WO2012053659A1 - Production method for epoxy alcohol compound - Google Patents
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- WO2012053659A1 WO2012053659A1 PCT/JP2011/074601 JP2011074601W WO2012053659A1 WO 2012053659 A1 WO2012053659 A1 WO 2012053659A1 JP 2011074601 W JP2011074601 W JP 2011074601W WO 2012053659 A1 WO2012053659 A1 WO 2012053659A1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D301/00—Preparation of oxiranes
- C07D301/02—Synthesis of the oxirane ring
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D301/00—Preparation of oxiranes
- C07D301/32—Separation; Purification
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/08—Compounds containing oxirane rings with hydrocarbon radicals, substituted by halogen atoms, nitro radicals or nitroso radicals
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/14—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by free hydroxyl radicals
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/06—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
Definitions
- the present invention relates to a method for producing an epoxy alcohol compound.
- Epoxy alcohol compounds such as 3- (2 ′, 4′-difluorophenyl) -3,4-epoxy-2-butanol and (2R, 3S) -2- (2,4-difluorophenyl) -3-methyl-2
- Triazole compounds such as-[(1H-1,2,4-triazol-1-yl) methyl] oxirane are known to be useful as intermediates for production of, for example, antifungal agents (eg, US Pat. No. 5,807,854, EP 698606, WO 2007/062542).
- US 2008/081921 discloses a reaction mixture containing 3- (2 ′, 4′-difluorophenyl) -3,4-epoxy-2-butanol, which is an epoxy alcohol compound, and hydrochloric acid. Is obtained at a temperature of 25 ° C. or lower to obtain 3- (2 ′, 4′-difluorophenyl) -3,4-epoxy-2-butanol ([0059] to [0063]).
- the epoxy alcohol compound may be obtained as an isomer mixture with its structural isomer.
- the present invention relates to formula (3) (In the formula, R represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and Ar represents an aromatic group or a methyl group substituted with an aromatic group.) And an epoxy alcohol compound (compound (3)) represented by the formula (3 ′) and its structural isomer (In the formula, R and Ar are as defined above.) An isomer mixture containing an epoxy alcohol compound represented by the formula (compound (3 ′)) is mixed with an acid at 30 ° C. to 70 ° C., and an epoxy alcohol compound represented by the formula (3) is obtained from the resulting mixture.
- the present invention relates to a method for producing an epoxy alcohol compound represented by (3).
- the alkyl group having 1 to 6 carbon atoms represented by R includes a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a sec-butyl group, a tert-butyl group, a pentyl group, and an isopentyl group.
- a linear or cyclic alkyl group such as neopentyl group, hexyl group and cyclohexyl group, preferably an alkyl group having 1 to 4 carbon atoms such as methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, etc. More preferably, a methyl group is mentioned.
- examples of the aromatic group represented by Ar include an optionally substituted aromatic carbocyclic group having 6 to 12 carbon atoms such as a phenyl group, a 1-naphthyl group, and a 2-naphthyl group.
- an aromatic heterocyclic group having 3 to 12 carbon atoms such as 2-furyl group, 3-furyl group, 2-thienyl group, 3-thienyl group, 2-pyridyl group, 2-quinolyl group and the like.
- substituents include a halogen atom (a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, preferably a fluorine atom), an alkyl group having 1 to 6 carbon atoms, and a trifluoromethyl group.
- aromatic carbocyclic group which may be substituted include phenyl group, 1-naphthyl group, 2-naphthyl group, 2-tolyl group, 3-tolyl group, 4-tolyl group and 2,4-xylyl.
- trifluoromethylphenyl group especially 2- (trifluoromethyl) phenyl group, 3- (trifluoro) Oromechiru) phenyl group, 4- (trifluoromethyl) phenyl group
- 2,4-difluorophenyl group 2,5-difluorophenyl group is more preferable.
- examples of the aromatic group of the methyl group substituted with the aromatic group represented by Ar include the same examples as the aromatic group represented by Ar.
- methyl group substituted with the aromatic group represented by Ar include a benzyl group and a furfuryl group.
- examples of the halogen atom represented by X include a chlorine atom, a bromine atom, and an iodine atom, and among them, an iodine atom is preferable.
- examples of the leaving group represented by Y include halogen atoms such as chlorine atom, bromine atom and iodine atom, methanesulfonyloxy group, trifluoromethanesulfonyloxy group, benzenesulfonyloxy group, and p-toluenesulfonyl.
- Examples thereof include sulfonyloxy groups such as an oxy group and a p-trifluoromethanesulfonyloxy group.
- the leaving group is preferably a sulfonyloxy group, more preferably a methanesulfonyloxy group, a trifluoromethanesulfonyloxy group or a p-toluenesulfonyloxy group.
- a methanesulfonyloxy group is preferable.
- an isomer mixture containing compound (3) and its structural isomer, compound (3 ′) is, for example, an ylide prepared from halogenated trimethyloxosulfonium or halogenated trimethylsulfonium and a base and the formula ( 1) (In the formula, R and Ar are as defined above.) It can manufacture by making keto alcohol compound (compound (1)) shown by these react.
- Compound (1) can be obtained by a known method such as the method described in US2003 / 236419.
- an alkyl lactate is reacted with a dialkylamine to obtain a lactate dialkylamide, which is reacted with ethyl vinyl ether to protect the hydroxyl group with a 1-ethoxyethyl group, and then 2,4- It can be obtained by reacting an aromatic grinder reagent such as difluorophenyl magnesium halide.
- Compound (1) may be an optically active form or a racemic form.
- the optically active substance may be of any optical purity. Specific examples of the compound (1) include 2 ′, 4′-difluoro-2-hydroxypropiophenone, 2 ′, 5′-difluoro-2-hydroxypropiophenone, 2 ′, 4 ′, 6′-tri.
- Fluoro-2-hydroxypropiophenone, 2 '-(trifluoromethyl) -2-hydroxypropiophenone, 3'-(trifluoromethyl) -2-hydroxypropiophenone and 4 '-(trifluoromethyl)- 2-hydroxypropiophenone is mentioned.
- the halogenated trimethyloxosulfonium include trimethyloxosulfonium chloride, trimethyloxosulfonium bromide and trimethyloxosulfonium iodide, and among them trimethyloxosulfonium iodide is preferable.
- Examples of the halogenated trimethylsulfonium include trimethylsulfonium chloride, trimethylsulfonium bromide, and trimethylsulfonium iodide. Among them, trimethylsulfonium iodide is preferable.
- Examples of the base used for the preparation of ylide include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide and potassium hydroxide, alkaline earth metal hydroxides such as calcium hydroxide, sodium carbonate and potassium carbonate.
- metal hydrides such as sodium hydride and lithium hydride
- metal alkoxides such as sodium methoxide, sodium ethoxide, sodium butoxide, potassium butoxide, etc.
- sodium hydroxide, sodium hydride, and lithium hydride are mentioned, More preferably, sodium hydride is mentioned.
- the reaction of halogenated trimethyloxosulfonium or ylide prepared from halogenated trimethylsulfonium and a base with compound (1) is preferably carried out in a solvent.
- ether solvents such as tetrahydrofuran, methyl tert-butyl ether, 1,4-dioxane, diethylene glycol dimethyl ether (diglyme), ethylene glycol dimethyl ether, 1,3-dioxolane, 2-methyltetrahydrofuran, and N, N-dimethyl.
- Amide solvents such as formamide, N, N-dimethylacetamide and N-methyl-2-pyrrolidinone, nitrile solvents such as acetonitrile and propionitrile, dimethyl sulfoxide, sulfolane, 1,3-dimethyl-2-imidazolidinone and hexamethyl And phosphoric acid amides, preferably tetrahydrofuran, N, N-dimethylformamide and dimethyl sulfoxide, more preferably dimethyl sulfoxide and Hydrofuran and the like.
- the ylide is prepared, for example, by a method in which halogenated trimethyloxosulfonium or halogenated trimethylsulfonium is mixed with a solvent, and then a base is added dropwise or dividedly to the mixture.
- the preparation temperature of ylide varies depending on the solvent and base used, but is preferably 0 ° C. to 30 ° C., more preferably 8 ° C. to 15 ° C.
- the preparation time of ylide varies depending on the solvent, base and the like used, but is preferably 1 to 24 hours.
- the reaction between ylide and compound (1) is, for example, a method of adding compound (1) to ylide prepared by the above-mentioned method, or adding ylide to compound (1) or a mixture of compound (1) and a solvent. It can be done by a method.
- the temperature at which compound (1) or ylide is added is preferably ⁇ 10 ° C. to 10 ° C., more preferably 0 ° C. to 5 ° C. in terms of the stability of compound (1) and compound (3) obtained by the reaction.
- the time required for the addition is preferably 3 to 15 hours, more preferably 4 to 10 hours.
- the reaction temperature between the ylide and the compound (1) is preferably ⁇ 10 ° C. to 10 ° C., more preferably 0 ° C.
- the reaction time is preferably 1 to 8 hours, more preferably 1 to 5 hours.
- Specific examples of the compound (3) include 3- (2 ′, 4′-difluorophenyl) -3,4-epoxy-2-butanol, 3- (2 ′, 5′-difluorophenyl) -3,4- Epoxy-2-butanol, 3- (2 ′, 4 ′, 6′-difluorophenyl) -3,4-epoxy-2-butanol, 3- (2 ′-(trifluoromethyl) phenyl) -3,4- Epoxy-2-butanol, 3- (3 ′-(trifluoromethyl) phenyl) -3,4-epoxy-2-butanol and 3- (4 ′-(trifluoromethyl) phenyl) -3,4-epoxy 2-butanol is mentioned.
- an isomer mixture containing compound (3) and compound (3 ′) is mixed with an acid at a temperature selected from the range of 30 ° C. to 70 ° C.
- structural isomers contained in the isomer mixture can be selectively decomposed.
- the acid used include mineral acids such as hydrochloric acid and sulfuric acid, and carboxylic acids such as acetic acid, oxalic acid, tartaric acid, succinic acid, citric acid, and phthalic acid, preferably hydrochloric acid, succinic acid, citric acid, and the like.
- a phthalic acid is mentioned, More preferably, a citric acid and a phthalic acid are mentioned.
- An acid may be used independently and may mix and use 2 or more types of acids.
- the amount of the acid to be used varies depending on the ratio of the compound (3) and the compound (3 ′) contained in the isomer mixture, but for example 0.1 to 2 mol, preferably 0 2 to 0.7 mol, more preferably 0.3 to 0.5 mol.
- the acid is preferably used as an aqueous solution.
- the amount of water used is, for example, 0.5 to 15 mL, preferably 1 to 10 mL, more preferably 1 to 8 mL with respect to 1 g of compound (3) contained in the isomer mixture.
- This process is, for example, (A) A method of adjusting an isomer mixture containing the compound (3) and the compound (3 ′) to 30 ° C. to 70 ° C., and adding an acid or an aqueous solution thereof, (B) A method of adjusting an acid or an aqueous solution thereof to 30 ° C. to 70 ° C., and adding an isomer mixture containing the compound (3) and the compound (3 ′) thereto, (C) a method of adding an acid or an aqueous solution thereof to an isomer mixture containing the compound (3) and the compound (3 ′), and adjusting the resulting mixture to 30 ° C.
- organic solvents include methylene chloride, 1,2-dichloroethane, monochlorobenzene, 1,2-dichlorobenzene, 2-chlorotoluene, 3-chlorotoluene, 4-chlorotoluene, 2-chloro-m-xylene.
- Hydrocarbon solvents are preferred, aromatic hydrocarbon solvents are more preferred, and toluene is particularly preferred.
- the amount of the organic solvent to be used is, for example, 0.5 to 10 mL, preferably 1 to 8 mL, more preferably 1 to 5 mL with respect to 1 g of compound (3) contained in the isomer mixture.
- the mixing temperature in this step is 30 ° C. to 70 ° C., preferably 40 ° C. to 50 ° C. By setting the temperature at 30 ° C. to 70 ° C., the decomposition of the compound (3) can be suppressed and the compound (3 ′) can be selectively decomposed.
- the reaction time varies depending on the type and amount of the acid used, the reaction temperature, etc., but is, for example, 0.5 to 24 hours, preferably 1 to 15 hours, and more preferably 3 to 10 hours.
- Compound (3 ′) is mixed with an acid in the above-described step to give a compound of formula (4) (In the formula, R and Ar are as defined above. X represents a halogen atom.)
- the present invention comprises the step of obtaining the compound (3) from the mixture obtained in the above-described steps, the compound (3) and the compound (3 ′) obtained from the reaction of the ylide and the compound (1).
- the mixture obtained in the above step contains compound (3) and compound (4).
- distillation can be performed under normal pressure conditions or under reduced pressure conditions, and is preferably performed under reduced pressure conditions from the viewpoint of the stability of the compound (3).
- the temperature in the distillation varies depending on the compound (3) and the like, but is 20 to 200 ° C., preferably 60 to 160 ° C., for example, from the viewpoint of recovering the high purity compound (3) and the stability of the compound (3). More preferably, it is 80 to 140 ° C.
- the time required for distillation varies depending on the type, amount and temperature of the compound (3), but is, for example, 0.5 to 24 hours, preferably 1 to 15 hours, and more preferably 3 to 10 hours.
- the compound (3) thus obtained can be obtained, for example, by the method shown below according to the formula (5) (In the formula, R and Ar are as defined above.) It can convert into the triazole compound (compound (5)) shown by these.
- Examples of the leaving group represented by Y include a halogen atom, a methanesulfonyloxy group, a trifluoromethanesulfonyloxy group, a p-toluenesulfonyloxy group, and a benzenesulfonyloxy group.
- the method described in (a) will be described in more detail.
- the leaving group represented by Y is a sulfonyloxy group, for example, by reacting compound (3) with a sulfonylating agent in the presence of an amine such as triethylamine, the compound ( 3) can be converted to compound (6).
- the sulfonylating agent examples include methanesulfonyl chloride, p-toluenesulfonyl chloride, and trifluoromethanesulfonic anhydride, and preferably include methanesulfonyl chloride and trifluoromethanesulfonic anhydride.
- the amount of the sulfonylating agent to be used is preferably 0.8 to 1.8 mol, more preferably 0.9 to 1.2 mol, per 1 mol of compound (3).
