WO2012070508A1 - Ceramic member and method for producing same, device and method for producing molten glass, and device and method for producing glass article - Google Patents
Ceramic member and method for producing same, device and method for producing molten glass, and device and method for producing glass article Download PDFInfo
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- WO2012070508A1 WO2012070508A1 PCT/JP2011/076730 JP2011076730W WO2012070508A1 WO 2012070508 A1 WO2012070508 A1 WO 2012070508A1 JP 2011076730 W JP2011076730 W JP 2011076730W WO 2012070508 A1 WO2012070508 A1 WO 2012070508A1
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
- C04B35/481—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates containing silicon, e.g. zircon
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/08—Metallic material containing only metal elements
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/167—Means for preventing damage to equipment, e.g. by molten glass, hot gases, batches
- C03B5/1672—Use of materials therefor
- C03B5/1675—Platinum group metals
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- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/225—Refining
- C03B5/2252—Refining under reduced pressure, e.g. with vacuum refiners
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/42—Details of construction of furnace walls, e.g. to prevent corrosion; Use of materials for furnace walls
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- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
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- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
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Definitions
- the present invention relates to a method for producing a ceramic member, a ceramic member obtained by the production method, a production apparatus for molten glass provided with the ceramic member, a production method for molten glass using the production apparatus, and a glass article comprising the ceramic member.
- the manufacturing apparatus of this invention and the manufacturing method of the glass article using this manufacturing apparatus.
- a glass product such as a glass plate is obtained by producing molten glass from a glass raw material and molding the molten glass with a molding apparatus.
- a method using a vacuum degassing device was proposed to remove bubbles generated in the molten glass after melting the glass raw material in the melting tank and before molding with the molding device (For example, Patent Document 1).
- Such a vacuum degassing apparatus includes a vacuum degassing tank whose inside is maintained at a predetermined degree of vacuum, and when the molten glass passes through the vacuum degassing tank, the bubbles contained in the molten glass are compared.
- the temperature of the molten glass flowing out of the melting tank is, for example, about 1200 to 1600 ° C. in the case of soda lime glass, but the temperature of the molten glass introduced into the vacuum degassing apparatus for effective vacuum degassing. Is about 1000 to 1500 ° C., and the temperature of the molten glass introduced into the vacuum degassing vessel is about 1000 to 1400 ° C.
- a ceramic member such as an electroformed brick is used.
- a method of coating an electroformed brick with a metal film has also been proposed.
- a concave portion for anchor is formed on the surface of the electroformed brick.
- a method is described in which a metal sprayed film is formed so as to fill the concave portion, thereby improving the adhesion strength between the electroformed brick and the metal film and suppressing the peeling of the metal film.
- the adhesion strength between the electroformed brick and the metal film is not necessarily sufficient.
- the anchor effect by the recesses has a small effect of improving the adhesion strength against the tensile force in the thickness direction of the metal film.
- the present invention has been made in view of the above circumstances, and is a method of manufacturing a ceramic member having a ceramic base material such as an electroformed brick and a metal sprayed coating covering the surface thereof. It aims at providing the manufacturing method of the ceramic member excellent in the improvement effect of the adhesive strength with a film
- the present invention also provides a ceramic member obtained by such a manufacturing method, a manufacturing apparatus for molten glass provided with the ceramic member, a manufacturing method for molten glass using the manufacturing apparatus, a manufacturing apparatus for glass articles provided with the ceramic member, And it aims at providing the manufacturing method of the glass article using this manufacturing apparatus.
- the inventors of the present invention formed a metal sprayed film on a ceramic substrate containing a glass phase of a predetermined amount or more, and then heat-treated under specific conditions, in particular, the thickness of the metal sprayed film. It has been found that the adhesion strength between the ceramic substrate and the metal sprayed film against the tensile force in the direction is remarkably improved. Moreover, when this heat processing was performed, it also discovered that it became the state with which the glass phase was filled in the micro space of the interface of a ceramic base material and a metal sprayed film, and came to complete this invention.
- the method for producing a ceramic member according to the present invention is a method for producing a ceramic member having a temperature of less than 1500 ° C. in use, and comprises electrocast brick or zircon as a main component containing 3 to 30% by mass of a glass phase. After forming a sprayed film of at least one metal selected from the group consisting of platinum group metals and alloys mainly composed of one or more platinum group metals on a ceramic base material composed of sintered bricks, It has the process of heat-processing at the temperature of 1500 degreeC or more.
- the temperature during use is preferably 1400 ° C. or lower. It is preferable that a regular anchor recess is formed on the surface of the ceramic substrate, and the metal sprayed film is formed on the anchor recess.
- the ceramic member of the present invention is a ceramic member obtained by the manufacturing method of the present invention, wherein a glass phase is filled in a space at an interface between the ceramic base material and the metal sprayed film.
- the ceramic member of the present invention is a ceramic member having a ceramic base material and a metal sprayed film provided on the surface of the ceramic member, and the temperature at the time of use is less than 1500 ° C., wherein the metal is a platinum group metal.
- the ceramic member of the present invention preferably has a temperature during use of 1400 ° C. or lower. It is preferable that a regular anchor recess is formed on the surface of the ceramic substrate, and the metal sprayed film is formed so as to fill the anchor recess.
- the present invention provides a molten glass manufacturing apparatus in which the ceramic member of the present invention is used as a member that contacts molten glass of less than 1500 ° C. In the present invention, it is preferable that the ceramic member of the present invention is used for a member that contacts molten glass of 1400 ° C. or lower.
- the present invention includes 3 to 30% by mass of a glass phase in which a sprayed film of at least one metal selected from the group consisting of platinum group metals and alloys composed mainly of one or more platinum group metals is formed.
- a ceramic substrate made of electrocast brick or sintered brick mainly composed of zircon constituting at least a part of a portion of the molten glass manufacturing apparatus in contact with the molten glass of less than 1500 ° C.
- manufacturing the molten glass Provided is an apparatus for producing molten glass obtained by heat-treating at least the ceramic substrate of the apparatus at a temperature of 1500 ° C. or higher.
- the present invention uses a ceramic base material composed of electrocast bricks or sintered bricks mainly composed of zircon containing 3 to 30% by mass of a glass phase, and is in contact with molten glass of less than 1500 ° C. in a molten glass production apparatus.
- At least one metal selected from the group consisting of a platinum group metal and an alloy containing at least one platinum group metal as a main component is provided on at least a part of the ceramic base material.
- a molten glass manufacturing apparatus obtained by heat-treating at least a ceramic substrate on which a metal sprayed film is formed in a molten glass manufacturing apparatus at a temperature of 1500 ° C. or higher.
- This invention provides the manufacturing method of a molten glass which manufactures a molten glass using the manufacturing apparatus of the molten glass of this invention.
- the present invention has a means for producing molten glass, a shaping means for shaping the obtained molten glass, and a slow cooling means for gradually cooling the glass after molding, and a member that contacts the molten glass at a temperature lower than 1500 ° C. Furthermore, a glass article manufacturing apparatus in which the ceramic member of the present invention is used is provided.
- the present invention has a means for manufacturing molten glass, a forming means for forming the obtained molten glass, and a slow cooling means for gradually cooling the glass after forming, and a member that contacts the molten glass at 1400 ° C. or lower.
- the ceramic member of the present invention includes 3 to 30% by mass of a glass phase in which a sprayed film of at least one metal selected from the group consisting of platinum group metals and alloys composed mainly of one or more platinum group metals is formed.
- a ceramic substrate made of electrocast brick or sintered brick mainly composed of zircon constituting at least a part of a portion of the molten glass manufacturing apparatus in contact with the molten glass of less than 1500 ° C., manufacturing the molten glass An apparatus for producing molten glass obtained by heat-treating at least the ceramic substrate of the apparatus at a temperature of 1500 ° C.
- the present invention uses a ceramic base material composed of electrocast bricks or sintered bricks mainly composed of zircon containing 3 to 30% by mass of a glass phase, and is in contact with molten glass of less than 1500 ° C. in a molten glass production apparatus. At least one metal selected from the group consisting of a platinum group metal and an alloy containing at least one platinum group metal as a main component is provided on at least a part of the ceramic base material.
- a molten glass manufacturing apparatus is formed by heat-treating a ceramic substrate on which at least the metal sprayed film of the molten glass manufacturing apparatus is formed at a temperature of 1500 ° C. or higher.
- a glass article manufacturing apparatus having a glass forming apparatus for performing cooling and a slow cooling apparatus for gradually cooling the formed glass. This invention provides the manufacturing method of a glass article which manufactures a glass article using the manufacturing apparatus of the glass article of this invention.
- a part of the glass phase is present in a space at the interface between the ceramic base material having a glass phase and a metal spray coating (hereinafter also referred to as a metal spray coating) covering the surface thereof.
- a metal spray coating hereinafter also referred to as a metal spray coating
- the apparatus for producing molten glass of the present invention is excellent in corrosion resistance against molten glass because the surface of the member in contact with the molten glass is coated with the metal sprayed film, and the metal sprayed film is difficult to peel off. Excellent. By using the apparatus for producing molten glass of the present invention, it is possible to stably produce molten glass and glass articles.
- Example 3 it is a graph which shows the heat history used when melting and solidifying a glass raw material within the container which consists of a ceramic member.
- the results of Example 3 are shown, in which (a) is a cross-sectional photograph of glass solidified in a container made of a ceramic member, and (b) is a graph showing measurement results of ⁇ -OH values.
- the results of Comparative Example 2 are shown, in which (a) is a cross-sectional photograph of glass solidified in a container made of a ceramic member, and (b) is a graph showing measurement results of ⁇ -OH values.
- Comparative Example 3 The results of Comparative Example 3 are shown, in which (a) is a cross-sectional photograph of glass solidified in a container made of a ceramic member, and (b) is a graph showing measurement results of ⁇ -OH values. It is a cross-sectional photograph of the glass solidified in the container which consists of a ceramic member obtained in Reference Example 1. 6 is a graph showing the measurement result of ⁇ -OH value in Reference Example 1.
- FIG. 1 is a cross-sectional view showing an embodiment of the ceramic member of the present invention.
- Reference numeral 1 denotes a ceramic base material
- reference numeral 2 denotes a metal sprayed film
- reference numeral 3 denotes an anchor recess.
- the ceramic member of the present invention has a ceramic base material 1 and a metal sprayed film 2 provided on the surface thereof, and oozes out from the ceramic base material into a space at the interface between the ceramic base material 1 and the metal sprayed film 2.
- the filled glass phase (not shown) is filled.
- ⁇ Ceramic substrate> As the ceramic substrate 1, a brick containing 3 to 30% by mass of a glass phase is used. In order to obtain corrosion resistance to the molten glass, bricks having high density are preferable. From this viewpoint, electrocast bricks mainly composed of zirconia and the like described below or sintered bricks mainly composed of zircon are used. When the content of the glass phase is less than 3% by mass, a phenomenon that the glass phase exudes from the ceramic substrate 1 hardly occurs when heat treatment described later is performed. If it exceeds 30% by mass, the amount of oozing out of the glass phase increases and the metal sprayed film tends to swell.
- An electroformed brick is a brick that has at least one component selected from the group consisting of zirconia, alumina, silicate alumina, zircon-mullite, silica, and titania, and is cast by melting these raw materials completely in an electric furnace. , Consisting essentially of a crystal phase and a glass phase. In the present invention, one having a glass phase content of 3 to 30% by mass can be selected from known electroformed bricks.
- the content of the glass phase in the ceramic substrate in the present invention is a value obtained by obtaining the area ratio of the glass phase relative to the total area of the crystal phase and the glass phase based on the cross-sectional photograph and converting this to the mass ratio. It is.
- a glass phase and a crystal Obtained by binarizing the phase are formed by binarizing the phase.
- the electroformed brick used in the present invention include AZS (Al 2 O 3 —SiO 2 —ZrO 2 ) brick, high zirconia brick with increased zirconia content, and the like. Of these, AZS bricks are preferred because cracks that occur during heating or heat fluctuation are unlikely to occur.
- the content of the glass phase of the AZS brick is preferably 10 to 25% by mass, and more preferably 15 to 20% by mass.
- the content of the glass phase of the AZS brick can be adjusted by the mixing ratio of the raw materials.
- the composition of the AZS brick is preferably 40 to 55% by mass of Al 2 O 3 , 10 to 15% by mass of SiO 2 , 30 to 45% by mass of ZrO 2 , and 0.5 to 2.5% by mass of Na 2 O. .
- Other components such as various metal oxides and inevitable impurities constituting the glass phase are preferably 2% or less, more preferably 1% or less.
- the content of the glass phase of the high zirconia brick is preferably 2 to 20% by mass, and more preferably 4 to 15% by mass.
- the content of the glass phase of the high zirconia brick can be adjusted by blending.
- Al 2 O 3 is preferably 0.5 to 20% by mass
- SiO 2 is 2 to 10% by mass
- ZrO 2 is preferably 80 to 96% by mass.
- the other components include, for example, various metal oxides and inevitable impurities constituting the glass phase, including Na 2 O, preferably 3% or less and more preferably 2% or less.
- the sintered brick mainly composed of zircon is a sintered brick containing 80 to 96% by mass of zircon, and substantially consists of a crystal phase and a glass phase.
- one having a glass phase content of 3 to 30% by mass can be selected from among known sintered bricks mainly composed of zircon.
- the content of the glass phase in the sintered brick mainly composed of zircon is preferably 3 to 10% by mass, and more preferably 4 to 10% by mass. Content of the glass phase of the sintered brick which has a main component of zircon can be adjusted with the compounding ratio of raw material powder.
- the composition of the sintered brick mainly composed of zircon is preferably 30 to 45% by mass of SiO 2 , 50 to 70% by mass of ZrO 2 and 5% by mass or less of other metal oxides.
- a regular anchor recess 3 is formed on the surface of the ceramic substrate 1.
- the adhesion strength between the ceramic substrate 1 and the metal sprayed film 2 is further improved.
- the adhesion strength against tensile stress in the direction parallel to the surface of the ceramic substrate 1 is improved.
- 2A and 2B show an example of the shape of the anchor recess 3.
- FIG. 2A is a plan view
- FIG. 2B is a cross-sectional view taken along line BB in FIG.
- the anchor recess 3 of this example is provided with a plurality of linear grooves g having a rectangular cross-sectional shape in a lattice shape.
- each groove g is perpendicular to the surface of the ceramic substrate 1, and the groove width w is constant.
- the groove g constituting the anchor recess 3 needs to have a certain depth. However, if the depth is too deep, the strength of the surface layer portion of the ceramic substrate 1 is reduced and processed. It is also difficult.
- the depth d of the groove g is preferably about 50 to 350 ⁇ m, more preferably about 150 to 250 ⁇ m.
- the degree of dispersion of the stress generated between the metal sprayed film 2 and the ceramic substrate 1 varies depending on the groove pitch (inter-groove interval, which indicates the distance between the center lines of adjacent grooves) p. It is preferable to reduce the groove pitch p in order to reduce the stress applied to one place by dispersing the above.
- the groove pitch p is preferably about 2.5 mm or less, more preferably about 1.5 mm or less.
- the groove width w is narrow, and the groove width w is preferably narrow also from the viewpoint of maintaining the strength of the surface layer portion of the ceramic substrate 1.
- the groove width w is set to be equal to or larger than the particle size of the spray particles.
- the groove width w is preferably 100 ⁇ m or more, and more preferably about 150 ⁇ m or more.
- the tensile stress applied from the metal spray film 2 in the direction parallel to the surface of the ceramic substrate 1 increases as the thickness m of the metal spray film 2 formed on the ceramic substrate 1 increases.
- the width x of the convex portion is preferably about 4 times or more the thickness m of the metal sprayed film 2. Further, considering the point that the groove pitch p is reduced, the preferable width x of the convex portion is about 2.5 to 5 times the thickness m of the film.
- the p / d value at which the stress is appropriately dispersed is obtained based on the above-mentioned preferable groove pitch p and groove depth d, it is preferably about 3 to 8.
- the anchor recess is not limited to the shape shown in FIG.
- substantially cylindrical holes may be regularly formed.
- intermittent holes are formed as an alternative to the grooves 3 as shown in FIG. 2, it is preferable to form holes at crossing positions of the orthogonal lattice (cross grid).
- it is preferably arranged at a staggered (staggered layout) position such that the hole pitch distance is uniform.
- the hole pitch distance is preferably about 0.7 to 2.5 mm, more preferably about 1.0 to 1.6 mm.
- the pore diameter is preferably about 200 to 500 ⁇ m, more preferably 300 to 400 ⁇ m.
- the depth of the hole is preferably about 200 to 600 ⁇ m, more preferably about 300 to 500 ⁇ m.
- the anchor recess 3 can be formed mechanically using a grinder equipped with a grinding blade composed of, for example, a grindstone or a diamond blade. Or you may carry out using high energy beams, such as a laser, and a high voltage
- the anchor recess 3 is hole-shaped, it can be formed using a grinding tool in the form of a pin drill or the like, or a high energy beam such as a laser or a high-pressure water stream. If the surface of the ceramic substrate 1 is adjusted to a highly accurate surface by cutting with a grinder or the like in advance before forming the anchor recess 3, the metal sprayed film 2 can be prevented from peeling off due to unexpected unevenness. This is preferable.
