salicylate、イソキサチオン(Isoxathion)、マラチオン(Malathion)、メカルバム(Mecarbam)、メスルフェンホス(Mesulfenfos)、メタミドホス(Methamidophos)、メチダチオン(Methidathion=DMTP)、メビンホス(Mevinphos)、モノクロトホス(Monocrotophos)、ナレッド(Naled:BRP)、オメトエート(Omethoate)、オキシデメトンメチル(Oxydemeton-methyl)、パラチオン(Parathion)、メチルパラチオン(Parathion-methyl)、フェントエート(Phenthoate=PAP)、フォレート(Phorate)、ホサロン(Phosalone)、ホスメット(Phosmet=PMP)、フォスファミドン(Phosphamidon)、ホキシム(Phoxim)、ピリミホスメチル(Pirimiphos-methy1)、プロフェノホス(Profenofos)、プロペタムホス(Propetamphos)、プロチオホス(Prothiofos)、ピラクロホス(Pyraclorfos)、ピリダフェンチオン(Pyridafenthion)、キナルホス(Quinalphos)、スルフォテップ(Sulfotep)、テブピリムホス(Tebupirimfos)、テメホス(Temephos)、テルブホス(Terbufos)、テトラクロルビンホス(Tetrach1orvinphos)、チオメトン(Thiometon)、トリアゾホス(Triazophos)、トリクロルホン(Trichlorphon=DEP)、バミドチオン(Vamidothion)、りん化アルミニウム(Aluminium phosphide)、ブタチオホス(Butathiofos)、DCIP(Dichlorodiisopropyl ether)、ジクロフェンチオン(Dichlofenthion=ECP)、ホルモチオン(Formothion)、りん化水素(Hydrogen phosphide)、オキシデプロホス(Oxydeprofos=ESP)、プロパホス(Propaphos)、サリチオン(Salithion)、及びスルプロホス(Sulprofos)。
(2) Organophosphorus compounds: Acetate, Azamethiphos, Azinphos-ethyl, Azinphos-methyl, Kazusafos, Chlorethhosphine, Chlorethophos , Chlormephos, Chlorpyrifos, Chlorpyrifos-methyl, Coumaphos, Cyanophos = CYAP, Demeton-S-methyl, Demethon-S Jiku Rubos (Dichlorvos = DDVP), Dicrotophos, Dimethoate, Dimethylvinphos, Disulfoton, EPN, Ethion, Etoprofos, Ethoprophos ), Fenamiphos, Fennitrothion (MEP), Fenthion (MPP), Phosphiazate, Heptenophos (Imicyfos), Ifenfos (Ipofos) Ethoxyaminothio-phosphoryl) salicylate, isoxathion (Isoxathion), malathion (Malathion), mecarbam (Mecarbom), mesulfophos (Mesulfofos), methobin (Methodophos), methidophos (Methidophos) (Naled: BRP), Omethoate, Oxydemethon-methyl, Parathion, Methylparathion, Phenthoate = PAP Phorate, Phosalone, Phosmet = PMP, Phosphamidon, Phoxim, Pirimiphos-methi, Profenfos (Pro), Profenfos (Pro), Profenfos (Profenfos) , Pyrachlorfos, pyridafenthion, quinalphos, sulfotep, tebupyrimfos, temephos, terubfos, terbufos, terbufos, terbufos nphos), thiomethon (Thiomethon), triazophos (Triazophos), trichlorphone (TRICHLPHON = DEP), bamidthione (Vamidothion), aluminum phosphide (Phiothiophene), rothiophos Formothion, Hydrogen phosphide, Oxydeprofos (ESP), Propafos, Salithion, and Sulprofos.

(3)ピレスロイド化合物
 アクリナトリン(Acrinathrin)、アレスリン(Allethrin)、ベンフルスリン(Benfluthrin)、ベータ-シフルトリン(Beta-Cyfluthrin)、ビフェントリン(Bifenthrin)、シクロプロトリン(Cycloprothrin)、シフルトリン(Cyfluthrin)、シハロトリン(Cyhalothrin)、シペルメトリン(Cypermethrin)、デルタメトリン(Deltamethrin)、エスフェンバレレート(Esfenvalerate)、エトフェンプロックス(Ethofenprox)、フェンプロパトリン(Fenpropathrin)、フェンバレレート(Fenvalerate)、フルシトリネート(Flucythrinate)、フルフェンプロックス(Flufenoprox)、フルメスリン(Flumethrin)、フルバリネート(Fluvalinate)、ハルフェンプロックス(Halfenprox)、イミプロトリン(Imiprothrin)、ペルメトリン(Permethrin)、プラレトリン(Prallethrin)、ピレトリン(Pyrethrins)、レスメトリン(Resmethrin)、シグマ-サイパーメスリン(sigma-Cypermethrin)、シラフルオフェン(Silafluofen)、テフルトリン(Tefluthrin)、トラロメトリン(Tralomethrin)、トランスフルトリン(Transfluthrin)、テトラメトリン(Tetramethrin)、フェノトリン(Phenothrin)、シフェノトリン(Cyphenothrin)、アルファシペルメトリン(alpha-Cypermethrin)、ゼータシペルメトリン(zeta-Cypermethrin)、ラムダシハロトリン(lambda-Cyhalothrin)、ガンマシハロトリン(gamma-Cyhalothrin)、フラメトリン(Furamethrin)、タウフルバリネート(tau-Fluvalinate)、メトフルトリン(Metofluthrin)、プロフルトリン(Profluthrin)、ジメフルトリン(Dimefluthrin)、プロトリフェンビュート(Protrifenbute)、2,3,5,6-テトラフルオロ-4-(メトキシメチル)ベンジル (EZ)-(1RS,3RS;1RS,3SR)-2,2-ジメチル-3-プロプ-1-エニルシクロプロパンカルボキシレート、2,3,5,6-テトラフルオロ-4-メチルベンジル (EZ)-(1RS,3RS;1RS,3SR)-2,2-ジメチル-3-プロプ-1-エニルシクロプロパンカルボキシレート、及び2,3,5,6-テトラフルオロ-4-
(メトキシメチル)ベンジル (1RS,3RS;1RS,3SR)-2,2-ジメチル-3-(2-メチル-1-プロペニル)シクロプロパンカルボキシレート等。
(3) Pyrethroid compounds Acrinathrin, Allethrin, Benfluthrin, Beta-Cyfluthrin, Bifenthrin, Cycloprothrin, Cycloprothrin (Cycloprothrin, Cycloprothrin, Cycloprothrin) , Cypermethrin, Deltamethrin, Esfenvalerate, Etofenprox, Fenpropathrin, Fenvalerate, Fulcitrate F lucytrinate, flufenprox, flumethrin, fluvalinate, halfenprox, imiprothrin, permethrin, praletrin, prethrin. Resmethrin, Sigma-Cypermethrin, Silafluofen, Tefluthrin, Tralomethrin, Transfluthrin, Tetramethrin thrin), phenothrin, cyphenothrin, alpha-Cypermethrin, zeta-Cypermethrin, lambda cihalothrin (lambda-Cyhalothrin) ), Furamethrin, tau-fluvalinate, methofluthrin, profluthrin, dimethylfluthrin, trifluorophenbute5, protrifenbute5, protrifenbute5 4- (Methoxyme L) benzyl (EZ)-(1RS, 3RS; 1RS, 3SR) -2,2-dimethyl-3-prop-1-enylcyclopropanecarboxylate, 2,3,5,6-tetrafluoro-4-methylbenzyl (EZ)-(1RS, 3RS; 1RS, 3SR) -2,2-dimethyl-3-prop-1-enylcyclopropanecarboxylate and 2,3,5,6-tetrafluoro-4-
(Methoxymethyl) benzyl (1RS, 3RS; 1RS, 3SR) -2,2-dimethyl-3- (2-methyl-1-propenyl) cyclopropanecarboxylate and the like.

(4)ネライストキシン化合物
 カルタップ(Cartap)、ベンスルタップ(Bensu1tap)、チオシクラム(Thiocyclam)、チオスルタップ(Thisultap)、モノスルタップ(Monosultap)、及びビスルタップ(Bisultap)。
(4) Nereistoxin compounds Cartap, Bensulpap, Thiocylam, Thiosultap, Monosultap, and Bisultap.

(5)ネオニコチノイド化合物
 イミダクロプリド(Imidac1oprid)、ニテンピラム(Nitenpyram)、アセタミプリド(Acetamiprid)、チアメトキサム(Thiamethoxam)、チアクロプリド(Thiacloprid)、ジノテフラン(Dinotefuran)、及びクロチアニジン(Clothianidin)。
(5) Neonicotinoid compounds Imidacloprid (Imidac1oprid), Nitenpyram (Nitenpyram), Acetamiprid (Acetamiprid), Thiamethoxam (Thiamethoxam), Thiacloprid (An) and dinotefurin (in)

(6)ベンゾイル尿素化合物
 ビストリフルロン(Bistrifluron)、クロルフルアズロン(Chlorfluazuron)、ジフルベンズロン(Diflubenzuron)、フルシクロクスロン(Flucycloxuron)、フルフェノクスロン(Flufenoxuron)、ヘキサフルムロン(Hexaflumuron)、ルフェヌロン(Lufenuron)、ノバルロン(Novaluron)、ノビフルムロン(Noviflumuron)、テフルベンズロン(Teflubenzuron)、トリフルムロン(Triflumuron)、及びフルアズロン(fluazuron)。
(6) Benzoylurea compounds Bistrifluron, Chlorfluazuron, Diflubenzuron, Flucycloxuron, Flufenoxuron, Hexafluuron, Hexafluuron Lufenuron, Novaluron, Noviflumuron, Teflubenzuron, Triflumuron, and fluazuuron.

(7)フェニルピラゾール化合物
 アセトプロール(Acetoprole)、エチプロール(Ethiprole)、フィプロニル(Fiproni1)、バニリプロール(Vaniliprole)、ピリプロール(Pyriprole)、及びピラフルプロール(Pyrafluprole)。
(7) Phenylpyrazole compounds Acetoprole, Ethiprole, Fipronil, Vaniliprole, Pyriprole, and Pyrafluprole.

(8)Btトキシン殺虫剤
 バチルス・チューリンゲンシス菌由来の生芽胞および産生結晶毒素、並びにそれらの混合物。
(8) Bt toxin insecticide Live spores and produced crystal toxins derived from Bacillus thuringiensis, and mixtures thereof.

(9)ヒドラジン化合物
 クロマフェノジド(Chromafenozide)、ハロフェノジド(Halofenozide)、メトキシフェノジド(Methoxyfenozide)、及びテブフェノジド(Tebufenozide)。
(9) Hydrazine compounds Chromafenozide, halofenozide, methoxyphenozide, and tebufenozide.

(10)有機塩素化合物
 アルドリン(Aldrin)、ディルドリン(Dieldrin)、ジエノクロル(Dienochlor)、エンドスルファン(Endosulfan)、メトキシクロル(Methoxychlor)、クロルデン(Chlordane)、及びDDT。
(10) Organochlorine compounds Aldrin, Dieldrin, Dienochlor, Endosulfan, Methoxychlor, Chlordane, and DDT.

(11)その他の殺虫剤有効成分
 マシン油(Machine oil)、硫酸ニコチン(Nicotine-sulfate)、ニコチン(Nicotine)、アバメクチン(Abamectin)、エマメクチン安息香酸塩(Emamectin-benzoate)、ミルベメクチン(Milbemectin)、レピメクチン(Lepimectin)、スピノサッド(Spinosad)、スピネトラム(Spinetoram)、インドキサカルブ(Indoxacarb)、メタフルミゾン(Metaflumizone)、ブプロフェジン(Buprofezin)、シロマジン(Cyromazine)、ハイドロプレン(Hydroprene)、メトプレン(Methoprene)、キノプレン(Kinoprene)、ピリプロキシフェン(Pyriproxyfen)、フェノキシカルブ(Fenoxycarb)、クロルフェナピル(Chlorphenapyr)、DNOC、ジアフェンチウロン(Diafenthiuron)、ピメトロジン(Pymetrozine)、フロニカミド(Flonicamid)、ピリフルキナゾン(Pyrifluquinazone)、ピリダリル(Pyridalyl)、トルフェンピラド(Tolfenpyrad)、フルリムフェン(Flurimfen)、フルフェネリム(Flufenerim)、スピロテトラマット(Spirotetramat)、スピロメシフェン(Spiromesifen)、スルフォキサフロール(sulfoxaflor)、クロラントラニリプロール(Chlorantraniliprole)、シアントラニリプロール(Cyantraniliprole)、フルベンジアミド(Flubendiamide)、
下記式(K):
(11) Other Insecticide Active Ingredients Machine oil (Machine oil), nicotine sulfate (Nicotine-sulfate), nicotine (Nicotine), abamectin (Abamectin), emamectin benzoate (Emamectin-benzoate), milbemectin (Milbemectin) (Lepidectin), Spinosad, Spinetoram, Indoxacarb, Metaflumizone, Buprofezine, Cyromene, Cyromene, Cyromene, Cyromene ), Pyriproxyfen, Phenoxycarb, Chlorphenapyr, DNOC, Diafenthiuron, Pymetrozine, Pymetrozine, Pymetrozine Tolfenpyrad, Flurimfen, Flufenerim, Spirotetramat, Spiromesifen, Sulfoxaflor, Chloranthrolitrol orantraniliprole, cyantraniliprole, fulvendiamide,
The following formula (K):

Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032

〔式中、
 R100は塩素原子、臭素原子またはトリフルオロメチル基を表し、
 R200は塩素原子、臭素原子またはメチル基を表し、
 R300は塩素原子、臭素原子またはシアノ基を表す。〕
で示される化合物、
下記式(L):
[Where,
R 100 represents a chlorine atom, a bromine atom or a trifluoromethyl group,
R 200 represents a chlorine atom, a bromine atom or a methyl group,
R 300 represents a chlorine atom, a bromine atom or a cyano group. ]
A compound represented by
The following formula (L):

Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033

〔式中、
 R1000は塩素原子、臭素原子またはヨウ素原子を表す。〕
で示される化合物、メトキサジアゾン(Metoxadiazone)、スルフラミド(Sulfluramid)、亜ひ酸(Arsenic acid)、ベンクロチアズ(Benclothiaz)、石灰窒素(Calcium cyanamide)、石灰硫黄合剤(Calcium polysulfide)、メタム・アンモニウム(Metam-ammonium)、メタム・ナトリウム(Metam-sodium)、オレイン酸カリウム(Potassium oleate)、硫黄(Sulfur)、及びトラロピリル(Tralopyril)。
[Where,
R 1000 represents a chlorine atom, a bromine atom or an iodine atom. ]
, Methoxadiazone, sulfuramide, arsenous acid, benclothiaz, lime nitrogen (Calcium flude) (Calcium flude) ammonium, Metam-sodium, Potassium oleate, Sulfur, and Tralopyril.