- Such a reaction is preferably carried out in the presence of a hydrocarbon solvent such as toluene.
- Conversion of compound (3) to compound (6) can be performed, for example, by a method of mixing compound (3) and amine in a hydrocarbon solvent and adding a sulfonylating agent to the resulting mixture.
- the addition temperature and reaction temperature of the sulfonylating agent are preferably ⁇ 20 ° C. to 40 ° C., more preferably 0 ° C. to 20 ° C.
- the time required for the addition and reaction of the sulfonylating agent varies depending on the addition temperature and reaction temperature, but is preferably 0.5 to 5 hours, more preferably 1 to 3 hours.
- the reaction between compound (6) and 1,2,4-triazole is preferably carried out in the presence of a base.
- Examples of the base include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; alkaline earth metal hydroxides such as calcium hydroxide; alkali metal carbonates such as sodium carbonate and potassium carbonate; Examples include alkaline earth metal carbonates such as calcium carbonate; metal hydroxides such as sodium hydride and lithium hydride; metal alkoxides such as sodium methoxide, sodium ethoxide, sodium butoxide, and potassium butoxide.
- sodium hydroxide, sodium methoxide, sodium hydride, and lithium hydride are mentioned, More preferably, sodium hydroxide, sodium methoxide, and sodium hydride are mentioned.
- the reaction between compound (6) and 1,2,4-triazole is preferably carried out in a solvent.
- the solvent include ether solvents such as tetrahydrofuran, methyl tert-butyl ether, 1,4-dioxane, diethylene glycol dimethyl ether (diglyme), ethylene glycol dimethyl ether, 1,3-dioxolane, and 2-methyltetrahydrofuran; carbonization such as toluene and xylene.
- Hydrogen-based solvents N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidinone, dimethyl sulfoxide, sulfolane, 1,3-dimethyl-2-imidazolidinone, hexamethylphosphoric acid amide, etc.
- Aprotic polar solvents nitrile solvents such as acetonitrile and propionitrile
- alcohol solvents such as methanol.
- toluene, N, N-dimethylformamide, dimethyl sulfoxide and methanol are mentioned, More preferably, toluene, N, N-dimethylformamide and dimethyl sulfoxide are mentioned.
- the temperature at which compound (6) reacts with 1,2,4-triazole varies depending on the type and boiling point of the solvent used in the reaction, the type and amount of base used, etc., but is, for example, 20 to 100 ° C., preferably 30 C. to 70.degree. C., more preferably 40 to 50.degree.
- the reaction time varies depending on the reaction temperature and the like, but is, for example, 0.5 to 24 hours, preferably 1 to 15 hours, and more preferably 3 to 10 hours.
- the reaction mixture obtained by the method described in (a) above is mixed with water and / or hydrochloric acid and subjected to extraction treatment, washing treatment, drying treatment, concentration treatment, crystallization treatment, solid-liquid separation treatment, etc.
- the compound (5) can be isolated by By adopting the crystallization treatment and the solid-liquid separation treatment, an excellent quality compound (5) can be obtained.
- the crystallization treatment is performed, for example, by adjusting the temperature of the concentrated mixture obtained by the concentration treatment to a predetermined temperature, adding seed crystals to the concentrated mixture, and stirring the resulting mixture.
- a hydrocarbon solvent such as heptane may be added before and / or after the addition of the seed crystal.
- the solid-liquid separation process is performed, for example, by a method of filtering the solid-liquid mixture obtained by the crystallization process.
- the solid obtained by filtration may be subjected to washing treatment and drying treatment.
- Compound (5) may be any optically active substance or a mixture of two or more thereof (for example, a racemate, an enantiomeric mixture, or a diastereomeric mixture). Specific examples of the compound (5) include (2R, 3S) -2- (2,4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl.
- Compound (5) can be derived into a compound useful as an antifungal agent, for example, according to the method described in US Pat. No. 5,807,854, EP698606, WO2007 / 062542, and the like.
- Example 1 Preparation of isomer mixture containing compound (3) and compound (3 ') Dimethyl sulfoxide (615 mL), tetrahydrofuran (259 mL), trimethyloxosulfonium iodide (158.4 g) were mixed, and the resulting mixture was heated to about 11 ° C. Cooled and temperature controlled. Thereto was added dropwise a mixture of 22.9 g of sodium hydride (about 60% mineral oil dispersion) and 46.0 g of liquid paraffin, and the mixture was kept warm and stirred until hydrogen bubbling ceased to prepare an ylide.
- Dimethyl sulfoxide (615 mL), tetrahydrofuran (259 mL), trimethyloxosulfonium iodide (158.4 g) were mixed, and the resulting mixture was heated to about 11 ° C. Cooled and temperature controlled. Thereto was added dropwise a mixture of 22.9 g of sodium hydride (about 60% mineral oil dis
- reaction mixture was added dropwise to a solution prepared by mixing 47.4 g of citric acid monohydrate, 875 mL of water and 410 mL of toluene, and the mixture was stirred at 40-45 ° C. for about 8 hours to give compound (3 ′ 1- (2,4-difluorophenyl) -1- (2-methyl-2-oxiranyl) methanol is decomposed to 1- (2,4-difluorophenyl) -1- (2-methyl-2- Oxiranyl) methanol was converted to 3- (2,4-difluorophenyl) -2-methyl-2-iodomethyloxirane, which is compound (4).
- the mixture obtained above was cooled to around room temperature, and extracted with 410 mL and 205 mL of toluene, respectively.
- the toluene layers obtained by extraction were combined, and the combined toluene layers were washed with weak alkaline water prepared by dissolving 2.3 g of sodium bicarbonate in 410 mL of water, and then washed twice with 410 mL of ion-exchanged water.
- the washed toluene layer was concentrated under reduced pressure, and the resulting residue was distilled under reduced pressure to obtain (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2, which is compound (3).
- Example 4 Production of Compound (5) Using (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol obtained in Example 3, (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol was carried out in the same manner as in Example 2 except that the scale was changed to 17 g scale, and (2R, 3S) -2- (2 , 4-Difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane was obtained (yield: 39.4%).
- Example 6 Production of Compound (5) Using (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol obtained in Example 5, (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol was carried out in the same manner as in Example 2 except that the scale was changed to 17 g scale, and (2R, 3S) -2- (2 , 4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane (8.8 g) was obtained (yield: 41.4%).
- Example 8 Production of Compound (5) Using (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol obtained in Example 7, (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol was carried out in the same manner as in Example 2 except that the scale was changed to 17 g scale, and (2R, 3S) -2- (2 , 4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane was obtained (yield: 44.3%).
- Example 10 Production of Compound (6) 20.0 g of (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy-2-butanol obtained in Example 9 (0.
- Example 11 Production of compound (3) 47.4 g of citric acid monohydrate and 875 mL of water were replaced with 11.7 g of 35% hydrochloric acid and 436 mL of water, and (R) -1- (2,5-difluorophenyl ) -2-Hydroxy-1-propanone Performed in the same manner as in Example 9 except that the scale was changed to 46.6 g, and (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy- 21.1 g of 2-butanol was obtained (yield: 62.1%). Its purity (HPLC area percentage) was 79.5%.
- Example 12 Production of Compound (5) Using (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy-2-butanol obtained in Example 11, (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy-2-butanol was carried out in the same manner as in Example 10 except that the scale was changed to 20 g, and (2R, 3S) -2- (2 , 5-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane was obtained (yield: 43.4%).
- Example 13 Production of compound (3) 47.4 g of citric acid monohydrate and 875 mL of water were replaced with 11.25 g of phthalic acid and 263 mL of water, and (R) -1- (2,5-difluorophenyl) (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy-2-equivalent to Example 9 except that 2-hydroxy-1-propanone was changed to 30 g scale. 19.7 g of butanol was obtained (yield: 63.2%). Its purity (HPLC area percentage) was 76.5%.
- sodium hydride about 60% mineral oil dispersion
- Example 15 Isolation of compound (4)
- compound (3) (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-
- 2-butanol was obtained by distillation, the distillation residue was purified by silica gel column chromatography and then crystallized to give 3- (2,4-difluorophenyl) -2-methyl- which is compound (4).
- 2-Iodomethyloxirane was isolated.
- the isolated 3- (2,4-difluorophenyl) -2-methyl-2-iodomethyloxirane was used as an analytical standard in Example 1 and the like described above.
- epoxy alcohol compounds such as 3- (2 ', 4'-difluorophenyl) -3,4-epoxy-2-butanol are useful as intermediates for producing antifungal agents, for example.
- the present invention is useful as a method for producing an epoxy alcohol compound.
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Abstract
Description
本発明は、エポキシアルコール化合物の製造方法に関する。 The present invention relates to a method for producing an epoxy alcohol compound.
3−(2’,4’−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール等のエポキシアルコール化合物及び(2R,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン等のトリアゾール化合物は、例えば抗真菌剤等の製造中間体として有用であることが知られている(例えば、US5807854、EP698606、WO2007/062542参照)。
エポキシアルコール化合物の取得方法として、例えば、US2008/081921には、エポキシアルコール化合物である3−(2’,4’−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールを含む反応混合物と塩酸とを25℃以下で混合し、3−(2’,4’−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールを得る方法が記載されている([0059]~[0063])。
しかしながら、上記方法では、エポキシアルコール化合物は、その構造異性体との異性体混合物として得られる場合がある。より高純度のトリアゾール化合物を製造するためには、該構造異性体を容易に除去できるエポキシアルコール化合物の新たな取得方法を開発することが望ましい。
Epoxy alcohol compounds such as 3- (2 ′, 4′-difluorophenyl) -3,4-epoxy-2-butanol and (2R, 3S) -2- (2,4-difluorophenyl) -3-methyl-2 Triazole compounds such as-[(1H-1,2,4-triazol-1-yl) methyl] oxirane are known to be useful as intermediates for production of, for example, antifungal agents (eg, US Pat. No. 5,807,854, EP 698606, WO 2007/062542).
As a method for obtaining an epoxy alcohol compound, for example, US 2008/081921 discloses a reaction mixture containing 3- (2 ′, 4′-difluorophenyl) -3,4-epoxy-2-butanol, which is an epoxy alcohol compound, and hydrochloric acid. Is obtained at a temperature of 25 ° C. or lower to obtain 3- (2 ′, 4′-difluorophenyl) -3,4-epoxy-2-butanol ([0059] to [0063]).
However, in the above method, the epoxy alcohol compound may be obtained as an isomer mixture with its structural isomer. In order to produce a higher-purity triazole compound, it is desirable to develop a new method for obtaining an epoxy alcohol compound that can easily remove the structural isomer.
本発明は、式(3)
(式中、Rは水素原子又は炭素数1~6のアルキル基を表し、Arは芳香族基又は芳香族基で置換されたメチル基を表す。)
で示されるエポキシアルコール化合物(化合物(3))及びその構造異性体である式(3’)
(式中、R及びArは前記と同義である。)
で示されるエポキシアルコール化合物(化合物(3’))を含む異性体混合物を30℃~70℃で酸と混合し、得られた混合物から式(3)で示されるエポキシアルコール化合物を取得する、式(3)で示されるエポキシアルコール化合物の製造方法に関する。
The present invention relates to formula (3)
(In the formula, R represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and Ar represents an aromatic group or a methyl group substituted with an aromatic group.)
And an epoxy alcohol compound (compound (3)) represented by the formula (3 ′) and its structural isomer
(In the formula, R and Ar are as defined above.)
An isomer mixture containing an epoxy alcohol compound represented by the formula (compound (3 ′)) is mixed with an acid at 30 ° C. to 70 ° C., and an epoxy alcohol compound represented by the formula (3) is obtained from the resulting mixture. The present invention relates to a method for producing an epoxy alcohol compound represented by (3).