- the anchor recess 3 may be either a groove shape or a hole shape.
- the hole shape the closed space (inside space of the hole) closed by the metal sprayed film is relatively small, and the hole has a uniform shape. Since the closed space can be formed one by one, the adhesion strength against the tensile force in the thickness direction of the metal sprayed film 2 is improved by filling the interface between the ceramic substrate 1 and the metal sprayed film 2 with a glass phase. It is preferable in that the effect is large.
- the groove-shaped direction has a relatively large closed space (inner space in the groove) closed by the metal sprayed film, and the closed space is constituted by a large groove, so the above effect is relatively low.
- the metal sprayed film 2 is a metal film formed by a spraying method.
- the thermal spraying method is a method in which metal particles heated to a high temperature are injected onto a substrate and a coating film is formed by deposition of the metal particles. Therefore, the metal sprayed film has a granular deposited structure in the cross section, unlike a solidified film formed by applying molten metal or the like.
- the metal at least one metal selected from the group consisting of platinum group metals and alloys composed mainly of one or more platinum group metals is used.
- the platinum group metal include platinum (Pt), iridium (Ir), ruthenium (Ru), and rhodium (Rh).
- the alloy containing a platinum group metal as a main component include platinum alloys such as a Pt-5% Au alloy, a Pt-10% Ir alloy, and a Pt-10% Rh alloy.
- the metal sprayed film 2 is formed on the ceramic substrate 1.
- the anchor recess 3 is provided on the surface of the ceramic substrate 1, the metal sprayed film 2 is formed so as to cover the anchor recess 3.
- a thermal spraying method a known thermal spraying method such as a laser spraying method, a wire frame spraying method, a plasma spraying method, an arc spraying method, an oxyhydrogen flame spraying method, or the like can be appropriately used.
- the particle diameter of the metal particles (flying spray particle diameter) injected in the thermal spraying method is preferably finer and can be reduced to about 40 ⁇ m depending on the type of thermal spraying method, but is generally about 50 to 150 ⁇ m.
- the metal particles injected by the thermal spraying method are deposited on the surface of the ceramic substrate 1 to form the metal sprayed film 2.
- the metal particles injected by the thermal spraying method fill the recess 3 and further deposit on the surface to form the metal sprayed film 2.
- the thickness m of the metal sprayed film 2 can be appropriately adjusted depending on the amount of spraying. The greater the thickness, the greater the strain due to the tensile stress in the direction parallel to the surface of the ceramic substrate 1, so the thickness m of the sprayed film 2 (if there is a recess, the thickness at the portion without the recess) is 100 to 400 ⁇ m. The preferred range is 200 to 350 ⁇ m.
- the temperature of the ceramic substrate during the thermal spraying is increased, for example, by preheating (that is, preheating). It is preferable to reduce the temperature difference from the base material because the adhesion between the metal sprayed film 2 and the ceramic base material 1 is improved. In this case, it is preferable that after the thermal spraying in a state where the ceramic substrate 1 is heated (preheated), it is gradually cooled to room temperature.
- the temperature (preheating temperature) of the ceramic substrate 1 at the time of thermal spraying is preferably not higher than the solidification temperature of the injected metal particles, specifically about 200 to 500 ° C., more preferably 300 to 400 ° C.
- the cooling rate during slow cooling should be as slow as possible, preferably about 10 ° C./min or less.
- heat treatment is performed at a temperature of 1500 ° C. or higher with the metal sprayed film 2 formed on the ceramic substrate 1.
- the glass phase oozes out from the ceramic base material 1 into a minute space at the interface between the ceramic base material 1 and the metal sprayed film 2, and a state in which the glass phase is filled in the space is obtained. .
- This is because when heated to a high temperature of 1500 ° C. or higher, the glass phase in the ceramic substrate easily flows, and due to the difference in thermal expansion between the glass phase and the ceramic phase, the glass phase is extruded into a minute space, It is thought that it spreads in the space.
- the state in which the glass phase is filled in the space at the interface between the ceramic substrate 1 and the metal sprayed film 2 means that the glass phase exists between the ceramic substrate 1 and the metal sprayed film 2 and the glass At least a part of the phase refers to a state in contact with both the ceramic substrate 1 and the metal sprayed film 2. Although some space may remain at the interface between the ceramic substrate 1 and the metal sprayed film 2, such space does not remain as much as possible in order to obtain good adhesion strength between the ceramic substrate 1 and the metal sprayed film 2. It is preferable.
- the remaining space without the glass phase is 20 area% or less with respect to the entire area of the space existing at the interface between the ceramic substrate 1 and the metal sprayed film 2. It is preferably 10 area% or less, and most preferably 0 area%.
- the heat treatment temperature is lower than 1500 ° C., it is difficult to obtain a state where the space at the interface between the ceramic substrate 1 and the metal sprayed film 2 is filled with the glass phase. This is because the flow state of the glass phase is insufficient, so that it cannot spread in the space in a short time, and the ceramic phase and the glass phase react with the passage of time. It is considered that a state where the space is filled with the glass phase cannot be obtained.
- the upper limit of the heat treatment temperature needs to be lower than the melting point of the metal constituting the sprayed film 2.
- the heat treatment temperature is preferably set so that the space at the interface between the ceramic substrate 1 and the metal sprayed film 2 is filled with the glass phase in a preferable heat treatment time described later, which is lower than the melting point of the sprayed film 2.
- the preferred heat treatment temperature varies depending on the component composition of the ceramic substrate 1, but is preferably about 1500 to 1700 ° C, and more preferably about 1500 to 1600 ° C. Since the glass phase has high fluidity when the heat treatment temperature is within these ranges, the influence of the reaction between the ceramic phase and the glass phase on the effect of filling the space at the interface between the ceramic substrate 1 and the metal sprayed film 2 with the glass phase is low. .
- the heat treatment time is too short, a large amount of space remains at the interface between the ceramic substrate 1 and the metal sprayed film 2.
- the ceramic phase and the glass phase react with the passage of time, so that the phenomenon in which the glass phase is extruded into the space at the interface between the ceramic substrate 1 and the metal sprayed film 2 does not easily proceed. Therefore, it is preferable to set the heat treatment time so that these disadvantages do not occur. For example, it is preferably about 1 to 100 hours, and more preferably 10 to 50 hours.
- the ceramic member of the present invention in which the space at the interface between the ceramic substrate 1 and the metal sprayed film 2 is filled with the glass phase derived from the ceramic substrate is obtained.
- the ceramic member of the present invention is a member having a temperature of less than 1500 ° C. during use. That is, it is used for a portion where the temperature during use is not assumed to be 1500 ° C. or higher. In a member whose operating temperature is 1500 ° C. or higher, there is a possibility that the same effect as that of the present invention may be obtained as a result without performing heat treatment at 1500 ° C. or higher before use, and the present invention is applied to such a member. This is because the necessity is low. For this reason, the ceramic member of the present invention is preferably a member having a temperature of 1450 ° C. or lower, more preferably a member having a temperature of 1400 ° C. or lower.
- the ceramic member of the present invention is excellent in corrosion resistance against molten glass. Therefore, the ceramic member of this invention is used suitably as a member which contacts the molten glass below 1500 degreeC in the apparatus used for manufacture of molten glass.
- the ceramic member of the present invention is more preferably used as a member that contacts molten glass at 1450 ° C. or lower, and more preferably as a member that contacts molten glass at 1400 ° C. or lower in an apparatus used for manufacturing molten glass. Used.
- the molten glass that has flowed out of the melting tank is preferably used as a member that comes into contact with the molten glass at a temperature of less than 1500 ° C., preferably through a vacuum degassing apparatus and sent to the molding apparatus.
- the molten glass that has flowed out of the melting tank is more preferably used as a member that contacts the molten glass at 1450 ° C. or lower in the flow path until it is sent to the molding device through a vacuum degassing device, It is more suitably used as a member that contacts molten glass at 1400 ° C. or lower.
- a member constituting the inner wall of the vacuum degassing tank a member constituting the inner wall of the melting riser pipe provided upstream of the vacuum degassing tank, or a member constituting the inner wall of the downcomer pipe provided downstream of the vacuum degassing tank Is mentioned.
- the metal sprayed film 2 is provided on the surface of the ceramic substrate 1, erosion of the ceramic substrate 1 can be suppressed even when it comes into contact with molten glass. Moreover, since the adhesion strength between the ceramic substrate 1 and the metal sprayed film 2 is excellent as shown in the examples described later, the metal sprayed film 2 is hardly peeled off and excellent in durability.
- the ceramic member of the present invention when used as a member that comes into contact with molten glass, bubbles are generated in the molten glass because the glass phase is filled in the space between the ceramic substrate and the metal sprayed film.
- the effect which suppresses is acquired. That is, when moisture present in the molten glass is decomposed into oxygen and hydrogen on the surface of the metal spray film by the catalytic action of the platinum group metal, hydrogen passes through the metal spray film and oxygen passes through the metal spray film. It remains on its surface without. At this time, if hydrogen stays on the metal sprayed film, it combines with oxygen on the surface of the metal sprayed film to generate water, so that oxygen does not become bubbles.
- the apparatus for producing molten glass of the present invention uses the ceramic member of the present invention as a member that contacts molten glass of less than 1500 ° C.
- the ceramic member of the present invention is preferably used for a member that contacts the molten glass at 1450 ° C. or lower, and the present invention is preferably applied to a member that contacts the molten glass at 1400 ° C. or lower. More preferably, the ceramic member is used.
- the apparatus for producing molten glass of the present invention comprises a glass phase in which a sprayed film of at least one metal selected from the group consisting of a platinum group metal and an alloy containing at least one platinum group metal as a main component is formed. 3 to 30% by mass, using a ceramic base material made of electrocast brick or sintered brick mainly composed of zircon, less than 1500 ° C., preferably 1450 ° C. or less, more preferably 1400 ° C. of a molten glass production apparatus. It constitutes at least a part of a portion in contact with the molten glass having a temperature of not higher than ° C., and at least the ceramic substrate of the molten glass manufacturing apparatus is heat treated at a temperature of 1500 ° C.
- the apparatus for producing molten glass of the present invention is an apparatus for producing molten glass using a ceramic base material comprising 3-30% by mass of a glass phase and comprising a sintered brick mainly composed of electroformed brick or zircon. It constitutes at least a part of a part in contact with the molten glass of less than 1500 ° C., preferably 1450 ° C. or less, more preferably 1400 ° C.
- FIG. 3 is a longitudinal sectional view showing an embodiment of the apparatus for producing molten glass according to the present invention.
- the apparatus of this embodiment is a melting tank 11 for melting glass raw materials and homogenizing and clarifying molten glass.
- the internal pressure is set to be lower than atmospheric pressure, and bubbles in the molten glass supplied from the melting tank 11 are floated.
- the vacuum degassing device 12 for breaking the bubbles, the first conduit 13 connecting the melting tank 11 and the vacuum degassing device 12, and the molten glass flowing out from the vacuum degassing device 12 through the cooling tank 15 in the next step And a second conduit 14 for feeding to the forming means.
- symbol G in a figure shows a molten glass.
- the first conduit 13 is provided with a cooling means 13a and a stirring means 13b, and the molten glass flowing out of the melting tank 11 is cooled to 1000 ° C. or more and less than 1500 ° C. in the first conduit 13, It is introduced into the vacuum degassing device 12.
- the vacuum degassing apparatus 12 includes a vacuum degassing tank 12a.
- the upstream side of the vacuum degassing tank 12a communicates with the first conduit 13 through the riser 12b, and is downstream of the vacuum degassing tank 12a.
- the side communicates with the second conduit 14 via the downcomer 12c.
- the insides of the vacuum degassing tank 12a, the rising pipe 12b, and the lowering pipe 12c are maintained in a vacuum environment, and the molten glass in the first conduit 13 is sucked up to the vacuum degassing tank 12a through the rising pipe 12b by the siphon effect. It is configured as follows. Further, the conduit 14 and subsequent parts are connected to the forming means via the cooling tank 15.
- the members constituting the inner walls of the reduced pressure defoaming tank 12a, the rising pipe 12b, the lowering pipe 12c, and the cooling tank 15 of the reduced pressure defoaming apparatus 12 are ceramic members or metal according to the present invention. It consists of what heat-processes the ceramic base material in which the sprayed film was formed. That is, the inner walls of the vacuum degassing tank 12a, the riser pipe 12b, the downfall pipe 12c, and the cooling tank 15 are made of a ceramic base material whose inner surface is coated with a metal sprayed film. A glass phase is filled in a minute space at the interface.
- the vacuum degassing apparatus 12 and the cooling tank 15 are first formed of a ceramic base material in which the inner walls of the vacuum degassing tank 12a, the ascending pipe 12b, the descending pipe 12c, and the cooling tank 15 are previously coated with a metal sprayed film. Then, after assembling into a series of shapes from the vacuum degassing apparatus 12 to the cooling tank 15, the inside of the series of structures including the vacuum degassing apparatus 12 and the cooling tank 15 is subjected to heat treatment at a predetermined temperature of 1500 ° C. or more, Subsequently, it is manufactured by a method of cooling below the use temperature.
- the ceramic member of the present invention forms the inner wall of the vacuum degassing tank 12a, the rising pipe 12b, the descending pipe 12c, and the cooling tank 15, and assembles into a series of shapes from the vacuum degassing apparatus 12 to the cooling tank 15. You can also. Further, the inner walls of the vacuum degassing tank 12a, the rising pipe 12b, the downfalling pipe 12c, and the cooling tank 15 are formed of a ceramic base material, and a metal sprayed film is formed on the surface of the base material on the side in contact with the molten glass. Then, the ceramic base material on which the metal sprayed film is formed can be heat-treated at a temperature of 1500 ° C. or higher.
- the device After the device is manufactured in this way, it is used at a use temperature of less than 1500 ° C. Moreover, after manufacturing an apparatus in this way, it is preferably used at a use temperature of 1450 ° C. or less, and more preferably used at a use temperature of 1400 ° C. or less.
- part using the ceramic member of this invention are not limited to said example. For example, since the molten glass temperature in the cooling bath 15 is lower than that in the upstream portion, the portion using the ceramic member of the present invention may be only the vacuum degassing device 12 and not used in the cooling bath 15.
- the portion of the vacuum degassing apparatus 12 that uses the ceramic member of the present invention may be only the vacuum degassing tank 12a, only the rising pipe 12b and the lowering pipe 12c, or only the lowering pipe 12c. Further, the ceramic member of the present invention may be used for the inner walls of the first conduit 13 and the second conduit 14.
- the manufacturing method of the molten glass of this invention is a method of manufacturing a molten glass using the manufacturing apparatus with which the ceramic member of this invention is used for the member which contacts the molten glass below 1500 degreeC. Moreover, the manufacturing method of the molten glass of this invention is a method of manufacturing a molten glass which uses the manufacturing apparatus with which the ceramic member of this invention is used for the member which contacts 1450 degrees C or less molten glass. Furthermore, the manufacturing method of the molten glass of this invention is a method of manufacturing a molten glass more preferable to use the manufacturing apparatus with which the ceramic member of this invention is used for the member which contacts 1400 degrees C or less molten glass. .
- the molten glass that has flowed out of the melting tank 11 is 1000 ° C. or more and less than 1500 ° C. in the first conduit 13. After being cooled, it is introduced into the vacuum deaerator 12. Moreover, it is preferable that the molten glass flowing out from the melting tank 11 is introduced into the vacuum degassing apparatus 12 after being cooled to 1000 ° C. or higher and 1450 ° C. or lower in the first conduit 13. Furthermore, it is more preferable that the molten glass flowing out from the melting tank 11 is introduced into the vacuum degassing apparatus 12 after being cooled to 1000 ° C. or higher and 1400 ° C.
- the inner walls of the reduced pressure defoaming tank 12a, the rising pipe 12b, the descending pipe 12c, and the cooling tank 15 of the vacuum degassing apparatus 12 are in contact with molten glass at 1000 ° C. or more and less than 1500 ° C., but the ceramic base constituting the inner wall Since the surface (that is, the inner surface) of the material is coated with the metal sprayed film, the corrosion resistance to the molten glass is excellent. Further, since the adhesion strength between the ceramic substrate and the metal sprayed film is excellent, the sprayed film is hardly peeled off and excellent in durability.
- the hydrogen can remain on the metal spray coating. Therefore, as described above, the hydrogen can be recombined with oxygen generated by the decomposition of moisture to generate water, so that generation of bubbles in the molten glass due to the oxygen is suppressed. be able to.
- the apparatus for producing a glass article of the present invention comprises a means for producing molten glass, a shaping means for shaping the obtained molten glass, and a slow cooling means for gradually cooling the glass after shaping, and is less than 1500 ° C.
- the ceramic member of this invention is used for the member which contacts molten glass.