 殺ダニ剤の有効成分
アセキノシル(Acequinocyl)、アミトラズ(Amitraz)、ベンゾキシメート(Benzoximate)、ビフェナゼート(Bifenaate)、ブロモプロピレート(Bromopropylate)、キノメチオネート(Chinomethionat)、クロルベンジレート(Chlorobenzilate)、CPCBS(Chlorfenson)、クロフェンテジン(Clofentezine)、シフルメトフェン(Cyflumetofen)、ジコホル(Dicofol)、エトキサゾール(Etoxazole)、フェナザキン(Fenazaquin)、酸化フェンブタスズ(Fenbutatin oxide)、フェノチオカルブ(Fenothiocarb)、フェンピロキシメート(Fenpyroximate)、フルアクリピリム(Fluacrypyrim)、ヘキシチアゾクス(Hexythiazox)、プロパルギット(Propargite=BPPS)、ポリナクチン複合体(Polynactins)、ピリダベン(Pyridaben)、ピリミジフェン(Pyrimidifen)、テブフェンピラド(Tebufenpyrad)、テトラジホン(Tetradifon)、スピロジクロフェン(Spirodiclofen)、アミドフルメット(Amidoflumet)、及びシエノピラフェン(cyenopyrafen)。
Active ingredients of acaricides: Acequinocyl, Amitraz, Benzoximate, Bifenaate, Bromopropyl, BSPC, Chromethionate, Chromethionate ), Clofentezine, cyflumetofen, dicofol, etoxazole, fenazaquin, fenbutatin oxide, fenothiophen Pyroximate, Fluacrylpyrim, Hexythiaxox, propargite (di), di (R), pyridene (P), piridaben (Pyriben) Diclofen, Spirodiclofen, Amidoflumet, and Cyenopyrafen.

 殺線虫剤の有効成分
 臭化メチル(Methyl bromide)、D-D(1,3-Dichloropropene)、DCIP、フォスチアゼート(Fosthiazate)、塩酸レバミゾール(Levamisol)、メチルイソチオシアネート(Methyisothiocyanate)、酒石酸モランテル(Morantel tartarate)、及びイミシアホス(Imicyafos)。
Active ingredient of nematicide Methyl bromide, DD (1,3-Dichloropropene), DCIP, Fostiazate, levamisole hydrochloride, Levimisol, Methylisothiocyanate tartarate), and Imicyafos.

 殺菌剤の有効成分
 アザコナゾール(Azaconazole)、ビテルタノール(Bitertanol)、ブロムコナゾール(Bromuconazole)、シプロコナゾール(Cyproconazole)、ジフェノコナゾール(Difenoconazole)、ジニコナゾールM(Diniconazole-M)、エポキシコナゾール(Epoxiconazole)、フェナリモル(Fenarimol)フェンブコナゾール(Fenbuconazole)、フルシラゾール(Flusilazole)、フルキンコナゾール(Fluquinconazole)、フルトリアホール(Flutriafol)、ヘキサコナゾール(Hexaconazole)、イマザリル(Imazalil)、イミベンコナゾール(Imibenconazole)、イプコナゾール(Ipconazole)、メトコナゾール(Metconazole)、ミクロブタニル(Myclobutanil)、ヌアリモル(Nuarimol)、オキスポコナゾール(Oxpoconazole)、ペフラゾエート(Pefurazoate)、ペンコナゾール(Penconazole)、プロクロラズ(Prochloraz)、プロピコナゾール(Propiconazole)、プロチオコナゾール(Prothioconazole)、ピリフェノクス(Pyrifenox)、シメコナゾール(Simeconazole)、テブコナゾール(Tebuconazole)、テトラコナゾール(Tetraconazole)、トリアジメホン(Triadimefon)、トリアジメノール(Triadimenol)、トリフルミゾール(Triflumizole)、トリホリン(Trifolin)、トリティコナゾール(Triticonazole)、アルジモルフ(Aldimorph)、ドデモルフ(Dodemorph)、フェンプロピモルフ(Fenpropimorph)、トリデモルフ(Tridemorph)、フェンプロピジン(Fenpropidin)、ピペラリン(Piperalin)、スピロキサミン(Spiroxamine)、フェンヘキサミド(Fenhexamide)、ピリブチカルブ(Pyributicarb)、ナフチフィン(Naphtifine)、テルビナフィン(Terbinafine)等のステロール生合成阻害化合物;
 ベノミル(Benomyl)、カルベンダジム(Carbendezim)、フベリダゾール(Fuberidazole)、チアベンダゾール(Thiabendazole)、チオファネート(Thiphanate)、チオファネートメチル(thiophanate-methyl)、ジエトフェンカルブ(Diethofencarb)、ゾキサミド(Zoxamide)ペンシクロン(Pencycuron)、フルオピコリド(Fluopicolide)等の細胞分裂阻害殺菌化合物;
 クロゾリネート(Chlozolinate)、イプロジオン(Iprodione)、プロシミドン(Procymidone)、ビンクロゾリン(Vinclozolin)、キノキシフェン(Quinoxyfen)、プロキナジド(Proquinazid)、フェンピクロニル(Fenpiclonil)、フルジオキソニル(Fludioxonil)等のシグナル伝達系阻害殺菌化合物;
 シプロジニル(cyprodinil)、ピリメタニル(pyrimethanil)、メパニピリム(Mepanipyrim)等のアミノ酸生合成阻害殺菌化合物;
メタラキシル(Metalaxyl)、ベナラキシル(Benalaxyl)、オキソリニック酸(Oxolinic acid)等の核酸生合成阻害殺菌化合物;
 イソプロチオラン(Isoprothiolane)、イプロベンホス(Iprobenfos)、トルクロホスメチル(Tolclofos-methyl)、プロチオカルブ(Prothiocarb)、ジメトモルフ(Dimethomorph)、ベンチアバリカルブイソプロピル(Benthiavalicarb-isopropyl)、イプロバリカルブ(Iprovalicarb)、マンジプロパミド(Mandipropamid)等の脂質・膜合成阻害殺菌化合物;
 ジクロシメット(Diclocymet)、カルプロパミド(Carpropamid)、フェノキサニル(Fenoxanil)、フサライド(Fthalide)、トリシクラゾール(Tricyclazole)、ピロキロン(Pyroquilon)等のメラニン生合成阻害殺菌化合物;
 アゾキシストロビン(Azoxystrobin)、ジモキシストロビン(Dimoxystrobin)、エネストロビン(Enestrobin)、フルオキサストロビン(Fluoxastrobin)、クレソキシムメチル(Kresoxim-methyl)、メトミノストロビン(Metominostrobin)、オリサストロビン(Orysastrobin)、ピコキシストロビン(Picoxystrobin)、ピラクロストロビン(Pyraclostrobin)、ピリベンカルブ(Pyribencarb)トリフロキシストロビン(Trifloxystrobin)等のストロビルリン殺菌化合物;
カルボキシン(Carboxin)、オキシカルボキシン(Oxycarboxin)、メプロニル(Mepronil)、フルトラニル(Flutoranil)、フラメトピル(Furametopyr)、チフルザミド(Thifluzamide)、ボスカリド(Boscalid)、ペンチオピラド(Penthiopyrad)、フルオピラム(Fluopyram)、ビキサフェン(Bixafen)、イソピラザム(Isopyrazam)、ペンフルフェン(Penflufen)、セダキサン(Sedaxan)、フルキサピロキサド(Fluxapyroxad)等のアニリド系殺菌化合物;
アシベンゾラールSメチル(Acibenzolar-S-methyl)、プロベナゾール(Probenazole)、チアジニル(Tiadinil)、イソチアニル(Isotianil)等の抵抗性誘導化合物;
 バリダマイシンA(Validamycin A)、ポリオキシンB(Polyoxin B)等のグルカン合成阻害殺菌化合物;
 ブラストサイジンS(Blastcidin-S)、カスガマイシン(Kasugamycin)、ストレプトマイシン(Streptomycin)等のタンパク質生合成阻害殺菌化合物;
 チウラム(Thiuram)、マンコゼブ(Mancozeb)、クロロタロニル(Chlorothalonil)、キャプタン(Captan)、ジクロフルアニド(Dichlofluanid)、フォルペット(Folpet)、イミノクタジン(Iminoctadine)、ジラム(Ziram)等のマルチサイト接触活性の殺菌化合物;アミスルブロム(Amisulbrom);シアゾファミド(Cyazofamid);フェリムゾン(Ferimzone);フルアジナム(Fluazinam);ビナパクリル(Binapacryl);ジノカップ(Dinocap);ファモキサドン(Famoxadone);フェナミドン(Fenamidone);エタボキサム(Ethaboxam);メトラフェノン(Metrafenone);シフルフェナミド(Cyflufenamid)等。
Active ingredients of fungicides Azaconazole, Bitertanol, Bromuconazole, Cyproconazole, Difenaconol, Dinicoconol D, Iniconazole E (Fenarimol) Fenbuconazole, Flucilazole, Fluquinconazole, Flutriafol, Hexaconazole, Imazaril (Imazalil) Imibenconazole, Ipconazole, Iconconazole, Metconazole, Microbutanil, Nuarimol, Oxpoconazole, Puroazo Propiconazole, Prothioconazole, Pyrifenox, Simeconazole, Tebuconazole, Tetraconazole, Triazimone fon), triadimenol (Triadimenol), triflumizole (Triflumizole), trifolin (Trifolin), triticonazole (Triticonazole), aldimorph (Dodimorph), dodemorph (Morph) , Fenpropidin, Piperalin, Spiroxamine, Fenhexamide, Pyributicarb, Naftifine, Terbinafine (Terbinafine)
Benomyl, Carbendazim, Fuberidazole, Thiabendazole, Thiophaneate, Thiophaneate, ThiophanateMethyl, ThiophanateMethyl ) And other cell division inhibiting bactericidal compounds;
Clozolinate (Chlozolinate), Iprodione (Iprodione), Procymidone (Procymidone), Vinclozoline (Quinoxyfen), Proquinazin (Proquinodil), Fenpiclonil (Fenpiclonil)
Bactericidal compounds that inhibit amino acid biosynthesis such as cyprodinil, pyrimethanil, mepanipyrim;
Bactericidal compounds that inhibit nucleic acid biosynthesis, such as metalaxyl, benalaxyl, oxolinic acid;
Isoprothiolane (Iproprotiolane), Iprobenfos (Iprobenfos), Toluclofos-methyl (Prothiocarb), Dimethomorphic (Benthiatropiprob) Bactericidal compounds that inhibit lipid and membrane synthesis;
Melanin biosynthesis inhibiting bactericidal compounds such as diclocymet, carpropamide, phenoxanil, fthalide, tricyclazole, pyroquilon, etc .;
Azoxystrobin, dimoxystrobin, enestrobin, fluoxastrobin, cresoxime-methyl, methinostrobin (methominostrobin) Strobilurin bactericidal compounds such as Pyroxystrobin, Pyraclostrobin, Pyribencarb Trifloxystrobin;
Carboxin, Oxycarboxin, Mepronil, Flutolanil, Furametopyr, Thifluzamide, Flupy, penthirid, P Anilide bactericidal compounds such as Bixafen, Isopyrazam, Penflufen, Sedaxan, Fluxapyroxad;
Resistance-inducing compounds such as Acibenzolar-S-methyl, Probenazole, Tiadinil, Isotianil;
Glucan synthesis-inhibiting fungicidal compounds such as validamycin A and polyoxin B;
Protein biosynthesis inhibiting bactericidal compounds such as Blastcidin-S, Kasugamycin, Streptomycin, etc .;
Thiuram, Mancozeb, Chlorothalonil, Captan, Diclofluanid, Folpet, Iminoctaine, Bacteria of Ziram (Zira) Compound; Amisulbrom; Cyazofamid; Ferimzone; Fluazinam; Binapacryl; Dinocapone; Famoxadone; Famoxadon; etrafenone); cyflufenamid (Cyflufenamid) and the like.

 除草剤の有効成分
(1)フェノキシ脂肪酸除草性化合物
 2,4-PA、MCP、MCPB、フェノチオール(Phenothio1)、メコプロップ(Mecoprop)、フルロキシピル(Fluroxypyr)、トリクロピル(Triclopyr)、クロメプロップ(Clomeprop)、及びナプロアニリド(Naproanilide)。
Active ingredient of herbicide (1) Phenoxy fatty acid herbicidal compound 2,4-PA, MCP, MCPB, phenthiol (Phenothio1), mecoprop (Fluoxypyr), triclopyr (Triclopyr), Clomeprop, Clomeprop Naproanilide.