以下、本発明を詳細に説明する。
本発明において、Rで表される炭素数1~6のアルキル基としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、イソペンチル基、ネオペンチル基、ヘキシル基及びシクロヘキシル基等の鎖状又は環状のアルキル基が挙げられ、好ましくはメチル基、エチル基、プロピル基、イソプロピル基、tert−ブチル基等の炭素数1~4のアルキル基が挙げられ、より好ましくはメチル基が挙げられる。
本発明において、Arで表される芳香族基としては、例えば、置換されていてもよいフェニル基、1−ナフチル基、2−ナフチル基等の炭素数6~12の芳香族炭素環基、置換されていてもよい2−フリル基、3−フリル基、2−チエニル基、3−チエニル基、2−ピリジル基、2−キノリル基等の炭素数3~12の芳香族複素環基が挙げられる。
ここで、置換基としては、例えば、ハロゲン原子(フッ素原子、塩素原子、臭素原子及びヨウ素原子、好ましくはフッ素原子)、炭素数1~6のアルキル基及びトリフルオロメチル基が挙げられる。
置換されていてもよい芳香族炭素環基の具体例としては、フェニル基、1−ナフチル基、2−ナフチル基、2−トリル基、3−トリル基、4−トリル基、2,4−キシリル基、2−フルオロフェニル基、3−フルオロフェニル基、4−フルオロフェニル基、2−クロロフェニル基、3−クロロフェニル基、4−クロロフェニル基、2−ブロモフェニル基、3−ブロモフェニル基、4−ブロモフェニル基、2−ヨードフェニル基、3−ヨードフェニル基、4−ヨードフェニル基、2,3−ジフルオロフェニル基、2,4−ジフルオロフェニル基、2,5−ジフルオロフェニル基、3,4−ジフルオロフェニル基、3,5−ジフルオロフェニル基、2,6−ジフルオロフェニル基、2,3−ジクロロフェニル基、2,4−ジクロロフェニル基、2,5−ジクロロフェニル基、3,4−ジクロロフェニル基、3,5−ジクロロフェニル基、2,6−ジクロロフェニル基、2,3−ジブロモフェニル基、2,4−ジブロモフェニル基、2,5−ジブロモフェニル基、3,4−ジブロモフェニル基、3,5−ジブロモフェニル基、2,6−ジブロモフェニル基、2,4,6−トリフルオロフェニル基、2−(トリフルオロメチル)フェニル基、3−(トリフルオロメチル)フェニル基、4−(トリフルオロメチル)フェニル基、1−クロロナフチル基(1−クロロ−2−ナフチル基、1−クロロ−3−ナフチル基、1−クロロ−4−ナフチル基、1−クロロ−5−ナフチル基、1−クロロ−6−ナフチル基、1−クロロ−7−ナフチル基、1−クロロ−8−ナフチル基)、2−クロロナフチル基(2−クロロ−1−ナフチル基、2−クロロ−3−ナフチル基、2−クロロ−4−ナフチル基、2−クロロ−5−ナフチル基、2−クロロ−6−ナフチル基、2−クロロ−7−ナフチル基、2−クロロ−8−ナフチル基)、1−ブロモナフチル基(1−ブロモ−2−ナフチル基、1−ブロモ−3−ナフチル基、1−ブロモ−4−ナフチル基、1−ブロモ−5−ナフチル基、1−ブロモ−6−ナフチル基、1−ブロモ−7−ナフチル基、1−ブロモ−8−ナフチル基)、2−ブロモナフチル基(2−ブロモ−1−ナフチル基、2−ブロモ−3−ナフチル基、2−ブロモ−4−ナフチル基、2−ブロモ−5−ナフチル基、2−ブロモ−6−ナフチル基、2−ブロモ−7−ナフチル基、2−ブロモ−8−ナフチル基)、1−フルオロナフチル基(1−フルオロ−2−ナフチル基、1−フルオロ−3−ナフチル基、1−フルオロ−4−ナフチル基、1−フルオロ−5−ナフチル基、1−フルオロ−6−ナフチル基、1−フルオロ−7−ナフチル基、1−フルオロ−8−ナフチル基)、2−フルオロナフチル基(2−フルオロ−1−ナフチル基、2−フルオロ−3−ナフチル基、2−フルオロ−4−ナフチル基、2−フルオロ−5−ナフチル基、2−フルオロ−6−ナフチル基、2−フルオロ−7−ナフチル基、2−フルオロ−8−ナフチル基)、1−トリフルオロメチルナフチル基(1−トリフルオロメチル−2−ナフチル基、1−トリフルオロメチル−3−ナフチル基、1−トリフルオロメチル−4−ナフチル基、1−トリフルオロメチル−5−ナフチル基、1−トリフルオロメチル−6−ナフチル基、1−トリフルオロメチル−7−ナフチル基、1−トリフルオロメチル−8−ナフチル基)、2−トリフルオロメチルナフチル基(2−トリフルオロメチル−1−ナフチル基、2−トリフルオロメチル−3−ナフチル基、2−トリフルオロメチル−4−ナフチル基、2−トリフルオロメチル−5−ナフチル基、2−トリフルオロメチル−6−ナフチル基、2−トリフルオロメチル−7−ナフチル基、2−トリフルオロメチル−8−ナフチル基)が挙げられ、ジフルオロフェニル基(特に、2,4−ジフルオロフェニル基、2,5−ジフルオロフェニル基)、トリフルオロフェニル基(特に、2,4,6−トリフルオロフェニル基)、トリフルオロメチルフェニル基(特に、2−(トリフルオロメチル)フェニル基、3−(トリフルオロメチル)フェニル基、4−(トリフルオロメチル)フェニル基)が好ましく、2,4−ジフルオロフェニル基、2,5−ジフルオロフェニル基がより好ましい。
置換されていてもよい芳香族複素環基の具体例としては、4−フルオロピリジル基(4−フルオロ−2−ピリジル基、4−フルオロ−3−ピリジル基)、3−トリフルオロメチルピリジル基(3−トリフルオロメチル−2−ピリジル基、3−トリフルオロメチル−4−ピリジル基、3−トリフルオロメチル−5−ピリジル基、3−トリフルオロメチル−6−ピリジル基)が挙げられる。
本発明において、Arで表される芳香族基で置換されたメチル基の芳香族基としては、Arで表される芳香族基と同じ例が挙げられる。Arで表される芳香族基で置換されたメチル基の具体例としては、ベンジル基、フルフリル基が挙げられる。
本発明において、Xで表されるハロゲン原子としては、例えば、塩素原子、臭素原子及びヨウ素原子が挙げられ、中でもヨウ素原子が好ましい。
本発明において、Yで表される脱離基としては、例えば、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、メタンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基、ベンゼンスルホニルオキシ基、p−トルエンスルホニルオキシ基、p−トリフルオロメタンスルホニルオキシ基等のスルホニルオキシ基が挙げられる。脱離基は、スルホニルオキシ基が好ましく、メタンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基及びp−トルエンスルホニルオキシ基がより好ましい。特に、メタンスルホニルオキシ基が好ましい。
本発明において、化合物(3)及びその構造異性体である化合物(3’)を含む異性体混合物は、例えば、ハロゲン化トリメチルオキソスルホニウム又はハロゲン化トリメチルスルホニウムと塩基とから調製されるイリド及び式(1)
(式中、R及びArは前記と同義である。)
で示されるケトアルコール化合物(化合物(1))を反応させて製造することができる。
化合物(1)は、例えばUS2003/236419に記載される方法等の公知の方法により得ることができる。具体的には例えば、乳酸アルキルをジアルキルアミンと反応させることにより、乳酸ジアルキルアミドを得、これをエチルビニルエーテルと反応させることにより、ヒドロキシル基を1−エトキシエチル基で保護し、次いで2,4−ジフルオロフェニルマグネシウムハライド等の芳香族グリニア試薬を反応させることにより、得ることができる。
化合物(1)は、光学活性体であってもよいし、ラセミ体であってもよい。光学活性体は、任意の光学純度のものでよい。
化合物(1)の具体例としては、2’,4’−ジフルオロ−2−ヒドロキシプロピオフェノン、2’,5’−ジフルオロ−2−ヒドロキシプロピオフェノン、2’,4’,6’−トリフルオロ−2−ヒドロキシプロピオフェノン、2’−(トリフルオロメチル)−2−ヒドロキシプロピオフェノン、3’−(トリフルオロメチル)−2−ヒドロキシプロピオフェノン及び4’−(トリフルオロメチル)−2−ヒドロキシプロピオフェノンが挙げられる。
ハロゲン化トリメチルオキソスルホニウムとしては、例えば、塩化トリメチルオキソスルホニウム、臭化トリメチルオキソスルホニウム及びヨウ化トリメチルオキソスルホニウムが挙げられ、中でもヨウ化トリメチルオキソスルホニウムが好ましい。ハロゲン化トリメチルスルホニウムとしては、塩化トリメチルスルホニウム、臭化トリメチルスルホニウム及びヨウ化トリメチルスルホニウムが挙げられ、中でもヨウ化トリメチルスルホニウムが好ましい。
イリドの調製に用いる塩基としては、例えば、水酸化リチウム、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物、水酸化カルシウム等のアルカリ土類金属水酸化物、炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸化物、炭酸カルシウム等のアルカリ土類金属炭酸化物、水素化ナトリウム、水素化リチウム等の金属水素化物、ナトリウムメトキシド、ナトリウムエトキシド、ナトリウムブトキシド、カリウムブトキシド等の金属アルコキシドが挙げられ、好ましくは水酸化ナトリウム、水素化ナトリウム及び水素化リチウムが挙げられ、より好ましくは水素化ナトリウムが挙げられる。
ハロゲン化トリメチルオキソスルホニウム又はハロゲン化トリメチルスルホニウムと塩基とから調製されるイリドと、化合物(1)との反応は、好ましくは溶媒中で行われる。かかる溶媒としては、例えば、テトラヒドロフラン、メチルtert−ブチルエーテル、1,4−ジオキサン、ジエチレングリコールジメチルエーテル(diglyme)、エチレングリコールジメチルエーテル、1,3−ジオキソラン、2−メチルテトラヒドロフラン等のエーテル溶媒、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチル−2−ピロリジノン等のアミド溶媒、アセトニトリル、プロピオニトリル等のニトリル溶媒、ジメチルスルホキシド、スルホラン、1,3−ジメチル−2−イミダゾリジノン及びヘキサメチルリン酸アミドが挙げられ、好ましくは、テトラヒドロフラン、N,N−ジメチルホルムアミド及びジメチルスルホキシドが挙げられ、より好ましくは、ジメチルスルホキシド及びテトラヒドロフランが挙げられる。
イリドの調製は、例えば、ハロゲン化トリメチルオキソスルホニウム又はハロゲン化トリメチルスルホニウムと溶媒とを混合した後、混合物に塩基を滴下又は分割添加する方法によって行われる。イリドの調製温度は、使用する溶媒、塩基等により異なるが、好ましくは0℃~30℃、より好ましくは8℃~15℃である。イリドの調製時間は、使用する溶媒、塩基等により異なるが、好ましくは1~24時間である。
イリドと化合物(1)との反応は、例えば、上述の方法により調製したイリドに、化合物(1)を添加する方法、化合物(1)又は化合物(1)と溶媒との混合物にイリドを添加する方法により行うことができる。化合物(1)又はイリドを添加する温度は、化合物(1)及び該反応で得られる化合物(3)の安定性の点で、好ましくは−10℃~10℃、より好ましくは0℃~5℃、添加に要する時間は、好ましくは3~15時間、より好ましくは4~10時間である。イリドと化合物(1)との反応温度は、化合物(1)及び該反応で得られる化合物(3)の安定性の点で、好ましくは−10℃~10℃、より好ましくは0℃~5℃、反応時間は、好ましくは1~8時間、より好ましくは1~5時間である。
化合物(3)の具体例としては、3−(2’,4’−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール、3−(2’,5’−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール、3−(2’,4’,6’−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール、3−(2’−(トリフルオロメチル)フェニル)−3,4−エポキシ−2−ブタノール、3−(3’−(トリフルオロメチル)フェニル)−3,4−エポキシ−2−ブタノール及び3−(4’−(トリフルオロメチル)フェニル)−3,4−エポキシ−2−ブタノールが挙げられる。
本発明においては、化合物(3)及び化合物(3’)を含む異性体混合物を、30℃~70℃の範囲から選択される温度で酸と混合する。この工程により、異性体混合物に含まれる構造異性体を、選択的に分解することができる。
用いられる酸としては、例えば、塩酸、硫酸等の鉱酸、酢酸、シュウ酸、酒石酸、コハク酸、クエン酸、フタル酸等のカルボン酸が挙げられ、好ましくは、塩酸、コハク酸、クエン酸及びフタル酸が挙げられ、より好ましくは、クエン酸及びフタル酸が挙げられる。酸は単独で用いてもよいし、二種以上の酸を混合して用いてもよい。酸の使用量は、異性体混合物に含まれる化合物(3)と化合物(3’)との比率により異なるが、化合物(3)1モルに対して、例えば0.1~2モル、好ましくは0.2~0.7モル、より好ましくは0.3~0.5モルである。酸は、好ましくは水溶液として用いられる。酸を水溶液として用いる場合、水の使用量は、異性体混合物に含まれる化合物(3)1gに対して、例えば0.5~15mL、好ましくは1~10mL、より好ましくは1~8mLである。
この工程は、例えば、
(A)化合物(3)及び化合物(3’)を含む異性体混合物を30℃~70℃に調整し、そこへ酸またはその水溶液を添加する方法、
(B)酸またはその水溶液を30℃~70℃度に調整し、そこへ化合物(3)及び化合物(3’)を含む異性体混合物を添加する方法、
(C)化合物(3)及び化合物(3’)を含む異性体混合物に、酸またはその水溶液を添加し、得られる混合物を30℃~70℃度に調整する方法、並びに
(D)酸またはその水溶液に、化合物(3)及び化合物(3’)を含む異性体混合物を添加し、得られる混合物を30℃~70℃に調整する方法のいずれかの方法により行なわれる。好ましくは、(B)及び(D)記載の方法が挙げられる。これら方法は、好ましくは、さらに有機溶媒の存在下に行なわれる。
この工程で用いる有機溶媒は、化合物(3)に対して反応性を有しないものであればよく、好ましくは、水に非混和性の有機溶媒が挙げられる。かかる有機溶媒の具体例としては、塩化メチレン、1,2−ジクロロエタン、モノクロロベンゼン、1,2−ジクロロベンゼン、2−クロロトルエン、3−クロロトルエン、4−クロロトルエン、2−クロロ−m−キシレン、2−クロロ−p−キシレン、4−クロロ−o−キシレン、2,3−ジクロロトルエン、2,4−ジクロロトルエン、2,5−ジクロロトルエン、2,6−ジクロロトルエン、3,4−ジクロロトルエン、モノフルオロベンゼン等のハロゲン化炭化水素溶媒;ニトロベンゼン;二硫化炭素;トルエン等の芳香族または脂肪族の炭化水素溶媒;アセトニトリル、プロピオニトリル等のニトリル溶媒;メチルtert−ブチルエーテル、エチレングリコールジメチルエーテル、ジエチレングリコールジメチルエーテル、2−メチルテトラヒドロフラン、1,3−ジオキソラン、1,4−ジオキサン等のエーテル溶媒が挙げられ、二種以上の有機溶媒が任意の割合で混合されたものでもよい。炭化水素溶媒が好ましく、芳香族炭化水素溶媒がより好ましく、トルエンが特に好ましい。
有機溶媒の使用量は、異性体混合物に含まれる化合物(3)1gに対して、例えば0.5~10mL、好ましくは1~8mL、より好ましくは1~5mLである。
この工程における混合温度は、30℃~70℃であり、好ましくは40℃~50℃である。30℃~70℃とすることにより、化合物(3)の分解を抑制し、化合物(3’)を選択的に分解することができる。反応時間は、用いる酸の種類や量、反応温度等により異なるが、例えば0.5~24時間であり、好ましくは1~15時間であり、より好ましくは3~10時間である。
化合物(3’)は、上記の工程で酸と混合されることにより、式(4)
(式中、R及びArは前記と同義である。Xはハロゲン原子を表す。)
で示される化合物(化合物(4))に変換される。
本発明は、イリドと化合物(1)との反応より得られる化合物(3)と化合物(3’)上記の工程で得られた混合物から化合物(3)を取得する工程を備える。上記の工程で得られた混合物には、化合物(3)と化合物(4)とが含まれている。化合物(3)と化合物(3’)との分離は必ずしも容易ではないが、化合物(3)と化合物(4)とは容易に分離することができる。
本発明において、化合物(3)及び化合物(3’)を含む異性体混合物と酸との混合の後、化合物(3)を取得するには、蒸留を行うのが好ましい。蒸留は、常圧条件下又は減圧条件下で行うことができ、化合物(3)の安定性の点で、減圧条件下で行うことが好ましい。蒸留における温度は、化合物(3)等により異なるが、高純度の化合物(3)を回収する点と化合物(3)の安定性の点とから、例えば20~200℃、好ましくは60~160℃、より好ましくは80~140℃である。蒸留に要する時間は、化合物(3)の種類や量、温度により異なるが、例えば0.5~24時間であり、好ましくは1~15時間であり、より好ましくは3~10時間である。
かくして取得された化合物(3)は、例えば、以下に示す方法により、式(5)
(式中、R及びArは前記と同義である。)
で示されるトリアゾール化合物(化合物(5))に変換することができる。
(a)化合物(3)を式(6)
(式中、R及びArは前記と同義であり、Yは脱離基を示す。)
で示される化合物(化合物(6))に変換する工程と、化合物(6)と1,2,4−トリアゾールと反応させる工程とを備える方法
(b)化合物(3)を1,2,4−トリアゾールと反応させることにより、式(8)
(式中、R及びArは前記と同義である。)
で示される化合物(化合物(8))に変換する工程と、化合物(8)を式(9)
(式中、R、Ar及びYは前記と同義である。)
で示される化合物(化合物(9))に変換する工程と、化合物(9)と塩基とを反応させる工程とを備える方法
が挙げられる。
Yで表される脱離基としては、例えば、ハロゲン原子、メタンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基、p−トルエンスルホニルオキシ基、ベンゼンスルホニルオキシ基が挙げられる。
以下、(a)記載の方法をより詳細に説明する。
(a)記載の方法において、Yで表される脱離基がスルホニルオキシ基である場合、例えば、トリエチルアミン等のアミンの存在下、化合物(3)をスルホニル化剤と反応させることにより、化合物(3)を化合物(6)に変換することができる。
スルホニル化剤としては、例えば、塩化メタンスルホニル、塩化p−トルエンスルホニル及びトリフルオロメタンスルホン酸無水物が挙げられ、好ましくは塩化メタンスルホニル及びトリフルオロメタンスルホン酸無水物が挙げられる。スルホニル化剤の使用量は、化合物(3)1モルに対して、好ましくは0.8~1.8モルであり、より好ましくは0.9~1.2モルである。かかる反応は、好ましくは、トルエン等の炭化水素溶媒の存在下で行われる。
化合物(3)の化合物(6)への変換は、例えば、炭化水素溶媒中、化合物(3)とアミンとを混合し、得られる混合物にスルホニル化剤を添加する方法により行うことができる。スルホニル化剤の添加温度及び反応温度は、好ましくは−20℃~40℃、より好ましくは0℃~20℃である。スルホニル化剤の添加及び反応に要する時間は、添加温度や反応温度により異なるが、好ましくは0.5~5時間であり、より好ましくは1~3時間である。
化合物(6)と1,2,4−トリアゾールとの反応は、好ましくは、塩基の存在下で行われる。塩基としては、例えば、水酸化リチウム、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物;水酸化カルシウム等のアルカリ土類金属水酸化物;炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸化物;炭酸カルシウム等のアルカリ土類金属炭酸化物;水素化ナトリウム、水素化リチウム等の金属水酸化物;ナトリウムメトキシド、ナトリウムエトキシド、ナトリウムブトキシド、カリウムブトキシド等の金属アルコキシドが挙げられる。好ましくは、水酸化ナトリウム、ナトリウムメトキシド、水素化ナトリウム及び水素化リチウムが挙げられ、より好ましくは、水酸化ナトリウム、ナトリウムメトキシド及び水素化ナトリウムが挙げられる。