- the apparatus for producing a glass article of the present invention has a means for producing molten glass, a shaping means for shaping the obtained molten glass, and a slow cooling means for gradually cooling the glass after shaping, and 1450 ° C. It is preferable that the ceramic member of this invention is used for the member which contacts the following molten glass.
- the apparatus for producing a glass article of the present invention comprises a means for producing molten glass, a shaping means for shaping the obtained molten glass, and a slow cooling means for gradually cooling the glass after shaping, at 1400 ° C. It is more preferable that the ceramic member of the present invention is used for the following member that contacts the molten glass.
- the means for producing molten glass is preferably the molten glass production apparatus of the present invention.
- the apparatus has a forming means for forming molten glass downstream of the molten glass flow direction of the molten glass manufacturing apparatus, and a slow cooling means for gradually cooling the glass after forming downstream thereof. Can do.
- a processing means for further cutting and polishing may be provided downstream of the slow cooling means.
- FIG. 4 is a flowchart showing an example of a glass article manufacturing method using the glass article manufacturing apparatus according to the present invention.
- a molten glass G is obtained by a glass melting step S1 using the molten glass manufacturing apparatus of FIG. 3, and the molten glass G is sent to a forming means. After passing through the forming step S2 for forming into a shape, it is gradually cooled in the slow cooling step S3. Thereafter, the glass article G5 can be obtained by post-processing such as cutting and polishing in the post-processing step S4 as necessary.
- Example 1 In this example, AZS (Al 2 O 3 —SiO 2 —ZrO 2 ) brick is used as the ceramic substrate, and the surface of the brick is subjected to drilling with a regular arrangement as described below, and then metal spraying is performed. A substrate with a metal film was obtained, and the substrate with a metal film was subjected to heat treatment to produce a ceramic member.
- the base material on which the metal sprayed film is formed on the surface of the ceramic base material is also referred to as a base material with a metal film.
- Table 1 shows the results of measuring the component composition of the ceramic substrate used by fluorescent X-ray analysis. Further, the glass phase content obtained based on the cross-sectional photograph of the base material with the metal film before the heat treatment is shown in Table 1 (the same applies to Example 2 and Comparative Example 1 below). The glass phase content is calculated by the following method. Using an electron microscope, a 50-fold backscattered electron image (composition image) of the cross section of the base material with a metal film before heat treatment is taken from the base material surface to the position of 20 mm toward the inside of the base material. To do.
- AZS bricks were cut into 50 mm long ⁇ 50 mm wide ⁇ 10 mm high brick pieces, and anchor concave portions were formed on one side of the brick pieces using a fiber laser.
- the anchor recess was a substantially cylindrical hole, the hole diameter was 300 ⁇ m, the hole depth was 400 ⁇ m, and the hole pitch distance was 1 mm. Subsequently, the brick piece was heated to 300 ° C.
- Example 2 In Example 1, except that the ceramic substrate was changed to high zirconia brick, a substrate with a metal film was obtained in the same manner, and the substrate with the metal film was subjected to the same heat treatment as in Example 1 to produce a ceramic member. did. As a control, an untreated sample not subjected to heat treatment was prepared in the same manner as in Example 1.
- Example 1 In Example 1, except that the ceramic base material was changed to ⁇ alumina brick, a base material with a metal film was obtained in the same manner, and the base material with the metal film was subjected to the same heat treatment as in Example 1 to produce a ceramic member. did. As a control, an untreated sample not subjected to heat treatment was prepared in the same manner as in Example 1.
- the load when the metal sprayed film 22 peeled off was measured. From the value (P) of the load at the time of peeling and the area (S) of the plate-like piece (ceramic member), the adhesion strength (P / S, unit is MPa) was determined. The result is shown in FIG.
- FIG. 7 is a photograph obtained in Example 1
- FIG. 8 is a photograph obtained in Example 2
- FIG. 9 is a photograph obtained in Comparative Example 1.
- Reference numeral 21 denotes a ceramic substrate
- 22 denotes a metal sprayed film.
- FIG. 7 (a) is a cross-sectional photograph before the heat treatment
- (b) is a cross-sectional photograph after the heat treatment
- (a ′) is a mapping of the glass phase shown in the photograph (a)
- (b ′) Is a mapping of the glass phase in the photograph of (b).
- FIGS. 7A to 9A in the base material with the metal film before the heat treatment, there is a minute gap (space) at the interface between the ceramic base material 21 and the metal sprayed film 22.
- FIGS. 7 and 8 (b) in the ceramic members after the heat treatment of Examples 1 and 2, there is no gap at the interface between the ceramic base material 21 and the metal sprayed film 22, and FIGS.
- FIG. 9B in the ceramic member after the heat treatment of Comparative Example 1, there is a gap at the interface between the ceramic base material 21 and the metal sprayed film 22, and FIG. As shown in b '), no oozing of the glass phase to the interface is observed.
- Example 3 As a molten glass manufacturing apparatus, a glass melting container made of a ceramic member was prepared as described below, and the glass raw material was melted at 1400 ° C. in the container and then cooled. Thereafter, the moisture content in the glass and the presence or absence of bubbles in the vicinity of the inner wall of the container were examined by an evaluation method described later. First, using a ceramic base material made of a high zirconia brick of the same material as used in Example 2 and provided with anchor recesses on one side in the same manner as in Example 1, the outer diameter is 75 mm and the height of the outer wall is high.
- a bottomed cylindrical container having a thickness of 55 mm, an inner diameter of 50 mm, and an inner wall depth of 40 mm was prepared.
- the surface provided with the anchor recess was made the inner surface.
- this container was heated to 300 ° C. in an air atmosphere, and a metal sprayed film having a film thickness of 300 ⁇ m was formed on the inner surface in the same manner as in Example 1 to obtain a container made of a substrate with a metal film. .
- this container was placed in an electric furnace under the atmosphere and subjected to heat treatment at 1600 ° C. for 5 hours to obtain a container made of a ceramic member.
- Example 3 In carrying out the above Example 3, the obtained container was placed in a heating furnace, and the thermal history shown in FIG. 10 was added under normal pressure.
- shaft of FIG. 10 shows the atmospheric temperature in a heating furnace.
- the temperature is raised from room temperature to 1400 ° C. over 4 hours and 40 minutes.
- the glass raw material of borosilicate glass is put into the container and heated at 1400 ° C. for 1 hour to melt the glass raw material. I let you. Thereafter, the glass was rapidly cooled to 720 ° C. and held at 720 ° C. for 1 hour, then the temperature was lowered to 600 ° C. over 2 hours and further cooled to room temperature over 3 hours to obtain a glass solidified in the container. .
- Example 3 glass solidified in the container was obtained in the same manner as in Example 3 except that the container made of the metal film-coated substrate was not subjected to heat treatment.
- the material of the ceramic substrate was changed from a high zirconia brick to the same ⁇ alumina brick as used in Comparative Example 1, and was made of a substrate with a metal film in the same manner as in Example 3.
- a container was obtained, and the same heat treatment as in Example 3 was performed on the container to prepare a container made of a ceramic member. Using this container, a glass solidified in the container was obtained in the same manner as in Example 3.
- the ⁇ -OH value of the glass was measured as an indicator of the water content in the glass.
- the ⁇ -OH value (unit: mm ⁇ 1 ) of the glass was measured by measuring the absorbance of the glass sample with respect to light having a wavelength of 2.75 to 2.95 ⁇ m, and determining the maximum value ⁇ max as the thickness (mm) of the glass sample. It can be obtained by dividing.
- the glass solidified in the container obtained in each of the above examples was cut along with the container along a cut surface along the height direction, and a longitudinal section sample having a thickness of 1 mm was cut out.
- the ⁇ -OH value was measured by the above method for the region of the obtained longitudinal section sample at the center in the height direction of the container and in the vicinity of the interface between the inner wall of the container and the solidified glass. A photograph of the area was taken.
- the results of Example 3 are shown in FIG. 11, the results of Comparative Example 2 are shown in FIG. 12, and the results of Comparative Example 3 are shown in FIG. (A) of each figure is a cross-sectional photograph, and the reference position of the interface is indicated by an arrow.
- reference numeral 21 denotes a ceramic substrate
- 22 denotes a metal sprayed film
- 30 denotes glass.
- (B) of each figure is a graph showing the measurement result of ⁇ -OH value, the horizontal axis shows the distance (unit: ⁇ m) in the horizontal direction of the cross-sectional photograph of (a), and the vertical axis shows ⁇ -OH value (unit). : Mm ⁇ 1 ).
- a position corresponding to the reference position of the interface is indicated by an arrow.
- the lower layer of the metal sprayed film is made of a ceramic base material.
- the water content when the lower layer of glass was made of glass was measured. That is, in Example 3, when a glass material of borosilicate glass is introduced into the container when the temperature reaches 1400 ° C. after the container made of the ceramic member is placed in the heating furnace, A part of the glass raw material was directly put into a container made of the ceramic member, and the remainder of the glass raw material was put in a separately prepared platinum rhodium crucible, and the crucible was put in the container. Other than that obtained the glass solidified in the container like Example 3.
- FIG. FIG. 14 is a photograph showing the longitudinal section. In this example, the crucible 32 is embedded in the solidified glass 30 in the container 31 made of a ceramic member, and both the inner surface and the outer surface of the crucible 32 are in contact with the solidified glass.
- the glass solidified in the container obtained in this example was cut along the height direction along with the container and the crucible, and a longitudinal cross-sectional sample having a thickness of 1 mm was cut out.
- a longitudinal cross-sectional sample having a thickness of 1 mm was cut out.
- region (it shows with the code
- the ⁇ -OH value was measured at The results are shown in FIG.
- the horizontal axis indicates the distance in the horizontal direction of the cross-sectional photograph of FIG. 14, and the vertical axis indicates the ⁇ -OH value.
- the position corresponding to the side wall of the crucible is indicated by an arrow.
- the longitudinal section sample used for measuring the ⁇ -OH value no bubbles were observed in the glass.
- the comparative example 2 used the high zirconia brick containing 6 mass% of glass phases as a ceramic base material, since it did not heat-process at 1500 degreeC before use, even if it heats at 1400 degreeC for 1 hour at the time of use In the cross-sectional photograph, a minute gap was observed at the interface between the metal sprayed film and the ceramic substrate.
- Comparative Example 3 since the ceramic base material contains only 0.8% by mass of the glass phase, even if heat treatment at 1500 ° C. is performed before use, there is a minute amount at the interface between the metal sprayed film and the ceramic base material in the cross-sectional photograph. A gap was observed.
- the ceramic member excellent in the adhesive strength of a ceramic base material and a metal sprayed film can be obtained, This ceramic member is excellent in the corrosion resistance with respect to molten glass, and the ceramic member for the manufacturing apparatus of molten glass Useful as.
- the entire contents of the specification, claims, drawings and abstract of Japanese Patent Application No. 2010-262591 filed on Nov. 25, 2010 are incorporated herein as the disclosure of the present invention. .
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Abstract
Description
本発明は、セラミック部材の製造方法、該製造方法で得られるセラミック部材、該セラミック部材を備えた溶融ガラスの製造装置、該製造装置を用いる溶融ガラスの製造方法、前記セラミック部材を備えたガラス物品の製造装置、該製造装置を用いるガラス物品の製造方法に関する。 The present invention relates to a method for producing a ceramic member, a ceramic member obtained by the production method, a production apparatus for molten glass provided with the ceramic member, a production method for molten glass using the production apparatus, and a glass article comprising the ceramic member. The manufacturing apparatus of this invention, and the manufacturing method of the glass article using this manufacturing apparatus.
例えば、ガラス板等のガラス製品は、ガラス原料から溶融ガラスを製造し、該溶融ガラスを成形装置で成形して得られる。成形後のガラス製品の品質向上のため、ガラス原料を溶融槽で溶融した後、成形装置で成形する前に、溶融ガラス内に発生した気泡を除去する目的で減圧脱泡装置を用いる方法が提案されている(例えば特許文献1)。
かかる減圧脱泡装置は、内部が所定の減圧度に保持された減圧脱泡槽を備えており、溶融ガラスが該減圧脱泡槽内を通過する際に、溶融ガラス内に含まれる気泡が比較的短時間で成長し、大きく成長した気泡が、その浮力によって溶融ガラスの表面に浮上して破泡することで、溶融ガラスから気泡が除去されるようになっている。
溶融槽から流出される溶融ガラスの温度は、例えばソーダライムガラスの場合は1200~1600℃程度であるが、減圧脱泡を効果的に行うために、減圧脱泡装置に導入する溶融ガラスの温度は1000~1500℃程度、減圧脱泡槽に導入される溶融ガラス温度は1000~1400℃程度とされる。
For example, a glass product such as a glass plate is obtained by producing molten glass from a glass raw material and molding the molten glass with a molding apparatus. In order to improve the quality of glass products after molding, a method using a vacuum degassing device was proposed to remove bubbles generated in the molten glass after melting the glass raw material in the melting tank and before molding with the molding device (For example, Patent Document 1).
Such a vacuum degassing apparatus includes a vacuum degassing tank whose inside is maintained at a predetermined degree of vacuum, and when the molten glass passes through the vacuum degassing tank, the bubbles contained in the molten glass are compared. Bubbles that have grown in a short period of time and have grown greatly float on the surface of the molten glass by the buoyancy and break the bubbles, thereby removing the bubbles from the molten glass.
The temperature of the molten glass flowing out of the melting tank is, for example, about 1200 to 1600 ° C. in the case of soda lime glass, but the temperature of the molten glass introduced into the vacuum degassing apparatus for effective vacuum degassing. Is about 1000 to 1500 ° C., and the temperature of the molten glass introduced into the vacuum degassing vessel is about 1000 to 1400 ° C.
減圧脱泡装置において、減圧脱泡槽等の溶融ガラスと接触する部材は、耐熱性および溶融ガラスに対する耐食性に優れている必要があることから、電鋳レンガ等のセラミック部材が使用される。
また、溶融ガラスによる浸食をより抑制するために、電鋳レンガを金属膜で被覆する方法も提案されており、さらに下記特許文献2には、電鋳レンガの表面にアンカー用の凹部を形成し、該凹部を埋め込むように金属の溶射膜を形成することによって、電鋳レンガと金属膜との密着強さを向上して、金属膜の剥離を抑制する方法が記載されている。
In the vacuum degassing apparatus, since the member that contacts the molten glass such as the vacuum degassing tank needs to be excellent in heat resistance and corrosion resistance against the molten glass, a ceramic member such as an electroformed brick is used.
In order to further suppress erosion caused by molten glass, a method of coating an electroformed brick with a metal film has also been proposed. Further, in
しかしながら、特許文献2に記載の方法では、電鋳レンガと金属膜との密着強さが必ずしも十分とはいえない。
本発明者らの知見によれば、凹部によるアンカー効果では、金属膜の厚さ方向の引張り力に対する密着強さの向上効果が小さい。
However, in the method described in
According to the knowledge of the present inventors, the anchor effect by the recesses has a small effect of improving the adhesion strength against the tensile force in the thickness direction of the metal film.
本発明は前記事情に鑑みてなされたもので、電鋳レンガ等のセラミック基材と、その表面を被覆する金属溶射膜を有するセラミック部材を製造する方法であって、該セラミック基材と金属溶射膜との密着強さの向上効果に優れた、セラミック部材の製造方法を提供することを目的とする。
また、本発明は、かかる製造方法で得られるセラミック部材、該セラミック部材を備えた溶融ガラスの製造装置、該製造装置を用いる溶融ガラスの製造方法、前記セラミック部材を備えたガラス物品の製造装置、および該製造装置を用いるガラス物品の製造方法を提供することを目的とする。
The present invention has been made in view of the above circumstances, and is a method of manufacturing a ceramic member having a ceramic base material such as an electroformed brick and a metal sprayed coating covering the surface thereof. It aims at providing the manufacturing method of the ceramic member excellent in the improvement effect of the adhesive strength with a film | membrane.
The present invention also provides a ceramic member obtained by such a manufacturing method, a manufacturing apparatus for molten glass provided with the ceramic member, a manufacturing method for molten glass using the manufacturing apparatus, a manufacturing apparatus for glass articles provided with the ceramic member, And it aims at providing the manufacturing method of the glass article using this manufacturing apparatus.
本発明者らは鋭意研究を重ねた結果、所定量以上のガラス相を含むセラミック基材上に、金属の溶射膜を形成した後、特定の条件で熱処理すると、特に、金属溶射膜の厚さ方向の引張り力に対する、セラミック基材と金属溶射膜との密着強度が格段に向上することを見出した。また、かかる熱処理を行うと、セラミック基材と金属溶射膜との界面の微小な空間にガラス相が充填された状態となることも知見して、本発明を完成させるに至った。 As a result of intensive studies, the inventors of the present invention formed a metal sprayed film on a ceramic substrate containing a glass phase of a predetermined amount or more, and then heat-treated under specific conditions, in particular, the thickness of the metal sprayed film. It has been found that the adhesion strength between the ceramic substrate and the metal sprayed film against the tensile force in the direction is remarkably improved. Moreover, when this heat processing was performed, it also discovered that it became the state with which the glass phase was filled in the micro space of the interface of a ceramic base material and a metal sprayed film, and came to complete this invention.