(2)安息香酸除草性化合物
 2,3,6-TBA、ジカンバ(Dicamba)、クロピラリド(Clopyralid)、ピクロラム(Picloram)、アミノピラリド(Aminopyralid)、キンクロラック(Quinclorac)、及びキンメラック(Quinmerac)。
(2) Benzoic acid herbicidal compound 2,3,6-TBA, dicamba, clopyralid, picloram, aminopyralid, quinclorac, and quinmerac.

(3)尿素除草性化合物
ジウロン(Diuron)、リニュロン(Linuron)、クロルトルロン(Chlortoluron)、イソプロツロン(Isoproturon)、フルオメツロン(Fluometuron)、イソウロン(Isouron)、テブチウロン(Tebuthiuron)、メタベンズチアズロン(Methabenzthiazuron)、クミルロン(Cumy1uron)、ダイムロン(Daimuron)、及びメチルダイムロン(Methyl-daimuron)。
(3) Urea herbicidal compounds diuron (Diuron), linuron (Linuron), chlortoluron (Chlortururon), isoproturon (Isoproturon), fluometuron (Isouron) (Isouron), Tebutiuron (Tebuthuron (Tebuthuron) , Cumyluron, Daimuron, and Methyl-daimuron.

(4)トリアジン除草性化合物
 アトラジン(Atrazine)、アメトリン(Ametoryn)、シアナジン(Cyanazine)、シマジン(Simazine)、プロパジン(Propazine)、シメトリン(Simetryn)、ジメタメトリン(Dimethametryn)、プロメトリン(Prometryn)、メトリブジン(Metribuzin)、トリアジフラム(Triaziflam)、及びインダジフラム(Indaziflam)。
(4) Triazine herbicidal compounds Atrazine, Ametrine, Cyanazine, Simazine, Propazine, Simetrin, Dimetamethrin, Dimethamethrin ), Triaziflam, and indaziflam.

(5)ビピリジニウム除草性化合物
 パラコート(Paraquat)、及びジクワット(Diquat)。
(5) Bipyridinium herbicidal compound Paraquat and Diquat.

(6)ヒドロキシベンゾニトリル除草性化合物
 ブロモキシニル(Bromoxynil)、及びアイオキシニル(Ioxynil)。
(6) Hydroxybenzonitrile herbicidal compound Bromoxynil and Ioxynil.

(7)ジニトロアニリン除草性化合物
 ペンディメタリン(Pendimethalin)、プロジアミン(Prodiamine)、及びトリフルラリン(Trifluralin)。
(7) Dinitroaniline herbicidal compound Pendimethalin, Prodiamine, and Trifluralin.

(8)有機リン除草性化合物
 アミプロホスメチル(Amiprofos-methyl)、ブタミホス(Butamifos)、ベンスリド(Bensu1ide)、ピペロホス(Piperophos)、アニロホス(Anilofos)、グリホサート(Glyphosate)、グルホシネート(Glufosinate)、グルホシネート-P(Glufosinate-P)、及びビアラホス(Bialaphos)。
(8) Organophosphorus herbicidal compounds Amiprofos-methyl, Butamifos, Bensulide, Piperophos, Anilofos, Glyphosate, Glufonate, Glufonate P (Glufosinate-P), and Bialaphos.

(9)カーバメート除草性化合物
 ジアレート(Di-allate)、トリアレート(Tri-allate)、EPTC、ブチレート(Butylate)、ベンチオカーブ(Benthiocarb)、エスプロカルブ(Esprocarb)、モリネート(Molinate)、ジメピペレート(Dimepiperate)、スエップ(Swep)、クロルプロファム(Chlorpropham)、フェンメディファム(Phenmedipham)、フェニソファム(Phenisopham)、ピリブチカルブ(Pyributicarb)、及びアシュラム(Asulam)。
(9) Carbamate herbicidal compound: Di-allate, Tri-alate, EPTC, Butyrate, Benchiocarb, Esprocarb, Molinate, Dimepiperate, Dimepiperate (Swep), Chlorprofham, Phenmedifam, Phenisopham, Pyributicalb, and Asuram.

(10)酸アミド除草性化合物
 プロパニル(Propanil)、プロピザミド(Propyzamide)、ブロモブチド(Bromobutide)、及びエトベンザニド(Etobenzanid)。
(10) Acid amide herbicidal compound Propanil, Propyzamide, Bromobutide, and Etobenzanide.

(11)クロロアセトアニリド除草性化合物
 アセトクロール(Acetochlor)、アラクロール(Alachlor)、ブタクロール(Butachlor)、ジメテナミド(Dimethenamid)、プロパクロール(Propachlor)、メタザクロール(Metazachlor)、メトラクロール(Metolachlor)、プレチラクロール(Pretilachlor)、テニルクロール(Theny1ch1or)、及びペトキサミド(Pethoxamid)。
(11) Chloroacetanilide herbicidal compounds Acetochlor, Alaclor, Butachlor, Dimethenamide, Propaclor, Metazachlor, Metolachlor, Metolachlor Pretilachor), tenylchlor (Theny1ch1or), and petoxamide (Pethoxamide).

(12)ジフェニルエーテル除草性化合物
 アシフルオルフェン(Acifluorfen-sodium)、ビフェノックス(Bifenox)、オキシフルオルフェン(Oxyfluorfen)、ラクトフェン(Lactofen)、フォメサフェン(Fomesafen)、クロメトキシニル(Chlomethoxyni1)、及びアクロニフェン(Aclonifen)。
(12) Diphenyl ether herbicidal compound acifluorfen (Acifluorfen-sodium), bifenox (Oxyfluorfen), lactofen (Lactofen), fomesafen (Chlophenoxy), clomethoxypheny (Chlophenoxy)

(13)環状イミド除草性化合物
 オキサジアゾン(Oxadiazon)、シニドンエチル(Cinidon-ethyl)、カルフェントラゾンエチル(Carfentrazone-ethyl)、スルフェントラゾン(Surfentrazone)、フルミクロラックペンチル(Flumiclorac-pentyl)、フルミオキサジン(Flumioxazin)、ピラフルフェンエチル(Pyraflufen-ethyl)、オキサジアルギル(Oxadiargy1)、ペントキサゾン(Pentoxazone)、フルチアセットメチル(Fluthiacet-methyl)、ブタフェナシル(Butafenacil)、ベンズフェンジゾン(Benzfendizone)、ベンカルバゾン(Bencarbazone)、及びサフルフェナシル(Saflufenacil)。
(13) Cyclic imide herbicidal compounds Oxadiazone, Cinidon-ethyl, carfentrazone-ethyl, sulfentrazone, full-microlac-pentyl, flumilacrac-pentyl Oxazine (Flumioxazin), Pyraflufen-ethyl, Oxadiargyl (Oxadialy), Pentoxazone, Fluthiacet-methyl, Butafenzene (Butafenzil) azone), and saflufenacil.

(14)ピラゾール除草性化合物
 ベンゾフェナップ(Benzofenap)、ピラゾレート(Pyrazo1ate)、ピラゾキシフェン(Pyrazoxyfen)、トプラメゾン(Topramezone)、及びピラスルホトール(Pyrasulfotole)。
(14) Pyrazole herbicidal compounds: Benzofenap, Pyrazolate, Pyrazoxifene, Topramzone, and Pyrasulfotole.

(15)トリケトン除草性化合物
 イソキサフルトール(Isoxaflutole)、ベンゾビシクロン(Benzobicyclon)、スルコトリオン(Sulcotrione)、メソトリオン(Mesotrione)、テンボトリオン(Tembotrione)、及びテフリルトリオン(Tefuryltrione)。
(15) Triketone herbicidal compounds Isoxaflutole, benzobicyclon, sulcotrione, mesotrione, tembotrione, and tefril trione.

(16)アリールオキシフェノキシプロピオン酸除草性化合物
 クロジナホッププロパルギル(Clodinafop-propargyl)、シハロホップブチル(Cyhalofop-butyl)、ジクロホップメチル(Diclofop-methyl)、フェノキサプロップエチル(Fenoxaprop-ethyl)、フルアジホップブチル(Fluazifop-butyl)、ハロキシホップメチル(Haloxyfop-methyl)、キザロホップエチル(Quizalofop-ethyl)、及びメタミホップ(Metamifop)。
(16) Aryloxyphenoxypropionic acid herbicidal compound Clodinafop-propargyl, Cyhalofop-butyl, Diclohop-methyl, Fenoxaprop-ethyl Fluazifop-butyl, haloxyhop-methyl, quizalofop-ethyl, and metamihop.

(17)トリオンオキシム除草性化合物
 アロキシジム(Alloxydim-sodium)、セトキシジム(Sethoxydim)、ブトロキシジム(Butroxydim)、クレソジム(Clethodim)、クロプロキシジム(Cloproxydim)、シクロキシジム(Cycloxydim)、テプラロキシジム(Tepraloxydim)、トラルコキシジム(Tralkoxydim)、及びプロフォキシジム(Profoxydim)。
(17) Trione oxime herbicidal compounds Alloxydim-sodium, cetoxydim, Butroxidim, Crethodim, Cloproxidim, Cyclodimoxime (Tralkoxydim), and Profoxydim.

(18)スルホニル尿素除草性化合物
 クロルスルフロン(Chlorsulfuron)、スルホメツロンメチル(Sulfometuron-methyl)、メトスルフロンメチル(Metsu1furon-methy1)、クロリムロンエチル(Chlorimuron-ethyl)、トリベニュロンメチル(Tribenuron-methyl)、トリアスルフロン(Triasulfuron)、ベンスルフロンメチル(Bensulfuron-methy1)、チフェンスルフロンメチル(Thifensulfuron-methyl)、ピラゾスルフロンエチル(Pyrazosulfuron-ethy1)、プリミスルフロンメチル(Primisulfuron-methyl)、ニコスルフロン(Nicosulfuron)、アミドスルフロン(Amidosulfuron)、シノスルフロン(Cinosulfuron)、イマゾスルフロン(Imazosulfuron)、リムスルフロン(Rimsulfuron)、ハロスルフロンメチル(Ha1osulfuron-methy1)、プロスルフロン(Prosulfuron)、エタメトスルフロンメチル(Ethametsulfuron-methyl)、トリフルスルフロンメチル(Triflusulfuron-methyl)、フラザスルフロン(Flazasulfuron)、シクロスルファムロン(Cyc1osulfamuron)、フルピルスルフロン(Flupyrsulfuron)、スルホスルフロン(Sulfosu1furon)、アジムスルフロン(Azimsulfuron)、エトキシスルフロン(Ethoxysulfuron)、オキサスルフロン(Oxasulfuron)、ヨードスルフロンメチルナトリウム(Iodosulfuron-methyl-sodium)、フォラムスルフロン(Foramsulfuron)、メソスルフロンメチル(Mesosulfuron-methyl)、トリフロキシスルフロン(Trifloxysulfuron)、トリトスルフロン(Tritosulfuron)、オルソスルファムロン(orthosulfamuron),フルセトスルフロン(Flucetosulfuron)、及びプロピリスルフロン(Propyrisulfuron)。
(18) Sulphonylurea herbicidal compound Chlorsulfuron, Sulfomethuron-methyl, Metsulfuron-methyl, Chlorimuron-ethyl, Tribenuron methyl Tribenuron-methyl), trisulfuron (Triasulfuron), bensulfuron-methyl (Bensulfuron-methy1), thifensulfuron-methyl (Pyrazsulfuron-methyl), pyrysulfururon-methyl- (1) Nicosulfuron (Nico sulfuron, amidosulfuron, minosulfuron, imosulfuron, rimsulfuron, halosulfuronmethyl (Halsulfuron-sulfuron) , Triflusulfuron-methyl, frazasulfuron, cyclosulfamuron, flupirsulfuron, sulfosulfuron, azulfurium Azulsulfuron, ethoxysulfuron, oxasulfuron, sodium iodosulfuron methyl sodium (Idosulfuron-methyl-sodium), foramsulfuron, mesosulfuron methyl Trisulfursulfuron, Tritosulfuron, Orthosulfururon, Flucetosulfuron, and Propyrisulfuron.

(19)イミダゾリノン除草性化合物
 イマザメタベンズメチル(Imazamethabenz-methyl)、イマザメタピル(Imazamethapyr)、イマザモックス(Imazamox)、イマザピル(Imazapyr)、イマザキン(Imazaquin)、イマゼタピル(Imazethapyr)等。
(19) Imidazolinone herbicidal compounds Imazametabenzmethyl (Imazamethapyr), imazamoxyl, imazapyr (i), imazapir (in), imazakin (in)

(20)スルホンアミド除草性化合物
 フルメトスラム(Flumetsulam)、メトスラム(Metosulam)、ジクロスラム(Diclosulam)、フロラスラム(Florasulam)、クロランスラムメチル(Cloransulam-methyl)、ペノキススラム(Penoxsulam)、及びピロキススラム(Pyroxsulam)。
(20) Sulfonamide herbicidal compounds Flumeslam, Methoslam, Diclosram, Floraslam, chloranthramx, Penoxsulox and Penoxsulox.

(21)ピリミジニルオキシ安息香酸除草性化合物
 ピリチオバックナトリウム(Pyrithiobac-sodium)、ビスピリバックナトリウム(Bispyribac-sodium)、ピリミノバックメチル(Pyriminobac-methy1)、ピリベンゾキシム(Pyribenzoxim)、ピリフタリド(Pyriftalid)、及びピリミスルファン(Pyrimisulfan)。
(21) Pyrimidinyloxybenzoic acid herbicidal compound Pyrithiobac-sodium, Bispyribac-sodium, Pyriminobac-methyl1, Pyribenzoximf, Pyribenzoximf And Pyrimisulfan.