化合物(6)と1,2,4−トリアゾールとの反応は、好ましくは溶媒中で行われる。溶媒としては、例えば、テトラヒドロフラン、メチルtert−ブチルエーテル、1,4−ジオキサン、ジエチレングリコールジメチルエーテル(diglyme)、エチレングリコールジメチルエーテル、1,3−ジオキソラン、2−メチルテトラヒドロフラン等のエーテル溶媒;トルエン、キシレン等の炭化水素系溶媒;N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチル−2−ピロリジノン、ジメチルスルホキシド、スルホラン、1,3−ジメチル−2−イミダゾリジノン、ヘキサメチルリン酸アミド等の非プロトン性極性溶媒;アセトニトリル、プロピオニトリル等のニトリル溶媒;メタノール等のアルコール溶媒が挙げられる。好ましくは、トルエン、N,N−ジメチルホルムアミド、ジメチルスルホキシド及びメタノールが挙げられ、より好ましくは、トルエン、N,N−ジメチルホルムアミド及びジメチルスルホキシドが挙げられる。
化合物(6)と1,2,4−トリアゾールとを反応させる温度は、反応に用いる溶媒の種類や沸点、及び塩基の種類や使用量等により異なるが、例えば20℃~100℃、好ましくは30℃~70℃、より好ましくは40℃~50℃である。反応時間は、反応温度等により異なるが、例えば0.5~24時間、好ましくは1~15時間、より好ましくは3~10時間である。反応温度、反応時間を上述の範囲内とすることにより、優れた選択性及び収率で化合物(5)を得ることができる。
かくして得られる化合物(5)は、任意の公知の方法により単離することができる。例えば、上述の(a)記載の方法により得られる反応混合物と水及び/又は塩酸とを混合し、抽出処理、洗浄処理、乾燥処理、濃縮処理、結晶化処理、固液分離処理等を行なうことにより化合物(5)を単離することができる。結晶化処理及び固液分離処理を採用することにより、優れた品質の化合物(5)を得ることができる。また、結晶化処理及び固液分離処理を採用することは、工業的な観点からも好ましい。結晶化処理は、例えば、濃縮処理により得られる濃縮混合物の温度を所定温度に調整し、該濃縮混合物に種結晶を添加し、得られる混合物を攪拌する方法により行なわれる。種結晶の添加前及び/又は添加後に、ヘプタン等の炭化水素溶媒を添加してもよい。固液分離処理は、例えば、結晶化処理により得られる固液混合物をろ過する方法により行なわれる。ろ過により得られた固体を洗浄処理、乾燥処理に付してもよい。
化合物(5)は、任意の光学活性体であってもよいし、それらの二種以上の混合物(例えば、ラセミ体、鏡像異性体混合物又はジアステレオマー混合物)であってもよい。化合物(5)の具体例としては、(2R,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン、(2R,3S)−2−(2,5−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン、(2S,3R)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン、(2S,3R)−2−(2,5−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン、(2S,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン、(2S,3S)−2−(2,5−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン、(2R,3R)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン及び(2R,3R)−2−(2,5−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシランが挙げられ、好ましくは(2R,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン及び(2R,3S)−2−(2,5−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシランが挙げられる。
化合物(5)は、例えば、US5807854、EP698606、WO2007/062542等に記載の方法に従って、抗真菌剤として有用な化合物に誘導することができる。
Hereinafter, the present invention will be described in detail.
In the present invention, the alkyl group having 1 to 6 carbon atoms represented by R includes a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a sec-butyl group, a tert-butyl group, a pentyl group, and an isopentyl group. A linear or cyclic alkyl group such as neopentyl group, hexyl group and cyclohexyl group, preferably an alkyl group having 1 to 4 carbon atoms such as methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, etc. More preferably, a methyl group is mentioned.
In the present invention, examples of the aromatic group represented by Ar include an optionally substituted aromatic carbocyclic group having 6 to 12 carbon atoms such as a phenyl group, a 1-naphthyl group, and a 2-naphthyl group. And an aromatic heterocyclic group having 3 to 12 carbon atoms such as 2-furyl group, 3-furyl group, 2-thienyl group, 3-thienyl group, 2-pyridyl group, 2-quinolyl group and the like. .
Here, examples of the substituent include a halogen atom (a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, preferably a fluorine atom), an alkyl group having 1 to 6 carbon atoms, and a trifluoromethyl group.
Specific examples of the aromatic carbocyclic group which may be substituted include phenyl group, 1-naphthyl group, 2-naphthyl group, 2-tolyl group, 3-tolyl group, 4-tolyl group and 2,4-xylyl. Group, 2-fluorophenyl group, 3-fluorophenyl group, 4-fluorophenyl group, 2-chlorophenyl group, 3-chlorophenyl group, 4-chlorophenyl group, 2-bromophenyl group, 3-bromophenyl group, 4-bromo Phenyl group, 2-iodophenyl group, 3-iodophenyl group, 4-iodophenyl group, 2,3-difluorophenyl group, 2,4-difluorophenyl group, 2,5-difluorophenyl group, 3,4-difluoro Phenyl group, 3,5-difluorophenyl group, 2,6-difluorophenyl group, 2,3-dichlorophenyl group, 2,4-dichlorophenyl group, 2 5-dichlorophenyl group, 3,4-dichlorophenyl group, 3,5-dichlorophenyl group, 2,6-dichlorophenyl group, 2,3-dibromophenyl group, 2,4-dibromophenyl group, 2,5-dibromophenyl group, 3,4-dibromophenyl group, 3,5-dibromophenyl group, 2,6-dibromophenyl group, 2,4,6-trifluorophenyl group, 2- (trifluoromethyl) phenyl group, 3- (trifluoro Methyl) phenyl group, 4- (trifluoromethyl) phenyl group, 1-chloronaphthyl group (1-chloro-2-naphthyl group, 1-chloro-3-naphthyl group, 1-chloro-4-naphthyl group, Chloro-5-naphthyl group, 1-chloro-6-naphthyl group, 1-chloro-7-naphthyl group, 1-chloro-8-naphthyl group), 2-chloronaphthyl (2-chloro-1-naphthyl group, 2-chloro-3-naphthyl group, 2-chloro-4-naphthyl group, 2-chloro-5-naphthyl group, 2-chloro-6-naphthyl group, 2-chloro- 7-naphthyl group, 2-chloro-8-naphthyl group), 1-bromonaphthyl group (1-bromo-2-naphthyl group, 1-bromo-3-naphthyl group, 1-bromo-4-naphthyl group, 1- Bromo-5-naphthyl group, 1-bromo-6-naphthyl group, 1-bromo-7-naphthyl group, 1-bromo-8-naphthyl group), 2-bromonaphthyl group (2-bromo-1-naphthyl group, 2-bromo-3-naphthyl group, 2-bromo-4-naphthyl group, 2-bromo-5-naphthyl group, 2-bromo-6-naphthyl group, 2-bromo-7-naphthyl group, 2-bromo-8 -Naphthyl group), 1-fluoronaphthyl group (1 -Fluoro-2-naphthyl group, 1-fluoro-3-naphthyl group, 1-fluoro-4-naphthyl group, 1-fluoro-5-naphthyl group, 1-fluoro-6-naphthyl group, 1-fluoro-7- Naphthyl group, 1-fluoro-8-naphthyl group), 2-fluoronaphthyl group (2-fluoro-1-naphthyl group, 2-fluoro-3-naphthyl group, 2-fluoro-4-naphthyl group, 2-fluoro- 5-naphthyl group, 2-fluoro-6-naphthyl group, 2-fluoro-7-naphthyl group, 2-fluoro-8-naphthyl group), 1-trifluoromethylnaphthyl group (1-trifluoromethyl-2-naphthyl) Group, 1-trifluoromethyl-3-naphthyl group, 1-trifluoromethyl-4-naphthyl group, 1-trifluoromethyl-5-naphthyl group, 1-trifluoromethyl-6 Naphthyl group, 1-trifluoromethyl-7-naphthyl group, 1-trifluoromethyl-8-naphthyl group), 2-trifluoromethylnaphthyl group (2-trifluoromethyl-1-naphthyl group, 2-trifluoromethyl) -3-naphthyl group, 2-trifluoromethyl-4-naphthyl group, 2-trifluoromethyl-5-naphthyl group, 2-trifluoromethyl-6-naphthyl group, 2-trifluoromethyl-7-naphthyl group, 2-trifluoromethyl-8-naphthyl group), difluorophenyl group (especially 2,4-difluorophenyl group, 2,5-difluorophenyl group), trifluorophenyl group (especially 2,4,6). -Trifluorophenyl group), trifluoromethylphenyl group (especially 2- (trifluoromethyl) phenyl group, 3- (trifluoro) Oromechiru) phenyl group, 4- (trifluoromethyl) phenyl group) are preferred, 2,4-difluorophenyl group, 2,5-difluorophenyl group is more preferable.
Specific examples of the aromatic heterocyclic group which may be substituted include 4-fluoropyridyl group (4-fluoro-2-pyridyl group, 4-fluoro-3-pyridyl group), 3-trifluoromethylpyridyl group ( 3-trifluoromethyl-2-pyridyl group, 3-trifluoromethyl-4-pyridyl group, 3-trifluoromethyl-5-pyridyl group, 3-trifluoromethyl-6-pyridyl group).
In the present invention, examples of the aromatic group of the methyl group substituted with the aromatic group represented by Ar include the same examples as the aromatic group represented by Ar. Specific examples of the methyl group substituted with the aromatic group represented by Ar include a benzyl group and a furfuryl group.
In the present invention, examples of the halogen atom represented by X include a chlorine atom, a bromine atom, and an iodine atom, and among them, an iodine atom is preferable.
In the present invention, examples of the leaving group represented by Y include halogen atoms such as chlorine atom, bromine atom and iodine atom, methanesulfonyloxy group, trifluoromethanesulfonyloxy group, benzenesulfonyloxy group, and p-toluenesulfonyl. Examples thereof include sulfonyloxy groups such as an oxy group and a p-trifluoromethanesulfonyloxy group. The leaving group is preferably a sulfonyloxy group, more preferably a methanesulfonyloxy group, a trifluoromethanesulfonyloxy group or a p-toluenesulfonyloxy group. In particular, a methanesulfonyloxy group is preferable.
In the present invention, an isomer mixture containing compound (3) and its structural isomer, compound (3 ′) is, for example, an ylide prepared from halogenated trimethyloxosulfonium or halogenated trimethylsulfonium and a base and the formula ( 1)
(In the formula, R and Ar are as defined above.)
It can manufacture by making keto alcohol compound (compound (1)) shown by these react.
Compound (1) can be obtained by a known method such as the method described in US2003 / 236419. Specifically, for example, an alkyl lactate is reacted with a dialkylamine to obtain a lactate dialkylamide, which is reacted with ethyl vinyl ether to protect the hydroxyl group with a 1-ethoxyethyl group, and then 2,4- It can be obtained by reacting an aromatic grinder reagent such as difluorophenyl magnesium halide.