すなわち、本発明のセラミック部材の製造方法は、使用時の温度が1500℃未満であるセラミック部材を製造する方法であって、ガラス相を3~30質量%含む、電鋳レンガまたはジルコンを主成分とする焼結レンガからなるセラミック基材上に、白金族金属、および白金族金属の1種以上を主成分とする合金からなる群から選ばれる少なくとも1種の金属の溶射膜を形成した後、1500℃以上の温度で熱処理する工程を有することを特徴とする。本発明のセラミック部材の製造方法は、前記使用時の温度が1400℃以下であることが好ましい。
前記セラミック基材の表面に、規則的なアンカー用凹部が形成されており、該アンカー用凹部上に前記金属の溶射膜を形成することが好ましい。
That is, the method for producing a ceramic member according to the present invention is a method for producing a ceramic member having a temperature of less than 1500 ° C. in use, and comprises electrocast brick or zircon as a main component containing 3 to 30% by mass of a glass phase. After forming a sprayed film of at least one metal selected from the group consisting of platinum group metals and alloys mainly composed of one or more platinum group metals on a ceramic base material composed of sintered bricks, It has the process of heat-processing at the temperature of 1500 degreeC or more. In the method for producing a ceramic member of the present invention, the temperature during use is preferably 1400 ° C. or lower.
It is preferable that a regular anchor recess is formed on the surface of the ceramic substrate, and the metal sprayed film is formed on the anchor recess.
本発明のセラミック部材は、前記の本発明の製造方法で得られるセラミック部材であって、前記セラミック基材と前記金属の溶射膜との界面の空間にガラス相が充填されていることを特徴とする。
本発明のセラミック部材は、セラミック基材と、その表面上に設けられた金属の溶射膜を有し、使用時の温度が1500℃未満であるセラミック部材であって、前記金属が、白金族金属、および白金族金属の1種以上を主成分とする合金からなる群から選ばれる少なくとも1種の金属であり、前記セラミック基材が、ガラス相を3~30質量%含む、電鋳レンガまたはジルコンを主成分とする焼結レンガからなり、前記セラミック基材と前記金属の溶射膜との界面の空間に、前記ガラス相の一部が充填されていることを特徴とする。本発明のセラミック部材は、前記使用時の温度が1400℃以下であることが好ましい。
前記セラミック基材の表面に、規則的なアンカー用凹部が形成されており、該アンカー用凹部を埋め込むように前記金属の溶射膜が形成されていることが好ましい。
The ceramic member of the present invention is a ceramic member obtained by the manufacturing method of the present invention, wherein a glass phase is filled in a space at an interface between the ceramic base material and the metal sprayed film. To do.
The ceramic member of the present invention is a ceramic member having a ceramic base material and a metal sprayed film provided on the surface of the ceramic member, and the temperature at the time of use is less than 1500 ° C., wherein the metal is a platinum group metal. , And at least one metal selected from the group consisting of alloys containing at least one platinum group metal as a main component, wherein the ceramic base material contains 3 to 30% by mass of a glass phase. A part of the glass phase is filled in a space at the interface between the ceramic base material and the sprayed metal film. The ceramic member of the present invention preferably has a temperature during use of 1400 ° C. or lower.
It is preferable that a regular anchor recess is formed on the surface of the ceramic substrate, and the metal sprayed film is formed so as to fill the anchor recess.
本発明は、1500℃未満の溶融ガラスに接触する部材に、本発明のセラミック部材が用いられている、溶融ガラスの製造装置を提供する。本発明は、1400℃以下の溶融ガラスに接触する部材に、本発明のセラミック部材が用いられている、ことが好ましい。
本発明は、白金族金属、および白金族金属の1種以上を主成分とする合金からなる群から選ばれる少なくとも1種の金属の溶射膜を形成した、ガラス相を3~30質量%含む、電鋳レンガまたはジルコンを主成分とする焼結レンガからなるセラミック基材を用いて、溶融ガラスの製造装置の1500℃未満の溶融ガラスと接する部分の少なくとも一部を構成し、前記溶融ガラスの製造装置の少なくとも前記セラミック基材を1500℃以上の温度で熱処理してなる溶融ガラスの製造装置を提供する。
本発明は、ガラス相を3~30質量%含む、電鋳レンガまたはジルコンを主成分とする焼結レンガからなるセラミック基材を用いて、溶融ガラスの製造装置の1500℃未満の溶融ガラスと接する部分の少なくとも一部を構成し、この構成された部分のセラミック基材上に、白金族金属、および白金族金属の1種以上を主成分とする合金からなる群から選ばれる少なくとも1種の金属の溶射膜を形成し、次いで、溶融ガラスの製造装置の少なくとも前記金属の溶射膜の形成されたセラミック基材を1500℃以上の温度で熱処理してなる溶融ガラスの製造装置を提供する。
The present invention provides a molten glass manufacturing apparatus in which the ceramic member of the present invention is used as a member that contacts molten glass of less than 1500 ° C. In the present invention, it is preferable that the ceramic member of the present invention is used for a member that contacts molten glass of 1400 ° C. or lower.
The present invention includes 3 to 30% by mass of a glass phase in which a sprayed film of at least one metal selected from the group consisting of platinum group metals and alloys composed mainly of one or more platinum group metals is formed. Using a ceramic substrate made of electrocast brick or sintered brick mainly composed of zircon, constituting at least a part of a portion of the molten glass manufacturing apparatus in contact with the molten glass of less than 1500 ° C., manufacturing the molten glass Provided is an apparatus for producing molten glass obtained by heat-treating at least the ceramic substrate of the apparatus at a temperature of 1500 ° C. or higher.
The present invention uses a ceramic base material composed of electrocast bricks or sintered bricks mainly composed of zircon containing 3 to 30% by mass of a glass phase, and is in contact with molten glass of less than 1500 ° C. in a molten glass production apparatus. At least one metal selected from the group consisting of a platinum group metal and an alloy containing at least one platinum group metal as a main component is provided on at least a part of the ceramic base material. Next, there is provided a molten glass manufacturing apparatus obtained by heat-treating at least a ceramic substrate on which a metal sprayed film is formed in a molten glass manufacturing apparatus at a temperature of 1500 ° C. or higher.
本発明は、本発明の溶融ガラスの製造装置を用いて溶融ガラスを製造する、溶融ガラスの製造方法を提供する。
本発明は、溶融ガラスを製造する手段と、得られた溶融ガラスを成形する成形手段と、成形後のガラスを徐冷する徐冷手段とを有し、1500℃未満の溶融ガラスに接触する部材に、本発明のセラミック部材が用いられている、ガラス物品の製造装置を提供する。本発明は、溶融ガラスを製造する手段と、得られた溶融ガラスを成形する成形手段と、成形後のガラスを徐冷する徐冷手段とを有し、1400℃以下の溶融ガラスに接触する部材に、本発明のセラミック部材が用いられている、ことが好ましい。
本発明は、白金族金属、および白金族金属の1種以上を主成分とする合金からなる群から選ばれる少なくとも1種の金属の溶射膜を形成した、ガラス相を3~30質量%含む、電鋳レンガまたはジルコンを主成分とする焼結レンガからなるセラミック基材を用いて、溶融ガラスの製造装置の1500℃未満の溶融ガラスと接する部分の少なくとも一部を構成し、前記溶融ガラスの製造装置の少なくとも前記セラミック基材を1500℃以上の温度で熱処理してなる溶融ガラスの製造装置と、溶融ガラスを成形するガラス成形装置と、成形後のガラスを徐冷する徐冷装置とを有する、ガラス物品の製造装置を提供する。
本発明は、ガラス相を3~30質量%含む、電鋳レンガまたはジルコンを主成分とする焼結レンガからなるセラミック基材を用いて、溶融ガラスの製造装置の1500℃未満の溶融ガラスと接する部分の少なくとも一部を構成し、この構成された部分のセラミック基材上に、白金族金属、および白金族金属の1種以上を主成分とする合金からなる群から選ばれる少なくとも1種の金属の溶射膜を形成し、次いで、溶融ガラスの製造装置の少なくとも前記金属の溶射膜の形成されたセラミック基材を1500℃以上の温度で熱処理してなる溶融ガラスの製造装置と、溶融ガラスを成形するガラス成形装置と、成形後のガラスを徐冷する徐冷装置とを有する、ガラス物品の製造装置を提供する。
本発明は、本発明のガラス物品の製造装置を用いてガラス物品を製造する、ガラス物品の製造方法を提供する。
This invention provides the manufacturing method of a molten glass which manufactures a molten glass using the manufacturing apparatus of the molten glass of this invention.
The present invention has a means for producing molten glass, a shaping means for shaping the obtained molten glass, and a slow cooling means for gradually cooling the glass after molding, and a member that contacts the molten glass at a temperature lower than 1500 ° C. Furthermore, a glass article manufacturing apparatus in which the ceramic member of the present invention is used is provided. The present invention has a means for manufacturing molten glass, a forming means for forming the obtained molten glass, and a slow cooling means for gradually cooling the glass after forming, and a member that contacts the molten glass at 1400 ° C. or lower. Further, it is preferable that the ceramic member of the present invention is used.
The present invention includes 3 to 30% by mass of a glass phase in which a sprayed film of at least one metal selected from the group consisting of platinum group metals and alloys composed mainly of one or more platinum group metals is formed. Using a ceramic substrate made of electrocast brick or sintered brick mainly composed of zircon, constituting at least a part of a portion of the molten glass manufacturing apparatus in contact with the molten glass of less than 1500 ° C., manufacturing the molten glass An apparatus for producing molten glass obtained by heat-treating at least the ceramic substrate of the apparatus at a temperature of 1500 ° C. or higher; a glass forming apparatus for forming molten glass; and a slow cooling apparatus for gradually cooling the glass after molding. An apparatus for manufacturing a glass article is provided.
The present invention uses a ceramic base material composed of electrocast bricks or sintered bricks mainly composed of zircon containing 3 to 30% by mass of a glass phase, and is in contact with molten glass of less than 1500 ° C. in a molten glass production apparatus. At least one metal selected from the group consisting of a platinum group metal and an alloy containing at least one platinum group metal as a main component is provided on at least a part of the ceramic base material. Next, a molten glass manufacturing apparatus is formed by heat-treating a ceramic substrate on which at least the metal sprayed film of the molten glass manufacturing apparatus is formed at a temperature of 1500 ° C. or higher. There is provided a glass article manufacturing apparatus having a glass forming apparatus for performing cooling and a slow cooling apparatus for gradually cooling the formed glass.
This invention provides the manufacturing method of a glass article which manufactures a glass article using the manufacturing apparatus of the glass article of this invention.
本発明によれば、ガラス相を有するセラミック基材と、その表面を被覆する金属の溶射膜(以下、金属溶射膜ということもある。)との界面の空間に、前記ガラス相の一部が充填されており、該セラミック基材と金属溶射膜との密着強さに優れたセラミック部材が得られる。 According to the present invention, a part of the glass phase is present in a space at the interface between the ceramic base material having a glass phase and a metal spray coating (hereinafter also referred to as a metal spray coating) covering the surface thereof. A ceramic member which is filled and has excellent adhesion strength between the ceramic substrate and the metal spray coating is obtained.
本発明の溶融ガラスの製造装置は、溶融ガラスに接触する部材の表面が金属溶射膜で被覆されているため、溶融ガラスに対する耐食性に優れるとともに、該金属溶射膜が剥離し難いため、耐久性に優れる。
本発明の溶融ガラスの製造装置を用いることにより、溶融ガラスおよびガラス物品を安定して製造できる。
The apparatus for producing molten glass of the present invention is excellent in corrosion resistance against molten glass because the surface of the member in contact with the molten glass is coated with the metal sprayed film, and the metal sprayed film is difficult to peel off. Excellent.
By using the apparatus for producing molten glass of the present invention, it is possible to stably produce molten glass and glass articles.
<セラミック部材>
図1は、本発明のセラミック部材の一実施形態を示した断面図である。符号1はセラミック基材、符号2は金属溶射膜、3はアンカー用凹部をそれぞれ示す。
本発明のセラミック部材は、セラミック基材1と、その表面上に設けられた金属溶射膜2を有し、セラミック基材1と金属溶射膜2との界面の空間に、セラミック基材から滲み出したガラス相(図示せず)が充填されている。
<Ceramic material>
FIG. 1 is a cross-sectional view showing an embodiment of the ceramic member of the present invention.
The ceramic member of the present invention has a
<セラミック基材>
セラミック基材1としては、ガラス相を3~30質量%含むレンガが用いられる。溶融ガラスに対する耐食性を得るために緻密性が高いレンガが好ましく、この観点で下記するジルコニア等を主体とする電鋳レンガまたはジルコンを主成分とする焼結レンガが用いられる。
ガラス相の含有量が3質量%未満であると、後述する熱処理を行った際に、セラミック基材1からガラス相が滲み出す現象が生じ難い。30質量%を超えるとガラス相の滲み出し量が多くなり金属溶射膜が膨れる問題が生じやすい。
<Ceramic substrate>
As the
When the content of the glass phase is less than 3% by mass, a phenomenon that the glass phase exudes from the
[電鋳レンガ]
電鋳レンガは、ジルコニア、アルミナ、珪酸アルミナ、ジルコン-ムライト、シリカおよびチタニアからなる群から選ばれる少なくとも1種を構成成分とし、これらの原料を電気炉で完全に溶解して鋳造するレンガであり、実質的に結晶相とガラス相とからなる。本発明では、公知の電鋳レンガの中から、ガラス相の含有量が3~30質量%のものを選択して用いることができる。
本発明におけるセラミック基材中のガラス相の含有量は、断面写真に基づき、結晶相とガラス相の面積の合計に対するガラス相の面積率を求め、これを質量率に換算することにより得られる値である。具体的には、金属溶射膜を被覆するセラミック基材の緻密な表面から50mm以内の表層において、電子顕微鏡によって50~100倍で撮影した反射電子像(組成像)を用いて、ガラス相と結晶相を二値化して求める。
本発明で用いられる電鋳レンガの具体例としては、AZS(Al2O3-SiO2-ZrO2)レンガ、ジルコニアの含有量を高めた高ジルコニア質レンガ等が挙げられる。これらのうちAZSレンガは、加熱または熱変動時に生じるクラックが生じ難いため好ましい。
AZSレンガのガラス相の含有量は、10~25質量%が好ましく、15~20質量%がより好ましい。AZSレンガのガラス相の含有量は、原料の配合比によって調整できる。
AZSレンガの組成として、Al2O3が40~55質量%、SiO2が10~15質量%、ZrO2が30~45質量%、Na2Oが0.5~2.5質量%が好ましい。他の成分、例えば、ガラス相を構成する各種金属酸化物及び不可避不純物などが、2%以下が好ましく、1%以下がより好ましい。
高ジルコニア質レンガのガラス相の含有量は、2~20質量%が好ましく、4~15質量%がより好ましい。高ジルコニア質レンガのガラス相の含有量は、調合によって調整できる。
高ジルコニア質レンガの組成として、Al2O3が0.5~20質量%、SiO2が2~10質量%、ZrO2が80~96質量%が好ましい。他の成分は、例えば、ガラス相を構成する各種金属酸化物及び不可避不純物などが、Na2Oを含めて、好ましくは3%以下、2%以下がより好ましい。
[Electroformed brick]
An electroformed brick is a brick that has at least one component selected from the group consisting of zirconia, alumina, silicate alumina, zircon-mullite, silica, and titania, and is cast by melting these raw materials completely in an electric furnace. , Consisting essentially of a crystal phase and a glass phase. In the present invention, one having a glass phase content of 3 to 30% by mass can be selected from known electroformed bricks.
The content of the glass phase in the ceramic substrate in the present invention is a value obtained by obtaining the area ratio of the glass phase relative to the total area of the crystal phase and the glass phase based on the cross-sectional photograph and converting this to the mass ratio. It is. Specifically, on the surface layer within 50 mm from the dense surface of the ceramic substrate that coats the metal sprayed film, using a reflected electron image (composition image) taken with an electron microscope at a magnification of 50 to 100 times, a glass phase and a crystal Obtained by binarizing the phase.
Specific examples of the electroformed brick used in the present invention include AZS (Al 2 O 3 —SiO 2 —ZrO 2 ) brick, high zirconia brick with increased zirconia content, and the like. Of these, AZS bricks are preferred because cracks that occur during heating or heat fluctuation are unlikely to occur.
The content of the glass phase of the AZS brick is preferably 10 to 25% by mass, and more preferably 15 to 20% by mass. The content of the glass phase of the AZS brick can be adjusted by the mixing ratio of the raw materials.
The composition of the AZS brick is preferably 40 to 55% by mass of Al 2 O 3 , 10 to 15% by mass of SiO 2 , 30 to 45% by mass of ZrO 2 , and 0.5 to 2.5% by mass of Na 2 O. . Other components such as various metal oxides and inevitable impurities constituting the glass phase are preferably 2% or less, more preferably 1% or less.