(22)その他の除草性化合物
 ベンタゾン(Bentazon)、ブロマシル(Bromacil)、ターバシル(Terbacil)、クロルチアミド(Chlorthiamid)、イソキサベン(Isoxaben)、ジノセブ(Dinoseb)、アミトロール(Amitrole)、シンメチリン(Cinmethylin)、トリジファン(Tridiphane)、ダラポン(Da1apon)、ジフルフェンゾピルナトリウム(Diflufenzopyr-sodium)、ジチオピル(Dithiopyr)、チアゾピル(Thiazopyr)、フルカルバゾンナトリウム(Flucarbazone-sodium)、プロポキシカルバゾンナトリウム(Propoxycarbazone-sodium)、メフェナセット(Mefenacet)、フルフェナセット(Flufenacet)、フェントラザミド(Fentrazamide)、カフェンストロール(Cafenstrole)、インダノファン(Indanofan)、オキサジクロメホン(Oxaziclomefone)、ベンフレセート(Benfuresate)、ACN、ピリデート(Pyridate)、クロリダゾン(Chloridazon)、ノルフルラゾン(Norflurazon)、フルルタモン(Flurtamone)、ジフルフェニカン(Diflufenican)、ピコリナフェン(Picolinafen)、ベフルブタミド(Beflubutamid)、クロマゾン(Clomazone)、アミカルバゾン(Amicarbazone)、ピノキサデン(Pinoxaden)、ピラクロニル(Pyraclonil)、ピロキサスルホン(Pyroxasulfone)、チエンカルバゾンメチル(Thiencarbazone-methyl)、アミノシクロピラクロール(Aminocyclopyrachlor)、イプフェンカルバゾン(Ipfencarbazone)、及びメチオゾリン(Methiozolin)。
(22) Other herbicidal compounds: Bentazone, Bromasil, Terbacil, Chlorthiamid, Isoxaben, Dinoseb, Amitrol, Methiline, C Tridiphane, Dalapon (Dalapon), Diflufenzopyr sodium (Diflufenzopyr-sodium), Dithiopyr (Dhithiopyr), Thiazopyr (Thiazopyr), Sodium Flucarbazone (Prolucazone) Mefenacet, Flufenacet, Fentrazamide, Cavenstrole, Indanofan, Oxiclomelate, Benfrecetate, Benfrateto (Norflurazon), flulutamon (Diflufenican), diflufenican, picolinafene (Picolinafene), beflubutamide (Clozoneone), amicarbazone (Amicarzone) , Pinoxaden (Pinoxaden), pyraclonil (Pyraclonil), pyroxasulfone (Pyroxasulfone), thien-carbazone methyl (Thiencarbazone-methyl), amino cyclo Pila crawl (Aminocyclopyrachlor), type phen carbazone (Ipfencarbazone), and Mechiozorin (Methiozolin).

共力剤の有効成分
 ピペロニル ブトキサイド(Piperonyl butoxide)、 セサメックス(Sesamex)、スルホキシド(Sulfoxide)、N-(2-エチルへキシル)-8,9,10-トリノルボルン-5-エン-2,3-ジカルボキシイミド(MGK 264)、N-デクリイミダゾール(N-Declyimidazole)、WARF-アンチレジスタント(WARF-antiresistant)、TBPT、TPP、IBP、PSCP、ヨウ化メチル(CH3I)、t-フェニルブテノン(t-Phenylbutenone)、ジエチルマレエート(Diethylmaleate)、DMC、FDMC、ETP、及びETN。
Active ingredient of synergist Piperonyl butoxide, Sesamex, Sulfoxide, N- (2-ethylhexyl) -8,9,10-trinorborn-5-ene-2,3-di Carboximide (MGK 264), N-decrimimidazole (N-Declinimidazole), WARF-anti-resistant, TBPT, TPP, IBP, PSCP, methyl iodide (CH 3 I), t-phenyl butyl Tenon (t-Phenylbutenone), Diethylmaleate, DMC, FDMC, ETP, and ETN.

 以下、製造例、製剤例、試験例等により本発明をさらに詳しく説明するが、本発明はこれらの例に限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to production examples, formulation examples, test examples, and the like, but the present invention is not limited to these examples.

 まず、本発明化合物の製造例を以下に示す。 First, production examples of the compound of the present invention are shown below.

 製造例1
 4-(5-ネオペンチルチオフェン-2-イル)-ピリジン(化合物1-18)の製造
Production Example 1
Preparation of 4- (5-Neopentylthiophen-2-yl) -pyridine (Compound 1-18)

Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034

(1)1-(5-ブロモチオフェン-2-イル)-2,2-ジメチルプロパン-1-オール 2.08g、4-ピリジンボロン酸 1.13g、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]ジクロロパラジウム塩化メチレン錯体 0.34g、りん酸三カリウムn水和物 8.85gおよび1,4-ジオキサン 16mLの混合物を3時間還流した。放冷した反応混合物に酢酸エチルと水を注加した後、セライト濾過した。水層を酢酸エチルで抽出した後、有機層を水洗し、無水硫酸マグネシウムで乾燥した。溶媒を減圧下に濃縮後、得られた残渣をシリカゲルクロマトグラフィーに付し、2,2-ジメチル-1-(5-ピリジン-4-イル-チオフェン-2-イル)-プロパン-1-オール 0.61gを得た。
1H-NMR (CDCl3) δ: 1.02 (9H, s), 2.29 (1H, br s), 4.66 (1H, d), 6.95 (1H, d), 7.38 (1H, d), 7.45 (2H, dd), 8.56 (2H, dd).
(1) 2.08 g of 1- (5-bromothiophen-2-yl) -2,2-dimethylpropan-1-ol, 1.13 g of 4-pyridineboronic acid, [1,1′-bis (diphenylphosphino) ) A mixture of 0.34 g of ferrocene] dichloropalladium methylene chloride complex, 8.85 g of tripotassium phosphate n-hydrate and 16 mL of 1,4-dioxane was refluxed for 3 hours. Ethyl acetate and water were added to the cooled reaction mixture, and the mixture was filtered through celite. The aqueous layer was extracted with ethyl acetate, and then the organic layer was washed with water and dried over anhydrous magnesium sulfate. After concentrating the solvent under reduced pressure, the obtained residue was subjected to silica gel chromatography, and 2,2-dimethyl-1- (5-pyridin-4-yl-thiophen-2-yl) -propan-1-ol 0 .61 g was obtained.
1 H-NMR (CDCl 3 ) δ: 1.02 (9H, s), 2.29 (1H, br s), 4.66 (1H, d), 6.95 (1H, d), 7.38 (1H, d), 7.45 (2H, dd), 8.56 (2H, dd).

(2)2,2-ジメチル-1-(5-ピリジン-4-イル-チオフェン-2-イル)-プロパン-1-オール 0.61g、1,1’-チオカルボニルジイミダゾール 0.87g、4-ジメチルアミノピリジン 30mgおよびトルエン 18mlの混合物を8時間還流した。放冷した反応混合物に酢酸エチルとメタノールを加え、飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した。溶媒を減圧下に濃縮後、得られた残渣をシリカゲルクロマトグラフィーに付し、下式 (2) 2,2-dimethyl-1- (5-pyridin-4-yl-thiophen-2-yl) -propan-1-ol 0.61 g, 1,1′-thiocarbonyldiimidazole 0.87 g, 4 A mixture of 30 mg of dimethylaminopyridine and 18 ml of toluene was refluxed for 8 hours. Ethyl acetate and methanol were added to the cooled reaction mixture, washed with saturated brine, and dried over anhydrous magnesium sulfate. After concentrating the solvent under reduced pressure, the resulting residue was subjected to silica gel chromatography,

Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035

で示される化合物(M1) 0.55gを得た。
1H-NMR (CDCl3) δ: 1.19 (9H, s), 4.97 (1H, s), 7.07-7.09 (2H, m), 7.34 (1H, d), 7.42-7.46 (3H, m), 8.18 (1H, s), 8.58 (2H, dd).
0.55 g of the compound (M1) represented by
1 H-NMR (CDCl 3 ) δ: 1.19 (9H, s), 4.97 (1H, s), 7.07-7.09 (2H, m), 7.34 (1H, d), 7.42-7.46 (3H, m), 8.18 (1H, s), 8.58 (2H, dd).

(3)化合物(M1) 0.55g、水素化トリブチルスズ 0.62ml、2,2’-アゾビス(2-メチルプロピオニトリル) 38mgおよびトルエン 30mlの混合物を2時間還流した。放冷した反応混合物に1規定塩酸を加え分液した。水層をトルエンで洗浄した後、水酸化ナトリウム水溶液で中和し、酢酸エチルで抽出した。酢酸エチルで抽出した有機層を水洗し、無水硫酸マグネシウムで乾燥した後、溶媒を減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(5-ネオペンチルチオフェン-2-イル)-ピリジン 0.21gを得た。 (3) A mixture of 0.55 g of compound (M1), 0.62 ml of tributyltin hydride, 38 mg of 2,2′-azobis (2-methylpropionitrile) and 30 ml of toluene was refluxed for 2 hours. 1N hydrochloric acid was added to the reaction mixture which had been allowed to cool, and the phases were separated. The aqueous layer was washed with toluene, neutralized with an aqueous sodium hydroxide solution, and extracted with ethyl acetate. The organic layer extracted with ethyl acetate was washed with water and dried over anhydrous magnesium sulfate, and then the solvent was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 0.21 g of 4- (5-neopentylthiophen-2-yl) -pyridine.

 製造例2
 4-(5-ネオペンチルフラン-2-イル)-ピリジン(化合物2-18)の製造
Production Example 2
Preparation of 4- (5-Neopentylfuran-2-yl) -pyridine (Compound 2-18)

Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036

(1)2,5-ジブロモフラン 2.50gとテトラヒドロフラン 100mlとの混合物に、-78℃で、n-ブチルリチウム(1.6Mのヘキサン溶液)7.8mlを滴下後、-78℃で1時間攪拌した。次に、-70℃で、トリメチルアセトアルデヒド1.80mlを滴下した。-10℃まで昇温し、飽和塩化アンモニウム水溶液を反応液に注加した。反応混合物を酢酸エチルで抽出し、有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、1-(5-ブロモフラン-2-イル)-2,2-ジメチルプロパン-1-オール 1.83gを得た。
1H-NMR (CDCl3) δ: 0.97 (9H, s), 4.32 (1H, d), 6.21 (1H, d), 6.25 (1H, d).
(1) To a mixture of 2.50 g of 2,5-dibromofuran and 100 ml of tetrahydrofuran, 7.8 ml of n-butyllithium (1.6M hexane solution) was added dropwise at −78 ° C., and then at −78 ° C. for 1 hour. Stir. Next, 1.80 ml of trimethylacetaldehyde was added dropwise at -70 ° C. The temperature was raised to −10 ° C., and a saturated aqueous ammonium chloride solution was poured into the reaction solution. The reaction mixture was extracted with ethyl acetate, the organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 1.83 g of 1- (5-bromofuran-2-yl) -2,2-dimethylpropan-1-ol.
1 H-NMR (CDCl 3 ) δ: 0.97 (9H, s), 4.32 (1H, d), 6.21 (1H, d), 6.25 (1H, d).

(2)1-(5-ブロモフラン-2-イル)-2,2-ジメチルプロパン-1-オール 1.83g、4-ピリジンボロン酸 1.06g、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]ジクロロパラジウム塩化メチレン錯体 0.32g、りん酸三カリウムn水和物 8.33gおよび1,4-ジオキサン 13mLの混合物を4時間還流した。放冷した反応混合物に酢酸エチルと水を注加した後、セライト濾過した。水層を酢酸エチルで抽出した後、有機層を水洗し、無水硫酸マグネシウムで乾燥した。溶媒を減圧下に濃縮後、得られた残渣をシリカゲルクロマトグラフィーに付し、2,2-ジメチル-1-(5-ピリジン-4-イル-フラン-2-イル)-プロパン-1-オール 0.98gを得た。
1H-NMR (CDCl3) δ: 1.02 (9H, s), 2.08 (1H, br s), 4.45 (1H, d), 6.38 (1H, d), 6.84 (1H, d), 7.47 (2H, dd), 8.58 (2H, dd).
(2) 1.83 g of 1- (5-bromofuran-2-yl) -2,2-dimethylpropan-1-ol, 1.06 g of 4-pyridineboronic acid, [1,1′-bis (diphenylphosphino) A mixture of ferrocene] dichloropalladium methylene chloride complex 0.32 g, tripotassium phosphate n-hydrate 8.33 g and 1,4-dioxane 13 mL was refluxed for 4 hours. Ethyl acetate and water were added to the cooled reaction mixture, and the mixture was filtered through celite. The aqueous layer was extracted with ethyl acetate, and then the organic layer was washed with water and dried over anhydrous magnesium sulfate. After concentrating the solvent under reduced pressure, the obtained residue was subjected to silica gel chromatography, and 2,2-dimethyl-1- (5-pyridin-4-yl-furan-2-yl) -propan-1-ol 0 .98 g was obtained.
1 H-NMR (CDCl 3 ) δ: 1.02 (9H, s), 2.08 (1H, br s), 4.45 (1H, d), 6.38 (1H, d), 6.84 (1H, d), 7.47 (2H, dd), 8.58 (2H, dd).