Compound (1) may be an optically active form or a racemic form. The optically active substance may be of any optical purity.
Specific examples of the compound (1) include 2 ′, 4′-difluoro-2-hydroxypropiophenone, 2 ′, 5′-difluoro-2-hydroxypropiophenone, 2 ′, 4 ′, 6′-tri. Fluoro-2-hydroxypropiophenone, 2 '-(trifluoromethyl) -2-hydroxypropiophenone, 3'-(trifluoromethyl) -2-hydroxypropiophenone and 4 '-(trifluoromethyl)- 2-hydroxypropiophenone is mentioned.
Examples of the halogenated trimethyloxosulfonium include trimethyloxosulfonium chloride, trimethyloxosulfonium bromide and trimethyloxosulfonium iodide, and among them trimethyloxosulfonium iodide is preferable. Examples of the halogenated trimethylsulfonium include trimethylsulfonium chloride, trimethylsulfonium bromide, and trimethylsulfonium iodide. Among them, trimethylsulfonium iodide is preferable.
Examples of the base used for the preparation of ylide include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide and potassium hydroxide, alkaline earth metal hydroxides such as calcium hydroxide, sodium carbonate and potassium carbonate. Alkali metal carbonates, alkaline earth metal carbonates such as calcium carbonate, metal hydrides such as sodium hydride and lithium hydride, metal alkoxides such as sodium methoxide, sodium ethoxide, sodium butoxide, potassium butoxide, etc. Preferably sodium hydroxide, sodium hydride, and lithium hydride are mentioned, More preferably, sodium hydride is mentioned.
The reaction of halogenated trimethyloxosulfonium or ylide prepared from halogenated trimethylsulfonium and a base with compound (1) is preferably carried out in a solvent. Examples of the solvent include ether solvents such as tetrahydrofuran, methyl tert-butyl ether, 1,4-dioxane, diethylene glycol dimethyl ether (diglyme), ethylene glycol dimethyl ether, 1,3-dioxolane, 2-methyltetrahydrofuran, and N, N-dimethyl. Amide solvents such as formamide, N, N-dimethylacetamide and N-methyl-2-pyrrolidinone, nitrile solvents such as acetonitrile and propionitrile, dimethyl sulfoxide, sulfolane, 1,3-dimethyl-2-imidazolidinone and hexamethyl And phosphoric acid amides, preferably tetrahydrofuran, N, N-dimethylformamide and dimethyl sulfoxide, more preferably dimethyl sulfoxide and Hydrofuran and the like.
The ylide is prepared, for example, by a method in which halogenated trimethyloxosulfonium or halogenated trimethylsulfonium is mixed with a solvent, and then a base is added dropwise or dividedly to the mixture. The preparation temperature of ylide varies depending on the solvent and base used, but is preferably 0 ° C. to 30 ° C., more preferably 8 ° C. to 15 ° C. The preparation time of ylide varies depending on the solvent, base and the like used, but is preferably 1 to 24 hours.
The reaction between ylide and compound (1) is, for example, a method of adding compound (1) to ylide prepared by the above-mentioned method, or adding ylide to compound (1) or a mixture of compound (1) and a solvent. It can be done by a method. The temperature at which compound (1) or ylide is added is preferably −10 ° C. to 10 ° C., more preferably 0 ° C. to 5 ° C. in terms of the stability of compound (1) and compound (3) obtained by the reaction. The time required for the addition is preferably 3 to 15 hours, more preferably 4 to 10 hours. The reaction temperature between the ylide and the compound (1) is preferably −10 ° C. to 10 ° C., more preferably 0 ° C. to 5 ° C. in terms of the stability of the compound (1) and the compound (3) obtained by the reaction. The reaction time is preferably 1 to 8 hours, more preferably 1 to 5 hours.
Specific examples of the compound (3) include 3- (2 ′, 4′-difluorophenyl) -3,4-epoxy-2-butanol, 3- (2 ′, 5′-difluorophenyl) -3,4- Epoxy-2-butanol, 3- (2 ′, 4 ′, 6′-difluorophenyl) -3,4-epoxy-2-butanol, 3- (2 ′-(trifluoromethyl) phenyl) -3,4- Epoxy-2-butanol, 3- (3 ′-(trifluoromethyl) phenyl) -3,4-epoxy-2-butanol and 3- (4 ′-(trifluoromethyl) phenyl) -3,4-epoxy 2-butanol is mentioned.
In the present invention, an isomer mixture containing compound (3) and compound (3 ′) is mixed with an acid at a temperature selected from the range of 30 ° C. to 70 ° C. By this step, structural isomers contained in the isomer mixture can be selectively decomposed.
Examples of the acid used include mineral acids such as hydrochloric acid and sulfuric acid, and carboxylic acids such as acetic acid, oxalic acid, tartaric acid, succinic acid, citric acid, and phthalic acid, preferably hydrochloric acid, succinic acid, citric acid, and the like. A phthalic acid is mentioned, More preferably, a citric acid and a phthalic acid are mentioned. An acid may be used independently and may mix and use 2 or more types of acids. The amount of the acid to be used varies depending on the ratio of the compound (3) and the compound (3 ′) contained in the isomer mixture, but for example 0.1 to 2 mol, preferably 0 2 to 0.7 mol, more preferably 0.3 to 0.5 mol. The acid is preferably used as an aqueous solution. When the acid is used as an aqueous solution, the amount of water used is, for example, 0.5 to 15 mL, preferably 1 to 10 mL, more preferably 1 to 8 mL with respect to 1 g of compound (3) contained in the isomer mixture.
This process is, for example,
(A) A method of adjusting an isomer mixture containing the compound (3) and the compound (3 ′) to 30 ° C. to 70 ° C., and adding an acid or an aqueous solution thereof,
(B) A method of adjusting an acid or an aqueous solution thereof to 30 ° C. to 70 ° C., and adding an isomer mixture containing the compound (3) and the compound (3 ′) thereto,
(C) a method of adding an acid or an aqueous solution thereof to an isomer mixture containing the compound (3) and the compound (3 ′), and adjusting the resulting mixture to 30 ° C. to 70 ° C., and
(D) An isomer mixture containing the compound (3) and the compound (3 ′) is added to the acid or an aqueous solution thereof, and the resulting mixture is adjusted to 30 ° C. to 70 ° C. by any method. Preferably, the method of (B) and (D) description is mentioned. These methods are preferably further carried out in the presence of an organic solvent.
The organic solvent used in this step is not particularly limited as long as it has no reactivity with the compound (3), and an organic solvent immiscible with water is preferable. Specific examples of such organic solvents include methylene chloride, 1,2-dichloroethane, monochlorobenzene, 1,2-dichlorobenzene, 2-chlorotoluene, 3-chlorotoluene, 4-chlorotoluene, 2-chloro-m-xylene. 2-chloro-p-xylene, 4-chloro-o-xylene, 2,3-dichlorotoluene, 2,4-dichlorotoluene, 2,5-dichlorotoluene, 2,6-dichlorotoluene, 3,4-dichloro Halogenated hydrocarbon solvents such as toluene and monofluorobenzene; nitrobenzene; carbon disulfide; aromatic or aliphatic hydrocarbon solvents such as toluene; nitrile solvents such as acetonitrile and propionitrile; methyl tert-butyl ether and ethylene glycol dimethyl ether , Diethylene glycol dimethyl ether, 2- Chill tetrahydrofuran, 1,3-dioxolane, 1,4-ether solvent can be mentioned, such as dioxane, may be one of two or more organic solvents are mixed in any proportion. Hydrocarbon solvents are preferred, aromatic hydrocarbon solvents are more preferred, and toluene is particularly preferred.
The amount of the organic solvent to be used is, for example, 0.5 to 10 mL, preferably 1 to 8 mL, more preferably 1 to 5 mL with respect to 1 g of compound (3) contained in the isomer mixture.
The mixing temperature in this step is 30 ° C. to 70 ° C., preferably 40 ° C. to 50 ° C. By setting the temperature at 30 ° C. to 70 ° C., the decomposition of the compound (3) can be suppressed and the compound (3 ′) can be selectively decomposed. The reaction time varies depending on the type and amount of the acid used, the reaction temperature, etc., but is, for example, 0.5 to 24 hours, preferably 1 to 15 hours, and more preferably 3 to 10 hours.
Compound (3 ′) is mixed with an acid in the above-described step to give a compound of formula (4)
(In the formula, R and Ar are as defined above. X represents a halogen atom.)
Into a compound (compound (4)).
The present invention comprises the step of obtaining the compound (3) from the mixture obtained in the above-described steps, the compound (3) and the compound (3 ′) obtained from the reaction of the ylide and the compound (1). The mixture obtained in the above step contains compound (3) and compound (4). Separation of compound (3) and compound (3 ′) is not always easy, but compound (3) and compound (4) can be easily separated.
In the present invention, it is preferable to perform distillation to obtain the compound (3) after mixing the compound (3) and the isomer mixture containing the compound (3 ′) with an acid. Distillation can be performed under normal pressure conditions or under reduced pressure conditions, and is preferably performed under reduced pressure conditions from the viewpoint of the stability of the compound (3). The temperature in the distillation varies depending on the compound (3) and the like, but is 20 to 200 ° C., preferably 60 to 160 ° C., for example, from the viewpoint of recovering the high purity compound (3) and the stability of the compound (3). More preferably, it is 80 to 140 ° C. The time required for distillation varies depending on the type, amount and temperature of the compound (3), but is, for example, 0.5 to 24 hours, preferably 1 to 15 hours, and more preferably 3 to 10 hours.
The compound (3) thus obtained can be obtained, for example, by the method shown below according to the formula (5)
(In the formula, R and Ar are as defined above.)
It can convert into the triazole compound (compound (5)) shown by these.
(A) Compound (3) is converted to formula (6)
(In the formula, R and Ar are as defined above, and Y represents a leaving group.)
And a step of converting the compound (6) and 1,2,4-triazole into a compound represented by formula (6)
(B) reacting compound (3) with 1,2,4-triazole to give a compound of formula (8)
(In the formula, R and Ar are as defined above.)
And a step of converting the compound (8) into a compound represented by formula (9):
(Wherein R, Ar and Y have the same meanings as described above.)
And a step of converting the compound (9) and a base into a compound represented by formula (9).
Is mentioned.
Examples of the leaving group represented by Y include a halogen atom, a methanesulfonyloxy group, a trifluoromethanesulfonyloxy group, a p-toluenesulfonyloxy group, and a benzenesulfonyloxy group.
Hereinafter, the method described in (a) will be described in more detail.
In the method described in (a), when the leaving group represented by Y is a sulfonyloxy group, for example, by reacting compound (3) with a sulfonylating agent in the presence of an amine such as triethylamine, the compound ( 3) can be converted to compound (6).
Examples of the sulfonylating agent include methanesulfonyl chloride, p-toluenesulfonyl chloride, and trifluoromethanesulfonic anhydride, and preferably include methanesulfonyl chloride and trifluoromethanesulfonic anhydride. The amount of the sulfonylating agent to be used is preferably 0.8 to 1.8 mol, more preferably 0.9 to 1.2 mol, per 1 mol of compound (3). Such a reaction is preferably carried out in the presence of a hydrocarbon solvent such as toluene.
Conversion of compound (3) to compound (6) can be performed, for example, by a method of mixing compound (3) and amine in a hydrocarbon solvent and adding a sulfonylating agent to the resulting mixture. The addition temperature and reaction temperature of the sulfonylating agent are preferably −20 ° C. to 40 ° C., more preferably 0 ° C. to 20 ° C. The time required for the addition and reaction of the sulfonylating agent varies depending on the addition temperature and reaction temperature, but is preferably 0.5 to 5 hours, more preferably 1 to 3 hours.
The reaction between compound (6) and 1,2,4-triazole is preferably carried out in the presence of a base. Examples of the base include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; alkaline earth metal hydroxides such as calcium hydroxide; alkali metal carbonates such as sodium carbonate and potassium carbonate; Examples include alkaline earth metal carbonates such as calcium carbonate; metal hydroxides such as sodium hydride and lithium hydride; metal alkoxides such as sodium methoxide, sodium ethoxide, sodium butoxide, and potassium butoxide. Preferably, sodium hydroxide, sodium methoxide, sodium hydride, and lithium hydride are mentioned, More preferably, sodium hydroxide, sodium methoxide, and sodium hydride are mentioned.
The reaction between compound (6) and 1,2,4-triazole is preferably carried out in a solvent. Examples of the solvent include ether solvents such as tetrahydrofuran, methyl tert-butyl ether, 1,4-dioxane, diethylene glycol dimethyl ether (diglyme), ethylene glycol dimethyl ether, 1,3-dioxolane, and 2-methyltetrahydrofuran; carbonization such as toluene and xylene. Hydrogen-based solvents; N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidinone, dimethyl sulfoxide, sulfolane, 1,3-dimethyl-2-imidazolidinone, hexamethylphosphoric acid amide, etc. Aprotic polar solvents; nitrile solvents such as acetonitrile and propionitrile; and alcohol solvents such as methanol. Preferably, toluene, N, N-dimethylformamide, dimethyl sulfoxide and methanol are mentioned, More preferably, toluene, N, N-dimethylformamide and dimethyl sulfoxide are mentioned.
The temperature at which compound (6) reacts with 1,2,4-triazole varies depending on the type and boiling point of the solvent used in the reaction, the type and amount of base used, etc., but is, for example, 20 to 100 ° C., preferably 30 C. to 70.degree. C., more preferably 40 to 50.degree. The reaction time varies depending on the reaction temperature and the like, but is, for example, 0.5 to 24 hours, preferably 1 to 15 hours, and more preferably 3 to 10 hours. By setting the reaction temperature and the reaction time within the above ranges, the compound (5) can be obtained with excellent selectivity and yield.