The content of the glass phase of the high zirconia brick is preferably 2 to 20% by mass, and more preferably 4 to 15% by mass. The content of the glass phase of the high zirconia brick can be adjusted by blending.
As the composition of the high zirconia brick, Al 2 O 3 is preferably 0.5 to 20% by mass, SiO 2 is 2 to 10% by mass, and ZrO 2 is preferably 80 to 96% by mass. The other components include, for example, various metal oxides and inevitable impurities constituting the glass phase, including Na 2 O, preferably 3% or less and more preferably 2% or less.
[ジルコンを主成分とする焼結レンガ]
ジルコンを主成分とする焼結レンガは、ジルコンを80~96質量%含有する焼結レンガであり、実質的に結晶相とガラス相とからなる。本発明では、公知のジルコンを主成分とする焼結レンガの中から、ガラス相の含有量が3~30質量%のものを選択して用いることができる。
ジルコンを主成分とする焼結レンガにおけるガラス相の含有量は、3~10質量%が好ましく、4~10質量%がより好ましい。ジルコンを主成分とする焼結レンガのガラス相の含有量は、原料粉末の配合比によって調整できる。
ジルコンを主成分とする焼結レンガの組成として、SiO2が30~45質量%、ZrO2が50~70質量%、他の金属酸化物が5質量%以下が好ましい。
[Sintered bricks mainly composed of zircon]
The sintered brick mainly composed of zircon is a sintered brick containing 80 to 96% by mass of zircon, and substantially consists of a crystal phase and a glass phase. In the present invention, one having a glass phase content of 3 to 30% by mass can be selected from among known sintered bricks mainly composed of zircon.
The content of the glass phase in the sintered brick mainly composed of zircon is preferably 3 to 10% by mass, and more preferably 4 to 10% by mass. Content of the glass phase of the sintered brick which has a main component of zircon can be adjusted with the compounding ratio of raw material powder.
The composition of the sintered brick mainly composed of zircon is preferably 30 to 45% by mass of SiO 2 , 50 to 70% by mass of ZrO 2 and 5% by mass or less of other metal oxides.
[アンカー用凹部]
セラミック基材1の表面に、規則的なアンカー用凹部3が形成されていることが好ましい。アンカー用凹部3を設けることにより、セラミック基材1と金属溶射膜2との密着強さがより向上する。特にセラミック基材1の表面に平行な方向の引っ張り応力に対する密着強さが向上する。
図2はアンカー用凹部3の形状の一例を示すもので、(a)は平面図、(b)は(a)中のB-B線に沿う断面図である。
本例のアンカー用凹部3は、断面形状が長方形である複数の直線溝gが格子状に設けられている。各溝gの側面は、セラミック基材1の表面に対して垂直であり、溝幅wは一定である。
アンカー効果が効果的に得られるには、アンカー用凹部3を構成する溝gにはある程度の深さが必要であるが、深すぎると、セラミック基材1の表層部分の強度を低下させ、加工も難しい。例えば、溝gの深さdは、50~350μm程度が好ましく、より好ましくは150~250μm程度である。
[Recess for anchor]
It is preferable that a
2A and 2B show an example of the shape of the
The
In order to effectively obtain the anchor effect, the groove g constituting the
金属溶射膜2とセラミック基材1との間で発生する応力の分散度は、溝ピッチ(溝間間隔であり、隣接する溝のそれぞれの中央線間の距離を指す。)pによって変わり、応力を分散して一箇所にかかる応力を小さくするには溝ピッチpを小さくすることが好ましい。金属溶射膜2の応力耐久性及びセラミック基材1の強度を勘案すると、溝ピッチpは、2.5mm程度以下が好ましく、より好ましくは1.5mm程度以下である。同じ理由により、溝幅wも狭い方が好ましく、又、セラミック基材1の表層部分の強度を保持する点でも溝幅wは狭い方が好ましい。但し、溶射される金属粒子の粒径より溝幅wが狭いと、溶射粒子で溝を充填できないので、溝幅wは、溶射粒子の粒径以上とする。例えば、溝幅wは100μm以上が好ましく、150μm程度以上がより好ましい。
The degree of dispersion of the stress generated between the metal sprayed
隣り合う溝gの間の凸部が応力に抗して破断しない強度を保有するためには、応力に応じた凸部幅x(=溝間間隔、溝ピッチpと溝幅wとの差)を確保する必要がある。金属溶射膜2から加わる、セラミック基材1の表面に平行な方向の引っ張り応力は、セラミック基材1上に形成される金属溶射膜2の厚さmが厚いほど大きくなる。この点で、凸部の幅xは、金属溶射膜2の厚さmの4倍程度以上であると好ましい。更に、溝ピッチpを小さくする点を考慮すると、好ましい凸部の幅xは、膜の厚さmの2.5~5倍程度となる。
In order to maintain the strength at which the convex portion between adjacent grooves g does not break against the stress, the convex portion width x (= inter-groove interval, difference between groove pitch p and groove width w) according to the stress. It is necessary to ensure. The tensile stress applied from the
溝gの側面にかかる応力は、溝が深い(すなわち、側面が大きい)ほど側面全体に応力が分散し、凸部が破断し難くなる。従って、溝の深さdに対する溝ピッチpの割合(p/d)が小さいほど、応力の分散性が高く、金属溶射膜2の剥離を抑制し易くなる。前述の好適な溝ピッチp及び溝の深さdに基づいて応力が適切に分散されるp/d値を求めると、好ましくは3~8程度となる。
As for the stress applied to the side surface of the groove g, the deeper the groove (that is, the larger the side surface), the more the stress is dispersed on the entire side surface, and the convex portion is less likely to break. Therefore, the smaller the ratio (p / d) of the groove pitch p to the groove depth d, the higher the stress dispersibility, and the easier it is to prevent the metal sprayed
なお、アンカー用凹部は、図2に示す形状のものに限られない。例えば略円柱状の孔が規則的に形成されていてもよい。
図2に示すような溝3の代替として断続的な孔を形成する場合は、直交格子(碁盤目)の交差位置に孔を形成することが好ましい。または孔ピッチ距離が均一となるように千鳥状(互い違い状:Staggered Layout)の位置に配置されていることが好ましい。例えば、孔ピッチの距離は0.7~2.5mm程度が好ましく、1.0~1.6mm程度がより好ましい。孔直径は200~500μm程度が好ましく、300~400μmがより好ましい。孔の深さは200~600μm程度が好ましく、300~500μm程度がより好ましい。
The anchor recess is not limited to the shape shown in FIG. For example, substantially cylindrical holes may be regularly formed.
When intermittent holes are formed as an alternative to the
アンカー用凹部3の形成は、アンカー用凹部3が溝状である場合、例えば砥石、ダイヤモンドブレード等で構成される研削刃を装着した研削機を用いて機械的に行うことができる。または、レーザー等の高エネルギービームや高圧水流を用いて行ってもよい。アンカー用凹部3が孔状である場合は、ピンドリル等の形態の研削具、またはレーザー等の高エネルギービームや高圧水流を用いて形成することができる。アンカー用凹部3を形成する前に、予め研削機による切り出し等によってセラミック基材1の表面を精度の高い平面に整えると、不測の凹凸に起因して金属溶射膜2が剥離するのを回避できる点で好ましい。
When the
本発明において、アンカー用凹部3は溝状、孔状のいずれでもよいが、孔状の方が、金属溶射膜で閉じた閉空間(孔の内方の空間)が相対的に小さく、孔一つ一つで閉空間を構成できるため、セラミック基材1と金属溶射膜2との界面にガラス相が充填されることによる、金属溶射膜2の厚さ方向の引張り力に対する密着強さの向上効果が大きい点で好ましい。他方、溝状の方は、金属溶射膜で閉じた閉空間(溝の内方の空間)が相対的に大きく、大きな溝で閉空間を構成するため、上記効果が相対的に低い。
In the present invention, the
<金属溶射膜>
金属溶射膜2は、溶射法によって形成された金属膜である。溶射法は、高温に加熱された金属粒子を基材上に射出し、該金属粒子の堆積によって被膜を形成する方法である。したがって、金属溶射膜は、溶融金属の塗布等による固化膜などとは異なり、断面において粒状堆積構造が見られる。
金属としては、白金族金属、および白金族金属の1種以上を主成分とする合金からなる群から選ばれる少なくとも1種の金属が用いられる。
白金族金属としては、白金(Pt)、イリジウム(Ir)、ルテニウム(Ru)、ロジウム(Rh)が挙げられる。白金族金属を主成分とする合金としては、例えば、Pt-5%Au合金、Pt-10%Ir合金、Pt-10%Rh合金等の白金合金が挙げられる。
<Metal sprayed film>
The metal sprayed
As the metal, at least one metal selected from the group consisting of platinum group metals and alloys composed mainly of one or more platinum group metals is used.
Examples of the platinum group metal include platinum (Pt), iridium (Ir), ruthenium (Ru), and rhodium (Rh). Examples of the alloy containing a platinum group metal as a main component include platinum alloys such as a Pt-5% Au alloy, a Pt-10% Ir alloy, and a Pt-10% Rh alloy.
<セラミック部材の製造方法>
まず、セラミック基材1上に金属溶射膜2を形成する。セラミック基材1の表面にアンカー用凹部3が設けられている場合は、該アンカー用凹部3を覆うように金属溶射膜2を形成する。溶射方法は、レーザー溶射法、ワイヤーフレーム溶射法、プラズマ溶射法、アーク溶射法、酸水素炎溶射法等、公知の溶射方法を適宜用いることができる。
溶射法において射出される金属粒子の粒子径(飛行溶射粒子径)は細かい方が好ましく、溶射方法の種類によっては40μm程度まで減少可能であるが、概して50~150μm程度である。
溶射法によって射出された金属粒子は、セラミック基材1の表面上に堆積して金属溶射膜2を形成する。セラミック基材1の表面にアンカー用凹部3が形成されている場合、溶射法によって射出された金属粒子は該凹部3を充填し、さらに表面上に堆積して金属溶射膜2を形成する。
金属溶射膜2の厚さmは、溶射量によって適宜調整できる。厚いほど、セラミック基材1の表面に平行な方向の引っ張り応力による歪みが大きくなるため、溶射膜2の厚さm(凹部がある場合は、凹部が無い部位での厚さ)は100~400μm程度が好ましく、より好ましい範囲は200~350μmである。
<Manufacturing method of ceramic member>
First, the metal sprayed
The particle diameter of the metal particles (flying spray particle diameter) injected in the thermal spraying method is preferably finer and can be reduced to about 40 μm depending on the type of thermal spraying method, but is generally about 50 to 150 μm.
The metal particles injected by the thermal spraying method are deposited on the surface of the
The thickness m of the metal sprayed
射出される金属粒子の温度は、概して、700~1500℃程度であるので、予め加熱(すなわち、予熱)を行うなど、溶射を施す際のセラミック基材の温度を上昇させて、金属粒子とセラミック基材との温度差を減少させると、金属溶射膜2とセラミック基材1との密着性が向上するので好ましい。この場合、セラミック基材1を加熱(予熱)した状態で、溶射を行った後に常温まで徐冷することが好ましい。
溶射時のセラミック基材1の温度(予熱温度)は、射出される金属粒子の凝固温度以下、具体的には200~500℃程度が好ましく、より好ましくは300~400℃とする。徐冷時の降温速度はできる限り遅い方が良く、望ましくは10℃/分程度以下とする。
Since the temperature of the metal particles to be injected is generally about 700 to 1500 ° C., the temperature of the ceramic substrate during the thermal spraying is increased, for example, by preheating (that is, preheating). It is preferable to reduce the temperature difference from the base material because the adhesion between the metal sprayed
The temperature (preheating temperature) of the
次いで、セラミック基材1上に金属溶射膜2が形成された状態で、1500℃以上の温度で熱処理を行う。
かかる熱処理を行うことにより、セラミック基材1と金属溶射膜2との界面の微小な空間に、セラミック基材1からガラス相が滲み出して、該空間にガラス相が充填された状態が得られる。これは、1500℃以上の高温に加熱されると、セラミック基材中のガラス相が流動しやすくなるとともに、ガラス相とセラミックス相の熱膨張差によって、該ガラス相が微小な空間に押し出され、該空間内に濡れ広がると考えられる。
Next, heat treatment is performed at a temperature of 1500 ° C. or higher with the metal sprayed
By performing such heat treatment, the glass phase oozes out from the
本発明において、セラミック基材1と金属溶射膜2との界面の空間にガラス相が充填された状態とは、セラミック基材1と金属溶射膜2との間にガラス相が存在し、該ガラス相の少なくとも一部は、セラミック基材1と金属溶射膜2の両方に接している状態をいう。セラミック基材1と金属溶射膜2との界面において空間が若干残っていてもよいが、セラミック基材1と金属溶射膜2との良好な密着強度を得るうえで、かかる空間はできるだけ残っていないことが好ましい。例えば、熱処理後の断面写真において、セラミック基材1と金属溶射膜2との界面に存在する空間の全面積に対して、ガラス相が存在せずに残っている空間が20面積%以下であることが好ましく、10面積%以下がより好ましく、0面積%が最も好ましい。
In the present invention, the state in which the glass phase is filled in the space at the interface between the
熱処理温度が1500℃よりも低いと、セラミック基材1と金属溶射膜2との界面の空間がガラス相で満たされた状態が得られにくい。これは、ガラス相の流動状態が不足するため、短時間で該空間内に濡れ広がることができず、時間の経過とともにセラミックス相とガラス相とが反応するため、加熱時間を長くしても該空間がガラス相で満たされた状態が得られないと考えられる。
一方、熱処理温度の上限は、溶射膜2を構成する金属の融点より低いことが必要である。
したがって熱処理温度は、溶射膜2の融点未満であって、後述の好ましい熱処理時間で、セラミック基材1と金属溶射膜2との界面の空間がガラス相で満たされるように設定することが好ましい。好ましい熱処理温度は、セラミック基材1の成分組成等によっても異なるが、例えば1500~1700℃程度が好ましく、1500~1600℃程度がより好ましい。熱処理温度がこれら範囲であればガラス相の流動性が高いため、セラミック基材1と金属溶射膜2との界面の空間をガラス相で満たす効果に対するセラミックス相とガラス相との反応の影響は低い。
熱処理時間は、短すぎると、セラミック基材1と金属溶射膜2との界面に多く空間が残ってしまう。一方、熱処理時間が長くなると、時間の経過とともにセラミックス相とガラス相が反応するため、セラミック基材1と金属溶射膜2との界面の空間に、ガラス相が押し出される現象が進行しにくくなる。
したがって、熱処理時間は、これらの不都合が生じないように設定することが好ましい。例えば1~100時間程度が好ましく、10~50時間がより好ましい。
本発明の製造方法によれば、セラミック基材1と金属溶射膜2との界面の空間に、セラミック基材に由来するガラス相が充填されている、本発明のセラミック部材が得られる。
When the heat treatment temperature is lower than 1500 ° C., it is difficult to obtain a state where the space at the interface between the
On the other hand, the upper limit of the heat treatment temperature needs to be lower than the melting point of the metal constituting the sprayed
Therefore, the heat treatment temperature is preferably set so that the space at the interface between the
If the heat treatment time is too short, a large amount of space remains at the interface between the
Therefore, it is preferable to set the heat treatment time so that these disadvantages do not occur. For example, it is preferably about 1 to 100 hours, and more preferably 10 to 50 hours.
According to the manufacturing method of the present invention, the ceramic member of the present invention in which the space at the interface between the
<セラミック部材の用途>
本発明のセラミック部材は、使用時の温度が1500℃未満の部材である。すなわち、使用時の温度が1500℃以上となることが想定されていない部位に用いられる。
使用温度が1500℃以上となる部材では、使用前に1500℃以上の熱処理を行わなくても、結果的に本発明と同様の効果が得られる可能性があり、かかる部材では本発明を適用する必要性が低いからである。
このことから、本発明のセラミック部材は、使用時の温度が1450℃以下の部材であることが好ましく、1400℃以下の部材であることがより好ましい。
<Uses of ceramic members>
The ceramic member of the present invention is a member having a temperature of less than 1500 ° C. during use. That is, it is used for a portion where the temperature during use is not assumed to be 1500 ° C. or higher.
In a member whose operating temperature is 1500 ° C. or higher, there is a possibility that the same effect as that of the present invention may be obtained as a result without performing heat treatment at 1500 ° C. or higher before use, and the present invention is applied to such a member. This is because the necessity is low.
For this reason, the ceramic member of the present invention is preferably a member having a temperature of 1450 ° C. or lower, more preferably a member having a temperature of 1400 ° C. or lower.