(3)2,2-ジメチル-1-(5-ピリジン-4-イル-フラン-2-イル)-プロパン-1-オール 0.98g、1,1’-チオカルボニルジイミダゾール 0.58g、4-ジメチルアミノピリジン 26mgおよびトルエン 20mlの混合物を2時間還流した。放冷した反応混合物に酢酸エチルとメタノールを加え、飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した。溶媒を減圧下に濃縮後、得られた残渣をシリカゲルクロマトグラフィーに付し、下式 (3) 2,2-dimethyl-1- (5-pyridin-4-yl-furan-2-yl) -propan-1-ol 0.98 g, 1,1′-thiocarbonyldiimidazole 0.58 g, 4 -A mixture of 26 mg of dimethylaminopyridine and 20 ml of toluene was refluxed for 2 hours. Ethyl acetate and methanol were added to the cooled reaction mixture, washed with saturated brine, and dried over anhydrous magnesium sulfate. After concentrating the solvent under reduced pressure, the resulting residue was subjected to silica gel chromatography,

Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037

で示される化合物(M2) 0.71gを得た。
1H-NMR (CDCl3) δ: 1.09 (9H, s), 6.15 (1H, d), 6.29 (1H, d), 6.78-6.81 (2H, m), 7.18 (1H, d), 7.46-7.49 (3H, m), 8.58 (2H, dd).
0.71 g of the compound (M2) represented by
1 H-NMR (CDCl 3 ) δ: 1.09 (9H, s), 6.15 (1H, d), 6.29 (1H, d), 6.78-6.81 (2H, m), 7.18 (1H, d), 7.46-7.49 (3H, m), 8.58 (2H, dd).

(4)化合物(M2) 0.71g、水素化トリブチルスズ 0.83ml、2,2’-アゾビス(2-メチルプロピオニトリル) 51mgおよびトルエン 20mlの混合物を4時間還流した。放冷した反応混合物に1規定塩酸を加え分液した。水層をトルエンで洗浄した後、水酸化ナトリウム水溶液で中和し、酢酸エチルで抽出した。酢酸エチルで抽出した有機層を水洗し、無水硫酸マグネシウムで乾燥した後、溶媒を減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(5-ネオペンチルフラン-2-イル)-ピリジン 0.12gを得た。 (4) A mixture of 0.71 g of compound (M2), 0.83 ml of tributyltin hydride, 51 mg of 2,2′-azobis (2-methylpropionitrile) and 20 ml of toluene was refluxed for 4 hours. 1N hydrochloric acid was added to the reaction mixture which had been allowed to cool, and the phases were separated. The aqueous layer was washed with toluene, neutralized with an aqueous sodium hydroxide solution, and extracted with ethyl acetate. The organic layer extracted with ethyl acetate was washed with water and dried over anhydrous magnesium sulfate, and then the solvent was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 0.12 g of 4- (5-neopentylfuran-2-yl) -pyridine.

 製造例3
 4-(1-ネオペンチルピロール-3-イル)-ピリジン(化合物3-18)の製造
Production Example 3
Preparation of 4- (1-Neopentylpyrrol-3-yl) -pyridine (Compound 3-18)

Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038

 4-(ピロール-3-イル)-ピリジン 0.15g、ネオペンチルヨージド 0.31g、水素化ナトリウム(60%の鉱油混合物) 50mgおよびN,N-ジメチルホルムアミド 2mlの混合物を90℃で2時間攪拌した。放冷した反応混合物に飽和塩化アンモニウム水溶液を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(1-ネオペンチルピロール-3-イル)-ピリジン 0.18gを得た。 A mixture of 0.15 g of 4- (pyrrol-3-yl) -pyridine, 0.31 g of neopentyl iodide, 50 mg of sodium hydride (60% mineral oil mixture) and 2 ml of N, N-dimethylformamide at 90 ° C. for 2 hours Stir. A saturated aqueous ammonium chloride solution was poured into the cooled reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 0.18 g of 4- (1-neopentylpyrrol-3-yl) -pyridine.

 製造例4
 4-(1-ネオペンチルピラゾール-3-イル)-ピリジン(化合物4-18)の製造
Production Example 4
Preparation of 4- (1-Neopentylpyrazol-3-yl) -pyridine (Compound 4-18)

Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000039

 4-(ピラゾール-3-イル)-ピリジン 0.20g、ネオペンチルヨージド 0.33g、水素化ナトリウム(60%の鉱油混合物) 66mgおよびN,N-ジメチルホルムアミド 3mlの混合物を100℃で2時間攪拌した。放冷した反応混合物に飽和塩化アンモニウム水溶液を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(1-ネオペンチルピラゾール-3-イル)-ピリジン 0.26gを得た。 A mixture of 0.20 g of 4- (pyrazol-3-yl) -pyridine, 0.33 g of neopentyl iodide, 66 mg of sodium hydride (60% mineral oil mixture) and 3 ml of N, N-dimethylformamide at 100 ° C. for 2 hours Stir. A saturated aqueous ammonium chloride solution was poured into the cooled reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 0.26 g of 4- (1-neopentylpyrazol-3-yl) -pyridine.

 製造例5
 4-(1-ネオペンチルピラゾール-3-イル)-3-フルオロピリジン(化合物4-19)の製造
Production Example 5
Production of 4- (1-neopentylpyrazol-3-yl) -3-fluoropyridine (Compound 4-19)

Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040

(1)4-アセチル-3-フルオロピリジン 0.44gとN,N-ジメチルホルムアミドジメチルアセタール 5mlの混合物を2時間還流した。溶媒を減圧下に濃縮し、3-ジメチルアミノ-1-(3-フルオロピリジン-4-イル)-2-プロペン-1-オン 0.61gを得た。
1H-NMR (CDCl3) δ: 2.94 (3H, s), 3.19 (3H, s), 5.59 (1H, d), 7.64 (1H, br s), 7.89 (1H, br s), 8.47 (1H, dd), 8.51 (1H, d).
(1) A mixture of 0.44 g of 4-acetyl-3-fluoropyridine and 5 ml of N, N-dimethylformamide dimethylacetal was refluxed for 2 hours. The solvent was concentrated under reduced pressure to obtain 0.61 g of 3-dimethylamino-1- (3-fluoropyridin-4-yl) -2-propen-1-one.
1 H-NMR (CDCl 3 ) δ: 2.94 (3H, s), 3.19 (3H, s), 5.59 (1H, d), 7.64 (1H, br s), 7.89 (1H, br s), 8.47 (1H , dd), 8.51 (1H, d).

(2)3-ジメチルアミノ-1-(3-フルオロピリジン-4-イル)-2-プロペン-1-オン 0.61g、ヒドラジン(抱水) 0.15mlおよびエタノール 19mlの混合物を80℃で2時間攪拌した。溶媒を減圧下に濃縮後、得られた残渣をシリカゲルクロマトグラフィーに付し、3-フルオロ-4-(ピラゾール-3-イル)-ピリジン 0.45gを得た。
1H-NMR (CDCl3) δ: 6.90 (1H, t), 7.71 (1H, d), 7.88 (1H, t), 8.46 (1H, dd), 8.56 (1H, d).
(2) A mixture of 0.61 g of 3-dimethylamino-1- (3-fluoropyridin-4-yl) -2-propen-1-one, 0.15 ml of hydrazine (hydrate) and 19 ml of ethanol at 80 ° C. Stir for hours. After the solvent was concentrated under reduced pressure, the obtained residue was subjected to silica gel chromatography to obtain 0.45 g of 3-fluoro-4- (pyrazol-3-yl) -pyridine.
1 H-NMR (CDCl 3 ) δ: 6.90 (1H, t), 7.71 (1H, d), 7.88 (1H, t), 8.46 (1H, dd), 8.56 (1H, d).

(3)3-フルオロ-4-(ピラゾール-3-イル)-ピリジン 0.45g、ネオペンチルヨージド0.66g、水素化ナトリウム(60%の鉱油混合物) 0.17gおよびN,N-ジメチルホルムアミド 3mlの混合物を100℃で8時間攪拌した。放冷した反応混合物に水を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(1-ネオペンチルピラゾール-3-イル)-3-フルオロピリジン 0.42gを得た。 (3) 0.45 g of 3-fluoro-4- (pyrazol-3-yl) -pyridine, 0.66 g of neopentyl iodide, 0.17 g of sodium hydride (60% mineral oil mixture) and N, N-dimethylformamide 3 ml of the mixture was stirred at 100 ° C. for 8 hours. Water was poured into the cooled reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 0.42 g of 4- (1-neopentylpyrazol-3-yl) -3-fluoropyridine.

 製造例6
 4-(1-ネオペンチルピラゾール-3-イル)-3-メトキシピリジン(化合物4-24)の製造
Production Example 6
Production of 4- (1-Neopentylpyrazol-3-yl) -3-methoxypyridine (Compound 4-24)

Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041

 4-(1-ネオペンチルピラゾール-3-イル)-3-フルオロピリジン 0.21g、ナトリウムメトキシド(28%のメタノール溶液) 1.70gおよびN,N-ジメチルホルムアミド 2.5mlの混合物を100℃で1時間攪拌した。放冷した反応混合物に水を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(1-ネオペンチルピラゾール-3-イル)-3-メトキシピリジン 0.19gを得た。 A mixture of 0.21 g of 4- (1-neopentylpyrazol-3-yl) -3-fluoropyridine, 1.70 g of sodium methoxide (28% methanol solution) and 2.5 ml of N, N-dimethylformamide at 100 ° C. For 1 hour. Water was poured into the cooled reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 0.19 g of 4- (1-neopentylpyrazol-3-yl) -3-methoxypyridine.

 製造例7
 4-(1-ネオペンチルピラゾール-3-イル)-3-(メチルチオ)ピリジン(化合物4-27)の製造
Production Example 7
Preparation of 4- (1-Neopentylpyrazol-3-yl) -3- (methylthio) pyridine (Compound 4-27)

Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042

 4-(1-ネオペンチルピラゾール-3-イル)-3-フルオロピリジン 0.21g、ナトリウムチオメトキシド 0.13gおよびN,N-ジメチルホルムアミド 2.0mlの混合物を室温で5時間攪拌した。反応混合物に水を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(1-ネオペンチルピラゾール-3-イル)-3-(メチルチオ)ピリジン 0.23gを得た。 A mixture of 0.21 g of 4- (1-neopentylpyrazol-3-yl) -3-fluoropyridine, 0.13 g of sodium thiomethoxide and 2.0 ml of N, N-dimethylformamide was stirred at room temperature for 5 hours. Water was poured into the reaction mixture, followed by extraction with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 0.23 g of 4- (1-neopentylpyrazol-3-yl) -3- (methylthio) pyridine.

 製造例8
 4-(4-メチル-1-ネオペンチルピラゾール-3-イル)-ピリジン(化合物4-40)の製造
Production Example 8
Preparation of 4- (4-methyl-1-neopentylpyrazol-3-yl) -pyridine (Compound 4-40)

Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043

 4-(4-メチルピラゾール-3-イル)-ピリジン 0.20g、ネオペンチルヨージド 0.37g、水素化ナトリウム(60%の鉱油混合物) 60mgおよびN,N-ジメチルホルムアミド 2mlの混合物を110℃で4時間攪拌した。放冷した反応混合物に飽和塩化アンモニウム水溶液を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(4-メチル-1-ネオペンチルピラゾール-3-イル)-ピリジン 0.26gを得た。 A mixture of 0.20 g of 4- (4-methylpyrazol-3-yl) -pyridine, 0.37 g of neopentyl iodide, 60 mg of sodium hydride (60% mineral oil mixture) and 2 ml of N, N-dimethylformamide at 110 ° C. For 4 hours. A saturated aqueous ammonium chloride solution was poured into the cooled reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 0.26 g of 4- (4-methyl-1-neopentylpyrazol-3-yl) -pyridine.

 製造例9
 4-(5-メチル-1-ネオペンチルピラゾール-3-イル)-ピリジン(化合物4-46)の製造
Production Example 9
Preparation of 4- (5-methyl-1-neopentylpyrazol-3-yl) -pyridine (Compound 4-46)

Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000044

 4-(5-メチルピラゾール-3-イル)-ピリジン 0.20g、ネオペンチルヨージド 0.37g、水素化ナトリウム(60%の鉱油混合物) 60mgおよびN,N-ジメチルホルムアミド 2mlの混合物を100℃で4時間攪拌した。放冷した反応混合物に飽和塩化アンモニウム水溶液を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(5-メチル-1-ネオペンチルピラゾール-3-イル)-ピリジン 0.26gを得た。 A mixture of 0.20 g of 4- (5-methylpyrazol-3-yl) -pyridine, 0.37 g of neopentyl iodide, 60 mg of sodium hydride (60% mineral oil mixture) and 2 ml of N, N-dimethylformamide at 100 ° C. For 4 hours. A saturated aqueous ammonium chloride solution was poured into the cooled reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 0.26 g of 4- (5-methyl-1-neopentylpyrazol-3-yl) -pyridine.

 製造例10
 4-(1-ネオペンチルピラゾール-3-イル)-ピリミジン(化合物4-51)の製造
Production Example 10
Preparation of 4- (1-Neopentylpyrazol-3-yl) -pyrimidine (Compound 4-51)

 4-(ピラゾール-3-イル)-ピリミジン 0.17g、ネオペンチルヨージド 0.45g、水素化ナトリウム(60%の鉱油混合物) 68mgおよびN,N-ジメチルホルムアミド 3mlの混合物を100℃で8時間攪拌した。放冷した反応混合物に水を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(1-ネオペンチルピラゾール-3-イル)-ピリミジン 0.14gを得た。 A mixture of 0.17 g of 4- (pyrazol-3-yl) -pyrimidine, 0.45 g of neopentyl iodide, 68 mg of sodium hydride (60% mineral oil mixture) and 3 ml of N, N-dimethylformamide at 100 ° C. for 8 hours Stir. Water was poured into the cooled reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The resulting residue was subjected to silica gel chromatography to obtain 0.14 g of 4- (1-neopentylpyrazol-3-yl) -pyrimidine.