The compound (5) thus obtained can be isolated by any known method. For example, the reaction mixture obtained by the method described in (a) above is mixed with water and / or hydrochloric acid and subjected to extraction treatment, washing treatment, drying treatment, concentration treatment, crystallization treatment, solid-liquid separation treatment, etc. The compound (5) can be isolated by By adopting the crystallization treatment and the solid-liquid separation treatment, an excellent quality compound (5) can be obtained. Moreover, it is preferable also from an industrial viewpoint to employ | adopt a crystallization process and a solid-liquid separation process. The crystallization treatment is performed, for example, by adjusting the temperature of the concentrated mixture obtained by the concentration treatment to a predetermined temperature, adding seed crystals to the concentrated mixture, and stirring the resulting mixture. A hydrocarbon solvent such as heptane may be added before and / or after the addition of the seed crystal. The solid-liquid separation process is performed, for example, by a method of filtering the solid-liquid mixture obtained by the crystallization process. The solid obtained by filtration may be subjected to washing treatment and drying treatment.
Compound (5) may be any optically active substance or a mixture of two or more thereof (for example, a racemate, an enantiomeric mixture, or a diastereomeric mixture). Specific examples of the compound (5) include (2R, 3S) -2- (2,4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl. Oxirane, (2R, 3S) -2- (2,5-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane, (2S, 3R ) -2- (2,4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane, (2S, 3R) -2- (2, 5-Difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane, (2S, 3S) -2- (2,4-difluorophenyl) -3 -Methyl-2-[(1H-1,2,4-triazol -1-yl) methyl] oxirane, (2S, 3S) -2- (2,5-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] Oxirane, (2R, 3R) -2- (2,4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane and (2R, 3R) -2- (2,5-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane is preferred, preferably (2R, 3S) -2. -(2,4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane and (2R, 3S) -2- (2,5-difluoro Phenyl) -3-methyl-2-[( H-1,2,4-triazol-1-yl) methyl] oxirane and the like.
Compound (5) can be derived into a compound useful as an antifungal agent, for example, according to the method described in US Pat. No. 5,807,854, EP698606, WO2007 / 062542, and the like.
以下、実施例により本発明をさらに詳細に説明する。
以下の実施例において得られた化合物は、下記の条件に従って分析を行い、その純度を求めた。
<高速液体クロマトグラフィー(HPLC)分析条件>
カラム:YMC PACK ODS−A,46mmφ×100mm,S−3μm,12nm
移動層:A液 蒸留水またはイオン交換水
B液 アセトニトリル/2−プロパノール=95/5(v/v)
グラジエント条件:
時間(分) 0 15 50 50.01
移動層中のB液濃度 18% 18% 70% 18%
流速:1.5mL/min
カラム温度:35℃
検出波長:254nm
試料希釈液:アセトニトリル/イオン交換水(または蒸留水)=9/1(v/v)
注入量:15μL
保持時間:
(R)−1−(2,4−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノン 約9分
(2R,3R)−3−(2,5−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール 約12分
(2R,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン 約15分
<製造例1>
US2003/236419に記載の方法に従って、(R)−1−(2,4−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノンを製造した。
<実施例1> 化合物(3)及び化合物(3’)を含む異性体混合物の調製
ジメチルスルホキシド615mL、テトラヒドロフラン259mL、ヨウ化トリメチルオキソスルホニウム158.4gを混合し、得られた混合物を約11℃まで冷却・温調した。そこへ、水素化ナトリウム22.9g(約60%ミネラルオイルディスパージョン)と流動パラフィン46.0gとの混合物を滴下し、水素の発泡が収まるまで保温・撹拌してイリドを調製した。続いて、製造例1で得た(R)−1−(2,4−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノン100.0g(0.54mol)及びジメチルスルホキシド259mLの混合溶液を、約10℃に冷却した前記イリドに対して滴下し、そのまま約10℃で保温し、反応させることにより、化合物(3)である(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール及び化合物(3’)である1−(2,4−ジフルオロフェニル)−1−(2−メチル−2−オキシラニル)メタノールを含む反応混合物を調製した。
クエン酸・1水和物47.4g、水875mL及びトルエン410mLを混合して調製した溶液に対し、前記反応混合物を滴下した後、40~45℃にて約8時間撹拌し、化合物(3’)である1−(2,4−ジフルオロフェニル)−1−(2−メチル−2−オキシラニル)メタノールを分解し、1−(2,4−ジフルオロフェニル)−1−(2−メチル−2−オキシラニル)メタノールを化合物(4)である3−(2,4−ジフルオロフェニル)−2−メチル−2−ヨードメチルオキシランに変換した。
上記で得られた混合物を室温付近まで冷却し、トルエン410mL、205mLをそれぞれ用いて抽出を行った。抽出により得られたトルエン層を合わせ、合わせたトルエン層を、炭酸水素ナトリウム2.3gを水410mLに溶解させて調製した弱アルカリ水で洗浄し、次いで、イオン交換水410mLで2回洗浄した。洗浄したトルエン層を減圧濃縮し、得られた残渣を減圧蒸留することにより、化合物(3)である(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール62.3g得た(収率:57.9%)。その純度(HPLC面積百分率)は73.8%であった。
<実施例2> 化合物(6)の製造
実施例1により得られた(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール60.1g(0.30mol)、トルエン300mL及びトリエチルアミン33.4gを混合し、得られた溶液を約3℃に冷却した。その溶液を3~8℃に保持しながら、メタンスルホニルクロリド4.4gをその溶液に対して滴下し、反応させた。反応終了後、水168mLを反応混合物に滴下し、撹拌した後、分液した。得られた有機層を、水151mL、次いで、10%食塩水16.8gで洗浄した後、減圧濃縮した。得られた濃縮残渣とN,N−ジメチルホルムアミドとを混合し、化合物(6)である(R)−1−[(R)−2−(2,4−ジフルオロフェニル)−2−オキシラニル]エチル メタンスルホン酸エステルの溶液を得た。
化合物(5)の製造
1,2,4−トリアゾール27.4gとN,N−ジメチルホルムアミド83mLとを混合し、得られた溶液を3~5℃に冷却した後、そこへ水素化ナトリウム14.3g(約60%ミネラルオイルディスパージョン)と流動パラフィン26.7gとの混合物を、3~5℃に保持しながら滴下し、水素の発泡が収まるまで保温・撹拌した。得られた混合物を約40℃に昇温し、その後、室温付近へ冷却することにより、1,2,4−トリアゾールナトリウム塩スラリーを調製した。次に、調製した1,2,4−トリアゾールナトリウム塩スラリーを、45~50℃に保温した(R)−1−[(R)−2−(2,4−ジフルオロフェニル)−2−オキシラニル]エチル メタンスルホン酸エステルの前記溶液に対して滴下し、50~55℃で保温することにより、反応させた。
反応終了後、得られた反応混合物を室温付近まで冷却し、その反応混合物を、食塩5.8gと水117mLとトルエン183mLとの混合溶液に対して滴下した後、トルエン117mL、58mLをそれぞれ用いて抽出した。得られたトルエン層を合一し、水酸化ナトリウム0.5gを水58mLに溶解して調製したアルカリ水で洗浄し、次いで、2.1%塩酸31gで2回洗浄した。さらに、炭酸水素ナトリウム1.8gを水58mLに溶解して調製した弱アルカリ水による有機層の洗浄を行い、減圧濃縮後、化合物(5)である(2R,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシランの溶液を得た。
得られた(2R,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシランの溶液に、ヘプタン43.9gを添加し、約50℃まで昇温した後、約40℃で(2R,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシランの種結晶を接種した。同温度付近にて結晶を析出させた後、得られた混合物に、さらにヘプタン14.4gを滴下した。得られた混合物を5℃付近まで冷却し、保温した後、結晶を濾過し、取得した結晶をトルエン17mLとヘプタン67mLとの混合溶媒、及びヘプタン83mLにて洗浄し、乾燥することにより、(2R,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン34.5gを得た(収率:45.8%)。その純度(HPLC面積百分率)は99.87%であり、1−{[3−(2,4−ジフルオロフェニル)−2−メチルオキシラン−2−イル]メチル}−1H−1,2,4−トリアゾール、即ち化合物(3’)から誘導されたトリアゾール化合物は検出されなかった。
<実施例3> 化合物(3)の製造
クエン酸・1水和物47.4g及び水875mLをフタル酸11.25g及び水263mLに替え、(R)−1−(2,4−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノンを30gスケールに変更した以外は、実施例1と同様に行い、(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール19.0gを得た(収率:58.8%)。その純度(HPLC面積百分率)は73.5%であった。
<実施例4> 化合物(5)の製造
実施例3により得られた(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールを用い、(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールを17gスケールに変更した以外は、実施例2と同様に行い、(2R,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン8.4gを得た(収率:39.4%)。その純度(HPLC面積百分率)は99.92%であり、1−{[3−(2,4−ジフルオロフェニル)−2−メチルオキシラン−2−イル]メチル}−1H−1,2,4−トリアゾール、即ち化合物(3’)から誘導されたトリアゾール化合物は検出されなかった。
<実施例5> 化合物(3)の製造
クエン酸・1水和物47.4g及び水875mLをDL−リンゴ酸9.08g及び水263mLに替え、(R)−1−(2,4−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノンを30gスケールに変更した以外は、実施例1と同様に行い、(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール20.7gを得た(収率:64.3%)。その純度(HPLC面積百分率)は68.7%であった。
<実施例6> 化合物(5)の製造
実施例5により得られた(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールを用い、(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールを17gスケールに変更した以外は、実施例2と同様に行い、(2R,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン8.8gを得た(収率:41.4%)。その純度(HPLC面積百分率)は100.00%であり、1−{[3−(2,4−ジフルオロフェニル)−2−メチルオキシラン−2−イル]メチル}−1H−1,2,4−トリアゾール、即ち化合物(3’)から誘導されたトリアゾール化合物は検出されなかった。
<実施例7> 化合物(3)の製造
クエン酸・1水和物47.4g及び水875mLをシュウ酸6.10g及び水263mLに替え、(R)−1−(2,4−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノンを30gスケールに変更した以外は、実施例1と同様に行い、(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール17.9gを得た(収率:55.5%)。その純度(HPL面積百分率)は73.7%であった。
<実施例8> 化合物(5)の製造
実施例7により得られた(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールを用い、(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールを17gスケールに変更した以外は、実施例2と同様に行い、(2R,3S)−2−(2,4−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン9.5gを得た(収率:44.3%)。その純度(HPLC面百値)は99.93%であり、1−{[3−(2,4−ジフルオロフェニル)−2−メチルオキシラン−2−イル]メチル}−1H−1,2,4−トリアゾール、即ち化合物(3’)から誘導されたトリアゾール化合物は検出されなかった。
<実施例9> 化合物(3)の製造
(R)−1−(2,4−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノンを(R)−1−(2,5−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノンに替え、(R)−1−(2,5−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノンを30gスケールに変更した以外は、実施例1と同様に行い、(2R,3R)−3−(2,5−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール20.7gを得た(収率:64.3%)。その純度(HPLC面積百分率)は76.8%であった。
<実施例10> 化合物(6)の製造
実施例9により得られた(2R,3R)−3−(2,5−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール20.0g(0.1mol)、トルエン100mL及びトリエチルアミン11.1gを混合し、得られた溶液を0℃付近に冷却した。その溶液を0~10℃に保持しながら、メタンスルホニルクロリド11.4gをその溶液に対して滴下し、反応させた。反応終了後、水56mLを反応混合物に添加し、攪拌した後、分液した。得られた有機層を、水56mL、次いで、10%食塩水56gで洗浄した後、無水硫酸マグネシウム1.0gにより脱水処理した。脱処理水後、濾過により硫酸マグネシウムを除去し、N,N−ジメチルホルムアミド28mLを添加した。得られた混合物を減圧濃縮することによりトルエンを留去し、(R)−1−[(R)−2−(2,5−ジフルオロフェニル)−2−オキシラニル]エチル メタンスルホン酸エステルの溶液を得た。
化合物(5)の製造
1,2,4−トリアゾール9.1gをDMF28mLに溶解し、得られた溶液を0~5℃に冷却した。そこへ水素化ナトリウム4.8g(約60%ミネラルオイルディスパージョン)と流動パラフィン8.9gとの混合物を、0~5℃に保持しながら滴下し、水素の発泡が収まるまで保温・撹拌した。得られた混合物を約40℃に昇温し、その後、室温付近へ冷却することにより、1,2,4−トリアゾールナトリウム塩スラリーを調製した。次に、調製した1,2,4−トリアゾールナトリウム塩スラリーを、45~50℃に保温した(R)−1−[(R)−2−(2,5−ジフルオロフェニル)−2−オキシラニル]エチル メタンスルホン酸エステルの溶液に対して滴下し、40~45℃で保温することにより、反応させた。
反応終了後、得られた反応混合物を室温付近まで冷却し、その反応混合物を、食塩2.0gと水39mLとトルエン61mLとの混合溶液に対して滴下した後、35%塩酸により中和し、続いてトルエン39mL、20mLをそれぞれ用いて抽出した。得られたトルエン層を合一し、2.2%塩酸水11gで2回洗浄し、次いで、水20mLで洗浄した。さらに、炭酸水素ナトリウム0.6gを水20mLに溶解して調製した弱アルカリ水による有機層の洗浄を行い、減圧濃縮後、(2R,3S)−2−(2,5−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシランの溶液を得た。
得られた(2R,3S)−2−(2,5−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシランの溶液に、ヘプタン19.8gを添加し、約50℃まで昇温した後、約27℃で(2R,3S)−2−(2,5−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシランの種結晶を接種した。同温度付近にて結晶を析出させた後、得られた混合物に、さらにヘプタン56mLを滴下した。得られた混合物を10℃付近まで冷却し、保温した後、結晶を濾過し、取得した結晶をトルエン20mLとヘプタン36mLとの混合溶媒、及びヘプタン56mLで洗浄し、乾燥することにより、(2R,3S)−2−(2,5−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン9.7gを得た(収率:38.6%)。その純度(HPLC面積百分率)は99.68%であり、1−{[3−(2,5−ジフルオロフェニル)−2−メチルオキシラン−2−イル]メチル}−1H−1,2,4−トリアゾール、即ち化合物(3’)から誘導されたトリアゾール化合物は検出されなかった。
<実施例11> 化合物(3)の製造
クエン酸・1水和物47.4g及び水875mLを35%塩酸11.7g及び水436mLに替え、(R)−1−(2,5−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノン46.6gスケールに変更した以外は、実施例9と同様に行い、(2R,3R)−3−(2,5−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール31.1gを得た(収率:62.1%)。その純度(HPLC面積百分率)は79.5%であった。
<実施例12> 化合物(5)の製造
実施例11により得られた(2R,3R)−3−(2,5−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールを用い、(2R,3R)−3−(2,5−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールを20gスケールに変更した以外は、実施例10と同様に行い、(2R,3S)−2−(2,5−ジフルオロフェニル)−3−メチル−2−[(1H−1,2,4−トリアゾール−1−イル)メチル]オキシラン10.9gを得た(収率:43.4%)。その純度(HPLC面積百分率)は99.37%であり、1−{[3−(2,5−ジフルオロフェニル)−2−メチルオキシラン−2−イル]メチル}−1H−1,2,4−トリアゾール、即ち化合物(3’)から誘導されたトリアゾール化合物は検出されなかった。
<実施例13> 化合物(3)の製造
クエン酸・1水和物47.4g及び水875mLをフタル酸11.25g及び水263mLに替え、(R)−1−(2,5−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノンを30gスケールに変更した以外は、実施例9と同様に行い、(2R,3R)−3−(2,5−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール19.7gを得た(収率:63.2%)。その純度(HPLC面積百分率)は76.5%であった。
<実施例14> 化合物(3)の製造
クエン酸・1水和物47.4g及び水875mLをDL−リンゴ酸9.08g及び水263mLに替え、(R)−1−(2,5−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノンを30gスケールに変更した以外は、実施例9と同様に行い、(2R,3R)−3−(2,5−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール20.4gを得た(収率:64.0%)。その純度(HPLC面積百分率)は74.2%であった。
<参考例1>