本発明のセラミック部材は、セラミック基材1上に金属溶射膜1が設けられているため、溶融ガラスに対する耐食性に優れる。したがって、本発明のセラミック部材は、溶融ガラスの製造に用いられる装置において、1500℃未満の溶融ガラスに接触する部材として好適に用いられる。また、本発明のセラミック部材は、溶融ガラスの製造に用いられる装置において、1450℃以下の溶融ガラスに接触する部材としてより好適に用いられ、1400℃以下の溶融ガラスに接触する部材としてさらに好適に用いられる。
具体的には、溶融槽から流出された溶融ガラスが、好ましくは減圧脱泡装置を経て、成形装置に送られるまでの流路において、1500℃未満の溶融ガラスに接触する部材として好適に用いられる。また、溶融槽から流出された溶融ガラスが、より好ましくは減圧脱泡装置を経て、成形装置に送られるまでの流路において、1450℃以下の溶融ガラスに接触する部材としてより好適に用いられ、1400℃以下の溶融ガラスに接触する部材としてさらに好適に用いられる。例えば、減圧脱泡槽の内壁を構成する部材、減圧脱泡槽の上流に設けられる溶融上昇管の内壁を構成する部材、または減圧脱泡槽の下流に設けられる下降管の内壁を構成する部材が挙げられる。
Since the metal sprayed
Specifically, the molten glass that has flowed out of the melting tank is preferably used as a member that comes into contact with the molten glass at a temperature of less than 1500 ° C., preferably through a vacuum degassing apparatus and sent to the molding apparatus. . In addition, the molten glass that has flowed out of the melting tank is more preferably used as a member that contacts the molten glass at 1450 ° C. or lower in the flow path until it is sent to the molding device through a vacuum degassing device, It is more suitably used as a member that contacts molten glass at 1400 ° C. or lower. For example, a member constituting the inner wall of the vacuum degassing tank, a member constituting the inner wall of the melting riser pipe provided upstream of the vacuum degassing tank, or a member constituting the inner wall of the downcomer pipe provided downstream of the vacuum degassing tank Is mentioned.
本発明のセラミック部材は、セラミック基材1の表面上に金属溶射膜2が設けられているため、溶融ガラスと接触してもセラミック基材1の浸食が抑えられる。また後述の実施例に示されるように、セラミック基材1と金属溶射膜2との密着強さに優れるため、該金属溶射膜2が剥離し難く、耐久性に優れる。
In the ceramic member of the present invention, since the metal sprayed
また、本発明のセラミック部材を溶融ガラスと接触する部材に用いた場合には、セラミック基材と金属溶射膜との界面の空間にガラス相が充填されていることから、溶融ガラス中における気泡発生を抑える効果が得られる。
すなわち、溶融ガラス中に存在する水分が、白金族金属の触媒作用により金属溶射膜の表面で酸素と水素とに分解されると、水素は金属溶射膜を透過し、酸素は金属溶射膜を透過せずその表面に残る。このとき、水素が金属溶射膜に留まれば、金属溶射膜表面の酸素と再び結合して水を生成するため、酸素が気泡となることはない。
ところが、従来のセラミック部材では、金属溶射膜と、その下層であるセラミック基材との界面に微小な空間があるため、金属溶射膜を透過した水素が、該空間を介して移動してしまい、金属溶射膜に水素が留まらない。このため、金属溶射膜表面の酸素は、再び水素と結合することができず、気泡となってしまう。
本発明のセラミック部材は、かかる金属溶射膜とセラミック基材との界面の空間にガラス相が充填されているため、水素は金属溶射膜に留まり、酸素と再び結合して水を生成することができる。したがって酸素が気泡となるのを防止できる。
In addition, when the ceramic member of the present invention is used as a member that comes into contact with molten glass, bubbles are generated in the molten glass because the glass phase is filled in the space between the ceramic substrate and the metal sprayed film. The effect which suppresses is acquired.
That is, when moisture present in the molten glass is decomposed into oxygen and hydrogen on the surface of the metal spray film by the catalytic action of the platinum group metal, hydrogen passes through the metal spray film and oxygen passes through the metal spray film. It remains on its surface without. At this time, if hydrogen stays on the metal sprayed film, it combines with oxygen on the surface of the metal sprayed film to generate water, so that oxygen does not become bubbles.
However, in the conventional ceramic member, since there is a minute space at the interface between the metal sprayed film and the ceramic substrate that is the lower layer, the hydrogen that has permeated the metal sprayed film moves through the space, Hydrogen does not stay on the metal sprayed film. For this reason, oxygen on the surface of the metal sprayed film cannot be combined with hydrogen again, resulting in bubbles.
In the ceramic member of the present invention, since the glass phase is filled in the space between the metal spray film and the ceramic substrate, hydrogen stays in the metal spray film and recombines with oxygen to generate water. it can. Therefore, oxygen can be prevented from forming bubbles.
<溶融ガラスの製造装置>
本発明の溶融ガラスの製造装置は、1500℃未満の溶融ガラスに接触する部材に、本発明のセラミック部材が用いられているものである。また、本発明の溶融ガラスの製造装置は、1450℃以下の溶融ガラスに接触する部材に本発明のセラミック部材が用いられていることが好ましく、1400℃以下の溶融ガラスに接触する部材に本発明のセラミック部材が用いられていることがさらに好ましい。
また、本発明の溶融ガラスの製造装置は、白金族金属、および白金族金属の1種以上を主成分とする合金からなる群から選ばれる少なくとも1種の金属の溶射膜を形成した、ガラス相を3~30質量%含む、電鋳レンガまたはジルコンを主成分とする焼結レンガからなるセラミック基材を用いて、溶融ガラスの製造装置の1500℃未満、好ましくは1450℃以下、より好ましくは1400℃以下の溶融ガラスと接する部分の少なくとも一部を構成し、前記溶融ガラスの製造装置の少なくとも前記セラミック基材を1500℃以上の温度で熱処理してなる。
さらに、本発明の溶融ガラスの製造装置は、ガラス相を3~30質量%含む、電鋳レンガまたはジルコンを主成分とする焼結レンガからなるセラミック基材を用いて、溶融ガラスの製造装置の1500℃未満、好ましくは1450℃以下、より好ましくは1400℃以下の溶融ガラスと接する部分の少なくとも一部を構成し、この構成された部分のセラミック基材上に、白金族金属、および白金族金属の1種以上を主成分とする合金からなる群から選ばれる少なくとも1種の金属の溶射膜を形成し、次いで、溶融ガラスの製造装置の少なくとも前記金属の溶射膜の形成されたセラミック基材を1500℃以上の温度で熱処理してなる。
図3は、本発明の溶融ガラスの製造装置の一実施形態を示した縦断面図である。本実施形態の装置は、ガラス原料の溶解ならびに溶融ガラスの均質化および清澄を行う溶融槽11、内部の気圧が大気圧未満に設定され、溶融槽11から供給される溶融ガラス中の泡を浮上および破泡させる減圧脱泡装置12、溶融槽11と減圧脱泡装置12とを接続する第1の導管13、減圧脱泡装置12から流出される溶融ガラスを、冷却槽15を介して次工程の成形手段に送るための第2の導管14とから概略構成されている。図中符号Gは溶融ガラスを示す。
第1の導管13には冷却手段13aおよび撹拌手段13bが設けられており、溶融槽11から流出された溶融ガラスは、第1の導管13で1000℃以上、1500℃未満に冷却された後に、減圧脱泡装置12に導入されるようになっている。
減圧脱泡装置12は、減圧脱泡槽12aを備えており、減圧脱泡槽12aの上流側は上昇管12bを介して第1の導管13と連通しており、減圧脱泡槽12aの下流側は下降管12cを介して第2の導管14と連通している。減圧脱泡槽12a、上昇管12b、下降管12cの内部は減圧環境に維持され、サイフォン効果によって、第1の導管13内の溶融ガラスを、上昇管12bを介して減圧脱泡槽12aへ吸い上げるように構成されている。また導管14以降は、冷却槽15を介して成形手段につながっている。
<Molded glass manufacturing equipment>
The apparatus for producing molten glass of the present invention uses the ceramic member of the present invention as a member that contacts molten glass of less than 1500 ° C. In the molten glass production apparatus of the present invention, the ceramic member of the present invention is preferably used for a member that contacts the molten glass at 1450 ° C. or lower, and the present invention is preferably applied to a member that contacts the molten glass at 1400 ° C. or lower. More preferably, the ceramic member is used.
Moreover, the apparatus for producing molten glass of the present invention comprises a glass phase in which a sprayed film of at least one metal selected from the group consisting of a platinum group metal and an alloy containing at least one platinum group metal as a main component is formed. 3 to 30% by mass, using a ceramic base material made of electrocast brick or sintered brick mainly composed of zircon, less than 1500 ° C., preferably 1450 ° C. or less, more preferably 1400 ° C. of a molten glass production apparatus. It constitutes at least a part of a portion in contact with the molten glass having a temperature of not higher than ° C., and at least the ceramic substrate of the molten glass manufacturing apparatus is heat treated at a temperature of 1500 ° C. or higher.
Furthermore, the apparatus for producing molten glass of the present invention is an apparatus for producing molten glass using a ceramic base material comprising 3-30% by mass of a glass phase and comprising a sintered brick mainly composed of electroformed brick or zircon. It constitutes at least a part of a part in contact with the molten glass of less than 1500 ° C., preferably 1450 ° C. or less, more preferably 1400 ° C. or less, and a platinum group metal and a platinum group metal are formed on the ceramic substrate of the constituted part Forming a ceramic sprayed film of at least one metal selected from the group consisting of an alloy mainly composed of one or more of the following, and then forming a ceramic substrate on which at least the metal sprayed film of the molten glass manufacturing apparatus is formed Heat treatment is performed at a temperature of 1500 ° C. or higher.
FIG. 3 is a longitudinal sectional view showing an embodiment of the apparatus for producing molten glass according to the present invention. The apparatus of this embodiment is a
The
The
本実施形態の装置において、減圧脱泡装置12の減圧脱泡槽12a、上昇管12b、下降管12c、および冷却槽15の内壁を構成する部材が、本発明に係る、セラミック部材、または金属の溶射膜が形成されたセラミック基材を熱処理してなるものからなる。すなわち、減圧脱泡槽12a、上昇管12b、下降管12c、および冷却槽15の内壁は、内面が金属溶射膜で被覆されたセラミック基材からなっており、セラミック基材と金属溶射膜との界面の微小な空間にガラス相が充填されている。
かかる減圧脱泡装置12および冷却槽15は、まず、減圧脱泡槽12a、上昇管12b、下降管12c、および冷却槽15の内壁を、予め金属溶射膜で被覆されたセラミック基材で形成して、減圧脱泡装置12から冷却槽15までの一連の形状に組み立てた後、減圧脱泡装置12および冷却槽15を含む一連の構造物の内部を1500℃以上の所定温度で熱処理を施し、次いで使用温度以下に冷却する方法で製造される。また、本発明のセラミック部材により、減圧脱泡槽12a、上昇管12b、下降管12c、および冷却槽15の内壁を形成して、減圧脱泡装置12から冷却槽15までの一連の形状に組み立てることもできる。また、減圧脱泡槽12a、上昇管12b、下降管12c、および冷却槽15の内壁を、セラミック基材で形成して、これらの基材の溶融ガラスと接する側の表面に金属の溶射膜を形成し、次いで、前記金属の溶射膜の形成されたセラミック基材を1500℃以上の温度で熱処理することもできる。
こうして装置を製造した後、1500℃未満の使用温度で使用される。また、こうして装置を製造した後、1450℃以下の使用温度で使用されることが好ましく、1400℃以下の使用温度で使用されることがさらに好ましい。
なお、各部の組み立て手順や本発明のセラミック部材を用いる部位は、上記の例に限定されない。たとえば、冷却槽15での溶融ガラス温度はその上流部に比べて低いので、本発明のセラミック部材を用いる部位を減圧脱泡装置12のみとして、冷却槽15に用いない構成でもよい。あるいは、減圧脱泡装置12のうちで本発明のセラミック部材を用いる部位を、減圧脱泡槽12aのみとしたり、上昇管12bと下降管12cのみとしたり、下降管12cのみとしてもよい。また、第1の導管13、第2の導管14の内壁に、本発明のセラミック部材を用いてもよい。
In the apparatus of the present embodiment, the members constituting the inner walls of the reduced
The
After the device is manufactured in this way, it is used at a use temperature of less than 1500 ° C. Moreover, after manufacturing an apparatus in this way, it is preferably used at a use temperature of 1450 ° C. or less, and more preferably used at a use temperature of 1400 ° C. or less.
In addition, the assembly procedure of each part and the site | part using the ceramic member of this invention are not limited to said example. For example, since the molten glass temperature in the cooling
<溶融ガラスの製造方法>
本発明の溶融ガラスの製造方法は、1500℃未満の溶融ガラスに接触する部材に、本発明のセラミック部材が用いられている製造装置を用いて溶融ガラスを製造する方法である。また、本発明の溶融ガラスの製造方法は、1450℃以下の溶融ガラスに接触する部材に、本発明のセラミック部材が用いられている製造装置を用いることが好ましい溶融ガラスを製造する方法である。さらに、本発明の溶融ガラスの製造方法は、1400℃以下の溶融ガラスに接触する部材に、本発明のセラミック部材が用いられている製造装置を用いることがより好ましい溶融ガラスを製造する方法である。
例えば、図3に示す溶融ガラスの製造装置を用いて溶融ガラスを製造する方法にあっては、溶融槽11から流出された溶融ガラスが、第1の導管13で1000℃以上、1500℃未満に冷却された後に、減圧脱泡装置12に導入される。また、溶融槽11から流出された溶融ガラスが、第1の導管13で1000℃以上、1450℃以下に冷却された後に、減圧脱泡装置12に導入されることが好ましい。さらに、溶融槽11から流出された溶融ガラスが、第1の導管13で1000℃以上、1400℃以下に冷却された後に、減圧脱泡装置12に導入されることがより好ましい。
減圧脱泡装置12の減圧脱泡槽12a、上昇管12b、下降管12c、および冷却槽15の内壁は、1000℃以上、1500℃未満の溶融ガラスと接触するが、該内壁を構成するセラミック基材の表面(すなわち、内面)が、金属溶射膜で被覆されているため、溶融ガラスに対する耐食性に優れる。また、セラミック基材と金属溶射膜との密着強さに優れるため、該溶射膜が剥離し難く、耐久性に優れる。
さらに、金属溶射膜とその下層であるセラミック基材との界面にガラス相が充填されているため、ガラス中の水分が、金属溶射膜の表面で酸素と水素とに分解されても、該水素は金属溶射膜に留まることができる。したがって、上述したように、該水素が、水分の分解で生じた酸素と再び結合して水を生成することができるため、かかる酸素に起因して、溶融ガラス中で気泡が発生するのを抑えることができる。
<Method for producing molten glass>
The manufacturing method of the molten glass of this invention is a method of manufacturing a molten glass using the manufacturing apparatus with which the ceramic member of this invention is used for the member which contacts the molten glass below 1500 degreeC. Moreover, the manufacturing method of the molten glass of this invention is a method of manufacturing a molten glass which uses the manufacturing apparatus with which the ceramic member of this invention is used for the member which contacts 1450 degrees C or less molten glass. Furthermore, the manufacturing method of the molten glass of this invention is a method of manufacturing a molten glass more preferable to use the manufacturing apparatus with which the ceramic member of this invention is used for the member which
For example, in the method of manufacturing molten glass using the apparatus for manufacturing molten glass shown in FIG. 3, the molten glass that has flowed out of the
The inner walls of the reduced
Furthermore, since the glass phase is filled in the interface between the metal sprayed film and the ceramic substrate which is the lower layer, even if moisture in the glass is decomposed into oxygen and hydrogen on the surface of the metal sprayed film, the hydrogen Can remain on the metal spray coating. Therefore, as described above, the hydrogen can be recombined with oxygen generated by the decomposition of moisture to generate water, so that generation of bubbles in the molten glass due to the oxygen is suppressed. be able to.
<ガラス物品の製造装置および製造方法>
本発明のガラス物品の製造装置は、溶融ガラスを製造する手段と、得られた溶融ガラスを成形する成形手段と、成形後のガラスを徐冷する徐冷手段とを有し、1500℃未満の溶融ガラスに接触する部材に、本発明のセラミック部材が用いられているものである。また、本発明のガラス物品の製造装置は、溶融ガラスを製造する手段と、得られた溶融ガラスを成形する成形手段と、成形後のガラスを徐冷する徐冷手段とを有し、1450℃以下の溶融ガラスに接触する部材に、本発明のセラミック部材が用いられていることが好ましい。さらに、本発明のガラス物品の製造装置は、溶融ガラスを製造する手段と、得られた溶融ガラスを成形する成形手段と、成形後のガラスを徐冷する徐冷手段とを有し、1400℃以下の溶融ガラスに接触する部材に、本発明のセラミック部材が用いられていることがより好ましい。
溶融ガラスを製造する手段が、本発明の溶融ガラスの製造装置であることが好ましい。例えば、図3に示す、溶融ガラスの製造装置の溶融ガラスの流れ方向の下流に、溶融ガラスを成形する成形手段、その下流に成形後のガラスを徐冷する徐冷手段を有する構成とすることができる。徐冷手段の下流には、さらに切断や研磨を行う加工手段を設けてもよい。成形手段としては、図示していないが、公知のフロート法、ダウンドロー法、フュージョン法など色々な手段が利用できる。徐冷手段および加工手段も公知の技術を利用できる。
図4は本発明に係るガラス物品の製造装置を用いたガラス物品の製造方法の一例を示すフロー図である。
図4に示す方法に従い、ガラス物品を製造するには、好ましくは図3の溶融ガラス製造装置を用いたガラス溶融工程S1により溶融ガラスGを得て、溶融ガラスGを成形手段に送って目的の形状に成形する成形工程S2を経た後、徐冷工程S3にて徐冷する。その後に、必要に応じて後加工工程S4において切断や研磨などの後加工することでガラス物品G5を得ることができる。
<Glass article manufacturing apparatus and method>
The apparatus for producing a glass article of the present invention comprises a means for producing molten glass, a shaping means for shaping the obtained molten glass, and a slow cooling means for gradually cooling the glass after shaping, and is less than 1500 ° C. The ceramic member of this invention is used for the member which contacts molten glass. Moreover, the apparatus for producing a glass article of the present invention has a means for producing molten glass, a shaping means for shaping the obtained molten glass, and a slow cooling means for gradually cooling the glass after shaping, and 1450 ° C. It is preferable that the ceramic member of this invention is used for the member which contacts the following molten glass. Furthermore, the apparatus for producing a glass article of the present invention comprises a means for producing molten glass, a shaping means for shaping the obtained molten glass, and a slow cooling means for gradually cooling the glass after shaping, at 1400 ° C. It is more preferable that the ceramic member of the present invention is used for the following member that contacts the molten glass.