 製造例11
 4-(1-ネオペンチルピラゾール-4-イル)-ピリジン(化合物4-84)の製造
Production Example 11
Preparation of 4- (1-Neopentylpyrazol-4-yl) -pyridine (Compound 4-84)

Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046

 4-(ピラゾール-4-イル)-ピリジン 0.18g、ネオペンチルヨージド 0.37g、水素化ナトリウム(60%の鉱油混合物) 59mgおよびN,N-ジメチルホルムアミド 2mlの混合物を100℃で4時間攪拌した。放冷した反応混合物に飽和塩化アンモニウム水溶液を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(1-ネオペンチルピラゾール-4-イル)-ピリジン 0.26gを得た。 A mixture of 0.18 g of 4- (pyrazol-4-yl) -pyridine, 0.37 g of neopentyl iodide, 59 mg of sodium hydride (60% mineral oil mixture) and 2 ml of N, N-dimethylformamide at 100 ° C. for 4 hours. Stir. A saturated aqueous ammonium chloride solution was poured into the cooled reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 0.26 g of 4- (1-neopentylpyrazol-4-yl) -pyridine.

 製造例12
 4-(1-ネオペンチル-[1,2,4]トリアゾール-3-イル)-ピリジン(化合物5-18)の製造
Production Example 12
Preparation of 4- (1-Neopentyl- [1,2,4] triazol-3-yl) -pyridine (Compound 5-18)

Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047

 4-([1,2,4]トリアゾール-3-イル)-ピリジン 0.25g、ネオペンチルヨージド 0.51g、水素化ナトリウム(60%の鉱油混合物) 82mgおよびN,N-ジメチルホルムアミド 2.5mlの混合物を100℃で2時間攪拌した。放冷した反応混合物に飽和塩化アンモニウム水溶液を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(1-ネオペンチル-[1,2,4]トリアゾール-3-イル)-ピリジン 0.15gを得た。 0.25 g of 4-([1,2,4] triazol-3-yl) -pyridine, 0.51 g of neopentyl iodide, 82 mg of sodium hydride (60% mineral oil mixture) and N, N-dimethylformamide 5 ml of the mixture was stirred at 100 ° C. for 2 hours. A saturated aqueous ammonium chloride solution was poured into the cooled reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 0.15 g of 4- (1-neopentyl- [1,2,4] triazol-3-yl) -pyridine).

 製造例13
 4-(3-ネオペンチルピラゾール-1-イル)-ピリジン(化合物6-18)の製造
Production Example 13
Preparation of 4- (3-Neopentylpyrazol-1-yl) -pyridine (Compound 6-18)

Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048

 3-ネオペンチルピラゾール 0.30g、4-クロロピリジン塩酸塩 1.64g、炭酸カリウム 1.51gおよびN-メチルピロリジノン 6mlの混合物を100℃で4時間攪拌した。放冷した反応混合物に飽和炭酸水素ナトリウム溶液を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(3-ネオペンチルピラゾール-1-イル)-ピリジン0.23gを得た。 A mixture of 0.30 g of 3-neopentylpyrazole, 1.64 g of 4-chloropyridine hydrochloride, 1.51 g of potassium carbonate and 6 ml of N-methylpyrrolidinone was stirred at 100 ° C. for 4 hours. Saturated sodium hydrogen carbonate solution was poured into the reaction mixture which had been allowed to cool, and then extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 0.23 g of 4- (3-neopentylpyrazol-1-yl) -pyridine.

 製造例14
 4-(3-ネオペンチル-[1,2,4]トリアゾール-1-イル)-ピリジン(化合物7-18)の製造
Production Example 14
Preparation of 4- (3-Neopentyl- [1,2,4] triazol-1-yl) -pyridine (Compound 7-18)

Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049

 3-ネオペンチル-[1,2,4]トリアゾール 0.35g、4-クロロピリジン塩酸塩1.62g、炭酸カリウム 1.50gおよびN-メチルピロリジノン 6mlの混合物を110℃で4時間攪拌した。放冷した反応混合物に飽和炭酸水素ナトリウム溶液を注加した後、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下に濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、4-(3-ネオペンチル-[1,2,4]トリアゾール-1-イル)-ピリジン 0.33gを得た。 A mixture of 0.35 g of 3-neopentyl- [1,2,4] triazole, 1.62 g of 4-chloropyridine hydrochloride, 1.50 g of potassium carbonate and 6 ml of N-methylpyrrolidinone was stirred at 110 ° C. for 4 hours. Saturated sodium hydrogen carbonate solution was poured into the reaction mixture which had been allowed to cool, and then extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The resulting residue was subjected to silica gel chromatography to obtain 0.33 g of 4- (3-neopentyl- [1,2,4] triazol-1-yl) -pyridine.

 以下、前述の実施製造例に記載の方法に準じた製造方法により製造される化合物を例示する。 Hereinafter, the compounds produced by the production method according to the method described in the above-mentioned Example Production Example will be exemplified.

 表中、Meはメチル基(CH3-)、Etはエチル基(CH3CH2-)、Prはプロピル基(CH3CH2CH2-)、i-Prはイソプロピル基((CH32CH-)、t-Buはtert-ブチル基((CH33C-)を表し、sec-Buはsec-ブチル基(CH3CH2CH(CH3)-)を表す。 In the table, Me is a methyl group (CH 3 —), Et is an ethyl group (CH 3 CH 2 —), Pr is a propyl group (CH 3 CH 2 CH 2 —), and i-Pr is an isopropyl group ((CH 3 )). 2 CH—) and t-Bu represent a tert-butyl group ((CH 3 ) 3 C—), and sec-Bu represents a sec-butyl group (CH 3 CH 2 CH (CH 3 ) —).

 表中、「(En」の列において、nが1である場合は、例えば「3-Me」のように示し、これは、EがHetで表されるヘテロ芳香環の3位に置換したメチル基であることを意味し、nが0である場合は、「-」のように示し、無置換であることを意味する。 In the table, in the column “(E 1 ) n ”, when n is 1, for example, “3-Me” is indicated, which is the 3-position of the heteroaromatic ring in which E 1 is represented by Het. It means that it is a substituted methyl group, and when n is 0, it is shown as “-”, which means that it is unsubstituted.

 式(A-1)で表される化合物。 Compound represented by formula (A-1).

Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050

 式中のJ-L-A基、(En、D、G及びmは、下記の〔表2〕~〔表3〕に記載の組み合わせを表す。以下、Qは下式を表す。 In the formula, the JLA group, (E 1 ) n , D, G and m represent the combinations described in the following [Table 2] to [Table 3]. Hereinafter, Q represents the following formula.

Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000051

Figure JPOXMLDOC01-appb-T000052
Figure JPOXMLDOC01-appb-T000052

Figure JPOXMLDOC01-appb-T000053
Figure JPOXMLDOC01-appb-T000053

 式(A-2)で表される化合物。 Compound represented by formula (A-2).

Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000054

 式中のJ-L-A基、(En、D、G及びmは、下記の〔表4〕~〔表5〕に記載の組み合わせを表す。 In the formula, the JLA group, (E 1 ) n , D, G and m represent the combinations described in the following [Table 4] to [Table 5].

Figure JPOXMLDOC01-appb-T000055
Figure JPOXMLDOC01-appb-T000055

Figure JPOXMLDOC01-appb-T000056
Figure JPOXMLDOC01-appb-T000056

 式(A-3)で表される化合物。 Compound represented by formula (A-3).

Figure JPOXMLDOC01-appb-C000057
Figure JPOXMLDOC01-appb-C000057

 式中のJ-L基、(E、D、G及びmは、下記の〔表6〕~〔表7〕に記載の組み合わせを表す。 The JL group, (E 1 ) p , D, G and m in the formula represent the combinations described in the following [Table 6] to [Table 7].

Figure JPOXMLDOC01-appb-T000058
Figure JPOXMLDOC01-appb-T000058

Figure JPOXMLDOC01-appb-T000059
Figure JPOXMLDOC01-appb-T000059

 式(A-4)で表される化合物。 Compound represented by formula (A-4).

Figure JPOXMLDOC01-appb-C000060
Figure JPOXMLDOC01-appb-C000060

 式中のJ-L基、(En、D、G及びmは、下記の〔表8〕~〔表12〕に記載の組み合わせを表す。 The JL group, (E 1 ) n , D, G and m in the formula represent the combinations described in the following [Table 8] to [Table 12].

Figure JPOXMLDOC01-appb-T000061
Figure JPOXMLDOC01-appb-T000061

Figure JPOXMLDOC01-appb-T000062
Figure JPOXMLDOC01-appb-T000062

Figure JPOXMLDOC01-appb-T000063
Figure JPOXMLDOC01-appb-T000063

Figure JPOXMLDOC01-appb-T000064
Figure JPOXMLDOC01-appb-T000064

Figure JPOXMLDOC01-appb-T000065
Figure JPOXMLDOC01-appb-T000065

 式(A-5)で表される化合物。 Compound represented by formula (A-5).

Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-C000066

 式中のJ-L基、E、D、G及びmは、下記の〔表13〕~〔表14〕に記載の組み合わせを表す。 The JL group, E 1 , D, G and m in the formula represent the combinations described in the following [Table 13] to [Table 14].

Figure JPOXMLDOC01-appb-T000067
Figure JPOXMLDOC01-appb-T000067

Figure JPOXMLDOC01-appb-T000068
Figure JPOXMLDOC01-appb-T000068

 式(A-6)で表される化合物。 Compound represented by formula (A-6).

Figure JPOXMLDOC01-appb-C000069
Figure JPOXMLDOC01-appb-C000069

 式中のJ-L-A基、(En、D、G及びmは、下記の〔表15〕~〔表18〕に記載の組み合わせを表す。 In the formula, the JLA group, (E 1 ) n , D, G and m represent the combinations described in the following [Table 15] to [Table 18].

Figure JPOXMLDOC01-appb-T000070
Figure JPOXMLDOC01-appb-T000070

Figure JPOXMLDOC01-appb-T000071
Figure JPOXMLDOC01-appb-T000071

Figure JPOXMLDOC01-appb-T000072
Figure JPOXMLDOC01-appb-T000072

Figure JPOXMLDOC01-appb-T000073
Figure JPOXMLDOC01-appb-T000073

式(A-7)で表される化合物。 A compound represented by formula (A-7).

Figure JPOXMLDOC01-appb-C000074
Figure JPOXMLDOC01-appb-C000074

式中のJ-L-A基、E、D、G及びmは、下記の〔表19〕~〔表20〕に記載の組み合わせを表す。 In the formula, JLA group, E 1 , D, G and m represent the combinations described in the following [Table 19] to [Table 20].

Figure JPOXMLDOC01-appb-T000075
Figure JPOXMLDOC01-appb-T000075

Figure JPOXMLDOC01-appb-T000076
Figure JPOXMLDOC01-appb-T000076

 〔表2〕~〔表20〕に記載した本発明化合物の物性値を下記の〔表21〕~〔表22〕に示す。 The physical properties of the compounds of the present invention described in [Table 2] to [Table 20] are shown in the following [Table 21] to [Table 22].

Figure JPOXMLDOC01-appb-T000077
Figure JPOXMLDOC01-appb-T000077

Figure JPOXMLDOC01-appb-T000078
Figure JPOXMLDOC01-appb-T000078

 次に本発明化合物の製剤例を示す。なお、部は重量部を表す。 Next, formulation examples of the compound of the present invention are shown. In addition, a part represents a weight part.

 製剤例1
 上述の化合物1-1から1-51、化合物2-1から2-34、化合物3-1から3-38、化合物4-1から4-104、化合物5-1から5-38、化合物6-1から6-102および化合物7-1から7-34のいずれか1種 10部を、キシレン35部とN,N-ジメチルホルムアミド35部との混合物に溶解し、ポリオキシエチレンスチリルフェニルエーテル14部およびドデシルベンゼンスルホン酸カルシウム6部を加え、混合して各々の乳剤を得る。
Formulation Example 1
Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- 10 parts of any one of 1 to 6-102 and compounds 7-1 to 7-34 are dissolved in a mixture of 35 parts of xylene and 35 parts of N, N-dimethylformamide, and 14 parts of polyoxyethylene styrylphenyl ether And 6 parts of calcium dodecylbenzenesulfonate are added and mixed to obtain each emulsion.

 製剤例2
 ラウリル硫酸ナトリウム4部、リグニンスルホン酸カルシウム2部、合成含水酸化珪素微粉末20部および珪藻土54部を混合し、更に上述の化合物1-1から1-51、化合物2-1から2-34、化合物3-1から3-38、化合物4-1から4-104、化合物5-1から5-38、化合物6-1から6-102および化合物7-1から7-34のいずれか1種 20部を加え、混合して各々の水和剤を得る。
Formulation Example 2
4 parts of sodium lauryl sulfate, 2 parts of calcium lignin sulfonate, 20 parts of synthetic silicon hydroxide-containing fine powder and 54 parts of diatomaceous earth were mixed, and the above-mentioned compounds 1-1 to 1-51, compounds 2-1 to 2-34, Any one of Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6-1 to 6-102, and Compounds 7-1 to 7-34 20 Add parts and mix to obtain each wettable powder.

 製剤例3
 上述の化合物1-1から1-51、化合物2-1から2-34、化合物3-1から3-38、化合物4-1から4-104、化合物5-1から5-38、化合物6-1から6-102および化合物7-1から7-34のいずれか1種 2部に、合成含水酸化珪素微粉末1部、リグニンスルホン酸カルシウム2部、ベントナイト30部およびカオリンクレー65部を加え混合する。ついで、この混合物に適当量の水を加え、さらに攪拌し、造粒機で製粒し、通風乾燥して各々の粒剤を得る。
Formulation Example 3
Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- Add 1 part of synthetic silicon hydrous fine powder, 2 parts of calcium lignin sulfonate, 30 parts of bentonite and 65 parts of kaolin clay to 2 parts of any one of 1 to 6-102 and compounds 7-1 to 7-34 To do. Next, an appropriate amount of water is added to the mixture, and the mixture is further stirred, granulated by a granulator, and dried by ventilation to obtain each granule.

