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WO2012050341A3 - 입자형 다결정실리콘 제조용 유동층 반응기 및 이를 이용한 다결정 실리콘 제조방법 - Google Patents

입자형 다결정실리콘 제조용 유동층 반응기 및 이를 이용한 다결정 실리콘 제조방법 Download PDF

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Publication number
WO2012050341A3
WO2012050341A3 PCT/KR2011/007522 KR2011007522W WO2012050341A3 WO 2012050341 A3 WO2012050341 A3 WO 2012050341A3 KR 2011007522 W KR2011007522 W KR 2011007522W WO 2012050341 A3 WO2012050341 A3 WO 2012050341A3
Authority
WO
WIPO (PCT)
Prior art keywords
polycrystalline silicon
fluidized bed
bed reactor
preparation
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2011/007522
Other languages
English (en)
French (fr)
Other versions
WO2012050341A2 (ko
Inventor
임천수
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TECHNOVALUE CO Ltd
Original Assignee
TECHNOVALUE CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TECHNOVALUE CO Ltd filed Critical TECHNOVALUE CO Ltd
Publication of WO2012050341A2 publication Critical patent/WO2012050341A2/ko
Publication of WO2012050341A3 publication Critical patent/WO2012050341A3/ko
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1818—Feeding of the fluidising gas
    • B01J8/1827—Feeding of the fluidising gas the fluidising gas being a reactant
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B01J8/38—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique with fluidised bed containing a rotatable device or being subject to rotation or to a circulatory movement, i.e. leaving a vessel and subsequently re-entering it
    • B01J8/384—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique with fluidised bed containing a rotatable device or being subject to rotation or to a circulatory movement, i.e. leaving a vessel and subsequently re-entering it being subject to a circulatory movement only
    • B01J8/386—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique with fluidised bed containing a rotatable device or being subject to rotation or to a circulatory movement, i.e. leaving a vessel and subsequently re-entering it being subject to a circulatory movement only internally, i.e. the particles rotate within the vessel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00106—Controlling the temperature by indirect heat exchange
    • B01J2208/00115—Controlling the temperature by indirect heat exchange with heat exchange elements inside the bed of solid particles
    • B01J2208/00132—Tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00106—Controlling the temperature by indirect heat exchange
    • B01J2208/00115—Controlling the temperature by indirect heat exchange with heat exchange elements inside the bed of solid particles
    • B01J2208/0015—Plates; Cylinders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00477—Controlling the temperature by thermal insulation means
    • B01J2208/00495—Controlling the temperature by thermal insulation means using insulating materials or refractories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00796—Details of the reactor or of the particulate material
    • B01J2208/00893—Feeding means for the reactants
    • B01J2208/00902—Nozzle-type feeding elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00796—Details of the reactor or of the particulate material
    • B01J2208/00991—Disengagement zone in fluidised-bed reactors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02—Apparatus characterised by their chemically-resistant properties
    • B01J2219/0204—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
    • B01J2219/0218—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components of ceramic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02—Apparatus characterised by their chemically-resistant properties
    • B01J2219/025—Apparatus characterised by their chemically-resistant properties characterised by the construction materials of the reactor vessel proper
    • B01J2219/0277—Metal based
    • B01J2219/0286—Steel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)

Abstract

본 발명은 입자형 다결정실리콘 제조용 유동층 반응기 및 이를 이용한 다결정 실리콘 제조방법에 관한 것으로 보다 상세하게는 챔버 하부에서 유동가스를 주입하여 챔버 상부에서 반응이 일어나는 입자형 다결정실리콘 제조용 유동층 반응기에 있어서, 밀폐형의 챔버; 상기 챔버 내부에 위치한 관 형태의 가열장치; 상기 가열장치 내부로 유동가스가 공급될 수 있도록 챔버 하부에 형성된 유동가스 제1공급관; 및 상기 가열장치 내부에 유동가스 속도를 증가시키는 벤츄리를 포함하는 것을 특징으로 하는 입자형 다결정실리콘 제조용 유동층 반응기 및 이를 이용한 다결정 실리콘 제조방법을 제공한다.
PCT/KR2011/007522 2010-10-12 2011-10-11 입자형 다결정실리콘 제조용 유동층 반응기 및 이를 이용한 다결정 실리콘 제조방법 Ceased WO2012050341A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2010-0099457 2010-10-12
KR1020100099457A KR101057101B1 (ko) 2010-10-12 2010-10-12 입자형 다결정실리콘 제조용 유동층 반응기 및 이를 이용한 다결정 실리콘 제조방법

Publications (2)

Publication Number Publication Date
WO2012050341A2 WO2012050341A2 (ko) 2012-04-19
WO2012050341A3 true WO2012050341A3 (ko) 2012-06-21

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Application Number Title Priority Date Filing Date
PCT/KR2011/007522 Ceased WO2012050341A2 (ko) 2010-10-12 2011-10-11 입자형 다결정실리콘 제조용 유동층 반응기 및 이를 이용한 다결정 실리콘 제조방법

Country Status (2)

Country Link
KR (1) KR101057101B1 (ko)
WO (1) WO2012050341A2 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103172067B (zh) * 2013-04-08 2014-09-24 无锡中彩科技有限公司 冷壁流化床及其应用
KR101615307B1 (ko) * 2013-07-16 2016-04-25 웅진에너지 주식회사 폴리실리콘 제조 장치
WO2015008889A1 (ko) * 2013-07-16 2015-01-22 웅진에너지 주식회사 폴리실리콘 제조 장치 및 방법
US9238211B1 (en) * 2014-08-15 2016-01-19 Rec Silicon Inc Segmented silicon carbide liner
DE102015224099A1 (de) * 2015-12-02 2017-06-08 Wacker Chemie Ag Wirbelschichtreaktor und Verfahren zur Herstellung von polykristallinem Siliciumgranulat
JP6921998B2 (ja) * 2017-08-23 2021-08-18 ワッカー ケミー アクチエンゲゼルシャフトＷａｃｋｅｒ Ｃｈｅｍｉｅ ＡＧ 粒状多結晶シリコンの製造のための流動床リアクタ

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5165908A (en) * 1988-03-31 1992-11-24 Advanced Silicon Materials, Inc. Annular heated fluidized bed reactor
US7029632B1 (en) * 1999-10-06 2006-04-18 Wacker-Chemie Gmbh Radiation-heated fluidized-bed reactor
KR20070080306A (ko) * 2006-02-07 2007-08-10 한국화학연구원 입자형 다결정실리콘 제조용 고압 유동층반응기
KR20080098322A (ko) * 2007-05-04 2008-11-07 와커 헤미 아게 다결정질 고순도 실리콘 과립의 연속 제조 방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5165908A (en) * 1988-03-31 1992-11-24 Advanced Silicon Materials, Inc. Annular heated fluidized bed reactor
US7029632B1 (en) * 1999-10-06 2006-04-18 Wacker-Chemie Gmbh Radiation-heated fluidized-bed reactor
KR20070080306A (ko) * 2006-02-07 2007-08-10 한국화학연구원 입자형 다결정실리콘 제조용 고압 유동층반응기
KR20080098322A (ko) * 2007-05-04 2008-11-07 와커 헤미 아게 다결정질 고순도 실리콘 과립의 연속 제조 방법

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Publication number Publication date
KR101057101B1 (ko) 2011-08-17
WO2012050341A2 (ko) 2012-04-19

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