The means for producing molten glass is preferably the molten glass production apparatus of the present invention. For example, as shown in FIG. 3, the apparatus has a forming means for forming molten glass downstream of the molten glass flow direction of the molten glass manufacturing apparatus, and a slow cooling means for gradually cooling the glass after forming downstream thereof. Can do. A processing means for further cutting and polishing may be provided downstream of the slow cooling means. Although not shown, various means such as a known float method, downdraw method, and fusion method can be used as the forming means. A well-known technique can also be used for the slow cooling means and the processing means.
FIG. 4 is a flowchart showing an example of a glass article manufacturing method using the glass article manufacturing apparatus according to the present invention.
In order to manufacture a glass article according to the method shown in FIG. 4, preferably, a molten glass G is obtained by a glass melting step S1 using the molten glass manufacturing apparatus of FIG. 3, and the molten glass G is sent to a forming means. After passing through the forming step S2 for forming into a shape, it is gradually cooled in the slow cooling step S3. Thereafter, the glass article G5 can be obtained by post-processing such as cutting and polishing in the post-processing step S4 as necessary.
以下に実施例を用いて本発明をさらに詳しく説明するが、本発明はこれら実施例に限定されるものではない。
[実施例1]
本例では、セラミック基材としてAZS(Al2O3-SiO2-ZrO2)レンガを用い、下記するように当該レンガの表面を規則的な配置をもった孔加工を施した後に金属溶射を行って金属膜付き基材を得、該金属膜付き基材に熱処理を施してセラミック部材を製造した。以下、このセラミック基材の表面に金属溶射膜が形成された基材を、金属膜付き基材とも称する。
使用したセラミック基材の成分組成を蛍光X線分析法で測定した結果を表1に示す。また熱処理前の金属膜付き基材の断面写真に基づいて求めたガラス相の含有量を表1に合わせて示す(以下、実施例2および比較例1においても同様である。)。ガラス相の含有量の算出は以下の方法で行う。電子顕微鏡を用い、熱処理前の金属膜付き基材の断面の、基材表面から基材内部へ向かって20mmの位置までの間で、50倍の電子顕微鏡の反射電子像(組成像)を撮影する。得られた画像について、結晶相とガラス相の面積の合計と、それに対するガラス相の面積率を求め、該面積率を質量率に換算して得られる値を、ガラス相の含有量(単位:質量%)とする。
まず、AZSレンガを、縦50mm×横50mm×高さ10mmのレンガ片に切断し、このレンガ片の50mm×50mmの一面に、ファイバーレーザーを用いてアンカー用凹部を形成した。アンカー用凹部は略円柱状の孔とし、孔直径は300μm、孔の深さは400μm、孔ピッチの距離は1mmとした。
次いで、レンガ片を大気雰囲気中で300℃まで加熱し、孔を形成した面上にワイヤーフレーム溶射法を用いて白金の溶射を開始した(飛行溶射粒子径:100μm程度、温度約100℃)。白金被膜の膜厚が300μmになるまで溶射を続けた後、レンガ片を常温まで徐冷して金属膜付き基材を得た。
同じ条件で金属膜付き基材を2枚作製し、一方の金属膜付き基材に対して、大気下で電気炉により、1500℃で100時間の熱処理を施してセラミック部材を得た。
また対照として、他方の金属膜付き基材には熱処理を施さず、そのまま未処理サンプルとした。
Hereinafter, the present invention will be described in more detail using examples, but the present invention is not limited to these examples.
[Example 1]
In this example, AZS (Al 2 O 3 —SiO 2 —ZrO 2 ) brick is used as the ceramic substrate, and the surface of the brick is subjected to drilling with a regular arrangement as described below, and then metal spraying is performed. A substrate with a metal film was obtained, and the substrate with a metal film was subjected to heat treatment to produce a ceramic member. Hereinafter, the base material on which the metal sprayed film is formed on the surface of the ceramic base material is also referred to as a base material with a metal film.
Table 1 shows the results of measuring the component composition of the ceramic substrate used by fluorescent X-ray analysis. Further, the glass phase content obtained based on the cross-sectional photograph of the base material with the metal film before the heat treatment is shown in Table 1 (the same applies to Example 2 and Comparative Example 1 below). The glass phase content is calculated by the following method. Using an electron microscope, a 50-fold backscattered electron image (composition image) of the cross section of the base material with a metal film before heat treatment is taken from the base material surface to the position of 20 mm toward the inside of the base material. To do. For the obtained image, the total area of the crystal phase and the glass phase, and the area ratio of the glass phase relative to it, the value obtained by converting the area ratio into a mass ratio, the content of the glass phase (unit: Mass%).
First, AZS bricks were cut into 50 mm long × 50 mm wide × 10 mm high brick pieces, and anchor concave portions were formed on one side of the brick pieces using a fiber laser. The anchor recess was a substantially cylindrical hole, the hole diameter was 300 μm, the hole depth was 400 μm, and the hole pitch distance was 1 mm.
Subsequently, the brick piece was heated to 300 ° C. in an air atmosphere, and the thermal spraying of platinum was started on the surface on which the holes were formed by using a wire frame spraying method (flying spray particle diameter: about 100 μm, temperature about 100 ° C.). Thermal spraying was continued until the film thickness of the platinum coating reached 300 μm, and then the brick pieces were gradually cooled to room temperature to obtain a substrate with a metal film.
Two base materials with a metal film were produced under the same conditions, and one base material with a metal film was heat-treated at 1500 ° C. for 100 hours in an atmosphere in an electric furnace to obtain a ceramic member.
As a control, the other metal film-coated substrate was not subjected to heat treatment, and was used as it was as an untreated sample.
[実施例2]
実施例1において、セラミック基材を高ジルコニア質レンガに変更したほかは同様にして金属膜付き基材を得、該金属膜付き基材に実施例1と同様の熱処理を施してセラミック部材を製造した。また対照として、熱処理を施さない未処理サンプルを実施例1と同様に作成した。
[Example 2]
In Example 1, except that the ceramic substrate was changed to high zirconia brick, a substrate with a metal film was obtained in the same manner, and the substrate with the metal film was subjected to the same heat treatment as in Example 1 to produce a ceramic member. did. As a control, an untreated sample not subjected to heat treatment was prepared in the same manner as in Example 1.
[比較例1]
実施例1において、セラミック基材をαβアルミナ質レンガに変更したほかは同様にして金属膜付き基材を得、該金属膜付き基材に実施例1と同様の熱処理を施してセラミック部材を製造した。また対照として、熱処理を施さない未処理サンプルを実施例1と同様に作成した。
[Comparative Example 1]
In Example 1, except that the ceramic base material was changed to αβ alumina brick, a base material with a metal film was obtained in the same manner, and the base material with the metal film was subjected to the same heat treatment as in Example 1 to produce a ceramic member. did. As a control, an untreated sample not subjected to heat treatment was prepared in the same manner as in Example 1.
[評価方法]
(密着強さ)
各例で得られたセラミック部材および未処理サンプルのそれぞれから、縦14mm×横14mm×高さ10mmの板状片を3個ずつ切り出し、図5に示すように、14mm×14mmの両面に、それぞれ熱硬化型エポキシ接着剤23を用いて引張治具24、25を接着して試験片を作成した。図中符号21はセラミック基材、22は金属溶射膜を示す。
引張強度測定器(TSE社製、製品名:AUTOCOM/AC・50KN-C)を用い、0.5mm/分の速度条件で、引張治具24,25を互いに遠ざかる方向へ引張り、セラミック基材21と金属溶射膜22とが剥離したときの荷重を測定した。剥離時の荷重の値(P)と板状片(セラミック部材)の面積(S)とから、密着強さ(P/S、単位はMPa)を求めた。その結果を図6示す。
[Evaluation methods]
(Adhesion strength)
From each of the ceramic member and untreated sample obtained in each example, three plate-like pieces each having a length of 14 mm, a width of 14 mm, and a height of 10 mm were cut out, and as shown in FIG. A test piece was prepared by bonding the tension jigs 24 and 25 using a
Using a tensile strength measuring instrument (manufactured by TSE, product name: AUTOCOM / AC · 50KN-C), the tension jigs 24 and 25 are pulled away from each other under a speed condition of 0.5 mm / min. The load when the metal sprayed
図6の結果に示されるように、比較例1では未処理サンプルとセラミック部材の密着強さがほぼ同等であった。これに対して、実施例1、2におけるセラミック部材の密着強さは、未処理サンプルの密着強さの3倍以上であり、熱処理を施すことにより密着強さが格段に向上したことが認められる。 As shown in the results of FIG. 6, in Comparative Example 1, the adhesion strength between the untreated sample and the ceramic member was almost equal. On the other hand, the adhesion strength of the ceramic members in Examples 1 and 2 is 3 times or more of the adhesion strength of the untreated sample, and it is recognized that the adhesion strength has been remarkably improved by heat treatment. .
(断面組織)
各例でセラミック部材を製造する際に、熱処理を行う前の金属膜付き基材と、これを熱処理した後のセラミック部材の断面写真をそれぞれ撮影した。図7は実施例1、図8は実施例2、図9は比較例1で得られた写真である。符号21はセラミック基材、22は金属溶射膜を示す。
図7において、(a)は熱処理前、(b)は熱処理後の断面写真であり、(a’)は(a)の写真においてガラス相をマッピングして示したものであり、(b’)は(b)の写真においてガラス相をマッピングして示したものである。
図8、9において、(a)は熱処理前、(b)は熱処理後の断面写真であり、(b’)は(b)の写真の要部(図中符号Bで示す。)を拡大して示したものである。
(Cross-sectional structure)
When manufacturing the ceramic member in each example, a cross-sectional photograph of the substrate with the metal film before heat treatment and the ceramic member after heat treatment was taken. 7 is a photograph obtained in Example 1, FIG. 8 is a photograph obtained in Example 2, and FIG. 9 is a photograph obtained in Comparative Example 1.
In FIG. 7, (a) is a cross-sectional photograph before the heat treatment, (b) is a cross-sectional photograph after the heat treatment, (a ′) is a mapping of the glass phase shown in the photograph (a), (b ′) Is a mapping of the glass phase in the photograph of (b).
8 and 9, (a) is a cross-sectional photograph before heat treatment, (b) is a cross-sectional photograph after heat treatment, and (b ′) is an enlarged view of a main part (indicated by symbol B in the drawing) of (b). It is shown.
図7~9の(a)に示されるように、熱処理前の金属膜付き基材においては、セラミック基材21と金属溶射膜22との界面に微小な隙間(空間)が存在する。一方、図7、8の(b)に示されるように、実施例1、2の熱処理後のセラミック部材では、セラミック基材21と金属溶射膜22との界面に隙間がなく、図7、8の(b’)に示されるように、該界面に沿ってガラス相が存在している。
これに対して、図9の(b)に示されるように、比較例1の熱処理後のセラミック部材では、セラミック基材21と金属溶射膜22との界面には隙間があり、図9の(b’)に示されるように、該界面へのガラス相の滲み出しは認められない。
As shown in FIGS. 7A to 9A, in the base material with the metal film before the heat treatment, there is a minute gap (space) at the interface between the
On the other hand, as shown in FIG. 9B, in the ceramic member after the heat treatment of Comparative Example 1, there is a gap at the interface between the
[実施例3]
本例では、下記の通り、溶融ガラスの製造装置として、セラミック部材からなるガラス溶融用の容器を作製し、該容器内でガラス原料を1400℃で溶融させた後、冷却した。しかる後、後述の評価方法により、容器内壁の近傍における、ガラス中の水分含有量と気泡の有無を調べた。
まず、実施例2で用いたのと同材質の高ジルコニア質レンガからなり、一面に実施例1と同様にしてアンカー用凹部が設けられたセラミック基材を用いて、外径75mm、外壁の高さ55mm、内径50mm、内壁の深さ40mmである、有底円筒状の容器を作成した。アンカー用凹部が設けられた面が内面となるようにした。
次いで、この容器を大気雰囲気中で300℃まで加熱し、内面上に、実施例1と同様にして膜厚が300μmの金属溶射膜を形成して、金属膜付き基材からなる容器を得た。
続いて、この容器を大気下で電気炉に入れ、1600℃で5時間の熱処理を施してセラミック部材からなる容器を得た。
[Example 3]
In this example, as a molten glass manufacturing apparatus, a glass melting container made of a ceramic member was prepared as described below, and the glass raw material was melted at 1400 ° C. in the container and then cooled. Thereafter, the moisture content in the glass and the presence or absence of bubbles in the vicinity of the inner wall of the container were examined by an evaluation method described later.
First, using a ceramic base material made of a high zirconia brick of the same material as used in Example 2 and provided with anchor recesses on one side in the same manner as in Example 1, the outer diameter is 75 mm and the height of the outer wall is high. A bottomed cylindrical container having a thickness of 55 mm, an inner diameter of 50 mm, and an inner wall depth of 40 mm was prepared. The surface provided with the anchor recess was made the inner surface.
Subsequently, this container was heated to 300 ° C. in an air atmosphere, and a metal sprayed film having a film thickness of 300 μm was formed on the inner surface in the same manner as in Example 1 to obtain a container made of a substrate with a metal film. .
Subsequently, this container was placed in an electric furnace under the atmosphere and subjected to heat treatment at 1600 ° C. for 5 hours to obtain a container made of a ceramic member.
上記実施例3の実施に当たっては、得られた容器を加熱炉内に入れ、常圧下で図10に示す熱履歴を加えた。図10の縦軸は加熱炉内の雰囲気温度を示す。まず4時間40分かけて、常温から1400℃に昇温し、1400℃に達した時点で、ホウケイ酸ガラスのガラス原料を容器内に投入し、1400℃で1時間加熱してガラス原料を溶融させた。この後、720℃まで急冷し、720℃で1時間保持した後、2時間かけて600℃まで温度を下げ、さらに3時間かけて常温まで徐冷して、容器内で固化したガラスを得た。 In carrying out the above Example 3, the obtained container was placed in a heating furnace, and the thermal history shown in FIG. 10 was added under normal pressure. The vertical axis | shaft of FIG. 10 shows the atmospheric temperature in a heating furnace. First, the temperature is raised from room temperature to 1400 ° C. over 4 hours and 40 minutes. When the temperature reaches 1400 ° C., the glass raw material of borosilicate glass is put into the container and heated at 1400 ° C. for 1 hour to melt the glass raw material. I let you. Thereafter, the glass was rapidly cooled to 720 ° C. and held at 720 ° C. for 1 hour, then the temperature was lowered to 600 ° C. over 2 hours and further cooled to room temperature over 3 hours to obtain a glass solidified in the container. .
[比較例2]
実施例3において、金属膜付き基材からなる容器に熱処理を施さないほかは、実施例3と同様にして容器内で固化したガラスを得た。
[比較例3]
実施例3において、セラミック基材の材質を高ジルコニア質レンガから、比較例1で用いたのと同じαβアルミナ質レンガに変更したほかは、実施例3と同様にして金属膜付き基材からなる容器を得、該容器に実施例3と同様の熱処理を施してセラミック部材からなる容器を作製した。
この容器を用い、実施例3と同様にして容器内で固化したガラスを得た。
[Comparative Example 2]
In Example 3, glass solidified in the container was obtained in the same manner as in Example 3 except that the container made of the metal film-coated substrate was not subjected to heat treatment.
[Comparative Example 3]
In Example 3, the material of the ceramic substrate was changed from a high zirconia brick to the same αβ alumina brick as used in Comparative Example 1, and was made of a substrate with a metal film in the same manner as in Example 3. A container was obtained, and the same heat treatment as in Example 3 was performed on the container to prepare a container made of a ceramic member.