 製剤例4
 上述の化合物1-1から1-51、化合物2-1から2-34、化合物3-1から3-38、化合物4-1から4-104、化合物5-1から5-38、化合物6-1から6-102および化合物7-1から7-34のいずれか1種 1部を適当量のアセトンに溶解し、これに合成含水酸化珪素微粉末5部、PAP0.3部およびフバサミクレー93.7部を加え、充分攪拌混合し、アセトンを蒸発除去して各々の粉剤を得る。
Formulation Example 4
Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- One part of any one of 1 to 6-102 and compounds 7-1 to 7-34 is dissolved in an appropriate amount of acetone, and 5 parts of a synthetic silicon hydroxide-containing fine powder, 0.3 part of PAP and 93.7 of Fusami clay 93.7 are mixed. Add parts, mix well, and evaporate and remove acetone to obtain each powder.

 製剤例5
 ポリオキシエチレンアルキルエーテルサルフェートアンモニウム塩およびホワイトカーボンの混合物(重量比1:1)35部と、上述の化合物1-1から1-51、化合物2-1から2-34、化合物3-1から3-38、化合物4-1から4-104、化合物5-1から5-38、化合物6-1から6-102および化合物7-1から7-34のいずれか1種 10部と、水55部とを混合し、湿式粉砕法で微粉砕することにより、各々の製剤を得る。
Formulation Example 5
35 parts of a mixture of polyoxyethylene alkyl ether sulfate ammonium salt and white carbon (weight ratio 1: 1), the above-mentioned compounds 1-1 to 1-51, compounds 2-1 to 2-34, compounds 3-1 to 3 -38, compounds 4-1 to 4-104, compounds 5-1 to 5-38, compounds 6-1 to 6-102, and compounds 7-1 to 7-34 10 parts and water 55 parts Are mixed and finely pulverized by a wet pulverization method to obtain each preparation.

 製剤例6
 上述の化合物1-1から1-51、化合物2-1から2-34、化合物3-1から3-38、化合物4-1から4-104、化合物5-1から5-38、化合物6-1から6-102および化合物7-1から7-34のいずれか1種 0.1部をキシレン5部およびトリクロロエタン5部に溶解し、これを脱臭灯油89.9部に混合して各々の油剤を得る。
Formulation Example 6
Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- 0.1 part of any one of 1 to 6-102 and compounds 7-1 to 7-34 is dissolved in 5 parts of xylene and 5 parts of trichloroethane, and this is mixed with 89.9 parts of deodorized kerosene to obtain each oil agent. Get.

 製剤例7
 上述の化合物1-1から1-51、化合物2-1から2-34、化合物3-1から3-38、化合物4-1から4-104、化合物5-1から5-38、化合物6-1から6-102および化合物7-1から7-34のいずれか1種 10mgをアセトン0.5mlに溶解し、この溶液を、動物用固形飼料粉末(飼育繁殖用固形飼料粉末CE-2、日本クレア株式会社商品)5gに処理し、均一に混合する。ついでアセトンを蒸発乾燥させて各々の毒餌を得る。
Formulation Example 7
Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- 10 mg of any one of 1 to 6-102 and compounds 7-1 to 7-34 is dissolved in 0.5 ml of acetone, and this solution is mixed with animal solid feed powder (bred breeding solid feed powder CE-2, Japan Treat to 5g, and mix evenly. Then, acetone is evaporated to dryness to obtain each poisonous bait.

 製剤例8
 上述の化合物1-1から1-51、化合物2-1から2-34、化合物3-1から3-38、化合物4-1から4-104、化合物5-1から5-38、化合物6-1から6-102および化合物7-1から7-34のいずれか1種 0.1部、ネオチオゾール(中央化成株式会社)49.9部をエアゾール缶に入れ、エアゾールバルブを装着した後、ジメチルエーテル25部、LPG25部を充填し振とうを加え、アクチュエータを装着することで油剤エアゾールを得る。
Formulation Example 8
Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- 0.1 part of any one of 1 to 6-102 and compounds 7-1 to 7-34 and 49.9 parts of neothiozole (Chuo Kasei Co., Ltd.) were placed in an aerosol can and fitted with an aerosol valve. The oil agent aerosol is obtained by filling the part and 25 parts of LPG, adding shaking, and mounting the actuator.

 製剤例9
 上述の化合物1-1から1-51、化合物2-1から2-34、化合物3-1から3-38、化合物4-1から4-104、化合物5-1から5-38、化合物6-1から6-102および化合物7-1から7-34のいずれか1種 0.6部、BHT(2,6-ジ-tert-ブチル-4-メチルフェノール)0.01部、キシレン5部、脱臭灯油3.39部および乳化剤{アトモス300(アトモスケミカル社登録商標名)}1部を混合溶解したものと、蒸留水50部とをエアゾール容器に充填し、バルブを装着した後、該バルブを通じて噴射剤(LPG)40部を加圧充填して水性エアゾールを得る。
Formulation Example 9
Compounds 1-1 to 1-51, Compounds 2-1 to 2-34, Compounds 3-1 to 3-38, Compounds 4-1 to 4-104, Compounds 5-1 to 5-38, Compounds 6- 0.6 part of any one of 1 to 6-102 and compounds 7-1 to 7-34, 0.01 part of BHT (2,6-di-tert-butyl-4-methylphenol), 5 parts of xylene, Deodorized kerosene 3.39 parts and emulsifier {Atmos 300 (registered trademark name of Atmos Chemical Co., Ltd.)} 1 part mixed and dissolved, and distilled water 50 parts are filled in an aerosol container, and after attaching the valve, Aqueous aerosol is obtained by pressure filling 40 parts of propellant (LPG).

 次に、本発明化合物の有害生物防除効力を試験例により示す。 Next, the pest control effect of the compound of the present invention is shown by test examples.

 試験例1
 製剤例5により得られた本発明化合物の製剤を有効成分濃度が500ppmとなるように水で希釈し、試験用薬液を調製した。
Test example 1
The preparation of the compound of the present invention obtained in Formulation Example 5 was diluted with water so that the active ingredient concentration was 500 ppm to prepare a test drug solution.

 ポリエチレンカップに植えた第2葉展開期のイネ幼苗に、上記試験用薬液10mlを散布した。風乾後、トビイロウンカの3~4齢幼虫を20頭放して、25℃の温室内に保管した。6日後イネに寄生したトビイロウンカの数を調査し、下式により防除価を求めた。 10 ml of the test chemical solution was sprayed on rice seedlings in the second leaf development stage planted in a polyethylene cup. After air drying, 20 3-4 instar larvae of the brown planthopper were released and stored in a greenhouse at 25 ° C. Six days later, the number of brown planthoppers infested with rice was investigated, and the control value was determined by the following formula.

  防除価(%)={1-(Cb×Tai)/(Cai×Tb)}×100
なお、式中の文字は以下の意味を表す。
Control value (%) = {1− (Cb × Tai) / (Cai × Tb)} × 100
In addition, the character in a formula represents the following meaning.

  Cb:無処理区の処理前の虫数
  Cai:無処理区の観察時の虫数
  Tb:処理区の処理前の虫数
  Tai:処理区の観察時の虫数
 その結果、下記の本発明化合物の試験用散布液の処理区が、防除価90%以上を示した。
化合物1-18、2-18、3-18、3-35、4-18、4-19、4-24、4-25、4-27、4-30、4-36、4-38、4-40、4-42、4-46、4-48、4-51、4-84、4-101、4-102、4-103、5-18、5-36、6-18、7-18。
Cb: number of insects before treatment in the untreated group Cai: number of insects when observed in the untreated group Tb: number of insects before treatment in the treated group Tai: number of insects when observed in the treated group As a result, the following compounds of the present invention The treatment group of the spray liquid for the test showed a control value of 90% or more.
Compounds 1-18, 2-18, 3-18, 3-35, 4-18, 4-19, 4-24, 4-25, 4-27, 4-30, 4-36, 4-38, 4 -40, 4-42, 4-46, 4-48, 4-51, 4-84, 4-101, 4-102, 4-103, 5-18, 5-36, 6-18, 7-18 .

 試験例2
 製剤例5により得られた本発明化合物の製剤を有効成分濃度が500ppmとなるように水で希釈し、試験用散布液を調製した。
Test example 2
The preparation of the compound of the present invention obtained in Formulation Example 5 was diluted with water so that the active ingredient concentration was 500 ppm to prepare a test spray solution.

 一方、プラスチックカップに植えたキュウリ幼苗(第1本葉展開期)にワタアブラムシ約30頭を接種し、1日間放置した。この幼苗に、前記希釈液20mlを各々散布した。 On the other hand, about 30 cotton aphids were inoculated into cucumber seedlings (first true leaf development stage) planted in plastic cups and left for 1 day. Each of these seedlings was sprayed with 20 ml of the diluted solution.

 散布6日後に該キュウリの葉上に寄生したワタアブラムシ生存虫数を調査し、以下の式により防除価を求めた。 6 days after spraying, the number of live cotton aphids that parasitized on the cucumber leaves was investigated, and the control value was determined by the following formula.

  防除価(%)={1-(Cb×Tai)/(Cai×Tb)}×100
なお、式中の文字は以下の意味を表す。
Control value (%) = {1− (Cb × Tai) / (Cai × Tb)} × 100
In addition, the character in a formula represents the following meaning.

  Cb:無処理区の処理前の虫数
  Cai:無処理区の観察時の虫数
  Tb:処理区の処理前の虫数
  Tai:処理区の観察時の虫数
 その結果、下記の本発明化合物の試験用散布液の処理区が、防除価90%以上を示した。
化合物1-18、2-18、3-18、4-18、4-19、4-24、4-25、4-27、4-30、4-36、4-40、4-46、4-48、4-51、4-84、4-101、4-102、5-18、5-36、6-18、7-18。
Cb: number of insects before treatment in the untreated group Cai: number of insects when observed in the untreated group Tb: number of insects before treatment in the treated group Tai: number of insects when observed in the treated group As a result, the following compounds of the present invention The treatment group of the spray liquid for the test showed a control value of 90% or more.
Compounds 1-18, 2-18, 3-18, 4-18, 4-19, 4-24, 4-25, 4-27, 4-30, 4-36, 4-40, 4-46, 4 -48, 4-51, 4-84, 4-101, 4-102, 5-18, 5-36, 6-18, 7-18.

 本発明化合物は、有害生物の防除に有用である。 The compound of the present invention is useful for controlling pests.

Claims (16)