ジメチルスルホキシド531mL、テトラヒドロフラン186mL及びヨウ化トリメチルオキソスルホニウム115.5gを混合し、得られた混合物を8℃付近まで冷却した。そこへ、水素化ナトリウム20.0g(約60%ミネラルオイルディスパージョン)と流動パラフィン40.0gとの混合物を滴下し、水素の発泡が収まるまで保温・撹拌してイリドを調製した。続いて、(R)−1−(2,4−ジフルオロフェニル)−2−ヒドロキシ−1−プロパノン93.1g(0.50mol)およびDMSO223mLの混合物を、約3℃付近に冷却したイリドに対して滴下し、そのまま約3℃にて保温し、反応させた。反応終了後、クエン酸・1水和物41.0g、水754mL及びトルエン354mLを混合して、0℃付近に温調した溶液に対し、(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール及び1−(2,4−ジフルオロフェニル)−1−(2−メチル−2−オキシラニル)メタノールを含む反応混合物を滴下した後、1~9℃で保温し、撹拌した。続いて、トルエン354mL、177mLをそれぞれ用いて抽出を行った後、得られた有機層を合一し、炭酸水素ナトリウム2.1gを水354mLに溶解して調製した弱アルカリ水で洗浄した。有機層をさらに、イオン交換水354mLで3回洗浄した後、減圧濃縮し、得られた濃縮残渣を減圧蒸留することにより、(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール70.6gを得た(収率:70.6%)。その純度(HPLC面積百分率)は66.7%であり、(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールの構造異性体(化合物(3’))が17.9%(HPLC面積百分率)含まれていた。
<実施例15> 化合物(4)の単離
実施例1と同様の操作により、化合物(3)である(2R,3R)−3−(2,4−ジフルオロフェニル)−3,4−エポキシ−2−ブタノールを蒸留により取得した後、その蒸留残渣をシリカゲルカラムクロマトグラフィーにより精製し、次いで結晶化させることにより、化合物(4)である3−(2,4−ジフルオロフェニル)−2−メチル−2−ヨードメチルオキシランを単離した。単離した3−(2,4−ジフルオロフェニル)−2−メチル−2−ヨードメチルオキシランは、上述の実施例1等において、分析用標準物質として用いた。
得られた3−(2,4−ジフルオロフェニル)−2−メチル−2−ヨードメチルオキシランは、下記分析結果からその構造が決定された。
元素分析
計算値)C:38.7%,H:2.9%,F:12.3%,I:40.9%
実測値)C:36.8%,H:3.4%,F:12.2%,I:38.3%
1H−NMR:(CDCl3,δppm)1.15(3H,s),3.44(2H,dd,J=56.2,10.3Hz),5.14(1H,d,J=4.15),6.76−6.82(1H,m),6.88−6.93(1H,m),7.49−7.55(1H,m)
13C−NMR:(CDCl3,δppm)17.79,17.80,22.79,68.95,73.80,103.14,103.39,103.66,111.35,111.37,111.40,111.58,111.62,122.85,122.96,123.00,129.81,129.85,129.90,129.93,129.96,158.69,161.14,163.72
Hereinafter, the present invention will be described in more detail with reference to examples.
The compounds obtained in the following examples were analyzed according to the following conditions to determine their purity.
<High performance liquid chromatography (HPLC) analysis conditions>
Column: YMC PACK ODS-A, 46 mmφ × 100 mm, S-3 μm, 12 nm
Moving bed: Liquid A Distilled water or ion-exchanged water Liquid B Acetonitrile / 2-propanol = 95/5 (v / v)
Gradient condition:
Time (minutes) 0 15 50 50.01
Liquid B concentration in moving bed 18% 18% 70% 18%
Flow rate: 1.5 mL / min
Column temperature: 35 ° C
Detection wavelength: 254 nm
Sample diluent: acetonitrile / ion-exchanged water (or distilled water) = 9/1 (v / v)
Injection volume: 15 μL
Retention time:
(R) -1- (2,4-difluorophenyl) -2-hydroxy-1-propanone About 9 minutes (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy-2- Butanol about 12 minutes (2R, 3S) -2- (2,4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane about 15 minutes < Production Example 1>
(R) -1- (2,4-difluorophenyl) -2-hydroxy-1-propanone was produced according to the method described in US2003 / 236419.
<Example 1> Preparation of isomer mixture containing compound (3) and compound (3 ') Dimethyl sulfoxide (615 mL), tetrahydrofuran (259 mL), trimethyloxosulfonium iodide (158.4 g) were mixed, and the resulting mixture was heated to about 11 ° C. Cooled and temperature controlled. Thereto was added dropwise a mixture of 22.9 g of sodium hydride (about 60% mineral oil dispersion) and 46.0 g of liquid paraffin, and the mixture was kept warm and stirred until hydrogen bubbling ceased to prepare an ylide. Subsequently, a mixed solution of 100.0 g (0.54 mol) of (R) -1- (2,4-difluorophenyl) -2-hydroxy-1-propanone obtained in Production Example 1 and 259 mL of dimethyl sulfoxide was added to about 10 (2R, 3R) -3- (2,4-difluorophenyl) -3, which is the compound (3), by adding dropwise to the ylide cooled to 0 ° C., keeping it at about 10 ° C. A reaction mixture containing 4-epoxy-2-butanol and 1- (2,4-difluorophenyl) -1- (2-methyl-2-oxiranyl) methanol, which is compound (3 ′), was prepared.
The reaction mixture was added dropwise to a solution prepared by mixing 47.4 g of citric acid monohydrate, 875 mL of water and 410 mL of toluene, and the mixture was stirred at 40-45 ° C. for about 8 hours to give compound (3 ′ 1- (2,4-difluorophenyl) -1- (2-methyl-2-oxiranyl) methanol is decomposed to 1- (2,4-difluorophenyl) -1- (2-methyl-2- Oxiranyl) methanol was converted to 3- (2,4-difluorophenyl) -2-methyl-2-iodomethyloxirane, which is compound (4).
The mixture obtained above was cooled to around room temperature, and extracted with 410 mL and 205 mL of toluene, respectively. The toluene layers obtained by extraction were combined, and the combined toluene layers were washed with weak alkaline water prepared by dissolving 2.3 g of sodium bicarbonate in 410 mL of water, and then washed twice with 410 mL of ion-exchanged water. The washed toluene layer was concentrated under reduced pressure, and the resulting residue was distilled under reduced pressure to obtain (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2, which is compound (3). -62.3 g of butanol was obtained (yield: 57.9%). Its purity (HPLC area percentage) was 73.8%.
<Example 2> Production of Compound (6) 60.1 g (0. R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol obtained in Example 1 (0. 30 mol), 300 mL of toluene and 33.4 g of triethylamine were mixed, and the resulting solution was cooled to about 3 ° C. While maintaining the solution at 3 to 8 ° C., 4.4 g of methanesulfonyl chloride was added dropwise to the solution to cause a reaction. After completion of the reaction, 168 mL of water was added dropwise to the reaction mixture, followed by stirring and liquid separation. The obtained organic layer was washed with 151 mL of water and then with 16.8 g of 10% brine, and then concentrated under reduced pressure. The resulting concentrated residue and N, N-dimethylformamide were mixed, and (R) -1-[(R) -2- (2,4-difluorophenyl) -2-oxiranyl] ethyl which was the compound (6). A solution of methanesulfonic acid ester was obtained.
Production of Compound (5) 2,7.4 g of 1,2,4-triazole and 83 mL of N, N-dimethylformamide were mixed, and the resulting solution was cooled to 3 to 5 ° C. A mixture of 3 g (about 60% mineral oil dispersion) and 26.7 g of liquid paraffin was added dropwise while maintaining the temperature at 3 to 5 ° C., and the mixture was kept warm and stirred until hydrogen bubbling ceased. The obtained mixture was heated to about 40 ° C. and then cooled to around room temperature to prepare a 1,2,4-triazole sodium salt slurry. Next, the prepared 1,2,4-triazole sodium salt slurry was kept at 45-50 ° C. (R) -1-[(R) -2- (2,4-difluorophenyl) -2-oxiranyl] It was made to react by dripping with respect to the said solution of ethyl methanesulfonic acid ester, and keeping at 50-55 degreeC.
After completion of the reaction, the resulting reaction mixture was cooled to near room temperature, and the reaction mixture was added dropwise to a mixed solution of 5.8 g of sodium chloride, 117 mL of water and 183 mL of toluene, and then 117 mL and 58 mL of toluene were used. Extracted. The obtained toluene layers were combined, washed with alkaline water prepared by dissolving 0.5 g of sodium hydroxide in 58 mL of water, and then washed twice with 31 g of 2.1% hydrochloric acid. Further, the organic layer was washed with weak alkaline water prepared by dissolving 1.8 g of sodium bicarbonate in 58 mL of water, concentrated under reduced pressure, and then (2R, 3S) -2- (2,4) which is compound (5). A solution of -difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane was obtained.
To the resulting solution of (2R, 3S) -2- (2,4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane, heptane was added. 43.9 g was added, the temperature was raised to about 50 ° C., and then (2R, 3S) -2- (2,4-difluorophenyl) -3-methyl-2-[(1H-1,2, , 4-Triazol-1-yl) methyl] oxirane seeds. Crystals were precipitated near the same temperature, and then 14.4 g of heptane was further added dropwise to the obtained mixture. The obtained mixture was cooled to around 5 ° C. and kept warm, and then the crystals were filtered. The obtained crystals were washed with a mixed solvent of 17 mL of toluene and 67 mL of heptane and 83 mL of heptane and dried to obtain (2R , 3S) -2- (2,4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane was obtained (yield: 45.8%). Its purity (HPLC area percentage) is 99.87%, and 1-{[3- (2,4-difluorophenyl) -2-methyloxiran-2-yl] methyl} -1H-1,2,4- Triazole, ie, a triazole compound derived from compound (3 ′), was not detected.
<Example 3> Production of Compound (3) 47.4 g of citric acid monohydrate and 875 mL of water were replaced with 11.25 g of phthalic acid and 263 mL of water, and (R) -1- (2,4-difluorophenyl) (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-, except that 2-hydroxy-1-propanone was changed to 30 g scale 19.0 g of butanol was obtained (yield: 58.8%). Its purity (HPLC area percentage) was 73.5%.
Example 4 Production of Compound (5) Using (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol obtained in Example 3, (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol was carried out in the same manner as in Example 2 except that the scale was changed to 17 g scale, and (2R, 3S) -2- (2 , 4-Difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane was obtained (yield: 39.4%). Its purity (HPLC area percentage) is 99.92%, 1-{[3- (2,4-difluorophenyl) -2-methyloxiran-2-yl] methyl} -1H-1,2,4- Triazole, ie, a triazole compound derived from compound (3 ′), was not detected.
<Example 5> Production of compound (3) 47.4 g of citric acid monohydrate and 875 mL of water were replaced with 9.08 g of DL-malic acid and 263 mL of water, and (R) -1- (2,4-difluoro (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-, except that phenyl) -2-hydroxy-1-propanone was changed to a 30 g scale. 20.7 g of 2-butanol was obtained (yield: 64.3%). Its purity (HPLC area percentage) was 68.7%.
Example 6 Production of Compound (5) Using (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol obtained in Example 5, (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol was carried out in the same manner as in Example 2 except that the scale was changed to 17 g scale, and (2R, 3S) -2- (2 , 4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane (8.8 g) was obtained (yield: 41.4%). Its purity (HPLC area percentage) is 100.00% and 1-{[3- (2,4-difluorophenyl) -2-methyloxiran-2-yl] methyl} -1H-1,2,4- Triazole, ie, a triazole compound derived from compound (3 ′), was not detected.
<Example 7> Production of Compound (3) 47.4 g of citric acid monohydrate and 875 mL of water were replaced with 6.10 g of oxalic acid and 263 mL of water, and (R) -1- (2,4-difluorophenyl) (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-, except that 2-hydroxy-1-propanone was changed to 30 g scale 17.9 g of butanol was obtained (yield: 55.5%). Its purity (HPL area percentage) was 73.7%.
Example 8 Production of Compound (5) Using (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol obtained in Example 7, (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol was carried out in the same manner as in Example 2 except that the scale was changed to 17 g scale, and (2R, 3S) -2- (2 , 4-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane was obtained (yield: 44.3%). Its purity (HPLC surface percentage) is 99.93%, and 1-{[3- (2,4-difluorophenyl) -2-methyloxiran-2-yl] methyl} -1H-1,2,4. -Triazoles, ie triazole compounds derived from compound (3 '), were not detected.