Using this container, a glass solidified in the container was obtained in the same manner as in Example 3.
[評価方法]
(水分含有量および気泡の有無)
ガラス中の水分含有量の指標としてガラスのβ-OH値を測定した。ガラスのβ-OH値(単位:mm-1)は、ガラス試料について波長2.75~2.95μmの光に対する吸光度を測定し、その最大値βmaxを該ガラス試料の厚さ(mm)で割ることで求めることができる。
上記各例で得られた、容器内で固化したガラスを、高さ方向に沿う切断面で、容器ごと切断し、厚さ1mmの縦断面サンプルを切り出した。得られた縦断面サンプルの、容器の高さ方向の中央部であって、容器内壁と固化したガラスとの界面付近の領域について、上記の方法でβ-OH値を測定した。また該領域の写真を撮影した。
実施例3の結果を図11に示し、比較例2の結果を図12に示し、比較例3の結果を図13に示す。各図の(a)は断面写真であり、界面の基準位置を矢印で示す。図中符号21はセラミック基材、22は金属溶射膜、30はガラスを示す。各図の(b)はβ-OH値の測定結果を示すグラフで、横軸は(a)の断面写真の横方向における距離(単位:μm)を示し、縦軸はβ-OH値(単位:mm-1)を示す。界面の基準位置に対応する位置を矢印で示す。
[Evaluation methods]
(Moisture content and presence of bubbles)
The β-OH value of the glass was measured as an indicator of the water content in the glass. The β-OH value (unit: mm −1 ) of the glass was measured by measuring the absorbance of the glass sample with respect to light having a wavelength of 2.75 to 2.95 μm, and determining the maximum value β max as the thickness (mm) of the glass sample. It can be obtained by dividing.
The glass solidified in the container obtained in each of the above examples was cut along with the container along a cut surface along the height direction, and a longitudinal section sample having a thickness of 1 mm was cut out. The β-OH value was measured by the above method for the region of the obtained longitudinal section sample at the center in the height direction of the container and in the vicinity of the interface between the inner wall of the container and the solidified glass. A photograph of the area was taken.
The results of Example 3 are shown in FIG. 11, the results of Comparative Example 2 are shown in FIG. 12, and the results of Comparative Example 3 are shown in FIG. (A) of each figure is a cross-sectional photograph, and the reference position of the interface is indicated by an arrow. In the figure,
[参考例1]
上記した実施例3、比較例2、3の各例の金属膜付き基材からなる容器は、金属溶射膜の下層がセラミック基材からなるが、本例では、下記するように、金属溶射膜の下層がガラスからなる場合の水分含有量を測定した。
すなわち、実施例3において、セラミック部材からなる容器を加熱炉内に入れた後、1400℃に達した時点で、ホウケイ酸ガラスのガラス原料を容器内に投入する際に、投入すべきガラス原料の一部を該セラミック部材からなる容器に直接投入するとともに、別途用意された白金ロジウム製の坩堝内に該ガラス原料の残りを入れ、この坩堝を該容器内に入れた。それ以外は実施例3と同様にして容器内で固化したガラスを得た。図14はその縦断面を示す写真である。本例では、セラミック部材からなる容器31内で、固化したガラス30中に坩堝32が埋め込まれており、坩堝32の内面と外面の両方が、固化したガラスと接している状態が得られる。
[Reference Example 1]
In the container made of the base material with the metal film of each of the examples 3 and comparative examples 2 and 3 described above, the lower layer of the metal sprayed film is made of a ceramic base material. The water content when the lower layer of glass was made of glass was measured.
That is, in Example 3, when a glass material of borosilicate glass is introduced into the container when the temperature reaches 1400 ° C. after the container made of the ceramic member is placed in the heating furnace, A part of the glass raw material was directly put into a container made of the ceramic member, and the remainder of the glass raw material was put in a separately prepared platinum rhodium crucible, and the crucible was put in the container. Other than that obtained the glass solidified in the container like Example 3. FIG. FIG. 14 is a photograph showing the longitudinal section. In this example, the crucible 32 is embedded in the solidified
本例で得られた、容器内で固化したガラスを、高さ方向に沿う切断面で、容器および坩堝ごと切断し、厚さ1mmの縦断面サンプルを切り出した。得られた縦断面サンプルの、坩堝の深さ方向の中央部であって、坩堝の内面および外面とガラスとの界面付近の領域(図14中に、符号33で示す。)について、上記の方法でβ-OH値を測定した。
結果を図15に示す。横軸は図14の断面写真の横方向における距離を示し、縦軸はβ-OH値を示す。図15において、坩堝の側壁に該当する位置を矢印で示す。
なお、β-OH値の測定に用いた縦断面サンプルにおいて、ガラス中の気泡発生は認められなかった。
The glass solidified in the container obtained in this example was cut along the height direction along with the container and the crucible, and a longitudinal cross-sectional sample having a thickness of 1 mm was cut out. About the area | region (it shows with the code |
The results are shown in FIG. The horizontal axis indicates the distance in the horizontal direction of the cross-sectional photograph of FIG. 14, and the vertical axis indicates the β-OH value. In FIG. 15, the position corresponding to the side wall of the crucible is indicated by an arrow.
In the longitudinal section sample used for measuring the β-OH value, no bubbles were observed in the glass.
図12(b)、図13(b)の結果に示されるように、比較例2、3では、ガラス中の水分含有量(β-OH値)が、金属溶射膜に隣接する領域で低下している。また図12(a)、図13(a)に示されるように、金属溶射膜に隣接する領域でガラス中に気泡の発生が認められた。このことから、溶融ガラス中に存在する水分が金属溶射膜の表面で分解されて生じた酸素が、再び水を生成することなく、気泡になったことがわかる。
また、比較例2は、セラミック基材としてガラス相を6質量%含む高ジルコニア質レンガを用いたが、使用前に1500℃の熱処理を行わなかったため、使用時に1400℃で1時間加熱されても、断面写真において金属溶射膜とセラミック基材との界面に微小な隙間が観察された。
比較例3は、セラミック基材がガラス相を0.8質量%しか含有しないため、使用前に1500℃の熱処理を行っても、断面写真において金属溶射膜とセラミック基材との界面に微小な隙間が観察された。
これらのことから、比較例2,3では、溶融ガラス中に存在する水分が金属溶射膜の表面で分解されて生じた水素は、金属溶射膜を透過し、金属溶射膜とセラミック基材との界面の空間を介して移動してしまい、金属溶射膜に留まらなかったと考えられる。
As shown in the results of FIGS. 12B and 13B, in Comparative Examples 2 and 3, the water content (β-OH value) in the glass decreases in the region adjacent to the metal sprayed film. ing. Further, as shown in FIGS. 12A and 13A, generation of bubbles was observed in the glass in a region adjacent to the metal sprayed film. From this, it can be seen that the oxygen generated by the decomposition of the water present in the molten glass on the surface of the metal sprayed film became bubbles without generating water again.
Moreover, although the comparative example 2 used the high zirconia brick containing 6 mass% of glass phases as a ceramic base material, since it did not heat-process at 1500 degreeC before use, even if it heats at 1400 degreeC for 1 hour at the time of use In the cross-sectional photograph, a minute gap was observed at the interface between the metal sprayed film and the ceramic substrate.
In Comparative Example 3, since the ceramic base material contains only 0.8% by mass of the glass phase, even if heat treatment at 1500 ° C. is performed before use, there is a minute amount at the interface between the metal sprayed film and the ceramic base material in the cross-sectional photograph. A gap was observed.
From these facts, in Comparative Examples 2 and 3, the hydrogen generated by the decomposition of the water present in the molten glass on the surface of the metal sprayed film permeates the metal sprayed film, and the metal sprayed film and the ceramic substrate It is thought that it moved through the space of the interface and did not stay on the metal sprayed film.
一方、図15の結果に示されるように、参考例1では、金属溶射膜に隣接する領域でガラス中の水分含有量(β-OH値)が低下せず、また図11の結果に示されるよう実施例3でもほとんど水分含有量(β-OH値)が低下しなかった。また参考例1および実施例3においては、ガラス中の気泡発生も認められなかった。このことから、溶融ガラス中に存在する水分が金属溶射膜の表面で分解されて生じた酸素は、再び水素と結合して水を生成したため、気泡が発生しなかったと考えられる。
また、実施例3の断面写真において金属溶射膜とセラミック基材との界面にはガラス相が存在し、隙間は観察さなかった。上述したように、実施例3において参考例1と同等の気泡抑制効果が得られたことから、金属溶射膜とセラミック基材との界面のガラス相が、溶融ガラス中の気泡抑制に寄与していることがわかる。
On the other hand, as shown in the results of FIG. 15, in Reference Example 1, the water content (β-OH value) in the glass does not decrease in the region adjacent to the metal sprayed film, and is also shown in the results of FIG. As in Example 3, the water content (β-OH value) hardly decreased. In Reference Example 1 and Example 3, the generation of bubbles in the glass was not observed. From this, it is considered that the oxygen generated by the decomposition of the water present in the molten glass on the surface of the metal sprayed film was combined with hydrogen again to generate water, and thus bubbles were not generated.
Further, in the cross-sectional photograph of Example 3, there was a glass phase at the interface between the metal sprayed film and the ceramic substrate, and no gap was observed. As described above, since the bubble suppression effect equivalent to that of Reference Example 1 was obtained in Example 3, the glass phase at the interface between the metal spray coating and the ceramic substrate contributed to bubble suppression in the molten glass. I understand that.
本発明によれば、セラミック基材と金属溶射膜との密着強さに優れたセラミック部材を得ることができ、かかるセラミック部材は、溶融ガラスに対する耐食性に優れ、溶融ガラスの製造装置用のセラミック部材として有用である。
なお、2010年11月25日に出願された日本特許出願2010-262591号の明細書、特許請求の範囲、図面及び要約書の全内容をここに引用し、本発明の開示として取り入れるものである。
ADVANTAGE OF THE INVENTION According to this invention, the ceramic member excellent in the adhesive strength of a ceramic base material and a metal sprayed film can be obtained, This ceramic member is excellent in the corrosion resistance with respect to molten glass, and the ceramic member for the manufacturing apparatus of molten glass Useful as.
The entire contents of the specification, claims, drawings and abstract of Japanese Patent Application No. 2010-262591 filed on Nov. 25, 2010 are incorporated herein as the disclosure of the present invention. .
1、21 セラミック基材
2、22 金属溶射膜
3 アンカー用凹部
11 溶融槽
12 減圧脱泡装置
12a 減圧脱泡槽
12b 上昇管
12c 下降管
13 第1の導管
14 第2の導管
15 冷却槽
30 ガラス
G 溶融ガラス
DESCRIPTION OF
Claims (16)
ガラス相を3~30質量%含む、電鋳レンガまたはジルコンを主成分とする焼結レンガからなるセラミック基材上に、
白金族金属、および白金族金属の1種以上を主成分とする合金からなる群から選ばれる少なくとも1種の金属の溶射膜を形成した後、
1500℃以上の温度で熱処理する工程を有することを特徴とするセラミック部材の製造方法。 A method for producing a ceramic member having a temperature of less than 1500 ° C. during use,
On a ceramic substrate made of sintered brick mainly containing electrocast brick or zircon containing 3 to 30% by mass of glass phase,
After forming a sprayed film of at least one metal selected from the group consisting of platinum group metals and alloys composed mainly of one or more platinum group metals,
A method for producing a ceramic member, comprising a step of heat-treating at a temperature of 1500 ° C. or higher.
前記セラミック基材と前記金属の溶射膜との界面の空間にガラス相が充填されていることを特徴とするセラミック部材。 A ceramic member obtained by the production method according to any one of claims 1 to 3,
A ceramic member, wherein a glass phase is filled in a space at an interface between the ceramic base and the metal sprayed film.
前記金属が、白金族金属、および白金族金属の1種以上を主成分とする合金からなる群から選ばれる少なくとも1種の金属であり、
前記セラミック基材が、ガラス相を3~30質量%含む、電鋳レンガまたはジルコンを主成分とする焼結レンガからなり、
前記セラミック基材と前記金属の溶射膜との界面の空間に、前記ガラス相の一部が充填されていることを特徴とするセラミック部材。 A ceramic member having a ceramic substrate and a metal sprayed coating provided on the surface thereof, the temperature at the time of use being less than 1500 ° C.,
The metal is at least one metal selected from the group consisting of a platinum group metal and an alloy mainly composed of at least one platinum group metal;
The ceramic substrate is composed of electrocast brick or sintered brick mainly composed of zircon, containing 3 to 30% by mass of a glass phase,
A ceramic member, wherein a part of the glass phase is filled in a space at an interface between the ceramic base and the metal sprayed film.
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| JP2012545730A JP5928340B2 (en) | 2010-11-25 | 2011-11-18 | Ceramic member and manufacturing method thereof, molten glass manufacturing apparatus and manufacturing method, glass article manufacturing apparatus and glass article manufacturing method |
| KR1020137011162A KR101768262B1 (en) | 2010-11-25 | 2011-11-18 | Ceramic member and method for producing same, device and method for producing molten glass, and device and method for producing glass article |
| CN201180055948.1A CN103221570B (en) | 2010-11-25 | 2011-11-18 | Ceramic member and manufacturing method thereof, molten glass manufacturing apparatus and manufacturing method, glass article manufacturing apparatus, and glass article manufacturing method |
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| JP (1) | JP5928340B2 (en) |
| KR (1) | KR101768262B1 (en) |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2020067493A1 (en) * | 2018-09-28 | 2020-04-02 | 新和工業株式会社 | Method of treating ceramics and ceramic member |
| JP2021042453A (en) * | 2019-09-13 | 2021-03-18 | 株式会社東芝 | Coating method and coating structure |
| JPWO2022209393A1 (en) * | 2021-03-31 | 2022-10-06 |
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| JP2008121073A (en) * | 2006-11-13 | 2008-05-29 | Asahi Glass Co Ltd | Electroformed brick with metal coating and method for producing the same |
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| US3598635A (en) * | 1969-02-24 | 1971-08-10 | Corning Glass Works | Plasma spraying protective coating on refractory |
| CN1184153C (en) * | 1998-02-26 | 2005-01-12 | 旭硝子株式会社 | Vacuum degassing apparatus for molten glass |
| JP2000203972A (en) * | 1999-01-18 | 2000-07-25 | Tanaka Kikinzoku Kogyo Kk | Surface treatment method for platinum-coated refractory products |
| DE10040591C1 (en) * | 2000-08-15 | 2001-11-08 | Heraeus Gmbh W C | Production of a coating on a refractory component used in glass industry comprises using a precious metal alloy having a specified melting temperature and formed from platinum, iridium, rhodium, rhenium and/or gold |
| US7071135B2 (en) * | 2004-09-29 | 2006-07-04 | Corning Incorporated | Ceramic body based on aluminum titanate and including a glass phase |
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- 2011-11-18 JP JP2012545730A patent/JP5928340B2/en active Active
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- 2011-11-18 WO PCT/JP2011/076730 patent/WO2012070508A1/en not_active Ceased
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| JPH11240725A (en) * | 1998-02-26 | 1999-09-07 | Asahi Glass Co Ltd | Vacuum degassing equipment for molten glass |
| JP2008121073A (en) * | 2006-11-13 | 2008-05-29 | Asahi Glass Co Ltd | Electroformed brick with metal coating and method for producing the same |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2020067493A1 (en) * | 2018-09-28 | 2020-04-02 | 新和工業株式会社 | Method of treating ceramics and ceramic member |
| JP6745424B1 (en) * | 2018-09-28 | 2020-08-26 | 新和工業株式会社 | Ceramic processing method and ceramic member |
| KR20210060485A (en) * | 2018-09-28 | 2021-05-26 | 신와고교 가부시키가이샤 | Ceramic processing method and ceramic member |
| KR102682176B1 (en) | 2018-09-28 | 2024-07-08 | 신와고교 가부시키가이샤 | Ceramic processing methods and ceramic members |
| US12043583B2 (en) | 2018-09-28 | 2024-07-23 | Shinwa Industrial Co., Ltd. | Method of treating ceramics and ceramic member |
| JP2021042453A (en) * | 2019-09-13 | 2021-03-18 | 株式会社東芝 | Coating method and coating structure |
| JP7309544B2 (en) | 2019-09-13 | 2023-07-18 | 株式会社東芝 | Coating method and coating structure |
| JPWO2022209393A1 (en) * | 2021-03-31 | 2022-10-06 | ||
| KR20230165752A (en) | 2021-03-31 | 2023-12-05 | 에이지씨 가부시키가이샤 | Members applied to parts in contact with molten glass and their manufacturing method |
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| KR20130140700A (en) | 2013-12-24 |
| CN103221570B (en) | 2015-05-20 |
| KR101768262B1 (en) | 2017-08-14 |
| CN103221570A (en) | 2013-07-24 |
| TWI547465B (en) | 2016-09-01 |
| JP5928340B2 (en) | 2016-06-01 |
| JPWO2012070508A1 (en) | 2014-05-19 |
| TW201228995A (en) | 2012-07-16 |
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