 式(1)
Figure JPOXMLDOC01-appb-C000001
〔式中、
 Hetは、下式H1、H2、H3、H4またはH5:
Figure JPOXMLDOC01-appb-C000002
{式中、
 Yは、-O-、-S-または-NE-を表し、YおよびYは、同一または相異なり、-CE=または-N=を表し、YおよびYの少なくとも一方は-CE=であり、Z、ZおよびZは、同一または相異なり、-CE=または-N=を表し(ここでEは1個以上のハロゲン原子を有していてもよいC1-C2アルキル基、水素原子またはハロゲン原子を表し、Eは1個以上のハロゲン原子を有していてもよいC1-C2アルキル基を表す。)、構造式の左側の「・」印がAと結合する位置を表す。}で示される5員ヘテロ環を表し、
 Jは、下式J1またはJ2:
Figure JPOXMLDOC01-appb-C000003
(式中、
 R1およびR2は、同一または相異なり、1個以上のハロゲン原子を有していてもよいC1-C3アルキル基を表し、
 R3は、1個以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、ハロゲン原子または水素原子を表し、
 R4およびR5は、同一または相異なり、メチル基またはエチル基を表し、
 R6は、水素原子またはC1-C6鎖式炭化水素基を表す。)で示される基を表し、
 Lは、単結合または1個以上のハロゲン原子を有していてもよいC1-C3アルキレン基を表し、
 Aは、Hetが式H1、H2、H3またはH5で示される基のとき、単結合、-O-、または-S(O)x-を表し(ここで、xは、0、1または2を表す。)、Hetが式H4で示される基のとき、単結合を表し、
 Gは、水素原子、ハロゲン原子、ニトロ基、シアノ基、水酸基、メルカプト基もしくはアミノ基を表すか、または、下式G1、G2、G3もしくはG4:
Figure JPOXMLDOC01-appb-C000004
(式中、
 Raは、<群α>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基、シクロプロピル基または-C(O)-T1を表し、
 Rbは、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基、-C(O)-T、-S(O)2-T、C3-C9トリアルキルシリル基またはシクロプロピル基を表し、
 Rcは、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基、-C(O)-Tまたはシクロプロピル基を表し、
 zは0、1または2を表し、
 Rdは、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基、-C(O)-T2、-S(O)2-Tまたはシクロプロピル基を表し、
 Reは、<群β>より選ばれる1個以上の原子もしくは基を有していてもよいC1-C6鎖式炭化水素基、水素原子またはシクロプロピル基を表し、
 T1は、1個以上のハロゲン原子を有していてもよいC1-C6アルキル基、1個以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1個以上のハロゲン原子を有していてもよいC1-C6アルキルアミノ基、1個以上のハロゲン原子を有していてもよいC2-C12ジアルキルアミノ基、水酸基、アミノ基、水素原子またはシクロプロピル基を表し、
 Tは、1個以上のハロゲン原子を有していてもよいC1-C6アルキル基、1個以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1個以上のハロゲン原子を有していてもよいC1-C6アルキルアミノ基、1個以上のハロゲン原子を有していてもよいC2-C12ジアルキルアミノ基、アミノ基、水素原子またはシクロプロピル基を表し、
 Tは、1個以上のハロゲン原子を有していてもよいC1-C6アルキル基を表す。)で示される基を表し、
 Dは-N=または-CH=を表し、
 mは0または1を表す。
<群α>:1個以上のハロゲン原子を有していてもよいC1-C4アルコキシ基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルチオ基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルスルホニル基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルアミノ基、1個以上のハロゲン原子を有していてもよいC2-C8ジアルキルアミノ基、ハロゲン原子、シアノ基、C3-C9トリアルキルシリル基およびシクロプロピル基からなる群、
<群β>:1個以上のハロゲン原子を有していてもよいC1-C4アルコキシ基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルチオ基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルスルホニル基、1個以上のハロゲン原子を有していてもよいC1-C4アルキルアミノ基、1個以上のハロゲン原子を有していてもよいC2-C8ジアルキルアミノ基、フェニル基(該フェニル基は、メチル基、メトキシ基、塩素原子およびニトロ基からなる群より選ばれる1個以上の基を有していてもよい。)、ハロゲン原子、シアノ基、C3-C9トリアルキルシリル基およびシクロプロピル基からなる群。
 但し、下記(1)~(6)に該当する化合物を除く:
 (1)Hetが式H1で示される基であり、Yが-S-であり、YおよびYが-CH=であり、Aが-O-であり、Lが単結合であり、Jが式J1で示される基であり、かつ、R1、R2およびR3がいずれもメチル基であり、Gが水素原子であり、Dが-CH=であり、mが0である化合物、
 (2)Hetが式H1で示される基であり、Yが-O-であり、YおよびYが-CH=であり、AおよびLが単結合であり、Jが式J2で示される基であり、かつ、R、RおよびRがいずれもメチル基であり、Gが水素原子であり、Dが-CH=であり、mが0である化合物、
 (3)Hetが式H3で示される基であり、Yが-S-であり、Yが-N=であり、Yが-CH=であり、AおよびLが単結合であり、Jが式J1で示される基であり、かつ、R、RおよびRがいずれもメチル基であり、Gが水素原子であり、Dが-CH=であり、mが0である化合物、
 (4)Hetが式H4で示される基であり、Zが-CH=であり、Zが-N=であり、Zが-CI=であり、(ここで、Iはヨウ素原子である。)AおよびLが単結合であり、Jが式J1で示される基であり、R1およびR2がいずれもメチル基であり、かつ、R3が水素原子であり、Gが水素原子であり、Dが-N=であり、mが0である化合物、
 (5)Hetが式H4で示される基であり、Zが-N=であり、ZおよびZが-CH=であり、AおよびLが単結合であり、Jが式J1で示される基であり、R1およびR2がいずれもメチル基であり、かつ、R3が水素原子またはメチル基であり、Gが水素原子であり、Dが-CH=または-N=であり、mが0である化合物、および
 (6)Hetが式H5で示される基であり、Zが-N=であり、Zが-C(CH)=であり、Zが-CH=であり、Aが-O-であり、Lが単結合であり、Jが式J1で示される基であり、R1およびR2がいずれもメチル基であり、かつ、R3が水素原子であり、Gが水素原子であり、Dが-CH=であり、mが0である化合物。〕
で示されるヘテロ芳香環化合物。
Formula (1)
Figure JPOXMLDOC01-appb-C000001
[Where,
Het is represented by the following formula H1, H2, H3, H4 or H5:
Figure JPOXMLDOC01-appb-C000002
{Where,
Y 1 represents —O—, —S— or —NE 2 —, Y 2 and Y 3 are the same or different and represent —CE 1 ═ or —N═, and at least one of Y 2 and Y 3 Are —CE 1 ═, Z 1 , Z 2 and Z 3 are the same or different and represent —CE 1 ═ or —N═ (where E 1 has one or more halogen atoms) Represents a C1-C2 alkyl group, a hydrogen atom or a halogen atom, and E 2 represents a C1-C2 alkyl group which may have one or more halogen atoms.) The mark represents the position where A is combined. } Represents a 5-membered heterocycle represented by
J is the following formula J1 or J2:
Figure JPOXMLDOC01-appb-C000003
(Where
R 1 and R 2 are the same or different and each represents a C1-C3 alkyl group optionally having one or more halogen atoms,
R 3 represents a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a halogen atom or a hydrogen atom,
R 4 and R 5 are the same or different and each represents a methyl group or an ethyl group;
R 6 represents a hydrogen atom or a C1-C6 chain hydrocarbon group. ) Represents a group represented by
L represents a single bond or a C1-C3 alkylene group which may have one or more halogen atoms,
A represents a single bond, —O—, or —S (O) x — when Het is a group represented by the formula H1, H2, H3 or H5 (where x represents 0, 1 or 2). And represents a single bond when Het is a group represented by formula H4,
G represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a hydroxyl group, a mercapto group or an amino group, or the following formulas G1, G2, G3 or G4:
Figure JPOXMLDOC01-appb-C000004
(Where
R a represents a C1-C6 chain hydrocarbon group, a cyclopropyl group or —C (O) —T 1 which may have one or more atoms or groups selected from <Group α>;
R b is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, —C (O) —T 2 , —S (O) 2 —. T 3 represents a C3-C9 trialkylsilyl group or a cyclopropyl group,
R c represents a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, —C (O) —T 2 or a cyclopropyl group;
z represents 0, 1 or 2;
R d is a C1-C6 chain hydrocarbon group which may have one or more atoms or groups selected from <Group β>, —C (O) —T 2 , —S (O) 2 —. Represents T 3 or a cyclopropyl group,
R e represents a C1-C6 chain hydrocarbon group, hydrogen atom or cyclopropyl group which may have one or more atoms or groups selected from <Group β>;
T 1 has a C1-C6 alkyl group which may have one or more halogen atoms, a C1-C6 alkoxy group which may have one or more halogen atoms, and one or more halogen atoms. An optionally substituted C1-C6 alkylamino group, an optionally substituted C2-C12 dialkylamino group, a hydroxyl group, an amino group, a hydrogen atom or a cyclopropyl group,
T 2 has a C1-C6 alkyl group which may have one or more halogen atoms, a C1-C6 alkoxy group which may have one or more halogen atoms, and one or more halogen atoms. An optionally substituted C1-C6 alkylamino group, an optionally substituted C2-C12 dialkylamino group, an amino group, a hydrogen atom or a cyclopropyl group,
T 3 represents a C1-C6 alkyl group which may have one or more halogen atoms. ) Represents a group represented by
D represents —N═ or —CH═,
m represents 0 or 1;
<Group α>: C1-C4 alkoxy group which may have one or more halogen atoms, C1-C4 alkylthio group which may have one or more halogen atoms, one or more halogen atoms C1-C4 alkylsulfinyl group which may have one, C1-C4 alkylsulfonyl group which may have one or more halogen atoms, C1-C4 alkyl which may have one or more halogen atoms A group consisting of an amino group, a C2-C8 dialkylamino group optionally having one or more halogen atoms, a halogen atom, a cyano group, a C3-C9 trialkylsilyl group, and a cyclopropyl group;
<Group β>: C1-C4 alkoxy group which may have one or more halogen atoms, C1-C4 alkylthio group which may have one or more halogen atoms, one or more halogen atoms C1-C4 alkylsulfinyl group which may have one, C1-C4 alkylsulfonyl group which may have one or more halogen atoms, C1-C4 alkyl which may have one or more halogen atoms An amino group, a C2-C8 dialkylamino group optionally having one or more halogen atoms, a phenyl group (the phenyl group is one selected from the group consisting of a methyl group, a methoxy group, a chlorine atom and a nitro group) And a group consisting of a halogen atom, a cyano group, a C3-C9 trialkylsilyl group, and a cyclopropyl group.
However, the compounds corresponding to the following (1) to (6) are excluded:
(1) Het is a group represented by the formula H1, Y 1 is —S—, Y 2 and Y 3 are —CH═, A is —O—, L is a single bond, A compound in which J is a group represented by formula J1, R 1 , R 2 and R 3 are all methyl groups, G is a hydrogen atom, D is —CH═ and m is 0 ,
(2) Het is a group represented by the formula H1, Y 1 is —O—, Y 2 and Y 3 are —CH═, A and L are single bonds, and J is represented by the formula J2. A compound in which R 4 , R 5 and R 6 are all methyl groups, G is a hydrogen atom, D is —CH═, and m is 0,
(3) Het is a group represented by the formula H3, Y 1 is —S—, Y 2 is —N═, Y 3 is —CH═, A and L are single bonds, A compound in which J is a group represented by formula J1, R 4 , R 5 and R 6 are all methyl groups, G is a hydrogen atom, D is —CH═ and m is 0 ,
(4) Het is a group represented by the formula H4, Z 1 is —CH═, Z 2 is —N═, Z 3 is —CI═ (where I is an iodine atom, A) and L are single bonds, J is a group represented by the formula J1, R 1 and R 2 are both methyl groups, R 3 is a hydrogen atom, and G is a hydrogen atom A compound in which D is -N = and m is 0,
(5) Het is a group represented by the formula H4, Z 1 is —N═, Z 2 and Z 3 are —CH═, A and L are single bonds, and J is represented by the formula J1. R 1 and R 2 are both methyl groups, R 3 is a hydrogen atom or a methyl group, G is a hydrogen atom, D is —CH═ or —N═, a compound in which m is 0, and (6) Het is a group represented by the formula H5, Z 1 is —N═, Z 2 is —C (CH 3 ) ═, and Z 3 is —CH═. A is —O—, L is a single bond, J is a group represented by the formula J1, R 1 and R 2 are both methyl groups, and R 3 is a hydrogen atom. A compound in which G is a hydrogen atom, D is —CH═, and m is 0. ]
The heteroaromatic ring compound shown by these.
 Hetが式H1で示される基である請求項1に記載のヘテロ芳香環化合物。 The heteroaromatic ring compound according to claim 1, wherein Het is a group represented by the formula H1.  Yが-S-または-O-である請求項2に記載のヘテロ芳香環化合物。 The heteroaromatic ring compound according to claim 2, wherein Y 1 is -S- or -O-.  Yが-S-である請求項2に記載のヘテロ芳香環化合物。 The heteroaromatic ring compound according to claim 2, wherein Y 1 is -S-.  Hetが式H1、H2またはH3で示される基であり、Yが-S-である請求項1に記載のヘテロ芳香環化合物。 The heteroaromatic ring compound according to claim 1 , wherein Het is a group represented by the formula H1, H2 or H3, and Y 1 is -S-.  Hetが式H4で示される基である請求項1に記載のヘテロ芳香環化合物。 The heteroaromatic ring compound according to claim 1, wherein Het is a group represented by the formula H4.  Zが-N=であり、Zが-CE=であり、かつ、Zが-CE=または-N=であるか、あるいは、Zが-CE=であり、Zが-N=であり、かつ、Zが-CE=である請求項6に記載のヘテロ芳香環化合物。 Z 1 is -N =, Z 2 is -CE 1 = and Z 3 is -CE 1 = or -N =, or Z 1 is -CE 1 = and Z 2 The heteroaromatic ring compound according to claim 6, wherein is -N = and Z 3 is -CE 1 =.  Zが-N=であり、ZおよびZが同一または相異なり-CE=であるか、あるいは、Zが-N=であり、ZおよびZが同一または相異なり-CE=である請求項7に記載のヘテロ芳香環化合物。 Z 1 is -N = and Z 2 and Z 3 are the same or different -CE 1 =, or Z 2 is -N = and Z 1 and Z 3 are the same or different -CE The heteroaromatic ring compound according to claim 7, wherein 1 =.  ZおよびZが-N=であり、Zが-CE=である請求項6に記載のヘテロ芳香環化合物。 The heteroaromatic ring compound according to claim 6, wherein Z 1 and Z 3 are -N = and Z 2 is -CE 1 =.  Hetが式H5で示される基である請求項1に記載のヘテロ芳香環化合物。 The heteroaromatic ring compound according to claim 1, wherein Het is a group represented by the formula H5.  Zが-N=であり、Zが-CE=であり、かつ、Zが-CE=または-N=であるか、あるいは、Zが-CE=であり、Zが-N=であり、かつ、Zが-CE=である請求項10に記載のヘテロ芳香環化合物。 Z 1 is -N =, Z 2 is -CE 1 = and Z 3 is -CE 1 = or -N =, or Z 1 is -CE 1 = and Z 2 The heteroaromatic ring compound according to claim 10, wherein is -N =, and Z 3 is -CE 1 =.  Zが-N=であり、ZおよびZが同一または相異なり-CE=であるか、あるいは、Zが-N=であり、ZおよびZが同一または相異なり-CE=である請求項11に記載のヘテロ芳香環化合物。 Z 1 is -N = and Z 2 and Z 3 are the same or different -CE 1 =, or Z 2 is -N = and Z 1 and Z 3 are the same or different -CE The heteroaromatic ring compound according to claim 11, wherein 1 =.  ZおよびZが-N=であり、Zが-CE=である請求項10に記載のヘテロ芳香環化合物。 The heteroaromatic ring compound according to claim 10, wherein Z 1 and Z 3 are -N =, and Z 2 is -CE 1 =.  請求項1~請求項13のいずれか一項に記載のヘテロ芳香環化合物と不活性担体とを含有する有害生物防除剤。 A pest control agent comprising the heteroaromatic ring compound according to any one of claims 1 to 13 and an inert carrier.  有害生物を防除するための請求項1~請求項13のいずれか一項に記載のヘテロ芳香環化合物の使用。 Use of the heteroaromatic ring compound according to any one of claims 1 to 13 for controlling pests.  請求項1~請求項13のいずれか一項に記載のヘテロ芳香環化合物の有効量を有害生物又は有害生物の生息場所に施用する工程を含む有害生物の防除方法。 A method for controlling pests, comprising a step of applying an effective amount of the heteroaromatic ring compound according to any one of claims 1 to 13 to pests or habitats of pests.
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