Example 9 Production of Compound (3) (R) -1- (2,4-Difluorophenyl) -2-hydroxy-1-propanone was converted to (R) -1- (2,5-difluorophenyl) -2. The same procedure as in Example 1 was carried out except that (R) -1- (2,5-difluorophenyl) -2-hydroxy-1-propanone was changed to 30 g scale instead of -hydroxy-1-propanone, and (2R , 3R) -3- (2,5-difluorophenyl) -3,4-epoxy-2-butanol (20.7 g) was obtained (yield: 64.3%). Its purity (HPLC area percentage) was 76.8%.
Example 10 Production of Compound (6) 20.0 g of (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy-2-butanol obtained in Example 9 (0. 1 mol), 100 mL of toluene and 11.1 g of triethylamine were mixed, and the resulting solution was cooled to around 0 ° C. While maintaining the solution at 0 to 10 ° C., 11.4 g of methanesulfonyl chloride was added dropwise to the solution to cause a reaction. After completion of the reaction, 56 mL of water was added to the reaction mixture, stirred and then separated. The obtained organic layer was washed with 56 mL of water and then with 56 g of 10% brine, and then dehydrated with 1.0 g of anhydrous magnesium sulfate. After the detreated water, magnesium sulfate was removed by filtration, and 28 mL of N, N-dimethylformamide was added. Toluene was distilled off by concentrating the resulting mixture under reduced pressure, and a solution of (R) -1-[(R) -2- (2,5-difluorophenyl) -2-oxiranyl] ethyl methanesulfonate was added. Obtained.
Production of Compound (5) 9.1 g of 1,2,4-triazole was dissolved in 28 mL of DMF, and the resulting solution was cooled to 0 to 5 ° C. Thereto, a mixture of 4.8 g of sodium hydride (about 60% mineral oil dispersion) and 8.9 g of liquid paraffin was added dropwise while maintaining at 0 to 5 ° C., and the mixture was kept warm and stirred until hydrogen bubbling stopped. The obtained mixture was heated to about 40 ° C. and then cooled to around room temperature to prepare a 1,2,4-triazole sodium salt slurry. Next, the prepared 1,2,4-triazole sodium salt slurry was kept at 45 to 50 ° C. (R) -1-[(R) -2- (2,5-difluorophenyl) -2-oxiranyl] It was made to react by dripping with respect to the solution of ethyl methanesulfonic acid ester, and keeping at 40-45 degreeC.
After completion of the reaction, the resulting reaction mixture was cooled to near room temperature, and the reaction mixture was added dropwise to a mixed solution of 2.0 g of sodium chloride, 39 mL of water and 61 mL of toluene, and then neutralized with 35% hydrochloric acid. Subsequently, extraction was performed using 39 mL and 20 mL of toluene, respectively. The obtained toluene layers were combined, washed twice with 11 g of 2.2% aqueous hydrochloric acid, and then washed with 20 mL of water. Further, the organic layer was washed with weak alkaline water prepared by dissolving 0.6 g of sodium bicarbonate in 20 mL of water, concentrated under reduced pressure, and then (2R, 3S) -2- (2,5-difluorophenyl) -3. A solution of -methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane was obtained.
To the solution of the obtained (2R, 3S) -2- (2,5-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane, heptane was added. 19.8 g was added, the temperature was raised to about 50 ° C., and then (2R, 3S) -2- (2,5-difluorophenyl) -3-methyl-2-[(1H-1,2, , 4-Triazol-1-yl) methyl] oxirane seeds. Crystals were precipitated near the same temperature, and then 56 mL of heptane was further added dropwise to the resulting mixture. The obtained mixture was cooled to around 10 ° C. and kept warm, and then the crystals were filtered. The obtained crystals were washed with a mixed solvent of 20 mL of toluene and 36 mL of heptane and 56 mL of heptane and dried to obtain (2R, 9.7 g of 3S) -2- (2,5-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane was obtained (yield: 38 .6%). Its purity (HPLC area percentage) is 99.68%, and 1-{[3- (2,5-difluorophenyl) -2-methyloxiran-2-yl] methyl} -1H-1,2,4- Triazole, ie, a triazole compound derived from compound (3 ′), was not detected.
<Example 11> Production of compound (3) 47.4 g of citric acid monohydrate and 875 mL of water were replaced with 11.7 g of 35% hydrochloric acid and 436 mL of water, and (R) -1- (2,5-difluorophenyl ) -2-Hydroxy-1-propanone Performed in the same manner as in Example 9 except that the scale was changed to 46.6 g, and (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy- 21.1 g of 2-butanol was obtained (yield: 62.1%). Its purity (HPLC area percentage) was 79.5%.
Example 12 Production of Compound (5) Using (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy-2-butanol obtained in Example 11, (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy-2-butanol was carried out in the same manner as in Example 10 except that the scale was changed to 20 g, and (2R, 3S) -2- (2 , 5-difluorophenyl) -3-methyl-2-[(1H-1,2,4-triazol-1-yl) methyl] oxirane was obtained (yield: 43.4%). Its purity (HPLC area percentage) is 99.37%, 1-{[3- (2,5-difluorophenyl) -2-methyloxiran-2-yl] methyl} -1H-1,2,4- Triazole, ie, a triazole compound derived from compound (3 ′), was not detected.
<Example 13> Production of compound (3) 47.4 g of citric acid monohydrate and 875 mL of water were replaced with 11.25 g of phthalic acid and 263 mL of water, and (R) -1- (2,5-difluorophenyl) (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy-2-equivalent to Example 9 except that 2-hydroxy-1-propanone was changed to 30 g scale. 19.7 g of butanol was obtained (yield: 63.2%). Its purity (HPLC area percentage) was 76.5%.
<Example 14> Production of compound (3) 47.4 g of citric acid monohydrate and 875 mL of water were replaced with 9.08 g of DL-malic acid and 263 mL of water, and (R) -1- (2,5-difluoro (2R, 3R) -3- (2,5-difluorophenyl) -3,4-epoxy-, except that phenyl) -2-hydroxy-1-propanone was changed to 30 g scale. 20.4 g of 2-butanol was obtained (yield: 64.0%). Its purity (HPLC area percentage) was 74.2%.
<Reference Example 1>
531 mL of dimethyl sulfoxide, 186 mL of tetrahydrofuran and 115.5 g of trimethyloxosulfonium iodide were mixed, and the resulting mixture was cooled to around 8 ° C. Thereto was added dropwise a mixture of 20.0 g of sodium hydride (about 60% mineral oil dispersion) and 40.0 g of liquid paraffin, and the mixture was kept warm and stirred until hydrogen bubbling ceased to prepare an ylide. Subsequently, a mixture of 93.1 g (0.50 mol) of (R) -1- (2,4-difluorophenyl) -2-hydroxy-1-propanone and 223 mL of DMSO was added to ylide cooled to about 3 ° C. The solution was added dropwise and kept at about 3 ° C. for reaction. After completion of the reaction, 41.0 g of citric acid monohydrate, 754 mL of water and 354 mL of toluene were mixed, and the solution adjusted to a temperature near 0 ° C. was subjected to (2R, 3R) -3- (2,4-difluoro After dropping a reaction mixture containing (phenyl) -3,4-epoxy-2-butanol and 1- (2,4-difluorophenyl) -1- (2-methyl-2-oxiranyl) methanol at 1-9 ° C. Keep warm and stir. Subsequently, extraction was performed using 354 mL and 177 mL of toluene, respectively, and the obtained organic layers were combined, and washed with weak alkaline water prepared by dissolving 2.1 g of sodium bicarbonate in 354 mL of water. The organic layer was further washed three times with 354 mL of ion-exchanged water and then concentrated under reduced pressure. The resulting concentrated residue was distilled under reduced pressure to give (2R, 3R) -3- (2,4-difluorophenyl) -3. , 4-epoxy-2-butanol was obtained (yield: 70.6%). Its purity (HPLC area percentage) was 66.7%, and the structural isomer of (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy-2-butanol (compound (3 ′ )) Was included 17.9% (HPLC area percentage).
<Example 15> Isolation of compound (4) By the same operation as in Example 1, compound (3) (2R, 3R) -3- (2,4-difluorophenyl) -3,4-epoxy- After 2-butanol was obtained by distillation, the distillation residue was purified by silica gel column chromatography and then crystallized to give 3- (2,4-difluorophenyl) -2-methyl- which is compound (4). 2-Iodomethyloxirane was isolated. The isolated 3- (2,4-difluorophenyl) -2-methyl-2-iodomethyloxirane was used as an analytical standard in Example 1 and the like described above.
The structure of the obtained 3- (2,4-difluorophenyl) -2-methyl-2-iodomethyloxirane was determined from the following analysis results.
Elemental analysis calculated value) C: 38.7%, H: 2.9%, F: 12.3%, I: 40.9%
Measured value) C: 36.8%, H: 3.4%, F: 12.2%, I: 38.3%
1 H-NMR: (CDCl 3, δ ppm) 1.15 (3H, s), 3.44 (2H, dd, J = 56.2, 10.3 Hz), 5.14 (1H, d, J = 4. 15), 6.76-6.82 (1H, m), 6.88-6.93 (1H, m), 7.49-7.55 (1H, m)
13 C-NMR: (CDCl 3, δ ppm) 17.79, 17.80, 22.79, 68.95, 73.80, 103.14, 103.39, 103.66, 111.35, 111.37, 111.40, 111.58, 111.62, 122.85, 122.96, 123.00, 129.81, 129.85, 129.90, 129.93, 129.96, 158.69, 161. 14, 163.72
3−(2’,4’−ジフルオロフェニル)−3,4−エポキシ−2−ブタノール等のエポキシアルコール化合物は、例えば抗真菌剤等の製造中間体として有用であることが知られている。本発明は、エポキシアルコール化合物の製造方法等として有用である。 It is known that epoxy alcohol compounds such as 3- (2 ', 4'-difluorophenyl) -3,4-epoxy-2-butanol are useful as intermediates for producing antifungal agents, for example. The present invention is useful as a method for producing an epoxy alcohol compound.
Claims (8)
(式中、Rは水素原子又は炭素数1~6のアルキル基を表し、Arは芳香族基又は芳香族基で置換されたメチル基を表す。)
で示されるエポキシアルコール化合物及びその構造異性体である式(3’)
(式中、R及びArは前記と同義である。)
で示されるエポキシアルコール化合物を含む異性体混合物を30℃~70℃で酸と混合し、得られた混合物から式(3)で示されるエポキシアルコール化合物を取得する、式(3)で示されるエポキシアルコール化合物の製造方法。 Formula (3)
(In the formula, R represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and Ar represents an aromatic group or a methyl group substituted with an aromatic group.)
And an epoxy alcohol compound represented by formula (3 ′) which is a structural isomer thereof
(In the formula, R and Ar are as defined above.)
An epoxy compound represented by formula (3) is obtained by mixing an isomer mixture containing an epoxy alcohol compound represented by formula (3) with an acid at 30 ° C to 70 ° C, and obtaining an epoxy alcohol compound represented by formula (3) from the resulting mixture. A method for producing an alcohol compound.
(式中、R及びArは前記と同義である。)
で示されるケトアルコール化合物を反応させて式(3)で示されるエポキシアルコール化合物及びその構造異性体である式(3’)で示されるエポキシアルコール化合物を含む異性体混合物を得、該異性体混合物を30℃~70℃で酸と混合し、得られた混合物から式(3)で示されるエポキシアルコール化合物を取得する、請求項1に記載の製造方法。 Ylide prepared from halogenated trimethyloxosulfonium or halogenated trimethylsulfonium and a base and formula (1)
(In the formula, R and Ar are as defined above.)
To obtain an isomer mixture containing the epoxy alcohol compound represented by the formula (3) and the epoxy alcohol compound represented by the formula (3 ′) which is a structural isomer thereof. The method according to claim 1, wherein the compound is mixed with an acid at 30 ° C to 70 ° C, and the epoxy alcohol compound represented by the formula (3) is obtained from the obtained mixture.
(式中、Rは水素原子又は炭素数1~6のアルキル基を表し、Arは芳香族基又は芳香族基で置換されたメチル基を表す。)
で示されるエポキシアルコール化合物を請求項1に記載の製造方法により取得し、次いで、得られた式(3)で示されるエポキシアルコール化合物を式(6)
(式中、R及びArは前記と同義であり、Yは脱離基を示す。)
で示される化合物に変換し、得られた式(6)で示される化合物と1,2,4−トリアゾールとを反応させる、式(5)
(式中、R及びArは前記と同義である。)
で示されるトリアゾール化合物の製造方法。 Formula (3)
(In the formula, R represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and Ar represents an aromatic group or a methyl group substituted with an aromatic group.)
An epoxy alcohol compound represented by the formula (3) is obtained by the production method according to claim 1, and then the obtained epoxy alcohol compound represented by the formula (3) is represented by the formula (6).
(In the formula, R and Ar are as defined above, and Y represents a leaving group.)
The compound represented by formula (6) is reacted with the resulting compound represented by formula (6) and 1,2,4-triazole.
(In the formula, R and Ar are as defined above.)
The manufacturing method of the triazole compound shown by these.
(式中、Rは水素原子又は炭素数1~6のアルキル基を表し、Arは芳香族基又は芳香族基で置換されたメチル基を表し、Xはハロゲン原子を表す。)
で示される化合物。 Formula (4)
(In the formula, R represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, Ar represents an aromatic group or a methyl group substituted with an aromatic group, and X represents a halogen atom.)
A compound represented by
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| SG11201900370PA (en) * | 2016-07-21 | 2019-02-27 | Kaneka Corp | Process for producing organic compound |
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| WO2019031240A1 (en) | 2017-08-10 | 2019-02-14 | 住友化学株式会社 | Method for producing epoxy alcohol compound |
| JPWO2019031240A1 (en) * | 2017-08-10 | 2020-07-02 | 住友化学株式会社 | Method for producing epoxy alcohol compound |
| US10730861B2 (en) | 2017-08-10 | 2020-08-04 | Sumitomo Chemical Company, Limited | Process for producing epoxy alcohol compound |
| EP3666762A4 (en) * | 2017-08-10 | 2021-04-07 | Sumitomo Chemical Company, Limited | PROCESS FOR PRODUCING AN EPOXY-ALCOHOL-TYPE COMPOUND |
| JP7060019B2 (en) | 2017-08-10 | 2022-04-26 | 住友化学株式会社 | Method for manufacturing epoxy alcohol compound |
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