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WO2012041519A3 - Photovernetzende elastomere für rapid prototyping - Google Patents

Photovernetzende elastomere für rapid prototyping Download PDF

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Publication number
WO2012041519A3
WO2012041519A3 PCT/EP2011/004908 EP2011004908W WO2012041519A3 WO 2012041519 A3 WO2012041519 A3 WO 2012041519A3 EP 2011004908 W EP2011004908 W EP 2011004908W WO 2012041519 A3 WO2012041519 A3 WO 2012041519A3
Authority
WO
WIPO (PCT)
Prior art keywords
photocrosslinking
elastomers
rapid prototyping
dimensional structure
prototyping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2011/004908
Other languages
English (en)
French (fr)
Other versions
WO2012041519A2 (de
Inventor
Hartmut Krüger
Wolfdietrich Meyer
Michael Wegener
Careen Graf
Oliver Refle
Sascha Engelhardt
Melanie Dettling
Kirsten Borchers
Günter Tovar
Elke Bremus-Köbberling
Christian Schuh
Esther Novosel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE102011012480A external-priority patent/DE102011012480A1/de
Application filed by Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority to EP11771021.0A priority Critical patent/EP2621714A2/de
Publication of WO2012041519A2 publication Critical patent/WO2012041519A2/de
Publication of WO2012041519A3 publication Critical patent/WO2012041519A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/112—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using individual droplets, e.g. from jetting heads
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12N—MICROORGANISMS OR ENZYMES; COMPOSITIONS THEREOF; PROPAGATING, PRESERVING, OR MAINTAINING MICROORGANISMS; MUTATION OR GENETIC ENGINEERING; CULTURE MEDIA
    • C12N5/00—Undifferentiated human, animal or plant cells, e.g. cell lines; Tissues; Cultivation or maintenance thereof; Culture media therefor
    • C12N5/0068—General culture methods using substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12N—MICROORGANISMS OR ENZYMES; COMPOSITIONS THEREOF; PROPAGATING, PRESERVING, OR MAINTAINING MICROORGANISMS; MUTATION OR GENETIC ENGINEERING; CULTURE MEDIA
    • C12N2533/00—Supports or coatings for cell culture, characterised by material
    • C12N2533/30—Synthetic polymers
    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12N—MICROORGANISMS OR ENZYMES; COMPOSITIONS THEREOF; PROPAGATING, PRESERVING, OR MAINTAINING MICROORGANISMS; MUTATION OR GENETIC ENGINEERING; CULTURE MEDIA
    • C12N2533/00—Supports or coatings for cell culture, characterised by material
    • C12N2533/50—Proteins

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Biomedical Technology (AREA)
  • Biotechnology (AREA)
  • Zoology (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Genetics & Genomics (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Cell Biology (AREA)
  • Biochemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Microbiology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Medical Uses (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)

Abstract

Ein Verfahren zur Herstellung einer zwei- oder dreidimensionalen Struktur, die bevorzugt biokompatibel und biofunktionalisiert ist und die so hergestellte zwei- oder dreidimensionale Struktur.
PCT/EP2011/004908 2010-10-01 2011-09-30 Photovernetzende elastomere für rapid prototyping Ceased WO2012041519A2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP11771021.0A EP2621714A2 (de) 2010-10-01 2011-09-30 Photovernetzende elastomere für rapid prototyping

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE102010047074.0 2010-10-01
DE102010047074 2010-10-01
DE102011012480A DE102011012480A1 (de) 2011-02-25 2011-02-25 Photovernetzende Elastomere für Rapid Prototyping
DE102011012480.2 2011-02-25

Publications (2)

Publication Number Publication Date
WO2012041519A2 WO2012041519A2 (de) 2012-04-05
WO2012041519A3 true WO2012041519A3 (de) 2012-07-26

Family

ID=44860285

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2011/004908 Ceased WO2012041519A2 (de) 2010-10-01 2011-09-30 Photovernetzende elastomere für rapid prototyping

Country Status (2)

Country Link
EP (1) EP2621714A2 (de)
WO (1) WO2012041519A2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012219691B4 (de) * 2012-10-26 2015-07-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Modifizierte Gelatine, Verfahren zu ihrer Herstellung und Verwendung
MX2016016630A (es) 2014-06-23 2017-06-06 Carbon Inc Metodos para producir objetos tridimensionales de poliuretano a partir de materiales que tienen multiples mecanismos de endurecimiento.
MX2017011244A (es) * 2015-03-03 2017-11-01 Basf Se Metodo para producir una estructura tridimensional mediante impresion 3d.
DE102017101823A1 (de) 2017-01-31 2018-08-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Strukturiertes Komposit aus Matrixmaterial und Nanopartikeln
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
DE102021134562A1 (de) * 2021-12-23 2023-06-29 INM - Leibniz-Institut für Neue Materialien gemeinnützige Gesellschaft mit beschränkter Haftung Härtbare Zusammensetzung und ihre Anwendung

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0562826A1 (de) * 1992-03-27 1993-09-29 Loctite Corporation Selbsthärtende Acrylatzusammensetzung mit niedriger Viskosität
DE102004050868A1 (de) * 2004-10-18 2006-04-20 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare Formulierung zur Herstellung von Ohrpassstücken

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6214276B1 (en) 1999-05-18 2001-04-10 Creo Srl Method of forming objects from thermosensitive composition
US6658314B1 (en) 1999-10-06 2003-12-02 Objet Geometries Ltd. System and method for three dimensional model printing
SG92703A1 (en) 2000-05-10 2002-11-19 Nanyang Polytechnic Method of producing profiled sheets as prosthesis
AT502110B1 (de) 2005-06-30 2008-09-15 Univ Wien Tech Mit strahlung härtbare, in organischen lösungsmitteln lösliche zusammensetzung und deren verwendung für rapid prototyping verfahren

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0562826A1 (de) * 1992-03-27 1993-09-29 Loctite Corporation Selbsthärtende Acrylatzusammensetzung mit niedriger Viskosität
DE102004050868A1 (de) * 2004-10-18 2006-04-20 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare Formulierung zur Herstellung von Ohrpassstücken

Also Published As

Publication number Publication date
EP2621714A2 (de) 2013-08-07
WO2012041519A2 (de) 2012-04-05

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